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TW202409731A - Resin composition, dry film, cured product, and electronic component - Google Patents

Resin composition, dry film, cured product, and electronic component Download PDF

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TW202409731A
TW202409731A TW112115983A TW112115983A TW202409731A TW 202409731 A TW202409731 A TW 202409731A TW 112115983 A TW112115983 A TW 112115983A TW 112115983 A TW112115983 A TW 112115983A TW 202409731 A TW202409731 A TW 202409731A
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resin composition
resin
carboxyl group
mass
film
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小田桐悠斗
中島孝典
小山尚人
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日商太陽控股股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04Polyurethanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/65Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02Homopolymers or copolymers of acids; Metal or ammonium salts thereof
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2237Oxides; Hydroxides of metals of titanium
    • C08K2003/2241Titanium dioxide

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  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
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  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

提供能夠兼具低翹曲及回焊步驟後的高反射率之樹脂組成物等。其特徵在於,其為包含(A)含羧基之胺基甲酸乙酯樹脂及(E)呈白色的著色劑的樹脂組成物,其硬化塗膜的在頻率1Hz的動態黏彈性測定中,損耗正切峰的溫度(Tg)為100℃以下,損耗正切的峰為0.5~1.5的範圍。Provided are resin compositions that have both low warping and high reflectivity after a reflow step. The resin composition is characterized in that it comprises (A) a carboxyl-containing urethane resin and (E) a white coloring agent, and in a dynamic viscoelasticity measurement at a frequency of 1 Hz, the loss tangent peak temperature (Tg) of the cured coating is below 100°C, and the loss tangent peak is in the range of 0.5 to 1.5.

Description

樹脂組成物、乾膜、硬化物及電子零件Resin compositions, dry films, hardened materials and electronic parts

本發明是有關於樹脂組成物、乾膜、硬化物以及電子零件。The present invention relates to resin compositions, dry films, cured products and electronic parts.

近年,印刷電路板使用於直接安裝於可攜式終端、電腦、電視等的液晶顯示器的背光或照明器具的光源等之低電力發光的發光二極體(LED)用途逐漸增加。用於此種用途的印刷電路板,為了更有效率地利用LED的光,要求高反射率,將LED安裝於印刷電路板時能夠提升整體的照度的焊料光阻膜。專利文獻1~4揭示能夠使用於此種焊料光阻膜的白色硬化性樹脂組成物。 [先前技術文獻] [專利文獻] In recent years, the use of low-power light-emitting diodes (LEDs) for backlights or light sources of lighting equipment directly mounted on printed circuit boards such as portable terminals, computers, and televisions has gradually increased. In order to more efficiently utilize the light of the LED, printed circuit boards used for such purposes require a solder resist film with high reflectivity and the ability to increase the overall illumination when the LED is mounted on the printed circuit board. Patent documents 1 to 4 disclose white curable resin compositions that can be used for such solder resist films. [Prior technical document] [Patent document]

專利文獻1:日本特開2009-149878號公報 專利文獻2:專利第4538521號公報 專利文獻3:專利第4538484號公報 專利文獻4:專利第4340272號公報 Patent Document 1: Japanese Patent Application Publication No. 2009-149878 Patent document 2: Patent No. 4538521 Patent document 3: Patent No. 4538484 Patent document 4: Patent No. 4340272

[發明所欲解決之課題][The problem that the invention wants to solve]

液晶顯示器是由將藉由施加電壓改變偏光狀態的液晶及偏光膜組合所構成的光衰減器,及設置於其後方的背光模組所構成。以往的液晶顯示器中,長久以來使用背光模組為全面均勻地發光的形式,藉由因應背景的明暗分割發光區塊的分割驅動方式,與只在需要亮度的位置使LED點燈的區域調光(local dimming)技術組合而改善對比的提升的技術開發正在進行中。分割驅動方式中,使用導光板將排列於畫面邊緣的LED的光引導至畫面整體的側光式(edge)LED背光,藉由將LED安裝於畫面的背面(直下)而實現,分割數從數十到100前後者已經產品化。 分割數小的情況時,光滲漏至本來應該顯示黑暗的區域使明亮區的輪廓變得模糊的暈輪效應(halo effect)成為醒目,無法獲得足夠的影像美感。因此近年來,從提升對比的觀點而言,有提案將LED的尺寸縮小至約1mm以下的迷你LED以覆蓋於基板的方式排列的直下式迷你LED背光。 以增加安裝於背光模組的Mini LED的個數、增大電路密度、實現薄型的背光等為目標,預想除了以往使用的FR4等的PCB基板之外,往後使用容易將TFT設置為平面而容易實現主動矩陣構成的玻璃基板、能夠貢獻於曲面實現、薄型化的可撓式基板(FPC)的機會也會增大。 製造此種直下式LED背光模組時,將具備絕緣性及高反射率的白色感光性樹脂組成物塗佈於上述玻璃基板的全面,藉由曝光、顯影、熱硬化的各步驟,或者將白色熱硬化性樹脂組成物使用僅在Mini LED設置位置進行開口的圖案進行網版印刷,藉由熱硬化步驟,形成設置Mini LED的圖案。之後,藉由回焊步驟,為了於形成的圖案的開口部焊接Mini LED,再次經過熱步驟。 如上述的直下式LED背光模組,例如,為了製造用於大型液晶顯示器或者用於小型顯示器的多倒角,背光用的玻璃基板也成為例如第8世代(2160mm×2460mm)般的大小。因此,使用具備絕緣性及高反射率的白色感光性樹脂組成物或白色熱硬化性樹脂組成物形成上述的Mini LED設置用圖案的情況時,此等樹脂組成物塗佈於玻璃基板的面積也增大。再者,為了顯示器的薄型化、輕量化,玻璃基板本身也從以往的約3mm、薄化至1mm以下的0.7mm、0.5mm。因為此種塗佈面積的增加及玻璃的薄型化,因圖案形成時的各步驟、在其後的回焊步驟的加熱導致的白色感光性樹脂組成物或白色熱硬化性樹脂組成物的收縮,有玻璃基板成為容易翹曲的問題。 如同上述,以往的白色感光性樹脂組成物或白色熱硬化性樹脂組成物使用於顯示器的背光模組,由於因回焊步驟後的翹曲導致基板彎曲,有無法因應顯示器的薄型化、輕量化等的問題。再者,顯示器的背光用途也要求回焊步驟後的高反射率的維持,以往的白色感光性樹脂組成物或白色熱硬化性樹脂組成物,有難以兼具低翹曲及回焊步驟後的高反射率的問題。 A liquid crystal display is composed of a light attenuator, which is a combination of liquid crystal and a polarizing film that changes the polarization state by applying a voltage, and a backlight module placed behind it. In conventional LCD displays, backlight modules have been used for a long time to emit light uniformly across the entire surface, using a split driving method that divides light-emitting areas according to the light and dark of the background, and area dimming that only lights up LEDs where brightness is required. (Local dimming) technology combination to improve contrast enhancement technology development is in progress. In the split drive method, a light guide plate is used to guide the light of LEDs arranged at the edge of the screen to an edge-lit (edge) LED backlight of the entire screen. This is achieved by mounting the LED on the back (directly below) of the screen. The number of divisions is from The latter has been commercialized between ten and 100 years ago. When the division number is small, light leaks into areas that are supposed to be dark, causing a halo effect that blurs the outline of bright areas, making it impossible to obtain sufficient image beauty. Therefore, in recent years, from the perspective of improving contrast, direct-type mini LED backlights have been proposed in which mini LEDs are reduced in size to about 1 mm or less and arranged to cover a substrate. In order to increase the number of Mini LEDs installed in the backlight module, increase the circuit density, and realize a thin backlight, it is expected that in addition to the conventionally used PCB substrates such as FR4, it is expected that TFTs can be easily installed on a flat surface in the future. Opportunities for glass substrates that can easily implement active matrix structures and flexible substrates (FPCs) that can contribute to curved surface realization and thinning will also increase. When manufacturing such a direct-type LED backlight module, a white photosensitive resin composition with insulation and high reflectivity is coated on the entire surface of the above-mentioned glass substrate, and through the steps of exposure, development, and thermal hardening, or the white The thermosetting resin composition is screen-printed using a pattern with openings only at the position where the Mini LED is installed, and through the thermosetting step, a pattern in which the Mini LED is installed is formed. After that, through the reflow step, in order to solder the Mini LED to the opening of the formed pattern, the heat step is performed again. For the direct-type LED backlight module described above, for example, in order to produce multiple chamfers for use in large liquid crystal displays or small displays, the glass substrate for the backlight has become, for example, the size of the 8th generation (2160mm×2460mm). Therefore, when the above-mentioned Mini LED installation pattern is formed using a white photosensitive resin composition or a white thermosetting resin composition having insulating properties and high reflectivity, the area of the glass substrate coated with these resin compositions is also increase. Furthermore, in order to reduce the thickness and weight of displays, the glass substrate itself has also been thinned from about 3mm in the past to 0.7mm and 0.5mm below 1mm. Due to such an increase in the coating area and the thinning of the glass, the white photosensitive resin composition or the white thermosetting resin composition shrinks due to heating in each step during pattern formation and in the subsequent reflow step. There is a problem with glass substrates becoming prone to warping. As mentioned above, the conventional white photosensitive resin composition or white thermosetting resin composition used in the backlight module of the display cannot cope with the thinning and weight reduction of the display due to the warping of the substrate after the reflow step. Waiting questions. In addition, the backlight application of displays also requires the maintenance of high reflectivity after the reflow step. It is difficult for conventional white photosensitive resin compositions or white thermosetting resin compositions to have both low warpage and high reflectivity after the reflow step. High reflectivity problem.

本發明是有鑑於此種以往技術的問題點而完成者,其目的在於提供能夠兼具低翹曲及回焊步驟後的高反射率之樹脂組成物,及使用其之乾膜、硬化物以及電子零件。 [用以解決課題之手段] The present invention was completed in view of the problems of such conventional technologies, and its object is to provide a resin composition that can have both low warpage and high reflectivity after the reflow step, and a dry film, a cured product and a resin composition using the same. Electronic parts. [Means used to solve problems]

本發明者們為了實現上述目的而努力研究。其結果發現,藉由使用於硬化塗膜的在頻率1Hz的動態黏彈性測定中,具有特定的性狀的組成物,能夠兼具回焊步驟後的高反射率及低翹曲,而解決上述上述課題,完成本發明。The inventors of the present invention have made efforts to achieve the above object. As a result, they found that by using a composition with specific properties in the dynamic viscoelasticity measurement at a frequency of 1 Hz of the cured coating, it was possible to achieve both high reflectivity and low warpage after the reflow step, thus solving the above-mentioned problems. subject, and completed the present invention.

亦即,本發明的樹脂組成物為包含(A)含羧基之胺基甲酸乙酯樹脂及(E)呈白色的著色劑的樹脂組成物,其特徵在於,其硬化塗膜的在頻率1Hz的動態黏彈性測定中,損耗正切(tanδ)峰的溫度(玻璃轉移溫度,以下稱為Tg)為100℃以下,損耗正切的峰為0.5~1.5的範圍。再者,本發明中的動態黏彈性測定是指經由動態黏彈性測定裝置(DMA、TA Instruments Japan(股)製、型號:RSA-G2),以溫度範圍為-60℃~300℃、升溫速度為5℃/min、頻率為1Hz的條件所測定者。Tg與損耗正切(tanδ)的峰的測定方法的細節,如同下述。That is, the resin composition of the present invention is a resin composition containing (A) a carboxyl group-containing urethane resin and (E) a white coloring agent, and is characterized in that the cured coating film has a frequency of 1 Hz. In the dynamic viscoelasticity measurement, the temperature of the loss tangent (tanδ) peak (glass transition temperature, hereinafter referred to as Tg) is 100°C or less, and the loss tangent peak is in the range of 0.5 to 1.5. Furthermore, the dynamic viscoelasticity measurement in the present invention refers to a dynamic viscoelasticity measurement device (DMA, manufactured by TA Instruments Japan Co., Ltd., model: RSA-G2), with a temperature range of -60°C to 300°C and a heating rate of Measured under the conditions of 5℃/min and frequency 1Hz. The details of the method for measuring the peaks of Tg and loss tangent (tanδ) are as follows.

樹脂組成物為感光性樹脂組成物的情況時,將感光性樹脂組成物於銅箔上,以網版印刷乾燥後的膜厚為30μm的方式全面塗佈,形成樹脂層。之後,將此樹脂層以80℃的熱風循環式乾燥爐乾燥30分鐘後,使用搭載金屬鹵素燈的曝光裝置(HMW-680-GW20: ORC MANUFACTURING (股)),以900mJ/cm 2的曝光量進行曝光,進行顯影(30℃、0.2MPa、1質量%Na 2CO 3水溶液)60秒。之後,將此樹脂層於熱風循環式乾燥爐以150℃、60分鐘的條件使其硬化,形成樹脂層的硬化塗膜,製作評價用基板。 When the resin composition is a photosensitive resin composition, the photosensitive resin composition is applied to the copper foil by screen printing in a manner that the film thickness after drying is 30 μm to form a resin layer. After that, the resin layer is dried in a hot air circulation drying oven at 80°C for 30 minutes, and then exposed with an exposure amount of 900 mJ/ cm2 using an exposure device equipped with a metal halogen lamp (HMW-680-GW20: ORC MANUFACTURING (Co., Ltd.)), and developed (30°C, 0.2 MPa, 1 mass% Na2CO3 aqueous solution) for 60 seconds. Afterwards, the resin layer was cured in a hot air circulation drying oven at 150°C for 60 minutes to form a cured coating film of the resin layer, thereby manufacturing an evaluation substrate.

再者,樹脂組成物為熱硬化性樹脂組成物的情況時,將熱硬化性樹脂組成物於銅箔上以網版印刷乾燥後的膜厚為30μm的方式全面塗佈,形成樹脂層。之後,將此樹脂層於熱風循環式乾燥爐以150℃、60分鐘的條件使其硬化,形成樹脂層的硬化塗膜,製作評價用基板。Furthermore, when the resin composition is a thermosetting resin composition, the thermosetting resin composition is applied to the copper foil by screen printing in a manner that the film thickness after drying is 30 μm to form a resin layer. Thereafter, the resin layer is cured in a hot air circulation drying furnace at 150°C for 60 minutes to form a cured coating of the resin layer, thereby preparing an evaluation substrate.

Tg與損耗正切(tanδ)的峰的值是將此等的形成於評價用基板上的樹脂層的硬化塗膜從銅箔剝離,將此硬化塗膜藉由動態黏彈性測定裝置(DMA、TA Instruments Japan(股)製、型號:RSA-G2)的拉伸模式進行測定。測定條件為溫度範圍為-60℃~300℃、升溫速度為5℃/min、頻率為1Hz、應變0.1%,樣本尺寸為寬度5mm×長度50mm。硬化塗膜是以在寬度方向的兩端部分別固定的方式設置,切除從夾頭突出的硬化塗膜。夾頭間距離設為10mm。The peak values of Tg and loss tangent (tan δ) were obtained by peeling off the cured coating film of the resin layer formed on the evaluation substrate from the copper foil, and measuring the cured coating film with a dynamic viscoelasticity measuring device (DMA, TA Instruments Japan Co., Ltd., model number: RSA-G2) was measured in the tensile mode. The measurement conditions are a temperature range of -60°C to 300°C, a heating rate of 5°C/min, a frequency of 1Hz, a strain of 0.1%, and a sample size of 5mm width × 50mm length. The hardened coating film is provided so as to be fixed at both ends in the width direction, and the hardened coating film protruding from the chuck is cut off. The distance between the chucks is set to 10mm.

本發明的樹脂組成物較佳為(E)呈白色的著色劑為氧化鈦,再者,較佳為(A)含羧基之胺基甲酸乙酯樹脂含有不具有芳香環的含羧基之胺基甲酸乙酯樹脂,再者,較佳為含有(D)環氧樹脂。再者,較佳為含有(A)含羧基之胺基甲酸乙酯樹脂以外的(F)其他的含羧基樹脂。本發明的樹脂組成物為感光性樹脂組成物的情況時,較佳為含有(B)二官能的(甲基)丙烯酸酯、(C)光聚合起始劑。在此,本發明中,(甲基)丙烯酸酯是總稱丙烯酸酯、甲基丙烯酸酯及此等的混合物的用語,關於其他類似的表示方法亦相同。In the resin composition of the present invention, it is preferred that (E) the white coloring agent is titanium oxide, and further, it is preferred that (A) the carboxyl group-containing urethane resin contains a carboxyl group-containing amine group that does not have an aromatic ring. Ethyl formate resin, further preferably contains (D) epoxy resin. Furthermore, it is preferable to contain (F) other carboxyl group-containing resins other than (A) carboxyl group-containing urethane resin. When the resin composition of the present invention is a photosensitive resin composition, it is preferable to contain (B) a difunctional (meth)acrylate and (C) a photopolymerization initiator. Here, in the present invention, (meth)acrylate is a term that collectively refers to acrylate, methacrylate, and mixtures thereof, and the same applies to other similar expression methods.

本發明的乾膜其特徵在於,具有將本發明的樹脂組成物於薄膜進行塗佈、乾燥所獲得的樹脂層。再者,本發明的硬化物其特徵在於,由本發明的樹脂組成物或本發明的乾膜所獲得。進而,本發明的電子零件其特徵在於,具有本發明的硬化物。 [發明的效果] The dry film of the present invention is characterized by having a resin layer obtained by applying the resin composition of the present invention to a film and drying it. Furthermore, the cured product of the present invention is characterized by being obtained from the resin composition of the present invention or the dry film of the present invention. Furthermore, the electronic component of the present invention is characterized by having the cured product of the present invention. [Effects of the invention]

根據本發明,能夠提供能夠兼具低翹曲及熱步驟後的高反射率的樹脂組成物、使用其之乾膜、硬化物以及電子零件。According to the present invention, a resin composition having low warp and high reflectivity after a heat treatment step, a dry film, a cured product and an electronic component using the same can be provided.

如同前述,本發明的樹脂組成物為包含(A)含羧基之胺基甲酸乙酯樹脂及(E)呈白色的著色劑之樹脂組成物,其硬化塗膜的在頻率1Hz的動態黏彈性測定中,Tg為100℃以下,損耗正切的峰為0.5~1.5的範圍,藉此,能夠兼具回焊步驟後的高反射率及低翹曲。As mentioned above, the resin composition of the present invention is a resin composition comprising (A) a carboxyl-containing urethane resin and (E) a white coloring agent, and the cured coating has a Tg of less than 100°C and a loss tangent peak in the range of 0.5 to 1.5 in a dynamic viscoelasticity measurement at a frequency of 1 Hz, thereby achieving both high reflectivity and low warp after the reflow step.

損耗正切(tanδ)為損失彈性模數相對於儲存彈性模數的比率,顯示於該溫度貢獻於黏性的程度。損耗正切為1顯示黏性與彈性為相同狀態,再者,1以上則顯示黏性增大,1以下則顯示彈性增大。此損耗正切的峰越大,由於由力、應變所產生的能量擴散於外部的成分成為較多,因此容易緩和發生的應力、應變。The loss tangent (tanδ) is the ratio of the loss elastic modulus to the storage elastic modulus, indicating the degree of contribution to viscosity at that temperature. A loss tangent of 1 indicates that the viscosity and elasticity are in the same state. Furthermore, a loss tangent of 1 or more indicates an increase in viscosity, and a loss tangent of less than 1 indicates an increase in elasticity. The larger the peak of this loss tangent is, the more energy generated by force and strain is diffused to the outside. Therefore, the generated stress and strain are easily relaxed.

一般而言,樹脂的交聯密度越低,形成的塗膜的柔軟性增加,硬化後的翹曲減少。藉由將本發明的樹脂組成物的各成分以如下述(1)~(3)所記載的摻合量摻合,將損耗正切(tanδ)的峰調整成為0.5~1.5之間,能夠達到以往的方法為困難的回焊步驟後的低翹曲。 (1)將於應力緩和有效果的(A)含羧基之胺基甲酸乙酯樹脂以相對於也包含(F)其他的含羧基樹脂的含羧基樹脂的總計100質量份,以75~90質量份摻合,(2)本發明的樹脂組成物為感光性樹脂組成物的情況時,為了不使交聯密度成為過高,相對於(甲基)丙烯酸酯的總計100質量份,摻合(B)二官能的(甲基)丙烯酸酯20~100質量份,(3)相對於(A)含羧基之胺基甲酸乙酯樹脂與亦包含(F)其他的含羧基樹脂的含羧基樹脂的總計100質量份,摻合(E)呈白色的著色劑50~500質量份。在此,損耗正切(tanδ)的峰的範圍為了降低翹曲,更佳為0.6~1.1、進而較佳為0.8~1.0。 再者,損耗正切(tanδ)的峰超過1.5的狀態,顯示為黏性是非常強的材料,此種材料難以維持焊接耐熱性、耐鍍性等特性。 Generally speaking, the lower the crosslinking density of the resin, the softer the formed coating is, and the less warp after curing. By blending the components of the resin composition of the present invention in the blending amounts described in (1) to (3) below, the peak of the loss tangent (tanδ) is adjusted to between 0.5 and 1.5, and low warp can be achieved after the reflow step, which was difficult with the previous method. (1) 75 to 90 parts by weight of (A) a carboxyl group-containing urethane resin having a stress-relieving effect is blended with a total of 100 parts by weight of a carboxyl group-containing resin including (F) another carboxyl group-containing resin. (2) When the resin composition of the present invention is a photosensitive resin composition, 20 to 100 parts by weight of (B) a difunctional (meth)acrylate is blended with a total of 100 parts by weight of the (meth)acrylate in order to prevent the crosslinking density from being too high. (3) 50 to 500 parts by weight of (E) a white colorant is blended with a total of 100 parts by weight of the carboxyl group-containing urethane resin and the carboxyl group-containing resin including (F) another carboxyl group-containing resin. Here, the range of the peak of the loss tangent (tanδ) is preferably 0.6 to 1.1, and further preferably 0.8 to 1.0 in order to reduce the warp. Furthermore, when the peak of the loss tangent (tanδ) exceeds 1.5, it is shown that the material has very strong viscosity, and it is difficult for such a material to maintain characteristics such as welding heat resistance and plating resistance.

本發明的樹脂組成物的硬化塗膜之在頻率1Hz的動態黏彈性測定中的Tg更佳為30℃~90℃、進而較佳為40℃~70℃。關於此Tg,也能夠藉由將本發明的樹脂組成物的各成分依照如下述 (1)~(2)所記載的摻合量進行摻合,而能夠調整為上述的範圍。 (1)將於應力緩和有效果的(A)含羧基之胺基甲酸乙酯樹脂以相對於也包含(F)其他的含羧基樹脂之含羧基樹脂的總計100質量份中,以75~90質量份、更佳為80~90質量份摻合,(2)本發明的樹脂組成物為感光性樹脂組成物的情況時,為了使交聯密度不要成為過高,相對於(甲基)丙烯酸酯的總計100質量份,摻合官能基數少的(B)二官能的(甲基)丙烯酸酯20~100質量份。 The Tg of the cured coating film of the resin composition of the present invention in dynamic viscoelasticity measurement at a frequency of 1 Hz is more preferably 30°C to 90°C, and further preferably 40°C to 70°C. The Tg can also be adjusted to the above range by blending each component of the resin composition of the present invention in the blending amounts described in (1) to (2) below. (1) In the total 100 parts by mass of the carboxyl group-containing urethane resin (A) that is effective in stress relaxation, based on the total 100 parts by mass of the carboxyl group-containing resin that also includes (F) other carboxyl group-containing resin, 75 to 90 parts by mass, more preferably 80 to 90 parts by mass, (2) when the resin composition of the present invention is a photosensitive resin composition, in order not to make the cross-linking density too high, relative to (meth)acrylic acid The total amount of the ester is 100 parts by mass, and 20 to 100 parts by mass of (B) difunctional (meth)acrylate with a small number of functional groups is blended.

本發明的樹脂組成物為包含(A)含羧基之胺基甲酸乙酯樹脂及(E)呈白色的著色劑的樹脂組成物,具體而言,作為(A)含羧基之胺基甲酸乙酯樹脂,較佳為含有不具有芳香環的含羧基之胺基甲酸乙酯樹脂、(B)二官能的(甲基)丙烯酸酯、(C)光聚合起始劑、(D)環氧樹脂之中的至少數種。 以下詳細地說明關於此等的各成分。 本發明的樹脂組成物為熱硬化性樹脂組成物的情況時,較佳為含有(D)環氧樹脂,本發明的樹脂組成物為感光性樹脂組成物的情況時,較佳為含有(B)二官能的(甲基)丙烯酸酯、(C)光聚合起始劑。 The resin composition of the present invention is a resin composition containing (A) carboxyl group-containing urethane resin and (E) a white coloring agent. Specifically, (A) carboxyl group-containing urethane resin The resin is preferably one containing a carboxyl-containing urethane resin without an aromatic ring, (B) a difunctional (meth)acrylate, (C) a photopolymerization initiator, and (D) an epoxy resin. at least several of them. Each of these components will be described in detail below. When the resin composition of the present invention is a thermosetting resin composition, it is preferred to contain (D) epoxy resin. When the resin composition of the present invention is a photosensitive resin composition, it is preferred to contain (B). ) difunctional (meth)acrylate, (C) photopolymerization initiator.

[(A)含羧基之胺基甲酸乙酯樹脂] 本發明的樹脂組成物含有於應力緩和有效果的(A)含羧基之胺基甲酸乙酯樹脂(urethane resin)。 再者,本發明的(A)含羧基之胺基甲酸乙酯樹脂較佳為含有(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂以及(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂之中的至少任一者。 [(A) Carboxyl group-containing urethane resin] The resin composition of the present invention contains (A) carboxyl group-containing urethane resin which is effective in stress relaxation. Furthermore, (A) the carboxyl group-containing urethane resin of the present invention preferably contains (A-1) a carboxyl group-containing urethane resin which does not have an aromatic ring and (A-2) which has an aromatic ring. At least any one of carboxyl group-containing urethane resins derived from diols and aliphatic diisocyanates.

本發明的樹脂組成物較佳為含有(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂。藉由含有(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂,能夠抑制因熱導致的變色,能夠獲得高反射率的塗膜。 (A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂,較佳能夠列舉,作為非芳香族系之具有異氰酸酯基的化合物之脂肪族二異氰酸酯的聚異氰酸酯(a)、與1分子中具有2個以上的醇性羥基的化合物及1分子中具有1個的醇性羥基的化合物反應而獲得之含羧基之胺基甲酸乙酯樹脂。(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂,除了其材料不包含具有芳香環的二醇(b)、含有源自脂環式二醇的重複單元作為構成單元的聚碳酸酯二醇(c-2)、含有源自直鏈狀脂肪族二醇與脂環式二醇的兩者的二醇的重複單元作為構成單元的聚碳酸酯二醇(c-3)之外,其餘能夠以與(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂同樣的方法進行合成。 作為脂肪族二異氰酸酯的聚異氰酸酯(a),能夠使用通常周知的各種聚異氰酸酯,不限於特定的化合物。作為脂肪族二異氰酸酯的聚異氰酸酯(a)的具體例,能夠列舉例如,六亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯等二異氰酸酯。此等的聚異氰酸酯能夠使用1種或組合2種以上。此等之中,較佳為三甲基六亞甲基二異氰酸酯。使用此等的二異氰酸酯的情況時,能夠獲得焊接耐熱性優良的硬化物。 再者,聚異氰酸酯只要不具有芳香環,不限定於脂肪族二異氰酸酯的聚異氰酸酯(a),例如,也能夠使用異佛爾酮二異氰酸酯、環己烷-1,3-二亞甲基二異氰酸酯、環己烷-1,4-二亞甲基二異氰酸酯的聚異氰酸酯。 作為1分子中具有2個以上的醇性羥基的化合物,較佳為聚碳酸酯二醇、具有羧基及2個以上的醇性羥基的化合物。作為聚碳酸酯二醇,較佳為含有1種或2種以上的源自直鏈狀脂肪族二醇的重複單元作為構成單元之聚碳酸酯二醇(c-1),作為具體例如同後述。作為具有羧基及2個以上的醇性羥基的化合物,較佳為二羥甲基烷酸(d),作為具體例如同後述。 作為1分子中具有1個的醇性羥基的化合物,較佳為後述的單羥基化合物(e),作為具體例如同後述。 作為(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂,使用將不具有芳香環的聚異氰酸酯、含有1種或2種以上的源自直鏈狀脂肪族二醇的重複單元作為構成單元之聚碳酸酯二醇(c-1)、二羥甲基烷酸(d)及單羥基化合物(e)反應而獲得之含羧基之胺基甲酸乙酯樹脂的情況時,能夠抑制因熱導致的變色,具有獲得更高反射率的塗膜的效果,因此為佳。 The resin composition of the present invention preferably contains (A-1) a carboxyl group-containing urethane resin that does not have an aromatic ring. By containing the carboxyl group-containing urethane resin (A-1) which does not have an aromatic ring, discoloration due to heat can be suppressed and a coating film with high reflectance can be obtained. (A-1) A carboxyl group-containing urethane resin that does not have an aromatic ring, preferably polyisocyanate (a), which is an aliphatic diisocyanate that is a non-aromatic compound having an isocyanate group, and 1 Carboxyl group-containing urethane resin obtained by reacting a compound with two or more alcoholic hydroxyl groups in a molecule and a compound with one alcoholic hydroxyl group in a molecule. (A-1) A carboxyl group-containing urethane resin that does not have an aromatic ring, except that its material does not contain the diol (b) that has an aromatic ring and contains a repeating unit derived from an alicyclic diol as a structural unit. Polycarbonate diol (c-2), polycarbonate diol (c-3) containing repeating units derived from diols derived from both linear aliphatic diol and alicyclic diol as structural units The rest can be synthesized in the same manner as (A-2) the carboxyl group-containing urethane resin derived from a diol having an aromatic ring and an aliphatic diisocyanate. As the polyisocyanate (a) of the aliphatic diisocyanate, various commonly known polyisocyanates can be used, and the polyisocyanate is not limited to a specific compound. Specific examples of the aliphatic diisocyanate polyisocyanate (a) include diisocyanates such as hexamethylene diisocyanate and trimethylhexamethylene diisocyanate. These polyisocyanates can be used alone or in combination of two or more types. Among these, trimethylhexamethylene diisocyanate is preferred. When such a diisocyanate is used, a cured product excellent in welding heat resistance can be obtained. In addition, the polyisocyanate is not limited to the polyisocyanate (a) of aliphatic diisocyanate as long as it does not have an aromatic ring. For example, isophorone diisocyanate, cyclohexane-1,3-dimethylene diisocyanate can also be used. Isocyanate, polyisocyanate of cyclohexane-1,4-dimethylene diisocyanate. As the compound having two or more alcoholic hydroxyl groups in one molecule, polycarbonate diol or a compound having a carboxyl group and two or more alcoholic hydroxyl groups is preferred. The polycarbonate diol is preferably a polycarbonate diol (c-1) containing one or more repeating units derived from a linear aliphatic diol as a structural unit. Specific examples are the same as described below. . As a compound having a carboxyl group and two or more alcoholic hydroxyl groups, dimethylol alkanoic acid (d) is preferred, and specific examples are the same as described below. As a compound having one alcoholic hydroxyl group per molecule, a monohydroxy compound (e) described below is preferred, and specific examples are the same as those described below. As (A-1) the carboxyl group-containing urethane resin having no aromatic ring, a polyisocyanate having no aromatic ring and a repeating polyisocyanate derived from a linear aliphatic diol containing one or more types are used. In the case of a carboxyl group-containing urethane resin obtained by reacting polycarbonate diol (c-1), dimethylol alkanoic acid (d) and a monohydroxy compound (e) as structural units, it can be It is preferable because it has the effect of suppressing discoloration due to heat and obtaining a coating film with higher reflectivity.

本發明的樹脂組成物較佳為含有(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂。藉由含有(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂及二官能的(甲基)丙烯酸酯,能夠實現低翹曲。 (A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂較佳為具有脂肪族二異氰酸酯的聚異氰酸酯(a)與具有芳香環的二醇(b)反應所形成的胺基甲酸乙酯鍵,進而具有含有聚碳酸酯多元醇(c)與二羥甲基烷酸(d)反應所形成的胺基甲酸乙酯鍵,且具有藉由上述二羥甲基烷酸(d)而導入的羧基。反應時,作為反應停止劑(末端封端劑)亦可加入單羥基化合物(e)。 The resin composition of the present invention is preferably a carboxyl group-containing urethane resin derived from (A-2) a diol having an aromatic ring and an aliphatic diisocyanate. Low warpage can be achieved by containing (A-2) a carboxyl group-containing urethane resin derived from a diol having an aromatic ring and an aliphatic diisocyanate and a bifunctional (meth)acrylate. (A-2) The carboxyl group-containing urethane resin derived from a diol having an aromatic ring and an aliphatic diisocyanate is preferably a polyisocyanate (a) having an aliphatic diisocyanate and a diol having an aromatic ring ( b) The urethane bond formed by the reaction, further having the urethane bond formed by the reaction of the polycarbonate polyol (c) and the dimethylol alkanoic acid (d), and having the above The carboxyl group introduced by dihydroxymethylalkanoic acid (d). During the reaction, a monohydroxy compound (e) may also be added as a reaction terminating agent (terminal blocking agent).

(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂,例如可使脂肪族二異氰酸酯的聚異氰酸酯(a)、具有芳香環的二醇(b)、聚碳酸酯多元醇(c)、二羥甲基烷酸(d)及單羥基化合物(e)全部混合使其反應,或者使脂肪族二異氰酸酯的聚異氰酸酯(a)、具有芳香環的二醇(b)、聚碳酸酯多元醇(c)及二羥甲基烷酸(d)反應,接著使其與作為反應停止劑功能的單羥基化合物(e)反應。 再者,例如,將聚碳酸酯多元醇(c)、具有芳香環的二醇(b)、二羥甲基烷酸(d)及作為反應停止劑功能的單羥基化合物(e)全部混合,使其與脂肪族二異氰酸酯的聚異氰酸酯(a)反應也為佳。 反應藉由在室溫~100℃攪拌、混合而以無觸媒進行,為了提高反應速度加熱至70~100℃為佳。再者,作為上述(a)~(d)成分的反應比率(莫耳比)為(b):(c)=1:9~9:1、較佳為2:8~8:2;(b+c):(d)=95:5~5:95、較佳為80:20~15:85;(a):(b+c+d)=1:1~2:1、較佳為1:1~1.5:1;(a+b+c+d):(e)= 1:0.01~0.5、較佳為1:0.02~0.3的比例為適當。 (A-2) Carboxyl-containing urethane resin derived from a diol having an aromatic ring and an aliphatic diisocyanate, for example, polyisocyanate (a) of an aliphatic diisocyanate, diol (b) having an aromatic ring, polycarbonate polyol (c), dihydroxymethyl alkanoic acid (d) and a monohydroxy compound (e) are all mixed and reacted, or polyisocyanate (a) of an aliphatic diisocyanate, diol (b) having an aromatic ring, polycarbonate polyol (c) and dihydroxymethyl alkanoic acid (d) are reacted and then reacted with a monohydroxy compound (e) which functions as a reaction terminator. Furthermore, for example, it is also preferable to mix all of the polycarbonate polyol (c), the diol (b) having an aromatic ring, the dihydroxymethyl alkanoic acid (d) and the monohydroxy compound (e) functioning as a reaction terminator, and react them with the polyisocyanate (a) of the aliphatic diisocyanate. The reaction is carried out without a catalyst by stirring and mixing at room temperature to 100°C, and preferably heated to 70 to 100°C to increase the reaction rate. Furthermore, the reaction ratio (molar ratio) of the above-mentioned (a) to (d) components is (b): (c) = 1:9 to 9:1, preferably 2:8 to 8:2; (b+c): (d) = 95:5 to 5:95, preferably 80:20 to 15:85; (a): (b+c+d) = 1:1 to 2:1, preferably 1:1 to 1.5:1; (a+b+c+d): (e) = 1:0.01 to 0.5, preferably 1:0.02 to 0.3.

作為脂肪族二異氰酸酯的聚異氰酸酯(a),能夠使用通常周知的各種聚異氰酸酯,不限於特定的化合物。具體例如同上述。As the polyisocyanate (a) of the aliphatic diisocyanate, various commonly known polyisocyanates can be used, and the polyisocyanate is not limited to a specific compound. Specific examples are the same as above.

作為具有芳香環的二醇(b),較佳為雙酚A型環氧烷加成物二醇。具體而言能夠列舉,雙酚A的環氧乙烷加成物、環氧丙烷加成物、環氧丁烷加成物等,此等之中,雙酚A的環氧丙烷加成物從焊接耐熱性提升的觀點而言為佳。As the diol (b) having an aromatic ring, a bisphenol A-type alkylene oxide adduct diol is preferred. Specific examples include bisphenol A's ethylene oxide adduct, propylene oxide adduct, and butylene oxide adduct. Among these, the propylene oxide adduct of bisphenol A is from It is good from the viewpoint of improving welding heat resistance.

作為聚碳酸酯多元醇(c),較佳為聚碳酸酯二醇(polycarbonate diol)。作為聚碳酸酯二醇,能夠列舉含有1種或2種以上的源自直鏈狀脂肪族二醇的重複單元作為構成單元之聚碳酸酯二醇(c-1)、含有1種或2種以上的源自脂環式二醇的重複單元作為構成單元之聚碳酸酯二醇(c-2)或含有源自此兩者的二醇的重複單元作為構成單元之聚碳酸酯二醇(c-3)。As the polycarbonate polyol (c), polycarbonate diol (polycarbonate diol) is preferred. Examples of the polycarbonate diol include polycarbonate diols (c-1) containing one or more repeating units derived from linear aliphatic diols as structural units, polycarbonate diols (c-1) containing one or two types The above polycarbonate diol (c-2) having a repeating unit derived from an alicyclic diol as a constituent unit or a polycarbonate diol (c) containing a repeating unit derived from both diols as a constituent unit -3).

作為含有源自直鏈狀脂肪族二醇的重複單元作為構成單元之聚碳酸酯二醇(c-1)的具體例,能夠列舉例如,1,6-己二醇所衍生的聚碳酸酯二醇、1,5-戊二醇與1,6-己二醇所衍生的聚碳酸酯二醇、1,4-丁二醇與1,6-己二醇所衍生的聚碳酸酯二醇、3-甲基-1,5-戊二醇與1,6-己二醇所衍生的聚碳酸酯二醇。Specific examples of the polycarbonate diol (c-1) containing repeating units derived from a linear aliphatic diol as constituent units include, for example, polycarbonate diol derived from 1,6-hexanediol, polycarbonate diol derived from 1,5-pentanediol and 1,6-hexanediol, polycarbonate diol derived from 1,4-butanediol and 1,6-hexanediol, and polycarbonate diol derived from 3-methyl-1,5-pentanediol and 1,6-hexanediol.

作為含有源自脂環式二醇的重複單元作為構成單元之聚碳酸酯二醇(c-2)的具體例,能夠列舉例如,1,4-環己烷二甲醇所衍生的聚碳酸酯二醇。Specific examples of the polycarbonate diol (c-2) containing a repeating unit derived from an alicyclic diol as a structural unit include, for example, polycarbonate diol derived from 1,4-cyclohexanedimethanol. alcohol.

作為含有源自直鏈狀脂肪族二醇與脂環式二醇的雙方的二醇的重複單元作為構成單元之聚碳酸酯二醇(c-3)的具體例,能夠列舉例如,1,6-己二醇與1,4-環己烷二甲醇所衍生的聚碳酸酯二醇。Specific examples of the polycarbonate diol (c-3) containing repeating units derived from both linear aliphatic diol and alicyclic diol as structural units include, for example, 1,6 -Polycarbonate diol derived from hexanediol and 1,4-cyclohexanedimethanol.

含有源自直鏈狀脂肪族二醇的重複單元作為構成單元之聚碳酸酯二醇,具有低翹曲性、可撓性優良的傾向。再者,含有源自脂環式二醇的重複單元作為構成單元之聚碳酸酯二醇,具有結晶性高、耐鍍錫性、焊接耐熱性優良的傾向。從上述的觀點而言,此等聚碳酸酯二醇為組合2種以上使用,或者能夠使用含有源自直鏈狀脂肪族二醇與脂環式二醇的雙方之二醇的重複單元作為構成單元之聚碳酸酯二醇。使低翹曲性、可撓性、焊接耐熱性、耐鍍錫性平衡性良好地表現,較佳為使用直鏈狀脂肪族二醇與脂環式二醇的共聚合比例為以質量比為3:7~7:3的聚碳酸二醇。Polycarbonate diols containing repeating units derived from linear aliphatic diols as constituent units tend to have low warpage and excellent flexibility. Furthermore, polycarbonate diols containing repeating units derived from alicyclic diols as constituent units tend to have high crystallinity, excellent tinning resistance, and excellent soldering heat resistance. From the above viewpoints, these polycarbonate diols are used in combination of two or more, or polycarbonate diols containing repeating units derived from both linear aliphatic diols and alicyclic diols as constituent units can be used. In order to achieve a good balance among low warpage, flexibility, soldering heat resistance, and tinning resistance, it is preferred to use polycarbonate diol having a copolymerization ratio of linear aliphatic diol to alicyclic diol of 3:7 to 7:3 by mass.

聚碳酸酯二醇,較佳為數量平均分子量200~ 5,000之物,聚碳酸酯二醇為作為構成單元含有源自直鏈狀脂肪族二醇與脂環式二醇的重複單元,直鏈狀脂肪族二醇與脂環式二醇的共聚合比例為以質量比為3:7~7:3的情況時,數量平均分子量較佳為400~2,000。The polycarbonate diol preferably has a number average molecular weight of 200 to 5,000. The polycarbonate diol contains repeating units derived from a linear aliphatic diol and an alicyclic diol as structural units. The linear unit is When the copolymerization ratio of aliphatic diol and alicyclic diol is 3:7 to 7:3 by mass, the number average molecular weight is preferably 400 to 2,000.

二羥甲基烷酸(d)為具有羧基之二羥基脂肪族羧酸,作為其具體例能夠列舉二羥甲基丙酸、二羥甲基丁酸等。藉由使用二羥甲基烷酸(d),能夠於胺基甲酸乙酯樹脂中容易地導入羧基。Dimethylol alkanoic acid (d) is a dihydroxy aliphatic carboxylic acid having a carboxyl group, and specific examples thereof include dimethylol propionic acid, dimethylol butyric acid, and the like. By using dimethylol alkanoic acid (d), a carboxyl group can be easily introduced into the urethane resin.

作為單羥基化合物(e),成為聚胺基甲酸乙酯的末端封端劑之物,只要是分子中具有1個羥基的化合物即可,能夠列舉脂肪族醇(e-1)、單(甲基)丙烯酸單羥基酯化合物(e-2)等。 作為脂肪族醇(e-1)的具體例,能夠列舉甲醇、乙醇、丙醇、異丁醇等,作為單(甲基)丙烯酸單羥基酯化合物(e-2)的具體例,能夠列舉丙烯酸2-羥基乙酯等。 As the monohydroxy compound (e), any compound having one hydroxyl group in the molecule that serves as the end-capping agent for polyurethane can be listed, and examples thereof include aliphatic alcohol (e-1) and mono(meth)acrylate monohydroxy ester compound (e-2). As specific examples of aliphatic alcohol (e-1), methanol, ethanol, propanol, isobutanol, etc. can be listed, and as specific examples of mono(meth)acrylate monohydroxy ester compound (e-2), 2-hydroxyethyl acrylate, etc. can be listed.

作為如同上述的 (A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂,使用(A)(a)聚異氰酸酯、(b)雙酚A系環氧烷加成物二醇、(c)聚碳酸酯二醇及(d)二羥甲基烷酸反應而獲得的含羧基之胺基甲酸乙酯樹脂的情況時,藉由併用二官能的(甲基)丙烯酸酯,具有更加抑制翹曲的低翹曲效果而為佳。When the carboxyl group-containing urethane resin derived from a diol having an aromatic ring and an aliphatic diisocyanate as described above (A-2) is a carboxyl group-containing urethane resin obtained by reacting (A) (a) polyisocyanate, (b) bisphenol A-based alkylene oxide adduct diol, (c) polycarbonate diol and (d) dihydroxymethyl alkanoic acid, it is preferable to use a difunctional (meth)acrylate in combination to achieve a low warp effect that further suppresses warp.

(A)含羧基之胺基甲酸乙酯樹脂的重量平均分子量較佳為500~100,000、進而較佳為8,000~50,000。在此,重量平均分子量是以凝膠滲透層析法所測定的聚苯乙烯換算值。(A)含羧基之胺基甲酸乙酯樹脂的重量平均分子量未滿500,則有損害硬化膜的延伸性、可撓性及強度之事項,另一方面,超過100,000,則變得堅硬,有降低可撓性之虞。(A) The weight average molecular weight of the carboxyl group-containing urethane resin is preferably 500 to 100,000, more preferably 8,000 to 50,000. Here, the weight average molecular weight is a polystyrene-converted value measured by gel permeation chromatography. (A) If the weight average molecular weight of the carboxyl group-containing urethane resin is less than 500, the extensibility, flexibility, and strength of the cured film may be impaired. On the other hand, if it exceeds 100,000, the weight average molecular weight may become hard and may Reduce the risk of flexibility.

(A)含羧基之胺基甲酸乙酯樹脂的酸價較佳為5~150mgKOH/g的範圍,進而較佳為10~100mgKOH/g。酸價為未滿5mgKOH/g,則與熱硬化性成分的反應性降低,有損害耐熱性之事項。另一方面,酸價超過150 mgKOH/g,則有硬化膜的耐鹼性、電氣特性等作為光阻的特性降低的情況。又,樹脂的酸價是遵照JIS K5407而測定的值。(A) The acid value of the carboxyl group-containing urethane resin is preferably in the range of 5 to 150 mgKOH/g, and more preferably 10 to 100 mgKOH/g. If the acid value is less than 5 mgKOH/g, the reactivity with the thermosetting component is reduced, which may impair the heat resistance. On the other hand, if the acid value exceeds 150 mgKOH/g, the alkali resistance and electrical properties of the cured film as a photoresist may be reduced. The acid value of the resin is a value measured in accordance with JIS K5407.

(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂的摻合量,相對於(A)含羧基樹脂及(F)其他的含羧基樹脂的總量100質量份為50~95質量份、更佳為60~70質量份。 (A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂的摻合量,相對於(A)含羧基樹脂及(F)其他的含羧基樹脂的總量100質量份為5~90質量份、更佳為10~20質量份。 The blending amount of (A-1) a carboxyl-containing urethane resin without an aromatic ring is 50 to 95 parts by mass, preferably 60 to 70 parts by mass, relative to 100 parts by mass of the total amount of (A) a carboxyl-containing resin and (F) other carboxyl-containing resins. The blending amount of (A-2) a carboxyl-containing urethane resin derived from a diol having an aromatic ring and an aliphatic diisocyanate is 5 to 90 parts by mass, preferably 10 to 20 parts by mass, relative to 100 parts by mass of the total amount of (A) a carboxyl-containing resin and (F) other carboxyl-containing resins.

[(B)二官能的(甲基)丙烯酸酯] 本發明的樹脂組成物包含二官能的(甲基)丙烯酸酯。由於(甲基)丙烯酸酯具有乙烯性不飽合基,藉由活性能量線照射進行光硬化,有助於本發明的樹脂組成物的對鹼性水溶液的不溶解化。(甲基)丙烯酸酯本發明的(B)二官能的(甲基)丙烯酸酯為二官能,因此形成交聯結構,特別是與(A)成分併用,能滿足硬化塗膜的柔軟性及提升硬度之所謂的相反的物性。又,由於如三官能以上的(甲基)丙烯酸酯般的每單位分子量的官能基數多,則聚合收縮率變得更大,必須將摻合量設為預定的範圍。 具體而言,將本發明的感光性樹脂組成物中所包含的(甲基)丙烯酸酯整體作為100質量份時,(B)二官能的(甲基)丙烯酸酯的摻合量較佳為20質量份~100質量份、更佳為40質量份~100質量份。三官能以上的(甲基)丙烯酸酯的摻合量為,將本發明的感光性樹脂組成物中所包含的(甲基)丙烯酸酯整體作為100質量份時,若為40質量份~80質量份,則即使含有也能抑制翹曲。四官能以上的(甲基)丙烯酸酯為,將本發明的感光性樹脂組成物中所包含的(甲基)丙烯酸酯整體作為100質量份時,若為5質量份以下,能夠抑制翹曲。 特別是六官能以上的(甲基)丙烯酸酯的情況時,由於每單位分子量的官能基數增多,聚合收縮率增大,翹曲惡化,本發明的感光性樹脂組成物中,將本發明的感光性樹脂組成物中所包含的(甲基)丙烯酸酯整體作為100質量份時,較佳為未滿1質量份。 [(B) Difunctional (meth)acrylate] The resin composition of the present invention contains difunctional (meth)acrylate. Since (meth)acrylate has an ethylenically unsaturated group, it is photocured by irradiation with active energy rays, which helps the resin composition of the present invention to be insoluble in alkaline aqueous solutions. (Meth)acrylate The (B) difunctional (meth)acrylate of the present invention is difunctional, so it forms a cross-linked structure, and especially when used in combination with the (A) component, it can satisfy the so-called opposite physical properties of the hardened coating film, namely, the softness and hardness. In addition, since the number of functional groups per unit molecular weight is large, such as trifunctional or higher (meth)acrylates, the polymerization shrinkage becomes larger, and the amount of admixture must be set to a predetermined range. Specifically, when the (meth)acrylate contained in the photosensitive resin composition of the present invention is taken as 100 parts by mass, the blending amount of (B) difunctional (meth)acrylate is preferably 20 parts by mass to 100 parts by mass, and more preferably 40 parts by mass to 100 parts by mass. The blending amount of trifunctional or higher (meth)acrylate is 40 parts by mass to 80 parts by mass when the (meth)acrylate contained in the photosensitive resin composition of the present invention is taken as 100 parts by mass, and warp can be suppressed even if it is contained. The (meth)acrylate of tetrafunctional or higher is 5 parts by mass or less when the (meth)acrylate contained in the photosensitive resin composition of the present invention is taken as 100 parts by mass, and warp can be suppressed. In particular, in the case of hexafunctional or higher (meth)acrylates, the number of functional groups per unit molecular weight increases, the polymerization shrinkage rate increases, and the warp deteriorates. In the photosensitive resin composition of the present invention, when the (meth)acrylate contained in the photosensitive resin composition of the present invention is taken as 100 parts by mass, it is preferably less than 1 part by mass.

作為(B)二官能的(甲基)丙烯酸酯,具體而言能夠列舉,乙二醇、甲氧基四乙二醇、聚乙二醇、丙二醇等的二元醇(glycol)的二丙烯酸酯類;己二醇、三羥甲基丙烷、新戊四醇、二新戊四醇、參-羥基乙基三聚異氰酸酯等的多元醇或此等的環氧乙烷加成物、環氧丙烷加成物、或者ε-己內酯加成物等的二丙烯酸酯類;苯氧基丙烯酸酯、雙酚A二丙烯酸酯及此等的酚類的環氧乙烷加成物或者環氧丙烷加成物等的二丙烯酸酯類;甘油二環氧丙基醚、甘油三環氧丙基醚、三羥甲基丙烷三環氧丙基醚、三環氧丙基三聚異氰酸酯等的環氧丙基醚的二丙烯酸酯類;不限於上述,將聚醚多元醇、聚碳酸酯二醇、羥基末端聚丁二烯、聚酯多元醇等的多元醇直接丙烯酸酯化,或者透過二異氰酸酯而胺基甲酸乙酯丙烯酸酯化的二丙烯酸酯類及三聚氰胺二丙烯酸酯、及/或對應於上述二丙烯酸酯的各二甲基丙烯酸酯類等。Specific examples of the (B) bifunctional (meth)acrylate include diacrylates of glycols such as ethylene glycol, methoxytetraethylene glycol, polyethylene glycol, and propylene glycol. Class; polyols such as hexylene glycol, trimethylolpropane, neopentyl erythritol, dineopenterythritol, hydroxyethyl isocyanate or their ethylene oxide adducts, propylene oxide Adducts, or diacrylates such as ε-caprolactone adducts; phenoxyacrylates, bisphenol A diacrylates, and ethylene oxide adducts of these phenols or propylene oxide Diacrylates such as adducts; epoxy such as glycerol diglycidyl ether, glyceryl triglycidyl ether, trimethylolpropane triglycidyl ether, triglycidoxypropyl isocyanate, etc. Diacrylates of propyl ether; not limited to the above, polyols such as polyether polyol, polycarbonate diol, hydroxyl-terminated polybutadiene, polyester polyol, etc. can be directly acrylated, or through diisocyanate Urethane acrylate diacrylates and melamine diacrylates, and/or dimethacrylates corresponding to the above-mentioned diacrylates, etc.

進而,能夠列舉於甲酚酚醛清漆型環氧樹脂等的多官能環氧樹脂,使二丙烯酸反應的環氧基二丙烯酸酯樹脂,進一步於此環氧基二丙烯酸酯樹脂的羥基,使與新戊四醇三丙烯酸酯等的丙烯酸羥基酯及異佛爾酮二異氰酸酯等的二異氰酸酯的半胺基甲酸乙酯化合物反應的環氧基胺基甲酸乙酯二丙烯酸酯化合物等。此種環氧基二丙烯酸酯系樹脂不會降低指觸乾燥性,能夠提升光硬化性。Furthermore, polyfunctional epoxy resins such as cresol novolac epoxy resins, epoxy diacrylate resins made by reacting diacrylate, and epoxy urethane diacrylate compounds made by reacting hydroxyl groups of the epoxy diacrylate resins with hydroxyl acrylates such as pentaerythritol triacrylate and diisocyanate compounds such as isophorone diisocyanate, etc. Such epoxy diacrylate resins can improve light curing properties without reducing the dryness upon touch.

(B)二官能的(甲基)丙烯酸酯的摻合量,相對於(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量100質量份適當為5~100質量份、更佳為5~70質量份的比例。摻合量為前述範圍內的情況時,光硬化性良好,藉由活性能量線照射後的鹼顯影,能夠形成圖案,再者,對於鹼性水溶液的溶解性良好。(B) The blending amount of the difunctional (meth)acrylate is appropriately 5 to 5 parts by mass based on 100 parts by mass of the total amount of (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins. 100 parts by mass, more preferably 5 to 70 parts by mass. When the blending amount is within the above range, the photocurability is good, a pattern can be formed by alkali development after irradiation with active energy rays, and the solubility in an alkaline aqueous solution is good.

[(C)光聚合起始劑] 本發明的樹脂組成物能夠使用周知常用的(C)光聚合起始劑。(C)光聚合起始劑可單獨使用,或亦可併用2種以上,較佳為具有光褪色(photobleaching)效果。光褪色效果是指,光聚合起始劑吸收光產生自由基時,開裂的分子的共軛鍵被切斷,紫外線區域的吸光度降低,成為不妨礙紫外線穿透到內部。作為具有光褪色效果的(C)光聚合起始劑的較佳例,能夠列舉單醯基氧化膦系光聚合起始劑、雙醯基氧化膦系光聚合起始劑。 作為單醯基氧化膦系光聚合起始劑,能夠列舉2,4,6-三甲基苯甲醯基二苯基氧化膦、2,6-二甲氧基苯甲醯基二苯基氧化膦、2,6-二氯苯甲醯基二苯基氧化膦、2,4,6-三甲基苯甲醯基苯基次磷酸甲基酯、2-甲基苯甲醯基二苯基氧化膦、三甲基乙醯基(pivaloyl)苯基次磷酸異丙酯等。其中,2,4,6-三甲基苯甲醯基二苯基氧化膦為容易取得。 [(C) Photopolymerization initiator] The resin composition of the present invention can use a well-known and commonly used (C) photopolymerization initiator. (C) The photopolymerization initiator can be used alone, or two or more types can be used in combination, and one preferably has a photobleaching effect. The photofading effect means that when the photopolymerization initiator absorbs light and generates free radicals, the conjugated bonds of the cracked molecules are cut, and the absorbance in the ultraviolet region is reduced, so that it does not prevent ultraviolet rays from penetrating inside. Preferable examples of the (C) photopolymerization initiator having a photofading effect include a monocarboxylic acid phosphine oxide-based photopolymerization initiator and a bis-carboxylic acid phosphine oxide-based photopolymerization initiator. Examples of the monocarboxylic acid phosphine oxide-based photopolymerization initiator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide and 2,6-dimethoxybenzoyldiphenylphosphine oxide. Phosphine, 2,6-dichlorobenzoyldiphenylphosphine oxide, 2,4,6-trimethylbenzoylphenylphosphine methyl ester, 2-methylbenzoyldiphenyl Phosphine oxide, trimethylacetyl (pivaloyl) phenyl isopropyl phosphinate, etc. Among them, 2,4,6-trimethylbenzyldiphenylphosphine oxide is easily available.

作為雙醯基氧化膦系光聚合起始劑,能夠列舉雙-(2,6-二氯苯甲醯基)苯基氧化膦、雙-(2,6-二氯苯甲醯基)-2,5-二甲基苯基氧化膦、雙-(2,6-二氯苯甲醯基)-4-丙基苯基氧化膦、雙-(2,6-二氯苯甲醯基)-1-萘基氧化膦、雙-(2,6-二甲氧基苯甲醯基)苯基氧化膦、雙-(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基氧化膦、雙-(2,6-二甲氧基苯甲醯基)-2,5-二甲基苯基氧化膦、雙-(2,4,6-三甲基苯甲醯基)苯基氧化膦、(2,5,6-三甲基苯甲醯基)-2,4,4-三甲基戊基氧化膦等。其中,雙-(2,4,6-三甲基苯甲醯基)苯基氧化膦(BASF Japan(股)製、商品名;Irgacure 819)為容易取得。Examples of the bisacylphosphine oxide-based photopolymerization initiator include bis-(2,6-dichlorobenzyl)phenylphosphine oxide, bis-(2,6-dichlorobenzyl)-2,5-dimethylphenylphosphine oxide, bis-(2,6-dichlorobenzyl)-4-propylphenylphosphine oxide, bis-(2,6-dichlorobenzyl)-1-naphthylphosphine oxide, bis-(2,6-dimethoxyphenyl)- bis-(2,4,6-trimethylbenzyl)phenylphosphine oxide, bis-(2,6-dimethoxybenzyl)-2,4,4-trimethylpentylphosphine oxide, bis-(2,6-dimethoxybenzyl)-2,5-dimethylphenylphosphine oxide, bis-(2,4,6-trimethylbenzyl)phenylphosphine oxide, (2,5,6-trimethylbenzyl)-2,4,4-trimethylpentylphosphine oxide, etc. Among them, bis-(2,4,6-trimethylbenzyl)phenylphosphine oxide (manufactured by BASF Japan Co., Ltd., trade name: Irgacure 819) is easily available.

再者,光聚合起始劑的總計摻合量,相對於(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量100質量份,較佳為1~30質量份、更佳為2~25質量份。摻合量若為上述範圍內,塗膜的光硬化性良好,曝光、顯影後的圖案形成亦良好。Furthermore, the total blending amount of the photopolymerization initiator is preferably 1 to 30 parts by mass relative to 100 parts by mass of the total amount of (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins. Parts by mass, preferably 2 to 25 parts by mass. If the blending amount is within the above range, the photocurability of the coating film will be good, and the pattern formation after exposure and development will also be good.

[(D)環氧樹脂] 本發明的硬化性樹脂組成物中,為了提升硬化物的耐熱性,能夠使用周知常用的(D)環氧樹脂。(D)環氧樹脂能夠使用單獨或2種以上的混合物。 作為環氧樹脂的具體例,能夠列舉例如,雙酚A型環氧樹脂、氫化雙酚A型環氧樹脂、溴化雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、酚醛清漆型環氧樹脂、酚系酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、N-環氧丙基型環氧樹脂、雙酚A的酚醛清漆型環氧樹脂、聯茬酚型環氧樹脂、聯苯酚型環氧樹脂、螯合物型環氧樹脂、乙二醛型環氧樹脂、含胺基環氧樹脂、橡膠改質環氧樹脂、二環戊二烯酚型環氧樹脂、二環氧丙基酞酸樹脂、雜環環氧樹脂、四環氧丙基茬醯基乙烷樹脂、聚矽氧改質環氧樹脂、ε-己內酯改質環氧樹脂等。再者,為了賦予難燃性,亦可使用將氯、溴等的鹵素、磷等原子導入其結構中之物。 [(D) Epoxy resin] In order to improve the heat resistance of the cured product, the curable resin composition of the present invention can use a well-known and commonly used (D) epoxy resin. The (D) epoxy resin can be used alone or as a mixture of two or more. Specific examples of epoxy resins include bisphenol A type epoxy resins, hydrogenated bisphenol A type epoxy resins, brominated bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, novolac type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, N-epoxypropyl type epoxy resins, bisphenol A novolac type epoxy resins, Epoxy resins, diisocyanate-type epoxy resins, biphenol-type epoxy resins, chelate-type epoxy resins, glyoxal-type epoxy resins, amino-containing epoxy resins, rubber-modified epoxy resins, diisocyanate-type epoxy resins, diisocyanate-phthalate resins, heterocyclic epoxy resins, tetraisocyanate-butyl phthalate resins, polysilicone-modified epoxy resins, ε-caprolactone-modified epoxy resins, etc. Furthermore, in order to impart flame retardancy, materials having halogens such as chlorine and bromine, and atoms such as phosphorus introduced into their structures may also be used.

本發明的樹脂組成物中(D)環氧樹脂的摻合量,相對於(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量100質量份期望為5~150質量份,較佳為10 ~80質量份的比例。摻合量若為上述範圍內,感光性樹脂組成物的硬化塗膜的焊接耐熱性良好,再者,作為印刷電路基板的絕緣保護膜使用的情況時的各種特性,特別是電絕緣性也良好。The blending amount of (D) epoxy resin in the resin composition of the present invention is preferably 5 parts by mass based on 100 parts by mass of the total amount of (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins. ~150 parts by mass, preferably 10 ~80 parts by mass. When the blending amount is within the above range, the cured coating film of the photosensitive resin composition has good soldering heat resistance, and when used as an insulating protective film for a printed circuit board, various properties, especially electrical insulation, are also good. .

[(E)呈白色的著色劑] 本發明的樹脂組成物中,(E)呈白色的著色劑是為了使硬化塗膜白色化而使用,能夠列舉氧化鈦、氧化鋅、鈦酸鉀、氧化鋯、氧化銻、鉛白、硫化鋅、鈦酸鉛、鈦酸鋇等。作為本發明的(E)呈白色的著色劑,從抑制因熱導致的變色的效果高而言,較佳為氧化鈦。作為氧化鈦,能夠使用藉由硫酸法、氯化法製造之物、金紅石型氧化鈦、銳鈦礦型氧化鈦、或者施加以含水金屬氧化物的表面處理、施加以有機化合物的表面處理的氧化鈦。此等的氧化鈦之中,較佳為金紅石型氧化鈦。由於銳鈦礦型氧化鈦相較於金紅石型白色度高,因此經常被使用,但由於具有光觸媒活性,有引起硬化性樹脂組成物中的樹脂的變色之事項。相較於此,雖然金紅石型氧化鈦在白色度上相較於銳鈦礦型稍微不佳,但由於幾乎不具有光活性,能夠獲得安定的硬化塗膜。作為金紅石型氧化鈦,夠使用周知的金紅石型之物。具體而言,能夠使用Fuji Titanium Industry(股)製TR-600、TR-700、TR-750、TR-840、石原產業(股)製R-550、R-580、R-630、R-820、CR-50、CR-60、CR-90、Titan Kogyo(股)製KR-270、KR-310、KR-380等。此等的金紅石型氧化鈦中,使用表面以含水氧化鋁或氫氧化鋁處理的氧化鈦,從在組成物中的分散性、保存安定性的觀點而言特佳。 [(E) White coloring agent] In the resin composition of the present invention, (E) the white coloring agent is used to whiten the cured coating film, and examples thereof include titanium oxide, zinc oxide, potassium titanate, zirconium oxide, antimony oxide, lead white, and zinc sulfide. , lead titanate, barium titanate, etc. As the white coloring agent (E) of the present invention, titanium oxide is preferred because of its high effect of suppressing discoloration due to heat. As the titanium oxide, those produced by the sulfuric acid method, the chlorination method, rutile titanium oxide, anatase titanium oxide, or those surface-treated with a hydrous metal oxide or surface-treated with an organic compound can be used. Titanium oxide. Among these titanium oxides, rutile titanium oxide is preferred. Anatase titanium oxide is often used because it has a higher whiteness than rutile titanium oxide. However, due to its photocatalytic activity, it may cause discoloration of the resin in the curable resin composition. In contrast, rutile titanium oxide is slightly inferior to anatase titanium oxide in terms of whiteness, but it has almost no photoactivity and can obtain a stable hardened coating film. As the rutile titanium oxide, a well-known rutile titanium oxide can be used. Specifically, TR-600, TR-700, TR-750, and TR-840 manufactured by Fuji Titanium Industry Co., Ltd., and R-550, R-580, R-630, and R-820 manufactured by Ishihara Industrial Co., Ltd. can be used. , CR-50, CR-60, CR-90, KR-270, KR-310, KR-380 made by Titan Kogyo Co., Ltd., etc. Among these rutile titanium oxides, titanium oxide whose surface is treated with hydrous aluminum oxide or aluminum hydroxide is particularly preferred from the viewpoint of dispersibility in the composition and storage stability.

(E)呈白色的著色劑的摻合量,相對於(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量100質量份,期望為50~500質量份的範圍,較佳為100~450質量份、更佳為150~450質量份。(E)呈白色的著色劑的摻合量未滿50質量份的情況時,難以形成良好的白色硬化塗膜。(E)呈白色的著色劑的摻合量若為上述範圍內,能夠形成良好的白色硬化塗膜,組成物的黏度亦不會過高,塗佈、成形性良好,硬化物也不會變脆。The blending amount of the white colorant (E) is preferably in the range of 50 to 500 parts by mass, preferably 100 to 450 parts by mass, and more preferably 150 to 450 parts by mass, relative to 100 parts by mass of the total amount of the (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins. If the blending amount of the white colorant (E) is less than 50 parts by mass, it is difficult to form a good white cured coating film. If the blending amount of the white colorant (E) is within the above range, a good white cured coating film can be formed, the viscosity of the composition is not too high, the coating and moldability are good, and the cured product does not become brittle.

[(F)其他的含羧基樹脂((A)含羧基之胺基甲酸乙酯樹脂以外的含羧基樹脂)] 本發明的樹脂組成物,較佳為含有作為(F)其他的含羧基樹脂之(A)含羧基之胺基甲酸乙酯樹脂以外的含羧基樹脂。 本發明的樹脂組成物中的(F)其他的含羧基樹脂的摻合量,相對於(F)其他的含羧基樹脂以及(A)含羧基之胺基甲酸乙酯樹脂的總計100質量份中,較佳為5~50質量份、進而較佳為10~20質量份。(F)其他的含羧基樹脂的摻合量以上述範圍摻合,也容易調整Tg及損耗正切(tanδ)的峰。 作為(F)其他的含羧基樹脂,能夠使用周知常用的含羧基樹脂,從藉由與(A)含羧基之胺基甲酸乙酯樹脂併用,能夠獲得更加地抑制因熱導致的變色的高反射率的塗膜,較佳為下述列舉的含羧基樹脂。 (1) (a)含羧基(甲基)丙烯酸系共聚合樹脂與(b)1分子中具有環氧乙烷(oxirane)環及乙烯性不飽合基的化合物反應所獲得之具有羧基的共聚合系樹脂。 (2) (甲基)丙烯酸酸等不飽和羧酸與選擇自苯乙烯、α-甲基苯乙烯、(甲基)丙烯酸低級烷基酯、異丁烯等的含不飽和基化合物的共聚合所獲得的具有苯乙烯骨架的含羧基樹脂(寡聚物以及聚合物任一者皆可)。再者,低級烷基是指碳原子數1~5的烷基。 [(F) Other carboxyl group-containing resins ((A) Carboxyl group-containing resins other than carboxyl group-containing urethane resin)] The resin composition of the present invention preferably contains a carboxyl group-containing resin other than (A) carboxyl group-containing urethane resin as (F) other carboxyl group-containing resin. The blending amount of (F) other carboxyl group-containing resin in the resin composition of the present invention is based on 100 parts by mass of the total of (F) other carboxyl group-containing resin and (A) carboxyl group-containing urethane resin. , preferably 5 to 50 parts by mass, and further preferably 10 to 20 parts by mass. (F) If the blending amount of other carboxyl group-containing resin is within the above range, the peaks of Tg and loss tangent (tanδ) can be easily adjusted. As (F) other carboxyl group-containing resins, well-known and commonly used carboxyl group-containing resins can be used, and by using them in combination with (A) carboxyl group-containing urethane resins, it is possible to obtain high reflection that further suppresses discoloration due to heat. The carboxyl group-containing resin listed below is preferred for a high-efficiency coating film. (1) A copolymer having a carboxyl group obtained by reacting (a) a carboxyl group-containing (meth)acrylic copolymer resin and (b) a compound having an oxirane ring and an ethylenically unsaturated group in one molecule Polymer resin. (2) Obtained by copolymerization of unsaturated carboxylic acids such as (meth)acrylic acid and unsaturated group-containing compounds selected from styrene, α-methylstyrene, lower alkyl (meth)acrylate, isobutylene, etc. A carboxyl-containing resin with a styrene skeleton (either an oligomer or a polymer). In addition, the lower alkyl group refers to an alkyl group having 1 to 5 carbon atoms.

[其他的熱硬化性成分] 本發明的樹脂組成物為了進一步提升耐熱性,能夠摻合熱硬化性成分。作為熱硬化性成分,能夠使用三聚氰胺樹脂、苯并胍胺樹脂等的胺樹脂、嵌段異氰酸酯化合物、環碳酸酯化合物、多官能環氧丁烷(oxetane)化合物、環硫化物(episulfide)樹脂、三聚氰胺衍生物、雙馬來亞醯胺、㗁𠯤(oxazine)化合物、㗁唑啉(oxazoline)化合物等周知常用的熱硬化性樹脂,較佳為能夠與以(A)含羧基之胺基甲酸乙酯樹脂為始之含羧基樹脂(或者進而酚性羥基)進行反應之分子中具有複數的環狀(硫)醚基的熱硬化性成分。 [Other thermosetting components] The resin composition of the present invention can be blended with a thermosetting component in order to further improve heat resistance. As the thermosetting component, amine resins such as melamine resins and benzoguanamine resins, blocked isocyanate compounds, cyclocarbonate compounds, polyfunctional oxetane compounds, episulfide resins, melamine derivatives, dimaleimide, oxazine compounds, oxazoline compounds and other well-known and commonly used thermosetting resins can be used. Preferably, the thermosetting component has a plurality of cyclic (thio)ether groups in the molecule that can react with the carboxyl-containing resin (or further phenolic hydroxyl group) starting with the carboxyl-containing urethane resin (A).

本發明的樹脂組成物中,前述熱硬化性成分可單獨或組合2種以上使用。其摻合量,相對於(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量100質量份期望為5~150質量份,較佳為10~80質量份的比率。若為上述摻合量的範圍,則樹脂組成物的硬化塗膜的焊接耐熱性良好,作為絕緣保護膜使用時的各種特性,特別是電絕緣性也良好。In the resin composition of the present invention, the thermosetting component may be used alone or in combination of two or more. The blending amount is preferably 5 to 150 parts by mass, preferably 10 to 80 parts by mass, based on 100 parts by mass of the total amount of (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins. The ratio. If the blending amount is within the above range, the cured coating film of the resin composition will have good soldering heat resistance, and will also have good various properties when used as an insulating protective film, especially electrical insulation properties.

(其他成分) 本發明的樹脂組成物中,為了促進熱硬化反應,進一步提升密著性、耐藥品性、耐熱性等的特性,能夠調配熱硬化觸媒。作為此種熱硬化觸媒,能夠列舉例如,咪唑、2-甲基咪唑、2-乙基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、4-苯基咪唑、1-氰基乙基-2-苯基咪唑、1-(2-氰基乙基)-2-乙基-4-甲基咪唑等咪唑衍生物;二氰二胺、苯甲基二甲基胺、4-(二甲基胺基)-N,N-二甲基苯甲胺、4-甲氧基-N,N-二甲基苯甲胺、4-甲基-N,N-二甲基苯甲胺等胺化合物;己二酸二醯肼(Adipic acid dihydrazide)、癸二酸二醯肼等肼(hydrazine)化合物;三苯基膦等磷化合物等。再者,作為市售品,能夠列舉例如四國化成工業(股)製的2MZ-A、2MZ-OK、2PHZ、2P4BHZ、2P4MHZ(皆為咪唑系化合物的商品名)、SAN-APRO(股)製的U-CAT(註冊商標)3503N、U-CAT3502T(皆為二甲基胺的嵌段異氰酸酯化合物的商品名)、DBU、DBN、U-CATSA102、U-CAT5002(皆為二環式脒化合物及其鹽)等。特別是不限於此等,只要是環氧樹脂、氧環丁烷(oxetane)化合物的熱硬化觸媒,或者促進環氧基及/或氧環丁烷基與羧基的反應之物即可,可單獨使用亦可混合2種以上使用。 再者,也能使用胍胺(guanamine)、乙胍胺(Acetoguanamine)、苯并胍胺、三聚氰胺、2,4-二胺基-6-甲基丙烯醯基氧基乙基-S-三嗪、2-乙烯基-2,4-二胺基-S-三嗪、2-乙烯基-4,6-二胺基-S-三嗪・異三聚氰酸加成物、2,4-二胺基-6-甲基丙烯醯基氧基乙基-S-三嗪・異三聚氰酸加成物等S-三嗪衍生物,較佳為將此等也作用為密著性賦予劑之化合物與熱硬化觸媒併用。 (Other components) In order to promote the heat curing reaction and further improve the properties such as adhesion, chemical resistance, and heat resistance, a heat curing catalyst can be formulated in the resin composition of the present invention. Examples of such heat-curing catalysts include imidazole derivatives such as imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, 1-cyanoethyl-2-phenylimidazole, and 1-(2-cyanoethyl)-2-ethyl-4-methylimidazole; amine compounds such as dicyandiamide, benzyldimethylamine, 4-(dimethylamino)-N,N-dimethylbenzylamine, 4-methoxy-N,N-dimethylbenzylamine, and 4-methyl-N,N-dimethylbenzylamine; hydrazine compounds such as adipic acid dihydrazide and sebacic acid dihydrazide; and phosphorus compounds such as triphenylphosphine. Furthermore, as commercial products, for example, 2MZ-A, 2MZ-OK, 2PHZ, 2P4BHZ, 2P4MHZ (all are trade names of imidazole compounds) manufactured by Shikoku Chemical Industries, Ltd., U-CAT (registered trademark) 3503N, U-CAT3502T (all are trade names of dimethylamine blocked isocyanate compounds), DBU, DBN, U-CATSA102, U-CAT5002 (all are bicyclic amidine compounds and their salts) manufactured by SAN-APRO Co., Ltd. are listed. In particular, it is not limited to these, as long as it is a heat-curing catalyst for epoxy resins and oxetane compounds, or a substance that promotes the reaction between epoxy groups and/or oxetane groups and carboxyl groups, and it can be used alone or in combination of two or more. Furthermore, S-triazine derivatives such as guanamine, acetoguanamine, benzoguanamine, melamine, 2,4-diamino-6-methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino-S-triazine, 2-vinyl-4,6-diamino-S-triazine・isocyanuric acid adduct, and 2,4-diamino-6-methacryloyloxyethyl-S-triazine・isocyanuric acid adduct can also be used. It is preferred to use these compounds that also act as adhesion imparting agents together with the heat-curing catalyst.

此等熱硬化觸媒可單獨或混合2種以上使用,其摻合量以通常的量的比例即充分,例如,相對於(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量、或(D)環氧樹脂以及其他的熱硬化成分的總量100質量份,較佳為0.1~20質量份、更佳為0.5~15.0質量份。These thermosetting catalysts can be used alone or in mixture of two or more types, and the blending amount is sufficient in a normal amount ratio, for example, relative to (A) carboxyl group-containing urethane resin and (F) other The total amount of carboxyl-containing resin, or the total amount of (D) epoxy resin and other thermosetting components per 100 parts by mass, is preferably 0.1 to 20 parts by mass, more preferably 0.5 to 15.0 parts by mass.

本發明的樹脂組成物中,為了容易溶解或分散(A)~(F)以及因應需要的其他的各成分,或為了調整為適合塗佈的黏度,能夠使用有機溶劑。作為有機溶劑,能夠列舉例如,甲苯、二甲苯、乙基苯、硝基苯、環己烷、異佛爾酮、二乙二醇二甲醚、乙二醇二乙醚、卡必醇乙酸酯、丙二醇甲基醚乙酸酯、丙二醇乙基醚乙酸酯、二丙二醇甲基醚乙酸酯、甲氧基丙酸甲酯、甲氧基丙酸乙酯、乙氧基丙酸甲酯、乙氧基丙酸乙酯、乙酸乙酯、乙酸正丁酯、乙酸異戊酯、乳酸乙酯、丙酮、甲基乙基酮、環己酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、γ-丁內酯、二甲基亞碸、氯仿及二氯甲烷等。有機溶劑的摻合量能夠因應所期望的黏度適當地設定。In the resin composition of the present invention, an organic solvent can be used in order to easily dissolve or disperse (A) to (F) and other components as needed, or to adjust the viscosity to a suitable viscosity for coating. Examples of the organic solvent include toluene, xylene, ethylbenzene, nitrobenzene, cyclohexane, isophorone, diethylene glycol dimethyl ether, ethylene glycol diethyl ether, and carbitol acetate. , Propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, dipropylene glycol methyl ether acetate, methyl methoxy propionate, ethyl methoxy propionate, ethoxy methyl propionate, Ethoxyethyl propionate, ethyl acetate, n-butyl acetate, isoamyl acetate, ethyl lactate, acetone, methyl ethyl ketone, cyclohexanone, N,N-dimethylformamide, N , N-dimethylacetamide, N-methylpyrrolidone, γ-butyrolactone, dimethylserioxide, chloroform and methylene chloride, etc. The blending amount of the organic solvent can be appropriately set according to the desired viscosity.

本發明的樹脂組成物因應需求為了提升與聚醯亞胺等基材的密著性,能夠含有周知常用的巰基化合物、密著促進劑。作為巰基化合物,能夠列舉2-巰基丙酸、三羥甲基丙烷參(2-硫基丙酸酯)、2-巰基乙醇、2-胺基硫酚、3-巰基-1,2,4-三唑、3-巰基-丙基三甲氧基矽烷等的含巰基矽烷偶合劑等。作為密著促進劑,例如,苯并咪唑、苯并㗁唑(benzoxazole)、苯并噻唑、2-巰基苯并咪唑、2-巰基苯并㗁唑、2-巰基苯并噻唑、3-嗎啉基甲基-1-苯基-三唑-2-硫酮、5-胺基-3-嗎啉基甲基-噻唑-2-硫酮、2-巰基-5-甲基硫基-噻二唑、三唑、四唑、苯并三唑、羧基苯并三唑、含胺基苯并三唑、乙烯基三嗪等。此等可各自單獨使用,亦可組合2種以上使用。其摻合量為(A)含羧基之胺基甲酸乙酯樹脂及(F)其他的含羧基樹脂的總量每100質量份,10質量份以下的範圍為適當。此等化合物的摻合量為上述範圍內的情況時,與交聯反應所需要的(D)環氧樹脂的環氧基的反應之環氧基的消耗為適當的範圍,交聯密度亦良好,因此為佳。The resin composition of the present invention may contain well-known and commonly used mercapto compounds and adhesion accelerators in order to improve the adhesion with base materials such as polyimide according to needs. Examples of mercapto compounds include 2-mercaptopropionic acid, trimethylolpropane (2-thiopropionate), 2-mercaptoethanol, 2-aminothiophenol, and 3-mercapto-1,2,4- Thiol-containing silane coupling agents such as triazole and 3-mercapto-propyltrimethoxysilane. Examples of adhesion accelerators include benzimidazole, benzoxazole, benzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoethazole, 2-mercaptobenzothiazole, and 3-morpholine Methyl-1-phenyl-triazole-2-thione, 5-amino-3-morpholinylmethyl-thiazole-2-thione, 2-mercapto-5-methylthio-thione Azole, triazole, tetrazole, benzotriazole, carboxybenzotriazole, amino-containing benzotriazole, vinyl triazine, etc. These can be used individually or in combination of 2 or more types. The blending amount is appropriately within the range of 10 parts by mass or less per 100 parts by mass of the total amount of (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins. When the blending amount of these compounds is within the above range, the consumption of the epoxy groups in the reaction with the epoxy groups of the (D) epoxy resin required for the cross-linking reaction is within an appropriate range, and the cross-linking density is also good. , so it is better.

由於高分子材料的多數為一旦開始氧化,則接連地發生連鎖的氧化劣化,導致高分子素材的功能降低,本發明的硬化性樹脂組成物為了防止氧化,能夠添加(1)使發生的自由基無效化之自由基捕捉劑或/及(2)將發生的過氧化物分解為無害的物質,使其不產生新的自由基之過氧化物分解劑等的抗氧化劑。Since most polymer materials begin to oxidize, chain oxidative deterioration occurs one after another, resulting in a decrease in the function of the polymer material. In order to prevent oxidation, the curable resin composition of the present invention can add (1) to reduce the generated free radicals. Inactive free radical scavengers or/and (2) antioxidants such as peroxide decomposers that decompose generated peroxides into harmless substances so that new free radicals are not generated.

作為自由基捕捉劑發揮功能的抗氧化劑,能夠列舉例如,4-t-丁基兒茶酚、2-t-丁基氫醌、氫醌單甲醚、2,6-二-t-丁基-p-甲酚、2,2-亞甲基-雙(4-甲基-6-t-丁基酚)、1,1,3-參(2-甲基-4-羥基-5-t-丁基苯基)丁烷、1,3,5-三甲基-2,4,6-參(3,5-二-t-丁基-4-羥基苯甲基)苯、1,3,5-參(3’,5’-二-t-丁基-4-羥基苯甲基)-S-三嗪-2,4,6-(1H,3H,5H)三酮等酚系、甲萘醌(metaquinone)、苯醌等醌系化合物、雙(2,2,6,6-四甲基-4-哌啶基)-癸二酸酯等胺系化合物等。As antioxidants that function as free radical scavengers, for example, 4-t-butylcatechol, 2-t-butylhydroquinone, hydroquinone monomethyl ether, 2,6-di-t-butyl-p-cresol, 2,2-methylene-bis(4-methyl-6-t-butylphenol), 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 2,6-di-t-butyl-p-cresol, 2,2-methylene-bis(4-methyl-6-t-butylphenol), 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 2,6-di-t-butyl-p-cresol ... Phenol compounds such as (3,5-di-t-butyl-4-hydroxybenzyl)benzene, 1,3,5-tris(3',5'-di-t-butyl-4-hydroxybenzyl)-S-triazine-2,4,6-(1H,3H,5H)trione, quinone compounds such as menadione (metaquinone) and benzoquinone, and amine compounds such as bis(2,2,6,6-tetramethyl-4-piperidinyl)-sebacic acid ester.

自由基捕捉劑可為市售品,能夠列舉例如,ADK STAB (註冊商標)AO-30、ADK STAB AO-330、ADK STAB AO-20、ADK STAB LA-77、ADK STAB LA-57、ADK STAB LA-67、ADK STAB LA-68、ADK STAB LA-87 (皆為ADEKA(股)製)、Irganox(註冊商標) 1010、Irganox 1035、Irganox 1076、Irganox 1135、Tinuvin(註冊商標) 111FDL、Tinuvin 123、Tinuvin 144、Tinuvin 152、Tinuvin 292、Tinuvin 5100(皆為BASF Japan(股)製)等。The free radical scavenger may be a commercially available product, for example, ADK STAB (registered trademark) AO-30, ADK STAB AO-330, ADK STAB AO-20, ADK STAB LA-77, ADK STAB LA-57, ADK STAB LA-67, ADK STAB LA-68, ADK STAB LA-87 (all manufactured by ADEKA Co., Ltd.), Irganox (registered trademark) 1010, Irganox 1035, Irganox 1076, Irganox 1135, Tinuvin (registered trademark) 111FDL, Tinuvin 123, Tinuvin 144, Tinuvin 152, Tinuvin 292, Tinuvin 5100 (all manufactured by BASF Japan Co., Ltd.), etc.

作為以過氧化物分解劑發揮功能的抗氧化劑,能夠列舉例如,亞磷酸三苯酯等磷系化合物、新戊四醇四月桂基硫基丙酸酯、二月桂基硫基二丙酸酯、二硬脂醯基3,3’-硫基二丙酸酯等硫系化合物等。過氧化物分解劑可為市售品,能夠列舉例如,ADK STAB TPP(ADEKA(股)製)、ADK STAB  AO-412S(ADEKA(股)製)、SUMILIZER (註冊商標)TPS(住友化學(股)製)等。抗氧化劑可單獨使用1種或組合2種以上使用。As antioxidants that function as peroxide decomposers, for example, phosphorus compounds such as triphenyl phosphite, sulfur compounds such as pentaerythritol tetralaurylthiopropionate, dilaurylthiodipropionate, and distearyl 3,3'-thiodipropionate, etc. can be cited. Peroxide decomposers can be commercially available products, and for example, ADK STAB TPP (manufactured by ADEKA Co., Ltd.), ADK STAB AO-412S (manufactured by ADEKA Co., Ltd.), SUMILIZER (registered trademark) TPS (manufactured by Sumitomo Chemical Co., Ltd.), etc. can be cited. The antioxidants can be used alone or in combination of two or more.

本發明的樹脂組成物除了抗氧化劑之外,能夠使用紫外線吸收劑。作為此種紫外線吸收劑,能夠列舉二苯基酮衍生物、苯甲酸酯衍生物、苯并三唑衍生物、三嗪衍生物、苯并噻唑衍生物、桂皮酸衍生物、鄰胺苯甲酸酯衍生物、二苯甲醯基甲烷衍生物等。The resin composition of the present invention can use an ultraviolet absorber in addition to an antioxidant. Examples of such ultraviolet absorbers include benzoketone derivatives, benzoate derivatives, benzotriazole derivatives, triazine derivatives, benzothiazole derivatives, cinnamic acid derivatives, and o-aminobenzoyl derivatives. Acid ester derivatives, benzylmethane derivatives, etc.

作為二苯基酮衍生物,能夠列舉例如,2-羥基-4-甲氧基-二苯基酮2-羥基-4-甲氧基二苯基酮、2-羥基-4-n-辛氧基(octoxy)二苯基酮、2,2’-二羥基-4-甲氧基二苯基酮及2,4-二羥基二苯基酮等。Examples of the phenyl ketone derivative include 2-hydroxy-4-methoxyphenyl ketone, 2-hydroxy-4-methoxyphenyl ketone, 2-hydroxy-4-n-octoxyphenyl ketone, 2,2'-dihydroxy-4-methoxyphenyl ketone, and 2,4-dihydroxyphenyl ketone.

作為苯甲酸酯衍生物,能夠列舉例如,柳酸2-乙基己酯、柳酸苯酯、p-t-丁基柳酸苯酯、2,4-二-t-丁基苯基-3,5-二-t-丁基-4-羥基苯甲酸酯及十六基-3,5-二-t-丁基-4-羥基苯甲酸酯等。Examples of benzoate derivatives include 2-ethylhexyl salicylate, phenyl salicylate, p-t-butyl phenyl salicylate, and 2,4-di-t-butylphenyl-3, 5-di-t-butyl-4-hydroxybenzoate and hexadecyl-3,5-di-t-butyl-4-hydroxybenzoate, etc.

作為苯并三唑衍生物,能夠列舉例如,2-(2’-羥基-5’-t-丁基苯基)苯并三唑、2-(2’-羥基-5’-甲基苯基)苯并三唑、2-(2’-羥基-3’-t-丁基-5’-甲基苯基)-5-氯苯并三唑、2-(2’-羥基-3’,5’-二-t-丁基苯基)-5-氯苯并三唑、2-(2’-羥基-5’-甲基苯基)苯并三唑及2-(2’-羥基-3’,5’-二-t-戊基苯基)苯并三唑等。Examples of the benzotriazole derivatives include 2-(2'-hydroxy-5'-t-butylphenyl)benzotriazole, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-(2'-hydroxy-3'-t-butyl-5'-methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-t-butylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, and 2-(2'-hydroxy-3',5'-di-t-pentylphenyl)benzotriazole.

作為三嗪衍生物,能夠列舉例如,羥基苯基三嗪、雙乙基己基氧基酚甲氧基苯基三嗪等。Examples of triazine derivatives include hydroxyphenyltriazine, bisethylhexyloxyphenolmethoxyphenyltriazine, and the like.

紫外線吸收劑亦可為市售之物,能夠列舉例如,Tinuvin PS、Tinuvin 99-2、Tinuvin 109、Tinuvin 384-2、Tinuvin 900、Tinuvin 928、Tinuvin 1130、Tinuvin 400、Tinuvin 405、Tinuvin 460、Tinuvin 479(皆為BASF Japan(股)製)等。The ultraviolet absorber may be a commercially available one, and examples thereof include Tinuvin PS, Tinuvin 99-2, Tinuvin 109, Tinuvin 384-2, Tinuvin 900, Tinuvin 928, Tinuvin 1130, Tinuvin 400, Tinuvin 405, Tinuvin 460, Tinuvin 479 (all owned by BASF Japan), etc.

本發明的樹脂組成物,進一步依照需求,以提升密著性、硬度、耐熱性等特性為目的,能夠含有選自由無機填料及有機填料所成群組之至少一種的填料。作為無機填料,能夠列舉硫酸鋇、碳酸鈣、氧化矽、非晶形二氧化矽(amorphous silica)、滑石、黏土、水滑石、雲母粉等,作為有機填料,能夠列舉矽粉(silicon powder)、耐隆粉(nylon powder)、氟粉(fluorine powder)等。上述填料之中,低吸濕性、低體積膨脹性特別優良的為二氧化矽。二氧化矽無論熔融、結晶性,亦可為此等的混合物,特別是經偶合劑等進行表面處理的二氧化矽的情況時,能夠提升電絕緣性而為佳。再者,本發明的樹脂組成物為熱硬化性樹脂組成物的情況時,為了圖案印刷需亦調整觸變性,較佳為含有二氧化矽。填料的平均粒徑期望為25μm以下、更佳為10μm以下、進而較佳為3μm以下。此等無機及/或有機填料的摻合量為,(A)含羧基之胺基甲酸乙酯樹脂以及(F)其他的含羧基樹脂的總量每100質量份,300質量份以下為適當,較佳為5~150質量份的比例。填料的摻合量超過上述比例,則硬化塗膜的柔軟性降低,因而不佳。The resin composition of the present invention may further contain at least one filler selected from the group consisting of inorganic fillers and organic fillers for the purpose of improving characteristics such as adhesion, hardness, and heat resistance according to requirements. Examples of inorganic fillers include barium sulfate, calcium carbonate, silicon oxide, amorphous silica, talc, clay, hydrotalcite, mica powder, etc. Examples of organic fillers include silicon powder, resistant Nylon powder, fluorine powder, etc. Among the above-mentioned fillers, silica is particularly excellent in low hygroscopicity and low volume expansion. Regardless of whether the silicon dioxide is molten or crystalline, it may be a mixture thereof. In particular, when the silicon dioxide is surface-treated with a coupling agent or the like, it is preferable because the electrical insulation properties can be improved. Furthermore, when the resin composition of the present invention is a thermosetting resin composition, it is necessary to adjust thixotropy for pattern printing, and it is preferable to contain silica. The average particle diameter of the filler is desirably 25 μm or less, more preferably 10 μm or less, further preferably 3 μm or less. The blending amount of these inorganic and/or organic fillers is, for every 100 parts by mass of the total amount of (A) carboxyl group-containing urethane resin and (F) other carboxyl group-containing resins, 300 parts by mass or less is appropriate. The preferred ratio is 5 to 150 parts by mass. If the blending amount of the filler exceeds the above ratio, the flexibility of the cured coating film decreases, which is undesirable.

進而本發明的樹脂組成物中只要不損害本發明的效果,亦可添加前述成分以外的其他添加劑。作為添加劑,能夠列舉有機膨土、蒙脫土等周知常用的增黏劑,聚矽氧系、氟系、高分子系等消泡劑及/或調平劑,玻璃纖維、碳纖維、氮化硼纖維等纖維強化材等。進而,依照需要能夠添加周知常用的熱聚合抑制劑、咪唑系、噻唑系、三唑系等矽烷偶合劑,分散劑、消泡劑、可塑劑、發泡劑、阻燃劑、抗靜電劑、抗老化劑、抗菌・防黴劑等。Furthermore, other additives other than the above-mentioned components may be added to the resin composition of the present invention as long as the effects of the present invention are not impaired. Examples of additives include well-known and commonly used tackifiers such as organobentonite and montmorillonite, defoaming agents and/or leveling agents such as polysiloxane-based, fluorine-based, and polymer-based defoaming agents, glass fiber, carbon fiber, and boron nitride. Fiber and other fiber reinforced materials, etc. Furthermore, well-known and commonly used thermal polymerization inhibitors, silane coupling agents such as imidazole series, thiazole series, and triazole series, dispersants, defoaming agents, plasticizers, foaming agents, flame retardants, antistatic agents, etc. can be added as needed. Anti-aging agents, antibacterial and antifungal agents, etc.

(樹脂組成物的調配、使用方法) 具有如同上述組成的樹脂組成物,能夠經由將前述各成份或者進一步依照需要的後述成份使用混合機,例如分散機、捏揉機、三滾筒研磨機、珠粒磨機等,進行溶解或分散而獲得。此時,亦可使用對於環氧基、酚性羥基為惰性的溶劑。作為此種惰性溶劑,較佳為前述有機溶劑。 (Preparation and use of resin composition) The resin composition having the above composition can be obtained by dissolving or dispersing the above components or the following components as required using a mixer such as a disperser, a kneader, a three-drum mill, a bead mill, etc. At this time, a solvent inert to epoxy groups and phenolic hydroxyl groups can also be used. As such an inert solvent, the above organic solvent is preferred.

本發明的樹脂組成物能夠以簾幕式塗佈法、滾筒塗佈法、噴霧塗佈法及浸沾式塗佈(dip coating)法等以往周知的各種方法塗佈於印刷基板之外,也能夠使用於乾膜或預浸體(prepreg)等各式各樣的形態、用途。根據其使用方法、用途能夠使用各式各樣的溶劑,視情況則不僅是良溶劑也可以使用不良溶劑。The resin composition of the present invention can be applied to a printed circuit board by various conventionally known methods such as curtain coating, roller coating, spray coating, and dip coating. It can be used in a variety of forms and applications, such as dry film or prepreg. Various solvents can be used depending on the usage method and purpose. Depending on the situation, not only good solvents but also poor solvents can be used.

再者,本發明的樹脂組成物可藉由網版印刷法塗佈於玻璃基板、形成有電路的可撓式印刷電路板,加熱至例如120~180℃的溫度使其熱硬化,藉此形成無因硬化收縮及冷卻收縮導致的翹曲,除了對於基材的密著性、耐折性、低翹曲性、無電解鍍金耐性、焊接耐熱性、電絕緣性等特性之外,良好地達成柔軟性與高反射率為高程度地平衡,且隨時間的反射率降低少的白色硬化塗膜。Furthermore, the resin composition of the present invention can be applied to a glass substrate by screen printing to form a flexible printed circuit board with a circuit, and then heated to a temperature of, for example, 120 to 180° C. to be thermally cured, thereby forming a white cured coating film that has no warping due to curing shrinkage and cooling shrinkage, and has good adhesion to the substrate, folding resistance, low warping, electroless gold plating resistance, soldering heat resistance, electrical insulation, etc., and has a good balance between flexibility and high reflectivity, and has little reflectivity reduction over time.

本發明的樹脂組成物,例如以前述有機溶劑調整為適合塗佈方法的黏度,於基材上經由浸沾式塗佈法、淋塗法、輥塗法、棒塗法、網版印刷法、簾幕式塗佈法等方法進行塗佈,以約60~100℃的溫度使組成物中所包含的有機溶劑揮發乾燥(乾燥),藉此能夠形成無黏性(take-free)的塗膜。 樹脂組成物為感光性樹脂組成物的情況時,乾燥後,透過形成圖案的光罩藉由選擇性地活性能量線曝光,或者經由雷射直寫曝光機直接圖案曝光,未曝光部分以稀鹼性水溶液進行顯影,形成光阻圖案。進而,此樹脂組成物為也包含熱硬化成分的感光性熱硬化性組成物的情況時,以例如約140~180℃的溫度加熱5分鐘~120分鐘使其熱硬化(後硬化)。經由此熱硬化,(A)含羧基之胺基甲酸乙酯樹脂的羧基(或者進一步酚性羥基)與熱硬化性成分的(D)環氧樹脂(或者包含的情況時為進一步其他的熱硬化性成分的環狀(硫基)醚基)進行反應,形成除了對於基材的密著性、耐折性、低翹曲性、無電解鍍金耐性、焊接耐熱性、電絕緣性等特性之外,良好地達成柔軟性與高反射率為高程度地平衡,且隨時間的反射率降低少的白色硬化塗膜。 樹脂組成物為不具有感光性的熱硬化性樹脂組成物的情況時,乾燥後以例如約140~180℃的溫度加熱5分鐘~120分鐘,使其熱硬化(後硬化),能夠形成達到與前述感光性樹脂組成物同樣的效果的白色硬化塗膜。 The resin composition of the present invention is coated on a substrate by a dip coating method, a shower coating method, a roller coating method, a rod coating method, a screen printing method, a curtain coating method, etc., and the organic solvent contained in the composition is evaporated and dried (dried) at a temperature of about 60 to 100° C., thereby forming a non-sticky (take-free) coating film. When the resin composition is a photosensitive resin composition, after drying, it is selectively exposed to active energy rays through a photomask that forms a pattern, or directly exposed to the pattern through a laser direct writing exposure machine, and the unexposed part is developed with a dilute alkaline aqueous solution to form a photoresist pattern. Furthermore, when the resin composition is a photosensitive thermosetting composition that also contains a thermosetting component, it is heated at a temperature of, for example, about 140 to 180°C for 5 to 120 minutes to be thermoset (post-cured). Through this thermosetting, the carboxyl group (or further phenolic hydroxyl group) of the carboxyl-containing urethane resin (A) reacts with the thermosetting component (D) epoxy resin (or cyclic (thio) ether group of further other thermosetting components when included) to form a white cured coating that has a good balance between flexibility and high reflectivity and a small decrease in reflectivity over time, in addition to the characteristics of adhesion to the substrate, folding resistance, low warping, electroless gold plating resistance, soldering heat resistance, and electrical insulation. When the resin composition is a thermosetting resin composition that is not photosensitivity, it can be heated at a temperature of, for example, about 140 to 180°C for 5 to 120 minutes after drying to thermally cure (post-cure) the composition, thereby forming a white cured coating that achieves the same effect as the aforementioned photosensitive resin composition.

作為上述基材,除了玻璃基板之外,能夠使用事先形成電路的印刷電路板、可撓式印刷電路板之外、紙-酚樹脂、紙-環氧樹脂、玻璃布-環氧樹脂、玻璃-聚醯亞胺、玻璃布/不織布-環氧樹脂、玻璃布/紙-環氧樹脂、合成纖維-環氧樹脂、使用氟樹脂・聚乙烯・PPO・氰酸酯等複合材的全部等級(FR-4等)的銅積層板、聚醯亞胺薄膜、PET薄膜、陶瓷基板、晶圓板等。As the above-mentioned base material, in addition to glass substrates, printed circuit boards with pre-formed circuits, flexible printed circuit boards, paper-phenol resin, paper-epoxy resin, glass cloth-epoxy resin, glass-polyimide, glass cloth/non-woven fabric-epoxy resin, glass cloth/paper-epoxy resin, synthetic fiber-epoxy resin, copper laminates of all grades (FR-4, etc.) using composite materials such as fluorine resin, polyethylene, PPO, and cyanate, polyimide films, PET films, ceramic substrates, wafer boards, etc. can be used.

塗佈本發明的樹脂組成物後進行揮發乾燥或熱硬化(後硬化),能夠使用熱風循環式乾燥爐、IR爐、加熱板、對流烘箱等(使用具備經由蒸氣而空氣加熱方式的熱源,使乾燥機內的熱風逆流接觸的方法及經由噴嘴向支持體噴氣的方式)而進行。After the resin composition of the present invention is applied, volatile drying or heat curing (post-curing) can be performed using a hot air circulation dryer, an IR furnace, a heating plate, a convection oven, etc. (using a heat source with a method of heating air via steam, a method of making the hot air in the dryer contact in countercurrent, and a method of spraying air onto the support via a nozzle).

作為上述活性能量線照射所使用的曝光機,能夠使用直接寫入裝置(例如經由電腦之CAD數據以直接雷射描繪影像的雷射直寫影像裝置)、搭載金屬鹵素燈的曝光機、搭載(超)高壓汞燈的曝光機、搭載短弧汞燈的曝光機或者使用(超)高壓汞燈等的紫外線燈的直接寫入裝置。作為活性能量線,只要使用最大波長為350~450nm的範圍的雷射光,氣體雷射、固體雷射任一者皆可。再者,其曝光量因膜厚等而不同,一般為5~800mJ/cm 2、較佳為5~500mJ/cm 2的範圍內。作為上述直接寫入裝置,能夠使用例如日本ORBOTECH(股)製之物,只要是能夠發振最大波長為350~450nm的雷射光之裝置,亦可使用任何裝置。 As the exposure machine used for the above-mentioned active energy ray irradiation, a direct writing device (such as a laser direct writing imaging device that directly draws an image with a laser through CAD data of a computer), an exposure machine equipped with a metal halide lamp, or an exposure machine equipped with ( Exposure machines equipped with ultra-) high-pressure mercury lamps, exposure machines equipped with short-arc mercury lamps, or direct writing devices using ultraviolet lamps such as (ultra-) high-pressure mercury lamps. As the active energy ray, any laser light with a maximum wavelength of 350 to 450 nm can be used, either a gas laser or a solid laser. In addition, the exposure amount varies depending on the film thickness, etc., but is generally in the range of 5 to 800 mJ/cm 2 , and preferably in the range of 5 to 500 mJ/cm 2 . As the direct writing device, for example, a product manufactured by Japan Orbotech Co., Ltd. can be used, and any device can be used as long as it is capable of oscillating laser light with a maximum wavelength of 350 to 450 nm.

作為上述顯影方法,能夠藉由浸漬法、噴淋法(shower method)、噴霧法、塗刷法等,作為顯影液,能夠使用氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、磷酸鈉、矽酸鈉、氨、胺類等的鹼性水溶液。The developing method may be an immersion method, a shower method, a spray method, a brush method, or the like, and the developer may be an alkaline aqueous solution of potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, ammonia, amines, or the like.

本發明的樹脂組成物,除了以液狀直接塗佈於基材的方法之外,能夠以具有事先於聚對苯二甲酸乙二酯等的薄膜(第1薄膜)將樹脂組成物塗佈・乾燥而形成的樹脂層之乾膜的形態使用。本發明的樹脂組成物作為乾膜使用的情況時如同下述。In addition to the method of directly applying the resin composition to a base material in a liquid form, the resin composition of the present invention can be coated with a film (first film) made of polyethylene terephthalate or the like in advance. It is used in the form of a dry film of the resin layer formed by drying. When the resin composition of the present invention is used as a dry film, it is as follows.

乾膜具有依序積層有第1薄膜、樹脂層及因應需要所使用的可剝離的第2薄膜之結構。此樹脂層為例如將樹脂組成物塗佈於承載膜或覆蓋膜,進行乾燥而獲得之層。於第1薄膜形成樹脂層後,將第2薄膜積層於其上,或於第2薄膜形成樹脂層,於此積層體積層第1薄膜而獲得乾膜。The dry film has a structure in which a first film, a resin layer, and a peelable second film are laminated in order. This resin layer is, for example, a layer obtained by applying a resin composition to a carrier film or a cover film and drying it. After the resin layer is formed on the first film, the second film is laminated thereon, or the resin layer is formed on the second film and the first film is laminated in bulk to obtain a dry film.

作為第1薄膜,能夠使用2~150μm的厚度的聚酯薄膜等熱可塑性薄膜。 樹脂層是將樹脂組成物以刮刀塗佈機、模唇塗佈機(LIP Coater)、逗號式塗佈機(Comma Coater)、塗膜機等,於第1薄膜或第2薄膜以厚度為10~150μm均勻地塗佈乾燥而形成。 作為第2薄膜,能夠使用聚乙烯薄膜、聚丙烯薄膜等,與樹脂層之間的接著力比第1薄膜更小為佳。 As the first film, a thermoplastic film such as a polyester film with a thickness of 2 to 150 μm can be used. The resin layer is formed by uniformly applying the resin composition to the first film or the second film with a thickness of 10 to 150 μm using a doctor blade coater, a lip coater (LIP Coater), a comma coater (Comma Coater), a film coater, etc., and drying. As the second film, a polyethylene film, a polypropylene film, etc. can be used, and it is better that the adhesion between the film and the resin layer is smaller than that of the first film.

使用乾膜於基板上製作保護膜(永久保護膜),是將第2薄膜剝離,將樹脂層及形成有電路的基材重疊,使用積層機等使其貼合,於形成有電路的基材上形成樹脂層。對於所形成的樹脂層,若與前述同樣地進行曝光、顯影、加熱硬化,能夠形成硬化塗膜。第1薄膜在曝光前、曝光後或加熱硬化前的任一時間點剝離即可。 實施例 To make a protective film (permanent protective film) on a substrate using a dry film, the second film is peeled off, the resin layer and the substrate with a circuit formed thereon are overlapped, and a lamination machine is used to bond them together to form a resin layer on the substrate with a circuit formed thereon. The formed resin layer can be exposed, developed, and heat-cured in the same manner as described above to form a hardened coating. The first film can be peeled off at any time point before exposure, after exposure, or before heat-curing. Example

以下顯示實施例及比較例具體說明本發明,惟,本發明不受限於下述實施例。Examples and comparative examples are shown below to illustrate the present invention in detail. However, the present invention is not limited to the following examples.

(塗料A-1-1的合成) 於具備攪拌裝置、溫度計、冷凝器的反應容器,置入1,5-戊二醇及1,6-己二醇所衍生的聚碳酸酯二醇(旭化成(股)製、TJ5650J、數量平均分子量800) 2400g (3mol)、二羥甲基丙酸603g (4.5mol),及作為單羥基化合物之丙烯酸2-羥基乙酯238g (2.6mol)。接著,置入作為聚異氰酸酯之異佛爾酮二異氰酸酯1887g (8.5mol),邊攪拌邊加熱至60℃而停止,當反應容器內的溫度開始降低的時間點,再次加熱於80℃持續地攪拌,以紅外線吸收光譜確認異氰酸酯基的吸收光譜(2280cm -1)消失而結束反應。添加卡必醇乙酸酯使固形份成為50質量%,獲得塗料A-1-1。含羧基之胺基甲酸乙酯樹脂的重量平均分子量為17,000,固形份的酸價為50mgKOH/g。 (Synthesis of Paint A-1-1) In a reaction vessel equipped with a stirring device, a thermometer, and a condenser, polycarbonate diol derived from 1,5-pentanediol and 1,6-hexanediol (Asahi Kasei (Co., Ltd.), TJ5650J, number average molecular weight 800) 2400g (3mol), dimethylol propionic acid 603g (4.5mol), and 238g (2.6mol) of 2-hydroxyethyl acrylate as a monohydroxy compound. Next, 1887g (8.5 mol) of isophorone diisocyanate, which is a polyisocyanate, was placed and heated to 60°C while stirring and stopped. When the temperature in the reaction vessel began to decrease, it was heated again at 80°C while stirring continuously. , the infrared absorption spectrum was used to confirm that the absorption spectrum of the isocyanate group (2280 cm -1 ) disappeared and the reaction was completed. Carbitol acetate was added so that the solid content became 50 mass %, and coating A-1-1 was obtained. The weight average molecular weight of the carboxyl-containing urethane resin is 17,000, and the acid value of the solid content is 50 mgKOH/g.

(塗料A-1-2的合成) 於具備攪拌裝置、溫度計、冷凝器的反應容器,置入作為具有2個以上的醇性羥基之化合物之1,5-戊二醇及1,6-己二醇所衍生的聚碳酸酯二醇(旭化成(股)T5650J、數量平均分子量800) 2400g (3.0mol)、二羥甲基丁酸603g (4.5mol),及作為單羥基化合物之丙烯酸2-羥基乙酯238g (2.6mol)。接著,置入作為非芳香族系之具有異氰酸酯基的化合物之六亞甲基二異氰酸酯1512g(6.5mol),邊攪拌邊加熱至60℃而停止,當反應容器內的溫度開始降低的時間點,再次加熱於80℃持續地攪拌,以紅外線吸收光譜確認異氰酸酯基的吸收光譜(2280cm -1)消失而結束反應。接著,添加卡必醇乙酸酯使固形份成為50質量%,獲得含稀釋劑的黏稠液體之含羧基之胺基甲酸乙酯樹脂、塗料A-1-2。獲得的含羧基之胺基甲酸乙酯樹脂的固形份的酸價為49.8mgKOH/g。 (Synthesis of Coating A-1-2) In a reaction container equipped with a stirrer, a thermometer, and a condenser, 2400 g (3.0 mol) of polycarbonate diol (T5650J, number average molecular weight 800, manufactured by Asahi Kasei Co., Ltd.) derived from 1,5-pentanediol and 1,6-hexanediol as a compound having two or more alcoholic hydroxyl groups, 603 g (4.5 mol) of dihydroxymethylbutyric acid, and 238 g (2.6 mol) of 2-hydroxyethyl acrylate as a monohydroxy compound were placed. Next, 1512 g (6.5 mol) of hexamethylene diisocyanate, a non-aromatic compound having an isocyanate group, was placed, and the mixture was heated to 60°C while stirring and stopped. When the temperature in the reaction vessel began to drop, the mixture was heated to 80°C again and stirred continuously. The absorption spectrum of the isocyanate group (2280 cm -1 ) disappeared by infrared absorption spectrum, and the reaction was terminated. Next, carbitol acetate was added to make the solid content 50% by mass, and a viscous liquid containing a carboxyl group, coating A-1-2, was obtained. The acid value of the solid content of the obtained carboxyl group-containing urethane resin was 49.8 mgKOH/g.

(塗料A-2-1的合成) 於具備攪拌裝置、溫度計、冷凝器的反應容器,置入作為多元醇成分之1,5-戊二醇與1,6-己二醇所衍生的聚碳酸酯二醇(數量平均分子量800) 288g (0.36mol)、雙酚A型環氧丙烷加成物二醇(ADEKA(股)製、BPX33、數量平均分子量500)45g(0.09mol)、作為二羥甲基烷酸之二羥甲基丁酸81.4g (0.55mol)、及作為分子量調整劑(反應停止劑)之n-丁醇11.8g (0.16mol)、作為溶劑之卡必醇乙酸酯(DAICEL(股)製) 250g,在60℃溶解全部的原料。邊攪拌多元醇成分,藉由滴下漏斗,滴下作為聚異氰酸酯之三甲基六亞甲基二異氰酸酯200.9g (1.08mol)。滴下完成後,在80℃邊攪拌反應持續進行,以紅外線吸收光譜確認異氰酸酯基的吸收光譜(2280cm -1)消失而結束反應。添加卡必醇乙酸酯使固形份成為50質量%,獲得含稀釋劑的黏稠液體之含羧基之胺基甲酸乙酯樹脂塗料A-2-1。獲得的含羧基之胺基甲酸乙酯樹脂的重量平均分子量為18,300,固形份的酸價為50.3mgKOH/g。又,平均分子量是使用凝膠載體液相層析(HLC-8120 GPC 東曹(股)製)之換算為聚苯乙烯之值而求取。 (Synthesis of coating material A-2-1) In a reaction container equipped with a stirrer, a thermometer and a condenser, 288 g (0.36 mol) of polycarbonate diol (number average molecular weight 800) derived from 1,5-pentanediol and 1,6-hexanediol as a polyol component, 45 g (0.09 mol) of bisphenol A type propylene oxide adduct diol (BPX33 manufactured by ADEKA Co., Ltd., number average molecular weight 500), 81.4 g (0.55 mol) of dihydroxymethylbutyric acid as dihydroxymethylalkanoic acid, 11.8 g (0.16 mol) of n-butanol as a molecular weight regulator (reaction terminator), and 250 g of carbitol acetate (manufactured by DAICEL Co., Ltd.) as a solvent were placed, and all the raw materials were dissolved at 60°C. While stirring the polyol component, 200.9 g (1.08 mol) of trimethyl hexamethylene diisocyanate as a polyisocyanate was dripped through a dropping funnel. After the dripping was completed, the reaction was continued while stirring at 80°C, and the absorption spectrum of the isocyanate group (2280 cm -1 ) disappeared by infrared absorption spectroscopy, and the reaction was terminated. Carbitol acetate was added to make the solid content 50% by mass, and a carboxyl-containing urethane resin coating A-2-1 containing a viscous liquid containing a diluent was obtained. The weight average molecular weight of the obtained carboxyl-containing urethane resin was 18,300, and the acid value of the solid content was 50.3 mgKOH/g. The average molecular weight was determined as a value converted to polystyrene using gel-supported liquid chromatography (HLC-8120 GPC, manufactured by Tosoh Corporation).

(塗料A-2-2的合成) 於具備攪拌裝置、溫度計、冷凝器的反應容器,置入作為多元醇成分之1,5-戊二醇與1,6-己二醇所衍生的聚碳酸酯二醇(數量平均分子量800) 180g (0.225mol)、雙酚A型環氧丙烷加成物二醇(ADEKA(股)製、BPX33、數量平均分子量500) 112.5g (0.225mol)、作為二羥甲基烷酸之二羥甲基丁酸81.4g (0.55mol)、及作為分子量調整劑(反應停止劑)之n-丁醇11.8g (0.16mol)、作為溶劑之卡必醇乙酸酯(DAICEL(股)製) 250g,在60℃溶解全部的原料。邊攪拌多元醇成分,藉由滴下漏斗,滴下作為聚異氰酸酯之三甲基六亞甲基二異氰酸酯200.9g (1.08mol)。滴下完成後,在80℃邊攪拌反應持續進行,以紅外線吸收光譜確認異氰酸酯基的吸收光譜(2280cm -1)消失而結束反應。添加卡必醇乙酸酯使固形份成為50質量%,獲得含稀釋劑的黏稠液體之含羧基之胺基甲酸乙酯樹脂塗料A-2-2。獲得的含羧基之胺基甲酸乙酯樹脂的重量平均分子量為18,000,固形份的酸價為50.0mgKOH/g。又,平均分子量是使用凝膠載體液相層析(HLC-8120 GPC 東曹(股)製)之換算為聚苯乙烯之值而求取。 (Synthesis of coating material A-2-2) In a reaction container equipped with a stirrer, a thermometer and a condenser, 180 g (0.225 mol) of polycarbonate diol (number average molecular weight 800) derived from 1,5-pentanediol and 1,6-hexanediol as a polyol component, 112.5 g (0.225 mol) of bisphenol A type propylene oxide adduct diol (BPX33 manufactured by ADEKA Co., Ltd., number average molecular weight 500), 81.4 g (0.55 mol) of dihydroxymethylbutyric acid as dihydroxymethylalkanoic acid, 11.8 g (0.16 mol) of n-butanol as a molecular weight regulator (reaction terminator), and 250 g of carbitol acetate (manufactured by DAICEL Co., Ltd.) as a solvent were placed, and all the raw materials were dissolved at 60°C. While stirring the polyol component, 200.9 g (1.08 mol) of trimethyl hexamethylene diisocyanate as a polyisocyanate was dripped through a dropping funnel. After the dripping was completed, the reaction was continued while stirring at 80°C, and the absorption spectrum of the isocyanate group (2280 cm -1 ) disappeared by infrared absorption spectroscopy, and the reaction was terminated. Carbitol acetate was added to make the solid content 50% by mass, and a carboxyl-containing urethane resin coating A-2-2 containing a viscous liquid containing a diluent was obtained. The weight average molecular weight of the obtained carboxyl-containing urethane resin was 18,000, and the acid value of the solid content was 50.0 mgKOH/g. The average molecular weight was determined as a value converted to polystyrene using gel-supported liquid chromatography (HLC-8120 GPC, manufactured by Tosoh Corporation).

(塗料F-1(其他的含羧基樹脂)的合成) 於具備溫度計、攪拌機、滴下漏斗以及回流冷凝器的燒瓶,將作為溶劑之二丙二醇單甲醚325.0質量份加熱至110℃,將甲基丙烯酸174.0質量份、ε-己內酯改質甲基丙烯酸(平均分子量314)174.0質量份、甲基丙烯酸甲酯77.0質量份、二丙二醇單甲醚222.0質量份、以及作為聚合觸媒之過氧-2-乙己酸三級-丁酯(日油(股)製、Perbutyl-O) 12.0質量份的混合物,花費3小時滴下,進一步在110℃攪拌3小時,使聚合觸媒失活,獲得樹脂溶液。將此樹脂溶液冷卻後,加入Cyclomer M100 DAICEL(股)製289.0質量份、三苯基膦3.0質量份以及氫醌單甲醚1.3質量份,升溫至100℃,藉由攪拌進行環氧基的開環加成反應,獲得固形份45.5質量%,固形份酸價為79.8mgKOH/g的塗料F-1。 (Synthesis of coating material F-1 (other carboxyl-containing resin)) In a flask equipped with a thermometer, a stirrer, a dropping funnel and a reflux condenser, 325.0 parts by mass of dipropylene glycol monomethyl ether as a solvent was heated to 110°C, and a mixture of 174.0 parts by mass of methacrylic acid, 174.0 parts by mass of ε-caprolactone-modified methacrylic acid (average molecular weight 314), 77.0 parts by mass of methyl methacrylate, 222.0 parts by mass of dipropylene glycol monomethyl ether, and 12.0 parts by mass of tertiary butyl peroxy-2-ethylhexanoate (manufactured by NOF Corporation, Perbutyl-O) as a polymerization catalyst was added dropwise over 3 hours, and the mixture was further stirred at 110°C for 3 hours to deactivate the polymerization catalyst, thereby obtaining a resin solution. After cooling the resin solution, add 289.0 parts by mass of Cyclomer M100 (Daicel Co., Ltd.), 3.0 parts by mass of triphenylphosphine, and 1.3 parts by mass of hydroquinone monomethyl ether, raise the temperature to 100°C, and stir to carry out the ring-opening addition reaction of the epoxy group to obtain coating F-1 with a solid content of 45.5% and a solid acid value of 79.8 mgKOH/g.

(塗料F-2(其他的含羧基樹脂)的合成) 於具備攪拌機及冷卻管之2,000ml燒瓶,置入三丙二醇單甲醚377g,在氮氣流下加熱至90℃。將混合溶解苯乙烯104.2g、甲基丙烯酸246.5g、二甲基2,2’-偶氮雙(2-甲基丙酸酯)(富士軟片和光純藥(股)製:V-601)20.7g之物花費4小時滴入燒瓶。如此進行,獲得含羧基樹脂溶液塗料F-2。此含羧基樹脂溶液固形份酸價為120mgKOH/g,固形份為50%,分子量為20,000。再者,獲得的含羧基樹脂的質量平均分子量經由島津製作所(股)製幫浦LC-6AD及連接三根昭和電工(股)製管柱Shodex(註冊商標)KF-804、KF-803、KF-802的高速液相層析而測定。 (Synthesis of coating F-2 (other carboxyl-containing resins)) Place 377g of tripropylene glycol monomethyl ether in a 2,000 ml flask equipped with a stirrer and cooling tube, and heat to 90°C under nitrogen flow. Mix and dissolve 104.2g of styrene, 246.5g of methacrylic acid, and 20.7 of dimethyl 2,2'-azobis(2-methylpropionate) (Fuji Films and Wako Pure Chemical Industries, Ltd.: V-601) g was dropped into the flask over 4 hours. By proceeding in this manner, carboxyl group-containing resin solution coating material F-2 was obtained. The solid content of this carboxyl-containing resin solution has an acid value of 120 mgKOH/g, a solid content of 50%, and a molecular weight of 20,000. Furthermore, the mass average molecular weight of the obtained carboxyl group-containing resin was determined by connecting a pump LC-6AD manufactured by Shimadzu Corporation and three Shodex (registered trademark) columns manufactured by Showa Denko Corporation, KF-804, KF-803, and KF- 802 high-speed liquid chromatography.

(塗料F-3(其他的含羧基樹脂)的合成) 於二乙二醇單乙基醚乙酸酯600g加入鄰甲酚酚醛清漆型環氧樹脂(DIC(股)製、EPICLON N-695、軟化點95℃、環氧當量214、平均官能基數7.6)1070g、丙烯酸360g及氫醌1.5g,於100℃加熱攪拌,均勻地溶解。接著,加入三苯基膦4.3g,於110℃加熱反應2小時後,升溫至120℃進而再進行反應12小時。於獲得的反應液中加入芳香族系烴(SOLVESSO 150)415g、四氫鄰苯二甲酸酐456.0g,在110℃進行反應4小時,冷卻後,獲得固形份酸價89mgKOH/g,固形份65%的塗料F-3。 (Synthesis of coating F-3 (other carboxyl-containing resins)) 1070 g of o-cresol novolac epoxy resin (DIC Co., Ltd., EPICLON N-695, softening point 95°C, epoxy equivalent 214, average functional group number 7.6), 360 g of acrylic acid, and 1.5 g of hydroquinone were added to 600 g of diethylene glycol monoethyl ether acetate, and heated and stirred at 100°C to uniformly dissolve. Then, 4.3 g of triphenylphosphine was added, and the mixture was heated at 110°C for reaction for 2 hours, and then the temperature was raised to 120°C and the reaction was continued for another 12 hours. 415g of aromatic hydrocarbon (SOLVESSO 150) and 456.0g of tetrahydrophthalic anhydride were added to the obtained reaction solution, and the reaction was carried out at 110°C for 4 hours. After cooling, a coating F-3 with a solid acid value of 89mgKOH/g and a solid content of 65% was obtained.

(樹脂組成物的調配) 使用獲得的各塗料(A-1-1)、(A-1-2)、(A-2-1)、(A-2-2)、(F-1)、(F-2)以及(F-3),將表1所示的各種的成分以表記的比例(質量份)摻合,在攪拌機進行預備混合後,以三滾筒研磨機進行混練,調配實施例1~11以及比較例1~7的樹脂組成物。除非另有說明,表中的值為質量份。再者,各塗料以及其他的成分的表中的值,是以固形份表記。 (Preparation of resin composition) Using the obtained coatings (A-1-1), (A-1-2), (A-2-1), (A-2-2), (F-1), (F-2) and (F-3), the various components shown in Table 1 were blended in the indicated proportions (mass parts), pre-mixed in a blender, and then kneaded in a three-drum mill to prepare the resin compositions of Examples 1 to 11 and Comparative Examples 1 to 7. Unless otherwise specified, the values in the table are mass parts. In addition, the values in the table of each coating and other components are expressed in solid content.

(Tg及損耗正切(tanδ)的測定方法) Tg及損耗正切(tanδ)的峰是將後述的形成於Tg及損耗正切(tanδ)的峰的測定用評價用基板上的樹脂層的硬化塗膜從銅箔剝離,將此硬化塗膜藉由動態黏彈性測定裝置(DMA、TA Instruments Japan(股)製、型號:RSA-G2)的拉伸模式而測定。測定條件為溫度範圍為-60℃~300℃、升溫速度為5℃/min、頻率為1Hz、應變0.1%、樣本尺寸為寬5mm×長度50mm。硬化塗膜是以在寬度方向的兩端部分別固定的方式設置,切除從夾頭突出的硬化塗膜。夾頭間距離設為10mm。 表1中,將實施例1~11以及比較例1~7的各樹脂組成物的硬化塗膜之在頻率1Hz的動態黏彈性測定中的Tg及損耗正切(tanδ)的峰合併記載。 (Measurement method of Tg and loss tangent (tanδ)) The peaks of Tg and loss tangent (tanδ) are formed by peeling off the cured coating film of the resin layer on the evaluation substrate for measuring the peaks of Tg and loss tangent (tanδ) described later from the copper foil, and passing the cured coating film through The dynamic viscoelasticity was measured in the tensile mode of a dynamic viscoelasticity measuring device (DMA, manufactured by TA Instruments Japan Co., Ltd., model: RSA-G2). The measurement conditions are as follows: the temperature range is -60°C to 300°C, the temperature rise rate is 5°C/min, the frequency is 1Hz, the strain is 0.1%, and the sample size is 5mm wide × 50mm long. The hardened coating film is provided so as to be fixed at both ends in the width direction, and the hardened coating film protruding from the chuck is cut off. The distance between the chucks is set to 10mm. In Table 1, the peaks of Tg and loss tangent (tan δ) in the dynamic viscoelasticity measurement at a frequency of 1 Hz of the cured coating films of each resin composition of Examples 1 to 11 and Comparative Examples 1 to 7 are listed together.

(Tg及損耗正切(tanδ)的峰的測定用評價基板(以下稱為Tg等測定評價用基板)的製作) 將實施例1~8以及比較例1~6的感光性樹脂組成物於厚度18μm的銅箔上以網版印刷之乾燥後的膜厚成為30μm的方式進行全面塗佈,形成樹脂層。之後,將此樹脂層以80℃的熱風循環式乾燥爐乾燥30分鐘後,使用搭載金屬鹵素燈的曝光裝置(HMW-680-GW20: ORC MANUFACTURING (股)),以900mJ/cm 2的曝光量進行曝光,顯影(30℃、0.2MPa、1質量%Na 2CO 3水溶液)進行60秒。之後,將此樹脂層於熱風循環式乾燥爐以150℃、60分鐘的條件使其硬化,形成樹脂層的硬化塗膜,製作Tg等測定評價用基板。 (Preparation of evaluation substrate for measurement of Tg and loss tangent (tanδ) peaks (hereinafter referred to as Tg, etc. measurement evaluation substrate)) The photosensitive resin composition of Examples 1 to 8 and Comparative Examples 1 to 6 was fully coated on a copper foil having a thickness of 18 μm by screen printing in such a manner that the film thickness after drying became 30 μm to form a resin layer. Thereafter, the resin layer was dried in a hot air circulation drying furnace at 80°C for 30 minutes, and then exposed at an exposure amount of 900 mJ/ cm2 using an exposure device equipped with a metal halogen lamp (HMW-680-GW20: ORC MANUFACTURING (Co., Ltd.)), and developed (30°C, 0.2 MPa, 1 mass% Na2CO3 aqueous solution) for 60 seconds. Thereafter, the resin layer was cured in a hot air circulation drying oven at 150°C for 60 minutes to form a cured coating film of the resin layer, thereby preparing a substrate for measurement and evaluation of Tg and the like.

將實施例9~11以及比較例7的熱硬化性樹脂組成物於厚度18μm的銅箔上以網版印刷之乾燥後的膜厚成為30μm的方式進行全面塗佈,形成樹脂層。之後,將此樹脂層於熱風循環式乾燥爐,以150℃、60分鐘的條件使其硬化,形成樹脂層的硬化塗膜,製作Tg等測定評價用基板。The thermosetting resin compositions of Examples 9 to 11 and Comparative Example 7 were fully coated on a copper foil with a thickness of 18 μm so that the film thickness after drying after screen printing became 30 μm to form a resin layer. Thereafter, the resin layer was cured in a hot-air circulation drying oven at 150° C. for 60 minutes to form a cured coating film of the resin layer, and a substrate for Tg and other measurement evaluations was produced.

(*1)(A)(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂:上述合成的塗料A-1-1 (*2)(A)(A-1)不具有芳香環的含羧基之胺基甲酸乙酯樹脂:上述合成的塗料A-1-2 (*3)(A)(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂:上述合成的塗料A-2-1 (*4)(A)(A-2)具有芳香環的二醇與脂肪族二異氰酸酯所衍生的含羧基之胺基甲酸乙酯樹脂:上述合成的塗料A-2-2 (*5)相當於(F)成分的說明(1)所記載的其他的含羧基樹脂:上述合成的塗料F-1 (*6)相當於(F)成分的說明(2)所記載的其他的含羧基樹脂:上述合成的塗料F-2 (*7)(F)成分:上述合成的塗料F-3 (*8)(D)成分:Mitsubishi Chemical(股)製雙酚A型環氧樹脂 商品名:jER828 (*9)(C)成分:2,4,6-三甲基苯甲醯基二苯基氧化膦、醯基氧化膦系光聚合起始劑 (*10)熱硬化觸媒:Mitsubishi Chemical(股)製二氰二胺 商品名:DICY7 (*11)熱硬化觸媒:日產化學(股)三聚氰胺 商品名:三聚氰胺 (*12)(B)成分:中村化學工業(股)製雙酚A型二官能甲基丙烯酸酯商品名:BPE-900 (*13)三官能的(甲基)丙烯酸酯:東亞合成(股)製三羥甲基丙烷EO改質三丙烯酸酯商品名:M-350 (*14)六官能的(甲基)丙烯酸酯:日本化藥(股)製二新戊四醇六丙烯酸酯商品名:DPHA (*15)分散劑:BYK JAPAN(股)製濕潤分散劑 商品名:Disperbyk-111 (*16)(E)成分:石原產業(股)製金紅石型氧化鈦(以氧化鋁+二氧化矽表面處理)商品名:CR-90 (*17) Tosoh Silica (股)製二氧化矽 商品名:E-743(平均粒徑0.1μm) (*1)(A)(A-1) Carboxyl-containing urethane resin without aromatic ring: Coating A-1-1 synthesized above (*2)(A)(A-1) Carboxyl-containing urethane resin without aromatic ring: Coating A-1-2 synthesized above (*3)(A)(A-2) Carboxyl-containing urethane resin derived from diol with aromatic ring and aliphatic diisocyanate: Coating A-2-1 synthesized above (*4)(A)(A-2) Carboxyl-containing urethane resin derived from diol with aromatic ring and aliphatic diisocyanate: Coating A-2-2 synthesized above (*5) Other carboxyl-containing resins described in (1) of the description of component (F): Coating F-1 synthesized above (*6) Other carboxyl-containing resins described in the description (2) of component (F): the above-synthesized coating F-2 (*7) (F) component: the above-synthesized coating F-3 (*8) (D) component: Mitsubishi Chemical Co., Ltd. bisphenol A type epoxy resin, trade name: jER828 (*9) (C) component: 2,4,6-trimethylbenzyldiphenylphosphine oxide, acylphosphine oxide-based photopolymerization initiator (*10) Thermosetting catalyst: Mitsubishi Chemical Co., Ltd. dicyandiamide, trade name: DICY7 (*11) Thermosetting catalyst: Nissan Chemical Co., Ltd. melamine, trade name: melamine (*12) (B) component: Nakamura Chemical Co., Ltd. bisphenol A type difunctional methacrylate, trade name: BPE-900 (*13) Trifunctional (meth)acrylate: Trihydroxymethylpropane EO modified triacrylate manufactured by Toa Gosei Co., Ltd. Trade name: M-350 (*14) Hexafunctional (meth)acrylate: Dipentatriol hexaacrylate manufactured by Nippon Kayaku Co., Ltd. Trade name: DPHA (*15) Dispersant: Wetting dispersant manufactured by BYK JAPAN Co., Ltd. Trade name: Disperbyk-111 (*16) (E) ingredient: Rutile titanium oxide manufactured by Ishihara Sangyo Co., Ltd. (surface treated with alumina + silica) Trade name: CR-90 (*17) Silica manufactured by Tosoh Silica Co., Ltd. Trade name: E-743 (average particle size 0.1μm)

對於如此進行所獲得的實施例1~11以及比較例1~7的樹脂組成物,進行下述的評價。將此等的結果合併顯示於表1中。The resin compositions of Examples 1 to 11 and Comparative Examples 1 to 7 obtained in this manner were evaluated as follows. These results are combined and shown in Table 1.

(耐熱性等評價用基板的製作) 將實施例1~8以及比較例1~6的感光性樹脂組成物於藉由拋光進行前處理的銅實心基板上,以網版印刷之乾燥後的膜厚成為30μm的方式進行全面塗佈,形成樹脂層。之後,將此樹脂層以80℃的熱風循環式乾燥爐乾燥30分鐘後,使用搭載金屬鹵素燈的曝光裝置(HMW-680-GW20: ORC MANUFACTURING (股)),以900mJ/cm 2的曝光量進行曝光,顯影(30℃、0.2MPa、1質量%Na 2CO 3水溶液)進行60秒。之後,將此樹脂層於熱風循環式乾燥爐以150℃、60分鐘的條件使其硬化,形成樹脂層的硬化塗膜,製作耐熱性等評價用基板。 (Preparation of substrate for evaluation of heat resistance, etc.) The photosensitive resin compositions of Examples 1 to 8 and Comparative Examples 1 to 6 were screen-printed on a solid copper substrate that was pretreated by polishing. Coat the entire surface so that the thickness becomes 30 μm to form a resin layer. After that, the resin layer was dried in a hot air circulation drying oven at 80°C for 30 minutes, and then an exposure device equipped with a metal halide lamp (HMW-680-GW20: ORC MANUFACTURING Co., Ltd.) was used to expose the resin layer at an exposure dose of 900 mJ/cm 2 Exposure and development (30° C., 0.2 MPa, 1 mass % Na 2 CO 3 aqueous solution) were performed for 60 seconds. Thereafter, the resin layer was cured in a hot-air circulation drying oven at 150° C. for 60 minutes to form a cured coating film of the resin layer, and a substrate for evaluation of heat resistance and the like was produced.

將實施例9~11以及比較例7的熱硬化性樹脂組成物於經由拋光進行前處理的銅實心基板上,以網版印刷之乾燥後的膜厚成為30μm的方式全面塗佈,形成樹脂層。之後,將此樹脂層以80℃的熱風循環式乾燥爐乾燥30分鐘後,於熱風循環式乾燥爐,以150℃、60分鐘的條件使其硬化,形成樹脂層的硬化塗膜,製作耐熱性等評價用基板。The thermosetting resin compositions of Examples 9 to 11 and Comparative Example 7 were fully coated on a copper solid substrate pre-treated by polishing so that the film thickness after drying after screen printing became 30 μm to form a resin layer. . Thereafter, the resin layer was dried in a hot-air circulation drying oven at 80°C for 30 minutes, and then hardened in a hot-air circulation drying oven at 150°C for 60 minutes to form a cured coating film of the resin layer to produce a heat-resistant coating. and other evaluation substrates.

(耐熱性的評價) 於上述所獲得的各耐熱性等評價用基板塗佈松香系助焊劑,浸漬於事先設定為260℃的焊錫槽5秒。接著,以變性酒精清洗助焊劑後,以目視評價硬化塗膜的膨脹・剝離。耐熱性的評價基準如同下述。 ○:硬化塗膜無膨脹以及剝離。 ×:硬化塗膜有膨脹以及剝離。 (Evaluation of heat resistance) Rosin-based flux was applied to each of the heat resistance evaluation substrates obtained above, and immersed in a solder bath set at 260°C for 5 seconds. Then, the flux was cleaned with denatured alcohol, and the expansion and peeling of the hardened coating were visually evaluated. The evaluation criteria for heat resistance are as follows. ○: The hardened coating has no expansion and peeling. ×: The hardened coating has expansion and peeling.

(反射率的評價) 形成於上述所獲得的各耐熱性等評價用基板上的樹脂層之在450nm的反射率以分光測色儀(柯尼卡美能達(股)製、型號:CM-5)進行測定。評價結果顯示於表1中的「硬化後」之行。反射率的評價基準如同下述。 ◎:反射率為90%以上。 ○:反射率為86%以上、未滿90%。 ×:反射率為未滿86%。 再者,關於上述耐熱性的評價後的各評價用基板上的樹脂層,也測定反射率,以上述同樣的評價基準進行評價。評價結果顯示於表1中的「回焊後」之行。 (Evaluation of reflectivity) The reflectivity at 450nm of the resin layer formed on each evaluation substrate for heat resistance obtained above was measured using a spectrophotometer (manufactured by Konica Minolta Co., Ltd., model: CM-5). The evaluation results are shown in the "After Curing" row in Table 1. The evaluation criteria for reflectivity are as follows. ◎: Reflectivity is 90% or more. ○: Reflectivity is 86% or more and less than 90%. ×: Reflectivity is less than 86%. In addition, the reflectivity of the resin layer on each evaluation substrate after the above heat resistance evaluation was also measured and evaluated using the same evaluation criteria as above. The evaluation results are shown in the "After Reflow" row in Table 1.

(翹曲的評價) 製作上述Tg等測定評價用基板時,實施例1~8以及比較例1~6的感光性樹脂組成物的情況時,顯影後,將形成於獲得的銅箔上的塗膜切出各銅箔5cm×5cm片,於熱風循環式乾燥爐,以150℃、60分鐘的條件,加熱硬化後回復至室溫。將切出的5×5cm片的各銅箔附有的硬化塗膜(以下稱為樣本)靜置於操作台1小時後,以尺測量從操作台的表面至樣本的四個端點的高度,進行總計,各樣本進行3次同樣的試驗,求取3次試驗的平均值。評價結果顯示於表1中的「硬化後」之行。翹曲的評價基準如同下述。 製作上述Tg等測定評價用基板時,實施例9~11以及比較例7的熱硬化性樹脂組成物的情況時,乾燥後,將形成於獲得的銅箔上的塗膜切出各銅箔5cm×5cm片,於熱風循環式乾燥爐,以150℃、60分鐘的條件加熱硬化後回復至室溫。將切出的5×5cm片的各銅箔附有的硬化塗膜(以下稱為樣本)靜置於操作台1小時後,以尺測量從操作台的表面至樣本的四個端點的高度,進行總計,各樣本進行3次同樣的試驗,求取3次試驗的平均值。評價結果顯示於表1中的「硬化後」的行。翹曲的評價基準如同下述。 又,此翹曲的評價中,作為評價用基板的基材使用銅箔,而不是本發明的課題所舉例的玻璃。由於玻璃比銅箔不易翹曲,以與上述樣本同樣尺寸進行同樣的試驗,則翹曲的值過小而非常難以進行評價的判定。因此,為了使評價的判定明確,使用翹曲大的銅箔進行試驗。認為若在此翹曲的評價基準具有翹曲降低效果的話,在玻璃的情況時也具有充分地翹曲降低效果。 ◎:高度合計為未滿40mm。 ○:高度合計為40mm以上、未滿60mm。 △:高度合計為60mm以上、未滿80mm。 ×:高度合計為80mm以上。 再者,關於上述評價用基板,使用回焊裝置(Eightech Tectron公司製NIS-20-82C),以最高溫度260℃的設定進行回焊步驟1次。之後,以與上述評價同樣的基準,測定、評價反射率。評價結果顯示於表1中的「回焊後」的行。 (Evaluation of warp) When preparing the substrate for the above-mentioned Tg measurement and evaluation, in the case of the photosensitive resin composition of Examples 1 to 8 and Comparative Examples 1 to 6, after development, the coating formed on the obtained copper foil is cut into 5cm×5cm pieces of each copper foil, and heat-cured in a hot air circulation drying furnace at 150°C for 60 minutes, and then returned to room temperature. After the cut 5×5cm pieces of the cured coating attached to each copper foil (hereinafter referred to as the sample) are placed on the operating table for 1 hour, the height from the surface of the operating table to the four end points of the sample is measured with a ruler, and the total is calculated. Each sample is tested three times in the same way, and the average value of the three tests is obtained. The evaluation results are shown in the "After Curing" row in Table 1. The evaluation criteria for warp are as follows. When making the above-mentioned substrate for Tg measurement and evaluation, in the case of the thermosetting resin composition of Examples 9 to 11 and Comparative Example 7, after drying, the coating formed on the obtained copper foil is cut into 5cm×5cm pieces of each copper foil, and heat-cured in a hot air circulation drying furnace at 150°C for 60 minutes and then returned to room temperature. After the cut 5×5cm pieces of each copper foil attached to the cured coating (hereinafter referred to as the sample) are placed on the operating table for 1 hour, the height from the surface of the operating table to the four end points of the sample is measured with a ruler, and the total is calculated. Each sample is tested three times in the same way, and the average value of the three tests is obtained. The evaluation results are shown in the "After Curing" row in Table 1. The evaluation criteria for warp are as follows. In addition, in this warp evaluation, copper foil is used as the base material of the evaluation substrate, not glass as exemplified in the subject of the present invention. Since glass is less likely to warp than copper foil, if the same test is conducted with the same size as the above sample, the warp value is too small and it is very difficult to make an evaluation judgment. Therefore, in order to make the evaluation judgment clear, a copper foil with large warp is used for the test. It is believed that if there is a warp reduction effect in this warp evaluation standard, there is also a sufficient warp reduction effect in the case of glass. ◎: The total height is less than 40mm. ○: The total height is 40mm or more and less than 60mm. △: The total height is 60mm or more and less than 80mm. ×: The total height is 80mm or more. Furthermore, regarding the above evaluation substrate, a reflow step was performed once using a reflow device (NIS-20-82C manufactured by Eightech Tectron) at a maximum temperature of 260°C. Afterwards, the reflectivity was measured and evaluated using the same criteria as the above evaluation. The evaluation results are shown in the "After Reflow" row in Table 1.

(無電解鍍金耐性的評價) 製作上述耐熱性等評價用基板時,實施例1~8以及比較例1~6的感光性樹脂組成物的情況時,於經硫酸處理的銅厚18μm的電路圖案基板上,使用L/S(線寬/線距(line/space))=100/300μm的負片,形成光阻圖案(硬化塗膜)。 製作上述耐熱性等評價用基板時,實施例9~11以及比較例7的熱硬化性樹脂組成物的情況時,於經硫酸處理的銅厚18μm的電路圖案基板上,經由圖案印刷形成具有直徑2mm的開口部的光阻圖案(硬化塗膜)。 之後,對於所獲得的評價用基板,使用市售的無電解鍍鎳浴及無電解鍍金浴,以鎳5μm、金0.03μm的條件進行鍍金,評價有無光阻圖案層的剝離、有無鍍層的滲透後,藉由帶剝離(Tape peeling)評價有無光阻圖案層的剝離。無電解鍍金耐性的評價基準如同下述。 ○:未觀察到鍍層滲透、光阻圖案層的剝離。 △:觀察到鍍後有些微的滲透,也觀察到帶剝離後之光阻圖案層的剝離。 ×:鍍後有光阻圖案層的剝離。 (Evaluation of electroless gold plating resistance) When preparing the substrate for evaluation of heat resistance and the like, in the case of the photosensitive resin compositions of Examples 1 to 8 and Comparative Examples 1 to 6, L/S ( A negative film with line width/space (line/space)=100/300μm is used to form a photoresist pattern (hardened coating film). When preparing the above-mentioned substrate for evaluation of heat resistance and the like, in the case of the thermosetting resin compositions of Examples 9 to 11 and Comparative Example 7, on a sulfuric acid-treated copper circuit pattern substrate with a thickness of 18 μm, a pattern with a diameter of 18 μm was formed by pattern printing. Photoresist pattern (hardened coating film) with 2mm opening. Thereafter, the obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of 5 μm nickel and 0.03 μm gold, and the presence or absence of peeling of the photoresist pattern layer and the presence or absence of penetration of the plating layer was evaluated. Then, the presence or absence of peeling of the photoresist pattern layer was evaluated by tape peeling. The evaluation criteria for electroless gold plating resistance are as follows. ○: Plating penetration and peeling of the photoresist pattern layer were not observed. △: Some slight penetration was observed after plating, and peeling of the photoresist pattern layer after stripping was also observed. ×: The photoresist pattern layer peeled off after plating.

如同上述可知,根據本發明,可提供能夠兼具低翹曲及回焊步驟後的高反射率的樹脂組成物。As can be seen from the above, according to the present invention, a resin composition having both low warp and high reflectivity after the reflow step can be provided.

Claims (10)

一種樹脂組成物,其特徵在於,其為包含(A)含羧基之胺基甲酸乙酯樹脂及(E)呈白色的著色劑之樹脂組成物, 其硬化塗膜的在頻率1Hz的動態黏彈性測定中、 損耗正切峰的溫度(Tg)為100℃以下, 損耗正切的峰在0.5~1.5的範圍。 A resin composition, characterized in that it is a resin composition containing (A) a carboxyl group-containing urethane resin and (E) a white colorant, In the dynamic viscoelasticity measurement of the hardened coating film at a frequency of 1Hz, The temperature (Tg) of the loss tangent peak is below 100℃, The peak of loss tangent is in the range of 0.5~1.5. 如請求項1所述的樹脂組成物,其中前述(E)呈白色的著色劑為氧化鈦。The resin composition according to claim 1, wherein the white coloring agent (E) is titanium oxide. 如請求項1所述的樹脂組成物,其中前述(A)含羧基之胺基甲酸乙酯樹脂為含有不具有芳香環的含羧基之胺基甲酸乙酯樹脂。The resin composition according to claim 1, wherein the carboxyl group-containing urethane resin (A) is a carboxyl group-containing urethane resin that does not have an aromatic ring. 如請求項1所述的樹脂組成物,其中含有(D)環氧樹脂。The resin composition as described in claim 1, wherein (D) an epoxy resin is contained. 如請求項1所述的樹脂組成物,其中包含前述(A)含羧基之胺基甲酸乙酯樹脂以外的(F)其他的含羧基樹脂。The resin composition according to claim 1, which contains (F) other carboxyl group-containing resins in addition to the aforementioned (A) carboxyl group-containing urethane resin. 一種具有將請求項1所述的樹脂組成物塗佈成膜、乾燥所獲得的樹脂層之乾膜。A dry film having a resin layer obtained by coating the resin composition according to claim 1 into a film and drying the film. 一種硬化物,其特徵在於,由請求項1所述的樹脂組成物所獲得。A hardened product obtained from the resin composition according to claim 1. 一種硬化物,其特徵在於,由請求項6所述的乾膜所獲得。A hardened product obtained from the dry film according to claim 6. 一種電子零件,其特徵在於,具有請求項7所述的硬化物。An electronic component characterized by comprising the hardened material as claimed in claim 7. 一種電子零件,其特徵在於,具有請求項8所述的硬化物。An electronic component characterized by having the hardened material according to claim 8.
TW112115983A 2022-04-28 2023-04-28 Resin composition, dry film, cured product, and electronic component TW202409731A (en)

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