TWI258208B - Loading device for wafer and the supporting structure thereof - Google Patents
Loading device for wafer and the supporting structure thereof Download PDFInfo
- Publication number
- TWI258208B TWI258208B TW93100868A TW93100868A TWI258208B TW I258208 B TWI258208 B TW I258208B TW 93100868 A TW93100868 A TW 93100868A TW 93100868 A TW93100868 A TW 93100868A TW I258208 B TWI258208 B TW I258208B
- Authority
- TW
- Taiwan
- Prior art keywords
- patent application
- support
- wafer
- item
- application scope
- Prior art date
Links
- 125000006850 spacer group Chemical group 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 4
- 230000013011 mating Effects 0.000 claims 4
- 239000000696 magnetic material Substances 0.000 claims 2
- 239000002689 soil Substances 0.000 claims 2
- 229910001220 stainless steel Inorganic materials 0.000 claims 2
- 239000010935 stainless steel Substances 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 1
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
1258208 五、發明說明(1) 發明所屬之技術領域: ’特別係有關於一 置。 本發明係有關於一種晶圓承載裝置 種可使用於氣相沈積設備之晶圓承栽襄 先前技術: 目前氣相沈積設備,例如物理氣相沈積設備,係利用 電漿對金屬靶進行轟擊,以使金屬材料濺鍍於晶片之上。 然而,在沈積過程之中,金屬粒子不會僅沈積於晶片表 面’亦會沈積於物理氣相沈積設備的其他愛件之上, 晶圓承載裝置的覆蓋環,便為一極易被金^粒子污毕== 件。因此,每隔一段時間,覆蓋環便需要被清理,以ς 物理氣相沈積的品質。 ' 覆蓋環通常利用化學溶劑以及噴砂的方式進行生 喷砂係利用氣體將砂高速吹過覆蓋環表面,以刮除$严 表面的污染物。然而,在去除污染物的過程中, 衣 身的材料也一樣會被消耗。因此,在經過數次噴朴、、主環本 後’覆蓋環較薄的部分常會被磨穿,而致使霜甚月/絮之 用。 双便復盍绾不堪使 發明内容: 本發明提供之一種晶圓承载裝置及其組件。 本發明之覆蓋環設計,使該覆蓋環得於清理 例如化學溶劑以及喷砂的方式進行清理,減緩=中, 料之消耗而導致之裝置使用壽命降低。 尤於因材1258208 V. INSTRUCTIONS (1) The technical field to which the invention belongs: 'Specially related to one. The present invention relates to a wafer carrier device that can be used for wafer deposition in vapor deposition equipment. Prior art: Current vapor deposition equipment, such as physical vapor deposition equipment, utilizes plasma to bombard metal targets. In order to sputter the metal material on the wafer. However, during the deposition process, the metal particles will not only deposit on the surface of the wafer, but will also be deposited on other love parts of the physical vapor deposition equipment. The cover ring of the wafer carrier device is easily replaced by gold. The particles are stained == pieces. Therefore, at intervals, the cover ring needs to be cleaned to the quality of physical vapor deposition. The cover ring is usually made by chemical solvent and sandblasting. The sandblasting system uses gas to blow the sand through the surface of the cover ring at high speed to scrape off the surface of the contaminant. However, in the process of removing contaminants, the material of the body is also consumed. Therefore, after several times of spraying, the thin part of the cover ring is often worn out, which causes the frost to be used. The present invention provides a wafer carrier and an assembly thereof. The cover ring of the present invention is designed such that the cover ring is cleaned by means of cleaning, for example, chemical solvent and sand blasting, and the service life of the device is reduced by slowing down the consumption of the material. Especially due to
1258208 圖式簡單說明 第1圖係顯示本發明之 部結構; 實施例之晶圓承栽裝 第2 a圖係顯示本發明之〜κ 要結構; 〜實施例之晶圓承 置的外 栽敦置 之主 第2b圖係顯示墊片以及 第2c圖係顯示固定件端卹弋件之構造; 形; P完全收容於墊片之開第2d圖係顯示固定件形; 1 4分犬出於第3a圖係顯示第2 f @ :丁弟h圖中之β部分放大圖; 第4圖係顯示本絡昍夕一 只靶例之晶固承栽裝置承載 之情 片之開口之情 Φ 一晶圓。 符號說明: 100〜 晶圓 承 載 裝置 110〜 晶座 120〜 支撐 座 121〜 支撐 座 主 12^ 體 122〜 固定 件 123〜 墊片 124〜 開口 125〜 端部 130〜 覆蓋 環1258208 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the structure of the present invention; the wafer carrier of the embodiment is shown in Fig. 2a to show the structure of the κ of the present invention; The 2b figure shows the spacer and the 2c figure shows the structure of the fastener end piece; the shape; P is completely accommodated in the opening of the spacer. The 2d figure shows the fixing shape; 1 4 points out of the dog Fig. 3a shows the enlarged view of the β part of the 2f f @ :丁弟h diagram; Fig. 4 shows the opening of the love piece carried by the crystal solid support device of a target case of the local 昍 Φ Wafer. DESCRIPTION OF REFERENCE NUMERALS: 100~ wafer carrier 110~ crystal holder 120~ support seat 121~ support base main 12^ body 122~ fixing piece 123~ spacer 124~ opening 125~ end 130~ cover ring
1258208 囷式簡單說明 131〜 配合部 132〜 溝槽 140〜 壓接環 150〜 壓接環支撐模組 160〜 外遮罩 200〜 晶圓 ο <11258208 Simple description of the 131 type 131~ Matching part 132~ Groove 140~ Crimp ring 150~ Crimp ring support module 160~ Outer cover 200~ Wafer ο <1
IBB 0467 -Α40153TW( η); 920008; HEARTA. p td 第11頁IBB 0467 -Α40153TW( η); 920008; HEARTA. p td第11页
Claims (1)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW93100868A TWI258208B (en) | 2004-01-14 | 2004-01-14 | Loading device for wafer and the supporting structure thereof |
| JP2004104100A JP2005203724A (en) | 2004-01-14 | 2004-03-31 | Wafer holding apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW93100868A TWI258208B (en) | 2004-01-14 | 2004-01-14 | Loading device for wafer and the supporting structure thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200524108A TW200524108A (en) | 2005-07-16 |
| TWI258208B true TWI258208B (en) | 2006-07-11 |
Family
ID=34825360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW93100868A TWI258208B (en) | 2004-01-14 | 2004-01-14 | Loading device for wafer and the supporting structure thereof |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2005203724A (en) |
| TW (1) | TWI258208B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6384758B2 (en) * | 2014-09-30 | 2018-09-05 | 新東工業株式会社 | Deposit removal method |
| EP3543795A1 (en) * | 2018-03-20 | 2019-09-25 | Patek Philippe SA Genève | Method for manufacturing silicon clock components |
-
2004
- 2004-01-14 TW TW93100868A patent/TWI258208B/en not_active IP Right Cessation
- 2004-03-31 JP JP2004104100A patent/JP2005203724A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW200524108A (en) | 2005-07-16 |
| JP2005203724A (en) | 2005-07-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |