TW202132036A - High-temperature environment processing device and method for hard and brittle plate including at least one optical processing device, a processing cavity, at least a pair of positive pressure generator and negative pressure generator and at least a pair of heating devices - Google Patents

Abstract

A high-temperature environment processing device and method for hard and brittle plates are provided. The high-temperature environment processing device for hard and brittle plates includes at least one optical processing device provided with at least one terminal lens assembly at a front end, a processing cavity, at least a pair of positive pressure generator and negative pressure generator arranged around the front half of the processing cavity, and at least a pair of heating devices arranged in the rear half of the processing cavity. The optical processing device can generate at least one processing beam through the terminal lens assembly. At least one opening is provided on the periphery of the processing cavity to accommodate the terminal lens assembly of the optical processing device. The front half of the processing cavity uses the positive pressure generator to generate positive air pressure and uses the negative pressure generator to generate negative air pressure, so that at least one air curtain is formed in the front half of the processing cavity. The heating device heats the rear half of the processing cavity and the hard and brittle plate workpiece in a high temperature environment above 400 degrees Celsius, then the processing beam of the optical processing device passes through the air curtains to perform processing on the hard and brittle plate workpiece, and the air curtains are used to isolate the convection rising heat generated by the processing of the hard and brittle plate workpiece in the high-temperature environment so as to protect the terminal lens assembly of the optical processing device.

Description

High-temperature environment processing device and method for hard and brittle plates

The present invention relates to a high-temperature environment processing device and method for hard and brittle plates, particularly for processing hard and brittle plate workpieces, and at least one air curtains in a processing cavity isolate the optical processing device from the hard and brittle plate workpieces Device and method for high temperature processing environment thermal energy.

According to various hard and brittle plates such as optical glass, sapphire, quartz glass, etc., they are widely used in the new generation of smart phones, tablet computers, electric instrument panels, display glass panels, automobile instrument panels, and watch mirror products to provide Smart phones, tablet computers, electric instrument panels, display glass panels, automotive instrument panels and watch products have four directions of upper, lower, left and right edge curved display or touch operation functions. However, for the above-mentioned hardware The heating method of the brittle sheet is conventionally used to perform processing operations such as cutting, perforating, surface engraving, etching, polishing, etc. with the beam of a laser processing equipment, so that the hard and brittle sheet can be processed into finished or semi-finished products.

However, with the above-mentioned conventional hard and brittle plate processing methods, because the hard and brittle plate materials such as various optical glass, sapphire, quartz, etc. are very sensitive to temperature changes, such as the hard and brittle plate at normal room temperature, the above-mentioned The laser high-temperature beam of the laser beam is instantly directed to the surface of the hard and brittle plate workpiece for processing, which will cause the surface of the hard and brittle plate workpiece to be instantly changed and the local temperature rises rapidly, causing the surface of the hard and brittle plate to be cracked or damaged. As a result, the surface processing quality of the hard and brittle sheet material is greatly affected, and the processing yield of the hard and brittle sheet material is greatly reduced. This is a problem that needs to be solved in the current hard and brittle sheet material processing.

In addition, if it is considered that the surface of the hard and brittle plate is heated to a higher temperature environment, for example: above 400°C, the high-temperature laser processing beam can be used to process the surface of the hard and brittle plate. The surface will not be cracked or chipped due to the instantaneous temperature difference, but in this way, the heat of the high-temperature processing environment of the hard and brittle sheet and the heat of the laser beam processing temperature of the laser processing equipment will be caused by thermal convection. Up to the final lens of the laser processing equipment, For example: the most terminal focusing lens, so it is easy to cause high temperature damage to the terminal lens of the laser processing equipment, resulting in damage to the terminal lens of the laser processing equipment, and the laser processing equipment cannot be used for hard and brittle plates Processing in a heated high temperature environment.

In addition, in the previous related patent technical documents, such as the Republic of China Patent Publication No. M461498 "Workpiece pressing device of laser cutting machine" new patent case, it is disclosed that the laser head is provided with an output terminal, and the output is The end is provided with an end seat with a through groove, and the laser beam is emitted from the through groove of the end seat for cutting workpieces. In addition, an air jet structure is provided around the through groove of the end seat for ejecting gas and spraying on the mine. An air curtain is formed around the beam to press against the workpiece, that is, the previous patent case requires a major modification of the laser head equipment, which is not suitable for the use of existing laser processing equipment, which greatly limits its application scope and industrial utilization benefits, and , When the workpiece is a hard and brittle plate, because the high temperature rise of the laser beam instantly projected on the surface of the workpiece, the hard and brittle plate workpiece has problems and shortcomings due to chipping or damage. In addition, the jet The structure forms an air curtain against the workpiece around the laser beam of the laser head. The volume and range of its influence are too small. It is not suitable for the workpiece heated to a high temperature working environment above 400℃, and it cannot effectively block and isolate the workpiece. The thermal convection heat energy of processing high temperature environment and the high temperature heat energy of the laser lens, according to the current industrial application of laser system optical lens and its coating, the temperature resistance is less than 300 ℃, which will still make the laser head The lens is damaged and damaged.

In addition, another example of the US Invention Patent No. US8288684 "Laser micro-machining system with post-scan lens deflection" case discloses the use of a mirror surface positioned on the The scanning lens and the workpiece are inclined with respect to the working surface to reflect the laser pulse toward the workpiece, so that the laser pulse impacts the mirror surface at a 90 degree angle relative to the working surface and is related to the work surface. One of the working surfaces is modified to reflect the angle of attack technology towards the working surface, but likewise, this conventional laser micromachining system cannot be applied to the high-temperature processing of the above-mentioned hard and brittle plates, because the lens assembly will also It is damaged by the heat energy of the high-temperature processing environment of hard and brittle plates, but there are still problems and shortcomings that the terminal lens assembly produced by the above-mentioned conventional laser processing system used in the high-temperature processing environment of hard and brittle plates will be damaged by high-temperature heat convection heat.

The laser processing system or optical processing system in the above-mentioned prior art or each patent In a high-temperature working environment, there are problems and shortcomings that the high-temperature heat generated damages the terminal lens assembly components of the laser processing or optical processing system.

For this reason, a high-temperature environment processing device for hard and brittle plates of the present invention includes: at least one optical processing device, the front end of the optical processing device is provided with at least one terminal lens group, and the optical processing device can produce at least A processing beam; a processing cavity, the periphery of the processing cavity is provided with at least one opening for the terminal lens assembly of the optical processing device to receive, and at least a pair of positive pressure input ports are respectively provided on the periphery of the front half of the processing cavity And a negative pressure output port, the back half of the processing cavity is provided for at least one hard and brittle plate workpiece to be accommodated; at least a pair of positive pressure generators and negative pressure generators, the positive pressure generators are correspondingly connected to the processing cavity The positive pressure input port is used to input positive pressure air pressure into the processing cavity, and the negative pressure generator is correspondingly connected to the negative pressure output port of the processing cavity to suck out the positive pressure air pressure input into the processing cavity by the positive pressure generator , So that at least one air curtains are formed in the front half of the processing cavity; and at least a pair of heating devices are respectively arranged on the periphery of the rear half of the processing cavity to control the inside of the processing cavity and the hard and brittle plate The workpiece is heated to 400°C to the high temperature of the material softening point of the hard and brittle plate workpiece, so that the processing beam of the optical processing device passes through the gas formed by the positive pressure generator and the negative pressure generator in the front half of the processing cavity The screen area is used to process the hard and brittle plate workpiece in the high temperature environment.

Further, in the high-temperature environment processing device for hard and brittle plates of the present invention, the optical processing device is constituted by a laser processing equipment.

In the above-mentioned hard and brittle board high-temperature environment processing device of the present invention, the optical processing device is constituted by a far-infrared processing equipment.

In the above-mentioned hard and brittle board high-temperature environment processing device of the present invention, the terminal lens group is composed of at least one lens.

In the above-mentioned hard and brittle board high-temperature environment processing device of the present invention, the terminal lens group is composed of at least one irregular-shaped multi-convex lens.

In the above-mentioned hard and brittle board high-temperature environment processing device of the present invention, the terminal lens group is composed of a plurality of compound lenses.

In the above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, the hard and brittle plate work piece contained in the rear half of the processing cavity is made of glass.

In the above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, the hard and brittle plate workpiece contained in the rear half of the processing cavity is composed of a sapphire glass.

In the above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, the hard and brittle plate work piece contained in the rear half of the processing cavity is made of quartz.

The above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, wherein the bottom surface of the hard and brittle plate workpiece in the processing cavity is combined with at least one working platform.

The above-mentioned hard and brittle plate high temperature environment processing device of the present invention, wherein the working platform combined with the bottom surface of the hard and brittle plate work piece in the processing cavity is formed by a multi-axis moving platform.

In the above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, wherein the working platform combined with the bottom surface of the hard and brittle plate work piece in the processing cavity is constituted by a bending jig.

The above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, wherein at least one movable door is provided outside the processing cavity, and the movable door is opened and closed to allow at least one heat radiation heating device to enter and exit the processing cavity , And pre-heat the hard and brittle plate work piece in the processing cavity with a wavelength between mid-infrared to far-infrared rays by the thermal radiation heating device to a high temperature of 400°C to the material softening point of the hard and brittle plate work piece.

In the high-temperature environment processing device for hard and brittle plates of the present invention, the positive pressure generator is constituted by an air compressor.

In the high-temperature environment processing device for hard and brittle plates of the present invention, the negative pressure generator is constituted by an air extraction device.

In the above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, the heating device is constituted by an electric heating device.

In the above-mentioned device for processing hard and brittle plates in a high-temperature environment of the present invention, the heating device is connected to at least one temperature control circuit to control the heating temperature of the heating device.

The above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, wherein the rear half of the processing cavity is provided with at least one first reflector and a second reflector, and the first reflector and the second reflector are 90 degrees to each other The position is arranged so that the processing beam of the optical processing device is reflected by the first reflector to the second reflector, and then the processing beam is reflected by the second reflector to the hard and brittle material workpiece in the second half of the processing cavity. Processing.

The above-mentioned hard and brittle plate high temperature environment processing device of the present invention, wherein the processing cavity The first reflector and the second reflector in the back half of the body are composed of a metal reflector.

The above-mentioned hard and brittle board high-temperature environment processing device of the present invention, wherein the first reflector and the second reflector in the rear half of the processing cavity are respectively combined with at least one water-cooled heat dissipation device.

The above-mentioned hard and brittle plate high temperature environment processing device of the present invention, wherein the first mirror and the second mirror in the rear half of the processing cavity are respectively combined with at least a first deflection driver and a second deflection driver, so as to be respectively The first deflection driver and the second deflection driver control the deflection and reflection angles of the first mirror and the second mirror.

The above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, wherein the first deflection driver and the second deflection driver combined on the first reflector and the second reflector in the rear half of the processing cavity are arranged in the processing cavity Outside the body.

In the above-mentioned hard and brittle plate high-temperature environment processing device of the present invention, the first deflection driver and the second deflection driver combined on the first mirror and the second mirror in the rear half of the processing cavity are formed by a motor.

A method for processing hard and brittle plates in a high-temperature environment, the steps of which include:

(a) At least one air shield area is formed in a processing cavity, that is, at least a pair of positive pressure generators and negative pressure generators are respectively combined with the front half of the periphery of a processing cavity that houses a hard and brittle sheet material. , To respectively perform positive air pressure input and negative air pressure output on the front half of the processing cavity, so that at least one air shield area is formed in the front half of the processing cavity;

(b) The processing cavity and the hard and brittle plate workpiece are heated to a high temperature environment, that is, the rear half of the processing cavity in step (a) and the hard and brittle plate workpiece are combined with at least one of the periphery of the rear half of the processing cavity The heating device heats the hard and brittle plate work piece to a temperature between 400°C and the softening point, so that the second half of the processing cavity and the hard and brittle plate work piece form a high temperature environment;

(c) The processing beam passes through the air shield area, that is, at least one optical processing device and at least one terminal lens component at the front end of the optical processing device are combined with the front half of the processing cavity of step (a), so that the optical processing device The processing light beam generated by the processing device through the terminal lens group passes through the air shield area and is directed to the hard and brittle plate workpiece in the processing cavity; and

(d) Process hard and brittle plate workpieces in a high temperature environment, that is, through the processing cavity of step (b) and the hard and brittle plate workpieces heated to a high temperature environment and the step of processing beams of step (c) through the air shield area, the The hard and brittle plate workpiece contained in the processing cavity can be processed by the optical processing device in a high temperature environment.

Furthermore, in the high-temperature environment processing method of the hard and brittle sheet of the present invention, the gas barrier area in the processing cavity of the step (a) is formed under the condition of 1 atmospheric pressure.

The above-mentioned method for processing hard and brittle plates in a high-temperature environment of the present invention, wherein the processing cavity in the step (b) of the step (b) and the processing cavity of the hard and brittle plate workpiece heated to a high temperature environment can be moved through at least one The removed mobile thermal radiation heating device irradiates the hard and brittle plate work with a wavelength between near infrared and far infrared to heat the hard and brittle plate work to a temperature between 400°C and its softening point.

In the above-mentioned method for processing hard and brittle plates in a high temperature environment of the present invention, the processing temperature of the hard and brittle plate workpieces processed in a high temperature environment of the hard and brittle plate workpieces in the step (d) is a temperature of 500°C to 900°C.

The effect of the high-temperature environment processing device and method for hard and brittle plates of the present invention is that the front half of the processing cavity forms an air shield area to isolate the terminal lens group of the optical processing device from the rear half of the processing cavity and the hard and brittle The high-temperature environment area of the plate workpiece allows the processing beam emitted by the optical processing device to pass through the air shield area and then perform processing such as cutting, drilling, polishing, grinding, surface engraving, etching, etc. on the hard and brittle plate workpiece , The hard and brittle plate workpiece can be processed in a high temperature environment, and the hard and brittle plate workpiece will never have any chipping or damage caused by the temperature rise from room temperature. In addition, it can be processed by The air shield area effectively isolates the terminal lens group of the optical processing device and the back half of the processing cavity and the thermal convection heat of the high temperature environment of the hard and brittle plate workpiece, so that the terminal lens group of the optical processing device is effectively protected from any The intrusion and destruction of temperature rise or heat convection heat energy can ensure the processing stability and processing quality of the hard and brittle plate workpiece, and further enhance the industrial utilization value and economic benefits of the present invention.

100: High temperature environment processing device for hard and brittle plates

10: Optical processing device

11: Final lens group

11’: Terminal lens group

11A: Final lens group

12: Processing beam

12’: Processing beam

12A: Processing beam

20: Machining cavity

21: opening

22: Positive pressure input port

23: Negative pressure output port

24: The first mirror

25: second mirror

26: Water cooling device

27: The first deflection driver

28: The second deflection driver

30: Positive pressure generator

40: negative pressure generator

50: heating device

200: Hard and brittle plate workpiece

210: work platform

210’: work platform

300: finished product

400: At least one air shield area is formed in a processing cavity

410: The processing cavity and hard and brittle plate workpieces are heated to a high temperature environment

420: The processing beam passes through the air screen area

430: Processing of hard and brittle plate workpieces under high temperature environment

X: Air screen area

51: temperature control circuit

29: movable door

60: Thermal radiation heating device

220: Vertical auxiliary accelerator

The first figure is a diagram of the first embodiment of the apparatus for processing hard and brittle plates in a high-temperature environment according to the present invention;

The second figure is a diagram of the second embodiment of the apparatus for processing hard and brittle plates in a high-temperature environment according to the present invention;

The third figure is a diagram of the third embodiment of the device for processing hard and brittle plates in a high-temperature environment according to the present invention;

The fourth figure is a diagram of the fourth embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The fifth figure is a diagram of the fifth embodiment of the apparatus for processing hard and brittle plates in a high-temperature environment according to the present invention;

The sixth figure is a diagram of the sixth embodiment of the apparatus for processing hard and brittle plates in a high-temperature environment according to the present invention;

The seventh figure is a figure of the seventh embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

Figure 8 is a schematic diagram of the movable door in Figure 7 being opened to move the heat radiation heating device out of the processing cavity;

The ninth figure is a schematic diagram of the hard and brittle plate workpiece in the processing cavity in the seventh figure after being heated to a high temperature environment by a thermal radiation heating device;

The tenth figure is a diagram of a preferred application example of the high-temperature environment processing device for hard and brittle plates of the present invention;

Figure 11 is a schematic diagram of the finished product of the hard and brittle plate workpiece in the hard and brittle plate high-temperature environment processing device in Figure 10;

Figure 12 is a flow chart of the method for processing hard and brittle plates in a high-temperature environment of the present invention.

First, please refer to the first figure, which is the first embodiment of the high-temperature environment processing device 100 for hard and brittle plates of the present invention. The high-temperature environment processing device 100 for hard and brittle plates includes at least one optical processing device 10, the type of which is not limited. In the present invention, laser processing equipment and far-infrared processing equipment are taken as examples, and the front end of the optical processing device 10 is provided with at least one terminal lens group 11, and the optical processing device 10 can pass through the terminal lens group 11 to produce For at least one processing beam 12, the type of the terminal lens group 11 is not limited. In the first embodiment of the present invention, the series takes at least one lens structure as an example.

A processing cavity 20 is provided with at least one opening 21 on the periphery for the terminal lens set 11 of the optical processing device 10 to receive, and at least a pair of positive pressure input ports 22 and negative pressure input ports 22 are respectively provided on the periphery of the front half of the processing cavity 20 The pressure output port 23, and the arrangement of the positive pressure input port 22 and the negative pressure output port 23 is not limited. In the present invention, the positive pressure input port 22 is arranged above the negative pressure input port 23, and the processing cavity At least one hard and brittle plate work piece 200 is accommodated in the rear half of the 20. The type of the hard and brittle plate work piece 200 is not limited. In the present invention, the hard and brittle plate work piece 200 is a glass Take glass, sapphire glass, and quartz as examples. The bottom of the hard and brittle sheet workpiece 200 is combined with at least one working platform 210. The type of the working platform 210 is not limited. In the first embodiment of the present invention, the series is a multi-axis moving platform. Taking the structure as an example, the hard and brittle plate workpiece 200 can be driven to move in multiple axes.

At least a pair of positive pressure generator 30 and negative pressure generator 40, the positive pressure generator 30 is correspondingly connected to the positive pressure input port 22 of the processing cavity 20 to input positive pressure air pressure into the processing cavity 20, the The negative pressure generator 40 is correspondingly connected to the negative pressure output port 23 of the processing cavity to suck out the positive pressure air pressure (as shown by the arrow in the first figure) input into the processing cavity by the positive pressure generator 30 to At least one air shield area X is formed in the front half of the processing cavity. The type of the positive pressure generator 30 is not limited. In the present invention, an air pressure mechanism is taken as an example, and the type of the negative pressure generator 40 is not limited. In the present invention, an air extraction device is taken as an example.

At least a pair of heating devices 50 are respectively arranged on the peripheral edge of the rear half of the processing cavity 20 to heat the interior of the processing cavity 20 and the hard and brittle plate workpiece 200 to 400° C. to soften the material of the hard and brittle plate workpiece 200 Point high temperature temperature, the temperature of the softening point is not limited. In the present invention, 500℃ is taken as an example, so that the processing beam 12 of the optical processing device 10 can pass through the positive pressure generator 30 and the negative pressure generator 40 in the processing chamber The air-shield area X formed in the front half of the body 20 is used for processing such as cutting, drilling, polishing, grinding, surface engraving, etching, etc., to the hard and brittle sheet workpiece 200 in a high temperature environment. The hard and brittle sheet The processing temperature of the workpiece 200 is between 500°C and 900°C. The type of the heating device 50 is not limited. In the invention, an electric heating device is used as an example, and the heating device 50 is connected to at least one temperature control circuit 51 , In order to control the heating temperature of the heating device 50 by the temperature control circuit 51.

Please cooperate with the second figure, which is the second embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention. The processing beam 12 ′ is in the form of a multi-focus beam and passes through the air shield area X to process the hard and brittle plate workpiece 200 in the high temperature environment in the second half of the processing cavity 20.

Please refer to the third figure again, which is the third embodiment of the high-temperature environment processing device 100 for hard and brittle plates of the present invention. 12A is a form of a single-focus beam, which passes through the air shield area X to process the hard and brittle plate workpiece 200 in the high temperature environment in the second half of the processing cavity 20.

Please cooperate with the fourth figure, which is the fourth embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention, in which the terminal lens group 11 is shown as an example of at least one lens, and the processing cavity At least one first reflector 24 and second reflector 25 are provided in the rear half of 20. The types of the first reflector 24 and the second reflector 25 are not limited. In the present invention, a series of metal reflectors are used. As an example, the first mirror 24 and the second mirror 25 are arranged at a position of ninety degrees to each other, so that the first mirror 24 reflects the processing beam 12 of the optical processing device 10 to the second mirror 25 , The second reflector 25 reflects the processing beam 12 to the hard and brittle material workpiece 200 in the rear half of the processing cavity 20 for processing. The first reflector 24 and the second reflector 25 are respectively combined with at least one water cooling The heat dissipation device 26 can respectively provide heat dissipation for the first mirror 24 and the second mirror 25, and the first mirror 24 and the second mirror 25 are respectively combined with at least one first deflection driver 27 and Two deflection drivers 28 to control the deflection and reflection angles of the first mirror 24 and the second mirror 25 respectively by the first deflection driver 27 and the second deflection driver 28, the first deflection driver 27 and the second deflection driver 28 is arranged outside the processing cavity 20, and the types of the first deflection driver 27 and the second deflection driver 28 are not limited. In the present invention, a motor configuration is taken as an example, which is the fourth embodiment here. The middle shows that the hard and brittle plate workpiece 200 and the working platform 210 in the second half of the processing cavity 20 can be kept in a stationary state, and only the first deflection driver 27 and the second deflection driver 28 need to control the first mirror 24 and The deflection amount and the reflection angle of the second reflector 25 enable the processing beam 12 to move to cover the entire range of the hard and brittle plate workpiece 200 for processing.

Please refer to the fifth figure again, which is the fifth embodiment of the high-temperature environment processing device 100 for hard and brittle plates of the present invention. Take the point lens structure as an example, the processing beam 12' can be made into a multifocal beam. Similarly, the hard and brittle plate workpiece 200 and the working platform 210 in the rear half of the processing cavity 20 can be kept in a stationary state, and The first deflection driver 27 and the second deflection driver 28 only need to control the deflection amount and the reflection angle of the first mirror 24 and the second mirror 25, so that the processing beam 12' can be moved to cover the entire hard and brittle plate. The range of the workpiece 200 is processed.

Please cooperate with the sixth figure, which is the sixth embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention. The difference from the fourth figure is that the terminal lens group 11A is composed of multiple compound lenses. As an example, the processing beam 12A can be made into the form of a single focal beam, the same as In this way, the hard and brittle plate workpiece 200 and the work platform 210 in the second half of the processing cavity 20 can be kept in a stationary state, and only the first deflection driver 27 and the second deflection driver 28 need to control the first mirror 24 and the deflection angle and reflection angle of the second reflector 25, so that the processing beam 12A can be moved to cover the entire range of the hard and brittle plate workpiece 200 to be processed into a multifocal beam, and pass through the air shield area X , To process the hard and brittle plate workpiece 200 in the high temperature environment in the second half of the processing cavity 20.

Please refer to the seventh, eighth and ninth figures again. The seventh figure is the seventh application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention. The difference of the embodiment is that at least one movable door 29 is provided outside the processing cavity 20, and the movable door 29 is opened and closed (as shown in the seventh and eighth figures) to provide at least one heat radiation The heating device 60 enters and exits the processing cavity 20, and the hard and brittle plate workpiece 200 in the processing cavity 20 is pre-heated by the heat radiation heating device 60 at a wavelength between mid-infrared and far-infrared to the above heating The temperature reaches 400°C to the high temperature of the material softening point of the hard and brittle sheet workpiece 200, and then the heat radiation heating device 60 is moved out of the processing cavity 20 through the opened movable door 29 (as shown in the eighth figure), After closing the movable door 29, the processing beam 12 emitted by the optical processing device 10 passes through the air shield area X to process the hard and brittle plate workpiece 200 in the high temperature environment in the second half of the processing cavity 20 (As shown in the ninth figure), the first to sixth embodiments of the hard and brittle plate high-temperature environment processing device 100 of the present invention as shown above can also be achieved to allow the hard and brittle plate workpiece 200 to be processed in a high-temperature environment. The effect.

Please refer to the tenth and eleventh figures again. The tenth figure is a preferred application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention. Take the structure of a point lens as an example. The processing beam 12' can be a multi-focus beam and pass through the air shield area X to perform processing on the hard and brittle plate workpiece 200 in the high temperature environment in the second half of the processing cavity 20. Processing, and the work platform 210' containing the hard and brittle plate work piece 200 is constituted by a bending jig, that is, the jig for bending the hard and brittle plate work piece 200, and the bottom of the work platform 210’ is combined with at least one The vertical auxiliary accelerator 220 can use the upper processing beam 12' as a multi-focus beam to respectively contact the bending points of the four periphery of the hard and brittle sheet workpiece 200 for processing, and then use the vertical auxiliary accelerator 220 to accelerate up and down vertically. (As shown in the direction of the upper and lower dashed arrows in the tenth figure), the four peripheral parts of the hard and brittle sheet workpiece 200 are heated and softened Accelerate the bending and sagging shaping, so that the hard and brittle sheet workpiece 200 finally forms a finished product 300 with three-dimensional peripheral bending (as shown in the eleventh figure), which can provide three-dimensional bending touch of a smart phone The use of the panel.

The processing method of the four peripheral bending parts of the hard and brittle plate workpiece 200 disclosed in the preferred application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention shown in the tenth and eleventh figures is not based on the above The tenth and eleventh figures are limited to the auxiliary acceleration bending type of the working platform 210' of the bending jig type and the vertical auxiliary accelerator 220. Others such as the non-contact guide airflow method (Figure (Not shown), such as the invention patent announcement number of the Republic of China for which the applicant applied to China for approval and announcement: I660920 "Non-contact molding device and method" invention patent case of guided airflow non-contact bending glass sheet technology can also be applied The application scope of the processing method of the four peripheral bending parts of the hard and brittle plate workpiece 200 as the preferred application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention shown in the above-mentioned tenth and eleventh figures.

Please cooperate with Figure 12, which is a flowchart of the method for processing hard and brittle plates in a high temperature environment of the present invention. The steps include steps 400 to 430, of which:

(400) At least one air shield area is formed in a processing cavity, that is, the positive pressure generator 30 and the negative pressure generator 40 are respectively combined with the front half of the processing cavity 20 that houses a hard and brittle sheet material 200 inside. The peripheral edge of the processing cavity 20 is used to input positive air pressure and output negative air pressure respectively on the front half of the processing cavity 20, so that the front half of the processing cavity 20 forms at least one air shield area X;

(410) The processing cavity and the hard and brittle plate workpiece are heated to a high temperature environment, that is, the rear half of the processing cavity 20 and the hard and brittle plate workpiece 200 of the step (400) are combined with the rear half of the processing cavity 20 At least a pair of heating devices 26 on the periphery heat the hard and brittle plate workpiece 200 to a temperature between 400°C and the softening point, so that the rear half of the processing cavity 20 and the hard and brittle plate workpiece 200 form a high temperature environment;

(420) The processing beam passes through the air shield area, that is, at least one optical processing device 10 and at least one terminal lens assembly 11 at the front end of the optical processing device 10 are combined with the front half of the processing cavity 20 in the step (400) to The processing beam 12 generated by the optical processing device 10 through the terminal lens set 11 passes through the air shield area X and is directed to the hard and brittle sheet workpiece 200 in the processing cavity 20; and

(430) Process the hard and brittle plate workpiece in a high temperature environment, that is, through the processing cavity 20 of step (420) and the hard and brittle plate workpiece 200 being heated to a high temperature environment and the processing beam 12 of step (430) passes through the air shield In the zone X step, the hard and brittle plate workpiece 200 contained in the processing cavity 20 can be processed by the optical processing device 10 in a high temperature environment. The processing temperature of the hard and brittle plate workpiece 200 is 500°C~900°C的温度。 The temperature.

The apparatus and method for processing hard and brittle plates in a high temperature environment of the present invention shown in Figures 1 to 12 above. The relevant descriptions and drawings disclosed therein are only for the convenience of elucidating the technical content and technical means of the present invention. Disclosure of one of the preferred embodiments does not limit its scope, and any detailed structural modification or element equivalent substitution modification for the present invention does not depart from the creative spirit and scope of the present invention. Its scope will be determined by the following application It is defined by the scope of patents.

100: High temperature environment processing device for hard and brittle plates

10: Optical processing device

11: Final lens group

12: Processing beam

20: Machining cavity

21: opening

22: Positive pressure input port

23: Negative pressure output port

30: Positive pressure generator

40: negative pressure generator

50: heating device

51: temperature control circuit

200: Hard and brittle plate workpiece

210: work platform

X: Air screen area

Claims (23)

A high-temperature environment processing device for hard and brittle plates, which includes: At least one optical processing device, the front end of the optical processing device is provided with at least one terminal lens group, and the optical processing device can generate at least one processing beam after passing through the terminal lens group; A processing cavity with at least one opening on the periphery of the processing cavity for the terminal lens assembly of the optical processing device to receive, and at least a pair of positive pressure input ports and negative pressure output on the periphery of the front half of the processing cavity口, the back half of the processing cavity is provided for at least one hard and brittle plate workpiece to be accommodated; At least a pair of positive pressure generator and negative pressure generator, the positive pressure generator is correspondingly connected to the positive pressure input port of the processing cavity to input positive pressure air pressure into the processing cavity, and the negative pressure generator is correspondingly connected to The negative pressure output port of the processing cavity is used to suck out the positive pressure air pressure input into the processing cavity by the positive pressure generator, so that at least one air curtains are formed in the front half of the processing cavity; and At least one pair of heating devices are respectively arranged on the periphery of the rear half of the processing cavity to heat the inside of the processing cavity and the hard and brittle plate workpiece to a high temperature of 400°C to the material softening point of the hard and brittle plate workpiece. The processing beam of the optical processing device is transmitted through the air shield area formed by the positive pressure generator and the negative pressure generator in the front half of the processing cavity to process the hard and brittle plate workpiece in a high temperature environment. The high-temperature environment processing device for hard and brittle plates as described in item 1 of the scope of patent application, wherein the optical processing device is constituted by a laser processing equipment. The high-temperature environment processing device for hard and brittle plates as described in the first item of the scope of patent application, wherein the optical processing device is constituted by a mid-infrared or far-infrared processing equipment. The device for processing hard and brittle plates in a high-temperature environment as described in item 1 of the scope of patent application, wherein the terminal lens group is composed of at least one lens. According to the high-temperature environment processing device for hard and brittle plates as described in item 1 of the scope of patent application, the terminal lens group is composed of at least one irregular-shaped multi-convex lens. The device for processing hard and brittle plates in a high-temperature environment as described in item 1 of the scope of patent application, wherein the terminal lens group is composed of a plurality of compound lenses. Such as the hard and brittle plate high-temperature environment processing device described in item 1 of the scope of patent application, wherein the adding The hard and brittle plate workpiece contained in the back half of the cavity is made of glass. The hard and brittle plate high-temperature environment processing device described in the first item of the scope of patent application, wherein the hard and brittle plate work piece contained in the rear half of the processing cavity is made of quartz. The hard and brittle plate high-temperature environment processing device described in the first item of the scope of patent application, wherein the bottom surface of the hard and brittle plate workpiece in the processing cavity is combined with at least one working platform. As described in item 9 of the scope of patent application, the high-temperature environment processing device for hard and brittle plates, wherein the working platform combined with the bottom surface of the hard and brittle plate workpieces in the processing cavity is constituted by a multi-axis moving platform. For the hard and brittle plate high-temperature environment processing device described in item 9 of the scope of patent application, wherein the working platform combined with the bottom surface of the hard and brittle plate work piece in the processing cavity is constituted by a bending jig. For example, the hard and brittle plate high-temperature environment processing device described in the scope of the patent application, wherein at least one movable door is provided outside the processing cavity, and the movable door is opened and closed for at least one radiant heating device to enter, Out of the processing cavity, the hard and brittle plate workpiece in the processing cavity is pre-heated to 400°C to soften the material of the hard and brittle plate workpiece with a wavelength between mid-infrared and far-infrared by the thermal radiation heating device Point high temperature. The device for processing hard and brittle plates in a high-temperature environment as described in claim 1, wherein the heating device is connected to at least one temperature control circuit to control the heating temperature of the heating device. The high-temperature environment processing device for hard and brittle plates as described in the first item of the scope of patent application, wherein the back half of the processing cavity is provided with at least one first reflector and a second reflector, the first reflector and the second reflector The mirrors are arranged at ninety degrees to each other, so that the first mirror reflects the processing beam of the optical processing device to the second mirror, and the second mirror reflects the processing beam to the back half of the processing cavity The hard and brittle material workpieces are processed. According to the high-temperature environment processing device for hard and brittle plates as described in the 14th patent application, wherein the first mirror and the second mirror in the rear half of the processing cavity are composed of a metal mirror. According to the high-temperature environment processing device for hard and brittle plates as described in claim 14, wherein the first reflector and the second reflector arranged on the rear half of the processing cavity are respectively combined with at least one water-cooled heat sink. As described in item 14 of the scope of patent application, the high-temperature environment processing device for hard and brittle plates, wherein the first reflector and the second reflector in the rear half of the processing cavity are respectively combined with at least one The first deflection driver and the second deflection driver respectively control the deflection and reflection angles of the first mirror and the second mirror by the first deflection driver and the second deflection driver. The high-temperature environment processing device for hard and brittle plates as described in item 17 of the scope of patent application, wherein the first deflection driver and the second deflection driver are combined on the first mirror and the second mirror in the back half of the processing cavity The system is arranged outside the processing cavity. Such as the hard and brittle plate high-temperature environment processing device described in item 17 or item 18 of the scope of patent application, wherein the first deflection actuator and the first deflection driver and The second deflection driver is composed of a motor. A method for processing hard and brittle plates in a high-temperature environment, the steps of which include: (a) At least one air shield area is formed in a processing cavity, that is, at least a pair of positive pressure generators and negative pressure generators are respectively combined with the front half of the periphery of a processing cavity that houses a hard and brittle sheet material. , To respectively perform positive air pressure input and negative air pressure output on the front half of the processing cavity, so that at least one air shield area is formed in the front half of the processing cavity; (b) The processing cavity and the hard and brittle plate workpiece are heated to a high temperature environment, that is, the rear half of the processing cavity in step (a) and the hard and brittle plate workpiece are combined with at least one of the periphery of the rear half of the processing cavity The heating device heats the hard and brittle plate work piece to a temperature between 400°C and the softening point, so that the second half of the processing cavity and the hard and brittle plate work piece form a high temperature environment; (c) The processing beam passes through the air shield area, that is, at least one optical processing device and at least one terminal lens component at the front end of the optical processing device are combined with the front half of the processing cavity of step (a), so that the optical processing device The processing light beam generated by the processing device through the terminal lens group passes through the air shield area and is directed to the hard and brittle plate workpiece in the processing cavity; and (d) Process hard and brittle plate workpieces in a high temperature environment, that is, through the processing cavity of step (b) and the hard and brittle plate workpieces heated to a high temperature environment and the step of processing beams of step (c) through the air shield area, the The hard and brittle plate workpiece contained in the processing cavity can be processed by the optical processing device in a high temperature environment. According to the method for processing hard and brittle plates in a high-temperature environment as described in item 20 of the scope of patent application, the gas barrier area in the processing cavity of the step (a) is formed under the condition of 1 atmospheric pressure. For example, in the method for heating hard and brittle plate workpieces described in item 20 of the scope of patent application, the processing cavity in the step (b) and the processing cavity of the hard and brittle plate workpiece heated to a high temperature environment can pass through at least one The moving heat radiation heating device that moves in and out irradiates the hard and brittle plate work with a wavelength between near infrared and far infrared to heat the hard and brittle plate work to a temperature between 400°C and its softening point. For example, the method for processing hard and brittle plates in a high temperature environment as described in item 20 of the scope of patent application, wherein the processing temperature of the hard and brittle plate workpieces processed in a high temperature environment of the hard and brittle plate workpieces in the step (d) is 500°C~900 Celsius The temperature of ℃.

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