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TW202601246A - Optical laminates, image display panels, and image display devices - Google Patents

Optical laminates, image display panels, and image display devices

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Publication number
TW202601246A
TW202601246A TW114119982A TW114119982A TW202601246A TW 202601246 A TW202601246 A TW 202601246A TW 114119982 A TW114119982 A TW 114119982A TW 114119982 A TW114119982 A TW 114119982A TW 202601246 A TW202601246 A TW 202601246A
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aforementioned
weight
antistatic layer
less
optical laminate
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TW114119982A
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Chinese (zh)
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山本悟士
木村智之
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日商日東電工股份有限公司
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Abstract

本發明所提供之光學積層體具備黏著片、抗靜電層及光學薄膜。抗靜電層包含導電性粒子。抗靜電層滿足以下式(1)。式(1)之D係針對抗靜電層利用原子力顯微鏡評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q。E係針對歷經德國工業規格DIN75220所規定之耐候性試驗(試驗條件:Z-IN1)之抗靜電層利用原子力顯微鏡評估之粒子面積率P(%)與總電流值(nA)之乘積(P×0.01)×Q。該光學積層體適合應用於在車載等之嚴酷環境下使用之影像顯示裝置。 0.01≦E/D≦300    (1)The optical laminate provided by this invention comprises an adhesive sheet, an antistatic layer, and an optical film. The antistatic layer contains conductive particles. The antistatic layer satisfies the following equation (1). In equation (1), D is the product of the particle area ratio P (%) and the total current value Q (nA) of the antistatic layer as evaluated by atomic force microscopy (P×0.01)×Q. E is the product of the particle area ratio P (%) and the total current value (nA) of the antistatic layer as evaluated by atomic force microscopy after undergoing the weathering resistance test (test condition: Z-IN1) specified in German industrial standard DIN75220 (test condition: Z-IN1) (P×0.01)×Q. This optical laminate is suitable for use in image display devices in harsh environments such as automotive applications. 0.01≦E/D≦300    (1)

Description

光學積層體、影像顯示面板及影像顯示裝置Optical laminates, image display panels, and image display devices

本發明涉及光學積層體、影像顯示面板及影像顯示裝置。This invention relates to optical laminates, image display panels, and image display devices.

以液晶顯示裝置及電致發光(EL)顯示裝置(例如有機EL顯示裝置、無機EL顯示裝置)為代表之影像顯示裝置普及。該等影像顯示裝置例如具有液晶單元、EL發光元件等影像顯示單元與包含偏光薄膜及黏著片之光學積層體的積層結構。黏著片主要用於光學積層體所含之薄膜間之接合或影像顯示單元與光學積層體之接合。Image display devices, represented by liquid crystal displays (LCDs) and electroluminescent (EL) displays (such as organic EL displays and inorganic EL displays), are widespread. These image display devices, for example, have image display units such as liquid crystal cells and EL light-emitting elements, and a laminated structure comprising an optical laminate containing a polarizing film and an adhesive sheet. The adhesive sheet is mainly used for bonding between the thin films contained in the optical laminate or for bonding the image display unit to the optical laminate.

在製造影像顯示裝置時或使用影像顯示裝置時有時會產生靜電。在製造時,係在透過黏著片將光學積層體貼合於影像顯示單元時容易產生靜電。在使用時,則係在使用者觸碰到影像顯示裝置時容易產生靜電。影像顯示裝置若因靜電而帶電,便可能發生顯示不良之問題。專利文獻1中揭示了一種光學積層體,其具備偏光薄膜與含導電性聚合物之導電層。 先前技術文獻 專利文獻Static electricity can sometimes be generated during the manufacturing or use of image display devices. During manufacturing, static electricity is easily generated when the optical multilayer is bonded to the image display unit using an adhesive sheet. During use, static electricity is easily generated when the user touches the image display device. If the image display device becomes charged due to static electricity, display problems may occur. Patent 1 discloses an optical multilayer having a polarizing film and a conductive layer containing a conductive polymer. [Prior Art Documents] [Patent Documents]

專利文獻1:日本專利特表2015-509615號公報Patent Document 1: Japanese Patent Publication No. 2015-509615

發明欲解決之課題 根據本發明人等之檢討,專利文獻1之光學積層體會因使用影像顯示裝置之環境不同而尚有進一步改善之餘地。本發明目的在於提供一種光學積層體,其適於應用於在車載等之嚴酷環境下使用之影像顯示裝置。Problem to be Solved by the Invention: Based on the inventors' review, the optical layer of Patent 1 has room for further improvement due to the different environments in which image display devices are used. The purpose of this invention is to provide an optical layer suitable for use in image display devices in harsh environments such as automotive applications.

用以解決課題之手段 本發明人等發現在車載用途等暴露於嚴酷環境下之用途上容易發生顯示不良,基於此而完成了本發明。Means for solving the problem: The inventors discovered that display defects are prone to occur in applications such as vehicle-mounted applications exposed to harsh environments, and based on this, the inventors completed the present invention.

[1]本發明實施形態之光學積層體,具備黏著片、抗靜電層及光學薄膜;並且 前述抗靜電層包含導電性粒子;且 前述抗靜電層滿足以下式(1); 0.01≦E/D≦300    (1) 惟,前述式(1)之D係針對前述抗靜電層利用原子力顯微鏡評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q; 前述式(1)之E係針對歷經德國工業規格DIN75220所規定之耐候性試驗(試驗條件:Z-IN1)之前述抗靜電層利用原子力顯微鏡評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q。 [2]如上述[1]之光學積層體中,前述抗靜電層之厚度亦可為5nm以上且100nm以下。 [3]如上述[1]或[2]之光學積層體中,前述導電性粒子亦可包含奈米碳管。 [4]如上述[3]之光學積層體中,前述奈米碳管之長度亦可為3µm以上且300µm以下,且直徑亦可為10nm以下。 [5]如上述[1]至[4]中任一項之光學積層體中,前述抗靜電層亦可包含黏結劑樹脂。 [6]如上述[1]至[5]中任一項之光學積層體中,前述抗靜電層亦可包含玻璃轉移溫度為0℃以上之黏結劑樹脂。 [7]如上述[5]或[6]之光學積層體中,玻璃轉移溫度為0℃以上之前述黏結劑樹脂在前述抗靜電層所含之全部前述黏結劑樹脂中所佔之比率亦可為50重量%以上。 [8]如上述[1]至[7]中任一項之光學積層體中,前述抗靜電層亦可實質上不含調平劑。 [9]如上述[1]至[8]中任一項之光學積層體中,前述黏著片亦可由含聚合物(A)之黏著劑組成物形成。 [10]如上述[9]之光學積層體中,前述聚合物(A)亦可為(甲基)丙烯酸系聚合物。 [11]如上述[9]或[10]之光學積層體中,前述黏著劑組成物亦可包含具有聚醚結構之前述聚合物(A)作為主成分。 [12]如上述[9]至[11]中任一項之光學積層體中,前述聚合物(A)亦可具有源自以下式(2)所示單體之結構單元; [化學式1] 式(2)之R1為氫原子或甲基,R2為可為直鏈狀或可具有支鏈之烷基,n為1~15之整數。 [13]如上述[9]至[12]中任一項之光學積層體中,前述黏著劑組成物亦可更包含抗靜電劑。 [14]如上述[13]之光學積層體中,前述黏著劑組成物中,相對於前述聚合物(A)100重量份,前述抗靜電劑之摻混量亦可小於30重量份。 [15]如上述[1]至[14]中任一項之光學積層體中,前述抗靜電層所致之全光線透射率之損耗亦可為1.0%以下。 [16]如上述[1]至[15]中任一項之光學積層體中,前述光學薄膜亦可包含偏光薄膜。 [17]如上述[16]之光學積層體中,前述偏光薄膜藉由以下試驗法評估之捲曲直徑亦可為3mm以上; <試驗法> 準備一試驗片,該試驗片係以偏光件之吸收軸為長邊方向,並將前述光學薄膜加工成寬10mm×長50mm之長方形者;接著,將前述試驗片之長邊方向之一端部固定於評估用片材之表面上;接著,將整體以105℃及12小時加熱,使前述試驗片從前述試驗片之長邊方向之另一端部捲曲;求出前述試驗片因捲曲而形成之圓筒部分之直徑作為前述捲曲直徑。 [18]如上述[16]或[17]之光學積層體中,前述偏光薄膜在加熱時之彎曲力矩M的絕對值亦可小於1×109。 [19]如上述[1]至[18]中任一項之光學積層體中,前述導電性粒子亦可包含奈米碳管;且,前述抗靜電層亦可包含玻璃轉移溫度為0℃以上之黏結劑樹脂。 [20]如上述[19]之光學積層體中,前述奈米碳管之長度亦可為3µm以上且300µm以下,且直徑亦可為10nm以下。 [21]本發明實施形態之影像顯示面板,具備如上述[1]至[20]中任一項之光學積層體。 [22]本發明實施形態之影像顯示裝置,具備如上述[21]之影像顯示面板。[1] The optical laminate of the present invention comprises an adhesive sheet, an antistatic layer and an optical thin film; and the aforementioned antistatic layer contains conductive particles; and the aforementioned antistatic layer satisfies the following formula (1); 0.01≦E/D≦300 (1) However, D in the aforementioned formula (1) is the product of the particle area ratio P (%) and the total current value Q (nA) of the aforementioned antistatic layer as evaluated by atomic force microscopy (P×0.01)×Q; E in the aforementioned formula (1) is the product of the particle area ratio P (%) and the total current value Q (nA) of the antistatic layer as evaluated by atomic force microscopy after undergoing the weather resistance test (test condition: Z-IN1) specified by German industrial standard DIN75220. (P×0.01)×Q. [2] In the optical laminate as described in [1] above, the thickness of the aforementioned antistatic layer can also be 5 nm or more and 100 nm or less. [3] In the optical laminate as described in [1] or [2] above, the aforementioned conductive particles can also include carbon nanotubes. [4] In the optical laminate as described in [3] above, the length of the aforementioned carbon nanotubes can also be 3 µm or more and 300 µm or less, and the diameter can also be 10 nm or less. [5] In any of the optical laminates described in [1] to [4] above, the aforementioned antistatic layer may also contain a binder resin. [6] In any of the optical laminates described in [1] to [5] above, the aforementioned antistatic layer may also contain a binder resin with a glass transition temperature of 0°C or higher. [7] In the optical laminates described in [5] or [6] above, the proportion of the aforementioned binder resin with a glass transition temperature of 0°C or higher in all the aforementioned binder resins contained in the aforementioned antistatic layer may also be 50% by weight or more. [8] In any of the optical laminates described in [1] to [7] above, the aforementioned antistatic layer may also substantially not contain a leveling agent. [9] In any of the optical laminates described in [1] to [8] above, the aforementioned adhesive sheet may also be formed from an adhesive composition containing polymer (A). [10] In the optical laminate described in [9] above, the aforementioned polymer (A) may also be a (meth)acrylic polymer. [11] In the optical laminate described in [9] or [10] above, the aforementioned adhesive composition may also contain the aforementioned polymer (A) having a polyether structure as a main component. [12] In the optical laminate described in any of [9] to [11] above, the aforementioned polymer (A) may also have structural units derived from the monomer shown in the following formula (2); [Formula 1] In formula (2), R1 is a hydrogen atom or a methyl group, R2 is an alkyl group that may be linear or branched, and n is an integer from 1 to 15. [13] In any of the optical laminates described in [9] to [12] above, the aforementioned adhesive composition may further include an antistatic agent. [14] In the optical laminate described in [13] above, in the aforementioned adhesive composition, the amount of the aforementioned antistatic agent may be less than 30 parts by weight relative to 100 parts by weight of the aforementioned polymer (A). [15] In any of the optical laminates described in [1] to [14] above, the loss of total light transmittance caused by the aforementioned antistatic layer may be less than 1.0%. [16] In any of the optical laminates described in [1] to [15] above, the aforementioned optical thin film may also include a polarizing thin film. [17] In the optical laminate described in [16] above, the bending diameter of the aforementioned polarizing thin film, as evaluated by the following test method, may also be 3 mm or more; <Test Method> Prepare a test piece, wherein the test piece is made with the absorption axis of the polarizing element as the long side direction, and the aforementioned optical thin film is processed into a rectangle with a width of 10 mm and a length of 50 mm; then, fix one end of the aforementioned test piece in the long side direction to the surface of the evaluation sheet; then, heat the whole body at 105°C for 12 hours, so that the aforementioned test piece is bent from the other end of the aforementioned test piece in the long side direction; determine the diameter of the cylindrical portion formed by the bending of the aforementioned test piece as the aforementioned bending diameter. [18] In the optical laminate as described in [16] or [17] above, the absolute value of the bending moment M of the aforementioned polarizing film when heated may also be less than 1× 10⁹ . [19] In the optical laminate as described in any of [1] to [18] above, the aforementioned conductive particles may also include carbon nanotubes; and the aforementioned antistatic layer may also include a binder resin with a glass transition temperature of 0°C or higher. [20] In the optical laminate as described in [19] above, the length of the aforementioned carbon nanotubes may also be 3µm or more and 300µm or less, and the diameter may also be 10nm or less. [21] The image display panel of the present invention has an optical laminate as described in any of [1] to [20] above. [22] The image display device of the present invention has an image display panel as described above [21].

發明效果 根據本發明可提供一種光學積層體,其適於應用於在車載等嚴酷環境下使用之影像顯示裝置。The invention provides an optical layer suitable for use in image display devices in harsh environments such as automotive applications.

以下,詳細說明本發明。惟,本發明不受以下所示實施形態所限。本發明可在不脫離本發明主旨之範圍內任意變更並實施。The present invention will now be described in detail. However, the present invention is not limited to the embodiments shown below. The present invention may be modified and implemented in any way without departing from the spirit of the present invention.

[關於用語] 本說明書中,當有「重量」之表現時,亦可換成慣用作為表示重量之SI系單位之「質量」來解釋。相反之情況亦同。[Regarding terminology] In this manual, when "weight" is used, it can be replaced with "mass," the SI unit commonly used to express weight. The reverse is also true.

本說明書中,當有「(甲基)丙烯酸」之表現時,意指「丙烯酸及/或甲基丙烯酸」;當有「(甲基)丙烯酸酯」之表現時,意指「丙烯酸酯及/或甲基丙烯酸酯」;當有「(甲基)丙烯醯基」之表現時,意指「丙烯醯基及/或甲基丙烯醯基」;當有「(甲基)丙烯醛」之表現時,意指「丙烯醛及/或甲基丙烯醛」。In this manual, when "(meth)acrylic acid" is mentioned, it means "acrylic acid and/or methacrylic acid"; when "(meth)acrylate" is mentioned, it means "acrylate and/or methacrylate"; when "(meth)acryl" is mentioned, it means "acryl and/or methacryl"; when "(meth)acrylaldehyde" is mentioned, it means "acrylaldehyde and/or methacrolein".

≪≪1.光學積層體≫≫ 於圖1顯示本發明實施形態之光學積層體之一例。圖1之光學積層體10(10A)包含黏著片1、抗靜電層2及光學薄膜3。光學積層體10A具有依序積層有黏著片1、抗靜電層2及光學薄膜3之結構。惟,光學積層體10中之各層之積層順序不受圖1之例限定。光學積層體10可透過黏著片1來與影像顯示面板等之對象物貼合。≪≪1. Optical Multilayer Assembly≫≫ FIG. 1 shows an example of an optical multilayer assembly according to an embodiment of the present invention. The optical multilayer assembly 10 (10A) of FIG. 1 includes an adhesive sheet 1, an antistatic layer 2, and an optical thin film 3. The optical multilayer assembly 10A has a structure in which the adhesive sheet 1, the antistatic layer 2, and the optical thin film 3 are sequentially laminated. However, the lamination order of the layers in the optical multilayer assembly 10 is not limited to the example of FIG. 1. The optical multilayer assembly 10 can be bonded to an object such as an image display panel through the adhesive sheet 1.

圖1之黏著片1係與抗靜電層2相接。惟,亦可於黏著片1與抗靜電層2之間配置有其他薄膜及/或層。又,圖1之黏著片1在積層方向上觀看時係形成於抗靜電層2之一主面整體上。惟,黏著片1在積層方向上觀看時亦可形成於抗靜電層2之一主面的一部分上。本說明書中之「主面」意指在薄膜或層中具有最大面積之面。In Figure 1, the adhesive sheet 1 is attached to the antistatic layer 2. However, other thin films and/or layers may also be disposed between the adhesive sheet 1 and the antistatic layer 2. Furthermore, when viewed in the lamination direction, the adhesive sheet 1 in Figure 1 is formed entirely on one main surface of the antistatic layer 2. However, when viewed in the lamination direction, the adhesive sheet 1 may also be formed on a portion of one main surface of the antistatic layer 2. In this specification, "main surface" refers to the surface with the largest area in the thin film or layer.

圖1之光學薄膜3係與抗靜電層2相接。惟,亦可於光學薄膜3與抗靜電層2之間配置有其他薄膜及/或層。又,圖1之光學薄膜3於積層方向上觀看時係形成於抗靜電層2之另一主面整體上。惟,光學薄膜3在積層方向上觀看時亦可形成於抗靜電層2之另一主面的一部分上。The optical thin film 3 in Figure 1 is in contact with the antistatic layer 2. However, other thin films and/or layers may also be disposed between the optical thin film 3 and the antistatic layer 2. Furthermore, when viewed in the lamination direction, the optical thin film 3 in Figure 1 is formed on the entire other main surface of the antistatic layer 2. However, when viewed in the lamination direction, the optical thin film 3 may also be formed on a portion of the other main surface of the antistatic layer 2.

圖1之抗靜電層2係被黏著片1及光學薄膜3夾持。The antistatic layer 2 in Figure 1 is sandwiched between the adhesive sheet 1 and the optical film 3.

≪1-1.抗靜電層≫ 抗靜電層2包含導電性粒子(導電性填料)。抗靜電層2滿足以下式(1)。惟,式(1)之D係針對抗靜電層2利用原子力顯微鏡評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q。又,式(1)之E係針對歷經德國工業規格DIN75220所規定之耐候性試驗(試驗條件:Z-IN1)之抗靜電層2利用原子力顯微鏡(以下記載為「AFM」)評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q。 0.01≦E/D≦300    (1)≪1-1. Antistatic Layer≫ The antistatic layer 2 contains conductive particles (conductive fillers). The antistatic layer 2 satisfies the following formula (1). However, D in formula (1) is the product of the particle area ratio P (%) and the total current value Q (nA) of the antistatic layer 2 as evaluated by atomic force microscopy (P×0.01)×Q. Also, E in formula (1) is the product of the particle area ratio P (%) and the total current value Q (nA) of the antistatic layer 2 as evaluated by atomic force microscopy (hereinafter referred to as "AFM") after undergoing the weathering test (test condition: Z-IN1) specified in German industrial standard DIN75220. (P×0.01)×Q. 0.01≦E/D≦300    (1)

抗靜電層2可有助於抑制靜電帶電造成之顯示不良。然而,根據本發明人等之研討,關於含導電性粒子之抗靜電層2,因暴露於車載用途等嚴酷環境下,故所含之導電性粒子之狀態可能會大幅變化。雖然考慮到暴露於嚴酷環境下而可設計抗靜電層2,但狀態的變化若變大,在其對應上便有其極限,例如抗靜電層2在暴露於嚴酷環境前及暴露後兩時間點之電特性可能會不足。DIN75220所規定之耐候性試驗(以下記載為「DIN試驗」)係考慮到上述嚴酷環境之耐候性試驗。以抗靜電層2來說,抗靜電層2中之導電性粒子在DIN試驗前後之狀態的變化有獲得限制。The antistatic layer 2 can help suppress display defects caused by static electricity. However, according to the inventors' research, the state of the conductive particles in the antistatic layer 2, which contains conductive particles, may change significantly when exposed to harsh environments such as automotive applications. Although the antistatic layer 2 can be designed to withstand harsh environments, there are limits to its performance if the changes in state are significant. For example, the electrical properties of the antistatic layer 2 may be insufficient at both the time points before and after exposure to harsh environments. The weathering resistance test specified in DIN 75220 (hereinafter referred to as the "DIN test") is a weathering resistance test that takes into account the aforementioned harsh environments. In the case of antistatic layer 2, the changes in the state of conductive particles in antistatic layer 2 before and after the DIN test are limited.

DIN試驗中之試驗條件Z-IN1係對室內(Zone1)進行之試驗,其係指由15天之乾燥氣候循環與其後之10天之濕潤氣候循環構成之循環試驗(Z)。在乾燥氣候循環中,係以以下操作為1個循環並在15天內反覆進行該循環:(1)在溫度80℃及相對濕度20%之氣體環境下照射紫外線8小時;(2)放置於溫度10℃及相對濕度60%之氣體環境下(無照射紫外線)3.5小時;(3)在溫度80℃及相對濕度20%之氣體環境下照射紫外線8小時;及,(4)在溫度10℃及相對濕度60%之氣體環境下放置(無照射紫外線)3.5小時。惟,在從一個循環之(4)至下一個循環之(1)之間,係進行放置至室溫(23℃)1小時之操作。在濕潤氣候循環中,係以以下操作為1個循環並在10天內反覆進行該循環:(1)放置於溫度-10℃之氣體環境下(無照射紫外線)5小時;(2)在溫度80℃及相對濕度50%之氣體環境下照射紫外線12小時;及,(3)在溫度-10℃之氣體環境下放置(無照射紫外線)6小時。惟,在從一個循環之(3)至下一個循環之(1)之間,係進行放置至室溫1小時之操作。所謂室內(Zone1)係與車載零件及材料在車輛內之安裝位置有關之區分,其係指太陽光之照射強度比外裝低但會暴露於高溫中之內裝零件及材料。使用於紫外線照射之金屬鹵素燈之照度設為830W/m2The test condition Z-IN1 in the DIN test is an indoor test (Zone 1), which refers to a cycle test (Z) consisting of a 15-day dry climate cycle followed by a 10-day humid climate cycle. In the dry climate cycle, the following operation constitutes one cycle and is repeated within 15 days: (1) irradiation with ultraviolet light for 8 hours in an atmosphere with a temperature of 80°C and a relative humidity of 20%; (2) placement in an atmosphere with a temperature of 10°C and a relative humidity of 60% (without ultraviolet light) for 3.5 hours; (3) irradiation with ultraviolet light for 8 hours in an atmosphere with a temperature of 80°C and a relative humidity of 20%; and (4) placement in an atmosphere with a temperature of 10°C and a relative humidity of 60% (without ultraviolet light) for 3.5 hours. However, between (4) of one cycle and (1) of the next cycle, the operation of placing at room temperature (23°C) for 1 hour is performed. In the humid climate cycle, the following operations constitute one cycle and are repeated over 10 days: (1) placing in a gas environment at -10°C (without UV radiation) for 5 hours; (2) irradiating with UV radiation in a gas environment at 80°C and 50% relative humidity for 12 hours; and (3) placing in a gas environment at -10°C (without UV radiation) for 6 hours. However, between (3) of one cycle and (1) of the next cycle, the operation of placing at room temperature for 1 hour is performed. The term "interior" (Zone 1) refers to the location of automotive parts and materials within the vehicle, specifically those exposed to higher temperatures but receiving less sunlight than the exterior. The illuminance of metal halogen lamps used for ultraviolet irradiation is set at 830 W/ .

又,根據本發明人等之研討,吾等認為藉由抗靜電層2中之粒子面積率與總電流值之乘積來表示導電性粒子之狀態這點,適於抗靜電層2之帶電抑制能力的表現。為了提高帶電抑制能力,吾等推測以下態樣很適合:藉由導電性粒子彼此適度接觸來確保通過靜電之通路的同時,從更巨觀之看法來看抗靜電層2時,導電性粒子所形成之通路會以良好分散性擴及層內。粒子面積率及總電流值各自可能有反映出抗靜電層2中之導電性粒子之分散程度及抗靜電層2中所含之導電性粒子彼此相接之程度。Furthermore, based on our research, we believe that representing the state of conductive particles by the product of the particle area ratio and the total current value in the antistatic layer 2 is suitable for demonstrating the charge suppression capability of the antistatic layer 2. To improve charge suppression capability, we hypothesize that the following configuration is suitable: while ensuring the electrostatic pathway is maintained through appropriate contact between conductive particles, from a broader perspective, the pathways formed by the conductive particles in the antistatic layer 2 will spread throughout the layer with good dispersion. The particle area ratio and the total current value may each reflect the degree of dispersion of the conductive particles in the antistatic layer 2 and the degree of contact between the conductive particles contained in the antistatic layer 2.

粒子面積率及總電流值皆為藉由AFM評估之抗靜電層2之特性。利用AFM進行之評估可藉由以下程序及測定條件來實施。 [測定試樣之準備] 首先,將評估對象之抗靜電層2裁切成可包含屬測定區域之邊長20µm之正方形區域的尺寸後,固定於具有適度大小之AFM圓盤之表面,做成測定試樣。AFM圓盤宜選擇抗靜電層2之固定面業經金塗覆者。此外,只要在固定於AFM圓盤之狀態下露出有抗靜電層2之上述測定區域,則於要裁切之抗靜電層2及已固定之抗靜電層2上亦可接合有其他層或片材。固定於AFM圓盤可利用導電性膠帶、例如黏著劑中含碳粒子之黏著膠帶。該黏著膠帶之一例為日新EM公司製之商品名「導電性碳雙面膠帶」。由抑制膠帶本身帶電、來防止該帶電對測定造成之影響之觀點來看,係推薦使用導電性膠帶。抗靜電層2例如係透過具有雙面黏著性之導電性膠帶74貼附於AFM圓盤72來固定(參照圖2A、圖2B及圖2C)。圖2A為示意顯示固定有抗靜電層2之測定試樣71之一例的俯視圖。圖2B為顯示圖2A之測定試樣71之剖面2B-2B的剖面圖。圖2C為顯示圖2A之測定試樣71之剖面2C-2C的剖面圖。圖2A~圖2C所示例中,3個抗靜電層2(73A、73B、73C)係固定於AFM圓盤72上。可如所述固定複數個抗靜電層2,而此時,亦可將至少1個抗靜電層2作為參考來使用。參考可利用於例如確認測定數據之重現性。接著,為了確保已固定之抗靜電層2與AFM圓盤72之間的電性導通,係塗佈金屬糊膏75、例如銀(Ag)糊膏。金屬糊膏75之塗佈可確保AFM圓盤72與評估對象之抗靜電層2之間的電性導通,並且係以不阻礙AFM對抗靜電層2之測定區域之測定之方式來實施。圖2A~圖2C之例中,金屬糊膏75係以下述方式塗佈:分別覆蓋抗靜電層73A、73B、73C中之長邊方向兩端部並與AFM圓盤72相接,且使各抗靜電層73A、73B、73C中之測定區域露出。 [測定及測定條件] 將上述備妥之測定試樣安裝於AFM測定裝置、例如考慮到在高真空下之電性測量之Hitachi High-Tech Co.製AFM5300E。接著,將測定試樣放置之氣體環境設為壓力小於10-4Pa之高真空,待高真空狀態穩定後,在以下測定條件下對測定區域實施AFM測定。惟,AFM測定係在懸臂之前端與測定試樣之間施加了電位差之狀態下實施,並藉由在懸臂流通之電流值將測定區域進行2維分布。2維分布影像中之單元像素之尺寸設為78nm見方。若利用施加電位差之AFM測定,可判別測定區域中電流容易流通之部分與不易流通之部分。吾等認為在抗靜電層2中,電流主要係在導電性粒子存在之部分中流通。可對構成2維分布影像之各像素設定電流之閾值,將分布影像2值化成流通閾值以上之電流的第1像素與只流通小於閾值之電流的第2像素,求出所有第1像素在測定區域之面積(400µm2)中所佔之合計面積之比率,將其鑑定成粒子面積率P(單位:%)。又,可將在2維分布影像中之各像素之電流值的總和鑑定為總電流值Q(單位:nA)。惟,關於測定到負電流值之像素,因會被認為是測定雜訊,故不於總和中加上在該像素之電流值。AFM測定中之上述數據之處理亦可使用附屬於AFM測定裝置之數據解析軟體。 (測定條件) 測定模式・・・・AFM模式 懸臂・・・電性測量對應品(例如,使用背面及前端經銠塗佈之Hitachi High-Tech製SI-DF40-R) 測定區域・・・・20µm×20µm之正方形 測定溫度・・・・室溫(25±5℃) 施加電位差・・・・0.3V IV Amp・・・・Nano Amp 電流閾值・・・・0.1nA 2維分布影像中之像素數(測定區域中之測定點數量)・・・256×256點(合計65536點)The particle area ratio and total current value are characteristics of the antistatic layer 2 evaluated by AFM. The evaluation using AFM can be performed using the following procedures and test conditions. [Preparation of Test Specimen] First, the antistatic layer 2 of the evaluation object is cut into a square area with a side length of 20µm that can contain the test area, and then fixed to the surface of an AFM disk of appropriate size to make a test specimen. The AFM disk should preferably be selected with the fixing surface of the antistatic layer 2 already gold-coated. In addition, as long as the above-mentioned test area with the antistatic layer 2 is exposed when fixed to the AFM disk, other layers or sheets can also be bonded to the cut antistatic layer 2 and the fixed antistatic layer 2. The AFM disc can be fixed using conductive tape, such as adhesive tape containing carbon particles in the adhesive. One example of such adhesive tape is "Conductive Carbon Double-Sided Tape" manufactured by Nisshin EM Co., Ltd. From the perspective of suppressing the tape's own charge and preventing its influence on the measurement, the use of conductive tape is recommended. The antistatic layer 2 is fixed to the AFM disc 72, for example, by attaching it to the disc using a conductive tape 74 with double-sided adhesive properties (see Figures 2A, 2B, and 2C). Figure 2A is a top view schematically showing an example of a test sample 71 with the antistatic layer 2 fixed thereon. Figure 2B is a cross-sectional view showing section 2B-2B of the test sample 71 in Figure 2A. Figure 2C is a cross-sectional view of the test sample 71 shown in Figure 2A, section 2C-2C. In the examples shown in Figures 2A-2C, three antistatic layers 2 (73A, 73B, 73C) are fixed to the AFM disk 72. Multiple antistatic layers 2 can be fixed as described, and at least one antistatic layer 2 can also be used as a reference. The reference can be used, for example, to confirm the reproducibility of the test data. Next, to ensure electrical conductivity between the fixed antistatic layers 2 and the AFM disk 72, a metal paste 75, such as silver (Ag) paste, is applied. The application of the metal paste 75 ensures electrical conductivity between the AFM disk 72 and the antistatic layer 2 of the evaluation object, and is carried out in a manner that does not obstruct the AFM's measurement of the measurement area of the antistatic layer 2. In the examples of Figures 2A-2C, the metal paste 75 is applied in the following manner: covering both ends of the long side of the antistatic layers 73A, 73B, and 73C respectively and connecting them to the AFM disk 72, while exposing the measurement areas in each of the antistatic layers 73A, 73B, and 73C. [Measurement and Measurement Conditions] The prepared test sample was installed in an AFM measurement apparatus, such as the Hitachi High-Tech Co. AFM5300E, which is designed for electrical measurements under high vacuum. Next, the gas environment in which the test sample was placed was set to a high vacuum with a pressure less than 10⁻⁴ Pa. After the high vacuum stabilized, AFM measurement was performed on the measurement area under the following measurement conditions. However, the AFM measurement was performed with a potential difference applied between the front end of the cantilever and the test sample, and the measurement area was distributed in two dimensions by the current flowing through the cantilever. The pixel size in the two-dimensional distribution image was set to 78 nm square. By using AFM measurement with an applied potential difference, the parts of the measurement area where current flows easily and those that do not can be identified. We believe that in the antistatic layer 2, the current mainly flows in the areas where conductive particles are present. A current threshold can be set for each pixel constituting the 2D distribution image. The distribution image is then binarized into a first pixel with current flowing above the threshold and a second pixel with current flowing only below the threshold. The ratio of the total area occupied by all first pixels in the measurement area ( 400µm² ) is calculated and identified as the particle area ratio P (unit: %). Furthermore, the sum of the current values of all pixels in the 2D distribution image can be identified as the total current value Q (unit: nA). However, pixels with measured negative current values are considered measurement noise and therefore their current values are not added to the sum. The data processing for the AFM measurement can also be performed using the data analysis software included with the AFM measurement device. (Measurement Conditions) Measurement Mode: AFM Mode Cantilever: Electrical Measurement Applicant (e.g., Hitachi High-Tech SI-DF40-R with rhodium coating on the back and front) Measurement Area: 20µm × 20µm square Measurement Temperature: Room temperature (25±5℃) Applied Potential Difference: 0.3V IV Amp: Nano Amp Current Threshold: 0.1nA Number of Pixels in the 2D Distribution Image (Number of Measurement Points in the Measurement Area): 256 × 256 points (Total 65536 points)

式(1)之E/D亦可為275以下、250以下、225以下、200以下、180以下、160以下、150以下、130以下、110以下、100以下、90以下、85以下、80以下、75以下、70以下、65以下、60以下、55以下、50以下、45以下、40以下、35以下、30以下、25以下、20以下、18以下、16以下、15以下、14以下、13以下、12以下、11以下、10以下、9以下、8以下、7以下、6以下、5以下,更可為4.5以下。E/D的下限亦可為0.05以上、0.1以上、0.5以上、1以上、大於1、1.1以上、1.2以上、1.3以上、1.4以上、1.5以上、1.6以上、1.7以上、1.8以上、1.9以上,更可為2以上。The E/D in formula (1) can also be less than 275, less than 250, less than 225, less than 200, less than 180, less than 160, less than 150, less than 130, less than 110, less than 100, less than 90, less than 85, less than 80, less than 75, less than 70, less than 65, less than 60, less than 55, less than 50, less than 45, less than 40, less than 35, less than 30, less than 25, less than 20, less than 18, less than 16, less than 15, less than 14, less than 13, less than 12, less than 11, less than 10, less than 9, less than 8, less than 7, less than 6, less than 5, and even less than 4.5. The lower limit of E/D can also be above 0.05, above 0.1, above 0.5, above 1, above 1, above 1.1, above 1.2, above 1.3, above 1.4, above 1.5, above 1.6, above 1.7, above 1.8, above 1.9, or even above 2.

式(1)之E/D可能會依抗靜電層2之組成及形成方法而改變。組成之例為導電性粒子之種類及含有率、以及導電性粒子以外所含之材料之種類、含有率及特性。導電性粒子以外所含之材料之例為黏結劑樹脂及調平劑。形成方法之例為用以形成抗靜電層2之塗敷液之組成及形成條件。塗敷液之組成之例為溶劑之種類。形成條件之例為塗敷液之乾燥溫度。The E/D ratio in equation (1) may vary depending on the composition and formation method of the antistatic layer 2. Examples of composition include the type and content of conductive particles, and the type, content, and characteristics of materials other than conductive particles. Examples of materials other than conductive particles include binder resin and leveling agent. Examples of formation methods include the composition and formation conditions of the coating liquid used to form the antistatic layer 2. Examples of the composition of the coating liquid include the type of solvent. Examples of formation conditions include the drying temperature of the coating liquid.

抗靜電層2之D(抗靜電層2在歷經DIN試驗前之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q),例如為1.0×103nA以上,亦可為1.5×103nA以上、2.0×103nA以上、2.5×103nA以上、3.0×103nA以上、3.5×103nA以上、4.0×103nA以上、4.5×103nA以上、5.0×103nA以上、5.5×103nA以上、6.0×103nA以上、6.5×103nA以上、7.0×103nA以上、7.5×103nA以上、8.0×103nA以上、8.5×103nA以上、9.0×103nA以上、9.5×103nA以上、1.0×104nA以上、1.1×104nA以上、1.2×104nA以上、1.3×104nA以上、1.4×104nA以上、1.5×104nA以上、1.6×104nA以上、1.7×104nA以上、1.8×104nA以上、1.9×104nA以上,更可為2.0×104nA以上。D的上限例如為1.0×105nA以下,亦可為9.0×104nA以下、8.0×104nA以下、7.0×104nA以下、6.0×104nA以下、5.0×104nA以下、4.0×104nA以下、3.0×104nA以下,更可為2.5×104nA以下。The D of antistatic layer 2 (the product of the particle area ratio P (%) of antistatic layer 2 before undergoing the DIN test and the total current value Q (nA) (P×0.01)×Q) can be, for example, 1.0× 10³ nA or higher, or 1.5× 10³ nA or higher, 2.0× 10³ nA or higher, 2.5× 10³ nA or higher, 3.0× 10³ nA or higher, 3.5× 10³ nA or higher, 4.0× 10³ nA or higher, 4.5× 10³ nA or higher, 5.0× 10³ nA or higher, 5.5× 10³ nA or higher, 6.0× 10³ nA or higher, 6.5× 10³ nA or higher, 7.0×10³ nA or higher, 7.5× 10³ nA or higher, 8.0× 10³ nA or higher, etc. 3 nA or higher, 8.5×10 3 nA or higher, 9.0×10 3 nA or higher, 9.5×10 3 nA or higher, 1.0×10 4 nA or higher, 1.1×10 4 nA or higher, 1.2×10 4 nA or higher, 1.3×10 4 nA or higher, 1.4×10 4 nA or higher, 1.5×10 4 nA or higher, 1.6×10 4 nA or higher, 1.7×10 4 nA or higher, 1.8×10 4 nA or higher, 1.9×10 4 nA or higher, and even 2.0×10 4 nA or higher. The upper limit of D can be, for example, below 1.0 × 10⁵ nA, or below 9.0 × 10⁴ nA, below 8.0 × 10⁴ nA, below 7.0 × 10⁴ nA, below 6.0 × 10⁴ nA, below 5.0 × 10⁴ nA, below 4.0 × 10⁴ nA, below 3.0 × 10⁴ nA, or even below 2.5 × 10⁴ nA.

抗靜電層2之E(抗靜電層2在歷經DIN試驗後之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q)例如為1.0×103nA以上,亦可為5.0×103nA以上、7.0×103nA以上、9.0×103nA以上、1.0×104nA以上、2.0×104nA以上、3.0×104nA以上、4.0×104nA以上、5.0×104nA以上、5.5×104nA以上、6.0×104nA以上、6.5×104nA以上、7.0×104nA以上、7.5×104nA以上,更可為8.0×104nA以上。E的上限例如為5.0×105nA以下,亦可為4.0×105nA以下、3.0×105nA以下、2.0×105nA以下、1.0×105nA以下,更可為9.0×104nA以下。The E value of the antistatic layer 2 (the product of the particle area ratio P (%) of the antistatic layer 2 after undergoing the DIN test and the total current value Q (nA) (P×0.01)×Q) can be, for example, 1.0× 10³ nA or higher, or 5.0× 10³ nA or higher, 7.0× 10³ nA or higher, 9.0× 10³ nA or higher, 1.0× 10⁴ nA or higher, 2.0× 10⁴ nA or higher, 3.0× 10⁴ nA or higher, 4.0× 10⁴ nA or higher, 5.0× 10⁴ nA or higher, 5.5×10⁴ nA or higher, 6.0× 10⁴ nA or higher, 6.5× 10⁴ nA or higher, 7.0× 10⁴ nA or higher, 7.5× 10⁴ nA or higher, 7.5×10⁴ nA or higher . The upper limit of E is, for example, 5.0 × 10⁵ nA or less, or 4.0 × 10⁵ nA or less, 3.0 × 10⁵ nA or less, 2.0 × 10⁵ nA or less, 1.0 × 10⁵ nA or less, or even 9.0 × 10⁴ nA or less.

抗靜電層2可為粒子面積率與總電流值之乘積在DIN試驗中維持或增加之層。換言之,E與D之間可成立藉由式:E≧D表示之關係,亦可成立藉由式:E>D表示之關係。The antistatic layer 2 can be a layer in which the product of particle area fraction and total current value is maintained or increased in the DIN test. In other words, the relationship between E and D can be expressed by the formula: E≧D, or by the formula: E>D.

抗靜電層2包含導電性粒子。導電性粒子亦可為碳粒子。碳粒子之例為乙炔黑及科琴黑等碳黑、天然石墨、人造石墨及碳奈米管(CNT)。根據本案發明人等之研討,以抗靜電層2中所含之導電性粒子來說,宜為碳粒子,尤宜為CNT。換言之,抗靜電層2可包含有碳粒子,亦可包含有CNT。吾等認為碳粒子、尤其是CNT理想之理由係因相較於導電性聚合物或導電性聚合物與摻雜劑之複合物等,不易在上述嚴酷環境下發生劣化,典型上係不易因氧化而發生劣化。抗靜電層2中所含之導電材料若劣化,抗靜電層2之抗靜電能力一般來說便會降低。又,關於碳粒子中CNT又特別理想這點,可能係因CNT之高度之形狀各向異性可有助於抑制在高溫及高濕下之過度凝集或定向。抗靜電層2亦可包含有2種以上導電性粒子。又,抗靜電層2亦可包含有導電性粒子(例如CNT)與其他導電材料(例如導電性聚合物)。其他導電材料之例為導電性聚合物、導電性聚合物與摻雜物之複合物、離子性界面活性劑及離子性化合物。The antistatic layer 2 contains conductive particles. These conductive particles can also be carbon particles. Examples of carbon particles include carbon blacks such as acetylene black and Ketjen black, natural graphite, artificial graphite, and carbon nanotubes (CNTs). Based on the inventors' research, carbon particles, especially CNTs, are preferable as conductive particles in the antistatic layer 2. In other words, the antistatic layer 2 can contain either carbon particles or CNTs. We believe carbon particles, especially CNTs, are ideal because they are less prone to degradation under the aforementioned harsh environments compared to conductive polymers or composites of conductive polymers and dopants; typically, they are less prone to degradation due to oxidation. If the conductive material contained in the antistatic layer 2 deteriorates, the antistatic capability of the antistatic layer 2 will generally decrease. Furthermore, the fact that CNTs are particularly desirable among carbon particles may be because the high degree of anisotropy in the shape of CNTs helps to suppress excessive aggregation or orientation under high temperature and humidity. The antistatic layer 2 may also contain two or more types of conductive particles. Additionally, the antistatic layer 2 may also contain conductive particles (e.g., CNTs) and other conductive materials (e.g., conductive polymers). Examples of other conductive materials include conductive polymers, complexes of conductive polymers and dopants, ionic surfactants, and ionic compounds.

CNT之種類無限定,可使用藉由電弧放電法、雷射蒸發法、化學氣相沉積法(CVD)等各種方法製出之CNT。CNT可為單層CNT、二層CNT及多層CNT中之任一者,亦可為該等中之2種以上的混合物。由導電性優異之觀點來看,尤宜為單層CNT。There are no limitations on the type of CNTs. CNTs can be manufactured using various methods such as arc discharge, laser evaporation, and chemical vapor deposition (CVD). CNTs can be any of the following: monolayer CNTs, binary CNTs, and multilayer CNTs, or a mixture of two or more of these. From the viewpoint of excellent conductivity, monolayer CNTs are particularly suitable.

CNT之長度例如為1~2000µm,亦可為1~1000µm,更可為1~500µm。CNT之直徑(外徑)例如為0.1~50nm,亦可為0.2~40nm、0.25~30nm、0.3~20nm、0.4~15nm,更可為0.5~10nm。由抗靜電層2中之分散性之觀點來看,CNT之長度可為300µm以下,亦可為小於300µm、275µm以下、250µm以下、225µm以下、200µm以下、175µm以下、150µm以下、125µm以下、100µm以下、90µm以下、80µm以下、70µm以下、60µm以下、50µm以下、40µm以下、30µm以下、25µm以下、20µm以下、15µm以下、10µm以下,更可為5µm以下。又,由抗靜電層2中之分散性之觀點來看,CNT之長度為3µm以上且300µm以下,直徑亦可為10nm以下。CNT之長度可藉由使用AFM或掃描型電子顯微鏡(SEM)之觀察來評估。CNT之直徑可依循ISO/TS10868:2017之規定來鑑定。The length of CNTs can be, for example, 1~2000µm, or 1~1000µm, or even 1~500µm. The diameter (outer diameter) of CNTs can be, for example, 0.1~50nm, or even 0.2~40nm, 0.25~30nm, 0.3~20nm, 0.4~15nm, or even 0.5~10nm. From the perspective of dispersion in the antistatic layer 2, the length of CNTs can be less than 300µm, or less than 300µm, 275µm, 250µm, 225µm, 200µm, 175µm, 150µm, 125µm, 100µm, 90µm, 80µm, 70µm, 60µm, 50µm, 40µm, 30µm, 25µm, 20µm, 15µm, 10µm, and even less than 5µm. Furthermore, from the perspective of dispersion in the antistatic layer 2, the length of CNTs can be more than 3µm and less than 300µm, and the diameter can be less than 10nm. The length of CNTs can be assessed by observation using AFM or scanning electron microscopy (SEM). The diameter of CNTs can be determined according to the specifications of ISO/TS10868:2017.

抗靜電層2中之CNT之含量例如為0.01~50.0mg/m2,亦可為0.1~10.0mg/m2。抗靜電層2中所含之全部固體成分中,CNT所佔之比率例如為0.01~90重量%,亦可為0.01~50重量%、0.01~30重量%、0.05~25重量%、0.1~20重量%、0.15~15重量%、0.2~10重量%、0.25~7.5重量%、0.5~5重量%,更可為0.75~3重量%。由抑制以光學積層體10來說之全光線透射率之損耗之觀點來看,上述比率愈小愈佳。The CNT content in the antistatic layer 2 is, for example, 0.01~50.0 mg/ , or 0.1~10.0 mg/ . The percentage of CNTs in the total solid content of the antistatic layer 2 is, for example, 0.01~90% by weight, or 0.01~50% by weight, 0.01~30% by weight, 0.05~25% by weight, 0.1~20% by weight, 0.15~15% by weight, 0.2~10% by weight, 0.25~7.5% by weight, 0.5~5% by weight, or even 0.75~3% by weight. From the perspective of suppressing the loss of total light transmittance in the optical laminate 10, the smaller the above percentage, the better.

抗靜電層2可包含1種或2種以上導電性粒子。The antistatic layer 2 may contain one or more types of conductive particles.

抗靜電層2亦可包含有導電性粒子以外之其他材料。其他材料之例為黏結劑樹脂。換言之,抗靜電層2亦可包含有黏結劑樹脂。含有黏結劑樹脂這點可有助於提升抗靜電層2之被膜形成性或提升抗靜電層2對光學薄膜3之密著性及接著性(投錨力)。The antistatic layer 2 may also contain materials other than conductive particles. Examples of other materials include binder resins. In other words, the antistatic layer 2 may also contain binder resins. The presence of binder resins can help improve the film-forming properties of the antistatic layer 2 or improve the adhesion and bonding (anchoring force) of the antistatic layer 2 to the optical thin film 3.

黏結劑樹脂之例為:含㗁唑啉基聚合物、聚胺甲酸酯系樹脂、聚酯系樹脂、丙烯酸系樹脂、聚醚系樹脂、纖維素系樹脂、聚乙烯醇系樹脂、環氧樹脂、聚乙烯基吡咯啶酮、聚苯乙烯系樹脂、聚乙二醇及新戊四醇。黏結劑樹脂宜為含㗁唑啉基聚合物、聚胺甲酸酯系樹脂、聚酯系樹脂、丙烯酸系樹脂,尤宜為聚胺甲酸酯系樹脂及/或丙烯酸系樹脂。抗靜電層2可包含有1種或2種以上黏結劑樹脂,亦可僅包含有1種。2種以上黏結劑樹脂之組合亦可為聚胺甲酸酯系樹脂與丙烯酸系樹脂之組合。抗靜電層2中之黏結劑之含有率例如為1~99.99重量%,亦可為50~99.99重量%、60~99.99重量%、70~99.99重量%、80~99.99重量%,更可為90~99.99重量%。Examples of adhesive resins include: acezoline-containing polymers, polyurethane resins, polyester resins, acrylic resins, polyether resins, cellulose resins, polyvinyl alcohol resins, epoxy resins, polyvinylpyrrolidone, polystyrene resins, polyethylene glycol, and neopentyl tertrol. The adhesive resin is preferably an acezoline-containing polymer, polyurethane resin, polyester resin, or acrylic resin, and particularly preferably a polyurethane resin and/or an acrylic resin. The antistatic layer 2 may contain one or more adhesive resins, or may contain only one. The combination of two or more adhesive resins can also be a combination of polyurethane resin and acrylic resin. The content of the adhesive in the antistatic layer 2 is, for example, 1~99.99% by weight, or 50~99.99% by weight, 60~99.99% by weight, 70~99.99% by weight, 80~99.99% by weight, or even 90~99.99% by weight.

黏結劑樹脂之玻璃轉移溫度(Tg)可為0℃以上,亦可為20℃以上、30℃以上、40℃以上、50℃以上、55℃以上,更可為60℃以上。Tg的上限例如為100℃以下。換言之,抗靜電層2亦可包含有Tg為0℃以上之黏結劑樹脂。根據本發明人等之檢討,使用黏結劑樹脂時,黏結劑樹脂之Tg在上述範圍內可有助於抑制抗靜電層2中之導電性粒子在DIN試驗前後之狀態的變化。吾等推測黏結劑樹脂之Tg愈高,愈能抑制抗靜電層2中所含之導電性粒子因熱而移動及其造成之過度凝集或定向。本說明書中之聚合物之Tg只要未特別說明,便意指根據單體成分之組成從Fox式求得之Tg。本說明書中之樹脂(包含黏結劑樹脂)的Tg只要未特別說明,意指藉由示差掃描熱量測定(DSC)求得之Tg。DSC之測定條件如下述。 ・環境氣體:氮(50mL/分鐘) ・測定溫度範圍:0℃→100℃ ・升溫速度:10℃/分鐘 ・試料量:約3mg(試料容器可使用例如鋁製Tzero盤)The glass transition temperature (Tg) of the binder resin can be above 0°C, or above 20°C, 30°C, 40°C, 50°C, or 55°C, and even above 60°C. The upper limit of Tg is, for example, below 100°C. In other words, the antistatic layer 2 can also contain a binder resin with a Tg of 0°C or higher. According to the inventors' review, when using a binder resin, a Tg within the above-mentioned range can help suppress the change in the state of conductive particles in the antistatic layer 2 before and after the DIN test. We hypothesize that the higher the Tg of the binder resin, the better it can suppress the movement of conductive particles contained in the antistatic layer 2 due to heat and the resulting excessive aggregation or orientation. Unless otherwise specified, the Tg values for polymers in this manual refer to the Tg obtained from the Fox formula based on the composition of the monomer components. Unless otherwise specified, the Tg values for resins (including binder resins) in this manual refer to the Tg obtained by differential scanning calorimetry (DSC). The DSC measurement conditions are as follows: • Ambient gas: Nitrogen (50 mL/min) • Measurement temperature range: 0℃→100℃ • Heating rate: 10℃/min • Sample volume: Approximately 3 mg (a sample container such as an aluminum Tzero plate can be used).

抗靜電層2包含Tg為0℃以上之黏結劑樹脂時,所含之全部黏結劑樹脂中,Tg為0℃以上之黏結劑樹脂所佔之比率可為50重量%以上,亦可為55重量%以上、60重量%以上、65重量%以上、70重量%以上、75重量%以上、80重量%以上、85重量%以上、90重量%以上、91重量%以上、92重量%以上、93重量%以上,更可為94重量%以上。該比率的上限例如為100重量%以下,亦可為99重量%以下、98重量%以下、97重量%以下、96重量%以下,更可為95重量%以下。When the antistatic layer 2 contains an adhesive resin with a Tg of 0°C or higher, the percentage of the adhesive resin with a Tg of 0°C or higher in the total adhesive resin content can be 50% by weight or higher, or 55% by weight or higher, 60% by weight or higher, 65% by weight or higher, 70% by weight or higher, 75% by weight or higher, 80% by weight or higher, 85% by weight or higher, 90% by weight or higher, 91% by weight or higher, 92% by weight or higher, 93% by weight or higher, and even 94% by weight or higher. The upper limit of this percentage is, for example, 100% by weight or lower, or 99% by weight or lower, 98% by weight or lower, 97% by weight or lower, 96% by weight or lower, and even 95% by weight or lower.

抗靜電層2特別在包含2種以上黏結劑樹脂時,亦可包含有Tg低於0℃之黏結劑樹脂。例如,抗靜電層2亦可包含有Tg為0℃以上之黏結劑樹脂與Tg低於0℃之黏結劑樹脂。具有低於0℃之Tg的黏結劑樹脂之Tg的下限例如為-50℃以上,亦可為-45℃以上,更可為-40℃以上。具有低於0℃之Tg的黏結劑樹脂依抗靜電層2之組成,有有助於提升其成膜性或抗靜電層2成膜時提升CNT之分散性之情形。抗靜電層2包含Tg為0℃以上之黏結劑樹脂與低於0℃之黏結劑樹脂時,所含之全部黏結劑樹脂中,低於0℃之黏結劑樹脂所佔之比率可為50重量%以下,亦可為45重量%以下、40重量%以下、35重量%以下、30重量%以下、25重量%以下、20重量%以下、15重量%以下、10重量%以下、8重量%以下、6重量%以下,更可為5重量%以下。該比率的下限例如為1重量%以上,亦可為2重量%以上、3重量%以上、4重量%以上,更可為5重量%以上。The antistatic layer 2, especially when containing two or more binder resins, may also contain binder resins with a Tg below 0°C. For example, the antistatic layer 2 may also contain binder resins with a Tg above 0°C and binder resins with a Tg below 0°C. The lower limit of the Tg of the binder resin with a Tg below 0°C is, for example, above -50°C, above -45°C, or even above -40°C. Depending on the composition of the antistatic layer 2, the binder resin with a Tg below 0°C may help improve its film-forming properties or improve the dispersibility of CNTs during the film formation of the antistatic layer 2. When the antistatic layer 2 comprises adhesive resins with a Tg of 0°C or higher and adhesive resins with a Tg of 0°C or lower, the proportion of the adhesive resins with a Tg of 0°C or lower in the total amount of adhesive resins may be 50% by weight or less, or 45% by weight or less, 40% by weight or less, 35% by weight or less, 30% by weight or less, 25% by weight or less, 20% by weight or less, 15% by weight or less, 10% by weight or less, 8% by weight or less, 6% by weight or less, or even 5% by weight or less. The lower limit of this proportion may be, for example, 1% by weight or more, or 2% by weight or more, 3% by weight or more, 4% by weight or more, or even 5% by weight or more.

抗靜電層2可包含調平劑。惟,抗靜電層2中之調平劑之含有率宜小。根據本發明人等之檢討,不於用以形成抗靜電層2之塗敷液中添加調平劑這點可有助於抑制抗靜電層2中之導電性粒子在DIN試驗前後之狀態的變化。調平劑可能會促進抗靜電層2中所含之導電性粒子因熱而移動。調平劑之含有率亦可小於5重量%、4重量%以下、3重量%、2重量%以下、1重量%以下、0.5重量%以下,更可為0.1重量%以下。抗靜電層2亦可實質上不含調平劑。本說明書中,實質上不含意指含有率小於0.01重量%。The antistatic layer 2 may contain a leveling agent. However, the content of the leveling agent in the antistatic layer 2 should be low. According to the inventors' review, not adding a leveling agent to the coating solution used to form the antistatic layer 2 helps to suppress changes in the state of conductive particles in the antistatic layer 2 before and after the DIN test. The leveling agent may promote the movement of conductive particles contained in the antistatic layer 2 due to heat. The content of the leveling agent can also be less than 5% by weight, less than 4% by weight, less than 3% by weight, less than 2% by weight, less than 1% by weight, less than 0.5% by weight, and even less than 0.1% by weight. The antistatic layer 2 may also be substantially free of leveling agent. In this specification, "substantially free" means a content of less than 0.01% by weight.

抗靜電層2中所含之導電性粒子可能會對光學積層體10之光線透射率造成影響。根據本發明人等之研討,導電性粒子之含量相同時,導電性粒子之分散程度愈低,光學積層體10之光線透射率便有愈降低之傾向。由此觀點來看,光學積層體10因抗靜電層2所致之全光線透射率之損耗亦可為1.0%以下。全光線透射率之損耗亦可為0.90%以下、0.80%以下、0.70%以下、0.60%以下、0.50%以下、0.45%以下、0.40%以下、0.35%以下、0.30%以下、0.25%以下、0.20%以下、0.15%以下、0.12%以下,更可為0.10%以下。全光線透射率之損耗越低越好。全光線透射率之損耗可測定評估對象之光學積層體10之全光線透射率T2與除了不含抗靜電層2外其餘具有相同構成之光學積層體之全光線透射率T1,來鑑定兩者之差值(T1-T2)。本說明書中,全光線透射率意指波長380~700nm之範圍之光的透射率。全光線透射率可依循日本產業規格(以下記載為JIS)K7361-1:1997之規定來測定。惟,全光線透射率之測定係使用D65光源。又,測定時之光係使其從光學薄膜3側入射。The conductive particles contained in the antistatic layer 2 may affect the light transmittance of the optical laminate 10. According to the inventors' research, when the content of conductive particles is the same, the lower the dispersion of the conductive particles, the more likely the light transmittance of the optical laminate 10 will decrease. From this point of view, the loss of total light transmittance of the optical laminate 10 due to the antistatic layer 2 can also be less than 1.0%. The loss of total optical transmittance can be below 0.90%, 0.80%, 0.70%, 0.60%, 0.50%, 0.45%, 0.40%, 0.35%, 0.30%, 0.25%, 0.20%, 0.15%, or 0.12%, and can even be below 0.10%. Lower total optical transmittance loss is better. The loss of total optical transmittance can be determined by measuring the total optical transmittance T2 of the optical laminate 10 being evaluated and the total optical transmittance T1 of an optical laminate with the same composition except for the absence of the antistatic layer 2, and then identifying the difference between the two (T1-T2). In this manual, total optical transmittance refers to the transmittance of light in the wavelength range of 380~700nm. Total optical transmittance can be measured according to the Japanese Industrial Standard (hereinafter referred to as JIS) K7361-1:1997. However, the total optical transmittance is measured using a D65 light source. Furthermore, the light used for measurement is incident from three sides of the optical thin film.

抗靜電層2之厚度例如為5~1500nm,亦可為1400nm以下、1300nm以下、1200nm以下、1100nm以下、1000nm以下、900nm以下、800nm以下、700nm以下、600nm以下、500nm以下、400nm以下、300nm以下、200nm以下、180nm以下、150nm以下、120nm以下、100nm以下、90nm以下、80nm以下、70nm以下、60nm以下、55nm以下、50nm以下、45nm以下、40nm以下,更可為35nm以下。厚度亦可為10nm以上、20nm以上、大於20nm、25nm以上,更可為30nm以上。此外,根據本發明人等之研討,關於組成及形成方法相同之抗靜電層2,有展現其厚度愈小,上述全光線透射率之損耗便愈小之傾向。The thickness of the antistatic layer 2 can be, for example, 5~1500nm, or below 1400nm, 1300nm, 1200nm, 1100nm, 1000nm, 900nm, 800nm, 700nm, 600nm, 500nm, 400nm, 300nm, 200nm, 180nm, 150nm, 120nm, 100nm, 90nm, 80nm, 70nm, 60nm, 55nm, 50nm, 45nm, 40nm, or even below 35nm. The thickness can also be above 10nm, above 20nm, greater than 20nm, above 25nm, or even above 30nm. Furthermore, according to the inventors' research, for antistatic layers 2 with the same composition and formation method, there is a tendency that the smaller the thickness, the smaller the loss of the above-mentioned total light transmittance.

抗靜電層2在DIN試驗後之表面電阻率例如為1.0×109Ω/□以下。DIN試驗後之表面電阻率亦可為5.0×108Ω/□以下、2.0×108Ω/□以下、1.0×108Ω/□以下、9.0×107Ω/□以下、8.0×107Ω/□以下、7.0×107Ω/□以下、6.0×107Ω/□以下、5.0×107Ω/□以下、4.0×107Ω/□以下,更可為3.0×107Ω/□以下。表面電阻率的下限例如為1.0×106Ω/□以上,亦可為2.0×106Ω/□以上、3.0×106Ω/□以上、4.0×106Ω/□以上、5.0×106Ω/□以上、6.0×106Ω/□以上、7.0×106Ω/□以上、8.0×106Ω/□以上、9.0×106Ω/□以上,更可為1.0×107Ω/□以上。The surface resistivity of the antistatic layer 2 after DIN testing is, for example, below 1.0 × 10⁹ Ω/□. The surface resistivity after DIN testing can also be below 5.0 × 10⁸ Ω/□, below 2.0 × 10⁸ Ω/□, below 1.0 × 10⁸ Ω/□, below 9.0 × 10⁷ Ω/□, below 8.0 × 10⁷ Ω/□, below 7.0 × 10⁷ Ω/□, below 6.0 × 10⁷ Ω/□, below 5.0 × 10⁷ Ω/□, below 4.0 × 10⁷ Ω/□, and even below 3.0 × 10⁷ Ω/□. The lower limit of the surface resistivity is, for example, 1.0× 10⁶ Ω/□ or higher, and may also be 2.0× 10⁶ Ω/□ or higher, 3.0× 10⁶ Ω/□ or higher, 4.0× 10⁶ Ω/□ or higher, 5.0× 10⁶ Ω/□ or higher, 6.0× 10⁶ Ω/□ or higher, 7.0× 10⁶ Ω/□ or higher, 8.0× 10⁶ Ω/□ or higher, 9.0× 10⁶ Ω/□ or higher, and may even be 1.0× 10⁷ Ω/□ or higher.

抗靜電層2在DIN試驗前之表面電阻率可採用之範圍之例係與上述DIN試驗後之表面電阻率可採用之範圍之例相同。DIN試驗後之表面電阻率A可為1.0×106Ω/□以上且3.0×108Ω/□以下,亦可為1.0×107Ω/□以上且1.0×108Ω/□以下,更可為1.0×107Ω/□以上且5.0×107Ω/□以下。The range of surface resistivity that can be used for the antistatic layer 2 before the DIN test is the same as the range of surface resistivity that can be used after the DIN test. The surface resistivity A after the DIN test can be 1.0× 10⁶ Ω/□ or higher and 3.0× 10⁸ Ω/□ or lower, or 1.0× 10⁷ Ω/□ or higher and 1.0× 10⁸ Ω/□ or lower, or even 1.0× 10⁷ Ω/□ or higher and 5.0× 10⁷ Ω/□ or lower.

抗靜電層2之表面電阻率可藉由以下方法來鑑定。準備抗靜電層2之表面露出於外部之積層體。該積層體之例為包含光學薄膜3及抗靜電層2之積層體。接著,測定備妥之積層體中之抗靜電層2之露出面的表面電阻率。表面電阻率可藉由高電阻電阻率計(舉一例為Mitsubishi Chemical Analytech公司製,Hiresta系列),依循日本產業規格(JIS)K6911:1995所規定之方法來測定。表面電阻率之測定係在25±3℃下實施。The surface resistivity of the antistatic layer 2 can be determined by the following method. Prepare a laminate with the surface of the antistatic layer 2 exposed to the outside. An example of this laminate is a laminate comprising an optical thin film 3 and the antistatic layer 2. Next, measure the surface resistivity of the exposed surface of the antistatic layer 2 in the prepared laminate. The surface resistivity can be measured using a high-resistivity resistivity meter (for example, the Hiresta series manufactured by Mitsubishi Chemical Analytech Co., Ltd.), following the method specified in Japanese Industrial Standard (JIS) K6911:1995. The surface resistivity measurement is performed at 25±3°C.

抗靜電層2亦可包含有CNT與Tg為0℃以上之黏結劑樹脂。此時,CNT之長度可為3µm以上且300µm以下,且直徑可為10nm以下。The antistatic layer 2 may also contain CNTs and an adhesive resin with a Tg of 0°C or higher. In this case, the length of the CNTs may be 3µm or more and 300µm or less, and the diameter may be 10nm or less.

≪1-2.黏著片≫ 黏著片1典型上係由含聚合物(A)之黏著劑組成物(I)形成之層。≪1-2. Adhesive Sheet≫ Adhesive sheet 1 is typically a layer formed of an adhesive composition (I) containing a polymer (A).

<1-2-a.聚合物(A)> 聚合物(A)之例為(甲基)丙烯酸系聚合物、胺甲酸酯系聚合物、聚矽氧系聚合物及橡膠系聚合物。聚合物(A)宜為(甲基)丙烯酸系聚合物。黏著劑組成物(I)亦可包含有(甲基)丙烯酸系聚合物作為主成分,換言之,黏著劑組成物(I)亦可為丙烯酸系黏著劑組成物。本說明書中,主成分意指組成物中以重量基準計含有率最大之成分。主成分之含有率例如為50重量%以上,亦可為60重量%以上、70重量%以上、75重量%以上,更可為80重量%以上。本說明書中,(甲基)丙烯酸系聚合物意指具有源自(甲基)丙烯酸酯等之(甲基)丙烯酸系單體之結構單元的聚合物。(甲基)丙烯酸系聚合物中之該結構單元之含有率例如為40重量%以上,亦可為50重量%以上、60重量%以上、70重量%以上、80重量%以上、85重量%以上、90重量%以上,更可為95重量%以上。(甲基)丙烯酸系聚合物亦可僅由源自(甲基)丙烯酸系單體之結構單元構成。<1-2-a. Polymer (A)> Examples of polymer (A) are (meth)acrylate polymers, carbamate polymers, polysiloxane polymers, and rubber polymers. Polymer (A) is preferably a (meth)acrylate polymer. Adhesive composition (I) may also contain a (meth)acrylate polymer as a main component; in other words, adhesive composition (I) may also be an acrylic adhesive composition. In this specification, the main component means the component with the highest content by weight in the composition. The content of the main component may be, for example, 50% by weight or more, or 60% by weight or more, 70% by weight or more, 75% by weight or more, or even 80% by weight or more. In this specification, a (meth)acrylate polymer means a polymer having structural units derived from (meth)acrylate monomers such as (meth)acrylates. The content of the structural unit in the (meth)acrylic polymer is, for example, 40% by weight or more, or 50% by weight or more, 60% by weight or more, 70% by weight or more, 80% by weight or more, 85% by weight or more, 90% by weight or more, and even 95% by weight or more. The (meth)acrylic polymer may also be composed solely of structural units derived from (meth)acrylic monomers.

聚合物(A)亦可具有聚醚結構。黏著劑組成物(I)亦可包含有具有聚醚結構之聚合物(A)作為主成分。聚醚結構係包含至少2個醚基(-O-)之結構。聚醚結構可為直鏈狀亦可具有支鏈。聚醚結構之一例包含可為直鏈狀或可具有支鏈之烷基與至少2個醚基。聚合物(A)可於主鏈具有聚醚結構亦可於側鏈具有聚醚結構,宜於側鏈具有聚醚結構。聚合物(A)亦可為於側鏈具有聚醚結構之(甲基)丙烯酸系聚合物。Polymer (A) may also have a polyether structure. Adhesive composition (I) may also include polymer (A) having a polyether structure as a main component. A polyether structure is a structure containing at least two ether groups (-O-). The polyether structure may be linear or branched. An example of a polyether structure includes an alkyl group that may be linear or branched and at least two ether groups. Polymer (A) may have a polyether structure in its main chain or in its side chains, preferably in its side chains. Polymer (A) may also be a (meth)acrylic polymer having a polyether structure in its side chains.

聚合物(A)亦可具有具聚醚結構之結構單元。在該結構單元中,聚醚結構可位於主鏈亦可位於側鏈,宜位於側鏈。聚合物(A)亦可具有源自於側鏈具有聚醚結構之(甲基)丙烯酸系單體的結構單元。Polymer (A) may also have structural units with polyether structures. In such structural units, the polyether structure may be located on the main chain or on the side chain, preferably on the side chain. Polymer (A) may also have structural units derived from (meth)acrylic monomers with polyether structures on the side chains.

於側鏈具有聚醚結構之聚合物(A)例如具有源自以下式(2)所示單體A1之結構單元。換言之,聚合物(A)亦可具有源自以下式(2)所示單體之結構單元。式(2)之R1為氫原子或甲基。R2為可為直鏈狀或可具有支鏈之烷基,宜為直鏈狀烷基。烷基之碳數可為1~10,更可為1~4。R2之例為甲基及乙基。n為1~15之整數,宜為1~10之整數,較宜為1~5之整數。n為1時,單體A1包含COO基之「-O-」,且包含2個醚基。單體A1為(甲基)丙烯酸系單體之1種,更具體而言為(甲基)丙烯酸酯單體之1種。著眼於側鏈末端之R2O基時,單體A1亦為含烷氧基(甲基)丙烯酸酯單體之1種。源自單體A1之結構單元係於側鏈具有聚醚結構。Polymer (A) having a polyether structure in its side chains, for example, has a structural unit derived from monomer A1 as shown in formula (2) below. In other words, polymer (A) may also have a structural unit derived from monomer as shown in formula (2) below. R1 in formula (2) is a hydrogen atom or a methyl group. R2 is an alkyl group that may be linear or branched, preferably a linear alkyl group. The number of carbon atoms in the alkyl group may be 1 to 10, more preferably 1 to 4. Examples of R2 are methyl and ethyl. n is an integer from 1 to 15, preferably an integer from 1 to 10, more preferably an integer from 1 to 5. When n is 1, monomer A1 contains a "-O-" of a COO group and contains 2 ether groups. Monomer A1 is one of the (meth)acrylate monomers, and more specifically, one of the (meth)acrylate monomers. When focusing on the R2O group at the end of the side chain, monomer A1 is also a type of alkoxy (meth)acrylate monomer. The structural unit derived from monomer A1 has a polyether structure in the side chain.

[化學式2] [Chemical Formula 2]

單體A1之例為:(甲基)丙烯酸2-甲氧乙酯、(甲基)丙烯酸2-乙氧乙酯、(甲基)丙烯酸2-(2-乙氧乙氧基)乙酯、(甲基)丙烯酸甲氧基三乙二醇酯及(甲基)丙烯酸甲氧基聚乙二醇酯,宜為丙烯酸2-甲氧乙酯(MEA)。源自單體A1之結構單元可有助於降低由黏著劑組成物(I)形成之黏著片1的表面電阻率。Examples of monomer A1 include: 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 2-(2-ethoxyethoxy)ethyl (meth)acrylate, methoxytriethylene glycol (meth)acrylate, and methoxypolyethylene glycol (meth)acrylate, preferably 2-methoxyethyl acrylate (MEA). Structural units derived from monomer A1 can help reduce the surface resistivity of the adhesive sheet 1 formed from the adhesive composition (I).

聚合物(A)中具聚醚結構之結構單元之含有率例如為0重量%以上,亦可為10重量%以上、15重量%以上、20重量%以上、25重量%以上、30重量%以上、35重量%以上、40重量%以上、45重量%以上,更可為50重量%以上。該含有率的上限例如為100重量%以下,亦可為90重量%以下、80重量%以下、70重量%以下、65重量%以下、60重量%以下,更可小於60重量%。又,聚合物(A)中源自單體A1之結構單元之含有率亦可在上述範圍內。The content of polyether structural units in polymer (A) may be 0% by weight or more, or may be 10% by weight or more, 15% by weight or more, 20% by weight or more, 25% by weight or more, 30% by weight or more, 35% by weight or more, 40% by weight or more, 45% by weight or more, and may even be 50% by weight or more. The upper limit of this content is, for example, 100% by weight or less, or may be 90% by weight or less, 80% by weight or less, 70% by weight or less, 65% by weight or less, 60% by weight or less, and may even be less than 60% by weight. Furthermore, the content of structural units derived from monomer A1 in polymer (A) may also be within the above range.

聚合物(A)亦可不具有具聚醚結構之結構單元。Polymer (A) may also not have structural units with polyether structures.

聚合物(A)亦可具有1種或2種以上源自單體A2之結構單元。單體A2亦可可與單體A1共聚。聚合物(A)亦可具有源自單體A1之結構單元與源自單體A2之結構單元兩者。Polymer (A) may also have one or more structural units derived from monomer A2. Monomer A2 may also be copolymerized with monomer A1. Polymer (A) may also have both structural units derived from monomer A1 and structural units derived from monomer A2.

單體A2之例為於側鏈具有碳數1~30烷基之(甲基)丙烯酸系單體。烷基可為直鏈狀,亦可具有支鏈。該(甲基)丙烯酸系單體之例為:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸異己酯、(甲基)丙烯酸異庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸正十二酯((甲基)丙烯酸月桂酯)、(甲基)丙烯酸正十三酯、(甲基)丙烯酸正十四酯、(甲基)丙烯酸十五酯、(甲基)丙烯酸十六酯、(甲基)丙烯酸十七酯及(甲基)丙烯酸十八酯。聚合物(A)中源自上述(甲基)丙烯酸系單體之結構單元之含有率例如為80重量%以下,可為70重量%以下、60重量%以下、50重量%以下、40重量%以下、30重量%以下、20重量%以下、10重量%以下,更可為5重量%以下,亦可為0重量% (亦可不具有該結構單元)。Examples of monomer A2 are (meth)acrylate monomers having alkyl groups with 1 to 30 carbon atoms in the side chain. The alkyl groups can be linear or branched. Examples of such (meth)acrylate monomers include: methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, dibutyl methacrylate, terbutyl methacrylate, isobutyl methacrylate, n-amyl methacrylate, isoamyl methacrylate, n-hexyl methacrylate, isohexyl methacrylate, isoheptyl methacrylate, and methacrylate. 2-Ethylhexyl acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-dodecyl ((meth)acrylate) (laurate), n-tetrazol (meth)acrylate, n-tetradecyl (meth)acrylate, n-pentadecanyl (meth)acrylate, n-hexadecyl (meth)acrylate, n-heptadecyl (meth)acrylate, n-heptadecyl (meth)acrylate, and n-octadecyl (meth)acrylate. The content of structural units derived from the above-mentioned (meth)acrylate monomers in polymer (A) is, for example, 80% by weight or less, and may be 70% by weight or less, 60% by weight or less, 50% by weight or less, 40% by weight or less, 30% by weight or less, 20% by weight or less, 10% by weight or less, and may even be 5% by weight or less, or may be 0% by weight (or may not contain the structural unit).

單體A2之另一例為含羥基單體。含羥基單體亦可為含羥基(甲基)丙烯酸系單體。含羥基單體之例為:(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸4-羥丁酯、(甲基)丙烯酸6-羥己酯、(甲基)丙烯酸8-羥辛酯、(甲基)丙烯酸10-羥癸酯及(甲基)丙烯酸12-羥月桂酯等之(甲基)丙烯酸羥烷基酯以及(4-羥甲基環己基)-甲基丙烯酸酯。由使由黏著劑組成物(I)形成之黏著片1之耐久性提升之觀點來看,宜為(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸4-羥丁酯,較宜為(甲基)丙烯酸4-羥丁酯。聚合物(A)中源自含羥基單體之結構單元之含有率例如為1~5重量%,亦可為3重量%以下,更可為2重量%以下。聚合物(A)亦可不具有源自含羥基單體之結構單元。Another example of monomer A2 is a hydroxyl-containing monomer. Hydroxyl-containing monomers can also be hydroxyl-containing (meth)acrylate monomers. Examples of hydroxyl-containing monomers include: hydroxyalkyl esters of (meth)acrylate such as 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, 6-hydroxyhexyl methacrylate, 8-hydroxyoctyl methacrylate, 10-hydroxydecyl methacrylate, and 12-hydroxylauryl methacrylate, as well as (4-hydroxymethylcyclohexyl)-methacrylate. From the viewpoint of improving the durability of the adhesive sheet 1 formed from adhesive composition (I), 2-hydroxyethyl methacrylate, 4-hydroxybutyl methacrylate, and preferably 4-hydroxybutyl methacrylate are preferred. The content of structural units derived from hydroxyl-containing monomers in polymer (A) is, for example, 1 to 5% by weight, or less than 3% by weight, or even less than 2% by weight. Polymer (A) may also not have structural units derived from hydroxyl-containing monomers.

單體A2亦可為含芳香環單體、含羧基單體、含胺基單體、含醯胺基單體。Monomer A2 can also be an aromatic ring monomer, a carboxyl monomer, an amino monomer, or a amide monomer.

含芳香環單體亦可為含芳香環(甲基)丙烯酸系單體。含芳香環單體之例為:(甲基)丙烯酸苯酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯氧基二乙二醇酯、氧化乙烯改質壬苯酚(甲基)丙烯酸酯、羥乙基化β-萘酚(甲基)丙烯酸酯及聯苯(甲基)丙烯酸酯。製造包含光學積層體10之影像顯示裝置時及/或使用包含光學積層體10之影像顯示裝置時,有黏著片偏移而產生雙折射之情形。若產生雙折射,便可能於影像顯示裝置產生漏光或顯示不均等問題。含有源自含芳香環單體之結構單元這點可有助於降低因上述黏著片之偏移而產生之雙折射。The aromatic ring monomer can also be an aromatic ring (meth)acrylate monomer. Examples of aromatic ring monomers include: phenyl (meth)acrylate, benzyl (meth)acrylate, phenoxy diethylene glycol (meth)acrylate, ethylene oxide-modified nonylphenol (meth)acrylate, hydroxyethylated β-naphthol (meth)acrylate, and biphenyl (meth)acrylate. When manufacturing and/or using an image display device comprising optical laminate 10, birefringence can occur due to adhesive sheet misalignment. If birefringence occurs, problems such as light leakage or uneven display may arise in the image display device. The presence of structural units derived from aromatic ring monomers can help reduce birefringence caused by the aforementioned adhesive sheet misalignment.

含芳香環單體亦可為以下式(3)所示單體A3。式(3)之R3為氫原子或甲基。式(3)之R4為可被氫原子取代之苯基,宜為苯基。氫原子之取代基例如為碳數1~10、進而為1~4之直鏈狀或具有支鏈之烷基及碳數1~4烷氧基。n為1~15之整數,宜為1~10之整數,較宜為1~5之整數。n為1時,單體A3為(甲基)丙烯酸系單體之1種,更具體而言為(甲基)丙烯酸酯單體之1種。單體A3包含COO基之「-O-」,且包含2個醚基。換言之,源自單體A3之結構單元亦為具聚醚結構之結構單元。此外,聚合物(A)中源自單體A3之結構單元之含有率係包含在具聚醚結構之結構單元之含有率中。The aromatic ring monomer can also be monomer A3 as shown in formula (3). R3 in formula (3) is a hydrogen atom or a methyl group. R4 in formula (3) is a phenyl group that can be replaced by a hydrogen atom, preferably a phenyl group. The substituents for the hydrogen atom are, for example, linear or branched alkyl groups having 1 to 10 carbon atoms and alkoxy groups having 1 to 4 carbon atoms. n is an integer from 1 to 15, preferably an integer from 1 to 10, and more preferably an integer from 1 to 5. When n is 1, monomer A3 is a type of (meth)acrylate monomer, and more specifically, a type of (meth)acrylate monomer. Monomer A3 contains the "-O-" of the COO group and contains two ether groups. In other words, the structural unit derived from monomer A3 is also a structural unit with a polyether structure. Furthermore, the content of structural units derived from monomer A3 in polymer (A) is included in the content of structural units with polyether structures.

[化學式3] [Chemical Formula 3]

單體A3之例為(甲基)丙烯酸苯氧乙酯。An example of monomer A3 is phenoxyethyl (meth)acrylate.

具有源自單體A3之結構單元之聚合物(A)可有助於提升光學積層體10之耐久性。又,具有源自單體A3之結構單元之聚合物(A)即便在光學積層體10包含可能因加熱而收縮之光學薄膜3時,仍可有助於抑制光學薄膜3在端部之偏移。Polymer (A) having structural units derived from monomer A3 can help improve the durability of optical laminate 10. Furthermore, polymer (A) having structural units derived from monomer A3 can still help suppress the offset of optical film 3 at its ends even when optical laminate 10 includes optical film 3 that may shrink due to heating.

含羧基單體之例為(甲基)丙烯酸、(甲基)丙烯酸羧乙酯、(甲基)丙烯酸羧戊酯、伊康酸、馬來酸、延胡索酸及巴豆酸。含胺基單體之例為N,N-二甲基胺乙基(甲基)丙烯酸酯及N,N-二甲基胺丙基(甲基)丙烯酸酯等。含醯胺基單體之例為:(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N,N-二乙基(甲基)丙烯醯胺、N-異丙基丙烯醯胺、N-甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-己基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基-N-丙烷(甲基)丙烯醯胺、胺甲基(甲基)丙烯醯胺、胺乙基(甲基)丙烯醯胺、巰甲基(甲基)丙烯醯胺及巰乙基(甲基)丙烯醯胺等丙烯醯胺系單體;N-(甲基)丙烯醯基嗎福林、N-(甲基)丙烯醯基哌啶及N-(甲基)丙烯醯基吡咯啶等N-丙烯醯基雜環單體;以及N-乙烯吡咯啶酮及N-乙烯基-ε-己內醯胺等含N-乙烯基內醯胺系單體。Examples of carboxyl-containing monomers include (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid. Examples of amine-containing monomers include N,N-dimethylaminoethyl (meth)acrylate and N,N-dimethylaminopropyl (meth)acrylate. Examples of amide-containing monomers include (meth)acrylamide, N,N-dimethyl (meth)acrylamide, N,N-diethyl (meth)acrylamide, N-isopropylacrylamide, N-methyl (meth)acrylamide, N-butyl (meth)acrylamide, N-hexyl (meth)acrylamide, N-hydroxymethyl (meth)acrylamide, N-hydroxymethyl-N-propane (meth)acrylamide, and aminomethyl (meth)acrylamide. Acrylamide monomers such as acrylamide, aminoethyl (meth)acrylamide, methyl (meth)acrylamide and ethyl (meth)acrylamide; N-acrylyl heterocyclic monomers such as N-(meth)acrylamide molfolin, N-(meth)acrylamide piperidine and N-(meth)acrylamide pyrrolidine; and N-vinylpyrrolidone and N-vinyl-ε-caprolactam monomers containing N-vinyl lactone.

單體A2亦可為多官能性單體。多官能性單體之例為:己二醇二(甲基)丙烯酸酯(1,6-己二醇二(甲基)丙烯酸酯)、丁二醇二(甲基)丙烯酸酯、三羥甲丙烷三(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、新戊四醇二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、四羥甲基甲烷三(甲基)丙烯酸酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸乙烯酯、環氧丙烯酸酯、聚酯丙烯酸酯及胺甲酸酯丙烯酸酯等多官能丙烯酸酯;以及二乙烯苯。多官能丙烯酸酯宜為1,6-己二醇二丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯。Monomer A2 can also be a multifunctional monomer. Examples of multifunctional monomers include: hexanediol di(meth)acrylate (1,6-hexanediol di(meth)acrylate), butanediol di(meth)acrylate, trihydroxymethylpropane tri(meth)acrylate, neopentyl glycol di(meth)acrylate, neopentyl tetraethylene di(meth)acrylate, neopentyl tetraethylene tri(meth)acrylate, dinepentyl tetraethylene hexa(meth)acrylate, tetrahydroxymethylmethane tri(meth)acrylate, allyl (meth)acrylate, ethylene (meth)acrylate, epoxy acrylates, polyester acrylates, and carbamate acrylates, as well as divinylbenzene. Multifunctional acrylates are preferably 1,6-hexanediol diacrylate and dinepentyl tetraethylene hexa(meth)acrylate.

聚合物(A)中源自含芳香環單體、含羧基單體、含胺基單體、含醯胺基單體及多官能性單體之結構單元之含有率的合計宜為20重量%以下,較宜為15重量%以下,更宜為10重量%以下,尤宜為8重量%以下。聚合物(A)具有該結構單元時,含有率的合計例如為0.01重量%以上,可為1重量%以上、2重量%以上,更可為3重量%以上。聚合物(A)亦可不具有該等結構單元。尤其,聚合物(A)中,源自含羧基單體之結構單元之含有率可小於0.1重量%,亦可為0重量% (亦可不具有該結構單元)。The total content of structural units derived from aromatic ring monomers, carboxyl monomers, amine monomers, amide monomers, and polyfunctional monomers in polymer (A) should preferably be 20% by weight or less, more preferably 15% by weight or less, more preferably 10% by weight or less, and especially preferably 8% by weight or less. When polymer (A) contains such structural units, the total content may be, for example, 0.01% by weight or more, 1% by weight or more, 2% by weight or more, and more preferably 3% by weight or more. Polymer (A) may also not contain such structural units. In particular, the content of structural units derived from carboxyl monomers in polymer (A) may be less than 0.1% by weight or may be 0% by weight (or may not contain such structural units).

其他單體A2之例為:丙烯酸;(甲基)丙烯腈等含腈基之(甲基)丙烯酸酯;(甲基)丙烯酸環氧丙酯及(甲基)丙烯酸甲基環氧丙酯等含環氧基單體;乙烯基磺酸鈉等含磺酸基單體;含磷酸基單體;(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯及(甲基)丙烯酸異莰酯等具有脂環式烴基之(甲基)丙烯酸酯;乙酸乙烯酯及丙酸乙烯酯等乙烯酯類;苯乙烯及乙烯基甲苯等芳香族乙烯基化合物;乙烯、丙烯、丁二烯、異戊二烯及異丁烯等烯烴類或二烯類;乙烯基烷基醚等乙烯基醚類;以及氯乙烯。Other examples of monomer A2 include: acrylic acid; cyanoacrylates such as (meth)acrylonitrile; epoxy-containing monomers such as (meth)acrylate and (meth)acrylate methoxypropyl ester; sulfonic acid monomers such as sodium vinylsulfonate; phosphate-containing monomers; (meth)acrylates with alicyclic hydrocarbon groups such as (meth)acrylate cyclopentyl ester, (meth)acrylate cyclohexyl ester, and (meth)acrylate isocamphenyl ester; vinyl esters such as vinyl acetate and vinyl propionate; aromatic vinyl compounds such as styrene and vinyltoluene; alkenes or dienes such as ethylene, propylene, butadiene, isoprene, and isobutene; vinyl ethers such as vinyl alkyl ethers; and vinyl chloride.

聚合物(A)中源自其他單體A2之結構單元之含有率的合計例如為30重量%以下,亦可為10重量%以下,宜為0重量% (不具有該結構單元)。The total content of structural units derived from other monomers A2 in polymer (A) is, for example, less than 30% by weight, less than 10% by weight, and preferably less than 0% by weight (not having the structural unit).

聚合物(A)可具有源自製成均聚物時玻璃轉移溫度(Tgh)在-55℃以上之範圍內的(甲基)丙烯酸系單體的結構單元,可具有源自Tgh在-40℃以上之範圍內的(甲基)丙烯酸系單體的結構單元,可具有源自Tgh在-30℃以上之範圍內的(甲基)丙烯酸系單體的結構單元,亦可具有源自Tgh在-10℃以上之範圍內的(甲基)丙烯酸系單體的結構單元。上述結構單元之例為源自單體A3之結構單元及源自於側鏈具有碳數1~3烷基之(甲基)丙烯酸系單體之結構單元。聚合物(A)亦可具有選自於由源自單體A3之結構單元及源自於側鏈具有碳數1~3烷基之(甲基)丙烯酸系單體之結構單元所構成群組中之至少1種結構單元。具有上述結構單元之聚合物(A)可有助於提升光學積層體10之耐久性。Polymer (A) may have structural units derived from (meth)acrylic monomers with a glass transition temperature (Tgh) above -55°C when forming the homopolymer, structural units derived from (meth)acrylic monomers with a Tgh above -40°C, structural units derived from (meth)acrylic monomers with a Tgh above -30°C, or structural units derived from (meth)acrylic monomers with a Tgh above -10°C. Examples of the above structural units are structural units derived from monomer A3 and structural units derived from (meth)acrylic monomers with 1 to 3 carbon alkyl groups on the side chain. Polymer (A) may also have at least one structural unit selected from the group consisting of structural units derived from monomer A3 and structural units derived from (meth)acrylic monomers with 1 to 3 carbon atoms in their side chains. Polymer (A) having the above-mentioned structural units may help improve the durability of optical laminate 10.

聚合物(A)可藉由公知方法將上述1種或2種以上單體聚合而形成。亦可將單體與單體之部分聚合物聚合。聚合例如可藉由溶液聚合、乳化聚合、塊狀聚合、熱聚合、活性能量線聚合來實施。由可形成光學透明性優異之黏著片之觀點來看,宜為溶液聚合、活性能量線聚合。聚合宜避免單體及/或部分聚合物與氧接觸來實施,因此可採用例如在氮等非活性氣體環境下之聚合、或是在藉由樹脂薄膜等阻隔氧之狀態下之聚合。形成之聚合物(A)可為無規共聚物、嵌段共聚物、接枝共聚物等中之任一態樣。Polymer (A) can be formed by polymerizing one or more of the aforementioned monomers using known methods. It can also be formed by polymerizing monomers with a portion of the polymer. Polymerization can be carried out, for example, by solution polymerization, emulsion polymerization, bulk polymerization, thermal polymerization, or active energy line polymerization. From the viewpoint of forming adhesive sheets with excellent optical transparency, solution polymerization and active energy line polymerization are preferable. Polymerization should avoid contact between the monomers and/or a portion of the polymer and oxygen; therefore, polymerization can be carried out, for example, in an inert gas environment such as nitrogen, or in a state where oxygen is blocked by a resin film, etc. The resulting polymer (A) can be any of the following: random copolymer, block copolymer, graft copolymer, etc.

形成聚合物(A)之聚合系統亦可包含有1種或2種以上聚合引發劑。聚合引發劑之種類可依聚合反應來選擇,亦可為例如熱聚合引發劑、光聚合引發劑。The polymerization system that forms polymer (A) may also contain one or more polymerization initiators. The type of polymerization initiator may be selected according to the polymerization reaction, and may be, for example, a thermal polymerization initiator or a photopolymerization initiator.

溶液聚合所使用之溶劑例如為:乙酸乙酯、乙酸正丁酯等酯類;甲苯、苯等芳香族烴類;正己烷、正庚烷等脂肪族烴類;環己烷、甲基環己烷等脂環式烴類;甲基乙基酮、甲基異丁基酮等酮類。惟,溶劑不受上述例所限。溶劑亦可為2種以上溶劑之混合溶劑。Solvents used in solution polymerization include, for example, esters such as ethyl acetate and n-butyl acetate; aromatic hydrocarbons such as toluene and benzene; aliphatic hydrocarbons such as n-hexane and n-heptane; alicyclic hydrocarbons such as cyclohexane and methylcyclohexane; and ketones such as methyl ethyl ketone and methyl isobutyl ketone. However, the solvent is not limited to the above examples. The solvent may also be a mixture of two or more solvents.

溶液聚合所使用之聚合引發劑例如為偶氮系聚合引發劑、過氧化物系聚合引發劑、氧化還原系聚合引發劑。過氧化物系聚合引發劑例如為二苯甲醯基過氧化物、過氧化馬來酸三級丁酯。其中又宜為日本專利特開2002-69411號公報中揭示之偶氮系聚合引發劑。該偶氮系聚合引發劑例如為2,2'-偶氮雙異丁腈(AIBN)、2,2'-偶氮雙-2-甲基丁腈、2,2'-偶氮雙(2-甲基丙酸)二甲酯、4,4'-偶氮雙-4-氰戊酸。惟,聚合引發劑不受上述例所限。偶氮系聚合引發劑之使用量例如相對於單體之總量100重量份為0.05~0.5重量份,亦可為0.1~0.3重量份。The polymerization initiators used in solution polymerization include, for example, azo-based polymerization initiators, peroxide-based polymerization initiators, and redox-based polymerization initiators. Examples of peroxide-based polymerization initiators include dibenzoxyl peroxide and tributyl maleate peroxide. Among these, the azo-based polymerization initiator disclosed in Japanese Patent Application Publication No. 2002-69411 is particularly suitable. Examples of such azo-based polymerization initiators include 2,2'-azobisisobutyronitrile (AIBN), 2,2'-azobis-2-methylbutyronitrile, 2,2'-azobis(2-methylpropionic acid) dimethyl ester, and 4,4'-azobis-4-cyanopentanoic acid. However, the polymerization initiator is not limited to the examples above. The amount of azo polymerization initiator used is, for example, 0.05 to 0.5 parts by weight relative to 100 parts by weight of the total monomer, or 0.1 to 0.3 parts by weight.

活性能量線聚合所使用之活性能量線例如為α射線、β射線、γ射線、中子射線、電子束等游離輻射線、及紫外線。活性能量線宜為紫外線。利用紫外線照射進行之聚合亦稱為光聚合。活性能量線聚合之聚合系統典型上包含光聚合引發劑。活性能量聚合之聚合條件只要能形成聚合物(A),便無限定。The active energy rays used in active energy line polymerization include, for example, ionizing radiation such as alpha rays, beta rays, gamma rays, neutron rays, electron beams, and ultraviolet rays. Ultraviolet rays are preferred as the active energy ray. Polymerization using ultraviolet irradiation is also called photopolymerization. The polymerization system of active energy line polymerization typically includes a photopolymerization initiator. The polymerization conditions for active energy polymerization are not limited as long as polymer (A) can be formed.

光聚合引發劑例如為:苯偶姻醚系光聚合引發劑、苯乙酮系光聚合引發劑、α-酮醇系光聚合引發劑、芳香族磺醯氯系光聚合引發劑、光活性肟系光聚合引發劑、苯偶姻系光聚合引發劑、苯甲基系光聚合引發劑、二苯基酮系光聚合引發劑、縮酮系光聚合引發劑、9-氧硫𠮿系光聚合引發劑。惟,光聚合引發劑不受上述例所限。Examples of photopolymerization initiators include: benzoin ether-based photopolymerization initiators, acetophenone-based photopolymerization initiators, α-keto alcohol-based photopolymerization initiators, aromatic sulfonyl chloride-based photopolymerization initiators, photoactive oxime-based photopolymerization initiators, benzoin-based photopolymerization initiators, benzyl-based photopolymerization initiators, diphenyl ketone-based photopolymerization initiators, ketal-based photopolymerization initiators, and 9-oxosulfuron-methyl-2-ethylhexylene ... It is a photopolymerization initiator. However, photopolymerization initiators are not limited to the above examples.

苯偶姻醚系光聚合引發劑例如為:苯偶姻甲醚、苯偶姻乙醚、苯偶姻丙醚、苯偶姻異丙醚、苯偶姻異丁醚、2,2-二甲氧基-1,2-二苯基乙-1-酮、苯甲醚甲醚。苯乙酮系光聚合引發劑例如為:2,2-二乙氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、1-羥環己基苯基酮、4-苯氧基二氯苯乙酮、4-(三級丁基)二氯苯乙酮。α-酮醇系光聚合引發劑例如為:2-甲基-2-羥苯丙酮、1-[4-(2-羥乙基)苯]-2-甲基丙-1-酮。芳香族磺醯氯系光聚合引發劑例如為2-萘磺醯氯。光活性肟系光聚合引發劑例如為1-苯-1,1-丙二酮-2-(鄰乙氧羰基)-肟。苯偶姻系光聚合引發劑例如為苯偶姻。苯甲基系光聚合引發劑例如為苯甲基。二苯基酮系光聚合引發劑例如為二苯基酮、苯甲醯苯甲酸、3,3'-二甲基-4-甲氧基二苯基酮、聚乙烯基二苯基酮、α-羥環己基苯基酮。縮酮系光聚合引發劑例如為苯甲基二甲基縮酮。9-氧硫𠮿系光聚合引發劑例如為:9-氧硫𠮿、2-氯9-氧硫𠮿、2-甲基9-氧硫𠮿、2,4-二甲基9-氧硫𠮿、異丙基9-氧硫𠮿、2,4-二異丙基9-氧硫𠮿、十二烷基9-氧硫𠮿Examples of benzoin ether-based photopolymerization initiators include: benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 2,2-dimethoxy-1,2-diphenylethyl-1-one, and anisole methyl ether. Examples of acetophenone-based photopolymerization initiators include: 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1-hydroxycyclohexylphenyl ketone, 4-phenoxydichloroacetophenone, and 4-(tri-butyl)dichloroacetophenone. Examples of α-ketool-based photopolymerization initiators include: 2-methyl-2-hydroxyphenylacetone and 1-[4-(2-hydroxyethyl)phenyl]-2-methylprop-1-one. Examples of aromatic sulfonyl chloride-based photopolymerization initiators include 2-naphthalenesulfonyl chloride. Photoactive oxime photopolymerization initiators include, for example, 1-benzyl-1,1-propanedione-2-(orthoethoxycarbonyl)-oxime. Benzoin-based photopolymerization initiators include, for example, benzoin. Benzyl-based photopolymerization initiators include, for example, benzyl. Diphenyl ketone-based photopolymerization initiators include, for example, diphenyl ketone, benzoylbenzoic acid, 3,3'-dimethyl-4-methoxydiphenyl ketone, polyvinyl diphenyl ketone, and α-hydroxycyclohexylphenyl ketone. Ketone-based photopolymerization initiators include, for example, benzyl dimethyl ketone. 9-Oxysulfuron Photopolymerization initiators, for example, include 9-oxosulfuron. 2-Chloro-9-oxysulfur 2-Methyl-9-oxosulfur 2,4-Dimethyl-9-oxosulfur Isopropyl 9-oxosulfur 2,4-Diisopropyl-9-oxosulfuron Dodecyl 9-oxosulfur .

光聚合引發劑之使用量例如相對於單體之總量100重量份為0.01~1重量份,亦可為0.05~0.5重量份。The amount of photopolymerization initiator used is, for example, 0.01 to 1 part by weight relative to 100 parts by weight of the total amount of monomers, or 0.05 to 0.5 parts by weight.

聚合物(A)之重量平均分子量(Mw)例如為100萬~300萬,宜為180萬~300萬。藉由聚合物(A)之重量平均分子量為100萬~300萬,有可抑制黏著片之裂痕、且可抑制黏度上升或發生凝膠化之傾向。本說明書中聚合物之重量平均分子量(Mw)係根據GPC(凝膠滲透層析法;Gel Permeation Chromatography)測定之值(聚苯乙烯換算)。The weight-average molecular weight (Mw) of polymer (A) is, for example, 1 million to 3 million, preferably 1.8 million to 3 million. A weight-average molecular weight of 1 million to 3 million for polymer (A) can suppress cracking of the adhesive sheet and inhibit the tendency for viscosity to increase or gel. The weight-average molecular weight (Mw) of the polymer in this specification is a value determined by GPC (Gel Permeation Chromatography) (converted from polystyrene).

黏著劑組成物(I)中之聚合物(A)之含有率以固體成分比計,例如為50重量%以上,亦可為60重量%以上、70重量%以上、75重量%以上,更可為80重量%以上。含有率的上限例如為99重量%以下,亦可為97重量%以下,更可為95重量%以下。The content of polymer (A) in the adhesive composition (I), in terms of solid content, is, for example, 50% by weight or more, or 60% by weight or more, 70% by weight or more, 75% by weight or more, or even 80% by weight or more. The upper limit of the content is, for example, 99% by weight or less, or 97% by weight or less, or even 95% by weight or less.

<1-2-b.抗靜電劑> 黏著劑組成物(I)亦可包含有抗靜電劑。抗靜電劑可有助於降低黏著片1之表面電阻率。抗靜電劑之例為鹽等之離子性化合物。離子性化合物亦可為在常溫(25℃)下為液體之離子液體。<1-2-b. Antistatic Agent> The adhesive composition (I) may also contain an antistatic agent. The antistatic agent helps to reduce the surface resistivity of the adhesive sheet 1. Examples of antistatic agents are ionic compounds such as salts. Ionic compounds may also be ionic liquids that are liquid at room temperature (25°C).

離子性化合物之例為無機陽離子鹽及有機陽離子鹽。無機陽離子鹽之例為無機陽離子-陰離子鹽。無機陽離子鹽所含之陽離子之例為鹼金屬離子。鹼金屬離子例如為鋰離子、鈉離子、鉀離子,宜為鋰離子。無機陽離子鹽亦可為鋰鹽。Examples of ionic compounds are inorganic cation salts and organic cation salts. Examples of inorganic cation salts are inorganic cation-anion salts. Examples of cations contained in inorganic cation salts are alkali metal ions. Alkali metal ions include, for example, lithium ions, sodium ions, and potassium ions, preferably lithium ions. Inorganic cation salts can also be lithium salts.

無機陽離子鹽所含之陰離子之例為:Cl-、Br-、I-、AlCl4 -、Al2Cl7 -、BF4 -、PF6 -、ClO4 -、NO3 -、CH3COO-、CF3COO-、CH3SO3 -、CF3SO3 -、(CF3SO2)3C-、AsF6 -、SbF6 -、NbF6 -、TaF6 -、(CN)2N-、C4F9SO3 -、C3F7COO-、(CF3SO2)(CF3CO)N-、-O3S(CF2)3SO3 -及下述通式(a)~(d)所示陰離子。 (a)(CnF2n+1SO2)2N- (n為1~10之整數) (b)CF2(CmF2mSO2)2N- (m為1~10之整數) (c)-O3S(CF2)lSO3 - (l為1~10之整數) (d)(CpF2p+1SO2)N-(CqF2q+1SO2)(p及q彼此獨立為1~10之整數)Examples of anions contained in inorganic cation salts include: Cl- , Br- , I- , AlCl4-, Al2Cl7-, BF4-, PF6-, ClO4-, NO3- , CH3COO- , CF3COO- , CH3SO3- , CF3SO3- , ( CF3SO2 )3C-, AsF6-, SbF6- , NbF6- , TaF6- , ( CN ) 2N- , C4F9SO3- , C3F7COO- , ( CF3SO2 ) ( CF3CO ) N- , -O3S ( CF2 ) 3SO3- , and anions represented by the following general formulas ( a ) to ( d ) . (a) (C <sub> n </sub>F<sub>2n</sub> + 1 </sub>SO<sub> 2 </sub>)<sup> 2 </sup>N - (n is an integer from 1 to 10) (b) CF <sub>2</sub> (C <sub> m </sub> F<sub>2m</sub> SO <sub>2</sub>)<sup> 2 </sup>N - (m is an integer from 1 to 10) (c) -O<sub> 3 </sub>S(CF <sub>2</sub> ) lSO <sub> 3 </sub> - (l is an integer from 1 to 10) (d) (C<sub> p </sub> F <sub> 2p </sub> + 1</sub>SO<sub>2</sub>)N - (C<sub> q </sub>F<sub>2q</sub> + 1 </sub>SO<sub>2</sub> ) (p and q are independent integers from 1 to 10)

無機陽離子鹽所含之陰離子宜為含氟陰離子,較宜為含氟醯亞胺陰離子。含氟醯亞胺陰離子之例為具有全氟烷基之醯亞胺陰離子。含氟醯亞胺陰離子更具體之例為(CF3SO2)(CF3CO)N-、或是上述通式(a)、(b)或(d)所示之陰離子,宜為(CF3SO2)2N-、(C2F5SO2)2N-等通式(a)所示之(全氟烷基磺醯基)醯亞胺,較宜為(CF3SO2)2N-所示之雙(三氟甲磺醯基)醯亞胺。理想之無機陽離子鹽之例為鋰雙(三氟甲磺醯基)醯亞胺(LiTFSI)。The anions contained in inorganic cation salts should preferably be fluorinated anions, and more preferably fluoroimid anions. Examples of fluoroimid anions are imid anions with perfluoroalkyl groups. More specific examples of fluoroimid anions are ( CF3SO2 )( CF3CO ) N- , or anions represented by the above general formulas (a), (b), or (d ) , preferably ( CF3SO2 ) 2N- , ( C2F5SO2 ) 2N- , etc. , which are ( perfluoroalkylsulfonyl ) imids represented by general formula (a) , and more preferably bis (trifluoromethanesulfonyl)imids represented by ( CF3SO2 ) 2N- . An ideal example of an inorganic cation salt is lithium bis(trifluoromethanesulfonyl) aceimine (LiTFSI).

有機陽離子鹽為有機陽離子-陰離子鹽。有機陽離子鹽所含之陽離子之例為含有機基之有機鎓。有機鎓所含之鎓之例為含氮鎓、含硫鎓、含磷鎓,宜為含氮鎓、含硫鎓。含氮鎓之例為:銨陽離子、哌啶鎓陽離子、吡咯啶鎓陽離子、吡啶鎓陽離子、具有二氫吡咯骨架之陽離子、具有吡咯骨架之陽離子、咪唑鎓陽離子、四氫嘧啶鎓陽離子、二氫嘧啶鎓陽離子、吡唑鎓陽離子、吡唑啉鎓陽離子。含硫鎓之例為鋶陽離子。含磷鎓之例為鏻陽離子。有機鎓所含之有機基之例為烷基、烷氧基、烯基。理想之有機鎓之具體例為四烷基銨陽離子(例如三丁基甲基銨陽離子)、烷基哌啶鎓陽離子、烷基吡咯啶鎓陽離子等。Organic cation salts are organic cation-anion salts. Examples of cations contained in organic cation salts are organic onions containing an organic group. Examples of onions contained in organic onions are nitrogen-containing onions, sulfur-containing onions, and phosphorus-containing onions, preferably nitrogen-containing onions and sulfur-containing onions. Examples of nitrogen-containing onions include: ammonium cations, piperidinium cations, pyrrolidineonium cations, pyridinium cations, cations with a dihydropyrrole skeleton, cations with a pyrrole skeleton, imidazodium cations, tetrahydropyrimidineonium cations, dihydropyrimidineonium cations, pyrazolium cations, and pyrazolineonium cations. Examples of sulfur-containing onions include strontium cations. Examples of phosphorus-containing onions include phosphonium cations. Examples of organic groups in organic onions include alkyl, alkoxy, and alkenyl groups. Ideal examples of organonium are tetraalkylammonium cations (e.g., tributylmethylammonium cations), alkylpiperidineonium cations, alkylpyrrolidineonium cations, etc.

有機陽離子鹽所含之陰離子之例係與無機陽離子鹽所含之陰離子之例相同。理想之有機陽離子鹽之例為1-乙-3-甲基咪唑鎓雙(氟磺醯基)醯亞胺(EMI-FSI)、三甲基丁基銨雙(三氟甲磺醯基)醯亞胺等。The anions contained in organic cation salts are the same as those contained in inorganic cation salts. Ideal examples of organic cation salts include 1-ethyl-3-methylimidazolium bis(fluorosulfonyl)imidine (EMI-FSI) and trimethylbutylammonium bis(trifluoromethanesulfonyl)imidine.

抗靜電劑亦可組合無機陽離子鹽與有機陽離子鹽來使用。抗靜電劑宜包含有機陽離子鹽。Antistatic agents can also be used in combination with inorganic and organic cation salts. Antistatic agents should preferably contain organic cation salts.

黏著劑組成物(I)中,相對於聚合物(A)100重量份,抗靜電劑之摻混量例如為0.5重量份以上,亦可為1重量份以上、2重量份以上、3重量份以上,更可為4重量份以上。相對於聚合物(A)100重量份,摻混量的上限例如小於30重量份,亦可為20重量份以下、15重量份以下、12重量份以下、10重量份以下、9重量份以下、8重量份以下、7重量份以下,更可為6重量份以下。藉由適當調節黏著劑組成物(I)中之抗靜電劑之摻混量,可使黏著片1之耐久性更提升。In the adhesive composition (I), the amount of antistatic agent mixed with 100 parts by weight of polymer (A) is, for example, 0.5 parts by weight or more, or 1 part by weight or more, 2 parts by weight or more, 3 parts by weight or more, or even 4 parts by weight or more. The upper limit of the mixing amount relative to 100 parts by weight of polymer (A) is, for example, less than 30 parts by weight, or less than 20 parts by weight, less than 15 parts by weight, less than 12 parts by weight, less than 10 parts by weight, less than 9 parts by weight, less than 8 parts by weight, less than 7 parts by weight, or even less than 6 parts by weight. By appropriately adjusting the mixing amount of antistatic agent in the adhesive composition (I), the durability of the adhesive sheet 1 can be further improved.

<1-2-c.自由基捕捉劑> 黏著劑組成物(I)亦可更包含有自由基捕捉劑。自由基捕捉劑之例為受阻酚系、受阻胺系、亞磷酸鹽系、酚系及硫醚系、以及混合該等系統之摻合物系等之各種抗氧化劑。<1-2-c. Free radical scavengers> Adhesive components (I) may also contain free radical scavengers. Examples of free radical scavengers are various antioxidants such as hindered phenolic, hindered amine, phosphite, phenolic and thioether systems, and admixtures of these systems.

抗氧化劑之種類例如為自由基鏈抑制劑及過氧化物分解劑。Types of antioxidants include free radical chain inhibitors and peroxide decomposers.

抗氧化劑亦可為選自受阻酚系、受阻胺系及亞磷酸鹽系統中之至少1種。Antioxidants may also be selected from at least one of the hindered phenolic, hindered amine, and phosphite systems.

受阻酚系抗氧化劑亦可具有下述結構:對與苯酚之鍵結有OH基之芳香環上的碳原子鄰接之至少1個碳原子係鍵結有三級丁基。受阻酚系抗氧化劑之例為:二丁基羥基甲苯(BHT);以及Irganox1010、Irganox1010FF、Irganox1035、Irganox1035FF、Irganox1076、Irganox1076FD、Irganox1076DWJ、Irganox1098、Irganox1135、Irganox1330、Irganox1726、Irganox1425WL、Irganox1520L、Irganox245、Irganox245FF、Irganox259、Irganox3114、Irganox565及Irganox295(皆為商品名,BASF公司製)。Hindered phenolic antioxidants may also have the following structure: at least one carbon atom adjacent to the carbon atom of the aromatic ring with an OH group bonded to phenol is bonded with a tertiary butyl group. Examples of hindered phenolic antioxidants include: butylhydroxytoluene (BHT); and Irganox 1010, Irganox 1010FF, Irganox 1035, Irganox 1035FF, Irganox 1076, Irganox 1076FD, Irganox 1076DWJ, Irganox 1098, Irganox 1135, Irganox 1330, Irganox 1726, Irganox 1425WL, Irganox 1520L, Irganox 245, Irganox 245FF, Irganox 259, Irganox 3114, Irganox 565 and Irganox 295 (all trade names, manufactured by BASF).

受阻胺系抗氧化劑亦可於一分子中具有至少1個受阻哌啶基。受阻胺系抗氧化劑之例為ADK STAB LA-63、ADK STAB LA-63P、ADK STAB LA-52及ADK STAB LA-57(皆為商品名,ADEKA公司製)。Hindered amine antioxidants may also have at least one hindered piperidinium group in one molecule. Examples of hindered amine antioxidants are ADK STAB LA-63, ADK STAB LA-63P, ADK STAB LA-52 and ADK STAB LA-57 (all trade names, manufactured by ADEKA).

亞磷酸酯系抗氧化劑之例為:亞磷酸三苯酯、亞磷酸二苯基異癸酯及亞磷酸苯基二異癸酯;以及ADK STAB 2112、ADK STAB 2112RG、ADK STAB 1178及ADK STAB 3010(皆為商品名,ADEKA公司製)。Examples of phosphite antioxidants include: triphenyl phosphite, diphenyl isodecyl phosphite, and phenyl diisodecyl phosphite; as well as ADK STAB 2112, ADK STAB 2112RG, ADK STAB 1178, and ADK STAB 3010 (all trade names, manufactured by ADEKA).

酚系抗氧化劑之例為單酚系抗氧化劑、雙酚系抗氧化劑及高分子型酚系抗氧化劑。單酚系抗氧化劑之例為2,6-二-三級丁基-對甲酚、丁基化羥基苯甲醚、2,6-二-三級丁基-4-乙基酚、硬酯-β-(3,5-二-三級丁基-4-羥苯基)丙酸酯。雙酚系抗氧化劑之例為:2,2'-亞甲基雙(4-甲-6-三級丁苯酚)、2,2'-亞甲基雙(4-乙-6-三級丁苯酚)、4,4'-硫基雙(3-甲-6-三級丁苯酚)、4,4'-亞丁基雙(3-甲-6-三級丁苯酚)、3,9-雙[1,1-二甲基-2-[β-(3-三級丁基-4-羥-5-甲基苯基)丙醯氧基]乙基]2,4,8,10-四氧雜螺[5,5]十一烷。高分子型酚系抗氧化劑之例為:1,1,3-參(2-甲-4-羥-5-三級丁基苯基)丁烷、1,3,5-三甲基-2,4,6-參(3,5-二-三級丁基-4-羥苄基)苯、肆-[亞甲基-3-(3',5'-二-三級丁基-4'-羥苯基)丙酸酯]甲烷、雙[3,3'-雙-(4'-羥-3'-三級丁基苯基)丁酸]二醇酯、1,3,5-參(3',5'-二-三級丁基-4'-羥苄基)-S-三𠯤-2,4,6-(1H,3H,5H)三酮及生育酚。Examples of phenolic antioxidants include monophenolic antioxidants, bisphenolic antioxidants, and high molecular weight phenolic antioxidants. Examples of monophenolic antioxidants include 2,6-di-tertiary butyl-p-cresol, butylated hydroxyanisole, 2,6-di-tertiary butyl-4-ethylphenol, and stearyl-β-(3,5-di-tertiary butyl-4-hydroxyphenyl)propionate. Examples of bisphenol antioxidants include: 2,2'-methylenebis(4-methyl-6-tertiary-butyrolactone), 2,2'-methylenebis(4-ethyl-6-tertiary-butyrolactone), 4,4'-thiobis(3-methyl-6-tertiary-butyrolactone), 4,4'-butylenebis(3-methyl-6-tertiary-butyrolactone), and 3,9-bis[1,1-dimethyl-2-[β-(3-tertiary-butyl-4-hydroxy-5-methylphenyl)propoxy]ethyl]2,4,8,10-tetraoxozoispiro[5,5]undecane. Examples of high molecular weight phenolic antioxidants include: 1,1,3-tris(2-methyl-4-hydroxy-5-tritertiary butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-tritertiary butyl-4-hydroxybenzyl)benzene, tetra-[methylene-3-(3',5'-di-tritertiary butyl-4'-hydroxyphenyl)propionate]methane, bis[3,3'-bis-(4'-hydroxy-3'-tritertiary butylphenyl)butyrate]diol ester, 1,3,5-tris(3',5'-di-tritertiary butyl-4'-hydroxybenzyl)-S-tris(2,4,6-(1H,3H,5H)trione, and tocopherol.

硫醚系抗氧化劑之例為ADK STAB AO-503及ADK STAB AO-26(皆為商品名,ADEKA公司製)。Examples of thioether-based antioxidants include ADK STAB AO-503 and ADK STAB AO-26 (both trade names, manufactured by ADEKA).

自由基捕捉劑(例如抗氧化劑)之分子量可為1000以下,亦可為900以下、850以下、800以下、700以下、600以下、500以下、450以下,更可為400以下。分子量的下限例如為100以上。根據本發明人等之研討,分子量在上述範圍內之自由基捕捉劑特別適於抑制由黏著劑組成物(I)形成之黏著片之自由基產生量。The molecular weight of free radical scavengers (e.g., antioxidants) can be below 1000, or below 900, 850, 800, 700, 600, 500, 450, and even below 400. The lower limit of the molecular weight is, for example, above 100. According to the inventors' research, free radical scavengers with molecular weights within the above range are particularly suitable for inhibiting the generation of free radicals in adhesive sheets formed by the adhesive composition (I).

自由基捕捉劑(例如抗氧化劑)亦可在25℃下為液體。Free radical scavengers (such as antioxidants) can also be in liquid form at 25°C.

黏著劑組成物(I)中,相對於聚合物(A)100重量份,自由基捕捉劑之摻混量例如為0.1重量份以上,亦可為0.2重量份以上、0.3重量份以上、0.4重量份以上,更可為0.5重量份以上。相對於聚合物(A)100重量份,摻混量的上限例如為15重量份以下,亦可為10重量份以下、7重量份以下、5重量份以下、小於5重量份、4重量份以下、3重量份以下,更可為2重量份以下。In the adhesive composition (I), the amount of free radical scavenger mixed with 100 parts by weight of polymer (A) is, for example, 0.1 parts by weight or more, or 0.2 parts by weight or more, 0.3 parts by weight or more, 0.4 parts by weight or more, or even 0.5 parts by weight or more. The upper limit of the mixing amount with 100 parts by weight of polymer (A) is, for example, 15 parts by weight or less, or 10 parts by weight or less, 7 parts by weight or less, 5 parts by weight or less, less than 5 parts by weight, 4 parts by weight or less, 3 parts by weight or less, or even 2 parts by weight or less.

<1-2-d.添加劑> 黏著劑組成物(I)亦可更包含有上述以外之材料。該材料之例為添加劑。添加劑之例為:交聯劑、矽烷耦合劑、顏料及染料等著色劑、紫外線吸收劑、界面活性劑、塑化劑、賦黏劑、表面潤滑劑、調平劑、重工提升劑、軟化劑、聚合抑制劑、防鏽劑、無機充填材、有機充填材、金屬粉等之粉體、粒子及箔狀物。相對於聚合物(A)100重量份,添加劑可在合計例如10重量份以下、宜為5重量份以下、較宜為3重量份以下之範圍內摻混。<1-2-d. Additives> The adhesive composition (I) may also contain materials other than those described above. Examples of such materials are additives. Examples of additives include: crosslinking agents, silane coupling agents, colorants such as pigments and dyes, ultraviolet absorbers, surfactants, plasticizers, tackifiers, surface lubricants, leveling agents, refining agents, softeners, polymerization inhibitors, rust inhibitors, inorganic fillers, organic fillers, metal powders, and other powders, particles, and foils. The additives may be mixed in a total of, for example, less than 10 parts by weight, preferably less than 5 parts by weight, and more preferably less than 3 parts by weight, relative to 100 parts by weight of polymer (A).

交聯劑之例為有機系交聯劑及多官能性金屬螯合物。有機系交聯劑之例為異氰酸酯系交聯劑、過氧化物系交聯劑、環氧系交聯劑及亞胺系交聯劑。有機系交聯劑及多官能性金屬螯合物亦可對溶劑型及活性能量線硬化型中之任一類型黏著劑組成物(I)使用。黏著劑組成物(I)為溶劑型時,交聯劑宜為過氧化物系交聯劑、異氰酸酯系交聯劑。亦可併用過氧化物系交聯劑與異氰酸酯系交聯劑。黏著劑組成物(I)可包含有異氰酸酯系交聯劑,可包含有過氧化物系交聯劑,亦可包含有異氰酸酯系交聯劑及過氧化物系交聯劑兩者。Examples of crosslinking agents include organic crosslinking agents and multifunctional metal chelates. Examples of organic crosslinking agents include isocyanate-based crosslinking agents, peroxide-based crosslinking agents, epoxy-based crosslinking agents, and imine-based crosslinking agents. Organic crosslinking agents and multifunctional metal chelates can also be used with any type of adhesive composition (I) in solvent-based and active energy line-curing types. When adhesive composition (I) is solvent-based, the crosslinking agent should preferably be a peroxide-based crosslinking agent or an isocyanate-based crosslinking agent. Peroxide-based crosslinking agents and isocyanate-based crosslinking agents can also be used together. The adhesive composition (I) may contain an isocyanate crosslinker, a peroxide crosslinker, or both an isocyanate crosslinker and a peroxide crosslinker.

異氰酸酯系交聯劑之例為:二異氰酸甲苯酯、氯伸苯基二異氰酸酯、二苯甲烷二異氰酸酯、二甲苯二異氰酸酯及聚亞甲基聚苯基異氰酸酯等芳香族異氰酸酯化合物;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、經氫化之二苯甲烷二異氰酸酯及異佛酮二異氰酸酯等脂環族異氰酸酯化合物;伸丁基二異氰酸酯、四亞甲基二異氰酸酯及六亞甲基二異氰酸酯等脂肪族異氰酸酯化合物。異氰酸酯系交聯劑亦可為:將上述異氰酸酯化合物加成至三羥甲丙烷等多元醇化合物而成之化合物(加成物);使上述異氰酸酯化合物與聚醚多元醇、聚酯多元醇、丙烯酸多元醇、聚丁二烯多元醇及聚異戊二烯多元醇等多元醇進行加成反應而成之化合物;三聚異氰酸酯化物等上述異氰酸酯化合物的衍生物。衍生物之具體例為:三羥甲丙烷/二異氰酸甲苯酯三聚物加成物(例如東曹(Tosoh)公司製Coronate L)、三羥甲丙烷/六亞甲基二異氰酸酯三聚物加成物(例如東曹(Tosoh)公司製Coronate HL)、六亞甲基二異氰酸酯之三聚異氰酸酯體(例如東曹(Tosoh)公司製Coronate HX)。Examples of isocyanate crosslinking agents include: aromatic isocyanate compounds such as toluene diisocyanate, chlorophenyl diisocyanate, diphenylmethane diisocyanate, xylene diisocyanate, and polymethylene polyphenyl isocyanate; alicyclic isocyanate compounds such as pentoamyl diisocyanate, pentohexyl diisocyanate, hydrogenated diphenylmethane diisocyanate, and isoflavone diisocyanate; and aliphatic isocyanate compounds such as pentobutyl diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate. The isocyanate crosslinking agent can also be: a compound formed by adding the above-mentioned isocyanate compound to a polyol compound such as trihydroxypropane (adduct); a compound formed by reacting the above-mentioned isocyanate compound with polyether polyol, polyester polyol, acrylic polyol, polybutadiene polyol, and polyisoprene polyol; or a derivative of the above-mentioned isocyanate compound such as a trimerocyanate. Specific examples of derivatives are: trihydroxypropane/toluene diisocyanate trimer adduct (e.g., Coronate L manufactured by Tosoh), trihydroxypropane/hexamethylene diisocyanate trimer adduct (e.g., Coronate HL manufactured by Tosoh), and a trimerocyanate of hexamethylene diisocyanate (e.g., Coronate HX manufactured by Tosoh).

黏著劑組成物(I)包含異氰酸酯系交聯劑時,相對於聚合物(A)100重量份,異氰酸酯系交聯劑之摻混量例如為0.1~10重量份,亦可為0.2~5重量份、0.25~3重量份、0.3~1重量份,更可為0.3~0.5重量份。When the adhesive composition (I) contains an isocyanate-based crosslinker, the amount of the isocyanate-based crosslinker mixed with 100 parts by weight of polymer (A) is, for example, 0.1 to 10 parts by weight, or 0.2 to 5 parts by weight, 0.25 to 3 parts by weight, 0.3 to 1 part by weight, or even 0.3 to 0.5 parts by weight.

過氧化物系交聯劑之例為:二(2-乙基己基)過氧二碳酸酯、二(4-三級丁基環己基)過氧二碳酸酯、過氧二碳酸二-二級丁酯、過氧化新癸酸三級丁酯、過氧化三甲基乙酸三級己酯、過氧化三甲基乙酸三級丁酯、二月桂醯基過氧化物、二正辛醯基過氧化物、1,1,3,3-四甲基丁基過氧基-2-乙基己酸酯、二(4-甲基苯甲醯基)過氧化物、苯甲醯基過氧化物、過氧化異丁酸三級丁酯、1,1-二(三級己基過氧基)環己烷。由交聯反應效率優異之觀點來看,過氧化物系交聯劑亦可為苯甲醯基過氧化物。Examples of peroxide-based crosslinkers include: di(2-ethylhexyl)peroxydicarbonate, di(4-trimethylbutylcyclohexyl)peroxydicarbonate, di-dibutyl peroxydicarbonate, tributyl neodecanoate peroxide, trihexyl peroxytrimethylacetate, tributyl peroxytrimethylacetate, dilauryl peroxide, di-n-octyl peroxide, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, di(4-methylbenzoyl)peroxide, benzoyl peroxide, tributyl peroxyisobutyrate, and 1,1-di(trimethylhexylperoxy)cyclohexane. Considering the excellent crosslinking efficiency, benzoyl peroxide can also be used as a peroxide-based crosslinker.

黏著劑組成物(I)包含過氧化物系交聯劑時,相對於聚合物(A)100重量份,過氧化物系交聯劑之摻混量例如為0.005~5重量份,亦可為0.01~3重量份、0.05~2重量份、0.07~1重量份、0.07~0.5重量份、0.07~0.3重量份,更可為0.07~0.2重量份。When the adhesive composition (I) contains a peroxide-based crosslinker, the amount of the peroxide-based crosslinker mixed with 100 parts by weight of polymer (A) is, for example, 0.005 to 5 parts by weight, or 0.01 to 3 parts by weight, 0.05 to 2 parts by weight, 0.07 to 1 part by weight, 0.07 to 0.5 parts by weight, 0.07 to 0.3 parts by weight, or even 0.07 to 0.2 parts by weight.

矽烷耦合劑之例為:3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、2-(3-4-環氧環己基)乙基三甲氧基矽烷等含環氧基之矽烷耦合劑;3-胺丙基三甲氧基矽烷、N-2-(胺乙基)-3-胺丙基甲基二甲氧基矽烷、3-三乙氧基矽基-N-(1,3-二甲基亞丁基)丙胺、N-苯基-γ-胺丙基三甲氧基矽烷等含胺基之矽烷耦合劑;3-丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧丙基三乙氧基矽烷等含(甲基)丙烯醯基之矽烷耦合劑;3-異氰酸酯丙基三乙氧基矽烷等含異氰酸酯基之矽烷耦合劑。Examples of silane coupling agents include: 3-epoxypropoxypropyltrimethoxysilane, 3-epoxypropoxypropyltriethoxysilane, 3-epoxypropoxypropylmethyldiethoxysilane, 2-(3-4-epoxycyclohexyl)ethyltrimethoxysilane, and other epoxy-containing silane coupling agents; 3-aminopropyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, 3 -Triethoxysilyl-N-(1,3-dimethylbutylene)propylamine, N-phenyl-γ-aminopropyltrimethoxysilane and other silane coupling agents containing amino groups; 3-propenyloxypropyltrimethoxysilane, 3-methpropenyloxypropyltriethoxysilane and other silane coupling agents containing (meth)propenyl groups; 3-isocyanate propyltriethoxysilane and other silane coupling agents containing isocyanate groups.

黏著劑組成物(I)包含矽烷耦合劑時,相對於聚合物(A)100重量份,矽烷耦合劑之摻混量例如為5重量份以下,亦可為3重量份以下、1重量份以下、0.5重量份以下、0.2重量份以下、0.1重量份以下,更可為0.05重量份以下。黏著劑組成物(I)亦可不含矽烷耦合劑。When the adhesive composition (I) contains a silane coupling agent, the amount of silane coupling agent mixed with 100 parts by weight of polymer (A) is, for example, 5 parts by weight or less, or 3 parts by weight or less, 1 part by weight or less, 0.5 parts by weight or less, 0.2 parts by weight or less, 0.1 parts by weight or less, and even 0.05 parts by weight or less. The adhesive composition (I) may also be free of silane coupling agent.

黏著劑組成物(I)之類型例如為乳膠型、溶劑型(溶液型)、活性能量線硬化型(光硬化型)、熱熔融型(熱熔型)等。由可形成耐久性優異之黏著片之觀點來看,黏著劑組成物(I)可為溶劑型或活性能量線硬化型,亦可為溶劑型。溶劑型黏著劑組成物(I)亦可不含紫外線硬化劑等光硬化劑。The types of adhesive composition (I) include, for example, latex type, solvent type (solution type), active energy line curing type (photocuring type), and thermosetting type (thermosetting type). From the viewpoint of forming adhesive sheets with excellent durability, adhesive composition (I) can be solvent type or active energy line curing type, or it can be solvent type. Solvent type adhesive composition (I) may also not contain photocuring agents such as UV curing agents.

<1-2-e.表面電阻率> 黏著片1之表面電阻率可為1.0×1013Ω/□以下,亦可為1.0×1012Ω/□以下、1.0×1011Ω/□以下、1.0×1010Ω/□以下、1.0×109Ω/□以下、8.0×108Ω/□以下、5.0×108Ω/□以下、3.0×108Ω/□以下、2.0×108Ω/□以下、1.0×108Ω/□以下、8.0×107Ω/□以下、5.0×107Ω/□以下,更可為2.0×107Ω/□以下。表面電阻率的下限例如為1.0×106Ω/□以上,亦可為1.0×107Ω/□以上,更可為1.0×108Ω/□以上。黏著片1可在DIN試驗前之時間點具有在上述範圍內之表面電阻率,亦可在DIN試驗後之時間點具有在上述範圍內之表面電阻率。<1-2-e. Surface Resistivity> The surface resistivity of the adhesive sheet 1 may be less than 1.0×10 13 Ω/□, or less than 1.0×10 12 Ω/□, less than 1.0×10 11 Ω/□, less than 1.0×10 10 Ω/□, less than 1.0×10 9 Ω/□, less than 8.0×10 8 Ω/□, less than 5.0×10 8 Ω/□, less than 3.0×10 8 Ω/□, less than 2.0×10 8 Ω/□, less than 1.0×10 8 Ω/□, less than 8.0×10 7 Ω/□, less than 5.0×10 7 Ω/□, and even less than 2.0×10 7 Ω/□. The lower limit of the surface resistivity is, for example, 1.0 × 10⁶ Ω/□ or higher, or 1.0 × 10⁷ Ω/□ or higher, or even 1.0 × 10⁸ Ω/□ or higher. The adhesive sheet 1 can have a surface resistivity within the above range at a time point before the DIN test, and can also have a surface resistivity within the above range at a time point after the DIN test.

≪1-3.光學薄膜≫ 光學薄膜3例如包含選自於由偏光薄膜及相位差薄膜所構成群組中之至少1者。光學薄膜3亦可包含有偏光薄膜。光學薄膜3亦可為包含偏光薄膜及/或相位差薄膜之積層薄膜。光學薄膜3亦可包含有玻璃製薄膜。≪1-3. Optical Thin Film≫ The optical thin film 3 may include, for example, at least one selected from the group consisting of polarizing thin films and retardation thin films. The optical thin film 3 may also include a polarizing thin film. The optical thin film 3 may also be a laminated thin film including a polarizing thin film and/or a retardation thin film. The optical thin film 3 may also include a glass thin film.

<1-3-a.偏光薄膜> 偏光薄膜包含偏光件。偏光薄膜包含偏光件與配置於偏光件之至少單面的保護薄膜(透明保護薄膜)。保護薄膜通常係配置成與偏光件之主面相接。偏光件亦可配置於2片保護薄膜之間。保護薄膜亦可配置於偏光件之兩面各面上。保護薄膜可為單層亦可為2層以上之層的積層體。<1-3-a. Polarizing Film> A polarizing film includes a polarizing element. A polarizing film includes a polarizing element and a protective film (transparent protective film) disposed on at least one side of the polarizing element. The protective film is typically disposed in contact with the main surface of the polarizing element. The polarizing element may also be disposed between two protective films. The protective film may also be disposed on both sides of the polarizing element. The protective film may be a single layer or a laminate of two or more layers.

關於偏光件,無特別限定,可舉例如使聚乙烯醇系薄膜、部分縮甲醛化聚乙烯醇系薄膜、乙烯-乙酸乙烯酯共聚物系部分皂化薄膜等親水性高分子薄膜吸附碘、二色性染料等二色性物質並進行單軸延伸而得者;聚乙烯醇之脫水處理物、聚氯乙烯之脫鹽酸處理物等多烯系定向薄膜等。偏光件典型上係由聚乙烯醇系薄膜(聚乙烯醇系薄膜中包含乙烯/乙酸乙烯酯共聚物系部分皂化薄膜)及碘等二色性物質構成。Regarding polarizing elements, there are no particular limitations. Examples include hydrophilic polymer films such as polyvinyl alcohol (PVA) films, partially formaldehyde-modified PVA films, and partially saponified ethylene-vinyl acetate copolymer films, which are obtained by adsorbing dichroic substances such as iodine and dichroic dyes and then uniaxially extending them; and polyene-based oriented films such as dehydrated PVA products and dehydrochlorinated polyvinyl chloride products. Polarizing elements are typically composed of PVA films (including partially saponified ethylene/vinyl acetate copolymer films) and dichroic substances such as iodine.

偏光件之厚度無特別限定,例如為80µm以下,亦可為50µm以下、30µm以下、25µm以下,更可為20µm以下。偏光件之厚度的下限無特別限定,例如為1µm以上,亦可為5µm以上、10µm以上,更可為15µm以上。薄型偏光件(例如厚度20µm以下)之尺寸變化受到抑制,而可有助於提升光學積層體之耐久性、尤其是高溫下之耐久性。There is no particular limitation on the thickness of the polarizing element; for example, it can be less than 80µm, or less than 50µm, 30µm, or 25µm, or even less than 20µm. There is also no particular limitation on the lower limit of the polarizing element's thickness; for example, it can be greater than 1µm, or greater than 5µm, 10µm, or even greater than 15µm. Suppressing dimensional variations in thin polarizing elements (e.g., less than 20µm thick) can help improve the durability of optical laminates, especially their durability at high temperatures.

關於保護薄膜之材料,可使用例如透明性、機械性強度、熱穩定性、水分阻隔性、各向同性等優異之熱塑性樹脂。關於所述熱塑性樹脂之具體例,可列舉:三醋酸纖維素等之纖維素樹脂、聚酯樹脂、聚醚碸樹脂、聚碸樹脂、聚碳酸酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚烯烴樹脂、(甲基)丙烯酸樹脂、環狀聚烯烴樹脂(降𦯉烯系樹脂)、聚芳酯樹脂、聚苯乙烯樹脂、聚乙烯醇樹脂及該等之混合物。保護薄膜之材料亦可為(甲基)丙烯酸系、胺甲酸酯系、丙烯酸胺甲酸酯系、環氧系、聚矽氧系等熱硬化性樹脂或紫外線硬化型樹脂。偏光薄膜具有2片保護薄膜時,2片保護薄膜之材料可彼此相同,亦可互異。例如,亦可對偏光件之一主面透過接著劑貼合有以熱塑性樹脂構成之保護薄膜,且對偏光件之另一主面貼合有以熱硬化性樹脂或紫外線硬化型樹脂構成之保護薄膜。保護薄膜亦可包含有1種以上任意之添加劑。關於添加劑,可舉例如紫外線吸收劑、抗氧化劑、滑劑、塑化劑、脫模劑、抗著色劑、阻燃劑、成核劑、抗靜電劑、顏料、著色劑等。Regarding the material for the protective film, thermoplastic resins with excellent properties such as transparency, mechanical strength, thermal stability, moisture barrier properties, and isotropy can be used. Specific examples of such thermoplastic resins include: cellulose resins such as triacetate cellulose, polyester resins, polyether ether resins, polyether ether resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, (meth)acrylate resins, cyclic polyolefin resins (norphine resins), polyarylate resins, polystyrene resins, polyvinyl alcohol resins, and mixtures thereof. The protective film can also be made of thermosetting resins or UV-curing resins such as (meth)acrylic, carbamate, acrylate, epoxy, and polysiloxane. When the polarizing film has two protective films, the materials of the two protective films can be the same or different. For example, a protective film made of thermoplastic resin can be laminated to one main surface of the polarizer with an adhesive, and a protective film made of thermosetting or UV-curing resin can be laminated to the other main surface of the polarizer. The protective film may also contain one or more additives. Additives include, for example, UV absorbers, antioxidants, lubricants, plasticizers, mold release agents, anti-coloring agents, flame retardants, nucleating agents, antistatic agents, pigments, and colorants.

保護薄膜之透濕度無特別限定,可為200g/(m2・day)以下,亦可為50g/(m2・day)以下。此時,可抑制空氣中之水分侵入偏光薄膜之內部,而可抑制偏光薄膜之水分率的變化。藉此,可抑制偏光薄膜發生捲曲或尺寸變化。又,透濕度經限制在上述範圍內的保護薄膜配置於黏著片1與偏光件之間時,可有助於阻礙自由基在高溫下從黏著片1移動。關於形成透濕度低之保護薄膜的材料,可列舉例如:聚酯系聚合物、聚碳酸酯系聚合物、芳酯系聚合物、醯胺系聚合物、烯烴系聚合物、環狀烯烴系聚合物、(甲基)丙烯酸系聚合物及該等之混合物。The moisture permeability of the protective film is not particularly limited, and can be below 200 g/( ·day) or below 50 g/( ·day). This inhibits the intrusion of moisture from the air into the polarizing film, thus suppressing changes in the moisture content of the polarizing film. This, in turn, prevents the polarizing film from warping or changing in size. Furthermore, when a protective film with moisture permeability limited to the above range is disposed between the adhesive sheet 1 and the polarizing element, it helps to prevent free radicals from migrating from the adhesive sheet 1 at high temperatures. Materials used to form a protective film with low moisture permeability include, for example, polyester polymers, polycarbonate polymers, aryl ester polymers, amide polymers, olefin polymers, cyclic olefin polymers, (meth)acrylic polymers, and mixtures thereof.

保護薄膜之透濕度可依循JIS Z0208:1976之透濕度試驗(透濕杯法),藉由以下方法來測定。首先,將保護薄膜切斷成直徑60mm,準備出測定試樣。接著,將測定試樣安裝於配置有約15g之氯化鈣的透濕杯中。將該透濕杯配置在設定成溫度40℃、濕度92%RH之恆溫機中,放置24小時,藉此進行透濕度試驗。藉由測定氯化鈣在試驗前後之重量的增加量,可鑑定出保護薄膜之透濕度。The moisture permeability of the protective film can be determined according to the moisture permeability test (permeability cup method) in JIS Z0208:1976, using the following method: First, cut the protective film into 60mm diameter pieces to prepare the test sample. Next, place the test sample in a permeability cup containing approximately 15g of calcium chloride. Place the permeability cup in a constant temperature chamber set at 40°C and 92%RH for 24 hours to conduct the moisture permeability test. By measuring the increase in the weight of calcium chloride before and after the test, the moisture permeability of the protective film can be determined.

保護薄膜之厚度可適當決定,惟一般由強度及操作性等作業性、薄膜性等方面來看,為10~200μm左右。The thickness of the protective film can be appropriately determined, but generally it is around 10~200μm, depending on factors such as strength, operability, and film properties.

偏光件與保護薄膜通常係透過水系接著劑密著在一起。關於水系接著劑,可例示異氰酸酯系接著劑、聚乙烯醇系接著劑、明膠系接著劑、乙烯基系乳膠、水系聚胺甲酸酯、水系聚酯等。關於上述接著劑以外之其他接著劑,可舉紫外線硬化型接著劑、電子束硬化型接著劑等。電子束硬化型偏光板用接著劑係對各種保護薄膜展現適宜之接著性。接著劑亦可包含有金屬化合物填料。Polarizing components and protective films are typically bonded together using water-based adhesives. Examples of water-based adhesives include isocyanate-based adhesives, polyvinyl alcohol-based adhesives, gelatin-based adhesives, vinyl latex, water-based polyurethane, and water-based polyester. Other adhesives besides those mentioned above include UV-curing adhesives and electron beam-curing adhesives. Electron beam-curing adhesives for polarizing plates exhibit suitable adhesion to various protective films. Adhesives may also contain metallic compound fillers.

偏光薄膜中,亦可於偏光件上形成相位差薄膜等來取代保護薄膜。保護薄膜上亦可進行進一步設置其他保護薄膜、設置相位差薄膜等之操作等。In polarizing films, phase retardation films or the like can be formed on the polarizing element to replace the protective film. Further operations such as setting other protective films or phase retardation films can also be performed on the protective film.

偏光薄膜可特定為包含偏光件且所含之各層藉由接著劑互相接合之積層體。A polarizing film can be specifically defined as a laminate containing a polarizing element and wherein the layers therein are bonded together by an adhesive.

關於保護薄膜,可於與偏光件接著之表面相對向之表面設置有硬塗層,亦可施行以抗反射、抗黏、擴散、防眩等為目的之處理。Regarding the protective film, a hard coating can be applied to the surface opposite to the surface that is in contact with the polarizer, or treatments can be performed for purposes such as anti-reflection, anti-adhesion, diffusion, and anti-glare.

偏光薄膜亦可為圓偏光薄膜。Polarizing films can also be circularly polarized films.

偏光薄膜藉由以下試驗法評估之捲曲直徑可為3mm以上,亦可為4mm以上、5mm以上、5.5mm以上、6mm以上、6.5mm以上、7mm以上,更可為7.5mm以上。捲曲直徑愈大,表示為因熱所致之捲曲發生愈有獲得抑制之偏光薄膜。又,捲曲直徑大之偏光薄膜之使用,例如在於偏光薄膜上形成抗靜電層2時適於一邊抑制捲曲一邊提高形成時之加熱溫度。 <試驗法> 準備一試驗片52,該試驗片52係以偏光件之吸收軸為長邊方向,並將偏光薄膜51加工成寬10mm×長50mm之長方形者。接著,將試驗片52之長邊方向之一端部53a固定於評估用片材54之表面(參照圖3(a))。為了使試驗片52之另一端部53b因加熱而往上捲曲,固定係選擇試驗片52在固定時之上表面來實施。固定可使用黏著膠帶56,但只要端部53a在試驗中不會從評估用片材54剝落,則無限定固定法。黏著膠帶56之例為聚醯亞胺膠帶。接著,將整體以105℃及12小時加熱,使試驗片52從試驗片52之長邊方向之另一端部53b捲曲。求出試驗片52因捲曲而形成之圓筒部分55之內徑作為捲曲直徑(參照圖3(b))。The curl diameter of the polarizing film, evaluated by the following test method, can be 3 mm or more, or 4 mm or more, 5 mm or more, 5.5 mm or more, 6 mm or more, 6.5 mm or more, 7 mm or more, and even 7.5 mm or more. The larger the curl diameter, the better the polarizing film suppresses curling caused by heat. Furthermore, the use of polarizing films with large curl diameters, for example, when forming an antistatic layer 2 on the polarizing film, is suitable for suppressing curling while increasing the heating temperature during formation. <Test Method> Prepare a test piece 52, which is a rectangle with the absorption axis of the polarizing element as its long side, and the polarizing film 51 is processed into a rectangle with a width of 10 mm and a length of 50 mm. Next, one end 53a of the test piece 52 along its long side is fixed to the surface of the evaluation sheet 54 (see Figure 3(a)). To ensure that the other end 53b of the test piece 52 curls upwards due to heating, the fixing is performed on the upper surface of the test piece 52 during fixing. Adhesive tape 56 can be used for fixing, but the fixing method is not limited as long as end 53a does not peel off from the evaluation sheet 54 during the test. An example of adhesive tape 56 is polyimide tape. Next, the entire assembly is heated to 105°C for 12 hours, causing the test piece 52 to curl from the other end 53b along its long side. The inner diameter of the cylindrical portion 55 formed by the curling of the test piece 52 is determined as the curling diameter (see Figure 3(b)).

試驗片52捲曲之程度可能會依偏光薄膜51固有之熱特性而改變。偏光薄膜51固有之熱特性會依偏光薄膜51之層結構、偏光薄膜51所具有之各層之構成、厚度及組成等而改變。固有之熱特性之一例為以下記載之加熱時之彎曲力矩M。The degree of curling of the test piece 52 may vary depending on the inherent thermal properties of the polarizing film 51. The inherent thermal properties of the polarizing film 51 vary depending on the layer structure of the polarizing film 51, the composition, thickness, and arrangement of each layer of the polarizing film 51. One example of the inherent thermal properties is the bending moment M during heating, as described below.

評估用片材54可使用即便藉由105℃及12小時之加熱,仍不會發生阻礙捲曲直徑之評估之程度的彎曲等變形的片材,評估用片材54之一例為厚度5mm之聚苯乙烯片材。The evaluation sheet 54 can be a sheet that, even when heated to 105°C for 12 hours, will not undergo bending or other deformation that would hinder the evaluation of the curl diameter. One example of the evaluation sheet 54 is a 5mm thick polystyrene sheet.

偏光薄膜之彎曲力矩M的絕對值可小於1×109,亦可為1×108以下、5×107以下、1×107以下、8×106以下、5×106以下、4×106以下,更可為3×106以下。彎曲力矩M小之偏光薄膜之使用,例如在於偏光薄膜上形成抗靜電層2時適於一邊抑制捲曲一邊提高形成時之加熱溫度。The absolute value of the bending moment M of the polarizing film can be less than 1× 10⁹ , or less than 1× 10⁸ , 5× 10⁷ , 1× 10⁷ , 8× 10⁶ , 5× 10⁶ , 4× 10⁶ , and even less than 3× 10⁶ . The use of polarizing films with small bending moments M is suitable, for example, when forming an antistatic layer 2 on a polarizing film, as it helps to suppress curling while increasing the heating temperature during formation.

關於彎曲力矩M之計算法,一邊參照圖4一邊進行說明。圖4為顯示偏光薄膜51之一例的剖面圖。圖4之偏光薄膜51具有藉由一對透明保護薄膜62、63夾持偏光件61之結構。偏光件61係由PVA構成,且厚度為22µm。透明保護薄膜62係由三醋酸纖維素(TAC)構成,且厚度為40µm。透明保護薄膜63係由丙烯酸系樹脂構成,且厚度為20µm。符號51C係偏光薄膜51中位於厚度方向之中心的假想面(以下為中心面51C)。符號61C、62C、63C分別係各層中位於厚度方向之中心的假想面(以下記載為中心面61C、62C、63C)。The calculation method for the bending moment M will be explained with reference to Figure 4. Figure 4 is a cross-sectional view showing an example of the polarizing film 51. The polarizing film 51 in Figure 4 has a structure in which the polarizing element 61 is clamped by a pair of transparent protective films 62 and 63. The polarizing element 61 is made of PVA and has a thickness of 22µm. The transparent protective film 62 is made of triacetate cellulose (TAC) and has a thickness of 40µm. The transparent protective film 63 is made of acrylic resin and has a thickness of 20µm. Symbol 51C is an imaginary surface located at the center in the thickness direction of the polarizing film 51 (hereinafter referred to as center surface 51C). Symbols 61C, 62C, and 63C are respectively imaginary surfaces located at the center in the thickness direction of each layer (hereinafter referred to as center surfaces 61C, 62C, and 63C).

針對偏光薄膜51所含之各層,可鑑定加熱時之膨脹力P(P61、P62、P63)。偏光件以外之層的膨脹力P係藉由式:EtαΔT來定義。偏光件之膨脹力P係藉由:EtβΔT來定義。E係各層在23℃下之儲存彈性模數E(單位:MPa),t係各層之厚度(單位:µm),α係各層之熱膨脹係數(單位:/℃),ΔT係從加熱時之室溫(23℃)起算之溫度差(單位:℃),β係偏光件因加熱(105℃及500小時)所致之尺寸變化率(單位:%)。儲存彈性模數E係藉由拉伸試驗求得之值。拉伸試驗係對製成啞鈴形狀之試驗片以拉伸速度300mm/分鐘來實施。偏光件61之E係設為針對慢軸方向之值。熱膨脹係數α係設為藉由熱機械分析(TMA)求得之值。TMA係將測定溫度設為-40~85℃、將試樣尺寸設為5mm寬、並將夾具間距離設為20mm來實施。ΔT係考慮形成抗靜電層2時之加熱溫度而設為67(=90-23)℃。此外,偏光件61通常會因加熱而在慢軸方向上收縮,因此β及膨脹力P61通常會成為負值。For each layer of the polarizing film 51, the expansion forces P ( P61 , P62 , P63 ) during heating can be determined. The expansion force P of the layers other than the polarizing element is defined by the formula: EtαΔT. The expansion force P of the polarizing element is defined by: EtβΔT. E is the storage elastic modulus E of each layer at 23°C (unit: MPa), t is the thickness of each layer (unit: µm), α is the coefficient of thermal expansion of each layer (unit: /°C), ΔT is the temperature difference from the room temperature (23°C) during heating (unit:°C), and β is the dimensional change rate of the polarizing element due to heating (105°C and 500 hours) (unit: %). The storage modulus of elasticity E is a value obtained through a tensile test. The tensile test is performed on a dumbbell-shaped test piece at a tensile speed of 300 mm/min. The value of E for the polarizer 61 is set to the slow axis direction. The coefficient of thermal expansion α is a value obtained through thermomechanical analysis (TMA). TMA is performed with the measurement temperature set to -40~85℃, the sample size set to 5 mm wide, and the fixture spacing set to 20 mm. ΔT is set to 67 (=90-23)℃, taking into account the heating temperature during the formation of the antistatic layer 2. In addition, the polarizer 61 usually shrinks in the slow axis direction due to heating, so β and the expansion force P 61 are usually negative values.

偏光件之尺寸變化率β可藉由試驗片在加熱試驗前後之尺寸變化來鑑定,該加熱試驗係將附黏著劑層之偏光件加工成10cm×10cm尺寸而得試驗片後將所得試驗片貼合於玻璃板上,並容置在保持於105℃之烘箱中500小時之試驗。惟,試驗片之一邊延伸之方向係設為偏光件之吸收軸方向。尺寸變化率β係藉由式:尺寸變化率β= (Wmin-10)/10×100(%)來計算。Wmin係試驗片在加熱試驗後變得最短之邊的長度。附黏著劑層之偏光件可依以下方式準備。 ※於具備攪拌葉片、溫度計、氮氣導入管及冷卻器之四口燒瓶中,饋入含有丙烯酸丁酯99重量份及丙烯酸4-羥丁酯1重量份之單體混合物。接著,相對於單體混合物100重量份,將作為聚合引發劑之2,2'-偶氮雙異丁腈0.1重量份與乙酸乙酯100重量份一同饋入。接著,一邊緩慢地攪拌整體一邊導入氮氣進行氮置換,並將燒瓶內之液溫保持在55℃附近使其進行8小時聚合反應,而調製出丙烯酸系聚合物之溶液。丙烯酸系聚合物之重量平均分子量設為180萬左右。接下來,相對於調製出之溶液的固體成分100重量份,摻混三羥甲丙烷/二異氰酸伸茬酯加成物(例如東曹(Tosoh)製TAKENATE D110N)0.03重量份、苯甲醯基過氧化物0.3重量份及含環氧基之矽烷耦合劑(例如信越化學工業製KBM-403)0.2重量份,而調製出黏著劑組成物。接著,使調製出之黏著劑組成物之塗佈膜在155℃下乾燥1分鐘,來製作厚度20µm之黏著劑層。將偏光件與製出之黏著劑層接合,而獲得附黏著劑層之偏光薄膜。The dimensional change rate β of the polarizer can be determined by the dimensional change of the test piece before and after a heating test. This heating test involves processing the polarizer with the adhesive layer into a 10cm × 10cm test piece, attaching the test piece to a glass plate, and placing it in an oven maintained at 105°C for 500 hours. However, the direction of one side of the test piece is set to the absorption axis direction of the polarizer. The dimensional change rate β is calculated using the formula: Dimensional Change Rate β = (W min - 10) / 10 × 100 (%). W min is the length of the shortest side of the test piece after the heating test. The polarizer with the adhesive layer can be prepared as follows. * In a four-necked flask equipped with a stirrer, thermometer, nitrogen inlet, and cooler, a monomer mixture containing 99 parts by weight of butyl acrylate and 1 part by weight of 4-hydroxybutyl acrylate was added. Next, relative to 100 parts by weight of the monomer mixture, 0.1 parts by weight of 2,2'-azobisisobutyronitrile (2,2'-azobisisobutyronitrile) as a polymerization initiator and 100 parts by weight of ethyl acetate were added. Then, while slowly stirring the mixture, nitrogen was introduced for nitrogen replacement, and the liquid temperature in the flask was maintained at approximately 55°C for 8 hours to allow the polymerization reaction to proceed, thus preparing a solution of the acrylic polymer. The weight-average molecular weight of the acrylic polymer was set to approximately 1.8 million. Next, relative to 100 parts by weight of the solid component of the prepared solution, 0.03 parts by weight of trihydroxypropyl propane/diisocyanate adduct (e.g., TAKENATE D110N manufactured by Tosoh), 0.3 parts by weight of benzoyl peroxide, and 0.2 parts by weight of epoxy-containing silane coupling agent (e.g., KBM-403 manufactured by Shin-Etsu Chemical Industry Co., Ltd.) were mixed in to prepare an adhesive composition. Then, the prepared adhesive composition coating was dried at 155°C for 1 minute to prepare an adhesive layer with a thickness of 20µm. The polarizing element was then bonded to the prepared adhesive layer to obtain a polarizing film with the adhesive layer attached.

又,針對偏光薄膜51所含之各層,可鑑定出從偏光薄膜51之中心面51C至各層之中心面61C、62C、63C為止之距離d(d61、d62、d63)。惟,距離d之單位設為µm,且將從偏光薄膜51之一主面64A朝另一主面64B之方向65設為負來定出距離d之符號。在圖4之例中,距離d62為負,距離d61、d63為正。彎曲力矩M可鑑定為構成偏光薄膜51之各層所示之膨脹力P及d之乘積的總和。圖4之例中,彎曲力矩M=P61×d61+P62×d62+P63×d63Furthermore, for each layer contained in the polarizing film 51, the distances d ( d61 , d62 , d63 ) from the center plane 51C of the polarizing film 51 to the center planes 61C, 62C, and 63C of each layer can be determined. However, the unit of distance d is set to µm, and the direction 65 from one principal plane 64A of the polarizing film 51 to the other principal plane 64B is set as negative to define the sign of distance d. In the example of Figure 4, distance d62 is negative, and distances d61 and d63 are positive. The bending moment M can be determined as the sum of the products of the expansion forces P and d of each layer constituting the polarizing film 51. In the example of Figure 4, the bending moment M = P 61 × d 61 + P 62 × d 62 + P 63 × d 63 .

偏光薄膜51通常具有包含偏光件之多層結構。偏光薄膜51之層結構或構成各層之材料不同時,彎曲力矩M亦可同樣地求出。此外,於硬塗層產生之膨脹力P通常很小,從而在彎曲力矩M之計算中可無視其。The polarizing film 51 typically has a multi-layered structure containing polarizing elements. The bending moment M can be calculated similarly even when the layered structure of the polarizing film 51 or the materials constituting each layer are different. Furthermore, the expansion force P generated in the hard coating layer is usually very small and can therefore be ignored in the calculation of the bending moment M.

<1-3-b.相位差薄膜> 關於相位差膜薄膜,可使用使高分子薄膜延伸而得者或已使液晶材料定向、固定化者。相位差薄膜例如於面內及/或厚度方向上具有雙折射。<1-3-b. Phase Refraction Thin Film> Regarding phase retardation thin films, those obtained by stretching polymer films or those for which liquid crystal materials have been oriented and immobilized can be used. Phase retardation thin films, for example, have birefringence in the in-plane and/or thickness directions.

關於相位差薄膜,可舉抗反射用相位差薄膜(參照日本專利特開2012-133303號公報[0221]、[0222]、[0228])、視角補償用相位差薄膜(參照日本專利特開2012-133303號公報[0225]、[0226])、視角補償用傾斜定向相位差薄膜(參照日本專利特開2012-133303號公報[0227])等。Regarding phase retardation films, examples include anti-reflection phase retardation films (see Japanese Patent Application Publication No. 2012-133303 [0221], [0222], [0228]), view angle compensation phase retardation films (see Japanese Patent Application Publication No. 2012-133303 [0225], [0226]), and view angle compensation tilt-oriented phase retardation films (see Japanese Patent Application Publication No. 2012-133303 [0227]).

關於相位差薄膜,若為實質上具有上述機能者,則例如相位差值、配置角度、3維雙折射率、單層或多層等無特別限制,可使用公知之相位差薄膜。Regarding phase retardation films, if they substantially possess the aforementioned functions, there are no particular restrictions on aspects such as phase difference value, configuration angle, 3D birefringence, single layer or multiple layers, and known phase retardation films can be used.

相位差薄膜之厚度宜為20µm以下,較宜為10µm以下,更宜為1~9µm,尤宜為3~8µm。The thickness of the phase retardation film should preferably be less than 20µm, more preferably less than 10µm, even more preferably 1~9µm, and especially preferably 3~8µm.

相位差薄膜例如係由液晶材料經定向、固定化之1/4波長板、1/2波長板這2層構成。Phase retardation films, for example, are composed of two layers of liquid crystal material, namely a 1/4 wavelength plate and a 1/2 wavelength plate, which are oriented and immobilized.

≪1-4.光學積層體之製法≫ 光學積層體10例如可藉由以下方式來製造:製作由光學薄膜3及抗靜電層2構成之第1積層體L1;製作由基材及黏著片1構成之第2積層體L2;以及,接合第2積層體L2之黏著片1與第1積層體L1之抗靜電層2。惟,光學積層體10之製法不受該例所限。≪1-4. Method for Manufacturing Optical Multilayers≫ The optical multilayer 10 can be manufactured, for example, by: manufacturing a first multilayer L1 consisting of an optical thin film 3 and an antistatic layer 2; manufacturing a second multilayer L2 consisting of a substrate and an adhesive sheet 1; and bonding the adhesive sheet 1 of the second multilayer L2 to the antistatic layer 2 of the first multilayer L1. However, the method for manufacturing the optical multilayer 10 is not limited to this example.

<1-4-a.抗靜電層2及第1積層體L1之製法> 首先,調製導電性粒子之溶液或分散液。溶液或分散液之溶劑之例為水及有機溶劑。有機溶劑亦可為水溶性。溶劑可為單一溶劑亦可為包含2種以上溶劑之混合溶劑。混合溶劑之例為包含水與水溶性有機溶劑之溶劑。水溶性有機溶劑之例為:甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、二級丁醇、三級丁醇、正戊醇、異戊醇、二級戊醇、三級戊醇、1-乙基-1-丙醇、2-甲基-1-丁醇、正己醇、環己醇等醇。水溶性有機溶劑亦可為異丙醇(IPA)。根據本發明人等之檢討,組合導電性粒子與單一溶劑這點,可有助於抑制抗靜電層2中之導電性粒子在DIN試驗前後之狀態的變化。單一溶劑宜為水。<1-4-a. Preparation of Antistatic Layer 2 and First Deposition L1> First, a solution or dispersion of conductive particles is prepared. Examples of solvents for the solution or dispersion are water and organic solvents. The organic solvent may also be water-soluble. The solvent may be a single solvent or a mixture containing two or more solvents. Examples of mixed solvents are solvents containing water and water-soluble organic solvents. Examples of water-soluble organic solvents include: methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, dibutanol, tert-butanol, n-pentanol, isopentanol, dipentanol, tert-pentanol, 1-ethyl-1-propanol, 2-methyl-1-butanol, n-hexanol, cyclohexanol, etc. Water-soluble organic solvents may also be isopropanol (IPA). According to the inventors' review, combining conductive particles with a single solvent helps to suppress changes in the state of the conductive particles in the antistatic layer 2 before and after the DIN test. Water is the preferred single solvent.

接著,將導電性粒子之溶液或分散液作為塗敷液塗佈於光學薄膜3之表面。藉由使所得塗佈膜乾燥,而於光學薄膜3上形成抗靜電層2。藉此,可獲得由光學薄膜3及抗靜電層2構成之第1積層體L1。乾燥時亦可併用加熱。併用加熱時之乾燥溫度例如可為70℃以上、75℃以上、80℃以上、85℃以上、90℃以上、95℃以上、100℃以上、110℃以上、120℃以上,更可為130℃以上。乾燥溫度的上限例如為160℃以下。根據本發明人等之檢討,設為70℃以上、宜為80℃以上、較宜為90℃以上之乾燥溫度這點,可有助於抑制抗靜電層2中之導電性粒子在DIN試驗前後之狀態的變化。另一方面,形成抗靜電層2時之乾燥溫度若變得過高,有容易發生光學積層體2之捲曲之情形。為了抑制捲曲,亦可適當設定乾燥溫度的上限。依光學薄膜3之構成而可能會不同,惟上限例如為160℃以下,亦可為150℃以下、140℃以下、130℃以下、低於130℃、125℃以下、120℃以下、115℃以下,更可為110℃以下。Next, a solution or dispersion of conductive particles is applied as a coating liquid to the surface of the optical thin film 3. By drying the resulting coating film, an antistatic layer 2 is formed on the optical thin film 3. This yields a first laminate L1 consisting of the optical thin film 3 and the antistatic layer 2. Heating can also be used during drying. The drying temperature when heating is used can be, for example, 70°C or higher, 75°C or higher, 80°C or higher, 85°C or higher, 90°C or higher, 95°C or higher, 100°C or higher, 110°C or higher, 120°C or higher, and even 130°C or higher. The upper limit of the drying temperature is, for example, 160°C or lower. Based on the inventors' review, setting a drying temperature above 70°C, preferably above 80°C, and more preferably above 90°C, can help suppress changes in the state of conductive particles in the antistatic layer 2 before and after the DIN test. On the other hand, if the drying temperature during the formation of the antistatic layer 2 becomes too high, the optical laminate 2 may easily curl. To suppress curling, an upper limit for the drying temperature can also be appropriately set. This may vary depending on the composition of the optical thin film 3, but the upper limit is, for example, below 160°C, or below 150°C, below 140°C, below 130°C, below 130°C, below 125°C, below 120°C, below 115°C, and even below 110°C.

著眼於理想之抗靜電層2之製作,本實施形態中揭示了以下所示之製造方法。即,本實施形態中之抗靜電層2之製造方法包含下述步驟:使含導電性粒子與單一溶劑之塗敷液、例如溶液或分散液之塗佈膜乾燥而形成抗靜電層2。關於導電性粒子及單一溶劑之理想態樣之例如同上述。塗佈膜例如可形成於基材之表面上。基材可使用例如脫模薄膜。形成於脫模薄膜上之抗靜電層2例如可轉印至光學薄膜上。基材亦可為光學薄膜。塗敷液亦可包含有導電性粒子以外之其他材料例如黏結劑樹脂。關於黏結劑樹脂之理想態樣之例如同上述。塗敷液可包含調平劑。惟,塗敷液中之調平劑之含有率宜如先前在抗靜電層2之說明中所述之含有率之例示,宜小。塗敷液亦可實質上不含調平劑。塗佈膜之乾燥溫度之理想例如上述。乾燥溫度亦可為70℃以上且低於130℃。With regard to the fabrication of the ideal antistatic layer 2, this embodiment discloses the manufacturing method shown below. That is, the manufacturing method of the antistatic layer 2 in this embodiment includes the following steps: drying a coating film containing conductive particles and a single solvent, such as a solution or dispersion, to form the antistatic layer 2. The ideal state of the conductive particles and the single solvent is, for example, as described above. The coating film can be formed on the surface of a substrate, for example. The substrate can be, for example, a release film. The antistatic layer 2 formed on the release film can, for example, be transferred onto an optical film. The substrate can also be an optical film. The coating liquid can also contain other materials besides conductive particles, such as binder resins. The ideal state of the binder resin is as described above. The coating liquid may contain a leveling agent. However, the leveling agent content in the coating liquid should be low, as exemplified in the description of antistatic layer 2. The coating liquid may also be substantially free of leveling agent. The ideal drying temperature of the coating film is as described above. The drying temperature may also be above 70°C and below 130°C.

又,本實施形態之抗靜電層2之製造方法包含下述步驟:使含導電性粒子之塗敷液的塗佈膜在70℃以上且低於130℃下乾燥而形成抗靜電層2。塗佈膜之理想乾燥溫度如上述。關於導電性粒子之理想態樣之例如同上述。塗佈膜例如可形成於基材之表面上。基材可使用例如脫模薄膜。形成於脫模薄膜上之抗靜電層2例如可轉印至光學薄膜上。基材亦可為光學薄膜。塗敷液亦可包含有導電性粒子以外之其他材料例如黏結劑樹脂。關於黏結劑樹脂之理想態樣之例如同上述。塗敷液可包含調平劑。惟,塗敷液中之調平劑之含有率宜如先前在抗靜電層2之說明中所述之含有率之例示,宜小。塗敷液亦可實質上不含調平劑。塗敷液所包含之溶劑亦可為單一溶劑。關於單一溶劑之理想態樣之例如同上述。Furthermore, the manufacturing method of the antistatic layer 2 of this embodiment includes the following steps: drying a coating film containing a coating liquid with conductive particles at a temperature above 70°C and below 130°C to form the antistatic layer 2. The ideal drying temperature of the coating film is as described above. An example of the ideal state of the conductive particles is as described above. The coating film may be formed on the surface of a substrate, for example. The substrate may be, for example, a release film. The antistatic layer 2 formed on the release film may be transferred, for example, onto an optical film. The substrate may also be an optical film. The coating liquid may also contain other materials besides conductive particles, such as binder resin. An example of the ideal state of the binder resin is as described above. The coating liquid may contain a leveling agent. However, the content of leveling agent in the coating solution should be low, as exemplified in the previous description of antistatic layer 2. The coating solution may also be substantially free of leveling agent. The solvent contained in the coating solution may also be a single solvent. An ideal example of a single solvent is as described above.

本實施形態之光學積層體之製造方法,係製造具備黏著片、抗靜電層及光學薄膜之光學積層體的方法,該製造方法包含藉由上述本實施形態之抗靜電層2之製造方法來形成上述抗靜電層。The method for manufacturing the optical laminate of this embodiment is a method for manufacturing an optical laminate having an adhesive sheet, an antistatic layer and an optical thin film. The manufacturing method includes forming the antistatic layer by the manufacturing method of the antistatic layer 2 of this embodiment.

<1-4-b.第2積層體L2之製法> 黏著片1係由黏著劑組成物(I)形成。黏著片1例如包含(甲基)丙烯酸系聚合物之交聯物。黏著片1係藉由以下方法由黏著劑組成物(I)形成。<1-4-b. Method for manufacturing the second laminate L2> The adhesive sheet 1 is formed from an adhesive composition (I). The adhesive sheet 1 may contain, for example, a crosslinked polymer of (meth)acrylate. The adhesive sheet 1 is formed from the adhesive composition (I) by the following method.

黏著片1例如可藉由以下方式形成:將黏著劑組成物(I)塗佈於基材上而形成塗佈膜;及,將所得塗佈膜乾燥。藉此,可獲得由基材及黏著片1構成之第2積層體L2。The adhesive sheet 1 can be formed, for example, by applying an adhesive composition (I) onto a substrate to form a coating film; and drying the resulting coating film. In this way, a second laminate L2 consisting of a substrate and the adhesive sheet 1 can be obtained.

關於基材,可使用例如脫模薄膜。形成於脫模薄膜上之黏著片1例如可轉印至光學薄膜上。基材亦可為光學薄膜。Regarding the substrate, a release film, for example, can be used. The adhesive sheet 1 formed on the release film can, for example, be transferred onto an optical film. The substrate can also be an optical film.

脫模薄膜可在將黏著片1轉印至抗靜電層2後,作為剝離薄膜使用至黏著片1供於實際使用為止前。此時,可在步驟方面簡略化。The release film can be used as a peeling film after the adhesive sheet 1 is transferred to the antistatic layer 2, until the adhesive sheet 1 is ready for actual use. At this time, the process can be simplified.

關於脫模薄膜之構成材料,可列舉例如:塑膠薄膜;紙、布、不織布等多孔質材料;網狀物、發泡片、金屬箔及該等之層合體等適當的薄片體等等,由表面平滑性優異方面來看,可適宜使用塑膠薄膜。Regarding the constituent materials of release films, examples include: plastic films; porous materials such as paper, cloth, and non-woven fabrics; suitable sheet materials such as meshes, foam sheets, metal foils, and laminates thereof. From the perspective of excellent surface smoothness, plastic films are suitable for use.

關於塑膠薄膜,無特別限定,可列舉例如:聚乙烯薄膜、聚丙烯薄膜、聚丁烯薄膜、聚丁二烯薄膜、聚甲基戊烯薄膜、聚氯乙烯薄膜、氯乙烯共聚物薄膜、聚對苯二甲酸乙二酯薄膜、聚對苯二甲酸丁二酯薄膜、聚胺甲酸酯薄膜、乙烯-乙酸乙烯酯共聚物薄膜等。Regarding plastic films, there are no specific limitations, but examples include: polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polybutylene terephthalate film, polyurethane film, ethylene-vinyl acetate copolymer film, etc.

脫模薄膜之厚度通常為5~200µm,宜為5~100µm左右。脫模薄膜經施行例如聚矽氧系、氟系、長鏈烷基系等脫模劑進行之脫模處理。脫模薄膜亦可經施行使用脂肪酸醯胺系脫模劑、氧化矽粉等進行之脫模處理或防污處理,或者塗佈型、捏合型、蒸鍍型等各種抗靜電處理。The thickness of the release film is typically 5–200 µm, preferably around 5–100 µm. The release film undergoes release treatment using release agents such as polysiloxane, fluorine, or long-chain alkyl compounds. The release film can also undergo release treatment or antifouling treatment using fatty acid amide-based release agents, silica powder, etc., or various antistatic treatments such as coating, kneading, or vapor deposition.

對於基材亦可塗佈含黏著劑組成物(I)之溶液(黏著劑溶液)。黏著劑溶液之固體成分濃度例如為5~50重量%,宜為10~40重量%。黏著劑溶液亦可因應(甲基)丙烯酸系聚合物(A)之聚合形態,將與聚合溶劑相同之溶劑或不同之溶劑適當添加於黏著劑組成物(I)中藉此來調製。A solution containing adhesive component (I) (adhesive solution) can also be applied to the substrate. The solid content concentration of the adhesive solution is, for example, 5-50% by weight, preferably 10-40% by weight. The adhesive solution can also be prepared by appropriately adding the same or different solvents as the polymerization solvent to the adhesive component (I) depending on the polymerization form of the (meth)acrylic polymer (A).

關於將黏著劑組成物(I)塗佈於基材上之方法,可使用各種方法,可利用例如輥塗佈、接觸輥塗佈、凹版塗佈、反向塗佈、輥刷、噴塗佈、浸漬輥塗佈、棒塗佈、刮刀塗佈、氣刀塗佈、簾式塗佈、唇塗佈、使用模塗機等之擠壓式塗佈法等。黏著劑組成物(I)之塗佈量可視目標之黏著片1之厚度來適當調節。Various methods can be used to apply the adhesive composition (I) to the substrate, such as roller coating, contact roller coating, gravure coating, reverse coating, roller brushing, spraying, dip roller coating, rod coating, scraper coating, air knife coating, curtain coating, lip coating, and extrusion coating using a molding machine. The amount of adhesive composition (I) applied can be appropriately adjusted according to the thickness of the target adhesive sheet 1.

藉由乾燥使塗佈膜硬化,而形成黏著片1。塗佈膜之乾燥溫度例如為130℃以下,宜為125℃以下,較宜為120℃以下,更宜為110℃以下,尤宜為100℃以下。塗佈膜之乾燥溫度可為60℃以上,亦可為80℃以上。關於60℃以上之乾燥溫度,例如藉由使異氰酸酯系交聯劑之反應順利進行,可有助於提升黏著片1之凝集力。關於130℃以下之乾燥溫度,例如藉由適當調整異氰酸酯系交聯劑之反應速度,可有助於提升黏著片1之透明性。The coating film is hardened by drying, forming adhesive sheet 1. The drying temperature of the coating film is, for example, below 130°C, preferably below 125°C, more preferably below 120°C, even more preferably below 110°C, and especially preferably below 100°C. The drying temperature of the coating film can be above 60°C or above 80°C. Regarding drying temperatures above 60°C, for example, by ensuring the smooth reaction of the isocyanate-based crosslinker, the cohesive force of adhesive sheet 1 can be improved. Regarding drying temperatures below 130°C, for example, by appropriately adjusting the reaction rate of the isocyanate-based crosslinker, the transparency of adhesive sheet 1 can be improved.

塗佈膜之乾燥時間可視黏著劑組成物(I)之組成適當調節,宜為30秒~300秒,更宜為40秒~240秒,尤宜為60秒~180秒。The drying time of the coating film can be adjusted appropriately according to the composition of the adhesive component (I), preferably 30 seconds to 300 seconds, more preferably 40 seconds to 240 seconds, and especially preferably 60 seconds to 180 seconds.

黏著片1之厚度無特別限定,可為2~150µm,可為2~100µm,亦可為5~50µm。適當調節黏著片1之厚度這點,可有助於提升黏著片1與抗靜電層2之密著性。又,適當調節黏著片1之厚度這點,可有助於抑制黏著片1從玻璃及影像顯示裝置等被黏著體剝離。The thickness of the adhesive sheet 1 is not particularly limited and can be 2~150µm, 2~100µm, or 5~50µm. Appropriately adjusting the thickness of the adhesive sheet 1 can help improve the adhesion between the adhesive sheet 1 and the antistatic layer 2. Furthermore, appropriately adjusting the thickness of the adhesive sheet 1 can help prevent the adhesive sheet 1 from peeling off from the glass, image display device, or other adhered objects.

<1-4-c.第1積層體L1與第2積層體L2之接合> 接著,接合第2積層體L2之黏著片1與第1積層體L1之抗靜電層2。藉此,可獲得由光學薄膜3、抗靜電層2、黏著片1及基材構成之積層體。<1-4-c. Bonding of the first laminate L1 and the second laminate L2> Next, the adhesive sheet 1 of the second laminate L2 is bonded to the antistatic layer 2 of the first laminate L1. Thereby, a laminate consisting of an optical film 3, an antistatic layer 2, an adhesive sheet 1, and a substrate can be obtained.

≪1-5.另一態樣≫ 圖5為剖面圖,其示意顯示本實施形態之光學積層體之另一例。圖5之光學積層體10(10B)具有依序積層有剝離襯材4、黏著片1、抗靜電層2及光學薄膜3之積層結構。光學積層體10B可在剝離剝離襯材4後,例如貼附於影像顯示單元來使用。≪1-5. Another Embodiment≫ Figure 5 is a cross-sectional view, schematically showing another example of the optical laminate of this embodiment. The optical laminate 10 (10B) of Figure 5 has a laminated structure in which a peelable backing material 4, an adhesive sheet 1, an antistatic layer 2, and an optical thin film 3 are sequentially laminated. The optical laminate 10B can be used, for example, attached to an image display unit after the backing material 4 is peeled off.

關於剝離襯材4之構成材料,可列舉例如:聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯薄膜等之塑膠薄膜;紙、布、不織布等之多孔質材料;網狀物、發泡片、金屬箔及該等之層合體等適當的薄片體等等,由表面平滑性優異方面來看,可適宜使用塑膠薄膜。Regarding the materials used to peel off the lining 4, examples include: plastic films such as polyethylene, polypropylene, polyethylene terephthalate, and polyester film; porous materials such as paper, cloth, and non-woven fabric; suitable sheets such as meshes, foam sheets, metal foils, and laminates thereof. From the perspective of excellent surface smoothness, plastic films are suitable for use.

關於塑膠薄膜,若為可保護黏著片1之薄膜即無特別限定,可列舉例如:聚乙烯薄膜、聚丙烯薄膜、聚丁烯薄膜、聚丁二烯薄膜、聚甲基戊烯薄膜、聚氯乙烯薄膜、氯乙烯共聚物薄膜、聚對苯二甲酸乙二酯薄膜、聚對苯二甲酸丁二酯薄膜、聚胺甲酸酯薄膜、乙烯-乙酸乙酯共聚物薄膜等。Regarding plastic films, there are no particular limitations if they are films that can protect the adhesive sheet 1. Examples include: polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polybutylene terephthalate film, polyurethane film, ethylene-ethyl acetate copolymer film, etc.

剝離襯材4之厚度通常為5~200µm,宜為5~100µm左右。對於剝離襯材4,亦可視需要經施行脫模處理、防污處理及抗靜電處理等各種處理。脫模處理及防污處理可利用聚矽氧系、氟系、長鏈烷基系、脂肪酸醯胺系等各種脫模劑或者氧化矽粉等粒子。抗靜電處理可為塗佈型、捏合型、蒸鍍型中之任一型。對剝離襯材4之表面施行剝離處理特別適於提高黏著片1之剝離性。The thickness of the peeling lining 4 is typically 5~200µm, preferably around 5~100µm. The peeling lining 4 can also undergo various treatments as needed, such as mold release treatment, anti-fouling treatment, and antistatic treatment. Mold release treatment and anti-fouling treatment can utilize various mold release agents such as polysiloxane, fluorine, long-chain alkyl, and fatty acid amide-based agents, or particles such as silica powder. Antistatic treatment can be of any type: coating, kneading, or vapor deposition. Applying a peeling treatment to the surface of the peeling lining 4 is particularly suitable for improving the peelability of the adhesive sheet 1.

亦可將形成黏著片1所利用之脫模薄膜作為剝離襯材4來使用。The release film used to form the adhesive sheet 1 can also be used as the peeling liner 4.

本實施形態之光學積層體亦可具備有上述以外之其他層及/或薄膜。The optical multilayer of this embodiment may also have other layers and/or thin films besides those mentioned above.

本實施形態之光學積層體例如可以將帶狀光學積層體捲繞而成之捲繞體之形態、或以單片狀光學積層體之形態進行流通及保管。本實施形態之光學積層體適於使用於在特別容易產生靜電之環境下使用之影像顯示裝置、尤其是車載用顯示器。關於車載用顯示器,可舉例如汽車導航裝置用面板、儀表盤、鏡面顯示器等。儀表盤係顯示車輛之行進速度或引擎之旋轉數等的面板。The optical laminate of this embodiment can be circulated and stored, for example, in the form of a wound body formed by winding a strip of optical laminate, or in the form of a monolithic optical laminate. The optical laminate of this embodiment is suitable for use in image display devices, especially automotive displays, in environments where static electricity is particularly prone to occur. Examples of automotive displays include car navigation panels, instrument panels, and mirror displays. An instrument panel displays information such as vehicle speed or engine RPM.

≪≪2.影像顯示面板≫≫ 於圖6顯示本發明實施形態之影像顯示面板之一例。圖6之影像顯示面板11(11A)具備光學積層體10A,且更具備影像顯示單元30A。光學積層體10A係透過黏著片1貼合於影像顯示單元30A。≪≪2. Image Display Panel≫≫ FIG6 shows an example of an image display panel according to an embodiment of the present invention. The image display panel 11 (11A) of FIG6 has an optical laminate 10A and further has an image display unit 30A. The optical laminate 10A is attached to the image display unit 30A by means of an adhesive sheet 1.

影像顯示單元30A具備有影像形成層32、第1透明基板31及第2透明基板33。影像形成層32係配置於第1透明基板31及第2透明基板33之間,且分別與第1透明基板31及第2透明基板33相接。黏著片1係與第1透明基板31相接。The image display unit 30A includes an image forming layer 32, a first transparent substrate 31, and a second transparent substrate 33. The image forming layer 32 is disposed between the first transparent substrate 31 and the second transparent substrate 33, and is in contact with both the first transparent substrate 31 and the second transparent substrate 33. The adhesive sheet 1 is in contact with the first transparent substrate 31.

影像形成層32例如為包含在電場不存在之狀態下沿面定向之液晶分子的液晶層。包含上述液晶分子之液晶層適於IPS(In-Plane Switching,面內切換)方式。惟,液晶層亦可為可用於TN(Twisted Nematic)型、STN(Super Twisted Nematic)型、π型、VA(Vertical Alignment)型等者。影像形成層32亦可為EL發光層。The image forming layer 32 may be, for example, a liquid crystal layer containing liquid crystal molecules aligned along the plane in the absence of an electric field. The liquid crystal layer containing these liquid crystal molecules is suitable for IPS (In-Plane Switching) technology. However, the liquid crystal layer can also be used for TN (Twisted Nematic), STN (Super Twisted Nematic), π-type, VA (Vertical Alignment), etc. The image forming layer 32 may also be an EL (Elastic Elastic Gravity) emitting layer.

影像形成層32之厚度例如為1.5µm~4µm。The thickness of the image forming layer 32 is, for example, 1.5µm to 4µm.

關於第1透明基板31及第2透明基板33的材料,可舉例如玻璃及聚合物。關於構成透明基板之聚合物,可舉例如聚對苯二甲酸乙二酯、聚環烯烴、聚碳酸酯等。以玻璃構成之透明基板之厚度例如為0.1mm~1mm。以聚合物構成之透明基板之厚度例如為10µm~200µm。The materials used for the first transparent substrate 31 and the second transparent substrate 33 may include, for example, glass and polymers. Examples of polymers constituting the transparent substrates include polyethylene terephthalate, polycyclic aromatic hydrocarbons, and polycarbonate. The thickness of the transparent substrate made of glass may be, for example, 0.1 mm to 1 mm. The thickness of the transparent substrate made of polymer may be, for example, 10 µm to 200 µm.

影像顯示單元30A亦可更包含有影像形成層32、第1透明基板31及第2透明基板33以外之其他層。關於其他層,可舉例如彩色濾光片、易接著層、硬塗層。彩色濾光片例如係配置於較影像形成層32更靠視辨側,宜位於第1透明基板31與黏著片1之間。易接著層及硬塗層例如係配置於第1透明基板31及/或第2透明基板33之表面上。The image display unit 30A may also include layers other than the image forming layer 32, the first transparent substrate 31, and the second transparent substrate 33. Examples of these other layers include, for instance, a color filter, an easy-adhesion layer, and a hard coating layer. The color filter, for example, is disposed on the viewing side of the image forming layer 32, preferably between the first transparent substrate 31 and the adhesive sheet 1. The easy-adhesion layer and the hard coating layer, for example, are disposed on the surfaces of the first transparent substrate 31 and/or the second transparent substrate 33.

影像顯示面板11A亦可更具備有光學積層體10A及影像顯示單元30A以外之其他構件。舉一例來說,影像顯示面板11A亦可更具備有與光學積層體10A之側面電連接之導通結構(未圖示)。若將導通結構與接地連接,便容易抑制光學積層體10A因靜電而帶電。導通結構可覆蓋光學積層體10A之側面整體,亦可局部覆蓋光學積層體10A之側面。光學積層體10A之側面被導通結構覆蓋的面積相對於光學積層體10A之側面整體的面積之比率例如為1%以上,宜為3%以上。The image display panel 11A may also include other components besides the optical laminate 10A and the image display unit 30A. For example, the image display panel 11A may also include a conductive structure (not shown) electrically connected to the side of the optical laminate 10A. By connecting the conductive structure to ground, it is easy to suppress the optical laminate 10A from becoming charged due to electrostatics. The conductive structure may cover the entire side of the optical laminate 10A or only partially cover the side of the optical laminate 10A. The ratio of the area covered by the conductive structure on the side of the optical laminate 10A to the total area of the side of the optical laminate 10A is, for example, 1% or more, preferably 3% or more.

關於導通結構之材料,可舉例如:以銀、金等金屬構成之導電性糊膏;導電性接著劑;其他導電材料。導通結構亦可為從光學積層體10A之側面伸長的配線。For example, the materials used in the conductive structure include: conductive pastes made of metals such as silver and gold; conductive adhesives; and other conductive materials. The conductive structure can also be a wiring extending from the side of the optical laminate 10A.

影像顯示面板11A亦可更具備有光學薄膜3以外之其他光學薄膜。關於其他光學薄膜,可舉例如偏光薄膜、反射薄膜、反透射薄膜、視角補償薄膜、增亮薄膜等可用於影像顯示裝置之薄膜。影像顯示面板11A亦可具備有1種或2種以上其他光學薄膜。The image display panel 11A may also be equipped with other optical films besides optical film 3. Examples of other optical films include polarizing films, reflective films, anti-transmission films, viewing angle compensation films, and brightness enhancement films, which can be used in image display devices. The image display panel 11A may also have one or more other optical films.

其他光學薄膜為偏光薄膜時,該偏光薄膜亦可與影像顯示單元30A之第2透明基板33貼合。作為其他光學薄膜之偏光薄膜亦可具有與屬光學薄膜3之偏光薄膜相同之構成。作為光學薄膜3之偏光薄膜與作為其他光學薄膜之偏光薄膜中,偏光件之透射軸(或吸收軸)亦可互相正交。與第2透明基板33貼合時,可使用黏著片。該黏著片亦可為黏著片1。用以與第2透明基板33貼合之黏著片之厚度例如為1~100µm,為2~50µm、2~40µm,更可為5~35µm。When the other optical thin film is a polarizing thin film, it can also be bonded to the second transparent substrate 33 of the image display unit 30A. The polarizing thin film, as another optical thin film, can also have the same structure as the polarizing thin film belonging to optical thin film 3. In the polarizing thin film as optical thin film 3 and the polarizing thin film as another optical thin film, the transmission axis (or absorption axis) of the polarizing element can also be orthogonal to each other. When bonding with the second transparent substrate 33, an adhesive sheet can be used. The adhesive sheet can also be adhesive sheet 1. The thickness of the adhesive sheet used to bond with the second transparent substrate 33 is, for example, 1~100µm, 2~50µm, 2~40µm, or even 5~35µm.

於圖7顯示本實施形態之影像顯示面板之另一例。圖7之影像顯示面板11(11B)除了更具備配置於光學積層體10A及影像顯示單元30A之間的導電層40外,其餘具有與影像顯示面板11A相同之構成。惟,本實施形態之影像顯示面板亦可不含導電層40。不含導電層40這點可有助於抑制影像顯示面板之反射率,換言之可有助於提升影像顯示裝置之視辨性。在不含導電層40之影像顯示面板11A中,宜設置與黏著片1鄰接之導通部(上述導通結構)。導通部可使用例如導電性銀糊膏。Figure 7 shows another example of the image display panel of this embodiment. The image display panel 11 (11B) of Figure 7 has the same configuration as the image display panel 11A, except that it is further provided with a conductive layer 40 disposed between the optical laminate 10A and the image display unit 30A. However, the image display panel of this embodiment may also be without the conductive layer 40. The absence of the conductive layer 40 helps to suppress the reflectivity of the image display panel, in other words, it helps to improve the visibility of the image display device. In the image display panel 11A without the conductive layer 40, a conductive portion (the aforementioned conductive structure) adjacent to the adhesive sheet 1 is preferably provided. The conductive portion can use, for example, conductive silver paste.

導電層40例如包含導電劑。導電劑可使用金屬氧化物、導電性聚合物等公知之材料。導電層40之厚度例如為5nm~180nm。導電層40之表面電阻率例如為1.0×106Ω/□~1.0×1010Ω/□,宜為1.0×107Ω/□~1.0×109Ω/□。The conductive layer 40 may include a conductive agent, for example. The conductive agent may be a known material such as a metal oxide or a conductive polymer. The thickness of the conductive layer 40 may be, for example, 5 nm to 180 nm. The surface resistivity of the conductive layer 40 may be, for example, 1.0 × 10⁶ Ω/□ to 1.0 × 10¹⁰ Ω/□, preferably 1.0 × 10⁷ Ω/□ to 1.0 × 10⁹ Ω/□.

本實施形態之影像顯示面板亦可內建觸控感測機能。於圖8顯示內建觸控感測機能之影像顯示面板之一例。圖8之影像顯示面板11(11C)除了影像顯示單元30B更包含觸控感測電極部35外,其餘具有與影像顯示面板11A相同之構成。觸控感測電極部35係配置於第1透明基板31與第2透明基板33之間。觸控感測電極部35具有觸控感測器及觸控驅動之機能。影像顯示面板11C係所謂的內置型影像顯示面板,影像顯示單元30B係所謂的內置型影像顯示單元。惟,觸控感測電極部35亦可配置於較第1透明基板31更靠視辨側。換言之,影像顯示面板11C可為所謂的上置型影像顯示面板,影像顯示單元30B亦可為所謂的上置型影像顯示單元。The image display panel of this embodiment can also have built-in touch sensing functionality. Figure 8 shows an example of an image display panel with built-in touch sensing functionality. The image display panel 11 (11C) in Figure 8 has the same structure as the image display panel 11A, except that the image display unit 30B includes a touch sensing electrode 35. The touch sensing electrode 35 is disposed between the first transparent substrate 31 and the second transparent substrate 33. The touch sensing electrode 35 has the functions of a touch sensor and touch driving. The image display panel 11C is a so-called built-in image display panel, and the image display unit 30B is a so-called built-in image display unit. However, the touch sensing electrode 35 can also be positioned on the viewing side further away from the first transparent substrate 31. In other words, the image display panel 11C can be a so-called top-mounted image display panel, and the image display unit 30B can also be a so-called top-mounted image display unit.

觸控感測電極部35具有觸控感測器電極36及觸控驅動電極37。觸控感測器電極36意指觸控檢測用(接收)電極。觸控感測器電極36及觸控驅動電極37可各自獨立藉由各種圖案來形成。例如,影像顯示單元30B為平板狀時,觸控感測器電極36及觸控驅動電極37可各自獨立設於X軸方向及Y軸方向上,形成成該等交叉成直角之圖案。圖8中,觸控感測電極部35中,觸控感測器電極36係配置於較觸控驅動電極37更靠視辨側。觸控驅動電極37亦可配置於較觸控感測器電極36更靠視辨側。觸控感測電極部35中,觸控感測器電極36及觸控驅動電極37亦可已一體化。The touch sensing electrode unit 35 includes a touch sensor electrode 36 and a touch driving electrode 37. The touch sensor electrode 36 refers to the touch detection (receiving) electrode. The touch sensor electrode 36 and the touch driving electrode 37 can each be formed independently using various patterns. For example, when the image display unit 30B is flat, the touch sensor electrode 36 and the touch driving electrode 37 can each be independently arranged in the X-axis direction and the Y-axis direction, forming patterns that intersect at right angles. In Figure 8, in the touch sensing electrode section 35, the touch sensor electrode 36 is positioned further towards the viewing side than the touch driver electrode 37. The touch driver electrode 37 can also be positioned further towards the viewing side than the touch sensor electrode 36. In the touch sensing electrode section 35, the touch sensor electrode 36 and the touch driver electrode 37 can also be integrated.

圖8之觸控感測電極部35係配置於影像形成層32與第1透明基板31之間(較影像形成層32更靠視辨側)。惟,觸控感測電極部35亦可配置於影像形成層32與第2透明基板33之間(較影像形成層32更靠照明系統側)。The touch sensing electrode 35 in Figure 8 is disposed between the image forming layer 32 and the first transparent substrate 31 (more towards the viewing side than the image forming layer 32). However, the touch sensing electrode 35 can also be disposed between the image forming layer 32 and the second transparent substrate 33 (more towards the lighting system side than the image forming layer 32).

在觸控感測電極部35中,觸控感測器電極36及觸控驅動電極37亦可互不相接。例如,觸控感測器電極36亦可配置於影像形成層32與第1透明基板31之間,且觸控驅動電極37亦可配置於影像形成層32與第2透明基板33之間。In the touch sensing electrode section 35, the touch sensor electrode 36 and the touch driving electrode 37 may not be connected to each other. For example, the touch sensor electrode 36 may be disposed between the image forming layer 32 and the first transparent substrate 31, and the touch driving electrode 37 may be disposed between the image forming layer 32 and the second transparent substrate 33.

觸控感測電極部35中之驅動電極(觸控驅動電極37、或觸控感測器電極36與觸控驅動電極37一體化而成的電極)可兼作控制影像形成層32的共通電極。The driving electrode in the touch sensing electrode section 35 (touch driving electrode 37, or an electrode formed by integrating touch sensor electrode 36 and touch driving electrode 37) can also serve as the common electrode for controlling the image forming layer 32.

構成觸控感測電極部35之觸控感測器電極36(電容感測器)、觸控驅動電極37、或該等一體化而形成之電極係作為透明導電層發揮功能。透明導電層之材料無特別限定,可舉例如金、銀、銅、鉑、鈀、鋁、鎳、鉻、鈦、鐵、鈷、錫、鎂、鎢等金屬及該等之合金等。透明導電層之材料亦可為銦、錫、鋅、鎵、銻、鋯、鎘等金屬的氧化物。關於氧化物,具體上可舉氧化銦、氧化錫、氧化鈦、氧化鎘及該等之混合物等。透明導電層之材料亦可為碘化銅等金屬化合物。透明導電層之材料宜為含有氧化錫之氧化銦(ITO)、含有銻之氧化錫等,尤宜為ITO。透明導電層之材料為ITO時,透明導電層中之氧化銦之含有率宜為80~99重量%,且氧化錫之含有率宜為1~20重量%。The touch sensor electrode 36 (capacitive sensor), touch drive electrode 37, or an integrated electrode constituting the touch sensing electrode portion 35 function as a transparent conductive layer. The material of the transparent conductive layer is not particularly limited, and can include metals such as gold, silver, copper, platinum, palladium, aluminum, nickel, chromium, titanium, iron, cobalt, tin, magnesium, and tungsten, as well as their alloys. The material of the transparent conductive layer can also be oxides of metals such as indium, tin, zinc, gallium, antimony, zirconium, and cadmium. Specifically, oxides include indium oxide, tin oxide, titanium oxide, cadmium oxide, and mixtures thereof. The transparent conductive layer can also be made of metal compounds such as copper iodide. The preferred materials for the transparent conductive layer are indium oxide (ITO) containing tin oxide or tin oxide containing antimony, with ITO being particularly preferred. When the transparent conductive layer is made of ITO, the indium oxide content should be 80-99% by weight, and the tin oxide content should be 1-20% by weight.

構成觸控感測電極部35之電極(觸控感測器電極36、觸控驅動電極37或該等一體化而形成之電極)可在第1透明基板31與第2透明基板33之間利用常規方法以透明電極圖案來形成。透明電極圖案例如係與形成於透明基板之端部的繞線電連接。繞線例如係與控制器IC連接。關於透明電極圖案之形狀,可視用途採用梳狀、條紋狀、菱形狀等任意形狀。透明電極圖案之厚度例如為10nm~100nm。透明電極圖案之寬度例如為0.1mm~5mm。The electrodes constituting the touch sensing electrode portion 35 (touch sensor electrode 36, touch drive electrode 37, or electrodes integrated therein) can be formed between the first transparent substrate 31 and the second transparent substrate 33 using conventional methods to form a transparent electrode pattern. The transparent electrode pattern is, for example, electrically connected to a wire wound formed at the end of the transparent substrate. The wire wound is, for example, connected to a controller IC. Regarding the shape of the transparent electrode pattern, any shape such as comb-shaped, striped, or diamond-shaped can be used depending on the application. The thickness of the transparent electrode pattern is, for example, 10nm to 100nm. The width of the transparent electrode pattern is, for example, 0.1mm to 5mm.

≪≪3.影像顯示裝置≫≫ 本發明實施形態之影像顯示裝置例如具備有影像顯示面板11A及照明系統。此外,亦可使用影像顯示面板11B或影像顯示面板11C來取代影像顯示面板11A。影像顯示裝置中,影像顯示面板11A例如係配置於較照明系統更靠視辨側。照明系統例如具有背光件或反射板,對影像顯示面板11A照射光。≪≪3. Image Display Device≫≫ An image display device of the present invention, for example, includes an image display panel 11A and a lighting system. Alternatively, an image display panel 11B or an image display panel 11C may be used instead of the image display panel 11A. In the image display device, the image display panel 11A is, for example, positioned further from the viewing side than the lighting system. The lighting system, for example, has a backlight or a reflector that illuminates the image display panel 11A.

本實施形態之影像顯示裝置可為有機EL顯示器,亦可為液晶顯示器。惟,影像顯示裝置不受該例所限。影像顯示裝置亦可為電致發光(EL)顯示器、電漿顯示器(PD)、場發射顯示器(FED:Field Emission Display)等。影像顯示裝置可用於家電用途、車載用途、公共資訊顯示器(PID)用途等,亦可為車載用顯示器。The image display device of this embodiment can be an organic EL display or a liquid crystal display. However, the image display device is not limited to this example. The image display device can also be an electroluminescent (EL) display, a plasma display (PD), a field emission display (FED), etc. The image display device can be used for home appliances, automotive applications, public information displays (PIDs), etc., and can also be an automotive display.

實施例 以下藉由實施例進一步詳細說明本發明。本發明不受以下所示實施例所限。Examples The present invention will be further described in detail below by way of examples. The present invention is not limited to the examples shown below.

[由抗靜電層及偏光薄膜構成之第1積層體L1之製作] <用以形成抗靜電層之塗敷液之調整> (塗敷液A1) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份及水75重量份,調製出固體成分濃度0.5重量%之塗敷液A1。黏結劑樹脂為丙烯酸系,並且其Tg為50℃,上述溶液中之CNT及黏結劑樹脂之固體成分比為1:99(重量比)。CNT之長度在5µm以上且200µm以下之範圍內,且CNT之直徑在2nm以上且8nm以下之範圍內。[Preparation of the first layer L1 consisting of an antistatic layer and a polarizing film] <Preparation of the coating solution for forming the antistatic layer> (Coating solution A1) Coating solution A1 with a solid content of 0.5% by weight was prepared by mixing 25 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7) and 75 parts by weight of water. The binder resin is acrylic and has a Tg of 50°C. The solid content ratio of CNTs to binder resin in the above solution is 1:99 (by weight). The length of the CNTs is in the range of 5µm to 200µm, and the diameter of the CNTs is in the range of 2nm to 8nm.

(塗敷液A2) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份及異丙醇(IPA)75重量份,調製出固體成分濃度0.5重量%之塗敷液A2。(Applying solution A2) Applying solution A2 with a solid content of 0.5% by weight is prepared by mixing 25 parts by weight of a solution containing CNT and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7) and 75 parts by weight of isopropyl alcohol (IPA).

(塗敷液A3) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份、水37.5重量份及IPA 37.5重量份,調製出固體成分濃度0.5重量%之塗敷液A3。(Applying solution A3) Applying solution A3 with a solid content of 0.5% by weight is prepared by mixing 25 parts by weight of a solution containing CNT and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7), 37.5 parts by weight of water and 37.5 parts by weight of IPA.

(塗敷液A4) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份、作為聚醚系調平劑之三洋化成工業公司製EMULMIN 240(1%水溶液)2.6重量份及水72.3重量份,調製出固體成分濃度0.5重量%之塗敷液A4。調製出之塗敷液A4中之CNT、黏結劑樹脂及調平劑之固體成分比為1:94:5(重量比)。(Coating Solution A4) Coating solution A4 with a solid content of 0.5% by weight was prepared by mixing 25 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7), 2.6 parts by weight of EMULMIN 240 (1% aqueous solution) manufactured by Sanyo Chemical Industries Co., Ltd. as a polyether leveling agent, and 72.3 parts by weight of water. The solid content ratio of CNTs, binder resin and leveling agent in the prepared coating solution A4 is 1:94:5 (by weight).

(塗敷液A5) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份、作為聚醚系調平劑之三洋化成工業公司製EMULMIN 240(1%水溶液)9.0重量份及水66重量份,調製出固體成分濃度0.5重量%之塗敷液A5。調製出之塗敷液A5中之CNT、黏結劑樹脂及調平劑之固體成分比為1:84:15(重量比)。(Coating Solution A5) Coating solution A5 with a solid content of 0.5% by weight was prepared by mixing 25 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7), 9.0 parts by weight of EMULMIN 240 (1% aqueous solution) manufactured by Sanyo Chemical Industries Co., Ltd. as a polyether leveling agent, and 66 parts by weight of water. The solid content ratio of CNTs, binder resin and leveling agent in the prepared coating solution A5 is 1:84:15 (by weight).

(塗敷液A6) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-3-3)15.2重量份、作為聚醚系調平劑之三洋化成工業公司製EMULMIN 240(1%水溶液)9.0重量份及水75.8重量份,調製出固體成分濃度0.5重量%之塗敷液A6。黏結劑樹脂為聚胺甲酸酯系,並且其Tg為-15℃。CNT之長度在5µm以上且200µm以下之範圍內,且CNT之直徑在2nm以上且8nm以下之範圍內。調製出之塗敷液A6中之CNT、黏結劑樹脂及調平劑之固體成分比為1:84:15(重量比)。(Coating Solution A6) Coating solution A6 with a solid content of 0.5% by weight is prepared by mixing 15.2 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-3-3), 9.0 parts by weight of EMULMIN 240 (1% aqueous solution) manufactured by Sanyo Chemical Industries Co., Ltd. as a polyether leveling agent, and 75.8 parts by weight of water. The binder resin is polyurethane-based and has a Tg of -15°C. The length of the CNTs is in the range of 5µm to 200µm, and the diameter of the CNTs is in the range of 2nm to 8nm. The solid components of CNT, binder resin and leveling agent in the prepared coating liquid A6 are in the ratio of 1:84:15 (by weight).

(塗敷液A7) 將平均長度300µm及直徑約4nm之CNT(Zeon Nano Technology製,ZEONANO SG101)0.08重量份、分散劑(BASF製,品名:Pluronic F-108,HLB:24以上)0.7重量份、乙醇30重量份及純水70重量份放入玻璃燒杯中,藉由超音波均質機在50W及頻率30kHz之條件下實施分散處理30分鐘,而獲得固體成分率1.0重量%之CNT分散體。接著,將所得CNT分散體、黏結劑樹脂及調平劑以固體成分比為8:77:15(重量比)之方式混合後,利用純水稀釋整體,而製出固體成分濃度2重量%之塗敷液A7。黏結劑樹脂係使用第一工業製藥公司製SUPERFLEX 650(聚胺甲酸酯系,固體成分率26重量%,Tg-15℃)。調平劑係使用聚醚系調平劑之三洋化成工業製、EMULMIN 240(1%水溶液)。(Coating Solution A7) 0.08 parts by weight of CNTs (manufactured by Zeon Nano Technology, ZEONANO SG101) with an average length of 300µm and a diameter of approximately 4nm, 0.7 parts by weight of dispersant (manufactured by BASF, product name: Pluronic F-108, HLB: 24 or higher), 30 parts by weight of ethanol, and 70 parts by weight of pure water were placed in a glass beaker and dispersed using an ultrasonic homogenizer at 50W and 30kHz for 30 minutes to obtain a CNT dispersion with a solid content of 1.0% by weight. Next, the obtained CNT dispersion, binder resin, and leveling agent were mixed in a solid content ratio of 8:77:15 (by weight), and the mixture was diluted with pure water to prepare coating solution A7 with a solid content of 2% by weight. The binder resin used is SUPERFLEX 650 (polyurethane, 26% by weight, Tg -15℃) manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd. The leveling agent used is EMULMIN 240 (1% aqueous solution) manufactured by Sanyo Chemical Co., Ltd., a polyether-based leveling agent.

(塗敷液A8) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份、包含與上述不同之黏結劑樹脂的溶液(Nagase ChemteX Co.製,製品名:TS066-1-5)0.47重量份及水74.5重量份,調製出固體成分濃度0.5重量%之塗敷液A8。TS066-1-5中所含之黏結劑樹脂為聚胺甲酸酯系,並且其Tg為-15℃。調製出之塗敷液A8中之CNT、黏結劑樹脂(Tg=50℃)及黏結劑樹脂(Tg=-15℃)之固體成分比為1:94:5(重量比)。(Applying Solution A8) Applying solution A8 is prepared by mixing 25 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7), 0.47 parts by weight of a solution containing a different binder resin (manufactured by Nagase ChemteX Co., product name: TS066-1-5), and 74.5 parts by weight of water, resulting in a solid content concentration of 0.5% by weight. The binder resin contained in TS066-1-5 is a polyurethane-based resin with a Tg of -15°C. The solid component ratio of CNT, binder resin (Tg=50℃) and binder resin (Tg=-15℃) in the prepared coating solution A8 is 1:94:5 (by weight).

(塗敷液A9) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-11-7)25重量份、包含與上述不同之黏結劑樹脂的溶液(Nagase ChemteX Co.製,製品名:TS066-1-5)2.3重量份及水72.6重量份,調製出固體成分濃度0.5重量%之塗敷液A9。調製出之塗敷液A9中之CNT、黏結劑樹脂(Tg=50℃)及黏結劑樹脂(Tg=-15℃)之固體成分比為1:79:20(重量比)。(Coating Solution A9) Coating solution A9 with a solid content of 0.5% by weight is prepared by mixing 25 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-11-7), 2.3 parts by weight of a solution containing a different binder resin (manufactured by Nagase ChemteX Co., product name: TS066-1-5), and 72.6 parts by weight of water. The solid content ratio of CNTs, binder resin (Tg=50℃), and binder resin (Tg=-15℃) in the prepared coating solution A9 is 1:79:20 (by weight).

(塗敷液A10) 藉由混合包含CNT及黏結劑樹脂之溶液(Nagase ChemteX Co.製,製品名:TS066-3-3)15.2重量份及水84.8重量份,調製出固體成分濃度0.5重量%之塗敷液A10。調製出之塗敷液A10中之CNT及黏結劑樹脂之固體成分比為1:99(重量比)。(Coating Solution A10) Coating solution A10 with a solid content of 0.5% by weight was prepared by mixing 15.2 parts by weight of a solution containing CNTs and binder resin (manufactured by Nagase ChemteX Co., product name: TS066-3-3) and 84.8 parts by weight of water. The solid content ratio of CNTs to binder resin in the prepared coating solution A10 is 1:99 (by weight).

關於各塗敷液,統整於表1。The various topical solutions are summarized in Table 1.

[表1] [Table 1]

<偏光薄膜之製作> (附硬塗層之保護薄膜A之製作) 準備包含胺甲酸酯丙烯酸酯作為主成分之紫外線硬化型樹脂單體或寡聚物溶解於乙酸丁酯中之樹脂溶液(DIC公司製,商品名:UNIDIC 17-806,固體成分濃度:80%)。接著,相對於該樹脂溶液之固體成分100重量份,添加光聚合引發劑(BASF公司製,商品名:IRGACURE907)5重量份及調平劑(DIC公司製,商品名:GRANDIC PC4100)0.1重量份。接著,將環戊酮及丙二醇單甲基醚以45:55之重量比率對樹脂溶液加入,以將樹脂溶液之固體成分濃度調節成36重量%,而調製出硬塗層形成材料。接著,將調製出之形成材料塗佈於含三醋酸纖維素之透明保護薄膜(Konica Minolta公司製TAC薄膜,商品名「KC4UY」,厚度40µm)上而形成塗膜。塗膜之厚度係調節成使形成材料硬化所得之硬塗層之厚度成為7µm。接著,於90℃下將塗膜乾燥1分鐘,並以高壓水銀燈對塗膜照射累積光量300mJ/cm2之紫外線。藉此使塗膜硬化,而獲得附硬塗層(HC)之保護薄膜A(厚度47µm)。<Preparation of Polarizing Film> (Preparation of Protective Film A with Hard Coating) Prepare a resin solution (manufactured by DIC Corporation, trade name: UNIDIC 17-806, solid content concentration: 80%) containing a UV-curable resin monomer or oligomer with carbamate acrylate as the main component dissolved in butyl acetate. Next, relative to 100 parts by weight of the solid content of the resin solution, add 5 parts by weight of photopolymerization initiator (manufactured by BASF Corporation, trade name: IRGACURE907) and 0.1 parts by weight of leveling agent (manufactured by DIC Corporation, trade name: GRANDIC PC4100). Next, cyclopentanone and propylene glycol monomethyl ether were added to the resin solution at a weight ratio of 45:55 to adjust the solid content of the resin solution to 36% by weight, thus preparing a hard coating forming material. The prepared forming material was then applied to a transparent protective film containing triacetate cellulose (TAC film manufactured by Konica Minolta, trade name "KC4UY", thickness 40µm) to form a coating. The thickness of the coating was adjusted so that the hard coating obtained by curing the forming material would be 7µm. The coating was then dried at 90°C for 1 minute and irradiated with ultraviolet light at a cumulative intensity of 300mJ/ cm² using a high-pressure mercury lamp. This allows the coating to harden, resulting in a protective film A (47µm thick) with a hardened coating (HC).

(偏光件A之製作) 一邊將平均聚合度2400、皂化度99.9莫耳%、厚度45µm之聚乙烯醇(PVA)薄膜浸漬於20℃之膨潤浴(水浴)中30秒鐘使其膨潤,一邊往輸送方向延伸2.2倍(膨潤步驟)。接著,在30℃之染色浴(相對於水100重量份將碘與碘化鉀以1:7之重量比摻混而得之碘水溶液)中一邊調整濃度一邊浸漬於其中30秒鐘進行染色,以使最後所得偏光件之碘濃度達3.1重量%,並一邊以原本的PVA薄膜(完全未往輸送方向延伸過之PVA薄膜)為基準往輸送方向延伸成3.3倍(染色步驟)。延伸係使用周速比相異之輥。接著,將已染色之PVA薄膜在40℃之交聯浴(硼酸濃度為3.5重量%、碘化鉀濃度為3.0重量%、硫酸鋅濃度為3.6重量%之水溶液)中浸漬28秒鐘,並以原本的PVA薄膜為基準往輸送方向延伸至3.6倍為止(交聯步驟)。接著,將已交聯之PVA薄膜在64℃之延伸浴(硼酸濃度為4.5重量%、碘化鉀濃度為5.0重量%、硫酸鋅濃度為5.0重量%之水溶液)中浸漬60秒鐘,並以原本的PVA薄膜為基準往輸送方向延伸至6.0倍為止(延伸步驟)。接著,在27℃之洗淨浴(碘化鉀濃度為2.3重量%之水溶液)中浸漬10秒鐘(洗淨步驟),將洗淨後之PVA薄膜在40℃下乾燥30秒鐘,而獲得厚度18µm之偏光件A。(Fabrication of Polarizing Component A) A polyvinyl alcohol (PVA) film with an average degree of polymerization of 2400, a saponification degree of 99.9 moles, and a thickness of 45 µm is immersed in a swelling bath (water bath) at 20°C for 30 seconds to swell, while simultaneously extending it 2.2 times in the conveying direction (swelling step). Next, the film is immersed in a dyeing bath at 30°C (an iodine aqueous solution obtained by mixing iodine and potassium iodide in a 1:7 weight ratio relative to 100 parts by weight of water) for 30 seconds while adjusting the concentration to achieve an iodine concentration of 3.1% by weight in the final polarizing component, while simultaneously extending it 3.3 times in the conveying direction based on the original PVA film (a PVA film that has not been extended in the conveying direction) (dyeing step). The extension is performed using rollers with different peripheral speeds. Next, the dyed PVA film was immersed in a crosslinking bath at 40°C (an aqueous solution of boric acid, potassium iodide, and zinc sulfate at 3.5 wt%, 3.0 wt%, and 3.6 wt%) for 28 seconds, and then stretched 3.6 times in the transport direction based on the original PVA film (crosslinking step). Then, the crosslinked PVA film was immersed in a stretching bath at 64°C (an aqueous solution of boric acid, potassium iodide, and zinc sulfate at 5.0 wt%) for 60 seconds, and then stretched 6.0 times in the transport direction based on the original PVA film (stretching step). Next, the PVA film was immersed in a 27°C washing bath (an aqueous solution with a potassium iodide concentration of 2.3% by weight) for 10 seconds (washing step), and then dried at 40°C for 30 seconds to obtain a polarizing element A with a thickness of 18µm.

(偏光件B之製作) 使用周速比相異之輥,將厚度80µm之PVA薄膜一邊在30℃之碘水溶液(濃度0.3重量%)中染色1分鐘一邊往輸送方向延伸至3.0倍為止。接著,於60℃、硼酸濃度4重量%、碘化鉀濃度10重量%之水溶液中浸漬0.5分鐘,並以原本的PVA薄膜為基準往輸送方向延伸至6.0倍為止。接著,浸漬於30℃、碘化鉀濃度1.5重量%之水溶液中10秒鐘進行洗淨後,在50℃下乾燥4分鐘,而獲得厚度28µm之偏光件B。(Fabrication of Polarizing Component B) Using rollers with different periodic speed ratios, an 80µm thick PVA film was dyed in an iodine aqueous solution (0.3 wt%) at 30°C for 1 minute while being stretched 3.0 times in the conveying direction. Next, it was immersed in an aqueous solution at 60°C with a boric acid concentration of 4% wt% and a potassium iodide concentration of 10% wt% for 0.5 minutes, and stretched 6.0 times in the conveying direction based on the original PVA film. Then, it was washed by immersion in an aqueous solution at 30°C with a potassium iodide concentration of 1.5% wt% for 10 seconds, and dried at 50°C for 4 minutes to obtain a 28µm thick polarizing component B.

(偏光件C之製作) 使用周速比相異之輥,將厚度60µm之PVA薄膜一邊在30℃之碘水溶液(濃度0.3重量%)中染色1分鐘一邊往輸送方向延伸至3.0倍為止。接著,於60℃、硼酸濃度4重量%、碘化鉀濃度10重量%之水溶液中浸漬0.5分鐘,並以原本的PVA薄膜為基準往輸送方向延伸至6.0倍為止。接著,浸漬於30℃、碘化鉀濃度1.5重量%之水溶液中10秒鐘進行洗淨後,在50℃下乾燥4分鐘,而獲得厚22µm之偏光件C。(Fabrication of Polarizing Component C) Using rollers with different periodic speed ratios, a 60µm thick PVA film was dyed in an iodine aqueous solution (0.3 wt%) at 30°C for 1 minute while being stretched 3.0 times in the conveying direction. Next, it was immersed in an aqueous solution at 60°C with a boric acid concentration of 4% wt% and a potassium iodide concentration of 10% wt% for 0.5 minutes, and stretched 6.0 times in the conveying direction using the original PVA film as a reference. Then, it was washed by immersion in an aqueous solution at 30°C with a potassium iodide concentration of 1.5% wt% for 10 seconds, and dried at 50°C for 4 minutes to obtain a 22µm thick polarizing component C.

(相位差薄膜A之製作) 於具備攪拌機、冷卻管、氮導入管及溫度計之高壓釜中,容置羥丙基甲基纖維素(信越化學製,METOLOSE 60SH-50」)48重量份、蒸餾水15601重量份、延胡索酸二異丙酯8161重量份、丙烯酸3-乙-3-氧雜環丁烷基甲酯240重量份及聚合引發劑之過氧化三甲基乙酸三級丁酯45重量份,進行1小時氮起泡後,一邊攪拌一邊在49℃下維持24小時,使其進行自由基懸浮聚合。接著,冷卻至室溫後,將藉由聚合而生成之延胡索酸酯系樹脂之粒子進行離心分離。所得粒子以蒸餾水洗淨2次並以甲醇洗淨2次後,進行減壓乾燥。接著,使粒子溶解於甲苯-甲乙酮混合溶液(甲苯/甲乙酮50重量%/50重量%)中,製成濃度20重量%之溶液。並且,相對於延胡索酸酯系樹脂100重量份,添加偏苯三甲酸三丁酯5重量份作為塑化劑,調製出塗料(dope)。接著,將調製出之塗料以使乾燥後之膜厚為6.3µm之方式塗佈於支持薄膜上,並在140℃下使其乾燥。支持體係使用聚酯(聚對苯二甲酸乙二酯/聚對苯二甲酸乙二酯共聚物)之雙軸延伸薄膜(厚度75µm,已加熱處理過)。接著,將依上述方式所得之積層體在溫度140℃下進行單軸延伸。從延伸後之積層體剝離支持薄膜,而獲得相位差薄膜A(厚度6µm,Re(550)為35nm)。(Preparation of Phase Difference Thin Film A) In a high-pressure reactor equipped with a stirrer, coolant, nitrogen inlet pipe, and thermometer, 48 parts by weight of hydroxypropyl methylcellulose (Shin-Etsu Chemical, METOLOSE 60SH-50), 15601 parts by weight of distilled water, 8161 parts by weight of diisopropyl fumarate, 240 parts by weight of methyl 3-ethyl-3-oxocyclobutane acrylate, and 45 parts by weight of trimethylolpropene peroxide (tributyl acetate) as a polymerization initiator were placed. After nitrogen foaming for 1 hour, the mixture was stirred and maintained at 49°C for 24 hours to allow free radical suspension polymerization. Subsequently, after cooling to room temperature, the fumarate-based resin particles generated by polymerization were centrifuged and separated. The obtained particles were washed twice with distilled water and twice with methanol, followed by depressurized drying. Next, the particles were dissolved in a toluene-methyl ethyl ketone mixed solution (50% by weight toluene/50% by weight methyl ethyl ketone) to prepare a solution with a concentration of 20% by weight. Furthermore, 5 parts by weight of tributyl trimellitate were added as a plasticizer to 100 parts by weight of fumarate-based resin to prepare a coating (dope). The prepared coating was then applied to a support film to achieve a dried film thickness of 6.3 µm and dried at 140°C. The support system used a biaxially stretched polyester (polyethylene terephthalate/polyethylene terephthalate copolymer) film (75 µm thick, heat-treated). Next, the laminate obtained in the above manner is uniaxially stretched at a temperature of 140°C. The support film is peeled off from the stretched laminate to obtain the phase difference film A (thickness 6µm, Re(550) 35nm).

(偏光薄膜A之製作) 利用輥貼合機,分別於偏光件A之一主面貼合附HC之保護薄膜A,且於另一主面貼合相位差薄膜B(日本ZEON製ZT12,厚度17µm之環烯烴薄膜)。貼合係使用接著劑並在30℃下實施。接著劑係使用以下水溶液:以重量比3:1含有含乙醯乙醯基之PVA(平均聚合度1200,皂化度98.5莫耳%,乙醯乙醯基化度5莫耳%)與羥甲基三聚氰胺者。接著,以烘箱使整體加熱乾燥後,將光硬化型接著劑組成物以厚度1µm塗敷於所得積層薄膜之相位差薄膜B側。塗敷係使用MCD塗佈機(富士機械製)。接著劑組成物之組成如以下所述。 ・不飽和脂肪酸羥烷基酯改質ε-己內酯(DAICEL製,Placcel FA1DDM)20重量份 ・丙烯醯基嗎福林(興人製)20重量份 ・二乙基丙烯醯胺(KJ Chemicals Corporation製,DEAA)3重量份 ・丙烯酸月桂酯(共榮社化學製,LIGHT ACRYLATE L-A)6.7重量份 ・丙烯酸異硬脂酯(大阪有機化學工業製,ISTA)27重量份 ・1,9-壬二醇二丙烯酸酯(共榮社化學製,LIGHT ACRYLATE 1,9ND-A)10重量份 ・丙烯酸丁酯與甲基丙烯酸酯之34/66莫耳比共聚寡聚物(東亞合成製,ARUFON UP-1190,分子量1700)13.3重量份 ・作為光引發劑之Omnirad 907(IGM Resins B.V.製)3重量份 ・作為光引發劑之二乙基9-氧硫𠮿(日本化藥製,KAYACURE DETX-S)3重量份(Preparation of Polarizing Film A) Using a roller laminator, a protective film A with HC is laminated onto one main surface of the polarizer A, and a phase retardation film B (ZEON ZT12, 17µm thick cycloolefin film, manufactured in Japan) is laminated onto the other main surface. The lamination is performed using an adhesive at 30°C. The adhesive is an aqueous solution containing acetylated PVA (average degree of polymerization 1200, degree of saponification 98.5 mol%, degree of acetylation 5 mol%) and hydroxymethyl melamine in a 3:1 weight ratio. After drying the entire assembly in an oven, a photocurable adhesive composition is applied to the phase retardation film B side of the resulting laminated film to a thickness of 1µm. The application was performed using an MCD coating machine (manufactured by Fuji Machinery). The composition of the agent is as described below. • 20 parts by weight of ε-caprolactone modified with hydroxyalkyl unsaturated fatty acids (DAICL, Placcel FA1DDM) • 20 parts by weight of acrylamide (Kojin) • 3 parts by weight of diethylacrylamide (KJ Chemicals Corporation, DEAA) • 6.7 parts by weight of lauryl acrylate (Kyoei Chemicals, LIGHT ACRYLATE LA) • 27 parts by weight of isostearyl acrylate (Osaka Organic Chemical Industry, ISTA) • 10 parts by weight of 1,9-nonanediol diacrylate (Kyoei Chemicals, LIGHT ACRYLATE 1,9ND-A) • 13.3 parts by weight of 34/66 molar ratio copolymer oligomer of butyl acrylate and methacrylate (Toa Synthetic, ARUFON UP-1190, molecular weight 1700) • Omnirad as a photoinitiator 907 (manufactured by IGM Resins BV) 3 parts by weight - Diethyl-9-oxosulfur as a photoinitiator (KAYACURE DETX-S manufactured by Nippon Kayaku) 3 parts by weight

接著,以與已塗敷之接著劑組成物相接之方式,利用輥貼合機貼合上述製出之相位差薄膜A。貼合係在30℃下實施。接著,從相位差薄膜A側照射以充有鎵之金屬鹵素燈作為光源之可見光線(照射裝置:Fusion UV Systems, Inc製Light HAMMER10,燈泡:V燈泡,峰值照度:1600mW/cm2,波長380~440nm之累積照射量1000/mJ/cm2)作為活性能量線,使接著劑組成物硬化。然後,在70℃下熱乾燥3分鐘,而獲得偏光薄膜A。偏光薄膜A藉由上述方法求得之捲曲直徑為6.0mm,彎曲力矩M為3.0×106Next, the phase retardation film A prepared above was bonded to the pre-coated adhesive composition using a roller laminator. The bonding was performed at 30°C. Then, visible light (irradiation device: Light HAMMER10, Fusion UV Systems, Inc.; bulb: V-type bulb; peak illuminance: 1600 mW/ cm² ; cumulative irradiance 380~440 nm: 1000 mJ/ cm² ) was irradiated from the phase retardation film A as the active energy line to harden the adhesive composition. Finally, it was heat-dried at 70°C for 3 minutes to obtain the polarizing film A. The bending diameter of the polarizing film A obtained by the above method is 6.0 mm, and the bending moment M is 3.0 × 10⁶ .

(偏光薄膜B之製作) 利用輥貼合機,分別於偏光件A之一主面貼合附HC之保護薄膜A,且於另一主面貼合由具有內酯環結構之改質丙烯酸系聚合物構成之透明保護薄膜(日本觸媒製,厚度30µm)。貼合係使用接著劑並在30℃下實施。接著劑係使用以下水溶液:以重量比3:1含有含乙醯乙醯基之PVA(平均聚合度1200,皂化度98.5莫耳%,乙醯乙醯基化度5莫耳%)與羥甲基三聚氰胺者。接著,以烘箱使整體加熱乾燥,而獲得偏光薄膜B。偏光薄膜B藉由上述方法求得之捲曲直徑為6.0mm,彎曲力矩M為2.0×106(Preparation of Polarizing Film B) Using a roller laminator, a protective film A with HC was laminated onto one main surface of the polarizing element A, and a transparent protective film (manufactured by Nippon Shokubai, 30µm thick) composed of a modified acrylic polymer with a lactone ring structure was laminated onto the other main surface. The lamination was performed using an adhesive at 30°C. The adhesive was an aqueous solution containing acetoacetyl PVA (average degree of polymerization 1200, degree of saponification 98.5 mol%, degree of acetoacetylation 5 mol%) and hydroxymethyl melamine in a weight ratio of 3:1. The entire assembly was then dried in an oven to obtain polarizing film B. The bending diameter of polarizing film B obtained by the above method was 6.0 mm, and the bending moment M was 2.0 × 10⁶ .

(偏光薄膜C之製作) 利用輥貼合機,分別於偏光件A之一主面貼合含三醋酸纖維素之透明保護薄膜(FUJIFILM製TAC薄膜,商品名「TG40UL」,厚度40µm),且於另一主面貼合由具有內酯環結構之改質丙烯酸系聚合物構成之透明保護薄膜(日本觸媒製,厚度30µm)。貼合係使用接著劑並在30℃下實施。接著劑係使用以下水溶液:以重量比3:1含有含乙醯乙醯基之PVA(平均聚合度1200,皂化度98.5莫耳%,乙醯乙醯基化度5莫耳%)與羥甲基三聚氰胺者。接著,以烘箱使整體加熱乾燥,而獲得偏光薄膜C。偏光薄膜C藉由上述方法求得之捲曲直徑為3.0mm,彎曲力矩M為3.5×106(Preparation of Polarizing Film C) Using a roller laminator, a transparent protective film containing triacetate cellulose (FUJIFILM TAC film, trade name "TG40UL", thickness 40µm) was laminated onto one main surface of the polarizing element A, and a transparent protective film composed of a modified acrylic polymer with a lactone ring structure (Nippon Shokubai, thickness 30µm) was laminated onto the other main surface. The lamination was performed using an adhesive at 30°C. The adhesive was an aqueous solution containing acetoacetyl PVA (average degree of polymerization 1200, degree of saponification 98.5 mol%, degree of acetoacetylation 5 mol%) and hydroxymethyl melamine in a weight ratio of 3:1. The entire assembly was then dried in an oven to obtain polarizing film C. The bending diameter of the polarizing film C obtained by the above method is 3.0 mm, and the bending moment M is 3.5 × 10⁶ .

(偏光薄膜D之製作) 利用輥貼合機,分別於偏光件B之一主面貼合附HC之保護薄膜A,且於另一主面貼合由具有內酯環結構之改質丙烯酸系聚合物構成之透明保護薄膜(日本觸媒製,厚度30µm)。貼合係使用接著劑並在30℃下實施。接著劑係使用以下水溶液:以重量比3:1含有含乙醯乙醯基之PVA(平均聚合度1200,皂化度98.5莫耳%,乙醯乙醯基化度5莫耳%)與羥甲基三聚氰胺者。接著,以烘箱使整體加熱乾燥,而獲得偏光薄膜D。偏光薄膜D藉由上述方法求得之捲曲直徑為7.8mm,彎曲力矩M為3.0×106(Preparation of Polarizing Film D) Using a roller laminator, a protective film A with HC was laminated onto one main surface of the polarizing element B, and a transparent protective film (manufactured by Nippon Shokubai, 30µm thick) composed of a modified acrylic polymer with a lactone ring structure was laminated onto the other main surface. The lamination was performed using an adhesive at 30°C. The adhesive was an aqueous solution containing acetoacetyl PVA (average degree of polymerization 1200, degree of saponification 98.5 mol%, degree of acetoacetylation 5 mol%) and hydroxymethyl melamine in a weight ratio of 3:1. The entire assembly was then dried in an oven to obtain the polarizing film D. The polarizing film D, obtained by the above method, has a curl diameter of 7.8 mm and a bending moment M of 3.0 × 10⁶ .

(偏光薄膜E之製作) 利用輥貼合機,分別於偏光件C之一主面貼合含三醋酸纖維素之透明保護薄膜(FUJIFILM製TAC薄膜,商品名「TG40UL」,厚度40µm),且於另一主面貼合由具有內酯環結構之改質丙烯酸系聚合物構成之透明保護薄膜(日本觸媒製,厚度20µm)。貼合係使用接著劑並在30℃下實施。接著劑係使用以下水溶液:以重量比3:1含有含乙醯乙醯基之PVA(平均聚合度1200,皂化度98.5莫耳%,乙醯乙醯基化度5莫耳%)與羥甲基三聚氰胺者。接著,以烘箱使整體加熱乾燥,而獲得偏光薄膜E。偏光薄膜E藉由上述方法求得之捲曲直徑為2.5mm,彎曲力矩M為8.0×106(Preparation of Polarizing Film E) Using a roller laminator, a transparent protective film containing triacetate cellulose (FUJIFILM TAC film, trade name "TG40UL", thickness 40µm) was laminated onto one main surface of the polarizing element C, and a transparent protective film composed of a modified acrylic polymer with a lactone ring structure (Nippon Shokubai, thickness 20µm) was laminated onto the other main surface. The lamination was performed using an adhesive at 30°C. The adhesive used was an aqueous solution containing acetoacetyl PVA (average degree of polymerization 1200, degree of saponification 98.5 mol%, degree of acetoacetylation 5 mol%) and hydroxymethyl melamine in a weight ratio of 3:1. The entire assembly was then dried in an oven to obtain the polarizing film E. The bending diameter of the polarizing film E obtained by the above method is 2.5 mm, and the bending moment M is 8.0 × 10⁶ .

<第1積層體L1之製作> 對上述製出之各偏光薄膜中之透明保護薄膜之露出面塗佈上述調製出之任一塗敷液,並使所形成之塗佈膜在預定溫度下乾燥1分鐘,藉此製出具有抗靜電層/偏光薄膜之積層結構的第1積層體L1-1~L1-20。於以下表2中列示製出之各第1積層體L1所具備之抗靜電層之製造條件及厚度。<Fabrication of the First Laminate L1> Apply any of the prepared coating solutions to the exposed surfaces of the transparent protective films in each of the polarizing films prepared above, and allow the resulting coating film to dry at a predetermined temperature for 1 minute, thereby producing the first laminates L1-1 to L1-20 with an antistatic layer/polarizing film laminate structure. The manufacturing conditions and thickness of the antistatic layer of each of the first laminates L1 produced are listed in Table 2 below.

[表2] [Table 2]

[抗靜電層之特性評估] 針對製出之各第1積層體L1,藉由上述方法評估抗靜電層在DIN試驗前後之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q。第1積層體L1係裁切成尺寸5mm×30mm之長方形後固定在AFM圓盤上。將第1積層體L1固定於AFM圓盤之固定面上時,係使用具有雙面黏著性之導電性膠帶(日新EM公司製,商品名:導電性碳雙面膠帶)。所使用之導電性膠帶係由不織布之基材與包含碳粉作為導電性填料之黏著劑構成。於金屬糊膏使用銀糊膏(藤倉化成公司製,Dortite D-550)。銀糊膏係以溶解於乙酸乙酯中之狀態塗佈,塗佈後,在室溫下放置30分鐘使其乾燥。又,銀糊膏乾燥後,藉由測定器確認是否有確保從AFM圓盤至抗靜電層之測定區域的導電通路。AFM測定裝置係使用Hitachi High-Tech Co.製AFM5300E。懸臂係使用背面及前端經銠塗佈之Hitachi High-Tech製SI-DF40-R。AFM測定中之上述數據之處理係使用附屬於AFM測定裝置之數據解析軟體。評估係在25℃下實施。將評估結果列示於以下表3中。[Evaluation of Antistatic Layer Characteristics] For each first laminate L1 produced, the product of the particle area ratio P (%) and the total current value Q (nA) before and after the DIN test was evaluated using the method described above: (P×0.01)×Q. The first laminate L1 was cut into rectangles of 5mm×30mm and fixed onto the AFM disc. When fixing the first laminate L1 to the mounting surface of the AFM disc, a double-sided conductive tape (manufactured by Nisshin EM Co., Ltd., trade name: Conductive Carbon Double-Sided Tape) was used. The conductive tape used consisted of a non-woven fabric substrate and an adhesive containing carbon powder as a conductive filler. Silver paste (Dortite D-550, manufactured by Fujikura Chemicals Co., Ltd.) was used for the metal paste application. The silver paste was applied in a solution of ethyl acetate and allowed to dry at room temperature for 30 minutes. After drying, the silver paste was used to verify the presence of a conductive path from the AFM disk to the antistatic layer in the measurement area. The AFM measuring device used was an AFM5300E manufactured by Hitachi High-Tech Co. The cantilever was a Hitachi High-Tech SI-DF40-R with rhodium coating on the back and front. The data from the AFM measurements were processed using the data analysis software included with the AFM measuring device. The evaluation was performed at 25°C. The evaluation results are shown in Table 3 below.

[表3] [Table 3]

[由基材及黏著片構成之第2積層體L2之製作] <(甲基)丙烯酸系聚合物之調製> 於具備攪拌葉片、溫度計、氮氣導入管及冷卻器之四口燒瓶中,饋入含有丙烯酸2-甲氧乙酯(MEA)67重量份、丙烯酸正丁酯(BA)22重量份、丙烯酸苯氧乙酯(PEA)10重量份及丙烯酸4-羥丁酯(HBA)1重量份之單體混合物。接著,相對於單體混合物100重量份,將作為聚合引發劑之2,2'-偶氮雙異丁腈(AIBN;KISHIDA化學公司製)0.1重量份與乙酸乙酯100重量份一同饋入。一邊緩慢地攪拌混合物一邊將氮氣導入燒瓶內進行氮置換。將燒瓶內之液溫維持在55℃附近使其進行8小時之聚合反應,而調製出重量平均分子量(Mw)200萬之(甲基)丙烯酸系聚合物之溶液。[Preparation of the second laminate L2, consisting of a substrate and an adhesive sheet] <Preparation of (meth)acrylic polymer> In a four-necked flask equipped with a stirrer, thermometer, nitrogen inlet tube, and cooler, a monomer mixture containing 67 parts by weight of 2-methoxyethyl acrylate (MEA), 22 parts by weight of n-butyl acrylate (BA), 10 parts by weight of phenoxyethyl acrylate (PEA), and 1 part by weight of 4-hydroxybutyl acrylate (HBA) was added. Next, relative to 100 parts by weight of the monomer mixture, 0.1 parts by weight of 2,2'-azobisisobutyronitrile (AIBN; manufactured by KISHIDA Chemical Co., Ltd.) as a polymerization initiator and 100 parts by weight of ethyl acetate were added together. While slowly stirring the mixture, nitrogen was introduced into the flask for nitrogen replacement. The liquid temperature in the flask was maintained at around 55°C for 8 hours to allow the polymerization reaction to proceed, thereby preparing a solution of (meth)acrylic acid polymer with a weight average molecular weight (Mw) of 2 million.

(甲基)丙烯酸系聚合物之重量平均分子量(Mw)係利用GPC(凝膠滲透層析法)來測定。將GPC之測定條件顯示於下。 ・分析裝置:東曹(Tosoh)公司製,HLC-8120GPC ・管柱:東曹(Tosoh)公司製,G7000HXL+GMHXL+GMHXL ・管柱尺寸:各7.8mmφ×30cm 計90cm ・管柱溫度:40℃ ・流量:0.8mL/分鐘 ・注入量:100µL ・溶析液:四氫呋喃 ・檢測器:示差折射計(RI) ・標準試料:聚苯乙烯The weight-average molecular weight (Mw) of (meth)acrylic acid polymers was determined using GPC (gel osmosis chromatography). The determination conditions for GPC are shown below: • Analytical apparatus: Tosoh HLC-8120GPC • Column: Tosoh G7000HXL+GMHXL+GMHXL • Column dimensions: 7.8mm φ × 30cm (total 90cm) • Column temperature: 40℃ • Flow rate: 0.8mL/min • Injection volume: 100µL • Solution: Tetrahydrofuran • Detector: Differential refractometer (RI) • Standard sample: Polystyrene

<黏著片及第2積層體L2之製作> 相對於上述調製出之(甲基)丙烯酸系聚合物之溶液的固體成分100重量份,進一步摻混0.3重量份之交聯劑(東曹(Tosoh)公司製,製品名;Coronate 2770)、作為抗靜電劑之8重量份之1-乙-3-甲基咪唑鎓雙(氟磺醯基)醯亞胺(EMI-FSI);(第一工業製藥公司製,商品名:Elexcel AS110)、及0.5重量份之抗氧化劑(BASF公司製,商品名;Irganox1010),而調製出(甲基)丙烯酸系黏著劑組成物之溶液。接著,將調製出之溶液塗佈於脫模薄膜(Mitsubishi Polyester Film公司製,MRF38)之單面上。所用脫模薄膜係經聚矽氧系剝離劑進行過表面處理之聚對苯二甲酸乙二酯薄膜。使藉由塗佈而形成之塗佈膜在155℃下乾燥1分鐘,藉此獲得脫模薄膜之表面形成有黏著片之第2積層體L2-1。所形成之黏著片之厚度為20µm。又,除了將抗靜電劑之摻混量設為6重量份外,依與上述相同方式而獲得脫模薄膜之表面形成有黏著片之第2積層體L2-2。針對製出之各第2積層體L2評估黏著片之表面電阻率,結果關於積層體L2-1係得2.0×108Ω/□,關於積層體L2-2係得2.0×109Ω/□。黏著片之表面電阻率係以與抗靜電層之表面電阻率相同方式來測定。黏著片之表面電阻率在DIN試驗前後幾乎沒變化。<Preparation of Adhesive Sheet and Second Lamination L2> To the solid component of the above-prepared (meth)acrylic polymer solution, 0.3 parts by weight of a crosslinking agent (Tosoh Corporation, product name: Coronate 2770), 8 parts by weight of 1-ethyl-3-methylimidazolium bis(fluorosulfonyl)imidamine (EMI-FSI) (Daiichi Kogyo Pharmaceutical Co., Ltd., trade name: Elexcel AS110) as an antistatic agent, and 0.5 parts by weight of an antioxidant (BASF Corporation, trade name: Irganox 1010) were further mixed to prepare a solution of (meth)acrylic adhesive composition. Next, the prepared solution was applied to one side of a release film (Mitsubishi Polyester Film, MRF38). The release film used was a polyethylene terephthalate film surface-treated with a polysiloxane-based release agent. The coating film was dried at 155°C for 1 minute to obtain a second laminate L2-1 with an adhesive sheet on the surface of the release film. The thickness of the adhesive sheet was 20µm. Furthermore, except that the amount of antistatic agent added was set to 6 parts by weight, a second laminate L2-2 with an adhesive sheet on the surface of the release film was obtained in the same manner as described above. The surface resistivity of the adhesive sheets was evaluated for each of the fabricated second-stage laminates L2. The results for laminate L2-1 were 2.0 × 10⁸ Ω/□, and for laminate L2-2 were 2.0 × 10⁹ Ω/□. The surface resistivity of the adhesive sheets was measured in the same manner as that of the antistatic layer. The surface resistivity of the adhesive sheets remained almost unchanged before and after the DIN test.

[光學積層體之製作] 將上述製出之第2積層體L2之黏著片與第1積層體L1之抗靜電層接合,而製出依序積層有偏光薄膜、抗靜電層、黏著片及脫模薄膜之光學積層體。將使用第1積層體L1-1至L1-18各積層體製出之光學積層體作為實施例1~18。將使用第1積層體L1-19及L1-20各積層體製出之光學積層體作為比較例1、2。[Fabrication of Optical Laminate] The adhesive sheet of the second laminate L2 fabricated above is bonded to the antistatic layer of the first laminate L1 to produce an optical laminate in which a polarizing film, an antistatic layer, an adhesive sheet, and a release film are sequentially laminated. Optical laminates fabricated using laminates L1-1 to L1-18 are examples 1 to 18. Optical laminates fabricated using laminates L1-19 and L1-20 are examples 1 and 2.

[光學積層體之評估] 針對製出之各光學積層體(DIN試驗前及DIN試驗後)實施ESD試驗及TSP試驗。且,針對製出之各光學積層體(DIN試驗前),評估抗靜電層所致之全光線透射率之損耗與捲曲特性。[Evaluation of Optical Laminates] ESD and TSP tests were performed on each manufactured optical laminate (before and after DIN testing). Furthermore, for each manufactured optical laminate (before DIN testing), the loss of total light transmittance and warping characteristics caused by the antistatic layer were evaluated.

(ESD試驗) 從評估對象之光學積層體剝離脫模薄膜後,透過光學積層體所具備之黏著片貼合於具有圖8所示構成之內置型影像顯示面板(液晶面板)之視辨側。接著,於偏光薄膜之側面部塗佈寬10mm之銀糊膏,並與外部之接地電極連接。銀糊膏之塗佈係以覆蓋偏光薄膜、抗靜電層及黏著片之側面部之方式來實施。接著,將影像顯示面板設於背光裝置上,以施加電壓9kV對視辨側之偏光薄膜面發射靜電放電槍(Electrostatic discharge gun),確認顯示功能是否發生異常。評估基準如下。 A:於畫面未觀察到異常,顯示功能為正常。 B:於畫面發生橫線、忽隱忽現等異常,但顯示功能會自動回復。 C:於畫面發生橫線、忽隱忽現等異常,且顯示功能無法恢復。(ESD Test) After peeling the release film from the optical laminate of the evaluation object, it is attached to the viewing side of the built-in image display panel (liquid crystal panel) with the configuration shown in Figure 8 using the adhesive sheet provided by the optical laminate. Next, a 10mm wide silver paste is applied to the side surface of the polarizing film and connected to an external ground electrode. The silver paste is applied by covering the polarizing film, the antistatic layer, and the side surface of the adhesive sheet. Then, the image display panel is placed on the backlight device, and an electrostatic discharge gun is fired at the polarizing film surface on the viewing side with a voltage of 9kV to check whether the display function is abnormal. The evaluation criteria are as follows: A: No abnormalities were observed on the screen, and the display function is normal. B: Horizontal lines or intermittent appearances occurred on the screen, but the display function automatically recovered. C: Horizontal lines or intermittent appearances occurred on the screen, and the display function could not be restored.

(TSP試驗) 從評估對象之光學積層體剝離脫模薄膜後,透過光學積層體所具備之黏著片貼合於具有圖8所示構成之內置型影像顯示面板(液晶面板)之視辨側。接著,將位於貼合有光學積層體之影像顯示裝置的透明電極圖案周邊部之繞線配線與控制器IC連接,而製出內建觸控感測機能之影像顯示裝置。以肉眼觀察觸控感測器對該裝置之輸入顯示,確認有無故障失效。 A:無故障失效。 D:有故障失效。(TSP Test) After peeling the release film from the optical laminate of the evaluation object, it is bonded to the viewing side of the built-in image display panel (liquid crystal panel) with the configuration shown in Figure 8 through the adhesive sheet provided by the optical laminate. Next, the winding wiring around the transparent electrode pattern of the image display device with the bonded optical laminate is connected to the controller IC to create an image display device with built-in touch sensing function. The input display of the touch sensor to the device is visually observed to confirm whether there is a fault. A: No fault. D: Fault present.

(全光線透射率之損耗) 全光線透射率之損耗係藉由上述方法實施。(Loss of total light transmittance) The loss of total light transmittance is achieved by the method described above.

(捲曲特性) 針對製出之各光學積層體,藉由以肉眼之觀察來評估捲曲程度。評估基準如下。 A:捲曲受到抑制而良好。 B:雖有些許捲曲,但使用上無問題。 C:雖觀察到捲曲,但使用上無問題。 D:捲曲得很厲害,可能會於使用上發生問題。(Curling Characteristics) The degree of curling of each optical laminate was evaluated by visual observation. The evaluation criteria are as follows: A: Curling is well suppressed. B: Some curling, but no problem in use. C: Curling is observed, but no problem in use. D: Severe curling, which may cause problems in use.

將評估結果列示於以下表4中。The evaluation results are listed in Table 4 below.

[表4] [Table 4]

如表4所示,以抗靜電層中之粒子面積率與總電流值之乘積因DIN試驗而大幅變化的比較例1、2(E/D>300)來說,在DIN試驗前之ESD試驗的結果得B,而在DIN試驗後之TSP試驗之結果得D。實施例中,以形成抗靜電層時之乾燥溫度為70℃的實施例1、抗靜電層之塗敷液之溶劑為IPA100%或IPA與水之混合溶劑的實施例6、7、抗靜電層之塗敷液中添加有調平劑的實施例10、11來說,E/D大於10。又,作為黏結劑樹脂僅包含Tg低於0℃之樹脂的實施例19,其E/D大於80。進而,關於形成抗靜電層時之乾燥溫度為70℃的實施例1、抗靜電層之塗敷液之溶劑為IPA 100%或IPA與水之混合溶劑的實施例6、7中,全光線透射率之變化量的絕對值為0.27%以上。As shown in Table 4, in comparative examples 1 and 2 (E/D > 300) where the product of particle area ratio and total current value in the antistatic layer changes significantly due to the DIN test, the result of the ESD test before the DIN test is B, while the result of the TSP test after the DIN test is D. In the embodiments, in example 1 where the drying temperature during the formation of the antistatic layer is 70°C, in examples 6 and 7 where the solvent of the antistatic layer coating solution is 100% IPA or a mixture of IPA and water, and in examples 10 and 11 where a leveling agent is added to the antistatic layer coating solution, the E/D is greater than 10. Furthermore, in Embodiment 19, where the binder resin contains only resins with a Tg below 0°C, its E/D ratio is greater than 80. Moreover, in Embodiment 1, where the drying temperature during the formation of the antistatic layer is 70°C, and in Embodiments 6 and 7, where the solvent for the antistatic layer coating solution is 100% IPA or a mixture of IPA and water, the absolute value of the change in total light transmittance is 0.27% or more.

如表4所示,形成抗靜電層時之乾燥溫度若達130℃以上(實施例4~5),且愈使用捲曲直徑小之偏光薄膜,捲曲程度就愈強。As shown in Table 4, if the drying temperature during the formation of the antistatic layer reaches 130°C or higher (Examples 4-5), and the smaller the diameter of the polarizing film used, the stronger the degree of curling.

產業上之可利用性 本發明光學積層體適於應用於例如如在車輛內部這種因周圍存在其他電子機器而容易產生靜電、並且容易達至高溫高濕之環境下使用之影像顯示裝置。Industrial Applicability: The optical multilayer of this invention is suitable for use in image display devices in environments such as vehicle interiors, where static electricity is easily generated due to the presence of other electronic devices, and where high temperature and humidity are easily reached.

1:黏著片2,73A,73B,73C:抗靜電層2B-2B,2C-2C:線3:光學薄膜4:剝離襯材10,10A,10B:光學積層體11,11A,11B,11C:影像顯示面板30A,30B:影像顯示單元31:第1透明基板32:影像形成層33:第2透明基板35:觸控感測電極部36:觸控感測器電極37:觸控驅動電極40:導電層51:偏光薄膜51C,61C,62C,63C:中心面52:試驗片53a:端部53b:另一端部54:評估用片材55:圓筒部分56:黏著膠帶61:偏光件62,63:透明保護薄膜64A:一主面64B:另一主面71:測定試樣72:AFM圓盤74:導電性膠帶75:金屬糊膏d61,d62,d63:距離P61,P62,P63:膨脹力1: Adhesive sheet; 2, 73A, 73B, 73C: Antistatic layer; 2B-2B, 2C-2C: Wire; 3: Optical thin film; 4: Peel-off liner; 10, 10A, 10B: Optical laminate; 11, 11A, 11B, 11C: Image display panel; 30A, 30B: Image display unit; 31: First transparent substrate; 32: Image forming layer; 33: Second transparent substrate; 35: Touch sensing electrode; 36: Touch sensor electrode. 7: Touch drive electrode 40: Conductive layer 51: Polarizing film 51C, 61C, 62C, 63C: Center surface 52: Test piece 53a: End 53b: Other end 54: Evaluation sheet 55: Cylindrical part 56: Adhesive tape 61: Polarizing element 62, 63: Transparent protective film 64A: One main surface 64B: Another main surface 71: Test sample 72: AFM disk 74: Conductive tape 75: Metal paste d 61 , d 62 , d 63 : Distance P 61 , P 62 , P 63 : Expansion force

圖1為剖面圖,其示意顯示本實施形態之光學積層體之一例。 圖2A為示意顯示測定試樣的俯視圖,該測定試樣係使用於抗靜電層中之粒子面積率及總電流值之評估。 圖2B為示意顯示測定試樣的剖面圖,該測定試樣係使用於抗靜電層中之粒子面積率及總電流值之評估。 圖2C為示意顯示測定試樣的剖面圖,該測定試樣係使用於抗靜電層中之粒子面積率及總電流值之評估。 圖3為示意圖,其用以說明偏光薄膜之捲曲直徑之試驗法。 圖4為示意圖,其用以說明偏光薄膜在加熱時之彎曲力矩M。 圖5為剖面圖,其示意顯示本實施形態之光學積層體之另一例。 圖6為剖面圖,其示意顯示本實施形態之影像顯示面板之一例。 圖7為剖面圖,其示意顯示本實施形態之影像顯示面板之另一例。 圖8為剖面圖,其示意顯示本實施形態之影像顯示面板之另一例。Figure 1 is a cross-sectional view schematically showing an example of an optical laminate of this embodiment. Figure 2A is a top view schematically showing a test sample used for evaluating the particle area ratio and total current value in an antistatic layer. Figure 2B is a cross-sectional view schematically showing a test sample used for evaluating the particle area ratio and total current value in an antistatic layer. Figure 2C is a cross-sectional view schematically showing a test sample used for evaluating the particle area ratio and total current value in an antistatic layer. Figure 3 is a schematic diagram illustrating the test method for the bending diameter of a polarizing film. Figure 4 is a schematic diagram illustrating the bending moment M of a polarizing film during heating. Figure 5 is a cross-sectional view illustrating another example of the optical laminate of this embodiment. Figure 6 is a cross-sectional view illustrating an example of the image display panel of this embodiment. Figure 7 is a cross-sectional view illustrating another example of the image display panel of this embodiment. Figure 8 is a cross-sectional view illustrating another example of the image display panel of this embodiment.

1:黏著片 1: Adhesive sheet

2:抗靜電層 2: Antistatic layer

3:光學薄膜 3: Optical Thin Films

10,10A:光學積層體 10,10A: Optical laminates

Claims (22)

一種光學積層體,具備黏著片、抗靜電層及光學薄膜;並且 前述抗靜電層包含導電性粒子;且 前述抗靜電層滿足以下式(1); 0.01≦E/D≦300    (1) 惟,前述式(1)之D係針對前述抗靜電層利用原子力顯微鏡評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q; 前述式(1)之E係針對歷經德國工業規格DIN75220所規定之耐候性試驗(試驗條件:Z-IN1)之前述抗靜電層利用原子力顯微鏡評估之粒子面積率P(%)與總電流值Q(nA)之乘積(P×0.01)×Q。An optical laminate comprising an adhesive sheet, an antistatic layer, and an optical thin film; wherein the aforementioned antistatic layer contains conductive particles; and wherein the aforementioned antistatic layer satisfies the following formula (1); 0.01≦E/D≦300    (1) However, D in the aforementioned formula (1) is the product of the particle area ratio P (%) and the total current value Q (nA) of the aforementioned antistatic layer as evaluated by atomic force microscopy (P×0.01)×Q; E in the aforementioned formula (1) is the product of the particle area ratio P (%) and the total current value Q (nA) of the antistatic layer as evaluated by atomic force microscopy after undergoing the weather resistance test specified by German industrial standard DIN75220 (test condition: Z-IN1) (P×0.01)×Q. 如請求項1之光學積層體,其中前述抗靜電層之厚度為5nm以上且100nm以下。For example, in the optical multilayer of claim 1, the thickness of the aforementioned antistatic layer is 5 nm or more and 100 nm or less. 如請求項1之光學積層體,其中前述導電性粒子包含奈米碳管。The optical laminate of claim 1, wherein the aforementioned conductive particles comprise carbon nanotubes. 如請求項3之光學積層體,其中前述奈米碳管之長度為3µm以上且300µm以下,且直徑為10nm以下。For example, in the optical laminate of claim 3, the aforementioned carbon nanotubes have a length of 3µm or more and 300µm or less, and a diameter of 10nm or less. 如請求項1之光學積層體,其中前述抗靜電層包含黏結劑樹脂。The optical laminate of claim 1, wherein the aforementioned antistatic layer comprises an adhesive resin. 如請求項1之光學積層體,其中前述抗靜電層包含玻璃轉移溫度為0℃以上之黏結劑樹脂。The optical laminate of claim 1, wherein the aforementioned antistatic layer comprises an adhesive resin having a glass transition temperature of 0°C or higher. 如請求項5之光學積層體,其中玻璃轉移溫度為0℃以上之前述黏結劑樹脂在前述抗靜電層所含之全部前述黏結劑樹脂中所佔之比率為50重量%以上。For example, in the optical laminate of claim 5, the glass transition temperature is above 0°C and the proportion of the aforementioned adhesive resin in all the aforementioned adhesive resin contained in the aforementioned antistatic layer is 50% by weight or more. 如請求項1之光學積層體,其中前述抗靜電層實質上不含調平劑。The optical laminate of claim 1, wherein the aforementioned antistatic layer does not actually contain a leveling agent. 如請求項1之光學積層體,其中前述黏著片係由含聚合物(A)之黏著劑組成物形成。As in claim 1, the optical laminate wherein the aforementioned adhesive sheet is formed from an adhesive composition containing polymer (A). 如請求項9之光學積層體,其中前述聚合物(A)為(甲基)丙烯酸系聚合物。For example, in the optical laminate of claim 9, the aforementioned polymer (A) is a (meth)acrylic polymer. 如請求項9之光學積層體,其中前述黏著劑組成物包含具有聚醚結構之前述聚合物(A)作為主成分。As in claim 9, the optical laminate contains the aforementioned adhesive composition comprising the aforementioned polymer (A) having a polyether structure as the main component. 如請求項11之光學積層體,其中前述聚合物(A)具有源自以下式(2)所示單體之結構單元; [化學式1] 式(2)之R1為氫原子或甲基,R2為可為直鏈狀或可具有支鏈之烷基,n為1~15之整數。The optical laminate of claim 11, wherein the aforementioned polymer (A) has structural units derived from the monomer shown in formula (2); [Chemical Formula 1] In formula (2), R1 is a hydrogen atom or a methyl group, R2 is an alkyl group that can be linear or branched, and n is an integer from 1 to 15. 如請求項9之光學積層體,其中前述黏著劑組成物更包含抗靜電劑。For example, in the optical laminate of claim 9, the aforementioned adhesive composition further includes an antistatic agent. 如請求項13之光學積層體,其中前述黏著劑組成物中,相對於前述聚合物(A)100重量份,前述抗靜電劑之摻混量小於30重量份。For example, in the optical laminate of claim 13, the amount of the antistatic agent in the aforementioned adhesive composition is less than 30 parts by weight relative to 100 parts by weight of the aforementioned polymer (A). 如請求項1之光學積層體,其中前述抗靜電層所致之全光線透射率之損耗為1.0%以下。For example, in the optical laminate of claim 1, the loss of total light transmittance due to the aforementioned antistatic layer is less than 1.0%. 如請求項1之光學積層體,其中前述光學薄膜包含偏光薄膜。The optical laminate of claim 1, wherein the aforementioned optical thin film includes a polarizing thin film. 如請求項16之光學積層體,其中前述偏光薄膜藉由以下試驗法評估之捲曲直徑為3mm以上; <試驗法> 準備一試驗片,該試驗片係以偏光件之吸收軸為長邊方向,並將前述光學薄膜加工成寬10mm×長50mm之長方形者;接著,將前述試驗片之長邊方向之一端部固定於評估用片材之表面上;接著,將整體以105℃及12小時加熱,使前述試驗片從前述試驗片之長邊方向之另一端部捲曲;求出前述試驗片因捲曲而形成之圓筒部分之直徑作為前述捲曲直徑。For example, in the optical laminate of claim 16, the bending diameter of the aforementioned polarizing film is 3 mm or more as evaluated by the following test method: <Test Method> Prepare a test piece, which is a rectangle with the absorption axis of the polarizing element as the long side direction, and the aforementioned optical film is processed into a rectangle with a width of 10 mm and a length of 50 mm; then, fix one end of the long side direction of the aforementioned test piece to the surface of the evaluation sheet; then, heat the whole body at 105°C for 12 hours, so that the aforementioned test piece is bent from the other end of the long side direction of the aforementioned test piece; determine the diameter of the cylindrical portion formed by the bending of the aforementioned test piece as the aforementioned bending diameter. 如請求項16之光學積層體,其中前述偏光薄膜在加熱時之彎曲力矩M的絕對值小於1×109For example, in the optical laminate of claim 16, the absolute value of the bending moment M of the aforementioned polarizing film when heated is less than 1× 10⁹ . 如請求項1之光學積層體,其中前述導電性粒子包含奈米碳管;且 前述抗靜電層包含玻璃轉移溫度為0℃以上之黏結劑樹脂。The optical laminate of claim 1, wherein the aforementioned conductive particles comprise carbon nanotubes; and the aforementioned antistatic layer comprises a binder resin with a glass transition temperature of 0°C or higher. 如請求項19之光學積層體,其中前述奈米碳管之長度為3µm以上且300µm以下,且直徑為10nm以下。For example, in the optical laminate of claim 19, the aforementioned carbon nanotubes have a length of 3µm or more and 300µm or less, and a diameter of 10nm or less. 一種影像顯示面板,具備如請求項1至20中任一項之光學積層體。An image display panel having an optical layer as described in any of claims 1 to 20. 一種影像顯示裝置,具備如請求項21之影像顯示面板。An image display device having an image display panel as claimed in claim 21.
TW114119982A 2024-05-31 2025-05-28 Optical laminates, image display panels, and image display devices TW202601246A (en)

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