TWI284349B - System and method for supplying photoresist - Google Patents

Abstract

A photoresist supply system includes a storage bottle and a reservoir coupled in flow communication therewith. A vacuum pump is coupled in flow communication with the reservoir and creates a vacuum within the reservoir that draws photoresist out of the storage bottle and into the reservoir. An inlet into the reservoir is configured to flow photoresist down an inner wall of the reservoir. The photoresist flows out of the reservoir into a dispense reservoir from which the photoresist is pumped to a dispense nozzle for application to a wafer or substrate.

Description

1284349 Ref. No. 91135006 曰Revision 5, Invention Description (1) Field of the Invention The present invention relates to the manufacture of semiconductor wafers and optical discs, and more particularly to a supply system for photoresist or other similar operating liquids and method. On the surface of the previous surface and the pattern of the photoresist to the light, part of the photoresist of the wafer, the special technique of the pattern in the semiconductor surface pattern of the transistor size, the ability of the lithography to change the layer, the resistance , according to the pattern layer of the table. In the case area, the map is subsequently changed to make the exposure layer. And the conductor domain will be the case. His wafers. For micro-lithography, the electro-optical process is more lithographic, and the photo-resist pattern is required to be changed by photo-resistance. For example, the photoresist wafer table will be accurately processed by the remaining process. In the figure, the light outside the pattern is etched by the usual layer, and the accumulation of the process is in accordance with the pattern of the 〇 〇 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 The semiconductor wafer table often determines the key process of circuit fabrication and circuit junction. As the integrated circuit becomes smaller, the features of the advanced semiconductor pattern are smaller. The feature in the semi-resistance case will be light, and the process will be etched in the field of the semiconducting conductor. While the engraving agent develops the crystal wafer to expose the structure to resist, a table having a back light circle is specifically defined to coat the pattern of the sexually removed pattern on the semi-resistance layer. However, the exposure pattern is defined according to the conductor wafer force. Because the removal part is required, the photoresist is also commonly used in the optical disc master.

8243twf1.ptc Page 6 1284349 _ Case No. 91135006_年月日日__ V. Description of invention (2) (mastering) process, in the manufacture of optical disc master, photoresist is coated on glass, polycarbonate (polycarbonate ) or on a substrate made of other suitable materials. The disc coated with the photoresist is then laser-selectively exposed using a master wafer. After the exposure, the disc is immersed in the developing solution to remove the developed or undeveloped portion of the resist depending on the type of the resist. The disc that develops the residual photoresist forms the physical stencil structure of the disc. As is generally known, photoresists are typically photosensitive chemicals that are sensitive to a specific range of wavelengths of light. When the photoresist is exposed to light of a specific wavelength, the photoresist will be photosensitive and change its structure and properties. Depending on the type of photoresist used, changes in structure and properties typically result in a soluble or insoluble state, or an insoluble structure or a soluble structure. In some cases, the exposed photoresist is developed after exposure, and the development of the photoresist typically removes the photoresist of the soluble portion, while the residual insoluble portion of the photoresist defines the pattern. In order to define a smaller or even more complex pattern of features in the photoresist, the photoresist must be free of contaminants and have the desired viscosity and uniform concentration. For the required viscosity of the photoresist and the required thickness for the photoresist supply, the size of the wafer or disc to which the photoresist is applied must be considered. Moreover, the photoresist must be uniformly bonded to the surface of the wafer or disc and must be evenly distributed and of sufficient thickness to define the photoresist remaining in the wafer or disc and to serve as a remnant of these areas. Barrier. The photoresist typically uses a rotating chuck or other similar device to deposit photoresist on the wafer or the center of the disc and distribute the photoresist to the entire wafer or disc surface via rotation. The photoresist is usually disposed on the wafer.

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j is the nozzle above the disc to make the ingredients. And the photoresist is usually stored in a storage tank or a reservoir (reserv〇i ^ = case number 91135006 invention description (3) Ϊ two to K by ί system, the photoresist is first pumped two = should be saved And then pumped to the dispensing nozzle by the supply reservoir. In a conventional photoresist supply system such as that described above, the microbubbles (m 1 cr 〇bubb 1 es ) will be introduced into the present, ,,,,,, It constitutes an unacceptable contaminant. The box/=bubble will be in the light resistance, and it will be in the process of: the micro-bubble is not attached to the surface of the wafer or disc. Removal and other deficiencies. SUMMARY OF THE INVENTION In view of the need for a method and system that avoids the generation of microbubbles to supply photoresist or other similar materials, it is generally preferred that the method of the present invention satisfies such needs. Providing a vacuum or negative pressure photoresist supply system connected to one or more photoresist storage bottles and via a bottle automatic switching valve (b 〇 11 ie auto-change valve) to compound photoresist or other Similar materials. The invention can be implemented in a variety of ways, including a process (p r 0 c e s s ), an apparatus (apparatus), a system (system), a device (d e v i c e ) and a method (m e t h 〇 d ), and several embodiments will be described below.

8243twfl.ptc Page 8 1284349 Case No. 91135006 Revision Date V. Description of Invention (4) Real. And save. It is equipped with a good feeder. Two-port pump from the mouth to the material storage bottle, the first empty storage bottle, one storage, one storage, one true, one in the light, including two. It is stored in the package and the package is connected to the same package and is connected to the bottle, and a bottle is attached to the supply. For the first block of the storage device, the storage bottle is blocked to the light storage, storage, storage, storage, light storage, and storage. This second store is connected to the device, and the second, the storage of the system is connected to the storage system. a mouth. The light is selected from the material and the liquid is sprayed. Fang Qi. When the wall is more matched, the device is connected to the side of the device, and the valve is connected to the U-flow system for storage. Bottom resistance storage system - > Cut the side device of the β side device, the U memory is blocked in the first movement, and the U device is equipped with the light storage material from the other side. The purpose of the invention is to provide a solution in which the storage bottle has an outlet. There is a reservoir inlet therein and a vacuum pump is connected to the storage bottle stored in another preferred embodiment for storing the photoresist material. The photoresist supply system further includes a reservoir inlet connected to the first connection to the second reservoir. In still another preferred embodiment, the valve is switched, the bottle automatically switching the valve and an outlet of the second reservoir. The first reservoir is coupled to the second reservoir. In a further preferred embodiment, the inlet causes the photoresist to contact the inlet of the first reservoir to contact the photoresist to a further preferred embodiment pump that is coupled to the dispensing pump and used to In another method of the present invention, a first reservoir is connected to the first reservoir by a vacuum state.

& 8243 twf1.ptc Page 9 1284349 Case No. 91135006 曰 Amendment 5, Invention Description (5) A device connected to the ingredient reservoir 2 storage tank is introduced into the second reservoir or the second reservoir in a preferred embodiment The inner wall of the second reservoir and the present invention have a plurality of points: vacuum or negative pressure light causes the photoresist to flow through the system, and will be able to eliminate the contamination of the photoresist generated by the conventional supply of other gases or media. It is taken over by the source of microbubbles. , its device. In the light, the excellent resistance of the light is used to remove the micro-resistance of the photoresist system, and the medium-light and the first-class light resistance are incorporated into this point. Should be supplied in the medium, bubble. And the increase in the resistance of the resistance system into the 酉 酉 各自 各自 各自 各自 各自 各自 各自 各自 各自 各自 各自 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于During the contact of the reservoir, the vacuum is significantly higher in the other pressurization process and the scraping yield is better by the first storage 〇 first reservoir and the superior or negative pressure to the system, so the nitrogen as well as the microbubbles will be traced. The invention is provided with a reduction in manufacturing. The photoresist is allowed to fall into the reservoir inlet to allow light to pass through the inlet channel or to store. The present invention is a dynamic switching valve. Significant benefits of the resistance supply system are such that the flow along the inner sidewall or the storage tank is stored in the vacuum or negative pressure photoresist supply system along the inner wall of the storage tank or the device, and the photoresist is along the photoresist reservoir. If the inner side wall flows, it is possible to prevent the light from passing through the inner tube. The photoresist supply system of the present invention comprises a tank or an inner wall of the reservoir. When the photoresist is a reservoir, the photoresist is smoothly moved along the storage to avoid over-mixing and stirring of the photoresist. An additional benefit is that in the preferred embodiment, the bottle-to-bottle automatic switching valve system can be coupled to two Light or more, such that when one of the sources is evacuated, other sources

8243twf1.ptc Page 10 1284349 Case No. 91135006 修正 Amendment 5. The invention description (6) is automatically connected to keep the operation of the system uninterrupted. By maintaining a stable supply of photoresist, it is possible to avoid the system cleanup requirements that may arise when switching air, nitrogen or other gases or media into the system. The above and other objects, features, and advantages of the present invention will become more apparent and understood. Several preferred embodiments will be described below. In a preferred embodiment, a supply system includes a negative pressure supply system and a photoresist reservoir having inlet design features to prevent microbubbles from being generated by the photoresist supply system. In order to enable the invention to be fully understood, the specific details are further described below. However, it must be understood that those skilled in the art can implement the invention in the absence of some or all of the specific details. In other instances, well-known techniques are not described in detail to avoid unnecessarily obscuring the invention. Figure 1 is a schematic diagram of a photoresist supply system in accordance with a preferred embodiment of the present invention. As shown in Fig. 1, the first storage bottle 110 is supplied to the first reservoir 1 1 2 via the first inlet conduit 1 1 4 . The second storage bottle 1 16 is supplied to the second reservoir 118 via the second inlet conduit 120. The first vacuum pump 1 2 2 is coupled to the first reservoir 1 1 2, and the second vacuum pump 1 2 4 is coupled to the second reservoir 1 18 . In the preferred embodiment illustrated in the drawings, the photoresist supply system comprises two vacuum systems each having a vacuum pump 1 2 2, 1 2 4 and individually connected to two reservoirs 1 1 2, 1 1 8 to maintain light. Continued supply of resistance.

8243twf1.ptc Page 11 1284349 Case No. 91135006 曰Revision 5. Invention Description (7) In other preferred embodiments, the photoresist supply system includes a vacuum system having a vacuum pump and is coupled to one according to the requirements of the system. Or more reservoirs, or multiple vacuum systems with more than one vacuum pump connected to a plurality of reservoirs, or any combination thereof to supply photoresist. The photoresist supply system 1 in FIG. 1 includes a bottle automatic switching valve 126 to control the selection of photoresist from one of the first reservoir 1 1 2 or the second reservoir 1 18 for Maintain a continuous supply of photoresist. In other preferred embodiments, the automatic bottle switching valve 1 26 is configured to conform to a plurality of reservoirs incorporated into the photoresist supply system. In another preferred embodiment, a plurality of automatic bottle switching valves are included in the photoresist supply system to control the selection of photoresist from a plurality of reservoirs included in the photoresist supply system. The ingredient inlet conduit 1 2 8 is supplied to the ingredient reservoir 130 by the selected reservoirs 1 1 2, 1 1 8 . The ingredient reservoir vacuum pump 1 3 3 is tied to the ingredient reservoir 1 3 0 to generate a negative pressure so that the photoresist is stored in the batch from the selected reservoir 1 1 2, 1 1 8 to 1 300. In a preferred embodiment, a system controller (not shown) is used to control the supply of photoresist and automatically determine the selection when the photoresist in the reservoirs 1 1 2, 1 18 reaches a predetermined level. Switching from one of the reservoirs 1 1 2, 1 1 8 to the other of the reservoirs 1 1 2, 1 1 8 . In a preferred embodiment, when the photoresist in the reservoirs 1 1 2, 1 18 reaches a predetermined level, an alert is provided to the operator and the bottle automatic switching valve 1 2 6 is manually activated in time or the system is suggested. Enable the automatic switching valve 1 2 6 . In the preferred embodiment illustrated in the drawings, the photoresist system in the ingredient reservoir 130 is supplied to the wafer or disc table by the dosing pump 134 via the dispensing nozzle 134.

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The example of 8 / IV light blocking is better than the one shown in Figure 11. The first picture shows that the figure is not clear, the surface of the five-package system is stored in a system, and the system is 8 Light, a 2 bottle storage two have their own response to each of the two have a small to 11 storage and 1 slot. Save the 8th storage in the 11th to the device storage bottle one continuous f / fc 12 The first holding of the pump in the air junction is really connected to the light of the 4th dimension 2 in 1 for its use, the air system is full 6 2 2 Line 1 valve air · I and change the true 彳, cut 1 5 2 move - \ gc storage device storage material is assigned to the flow to the system η should be 3 for the pump by the air system true resistance three light the second Should one be used to block light in the containment system? Spraying and sputum production: I with 酉. Production V by ο A 3 flow, > 1 - ο 183 11 1 storage > 1 storage 2 storage material 11 storage device hopper 3 The storage is blocked by the light, and the pump is driven by the pump. The pressure-resisting surface of the disc or the round crystal to the material should be supplied to the system for the supply of the system. In the stains of the dyeing system, there is no need for micro-systems to be blocked by the light-blocking material, and the light is blocked, and the above-mentioned theory is discussed. In the actual material, it is better than the invention. In or. The resistance of the dyes in the dyes is the same as that of the matter, the light in the middle is the same as the light, and the pressure is applied to the nitrogen of the phosgene. ο Ι Ι Ι 统 Ι It should be used to block the light and produce light in the bubble. In the system, the system should be applied with a real resistance of good light 45—i, i Mingtong starts the flow in the resistance, the light bubble makes the micro-concurrence, and the production resistance is 2 T 1-* The pump is empty and the real use is better. The system of hairdressing should be used to block light in the first source of the soil by the source of the source, and the fruit is empty. 2 1 foot device attached to the parallel storage 2

8243twf1.ptc Page 13 1284349 Nickname 91135006 曰 Amendment 5, invention description (9) Negative pressure to draw light from the first storage bottle outlet 1 1 1 out of the first storage bottle 110 and flow through the first inlet conduit 114 The first reservoir 112. In a preferred embodiment, the resulting negative pressure system is sufficient to draw light from the first storage bottle 110 and flow into the first reservoir 1 1 2, but the negative pressure is not too strong to prevent the photoresist from being A reservoir outlet 1 1 5 flows out of the first reservoir 1 1 2 . Accordingly, the photoresist system can flow out of the first reservoir 1 1 2 via the first reservoir outlet 1 15 and through the vial automatic switching valve 1 2 6 and the dosing inlet conduit 1 2 8 to flow into the ingredient reservoir 130. Similarly, the second vacuum pump 1 2 4 causes the second reservoir 1 18 to generate a negative pressure. The negative pressure sucking photoresist in the second reservoir 1 1 8 flows out of the second storage bottle 1 16 from the second storage bottle outlet 1 2 3 and flows into the second storage 1 1 8 via the second inlet conduit 1 2 0 . The second vacuum pump 1 2 4 causes the second reservoir 1 18 to generate sufficient negative pressure to draw the photoresist from the second storage bottle outlet 123 out of the second storage bottle 1 16 ' and via the second inlet conduit 1 2 0 Flowing into the second reservoir 1 18 . However, the negative pressure is not too strong to prevent the photoresist from flowing out of the second reservoir 1 18 from the second reservoir outlet 1 2 5 . Thus, the photoresist system can flow out of the second reservoir 1 1 8 via the second reservoir outlet 1 2 5 and through the vial automatic switching valve 1 2 6 and the ingredient inlet conduit 丨28 to flow into the ingredient reservoir 丨3 〇. #第二真空泵13 3 is connected to the ingredient reservoir 1 3 〇 to dispense ί 10 屮 production negative pressure. The negative pressure system 1 2 产生 produced by the ingredient reservoir 1 30, the ingredient inlet channel: 1 18, and flows through the bottle automatic switching valve to the 苴 guide 1 2 8 to flow into the ingredient reservoir 130. The pump system is used in the % handle case, depending on the needs of the system, a single vacuum, one or more reservoirs. Or the plural

Page 14 1284349 repair

------ Case No. 9113500fi_年月五五, invention description (10) Empty fruit is used for multiple reservoirs and is included in large-scale photoresist supply, this vacuum or vacuum system is not imported In the case where the photoresist generates micro 5 ^, two or other gases, the photoresist is caused to flow from the storage device to the batching device. The automatic switching device of the gas cylinder 1 2 6 is used to stop the '° character, ' when the storage container is exhausted. supply. In addition, by eliminating the dryness of the photoresist during the operation of the system and eliminating the system cleaning operation when the light resistance is supplied, the automatic switching device 1 2 6 can maintain the normal running time of the system, thereby improving production. Rate, and use the system more economically and efficiently. The bottle automatic & switching valve 1 26 can be connected to more than one of the plurality of supply inlets, and wherein the plurality of supply inlets are individually connected to the plurality of photoresist reservoirs and provide one or more valve outlets and Flow through one or more of the ingredient inlet conduits 128 to flow into one or more ingredient reservoirs 丨30. Automatic Bottle Switching Valves 1 2 6 Select more than one source inlet to allow fluid to flow through the bottle automatic switching valve 1 2 6 to the valve outlet. In addition to the formation of microbubbles by pressurized nitrogen, conventional photoresist supply systems also generate microbubbles where the photoresist enters one of the reservoirs 1 1 2, 1 18, and 130. In a preferred embodiment of the invention, the individual inlet conduits 1 1 4, 1 2 0, 1 2 8 are configured to cause the photoresist to flow into the reservoir 1 1 2, 1 18, 1 3 〇, wherein the inlet conduit 1 1 4. 1 2 0, 1 2 8 causes the photoresist to flow through the inlet conduits 1 ! 4, 1 2 0, 1 2 8 and then along the inner sidewalls of the reservoirs 1 1 2, 1 18, 1 30. In a preferred embodiment, the inlet conduits 1 1 4, 1 2 0, 1 2 8 are such that the photoresist exiting the inlet conduits 1 1 4, 1 2 0, 1 2 8 is along the reservoir ii 2 The inner side wall of 1 1 8 and 1 30 is flowing. Figure 2A shows the storage of a piano in accordance with a preferred embodiment of the present invention.

