TWI295382B - A member with concave portions, a method of manufacturing a member with convex portions, a transmission screen, and a rear projection - Google Patents
A member with concave portions, a method of manufacturing a member with convex portions, a transmission screen, and a rear projection Download PDFInfo
- Publication number
- TWI295382B TWI295382B TW094138479A TW94138479A TWI295382B TW I295382 B TWI295382 B TW I295382B TW 094138479 A TW094138479 A TW 094138479A TW 94138479 A TW94138479 A TW 94138479A TW I295382 B TWI295382 B TW I295382B
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- Prior art keywords
- recess
- substrate
- microlens
- recesses
- attached
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 61
- 230000005540 biological transmission Effects 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims description 390
- 239000000463 material Substances 0.000 claims description 118
- 238000000034 method Methods 0.000 claims description 102
- 229920005989 resin Polymers 0.000 claims description 71
- 239000011347 resin Substances 0.000 claims description 71
- 230000000149 penetrating effect Effects 0.000 claims description 32
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims 2
- 210000003423 ankle Anatomy 0.000 claims 1
- 238000004040 coloring Methods 0.000 description 62
- 230000008569 process Effects 0.000 description 57
- 239000007788 liquid Substances 0.000 description 48
- 150000001875 compounds Chemical class 0.000 description 47
- 150000003839 salts Chemical class 0.000 description 31
- 230000000694 effects Effects 0.000 description 29
- 239000011159 matrix material Substances 0.000 description 29
- 230000007547 defect Effects 0.000 description 27
- 125000006850 spacer group Chemical group 0.000 description 24
- 239000011521 glass Substances 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 21
- 239000010410 layer Substances 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 20
- 239000002184 metal Substances 0.000 description 20
- -1 polyethylene, propylene, ethylene-propylene copolymer Polymers 0.000 description 20
- 239000003086 colorant Substances 0.000 description 18
- 238000005530 etching Methods 0.000 description 16
- 238000007789 sealing Methods 0.000 description 15
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000011651 chromium Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 239000000470 constituent Substances 0.000 description 13
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 12
- 239000012965 benzophenone Substances 0.000 description 12
- 239000012964 benzotriazole Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 229920001971 elastomer Polymers 0.000 description 11
- 239000000806 elastomer Substances 0.000 description 11
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000005361 soda-lime glass Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 7
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- 240000005002 Erythronium dens canis Species 0.000 description 6
- 238000003491 array Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000004677 Nylon Substances 0.000 description 5
- 159000000007 calcium salts Chemical class 0.000 description 5
- 230000009931 harmful effect Effects 0.000 description 5
- 238000005470 impregnation Methods 0.000 description 5
- 229920001778 nylon Polymers 0.000 description 5
- 159000000000 sodium salts Chemical class 0.000 description 5
- 238000007711 solidification Methods 0.000 description 5
- 230000008023 solidification Effects 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 4
- 235000019445 benzyl alcohol Nutrition 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 229910000423 chromium oxide Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 4
- 229920000098 polyolefin Polymers 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 241000282465 Canis Species 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000001868 cobalt Chemical class 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000001627 detrimental effect Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000986 disperse dye Substances 0.000 description 3
- 238000004043 dyeing Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000005355 lead glass Substances 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 239000002689 soil Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 235000013399 edible fruits Nutrition 0.000 description 2
- 238000009503 electrostatic coating Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000000411 inducer Substances 0.000 description 2
- 150000002696 manganese Chemical class 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 231100000252 nontoxic Toxicity 0.000 description 2
- 230000003000 nontoxic effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 description 1
- KDTWXGUXWNBYGS-UHFFFAOYSA-N 1,2,3,3,4,4-hexamethyl-5H-diazepine Chemical compound CC1(C(N(N(C=CC1)C)C)(C)C)C KDTWXGUXWNBYGS-UHFFFAOYSA-N 0.000 description 1
- DEWLEGDTCGBNGU-UHFFFAOYSA-N 1,3-dichloropropan-2-ol Chemical compound ClCC(O)CCl DEWLEGDTCGBNGU-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- KMAQBEAXYSNGEG-UHFFFAOYSA-N 3,6-dioxocyclohexa-1,4-diene-1,2,4-tricarbaldehyde Chemical compound C1(C(=C(C(C(=C1)C=O)=O)C=O)C=O)=O KMAQBEAXYSNGEG-UHFFFAOYSA-N 0.000 description 1
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- HIFWQFLGRDJUKC-UHFFFAOYSA-N C(C1=CC=CC=C1)(=O)C1=CC=CC=C1.NC1=CC=CC=C1 Chemical compound C(C1=CC=CC=C1)(=O)C1=CC=CC=C1.NC1=CC=CC=C1 HIFWQFLGRDJUKC-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 241000579895 Chlorostilbon Species 0.000 description 1
- 241000544061 Cuculus canorus Species 0.000 description 1
- 239000005504 Dicamba Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 235000015429 Mirabilis expansa Nutrition 0.000 description 1
- 244000294411 Mirabilis expansa Species 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920000572 Nylon 6/12 Polymers 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920008285 Poly(ether ketone) PEK Polymers 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 240000006394 Sorghum bicolor Species 0.000 description 1
- 235000011684 Sorghum saccharatum Nutrition 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- VEUACKUBDLVUAC-UHFFFAOYSA-N [Na].[Ca] Chemical compound [Na].[Ca] VEUACKUBDLVUAC-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- JPNZKPRONVOMLL-UHFFFAOYSA-N azane;octadecanoic acid Chemical class [NH4+].CCCCCCCCCCCCCCCCCC([O-])=O JPNZKPRONVOMLL-UHFFFAOYSA-N 0.000 description 1
- 159000000009 barium salts Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- PXXJHWLDUBFPOL-UHFFFAOYSA-N benzamidine Chemical compound NC(=N)C1=CC=CC=C1 PXXJHWLDUBFPOL-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- CYDRXTMLKJDRQH-UHFFFAOYSA-N benzododecinium Chemical class CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 CYDRXTMLKJDRQH-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- YISOXLVRWFDIKD-UHFFFAOYSA-N bismuth;borate Chemical compound [Bi+3].[O-]B([O-])[O-] YISOXLVRWFDIKD-UHFFFAOYSA-N 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- MAYPHUUCLRDEAZ-UHFFFAOYSA-N chlorine peroxide Inorganic materials ClOOCl MAYPHUUCLRDEAZ-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-ARJAWSKDSA-N cis-but-2-ene Chemical compound C\C=C/C IAQRGUVFOMOMEM-ARJAWSKDSA-N 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- IWEDIXLBFLAXBO-UHFFFAOYSA-N dicamba Chemical compound COC1=C(Cl)C=CC(Cl)=C1C(O)=O IWEDIXLBFLAXBO-UHFFFAOYSA-N 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- ULFHSQLFQYTZLS-UHFFFAOYSA-N difluoroamine Chemical compound FNF ULFHSQLFQYTZLS-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N dimethylbutene Natural products CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- OSVXSBDYLRYLIG-UHFFFAOYSA-N dioxidochlorine(.) Chemical compound O=Cl=O OSVXSBDYLRYLIG-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- GTNGBHWYALUTBM-UHFFFAOYSA-N diphenylmethanone;hydrochloride Chemical compound Cl.C=1C=CC=CC=1C(=O)C1=CC=CC=C1 GTNGBHWYALUTBM-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000010976 emerald Substances 0.000 description 1
- 229910052876 emerald Inorganic materials 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- IPCSVZSSVZVIGE-UHFFFAOYSA-M hexadecanoate Chemical compound CCCCCCCCCCCCCCCC([O-])=O IPCSVZSSVZVIGE-UHFFFAOYSA-M 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910052806 inorganic carbonate Inorganic materials 0.000 description 1
- 229910052920 inorganic sulfate Inorganic materials 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- JQJCSZOEVBFDKO-UHFFFAOYSA-N lead zinc Chemical class [Zn].[Pb] JQJCSZOEVBFDKO-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-M linolenate Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC([O-])=O DTOSIQBPPRVQHS-PDBXOOCHSA-M 0.000 description 1
- 229940040452 linolenate Drugs 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 210000001589 microsome Anatomy 0.000 description 1
- 235000013536 miso Nutrition 0.000 description 1
- DNYZBFWKVMKMRM-UHFFFAOYSA-N n-benzhydrylidenehydroxylamine Chemical compound C=1C=CC=CC=1C(=NO)C1=CC=CC=C1 DNYZBFWKVMKMRM-UHFFFAOYSA-N 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003864 primary ammonium salts Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 150000003865 secondary ammonium salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 210000000952 spleen Anatomy 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- XBAHDEYDEWBNGW-UHFFFAOYSA-L strontium;2-methylprop-2-enoate Chemical compound [Sr+2].CC(=C)C([O-])=O.CC(=C)C([O-])=O XBAHDEYDEWBNGW-UHFFFAOYSA-L 0.000 description 1
- 229940117986 sulfobetaine Drugs 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
- G03B21/62—Translucent screens
- G03B21/625—Lenticular translucent screens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Overhead Projectors And Projection Screens (AREA)
- Filtering Materials (AREA)
- Combined Means For Separation Of Solids (AREA)
Description
1295382 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種附有凹邱夕接从 ,, 仃负凹°卩之構件、一種製造附有凸部1295382 IX. Description of the Invention: [Technical Field to Be Invented by the Invention] The present invention relates to a member with a concave yoke, a member with a concave concave 卩, and a manufacturing with a convex portion
之構件之方法、一種穿透型屝1^ .. L 牙思玉屏綦及一種背投式投影機。 【先前技術】 近年來,作為家庭劇院監視器、大屏幕電視或其類㈣ 置之適當顯示n,對於背投式投影機之需求日益強烈。於The method of the component, a penetrating type ^1^.. L 牙思玉屏綦 and a rear projection projector. [Prior Art] In recent years, as a home theater monitor, a large-screen television, or the like (4), an appropriate display n has become increasingly demanding for a rear projection projector. to
用於背投式投影機之穿透型屏幕中,普遍使用具備複數個 透鏡之透鏡基板。迄今為止,將具備雙凸透鏡的雙凸透鏡 基板普遍用作透鏡基板。然而,具傷此雙凸透鏡基板的習 知背投式投影機具有一問題:雖然其橫向視角λ,但是苴 垂直視角小(即,在視角中存在偏差)。為了解決該問題,提 出一嘗試:使用其上形成複數個微透鏡之微透鏡片(微透鏡 基板)’則吏得凹部或凸冑具有光學旋轉對稱(例如,參看 JP-A-2000-131506)。 藉由使用-種方法(例如’所謂的21>方法),已習知地 造如上所述的透鏡片(具體言之,微透鏡基板卜於該2ρ^ 法中,供給未固化樹脂於具備複數個凹部的基板上以形成 複數個透鏡,將附有凹部之基板之表面形狀傳遞至所供給 的樹脂(例如,參看jp_A_2003-279949)。 然而’在如上所述的2P方法中存在—問題:難於自附有 凹部之基㈣出固化樹脂。此外’在製造—具備微透鏡作 為透鏡之透鏡基板(微透鏡基板)的情形巾,在㈣成的透鏡 之每一者的尺寸小(即’透鏡之每-者具有細微結構)的情形 106147.doc 1295382 中;在微透鏡基板具有大量透鏡的情形中;在於微透鏡基 板中以高密度方式(例如,1,000個/cm2或更大)形成透鏡的 情形中;在待製造的透鏡基板具有大面積(例如,基板具有 60 cm或更長之對角線長度)的情形中或類似情形中此問題 變得更明顯。認為此係因為:形成於附有凹部之基板之表 面上的微小圖案變成某種狀態,此狀態下其歸因於固著效 應依附至待製造之透鏡基板上。In a transmissive screen for a rear projection type projector, a lens substrate having a plurality of lenses is generally used. Heretofore, a lenticular lens substrate having a lenticular lens has been commonly used as a lens substrate. However, the conventional rear projection projector having the lenticular lens substrate has a problem that although its lateral viewing angle λ, the vertical viewing angle is small (i.e., there is a deviation in the viewing angle). In order to solve this problem, an attempt has been made to use a microlens sheet (microlens substrate) on which a plurality of microlenses are formed to have an optical rotation symmetry (for example, see JP-A-2000-131506). . The lens sheet as described above is conventionally produced by using a method (for example, 'so-called 21> method) (specifically, the microlens substrate is in the 2ρ method, and the uncured resin is supplied in a plural number A plurality of lenses are formed on the substrate of the recesses, and the surface shape of the substrate with the recesses is transferred to the supplied resin (for example, see jp_A_2003-279949). However, 'there is a 2P method as described above--a problem: it is difficult The base is provided with a recess (4) to cure the resin. In addition, in the case of manufacturing a lens substrate (microlens substrate) having a microlens as a lens, the size of each of the (four) lenses is small (ie, 'lens' In the case of a fine structure) 106147.doc 1295382; in the case where the microlens substrate has a large number of lenses; forming a lens in a high density manner (for example, 1,000/cm2 or more) in the microlens substrate In the case of the lens substrate to be manufactured having a large area (for example, the substrate has a diagonal length of 60 cm or more), the problem becomes more conspicuous. Because this system: with a minute pattern formed on the surface of the concave portion of the substrate into a certain state, this state attributed to the anchor effect to be dependent on the manufacturing of the lens substrate.
此外’存在-問題:當自透鏡基板強制地移除附有凹部 之基板時,在附有凹部之基板中及/或在待借助於傳遞形成 之透鏡基板之任何凸部(凸透鏡)中產生諸如裂痕之缺陷。因 此’由於上述的原目,故亦存在透鏡基板之良率極低之問 題。 【發明内容】 本發明之-個目的為提供一種附有凹部之構件,其可 田地用以製造附有各具有_所要形狀之凸部的構件。 、本务明之另-目的為提供—種製造附有凸部之構件之方 法使用3方法可谷易且無誤地製造附有各具 狀之凸部的構件。 听要先 本發明之另一目的A掉> W兩钕供附有凹部之構件。 此外,本發明$疋 α 1…目的為提供具備附有凸部之構件4 牙透型屏幕及背投式投影機。 之一個態樣中,本發明係 附有凹部之構件。附有凹 一者具有兩個主表面,且 為了達成上述目的,在本發明 關於用以製造附有凸部之構件的 部之構件及附有凸部之構件之: 106147.doc I295382 ;附有凸部之構件之兩個 凸邱。太iaa 表面的其中之一上形成複數個 凸二本發明之附有凹部之構件包括: 心:-=,其提供於附有凹部之構件之兩個主表面的 用以m’硬數個第一凹部形成於該第-區域中且其 用二成附有凸部之構件之複數個凸部;及 上區域、’其提供於附有凹部之構件之—個主表面 之每-I 一區域之位置鄰近該第一區或,複數個第二凹部 ’-者之深度淺於複數個第一凹部之每一者之深度。 用有可能提供一附有凹部之構件’該構件可適當地 、以附有各具有一所要形狀之凸部的構件。更具體言 =有可能當在製造附有凸部之構件中自附有凹部:構: 釋出附有凸部之構件時,有效防止在附有凹部之構件中及/ 或在附有凸部之構件所待形成的任何凸部中產生 之缺陷。 衣欣 在本發明之附有凹部之構件中,較佳附有凸部之構件為 修-備自複數個凸部形成的複數個微透鏡的微透鏡基板。 此使侍有可能使用待適當地使用附有凹部之構件而製造 的附有凸部之構件,例如,穿透型屏幕及/或背投式投㈣ =組件(即,微透鏡基板)。此外,尤其在待在一習知方法中 製造之附有凸部之構件為微透鏡基板的情形中,此於一待 形成之附有凹部及/或任何凸部(微透鏡)之構件中容易產生 諸如裂痕之缺點。然而,根據本發明,有可能甚至在製造 微透鏡基板中有效防止產生各種問題。換言之,尤其在將 本發明之附有凹部之構件應用至微透鏡基板之製造的情形 106147.doc 1295382 中顯著地達成了本發明之效果。 —在本發明之附有凹部之構件中,車交佳複數個第一凹部之 每者之深度在8至5〇〇gms圍中。 此使侍有可能:當在製造附有凸部之構件中自附有凹部 之構件釋出附有凸部之構件時,在附有凹部之構件中及/或 在附有凸部之構件所待形成的任何凸部中有效防止產生諸 如裂痕之缺陷。此外’有可能在(例如)使用附有凸部之構件 作為透鏡基板(微透鏡基板)的情形中,顯著提高具備待製造 的附有凸部之構件的屏幕之視角特徵。 —在本么月之附有凹部之構件中,較佳複數個第二凹部之 每者之深度在5至400 μηι範圍中。 二本發明之附有凹部之構件中,較佳第二區域排 =個第-凹部之每一者之短轴線方向的至少—個側面 上之弟一區域。 /树明之时凹部之構件中,較佳在將複數個第一凹 f5每者之冰度定義為叫㈣且將複數個第二凹部之每 -者之深度定義為D2(_之情形中,〇1與〇2滿足關係式 s D! - D2 幺 495 〇 此使付有可能當在製造附有凸部之構件中自附有 之構件時’更有效防止在附有凹部之構 件中及/或在附有凸部之構件所待形成的任何 諸如裂痕之缺陷。 座生 在本發明之附有凹部之構件中,較佳當自附有凹部 件之-個主表面上方觀看時,複數個第一凹部之每—者具 106147.doc 1295382 有-大體上橢圓形狀,其中其在長軸線方向上之長度大於 其在垂直於長軸線方向的短軸線方向上的長度。 、 此使仔有可能當在製造附有凸部之構件中自附有凹部之 ^釋出附有凸部之構件時,更有效防止在附有凹部 件中及/或在附有凸部之構件所待形成的任何凸部中產生 2如裂痕之缺陷。此外,有可能在(例如)使用附有凸部之構 牛:乍為透鏡基板(微透鏡基板)的情形中,提高具備待製 附有凸部之構件的屏幕之視角特徵,同時防止歸因於光之 干擾產生波紋。 ^本發明之附有凹部之構件中,較佳由—具有透明度之 材料形成附有凹部之構件。 因二舉例而言,在附有凹部之構件用以製造微透鏡基 ’ h $中冑可能適當地實施諸如形成黑色矩陣之製程 而=附有凸部之構件(微透鏡基板)移除附有凹部之構 Ί有可此顯著提高具備待製造的微透鏡基板之穿 透型屏幕的光使用效率。 立在,發明之附有凹部之構件中,較佳在將複數個第一凹 :#在短軸線方向上的長度定義為L—)且將複數 二凹部之每一者在長軸線方向上的長度定義為 、月形中’則卜與[2滿足關係式:0.10 < WL2 S 0_99。 ^使得有可能當在製造附有凸部之構件中自附有凹部之 構件釋出附有凸部之構 霉件T ’更有效防止在附有凹部之構 —及/或在附有凸部之構件所待形成的任何凸部中產生 違如裂痕之缺陷。此外,有可能在(例如)使用附有凸部之構 106147.doc 1295382 件作為透鏡基板(微透鏡基板)的情形中,提高具備待製造的 附有凸部之構件的屏幕之視角特徵,同時防止歸因於光之 干擾產生波紋。 在本發明之另—態樣中,本發明係關於-種製造附有凸 部之構件之方法。使用上述附有凹部之構件製造該附有凸 部之構件。 此使得有可能提供—種製造附有凸部之構件之方法,藉 f該方法可容易且無誤地製造附有各具有—所要形狀的凸 I之構件。更具體言之,有可能製造附有凸部之構件同時 =附有凹部之構件釋出附有凸部之構件時,有效防止在 附二凹:之構件令及/或在附有凸部之構件所待形成的任 何凸部中產生諸如裂痕之缺陷。 在本發明之製造附有凸部 包括以下步驟: 卩之構件之方法巾,較佳該方法 製備該附有凹部之構件; 供給具有流動性之-樹脂材料於附有凹部之構件之一個 主表面上,,亥構件上形成該複數個凹部; 固化該樹脂材料以形成-基底構件;及 自該附有凹部之構件釋出該基底構件。 之椹lit可月匕製造附有凸部之構件,同時當自附有凹部 之構件釋出附有凸部之構件時, 更有效防止在附有凹部之 構件中及/或在附有凸部之構 生諸如裂痕之缺陷。Η所絲成的任何凸部中產 在本發明之製造附有凸部之構件之方法中,較佳該基底 106147.doc -10· 1295382 構件釋出步驟包括以下步驟: :二凹部之構件之第二區域釋出該基底構件;及 此伟-凹#之構件之第—區域移除該基底構件。 之構件=可能製造附有凸部之構件,同時當自附有凹部 構件中有凸部之構件時,更有效防止在附有凹部之 $附有凸部之構件所待形成的任何凸部中產 生堵如裂痕之缺陷。 | 在本發明之另_ 有凸 -樣中,本發明係關於使用上述製造附 之方法所製造的附有凸部之構件。 使件有可能提供—附有各具有-所要形狀的凸部之構 狀)。 構件之表面形狀真實地傳遞至該所要形 在本發明之附有凸部之構件巾,較佳由— 材料形成附有凸部之構件。 月度之 錢得有可能適當地㈣时凸部之構件作為(例 透型屏幕及/或背投式投影機之組件(透鏡基板)。 在本發明之另一態樣中,本發明係關於—種穿透型屏 幕。本發明之該穿透型屏幕包括·· 心:Γ耳?鏡,其於其一個主表面上形成具有複數個同 :文ϋ非退耳透鏡之_個主表面組成其_發射表面,· 及 上述附有凸部之構件,於該菲埋耳透鏡之發射表面之側 上排列該附有凸部之構件以使得其上已形成複數個凸部的 其一個主表面面向該菲涅耳透鏡。 106147.doc 1295382 /使得有可能提供—穿透型屏幕,#中可有效防止產生 知因於任何透鏡之缺陷的待投影之影像的問題。 在本發明之另一態樣中,本發明係關於一種背投式投影 機本毛明之为投式投影機包括上述穿透型屏幕。 此使得有可缺供—種背投式投影機,其巾可有效防止 產生I:因於任何透鏡之缺陷的待投影之影像的問題。 【實施方式】Further 'existence-problem: when forcibly removing the substrate with the recess from the lens substrate, such as in a substrate with a recess and/or in any convex portion (convex lens) to be formed by means of transfer Defects in cracks. Therefore, due to the above-mentioned original purpose, there is also a problem that the yield of the lens substrate is extremely low. SUMMARY OF THE INVENTION An object of the present invention is to provide a member with a recess for cultivating a member to which a convex portion having a desired shape is attached. In addition, the purpose of the present invention is to provide a method for manufacturing a member having a convex portion. The method of manufacturing the member having the convex portion of each shape can be easily and without error. It is to be noted that the other object of the present invention is to remove the member to which the recess is attached. Further, the present invention is intended to provide a toothed type screen and a rear projection type projector having a member 4 with a convex portion. In one aspect, the invention is a member to which a recess is attached. The recessed one has two major surfaces, and in order to achieve the above object, the present invention relates to a member for manufacturing a portion with a convex member and a member with a convex portion: 106147.doc I295382; The two convex members of the member of the convex portion. A plurality of convex members are formed on one of the surfaces of the iaa surface. The member having the concave portion of the present invention includes: a heart: -=, which is provided on the two main surfaces of the member to which the concave portion is attached, for m' hard number a recess formed in the first region and using a plurality of protrusions of the member to which the protrusion is attached; and an upper region, each of which is provided to the main surface of the member to which the recess is attached The position is adjacent to the first zone or the depth of the plurality of second recesses is shallower than the depth of each of the plurality of first recesses. It is possible to provide a member with a recessed portion which is suitably attached to a member having a convex portion each having a desired shape. More specifically, it is possible to self-attach a recess in the member to which the convex portion is attached: when the member with the convex portion is released, the member having the concave portion is effectively prevented and/or the convex portion is attached A defect created in any convex portion of the member to be formed. In the member with a concave portion of the present invention, the member to which the convex portion is attached is preferably a microlens substrate which is provided with a plurality of microlenses formed from a plurality of convex portions. This makes it possible to use a member with a convex portion to be manufactured using a member with a recess, such as a penetrating screen and/or a rear projection type (i.e., a microlens substrate). Further, particularly in the case where the member with the convex portion to be manufactured in a conventional method is a microlens substrate, it is easy to be formed in a member to which the concave portion and/or any convex portion (microlens) is to be formed. Produces shortcomings such as cracks. However, according to the present invention, it is possible to effectively prevent various problems from being generated even in the manufacture of a microlens substrate. In other words, the effects of the present invention are remarkably achieved particularly in the case of applying the member with a recess of the present invention to the manufacture of a microlens substrate 106147.doc 1295382. - In the member with a recess of the present invention, each of the plurality of first recesses has a depth of 8 to 5 〇〇 gms. This makes it possible to: when the member with the concave portion is released from the member to which the convex portion is attached, the member with the convex portion is released, in the member with the concave portion and/or the member with the convex portion Any protrusions to be formed are effectively prevented from generating defects such as cracks. Further, it is possible to significantly improve the viewing angle characteristics of the screen having the member with the convex portion to be manufactured, for example, in the case where the member with the convex portion is used as the lens substrate (microlens substrate). - In the component of the month in which the recess is attached, preferably each of the plurality of second recesses has a depth in the range of 5 to 400 μm. In the member with a recessed portion of the invention, it is preferable that the second region is a region of at least one side of the short axis direction of each of the first recesses. In the case of the concave portion of the tree, it is preferable to define the ice degree of each of the plurality of first concaves f5 as called (four) and define the depth of each of the plurality of second concave portions as D2 (in the case of _ 〇1 and 〇2 satisfy the relationship s D! - D2 幺 495 〇 使 使 使 使 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造 制造Or any defect such as a crack to be formed in the member to which the protrusion is attached. The seat is formed in the member with the recess of the present invention, preferably when viewed from above the main surface to which the concave member is attached, Each of the first recesses 106147.doc 1295382 has a substantially elliptical shape in which its length in the long axis direction is greater than its length in the direction of the short axis perpendicular to the long axis direction. When the member with the convex portion is attached to the member to which the convex portion is attached, the member to which the convex portion is attached is released, and any of the member to which the concave portion is attached and/or the member to which the convex portion is attached is more effectively prevented from being formed. Defects such as cracks are generated in the convex portion. In addition, it is possible to In the case where the cow with the convex portion is attached to the lens substrate (microlens substrate), the viewing angle characteristic of the screen having the member to which the convex portion is attached is improved, and the ripple due to the interference of light is prevented. In the member with a recess of the present invention, it is preferable to form a member to which the recess is attached by a material having transparency. For example, in the case where the member with the recess is used to manufacture the microlens base 'h $ Performing a process such as forming a black matrix and a member having a convex portion (microlens substrate) removing the structure with the concave portion can significantly improve the light use efficiency of the transmissive screen having the microlens substrate to be fabricated In the invention with the recessed member, it is preferred to define a plurality of first recesses: #in the short axis direction as L-) and each of the plurality of recesses in the long axis direction. The length on the upper side is defined as, in the moon shape, 'the same as '[2] satisfies the relationship: 0.10 < WL2 S 0_99. ^ makes it possible to release the parting member T' with the convex portion attached to the member to which the concave portion is attached in the member to which the convex portion is attached, more effectively preventing the structure with the concave portion attached thereto - and/or with the convex portion attached thereto Defects that are free of cracks are formed in any of the protrusions to be formed by the member. Further, in the case of using, for example, a member having a convex portion 106147.doc 1295382 as a lens substrate (microlens substrate), it is possible to improve the viewing angle characteristics of the screen having the member with the convex portion to be manufactured, while Prevent ripples due to interference from light. In another aspect of the invention, the invention relates to a method of making a member with a projection. The member to which the projection is attached is manufactured using the member having the recess described above. This makes it possible to provide a method of manufacturing a member with a convex portion by which the member having the convex shape I having the desired shape can be easily and unambiguously manufactured. More specifically, it is possible to manufacture the member with the convex portion while the member with the concave portion releases the member with the convex portion, thereby effectively preventing the member from attaching the concave portion and/or the portion having the convex portion Defects such as cracks are generated in any of the convex portions to be formed of the member. The manufacturing of the present invention includes the following steps: a method of manufacturing a member, preferably a method of preparing the member with a recess; and supplying a fluid-reducing material to a major surface of the member having the recess And forming, the plurality of recesses are formed on the member; the resin material is cured to form a base member; and the base member is released from the member with the recess. The 椹lit can also manufacture the member with the convex portion, and at the same time, when the member attached with the concave portion releases the member with the convex portion, it is more effectively prevented from being in the member with the concave portion and/or with the convex portion The structure is such as a flaw in the crack. Any of the projections formed by the crucible is produced in the method of manufacturing the member with the projections of the present invention. Preferably, the substrate 106147.doc -10·1295382 member release step comprises the following steps: The two regions release the base member; and the first region of the member of the Wei-Concave # removes the base member. Member = it is possible to manufacture a member with a convex portion, and at the same time, when attaching a member having a convex portion in the concave member, it is more effectively prevented from being formed in any convex portion of the member to which the convex portion is attached with the concave portion to be formed Produces defects such as cracks. In another embodiment of the present invention, the present invention relates to a member having a convex portion manufactured by using the above-described manufacturing method. It is possible to provide a member with a configuration having convex portions each having a desired shape. The surface shape of the member is truly transmitted to the member to which the convex portion is attached, and the member to which the convex portion is attached is preferably formed of a material. It is possible for the monthly money to properly (four) the members of the convex portion as (for example, a component of a transmissive screen and/or a rear projection projector (lens substrate). In another aspect of the invention, the invention relates to - A penetrating screen. The penetrating screen of the present invention comprises: a heart-shaped ear mirror, which is formed on one of its main surfaces and has a plurality of main surfaces of the same: a non-retracting lens _ emitting surface, and the above-mentioned member with a convex portion, the convex-attached member is arranged on the side of the emitting surface of the Philippine burying lens such that one main surface surface on which the plurality of convex portions have been formed The Fresnel lens 106147.doc 1295382 / makes it possible to provide a penetrating screen, # can effectively prevent the problem of image to be projected which is caused by defects of any lens. Another aspect of the invention The present invention relates to a rear projection type projector, and the projection projector includes the above-mentioned penetrating type screen. This makes it possible to provide a rear projection type projector, and the towel can effectively prevent the generation of I: Defects of any lens to be projected Like the problem. [Embodiment
參照附圖現在將詳細描述根據本發明之附有凹部之構 件、製造附有凸部之槿株夕古、土 …… 穿透型屏幕及背投式投 影機的較佳實施例。 在此方面’在本發明中’一"基板"表示一概念,其包括 具有-相對大壁厚度且大體上沒有可撓性者、片狀者、薄 膜狀者及其類似物。此外,雖然本發明之附有凹部之構件 及附有凸部之構件及其類似物的應㈣定言之並非受限, 但是在本實施财,將對於时凸部之構件主制作包括 於牙透里屏幕及/或$投式投影機中的微透鏡基板(凸透鏡 基板),且时㈣之構件主判㈣造上述微透鏡基板之 权具(製造微透鏡基板的附有凹部之構件)的情形給出描述。 百先’在描述根據本發明之附有凹部之構件及根據本發 明製造附有凸部之構件之方法之前,將描述本發明之微透 鏡基板(附有凸部之構件)的組態。 性地展示在一根據本發明 1(附有凸部之構件)。圖2 平面圖。現在,在下文使 圖1為一縱向橫截面圖,其示意 之較佳實施例中之一微透鏡基板 為在圖1中所展示之微透鏡基板的 106147.doc -12 - 1295382 用圖1之解釋中,為了便於解釋,分 、 刀另U冉在圖1中之左側及 右側為”光入射側(或光入射表面)” ;久九發射側(或光發射 表面)"。在此方面’在下列描述中’ ”光入射側"及”光發射 側"分別指示用於獲得影像光之光的”光入射側”及”光發射 側,且右未另列出則其不分別指示外部光或類似光的”光 入射側π及”光發射側”。 微透鏡基板(附有凸部之構件)4 —包括在—稍後描述 的穿透型屏幕10中的構件。如圖i所示,微透鏡基板i包括: 在其-個主表面(光入射表面)處具備以一@定圖案排列之 複數個微透鏡(凸部)21的一主基板2;及在其另一個主表面 (光^射表面)上由一具有光屏蔽效應之材料形成.的一黑色 矩陣(光屏蔽層)3。此外,微透鏡基板α其光入射表面(即, 微透鏡21之每-者之光入射側)處具備-著色部(外部光吸 收部)22。 主基板2通常由一透明材料組成。雖然主基板2之組成材 料並非特定叉限,但主基板2由一作為主材料之樹脂材料組 成。該樹脂材料為一具有一預定折射率的透明材料。 至於主基板2之具體組成材料,可提及的有(例如)聚乙 稀、承丙烯、乙烯-丙烯共聚物、乙烯醋酸乙烯酯共聚物 (EVA)及其類似物之聚烯烴、環聚烯烴、變性聚烯烴、聚氯 乙稀、聚二氯亞乙烯、聚苯乙烯、聚醯胺(諸如耐綸ό、耐 綠46、耐論66、耐綸61〇、耐綸612、耐綸η、耐綸12、 耐綸6-12、耐綸6_66)、聚醯亞胺、聚醯胺-醯亞胺、聚碳 酸酯(PC)、聚-(4-甲基戊烯…、離聚物、丙烯酸系樹脂、丙 106147.doc -13- 1295382 烯腈-丁二烯-苯乙烯共聚物(ABS樹脂)、丙烯腈_苯乙烯共聚DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring now to the drawings, a preferred embodiment of a recessed member according to the present invention, a 槿 夕 、 、 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , . In this regard, 'in the present invention' is meant to include a concept having a relatively large wall thickness and substantially no flexibility, a sheet, a film, and the like. In addition, although the member with the recessed portion of the present invention and the member with the convex portion and the like are not limited in terms of the definition, in the present embodiment, the main member of the member for the time convex portion is included in the tooth. a microlens substrate (convex lens substrate) in a transom screen and/or a cast projector, and a member of the fourth component (4) is responsible for making the microlens substrate (a member with a concave portion of the microlens substrate) The situation gives a description. The configuration of the microlens substrate (member with a convex portion) of the present invention will be described before describing the method of attaching the recessed member according to the present invention and the method of manufacturing the member with the convex portion according to the present invention. Sexually shown in a 1 according to the invention (a member with a convex portion). Figure 2 is a plan view. Now, in the following, FIG. 1 is a longitudinal cross-sectional view showing a microlens substrate of the preferred embodiment of the microlens substrate 106117.doc -12 - 1295382 of the microlens substrate shown in FIG. In the explanation, for ease of explanation, the split and the knives are “light incident side (or light incident surface)” on the left and right sides in Fig. 1; the long-negative side (or light emitting surface)". In this respect, 'in the following description, 'the light incident side' and the 'light emitting side' respectively indicate the "light incident side" and the "light emitting side" for obtaining the light of the image light, and the right side is not listed separately. It does not respectively indicate "light incident side π and "light emitting side" of external light or the like. A microlens substrate (member with a convex portion) 4 - a member included in the transmissive screen 10 described later. As shown in FIG. 1, the microlens substrate i includes: a main substrate 2 having a plurality of microlenses (convex portions) 21 arranged in a predetermined pattern at a main surface (light incident surface); and Another main surface (light-emitting surface) is formed of a black matrix (light shielding layer) 3 formed of a material having a light shielding effect. Further, the light incident surface (i.e., the light incident side of each of the microlenses 21) of the microlens substrate α is provided with a colored portion (external light absorbing portion) 22. The main substrate 2 is usually composed of a transparent material. Although the constituent materials of the main substrate 2 are not specifically crossed, the main substrate 2 is composed of a resin material as a main material. The resin material is a transparent material having a predetermined refractive index. As the specific constituent material of the main substrate 2, there may be mentioned, for example, polyolefins, cyclic polyolefins of polyethylene, propylene, ethylene-propylene copolymer, ethylene vinyl acetate copolymer (EVA) and the like. , denatured polyolefin, polyvinyl chloride, polydivinylidene, polystyrene, polyamine (such as nylon, green 46, Nai 66, nylon 61, nylon 612, nylon η, Nylon 12, nylon 6-122, nylon 6_66), polyimine, polyamido-imide, polycarbonate (PC), poly-(4-methylpentene..., ionomer, Acrylic resin, C 106147.doc -13-1295382 Alkonitrile-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymerization
物(AS樹月曰)、丁二稀-苯乙烯共聚物、聚甲酸、聚乙浠醇 (PVA)、乙烯乙烯醇共聚物(EV0H)、諸如聚對苯二甲酸乙 二醇酯(PET)、聚對苯二曱酸丁二醇酯(PBT)及聚環己胺對 苯二甲酸酯(pct)之聚酯、聚醚、聚醚酮(PEK)、聚醚醚酮 (PEEK)、聚醚醯亞胺、聚縮駿(P〇M)、聚苯醚、變性聚苯 醚、聚颯、聚醚砜、聚苯硫醚、聚芳酯、諸如芳族聚酯之 液晶聚合物、諸如聚四氟乙烯(PTFE)、聚偏氟乙烯及其類 似物之氟樹脂、諸如基於苯乙烯之彈性體、基於聚烯烴之 彈性體、基於聚氯乙稀之彈性體、基於聚氨脂之彈性體、 基於聚酯之彈性體、基於聚醯胺之彈性體、基於聚丁二烯 之彈性體、基於反聚異戊二烯之彈性體'基於氟碳化物橡 膠之彈性體、基於氣化聚乙烯之彈性體及其類似物的各種 熱塑彈性體、環氧樹脂、酚系樹脂、尿素樹脂、美耐孤樹 脂、不飽和聚酯、基於矽之樹脂、基於胺酯之樹脂及其類 似物;及具有至少該等材料之其中一者作為一主要成2的 共聚物、摻合體及共聚體合金及其類似物。此外,在本發 明中’可利用該等材料之兩者或兩者以上種類的混合物⑽ 如,摻合樹脂、共聚體合金、使用上述材料之兩者或兩者 以上包含兩層或兩層以上的層狀體)。 組成主基板2之樹脂材料通常具有某一絕對折射率,其大 於各處氣體(即,使用微透鏡基板丨處之氣體)之每一絕對折 射率。較佳該樹脂材料之具體絕對折射率在12至19之範圍 中。更佳其在丨观⑺之範圍中,且進一步更佳其在二5 106147.doc -14- 1295382 至㈣之範圍中。在該樹脂材料之絕對折射率具有在上述 範圍内的-預定值的情形中,有可能進一步提高具備微透 鏡基板!的穿透型屏幕1G之視角特徵,同時保㈣透型屏幕 10之光使用效率。(AS tree sorghum), butyl di-styrene copolymer, polyformic acid, polyethylene glycol (PVA), ethylene vinyl alcohol copolymer (EV0H), such as polyethylene terephthalate (PET) Polybutylene terephthalate (PBT) and polycyclohexylamine terephthalate (pct) polyester, polyether, polyetherketone (PEK), polyetheretherketone (PEEK), Polyether phthalimide, polypyrene (P〇M), polyphenylene ether, denatured polyphenylene ether, polyfluorene, polyethersulfone, polyphenylene sulfide, polyarylate, liquid crystal polymer such as aromatic polyester, Fluororesins such as polytetrafluoroethylene (PTFE), polyvinylidene fluoride and the like, such as styrene-based elastomers, polyolefin-based elastomers, polyvinyl chloride-based elastomers, polyurethane-based Elastomers, polyester-based elastomers, polyamine-based elastomers, polybutadiene-based elastomers, anti-polyisoprene-based elastomers, fluorocarbon-based elastomer-based elastomers, based on gasification Various thermoplastic elastomers of polyethylene elastomers and the like, epoxy resins, phenolic resins, urea resins, melamine resins, unsaturated polyesters The silicon-based resin, ester based resin, the amine and analogs thereof; and wherein at least one of these materials as a main component of the copolymer 2, copolymer blends and alloys thereof and the like. Further, in the present invention, a mixture (10) of two or more kinds of these materials may be used, for example, a blended resin, a copolymer alloy, or both or more of the above materials may be used in two or more layers. Layered body). The resin material constituting the main substrate 2 usually has an absolute refractive index which is greater than each absolute refractive index of the gas (i.e., the gas at which the microlens substrate is used). Preferably, the resin material has a specific absolute refractive index in the range of 12 to 19. More preferably it is in the range of (7), and further preferably in the range of 2 5 106147.doc -14 - 1295382 to (d). In the case where the absolute refractive index of the resin material has a predetermined value within the above range, it is possible to further improve the micromirror substrate! The viewing angle of the penetrating screen 1G while maintaining the light efficiency of the (4) transmissive screen 10.
微透鏡基板1具備複數個微透鏡21,其於其允許光自其進 入微透鏡基板1之光人射表面之側上各具有—凸表面作為 凸透鏡。在本實施例中,微透鏡21之每一者具有一扁平形 狀(在此情形中’該形狀包括一大體橢圓形、二大體半圓形 及將-大體圓形之頂部及底部削去之形狀),其中當自微透 鏡基板1之光人射表面上方觀看時,其縱向寬度大於其橫向 寬度。在微透鏡21之每一者具有該形狀的情形t,有可能 顯著提高具備微透鏡基板i的穿透型屏幕10之視角特徵,同 時有效防止產生諸如波紋之缺點。詳言之,在此情形中, 有可能提高於具備微透鏡基板丨的穿透型屏幕10之水平及 垂直方向上的視角特徵。 在當自微透鏡基板1之光入射表面上方觀看時,將在微透 鏡21之每一者在其短軸線(副軸)方向上的長度(或間距)定 義為ί1(μιη)且將微透鏡21之每一者在其長軸線(主軸)方向 上的長度(或間距)定義為“(μιη)的情形中,較佳之比 值在ο·ιο至〇·"之範圍中(即,較佳L^L2滿足關係式:〇 ι〇 $ L!/L2 S 〇·99)。更佳其在〇·5〇至〇95之範圍中,且進一步 更佳其在0·60至0.80之範圍中。藉由約束Li/L2之比值在上 述範圍内,上述之效果可顯而易見。 較佳當自微透鏡基板1之光入射表面上方觀看時,微透鏡 106147.doc 1295382 21之每一者在副軸方向上的長度(或間距)^在⑺至 之範圍中。更佳其在30至300 μπΐ2範圍中,且進一步更佳 其在50至100 μπι之範圍中。在將微透鏡以之每一者在副軸 方向上的長度約束於上述範圍内的情形中,有可能於待於 穿透型屏幕10上投影的影像中獲得足夠解析度且進一步增 強微透鏡基板1(包括穿透型屏幕1〇)之生產率,同時有效防 止產生諸如波紋之缺點。 此外,較佳當自微透鏡基板丨之光入射表面上方觀看時, 微透鏡21之每一者在主軸方向上的長度(或間距)^在15至 7〇〇μιη之範圍中。更佳其在40至 400 μm之範圍中,且進一 步更佳其在70至15〇 ^瓜之範圍中。在將微透鏡21之每一者 在主軸方向上的長度約束於上述範圍内的情形中,有可能 於待於穿透型屏幕10上投影的影像中獲得足夠解析度且進 一步增強微透鏡基板1(包括穿透型屏幕1〇)之生產率,同時 有效防止產生諸如波紋之缺點。 此外,較佳微透鏡21之每一者在其副軸方向上的曲率半 拴(下文中簡稱為”微透鏡21之曲率半徑”)在5至15〇 之範 圍中。更佳其在15至150 μιη之範圍中,且進一步更佳其在 25至50 μιη之範圍中。藉由約束微透鏡21之曲率半徑在上述 範圍内,有可能提咼具備微透鏡基板1的穿透型屏幕10之視 角特徵。詳言之,在此情形中,有可能提高於具備微透鏡 基板1的穿透型屏幕10之水平及垂直方向上的視角特徵。 此外,在將微透鏡21之每一者之高度定義為H(^m)且將微 透鏡21之每一者在其短軸線(副軸)方向上的長度定義為 106147.doc •16- 1295382The microlens substrate 1 is provided with a plurality of microlenses 21 each having a convex surface as a convex lens on the side of the light incident surface on which the light is allowed to enter the microlens substrate 1. In the present embodiment, each of the microlenses 21 has a flat shape (in this case, the shape includes a substantially elliptical shape, a substantially semi-circular shape, and a shape in which the top and bottom of the substantially circular shape are removed. Wherein, when viewed from above the light-emitting surface of the microlens substrate 1, its longitudinal width is greater than its lateral width. In the case t in which each of the microlenses 21 has the shape, it is possible to significantly improve the viewing angle characteristics of the transmissive screen 10 having the microlens substrate i while effectively preventing the occurrence of disadvantages such as ripples. In particular, in this case, it is possible to improve the viewing angle characteristics in the horizontal and vertical directions of the transmissive screen 10 having the microlens substrate 丨. When viewed from above the light incident surface of the microlens substrate 1, the length (or pitch) in the direction of each of the microlenses 21 in the short axis (secondary axis) thereof is defined as ί1 (μιη) and the microlens is In the case where the length (or pitch) of each of the major axes (spindle) directions is defined as "(μιη), the preferred ratio is in the range of ο·ιο to 〇·" (i.e., preferably L^L2 satisfies the relationship: 〇ι〇$ L!/L2 S 〇·99). More preferably it is in the range of 〇·5〇 to 〇95, and further preferably it is in the range of 0·60 to 0.80. By limiting the ratio of Li/L2 within the above range, the above effects are apparent. Preferably, when viewed from above the light incident surface of the microlens substrate 1, each of the microlenses 106147.doc 1295382 21 is on the minor axis. The length (or pitch) in the direction is in the range of (7) to. More preferably, it is in the range of 30 to 300 μπΐ2, and further preferably it is in the range of 50 to 100 μπι. In the case where the length in the direction of the minor axis is restricted within the above range, there is a possibility that the screen 1 to be penetrated A sufficient resolution is obtained in the image projected on 0 and the productivity of the microlens substrate 1 (including the transmissive screen 1) is further enhanced while effectively preventing the occurrence of defects such as ripples. Further, it is preferable to light from the microlens substrate. When viewed from above the incident surface, the length (or pitch) of each of the microlenses 21 in the direction of the main axis is in the range of 15 to 7 μm, more preferably in the range of 40 to 400 μm, and further It is in the range of 70 to 15 瓜. In the case where the length of each of the microlenses 21 in the main axis direction is restricted to the above range, it is possible to project on the penetrating screen 10. A sufficient resolution is obtained in the image and the productivity of the microlens substrate 1 (including the transmissive screen 1) is further enhanced while effectively preventing the occurrence of defects such as ripples. Further, each of the preferred microlenses 21 is in the direction of the minor axis thereof. The upper radius of curvature (hereinafter simply referred to as "the radius of curvature of the microlens 21") is in the range of 5 to 15 Å, more preferably in the range of 15 to 150 μηη, and further preferably it is in the range of 25 to 50 μm In the range By constraining the radius of curvature of the microlens 21 within the above range, it is possible to improve the viewing angle characteristics of the transmissive screen 10 having the microlens substrate 1. In detail, in this case, it is possible to improve the microlens substrate. The viewing angle characteristics of the penetrating screen 10 in the horizontal and vertical directions. Further, the height of each of the microlenses 21 is defined as H (^m) and each of the microlenses 21 is on its short axis. The length in the (sub-axis) direction is defined as 106147.doc •16- 1295382
Ll_的情形中’嶋丨滿足關係式:o.2〇“l/HmIn the case of Ll_, '嶋丨 satisfies the relationship: o.2〇' l/Hm
更佳Η#!滿足關係式:〇5 9,且進一步更佳H 扣滿;UI係式:G.9_<Li/Hq.4。在_Li滿足此一關係 的情形中,有可能顯著提高視角特徵,同時有效防止歸因 於光之干擾而產生波紋。 此^將複數個微透鏡21以犬牙格子方式排列於主基板2 上。猎由以此方式排列複數個微透鏡21,有可能有效防止 產生諸如波紋之缺點。另一方面,(例如)在將微透鏡21以方 形格子方式或其類似方式排列於主基板2上的情形中,很難 充刀防止產生諸如波紋之缺點。此外’在將微透鏡^以隨 式排歹j於主基板2上的情形中,很難充分提高微透鏡2】 在形成微透鏡21之可用面積中之所占面積比率,且很難充 分提高進入微透鏡基板丨中之透光率(光使用效率)。另外, 所獲得之影像變暗。 在本實施例中,雖然如上所述當自微透鏡基板丨之一個主 表面上方觀看時,複數個微透鏡21以犬牙格子方式排列於 主基板2上,但是較佳複數個微透鏡21組成之一第一行乃 相對於鄰近第一行25之一第二行26平移半個間距。此使得 有可能顯著提高視角特徵,同時有效防止歸因於光之干擾 產生波紋。 & 如上所述,藉由指定微透鏡(凸部)21之每一者之形狀、 微透鏡2 1之排列圖案、微透鏡2丨之所占面積比率等等,有 可能顯著提高視角特徵,同時有效防止歸因於光之干掙產 生波紋。 & 106147.doc 17- 1295382 此外,微透鏡21之每一者形成為一向其光入射側突出之 凸透鏡,且設計成其焦點f位於提供於黑色矩陣(光屏蔽層 上之每-開口 31附近。換言之,微透鏡基板i之微透鏡^ 之每一者將自一大體上垂直於微透鏡基板丨之方向上進入 微透鏡基板1的平行光La(稍後描述來自菲涅耳透鏡5之平 行光La)聚光,且將其聚焦於提供於黑色矩陣(光屏蔽層)3 上之每-開口 31之附近的焦點f上。以此方式,因為透過微 透鏡2丨之每一者之光聚焦於黑色矩陣3之每一開口 ^附 近,所以有可能顯著增強微透鏡基板丨之光使用效率。此 外,因為透過微透鏡21之每一者之光聚焦在黑色矩陣(光屏 蔽層)3之每-開口 3 1附近,所以有可能減少每—開口 3工之 面積。 此外,較佳當自微透鏡基板丨之光入射表面上方(即,在 圖2中展不之方向)觀看時,由於形成微透鏡2丨之可用面積 (即,可用透鏡面積)中之所有微透鏡21佔據的面積(被投影 之面積)相對於整個可用面積之比值為90%或更大。更佳該 比值為96%或更大’進—步更佳該比值在97%至Μ·”,。的範 圍中。在由於可用面積中之所有微透鏡(凸透鏡)21佔據的面 積#對於整個可用面積之比值為9〇%或更大的情形中,有 可此減 > 透過除了微透鏡21所佔據之面積之外的其它面積 的直光’且此使得進一步有可能增強具備微透鏡基板1之穿 透里井幕10之光使用效率。在此方面,在當自微透鏡基板1 之光入射表面上方觀看時’將一個微透鏡2 1之自該微透鏡 2 1中心至_山 户Φ成面積(其上未形成包括該微透鏡2 1之四 106147.doc -18- 1295382 個鄰近微透鏡21)之中心的方向上之長度定義為一化爪),且 將4 Μ透鏡21之中心與該非形成面積之中心的長度定義為 Ε4(μηι)的情形中,可由線段之長度與線段之 長度之比值(即,LVL4 X 100 (%))近似由在形成微透鏡21之 可用面積中之所有微透鏡21佔據的面積(被投影之面積)相 對於整個可用面積之比值(參看圖2)。 在此方面,形成對應於附有凹部之構件6之第二凹部62 籲 (將稍後詳細描述)的凸部通常提供於形成如上述微透鏡21 之可用透鏡區域之外。在借助於稍後將描述的製造方法獲 得主基板2之後,借助於諸如研磨及拋光之方法可移除此等 凸。卩(對應於第二凹部62之凸部)。或者,藉由將其切斷可移 除幵y成對應於弟二凹部62之凸部之區域。換言之,微透鏡 基板1可不具備對應於第二凹部62之凸部。 此外,如上所述,著色部22提供於微透鏡基板!之光入射 表面上(即,於微透鏡21之每一者之光入射側上)。自其光入 籲 射表面進入说透鏡基板1之光可有效透過此一著色部22,且 著色部22具有一功能,其防止反射外界光至微透鏡基板ι 之光發射側。藉由提供此一著色部22,有可能獲得一具有 卓越對比度之投影影像。 詳言之,在本發明中,著色部22為藉由供給一著色液體 (特定言之,具有一特殊組合物特徵之著色液體)於主基板2 上形成的(將稍後描述)。為了詳細解釋此特殊特徵,著色部 22為藉由供給一著色液體(將稍後描述)於主基板2上以使得 106147.doc -19- 1295382 在該著色液體中之著色劑注入主基板2(微透鏡21)之内部而 形成的。與在將著色部22層疊於主基板2之一個主表面上的 情形相比較,在以此方式形成著色部22的情形中有可能提 高著色部22之黏著力。結果(例如)有可能更無誤地防止對微 透鏡基板之光學特徵產生一有害影響,該有害影響歸因於 在著色部22與主基板2之間之介面附近中折射率的變化。 此外,因為藉由供給該著色液體於主基板2上形成著色部 22,所以有可能減少各自部分之厚度變化(詳言之,不對應 於主基板2之表面形狀之厚度變化)。此使得有可能防止在 投影影像中產生諸如色彩不均勻之缺點。此外,雖然著色 部22由一含有一著色劑之材料組成,但是其主要組份大體 與主基板2(微透鏡基板丨)之主要組份相同。因此,在著色部 22與其它非著色部之間之邊界附近幾乎不能產生折射率或 類似特徵之迅速變化。結果,很容易總體上設計微透鏡基 板1之光學特徵,且有可能穩定微透鏡基板丨之光學特徵且 提高其可靠性。 著色層22之色彩密度並非特定受限。較佳由基於光譜透 射率之Y值(D65/2視角)指示的著色層22之色彩密度在2〇〇/0 至85%之範圍中。更佳其在35%至7〇%之範圍中。在將著色 部22中之著色劑之濃度約束在上述範圍中的情形中,有可 能顯著提高由透過微透鏡基板!之光形成之影像的對比 度。另一方面,在著色部22之色彩密度低於上面所給的下 限的況中,入射光之透光率降低且所獲得的影像不能具 有足夠売度。結果,存在影像之對比度不足之可能性。此 106147.doc -20- 1295382 外’在著色部2 2之色彩密度尚於上面所給的上限的情形 中,很難充分防止反射外界光(即,自與光入射側相對之側 進入微透鏡基板1之外界光),且因為當在明亮空間内完全 關閉光源時黑色指示(黑色亮度)之前側亮度之量變大,所以 存在不能充分獲得提高投影影像之對比度的效果之可能 性。 竿父佳者色部22之色彩為 著色部22之色彩並非特定受 一消色彩色,尤其使用一著色劑(其中其色彩係基於藍色及 鲁 紅色,將棕色或黃色混合於其中)之黑色作為外觀。此外, 較佳一光源之具有用於控制光之三種原色(RGB)平衡的特 定波長之光在著色部22中受到選擇性吸收或透過著色部 22此使知有可能防止反射外界光。可精確表現自透過微 透鏡基板1之光形成的影像之色調,且色度座標變寬(使得 色調表現之寬度充分變寬),且因此可表現一更暗之黑色。 結果,有可能顯著提高影像之對比度。 • '匕外,黑色矩陣3提供於微透鏡基板1之光發射表面上。 在此情形中’黑色矩陣3由具有一光屏蔽效應之一材料組成 且以層疊方式形成。藉由提供此一黑色矩陣3,有可能於黑 色矩陣3中吸收外界光(其對於形成投影影像非較佳),且因 ^有可f提高於屏幕上投影之具有卓越對比度之影像。詳 :提仏上述著色部22及黑色矩陣3 ’有可能增強由 被透鏡基板1投影之吾彡德& Ρ之衫像的對比度。此_黑色 微透鏡21之每一去夕出从、卜Α ^ 先的先路上具備複數個開口 3 1。因 而,由微透鏡21之每一者螯 考來先之先可有效透過黑色矩陣3 106147.doc 1295382 之開口 3 1結果,有可能提高微透鏡基板!之光使用效率。 此外’較佳黑色矩陣3之平均厚度在〇〇1至5 _之範圍 中。更佳其在G.01至3㈣之範圍中,且進一步更佳其在〇〇3 至1 ’之範圍中。在將黑色矩陣3之平均厚度約束在上述範 圍内的情形中,有可能更有效履行黑色矩陣3之功能,同時 更無决地防止黑色矩陣3之諸如分開及裂痕之非自主缺 點。舉例而言,有可能提高投影至具備微透鏡基板1之穿透 型屏幕10之屏幕的影像的對比度。 其-人,現在將描述一具備如上所述之微透鏡基板1之穿透 型屏幕10。 圖3為一縱向橫截面圖’其示意性地展示在根據本發明之 車又“實%例中具備在圖J中所展示之微透鏡基板丨的一穿 透型屏幕10。如圖3所示,穿透型屏幕1〇具備一菲涅耳透鏡 5及上述微透鏡基板丨。將菲涅耳透鏡5排列於微透鏡基板工 之光入射表面之側上(即,於用於一影像之光之入射側上广 且穿透型屏幕10建構成由菲淫耳透鏡5透射之光進入微透 鏡基板1。 菲涅耳透鏡5具備以大體上同心方式於菲涅耳透鏡5之光 發射表面上形成的複數個稜鏡。菲涅耳透鏡5偏轉來自一投 影透鏡(在圖中未圖示)且用於一投影影像之光,且輸出平行 於微透鏡基板丨之主表面的垂直方向之平行光^至微透鏡 基板1之光入射表面之側。 在如上所述建構之穿透型屏幕10中,菲涅耳透鏡5偏轉來 自投影透鏡之光以變成平行光La。然後,該平行光La自其 106147.doc -22- 1295382 上形成複數個微透鏡2 1之光入射表面進入微透鏡基板丨,以 由微透鏡基板1之微透鏡2 1之每一者聚光,且接著聚焦該經 聚光之光且該經聚光之光透過黑色矩陣(光屏蔽層之開口 3 1。此時,進入微透鏡基板1之光以足狗透射率透過微透鏡 基板1,且接著漫射透過開口 31之光,藉此穿透型屏幕1〇 之一觀察者(觀眾)觀察(觀看)到一扁平影像。 然後,將描述附有凹部(用於製造一微透鏡基板)之基板 及根據本發明製造附有凹部之基板之方法,附有凹部之基 板可適當地用以製造如上所述之微透鏡基板(附有凸部之 構件)1 〇 圖4為一平面圖,其示意性地展示在本發明之一實施例中 一附有凹部之構件6。圖5A及5B分別為圖4中所展示之附有 凹部之構件6的一部分放大圖及一縱向橫截面圖。圖6為一 縱向橫截面圖,其示意性地展示一製造圖4及圖5中所展示 之附有凹部之構件6的方法。在此方面,雖然在製造用於製 造微透鏡基板1之具備複數個凹部61之構件6中實際上於基 底構件7之一個主表面上形成用於形成微透鏡21之複數個 凹部,且在製造微透鏡基板丨中實際上於主基板2之一個表 面上形成複數個凸部,但是為了使得解釋可理解,展示^ 有凹部之構件6之一部分以在圖4至6中進行強調。 首先描述可用以製造-微透鏡基板(附有凸部之構件^ 之附有凹部(用於製造一微透鏡基板)之構件6之組態。 用於製造一微透鏡基板1之附有凹部之構件6可由諸如各 種金屬材料、各種玻璃材料及各種樹脂材料之任何材料形 106147.doc -23- 1295382 成。在附有凹部之構件6由任何且右1 ,、 1 1 j /、有其卓越形狀穩定性之材 料形成的情形中,有可能顯荖孜_ 此”、、員者改良设數個第一凹部61之每 一者之形狀穩定性(可靠性),且蟑士々_ 1 罪⑸且评5之可能提高使用附有凹 部之構件6之複數個第一凹部61待形成的微透抑之每一 f之尺度精確度。此外,亦有可能提高作為透鏡基板之微 鏡基板1之光學特徵的可靠性。至於第1部61之每一者 之具有卓越形狀穩定性之材料’可提及的有(例如)各種金屬Better Η#! Satisfaction relationship: 〇5 9, and further better H is full; UI system: G.9_<Li/Hq.4. In the case where _Li satisfies this relationship, it is possible to significantly improve the viewing angle characteristics while effectively preventing ripples due to interference of light. This multiplexes the plurality of microlenses 21 on the main substrate 2 in a dog-tooth lattice manner. By arranging a plurality of microlenses 21 in this manner, it is possible to effectively prevent the occurrence of disadvantages such as ripples. On the other hand, for example, in the case where the microlenses 21 are arranged on the main substrate 2 in a square lattice manner or the like, it is difficult to fill the blade to prevent the occurrence of disadvantages such as ripples. Further, in the case where the microlens is arranged on the main substrate 2, it is difficult to sufficiently increase the ratio of the area of the microlens 2 in the usable area in which the microlens 21 is formed, and it is difficult to sufficiently increase the area ratio. The light transmittance (light use efficiency) entering the microlens substrate 丨. In addition, the obtained image becomes dark. In the present embodiment, although a plurality of microlenses 21 are arranged on the main substrate 2 in a dog-tooth lattice manner when viewed from above one main surface of the microlens substrate, as described above, a plurality of microlenses 21 are preferably formed. A first row is translated by a half pitch relative to a second row 26 adjacent one of the first rows 25. This makes it possible to significantly improve the viewing angle characteristics while effectively preventing ripples due to interference of light. & As described above, by specifying the shape of each of the microlenses (convex portions) 21, the arrangement pattern of the microlenses 21, the area ratio of the microlenses 2, and the like, it is possible to significantly improve the viewing angle characteristics. At the same time, it effectively prevents the ripples from being caused by the light. Further, each of the microlenses 21 is formed as a convex lens that protrudes toward the light incident side thereof, and is designed such that its focal point f is located in the black matrix (near the opening 31 on the light shielding layer). In other words, each of the microlenses of the microlens substrate i will enter the parallel light La of the microlens substrate 1 from a direction substantially perpendicular to the direction of the microlens substrate ( (the parallel from the Fresnel lens 5 will be described later). The light La) condenses and focuses it on the focal point f provided in the vicinity of each opening 31 on the black matrix (light shielding layer) 3. In this way, since each of the light passing through the microlens 2 is light Focusing on the vicinity of each opening of the black matrix 3, it is possible to significantly enhance the light use efficiency of the microlens substrate. Further, since the light transmitted through each of the microlenses 21 is focused on the black matrix (light shielding layer) 3 Each opening - is adjacent to the opening 31, so it is possible to reduce the area of each opening. Further, it is preferable to view from above the light incident surface of the microlens substrate (i.e., in the direction shown in Fig. 2) Forming a microlens 2丨The ratio of the area occupied by all the microlenses 21 in the usable area (i.e., the available lens area) (the area projected) to the entire usable area is 90% or more. More preferably, the ratio is 96% or more. Preferably, the ratio is in the range of 97% to Μ·,. The ratio of the area # occupied by all the microlenses (convex lenses) 21 in the available area to the entire usable area is 9〇% or more. In the case, there is a possibility that the light is transmitted through the area other than the area occupied by the microlens 21' and this makes it possible to further enhance the light use efficiency of the through-hole screen 10 having the microlens substrate 1. In this aspect, when viewed from above the light incident surface of the microlens substrate 1, 'the center of the microlens 21 from the center of the microlens 21 to the area of the mountain Φ is formed (the microlens is not formed thereon) 2 1 4 106147.doc -18-1295382 The length in the direction of the center of the adjacent microlens 21) is defined as a claw, and the length of the center of the 4 Μ lens 21 and the center of the non-formed area is defined as Ε4 In the case of (μηι), the line segment can be The ratio of the length to the length of the line segment (i.e., LVL4 X 100 (%)) approximates the ratio of the area occupied by all the microlenses 21 in the usable area forming the microlens 21 (the area projected) to the entire available area ( Referring to Fig. 2). In this regard, the convex portion forming the second concave portion 62 corresponding to the member 6 with the concave portion (which will be described in detail later) is generally provided outside the usable lens region forming the microlens 21 as described above. After the main substrate 2 is obtained by means of a manufacturing method which will be described later, such convexity can be removed by means of, for example, grinding and polishing (corresponding to the convex portion of the second concave portion 62). Or, by The removable 幵 y is cut to correspond to the area of the convex portion of the second recess 62. In other words, the microlens substrate 1 may not have a convex portion corresponding to the second concave portion 62. Further, as described above, the colored portion 22 is provided on the microlens substrate! The light is incident on the surface (i.e., on the light incident side of each of the microlenses 21). Light from the light incident surface into the lens substrate 1 can be efficiently transmitted through the colored portion 22, and the colored portion 22 has a function of preventing reflection of external light to the light emitting side of the microlens substrate ι. By providing this coloring portion 22, it is possible to obtain a projected image with excellent contrast. In detail, in the present invention, the colored portion 22 is formed on the main substrate 2 by supplying a colored liquid (specifically, a colored liquid having a characteristic of a particular composition) (to be described later). In order to explain this particular feature in detail, the coloring portion 22 is injected into the main substrate 2 by supplying a coloring liquid (to be described later) on the main substrate 2 such that 106147.doc -19-1295382 in the coloring liquid is injected into the main substrate 2 ( Formed inside the microlens 21). In the case where the coloring portion 22 is formed in this manner, it is possible to improve the adhesion of the colored portion 22 as compared with the case where the colored portion 22 is laminated on one main surface of the main substrate 2. As a result, for example, it is possible to prevent a harmful influence on the optical characteristics of the microlens substrate, which is attributed to a change in refractive index in the vicinity of the interface between the colored portion 22 and the main substrate 2, without any error. Further, since the coloring portion 22 is formed on the main substrate 2 by supplying the colored liquid, it is possible to reduce the thickness variation of the respective portions (in detail, it does not correspond to the thickness variation of the surface shape of the main substrate 2). This makes it possible to prevent disadvantages such as color unevenness in the projected image. Further, although the colored portion 22 is composed of a material containing a coloring agent, its main component is substantially the same as that of the main substrate 2 (microlens substrate). Therefore, a rapid change in refractive index or the like is hardly produced in the vicinity of the boundary between the colored portion 22 and the other non-colored portion. As a result, it is easy to design the optical characteristics of the microlens substrate 1 as a whole, and it is possible to stabilize the optical characteristics of the microlens substrate and improve its reliability. The color density of the colored layer 22 is not particularly limited. Preferably, the color density of the color layer 22 indicated by the Y value based on the spectral transmittance (D65/2 viewing angle) is in the range of 2 〇〇 / 0 to 85%. More preferably it is in the range of 35% to 7%. In the case where the concentration of the coloring agent in the colored portion 22 is restricted to the above range, there is a possibility that the transmission of the microlens substrate is remarkably improved! The contrast of the image formed by the light. On the other hand, in the case where the color density of the colored portion 22 is lower than the lower limit given above, the light transmittance of the incident light is lowered and the obtained image cannot have sufficient twist. As a result, there is a possibility that the contrast of the image is insufficient. This 106147.doc -20- 1295382 externally, in the case where the color density of the colored portion 2 2 is still above the upper limit given above, it is difficult to sufficiently prevent reflection of external light (that is, entering the microlens from the side opposite to the light incident side) The substrate 1 is outside the light), and since the amount of the front side luminance of the black indication (black luminance) becomes large when the light source is completely turned off in the bright space, there is a possibility that the effect of improving the contrast of the projected image cannot be sufficiently obtained. The color of the coloring portion 22 of the uncle is that the color of the colored portion 22 is not specifically subjected to a color, especially a coloring agent in which the color is based on blue and lush, and brown or yellow is mixed therein. As an appearance. Further, it is preferred that a light source having a specific wavelength for controlling the balance of three primary colors (RGB) of light is selectively absorbed in the colored portion 22 or transmitted through the coloring portion 22, thereby making it possible to prevent reflection of external light. The hue of the image formed by the light transmitted through the microlens substrate 1 can be accurately expressed, and the chromaticity coordinates are widened (so that the width of the hue expression is sufficiently widened), and thus a darker black can be expressed. As a result, it is possible to significantly improve the contrast of the image. • 'Outside, the black matrix 3 is provided on the light emitting surface of the microlens substrate 1. In this case, the 'black matrix 3' is composed of a material having a light shielding effect and is formed in a stacked manner. By providing such a black matrix 3, it is possible to absorb external light in the black matrix 3 (which is not preferable for forming a projected image), and it is possible to improve the image with excellent contrast projected on the screen. In detail, it is possible to enhance the contrast of the Uwader & 衫 衫 投影 投影 投影 着色 着色 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Each of the _ black microlenses 21 has a plurality of openings 3 1 on the first road from the first to the second. Therefore, each of the microlenses 21 can be effectively etched first through the opening 3 1 of the black matrix 3 106147.doc 1295382, which makes it possible to increase the microlens substrate! Light use efficiency. Further, the average thickness of the preferred black matrix 3 is in the range of 〇〇1 to 5 _. More preferably it is in the range of G.01 to 3 (d), and further preferably it is in the range of 〇〇3 to 1 '. In the case where the average thickness of the black matrix 3 is confined within the above range, it is possible to more effectively perform the function of the black matrix 3 while more indiscriminately preventing the involuntary disadvantages of the black matrix 3 such as separation and cracking. For example, it is possible to increase the contrast of an image projected onto the screen of the transmissive screen 10 having the microlens substrate 1. A person who will now describe a transmissive screen 10 having the microlens substrate 1 as described above. Figure 3 is a longitudinal cross-sectional view schematically showing a transmissive screen 10 having a microlens substrate 在 shown in Figure J in a vehicle according to the present invention. The penetrating screen 1A includes a Fresnel lens 5 and the microlens substrate 丨. The Fresnel lens 5 is arranged on the side of the light incident surface of the microlens substrate (ie, for an image) The wide-screen and penetrating screen 10 on the incident side of the light is constructed to enter the microlens substrate 1 by the light transmitted by the Philippine lens 5. The Fresnel lens 5 is provided with a light emitting surface of the Fresnel lens 5 in a substantially concentric manner. a plurality of turns formed thereon. The Fresnel lens 5 deflects light from a projection lens (not shown) for use in a projected image, and the output is parallel to the vertical direction of the major surface of the microlens substrate The parallel light is incident on the side of the light incident surface of the microlens substrate 1. In the transmissive screen 10 constructed as described above, the Fresnel lens 5 deflects light from the projection lens to become parallel light La. Then, the parallel light La forms a complex number from 106147.doc -22- 1295382 The light incident surface of the microlens 21 enters the microlens substrate 以 to be condensed by each of the microlenses 2 1 of the microlens substrate 1, and then the concentrated light is focused and the concentrated light is transmitted through the black a matrix (opening 31 of the light shielding layer. At this time, the light entering the microlens substrate 1 passes through the microlens substrate 1 at a dog's transmittance, and then diffuses the light transmitted through the opening 31, thereby penetrating the screen 1 An observer (viewer) observes (views) a flat image. Then, a substrate with a concave portion (for manufacturing a microlens substrate) and a method for manufacturing a substrate with a concave portion according to the present invention, with a concave portion, will be described The substrate can be suitably used to manufacture a microlens substrate (member with a convex portion) as described above. FIG. 4 is a plan view schematically showing a member 6 with a concave portion in an embodiment of the present invention. 5A and 5B are a partial enlarged view and a longitudinal cross-sectional view, respectively, of the member 6 with a recess shown in Fig. 4. Fig. 6 is a longitudinal cross-sectional view schematically showing a manufacturing diagram 4 and The member 6 with the recess shown in FIG. In this regard, although a plurality of recesses for forming the microlenses 21 are actually formed on one main surface of the base member 7 in the member 6 having the plurality of recesses 61 for manufacturing the microlens substrate 1, and A plurality of convex portions are actually formed on one surface of the main substrate 2 in the manufacture of the microlens substrate ,, but in order to make the explanation understandable, a portion of the member 6 showing the concave portion is emphasized in Figs. 4 to 6. A configuration of a member 6 for manufacturing a microlens substrate (a member to which a convex portion is attached) for attaching a concave portion for manufacturing a microlens substrate is described. A member for manufacturing a microlens substrate 1 with a concave portion 6 may be formed of any material such as various metal materials, various glass materials, and various resin materials 106147.doc -23- 1295382. In the case where the member 6 to which the recess is attached is formed of any material having a right shape, a right shape, and a material having excellent shape stability, it may be apparent that the member is improved. The shape stability (reliability) of each of the recesses 61, and the gentleman's sin (5) and the evaluation of 5 may increase the micro-transparent to be formed by the plurality of first recesses 61 of the member 6 with the recessed portion The accuracy of the scale of each f. In addition, it is also possible to improve the reliability of the optical characteristics of the micromirror substrate 1 as a lens substrate. As for the material having excellent shape stability of each of the first portions 61, it may be mentioned There are (for example) various metals
材料、各種玻璃材料及類似材料。 此外,在附有凹部之構养6 ώ且古 , 稱仵6由具有透明度之材料形成的情 形中’有可能於主基板2之一個主表面上形成一黑色矩陣 3’同時在製造微透鏡基…之方法㈣有凹部之構件6與主 基板2緊密接觸(即,沒有自主基板2移除附有凹部之構件 6卜此使得有可能適當地提高主基板2之可操縱性且於其上 形成色矩陣3。至於具有透明度之材料,可提及的有(例 如)各種樹脂材料、各種玻璃材料及類似材料。 ,用於製造-微透鏡基板i之附有凹部之構件6具有一形 ,/、中第凹邛61對應於組成微透鏡基板(附有凸部之構 件)1之微透鏡(凸部)21,且附有凹部之構件6具備用於形成 微透鏡21之複數個第—凹部61 ’其以對應於微透鏡基板i 之微透鏡21之排列圖案排列。第一凹部61之每—者通常具 有大體上與微透鏡21之每—者相同之尺寸(該相同除了微 透鏡21之每一者為一凸部,同時第一凹部“之每—者為一 P且八彼此互為鏡像關係之外),且第一凹部6丨具有與 Μ透鏡21相同的排列圖案。 106147.doc -24- 1295382 為詳細解釋,第一凹部61(用於形成微透鏡21)之每一者 具有一扁平形狀(在此情形中,此一形狀包括一大體橢圓 形、一大體半圓形及將一大體圓形之頂部及底部削去之形 狀)’其中當自用於製造微透鏡基板丨之附有凹部之構件6之 一個主表面上方觀看時,其垂直寬度大於橫向寬度(即,其 在長軸線方向上之長度大於其在短軸線方向上之長度)。在 第一凹部61之每一者具有此一形狀的情形中,有可能當在 製造微透鏡基板1 (即是,主基板2)成為附有凸部之構件中自 参 附有凹部之構件6釋出附有凸部之構件(主基板2)時,更有效 防止在附有凹部之構件6中及/或在微透鏡基板丨中待形成 的微透鏡21中產生諸如裂痕之缺陷。此外,有可能適當地 利用微透鏡基板1之製造,其可顯著改良視角特徵同時有效 防止產生諸如波紋之缺點。 此外,在當自附有凹部之基板6之一個主表面上觀看時將 第一凹部61之每一者在其短軸線(或副軸)方向的長度(或間 着距)定義為LiOun)且將第一凹部61之每一者在其長軸線(或 主軸)方向的長度(或間距)定義為L2(jLlm)的情形中,較佳 IVL2之比值在0·10至〇·99之範圍中(即,。與^滿足關係 式·· 〇.1〇 SIVL2 S 0.99)。更佳其在〇·5〇至〇 95之範圍中, 且進一步更佳其在0·60至G.8G之範圍中。藉由約束Li/I^ 比值在上述範圍内,上述之效應可顯而易見。 此外,較佳當自附有凹部之構件6之一個主表面上方觀看 %,第一凹部61之每一者在其副軸方向的長度(或間距)^ 在10至5〇〇μΐη2範圍中。更佳其在3〇至3〇〇4111之範圍中, 106147.doc -25- 1295382 步更佳其在5G至⑽_之範圍中。在將第—凹部^ 中者在一1軸方向的長度Ll約束於上述範圍内的情形 择有可能待於穿透型屏幕1G上投影㈣像中獲得足夠解 進一步增強微透鏡基板U及附有凹部之構件6)之生 產率,同時有效防止產生諸如波紋之缺點。 此外’較佳當自附有都 ^ 韦凹4之構件6之一個主表面上方觀看 ^凹"卩61之每一者在其主軸方向的長度(或間距)L2 至7〇〇_之範圍中。更佳其在40至__之範圍中, 且:-步更佳其在70至15〇 _之範圍中。在將第一凹部“ 之母者在其主軸方向的長度l2約束於上述範圍内的情形 中’有可能待於穿透型屏幕10上投影的影像中獲得足夠解 析度且進一步增強微透鏡基板Η及附有凹部之構件6)之生 產率,同時有效防止產生諸如波紋之缺點。 7一此外,車交佳第一凹部61之每一者在其副軸方向的曲率半 徑(下文中,簡稱為”第一凹部61之曲率半徑,,)在5至15〇 之範圍中。更佳其在15至15〇 ^❿之範圍中,且進一步更佳 其在25至50 μηΐ2範圍中。藉由約束第一凹部61之曲率半徑 在上述範圍内,有可能改良具備微透鏡基板丨的穿透型屏幕 之視角特徵。詳言之,在此情形中,有可能改良於具備 微透鏡基板1的穿透型屏幕1〇之水平及垂直方向上的視角 特徵。 而且,較佳第一凹部61之每一者之深度在8至5〇〇4111之範 圍中。更佳其在15至150 μηι之範圍中,且進一步更佳其在 25至50 μηι之範圍中。在約束第一凹部61之每一者之深度在 106147.doc -26- 1295382 上面範圍内的情形中,有可能當在製造微透鏡基板“即, 主基板2)作為附有凸部之構件中自附有凹部之構件6釋出 附有凸部之構件(主基板2)時,更有效防止在附有凹部之構 件6中及/或在微透鏡基板丨所待形成的微透鏡η十產生諸 如裂痕之缺陷。此外,有可能挺古 百了肖b ^阿具備該待製造之微透鏡 基板1的穿透型屏幕之視角特徵。 此外’在第—凹部61之每-者之深度Μ為叫㈣且將 弟一凹部61之每一者在其短軸線方向之長度定義為Llalm) 的情形中,較佳_Ll滿;^關係式:G.2(^Li/Dim 更佳〇與1^滿足關係式:0·5 sLi/Di m且進一步更佳 i^Ll滿足關係式:〇 9以i/Diq.4。在娜滿足上㈣ 係的情形中,有可能顯著提高待製造之微透鏡基板i之視角 特徵,同時有效防止歸因於光之干擾產生波紋。 此外,雖然在形成第一凹部61之第一區域67(即,一對應 於微透鏡基板1之可用透鏡區域之區域)中第一凹部61之密 度並非特定受限,但是較佳在第一區域67中第一凹部611 狁度在1’000至500,000個/cm2之範圍中。更佳其在5,_至 20M00個/cm2之範圍中,且進一步更佳其在1〇,’〇〇〇至 1〇〇,〇〇0個/cm2之範圍中。在約束第一凹部61之密度在上述 範圍内的情形中’有可能獲得一於具備待使用附有凹部之 構件6製造之微透鏡基板.丨的穿透型屏幕1〇中待投影的具有 足夠高解析度的影像。此外,在稍後將描述的製造微透鏡 基板1之方法中,有可能更有效防止在附有凹部之構件6中 及/或在微透鏡21中產生諸如裂痕之缺陷。 106147.doc -27- 1295382 部1::數:第一凹部61以犬牙格子方式排列於附有凹 凹料,有可::?面上。藉由以此方.式排列複數個第-月匕有效防止產生諸如波紋之缺點。另一 :=_以方形格子方式或類似方式排_ 產生心 —個主表面上的情形中,报難充分防止 排列於°波紋之缺點。此外,在將第—凹部61以隨機方式 排列於附有^Materials, various glass materials and similar materials. Further, in the case where the recessed portion is provided and the yttrium 6 is formed of a material having transparency, it is possible to form a black matrix 3' on one main surface of the main substrate 2 while manufacturing the microlens base. (4) The member 6 having the concave portion is in close contact with the main substrate 2 (that is, the member 6 having the recessed portion is removed without the autonomous substrate 2, thereby making it possible to appropriately improve the maneuverability of the main substrate 2 and form thereon Color matrix 3. As the material having transparency, there may be mentioned, for example, various resin materials, various glass materials, and the like. The member 6 for manufacturing the microlens substrate i having the concave portion has a shape, / The middle recess 61 corresponds to a microlens (protrusion) 21 constituting the microlens substrate (member with a convex portion) 1, and the member 6 with the concave portion is provided with a plurality of first recesses for forming the microlens 21. 61' is arranged in an arrangement pattern of the microlenses 21 corresponding to the microlens substrate i. Each of the first recesses 61 generally has the same size as each of the microlenses 21 (the same except for the microlenses 21) Each is a convex At the same time, the first recesses are "each P" and eight are outside each other in a mirror image relationship, and the first recesses 6A have the same arrangement pattern as the pupil lens 21. 106147.doc -24- 1295382 For a detailed explanation Each of the first recesses 61 (for forming the microlenses 21) has a flat shape (in this case, the shape includes a substantially elliptical shape, a substantially semicircular shape, and a substantially circular top portion and a bottom-cut shape) wherein the vertical width is greater than the lateral width when viewed from above a major surface of the member 6 with the recess for manufacturing the microlens substrate (ie, its length in the long axis direction is greater than its In the case where each of the first recesses 61 has such a shape, it is possible that when the microlens substrate 1 is manufactured (that is, the main substrate 2) becomes a member to which a convex portion is attached When the member 6 to which the recess is attached is released from the member (the main substrate 2) to which the projection is attached, the microlens 21 to be formed in the member 6 with the recess and/or in the microlens substrate 更 is more effectively prevented. Produces defects such as cracks. It is possible to appropriately utilize the manufacture of the microlens substrate 1, which can remarkably improve the viewing angle characteristics while effectively preventing the occurrence of disadvantages such as corrugations. Further, the first concave portion is viewed when viewed from one main surface of the substrate 6 to which the concave portion is attached. Each of the lengths (or the inter-distances) of each of the first recesses 61 is defined as LiOun) and the length of each of the first recesses 61 in the direction of its long axis (or major axis) (or In the case where the pitch is defined as L2 (jLlm), the ratio of the preferred IVL2 is in the range of 0·10 to 〇·99 (ie, the relationship with ^ is satisfied. 〇.1〇SIVL2 S 0.99). It is in the range of 〇·5〇 to 〇95, and further preferably it is in the range of 0·60 to G.8G. By constraining the Li/I^ ratio within the above range, the above effects can be made apparent. Further, it is preferable that the length (or the pitch) of each of the first recesses 61 in the direction of the minor axis is in the range of 10 to 5 〇〇 μ η 2 when % is viewed from above one main surface of the member 6 to which the recess is attached. More preferably, it is in the range of 3〇 to 3〇〇4111, and 106147.doc -25-1295382 is more preferably in the range of 5G to (10)_. In the case where the length L1 of the first recessed portion is restricted within the above range in the 1-axis direction, it is possible to project on the transmissive screen 1G (4) to obtain sufficient solution to further enhance the microlens substrate U and attach The productivity of the member 6) of the recess, while effectively preventing the occurrence of disadvantages such as ripples. In addition, it is preferable that the length (or the pitch) of each of the main surfaces of the member 6 which is attached to the member 4 of the pleats 4 is in the range of the length (or the pitch) L2 to 7 〇〇 in the direction of the main axis. in. More preferably it is in the range of 40 to __, and the :-step is better in the range of 70 to 15 〇. In the case where the length l2 of the mother of the first recess "in the main axis direction is constrained within the above range", it is possible to obtain sufficient resolution in the image projected on the transmissive screen 10 and further enhance the microlens substrate. And the productivity of the member 6) to which the recess is attached, and at the same time effectively preventing the occurrence of disadvantages such as corrugation. Further, in addition, the radius of curvature of each of the first recesses 61 of the vehicle is in the direction of the minor axis (hereinafter, simply referred to as " The radius of curvature of the first recess 61 is in the range of 5 to 15 。. More preferably it is in the range of 15 to 15 〇 ^ ,, and further preferably it is in the range of 25 to 50 μη ΐ 2 . By constraining the radius of curvature of the first recess 61 within the above range, it is possible to improve the viewing angle characteristics of the transmissive screen having the microlens substrate 丨. In particular, in this case, it is possible to improve the viewing angle characteristics in the horizontal and vertical directions of the transmissive screen 1 having the microlens substrate 1. Moreover, it is preferred that each of the first recesses 61 has a depth in the range of 8 to 5 〇〇 4111. More preferably it is in the range of 15 to 150 μηι, and further preferably it is in the range of 25 to 50 μηι. In the case where the depth of each of the first recesses 61 is constrained to be in the range of 106147.doc -26 - 1295382, it is possible to manufacture the microlens substrate "i.e., the main substrate 2" as a member with a convex portion. When the member 6 with the concave portion releases the member (the main substrate 2) to which the convex portion is attached, it is more effective to prevent the microlens to be formed in the member 6 with the concave portion and/or the microlens substrate to be formed. In addition, there is a defect such as a crack. In addition, it is possible to have a viewing angle characteristic of the transmissive screen of the microlens substrate 1 to be manufactured. Further, the depth of each of the first recesses 61 is In the case of (4) and the length of each of the recesses 61 in the short axis direction is defined as Llalm), it is preferable that _Ll is full; ^ relation: G.2 (^Li/Dim is better and 1) ^ Satisfaction relation: 0·5 sLi/Di m and further better i^Ll satisfies the relationship: 〇9 is i/Diq.4. In the case where Na satisfies the above (four) system, it is possible to significantly improve the micro to be manufactured. The viewing angle characteristic of the lens substrate i while effectively preventing generation of ripple due to interference of light. Further, although the first recess 6 is formed The density of the first recess 61 in the first region 67 of 1 (i.e., a region corresponding to the available lens region of the microlens substrate 1) is not particularly limited, but preferably the first recess 611 is in the first region 67. It is in the range of 1'000 to 500,000 / cm 2 , more preferably in the range of 5, _ to 20 M00 / cm 2 , and further preferably it is 1 〇, '〇〇〇 to 1 〇〇, 〇〇 0 In the range of the number of cm/cm 2. In the case where the density of the first recess 61 is constrained within the above range, it is possible to obtain a penetrating screen 1 having a microlens substrate manufactured by using the member 6 with the recess attached. An image having a sufficiently high resolution to be projected in the crucible. Further, in the method of manufacturing the microlens substrate 1 to be described later, it is possible to more effectively prevent the member 6 with the recess and/or the microlens 21 from being attached. Defects such as cracks are generated. 106147.doc -27- 1295382 Part 1:: Number: The first recess 61 is arranged in a dog-toothed lattice with a concave and concave surface, and can be::? Arranging a plurality of first-months effectively prevents the occurrence of defects such as ripples. Another: =_ in a square lattice Or in a similar manner, in the case of generating a heart on a main surface, it is difficult to adequately prevent the disadvantages of being arranged in the corrugation. Further, the first recess 61 is arranged in a random manner in the attached ^
分提-第—表面上的情形中,很難充 凹部61在形成第—凹部61之可用面積(可用透 中兄及μ ^積㈣,且絲充分提高錢透鏡基板 5附有凹部之構件中之透光率(即,光使用效率)。另 外,所獲得之影像變暗。 此外,雖然如上所述當自附有凹部之構件6之一個主表面 上方觀看¥,第—凹部61以犬牙格子方式排列於附有凹部 之構件6上,但較佳當自附有凹部之構件6之一個主表面上 方,看時,_第_行第_凹部61相對於鄰近該第—行第一 ^之第一行第一凹部61平移第一凹部61之每一者在 八軸線方向上之半個間距。此使得有可能當在製造;^透 鏡基板U主基板2)成為附有凸部之構件中自附有凹心 :6釋出附有凸部之構件(主基板2)時,更有效防止在附有凹 邛之構件6 _及/或在微透鏡基板丨所待形成的任何微透鏡 21中產生諸如裂痕之缺陷。此外,在待製造的微透鏡基板工 中’有可能顯著提高視角特徵,㈣有效防止歸因於光之 干擾產生波紋。 現在, 在使用附有凹部之構件製造一具有對應於附有凹 106147.doc -28- 1295382 枝構件之大量凹部的大量凸部(凸透鏡)之附有凸部 1的情形中’存在一問題:很難自附有凹部之構件釋出附 =凸部之構件。認為此係因為:形成於附有凹部之基板之 二的—微小圖案變成某—狀態’其中其歸因於固著效 ^待製造的透鏡基板。此外,當自如此製造的附有 凸。卩之構件強制地移除附有凹部之構件時,存在一問題·· (m:部之形狀變換形成的附有凹部之構件及/或凸部 透鏡)之諸如裂痕之缺陷。因而,由於上述的原因,故亦 二明:::使得附有凸部之構件之良率極低。相應地, =者堅持敏銳的檢查以解決上述問題。結果,本發明 Γ:至附Γ!有凹部之構件釋出附有凸部之構件的情形 初始步㈣凹之構件及附有凸部之構件的應力在釋出之 ΰ γ (更具體言之,在初始步驟中進 凸部之步驟)較大,且在進行完成了自凹部釋出 部之凸部之後,該應力隨即降低 /成於相 藉由於形成對應於待形成之凸Μ 本發明者發現, (第-區域或可用區域):提=7 每一者之深声、〜 u二凹部’第二凹部之 有P 述凹部(第-凹部)之每-者之深产), =::::=之構_ 有凹部之構件的情:有可忐甚至在重複使用附 A 4 — 1月肜中防止產生上述問題。 在本貫施例中,除了提 部之構件6(用於製&〆、—凹部61之外,附有凹 (即,對應於微透鏡基板二=成:-凹部61之區域 用透鏡£域之第一區域07)外 W6147.doc -29- 1295382 具備複數個第二凹部62。更且认甘丄 邱6m —「、 更,、體5之,於其中形成第一凹 〇 域67之兩個末端側之在其縱向上(其中一個 末端對應於自附有凹部之構件 杜彳9少踩山, 偁仵6之主基板(附有凸部之構 _、釋出起始側)之每-側提供其中形成第二凹部^之第 二區域(非可用區域)68。 藉由以此方式㈣於其中形成第—凹部61之第—區域Μ 於該釋出起始側提供第二凹部62(第二區域68),有可能當自 附有凹部之構件釋出主基板2時,吸收至附有凹部之構:6 及/或待形成之主基板2的應力進入第二凹部62之形成 (即’對應於微透鏡基板1之非可用透鏡區域的附有凹部之 構件之第二區域68)。因而,當釋出時應力在第—凹部㈠之 形成區域(即’第一區域67)及微透鏡基板1之可用透鏡區域 中減少,且因此,有可能以相對小的力穩定地實施該釋出。 另外,有可能有效防止在附有凹部之構件6及/或主基板6之 凹·凸圖案中產生缺陷。纟士果,右 、、口果有可肖b延長附有凹部之構件 6之壽命。此外’藉由使用本發明之附有凹部之構件$,有 可能穩定地製造微透鏡基板i(主基板2),且此使得有可能提 高微透鏡基板丨之生產率。在使用本發明之时凹部之構件 6裝k的本發明之微透鏡基板(附有凸部之構件)ι中,有可能 有效防止產生凹-凸圖案之諸如裂痕之缺點,且本發明之: 透鏡基板(附有凸部之構件)1具有卓越品質(詳言之,光學特 被)。此外,此使得有可能提高微透鏡基板i之生產率。 雖然只要第二凹部62之每一者之深度淺於第一凹部6丄之 母一者之深度則其不特定受限,但是較佳第二凹部62之每 106147.doc -30- 1295382 二者之深度在5至4〇〇μπι之範圍中。更佳其在15至15〇叫^之 粑圍中,且進一步更佳其在25至50 μηι之範圍中。在約束第 ^之母者之味度在上述範圍内的情形中,有可能 田在製ie Μ透鏡基板丨(即,主基板2)作為附有凸部之構件中 自附有凹。卩之構件6釋出附有凸部之構件(主基板2)時,更有 效防止在附有凹部之構件6中及/或在微透鏡基板丨所待形 成的微透鏡21中產生諸如裂痕之缺陷。 此外,在將複數個第—凹部之每—者之深度定義為 〇1(μΠ1)且將複數個第二凹部之每—者之深度定義為D2〇tm) 的情形中’較佳〇1與〇2滿足關係式:3<Di_Dd 495。更 佳滿足關係式:5<D1 _ I 2〇〇,且進一步更佳 d#d2滿足關係式:心D1_D2<5G。在〜糾滿足上述 關係的情形中,有可能當在製造微透鏡基板i(即,主基板2) 作為附有凸部之構件中自附有凹部之構件6釋出附有凸部之 構件(主基板2)時’更有效防止在附有凹部之構件6中及/或在 微透鏡基板i所待形成的微透鏡21中產生諸如裂痕之缺陷。 面上方觀看時’第二凹部62之每—者之尺寸小於第一凹部 61之每-者之尺寸。在第二凹部以每—者之尺寸以此方 式小於第—1部61之每—者之尺寸的情形中,有可能有效 吸收在第二凹部62附近至附有凹部之構件…或主基板2 此外,在本實施例中,當自附有凹部之構件6之-個主表 的應力,且有可能進一步顯著地達成上述效果。此外,在 第二凹部62之每—者之尺寸相對小的情形中,冑可能減少 至第二凹部62附近的應力。因此’有可能顯著改良附有凹 106147.doc -31 · 1295382 邛之構件6(詳言之,第二凹部62附近)之 有可能顯著改良附有凹部之構件6之耐田 疋性。結果, 提高微透鏡基板!之生產率。 肖性。此外,有可能 此外’在本實施例中’在第二區域68(即,第_ 形成區域)中第二凹部68之密度 凹部62之 6之一個主表面上古從主+ 田自附有凹部之構件 表面上方觀看時,每單位面 之個數低於在第一區域67中的第一凹部/ =二:㈣ 此方式接徂筮-A 之在度。藉由以 方式知ί、第一凹部62(第二區域6 上述效果,且有可能改良第二凹c者地達成 性。因而,有可能改W右立丨2之母一者之形狀穩定 百了此改良附有凹部之構件6之耐用性 得有可能提高微透鏡基板1之良率。 乂 成第二凹部62之第二區域“中第二凹部以之密 二i:〇r限,但是較佳在第二區域68中第二凹㈣之 又,〇至500,000個/⑽2之範圍中。更佳其在5 〇〇〇至 = 〇,〇〇〇個W之範圍中,且進—步更佳其在_至 1M00個W之範圍中。在約束第二凹部以密度在上述範 圍内的情形中,有可能更顯著地達成上述效果。因而,有 :能改良第二凹部62之每一者之形狀穩定性,且有可能顯 者改良附有凹部之構件6之耐用性。 y卜在將第-區域67中帛一凹部61之密度定義為山(個 /')且將第二區域68中第二凹部62之密度定義為以個 /cm2)的情形中,較佳di與d2滿足關係式:0.001$di/d〆 〇·999。更佳di_2滿足關係式:〇 〇ι < 且進 一步更佳dl與d2滿足關係式:〇·〇5 < d"d“ 〇.80。最佳dl 106147.doc -32 - 1295382 與d2滿足闕係式·· 〇 ·〗〈 係的情形中,有可处1 2 — .^在山與心滿足上述關 有了犯更顯著地達成上述效 能改良第二凹部62之每一 , 改良古ππ μ 之形狀穩疋性,且有可能顯著 改良附有凹部之構件6之耐用性。 此外,在本實施例尹 一凹邻61 > h γ ^歹〗弟一凹。卩62以使得自形成第 凹W61之側(即,第_ f £域67之側)向附有凹部之構件6之 末鈿邛分凹部62第二凹部 能更顯著地達成上料果:漸稀疏。此使得有可 夕…成述效果。因而’有可能改良第二凹部62 之母一者之形狀穩定性,且有 件6之耐用性。 “者改良附有凹部之構 第二凹部62之每-者之形狀(當自附有凹部之構^之一 個主表面上觀看時的其形狀)並非特Μ限。至於此形狀, 可k及的有:例如)圓形、其中第二凹苦⑹之每—者之垂 直長度大於其水平長度的扁平形(包括擴圓形)、其中 部62之每一者之水平長度大於其垂直長度的扁平形、其中 其垂直與水平長度之其中-者隨機大於另-者的扁平形。 此外,在第二區域68中第二凹部62之數量並非特定受 限。在以線性方式(即,在大體上垂直於釋出方向之方向: 線性)於第二區域68中提供第二凹部62的情形中,較佳如此 所提供的第二凹部62之陣列之數量在約1〇至5〇,〇〇〇之範圍 中。更佳其在約500至1〇,〇〇〇之範圍中,且進—步更佳其在 2,000至5,_之範圍中。此使得有可能充分且顯著地達:上 述效果,同時防止不必要的過多放大微透鏡基板丨之非可用 透鏡區域。另外,有可能改良第二凹部62之每一者之带狀 106147.doc -33- 1295382 穩定性,且有可能顯著改良附有凹部之構件6之耐用性。In the case of the fractional-first surface, it is difficult to fill the recessed portion 61 with the usable area of the first recess 61 (available through the middle and the μ (4), and the filament sufficiently improves the member of the money lens substrate 5 with the recessed portion The light transmittance (i.e., light use efficiency). In addition, the obtained image becomes dark. Further, although the ¥ is viewed from above one main surface of the member 6 to which the concave portion is attached as described above, the first concave portion 61 is a canine lattice The arrangement is arranged on the member 6 with the recess, but preferably above the main surface of the member 6 to which the recess is attached, when viewed, the _th row _ recess 61 is adjacent to the first line adjacent to the first line The first row of first recesses 61 translates a half pitch of each of the first recesses 61 in the direction of the eight axes. This makes it possible to make the lens substrate U main substrate 2) into a member with a convex portion. Self-attached with a concave core: 6, when the member with the convex portion (main substrate 2) is released, it is more effective to prevent any microlens 21 to be formed on the member with the concave portion 6 and/or the microlens substrate Defects such as cracks are produced. In addition, it is possible to significantly improve the viewing angle characteristics in the microlens substrate to be manufactured, and (iv) to effectively prevent the occurrence of waviness due to the interference of light. Now, in the case where a convex portion 1 having a large number of convex portions (convex lenses) corresponding to a large number of concave portions to which the concave member 106147.doc -28-1295382 is attached is manufactured using the member with the concave portion, there is a problem: It is difficult to release the member with the convex portion from the member to which the recess is attached. This is considered to be because the micro-pattern formed on the substrate with the concave portion becomes a certain state, which is attributed to the fixing effect of the lens substrate to be manufactured. In addition, when it is manufactured, it is attached with a convex. When the member of the crucible forcibly removes the member having the concave portion, there is a problem that (m: a member having a concave portion and/or a convex lens formed by changing the shape of the portion) such as a crack. Therefore, for the above reasons, it is also clear that the yield of the member with the convex portion is extremely low. Accordingly, = insist on a keen examination to solve the above problem. As a result, the present invention is directed to: the case where the member having the concave portion releases the member to which the convex portion is attached. The initial step (4) the stress of the concave member and the member with the convex portion is released ΰ γ (more specifically, The step of advancing the convex portion in the initial step is large, and after the convex portion from the concave portion releasing portion is completed, the stress is then lowered/integrated due to the formation of the convex portion corresponding to the to-be formed. Found, (the first region or the available region): mention = 7 each of the deep sounds, ~ u two recesses 'the second recesses have the P recesses (the recesses) - each of the deep production), =: :::= constitutive _ The condition of the member with a recess: There is a plaque that can be prevented even in repeated use of A 4 - January. In the present embodiment, in addition to the member 6 of the lift (for the & 〆, - recess 61, a recess is attached (i.e., a lens corresponding to the area of the microlens substrate 2 =: - recess 61) The first region of the domain 07) is externally W6147.doc -29- 1295382 has a plurality of second recesses 62. Further, it is believed that the first concave region 67 is formed in the middle of the body 6m - ", more, the body 5" The two end sides are in the longitudinal direction thereof (one of the ends corresponds to the member with the recessed portion, the cuckoo 9 is less stepped on the mountain, and the main substrate of the crucible 6 (with the configuration of the convex portion, the release starting side) Each of the sides is provided with a second region (non-available region) 68 in which the second recessed portion is formed. The first region in which the first recessed portion 61 is formed in this manner (4), the second recessed portion is provided on the release starting side 62 (second region 68), it is possible that when the member attached with the concave portion releases the main substrate 2, the stress absorbed to the structure with the concave portion 6 and/or the main substrate 2 to be formed enters the second concave portion 62. Forming (ie, 'the second region 68 of the member with the recess corresponding to the non-available lens region of the microlens substrate 1). Therefore, when released The formation of the first recessed portion (i.e., the 'first region 67') and the available lens region of the microlens substrate 1 is reduced, and therefore, it is possible to stably perform the release with a relatively small force. It is prevented that defects are generated in the concave/convex pattern of the member 6 with the concave portion and/or the main substrate 6. The gentleman, the right, and the fruit have a long life to extend the life of the member 6 with the concave portion. With the member-attached member $ of the present invention, it is possible to stably manufacture the microlens substrate i (main substrate 2), and this makes it possible to increase the productivity of the microlens substrate. The member 6 of the concave portion is used when the present invention is used. In the microlens substrate (member with a convex portion) of the present invention of k, it is possible to effectively prevent the occurrence of a defect such as a crack of a concave-convex pattern, and the present invention: a lens substrate (a member with a convex portion) 1 In addition, this makes it possible to increase the productivity of the microlens substrate i. Although only the depth of each of the second recesses 62 is shallower than the mother of the first recesses 6 The depth is not special Restricted, but preferably each of the second recesses 62 has a depth in the range of 5 to 4 〇〇μπι per 106147.doc -30 - 1295382. More preferably, it is in the range of 15 to 15 ^, and Further preferably, it is in the range of 25 to 50 μη. In the case where the taste of the mother of the constraint is within the above range, it is possible to make the lens substrate 丨 (ie, the main substrate 2) as an attachment. The member having the convex portion is self-attached with a concave portion. When the member 6 having the convex portion releases the member with the convex portion (the main substrate 2), it is more effectively prevented from being in the member 6 with the concave portion and/or at the microlens substrate Defects such as cracks are generated in the microlens 21 to be formed. Further, the depth of each of the plurality of first recesses is defined as 〇1 (μΠ1) and the depth of each of the plurality of second recesses is defined as In the case of D2〇tm), 'better 〇1 and 〇2 satisfy the relationship: 3<Di_Dd 495. It is better to satisfy the relationship: 5 < D1 _ I 2 〇〇, and further better d#d2 satisfies the relationship: heart D1_D2 < 5G. In the case where the above-mentioned relationship is satisfied, it is possible to release the member with the convex portion from the member 6 to which the concave portion is attached in the member to which the microlens substrate i (i.e., the main substrate 2) is attached ( The main substrate 2) is more effective in preventing defects such as cracks in the member 6 to which the recess is attached and/or in the microlens 21 to be formed in the microlens substrate i. The size of each of the second recesses 62 when viewed from above the face is smaller than the size of each of the first recesses 61. In the case where the size of each of the second recesses is smaller than the size of each of the first-parts 61 in this manner, it is possible to effectively absorb the member in the vicinity of the second recess 62 to the recessed portion... or the main substrate 2 Further, in the present embodiment, the stress of the main table of the member 6 to which the recess is attached is self-contained, and it is possible to further achieve the above effects remarkably. Further, in the case where the size of each of the second recesses 62 is relatively small, the flaw may be reduced to the vicinity of the second recess 62. Therefore, it is possible to significantly improve the member 6 (in the vicinity of the second recess 62) having the concave 106147.doc -31 · 1295382 有, which is possible to significantly improve the resistance of the member 6 with the recess. As a result, the microlens substrate is improved! Productivity. Shaw. Further, it is possible that, in the present embodiment, in the second region 68 (i.e., the _ formation region), one of the main surfaces of the density recess 62 of the second recess 68 is attached with a recess from the main + field. When viewed above the surface of the component, the number of faces per unit is lower than the first recess in the first region 67 / = two: (d) This mode is the degree of the -A. By the way, the first recess 62 (the second region 6 has the above effect, and it is possible to improve the second recess c. Therefore, it is possible to change the shape of the parent of the right arm 2 to be stable. The durability of the member 6 with the recessed portion is improved to increase the yield of the microlens substrate 1. The second region of the second recess 62 is "closed to the second recess", but Preferably, in the second region 68, the second recess (four) is further in the range of 500,000 / (10) 2, more preferably in the range of 5 〇〇〇 to = 〇, 〇〇〇 W, and further More preferably, it is in the range of _ to 1M00 W. In the case where the second recess is constrained to have a density within the above range, it is possible to achieve the above effect more significantly. Thus, there is a possibility that each of the second recesses 62 can be improved. The shape stability of the person is likely to significantly improve the durability of the member 6 with the recess. The density of the recess 61 in the first region 67 is defined as a mountain (a / ') and the second region In the case where the density of the second recess 62 in 68 is defined as s/cm 2 ), it is preferable that di and d 2 satisfy the relationship: 0.001 $ di / d 〆〇 · 999 Di_2 more preferably satisfies the relationship: square 〇ι < and dl and d2 further more preferably satisfies the relationship: · 〇5 square < d " d "〇.80. The best dl 106147.doc -32 - 1295382 and d2 meet the 阙 式 ········································ Each of the second modified recesses 62 improves the shape stability of the ancient ππ μ, and it is possible to significantly improve the durability of the member 6 with the recess. In addition, in the present embodiment, Yin Yi concave neighbor 61 > h γ ^ 歹 〗 〖 a concave. The crucible 62 is such that the second concave portion of the recessed portion 62 from the side of the member 6 to which the recess is attached is formed from the side on which the concave portion W61 is formed (i.e., the side of the _f £ domain 67). Sparse. This makes it possible to describe the effect. Therefore, it is possible to improve the shape stability of the mother of the second recess 62 and the durability of the member 6. "The shape of each of the second concave portions 62 having the concave portion is improved (the shape when viewed from a main surface to which the concave portion is attached) is not particularly limited. As for the shape, There are, for example, a circular shape in which the vertical length of each of the second concave (6) is greater than its horizontal length (including an enlarged circle), and the horizontal length of each of the central portions 62 is greater than its vertical length. The flat shape, in which the vertical and horizontal lengths thereof are randomly larger than the other, is flat. Further, the number of the second recesses 62 in the second region 68 is not particularly limited. In a linear manner (ie, in a general manner) The direction perpendicular to the release direction: linear) in the case where the second recess 62 is provided in the second region 68, the number of arrays of the second recess 62 preferably provided is about 1 〇 to 5 〇, 〇〇 Preferably, it is in the range of about 500 to 1 〇, 〇〇〇, and the further step is in the range of 2,000 to 5, _. This makes it possible to fully and significantly reach: The effect, while preventing unnecessary excessive amplification of the microlens substrate Lens region. Further, it is possible improvement of each strip portion 62 of the second recess 106147.doc -33- 1295382 stability, and it is possible with significantly improved durability of the recess 6 of the member.
此外,在以線性方式(即,在一大體上垂直於釋出方向之 方向上線性)於第二區域68中提供第二凹部62的情形中,第 二凹部62之兩個鄰近陣列之平均間距並非特定受限。舉例 而言,較佳兩個鄰近陣列之平均間距在2〇至1,〇〇〇 之範 圍中。更佳其在30至7〇〇 μηΐ2範圍中,且進一步更佳其在 5〇至500 μηΐ2範圍中。在將兩個鄰近陣列之平均間距約束 在上述範圍内0情形中’㈣能更顯著地達成上述效果。 因而’有可能改良第二凹部62之每一者之形狀穩定性,且 有可能顯著改良附有凹部之構件6之耐用性。 第二區域68在其釋出方向上之長度(即,在圖4中由^表 示之長度)並非特定受限。舉例而言,較佳第二區域68在5其 釋出方向上之長度在20至5〇〇 μηΐ2範圍中。更佳盆在%至 350叫之範圍中,且進—步更佳其在5q至肅啤之範圍 中。在將第二區域68在其釋出方向上之長度約束在上述範 圍内的情形中’有可能充分且顯著地達成上述效果,同時 防止不必要的過多放大微透鏡基板i之非可用透鏡區域。另 外,有可能顯著改良附有凹部之構件6之耐用性。 如上所述,當自附有凹部之構件(用於製造微透鏡基板) 釋出微透鏡基板(附有凸部之構件_,於第二凹部叫即, 第二區賴)之附近吸收至兩個構件之應力。因此原因,有 可,防止破壞微透鏡之形成區域之凹·凸圖案。因此,附有 凹部之構件6具有長哥命及卓越可操縱性。 此外,藉由使用附有凹部之構件6作為模具,有可能有效 106147.doc -34- 1295382 防止產生凹部或凸部之碰撞(斷裂)或其變化,且有可能真實Moreover, in the case where the second recess 62 is provided in the second region 68 in a linear manner (i.e., linear in a direction substantially perpendicular to the direction of discharge), the average spacing of two adjacent arrays of the second recess 62 Not specifically limited. For example, it is preferred that the average spacing of two adjacent arrays is in the range of 2 〇 to 1, 〇〇〇. More preferably it is in the range of 30 to 7 〇〇 μη ΐ 2, and further preferably it is in the range of 5 〇 to 500 μη ΐ 2 . The above effect can be more significantly achieved in the case where the average pitch of two adjacent arrays is constrained to 0 in the above range. Thus, it is possible to improve the shape stability of each of the second recesses 62, and it is possible to significantly improve the durability of the member 6 with the recesses. The length of the second region 68 in its release direction (i.e., the length indicated by ^ in Fig. 4) is not particularly limited. For example, it is preferred that the length of the second region 68 in the direction of release 5 is in the range of 20 to 5 〇〇 μη ΐ 2 . More pots are in the range of % to 350, and better in the range of 5q to the range of the beer. In the case where the length of the second region 68 in the releasing direction thereof is restricted within the above range, it is possible to sufficiently and remarkably achieve the above effects while preventing unnecessary excessive enlargement of the non-available lens region of the microlens substrate i. In addition, it is possible to significantly improve the durability of the member 6 with the recess. As described above, when the member attached to the concave portion (for manufacturing the microlens substrate) releases the microlens substrate (the member with the convex portion _, the second concave portion is called the second region), it is absorbed to the vicinity of the two The stress of the components. For this reason, it is possible to prevent the concave/convex pattern which breaks the formation region of the microlens. Therefore, the member 6 with the recess has a long life and excellent maneuverability. Further, by using the member 6 with the concave portion as a mold, it is possible to effectively 106147.doc -34 - 1295382 to prevent collision (fracture) or variation of the concave portion or the convex portion, and it is possible to be true.
地傳輸附有凹部之構件之表面形狀至微透鏡基板i。因Z 有可能獲得具有卓越光學特徵之微透鏡基板(附有凸部之 構件Η。此外,有可能穩定地顯示投影在具備此一微透鏡 基板(附有凸部之構件η之穿透型屏幕1〇及背投式投影機 300中具有高品質之影像。 在此方面,在上述解釋中,已描述第一凹部61之每一者 具有與提供給微透鏡基板(附有凸部之構件)丨之每一微透鏡 (凸部)21大體上相同的形狀(尺寸),且第一凹部_有與微 透鏡21之排列圖案大體上相同的排列圖案。然而,(例如) 在微透鏡基板(附有凸部之構件}1之主基板2之組成材料傾 向於易收縮的情形中(即,在借助於凝固或其類似方法而收 縮組成主基板2之樹脂㈣的情形中),對於提供給微透鏡 基板1之微透鏡(凸部)21之每一者及提供給附有凹部之構件 6(用於製造微透鏡基板1}之第—凹部61,其形狀(及尺寸)、 所占面積比率等在收縮等之百分比方面可互不相同。此 外,在此情形中,雖然在習知方法中(即,在使用一附有凹 部之習知基板之方法中)易於在附有凹部之構件及/或在微 透鏡基板中產±諸如裂痕之缺點,但是在纟發明中,甚至 在此情形中亦可能有效防止產生上述缺點。 其次,現在將參照圖6描述根據本發明製造附有凹部之構 件6之方法。在此方面,雖然用於形成微透鏡幻之複數個第 一凹部61及複數個第二凹部62實際上形成於基底構件7 中,但是為了使得解釋可理解,展示基底構件7之一部分以 106147.doc -35- 1295382 在圖6中進行強調。 首先,在製造附有凹部之構件6中製備一基底構件7。 較佳將具有一大體上圓柱形或大體上圓筒形之基底材料 用於基底構件7。此外,亦較佳將附有由清洗或其類似方式 清潔之表面之基底材料用於基底構件7。 雖然對於基底構件7之組成材料可提及的有:鈉鈣玻璃、 晶質玻璃、石英玻璃、鉛玻璃、鉀玻璃、矽酸硼鹽玻璃、 無鹼玻璃及其類似物,但其中較佳的為鈉鈣玻璃及晶質破 璃(例如,陶兗玻璃(neoceram)或其類似物)。藉由使用鈉鈣 玻璃、晶質玻璃及無鹼玻璃,易於加工用 料,且從附有凹部之構件6之製造成本之觀點看,因為= 玻璃或晶質玻璃相對便宜,所以其具有優勢。 <A1>如在圖6A中所展示’用於形成遮罩之—薄膜μ形成 於經製備的基底構件7之表面上(塗佈製程)。在隨後製程中 藉由形成複數個開π (初始孔)而使得用於形成遮罩之薄膜 85充當遮罩。然後’ —f面保㈣膜㈣成於基底構件7 之背面上(即,相對於其上形成用於形成遮罩之薄膜Μ之表 面的表面側)。無需說’可同時形成用於形成遮罩之薄膜85 及背面保護薄膜89。 用於形成遮軍(遮罩8)之薄膜85之組成材料並非特定受 限,可提及的有(例如)Cr、心、州、丁卜汛及其類似物之金 屬3有k自此等金屬之兩種或兩種以上金屬之金屬合 金、此等金屬之氧化物(金屬氧化物)今樹脂及其類似物。 此外,用於形成遮罩(遮罩8)之薄膜Μ可為(例如)具有一 106147.doc -36- 1295382 大體上均勻之組份的薄膜,戋 的薄膜。 ^有絲個層之-層狀結構 定:Γϊ=形成遮罩(遮罩8)之薄膜85之結構並非特 二;二: 成遮罩(遮罩8)之薄膜85具有-層狀 材料形成之—層及由氧化鉻作為主 7之層構成。具有此一結構用於形 ::膜8:相對於具有各種結構之各種_劑具有卓越穩定 =有可能在一敍刻製程(稍後將描述)中更無誤地保護 基^件7),且有可能借助於稍後將描述之鐳射束及其類 ;物的照射更容易地且更無誤地形成各具有一所要形狀之 二 81)。此外,在心形成料(遮罩8)之薄膜85 八有上述此—結構的情形中,例如含有二1氫錄(顺禪2) 之溶液在該餘刻製程(稍後將描述)中可適當地用作一關 ^因為含有二敦氫錄之溶液無毒,所以可能更無誤地防 在工作期間其對人體造成影響及對環境造成影響。此 夕,具有此-結構用於形成遮罩(遮罩8)之薄膜以使得有可 能有效減少用於形成遮罩(遮罩8)之薄膜以之内應力,且尤 ^用於形成遮罩(遮罩8)之此—薄膜85具有至基底構件乂 卓越黏著力(即’詳言之,在敍刻製程中用於形成遮罩(遮罩 8)之薄膜85至基底構件7之黏著力)。因此等原因,藉由使用 具有上述結構之用於形成遮罩(遮罩8)之薄膜Μ,有可能容 易且無誤地形成各具有—所要形狀之複數個第—凹部Μ。 形成用於形成遮罩(遮罩8)之薄膜85之方法並非特定受 限。在用於形成遮罩(遮罩8)之薄膜85由任何諸如Mb之 106147.doc -37- 1295382 金屬材料(包括金屬合金)或諸如氧化路之金屬氧化物組成 的情形中,借助於(例如)蒸發方法、濺鍍方法及類似方法可 適當地形成用於形成遮罩(遮罩8)之薄膜85。另一方面,在 用於形成遮罩(遮罩8)之薄賴切形成的情形中,借助於 (例如m鑛方法、CVD方法及其類似方法可適當地形成用於 形成遮罩(遮罩8)之薄膜85。 雖然用於形成遮罩(遮罩8)之薄臈85之厚度根據組成用 於形成遮罩(遮罩8)之薄膜85之材料而亦不同,但較佳用於 7成遮罩(遮罩8)之薄膜85之厚度在_至2.0 _之範圍 ^且更佳其在G.W.2_之範圍中。若用於形成遮罩(遮 =)之薄臈85之厚度低於上面所給出的下限,則取決於用 、形成遮罩(遮罩8)之薄膜85之組成材料或其類似物,可存 形成於初始形成孔製程(或開口形成製程,將稍後對其 f·之初始孔(誶言之’第一初始孔8ι)之形狀變形之可能 驟(二_在敍刻步 俾罐 )甲不此獲侍對於基底構件7之遮蔽部之足夠 古、二。另一方面,若用於形成遮罩(遮罩8)之薄膜85之厚度 形斤、、'出的上限’則除了在初始孔形成製程(或開口 ^一 “)中形成穿透遮罩8之初始孔81之困難之外,將存 取決於用於形成遮罩(遮罩8)之薄膜以組成材 除^、員似物’遮罩8歸因於其内部應力傾向於容易地被移 此^供月面保護薄膜89以在隨後製程中保護基底構件7之 月曰助於背面保護薄膜89可適當地防止基底構件7之背 106147.doc -38- 1295382 面之腐#、變質及類似過程。因為背面保護薄刺具有(例 如)與用於形成遮罩之薄膜85相同的組態,所以可以類似於 用於形成遮罩之薄膜85之形成的方式,同時與用於形成遮 罩之薄膜85之形成一起提供背面保護薄膜⑽。 <A2>其次,如在圖沾中所展示,在蝕刻製程(稍後描述) 中將用作遮罩開口之複數個第—初始孔81及複數個第二初 始孔82形成於用於形成遮罩之薄膜85中(初始孔形成製 私)。因而,獲得一具有一預定開口圖案之遮罩8。雖然形 成第初始孔8 1及第二初始孔82之方法並非特定受限,但 是較佳藉由鐳射束之照射形成第一初始孔81及第二初始孔 82此使得有可能容易且精確地形成各具有一所要形狀, 以所要圖案排列的第一初始孔8 1及第二初始孔82。結 果有可旎更無誤地控制第一凹部61及第二凹部62之每一 者之形狀其排列圖案等。此外,藉由借助於錯射束之照 射形成第一初始孔81及第二初始孔82,有可能以高生產率 衣k附有凹部之構件6。詳言之,於相對大尺寸的基板上可 谷易地形成該等凹部。而且,在借助於鐳射束之照射形成 初始孔(包括第一初始孔81及第二初始孔82)的情形中,藉由 拴制其照射條件,有可能僅僅形成初始孔(包括第一初始孔 8 1及第一初始孔82)而不形成初始凹部(將稍後描述),或有 可犯除了形成初始孔(包括第一初始孔8 1及第二初始孔82) 之外’容易且無誤地形成其形狀、尺寸及深度之變化較小 的初始凹部(第一初始凹部71)。此外,藉由借助於鐳射束之 々射於用於形成遮罩之薄膜85中形成第一初始孔8 1及第二 106147.doc -39- 1295382 初始孔82,,有可能與借助於習知光微影方法於遮罩中形 成開口的情形相比較,容易以一低成本於用於形成遮罩之 薄膜85中形成該等開口(第一初始孔81及第二初始孔82)。The surface shape of the member to which the recess is attached is transferred to the microlens substrate i. It is possible to obtain a microlens substrate having excellent optical characteristics (a member with a convex portion). Further, it is possible to stably display a penetrating screen having such a microlens substrate (a member with a convex portion η) In the above explanation, it has been described that each of the first recesses 61 has and is supplied to the microlens substrate (member with the convex portion). Each of the microlenses (convex portions) 21 has substantially the same shape (size), and the first recesses _ have an arrangement pattern substantially the same as the arrangement pattern of the microlenses 21. However, for example, on the microlens substrate ( In the case where the constituent material of the main substrate 2 to which the convex member is attached tends to be easily contracted (that is, in the case of shrinking the resin (four) constituting the main substrate 2 by means of solidification or the like), Each of the microlenses (convex portions) 21 of the microlens substrate 1 and the shape (and size) and area of the first concave portion 61 provided to the member 6 with the concave portion (for manufacturing the microlens substrate 1) Ratio, etc. In addition, in this case, although in the conventional method (that is, in the method of using a conventional substrate with a concave portion), it is easy to have a member with a concave portion and/or a microlens. The substrate has the disadvantage of producing such as cracks, but in the invention, it is possible to effectively prevent the above disadvantages even in this case. Next, a method of manufacturing the member 6 with the recess according to the present invention will now be described with reference to Fig. 6. In the aspect, although the plurality of first recesses 61 and the plurality of second recesses 62 for forming the lenticular phantom are actually formed in the base member 7, in order to make the explanation understandable, one portion of the base member 7 is shown as 106147.doc - 35-1295382 is emphasized in Fig. 6. First, a base member 7 is prepared in the manufacture of the member 6 with the recess. Preferably, a base material having a substantially cylindrical or substantially cylindrical shape is used for the base member 7. Further, it is also preferable to use a base material with a surface cleaned by washing or the like for the base member 7. Although the constituent materials of the base member 7 may be mentioned: sodium Calcium glass, crystal glass, quartz glass, lead glass, potassium glass, bismuth borate glass, alkali-free glass and the like, but among them, soda lime glass and crystalline glass (for example, ceramic glass) are preferred. (neoceram or its analog). It is easy to process the material by using soda lime glass, crystal glass and alkali-free glass, and from the viewpoint of the manufacturing cost of the member 6 with the concave portion, because = glass or crystal The glass is relatively inexpensive, so it has an advantage. <A1> As shown in Fig. 6A, 'for forming a mask, a film μ is formed on the surface of the prepared base member 7 (coating process). The film 85 for forming a mask is used as a mask by forming a plurality of openings π (initial holes). Then, the film is formed on the back surface of the base member 7 (i.e., relative thereto). Forming the surface side of the surface of the film crucible used to form the mask). Needless to say, the film 85 for forming a mask and the back surface protective film 89 can be simultaneously formed. The constituent material of the film 85 for forming the occlusion (mask 8) is not particularly limited, and there may be mentioned, for example, metal such as Cr, heart, state, dicamba, and the like, which has k from this. Metal alloys of two or more metals of metals, oxides of such metals (metal oxides), resins and the like. Further, the film used to form the mask (mask 8) may be, for example, a film having a substantially uniform composition of 106147.doc - 36 - 1295382, a film of tantalum. ^Silk layer-layer structure: Γϊ = the structure of the film 85 forming the mask (mask 8) is not special; second: the film 85 forming the mask (mask 8) has a layered material formation The layer is composed of a layer of chromium oxide as the main layer 7. This structure is used for the shape: film 8: excellent stability with respect to various agents having various structures = it is possible to protect the substrate 7) more unambiguously in a process (to be described later), and It is possible to form the respective ones having a desired shape 81) by means of the irradiation of the laser beam and its like, which will be described later, more easily and without error. Further, in the case where the film 85 of the core forming material (mask 8) has the above-described structure, for example, a solution containing two hydrogen recordings (Shun Zen 2) may be appropriately used in the subsequent process (to be described later). It is used as a barrier. Because the solution containing Erden Hydrogen is non-toxic, it may be more correct to prevent the human body from affecting the environment and affecting the environment during work. Furthermore, this structure has a structure for forming a mask (mask 8) to make it possible to effectively reduce the stress inside the film for forming the mask (mask 8), and particularly to form a mask. (Mask 8) - the film 85 has excellent adhesion to the base member (i.e., 'in detail, the adhesion of the film 85 to the base member 7 for forming the mask (mask 8) in the engraving process) ). Therefore, by using the film stack for forming the mask (mask 8) having the above structure, it is possible to easily and without fail to form a plurality of first recesses 具有 having the desired shape. The method of forming the film 85 for forming the mask (mask 8) is not particularly limited. In the case where the film 85 for forming the mask (mask 8) is composed of any metal material such as Mb 106147.doc -37-1295382 (including a metal alloy) or a metal oxide such as an oxidation path, by means of (for example The evaporation method, the sputtering method, and the like can appropriately form the film 85 for forming the mask (mask 8). On the other hand, in the case of forming a thin reticle for forming a mask (mask 8), a mask (mask) can be suitably formed by means of, for example, an m-mine method, a CVD method, and the like. 8) Film 85. Although the thickness of the thin web 85 for forming the mask (mask 8) differs depending on the material constituting the film 85 for forming the mask (mask 8), it is preferably used for 7 The thickness of the film 85 which becomes the mask (mask 8) is in the range of _ to 2.0 _ and more preferably in the range of GW2_. If the thickness of the thin 臈 85 used to form the mask (mask =) is low The lower limit given above depends on the constituent material of the film 85 which forms the mask (mask 8) or the like, and may be formed in the initial hole forming process (or the opening forming process, which will be later The shape of the initial hole of the f· (the first initial hole 8 ι of the rumor) may be deformed (2) in the case of the masking portion of the base member 7 On the other hand, if the thickness of the film 85 used to form the mask (mask 8), the 'upper limit' is in addition to the initial hole forming process In addition to the difficulty of forming the initial hole 81 penetrating the mask 8 in the opening, it will depend on the film used to form the mask (mask 8) to form a material. The mask 8 is apt to be removed due to its internal stress. The moon-side protective film 89 is used to protect the base member 7 in the subsequent process. The back protective film 89 can appropriately prevent the back of the base member 7. 106147.doc -38- 1295382 Surface rot #, deterioration and the like. Because the back protection thorn has the same configuration as, for example, the film 85 used to form the mask, it can be similar to that used to form the mask The film 85 is formed in such a manner as to provide a back protective film (10) together with the formation of the film 85 for forming a mask. <A2> Next, as shown in the figure, in the etching process (described later) A plurality of first-initial holes 81 and a plurality of second initial holes 82 serving as mask openings are formed in the film 85 for forming a mask (initial hole forming is made). Thus, a pattern having a predetermined opening is obtained. Mask 8. Although the first initial hole 8 1 and the second are formed The method of the starting hole 82 is not particularly limited, but it is preferable to form the first initial hole 81 and the second initial hole 82 by irradiation of the laser beam, which makes it possible to easily and accurately form each having a desired shape and arranged in a desired pattern. The first initial hole 81 and the second initial hole 82. As a result, the shape of each of the first recess 61 and the second recess 62 can be controlled more unambiguously, and the arrangement pattern and the like. The beam irradiation forms the first initial hole 81 and the second initial hole 82, and it is possible to attach the concave member 6 with a high productivity. In detail, the concave portions can be easily formed on the relatively large-sized substrate. Moreover, in the case where the initial holes (including the first initial holes 81 and the second initial holes 82) are formed by irradiation of the laser beam, it is possible to form only the initial holes (including the first initial holes) by the irradiation conditions thereof. 8 1 and the first initial hole 82) without forming an initial recess (to be described later), or having an easy and error-free addition to forming the initial hole (including the first initial hole 81 and the second initial hole 82) Form its shape, size and depth The initial recess (the first initial recess 71) of which the change is small. In addition, by forming the first initial hole 81 and the second 106147.doc -39-1295382 initial hole 82 in the film 85 for forming the mask by means of a laser beam, it is possible to In contrast to the case where the opening is formed in the mask, it is easy to form the openings (the first initial hole 81 and the second initial hole 82) in the film 85 for forming the mask at a low cost.
此外,在借助於鐳射束之照射形成第一初始孔81及第二 初始孔82的情形中,雖然所使用的鐳射束之種類並非特定 叉限,但可提及的有:紅寶石鐳射、半導體鐳射、YAG鐳 射、飛秒鐳射、玻璃鐳射、YV〇4鐳射、Ne_He鐳射、Ar鐳 射、一氧化碳鐳射、準分子错射及類似鐳射。此外,可利 用諸如SHG(二次諧波振盪)、THG(三次諧波振盪)、fhG(四 次諧波振盪)及類似鐳射的波形。 如圖6B中所展示,當第一初始孔81及第二初始孔82形成 於用於形成遮罩之薄膜85中時,除了形成第一初始孔81及 第二初始孔82之外,藉由移除基底構件7之表面之部分,亦 可於基底構件7中形成第一初始凹部71及第二初始凹部 72。此使得有可能當使附有遮罩8之基底構件7經受蝕刻製 程(將稍後描述)時增加基底構件7與蝕刻劑的接觸面積,藉 此適當地開始腐蝕。此外,藉由調整第一初始凹部71及第 一初始凹部72之每一者之深度,亦有可能調整第一凹部6 i 及第二凹部之每一者之深度(即,透鏡(微透鏡21)之最大厚 度)°詳言之,在本實施例中,如在圖6中所展示,初始凹 部71僅僅於對應於第一凹部6丨(即,第一初始孔8丨)之部分除 形成,同日守於對應於第二凹部62(即,第二初始孔82)之部分 沒有初始凹部形成。因而,有可能容易且無誤地使得第一 凹部61之每一者之深度與第二凹部62之之每一者深度的差 106147.doc -40- 1295382 變得相對大。藉由控制 田耵禾之…射條件,有可能容易且 ’、、、"、纟理形成或不形成初始凹部。Further, in the case where the first initial hole 81 and the second initial hole 82 are formed by irradiation of a laser beam, although the type of the laser beam used is not a specific cross, there may be mentioned: ruby laser, semiconductor laser , YAG laser, femtosecond laser, glass laser, YV〇4 laser, Ne_He laser, Ar laser, carbon monoxide laser, excimer misalignment and similar laser. In addition, waveforms such as SHG (second harmonic oscillation), THG (third harmonic oscillation), fhG (fourth harmonic oscillation), and the like can be used. As shown in FIG. 6B, when the first initial hole 81 and the second initial hole 82 are formed in the film 85 for forming a mask, in addition to forming the first initial hole 81 and the second initial hole 82, The first initial recess 71 and the second initial recess 72 may also be formed in the base member 7 by removing portions of the surface of the base member 7. This makes it possible to increase the contact area of the base member 7 with the etchant when the base member 7 with the mask 8 is subjected to an etching process (to be described later), whereby corrosion is appropriately started. Further, by adjusting the depth of each of the first initial recess 71 and the first initial recess 72, it is also possible to adjust the depth of each of the first recess 6 i and the second recess (ie, the lens (microlens 21) In addition, in the present embodiment, as shown in FIG. 6, the initial recess 71 is formed only by the portion corresponding to the first recess 6 (ie, the first initial hole 8). On the same day, the portion corresponding to the second recess 62 (i.e., the second initial hole 82) is not formed with the initial recess. Thus, it is possible to easily and unambiguously make the difference 106147.doc -40 - 1295382 of the depth of each of the first recesses 61 and the depth of each of the second recesses 62 relatively large. By controlling the conditions of the field, it is possible that the initial recesses may or may not be formed by the ', ,, and.
=第-初始凹部71之每一者之深度並非特定受限,但 又土,、為5·〇 _或更小,更佳其在約陣之範圍 。在借助於鐳射束之照射實施第—初始孔81及第二初始 孔二之形成的情形中’有可能無誤地減少與第一初始孔81 及第二初始孔82—起形成的第一初始凹部^之每一者之深 度的變化。此使得有可能減少組成附有凹部之構件6之第;_ 凹料之每—者的深度的變化,I因此有可能於最終獲得 之微透鏡基板i中減少微透鏡21之每一者之尺寸與形狀的 變化。結果,詳言之,有可能減少微透鏡21之每一者之透 鏡直徑、焦距及厚度的變化。 在本製程中待形成之第一初始孔81之每一者之形狀與尺 寸並非特定受限。在第-初始孔81之每—者為大體上圓形 =情形中,較佳初始孔81之第一者之直徑在〇 8至2〇 範圍中。更佳其在U至1〇 μηΐ2範圍中,且進一步更佳其 在1·5至4μιη之範圍中。在將第一初始孔81之每一者之直徑 約束在上述範圍内的情形中,有可能於一 #刻製程(將稍後 描述)中無誤地形成各具有如上所述之形狀的第一凹部 61。另一方面,在第一初始孔81之每一者為諸如大體上橢 圓形之扁平形狀的情形中,有可能其以在短軸線方向上的 長度(即,其寬度)替代其直徑。即,在於本製程中待形成之 第一初始孔8 1之每一者為大體上橢圓形的情形中,雖然初 始孔8 1之每一者之寬度(其在短軸線方向上的長度)並非特 106147.doc -41 - 1295382 定受限,但是第一初始孔81之每一者之寬度在〇8至2〇 之範圍中。更佳其在1〇至1〇 μιη之範圍中,且進一步更佳 其在1.5至4 μιη之範圍中。在將第一初始孔81之每一者之寬 度約束在上述範圍内的情形中,有可能於一蝕刻製程(將稍 後描述)中無誤地形成各具有如上所述之形狀的第一凹部 6 1 〇= The depth of each of the first-initial recesses 71 is not particularly limited, but is also soil, which is 5·〇 _ or less, more preferably in the range of the array. In the case where the formation of the first initial hole 81 and the second initial hole 2 is performed by irradiation of the laser beam, it is possible to reduce the first initial concave portion formed together with the first initial hole 81 and the second initial hole 82 without any error. ^ The change in depth of each of them. This makes it possible to reduce the variation in the depth of each of the members constituting the recessed portion 6 by the recesses, so it is possible to reduce the size of each of the microlenses 21 in the finally obtained microlens substrate i. With the change of shape. As a result, in detail, it is possible to reduce variations in lens diameter, focal length, and thickness of each of the microlenses 21. The shape and size of each of the first initial holes 81 to be formed in the present process are not particularly limited. In the case where each of the first-initial holes 81 is substantially circular = the first diameter of the preferred initial holes 81 is in the range of 〇 8 to 2 。. More preferably it is in the range of U to 1 〇 μη ΐ 2, and further preferably it is in the range of 1-5 to 4 μηη. In the case where the diameter of each of the first initial holes 81 is constrained within the above range, it is possible to form the first concave portions each having the shape as described above without fail in an inscribed process (to be described later). 61. On the other hand, in the case where each of the first initial holes 81 is a flat shape such as a substantially elliptical shape, it is possible to replace its diameter with a length in the short axis direction (i.e., its width). That is, in the case where each of the first initial holes 81 to be formed in the present process is substantially elliptical, although the width of each of the initial holes 81 (the length in the short axis direction) is not Special 106147.doc -41 - 1295382 are limited, but the width of each of the first initial holes 81 is in the range of 〇8 to 2〇. More preferably, it is in the range of 1 〇 to 1 〇 μιη, and further preferably it is in the range of 1.5 to 4 μηη. In the case where the width of each of the first initial holes 81 is restricted within the above range, it is possible to form the first recesses 6 each having the shape as described above without fail in an etching process (to be described later). 1 〇
此外,在於本製程中待形成之第一初始孔81之每一者為 大體上橢圓形的情形中,雖然第一初始孔81之每一者之長 度(其在長軸線方向上的長度)並非特定受限,但是第一初始 孔81之每一者之寬度在0.9至5〇 μιη之範圍中。更佳其在15 至20 _之範,且進一步更佳其在2〇至15 _之範圍 t i在將第一初始孔81之每一者之寬度約束在上述範圍内 的情形中,有可能於一敍刻製程(將稍後描述)中更無誤地形 成各具有如上所述之形狀的第一凹部61。 此夕’不借助於鏺射束之照射’可借助於如下之方式於 經塗布的用於形成遮罩之薄膜85中形成第一初始孔81及第 二初士始孔82:(例如)當塗布用於形成遮罩之薄膜於基底構件 7上%,以—預定圖案提前排列外來物件於基底構件7上, 且接著塗布用於形成料之薄⑽於时料來物件之基 底構件7上以在遮罩8中藉由設計形成缺陷,以使得利用該 等缺陷作為第—初始孔81及第:初始孔82。 在此方面’在如圖6所展示之組態中,即使已描述初始凹 部僅於對應於第—凹部61(即,第—初始孔81)之部分形成, 初始凹部亦可於對應於第二凹部Μ(即,第二初始孔叫之部 106147.doc -42- 1295382 为形成。在此情形中,對應於第一凹部6丨(即,第一初始孔 81) 之第一初始凹部71之每一者之深度、形狀及類似特徵可 與對應於第二凹部62(即,第二初始孔82)之第二初始凹部之 每一者的深度、形狀及類似特徵不同。舉例而言,對應於 第一凹部62之第二初始凹部之每一者的深度可淺於對應於 第一凹部61之第一初始凹部71之每一者的深度。 <A3>其次,如在圖6€中所展示,在遮罩8中塗覆具有抗 蝕丨生之一雄、封構件(帶)88至該區域(對應於形成第二初始孔 82之第二區域)。 八4>其_人,使基底構件7經受一蝕刻製程(蝕刻製程)。該 钱刻製程並非特定受限,且可提及的有(例如)濕式钱刻製 程、乾式敍刻製程及類似姓刻製程。在下文的解釋中,將 描述使用濕式蝕刻製程之情形作為一實例。 首先,使塗覆有遮罩8(具有第一初始孔81及第二初始孔 82) 之基底構件7及密封構件⑽經受一蝕刻製程(在此情形 中,為一濕式餘刻製程)。因而,如在圖印中所展示,該钱 刻於對應於遮罩8之第—初始孔81之基底構件7之部分處進 行’同時此蝕刻不在遮罩8塗覆有密封構件以之部分處進 行0 在該㈣製程之方法中接著移除密封構件88。因而,該 餘刻亦於遮罩8塗覆有密封構件88之部分處開始,且如在圖 6E中所展示’於基底構件7中形成第一凹州及各具有一淺 於第一凹部61之每—者之深度之料深度的第二凹部62。 如上面所提及的,在本實施例中,因為形成於遮罩8中之 106147.doc -43- 1295382 第-初始孔81以犬牙格子方式排列,所以待形成之第一凹 部61亦以犬牙格子方式排列於基底構件7之表面上。此外, 形成於遮罩8中之第二初始凹部82具有比第—初始凹部μ 之密度低的密度,且排列第二初始凹部82以使其向口时遮 罩8之基底構件7之外部逐漸變得稀疏。因此原因,待形成 $第二凹部62具有比第—凹部61之密度低㈣度,且排列 第二凹部62以使其向基底構件7之外部逐漸變得稀疏.。 此外’在本實施例中,當在步驟<Α2>中於用於形成遮罩 之薄膜85中形成第_初始孔81及第二初始孔以時,第一初 始凹和形成於基底構件7之表面上。此使得在㈣製程期 間基底構件7與蝕刻劑之接觸面積增加,藉此可適當地開始 腐钱it匕外’藉由採用濕式姓刻製程可適當地形成第一凹 部61及第二凹部62。在含有(例如)二氣氯錢之银刻劑用作蝕 刻d的㈣中’可更具選擇性地腐姓基底構件7,且此使得 有可能適當地形成第_凹部61及第二凹部62。 /在遮罩8主要由鉻組成(即,由含有㈣為主材料之材料 友成遮罩8)的f月形中’二氟氫錄溶液尤其適合用作基於氫 氟酸之餘刻劑。因為冬古〆 α ”、、 有一亂虱銨之溶液無毒,所以有可 1Α地防止在工作期間其對人體造成影響並對環境組Further, in the case where each of the first initial holes 81 to be formed in the process is substantially elliptical, although the length of each of the first initial holes 81 (the length in the long axis direction) is not It is specifically limited, but the width of each of the first initial holes 81 is in the range of 0.9 to 5 〇 μηη. More preferably, it is in the range of 15 to 20 Å, and further preferably in the range of 2 〇 to 15 _ in the case where the width of each of the first initial holes 81 is restricted within the above range, it is possible The first recess 61 each having the shape as described above is formed more unambiguously in a scribe process (to be described later). On the eve of the present invention, the first initial aperture 81 and the second preliminary aperture 82 can be formed in the coated film 85 for forming a mask by means of the following: (for example) when Coating the film for forming the mask on the base member 7 by arranging the foreign object on the base member 7 in advance in a predetermined pattern, and then coating the base member 7 for forming the thinner material (10) on the article Defects are formed in the mask 8 by design such that the defects are used as the first initial hole 81 and the first: initial hole 82. In this aspect, in the configuration as shown in FIG. 6, even if it has been described that the initial concave portion is formed only in a portion corresponding to the first concave portion 61 (ie, the first initial hole 81), the initial concave portion may correspond to the second portion. The recess Μ (ie, the second initial hole is called 106147.doc - 42 - 1295382 is formed. In this case, the first initial recess 71 corresponding to the first recess 6 丨 (ie, the first initial hole 81) The depth, shape, and the like of each may be different from the depth, shape, and the like of each of the second initial recesses corresponding to the second recess 62 (ie, the second initial aperture 82). For example, corresponding The depth of each of the second initial recesses of the first recess 62 may be shallower than the depth of each of the first initial recesses 71 corresponding to the first recess 61. <A3> Next, as in Figure 6 It is shown that a mask 8 is coated with a resist, a sealing member (band) 88 to the region (corresponding to a second region forming the second initial hole 82). 八4> The member 7 is subjected to an etching process (etching process). The process is not particularly limited, and Mention may be made, for example, of a wet engraving process, a dry engraving process, and the like. In the following explanation, a case of using a wet etching process will be described as an example. First, a mask is applied. The base member 7 and the sealing member (10) having the first initial hole 81 and the second initial hole 82 are subjected to an etching process (in this case, a wet residual process). Thus, as in the drawing It is shown that the money is engraved at the portion corresponding to the base member 7 of the first initial hole 81 of the mask 8 while the etching is not performed at the portion where the mask 8 is coated with the sealing member. In the method of the (four) process The sealing member 88 is then removed. Thus, the remainder also begins at the portion of the mask 8 that is coated with the sealing member 88, and as shown in FIG. 6E, the first concave state and each of the base member 7 are formed. A second recess 62 having a depth that is shallower than the depth of each of the first recesses 61. As mentioned above, in the present embodiment, since 106147.doc -43- is formed in the mask 8. 1295382 The first initial hole 81 is arranged in a dog-tooth lattice, so it is to be formed The first concave portion 61 is also arranged in a dog-tooth lattice manner on the surface of the base member 7. Further, the second initial concave portion 82 formed in the mask 8 has a density lower than that of the first initial concave portion μ, and the second initial arrangement The recess 82 gradually becomes sparse in order to make the outer portion of the base member 7 of the mask 8 toward the mouth. Therefore, the second recess 62 to be formed has a lower density (four degrees) than that of the first recess 61, and the second recess 62 is arranged. In order to gradually become sparse to the outside of the base member 7. Further, in the present embodiment, when the step <Α2> is formed in the film 85 for forming a mask, the first initial hole 81 and the second are formed. The first initial concave is formed on the surface of the base member 7 at the time of the initial hole. This causes the contact area of the base member 7 and the etchant to increase during the (four) process, whereby the rot can be appropriately started. The first recess 61 and the second recess 62 can be appropriately formed by using the wet-type process. . In the case of (4) in which silver engraving agent containing, for example, dichlorohydrin is used as the etching d, the substrate member 7 can be more selectively smeared, and this makes it possible to appropriately form the first concave portion 61 and the second concave portion 62. . / The difluorohydrogen recording solution in which the mask 8 is mainly composed of chromium (i.e., composed of a material containing (4) as a main material) is particularly suitable as a hydrofluoric acid-based remnant. Because the winter 〆α 、,, and a solution of sputum ammonium are non-toxic, it is possible to prevent it from affecting the human body during work and on the environmental group.
成衫響。此外,A -氣Λτ A 你一氣虱鉍溶液用作蝕刻劑的情形中,在 ^刻劑中可含有(例如)過氧化氯。此使得有可能加速餘刻 速度。 此外可以車父在乾式餘刻製矛呈中更簡單之設備實施濕式 敍刻製程’且其允許-次處理大量基底構件7。此使得有可 106147.doc -44- 1295382 能增加附有凹部之構件 供附有凹部之構件6。 產车且有可能以-低成本提 r)<A5^次’如在圖6F中所展示移除遮罩8(遮罩移除f 耘)。此時,隨同遮罩8一趣脾北^ ^ 切月面保護薄膜89移除。在自 材钭开^ 為主要㈣形叙層及由氧化鉻作為主要 =成之層建構的層狀結構組成遮罩_情形中,可(例 ^ Μ曰助於使用硝酸鈽銨與 施遮罩8之移除。 、…之“物之敍刻製程實 右如^圖π、圖4及圖5中所示,上述製程之結果獲得-附 有凹部之構件6,其中以犬牙狀 大牙格子方式於基底構件7中形成 里弟-凹和且以隨機方式於形成第一凹部“之區域之 外部形成大量第二凹部62。 /基底構件7之表面上形成複數個第—凹部似複數個 =-凹部62之方法並非特定受限。在借助於上述方法形成 苐一凹部6 1及第二凹部62之格形士 » 1之丨月形中,即,藉由借助於鐳射 束之照射於用於形成遮罩之薄膜85中形成第一初始孔以及 第二初始孔82以於基底構件7上獲得遮罩8,且接著使用遮 罩8使基底構件7經受蝕刻製程的於基底構件7中形成第一 凹部61及第二凹部62的方法的情形中,有可能獲得下列效 果。 即,藉由借助於鐳射束之照射於用於形成遮罩之薄膜“ 中形成第一初始孔8 1及第二初始孔82以獲得遮罩8,有可能 與借助於習知光微影方法於用於形成遮罩《薄膜中形成開 口的情形相比較,容易且便宜地以一預定圖案於用於形成 106147.doc -45 - 1295382 遮罩之薄膜85中形成開口(第—初始孔Η及第二初始孔 82)。此使得有可能增加附有凹部之構件仏生產率,藉此 有可能以一較低成本提供附有凹部之構件6。 此外,根據上述方法,有可能容易地實施對於大尺寸基 板之處理。同樣’根據本方法,在製造此—大尺寸基板的 情形中’不存在如習知方法-般焊接複數個基板的必要 性,藉此有可能消'除焊接縫之外觀。此使得有可能以一低 成本借助於一簡單方法>古口所丄The shirt is ringing. Further, in the case where A-gas Λτ A is used as an etchant, the etchant may contain, for example, chlorine peroxide. This makes it possible to accelerate the remnant speed. In addition, the vehicle master can perform the wet stenciling process in a simpler apparatus for dry splicing, and it allows a large number of base members 7 to be processed. This makes it possible to add a member with a recess to the member to which the recess is attached 106147.doc - 44 - 1295382. It is possible to produce a car and it is possible to remove the mask 8 (mask removal f 耘) as shown in Fig. 6F. At this time, along with the mask 8, a spleen north ^ ^ cut surface protective film 89 is removed. In the case of the self-material opening ^ is the main (four) morphing layer and the layered structure composed of chrome oxide as the main = layered layer _ in the case, can be used to help the use of cerium ammonium nitrate and the mask The removal of 8 . . . "the object of the engraving process is as shown in the figure π, Figure 4 and Figure 5, the result of the above process is obtained - the member 6 with the concave portion, in which the canine-shaped large teeth lattice A plurality of second recesses 62 are formed on the outer surface of the region in which the first recess is formed in the base member 7. The plurality of second recesses are formed on the surface of the base member 7. The method of the recess 62 is not particularly limited. In the form of a crescent of the lattice shape of the first recessed portion 61 and the second recessed portion 62 by means of the above-described method, that is, by irradiation with a laser beam Forming a first initial hole and a second initial hole 82 in the mask-forming film 85 to obtain a mask 8 on the base member 7, and then forming the first member 7 in the base member 7 by subjecting the base member 7 to an etching process using the mask 8. In the case of a method of a recess 61 and a second recess 62, it is possible to obtain The column effect. That is, by forming the first initial hole 81 and the second initial hole 82 in the film for forming the mask by means of the laser beam to obtain the mask 8, it is possible to use the conventional light lithography The method is easy and inexpensive to form an opening in a film 85 for forming a 106147.doc -45 - 1295382 mask in a predetermined pattern as compared with the case of forming a mask in the film forming the opening (first initial aperture) And a second initial hole 82). This makes it possible to increase the productivity of the member with the recess, whereby it is possible to provide the member 6 with the recess at a lower cost. Further, according to the above method, it is possible to easily implement The processing of a large-sized substrate. Also in the case of manufacturing a large-sized substrate according to the present method, there is no necessity of soldering a plurality of substrates as in the conventional method, whereby it is possible to eliminate the appearance of the welded seam. This makes it possible to resort to a simple method at a low cost.
袈达回。口質大尺寸用於形成微透鏡 21(即,微透鏡基板1)之附有凹部之構件6。 此外,在借助於鐘射束之照射形&第一初始孔8ι及第二 初始孔82的情形中’有可能容易且無誤地控制待形成之第 -初始孔81及第二初始孔82之每—者之形狀及尺寸、排列 及類似特徵。 此外’藉由在蝕刻製程中使用密封構件88,有可能容易 且無誤地形成其深度相互不同之[凹部61及第二凹部 62。此外’有可能容易且無誤地控制待形成之第—凹部η 及第二凹部62之深度。 下面,現在將描述使用附有凹部之構件6製造微透鏡基板 (附有凸部之構件)1的方法。 圖7為一縱向橫截面圖,其示意性地展示一製造在圖工中 所展示之微透鏡基板(微透鏡基板)丨之方法的一個實例。現 在,在下文使用圖7之解釋中,為了便於解釋,將在圖了中 下側及上側分別稱為”光入射側,,及,,光發射側"。 <B 1>如在圖7A中所展示,將具有流動十生之一樹脂材料 106147.doc -46- 1295382 23(例如,處於軟化狀態之樹脂材料23,—非聚合(未固化) 樹脂材料23)供給至其上形成第一凹部61及第二凹部以之 附有凹#之構件6之表面,接著借助於—平板11擠壓樹脂材 料23。詳言之,在本實施例中,借助於平板u擠壓(或推) ,脂材料23’同時在附有凹部之構件6與平板u之間提供間 隔,20因而’有可能更無誤地控制所形成的微透鏡基板1 旱度且此使得有可庇更無誤地控制於最終獲得之微透 鏡基板i中之各自微透鏡21之焦點。另外,有可能更有效防 止產生諸如色彩不均勻之缺點。 由具有幾乎等於樹脂材料23(處於凝固狀態之樹脂材料 23)之折射率的折射率的材料形成間隔物汕之每一者。藉由 使用由此一材料形成之間隔物2〇,有可能甚至在排賴隔 物20於其中形成附有凹部之構件6之任何第一凹部“之每 -者之部分的情形中’防止間隔物2〇對於所獲得之微透鏡 基板學特徵產生有害影響。此使得有可能於附有凹部 之構件6之-個主表面之一寬區域中提供相對大量之間隔 物20。結果,有可能有效除去歸因於附有凹部之構件6及/ 或平板η之撓曲或其類似物之影響,且此使得有可能更無 誤地控制所獲得之微透鏡基板1之厚度。 雖然如上所述由具有幾乎等於樹脂材料23(處於凝固狀 態之樹脂材料23)之折射率的折射率的材料形成間隔物 20 ’但是更具體言之,較佳在間隔物2〇之組成材料之絕對 折射率與處於凝固狀態之樹脂材料23之絕對折射率之間的 差之絕對值為0.20或更小,且更佳其為〇1〇或更小。進一步 106147.doc _47· 1295382 之樹脂材 較佳其為卜且最佳由與處於凝固狀態 料23之材料相同的材料形成間隔物2〇。 間隔物20之每一者之形狀並非特定受限。較佳間隔物20 之每:者之形狀為大體上球形或大體上圓柱形。在間隔物 20之每一者具有此一形狀的情形中,較佳間隔物2〇之直秤 在1〇至则㈣之範圍中,且更佳其在30至200 _之範圍 中進一步更佳其在30至1 70 μιη之範圍中。袈达回. The large size of the stomata is used to form the member 6 with the concave portion of the microlens 21 (i.e., the microlens substrate 1). Further, in the case of the illumination of the clock beam & the first initial aperture 8ι and the second initial aperture 82, it is possible to easily and without error control the first-initial aperture 81 and the second initial aperture 82 to be formed. The shape and size, arrangement and similar features of each. Further, by using the sealing member 88 in the etching process, it is possible to easily and unambiguously form the concave portion 61 and the second concave portion 62 whose depths are different from each other. Further, it is possible to easily and unambiguously control the depths of the first concave portion η and the second concave portion 62 to be formed. Next, a method of manufacturing a microlens substrate (member with a convex portion) 1 using the member 6 with a concave portion will now be described. Fig. 7 is a longitudinal cross-sectional view schematically showing an example of a method of manufacturing a microlens substrate (microlens substrate) shown in the drawing. Now, in the explanation below using FIG. 7, for convenience of explanation, the lower side and the upper side in the figure will be referred to as "light incident side, and, light-emitting side", respectively, as shown in the figure. As shown in FIG. 7A, a resin material 106147.doc -46-1295382 23 (for example, a resin material 23 in a softened state, a non-polymerized (uncured) resin material 23) having a flowing tenth is supplied thereto to form a first A recess 61 and a second recess are attached with the surface of the member 6 of the recess #, and then the resin material 23 is pressed by means of the flat plate 11. In detail, in the present embodiment, the flat u is pressed (or pushed) ), the grease material 23' simultaneously provides a space between the member 6 with the recess and the flat plate u, so that it is possible to control the degree of dryness of the formed microlens substrate 1 more unambiguously and this allows for more controllable control The focus of the respective microlenses 21 in the finally obtained microlens substrate i. In addition, it is possible to more effectively prevent the occurrence of defects such as color unevenness. Refraction by having a resin material 23 (resin material 23 in a solidified state) which is almost equal to Rate of refractive index Each of the spacers is formed. By using the spacer 2 formed by the material, it is possible to even form any of the first recesses of the member 6 with the recesses formed therein in the spacer 20 In the case of part of the 'preventing spacer 2 产生 has a detrimental effect on the microlens substrate characteristics obtained. This makes it possible to provide a relatively large number of spacers 20 in a wide area of one of the main surfaces of the member 6 to which the recess is attached. As a result, it is possible to effectively remove the influence due to the deflection of the member 6 and/or the flat plate η with the concave portion or the like, and this makes it possible to control the thickness of the obtained microlens substrate 1 more without fail. Although the spacer 20' is formed of a material having a refractive index almost equal to the refractive index of the resin material 23 (the resin material 23 in a solidified state) as described above, more specifically, it is preferably a constituent material of the spacer 2 The absolute value of the difference between the absolute refractive index and the absolute refractive index of the resin material 23 in a solidified state is 0.20 or less, and more preferably 〇1 〇 or less. Further, the resin material of 106147.doc _47· 1295382 is preferably a spacer 2 which is preferably formed of the same material as that of the material 23 in the solidified state. The shape of each of the spacers 20 is not specifically limited. Preferably, each of the spacers 20 is generally spherical or substantially cylindrical in shape. In the case where each of the spacers 20 has such a shape, it is preferable that the scale of the spacer 2 is in the range of 1 〇 to (4), and more preferably it is further preferably in the range of 30 to 200 Å. It is in the range of 30 to 1 70 μm.
在此方面,在使用上述之間隔物2〇的情形中,當固化樹 脂材料23時,可於附有凹部之構件6與平板u之間提供間隔 物20。_,供、給間隔物2〇之時序並非特定受限。此外, 例如可利用其中預先分散間隔物2〇之樹脂材料。作為供給 至其上形成第一凹部61之附有凹部之構件6之表面上的樹 脂材料23,或可在提供間隔物2〇於附有凹部之構件6之表面 上同時供給樹脂材料23於其上。或者,在供給樹脂材料^ 於其上之後可供給間隔物20於附有凹部之構件6之表面上。 樹脂材料23通常由對應於上述主基板2之組成材料之材 料形成。此外’(例如)於樹脂材料23中可包括:聚合引發劑、 硬化防黏劑(例如’基於胺之化合物)、分散劑、溶劑、漫射 劑(例如,珠形玻璃、矽石、無機基氧化物、無機基碳酸鹽、 無機基硫酸鹽、有機基樹脂及其類似物)、紫外線吸收劑、 光穩定劑、界面活性劑、消泡劑、抗靜電劑、氧化抑制劑、 阻燃劑及其類❿物。舉例而·^ ’在冑脂材料包括一漫射劑 的情形中,有可能提高如上所述應用微透鏡基板丨之穿透型 屏幕10之視角特徵。此外,舉例而言,因為即使忽略漫射 106147.doc -48- 1295382 板或其類似物之組態亦有可能提高穿透型屏幕1〇之屏幕的 視角特欲’所以有可能使得穿透型屏幕⑺及/或背投式 機300更薄。 此外’在本發明中,當塗覆樹脂材料23於附有凹部之構 件6上時,於附有凹部之構件6之一個末端部處提供用於協 助微透鏡基板1自附有凹部之構件6釋出之-可移除構件 69,且樹脂材料23塗覆於構件69上。 在當以此方式供給(塗覆)樹脂材料23於附有凹部之構件 6上時使用構件69的情形中,有可能在隨後製程(即,自附 有凹部之構件6釋出主基板2之製程)中藉由移除構件的而 無誤地握緊待形成之主基板2之一個末端部之附近。結果, 有可能在自附有凹部之構件6釋出主基板2之製程中防止添 加相對大的應力至任何第二凹部62及主基板2之任何對應 凸部附近,且有可能更平穩地開始及進行主基板(附有凸^ 之構件)2之釋出。另外,有可能改良第二凸部62之每-者 之形狀穩定性’且可能顯著改良附有凹部之構件6之耐用 性。 雖然可由任何材料形成構件69,但是較佳構件的至樹脂 材料23之黏著力(即,供給於其上之後凝固的樹脂材料η同 時具有流動性)小於附有凹部之構件6至樹脂材料U之黏 力。 構件69之寬度(在主基板2之釋出方向上構件的之長度, 即,在圖7Α中由L6表示之長度)並非特定受限。舉例而言, 較佳構件69之寬度在〇.5至2〇〇 mm之範圍中。更佳其在$至 106147.doc -49- 1295382 100匪之範圍中,且進—步更佳其在!〇至50 mm之範圍 中。在將構件69之寬度約束在上述範圍内的情形中,有可 能充分且顯著地達成上述效果,同時防止多於所需地放大 微透鏡基板1之非可用透鏡區域。另外,有可能改良第二凸 部62之每一者之形狀穩定性’且進一步有可能顯著改良附 有凹部之構件6之耐用性。In this regard, in the case of using the above-described spacer 2, when the resin material 23 is cured, the spacer 20 can be provided between the member 6 to which the recess is attached and the flat plate u. _, the timing of supply and supply of spacers is not specifically limited. Further, for example, a resin material in which the spacer 2 is previously dispersed can be utilized. As the resin material 23 supplied onto the surface of the member 6 with the recessed portion on which the first recess 61 is formed, or the resin material 23 may be simultaneously supplied on the surface of the member 6 to which the recess is provided on. Alternatively, the spacer 20 may be supplied onto the surface of the member 6 to which the recess is attached after the resin material is supplied thereon. The resin material 23 is usually formed of a material corresponding to the constituent materials of the above-described main substrate 2. Further, 'for example, the resin material 23 may include: a polymerization initiator, a hardening anti-sticking agent (for example, an 'amine-based compound), a dispersing agent, a solvent, a diffusing agent (for example, a bead glass, a vermiculite, an inorganic base). Oxides, inorganic carbonates, inorganic sulfates, organic resins and the like), ultraviolet absorbers, light stabilizers, surfactants, defoamers, antistatic agents, oxidation inhibitors, flame retardants and Its kind of stolen goods. For example, in the case where the blush material includes a diffusing agent, it is possible to improve the viewing angle characteristics of the transmissive screen 10 to which the microlens substrate 应用 is applied as described above. In addition, for example, because even if the configuration of the diffused 106147.doc -48-1295382 board or the like is neglected, it is possible to improve the viewing angle of the screen of the penetrating screen. The screen (7) and/or the rear projection machine 300 are thinner. Further, in the present invention, when the resin material 23 is coated on the member 6 to which the recess is attached, a member 6 for assisting the microlens substrate 1 with the recess is provided at one end portion of the member 6 to which the recess is attached. The member 69 is released, and the resin material 23 is applied to the member 69. In the case where the member 69 is used when the resin material 23 is supplied (coated) on the member 6 to which the recess is attached in this manner, it is possible to release the main substrate 2 in the subsequent process (i.e., from the member 6 to which the recess is attached) In the process, the vicinity of one end portion of the main substrate 2 to be formed is gripped without fail by removing the member. As a result, it is possible to prevent the addition of relatively large stress to any second recess 62 and any corresponding convex portion of the main substrate 2 in the process of releasing the main substrate 2 from the member 6 to which the recess is attached, and it is possible to start more smoothly. And the release of the main substrate (the member with the convex member) 2 is performed. In addition, it is possible to improve the shape stability of each of the second convex portions 62 and it is possible to remarkably improve the durability of the member 6 with the concave portions. Although the member 69 may be formed of any material, the adhesive force of the preferred member to the resin material 23 (i.e., the resin material η solidified after being supplied thereto simultaneously has fluidity) is smaller than the member 6 to the resin material U having the recessed portion. Stickiness. The width of the member 69 (the length of the member in the release direction of the main substrate 2, that is, the length indicated by L6 in Fig. 7A) is not particularly limited. For example, the preferred member 69 has a width in the range of 〇.5 to 2 〇〇 mm. Better in the range of $ to 106147.doc -49- 1295382 100匪, and the better step is better! 〇 to the range of 50 mm. In the case where the width of the member 69 is constrained within the above range, it is possible to sufficiently and remarkably achieve the above effects while preventing more than necessary magnification of the non-available lens region of the microlens substrate 1. In addition, it is possible to improve the shape stability of each of the second projections 62 and further it is possible to significantly improve the durability of the member 6 with the recesses.
此外,可塗覆一脫模劑或其類似物於其上形成第一凹部 61及第二凹部62之附有凹部之構件6之表面上及/或塗覆於 用以壓擠壓樹脂材料23之平板n之表面上。此使得有可能 在下列步驟中容易且無誤地自附有凹部之構件6及平板u 分離微透鏡基板1(主基板2)。至於脫模製程、由具有脫模能 力之材料形成之薄膜的形成,可提及的有(例如)含氟有機矽 化合物、諸如烷基聚矽氧烷之基於矽之化合物、諸如聚四 氟乙烯之基於氟之化合物及烷基四級銨鹽;借助於由諸如 六甲基二石夕氮烷([(CH3)3Si]2NH)之矽烷化劑的矽烷化材料 的表面處理、借助於基於氟之氣體的表面處理或其類似物。 <B2>其次,凝固(在此方面,包括硬化(聚合》樹脂材料 23 ’且接著移除平板11(參看圖7B)。以此方式,獲得具備 複數個微透鏡21(詳言之,滿足如上所述諸如形狀、排列條 件及類似條件之微透鏡21)之主基板2,微透鏡2 1自填充入 複數個第一凹部61(其每一者充當一凸透鏡)的樹脂材料23 、組成。在藉由硬化(聚合)實施樹脂材料23之凝固的情形中, 其方法並非特定受限,且根據樹脂材料之種類適當地選擇 該方法。舉例而言,可提及的有(諸如)紫外光之照射、加熱、 106147.doc -50- 1295382 電子束照射及類似方法。藉由凝固樹脂材料23,除了形成 微透鏡2 1之外,亦形成對應於第二凹部62之凸部。自最終 製成之微透鏡基板1可移除此等凸部。或者,該等凸部可充 當透鏡。 在此方面,較佳固化樹脂材料23之硬度在肖氏(sh〇re)硬 度D 80至20之範圍中,且更佳其在肖氏(sh〇re)硬度d 6〇至 30之祀圍中。在將樹脂材料23之硬度約束在上述範圍内的 情形中,主基板(附有凸部之構件)2可具有足夠硬度,且有 可能當自作為模具之附有凹部之構件6釋出主基板2時抑制 應力之增加。另外,有可能顯著改良主基板2之凹-凸圖案 之穩定性(即,其形狀穩定性)。 <B3>其次,現在將描述一黑色矩陣3形成於如上所述製 造之主基板2之光發射表面上的製程。 首先,如在圖7C中所展示,於主基板2之光發射表面上供 給具有光屏蔽(阻斷)效應之一正類型光聚體32。關於供給正 類型光聚體32於主基板2之光發射表面上的方法,可利用的 有以下各種類型塗佈方法(例如):浸潰塗布方法、刮塗方 法、旋塗方法、上光塗覆方法、喷塗、靜電塗布、電鑛塗 布、滾塗機及類似方法。可自具有光屏蔽(阻斷)效應之樹脂 組:正類型光聚體32’或可自其,將一具有光屏蔽(阻斷) 效應 1材料分散或溶解至具有低光屏蔽(阻斷)效應之樹脂 材料中的材料組成正類型光聚體32。若需要,則可心 正類型光«32之後實施(例如)預烘製程之熱處理。’… ⑽其次’如在請中展示’將用於曝光之光⑽—垂 106147.doc -51 - 1295382 直於主基板2之光入射表面之方向照射至主基板2上。藉由 透過微透鏡21之每-者聚集用於曝光之照射光^曝^在 微透鏡21之每一者之焦财附近之正類型光聚體Μ,且不曝 先或微弱曝光(即’曝光程度小)對應於除了焦點情近之外 之部分的正類型光聚體32。以此方式,僅僅曝光在各自焦 點f附近之正類型光聚體32。Further, a release agent or the like may be coated on the surface of the member 6 on which the recessed portion of the first recess 61 and the second recess 62 is formed and/or applied to press-extrude the resin material 23 On the surface of the plate n. This makes it possible to separate the microlens substrate 1 (main substrate 2) from the member 6 with the concave portion and the flat plate u easily and without mistake in the following steps. As for the release process, formation of a film formed of a material having mold release ability, there may be mentioned, for example, a fluorine-containing organoantimony compound, a ruthenium-based compound such as an alkyl polysiloxane, such as polytetrafluoroethylene. Fluorine-based compound and alkyl quaternary ammonium salt; surface treatment by means of a decylating material from a decylating agent such as hexamethyldiazepine ([(CH3)3Si]2NH), by means of fluorine Surface treatment of the gas or the like. <B2> Next, solidification (in this aspect, including hardening (polymerizing) resin material 23' and then removing the flat plate 11 (refer to Fig. 7B). In this way, it is obtained to have a plurality of microlenses 21 (in detail, satisfied The main substrate 2 of the microlens 21 such as the shape, the alignment condition, and the like as described above, the microlens 21 is composed of a resin material 23 filled with a plurality of first recesses 61 each serving as a convex lens. In the case where the solidification of the resin material 23 is carried out by hardening (polymerization), the method thereof is not particularly limited, and the method is appropriately selected depending on the kind of the resin material. For example, there may be mentioned, for example, ultraviolet light. Irradiation, heating, electron beam irradiation, and the like. By solidifying the resin material 23, in addition to forming the microlens 21, a convex portion corresponding to the second concave portion 62 is also formed. The convex portions may be removed by the microlens substrate 1. Alternatively, the convex portions may serve as lenses. In this respect, the hardness of the cured resin material 23 is preferably a Shore D hardness of 80 to 20 In scope, and better In the case of a Shore d hardness of d 6 〇 to 30. In the case where the hardness of the resin material 23 is restricted within the above range, the main substrate (member with a convex portion) 2 may have sufficient hardness. And it is possible to suppress an increase in stress when the main substrate 2 is released from the member 6 with the concave portion as a mold. Further, it is possible to significantly improve the stability of the concave-convex pattern of the main substrate 2 (i.e., its shape stability) <B3> Next, a process in which a black matrix 3 is formed on the light-emitting surface of the main substrate 2 manufactured as described above will now be described. First, as shown in Fig. 7C, light emission on the main substrate 2 A positive type photopolymer 32 having a light shielding (blocking) effect is supplied on the surface. Regarding the method of supplying the positive type photopolymer 32 on the light emitting surface of the main substrate 2, the following various types of coating methods are available. (for example): a dip coating method, a knife coating method, a spin coating method, a glazing coating method, a spray coating, an electrostatic coating, an electric ore coating, a roll coater, and the like, which can have a light shielding (blocking) effect. Resin group: positive type photopolymer 32' or from there, a material having a light-shielding (blocking) effect 1 material dispersed or dissolved into a resin material having a low light-shielding (blocking) effect constitutes a positive type photopolymer 32. If necessary, After the positive type of light «32, the heat treatment of the pre-baking process is carried out, for example. '... (10) Secondly, as shown in 'Please show' the light to be used for exposure (10) - vertical 106147.doc -51 - 1295382 straight to the main substrate 2 The direction of the light incident surface is irradiated onto the main substrate 2. The positive type of light collected near the coke of each of the microlenses 21 is exposed by the illumination light for exposure through the microlenses 21 The body type, and does not expose the first or weak exposure (i.e., 'small exposure degree') corresponds to the positive type photopolymer 32 except for the focus. In this way, only the positive type photopolymer 32 near the respective focal point f is exposed.
接著實施顯影。在此情形中,因為光聚體32為正類型光 聚體’所以由顯影溶融且移除各自焦點f附近之曝光光聚體 32。結果,如在_中展示,提供其中形成開⑽於對廣 ^微透鏡22之光轴L之部分的黑色矩陣3。可根據正類型光 聚體32之組分或其類似特徵任意地選擇顯影方法。舉例而 言:藉由制諸如氫氧化鉀或其類似物溶液之驗性水溶液 實施在本實施例中正類型光聚體32之顯影。 、以此方式,在本實施例之製造微透鏡基板丨之方法中,因 為藉由以由複數個微透鏡21聚光的用於曝光之光照射光聚 體32形成黑色矩陣3,所以有可能(例如)與使用光微影技術 的情形相比較以更簡單的製程形成黑色矩陣3。 此外,若需要,則在曝光正類型光聚體32之後,可實施 諸如後烘製程之熱處理。 <B5>其次,自附有凹部之構件6釋出主基板(附有凸部之 構件)2。 首先,如在圖7F中所展示,藉由自附有凹部之構件6移除 構件69,將構件69自主基板2分離。因而導致對應於構件69 之主基板2之一個末端部至某一狀態,其中該末端部自附有 106147.doc -52- 1295382 凹部之構件6分離。藉由以此方式使用構件69,有可能 地握緊待形成之主基板2之末端部姓、 、、、σ果,有可能有效 防止添加相對大的應力至附有凸部之構件所形成的附有凹 部之構件6之任何第二凹部62及/或任何對應凸部的附近。 另外,有可能有效防止添加相對大的應力至附有凸部 件所待形成的附有凹部之構件6之任何第一凹部“ Γ應微透鏡21的附近,且有可能更平穩地開始及進行主 基板(附有凸部之構件)2之釋出。另外,有可能改良第二凸 者之形狀敎性,且有可能顯著改良附有凹部 之構件6之耐用性。 如=7G中所展示,當自附有凹部之構件 時,主基板2彎曲。 傲 二當自附有凹部之構件6釋出主基板2時,釋出方向 Γ:::之構件6中第一凹部61之每-者之短轴線方 二此使:有可能在釋出期間進一步減少至附有凹部之構 陷。“2的應力,且有可能防止產生其凹-凸圖案之缺 自附有凹部之構件6釋出主基板2時,較佳以大 了Ί疋 連續地(沒有中斷)釋出主基板2。此使得有 中斷的情形中,使得;:在其中存在釋出操作之 翠出操作之重新起始時添加至附有 凹部之構件…至附有 充分達成上述效果之可能:應力增大’且因此’存在不能 因為如上所述篦-如Μ “, 一 4 62提供於附有凹部之構件6中,所 106147.doc •53· 1295382 ,、有可此谷易且無誤地以相對小的力自附有凹部之構件6 釋出主基板2(同時充分防止在凹-凸圖案中產生諸如裂痕之 缺陷)。 雖然釋出速度並非特定受限,纟是(例如)較佳該釋出速 f在0·1至500 mm/秒之範圍中。更佳其在di〇〇 mm/秒之 p圍中且進一步更佳其在10至50 mm/秒之範圍中。在將 釋出速度約束在上述範圍中的情形中,冑可能更穩定地實 施釋出操作。另-方面,在釋出速度低於上面所給出的下 限的情形中,自附有凹部之構件6釋出主基板2非常耗時, 且因此’存在關於微透鏡基板丨(主基板勾之生產率較低的缺 點的可旎性。此外,在釋出速度高於上面所給出的上限的 情形中,使得至附有凹部之構件6及主基板2之應力增加, 且因此存在不能充分達成上述效果之可能性。 雖然當自附有凹部之構件6釋出主基板丨之力(抗張強度) 並非特定受限,但是(例如)較佳該力(抗張強度)在5至1000 g/-n(寬度)之範圍中。更佳其在8至7〇〇 g/cm(寬度)之範圍 中,且進一步更佳其在1〇s 500 g/cm(寬度)之範圍中。藉由 約束該力(抗張強度)在上述範圍中,有可能更穩定地實施該 釋出操作。另一方面,在該力(抗張強度)低於上面所給出的 下限的情形中,自附有凹部之構件6釋出主基板2將非常耗 時,且因此,存在微透鏡基板丨(主基板2)之生產率較低之缺 點的可能性。此外,在該力(抗張強度)高於上面所給出的上 限的情形中,使得至附有凹部之構件6及主基板2之應力增 加,且因此,存在不能充分達成上述效果的可能性。 106147.doc •54- 1295382 =此方式’如在圖7財所展示,獲得—於其光發射表面 挺供黑色矩陣3之主基板(附有凹部之構件)2。 ,<B6>接者’藉由供給—著色液體於已自附有凹部之構件 :釋出之主基板2上’於其上形成著色部以,藉此獲得微透 鏡基板1(參看圖71)。Development is then carried out. In this case, since the photopolymer 32 is a positive type photopolymer, the exposure photopolymer 32 in the vicinity of the respective focus f is removed by development and removal. As a result, as shown in _, a black matrix 3 in which a portion which is opened (10) to the optical axis L of the wide microlens 22 is provided. The developing method can be arbitrarily selected in accordance with the composition of the positive type photopolymer 32 or the like. For example, development of the positive type photopolymer 32 in this embodiment is carried out by preparing an aqueous solution of a solution such as potassium hydroxide or the like. In this manner, in the method of manufacturing the microlens substrate 本 of the present embodiment, since the black matrix 3 is formed by irradiating the photopolymer 32 with light for exposure condensed by the plurality of microlenses 21, it is possible ( For example, the black matrix 3 is formed in a simpler process than in the case of using the photolithography technique. Further, if necessary, after the positive type photopolymer 32 is exposed, a heat treatment such as a post-baking process may be performed. <B5> Next, the main substrate (the member with the convex portion) 2 is released from the member 6 to which the concave portion is attached. First, as shown in Fig. 7F, the member 69 is separated from the autonomous substrate 2 by removing the member 69 from the member 6 to which the recess is attached. This results in a distal end portion of the main substrate 2 corresponding to the member 69 to a state in which the member 6 of the recessed portion 106107.doc - 52 - 1295382 is separated. By using the member 69 in this manner, it is possible to grip the end portion of the main substrate 2 to be formed, the last name, the sigma, the σ fruit, and it is possible to effectively prevent the addition of relatively large stress to the member with the convex portion. Any second recess 62 of the member 6 with the recess and/or the vicinity of any corresponding protrusion. In addition, it is possible to effectively prevent the addition of relatively large stress to any of the first recesses of the member 6 with the recess to be formed with the convex member to be formed, and it is possible to start and perform the main body more smoothly. The release of the substrate (the member with the convex portion) 2 is further improved. Further, it is possible to improve the shape of the second convex, and it is possible to significantly improve the durability of the member 6 with the concave portion. As shown in =7G, When the member to which the recess is attached is attached, the main substrate 2 is bent. When the member 6 to which the recess is attached releases the main substrate 2, each of the first recesses 61 in the member 6 of the release direction :::: The short axis of the second is such that it is possible to further reduce the depression to the recessed portion during the release. "2 stress, and it is possible to prevent the occurrence of the concave-convex pattern from the release of the member 6 with the concave portion In the case of the main substrate 2, the main substrate 2 is preferably discharged continuously (without interruption) in a large enthalpy. This causes an interruption, such that: in the re-starting of the emerald operation in which the release operation is present, the member is attached to the recessed portion...to the extent that the above effect is sufficiently achieved: the stress is increased' and thus 'The existence cannot be because of the above-mentioned 篦-如Μ", a 4 62 is provided in the member 6 with the recess, 106147.doc •53·1295382, and it is easy to use the relatively small force The member 6 with the recesses releases the main substrate 2 (while sufficiently preventing defects such as cracks in the concave-convex pattern). Although the release speed is not particularly limited, for example, the release speed f is preferably More preferably in the range of 0·1 to 500 mm/sec. It is preferably in the range of di〇〇mm/sec and further preferably in the range of 10 to 50 mm/sec. In the case of the range, the helium may perform the releasing operation more stably. On the other hand, in the case where the releasing speed is lower than the lower limit given above, the member 6 attached with the recess releases the main substrate 2 very expensive. Time, and therefore 'there is a microlens substrate 丨 (the main substrate hook Further, in the case where the release rate is higher than the upper limit given above, the stress to the member 6 with the recess and the main substrate 2 is increased, and thus there is a failure to fully achieve The possibility of the above effect. Although the force (tensile strength) at which the member 6 attached to the recess is released from the main substrate is not particularly limited, for example, the force (tensile strength) is preferably 5 to 1000 g. More preferably in the range of /-n (width), more preferably in the range of 8 to 7 〇〇g/cm (width), and even more preferably in the range of 1 〇 s 500 g/cm (width). By restraining the force (tensile strength) in the above range, it is possible to carry out the releasing operation more stably. On the other hand, in the case where the force (tensile strength) is lower than the lower limit given above, The release of the main substrate 2 by the member 6 with the recess portion is very time consuming, and therefore, there is a possibility that the productivity of the microlens substrate 丨 (main substrate 2) is low. Further, the force (tensile strength) is high. In the case of the upper limit given above, the member 6 and the main base to which the recess is attached are brought The stress of the plate 2 is increased, and therefore, there is a possibility that the above effects cannot be sufficiently achieved. 106147.doc • 54- 1295382 = This mode is obtained as shown in Fig. 7 and obtained as a black matrix 3 on its light emitting surface. The main substrate (the member with the recessed portion) 2, <B6> is connected by the supply-coloring liquid to the member having the recessed portion: the main substrate 2 that is released is formed with a coloring portion thereon Thereby, the microlens substrate 1 is obtained (see FIG. 71).
該著色液體並非料受限,且在本實施例中,該著色液 體為含有著色劑及节醇之著色液體。本發明發現有可能藉 由使用此-著色液體容易且無誤地實施主基板之著色。詳 =之,根據本製程,有可能容易且無誤地使由諸如基於丙 烯駄之樹脂之材料形成的主基板2經受一著色製程,而此主 基板2難於在一習知著色方法中著色。認為此係因為下列原 ▲即’精由使用含有苄醇之著色液體,在著色液體中之苄 醇深深地滲透主基板2且在其中擴散,藉此使組成主基板2 之分子的鍵結(在分子之間的鍵結)鬆開,且固定了其中著色 劑將滲透之空間。置換在著色液體中之㈣及著色劑,藉 此在u亥等工間(可將其比作著色劑之座位(著色座位))固持 著色劑,且因此,主基板2之表面被著色。 此外,藉由使用如±所述之著色液體,有可能容易且無 铁地形成具有均勻厚度之著色部22。詳言之,即使待著色 之主基板(即,工作)為一個其中於其表面上提供諸如微透鏡 之微小結構的主基板(一個其中其表面之二維方向之不均 勻度循%較小的主基板),或為其中待著色之區域為一大面 積的主基板,亦有可能以均勻厚度(即,無色彩不均勻)形成 106147.doc -55- 1295382 著色部22。 田至於供給著色液體於主基板2之光入射表面上的方法,可 提及的有以下各種塗覆方法··(例如)刮塗方法、方走塗方法、 ^光塗覆方法、喷塗、靜電塗布、電鍍塗布、印刷、滾塗 機及其中將主基板2沉浸(浸泡)於著色液體中的浸潰塗覆方 法及其類似方法。在此等方法中浸潰方法(詳言之,浸潰染 色)為合適的。此使得有可能容易且無誤地形成著色部剛 言之,具有均句厚度之著色部22)。此外,詳言之,在借助 2浸潰染色將著色液體供給於主基板2上的情形中,有可能 容易且無誤地著色由諸如基於丙烯酸之樹脂之材料形成的 主基板2,而此主基板2很難在一習知著色方法中著色。認 為此係因為:可用於浸潰染色之染料對於基於丙烯酸之樹 脂及其類似物所具有的g旨基團(g旨鍵)具有高親和性。 車乂仏κ施著色液體供給步驟,同時加熱著色液體及/或主 ^板在6G°C至1GG°C之範圍中。此使得有可能有效形成著色 邛22,同呀充分防止產生對於其上形成著色部22之主基板2 的有害影響(例如,主基板2之組成材料變質)。 此外’可員施著色液體供給步驟,同時提高環境壓力(應 ^壓力)。此使得有可能加速著色液體滲透至主基板2之内 邓的且…果,有可能短時間内有效形成著色部22。 …在此方面,若需要(例如,在待形成之著色部22之厚度相 、子大勺It形中)’則可重複地(即,多次)實施著色液體供給 步驟。此外’若需要,則在供給著色液體之後,可使主基 板2、、上又諸如加熱、冷卻及其類似處理之熱處理、光之照 106147.doc -56- 1295382 射,氣壓之加壓或減壓或其類似步驟。此使得有可能加速 著色部22之固定(穩定)。 在下文中,將詳細描述在本步驟中使用的著色液體。 在著色液體中苄醇之含量百分比並非特定受限。較佳节 醇之含量百分比在0.01至10.0重量百分比之範圍中。更佳其 在0.05至8.0重量百分比之範圍中,且進一步更佳其在〇1至 5.0重量百分比之範圍中。在將苄醇之含量百分比約束在上 述範圍内的情形中,有可能容易且無誤地形成合適的著色 部22,同時更有效防止產生對於其上形成著色部22之主基 板2的有害影響(諸如主基板2之組成材料變質)。 雖然在者色液體中含有之耆色劑可為任何諸如各種染料 及各種顏料之著色劑,但是較佳該著色劑為染料。更佳其 為分散染料及/或陽離子染料,且進一步更佳其為分散染 料。此使得有可能有效形成著色部22,同時充分防止產生 對於其上形成著色部22之主基板2的有害影響(例如,主基 板2之組成材料變質)。詳言之,有可能容易且無誤地著色 甚至由諸如基於丙烯酸之樹脂之材料形成的主基板2,而此 主基板2很難在一習知著色方法中著色。認為此係因為:因 為如上所述之著色劑使用基於丙烯酸之樹脂及其類似物所 具有的酯基團(酯鍵)作為著色座位,所以易於著色該材料。 如上所述,雖然在本實施例中所使用之著色液體含有至 少著色劑及苄醇,但是較佳該著色液體進一步含有選自基 於二苯甲酮之化合物及基於苯幷三唑之化合物及节醇的= 少一種化合物。使此得有可能更有效形成著色部22,同時 106147.doc •57· 1295382 充分防止產生對%甘,a , 王對於其上待形成著色部22之主基板2的有害 影響(例如,主其4πτ。 土扳2之組成材料變質)。認為此係因為下列 原因。 即藉由使用含有节醇及選自基於二苯甲酮之化合物及 ;苯幷一坐之化合物之至少一種化合物(在下文中,將苄 醇、基於二苯甲,之化合物及基於苯幷三唑之化合物通稱 為"J、、加d )的著色液體,在著色液體中之該等添加劑渗透 主基板2且在其中擴散,藉此使組成主基板2之分子的鍵結 (在分子之間的鍵結)鬆開,且固定其中著色劑將渗透之空 間置換著色劑及添加劑,藉此在該等空間(可將其比作著 色?d之座位(著色座位))中固持著色劑,且因此,主基板2 之表面被著色。認為此係因為:藉由與苄醇一起使用選自 基於二苯甲酮之化合物及基於苯幷三唑之化合物之至少一 種化合物,其以互補方式相互作用,且該著色液體之著色 變得較好。 至於基於二苯甲酮之化合物,可利用的有:具有二苯甲 酮主鏈之化合物、其互變異構體或此等誘導物(例如,加成 反應產物、取代反應產物、還原反應產物、氧化反應產物 及其類似物)。 至於此4化合物,可提及的有(例如)二苯甲酮、2,4_二經 基一笨甲酮、2-羥基-4-甲氧二苯甲酮、2,2,_二羥基_4,4,-二 甲氧二苯甲酮、四羥基二苯甲酮、2_羥基_4_辛基 一本甲酮、4-苄氧基-2-每基一苯甲_、二苯甲酮苯胺、二 苯甲酮肟、二苯甲酮氯(α,α’_二氯二苯基甲烷)及其類似 106147.doc -58- 1295382 物。在此等化合物中具有二苯甲酮主鏈之化合物為較佳, 且更佳該化合物為2,2,_二羥基_4,4,_二甲氧二苯甲酮與 2’2,4,4 -四羥基二苯甲酮中之任何一種。藉由使用此一基 於二苯甲酮之化合物,顯著地顯現出如上所述之效果。 此外至於基於苯幷三峻之化合物,可利用的有··具有 笨幷三唑主鏈之化合物、其互變異構體或此等誘導物(例 如,加成反應產物、取代反應產物、還原反應產物、氧化 反應產物及其類似物)。 至於此等化合物,可提及的有(例如)苯幷三唑、2·(2-羥 基-5-甲基苯)-2Η_苯幷三唑、2_(2-羥基·‘辛氧苯基)_2η_苯 幷三唑及其類似物。在此等化合物中具有苯幷三唑主鏈之 化合物為較佳,且更佳該化合物為2-(2-羥基-5-甲基苯)_2Η_ 本幷二唑與2-(2-羥基-4-辛氧苯基)-2Η-苯幷三唑中之任何 種。藉由使用此-基於苯幷三嗤之化合物,顯著地顯現 出如上所述之效果。 在著色液體含有基於二苯甲酮之化合物及基於苯幷三唑 之化合物的情形中,基於二苯甲g同之化合物及基於苯幷三 唑之化合物在著色液體中的總含量百分比並非特定受限。 較佳基於二苯甲酮之化合物及基於苯幷三唑之化合物在著 色液體中的總含量百分比在〇〇〇1至1〇〇重量百分比之範圍 中。更佳其在0.005至5·〇重量百分比之範圍中,且進一步更 佳其在G.G1至3.G重量百分比之㈣中。在將基於二苯甲酉同 之化口物及基於苯幷三唾之化合物總含量百分比約束在上 述範圍内的情形中,有可能容易且無誤地形成合適的著色 106147.doc -59- 1295382 部22,同時更有效防止產生對於其上待形成著色㈣之主 基板2的有害影響(諸如主基板2之組成材料變質)。 此外,在著色液體含有基於二苯甲嗣之化合物及/或基於 苯幷三唾之化合物,且將基於二苯甲啊之化合物在著色液 體中之含篁百分比定義為X(重量百分比)且將基於二苯甲 酮之化合物及基於苯幷三唾之化合物在著色液 量百分比定義為Y(重量百分比)的产带由, ^ 、里曰刀比)的情形中,則較佳X與γ滿 足關係式:〇·〇〇m/γ q。更佳轉Y滿足關係式·· 0.05 S X/YS i _,且進—步更佳球γ滿足關係式·· 〇 ^ X/YS 5 00。在X與γ滿足上述關係的情形中,藉.由與节醇一 起使用基於二苯甲酮之化合物及/或基於苯幷三唾之化 物更顯著地發揮協同效應。另外,有可 : 高速度形成合適的著色部22,„„效防止產㈣^ 上待形成著色部22之主基板2的有害影響(諸 2:The coloring liquid is not limited, and in the present embodiment, the coloring liquid is a coloring liquid containing a coloring agent and a glycol. The present inventors have found that it is possible to carry out the coloring of the main substrate easily and without error by using this - coloring liquid. Specifically, according to the present process, it is possible to easily and unambiguously subject the main substrate 2 formed of a material such as a propylene-based resin to a coloring process which is difficult to color in a conventional coloring method. It is considered that the benzyl alcohol in the coloring liquid penetrates deeply into the main substrate 2 and diffuses therein, because the following original ▲ is used as the coloring liquid containing benzyl alcohol, thereby bonding the molecules constituting the main substrate 2 (The bond between the molecules) is loosened and the space in which the colorant will penetrate is fixed. The (4) and the coloring agent are replaced in the colored liquid, whereby the coloring agent is held in the work room (the seat (coloring seat) which can be compared to the coloring agent), and therefore, the surface of the main substrate 2 is colored. Further, by using the coloring liquid as described in ±, it is possible to form the coloring portion 22 having a uniform thickness easily and without iron. In detail, even if the main substrate to be colored (ie, working) is a main substrate in which a minute structure such as a microlens is provided on the surface thereof (one in which the unevenness of the two-dimensional direction of the surface thereof is smaller) The main substrate), or the main substrate in which the area to be colored is a large area, it is also possible to form the 106147.doc -55-1295382 colored portion 22 with a uniform thickness (i.e., no color unevenness). As for the method of supplying the coloring liquid on the light incident surface of the main substrate 2, there may be mentioned various coating methods such as, for example, a doctor blade method, a square coating method, a photo coating method, a spray coating, and the like. Electrostatic coating, electroplating coating, printing, roll coater and an impregnation coating method in which the main substrate 2 is immersed (soaked) in a colored liquid and the like. The impregnation method (in particular, impregnation dyeing) is suitable in these methods. This makes it possible to form the coloring portion 22) having the uniform thickness of the coloring portion just as easily and without error. Further, in detail, in the case where the colored liquid is supplied onto the main substrate 2 by means of 2-impregnation dyeing, it is possible to easily and unambiguously color the main substrate 2 formed of a material such as an acrylic-based resin, and this main substrate 2 It is difficult to color in a conventional coloring method. This is because the dye which can be used for the impregnation dyeing has a high affinity for the g group (g-bond) which the acrylic acid-based resin and the like have. The rutting κ applies a coloring liquid supply step while heating the colored liquid and/or the main plate in the range of 6 G ° C to 1 GG ° C. This makes it possible to effectively form the colored enamel 22, as well as sufficiently preventing the harmful influence on the main substrate 2 on which the coloring portion 22 is formed (for example, the constituent material of the main substrate 2 is deteriorated). In addition, the coloring liquid supply step can be applied while increasing the environmental pressure (should be pressure). This makes it possible to accelerate the penetration of the coloring liquid into the main substrate 2, and it is possible to effectively form the coloring portion 22 in a short time. In this respect, if necessary (for example, in the thickness phase of the colored portion 22 to be formed, in the iterative shape of the sub-layer), the coloring liquid supply step can be carried out repeatedly (i.e., multiple times). In addition, if necessary, after the supply of the coloring liquid, the main substrate 2, the heat treatment such as heating, cooling and the like, and the light irradiation 106147.doc -56-1295382 may be applied, and the pressure or pressure of the air pressure may be reduced. Pressure or similar steps. This makes it possible to accelerate the fixation (stability) of the colored portion 22. Hereinafter, the coloring liquid used in this step will be described in detail. The percentage of benzyl alcohol in the coloring liquid is not particularly limited. The percentage of the preferred alcohol content is in the range of 0.01 to 10.0% by weight. More preferably it is in the range of 0.05 to 8.0% by weight, and further more preferably it is in the range of 〇1 to 5.0% by weight. In the case where the content percentage of benzyl alcohol is confined within the above range, it is possible to form a suitable coloring portion 22 easily and without fail, while more effectively preventing generation of a detrimental effect on the main substrate 2 on which the coloring portion 22 is formed (such as The constituent materials of the main substrate 2 are deteriorated). Although the coloring agent contained in the color liquid may be any coloring agent such as various dyes and various pigments, it is preferred that the coloring agent be a dye. More preferably, it is a disperse dye and/or a cationic dye, and further preferably it is a dispersed dye. This makes it possible to effectively form the coloring portion 22 while sufficiently preventing the harmful influence on the main substrate 2 on which the coloring portion 22 is formed (e.g., the constituent material of the main substrate 2 is deteriorated). In particular, it is possible to easily and without error coloring even the main substrate 2 formed of a material such as an acrylic-based resin, which is difficult to color in a conventional coloring method. This is because the coloring agent as described above uses an ester group (ester bond) possessed by an acrylic resin and the like as a coloring seat, so that the material is easily colored. As described above, although the coloring liquid used in the present embodiment contains at least a coloring agent and benzyl alcohol, it is preferred that the coloring liquid further contains a compound selected from the group consisting of a benzophenone-based compound and a benzotriazole-based compound and a section. Alcohol = one less compound. This makes it possible to form the coloring portion 22 more effectively, while 106147.doc • 57·1295382 sufficiently prevents the harmful effects on the main substrate 2 on which the coloring portion 22 is to be formed (for example, the main 4πτ. The composition of the soil board 2 is deteriorated). This is considered to be due to the following reasons. That is, by using at least one compound containing a sterol and a compound selected from the group consisting of a benzophenone-based compound and a benzoquinone-based compound (hereinafter, benzyl alcohol, a diphenyl-based compound, and a benzotriazole-based compound) The compound is generally referred to as a coloring liquid of "J, plus d, in which the additives penetrate into and diffuse in the main substrate 2, thereby bonding the molecules constituting the main substrate 2 (between molecules) The bond) is loosened, and the colorant is fixed in place of the colorant and the additive, thereby holding the colorant in the space (which can be compared to the seat of the coloring d (colored seat)), and Therefore, the surface of the main substrate 2 is colored. It is considered that this is because, by using together with benzyl alcohol, at least one compound selected from the group consisting of a benzophenone-based compound and a benzotriazole-based compound interacts in a complementary manner, and the colored liquid becomes more colored. it is good. As the benzophenone-based compound, a compound having a benzophenone main chain, a tautomer thereof or such an inducer (for example, an addition reaction product, a substitution reaction product, a reduction reaction product, or the like) may be used. Oxidation reaction products and their analogs). As the compound of 4, there may be mentioned, for example, benzophenone, 2,4-di-di-benzoicone, 2-hydroxy-4-methoxybenzophenone, 2,2,-dihydroxyl _4,4,-Dimethoxybenzophenone, tetrahydroxybenzophenone, 2-hydroxy-4-inocyl-methanone, 4-benzyloxy-2-perbenzyl-benzophenone-, two Benzophenone aniline, benzophenone oxime, benzophenone chloride (α,α'-dichlorodiphenylmethane) and the like 106147.doc -58-1295382. A compound having a benzophenone backbone in such compounds is preferred, and more preferably the compound is 2,2,-dihydroxy-4,4,4-dimethoxybenzophenone and 2'2,4 , any of 4-tetrahydroxybenzophenone. By using this compound based on benzophenone, the effects as described above are remarkably exhibited. In addition, as for the compound based on benzoquinone, there are compounds having a clumole triazole backbone, tautomers thereof or such inducers (for example, addition reaction products, substitution reaction products, reduction reactions) Product, oxidation reaction product and the like). As such compounds, there may be mentioned, for example, benzotriazole, 2·(2-hydroxy-5-methylphenyl)-2Η-benzotriazole, 2-(2-hydroxy-'octyloxyphenyl) _2η_benzotriazole and its analogs. A compound having a benzotriazole main chain among these compounds is preferred, and more preferably the compound is 2-(2-hydroxy-5-methylphenyl)_2Η_benzolazole and 2-(2-hydroxy-) Any of 4-oxooxyphenyl)-2Η-benzotriazole. By using this - a benzoquinone-based compound, the effects as described above are remarkably exhibited. In the case where the coloring liquid contains a benzophenone-based compound and a benzotriazole-based compound, the percentage of the total content of the compound based on the benzotriazole and the benzotriazole-based compound in the coloring liquid is not specifically affected. limit. Preferably, the percentage of the total content of the benzophenone-based compound and the benzotriazole-based compound in the colored liquid is in the range of from 1 to 1% by weight. More preferably, it is in the range of 0.005 to 5% by weight, and further preferably it is in the weight percentage of G.G1 to 3.G (IV). In the case where the percentage of the total content of the benzophenone-based compound and the benzoquinone-based compound is within the above range, it is possible to form a suitable coloring 106147.doc -59- 1295382 easily and without error. At the same time, it is more effective to prevent the occurrence of detrimental effects on the main substrate 2 on which the coloring (4) is to be formed (such as deterioration of constituent materials of the main substrate 2). Further, the coloring liquid contains a benzamidine-based compound and/or a benzoquinone-based compound, and the percentage of cerium-containing compound in the coloring liquid is defined as X (weight percentage) and will be based on The compound of benzophenone and the compound based on benzoquinone trisal are preferably in the case where the percentage of the coloring liquid is defined as Y (weight percent), and the ratio of X and γ is satisfied. Formula: 〇·〇〇m/γ q. Better Y turns to satisfy the relationship ·· 0.05 S X/YS i _, and the better step γ satisfies the relationship · ^ X/YS 5 00. In the case where X and γ satisfy the above relationship, synergistic effects are exerted more significantly by using a benzophenone-based compound and/or a benzoquinone-based compound together with the alcohol. In addition, it is possible to: form a suitable coloring portion 22 at a high speed, and prevent the harmful effects of the main substrate 2 on which the coloring portion 22 is to be formed (2:
組成材料變質)。 A I 此外,較佳該著色液體進-步含有切及界面活性劑。 此使得有可能甚至在存在㈣之條件下穩定 著色劑。即使其上待供給著色液體之主基板2由諸如美= 州成,而此主基板2很難在一習知方 者色’亦有可能容易且無誤地著色主基板2。至於界: t可提子界面活性劑、陰離子界面活性 1%離子界面活性劍、而卜斗w m ㊃敎其類㈣。至㈣ …… (例如)基於轉之界面活性劑、 基於,之界面活性劑、基她旨之界面活性劑、基於:之 106147.doc -60· 1295382The constituent materials are deteriorated). A I Further, it is preferred that the coloring liquid further comprises a cleavage and a surfactant. This makes it possible to stabilize the colorant even in the presence of (4). Even if the main substrate 2 on which the colored liquid is to be supplied is made of, for example, melamine, and the main substrate 2 is difficult to be colored in a conventional manner, it is possible to color the main substrate 2 easily and without fail. As for the boundary: t extractable surfactant, anionic interfacial activity 1% ion interface activity sword, and Budou w m Siqi (4). To (iv) ...... (for example) based on a trans-active surfactant, based on a surfactant, a surfactant based on a surfactant, based on: 106147.doc -60· 1295382
