TWI263361B - Group III nitride semiconductor light-emitting device - Google Patents
Group III nitride semiconductor light-emitting deviceInfo
- Publication number
- TWI263361B TWI263361B TW94113603A TW94113603A TWI263361B TW I263361 B TWI263361 B TW I263361B TW 94113603 A TW94113603 A TW 94113603A TW 94113603 A TW94113603 A TW 94113603A TW I263361 B TWI263361 B TW I263361B
- Authority
- TW
- Taiwan
- Prior art keywords
- nitride semiconductor
- iii nitride
- group iii
- emitting device
- semiconductor light
- Prior art date
Links
- 150000004767 nitrides Chemical class 0.000 title abstract 4
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 229910021478 group 5 element Inorganic materials 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
Landscapes
- Led Devices (AREA)
Abstract
A group III nitride semiconductor light-emitting device provided on a crystal substrate with an n-type and p-type group III nitride semiconductor of AlXGaYInZN1-aMa, wherein 0 <= X <= 1, 0 <= Y <= 1, 0 <= Z <= 1, X+Y+Z =1, M denotes a group V element other than N and 0 <= a < 1, includes an n-type electrode contact layer of group III nitride semiconductor including a region doped with Ge and a light-emitting layer including a region undoped or doped with at least one element selected from the group consisting of Si, C, Sn and Pb.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004132784 | 2004-04-28 | ||
| JP2005017991A JP2005340762A (en) | 2004-04-28 | 2005-01-26 | Group iii nitride semiconductor light-emitting element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200541115A TW200541115A (en) | 2005-12-16 |
| TWI263361B true TWI263361B (en) | 2006-10-01 |
Family
ID=35493927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94113603A TWI263361B (en) | 2004-04-28 | 2005-04-28 | Group III nitride semiconductor light-emitting device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2005340762A (en) |
| TW (1) | TWI263361B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL1798781T3 (en) * | 2005-12-15 | 2010-03-31 | Lg Electronics Inc | LED diode having a vertical structure and a method of its production |
| KR101239856B1 (en) * | 2006-02-02 | 2013-03-06 | 서울옵토디바이스주식회사 | Light-emitting diode and Method of manufacturing the same |
| JP2011159771A (en) * | 2010-01-29 | 2011-08-18 | Nec Corp | Nitride semiconductor light-emitting element, and manufacturing method of the nitride semiconductor light-emitting element, and electronic device |
| US10529561B2 (en) * | 2015-12-28 | 2020-01-07 | Texas Instruments Incorporated | Method of fabricating non-etch gas cooled epitaxial stack for group IIIA-N devices |
| CN117810324B (en) * | 2024-02-29 | 2024-05-24 | 江西兆驰半导体有限公司 | Light-emitting diode epitaxial wafer and preparation method thereof, and light-emitting diode |
| CN118335858B (en) * | 2024-06-12 | 2024-09-03 | 湘能华磊光电股份有限公司 | A method for growing and preparing a single crystal of a light emitting diode |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2890390B2 (en) * | 1994-07-06 | 1999-05-10 | 日亜化学工業株式会社 | Gallium nitride based compound semiconductor light emitting device |
| JP3576743B2 (en) * | 1996-04-22 | 2004-10-13 | 東芝電子エンジニアリング株式会社 | Light emitting element |
| JP3448196B2 (en) * | 1997-07-25 | 2003-09-16 | 日亜化学工業株式会社 | Nitride semiconductor light emitting device |
| JP3275810B2 (en) * | 1997-11-18 | 2002-04-22 | 日亜化学工業株式会社 | Nitride semiconductor light emitting device |
| JP3620292B2 (en) * | 1997-09-01 | 2005-02-16 | 日亜化学工業株式会社 | Nitride semiconductor device |
| JP4122552B2 (en) * | 1997-11-12 | 2008-07-23 | 日亜化学工業株式会社 | Light emitting device |
| JP3719047B2 (en) * | 1999-06-07 | 2005-11-24 | 日亜化学工業株式会社 | Nitride semiconductor device |
| JP3803696B2 (en) * | 2000-11-21 | 2006-08-02 | 日亜化学工業株式会社 | Nitride semiconductor device |
| JP2002170988A (en) * | 2000-12-01 | 2002-06-14 | Sharp Corp | Nitride semiconductor light emitting device and light emitting device thereof |
| JP2003046127A (en) * | 2001-05-23 | 2003-02-14 | Sanyo Electric Co Ltd | Nitride semiconductor light-emitting element |
| JP2003229645A (en) * | 2002-01-31 | 2003-08-15 | Nec Corp | Quantum well structure, semiconductor device using the same, and method of manufacturing semiconductor device |
-
2005
- 2005-01-26 JP JP2005017991A patent/JP2005340762A/en active Pending
- 2005-04-28 TW TW94113603A patent/TWI263361B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005340762A (en) | 2005-12-08 |
| TW200541115A (en) | 2005-12-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2002091483A3 (en) | Improved photovoltaic device | |
| EP1624544A3 (en) | Nitride semiconductor light-Emitting Device | |
| EP1389814A3 (en) | Semiconductor light-emitting device | |
| WO2004075253A3 (en) | Inverted light emitting diode on conductive substrate | |
| EP1643564A3 (en) | Photovoltaic device | |
| TW587355B (en) | Nitride semiconductor device | |
| EP3522204A3 (en) | Localized annealing of metal-silicon carbide ohmic contacts | |
| EP1538680A3 (en) | Light emitting device | |
| EP1560275A3 (en) | Semiconductor light emitting devices including current spreading layers | |
| CA2393219A1 (en) | Light-emitting or light-receiving semiconductor device and method for making the same | |
| TW200731549A (en) | Vertical GaN semiconductor device and epitaxial substrate | |
| TW200625679A (en) | Group Ⅲ nitride based quantum well light emitting device structures with an indium containing capping structure | |
| WO2003065418A3 (en) | Planar avalanche photodiode | |
| EP1670106A4 (en) | SEMICONDUCTOR DEVICE IN NITRIDE AND METHOD OF MANUFACTURING THE SAME | |
| EP2068368A3 (en) | Method for manufacturing n-type and p-type chalcogenide material, doped homojunction chalcogenide thin film transistor and method of fabricating the same | |
| EP1538674A3 (en) | Semiconductor device | |
| TW200625694A (en) | Group Ⅲ nitride compound semiconductor light emitting device | |
| TW200742126A (en) | Semiconductor light emitting device and its manufacturing method | |
| TW200742094A (en) | Ultrafast recovery diode | |
| EP1755173A3 (en) | Structures for reducing operating voltage in a semiconductor device | |
| TW200707632A (en) | Semiconductor device and forming method thereof | |
| NO20065598L (en) | Tunnel crossings for long-haul VCSELs. | |
| TW200614614A (en) | Nitride-based compound semiconductor light emitting device, structural unit thereof, and fabricating method thereof | |
| TW200629594A (en) | Ultra-thin ohmic contacts for p-type nitride light emitting devices and methods of forming | |
| TW200746454A (en) | Semiconductor light-emitting device and fabricating method of the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |