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TWI266305B - An optical head which can provide a sub-wavelength-scale light beam - Google Patents

An optical head which can provide a sub-wavelength-scale light beam

Info

Publication number
TWI266305B
TWI266305B TW092117422A TW92117422A TWI266305B TW I266305 B TWI266305 B TW I266305B TW 092117422 A TW092117422 A TW 092117422A TW 92117422 A TW92117422 A TW 92117422A TW I266305 B TWI266305 B TW I266305B
Authority
TW
Taiwan
Prior art keywords
wavelength
sub
light beam
optical
limit
Prior art date
Application number
TW092117422A
Other languages
English (en)
Other versions
TW200501135A (en
Inventor
Chih-Kung Lee
Liang-Bin Yu
Jiunn-Woei Liaw
Ding-Zheng Lin
Jyi-Tyan Yeh
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW092117422A priority Critical patent/TWI266305B/zh
Priority to US10/874,236 priority patent/US7288776B2/en
Publication of TW200501135A publication Critical patent/TW200501135A/zh
Application granted granted Critical
Publication of TWI266305B publication Critical patent/TWI266305B/zh
Priority to US11/802,947 priority patent/US7792006B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1387—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector using the near-field effect
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Optical Head (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
TW092117422A 2003-06-26 2003-06-26 An optical head which can provide a sub-wavelength-scale light beam TWI266305B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW092117422A TWI266305B (en) 2003-06-26 2003-06-26 An optical head which can provide a sub-wavelength-scale light beam
US10/874,236 US7288776B2 (en) 2003-06-26 2004-06-24 Optical head capable of providing a subwavelength beams
US11/802,947 US7792006B2 (en) 2003-06-26 2007-05-29 Optical head capable of providing a subwavelength beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW092117422A TWI266305B (en) 2003-06-26 2003-06-26 An optical head which can provide a sub-wavelength-scale light beam

Publications (2)

Publication Number Publication Date
TW200501135A TW200501135A (en) 2005-01-01
TWI266305B true TWI266305B (en) 2006-11-11

Family

ID=36653100

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092117422A TWI266305B (en) 2003-06-26 2003-06-26 An optical head which can provide a sub-wavelength-scale light beam

Country Status (2)

Country Link
US (2) US7288776B2 (zh)
TW (1) TWI266305B (zh)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100585413C (zh) * 2004-08-20 2010-01-27 日本电气株式会社 电磁干扰减少量的计算方法以及电磁干扰减少量计算装置
US7841529B2 (en) * 2004-10-19 2010-11-30 Applied Materials Israel, Ltd. Multiple optical head inspection system and a method for imaging an article
JP4405451B2 (ja) * 2005-09-05 2010-01-27 株式会社東芝 情報記録装置
JP4703443B2 (ja) 2006-03-14 2011-06-15 株式会社東芝 受光素子及び光配線ｌｓｉ
FR2902226B1 (fr) * 2006-06-12 2010-01-29 Commissariat Energie Atomique Composant optique fonctionnant en transmission en champ proche
TWI372885B (en) * 2007-06-06 2012-09-21 Univ Nat Cheng Kung Electromagnetic wave propagating structure
TWI370911B (en) * 2007-06-08 2012-08-21 Ind Tech Res Inst Optical head
CN101324759B (zh) * 2007-06-14 2010-04-14 财团法人工业技术研究院 光学头与光学蚀刻装置
JP5242336B2 (ja) * 2007-11-07 2013-07-24 株式会社ミツトヨ 非接触測定プローブ
EP2058643B1 (en) * 2007-11-07 2018-12-26 Mitutoyo Corporation Noncontact measurement probe
CN102209920B (zh) 2008-09-12 2015-11-25 康奈尔大学 狭缝波导中基于光学力的生物分子分析
TW201106106A (en) * 2009-08-13 2011-02-16 Univ Nat Taiwan Optical etching device for laser machining
EP2469295A1 (en) * 2010-12-23 2012-06-27 André Borowski 3D landscape real-time imager and corresponding imaging methods
TW201415153A (zh) 2012-10-01 2014-04-16 Ind Tech Res Inst 自動對焦系統與自動對焦方法
TWI649586B (zh) * 2017-07-20 2019-02-01 Benq Materials Corporation 光重導向膜及其製造方法
US10642086B2 (en) 2017-07-20 2020-05-05 Benq Materials Corporation Optical film
TWI633378B (zh) * 2017-12-14 2018-08-21 明基材料股份有限公司 光學膜
US10802321B2 (en) 2017-07-20 2020-10-13 Benq Materials Corporation Optical film for liquid crystal display
US10838248B2 (en) 2017-07-20 2020-11-17 Benq Materials Corporation Optical film
CN108802038B (zh) * 2018-08-28 2021-01-26 京东方科技集团股份有限公司 光源组件和微全分析系统
TWI764594B (zh) * 2020-03-04 2022-05-11 塞席爾商首源科技股份有限公司 波轉換方法
CN113884113B (zh) * 2021-11-03 2025-08-08 珠海格力电器股份有限公司 光电编码器

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6236033B1 (en) * 1998-12-09 2001-05-22 Nec Research Institute, Inc. Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography
US6834027B1 (en) * 2000-02-28 2004-12-21 Nec Laboratories America, Inc. Surface plasmon-enhanced read/write heads for optical data storage media
US7057151B2 (en) * 2001-08-31 2006-06-06 Universite Louis Pasteur Optical transmission apparatus with directionality and divergence control
US7154820B2 (en) * 2003-01-06 2006-12-26 Nec Corporation Optical element for enhanced transmission of light and suppressed increase in temperature
US7176450B2 (en) * 2004-01-02 2007-02-13 Itn Energy Systems, Inc. Long travel near-field scanning optical microscope

Also Published As

Publication number Publication date
US7288776B2 (en) 2007-10-30
TW200501135A (en) 2005-01-01
US7792006B2 (en) 2010-09-07
US20060153045A1 (en) 2006-07-13
US20080002556A1 (en) 2008-01-03

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees