[go: up one dir, main page]

TWI293512B - Method and package to adjust the lens tilt compensation for an imaging sensor - Google Patents

Method and package to adjust the lens tilt compensation for an imaging sensor Download PDF

Info

Publication number
TWI293512B
TWI293512B TW95109062A TW95109062A TWI293512B TW I293512 B TWI293512 B TW I293512B TW 95109062 A TW95109062 A TW 95109062A TW 95109062 A TW95109062 A TW 95109062A TW I293512 B TWI293512 B TW I293512B
Authority
TW
Taiwan
Prior art keywords
bonding
line
photosensitive wafer
wafer
light
Prior art date
Application number
TW95109062A
Other languages
Chinese (zh)
Other versions
TW200737528A (en
Inventor
Chun Nan Liao
Original Assignee
Foxlink Image Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Foxlink Image Tech Co Ltd filed Critical Foxlink Image Tech Co Ltd
Priority to TW95109062A priority Critical patent/TWI293512B/en
Publication of TW200737528A publication Critical patent/TW200737528A/en
Application granted granted Critical
Publication of TWI293512B publication Critical patent/TWI293512B/en

Links

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Description

T293512 . · ..... . '·· . ' ·'.'· : .... ' V . -. ... - ; , :, ' V', ·': . '二…: 九、發明說明: • 【發明爾屬之枝·領域】 -本發明係涉友一種苛調節感測元件之辑頭偏差的方法及其封 ....... -' . - . - ·- .. . 裝結推,尤其係爵及,辕在感測元截打蘇時調節感爾元件之鏡頭 . ..... .......... .... , : : ...... : 偏差的方法及其封袭結福:。 【先前技術】 • · ······- · . · ·. .· ' · . · ·. ... 广···、·..,· ··..···..····· • ' ·. · · ' . i : 乂, ....... . 广' _,隨著數也湘機等丰導體影徐產品的迅速普表T293512 . . . . . . '·· . ' ·'.'· : .... ' V . -. ... - ; , :, ' V', ·': . 'Two...: Nine , invention description: • [invented branch of the field] - the invention is a method of adjusting the head deviation of the harsh sensing element and its seal ..... -. - - - - .. . The knot is pushed, especially the singer, and the lens that adjusts the sensor element when the sensor is intercepted. ..... .......... .... , : : ...... : The method of deviation and its seal and blessing: [Prior Art] • ·························································································· ··· • ' ·· · · ' . i : 乂, ....... . 广' _, with the number of Xiang Xiang and other Feng conductors Xu products quickly

半導體影像產品内i影像感測芯片封裝結镇的技術亦得着尤快速 薦常,如上辦it之影像感測芯游封裝鯰構包括自下而上佈設 ·:: - ·; " / .; - ' ' .·-;:'·; :.· ':' ' ' . ·.. ' ; - ' 的承觸基板、感光晶片及透光元件與包覆於||等元件外部之側 ...... . V. : : '· : . ' ;· ·'' ' V; ;;: V/.-· ' ·' 壁。其中,感光晶片固 ' .. ....... . .. · ;:·; ^ 光晶片上方,透光元件與承載基板外周邊多間碌過侧參建接,進 而透夫耳件、承載Α板及側壁形成斤容—間包 述感光晶片之上孝巧周緣向外伸出複數雙查屬連感庵編棄翁基 板電性逹接,以將測信號引八承載塞罐免v欠 ’在如上所述之影像感測糾封裝結構的製造中,為1 和_晶㈣互麵^ ^ 角度 誦麵__晶片之間平行或者存有精確的預定辦 ΤΓΓ . 為確保邊光元 ,於上述_的影像感列元#封|__ 1293512 .. . . . Λ.. . ^類的鏡頭和__具有編^ ’ ^侧壁___難雜麯恤财平狀間存有的 咼度在這些多層結構之間的連接面上,需設置不同寬度、 不同厚度、不同材質之連接層,藉由控綱邊連接層之面積、厚 Φ «A- 喊和的解、_面積及連接材質用_用 壁高度之形成過程複雜。 • _匕’如何提供'種可簡便、精確調荀 的封裝結構則咸為秀待解決的課罐。 發明’:内容】'... ^ ; · . :- :>·. ·' . : : :··:· ''' ":'" ·::·"··'" ' ' . ·ν:·:. ;"' '" ·. :. .· , : ,.· · . ·..···:· : · , ·.·‘··.·.:-.··..· ·...:· · · · . ... .:. . ·. 义目.撻供一種可調節感元件之鏡頭偏差的封裝In the semiconductor imaging products, the technology of the i-image sensing chip package is also recommended. The image sensing core package of the above-mentioned image processing system includes bottom-up layout.:: - ·; " / . ; - ' ' .·-::'·; :.· ':' ' ' . ·.. ' ; - ' The contact substrate, the light-sensitive wafer and the light-transmitting element are coated on the outside of the component such as || . . . V. : : '· : . ' ;· ·'' ' V; ;;: V/.-· ' ·' Wall. Among them, the photosensitive wafer is fixed '.....................::; ^ Above the optical wafer, the light-transmitting element and the outer periphery of the carrier substrate are connected to each other, and then the earpiece The bearing raft and the side wall form a jinrong--the sensation of the sensation on the sensation of the photographic surface of the photographic board is exemplified by the singularity of the singularity of the singularity of the singularity of the singularity of the singularity. v owed in the manufacture of the image sensing and correcting package structure as described above, for the 1 and _ crystal (four) mutual surface ^ ^ angle 诵 __ wafer parallel or there is a precise reservation. Yuan, in the above _ image sense column #封|__ 1293512 .. . . . Λ.. . ^ class lens and __ have edited ^ ' sidewall ___ difficult miscellaneous music Some twists on the joint surface between these multi-layer structures, it is necessary to set the connection layer of different widths, different thicknesses and different materials. The area of the connection layer by the control edge, thickness Φ «A- shouting solution, _ The formation of the area and the connection material is complicated by the formation of the wall height. • _匕’ How to provide a simple, precise and tunable package structure that is a recipe for the school. Invention ':Content】'...^ ; · . :- :>·. ·' . : : :··:· ''' ":'"·::·"··'" ' ' . . . . . . . . . . . . . . . . . . . . . -.··..··...:···· . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .

結構,包括:一承載基板,上表面周邊鐵設齡^ 一感光晶片,固感於承載基板上表· 置設置有第,鍵會區,所述第一鍵合_ .· ..... ; . . .... .... ' 舍複笋條金屬連接鱗:透光元件,作為鏡頭的一部分蓋赛於感 .... ·' · ·' . .; V ·..··· :' · . 先晶3上方;參了框辕 -.. .. · · · . ' · · · . ·.·.'. . · · .·.·.·.·· 光晶片及透米元療外部;其特徵在 '' V';.' ... ν· . .· ' '';; · -'ν''·.'' .;·. · ." ·- ': ' ' '· ν'·'·.'" : : .^ -·: . · 線友辦整線’抵第.自感光晶片之第一鍵合區向上凸伸,頂端jj 南上轉所述透光禾秤之于表面抵頂:_整:線自抵頂線芩頂蟑傾杂 •1293512 '. .... ^ . . . ' .- -: / · : , ' ;·, ·. 向下變折,底端並與所轉承载基板之第二鍵合區鍵合。 本發明另一目係藤供—種可調節寒鱗充件之鏡頭偏差的丨方 法,芦方法傣對知參所述的封裝結構之參满偏差進行調節,係包 括如下步驟:彳 a·將感光晶片固於承載基板的土表歡; . :-..· ...... ..... .... * ' r · '* r b·將金屬連接前端鍵合於感光晶片盡表面之第一鍵合區; c·測感光晶片表面的光軸偏差度; ^ d·鮮逸光元件ί各輕所述金屬遠餐_‘抵頂鍊上方,測量透光 元件表面的光轴偏差皮,若透光元件的两與感光 在偏差:而沒有處於預定的相對位置,則取下透光元件,藉由 屬連,線鍵合於承戴基板之第二鍵合區_缔處_ 第二鍵合區之間的金屬連接線的長寒,進而調聲金屬滅觀處 頂線的高度,從而_光元件的表面_ 覆所述透光元件i 感光晶片。^:丨 .. · . :· . ' .. ,明再一_係提供一種可觀|麻 法,該方法亦係對如上所述的封裝結構之_偏差_馨、 包括如下步驟::1 ... - Λ............: :. . . . . : . . .· ... ...... .. ά·將感光晶片固接於承載基板的上表裏A ^3_屬__端鍵合於感光晶片上表面之第一鍵合區; ^293512 錄^ • 兀伴的表面與感縫片的表面存在偏差 置’則取下透光元伴,籍由將金屬連接線鍵合於承載基板之第二 鱗合區而調節處於第',鍵合區與第二鍵· 長4 ’难而調節金屬連接線之抵頂線的審度,從而被透夫羌 表面_感光备片的 e·將框架袒裝寒所破基板上並使該_赛包覆所述透光元件與 _ ::感光:晶片:人: ’ ... '.. . ·. • ; . ...· ._ ... . . - . :·*· ; :··.' . · • ......... -·. . .. ·.;.' ;'· . . · ·. ·-· / - ·. ·.. -上所述,使用本發明可調節感測元件之鏡頭瀹 : 其封裝結構,藉电控制佥屬連接線鍵舍於第二鍵合區鍵g轉的金 , 屬連接於第一及第二鍵合區之間的長虔^調節金屬邊_線崧沒^ 線的高度’從而精確調節透光元件與感光:晶片所在本面之裙的偏 . . . . ..... ....... - . :. V.. 差’進而達成可調節感測元件之鏡頭偏差封裝結構乏簡泰卜精^ . . ...... .-· . . · - .... - ... - * ..... 調節鏡頭搐差之機制。 【實施方式 ' ·.':;' ;.: ; : V.';· "· ; ;:;'; •"•': :·'·^^· :; \:.· 為詳細說明本發明之技術内容、所達滅的目的及功效,以下 茲舉實施例並配合圖式詳予說明。 請參閱第一圖V夺發明可調節感測元件之鏡镇偏差的封裝結 .· · . . ... .........The structure comprises: a carrier substrate, a surface of the upper surface of the iron; a photosensitive wafer, the solid substrate is disposed on the substrate, and the first bonding layer is _.. ..... ; . . . . .. ' 舍 复 笋 金属 金属 金属 金属 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : · : ' · . Above the crystal 3; participate in the frame 辕-.. .. · · · · · · · · · ······································ The exterior of the rice therapy; its characteristics are in ''V';.' ... ν· . . . ' '';; -'ν''·.'' .;·. · ." ·- ': ' ' '· ν'·'·.'" : : .^ -·: . · Line friend to do the whole line 'to the first. The first bonding area of the self-sensing wafer protrudes upward, the top jj south up The light-transmitting weighing scale is on the surface of the top: _ whole: the line is self-supporting the top line, the top is 蟑 蟑 • 1293512 '. .... ^ . . . ' .- -: / · : , ' ;·, · The lower end is folded and bonded to the second bonding zone of the transferred carrier substrate. Another object of the present invention is a method for adjusting the lens deviation of a cold scale filling member, and the method for adjusting the deviation of the package structure described by the known parameter, comprising the following steps: 彳a· sensitizing The wafer is fixed to the soil surface of the carrier substrate; . :-..·........................* 'r · '* rb·The metal connection front end is bonded to the surface of the photosensitive wafer The first bonding area; c·measuring the optical axis deviation of the surface of the photosensitive wafer; ^ d·fresh light element ί lightly the metal far food _'above the top chain, measuring the optical axis deviation of the surface of the light transmitting element If the two of the light-transmitting elements are offset from the light-sensing element: but are not in the predetermined relative position, the light-transmitting element is removed, and the second bonding area of the receiving substrate is bonded by the connection, and the wire is bonded to the second bonding area of the wearing substrate. The long cold of the metal connection line between the second bonding regions, and thus the height of the top line of the sound absorbing metal, so that the surface of the optical element _ covers the light transmitting element i. ^:丨.. . . . . . . . . . , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , .. - Λ............: :. . . . . . . . . . . . . . . . . . In the above table, A ^3_ is __ end bonded to the first bonding area on the upper surface of the photosensitive wafer; ^293512 Recording ^ • The surface of the partner is offset from the surface of the sensing sheet, then the light-transmitting element is removed. By adjusting the metal bonding wire to the second squaring area of the carrier substrate and adjusting the ninth, the bonding area and the second key length 4' are difficult to adjust the grading of the metal connecting line, thereby The surface of the 透 羌 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ; . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . The wire is rotated by the gold of the second bonding zone key g, which is connected to the length of the wire between the first and second bonding zones, the height of the wire is adjusted, and the light-transmitting component is precisely adjusted. And sensitization: the skirt of the wafer on the side of the face. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .泰卜精^ . . . . . . . . - .... - ... - * ..... Adjust the mechanism of lens coma. [Embodiment] ·.':;' ;.: ; : V.';· "· ; ;:;'; •"•': :·'·^^· :; \:.· For details The technical contents of the present invention, the purpose and the efficacy of the present invention will be described in detail below with reference to the embodiments. Please refer to the first figure V for the package junction of the invention of the adjustable mirror element deviation. · · . . . . .

構1係包括自下而土佈緣的承載基緣阶 3〇以我包覆於該緣元件外部的框架4〇 ^謂A 感光晶片2〇固,發承載基板機的^ :' . ' .. :··... ... . : :…;.·:··. ' ..... 片邛的丰表面周邊位置設置有第一键合 1293512 表面周邊位置設置有第二鍵合區Β。所述第一鍵合區Α及第二鍵 合區B之間電性_舍複數條金屬達接線九 包括越項線211 ·綢整線212。其中,抵頂線211自第一鍵合區八 ....* . . - , : . .1 ; ' - . ·. . '. - '* '/·. 向上凸伸’頂蟑並肉上輿所述透光元件紙之下表面抵翁心餘 加自抵頂線211之頂端傾斜向下彎折^^義 10'第二鍵合區Β鍵舍。 .. : ^... ,· . :· ;'; ,; ; -.... . . .· ·; :;"··; 透光元件30輿感光晶片20之上表為的透光影像處鱗^類且 蓋合於感光晶片戮 .· ... · - · . - ,. . / · ·· · - - . ·· . . ·';.·;*·'· · · ·· - . :…. . ·.:'+: ... ' . ’ .L Λ· 屬連操線21 4抵頂萬211承載。該抵頂線211處塗敷有黏著劑25 (在圖中以橢圓環義示)。透光元件3〇藉由難著劑2义_ 而與感光晶片20固接。 '.. . ... ' . . . ' ' ... .’.V.. ·........ 框各40包括下部底板41、中部蓋板43及上部中隹腔聲45。 底板4l·下端固設雙承載基板1〇上表面,餘板对 ....... -. ........ ·. . .* ; ·- 伸私參盍板43 ’蓁樣43末端再向上凸他_成中空腔赛:_ 43下緣與透光元件30上緣黏結一體並蓋合於感光晶片賴靡方, 藉此衡透光元件3〇與感光晶片2〇圍設於框架4〇内部。框架4〇 上部中空腔壁45电成一¾光孔,中空腔壁45内容置有除透光元 .... -; . , ........... .... ... ·'; . 伴30之外的其典鏡頭(圖未示)。該等鏡頭的光軸垂直於透光元 件30表®。The structure 1 includes a carrier base 3 from the lower edge of the soil, and a frame 4 that is wrapped around the edge of the edge member. The photosensitive wafer 2 is tamped, and the substrate is mounted. :··... . . : :...;.·:··. ' ..... The peripheral surface of the sheet is provided with a first bond 1293512. The surface is positioned with a second bond. District. The first bonding region Α and the second bonding region B are electrically connected to each other to form a wire IX. Wherein, the top line 211 is from the first bonding area VIII....* . . - , : . . . ; ' - . . . . '. - '* '/·. The lower surface of the upper light-transmissive element paper is offset from the top end of the top line 211 and is bent downwardly to form a second bonding area. .. : ^... ,· . :· ;'; , ; ; -.... . . . . . . . . . . . . . The light image is in the form of a scale and is covered with a photosensitive wafer.. ..... - . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ·· - . :.... . ·.:'+: ... ' . ' .L Λ· belongs to the operation line 21 4 to the top 211 bearing. The top line 211 is coated with an adhesive 25 (shown as an elliptical ring in the figure). The light transmissive element 3 is fixed to the photosensitive wafer 20 by the hardener. '.. . . ' . . . ' ' . . '. V.. ·........ The frame 40 includes a lower bottom plate 41, a middle cover plate 43 and an upper middle cavity sound 45 . The upper end of the bottom plate 4l· is fixed with the upper surface of the double-bearing substrate 1 , and the remaining plates are opposite.......-. . . . . . . . . . . . The end of the sample 43 is then convex upwards. The lower edge of the sample 43 is bonded to the upper edge of the light-transmitting member 30 and is attached to the photosensitive wafer, thereby balancing the light-transmitting member 3〇 with the photosensitive wafer 2. It is located inside the frame 4〇. The upper hollow wall 45 of the frame 4 is electrically formed into a 3⁄4 optical hole, and the hollow wall 45 is provided with a light-transmitting element.. -; . , ........... ..... · '; . With the 30 other than the typical lens (not shown). The optical axes of the lenses are perpendicular to the sheet of light transmissive element 30.

...... :: ......V . . . · ...... ... ... 、 . . .. : · . ' . …:. 績声閱第二圖’赛冬發明中之實施趣中,因所鱗於 中空腔壁45内,藝^稳 在的乎面之間的布_康會影響本發明_節感雜^||_麵 1293512 .. ·:' .. · ; .. . .. . : .:ν' +.V'. Λ. ,的㈣裝結構1__學緣陡 '例^ 4¾晶片20後囊 ^構產生有益或破_性的干擾。在第二圖所示的截面圖中,位於 ,先鬲月20—树^...... :: ......V . . . . . . . . . . . . . . . . . . . . . In the implementation of the invention of Saidong, because of the scale in the cavity wall 45, the fabric between the art and the surface of the _ _ Kang will affect the invention _ sensational ^|| _ 1293512 .. · :' .. · ; .. . . . . : .: ν' +.V'. Λ. , (4) installed structure 1__ learning edge steep 'example ^ 43⁄4 wafer 20 back capsule structure to produce beneficial or broken _ sex Interference. In the cross-sectional view shown in the second figure, located in the first month of the month 20 - tree ^

f光晶片20另一側的释頂線2U 光疋件30所在平面輿翁光晶片2〇所在平面之間平行或者該兩平 面之間保持預定的角度0本發明為甩 件級所在平面與感光晶片2〇所在平面g間存有預定爲度^技術 ::和:能为:.:。..:.. • . _ .. ..... · .... . _ ' . 聲;A圖與第三从個為本發明採用絲球焊的鍵合技術在金屬 連接綠91 、竖、之抵頂線211調整前、後多狀態示篆 、^舄%方式,鍵含技術係採用絲球焊的鍵合技術^ 、:。竭私中,本發明使用打線機的劈刀樣將金屬靠_線_從第 f A嗅接至藥A鍵合區Ή時邊 凋節全屬考择_ 1之抵頂線2丨_ 於金屬逹接線21福碰線211頂端^_ ^氏頂線211底端的感光晶片20之間的相對位置關係, 伙而^整包括透光龙件30在内的鏡頭整體相對感光晶片20的角 度偏差。 . - . .· · .·' · ;/;;:;;::::. -二一第5 Α圖示出金屬連接線21之抵頂·21丨於 ___,此時抵頂線211的高度為。 .屬連接 i 1 之 1293512 萬 . . : , ;, . - . '. .. . .:·'··· .·;'- . . . ·· ... .... . . . , ...... 此日㈣頂線211的③度為上”由圖中調節前:後之狀態可知上义 .知’金屬__ .在平面㈣光晶_所在平面之間的傾斜角度被調節。從而,藉 由打_的劈刀調埽抵頂線2U的高度即可調節透光元件二 所在與祕_ 2G齡平面之__位置她,麵達成 本發明卿元件之鏡頭猶差的調節。此外,本發明也可以採用其 它鍵靡在第一键, 鲁 金屬連接雄紅的長疼改變金屬連接線·_请線 • ' · · · _. .·‘.·.—— . · . - _. 、. . . .‘_· · · - . • : :.入: ........... : 乂.· .·:::'Λ.._ ·. ' -.;:. &在處光晶片:2〇之底部填充填充物從而將感光晶片2〇固接於 承载基板10的上裏高 b藉由打線··金屬連接線^前端说公知打線方式鍵合於感 • 光a曰片2〇 土表面本声广鍵合區A ’且金翁連 區A上方向上凸伸形成抵頂線211仏入] 彳於抵頂線211卫_敷黏著劑25 '黏^^ 21的轉頂線21Γ .^,::'. /;:;;;;.·.·;' ' · ;., ^·.; . . .... ... ...... ....... ......二. d甩準直儀(鍵to C0llimator)崩量感光晶片20铪襄 1293512 將透光元伴3〇墓合於所述金屬遠接線21的頂绫21丨本The top surface of the f-light wafer 20 is disposed on the other side of the optical line 20, and the plane of the optical element 30 is parallel to the plane of the wafer 2, or a predetermined angle is maintained between the two planes. There is a predetermined degree between the planes g of the wafer 2: technology:: and: can be: .:. ..:.. • . _ .. ..... · .... . _ ' . Sound; A and the third slave are the bonding techniques of the present invention using wire ball bonding in the metal connection green 91, Vertical, the top line 211 adjusts the front and rear multi-state indication 舄, ^ 舄 % mode, the key contains the technology is the use of wire ball bonding technology ^,:. In the private use, the present invention uses the trowel of the wire tying machine to pull the metal from the f _ wire to the drug A bonding zone, and the wilting is all about the top line 2 _ _ The relative positional relationship between the photosensitive wafers 20 at the bottom end of the top line 211 of the metal 逹 wiring 21 is the same as that of the photosensitive wafer 20 including the light-transmitting dragon 30. . - . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . The height of 211 is . Is connected to i 1 of 12,935,112. . : , ;, . - . '. .. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ...... This day (four) top line 211 3 degrees is up" from the adjustment before: the state of the latter can be known as the upper sense. Know the metal __. The angle between the plane of the plane (four) light crystal _ It is adjusted. Thus, by hitting the _ 劈 埽 埽 埽 埽 2 2 2 2 2 2 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 即可 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 In addition, the present invention can also use other keys to lie on the first key, and the ruthenium metal connects the red and long ache to change the metal connection line. _ Please line • ' · · · _. .. '.. · - _. , . . . . ' . . . . . . . : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : . '-.;:. & at the bottom of the optical wafer: 2 填充 bottom filled with filler to fix the photosensitive wafer 2 to the upper surface of the carrier substrate 10 high b by wire bonding · metal connection wire ^ front end known to wire Mode bonding to the sense • Light a cymbal 2 bauxite surface local sound bonding area A 'and Jin Wenlian area A upward convex shape The top line 211 breaks into the ] 抵 抵 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ · ;., ^·.; . . .... ... .................. 2. d甩 collimator (key to C0llimator) collapse The photosensitive wafer 20铪襄1293512 converges the light-transmitting element with the top 绫21丨 of the metal remote wire 21

νι -π里处兀兀仟別的衣由之光釉偏差度-若透 . ;".;./ .., ,最尋先晶片20的表面專間輿預定賴:對隹查相 貝·/與下透光元件30,藉由將金屬連接線21鍵合於 . . .' . . .‘·,. ·_....' , . ....... r. ' 職基板10之箄二_合區丑而調節處於第 ® ^ ^ ^ 21 ^ 30 20 能滿足條件,則重復調節,至最終藝 光晶片20所在平面處於預定的相對位置,:¾ 面之間呈特定角度;:^ .· · ·. . ·.. . .... . . - .....' * ... . .;: . .. f21 211 J 25 i] 將框_0組裝於所迹基板10上,同時蓋祕^透 使框架40包覆透鍵_ • 可調節感測元件之鐃頭僞差的封裝結構封喪結東。滅: 件30蓋合於所述金屬德接線21的抵頂·211上方後,分別測感 光晶)f 20表面及透光元件30表面的光軸偏差度。 述步驟A食,粘著劑25可以進厶步呈環狀冻將透_先件 30 * 間处籍此防止外粉塵等雜物進入感光晶^Νι - π 兀兀仟 的 的 由 由 由 由 - - - - - ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片 晶片·/ with the lower light transmissive element 30, by bonding the metal connecting wire 21 to . . . . . . . . . . . . . . . . . . The 10 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Angle;:^ .···· . . . . . . . . . . . . . . . . . . . . . . . . f f f f f f f f f f f f f f f f On the substrate 10, at the same time, the cover 40 is covered with a transparent key. The package structure that can adjust the artifact of the sensing element is sealed. Off: After the member 30 is overlaid on the top 211 of the metal wire 21, the optical axis deviation of the surface of the light-sensing element f 20 and the surface of the light-transmitting element 30 is measured. In the step A food, the adhesive 25 can be stepped into a loop and frozen. The first part 30* is used to prevent foreign dust and other impurities from entering the photosensitive crystal.

I 1293512 而影響到感光晶片2。的影像感齡^^ 閉空間23内外氣壓乎衡,例 稱孔。措此,黏著劑25固化時,環此 丁 ¥狀你閉空間23内部的空氣氣 泡可以從密閉:空擁择 娜’魏轉基板丨。可麵可見光穿透率很低 且痛強度料製造,如玻壤纖維或陶兗材料等。框架々Ο .... ...: ...——' .; 1 . , . '. .. ..·...' ..... ..:.· · 可採用聚碳酸酯_yca麻ate,簡_^I 1293512 affects the photosensitive wafer 2. Image-aged age ^^ Closed space 23 inside and outside the air pressure is balanced, for example, the hole. In this way, when the adhesive 25 is solidified, the air bubble inside the closed space 23 can be closed from the airtightness: The visible light transmittance is very low and the pain intensity material is manufactured, such as glass fiber or ceramic material. Frame 々Ο .... ...: ...——' .; 1 . , . '. .. ..·...' ..... ..:.· · Polycarbonate _yca hemp ate, Jane _^

Ctystal Mymer ’簡稱LCP)材質製成、其溫度膨脹条^Ctystal Mymer's LCP material, its temperature expansion strip ^

..... .... .. ... . ·...... . · . . .. , ... · , . : J of Thq如吐Expansion,簡稱CTE)應與承^籍 , · · : ; · . · · · ····, . . · -· . , ·.·,·. .. · ... 框架40之底板41:能夠與承載基板10寸樣連接。赛義 ·.· ·. , ... · ·' ..... . ·· ·...·.··· .. ... ., . ..· ; ... ..-..·;· ...:..... .... .. . . . . . . . . . . . . . . . . . . . . . . J J J J J J J J J J J J J J J J J J J J J J J J J 。 , · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · The bottom plate 41 of frame 40: can be connected to the carrier substrate 10 inch.赛义····. , ... · · ' ..... . . . . . . . . . . . . . . . . . . . . . . . . . . . .·;· ...:

由ΒΚ7型或其它光學特性材料製成,其谨可以由光敏材料覆蓋V 也可為任何合適類型的透鏡。 综土所述,本發明之「可調節感測之鏡頭墓的 其封·結構」由上ii揭露之方法與造,議以達到_ ..... · . '.;· '··λ ·'·. ;·'·';;··· . . ... ' .. .. 且本發明之申請合夺尊利之要件,故依涞提出申請0 _ t . 1,. ....... ’ ................... .... ... . ... 揭露者,僅為本發明之較佳實施例,自不能以戒 : ‘ - ... ·-- · . . - ·....... . • . . · ; · ., · · · ,.. r ..... . .·. ·...,·· ‘.'··· · 利範圍。至於本發明之其他等效之餐飾編變你,皆應涵蓋在以卞 本案之:申請專利範酸内冬 第爾儀表杳明之可調節感測元件之鏡頭俺差爵裝結構的截1 ,:: ....... . ' ' ' ' ' ·', ' : " ; ' V ^ V. ' . 1293512 : . . Ί'... . . ... V. . ..... .. ...'ν'...、 ... .. ...ι . . ... . · ...... 第二圖係第—圖中透光元件和感光晶:片表面之間存在角度偏 . 差之截面圖。 义 * · 1 ...'....ν';-.-.......-... • 第三A谓係第$圖中金屬連接象抵填_調節瀚满態乘 第主B圖係第夂圖中金屬連接線抵頊線調節滅ι狀態示意圖> 【主#元件符號說明】 可調節感測元件之鏡頭偏差的封裝結構 1 承載基板 10 感光晶片 20 金屬連接線 抵傾線 V ............. ... 211 調整線 ..... ...... .. ........ 212 密閉空間 :丄 , · · * 23 黏著劑 25 透光元件 30 . · · ..... 框架 40 底板 ... ...... 41 蓋板 43 腔壁: 45 劈刀 50 第一鍵合區 ... .... ' . .: - A 第;鍵舍區 B 抵頂線高庠 hi、h2Made of Type 7 or other optically characteristic materials, it may be covered by a photosensitive material V or any suitable type of lens. According to the comprehensive soil, the "sealing and structure of the lens tomb of the adjustable sensing" of the present invention is disclosed by the method and the method disclosed in the above ii, to achieve _ ..... · . '.;· '··λ · '·. ;···';;··· . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .... ' ..................................... The exposer is only a preferred embodiment of the present invention, Take the ring: '-... ·-- · . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ..,·· '.'··· · Benefit range. As for the other equivalent of the invention, you should cover the case of the 俺 爵 : : : : : : : : : : 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 申请 , , , , , , , , , :: ....... . ' ' ' ' ' ·', ' : "; ' V ^ V. ' . 1293512 : . . Ί'... . . . V. . ... .. .. ...'ν'..., ... .. ...ι . . . . . . . . The second figure is the light-transmitting element and the photosensitive crystal : There is an angular deviation between the surface of the sheet.义* · 1 ...'....ν';-.-.......-... • The third A is the metal connection image in the $ diagram. The main B diagram is a schematic diagram of the metal connection line 顼 调节 调节 ι & & 【 【 【 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主 主Anti-tilt line V ................... 211 Adjustment line ................................... 212 Confined space: 丄, · · * 23 Adhesive 25 Translucent element 30 . · · ..... Frame 40 Base plate ......... 41 Cover plate Wall: 45 File 50 First bonding area... .... ' . .: - A No.; Key area B to the top line 庠hi, h2

1414

Claims (1)

1293512 、申請專利範園: Τ·'-種可調節感測元件之鏡頭偏差的封裝結構,包括:ι 一承載基板,嗔表面周邊位置設置有第二鍵合區; 一感光晶片,固接於承載基板上表面,感光晶片上表面的周 .•‘ -- - ... ... ... ... - _ . '·..... ..' . 邊位置:設置有第一鍵合]I,所述第一鍵襄直友第二鍵合區之間電 ... ' . ' ' .·, ... * .... 性鍵合複數條金屬毫接線; _ ; . . _ . . . : V ........ _ 一透光元件,作為鏡頭的一部务蓋卷¥感光晶片上方;及 . '. . .... .. ' ... ,.. . . .... ::..... 樞架,底端固設於承載基板上表面包覆於i光晶片及透 :光元伴+外部丨 其將徵在於:每」釜脣連接線包括抵頂線及調整線,抵頂線 . - ·. - . : , ·. ' ..... .-·,·-····...·.·· ' ... ... ·.·.'·.·'· ·.. . . . , " ·_ · ... . .· 自感光晶片之第二鍵合馇向上凸伸,頂端並向上與所述透廉元件 之下表面抵頂,謂整線自抵頂線之頂端傾斜向下彎拆:,優嶽並與 所述承載基板之飨工鍵合區鍵合。截丨 么如申請專利範第i項所述的可_節感测元择之囊^偏差 如申請專利範圍楚, 1293512 的封構’其讀所 空驗’底板補^ - 下緣與透光元件类_绰—體並蓋合於感光晶片上方。土现 ,該方法係對如申請 專利麵第1㈣ 下步驟: . ... ...... .. ,.... ... ...... ..... . c·測感光晶片表面的光軸偏差度; 元件表面的光軸偏差^ • 在偏差而沒有_預定^ ,屬連接線鍵合_麵想之第續舍鍾 ’ 第—鍵合區之間的金屬連接線的長度,麵 頂線的高度,從而使透光元件的表面輿感光晶片的¥运處漏預定 的相對位置;及斤丨 -'- " . : ·; /' . ':-.:;; - · . '. ".;,:'· 1: 'V'::' ·. · ' '';'V;:;:Λ'V^^V^/'y^;^V·;;^ '; e.將框架每裝所綠基板上並使該Α_έ覆所述透光元件與 :.::::::感光晶:片入 • .... -: . .. · · ·. . . .·...· .- ··..· ..· ·· ..· ·.. . ·-·.." . .•气.· . .· .‘.··..·, ·. · :.; ;': ::· ;; . ;\,:^·,.;;'· .:.;:.. . .: . ·\:·;:, ·ν;;;:Α·.:.;; .'":,^'·ν'>^;:. :';ΐ.:·;::·ν 7·如申請專利騰圍第6項所述的可_節感測元件之鏡靖偏 的劈刀辟金屬連接線徙第一鍵合區連接至_二鍵合區。 . '; :: ;- ';; •^.:;·;:Λ;Λ:ν;:;^^ ' ..._ ';;; '';;'|,::V:;· ;'·,·:· ' v ;·::'· ·;;'·^^ f 如申請專利 藥練請_, 软桌抑’囊透光元件的表面與感光晶片的表面呈所需特 定角度。 ^ .. . ,.- , .·.+ .'" .··. " : ... · .._... .‘:·.. . ·. ·. ··.·..· · · ... . ... ;;'.·· .... .... . . .··.·,·· · · · . . ' : . . ..... , . ...... _.' · , . ... ' ·.·· .·' ,: · . 的方法,其中,所遂金屬連接線之抵頂賴 箸劑固化後將連光元件輿感光晶片緊密黏結,並呈環狀形成於透 ' .. , . . : . ' ' : ".;. . 1 ' . . ' , 光元件與感光晶片之間,枯著劑内部形成^密閉空間。 11·一種可調節感測元件之鏡頭飨差的方法,該方法係對如申 靖專利範圍第1·所述的封裝結構之鏡續偏差造抒_節,係包福 如下步驟: ' ' ....... t ......... . 匕...... . ::,,;. .. . : . a·將感先晶片固秦於承載基板的上表面; b·將金屬連接線前端鍵合於感光晶片主表面之第一鍵合區; c·將透光元件蓋合於所述金屬連接線的抵頂線土方;: , .,. . · * ' ... ! ..... ·· d·分別測感光晶片表面及透光元件表齒的光軸_差法,若透光 元件的表面輿感条晶片沾表面存在槁差義緣有處於被定的相對^ 置,則取下透光元件,籍由將金屬連接線鍵备於承歲基板之第二 鍵合區而調節處於第一鍵合區與第二鍵合區之間的金屬遽琢線的 長泰,進而調節金屬連接線之抵頂線的高―^^^ 表面輿:感光晶片的義面處於預定的相對位置;及 e·將框架組裝減所述基板上並德該㈣考包覆所述泰光元件與 ' . .. .. ..... ' ·· .· ' .' . . ,. 1293512 感光晶片1293512, Patent Application Park: Τ·'--Package structure for adjusting the lens deviation of the sensing component, including: ι a carrier substrate, a second bonding region is disposed at a peripheral position of the surface of the crucible; a photosensitive wafer is fixed to Carrying the upper surface of the substrate, the circumference of the upper surface of the photosensitive wafer.•' --- ... ... - _ . '·..... ..' . Side position: set with the first Bonding]I, the first key 襄直友 between the second bonding area ... ' . ' ' . . , ... * .... sexual bonding a plurality of metal wires; _; . . . . . . : V ........ _ A light-transmissive component, as a lens cover for the lens, above the photosensitive wafer; and .. . . . . . ,.. . . .. ::..... Pivot, the bottom end is fixed on the upper surface of the carrier substrate and covered on the i-ray wafer and transparent: the optical element is accompanied by the external 丨. The lip line of the kettle includes the top line and the adjustment line, and the top line. - ·. - . : , ·. ' ..... .-·,············ ' . .. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . The transparent component The lower surface is abutted against the top, that is, the entire line is inclined downwardly from the top end of the top line: Yuyue is bonded to the completion bonding area of the carrier substrate. If the paraplegia is as described in the application for patent paradigm i, the sensation of the sensation of the sensor can be determined as the scope of the patent application. The structure of the 1293512 is 'reading the empty space'. The component class _ body is covered and covered above the photosensitive wafer. At present, the method is as follows: Step 1 (4) of the application for patents: . . . . . . , . . . . . . . . . . . . Measuring the optical axis deviation of the surface of the photosensitive wafer; the optical axis deviation of the surface of the component ^ • In the deviation without the _predetermined ^, is the connection of the wire bonding _ the first continuation of the clock - the metal connection between the first bonding zone The length of the line, the height of the top line of the surface, so that the surface of the light-transmitting element 预定 the predetermined relative position of the photosensitive wafer is leaked; and 丨--- " . : ·; / ' . ':-.: ;; - · . '. ".;,:'· 1: 'V'::' ·. · ' '';'V;:;:Λ'V^^V^/'y^;^V ·;;^ '; e. Place the frame on each of the green substrates and cover the light-transmitting elements with:::::::: photosensitive crystal: chip-in • .... -: . . . · · ·· . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ·······.· :.; ;': ::· ;; . ;\,:^·,.;;'· .:.;:.. . .: . ·\:·;: , ·ν;;;:Α·.:.;; .'":,^'·ν'>^;:. :';ΐ.:·;::· 7. The circumference of the Tang patent of six mirror elements of the sensing section may sense _ Yasushi biased metal cleaver provision migration first bonding wire connecting region is connected to two bond pads _. .;;:;- ';; •^.:;·;:Λ;Λ:ν;:;^^ ' ..._ ';;; '';;'|,::V:;· ;'·,·:· ' v ;·::'· ·;;'·^^ f If applying for a patented medicine, please _, the soft table suppresses the surface of the light-transmitting element and the surface of the photosensitive wafer to be required. angle. ^ .. . , .- , .·.+ .'" .··. " : ... · .._... .':·.. . ·. ·. ····.. · · · ... . . ;;'.·· .... .... . . . . . . . . . . . . . . . . . . . . . . . . . ...... _.' · , . . . ' . . . . . . . . . . . . . . , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The photosensitive wafer is tightly bonded and formed in a ring shape in the '.., . . . : ' ' : ".;. 1 ' . . ' , between the optical element and the photosensitive wafer, the inside of the drying agent is formed and sealed space. 11. A method for adjusting the lens coma of a sensing element, the method being the continuation of the mirror deviation of the package structure as described in the scope of the patent scope of the Shenjing patent, the following steps: ' ' . ......t ......... . 匕...... . ::,,;. . . . : . a. The first wafer is solidified on the upper surface of the carrier substrate. b· bonding the front end of the metal connecting wire to the first bonding area of the main surface of the photosensitive wafer; c· capping the transparent connecting element to the top line of the metal connecting line;:, ., . . . ' ... ! ..... ·················································································· When it is in the opposite position, the light transmissive element is removed, and the metal connection line is adjusted between the first bonding area and the second bonding area by preparing the second bonding area of the substrate. The length of the metal twisted wire, and then the height of the top line of the metal connecting wire - ^^^ surface 舆: the surface of the photosensitive wafer is at a predetermined relative position; and e· assembling the frame minus the substrate The (four) test covers the Thai light Components and ' . . . .. ..... '·· .· ' .' . . , . 1293512 Photosensitive wafer
TW95109062A 2006-03-17 2006-03-17 Method and package to adjust the lens tilt compensation for an imaging sensor TWI293512B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95109062A TWI293512B (en) 2006-03-17 2006-03-17 Method and package to adjust the lens tilt compensation for an imaging sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95109062A TWI293512B (en) 2006-03-17 2006-03-17 Method and package to adjust the lens tilt compensation for an imaging sensor

Publications (2)

Publication Number Publication Date
TW200737528A TW200737528A (en) 2007-10-01
TWI293512B true TWI293512B (en) 2008-02-11

Family

ID=45067862

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95109062A TWI293512B (en) 2006-03-17 2006-03-17 Method and package to adjust the lens tilt compensation for an imaging sensor

Country Status (1)

Country Link
TW (1) TWI293512B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6451471B2 (en) * 2015-04-10 2019-01-16 オムロン株式会社 Switch device

Also Published As

Publication number Publication date
TW200737528A (en) 2007-10-01

Similar Documents

Publication Publication Date Title
CN107591374B (en) Sensor Package Structure
US7675016B2 (en) Solid-state image pickup device and method of producing the same
TW201001631A (en) Pressure sensing device package and manufacturing method thereof
TW201214682A (en) Manufacturing method of molded image sensor packaging structure with predetermined focal length and the structure using the same
JP3173586B2 (en) All-mold solid-state imaging device and method of manufacturing the same
CN113193136A (en) Display device and preparation method thereof
TWM455258U (en) Image sensor structure with air gap
TWI254389B (en) Package structure of photo sensor and manufacturing method thereof
TW201138123A (en) Image sensor package structure and camera module using same
TWI293512B (en) Method and package to adjust the lens tilt compensation for an imaging sensor
CN110957334B (en) Sensor package structure
EP0681334A1 (en) Packaging medical image sensors
TWI804052B (en) Non-soldering type sensor lens
TWI314666B (en) Camera module and method for forming the camera module
CN100461437C (en) Method for adjusting lens deviation of sensing element and packaging structure thereof
TWI251938B (en) Package structure (I) of image sensing device
CN115312549A (en) Sensor packaging structure
CN207800609U (en) Encapsulating structure and smart machine
TWI880226B (en) Sensor package structure and manufacturing method thereof
JPH02229453A (en) Semiconductor device and manufacture thereof
TW200411335A (en) Method and apparatus for forming a DMD window frame with molded glass
TWI293507B (en) Image sensor package apparatus
CN210108566U (en) Stress-free packaging structure suitable for MEMS absolute pressure sensor
TWI486690B (en) Display device
TW200424673A (en) Liquid crystal display device and the method of manufacturing the same

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees