TW202138178A - Polarization film, image display device and polarization film production method - Google Patents
Polarization film, image display device and polarization film production method Download PDFInfo
- Publication number
- TW202138178A TW202138178A TW110104293A TW110104293A TW202138178A TW 202138178 A TW202138178 A TW 202138178A TW 110104293 A TW110104293 A TW 110104293A TW 110104293 A TW110104293 A TW 110104293A TW 202138178 A TW202138178 A TW 202138178A
- Authority
- TW
- Taiwan
- Prior art keywords
- aforementioned
- polymer
- polarizing film
- monomer
- resin layer
- Prior art date
Links
- 230000010287 polarization Effects 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000000178 monomer Substances 0.000 claims abstract description 172
- 229920005989 resin Polymers 0.000 claims abstract description 151
- 239000011347 resin Substances 0.000 claims abstract description 151
- 229920000642 polymer Polymers 0.000 claims abstract description 142
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 58
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 57
- 239000011630 iodine Substances 0.000 claims abstract description 57
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 57
- 238000006243 chemical reaction Methods 0.000 claims abstract description 16
- 239000010410 layer Substances 0.000 claims description 173
- 239000012790 adhesive layer Substances 0.000 claims description 76
- 230000001681 protective effect Effects 0.000 claims description 65
- 238000003860 storage Methods 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000000370 acceptor Substances 0.000 claims description 10
- 239000003505 polymerization initiator Substances 0.000 claims description 9
- 230000000379 polymerizing effect Effects 0.000 claims description 9
- 239000003999 initiator Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000000007 visual effect Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 242
- 238000002834 transmittance Methods 0.000 description 46
- 238000000034 method Methods 0.000 description 38
- 239000011248 coating agent Substances 0.000 description 36
- 238000000576 coating method Methods 0.000 description 36
- -1 (meth)acrylic acid groups ester Chemical class 0.000 description 35
- 125000004429 atom Chemical group 0.000 description 27
- 229920002451 polyvinyl alcohol Polymers 0.000 description 23
- 238000012360 testing method Methods 0.000 description 23
- 239000004372 Polyvinyl alcohol Substances 0.000 description 22
- 230000008859 change Effects 0.000 description 22
- 150000001875 compounds Chemical class 0.000 description 19
- 239000000853 adhesive Substances 0.000 description 16
- 230000001070 adhesive effect Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- 239000007788 liquid Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- 239000004593 Epoxy Substances 0.000 description 12
- 239000011521 glass Substances 0.000 description 12
- 239000011342 resin composition Substances 0.000 description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- 229920001477 hydrophilic polymer Polymers 0.000 description 10
- 238000012900 molecular simulation Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 9
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 9
- 230000004048 modification Effects 0.000 description 9
- 238000012986 modification Methods 0.000 description 9
- 238000004043 dyeing Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 229920000139 polyethylene terephthalate Polymers 0.000 description 7
- 239000005020 polyethylene terephthalate Substances 0.000 description 7
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 6
- 239000004327 boric acid Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 229920000058 polyacrylate Polymers 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 229920005992 thermoplastic resin Polymers 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 238000004364 calculation method Methods 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 229920000515 polycarbonate Polymers 0.000 description 5
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 4
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004386 diacrylate group Chemical group 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002148 esters Chemical group 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000012552 review Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- AAWINMXGBBFQRZ-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid;(3-hydroxy-2,2-dimethylpropyl) prop-2-enoate Chemical compound OCC(C)(C)C(O)=O.OCC(C)(C)COC(=O)C=C AAWINMXGBBFQRZ-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- RPPJUTANAZTYOG-TVUYYUAGSA-N C(C=C)(=O)O[C@@H](C(OC(C=C)=O)CC(C)(C)C)[C@H](OC(C=C)=O)COC(C=C)=O Chemical compound C(C=C)(=O)O[C@@H](C(OC(C=C)=O)CC(C)(C)C)[C@H](OC(C=C)=O)COC(C=C)=O RPPJUTANAZTYOG-TVUYYUAGSA-N 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- 238000004057 DFT-B3LYP calculation Methods 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 101000720524 Gordonia sp. (strain TY-5) Acetone monooxygenase (methyl acetate-forming) Proteins 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000003522 acrylic cement Substances 0.000 description 2
- 229920001893 acrylonitrile styrene Polymers 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000005134 atomistic simulation Methods 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000008094 contradictory effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 150000002921 oxetanes Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- JZRWCGZRTZMZEH-UHFFFAOYSA-N thiamine Chemical compound CC1=C(CCO)SC=[N+]1CC1=CN=C(C)N=C1N JZRWCGZRTZMZEH-UHFFFAOYSA-N 0.000 description 2
- 229960000834 vinyl ether Drugs 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- RQJCIXUNHZZFMB-UHFFFAOYSA-N 1-ethenoxy-2-(2-ethenoxypropoxy)propane Chemical compound C=COCC(C)OCC(C)OC=C RQJCIXUNHZZFMB-UHFFFAOYSA-N 0.000 description 1
- PEBJBOQKIXHSOE-UHFFFAOYSA-N 1-ethenoxy-4-methoxybenzene Chemical compound COC1=CC=C(OC=C)C=C1 PEBJBOQKIXHSOE-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- LZHUBCULTHIFNO-UHFFFAOYSA-N 2,4-dihydroxy-1,5-bis[4-(2-hydroxyethoxy)phenyl]-2,4-dimethylpentan-3-one Chemical compound C=1C=C(OCCO)C=CC=1CC(C)(O)C(=O)C(O)(C)CC1=CC=C(OCCO)C=C1 LZHUBCULTHIFNO-UHFFFAOYSA-N 0.000 description 1
- IAMASUILMZETHW-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCCOCC(O)OC1=CC=CC=C1 IAMASUILMZETHW-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 1
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 description 1
- WTYYGFLRBWMFRY-UHFFFAOYSA-N 2-[6-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COCCCCCCOCC1CO1 WTYYGFLRBWMFRY-UHFFFAOYSA-N 0.000 description 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- HXLLCROMVONRRO-UHFFFAOYSA-N 2-butoxyethenylbenzene Chemical compound CCCCOC=CC1=CC=CC=C1 HXLLCROMVONRRO-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- KLAMVBJBHNQYSB-UHFFFAOYSA-N 2-ethyl-1-phenylbutan-1-one Chemical class CCC(CC)C(=O)C1=CC=CC=C1 KLAMVBJBHNQYSB-UHFFFAOYSA-N 0.000 description 1
- TZLVUWBGUNVFES-UHFFFAOYSA-N 2-ethyl-5-methylpyrazol-3-amine Chemical compound CCN1N=C(C)C=C1N TZLVUWBGUNVFES-UHFFFAOYSA-N 0.000 description 1
- CBECDWUDYQOTSW-UHFFFAOYSA-N 2-ethylbut-3-enal Chemical compound CCC(C=C)C=O CBECDWUDYQOTSW-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- WLVPRARCUSRDNI-UHFFFAOYSA-N 2-hydroxy-1-phenyl-1-propanone Chemical compound CC(O)C(=O)C1=CC=CC=C1 WLVPRARCUSRDNI-UHFFFAOYSA-N 0.000 description 1
- CDFCBRMXZKAKKI-UHFFFAOYSA-N 2-hydroxybenzaldehyde;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1C=O CDFCBRMXZKAKKI-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- YRNDGUSDBCARGC-UHFFFAOYSA-N 2-methoxyacetophenone Chemical compound COCC(=O)C1=CC=CC=C1 YRNDGUSDBCARGC-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- KWVIBDAKHDJCNY-UHFFFAOYSA-N 20alpha-atisine Natural products C12CCC3(C(C4=C)O)CCC4CC3C11CCCC2(C)CN2CCOC21 KWVIBDAKHDJCNY-UHFFFAOYSA-N 0.000 description 1
- GCQUOBKUEHYBMC-UHFFFAOYSA-N 3-(diethylamino)-7,8-dihydro-6h-cyclopenta[2,3]thieno[2,4-b][1,3]oxazin-1-one Chemical compound O=C1OC(N(CC)CC)=NC2=C1C(CCC1)=C1S2 GCQUOBKUEHYBMC-UHFFFAOYSA-N 0.000 description 1
- BIDWUUDRRVHZLQ-UHFFFAOYSA-N 3-ethyl-3-(2-ethylhexoxymethyl)oxetane Chemical compound CCCCC(CC)COCC1(CC)COC1 BIDWUUDRRVHZLQ-UHFFFAOYSA-N 0.000 description 1
- JUXZNIDKDPLYBY-UHFFFAOYSA-N 3-ethyl-3-(phenoxymethyl)oxetane Chemical compound C=1C=CC=CC=1OCC1(CC)COC1 JUXZNIDKDPLYBY-UHFFFAOYSA-N 0.000 description 1
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 1
- UVRCNEIYXSRHNT-UHFFFAOYSA-N 3-ethylpent-2-enamide Chemical compound CCC(CC)=CC(N)=O UVRCNEIYXSRHNT-UHFFFAOYSA-N 0.000 description 1
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 description 1
- SKLLASZUGHQRDL-UHFFFAOYSA-N 4-hydroxy-2-methylidene-5-phenoxypentanoic acid Chemical compound OC(=O)C(=C)CC(O)COC1=CC=CC=C1 SKLLASZUGHQRDL-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- YTNUOGWCFLMGLF-UHFFFAOYSA-N 5-methylbenzene-1,2,3,4-tetrol Chemical compound CC1=CC(O)=C(O)C(O)=C1O YTNUOGWCFLMGLF-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920008790 Amorphous Polyethylene terephthalate Polymers 0.000 description 1
- 101001074560 Arabidopsis thaliana Aquaporin PIP1-2 Proteins 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- MJNWHMVPPAWWNL-UHFFFAOYSA-N C12C(C3C4(C=CC=CC=C14)O3)O2 Chemical compound C12C(C3C4(C=CC=CC=C14)O3)O2 MJNWHMVPPAWWNL-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 1
- MCYBYTIPMYLHAK-UHFFFAOYSA-N adamantane-1,3,5-triol Chemical compound C1C(C2)CC3(O)CC1(O)CC2(O)C3 MCYBYTIPMYLHAK-UHFFFAOYSA-N 0.000 description 1
- MOLCWHCSXCKHAP-UHFFFAOYSA-N adamantane-1,3-diol Chemical compound C1C(C2)CC3CC1(O)CC2(O)C3 MOLCWHCSXCKHAP-UHFFFAOYSA-N 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical group 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000000181 anti-adherent effect Effects 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- DJUWPHRCMMMSCV-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) hexanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCC(=O)OCC1CC2OC2CC1 DJUWPHRCMMMSCV-UHFFFAOYSA-N 0.000 description 1
- 229930006711 bornane-2,3-dione Natural products 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920003174 cellulose-based polymer Polymers 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- MAWOHFOSAIXURX-UHFFFAOYSA-N cyclopentylcyclopentane Chemical group C1CCCC1C1CCCC1 MAWOHFOSAIXURX-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000009881 electrostatic interaction Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical group [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002596 lactones Chemical group 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- JTHNLKXLWOXOQK-UHFFFAOYSA-N n-propyl vinyl ketone Natural products CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 1
- OPECTNGATDYLSS-UHFFFAOYSA-N naphthalene-2-sulfonyl chloride Chemical compound C1=CC=CC2=CC(S(=O)(=O)Cl)=CC=C21 OPECTNGATDYLSS-UHFFFAOYSA-N 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- KOOHRIRWWIYFRH-UHFFFAOYSA-N oxolan-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1CCCO1 KOOHRIRWWIYFRH-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000636 poly(norbornene) polymer Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 235000019157 thiamine Nutrition 0.000 description 1
- 239000011721 thiamine Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
Abstract
本發明提供一種偏光薄膜,其在高溫多濕環境下可充分抑制偏光件所含之碘往外部透出。本發明偏光薄膜具備含碘之偏光件與樹脂層,且該樹脂層包含具有源自(甲基)丙烯酸酯之結構單元的聚合物。偏光薄膜利用下述式(1)算出之y1 之值小於1.3。 y1 =(0.279)x1 +(-1.51)x2 +(0.178)x3 +0.386 (1) 式(1)中,x1 係用以形成聚合物之單體中所含之可旋轉之鍵結數量,x2 係該單體中所含之反應點之數量,x3 係該單體的漢森溶解度參數中之極化項δP(MPa1/2 )。The present invention provides a polarizing film, which can sufficiently inhibit the iodine contained in a polarizer from leaking to the outside under a high temperature and high humidity environment. The polarizing film of the present invention is provided with a polarizer containing iodine and a resin layer, and the resin layer contains a polymer having a structural unit derived from (meth)acrylate. The value of y 1 calculated by the following formula (1) for the polarizing film is less than 1.3. y 1 =(0.279)x 1 +(-1.51)x 2 +(0.178)x 3 +0.386 (1) In formula (1), x 1 is the rotatable contained in the monomer used to form the polymer The number of bonds, x 2 is the number of reaction points contained in the monomer, and x 3 is the polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the monomer.
Description
本發明涉及偏光薄膜、影像顯示裝置及偏光薄膜之製造方法。The present invention relates to a polarizing film, an image display device and a manufacturing method of the polarizing film.
液晶顯示裝置、有機EL顯示裝置等影像顯示裝置例如基於其顯示原理等理由,具備有偏光薄膜。偏光薄膜例如係包含偏光件及透明保護薄膜之積層體。偏光件一般而言可藉由使聚乙烯醇(PVA)薄膜等親水性高分子薄膜吸附二色性色素,並將該薄膜進行單軸延伸來製作。由提升偏光件之透射率及偏光度之觀點來看,二色性色素可廣泛使用碘。Image display devices such as liquid crystal display devices and organic EL display devices are provided with a polarizing film for reasons such as the display principle. The polarizing film is, for example, a laminate including a polarizer and a transparent protective film. The polarizer can generally be produced by adsorbing a dichroic dye on a hydrophilic polymer film such as a polyvinyl alcohol (PVA) film, and then uniaxially stretching the film. From the viewpoint of improving the transmittance and polarization of the polarizer, iodine can be widely used as a dichroic dye.
專利文獻1中揭示了一種光學積層體,其係隔著硬化性樹脂組成物之硬化層使偏光件與保護膜接著者。由專利文獻1可理解到,藉由適當調節硬化性樹脂組成物中之脂環式環氧化合物之含量,即便光學積層體被放置在高溫多濕環境下時,仍可將硬化層之碘的含有率維持地較低。
先前技術文獻
專利文獻
專利文獻1:日本專利特開2018-169512號公報Patent Document 1: Japanese Patent Laid-Open No. 2018-169512
發明欲解決之課題 在高溫多濕環境下,偏光件所含之碘有從偏光件移動至透明保護薄膜、或移動至用以將偏光薄膜貼合於影像顯示面板之黏著劑層的傾向。尤其當偏光件之厚度小、且偏光件中之碘濃度高時,碘易從偏光件移動至透明保護薄膜或黏著劑層。移動至透明保護薄膜或黏著劑層之碘會透過透明保護薄膜或黏著劑層透出至偏光薄膜之外部。偏光件中的碘含有率若降低,偏光薄膜的偏光度便會降低。The problem to be solved by the invention In a high temperature and humidity environment, the iodine contained in the polarizer tends to move from the polarizer to the transparent protective film, or to the adhesive layer used to attach the polarizer film to the image display panel. Especially when the thickness of the polarizer is small and the iodine concentration in the polarizer is high, the iodine is easily moved from the polarizer to the transparent protective film or the adhesive layer. The iodine moved to the transparent protective film or the adhesive layer will pass through the transparent protective film or the adhesive layer to the outside of the polarizing film. If the iodine content in the polarizer decreases, the degree of polarization of the polarizing film will decrease.
以習知之偏光薄膜來說,在高溫多濕環境下無法充分抑制偏光件所含之碘透出至偏光薄膜之外部。例如專利文獻1係著眼於當光學積層體被放置於高溫多濕環境下時,將硬化層中之碘的含有率維持地較低。但,專利文獻1並未考慮到碘會從偏光件透出至光學積層體之外部一事。Taking the conventional polarizing film as an example, the iodine contained in the polarizer cannot be sufficiently prevented from leaking to the outside of the polarizing film under a high temperature and high humidity environment. For example,
因此本發明之目的在於提供一種偏光薄膜,其在高溫多濕環境下可充分抑制偏光件所含之碘往外部透出。Therefore, the object of the present invention is to provide a polarizing film that can sufficiently suppress the iodine contained in the polarizer from leaking to the outside under a high temperature and high humidity environment.
用以解決課題之手段 本發明人等積極檢討後,新發現偏光薄膜所具備之樹脂層的特性可根據用以形成樹脂層所含聚合物之單體來預測。根據本發明人等之檢討,該預測對於包含具有源自(甲基)丙烯酸酯之結構單元的聚合物之樹脂層,其可靠性特別高。本發明人等基於此見解,進一步進行檢討而達至完成本發明。Means to solve the problem After active review by the inventors, it was discovered that the characteristics of the resin layer of the polarizing film can be predicted based on the monomer used to form the polymer contained in the resin layer. According to the review conducted by the inventors, this prediction has particularly high reliability for a resin layer containing a polymer having a structural unit derived from (meth)acrylate. Based on this knowledge, the inventors conducted further studies to complete the present invention.
本發明提供一種偏光薄膜,其具備: 含碘之偏光件;與 樹脂層,其包含具有源自(甲基)丙烯酸酯之結構單元的聚合物;並且 該偏光薄膜利用下述式(1)算出之y1 之值小於1.3。 y1 =(0.279)x1 +(-1.51)x2 +(0.178)x3 +0.386 (1) 前述式(1)中,x1 係用以形成前述聚合物之單體中所含之可旋轉之鍵結數量, x2 係用以形成前述聚合物之前述單體中所含之反應點之數量, x3 係用以形成前述聚合物之前述單體的漢森溶解度參數中之極化項δP(MPa1/2 )。The present invention provides a polarizing film comprising: a polarizer containing iodine; and a resin layer containing a polymer having a structural unit derived from (meth)acrylate; and the polarizing film is calculated using the following formula (1) The value of y 1 is less than 1.3. y 1 =(0.279)x 1 +(-1.51)x 2 +(0.178)x 3 +0.386 (1) In the aforementioned formula (1), x 1 is the monomer used to form the aforementioned polymer. The number of bonds of rotation, x 2 is the number of reaction points contained in the monomer used to form the aforementioned polymer, and x 3 is the polarization in the Hansen solubility parameter of the aforementioned monomer used to form the aforementioned polymer The term δP (MPa 1/2 ).
並且,本發明提供一種偏光薄膜之製造方法,該偏光薄膜具備含碘之偏光件與樹脂層,且該樹脂層包含具有源自(甲基)丙烯酸酯之結構單元的聚合物;並且 前述製造方法包含以下步驟: 使利用下述式(1)算出之y1 之值小於1.3的單體聚合而獲得前述聚合物。 y1 =(0.279)x1 +(-1.51)x2 +(0.178)x3 +0.386 (1) 前述式(1)中,x1 係前述單體中所含之可旋轉之鍵結數量, x2 係前述單體中所含之反應點之數量, x3 係前述單體的漢森溶解度參數中之極化項δP(MPa1/2 )。In addition, the present invention provides a method of manufacturing a polarizing film, the polarizing film is provided with a polarizer containing iodine and a resin layer, and the resin layer includes a polymer having a structural unit derived from (meth)acrylate; and the foregoing manufacturing method It includes the following steps: polymerizing a monomer whose value of y 1 calculated by the following formula (1) is less than 1.3 to obtain the aforementioned polymer. y 1 =(0.279)x 1 +(-1.51)x 2 +(0.178)x 3 +0.386 (1) In the aforementioned formula (1), x 1 is the number of rotatable bonds contained in the aforementioned monomer, x 2 is the number of reaction points contained in the aforementioned monomer, and x 3 is the polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the aforementioned monomer.
並且,本發明提供一種偏光薄膜,其具備: 含碘之偏光件;與 樹脂層,其包含具有源自(甲基)丙烯酸酯之結構單元的聚合物;並且 該偏光薄膜利用下述式(2)算出之y2 之值小於1.3。 y2 =(0.255)x1 +(-1.57)x2 +(0.151)x3 +(-18.0)x4 +(0.0987)x5 +(-8.26) (2) 前述式(2)中,x1 係用以形成前述聚合物之單體中所含之可旋轉之鍵結數量, x2 係用以形成前述聚合物之前述單體中所含之反應點之數量, x3 係用以形成前述聚合物之前述單體的漢森溶解度參數中之極化項δP(MPa1/2 ), x4 係用以形成前述聚合物之前述單體中,作為氫鍵受體發揮功能之原子中最帶負電之原子的電荷(C), x5 係用以形成前述聚合物之前述單體之偶極矩的x成分(Debye)。Furthermore, the present invention provides a polarizing film comprising: a polarizer containing iodine; and a resin layer containing a polymer having a structural unit derived from (meth)acrylate; and the polarizing film uses the following formula (2 ) The calculated value of y 2 is less than 1.3. y 2 =(0.255)x 1 +(-1.57)x 2 +(0.151)x 3 +(-18.0)x 4 +(0.0987)x 5 +(-8.26) (2) In the foregoing formula (2), x 1 is the number of rotatable bonds contained in the monomer used to form the aforementioned polymer, x 2 is the number of reaction points contained in the aforementioned monomer used to form the aforementioned polymer, and x 3 is used to form The polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the aforementioned monomer of the aforementioned polymer, x 4 is among the aforementioned monomers used to form the aforementioned polymer, among the atoms that function as hydrogen bond acceptors The charge (C) of the most negatively charged atom, x 5 is used to form the x component (Debye) of the dipole moment of the aforementioned monomer of the aforementioned polymer.
並且,本發明提供一種偏光薄膜之製造方法,該偏光薄膜具備含碘之偏光件與樹脂層,且該樹脂層包含具有源自(甲基)丙烯酸酯之結構單元的聚合物;並且 前述製造方法包含以下步驟: 使利用下述式(2)算出之y2 之值小於1.3的單體聚合而獲得前述聚合物。 y2 =(0.255)x1 +(-1.57)x2 +(0.151)x3 +(-18.0)x4 +(0.0987)x5 +(-8.26) (2) 前述式(2)中,x1 係用以形成前述聚合物之單體中所含之可旋轉之鍵結數量, x2 係用以形成前述聚合物之前述單體中所含之反應點之數量, x3 係用以形成前述聚合物之前述單體的漢森溶解度參數中之極化項δP(MPa1/2 ), x4 係用以形成前述聚合物之前述單體中,作為氫鍵受體發揮功能之原子中最帶負電之原子的電荷(C), x5 係用以形成前述聚合物之前述單體之偶極矩的x成分(Debye)。In addition, the present invention provides a method of manufacturing a polarizing film, the polarizing film is provided with a polarizer containing iodine and a resin layer, and the resin layer includes a polymer having a structural unit derived from (meth)acrylate; and the foregoing manufacturing method It includes the following steps: polymerizing a monomer whose value of y 2 calculated by the following formula (2) is less than 1.3 to obtain the aforementioned polymer. y 2 =(0.255)x 1 +(-1.57)x 2 +(0.151)x 3 +(-18.0)x 4 +(0.0987)x 5 +(-8.26) (2) In the foregoing formula (2), x 1 is the number of rotatable bonds contained in the monomer used to form the aforementioned polymer, x 2 is the number of reaction points contained in the aforementioned monomer used to form the aforementioned polymer, and x 3 is used to form The polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the aforementioned monomer of the aforementioned polymer, x 4 is among the aforementioned monomers used to form the aforementioned polymer, among the atoms that function as hydrogen bond acceptors The charge (C) of the most negatively charged atom, x 5 is used to form the x component (Debye) of the dipole moment of the aforementioned monomer of the aforementioned polymer.
發明效果 根據本發明可提供一種偏光薄膜,其在高溫多濕環境下可充分抑制偏光件所含之碘往外部透出。Invention effect According to the present invention, a polarizing film can be provided, which can sufficiently suppress the iodine contained in the polarizing member from leaking to the outside under a high temperature and high humidity environment.
以下說明本發明之詳細內容,但以下說明非意將本發明限於特定之實施形態。The details of the present invention will be described below, but the following description is not intended to limit the present invention to specific embodiments.
(偏光薄膜之實施形態)
如圖1所示,本實施形態之偏光薄膜10具備有含碘之偏光件1與包含聚合物P之樹脂層2。樹脂層2所含聚合物P具有源自(甲基)丙烯酸酯之結構單元。在本說明書中,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。樹脂層2例如位於較偏光件1更靠視辨側,且直接接觸偏光件1。惟,樹脂層2與偏光件1之間亦可在不妨礙本發明效果之範圍內配置有接著劑層、易接著層等其他層。樹脂層2亦可位於較偏光件1更靠後述影像顯示面板側。換言之,偏光件1亦可位於較樹脂層2更靠視辨側。樹脂層2例如位於偏光薄膜10之最外側。此外,本說明書中,「薄膜」意指厚度較長度及寬度充分較小的構件。(Implementation form of polarizing film)
As shown in FIG. 1, the polarizing
偏光薄膜10亦可更具備有接著劑層3、透明保護薄膜(第1透明保護薄膜)4及黏著劑層5。透明保護薄膜4例如係透過接著劑層3貼合於偏光件1上。黏著劑層5例如係作為用以將偏光薄膜10貼合於後述影像顯示面板上之構件發揮功能。因此,黏著劑層5例如係於偏光薄膜10之最外側且位於較偏光件1更靠影像顯示面板側。換言之,偏光件1例如位於較黏著劑層5更靠視辨側。樹脂層2、偏光件1、接著劑層3、透明保護薄膜4及黏著劑層5例如係於積層方向上依序排列。The polarizing
本實施形態之偏光薄膜10中,利用下述式(1)算出之y1
之值小於1.3。
y1
=(0.279)x1
+(-1.51)x2
+(0.178)x3
+0.386 (1)In the polarizing
式(1)中,x1 係用以形成聚合物P之單體M所含之可旋轉之鍵結數量。x1 會成為用以預測聚合物P之分子運動受到何種程度之限制的指標。在本說明書中,「可旋轉之鍵結」係指在連結重原子間之單鍵中,排除了環結構所包含之單鍵、及連結位於末端之重原子與其他重原子之單鍵者。重原子意指氫原子及氦原子以外的其他原子,具體上可舉氮原子、氧原子等雜原子及碳原子。連結重原子間之單鍵的具體例係碳-碳鍵及碳-雜原子鍵。舉一例來說,當聚合物P係由二羥甲基-三環癸烷二丙烯酸酯形成時,x1 之值為8。可旋轉之鍵結數量亦可使用用以計算分子描述符之軟體來算出。所述軟體可舉Dragon(version7.0)、alvaDesc等。In the formula (1), x 1 is the number of rotatable bonds contained in the monomer M used to form the polymer P. x 1 will be used to predict the extent to which the molecular motion of the polymer P is restricted. In this specification, "rotatable bond" refers to the single bond connecting heavy atoms, excluding the single bond included in the ring structure and the single bond connecting the heavy atom at the terminal to other heavy atoms. Heavy atoms mean atoms other than hydrogen atoms and helium atoms, and specifically include heteroatoms such as nitrogen atoms and oxygen atoms, and carbon atoms. Specific examples of single bonds connecting heavy atoms are carbon-carbon bonds and carbon-heteroatom bonds. For example, when the polymer P is formed of dimethylol-tricyclodecane diacrylate, the value of x 1 is 8. The number of rotatable bonds can also be calculated using software used to calculate molecular descriptors. The software can be Dragon (version7.0), alvaDesc, etc.
當聚合物P係由複數種單體M形成時,可利用以下方法來特定x1 之值。首先,分別針對複數種單體M算出可旋轉之鍵結數量。針對所算出之可旋轉之鍵結數量,依各單體M之莫耳比率加權進行加權平均。可將所得加權平均值視為x1 。本實施形態中,x1 之值無特別限定,例如為2~20。When the polymer is formed from a plurality of P-based monomers M, x may be a particular value of 1 by the following method. First, calculate the number of rotatable bonds for a plurality of monomers M. The calculated number of rotatable bonds is weighted and averaged according to the molar ratio of each monomer M. The resulting weighted average can be regarded as x 1 . In this embodiment, the value of x 1 is not particularly limited, and is, for example, 2-20.
x2 係用以形成聚合物P之單體M中所含之反應點之數量。x2 會成為用以針對聚合物P預測低分子化合物可通過之程度之大小的間隙存在何種程度的指標。本說明書中,「反應點」係指可聚合之基團或可交聯之基團。該等基團之具體例可舉(甲基)丙烯醯基等具有聚合性雙鍵之基、環氧基、氧雜環丁烷基等交聯性官能基。舉一例來說,當聚合物P係由二羥甲基-三環癸烷二丙烯酸酯形成時,x2 之值為2。反應點之數量亦可使用上述用以計算分子描述符之軟體來算出。x 2 is the number of reaction points contained in the monomer M used to form the polymer P. x 2 will be used as an index for predicting the extent to which the low-molecular-weight compound can pass through the gap of the polymer P. In this specification, "reaction point" refers to a polymerizable group or a crosslinkable group. Specific examples of these groups include groups having polymerizable double bonds such as (meth)acryloyl groups, and crosslinkable functional groups such as epoxy groups and oxetanyl groups. For example, when the polymer P is formed of dimethylol-tricyclodecane diacrylate, the value of x 2 is 2. The number of reaction points can also be calculated using the software described above for calculating molecular descriptors.
當聚合物P係由複數種單體M形成時,可利用以下方法來特定x2 之值。首先,分別針對複數種單體M算出反應點之數量。針對所算出之反應點之數量,依各單體M之莫耳比率加權進行加權平均。可將所得加權平均值視為x2 。本實施形態中,x2 之值無特別限定,例如為1~6。When the polymer P is formed from a plurality of monomers M, the following method can be used to specify the value of x 2. First, calculate the number of reaction points for a plurality of monomers M. The calculated number of reaction points is weighted and averaged according to the molar ratio of each monomer M. The resulting weighted average can be regarded as x 2 . In this embodiment, the value of x 2 is not particularly limited, and is, for example, 1 to 6.
x3 係用以形成聚合物P之單體M的漢森溶解度參數中之極化項δP(MPa1/2 )。x3 會成為用以預測在聚合物P與水分子或碘之間產生之相互作用的指標。漢森溶解度參數係指將由希德布朗(Hildebrand)導入之溶解度參數分割成分散項D、極化項δP、氫鍵項δH之3成分者。極化項δP係表示分子間之偶極矩相互作用產生之能量。漢森溶解度參數的詳細內容揭示於「Hansen Solubility Parameters; A Users Handbook(CRC Press, 2007)」中。極化項δP例如可使用HSPiP(version5)等公知的軟體來算出。另,極化項δP之值有依所使用之軟體而有些微差異之情況。但,該誤差通常係在計算y1 之值時可忽略之程度的大小。x 3 is the polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the monomer M used to form the polymer P. x 3 will be used as an index to predict the interaction between the polymer P and water molecules or iodine. The Hansen solubility parameter refers to the solubility parameter imported by Hildebrand is divided into three components of dispersion term D, polarization term δP, and hydrogen bonding term δH. The polarization term δP represents the energy generated by the dipole moment interaction between molecules. The details of Hansen Solubility Parameters are disclosed in "Hansen Solubility Parameters; A Users Handbook (CRC Press, 2007)". The polarization term δP can be calculated using, for example, well-known software such as HSPiP (version 5). In addition, the value of the polarization term δP may vary slightly depending on the software used. However, the error is usually a magnitude that can be ignored when calculating the value of y 1.
當聚合物P係由複數種單體M形成時,可利用以下方法來特定x3 之值。首先,分別針對複數種單體M算出漢森溶解度參數之極化項δP(MPa1/2 )。針對所算出之極化項δP,依各單體M之莫耳比率加權進行加權平均。可將所得加權平均值視為x3 。本實施形態中,x3 之值無特別限定,例如為1~10(MPa1/2 )。x3 之值宜為6(MPa1/2 )以下,較宜為5(MPa1/2 )以下,更宜為4(MPa1/2 )以下。When the polymer is formed from a plurality of P-based monomers M, 3 may be of particular value x by the following method. First, the polarization term δP (MPa 1/2 ) of the Hansen solubility parameter is calculated for the plural monomers M. The calculated polarization term δP is weighted and averaged according to the molar ratio of each monomer M. The resulting weighted average can be regarded as x 3 . In this embodiment, the value of x 3 is not particularly limited, and is, for example, 1 to 10 (MPa 1/2 ). The value of x 3 is preferably 6 (MPa 1/2 ) or less, more preferably 5 (MPa 1/2 ) or less, and more preferably 4 (MPa 1/2 ) or less.
本實施形態之偏光薄膜10中,利用下述式(2)算出之y2
之值亦可小於1.3。
y2
=(0.255)x1
+(-1.57)x2
+(0.151)x3
+(-18.0)x4
+(0.0987)x5
+(-8.26) (2)In the
本發明之另一態樣係提供一種偏光薄膜10,其具備:含碘之偏光件1;與樹脂層2,其包含具有源自(甲基)丙烯酸酯之結構單元的聚合物P;並且該偏光薄膜利用式(2)算出之y2
之值小於1.3。Another aspect of the present invention provides a
式(2)中,x1 ~x3 與式(1)相同。因此,式(2)之x1 ~x3 之特定方法等與先前所述者相同。In formula (2), x 1 to x 3 are the same as formula (1). Therefore, the specific methods of x 1 to x 3 in formula (2) are the same as those described previously.
式(2)中,x4 係用以形成聚合物P之單體M中,作為氫鍵受體發揮功能之原子中最帶負電之原子的電荷(C)。x4 會成為用以預測在聚合物P與水分子之間產生之相互作用的指標,亦即會成為用以預測聚合物P之疏水性程度的指標。x4 之值愈接近0,愈有聚合物P呈疏水性之傾向。氫鍵受體意指可與水分子中所含氫原子形成氫鍵之原子。作為氫鍵受體發揮功能之原子可舉氧原子或氮原子等電負度較大之原子。In the formula (2), x 4 is the charge (C) of the most negatively charged atom among the atoms that function as hydrogen bond acceptors in the monomer M used to form the polymer P. x 4 will become an index for predicting the interaction between the polymer P and water molecules, that is, an index for predicting the degree of hydrophobicity of the polymer P. The closer the value of x 4 is to 0, the more the polymer P tends to be hydrophobic. A hydrogen bond acceptor means an atom that can form a hydrogen bond with a hydrogen atom contained in a water molecule. Examples of atoms functioning as hydrogen bond acceptors include oxygen atoms and nitrogen atoms, which have relatively high electronegativity.
x4 例如可利用以下方法來特定。首先,特定用以形成聚合物P之單體M。針對單體M,藉由進行分子模擬,可算出構成單體M之各原子的電荷(密立根電荷,Mulliken charge)。分子模擬例如可使用Materials Studio(BIOVIA公司製,ver.8.0.0.843)、WebMO(ver.19.0.009e)等公知軟體來進行。x 4 can be specified by the following method, for example. First, the monomer M used to form the polymer P is specified. For the monomer M, by performing molecular simulations, the charge (Mulliken charge) of each atom constituting the monomer M can be calculated. Molecular simulation can be performed using known software such as Materials Studio (manufactured by BIOVIA, ver.8.0.0.843) and WebMO (ver.19.0.009e).
分子模擬例如可藉由以下方法來進行。首先,使用Materials Studio來做出單體M之分子模型。關於分子模型,係採用COMPASS(Condensed-phase Optimized Molecular Potentials for Atomistic Simulation Studies)II之力場,將結構最佳化。接著,以WebMO處理單體M之分子模型。詳細來說,在WebMO中使用Gaussian程式(Queue:g09),針對單體M之分子模型進行結構最佳化計算。此時,可使用B3LYP作為泛函數,亦可使用6-31G(d)作為基函數。藉由以上之分子模擬,可算出構成單體M之各原子的電荷。Molecular simulation can be performed by the following method, for example. First, use Materials Studio to make a molecular model of monomer M. Regarding the molecular model, the force field of COMPASS (Condensed-phase Optimized Molecular Potentials for Atomistic Simulation Studies) II is used to optimize the structure. Next, the molecular model of monomer M is processed with WebMO. In detail, the Gaussian program (Queue:g09) is used in WebMO to perform structural optimization calculations for the molecular model of monomer M. In this case, B3LYP can be used as a generic function, and 6-31G(d) can also be used as a basis function. Through the above molecular simulation, the charge of each atom constituting the monomer M can be calculated.
接著,特定出構成單體M之原子中,作為氫鍵受體發揮功能之原子。並從所特定之原子中特定出最帶負電之原子(具有負電荷且其電荷之絕對值最大之原子)。可將該原子之電荷(C)視為x4 。此外,當單體M不具有作為氫鍵受體發揮功能之原子時,x4 可視為0。Next, among the atoms constituting the monomer M, the atoms functioning as hydrogen bond acceptors are identified. And from the specified atoms, the most negatively charged atom (the atom with the negative charge and the largest absolute value of the charge) is specified. The charge (C) of the atom can be regarded as x 4 . In addition, when the monomer M does not have an atom that functions as a hydrogen bond acceptor, x 4 can be regarded as zero.
當聚合物P係由複數種單體M形成時,可利用以下方法來特定x4 。首先,分別針對複數種單體M,藉由上述方法特定出作為氫鍵受體發揮功能之原子中,最帶負電之原子的電荷(C)。針對特定出之電荷,依各單體M之莫耳比率加權進行加權平均。可將所得加權平均值視為x4 。當複數種單體M互為結構異構物時,亦可針對特定出之電荷,依各結構異構物之莫耳比率加權進行加權平均,藉此特定出x4 。本實施形態中,x4 之值無特別限定,例如為-0.55~-0.45C。When the polymer P is formed of a plurality of monomers M, the following method can be used to specify x 4 . First, for a plurality of monomers M, the charge (C) of the most negatively charged atom among the atoms functioning as hydrogen bond acceptors is specified by the above-mentioned method. The specific charge is weighted and averaged according to the molar ratio of each monomer M. The resulting weighted average can be regarded as x 4 . When multiple monomers M are structural isomers of each other, the specific charges can also be weighted and averaged according to the molar ratio of each structural isomer, thereby specifying x 4 . In this embodiment, the value of x 4 is not particularly limited, and is, for example, -0.55 to -0.45C.
x5 係用以形成聚合物P之單體M之偶極矩的x成分(Debye)。x5 會成為用以預測在聚合物P與水分子之間產生之相互作用的指標,亦即會成為用以預測聚合物P之疏水性或加濕耐久性之程度的指標。x5 之值愈接近0,單體M之偶極矩就愈小,而有聚合物P呈疏水性之傾向。x 5 is the x component (Debye) used to form the dipole moment of the monomer M of the polymer P. x 5 will be an index used to predict the interaction between the polymer P and water molecules, that is, it will be used to predict the degree of hydrophobicity or humidification durability of the polymer P. The closer the value of x 5 is to 0, the smaller the dipole moment of the monomer M, and the polymer P tends to be hydrophobic.
x5 例如可利用以下方法來特定。首先,特定用以形成聚合物P之單體M。針對單體M,可藉由進行分子模擬算出偶極矩的x成分。分子模擬可利用先前針對x4 所記述之方法來進行。進行分子模擬時,構成單體M之各原子的內部座標係以Z矩陣(Z-matrix)形式來定義。利用Z矩陣形式時,用以決定內部座標之x軸、y軸及z軸會因應單體M之結構而自動決定。此外,偶極矩係從x成分、y成分及z成分算出之向量。x 5 can be specified by the following method, for example. First, the monomer M used to form the polymer P is specified. For monomer M, the x component of the dipole moment can be calculated by molecular simulation. Molecular simulation may be performed for the previous method described the use of x 4 Suo. When performing molecular simulations, the internal coordinates of the atoms constituting the monomer M are defined in the form of Z-matrix. When using the Z matrix form, the x-axis, y-axis, and z-axis used to determine the internal coordinates are automatically determined according to the structure of the single M. In addition, the dipole moment is a vector calculated from the x component, the y component, and the z component.
當聚合物P係由複數種單體M形成時,可利用以下方法來特定x5 。首先,分別針對複數種單體M,利用上述方法算出偶極矩的x成分。針對所算出之偶極矩的x成分,依各單體M之莫耳比率加權進行加權平均。可將所得加權平均值視為x5 。當複數種單體M互為結構異構物時,亦可針對所算出之偶極矩的x成分,依各結構異構物之莫耳比率加權進行加權平均,藉此特定出x5 。本實施形態中,x5 之值無特別限定,例如為-2.0~5.0Debye。x5 之值可為3.0Debye以下,亦可為1.0Debye以下。When the polymer P is formed of a plurality of monomers M, the following method can be used to specify x 5 . First, for a plurality of types of monomers M, the x component of the dipole moment is calculated by the above-mentioned method. For the x component of the calculated dipole moment, weighted and averaged according to the molar ratio of each monomer M. The resulting weighted average can be regarded as x 5 . When a plurality of monomers M are structural isomers with each other, the calculated dipole moment x component can also be weighted and averaged according to the molar ratio of each structural isomer, thereby specifying x 5 . In this embodiment, the value of x 5 is not particularly limited, and is, for example, -2.0 to 5.0 Debye. The value of x 5 can be 3.0 Debye or less, or 1.0 Debye or less.
利用式(1)算出之y1 之值及利用式(2)算出之y2 之值宜為0.8以下,較宜為0.7以下,更宜為0.5以下,尤宜為0.3以下。 The value of y 1 calculated by formula (1) and the value of y 2 calculated by formula (2) should be 0.8 or less, more preferably 0.7 or less, more preferably 0.5 or less, and particularly preferably 0.3 or less.
利用式(1)算出之y1
之值及利用式(2)算出之y2
之值係關於用以形成樹脂層2所含聚合物P的單體M之指標。但,根據本發明人等之檢討,y1
之值及y2
之值亦可有效作為用以選擇適於抑制偏光件1所含之碘往外部透出之樹脂層2的指標。此外,用以算出y2
之因子(x1
~x5
)之數量較用以算出y1
之因子(x1
~x3
)的數量更多。一般而言,因子的數量有影響預測式之預測性能的傾向。 The value of y 1 calculated by the formula (1) and the value of y 2 calculated by the formula (2) are indicators of the monomer M used to form the polymer P contained in the
本實施形態之偏光薄膜10中,例如下述要件(i)~(v)中至少1者成立,較佳為要件(iii)成立。偏光薄膜10中,要件(i)~(v)亦可全部成立。
(i)樹脂層2在水中於65℃下之拉伸儲存彈性模數E1為1×108
Pa以上。
(ii)樹脂層2在水中於85℃下之拉伸儲存彈性模數E2為1×108
Pa以上。
(iii)將樹脂層2從25℃加熱至65℃,並將測定氣體環境從10%RH加濕至90%RH時,樹脂層2之線膨脹係數α1為400×10-6
/K以下。
(iv)將樹脂層2從25℃加熱至85℃,並將測定氣體環境從10%RH加濕至85%RH時,樹脂層2之線膨脹係數α2為300×10-6
/K以下。
(v)用以形成樹脂層2所含聚合物P之單體M的偶極矩D為2Debye以下。In the
首先,說明要件(i)。樹脂層2之拉伸儲存彈性模數E1宜為5×108
Pa以上,較宜為10×108
Pa以上,更宜為15×108
Pa以上。拉伸儲存彈性模數E1的上限值無特別限定,由抑制在樹脂層2之裂痕之觀點來看,例如亦可為100×108
Pa。First, the requirement (i) is explained. The tensile storage elastic modulus E1 of the
樹脂層2之拉伸儲存彈性模數E1例如可利用以下方法來測定。首先,將評估對象之樹脂層2裁切成寬度5mm、長度30mm之短籤狀,做成試驗片。接著,將試驗片設於市售之動態黏彈性測定裝置。此時,使用可使試驗片浸漬於溶劑中之物作為夾具。固定試驗片之鉗夾間的距離設定為15mm。然後,使試驗片浸漬於水中。確認試驗片之溫度為25℃後,針對試驗片開始測定動態黏彈性。測定係藉由日本產業規格(JIS) K7244-4:1999所規定之拉伸振動-非共振法來進行。振動頻率設定成1Hz。從開始測定後,以5℃/分鐘之升溫速度將試驗片加熱至95℃。可將試驗片之溫度為65℃時之拉伸儲存彈性模數的測定值視為樹脂層2之拉伸儲存彈性模數E1。The tensile storage elastic modulus E1 of the
接著,說明要件(ii)。樹脂層2之拉伸儲存彈性模數E2宜為5×108
Pa以上,較宜為10×108
Pa以上,更宜為15×108
Pa以上。拉伸儲存彈性模數E2的上限值無特別限定,由抑制在樹脂層2之裂痕之觀點來看,例如亦可為100×108
Pa。樹脂層2之拉伸儲存彈性模數E2例如可藉由與拉伸儲存彈性模數E1相同之方法來測定。詳細而言,可利用先前就拉伸儲存彈性模數E1所記述之方法,針對試驗片進行動態黏彈性之測定,將試驗片之溫度為85℃時之拉伸儲存彈性模數的測定值視為樹脂層2之拉伸儲存彈性模數E2。Next, the requirement (ii) will be explained. The tensile storage elastic modulus E2 of the
接著,說明要件(iii)。樹脂層2之線膨脹係數α1宜為200×10-6
/K以下,較宜為180×10-6
/K以下,更宜為150×10-6
/K以下,尤宜為120×10-6
/K以下。線膨脹係數α1之下限值無特別限定,由抑制在樹脂層2之裂痕之觀點來看,例如亦可為10×10-6
/K。Next, the requirement (iii) will be explained. The
樹脂層2之線膨脹係數α1例如可利用以下方法來測定。首先,將評估對象之樹脂層2裁切成寬度5mm、長度30mm之短籤狀,做成試驗片。接著,將試驗片設於市售之熱機械分析定裝置。此時,固定試驗片之鉗夾間的距離設定為15mm。針對試驗片,在25℃10%RH之測定氣體環境中至少放置10分鐘。接著,耗時60分鐘將試驗片加熱至65℃,將試驗片保持10分鐘。然後,耗時30分鐘將測定氣體環境從10%RH加濕成90%RH,將試驗片保持10分鐘。根據試驗片在試驗前後之長度變化量ΔL(mm),可將從下述式(3)算出之線膨脹係數α視為樹脂層2之線膨脹係數α1。此外,式(3)中,L0
意指試驗片在25℃下之長度,ΔT意指試驗片在試驗前後之溫度變化量。要件(iii)中,ΔT為40℃。
線膨脹係數α=ΔL/(L0
×ΔT) (3)The coefficient of linear expansion α1 of the
接著,說明要件(iv)。樹脂層2之線膨脹係數α2宜為200×10-6
/K以下,較宜為170×10-6
/K以下,更宜為150×10-6
/K以下,尤宜為100×10-6
/K以下。線膨脹係數α2之下限值無特別限定,由抑制在樹脂層2之裂痕之觀點來看,例如亦可為10×10-6
/K。樹脂層2之線膨脹係數α2例如可排除耗時60分鐘將試驗片加熱至85℃、及耗時30分鐘將測定氣體環境從10%RH加濕成85%RH,藉由與上述線膨脹係數α1相同方法來測定。要件(iv)中,上述式(3)的ΔT為60℃。Next, the requirement (iv) will be explained. The
接著,說明要件(v)。用以形成聚合物P之單體M的偶極矩D宜為1.7Debye以下,較宜為1.5Debye以下,更宜為1.3Debye以下。偶極矩D之下限值無特別限定,例如為0.5Debye。Next, the requirement (v) will be explained. The dipole moment D of the monomer M used to form the polymer P is preferably 1.7 Debye or less, more preferably 1.5 Debye or less, and more preferably 1.3 Debye or less. The lower limit of the dipole moment D is not particularly limited, and is 0.5 Debye, for example.
偶極矩D例如可利用以下方法來算出。首先,特定用以形成聚合物P之單體M。針對單體M,可藉由進行分子模擬算出偶極矩D。分子模擬例如可使用Materials Studio(BIOVIA公司製,ver.8.0.0.843)、WebMO(ver.19.0.009e)等公知軟體來進行。The dipole moment D can be calculated by the following method, for example. First, the monomer M used to form the polymer P is specified. For monomer M, the dipole moment D can be calculated by molecular simulation. Molecular simulation can be performed using known software such as Materials Studio (manufactured by BIOVIA, ver.8.0.0.843) and WebMO (ver.19.0.009e).
藉由分子模擬進行之偶極矩D之計算例如可利用以下方法來進行。首先,使用Materials Studio來做出單體M之分子模型。關於分子模型,係採用COMPASS(Condensed-phase Optimized Molecular Potentials for Atomistic Simulation Studies)II之力場,將結構最佳化。接著,以WebMO處理單體M之分子模型。詳細來說,在WebMO中使用Gaussian程式(Queue:g09),針對單體M之分子模型進行結構最佳化計算。此時,可使用B3LYP作為泛函數,亦可使用6-31G(d)作為基函數。藉此,可算出單體M之偶極矩D。The calculation of the dipole moment D by molecular simulation can be performed, for example, by the following method. First, use Materials Studio to make a molecular model of monomer M. Regarding the molecular model, the force field of COMPASS (Condensed-phase Optimized Molecular Potentials for Atomistic Simulation Studies) II is used to optimize the structure. Next, the molecular model of monomer M is processed with WebMO. In detail, the Gaussian program (Queue:g09) is used in WebMO to perform structural optimization calculations for the molecular model of monomer M. In this case, B3LYP can be used as a generic function, and 6-31G(d) can also be used as a basis function. From this, the dipole moment D of the monomer M can be calculated.
當聚合物P係由複數種單體M形成時,可利用以下方法來特定偶極矩D。首先,分別針對複數種單體M,利用上述方法算出偶極矩。針對所算出之偶極矩,依各單體M之莫耳比率加權進行加權平均。可將所得加權平均值視為偶極矩D。當複數種單體M互為結構異構物時,亦可針對所算出之偶極矩,依各結構異構物之莫耳比率加權進行加權平均,藉此特定出偶極矩D。When the polymer P is formed of a plurality of monomers M, the following method can be used to specify the dipole moment D. First, for a plurality of types of monomers M, the dipole moments are calculated using the above-mentioned method. The calculated dipole moment is weighted and averaged according to the molar ratio of each monomer M. The resulting weighted average value can be regarded as the dipole moment D. When a plurality of monomers M are structural isomers of each other, the calculated dipole moment can also be weighted and averaged according to the molar ratio of each structural isomer, thereby specifying the dipole moment D.
當要件(i)及(ii)之至少1者成立時,樹脂層2所含聚合物P即使在高溫多濕環境下,仍有維持在分子運動性低之狀態的傾向。聚合物P之分子運動性若低,樹脂層2中便不易產生碘可侵入之空間。藉此,碘從偏光件1移動至樹脂層2會受到抑制,而有可抑制碘透出偏光薄膜10之外部的傾向。When at least one of the requirements (i) and (ii) is established, the polymer P contained in the
當要件(iii)及(iv)之至少1者成立時,樹脂層2所含聚合物P即使在高溫多濕環境下,仍有維持在自由體積小之狀態的傾向。聚合物P之自由體積若小,樹脂層2中便不易產生碘可侵入之空間。藉此,碘從偏光件1移動至樹脂層2會受到抑制,而有可抑制碘透出偏光薄膜10之外部的傾向。When at least one of the requirements (iii) and (iv) is established, the polymer P contained in the
要件(v)成立時,有不易在聚合物P與碘之間產生靜電性相互作用之傾向。亦即,碘不易被聚合物P吸引。藉此,碘從偏光件1移動至樹脂層2會受到抑制,而有可抑制碘透出偏光薄膜10之外部的傾向。When the requirement (v) is established, there is a tendency that electrostatic interaction between the polymer P and iodine is unlikely to occur. That is, iodine is not easily attracted by the polymer P. Thereby, the movement of iodine from the
[偏光件]
偏光件1只要含碘便無特別限定,可舉例如使聚乙烯醇系薄膜、部分縮甲醛化聚乙烯醇系薄膜、乙烯-乙酸乙烯酯共聚物系部分皂化薄膜等親水性高分子薄膜吸附碘並加以單軸延伸者等。偏光件1宜由聚乙烯醇系薄膜及碘所構成。[Polarizer]
The
偏光件1之厚度無特別限定,例如為30µm以下,宜為20µm以下,較宜為18µm以下,更宜為15µm以下,尤宜為12µm以下,特別宜為10µm以下。偏光件1之厚度可為2µm以上,可為4µm以上,亦可為5µm以上。偏光件1之厚度可為7~12µm,依情況為1~7µm,尤可為4~6µm。本說明書中,有將厚度在10µm以下之偏光件1稱為薄型偏光件之情形。薄型偏光件有厚度參差少而視辨性優異的傾向。並且,薄型偏光件還有尺寸變化受到抑制而耐久性優異的優點。藉由薄型偏光件,可將偏光薄膜10薄型化。偏光件1為薄型偏光件時,偏光薄膜10為了具有實用上充分的偏光度,必須將偏光件1之碘濃度調整地較高。本實施形態之偏光薄膜10中,即便在偏光件1之厚度小且偏光件1之碘濃度高時,仍可充分抑制碘從偏光件1透出至外部。The thickness of the
偏光件1例如可藉由將聚乙烯醇系薄膜等親水性高分子薄膜浸漬於碘之水溶液中來進行染色,並延伸成原長的3~7倍來製作。親水性高分子薄膜亦可視需求浸漬於含硼酸、碘化鉀等之水溶液中。更可視需求,針對親水性高分子薄膜,於染色前浸漬於水中進行水洗。藉由水洗親水性高分子薄膜,可洗淨附著於表面之污垢或抗黏結劑。若水洗親水性高分子薄膜,親水性高分子薄膜會膨潤,因此還具有可抑制染色不均等之效果。親水性高分子薄膜之延伸可在利用碘進行染色後進行,可一邊染色一邊進行,亦可在利用碘進行染色前進行。親水性高分子薄膜之延伸可在含硼酸、碘化鉀等之水溶液中或水中進行。The
薄型偏光件代表上可列舉日本專利特開昭51-069644號公報、日本專利特開2000-338329號公報、國際公開2010/100917號、日本專利特開2014-59328號公報、日本專利特開2012-73563號公報等中所記載之物。該等薄型偏光件可藉由包含以下步驟之製造方法來製作:將包含聚乙烯醇系樹脂(PVA系樹脂)層與延伸用樹脂基材之積層體予以延伸的步驟;及,將所得延伸薄膜進行染色的步驟。在該製造方法中,PVA系樹脂層被延伸用樹脂基材支持著,故不易產生因延伸所致之斷裂等缺陷。Representative examples of thin polarizers include Japanese Patent Application Publication No. 51-069644, Japanese Patent Application Publication No. 2000-338329, International Publication No. 2010/100917, Japanese Patent Application Publication No. 2014-59328, Japanese Patent Application Publication No. 2012 -73563 Bulletin, etc. These thin polarizers can be manufactured by a manufacturing method including the following steps: a step of stretching a laminate comprising a polyvinyl alcohol-based resin (PVA-based resin) layer and a resin substrate for stretching; and, the resulting stretched film Perform the dyeing steps. In this manufacturing method, the PVA-based resin layer is supported by the resin base material for stretching, so defects such as breakage due to stretching are less likely to occur.
薄型偏光件由可在高倍率下延伸、可提升偏光性能之觀點來看,上述製造方法中又以藉由包含在硼酸水溶液中之延伸步驟的製造方法來製作為佳,尤以藉由包含在硼酸水溶液中之延伸步驟前實施輔助性空中延伸之步驟的製造方法來製作為佳。包含在硼酸水溶液中之延伸步驟的製造方法,已揭示於國際公開2010/100917號、日本專利特開2014-59328號公報、日本專利特開2012-73563號公報等中。包含實施空中延伸之步驟的製造方法,已揭示於日本專利特開2014-59328號公報、日本專利特開2012-73563號公報等中。From the point of view that the thin polarizer can be stretched at high magnification and the polarization performance can be improved, the above-mentioned manufacturing method is preferably manufactured by the manufacturing method of the stretching step included in the boric acid aqueous solution, especially by being included in It is preferable to perform the manufacturing method of the auxiliary aerial extension step before the extension step in the boric acid aqueous solution. The manufacturing method of the extension step included in the boric acid aqueous solution has been disclosed in International Publication No. 2010/100917, Japanese Patent Application Publication No. 2014-59328, Japanese Patent Application Publication No. 2012-73563, and the like. The manufacturing method including the step of performing aerial extension has been disclosed in Japanese Patent Laid-Open No. 2014-59328, Japanese Patent Laid-Open No. 2012-73563, and the like.
[樹脂層]
只要聚合物P具有源自(甲基)丙烯酸酯之結構單元,並且利用上述式(1)算出之y1
之值或利用式(2)算出之y2
之值小於1.3,則樹脂層2及樹脂層2所含聚合物P無特別限定。[Resin layer] As long as the polymer P has a structural unit derived from (meth)acrylate, and the value of y 1 calculated by the above formula (1) or the value of y 2 calculated by the formula (2) is less than 1.3, then The
(甲基)丙烯酸酯可為具有1個(甲基)丙烯醯基之單官能(甲基)丙烯酸酯,亦可為具有2個以上(甲基)丙烯醯基之多官能(甲基)丙烯酸酯。聚合物P宜包含源自多官能(甲基)丙烯酸酯之結構單元。根據包含源自多官能(甲基)丙烯酸酯之結構單元的聚合物P,有可更抑制碘從偏光件1移動至樹脂層2之傾向。多官能(甲基)丙烯酸酯所含(甲基)丙烯醯基之數量無特別限定,例如為2~6,宜為2~4。多官能(甲基)丙烯酸酯所含(甲基)丙烯醯基之數量若過多,則有聚合物P中會殘存未反應之(甲基)丙烯醯基之情形。The (meth)acrylate can be a monofunctional (meth)acrylate having one (meth)acrylic acid group, or a multifunctional (meth)acrylic acid having two or more (meth)acrylic acid groups ester. The polymer P preferably contains structural units derived from polyfunctional (meth)acrylates. According to the polymer P containing the structural unit derived from the polyfunctional (meth)acrylate, there is a tendency that the migration of iodine from the
(甲基)丙烯酸酯中之(甲基)丙烯醯基以外之部分(以下有稱為酯部分之情形)的碳數無特別限定,例如為1~18,宜為4~10。酯部分亦可包含有環結構。環結構可包含氮原子、氧原子等雜原子,惟宜僅由脂環式烴所構成。環結構可為三環癸烷等縮合環結構,亦可為環己烷等單環結構。並且,環結構亦可為內酯環。酯部分亦可包含有醚基等官能基。The carbon number of the part other than the (meth)acryloyl group in the (meth)acrylate (hereinafter referred to as the ester part) is not particularly limited. For example, it is 1-18, preferably 4-10. The ester moiety may also contain a ring structure. The ring structure may contain heteroatoms such as nitrogen atoms and oxygen atoms, but is preferably composed only of alicyclic hydrocarbons. The ring structure may be a condensed ring structure such as tricyclodecane or a monocyclic structure such as cyclohexane. In addition, the ring structure may be a lactone ring. The ester moiety may also contain functional groups such as ether groups.
(甲基)丙烯酸酯亦可包含有極性基,但宜不含極性基。本說明書中,極性基意指包含氫原子與氧原子、氮原子等雜原子之鍵結的基團。極性基可舉例如羥基、羧基、1級胺基及2級胺基。The (meth)acrylate may also contain a polar group, but preferably does not contain a polar group. In this specification, a polar group means a group containing a bond between a hydrogen atom and a heteroatom such as an oxygen atom and a nitrogen atom. Examples of the polar group include a hydroxyl group, a carboxyl group, a primary amino group, and a secondary amino group.
(甲基)丙烯酸酯可舉例如:(甲基)丙烯酸二環戊酯、(甲基)丙烯酸4-三級丁基環己酯、(甲基)丙烯酸月桂酯、5-(甲基)丙烯醯氧基-2,6-降莰烷碳內酯、(甲基)丙烯酸3,3,5-三甲基環己酯、(甲基)丙烯酸4-三級丁基苯酯、(甲基)丙烯酸異莰酯、1-金剛烷基(甲基)丙烯酸酯、2-金剛烷基(甲基)丙烯酸酯、2-甲基-2-金剛烷基(甲基)丙烯酸酯、2-乙基-2-金剛烷基(甲基)丙烯酸酯、2-異丙基-2-金剛烷基(甲基)丙烯酸酯、(甲基)丙烯酸4-聯苯酯、(甲基)丙烯酸1-萘酯、(甲基)丙烯酸2-萘酯、(甲基)丙烯酸1-蒽酯、(甲基)丙烯酸1-蒽甲酯、(甲基)丙烯酸9-蒽甲酯等單官能(甲基)丙烯酸酯;二羥甲基-三環癸烷二(甲基)丙烯酸酯、1,3-金剛烷二醇二(甲基)丙烯酸酯、1,3,5-金剛烷三醇-1,5-二(甲基)丙烯酸酯、9,9-雙[4-(2-(甲基)丙烯醯氧基乙氧基)苯基]茀等2官能(甲基)丙烯酸酯;三羥甲丙烷三(甲基)丙烯酸酯、甘油三(甲基)丙烯酸酯、1,3,5-金剛烷三醇三(甲基)丙烯酸酯等3官能(甲基)丙烯酸酯;新戊四醇四(甲基)丙烯酸酯等4官能(甲基)丙烯酸酯;二新戊四醇六(甲基)丙烯酸酯等6官能(甲基)丙烯酸酯等。Examples of (meth)acrylates include: dicyclopentyl (meth)acrylate, 4-tert-butylcyclohexyl (meth)acrylate, lauryl (meth)acrylate, 5-(meth)propylene Anoxy-2,6-norbornane carbolactone, 3,3,5-trimethylcyclohexyl (meth)acrylate, 4-tert-butylphenyl (meth)acrylate, (methyl) ) Isobornyl acrylate, 1-adamantyl (meth)acrylate, 2-adamantyl (meth)acrylate, 2-methyl-2-adamantyl (meth)acrylate, 2-ethyl 2-adamantyl (meth)acrylate, 2-isopropyl-2-adamantyl (meth)acrylate, 4-biphenyl (meth)acrylate, 1-(meth)acrylate Naphthyl ester, 2-naphthyl (meth)acrylate, 1-anthracene (meth)acrylate, 1-anthracene methyl (meth)acrylate, 9-anthracene methyl (meth)acrylate and other monofunctional (methyl) ) Acrylate; Dimethylol-tricyclodecane di(meth)acrylate, 1,3-adamantanediol di(meth)acrylate, 1,3,5-adamantantriol-1, 2-functional (meth)acrylates such as 5-di(meth)acrylate, 9,9-bis[4-(2-(meth)acryloyloxyethoxy)phenyl]茀; trimethylol Propane tri (meth) acrylate, glycerol tri (meth) acrylate, 1,3,5-adamantane triol tri (meth) acrylate and other trifunctional (meth) acrylates; neopentaerythritol tetra 4-functional (meth)acrylates such as (meth)acrylate; 6-functional (meth)acrylates such as dineopentaerythritol hexa(meth)acrylate, etc.
聚合物P宜包含源自(甲基)丙烯酸酯之結構單元作為主成分,且實質上由源自(甲基)丙烯酸酯之結構單元構成為佳。本說明書中,「主成分」意指聚合物P中以重量基準計包含最多的結構單元。聚合物P中之源自(甲基)丙烯酸酯之結構單元的含有率例如為50重量%以上,宜高於70重量%,較宜為80重量%以上,更宜為90重量%以上,尤宜為95重量%以上,特別宜為99重量%以上。The polymer P preferably contains a (meth)acrylate-derived structural unit as a main component, and is substantially composed of a (meth)acrylate-derived structural unit. In this specification, the "main component" means the most structural unit contained in the polymer P on a weight basis. The content of the (meth)acrylate-derived structural unit in the polymer P is, for example, 50% by weight or more, preferably more than 70% by weight, more preferably 80% by weight or more, and more preferably 90% by weight or more, especially It is preferably 95% by weight or more, and particularly preferably 99% by weight or more.
聚合物P亦可更包含有源自(甲基)丙烯酸酯以外之其他自由基聚合性單體的結構單元、或源自(甲基)丙烯酸酯以外之其他陰離子性單體的結構單元。並且,聚合物P亦可包含有源自陽離子聚合性單體之結構單元。The polymer P may further include structural units derived from other radically polymerizable monomers other than (meth)acrylate, or structural units derived from other anionic monomers other than (meth)acrylate. In addition, the polymer P may contain a structural unit derived from a cationically polymerizable monomer.
(甲基)丙烯酸酯以外之其他自由基聚合性單體可舉苯乙烯系化合物。苯乙烯系化合物例如包含芳香環及1種以上乙烯基。與(甲基)丙烯酸酯同樣地,苯乙烯系化合物亦可包含有極性基,但宜不含極性基。作為苯乙烯系化合物,可舉例如苯乙烯、α-甲基苯乙烯、乙烯基苄基氯、丁氧基苯乙烯、乙烯基吡啶等。Examples of radical polymerizable monomers other than (meth)acrylate include styrene-based compounds. The styrene-based compound includes, for example, an aromatic ring and one or more kinds of vinyl groups. Like (meth)acrylates, the styrenic compound may also contain a polar group, but preferably does not contain a polar group. Examples of styrene-based compounds include styrene, α-methylstyrene, vinylbenzyl chloride, butoxystyrene, vinylpyridine, and the like.
陽離子聚合性單體可舉例如乙烯基醚化合物、環氧化合物及氧雜環丁烷化合物。作為乙烯基醚化合物可舉例如:甲基乙烯基醚、乙基乙烯基醚、丁基乙烯基醚、環己基乙烯基醚等脂肪族乙烯基醚;苯基乙烯基醚、2-苯氧基乙基乙烯基醚、對甲氧苯基乙烯基醚等芳香族乙烯基醚;丁二醇-1,4-二乙烯基醚、三乙二醇二乙烯基醚、二丙二醇二乙烯基醚等多官能乙烯基醚等。Examples of the cationically polymerizable monomer include vinyl ether compounds, epoxy compounds, and oxetane compounds. Examples of vinyl ether compounds include aliphatic vinyl ethers such as methyl vinyl ether, ethyl vinyl ether, butyl vinyl ether, and cyclohexyl vinyl ether; phenyl vinyl ether, 2-phenoxy Aromatic vinyl ethers such as ethyl vinyl ether and p-methoxyphenyl vinyl ether; butanediol-1,4-divinyl ether, triethylene glycol divinyl ether, dipropylene glycol divinyl ether, etc. Multifunctional vinyl ether, etc.
環氧化合物可舉例如芳香族環氧化合物、脂環式環氧化合物及脂肪族環氧化合物。芳香族環氧化合物可舉例如:雙酚A、雙酚F、雙酚S等雙酚之二環氧丙基醚化合物(雙酚型環氧樹脂);苯酚酚醛環氧樹脂、甲酚酚醛環氧樹脂及羥基苯甲醛苯酚酚醛環氧樹脂等酚醛型環氧樹脂;四羥苯基甲烷、四羥基二苯基酮、聚乙烯苯酚等多元醇之環氧丙基醚化合物等。Examples of epoxy compounds include aromatic epoxy compounds, alicyclic epoxy compounds, and aliphatic epoxy compounds. Examples of aromatic epoxy compounds include: diglycidyl ether compounds of bisphenols (bisphenol type epoxy resins) such as bisphenol A, bisphenol F, and bisphenol S; phenol novolac epoxy resin, cresol novolac ring Novolac epoxy resins such as oxygen resin and hydroxybenzaldehyde phenol novolac epoxy resin; glycidyl ether compounds of polyhydric alcohols such as tetrahydroxyphenylmethane, tetrahydroxydiphenylketone, polyvinylphenol, etc.
脂環式環氧化合物可舉例如:乙烯基環己烯二氧化物、3’,4’-環氧環己基甲基-3,4-環氧環己烷羧酸酯、薴二氧化物、雙(3,4-環氧環己基甲基)己二酸酯、二環戊二烯二環氧化物、雙環壬二烯二環氧化物、三環戊二烯二環氧化物、十二氫-2,6-甲橋-2H-環氧乙烷并[3’,4’]環戊并[1’,2’:6,7]萘并[2,3-b]環氧乙烷等。Examples of the alicyclic epoxy compound include: vinyl cyclohexene dioxide, 3',4'-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate, azulene dioxide, Bis(3,4-epoxycyclohexylmethyl) adipate, dicyclopentadiene diepoxide, dicyclononadiene diepoxide, tricyclopentadiene diepoxide, dodecahydro -2,6-methyl bridge-2H-oxirano[3',4']cyclopenta[1',2':6,7]naphtho[2,3-b]oxirane etc. .
脂肪族環氧化合物可舉:1,4-丁二醇二環氧丙基醚、1,6-己二醇二環氧丙基醚、丙三醇三環氧丙基醚、三羥甲丙烷三環氧丙基醚、乙二醇二環氧丙基醚、丙二醇二環氧丙基醚、新戊二醇二環氧丙基醚、聚乙二醇二環氧丙基醚等。Aliphatic epoxy compounds include: 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane Triglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, polyethylene glycol diglycidyl ether, etc.
氧雜環丁烷化合物可舉:3-乙基-3-羥甲基氧雜環丁烷、1,4-雙[(3-乙基-3-氧雜環丁烷基)甲氧基甲基]苯、3-乙基-3-(苯氧基甲基)氧雜環丁烷、雙[(3-乙基-3-氧雜環丁烷基)甲基]醚、3-乙基-3-(2-乙基己氧基甲基)氧雜環丁烷等。Examples of the oxetane compound include: 3-ethyl-3-hydroxymethyloxetane, 1,4-bis[(3-ethyl-3-oxetanyl)methoxymethyl Base]benzene, 3-ethyl-3-(phenoxymethyl)oxetane, bis[(3-ethyl-3-oxetanyl)methyl]ether, 3-ethyl -3-(2-ethylhexyloxymethyl)oxetane and the like.
聚合物P宜包含源自多官能單體之結構單元。多官能單體可舉例如上述多官能(甲基)丙烯酸酯、多官能乙烯基醚化合物、多官能環氧化合物、多官能氧雜環丁烷化合物等。聚合物P中之源自多官能單體之結構單元的含有率例如為20重量%以上,宜為40重量%以上,較宜為50重量%以上,依情況亦可為70重量%以上。源自多官能單體之結構單元的含有率的上限值無特別限定,例如為95重量%。The polymer P preferably contains structural units derived from multifunctional monomers. Examples of the polyfunctional monomer include the aforementioned polyfunctional (meth)acrylates, polyfunctional vinyl ether compounds, polyfunctional epoxy compounds, and polyfunctional oxetane compounds. The content of the structural unit derived from the polyfunctional monomer in the polymer P is, for example, 20% by weight or more, preferably 40% by weight or more, more preferably 50% by weight or more, and may be 70% by weight or more depending on the situation. The upper limit of the content rate of the structural unit derived from a polyfunctional monomer is not specifically limited, For example, it is 95 weight%.
聚合物P亦可包含有源自具有極性基之單體的結構單元,惟不含為佳。當聚合物P包含源自具有極性基之單體的結構單元時,有偏光件1中所含之碘容易接近樹脂層2之傾向。因此,聚合物P中之源自具有極性基之單體的結構單元的含有率宜為20重量%以下,較宜為10重量%以下,更宜為5重量%以下,尤宜為2重量%以下。The polymer P may also contain a structural unit derived from a monomer having a polar group, but it is better not to contain it. When the polymer P contains a structural unit derived from a monomer having a polar group, the iodine contained in the
樹脂層2例如包含聚合物P作為主成分。樹脂層2中之聚合物P之含有率例如為50重量%以上,宜為70重量%以上,較宜為90重量%以上,更宜為95重量%以上。樹脂層2宜實質上僅由聚合物P構成。惟,樹脂層2除聚合物P外,亦可包含有抗靜電劑、抗氧化劑、無機粒子、調平劑等添加劑。The
樹脂層2之厚度無特別限定,例如為10µm以下,宜為5µm以下,較宜為3µm以下。由充分抑制偏光件1所含之碘往外部透出的觀點來看,樹脂層2之厚度宜為0.3µm以上,亦可為0.5µm以上。The thickness of the
樹脂層2亦可透過接著劑層或易接著層貼合於偏光件1上。用以將樹脂層2貼合於偏光件1之接著劑層可舉例如針對後述接著劑層3所例示者。易接著層可由包含具有例如下述骨架的聚合物之樹脂形成:聚酯骨架、聚醚骨架、聚碳酸酯骨架、聚胺甲酸酯骨架、聚矽氧系、聚醯胺骨架、聚醯亞胺骨架、聚乙烯醇骨架等。樹脂所含聚合物可為1種亦可為2種以上。易接著層亦可包含有添加劑。添加劑可舉例如增黏劑、紫外線吸收劑、抗氧化劑、耐熱穩定劑等之穩定劑等。易接著層之厚度無特別限定,宜為0.01~5µm,較宜為0.02~2µm,更宜為0.05~1µm。易接著層亦可為複數層之積層體。The
[接著劑層]
接著劑層3係包含接著劑之層。接著劑的材料無特別限定,可使用公知的材料。接著劑層3所含接著劑可舉例如水系接著劑及活性能量線硬化型接著劑。活性能量線硬化型接著劑可使用例如日本專利特開2019-147865號、日本專利特開2016-177248號等所揭示之物。[Adhesive layer]
The
接著劑層3之厚度無特別限定,例如為3.0µm以下,宜為0.01~3.0µm,較宜為0.1~2.5µm,更宜為0.5~1.5µm。接著劑層3之厚度過小時,接著劑層3之凝集力會不足,有剝離力降低之情形。接著劑層3之厚度過大時,若於偏光薄膜10之截面施加應力,有於接著劑層3發生剝離之情形。亦即,有於偏光薄膜10發生衝擊造成之剝落不良之情形。The thickness of the
[透明保護薄膜]
透明保護薄膜4宜為透明性、機械強度、熱穩定性、水分阻斷性、各向同性等優異者。透明保護薄膜4之材料可舉例如:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系聚合物;二醋酸纖維素、三醋酸纖維素等纖維素系聚合物;聚甲基丙烯酸甲酯等(甲基)丙烯酸系聚合物;聚苯乙烯、丙烯腈-苯乙烯共聚物(AS樹脂)等苯乙烯系聚合物;聚碳酸酯系聚合物;聚乙烯、聚丙烯、乙烯-丙烯共聚物等烯烴系聚合物;聚降莰烯等環狀烯烴系聚合物;氯乙烯系聚合物;尼龍、芳香族聚醯胺等醯胺系聚合物;醯亞胺系聚合物;碸系聚合物;聚醚碸系聚合物;聚醚醚酮系聚合物;聚伸苯硫系聚合物;乙烯醇系聚合物;二氯亞乙烯系聚合物;乙烯醇縮丁醛聚合物;芳酯系聚合物;聚甲醛系聚合物;環氧系聚合物;該等聚合物之混合物等。[Transparent protective film]
The transparent
透明保護薄膜4宜包含上述聚合物中作為熱塑性樹脂發揮功能之聚合物。透明保護薄膜4中之熱塑性樹脂的含有率宜為50重量%~100重量%,較宜為50重量%~99重量%,更宜為60重量%~98重量%,尤宜為70重量%~97重量%。透明保護薄膜4中之熱塑性樹脂的含有率低於50重量%時,有無法充分顯現熱塑性樹脂原有的高透明性等功能之情形。The transparent
透明保護薄膜亦可包含有1種以上添加劑。添加劑可舉例如紫外線吸收劑、抗氧化劑、滑劑、塑化劑、脫模劑、抗著色劑、阻燃劑、成核劑、抗靜電劑、顏料、著色劑等。The transparent protective film may also contain one or more additives. Examples of additives include ultraviolet absorbers, antioxidants, slip agents, plasticizers, mold release agents, anti-coloring agents, flame retardants, nucleating agents, antistatic agents, pigments, colorants, and the like.
透明保護薄膜4亦可為日本專利特開2001-343529號公報、國際公開01/37007號等所記載之聚合物薄膜。該聚合物薄膜之材料可舉例如包含於側鏈具有取代及/或非取代醯亞胺基之熱塑性樹脂、與於側鏈具有取代及/或非取代苯基、以及腈基之熱塑性樹脂的樹脂組成物。該聚合物薄膜之具體例可舉由包含由異丁烯及N-甲基馬來醯亞胺所構成之交替共聚物與丙烯腈-苯乙烯共聚物之樹脂組成物所形成的薄膜。該薄膜例如可藉由將樹脂組成物混合擠製來獲得。該薄膜由於相位差小、光彈性係數小,故能消除偏光薄膜10因應變所造成的不均等不良狀況。並且該薄膜的透濕度小,故在多濕環境下之耐久性佳。The transparent
透明保護薄膜4之透濕度無特別限定,宜為150g/m2
/24h以下。此時,可抑制空氣中的水分侵入偏光薄膜10之內部,而可抑制偏光薄膜10之水分率的變化。藉此,可在保存時等抑制偏光薄膜10發生捲曲或尺寸變化。形成透濕度低之透明保護薄膜4的材料可舉例如:聚酯系聚合物、聚碳酸酯系聚合物、芳酯系聚合物、醯胺系聚合物、烯烴系聚合物、環狀烯烴系聚合物、(甲基)丙烯酸系聚合物及該等之混合物。形成透明保護薄膜4之材料宜為聚碳酸酯系聚合物、環狀烯烴系聚合物及(甲基)丙烯酸系聚合物,且以環狀烯烴系聚合物及(甲基)丙烯酸系聚合物尤佳。The moisture permeability of the transparent
透明保護薄膜4之厚度無特別限定,惟由強度、處置性等觀點來看,宜為5~100µm,10~60µm較佳,13~40µm更佳。The thickness of the transparent
透明保護薄膜4之表面亦可為了提升構件間之密著性而施行有電暈處理、電漿處理等易接著處理。透明保護薄膜4之表面上亦可配置有易接著層。作為易接著層可使用先前針對樹脂層2所記述之物。The surface of the transparent
[黏著劑層]
黏著劑層5係包含黏著劑之層。黏著劑之材料無特別限定,可使用例如包含(甲基)丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺甲酸酯、聚醯胺、聚醚、氟系聚合物、橡膠系聚合物等作為基底聚合物者。尤其包含(甲基)丙烯酸系聚合物之丙烯酸系黏著劑的光學透明性優異,具有適當之濡濕性、凝集性、接著性等黏著特性且耐候性、耐熱性等優異,因此適於黏著劑層5之材料。[Adhesive layer]
The
黏著劑層5亦可為具有不同組成之複數層之積層體。黏著劑層5之厚度係因應使用目的、接著力等來適當決定,例如為1~500µm,宜為1~200µm,且1~100µm較佳。黏著劑層5之厚度亦可為50µm以下。The
在偏光薄膜10貼合於影像顯示面板前,黏著劑層5亦可已與分離件貼合。藉由分離件,可防止黏著劑層5之汙染。作為分離件可使用例如針對塑膠薄膜、橡膠片、紙、布、不織布、網狀物、發泡片、金屬箔及該等之積層體等薄膜,因應需要以聚矽氧系、長鏈烷基系、氟系、硫化鉬等剝離劑進行塗佈處理者。Before the
[其他構件]
偏光薄膜10亦可更具備有上述構件以外之其他構件。偏光薄膜10例如亦可更具備有位於較樹脂層2更靠視辨側之透明基板。透明基板亦可位於偏光薄膜10之最外側。透明基板例如係以玻璃或聚合物所構成。構成透明基板之聚合物可舉例如聚對苯二甲酸乙二酯、聚環烯烴、聚碳酸酯等。以玻璃構成之透明基板之厚度例如為0.1mm~1mm。以聚合物構成之透明基板之厚度例如為10µm~200µm。[Other components]
The
透明基板例如係透過OCA(光學透明膠,optical clear adhesive)層而與樹脂層2貼合。作為OCA層可使用例如先前針對黏著劑層5所記述之物。OCA層之厚度宜為150µm以下。The transparent substrate is bonded to the
偏光薄膜10亦可更具備有反射板、反透射板、相位差薄膜、視角補償薄膜、增亮薄膜等之光學薄膜。相位差薄膜例如包含1/2波長板、1/4波長板等。偏光薄膜10中,相位差薄膜可配置於較偏光件1更靠影像顯示面板側(例如黏著劑層5與透明保護薄膜4之間),亦可配置於較偏光件1更靠視辨側。The
偏光薄膜10亦可更具備有硬塗層、抗反射層、抗黏層、擴散層、防眩層等機能層。偏光薄膜10中,硬塗層亦可配置於較樹脂層2更靠視辨側。The
[偏光薄膜之製造方法]
偏光薄膜10之製造方法無特別限定,例如包含以下步驟:使利用上述式(1)算出之y1
之值小於1.3之單體M聚合,而獲得聚合物P。偏光薄膜10之製造方法亦可包含有以下步驟來取代上述步驟:使利用上述式(2)算出之y2
之值小於1.3之單體M聚合,而獲得聚合物P。詳細而言,偏光薄膜10可利用以下方法製造。首先,透過接著劑層3貼合偏光件1與透明保護薄膜4。接著,準備包含上述單體M與聚合引發劑之塗佈液。聚合引發劑可因應塗佈液所含單體M來適當選擇。聚合引發劑宜為光聚合引發劑。塗佈液包含陽離子聚合性單體時,亦可使用光酸產生劑作為聚合引發劑。[Method for manufacturing polarizing film] The method for manufacturing
作為光聚合引發劑,可舉例如二苯基乙二酮(benzil)、二苯基酮、苯甲醯苯甲酸、3,3’-二甲基-4-甲氧基二苯基酮等二苯基酮系化合物;4-(2-羥基乙氧基)苯基(2-羥-2-丙基)酮、α-羥-α,α’-二甲基苯乙酮、2-甲-2-羥基苯丙酮、α-羥基環己基苯基酮等芳香族酮化合物;甲氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基苯乙酮、2-甲-1-[4-(甲硫基)-苯基]-2-嗎福林基丙-1-酮等的苯乙酮系化合物;苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻異丙基醚、苯偶姻丁基醚、大茴香偶姻甲基醚等的苯偶姻醚系化合物;苄基二甲縮酮等芳香族縮酮系化合物;2-萘磺醯氯等芳香族磺醯氯系化合物;1-苯酮-1,1-丙二酮-2-(鄰乙氧基羰基)肟等的光活性肟系化合物;9-氧硫𠮿、2-氯9-氧硫𠮿、2-甲基9-氧硫𠮿、2,4-二甲基9-氧硫𠮿、異丙基-9-氧硫𠮿、2,4-二氯9-氧硫𠮿、2,4-二乙基9-氧硫𠮿、2,4-二異丙基9-氧硫𠮿、十二基9-氧硫𠮿等的9-氧硫𠮿系化合物;樟腦醌;鹵化酮;醯基氧化膦;醯基膦酸酯等。As the photopolymerization initiator, for example, diphenyl ethylene dione (benzil), diphenyl ketone, benzoic acid, 3,3'-dimethyl-4-methoxydiphenyl ketone, etc. Phenyl ketone compounds; 4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl) ketone, α-hydroxy-α,α'-dimethylacetophenone, 2-methyl- Aromatic ketone compounds such as 2-hydroxypropiophenone and α-hydroxycyclohexyl phenyl ketone; methoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethyl Acetophenone compounds such as oxyacetophenone, 2-methyl-1-[4-(methylthio)-phenyl]-2-morpholinylpropan-1-one; benzoin methyl ether , Benzoin ethyl ether, benzoin isopropyl ether, benzoin butyl ether, anisin methyl ether and other benzoin ether compounds; benzyl dimethyl ketal and other aromatic ketals Compounds; Aromatic sulfonyl chloride compounds such as 2-naphthalenesulfonyl chloride; Photoactive oxime compounds such as 1-phenone-1,1-propanedione-2-(o-ethoxycarbonyl)oxime; 9 -Oxygen Sulfur𠮿 , 2-chloro-9-oxysulfur 𠮿 , 2-Methyl 9-oxysulfur 𠮿 , 2,4-Dimethyl 9-oxysulfur 𠮿 , Isopropyl-9-oxysulfur 𠮿 , 2,4-Dichloro 9-oxysulfur 𠮿 , 2,4-Diethyl 9-oxysulfur 𠮿 , 2,4-Diisopropyl 9-oxysulfur 𠮿 , Dodecyl 9-oxysulfur 𠮿 Waiting for 9-oxysulfur 𠮿 Series compounds; camphorquinone; halogenated ketones; acyl phosphine oxide; acyl phosphonate and the like.
光酸產生劑可舉例如下述式(i)所示化合物。 L+ X- (i)Examples of the photoacid generator include compounds represented by the following formula (i). L + X - (i)
式(i)中,L+ 係鎓陽離子;X- 係選自於由PF6 - 、SbF6 - 、AsF6 - 、SbCl6 - 、BiCl5 - 、SnCl6 - 、ClO4 - 、二硫胺甲酸鹽陰離子及SCN- 所構成群組中之相對陰離子。In the formula (i), L +-based cation; X - is selected from consisting of PF 6 -, SbF 6 -, AsF 6 -, SbCl 6 -, BiCl 5 -, SnCl 6 -, ClO 4 -, two thiamin The relative anion in the group consisting of formate anion and SCN -.
光酸產生劑之具體例可舉例如「Cyracure-UVI-6992」、「Cyracure-UVI-6974」(以上為陶氏化學(Dow Chemical)日本股份公司製)、「ADEKA OPTOMER SP150」、「ADEKA OPTOMER SP152」、「ADEKA OPTOMER SP170」、「ADEKA OPTOMER SP172」(以上為股份公司艾迪科(ADEKA)製)、「IRGACURE250」(汽巴精化(Ciba Specialty Chemicals)公司製)、「CI-5102」、「CI-2855」(以上為日本曹達公司製)、「SANEIDO SI-60L」、「SANEIDO SI-80L」、「SANEIDO SI-100L」、「SANEIDO SI-110L」、「SANEIDO SI-180L」(以上為三新化學公司製)、「CPI-100P」、「CPI-100A」(以上為三亞普羅(SAN-APRO)股份公司製)、「WPI-069」、「WPI-113」、「WPI-116」、「WPI-041」、「WPI-044」、「WPI-054」、「WPI-055」、「WPAG-281」、「WPAG-567」、「WPAG-596」(以上為和光純藥公司製)。Specific examples of photoacid generators include "Cyracure-UVI-6992", "Cyracure-UVI-6974" (the above are manufactured by Dow Chemical Japan Co., Ltd.), "ADEKA OPTOMER SP150", and "ADEKA OPTOMER SP152", "ADEKA OPTOMER SP170", "ADEKA OPTOMER SP172" (the above are manufactured by ADEKA Co., Ltd.), "IRGACURE250" (manufactured by Ciba Specialty Chemicals), "CI-5102" , "CI-2855" (The above is made by Soda Corporation of Japan), "SANEIDO SI-60L", "SANEIDO SI-80L", "SANEIDO SI-100L", "SANEIDO SI-110L", "SANEIDO SI-180L" ( The above is manufactured by Sanxin Chemical Co., Ltd.), "CPI-100P", "CPI-100A" (The above is manufactured by Sanya Pro (SAN-APRO) Co., Ltd.), "WPI-069", "WPI-113", "WPI- 116", "WPI-041", "WPI-044", "WPI-054", "WPI-055", "WPAG-281", "WPAG-567", "WPAG-596" (the above are Wako Pure Chemical Company system).
塗佈液中之聚合引發劑的含有率例如為20重量%以下,宜為0.01~20重量%,較宜為0.05~10重量%,更宜為0.1~5重量%。The content of the polymerization initiator in the coating liquid is, for example, 20% by weight or less, preferably 0.01 to 20% by weight, more preferably 0.05 to 10% by weight, and more preferably 0.1 to 5% by weight.
接著,將塗佈液塗佈於偏光件1上。藉此,可將包含單體M及聚合引發劑之膜(塗膜)形成於偏光件1上。接著,使單體M聚合,以由塗膜形成樹脂層2。單體M之聚合可利用公知方法來進行。例如,在使用光聚合引發劑或光酸產生劑作為聚合引發劑時,可藉由對塗膜照射活性能量線使單體M聚合。活性能量線可舉例如可見光線及紫外線。本說明書中,有將藉由使塗膜所含單體M聚合而製作出之樹脂層2稱為硬化樹脂層之情形。接著,於透明保護薄膜4貼合黏著劑層5,藉此可獲得偏光薄膜10。Next, the coating liquid is coated on the
樹脂層2亦可藉由以下方法來製作。首先,使單體M聚合而獲得聚合物P。將所得聚合物P添加於溶劑中而製作塗佈液。溶劑可舉例如可使聚合物P溶解或分散之有機溶劑。接著,藉由將塗佈液塗佈於偏光件1上來製作塗膜。藉由使塗膜乾燥,可獲得樹脂層2。The
[偏光薄膜之特性]
以本實施形態之偏光薄膜10來說,在高溫多濕環境下能充分抑制偏光件1所含之碘往外部透出。亦即,在高溫多濕環境下偏光件1之碘濃度幾乎無變化。偏光件1中之碘濃度的變化例如可從偏光薄膜10之單體透射率的變化讀取。舉一例來說,在透過黏著劑層5將偏光薄膜10貼合於無鹼玻璃之狀態下,將偏光薄膜10放置於65℃90%RH之氣體環境下24小時後,偏光薄膜10之單體透射率的變化ΔY1例如為5以下,宜為4以下,2以下較佳,1.5以下更佳,1以下尤佳。[Characteristics of Polarizing Film]
Taking the
單體透射率的變化ΔY1具體上可利用以下方法來測定。首先,測定透過黏著劑層5將偏光薄膜10貼合於無鹼玻璃上而得之積層體的單體透射率Ts1。接著,將該積層體放置在65℃90%RH之氣體環境下24小時。針對放置於該氣體環境下後之積層體測定單體透射率Ts2。將從單體透射率Ts2減去單體透射率Ts1後所得之值視為單體透射率之變化ΔY1。此外,積層體之單體透射率係以JIS Z8701-1999之2度視野(C光源)進行視感度校正所得之Y值。單體透射率可使用村上色彩技術研究所製之DOT-3等市售之分光光度計來測定。單體透射率的測定波長為380~700nm(每10nm)。無鹼玻璃係實質上不含鹼成分(鹼金屬氧化物)的玻璃,詳細來說玻璃中之鹼成分之重量比率例如為1000ppm以下,更宜為500ppm以下。無鹼玻璃例如為板狀,具有0.5mm以上之厚度。Specifically, the change in transmittance ΔY1 of the monomer can be measured by the following method. First, the monomer transmittance Ts1 of the laminate obtained by bonding the
單體透射率Ts1無特別限定,例如為42%~46%,宜為43%以上,較宜為44%以上。單體透射率Ts2無特別限定,例如為42%~48%,宜為47%以下,較宜為46%以下。The monomer transmittance Ts1 is not particularly limited. For example, it is 42% to 46%, preferably 43% or more, and more preferably 44% or more. The monomer transmittance Ts2 is not particularly limited. For example, it is 42% to 48%, preferably 47% or less, and more preferably 46% or less.
(偏光薄膜之變形例)
偏光薄膜10中,樹脂層2亦可位於較偏光件1更靠後述影像顯示面板側。如圖2所示,本變形例之偏光薄膜11中,樹脂層2位於較偏光件1更靠影像顯示面板側。除了樹脂層2之位置外,偏光薄膜11之結構係與偏光薄膜10之結構相同。因此,偏光薄膜10與變形例之偏光薄膜11中共通之要素有賦予相同參照符號並省略該等說明之情形。即,以下與各實施形態相關之說明只要技術上不矛盾,便可相互應用。以下各實施形態只要技術上不矛盾,亦可相互組合。(Modification of Polarizing Film)
In the
樹脂層2例如位於偏光件1與接著劑層3之間,且分別直接接觸偏光件1及接著劑層3。惟,樹脂層2與偏光件1之間亦可配置有接著劑層、易接著層等其他層。例如,樹脂層2亦可透過接著劑層或易接著層貼合於偏光件1上。作為用以將樹脂層2貼合於偏光件1之接著劑層及易接著層,可舉先前針對偏光薄膜10所記述者。樹脂層2位於較偏光件1更靠影像顯示面板側時,在高溫多濕環境下,可抑制偏光件1所含之碘移動至黏著劑層5並透過黏著劑層5透出偏光薄膜11之外部。The
(偏光薄膜之另一變形例)
偏光薄膜10亦可更具備有上述構件以外之其他構件。如圖3所示,本變形例之偏光薄膜12更具有透明保護薄膜(第2透明保護薄膜)6。除了第2透明保護薄膜6外,偏光薄膜12之結構係與偏光薄膜10之結構相同。因此,偏光薄膜10與變形例之偏光薄膜12中共通之要素有賦予相同參照符號並省略該等說明之情形。(Another modification of polarizing film)
The
第2透明保護薄膜6位於較偏光件1更靠視辨側。偏光件1係位於例如第1透明保護薄膜4與第2透明保護薄膜6之間。第2透明保護薄膜6例如較樹脂層2更靠視辨側,且位在偏光薄膜12之最外側。惟,偏光薄膜12具備上述透明基板時,第2透明保護薄膜6亦可位於樹脂層2與透明基板之間。第2透明保護薄膜6例如係直接接觸樹脂層2。惟,第2透明保護薄膜6亦可隔著接著劑層、硬塗層等其他層貼合於樹脂層2上。作為用以將第2透明保護薄膜6貼合於樹脂層2之接著劑層,可舉例如先前針對接著劑層3所記述者。The second transparent
作為第2透明保護薄膜6可使用先前針對第1透明保護薄膜4所記述者。第1透明保護薄膜4及第2透明保護薄膜6可彼此相同亦可互異。As the second transparent
以具備有第2透明保護薄膜6之偏光薄膜12來說,有在高溫多濕環境下偏光件1所含之碘往外部之透出更受抑制之傾向。舉一例來說,在透過黏著劑層5將偏光薄膜12貼合於無鹼玻璃之狀態下,將偏光薄膜12放置於65℃90%RH之氣體環境下120小時後,偏光薄膜12之單體透射率的變化ΔY2例如為3以下,宜為2以下,1.5以下較佳,1以下更佳,0.8以下尤佳。For the
單體透射率的變化ΔY2具體上可利用以下方法來測定。首先,測定透過黏著劑層5將偏光薄膜12貼合於無鹼玻璃上而得之積層體的單體透射率Ts3。接著,將該積層體放置在65℃90%RH之氣體環境下120小時。針對放置於該氣體環境下後之積層體測定單體透射率Ts4。將從單體透射率Ts4減去單體透射率Ts3後所得之值視為單體透射率之變化ΔY2。Specifically, the change in transmittance ΔY2 of the monomer can be measured by the following method. First, the monomer transmittance Ts3 of the laminate obtained by bonding the
單體透射率Ts3無特別限定,例如為42%~46%,宜為43%以上,較宜為44%以上。單體透射率Ts4無特別限定,例如為42%~48%,宜為47%以下,較宜為46%以下。The monomer transmittance Ts3 is not particularly limited. For example, it is 42% to 46%, preferably 43% or more, and more preferably 44% or more. The monomer transmittance Ts4 is not particularly limited. For example, it is 42% to 48%, preferably 47% or less, and more preferably 46% or less.
(偏光薄膜之又另一變形例)
偏光薄膜10亦可具備有2層以上樹脂層2。如圖4所示,本變形例之偏光薄膜13具備有2層樹脂層2a及2b。除了樹脂層2b外,偏光薄膜13之結構係與偏光薄膜10之結構相同。因此,偏光薄膜10與變形例之偏光薄膜13中共通之要素有賦予相同參照符號並省略該等說明之情形。(Another modification of polarizing film)
The
偏光薄膜13中,偏光件1位於2層樹脂層2a及2b之間。詳細而言,樹脂層2b位於較偏光件1更靠影像顯示面板側(例如偏光件1與接著劑層3之間)。偏光件1配置於2層樹脂層2a及2b之間時,偏光薄膜13有偏光件1所含之碘往外部之透出更受抑制之傾向。In the
樹脂層2b可直接接觸偏光件1。惟,樹脂層2b與偏光件1之間亦可配置有接著劑層、易接著層等其他層。例如,樹脂層2b亦可透過接著劑層或易接著層貼合於偏光件1上。作為用以將樹脂層2b貼合於偏光件1之接著劑層及易接著層,可舉先前針對偏光薄膜10所記述者。The
(影像顯示裝置之實施形態)
如圖5所示,本實施形態之影像顯示裝置100具備偏光薄膜10及影像顯示面板20。影像顯示裝置100中,亦可使用偏光薄膜11、12或13來取代偏光薄膜10。影像顯示裝置100中,偏光薄膜10例如係透過黏著劑層5貼合於影像顯示面板20。影像顯示面板20可舉有機EL顯示面板、液晶顯示面板等,且宜為有機EL顯示面板。(Implementation form of image display device)
As shown in FIG. 5, the
影像顯示裝置100例如更具備照明系統(未圖示)。舉一例來說,偏光薄膜10、影像顯示面板20及照明系統係依序排列,且偏光薄膜10位於最靠視辨側。照明系統例如具有背光件或反射板,對影像顯示面板20照射光。The
實施例 以下藉由實施例更詳細說明本發明。本發明不受以下顯示之實施例所限。Example The following examples illustrate the present invention in more detail. The present invention is not limited by the examples shown below.
<薄型偏光件> 首先,準備非晶性聚對苯二甲酸乙二酯(PET)基材上成膜有厚度9µm之PVA層的積層體。針對該積層體,藉由在延伸溫度130℃下進行空中輔助延伸而製作出延伸積層體。接著,使用碘將延伸積層體染色而獲得著色積層體。並且,針對著色積層體,於硼酸水溶液中在延伸溫度65度下進行延伸而獲得非晶性PET基材與PVA層經一體延伸而成的積層體。積層體中,總延伸倍率為5.94倍,PVA層的厚度為5µm。藉由上述2段延伸而成膜於非晶性PET基材上之PVA層的PVA分子經高度定向。並且,藉由染色而吸附的碘係以多碘離子錯合物之形式於一方向高度定向。積層體所含PVA層係作為薄型偏光件發揮功能。<Thin Polarizer> First, prepare a laminate in which a PVA layer with a thickness of 9 µm is formed on an amorphous polyethylene terephthalate (PET) substrate. With respect to this laminate, a stretched laminate was produced by performing air-assisted stretch at a stretch temperature of 130°C. Next, the stretched laminate was dyed with iodine to obtain a colored laminate. In addition, the colored laminated body was stretched in a boric acid aqueous solution at a stretching temperature of 65 degrees to obtain a laminated body in which an amorphous PET substrate and a PVA layer were integrally stretched. In the laminate, the total extension ratio is 5.94 times, and the thickness of the PVA layer is 5 µm. The PVA molecules of the PVA layer formed on the amorphous PET substrate by the above-mentioned two-stage extension are highly oriented. In addition, the iodine adsorbed by dyeing is highly oriented in one direction in the form of polyiodide ion complexes. The PVA layer contained in the laminate functions as a thin polarizer.
<透明保護薄膜> 首先,利用日本專利特開2010-284840號公報之製造例1中所記載之方法,製出由經醯亞胺化之甲基丙烯酸甲酯-苯乙烯共聚物所構成的樹脂(醯亞胺化MS樹脂)。接著,使用雙軸捏合機將醯亞胺化MS樹脂100重量份及三𠯤系紫外線吸收劑(ADEKA公司製,商品名:T-712)0.62重量份於220℃下混合,製出樹脂丸粒。使所得樹脂丸粒在100.5kPa、100℃之環境下乾燥12小時。接著,使用單軸擠製機於模具溫度270℃下從T型模頭擠製出樹脂丸粒,而製出厚度160µm之薄膜。並針對該薄膜在150℃的氣體環境下往其輸送方向延伸,將厚度調節成80µm。接著,將包含水性胺甲酸酯樹脂之易接著劑塗佈於薄膜後,將薄膜在150℃的氣體環境下往與輸送方向正交之方向延伸,藉此獲得厚度40µm之透明保護薄膜。該透明保護薄膜之透濕度為58g/m2 /24h。<Transparent protective film> First, a resin composed of an imidized methyl methacrylate-styrene copolymer was prepared using the method described in Production Example 1 of Japanese Patent Application Laid-Open No. 2010-284840 (Imidated MS resin). Next, 100 parts by weight of the imidized MS resin and 0.62 parts by weight of a tri-type ultraviolet absorber (manufactured by ADEKA, trade name: T-712) were mixed at 220°C using a biaxial kneader to prepare resin pellets . The obtained resin pellets were dried in an environment of 100.5 kPa and 100° C. for 12 hours. Next, a uniaxial extruder was used to extrude resin pellets from the T-die at a mold temperature of 270°C to produce a film with a thickness of 160 µm. The thickness of the film is adjusted to 80µm in the direction of conveyance of the film in a 150°C gas environment. Next, after coating the easy-adhesive agent containing the water-based urethane resin on the film, the film was extended in a direction orthogonal to the conveying direction under a gas atmosphere at 150°C, thereby obtaining a transparent protective film with a thickness of 40 µm. The moisture permeability of the transparent protective film is 58 g/m 2 /24h.
<活性能量線硬化型接著劑組成物>
將12重量份之羥乙基丙烯醯胺(KJ Chemicals Corporation製,商品名:HEAA)、24重量份之2-羥基-3-苯氧基丙基丙烯酸酯(東亞合成公司製,商品名:ARONIX M-5700)、12重量份之羥基三甲基乙酸新戊二醇丙烯酸酯加成物(共榮社化學公司製,商品名:LIGHT ACRYLATE HPP-A),38重量份之1,9-壬二醇二丙烯酸酯(共榮社化學公司製,商品名:LIGHT ACRYLATE 1,9ND-A)、10重量份之丙烯酸寡聚物(東亞合成公司製,商品名:ARUFON UP-1190)、3重量份之2-甲基-1-(4-甲基苯硫基)-2-嗎福林丙-1-酮(IGM Resins公司製,商品名:OMNIRAD 907)及2重量份之2,4-二乙基9-氧硫(日本化藥公司製,商品名:KAYACURE DETX-S)混合並攪拌3小時,藉此獲得活性能量線硬化型接著劑組成物。<Active energy ray curable adhesive composition> 12 parts by weight of hydroxyethyl acrylamide (manufactured by KJ Chemicals Corporation, trade name: HEAA) and 24 parts by weight of 2-hydroxy-3-phenoxypropyl acrylic acid Ester (manufactured by Toagosei Co., Ltd., trade name: ARONIX M-5700), 12 parts by weight of hydroxytrimethylacetate neopentyl glycol acrylate adduct (manufactured by Kyoeisha Chemical Co., Ltd., trade name: LIGHT ACRYLATE HPP-A) ), 38 parts by weight of 1,9-nonanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd., trade name:
<包含透明保護薄膜、接著劑層及薄型偏光件之積層體> 使用富士機械公司製之MCD塗佈機(凹槽形狀:蜂巢狀,凹版輥筒線數:1000條/inch,旋轉速度140%/對線速),將活性能量線硬化型接著劑組成物塗敷於透明保護薄膜的貼合面上。所得塗膜之厚度為0.7µm。接著,使用輥軋機將包含透明保護薄膜與PVA層之積層體貼合。此時,使塗膜與PVA層接觸。輥壓機的生產線速度為25m/分鐘。接著,針對所得積層體,從透明保護薄膜側照射活性能量線。活性能量線係使用從可見光線照射裝置(Fusion UV Systems公司製的Light HAMMER10)射出之可見光線。可見光線照射裝置之光源為充有鎵之金屬鹵素燈。可見光線照射裝置之燈泡係使用V燈泡。從可見光線照射裝置射出之射出光的峰值照度為1600mW/cm2 。在波長380nm~440nm之範圍中,從可見光線照射裝置射出之射出光的累積照射量為1000mJ/cm2 。從可見光線照射裝置射出之射出光的照度係使用Solatell公司製Sola-Check系統測定。藉由對積層體照射活性能量線,使塗膜中之活性能量線硬化型接著劑組成物硬化。接著,對該積層體在70℃下進行3分鐘熱風乾燥,藉此獲得包含透明保護薄膜、接著劑層及薄型偏光件之積層體a。<Laminated body containing transparent protective film, adhesive layer and thin polarizer> MCD coater manufactured by Fuji Machinery Co., Ltd. (groove shape: honeycomb shape, gravure roller line number: 1000 lines/inch, rotation speed 140% /To line speed), the active energy ray curable adhesive composition is applied to the bonding surface of the transparent protective film. The thickness of the resulting coating film was 0.7µm. Next, the laminate containing the transparent protective film and the PVA layer was bonded together using a rolling mill. At this time, the coating film is brought into contact with the PVA layer. The production line speed of the roller press is 25m/min. Next, the obtained laminate was irradiated with active energy rays from the side of the transparent protective film. The active energy line uses visible light emitted from a visible light irradiation device (Light HAMMER10 manufactured by Fusion UV Systems). The light source of the visible light irradiation device is a metal halide lamp filled with gallium. The bulb of the visible light irradiation device uses a V bulb. The peak illuminance of the emitted light from the visible light irradiation device is 1600mW/cm 2 . In the wavelength range of 380nm~440nm, the cumulative irradiation amount of the emitted light from the visible light irradiation device is 1000mJ/cm 2 . The illuminance of the emitted light from the visible light irradiation device was measured using the Sola-Check system manufactured by Solarell. By irradiating the laminate with active energy rays, the active energy ray curable adhesive composition in the coating film is cured. Next, the laminate was dried with hot air at 70° C. for 3 minutes, thereby obtaining a laminate a including a transparent protective film, an adhesive layer, and a thin polarizer.
[實施例1] (偏光薄膜A) 首先,將50重量份之丙烯酸二環戊酯(日立化成公司製,商品名:FANCRYL FA-513AS)、50重量份之新戊四醇四丙烯酸酯(共榮社化學公司製,商品名:LIGHT ACRYLATE PE-4A)、2重量份之2-甲基-1-(4-甲基苯硫基)-2-嗎福林丙-1-酮(IGM Resins公司製,商品名:OMNIRAD 907)及2重量份之2,4-二乙基9-氧硫(日本化藥公司製,商品名:KAYACURE DETX-S)混合,製作出塗佈液。[Example 1] (Polarizing film A) First, 50 parts by weight of dicyclopentyl acrylate (manufactured by Hitachi Chemical Co., Ltd., trade name: FANCRYL FA-513AS) and 50 parts by weight of neopentylerythritol tetraacrylate (total Produced by Eisha Chemical Co., Ltd., trade name: LIGHT ACRYLATE PE-4A), 2 parts by weight of 2-methyl-1-(4-methylphenylthio)-2-mopholin-1-one (IGM Resins Manufactured by the company, trade name: OMNIRAD 907) and 2 parts by weight of 2,4-diethyl 9-oxysulfur (Nippon Kayaku Co., Ltd., brand name: KAYACURE DETX-S) was mixed to prepare a coating liquid.
接著,從上述積層體a去除與PVA層鄰接之非晶性PET基材。使用Select-Roller #0(OSG SYSTEM PRODUCTS Co., Ltd.製),於露出之PVA層上塗敷上述塗佈液。所得塗膜之厚度為1µm。接著,使用上述可見光線照射裝置,在氮氣流下對塗膜照射可見光線,藉此使單體聚合。藉由單體聚合使塗膜硬化而形成樹脂層。Next, the amorphous PET substrate adjacent to the PVA layer was removed from the laminate a. Use Select-Roller #0 (manufactured by OSG SYSTEM PRODUCTS Co., Ltd.) to apply the above-mentioned coating liquid on the exposed PVA layer. The thickness of the resulting coating film is 1 µm. Next, using the visible light irradiation device described above, the coating film was irradiated with visible light under a nitrogen stream, thereby polymerizing the monomer. The coating film is cured by polymerizing the monomer to form a resin layer.
接著,對透明保護薄膜之表面進行了電暈處理。於該表面貼合厚度20µm之黏著劑層。黏著劑層係以丙烯酸系黏著劑所構成。藉此,獲得依序具備有樹脂層、偏光件、接著劑層、透明保護薄膜及黏著劑層的偏光薄膜A。Next, corona treatment was performed on the surface of the transparent protective film. Stick an adhesive layer with a thickness of 20µm on the surface. The adhesive layer is composed of acrylic adhesive. Thereby, a polarizing film A having a resin layer, a polarizer, an adhesive layer, a transparent protective film, and an adhesive layer in this order is obtained.
(偏光薄膜B) 首先,利用與偏光薄膜A相同方法製作出塗佈液。使用富士機械公司製之MCD塗佈機(凹槽形狀:蜂巢狀,凹版輥筒線數:700條/inch,旋轉速度140%/對線速),於厚度20µm之三醋酸纖維素(TAC)薄膜的貼合面塗敷塗佈液。所得塗膜之厚度為1µm。接著,從上述積層體a去除與PVA層鄰接之非晶性PET基材。使用輥軋機將TAC薄膜與積層體a貼合。此時,使塗膜與PVA層接觸。輥壓機的生產線速度為25m/分鐘。接著,針對所得積層體,從TAC薄膜側照射活性能量線。活性能量線係使用從上述可見光線照射裝置射出之可見光線。藉由對積層體照射活性能量線,使塗膜中之單體聚合。藉由單體聚合使塗膜硬化。接著,針對該積層體在70℃下進行3分鐘熱風乾燥。藉此形成了樹脂層。(Polarizing film B) First, the coating liquid was produced by the same method as the polarizing film A. Use the MCD coating machine made by Fuji Machinery Co. (groove shape: honeycomb shape, gravure roll line: 700 lines/inch, rotation speed 140%/pair line speed), with a thickness of 20 µm tri-cellulose acetate (TAC) Coating liquid is applied to the bonding surface of the film. The thickness of the resulting coating film is 1 µm. Next, the amorphous PET substrate adjacent to the PVA layer was removed from the laminate a. The TAC film and the laminate a were bonded together using a rolling mill. At this time, the coating film is brought into contact with the PVA layer. The production line speed of the roller press is 25m/min. Next, the obtained laminate was irradiated with active energy rays from the TAC film side. The active energy line uses visible light emitted from the above-mentioned visible light irradiation device. By irradiating the laminate with active energy rays, the monomers in the coating film are polymerized. The coating film is hardened by polymerization of monomers. Next, the laminate was dried with hot air at 70°C for 3 minutes. Thus, a resin layer was formed.
接著,針對包含醯亞胺化MS樹脂之透明保護薄膜的表面進行電暈處理。於該表面貼合厚度20µm之黏著劑層。黏著劑層係以丙烯酸系黏著劑所構成。藉此獲得依序具備有TAC薄膜(第2透明保護薄膜)、樹脂層、偏光件、接著劑層、包含醯亞胺化MS樹脂之透明保護薄膜(第1透明保護薄膜)及黏著劑層的偏光薄膜B。Next, corona treatment was performed on the surface of the transparent protective film containing the imidized MS resin. Stick an adhesive layer with a thickness of 20µm on the surface. The adhesive layer is composed of acrylic adhesive. Thereby, a TAC film (the second transparent protective film), a resin layer, a polarizer, an adhesive layer, a transparent protective film containing an imidized MS resin (the first transparent protective film), and an adhesive layer are obtained in this order. Polarizing film B.
[實施例2-16、比較例1、3及5] 將用以形成樹脂層之塗佈液所含單體變更成表1所記載之單體,除此之外依與實施例1相同方法而製出實施例2-16、比較例1、3及5之偏光薄膜A及B。[Examples 2-16, Comparative Examples 1, 3 and 5] The monomers contained in the coating solution for forming the resin layer were changed to the monomers described in Table 1, except that the same method as in Example 1 was followed to prepare Examples 2-16, Comparative Examples 1, 3, and 5 Polarizing films A and B.
[比較例2]
使用光硬化性樹脂組成物A作為用以形成樹脂層之塗佈液,除此之外依與實施例1相同方法而製出比較例2之偏光薄膜A及B。光硬化性樹脂組成物A係43重量份之丙烯醯基嗎福林(KJ Chemicals Corporation製,商品名:ACMO)、29重量份之1,9-壬二醇二丙烯酸酯(共榮社化學公司製,商品名:LIGHT ACRYLATE 1,9ND-A)、14重量份之苯氧基二乙二醇丙烯酸酯(共榮社化學公司製,商品名:LIGHT ACRYLATE P2H-A)、10重量份之丙烯酸寡聚物(東亞合成公司製,商品名:ARUFON UP-1190)、2重量份之2-甲基-1-(4-甲基苯硫基)-2-嗎福林丙-1-酮(IGM Resins公司製,商品名:OMNIRAD 907)及2重量份之2,4-二乙基9-氧硫(日本化藥公司製,商品名:KAYACURE DETX-S)的混合物。[Comparative Example 2] The polarizing films A and B of Comparative Example 2 were produced in the same manner as in Example 1, except that the photocurable resin composition A was used as the coating liquid for forming the resin layer. Light-curable resin composition A is 43 parts by weight of acryloyl mopholine (manufactured by KJ Chemicals Corporation, trade name: ACMO), and 29 parts by weight of 1,9-nonanediol diacrylate (Kyoeisha Chemical Co., Ltd.) Manufactured, trade name:
[比較例4]
使用光硬化性樹脂組成物B作為用以形成樹脂層之塗佈液,除此之外依與實施例1相同方法而製出比較例4之偏光薄膜A及B。此外,光硬化性樹脂組成物B係12重量份之羥乙基丙烯醯胺(KJ Chemicals Corporation製,商品名:HEAA)、20重量份之2-羥基-3-苯氧基丙基丙烯酸酯(東亞合成公司製,商品名:ARONIX M-5700)、12重量份之羥基三甲基乙酸新戊二醇丙烯酸酯加成物(共榮社化學公司製,商品名:LIGHT ACRYLATE HPP-A),34重量份之1,9-壬二醇二丙烯酸酯(共榮社化學公司製,商品名:LIGHT ACRYLATE 1,9ND-A)、10重量份之丙烯酸寡聚物(東亞合成公司製,商品名:ARUFON UP-1190)、5重量份之二乙基丙烯醯胺(KJ Chemicals Corporation製,商品名:DEAA)、3重量份之2-甲基-1-(4-甲基苯硫基)-2-嗎福林丙-1-酮(IGM Resins公司製,商品名:OMNIRAD 907)及3重量份之2,4-二乙基9-氧硫(日本化藥公司製,商品名:KAYACURE DETX-S)的混合物。[Comparative Example 4] The polarizing films A and B of Comparative Example 4 were produced in the same manner as in Example 1, except that the photocurable resin composition B was used as the coating liquid for forming the resin layer. In addition, the photocurable resin composition B is 12 parts by weight of hydroxyethyl acrylamide (manufactured by KJ Chemicals Corporation, trade name: HEAA), and 20 parts by weight of 2-hydroxy-3-phenoxypropyl acrylate ( Toagosei Co., Ltd., trade name: ARONIX M-5700), 12 parts by weight of hydroxytrimethylacetate neopentyl glycol acrylate adduct (Kyoeisha Chemical Co., Ltd., trade name: LIGHT ACRYLATE HPP-A), 34 parts by weight of 1,9-nonanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd., trade name:
<單體透射率之變化ΔY1> 針對實施例及比較例之偏光薄膜A,利用以下方法測定單體透射率之變化ΔY1。首先,透過黏著劑層將偏光薄膜A貼合於無鹼玻璃上。針對所得積層體測定單體透射率Ts1。單體透射率Ts1係使用附積分球之分光透射率測定器(村上色彩技術研究所製之Dot-3c)來測定。接著,將該積層體放置在65℃90%RH之氣體環境下24小時。針對放置在該氣體環境下後的積層體,使用上述分光透射率測定器測定單體透射率Ts2。從單體透射率Ts2減去單體透射率Ts1,藉此算出單體透射率之變化ΔY1。<Change in monomer transmittance ΔY1> For the polarizing film A of the examples and comparative examples, the change in monomer transmittance ΔY1 was measured by the following method. First, the polarizing film A is attached to the alkali-free glass through the adhesive layer. The monomer transmittance Ts1 was measured for the obtained laminate. The monomer transmittance Ts1 was measured using a spectroscopic transmittance measuring device with integrating sphere (Dot-3c manufactured by Murakami Color Research Institute). Next, the laminate was placed in a 65°C 90%RH gas environment for 24 hours. With respect to the laminate after being left in this gas environment, the single-body transmittance Ts2 was measured using the above-mentioned spectral transmittance measuring device. The monomer transmittance Ts1 is subtracted from the monomer transmittance Ts2, thereby calculating the change ΔY1 of the monomer transmittance.
<單體透射率之變化ΔY2> 針對實施例及比較例之偏光薄膜B,利用以下方法測定單體透射率之變化ΔY2。首先,透過黏著劑層將偏光薄膜B貼合於無鹼玻璃上。針對所得積層體測定單體透射率Ts3。單體透射率Ts3係使用附積分球之分光透射率測定器(村上色彩技術研究所製之Dot-3c)來測定。接著,將該積層體放置在65℃90%RH之氣體環境下120小時。針對放置在該氣體環境下後的積層體,使用上述分光透射率測定器測定單體透射率Ts4。從單體透射率Ts4減去單體透射率Ts3,藉此算出單體透射率之變化ΔY2。<Change in monomer transmittance ΔY2> For the polarizing film B of the embodiment and the comparative example, the monomer transmittance change ΔY2 was measured by the following method. First, the polarizing film B is bonded to the alkali-free glass through the adhesive layer. The monomer transmittance Ts3 was measured for the obtained laminate. The monomer transmittance Ts3 was measured using a spectroscopic transmittance measuring device with integrating sphere (Dot-3c manufactured by Murakami Color Research Institute). Next, the laminate was placed in a 65°C 90%RH gas environment for 120 hours. With respect to the laminate after being left in this gas environment, the single-body transmittance Ts4 was measured using the above-mentioned spectral transmittance measuring device. The monomer transmittance Ts3 is subtracted from the monomer transmittance Ts4 to calculate the change ΔY2 of the monomer transmittance.
<利用式(1)算出之y1 之值> 針對實施例及比較例中所使用之用以形成樹脂層的塗佈液中所含單體,利用上述方法特定出x1 ~x3 之值。又,單體所含之可旋轉之鍵結數量及反應點的數量係使用Dragon(version7.0)算出。單體之漢森溶解度參數中之極化項δP(MPa1/2 )係使用HSPiP(version5)算出。並使用x1 ~x3 之值,根據式(1)來算出y1 之值。 <The value of y 1 calculated by the formula (1)> For the monomers contained in the coating liquid used in the examples and comparative examples to form the resin layer, the values of x 1 to x 3 are specified by the above method . In addition, the number of rotatable bonds and the number of reaction points contained in the monomer are calculated using Dragon (version7.0). The polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the monomer is calculated using HSPiP (version5). And use the value of x 1 ~ x 3 to calculate the value of y 1 according to formula (1).
<利用式(2)算出之y2 之值> 針對實施例及比較例中所使用之用以形成樹脂層的塗佈液中所含單體,利用上述方法特定出x1 ~x5 之值。又,單體所含之可旋轉之鍵結數量及反應點的數量係使用Dragon(version7.0)算出。單體之漢森溶解度參數中之極化項δP(MPa1/2 )係使用HSPiP(version5)算出。構成單體之各原子的電荷及偶極矩的x成分的計算,係利用Materials Studio(BIOVIA公司製,ver.8.0.0.843)及WebMO(ver.19.0.009e)。並使用x1 ~x5 之值,根據式(2)來算出y2 之值。 <The value of y 2 calculated by the formula (2)> For the monomers contained in the coating solution for forming the resin layer used in the Examples and Comparative Examples, the values of x 1 to x 5 are specified by the above method . In addition, the number of rotatable bonds and the number of reaction points contained in the monomer are calculated using Dragon (version7.0). The polarization term δP (MPa 1/2 ) in the Hansen solubility parameter of the monomer is calculated using HSPiP (version5). The calculation of the x component of the charge and dipole moment of each atom constituting the monomer was performed using Materials Studio (manufactured by BIOVIA, ver.8.0.0.843) and WebMO (ver.19.0.009e). And use the value of x 1 ~ x 5 to calculate the value of y 2 according to formula (2).
<拉伸儲存彈性模數E1及E2> 針對實施例及比較例所用樹脂層,利用上述方法測定拉伸儲存彈性模數E1及E2。動態黏彈性測定裝置係使用TA Instruments公司製之動態黏彈性測定裝置RSA-G2。<Tensile storage elastic modulus E1 and E2> Regarding the resin layers used in the Examples and Comparative Examples, the tensile storage elastic moduli E1 and E2 were measured by the above-mentioned method. The dynamic viscoelasticity measuring device is a dynamic viscoelasticity measuring device RSA-G2 manufactured by TA Instruments.
<線膨脹係數α1及α2> 針對實施例及比較例所用樹脂層,利用上述方法測定線膨脹係數α1及α2。熱機械分析裝置係使用Netch公司製之熱機械分析裝置TMA 4000 SE。<Linear expansion coefficient α1 and α2> Regarding the resin layers used in the Examples and Comparative Examples, the linear expansion coefficients α1 and α2 were measured by the above-mentioned method. The thermomechanical analysis device uses the thermomechanical analysis device TMA 4000 SE manufactured by Netch Company.
<偶極矩D> 針對實施例及比較例中所使用之用以形成樹脂層的塗佈液中所含單體,利用上述方法算出偶極矩D。偶極矩D的計算係利用Materials Studio(BIOVIA公司製,ver.8.0.0.843)及WebMO(ver.19.0.009e)。<Dipole moment D> With regard to the monomers contained in the coating liquid for forming the resin layer used in the Examples and Comparative Examples, the dipole moment D was calculated by the above-mentioned method. The calculation of the dipole moment D uses Materials Studio (manufactured by BIOVIA, ver.8.0.0.843) and WebMO (ver.19.0.009e).
[表1] [Table 1]
此外,表1中之簡稱如下。 FA513AS:丙烯酸二環戊酯,日立化成公司製 TMP-A:三羥甲丙烷三丙烯酸酯,共榮社化學公司製 TBCHA:丙烯酸4-三級丁基環己酯,KJ Chemicals Corporation製 DCP-A:二羥甲基-三環癸烷二丙烯酸酯,共榮社化學公司製 GBLA:γ-丁內酯丙烯酸酯,大阪有機化學工業公司製 ACMO:丙烯醯基嗎福林,KJ Chemicals Corporation製 PE-4A:新戊四醇四丙烯酸酯,共榮社化學公司製 DPE-6A:二新戊四醇六丙烯酸酯,共榮社化學公司製 1,9ND-A:1,9-壬二醇二丙烯酸酯,共榮社化學公司製 9EG-A:聚乙二醇#400二丙烯酸酯,共榮社化學公司製In addition, the abbreviations in Table 1 are as follows. FA513AS: Dicyclopentyl acrylate, manufactured by Hitachi Chemical Co., Ltd. TMP-A: Trimethylolpropane triacrylate, manufactured by Kyoeisha Chemical Co., Ltd. TBCHA: 4-tertiary butyl cyclohexyl acrylate, manufactured by KJ Chemicals Corporation DCP-A: Dimethylol-tricyclodecane diacrylate, manufactured by Kyoeisha Chemical Co., Ltd. GBLA: γ-butyrolactone acrylate, manufactured by Osaka Organic Chemical Industry Co., Ltd. ACMO: Acrylic methacrylate, manufactured by KJ Chemicals Corporation PE-4A: Neopentylerythritol tetraacrylate, manufactured by Kyoeisha Chemical Co., Ltd. DPE-6A: Dineopentaerythritol hexaacrylate, manufactured by Kyoeisha Chemical Co., Ltd. 1,9ND-A: 1,9-nonanediol diacrylate, manufactured by Kyoeisha Chemical Co., Ltd. 9EG-A: Polyethylene glycol #400 diacrylate, manufactured by Kyoeisha Chemical Co., Ltd.
由表1可知,利用式(1)算出之y1 之值或利用式(2)算出之y2 之值小於1.3的實施例之偏光薄膜A,其單體透射率變化ΔY1為5以下,在高溫多濕環境下碘往外部之透出有充分被抑制。同樣地,實施例之偏光薄膜B之單體透射率之變化ΔY2為3以下,在高溫多濕環境下碘往外部之透出有充分被抑制。另一方面,相較於實施例,y1 之值及y2 之值為1.3以上的比較例之偏光薄膜A及B,其單體透射率之變化大,無法充分抑制在高溫多濕環境下碘往外部透出。It can be seen from Table 1 that the value of y 1 calculated by the formula (1) or the value of y 2 calculated by the formula (2) is less than 1.3 in the polarizing film A of the embodiment, the monomer transmittance change ΔY1 is 5 or less, The leakage of iodine to the outside under high temperature and humidity environment is sufficiently suppressed. Similarly, the change ΔY2 of the monomer transmittance of the polarizing film B of the example is 3 or less, and the leakage of iodine to the outside is sufficiently suppressed in a high-temperature and high-humidity environment. On the other hand, compared with the examples, the polarizing films A and B of the comparative examples where the value of y 1 and the value of y 2 are 1.3 or more have a large change in the transmittance of the monomers, which cannot be sufficiently suppressed in a high temperature and high humidity environment. Iodine leaks to the outside.
並且,針對專利文獻1之實施例1-4及比較例1所用活性能量線硬化型樹脂組成物中所含單體,利用上述方法特定出x1
~x5
、y1
及y2
之值。該等活性能量線硬化型樹脂組成物僅包含有環氧化合物作為單體,且未包含有(甲基)丙烯酸酯。所算出之y1
及y2
之值無法充分預測活性能量線硬化型樹脂組成物之硬化層的特性。由此可知,利用式(1)算出之y1
及利用式(2)算出之y2
特別適合作為預測包含具有源自(甲基)丙烯酸酯之結構單元的聚合物之樹脂層之特性的指標。In addition, with respect to the monomers contained in the active energy ray-curable resin composition used in Examples 1-4 and Comparative Example 1 of
產業上之可利用性 本發明偏光薄膜可適宜利用於例如行動電話、智慧型手機、筆記型電腦等行動用顯示器;汽車導航裝置用面板、儀表板及鏡面顯示器等車載用顯示器。Industrial availability The polarizing film of the present invention can be suitably used for, for example, mobile displays such as mobile phones, smart phones, and notebook computers; automotive displays such as panels for car navigation devices, instrument panels, and mirror displays.
1:偏光件
2,2a,2b:樹脂層
3:接著劑層
4:第1透明保護薄膜
5:黏著劑層
6:第2透明保護薄膜
10,11,12,13:偏光薄膜
20:影像顯示面板
100:影像顯示裝置1: Polarizing
圖1係本發明一實施形態之偏光薄膜的概略截面圖。 圖2係顯示偏光薄膜之變形例的概略截面圖。 圖3係顯示偏光薄膜之另一變形例的概略截面圖。 圖4係顯示偏光薄膜之又另一變形例的概略截面圖。 圖5係本發明一實施形態之影像顯示裝置的概略截面圖。Fig. 1 is a schematic cross-sectional view of a polarizing film according to an embodiment of the present invention. Fig. 2 is a schematic cross-sectional view showing a modification of the polarizing film. Fig. 3 is a schematic cross-sectional view showing another modification of the polarizing film. Fig. 4 is a schematic cross-sectional view showing still another modification of the polarizing film. Fig. 5 is a schematic cross-sectional view of an image display device according to an embodiment of the present invention.
1:偏光件 1: Polarizing parts
2:樹脂層 2: Resin layer
3:接著劑層 3: Adhesive layer
4:第1透明保護薄膜 4: The first transparent protective film
5:黏著劑層 5: Adhesive layer
10:偏光薄膜 10: Polarizing film
Claims (19)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-057510 | 2020-03-27 | ||
| JP2020057510 | 2020-03-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202138178A true TW202138178A (en) | 2021-10-16 |
Family
ID=77891743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110104293A TW202138178A (en) | 2020-03-27 | 2021-02-04 | Polarization film, image display device and polarization film production method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7610581B2 (en) |
| KR (1) | KR20220159348A (en) |
| CN (1) | CN115298585B (en) |
| TW (1) | TW202138178A (en) |
| WO (1) | WO2021192615A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023053798A1 (en) * | 2021-09-28 | 2023-04-06 | 日東電工株式会社 | Polarization film, image display device, and method for producing polarization film |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014119487A1 (en) | 2013-02-01 | 2014-08-07 | 富士フイルム株式会社 | Optical film, method for producing same, polarizing plate and liquid crystal display device |
| KR101958679B1 (en) * | 2014-06-18 | 2019-03-15 | 오지 홀딩스 가부시키가이샤 | Adhesive agent composition for polarizers and adhesive sheet for polarizers |
| WO2016129584A1 (en) * | 2015-02-13 | 2016-08-18 | 日東電工株式会社 | Polarizing film polarizing film provided with adhesive layer, and image display device and method for continuously manufacturing same |
| JP5922292B1 (en) | 2015-02-16 | 2016-05-24 | 住友化学株式会社 | Curable adhesive composition and polarizing plate using the same |
| JP6351559B2 (en) * | 2015-09-28 | 2018-07-04 | 日東電工株式会社 | Polarizer, polarizing plate and image display device |
| JP6604809B2 (en) | 2015-10-13 | 2019-11-13 | 住友化学株式会社 | Polarizing plate with pressure-sensitive adhesive layer, method for producing the same, active energy ray-curable polymer composition used for the production, and liquid crystal display device |
| JP6710560B2 (en) * | 2016-03-28 | 2020-06-17 | 日東電工株式会社 | Polarizing film, polarizing film with adhesive layer, method of manufacturing polarizing film, and image display device |
| JP6868344B2 (en) * | 2016-04-20 | 2021-05-12 | 日東電工株式会社 | Polarizing film and its manufacturing method, optical film and image display device |
| JP2018169512A (en) | 2017-03-30 | 2018-11-01 | 住友化学株式会社 | Optical laminate |
| JP7027003B2 (en) * | 2017-09-21 | 2022-03-01 | 日東電工株式会社 | Laminated optical film and its manufacturing method, and image display device |
| JP2019185061A (en) * | 2019-07-18 | 2019-10-24 | 住友化学株式会社 | Polarizing plate with adhesive layer and manufacturing method of the same, active energy ray curable polymer composition used for the manufacture, and liquid crystal display |
-
2021
- 2021-02-01 KR KR1020227024423A patent/KR20220159348A/en active Pending
- 2021-02-01 WO PCT/JP2021/003597 patent/WO2021192615A1/en not_active Ceased
- 2021-02-01 CN CN202180021334.5A patent/CN115298585B/en active Active
- 2021-02-01 JP JP2022509338A patent/JP7610581B2/en active Active
- 2021-02-04 TW TW110104293A patent/TW202138178A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2021192615A1 (en) | 2021-09-30 |
| WO2021192615A1 (en) | 2021-09-30 |
| CN115298585A (en) | 2022-11-04 |
| CN115298585B (en) | 2025-06-06 |
| KR20220159348A (en) | 2022-12-02 |
| JP7610581B2 (en) | 2025-01-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107664788B (en) | Optical Laminate | |
| JP5788646B2 (en) | Polarizing plate, composite polarizing plate, and liquid crystal display device | |
| TWI708682B (en) | Manufacturing method of laminated optical film | |
| TWI794418B (en) | Active energy ray-curable adhesive composition, polarizing film and manufacturing method thereof, optical film, and image display device | |
| KR101630938B1 (en) | Polarizing plate, preparing method for polarizing plate and image display apparatus comprising the same | |
| TW201842363A (en) | Polarizing plate and liquid crystal panel | |
| TW202018345A (en) | Polarizing plate for light emitting displays and light emitting display comprising the same | |
| TW202134369A (en) | Polarizing plate for light emitting displays and light emitting display comprising the same | |
| CN115298587B (en) | Polarizing film and image display device | |
| TW201721194A (en) | Composite polarizing plate and liquid crystal panel using the same | |
| KR20150022712A (en) | Optical film, polarizing plate, method of producing polarizing plate, and image display device | |
| TW202138178A (en) | Polarization film, image display device and polarization film production method | |
| TW201721192A (en) | Composite polarizing plate and a liquid crystal display panel using such composite polarizing plate | |
| TW201835608A (en) | Adhesive composition for polarizing films, polarizing film, optical film and image display device | |
| TW202313345A (en) | Polarization film, image display device, and method for producing polarization film | |
| JP2021047359A (en) | Polarizing plate and image display device | |
| CN116034019B (en) | Method for producing molded article | |
| KR102797165B1 (en) | Polarizing plate and image display apparatus comprising same | |
| TW201842099A (en) | Curable resin composition for polarizing films, polarizing film and method for producing same | |
| TW201720644A (en) | Composite polarizing plate and liquid crystal panel using the same | |
| KR102224040B1 (en) | Coating composition, polarizer protecting film, manufacturing method of polarizer protecting film, polarizing plate comprising same and liquid crystal display device comprising same | |
| KR20260010673A (en) | Method for manufacturing laminated optical film | |
| CN120826631A (en) | Polarizing film and method for manufacturing the same | |
| CN116964494A (en) | Curable water-dispersed composition, optical film and image display device |