TWI266749B - Process for producing cerium (IV) ammonium nitrate - Google Patents
Process for producing cerium (IV) ammonium nitrateInfo
- Publication number
- TWI266749B TWI266749B TW091112630A TW91112630A TWI266749B TW I266749 B TWI266749 B TW I266749B TW 091112630 A TW091112630 A TW 091112630A TW 91112630 A TW91112630 A TW 91112630A TW I266749 B TWI266749 B TW I266749B
- Authority
- TW
- Taiwan
- Prior art keywords
- cerium
- aqueous solution
- acidic aqueous
- ammonium
- nitrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 title 1
- 229910052684 Cerium Inorganic materials 0.000 abstract 5
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 abstract 5
- 230000002378 acidificating effect Effects 0.000 abstract 4
- 239000007864 aqueous solution Substances 0.000 abstract 4
- PCCNIENXBRUYFK-UHFFFAOYSA-O azanium;cerium(4+);pentanitrate Chemical compound [NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PCCNIENXBRUYFK-UHFFFAOYSA-O 0.000 abstract 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 2
- 229910017604 nitric acid Inorganic materials 0.000 abstract 2
- -1 ammonium ions Chemical class 0.000 abstract 1
- 150000001785 cerium compounds Chemical class 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 239000002244 precipitate Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 239000002699 waste material Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/10—Preparation or treatment, e.g. separation or purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/30—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- ing And Chemical Polishing (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Catalysts (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001175181 | 2001-06-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI266749B true TWI266749B (en) | 2006-11-21 |
Family
ID=19016364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091112630A TWI266749B (en) | 2001-06-11 | 2002-06-11 | Process for producing cerium (IV) ammonium nitrate |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP4175034B2 (zh) |
| KR (1) | KR100814309B1 (zh) |
| CN (1) | CN1514807A (zh) |
| TW (1) | TWI266749B (zh) |
| WO (1) | WO2002100778A1 (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100605365B1 (ko) * | 2004-12-23 | 2006-07-31 | 재단법인 포항산업과학연구원 | 크롬 에칭폐액으로부터 질산을 회수하고세륨암모니움질화물을 제조하는 방법 |
| CN102443805A (zh) * | 2010-10-13 | 2012-05-09 | 江德馨 | 碱性蚀刻废液循环利用的方法 |
| CN110904456B (zh) * | 2019-12-28 | 2022-01-14 | 上海天承化学有限公司 | 一种铜蚀刻液及其制备方法和应用 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11236633A (ja) * | 1998-02-24 | 1999-08-31 | Mitsubishi Chemical Corp | セリウムの回収方法 |
| JP2000007332A (ja) * | 1998-06-18 | 2000-01-11 | Mitsubishi Chemicals Corp | セリウムの回収方法 |
| JP3788185B2 (ja) * | 1999-04-27 | 2006-06-21 | 三菱化学株式会社 | クロム及びセリウムを含む溶液からのセリウムの回収方法 |
| JP2002068741A (ja) * | 2000-08-24 | 2002-03-08 | Asahi Kagaku Kogyo Co Ltd | 硝酸アンモニウムセリウム（ｉｖ）の製造方法 |
-
2002
- 2002-06-07 CN CNA02811728XA patent/CN1514807A/zh active Pending
- 2002-06-07 KR KR1020037016166A patent/KR100814309B1/ko not_active Expired - Fee Related
- 2002-06-07 WO PCT/JP2002/005686 patent/WO2002100778A1/ja not_active Ceased
- 2002-06-10 JP JP2002168682A patent/JP4175034B2/ja not_active Expired - Fee Related
- 2002-06-11 TW TW091112630A patent/TWI266749B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100814309B1 (ko) | 2008-03-18 |
| CN1514807A (zh) | 2004-07-21 |
| WO2002100778A1 (en) | 2002-12-19 |
| KR20040030665A (ko) | 2004-04-09 |
| JP2003063822A (ja) | 2003-03-05 |
| JP4175034B2 (ja) | 2008-11-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |