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TWI255869B - Ni alloy as an anode for Ni electroplating - Google Patents

Ni alloy as an anode for Ni electroplating

Info

Publication number
TWI255869B
TWI255869B TW92103699A TW92103699A TWI255869B TW I255869 B TWI255869 B TW I255869B TW 92103699 A TW92103699 A TW 92103699A TW 92103699 A TW92103699 A TW 92103699A TW I255869 B TWI255869 B TW I255869B
Authority
TW
Taiwan
Prior art keywords
alloy
anode
electroplating
ppm
present
Prior art date
Application number
TW92103699A
Other languages
Chinese (zh)
Other versions
TW200416308A (en
Inventor
Katsuo Sugawara
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of TW200416308A publication Critical patent/TW200416308A/en
Application granted granted Critical
Publication of TWI255869B publication Critical patent/TWI255869B/en

Links

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

The present invention provides a Ni alloy as an anode for Ni electroplating which exhibits a high electroplating yield. The Ni alloy anode of the present invention essentially consists of Ni having a purity of 99.99 mass % or more, and contains, as components of the alloy, 30-300 ppm of Si, and 30-300 ppm of Al.
TW92103699A 2001-08-22 2003-02-21 Ni alloy as an anode for Ni electroplating TWI255869B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001251151A JP3985130B2 (en) 2001-08-22 2001-08-22 High purity Ni alloy anode material for electrolytic Ni plating showing high plating yield

Publications (2)

Publication Number Publication Date
TW200416308A TW200416308A (en) 2004-09-01
TWI255869B true TWI255869B (en) 2006-06-01

Family

ID=19079842

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92103699A TWI255869B (en) 2001-08-22 2003-02-21 Ni alloy as an anode for Ni electroplating

Country Status (2)

Country Link
JP (1) JP3985130B2 (en)
TW (1) TWI255869B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074555A1 (en) * 2003-02-21 2004-09-02 Mitsubishi Materials Corporation Ni ALLOY ANODE MATERIAL FOR ELECTROLYTIC Ni PLATING
JP2008184637A (en) * 2007-01-29 2008-08-14 Nec Electronics Corp Electrolytic Ni plating apparatus and method for manufacturing semiconductor device
CN105200267B (en) * 2014-06-11 2017-11-17 丹阳市凯鑫合金材料有限公司 Lithium battery rivet pure nickel N6 and its production method

Also Published As

Publication number Publication date
JP2003064437A (en) 2003-03-05
TW200416308A (en) 2004-09-01
JP3985130B2 (en) 2007-10-03

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees