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TWI276099B - Substrate molding device, disk substrate and substrate molding method - Google Patents

Substrate molding device, disk substrate and substrate molding method Download PDF

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Publication number
TWI276099B
TWI276099B TW93129476A TW93129476A TWI276099B TW I276099 B TWI276099 B TW I276099B TW 93129476 A TW93129476 A TW 93129476A TW 93129476 A TW93129476 A TW 93129476A TW I276099 B TWI276099 B TW I276099B
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Taiwan
Prior art keywords
separation
mold
substrate
rough surface
impedance
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TW93129476A
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Chinese (zh)
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TW200518088A (en
Inventor
Noboru Koga
Original Assignee
Ricoh Kk
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Publication of TWI276099B publication Critical patent/TWI276099B/en

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Abstract

A molding method is disclosed that is capable of making a molding cycle short while maintaining planarity of a disk substrate molded via a separation process. A separation resisting part having a roughened surface is formed on an inner surface of a mold at a position corresponding to an outer circumference of the disk substrate to be molded. The inner surface of the separation resisting part is roughened by distributing dots, or lines, or their combinations on the inner surface of the mold. The separation resisting part generates a resistance on the outer circumference of the disk substrate when separating the disk substrate from a stamper, and thereby maintaining the planarity of the disk substrate, and improves separation ability of the disk substrate when separating the disk substrate from the mold, thereby reducing the time length of the molding cycle.

Description

1276099 (1) 九、發明說明 [發明所屬之技術領域】 本發明係關於由合成樹脂塑製之使用來製造光碟的碟 形基板、用於形成碟形基板的模裝置及塑製此基板的方法 [先前技術】 通常’使用於製造光碟之碟形基板係藉由使用注入塑 製裝置由諸如聚碳酸酯樹脂的合成樹脂形成。注入塑製裝 置包括固定模及可移動模,其形成符合將被塑製的碟形基 板之凹穴。例如,在界定凹穴的固定模的表面上,符合其 它資訊信號的音樂信號之凸出及凹入圖案被形成,且,這 係所謂的打印器,其係使用來形成構成代表想要的資訊信 號的軌跡之坑或預製紋。在可移動模的側上,打孔器係用 來在凸出中央部穿鑿用來鎖固中央構件的孔。 當使用此種模裝置而塑製碟形基板時,熔融合成樹脂 係經由配置在固定模上的澆注套管注入口而注入以充塡凹 穴。然而,在塑製碟形基板於凹穴之後,打孔器被移動以 在中央部穿鑿用剌鎖固中央構件的孔,然而,坑或預製紋 被形成在碟形基板的主表面上。 有關此種碟形基板模裝置,例如,日本專利公報第 0 3 3 0 1 1 0 3號揭示一發明,其中,在可移動模的側上,由 沿著可移動模的圚周方向形成的點狀凸出及孔或環狀凸出 及凹槽所造成之分離阻抗被提供在碟形基板的外表面上或 -4- (2) 1276099 在位在中央的凸出的內表面上。 於上述日本專利公報第 0 3 3 0 1 1 0 3號所示的本發明中 ,所塑製的碟形基板係容易且可靠地自打印器(這是所謂 的w第一分離〃)而分離。碟形基板係由打印器塑製,打 印器具有用於形成坑或預製紋之凸出及凹入圖案作爲記錄 軌跡。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a disk-shaped substrate for manufacturing an optical disk by using a synthetic resin, a molding apparatus for forming a disk-shaped substrate, and a method of molding the same. [Prior Art] Generally, a dish-shaped substrate used for manufacturing an optical disk is formed of a synthetic resin such as a polycarbonate resin by using an injection molding apparatus. The injection molding apparatus includes a fixed mold and a movable mold which form a recess conforming to the dish-shaped substrate to be molded. For example, on the surface of the fixed mold defining the recess, a convex and concave pattern of the music signal conforming to other information signals is formed, and this is a so-called printer which is used to form a representative information desired. A pit or pre-pattern of the track of the signal. On the side of the movable mold, a punch is used to pierce the hole for locking the central member at the center of the projection. When the disk substrate is molded using such a mold device, the molten synthetic resin is injected to fill the cavity via the pouring sleeve injection port disposed on the fixed mold. However, after the disc substrate is molded into the recess, the punch is moved to pierce the hole for locking the central member at the center portion, however, pits or pre-forms are formed on the main surface of the disc substrate. With respect to such a disk-shaped substrate mold device, for example, Japanese Patent Laid-Open Publication No. 0 3 0 0 1 0 No. 3 discloses an invention in which the side of the movable mold is formed by the circumferential direction of the movable mold. The point-like projections and the separation resistance caused by the holes or the annular projections and the grooves are provided on the outer surface of the disk substrate or on the convex inner surface of the -4- (2) 1276099 in the center. In the invention shown in the above Japanese Patent Publication No. 0 3 0 1 1 0 3, the molded disk-shaped substrate is easily and reliably separated from the printer (this is a so-called w first separation crucible). . The dish substrate is molded by a printer having a convex and concave pattern for forming pits or pre-patterns as a recording track.

然而,如果想要縮短塑製周期的時間長短,在碟形基 板自打印器分離的步驟之後,且當自可移動模分離碟形基 板時(這是所謂的 ''第二分離〃),由沿著可移動模的圓 周方向形成的點狀凸出及孔或環狀凸出及凹槽所造成之分 離阻抗增大,且,碟形基板不能容易地自可移動模而分離 。因此,如上所知’碟形基板的平面度傾斜;並且,諸如 振動、圓周傾斜及徑向傾斜的機械特性傾斜;所得到的碟 形基板不可能使用來製造光碟。特別地,近來且在持續中 ’諸如DVD+R/RW的DVD碟係廣泛使用,DVD碟需 要(¾速記錄。爲了達到告速記錄,碟形基板的平面度係重 要的,且,具有以上問題的碟形基板係不適合的。 也就是說,於上述的日本專利公報第 0 3 3 0 1 1 0 3號所 示的本發明中,存在有由於分離阻抗部件而對於碟形基板 自打印器的分離之阻抗,且,此發明不能夠縮短塑製周期 的時間長短,然而,僅注重於自打印器分離碟形基板的性 能(第一分離)。 【發明內容】 1276099 (3) 本發明的一般目的在於解決相關技術的一或更多問題 〇 本發明的特定目的在於提供能夠縮短塑製周期的時間 長短同時保持經由分離過程塑製的碟形基板的平面度之方 法。 依據本發明的第一形態提供一種用於由合成樹脂形成 碟形基板之模裝置,其包括:固定模;及可移動模,該可 移動模及固定模形成塑製的碟形基板於其中之凹穴,其中 具有粗糙表面的分離阻抗部件係設在符合碟形基板的外周 表面之固定模及可移動模的至少一者的內表面上,碟形基 板係固持在固定模及可移動模的一者上。 於本發明中,具有粗糙表面的分離阻抗部件係設在符 合碟形基板的外周表面之固定模或可移動模的內表面上。 當自打印器分離由充塡凹穴的合成樹脂形成之碟形基板時 ,分離阻抗部件產生阻抗在碟形基板的外周上,打印器作 用如凹穴的側表面,藉此,當自打印器分離碟形基板時, 保持碟形基板的平面度。當自模裝置分離碟形基板時,分 離阻抗部件改善碟形基板的外周表面的分離能力。結果, 甚至當塑製周期的時間長短爲控向塑製而縮短時,碟形基 板可自模裝置而分離同時保持碟形基板的平面度。 相較之下,上述的日本專利公報第0 3 3 0 1 1 0 3號中的 分離阻抗部件在自打印器分離碟形基板時,僅產生阻抗在 碟形基板的外周上。 作爲實施例,分離阻抗部件的粗糙表面具有數個點狀 -6 - (4) 1276099 凸出或點狀凹入,或數個線狀凸出或線狀凹入,或點狀及 線狀凸出或凹入的組合分佈在其上。 作爲實施例,分離阻抗部件的粗糙表面具有不小於 1 8 mm2的阻抗產生面積;及分離阻抗部件的粗糙表面包 括至少兩列的凸出或凹入於拉出塑製的碟形基板的方向, 且,每一凸出或凹入的深度係在3em至90//m的範圍。 更佳地,分離阻抗部件的粗糙表面上之每一凸出或凹入的 深度係在3//m至20//m的範圍。 作爲實施例,分離阻抗部件的粗糙表面係藉由粗糙化 處理形成在固定模及可移動模的至少一者的內表面上。較 佳地,粗糙化處理包括 WP C (寬鎚擊及淸潔)處理、珠 噴砂處理、噴珠壓處理、微凹處理、由使用具有精細粗表 面的切刀之切削或拋光、及由使用能夠粗糙化金屬表面的 化學元素或溶液之處理。 依據本發明的第二形態,提供一種由使用模裝置由合 成樹脂形成之碟形基板,包括:外周表面,其藉由具有模 裝置的粗糙表面之分離阻抗部件而粗糙化,分離阻抗部件 具有粗糙表面。 依據本發明的第三形態,提供一種藉由使用包括固定 模及可移動模的模裝置而塑製碟形基板的方法,該方法包 括以下步驟:以合成樹脂充塡塑製凹穴,該塑製凹穴係由 固定模及可移動模所形成且具有使用於轉移的打印器作爲 其側表面,該塑製凹穴包括配置在符合碟形基板的外周表 面之固定模及可移動模的至少一者的內表面上之分離阻抗 -7- (5) 1276099 部件,該分離阻抗部件具有粗糙表面;自打印器分離由合 成樹脂形成之碟形基板於凹穴中;及自模裝置分離碟形基 板。 於充塡凹穴的步驟中,模裝置包括配置在符合碟形基 板的外周表面之固定模及可移動模的至少一者的內表面上 之分離阻抗部件,且,分離阻抗部件具有粗糙表面。However, if it is desired to shorten the length of the plastic cycle, after the step of separating the disk substrate from the printer, and when separating the disk substrate from the movable mold (this is the so-called 'second separation 〃), The separation resistance caused by the dot-like projections and the holes or the annular projections and the grooves formed along the circumferential direction of the movable mold is increased, and the dish substrate cannot be easily separated from the movable mold. Therefore, as described above, the flatness of the dish substrate is inclined; and mechanical characteristics such as vibration, circumferential tilt, and radial tilt are inclined; the resulting disc substrate cannot be used to manufacture a disc. In particular, recent and ongoing DVDs such as DVD+R/RW are widely used, and DVD discs require (3⁄4 speed recording. In order to achieve speed recording, the flatness of the disc substrate is important, and has the above The problem of the dish-shaped substrate is not suitable. In other words, in the invention shown in the above-mentioned Japanese Patent Publication No. 0 3 0 0 1 0 3, there is a disc-shaped substrate self-printer due to separation of the impedance member. The impedance of the separation, and the invention cannot shorten the length of the plastic cycle, however, it only focuses on the performance (first separation) of separating the disk substrate from the printer. [Summary of the Invention] 1276099 (3) The present invention A general object is to solve one or more problems of the related art. A specific object of the present invention is to provide a method capable of shortening the length of a plastic cycle while maintaining the flatness of a disk-shaped substrate molded via a separation process. An embodiment provides a molding apparatus for forming a disk-shaped substrate from a synthetic resin, comprising: a fixed mold; and a movable mold, the movable mold and the fixed mold forming a plastic dish a cavity in which the substrate is formed, wherein the separation resistance member having a rough surface is disposed on an inner surface of at least one of the fixed mold and the movable mold conforming to the outer peripheral surface of the disk substrate, and the dish substrate is held in the fixed mold And in one of the movable molds. In the present invention, the separation resistance member having a rough surface is provided on the inner surface of the fixed mold or the movable mold which conforms to the outer peripheral surface of the disk substrate. When the synthetic resin of the cavity is formed into a disk-shaped substrate, the separation resistance member generates an impedance on the outer circumference of the disk substrate, and the printer functions as a side surface of the cavity, thereby maintaining the separation of the disk substrate from the printer. The flatness of the dish substrate. When the disc substrate is separated by the mold device, the separation of the impedance member improves the separation ability of the outer peripheral surface of the disc substrate. As a result, even when the length of the plastic period is shortened for the control plastic molding, The disk-shaped substrate can be separated from the mold device while maintaining the flatness of the disk-shaped substrate. In contrast, the above-mentioned Japanese Patent Publication No. 0 3 3 0 1 1 3, the separation impedance portion When the disk substrate is separated from the printer, only the impedance is generated on the outer circumference of the disk substrate. As an embodiment, the rough surface of the separation impedance member has a plurality of dots -6 - (4) 1276099 convex or dot-like concave , or a plurality of linear protrusions or linear recesses, or a combination of dot-like and linear protrusions or recesses are distributed thereon. As an embodiment, the rough surface of the separation impedance component has an impedance of not less than 18 mm 2 . Producing an area; and the rough surface of the separation impedance member includes at least two columns of protrusions or recesses in a direction in which the molded disc substrate is pulled out, and each of the protrusions or recesses has a depth of 3em to 90// More preferably, each of the convex or concave depths on the rough surface of the separation impedance member is in the range of 3/m to 20/m. As an embodiment, the rough surface of the impedance member is separated. Formed on the inner surface of at least one of the fixed mold and the movable mold by roughening. Preferably, the roughening treatment includes WP C (wide hammer and chamfer) treatment, bead blasting treatment, bead blast treatment, dimple treatment, cutting or polishing by using a cutter having a fine rough surface, and use A process that can roughen the chemical elements or solutions on the metal surface. According to a second aspect of the present invention, there is provided a dish-shaped substrate formed of a synthetic resin by using a mold device, comprising: an outer peripheral surface roughened by a separation resistance member having a rough surface of a mold device, the separation resistance member having roughness surface. According to a third aspect of the present invention, there is provided a method of molding a disk substrate by using a mold device including a fixed mold and a movable mold, the method comprising the steps of: filling a plastic cavity with a synthetic resin, the plastic The recess is formed by a fixed mold and a movable mold and has a printer for transfer as a side surface thereof, the plastic recess including at least a fixed mold and a movable mold that conform to an outer peripheral surface of the disc substrate a separation impedance on the inner surface of one - 7 - (5) 1276099 component having a rough surface; separating a disk-shaped substrate formed of synthetic resin from the printer into the cavity; and separating the dish from the mold device Substrate. In the step of filling the pocket, the mold device includes a separation resistance member disposed on an inner surface of at least one of the fixed mold and the movable mold conforming to the outer peripheral surface of the disk-shaped substrate, and the separation resistance member has a rough surface.

作爲實施例,分離阻抗部件的粗糙表面包括數個點狀 凸出或點狀凹入,或數個線狀凸出或線狀凹入,或點狀及 線狀凸出或凹入的組合分佈在分離阻抗部件的表面上。 作爲實施例,分離阻抗部件的粗糙表面包括不小於 1 8 mm2的阻抗產生面積;及分離阻抗部件的粗糙表面包括 至少兩列的凸出或凹入於拉出塑製的碟形基板的方向,且 ,每一凸出或凹入的深度係在3//m至90//m的範圍。較 佳地,分離阻抗部件的粗糙表面上之每一凸出或凹入的深 度係在3 // m至2 0 // m的範圍。As an embodiment, the rough surface of the separation impedance component includes a plurality of point-like protrusions or point-like recesses, or a plurality of linear protrusions or linear recesses, or a combined distribution of points and linear protrusions or depressions. On the surface of the separation impedance component. As an embodiment, the rough surface of the separation impedance component includes an impedance generation area of not less than 18 mm 2 ; and the rough surface of the separation impedance component includes at least two columns of protrusions or recesses in a direction in which the plastic disk substrate is pulled out, Also, each of the convex or concave depths is in the range of 3/m to 90/m. Preferably, each of the convex or concave depths on the rough surface of the separation resistive member is in the range of 3 // m to 2 0 // m.

經由較佳實施例的以下詳細說明以及參考附圖,本發 明的這些及其它目的、特徵及優點將係更顯而易見。 [實施方式】 以下,參考附圖解說本發明的較佳實施例。 以下,說明用於形成使用於諸如DVD相關碟(DVD + R或其它類似物)的光碟製造的碟形基板之模裝置、及 藉由使用模裝置塑製碟形基板的方法作爲實例。 圖1 A及1 B係依據本發明的實施例用於形成碟形基 (6) 1276099 板之模裝置3的實例結構的側橫截面圖,其中圖1 a顯示 模裝置的開啓狀悲’而’圖1 B係模裝置的關閉狀態。 如圖1 A所示,模裝置包括固定模1及可移動模2, 可移動模2係藉由液壓機構(未顯示)而可移動地支撐, 且能夠移動於朝向固定模1接近及移離固定模1之方向。 在固定模1及可移動模2之間,形成有塑製的碟形基板4 之凹穴5。 在固定模1的側上,澆注套管6係設在凹穴5的中央 ,供應自注入模製裝置(未顯示)之諸如熔融聚碳酸酯樹 脂的合成樹脂流過澆注套管6。在澆注套管6的中央,有 用於注入樹脂的噴嘴6 a,且,供應自注入模製裝置之合 成樹脂係經由噴嘴6a而注入凹穴5。 托架(未顯示)係設置在澆注套管6的外周附近,內 側打印器支座(未顯示)係裝入托架以支撐打印器7 (下 述)的內側。 打印器7係安裝在界定凹穴5之固定模1的表面上, 打印器7係用於塑製符合記錄在光碟上的資訊信號之凸出 及凹入圖案,凸出及凹入圖案包括構成光碟的信號記錄區 上的記錄軌跡之坑或預製紋。打印器7的中央孔的內周係 由內側打印器支座(未顯示)所支撐,內側打印器支座係 裝入托架(未顯示),而,打印器7的中央孔的外周係藉 由來自吸入口(未顯示)的空氣的吸入而固定。 凹部9係設在界定凹穴5之可移動模2的表面的中央 與固疋模1 一起形成凸出部在碟形基板4的另一主表面上 -9- 1276099 (7) 。在凹部9的中央,衝孔機構1 0係用來穿鑿用於鎖固集 中構件在凸出部的中央之孔。衝孔機構1 0係配置於可移 動模2,且係可移動於套筒11中。噴射器14係由套筒11 所支撐的而能夠相對於可移動模2移動,以在塑製之後使 其突出及分離碟形基板4。 凹穴環12係設在可移動模2的外表面上,凹穴環12 界定凹穴5,且塑製將被塑製的碟形基板4的外周。凹穴 環1 2的前端表面作用如平坦撞擊表面,且係配置以能夠 接觸附接至固定模1的打印器7的周圍。當可移動模2被 移動而與固定模1作接觸以使模裝置3處於封閉狀態時, 如圖1 B所示,平坦撞擊表面被帶入與打印器7接觸以形 成封閉的凹穴5。 可移動模2的塑製表面係用來形成碟形基板4的另一 主表面,其係作用如碟形基板4的雷射光束入射表面之精 確平坦表面。因此,可移動模2的塑製表面亦爲精確平坦 表面,例如,鏡表面1 3。 在碟形基板4被塑製之後,且當可移動模2移離固定 模1時(第一分離),碟形基板4被固持在可移動模2的 側上,然後,可移動模2中的噴射器1 4被突出以自可移 動模2而分離碟形基板4(第二分離)。 以模裝置3的以上基本結構,當塑製碟形基板4時, 可移動模2係移動且帶入與固定模1接觸,且,模裝置3 處於封閉狀態,如圖1B所示。於此狀態中,供應自注入 模製裝置之諸如熔融聚碳酸酯樹脂的合成樹脂係經由噴嘴 -10 - 1276099 (8) 6 a而注入凹穴5。然後,衝孔機構1 0被移動以穿鑿用於 鎖固集中構件在碟形基板的凸出部的中央之孔。其後,可 移動模2朝向固定模1進一步移動以壓縮充塡夾緊用的凹 穴5之合成樹脂。因此,符合凹穴5的碟形基板4被塑製 〇 在碟形基板4被塑製之後,可移動模2移離固定模1 (第一分離),且因此,碟形基板4自打印器7而分離。 在此時,碟形基板4係固持在可移動模2的側上。接著, 可移動模2中的噴射器I4被突出以自可移動模2而分離 碟形基板4 (第二分離)。 於本實施例中,具有粗糙表面之分離阻抗部件1 5係 形成在符合碟形基板4的外周之凹穴環1 2的內表面上。 分離阻抗部件1 5的內.表面係藉由分佈點或線或其組合在 凹穴環1 2的內表面上之粗糙化,尤其是,藉由散佈小點 狀凸出及凹入在凹穴環12的內表面上,或散佈或相互交 叉之凸出及凹入線在凹穴環12的內表面上,或其組合。 例如,分離阻抗部件1 5具有1 8 m m2或更高的面積的 粗糙表面以產生阻抗於拉出碟形基板4的方向,且,粗糙 度的尺寸係3//m至90//m。 當自打印器7分離以充塡凹穴5的合成樹脂形成之碟 形基板4時,分離阻抗部件1 5產生阻抗在碟形基板4的 外周’且’當自可移動模2分離碟形基板4時,顯示碟形 基板4的外周的分離能力。 藉由設置分離阻抗部件1 5在凹穴環1 2的內表面上, -11 - 1276099 (9)These and other objects, features and advantages of the present invention will become more apparent from the <RTIgt; [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Hereinafter, a mold device for forming a disk-shaped substrate for use in manufacturing a disc such as a DVD-related disc (DVD + R or the like), and a method of molding a disc-shaped substrate by using a mold device will be described as an example. 1A and 1B are side cross-sectional views showing an example structure of a molding apparatus 3 for forming a dish-shaped base (6) 1276099 panel according to an embodiment of the present invention, wherein FIG. 1a shows the opening of the mold apparatus. 'Fig. 1 The closed state of the B-mode device. As shown in FIG. 1A, the mold device includes a fixed mold 1 and a movable mold 2, and the movable mold 2 is movably supported by a hydraulic mechanism (not shown), and is movable to approach and move away from the fixed mold 1. The direction of the fixed die 1. Between the fixed mold 1 and the movable mold 2, a recess 5 of the plastic disk substrate 4 is formed. On the side of the fixed mold 1, a casting sleeve 6 is provided in the center of the pocket 5, and a synthetic resin such as molten polycarbonate resin supplied from an injection molding apparatus (not shown) flows through the casting sleeve 6. In the center of the casting sleeve 6, there is a nozzle 6a for injecting resin, and the synthetic resin supplied from the injection molding apparatus is injected into the pocket 5 via the nozzle 6a. A bracket (not shown) is provided near the outer circumference of the casting sleeve 6, and an inner printer holder (not shown) is fitted into the bracket to support the inside of the printer 7 (described below). The printer 7 is mounted on the surface of the fixed mold 1 defining the pocket 5, and the printer 7 is used to mold the convex and concave patterns conforming to the information signals recorded on the optical disc, and the convex and concave patterns include the composition. A pit or pre-print of a recording track on a signal recording area of a disc. The inner circumference of the central opening of the printer 7 is supported by an inner printer holder (not shown), and the inner printer holder is fitted into a bracket (not shown), and the outer periphery of the central opening of the printer 7 is borrowed. It is fixed by the inhalation of air from a suction port (not shown). The recess 9 is provided at the center of the surface of the movable die 2 defining the recess 5 together with the solid mold 1 to form a projection on the other main surface of the disk substrate 4 -9 - 1276099 (7). In the center of the recess 9, the punching mechanism 10 is used to pierce the hole for locking the centering member in the center of the projection. The punching mechanism 10 is disposed in the movable mold 2 and is movable in the sleeve 11. The ejector 14 is supported by the sleeve 11 to be movable relative to the movable die 2 to protrude and separate the disk substrate 4 after molding. A pocket ring 12 is provided on the outer surface of the movable die 2, the pocket ring 12 defines a pocket 5, and the outer circumference of the disk-shaped substrate 4 to be molded is molded. The front end surface of the pocket ring 12 acts as a flat impact surface and is configured to be capable of contacting the periphery of the printer 7 attached to the fixed mold 1. When the movable mold 2 is moved to come into contact with the fixed mold 1 to bring the mold unit 3 into a closed state, as shown in Fig. 1B, the flat impact surface is brought into contact with the printer 7 to form a closed recess 5. The plastic surface of the movable mold 2 is used to form the other main surface of the disk substrate 4, which functions as a precise flat surface of the incident surface of the laser beam of the disk substrate 4. Therefore, the plastic surface of the movable mold 2 is also a precisely flat surface, for example, the mirror surface 13. After the dish substrate 4 is molded, and when the movable mold 2 is moved away from the fixed mold 1 (first separation), the dish substrate 4 is held on the side of the movable mold 2, and then, in the movable mold 2 The injector 14 is protruded to separate the disk substrate 4 (second separation) from the movable mold 2. With the above basic structure of the mold device 3, when the disk-shaped substrate 4 is molded, the movable mold 2 is moved and brought into contact with the fixed mold 1, and the mold device 3 is in a closed state as shown in Fig. 1B. In this state, a synthetic resin such as a molten polycarbonate resin supplied from the injection molding apparatus is injected into the pocket 5 via the nozzle -10 - 1276099 (8) 6 a. Then, the punching mechanism 10 is moved to pierce the hole for locking the centering member at the center of the projection of the disk substrate. Thereafter, the movable mold 2 is further moved toward the fixed mold 1 to compress the synthetic resin of the recess 5 for filling. Therefore, the dish substrate 4 conforming to the pocket 5 is molded, and after the dish substrate 4 is molded, the movable mold 2 is moved away from the fixed mold 1 (first separation), and therefore, the dish substrate 4 is self-printing. 7 and separated. At this time, the dish substrate 4 is held on the side of the movable mold 2. Next, the ejector I4 in the movable mold 2 is protruded to separate the disk substrate 4 (second separation) from the movable mold 2. In the present embodiment, the separation resistance member 15 having a rough surface is formed on the inner surface of the pocket ring 12 which conforms to the outer circumference of the disk substrate 4. The inner surface of the separation resistive member 15 is roughened on the inner surface of the pocket ring 12 by a distribution point or line or a combination thereof, in particular, by scattering small dots and recesses in the recess. The inner surface of the ring 12, or the convex and concave lines that are interspersed or intersect each other, are on the inner surface of the pocket ring 12, or a combination thereof. For example, the separation resistance member 15 has a rough surface of an area of 18 m 2 or more to generate a direction in which the impedance is drawn out of the disk substrate 4, and the size of the roughness is 3//m to 90//m. When the disc-shaped substrate 4 formed of the synthetic resin filled with the recess 5 is separated from the printer 7, the separation resistive member 15 generates an impedance at the outer periphery of the disc substrate 4 and 'when the disc substrate is separated from the movable mold 2 At 4 o'clock, the separation ability of the outer circumference of the disk substrate 4 is shown. By providing the separation impedance member 15 on the inner surface of the pocket ring 12, -11 - 1276099 (9)

當塑製碟形基板4時,碟形基板4的外周被粗糙化以產生 符合分離阻抗部件1 5的粗糙之粗糙部4 a。然後,當自打 印器7分離所塑製的碟形基板4時,分離阻抗部件1 5產 生阻抗在碟形基板4的外周的粗糙部4 a以保持碟形基板 4被固持在可移動模2的狀態。藉此,碟形基板4可靠地 自打印器7分離,而無垂直振動、周圍傾斜及徑向傾斜特 性的偏差,因此,充份地保持高平面度,且因此,合成碟 形基板可靠地轉移至可移動模2 (第一分離)。 更者,當自可移動模2分離碟形基板4 (第二分離) 時,因爲分離阻抗部件1 5的粗糙度顯示自碟形基板4的 外周的粗糙部4a分離之能力,即使碟形基板4收縮的時 間不是如此長,換言之,即使塑製周期的時間長短爲快速 塑製而縮短,碟形基板4可以碟形基板4的外端表面未被 凹穴環12阻礙而容易分離,且充份地保持高平面度。When the disk substrate 4 is molded, the outer periphery of the disk substrate 4 is roughened to produce a rough portion 4a conforming to the roughness of the separation resistance member 15. Then, when the molded disk substrate 4 is separated from the printer 7, the separation resisting member 15 generates a rough portion 4a having an impedance on the outer periphery of the disk substrate 4 to keep the disk substrate 4 held by the movable die 2 status. Thereby, the dish substrate 4 is reliably separated from the printer 7 without variations in vertical vibration, peripheral tilt, and radial tilt characteristics, thereby sufficiently maintaining high flatness, and thus, the synthetic disc substrate is reliably transferred. To movable mode 2 (first separation). Furthermore, when the disc substrate 4 is separated from the movable mold 2 (second separation), since the roughness of the separation resistance member 15 shows the ability to separate from the rough portion 4a of the outer circumference of the disc substrate 4, even the dish substrate 4 The contraction time is not so long, in other words, even if the length of the plastic cycle is shortened by rapid plastic molding, the disk substrate 4 can be easily separated by the outer end surface of the disk substrate 4 without being trapped by the pocket ring 12, and charged. Maintain a high degree of flatness.

應注意到,雖然粗糙部4a係形成在符合分離阻抗部 件1 5之碟形基板4的外端表面上,因爲資訊信號未記錄 在碟形基板4的外端表面上,粗糙部4 a不會影響碟形基 板上的信號記錄區。 如以上所述,雖然打印器7係安裝在固定模1上且衝 孔機構1 0係配置在可移動模2上,相反方式的配置亦可 被採用。 以下,製造分離阻抗部件1 5的方法及分離阻抗部件 1 5的粗糙度的定量特性係相較於相關技術而說明。 爲必較的目的,第1、2及3的模樣本係依據前述的 -12- 1276099 (10) 日本專利公報第0 3 3 0 1 1 0 3號而製作,而第4及5的模樣 本係依據本實施例製作。這些模樣本的特性摘要於圖2中 的表中。. 圖2係顯示用於解說本實施例的分離阻抗部件1 5之 樣本的特性與相關技術的比較表。 圖3係顯示本實施例的分離阻抗部件1 5的形狀及特 性値與相關技術的比較表。 如圖2中的表所示,於第一樣本中,24個各具有〇.2 X 0 . 2 m m2的面積的方形凹入係沿著凹穴環的圓周以一列 的方式均勻地配置在凹穴環的內表面上。凹入的總長度沿 著凹穴環的圓周共計4.8 mm,且,凹入的深度b係0.2 mm ,因此有助於阻抗的產生之凹入的總面積(以下稱爲 ''阻 抗面積〃)共計〇.96mm2。 於第二樣本中,具有〇 · 1 X 〇 . i m m方形橫截面的環形 凹入(參考圖3 )係沿著凹穴環的圓周而形成在凹穴環的 內表面上’環形凹入的長度沿著凹穴環的圓周係 3 76.99mm ’且,凹入的深度b係〇.lmm,因此有助於阻 抗的產生之環形凹入的總面積(亦即,阻抗面積)共計 3 7.7 0mm2。 於第三樣本中,具有0.05 x 〇.05 min方形橫截面的環 形凹入(參考圖3 )係沿著凹穴環的圓周而形成在凹穴環 的內表面上’環形凹入的長度沿著凹穴環的圓周係 3 76.9 9mm,且,凹入的深度b係〇.〇5mm,因此有助於阻 抗的產生之環形凹入的總面積(亦即,阻抗面積)共計 -13- 1276099 (11) 18.85mm2。 於第四樣本中,作爲分離阻抗部件1 5,凹穴環1 2的 整個內表面係沿著凹穴環1 2的圓周而粗糙化,且,粗糙 表面的粗糙度(凸出或凹入部的平均深度)係〇 . 0 2 0 mm。 分離阻抗部件 15的長度沿著凹穴環 12的圓周係 376.99mm,凸出或凹入部的平均深度b係0.02mm,且, 沿著拉出碟形基板4的方向有十二列凸出或凹入部;因此 ,分離阻抗部件1 5的粗糙表面的總面積(亦即,阻抗面 積)共計 45.24mm2。 於第五樣本中,作爲分離阻抗部件1 5,凹穴環1 2的 整個內表面係沿著凹穴環12的圓周而粗糙化(參考圖3 ),且,粗糙表面的粗糙度(凸出或凹入部的平均深度) 係0.0 120mm。分離阻抗部件1 5的長度沿著凹穴環12的 圓周係 3 76.9 9mm,凸出或凹入部的平均深度 b係 0.0 12mm,且,沿著拉出碟形基板4的方向約有十三列凸 出或凹入部;因此,分離阻抗部件1 5的粗糙表面的總面 積(亦即,阻抗面積)共計29.41mm2。 當估計第四樣本及第五樣本的阻抗面積時,因爲凹穴 環1 2的內表面上之每一凹入部的橫截面可約等於三角形 ,每一凹入部的阻抗面積d係藉由使用公式d= (axb) / 2xc而計算。 上述的表面粗糕係藉由使用Form Taly-Surf S6表面 粗縫度測量儀器(由T a y 1 〇 r Η 〇 b s ο η製造)所量測的。 圖4Α及4Β顯示所量測的表面粗糙度的實例。 -14 - (12) 1276099 圖4 A及4B顯示分離阻抗部件1 5的樣本位置的表面 粗糙,而圖4A所示的資料係藉由每3mm作一量測而獲得 ,然而,圖4 B所示的資料係爲了以圖形更淸楚地顯示表 面粗糙藉由每1mm作一量測而獲得。第四樣本及第五樣 本中的列數(顯示於圖2中的表)係藉由假設碟形基板的 厚度爲了 〇.6mm之計算在實際量測圖形上而獲得。 以下,基於第五樣本的以上結果,評估被製作在樣本 及塑製周期的時間之間的關係上,以及在樣本的機械特性 上。至於機械特性的評估,如圖3所示,塑製周期的時間 長短、周圍軸向加速、周圍徑向傾斜及周圍圓周傾斜被量 測,且,機械特性係基於這些量測値而評估。 在此, ''周圍徑向傾斜〃以角度表示碟形基板於徑向 的彎曲。小値的周圍徑向傾斜係較佳的,因爲如果周圍徑 向傾斜變太大時,其影響獲自以標的基板製造的光碟之推 拉信號(p u s h - p U 11 s i g n a 1 )的偏移及振幅。 ''周圍圓周傾斜〃以角度表示碟形基板於圓周的彎曲 。同樣地,小値的周圍圓周傾斜係較佳的。 ''周圍軸向加速〃表示當旋轉速度係16Hz ( 9 6 0rpm 、CAV控制)時記錄層於垂直至參考平面的方向的加速 。如果周圍軸向加速由於碟表面的不勻度變太大,聚焦伺 服或跟蹤伺服的響應性能、跟蹤性能及穩定性可能影響到 以標的基板製造之光碟。 最近且正在持續中,於需要高速記錄之DVD碟,與 周圍軸向加速有關的品質正吸引漸增的注意力。例如,依 -15- 1276099 (13) 據梧皮書(Orange Book)。於DVD+R/RW中,殘留聚 焦/追蹤誤差被界定;此値轉換成周圍軸向加速,其結果 是,小於2 . 1 m / s2的周圍軸向加速是必要的。於本實施 例中,當周圍軸向加速係小於2 . 1 m / s2時,機械特性被 評估爲良好。 至於'\塑製周期的時間長短〃,目標値係設在5 · 5秒It should be noted that although the rough portion 4a is formed on the outer end surface of the dish substrate 4 conforming to the separation resistance member 15, since the information signal is not recorded on the outer end surface of the dish substrate 4, the roughness portion 4a does not Affects the signal recording area on the dish substrate. As described above, although the printer 7 is mounted on the fixed mold 1 and the punching mechanism 10 is disposed on the movable mold 2, an arrangement of the opposite manner can also be employed. Hereinafter, the method of manufacturing the separation impedance member 15 and the quantitative characteristic of the roughness of the separation impedance member 15 will be described with respect to the related art. For the purpose of comparison, the mold samples of Nos. 1, 2, and 3 are produced in accordance with the above-mentioned Japanese Patent Publication No. 0-13060099 (10), and the mold samples of the fourth and fifth. It is made according to this embodiment. The characteristics of these mode samples are summarized in the table in Figure 2. Fig. 2 is a comparison table showing the characteristics of the sample of the separation impedance member 15 of the present embodiment and the related art. Fig. 3 is a comparison table showing the shape and characteristics of the separation impedance member 15 of the present embodiment and related art. As shown in the table in Fig. 2, in the first sample, 24 square recesses each having an area of 〇.2 X 0 . 2 m m2 are uniformly arranged in a row along the circumference of the pocket ring. On the inner surface of the pocket ring. The total length of the recess is 4.8 mm along the circumference of the pocket ring, and the depth b of the recess is 0.2 mm, thus contributing to the total area of the recessed by the impedance (hereinafter referred to as ''impedance area 〃) A total of 96.96mm2. In the second sample, an annular recess having a square cross section of 〇·1 X 〇. imm (refer to Fig. 3) is formed on the inner surface of the pocket ring along the circumference of the pocket ring. Along the circumference of the pocket ring is 3 76.99 mm 'and the depth of the recess b is 〇.lmm, so the total area of the annular recess (i.e., the impedance area) contributing to the generation of the impedance is 3 7.7 0 mm 2 . In the third sample, an annular recess having a square cross section of 0.05 x 〇.05 min (refer to Fig. 3) is formed along the circumference of the pocket ring on the inner surface of the pocket ring. The circumference of the pocket ring is 3 76.9 9 mm, and the depth of the recess b is 〇.〇5 mm, so the total area of the annular recess (i.e., the impedance area) contributing to the generation of the impedance is -13 - 1276099 (11) 18.85mm2. In the fourth sample, as the separation resistance member 15, the entire inner surface of the pocket ring 12 is roughened along the circumference of the pocket ring 12, and the roughness of the rough surface (protruding or concave portion) Average depth) 〇. 0 2 0 mm. The length of the separation impedance member 15 is 376.99 mm along the circumference of the pocket ring 12, the average depth b of the protrusion or the recess is 0.02 mm, and there are twelve columns of protrusions in the direction in which the dish substrate 4 is pulled out or The concave portion; therefore, the total area (i.e., the impedance area) of the rough surface of the separation impedance member 15 is 45.24 mm 2 in total. In the fifth sample, as the separation resistance member 15, the entire inner surface of the pocket ring 12 is roughened along the circumference of the pocket ring 12 (refer to FIG. 3), and the roughness of the rough surface (projection) Or the average depth of the recess is 0.0 120 mm. The length of the separation impedance member 15 is along the circumferential system of the pocket ring 12 by 76.9. 9 mm, the average depth b of the projection or the recess is 0.014 mm, and there are about 13 columns along the direction in which the dish substrate 4 is pulled out. The convex or concave portion; therefore, the total area (i.e., the impedance area) of the rough surface of the separation impedance member 15 is 29.41 mm 2 . When estimating the impedance areas of the fourth sample and the fifth sample, since the cross section of each of the concave portions on the inner surface of the pocket ring 12 can be approximately equal to a triangle, the impedance area d of each concave portion is determined by using a formula Calculated by d= (axb) / 2xc. The above surface cake was measured by using a Form Taly-Surf S6 surface rough gauge measuring instrument (manufactured by T a y 1 〇 r Η 〇 b s ο η). Figures 4A and 4B show examples of measured surface roughness. -14 - (12) 1276099 Figures 4A and 4B show the surface roughness of the sample position of the separation impedance component 15, and the data shown in Figure 4A is obtained by measuring each 3 mm, however, Figure 4B The data shown is obtained by showing the surface roughness more succinctly by means of a measurement per 1 mm. The number of columns in the fourth sample and the fifth sample (the table shown in Fig. 2) was obtained by assuming that the thickness of the disk substrate was calculated on the actual measurement pattern for the calculation of 〇.6 mm. Hereinafter, based on the above results of the fifth sample, the evaluation is made on the relationship between the time of the sample and the plastic cycle, and on the mechanical properties of the sample. As for the evaluation of the mechanical properties, as shown in Fig. 3, the length of the plastic cycle, the peripheral axial acceleration, the peripheral radial tilt, and the circumferential inclination of the circumference were measured, and the mechanical properties were evaluated based on these measurements. Here, the 'around radial tilt 〃 indicates the radial bending of the disk substrate in an angle. The radial tilt around the small turns is preferred because if the surrounding radial tilt becomes too large, it affects the offset and amplitude of the push-pull signal (push - p U 11 signa 1 ) obtained from the optical disk made of the target substrate. . ''The circumference of the circumference is inclined 〃 to indicate the curvature of the disk substrate at the circumference. Similarly, the inclination of the circumference of the small cymbal is preferred. ''Axis axial acceleration 〃 indicates the acceleration of the recording layer in the direction perpendicular to the reference plane when the rotational speed is 16 Hz (960 rpm, CAV control). If the surrounding axial acceleration becomes too large due to the unevenness of the disc surface, the response performance, tracking performance and stability of the focus servo or tracking servo may affect the disc manufactured on the target substrate. Recently and in the process of continuing, in the need for high-speed recording of DVD discs, the quality associated with the surrounding axial acceleration is attracting increasing attention. For example, according to -15-1276099 (13) according to the Orange Book. In DVD+R/RW, residual focus/tracking error is defined; this 値 is converted to ambient axial acceleration, with the result that ambient axial acceleration of less than 2.1 m / s2 is necessary. In the present embodiment, the mechanical characteristics were evaluated as good when the peripheral axial acceleration system was less than 2.1 m / s2. As for the length of the '\plastic cycle, the target is set at 5 · 5 seconds

以上機械特性係藉由使用由Schenk博士所製造稱爲 ''Brief-126P&quot;的儀器所量測。 首先,發現到,當開模的速度係恆定時,決定當自打 印器分離碟形基板時(第一分離)阻抗是否發生的參考在 於,於拉出碟形基板的方向之阻抗面積係大於1 8 m m2。於 第一分離,如果於拉出碟形基板的方向之阻抗面積係小於 1 8 mm2,發現到,碟形基板不可能自打印器適當分離。The above mechanical properties were measured by using an instrument called "'Brief-126P&quot; manufactured by Dr. Schenk. First, it was found that when the speed of the mold opening is constant, the reference for determining whether the impedance is generated when the disc substrate is separated from the printer (the first separation) is that the impedance area in the direction in which the disc substrate is pulled out is greater than 1. 8 m m2. In the first separation, if the impedance area in the direction in which the disk substrate is pulled out is less than 18 mm2, it is found that the dish substrate cannot be properly separated from the printer.

因此,第一樣本的阻抗面積係小於18mm2於拉出碟 形基板的方向,當使用此塑製樣本時塑製周期的時間長短 不論是多大,確定第一塑製樣本不可能符合預定的必備條 件之碟形基板。 至於第二樣本,如圖3所述,如果塑製周期的時間長 短係9.6秒,周圍軸向加速係1.4m/ s2。 至於第三樣本,如圖3所述,如果塑製周期的時間長 短係8.4秒,周圍軸向加速係1 .6m/ s2。相較之下,如果 塑製周期的時間長短縮短至6.7秒’周圍軸向加速變成 4.7m/s2;更者,彎曲(傾斜)發生在碟形基板的表面上 -16- (14) 1276099 於具有50mm至57mm範圍的碟半徑R的區,且因此,第 三樣本的機械特性被評估爲不良。 另一方面,於第五樣本的例子中’如圖3所述,甚至 當塑製周期的時間長短縮短至5 . 5 7秒時(其目標値), 周圍軸向加速變成1 .7m/ s2,且,周圍徑向傾斜及周圍圓 周傾斜亦是足夠小;因此,第五樣本的機械特性被評估爲 良好。 圖5顯示粗糙表面的形狀及塑製周期的時間長短間的 關係。 依據以上說明及如圖5所述,這是需要沿著拉出碟形 基板的方向而設置數列的凸出或凹入(不勻度);更者, 當不勻度的深度係〇 · 〇 9 m m左右時,塑製周期的時間長短 可縮短至9秒,當不勻度的深度係〇.〇5mm左右時,塑製 周期的時間長短可縮短至7秒,以及,當不勻度的深度係 0.02mm左右時,塑製周期的時間長短可縮短至5.5秒( 其目標値)。 換言之,以精細的粗糙表面而言,如第四樣本及第五 樣本的粗糙表面,阻抗面積增大,且因此,阻抗增大。另 一方面,淺不勻度導致良好機械特性。當自打印器分離碟 形基板時(第一分離),大阻抗面積於拉出碟形基板的方 向係較佳的。 當自模裝置3取出碟形基板時(第二分離),尤其當 塑製周期的時間長短縮短爲了達到徑向塑製時,淺不勻度 係較佳的,且,沒有足夠長時間讓碟形基板冷卻及收縮。 -17- 1276099 (15) 因爲淺不勻度導致小阻抗,這是容易將碟形基板拉出。 與依據日本專利公報第〇 3 3 0 1 1 0 3號所述之模的相較 之下,該前案包括較佳之僅具有一列環形不勻度於拉出碟 形基板的方向之分離阻抗部件,如圖2中的表所示之第二 及第三樣本,甚至當塑製周期的時間長短仍長達6.7秒如 第三樣本的例子時,機械特性的品質的偏斜於周圍徑向方 向由於第二分離中的阻抗而發生。因爲碟形基板係由於碟 形基板的端表面之壓緊而拉出,彎曲(傾斜)發生在碟形 基板的表面上於具有50mm至57mm的碟半徑R之區。 相反地,以精細的粗糙表面而言,如第五樣本的粗糙 表面,阻抗面積增大於拉出碟形基板的方向。再者,以淺 不勻度而言,甚至當塑製周期的時間長短縮短至5.5秒時 ,良好機械特性係可獲得的。 不勻度的深度的値進一步檢查如下。 當不勻度的深度係在3 // m至9 # m的範圍時,較佳 地爲3 // m至2 0 // m,分離阻抗部件1 5顯示足夠良好性 能。例如,不勻度的深度係1 2 // m於第五樣本。 如果不勻度的深度小於3 // m時,粗糙表面的凸出係 如此精細以使它們不具有足夠強度且可壓碎。爲此理由, 當自打印器分離碟形基板時,足夠大阻抗不可能被獲得。 相反地,如果不勻度的深度不小於3 // m,當自打印器分 離碟形基板時,足夠大阻抗可被產生。 如果不勻度的深度係大於9 0 μ m時,以短塑製周期 而言,阻抗係太大,亦即,當自可移動模分離碟形基板時 -18- (16) 1276099 ,分離的能力太低。然而,如果不勻度的深度未大於90 /i m,即使塑製周期被縮短,足夠大的分離能力可被獲得 〇 圖6顯示粗糙表面上的不勻度的深度及塑製周期的時 間長短間的關係,其解說第二分離的功效,其中橫座標表 示塑製周期的時間長短,而,縱座標表示不勻度的深度。 於圖6所示的實例中,假設,當塑製周期的時間長短 係9秒時,碟形基板收縮達9 0 μ m,當塑製周期的時間長 短係7秒時,碟形基板收縮達5 0 # m,以及,當塑製周期 的時間長短係5 . 5秒時,碟形基板收縮達2 0 // m。 如圖6所述,在阻抗面積不小於1 8mm2且有超過二 列凸出或凹入(不勻度)於拉出碟形基板的方向之條件下 ,當不勻度的深度減小時,甚至當塑製周期的時間長短被 縮短且沒有足夠長時間讓碟形基板冷卻及收縮時,因爲由 於淺的不勻度之小阻抗,這是容易將碟形基板拉出於第二 分離。 於圖6中,區X、Y及Z係較佳地用於塑製。雖然如 此,區X及Y係較佳地縮短塑製周期,因爲於區X及Y 中,不勻度的深度係在3//m至20//m的範圍內,其適合 於縮短的塑製周期,特別是,小於5 . 5秒的目標値之塑製 周期。更者,區X係較佳區,因爲於區X中,對第一分 離來說是重要的阻抗面積未小於1 8mm2,且,不勻度的深 度係在12//m至20/zm的範圍內。 包括粗糙表面之第四樣本及第五樣本的分離阻抗部件 -19- 1276099 (17) 1 5可藉由各種粗糙處理而形成的。於本實施例中, (寬鎚擊及淸潔)過程係使用來形成分離阻抗部件1 5 於本實施例中,爲了獲得理想的表面粗糙,粗縫 程係以具有不同地粗糙及形狀的材料經由兩步驟而實 。例如,於第一步驟中,使用以具有3 0 0 // m的平均 尺寸之方形氧化錫製成的材料,然而於第二步驟中, 以具有4 5 // m的平均粒狀尺寸之球形陶瓷珠製成的 〇 壓射壓力係4.0gf / cm2於第一步驟及第二步驟 。噴嘴的噴射距離(亦即,至將被處理的目標之距離 7 cm。至於處理時間,目標被旋轉兩次使得其每一部 處理達3 0秒。雖然足夠粗糙可被獲得於第一旋轉, 達到穩定於第二旋轉。藉由此種 WP C處理,均勻的 粗糙可容易獲得。 圖7係凹穴環12的立體圖。 圖8係藉由WPC所處理之沿著圖7中的箭頭A 離阻抗部件1 5的粗糙表面的橫截面圖。 於圖8中,點狀凸出及凹入的粗糙表面係藉由 而形成的,且,方形材料被使用於WP C。 藉由WPC處理的之沿著圖7的箭頭B的分離阻 件1 5的粗糙表面具有如圖8中之相同橫截面。 用於形成分離阻抗部件1 5的方法未受限於WP C 如,可使用珠噴砂、噴珠壓處理、微凹處理、以具有 粗表面的切刀之切削或拋光、或使用能夠粗糙金屬表 WPC 〇 化過 施的 粒狀 使用 材料 兩者 )係 份被 粗糙 表面 的分 WPC 抗部 。例 精細 面的 -20- 1276099 (18) 化學元素或溶液之處理的任一者。 空氣噴在模上的珠噴砂、噴珠壓處理及微凹處理係實 質上相同如前述的 WPC,且,注入壓力、材料及處理過 程亦相同如W P C。 於WPC、噴珠壓處理、微凹處理及珠噴砂中,如果 方形材料被使用在高速衝擊金屬表面以形成具有點狀凸出 及凹入的粗糙表面,沿著圖7的箭頭A之分離阻抗部件 1 5的所獲得的粗糙表面具有如圖8中的相同橫截面,亦 即,相同如藉由WP C所產生的粗糙表面。 圖9係當使用球形金屬時,沿著圖7中的箭頭a之 分離阻抗部件1 5的粗糙表面的橫截面圖。 亦即,於 WP C、噴珠壓處理、微凹處理及珠噴砂中 ,如果球形材料被使用在高速衝擊金屬表面以形成具有點 狀凸出及凹入的粗糙表面,沿著圖7的箭頭A之分離阻 抗部件1 5的所獲得的粗糙表面具有如圖9中的相同橫截 面。 只要阻抗面積未小於18mm2,圖8或9中的分離阻抗 部件1 5的任一者係可接受的。 於圖8中,因爲每一凹入的橫截面可近似於簡單三角 形,每一凹入的阻抗面積d可由使用公式d=(axb) / 2 X c而簡單計算,其中a係不勻度的平均深度,b係粗糙 表面的圓周,以及c係於拉出碟形基板4的方向之不勻度 的列數。 圖1 0 A至1 0D係沿著圖7中的箭頭B之分離阻抗部 -21 - 1276099 (19) 件1 5的粗糙表面的橫截面圖,其解說藉由切削或拋光所 處理之分離阻抗部件1 5的粗糙表面的形狀的實例。 在切削或拋光過程中,當凹穴環1 2正被旋轉時’凹 穴環1 2的內表面被切削,因此形成具有如切刀的相同形 狀之粗糙表面。於圖1 〇 A及1 0 B中切刀具有精細的粗表 面。 只要阻抗面積未小於1 8mm2,圖10A至10C中的粗 糙表面的任何一者係可接受的。然而,圖1 〇D中的粗糙 表面係不可使用的,因爲甚至在碟形基板冷卻及收縮之後 ,碟形基板不可能被分離。 同樣的,於使用能夠粗糙化金屬表面的化學元素或溶 液之過程中,阻抗面積可以下述方式而獲得。首先,每單 位的化學元素或溶液所產生的阻抗面積被決定,且,此値 乘以粗糙表面的圓周b及拉出碟形.基板4的方向之不勻度 的列數(c )。依據所獲得的阻抗面積,可決定所獲得的 粗糙表面是否爲可使用的。 雖然本發明係參考爲解說的目的所選擇之特定實施例 而說明’本發明未受限於這些實施例應是明顯的,然而, 這些熟習此項技藝者可對本發明作許多修改而不超過本發 明的基本精神及範圍。 依據本發明,具有粗糙表面的分離阻抗部件係設在符 合碟形基板的外周表面之固定模或可移動模的內表面上。 當自打印器分離以充塡凹穴的合成樹脂形成的碟形基板時 ’打印器作用如凹穴的側表面,分離阻抗部件產生阻抗在 -22- 1276099 (20) 碟形基板的外周上,因此當自打印器分離碟 碟形基板的平面度。當自打印器分離碟形基 抗部件改善碟形基板的外周表面的分離能力 當塑製周期的時間長短爲了徑向塑製而縮短 可自模裝置分離,同時保持碟形基板的平面 至當塑製周期的時間長短爲了使徑向塑製發 這係可能製造具有使用作爲高速DVD碟的 面度之碟。 再者’分離阻1几部件的粗糖表面具有數 點狀凹入,或數個線狀凸出或線狀凹入,或 出或凹入的組合,分佈在分離阻抗部件的表 離阻抗部件的粗糙表面具有不小於18mm2 積。分離阻ί/L部件的粗縫表面包括至少兩列 拉出碟形基板的方向中,且,每一凸出或凹 3/zm至90//m的範圍內,更佳地爲3//m 此,分離阻抗部件能夠可靠地產生阻抗於第 善碟形基板的分離能力於第二分離。 特別地’不勻度的深度係小於3 // m, 出係如此精細以使它們不具有足夠強度且可 且’ S自打印益分離碟形基板時,足夠大的 獲得。相反地,如果不勻度的深度未小於3 打印器分離碟形基板時,足夠大的阻抗可被 如果不勻度的深度大於9 0 e m時,於 ,阻抗太大,亦即,當自打印器分離碟形基 形基板時保持 板時,分離阻 。結果’甚至 時,碟形基板 度。因此,甚 生而縮短時, 碟形基板的平 個點狀凸出或 點狀及線狀凸 面上,且,分 的阻抗產生面 凸出或凹入於 入的深度係在 至2 0 // m。因 一分離,且改 粗糙表面的凸 容易地壓碎, 阻抗不可能被 y m時,當自 產生。 短塑製周期中 板時,分離的 -23- (21) 1276099 能力太低。相反地,如果不勻度的深度不大於9 0 /z m,甚 至當塑製周期係縮短的,足夠大的分離能力可被獲得。 分離阻抗部件的粗糙表面可藉由粗糙化處理而形成, 例如’ WP C (寬鎚擊及淸潔)處理、珠噴砂處理、噴珠壓 處理、微凹處理、由使用具有精細粗表面的切刀之切削或 拋光、及由使用能夠粗糙化金屬表面的化學元素或溶液之 處理。藉由這些處理方法,能夠產生於第一分離的阻抗及 改善碟形基板的分離能力於第二分離之均勻表面粗糙可容 易獲得。 [圖式簡單說明】 圖1 A及1 B係依據本發明的實施例用於形成碟形基 板之模裝置的實例結構的側橫截面圖,其中圖1 A顯示模 裝置的開啓狀態,而,圖1 B係模裝置的關閉狀態; 圖2係顯示樣本的特性,用於解說本實施例的分離阻 抗部件1 5與相關技術的比較表; 圖3係顯示本實施例的分離阻抗部件1 5的形狀及特 性値與相關技術的比較表; 圖4A及4B顯示所量測的表面粗糙度的實例; 圖5顯示粗糙表面的形狀及塑製周期的時間長短間的 關係; 圖6顯示粗糙表面上的不勻度的深度及塑製周期的時 間長短間的關係,其解說第二分離的功效; 圖7係凹穴環1 2的立體圖; -24- 1276099 (22) 圖8係藉由使用的方形材料的WPC所處理之沿著圖 7中的箭頭A的分離阻抗部件1 5的粗糙表面的橫截面圖 圖9係藉由使用的球形材料的WP C所處理之沿著圖 7中的箭頭A的分離阻抗部件1 5的粗糙表面的橫截面圖 圖1 0 A至1 0D係沿著圖7中的箭頭B之分離阻抗部 件1 5的粗糙表面的橫截面圖,其解說藉由切削或拋光所 處理之分離阻抗部件1 5的粗糙表面的形狀的實例。 C $要元件符號說明】Therefore, the impedance area of the first sample is less than 18 mm 2 in the direction in which the disk substrate is pulled out. When the plastic sample is used, the length of the plastic cycle is not large, and it is determined that the first plastic sample cannot meet the predetermined necessity. Conditional dish-shaped substrate. As for the second sample, as shown in Fig. 3, if the plastic cycle time is 9.6 seconds, the surrounding axial acceleration is 1.4 m/s2. As for the third sample, as shown in Fig. 3, if the plastic cycle time is 8.4 seconds, the surrounding axial acceleration is 1.6 m/s2. In contrast, if the length of the plastic cycle is shortened to 6.7 seconds, the surrounding axial acceleration becomes 4.7 m/s2; moreover, the bending (tilt) occurs on the surface of the dish-shaped substrate - 16 - (14) 1276099 The zone having the disk radius R in the range of 50 mm to 57 mm, and therefore, the mechanical properties of the third sample were evaluated as bad. On the other hand, in the example of the fifth sample, as shown in Fig. 3, even when the length of the plastic cycle is shortened to 5.7 seconds (the target 値), the surrounding axial acceleration becomes 1.7 m/s2. Moreover, the circumferential radial inclination and the circumferential inclination of the circumference are also sufficiently small; therefore, the mechanical properties of the fifth sample are evaluated as good. Figure 5 shows the relationship between the shape of the rough surface and the length of the plastic cycle. According to the above description and as illustrated in FIG. 5, it is necessary to provide a plurality of protrusions or depressions (unevenness) along the direction in which the disk substrate is pulled out; moreover, when the depth of the unevenness is 〇·〇 When the thickness is about 9 mm, the length of the plastic cycle can be shortened to 9 seconds. When the depth of the unevenness is about mm5mm, the length of the plastic cycle can be shortened to 7 seconds, and when the unevenness is When the depth is about 0.02 mm, the length of the plastic cycle can be shortened to 5.5 seconds (the target 値). In other words, with a fine rough surface, such as the rough surfaces of the fourth sample and the fifth sample, the impedance area increases, and thus, the impedance increases. On the other hand, shallow unevenness results in good mechanical properties. When the disc substrate is separated from the printer (first separation), a large impedance area is preferable in the direction in which the disc substrate is pulled out. When the disc substrate is taken out from the mold device 3 (second separation), especially when the length of the plastic cycle is shortened in order to achieve radial molding, the shallow unevenness is better, and there is not enough time for the disc to be The substrate is cooled and shrunk. -17- 1276099 (15) Since the shallow unevenness causes a small impedance, it is easy to pull out the dish substrate. In contrast to the mold described in Japanese Patent Laid-Open Publication No. 303301, the prior art includes a separate separation impedance member having only one row of annular unevenness in the direction in which the disk substrate is pulled out. , as shown in the second and third samples in the table of Fig. 2, even when the length of the plastic cycle is as long as 6.7 seconds, as in the case of the third sample, the quality of the mechanical properties is skewed to the surrounding radial direction. Occurs due to the impedance in the second separation. Since the dish substrate is pulled out by the pressing of the end surface of the disk substrate, the bending (tilting) occurs on the surface of the disk substrate in a region having a disk radius R of 50 mm to 57 mm. Conversely, in the case of a fine rough surface, such as the rough surface of the fifth sample, the impedance area is increased in the direction in which the disk substrate is pulled out. Further, in terms of shallow unevenness, good mechanical properties are obtained even when the length of the plastic cycle is shortened to 5.5 seconds. The depth of the unevenness is further examined as follows. When the depth of the unevenness is in the range of 3 // m to 9 # m, preferably 3 // m to 2 0 // m, the separation impedance component 15 shows sufficient good performance. For example, the depth of the unevenness is 1 2 // m in the fifth sample. If the depth of the unevenness is less than 3 // m, the bulging of the rough surface is so fine that they are not strong enough and can be crushed. For this reason, when the disc substrate is separated from the printer, a sufficiently large impedance cannot be obtained. Conversely, if the depth of the unevenness is not less than 3 // m, a sufficiently large impedance can be generated when the disc substrate is separated from the printer. If the depth of the unevenness is greater than 90 μm, the impedance is too large for a short plastic cycle, that is, when the disc substrate is separated from the movable mold, -18-(16) 1276099, separated The ability is too low. However, if the depth of the unevenness is not more than 90 /im, even if the plastic cycle is shortened, a sufficiently large separation ability can be obtained. Fig. 6 shows the depth of the unevenness on the rough surface and the length of the plastic cycle. The relationship, which illustrates the efficacy of the second separation, where the abscissa indicates the length of the plastic cycle and the ordinate indicates the depth of the unevenness. In the example shown in FIG. 6, it is assumed that when the length of the plastic cycle is 9 seconds, the disk substrate shrinks by 90 μm, and when the plastic cycle time is 7 seconds, the disk substrate shrinks up to 5 0 # m, and, when the length of the plastic cycle is 5.2 seconds, the dish substrate shrinks to 20 @ m. As shown in FIG. 6, when the impedance area is not less than 18 mm2 and there are more than two columns of convex or concave (unevenness) in the direction in which the disk substrate is pulled out, when the depth of the unevenness is reduced, even When the length of the plastic cycle is shortened and there is not enough time for the disk substrate to cool and contract, it is easy to pull the disk substrate out of the second separation because of the small impedance due to the shallow unevenness. In Figure 6, zones X, Y and Z are preferably used for plastic molding. Even so, the zones X and Y are preferably shortened in the plastic cycle because in the zones X and Y, the depth of the unevenness is in the range of 3//m to 20/m, which is suitable for the shortened plastic. The cycle, in particular, the plastic cycle of the target of less than 5.5 seconds. Moreover, the zone X is a preferred zone because in the zone X, the impedance area which is important for the first separation is not less than 18 mm2, and the depth of the unevenness is 12/m to 20/zm. Within the scope. The separation of the impedance component including the fourth sample of the rough surface and the fifth sample -19- 1276099 (17) 15 can be formed by various roughening treatments. In the present embodiment, the (wide hammering and chastity) process is used to form the separation resistance member 15. In the present embodiment, in order to obtain a desired surface roughness, the coarse seam is made of materials having different roughness and shape. It is implemented through two steps. For example, in the first step, a material made of square tin oxide having an average size of 300 @ m is used, whereas in the second step, a sphere having an average grain size of 4 5 // m is used. The squeezing pressure of the ceramic beads is 4.0 gf / cm 2 in the first step and the second step. The jetting distance of the nozzle (i.e., the distance to the target to be processed is 7 cm. As for the processing time, the target is rotated twice so that each of them is processed for 30 seconds. Although sufficiently rough to be obtained in the first rotation, Stabilization to the second rotation is achieved. By this WP C treatment, uniform roughness can be easily obtained. Figure 7 is a perspective view of the pocket ring 12. Figure 8 is taken by the WPC and is taken along the arrow A in Figure 7 A cross-sectional view of the rough surface of the impedance member 15. In Fig. 8, a point-like convex and concave rough surface is formed by, and a square material is used for WP C. The rough surface of the separation stopper 15 along the arrow B of Fig. 7 has the same cross section as in Fig. 8. The method for forming the separation resistance member 15 is not limited to WP C, for example, bead blasting, spraying The beading treatment, the dimple treatment, the cutting or polishing with a cutter having a rough surface, or the use of a granular material that can be roughened by a rough metal watch WPC) is a sub-WPC resistance portion of the rough surface. Example Fine surface -20-1276099 (18) Any of the treatment of chemical elements or solutions. The bead blasting, bead blasting and dimple treatment of the air spray on the mold are substantially the same as the WPC described above, and the injection pressure, material and treatment process are also the same as W P C. In WPC, bead pressure treatment, dimple treatment, and bead blasting, if a square material is used to impact a metal surface at a high speed to form a rough surface having a point convex and concave, the separation impedance along the arrow A of FIG. The resulting roughened surface of component 15 has the same cross-section as in Figure 8, i.e., the same rough surface as produced by WP C. Figure 9 is a cross-sectional view of the rough surface of the separation impedance member 15 taken along the arrow a in Figure 7 when a spherical metal is used. That is, in WP C, bead pressure treatment, dimple treatment, and bead blasting, if a spherical material is used at a high speed impact metal surface to form a rough surface having punctiform projections and depressions, along the arrow of FIG. The obtained rough surface of the separation impedance member 15 of A has the same cross section as in FIG. Any of the separate impedance components 15 of Figures 8 or 9 is acceptable as long as the impedance area is not less than 18 mm2. In Fig. 8, since each concave cross section can be approximated by a simple triangle, each concave impedance area d can be simply calculated by using the formula d = (axb) / 2 X c , where a is uneven The average depth, b is the circumference of the rough surface, and c is the number of rows of the unevenness in the direction in which the disk substrate 4 is pulled out. Figure 10 A to 10D is a cross-sectional view of the rough surface of the separation impedance section 21 - 1276099 (19) of the arrow B in Figure 7, which illustrates the separation impedance processed by cutting or polishing. An example of the shape of the rough surface of the component 15. During the cutting or polishing process, the inner surface of the recess ring 12 is cut when the pocket ring 12 is being rotated, thus forming a rough surface having the same shape as the cutter. In Figure 1 〇 A and 1 0 B, the cutter has a fine coarse surface. Any one of the rough surfaces in Figs. 10A to 10C is acceptable as long as the impedance area is not less than 18 mm2. However, the rough surface in Fig. 1 〇D is unusable because the dish substrate cannot be separated even after the dish substrate is cooled and shrunk. Similarly, in the process of using a chemical element or a solution capable of roughening a metal surface, the impedance area can be obtained in the following manner. First, the area of the impedance generated by the chemical element or solution per unit is determined, and this 乘 is multiplied by the circumference b of the rough surface and the number of columns (c) of the unevenness of the direction in which the substrate 4 is pulled out. Depending on the impedance area obtained, it can be determined whether the obtained rough surface is usable. Although the present invention has been described with reference to the specific embodiments selected for the purpose of illustration, the present invention is not limited by the embodiments. However, those skilled in the art can make many modifications to the present invention without exceeding the present invention. The basic spirit and scope of the invention. According to the present invention, the separation resistance member having a rough surface is provided on the inner surface of the fixed mold or the movable mold which conforms to the outer peripheral surface of the disk substrate. When the disc-shaped substrate formed of the synthetic resin filled with the recess is separated from the printer, the printer acts as a side surface of the recess, and the separation resisting member generates an impedance on the outer circumference of the -22-1276099 (20) disc substrate. Therefore, when the flatness of the dish-shaped substrate is separated from the printer. When the disc-shaped base member is separated from the printer to improve the separation ability of the outer peripheral surface of the disc substrate, the length of the plastic period is shortened for the radial molding to be separated from the mold device while maintaining the plane of the disc substrate to the plastic The length of the cycle is such that it is possible to manufacture a disk having a face that is used as a high-speed DVD disc. Furthermore, the surface of the raw sugar of the separation component has a number of point-like recesses, or a plurality of linear protrusions or linear recesses, or a combination of protrusions or recesses, which are distributed in the surface of the impedance component. The rough surface has a product of not less than 18 mm 2 . The rough surface of the separating resist/L member includes at least two rows of the direction in which the disk substrate is pulled out, and each of the protrusions or recesses is in the range of 3/zm to 90/m, more preferably 3// m. The separation of the impedance component can reliably produce the separation capability of the impedance of the second dish to the second separation. In particular, the depth of the unevenness is less than 3 // m, which is so fine that they do not have sufficient strength and can be obtained sufficiently large when the disc substrate is separated from the printing benefit. Conversely, if the depth of the unevenness is not less than 3 when the printer separates the disk substrate, a sufficiently large impedance can be obtained if the depth of the unevenness is greater than 90%, and the impedance is too large, that is, when self-printing When the plate is held while the disk-shaped base substrate is separated, the resistance is separated. The result 'even, the dish-shaped substrate degree. Therefore, when it is shortened, the flat shape of the dish-shaped substrate is convex or point-like and linear convex, and the depth of the sub-impedance surface is convex or concave to the depth of 2 0 // m. Since a separation, and the convexity of the roughened surface is easily crushed, the impedance cannot be generated by y m when it is self-generated. The separation of -23-(21) 1276099 is too low for a short plastic cycle. Conversely, if the depth of the unevenness is not more than 90 / z m, even when the plastic cycle is shortened, a sufficiently large separation ability can be obtained. The rough surface of the separation impedance component can be formed by roughening treatment, such as 'WP C (wide hammer and chast) treatment, bead blasting treatment, bead pressure treatment, dimple treatment, by using a cut having a fine rough surface The cutting or polishing of the knife and the treatment by the use of chemical elements or solutions capable of roughening the metal surface. By these treatment methods, it is possible to obtain the uniformity of the first separation and to improve the separation ability of the disk substrate in the second separation. BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1A and 1B are side cross-sectional views showing an example structure of a mold apparatus for forming a disk substrate according to an embodiment of the present invention, wherein FIG. 1A shows an open state of the mold device, and Fig. 1 shows the closed state of the B-mode device; Fig. 2 shows the characteristics of the sample for explaining the comparison table of the separation impedance component 15 of the present embodiment and the related art; and Fig. 3 shows the separation impedance component of the present embodiment. Figure 2A and 4B show examples of measured surface roughness; Figure 5 shows the relationship between the shape of the rough surface and the length of the plastic cycle; Figure 6 shows the rough surface The relationship between the depth of the unevenness and the length of the plastic cycle, which illustrates the effect of the second separation; Figure 7 is a perspective view of the pocket ring 12; -24-1276099 (22) Figure 8 is by use Cross-sectional view of the rough surface of the separation resistance member 15 processed along the arrow A in FIG. 7 processed by the WPC of the square material. FIG. 9 is processed by the WP C of the spherical material used. The rough surface of the separation impedance component 15 of the arrow A Cross-sectional view of FIG. 1A to 1D is a cross-sectional view of the rough surface of the separation impedance member 15 along arrow B in FIG. 7, which illustrates the separation of the impedance component 15 processed by cutting or polishing. An example of the shape of a rough surface. C $ required component symbol description]

Wpc 寬鎚擊及淸潔 1 固定模 2 可移動模 3 模裝置 4 碟形基板 4 a 粗糙部 5 凹穴 6 澆注套管 6a 噴嘴 7 打印器 9 凹部 10 衝孔機構 11 套筒 -25- 1276099 (23) 12 凹穴環 13 鏡表面 14 噴射器 15 分離阻抗部件 -26Wpc wide hammer and chastity 1 fixed mold 2 movable mold 3 mold device 4 dish substrate 4 a rough portion 5 pocket 6 casting sleeve 6a nozzle 7 printer 9 recess 10 punching mechanism 11 sleeve -25 - 1276099 (23) 12 Pocket ring 13 Mirror surface 14 Ejector 15 Separation of impedance components -26

Claims (1)

(1) 1276099 十、申請專利範圍 1 · 一種以合成樹脂形成碟形基板之模裝置,包含: 固定模;及 可移動模,該可移動模及固定模形成用來塑製碟形基 板於其中之凹穴, 其中具有粗糙表面的分離阻抗部件係設在符合碟形基 板的外周表面之固定模及可移動模的至少一者的內表面上 ’該碟形基板係固持在固定模及可移動模的一者上。 2 .如申請專利範圍第1項之模裝置,其中分離阻抗 部件的粗糙表面上分佈有數個點狀凸出或點狀凹入,或數 個線狀凸出或線狀凹入,或點狀及線狀凸出或凹入的組合 〇 3.如申請專利範圍第1項之模裝置,其中 分離阻抗部件的粗糙表面具有不小於1 8mm2的阻抗 產生面積;及 分離阻抗部件的粗糙表面於拉出所塑製碟形基板的方 向包括至少兩列的凸出或凹入,且,每一凸出或凹入的深 度係在3 // m至9 0 v m的範圍。 4 .如申請專利範圍第1項之模裝置,其中分離阻抗 部件的粗糙表面上之每一凸出或凹入的深度係在3 // m至 2 0 // m的範圍。 5.如申請專利範圍第1至4項中任一項之模裝置, 其中分離阻抗部件的粗糙表面係藉由粗糙化處理形成在固 定模及可移動模的至少一者的內表面上。 -27- (2) 1276099 6 .如申請專利範圍第5項之模裝置,其中粗糙化處 理包括WPC寬鍵擊及淸潔(Wide Peening and Cleaning) 處理。 7 .如申請專利範圍第5項之模裝置,其中粗糙化處 理包括珠噴砂(Bead Blast )處理。 8 .如申請專利範圍第5項之模裝置,其中粗糙化處 理包括珠擊(Shot Peening)處理。 9.如申請專利範圍第5項之模裝置,其中粗糙化處 理包括微凹(Micro Dimple )處理。 1 〇 .如申請專利範圍第5項之模裝置,其中粗糙化處 理包括使用具有精細粗表面的切刀之切削或拋光。 11.如申請專利範圍第5項之模裝置,其中粗糙化處 理包括使用能夠粗糙化金屬表面的化學元素或溶液之處理 〇 1 2 · —種使用模裝置以合成樹脂形成之碟形基板,包 含: 外周表面,其藉具有模裝置的粗糙表面之分離阻抗部 件而粗糙化。 1 3 . —種塑製碟形基板的方法,其藉由使用包括固定 模及可移動模的模裝置,該方法包含以下步驟: 以合成樹脂充塡塑製凹穴,該塑製凹穴係由固定模及 可移動模所形成且具有用來轉移的打印器作爲其側表面, 該塑製凹穴包括配置在符合碟形基板的外周表面之固定模 及可移動模的至少一者的內表面上之分離阻抗部件,該分 -28- (3) 1276099 離阻抗部件具有粗糙表面; 使凹穴中由合成樹脂形成之碟形基板與打印器分離; 及 使碟形基板與模裝置分離。(1) 1276099 X. Patent Application No. 1 · A molding apparatus for forming a disc-shaped substrate from synthetic resin, comprising: a fixed mold; and a movable mold formed by molding a disc-shaped substrate therein a recessed portion, wherein the separated impedance member having a rough surface is disposed on an inner surface of at least one of the fixed mold and the movable mold conforming to the outer peripheral surface of the disk substrate. The dish substrate is held in the fixed mold and movable One of the models. 2. The apparatus of claim 1, wherein the rough surface of the separation impedance component is distributed with a plurality of dot-like protrusions or point-like recesses, or a plurality of linear protrusions or linear recesses, or dots. And a linear convex or concave combination 〇 3. The molding apparatus according to claim 1, wherein the rough surface of the separation impedance member has an impedance generation area of not less than 18 mm 2 ; and the rough surface of the separation impedance component is pulled The direction in which the disc-shaped substrate is molded includes at least two columns of protrusions or recesses, and each of the protrusions or recesses has a depth ranging from 3 // m to 90 μm. 4. The apparatus of claim 1, wherein each of the convex or concave depths on the rough surface of the separation impedance component is in the range of 3 // m to 2 0 // m. 5. The mold apparatus according to any one of claims 1 to 4, wherein the rough surface of the separation resistance member is formed on the inner surface of at least one of the fixed mold and the movable mold by roughening treatment. -27- (2) 1276099 6. The apparatus of claim 5, wherein the roughening treatment includes WPC Wide Bonding and Cleaning. 7. A molding apparatus according to claim 5, wherein the roughening treatment comprises a bead Blast treatment. 8. The mold apparatus of claim 5, wherein the roughening treatment comprises a Shot Peening treatment. 9. The mold apparatus of claim 5, wherein the roughening treatment comprises a Micro Dimple treatment. 1 〇. The molding apparatus of claim 5, wherein the roughening treatment comprises cutting or polishing using a cutter having a fine rough surface. 11. The mold apparatus according to claim 5, wherein the roughening treatment comprises a treatment using a chemical element or a solution capable of roughening the metal surface, and a dish-shaped substrate formed of a synthetic resin using a mold device, including : The outer peripheral surface is roughened by a separate impedance member having a rough surface of the mold device. A method of molding a disk-shaped substrate by using a mold device comprising a fixed mold and a movable mold, the method comprising the steps of: filling a plastic cavity with a synthetic resin, the plastic cavity system Formed by a fixed mold and a movable mold and having a printer for transferring as a side surface thereof, the plastic pocket including at least one of a fixed mold and a movable mold that conform to an outer peripheral surface of the disk substrate On the surface of the separated impedance member, the sub--28-(3) 1276099 has a rough surface from the resistive member; the disc-shaped substrate formed of synthetic resin in the recess is separated from the printer; and the disc-shaped substrate is separated from the mold device. 1 4 ·如申請專利範圍第1 3項之方法,其中分離阻抗 部件的粗糙表面包括數個點狀凸出或點狀凹入,或數個線 狀凸出或線狀凹入,或點狀及線狀凸出或凹入的組合分佈 在分離阻抗部件的表面上。 1 5 ·如申請專利範圍第1 3或1 4項之方法,其中 分離阻抗部件的粗糙表面包括不小於1 8mm2的阻抗 產生面積;及 分離阻抗部件的粗糙表面於拉出塑製的碟形基板的方 向包括至少兩列的凸出或凹入,且,每一凸出或凹入的深 度係在3 # m至9 0 // m的範圍。1 4 The method of claim 13, wherein the rough surface of the separation impedance component comprises a plurality of dot-like protrusions or point-like recesses, or a plurality of linear protrusions or linear recesses, or dots. And a combination of linear protrusions or recesses is distributed on the surface of the separation impedance component. The method of claim 13 or claim 4, wherein the rough surface of the separation impedance component comprises an impedance generation area of not less than 18 mm 2 ; and the rough surface of the separation impedance component is pulled out of the molded disk substrate The direction includes at least two columns of protrusions or recesses, and each of the protrusions or recesses has a depth ranging from 3 #m to 9 0 // m. 1 6 .如申請專利範圍第1 5項之方法,其中分離阻抗部 件的粗糙表面上之每一凸出或凹入的深度係在3 v m至20 // m的範圍。 -29-The method of claim 15, wherein each of the convex or concave depths on the rough surface of the separation impedance component is in the range of 3 v m to 20 // m. -29-
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