TW202406174A - Pixel package and display device - Google Patents
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Abstract
Description
本揭露是關於一種畫素封裝體及顯示裝置,且特別是關於一種具有次毫米發光二極體的畫素封裝體及顯示裝置。The present disclosure relates to a pixel package and a display device, and in particular to a pixel package and a display device having sub-millimeter light emitting diodes.
發光二極體(Light-Emitting Diode;LED)具有低耗電量、低發熱量、操作壽命長、耐撞擊、體積小以及反應速度快等特性,因此可應用於各種需要使用發光元件的領域,例如,照明、醫療、顯示、通訊、感測、電源系統等領域。Light-Emitting Diode (LED) has the characteristics of low power consumption, low heat generation, long operating life, impact resistance, small size and fast response speed, so it can be used in various fields that require the use of light-emitting elements. For example, lighting, medical care, display, communication, sensing, power supply systems and other fields.
隨著科技的進步,光電半導體元件的體積逐漸往小型化發展。近幾年來由於發光二極體製作尺寸上的突破,目前將發光二極體以陣列排列製作的次毫米發光二極體(Mini Light-Emitting Diode;Mini LED)顯示器在市場上逐漸受到重視。次毫米發光二極體顯示器相較於有機發光二極體(Organic Light-Emitting Diode;OLED)顯示器而言,更為省電、具有較佳的可靠性、更長的使用壽命、較佳的對比度表現,以及更高的亮度而可在陽光下具有可視性。With the advancement of technology, the size of optoelectronic semiconductor components is gradually becoming smaller. In recent years, due to breakthroughs in the production size of light-emitting diodes, sub-millimeter light-emitting diode (Mini LED) displays, which are produced by arranging light-emitting diodes in an array, are gradually gaining attention in the market. Compared with organic light-emitting diode (OLED) displays, sub-millimeter light-emitting diode displays are more power-saving, have better reliability, longer service life, and better contrast ratio performance, and higher brightness for visibility in sunlight.
此外,為了方便在顯示器應用中使用發光二極體晶粒,可以使用包含發光二極體晶粒的畫素封裝體。畫素封裝體通常使用封裝層(例如環繞發光二極體晶粒的透明環氧樹脂或矽氧樹脂材料)來保護發光二極體晶粒不暴露於物理損害或者導致腐蝕或劣化的環境條件。In addition, in order to facilitate the use of LED chips in display applications, pixel packages containing LED chips can be used. Pixel packages typically use an encapsulation layer (such as a transparent epoxy or silicone material surrounding the LED die) to protect the LED die from exposure to physical damage or environmental conditions that cause corrosion or degradation.
在習知畫素封裝體中,兩相鄰發光二極體晶粒被封裝層隔開。封裝層包括波長轉換層及透明封裝膠。因來自發光二極體晶粒的光線會穿過封裝層,畫素封裝體或使用習知畫素封裝體的顯示裝置會出現光串擾(Crosstalk)、低對比度、及出光效率不佳等問題。In conventional pixel packages, two adjacent light-emitting diode dies are separated by a packaging layer. The encapsulation layer includes a wavelength conversion layer and a transparent encapsulant. Because the light from the light-emitting diode die will pass through the packaging layer, problems such as optical crosstalk, low contrast, and poor light extraction efficiency will occur in pixel packages or display devices using conventional pixel packages.
本揭露實施例提供一種畫素封裝體,包括:載板,具有第一上表面;畫素,設置於第一上表面上,包括:第一發光單元、第二發光單元、及波長轉換層,第一發光單元具有第一出光面以及第一側表面,第二發光單元具有第二出光面以及第二側表面,且第二側表面朝向第一側表面,波長轉換層設置於第二出光面上且具有第三出光面以及第三側表面;反射層,設置於第一側表面與第二側表面之間,並具有第一部分及第二部分,其中第二部分位於第一部分上並具有第三上表面;及吸光層,設置於第二部分的第三上表面之上;其中,第二部分的第三上表面的高度介於第二出光面與第三出光面之間,其中,自垂直於第一上表面的方向量測,吸光層與第二部分的厚度比值大於0且小於或等於1/5。Embodiments of the present disclosure provide a pixel package, including: a carrier plate having a first upper surface; a pixel disposed on the first upper surface, including: a first light-emitting unit, a second light-emitting unit, and a wavelength conversion layer. The first light-emitting unit has a first light-emitting surface and a first side surface, the second light-emitting unit has a second light-emitting surface and a second side surface, and the second side surface faces the first side surface, and the wavelength conversion layer is disposed on the second light-emitting surface. and has a third light-emitting surface and a third side surface; the reflective layer is disposed between the first side surface and the second side surface and has a first part and a second part, wherein the second part is located on the first part and has a third three upper surfaces; and a light-absorbing layer disposed on the third upper surface of the second part; wherein the height of the third upper surface of the second part is between the second light-emitting surface and the third light-emitting surface, wherein, since Measured in a direction perpendicular to the first upper surface, the thickness ratio of the light-absorbing layer to the second part is greater than 0 and less than or equal to 1/5.
本揭露實施例提供一種顯示裝置,包括:顯示基板,具有彼此相對的第一側及第二側;畫素,位於顯示基板的第一側上,包括:第一發光單元、第二發光單元及波長轉換層,第一發光單元具有第一出光面以及第一側表面,第二發光單元具有第二出光面以及第二側表面且第二側表面與第一側表面彼此相對,波長轉換層設置於第二出光面上且具有第三出光面以及第三側表面;反射層,設置於第一側表面與第二側表面之間,並具有第一部分及第二部分,其中第二部分位於第一部分上並具有第三上表面;及吸光層,設置於第二部分的第三上表面之上;其中,第二部分的第三上表面的高度介於第二出光面與第三出光面之間,其中,自垂直於第一上表面的方向量測,吸光層與第二部分的厚度比值大於0且小於或等於1/5。Embodiments of the present disclosure provide a display device, including: a display substrate having first and second sides opposite to each other; pixels located on the first side of the display substrate, including: a first light-emitting unit, a second light-emitting unit and Wavelength conversion layer, the first light-emitting unit has a first light-emitting surface and a first side surface, the second light-emitting unit has a second light-emitting surface and a second side surface, and the second side surface and the first side surface are opposite to each other, the wavelength conversion layer is provided The second light-emitting surface has a third light-emitting surface and a third side surface; the reflective layer is disposed between the first side surface and the second side surface and has a first part and a second part, wherein the second part is located on the second side surface. One part has a third upper surface; and a light-absorbing layer is disposed on the third upper surface of the second part; wherein the height of the third upper surface of the second part is between the second light-emitting surface and the third light-emitting surface. time, wherein, measured from the direction perpendicular to the first upper surface, the thickness ratio of the light-absorbing layer to the second part is greater than 0 and less than or equal to 1/5.
以下揭露提供了許多的實施例或範例,用於實施所提供的標的物之不同元件。各元件和其配置的具體範例描述如下,以簡化本揭露實施例之說明。當然,這些僅僅是範例,並非用以限定本揭露實施例。舉例而言,敘述中若提及第一元件形成在第二元件之上,可能包含第一和第二元件直接接觸的實施例,也可能包含額外的元件形成在第一和第二元件之間,使得它們不直接接觸的實施例。此外,本揭露實施例可能在各種範例使用重複的元件符號。如此重複是為了簡明和清楚之目的,而非用以表示所討論的不同實施例及∕或配置之間的關係。The following disclosure provides numerous embodiments, or examples, for implementing different elements of the provided subject matter. Specific examples of each component and its configuration are described below to simplify the description of the embodiments of the present disclosure. Of course, these are only examples and are not intended to limit the embodiments of the present disclosure. For example, if the description mentions that a first element is formed on a second element, it may include an embodiment in which the first and second elements are in direct contact, or may include an additional element formed between the first and second elements. , so that they are not in direct contact. In addition, embodiments of the present disclosure may use repeated element symbols in various examples. Such repetition is for the sake of simplicity and clarity and is not intended to represent the relationship between the various embodiments and/or configurations discussed.
再者,此處可使用空間上相關的用語,如「在…之下」、「下方的」、「低於」、「在…上方」、「上方的」、和類似用語可用於此,以便描述如圖所示一元件或部件和其他元件或部件之間的關係。這些空間用語除了包括圖式繪示的方位外,也企圖包括使用或操作中的裝置的不同方位。舉例來說,如果圖中的裝置被反過來,原本被形容為「低於」或在其他元件或部件「下方」的元件,就會被轉為「高於」其他元件或部件。所以,例示性用語「下方」可同時具有「上方」和「下方」的方位。當裝置被轉至其他方位(旋轉90°或其他方位),則在此所使用的空間相對描述可同樣依旋轉後的方位來解讀。Furthermore, spatially related terms may be used here, such as "under", "below", "below", "above", "above", and similar terms may be used here so that Describe the relationship between one element or component and other elements or components as shown in the figure. These spatial terms are intended to cover the various orientations of the device in use or operation, in addition to the orientation depicted in the diagrams. For example, if the device in the picture is turned over, elements described as "lower than" or "beneath" other elements or features would then be described as "above" the other elements or features. Therefore, the exemplary term "below" can have both the orientations of "above" and "below". When the device is rotated 90° or at any other orientation, the spatially relative descriptors used herein may be interpreted similarly to the rotated orientation.
除非另外定義,在此使用的全部用語(包含技術及科學用語)具有與本揭露所屬技術領域中具通常知識者所理解的相同涵義。應理解的是,這些用語例如在通常使用的字典中定義用語,應被解讀成具有與相關技術及本揭露的背景或上下文一致的意思,而不應以一理想化或過度正式的方式解讀,除非在本揭露實施例有特別定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It should be understood that these terms, such as those defined in commonly used dictionaries, should be interpreted to have a meaning consistent with the relevant technology and the background or context of the present disclosure, and should not be interpreted in an idealized or overly formal manner. Unless otherwise defined in the embodiments of this disclosure.
本揭露提供使用雙色擋牆封裝層結構環繞發光二極體晶粒的畫素封裝體及顯示裝置,其中雙色擋牆封裝層結構包括黑色的吸光層及白色的反射層,黑色的吸光層可防止光串擾並增加對比度,白色的反射層可增加出光。此外,本揭露藉由使吸光層的厚度與反射層位於發光二極體晶粒之上的部分的厚度比值大於0且小於或等於1/5,更增加出光亮度並同時維持表面的黑色對比度。再者,本揭露藉由使反射層與發光二極體晶粒的上表面的夾角為直角或鈍角,可改變畫素封裝體出光角度,亦可進而更加提升出光亮度。The disclosure provides a pixel package and a display device that use a two-color barrier encapsulation layer structure surrounding a light-emitting diode die. The two-color barrier encapsulation layer structure includes a black light-absorbing layer and a white reflective layer. The black light-absorbing layer can prevent Light crosstalk and increased contrast, the white reflective layer increases light extraction. In addition, the present disclosure further increases light brightness while maintaining the black contrast of the surface by making the ratio of the thickness of the light-absorbing layer to the thickness of the portion of the reflective layer located above the light-emitting diode die greater than 0 and less than or equal to 1/5. Furthermore, by making the angle between the reflective layer and the upper surface of the light-emitting diode die a right angle or an obtuse angle, the present disclosure can change the light emission angle of the pixel package and further enhance the light emission brightness.
[畫素封裝體][Pixel package]
第1A圖係根據一實施例,繪示一畫素封裝體(Pixel Package)10的俯視圖。如第1A圖所示,從畫素封裝體10的俯視圖觀之,吸光層420完全覆蓋反射層(未繪示),並露出畫素200,其中,畫素200包含第一發光單元210、第二發光單元220、及第三發光單元230。Figure 1A is a top view of a pixel package (Pixel Package) 10 according to an embodiment. As shown in FIG. 1A , from a top view of the pixel package 10 , the light-absorbing layer 420 completely covers the reflective layer (not shown) and exposes the pixel 200 , where the pixel 200 includes the first light-emitting unit 210 , the The second light-emitting unit 220 and the third light-emitting unit 230.
第1B圖係根據另一實施例,繪示一多畫素封裝體(Multi-Pixel Package)20的俯視圖。多畫素封裝體20與前述第1A圖所繪示的畫素封裝體10具有類似的結構,差異在於多畫素封裝體20包含複數組畫素200。在一實施例中,多畫素封裝體20包含4組畫素200。在多畫素封裝體20中,兩相鄰畫素200中,分屬不同畫素200的兩相鄰發光二極體會發出相同的波長。且在任一畫素200中的任兩相鄰發光二極體以一個固定距離彼此相分離。詳細而言,如第1B圖所示,橫向(沿著X軸)排列的兩相鄰畫素200之間,分屬不同畫素200之兩相鄰第一發光單元210之間的距離為D1;縱向(沿著Y軸)排列的兩相鄰畫素200之間,分屬不同畫素200之兩相鄰第一發光單元210之間的距離為D2,且D1與D2相同。第一發光單元210、第二發光單元220、及第三發光單元230的詳細結構將於後文描述。Figure 1B shows a top view of a multi-pixel package (Multi-Pixel Package) 20 according to another embodiment. The multi-pixel package 20 has a similar structure to the aforementioned pixel package 10 shown in FIG. 1A . The difference is that the multi-pixel package 20 includes a plurality of groups of pixels 200 . In one embodiment, the multi-pixel package 20 includes four groups of pixels 200 . In the multi-pixel package 20, in two adjacent pixels 200, two adjacent light-emitting diodes belonging to different pixels 200 emit the same wavelength. And any two adjacent light-emitting diodes in any pixel 200 are separated from each other by a fixed distance. Specifically, as shown in FIG. 1B , the distance between two adjacent pixels 200 arranged laterally (along the X-axis) and two adjacent first light-emitting units 210 belonging to different pixels 200 is D1 ; Between two adjacent pixels 200 arranged longitudinally (along the Y-axis), the distance between two adjacent first light-emitting units 210 belonging to different pixels 200 is D2, and D1 and D2 are the same. The detailed structures of the first light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit 230 will be described later.
上述第一發光單元210、第二發光單元220、及第三發光單元230可為次毫米發光二極體(Mini Light- Emitting Diode;Mini LED),且於俯視圖(第1A圖、第1B圖)中,具有長度L及寬度W。上述長度L為90μm至225μm ,優選為90μm至150μm,例如:90μm、100μm、110μm、120μm、130μm、140μm、150μm。上述寬度W為40μm至125μm,優選為40μm至90μm,例如:40μm、50μm、60μm、70μm、80μm、90μm。The above-mentioned first light-emitting unit 210, second light-emitting unit 220, and third light-emitting unit 230 may be sub-millimeter light-emitting diodes (Mini Light-Emitting Diode; Mini LED), and in the top view (Figure 1A, Figure 1B) , has length L and width W. The above-mentioned length L is 90 μm to 225 μm, preferably 90 μm to 150 μm, for example: 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 140 μm, 150 μm. The width W is 40 μm to 125 μm, preferably 40 μm to 90 μm, for example: 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, or 90 μm.
第2圖係第1A圖的畫素封裝體10的剖面示意圖或第1B圖的多畫素封裝體20的其中一組畫素200的剖面示意圖。如第2圖所示,畫素封裝體包含載板100、畫素(Pixel)200、反射層410、吸光層420、及透光層600。反射層410及吸光層420組成雙色、雙反射率及/或雙吸光率的擋牆結構400。在一實施例中,載板100具有彼此相對的第一上表面110t1及第一下表面110t2,並包含絕緣層110、上導電層120、複數個導電貫孔(Conductive Via)(未繪示)、以及下導電層130。上導電層120及下導電層130分別位於絕緣層110的第一上表面110t1及第一下表面110t2,且複數個導電貫孔貫穿絕緣層110以電性連接上導電層120及下導電層130,其中上導電層120可與畫素200及下導電層130電性連接,且下導電層130可與外部控制電路電性連接。Figure 2 is a schematic cross-sectional view of the pixel package 10 in Figure 1A or a schematic cross-sectional view of one group of pixels 200 in the multi-pixel package 20 in Figure 1B. As shown in Figure 2, the pixel package includes a carrier 100, a pixel (Pixel) 200, a reflective layer 410, a light-absorbing layer 420, and a light-transmitting layer 600. The reflective layer 410 and the light-absorbing layer 420 form a dual-color, dual-reflectivity and/or dual-absorbance wall structure 400. In one embodiment, the carrier board 100 has a first upper surface 110t1 and a first lower surface 110t2 opposite each other, and includes an insulating layer 110, an upper conductive layer 120, and a plurality of conductive vias (Conductive Via) (not shown) , and the lower conductive layer 130. The upper conductive layer 120 and the lower conductive layer 130 are respectively located on the first upper surface 110t1 and the first lower surface 110t2 of the insulating layer 110, and a plurality of conductive through holes penetrate the insulating layer 110 to electrically connect the upper conductive layer 120 and the lower conductive layer 130. , wherein the upper conductive layer 120 can be electrically connected to the pixel 200 and the lower conductive layer 130, and the lower conductive layer 130 can be electrically connected to an external control circuit.
絕緣層110的材料可為環氧樹脂、BT樹脂(Bismaleimide Triazine)、聚醯亞胺樹脂(Polyimide)、環氧樹脂與玻纖的複合材料、BT樹脂與玻璃纖維的複合材料、或聚醯亞胺樹脂(Polyimide)與玻璃纖維的複合材料。上導電層120與下導電層130的材料可以相同或不同,其材料係包含金屬,例如:銅、錫、鋁、銀、金、上述材料之合金或上述材料之疊層。The material of the insulating layer 110 may be epoxy resin, BT resin (Bismaleimide Triazine), polyimide resin (Polyimide), a composite material of epoxy resin and glass fiber, a composite material of BT resin and glass fiber, or polyimide. A composite material of polyimide and glass fiber. The materials of the upper conductive layer 120 and the lower conductive layer 130 may be the same or different, and the materials include metals, such as copper, tin, aluminum, silver, gold, alloys of the above materials, or laminates of the above materials.
如第2圖所示,畫素200設置於載板100的第一上表面110t1上,包括位於載板100上的數個發光單元,例如,第一發光單元210、第二發光單元220、及第三發光單元230。第一發光單元210具有第一出光面210S以及第一側表面210W;第二發光單元220具有第二出光面220S以及第二側表面220W;第三發光單元230具有第四出光面230S。在一實施例中,畫素200更包括波長轉換層500,設置於第二發光單元220的第二出光面220S上並具有第三出光面500S以及第三側表面500W。As shown in Figure 2, the pixel 200 is disposed on the first upper surface 110t1 of the carrier 100, and includes several light-emitting units located on the carrier 100, such as a first light-emitting unit 210, a second light-emitting unit 220, and The third light emitting unit 230. The first light emitting unit 210 has a first light emitting surface 210S and a first side surface 210W; the second light emitting unit 220 has a second light emitting surface 220S and a second side surface 220W; and the third light emitting unit 230 has a fourth light emitting surface 230S. In one embodiment, the pixel 200 further includes a wavelength conversion layer 500, which is disposed on the second light-emitting surface 220S of the second light-emitting unit 220 and has a third light-emitting surface 500S and a third side surface 500W.
在一實施例中,第一發光單元210、第二發光單元220、及第三發光單元230可為分別發出不同波長或不同顏色的光的發光二極體晶粒(LED die),且第一發光單元210、第二發光單元220、及第三發光單元230的材料組成不完全相同。在另一實施例中,第三發光單元230為紅光發光二極體晶粒,可經由電源提供一電力而發出第一光線,第一光線的主波長(Dominant Wavelength)或峰值波長(Peak Wavelength)介於600 nm至660 nm之間,第二發光單元與第一發光單元210為藍光發光二極體晶粒,其中第二發光單元220與第三發光單元230可分別發出相同色光的第二光線及第三光線,第二光線及第三光線的主波長(Dominant Wavelength)或峰值波長(Peak Wavelength)介於430 nm至480 nm之間,其中第二發光單元220發出的第二光線再經由位於其上方的波長轉換層500將波長轉換為主波長(Dominant Wavelength)或峰值波長(Peak Wavelength)介於510 nm至560 nm之間。其中,波長轉換層500的第三出光面500S可以為平面或弧面,例如,如第2圖所示,當填充原本為液態的可固化波長轉換材料作為波長轉換層500時,第三出光面500S在製程過程中便受到表面張力的影響而為下凹弧形。可固化波長轉換材料由波長轉換材料與基材所組成。基材可包含矽氧樹脂(Silicone)、環氧樹脂(Epoxy)、壓克力樹脂(Acrylic Resin)、聚醯亞胺樹脂(Polyimide)或上述材料的混和物;波長轉換材料則可包含螢光粉材料或量子點材料。合適的螢光粉材料包含經摻雜之石榴石(諸如YAG:Ce及(Y,Gd)AG:Ce)、鋁酸鹽(諸如Sr 2Al 14O25:Eu及BAM:Eu)、矽酸鹽(諸如SrBaSiO:Eu)、硫化物(諸如ZnS:Ag、CaS:Eu及SrGa 2S 4:Eu)、氧硫化物、氧氮化物、磷酸鹽、硼酸鹽及鎢酸鹽(諸如CaWO 4);合適的量子點材料則包含Si、Ge、CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、PbS、PbSe、PbTe、InN、InP、InAs、AlN、AlP、AlAs、GaN、GaP、GaAs及其組合。 In an embodiment, the first light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit 230 may be light-emitting diode dies (LED dies) that respectively emit light of different wavelengths or different colors, and the first The material compositions of the light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit 230 are not exactly the same. In another embodiment, the third light-emitting unit 230 is a red light-emitting diode chip, which can provide a power through a power source to emit the first light, the dominant wavelength (Dominant Wavelength) or the peak wavelength (Peak Wavelength) of the first light. ) between 600 nm and 660 nm, the second light-emitting unit and the first light-emitting unit 210 are blue light-emitting diode dies, wherein the second light-emitting unit 220 and the third light-emitting unit 230 can respectively emit second light of the same color. The dominant wavelength (Dominant Wavelength) or the peak wavelength (Peak Wavelength) of the light and the third light, the second light and the third light is between 430 nm and 480 nm, and the second light emitted by the second light-emitting unit 220 passes through The wavelength conversion layer 500 located above it converts the wavelength to a dominant wavelength (Dominant Wavelength) or a peak wavelength (Peak Wavelength) between 510 nm and 560 nm. The third light-emitting surface 500S of the wavelength conversion layer 500 can be a flat surface or a curved surface. For example, as shown in Figure 2, when the originally liquid curable wavelength conversion material is filled as the wavelength conversion layer 500, the third light-emitting surface 500S is affected by surface tension during the manufacturing process and becomes a concave arc shape. The curable wavelength conversion material is composed of a wavelength conversion material and a base material. The base material may include silicone, epoxy, acrylic resin, polyimide or a mixture of the above materials; the wavelength conversion material may include fluorescent Powder material or quantum dot material. Suitable phosphor materials include doped garnets (such as YAG:Ce and (Y, Gd )AG:Ce), aluminates (such as Sr2Al14O25 :Eu and BAM:Eu), silicates (such as SrBaSiO:Eu), sulfides (such as ZnS:Ag, CaS:Eu and SrGa2S4 :Eu) , oxysulfides, oxynitrides, phosphates, borates and tungstates (such as CaWO4 ); Suitable quantum dot materials include Si, Ge, CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, PbS, PbSe, PbTe, InN, InP, InAs, AlN, AlP, AlAs, GaN, GaP, GaAs and combinations thereof.
第3A圖及第3B圖顯示第2圖的虛線部分中第一發光單元210與擋牆結構400的放大的剖面圖。第二發光單元220與第三發光單元230具有類似的結構,差異在於第二發光單元220的上方具有波長轉換層500。在一實施例中,如第3A圖及第3B圖所示,發光單元210為倒裝晶片(Flip-Chip)。發光單元210至少包含發光層216、位於發光層216兩側的p型半導體層218與n型半導體層214、成長基板212、p型接觸電極218c及n型接觸電極214c。其中,p型接觸電極218c及n型接觸電極214c分別透過銲錫300與p型半導體層218與n型半導體層214電性連接。在一實施例中,發光單元210不包含成長基板212或是包含被減薄的成長基板。發光層216的外側壁被反射層410所環繞,因此發光層216所發出的光線不會直接射向其他相鄰的發光單元,使得光線僅能從第一出光面210S離開畫素封裝體10或多畫素封裝體20。Figures 3A and 3B show enlarged cross-sectional views of the first light-emitting unit 210 and the retaining wall structure 400 in the dotted line portion of Figure 2 . The second light-emitting unit 220 and the third light-emitting unit 230 have a similar structure, and the difference is that the second light-emitting unit 220 has a wavelength conversion layer 500 above it. In one embodiment, as shown in Figures 3A and 3B, the light-emitting unit 210 is a flip-chip. The light-emitting unit 210 at least includes a light-emitting layer 216, a p-type semiconductor layer 218 and an n-type semiconductor layer 214 located on both sides of the light-emitting layer 216, a growth substrate 212, a p-type contact electrode 218c and an n-type contact electrode 214c. The p-type contact electrode 218c and the n-type contact electrode 214c are electrically connected to the p-type semiconductor layer 218 and the n-type semiconductor layer 214 through the solder 300 respectively. In one embodiment, the light-emitting unit 210 does not include the growth substrate 212 or includes a thinned growth substrate. The outer wall of the light-emitting layer 216 is surrounded by the reflective layer 410. Therefore, the light emitted by the light-emitting layer 216 will not directly emit to other adjacent light-emitting units, so that the light can only leave the pixel package 10 through the first light-emitting surface 210S or Multi-pixel package 20.
參照第2圖,反射層410分別包夾第一發光單元210、第二發光單元220及第三發光單元230。在一上視圖中(未顯示),反射層410分別將第一發光單元210、第二發光單元220及第三發光單元230完全包圍。例如,反射層410設置於第一發光單元210的第一側表面210W與第二發光單元220的第二側表面220W之間。反射層410並具有第一部分412及第二部分414,第一部分412具有與第一發光單元210的第一出光面210S共平面的第二上表面412t。第二部分414位於第一部分412上並具有第三上表面414t,第二部分414的側壁與第一部分412的側壁共平面,且第二部分414的第三上表面414t的高度介於第二發光單元220的第二出光面220S與波長轉換層500的第三出光面500S之間,以使第一發光單元210發出的光以及第二發光單元220經波長轉換層500轉換所發出的光被反射,進而提升出光亮度。此外,由於反射層410覆蓋第一發光單元210的側壁210W、第二發光單元220的第二側表面220W、及第三發光單元230的側壁,使得畫素封裝體中第一發光單元210、第二發光單元220、及第三發光單元230所發出的光線僅能從第一出光面210S、第二出光面220S、第四出光面230S射出,而從第一發光單元210的側壁210W、第二發光單元220的第二側表面220W、及第三發光單元230的側壁所發出的光線完全被反射層410所阻檔,可避免第一發光單元210、第二發光單元220、第三發光單元230之間的光串擾,進而提高畫素封裝體的顏色純度及對比度。Referring to FIG. 2 , the reflective layer 410 respectively surrounds the first light-emitting unit 210 , the second light-emitting unit 220 and the third light-emitting unit 230 . In a top view (not shown), the reflective layer 410 completely surrounds the first light-emitting unit 210 , the second light-emitting unit 220 and the third light-emitting unit 230 respectively. For example, the reflective layer 410 is disposed between the first side surface 210W of the first light-emitting unit 210 and the second side surface 220W of the second light-emitting unit 220. The reflective layer 410 also has a first part 412 and a second part 414. The first part 412 has a second upper surface 412t coplanar with the first light-emitting surface 210S of the first light-emitting unit 210. The second part 414 is located on the first part 412 and has a third upper surface 414t. The side walls of the second part 414 are coplanar with the side walls of the first part 412, and the height of the third upper surface 414t of the second part 414 is between the second luminous between the second light-emitting surface 220S of the unit 220 and the third light-emitting surface 500S of the wavelength conversion layer 500, so that the light emitted by the first light-emitting unit 210 and the light emitted by the second light-emitting unit 220 after being converted by the wavelength conversion layer 500 are reflected , thereby improving the brightness of the light. In addition, since the reflective layer 410 covers the sidewall 210W of the first light-emitting unit 210, the second side surface 220W of the second light-emitting unit 220, and the sidewall of the third light-emitting unit 230, the first light-emitting unit 210 and the third light-emitting unit 230 in the pixel package The light emitted by the second light-emitting unit 220 and the third light-emitting unit 230 can only be emitted from the first light-emitting surface 210S, the second light-emitting surface 220S, and the fourth light-emitting surface 230S. The light emitted by the second side surface 220W of the light-emitting unit 220 and the side wall of the third light-emitting unit 230 is completely blocked by the reflective layer 410, which can prevent the first light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit 230 from being blocked. The optical crosstalk between them improves the color purity and contrast of the pixel package.
在一些實施例中,第一部分412的材料可與第二部分414的材料相同。在另一些實施例中,第一部分412的材料可與第二部分414的材料不同,其中第一部分412的反射率可大於第二部分414的反射率,第一部分412的材料可以為非曝光顯影型,故不須考量曝光因素,因此所添加之反射粒子的含量可以較高,以具有較大的反射率,進而提升出光亮度。詳細而言,第一部分412的反射率例如大於95%,第二部分414的反射率例如介於90至91%的範圍。In some embodiments, the material of first portion 412 may be the same as the material of second portion 414 . In other embodiments, the material of the first part 412 may be different from the material of the second part 414, wherein the reflectivity of the first part 412 may be greater than the reflectivity of the second part 414, and the material of the first part 412 may be a non-exposure developing type. , so there is no need to consider the exposure factor, so the content of the added reflective particles can be higher to have a greater reflectivity, thereby improving the brightness of the light. In detail, the reflectivity of the first part 412 is, for example, greater than 95%, and the reflectivity of the second part 414 is, for example, in the range of 90 to 91%.
繼續參照第2圖,吸光層420設置於第二部分414的第三上表面414t之上、並環繞第一發光單元210及第二發光單元220。如第3A圖及第3B圖的放大圖所示,反射層410的第一部分412及第二部分414分別具有第一厚度H1及第二厚度H2,其中第一厚度H1大於第二厚度H2。此外,吸光層420具有第三厚度H3,其中,自垂直於第一上表面110t1的方向量測,吸光層420與第二部分414的厚度比值(H3/H2)大於0且小於或等於1/5,以使得第一發光單元210發出的大角度的光以及第二發光單元220經波長轉換層500轉換所發出的大角度的光可被反射層410反射而不被吸光層420所吸收,進而提升出光亮度並同時降低串擾及維持對比度。詳言之,第二部分414的厚度H2在5 至20 之範圍,且吸光層420的厚度H3在0.1 至1 之範圍。根據發明人的研究,如果厚度比值(H3/H2)大於1/5,出光亮度提升的幅度將變小。 Continuing to refer to FIG. 2 , the light-absorbing layer 420 is disposed on the third upper surface 414t of the second part 414 and surrounds the first light-emitting unit 210 and the second light-emitting unit 220 . As shown in the enlarged views of Figures 3A and 3B, the first portion 412 and the second portion 414 of the reflective layer 410 have a first thickness H1 and a second thickness H2 respectively, wherein the first thickness H1 is greater than the second thickness H2. In addition, the light-absorbing layer 420 has a third thickness H3, wherein, measured from the direction perpendicular to the first upper surface 110t1, the thickness ratio (H3/H2) of the light-absorbing layer 420 and the second portion 414 is greater than 0 and less than or equal to 1/ 5, so that the large-angle light emitted by the first light-emitting unit 210 and the large-angle light emitted by the second light-emitting unit 220 after being converted by the wavelength conversion layer 500 can be reflected by the reflective layer 410 without being absorbed by the light-absorbing layer 420, and thus Improve light output while reducing crosstalk and maintaining contrast. In detail, the thickness H2 of the second part 414 is within 5 to 20 range, and the thickness H3 of the light-absorbing layer 420 is within 0.1 to 1 range. According to the inventor's research, if the thickness ratio (H3/H2) is greater than 1/5, the improvement in light output brightness will become smaller.
此外,自剖面圖觀之(如第3A圖、第3B所示),吸光層420在第一發光單元210上具有第一最大開口420o,第二部分414在第一發光單元210上具有第二最大開口414o。在一實施例中,如第3A圖所示,第二部分414在第二最大開口414o內的側壁與第一發光單元210的第一出光面210S的夾角 為直角,且吸光層420的第一最大開口420o的寬度與第二部分414的第二最大開口414o的寬度大小相等,出光角度約為80 至 。在另一實施例中,如第3B圖所示,第二部分414在第二最大開口414o內的側壁與第一發光單元210的第一出光面210S的夾角 為鈍角,使得擋牆結構400位於第一出光面210S之上的部分於剖面圖中為”倒梯型”,上述鈍角優選為120 至130 ,此外,在剖面圖中,第一最大開口420o的寬度大於第一出光面210S的寬度,且第二最大開口414o的寬度小於第一最大開口420o的寬度並大於第一出光面210S的寬度。如此設計,可更增加出光角度至100 至115 並且更加提升出光亮度。 In addition, from the cross-sectional view (as shown in Figures 3A and 3B), the light-absorbing layer 420 has a first maximum opening 420o on the first light-emitting unit 210, and the second portion 414 has a second maximum opening on the first light-emitting unit 210. Maximum opening 414o. In one embodiment, as shown in Figure 3A, the angle between the side wall of the second portion 414 in the second largest opening 414o and the first light-emitting surface 210S of the first light-emitting unit 210 is a right angle, and the width of the first largest opening 420o of the light-absorbing layer 420 is equal to the width of the second largest opening 414o of the second portion 414, and the light emission angle is about 80 to . In another embodiment, as shown in Figure 3B, the angle between the side wall of the second portion 414 in the second largest opening 414o and the first light-emitting surface 210S of the first light-emitting unit 210 is an obtuse angle, so that the part of the retaining wall structure 400 located above the first light-emitting surface 210S is an "inverted trapezoid" in the cross-sectional view. The above-mentioned obtuse angle is preferably 120 to 130 , in addition, in the cross-sectional view, the width of the first maximum opening 420o is greater than the width of the first light-emitting surface 210S, and the width of the second maximum opening 414o is less than the width of the first maximum opening 420o and greater than the width of the first light-emitting surface 210S. This design can increase the light angle to 100 to 115 And further enhance the brightness.
吸光層420的材料包含基材(Matrix)以及吸光材料,其中,基材包含矽氧樹脂(Silicone)、環氧樹脂(Epoxy)、壓克力樹脂(Acrylic Resin)、聚醯亞胺樹脂(Polyimide)或上述材料的混和物,吸光材料包含碳黑、深色染料。吸光層420的透光率較透光層600的透光率低,或者,吸光層420的吸光率較透光層600的吸光率高。藉由調整基材中吸光材料的濃度使吸光層420的透光率低於30%,亦即吸光層420為幾乎或完全不透光。The material of the light-absorbing layer 420 includes a base material (Matrix) and a light-absorbing material. The base material includes silicone resin, epoxy resin, acrylic resin, and polyimide resin. ) or a mixture of the above materials, the light-absorbing material includes carbon black and dark dyes. The light transmittance of the light absorbing layer 420 is lower than that of the light transmitting layer 600 , or the light absorbing rate of the light absorbing layer 420 is higher than that of the light transmitting layer 600 . By adjusting the concentration of the light-absorbing material in the base material, the light transmittance of the light-absorbing layer 420 is lower than 30%, that is, the light-absorbing layer 420 is almost or completely opaque.
如第2圖所示,透光層600設置於第一上表面110t1之上且覆蓋吸光層420、第一發光單元210、第二發光單元220、以及第三發光單元230。如第3A圖及第3B圖所示,透光層600完全填充第一出光面210S與反射層410及吸光層420所圍出來的空間。透光層600的材料包含矽氧樹脂(Silicone)、環氧樹脂(Epoxy)、壓克力樹脂(Acrylic Resin)、上述材料的混和物、或上述材料的疊層。在一實施例中,透光層600的透光率大於90%。此外,吸光層420的硬度可小於透光層600的硬度。例如,吸光層420的邵氏(Shore)D硬度小於60,透光層600的邵氏D硬度大於60,使畫素封裝體具有防刮耐磨的能力。As shown in FIG. 2 , the light-transmitting layer 600 is disposed on the first upper surface 110t1 and covers the light-absorbing layer 420 , the first light-emitting unit 210 , the second light-emitting unit 220 , and the third light-emitting unit 230 . As shown in Figures 3A and 3B, the light-transmitting layer 600 completely fills the space surrounded by the first light-emitting surface 210S, the reflective layer 410, and the light-absorbing layer 420. The material of the light-transmitting layer 600 includes silicone, epoxy, acrylic resin, a mixture of the above materials, or a laminate of the above materials. In one embodiment, the light transmittance of the light-transmitting layer 600 is greater than 90%. In addition, the hardness of the light-absorbing layer 420 may be smaller than the hardness of the light-transmitting layer 600 . For example, the Shore D hardness of the light-absorbing layer 420 is less than 60, and the Shore D hardness of the light-transmitting layer 600 is greater than 60, so that the pixel package is scratch-resistant and wear-resistant.
[畫素封裝體的製程][Process of pixel package]
畫素封裝體的製程可由下列方法所形成:提供一支撐底座,例如鋼板,以及一軟墊放置在支撐底座上,在軟墊上放置一膜片,其中膜片包含一承載膜片、一膠膜以及一離形層在承載膜片及膠膜之間,其中,膠膜可為半固化(B-stage)膜片,材料包含矽氧樹脂(Silicone)、環氧樹脂(Epoxy)、聚氨酯(Polyurethane;PU)、熱塑性聚氨酯彈性體(Thermoplastic Urethane;TPU)、或其混和物。膠膜包含反射材料,例如,氧化鈦(TiO x)、氧化矽(SiO x)、或其混和物,可形成反射層410,其中反射層410可為白色的。接著,將其上設置發光單元的載板100倒置放在膜片上,使得每個發光單元的表面接觸膜片中的膠膜。提供一氣壓墊在載板100相對於發光元件之背側(不具有發光單元的一側)上,利用氣壓墊對載板100施加一壓力,使發光元件陷入膜片中。在製程中,膠膜被加熱以維持在軟化的狀態。 The manufacturing process of the pixel package can be formed by the following method: providing a support base, such as a steel plate, and a soft pad placed on the support base, and placing a diaphragm on the soft cushion, where the diaphragm includes a carrier diaphragm and a plastic film and a release layer between the carrier diaphragm and the adhesive film. The adhesive film can be a semi-cured (B-stage) diaphragm, and the materials include silicone, epoxy, and polyurethane. ; PU), thermoplastic polyurethane elastomer (Thermoplastic Urethane; TPU), or mixtures thereof. The glue film contains reflective materials, such as titanium oxide (TiO x ), silicon oxide (SiO x ), or mixtures thereof, and can form the reflective layer 410 , where the reflective layer 410 can be white. Next, the carrier 100 on which the light-emitting units are disposed is placed upside down on the diaphragm, so that the surface of each light-emitting unit contacts the adhesive film in the diaphragm. An air pressure pad is provided on the back side of the carrier board 100 relative to the light-emitting element (the side without the light-emitting unit), and the air pressure pad is used to exert pressure on the carrier board 100 to cause the light-emitting element to sink into the film. During the process, the adhesive film is heated to maintain a softened state.
藉由氣壓墊及軟墊將軟化的膠膜擠壓進相鄰發光單元的空間中。在一實施例中,氣壓墊會繼續施加壓力,直到軟化的膠膜完全填入相鄰發光單元之間的空隙,並露出發光單元的上表面及/或部分側表面。當膠膜填入相鄰發光單元之間的空隙並到達預定的厚度後,停止加熱並靜置一段時間。待膠膜固化形成固態膠層後,解除氣壓墊的壓力,並移除離形層及承載膜片。The softened adhesive film is squeezed into the space of adjacent light-emitting units through air pressure pads and soft pads. In one embodiment, the air pressure pad continues to apply pressure until the softened adhesive film completely fills the gaps between adjacent light-emitting units and exposes the upper surface and/or part of the side surface of the light-emitting units. When the adhesive film fills the gaps between adjacent light-emitting units and reaches a predetermined thickness, stop heating and let it sit for a period of time. After the adhesive film solidifies to form a solid adhesive layer, release the pressure from the air pressure pad and remove the release layer and carrier diaphragm.
接著,藉由乾式蝕刻製程移除位於發光單元上的膠層,以形成與發光單元的表面共平面的反射層410的第一部份412,上述乾式蝕刻製程使用的氣體包括氬(Argon;Ar)、含氧氣體、含臭氧氣體、含氟氣體(例如,四氟甲烷(Tetrafluoromethane;CF 4)、六氟化硫(Sulfur Hexafluoride;SF 6)、二氟甲烷(Difluoromethane;CH 2F 2)、三氟甲烷(Trifluoromethane;CHF 3)及/或六氟乙烷 (Difluoromethane;C 2F 6))、含氯氣體(例如,氯(Chlorine;Cl 2)、三氯甲烷(Chloroform;CHCl 3)、四氯甲烷(Carbon Tetrachloride;CCl 4)、及/或三氯化硼 (Boron Trichloride;BCl 3))、含溴氣體(例如,溴化氫(Hydrogen Bromide;HBr) 及/或三溴甲烷(Bromoform;CHBr 3))、含碘氣體、其他合適的蝕刻氣體及/或電漿、或其組合。 Next, the adhesive layer on the light-emitting unit is removed through a dry etching process to form the first portion 412 of the reflective layer 410 that is coplanar with the surface of the light-emitting unit. The gas used in the dry etching process includes Argon (Argon; ), oxygen-containing gas, ozone-containing gas, fluorine-containing gas (for example, tetrafluoromethane (CF 4 ), sulfur hexafluoride (Sulfur Hexafluoride; SF 6 ), difluoromethane (Difluoromethane; CH 2 F 2 ), Trifluoromethane (CHF 3 ) and/or hexafluoromethane (Difluoromethane; C 2 F 6 )), chlorine-containing gases (for example, chlorine (Chlorine; Cl 2 ), chloroform (Chloroform; CHCl 3 ), Carbon Tetrachloride (CCl 4 ), and/or Boron Trichloride (BCl 3 )), bromine-containing gases (for example, Hydrogen Bromide (HBr) and/or Bromoform; CHBr 3 )), iodine-containing gas, other suitable etching gases and/or plasma, or combinations thereof.
在用來除膠的乾式蝕刻製程之後,可藉由塗佈製程在反射層410的第一部份412上形成白色光阻層。然後,將白色光阻層暴露於特定光線下進行曝光。接著,對曝光後的白色光阻層進行顯影,以在反射層410的第一部份412上形成反射層410的第二部分414。在形成反射層410的第二部份414之後,可藉由與形成第二部分414相似的製程來形成吸光層420,差異在於其塗佈的材料為黑色光阻層。After the dry etching process for removing the glue, a white photoresist layer can be formed on the first portion 412 of the reflective layer 410 through a coating process. Then, the white photoresist layer is exposed to specific light for exposure. Then, the exposed white photoresist layer is developed to form the second portion 414 of the reflective layer 410 on the first portion 412 of the reflective layer 410 . After forming the second portion 414 of the reflective layer 410, the light-absorbing layer 420 can be formed through a process similar to that used to form the second portion 414, except that the material coated on it is a black photoresist layer.
在形成吸光層420之後,藉由塗佈或模製(molding)來形成透光層600。最後,以切割工具切割載板100的絕緣層110並形成切割道。接著,以切割工具切割透光層600並形成封裝體。在另一實施例中,先分離透光層600再分離載板100的絕緣層110。在另一實施例中,也可在單一個步驟中同時分離載板100的絕緣層110與透光層600。After the light-absorbing layer 420 is formed, the light-transmitting layer 600 is formed by coating or molding. Finally, a cutting tool is used to cut the insulating layer 110 of the carrier board 100 and form a cutting track. Next, a cutting tool is used to cut the light-transmitting layer 600 and form a package. In another embodiment, the light-transmitting layer 600 is separated first and then the insulating layer 110 of the carrier 100 is separated. In another embodiment, the insulating layer 110 and the light-transmitting layer 600 of the carrier 100 can also be separated simultaneously in a single step.
[顯示裝置][display device]
第4圖係根據又一實施例,繪示顯示裝置30的俯視圖。如第4圖所示,顯示裝置30可包括顯示基板140、畫素200、反射層(未繪示)、吸光層420、及透光層(未繪示)。顯示基板140具有彼此相對的第一側140t1及第二側140t2(參照第5圖),並包括畫素200位於其中的顯示區域142,其中畫素200位於顯示基板140的第一側140t1上。每個畫素200包括可以發射不同色光的多個子畫素。舉例而言,每個畫素200包括可分別發射藍光、綠光及紅光的三個子畫素(第一發光單元210、第二發光單元220與波長轉換層500、及第三發光單元230)。畫素200中的子畫素數量可為三個或更多,且子畫素可呈現三原色(藍、綠、紅)之外的色光,例如,一個畫素中可包含可呈現藍-綠-紅-青(Cyan)四種色光的子畫素。此外,畫素200的第一發光單元210、第二發光單元220、及第三發光單元230、及波長轉換層500的定義同前文所述,在此不予贅述。FIG. 4 is a top view of the display device 30 according to yet another embodiment. As shown in FIG. 4 , the display device 30 may include a display substrate 140, a pixel 200, a reflective layer (not shown), a light-absorbing layer 420, and a light-transmitting layer (not shown). The display substrate 140 has a first side 140t1 and a second side 140t2 opposite to each other (refer to FIG. 5 ), and includes a display area 142 in which the pixel 200 is located, wherein the pixel 200 is located on the first side 140t1 of the display substrate 140 . Each pixel 200 includes multiple sub-pixels that can emit different colors of light. For example, each pixel 200 includes three sub-pixels (the first light-emitting unit 210, the second light-emitting unit 220 and the wavelength conversion layer 500, and the third light-emitting unit 230) that can respectively emit blue light, green light and red light. . The number of sub-pixels in the pixel 200 can be three or more, and the sub-pixels can present colors other than the three primary colors (blue, green, and red). For example, one pixel can include a sub-pixel that can present blue-green- Red-cyan (Cyan) sub-pixels of four colors of light. In addition, the definitions of the first light-emitting unit 210, the second light-emitting unit 220, the third light-emitting unit 230 of the pixel 200, and the wavelength conversion layer 500 are the same as mentioned above, and will not be repeated here.
顯示基板140可為薄膜電晶體(Thin Film Transistor;TFT)基板。顯示基板140的基材可為剛性結構或柔性結構。舉例而言,顯示基板140可由例如下列剛性材料所形成:玻璃、矽等;或由下列柔性材料所形成:聚合物、金屬箔等,且顯示基板140具有配電線以與畫素200及顯示區域內的微驅動器144電性連接。在一些實施例中,顯示基板140可為具有控制電路的電路板,並與畫素200電性連接。The display substrate 140 may be a thin film transistor (TFT) substrate. The base material of the display substrate 140 may be a rigid structure or a flexible structure. For example, the display substrate 140 may be formed of rigid materials such as glass, silicon, etc., or flexible materials such as polymers, metal foils, etc., and the display substrate 140 has distribution lines to communicate with the pixels 200 and the display area. The micro-driver 144 inside is electrically connected. In some embodiments, the display substrate 140 may be a circuit board with a control circuit and is electrically connected to the pixels 200 .
如第4圖所示,顯示裝置30可包括顯示區域內與畫素200相對應配置的微驅動器144、顯示區域周圍的列驅動器124及/或顯示區域周圍的行驅動器122、以及柔性電路板126。其中,列驅動器124與行驅動器122可選擇性使用,以配合微驅動器144用於驅動畫素200,換言之,畫素200可僅藉由微驅動器144進行控制。畫素200中的第一發光單元210、第二發光單元220、及第三發光單元230可透過顯示基板140電性連接至驅動第一發光單元210、第二發光單元220、及第三發光單元230的顯示區域內相對應的微驅動器144。列驅動器124可包括用於每列發光單元集合的單獨驅動器。行驅動器122可包括用於每行發光單元集合的單獨驅動器。柔性電路板126可用於將顯示裝置30電性連接至外部系統。As shown in FIG. 4 , the display device 30 may include a micro driver 144 configured corresponding to the pixel 200 in the display area, a column driver 124 around the display area and/or a row driver 122 around the display area, and a flexible circuit board 126 . Among them, the column driver 124 and the row driver 122 can be selectively used to cooperate with the micro driver 144 to drive the pixel 200. In other words, the pixel 200 can be controlled only by the micro driver 144. The first light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit 230 in the pixel 200 can be electrically connected to the driving first light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit through the display substrate 140. 230 corresponding micro-driver 144 within the display area. Column drivers 124 may include separate drivers for each column set of light emitting cells. Row drivers 122 may include separate drivers for each row of sets of light emitting cells. The flexible circuit board 126 may be used to electrically connect the display device 30 to an external system.
第5圖係根據又一實施例,繪示第4圖的虛線的放大的剖面圖。第5圖類似於第2圖的剖面圖,差異在於第5圖為晶粒上板(Chip on Board;COB)的結構。晶粒上板是將發光二極體(第一發光單元210、第二發光單元220、及第三發光單元230)的裸晶(Bare Chip)直接安裝在顯示基板140上。擋牆結構400被形成於發光二極體晶粒之間。封裝膠(透光層600)被塗佈於整個顯示基板140表面上以覆蓋所有發光二極體晶粒與擋牆結構。Figure 5 is an enlarged cross-sectional view of the dotted line in Figure 4 according to yet another embodiment. Figure 5 is similar to the cross-sectional view of Figure 2. The difference is that Figure 5 shows the structure of the Chip on Board (COB). The die-on-die board directly mounts the bare chips of the light-emitting diodes (the first light-emitting unit 210 , the second light-emitting unit 220 , and the third light-emitting unit 230 ) on the display substrate 140 . Barrier structures 400 are formed between the light emitting diode dies. The encapsulant (light-transmitting layer 600) is coated on the entire surface of the display substrate 140 to cover all the light-emitting diode dies and blocking wall structures.
在另外一個實施例中,顯示裝置是屬於封裝上板(Package on Board;POB)的結構(圖未示)。前述複數畫素封裝體10或多畫素封裝體20以陣列方式排列在顯示基板140上,且畫素封裝體10或多畫素封裝體20的下導電層與顯示基板140電性連接。此外,顯示裝置也可以包含吸光層420及反射層410的雙色的擋牆結構400、透光層600,相關內容可以參考前述相關段落。In another embodiment, the display device is a package on board (POB) structure (not shown). The plurality of pixel packages 10 or multi-pixel packages 20 are arranged in an array on the display substrate 140 , and the lower conductive layer of the pixel package 10 or the multi-pixel package 20 is electrically connected to the display substrate 140 . In addition, the display device may also include a two-color barrier structure 400 of a light-absorbing layer 420 and a reflective layer 410, and a light-transmitting layer 600. For related content, please refer to the above-mentioned relevant paragraphs.
如第5圖所示,顯示基板140更包括位於第一側140t1上的佈線結構150,其中佈線結構150將顯示基板140與畫素200電性連接,上述佈線結構150例如為鋁、銅、或金等導電金屬,透過銲錫300與前述發光單元的接觸電極電性連接。在另一個實施例中,顯示裝置是屬於封裝上板的結構(圖未示),前述複數畫素封裝體10或多畫素封裝體20是以下導電層透過銲錫300與顯示基板140第一側140t1上的佈線結構150電性連接。As shown in FIG. 5 , the display substrate 140 further includes a wiring structure 150 located on the first side 140t1, where the wiring structure 150 electrically connects the display substrate 140 to the pixels 200. The wiring structure 150 is, for example, aluminum, copper, or Conductive metal such as gold is electrically connected to the contact electrode of the light-emitting unit through the solder 300 . In another embodiment, the display device is a package upper plate structure (not shown). The plurality of pixel packages 10 or the multi-pixel packages 20 are composed of the following conductive layer through the solder 300 and the first side of the display substrate 140 The wiring structure 150 on 140t1 is electrically connected.
[顯示裝置的製程][Process of display device]
首先,從一承載體,例如,成長基板或者暫時基板上將發光二極體(第一發光單元210、第二發光單元220、及第三發光單元230)的裸晶轉移到顯示基板140上,且將發光二極體(第一發光單元210、第二發光單元220、及第三發光單元230)和微驅動器144安裝在顯示基板140的第一側140t1上。發光二極體和微驅動器144與顯示基板140的連接手法包含但不限於導電焊盤、導電凸塊、及導電球。。具體而言,適於作為導電焊盤、導電凸塊、及導電球的材料可以包含低熔點的金屬或低液化熔點(Liquidus Melting Point)的合金,其熔點或液化溫度低於210℃,例如:鉍(Bi)、錫(Sn)、銦(In)、或其合金。。舉例而言,微型驅動器144及發光二極體上的n型接觸電極214c及p型接觸電極218c被熱壓接合到顯示基板140上的佈線結構150。擋牆結構400形成於發光二極體之間。接著,透光層600覆蓋發光二極體及吸光層420,上述擋牆結構400及透光層600的形成方式可以參考前述相關段落的內容。First, the bare chips of the light-emitting diodes (the first light-emitting unit 210, the second light-emitting unit 220, and the third light-emitting unit 230) are transferred from a carrier, such as a growth substrate or a temporary substrate, to the display substrate 140. And the light emitting diodes (the first light emitting unit 210, the second light emitting unit 220, and the third light emitting unit 230) and the micro driver 144 are installed on the first side 140t1 of the display substrate 140. The connection methods between the light-emitting diodes and the micro-driver 144 and the display substrate 140 include but are not limited to conductive pads, conductive bumps, and conductive balls. . Specifically, materials suitable for use as conductive pads, conductive bumps, and conductive balls may include low melting point metals or low liquidus melting point (Liquidus Melting Point) alloys, whose melting point or liquidation temperature is lower than 210°C, for example: Bismuth (Bi), tin (Sn), indium (In), or alloys thereof. . For example, the n-type contact electrode 214c and the p-type contact electrode 218c on the micro driver 144 and the light emitting diode are thermocompression bonded to the wiring structure 150 on the display substrate 140. The retaining wall structure 400 is formed between the light emitting diodes. Next, the light-transmitting layer 600 covers the light-emitting diode and the light-absorbing layer 420. The formation method of the above-mentioned barrier structure 400 and the light-transmitting layer 600 can refer to the content of the above-mentioned relevant paragraphs.
綜上所述,本揭提供使用雙色的擋牆結構環繞發光二極體的畫素封裝體及顯示裝置,其中雙色擋牆結構的黑色的吸光層可防止光串擾並增加對比度、白色的反射層可增加出光進而提升亮度,此外,藉由使反射層位於發光二極體的部分的厚度與吸光層的厚度比值大於0且小於1/5,可更增加出光亮度並同時維持表面的黑色對比度。再者,藉由使反射層與發光二極體的上表面的夾角為直角或鈍角,增加出光角度,進而提升亮度。In summary, this disclosure provides a pixel package and a display device that use a two-color barrier structure to surround a light-emitting diode. The black light-absorbing layer of the two-color barrier structure can prevent light crosstalk and increase contrast, and the white reflective layer The light emission can be increased to improve the brightness. In addition, by making the ratio of the thickness of the part of the reflective layer located on the light-emitting diode to the thickness of the light-absorbing layer greater than 0 and less than 1/5, the light emission brightness can be further increased while maintaining the black contrast of the surface. Furthermore, by making the angle between the reflective layer and the upper surface of the light-emitting diode a right angle or an obtuse angle, the light emission angle is increased, thereby improving the brightness.
以上概述數個實施例之部件,以便在本揭露所屬技術領域中具有通常知識者可更易理解本揭露實施例的觀點。在本揭露所屬技術領域中具有通常知識者應理解,他們能以本揭露實施例為基礎,設計或修改其他製程和結構,以達到與在此介紹的實施例相同之目的及/或優勢。在本揭露所屬技術領域中具有通常知識者也應理解到,此類等效的製程和結構並無悖離本揭露的精神與範圍,且他們能在不違背本揭露之精神和範圍之下,做各式各樣的改變、取代和替換。The components of several embodiments are summarized above so that those with ordinary skill in the technical field to which this disclosure belongs can more easily understand the concepts of the embodiments of this disclosure. Those with ordinary skill in the technical field of this disclosure should understand that they can design or modify other processes and structures based on the embodiments of this disclosure to achieve the same purposes and/or advantages as the embodiments introduced here. Those with ordinary knowledge in the technical field to which the present disclosure belongs should also understand that such equivalent processes and structures do not deviate from the spirit and scope of the present disclosure, and they can be used without departing from the spirit and scope of the present disclosure. Make all kinds of changes, substitutions and substitutions.
10:畫素封裝體 20:多畫素封裝體 30:顯示裝置 100:載板 110:絕緣層 110t1:第一上表面 110t2:第一下表面 120:上導電層 122:行驅動器 124:列驅動器 126:柔性電路板 130:下導電層 140:顯示基板 140t1:第一側 140t2:第二側 142:顯示區 144:微驅動器 150:佈線結構 200:畫素 210:第一發光單元 210S:第一出光面 210W:第一側表面 212:成長基板 214:n型半導體層 214c:n型接觸電極 216:發光層 218:p型半導體層 218c:p型接觸電極 220:第二發光單元 220S:第二出光面 220W:第二側表面 230:第三發光單元 230S:第四出光面 300:焊錫 400:擋牆結構 410:反射層 412:第一部分 412t:第二上表面 414:第二部分 414t:第三上表面 414o:第二最大開口 420:吸光層 420o:第一最大開口 500:波長轉換層 500S:第三出光面 500W:第三側表面 600:透光層 D1:距離 D2:距離 H1:厚度 H2:厚度 H3:厚度 1:夾角 X:坐標軸 Y:坐標軸 Z:坐標軸 10: Pixel package 20: Multi-pixel package 30: Display device 100: Carrier board 110: Insulating layer 110t1: First upper surface 110t2: First lower surface 120: Upper conductive layer 122: Row driver 124: Column driver 126: Flexible circuit board 130: Lower conductive layer 140: Display substrate 140t1: First side 140t2: Second side 142: Display area 144: Micro driver 150: Wiring structure 200: Pixel 210: First light emitting unit 210S: First Light emitting surface 210W: first side surface 212: growth substrate 214: n-type semiconductor layer 214c: n-type contact electrode 216: light-emitting layer 218: p-type semiconductor layer 218c: p-type contact electrode 220: second light-emitting unit 220S: second Light-emitting surface 220W: Second side surface 230: Third light-emitting unit 230S: Fourth light-emitting surface 300: Solder 400: Barrier structure 410: Reflective layer 412: First part 412t: Second upper surface 414: Second part 414t: Third Third upper surface 414o: second largest opening 420: light-absorbing layer 420o: first largest opening 500: wavelength conversion layer 500S: third light-emitting surface 500W: third side surface 600: light-transmitting layer D1: distance D2: distance H1: thickness H2: Thickness H3: Thickness 1: Angle X: Coordinate axis Y: Coordinate axis Z: Coordinate axis
由以下的詳細敘述配合所附圖式,可較佳地理解本揭露實施例。應注意的是,依據在業界的標準做法,各種特徵並未按照比例繪製且僅用於說明。事實上,可任意地放大或縮小各種元件的尺寸,以清楚地表現出本揭露實施例之特徵。 第1A圖係根據本揭露的一實施例,繪示出畫素封裝體的俯視圖。 第1B圖係根據本揭露的另一實施例,繪示出多畫素封裝體的俯視圖。 第2圖係根據本揭露的一實施例,繪示出畫素封裝體的剖面圖。 第3A圖係根據本揭露一實施例,繪示出第2圖的虛線部分的放大圖。 第3B圖係根據本揭露的另一實施例,繪示出第2圖的虛線部分的放大圖。 第4圖係根據本揭露又一實施例,繪示出顯示裝置的俯視圖。 第5圖係根據本揭露的又一實施例,繪示出第4圖的虛線部分的放大的剖面圖。 The embodiments of the present disclosure can be better understood from the following detailed description together with the accompanying drawings. It should be noted that, in accordance with standard practice in the industry, various features are not drawn to scale and are for illustration only. In fact, the dimensions of various elements may be arbitrarily enlarged or reduced to clearly illustrate the features of the embodiments of the present disclosure. Figure 1A is a top view of a pixel package according to an embodiment of the present disclosure. Figure 1B is a top view of a multi-pixel package according to another embodiment of the present disclosure. Figure 2 is a cross-sectional view of a pixel package according to an embodiment of the present disclosure. Figure 3A is an enlarged view of the dotted line portion of Figure 2 according to an embodiment of the present disclosure. Figure 3B is an enlarged view of the dotted line portion of Figure 2 according to another embodiment of the present disclosure. Figure 4 is a top view of a display device according to yet another embodiment of the present disclosure. Figure 5 is an enlarged cross-sectional view of the dotted line portion of Figure 4 according to yet another embodiment of the present disclosure.
100:載板 100: Carrier board
110:絕緣層 110: Insulation layer
110t1:第一上表面 110t1: First upper surface
110t2:第一下表面 110t2: First lower surface
120:上導電層 120: Upper conductive layer
130:下導電層 130: Lower conductive layer
210:第一發光單元 210: First light emitting unit
210S:第一出光面 210S: The first shining surface
210W:第一側表面 210W: first side surface
214c:n型接觸電極 214c: n-type contact electrode
218c:p型接觸電極 218c: p-type contact electrode
220:第二發光單元 220: Second light-emitting unit
220S:第二出光面 220S: The second light-emitting surface
220W:第二側表面 220W: Second side surface
230:第三發光單元 230: The third light-emitting unit
230S:第四出光面 230S: The fourth light-emitting surface
300:焊錫 300:Solder
400:擋牆結構 400:Retaining wall structure
410:反射層 410: Reflective layer
412:第一部分 412:Part One
412t:第二上表面 412t: Second upper surface
414:第二部分 414:Part 2
414t:第三上表面 414t:Third upper surface
420:吸光層 420:Light absorbing layer
500:波長轉換層 500: Wavelength conversion layer
500S:第三出光面 500S: The third light-emitting surface
500W:第三側表面 500W: Third side surface
600:透光層 600: Translucent layer
Y:坐標軸 Y: coordinate axis
Z:坐標軸 Z: coordinate axis
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