界面活性劑及其類似物。更具體言之,可提及的有:聚乙 稀醇叛甲基纖維素、聚乙二醇、丙晞酸I旨、甲基丙烯酸 酉曰及其類似物。此外,至於陰離子界面活性劑,可提及的 有(例如)各種松香、各種羧酸鹽、各種硫酸酯、各種磺酸鹽、 各種碟酸鹽及其類似物。更具體言之,可提及的有:松香 膠、聚合松香、歧化松香、順丁烯二酸松香、反丁烯二酸 松香、順丁烯二酸松香戊酯、順丁烯二酸松香甘油§旨、三 硬酯酸鹽(諸如鋁鹽之金屬鹽)、二硬酯酸鹽(諸如鋁鹽、鋇 鹽之金屬鹽)、硬酯酸鹽(諸如鈣鹽、鉛鹽、鋅鉛鹽之金屬 鹽)、亞麻酸鹽(諸如鈷鹽、猛鹽、鉛鹽、鋅鹽之金屬鹽)、 辛酸鹽(諸如鋁鹽、鈣鹽、鈷鹽之金屬鹽)、油酸鹽(諸如鈣 鹽、鈷鹽之金屬鹽)、棕橺酸鹽(諸如鋅鹽之金屬鹽)、環烷 酸鹽(諸如鈣鹽、鈷鹽、錳鹽、鉛鹽、鋅鹽之金屬鹽)、樹脂 酸鹽(諸如鈣鹽、鈷鹽、錳鹽、辞鹽之金屬鹽)、聚丙烯酸鹽 (堵士納鹽之金屬鹽)、聚甲基丙稀酸鹽(諸如納鹽之金屬 孤)、+順丁烯二酸鹽(諸如納鹽之金屬鹽)、丙烯酸_順丁烯 一酸鹽共聚物(諸如鈉鹽之金屬鹽)、纖維素、十二烷基苯磺 酸鹽(諸如鈉鹽之金屬鹽)、烷基磺酸鹽、聚苯乙烯磺酸鹽(諸 如納鹽之金屬鹽)、烷二苯基醚二磺酸鹽(諸如鈉鹽之金屬 鹽)及其類似物。此外,至於陽離子界面活性劑,可提及的 有(例如)諸如一級銨鹽、二級銨鹽、三級銨鹽、四級銨鹽之 各種銨鹽。更具體言之,可提及的有:單烷基胺鹽、二烷 基胺鹽、三烧基胺鹽、四烷基胺鹽、苄甲烴銨鹽、烷基吡 唆鹽、味嗤鑌鹽及其類似物。此外,至於兩性界面活性劑, 106147.doc -61 - 1295382 可提及的有(例如)諸如羧基甜菜鹼、磺基甜菜鹼之各種甜菜 鹼、各種胺基羧酸、各種磷酸鹽酯及其類似物。 在下文中,將描述使用上述穿透型屏幕之背投式投影機。 圖8為一示意性地展示一應用本發明之穿透型屏幕ι〇的 月投式投影機300之組態的圖。如在圖8中所展示,背投式 投影機300具有一結構,其中一投影光學單元31〇、一光導 引鏡320及一穿透型屏幕1〇排列於一外殼中。 因為背投式投影機300使用具有卓越的視角特徵及光使 用效率之上述穿透型屏幕10,所以有可能可能獲得具有卓 越對比度之影像。另外,詳言之,因為在本實施例中背投 式投影機300具有上述結構,所以有可能獲得卓越的視角特 徵及光使用效率。 此外,詳言之,因為各具有大體上橢圓形狀之微透鏡21 以犬牙格子方式排列於上述微透鏡基板丨上,所以背投式投 影機3 0 0幾乎不產生諸如波紋之問題。 如上所述,應注意:即使參照在附圖中展示之較佳實施 例已描述了根據本發明之附有凹部之構件6、製造附有凹部 之構件6之方法、附有凸部之構件(微透鏡基板丨)、穿透型屏 幕10及背投式投影機300,本發明亦不僅限於此等實施例。 舉例而言’可以能夠執行相同或相似功能之元件替換組成 微透鏡基板1、穿透型屏幕10及背投式投影機3〇〇之每一元 件(組件)。 此外,在上述實施例中,即使已描述將各具有幾乎等於 樹脂材料23(即,凝固之後之樹脂材料23)之折射率之折射率 106147.doc -62- 1295382 的間隔物20用作間隔物,但在僅僅於复 Μ .. ^ ,、T,又有附有凹部之 筹件6之第一凹部6丨形成的區域(非 用透鏡面積)中排列間 :物的^形中…需要各具有幾乎等於樹脂材料 3(即’凝固之後之樹脂材料23)之折射率之折射率的間隔物 2日〇。此外,在製造微透鏡基板(附有凸部之構件)丨中並不總 是必須利用上述間隔物20。 … 此外,在上述實施例中,即使已描述供給樹脂材料辦 附有凹部之構件6之表面上,但可製造微透鏡基板丨以使得 (例如)供給樹脂材料23於平板U之表面上且接著由附有凹 部之構件6擠壓樹脂材料23。 此外,在上述實施例中,即使已描述在製造附有凹部之 構件6之方法中在初始孔形成步驟中除了形成第一初始孔 81及第二初始孔82之外於基底構件7中形成第一初始凹°部 71,但不需要形成第一初始凹部71。藉由適當地調整第一 初始孔81及第二初始孔82之形成條件(例如,鐳射之能量強 度、鐳射之光束直徑、照射時間或其類似條件),有可能形 成各具一預定形狀之第一初始凹部71,或有可能選擇性地 僅僅形成第一初始孔81及第二初始孔82以使得不形成第一 初始凹部71。 此外,在上述實施例中,即使已描述穿透型屏幕1 〇具備 微透鏡基板(附有凸部之構件}1及菲涅耳透鏡5,但本發明之 穿透型屏幕10不一定必須具備菲涅耳透鏡5。舉例而言,實 務上可僅自本發明之附有凸部之構件(微透鏡基板1}建構穿 透型屏幕10。 106147.doc -63- 1295382 此外’在上述實施例中,即使已描述:在蝕刻製程之方 法中藉由使用密封構件88並移除密封構件88形成其深度相 互不同之第一凹部61及第二凹部62,但形成第一凹部61及 第二凹部62之方法不限於此。舉例而言,藉由使基底構件7 經受蝕刻製程同時塗布可經受一蝕刻製程之薄膜(密封構 件)於第二初始孔82之表面附近且不塗布該薄膜於第一初 始孔81之表面附近,有可能適當地形成其深度互相不同之 第一凹部61及第二凹部62。此外,藉由於對應於第一凹部 61之部分形成各具有相對深的深度之初始凹部7丨且在初始 孔形成製程中不於對應於第二凹部62之部分形成初始凹^ 而不使用上述密封構件88,或藉由於遮罩8中改變第一及第 二初始孔(開口 m及82之每一者之尺寸,有可能適當地形成 其深度互相不同之第一凹部61及第二凹部62。 此外’在上述實施例巾,已描述第二凹部62之密度低於 第一凹部61之密度。然而’只要第二凹部62之每一者之深 度淺於第一凹部61之每一者之深度,則第二凹部62可為2 何-者’且其形狀、尺寸、排列圖案、密度及其類似特徵 並非特定受限。 此外,在上述實施例中,即使已描述在微透鏡基板(附有 凸:之構件”中微透鏡21之每一者及在附有凹部之構件6 中第、凹相之每一者具有—扁平形狀(大體上概圓形)且 /、、犬牙秸子方式排列,但其形狀及/或排列圖案可為任何 形狀及/或排列圖案。舉例而言,其可以隨機方式排列。 此外’在上述實施例中,即使已描述:僅僅由第一凹部 106147.doc -64- 1295382 61組成第一區域67且僅僅由第二凹部62組成第二區域68, 但可存在一其中混合第一凹部61及第二凹部62之區域。 此外,在上述實施例中,即使已描述微透鏡2 1及第一凹 部61之每一者具有其中其垂直長度大於其水平長度之扁平 幵’狀’但微透鏡21之形狀及第一凹部6 1之形狀並非特定受 限。舉例而言,其可為(諸如)大體上圓形、大體上六邊形及 其水平長度大於其垂直長度之扁平形狀中的任何一者。Surfactants and their analogs. More specifically, there may be mentioned: polyethylene glycol demethylated cellulose, polyethylene glycol, propionate, strontium methacrylate and the like. Further, as the anionic surfactant, there may be mentioned, for example, various rosins, various carboxylates, various sulfates, various sulfonates, various disc salts, and the like. More specifically, there may be mentioned: rosin gum, polymerized rosin, disproportionated rosin, maleic acid rosin, fumaric acid rosin, maleic acid rosin amyl ester, maleic acid rosin glycerin §, tristearate (such as metal salts of aluminum salts), distearate (such as aluminum salts, metal salts of barium salts), stearates (such as calcium salts, lead salts, zinc lead salts) a metal salt), a linolenate (such as a cobalt salt, a salt of a salt, a salt of a lead salt, a salt of a zinc salt), an octanoate (such as a metal salt of an aluminum salt, a calcium salt, or a cobalt salt), an oleate (such as a calcium salt, a metal salt of a cobalt salt), a palmitate (such as a metal salt of a zinc salt), a naphthenate (such as a calcium salt, a cobalt salt, a manganese salt, a lead salt, a metal salt of a zinc salt), a resin acid salt (such as Calcium salt, cobalt salt, manganese salt, metal salt of salt, polyacrylate (metal salt of salt), polymethyl acrylate (such as metal salt of nano salt), + cis-butene Acid salt (such as a metal salt of a sodium salt), acrylic acid-maleic acid salt copolymer (such as a metal salt of a sodium salt), cellulose, dodecane a besylate (such as a metal salt of a sodium salt), an alkyl sulfonate, a polystyrene sulfonate (such as a metal salt of a sodium salt), an alkyl diphenyl ether disulfonate (such as a metal salt of a sodium salt) ) and its analogues. Further, as the cationic surfactant, there may be mentioned, for example, various ammonium salts such as a primary ammonium salt, a secondary ammonium salt, a tertiary ammonium salt, and a quaternary ammonium salt. More specifically, mention may be made of monoalkylamine salts, dialkylamine salts, trialkylamine salts, tetraalkylamine salts, benzalkonium salts, alkylpyridinium salts, miso Salt and its analogues. Further, as for the amphoteric surfactant, 106147.doc -61 - 1295382 may, for example, be mentioned, for example, various betaines such as carboxybetaine, sulfobetaine, various aminocarboxylic acids, various phosphate esters and the like. Things. Hereinafter, a rear projection projector using the above-described penetrating screen will be described. Figure 8 is a diagram schematically showing the configuration of a moon-projection projector 300 to which the penetrating screen of the present invention is applied. As shown in Fig. 8, the rear projection type projector 300 has a structure in which a projection optical unit 31, a light guiding mirror 320, and a penetrating screen 1 are arranged in a casing. Since the rear projection type projector 300 uses the above-described penetrating screen 10 having excellent viewing angle characteristics and light use efficiency, it is possible to obtain an image with excellent contrast. Further, in detail, since the rear projection projector 300 has the above configuration in the present embodiment, it is possible to obtain excellent viewing angle characteristics and light use efficiency. Further, in detail, since the microlenses 21 each having a substantially elliptical shape are arranged on the above-mentioned microlens substrate 以 in a dog-tooth lattice manner, the rear projection type projector 300 hardly causes problems such as ripples. As described above, it should be noted that the member with the recessed portion 6, the method of manufacturing the member 6 with the recessed portion, and the member with the convex portion according to the present invention have been described with reference to the preferred embodiment shown in the drawings ( The microlens substrate 、), the transmissive screen 10, and the rear projection projector 300 are not limited to the embodiments. For example, a component that can perform the same or similar functions replaces each of the components (components) constituting the microlens substrate 1, the transmissive screen 10, and the rear projection projector. Further, in the above embodiment, even if spacers 20 each having a refractive index 106147.doc - 62 - 1295382 each having a refractive index almost equal to that of the resin material 23 (i.e., the resin material 23 after solidification) have been described as spacers However, in the area (non-use lens area) formed only by the first recessed portion 6丨 of the retracement .. ^ , , T, and the preparation part 6 with the concave portion, the shape of the object is required... The spacer 2 has a refractive index almost equal to that of the resin material 3 (i.e., the resin material 23 after solidification). Further, it is not always necessary to use the spacer 20 in the manufacture of a microlens substrate (a member to which a convex portion is attached). Further, in the above embodiment, even if the surface of the member 6 to which the resin material is attached with the concave portion has been described, the microlens substrate 丨 can be manufactured such that, for example, the resin material 23 is supplied onto the surface of the flat plate U and then The resin material 23 is pressed by the member 6 to which the recess is attached. Further, in the above embodiment, even in the method of manufacturing the member 6 with the recessed portion, the formation of the first member hole 81 and the second initial hole 82 in the initial hole forming step has been described. An initial concave portion 71, but it is not necessary to form the first initial concave portion 71. By appropriately adjusting the formation conditions of the first initial hole 81 and the second initial hole 82 (for example, the energy intensity of the laser, the beam diameter of the laser, the irradiation time, or the like), it is possible to form each of the predetermined shapes. An initial recess 71, or it is possible to selectively form only the first initial hole 81 and the second initial hole 82 such that the first initial recess 71 is not formed. Further, in the above-described embodiment, even though the transmissive screen 1 已 has been described as being provided with the microlens substrate (the member with the convex portion} 1 and the Fresnel lens 5, the transmissive screen 10 of the present invention does not necessarily have to have Fresnel lens 5. For example, it is practical to construct the transmissive screen 10 only from the member with the convex portion (the microlens substrate 1) of the present invention. 106147.doc -63 - 1295382 Further 'in the above embodiment In the method of the etching process, the first recess 61 and the second recess 62 are formed by using the sealing member 88 and removing the sealing member 88 to form the first recess 61 and the second recess 62 whose depths are different from each other. The method of 62 is not limited thereto. For example, the substrate member 7 is subjected to an etching process while coating a film (sealing member) that can withstand an etching process near the surface of the second initial hole 82 without coating the film on the first In the vicinity of the surface of the initial hole 81, it is possible to appropriately form the first concave portion 61 and the second concave portion 62 whose depths are different from each other. Further, the initial portion having a relatively deep depth is formed by the portion corresponding to the first concave portion 61. The portion 7 is not formed in the initial hole forming process by the portion corresponding to the second recess 62 without using the sealing member 88, or by changing the first and second initial holes in the mask 8 (opening m) For each of the sizes of 82 and 82, it is possible to appropriately form the first recess 61 and the second recess 62 whose depths are different from each other. Further, in the above embodiment, it has been described that the second recess 62 has a lower density than the first recess. The density of 61. However, as long as the depth of each of the second recesses 62 is shallower than the depth of each of the first recesses 61, the second recesses 62 may be two-dimensional' and its shape, size, arrangement pattern Further, in the above embodiment, even in the above-described embodiment, each of the microlenses 21 in the microlens substrate (member with a convex portion) and the member 6 with the concave portion have been described. Each of the middle and concave phases has a flat shape (substantially circular shape) and/or a canine pattern, but the shape and/or arrangement pattern may be any shape and/or arrangement pattern. In other words, it can be arranged in a random manner. 'In the above embodiment, even though it has been described that the first region 67 is composed only of the first recess 106147.doc -64 - 1295382 61 and the second region 68 is composed only of the second recess 62, there may be a first mixed therein Further, in the above embodiment, even though each of the microlens 21 and the first recess 61 has been described as having a flat shape in which the vertical length is greater than its horizontal length, The shape of the microlens 21 and the shape of the first recess 61 are not particularly limited. For example, it may be, for example, a substantially circular shape, a substantially hexagonal shape, and a flat shape having a horizontal length greater than its vertical length. Any one of them.
此外,在上述實施例中,即使已描述對應於第一凹部61 之凸部充當微透鏡2 1,但對應於第一凹部6丨之凸部可充當 諸如雙凸透鏡之任何一者。 此外,在上述實施例中,即使已描述第二區域68提供於 附有凹部之構件6之右及左兩個末端部分附近,但可於附有 凹部之構件6之兩個末端部之至少一個附近提供第二區域 68。舉例而言,第二區域68可提供於附有凹部之構件6之一 個末端部分(例如,在圖2中之右側或左側)中。或者,第二 區域68可提供於附有凹部之構件6之整個邊緣附近。 ' ” ι。调%卩付頁凹部之構件6 及附有凸部之構件(微魏基板υ之每—者為—板形狀構件 即’基板)(包括一片形構件、一薄膜形構件及其類似形狀 ’但时凹部之構件6及时凸部之構件(微透鏡基板 )之母—者之形狀可為任何形狀。舉例而t,附有 構件6可為一滾筒形構件。 槿rt’可使用附有凹部之構件6製造本發明之附有凸部之 構件(微透鏡基板1 ),且太 )且本發明之附有凸部之構件(微透鏡基 106147.doc -65· !295382 板1)不限於借助於上述方法製造的構件。Further, in the above embodiment, even if the convex portion corresponding to the first concave portion 61 has been described as serving as the microlens 2 1, the convex portion corresponding to the first concave portion 6A can function as any one such as a lenticular lens. Further, in the above embodiment, even though it has been described that the second region 68 is provided in the vicinity of the right and left end portions of the member 6 to which the recess is attached, at least one of the two end portions of the member 6 to which the recess is attached may be provided. A second area 68 is provided nearby. For example, the second region 68 can be provided in one of the end portions of the member 6 with the recess (e.g., on the right or left side in Fig. 2). Alternatively, the second region 68 can be provided adjacent the entire edge of the member 6 to which the recess is attached. ' ” 调 调 调 卩 卩 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 凹 构件 凹 构件 构件 构件 凹 构件 构件 构件 凹 构件 凹 凹 凹 凹 凹 构件 构件 构件 构件 构件 构件 构件 构件 凹 构件 凹The shape of the member of the similar shape 'but the member of the recess 6 in time and the member of the convex portion (microlens substrate) may be any shape. For example, t, the attached member 6 may be a roller-shaped member. 槿rt' can be used The member 6 with the concave portion is manufactured to manufacture the member with the convex portion (microlens substrate 1) of the present invention, and is too) and the member with the convex portion of the present invention (microlens base 106147.doc-65·!295382 plate 1 It is not limited to the members manufactured by the above method.
透在上述實施例中,即使已描述附有凸部之構件(微 -基板υ為組成穿透型屏幕10或背投式投影機之構 2=將附有凹部之構件用作製造附有凸部之構件(微透鏡 :板)之模具’但附有凸部之構件(微透鏡基板^及附有凹 :之:件不限於彼等上述之應用,且其可應用至任何用 t舉例而言,可將本發明之附有凸部之構件(微透鏡基板 )應用至光漫射板、黑色矩陣屏幕、投影顯示器(前投影) 之屏幕U投影屏幕)、在投影顯示器(前投影)中之液晶光閥 之組成構件及其類似物。 此外,在上述實施例中’即使已描述在自附有凹部之構 件6釋出附有凸敎構件(微透鏡基板υ之|使用附有凸部 之構件(微透鏡基板υ,但可與附有凸部之構件(微透鏡基板 1)一起使用附有凹部之構件6,即,不用自时凹部之構件 6釋出附有凸部之構件(微透鏡基板1)(詳言之,其可用作諸 如牙透型屏幕1〇或背投式投影機300之光學器件之組件)。 實例 <製造附有凹部之構件、附有凸部之構件及穿透型屏幕> (實例1) 乂下歹]方式製造一具備用於形成微透鏡之複數個凹部的 附有凹部之構件。 首先’製備一 1.2 m(橫向)χ 〇·7 m(縱向)且厚度為4.8 mm 之矩形鈉鈣玻璃基板。 在含有4重量百分比之二氟銨氫及8重量百分比之硫酸的 106147.doc -66- I295382 液體中浸泡該鈉鈣玻璃基板, 程,藉此清洗^ ^ 板%% ό Mm蝕刻製 〃表面。接者以純水進行清洗並以氮⑽氣(用 、私除純水)進行乾燥。 二人^助於賤鍍方法於鈉齊玻璃基板之一個主表面上 二:鉻/氧:匕鉻之層狀結構(即,將由氧化鉻形成之薄膜的層 ^結構層疊於由鉻形成之薄膜的外緣)。即,於_玻璃基 兩個表面上形成用於形成遮軍之薄膜及背面保護薄 膜,:a:交丄土 又所 、一 鉻形成之薄膜及自氧化鉻形成之薄膜建構的 層狀^構製成。在此情形中,鉻層之厚度為G.G2 μιη,而氧 化鉻層之厚度為0.02 μηι。 一 _人,對用於形成遮罩之薄膜實施鐳射加工,以在用於 形成遮罩之薄膜中心部分113 cm X 65的區域内以犬牙 才口子方式排列大量第一初始孔,藉此獲得遮罩。此外,同 夺幵y成大里第二初始孔於其中形成第一初始孔之區域之外 及在鈉鈣玻璃基板縱向方向其兩個末端附近1〇 emx65 em 之兩個區域内。第一初始孔之每一者之平均寬度及平均長 度分別為2·〇 μιη&2·2 μηι。此外,第二初始孔之每一者之平 均寬度及平均長度分別 為 2.0 μπι及 2.2 μιη。 在此方面’在光束直徑3 〇 μιη及在主掃描方向上掃描速 度〇· 1 m/秒的條件下使用YAG鐳射實施鐳射加工。此外,控 制YAG鐳射之能量強度以使得當形成第一初始孔時其為1 mW ;及當形成第二初始孔時其為1 mj。 此外’以第二初始孔向鈉妈玻璃基板縱向方向之末端逐 漸變得稀疏的方式,形成第二初始孔於其中形成第一初始 106147.doc -67- 1295382 孔之區域之外。 。此外此時,各具有深度大約為〇·〇〇5 μιη之凹部及一受 “(或又衫響層)形成於納1弓玻璃基板表面上其中形成第 一初始孔之部分中。 二、# ”有抗蝕性之一密封構件(諸如帶)塗覆於在遮罩 # 一成=初始孔之區域(對應於一第二區域)。具有由聚對 甲酸乙二酯形成之基底及由黏著劑形成之黏著層之黏 者Τ用作該密封構件。 其次’使塗覆背面保護薄膜及密封構件之鈉㈣璃基板 經受一濕式钱刻製程。藉由在濕式钱刻製程之中間自納妈 玻璃基板移除密封構件,曝露第二初始孔且使其與— 劑接觸。 :、 <吏鈉鈣玻璃基板經党-蝕刻製程,藉此形成大量 弟凹部(用於形成微透鏡之凹部)及大量第二凹部於納妈 玻璃基板之主表面上。t自㈣玻璃基板之主表面上方觀 看了/日之每一者之形狀為大體上橢圓形(扁平形), 同:第二凹部之每一者之形狀為大體上圓形。如此形成之 大量第-凹部具有大體上相互相同的形狀。所形成的第一 凹部之母:者在其短轴線方向上的長度(直徑)、所形成的第 一凹部之每一者在其長軸線方向上的長度、所形成的第— 凹部之每一者之曲率半徑及深度分別為54μΐΏ、72μηι、37〇 叫及36.5㈣。此外’在形成第一凹部之可用面積中第一凹 部之密度為260,_個W。此外,如此形成之大量第二凹 部具有大體上相互相同的形狀。所形成的第二凹部之每— 之之直徑及深度分別為47〇_及23 5叫。在形成第二凹 106147.doc -68· 1295382 乂笛:用面積中第-凹部之密度為100,〇〇〇個/cm2。此外, 在第二區域.中第二凹部之陣列數量為7,_。此外,第二凹 :之鄰近陣列之平均間距為1〇〇 _。第二區域在釋出方向 上之長度為50 mm。 在此f面,將含有4重量百分比之二敦氫銨及8重量百分 比之過乳化氫的水溶液用作濕式餘刻製程之钱刻劑,且基 板浸泡時間為2.5小時。 土 其次,藉由使用硝酸鈽銨及過氯酸之混合物實施一蝕刻 製程㈣該遮罩與背面保護薄膜。接著,以純水進行清洗 並以氮(N2)氣(用於移除純水)進行乾燥。 以此方式,獲得如在圖4中所展示之附有凹部之基板,其 中大用於形成微透鏡之量第—凹部以犬牙格子方式排列在 納舞玻璃基板之主表面之一第一區域中,以量第二凹部 排列於鈉鈣玻璃基板之兩個末端附近形成第一凹部之第一 區域外,以使得其向納約玻璃基板之外逐漸變得稀疏。當 自鈉鈣玻璃基板之一個主表面上方觀看時,第一凹部在^ 中形成第-凹部之可用面積(第—區域)中之所占面積㈣ 為100%。此外,當自鈉鈣玻璃基板之一個主表面上方觀看 時’第二凹部在其中形成第二凹部之可用面積(第二區域) 中之所占面積比率為50%。 其次,塗覆脫模劑(GF-6110)於如上所述獲得之其上形成 第一及第二凹部之附有凹部之構件的表面,且在相同表面 側塗覆未聚合(未固化)的基於丙烯酸之樹脂(PMma樹脂 (甲基丙烯酸樹脂))。此時,由基於丙烯酸之樹脂(pmma樹 脂(甲基丙烯酸樹脂))之硬化材料形成的大體球形間隔物 106147.doc -69- 1295382 (各具有20 μιη之直徑)排 # . , . . Π了啕凹邛之構件之大體整個Through the above embodiments, even though the member to which the convex portion is attached has been described (the micro-substrate is composed of the transmissive screen 10 or the rear projection type projector 2), the member with the concave portion is used as the manufacturing convex The member of the member (microlens: plate) is molded but has a member with a convex portion (the microlens substrate ^ and the concave portion: the member is not limited to the above applications, and it can be applied to any example using t In other words, the member with the convex portion (microlens substrate) of the present invention can be applied to a light diffusing plate, a black matrix screen, a screen U projection screen of a projection display (front projection), and in a projection display (front projection). Further, in the above embodiment, even if it has been described that the member 6 attached to the concave portion is released with the convex member (the microlens substrate is used) The member (the microlens substrate υ, but the member 6 with the concave portion may be used together with the member with the convex portion (the microlens substrate 1), that is, the member with the convex portion is not released from the member 6 of the time recess ( Microlens substrate 1) (in detail, it can be used as a tooth-permeable screen The components of the optical device of the curtain 1 or the rear projection projector 300. Example < manufacture of a member with a concave portion, a member with a convex portion, and a penetrating screen> (Example 1) A member having a recessed portion for forming a plurality of recesses of the microlens. First, a rectangular soda lime glass substrate having a 1.2 m (transverse) χ 〇 · 7 m (longitudinal) and a thickness of 4.8 mm is prepared. Soaking the soda lime glass substrate in a liquid weight percentage of difluoroammonium hydrogen and 8 weight percent sulfuric acid 106147.doc-66-I295382, thereby cleaning the surface of the plate by %M όMm etching. Purified with pure water and dried with nitrogen (10) gas (using and privately removing pure water). Two people help the bismuth plating method on one main surface of the sodium silicate glass substrate: chrome/oxygen: chrome layered structure (ie, a layer structure of a film formed of chromium oxide is laminated on the outer edge of a film formed of chromium). That is, a film for forming a mask and a back protective film are formed on both surfaces of the glass substrate: a : exchange of clay, a film of chromium and formation of chromium oxide The film is formed in a layered structure. In this case, the thickness of the chromium layer is G.G2 μιη, and the thickness of the chromium oxide layer is 0.02 μηι. A person who performs laser processing on the film used to form the mask A plurality of first initial holes are arranged in a canine manner in a region of 113 cm X 65 of the central portion of the film for forming the mask, thereby obtaining a mask. Further, the second initial hole is formed in the same direction as the 幵 y Where the region of the first initial hole is formed and in the vicinity of the two ends of the soda lime glass substrate in the vicinity of the two ends, 1 〇emx65 em. The average width and the average length of each of the first initial holes are respectively 2 ·〇ιη&2·2 μηι. Further, each of the second initial holes has an average width and an average length of 2.0 μm and 2.2 μm, respectively. In this respect, laser processing was carried out using YAG laser under the conditions of a beam diameter of 3 〇 μηη and a scanning speed of 〇·1 m/sec in the main scanning direction. Further, the energy intensity of the YAG laser is controlled such that it is 1 mW when the first initial hole is formed; and 1 mj when the second initial hole is formed. Further, the second initial hole is formed outside the region in which the first initial 106147.doc - 67 - 1295382 hole is formed by the second initial hole being gradually thinned toward the end of the longitudinal direction of the mother glass substrate. . In addition, at this time, each of the concave portions having a depth of about 〇·〇〇5 μm and one of the “(or a layer of the sounding layer) are formed on the surface of the nano-bow glass substrate in which the first initial hole is formed. "A corrosion-resistant one of the sealing members (such as a belt) is applied to the area of the mask #一= initial hole (corresponding to a second area). The adhesive member having a substrate formed of polyethylene terephthalate and an adhesive layer formed of an adhesive is used as the sealing member. Next, the sodium (tetra) glass substrate coated with the back protective film and the sealing member is subjected to a wet etching process. The second initial hole is exposed and brought into contact with the agent by removing the sealing member from the nanoma glass substrate in the middle of the wet money engraving process. The <sodium sulphate glass substrate is subjected to a party-etching process, whereby a large number of dimples (recesses for forming microlenses) and a plurality of second recesses are formed on the main surface of the Namu glass substrate. Each of the two surfaces of the (four) glass substrate is substantially elliptical (flat), and the shape of each of the second recesses is substantially circular. The plurality of first-recesses thus formed have substantially the same shape as each other. The mother of the first recess formed: the length (diameter) in the direction of the short axis, the length of each of the formed first recesses in the direction of the long axis thereof, and each of the formed first recesses The radius of curvature and depth of one are 54 μΐΏ, 72 μηι, 37 〇, and 36.5 (4), respectively. Further, the density of the first recess in the usable area in which the first recess is formed is 260, _W. Further, the plurality of second recesses thus formed have substantially the same shape as each other. Each of the second recesses formed has a diameter and a depth of 47 〇 and 23, respectively. In the formation of the second recess 106147.doc -68· 1295382 乂 flute: the density of the first recess in the area is 100, 〇〇〇 / cm 2 . Further, the number of arrays of the second recesses in the second region is 7,_. In addition, the second recess: the average spacing of adjacent arrays is 1 〇〇 _. The length of the second zone in the direction of release is 50 mm. On this side, an aqueous solution containing 4 weight percent of diammonium hydrogenate and 8 weight percent of peracetic hydrogen was used as a money engraving agent for the wet residual process, and the substrate soaking time was 2.5 hours. Soil Next, an etching process (4) of the mask and the back protective film is carried out by using a mixture of cerium ammonium nitrate and perchloric acid. Next, it was washed with pure water and dried with nitrogen (N2) gas (for removing pure water). In this way, a substrate with a recess as shown in FIG. 4 is obtained, wherein the first recess having a large amount for forming the microlens is arranged in a dog-tooth lattice in the first region of one of the main surfaces of the nano-glass substrate. The second recess is arranged in the vicinity of the two ends of the soda lime glass substrate to form a first portion of the first recess such that it gradually becomes sparse outside the nanoglass substrate. When viewed from above one main surface of the soda lime glass substrate, the area (four) occupied by the first recess in the usable area (the first region) forming the first recess is 100%. Further, the ratio of the area occupied by the second recess in the usable area (second region) in which the second recess is formed is 50% when viewed from above one main surface of the soda lime glass substrate. Next, a release agent (GF-6110) is applied to the surface of the member with the concave portion of the first and second recesses formed thereon as described above, and the unpolymerized (uncured) layer is coated on the same surface side. Acrylic based resin (PMma resin (methacrylic resin)). At this time, the substantially spherical spacers 106147.doc-69-1295382 (each having a diameter of 20 μm) formed of a hardening material based on an acrylic resin (pmma resin (methacrylic resin)) are discharged. The whole of the components of the 啕 邛
表面上。此外,以1個/ 2夕丄*, IUOn the surface. Also, take 1 / 2 丄*, IU
Cm之比率排列該等間隔物。 此時,用於當釋出附有Λ立 有凸。卩之構件(固化樹脂材料 助自附有凹部之構件釋出拿Α 再什釋出主基板(附有凸部之 提供於主基板之一個末端上^夂丟同7、 干)之構件 看圖7)。用於協助之構件寬 厪為20 mm。 ( 其次’以由納_玻璃形成的巫 再办烕的千板之主表面擠壓(推)基於 丙烯酸之樹脂。此時,實施此赞 、 貝她此I矛王以使得在附有凹部之The ratio of Cm aligns the spacers. At this time, it is used when the release is attached with a convexity. The member of the crucible (the cured resin material is assisted from the release of the member with the concave portion, and the release of the main substrate (the one provided with the convex portion provided on one end of the main substrate) is shown in the figure. 7). The width of the component used for assistance is 20 mm. (Secondly, the surface of the main body of the Thousand Plates, which was formed by the _ glass, was extruded (pushed) based on acrylic resin. At this time, the praise was made, and the I spear was made so that it was attached with a recess.
件與基於丙烯酸之樹脂之間盔空氣 、 …、巩引入此外,將其表面 塗覆脫模劑(GF-6 110)之平板用作該平板。 接著’藉由加熱附有凹部之構件,固化基於丙稀酸之樹 脂以獲得主基板。所獲得的主基板(即,固化基於丙烯酸之 樹脂)之折射率為150。所獲得之主基板(除了形成微透鏡之 邛刀之外)之厚度為22 μιη。所形成的微透鏡之每一者在其 短軸線方向上的長度(間距)、所形成的微透鏡之每一者在其 長軸線方向上的長度、所形成的微透鏡之每一者之曲率半 徑及深度分別為54叫、72叫、37.5_及37〇_。此外, 微透鏡在形成微透鏡之可用透鏡面積中之所占面積比率為 100%。經固化之基於丙烯酸之樹脂之硬度為宵氏D 5.4。 其次,自主基板移除平板。 /、人將其中添加光屏敝材料(碳黑)之一正類型光聚體 (PC405G:由JSR公司製)借助於滾塗機供給於主基板之光發 射表面上(正對於其上已形成微透鏡之表面的表面)。在光聚 體中光屏蔽材料之含量百分比為20重量百分比。 其次,使主基板經受一 90x30分鐘之預烘製程。 106147.doc -70- 1295382 其次,穿過正對於其上已形成凹部之附有凹部之構件之 表面的表面照射80 mJ/cm2的紫外線作為平行光。因而,由 微透鏡之每-者聚光照射紫外線,且選擇性地曝光在微透 鏡之每一者焦點f附近(在待形成之黑色矩陣厚度方向上之 中心附近)之光聚體。 接者使用含有0.5重量百分比之K〇H水溶液使具備附有 凹部之構件之主基板經受顯影製程40秒。 接著,以純水進行清洗並以N2氣(用於移除純水)進行乾 燥。此外,使主基板經受-20〇tx3〇分鐘之後洪製程。因 而,形成具有分別對應於微透鏡之複數個開口的黑色矩 陣。所形成之黑色矩陣之厚度為5.〇 μηι。 接著以下列方式自附有凹部之構件釋出主基板。 首先’將用於協助釋出主基板之構件自附有凹部之構件 移除’且亦自如此形成之主基板移除該構件。藉由牵拉主 基板之-個末端以彎曲該主基板,該主基板以一預定恒定 速度連續地(沒有中斷)釋出。將該釋出方向設置為第一凹部 :每-者之短軸線方向(即’主基板之縱向)。此時將抗張強 又’疋為8〇g/Cm(寬度),且將釋出逮度設置為20_/秒。 禮:::助於浸潰染色將著色液體塗覆至已自附有凹部之 構件釋出的主基板上。實施此冑 诱h幻.主 “匕裟釭以使得雖然其上形成微 整個表面接觸到著色液體,但其上已形成黑色矩陣 不接觸到著色液體。此外,當供給著色液體至 將主基板及著色液體之溫度調節至⑽ , 在者色液體供給製程中加壓氣壓 ^HM,)(,Futaba San^ 1 π 50 · 2重量份、分散染料(紅 106147.doc 1295382 色)(由Futaba Sangyo製):〇」重量份、分散染料(黃色)(由Between the piece and the acrylic-based resin, the helmet air is introduced, and the plate on which the surface is coated with the release agent (GF-6 110) is used as the plate. Next, the acrylic-based resin is cured to obtain the main substrate by heating the member to which the recess is attached. The obtained main substrate (i.e., cured acrylic-based resin) had a refractive index of 150. The obtained main substrate (except for the trowel forming the microlens) had a thickness of 22 μm. The length (pitch) of each of the formed microlenses in the short axis direction, the length of each of the formed microlenses in the long axis direction thereof, and the curvature of each of the formed microlenses The radius and depth are 54, 72, 37.5 and 37〇, respectively. Further, the ratio of the area occupied by the microlens in the available lens area for forming the microlens is 100%. The cured acrylic based resin has a hardness of 5.4. Second, the autonomous substrate removes the plate. /, a person who added a positive type photopolymer (PC405G: manufactured by JSR Corporation) to which a light-screen material (carbon black) is added, is supplied to the light-emitting surface of the main substrate by means of a roll coater (for which a light-emitting surface has been formed) The surface of the surface of the microlens). The content of the light-shielding material in the photopolymer was 20% by weight. Next, the main substrate was subjected to a 90 x 30 minute pre-bake process. 106147.doc -70- 1295382 Next, ultraviolet rays of 80 mJ/cm 2 were irradiated as parallel light through the surface of the surface on which the concave-attached member on which the concave portion was formed. Thus, ultraviolet rays are irradiated by each of the microlenses, and photopolymers are selectively exposed in the vicinity of the focus f of each of the microlenses (near the center in the thickness direction of the black matrix to be formed). The main substrate having the member with the recessed portion was subjected to a developing process for 40 seconds using a 0.5 wt% aqueous solution of K〇H. Next, it was washed with pure water and dried with N 2 gas (for removing pure water). In addition, the main substrate was subjected to a -20 〇tx3 〇 minute lapse process. Thus, a black matrix having a plurality of openings respectively corresponding to the microlenses is formed. The thickness of the formed black matrix is 5. 〇 μηι. The main substrate is then released from the member to which the recess is attached in the following manner. First, the member for assisting the release of the main substrate is removed from the member to which the recess is attached' and the member is also removed from the main substrate thus formed. The main substrate is bent by pulling one end of the main substrate, and the main substrate is continuously (without interruption) released at a predetermined constant speed. The release direction is set to the first recess: the short axis direction of each (i.e., the longitudinal direction of the main substrate). At this time, the tensile strength was again set to 8 〇g/cm (width), and the release catch was set to 20 _ / sec. Ceremony::: Helps the dip dye to apply the colored liquid to the main substrate that has been released from the member with the recess. Implementing this temptation, the main "匕裟釭" is such that although the entire surface is formed to contact the colored liquid, the black matrix formed thereon does not contact the colored liquid. Further, when the colored liquid is supplied to the main substrate and The temperature of the coloring liquid is adjusted to (10), and the pressure in the liquid supply process is HM, (, Futaba San^ 1 π 50 · 2 parts by weight, disperse dye (red 106147.doc 1295382 color) (manufactured by Futaba Sangyo) ): 〇" parts by weight, disperse dye (yellow) (by
FutabaSangyo製):0,05重量份、苄醇:1〇重量份、界面活 性劑:2重量份及純水:1〇〇〇重量份之混合物作為著色液體。 在主基板在上述條件下接觸著色液體2〇分鐘之後,將主 基板自其中儲存著色液體之槽中取出,且接著洗務及乾 主基板。 藉由以純水清洗主基板並以^氣(用於移除純水)乾燥主 $板’獲得其中已形成著色部之微透鏡基板。如此形成之 著色部之色彩密度為7〇〇/〇。 此外’藉由如上所述使用附有凹部之構件重複地實施相 似製程’製造總計⑽個微透鏡基板。接著使用第—微透鏡 基板及第-百個微透鏡基板製造在圖3中展示之穿透型尸 幕。 开 (實例2至5) 之如之=中所展示藉由改變遮軍(即,用於形成遮罩 一 鐳射束照射料(即,待形叙初始孔之每 日车門芬甘# 者之,木度)、蝕刻劑令的浸泡 時間及其類似條件中之任何一個 右的筮一. 丨口叹夂附有凹部之構件所具 有的弟一凹部之每一者及第二 . m都々姓从 丨 < 母一者的形狀及附有 凹較構件之第一及第二凹部 寸: 上述實例〗中之方式製造附有凹部之構件= 卜犧於 透型屏幕。 镒透鏡基板及穿 (實例6) 於協助自附有 凹部之構件釋 除了不於附有凹部之構件—個末端提供用 凹邛之構件釋出主基板的構件以開始自附有 106147,doc -72- 1295382 凹部 (比較實例1) 除了在製造附有 類似於上述實例!中 板及穿透型屏幕。 凹部之構件中不形成第二凹部之外,以 之方式製造附有凹部之構件、微透鏡基 (比較實例2) 除了不形成著色部之外,以類似 式製造附有凹部之構件、微奸其士心匕車又貝例1中之方 午敛透鏡基板及穿透型屏幕。 (比較實例3) 除了如在表所展示藉由改變鐳射束照射之條件(即, 待形成之初始孔之每一者 ^ 有之开/狀及仞始凹部之每一者之深 度)、餘刻劑中的浸泡時間及其類似條件中之任何一者改變 附有凹部之構件所且古μ # 卜 苒仵所具有的弟-凹部之每-者及第二凹部之 母一者的形狀及附有凹部之構件之第一及第二凹部之排列 圖案之外’以類似於上述實例i中之彼等方式製造附有凹部 之構件、微透鏡基板及穿透型屏幕。 在實例1至6及比較實例⑴中之每一者中,當製造附有 凹部之構件時所使用的遮罩之組態、如此製造的附有凹部 :構二所具有的凹部(第一及第二凹部)之每一者之形狀、第 及第一凹^之排列圖案、如此製造的微透鏡基板所具有 的所製造的微透鏡之每一者的形狀、所製造的微透鏡之排 列圖案及微透鏡基板(主基板)之生產率及其類似方面在表1 中總體展示。 _47.doc -73- 1295382Futaba Sangyo): 0,05 parts by weight, benzyl alcohol: 1 part by weight, interfacial activity agent: 2 parts by weight, and pure water: 1 part by weight of a mixture as a coloring liquid. After the main substrate was contacted with the colored liquid for 2 minutes under the above conditions, the main substrate was taken out from the tank in which the colored liquid was stored, and then the main substrate was washed and dried. The microlens substrate in which the coloring portion has been formed is obtained by washing the main substrate with pure water and drying the main plate by gas (for removing pure water). The colored portion thus formed had a color density of 7 Å/〇. Further, a total of (10) microlens substrates are manufactured by repeatedly performing a similar process using a member with a recess as described above. Next, the penetrating corpse shown in Fig. 3 was fabricated using the first microlens substrate and the hundredth microlens substrate. Open (examples 2 through 5) as shown in the = by changing the cover (ie, used to form a mask-laser beam illumination (ie, the daily gate to be described as the initial hole of the door) , wood degree), immersion time of the etchant and any similar conditions of the right one. 丨 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂From the shape of the 丨 < the parent and the first and second recesses with the concave member: The member with the recess is manufactured in the manner of the above example = 牺 于 透 透 透 。 。 。 镒 镒 镒 镒 镒 镒Example 6) Assisting in the attachment of the member to which the recess is attached is not the member to which the recess is attached - the end providing the member for releasing the main substrate with the member of the recess to start to self-attach the recess 106147, doc - 72 - 1295382 (Comparative Example 1) A member with a concave portion and a microlens base were manufactured in such a manner that a second concave portion was not formed in a member attached to the concave plate and the transmissive screen. (Comparative Example 2 In addition to not forming a coloring part, it is manufactured in a similar manner The components of the ministry, the traitor of the car, the car and the penetrating lens substrate and the penetrating screen. (Comparative Example 3) Except as shown in the table by changing the conditions of laser beam irradiation (ie, Any one of the initial holes to be formed, the depth of each of the opening/shaped and initial recesses, the soaking time in the residual agent, and the like, change the member to which the recess is attached And the shape of each of the younger-concave portion and the second female portion of the second concave portion and the arrangement pattern of the first and second concave portions of the member with the concave portion are similar to the above The member with the recess, the microlens substrate, and the transmissive screen were manufactured in the same manner as in Example i. In each of Examples 1 to 6 and Comparative Example (1), when the member with the recess was fabricated, The configuration of the mask, the recessed portion thus formed, the shape of each of the recesses (first and second recesses) of the second structure, the arrangement pattern of the first and second recesses, and the microlens substrate thus manufactured The shape of each of the manufactured microlenses, which is manufactured Productivity of the lens pattern and arrayed microlens substrate (main substrate) and the like of the general aspect is shown in Table 1. _47.doc -73- 1295382
1嵴 主要基板 生產率 % 甽 微透鏡 南度 Η (μιη) m m ㈣ VO m m vo m cn 長度 l2 (長軸 線) (μπι) CN (N 00 s CN (N CN 長度 Li (短軸 線) (μπι) 芝 s ?; ?; ?; 形狀 ω 00 U m ω m ω u m ω ω CO W ω oo 排列 圖案 U X 00 U ffi U E GO u ffi U U ffi U ffi 第二凹部 密度 d2 (千個 /cm2) τ-Η r—H d o 00 o r-H r-H 1 1 r-H 深度 D (μιη) | 23.5 | Ό (N 1 23.5 | Ό CN 1 23.5 | 1 23·5 1 1 1 50.5 直徑 (μπι) 1 1 H 1-H 第一凹部 密度 di (千個 /cm2) (N 寸 cn m (N r-H CN 00 CN Ό- CN (N VsO (N (N 深度 D (μιη) 1 36.5 1 1 37.5 | 1 47·5 1 1 42·5 1 1 36.5 | 1 36.5 | 1 36.5 | 36.5 長度 l2 (長軸 線) (μπι) (N (N oo § (N CN CN 長度 Li (短軸 線) (μπι) 形狀 w CZ5 u 00 ω m ω m u m pq m ω 00 ω 00 ω m 排列 圖案 U CO U ffi U ffi 00 U ffi ο ffi u ffi U ffi 遮罩 表面側/ 基板側 Cr/CrO Cr/CrO | Cr/CrO | Au/Cr 1 Cr/CrO | 1 Cr/CiO | 1 Cr/CrO | 1 Cr/CrO | Cr/CrO 實例1 實例2 實例3 I實例4 1 實例5 1實例6 I |比較實例1 1 比較實例2 比較實例3 -74- 泠 S 箄 T 韜 Ύ :3S^ST 顴 Y :us s ^ 屮吨狯柃:IS屮傘扣¥ :un 條®^笨 106147.doc 1295382 自表1清晰所見,在本發明中(g卩,實例丨至6),有可能以 鬲生產率製造微透鏡基板。另一方面,在比較實例i至3中, 微透鏡基板之生產率極低。為了詳細解釋此評估,在本發 明中,可容易且無誤地實施自附有凹部之構件釋出主基板 (即,微透鏡基板)。另一方面,在比較實例丨至3中,很難自 附有凹部之構件釋出主基板,且與本發明中的釋出相比較 需要較大的力。 <製造背投式投影機> 使用在上述實例1至6及比較實例丨至3之每一者中製造的 穿透型屏幕製造(組裝)圖8所示之背投式投影機。 、 <附有凹部之構件之耐久性評估> 使用一顯微鏡觀察在上述實例丨至6及比較實例丨至3之每 一者中已製造1GG件微透鏡基板之後(即,在重複實施釋出 主基板100次之後)在其上已形成凹部(即,第一凹部及第二 凹卩)的附有凹部之構件表面。基於下列四個步驟標準評估 在上述實例丨至6及比較實例丨至3之每一者中附有凹部^構 件表面的凹-凸圖案狀態。 A :識別出沒有凹-凸圖案之裂痕。 B •硪別出有極少量凹-凸圖案之裂痕。 C ·識別出輕微的凹_凸圖案之裂痕。 D •識別出顯著的凹-凸圖案之裂痕。 <點ia漏及亮度不均勻之評估> 於在上述實例1至6及比較實例1至3之每一者中的背投式 才又7/機之穿透型屏幕上顯示一樣本影像。*於下列四個; 106147.doc -75· 1295382 •驟標準評估點遺漏及亮度不均勻之產生狀態。 A :識別出沒有點遺漏及亮度不均勻。 B :識別出有極少量點遺漏及亮度不均勻。 C :識別出輕微的點遺漏及亮度不均勻中之至少一者。 D :識別出顯著的點遺漏及亮度不均勻中之至少一者。 <、繞射光、波紋及色彩不均勻之評估> 於在上述實例1至6及比較實例1至3之每一者中的背投式 才又影機之穿透型屏幕上顯示一樣本影像。基於下列四個步 驟^準π平估在顯示的樣本影像中繞射光、波紋及色彩不均 勻之產生狀態。 A :識別出沒有繞射光、波紋及色彩不均勻。 B :識別出有極少量繞射光、波紋及色彩不均勻。 C識別出輕微的繞射光、波紋及色彩不均勻中之至少一 者。 D :識別出顯著的繞射光、波紋及色彩不均勻中之至少一 者。 <對比度之評估〉 相對於上述實例丨至6及比較實例1至3之每一者的背投式 投影機貫施對比度之評估。 將當具有413勒克司(lux)照度之總白色光進入在一暗房 中之背投式投影機中的穿透型屏幕時,白指示之前側亮度 (白骨度)!^\^ (cd/m2)與當在一亮房中完全關閉光源時,黑指 示之前側亮度之漸增量(黑亮度漸增量)L]B (cd/m2)之比 LW/LB計算為對比度(CNT)。在此方面,將相對於在暗房中 106147.doc -76- 1295382 黑指示之亮度的漸增量稱為黑亮度漸增量。此外,在外界 光照度為185勒克司之條件下實施在亮房中的量測,同時在 外界光照度為0.1勒克司之條件下實施在暗房中的量測。 基於下列四個步驟標準評估在實例1至6及比較實例m 之每一者中由LW/LB表示的對比度。 A :由LW/LB表示的對比度為5〇〇或更大。1嵴Main substrate productivity% 甽Microlens south Η(μιη) mm (4) VO mm vo m cn Length l2 (long axis) (μπι) CN (N 00 s CN (N CN Length Li (short axis) (μπι) 芝s ?; ?; ?; shape ω 00 U m ω m ω um ω ω CO W ω oo arrangement pattern UX 00 U ffi UE GO u ffi UU ffi U ffi second recess density d2 (thousands/cm2) τ-Η r—H do 00 o rH rH 1 1 rH Depth D (μιη) | 23.5 | Ό (N 1 23.5 | Ό CN 1 23.5 | 1 23·5 1 1 1 50.5 Diameter (μπι) 1 1 H 1-H First Concave density di (thousands/cm2) (N inch cn m (N rH CN 00 CN Ό- CN (N VsO (N (N depth D (μιη) 1 36.5 1 1 37.5 | 1 47·5 1 1 42·5 1 1 36.5 | 1 36.5 | 1 36.5 | 36.5 Length l2 (long axis) (μπι) (N (N oo § (N CN CN length Li (short axis) (μπι) shape w CZ5 u 00 ω m ω mum pq m ω 00 ω 00 ω m Arrangement pattern U CO U ffi U ffi 00 U ffi ο ffi u ffi U ffi Mask surface side / substrate side Cr/CrO Cr/CrO | Cr/CrO | Au/Cr 1 Cr/CrO | 1 Cr/CiO | 1 Cr/CrO | 1 Cr/CrO | C r/CrO Example 1 Example 2 Example 3 I Example 4 1 Example 5 1 Example 6 I | Comparative Example 1 1 Comparative Example 2 Comparative Example 3 -74- 泠S 箄T 韬Ύ :3S^ST 颧Y :us s ^ 屮Tons of 狯柃: IS屮 Umbrella buckle ¥ : un Articles ® ^ stupid 106147.doc 1295382 As is clear from Table 1, in the present invention (g卩, Example 丨 to 6), it is possible to manufacture a microlens substrate with a helium productivity. On the one hand, in Comparative Examples i to 3, the productivity of the microlens substrate was extremely low. In order to explain this evaluation in detail, in the present invention, the member to which the concave portion is attached can be easily and unambiguously released to release the main substrate (i.e., micro Lens substrate). On the other hand, in Comparative Examples 丨 to 3, it is difficult to release the main substrate from the member to which the concave portion is attached, and a large force is required as compared with the release in the present invention. <Manufacture of Rear Projection Projector> The rear projection projector shown in Fig. 8 was fabricated (assembled) using the transmissive screen manufactured in each of the above-described Examples 1 to 6 and Comparative Examples 丨 to 3. <Evaluation of durability of member with recessed portion> After 1 GG piece of microlens substrate has been manufactured in each of the above Examples 丨 to 6 and Comparative Examples 丨 to 3 using a microscope (i.e., repeated implementation) After the main substrate is ejected 100 times, the surface of the member to which the recessed portion (i.e., the first recess and the second recess) is formed is formed. The concave-convex pattern state in which the surface of the concave member was attached in each of the above Examples 丨 to 6 and Comparative Examples 丨 to 3 was evaluated based on the following four-step criteria. A: A crack without a concave-convex pattern is recognized. B • Screen out cracks with a very small number of concave-convex patterns. C · A crack of a slight concave-convex pattern is recognized. D • Identify cracks in the conspicuous concave-convex pattern. <Evaluation of Point Ia Leakage and Luminance Unevenness> The same image was displayed on the rear projection type 7/machine penetrating screen in each of the above Examples 1 to 6 and Comparative Examples 1 to 3. . *In the following four; 106147.doc -75· 1295382 • The standard evaluation point is missing and the brightness is uneven. A : No missing points and uneven brightness are recognized. B: A very small number of missing points and uneven brightness are recognized. C : At least one of slight dot omission and uneven brightness is recognized. D : At least one of significant dot omission and brightness unevenness is recognized. <Evaluation of diffracted light, corrugation, and color unevenness> The same is displayed on the penetrating screen of the rear projection type in each of the above-described Examples 1 to 6 and Comparative Examples 1 to 3. image. The resulting state of diffracted light, ripple, and color unevenness in the displayed sample image is estimated based on the following four steps. A: No diffracted light, ripples, and uneven color are recognized. B: A small amount of diffracted light, ripples, and uneven color are recognized. C recognizes at least one of slight diffracted light, ripple, and color unevenness. D : At least one of significant diffracted light, ripple, and color unevenness is recognized. <Evaluation of Contrast> Evaluation of the contrast of the rear projection projector with respect to each of the above Examples 丨 to 6 and Comparative Examples 1 to 3. When the total white light having illuminance of 413 lux enters the penetrating screen in a rear projection projector in a dark room, white indicates the brightness of the front side (white bone)! ^\^ (cd/m2 When the light source is completely turned off in a bright room, black indicates that the ratio of the front side luminance (increase in black luminance) L]B (cd/m2) LW/LB is calculated as contrast (CNT). In this regard, the incremental increase in brightness relative to the black indication 106147.doc -76 - 1295382 in the darkroom is referred to as the black luminance incremental. Further, the measurement in the bright room was carried out under the condition that the external illuminance was 185 lux, and the measurement in the dark room was carried out under the condition that the external illuminance was 0.1 lux. The contrast represented by LW/LB in each of Examples 1 to 6 and Comparative Example m was evaluated based on the following four step criteria. A : The contrast represented by LW/LB is 5 〇〇 or more.
B C D 由LW/LB表示的對比度在4〇〇至5〇〇之範圍中。 由LW/LB表示的對比度在30〇至4〇〇之範圍中。B C D The contrast represented by LW/LB is in the range of 4 〇〇 to 5 。. The contrast represented by LW/LB is in the range of 30 〇 to 4 。.
由LW/LB表示的對比度為3〇〇或更小。 <視角之量測 顯示一樣本影像於實例1至6及比較實例1至3之每一者之 背投式投影機中之穿透型屏幕上,同時實施在水平及垂直 方向上之視角之量測。在使用測角光度計每隔一度實施量 測的條件下實施視角之量測。視角量測的此等結果在表2 中總體展示。The contrast represented by LW/LB is 3 〇〇 or less. <Measurement of the viewing angle shows the same image on the penetrating screen in the rear projection projector of each of Examples 1 to 6 and Comparative Examples 1 to 3, while performing the viewing angles in the horizontal and vertical directions Measure. The measurement of the viewing angle is carried out under the condition that the measurement is performed every other time using a goniophotometer. These results of the viewing angle measurements are generally shown in Table 2.
106147.doc -77- 1295382106147.doc -77- 1295382
CN< 視角(°)半值 |水平方向| m (N (Ν CN CN (N (N (N CN 00 00 〇 CN 00 1—H 垂直方向 CN (N 00 00 VO 00 Ό 00 對比度 < < < < < < < < < PQ < PQ < U Ο Q U Q 色彩不均勻及類似特徵 < < < < 0Q CQ < < PQ 0Q CQ PQ PQ U < U U Q 點遺漏及類似特徵 < < < < PQ < < PQ PQ < < U Q U CQ 〇 學 r-H 11〇〇個 | 學 T—Η 11〇〇個 | 辱 1—Η 11〇〇個 | 舉 τ~Η 11〇〇個 | 辱 r-H | mm] 罕 r-H | loo個 1 學 1—*4 | loo個 | 學 τ-Η 丨1〇〇個| 學 11〇〇個 | 附有凹部之構件之耐用性 < < < < pq PQ Q Q Q 實例1 實例2 實例3 實例4 實例5 實例6 比較實例1 比較實例2 比較實例3 106147.doc -78- 1295382 自表2清晰所見’在根據本發明甚至在重複實施製造附有 凸部之構件(微透鏡基板)(即’主基板之釋出)之後,在附有 凹部之構件中識別出沒有凹·凸圖案之裂痕。此外,根據本 發明獲得具有卓越影像品質而沒有點遺漏、光亮不均勾、 繞射光、波紋、色彩不均勾及其類似特徵之影像。此外, 在根據本發明之實例中之每一者之背投式投影機具有 卓越對比度及卓越視角特徵。換言之,可於本發明之背投 式投影機之每一者上穩定地顯示卓越影像。詳言之,甚至 =備在重複使用附有凹部之構件之後製造的微透鏡基板的 穿透型屏幕及背投式投影機中獲得卓越的結果。 另一方面,在比較實例丨至3之每一者中,在已重複用於 製造微透鏡基板(釋出主基板)之附有凹部之構件中識別出 凹-凸圖案之某些裂痕。此外,在使用所獲得的主基板(微透 鏡基板)所製造的穿透型屏幕及背投式投影機中亦不能獲 得足夠、…果。還、為此係因為:藉由在附有凹部之構件中產 生諸如裂痕之凹-凸圖案缺陷,不可能在所製造之微透鏡基 中开成具有所要形狀之微透鏡,或當自附有凹部之構件 釋出主基板時在微透鏡基板之某些微透鏡中產生諸如裂痕 之凹-凸圖案缺陷。 【圖式簡單說明】 圖1為縱向橫截面圖,其示意性地展示在一根據本發明 之車乂佳實施例中的一微透鏡基板(附有凸部之構件)。 ®2為在圖1中所展示之微透鏡基板的平面圖。 圖3為縱向橫截面圖,其示意性地展示在一根據本發明 106147.doc Ϊ295382 之車父佳實施例中具備在圖1中所展示之微透鏡基板的一穿 透型屏幕。 圖4為一平面圖,其示意性地展示在本發明之一實施例中 一附有凹部之構件。 圖5A及5B分別為在圖4中所展示之附有凹部之構件的一 部分放大圖及一縱向橫截面圖。 圖6A-F為一縱向橫截面圖,其示意性地展示製造 及圖5中所展示之附有凹部之構件的方法。 圖7A-I為一縱向橫截面圖,其示意性地展示—製 中所展示之透鏡基板(微透鏡基板)之方法的—個實例。回1 圖8為不思性地展示^ 一靡用太义cm τ應、用本發明 < 穿透型屏幕 式投影機之組態的圖。 月才又 【主要元件符號說明】 1 2 3 5 6 7 8 10 11 20 21 微透鏡基板(附有凸部之構件) 主基板 黑色矩陣 菲淫耳透鏡 附有凹部之構件 基底構件 遮罩 穿透型屏幕 平板 間隔物 微透鏡(凸部) 106147.doc -80 · 1295382 22 著色部 2 3 樹脂材料 25 第一行第一凹部 26 第二行第一凹部 31 開口 32 正類型光聚體 61 第一凹部 62 第二凹部CN< angle of view (°) half value | horizontal direction | m (N (N (N (N CN 00 00 〇 CN 00 1 - H vertical direction CN (N 00 00 VO 00 Ό 00 contrast <<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<<>> UUQ point omissions and similar features <<<<< PQ << PQ PQ << UQU CQ 〇学 rH 11〇〇 | Learn T_Η 11〇〇一 | 辱一Η11 〇〇个| ττ~Η 11〇〇一 | 辱 rH | mm] 罕rh | loo一1学1—*4 | loo个| Learn τ-Η 〇〇1〇〇一| Learn 11〇〇 | Attach Durability of components with recesses <<<< pq PQ QQQ Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Comparative Example 1 Comparative Example 2 Comparative Example 3 106147.doc -78- 1295382 Clear from Table 2 It is seen that after the member (microlens substrate) with the convex portion (i.e., the release of the main substrate) is repeatedly manufactured according to the present invention, no concave/convex pattern is recognized in the member with the concave portion. In addition, according to the present invention, images having excellent image quality without dot omission, uneven brightness, diffracted light, ripples, color unevenness, and the like are obtained. Further, in each of the examples according to the present invention One of the rear projection projectors has excellent contrast and excellent viewing angle characteristics. In other words, excellent images can be stably displayed on each of the rear projection projectors of the present invention. In detail, even = ready for repeated use Excellent results were obtained in a transmissive screen and a rear projection projector of a microlens substrate manufactured after a member having a recess. On the other hand, in each of Comparative Examples 丨 to 3, it has been repeatedly used for manufacturing micro Some cracks of the concave-convex pattern are recognized in the member with the concave portion of the lens substrate (release main substrate). Further, the penetrating screen and the rear projection manufactured using the obtained main substrate (microlens substrate) are used. It is also impossible to obtain sufficient results in the projector. Also, this is because it is impossible to manufacture the concave-convex pattern defects such as cracks in the member with the concave portion. Opening the lens group to have a desired shape of the microlens, or when the member from the recess with the recess to release the main substrate, such as a crack is generated in some of the microlens of the microlens substrate - convex pattern defects. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal cross-sectional view schematically showing a microlens substrate (a member with a convex portion) in a preferred embodiment of the rim according to the present invention. ® 2 is a plan view of the microlens substrate shown in FIG. Figure 3 is a longitudinal cross-sectional view schematically showing a through-type screen provided with the microlens substrate shown in Figure 1 in a preferred embodiment of the vehicle according to the invention 106147.doc 295382. Fig. 4 is a plan view schematically showing a member to which a recess is attached in an embodiment of the present invention. 5A and 5B are a partial enlarged view and a longitudinal cross-sectional view, respectively, of the member with a recess shown in Fig. 4. Figures 6A-F are longitudinal cross-sectional views that schematically illustrate a method of making and incorporating the recessed member shown in Figure 5. 7A-I are longitudinal cross-sectional views schematically showing an example of a method of producing a lens substrate (microlens substrate). Back to Fig. 8 is a diagram showing the configuration of the < penetrating screen projector using the present invention in a non-conceivable manner. Month only [Main component symbol description] 1 2 3 5 6 7 8 10 11 20 21 Microlens substrate (member with protrusion) Main substrate Black matrix Philippine lens Attached to the member of the base member Mask penetration Type screen plate spacer microlens (convex) 106147.doc -80 · 1295382 22 Colored portion 2 3 Resin material 25 First row First recess 26 Second row First recess 31 Opening 32 Positive type photopolymer 61 First Concave portion 62 second recess
67 第一區域 68 第二區域 69 可移除構件 71 第一初始凹部 72 第二初始凹部 81 第一初始孔 82 第二初始孔 85 用於形成遮罩之薄膜 88 密封構件 89 背面保護薄膜 300 背投式投影機 310 投影光學單元 320 光導引鏡 340 外殼 106147.doc -81 -67 First region 68 Second region 69 Removable member 71 First initial recess 72 Second initial recess 81 First initial hole 82 Second initial hole 85 Film for forming a mask 88 Sealing member 89 Back protective film 300 Back Projection projector 310 projection optical unit 320 light guiding mirror 340 housing 106147.doc -81 -
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004319834A JP2006133334A (en) | 2004-11-02 | 2004-11-02 | Concave member, manufacturing method of convex member, convex member, transmissive screen, and rear projector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200632380A TW200632380A (en) | 2006-09-16 |
| TWI295382B true TWI295382B (en) | 2008-04-01 |
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ID=36567116
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| Application Number | Title | Priority Date | Filing Date |
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| TW094138479A TWI295382B (en) | 2004-11-02 | 2005-11-02 | A member with concave portions, a method of manufacturing a member with convex portions, a transmission screen, and a rear projection |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20060114558A1 (en) |
| JP (1) | JP2006133334A (en) |
| KR (1) | KR100670988B1 (en) |
| CN (1) | CN1804717A (en) |
| TW (1) | TWI295382B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4114656B2 (en) * | 2004-10-20 | 2008-07-09 | セイコーエプソン株式会社 | Lens substrate, lens substrate manufacturing method, transmissive screen, and rear projector |
| US20070092809A1 (en) * | 2005-10-21 | 2007-04-26 | Eastman Kodak Company | Fabrication of rear projection surface using reversal emulsion |
| US7802978B2 (en) * | 2006-04-03 | 2010-09-28 | Molecular Imprints, Inc. | Imprinting of partial fields at the edge of the wafer |
| US7547398B2 (en) * | 2006-04-18 | 2009-06-16 | Molecular Imprints, Inc. | Self-aligned process for fabricating imprint templates containing variously etched features |
| US8012395B2 (en) | 2006-04-18 | 2011-09-06 | Molecular Imprints, Inc. | Template having alignment marks formed of contrast material |
| JP2008070556A (en) * | 2006-09-13 | 2008-03-27 | Nitto Denko Corp | Optical member manufacturing method and optical member molding die manufacturing method |
| EP2634630A3 (en) * | 2010-03-08 | 2017-06-14 | Dai Nippon Printing Co., Ltd. | Screens for use as displays of small-sized display devices with touch panel functions, and small-sized display devices with touch panel functions comprising said screens |
| CN202443141U (en) * | 2012-02-23 | 2012-09-19 | 京东方科技集团股份有限公司 | Color filter substrate and 3D display device |
| KR102067160B1 (en) * | 2013-05-31 | 2020-01-16 | 삼성전자주식회사 | Film for improving color sense and method for preparing the same |
-
2004
- 2004-11-02 JP JP2004319834A patent/JP2006133334A/en active Pending
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2005
- 2005-10-31 US US11/262,994 patent/US20060114558A1/en not_active Abandoned
- 2005-11-02 CN CNA2005100488976A patent/CN1804717A/en active Pending
- 2005-11-02 KR KR1020050104473A patent/KR100670988B1/en not_active Expired - Fee Related
- 2005-11-02 TW TW094138479A patent/TWI295382B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100670988B1 (en) | 2007-01-17 |
| JP2006133334A (en) | 2006-05-25 |
| TW200632380A (en) | 2006-09-16 |
| CN1804717A (en) | 2006-07-19 |
| KR20060052419A (en) | 2006-05-19 |
| US20060114558A1 (en) | 2006-06-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |