[go: up one dir, main page]

TWI258208B - Loading device for wafer and the supporting structure thereof - Google Patents

Loading device for wafer and the supporting structure thereof Download PDF

Info

Publication number
TWI258208B
TWI258208B TW93100868A TW93100868A TWI258208B TW I258208 B TWI258208 B TW I258208B TW 93100868 A TW93100868 A TW 93100868A TW 93100868 A TW93100868 A TW 93100868A TW I258208 B TWI258208 B TW I258208B
Authority
TW
Taiwan
Prior art keywords
patent application
support
wafer
item
application scope
Prior art date
Application number
TW93100868A
Other languages
Chinese (zh)
Other versions
TW200524108A (en
Inventor
Wen-Chen Lee
Pang-Cheng Liu
Bo-Son Chen
Mester Wu
Original Assignee
Mosel Vitelic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mosel Vitelic Inc filed Critical Mosel Vitelic Inc
Priority to TW93100868A priority Critical patent/TWI258208B/en
Priority to JP2004104100A priority patent/JP2005203724A/en
Publication of TW200524108A publication Critical patent/TW200524108A/en
Application granted granted Critical
Publication of TWI258208B publication Critical patent/TWI258208B/en

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

A loading device for wafer includes a wafer stand, a holder and a capping ring. The holder is used to support the fringe of wafer stand, and comprises at least a holder main body, a pad and at least a fixed part. The pad uses fixed part to fix on the holder main body. The pad has at least one opening. The fixed part has an end point containing in the capping ring. The capping ring is installed on the holder.

Description

1258208 五、發明說明(1) 發明所屬之技術領域: ’特別係有關於一 置。 本發明係有關於一種晶圓承載裝置 種可使用於氣相沈積設備之晶圓承栽襄 先前技術: 目前氣相沈積設備,例如物理氣相沈積設備,係利用 電漿對金屬靶進行轟擊,以使金屬材料濺鍍於晶片之上。 然而,在沈積過程之中,金屬粒子不會僅沈積於晶片表 面’亦會沈積於物理氣相沈積設備的其他愛件之上, 晶圓承載裝置的覆蓋環,便為一極易被金^粒子污毕== 件。因此,每隔一段時間,覆蓋環便需要被清理,以ς 物理氣相沈積的品質。 ' 覆蓋環通常利用化學溶劑以及噴砂的方式進行生 喷砂係利用氣體將砂高速吹過覆蓋環表面,以刮除$严 表面的污染物。然而,在去除污染物的過程中, 衣 身的材料也一樣會被消耗。因此,在經過數次噴朴、、主環本 後’覆蓋環較薄的部分常會被磨穿,而致使霜甚月/絮之 用。 双便復盍绾不堪使 發明内容: 本發明提供之一種晶圓承载裝置及其組件。 本發明之覆蓋環設計,使該覆蓋環得於清理 例如化學溶劑以及喷砂的方式進行清理,減緩=中, 料之消耗而導致之裝置使用壽命降低。 尤於因材1258208 V. INSTRUCTIONS (1) The technical field to which the invention belongs: 'Specially related to one. The present invention relates to a wafer carrier device that can be used for wafer deposition in vapor deposition equipment. Prior art: Current vapor deposition equipment, such as physical vapor deposition equipment, utilizes plasma to bombard metal targets. In order to sputter the metal material on the wafer. However, during the deposition process, the metal particles will not only deposit on the surface of the wafer, but will also be deposited on other love parts of the physical vapor deposition equipment. The cover ring of the wafer carrier device is easily replaced by gold. The particles are stained == pieces. Therefore, at intervals, the cover ring needs to be cleaned to the quality of physical vapor deposition. The cover ring is usually made by chemical solvent and sandblasting. The sandblasting system uses gas to blow the sand through the surface of the cover ring at high speed to scrape off the surface of the contaminant. However, in the process of removing contaminants, the material of the body is also consumed. Therefore, after several times of spraying, the thin part of the cover ring is often worn out, which causes the frost to be used. The present invention provides a wafer carrier and an assembly thereof. The cover ring of the present invention is designed such that the cover ring is cleaned by means of cleaning, for example, chemical solvent and sand blasting, and the service life of the device is reduced by slowing down the consumption of the material. Especially due to

1258208 圖式簡單說明 第1圖係顯示本發明之 部結構; 實施例之晶圓承栽裝 第2 a圖係顯示本發明之〜κ 要結構; 〜實施例之晶圓承 置的外 栽敦置 之主 第2b圖係顯示墊片以及 第2c圖係顯示固定件端卹弋件之構造; 形; P完全收容於墊片之開第2d圖係顯示固定件形; 1 4分犬出於第3a圖係顯示第2 f @ :丁弟h圖中之β部分放大圖; 第4圖係顯示本絡昍夕一 只靶例之晶固承栽裝置承載 之情 片之開口之情 Φ 一晶圓。 符號說明: 100〜 晶圓 承 載 裝置 110〜 晶座 120〜 支撐 座 121〜 支撐 座 主 12^ 體 122〜 固定 件 123〜 墊片 124〜 開口 125〜 端部 130〜 覆蓋 環1258208 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the structure of the present invention; the wafer carrier of the embodiment is shown in Fig. 2a to show the structure of the κ of the present invention; The 2b figure shows the spacer and the 2c figure shows the structure of the fastener end piece; the shape; P is completely accommodated in the opening of the spacer. The 2d figure shows the fixing shape; 1 4 points out of the dog Fig. 3a shows the enlarged view of the β part of the 2f f @ :丁弟h diagram; Fig. 4 shows the opening of the love piece carried by the crystal solid support device of a target case of the local 昍 Φ Wafer. DESCRIPTION OF REFERENCE NUMERALS: 100~ wafer carrier 110~ crystal holder 120~ support seat 121~ support base main 12^ body 122~ fixing piece 123~ spacer 124~ opening 125~ end 130~ cover ring

1258208 囷式簡單說明 131〜 配合部 132〜 溝槽 140〜 壓接環 150〜 壓接環支撐模組 160〜 外遮罩 200〜 晶圓 ο <11258208 Simple description of the 131 type 131~ Matching part 132~ Groove 140~ Crimp ring 150~ Crimp ring support module 160~ Outer cover 200~ Wafer ο <1

IBB 0467 -Α40153TW( η); 920008; HEARTA. p td 第11頁IBB 0467 -Α40153TW( η); 920008; HEARTA. p td第11页

Claims (1)

1258208 六、申請專利範圍 1. 一種支撐結構,其至少包括: 一支撐座,其至少包括一支撐座主體、— 少一個固定件’該塾片利用該固定件固定於該支撐座主體 ,上,該墊片具有至少一個開口 ,該固定件具 该端部收容於該開口之中;以及 一覆蓋環,設於該支撐座之上。 2·如申請專利範圍第1項所述之支撐鈐 端部突出於該墊片表面,其突出之高度小於ι公二。,该 3·如申請專利範圍第j項所述之支撐結、:=二 覆蓋環具有一配合部,該配合部設於該覆 ”,該 於該固定件的位置。 衣4面之相應 4.如申請專利範圍第3項所述之支撐結 配合部為一凹槽。 霉其中,該 5二如申請專利範圍第3項所述之支撐結構,复 ^ 覆盍J哀於該配合部之厚度大於4公釐。 八,该 6·如申請專利範圍第3項所述之支撐 配合部為一凹槽,且該端部突出於該塾片表面而、該 咼度小於該凹槽之深度。 而其穴出之 7·如申請專利範圍第丨 固定件為一螺栓。 、汀述々文存…構,其中,該 嫂上如1請專利範圍第7項所述之支撐結構,复φ、 螺栓為一黎頭式螺栓(pl〇w b〇lt)。 霉/、中,戎 η 9良如i胃專利範圍第1項所述之支撑 '结構’ t中, 開口為一錐形開口。 1< 餅具中,該 第12頁 1258208 六、申請專利範圍 1 0 .如申請專利範圍第1項所述之支撐結構,其中,該 覆蓋環之組成包含不銹鋼。 11.如申請專利範圍第1項所述之支撐結構,其中,該 覆蓋環之組成包含非磁性材料。 1 2.如申請專利範圍第1項所述之支撐結構,其更包括 一個熱感測元件,設於該墊片與該支撐座主體之間。 1 3. —種晶圓承載裝置,包括: 一晶座; 一支撐座,用以支撐該晶座的邊緣,其至少包括一支 撐座主體、一墊片以及至少一個固定件,該墊片利用該固 定件固定於該支撐座主體之上,該墊片具有至少一個開 口,該固定件具有一端部,該端部收容於該開口之中;以 及 一覆蓋環,設於該支撐座之上。 1 4.如申請專利範圍第1 3項所述之晶圓承載裝置,其 中,該端部突出於該墊片表面,其突出之高度小於1公 釐。 1 5 .如申請專利範圍第1 3項所述之晶圓承載裝置,其 中,該覆蓋環具有一配合部,該配合部設於該覆蓋環表面 之相應於該固定件的位置。 1 6.如申請專利範圍第1 5項所述之晶圓承載裝置,其 中,該配合部為一凹槽。 1 7.如申請專利範圍第1 5項所述之晶圓承載裝置,其 中,該配合部為一凹槽,且該端部突出於該墊片表面而其1258208 VI. Patent application scope 1. A support structure comprising at least: a support base comprising at least one support base body, wherein: a support member is fixed to the support base body by the fixing member The gasket has at least one opening, the fixing member has the end portion received in the opening; and a cover ring disposed on the support seat. 2. The support 钤 end portion according to item 1 of the patent application scope protrudes from the surface of the gasket, and the height of the protrusion is less than ι 公二. 3. The support knot according to item j of the patent application scope::=The second cover ring has a fitting portion, and the fitting portion is disposed at the position of the fixing member. The corresponding 4 sides of the garment 4 The support knot fitting portion according to claim 3 is a groove. The mold is as described in claim 3, and the support structure is as described in claim 3 of the patent application scope. The thickness of the support portion is a groove, and the end portion protrudes from the surface of the cymbal, and the yoke is smaller than the depth of the groove. 7) If the application is within the scope of the patent application, the fixed part is a bolt. The Ting Shuo Wen Cun... structure, wherein the support structure as described in item 7 of the patent scope, complex φ The bolt is a Phillips bolt (pl〇wb〇lt). The mold/structure is the same as the support structure in the first aspect of the invention. 1< In the cake, the 12th page 1258208 6. The patent application scope is 10. The claim is as described in item 1 of the patent application scope. The structure of the cover ring comprises a stainless steel. The support structure according to claim 1, wherein the cover ring comprises a non-magnetic material. 1 2. As claimed in claim 1 The support structure further includes a thermal sensing component disposed between the spacer and the support body. 1 3. A wafer carrier device comprising: a crystal holder; a support base for supporting An edge of the crystal holder, comprising at least a support body, a gasket and at least one fixing member, the gasket is fixed on the support body by the fixing member, the gasket having at least one opening, the fixing member An end portion of the wafer carrying device according to claim 13 wherein the end portion is received in the opening, and a cover ring is disposed on the support base. a portion of the wafer carrying device, wherein the covering ring has a mating portion, and the mating portion is provided, and the protruding portion has a height of less than 1 mm. For the coverage The wafer bearing device of claim 15, wherein the mating portion is a groove. 1 7. If the patent application scope is item 15 The wafer carrying device, wherein the engaging portion is a groove, and the end portion protrudes from the surface of the gasket 0467-A40153TWF(η);920008;HEARTA.ptd 第13頁 1258208 六、申請專利範圍 突出之高度小於該凹槽之深度。 ·如申請專利範圍第1 5項所述之晶圓承载裝置 5亥覆蓋環於該配合部之厚度大於4公釐。 1 9·如申請專利範圍第丨3項所述之晶圓承栽 該固定件為一螺栓。 、 2 0 ·如申请專利範圍第1 9項所述之晶圓承載裝 該螺栓為一黎頭式螺栓(plow bolt)。 、 2 1 ·如申請專利範圍第丨3項所述之晶圓承 該開口為一錐形開口。 以置 22 ·如申請專利範圍第丨3項所述之晶圓承載 该覆蓋環之組成包含不銹鋼。 2二3 ·如+申請專利範圍第1 3項所述之晶圓承载裝 该覆蓋環之組成包含非磁性材料。 24·如申請專利範圍第13項所述之晶圓承載 5包括-個熱感測元件,設於該墊片與該 ;置 間。 /土 土體之 中 其 中 中 中 中 中 其 其 其 其 其 其0467-A40153TWF(η);920008;HEARTA.ptd Page 13 1258208 VI. Patent Application The height of the protrusion is less than the depth of the groove. The wafer carrier device according to claim 15 of the patent application, wherein the thickness of the cover ring is greater than 4 mm at the mating portion. 1 9 · Wafer bearing as described in item 3 of the patent application. The fixing member is a bolt. 2 0. The wafer carrying device described in claim 19 is a plow bolt. 2 1 · The wafer according to item 3 of the patent application is a tapered opening. The wafer carrier described in item 3 of the patent application scope includes the stainless steel. 2 2 3 · Wafer carrying device as described in item 1 of the patent application scope. The composition of the covering ring comprises a non-magnetic material. 24. The wafer carrier 5 of claim 13 includes a thermal sensing component disposed between the spacer and the spacer. Among the soils and soils, among them,
TW93100868A 2004-01-14 2004-01-14 Loading device for wafer and the supporting structure thereof TWI258208B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW93100868A TWI258208B (en) 2004-01-14 2004-01-14 Loading device for wafer and the supporting structure thereof
JP2004104100A JP2005203724A (en) 2004-01-14 2004-03-31 Wafer holding apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93100868A TWI258208B (en) 2004-01-14 2004-01-14 Loading device for wafer and the supporting structure thereof

Publications (2)

Publication Number Publication Date
TW200524108A TW200524108A (en) 2005-07-16
TWI258208B true TWI258208B (en) 2006-07-11

Family

ID=34825360

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93100868A TWI258208B (en) 2004-01-14 2004-01-14 Loading device for wafer and the supporting structure thereof

Country Status (2)

Country Link
JP (1) JP2005203724A (en)
TW (1) TWI258208B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6384758B2 (en) * 2014-09-30 2018-09-05 新東工業株式会社 Deposit removal method
EP3543795A1 (en) * 2018-03-20 2019-09-25 Patek Philippe SA Genève Method for manufacturing silicon clock components

Also Published As

Publication number Publication date
TW200524108A (en) 2005-07-16
JP2005203724A (en) 2005-07-28

Similar Documents

Publication Publication Date Title
TWI272315B (en) Methods of treating non-sputtered regions of PVD target constructions to form particle traps, and PVD target constructions comprising projections along a non-sputtered region
TW396210B (en) Screwless shield device for vacuum processing chambers and process for operating the same
JP5554465B2 (en) Design process kits to reduce particle generation
TW438897B (en) Method of manufacturing member for thin-film formating apparatus and the member for the apparatus
US7264679B2 (en) Cleaning of chamber components
US20090050272A1 (en) Deposition ring and cover ring to extend process components life and performance for process chambers
US20120138457A1 (en) Encapsulated sputtering target
CN109952389A (en) Manufacturing method of sputtering target and sputtering target
TW200949013A (en) Ceramic sprayed member, making method, abrasive medium for use therewith
SG10201407637TA (en) An electrostatic chuck with an angled sidewall
TWI258208B (en) Loading device for wafer and the supporting structure thereof
JP4458995B2 (en) Wafer support member
CN103325725A (en) Electrostatic Chuck
TWI816854B (en) Sputter trap having a thin high purity coating layer and method of making the same
US7250220B1 (en) Bond strength of coatings to ceramic components
TWI878328B (en) Coating for chamber particle reduction and chamber component and chamber comprising the same
JP4820508B2 (en) Sputtering target and manufacturing method thereof, sputtering apparatus, thin film manufacturing method, electronic component manufacturing method
JP2006057172A (en) Thin film manufacturing apparatus and manufacturing method thereof
CN106191793B (en) Film forming apparatus and cleaning method thereof
TWI423381B (en) Auxiliary stage and method of utilizing auxiliary stage
JP4672121B2 (en) Sputtering target, sputtering apparatus using the same, and thin film manufacturing method
US20030209199A1 (en) Shutter
JPH11236663A (en) Sputtering target, sputtering apparatus and sputtering method
TWI270162B (en) Physical vapor deposition process and apparatus thereof
JP2001295024A (en) Member for thin film deposition system, and its manufacturing method

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees