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TWI265591B - Wiring structures for semiconductor devices - Google Patents

Wiring structures for semiconductor devices

Info

Publication number
TWI265591B
TWI265591B TW094128757A TW94128757A TWI265591B TW I265591 B TWI265591 B TW I265591B TW 094128757 A TW094128757 A TW 094128757A TW 94128757 A TW94128757 A TW 94128757A TW I265591 B TWI265591 B TW I265591B
Authority
TW
Taiwan
Prior art keywords
semiconductor devices
wiring structures
vertical connection
dummy dielectric
dielectric layer
Prior art date
Application number
TW094128757A
Other languages
English (en)
Other versions
TW200629468A (en
Inventor
Chung-Shi Liu
Chen-Hua Yu
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Publication of TW200629468A publication Critical patent/TW200629468A/zh
Application granted granted Critical
Publication of TWI265591B publication Critical patent/TWI265591B/zh

Links

Classifications

    • H10W20/42—
    • H10W20/43—

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
TW094128757A 2005-02-14 2005-08-23 Wiring structures for semiconductor devices TWI265591B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/056,193 US20060180934A1 (en) 2005-02-14 2005-02-14 Wiring structures for semiconductor devices

Publications (2)

Publication Number Publication Date
TW200629468A TW200629468A (en) 2006-08-16
TWI265591B true TWI265591B (en) 2006-11-01

Family

ID=36814857

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094128757A TWI265591B (en) 2005-02-14 2005-08-23 Wiring structures for semiconductor devices

Country Status (2)

Country Link
US (1) US20060180934A1 (zh)
TW (1) TWI265591B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009037531A1 (en) * 2007-09-20 2009-03-26 Freescale Semiconductor, Inc. Improvements for reducing electromigration effect in an integrated circuit

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04363024A (ja) * 1990-11-30 1992-12-15 Toshiba Corp 半導体装置の製造方法
US6307268B1 (en) * 1999-12-30 2001-10-23 Winbond Electronics Corp Suppression of interconnect stress migration by refractory metal plug
US6815331B2 (en) * 2001-05-17 2004-11-09 Samsung Electronics Co., Ltd. Method for forming metal wiring layer of semiconductor device
JP3790469B2 (ja) * 2001-12-21 2006-06-28 富士通株式会社 半導体装置
US6872666B2 (en) * 2002-11-06 2005-03-29 Intel Corporation Method for making a dual damascene interconnect using a dual hard mask

Also Published As

Publication number Publication date
US20060180934A1 (en) 2006-08-17
TW200629468A (en) 2006-08-16

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent