TWD241950S - Sputtering target - Google Patents
Sputtering targetInfo
- Publication number
- TWD241950S TWD241950S TW113305954F TW113305954F TWD241950S TW D241950 S TWD241950 S TW D241950S TW 113305954 F TW113305954 F TW 113305954F TW 113305954 F TW113305954 F TW 113305954F TW D241950 S TWD241950 S TW D241950S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- sputtering target
- view
- enlarged view
- left views
- Prior art date
Links
Abstract
【物品用途】;本設計有關於一種濺鍍用靶。;【設計說明】;前視圖、後視圖及左側視圖皆為本設計右側視圖之鏡像，故在本設計中省略前視圖、後視圖及左側視圖。;局部放大圖為俯視圖之13-13剖面圖之局部放大圖。;虛線部分為不主張設計之部分。【Purpose of Item】; This design relates to a target for sputtering. ; 【Design Description】; The front, rear, and left views are all mirror images of the right view of this design; therefore, the front, rear, and left views are omitted in this design. ; The enlarged view is a partial enlarged view of section 13-13 of the top view. ; The dotted lines represent parts that are not part of the design.
Description
本設計有關於一種濺鍍用靶。This design relates to a sputtering target.
前視圖、後視圖及左側視圖皆為本設計右側視圖之鏡像，故在本設計中省略前視圖、後視圖及左側視圖。The front view, rear view, and left view are all mirror images of the right view of this design; therefore, the front view, rear view, and left view are omitted in this design.
局部放大圖為俯視圖之13-13剖面圖之局部放大圖。The enlarged view is a partial enlarged view of section 13-13 of the top view.
虛線部分為不主張設計之部分。The dotted lines represent parts that are not part of the design.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/896,858 | 2023-07-07 | ||
| US202329896858 | 2023-07-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD241950S true TWD241950S (en) | 2025-12-11 |
Family
ID=91896153
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113300067F TWD237530S (en) | 2023-07-07 | 2024-01-05 | Sputtering target |
| TW113305954F TWD241950S (en) | 2023-07-07 | 2024-01-05 | Sputtering target |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113300067F TWD237530S (en) | 2023-07-07 | 2024-01-05 | Sputtering target |
Country Status (2)
| Country | Link |
|---|---|
| JP (2) | JP1775440S (en) |
| TW (2) | TWD237530S (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD981970S1 (en) | 2021-03-04 | 2023-03-28 | Kokusai Electric Corporation | Substrate mounting plate for substrate processing apparatus |
-
2024
- 2024-01-05 TW TW113300067F patent/TWD237530S/en unknown
- 2024-01-05 TW TW113305954F patent/TWD241950S/en unknown
- 2024-01-09 JP JP2024000172F patent/JP1775440S/en active Active
- 2024-01-09 JP JP2024000173F patent/JP1775441S/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD981970S1 (en) | 2021-03-04 | 2023-03-28 | Kokusai Electric Corporation | Substrate mounting plate for substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1775441S (en) | 2024-07-16 |
| TWD237530S (en) | 2025-04-11 |
| JP1775440S (en) | 2024-07-16 |
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