[go: up one dir, main page]

TWI262905B - Quartz glass parts, ceramic parts and process of producing those - Google Patents

Quartz glass parts, ceramic parts and process of producing those

Info

Publication number
TWI262905B
TWI262905B TW091132506A TW91132506A TWI262905B TW I262905 B TWI262905 B TW I262905B TW 091132506 A TW091132506 A TW 091132506A TW 91132506 A TW91132506 A TW 91132506A TW I262905 B TWI262905 B TW I262905B
Authority
TW
Taiwan
Prior art keywords
parts
sprayed coating
ceramic
thermal sprayed
film
Prior art date
Application number
TW091132506A
Other languages
Chinese (zh)
Other versions
TW200300132A (en
Inventor
Koyata Takahashi
Michio Okamoto
Masanori Abe
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Publication of TW200300132A publication Critical patent/TW200300132A/en
Application granted granted Critical
Publication of TWI262905B publication Critical patent/TWI262905B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
    • C04B41/4523—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied from the molten state ; Thermal spraying, e.g. plasma spraying
    • C04B41/4527—Plasma spraying
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/214—Al2O3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/22—ZrO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/77—Coatings having a rough surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Composite Materials (AREA)
  • Dispersion Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Surface Treatment Of Glass (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

In quartz glass parts and ceramic parts that are used in film-deposition devices and pre-cleaning devices in the production of semiconductors, etc., there are problems such as peeling off of the parts themselves during the use, peeling off of film-like substances adhered to the part surfaces, contamination of the products and short life time of the parts caused by corrosion of the part surfaces by plasma, and reduction in the productivity by frequent exchange of the parts. In quartz glass parts and ceramic parts that are used in film-deposition devices and pre-cleaning devices in the production of semiconductors, etc., with respect to parts, the surface of which is constituted of a ceramic thermal sprayed coating, ones having the ceramic thermal sprayed coating having a surface roughness Ra of from 5 to 20 mum are high in adherence of a film-like adherence, ones having the ceramic thermal sprayed coating having a surface roughness Ra of from 1 to 5 mum are high in plasma resistance, and ones in which grooves having a large anchor effect to the thermal sprayed coating is formed on a substrate on which the ceramic thermal sprayed coating is formed are free from peeling off of the ceramic thermal sprayed coating from the substrate and are high in durability.
TW091132506A 2001-11-13 2002-11-04 Quartz glass parts, ceramic parts and process of producing those TWI262905B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001347240 2001-11-13
JP2001347239 2001-11-13

Publications (2)

Publication Number Publication Date
TW200300132A TW200300132A (en) 2003-05-16
TWI262905B true TWI262905B (en) 2006-10-01

Family

ID=26624495

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091132506A TWI262905B (en) 2001-11-13 2002-11-04 Quartz glass parts, ceramic parts and process of producing those

Country Status (4)

Country Link
US (1) US6902814B2 (en)
EP (1) EP1310466A3 (en)
KR (1) KR100851833B1 (en)
TW (1) TWI262905B (en)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080264564A1 (en) 2007-04-27 2008-10-30 Applied Materials, Inc. Method of reducing the erosion rate of semiconductor processing apparatus exposed to halogen-containing plasmas
KR100847082B1 (en) * 2002-10-31 2008-07-18 토소가부시키가이샤 Parts to which island-form projection is attached, manufacturing method thereof and apparatus comprising the parts
US7091132B2 (en) * 2003-07-24 2006-08-15 Applied Materials, Inc. Ultrasonic assisted etch using corrosive liquids
US7045072B2 (en) * 2003-07-24 2006-05-16 Tan Samantha S H Cleaning process and apparatus for silicate materials
EP1664370A1 (en) * 2003-09-25 2006-06-07 Honeywell International Inc. Pvd component and coil refurbishing methods
US20070077456A1 (en) * 2005-09-30 2007-04-05 Junya Kitamura Thermal spray coating
DE602007002280D1 (en) * 2007-04-19 2009-10-15 Straumann Holding Ag Method for providing a topography on the surface of a dental implant
US10242888B2 (en) 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
US10622194B2 (en) 2007-04-27 2020-04-14 Applied Materials, Inc. Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
TWI628154B (en) * 2007-04-27 2018-07-01 應用材料股份有限公司 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
WO2009099614A1 (en) * 2008-02-08 2009-08-13 Corning Incorporated Damage resistant, chemically-toughened protective cover glass
US20090214825A1 (en) * 2008-02-26 2009-08-27 Applied Materials, Inc. Ceramic coating comprising yttrium which is resistant to a reducing plasma
JP4524354B2 (en) * 2008-02-28 2010-08-18 国立大学法人東北大学 Microwave plasma processing apparatus, dielectric window member used therefor, and method for manufacturing dielectric window member
US20090261065A1 (en) * 2008-04-18 2009-10-22 Lam Research Corporation Components for use in a plasma chamber having reduced particle generation and method of making
US8546284B2 (en) * 2008-05-07 2013-10-01 Council Of Scientific & Industrial Research Process for the production of plasma sprayable yttria stabilized zirconia (YSZ) and plasma sprayable YSZ powder produced thereby
TWI532414B (en) 2008-08-04 2016-05-01 Ａｇｃ北美平面玻璃公司 Plasma source and method for depositing thin film coating using plasma enhanced chemical vapor deposition
CN102272344A (en) * 2008-11-04 2011-12-07 普莱克斯技术有限公司 Thermal spray coatings for semiconductor applications
EP2316374A1 (en) * 2009-11-02 2011-05-04 Straumann Holding AG Process for preparing a ceramic body having a surface roughness
BE1020692A3 (en) * 2012-05-16 2014-03-04 Prayon Sa METHOD FOR MANUFACTURING COMPOSITE MATERIAL
US8944003B2 (en) * 2012-11-16 2015-02-03 Taiwan Semiconductor Manufacturing Company, Ltd. Remote plasma system and method
JP6457498B2 (en) * 2013-05-23 2019-01-23 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Coated liner assembly for a semiconductor processing chamber
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
KR102148336B1 (en) 2013-11-26 2020-08-27 삼성전자주식회사 Method of treating a surface, method of fabricating a semiconductor device and the semiconductor device so fabricated
EP3149334B1 (en) * 2014-05-30 2020-07-01 Eaton Corporation Integrated pressure plate and port plate for pump
JP6710686B2 (en) 2014-12-05 2020-06-17 エージーシー ガラス ヨーロッパ Hollow cathode plasma source, substrate treatment method
MY191327A (en) 2014-12-05 2022-06-16 Agc Flat Glass Na Inc Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10364176B1 (en) 2016-10-03 2019-07-30 Owens-Brockway Glass Container Inc. Glass precursor gel and methods to treat with microwave energy
US10427970B1 (en) 2016-10-03 2019-10-01 Owens-Brockway Glass Container Inc. Glass coatings and methods to deposit same
US10479717B1 (en) 2016-10-03 2019-11-19 Owens-Brockway Glass Container Inc. Glass foam
US11615944B2 (en) * 2017-05-31 2023-03-28 Applied Materials, Inc. Remote plasma oxidation chamber
US11014853B2 (en) 2018-03-07 2021-05-25 Applied Materials, Inc. Y2O3—ZrO2 erosion resistant material for chamber components in plasma environments
US11139151B1 (en) * 2018-03-15 2021-10-05 Intel Corporation Micro-surface morphological matching for reactor components
KR102411792B1 (en) 2019-07-22 2022-06-22 한국재료연구원 Plasma etching device parts for semiconductor manufacturing including composite sintered body and manufacturing method thereof
US20220285164A1 (en) 2019-07-22 2022-09-08 Korea Institute Of Materials Science Plasma Etching Apparatus Component for Manufacturing Semiconductor Comprising Composite Sintered Body and Manufacturing Method Therefor
CN111574233B (en) * 2020-05-26 2022-04-12 中钢洛耐科技股份有限公司 Ceramic wear-resistant hot gunning mix and preparation method thereof
CN115974589A (en) * 2022-11-30 2023-04-18 歌尔股份有限公司 Composite burning bearing plate and preparation method thereof

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120515A (en) 1983-12-05 1985-06-28 Hitachi Ltd Thin film forming device
JPS61275184A (en) * 1985-05-30 1986-12-05 高信頼度舶用推進プラント技術研究組合 Flame spray process for ceramic member
JPS6313333A (en) 1986-07-04 1988-01-20 Hitachi Ltd Dry etching device
JPH01249666A (en) * 1988-03-31 1989-10-04 Nippon Steel Corp Ceramic joining method by thermal spraying
JP2907401B2 (en) 1991-02-21 1999-06-21 キヤノン株式会社 Sputter deposition equipment
JP2642556B2 (en) * 1992-02-05 1997-08-20 新日本製鐵株式会社 Thermal spray coating formation method
JPH06313333A (en) 1993-04-28 1994-11-08 Haseko Corp Structure of buried frame for beam
US5460689A (en) 1994-02-28 1995-10-24 Applied Materials, Inc. High pressure plasma treatment method and apparatus
JPH0869970A (en) 1994-08-29 1996-03-12 Souzou Kagaku:Kk Plasma processing bell jar of semiconductor substrate
JP3473917B2 (en) 1994-09-30 2003-12-08 信越石英株式会社 Silica glass having rough surface and method for producing the same
JPH08339895A (en) 1995-06-12 1996-12-24 Tokyo Electron Ltd Plasma processing device
TW323387B (en) * 1995-06-07 1997-12-21 Tokyo Electron Co Ltd
JPH10267562A (en) * 1997-03-28 1998-10-09 Toshiba Ceramics Co Ltd Tool material for firing
JP3985243B2 (en) * 1998-12-01 2007-10-03 信越石英株式会社 Quartz glass jig having large irregularities on the surface and manufacturing method thereof
JP2000169974A (en) * 1998-12-03 2000-06-20 Taiheiyo Cement Corp Corrosion resistant member
KR20010062209A (en) * 1999-12-10 2001-07-07 히가시 데쓰로 Processing apparatus with a chamber having therein a high-etching resistant sprayed film
JP3280367B2 (en) 2000-06-05 2002-05-13 日東電工株式会社 Cleaning sheet for removing solvent-containing material and method for removing solvent-containing material
JP3778777B2 (en) 2000-06-07 2006-05-24 アマノ株式会社 Dust collector for air blowing work
US6379789B1 (en) * 2000-10-04 2002-04-30 Creare Inc. Thermally-sprayed composite selective emitter
WO2002040732A1 (en) * 2000-11-15 2002-05-23 G.T. Equipment Technologies Inc. A protective layer for quartz crucibles used for silicon crystallization
US6319842B1 (en) 2001-01-02 2001-11-20 Novellus Systems Incorporated Method of cleansing vias in semiconductor wafer having metal conductive layer
US6596397B2 (en) * 2001-04-06 2003-07-22 Shin-Etsu Chemical Co., Ltd. Thermal spray particles and sprayed components
US6777045B2 (en) * 2001-06-27 2004-08-17 Applied Materials Inc. Chamber components having textured surfaces and method of manufacture

Also Published As

Publication number Publication date
EP1310466A3 (en) 2003-10-22
US20030091835A1 (en) 2003-05-15
TW200300132A (en) 2003-05-16
KR100851833B1 (en) 2008-08-13
EP1310466A2 (en) 2003-05-14
KR20030040115A (en) 2003-05-22
US6902814B2 (en) 2005-06-07

Similar Documents

Publication Publication Date Title
TWI262905B (en) Quartz glass parts, ceramic parts and process of producing those
AR016922A1 (en) PROCESS FOR THE PRODUCTION OF A STRUCTURED COATED STRUCTURED AND STRUCTURED COATED ABRASIVE OBTAINED
DK0576402T3 (en) Electrodes with extended service life.
BR0014366A (en) Sintered abrasive grain based on alpha alumina, abrasive article, methods for making ceramic abrasive grain based on alpha alumina, to manufacture an abrasive article, and abrasion of a surface
DE69917454D1 (en) SANITARY CERAMIC PRODUCTS AND METHOD FOR THE PRODUCTION THEREOF
ATE496388T1 (en) PENNINE DISCHARGE PLASMA SOURCE
TW200516166A (en) Methods, devices and compositions for depositing and orienting nanostructures
JP2010199596A5 (en)
PT1507751E (en) CERAMIC-MOLDED BODY WITH COATING WITH PHOTOCATALITICAL ACTIVITY AND PROCESS FOR THE PREPARATION OF THE SAME
AU2002345752A1 (en) High amount of beneficial components in the top of a substrates
EP1616975A3 (en) Coated substrate
BR9910555A (en) Processes for producing ceramic abrasive grains based on alpha alumina, and for producing an abrasive article
MX2007004382A (en) Article of manufacture and process for anodically coating an aluminum substrate with ceramic oxides prior to organic or inorganic coating.
MY130468A (en) Paste, displays member, and process for production of display member
TW200710195A (en) Pressure-sensitive adhesive sheet, production method thereof and method of processing articles
AU2003270193A1 (en) Layer system comprising a titanium-aluminium-oxide layer
ATE178948T1 (en) COATED PLASTIC PARTICLES FOR THERMAL SPRAYING
WO2003088340A3 (en) Method for the production of structured layers on substrates
TW200715456A (en) Substrate mounting base, method for manufacturing the same and substrate processing apparatus
MY143652A (en) Polishing composition for glass substrate
DE50310646D1 (en) METHOD OF COATING METAL SURFACES
MX9102511A (en) SURFACE MORPHOLIA SUBSTRATE IMPROVED BY PLASMA SPRAY.
ATE36353T1 (en) STEEL ARTICLE WITH A COATING OF DISORDERED SILICON CARBOXYNITRIDE AND METHOD OF MAKING THE COATING.
ATE538489T1 (en) METHOD FOR PRODUCING MAGNETRON SPUTTER-COATED SUBSTRATES AND SYSTEM THEREFOR
SG147461A1 (en) Ceramic article having corrosion-resistant layer, semiconductor processing apparatus incorporating same, and method for forming same

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees