TW202338811A - Capacitor string structure, memory device and electronic device - Google Patents
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本發明是有關於一種電容串結構、記憶體裝置及電子裝置,且特別是有關於一種在記憶體裝置的字元線形成的電容串結構,以及基於電容結構所建構的電子裝置。The present invention relates to a capacitor string structure, a memory device and an electronic device, and in particular to a capacitor string structure formed on a word line of a memory device, and an electronic device constructed based on the capacitor structure.
在記憶體技術領域中,在記憶體裝置中設置電荷泵電路是一個必要的選擇。電荷泵電路可以用來提升字元線上字元線電壓,以啟動記憶胞的程式化動作。In the field of memory technology, it is a necessary choice to install a charge pump circuit in a memory device. The charge pump circuit can be used to increase the word line voltage on the word line to start the programmed action of the memory cell.
基於電荷泵電路需要設置相應的多個電容。而電容在積體電路的佈局中,又需耗費大量的佈局面積。因此,要如何節省積體電路內的電容的佈局面積,為本領域技術人員的重要課題。Based on the charge pump circuit, multiple corresponding capacitors need to be set. Capacitors require a large amount of layout area in the layout of integrated circuits. Therefore, how to save the layout area of capacitors in integrated circuits is an important issue for those skilled in the art.
本發明提供一種電容串結構,利用記憶體裝置中多條字元線來形成,可減小電路佈局所需的面積。The present invention provides a capacitor string structure, which is formed by using multiple word lines in a memory device, which can reduce the area required for circuit layout.
本發明提供一種記憶體裝置及電子裝置,配合上述的電容串結構,可減小電路佈局所需的面積。The present invention provides a memory device and an electronic device, which can reduce the area required for circuit layout by cooperating with the above capacitor string structure.
本發明的電容串結構包括多個導電板。導電板設置在記憶體裝置中。導電板相互堆疊,分別形成記憶體裝置中的多條字元線,其中導電板中相鄰的二者間形成電容。The capacitor string structure of the present invention includes multiple conductive plates. The conductive plate is disposed in the memory device. The conductive plates are stacked on each other to form multiple word lines in the memory device, and a capacitor is formed between two adjacent conductive plates.
本發明的電子裝置包括核心電路以及多個第一電容。核心電路耦接至第一電容。第一電容形成一電容串結構。電容串結構由多個導電板形成。導電板設置在記憶體裝置中。導電板相互堆疊,分別形成記憶體裝置中的多條字元線,其中導電板中相鄰的二者間形成各第一電容。The electronic device of the present invention includes a core circuit and a plurality of first capacitors. The core circuit is coupled to the first capacitor. The first capacitor forms a capacitor string structure. The capacitor string structure is formed from multiple conductive plates. The conductive plate is disposed in the memory device. The conductive plates are stacked on each other to form a plurality of word lines in the memory device, wherein first capacitors are formed between two adjacent conductive plates.
本發明的記憶體裝置包括多條字元線以及電荷泵電路。各字元線耦接至多個記憶胞。字元線分別由多個導電板所形成,導電板形成電容串結構。電荷泵電路耦接至電容串結構,根據多個時脈信號以針對該電容結構中的多個第一電容進行電荷泵操作以產生輸出電壓。The memory device of the present invention includes a plurality of word lines and a charge pump circuit. Each word line is coupled to a plurality of memory cells. The word lines are respectively formed by a plurality of conductive plates, and the conductive plates form a capacitor string structure. The charge pump circuit is coupled to the capacitor string structure, and performs a charge pump operation on a plurality of first capacitors in the capacitor structure according to a plurality of clock signals to generate an output voltage.
基於上述,本發明的電容串結構透過記憶體裝置中的相互堆疊的多條字元線來形成。本發明的電容串結構可提供記憶體裝置以及電子裝置來進行電荷儲存以及轉移的媒介。基於電容串結構是透過記憶體裝置中的相互堆疊的多條字元線來形成,電容串結構不需佔去額外的電路佈局面積,有效降低電路成本。Based on the above, the capacitor string structure of the present invention is formed by a plurality of word lines stacked on each other in a memory device. The capacitor string structure of the present invention can provide a medium for charge storage and transfer in memory devices and electronic devices. Since the capacitor string structure is formed by stacking multiple word lines in a memory device, the capacitor string structure does not need to occupy additional circuit layout area, effectively reducing circuit costs.
請參照圖1,圖1繪示本發明一實施例的電容串結構的示意圖。電容串結構中包括串聯耦接的電容C1~C8。電容C1~C8由多個形成記憶體裝置100的字元線WL1~WL8的導電板所形成。其中,在本實施例中,形成字元線WL1~WL8的導電板依序堆疊。相鄰的字元線WL1以及WL2的二導電板形成電容C1;相鄰的字元線WL2以及WL3的二導電板形成電容C2;…;相鄰的字元線WL7以及WL8的二導電板形成電容C8。Please refer to FIG. 1 , which is a schematic diagram of a capacitor string structure according to an embodiment of the present invention. The capacitor string structure includes series-coupled capacitors C1 to C8. Capacitors C1 - C8 are formed by a plurality of conductive plates forming word lines WL1 - WL8 of memory device 100 . In this embodiment, the conductive plates forming the word lines WL1 to WL8 are stacked in sequence. The two conductive plates of adjacent word lines WL1 and WL2 form a capacitor C1; the two conductive plates of adjacent word lines WL2 and WL3 form a capacitor C2; ...; the two conductive plates of adjacent word lines WL7 and WL8 form a capacitor C2. Capacitor C8.
本實施例中,記憶體裝置100可以為非揮發式記憶體(例如快閃記憶體)或揮發式記憶體,沒有一定的限制。In this embodiment, the memory device 100 can be a non-volatile memory (such as a flash memory) or a volatile memory, without certain limitations.
在本實施例中,記憶體裝置100為三維架構的記憶體裝置。記憶體裝置100中具有形成記憶串選擇線SSL以及共同源極線GSL的導電板。形成字元線WL1~WL8的導電板依序設置在記憶串選擇線SSL以及共同源極線GSL的二導電板間。值得一提的,本發明實施例透過利用記憶體裝置100中形成字元線WL1~WL8的導電板來形成包括電容C1~C8的電容串結構,可在不需要額外的佈局面積下,產生電路中所需要的電容。In this embodiment, the memory device 100 is a three-dimensional architecture memory device. The memory device 100 has a conductive plate forming a memory string selection line SSL and a common source line GSL. The conductive plates forming the word lines WL1 to WL8 are sequentially disposed between the two conductive plates of the memory string selection line SSL and the common source line GSL. It is worth mentioning that the embodiment of the present invention uses the conductive plates forming the word lines WL1 ~ WL8 in the memory device 100 to form a capacitor string structure including the capacitors C1 ~ C8, which can generate a circuit without requiring additional layout area. the required capacitance.
值得一提的,在記憶體裝置100中,形成字元線WL1~WL8的導電板可以為具有孔串(string holes)的導電板或不具有孔串的導電板。本發明實施例中,用以形成字元線WL1~WL8的導電板可以為不具有孔串的導電板,或也可以為具有孔串的導電板,沒有固定的限制。It is worth mentioning that in the memory device 100 , the conductive plates forming the word lines WL1 to WL8 may be conductive plates with string holes or conductive plates without string holes. In the embodiment of the present invention, the conductive plate used to form the word lines WL1 to WL8 may be a conductive plate without hole strings, or may be a conductive plate with hole strings, and there is no fixed limit.
以下請參照圖2,圖2繪示本發明一實施例的電容串結構的示意圖。電容串結構200由多個形成字元線WL1~WL20的導電板所形成。其中字元線WL1~WL20中,相鄰的二的導電板分別形成電容C1~C19。在本實施例中,形成字元線WL1、WL3以及WL5的第一導電板可透過傳輸導線WR1相互耦接至端點N1,形成字元線WL2以及WL4的第二導電板則可透過傳輸導線WR2相互耦接至端點M1。如此一來,電容C1~C4可並聯耦接在端點N1以及M1間。Please refer to FIG. 2 below. FIG. 2 is a schematic diagram of a capacitor string structure according to an embodiment of the present invention. The capacitor string structure 200 is formed by a plurality of conductive plates forming word lines WL1 to WL20. Among the word lines WL1 to WL20, two adjacent conductive plates form capacitors C1 to C19 respectively. In this embodiment, the first conductive plates forming the word lines WL1, WL3 and WL5 can be coupled to the end point N1 through the transmission wire WR1, and the second conductive plates forming the word lines WL2 and WL4 can be coupled to each other through the transmission wire WR1. WR2 are mutually coupled to terminal M1. In this way, the capacitors C1 ~ C4 can be coupled in parallel between the terminals N1 and M1.
另外,形成字元線WL6、WL8以及WL10的第一導電板可透過傳輸導線WR3相互耦接至端點N3;形成字元線WL7以及WL9的第二導電板則可透過傳輸導線WR4相互耦接至端點M3;形成字元線WL11、WL13以及WL15的第一導電板可透過傳輸導線WR5相互耦接至端點N2;形成字元線WL12以及WL14的第二導電板則可透過傳輸導線WR6相互耦接至端點M2;形成字元線WL16、WL18以及WL20的第一導電板可透過傳輸導線WR7相互耦接至端點N4;形成字元線WL17以及WL19的第二導電板則可透過傳輸導線WR8相互耦接至端點M4。上述的多個第一導電板彼此不直接相鄰,多個第二導電板彼此也不直接相鄰。In addition, the first conductive plates forming the word lines WL6, WL8 and WL10 can be coupled to each other through the transmission conductor WR3 to the end point N3; the second conductive plates forming the word lines WL7 and WL9 can be coupled to each other through the transmission conductor WR4. to the endpoint M3; the first conductive plates forming the word lines WL11, WL13 and WL15 can be coupled to each other to the endpoint N2 through the transmission conductor WR5; the second conductive plates forming the word lines WL12 and WL14 can be coupled to the endpoint N2 through the transmission conductor WR6 are coupled to each other to the endpoint M2; the first conductive plates forming the word lines WL16, WL18 and WL20 can be coupled to the endpoint N4 through the transmission wire WR7; the second conductive plates forming the word lines WL17 and WL19 can be coupled to each other to the endpoint N4. Transmission wires WR8 are mutually coupled to terminal M4. The plurality of first conductive plates mentioned above are not directly adjacent to each other, and the plurality of second conductive plates are not directly adjacent to each other.
透過上述的耦接關係,可以使電容C6~C10並連耦接在端點M3以及N3間,使電容C11~C14並連耦接在端點M2以及N2間,以及使電容C15~C19並連耦接在端點M4以及N4間。而上述的端點M1、N1間的電容、端點M3、N3間的電容、端點M2、N2間的電容以及端點M4、N4間的電容則依序串聯耦接。Through the above coupling relationship, the capacitors C6 ~ C10 can be coupled in parallel between the terminals M3 and N3, the capacitors C11 ~ C14 can be coupled in parallel between the terminals M2 and N2, and the capacitors C15 ~ C19 can be coupled in parallel. Coupled between terminals M4 and N4. The capacitance between the terminals M1 and N1, the capacitance between the terminals M3 and N3, the capacitance between the terminals M2 and N2, and the capacitance between the terminals M4 and N4 are sequentially coupled in series.
附帶一提的,本實施例中的字元線WL1~WL20的數量僅只是說明用的範例,不用以限制本發明的範疇。本領域具通常知識者可根據記憶體裝置中所具有的實際的字元線的個數來產生不同數量的電容,沒有特定的限制。Incidentally, the number of word lines WL1 to WL20 in this embodiment is only an example for illustration and is not intended to limit the scope of the present invention. A person skilled in the art can generate different numbers of capacitors according to the actual number of word lines in the memory device, without any specific limitation.
此外,本實施例中,任二端點間並聯的電容的數量是可以根據設計上的需求來進行調整的,並不限於本實施例中的四個。而透過調整二端點間並聯的電容的數量,可以調整二端點間所提供的等效電容的大小。In addition, in this embodiment, the number of capacitors connected in parallel between any two terminals can be adjusted according to design requirements and is not limited to four in this embodiment. By adjusting the number of capacitors connected in parallel between the two terminals, the equivalent capacitance provided between the two terminals can be adjusted.
以下請參照圖3A至圖3C,圖3A至圖3C分別繪示本發明實施例的電容串結構的不同實施方式的示意圖。在圖3A中,電容串結構310包括多個形成記憶體裝置的字元線的導電板WLP1~WLP5以及多個介電層ISP1~ISP4。導電板WLP1~WLP5分別與介電層ISP1~IP4交錯設置。其中,導電板WLP1、WLP2間、導電板WLP2、WLP3間、WLP3、WLP4間以及導電板WLP4、WLP5間可分形成電容。在本實施例中,導電板WLP1~WLP5相互堆疊成階梯狀,且導電板WLP1~WLP5分別具有裸露部NP1~NP5。Please refer to FIGS. 3A to 3C below. FIGS. 3A to 3C respectively illustrate schematic diagrams of different implementations of capacitor string structures according to embodiments of the present invention. In FIG. 3A, the capacitor string structure 310 includes a plurality of conductive plates WLP1˜WLP5 forming word lines of the memory device and a plurality of dielectric layers ISP1˜ISP4. The conductive plates WLP1~WLP5 are staggered with the dielectric layers ISP1~IP4 respectively. Among them, the spaces between conductive plates WLP1 and WLP2, the spaces between conductive plates WLP2 and WLP3, the spaces between WLP3 and WLP4, and the spaces between conductive plates WLP4 and WLP5 can be divided into capacitors. In this embodiment, the conductive plates WLP1 to WLP5 are stacked on each other in a ladder shape, and the conductive plates WLP1 to WLP5 have exposed portions NP1 to NP5 respectively.
此外,電容串結構310並包括傳輸導線WR1以及WR2。傳輸導線WR1耦接至導電板WLP1、WLP3以及WLP5所分別具有的裸露部NP1、NP3以及NP5上。傳輸導線WR1並可耦接至端點M1。傳輸導線WR2則耦接至導電板WLP2以及WLP4所分別具有的裸露部NP2以及NP4上。傳輸導線WR2並可耦接至端點N1。透過傳輸導線WR1以及WR2,導電板WLP1~WLP5間所形成的電容可並聯耦接在端點M1以及N1間。In addition, the capacitor string structure 310 also includes transmission wires WR1 and WR2. The transmission wire WR1 is coupled to the exposed portions NP1, NP3 and NP5 of the conductive plates WLP1, WLP3 and WLP5 respectively. The transmission wire WR1 can be coupled to the terminal M1. The transmission wire WR2 is coupled to the exposed portions NP2 and NP4 of the conductive plates WLP2 and WLP4 respectively. The transmission wire WR2 can be coupled to the terminal N1. Through the transmission wires WR1 and WR2, the capacitance formed between the conductive plates WLP1~WLP5 can be coupled in parallel between the terminals M1 and N1.
在圖3B中,電容串結構320包括導電板WLP1~WLP8。導電板WLP1~WLP8分別用以形成記憶體裝置中的字元線WL(n)~WL(n+7)。導電板WLP1~WLP8相互交疊配置,相鄰的二導電板WLP1~WLP8間並分別形成多個電容。導電板WLP1、WLP3、WLP5以及WLP7 分別具有相互重疊的突出部PP1、PP3、PP5以及PP7,導電板WLP2、WLP4、WLP6以及WLP8則分別具有相互重疊的突出部PP2、PP4、PP6以及PP8。各個突出部PP1、PP3、PP5以及PP7與各個突出部PP2、PP4、PP6以及PP8則不相重疊。電容串結構320並包括傳輸導線WR1以及WR2。其中傳輸導線WR1耦接至突出部PP1、PP3、PP5以及PP7,而傳輸導線WR2則耦接至突出部PP2、PP4、PP6以及PP8。導電板WLP1~WLP8監所形成的多個電容可相互並聯耦接。In FIG. 3B , the capacitor string structure 320 includes conductive plates WLP1 to WLP8. The conductive plates WLP1 ~ WLP8 are respectively used to form word lines WL(n) ~ WL(n+7) in the memory device. The conductive plates WLP1 ~ WLP8 are arranged to overlap each other, and a plurality of capacitors are respectively formed between the two adjacent conductive plates WLP1 ~ WLP8. The conductive plates WLP1, WLP3, WLP5 and WLP7 have overlapping protrusions PP1, PP3, PP5 and PP7 respectively, and the conductive plates WLP2, WLP4, WLP6 and WLP8 have overlapping protrusions PP2, PP4, PP6 and PP8 respectively. The respective protruding parts PP1, PP3, PP5 and PP7 do not overlap with the respective protruding parts PP2, PP4, PP6 and PP8. The capacitor string structure 320 also includes transmission wires WR1 and WR2. The transmission wire WR1 is coupled to the protruding parts PP1, PP3, PP5 and PP7, and the transmission wire WR2 is coupled to the protruding parts PP2, PP4, PP6 and PP8. Multiple capacitors formed by the conductive plates WLP1 ~ WLP8 can be coupled to each other in parallel.
在圖3C中,電容串結構330包括形成記憶體裝置的字元線的多個導電板WLP1~WLP5。導電板WLP1~WLP5可以階梯狀相互堆疊。在本實施方式中,傳輸導線WR1耦接至導電板WLP1以及導電板WLP5,且不直接連接至導電板WLP2以及WLP4(第三導電板),且傳輸導線WR2則耦接至導電板WLP3,以形成等效電路331。其中,傳輸導線WR1另耦接至端點N1,傳輸導線WR2則另耦接至端點M1。In FIG. 3C , the capacitor string structure 330 includes a plurality of conductive plates WLP1 - WLP5 forming word lines of the memory device. The conductive plates WLP1~WLP5 can be stacked on each other in a ladder shape. In this embodiment, the transmission wire WR1 is coupled to the conductive plate WLP1 and the conductive plate WLP5, and is not directly connected to the conductive plates WLP2 and WLP4 (the third conductive plate), and the transmission wire WR2 is coupled to the conductive plate WLP3, so as to An equivalent circuit 331 is formed. Among them, the transmission wire WR1 is further coupled to the end point N1, and the transmission wire WR2 is further coupled to the end point M1.
在等效電路331中,導電板WLP1、WLP2間形成的等效電容C31與導電板WLP2、WLP3間形成的等效電容C32相互串聯耦接在端點N1以及M1間。導電板WLP3、WLP4間形成的等效電容C33與導電板WLP4、WLP5間形成的等效電容C34相互串聯耦接在端點M1以及N1間。In the equivalent circuit 331, the equivalent capacitance C31 formed between the conductive plates WLP1 and WLP2 and the equivalent capacitance C32 formed between the conductive plates WLP2 and WLP3 are coupled in series between the terminals N1 and M1. The equivalent capacitance C33 formed between the conductive plates WLP3 and WLP4 and the equivalent capacitance C34 formed between the conductive plates WLP4 and WLP5 are coupled in series between the terminals M1 and N1.
透過圖3C實施方式的耦接組態,端點N1以及M1間可具有相對多的電容相互串接。因此,可提升端點N1以及M1間的耐電壓能力。Through the coupling configuration of the embodiment in FIG. 3C , relatively many capacitors can be connected in series between the terminals N1 and M1 . Therefore, the withstand voltage capability between terminals N1 and M1 can be improved.
當然,圖3C中使二端點N1以及M1間具有兩個相互串連的電容的實施方式只是一個說明用的範例。設計者也可使二端點N1以及M1間具有三個或三個以上相互串連的電容。其中,二端點N1以及M1具有串接電容的數量,可以由設計者自行決定,沒有特別的限制。Of course, the implementation of having two capacitors connected in series between the two terminals N1 and M1 in FIG. 3C is just an example for illustration. The designer can also have three or more capacitors connected in series between the two terminals N1 and M1. Among them, the number of series-connected capacitors at the two terminals N1 and M1 can be decided by the designer without any special restrictions.
以下請參照圖4,圖4繪示本發明一實施例的電子裝置的示意圖。電子裝置可以是電荷泵電路400。電荷泵電路400包括具有多個單元電路411~415的核心電路以及電容串結構420,其中電容串結構420係由多個字元線WL的導電板間的電容所組成。單元電路411~415依序串聯耦接,其中第一級的單元電路411接收基準電壓VCC。單元電路411~415的輸出端分別耦接至端點M1~M5。端點M5可以為電荷泵電路400的輸出端並產生輸出電壓VOUT。單元電路411~414的輸出端並分別耦接至次一級的單元電路412~415的輸入端。Please refer to FIG. 4 below. FIG. 4 is a schematic diagram of an electronic device according to an embodiment of the present invention. The electronic device may be a charge pump circuit 400. The charge pump circuit 400 includes a core circuit having a plurality of unit circuits 411 to 415 and a capacitor string structure 420. The capacitor string structure 420 is composed of capacitances between conductive plates of a plurality of word lines WL. The unit circuits 411 to 415 are coupled in series, and the first-stage unit circuit 411 receives the reference voltage VCC. The output terminals of the unit circuits 411 to 415 are coupled to the terminal points M1 to M5 respectively. The terminal M5 may be the output terminal of the charge pump circuit 400 and generate the output voltage VOUT. The output terminals of the unit circuits 411 to 414 are coupled to the input terminals of the subsequent unit circuits 412 to 415 respectively.
電容串結構420中,多個電容的另一端點N1、N3用以接收時脈信號P2;端點N2、N4用以接收時脈信號P3;端點N5則耦接至參考接地端VSS。時脈信號P3與時脈信號P2可具有不同的相位。時脈信號P3與時脈信號P2交錯的使對應聯接的電容的端點N1~N4,交錯的在不相同的第一電壓與第二電壓間進行切換。In the capacitor string structure 420, the other endpoints N1 and N3 of the plurality of capacitors are used to receive the clock signal P2; the endpoints N2 and N4 are used to receive the clock signal P3; and the endpoint N5 is coupled to the reference ground terminal VSS. The clock signal P3 and the clock signal P2 may have different phases. The clock signal P3 and the clock signal P2 are interleaved so that the terminals N1 to N4 of the corresponding connected capacitors are interleaved to switch between different first voltages and second voltages.
對應於電容串結構420中的多個電容的電壓交錯切換動作,單元電路411~415可進行電荷轉移動作。電荷泵電路400可基於基準電壓VCC,透過電壓泵升動作,來產生數倍於基準電壓VCC的輸出電壓VOUT。Corresponding to the staggered voltage switching operation of multiple capacitors in the capacitor string structure 420, the unit circuits 411 to 415 can perform charge transfer operations. The charge pump circuit 400 can generate an output voltage VOUT that is several times the reference voltage VCC through a voltage pumping operation based on the reference voltage VCC.
值得一提的,在本實施例中,單元電路411~415可應用本領域具通常知識者熟知的多級形式的電荷泵電路中的電荷泵單元電路來實施,沒有固定的限制。It is worth mentioning that in this embodiment, the unit circuits 411 to 415 can be implemented using a charge pump unit circuit in a multi-stage charge pump circuit that is well known to those skilled in the art, and there is no fixed limitation.
關於電容串結構420的實施細節,在前述的多個實施例以及實施方式中已有詳細的說明,在此恕不多贅述。The implementation details of the capacitor string structure 420 have been described in detail in the foregoing embodiments and implementation modes, and will not be described again here.
以下請參照圖5A,圖5A繪示本發明另一實施例的電子裝置的示意圖。電子裝置可以為電荷泵電路500。電荷泵電路500包括具有多個單元電路511~515以及多個反向器IV1~IV4的核心電路,以及電容串結構520,其中電容串結構520係由多個字元線WL的導電板間的電容所組成。在本實施例中,單元電路511包括電晶體T1、T2以及電容CG1;單元電路512包括電晶體T3、T4以及電容CG2;單元電路513包括電晶體T5、T6以及電容CG3;單元電路511包括電晶體T7、T8以及電容CG4;單元電路514包括電晶體T9、T10以及電容CG5。其中,第一級的單元電路511中,電晶體T1的第一端接收基準電壓VCC,電晶體T1的控制端耦接至單元電路511的輸出端並耦接至端點M1。電晶體T1的第二端耦接至電晶體T2的控制端。電晶體T2的第一端耦接至電晶體T1的第一端,電晶體T2的第二端則耦接至電晶體T1的控制端。此外,電容CG1的一端接收時脈信號P4,電容CG1的另一端耦接至電晶體T2的控制端。在第二級至最後一級的單元電路512~515中,其中的電晶體T3、T5、T7以及T9的第一端是耦接至前級單元電路511~514的輸出端,而最後一級的單元電路515的輸出端則用以產生輸出電壓VOUT。在第二級至最後一級的單元電路512~515中,電容CG2、CG4接收時脈信號P1,電容CG3、CG5則接收時脈信號P4。Please refer to FIG. 5A below. FIG. 5A is a schematic diagram of an electronic device according to another embodiment of the present invention. The electronic device may be a charge pump circuit 500 . The charge pump circuit 500 includes a core circuit having a plurality of unit circuits 511 to 515 and a plurality of inverters IV1 to IV4, and a capacitor string structure 520. The capacitor string structure 520 is composed of conductive plates between a plurality of word lines WL. Composed of capacitors. In this embodiment, unit circuit 511 includes transistors T1, T2 and capacitor CG1; unit circuit 512 includes transistors T3, T4 and capacitor CG2; unit circuit 513 includes transistors T5, T6 and capacitor CG3; unit circuit 511 includes transistors T5, T6 and capacitor CG3. Crystals T7, T8 and capacitor CG4; the unit circuit 514 includes transistors T9, T10 and capacitor CG5. Among them, in the unit circuit 511 of the first stage, the first terminal of the transistor T1 receives the reference voltage VCC, and the control terminal of the transistor T1 is coupled to the output terminal of the unit circuit 511 and coupled to the terminal point M1. The second terminal of the transistor T1 is coupled to the control terminal of the transistor T2. The first terminal of the transistor T2 is coupled to the first terminal of the transistor T1, and the second terminal of the transistor T2 is coupled to the control terminal of the transistor T1. In addition, one end of the capacitor CG1 receives the clock signal P4, and the other end of the capacitor CG1 is coupled to the control end of the transistor T2. In the second to last stage unit circuits 512~515, the first terminals of the transistors T3, T5, T7 and T9 are coupled to the output terminals of the previous stage unit circuits 511~514, and the last stage unit The output terminal of circuit 515 is used to generate the output voltage VOUT. In the unit circuits 512 to 515 of the second to last stages, the capacitors CG2 and CG4 receive the clock signal P1, and the capacitors CG3 and CG5 receive the clock signal P4.
此外,反向器IV1由電晶體TI1、TI2串接而成;反向器IV2由電晶體TI3、TI4串接而成;反向器IV3由電晶體TI5、TI6串接而成;以及,反向器IV4由電晶體TI7、TI8串接而成。反向器IV1接收時脈信號P2並提供時脈信號P2的反向信號至端點N1;反向器IV2接收時脈信號P3並提供時脈信號P3的反向信號至端點N2;反向器IV3接收時脈信號P2並提供時脈信號P2的反向信號至端點N3;反向器IV4接收時脈信號P3並提供時脈信號P3的反向信號至端點N4。其中,時脈信號P1~P4分別具有不同的相位。In addition, the inverter IV1 is composed of transistors TI1 and TI2 connected in series; the inverter IV2 is composed of transistors TI3 and TI4 connected in series; the inverter IV3 is composed of transistors TI5 and TI6 connected in series; and, the inverter IV3 is composed of transistors TI5 and TI6 connected in series; Diverter IV4 is composed of transistors TI7 and TI8 connected in series. The inverter IV1 receives the clock signal P2 and provides the reverse signal of the clock signal P2 to the end point N1; the inverter IV2 receives the clock signal P3 and provides the reverse signal of the clock signal P3 to the end point N2; reverse direction The inverter IV3 receives the clock signal P2 and provides the inverse signal of the clock signal P2 to the end point N3; the inverter IV4 receives the clock signal P3 and provides the inverse signal of the clock signal P3 to the end point N4. Among them, the clock signals P1 to P4 respectively have different phases.
在本實施例中,電晶體T1~T10以及電晶體TI2、TI4、TI6、TI8可以均為N型電晶體。電晶體TI1、TI3、TI5、TI7可以為P型電晶體。In this embodiment, the transistors T1 to T10 and the transistors TI2, TI4, TI6, and TI8 may all be N-type transistors. Transistors TI1, TI3, TI5, and TI7 may be P-type transistors.
在圖5B中,電子裝置可以為雙相位電荷泵電路501。雙相位電荷泵電路501包括核心電路5011以及電容COUT,其中電容COUT為由記憶體中的多個形成字元線的導電板所形成的電容串結構。電容COUT耦接至核心電路5011的輸出端。電容COUT的細節可參見圖5A實施例的電容串結構520。核心電路5011包括相互串聯的電晶體M51~M55。各電晶體M51~M55耦接成二極體的組態。電晶體M51接收基準電壓VB,電晶體M52、M54透過電容C51、C53接收時脈信號CLK,電晶體M53、M55透過電容C52、C54接收反向時脈信號。核心電路5011泵升基準電壓VB以核心電路5011的輸出端產生輸出電壓VOUT。In Figure 5B, the electronic device may be a bi-phase charge pump circuit 501. The bi-phase charge pump circuit 501 includes a core circuit 5011 and a capacitor COUT, where the capacitor COUT is a capacitor string structure formed by a plurality of conductive plates forming word lines in the memory. The capacitor COUT is coupled to the output terminal of the core circuit 5011. Details of the capacitor COUT can be found in the capacitor string structure 520 of the embodiment of FIG. 5A. The core circuit 5011 includes transistors M51~M55 connected in series. Each transistor M51~M55 is coupled into a diode configuration. Transistor M51 receives the reference voltage VB, transistors M52 and M54 receive the clock signal CLK through capacitors C51 and C53, and transistors M53 and M55 receive the reverse clock signal through capacitors C52 and C54. The core circuit 5011 pumps up the reference voltage VB to generate the output voltage VOUT at the output terminal of the core circuit 5011.
圖5C中,電子裝置可以為電壓調整器502。電壓調整器502包括核心電路5021以及電容COUT,其中電容COUT為由記憶體中的多個形成字元線的導電板所形成的電容串結構。電容COUT耦接至核心電路5021的輸出端。電容COUT的細節可參見圖5A實施例的電容串結構520。核心電路5021包括參考電壓產生器50211、放大器OP1、功率電晶體MP5以及電阻R51、R52。參考電壓產生器50211可以是能帶隙電壓產生器,並用以提供參考電壓至放大器OP1。電阻R51、R52用以分壓輸出電壓VOUT以產生回授電壓至放大器OP1。電壓調整器502是低壓降電壓調整器。In FIG. 5C, the electronic device may be a voltage regulator 502. The voltage regulator 502 includes a core circuit 5021 and a capacitor COUT, where the capacitor COUT is a capacitor string structure formed by a plurality of conductive plates forming word lines in the memory. The capacitor COUT is coupled to the output terminal of the core circuit 5021. Details of the capacitor COUT can be found in the capacitor string structure 520 of the embodiment of FIG. 5A. The core circuit 5021 includes a reference voltage generator 50211, an amplifier OP1, a power transistor MP5, and resistors R51 and R52. The reference voltage generator 50211 may be a bandgap voltage generator and is used to provide a reference voltage to the amplifier OP1. Resistors R51 and R52 are used to divide the output voltage VOUT to generate a feedback voltage to the amplifier OP1. Voltage regulator 502 is a low dropout voltage regulator.
圖5D中,電子裝置可以為時間延遲器503。時間延遲器503包括核心電路5031以及電容CD,其中電容CD為由記憶體中的多個形成字元線的導電板所形成的電容串結構。電容CD的細節可參見圖5A實施例的電容串結構520。核心電路5031包括緩衝器BUF1、BUF2以及電阻R53。緩衝器BUF1、BUF2相互串聯耦接,用以接收輸入信號IN,並透過延遲輸入信號IN以產生輸出信號OUT。電阻R53耦接在緩衝器BUF1、BUF2間,電容CD則耦接在電阻R53與接地端間。時間延遲器503的時間延遲可由電阻R53以及電容CD來決定。In Figure 5D, the electronic device may be a
圖5E中,電子裝置可以為電壓升壓器504。電壓升壓器504包括核心電路5041以及電容COUT,其中電容COUT為由記憶體中的多個形成字元線的導電板所形成的電容串結構。電容COUT耦接至核心電路5041的輸出端。電容COUT的細節可參見圖5A實施例的電容串結構520。核心電路5041包括電晶體MB1~MB5以及電容CB1。電晶體MB1及MB2形成一反相器以接收時脈信號CLK並產生反相時脈信號。電晶體MB3~MB5形成多個開關,並用以透過升壓基準電壓VCC以產生輸出電壓VOUT。In Figure 5E, the electronic device may be a
在此請注意,由記憶體中的多個形成字元線的導電板所形成的電容串結構也可應用在其他任意的電路架構中。圖5A至圖5E的實施例僅只是說明用的範例,不用以限制本發明的範疇。Please note here that the capacitor string structure formed by multiple conductive plates forming word lines in the memory can also be applied to any other circuit architecture. The embodiments in FIGS. 5A to 5E are only examples for illustration and are not intended to limit the scope of the present invention.
以下請參照圖6,圖6繪示本發明一實施例的記憶體裝置的示意圖。記憶體裝置600為三維結構的記憶體裝置。記憶體裝置600包括記憶胞陣列610、X驅動器621~622、電荷泵電路631~632、電容串結構640、頁緩衝器650以及周邊電路660。記憶胞陣列610可以具有三維方式堆疊排列的多個記憶胞。X驅動器621則可設置在記憶胞陣列610的側邊。Please refer to FIG. 6 below, which is a schematic diagram of a memory device according to an embodiment of the present invention. The
此外,基於記憶胞陣列610中的字元線WL1~WLN的佈局方向,電容串結構640可以形成在記憶胞陣列610的另一側邊上。相對應電容串結構640的位置,全部的或部分的電荷泵電路631的元件可以被設置在相鄰於電容串結構640的位置,並電容串結構640相耦接。在一些實施例中,電荷泵電路631也可設置在記憶胞陣列610的下方。In addition, based on the layout direction of the word lines WL1 ~ WLN in the
在本實施例中,X驅動器621~622可以堆疊的方式,多層次的被堆疊在記憶體裝置600中。相對應的,電荷泵電路631~632也可多層次的被堆疊在記憶體裝置600中,並分別設置在X驅動器621~622的側邊。如此一來,電荷泵電路631~632可以不需要被設置在周邊電路660的佈局範圍中,有效減低佈局面積的需求。In this embodiment, the
附帶一提的,本實施例中的頁緩衝器650以及周邊電路660可佈局在記憶體裝置600的底部,並為記憶胞陣列610所覆蓋。此外,本實施例中的X驅動器621~622、頁緩衝器650以及周邊電路660皆可應用本領域具通常知識者所熟知的電路架構來實施,沒有固定的限制。Incidentally, the
關於電荷泵電路631以及電容串結構640的實施細節,在前述的實施例以及實施方式中已有詳細的說明,在此恕不多贅述。The implementation details of the
綜上所述,本發明利用記憶體裝置中形成的字元線導電板來形成電容串結構。在不額外佔去三維的記憶體裝置中的佈局面積的前提下,形成電容串結構。並且,本發明的記憶體裝置與電子裝置可搭配上述的電容串結構來操作,以達到減小記憶體裝置的佈局面積,與降低電路成本的目的。In summary, the present invention utilizes word line conductive plates formed in a memory device to form a capacitor string structure. The capacitor string structure is formed without occupying additional layout area in the three-dimensional memory device. Moreover, the memory device and the electronic device of the present invention can be operated with the above-mentioned capacitor string structure, so as to achieve the purpose of reducing the layout area of the memory device and reducing the circuit cost.
100、600:記憶體裝置 200、310、320、420、520:電容串結構 331:等效電路 400:電荷泵電路 411~415、511~515:單元電路 500、501、502、503、504:電子裝置 5011、5021、5031、5041:核心電路 52111:參考電壓產生器 610:記憶胞陣列 621~622:X驅動器 631~632:電荷泵電路 640:電容串結構 650:頁緩衝器 660:周邊電路 BUF1、BUF2:緩衝器 C1~C19、CG1~CG5、COUT、CD、C51~C54:電容 C31~C34:等效電容 CLK:時脈信號 GSL:共同源極線 ISP1~ISP4:介電層 IV1~IV4:反向器 N1~N5、M1~M5:端點 NP1~NP5:裸露部 P1~P4:時脈信號 PP1~PP10:突出部 R51、R52、R53:電阻 SSL:記憶串選擇線 T1~T10、TI1~TI8、M51~M55、MP1、MB1~MB5:電晶體 VCC、VB:基準電壓 VOUT:輸出電壓 VSS:參考接地端 WL、WL1~WLN、WL(n)~WL(n+7):字元線 WL1~WL8:字元線 WLP1~WLP5:導電板 WR1~WR8:傳輸導線 100, 600: Memory device 200, 310, 320, 420, 520: capacitor string structure 331: Equivalent circuit 400: Charge pump circuit 411~415, 511~515: unit circuit 500, 501, 502, 503, 504: Electronic devices 5011, 5021, 5031, 5041: core circuit 52111: Reference voltage generator 610:Memory cell array 621~622:X drive 631~632: Charge pump circuit 640: Capacitor string structure 650: Page buffer 660: Peripheral circuit BUF1, BUF2: buffer C1~C19, CG1~CG5, COUT, CD, C51~C54: capacitor C31~C34: equivalent capacitance CLK: clock signal GSL: common source line ISP1~ISP4: dielectric layer IV1~IV4: reverser N1~N5, M1~M5: endpoints NP1~NP5: exposed part P1~P4: Clock signal PP1~PP10: protruding part R51, R52, R53: Resistors SSL: memory string selection line T1~T10, TI1~TI8, M51~M55, MP1, MB1~MB5: transistor VCC, VB: reference voltage VOUT: output voltage VSS: reference ground terminal WL, WL1~WLN, WL(n)~WL(n+7): character lines WL1~WL8: character lines WLP1~WLP5: conductive plate WR1~WR8: Transmission wire
圖1繪示本發明一實施例的電容串結構的示意圖。 圖2繪示本發明一實施例的電容串結構的示意圖。 圖3A至圖3C分別繪示本發明實施例的電容串結構的不同實施方式的示意圖。 圖4繪示本發明一實施例的電子裝置的示意圖。 圖5A至5E繪示本發明實施例的多個電子裝置的示意圖。 圖6繪示本發明一實施例的記憶體裝置的示意圖。 FIG. 1 is a schematic diagram of a capacitor string structure according to an embodiment of the present invention. FIG. 2 is a schematic diagram of a capacitor string structure according to an embodiment of the present invention. 3A to 3C are schematic diagrams of different implementations of capacitor string structures according to embodiments of the present invention. FIG. 4 is a schematic diagram of an electronic device according to an embodiment of the invention. 5A to 5E are schematic diagrams of multiple electronic devices according to embodiments of the present invention. FIG. 6 is a schematic diagram of a memory device according to an embodiment of the invention.
100:記憶體裝置 100:Memory device
C1~C8:電容 C1~C8: capacitor
GSL:共同源極線 GSL: common source line
SSL:記憶串選擇線 SSL: memory string selection line
WL1~WL8:字元線 WL1~WL8: character lines
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| TW111112177A TWI803265B (en) | 2022-03-30 | 2022-03-30 | Capacitor string structure, memory device and electronic device |
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| TW (1) | TWI803265B (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7064981B2 (en) * | 2004-08-04 | 2006-06-20 | Micron Technology, Inc. | NAND string wordline delay reduction |
| JP2012244180A (en) * | 2011-05-24 | 2012-12-10 | Macronix Internatl Co Ltd | Multi-layer structure and manufacturing method for the same |
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| TWI803265B (en) | 2023-05-21 |
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