[go: up one dir, main page]

TW202126118A - Plasma reactor and gas nozzle thereof capable of effectively preventing the occurrence of gas corrosion - Google Patents

Plasma reactor and gas nozzle thereof capable of effectively preventing the occurrence of gas corrosion Download PDF

Info

Publication number
TW202126118A
TW202126118A TW109140208A TW109140208A TW202126118A TW 202126118 A TW202126118 A TW 202126118A TW 109140208 A TW109140208 A TW 109140208A TW 109140208 A TW109140208 A TW 109140208A TW 202126118 A TW202126118 A TW 202126118A
Authority
TW
Taiwan
Prior art keywords
gas
side wall
gas nozzle
groove
gas outlet
Prior art date
Application number
TW109140208A
Other languages
Chinese (zh)
Other versions
TWI777301B (en
Inventor
曹思盛
張潔
志强 劉
左濤濤
Original Assignee
大陸商中微半導體設備(上海)股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商中微半導體設備(上海)股份有限公司 filed Critical 大陸商中微半導體設備(上海)股份有限公司
Publication of TW202126118A publication Critical patent/TW202126118A/en
Application granted granted Critical
Publication of TWI777301B publication Critical patent/TWI777301B/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0278Arrangement or mounting of spray heads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/22Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50Multilayers
    • B05D7/52Two layers
    • B05D7/54No clear coat specified
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

The present invention provides a plasma reactor and a gas nozzle thereof. The plasma reactor has an inner lining. The gas nozzle includes: an insertion part, in which a first end of the insertion part is configured to be inserted into a gas outlet fixed to a pipe, and a second end opposite to the first end is configured to be placed outside the pipe; and a gas outlet part, in which one side surface of the gas outlet part has a mounting groove which faces the second end of the insertion part, the second end of the insertion part is connected to the bottom of the mounting groove, and the opposite side surface of the gas outlet part has a main gas nozzle. The gas nozzle has a main gas injection channel that communicates with the first end of the insertion part and the main gas nozzle. The inner lining has a mounting part for being placed in the mounting groove. The mounting part is located on the surface of the inner lining where the gas outlet is provided, and protrudes from the surface. The technical solution provided by the present invention can effectively prevent the occurrence of gas corrosion.

Description

等離子體反應器及其氣體噴嘴Plasma reactor and its gas nozzle

本發明涉及半導體製造的技術領域,更具體的說,涉及一種等離子體反應器及其氣體噴嘴。The present invention relates to the technical field of semiconductor manufacturing, and more specifically, to a plasma reactor and a gas nozzle thereof.

隨著半導體設備規模的不斷擴大,對製程複雜度的要求也越來越高,腐蝕性氣體廣泛應用於等離子體蝕刻。氣體傳輸管道是等離子體蝕刻室的基本組成部分,不銹鋼和含鋁材料被廣泛應用於輸氣管道、腔室壁和電子穩定控制系統等。等離子體蝕刻過程需要鹵素氣體(如Cl2 、BCl3 )和其他氣體(如COS),然而,這些氣體對不銹鋼和含鋁材料具有嚴重的腐蝕作用。As the scale of semiconductor equipment continues to expand, the requirements for process complexity are getting higher and higher, and corrosive gases are widely used in plasma etching. The gas transmission pipeline is the basic component of the plasma etching chamber, and stainless steel and aluminum-containing materials are widely used in gas transmission pipelines, chamber walls and electronic stability control systems. The plasma etching process requires halogen gases (such as Cl 2 , BCl 3 ) and other gases (such as COS). However, these gases have a serious corrosive effect on stainless steel and aluminum-containing materials.

習知技術中採用碳基材料塗層的方法來隔離等離子體與零件表面的接觸,但是由於製程條件限制,無法使得塗層很好保護等離子體反應器中安裝氣體噴嘴的區域,導致該區域容易受到腐蝕氣體的損壞,降低了等離子體反應器的使用壽命。In the prior art, a carbon-based material coating method is used to isolate the contact between the plasma and the surface of the part. However, due to the limitation of the process conditions, the coating cannot protect the area where the gas nozzle is installed in the plasma reactor well, which makes this area easy Damaged by the corrosive gas, the service life of the plasma reactor is reduced.

有鑑於此,本發明提供了一種等離子體反應器及其氣體噴嘴,有效防止氣體腐蝕現象發生,從而延長等離子體反應器中各種零部件的使用壽命。In view of this, the present invention provides a plasma reactor and its gas nozzle, which can effectively prevent the occurrence of gas corrosion, thereby prolonging the service life of various parts in the plasma reactor.

為實現上述目的,本發明實施例提供如下技術方案: 一種用於等離子體反應器的氣體噴嘴,所述等離子體反應器具有內襯,所述內襯內具有用於氣體傳輸的管道,所述氣體噴嘴包括: 插入部,所述插入部的第一端用於插入固定在所述管道的氣體出口,與所述第一端相對的第二端用於置於所述管道外部; 出氣部,所述出氣部的一側表面具有安裝槽,所述安裝槽朝向所述插入部的第二端,且所述插入部的第二端與所述安裝槽底部連接,所述出氣部相對的另一側表面具有主氣體噴口; 其中,所述氣體噴嘴內具有連通所述插入部第一端與所述主氣體噴口的主氣體噴射通道;所述內襯具有用於放置在所述安裝槽內的安裝部,所述安裝部位於所述內襯具有所述氣體出口的表面,凸出該表面,且環繞所述氣體出口;所述安裝槽的內側壁用於與所述安裝部的外側面相對密封固定。To achieve the foregoing objective, the embodiments of the present invention provide the following technical solutions: A gas nozzle used in a plasma reactor, the plasma reactor has an inner liner, and the inner liner has a pipe for gas transmission, and the gas nozzle includes: An inserting part, the first end of the inserting part is used to insert a gas outlet fixed to the pipe, and the second end opposite to the first end is used to be placed outside the pipe; An air outlet, one side surface of the air outlet is provided with an installation groove, the installation groove faces the second end of the insertion part, and the second end of the insertion part is connected with the bottom of the installation groove, the air outlet The opposite side surface has a main gas nozzle; Wherein, the gas nozzle has a main gas injection channel that communicates the first end of the insertion portion and the main gas nozzle; the inner liner has a mounting portion for being placed in the mounting groove, and the mounting portion It is located on the surface of the inner liner with the gas outlet, protrudes from the surface and surrounds the gas outlet; the inner side wall of the installation groove is used for sealing and fixing with the outer side of the installation part.

較佳的,在上述的氣體噴嘴中,所述安裝槽的側壁厚度由所述安裝槽的底部至所述安裝槽的頂部逐漸減小,或增大,或均勻不變。Preferably, in the above-mentioned gas nozzle, the thickness of the side wall of the installation groove gradually decreases from the bottom of the installation groove to the top of the installation groove, or increases, or remains uniform.

較佳的,在上述的氣體噴嘴中,所述安裝槽側壁的外表面具有至少一個輔助氣體噴口; 所述輔助氣體噴口通過位於所述出氣部內的輔助氣體噴射通道與所述主氣體噴射通道連通。Preferably, in the above-mentioned gas nozzle, the outer surface of the side wall of the installation groove has at least one auxiliary gas nozzle; The auxiliary gas injection port communicates with the main gas injection channel through an auxiliary gas injection channel located in the gas outlet.

較佳的,在上述的氣體噴嘴中,所述安裝槽側壁的外表面具有複數個所述輔助氣體噴口,所述輔助氣體噴口均勻分佈在所述安裝槽側壁的外表面。Preferably, in the above-mentioned gas nozzle, the outer surface of the side wall of the installation groove has a plurality of the auxiliary gas nozzles, and the auxiliary gas nozzles are evenly distributed on the outer surface of the side wall of the installation groove.

較佳的,在上述的氣體噴嘴中,所述輔助氣體噴口位於所述安裝槽側壁的相同高度位置; 所述輔助氣體噴射通道與所述主氣體噴射通道垂直連通;或所述輔助氣體噴射通道與所述主氣體噴射通道斜向連通。Preferably, in the above-mentioned gas nozzle, the auxiliary gas nozzle is located at the same height position of the side wall of the installation groove; The auxiliary gas injection channel is in vertical communication with the main gas injection channel; or the auxiliary gas injection channel is in oblique communication with the main gas injection channel.

較佳的,在上述的氣體噴嘴中,所述輔助氣體噴射通道的軸線通過所述主氣體噴射通道的軸線,或所述輔助氣體噴射通道的軸線與所述主氣體噴射通道的軸線不相交。Preferably, in the above-mentioned gas nozzle, the axis of the auxiliary gas injection channel passes through the axis of the main gas injection channel, or the axis of the auxiliary gas injection channel and the axis of the main gas injection channel do not intersect.

較佳的,在上述的氣體噴嘴中,所述輔助氣體噴射通道的直徑由所述主氣體噴射通道至所述輔助氣體噴口逐漸變小,或逐漸增大,或均勻不變。Preferably, in the above-mentioned gas nozzle, the diameter of the auxiliary gas injection channel gradually decreases from the main gas injection channel to the auxiliary gas injection port, or gradually increases, or is uniform.

較佳的,在上述的氣體噴嘴中,所述主氣體噴射通道的直徑由所述插入部至所述出氣部逐漸變小,或均勻不變。Preferably, in the above-mentioned gas nozzle, the diameter of the main gas injection channel gradually decreases from the insertion portion to the gas outlet portion, or is uniform.

本發明還提供一種等離子體反應器,所述等離子體反應器包括: 反應腔、內襯以及氣體噴嘴,所述氣體噴嘴為上述任一項所述的氣體噴嘴; 所述反應腔包括反應腔側壁,所述反應腔側壁圍成的空間為等離子體環境; 所述內襯位於所述反應腔側壁上,所述內襯內具有用於氣體傳輸的管道;所述氣體噴嘴安裝在所述管道的氣體出口中;所述氣體噴嘴具有安裝槽,所述內襯具有凸出其表面的安裝部,用於放置在所述安裝槽內;所述內襯朝向所述等離子體環境的表面塗覆有第一保護層。The present invention also provides a plasma reactor, which includes: A reaction chamber, an inner liner, and a gas nozzle, the gas nozzle being any one of the above-mentioned gas nozzles; The reaction chamber includes a reaction chamber side wall, and a space enclosed by the reaction chamber side wall is a plasma environment; The inner liner is located on the side wall of the reaction chamber, the inner liner has a pipeline for gas transmission; the gas nozzle is installed in the gas outlet of the pipeline; the gas nozzle has an installation groove, and the inner The liner has a mounting part protruding from its surface for placing in the mounting groove; the surface of the liner facing the plasma environment is coated with a first protective layer.

較佳的,在上述的等離子體反應器中,所述安裝部的側壁外表面具有環繞所述安裝部的凹槽,所述凹槽用於放置第一墊圈,所述第一墊圈用於密封安裝槽側壁的內表面與所述安裝部側壁的外表面。Preferably, in the above-mentioned plasma reactor, the outer surface of the side wall of the mounting portion has a groove surrounding the mounting portion, and the groove is used for placing a first gasket, and the first gasket is used for sealing. The inner surface of the side wall of the installation groove and the outer surface of the side wall of the installation part.

較佳的,在上述的等離子體反應器中,還包括: 第二墊圈,所述第二墊圈設置在所述安裝部頂面與所述安裝槽底部之間,以密封所述安裝部頂面與所述安裝槽底部相對區域; 和/或,第三墊圈,所述第三墊圈設置在所述安裝槽側壁的頂面與所述內襯具有所述氣體出口的一側表面之間,以密封所述安裝槽側壁的頂面與所述內襯具有所述氣體出口的一側表面相對區域。Preferably, in the above-mentioned plasma reactor, it further includes: A second gasket, the second gasket being arranged between the top surface of the mounting portion and the bottom of the mounting groove to seal the area where the top surface of the mounting portion is opposite to the bottom of the mounting groove; And/or, a third gasket, which is arranged between the top surface of the side wall of the installation groove and the side surface of the liner with the gas outlet to seal the top surface of the side wall of the installation groove An area opposite to the side surface of the inner liner with the gas outlet.

較佳的,在上述的等離子體反應器中,所述安裝部高出所述內襯具有所述氣體出口的一側表面。Preferably, in the above-mentioned plasma reactor, the mounting portion is higher than a surface of the inner liner on which the gas outlet is located.

較佳的,在上述的等離子體反應器中,所述內襯具有所述氣體出口的一側表面還有凸起結構,所述凸起結構環繞所述安裝部,且與所述安裝部之間具有間隙,所述安裝槽的側壁置於所述間隙內。Preferably, in the above-mentioned plasma reactor, the inner liner has a convex structure on one side surface of the gas outlet, and the convex structure surrounds the mounting portion and is different from the mounting portion. There is a gap therebetween, and the side wall of the installation groove is placed in the gap.

較佳的,在上述的等離子體反應器中,所述內襯具有所述氣體出口的一側表面內具有容納槽,所述安裝槽的側壁置於所述容納槽內,所述容納槽環繞所述氣體出口,所述容納槽與所述氣體出口之間的所述容納槽側壁為所述安裝部。Preferably, in the above-mentioned plasma reactor, the inner liner has a containing groove in the side surface with the gas outlet, the side wall of the installation groove is placed in the containing groove, and the containing groove surrounds The gas outlet, the side wall of the containing groove between the containing groove and the gas outlet is the mounting part.

較佳的,在上述的等離子體反應器中,所述第一保護層的材料包括:氧化釔。Preferably, in the above-mentioned plasma reactor, the material of the first protective layer includes yttrium oxide.

較佳的,在上述的等離子體反應器中,所述氣體出口側壁塗覆有第二保護層,所述第二保護層的材料包括:特氟龍。Preferably, in the above-mentioned plasma reactor, the side wall of the gas outlet is coated with a second protective layer, and the material of the second protective layer includes: Teflon.

較佳的,所述第一墊圈的材料為特氟龍塑膠。Preferably, the material of the first gasket is Teflon plastic.

與習知技術相比,本發明技術方案具有以下優點: 本發明技術方案中,設置噴嘴具有安裝槽,可以與內襯表面凸起的安裝部相互嵌套密封,在氣體出口外部形成密封結構,延長了等離子體的擴散路徑,使得等離子體在向管道內擴散路徑中逐漸熄滅,避免等離子體對氣體出口側壁的腐蝕。而且由於內襯表面具有凸起的安裝部,該凸起安裝部外朝向所述安裝槽的外表面能夠通過PS製程形成氧化釔塗層,即便發生等離子體擴散問題,等離子體首先接觸也是安裝部外表面的耐等離子體腐蝕的氧化釔塗層,可以很好的防止等離子體腐蝕問題。避免了管道的鋁基材由於表面保護層被腐蝕而暴露出來的問題,可以有效防止金屬污染。Compared with the conventional technology, the technical solution of the present invention has the following advantages: In the technical scheme of the present invention, the nozzle is provided with a mounting groove, which can be nested and sealed with the mounting part on the surface of the lining, forming a sealing structure outside the gas outlet, extending the diffusion path of the plasma, and making the plasma flow in the pipeline. The diffusion path is gradually extinguished to prevent the plasma from corroding the side wall of the gas outlet. Moreover, since the surface of the lining has a convex mounting part, the convex mounting part facing the outer surface of the mounting groove can form a yttrium oxide coating through the PS process. Even if the plasma diffusion problem occurs, the first contact of the plasma is the mounting part. The plasma corrosion-resistant yttrium oxide coating on the outer surface can well prevent plasma corrosion problems. The problem that the aluminum substrate of the pipeline is exposed due to the corrosion of the surface protective layer is avoided, and metal pollution can be effectively prevented.

下面將結合本發明實施例中的附圖,對本發明實施例中的進行清楚、完整地描述,顯然,所描述的實施例僅僅是本發明一部分實施例,而不是全部的實施例。基於本發明中的實施例,本領域通常知識者在沒有做出進步性勞動前提下所獲得的所有其他實施例,都屬於本發明保護的範圍。The following describes the embodiments of the present invention clearly and completely with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person skilled in the art without making progressive work shall fall within the protection scope of the present invention.

如圖1所示,圖1為一種氣體噴嘴連接內襯的截面圖。圖1所示方式中,氣體噴嘴15通過卡環(圖中未示出)固定在等離子體反應器的氣體出口處,該氣體噴嘴15具有第一墊圈17、第二墊圈20、第三墊圈16以及連通氣體噴嘴15的主氣體噴射通道10,其中,在氣體噴嘴15與氣體出口之間的間隙用第一墊圈17、第二墊圈20以及第三墊圈16進行密封,該等離子體反應器具有內襯14、第二保護層13、氣體傳輸管道12以及在等離子體反應器氣體出口的一側表面具有第一保護層19,其中,氣體傳輸管道12用於傳輸腐蝕性氣體。As shown in Figure 1, Figure 1 is a cross-sectional view of a gas nozzle connected to the inner liner. In the manner shown in FIG. 1, the gas nozzle 15 is fixed at the gas outlet of the plasma reactor by a snap ring (not shown in the figure). The gas nozzle 15 has a first gasket 17, a second gasket 20, and a third gasket 16. And the main gas injection passage 10 communicating with the gas nozzle 15, wherein the gap between the gas nozzle 15 and the gas outlet is sealed with a first gasket 17, a second gasket 20, and a third gasket 16. The plasma reactor has an inner The liner 14, the second protective layer 13, the gas transmission pipe 12, and the first protective layer 19 are provided on one side surface of the gas outlet of the plasma reactor, wherein the gas transmission pipe 12 is used for transmitting corrosive gas.

圖1所示方式中,通過主氣體噴射通道10將所述氣體傳輸管道12內的氣體噴出進入反應腔內形成等離子體。等離子體中具有自由基分子11,該自由基分子11對第二保護層13具有腐蝕作用,自由基分子11從間隙中進入氣體傳輸管道12,導致保護層侵蝕點18被腐蝕,降低了第二保護層13的使用壽命。侵蝕點18位置由於氣體噴嘴15和其他出口之間不能實現完全密封以及部件棱角位置保護層覆蓋品質差等原因,容易受到腐蝕。In the method shown in FIG. 1, the gas in the gas transmission pipe 12 is ejected into the reaction chamber through the main gas ejection channel 10 to form plasma. There are free radical molecules 11 in the plasma. The free radical molecules 11 have a corrosive effect on the second protective layer 13. The service life of the protective layer 13. The location of the erosion point 18 is vulnerable to corrosion due to the inability to achieve a complete seal between the gas nozzle 15 and other outlets and the poor quality of the protective layer covering the corners of the components.

需要說明的是,所述第一保護層的材料包括氧化釔,所述第二保護層的材料包括特氟龍。It should be noted that the material of the first protective layer includes yttrium oxide, and the material of the second protective layer includes Teflon.

如圖2所示,圖2為另一種氣體噴嘴連接內襯的截面圖。圖2所示方式中,氣體噴嘴25通過卡環(圖中未示出)固定在等離子體反應器的氣體出口處,在氣體噴嘴25與氣體出口之間的間隙用墊圈和O型圈進行密封,該氣體噴嘴25具有主氣體噴射通道28,該等離子體反應器具有內襯24、第二保護層23、氣體傳輸管道22以及室壁27,其中,氣體傳輸管道22用於傳輸腐蝕性氣體。As shown in Figure 2, Figure 2 is a cross-sectional view of another gas nozzle connected to the inner liner. In the method shown in FIG. 2, the gas nozzle 25 is fixed at the gas outlet of the plasma reactor by a snap ring (not shown in the figure), and the gap between the gas nozzle 25 and the gas outlet is sealed with a gasket and an O-ring. The gas nozzle 25 has a main gas injection channel 28, and the plasma reactor has an inner lining 24, a second protective layer 23, a gas transmission pipe 22 and a chamber wall 27, wherein the gas transmission pipe 22 is used to transmit corrosive gas.

圖2所示方式中,在理想狀況下,氣體出口內表面用墊圈與等離子體或自由基分子21隔離。該方式僅能一定程度上改善腐蝕問題,但是改善效果較差,仍然不能保證完全密封效果以及由於棱角處膜層覆蓋差導致的第二保護層23在侵蝕點易被腐蝕的問題。In the method shown in FIG. 2, under ideal conditions, the inner surface of the gas outlet is separated from the plasma or free radical molecules 21 with a gasket. This method can only improve the corrosion problem to a certain extent, but the improvement effect is poor, and it still cannot guarantee the complete sealing effect and the problem that the second protective layer 23 is easily corroded at the corrosion point due to the poor film coverage at the corners.

上述兩種方式描述的氣體噴嘴都不能很好的改善自由基分子進入氣體傳輸管道,導致氣體出口表面第二保護層腐蝕的問題。The gas nozzles described in the above two methods can not well improve the problem of free radical molecules entering the gas transmission pipeline, resulting in the corrosion of the second protective layer on the surface of the gas outlet.

為了解決上述問題,本發明提供一種等離子體反應器及其氣體噴嘴,所述等離子體反應器具有內襯,所述內襯內具有用於氣體傳輸的管道,所述氣體噴嘴包括: 插入部,所述插入部的第一端用於插入固定在所述管道的氣體出口,與所述第一端相對的第二端用於置於所述管道外部; 出氣部,所述出氣部的一側表面具有安裝槽,所述安裝槽朝向所述插入部的第二端,且所述插入部的第二端與所述安裝槽底部連接,所述出氣部相對的另一側表面具有主氣體噴口; 其中,所述氣體噴嘴內具有連通所述插入部第一端與所述主氣體噴口的主氣體噴射通道;所述內襯具有用於放置在所述安裝槽內的安裝部,所述安裝部位於所述內襯具有所述氣體出口的表面,凸出該表面,且環繞所述氣體出口;所述安裝槽的內側壁用於與所述安裝部的外側面相對密封固定。In order to solve the above-mentioned problems, the present invention provides a plasma reactor and a gas nozzle thereof. The plasma reactor has an inner liner, and the inner liner has a pipe for gas transmission. The gas nozzle includes: An inserting part, the first end of the inserting part is used to insert a gas outlet fixed to the pipe, and the second end opposite to the first end is used to be placed outside the pipe; An air outlet, one side surface of the air outlet is provided with an installation groove, the installation groove faces the second end of the insertion part, and the second end of the insertion part is connected with the bottom of the installation groove, the air outlet The opposite side surface has a main gas nozzle; Wherein, the gas nozzle has a main gas injection channel that communicates the first end of the insertion portion and the main gas nozzle; the inner liner has a mounting portion for being placed in the mounting groove, and the mounting portion It is located on the surface of the inner liner with the gas outlet, protrudes from the surface and surrounds the gas outlet; the inner side wall of the installation groove is used for sealing and fixing with the outer side of the installation part.

由此可知,本發明提供的技術方案中,在等離子體反應器中氣體出口處具有凸出的安裝部,凸出的安裝部與凹形氣體噴嘴連接,凹形氣體噴嘴插入氣體出口中。通過氣體噴嘴和安裝部的凹凸嵌套設計結構,可以有效提高氣體噴嘴與氣體出口結合位置的密封性,有效改善等離子體中自由基分子對所述結合位置腐蝕的問題。It can be seen from this that, in the technical solution provided by the present invention, the gas outlet in the plasma reactor has a protruding installation part, the protruding installation part is connected with the concave gas nozzle, and the concave gas nozzle is inserted into the gas outlet. Through the concave-convex nested design structure of the gas nozzle and the mounting part, the sealing performance of the joint position of the gas nozzle and the gas outlet can be effectively improved, and the problem of corrosion of the joint position by free radical molecules in the plasma can be effectively improved.

另外,在本發明提供的技術方案中,進一步的,還可以通過在氣體噴嘴的側壁設置輔助氣體噴射通道,氣體可以同時從主氣體噴射通道和輔助氣體噴射通道噴出,而側噴氣體可以將噴嘴四周的反應腔內的等離子體吹離氣體出口,從而抑制了自由基分子擴散對氣體出口內表面第二保護層的損傷,從而防止氣體腐蝕第二保護層問題的發生。In addition, in the technical solution provided by the present invention, further, an auxiliary gas injection channel can be provided on the side wall of the gas nozzle, and the gas can be ejected from the main gas injection channel and the auxiliary gas injection channel at the same time, and the side injection gas can spray the nozzle The plasma in the surrounding reaction chamber is blown away from the gas outlet, thereby inhibiting the damage of the second protective layer on the inner surface of the gas outlet by the diffusion of free radical molecules, thereby preventing the occurrence of the problem of gas corrosion of the second protective layer.

為使本發明的上述目的、特徵和優點能夠更加明顯易懂,下面結合附圖和具體實施方式對本發明作進一步詳細的說明。In order to make the above-mentioned objects, features and advantages of the present invention more obvious and understandable, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

實施例一Example one

參考圖3和圖4,圖3為本發明提供的一種凸形內襯連接凹形氣體噴嘴的截面圖,圖4為本發明提供的一種凸形內襯氣體出口處的截面圖。Referring to Figures 3 and 4, Figure 3 is a cross-sectional view of a convex liner provided by the present invention connected to a concave gas nozzle, and Figure 4 is a cross-sectional view of a convex liner provided by the present invention at the gas outlet.

如圖3所示,等離子體反應器中氣體出口處的凸形內襯與凹形氣體噴嘴連接,凹形氣體噴嘴插入氣體出口中。通過氣體噴嘴和內襯的凹凸嵌套設計結構,可以有效提高氣體噴嘴與氣體出口結合位置的密封性,有效改善等離子體中自由基分子對所述結合位置腐蝕的問題。As shown in Figure 3, the convex lining at the gas outlet in the plasma reactor is connected with the concave gas nozzle, and the concave gas nozzle is inserted into the gas outlet. Through the concave-convex nested design structure of the gas nozzle and the inner lining, the sealing performance of the joint position of the gas nozzle and the gas outlet can be effectively improved, and the problem of corrosion of the joint position by free radical molecules in the plasma can be effectively improved.

具體的,所述等離子體反應器具有內襯33,所述內襯33內具有用於氣體傳輸的管道31。Specifically, the plasma reactor has an inner lining 33, and the inner lining 33 has a pipe 31 for gas transmission.

所述氣體噴嘴35包括:插入部00,所述插入部00的第一端用於插入固定在所述管道31的氣體出口處,與所述第一端相對的第二端用於置於所述管道31外部;出氣部39,所述出氣部39的一側表面具有安裝槽45,所述安裝槽45朝向所述插入部00的第二端,且所述插入部00的第二端與所述安裝槽45底部連接,所述出氣部39相對的另一側表面具有主氣體噴口;其中,所述氣體噴嘴35內具有連通所述插入部00第一端與所述主氣體噴口的主氣體噴射通道40;所述內襯33具有用於放置在所述安裝槽45內的安裝部41,所述安裝部41位於所述內襯33具有所述氣體出口的表面,凸出該表面,且環繞所述氣體出口;所述安裝槽45的內側壁用於與所述安裝部41的外側面相對密封固定。The gas nozzle 35 includes an insertion part 00, a first end of the insertion part 00 is used to be inserted and fixed at the gas outlet of the pipe 31, and a second end opposite to the first end is used to be placed in the The outside of the pipe 31; the outlet portion 39, one side surface of the outlet portion 39 has a mounting groove 45, the mounting groove 45 faces the second end of the insertion portion 00, and the second end of the insertion portion 00 and The bottom of the mounting groove 45 is connected, and the opposite surface of the gas outlet 39 has a main gas nozzle; wherein the gas nozzle 35 has a main gas nozzle that communicates the first end of the insertion portion 00 and the main gas nozzle. Gas injection channel 40; the lining 33 has a mounting portion 41 for placing in the mounting groove 45, the mounting portion 41 is located on the surface of the lining 33 with the gas outlet, protruding from the surface, And surround the gas outlet; the inner side wall of the mounting groove 45 is used for sealing and fixing the outer side of the mounting portion 41.

如圖3和圖4中所示,還具有第二保護層32、第一保護層34。為了進一步提高密封性,還包括第一墊圈36、第二墊圈38以及第三墊圈37。其中這三層墊圈的材料均為特氟龍塑膠,均用於密封,防止氣體洩漏。As shown in FIG. 3 and FIG. 4, there are also a second protective layer 32 and a first protective layer 34. In order to further improve the sealing performance, a first gasket 36, a second gasket 38, and a third gasket 37 are further included. The materials of these three-layer gaskets are all Teflon plastics, which are used for sealing to prevent gas leakage.

