1247107 玖、發明說明： 【發明所屬之技術領域】 本發明係蒙-種化學簡之監控系統，_⑼在儲放雜性化學液 ㈣上的監測及控織統，可以線上即時監_槽的絕緣内襯是否已唾遭 到破壞辦，並控制半導體製程^，進而提昇半導體製程的品質與良率。 【先前技術】 液體化學品供應系統乃铸體製造過程中的相當重要的一個環節。液體 化學品供應系統從進料作業區起，料槽車送人功，即藉由輸送至_ 經由管線鞋化學《纽清淨”使_，若是纖鍾制藉由貨車 =碼頭區卸貨，再由堆高機或推車送至化學儲存房或分送至化學供應房及 清淨室使用，㈣後之廢棄物轉存至廢敎_，再輸送至廢液槽或廢液 儲存房儲存。 · 如該行業者所知，半導體製程所需求的化學液常需要酸、鹼等具有高腐 蝕性(c〇rrosive)的液體，並且需要雉持相當高的純度，以避免污染（特別 是金屬）以及確保晶圓製造過程中的良率。雖然這些轉體製程中所使用的 腐飯性化學液皆是罐過特殊祕處理·儲槽來承裝或儲放，然而，廢 務人員或品管人員仍然必須定期地採集儲槽内的化學液樣本，然後再將收 集到的化學液樣本進—步_精密昂#的微量分析儀器分析，才能確定該 1247107 諸才9内的化學表疋否遭到金屬污染。通常，這類污染的發生是由於儲槽内 部的防蝕内襯遭受化學破壞，產生微小穿孔瑕疵(pitting)，而使得儲槽内 的酸、鹼等具有高腐蝕性的液體接觸到儲槽的金屬殼體所致。 目則，該打業以及技術領域中並沒有可以即時線上監測儲槽内襯破裂的 技術手段’俾能及時通知生產線人員廠中儲槽的狀態以及儲槽内化學液的 口口質。而以習知定期人丄採樣的作法，計分㈣、昂#，且往往當分析 結果出來時，經㈣的化學液已經在線上侧―段時間，而造成大批受污 3曰曰圓必』丟棄響生產成本甚矩。再者，廠區内儲槽的腐银控制更 攸關到現場作業人員的生命安全，而不能輕易忽視。 鑑於此，申請人乃根據此等缺點及依據多年從事該相關技術領域之經 馬双，悉心觀察且研究之，進而提出本發明可線上即時監控儲槽雜之監測 糸統。 【發明内容】 本毛明之主要目的即在提供_種可即時監控儲槽舰之監啦統，不但 可以應用在龜内咖定儲槽，同時更可以廣泛應用在輪送過程中所使用 的各種儲槽容[例如载運化學品的槽車等等。 本發明之另一目的右挺# « I… ’、 半導體製程的線上控制系統，可以即時監 1247107 壞蝕穿，並控制半導體製程單元，進而提昇 測儲槽的内襯是否已經遭到破 半導體製程的品質與良率。， 為達前述之目的盥， ” 據本發明之較佳實施例，本發明提供一種 仏放雜性化學液儲槽之腐钱 —、〗乐、冼，包3有一槽體，其由一導電殼體 =緣峨所心_侧纖；-彳貞職，浸入該槽體 她撕；以及—娜置，電獅細極，其中 測量職置並且電連接鱗電殼體。當魏緣缝被辦，造成該槽 體所承裝之該腐錄化學液接觸料電諸時，賴糧職餅可接收 到一相對訊號。 根據本發日i較佳實施例，本發明披露_種娜 品質的半導體製造控«統，包含有—反應容器，可容納至少—待碱理 j導體晶圓…晶圓移動裝置，用來將辭導體晶圓移人或移出該反應 容器；-槽體，其由-導電殼體以及絕緣内襯所構成，㈣承裝化學液， 亚經由-管«統輸送該化學液至該反應容器内；其巾該槽體裝設有一監 測系統，包括有一偵測電極，其浸入該槽體所承裝之該化學液中；以及一 里測I置’電連接該侧電極，其巾該侧量難置並且電連接該導電殼 體，而當該絕緣内襯被蝕穿，造成該槽體所承裝之該化學液接觸該導電殼 體時，該偵測量測裝置即可接收到一相對訊號；以及一控制單元，連接至 該量測裝置，且在該偵測量測裝置接收到該相對訊號時，輪出一控制訊號 到遠晶圓移動裝置，停止該晶圓移動裝置將該半導體晶圓移入該反應容器 1247107 之動作。 為了使貝審查委員能更近一步了解本發明之特徵及技術内容，請參閱 以下有關本發明之詳細說明與附圖。然而所附圖式僅供參考與輔助說明 用’並非用來對本發明加以限制者。 【實施方式】 請參閱圖一，其繪示的是依據本發明較佳實施例之一種儲放腐蝕性化學 液儲槽之腐|虫監測系統1〇。如圖一所示，腐姓監測系統包括有槽體12， 其由一導電的堅固殼體14以及絕緣防蝕内襯16所構成，槽體12用以承裝 腐钱性化學液18，其中殼體(Shell)14通常為金屬材料所製，例如不鏽鋼 (stainless steel)、碳鋼（carbon steel)、鍍鋼（coated steel)或I呂金屬 及其合金等等。 殼體14上另設置有不同用途之管路或閥件，其數量、尺寸以及安裝位 置需視現場狀況以及實際需要而定，在此並不加贅述，但大體上會有排放 管（drain)22、排氣管（vent)24、進料用之輸入管線26以及輸出管線28之 設計，但不限於此。 槽體12内的防蝕内襯ΐβ可以為氟素聚合物樹脂（fiuor〇p〇lymer resin) 材料所構成者，可包括有聚四氟乙烯(poly-tetra-fluoroethylene，PTFE) 1247107 或聚四氟乙烯（per-fluoroalkoxy，PFA)等，但不限於此。一般，聚四氟乙 烯(PFA)係作為熔接兩片聚四氟乙烯(PTFE)之接面接著材料。而其它鐵氟龍 材料，例如乙稀四氟乙烯共聚敗塑料（ethylene tetra-fluoroethylene， ETFE)或者乙烯丙烯氟化物（fiuorinated ethylene propylene，FEP)等等 皆可以用作防餘内襯16之成分。 舉例來說，腐姓性化學液18可能為硫酸(sulfuric acid)、石肖酸(nitric acid)、鹽酸(hydrochloric acid)、氫氟酸(hydrofluoric acid)等半導體 製程上常用的酸液，或者過氧化氫(hydr〇gen per〇xi(je)、氣化鐵（ferric chloride)、含鹵素有機物(halogenated organics)，或者其它腐餘性化學 液，但亦不限於上述這些化學液種類。 本發明之特徵在於槽體12内安置有一偵測電極32，其浸入槽體12所 承裝的腐蝕性化學液18中。偵測電極32係由抗蝕材料所構成，例如白金 等，但不限於此。_電極32、經由一導線34連接至_量測儀器洲。根據 本發明之較佳實施例，量職E 36係為—電阻計(Qh_eter)，其量測範圍 約在1M Ohm至40G Ohm之間，輸出電壓約為5〇伏特至2〇〇伏特，但不限 於此範圍者。《儀器36並且經由導線38電連接導電殼體14。量測儀器 36亚連接至-電腦單元42，其可用以處理並紀錄經由量測儀㈣傳遞過 來得偵測數據資料。電腦單元42並可外接螢幕44，可顯示即時的監測數據， 以及外接至一警示裝置（alarm)52。 10 12471071247107 玖, invention description: [Technical field of invention] The present invention is a monitoring system for Mongolian-type chemical simplification, _(9) monitoring and control woven system on storage and release chemical liquid (4), which can be directly monitored on-line Whether the lining has been damaged and controlled, and control the semiconductor process ^, thereby improving the quality and yield of the semiconductor process. [Prior Art] The liquid chemical supply system is a very important part of the casting manufacturing process. The liquid chemical supply system starts from the feeding operation area, and the trough car delivers the merits, that is, by transporting to the _ through the pipeline shoe chemistry "New Zealand", if the bell system is unloaded by the truck = dock area, then The stacker or cart is sent to the chemical storage room or distributed to the chemical supply room and the clean room. The waste after (4) is transferred to the waste 敎, and then sent to the waste tank or the waste storage room for storage. As is known to the industry, chemical fluids required for semiconductor processes often require highly corrosive liquids such as acids and bases, and require a relatively high purity to avoid contamination (especially metals) and to ensure Yield in the wafer manufacturing process. Although the rice cooking chemicals used in these transfer processes are filled or stored in special tanks, the waste staff or quality control personnel are still It is necessary to periodically collect the chemical liquid sample in the storage tank, and then analyze the collected chemical liquid sample into the micro-analytical instrument of _ _ _ _# to determine whether the chemical table in the 1247107 genus 9 is damaged by metal. Pollution. Usually, this type of The dyeing occurs because the corrosion-resistant lining inside the storage tank is chemically damaged, resulting in tiny pitting, which causes the highly corrosive liquid such as acid and alkali in the storage tank to contact the metal shell of the storage tank. Therefore, there is no technical means in the field of work and technology that can immediately monitor the lining of the tank lining in the field of technology, and can inform the production line personnel of the state of the tank in the plant and the mouth quality of the chemical liquid in the tank. In the practice of regular sampling of people, scoring (4), ang #, and often when the analysis results come out, the chemical liquid in (4) has been online on the upper side - a period of time, resulting in a large number of contaminated 3 曰曰 必The production cost is very short. Moreover, the rot silver control of the storage tanks in the plant area is more critical to the life safety of the field workers, and cannot be easily ignored. In view of this, the applicant has been engaged in the related technology for many years based on these shortcomings and basis. The field of Ma Shuang, carefully observed and researched, and then proposed that the present invention can monitor the monitoring system of the storage tank on-line. [Summary of the Invention] The main purpose of the present invention is to provide The real-time monitoring of the storage tanks can not only be applied to the turtles in the turtles, but also can be widely used in various tanks used in the transfer process [such as tank trucks carrying chemicals, etc. Another object of the present invention is the right-facing # « I... ', the on-line control system of the semiconductor process, which can immediately monitor the 1247107 bad etch and control the semiconductor process unit, thereby improving whether the lining of the storage tank has been broken by the semiconductor process. According to a preferred embodiment of the present invention, the present invention provides a stagnation of a sputum-mixing chemical liquid storage tank, a music, a raft, and a package 3 Body, which consists of a conductive shell = edge of the heart _ side fiber; - 彳贞 ,, immersed in the tank body she tears; and - Na set, electric lion fine pole, which measures the position and electrically connected to the scale shell . When the Wei edge seam is handled, causing the rotted chemical liquid to be charged by the tank, the grain cake can receive a relative signal. According to a preferred embodiment of the present invention, the present invention discloses a semiconductor manufacturing control system comprising a -reaction vessel capable of accommodating at least a substrate wafer to be alkalized. The conductor wafer is moved or removed from the reaction vessel; the tank body is composed of a conductive shell and an insulating lining, and (4) is filled with a chemical liquid, and the chemical liquid is transported through the tube to the reaction vessel. The towel body is provided with a monitoring system including a detecting electrode immersed in the chemical liquid contained in the tank body; and a measuring electrode for electrically connecting the side electrode, the side of the towel Difficult to set and electrically connect the conductive housing, and when the insulating lining is eroded, causing the chemical liquid contained in the tank to contact the conductive housing, the detecting and measuring device can receive a relative And a control unit connected to the measuring device, and when the detecting measuring device receives the relative signal, rotating a control signal to the far-wafer moving device, stopping the wafer moving device to stop the semiconductor Wafer moved into the reaction vessel 1247107 . In order to provide a more detailed understanding of the features and technical aspects of the present invention, the following detailed description of the invention and the accompanying drawings. However, the drawings are for illustrative purposes only and are not intended to limit the invention. [Embodiment] Please refer to FIG. 1 , which illustrates a rot and insect monitoring system for storing a corrosive chemical liquid storage tank according to a preferred embodiment of the present invention. As shown in FIG. 1, the rot surname monitoring system includes a trough body 12, which is composed of a conductive and solid casing 14 and an insulating and anti-corrosion lining 16 for supporting the rotted chemical liquid 18, wherein the shell The shell 14 is usually made of a metal material such as stainless steel, carbon steel, coated steel or Ilu metal and alloys thereof. The casing 14 is provided with pipes or valve members for different purposes. The number, size and installation position of the casing 14 are determined according to the site conditions and actual needs, and are not described here, but generally there are drains. 22. The design of the exhaust vent 24, the input line 26 for feeding, and the output line 28 are not limited thereto. The anti-corrosion liner ΐβ in the tank body 12 may be composed of a fluorine polymer resin, and may include poly-tetra-fluoroethylene (PTFE) 1247107 or polytetrafluoroethylene. Per-fluoroalkoxy (PFA), etc., but is not limited thereto. Typically, polytetrafluoroethylene (PFA) is used as a joining material for welding two sheets of polytetrafluoroethylene (PTFE). Other Teflon materials, such as ethylene tetra-fluoroethylene (ETFE) or fiuorinated ethylene propylene (FEP), can be used as the component of the anti-residual liner 16. For example, the Poison Chemical Liquid 18 may be an acid commonly used in semiconductor processes such as sulfuric acid, nitric acid, hydrochloric acid, hydrofluoric acid, or the like. Hydrogen peroxide (hydr〇gen per〇xi (je), ferric chloride, halogenated organics, or other residual chemical liquid, but is not limited to the above chemical liquid species. The detecting body 32 is disposed in the tank body 12 and is immersed in the corrosive chemical liquid 18 contained in the tank body 12. The detecting electrode 32 is made of a resist material such as platinum, but is not limited thereto. The _ electrode 32 is connected to the _ measuring instrument continent via a wire 34. According to a preferred embodiment of the invention, the measuring E 36 is a resistance meter (Qh_eter) with a measuring range of about 1 M Ohm to 40 G Ohm. The output voltage is approximately 5 volts to 2 volts, but is not limited to this range. Instrument 36 is also electrically coupled to conductive housing 14 via wire 38. Measuring instrument 36 is sub-connected to computer unit 42, which is available To process and record through the measuring instrument (four) Detect data comes. Computer unit 42 and an external screen 44 can display real-time monitoring data, and to add a warning device (alarm) 52. 10 1247107
睛參閱圖二，苴检+认H 線上量測_數據二 較佳實施例之腐健敵統10所 豕•、忍圖表。由於槽體12所使用的PTFE内襯為絕緣體， 版:此’在讀狀態下，由量測儀器36所量測到的 ,”、、m 1’ Μ絕緣峨16 穿，造成槽體i2所承裳之腐 性化學液18接觸到導^λ γ包「双μ 14日寸，量測儀器36即可接收到一低電阻訊See Figure 2, 苴 + + H H Online Measurement _ Data 2 The preferred embodiment of the rot and the enemy 10 豕 •, forbearance chart. Since the PTFE lining used in the tank body 12 is an insulator, this version is measured by the measuring instrument 36 in the read state, and the m 1 ' Μ insulating 峨 16 is worn, causing the tank body i2 to bear The corrosive chemical solution 18 of the skirt is in contact with the guide λ γ package "double μ 14 days", the measuring instrument 36 can receive a low resistance signal
2 旦里測儀器36量測到低雷阳4 % D 纖秦鳴，立㈣電腦單元42傳送訊號觸 動吕不衣置52，以通知線上人員進行處置。 凊茶閱圖三，其繪示的是依據本發明第二較佳實施例一種能夠線上即時 and real—tlme)監測化學液品質的半導體製造控制系統_ 中相同或類似的元件仍沿用與前圖巾相_符號來表示。本發明半導體製 造控制系、统100包括有-反應容器6〇，可用來容納待濕處理之半導體晶圓 70。反應容器60可以為單晶圓（Singie wafer)或多晶圓（咖出邮的反 應谷為，其可以為氣密式或者開放式。前述之半導體晶圓刊的濕處理方式 可以為批次(bateh)更換反應容H 6G _化學液68或者以概方式維持^ 學液68的液量。半導體製造控制系、统1〇〇另包括有晶圓移動裝置8〇，用來 將半導體晶圓70移入或移出反應容器60。反應容器6q内的化學液⑽伏由 管線系統90從槽體12輸送過來。 本發明半導體製造控制系統1⑽包括有腐敍監嶋、統1Q，其包含槽㊃ 12，用以承裝腐#性化學液18。槽體12同樣是由導電殼體14以及絕緣内 襯16所構成。殼體14上視實際需要可另設置有不同用途之管路或閥件， 1247107 ’量測儀器36即可接收到 立即由電腦控制單元42 所承裝之腐蝕性化學液18接觸到導電殼體14時 一相對訊號。一旦量測儀器36量測到相對訊號， 傳送訊號觸動警示裝置 、 _鬥出r，电月笱控带j單 制單元42輸出-控制《至_㈣上的自_咖· 92，切斷 槽體12與反應通路，停止將經污_化學液18輸送至反庫 容器60。 〜 元42輸出-控制訊號到晶圓移動裝置8〇，立即停止晶圓移動裝錢將半 _晶圓70移人該反應容器之輯，藉此將損害減到最低。此外，電腦控 請參閱圖四，其繪示的是依據本發明另一較佳實施例的示意圖。除了應 用在半導難程單元巾以外，本發蚊可錢—步剌在舰外的化學^ 輪送範嘴，例如載運化學品的槽車。圖四中，輸送監測系統包括有車 用槽體112，其内部由絕緣防仙襯116所保護，並固定在卡車上。槽體 112用以承裝腐钱性化學液’如硫酸、猶、鹽酸、氣敦酸等半導體製程上 常用的酸液’或者過氧化氫、氣化鐵、含_素有機物，或者其它腐錄化 學液等等。 槽體112内安置有—彳貞測電極32，其浸人該槽體所承裝之化學液中。 ' 兒極32、、、二由一導線34連接至一量測儀器36。根據本發明，量測儀器 36係為一電阻計，其量測範圍約在1M Ohm至40G Ohm之間，輸出電壓約為 ⑽伕特至200伏特，但不限於此範圍者。量測儀器％並且經由導線％電 連接車用槽體112的導電金屬外殼。量測儀器36可連接至一車上電腦單 13 1247107 元，其可贱處理並紀驗由量測竊36傳遞過來得翻數據資料。前成 之車上電腦單元並可外接榮幕’可顯示即時的監測數據，提供車上人員= 考。 、彡 斤以上所述僅林發日月之較佳實施例，凡依本發明申請專利範圍所做之均 等變化與修飾，皆應屬本發明專刹之涵蓋範圍。 二 【圖式簡單說明】 圖式之簡單說明 圖、、、3示的疋依據本發明較佳實施例一種儲放腐|虫性化學液儲样之腐 钱監測系統。 、 圖二緣示的是依據本發明較佳實施例之腐钱監測系統所線上量測的於 測數據示意圖表。 ^ 圖三繪示的是依據本發明第二較佳實施例_種能夠線上即時監測化學 液品質的半導體製造控制系統。 十 圖四綠示的是依據本發明另—較佳實施例的示意圖。 圖式之符號說明 12 儲槽 16 内襯 10 腐蝕監測系統 14 槽體 142 The measuring instrument 36 measured the low Leiyang 4% D fiber Qinming, and the vertical (4) computer unit 42 transmitted the signal to touch Lu Buyi 52 to notify the online personnel to dispose of it. Referring to FIG. 3, the same or similar components in the semiconductor manufacturing control system capable of monitoring the chemical liquid quality on the line according to the second preferred embodiment of the present invention are still used. The towel phase _ symbol is used to indicate. The semiconductor manufacturing control system 100 of the present invention includes a reaction vessel 6〇 for containing the semiconductor wafer 70 to be wet processed. The reaction vessel 60 can be a single wafer (Singie wafer) or a multi-wafer (reaction valley, which can be airtight or open type. The wet processing method of the aforementioned semiconductor wafer can be batch ( Bateh) replaces the reaction volume H 6G _ chemical liquid 68 or maintains the liquid amount of the liquid 68. The semiconductor manufacturing control system further includes a wafer moving device 8 将 for the semiconductor wafer 70 The reaction vessel 60 is moved in or out of the reaction vessel 60. The chemical liquid (10) volts in the reaction vessel 6q is transported from the tank body 12 by the pipeline system 90. The semiconductor manufacturing control system 1 (10) of the present invention includes a smear control system 1Q, which includes a tank 4, It is used to support the sulphur chemical liquid 18. The tank body 12 is also composed of the conductive shell 14 and the insulating lining 16. The shell 14 can be provided with different pipelines or valve parts according to actual needs, 1247107 The measuring instrument 36 can receive a relative signal when the corrosive chemical liquid 18 immediately received by the computer control unit 42 contacts the conductive housing 14. Once the measuring instrument 36 measures the relative signal, the transmitting signal touches the warning. Device, _ bucket out r, electricity The control unit j unit unit 42 outputs - controls "from _ (4) on the _ café 92, cuts the tank body 12 and the reaction path, and stops the transport of the smudge_chemical liquid 18 to the anti-reservoir container 60. ~ yuan 42 Output-control signal to the wafer moving device 8〇, immediately stop the wafer moving and load the money, and transfer the half-wafer 70 to the reaction container to minimize the damage. In addition, the computer control is shown in Figure 4. Illustrated is a schematic view according to another preferred embodiment of the present invention. In addition to being applied to a semi-conductive hard-area unit, the present mosquito can be used as a chemical-based rotary nozzle, such as carrying chemistry. In the fourth tank, the transport monitoring system includes a vehicle tank 112, the interior of which is protected by an insulated anti-sand liner 116 and fixed on the truck. The trough body 112 is used to hold the rotten chemical liquid ' Such as sulfuric acid, jujube, hydrochloric acid, gas acid and other semiconductor processes commonly used in the acid process 'or hydrogen peroxide, gasification of iron, containing organic matter, or other chemical recording liquid, etc.. The electrode 32 is immersed in the chemical liquid contained in the tank. 'Children's pole 32, And a wire 34 is connected to a measuring instrument 36. According to the invention, the measuring instrument 36 is a resistance meter having a measuring range of about 1 M Ohm to 40 G Ohm and an output voltage of about (10) 至 to 200 volts, but not limited to this range. The measuring instrument% is electrically connected to the conductive metal casing of the vehicle tank 112 via the wire %. The measuring instrument 36 can be connected to a vehicle computer 13 13247107, which can be processed And the test passed by the measurement and stealing 36 to transfer the data. The former computer on the computer unit and external glory screen can display real-time monitoring data, provide on-board personnel = test. The preferred embodiment of the present invention, which is equivalent to the scope of the invention, should be included in the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS [Brief Description of the Drawings] Figs. 3, 3 show a rotten money monitoring system for storing and storing septic chemical liquid storage samples according to a preferred embodiment of the present invention. FIG. 2 is a schematic diagram of the measured data measured on the line of the rotten money monitoring system according to the preferred embodiment of the present invention. Figure 3 is a diagram showing a semiconductor manufacturing control system capable of on-line monitoring of chemical liquid quality in accordance with a second preferred embodiment of the present invention. Figure 4 is a schematic view of another preferred embodiment in accordance with the present invention. Symbolic description of the pattern 12 Storage tank 16 Lining 10 Corrosion monitoring system 14 Tank 14