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TWI298313B - Apparatus and method for removal of particles in water - Google Patents

Apparatus and method for removal of particles in water Download PDF

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Publication number
TWI298313B
TWI298313B TW94138116A TW94138116A TWI298313B TW I298313 B TWI298313 B TW I298313B TW 94138116 A TW94138116 A TW 94138116A TW 94138116 A TW94138116 A TW 94138116A TW I298313 B TWI298313 B TW I298313B
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TW
Taiwan
Prior art keywords
film
tank
water
zone
wastewater
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Application number
TW94138116A
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Chinese (zh)
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TW200716491A (en
Inventor
Huey Song You
Shan Shan Chou
wan hao Jiang
Chen Hua Chu
Chih Ping Huang
Chi Chung Liao
Ren Yang Horng
Wen Yuang Tzou
Wang Kuan Chang
hui ling Yang
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Ind Tech Res Inst
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Priority to TW94138116A priority Critical patent/TWI298313B/en
Publication of TW200716491A publication Critical patent/TW200716491A/en
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Publication of TWI298313B publication Critical patent/TWI298313B/en

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  • Separation Using Semi-Permeable Membranes (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)

Description

1298313 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種水中微粒之去除裝置及方法,特別是 一種適用於化學機械研磨廢水或中、高濁度原水之處理裝 置及方法。 【先前技術】 隨著環保意識的提升及用水的需求,水處理/回收技術 之開發更顯得重要。尤其,對水中含有微粒者直接應用傳 統廢水處理技術’常無法有效處理或回收。以下分別說明 _ 化學機械研磨廢水與中、高濁度原水之處理方式與困難點。 在半導體製程產業’其為了提高半導體元件的精密 度,必須去除元件表面凹凸和高低不平的部分以進行後續 高解析度元件圖案的製作,而其中所使用的關鍵技術即為 「化學機械研磨法」(Chemical Mechanical Polishing, CMP )。「化學機械研磨法」主要是利用研磨漿液及研磨塾 等化學品,配合機械研磨的動作,將1C晶圓上之介電薄膜 或金屬薄膜磨平,再以大量之超純水洗淨,因此半導體產 • 業中大約有40%的水用於CMP製程中,也產生了大量的廢 水,約佔製程總廢水量的15〜25%。CMP製程中引入研磨母 液(slurry)於晶圓表面進行研磨,研磨母液中包含約 5〜10%,30〜100 nm 的研磨低粒(包括:Si02、A1203、Ce02、BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and method for removing particulates in water, and more particularly to a treatment apparatus and method suitable for chemical mechanical polishing of wastewater or medium and high turbidity raw water. [Prior Art] With the improvement of environmental awareness and the demand for water, the development of water treatment/recycling technology is even more important. In particular, the direct application of conventional wastewater treatment technology to those containing particulates in water often fails to be effectively treated or recycled. The following describes the treatment methods and difficulties of chemical mechanical grinding wastewater and medium and high turbidity raw water. In the semiconductor manufacturing industry, in order to improve the precision of semiconductor components, it is necessary to remove the unevenness and unevenness of the surface of the component for the subsequent fabrication of high-resolution component patterns. The key technology used is "chemical mechanical polishing". (Chemical Mechanical Polishing, CMP). The "Chemical Mechanical Polishing Method" mainly uses a chemical such as a polishing slurry or a polishing burr to smooth the dielectric film or the metal film on the 1C wafer, and then wash it with a large amount of ultrapure water. About 40% of the water in the semiconductor industry is used in the CMP process, and a large amount of wastewater is generated, which accounts for 15 to 25% of the total wastewater volume of the process. In the CMP process, a grinding mother liquid is introduced to grind the surface of the wafer, and the grinding mother liquid contains about 5 to 10%, 30 to 100 nm of ground low particles (including: SiO 2 , A 120 3 , Ce 02 ,

Zr〇2等)以及化學助劑(包括:pH緩衝劑、氧化劑、界面活 性劑)。 CMP研磨廢水中之主要成份為研磨過程中產生的氧化 物微粒及研磨母液中的化學物質,其次為化學溶劑及清洗 溶液。這些廢水中的懸浮微粒粒徑範圍約在5〇〜1〇〇〇 nm左 1298313 作由於懸浮微粒顆粒過小,且廢水中含有分散劑,使 j混凝沉殿處理的效果不佳而必須過量加藥,最終 量的污泥產出而造成二次污染,也使得水回收更加困 供ΐ外,混凝處理效率不佳常使後續薄膜壽命短,增加 设備操作成本。 曰加 =外,在中、鬲濁度原水方面,因為台灣地區河川短 λ!、且/而W的地形條件與時常遭逢職風、豪雨、地震等等天 然因素,導致大雨夾帶大量泥沙形成高濁水,使得進入淨 水場的原水濁度高達數萬NTU ,常造成淨水廠停擺。這也 #表面水中難以沉降的懸浮固體物,其顆粒大小介於〇·〗 裏〇· 1 、之間,其中勝體(colloid)顆粒佔懸浮固體物的大 宗為邊,水中濁度的主要來源,大小約介於 1 nm 至 1 “ m 之間。顆粒表面因有機物而帶負電荷,使得懸浮液 ,穩定狀態’顆粒與顆粒間因排斥力不易聚集,無法 Λ賴雜;重力f用沉降。在高濁水的情況下,由於水中顇 雜濃度阿,混凝操作條件不佳時,常造成沉澱效果差。 【發明内容】 /有鑑於習知技術對於處理廢水,尤其是CMp廢水或 中、高濁度原水之缺點,本發明之主要目的係提供一種水 中微粒之去除裝置,係可使廢水先經過快混、慢混處理, 使廢水中微粒凝集成較大膠羽後後再進入一沉澱/薄膜槽, 炎於沉殿/薄膜槽中使膠羽沉澱後較澄清之廢水再通過薄膜 過濾,以避免薄膜阻塞而無法正常運作。 本發明之另一目的係提供一種沉澱/薄膜槽,藉由該廢 水處理槽中之沉殿區及薄膜過濾區之設計’使進入沉殿/薄 勝槽之廢水中較大之顆粒先於沉澱區沉澱,再將沉澱後之 7 1298313 廢水導入薄膜過濾區過濾’如此可提升薄膜使用效率及延 長薄膜之使用壽命。 本發明之又一目的係提供一種水中微粒去除方法,主 要係利用前述之廢水處理裝置處理,較佳係應用於CMp廢 〜 水或濁度約100〜l〇,〇〇〇NTU之中、高濁度原水,可有效提 , 升廢水處理效率及降低裝置之耗損率。 為達上述目的,本發明係提供一種水中微粒之處理裝 置,包έ •一快混槽,一慢混槽;及一沉澱/薄膜槽;其特 徵在於:前述沉澱/薄膜槽中包含:一沉澱區,用^使^述 鲁慢混槽出流水中之膠羽沉澱;及一薄膜過濾區,該薄膜過 濾、g包5至少一薄膜,用以過濾、經前述沉殿區沉殿後之 水,箣述〉儿殺區及薄膜過濾區係由至少一隔板區隔且兩區 域具有開口可相互連通,其中前述薄膜過濾區係設置於相 對於沉澱/薄膜槽底一偏高處。 較佳地,本發明之水中微粒去除裝置進一步包含一迴流 幫浦,用以將沉澱/薄膜槽中之薄膜過濾區之水抽取至前述 快混槽’使其進入下一次廢水處理程序,以獲得更淨化之 水。 _ 本發明另提供一種沉澱/薄膜槽,包含:一沉殿區,用 於使廢水中之雜質沉澱;及一薄膜過濾區,該薄膜過濾區 包含至少一薄膜,用以過濾經前述沉澱區沉澱後之水;前 述沉澱區及薄膜過濾區係由至少一隔板區隔且兩區域具有 開'可相互連通,其中前述薄膜過濾區係設置於相對於沉 澱/薄膜槽底一偏高處。 較佳地,前述隔板之態樣可包含單一片或複數個隔 板。若為複數個隔板時,其中位於薄膜過濾區下方之隔板 係可呈一傾斜設計,用以使前述薄膜過濾區沉澱之沉澱物 1298313Zr〇2, etc.) and chemical auxiliaries (including pH buffers, oxidizing agents, surfactants). The main components in the CMP grinding wastewater are the oxide particles generated during the grinding process and the chemicals in the grinding mother liquor, followed by the chemical solvent and the cleaning solution. The particle size of the suspended particles in these wastewaters is about 5〇~1〇〇〇nm left 1298313. Because the suspended particles are too small, and the waste water contains dispersing agents, the effect of the treatment of j coagulation sinks is not good and must be excessively added. The final amount of sludge produced by the drug causes secondary pollution, which also makes the water recovery more difficult to supply. The poor efficiency of the coagulation treatment often shortens the life of the subsequent film and increases the operating cost of the equipment.曰加=外, in the middle and turbidity of raw water, because the rivers in Taiwan are short λ!, and / / W's topographical conditions and often suffered from natural winds, heavy rain, earthquakes and other natural factors, resulting in heavy rain entrainment of a large amount of sediment formation The high turbidity water makes the raw water turbidity entering the water purification field up to tens of thousands NTU, which often causes the water purification plant to stop. This is also the suspended solids that are difficult to settle in the surface water, and the particle size is between 〇·〗 〇·1, where the colloid particles account for the bulk of the suspended solids, the main source of turbidity in the water. The size is between 1 nm and 1 "m. The surface of the particle is negatively charged due to organic matter, so that the suspension, the steady state, the particles and the particles are not easy to accumulate due to the repulsive force, and cannot be mixed; the gravity f is settled. In the case of highly turbid water, the precipitation effect is often poor due to the poor concentration of the coagulation in the water. [Summary of the invention] / In view of the prior art for treating wastewater, especially CMp wastewater or medium and high Disadvantages of turbidity raw water, the main object of the present invention is to provide a device for removing particulates in water, which is to allow the waste water to undergo rapid mixing and slow mixing treatment, so that the particles in the wastewater are condensed into a large rubber feather and then enter a sediment/film. The groove, in the sinking chamber/film tank, allows the clarified waste water to be filtered through the membrane after the gelatin is precipitated, so as to prevent the membrane from being blocked and not functioning properly. Another object of the present invention is to provide a The leaching/film tank, by the design of the estuary area and the membrane filtration zone in the wastewater treatment tank, allows the larger granules entering the Shendian/Bosheng tank to precipitate before the sedimentation zone, and then the sedimentation 1298313 Wastewater is introduced into the membrane filtration zone to filter 'This can improve the efficiency of the membrane and prolong the service life of the membrane. Another object of the present invention is to provide a method for removing particulates in water, which is mainly treated by the above-mentioned wastewater treatment device, preferably applied CMp waste ~ water or turbidity of about 100~l〇, 〇〇〇NTU, high turbidity raw water, can effectively raise, improve wastewater treatment efficiency and reduce the loss rate of the device. To achieve the above purpose, the present invention provides a A treatment device for particles in water, comprising: a fast mixing tank, a slow mixing tank; and a sedimentation/film tank; wherein the sediment/film tank comprises: a sedimentation zone, which is used to make a slow mixing The glue plume in the outflow water of the trough; and a membrane filtration zone, the membrane is filtered, and at least one membrane is used for filtering, and the water after the sinking of the chamber in the Shen Dian area is described, and the narration zone and the membrane filtration zone are described. By The at least one partition is spaced apart and the two regions have openings for communicating with each other, wherein the membrane filtration zone is disposed at a height relative to the bottom of the sediment/film tank. Preferably, the underwater particulate removal apparatus of the present invention further comprises a reflow. The pump is used to extract water from the membrane filtration zone in the sediment/film tank to the aforementioned quick mixing tank to enter the next wastewater treatment process to obtain more purified water. _ The present invention further provides a sedimentation/film tank And comprising: a sinking area for precipitating impurities in the wastewater; and a membrane filtration zone, the membrane filtration zone comprising at least one membrane for filtering water precipitated by the precipitating zone; the precipitation zone and membrane filtration The zone is separated by at least one partition and the two zones are open to be interconnected, wherein the membrane filtration zone is disposed at a height relative to the bottom of the sediment/film tank. Preferably, the aspect of the foregoing separator may comprise a single sheet or a plurality of separators. In the case of a plurality of separators, the separator located below the membrane filtration zone may have a slanted design for depositing precipitates in the membrane filtration zone 1298313

排出而進入沉殿區排出。若為單一隔版時,該隔板相對於 廢水處理槽槽壁呈傾斜狀設計,以便沉;殿之膜羽排出。、 另一方面,本發明提供一種水中微粒之去除方法,勹 含下列步驟:⑻將廢水導人-快混槽’並添加混凝劑及g 整pH值以去除微粒穩定性;(b)將前述步驟(3)之出流水 入一慢混槽,可添加或不添加膠凝劑使廢水中微粒形成較 大膠羽;及(C)將前述步驟(b)之出流水導入一沉澱/薄膜槽, 前述膠羽於沉澱/薄膜槽内之沉澱區先進行重力沉降,而9样 體内較上層澄清之廢水經减槽内1二遽區“ 膜過濾後即可排出。 綜上所述,本發明之水中微粒之去 程序後再純澄清之廢水導人本㈣ 、 广 於槽中之沉澱區使膠羽進行重力沉降,7=匕 :她'卜夕厂介早獨薄膜處理或離子交換法處理之不足及 弊知’此外,亦可料傳統薄關常發生之賴阻塞之缺 承〇 【實施方式】 本發明所沿用的現有技藝,在此謹作重點式的引用, H明之闡述。並且下述内文中相關圖式並未依比例 繪‘,/、作用僅在表現本發明之結構特徵。 第一圖係為本發明之水中微粒去除裝置1〇〇,包含: 一快混槽1 ; 一慢混槽2;及一沉澱/薄膜槽3 ;其特徵在於·· 前述沉殿/薄膜槽3中包含:—沉㈣31 1於使前述慢混 槽2,"IL水中之膠羽4沉澱;及—薄膜過濾區32 ,該薄膜 過濾區32包含至少一賴33,用以過濾經前述沉殿區μ 9 1298313 沉幾後之水;前述沉澱區31及薄膜過濾區32係由至少一 隔板34區隔且兩區域具有開口(如第二(A)圖或第二(B)圖 之開D 35)可相互連通,其中前述薄膜過濾區32係設置於 相對於沉澱/薄膜槽3底一偏高處。 第二(A)圖係前述之沉殿/薄膜槽3之一種具體實施態樣 - 之詳細結構示意圖,該沉殿/薄膜槽3中之複數個隔板34中 位於薄膜過濾區32下方之隔板34係可呈一傾斜設計,用 以使於薄膜過濾區32再沉殿之膠羽,經由開口 35排出而 進入沉殿區31後再經由該區之污泥排出口 36排出。前述 _ 開口 35之數量及位置可視需要設置於隔板34之任一處, 較佳係設置於薄膜過濾區32下方之隔板34處,以便於沉 澱物排出。 第二(B)圖係前述之沉澱/薄膜槽3之另一種具體實施態 樣之詳細結構示意圖,除了隔版34之設計不同外,其餘皆 與第二(A)圖相同。本發明之沉澱/薄膜槽3中之隔版34設 計,亦可為第二(B)圖所示,僅使用單一傾斜之隔版34,區 隔出沉澱區31及薄膜過濾區32。本發明隔版之設計可隨意 變換使用,不受特別限制,只要能有效區隔沉澱區31及薄 膜過滤仏32 ’並可使沉殿的膠羽排出即可。 本叙明使用之薄膜材質包含,但不限於:不織布、陶 瓷膜之UF或MF膜’薄膜材質之選用,熟悉該技藝者可視 實際情況,選用其適當材質的薄膜。 前述沉殿’薄膜槽3亦可具有-抽水幫浦5,係連接於 前述薄膜33用以抽取經薄膜薄膜%過濟後之水。經由薄 膜33過濾後之f、可當作次級用水或R0純水系統之進流水。 权仫,μ别述〉儿澱/薄膜槽3中之薄膜過濾區可進一步 包含〆曝乱官37作為降低雜質附著或沉積於薄膜表面之 1298313 用,提升薄膜效率及延長使用時間。本發明之沉澱/薄膜槽 3可進一步具有一溢流口 38,其設置於薄膜過濾區32之槽 體邊,可使該區過多之水排出。 再者,本發明之水中微粒去除裝置進一步可包含一迴 • 流幫浦6,用以將前述薄膜過濾區32之水抽取至快混槽1, . 進行迴流再淨化之程序,使得出流水之等級更提升。 前述第二圖之沉澱/薄膜槽3亦可作為一廢水處理槽, 其可視廢水污染之情況而單獨使用或與其他習知之廢水處 理裝置搭配,以期達到最佳之處理效果。 鲁另一方面,本發明提供一種廢水處理方法,係利用前 述本發明之水中微粒去除裝置(參考第一圖)。該方法首先 將廢水導入一快混槽1,並添加混凝劑及調整pH值(較佳 pH值為3.0〜7.5)以去除微粒穩定性,前述混凝劑包含無機 或有機混凝劑,其中無機混凝劑例如多元氯化鋁(PAC1)、硫 酸|呂、硫酸鐵等,有機混凝劑如聚氯化己二嫦二曱基胺; 之後將前述快混槽1之出流水導入一慢混槽2,可添加或不 添加膠凝劑使廢水中膠羽形成較大膠羽,前述膠凝劑包 含,但不限於,例如高分子聚合物,如聚丙烯醯胺。接下 • 來,將前述慢混槽1之出流水導入一沉澱/薄膜槽3,於此 槽中前述膠羽於沉澱/薄膜槽3内之沉澱區31先進行重力沉 降,而槽體内較上層澄清之廢水經由隔板34之開口 35流 入沉澱/薄膜槽3内之薄膜過濾區32,再經由連接薄膜33 之抽水幫浦5將該區之水經薄膜33過濾後排出。排出之水 可作為次級用水或RO純水系統之進流水或其他用途。 前述pH值調控、混凝劑或膠凝劑其係熟習該項技術者 可任意選用調配,並不受特別限制。 較佳地,本發明之方法可進一步可藉由一迴流幫浦6, 11 1298313 =珂述薄膜過濾區32之水抽取至快混槽丨,進行迴流再淨 之程序’使得出流水之等級更提升而增加後續之應用價 值。 ^ a以下係藉由數個實施例並配合圖式說明本發明之實 轭恕樣,但並非用於限制本發明之申請專利範圍。 實施例 倒一、CMP混合廢皮處理膏鹼 〜使用小型沉殿/薄膜槽(21cm(L)x21cm(W)x60cm(H)) (薄膜出水量設定為32mL/min)用以處理CMP混合廢水。此 笔水,蜀度 220〜270NTU ’ 總有機碳(total organic carbon, TOC) 3〇〜37mg/L。將CMP混合廢水置於100L塑膠桶,先進行快 混處理,混凝劑採用PAC1。試驗期間之PAC1加藥量隨著 廢水而變,約1〇〇〇〜2800mg/L。然後再將上述塑膠桶内攪拌 機減速,改為慢混操作。沉澱/薄膜槽設有液位控制器可自 動注入廢水。試驗時所使用之不織布薄膜為平板式 (lOcmxlOcm),操作時,以2.4m3/m2/d(如第三圖)之通量(fiux, 以符號J表示)抽取混凝沉澱後之上澄液通過薄膜,透壓 (transmembrane pressure,TMP)隨著時間之變化如第四圖所 示,經由固定時間之空氣反洗,TMP落於1〇〇〜5〇〇mmHg 間。第五圖顯示連續7天實驗之濁度與TOC水質數據。當 PAC1加樂量控制不佳時,混凝後上澄液濁度曾達2〇 NTU, 使得透壓升高,但是薄膜處理水濁度皆可小於1 NTU。Discharge and enter the Shen Dian area to discharge. In the case of a single partition, the partition is designed to be inclined with respect to the wall of the wastewater treatment tank so as to sink; the membrane plume of the temple is discharged. In another aspect, the present invention provides a method for removing particulates in water, comprising the steps of: (8) introducing waste water into a human-quick mixing tank and adding a coagulant and g to adjust the pH value to remove particulate stability; (b) The outflow water of the foregoing step (3) is introduced into a slow mixing tank, with or without the addition of a gelling agent to form a larger rubber feather in the wastewater; and (C) introducing the outflow water of the foregoing step (b) into a sediment/film The groove, the gelatinous feather is firstly subjected to gravity sedimentation in the sedimentation zone in the sedimentation/film tank, and the waste water in the 9th body is clarified by the upper layer in the first and second zones of the reduction tank, and the membrane can be discharged after being filtered. The wastewater in the water of the present invention is purified by the clarification of the waste water (4), and the sedimentation zone in the tank is used for gravity sedimentation of the rubber feather, 7=匕: she's a small film treatment or ion exchange Insufficient and disadvantages of the method of processing. In addition, it is expected that the conventional thinning often occurs due to the lack of obstruction. [Embodiment] The prior art of the present invention is hereby incorporated by reference. And the related drawings in the following text are not drawn to scale ', /, The first embodiment is a water particle removing device 1 of the present invention, comprising: a fast mixing tank 1; a slow mixing tank 2; and a sediment/film tank 3; The above-mentioned sink/film tank 3 comprises: - sinking (four) 31 1 for causing the aforementioned slow mixing tank 2, &quot Lai 33, for filtering the water after the sinking of the above-mentioned Shen Dian district μ 9 1298313; the precipitating zone 31 and the membrane filtering zone 32 are separated by at least one partition 34 and the two regions have openings (such as the second (A) The figure or the opening (35) of the second (B) diagram may be in communication with each other, wherein the membrane filtration zone 32 is disposed at a height relative to the bottom of the sediment/film tank 3. The second (A) is the aforementioned temple A detailed structural diagram of a specific embodiment of the film tank 3, wherein the partition 34 of the plurality of partitions 34 in the chamber/film tank 3 located below the membrane filtration zone 32 can be inclined to The rubber feathers of the membrane filtration zone 32 are re-sinked, discharged through the opening 35, enter the Shendian District 31, and then pass through the sludge row of the zone. The outlet 36 is discharged. The number and position of the aforementioned opening 35 may be provided at any of the partitions 34 as needed, preferably at the partition 34 below the membrane filtration zone 32 to facilitate sediment discharge. The detailed structural diagram of another embodiment of the foregoing precipitation/film tank 3 is the same as that of the second (A) except that the design of the partition 34 is different. The sediment/film tank 3 of the present invention The design of the partition 34 can also be as shown in the second (B), using only a single inclined partition 34, separating the precipitation zone 31 and the membrane filtration zone 32. The design of the spacer of the present invention can be freely changed. It is not particularly limited as long as it can effectively separate the sedimentation zone 31 and the membrane filter 仏 32 ' and can discharge the rubber feather of the sinking hall. The film materials used in this description include, but are not limited to, non-woven fabrics, UF or MF membranes of ceramic membranes, and the selection of membrane materials. Those skilled in the art may select suitable membranes according to actual conditions. The above-mentioned sinking membrane groove 3 may also have a pumping pump 5 connected to the film 33 for extracting water which has been excessively treated by the film film. The filtered f through the membrane 33 can be used as the influent water of the secondary water or the R0 pure water system. The membrane filtration zone in the yam/film tank 3 can further comprise 〆 〆 官 37 as a 1298313 for reducing the adhesion of impurities or depositing on the surface of the film, thereby improving the efficiency of the film and prolonging the use time. The precipitation/film tank 3 of the present invention may further have an overflow port 38 disposed at the side of the tank of the membrane filtration zone 32 to allow excess water to escape from the zone. Furthermore, the underwater particle removing device of the present invention may further comprise a flow pump 6 for extracting the water of the membrane filtration zone 32 to the quick mixing tank 1, and performing a process of refluxing and purifying, so that the flowing water is discharged. The level is improved. The sediment/film tank 3 of the second embodiment can also be used as a waste water treatment tank, which can be used alone or in combination with other conventional wastewater treatment devices in view of waste water pollution, in order to achieve the best treatment effect. In another aspect, the present invention provides a wastewater treatment method which utilizes the above-described underwater particulate removal apparatus of the present invention (refer to the first diagram). The method first introduces waste water into a quick mixing tank 1, and adds a coagulant and adjusts the pH value (preferably pH 3.0~7.5) to remove the particle stability. The foregoing coagulant comprises an inorganic or organic coagulant, wherein Inorganic coagulant such as polyaluminum chloride (PAC1), sulfuric acid|Lv, ferric sulfate, etc., organic coagulant such as polychlorinated hexamethylenediamine; then the water from the quick mixing tank 1 is introduced into the slow The mixing tank 2 may or may not be added with a gelling agent to form a large rubber feather in the wastewater. The gelling agent includes, but is not limited to, a polymer such as polypropylene decylamine. Next, the water flowing out of the slow mixing tank 1 is introduced into a sediment/film tank 3, and the precipitating zone 31 of the rubber feather in the sediment/film tank 3 is first subjected to gravity sedimentation in the tank, and the tank body is firstly subjected to gravity sedimentation. The supernatant clarified waste water flows into the membrane filtration zone 32 in the sediment/membrane tank 3 through the opening 35 of the separator 34, and is then filtered through the membrane 33 through the pumping pump 5 of the connection membrane 33. The discharged water can be used as influent water for secondary or RO pure water systems or for other purposes. The aforementioned pH adjustment, coagulant or gelling agent can be arbitrarily selected by those skilled in the art, and is not particularly limited. Preferably, the method of the present invention can further perform the process of reflowing and re-cleaning by means of a reflow pump 6, 11 1298313 = water extraction from the membrane filtration zone 32 to the fast mixing tank ' Enhance and increase subsequent application value. The following is a description of the embodiments of the present invention, and is not intended to limit the scope of the invention. Example: CMP mixed waste skin treatment cream base ~ use a small sink / film tank (21cm (L) x 21cm (W) x 60cm (H)) (film water output set to 32mL / min) for the treatment of CMP mixed wastewater . This pen water has a temperature of 220 to 270 NTU ‘total organic carbon (TOC) 3〇~37mg/L. The CMP mixed wastewater was placed in a 100 L plastic drum, which was first subjected to rapid mixing treatment, and the coagulant was PAC1. The amount of PAC1 added during the test varies with the wastewater, from about 1 to 2800 mg/L. Then, the mixer in the above plastic drum is decelerated and changed to a slow mixing operation. The sediment/film tank is equipped with a level controller that automatically injects wastewater. The non-woven film used in the test was a flat type (10 cm x 10 cm). During operation, the flux was 2.4 m 3 /m 2 /d (as shown in the third figure) (fiux, indicated by symbol J). Through the film, the transmembrane pressure (TMP) changes with time as shown in the fourth figure, and the TMP falls between 1 〇〇 5 5 mmHg through a fixed time air backwash. Figure 5 shows turbidity and TOC water quality data for 7 consecutive days of experiments. When the control of PAC1 is not good, the turbidity of the supernatant after coagulation has reached 2〇 NTU, which makes the osmotic pressure increase, but the turbidity of the film treated water can be less than 1 NTU.

實施例二、高濁度原水處理實驗(未混凝前處理J 本實施例係使用如第二(A)圖所示之沉澱/薄膜槽處理 未混凝前之原水。該沉;殿/薄膜槽之結構係使用壓克力製Example 2: High turbidity raw water treatment experiment (pre-coagulation treatment J This example uses the precipitation/film tank as shown in the second (A) diagram to treat the raw water before coagulation. The sink; The structure of the groove is made of acrylic

12 (I 1298313 (2lcm(L) x21cm(w)x57cm(H))之 【L,薄膜區底部安裝曝氣管,以曝氣方式(H;為 其為,放型孔洞之網狀結構物,孔洞直徑 :30: 之間,為親水性材質,膜板外部尺寸長 石門水庫底泥誠成㉞度原水錢行評估試驗,為利用 操作條件為設定出流水量55扯/她,水 ’連續操作期間進流水濁度4,_〜1〇,_ Ντυ ., ^水濁度降至平均5G NTU,濁度之 ^出流水量在連續操作δ天後仍可維持51= ft織布膜過遽高濁度水,利用此種操作策二 高濁度原主處理實驗(混;理, 使用小型㈣/_處理槽(實驗裝置規 ^于中濁度水過濾處理試驗,欲處理水為中_、= 已加混凝劑之中濁度水,並濁度96ΝΤΤΤ 礼園練'礙 理,㈣旦μ 3 2 U,再經不織布膜處 !隹持水流,里L2 m3/m2/day時’出流 至1.3 NTU,去除率平均99%。 J又卞J J牛 由上述實施例結果可知,使用本發明開發之水中微粒 ^除裝置可使CMP混合廢水之出流水濁度平均降至intu ^下’而中、高濁度之原水經本裝置處理後 攻佳可降至L3 NTU,可有效去雜粒 = 槽常發生之賴阻叙軌。 %讀統身技 13 1298313 其他實施態樣 本發明之實施方法已詳述於前述實施例中,任何熟悉 本技術領域之人士皆可依本發明之說明,在不背離本發明 之精神與範圍内視需要更動、修飾本發明,因此,其他實 - 施態樣亦包含在本發明之申請專利範圍中。 【圖式簡單說明】 第一圖係本發明水中微粒去除裝置之結構示意圖。 第二(A)圖係本發明具有沉澱/薄膜過濾區之沉澱/薄膜槽 鲁之一實施態樣之結構示意圖。 第二(B)圖係本發明具有沉澱/薄膜過濾區之沉澱/薄膜槽 之另一實施態樣之結構示意圖。 第三圖係本發明實施例一之水通量與時間的關係圖。 第四圖係本發明實施例一之透壓與時間的關係圖。 第五圖係本發明實施例一之混沉及薄膜處理後之濁度與 TOC濃度圖。 【主要元件符號對照說明】 • 1快混槽 2慢混槽 3沉澱/薄膜槽 31沉殿區 32薄膜過濾區 33薄膜 3 4隔板 35開口 36污泥排出口 14 d 1298313 37曝氣管 38溢流口 4膠羽 5抽水幫浦 6迴流幫浦 100廢水處理裝置12 (I 1298313 (2lcm (L) x 21cm (w) x 57cm (H)) [L, the aeration tube is installed at the bottom of the film area, by aeration (H; for it, the mesh structure of the hole, Hole diameter: 30: Between, hydrophilic material, the outer dimensions of the membrane plate, the Changshimen Reservoir bottom mud Chengcheng 34 degree raw water money line evaluation test, in order to use the operating conditions to set the flow rate of 55 pull / her, water 'continuous operation During the influent water turbidity 4, _~1〇, _ Ντυ ., ^ water turbidity reduced to an average of 5G NTU, turbidity ^ outflow can maintain 51 = ft woven fabric after δ days of continuous operation High turbidity water, using this operation to control the high turbidity original main treatment experiment (mixed; rational, use small (four) / _ treatment tank (experimental device regulation in the middle turbidity water filtration treatment test, to treat water for medium _, = The turbidity water has been added to the coagulant, and the turbidity is 96 ΝΤΤΤ. Liyuan practiced 'inconvenient, (4) dan μ 3 2 U, and then passed through the non-woven fabric! Hold the water flow, L2 m3/m2/day Flowing to 1.3 NTU, the removal rate is 99% on average. J 卞JJ cattle According to the results of the above examples, the CMP mixing waste can be made by using the water microparticle removal device developed by the present invention. The turbidity of the outflow water drops to intu ^ under the average', and the raw water with medium and high turbidity can be reduced to L3 NTU after being treated by the device, which can effectively remove the miscellaneous particles = the often occurring obstacle of the trough. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The present invention is modified, and therefore, other embodiments are also included in the scope of the present invention. [First Description of the Drawings] The first drawing is a schematic structural view of the underwater particle removing device of the present invention. The second (A) system The invention has the structural schematic diagram of one embodiment of the precipitation/film tank of the precipitation/membrane filtration zone. The second (B) diagram is another embodiment of the precipitation/film tank of the invention having a precipitation/membrane filtration zone. The third figure is a relationship between water flux and time according to the first embodiment of the present invention. The fourth figure is a relationship between the pressure and time of the first embodiment of the present invention. The fifth figure is the first embodiment of the present invention. Mixed And turbidity and TOC concentration diagram after film treatment. [Main component symbol comparison description] • 1 fast mixing tank 2 slow mixing tank 3 sedimentation / film tank 31 sinking area 32 membrane filtration zone 33 film 3 4 partition 35 opening 36 Sludge discharge port 14 d 1298313 37 aeration pipe 38 overflow port 4 glue feather 5 pumping pump 6 reflux pump 100 wastewater treatment device

Claims (1)

Ι298ΓΙ298Γ j 十、申請專利範圍: 1. 種水中微粒去除裝置,包含: 一快混槽; 一慢混槽;及 一沉澱/薄膜槽; 其特徵在於:前述沉澱/薄膜槽中包含:一沉澱區, 用於使前述慢混槽出流水中之膠羽沉澱;及一薄膜過濾 區’該薄膜過濾區包含至少一薄膜,用以過濾經前述沉殿 區沉殿後之水;前述沉澱區及薄膜過濾區係由至少一隔板 區隔且兩區域具有開口可相互連通,且前述隔板高於水面 且相對於廢水處理槽壁呈一傾斜設計,用以使於前述薄膜 隔離區沉澱之膠羽排出而進入沉澱區排出,其中前述薄膜 過濾區係設置於相對於沉澱/薄膜槽底一偏高處。 2·如申睛專利範圍第1項所述之裝置,其中前述沉澱/薄膜 槽進一步具有一污泥排出口,用於使沉澱之膠羽排出。 3·如申请專利範圍第1項所述之裝置,其中前述沉澱/薄膜 槽進一步具有一抽水幫浦,係連接於前述薄膜用以抽取 經薄膜過濾之水。 4·如申请專利範圍第丨項所述之裝置,其中前述隔板係複 數個或單一隔板。 5·如申請專利範圍第1項所述之裝置,其中前述沉澱/薄膜 槽進一步包含一曝氣管,作為降低雜質附著或沉積於薄 膜表面之用。 6. 如申請專利範圍第丨項所述之裝置,其進—步包含一迴 流幫浦’用以將前述薄膜隔離區之水抽取至前述快混槽。 7. 如申請專·圍第1項所述之裝置,其中前述沉澱/薄膜 槽進-步具有一溢流口,其係設置於前述薄膜過滤區之 16 ,1298313 _ 槽體邊。 8.如申請專利範圍第1項所述之裝置,其中前述薄膜之材 質包含不織布、陶瓷膜之UF或MF膜。 . 9.如申請專利範圍第1項所述之裝置,其中前述廢水係包 含:化學機械研磨(CMP)廢水或濁度約100〜10,000NTU 之原水。 10. —種沉澱/薄膜槽,包含: 一沉澱區,用於使廢水中之雜質沉澱;及 0 —薄膜過濾區,該薄膜過濾區包含至少一薄膜,用以 過濾經前述沉澱區沉澱後之水; ^ 前述沉澱區及薄膜過濾區係由至少一隔板區隔且 兩區域具有開口可相互連通,且前述隔板高於水面且相 對於廢水處理槽壁呈一傾斜設計,用以使於前述薄膜隔 離區沉澱之膠羽排出而進入沉澱區排出,其中前述薄膜 過濾區係設置於相對於沉澱/薄膜槽底一偏高處。 11. 如申請專利範圍第10項所述之沉澱/薄膜槽,其係進一 步具有一污泥排出口,用於使沉澱之沉澱物排出。 φ 12.如申請專利範圍第10項所述之沉澱/薄膜槽,其係進一 步具有一抽水幫浦,係連接於前述薄膜,用以抽取經薄 膜過濾之水。 13. 如申請專利範圍第10項所述之沉澱/薄膜槽,其中前述 隔板係為複數隔板或單一隔板。 14. 如申請專利範圍第10項所述之沉澱/薄膜槽,其係進一 步包含一曝氣管,作為降低雜質附著或沉積於薄膜表面 之用。 15. 如申請專利範圍第10項所述之沉澱/薄膜槽,其係進一 步具有一溢流口,其係設置於前述薄膜過濾區之槽體邊。 17 1298313 • 16.如申請專利範圍第10項所述之沉澱/薄膜槽,其中前述 薄膜之材質包含不織布、陶瓷膜之UF或MF膜。 17. —種水中微粒之去除方法,包含下列步驟: (a) 將廢水導入一快混槽,並添加混凝劑及調整pH 值以去除微粒穩定性; (b) 將前述步驟(a)之出流水導入一慢混槽,使廢水中 微粒形成較大膠羽;及 (c) 將前述步驟(b)之流出水導入一如申請專利範圍 第10項所述之沉澱/薄膜槽,前述膠羽於沉澱/薄膜槽内 _ 之沉澱區先進行重力沉降,而槽體内較上層澄清之廢水 ^ 經沉澱/薄膜槽内之薄膜過濾區之薄膜過濾後即可排 出。 18. 如申請專利範圍第17項所述之方法,其係可進一步增加 一迴流程序,使步驟(c)中之薄膜過濾區之廢水再導回前 述快混槽。 19. 如申請專利範圍第17項所述之方法,其中前述步驟(c) 排出之出流水可作為次級用水或RO純水系統之進流水。 φ 20.如申請專利範圍第17項所述之方法,其中前述步驟(c) 經重力沉降後之膠羽可進一步由沉澱/薄膜槽底部之污 泥排出口排出。 21. 如申請專利範圍第17項所述之方法,其中前述沉澱/薄 膜槽進一步具有一抽水幫浦,係連接於前述薄膜,用以 抽取經薄膜過濾之水。 22. 如申請專利範圍第17項所述之方法,前述沉澱/薄膜槽 進一步包含一曝氣管,作為降低雜質附著或沉積於薄膜 表面之用。 23. 如申請專利範圍第17項所述之方法,其中前述步驟(a) 18 1298313 所導入之廢水可先進行快混及慢混之前處理。 24.如申請專利範圍第17項所述之方法,其中前述廢水係包 含:化學機械研磨(CMP)廢水或濁度約100〜10,000NTU 之原水。 25·如申請專利範圍第17項所述之方法,其中前述混凝劑包 含無機混凝劑或有機混凝劑。 26. 如申請專利範圍第25項所述之方法,其中前述無機混凝 劑包含多元氯化鋁、硫酸鋁、硫酸鐵或其組合。 27. 如申請專利範圍第25項所述之方法,其中前述有機混凝 劑包含聚氯化己二烯二曱基胺。 28. 如申請專利範圍第17項所述之方法,其中前述步驟(b) 可進一步添加膠凝劑。 29·如申請專利範圍第28項所述之方法,其中前述膠凝劑包 含高分子聚合物。 30. 如申請專利範圍第28項所述之方法,其中前述膠凝劑 包含聚丙烯蕴胺。 31. 如申請專利範圍第17項所述之方法,其中前述步驟(a) 調整之pH值係為3.0〜7.5。 19j. Patent application scope: 1. A particle removal device for water, comprising: a fast mixing tank; a slow mixing tank; and a sediment/film tank; wherein the precipitating/film tank comprises: a sedimentation zone, And the membrane filtration zone comprises at least one film for filtering water after passing through the sinking chamber of the estuary zone; the precipitating zone and the membrane filtering zone And the two partitions are separated from each other by an opening, and the partitions are higher than the water surface and have an inclined design with respect to the waste water treatment tank wall for discharging the glue feather deposited in the film separation zone. The wastewater is discharged into the sedimentation zone, wherein the membrane filtration zone is disposed at a height relative to the bottom of the sediment/film tank. 2. The apparatus of claim 1, wherein the precipitating/film tank further has a sludge discharge port for discharging the precipitated rubber feathers. 3. The apparatus of claim 1, wherein the precipitating/film tank further has a pumping pump attached to the film for extracting water filtered through the membrane. 4. The device of claim 3, wherein the separator is a plurality or a single separator. 5. The device of claim 1, wherein the precipitating/film tank further comprises an aeration tube for reducing adhesion or deposition on the surface of the film. 6. The apparatus of claim 2, further comprising a recirculating pump for extracting water from said thin film isolation zone to said fast mixing tank. 7. The apparatus of claim 1, wherein the precipitating/film tank advance has an overflow port disposed on the side of the 16 , 1298313 _ tank of the membrane filtration zone. 8. The device of claim 1, wherein the material of the film comprises a UF or MF film of a non-woven fabric, a ceramic film. 9. The apparatus of claim 1, wherein the wastewater comprises chemical mechanical polishing (CMP) wastewater or raw water having a turbidity of from about 100 to 10,000 NTU. 10. A precipitation/film tank comprising: a precipitation zone for precipitating impurities in the wastewater; and 0 - a membrane filtration zone, the membrane filtration zone comprising at least one membrane for filtering after precipitation by the precipitation zone Water; ^ The foregoing precipitation zone and the membrane filtration zone are separated by at least one partition and the two zones have openings to communicate with each other, and the partition is higher than the water surface and has an inclined design with respect to the waste water treatment tank wall for The glue plume precipitated in the film isolation zone is discharged and discharged into the precipitation zone, wherein the film filtration zone is disposed at a height relative to the bottom of the sediment/film tank. 11. The deposit/film tank of claim 10, further comprising a sludge discharge port for discharging the precipitated precipitate. φ 12. The precipitation/film tank of claim 10, further comprising a pumping pump attached to the film for extracting water filtered through the membrane. 13. The deposit/film tank of claim 10, wherein the separator is a plurality of separators or a single separator. 14. The deposit/film tank of claim 10, further comprising an aeration tube for reducing adhesion or deposition on the surface of the film. 15. The deposit/film tank of claim 10, further comprising an overflow port disposed on the side of the tank of the membrane filtration zone. The method of claim 10, wherein the material of the film comprises a UF or MF film of a non-woven fabric or a ceramic film. 17. A method for removing particulates in water, comprising the steps of: (a) introducing waste water into a fast mixing tank, adding a coagulant and adjusting the pH to remove particulate stability; (b) the aforementioned step (a) The outflow water is introduced into a slow mixing tank to form a larger rubber feather in the waste water; and (c) the effluent water in the above step (b) is introduced into the sediment/film tank as described in claim 10 of the patent application, the rubber The sedimentation zone of the plume in the sediment/film tank is first subjected to gravity sedimentation, and the waste water in the tank body is filtered out by the membrane filtration zone in the sediment/film tank after being filtered. 18. The method of claim 17, wherein the recirculation procedure is further followed by recirculating the wastewater from the membrane filtration zone of step (c) back to the aforementioned quick mixing tank. 19. The method of claim 17, wherein the outflow water discharged by the aforementioned step (c) can be used as the influent water of the secondary water or the RO pure water system. Φ 20. The method of claim 17, wherein the gelatinous feathers of the aforementioned step (c) after gravity sedimentation are further discharged from the sludge discharge port at the bottom of the sediment/film tank. 21. The method of claim 17, wherein the precipitating/film tank further has a pumping pump attached to the film for extracting the membrane filtered water. 22. The method of claim 17, wherein the precipitating/film tank further comprises an aeration tube for reducing adhesion or deposition on the surface of the film. 23. The method of claim 17, wherein the wastewater introduced in the aforementioned step (a) 18 1298313 can be subjected to rapid mixing and slow mixing before treatment. 24. The method of claim 17, wherein the wastewater comprises chemical mechanical polishing (CMP) wastewater or raw water having a turbidity of from about 100 to 10,000 NTU. The method of claim 17, wherein the coagulant comprises an inorganic coagulant or an organic coagulant. 26. The method of claim 25, wherein the inorganic coagulant comprises polyaluminum chloride, aluminum sulfate, iron sulfate or a combination thereof. 27. The method of claim 25, wherein the organic coagulant comprises polyhexamethylene dimercaptoamine. 28. The method of claim 17, wherein the aforementioned step (b) may further add a gelling agent. The method of claim 28, wherein the gelling agent comprises a high molecular polymer. 30. The method of claim 28, wherein the gelling agent comprises a polyamine. 31. The method of claim 17, wherein the pH of the step (a) is adjusted to be 3.0 to 7.5. 19
TW94138116A 2005-10-31 2005-10-31 Apparatus and method for removal of particles in water TWI298313B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI421218B (en) * 2011-01-27 2014-01-01 Univ Nat Sun Yat Sen A wastewater pretreatment method for mitigating the clogging of membrane

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI421218B (en) * 2011-01-27 2014-01-01 Univ Nat Sun Yat Sen A wastewater pretreatment method for mitigating the clogging of membrane

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