需要說明的是,所述第二保護層32可以為特氟龍,所述第一保護層34可以為氧化釔。其中,氧化釔具有抗腐蝕性氣體腐蝕的作用,但是由於塗噴技術限制,形成第一保護層34時,氧化釔材料不能完美地在深寬比較大的孔中進行噴塗。而本發明實施例中,由於所述內襯33外表面的安裝部41為凸起結構,故氧化釔材料可以成功地噴射到內襯33凸出的外表面上。具有凸起安裝部41的內襯33與安裝槽45的氣體噴嘴35配合,第二保護層32被保護在第一墊圈36、第二墊圈38以及第三墊圈37後面,密封區由氣體出口內表面移到了氣體出口的外表面,即使在最壞的情況下,三層墊圈都無法密封時,繞阻擴散路徑也會增強對自由基分子阻擋效果,大大降低其對第二保護層32的腐蝕,增加內襯33與第二保護層32的使用壽命。It should be noted that the second protective layer 32 may be Teflon, and the first protective layer 34 may be yttrium oxide. Among them, yttrium oxide has the effect of resisting corrosive gas corrosion, but due to the limitation of spraying technology, when forming the first protective layer 34, the yttrium oxide material cannot be sprayed perfectly in the relatively large depth and width holes. However, in the embodiment of the present invention, since the mounting portion 41 on the outer surface of the inner liner 33 is a convex structure, the yttrium oxide material can be successfully sprayed onto the convex outer surface of the inner liner 33. The inner liner 33 with the protruding mounting portion 41 is matched with the gas nozzle 35 of the mounting groove 45. The second protective layer 32 is protected behind the first gasket 36, the second gasket 38 and the third gasket 37. The sealing area is formed by the gas outlet. The surface has moved to the outer surface of the gas outlet. Even in the worst case, when the three-layer gasket cannot be sealed, the winding diffusion path will also enhance the barrier effect to free radical molecules, greatly reducing its corrosion to the second protective layer 32 , Increase the service life of the inner lining 33 and the second protective layer 32.

所述內襯33的結構與所述氣體噴嘴35的結構匹配,二者可以相互嵌套安裝固定。所述內襯33設置有所述氣體出口的表面具有用於置於所述安裝槽45內的安裝部41,所述安裝部41環繞所述氣體出口。其中,所述安裝部41的外側壁設置有凹槽42,所述凹槽42用於安裝第一墊圈。另外,圖4中還示出了氣體傳輸的管道31、第二保護層32以及第一保護層34。The structure of the inner lining 33 matches the structure of the gas nozzle 35, and the two can be nested and fixed to each other. The surface of the inner liner 33 provided with the gas outlet has a mounting portion 41 for being placed in the mounting groove 45, and the mounting portion 41 surrounds the gas outlet. Wherein, a groove 42 is provided on the outer side wall of the mounting portion 41, and the groove 42 is used to install the first gasket. In addition, FIG. 4 also shows a gas transmission pipe 31, a second protective layer 32 and a first protective layer 34.

在圖3和圖4所示方式中,所述安裝槽45的側壁厚度由所述安裝槽的底部至所述安裝槽45的頂部逐漸減小,其他方式中,也可以逐漸增大或均勻不變。In the manner shown in FIGS. 3 and 4, the thickness of the side wall of the installation groove 45 gradually decreases from the bottom of the installation groove to the top of the installation groove 45. In other manners, it may also be gradually increased or evenly uneven. Change.

如圖5所示,圖5為本發明提供的凸形內襯與凹形氣體噴嘴在氣體出口處的連接結構的截面圖。圖5(a)和圖5(c)中,所述安裝槽45的側壁厚度d由所述安裝槽45的底部至所述安裝槽45的頂部均勻不變。而圖5(b)中,所述安裝槽45的側壁厚度d由所述安裝槽45的底部至所述安裝槽45的頂部逐漸增大。As shown in FIG. 5, FIG. 5 is a cross-sectional view of the connection structure of the convex liner and the concave gas nozzle at the gas outlet provided by the present invention. In FIG. 5(a) and FIG. 5(c), the thickness d of the side wall of the installation groove 45 is uniform from the bottom of the installation groove 45 to the top of the installation groove 45. In FIG. 5( b ), the thickness d of the side wall of the installation groove 45 gradually increases from the bottom of the installation groove 45 to the top of the installation groove 45.

本發明方案中,採用凹形結構和凸形結構相互配合的連接結構,通過將凸形結構的襯底與凹形結構的氣體噴嘴相配合,密封區由氣體出口內表面移動到氣體出口外表面,可以有效提高氣體噴嘴與氣體出口結合位置的密封性,有效改善等離子體中自由基分子對所述結合位置腐蝕的問題。In the solution of the present invention, a connection structure in which a concave structure and a convex structure cooperate with each other is adopted. By matching the substrate of the convex structure with the gas nozzle of the concave structure, the sealing area moves from the inner surface of the gas outlet to the outer surface of the gas outlet , It can effectively improve the sealing performance of the joint position of the gas nozzle and the gas outlet, and effectively improve the problem of the free radical molecules in the plasma corroding the joint position.

根據上述描述可知,本發明技術方案中,設置噴嘴具有安裝槽,可以與內襯表面凸起的安裝部相互嵌套密封,在氣體出口外部形成密封結構,延長了等離子體的擴散路徑,使得等離子體在向管道內擴散路徑中逐漸熄滅,避免等離子體對氣體出口側壁的腐蝕。而且由於內襯表面具有凸起的安裝部,該凸起安裝部外朝向所述安裝槽的外表面能夠通過PS製程形成氧化釔塗層,即便發生等離子體擴散問題,等離子體首先接觸也是安裝部外表面的耐等離子體腐蝕的氧化釔塗層,可以很好的防止等離子體腐蝕問題。避免了管道的鋁基材由於表面保護層被腐蝕而暴露出來的問題,可以有效防止金屬污染。According to the above description, in the technical solution of the present invention, the nozzle is provided with a mounting groove, which can be nested and sealed with the raised mounting part on the surface of the lining, forming a sealing structure outside the gas outlet, extending the diffusion path of the plasma, and making the plasma The body is gradually extinguished in the diffusion path into the pipe to avoid the corrosion of the side wall of the gas outlet by the plasma. Moreover, since the surface of the lining has a convex mounting part, the convex mounting part facing the outer surface of the mounting groove can form a yttrium oxide coating through the PS process. Even if the plasma diffusion problem occurs, the first contact of the plasma is the mounting part. The plasma corrosion-resistant yttrium oxide coating on the outer surface can well prevent plasma corrosion problems. The problem that the aluminum substrate of the pipeline is exposed due to the corrosion of the surface protective layer is avoided, and metal pollution can be effectively prevented.

實施例二Example two

為了防止避免等離子體中自由基分子導致的腐蝕,本發明實施例還提供了另一種氣體噴嘴。In order to prevent corrosion caused by free radical molecules in the plasma, another gas nozzle is provided in the embodiment of the present invention.

參考圖6和圖7,圖6為本發明提供的一種氣體噴嘴的截面圖,圖7為本發明提供的氣體噴嘴中主氣體噴射通道與輔助氣體噴射通道的設計結構圖。6 and 7, FIG. 6 is a cross-sectional view of a gas nozzle provided by the present invention, and FIG. 7 is a design structure diagram of the main gas injection channel and the auxiliary gas injection channel in the gas nozzle provided by the present invention.

如圖6所示,等離子體反應器中氣體出口處氣體噴嘴55插入氣體傳輸的管道52中。所述等離子體反應器具有內襯54,所述內襯54內具有用於氣體傳輸的管道52,所述氣體噴嘴55包括:插入部00,所述插入部00的第一端用於插入固定在所述管道52的氣體出口處,與所述第一端相對的第二端用於置於所述管道52外部。出氣部60,所述插入部00的第一端用於插入固定在所述管道52的氣體出口處,所述插入部00的第二端連接固定所述出氣部60,所述出氣部60位於所述氣體出口位置。As shown in Fig. 6, the gas nozzle 55 at the gas outlet of the plasma reactor is inserted into the gas transmission pipe 52. The plasma reactor has an inner liner 54 with a pipe 52 for gas transmission in the inner liner 54. The gas nozzle 55 includes an insertion part 00, and a first end of the insertion part 00 is used for inserting and fixing. At the gas outlet of the pipe 52, the second end opposite to the first end is used to be placed outside the pipe 52. The first end of the insertion part 00 is used to insert and fix the gas outlet of the pipe 52, and the second end of the insertion part 00 is connected and fixed to the gas outlet 60, and the gas outlet 60 is located The position of the gas outlet.

在圖6和圖7所示方式中,所述出氣部60與所述內襯54相對的表面均為平面。也可以如實施例中,所述出氣部60與所述內襯54通過上述凹凸嵌套結構相互固定,以提高密封性。In the manner shown in FIGS. 6 and 7, the surfaces of the air outlet 60 and the inner liner 54 opposite to each other are flat. Alternatively, as in the embodiment, the air outlet portion 60 and the inner liner 54 are fixed to each other through the above-mentioned concave-convex nesting structure to improve the sealing performance.

所述出氣部60的頂部具有主氣體噴口;其中,所述氣體噴嘴55內具有連通所述插入部00第一端與所述主氣體噴口的主氣體噴射通道57。如圖6和圖7所示,還具有第二保護層53、室壁56以及自由基分子51。The top of the gas outlet 60 has a main gas nozzle; wherein the gas nozzle 55 has a main gas injection passage 57 that communicates the first end of the insertion portion 00 and the main gas nozzle. As shown in FIGS. 6 and 7, there is also a second protective layer 53, a chamber wall 56 and free radical molecules 51.

如上述實施例,所述安裝槽的側壁厚度可以由所述安裝槽的底部至所述安裝槽的頂部逐漸減小,或增大,或均勻不變。As in the above embodiment, the thickness of the side wall of the installation groove may gradually decrease from the bottom of the installation groove to the top of the installation groove, or increase, or be uniform.

如圖6-圖7所示,所述安裝槽側壁的外表面具有至少一個輔助氣體噴口58;所述輔助氣體噴口58通過位於所述出氣部內的輔助氣體噴射通道59與所述主氣體噴射通道57連通。如圖6所示,通過所述輔助氣體噴口58朝向所述出氣部60四周噴出氣體,可以將腔室內的等離子體吹離所述氣體噴嘴55的四周,以減少等離子體中自由基分子對氣體噴嘴55與氣體出口相對位置處第二保護層的腐蝕。As shown in FIGS. 6-7, the outer surface of the side wall of the installation groove has at least one auxiliary gas injection port 58; the auxiliary gas injection port 58 passes through the auxiliary gas injection channel 59 located in the gas outlet part and the main gas injection channel 57 connected. As shown in FIG. 6, the auxiliary gas nozzle 58 sprays gas toward the periphery of the gas outlet 60, and the plasma in the chamber can be blown away from the periphery of the gas nozzle 55, so as to reduce the effect of radical molecules on the gas in the plasma. Corrosion of the second protective layer at the position where the nozzle 55 is opposite to the gas outlet.

如圖6-圖7所示所述安裝槽側壁的外表面具有複數個所述輔助氣體噴口58,所述輔助氣體噴口58均勻分佈在所述安裝槽側壁的外表面。所述輔助氣體噴口58的數量可以基於需求進行設置。複數個所述輔助氣體噴口58均勻分佈在所述安裝槽側壁的外表面,可以使得噴嘴四周的等離子體被均勻吹散開。As shown in FIGS. 6-7, the outer surface of the side wall of the installation groove has a plurality of auxiliary gas nozzles 58, which are evenly distributed on the outer surface of the side wall of the installation groove. The number of the auxiliary gas nozzles 58 can be set based on requirements. The plurality of auxiliary gas nozzles 58 are evenly distributed on the outer surface of the side wall of the installation groove, so that the plasma around the nozzle can be evenly blown away.

一種方式中,如圖7(a),所述輔助氣體噴口58位於所述安裝槽側壁的相同高度位置;圖7(a)中左圖為出氣部60朝向主氣體噴口的俯視圖,右圖為氣體噴嘴55的切面圖。如圖7(a)中右圖所示,所述輔助氣體噴射通道59與所述主氣體噴射通道57垂直連通。In one way, as shown in Fig. 7(a), the auxiliary gas nozzle 58 is located at the same height position of the side wall of the installation groove; the left picture in Fig. 7(a) is a top view of the gas outlet 60 facing the main gas nozzle, and the right picture is A cross-sectional view of the gas nozzle 55. As shown in the right diagram in FIG. 7( a ), the auxiliary gas injection passage 59 is in vertical communication with the main gas injection passage 57.

一種方式中,如圖7(f),所述輔助氣體噴射通道59與所述主氣體噴射通道57斜向連通。如圖7(f)所示。該方式中,較佳的設置所述輔助氣體噴射通道59背離主氣體噴射通道57方向傾斜,這樣可以使得輔助氣體噴射通道59出射氣體朝向內襯54噴射,更好的防止等離子體中自由基分子對氣體出口內第二保護層的腐蝕。In one manner, as shown in FIG. 7( f ), the auxiliary gas injection passage 59 is in oblique communication with the main gas injection passage 57. As shown in Figure 7(f). In this manner, the auxiliary gas injection channel 59 is preferably arranged to be inclined away from the main gas injection channel 57, so that the gas emitted from the auxiliary gas injection channel 59 can be injected toward the lining 54 to better prevent free radical molecules in the plasma. Corrosion of the second protective layer in the gas outlet.

一種方式中,如圖7(a)左圖、圖7(b)和7(d)所示,所述輔助氣體噴射通道59的軸線通過所述主氣體噴射通道57的軸線。In one manner, as shown in the left diagram of FIG. 7(a) and FIGS. 7(b) and 7(d), the axis of the auxiliary gas injection passage 59 passes through the axis of the main gas injection passage 57.

一種方式中,如圖7(c)所示,所述輔助氣體噴射通道59的軸線與所述主氣體噴射通道57的軸線不相交。In one manner, as shown in FIG. 7( c ), the axis of the auxiliary gas injection channel 59 and the axis of the main gas injection channel 57 do not intersect.

一種方式中,如圖7(d)中左圖所示,所述輔助氣體噴射通道59的直徑由所述主氣體噴射通道57至所述輔助氣體噴口58逐漸變小,以增大噴射壓力,或如圖7(d)中右圖所示,所述輔助氣體噴射通道59的直徑由所述主氣體噴射通道57至所述輔助氣體噴口58逐漸減小,或增大,或均勻不變,或如圖7(a)中左圖、圖7(b)和圖7(c)所示,所述輔助氣體噴射通道59的直徑均勻不變。In one way, as shown in the left diagram in Fig. 7(d), the diameter of the auxiliary gas injection passage 59 gradually decreases from the main gas injection passage 57 to the auxiliary gas injection port 58, to increase the injection pressure, Or as shown in the right figure in Figure 7(d), the diameter of the auxiliary gas injection passage 59 gradually decreases from the main gas injection passage 57 to the auxiliary gas injection port 58, or increases, or remains uniform, Or, as shown in the left image of FIG. 7(a), FIG. 7(b), and FIG. 7(c), the diameter of the auxiliary gas injection channel 59 is uniform.

一種方式中,如圖7(e)中所示,所述主氣體噴射通道57的直徑由所述插入部至所述出氣部逐漸變小,以增大噴射壓力,或如圖7(a)中右圖所示,均勻不變。如圖7(e)所示。In one way, as shown in FIG. 7(e), the diameter of the main gas injection passage 57 gradually decreases from the insertion portion to the gas outlet portion to increase the injection pressure, or as shown in FIG. 7(a) As shown in the right figure, it is uniform and unchanged. As shown in Figure 7 (e).

需要說明的是,為了控制氣體的流動分佈,所述主氣體噴射通道57與所述輔助氣體噴射通道59的尺寸以及孔徑結構可以基於需求進行設計,其中,氣體出口的總流量大於或者等於主氣體噴射通道57與輔助氣體噴射通道59的氣體的流量之和。It should be noted that in order to control the gas flow distribution, the size and aperture structure of the main gas injection channel 57 and the auxiliary gas injection channel 59 can be designed based on requirements, wherein the total flow rate of the gas outlet is greater than or equal to the main gas The sum of the gas flow rates of the injection passage 57 and the auxiliary gas injection passage 59.

通過上述描述可知,本發明實施例中,為了防止氣體腐蝕,通過在氣體噴嘴側壁設置輔助氣體噴射通道,這樣氣體可以同時通過輔助氣體噴射通道與所述主氣體噴射通道噴出,有效減小由於主氣體噴射通道噴射壓力較大導致的氣流衝擊,而且通過輔助氣體噴口噴出的氣體可以將氣體出口處的等離子體中的自由基分子吹離氣體出口,從而抑制了自由基分子擴散對氣體出口內表面第二保護層的損傷,從而防止氣體腐蝕第二保護層問題的發生。It can be seen from the above description that in the embodiment of the present invention, in order to prevent gas corrosion, an auxiliary gas injection channel is provided on the side wall of the gas nozzle, so that the gas can be ejected through the auxiliary gas injection channel and the main gas injection channel at the same time, effectively reducing the The gas injection channel has a large injection pressure caused by the gas flow impact, and the gas ejected through the auxiliary gas nozzle can blow the free radical molecules in the plasma at the gas outlet away from the gas outlet, thereby inhibiting the diffusion of free radical molecules on the inner surface of the gas outlet Damage to the second protective layer, thereby preventing the occurrence of the problem of gas corrosion of the second protective layer.

實施例三Example three

基於上述描述,本發明另一個實施例還提供了一種等離子體反應器。Based on the above description, another embodiment of the present invention also provides a plasma reactor.

參考圖8,圖8為本發明提供的一種等離子體反應器氣體出口處氣體噴嘴的截面圖。Referring to Fig. 8, Fig. 8 is a cross-sectional view of a gas nozzle at the gas outlet of a plasma reactor provided by the present invention.

如圖8所示,所述等離子體反應器包括:反應腔、內襯63以及氣體噴嘴65,所述氣體噴嘴65為上述實施例中描述的氣體噴嘴;所述反應腔包括反應腔側壁,所述反應腔側壁圍成的空間為等離子體環境;所述內襯63位於所述反應腔側壁上,所述內襯63內具有用於氣體傳輸的管道61,所述氣體噴嘴65安裝在所述管道61的氣體出口中;所述氣體噴嘴65具有安裝槽45,所述內襯63具有凸出其表面的安裝部41,用於放置在所述安裝槽45內;所述內襯63朝向所述等離子體環境的表面塗覆有第一保護層64。該內襯63具有用於放置在所述安裝槽45內的安裝部41,所述安裝部41位於所述內襯63具有所述氣體出口的表面,凸出該表面,且安裝部41環繞氣體出口設置,氣體噴嘴65可以通過安裝部41安裝在氣體出口,與之匹配的所述內襯63結構也可以參考上述實施例所述方式結構。As shown in FIG. 8, the plasma reactor includes a reaction chamber, a lining 63, and a gas nozzle 65. The gas nozzle 65 is the gas nozzle described in the above-mentioned embodiment; the reaction chamber includes the side wall of the reaction chamber. The space enclosed by the side walls of the reaction chamber is a plasma environment; the inner lining 63 is located on the side walls of the reaction chamber, the inner lining 63 has a pipe 61 for gas transmission, and the gas nozzle 65 is installed in the The gas outlet of the pipe 61; the gas nozzle 65 has a mounting groove 45, the lining 63 has a mounting portion 41 protruding from its surface, for being placed in the mounting groove 45; the lining 63 faces the The surface of the plasma environment is coated with a first protective layer 64. The lining 63 has a mounting portion 41 for placing in the mounting groove 45. The mounting portion 41 is located on the surface of the lining 63 with the gas outlet, protruding from the surface, and the mounting portion 41 surrounds the gas. The outlet is provided, and the gas nozzle 65 can be installed on the gas outlet through the mounting portion 41, and the structure of the inner liner 63 matched with it can also refer to the manner and structure described in the above-mentioned embodiment.

其中,所述第一保護層64的材料可以為氧化釔。Wherein, the material of the first protective layer 64 may be yttrium oxide.

另外,在所述氣體出口側壁還塗覆有第二保護層,所述第二保護層的材料可以為特氟龍。In addition, a second protective layer is also coated on the side wall of the gas outlet, and the material of the second protective layer may be Teflon.

需要說明的是,第一保護層64可以耐等離子體腐蝕,但是由於製備製程的限制,不能在深寬比較大的出氣口和管道內形成,所以在內襯63朝向等離子體環境的表面塗覆第一保護層64。另外,在氣體出口側壁以及管道61內表面塗覆第二保護層,所述管道61內充滿了腐蝕性氣體,第二保護層62具有防管道內氣體腐蝕的作用,其用於保護襯裡63不受氣體腐蝕。It should be noted that the first protective layer 64 can be resistant to plasma corrosion, but due to the limitation of the preparation process, it cannot be formed in the gas outlet and pipe with a relatively large depth and width, so the surface of the lining 63 facing the plasma environment is coated First protection layer 64. In addition, a second protective layer is coated on the side walls of the gas outlet and the inner surface of the pipe 61. The pipe 61 is filled with corrosive gas. The second protective layer 62 has the function of preventing gas corrosion in the pipe. It is used to protect the lining 63 from Corroded by gas.

本發明實施例中,在安裝部00的側壁外表面具有環繞所述安裝部41的凹槽,所述凹槽用於放置第一墊圈66,所述第一墊圈66用於密封安裝槽45側壁的內表面與所述安裝部41側壁的外表面。其中,所述第一墊圈66的材料可以為特種塑膠,耐等離子體腐蝕,如可以為特氟龍塑膠。In the embodiment of the present invention, the outer surface of the side wall of the mounting portion 00 has a groove surrounding the mounting portion 41, the groove is used to place the first gasket 66, and the first gasket 66 is used to seal the side wall of the installation groove 45 The inner surface of the mounting portion 41 and the outer surface of the side wall of the mounting portion 41. Wherein, the material of the first gasket 66 may be special plastic, which is resistant to plasma corrosion, for example, it may be Teflon plastic.

進一步的,所述等離子體反應器還包括:第二墊圈68,所述第二墊圈68設置在所述安裝部41頂面與所述安裝槽45底部之間,以密封所述安裝部41頂面與所述安裝槽45底部相對區域;和/或,第三墊圈67,所述第三墊圈67設置在所述安裝槽45側壁的頂面與所述內襯63具有所述氣體出口的一側表面之間,以密封所述安裝槽45側壁的頂面與所述內襯63具有所述氣體出口的一側表面相對區域。Further, the plasma reactor further includes a second gasket 68, which is arranged between the top surface of the mounting portion 41 and the bottom of the mounting groove 45 to seal the top of the mounting portion 41. The area opposite to the bottom of the mounting groove 45; and/or, a third gasket 67, which is arranged on the top surface of the side wall of the mounting groove 45 and the inner liner 63 having the gas outlet Between the side surfaces, to seal the opposite area between the top surface of the side wall of the installation groove 45 and the side surface of the inner liner 63 with the gas outlet.

需要說明的是,上述三種墊圈均為特種塑膠,均用於密封氣體出口處的間隙,防止氣體洩漏。It should be noted that the above three types of gaskets are all special plastics, which are used to seal the gap at the gas outlet to prevent gas leakage.

參考圖9,圖9為本發明提供的凸形內襯與凹形氣體噴嘴在氣體出口處的連接結構的截面圖。Referring to FIG. 9, FIG. 9 is a cross-sectional view of the connection structure of the convex liner and the concave gas nozzle at the gas outlet provided by the present invention.

如圖9(a)和圖9(c)中,所述安裝槽45的側壁厚度d由所述安裝槽45的底部至所述安裝槽45的頂部均勻不變。而圖9(b)中,所述安裝槽45的側壁厚度d由所述安裝槽45的底部至所述安裝槽45的頂部逐漸增大。As shown in FIG. 9(a) and FIG. 9(c), the thickness d of the side wall of the installation groove 45 is uniform from the bottom of the installation groove 45 to the top of the installation groove 45. In FIG. 9( b ), the side wall thickness d of the installation groove 45 gradually increases from the bottom of the installation groove 45 to the top of the installation groove 45.

如圖9(b)所示,所述安裝部41高出所述內襯33具有所述氣體出口的一側表面。需要說明的是,所述安裝部41與出氣部的側壁可以設計為錐形結構,以提高第一保護層的噴塗效率。As shown in Fig. 9(b), the mounting portion 41 is higher than the side surface of the inner liner 33 having the gas outlet. It should be noted that the side walls of the mounting portion 41 and the air outlet portion may be designed as a tapered structure to improve the spraying efficiency of the first protective layer.

如圖9(a)所示,所述內襯33具有所述氣體出口的一側表面還有凸起結構71,所述凸起結構71環繞所述安裝部41,且與所述安裝部41之間具有間隙,所述安裝槽45的側壁置於所述間隙內。需要說明的是,所述凸起結構71的數量可以基於需求進行設置,以便於更好的密封。所述凸起結構71設置在管道61外,有利於通過PS製程塗覆氧化釔,氧化釔具有耐等離子體腐蝕的作用,另外,凸起結構71距離氣體出口較遠,繞阻擴散路徑也會增強對等離子體阻擋效果,大大降低其對內襯33的腐蝕。As shown in Figure 9(a), the inner liner 33 has a protruding structure 71 on one side surface of the gas outlet. The protruding structure 71 surrounds the mounting portion 41 and is connected to the mounting portion 41. There is a gap therebetween, and the side wall of the mounting groove 45 is placed in the gap. It should be noted that the number of the protruding structures 71 can be set based on requirements to facilitate better sealing. The protruding structure 71 is arranged outside the pipe 61, which facilitates the coating of yttrium oxide through the PS process. The yttrium oxide has the effect of plasma corrosion resistance. In addition, the protruding structure 71 is far away from the gas outlet, and the diffusion path will also be blocked. The plasma barrier effect is enhanced, and the corrosion of the inner lining 33 is greatly reduced.

如圖9(c)所示,所述內襯33具有所述氣體出口的一側表面內具有容納槽72,所述安裝槽45的側壁置於所述容納槽72內,所述容納槽72環繞所述氣體出口,所述容納槽72與所述氣體出口之間的所述容納槽72側壁為所述安裝部41。容納槽72與安裝部41的凹凸結構設置,可以更有效的密封。As shown in FIG. 9(c), the inner liner 33 has a receiving groove 72 in the side surface with the gas outlet, the side wall of the mounting groove 45 is placed in the receiving groove 72, and the receiving groove 72 Surrounding the gas outlet, the side wall of the containing groove 72 between the containing groove 72 and the gas outlet is the mounting portion 41. The concave-convex structure of the accommodating groove 72 and the mounting portion 41 can be more effectively sealed.

通過以上描述可知,本發明技術方案中,設置噴嘴具有安裝槽,可以與內襯表面凸起的安裝部相互嵌套密封,在氣體出口外部形成密封結構,延長了等離子體的擴散路徑,使得等離子體在向管道內擴散路徑中逐漸熄滅,避免等離子體對氣體出口側壁的腐蝕。而且由於內襯表面具有凸起的安裝部,該凸起安裝部外朝向所述安裝槽的外表面能夠通過PS製程形成氧化釔塗層,即便發生等離子體擴散問題,等離子體首先接觸也是安裝部外表面的耐等離子體腐蝕的氧化釔塗層,可以很好的防止等離子體腐蝕問題。避免了管道的鋁基材由於表面保護層被腐蝕而暴露出來的問題,可以有效防止金屬污染。It can be seen from the above description that in the technical solution of the present invention, the nozzle is provided with a mounting groove, which can be nested and sealed with the raised mounting part on the surface of the lining, forming a sealing structure outside the gas outlet, extending the diffusion path of the plasma, and making the plasma The body is gradually extinguished in the diffusion path into the pipe to avoid the corrosion of the side wall of the gas outlet by the plasma. Moreover, since the surface of the lining has a convex mounting part, the convex mounting part facing the outer surface of the mounting groove can form a yttrium oxide coating through the PS process. Even if the plasma diffusion problem occurs, the first contact of the plasma is the mounting part. The plasma corrosion-resistant yttrium oxide coating on the outer surface can well prevent plasma corrosion problems. The problem that the aluminum substrate of the pipeline is exposed due to the corrosion of the surface protective layer is avoided, and metal pollution can be effectively prevented.

本說明書中各個實施例採用遞進、或並列、或遞進和並列結合的方式描述,每個實施例重點說明的都是與其他實施例的不同之處,各個實施例之間相同相似部分互相參見即可。The various embodiments in this specification are described in a progressive, or parallel, or progressive and parallel combination. Each embodiment focuses on the differences from other embodiments. The same and similar parts of the various embodiments are mutually exclusive. Just see.

還需要說明的是,在本文中,諸如第一和第二等之類的關係術語僅僅用來將一個實體或者操作與另一個實體或操作區分開來,而不一定要求或者暗示這些實體或操作之間存在任何這種實際的關係或者順序。而且,術語“包括”、“包含”或者其任何其他變體意在涵蓋非排他性的包含,從而使得包括一系列要素的物品或者設備不僅包括那些要素,而且還包括沒有明確列出的其他要素,或者是還包括為這種物品或者設備所固有的要素。在沒有更多限制的情況下,由語句“包括一個…”限定的要素,並不排除在包括上述要素的物品或者設備中還存在另外的相同要素。It should also be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply these entities or operations. There is any such actual relationship or order between. Moreover, the terms "including", "including" or any other variations thereof are intended to cover non-exclusive inclusion, so that an article or device including a series of elements includes not only those elements, but also other elements that are not explicitly listed. Or it also includes elements inherent to such items or equipment. If there are no more restrictions, the element defined by the sentence "including one..." does not exclude the existence of another same element in the article or equipment that includes the above element.

對所公開的實施例的上述說明,使本領域具有通常知識者能夠實現或使用本發明。對這些實施例的多種修改對本領域的具有通常知識者來說將是顯而易見的,本文中所定義的一般原理可以在不脫離本發明的精神或範圍的情況下,在其它實施例中實現。因此,本發明將不會被限制於本文所示的這些實施例,而是要符合與本文所公開的原理和新穎特點相一致的最寬的範圍。The above description of the disclosed embodiments enables those with ordinary knowledge in the art to implement or use the present invention. Various modifications to these embodiments will be obvious to those skilled in the art, and the general principles defined in this document can be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown in this document, but should conform to the widest scope consistent with the principles and novel features disclosed in this document.

00:插入部 10,28,40,57:主氣體噴射通道 11,21,51:自由基分子 12,22:氣體傳輸管道 13,23,32,53:第二保護層 14,24,33,54,63:內襯 15,25,35,55,65:氣體噴嘴 16,37,67:第三墊圈 17,36,66:第一墊圈 18:侵蝕點 19,34,64:第一保護層 20,38,68:第二墊圈 27,56:室壁 31,52,61:管道 39,60:出氣部 41:安裝部 45:安裝槽 58:輔助氣體噴口 59:輔助氣體噴射通道 71:凸起結構 72:容納槽 d:側壁厚度00: Insert part 10, 28, 40, 57: main gas injection channel 11, 21, 51: free radical molecules 12, 22: Gas transmission pipeline 13,23,32,53: second protective layer 14,24,33,54,63: lining 15, 25, 35, 55, 65: gas nozzle 16, 37, 67: third washer 17, 36, 66: first washer 18: erosion point 19, 34, 64: the first protective layer 20, 38, 68: second washer 27, 56: wall 31, 52, 61: pipeline 39, 60: Exhalation part 41: Installation Department 45: installation slot 58: auxiliary gas nozzle 59: auxiliary gas injection channel 71: raised structure 72: holding tank d: side wall thickness

為了更清楚地說明本發明實施例或習知技術中的技術方案,下面將對實施例或習知技術描述中所需要使用的附圖作簡單地介紹,顯而易見地,下面描述中的附圖僅僅是本發明的實施例,對於本領域通常知識者來講,在不付出進步性勞動的前提下,還可以根據提供的附圖獲得其他的附圖。 圖1為一種氣體噴嘴連接內襯的截面圖; 圖2為另一種氣體噴嘴連接內襯的截面圖; 圖3為本發明提供的一種凸形內襯連接凹形氣體噴嘴的截面圖; 圖4為本發明提供的一種凸形內襯氣體出口處的截面圖; 圖5為本發明提供的凸形內襯與凹形氣體噴嘴在氣體出口處的連接結構的截面圖; 圖6為本發明提供的一種氣體噴嘴的截面圖; 圖7為本發明提供的氣體噴嘴中主氣體噴射通道與輔助氣體噴射通道的設計結構圖; 圖8為本發明提供的一種等離子體反應器氣體出口處氣體噴嘴的截面圖; 圖9為本發明提供的凸形內襯與凹形氣體噴嘴在氣體出口處的連接結構的截面圖。In order to more clearly describe the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are merely It is an embodiment of the present invention. For those of ordinary skill in the art, other drawings can be obtained according to the provided drawings without making progressive labor. Figure 1 is a cross-sectional view of a gas nozzle connecting the inner liner; Figure 2 is a cross-sectional view of another gas nozzle connecting the inner liner; Figure 3 is a cross-sectional view of a convex liner connected to a concave gas nozzle provided by the present invention; 4 is a cross-sectional view of the gas outlet of a convex liner provided by the present invention; 5 is a cross-sectional view of the connection structure of the convex liner and the concave gas nozzle at the gas outlet provided by the present invention; Figure 6 is a cross-sectional view of a gas nozzle provided by the present invention; 7 is a design structure diagram of the main gas injection channel and the auxiliary gas injection channel in the gas nozzle provided by the present invention; 8 is a cross-sectional view of a gas nozzle at the gas outlet of a plasma reactor provided by the present invention; 9 is a cross-sectional view of the connection structure of the convex liner and the concave gas nozzle at the gas outlet provided by the present invention.

00:插入部 00: Insert part

32:第二保護層 32: The second protective layer

33:內襯 33: Lining

35:氣體噴嘴 35: gas nozzle

37:第三墊圈 37: third washer

36:第一墊圈 36: first washer

34:第一保護層 34: The first protective layer

38:第二墊圈 38: second washer

31:管道 31: Pipeline

39:出氣部 39: Exhalation Department

40:主氣體噴射通道 40: Main gas injection channel

41:安裝部 41: Installation Department

45:安裝槽 45: installation slot

Claims (17)

一種用於等離子體反應器的氣體噴嘴,該等離子體反應器具有內襯,該內襯內具有用於氣體傳輸的一管道,其中,該氣體噴嘴包括: 一插入部,該插入部的一第一端插入固定在該管道的一氣體出口,與該第一端相對的一第二端用於置於該管道外部; 一出氣部,該出氣部的一側表面具有一安裝槽,該安裝槽朝向該插入部的該第二端,且該插入部的該第二端與該安裝槽的底部連接,該出氣部相對的另一側表面具有一主氣體噴口; 其中,該氣體噴嘴內具有連通該插入部的該第一端與該主氣體噴口的一主氣體噴射通道;該內襯具有用於放置在該安裝槽內的一安裝部,該安裝部位於該內襯具有該氣體出口的表面,凸出該表面,且環繞該氣體出口;該安裝槽的內側壁與該安裝部的外側面相對密封固定。A gas nozzle for a plasma reactor. The plasma reactor has an inner liner with a pipe for gas transmission. The gas nozzle includes: An insertion portion, a first end of the insertion portion is inserted into a gas outlet fixed to the pipe, and a second end opposite to the first end is used to be placed outside the pipe; An air outlet, one side surface of the air outlet has a mounting groove facing the second end of the insertion part, and the second end of the insertion part is connected to the bottom of the installation groove, and the air outlet is opposite On the other side of the surface there is a main gas nozzle; Wherein, the gas nozzle has a main gas injection channel connecting the first end of the insertion portion and the main gas nozzle; the liner has a mounting portion for placing in the mounting groove, and the mounting portion is located The inner liner has a surface of the gas outlet, protrudes from the surface, and surrounds the gas outlet; the inner side wall of the installation groove and the outer side surface of the installation part are relatively sealed and fixed. 根據請求項1所述的氣體噴嘴,其中,該安裝槽的側壁厚度由該安裝槽的底部至該安裝槽的頂部逐漸減小,或增大,或均勻不變。The gas nozzle according to claim 1, wherein the thickness of the side wall of the installation groove gradually decreases from the bottom of the installation groove to the top of the installation groove, or increases, or is uniformly unchanged. 根據請求項1所述的氣體噴嘴,其中,該安裝槽的側壁的外表面具有至少一個輔助氣體噴口; 該輔助氣體噴口通過位於該出氣部內的該輔助氣體噴射通道與該主氣體噴射通道連通。The gas nozzle according to claim 1, wherein the outer surface of the side wall of the installation groove has at least one auxiliary gas nozzle; The auxiliary gas injection port communicates with the main gas injection channel through the auxiliary gas injection channel located in the gas outlet. 根據請求項3所述的氣體噴嘴,其中,該安裝槽的側壁的外表面具有複數個該輔助氣體噴口,該輔助氣體噴口均勻分佈在該安裝槽的側壁的外表面。The gas nozzle according to claim 3, wherein the outer surface of the side wall of the installation groove has a plurality of auxiliary gas nozzles, and the auxiliary gas nozzles are evenly distributed on the outer surface of the side wall of the installation groove. 根據請求項4所述的氣體噴嘴,其中,該輔助氣體噴口位於該安裝槽的側壁的相同高度位置; 該輔助氣體噴射通道與該主氣體噴射通道垂直連通;或,該輔助氣體噴射通道與該主氣體噴射通道斜向連通。The gas nozzle according to claim 4, wherein the auxiliary gas nozzle is located at the same height position of the side wall of the installation groove; The auxiliary gas injection channel is in vertical communication with the main gas injection channel; or, the auxiliary gas injection channel is in oblique communication with the main gas injection channel. 根據請求項3所述的氣體噴嘴,其中,該輔助氣體噴射通道的軸線通過該主氣體噴射通道的軸線,或該輔助氣體噴射通道的軸線與該主氣體噴射通道的軸線不相交。The gas nozzle according to claim 3, wherein the axis of the auxiliary gas injection channel passes through the axis of the main gas injection channel, or the axis of the auxiliary gas injection channel and the axis of the main gas injection channel do not intersect. 根據請求項3所述的氣體噴嘴,其中,該輔助氣體噴射通道的直徑由該主氣體噴射通道至該輔助氣體噴口逐漸變小,或逐漸增大,或均勻不變。The gas nozzle according to claim 3, wherein the diameter of the auxiliary gas injection channel gradually decreases from the main gas injection channel to the auxiliary gas injection port, or gradually increases, or is uniform. 根據請求項1至7中任一項所述的氣體噴嘴,其中,該主氣體噴射通道的直徑由該插入部至該出氣部逐漸變小,或均勻不變。The gas nozzle according to any one of claims 1 to 7, wherein the diameter of the main gas injection passage gradually decreases from the insertion portion to the gas outlet portion, or is uniformly unchanged. 一種等離子體反應器,其中,包括: 一反應腔、一內襯以及一氣體噴嘴,該氣體噴嘴為如請求項1至8中任一項所述的氣體噴嘴; 該反應腔包括一反應腔側壁,該反應腔側壁圍成的空間為一等離子體環境;該內襯位於該反應腔側壁上,該內襯內具有用於氣體傳輸的一管道;該氣體噴嘴安裝在該管道的一氣體出口中;該氣體噴嘴具有一安裝槽,該內襯具有凸出其表面的一安裝部,用於放置在該安裝槽內;該內襯朝向該等離子體環境的表面塗覆有一第一保護層。A plasma reactor, which includes: A reaction chamber, an inner liner, and a gas nozzle, the gas nozzle being the gas nozzle according to any one of claims 1 to 8; The reaction chamber includes a reaction chamber side wall, the space enclosed by the reaction chamber side wall is a plasma environment; the lining is located on the reaction chamber side wall, the lining has a pipe for gas transmission; the gas nozzle is installed In a gas outlet of the pipeline; the gas nozzle has a mounting groove, the lining has a mounting portion protruding from its surface for placing in the mounting groove; the lining is coated on the surface facing the plasma environment Covered with a first protective layer. 根據請求項9所述的等離子體反應器,其中,該安裝部的側壁外表面具有環繞該安裝部的一凹槽,該凹槽用於放置一第一墊圈,該第一墊圈用於密封該安裝槽的側壁的內表面與該安裝部的側壁的外表面。The plasma reactor according to claim 9, wherein the outer surface of the side wall of the mounting portion has a groove surrounding the mounting portion, and the groove is used for placing a first gasket, and the first gasket is used for sealing the The inner surface of the side wall of the installation groove and the outer surface of the side wall of the installation part. 根據請求項9所述的等離子體反應器,其中,還包括: 一第二墊圈,該第二墊圈設置在該裝部的頂面與該安裝槽的底部之間,以密封該安裝部的頂面與該安裝槽的底部的相對區域; 和/或,一第三墊圈,該第三墊圈設置在該安裝槽的側壁的頂面與該內襯具有該氣體出口的一側的表面之間,以密封該安裝槽的側壁的頂面與該內襯具有該氣體出口的一側的表面的相對區域。The plasma reactor according to claim 9, which further includes: A second gasket arranged between the top surface of the mounting portion and the bottom of the mounting groove to seal the opposite area between the top surface of the mounting portion and the bottom of the mounting groove; And/or, a third gasket, which is arranged between the top surface of the side wall of the installation groove and the surface of the liner on the side with the gas outlet to seal the top surface of the side wall of the installation groove and The liner has an opposing area of the surface on one side of the gas outlet. 根據請求項9所述的等離子體反應器,其中,該安裝部高出該內襯具有該氣體出口的一側的表面。The plasma reactor according to claim 9, wherein the mounting portion is higher than the surface of the liner on the side having the gas outlet. 根據請求項12所述的等離子體反應器,其中,該內襯具有該氣體出口的一側的表面還有一凸起結構,該凸起結構環繞該安裝部,且與該安裝部之間具有一間隙,該安裝槽的側壁置於該間隙內。The plasma reactor according to claim 12, wherein the surface of the liner on the side with the gas outlet further has a convex structure, and the convex structure surrounds the mounting portion and has a gap between the mounting portion and the mounting portion. A gap, the side wall of the installation groove is placed in the gap. 根據請求項9至11中任一項所述的等離子體反應器,其中,該內襯具有該氣體出口的一側的表面內具有一容納槽,該裝槽的側壁置於該容納槽內,該容納槽環繞該氣體出口,該容納槽與該氣體出口之間的該容納槽的側壁為該安裝部。The plasma reactor according to any one of claims 9 to 11, wherein the surface of the liner on the side with the gas outlet has a containing groove, and the side wall of the containing groove is placed in the containing groove, The accommodating groove surrounds the gas outlet, and the side wall of the accommodating groove between the accommodating groove and the gas outlet is the mounting part. 根據請求項9所述的等離子體反應器,其中,該第一保護層的材料包括:氧化釔。The plasma reactor according to claim 9, wherein the material of the first protective layer includes yttrium oxide. 根據請求項9所述的等離子體反應器,其中,該氣體出口側壁塗覆一第二保護層,該第二保護層的材料包括:特氟龍。The plasma reactor according to claim 9, wherein the side wall of the gas outlet is coated with a second protective layer, and the material of the second protective layer includes: Teflon. 根據請求項10所述的等離子體反應器,其中,該第一墊圈的材料為特氟龍塑膠。The plasma reactor according to claim 10, wherein the material of the first gasket is Teflon plastic.
TW109140208A 2019-12-18 2020-11-18 Plasma reactor and its gas nozzle TWI777301B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201911307952.7A CN113000233B (en) 2019-12-18 2019-12-18 Plasma reactor and gas nozzle thereof
CN201911307952.7 2019-12-18

Publications (2)

Publication Number Publication Date
TW202126118A true TW202126118A (en) 2021-07-01
TWI777301B TWI777301B (en) 2022-09-11

Family

ID=76382665

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109140208A TWI777301B (en) 2019-12-18 2020-11-18 Plasma reactor and its gas nozzle

Country Status (2)

Country Link
CN (1) CN113000233B (en)
TW (1) TWI777301B (en)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1006753B (en) * 1985-08-22 1990-02-07 珀金·埃尔默公司 Nozzle device of plasma spray gun
JP2988023B2 (en) * 1991-07-15 1999-12-06 富士電機株式会社 Manifold for reaction gas of phosphoric acid type fuel cell
US5597439A (en) * 1994-10-26 1997-01-28 Applied Materials, Inc. Process gas inlet and distribution passages
KR100469636B1 (en) * 2004-03-11 2005-02-02 주식회사 케이시알 The high gas-tighten metallic nozzle-boss for the high pressure composite vessel
TWM276314U (en) * 2004-04-16 2005-09-21 Applied Materials Inc Gas delivery system for semiconductor processing
JP4773142B2 (en) * 2005-06-14 2011-09-14 芝浦メカトロニクス株式会社 Stage and semiconductor processing apparatus having the same
CN100416756C (en) * 2005-12-05 2008-09-03 北京北方微电子基地设备工艺研究中心有限责任公司 Plasma etching device
CN100595883C (en) * 2007-12-18 2010-03-24 北京北方微电子基地设备工艺研究中心有限责任公司 Plasma processing device and its dielectric window
JP2009194125A (en) * 2008-02-14 2009-08-27 Seiko Epson Corp Semiconductor device manufacturing equipment
JP5398358B2 (en) * 2009-05-29 2014-01-29 三菱重工業株式会社 Substrate support structure and plasma processing apparatus
US9610591B2 (en) * 2013-01-25 2017-04-04 Applied Materials, Inc. Showerhead having a detachable gas distribution plate
US9790596B1 (en) * 2013-01-30 2017-10-17 Kyocera Corporation Gas nozzle and plasma device employing same
JP6338462B2 (en) * 2013-09-11 2018-06-06 東京エレクトロン株式会社 Plasma processing equipment
US11511298B2 (en) * 2014-12-12 2022-11-29 Oerlikon Metco (Us) Inc. Corrosion protection for plasma gun nozzles and method of protecting gun nozzles
JP6504017B2 (en) * 2015-10-21 2019-04-24 東京エレクトロン株式会社 Substrate processing equipment
KR102553629B1 (en) * 2016-06-17 2023-07-11 삼성전자주식회사 Plasma processing apparatus
CN108573891B (en) * 2017-03-07 2022-01-11 北京北方华创微电子装备有限公司 Plasma processing apparatus

Also Published As

Publication number Publication date
CN113000233B (en) 2022-09-02
TWI777301B (en) 2022-09-11
CN113000233A (en) 2021-06-22

Similar Documents

Publication Publication Date Title
CN110753994B (en) Multi-Plate Panels for Process Chambers
KR102610458B1 (en) Semiconductor Manufacturing System Including Deposition Apparatus
TWI840450B (en) Shower heads and gas handling devices
TWI713112B (en) Corrosion-resistant structure of gas delivery system in plasma processing device and plasma processing device using the same
JP6937753B2 (en) Fused cover ring
KR20080015779A (en) Vacuum processing chambers and components thereof suitable for etching high aspect ratio features
TWI713657B (en) Cooled gas feed block with baffle & nozzle for hdp-cvd
TWM590308U (en) Apparatus to reduce contamination in a plasma etching chamber
TWI777301B (en) Plasma reactor and its gas nozzle
US8778066B2 (en) Vacuum pump exhaust pipe of chemical vapor deposition apparatus and relevant vacuum pump
TW202146698A (en) Apparatus for purging semiconductor process chamber slit valve opening
JP6120288B2 (en) Gas flow treatment equipment
CN119287343A (en) Chemical vapor deposition device and method
JP3222222U (en) Structure of flange type threaded pipe joint
CN112071733B (en) Liner device for vacuum treatment equipment and vacuum treatment equipment
CN114284185A (en) Shower plate and semiconductor reaction chamber
JP6638167B2 (en) Bush unit for plasma reactor
CN110656317A (en) Spray head assembly, deposition equipment and deposition method
CN223445624U (en) An air intake structure used in sputtering coating equipment
KR100600584B1 (en) Process Chamber for Semiconductor Manufacturing
CN216986157U (en) Spraying device for compressed air foam fire extinguishing system
CN223397799U (en) Spraying unit, spraying device and photovoltaic material processing equipment
KR101184947B1 (en) Gasket for chamber lid assembly of semiconductor manufacturing apparatus
CN114649188A (en) Corrosion-resistant gas spray header and manufacturing method thereof
TW202601937A (en) Bonded showerhead assembly and method for using the same

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent