TWI269073B - Sprayer, substrate of color filter and mfg. of electroluminescent display device - Google Patents

Abstract

To make coating unevenness on a part to be discharged less in a discharge device for discharging a liquid-like material. X coordinate of a reference nozzle of a second head is further deviated by 1/2 times of a first length relative to that deviated by a second length from X coordinate of the reference nozzle of a first head. X coordinate of a reference nozzle of a fourth head is further deviated by 1/2 times of the first length relative to X coordinate deviated by the second length from X coordinate of the reference nozzle of a third head. The X coordinate of the reference nozzle of the third head is deviated by 1/4 times or 3/4 times of the first length relative to the X coordinate deviated by the second length from the X coordinate of the reference nozzle of the second head. The first length is a nozzle pitch in an X axis direction of the head. The second length is the product of the first length and the number of nozzles/4 of the head.

Description

[Technical Field] The present invention relates to a discharge device and a discharge method for discharging a liquid material, and more particularly to a color filter substrate or a matrix display device, which is suitable for periodicity. The scope of the configuration, the discharge device for discharging the liquid material project, and the discharge method. [Prior Art] It is known that an inkjet device is used to coat a material in a pixelization range. For example, there is a filter, a light sheet element or a matrix type display device using an ink jet device, a color filter substrate, and a light-emitting portion arranged in a matrix. (For example, refer to Patent Document 1). [Explanation of the Invention] [Invention of the Invention] [In order to solve the problem of the invention] The interval between the plurality of portions to be coated of the material to be coated is different from the nozzle interval of the ink jet device. very much. The portion to be spouted is, for example, a portion where a filter element is to be provided. Therefore, in the conventional inkjet apparatus, in order to make the distance between the two discharged portions coincide with the distance between the two discharge nozzles, the ink jet head (or the discharge nozzle direction) is arranged in the direction in which the discharge portion is arranged. tilt. However, in such a configuration, the distance between the two spouted parts is more suitable for each color filter -4- 1269073 head-head ink-spraying spray-removing spray, and the new degree will be installed. The film pack and the light security, the filter head is troublesome, and the spray rack is even more. Degree, trouble when the head of the same head with the spray } not to respond (2) the corner of the pair of installed pieces of new trouble. Further, when the volume of the material to be discharged from one of the spouted portions is increased, the number of discharges to one spouted portion is increased. At this time, when the discharge amount between the nozzles is uneven, it is easy to be revealed as unevenness in coating. The present invention has been made in view of the above problems, and an object thereof is to reduce the coating average of the discharged crucible 15. Before the Tai Nai Ping group, it was sprayed on the front and the other, and the Taiping Teping prepared it, and it was equipped with a tie, and the 1 set of spit ^] For the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle, each of the first nozzle, the second nozzle, and the third nozzle And the fourth nozzle has a P discharge nozzle, and the nozzle spacing in the X-axis direction of each of the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle is the same. The P nozzles are disposed in a length of one, and the first nozzle and the second nozzle are adjacent to each other in the Y-axis direction, and the third nozzle and the fourth nozzle are adjacent to each other in the Y-axis. direction. Then, the X coordinate of the reference nozzle of the second nozzle is shifted to the X coordinate of the second length from the X coordinate of the reference nozzle of the first nozzle, and is further shifted by 1 of the length of the first 2 times. The X coordinate of the reference nozzle of the fourth nozzle of the above (3) (3) 1269073 is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the third nozzle, and is further offset by the foregoing 1/2 times the length of 1. Then, the X coordinate of the reference nozzle of the third nozzle is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the second nozzle, and is shifted by 1 of the length of the first /4 times or 3/4 times, the second length is P/4 times the length of the first length, P is a natural number of 2 or more, and the X-axis direction and the Y-axis direction are orthogonal to each other. According to the above feature, even if the droplet discharge amount of the nozzle is different at the position of the nozzle of each head, the difference in the discharge amount is less likely to occur in the droplet array discharged from the head group. This is because the nozzles belonging to various ranges of the head are in the nozzle group and are adjacent to the X-axis direction, so that the difference in the discharge amount can be eliminated. Preferably, in each of the four nozzles, the P nozzles are arranged in the X-axis direction. According to the above feature, the ejection position arranged in the X-axis direction can simultaneously eject the liquid droplets. According to the above feature, a plurality of nozzles are arranged in the X-axis direction. For this reason, the liquid material can be discharged almost simultaneously from the above-mentioned plurality of nozzles for the target (discharged portion) 5 extending in the X-axis direction. This result will be the drive signal for the discharge of the liquid material, which is common to the multiple nozzles. Further, since the discharge time of the plurality of nozzles arranged in one direction is simultaneous, it is not necessary to constitute a circuit for delaying the drive signal. As a result, the cause of the waveform error caused by the drive signal is reduced, and for this purpose, a precision drive wave -6-(4) 1269073-shaped 5 drive head can be used. Preferably, the P of each of the four nozzles is the first row extending in the X-axis direction and the second column and the second column. The first length is doubled at intervals of two. The front row is the second row, and only the first length is shifted in the direction. According to the above feature, it is possible to reduce the spray in the X-axis direction of the head in order to change the nozzle line density in the X-axis direction of the large head. According to the aspect of the invention, the nozzles of the four nozzles are each of the plurality of nozzles extending in the X-axis direction, and the nozzles of the plurality of nozzles are twice as long as the aforementioned ones. In the interval arrangement, one of the other ones (Μ-1) is only offset by the i-th dimension of the first length, and is shifted to the X-axis direction. It is the natural number of 1 to (Μ-1). According to the above feature, the X-axis direction of the head can be further reduced. For this reason, it is preferable that the nozzle line in the X-axis direction of the nozzle is more large, and the stage is such that the head group having the discharge portion holds the base body toward the Y-axis, and at least one of the plurality of nozzles When the nozzle is overlapped to the range of the portion, the liquid material is discharged from the at least one nozzle. According to the above feature, the material can be selectively applied to the nozzles, and the nozzles of the first plurality are spaced apart from each other by the first X-axis nozzle. The above ρ is the length of each of the first lengths, 9 pfe between the nozzles. According to another aspect of the present invention, the planar image of the spouted portion is a rectangular shape determined by a long side and a short side, and the platform is The direction of the long side is parallel to the X-axis direction, and the direction of the short side is parallel to the Y-axis direction, and the base body is held. The head group is relatively moved in the Y-axis direction with respect to the base body, and is in the plural When at least two nozzles of the nozzles invade the range corresponding to the discharged portion, the liquid material is discharged from the discharge nozzles to the discharge portion. According to the above feature, in the period in which the head group is relatively moved in the Y-axis direction (within one scanning period), the necessary volume of liquid material can be discharged to one of the discharged portions. This is because the plurality of nozzles can simultaneously eject the liquid material for one spouted portion. However, the present invention can be realized in various forms, for example, a device for manufacturing a color filter, a device for manufacturing an organic electro-optic display device, or a device for manufacturing a plasma display device. In the discharge method of the present invention, the step (a) of placing the substrate having the discharged portion on the stage and the nozzle interval in the respective X-axis directions are the first length, and in each case, The discharge method of the step (b) in which the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle of the P nozzles are moved relative to the substrate in the Y-axis direction is characterized by the foregoing Step (b) is included in one scanning period, and the X coordinate of the reference nozzle of the second nozzle is shifted from the X coordinate of the second length to the X coordinate of the reference nozzle of the first nozzle ( 6) (6) 1269073, which is further shifted by 1/2 times the length of the first one, and the X coordinate of the reference nozzle of the fourth nozzle is offset only from the X coordinate of the reference nozzle of the third nozzle. The X coordinate of the second length is further shifted by 1 / 2 times the length of the first one, and the X coordinate of the reference nozzle of the third nozzle is the X of the reference nozzle from the second nozzle The coordinates are only offset by the X coordinate of the length of the second, offset by 1/4 or 3/4 of the length of the first The first nozzle, the second nozzle, the third nozzle, and the fourth nozzle are relatively moved in the Y-axis direction (bl) with respect to the substrate; the foregoing step (bl) The method further comprises: moving one of the first nozzle and the second nozzle to the other side, and simultaneously moving one of the third nozzle and the fourth nozzle to the other side. Step; the P is a natural number of 2 or more, and the length of the second is P/4 times the length of the first. According to the above feature, the discharge amount of the liquid droplets from the nozzle is different at the nozzle position of each head, and it is difficult to show the difference in the discharge amount in the droplet array discharged from the head group. This is a nozzle of various ranges belonging to the head in the nozzle group, which is adjacent to the X-axis direction, and can eliminate the difference in the amount of discharge. Preferably, the step (b) includes the step of separately moving the four nozzles arranged in the X-axis to the P nozzles, and moving the substrate relative to the Y-axis direction (b2) ). Furthermore, preferably, the discharging method further includes, via the step (b), at least one of the nozzles of the plurality of nozzles invades to a range corresponding to the portion to be discharged, from the at least one nozzle- 9 - (7) (7) 1269073 "Step (c) of discharging the liquid material in the spouted portion. According to the above feature, the selectable material is applied to the spouted portion. According to another aspect of the present invention, the planar image including the spouted portion has a nearly rectangular shape determined by a long side and a short side, and the step (a) is a direction in which the long side of the spouted portion is parallel to the X-axis direction. At the same time, the direction of the short side is parallel to the Y-axis direction, and the step (al) of placing the substrate; the step (c) further includes at least two nozzles of the plurality of nozzles When it corresponds to the range of the spouted portion, the step (cl) is discharged from the at least two discharge nozzles to the spouted portion. According to the above feature, the necessary volume of the liquid material can be discharged to one of the discharged portions during one scanning period. In this case, the plurality of nozzles discharge a liquid material for one of the discharged portions. [Embodiment] [Best Mode for Carrying Out the Invention] [Embodiment 1] Hereinafter, a discharge device and a discharge method of the present embodiment will be described in the order described below. A. The whole configuration of the discharge device B. The carriage C. The nozzle D • The nozzle group E and the control unit-10- (8) (8) 1269073 F. An example of the discharge method (the overall configuration of the A. fl earth removal device) The table 1 is not provided, and the discharge device 1 is provided with an ink tank 101 for holding the liquid material 111, and a transfer tube 11A, and a discharge scan for supplying the liquid material 1 1 1 from the ink tank 1 0 1 through the transfer tube. Department 1 〇 2. The discharge scanning unit 102 includes a holder 1〇3 for holding the plurality of heads 114 (second drawing), a first position control device 丨04 for controlling the position of the cradle 110, and a stage 106 for holding the base 10A to be described later, and control The second position control device 108 at the position of the platform 1 () 6 and the control unit 112. The plurality of nozzles 1 1 4 of the ink tank ιοί and the bracket 1〇4 are connected by the conveying pipe 1 1 ,, and the respective ink nozzles 向, to the respective plurality of nozzles 1 1 4, the liquid material 1丨丨 is compressed. Air is supplied. The first position control device 104 moves the carriage 103 in the X-axis direction and the z-axis direction orthogonal to the X-axis direction in response to the signal from the control unit 1 1 2 . Further, the first position control device 1 〇 4 has a function of rotating the carriage 1 0 3 by rotating in parallel with the Z axis. In this embodiment, the z-axis direction is parallel to the vertical direction (i.e., the direction of gravitational acceleration). The second position control device 1 0 8 moves the stage ι 6 in accordance with the signal from the control unit u 2 in the γ-axis direction of both the orthogonal X-axis direction and the Z-axis direction. Further, the second position control device 丨〇 8 has a function of rotating the platform 1 〇 6 in parallel with the z-axis. However, in the present specification, the first position control device 104 and the second position control device 1A are referred to as "scanning portions". The platform 106 has a plane parallel to both the X-axis direction and the γ-axis direction. Further, the platform 106 is formed by fixing or holding the substrate of the discharge portion of the -11 - (9) (9) 1269073 which is to be coated with a specific material. However, in the present specification, the substrate having the discharge portion is referred to as a "receptive substrate". In the X-axis direction, the γ-axis direction, and the Z-axis direction of the present specification, either one of the bracket 103 and the platform is aligned with the other direction of relative movement. Further, the virtual origin of the coordinate system in the X-axis direction, the γ-axis direction, and the 2-axis direction is fixed to the reference portion of the discharge device ι. In this specification, the coordinates of the X coordinate, the γ coordinate and the Ζ coordinate system are the coordinates of the ΧΥΖ coordinate system. However, the imaginary origin is not only the reference portion, but also the fixed platform 106. The bracket 103 may be fixed to the bracket 103 as described above, and the bracket 103 is moved in the X-axis direction via the first position control device 1〇4. . On the other hand, the stage 106 is moved in the x-axis direction via the second position control means 1 〇8. In other words, the relative position of the nozzle 1 1 4 to the stage 〇6 is changed via the first position control device 104 and the second position control device 1〇8. More specifically, via these operations, the carriage 103, the head group 114G (Fig. 2), the head 114, or the nozzle 1 8 (Fig. 3) are attached to the platform 1 〇6. The discharge portion is relatively scanned in the X-axis direction and the γ-axis direction while maintaining a specific distance in the z-axis direction. Here, the bracket i 〇3 may be moved in the Y-axis direction with respect to the stationary discharge portion. Then, in the period in which the carriage 103 moves between the two points in the Y-axis direction, the material i j j may be ejected from the nozzle 1 1 1 during the stationary discharge portion. -12- (10) (10) 1269073 The "relative movement" or "relative scanning" includes at least one side of the discharge liquid material 11 1 side and the discharge side (the discharge side). For the other party to move. Moreover, the carriage 103, the head group 114G (Fig. 2) 5 head 114, or the nozzle 1 18 (Fig. 3) are relatively moved, and are changed for the platform 1〇6, the base body, or the spouted portion. Wait for relative position. Therefore, in the present specification, the tray 103, the head group 114G, the head 114, or the nozzle 118 is stationary with respect to the discharge position 1 ,, and even when only the stage 丨〇6 is moved, the tray 103 and the head group 114G are also indicated. The showerhead 114, or nozzle 118, moves relatively relative to the platform 106, the substrate, or the spewed portion. Further, there are indications of relative scanning or relative movement, and discharge and combination of materials, and are referred to as "coating scanning". The bracket 103 and the platform 106 have more freedom of parallel movement and rotation than the above. However, in the present embodiment, the description of the degrees of freedom other than the above-described degrees of freedom is omitted for the sake of simplicity of explanation. The control unit U 2 will display the liquid material to be discharged! The spitting data of the relative position is configured by an external information processing device. The detailed configuration and function of the control unit 1 1 2 will be described later. (B. Bracket) Fig. 2 is a view of the bracket 103 viewed from the side of the stage 106, and the direction perpendicular to the second drawing plane is the direction of the Z-axis. Further, the left-right direction of the paper surface in Fig. 2 is the X-axis direction, and the vertical direction of the paper surface is the Y-axis direction. As shown in Fig. 2, the carriage 1 〇 3 holds a plurality of nozzles 1 1 4 having configurations of almost the same -13-(11) 1269073. In the present embodiment, the number of the heads 1 1 4 held in the bracket 1 , 3 is 24 pieces. Each of the nozzles 4 has a bottom surface of a plurality of nozzles 1 1 8 described later. The bottom surface of each nozzle 1 is a polygonal shape having two long sides and two short sides. As shown in Fig. 2, the bottom surface of the head 1 1 4 faces the platform 1 〇 6 side, and the longitudinal direction and the short side direction of the head j are parallel to the X-axis direction and the γ direction, respectively. However, the details of the relative positional relationship between the heads 1 14 and 4 will be described later. In the present specification, the four heads 114 adjacent to the Y-axis direction are "head group 1 1 4". According to this expression, the bracket 1 〇3 of Fig. 2 is denoted as holding six nozzle groups 1 14G. (C. Nozzle) Fig. 3 shows the bottom surface of the head 114. The head 114 is provided with a plurality of nozzles 1 1 8 listed in the X-axis direction. The nozzles HXP of the plurality of nozzles 1 18 and the heads 1 14 in the X-axis direction are disposed at about 70 μm. Here, the "nozzle interval X in the X-axis direction of the head 1 14" is obtained by dividing the nozzles 118 of all the heads 114 along the x-axis direction on the X-axis to obtain the interval between the plurality of nozzle images. In this embodiment, the plurality of nozzles 1 1 8 of the nozzles 1 14 are both nozzle rows 1 1 6 A extending in the X-axis direction, and nozzle rows 1 1 6 Β. Nozzle row: Nozzle row 1 1 6B is arranged in the Y-axis direction. Then, each of the spray nozzles 1 1 6 A and the nozzle rows 〖1 6 B, 90 nozzles Π 8 are arranged at a certain interval in the axial direction. In this embodiment, the spacing of the 疋 is about the shape of the spray, and the axis of the 14 is indicated by the ray spray system. The image of the ray is extended to ί 1 6A, and the mouth is aligned to X 4 0 μ. m -14- (12) (12)1269073. That is, the nozzle interval LPN of the nozzle row 1 16A and the nozzle interval LPN of the nozzle row 1 16B are about 140 μm. The position of the nozzle row 116A is a half-length (about 70 μm) of the nozzle interval LNP with respect to the position of the nozzle row 116 ,, and is shifted in the positive direction (the right direction in Fig. 3) in the X-axis direction. To this end, the nozzles in the X-axis direction of the head 1 14 are spaced apart by half the length (about 70 μm) of the nozzle spacing L Ν 喷嘴 of the nozzle row 116 Α (or the nozzle row 116 Β). Therefore, the nozzle line density in the X-axis direction of the head 1 14 is twice the nozzle line density of the nozzle row 1 16A (or the nozzle row 1 16B). However, in the present specification, the "nozzle line density in the X-axis direction" corresponds to the number of unit lengths of the plurality of nozzle images obtained by the plurality of nozzles on the X-axis in the Y-axis direction. Of course, the number of nozzle rows including the nozzles 1 14 is not limited to two. The nozzle 1 14 may include one nozzle row. Here, the 自然 is a natural number of 1 or more. At this time, in each of the nozzle rows, the plurality of nozzles 1 18 are arranged at intervals of a length of the nozzle interval Μ. Further, in the case of a natural number of 2 or more, for one nozzle row, the other (Μ - 1) nozzle rows are not i times longer than the overlap nozzle interval ,, and are shifted in the X-axis direction. Here, i is a natural number of 1 to (Μ - 1 ). Further, each of the nozzle rows 1 16 Α and the nozzle rows 1 16 由 is formed by 90 nozzles, and one nozzle 1 14 has 190 nozzles. However, the five nozzles at both ends of each nozzle row 1 16 Α are set as "resting nozzles". Similarly, the five nozzles at both ends of the nozzle row 1 6B are also set as "resting nozzles". Then, wait for 2 "stop nozzles" to discharge liquid -15- (13) (13) 1269073 material 1 1 1. For this purpose, among the nozzles 1 1 8 of the nozzles 112, 1 60 nozzles 1 18 are operated as the discharge liquid material 1 1 1 . In the present specification, the 160 nozzles 18 are denoted as "discharge nozzles". However, the number of nozzles 1 1 8 of one nozzle 1 14 is not limited to 180. It is also possible to provide 3 60 nozzles in one nozzle 1 14 . At this time, each of the nozzle rows 116A and 116B may be formed by 180 nozzles 118. Further, in the present invention, the number of discharge nozzle rows is not limited to 1 60. For 1 nozzle 1 14, for? A spit out nozzle is also available. herein,? The natural number of 2 or more may be equal to or less than the total number of nozzles of the head 1 14 . In the present specification, for the purpose of explaining the relative positional relationship of the heads 1 14 , the nozzles 1 18 of the nozzle rows 1 16 包含 are included, and the nozzles 1 1 8 of the left side are denoted by the heads 1 14 . Reference nozzle 118R". That is, among the 80 discharge nozzles of the nozzle row 116, the leftmost discharge nozzle is the "reference nozzle 1 18 R" of the head 1 14 . However, for all the nozzles 1 1 4, the specified direction of the "reference nozzle 1 1 8 R" may be the same, and the position of the "reference nozzle 1 1 8 R" may be a non-upper position as in the fourth (a) As shown in (b), each of the heads 114 is an ink jet head. More specifically, each of the ink jet heads 1 1 4 is provided with a vibrating plate 1 2 6 and a nozzle plate 1 2 8 . Between the vibrating plate 1 2 6 and the nozzle plate 1 2 6 , the liquid material 1 1 1 is supplied from the ink tank 1 0 1 through the hole 1 3 1 , and the liquid filling place 1 29 is often located. Further, between the diaphragm 126 and the nozzle plate 128, a plurality of partition walls 122 are formed. Then, the portion 5 is surrounded by the vibrating plate 126, and the nozzle plate 128, and the partition wall 22, and is the chamber 120. The chamber 120 is provided corresponding to the nozzles -16-(14)(14)1269073 118, and the number of chambers U0 and the number of nozzles U8 are the same. In the chamber 丨2, the liquid material uj is supplied from the liquid storage portion 129 by the supply port 130 located between the pair of partition walls 1S2. On the vibrating plate 丨 26, each corresponding chamber 120 is located at the vibrator ι24. The vibrator 124 includes a holding piezoelectric element 1224c and one of the piezoelectric elements i24C opposite electrodes 124A, U4B. Here: [For the electrode ι24α, ι24Β, the driving voltage is applied, and the liquid material 1 8 is discharged from the corresponding nozzle 1 1 8 . However, the liquid material is discharged from the nozzle 1 18 in the Z-axis direction, and the shape of the nozzle i 18 is adjusted. Here, the term "liquid material" as used herein means a material which discharges viscosity from a nozzle. At this time, the material is either water-based or oily. The fluidity (viscosity) of the discharge nozzle may be sufficient, and the solid matter may be temporarily mixed, and fluidity may be used as a whole. The control unit 112 (Fig. 1) may be configured by providing the respective complex vibrators 124 with independent signals. That is, the volume of the material 1 1 1 discharged from the nozzle i 8 is controlled by the signal of the control unit 1 1 2 in each nozzle i 8 . In this case, the volume of the material 丨1 j discharged from each of the nozzles 1 1 8 changes between Opl and 42 (pico liter). Further, the control unit 112 sets a nozzle 1 1 8 that can perform a discharge operation between coating scans, and a nozzle 丨丨 8 that does not perform a discharge operation, as will be described later. In the present specification, a portion corresponding to one nozzle 1 1 8 5 and a bracket 1 2 0 corresponding to the nozzle, and a vibrator 1 2 4 corresponding to the bracket 1 2 0 will be included as "discharge portion 1 2 7". "." According to this expression, one nozzle 1 I 4 has a discharge portion 1 27 having the same number as the number of nozzles 1 18 . Discharge part 1 2 7 ties -17- (15) (15) 1269073 There are electrothermal conversion elements instead of piezoelectric elements. In other words, the discharge unit 127 may have a thermal expansion of the material by the electric heat conversion element, and the discharge material may be configured. (D. Head group) Next, the relative positional relationship of the four heads 1 14 of the head group 1 1 4G will be described. In Fig. 5, in the tray 03 of Fig. 2, two head groups 1 1 4 G ° adjacent to the γ-axis direction are displayed. As shown in Fig. 5, each head group 1 1 4 G is composed of 4 heads 1 1 4 made. Then, the nozzle interval GXP in the X-axis direction of the head group 1 I4 is 1 Μ times longer than the nozzle interval HXP in the X-axis direction of the head 1 14 , and 4 heads 1 14 are disposed in the head group 1 1 4 5 . In the present embodiment, the nozzle spacing in the X-axis direction of the head is narrow. Therefore, the nozzle spacing GXP in the X-axis direction of the head group 1 14G is about 1 7.5 μm. Here, the "nozzle interval G Χ X in the X-axis direction of the head group 1 1 4 G" corresponds to the nozzle 1 1 8 of all the head groups Π 4 G being imaged on the X-axis along the z-axis direction. Obtain the interval between the complex nozzle images. Of course, the number of the heads 1 1 4 including the head group 1 1 4 G is not limited to four. The head group 1 1 4 G may be formed by N heads 1 14 . Here, the 5 N is a natural number of 2 or more. At this time, the nozzle interval GXP is 1/N times longer than the nozzle interval HXP, and N nozzles 14 may be disposed in the head group 1 1 4G. In the following, the relative positional relationship of the heads 11 4 of the present embodiment will be more specifically described. -18- (16) (16) 1269073 First, for the purpose of the description of the easy way, the four nozzles 1 1 4 including the head group 1 1 4 G on the upper left of Fig. 5 are recorded as the head 1141 and the head 1142. , the nozzle 1143, the nozzle 1144. Similarly, the four heads 114 of the head group 114G at the lower right of Fig. 5 are referred to as a head 1145, a head 1146, a head 1 47, and a head 1148. Then, the nozzle row 1 1 6 A, 1 1 6 B of the nozzle 1 1 4 1 is denoted as nozzle row 1 A, 1 B, and the nozzle row 1 1 6 A, 1 1 6 B of the nozzle 1 1 4 2 is The nozzle row 2A5 2B is denoted by the nozzle row 1 16A, 1 16B of the nozzle 1 143 as the nozzle row 3 A, 3 B , and the nozzle row 1 1 6 A, 1 1 6 B of the nozzle 1 14 4 is denoted as a nozzle Column 4 A, 4 B. Similarly, the nozzle rows 116A, 116B of the nozzles 1 14 5 are denoted as nozzle rows 5A, 5B, and the nozzle rows 1 1 6 A, 1 1 6 B of the nozzles 1146 are denoted as nozzle rows 6 A, 6 B, and the nozzles are The nozzle rows 116A, 116B of 1 1 4 7 are denoted as nozzle rows 7A, 7B5, and the nozzle rows 1 16A, 1 16B of the head 1W8 are denoted as nozzle rows 8A, 8B. Each of the nozzle rows 1 A to 8 B is actually formed by 90 nozzles 1 18 . Then, as described above, in each of the nozzle rows 1 A to 8 B, these 90 nozzle systems are arranged in the X-axis direction. However, in Fig. 5, for convenience of explanation 5, each of the nozzle rows 1A to 8B is formed by four discharge nozzles (nozzles 118). Further, in FIG. 5, the leftmost nozzle 1 18 of the nozzle row 1A is the reference nozzle 1 18R of the head 1 141, and the leftmost nozzle 1 18 of the nozzle row 2A is the head 1 142 of the nozzle 1 142. Nozzle row 3 A The leftmost nozzle 1 18 is the reference nozzle 1 18R of the head 1 1 4 3 , the leftmost nozzle row 1 18 of the nozzle row 4A is the head 1 144 reference nozzle 118R, and the nozzle column 5A is the leftmost nozzle 118 Nozzle 1145 reference nozzle 1 1 8R. -19- (17) (17) 1269073 In the present embodiment, the product of the nozzle interval HXP in the X-axis direction of the head 1 14 and the number of discharge nozzles of the head 1 1 4 is expressed as "the effective length hl of the head". In the example of Fig. 5, the nozzle interval HXP is 70 μm and the number of ejection nozzles is 8, so that the effective length H L of the nozzle is 560 μm. Further, in the present embodiment, one head 1 14 is formed by four consecutive sub ranges S R . The length DL of the sub-range SR in the X-axis direction is 1/4 times the effective length HL of the head. In the following description, the four sub-ranges S R of the head 1 14 are oriented in the positive direction (the right side of the drawing) in the X-axis direction, and are referred to as the sub-ranges SRI, SR2, SR3, and SR4. According to the above description, the X coordinate of the reference nozzle U8R of each of the heads 114 is expressed as follows. The X coordinate of the reference nozzle 1 18R of the head 1 142 corresponds to the X coordinate which is only shifted by the X coordinate length of the reference nozzle 118R of the head 1141, and is further shifted by 1/2 times the nozzle interval ΗΧΡ. In the example of Fig. 5, the X coordinate of the reference nozzle 1 1 8 R of the nozzle 1 1 4 2 is the X coordinate of the reference nozzle 1 18R of the head 1 1 4 1 , and the length DL is only positive in the X-axis direction. The direction (the right direction in Fig. 5), the offset increases the length of the nozzle interval ΗΧΡ 1/2 times. The X coordinate of the reference nozzle 1 1 8R of the head 1 1 44 is 1 /2 times the X-coordinate length DL of the reference nozzle 11811 which is only offset from the head 1143. In the example of Fig. 5, the X coordinate of the reference nozzle 1 1 8 R of the head 1 1 4 4 is the X coordinate of the reference nozzle 1 1 8 R of the head 1 1 4 3 , and the length DL is only in the X-axis direction. The positive direction (the right direction of Fig. 5) 'offset increases the nozzle spacing H Xp by -20-(18) 1269073 1/2 times the length. Reference nozzle 1 of nozzle 1 143 X coordinate 5 of 18R shifting nozzle 1 1 4 2 reference nozzle 1 1 8 R X coordinate length mark, more offset 1/4 times or 3/4 times of nozzle interval HXP, The position of the reference nozzle 1 1 8R of the nozzle 143, the X coordinate of the reference nozzle 1 1 8 R of 1 1 4 3 is only directed to the X direction (the right direction of FIG. 5), and the offset is divided by the length D1. /2 times the length,. However, the "offset X-axis direction" includes not only the positive direction shift in the X-axis direction but also the negative direction offset. Further, in the present embodiment, the order of the order of the four heads 1 14 in which the heads 1141, 1142, 1143, and 1144 are sequentially arranged in the Y-axis direction may be in the negative direction of the Y-axis direction. Specifically, when the head 1 1 4 1 and the head are adjacent to the Y-axis direction, any arrangement is possible when the head 1143 and the head are connected to the x-axis direction. Figure 5 shows the configuration of the nozzles 1145, 1148 of the lower right nozzle group U4G, that is, the same configuration as the nozzles 1141, 1142, 1:. The positional relationship between the two head groups 1 adjacent to each other in the X-axis direction will be described based on the relationship between the head 1 1 4 5 and the head 1 I 4 1 . The X-coordinate of the reference nozzle 1 1 8 R of the nozzle 1 1 4 5 , the X coordinate of the reference nozzle 1 1 8 R; only the nozzle 1 1 4 | is for the X-seat only DL. In Fig. 5, the description of the square mouth gap 丨 in the direction of the nozzle is in the direction of the X-axis (the bottom of the drawing is arranged. However, the non-implementation ί 1 142 is adjacent to each other 1146, 1147, 143, The relative position of 14 of 1 144 is closed by the X-axis direction of the head 1 1 4 1 - 21 - (19) (19) 1269073, the nozzle interval HXP, and the length of the product of the nozzle 114. The positive direction of the direction is offset. In the present embodiment, the nozzle spacing HXP is about 70 μm, and the number of ejection nozzles of one nozzle is 160, and the X coordinate of the reference nozzle 11 8 R of the nozzle 1 4 5 The X coordinate of the reference nozzle U8R of the head 1141 is shifted by only 11·2Γηηη (70μΓηχ160) in the positive direction of the X-axis direction. However, in the fifth figure, the discharge of the head 1 1 4 1 is illustrated for convenience. The number of nozzles is eight, and the X coordinate of the reference nozzle 1 18R of the head 1 1 4 5 is drawn as the X coordinate of the reference nozzle 1 141 of the head 1 141, and is shifted by only 5 60 μm (70 μπι 8). 4 1 and the head 1 1 4 5 are arranged as described above, the X seat of the rightmost discharge nozzle of the nozzle row 1 A The X coordinate of the leftmost discharge nozzle of the nozzle row 5 A is only offset from the nozzle interval LNP. To this end, the nozzle spacing of the two nozzles U4G in the overall X-axis direction is the nozzle spacing of the nozzle 1 1 4 in the X-axis direction. The nozzle interval in the X-axis direction of the entire bracket 1300 is also 1 7.5 μm 5 , that is, 1/4 times the nozzle interval X in the X-axis direction of the nozzle 114, and 6 nozzles are arranged. The head group 114G. However, in the present specification, the heads 1Μ1, the heads 1144, the heads 1 1 4 5, and the like, and the heads 1 1 4 4 at both ends of one head group 1 1 4 G are referred to as “reference heads”. In the length range of the nozzle spacing 沿着 along the X-axis direction 1, the X-axis coordinate portion of the four nozzles 1 18 is included, and is referred to as the overlapping portion G (G1 to G7 in Fig. 5). In Fig. 5, in the overlapping portion G 1, the nozzle 1 1 of the nozzle row 1 8, is included, and the nozzle 1 1 8 of the right side of the nozzle row -22- (20) (20) 1269073 2A And the second nozzle 1 1 8 on the left side of the nozzle row 3 A and the leftmost nozzle 1 18 of the nozzle row 4A. Similarly, the rightmost nozzle of the nozzle row 1 B is included in the overlap portion G 2 . 11 8 and the second nozzle 1 1 8 on the right side of the nozzle row 2B and the second nozzle 1 1 8 on the left side from the nozzle row 3 B and the leftmost nozzle 1 18 of the nozzle row 4 B. Further, the overlapping portion G 3, the rightmost nozzle 1 1 8 including the nozzle row 2 A and the rightmost nozzle 1 1 8 of the nozzle row 3 A and the rightmost nozzle 1 1 8 of the nozzle row 4 A and the leftmost of the nozzle row 5 A Nozzle 1 1 8. According to the head configuration of the present embodiment, at any one of the overlapping portions G1 to G7, the nozzle 1 1 8 of the subsidiary sub-range SR 1 and the nozzle 1 1 8 of the subsidiary sub-range S R2 , and the subsidiary sub-range SR 3 are included. The nozzle 1 18, and the nozzle 1 1 8 of the sub-range S R4. However, the number of nozzles included in the sub-range SR1 of one overlapping portion (for example, the overlapping portion G1), the number of nozzles in the sub-range SR2, and the number of nozzles in the sub-range SR3 are the same as the number of nozzles in the sub-range SR4. For example, in the fifth figure, the superimposed portion G1 includes the sub-nozzle 1 1 8 of the sub-range SR4 and the nozzle 1 1 8 of the sub-sub-range SR3, and the nozzle 1 1 8 of the sub-sub-range SR2, and the sub-range SR1 The nozzles 1 1 8 each contain one.

Moreover, according to the head configuration of the present embodiment, the X coordinate of the rightmost nozzle row 1 18 of the nozzle row 1 B is nearly identical to the X coordinate of the rightmost nozzle 1 18 of the nozzle row 1 A, and the nozzle row 5 A is the middle of the X coordinate of the leftmost nozzle 1 1 8 . Then, the X coordinate system of the second nozzle 1 1 8 on the right side of the nozzle row 2 A is nearly identical to the X coordinate of the rightmost nozzle Π 8 of the nozzle row 1 B and the X of the rightmost nozzle 1 1 8 of the nozzle column IB. In the middle of the coordinates. The X coordinate of the second nozzle 1 1 8 on the left by the nozzle row 2 A • 23- (21) (21) 12279073 is nearly identical to the X coordinate of the rightmost nozzle 1 1 8 of the nozzle row 1 A, and the nozzle In the middle of the X coordinate of the second nozzle 1 1 8 on the right side of column 2A. The X coordinate of the second nozzle 1 1 8 of the nozzle row 3 A is nearly identical to the X coordinate of the rightmost nozzle 1 1 8 of the nozzle row 1 A, and the second nozzle 1 1 8 of the right side of the nozzle row 2A The middle of the x coordinate. The X coordinate of the leftmost nozzle 1 18 of the nozzle row 4 A is nearly identical to the X coordinate of the second nozzle U 8 from the right side of the nozzle row 2A, and the X coordinate of the rightmost nozzle 1 18 of the nozzle row 1 B in the middle. (E. Control Unit) Next, the configuration of the control unit 1 1 2 will be described. As shown in Fig. 6, the control unit 1 1 2 includes an input buffer memory 200, a memory means 202, a processing unit 204, a scan drive unit 206, and a head drive unit 208. The buffer memory 2 0 2 and the processing unit 2 0 4 are communicably connected to each other. The processing unit 204 and the memory means 202 are communicably connected to each other. The processing unit 204 and the scan driving unit 206 are communicably connected to each other. The processing unit 204 and the head drive unit 20 are communicably connected to each other. Further, the scan driving unit 206 can communicate with each other by communicating the first position control means i 04 and the second position control means 108. Similarly, the head drive unit 208 can be communicably coupled to the plurality of heads 1 14 . The input buffer memory 200 receives the discharge data from which the liquid material 11 1 1 is discharged by the external information processing device. The spit data includes information showing the relative positions of all the spouted parts on the substrate, and the unexposed part is not applied, and the liquid material]1 1 is applied to the desired -24-(22) (22)1269073 The relative scan count data required for the thickness, and the information designated as the nozzle 1 1 8 for opening the nozzle 8 8 A, and the data designated as the closing nozzle π 8B working nozzle 1 18 . The description of opening the nozzle 1 8a and closing the nozzle 1 1 8B will be described later. The input buffer memory 200 is supplied with the discharge data to the processing unit 204, and the processing unit 204 stores the discharge data to the memory means 02. In Fig. 6, the memory means 202 is a RAM. The processing unit 205 displays the data indicating the relative position of the nozzle 1 18 of the spouted portion based on the discharge data in the memory means 208, and supplies the data to the scan driving unit 206. The scan driving unit 206 supplies the driving signals corresponding to the data and the period EP (Fig. 7) to the i-th position control means 1 〇 4 and the second position control means 丨 08. This result is relative to the scanning head 1 14 for the portion to be ejected. On the other hand, the processing unit 204 supplies the selection signal s c indicating the opening and closing of the nozzles 1 18 for each discharge time to the head driving unit 208 based on the discharge data stored in the memory means 202 and the discharge period EP. The head driving unit 208 gives a discharge signal ES required for discharging the liquid material 111 to the head 1 1 4 based on the selection signal sc. As a result, the liquid material 11 1 is discharged as a liquid droplet due to the nozzle 丨 8 corresponding to the nozzle 4. The control unit 1 12 is a computer including a CPU, a ROM, and a RAM. At this time, the above-mentioned functions of the ^@1 1 2 are implemented by a software program via a computer. Of course, the control unit 1 1 2 can be realized by a dedicated circuit (hardware). Next, the configuration and function of the head driving unit 208 of the control unit 112 will be described. Further, as shown in Fig. 7(a), the head driving unit 208 has one driving signal generating unit 203 and a plurality of analog switches AS. As shown in FIG. 7(b), the drive signal generating unit 203 generates a drive signal DS. The potential of the drive signal DS changes temporally with respect to the reference potential L. Specifically, the drive signal D S includes a discharge waveform P which is repeated with a plurality of discharge periods EP. Here, the discharge waveform P is discharged from the nozzles 1 1 8 and corresponds to the drive voltage waveform to be applied between the electrodes of one pair of the vibrators 1 24 . The drive signal DS is supplied to the input terminals of the various types of ratio switches AS. Each analog switch AS is provided corresponding to the address electrode 1 27 . That is, it is the same as the number of analog switches AS and the number of address electrodes 127 (i.e., the number of nozzles 1 18). The processing unit 204 supplies the selection signal SC (SCI, SCI, ... in Fig. 7) for displaying the opening and closing of the nozzle 118 to the various types of ratio switches AS. Here, the selection signal SC is independent of the analog switch AS, and independently obtains either of the high level and the low level. On the other hand, the analog switch AS corresponds to the drive signal DS and the selection signal SC, and the discharge signal ES (ESI, ES2, ... in Fig. 7) is supplied to the electrode 124A of the vibrator 124. Specifically, when the selection signal SC is at a high level, the analog switch AS uses the electrode 124A as the discharge signal ES to propagate the drive signal DS. On the other hand, when the selection signal SC is at the low level, the potential of the discharge signal E S output from the analog switch A S is the reference potential L. When the electrode 1 2 4 A of the vibrator 1 2 4 is supplied with the drive signal D S , the liquid material 1 1 吐 is discharged from the nozzle 1 1 8 corresponding to the vibrator 1 24 . However, 26-(24) 1269073 is supplied to the reference potential L at the electrode 124B of each vibrator 124. In the example shown in FIG. 7(b), in each of the two discharge signals ESI and ES2, the discharge waveform P is expressed in a period 2EP of twice the discharge period EP, and is selected in each of the two selection signals SCI and SC2. , set the period of high level and the period of low level. Thereby, the liquid material 1 1 1 is discharged by the nozzles 1 1 8 corresponding to each of the two nozzles at a period of 2 EP. Further, among the vibrators 1 24 corresponding to the two nozzles 1 18, the common drive signals DS from the common drive signal generating portion 203 are supplied. For this reason, the liquid material 1 1 1 is discharged from the two nozzles 1 18 and at approximately the same time. With the above configuration, the discharge device 100 performs the coating scan of the liquid material 1 1 1 in accordance with the discharge data supplied from the control unit 1 1 2 . (F. Example of F. Discharge Method) Referring to Figs. 8(a) and 8(b), the stripe-shaped target parallel to the X-axis direction, that is, the discharge device 1 L0, the discharge device 1 〇0 discharges liquid. The method of material 111. However, in the example shown in Fig. 8(a), the nozzles 1 1 4 1 , 1 1 4 2, 1 1 4 3, 1 1 4 4 illustrated in Fig. 5 are relatively moved in the Y-axis direction of the carriage 103. 1 1 4 5, 1 1 4 6 , 1 1 4 7 is in this order, and overlaps with the spouted portion 18L. Further, in Fig. 8, the divergent portions G1 to G7 of Fig. 5 are also displayed. As shown in Fig. 8(a), first, the carriage 103 starts to move relative to the stage 106 in the Y-axis direction. Then, when the nozzle row 1 A is overlapped with the discharge portion H L , the nozzle 1 1 8 of the nozzle row 1 A discharges the material 111 from the nozzle 1 1 8 included in the overlapping portion G1. Figure 8 (b) -27- (25) 1269073 In the right side of the label "1 A", the ejection position B of the nozzle row 1 B is drawn in a black circle, and the nozzle in the nozzle row 1 B is first. The position of the column is reflected in a white circle. In the lower one of the nozzle rows 1 B, the nozzle row 2A is overlapped with the spouted 18L. When the nozzle row 2A is overlapped with the discharge portion 18L, the nozzle row 2A is in the nozzle 1 18, and the nozzle 1 1 8 included in the overlapping portion G 和 and the nozzle 1 1 8 included in the heavy portion G 2 are included in the overlapping portion. The nozzle 1 18 of G3 and the nozzle 1 1 8 of the overlapping portion G4 simultaneously discharge the material 1 1 1 into the discharged portion 1 8L. On the right side of the label "2A" of Fig. 8(b), the position at which the nozzle 2A is ejected is drawn in a black circle. Further, the ejection position of the nozzle row of the preceding nozzle row 2A is a white circle. In the lower one of the nozzle row 2A, the nozzle row 2B is superposed on the discharged 18 L. When the nozzle row 2 B is overlapped with the discharge portion 1 8 L, the nozzle row 2 B is in the nozzle 1 18, and the nozzle 1 1 8 included in the overlapping portion G 1 and the nozzle 1 1 8 included in the heavy portion G 2 The nozzle 1 1 8 included in the overlapping portion G 3 and the nozzle 1 1 8 in the overlapping portion G4 simultaneously discharge the material 1 1 1 in the form of the discharged portion 1 8L. On the right side of the label "2B" in Fig. 8(b), the position at which the nozzle 2B is ejected is marked with a black cymbal, and the ejection position of the nozzle row of the nozzle row 2B is white. After the circle is drawn, the nozzle rows 3A, 3B, 4A, 4B, 5A, 5B, 6A, 7A, 7B are superimposed on the ejection portion 8L' from the respective ejection rows 3A, 3B, 4A in this order. 4B, 5A, 5B, 6A, 6B, 7A, and 7B' The liquid material 111 is discharged to the discharged portion 18L· in the same manner as the nozzle rows 1A, IB, 2A, and 2B. RESULTS: 'The nozzle group 11 4 G is the stack of liquid contained in the crotch portion of the spouted part. The stack is listed in the 〇6B mouth at 5 out -28 - (26) (26) 1227073 part 1 8 L, In the period in which the Y-axis direction is relatively moved only once, the liquid material 1 1 1 is bucked by a length of 1/4 of the nozzle interval X in the X-axis direction of the head 1 1 4 , that is, at intervals of 17.5 μm. An example of the strip-shaped discharge portion 18L is a portion where a metal wiring is formed. Therefore, the discharge device 100 of the present embodiment is applied to a wiring manufacturing apparatus for manufacturing metal wiring by discharging a liquid wiring material. For example, the wiring manufacturing apparatus for forming the address electrode 54 can be applied to the support substrate 52 of the plasma display device 50 (Figs. 20 to 22) which will be described later. Fig. 30(a) is a graph schematically showing the appearance of the discharge amount of the head 1 14 along the X-axis direction. On the other hand, Fig. 30 (b) is a graph schematically showing the appearance of the discharge amount of the overlapping portions G1 to G7 in the X-axis direction. The horizontal axis of the two graphs of Figs. 3(a) and (b) is parallel to the axis of the X-axis direction, and corresponds to the position of the nozzle 1 18 of the head 112. On the other hand, the vertical axes of the two graphs of Figs. 30(a) and (b) indicate the discharge amount from the nozzles 1 18 . Further, the appearance of the discharge amount is plotted by interpolating the actual length HL of the head described with reference to Fig. 5. As shown in Fig. 30 (a), the discharge amount from the nozzles 1 18 at both ends of the head 1 14 is the largest, and the discharge amount from the nozzle 118 near the center of the head 1141 is the smallest. Then, the appearance of the discharge amount of the nozzle 1 18 in the X-axis direction is a nearly symmetrical shape with respect to the center of the head. Appearance of Fig. 30 The reason for adopting this shape is related to the reason for the manufacturing process of the head 112, and the explanation of the reason is omitted here. On the other hand, as shown in Fig. 30 (b), the discharge contours of the overlapping portions G1 to G7 in the X-axis direction have a length -29 - (27) (27) 1227073 degrees which is close to the effective length HL of the head. The shape of the period of 1/4 times (ie, length DL) is repeated. The reason is as follows. As shown in FIG. 5, for the X coordinate of the reference nozzle 1 1 8 R of one of the four nozzles 1 1 4 arranged in the Y direction, the other three nozzles 1 1 4 of the reference nozzle 1 1 8R The X coordinate is offset to the X-axis direction by an integral multiple of the near-length DL. Further, according to the head arrangement of the present embodiment, the nozzles 118 belonging to the sub-range SR1 and the nozzles 1 1 8 belonging to the sub-range SR4 are included in any of the overlapping portions G (G1 to G7 in Fig. 5). To this end, the nozzles 1 1 8 belonging to the various sub-ranges SR of the heads 1 14 are adjacent to the X-axis direction. Further, the number of the nozzles 1 1 8 included in the sub-range SR1 of the one overlapping portion G, the number of the nozzles 1 18 of the sub-range SR2, the number of the nozzles 1 18 of the sub-range SR3, and the nozzle of the sub-range SR4 The number of 118 is the same. Therefore, in the X-axis direction, for the parallel line, for example, for one stripe-shaped discharge portion 18L, the total volume of the liquid droplets discharged from the overlapping portions G1 to G7 is almost the same regardless of the total. Therefore, the appearance of the discharge amount in the X-axis direction along the overlapping portions G1 and G2, the appearance of the discharge amount in the X-axis direction along the overlapping portions G3 and G4, and the discharge amount in the X-axis direction along the overlapping portion G5 and G6. The appearance and the appearance of the discharge amount along the X-axis direction of the overlapping portions G7·G8 are almost the same shape. However, the length in the X-axis direction corresponding to the two overlapping portions G adjacent to each other is equal to DL. Thus, according to the present embodiment, as shown in FIG. 30(b), at the position of the nozzle 1 18 of each nozzle 1 14 , the discharge amount of the droplet from the nozzle 18 - 30 - (28) (28) 12279073 It is difficult to show the difference in the amount of discharge when the droplets are discharged from /1 1 4 g. This is the nozzle 1 1 8 of the various sub-ranges SR, and the head group 1 1 4 G is adjacent to the X-axis direction to offset the difference in the amount of discharge. Further, in the range of the effective length HL of the head, the overlapping portion G is arranged in eight. Therefore, the difference in the discharge amount in the X-axis direction along the effective length HL of the head 1 14 is also smaller. Here, in the direction in which the head group 114G relatively moves, the reference head 114 is placed at the overlap portion G at the foremost position, and the ejection order of the droplets of the liquid material is as follows. First, the droplets are played in the middle of the two positions at a certain distance from the direction. Then, the next drop is played at the middle of the two positions where the droplet has been covered. Then, repeat the pattern of the position of the bullet. For example, via the overlapping portions G1 and G2 of Fig. 8, first, in the X-axis direction, each of the droplets is bounced only at P1 and P2 which are separated from the nozzle interval HXP. Next, at P 3 located between the middle of p 1 and p 2 , the droplets are bombarded. Then, more than the P 4 located between P 1 and P 3 , the droplets are bombarded. Then p5, located between the middle of P3 and P2, bounces the droplet. Thus, according to the nozzle configuration of the present embodiment, is the droplet for itself? In the early position and in the two positions of the handle, the two droplets of the bomb can be contacted first. For this reason, in the droplets which are subsequently bounced, the force acting in the opposite direction acts as a result, and the droplets which are bounced are expanded to a shape symmetrical from the projecting position. For this reason, according to the discharge method of the present embodiment, it is difficult to cause uneven coating of the liquid material. However, the present invention can be applied to the shower head 112 without even having the appearance of ejection as shown in Fig. 3A. Specifically, the present invention can be applied even to a shape asymmetrical about the center of the effective length HL of the head -31 - (29) 1269073. The total amount of discharge from the overlapping portion G is such that either one is the same, and the above effect can be obtained when each of the weights G includes the sub-range SR. Further, according to the present embodiment, in the discharge device, the nozzle interval in the X-axis direction of the head group 1 1 4G is 1/Ν times the nozzle interval in the x-axis direction of the head. Here, ν is the number of the heads 1 1 4 of the head group 1 14G. To this end, spit out the device!喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴As a result, a more dense elastic pattern can be formed in the X-axis direction only during the period in which the carriage 103 is moved once in the z-axis direction. [Embodiment 2] An example in which the present invention is applied to a manufacturing apparatus of a color filter substrate will be described. The substrate 10A shown in Figs. 9(a) and 9(b) is processed by a manufacturing apparatus 1 (Fig. 10) which will be described later, and becomes a substrate of the color filter substrate 1A. The base 10A has a plurality of discharged portions 18R, 18G, and 18B arranged in a matrix. Specifically, the substrate 10A includes a light-transmitting support substrate 12, a black matrix 14 formed on the support substrate 12, and a partition 16 formed on the black matrix 14. The black matrix 14 is formed of a material having a light blocking property. Then, the partition walls 16 on the black matrix 14 and the black matrix 14 are positioned on the plurality of light-transmitting portions of the predetermined matrix in the support substrate 12, i.e., a plurality of pixel ranges of a predetermined matrix shape. -32- (30) (30)1269073 In the pixel range, the concave portion defined by the support substrate 1 2, the black matrix 144, and the partition wall 16 corresponds to the spouted portion 18R and the spouted portion 18G. The part 18B is discharged. The sputtered portion 18R is intended to form a range of the filter layer 1 Π FR that transmits only light in the red wavelength region, and the sputter portion 18 8 is a filter layer 1 1 1FG that is intended to form light that transmits only the green wavelength region. The range and the spouted portion 18b are ranges in which the filter layer 1 1 1 FB that transmits only the light in the blue wavelength region is formed. The base 10A shown in Fig. 9(b) is located on the imaginary plane parallel to both the X-axis direction and the Y-axis direction. Then, the row direction and the column direction of the matrix forming the plurality of spouted portions 18R, 18G, and 18B are parallel to the X-axis direction and the Y-axis direction. In the base 10A, the discharge portion 18R, the discharge portion 1 8 G, and the discharge portion 1 8 B are periodically arranged in this order in the Y-axis direction. On the other hand, the spouted portions 1 8 R are arranged in a row at a predetermined interval in the X-axis direction, and then the spouted portions 1 8 B are in the X-axis direction with a predetermined interval therebetween. Arranged in a column. However, the X-axis direction and the Y-axis direction are orthogonal to each other.

A specific interval LRY along the Y-axis direction of the spouted portions 1 8 R, that is, the interval is approximately 560 μm. This interval is the same as the specific interval L G 沿 along the x-axis direction of the spouted portion g 8 g. It is also the same as the specific interval LB 沿 along the x-axis direction of the spouted portion 1 § 彼此. Further, the plane image of the spouted portion 18R is a rectangle determined by the long side and the short side. Specifically, the length of the axial direction of the spouted portion 18R is approximately 100 μπι, and the length of the X-axis direction is approximately 200 μm. The spouted portion UG and the spouted portion 18' have the same shape and size as the spouted portion 1 8 R. The above-mentioned interval between the discharge portion 1 8 R -33 - (31) (31) 1269073 and the size of the discharge portion 丨 8 R are the same color of the high-definition television of the size of 4 inches. Range interval or size. The manufacturing apparatus 1 shown in Fig. 10 discharges the corresponding color filter material to the discharged portions 18R, 18G, and 18B of the substrate 1A of Fig. 9 . Specifically, the manufacturing apparatus 1 is provided in all of the discharge portions 18R, the discharge device 1〇〇R that applies the color filter material 1 1 1R, and the color filter material 1 on the dried discharge portion 1 8 R. The drying device 丨丨5 〇R ' and all the spouted portions 1 8 G, the discharge device 100G to which the color filter material n丨G is applied, and the color filter material 1 1 on the dried spouted portion 18G 1 G drying device 150 V, and all discharged portions 8 b, coating color filter material 11 1 B discharging device 1 〇 OB, and drying the color filter material on the ejection portion 1 8B Ii 1B drying device} 50B, and reheating (hot baking) the color filter materials 111R, 111G, 111B baking oven 160, and the baked color filter material n〗 R, n On the layer B of 丨g, 1 1 1 , a discharge device 1 〇〇c of the protective film 20, a drying device 150C for drying the protective film 20, and a curing device 165 for reheating and drying the protective film 20 are provided. Further, the manufacturing apparatus 1 is provided with a delivery substrate in the order of the discharge device 100R, the drying device 150R, the discharge device 100G, the drying device 150G, the discharge device 100B, the drying device 150B, the discharge device i〇OC, the drying device 150C, and the curing device 165. 〇Α 输送 conveying device 170. As shown in Fig. 11, the configuration of the discharge device 100R is the same as the configuration of the discharge device 10 of the first embodiment. However, instead of the ink tanks -34-(32) (32)1269073 101 and the transfer tube 11A, the discharge device 10OR is provided with a portion of the ink tank 101R and the transfer tube 110R for the liquid color filter material 111R, and the discharge device The 100R configuration is different from the configuration of the discharge device 10〇. In the same manner as the components of the discharge device 1R, the components of the discharge device 100R are denoted by the same reference numerals as in the first embodiment, and the description thereof will be omitted. The configuration of the discharge device 100G, the configuration of the discharge device ιοοΒ, and the configuration of the discharge device 100C are basically the same as those of the discharge device 1〇〇R. However, instead of the ink tank 1 〇 1 R of the discharge device 1 〇〇R and the transfer tube 110R, the discharge device 100G includes a portion for the ink tank and the transfer tube for the color filter material 1110, and the discharge device 100B is configured and spouted. The device 100R is different. Similarly, instead of the ink tank 1 0 1 R of the discharge device 1〇〇r and the transfer tube 1 1 〇r, the discharge device i 〇〇B prepares the ink tank and the portion of the transfer tube for the color filter material 111b, and the discharge device The configuration of i〇〇B is different from that of the discharge device 100R. Further, in place of the ink tank 101R of the discharge device 100R and the transfer tube i iOR, the discharge device 1A has a portion of the ink tank for the color filter material 1 1 1G and the transfer tube, and the discharge device 1〇〇 The configuration of c is different from the discharge device 100C. However, the liquid color filter materials 1 1 1 R, 1 1 1 B, and 1 1 1 G of the present embodiment are examples of the liquid material of the present invention. Next, the operation of the discharge device 100R will be described. The discharge device 1 〇 R is placed on the substrate 1 〇 A, and a plurality of discharged portions 18R arranged in a matrix are arranged to discharge the same material. However, it is explained in Examples 3 to 5. The substrate 10A may be replaced with a substrate for an electroluminescence display device, and -35-(33) (33) 12279073 may be replaced with a rear substrate of the plasma display device. The base body 10A of FIG. 12 is held in the X-axis direction and the γ-axis direction by the longitudinal direction and the short-side direction of the discharge portion 18R, and is held by the platform 106. First, before the scanning period of 1 is started, the control unit 1 The X coordinate of the nozzles 118 included in the overlapping portion G (G1, G2..· in Fig. 12) corresponding to the discharge data is accommodated in the X seat of the spouted portion 18r, and the bracket 103 is placed. That is, the head group 1 14G moves relative to the base 10A in the X-axis direction. The X coordinate range of the spouted portion 1 8 R is determined by the X coordinate of both ends of the long side of the spout portion 18R. In the present embodiment, the length of the long side of the spouted portion 18R is about 7.5 μm, and the nozzle spacing in the X-axis direction of the head group 1 14G is 17.5 μm. For this reason, 16 or 17 nozzles 18 of the nozzle group U4G enter the X coordinate range of one of the discharge portions 1 8R. From the nozzle 1 1 8 outside the X coordinate range, during the scanning period, no color filter material 1 1 1 R is discharged. However, in the present embodiment, "sweeping period" means that as shown in FIG. 29, one side of the carriage 103 is along the Y-axis direction, from one end E1 (the other end E2) of the scanning range 134 to the other end E2. (or one end E1), during a relative movement. The "scanning range 1 3 4" means that all of the spouted portions 1 8 R on the substrate 10 A are coated materials, and the range of the moving carriage 1 〇 3 is covered by the scanning range 1 3 4 . Is spit out i 8 R. However, depending on the situation, the term "scanning range" means a range in which one nozzle 1 18 is relatively moved, and may also mean a range in which one nozzle 1 18 is relatively moved, and may mean that one nozzle 1 1 4 is relatively moved. The scope. -36- (34) (34) 1269037 The control unit 112 is a discharge portion 18R that is arranged in the Y-axis direction with one nozzle 181 at a time interval of an integral multiple of the discharge period EP (Fig. 7(b)). Overlapping, the relative movement speed of the carriage 103 is determined. In this manner, the other nozzles 1 1 8 including the nozzle rows of the one nozzles 1 18 are overlapped with the respective discharge portions 18R at intervals of an integral multiple of the discharge period EP. In the present embodiment, the interval between the Y-axis directions of the spouted portion 18R is LRY (Fig. 8(b)), so that when the relative velocity of the cradle 103 of the stage 106 is V, ij ν V = LRY / (k) · EP). Here, k is an integer. When the scanning period of the first scanning period is started, the relative movement of the head group 1 14G is started from the positive direction E1 of the scanning range 1 34 and the positive direction of the Y-axis direction (the direction on the paper surface of Fig. 12). As a result, in the order of the nozzle rows 1A, IB, 2A, 2B, 3A, 3B, 4A > 4B, 5A, 5B, 6A, 6B, 7A, 7B, the nozzle rows of the nozzles invade to correspond to the spouted portion 丨8r The scope. However, between the first scan period, the X coordinate of the head group 1 1 4 G is not changed. In the example shown in Fig. 12, the color filter material i is discharged from the nozzle 丨丨8 belonging to the overlapping portion G1 from the first to fourth projecting positions on the left side of the discharge portion 1 8 R from the lower left side. R. From the left fifth to eighth projecting position, the color filter material 1 1 1 R is discharged from the nozzle 1 1 8 belonging to the overlapping portion G2. From the leftmost position of the left thirteenth to the i-th sixth, the color filter material 1 1 1 R is discharged from the nozzle 1 1 8 belonging to the overlapping portion G4. In one of the spouted portions 1 8 R, droplets of the color filter material 1 丨 R are discharged from the plurality of overlapping portions G. The volume of the liquid droplets ejected from each of the overlapping portions (i.e., the total volume of the -37-(35) (35) 1269073 droplets discharged from all the nozzles 1 1 8 of the overlapping portion G) are Similarly, the inside of the spouted portion 1 8R is uniformly covered by the color filter material 1 1 1 R. Further, as described in the first embodiment, the nozzles 1 1 8 belonging to the various sub-ranges SR are adjacent to the head group 1 1 4G, and adjacent to the X-axis direction, the difference in the discharge amount at the position of the nozzles 1 18 is easily eliminate. As a result, the unevenness of coating between the spouted portions 1 8 R is also inconspicuous. Further, according to the present embodiment, the color filter material 1 1 1R of a necessary volume can be ejected in one of the discharge portions 1 8R in one scanning period. This is the nozzle interval GXP of the nozzle group 1 14G in the X-axis direction, which is nearly 1/4 of the nozzle interval HXP of the X-axis direction of one nozzle 1 14 . For this reason, in one scanning period, more The nozzles 1 1 8 are superposed on one of the discharged portions. On the other hand, as shown in FIG. 12, in the first scanning period, the leftmost nozzle 1 1 8 of the nozzle row 1 A and the nozzle 1 1 8 of the nozzle row 2 A from the right from the right are The second nozzle 1 1 8 from the right of the nozzle row 3 A and the second nozzle 1 1 8 from the right of the nozzle row 4 A do not overlap the spout portion 18R once. Therefore, no discharge of any of the color filter materials 1 1 1 R is performed from the nozzles. When the first scanning period is terminated, the control unit 1 1 2 moves the head group 1丨4 G relatively in the X-axis direction, and then starts the scanning period, and discharges the color in the uncoated discharge unit 1 8 R. The filter material is 1 丨 r. In the above, only the process of applying the color filter material 1 1 1 R to the spouted portion 1 8R will be described. Hereinafter, a series of processes for obtaining one of the color filter substrates 10 via the manufacturing apparatus 1 will be described. -38- (36) (36) 1269073 First, the base 10 A of Fig. 9 was produced according to the following procedure. First, a metal thin film is formed on the support substrate 12 by a sputtering method or a vapor deposition method. Thereafter, a grid-like black matrix 14 is formed from the metal thin film via a microscopy process. The material of the black matrix 14 is exemplified by metallic chromium or chromium oxide. However, the support substrate 12 is a light transmissive substrate such as a glass substrate for visible light. Next, the support substrate 1 2 and the black matrix 14 are coated, and a photoresist layer made of a negative-type photosensitive resin composition is applied. On the photoresist layer, the photomask film in the shape of a matrix pattern is adhered to the photoresist layer. After that, the unexposed portion of the photoresist layer is etched

The engraved treatment is removed to obtain a partition wall 16 . Through the above works, the substrate 1 〇 A 〇 is obtained. However, instead of the partition wall 16, a partition wall made of resin black may be used. At this time, the metal thin film (black matrix 14) is not required, and the partition layer is only the _ layer. Next, the substrate was lyophilized to 10 A by treatment with oxygen plasma at atmospheric pressure. By this treatment, the support substrate 12, and the black matrix 14, and the surface of the support substrate 12 which is defined by the partition walls 16 (one part of the pixel range), and the surface of the black matrix 14, and The surface of the partition 16 is lyophilic. Further, after that, for the substrate 10 A, plasma treatment using 4 fluorinated methane as a processing gas is performed. By plasma treatment using 4 fluorinated methane, the surface of the partition wall 16 of each recess is fluorinated (treated as lyophobic), and previously treated with lyophilic support via plasma treatment using 4 fluorinated methane. Although the surface of the substrate 12 is subjected to some lyophilicity by the surface of the black matrix 14, the surfaces are still capable of maintaining lyophilicity. Thus, -39-(37) 1269073, the surface of the concave portion is defined by the support substrate 12, and the black matrix 14' and the partition wall 16. The surface of the concave portion is treated as the spouted portions 18R, 18G, 18B. However, due to the material of the support substrate 12, the material of the black matrix 14, and the material of the partition wall 16, even if the surface treatment is not performed, a surface having a desired lyophilic property and liquid repellency can be obtained. At this time, by the surface treatment described above, the surface of the concave portion defined by the partition wall 16 via the support substrate 12 and the black matrix i, that is, the substrate to be ejected 18R, 18G, and 18B is formed by the discharge portions 18R and 18B. The i〇A is sent to the platform 1〇6 of the ejection device 100R via the delivery device 170. Then, in Fig. 13(a), the discharge device 100R is discharged as described with reference to Fig. 13, and the color filter material 丨丨R is applied to the discharge portion 1 8R. The color filter material 丨丨1R 'transporting device 17G is formed in the spouted portion 18R of the body 10A, and the substrate 10A is placed in the drying device i5〇R, and the color filter material on the spouted portion 1 8R is completely dried. n The filter layer i11FR is obtained on the spouted portion 18R. Next, the transport device 170 places the substrate 1A on the platform 106 where the 100G is discharged. Then, as shown in Fig. 13(B), the discharge 100G is formed by forming the color filter material on all of the discharge portions 18G', and the color filter material n i G is discharged from the head 112. Specifically, the discharge device 100G is a discharge method described with reference to Fig. 12, and the discharge portion 18G applies the color filter material U1G. When the color filter material niG is formed on the sputtered portion 18G' of all the substrates, the specification is as follows: the material is also not required to be 4, and 18G is outputted by, for example, the method: when there is a base layer. However, 1R, device device 1 1 1 G is delivered by :10A -40. (38) 1269073

When 17 turns, the substrate 10A is placed at the dry position i5〇G*^in to dry the color filter material lnG on the spouted portion 18G, and the filter layer 111FG is obtained on the exit portion 18G. Next, the transport device 170 is such that the substrate 1A is located on the platform 1〇6 of the spit 100B. Then, as shown in Fig. 13 (c), the spout 100B forms a layer of the colored furnace light sheet in all of the discharged portions 18B, and discharges the color filter material 丨丨丨B from the head 112.眞 The discharge device 100B applies the color filter material ι11β to the discharge unit g discharge unit 18B described with reference to Fig. 12 . The layering device 170 for forming the color filter material n i b is disposed in the drying device i5〇b at all of the substrate 10 8B. The color filter material ηΐί on the ejection portion 18B is completely dried, and the filter layer 1 1 ifb is obtained. Next, the transport device 170 places the substrate ι on the platform 106 of the spit 100C. Then, the discharge device i〇〇c is coated with a filter, 111FR, 111FG, 111FB, and a partition wall 16 to form a protective film material which is discharged into a protective film. After the protective film 20 is formed, the filter layer is formed, and the hard film 16 is completely cured by the heating protection film 20, and the substrate 1 〇A is the color filter substrate 10 . According to the present embodiment, the nozzle interval in the X-axis direction of each of the discharge devices 1 〇 〇 R, 1 〇 〇 G ′ head group 1 14G is 1 / N times the nozzle interval of the nozzle i] in the axial direction. Here, N is the number of heads 114 of the head group 114G. To this end, the spouting device U戋, after the spit is discharged: the device discharge device 1 1 1 B ^ body t, when the body 10A ^, then, i, at the device light sheet; The ground 1 1 1 FG device becomes a color, 100 B 4 X is contained in the jet 1 00R, -41 - (39) (39) 12279073 100G, 100B, the nozzle line density in the x-axis direction is higher than that of the conventional ink jet device. The nozzle line density in the axial direction is high. Therefore, the manufacturing apparatus 1 can apply only the discharge data, and can apply the color filter material to the discharge portions of various sizes. Further, in the manufacturing apparatus 1, only the discharge data can be changed, and various color filter substrates can be manufactured. Further, according to the present embodiment, the droplets of the reflective electrode n丨 are discharged from the plurality of overlapping portions G at the respective discharge portions 1 8 R, 1 8 G, and 1 8 B '. The total volume of the liquid droplets ejected from the respective overlapping portions G (i.e., the total volume of the liquid droplets ejected from all the nozzles 8 included in all of the overlapping portions G) is the same, and the spouted portion is 1 8 R In the case of 1 8 G and 1 8 B, the color filter material 1 1 1 R is uniformly coated. Further, as described in the embodiment, the nozzles 1 18 belonging to the various sub-ranges SR are adjacent to the X-axis direction in the head group 1 14G, and the difference in the discharge amount at the position of the nozzles 1 18 is easily offset. As a result, coating unevenness between the spouted portions 1 8R or coating unevenness between the spouted portions 1 8 G or unevenness in coating between the spouted portions 1 8 B becomes inconspicuous. Furthermore, according to the present embodiment, the droplets of the color filter materials 1 1 1 R, 1 11 G, and 1 1 1 B are in the middle of the position where the two droplets have been covered. . For this reason, the droplets that are played are then in contact with the two droplets that were previously played in the position where the droplets of the self are symmetrical. For this reason, the droplets that are played back are diffused in a shape symmetrical from the position of the projectile. For this reason, according to the discharge method of the present embodiment, it is difficult to cause uneven coating of the color filter materials 1 1 1 R, 1 1 1 G, and 1 1 1 B. -42 - (40) 1269073 [Embodiment 3] The present invention is applied to an apparatus for electroluminescent display device, which is formed by the addition of the layer 36 and the rectangular shape. The substrate 30A shown in Figs. 14(a) and 14(b) is processed by a manufacturing device 2 (Fig. 15) which will be described later, and the substrate substrate 30A which is the electroluminescent display device 30 has a plurality of substrates which are arranged in a matrix. Parts 38R 38G, 38B. Specifically, the substrate 30A has a support substrate 32, and a circuit element layer 34 formed on the support substrate 32, and a plurality of pixel electrodes 36 formed on the circuit element 34, and formed between the plurality of pixel electrodes. The partition wall 40. The support substrate is a light transmissive substrate such as a glass substrate for visible light. Each of the plurality of pixel electrodes 36 is an electrode having light transmissivity, such as an IT 0 (indium tin oxide) electrode. The plurality of pixel electrodes 36 are arranged on the circuit element layer 34 in a matrix, each of which has a predetermined pixel range. Then, the partition wall 40 has a lattice shape surrounding each of the plurality of pixel electrodes 36. Further, the partition wall 40 is formed of the inorganic partition wall 40A formed on the circuit element layer 34 and the organic partition wall 40B of the machine partition wall 40A. The circuit element layer 34 has a plurality of spur electrodes on the support substrate 32 extending in a specific direction, and an insulating film 42 formed by coating a plurality of smear electrodes, and on the insulating film 42, The scanning electrode extends in a direction of a plurality of signal electrodes extending in an orthogonal direction, and a switching element 44 of -43-(41) (41) 1260073 located near the intersection of the scanning electrode and the signal electrode is covered with a plurality of The switching element 44 is formed of a layer of an interlayer insulating film 45 of polyimide or the like. The gate electrode 44G and the source electrode 44S of each switching element 44 are connected to the respective scan electrodes and the corresponding signal electrodes. On the interlayer insulating film 45, a plurality of pixel electrodes 36 are placed. In the interlayer insulating film 45, a via hole 44V is provided in a portion corresponding to the drain electrode 44D of each switching element 44, whereby the switching element 44 is formed by the via hole 44V, and the electrical property between the corresponding pixel electrode 36 is formed. connection. Further, at the position corresponding to the partition wall 40, respective switching elements 44 are located. That is, when viewed in a direction perpendicular to the plane of the paper of Fig. 13 (b), the plurality of switching elements 44 are positioned over the switching element 44. The concave portion (a part of the pixel range) defined by the pixel electrode 36 of the base 30A and the partition wall 40 corresponds to the discharge portion 38R, the discharge portion 38G, and the discharge portion 38B. The discharge portion 38R is a range of the light-emitting layer 2 11 FR of the light beam in the wavelength region to be red, and the discharge portion 38 G is a range of the light-emitting layer 21 1FG which is a light beam to form a green wavelength region, and the discharge portion 38B is a portion The range of the luminescent layer 211 GB of light that is intended to form a blue wavelength region. The base 30A shown in Fig. 14 (b) is located on the imaginary plane parallel to both the X-axis direction and the Y-axis direction. Then, the row direction and the column direction of the matrix of the plurality of spouted portions 3 8 R, 3 8 G, and 3 8 B are formed in parallel with the X-axis direction and the Y-axis direction. In the base body 30A, the discharge portion 38R, the discharge portion 38G, and the discharge portion 38B are periodically arranged in this order in the Y-axis direction. On the other hand, the spouted portions 3 8 R are arranged in a row at a predetermined interval in the X-axis direction, and are spit-44-(42) (42) 1226073. The axial direction is arranged in a line at a predetermined interval, and similarly, the discharged portions 38B are arranged in a line in a predetermined interval at a predetermined interval in the X-axis direction. However, the X-axis direction and the γ-axis direction are orthogonal to each other. The specific interval LRY along the Y-axis direction of the spouted portions 38R, that is, the interval is approximately 560 μm. This interval is the same as the specific interval LGY along the x-axis direction of the spouted portion 3 8 G, and is also the same as the specific interval LB 沿 along the x-axis direction of the spouted portion 18 8 . Further, the plane image of the spouted portion 3 8R is a rectangle determined by the long side and the short side. Specifically, the length of the spouted portion 38R in the Y-axis direction is approximately 1 〇〇 μπι, and the length of the X-axis direction is approximately 300 μπι. The discharge portion 38G and the discharge portion 38A have the same shape and size as the discharge portion 38R. The above-described interval between the discharge portions 38R and the above-described size of the discharge portion 38R correspond to a pixel interval or size of the same color of a high-definition television of a size of 40 inches. The manufacturing apparatus 2 shown in Fig. 15 is a device for discharging the corresponding luminescent material to the discharged portions 38R, 38G, and 38 of the substrate 30 of Fig. 14 . The manufacturing apparatus 2 is provided in all the discharge parts 3 8 R, the discharge apparatus 200R to which the luminescent material 211R is applied, and the drying apparatus 2 5 0 R which illuminates the luminescent material 2 1 1 R on the discharge part 38R, and all of the discharge apparatus 2 The portion 3 8 G, the discharge device 200G coated with the luminescent material 21 1G, and the drying device 2 5 0 G for drying the luminescent material 2 1 1 G on the discharge portion 3 8 G, and all the discharged portions 38 Β, coated with luminescence The material 21 is discharged from the discharge device 200 Β, and the drying device 2 5 Β of the luminescent material 2 1 1 Β on the discharge portion 3 8 Β is dried. -45- (43) (43) 1269073 The manufacturing apparatus 2 further has a transport base 30A in the order of the discharge device 20 OR, the drying device 25 OR, the discharge device 200G, the drying device 250G, the discharge device 200B, and the drying device 250B. Conveying device 270. The discharge device 200R shown in Fig. 16 is provided with an ink tank 201R for holding a liquid luminescent material 211R, and a transfer tube 210R for supplying a discharge scan of the luminescent material 2 1 1 R from the ink tank 2 0 1 R by a transfer tube 210R. Department 1 02. The configuration of the discharge scanning unit 102 is the same as that of the discharge scanning unit 1 2 (Fig. 1) of the first embodiment, and the same components are denoted by the same reference numerals, and the description thereof will not be repeated. Further, the configuration of the display device 200G and the configuration of the display device 20B are basically the same as those of the discharge device 200R. However, in place of the ink tank 201R and the transfer tube 210R, the discharge device 200G includes a portion for the ink tank and the transfer tube for the luminescent material 211G, and the discharge device 200g is different from the discharge device 200R. Similarly, instead of the ink tank 201R and the transfer tube 210R, the discharge device 200B is provided with a portion for the ink tank and the transfer tube for the light-emitting material 201B, and the discharge device 200B is configured differently from the discharge device 20 0R. However, the liquid luminescent materials 2 1 1 R, 2 1 1 B, and 2 1 1 G of the present embodiment are examples of the liquid material of the present invention. A method of manufacturing the electroluminescence display device 30 using the manufacturing apparatus 2 will be described. First, the substrate 30A shown in Fig. 14 is produced by using a known film forming technique and patterning technique. The receiver's liquefaction of the substrate 30 A by oxygen treatment under a large heat. By this treatment, the surface of the pixel electrode 36 of each of the recesses (one part of the pixel range) specified by the pixel electrode 36 and the partition wall 40, and the inorganic-46-(44) (44) 1227073 partition wall 4 The surface of 0 A and the surface of the organic partition wall 40 B are lyophilic. Further, after that, for the substrate 30 A, plasma treatment with 4 fluorinated methane as a processing gas was performed. By plasma treatment using tetrafluoromethane, the surface of the organic partition wall 40B of each concave portion is subjected to fluorination treatment (the treatment is lyophobic), whereby the surface of the organic partition wall 40B becomes liquid repellency. However, the surface of the previously obtained lyophilic pixel electrode 36 and inorganic partition wall 40A loses some lyophilicity by plasma treatment using 4-fluorinated methane, but still maintains lyophilicity. Thereby, a specific surface treatment is applied to the surface of the concave portion defined by the pixel electrode 36 and the partition wall 16, and the surface of the concave portion becomes the discharged portion 38R, 38G, 38B. However, due to the pixel electrode 36 The material, the material of the partition wall 40, and the material of the partition wall 40 may have a surface having a desired lyophilic property and liquid repellency without performing the above surface treatment. At this time, it is not necessary to apply the above-described surface treatment, and the surface of the concave portion defined by the pixel electrode 36 and the partition wall 40 is the discharged portions 38R, 38G, and 38B. Here, the corresponding positive hole transport layers 37R, 37G, and 37B may be formed on each of the plurality of surface-treated pixel electrodes 36. The positive hole transporting layers 3711, 370, and 378 are located between the pixel electrodes 36 and the light-emitting layers 2 1 1RF, 21 1GF, and 21 1BF to be described later, and provide the light-emitting efficiency of the electroluminescence display device. When the positive hole transport layer is provided on each of the plurality of pixel electrodes 36, the concave portion defined by the vertical hole transport layer and the partition wall 40 corresponds to the discharge portions 3 8 R, 3 8 G, and 3 8 B. However, the positive hole transport layers 37R, 37G, 37B can be formed via the ink jet method -47-(45) 1269073. At this time, a solution for forming the material of the positive hole transport layers 37R, 37G, and 37B is applied in a specific amount for each pixel range, and then dried to form a positive hole transport layer. The substrate 30A forming the discharge portions 38R, 38G, and 38B is transported to the stage 1〇6 of the discharge device 200R via the transport device 270. Then, as shown in Fig. i7(a), the discharge device 200R forms a layer of the luminescent material 2 1 1 R in all of the discharged portions 38R, and discharges the luminescent material 211R from the head 1 1 4 . Specifically, the discharge device 200R applies the luminescent material 2 1 1 R to the discharged portion 380 R by the discharge method described with reference to Fig. 12 . When the luminescent material 21 1R layer is formed in the sputtered portion 38R of all the substrates 30A, the transporting device 270 places the substrate 30A in the drying device 250R. Then, the color filter material 2 1 1 R on the discharge portion 38R is completely dried, and the filter layer 21 1FR is obtained on the discharge portion 38R. Next, the transport device 270 places the substrate 30A on the platform 206 of the discharge device 200G. Then, as shown in Fig. 17 (b), the discharge device 200G is formed of the luminescent material 21 1G in all of the discharged portions 38G, and the luminescent material 211G is discharged from the head 114. Specifically, the discharge device 200G applies the luminescent material 21 1G to the discharged portion 380G by the discharge method described with reference to the drawings. When the luminescent material 211G layer is formed in the sputtered portion 38G of all the substrates 30A, the transporting device 270 places the substrate 30A in the dry position 2500 G. Then, the luminescent material 2 1 1 G on the spouted portion 3 8 G is completely dried, and the filter layer 2 1 1 FG is obtained on the spun portion 3 8 G. Next, the delivery device 270 is such that the substrate 30A is positioned on the platform 206 of the ejection device -48-(46) (46) 1260073 300B. Then, as shown in Fig. 17 (c), the discharge device 2A is formed as a layer of the luminescent material 21 1B in all of the discharged portions 38B, and the luminescent material 2 1 1 B is discharged from the head 1 1 4 . Specifically, the discharge device 200B is coated with the luminescent material 211B at the discharge portion 38B by the discharge method described with reference to FIG. When the layer of the luminescent material 211B is formed in the spouted portion 38B of all the substrates 30A, the transporting device 270 places the substrate 30A in the drying device 250B. Then, it is completely dried on the spouted portion 38B.

The light-emitting material 2 11B has a filter layer 211FB on the discharge portion 38B. As shown in Fig. 17, the counter electrode 46 is provided by coating the light-emitting layers 21 1FR, 21 1FG, 21 1FB and the partition wall 40. The counter electrode 46 operates as a cathode. Thereafter, the substrate 48 and the substrate 30A are closed and connected to each other at the peripheral portion, whereby the electroluminescent display device 30 shown in Fig. 17(d) is obtained. However, between the closed substrate 48 and the substrate 30A, the inert gas 49 is sealed. In the electroluminescence display device 30, light emitted from the light-emitting layers 211 FR, 211FG, and 211FN is emitted by the pixel electrode 36, the circuit element layer 34, and the support substrate 32. Thus, the electric excitation light display device that emits light by the circuit element layer 34 is called a bottom emission type display device. According to the present embodiment, in each of the discharge devices 200R, 200G, and 200B, the nozzle interval in the X-axis direction of the head group 1 1 4 G is 1/N times the nozzle interval in the X-axis direction of the head 1 1 4 . Here, N is the number of the heads 14 14 included in the head group 1 14G. For this reason, the nozzle line density in the X-axis direction of the discharge device 2 00R, -49-(47) 1269073 2 α 〇 G, 2 GOB is higher than the nozzle line density in the x-axis direction of the normal spray. Therefore, the manufacturing apparatus changes the discharge data, and can apply the material to the spouted parts of various sizes. Further, the manufacturing apparatus 2 is an electric excitation light display device in which only the discharge data is changed. Further, according to the present embodiment, the droplets of the luminescent materials 2 1 1 G and 2 1 1 B are ejected from the overlapping portions G of the plurality of discharged portions 3 8 G and 3 8 B, respectively. In the middle of the position where the droplet has been covered. For this purpose, the bombing liquid is then brought into contact with the first two droplets in two positions in which the self-bounce position is symmetrical. For this reason, the droplets that are bounced behind are diffusely bombarded with a positionally symmetrical shape. For this reason, according to the method of the present embodiment, it is difficult to generate the average of the luminescent materials 211R, 211G, and 211B. [Embodiment 4] The present invention is applied to a back surface infrastructure of a plasma display device. The substrate 50A shown in Figs. 18(a) and (b) is processed by a process 3 (Fig. 19) which will be described later, and becomes a back substrate of the plasma display device. The substrate 50 A has a plurality of 58R, 58G, 58B arranged in a matrix. Specifically, the substrate 50A includes the support substrate 32, and the stripe address electrode 54 is formed on the substrate 52, and the covered ink device 2 is only a light-emitting material, and the seed is made up of 3 8R, 21 1R, and 2 drops. The dielectric glass layer 50' formed by the discharge portion of the manufacturing apparatus 50B from which the coating plate is discharged is applied to the address electrode -50 (48) 1269073 54 and the predetermined plural number having the lattice shape The partition wall of the pixel range is 6 〇. The complex pixel ranges are in a matrix form. The matrix columns forming the complex pixel range are the address electrodes 54 of the complex numbers. Such a substrate 50A is formed by well-known printing techniques. In the respective pixel ranges of the substrate 30A, the concave portion defined by the wall 60 of the dielectric glass layer 56 corresponds to the discharged portion 58R, the 58G, and the discharged portion 58B. The portion to be emitted 58R is the range of the fluorescent layer 3 1 1 FR of the light to form the red region, and the range of the fluorescent layer 3 1 1 FG of the light in the wavelength region of the green portion by the discharge portion 5 8 G is the portion 58B The range of the phosphor layer 31 that forms the light of the blue wavelength domain. The base 50A shown in Fig. 18(b) is located on the imaginary plane parallel to each other in the X-axis direction and Y. Then, the row direction and the column direction of the matrix forming the re-extrusion portions 58R, 58G, and 58B are parallel to the X-axis direction and the Y-axis direction. The substrate 50A is periodically arranged in the order of the Y 8 axis, the discharged portion 58G, and the discharged portion 58B in the Y-axis direction. On the other hand, the discharge portions 5 8 R are arranged in a line in a predetermined axial direction with respect to each other in the axial direction, and the outlet portions 58G are arranged in a row along the X-axis direction, and are discharged in a row. The portions 5 8 B are arranged in a row at a certain interval on the X-axis. However, the X-axis 丨 axis directions are orthogonal to each other. At the same time in the Y-axis direction of the discharge portion 5 8 R, the wavelength corresponding to the screen and the interval discharge portion is the number of the axial direction in which the 1FB is to be discharged, and is the discharge portion. This is X, is spit, venting, and facing Y LRY, -51 - (49) (49) 1269073, that is, the interval is nearly 5 60 μπι. This interval is the same as the specific interval L G Y along the Y-axis direction of the spouted portion 5 8 G. It is also the same as the specific interval LB Y along the Y-axis direction of the spouted portion 5 8 B. Further, the plane image of the spouted portion 5 8 R is a rectangle determined by the long side and the short side. Specifically, the length of the spouted portion 58R in the Y-axis direction is approximately 1 〇〇 μηι, and the length of the X-axis direction is approximately 300 μπι. The spouted portion 58G and the spouted portion 58A have the same shape and size as the spouted portion 58R. The above-described interval between the discharge portions 58R and the pixel size interval or size of the same color of the high-definition television having a size corresponding to the size of 40 inches is the size of the discharge portion 58r. The manufacturing apparatus 3 shown in Fig. 19 is a device for discharging the corresponding fluorescent material to the discharged portions 58R, 58G, and 58 of the substrate 50 of Fig. 18. Specifically, the manufacturing apparatus 3 is provided in all of the discharge unit 58R, the discharge device 3 00R to which the fluorescent material 311R is applied, and the drying device 3 50R to dry the fluorescent material 31 1R on the discharge portion 58R, and all The discharge unit 5 8G, the discharge device 3 00G to which the fluorescent material 31 1G is applied, and the drying device 3 5 0 G for drying the fluorescent material 3 1 1 G on the discharge portion 5 8 G, and all the discharged portions 58B The discharge device 100B of the fluorescent material 311B is coated, and the drying device 3 50B of the fluorescent material 3 1 1 B on the discharge portion 5 8 B is dried. Further, the manufacturing apparatus 3 is provided with a conveying apparatus 3 for conveying the substrate 50A in the order of the discharging apparatus 300R, the drying apparatus 305R, the discharging apparatus 00G, the drying apparatus 305G, the discharging apparatus 00B, and the drying apparatus 305B. 7 0 吐 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 The groove 3 0 1 R is supplied to the discharge scanning unit 1 〇 2 of the color filter material. The configuration of the discharge scanning unit 1 〇 2 is described in the first embodiment, and the description of the repetition is omitted. The configuration of the display device 300G and the configuration of the display device 300B are basically the same as those of the discharge device 3000R. However, in place of the ink tank 301R and the transfer tube 310R, the discharge device 300G has a portion for the ink tank and the transfer tube for the fluorescent material 31 1G, and the discharge device 3 00G is different from the discharge device 300R. Similarly, instead of the ink tank 301R and the transfer tube 310R, the discharge device 300B is provided with a portion for the ink tank and the transfer tube for the fluorescent material 311B, and the discharge device 300B is configured differently from the discharge device 300R. However, the liquid fluorescent materials 3 1 1R, 3 1 1B, and 3 1 1 G of the present embodiment are examples of the liquid material of the present invention. A method of manufacturing a plasma display device using the manufacturing apparatus 3 will be described. First, on the support substrate 52, via a well-known screen printing technique

The dielectric glass layer 56 and the partition 60 are obtained by the substrate 50A shown in Fig. 18. Next, the substrate 50A is lyophilized by treatment with oxygen plasma at atmospheric pressure. By this treatment, the surface of the partition 60 of each of the recesses (one of the pixel ranges) defined by the partition 60 and the dielectric glass layer 56 and the surface of the dielectric glass layer 65 are lyophilic. The surface is formed into the discharge portions 5 8R, 5 8G, and 5 8B. However, due to the material, even if the above surface treatment is not carried out, there is a case where a surface having a desired lyophilic property can be obtained. At this time, it is not necessary to apply the above-described surface treatment, and the surface of the concave portion defined by the partition wall 60 and the dielectric glass-53-(51) 1269073 glass layer 56 is the discharged portion 3 8 R, 38B. The substrate 5〇a of the discharge portions 58R, 58G, and 58B is transported to the platform 〇6 of the discharge device 300R. As shown in Fig. 21 (a), the discharge device 300R discharges the phosphor 3 11R from the head 1 1 4 by forming a layer of the fluorescent material 3 1 1 R in all the discharged portions. Specifically, the discharge device 300R applies a fluorescent material 3丨丨R to the discharged portion 580R with reference to the discharge method of Fig. 12 . The sputtered portion 58R of the base 50A forms a fluorescent material 3丨1R layering device 3 70 such that the substrate 50A is located in the drying device 305R. The phosphor material 31 1R on the discharge portion 58R is completely dried, and the phosphor layer 311FR is obtained on the 58R. Next, the delivery device 370 places the substrate 50A on the platform 106 of the spun 300G. Then, as shown in Fig. 21 (b), the discharge 300G is formed in the discharge portion 58G, and the fluorescent material 311 is formed to discharge the luminescent material 3 1 1 G from the head 1 1 4 . Specifically, the spun 3 00G is coated with the fluorescent material 311G at a temperature of 58 G by the discharge method described with reference to Fig. 12 . When all of the base 50A is 58G to form the layer of the fluorescent material 311G, the conveying means 370 is located within the dry position of 3 5 0 G. Then, the luminescent material 3 1 1 G on the 5 8 G was completely dried, and 311 FG was obtained on the discharged portion 5 8 G. The pick-up device 370 is such that the base 50A is located on the platform 106 of the spit 300B. Then, as shown in Fig. 21(c), after the discharge 38G, after the return, such as 58R, the light material is described as being all the time, the discharge is performed, and the discharge unit is discharged from the apparatus G, and the discharge unit of the discharge unit is discharged. The fluorescent light-emitting device-out device -54-(52) (52)1269073 3 00B forms a layer of the fluorescent material 31 1B in all the spouted portions 58B, and discharges the luminescent material 3 1 1 B from the shower head 1 1 4 . Specifically, the discharge device 300B applies the phosphor material section "3 1 1B" to the discharge portion 58B by the discharge method described with reference to FIG. When the layer of the fluorescent material 31 1B is formed in the spouted portion 58B of all the substrates 50A, the transporting device 3 70 places the substrate 50A in the drying device 350B. Then, the luminescent material 311B on the discharge portion 58B is completely dried, and the fluorescent layer 311FB is obtained on the discharged portion 58B. Through the above work, the substrate 50A becomes the back substrate 50B of the plasma display device. Next, as shown in Fig. 22, the back substrate 50B and the front back plate 50C are bonded together by a known method to obtain a plasma display device 50. The front back plate 50C has a glass substrate 68, a display electrode 66A and a display scan electrode 66B parallel to each other on the glass substrate 68, and a dielectric glass layer 64 formed by the cover display electrode 66A and the display scan electrode 66B. The MgO protective layer 62 on the dielectric glass layer 64. The rear substrate 50B and the front back plate 50C are the address electrodes 54 of the rear substrate 50B, and the display electrodes 66A of the front back plate 50C and the display scanning electrodes 66B are orthogonally positioned to each other. The discharge gas 69 is sealed at a specific pressure in a unit (pixel range) surrounded by the partition walls 60. According to the present embodiment, the nozzle spacing in the X-axis direction of each of the discharge devices 3 00R, 300G, and 300B and the head group 1 1 4 G is WN times the nozzle interval in the X-axis direction of the head 1 1 4 . Here, N is the number of the heads 14 14 included in the head group 1 14G. For this reason, the nozzle line density in the X-axis direction of the discharge devices 3 00R, 300G, and 300B is higher than the nozzle line density in the X-axis direction of the conventional ink jet apparatus - 55-(53) (53) 1260073. Therefore, the manufacturing apparatus 3 can apply only the discharge material, and can apply the luminescent material to the discharge portion of various sizes. Further, the manufacturing apparatus 3 can change only the discharge data, and can manufacture various types of electric discharge devices. Further, according to the present embodiment, the droplets of the fluorescent materials 311R, 3 1 1 G, and 3 1 1 B are discharged from the plurality of overlapping portions G in the respective ejection portions 5 8 R, 58G, and 58B. The total volume of the liquid droplets discharged from the respective overlapping portions G (that is, the total volume of the liquid droplets discharged from all the nozzles 1 1 8 included in one overlapping portion G) are all the same, and the discharged portions 58R, 58G, The inside of 58B is uniformly covered by the fluorescent materials 311R, 311B, and 311G. Further, as described in the first embodiment, the nozzles 1 1 8 belonging to the various sub-ranges SR are in the nozzle group 1 1 4 G, and adjacent to the X-axis direction, the discharge amount difference at the position of the nozzle i J 8 It is easy to be offset. As a result, the coating unevenness between the discharged portions 58 8 r or the uneven coating between the discharged portions 5 8 G or the uneven coating between the discharged portions 5 8 B becomes inconspicuous. . Further, according to the present embodiment, the droplets of the fluorescent materials 3 1 1 R , 3 1 1 G, and 3 1 1 B are bounced at positions between the two positions covered by the droplets. For this reason, after that, the droplets that are bombarded are in two positions symmetrical with respect to the position at which the self is ejected, and are in contact with the two droplets that were previously played. For this reason, the droplets that are played back are diffused in a shape that is symmetrical from the position of the projectile. For this reason, according to the discharge method of the present embodiment, it is difficult to cause uneven coating of the fluorescent materials 311R, 311G, and 311B. [Embodiment 5] -56- (54) (54) 12270073 Next, an example in which the present invention is applied to a manufacturing apparatus of an image display device including an electron emitting element will be described. The substrate 70A shown in Figs. 23(a) and (b) is processed by a manufacturing apparatus 3 (Fig. 24) which will be described later, and serves as a substrate of the electron source substrate 70B of the image display apparatus. The base 70A has a plurality of discharged portions 78 arranged in a matrix. Specifically, the substrate 70A is provided with a substrate 72, a sodium diffusion preventing layer 74 located on the substrate 72, and a plurality of element electrodes 76A, 76B on the sodium diffusion preventing layer 74, and a plurality of element electrodes 76A on the plurality of element electrodes 76A. The metal wiring 79A and the plurality of metal wirings 79B on the plurality of element electrodes 76B. Each of the plurality of metal wires 79A has a shape extending in the Y-axis direction. On the other hand, each of the plurality of metal wires 79B has a shape extending in the X-axis direction. The insulating film 75 is formed between the metal wiring 79A and the metal wiring 79B, and is electrically insulated from the metal wiring 79A and the metal wiring 79B. The portion including the pair of element electrodes 76A and the element electrodes 76B corresponds to one pixel range. The pair of element electrodes 76A and element electrodes 76B are separated from each other by a predetermined interval, and are opposed to the sodium diffusion preventing layer 74. The element electrode 76A corresponding to a certain pixel range is electrically connected to the corresponding metal wiring 79A. Further, the element electrode 76B corresponding to the pixel range is electrically connected to the corresponding metal wiring 7 9B. However, in the present specification, portions of the combined base 72 and the sodium diffusion preventing layer 74 are indicated by the support substrate. In the pixel range of the substrate 70A, a portion of the element electrode 76A is -57-(55) (55)1269073, and a portion of the element electrode 76B, and a sodium diffusion preventing layer 74 exposed between the element electrode 76A and the element electrode 76B, Then, it corresponds to the spouted portion 78. More specifically, the discharge portion 78 is intended to form a range of the conductive film 411F (Fig. 27), the conductive film 411F is a portion covering the element electrode 76A, and a portion of the element electrode 76B, and the coated element electrodes 76A, 76B They are formed at intervals. As shown in Fig. 23(b), the plane shape of the spouted portion 78 of the present embodiment is circular. Thus, the planar shape of the spouted portion of the present invention may be a circle determined by the X coordinate range and the Y coordinate range. The base 70A shown in Fig. 23(b) is located on the imaginary plane parallel to both the X-axis direction and the Y-axis direction. Then, the row direction and the column direction of the matrix of the plurality of discharged portions 78 are formed in parallel with the X-axis direction and the γ-axis direction. In the base 70A, the plurality of discharged portions 78 are arranged in the X-axis direction and the Y-axis direction. However, the X-axis direction and the Y-axis direction are orthogonal to each other. A certain interval LRY along the Y-axis direction of the spouted portions 78R, that is, the interval is approximately 190 μm. Further, the length of the X-axis direction (the length of the X coordinate range) of the spouted portions 7 is approximately 100 μχη. The length of the x-axis direction (the length of the Υ coordinate range) is also approximately 100 μηι. The interval between the discharge portion 78 and the above-mentioned size of the discharge portion is a pixel interval or size of the same color of the high-fidelity television corresponding to a size of 40 inches. The manufacturing apparatus 4 shown in Fig. 24 is Each of the substrates 7 of Fig. 23 is discharged from the discharge portion 7 and the conductive thin film material 4 is discharged. Specifically, -58-(56) 1269073, the manufacturing apparatus 4 is provided in all the discharge parts 78, the discharge apparatus 400 which coats the film material 411, and the dry discharge part 78. The conductive film material 4 1 1 is dried. Device 4500. Further, the manufacturing apparatus is provided with a transporting device 470 that transports 70 A in the order of the discharge device, the 400, and the drying device 45. The discharge device 40 shown in Fig. 25 is provided with an ink tank 401 for holding a liquid conductive mooncake material 411, and a transfer tube 410 for supplying a discharge scan of the color filter material from the ink tank 410 by the transfer tube The configuration of the portion 1 〇 2 output scanning unit 012 is omitted in the description of the first embodiment. In the present embodiment, the liquid conductive film material 41 is an organic liquid. However, the liquid conductive film material of the present embodiment is an example of a liquid material. Here, a method of using the image display device of the manufacturing apparatus 4 will be described. First, a sodium diffusion preventing layer 74 as a main component is formed on a substrate 72 formed of soda glass or the like. Specifically, the sodium diffusion layer 74 is obtained by sputtering on the substrate 72 and forming a SiO 2 film having a thickness of 1 μΓ. Next, on the sodium diffusion preventing layer 704, a titanium layer having a thickness of 5 nm was formed by a sputtering method. Then, using the micro-shrinking technique and the etching technique, from the titanium layer, the plural pairs form the pair of the electrode electrodes 76A and the element electrodes 76B which are separated from each other by a predetermined distance. Then, an Ag paste is applied onto the element electrode 76A having the number of the sodium diffusion preventing layers 74 by a screen printing technique, and fired to form a plurality of metal wirings 79A extending in the axial direction. Next, using a net brush technique, one part of each metal wiring 7 9 A is coated with a glass paste, and the substrate is thin, and the substrate is thin, 4 10 0, but the palladium is dissolved by the Si02 method, and the radiation prevention or the real technology mutual Special and reversal Y-printing -59- (57) (57) 1269073 is fired to form an insulating film 75. Then, an Ag paste is applied onto the sodium diffusion preventing layer 74 and the plurality of element electrodes 76B by a screen printing technique to be fired to form a plurality of metal wirings 7 9B extending in the X-axis direction. However, the metal wiring 79B is formed. At the time of the metal wiring 79B, the Ag paste is applied to the metal wiring 79A by the insulating film insulating film 75. Through the above works, the substrate 70A shown in Fig. 23 is displayed. Next, the substrate was lyophilized to 70 A by treatment with oxygen plasma at atmospheric pressure. By this treatment, a part of the surface of the element electrode 76 A, a part of the surface of the element electrode 76B, and a surface of the support substrate exposed between the element electrode 76A and the element electrode 76B are lyophilized, and then the surfaces are formed. The spit portion 78 is discharged. However, due to the material, even if the above surface treatment is not carried out, there is a case where a surface having a desired lyophilic property can be obtained. At this time, it is not necessary to apply the above-described surface treatment, and a part of the surface of the element electrode 76A and a part of the surface of the element electrode 76B and the surface of the support substrate exposed between the element electrode 76A and the element electrode 76B are the discharge portions 78. The base 70A forming the spouted portion 78B is transported to the platform 106 of the discharge device 400 via the transport device 470. Then, as shown in Fig. 26, the discharge device 400 forms a conductive thin film 4 1 1 F at all of the discharged portions 7 8, and discharges the conductive thin film material 41 1 from the head 1 1 4 . Specifically, the discharge device 400 is coated with the conductive thin film material 4 1 1 at the discharge portion 78 by the discharge method described with reference to Fig. 12 . In the present embodiment, in order to make the diameter of the liquid droplets of the conductive thin film material 4 i i which is ejected on the ejected portion 78 in the range of 60 μη to 80 μm, the control unit 丨 2 is in the head-60- (58). ) 1269073 1 14 signal. In the spouted portion 78 of all of the substrates 70A, and the electrically thin film material 41 is layered, the transporting means 470 is such that the substrate is in the drying means 4500. Then, the discharged portion 7 8 of the conductive film material 411 is completely dried on the discharged portion 78 to obtain a palladium oxide conductive film 4 1 1 F. Thus, in a range of pixels, a part of the surface of the device electrode 76A is formed, and a portion of the element electrode 76B and the conductive film 4 1 1 F of the diffusion preventing layer 74 are exposed between the element electrode 76A and the element electrode 76B. Next, a pulse-shaped specific voltage is applied between the element electrode 76A and the element electrode 76B to the electron-emitting portion 41 1D of one of the conductive thin films 4 1 1 F . However, it is preferable to apply the voltage between the element electrodes 76A and 76B in an organic environment and a vacuum. In this case, the electron ratio from the conductive film 4 1 1 F is higher. The element electrode 76A and the corresponding element electrode 76B are placed on the conductive film 4 1 1 F of the electron-emitting portion 4 1 1 D. Further, each of the electron emitting elements corresponds to each pixel range. Through the above works, as shown in Fig. 27, the substrate 70A is the source substrate 70B. Next, as shown in FIG. 28, the electron source substrate 70B and the plate 70C are bonded together by a known method, and the image display device back surface plate 70C has the glass substrate 82 and is positioned on the glass substrate 82. The plurality of fluorescent portions 84 and the plurality of fluorescent portions 84 are plated 86. The metal plate 86 is operated to accelerate the electrode of the electron beam from the electron emission portion 4. Electron source substrate 70B and front back:

The formation of the conduction at the 70A position is mainly based on the surface of the coated element, and the element is placed on the front side of the electron. The front metal plate 11D plate 7 0C - 61 - (59) 1269073 is a plurality of electron emitting elements, each of which is aligned with the plurality of phosphor portions 84. Further, a vacuum state is maintained between the electron source substrate 70B and the front back plate 70C. However, the image display device 70 including the above-described electron emitting element is referred to as an SED (Surface Contact Electron Emission Display) or an FED (Electrode Emission Display). According to the present embodiment, the ejection device 400 and the nozzle of the head group 1 14G in the X-axis direction are provided. The interval is 1/N times the nozzle spacing of the nozzle 1 14 in the X-axis direction. Here, N is the number of nozzles 114 included in the head group 114G. For this reason, the nozzle line density in the X-axis direction of the discharge device 400 is higher than the nozzle line density in the X-axis direction of the conventional ink jet apparatus. Therefore, in the manufacturing apparatus 4, only the discharge data is changed, and the conductive thin film material 4 1 1 can be applied to the discharge portions of various sizes. Further, the manufacturing apparatus 4 can change the discharge data, and can manufacture a plasma display device of various intervals. According to the present embodiment, the conductive film material 4 is discharged from the plurality of overlapping portions G at the discharge portion 7 . 1 1 droplet. The total volume of the liquid droplets discharged from the overlapping portion G (that is, the total volume of the liquid droplets discharged from all the nozzles 1 1 8 included in the one overlapping portion G) are all the same, and the discharged portion 7 is via The conductive thin film material 41 1 is uniformly coated. Further, as described in the first embodiment, the nozzles 1 1 8 belonging to the various sub-ranges SR are adjacent to the X-axis direction in the nozzle group 1 1 4 G, and the discharge amount difference at the position of the nozzle 丨8 is It is easy to be offset. As a result, the unevenness in coating between the spouted portions 78 becomes inconspicuous. Further, according to the present embodiment, the liquid droplet of the conductive thin film material 41 is bounced in the middle of the position where the liquid droplets have been covered by the liquid droplets. For this reason, the droplets that are bombarded are in contact with the two droplets that were previously played in the position where the droplets of the self are symmetrical. For this reason, in the droplets that are subsequently bounced, the forces in the opposite directions are emitted, and as a result, the droplets that are subsequently bounced are diffused in a shape symmetrical from the projecting position. For this reason, according to the discharge method of the present embodiment, it is difficult to cause coating unevenness of the conductive thin film material 41. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a discharge device of a first embodiment. Fig. 2 is a view showing a carriage pattern of an embodiment i. Fig. 3 is a view showing the pattern of the head of the embodiment 1. Fig. 4 (a) and (b) are schematic views showing the discharge portion of the head of the embodiment. Fig. 5 is a view showing a relative positional relationship pattern of the heads of the head group of the first embodiment. Fig. 6 is a schematic view showing a control unit of the first embodiment. Fig. 7 (a) is a schematic view showing the head driving unit of the first embodiment. (b) is a timing chart showing the driving signal, the selection signal, and the discharge signal of the head driving unit. Fig. 8 (a) and (b) are schematic views showing the order of discharge from the liquid droplets of the head group of the first embodiment. Fig. 9 is a schematic view showing the substrate of the second embodiment. -63- (61) (61) 1269073 [Fig. 1] A schematic view of a manufacturing apparatus of the second embodiment is shown. Fig. 11 is a schematic view showing a discharge device of the second embodiment. Fig. 12 is a schematic view showing the discharge method of the second embodiment. Fig. 13 is a schematic view showing the manufacturing method of the second embodiment. Fig. 14 (a) and (b) are schematic views showing the substrate of the third embodiment. Fig. 15 is a schematic view showing the manufacturing apparatus of the third embodiment. Fig. 16 is a schematic view showing the discharge device of the third embodiment. Fig. 17 is a schematic view showing a manufacturing method of the third embodiment. Fig. 18 (a) and (b) are schematic views showing the substrate of the fourth embodiment. Fig. 19 is a schematic view showing the manufacturing apparatus of the fourth embodiment. Fig. 20 is a schematic view showing a discharge device of the fourth embodiment. Fig. 21 is a schematic view showing a manufacturing method of the fourth embodiment. Fig. 22 is a schematic view showing a manufacturing method of the fourth embodiment. Fig. 23 (a) and (b) are schematic views showing the substrate of the fifth embodiment. Fig. 24 is a schematic view showing the manufacturing apparatus of the fifth embodiment. Fig. 25 is a schematic view showing the discharge device of the fifth embodiment. Fig. 26 is a schematic view showing the manufacturing method of the fifth embodiment. Fig. 27 is a schematic view showing the manufacturing method of the fifth embodiment. Fig. 28 is a schematic view showing a manufacturing method of the fifth embodiment. [Fig. 29] A schematic diagram showing the scanning range. [Fig. 30] Schematic diagram showing the appearance of the discharge amount of Example 1.

[Description of main component symbols] -64- (62) (62)1269073 1, 2, 3, 4... Manufacturing equipment ΙΑ, IB, 2A, 2B, 3A, 3B, 4A, 4B···Nozzle 歹〇1 0A, 30A, 50A, 70A·"Base 100, 100R, 100G, 100B, 100C, 200R, 200G, 200B 3 0 0R, 3 00G, 3 00B, 400.··Discharge device 1 0 2...Spell out the cat department 1 03 ... bracket 104.. . 1st position control device 1 06 ... platform 10 8 ... second position control device 1 11 ... liquid material 111R, 111G, 111B ... color filter material 114, 1141, 1142, 1143, 1144 ... nozzle 1 12... control unit 1 14G... nozzle group

1 16A, 1 16B...nozzle 歹IJ 1 18...nozzle 1 1 8R...reference nozzle 1 2 4...vibrator 124C...piezoelectric element 124A, 124B...electrode 1 2 7...discharge unit 208 ...head drive unit 203.. drive signal generation unit-65- (63) 1269073 AS ... analog switch DS... drive signal 2 04... processing unit SC... selection signal ES... discharge signal 1 0A, 30A, 50A, 70A ...substrate 10.. .Color filter substrate

18R, 18G, 18B, 38R, 38G, 38B, 58R > 58G, 58B, 78 ... the spouted parts 111FR, 111FG, 111FB... filter layer 1 3 4... scan range 30.. Excitation light display device 5 0B... Back surface substrate of plasma display device 50... Plasma display device

-66-

Claims (1)

(1) (1) 1 260 907 X. Patent Application No. 1 - A discharge device comprising a platform and a discharge device for a head group that relatively moves the platform, wherein the nozzle group is a first nozzle and a second nozzle The nozzle, the third nozzle, and the fourth nozzle, each of the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle have p ejection nozzles The first nozzle of the first nozzle, the nozzle of the second nozzle, the nozzle of the third nozzle, and the nozzle of the fourth nozzle have a first nozzle length in the X-axis direction, and the P discharge nozzles are disposed. The first nozzle and the second nozzle are adjacent to each other in the Y-axis direction, and the third nozzle and the fourth nozzle are adjacent to each other in the Y-axis direction, and the X-coordinate of the reference nozzle of the second nozzle In the X coordinate of the reference nozzle of the first nozzle, the X coordinate of the second length is shifted by 1/2 times the length of the first step, and the reference nozzle of the fourth nozzle is The X coordinate is the reference for the third nozzle from the foregoing The X coordinate of the nozzle is shifted only by the X coordinate of the second length, and is further shifted by 1/2 times the length of the first one. The X coordinate of the reference nozzle of the third nozzle is from the second The X coordinate of the reference nozzle of the head is offset from the X coordinate of the second length, and is offset by 1/4 or 3/4 times the length of the first length, and the length of the second is the length of the first P/4 times, -67- 1269073 (2) P is a natural number of 2 or more, and the X-axis direction and the Y-axis direction are orthogonal to each other. 2. The discharge device according to claim 1, wherein the nozzles of the four nozzles are arranged in the X-axis direction. 3. The discharge device according to the first aspect of the patent application, wherein the nozzles of the P of the respective four nozzles are the first column and the second column extending in the X-axis direction, respectively. In the first column and the second column, the plurality of nozzles are arranged at twice the length of the first length, and the first column is only the first length of the second column. Offset in the aforementioned X-axis direction. 4. The dispensing device of claim 1, wherein the P nozzles of the four front nozzles are each one of the X-axis force extensions, respectively. In each of the above, the nozzles of the first one are arranged at intervals of the length of the first one, and for the other one of the above, the other (Μ-1) are only the aforementioned The length i times the length of 1 is not repeatedly shifted in the X-axis direction, and is a natural number of 2 or more, i is a natural number of 1 to (Μ-1). [5] The discharge device according to any one of claims 1 to 4, wherein the platform is a substrate having a discharged portion, and the front nozzle group is provided to the substrate. When the discharge nozzle of at least one of the discharge nozzles has invaded to a range corresponding to the discharge portion, the liquid discharge material is discharged from the discharge nozzle to the discharge portion. 6. The discharge device according to claim 5, wherein the planar image of the spouted portion is a nearly rectangular shape determined by a long side and a short side, and the platform has a direction in which the long side is parallel to the X-axis direction. At the same time, the direction of the short side is parallel to the direction of the y-axis, and the head group is held. The head group is relatively moved in the y-axis direction with respect to the base body, and at least two discharge nozzles of the discharge nozzles are provided. When the range corresponding to the spouted portion is invaded at the same time, the liquid material is discharged from the at least two discharge nozzles to the spouted portion. 7. A manufacturing apparatus for a color filter substrate, comprising: a stage for holding a substrate; and a discharge device for moving the head group relative to the stage, wherein the head group is a first head and a second head And the third nozzle and the fourth nozzle, wherein the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle have the base dischargeable liquid One of the discharge nozzles of the color filter material, the first nozzle of the first, the second nozzle, the nozzle of the third to 69-169,075, and the X-axis of the fourth nozzle The nozzles in the direction are the first length, and the P nozzles are disposed. The first nozzle and the second nozzle are adjacent to each other in the Y-axis direction, and the third nozzle and the fourth nozzle are Adjacent to the Y-axis direction, the X coordinate of the reference nozzle of the second nozzle is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the first nozzle, and is further offset by the 1/2 times the length of 1 The X coordinate of the reference nozzle of the fourth nozzle is offset from the X coordinate of the second length of the reference nozzle of the third nozzle, and is shifted by 1/2 times the length of the first length. The X coordinate of the reference nozzle of the third nozzle is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the second nozzle, and is shifted by 1/4 of the length of the first In multiples or 3/4 times, the length of the second is P/4 times the length of the first one, and P is a natural number of 2 or more, and the X-axis direction and the Y-axis direction are orthogonal to each other. 8. A manufacturing apparatus for an electroluminescence display device, comprising: a stage for holding a substrate; and a discharge device for moving the head group relative to the stage, wherein the head group is a first head and a second head And the third nozzle and the fourth nozzle, the first nozzle of the first, the second nozzle, the nozzle of the third-70-(5) 1269073, and the nozzle of the fourth a nozzle having a P-discharge nozzle for ejecting a liquid-like luminescent material in the substrate, a first nozzle, a second nozzle, a third nozzle, and a nozzle of the fourth nozzle in the X-axis direction The first nozzle and the second nozzle are disposed adjacent to each other in the Y-axis direction when the interval is the first length, and the third nozzle and the fourth nozzle are adjacent to each other. In the Y-axis direction, the X coordinate of the reference nozzle of the second nozzle is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the first nozzle, and is further shifted by the length of the first 1/2 times, the aforementioned fourth spray The X coordinate of the reference nozzle of the head is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the third nozzle, and is further shifted by W2 times the length of the first one, and the third nozzle The X coordinate of the reference nozzle is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the second nozzle, and is shifted by 1/4 or 3/4 times the length of the first length. The second length is P/4 times the length of the first one, and P is a natural number of 2 or more, and the X-axis direction and the Y-axis direction are orthogonal to each other. A manufacturing apparatus for a plasma display device, comprising: a stage for holding a substrate; and a discharge device for moving the head group relative to the platform, wherein the nozzle group is the first nozzle, And the second nozzle, the third nozzle, and the fourth nozzle, wherein each of the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle have The substrate may discharge P discharge nozzles of the liquid fluorescent material, and the nozzle intervals of the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle in the X-axis direction In the first length, the P nozzles are disposed, and the first nozzle and the second nozzle are adjacent to each other in the Y-axis direction, and the third nozzle and the fourth nozzle are adjacent to each other. In the Y-axis direction, the X coordinate of the reference nozzle of the second nozzle is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the first nozzle, and is further shifted by the length of the first 1/2 times, the aforementioned fourth spray The X coordinate of the reference nozzle of the head is offset from the X coordinate of the second length from the X coordinate of the reference nozzle of the third nozzle, and is further shifted by 1/2 times the length of the first one. The X coordinate of the reference nozzle of the nozzle of 3 is offset from the X coordinate of the length of the second coordinate from the X coordinate of the nozzle of the second nozzle by a factor of 1/4 or 3 of the length of the first The length of the second/fourth is the P/4 times the length of the first one, and P is a natural number of two or more, and the X-axis direction and the Y-axis direction are orthogonal to each other. -72- (7) 1269073 1 ο. A discharge method comprising the step (a) of placing a substrate having a spouted portion on a platform and the nozzle spacing in the respective X-axis directions to be the first length In the respective steps, the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle, which are configured to discharge the nozzles, are arranged to move relative to the Y-axis direction with respect to the substrate. The discharging method is characterized in that the step (b) is included in one scanning period, and the X coordinate of the reference nozzle of the second nozzle is biased only to the X coordinate of the reference nozzle from the first nozzle. The X coordinate of the length of the second shift is shifted by 1/2 times the length of the first one, and the X coordinate of the reference nozzle of the fourth nozzle is only the X coordinate of the reference nozzle from the third nozzle. The X coordinate 'shifted to the second length is more than 1/2 times the length of the first length, and the X coordinate of the reference nozzle of the third nozzle is used for the reference nozzle from the second nozzle The X coordinate is offset only by the length of the second length, and the X coordinate 'offsets the length of the first one. /4 times or 3/4 times, the first nozzle, the second nozzle, the third nozzle, and the fourth nozzle are relatively moved in the Y-axis direction with respect to the substrate ( b 1); the step (bl) includes: one of the first nozzle and the second nozzle being connected to the other while continuing to move while the third nozzle and the fourth nozzle are One of the steps of the relative movement of the other side; the length of the second of the natural numbers of P or more than 2 is the P/4 times the length of the first. In the above-mentioned step (b), the above-mentioned step 4 includes the above-mentioned four nozzles of the P nozzles arranged in the X-axis direction. The nozzles are relatively moved to the step (b 2) in the γ-axis direction with respect to the substrate. The method of claim 1, wherein the discharge nozzle of at least one of the P discharge nozzles in the step (b) is invaded to correspond to the aforementioned In the range of the discharge portion, the step (c) of discharging the liquid material from the discharge portion is performed from at least one of the nozzles. The discharge method of claim 12, wherein the planar image of the spouted portion is a nearly rectangular shape determined by a long side and a short side, and the step (a) is the spouted portion. The step of the short side being parallel to the X-axis direction while the direction of the long side is parallel to the Y-axis direction (a1); the step (c) further includes the aforementioned P nozzles At least two of the discharge nozzles simultaneously invade to the range corresponding to the portion to be discharged, and the step (cl) of discharging from the at least two discharge nozzles to the discharged portion is performed at the same time. -74-