8243twfl.ptc Page 15 1284349 ___ Case No. 91135006_Year Month Day Chromium, Next _ V. Invention Description (11) Detailed diagram. It is to be noted that the first reservoir 1 1 2 is identical to the second reservoir 1 18 (please refer to Fig. 1), and the features of the present invention are illustrated by the first reservoir 丨丨2. Unless otherwise indicated, each characterization relating to the first reservoir 112 is equally applicable to the second reservoir 丨丨8 and is applicable to any number of reservoirs included in other embodiments of the invention. . The first reservoir 112 shown in Fig. 2A includes an inlet duct 114, a vacuum inlet duct 113, an outlet duct 115, and an inner wall surface 117. The vacuum inlet guide tube 1 1 3 is connected to the first vacuum pump 丨 2 2 (please refer to Fig. 1), and the vacuum pump I 2 2 is vacuumed by the first reservoir 1 1 2 . The inlet duct 1 1 4 is such that the light exiting the inlet duct 1 1 4 contacts the inner side wall 1 1 7 at the position 1 1 9 and then flows along the inner side wall 1 17 . Unlike conventional photoresist supply systems, conventional systems are placed under a positive pressure, usually formed by nitrogen, and then the photoresist is dropped from the inlet to the bottom of the reservoir by simple gravity. In a preferred embodiment, the inlet conduit 4 is such that the photoresist exiting the inlet conduit 4 will flow along the inner sidewall 117 of the first reservoir 112. In a preferred embodiment, the ' photoresist is in contact with the inner sidewall 11 7 at position 1 1 9 . When the photoresist flows through the inlet conduit 1 14 , the photoresist will reach the first reservoir 112 and along the inner sidewall 117 to collect in the first reservoir 112. The second ? map is not the first reservoir 112 of Fig. 2A, wherein the photoresist 121 is a detailed schematic view of the first reservoir 1 1 2 in accordance with the preferred embodiment of the present invention. The position of the nozzle 114 is such that the photoresist 1 2 1 can flow along the inner wall II 7# to eliminate the formation source of the microbubbles. Moreover, since the photoresist does not simply converge the photoresist 121, it is possible to avoid unnecessary entanglement and mixing of the photoresist 121 and to avoid generation of microbubbles. Moreover, in a preferred embodiment

1284349 Case No. 91135006 修正 Amendment 5. In the invention description (12), the inlet conduit 1 14 is disposed at a higher position than the liquid level of the photoresist accumulated in the first reservoir 112. Referring again to Figure 1, in a preferred embodiment of the invention, the ingredient reservoir 130 also includes a ingredient inlet conduit 128 and the ingredient inlet conduit 1 28 is configured to cause the photoresist system to exit the ingredient inlet conduit 1 28 The inner side wall is contacted and then flows along the inner side wall and collects in the ingredient reservoir 130. Inlet conduits that are individually assembled to the first reservoir 1 1 2, the second reservoir 11 8 and the ingredient reservoir 130 are capable of avoiding the generation of microbubbles in individual regions of the photoresist supply system. In a preferred embodiment of the invention, the generation of microbubbles in the photoresist supply system can be eliminated by combining vacuum or negative pressure and reservoir inlet contact locations. As shown in the first, second, and second drawings, a preferred embodiment of the present invention includes a photoresist supply system in which the photoresist supply system includes two vacuum or negative pressure systems, and each vacuum system is There is a reservoir and is connected to a storage bottle. A vacuum pump is coupled to the reservoir for creating a vacuum or negative pressure in the reservoir. This vacuum or negative pressure system is capable of drawing light to prevent the photoresist from entering the reservoir from the storage bottle without generating bubbles. Similarly, the vacuum or negative pressure in the ingredient reservoir causes the photoresist to flow from the selected reservoir through the vial automatic switching valve and into the ingredient reservoir. The photoresist is then pumped from the ingredient reservoir to the dispensing nozzle for photoresist or other resist coating operations. The supplied automatic bottle switching valve is capable of seamlessly changing the supply of the reservoir without disturbing the operation of the system. In another preferred embodiment, one or more vacuum systems are assembled to one or more reservoirs, and the reservoirs are sequentially coupled to one or more storage bottles. Although the present invention has been disclosed above in a preferred embodiment, it is not

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8243 twf1.ptc Page 18 1284349 Case No. 91135006 _η 曰Revisional drawings The following is a part of the present invention and is intended to illustrate a preferred embodiment of the invention, and The description explains the principles of the invention. Figure 1 is a schematic diagram of a photoresist supply system in accordance with a preferred embodiment of the present invention. Figure 2 is a schematic view showing a detail of a reservoir in accordance with a preferred embodiment of the present invention. Fig. 2B is a view showing the reservoir of Fig. 2A, which is not intended to flow in accordance with a preferred embodiment of the present invention. Schematic indication: 1 0 0 : Photoresist supply system 1 1 0, 1 1 6 : Storage bottle 111, 123: Storage bottle outlet 1 1 2, 1 1 8 : Reservoir 1 1 3 : Vacuum pump inlet 1 14 , 120 : inlet conduit 1 1 5, 1 2 5 : reservoir outlet 1 1 7 : reservoir inner side wall 1 1 9 : position 1 2 1 : photoresist 122, 124, 133: vacuum pump 1 2 6 : bottle automatic exchange valve 1 2 8: ingredient inlet conduit 1 3 0 : ingredient reservoir

8243twf1.ptc Page 19 1284349 Case No. 91135006_Year of the month _ Correction Simple description of the diagram 1 3 2 ·Ingredients 豕 1 3 4 : Dosing nozzle iiii 8243twf1.ptc Page 20

Claims (1)

1284349 Case No. 91135006 Rev. 6, Application Patent Range 1. A photoresist supply system comprising: a storage bottle for storing a photoresist material, the storage bottle having an outlet; and a reservoir having a reservoir inlet connected to the storage bottle; and a vacuum pump connected to the reservoir. 2. The photoresist supply system according to claim 1, wherein the storage bottle vacuum pump is a first storage bottle having a first bottle and a first bottle, and the storage device is a first And the first vacuum, the photoresist supply system further comprises: two storage bottles for storing a photoresist material, the second storage bottle, two reservoirs, an inlet, two vacuum pumps, and the second reservoir having a connection And the second vacuum pump is connected to the reservoir. The photoresist supply system of claim 2, further comprising: a bottle auto-change valve, the bottle An automatic switching valve is coupled to an outlet of the first reservoir and an outlet of the second reservoir; and to the bottle and to the second portion, such as a batching reservoir, the ingredient reservoir is via a dispensing inlet conduit An automatic switching valve is coupled; the automatic switching valve is selectively coupled to one of the first reservoir reservoirs. Applying the photoresist supply system described in claim 3, wherein 8243 twf1.ptc Page 21 1284349 Case No. 91135006 曰 Amendment VI. Patent Application Scope The first vacuum pump is attached to the first light storage material by the first storage via the first storage device. a vacuum pump is applied to the first light storage material from the second storage via the second storage device. 6. The inner side wall of the storage reservoir of the first storage device is in the patent application scope. An inner side wall of the storage reservoir of the two reservoirs is provided. A supply of photoresist is provided. A first reservoir is in an empty state, and a photoresist is provided by a second storage empty state. And selectively causing one of the photoresists to flow into the ingredient reservoir. 9. The operation of the reservoir by a vacuum state, as in the scope of the patent application, includes causing a reservoir to generate a vacuum to cause the bottle to The outlet exits the first storage bottle and the reservoir inlet flows into the first reservoir. The photoresist supply system of item 3, wherein the two reservoirs generate a vacuum state such that the outlet of the bottle flows out of the second storage bottle and the reservoir inlet flows into the second reservoir. The photoresist supply system of claim 4, wherein the device inlet is such that the photoresist material is along the photoresist supply system of the first item (5), wherein the device inlet causes the photoresist material to follow the first The second method includes: connecting to a batching reservoir and sucking into the first reservoir by a true storage tank; connecting to the ingredient reservoir and sucking into the second reservoir by using a true storage tank And a reservoir from the first reservoir and the second reservoir. The method for supplying a photoresist according to Item 8, wherein the photoresist is sucked into the first storage tank and the first photoresist is in contact with the first reservoir. 8243twf1.ptc Page 22 1284349 Case No. 91135006 修正 Amendment VI. Patent application scope. The method for supplying a photoresist, the second storage tank sucking into the second method of supplying the photoresist to the second storage device, the storage device and the second storage device thereof, including: From the first reservoir to the first reservoir. Photoresist solution, the first storage bottle 10. The operation of the photoresist by the vacuum in a vacuum state according to item 8 of the patent application, including the photoreceptor connection 11. As claimed in the patent application The operation of selectively controlling the photoresist to flow into the ingredient reservoir from one of the first reservoirs in item 8 controls an automatic switching valve to cause one of the light two reservoirs to flow into the ingredient 1 2 . The resistance supply system comprises a first storage bottle for storing an outlet; a first reservoir connected to the first storage bottle, the first storage having an inlet and an outlet; a first vacuum pump, connecting To the first reservoir; a second storage bottle for storing the photoresist solution, the second storage bottle having an outlet; a second reservoir connected to the second storage bottle, the second reservoir having a An inlet and an outlet; a second reservoir; the first reservoir and the second stock reservoir have a compound into a second vacuum pump, coupled to the first ingredient reservoir for storing the light received by the reservoir Resistive solution And the v; 8243twf1.ptc Page 23 1284349 _ Case No. 91135006_ Year Month _ Amendment _ VI. Patent application scope A bottle auto-change valve, the outlet connected to the first reservoir, the second storage The outlet of the device and the ingredient inlet, a dosing pump, is coupled to the ingredient reservoir; and a dispensing nozzle coupled to the batching pump to dose the photoresist solution to a surface of a substrate. 1. The photoresist supply system of claim 1, wherein the inlet of the first reservoir causes the photoresist solution to flow along an inner sidewall of the first reservoir. The photoresist supply system of claim 12, wherein the inlet of the second reservoir causes the photoresist solution to flow along an inner sidewall of the second reservoir. The photoresist supply system of claim 12, wherein the ingredient inlet causes the photoresist solution to flow along an inner side wall of the ingredient reservoir. 8243twf1.ptc Page 24 1284349 A photoresist supply system includes a storage tank and a storage tank connected to the reservoir. I have been going to be far away from $^ = state, and the reservoir is vacuumed! To absorb; the storage bottle] n j = ... into the person to store ^ σ system to make the light flow along the piano = ^. The photoresist exits the reservoir and flows into a batch storage system that is pumped to a dispensing nozzle for application to a wafer or substrate. Wu, (1), the representative of the case is ··············································· Bottles 111, 123: storage bottle outlet 1 1 2, 1 1 8 : reservoir 114, 120: inlet conduit 1 1 5, 1 2 5 : reservoir outlet 5, English abstract (invention name: SYSTEM AND METHOD FOR SUPPLYING PHOTORESIST A 。 。 A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A A Into into the reservoir is configured to flow photoresist down an inner wall 8243twf1.ptc Page 2 of 1284349 Correction _MM., ill35006___ Fourth, Chinese side 122, 124, 133: Vacuum 1 2 6 · Bottle automatic exchange valve 1 2 8 : Dosing inlet conduit 1 3 0 : Batching stock 1 3 2 :Ingredients | 1 3 4 : Ingredient Nozzle V. English Abstract (Invention Name: SYSTEM AND METHOD FOR SUPPLYING PHOTORESIST) The photoresist flows out of the reservoir into a delivery reservoir from which the photoresist is pumped to a reserves nozzle for for a wafer or substrate. 8243twf1.ptc Page 3 1284349 _ Case No. 91135006_ Year Month Day Amendment VI. Designation of Representative Figures Page 4 8243twf1.ptc