1287689 16677twf.doc/g 九、發明說明： 【發明所屬之技術領域】 本^是《於-種光學鄰近校正鮮 關於-種用於製造彩色濾片的移鄰近校正特幻疋有 【先前技術】 =緣㈣的大幅進步以及網際網路 :度發展，目前影像資訊的傳遞大多已由類比轉= f 輕薄。傳統的陰極射線顯示器(CRTf之： =優點，但是由於内部電子搶的結構 ： 1大而佔㈣，且顯科仍有_線傷眼等問題。^體 酉=電技術與半導體製造技術所發展之平面式顯示器 (Fiat Panel Display )，例如液晶顯示器⑽ =示f )或是電漿顯示器（pi_aρ_ι: PDP)專，已逐漸成為顯示器產品之主流。 目前液晶顯示器皆朝向全彩化、大尺寸、高解析度以 ^低成本的方向發展，其巾，液晶顯4通常#由彩^ 1片來達到彩色化顯示的效果。彩色濾光片通常是架構於 1透明之玻璃基板上，此透明玻璃基板上主要配置有用以 遮光之黑矩陣（Black Matrix，BM)以及對應於各個次晝 素排列之彩色濾光單元，例如紅色濾光單元、綠色濾光單 元以及藍色濾光單元等。 “ ^圖1為依照習知彩色濾光片所繪示的上視圖。圖2為 ^剖面線A-A’所繪示的剖面圖。請同時參照圖i及圖2， 紅色濾光單元1G2(標示為R)、綠色濾光單元1Q4(標示為 1287689 16677twf.doc/g G)及藍色濾光單元106(標示為B)以馬賽克型配置於基底 100上，並以黑矩陣108隔離各彩色濾光單元。然而，可 以清楚的看到，因為光學鄰近效應的影響，所形成的紅色 濾光單元102、綠色濾光單元及藍色濾光單元1〇6會 出現圓角（rounding)，進而產生漏光區域11〇、112及114。 上述漏光區域110、112及114會導致漏光的情形產 生，在大尺寸(4μιη)的晝素中，漏光區域11〇、112及114 所產生的漏光現象並不會對色彩的顯示產生嚴重的影響。 但是，隨著晝素尺寸縮小，漏光區域110、112及114所產 生的漏光現象，會對紅-綠-藍之顏色顯不造成很大的影響。 【發明内容】 有鑑於此，本發明的目的就是在提供一種光學鄰近校 正光罩，可有效改善光學鄰近效應。 本發明的另一目的是提供一種彩色濾光片的製造方 法’可解決從漏光區域產生漏光的問題。 本發明提出一種光學鄰近校正光罩，適用於製作一個 彩色濾光片，彩色濾光片上具有一轉移圖案，光學鄰近校 正光罩包括基板、光罩圖案及修補圖案。其中，光罩圖案 配置於基板上，光罩圖案與轉移至彩色濾光片的轉移圖案 不匹配，使得彩色濾光片具有漏光區域。修補圖案配置於 與漏光區域相對應的位置。 依照本發明的一較佳實施例所述，在上述之光學鄰近 校正光罩中，修補圖案包括配置於光罩圖案邊角上的_線 (serif)，配置於基板上的光罩圖案的周邊。 6 1287689 16677twf.doc/g 依照本發明的一較佳實施例所述，在上述之光學鄰近 杈正光罩中，修補圖案包括配置於光罩圖案内的内輔助線 (internal assisted line)，配置於基板上的光罩圖案的周邊。 依照本發明的一較佳實施例所述，在上述之光學鄰近 校正光罩中，光罩圖案的形狀包括矩形。 依照本發明的一較佳實施例所述，在上述之光學鄰近 校正光罩中，基板的材質包括透明玻璃。 本發明提出一種彩色濾光片的製造方法，適用於一個 基底的顯示區。首先，於基底上塗佈第一彩色光阻，再以 第一光罩進行一個第一曝光製程。其中，第一光罩包括第 一基板、第一光罩圖案及第一修補圖案。其中，第一光罩 圖案配置於第一基板上，第一光罩圖案與轉移至第一彩色 光阻的第一轉移圖案不匹配，使得彩色濾光片具有第一漏 光區域。第一修補圖案配置於第一基板上的第一光罩圖案 的周邊，與弟一漏光區域的位置相對應。接著，進行一個 第一顯影製程，以使第一彩色光阻轉為多數個第一彩色濾 光單元。然後，於基底上塗佈第二彩色光阻，再以第二光 罩進行一個第二曝光製程。其中，第二光罩包括第二基板、 第二光罩圖案及第二修補圖案。其中，第二光罩圖案配置 於第二基板上，第二光罩圖案與轉移至第二彩色光阻的第 二轉移圖案不匹配，使得彩色濾光片具有第二漏光區域。 接下來，進行一個第二顯影製程，以使第二彩色光阻轉為 多數個第二彩色濾光單元。之後，於基底上塗佈第三彩色 光阻，再以第三光罩進行一個第三曝光製程。其中，第三 7 1287689 16677twf.doc/g 光罩包括第三基板、第三光覃 第三光罩圖案配置於第：案及弟三修補圖案。其中， 笛-势多来阳认势-ί—板弟三光罩圖案與轉移至 弟功色先阻的弟二轉移圖案不匹配 有第三漏光區域。隨後，進行 钟色濾先片八 進仃—個弟三顯影製程，以使第 二和色光叫為夕數個第三彩色濾光單元。 依照本發明的-較佳實施例所 片的製造方法中，第---、m = 墙 ^ —二修補圖案分別包括配置於 弟、一、二光罩圖案邊角上的飾線。 依照本發明的一較佳實施例所述 片的製造方法中，第-狄、心也《办巴，應元 斤 —— —二修補圖案分別包括配置於 弟一、一、二光罩圖案内的内辅助線。 片二=的:較佳實施例所述，在上述之彩色遽光 片的製造方法中，弟一弁置阁安唾 Λ 示尤卓圖案、弟二光罩圖案與第三光 罩圖案的形狀包括矩形。 依照本發明的-較佳實施例所述，在上述之彩色渡光 片的製ί方法中i第—彩色縣單元、第二彩色濾光單元 與第二衫色濾、光單元的排列方式為馬赛克型、條紋型、四 晝素配置型或三角型。 依照本發明的-較佳實施例所述，在上述之彩色渡光 片的製造方法巾’第-彩色光阻、第二彩色姐與第^彩 色光阻分別為紅色光阻、綠色光阻、或藍色光阻，且互為 不同顏色的光阻。 ^ 依照本發明的一較佳實施例所述，在上述之彩色濾光 片的製造方法中，紅色光阻、綠色光阻與藍色光阻的材質 8 1287689 16677twf.doc/g 包括負光阻。 依照本發明的一較佳實施例所述，在上述之彩色濾光 片的製造方法中，於基底上塗佈第一彩色光阻之前，更包 括於基底上形成一黑矩陣。 依照本發明的一較佳實施例所述，在上述之彩色濾光 片的製造方法中，基底包括薄膜電晶體陣列基板。 依照本發明的一較佳實施例所述，在上述之彩色濾光 片的製造方法中，其中基底的材質包括透明玻璃。 依照本發明的一較佳實施例所述，在上述之彩色濾光 片的製造方法中，第-基板、第二基板與第三基板的^質 包括透明玻璃。 ' 由上所述，在本發明所提出的光學鄰近修正光罩，因 對光罩圖案進彳了光學鄰近修正，在進行彩色濾光片的製作 時，可以有效改善光學鄰近效應。 另一方面，在本發明所提出的彩色濾光片的製造方法 中’因光罩圖案正讀的轉移至彩色光阻上，所形成之彩色 濾光片的各彩色濾光單元之間不會存在漏紐域。如此一 來，可有效抑制漏光的現象。 為讓本發明之上述和其他目的、特徵和優點能更明顯 1 ’下文轉較佳實施例，並配合所關^，作詳細說 明如下。 [實施方式】 圖^為終、本發明—實補鱗示之光學鄰近校正 罩的不W。® 4為依縣伽另—實_鱗示之光學 !287689 16677twf.doc/g 鄰近权正光罩的示意圖。圖5為依照本發明一實施例所繪 不之光罩圖案及其轉移圖t的示意圖。 首先’請同時參照圖3及圖4，本發明所提出的光學 #近校正光罩’適用於製作-個彩色濾光片，此彩色濾光 片上具有從光罩圖案(如圖3及圖4中的標號3〇4)轉移的一 個轉移圖案(如圖5中的標號3〇6)，包括基板300、光罩圖 案302及修補圖案3〇4。其中，光罩圖案3〇2與修補圖案 _ 304配置於基板30〇上，基板3〇〇的材質例如是透明玻璃。 然後，請參照圖5，光罩圖案302與轉移至彩色濾光 片（未繪示）的一轉移圖案3〇6不匹配，使得彩色濾光片具 有漏光區域308。其中，光罩圖案3〇2的形狀例如是矩形， 但並不用以限制本發明。 接著’凊繼續參照圖3及圖4，修補圖案304例如是 圖3中配置於光罩圖案302邊角上的飾線，或是圖4中配 置於光罩圖案302内的内輔助線，且這些修補圖案3〇4的 位置例如是與漏光區域308(見圖5)的位置相對應。上述光 φ 罩圖案3〇2與修補圖案304的尺寸大小及修補圖案3〇4的 個數，是配合所欲形成的圖案而進行調整，此為於此技術 領域具有通常知識者所熟知，而此不再贅述。 由以上可知，因為對光罩圖案302進行光學鄰近修 正，於光罩圖案上加上修補圖案304，因此可以有效抑制 光學鄰近效應，在微影製程中，有助於圖案的正確轉移。 接下來，將詳細說明利用上述光學鄰近校正光罩，製 造彩色濾光片的方法，適用於一個基底的顯示區。 1287689 16677twf.doc/g 圖6為依照本發明一實施例所缘示之彩色滤光 視圖。 請參照圖6，彩色濾光單元402，(例如是紅色，桿示為 R):彩色濾光單元404,(例如是綠色，標示為G)及^色濾 光單元406,(例如是藍色，標示為B)例如是以馬赛克型酉: 置於基底400上。其中，基底400例如是薄膜電晶體陣列 基底或是透明玻璃基底。 然而，可以清楚的看到，本發明的彩色遽光單元 402’、彩色濾光單元404’及彩色濾光單元4〇6，不會出現圓 角，所以不會因為產生漏光區域而造成漏光的現象。在本 實施例中，雖然是以馬賽克型配置的彩色濾光片為例，但 是於此技術領域中具有通常知識者可輕易得知，本發明可 應用於其它配置方式的彩色濾光片製造方法中，例如是條 紋型、四晝素配置型或三角型。 圖7A〜圖7D為沿剖面線A-A’所繪示的製造流程剖面 圖。圖8〜圖10分別為之依照本發明一較佳實施例之光罩 所繪示的上視圖。 首先，請參照圖7A，於基底400上形成一黑矩陣4〇8, 形成方法例如是在基底400上塗佈黑樹脂等不透光材料， 並藉由曝光及顯影等製程形成黑矩陣408。接著，於基底 400上塗佈彩色光阻402，再以光罩500進行一個曝光製 程。其中，彩色光阻402例如是紅色負光阻。 清同日守參照圖6及圖8 ’上述的光罩5 00包括基板 502、光罩圖案504、修補圖案506及不透光圖案508。其 1287689 16677twf.doc/g 中，基板502的材質例如是透明玻璃。光罩圖案504例如 是矩形的透光圖案，而不透光圖案508的材質例如是鉻， 是用以形成如圖6中的彩色濾光片上的彩色濾光單元 402’(標示為R)。此外，修補圖案5〇6例如是配置於光罩圖 案504邊角上的飾線，配置於基板502上的光罩圖案504 的周邊。在另一貫施例中，修補圖案506例如是配置於光 罩圖案504内的内輔助線(可參照圖4中的修補圖案304)。 _ 接著，請參照圖7B進行一個顯影製程，以使彩色光 阻402轉為彩色濾光單元402，。然後，於基底400上塗佈 彩色光阻404，再以光罩6〇〇進行一個曝光製程。其中， 彩色光阻404例如是綠色負光阻。 請同時參照圖6及圖9，上述的光罩600包括基板 6〇2、光罩圖案6〇4、修補圖案6〇6及不透光圖案608。其 中’基板602的材質例如是透明玻璃。光罩圖案604例如 =矩形的透光圖案，而不透光圖案6〇8的材質例如是鉻， 是用以形成如圖6中的彩色濾光片上的彩色濾光單元 > 404 (標示為G)。此外，修補圖案6〇6例如是配置於光罩圖 案604邊角上的飾線，配置於基板6〇2上的光罩圖案6〇4 的周邊。在另一實施例中，修補圖案606例如是配置於光 罩圖案604内的内輔助線(可參照圖4中的修補圖案3〇4)。 接著，請參照圖7C進行一個顯影製程，以使彩色光 =404轉為彩色濾光單元404’。接下來於基底4〇〇上塗佈 f色光阻406，再以光罩700進行一個曝光製程。其中， 彩色光阻406例如是藍色負光阻。 12 1287689 16677twf.doc/g 請同時參照圖6及圖l〇，上述的光罩700包括基板 702、光罩圖案704、修補圖案706及不透光圖案708。其 中’基板702的材質例如是透明玻璃。光罩圖案704例如 是矩形的透光圖案，而不透光圖案708的材質例如是鉻， 是用以形成如圖6中的彩色濾光片上的彩色濾光單元 4〇6’(標示為B)。此外，修補圖案706例如是配置於光罩圖 案704邊角上的飾線，配置於基板7〇2上的光罩圖案704 的周邊。在另一實施例中，修補圖案706例如是配置於光 罩圖案704内的内輔助線(可參照圖4中的修補圖案3〇句。 接著，請參照圖7D進行一個顯影製程，以使彩色光 阻406轉為彩色濾光單元406,。因為在光罩5〇〇、600及 700上具有修補圖案506、606及706，因此可以有效抑制 光學鄰近效應，在微影製程中，有助於圖案的正確轉移， 所以在各彩色濾光單元4〇2,、4〇4,、4〇6，之間不會產生空 隙，所以能有效抑制彩色濾光片漏光的情形。 至此，其它完成彩色濾光片的後續製程 領域具有通常知識麵齡，於此科_。為、此技街 早兀術404、條，的顏色僅用以作為說明 制本發明。另-方面，光罩·、刪及7 配置方式(如馬賽克型、條紋型、四晝素配 而有所不同。於此技術領域具有通常知識或-角幻 不同的條件需求’對彩色遽光單元的顏色形成 1287689 16677twf.doc/g 圖案等進行調整。 由上述可知，因為利用本發明所提出的光學鄰近校正 光罩，可以有效抑制光學鄰近效應，所以在以此光罩製造 彩色濾光片時，各彩色濾光單元4〇2,、4〇4,、4〇6，之間^ 會出現漏光區域，進而可抑制彩色遽光片漏光的現象。 綜上所述，本發明至少具有下列優點··1287689 16677twf.doc/g IX. Description of the invention: [Technical field to which the invention pertains] This is a prior art correction for the proximity correction of a type of optical proximity filter. = edge (four) of the great progress and the Internet: degree development, the current transmission of image information has mostly been converted by analogy = f thin. Conventional cathode ray display (CRTf: = advantage, but due to the structure of internal electronic robbing: 1 large and accounted for (4), and the company still has problems such as ray injury. ^ Body 酉 = development of electrical technology and semiconductor manufacturing technology The Fiat Panel Display, such as the liquid crystal display (10) = display f) or the plasma display (pi_aρ_ι: PDP), has gradually become the mainstream of display products. At present, liquid crystal displays are all oriented toward full color, large size, high resolution and low cost. The towel, liquid crystal display 4 usually achieves the effect of color display by color film. The color filter is usually formed on a transparent glass substrate. The transparent glass substrate is mainly provided with a black matrix (BM) for shielding and a color filter unit corresponding to each sub-tenk arrangement, such as red. Filter unit, green filter unit, blue filter unit, etc. Fig. 1 is a top view of a conventional color filter. Fig. 2 is a cross-sectional view taken along line A-A'. Please refer to Fig. i and Fig. 2, red filter unit 1G2. (labeled as R), green filter unit 1Q4 (labeled 1287689 16677twf.doc/g G) and blue filter unit 106 (labeled B) are arranged in a mosaic pattern on the substrate 100, and are separated by a black matrix 108 Color filter unit. However, it can be clearly seen that the formed red filter unit 102, green filter unit and blue filter unit 1〇6 will have rounding due to the influence of the optical proximity effect. Further, light leakage regions 11, 112, and 114 are generated. The light leakage regions 110, 112, and 114 cause light leakage, and light leakage occurs in the large-sized (4 μm) halogen, light leakage regions 11 〇, 112, and 114. It does not have a serious effect on the display of color. However, as the size of the element is reduced, the light leakage caused by the light leakage areas 110, 112 and 114 will not greatly affect the color of red-green-blue. SUMMARY OF THE INVENTION In view of this, the object of the present invention is An optical proximity correction reticle is provided to effectively improve the optical proximity effect. Another object of the present invention is to provide a method for manufacturing a color filter which can solve the problem of light leakage from a light leakage region. The present invention proposes an optical proximity correction. The reticle is adapted to be a color filter, the color filter has a transfer pattern, and the optical proximity correction reticle comprises a substrate, a reticle pattern and a repair pattern. wherein the reticle pattern is disposed on the substrate, the reticle pattern Does not match the transfer pattern transferred to the color filter, such that the color filter has a light leakage region. The repair pattern is disposed at a position corresponding to the light leakage region. According to a preferred embodiment of the present invention, in the above optical In the proximity correction mask, the repair pattern includes a serif disposed on a corner of the mask pattern and disposed on a periphery of the mask pattern on the substrate. 6 1287689 16677twf.doc/g In accordance with a preferred embodiment of the present invention For example, in the above optical proximity reticle reticle, the repair pattern includes an inner auxiliary line disposed in the reticle pattern (internal assist Ed line), the periphery of the reticle pattern disposed on the substrate. According to a preferred embodiment of the present invention, in the optical proximity correction reticle, the shape of the reticle pattern comprises a rectangle. In the above optical proximity correction reticle, the material of the substrate comprises transparent glass. The invention provides a method for manufacturing a color filter, which is suitable for the display area of a substrate. First, the substrate is coated on the substrate. The first color mask is subjected to a first exposure process, and the first mask comprises a first substrate, a first mask pattern and a first repair pattern. wherein the first mask pattern is configured On the first substrate, the first mask pattern does not match the first transfer pattern transferred to the first color photoresist such that the color filter has a first light leakage region. The first repair pattern is disposed on the periphery of the first mask pattern on the first substrate, corresponding to the position of the light leakage region. Next, a first developing process is performed to convert the first color photoresist into a plurality of first color filter units. Then, a second color photoresist is coated on the substrate, and a second exposure process is performed with the second mask. The second photomask includes a second substrate, a second mask pattern, and a second patch pattern. The second mask pattern is disposed on the second substrate, and the second mask pattern does not match the second transfer pattern transferred to the second color photoresist, so that the color filter has a second light leakage region. Next, a second developing process is performed to convert the second color photoresist into a plurality of second color filter units. Thereafter, a third color photoresist is coated on the substrate, and a third exposure process is performed with the third mask. The third 7 1287689 16677twf.doc/g photomask includes a third substrate and a third aperture. The third mask pattern is disposed on the first and third patches. Among them, the flute-pottery is more convinced that the temperament--the three-mask pattern of the board is not matched with the shift pattern of the second shift that has been transferred to the younger brother. There is a third light leakage area. Subsequently, the clock color filter is applied to the eight-developer process, so that the second color light is called the third color filter unit. In the manufacturing method of the sheet according to the preferred embodiment of the present invention, the first ---, m = wall-two patch patterns respectively include trim lines disposed on the corners of the mask pattern of the stile, the first and the second mask. According to a method for manufacturing a sheet according to a preferred embodiment of the present invention, the first and the second patch patterns of the first and second masks are respectively arranged in the pattern of the first, second and second masks. Internal auxiliary line. [Table 2]: In the preferred embodiment, in the above-mentioned method for manufacturing a color light-receiving sheet, the brother-in-law sets the shape of the Youzhuo pattern, the second mask pattern and the third mask pattern. Includes a rectangle. According to a preferred embodiment of the present invention, in the method for manufacturing a color light-passing sheet, the arrangement of the i-color county unit, the second color filter unit, the second color filter, and the light unit is Mosaic, stripe, quadruple configuration or triangle. According to a preferred embodiment of the present invention, in the method for manufacturing a color light-passing sheet described above, the first color stop, the second color sister, and the second color photoresist are red photoresist, green photoresist, Or blue photoresist, and different colors of photoresist. According to a preferred embodiment of the present invention, in the above method of fabricating a color filter, the material of the red photoresist, the green photoresist, and the blue photoresist 8 1287689 16677 twf.doc/g includes a negative photoresist. According to a preferred embodiment of the present invention, in the method of fabricating the color filter described above, before the first color photoresist is coated on the substrate, a black matrix is further formed on the substrate. According to a preferred embodiment of the present invention, in the above method of fabricating a color filter, the substrate comprises a thin film transistor array substrate. According to a preferred embodiment of the present invention, in the method of fabricating the above color filter, the material of the substrate comprises transparent glass. According to a preferred embodiment of the present invention, in the method of manufacturing a color filter, the first substrate, the second substrate, and the third substrate comprise transparent glass. From the above, in the optical proximity correction mask proposed by the present invention, since the optical proximity correction is applied to the mask pattern, the optical proximity effect can be effectively improved when the color filter is produced. On the other hand, in the method of manufacturing a color filter according to the present invention, "the color filter is not transferred between the color filter units of the color filter formed by the positive reading of the mask pattern. There is a leaky new field. In this way, the phenomenon of light leakage can be effectively suppressed. The above and other objects, features, and advantages of the present invention will become more apparent. [Embodiment] FIG. 2 is a schematic diagram of the optical proximity correction cover of the present invention. ® 4 is the optical of the county-plus gamma-real-scale squad! 287689 16677twf.doc/g Schematic diagram of the neighboring right reticle. Figure 5 is a schematic illustration of a reticle pattern and its transfer diagram t, in accordance with an embodiment of the present invention. First, please refer to FIG. 3 and FIG. 4 simultaneously. The optical #near-correction mask of the present invention is suitable for producing a color filter having a mask pattern (see FIG. 3 and FIG. A transfer pattern (referred to as numeral 3〇6 in FIG. 5) of the reference numeral 3〇4) in 4 includes a substrate 300, a mask pattern 302, and a repair pattern 3〇4. The mask pattern 3〇2 and the repair pattern _304 are disposed on the substrate 30A, and the material of the substrate 3〇〇 is, for example, transparent glass. Then, referring to FIG. 5, the mask pattern 302 does not match a transfer pattern 3〇6 transferred to a color filter (not shown), so that the color filter has a light leakage region 308. The shape of the reticle pattern 3 〇 2 is, for example, rectangular, but is not intended to limit the present invention. Then, referring to FIG. 3 and FIG. 4 , the repair pattern 304 is, for example, a trim line disposed on the corner of the mask pattern 302 in FIG. 3 or an inner auxiliary line disposed in the mask pattern 302 in FIG. 4 , and The position of these repair patterns 3〇4 corresponds, for example, to the position of the light leakage region 308 (see Fig. 5). The size of the light φ mask pattern 3〇2 and the repair pattern 304 and the number of the repair patterns 3〇4 are adjusted in accordance with the pattern to be formed, which is well known to those skilled in the art. This will not be repeated here. As can be seen from the above, since the reticle pattern 302 is optically adjacently modified, the repair pattern 304 is applied to the reticle pattern, so that the optical proximity effect can be effectively suppressed, and the pattern can be correctly transferred in the lithography process. Next, a method of manufacturing a color filter using the above optical proximity correction mask will be described in detail, which is suitable for a display area of a substrate. 1287689 16677 twf.doc/g Figure 6 is a color filter view of the present invention in accordance with an embodiment of the present invention. Referring to FIG. 6, a color filter unit 402 (for example, red, the bar is shown as R): a color filter unit 404 (for example, green, denoted as G) and a color filter unit 406 (for example, blue) Marked as B), for example, in a mosaic type: placed on the substrate 400. The substrate 400 is, for example, a thin film transistor array substrate or a transparent glass substrate. However, it can be clearly seen that the color calender unit 402', the color filter unit 404' and the color filter unit 4〇6 of the present invention do not have rounded corners, so that light leakage is not caused by the occurrence of light leakage regions. phenomenon. In the present embodiment, although a color filter configured in a mosaic type is taken as an example, those skilled in the art can easily know that the present invention can be applied to a color filter manufacturing method of other configurations. For example, it is a stripe type, a tetrakisole configuration type or a triangle type. 7A to 7D are cross-sectional views showing the manufacturing flow along the line A-A'. 8 to 10 are top views of a reticle in accordance with a preferred embodiment of the present invention. First, referring to FIG. 7A, a black matrix 4〇8 is formed on the substrate 400 by, for example, applying an opaque material such as black resin on the substrate 400, and forming a black matrix 408 by a process such as exposure and development. Next, a color photoresist 402 is coated on the substrate 400, and an exposure process is performed with the mask 500. Among them, the color photoresist 402 is, for example, a red negative photoresist. Referring to Figures 6 and 8 of the same day, the photomask 500 includes the substrate 502, the mask pattern 504, the repair pattern 506, and the opaque pattern 508. In 1287689 16677twf.doc/g, the material of the substrate 502 is, for example, transparent glass. The reticle pattern 504 is, for example, a rectangular light transmissive pattern, and the material of the opaque pattern 508 is, for example, chrome, which is used to form a color filter unit 402 ′ (labeled as R) on the color filter as in FIG. 6 . . Further, the repair pattern 5〇6 is, for example, a trim line disposed on a corner of the reticle pattern 504, and is disposed on the periphery of the mask pattern 504 on the substrate 502. In another embodiment, the repair pattern 506 is, for example, an inner auxiliary line disposed in the mask pattern 504 (refer to the repair pattern 304 in FIG. 4). Next, a developing process is performed with reference to Fig. 7B to convert the color resist 402 into the color filter unit 402. Then, a color photoresist 404 is coated on the substrate 400, and then an exposure process is performed with the mask 6 。. The color photoresist 404 is, for example, a green negative photoresist. Referring to FIG. 6 and FIG. 9, the photomask 600 includes a substrate 6〇2, a mask pattern 6〇4, a repair pattern 6〇6, and an opaque pattern 608. The material of the substrate 602 is, for example, transparent glass. The mask pattern 604 is, for example, a rectangular light-transmitting pattern, and the material of the light-impermeable pattern 6〇8 is, for example, chrome, which is used to form a color filter unit on the color filter as in FIG. 6 > 404 (marked For G). Further, the repair pattern 6〇6 is, for example, a trim line disposed on the corner of the reticle pattern 604, and is disposed on the periphery of the mask pattern 6〇4 on the substrate 6〇2. In another embodiment, the repair pattern 606 is, for example, an inner auxiliary line disposed in the mask pattern 604 (refer to the repair pattern 3〇4 in FIG. 4). Next, a developing process is performed with reference to Fig. 7C to convert the color light = 404 to the color filter unit 404'. Next, an f-color photoresist 406 is coated on the substrate 4, and an exposure process is performed with the mask 700. Among them, the color photoresist 406 is, for example, a blue negative photoresist. 12 1287689 16677twf.doc/g Referring to FIG. 6 and FIG. 3 simultaneously, the photomask 700 includes a substrate 702, a mask pattern 704, a repair pattern 706, and an opaque pattern 708. The material of the substrate 702 is, for example, transparent glass. The mask pattern 704 is, for example, a rectangular light-transmitting pattern, and the material of the light-impermeable pattern 708 is, for example, chrome, which is used to form a color filter unit 4〇6' on the color filter as in FIG. 6 (labeled as B). Further, the repair pattern 706 is, for example, a trim line disposed on a corner of the mask pattern 704, and is disposed on the periphery of the mask pattern 704 on the substrate 7〇2. In another embodiment, the repair pattern 706 is, for example, an inner auxiliary line disposed in the mask pattern 704 (refer to the repair pattern 3 in FIG. 4. Next, please refer to FIG. 7D for a development process to make the color The photoresist 406 is converted into the color filter unit 406. Since the repair patterns 506, 606, and 706 are provided on the masks 5, 600, and 700, the optical proximity effect can be effectively suppressed, which contributes to the lithography process. Since the pattern is correctly transferred, no gap is formed between the color filter units 4〇2, 4〇4, and 4〇6, so that the color filter can be effectively suppressed from leaking. The subsequent process area of the filter has the usual knowledge of the age of the face, and the color of the 404, the strip, the color of the strip is only used as a description of the invention. Another aspect, the mask, the deletion And 7 configuration methods (such as mosaic, stripe, and four-in-one are different. This technical field has the usual knowledge or - different conditions of the angular illusion 'color formation of the color calender unit 1287689 16677twf.doc / g pattern, etc. are adjusted. It can be seen that, because the optical proximity correction mask proposed by the present invention can effectively suppress the optical proximity effect, when the color filter is manufactured by the photomask, each color filter unit 4〇2, 4〇4, Between 4 and 6, there will be a light leakage area, which can suppress the phenomenon of light leakage of the color grading sheet. In summary, the present invention has at least the following advantages:
1·利用本發明所提出之光學鄰近校正光罩，可以有 減少光學鄰近效應並提高微影製㈣解析度，輯 ς 確的圖案轉移。 1 > 2.在本發明所提出之彩色濾光片的製造方法中 各形色濾光單元之間不會存在漏舰域， ^ 的現象，㈣有更佳的顯示效果。 I礼属先 =本發明已以較佳實施賴露如上，然其並非用以 限疋本舍明，任何熟習此技藝者，在不脫 Ϊ範，當可作些許之更動與潤•，因此本發= 摩巳圍當視後附之申請專利範圍所界定者為準。 ” 【圖式簡單說明】 圖1為依照習知彩色濾光片所綠示的上視圖。 圖2為沿剖面線所緣示的剖面圖。 罩的依照本發明—實施例所1 會示之光學鄰近校正光 圖4為依照本發明另一實施例 光罩的示意圖。 <尤予郇近杈正 圖5為依照本發明—實施例所緣示之光罩圖案及其轉 14 1287689 16677twf.doc/g 移圖案的示意圖。 圖6為依照本發明一實施例所繪示之彩色濾光片的上 視圖。 圖7A〜圖7D為沿剖面線A-A’所繪示的製造流程剖面 圖。 圖8〜圖10分別為之依照本發明一較佳實施例之光罩 所繞示的上視圖。 【主要元件符號說明】 100、400 :基底 102 :紅色濾光單元 104 :綠色濾光單元 106 :藍色濾光單元 108、408 :黑矩陣 110、112、114 :漏光區域 300、502、602、702 :基板 302、504、604、704 :光罩圖案 304、506、606、706 :修補圖案 306 :轉移圖案 308 :漏光圖案 4〇2、404、406 :彩色光阻 4〇2’、404’、406’ ：彩色濾光單元 500、600、700 :光罩 508、608、708 :不透光圖案 151. Using the optical proximity correction mask of the present invention, it is possible to reduce the optical proximity effect and improve the micro-shadowing (4) resolution, and to accurately determine the pattern transfer. 1 > 2. In the method for manufacturing a color filter according to the present invention, there is no leakage domain between the color filter units, a phenomenon of ^, and (4) a better display effect. I rites first = the present invention has been implemented as a preferred embodiment, but it is not intended to be limited to Ben Ming, anyone who is familiar with the art, can not make a difference, when it can make some changes and run ·, therefore This issue is subject to the definition of the patent application scope attached to the company. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a top view of a color filter according to a conventional color filter. Fig. 2 is a cross-sectional view taken along the line of the cross section. The cover is shown in accordance with the present invention. Optical proximity correction light Figure 4 is a schematic view of a reticle in accordance with another embodiment of the present invention. <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Figure 6 is a top view of a color filter according to an embodiment of the invention. Figures 7A to 7D are cross-sectional views of the manufacturing process taken along section line A-A'. 8 to 10 are top views of a reticle according to a preferred embodiment of the present invention. [Main component symbol description] 100, 400: substrate 102: red filter unit 104: green filter unit 106: blue filter units 108, 408: black matrix 110, 112, 114: light leakage regions 300, 502, 602, 702: substrates 302, 504, 604, 704: reticle patterns 304, 506, 606, 706: repair Pattern 306: transfer pattern 308: light leakage pattern 4〇2, 404, 406: color photoresist 4〇2', 40 4', 406': color filter units 500, 600, 700: reticle 508, 608, 708: opaque pattern 15