TW202111754A - X-ray tube and x-ray generation device - Google Patents
X-ray tube and x-ray generation device Download PDFInfo
- Publication number
- TW202111754A TW202111754A TW109124564A TW109124564A TW202111754A TW 202111754 A TW202111754 A TW 202111754A TW 109124564 A TW109124564 A TW 109124564A TW 109124564 A TW109124564 A TW 109124564A TW 202111754 A TW202111754 A TW 202111754A
- Authority
- TW
- Taiwan
- Prior art keywords
- electron gun
- ray tube
- electrode
- connecting portion
- outer electrode
- Prior art date
Links
- 239000011810 insulating material Substances 0.000 claims abstract description 16
- 239000004020 conductor Substances 0.000 claims description 21
- 230000008878 coupling Effects 0.000 abstract 5
- 238000010168 coupling process Methods 0.000 abstract 5
- 238000005859 coupling reaction Methods 0.000 abstract 5
- 230000005684 electric field Effects 0.000 description 46
- 230000004048 modification Effects 0.000 description 35
- 238000012986 modification Methods 0.000 description 35
- 239000007769 metal material Substances 0.000 description 11
- 229910001220 stainless steel Inorganic materials 0.000 description 11
- 239000010935 stainless steel Substances 0.000 description 11
- 238000010894 electron beam technology Methods 0.000 description 10
- 229910000833 kovar Inorganic materials 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 238000004088 simulation Methods 0.000 description 9
- 239000012212 insulator Substances 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- UQMRAFJOBWOFNS-UHFFFAOYSA-N butyl 2-(2,4-dichlorophenoxy)acetate Chemical compound CCCCOC(=O)COC1=CC=C(Cl)C=C1Cl UQMRAFJOBWOFNS-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
Landscapes
- X-Ray Techniques (AREA)
Abstract
Description
本發明係關於一種X光管及X光產生裝置。The invention relates to an X-ray tube and an X-ray generating device.
在專利文獻1~3中曾記載產生X光之X光管。該X光管具備:電子槍部,其出射電子;靶,其藉由入射電子而產生X光;及真空殼體部,其保持及收容其等。於電子槍部與靶之間施加高電壓。因而,真空殼體部具備包含絕緣材料之閥部。 [先前技術文獻] [專利文獻]Patent Documents 1 to 3 describe X-ray tubes that generate X-rays. The X-ray tube includes: an electron gun part which emits electrons; a target which generates X-rays by incident electrons; and a vacuum housing part which holds and houses them. A high voltage is applied between the electron gun part and the target. Therefore, the vacuum housing part is provided with a valve part containing an insulating material. [Prior Technical Literature] [Patent Literature]
專利文獻1:日本特開2014-67670號公報 專利文獻2:日本特開2017-22037號公報 專利文獻3:日本專利第6230389號公報Patent Document 1: Japanese Patent Application Publication No. 2014-67670 Patent Document 2: Japanese Patent Application Publication No. 2017-22037 Patent Document 3: Japanese Patent No. 6230389
[發明所欲解決之問題][The problem to be solved by the invention]
此處,在如上述之X光管中,導電體、與不同種類之2個絕緣體相接之點被稱為三接點,由於電場容易集中於三接點,故電場強度變高,容易產生放電。具體而言,於X光管中於電子槍部與閥部之連結部中,電子槍部、閥部、及與電子槍部及閥部之連結部鄰接之絕緣體(例如,真空殼體部內之真空區域)相接。因而,電子槍部與閥部之連結部成為三接點,容易產生電場之集中。Here, in the above-mentioned X-ray tube, the point where the conductor and the two different types of insulators are connected is called the three-contact point. Since the electric field tends to concentrate on the three-contact point, the intensity of the electric field becomes higher and it is easy to produce Discharge. Specifically, in the connection part of the electron gun part and the valve part in the X-ray tube, the electron gun part, the valve part, and the insulator adjacent to the connection part of the electron gun part and the valve part (for example, the vacuum area in the vacuum housing part) Meet. Therefore, the connection part between the electron gun part and the valve part becomes a three-point contact, which is likely to cause electric field concentration.
因而,本發明之目的在於提供一種能夠抑制電場於電子槍部與閥部之連結部之集中,而能夠抑制放電之產生之X光管及X光產生裝置。 [解決問題之技術手段]Therefore, an object of the present invention is to provide an X-ray tube and an X-ray generator capable of suppressing the concentration of an electric field on the connecting portion of the electron gun portion and the valve portion, and suppressing the generation of electric discharge. [Technical means to solve the problem]
本發明之一態樣之X光管具備:電子槍部,其出射電子;靶,其配置為與電子槍部對向,藉由入射電子而產生X光;及真空殼體部,其收容電子槍部及靶;且真空殼體部具有包含絕緣材料且連結於電子槍部之閥部;且該X光管具備:內側電極,其於真空殼體部之內側區域,對電子槍部與閥部之連結部分開且與連結部對向配置;及外側電極,其於真空殼體部之外側區域,與連結部分開且與連結部對向配置;且連結部位於內側電極與外側電極之間。An X-ray tube of one aspect of the present invention includes: an electron gun part which emits electrons; a target which is arranged opposite to the electron gun part and generates X-rays by incident electrons; and a vacuum housing part which houses the electron gun part and The target; and the vacuum housing portion has a valve portion that contains an insulating material and is connected to the electron gun portion; and the X-ray tube has: an inner electrode, which is located in the inner area of the vacuum housing portion, to open the connection part of the electron gun portion and the valve portion And arranged opposite to the connecting part; and the outer electrode, which is in the outer region of the vacuum housing part, is separated from the connecting part and arranged opposite to the connecting part; and the connecting part is located between the inner electrode and the outer electrode.
於該X光管中,電子槍部與閥部之連結部位於內側電極與外側電極之間。亦即,於該X光管中,可能成為三接點之電子槍部與閥部之連結部位於內側電極與外側電極之間。藉此,於對X光管供給電力之情形下,抑制電場集中於位於內側電極與外側電極之間之連結部(三接點)。因而,X光管可抑制電場於電子槍部與閥部之連結部之集中,而可抑制放電之產生。In this X-ray tube, the connection part between the electron gun part and the valve part is located between the inner electrode and the outer electrode. That is, in the X-ray tube, the connection part between the electron gun part and the valve part, which may become a three-contact point, is located between the inner electrode and the outer electrode. Thereby, when power is supplied to the X-ray tube, the electric field is suppressed from being concentrated on the connecting portion (three-point contact) between the inner electrode and the outer electrode. Therefore, the X-ray tube can suppress the concentration of the electric field on the connecting portion of the electron gun portion and the valve portion, and can suppress the generation of discharge.
於X光管中,可行的是,連結部繞由電子槍部出射電子之出射軸呈環狀延伸,且內側電極及外側電極自環狀之內側及外側包圍連結部。此情形下,X光管藉由內側電極及外側電極包圍連結部,可更進一步抑制連結部之電場之集中。In the X-ray tube, it is feasible that the connecting portion extends in a ring shape around the exit axis of electrons emitted from the electron gun portion, and the inner electrode and the outer electrode surround the connecting portion from the inner and outer sides of the ring. In this case, the X-ray tube surrounds the connection part with the inner electrode and the outer electrode, which can further suppress the concentration of the electric field in the connection part.
於X光管中,內側電極及外側電極各者可於電子槍部與靶之對向方向上,跨於連結部而延伸至電子槍部與閥部。此情形下,X光管藉由內側電極及外側電極,而可有效地覆蓋連結部,可更進一步抑制連結部之電場之集中。In the X-ray tube, each of the inner electrode and the outer electrode can extend across the connecting part to the electron gun part and the valve part in the opposing direction of the electron gun part and the target. In this case, the X-ray tube can effectively cover the connection part by using the inner electrode and the outer electrode, and the concentration of the electric field in the connection part can be further suppressed.
於X光管中,外側電極於電子槍部與靶之對向方向上跨於連結部而突出;將外側電極於電子槍部與靶之對向方向上自連結部之位置突出之高度設為A、將外側電極與連結部之間隔設為B時,可滿足A≧0.5B。此情形下,X光管藉由外側電極,可有效地抑制電場自閥部側朝向連結部迂迴繞入,可更進一步抑制連結部之電場之集中。In the X-ray tube, the outer electrode protrudes across the connecting part in the opposing direction of the electron gun part and the target; the height of the outer electrode protruding from the position of the connecting part in the opposing direction of the electron gun part and the target is set to A, When the distance between the outer electrode and the connecting part is set to B, A≧0.5B can be satisfied. In this case, the X-ray tube uses the outer electrode to effectively prevent the electric field from detouring from the valve portion side toward the connecting portion, and further suppressing the concentration of the electric field in the connecting portion.
於X光管中,內側電極於電子槍部與靶之對向方向上,跨於連結部而突出;將內側電極於電子槍部與靶之對向方向上自連結部之位置突出之高度設為C、將內側電極與連結部之間隔設為D時,可滿足C≧0.5D。此情形下,X光管藉由內側電極,可有效地抑制電場自閥部側朝向連結部迂迴繞入,可更進一步抑制連結部之電場之集中。In the X-ray tube, the inner electrode protrudes across the connecting part in the direction of the electron gun part and the target; the height of the inner electrode protruding from the position of the connecting part in the direction of the electron gun part and the target is set to C , When the distance between the inner electrode and the connecting part is set to D, it can satisfy C≧0.5D. In this case, the X-ray tube uses the inner electrode to effectively prevent the electric field from detouring from the valve portion side toward the connecting portion, and further suppressing the concentration of the electric field in the connecting portion.
於X光管中,可行的是,電子槍部具備:電子槍,其出射電子;及連結凸緣,其包含導電材料,固定於電子槍且連結於閥部;且連結凸緣具有凸緣對向部,該凸緣對向部位於真空殼體部之外側區域,與連結部分開並且與連結部對向配置;外側電極由凸緣對向部構成。此情形下,X光管可使連結凸緣之凸緣對向部作為外側電極而發揮功能,可使構成簡單化。In the X-ray tube, it is feasible that the electron gun part has: an electron gun which emits electrons; and a connecting flange, which includes a conductive material, is fixed to the electron gun and is connected to the valve part; and the connecting flange has a flange facing part, The flange facing part is located in the outer side area of the vacuum housing part, separated from the connecting part and arranged opposite to the connecting part; the outer electrode is constituted by the flange facing part. In this case, the X-ray tube can make the flange facing portion of the connecting flange function as an outer electrode, and the structure can be simplified.
於X光管中,可行的是,電子槍部具有包含導電材料之電子槍殼體部,電子槍殼體部具有殼體對向部,該殼體對向部位於真空殼體部之內側區域,與連結部分開並且與連結部對向配置,內側電極由殼體對向部構成。此情形下,X光管可使電子槍殼體部之殼體對向部作為內側電極而發揮功能,可使構成簡單化。In the X-ray tube, it is feasible that the electron gun part has an electron gun housing part containing a conductive material, and the electron gun housing part has a housing opposite part, which is located in the inner area of the vacuum housing part and is connected to the Partially open and arranged opposite to the connecting part, and the inner electrode is constituted by the opposite part of the housing. In this case, the X-ray tube can make the housing facing portion of the electron gun housing function as an inner electrode, and the structure can be simplified.
於X光管中,可行的是,閥部具有:外筒;內筒,其配置於外筒內;及筒連結部,其將外筒之一端部與內筒之一端部連結;電子槍部連結於內筒之另一端部;外側電極配置於內筒之內側。此情形下,X光管由於連結部被收容於由包含絕緣材料之外筒包圍之空間內,故可抑制連結部與X光管之周圍之構成(例如X光產生裝置之一部分)之間之放電之產生。In the X-ray tube, it is feasible that the valve part has: an outer tube; an inner tube, which is arranged in the outer tube; and a tube connecting part, which connects one end of the outer tube with an end of the inner tube; and the electron gun part is connected At the other end of the inner tube; the outer electrode is arranged inside the inner tube. In this case, since the connecting part of the X-ray tube is contained in a space surrounded by an outer tube containing an insulating material, it is possible to prevent the connection between the connecting part and the surrounding structure of the X-ray tube (for example, a part of the X-ray generating device). The generation of electric discharge.
於X光管中,可行的是,閥部呈筒形狀,外側電極將電子槍部與閥部之連結部收容於內側。此情形下,X光管於容易製造之筒形狀之閥部中亦可抑制電場於連結部之集中,而可抑制放電之產生。In the X-ray tube, it is feasible that the valve part is cylindrical, and the outer electrode accommodates the connection part between the electron gun part and the valve part inside. In this case, the X-ray tube can also suppress the concentration of the electric field in the connecting portion in the cylindrical valve portion that is easy to manufacture, and can suppress the generation of discharge.
本發明之另一態樣之X光產生裝置具備:X光管,其具有電子槍部,其出射電子;靶,其配置為與電子槍部對向,藉由入射電子而產生X光;及真空殼體部,其收容電子槍部及靶;且真空殼體部包含含有絕緣材料且連結於電子槍部之閥部;收容部,其收容X光管之至少一部分;饋電部,其對X光管供給電力;及外側電極,其被收容於收容部且配置於真空殼體部之外側區域,覆蓋饋電部之至少一部分;且X光管具有內側電極,該內側電極於真空殼體部之內側區域,對電子槍部與閥部之連結部分開且與連結部對向配置;外側電極與連結部分開且與連結部對向配置;內側電極及外側電極各者於電子槍部與靶之對向方向上,跨於連結部而延伸至電子槍部與閥部;連結部位於內側電極與外側電極之間。An X-ray generating device of another aspect of the present invention includes: an X-ray tube having an electron gun part that emits electrons; a target that is arranged to face the electron gun part and generates X-rays by incident electrons; and a vacuum envelope The body part contains the electron gun part and the target; and the vacuum housing part contains a valve part that contains insulating material and is connected to the electron gun part; the containment part contains at least a part of the X-ray tube; the power feeding part supplies the X-ray tube Electricity; and outer electrodes, which are housed in the accommodating portion and arranged in the outer area of the vacuum housing portion, covering at least a part of the power feeding portion; and the X-ray tube has an inner electrode, the inner electrode in the inner area of the vacuum housing portion , The connecting part of the electron gun part and the valve part is opened and arranged opposite to the connecting part; the outer electrode is separated from the connecting part and arranged opposite to the connecting part; the inner electrode and the outer electrode are each in the opposite direction of the electron gun part and the target , Straddling the connecting part and extending to the electron gun part and the valve part; the connecting part is located between the inner electrode and the outer electrode.
於該X光產生裝置之X光管中,電子槍部與閥部之連結部位於內側電極與外側電極之間。亦即,於該X光管中,可能成為三接點之電子槍部與閥部之連結部位於內側電極與外側電極之間。又,內側電極及外側電極各者於電子槍部與靶之對向方向上,跨於連結部且延伸至電子槍部與閥部。藉此,於對X光管供給電力之情形下,抑制電場集中於位於內側電極與外側電極之間之連結部(三接點)。因而,X光產生裝置可抑制電場於電子槍部與閥部之連結部之集中,而可抑制X光管之放電之產生。In the X-ray tube of the X-ray generator, the connection part between the electron gun part and the valve part is located between the inner electrode and the outer electrode. That is, in the X-ray tube, the connection part between the electron gun part and the valve part, which may become a three-contact point, is located between the inner electrode and the outer electrode. In addition, each of the inner electrode and the outer electrode straddles the connection part and extends to the electron gun part and the valve part in the opposing direction of the electron gun part and the target. Thereby, when power is supplied to the X-ray tube, the electric field is suppressed from being concentrated on the connecting portion (three-point contact) between the inner electrode and the outer electrode. Therefore, the X-ray generating device can suppress the concentration of the electric field on the connecting portion of the electron gun portion and the valve portion, and can suppress the generation of the discharge of the X-ray tube.
於X光產生裝置中,外側電極可呈將饋電部之至少一部分收容於內側之筒形狀。此情形下,外側電極可兼具收容且保護饋電部之功能、及抑制電場於連結部之集中之功能之兩者。In the X-ray generating device, the outer electrode may have a cylindrical shape that accommodates at least a part of the power feeding part on the inner side. In this case, the outer electrode can have both the function of accommodating and protecting the power feeding part and the function of suppressing the concentration of the electric field in the connecting part.
於X光產生裝置中,可行的是,閥部具有:外筒;內筒,其配置於外筒內;及筒連結部,其將外筒之一端部與內筒之一端部連結;電子槍部連結於內筒之另一端部;外側電極配置於內筒之內側。X光產生裝置由於連結部被收容於由包含絕緣材料之外筒包圍之空間內,故可抑制連結部與X光產生裝置之一部分(例如收容部)之間之放電之產生。In the X-ray generating device, it is feasible that the valve part has: an outer tube; an inner tube, which is arranged in the outer tube; and a tube connecting part, which connects one end of the outer tube and one end of the inner tube; an electron gun part Connected to the other end of the inner tube; the outer electrode is arranged inside the inner tube. Since the X-ray generating device is housed in a space surrounded by an outer tube containing an insulating material, the generation of electric discharge between the connecting portion and a part of the X-ray generating device (for example, the receiving section) can be suppressed.
於X光產生裝置中,可行的是,閥部呈筒形狀,外側電極將電子槍部與閥部之連結部收容於內側。此情形下,X光產生裝置於具備容易製造之筒形狀之閥部之X光管中亦可抑制電場於連結部之集中,而可抑制放電之產生。 [發明之效果]In the X-ray generating device, it is feasible that the valve part has a cylindrical shape, and the outer electrode accommodates the connection part between the electron gun part and the valve part inside. In this case, the X-ray generating device can also suppress the concentration of the electric field in the connecting portion in an X-ray tube with a cylindrical valve portion that is easy to manufacture, and can suppress the generation of electric discharge. [Effects of Invention]
根據本發明,可抑制電場於電子槍部與閥部之連結部之集中,而可抑制放電之產生。According to the present invention, it is possible to suppress the concentration of the electric field in the connecting portion of the electron gun portion and the valve portion, and to suppress the generation of electric discharge.
以下,針對本發明之實施形態,一面參照圖式,一面進行說明。此外,在以下之說明中,對相同或相當之要素彼此賦予同一符號,且省略重複之說明。Hereinafter, the embodiments of the present invention will be described with reference to the drawings. In addition, in the following description, the same or equivalent elements are given the same reference numerals, and overlapping descriptions are omitted.
(第1實施形態)
首先,說明X光產生裝置之第1實施形態。如圖1及圖2所示,本實施形態之X光產生裝置1為例如觀察被檢測體之內部構造之X光無損檢查所使用之微焦點X光源。X光產生裝置1具備X光管10、裝置殼體部20、及電源部30。(First Embodiment)
First, the first embodiment of the X-ray generator will be described. As shown in FIGS. 1 and 2, the X-ray generating device 1 of this embodiment is, for example, a micro-focus X-ray source used for X-ray non-destructive inspection of the internal structure of an object to be inspected. The X-ray generating device 1 includes an
X光管10具備真空殼體部100、電子槍部110、及靶T。電子槍部110沿出射軸MX出射電子束M(電子)。X光管10係將藉由來自電子槍部110之電子束M朝靶T入射而產生、且透過該靶T本身之X光XR自X光出射窗104出射之透過型X光管。X光管10係具備具有真空之內部空間R之真空殼體部100之真空密封型X光管。此外,以下,為便於說明,將對於電子槍部110設置靶T之側設為「前側」,將其相反側設為「後側」。The
真空殼體部100收容電子槍部110、及靶T。真空殼體部100呈沿X光管10之管軸AX延伸之大致圓柱狀之外形。此外,在本實施形態中,管軸AX與出射軸MX成為同軸。由於管軸AX與出射軸MX為同軸,故以下,亦將其等統稱為軸L。真空殼體部100具備:由金屬材料(例如,不銹鋼、銅、銅合金、鐵合金等)形成之頭部101、及由絕緣材料(例如,玻璃、陶瓷等)形成之閥部102。頭部101配置於閥部102之前側。頭部101與閥部102藉由包含科伐合金等金屬材料之閥凸緣103而相互連結。The
於閥部102連結有電子槍部110。閥部102具有沿X光管10之管軸AX(軸L)延伸之圓筒形狀。於閥部102之後側之端部,設置以朝向前側折回之方式沿X光管10之管軸AX延伸而形成之圓筒形狀之凹部102w。亦即,閥部102具有:外筒102a、配置於外筒102a內之內筒102b、及將外筒102a之後側之端部(一端部)與內筒102b之後側之端部(一端部)連結之筒連結部102c。外筒102a及內筒102b沿軸L延伸。The
於內筒102b之前側之端部(另一端部)之開口部,以將該開口部密封之方式連結有電子槍部110。即,藉由凹部102w,而延長頭部101與電子槍部110之沿面距離,提高耐電壓特性,且藉由於內部空間R內,使電子槍部110接近靶T而配置,而容易使電子束M微焦點化。The
頭部101係由金屬材料形成,在電位上相當於X光管10之陽極。頭部101於兩端具備開口,呈沿軸L延伸之大致圓筒形狀。頭部101於後側之開口處,與沿軸L延伸之閥部102連通(參照圖2)。The
於頭部101之前側面,以覆蓋頭部101之前側之開口101a之方式,固定X光出射窗104。X光出射窗104呈例如圓形之板狀。X光出射窗104由例如由鈹、鋁、金剛石等X光透過性較高之材料形成。On the front side of the
靶T配置為與電子槍部110對向。在本實施形態中,靶T於軸L方向上與電子槍部110對向。亦即,靶T與電子槍部110之對向方向成為軸L方向。靶T設置於X光出射窗104之內部空間R側之面。在本實施形態中,靶T成膜於X光出射窗104之內部空間R側之面。靶T藉由電子束M(電子)之入射而產生X光。作為靶T,例如使用鎢、鉬、銅等。The target T is arranged to face the
電子槍部110具有:電子槍120、及用於將電子槍120連結於閥部102(內筒102b之前側之端部)之連結凸緣130。電子槍120出射電子。電子槍120具備:加熱器121、陰極122、第1柵電極123、第2柵電極124、及電子槍殼體部125。The
加熱器121係由藉由通電而發熱之燈絲形成。陰極122成為藉由受加熱器121加熱而放出電子之電子放出源。第1柵電極123控制自陰極122放出之電子之量。第2柵電極124呈將通過第1柵電極123之電子朝向靶T聚焦之圓筒形狀。第2柵電極124亦作為形成用於引出構成電子束M之電子之電場之引出電極而發揮功能。第1柵電極123配置於陰極122與第2柵電極124之間。電子槍殼體部125包含導電材料(例如不銹鋼等),呈圓筒形狀。電子槍殼體部125收容加熱器121、陰極122、及第1柵電極123。電子槍殼體部125連結於第2柵電極124,亦成為對於第2柵電極124之饋電路徑。The
連結凸緣130固定於電子槍120,且連結於閥部102。連結凸緣130將內筒102b之前側之端部之開口密封。連結凸緣130具備凸緣131、柄部132、及柄凸緣133。凸緣131包含導電材料(例如科伐合金等),供電子槍120之電子槍殼體部125固定,且連結於內筒102b之前側之端部。The connecting
更詳細而言,凸緣131具備:呈沿軸L方向延伸之圓筒形狀之外側凸緣131a及內側凸緣131b、以及環狀部131c。內側凸緣131b配置於外側凸緣131a之內側。環狀部131c呈環形狀。環狀部131c將外側凸緣131a之前側端部與內側凸緣131b之前側端部連結。外側凸緣131a之後側之端部連結於內筒102b之前側之端部。In more detail, the
此處,外側凸緣131a與內筒102b之連結部H中之面向內部空間R之部分與內部空間R內之真空區域(絕緣體)相接。又,外側凸緣131a與內筒102b之連結部H中之面向真空殼體部100之外側區域之部分與後述之絕緣油22(絕緣體)相接。亦即,連結部H成為三接點。在本實施形態中,連結部H(三接點)繞軸L(出射軸MX)呈環狀延伸。Here, the part of the connecting portion H of the
柄部132包含絕緣材料(例如,陶瓷、玻璃等),呈圓形之板狀。柄凸緣133包含導電材料(例如科伐合金等),呈圓筒形狀。於柄凸緣133之內側,固定柄部132。柄凸緣133嵌入且固定於凸緣131之內側凸緣131b內。The
於柄部132設置有柄銷S。柄銷S以跨真空殼體部100之內部區域與外部區域且貫通柄部132之狀態延伸。柄銷S電性連接於電子槍部110之各構成要素(加熱器121等)。A shank pin S is provided on the
又,X光管10具備包圍連結部H之內側電極140及外側電極150。連結部H位於內側電極140與外側電極150之間。亦即,三接點位於內側電極140與外側電極150之間。換言之,藉由內側電極140與外側電極150,而將三接點夾入。In addition, the
內側電極140設置於真空殼體部100之內側區域(內部空間R內)。內側電極140與閥部102分開設置。內側電極140包含導電材料(例如不銹鋼等)。內側電極140與連結部H分開、且與連結部H對向配置。又,內側電極140自沿軸L之方向觀察,自外側包圍呈環狀延伸之連結部H。The
更詳細而言,內側電極140具備包圍部141、及環狀部142。包圍部141呈圓筒形狀,配置為沿軸L延伸。包圍部141自沿軸L之方向觀察,自外側包圍呈環狀延伸之連結部H。包圍部141於軸L方向上跨於連結部H且延伸至電子槍部110之凸緣131與閥部102之內筒102b。亦即,包圍部141之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。包圍部141之後側之端部於軸L方向上位於較連結部H更後側。In more detail, the
環狀部142呈環形狀。環狀部142將包圍部141之前側之端部、與電子槍部110連結。此處,環狀部142作為一例,將包圍部141之前側之端部、與電子槍部110之電子槍殼體部125連結。The
如此,內側電極140自與電子槍部110之連結部分朝向後側延伸。內側電極140自沿軸L之方向觀察,自外側包圍連結部H。亦即,內側電極140於軸L方向(電子槍部110與靶T之對向方向)上,跨於連結部H而自電子槍部110側朝向閥部102之內筒102b側(朝向後側)突出。此處,將於軸L方向上,內側電極140(包圍部141)自連結部H之位置之突出高度(突出長度)設為C。又,將內側電極140與連結部H之間隔設為D。此處之間隔D係呈環狀延伸之連結部H之徑向(相對於軸L垂直相交之方向)之內側電極140(包圍部141)與連結部H之距離。突出高度C與間隔D滿足
C≧0.5D。In this way, the
外側電極150於真空殼體部100之外側區域(內部空間R外),設置於內筒102b之內側。外側電極150與閥部102分開設置。外側電極150包含導電材料(例如不銹鋼等)。外側電極150與連結部H分開、且與連結部H對向配置。又,外側電極150自沿軸L之方向觀察,自內側包圍呈環狀延伸之連結部H。The
更詳細而言,外側電極150呈圓筒形狀,配置為沿軸L延伸。外側電極150連結於柄凸緣133之後側之端部及凸緣131之內側凸緣131b之後側之端部之至少任一者。外側電極150於軸L方向上跨於連結部H且延伸至電子槍部110之凸緣131與閥部102之內筒102b。亦即,外側電極150之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。外側電極150之後側之端部於軸L方向上位於較連結部H更後側。In more detail, the
如此,外側電極150自柄凸緣133朝向後側延伸。外側電極150自沿軸L之方向觀察,自內側包圍連結部H。亦即,外側電極150於軸L方向(電子槍部110與靶T之對向方向)上,跨於連結部H而自電子槍部110側朝向閥部102之內筒102b側(朝向後側)突出。此處,將於軸L方向上,外側電極150自連結部H之位置之突出高度(突出長度)設為A。又,將外側電極150與連結部H之間隔設為B。此處之間隔B係呈環狀延伸之連結部H之徑向(相對於軸L垂直相交之方向)之外側電極150與連結部H之距離。突出高度A與間隔B滿足
A≧0.5B。In this way, the
此處,在本實施形態中,內側電極140及外側電極150藉由包含導電材料之電子槍殼體部125、凸緣131、及柄凸緣133而電性連接。因而,內側電極140、外側電極150、凸緣131成為同電位。Here, in this embodiment, the
內側電極140及外側電極150之前側之端部分別連結於電子槍部110。內側電極140及外側電極150自電子槍部110朝向後側延伸,覆蓋連結部H。內側電極140及外側電極150未抵接於閥部102(內筒102b)。亦即,內側電極140及外側電極150之後側之端部未抵接於其他構件。因而,內側電極140與外側電極150之間之空間之後側開口。若外側電極150之突出高度A及內側電極140之突出高度C變高,則自後側通過內側電極140及外側電極150之間而到達連結部H之距離變長。The front end portions of the
裝置殼體部20具備:筒構件(收容部)21、及作為電源部30之一部分之電源外殼33。筒構件21係由金屬形成。筒構件21呈於其兩端具有開口之圓筒形狀,具有內部空間21c。筒構件21於其一端側之開口21a插入X光管10之閥部102。藉此,筒構件21收容X光管10之至少一部分。更具體而言,筒構件21在本實施形態中收容閥部102之整體。The
筒構件21之開口21a由X光產生裝置1之頭部101予以密封。於筒構件21之內部空間21c中,封入液狀之電絕緣性物質即絕緣油22。The
電源部30具有對X光管10供給電力之功能。電源部30具有:經模製之包含固體絕緣材料,例如作為絕緣樹脂之環氧樹脂之絕緣塊31;於絕緣塊31中經模製之升壓部32;及收容其等且呈矩形箱狀之電源外殼33。升壓部32基於各種條件,根據需要對於將自X光產生裝置1之外部導入之導入電壓升壓而產生的升壓電壓進行調整,而產生高壓電壓。絕緣塊31藉由絕緣材料(例如環氧樹脂等)將升壓部32密封。於電源部30(電源外殼33),固定筒構件21之另一端側。藉此,將筒構件21之另一端側之開口21b密封,將絕緣油22封入筒構件21之內部空間21c。The
又,X光產生裝置1具備將升壓部32與X光管10電性連接之饋電部40。饋電部40自電源部30向X光管10供給電力(高壓電壓)。更詳細而言,饋電部40之一端部連接於升壓部32。饋電部40之另一端部插入X光管10之閥部102之凹部102w,於柄部132與自真空之內部空間R突出之柄銷S電性連接。饋電部40具有用於供給電力之複數條配線。In addition, the X-ray generator 1 includes a
此外,在本實施形態中,作為一例,將靶T(陽極)設為接地電位,自電源部30經由饋電部40對X光管10(電子槍部110)供給-100 kV之高壓電壓。此外,實際上,對電子槍部110之各電極,施加將-100 kV之高壓電壓配合各電極之功能加以調整後之電壓,但以後為了易於理解說明,而將向電子槍部110施加之電壓假定記載為-100 kV。In addition, in this embodiment, as an example, the target T (anode) is set to a ground potential, and a high voltage voltage of -100 kV is supplied from the
其次,說明當向X光管10供給電力時,於連結部H(三接點)周圍產生之電場。若對電子槍部110供給電力,則內側電極140、外側電極150、及凸緣131亦成為高電位(在本實施形態中為-100 kV)。如以上所述般,連結部H以夾入互為相同電位之內側電極140與外側電極150之間之狀態定位。因而,抑制於連結部H中電場集中。Next, the electric field generated around the connecting portion H (three-contact point) when power is supplied to the
說明於X光管10產生之電場之模擬結果(等電位線)。此處,使用圖3所示之X光產生裝置之模型,將電子槍部110設為高壓電位(-100 kV),將頭部101設為接地電位(0 V),進行了模擬。如圖4所示之模擬結果般,藉由連結部H由內側電極140與外側電極150夾入,而抑制電場朝向連結部H之迂迴繞入(等電位線之迂迴繞入),且抑制電場於連結部H之集中。The simulation results (equivalence lines) of the electric field generated by the
此外,在圖4中為將外側電極150自連結部H之位置之突出高度A設為跟外側電極150與連結部H之間隔B相同,將內側電極140自連結部H之位置之突出高度C設為跟內側電極140與連結部H之間隔D相同之情形之模擬結果。In addition, in FIG. 4, the protrusion height A of the
在圖5中顯示使外側電極150及內側電極140之突出高度較圖4所示之情形更高之情形之模擬結果。此處,將外側電極150自連結部H之位置之突出高度A設為外側電極150與連結部H之間隔B之2倍,將內側電極140自連結部H之位置之突出高度C設為內側電極140與連結部H之間隔D之2倍。此情形下,如圖5所示,進一步抑制電場自X光管10之後側朝向連結部H之迂迴繞入,且進一步抑制電場於連結部H之集中。如此,藉由增高外側電極150之突出高度A及內側電極140之突出高度C,而進一步抑制電場於連結部H之集中。FIG. 5 shows the simulation result of the case where the protrusion height of the
此處,為進行比較,針對連結部H未由內側電極140及外側電極150包圍之情形,亦進行了模擬。此處,如圖6所示,使用縮短內側電極140及外側電極150之軸L方向之長度,連結部H未由內側電極140及外側電極150夾著(未被包圍)之X光產生裝置之模型。此情形下,如圖6所示,電場向連結部H迂迴繞入,於連結部H之電場強度變高。Here, for comparison, the case where the connecting portion H is not surrounded by the
如以上所述般,於X光管10中,電子槍部110與閥部102(內筒102b)之連結部H位於內側電極140與外側電極150之間。亦即,於該X光管10中,成為三接點之連結部H位於內側電極140與外側電極150之間。藉此,於對X光管10供給電力之情形下,抑制電場集中於位於內側電極140與外側電極150之間之連結部(三接點)。因而,X光管10可抑制電場於電子槍部110與閥部102之連結部H之集中,而可抑制放電之產生。As described above, in the
內側電極140對呈環狀延伸之連結部H自環狀之外側予以包圍。外側電極150對呈環狀延伸之連結部H自環狀之內側予以包圍。藉此,X光管10藉由內側電極140及外側電極150而自內側及外側包圍連結部H,可更進一步抑制連結部H之電場之集中。The
內側電極140及外側電極150各者於軸L方向上跨於連結部H且延伸至電子槍部110之凸緣131與閥部102之內筒102b。藉此,X光管10藉由內側電極140及外側電極150,而可有效地覆蓋連結部H,可更進一步抑制連結部H之電場之集中。Each of the
外側電極150之突出高度A、及外側電極150與連結部H之間隔B滿足A≧0.5B。藉此,X光管10藉由外側電極150,可有效地抑制電場自閥部102之內筒102b側朝向連結部H迂迴繞入,可更進一步抑制連結部H之電場之集中。The protrusion height A of the
內側電極140之突出高度C、及內側電極140與連結部H之間隔D滿足C≧0.5D。藉此,X光管10藉由內側電極140,可有效地抑制電場自閥部102之內筒102b側朝向連結部H迂迴繞入,可更進一步抑制連結部H之電場之集中。The protrusion height C of the
閥部102具備:外筒102a、配置於外筒102a內之內筒102b、及將外筒102a及內筒102b之後側之端部彼此連結之筒連結部102c,電子槍部110連結於內筒102b之前側之端部,外側電極150配置於內筒102b之內側。亦即,X光管10具備如一端部被折回之形狀之閥部102,電子槍部110於圓筒形狀之凹部102w內固定。此情形下,由於連結部H被收容於由包含絕緣材料之外筒102a包圍之空間內,故可抑制連結部H與X光管10之周圍之構成(例如作為X光產生裝置1之一部分之筒構件21)之間之放電之產生。The
(X光管之第1變化例)
其次,說明第1實施形態之X光管10之第1變化例。以下,以與第1實施形態之X光管10之不同點為中心進行說明,針對共通之構成省略說明。在以下說明之其他之變化例及實施形態中,僅以不同點為中心進行說明。如圖7所示,X光管10A具備凸緣131A及柄凸緣133A,而取代第1實施形態之X光管10之凸緣131及柄凸緣133。(The first modification of X-ray tube)
Next, a first modification example of the
凸緣131A包含導電材料(例如科伐合金等)。凸緣131A具備:呈沿軸L方向延伸之圓筒形狀之外側凸緣131a及內側凸緣(凸緣對向部)131d、以及環狀部131c。內側凸緣131d較第1實施形態之內側凸緣131b延伸至更後側。內側凸緣131d與閥部102之內筒102b分開設置。內側凸緣131d位於真空殼體部100之外側區域,且自連結部H分開並且與連結部H對向配置。具體而言,內側凸緣131d於軸L方向上跨於連結部H且延伸至外側凸緣131a與閥部102之內筒102b。亦即,內側凸緣131d之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。內側凸緣131d之後側之端部於軸L方向上位於較連結部H更後側。The
柄凸緣(凸緣對向部)133A包含導電材料(例如科伐合金等),呈圓筒形狀。於柄凸緣133A之內側,固定柄部132。柄凸緣133A嵌入凸緣131A之內側凸緣131d內。柄凸緣133A較第1實施形態之柄凸緣133延伸至更後側。柄凸緣133A與閥部102分開設置。柄凸緣133A位於真空殼體部100之外側區域,且自連結部H分開並且與連結部H對向配置。具體而言,柄凸緣133A於軸L方向上跨於連結部H且延伸至外側凸緣131a與閥部102之內筒102b。亦即,柄凸緣133A之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。柄凸緣133A之後側之端部於軸L方向上位於較連結部H更後側。The shank flange (flange facing portion) 133A includes a conductive material (for example, Kovar alloy, etc.) and has a cylindrical shape. On the inner side of the
X光管10A具備具有與第1實施形態之外側電極150同樣之功能之外側電極150A。外側電極150A係由凸緣131A之內側凸緣131d、及柄凸緣133A構成。此外,外側電極150A可由內側凸緣131d及柄凸緣133A之任一者構成。The
如以上所述般,在本變化例中,X光管10A可使內側凸緣131d及柄凸緣133A作為外側電極150A而發揮功能,無須將外側電極150A作為個別構件而設置,可使構成簡單化。As described above, in this modified example, in the
(X光管之第2變化例)
其次,說明第1實施形態之X光管10之第2變化例。如圖8所示,X光管10B為反射型X光管。X光管10B於電子槍部110之前側之位置具備支持靶T之靶支持體105。靶支持體105以靶T之電子槍部110側之面之法線方向、與軸L方向交叉之方式支持靶T。(The second modification of X-ray tube)
Next, a second modification example of the
X光管10B之頭部101B於與電子槍120之前側之正面位置不同之位置具有開口101a。頭部101B與第1實施形態之X光管10之頭部101同樣地,由金屬材料形成,在電位上相當於X光管10B之陽極。頭部101B之開口101a由X光出射窗104覆蓋。X光管10B將藉由來自電子槍部110之電子束M朝靶T入射而產生之X光自X光出射窗104出射。如此,即便於使用反射型X光管10B作為X光管之情形下,亦發揮與第1實施形態同樣之作用效果。The
(X光管之第3變化例)
其次,說明第1實施形態之X光管10之第3變化例。如圖9所示,X光管10C與第1實施形態之X光管10不同,閥部102C呈圓筒形狀。X光管10C具備真空殼體部100C、電子槍部110C、及靶T。(The third modification of X-ray tube)
Next, a third modification example of the
真空殼體部100C收容電子槍部110C、及靶T。真空殼體部100C呈沿管軸AX(軸L)延伸之大致圓柱狀之外形。真空殼體部100C具備:由金屬材料(例如,不銹鋼、銅、銅合金、鐵合金等)形成之頭部101C、及由絕緣材料(例如,玻璃、陶瓷等)形成之閥部102C。頭部101C由金屬材料形成,在電位上相當於X光管10C之陽極。頭部101C與閥部102C藉由包含科伐合金等之閥凸緣103而相互連結。The
閥部102C形成為沿X光管10C之管軸AX延伸之圓筒形狀。於閥部102C之後側之端部連結有電子槍部110C。閥部102C之前側之端部之開口由頭部101密封。The
電子槍部110C具有:電子槍120、及用於將電子槍120連結於閥部102C之後側之端部之連結凸緣130C。連結凸緣130C固定於電子槍120,且連結於閥部102C。連結凸緣130C將閥部102C之後側之端部之開口密封。The
更詳細而言,連結凸緣130C具備凸緣131C、柄部132、及柄凸緣133。凸緣131C包含導電材料(例如科伐合金等),呈圓筒形狀。於凸緣131C之內側配置柄凸緣133及柄部132。In more detail, the connecting
凸緣131C之前側之端部連結於閥部102C之後側之端部。此處,凸緣131C與閥部102C之連結部H中之面向內部空間R之部分與內部空間R內之真空區域(絕緣體)相接。又,凸緣131C與閥部102C之連結部H中之面向真空殼體部100C之外側區域之部分與被封入筒構件21內之絕緣油22(絕緣體)相接。亦即,連結部H成為三接點。在本變化例中,連結部H(三接點)繞軸L(出射軸MX)呈環狀延伸。The front end of the
又,X光管10C具備包圍連結部H之內側電極140C及外側電極150C。連結部H位於內側電極140C與外側電極150C之間。亦即,三接點位於內側電極140C與外側電極150C之間。換言之,藉由內側電極140C與外側電極150C,而將三接點夾入。In addition, the
內側電極140C設置於真空殼體部100C之內側區域(內部空間R內)。內側電極140C與閥部102C分開設置。內側電極140C包含導電材料(例如不銹鋼等)。內側電極140C與連結部H分開、且與連結部H對向配置。又,內側電極140C沿軸L之方向觀察,自內側包圍呈環狀延伸之連結部H。The
更詳細而言,內側電極140C具備包圍部141C、及環狀部142C。包圍部141C呈圓筒形狀,配置為沿軸L延伸。電子槍120於包圍部141C之內側穿過。包圍部141C自沿軸L之方向觀察,自內側包圍呈環狀延伸之連結部H。包圍部141C於軸L方向上跨於連結部H且延伸至電子槍部110C之凸緣131C與閥部102C。亦即,包圍部141C之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。包圍部141C之後側之端部於軸L方向上位於較連結部H更後側。In more detail, the
環狀部142C呈環形狀。環狀部142C將包圍部141C之後側之端部、與凸緣131C之內周面連結。The
如此,內側電極140C自電子槍部110C之與凸緣131C之連結部分朝向前側延伸。內側電極140C自沿軸L之方向觀察,自內側包圍連結部H。亦即,內側電極140C於軸L方向上,跨於連結部H而自電子槍部110C之凸緣131C側朝向閥部102C側(朝向前側)突出。此處,於軸L方向上,將內側電極140C(包圍部141C)自連結部H之位置之突出高度(突出長度)設為C。又,將內側電極140C與連結部H之間隔設為D。此處之間隔D係呈環狀延伸之連結部H之徑向(相對於軸L垂直相交之方向)之內側電極140C(包圍部141C)與連結部H之距離。突出高度C與間隔D滿足
C≧0.5D。In this way, the
外側電極150C於真空殼體部100C之外側區域(內部空間R外),設置於真空殼體部100C之外側。外側電極150C被收容於X光產生裝置1之筒構件21。外側電極150C與閥部102C分開設置。外側電極150C包含導電材料(例如不銹鋼等)。外側電極150C與連結部H分開、且與連結部H對向配置。又,外側電極150C自沿軸L之方向觀察,自外側包圍呈環狀延伸之連結部H。The
更詳細而言,外側電極150C具備包圍部151C、及環狀部152C。包圍部151C呈圓筒形狀,配置為沿軸L延伸。真空殼體部100C及電子槍部110C於包圍部151C之內側穿過。包圍部151C自沿軸L之方向觀察,自外側包圍呈環狀延伸之連結部H。包圍部151C於軸L方向上跨於連結部H且延伸至電子槍部110C之凸緣131C與閥部102C。亦即,包圍部151C之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。包圍部151C之後側之端部於軸L方向上位於較連結部H更後側。In more detail, the
環狀部152C呈環形狀。環狀部152C將包圍部151C之後側之端部、與凸緣131C之外周面連結。The
如此,外側電極150C自電子槍部110C之與凸緣131C之連結部分朝向前側延伸。外側電極150C自沿軸L之方向觀察,自外側包圍連結部H。亦即,外側電極150C於軸L方向上,跨於連結部H而自電子槍部110C之凸緣131C側朝向閥部102C側(朝向前側)突出。此處,於軸L方向上,將外側電極150C(包圍部151C)自連結部H之位置之突出高度(突出長度)設為A。又,將外側電極150C與連結部H之間隔設為B。此處之間隔B係呈環狀延伸之連結部H之徑向(相對於軸L垂直相交之方向)之外側電極150C與連結部H之距離。突出高度A與間隔B滿足
A≧0.5B。In this way, the
此處,在本實施形態中,內側電極140C及外側電極150C藉由包含導電材料之凸緣131C而電性連接。因而,內側電極140C、外側電極150C、凸緣131C成為同電位。Here, in this embodiment, the
內側電極140C及外側電極150C之後側之端部分別連結於電子槍部110C之凸緣131C。內側電極140C及外側電極150C自電子槍部110C之凸緣131C朝向前側延伸,覆蓋連結部H。內側電極140C及外側電極150C未抵接於閥部102C。亦即,內側電極140C及外側電極150C之前側之端部未抵接於其他構件。因而,內側電極140C與外側電極150C之間之空間之前側開口。若外側電極150C之突出高度A及內側電極140C之突出高度C變高,則自前側通過內側電極140C及外側電極150C之間而到達連結部H之距離變長。The rear ends of the
如以上所述般,於X光管10C中,電子槍部110C(凸緣131C)與閥部102C之連結部H位於內側電極140C與外側電極150C之間。因而,可發揮與第1實施形態之X光管10同樣之各種作用效果。亦即,X光管10C於使用呈容易製造之筒形狀之閥部102C,外側電極150C將電子槍部110C(凸緣131C)與閥部102C之連結部H收容於內側之情形下,亦可抑制電場於連結部H之集中,而可抑制放電之產生。As described above, in the
(X光管之第4變化例)
其次,說明第1實施形態之X光管10之第4變化例。如圖10所示,本變化例之X光管10D將上述第3變化例之X光管10C之外側電極150C與凸緣131C一體地構成。更詳細而言,X光管10D具備凸緣134,而取代第3變化例之X光管10C之凸緣131C及外側電極150C。(The fourth modification of X-ray tube)
Next, a fourth modification example of the
凸緣134包含導電材料(例如科伐合金等)。凸緣134具備筒部134a、及突出部134b。筒部134a與突出部134b一體地構成。筒部134a呈圓筒形狀。筒部134a成為與上述第3變化例之X光管10C之凸緣131C同樣之構成。於筒部134a之前側之端部連結有閥部102C。於筒部134a之內周面連結有內側電極140C。The
突出部134b自筒部134a之前側之端部外周面朝向外側(與閥部102C分開之方向)突出且朝向前側延伸。突出部134b自沿軸L之方向觀察,自外側包圍筒部134a與閥部102C之連結部H。更詳細而言,突出部134b具備包圍部134c、及環狀部134d。突出部134b之包圍部134c及環狀部134d為與上述第3變化例之X光管10C之外側電極150C之包圍部151C及環狀部152C同樣之構成。亦即,凸緣134之突出部134b作為具有與上述第3變化例之X光管10C之外側電極150C同樣之功能之外側電極150D而發揮功能。The protruding
如以上所述般,在本變化例中,X光管10D可使凸緣134之突出部134b作為外側電極150D而發揮功能,無須將外側電極150D作為個別構件而設置,可使構成簡單化。As described above, in this modified example, the
(X光管之第5變化例)
其次,說明第1實施形態之X光管10之第5變化例。如圖11所示,本變化例之X光管10E之電子槍120E之電子槍殼體部126兼具上述第3變化例之X光管10C之內側電極140C之功能。(The fifth modification of X-ray tube)
Next, a fifth modification example of the
更詳細而言,X光管10E具備電子槍120E,而取代第3變化例之X光管10C之電子槍120。電子槍120E具備電子槍殼體部126,而取代第3變化例之X光管10C之電子槍120之電子槍殼體部125。In more detail, the
電子槍殼體部126包含導電材料(例如不銹鋼等),呈大致圓筒形狀。更詳細而言,電子槍殼體部126具有:殼體大徑部126a、第1環狀部126b、殼體小徑部(殼體對向部)126c、及第2環狀部126d。The electron
殼體大徑部126a呈圓筒形狀,配置於凸緣131C之內側。殼體大徑部126a之外徑與凸緣131C之內徑大致相等。殼體大徑部126a之外周面連結於凸緣131C之內周面。或,殼體大徑部126a之後側之端部可連結於柄凸緣133之前側之端部。殼體小徑部126c呈圓筒形狀。殼體小徑部126c之外徑小於殼體大徑部126a之外徑。殼體小徑部126c配置於殼體大徑部126a之前側之位置。殼體大徑部126a之前側之端部、與殼體小徑部126c之後側之端部藉由呈環形狀之第1環狀部126b而連結。殼體小徑部126c與連結部H分開,且配置為與連結部H對向。The housing large-
如此,電子槍殼體部126之殼體小徑部126c成為配置於真空殼體部100C之內部空間R(內側區域),且與連結部H分開並且與連結部H對向配置之殼體對向部。殼體小徑部126c自沿軸L之方向觀察,自內側包圍環狀之連結部H。殼體小徑部126c之前側之端部與第2柵電極124之後側之端部藉由環狀之第2環狀部126d而連結。電子槍殼體部126與閥部102C分開設置。In this way, the small-
此處,藉由電子槍殼體部126之第1環狀部126b與殼體小徑部126c,而形成與上述第3變化例之X光管10C之內側電極140C同樣之形狀。亦即,第1環狀部126b及殼體小徑部126c作為具有與上述第3變化例之X光管10C之內側電極140C同樣之功能之內側電極140E而發揮功能。換言之,內側電極140E係由電子槍殼體部126之第1環狀部126b及殼體小徑部126c構成。Here, the first
如以上所述般,在本變化例中,X光管10E可使電子槍殼體部126之一部分(第1環狀部126b及殼體小徑部126c)作為內側電極140E而發揮功能,無須將內側電極140E作為個別構件而設置,可使構成簡單化。As described above, in this modified example, the
(X光管之第6變化例)
其次,說明第1實施形態之X光管10之第6變化例。如圖12所示,本變化例之X光管10F為反射型X光管。該X光管10F係將作為透過型X光管之上述第3變化例之X光管10C之構成之一部分進行變更而成者。X光管10F於電子槍部110C之前側之位置具備支持靶T之靶支持體105。靶支持體105包含銅等金屬材料。靶支持體105以靶T之電子槍部110C側之面之法線方向、與軸L方向交叉之方式支持靶T。(The sixth modification of X-ray tube)
Next, a sixth modification example of the
X光管10F之頭部101F於與電子槍120之前側之正面位置不同之位置具有開口101a。頭部101F與第1實施形態之X光管10之頭部101同樣地由金屬材料形成,在電位上相當於X光管10F之陽極。頭部101F之開口101a由X光出射窗104覆蓋。X光管10F將藉由來自電子槍部110C之電子束M朝靶T入射而產生之X光,自X光出射窗104出射。如此,即便於使用反射型X光管10F作為X光管之情形下,亦發揮與上述第3變化例之X光管10C同樣之作用效果。The
(X光管之第7變化例)
其次,說明第1實施形態之X光管10之第7變化例。如圖13所示,本變化例之X光管10G與上述第6變化例之X光管10F同樣地,為反射型X光管。惟,本變化例之X光管10G,其支持靶T之靶支持體105由保持閥部107予以保持。(The seventh modification of X-ray tube)
Next, a seventh modification example of the
更詳細而言,真空殼體部100G具備閥部102C、殼體部106、及保持閥部107。殼體部106由金屬材料(例如,不銹鋼、銅、銅合金、鐵合金等)形成。殼體部106呈圓筒形狀,配置為沿軸L方向延伸。於殼體部106設置有開口部106a。開口部106a由X光出射窗104覆蓋。殼體部106後側之端部藉由閥凸緣103而連結於閥部102C前側之端部。In more detail, the
保持閥部107由絕緣材料(例如,玻璃、陶瓷等)形成。保持閥部107呈圓筒形狀,配置為沿軸L方向延伸。保持閥部107後側之端部藉由包含科伐合金等金屬材料之連接部108而連結於殼體部106前側之端部。The holding
支持靶T之靶支持體105配置於殼體部106及保持閥部107內。靶支持體105連結於保持閥部107之前側之端部,自與保持閥部107之連結部朝向電子槍部110C側延伸。保持閥部107藉由包含科伐合金等金屬材料之連接部109而與靶支持體105連結。X光管10G將藉由來自電子槍部110C之電子束M朝靶T入射而產生之X光自X光出射窗104出射。The
此處,於本變化例之X光管10G中,電子槍部110C係由絕緣體(閥部102C)支持,且靶T(靶支持體105)亦由絕緣體(保持閥部107)支持。藉此,可對電子槍部110C側與靶T側之各側施加電壓。亦即,例如,於X光管10G針對X光之照射需要100 kv之電壓之情形下,將殼體部106設為接地電位,對電子槍部110C側施加-50 kV之電壓,對靶T側施加50 kV之電壓。藉此,可於靶T與電子槍部110C之間獲得所需之100 kV之電位差。如此,藉由將所需之電壓分壓並對靶T側與電子槍部110C側施加,而可降低對各個部位施加之電壓值本身,可降低對各個部位所要求之耐電壓能力。Here, in the
(第2實施形態)
其次,說明X光產生裝置之第2實施形態。此處,上述之第1實施形態之X光產生裝置1之X光管10及第1~第7變化例之X光管10A~10G具備外側電極150、150A、150C、150D而作為構成要素。相對於此,於本實施形態之X光產生裝置中,除了X光管外,另具備外側電極。(Second Embodiment)
Next, the second embodiment of the X-ray generator will be described. Here, the
具體而言,如圖14所示,本實施形態之X光產生裝置1A具備X光管10H、饋電部40H、及外側電極150H。又,X光產生裝置1A進而與第1實施形態之X光產生裝置1之裝置殼體部20及電源部30同樣地,具備省略圖示之裝置殼體部及電源部。X光產生裝置1A所具備之裝置殼體部及電源部為與第1實施形態之X光產生裝置1所具備之裝置殼體部20及電源部30同樣之構成,且省略詳細之說明及圖示。Specifically, as shown in FIG. 14, the
此處,X光管10H對於上述之第1實施形態之X光產生裝置1之X光管10,僅不具備外側電極150之方面不同。亦即,於X光管10H中,第1實施形態之X光管10之外側電極150以外之構成與第1實施形態之X光管10之構成同樣,賦予同一符號且省略詳細之說明。於本實施形態中,饋電部40H自電源部向X光管10H供給電力(高壓電壓)。饋電部40H具有與第1實施形態之X光產生裝置1之饋電部40同樣之構成。Here, the
外側電極150H被收容於裝置殼體部20之筒構件21內。外側電極150H配置於真空殼體部100之外側區域。外側電極150H與X光管10H之閥部102分開設置。外側電極150H包含導電材料(例如不銹鋼等)。外側電極150H與連結部H分開,且與連結部H對向配置。又,外側電極150H自沿軸L之方向觀察,自內側包圍呈環狀延伸之連結部H。於本實施形態中,外側電極150H呈將饋電部40H之至少一部分收容於內側之筒形狀。亦即,外側電極150H覆蓋饋電部40H之至少一部分。The
更詳細而言,外側電極150H呈圓筒形狀,配置為沿軸L延伸。外側電極150H覆蓋沿軸L方向延伸之饋電部40H之外周面。外側電極150H配置於閥部102之內筒102b之內側。亦即,外側電極150H插入閥部102之凹部102w。In more detail, the
外側電極150H作為一例,抵接於柄凸緣133之後側之端部及凸緣131之內側凸緣131b之後側之端部之至少任一者。此處,外側電極150H並不限定於抵接於柄凸緣133之後側之端部及凸緣131之內側凸緣131b之後側之端部之至少任一者。外側電極150H可以與凸緣131及內側電極140成為同電位之方式,經由例如配線等與其等電性連接。As an example, the
外側電極150H於軸L方向上跨於連結部H且延伸至電子槍部110之凸緣131與閥部102之內筒102b。亦即,外側電極150H之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。外側電極150H之後側之端部於軸L方向上位於較連結部H更後側。The
如此,外側電極150H自柄凸緣133朝向後側延伸。外側電極150H自沿軸L之方向觀察,自內側包圍連結部H。亦即,外側電極150H於軸L方向上,跨於連結部H而自電子槍部110側朝向電源部30側(朝向後側)突出。此處,於軸L方向上,將外側電極150H自連結部H之位置之突出高度(突出長度)設為A。又,將外側電極150H與連結部H之間隔設為B。此處之間隔B係呈環狀延伸之連結部H之徑向(相對於軸L垂直相交之方向)之外側電極150H與連結部H之距離。突出高度A與間隔B滿足
A≧0.5B。In this way, the
如以上所述般,於X光產生裝置1A中,具備自內側包圍連結部H之外側電極150H。因而,X光產生裝置1A與第1實施形態之X光產生裝置1之X光管10同樣地,可抑制電場於電子槍部110與閥部102之連結部H之集中,而可抑制放電之產生。As described above, the
於筒形狀之外側電極150H之內側收容饋電部40H,此情形下,外側電極150H可兼具收容且保護饋電部H之功能、及抑制電場於連結部H之集中之功能。The
閥部102具備:外筒102a、配置於外筒102a內之內筒102b、及將外筒102a及內筒102b之後側之端部彼此連結之筒連結部102c,電子槍部110連結於內筒102b之前側之端部,外側電極150H配置於內筒102b之內側。亦即,X光產生裝置1A之X光管10H具備如一端部被折回之形狀之閥部102,電子槍部110於圓筒形狀之凹部102w內固定。此情形下,由於連結部H被收容於由包含絕緣材料之外筒102a包圍之空間內,故可抑制連結部H與X光產生裝置1A之一部分(例如筒構件21)之間之放電之產生。The
(第2實施形態之X光產生裝置之變化例)
其次,說明第2實施形態之X光產生裝置之變化例。如圖15所示,本變化例之X光產生裝置1B具備X光管10J、饋電部40J、及外側電極150J。又,X光產生裝置1B進而與第1實施形態之X光產生裝置1之裝置殼體部20及電源部30同樣地,具備省略圖示之裝置殼體部及電源部。X光產生裝置1B所具備之裝置殼體部及電源部為與第1實施形態之X光產生裝置1所具備之裝置殼體部20及電源部30同樣之構成,且省略詳細之說明及圖示。(Variations of the X-ray generator of the second embodiment)
Next, a modified example of the X-ray generating apparatus of the second embodiment will be explained. As shown in FIG. 15, the
此處,X光管10J對於上述之第3變化例之X光管10C,僅不具備外側電極150之方面不同。亦即,於X光管10J中,第3實施形態之X光管10C之外側電極150以外之構成與第3實施形態之X光管10C之構成同樣,賦予同一符號且省略詳細之說明。於本實施形態中,饋電部40J自電源部向X光管10J供給電力(高壓電壓)。饋電部40J具有與第1實施形態之X光產生裝置1之饋電部40同樣之構成。Here, the
外側電極150J配置於真空殼體部100C之外側區域。此外,外側電極150J被收容於裝置殼體部之筒構件(相當於圖1之筒構件21)內。外側電極150J與X光管10J之閥部102C分開設置。外側電極150J包含導電材料(例如不銹鋼等)。外側電極150J與連結部H分開,且與連結部H對向配置。又,外側電極150J自沿軸L之方向觀察,自外側包圍呈環狀延伸之連結部H。於本實施形態中,外側電極150J呈將饋電部40J之至少一部分(連接於X光管10J之側之端部)收容於內側之筒形狀。亦即,外側電極150J覆蓋饋電部40J之至少一部分。The
更詳細而言,外側電極150J呈圓筒形狀,配置為沿軸L延伸。外側電極150J覆蓋沿軸L方向延伸之饋電部40J之外周面。亦即,外側電極150J自外側覆蓋閥部102C之供電子槍部110C(凸緣131C)連結之側之端部。In more detail, the
外側電極150J以與凸緣131C及內側電極140C成為同電位之方式,經由例如配線等與其等電性連接。The
外側電極150J於軸L方向上跨於連結部H且延伸至電子槍部110C之凸緣131C與閥部102C。亦即,外側電極150J之前側之端部於軸L方向上位於較連結部H更前側(靶T側)。外側電極150J之後側之端部於軸L方向上位於較連結部H更後側。The
如此,外側電極150J於軸L方向上,跨於連結部H而自電子槍部110C之凸緣131C側朝向靶T側(朝向前側)突出。此處,於軸L方向上,將外側電極150J自連結部H之位置之突出高度(突出長度)設為A。又,將外側電極150J與連結部H之間隔設為B。此處之間隔B係呈環狀延伸之連結部H之徑向(相對於軸L垂直相交之方向)之外側電極150J與連結部H之距離。突出高度A與間隔B滿足
A≧0.5B。In this manner, the
如以上所述般,於X光產生裝置1B中,具備自內側包圍連結部H之外側電極150J。因而,X光產生裝置1B與第1實施形態之X光產生裝置1之X光管10同樣地,可抑制電場於電子槍部110C與閥部102C之連結部H之集中,而可抑制放電之產生。又,X光產生裝置1B於使用呈容易製造之筒形狀之閥部102C,外側電極150J將電子槍部110C(凸緣131C)與閥部102C之連結部H收容於內側之情形下,亦可抑制電場於連結部H之集中,而可抑制放電之產生。As described above, the
以上,說明了本發明之各種實施形態及變化例,但本發明並非係限定於上述實施形態及變化例者。例如,可將上述之各種實施形態及各種變化例之至少一部分任意組合。In the foregoing, various embodiments and modified examples of the present invention have been described, but the present invention is not limited to the above-mentioned embodiments and modified examples. For example, at least a part of the various embodiments and various modifications described above can be combined arbitrarily.
1,1A,1B:X光產生裝置 10,10A~10H,10J:X光管 20:裝置殼體部 21:筒構件(收容部) 21a,21b,101a:開口 21c:內部空間 22:絕緣油 30:電源部 31:絕緣塊 32:升壓部 33:電源外殼 40,40H,40J:饋電部 100,100C,100G:真空殼體部 101,101B,101C,101F:頭部 102,102C:閥部 102a:外筒 102b:內筒 102c:筒連結部 102w:凹部 103:閥凸緣 104:X光出射窗 105:靶支持體 106:殼體部 106a:開口部 107:保持閥部 108,109:連接部 110,110C:電子槍部 120,120E:電子槍 121:加熱器 122:陰極 123:第1柵電極 124:第2柵電極 125,126:電子槍殼體部 126a:殼體大徑部 126b:第1環狀部 126c:殼體小徑部(殼體對向部) 126d:第2環狀部 130,130C:連結凸緣 131,131A,131C,134:凸緣 131a:外側凸緣 131b:內側凸緣 131c,134d,142,142C,152C:環狀部 131d:內側凸緣(凸緣對向部) 132:柄部 133:柄凸緣(凸緣對向部) 133A:柄凸緣 134a:筒部 134b:突出部 134c,141,141C,151C:包圍部 140,140C,140E:內側電極 150,150A,150C,150D,150H,150J:外側電極 A:突出高度 AX:管軸 B:間隔 C:突出高度 D:間隔 H:連結部 L:軸 M:電子束 MX:出射軸 R:內部空間 S:柄銷 T:靶 XR:X光1,1A,1B: X-ray generator 10,10A~10H,10J: X-ray tube 20: Device housing 21: Cylinder member (receiving part) 21a, 21b, 101a: opening 21c: internal space 22: insulating oil 30: Power supply department 31: Insulating block 32: Boost 33: power shell 40, 40H, 40J: power feeder 100, 100C, 100G: Vacuum shell part 101, 101B, 101C, 101F: head 102, 102C: Valve section 102a: outer cylinder 102b: inner cylinder 102c: Cylinder connection part 102w: recess 103: Valve flange 104: X-ray exit window 105: target support 106: Shell 106a: opening 107: Keep the valve part 108, 109: connecting part 110, 110C: electron gun department 120, 120E: electron gun 121: heater 122: cathode 123: The first gate electrode 124: 2nd gate electrode 125, 126: Electron gun housing 126a: Large diameter part of the shell 126b: The first ring part 126c: Small diameter part of the shell (opposite part of the shell) 126d: 2nd ring part 130, 130C: connecting flange 131, 131A, 131C, 134: flange 131a: Outer flange 131b: inner flange 131c, 134d, 142, 142C, 152C: ring part 131d: Inner flange (opposite part of flange) 132: handle 133: Shank flange (opposite part of flange) 133A: Shank flange 134a: Tube 134b: protrusion 134c, 141, 141C, 151C: Surrounding part 140, 140C, 140E: inner electrode 150, 150A, 150C, 150D, 150H, 150J: outer electrode A: Protruding height AX: tube axis B: interval C: Protruding height D: interval H: connecting part L: axis M: electron beam MX: exit axis R: Internal space S: Shank pin T: target XR: X-ray
圖1係顯示第1實施形態之X光產生裝置之縱剖視圖。 圖2係於縱方向切斷圖1之X光管之剖面圖。 圖3係顯示電場之模擬所使用之X光產生裝置之模型的剖面圖。 圖4係顯示於X光管產生之電場之模擬結果(等電位線)之圖。 圖5係顯示於X光管產生之電場之模擬結果(等電位線)之圖。 圖6係顯示於X光管產生之電場之模擬結果(等電位線)之圖。 圖7係於縱方向切斷第1變化例之X光管之剖面圖。 圖8係於縱方向切斷第2變化例之X光管之剖面圖。 圖9係於縱方向切斷第3變化例之X光管之剖面圖。 圖10係於縱方向切斷第4變化例之X光管之剖面圖。 圖11係於縱方向切斷第5變化例之X光管之剖面圖。 圖12係於縱方向切斷第6變化例之X光管之剖面圖。 圖13係於縱方向切斷第7變化例之X光管之剖面圖。 圖14係於縱方向切斷第2實施形態之X光產生裝置之X光管之剖面圖。 圖15係於縱方向切斷第2實施形態之變化例之X光產生裝置之X光管的剖面圖。Fig. 1 is a longitudinal cross-sectional view showing the X-ray generator of the first embodiment. Fig. 2 is a cross-sectional view of the X-ray tube of Fig. 1 cut in the longitudinal direction. Fig. 3 is a cross-sectional view showing the model of the X-ray generating device used in the simulation of the electric field. Fig. 4 is a graph showing the simulation result (equipment line) of the electric field generated by the X-ray tube. Figure 5 is a graph showing the simulation results (equipment lines) of the electric field generated by the X-ray tube. Fig. 6 is a graph showing the simulation result (equipment line) of the electric field generated by the X-ray tube. Fig. 7 is a cross-sectional view of the X-ray tube of the first modified example cut in the longitudinal direction. Fig. 8 is a cross-sectional view of the X-ray tube of the second modification example cut in the longitudinal direction. Fig. 9 is a cross-sectional view of the X-ray tube of the third modification example cut in the longitudinal direction. Fig. 10 is a cross-sectional view of the X-ray tube of the fourth modified example cut in the longitudinal direction. Fig. 11 is a cross-sectional view of the X-ray tube of the fifth modified example cut in the longitudinal direction. Fig. 12 is a cross-sectional view of the X-ray tube of the sixth modified example cut in the longitudinal direction. Fig. 13 is a cross-sectional view of the X-ray tube of the seventh modification in the longitudinal direction. Fig. 14 is a cross-sectional view of the X-ray tube of the X-ray generator of the second embodiment cut in the longitudinal direction. Fig. 15 is a cross-sectional view of the X-ray tube of the X-ray generator according to the modified example of the second embodiment cut in the longitudinal direction.
10:X光管 10: X-ray tube
100:真空殼體部 100: Vacuum shell part
101:頭部 101: head
101a:開口 101a: opening
102:閥部 102: Valve Department
102a:外筒 102a: outer cylinder
102b:內筒 102b: inner cylinder
102c:筒連結部 102c: Cylinder connection part
102w:凹部 102w: recess
103:閥凸緣 103: Valve flange
104:X光出射窗 104: X-ray exit window
110:電子槍部 110: Electron Gun Department
120:電子槍 120: electron gun
121:加熱器 121: heater
122:陰極 122: cathode
123:第1柵電極 123: The first gate electrode
124:第2柵電極 124: 2nd gate electrode
125:電子槍殼體部 125: Electron gun housing
130:連結凸緣 130: connecting flange
131:凸緣 131: Flange
131a:外側凸緣 131a: Outer flange
131b:內側凸緣 131b: inner flange
131c,142:環狀部 131c, 142: Ring part
132:柄部 132: handle
133:柄凸緣(凸緣對向部) 133: Shank flange (opposite part of flange)
140:內側電極 140: inner electrode
141:包圍部 141: Surrounding part
150:外側電極 150: Outer electrode
A:突出高度 A: Protruding height
AX:管軸 AX: tube axis
B:間隔 B: interval
C:突出高度 C: Protruding height
D:間隔 D: interval
H:連結部 H: connecting part
L:軸 L: axis
M:電子束 M: electron beam
MX:出射軸 MX: exit axis
R:內部空間 R: Internal space
S:柄銷 S: Shank pin
T:靶 T: target
XR:X光 XR: X-ray
Claims (13)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-136164 | 2019-07-24 | ||
| JP2019136164A JP7337577B2 (en) | 2019-07-24 | 2019-07-24 | X-ray tube and X-ray generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202111754A true TW202111754A (en) | 2021-03-16 |
| TWI846908B TWI846908B (en) | 2024-07-01 |
Family
ID=74193451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109124564A TWI846908B (en) | 2019-07-24 | 2020-07-21 | X-ray tube and X-ray generating device |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP7337577B2 (en) |
| TW (1) | TWI846908B (en) |
| WO (1) | WO2021015037A1 (en) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07296754A (en) * | 1994-04-27 | 1995-11-10 | Toshiba Corp | Electron tube and manufacturing method thereof |
| US6570962B1 (en) * | 2002-01-30 | 2003-05-27 | Koninklijke Philips Electronics N.V. | X-ray tube envelope with integral corona shield |
| DE602005026450D1 (en) * | 2004-12-27 | 2011-03-31 | Hamamatsu Photonics Kk | X-RAYS AND X-RAY SOURCE |
| US7382862B2 (en) * | 2005-09-30 | 2008-06-03 | Moxtek, Inc. | X-ray tube cathode with reduced unintended electrical field emission |
| WO2009006592A2 (en) * | 2007-07-05 | 2009-01-08 | Newton Scientific, Inc. | Compact high voltage x-ray source system and method for x-ray inspection applications |
| JP6468821B2 (en) * | 2014-11-28 | 2019-02-13 | キヤノン株式会社 | X-ray generator tube, X-ray generator and X-ray imaging system |
| JP6889619B2 (en) * | 2017-06-07 | 2021-06-18 | 浜松ホトニクス株式会社 | X-ray generator |
| FR3069099B1 (en) * | 2017-07-11 | 2023-07-21 | Thales Sa | COMPACT IONIZING RAY-GENERATING SOURCE, ASSEMBLY COMPRISING SEVERAL SOURCES AND METHOD FOR MAKING THE SOURCE |
-
2019
- 2019-07-24 JP JP2019136164A patent/JP7337577B2/en active Active
-
2020
- 2020-07-13 WO PCT/JP2020/027236 patent/WO2021015037A1/en not_active Ceased
- 2020-07-21 TW TW109124564A patent/TWI846908B/en active
-
2023
- 2023-08-23 JP JP2023135420A patent/JP7469547B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023153321A (en) | 2023-10-17 |
| JP2021022427A (en) | 2021-02-18 |
| WO2021015037A1 (en) | 2021-01-28 |
| JP7469547B2 (en) | 2024-04-16 |
| JP7337577B2 (en) | 2023-09-04 |
| TWI846908B (en) | 2024-07-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7048396B2 (en) | X-ray tube | |
| US8761345B2 (en) | X-ray tube | |
| US11875965B2 (en) | X-ray tube | |
| EP1833075B1 (en) | X-ray tube and x-ray source | |
| EP1944788B1 (en) | X-ray tube and x-ray source including same | |
| EP1950788B1 (en) | X-ray tube and x-ray source including same | |
| EP1944789B1 (en) | X-ray tube and x-ray source including same | |
| JP6889619B2 (en) | X-ray generator | |
| US11147148B2 (en) | X-ray generator | |
| TW202111754A (en) | X-ray tube and x-ray generation device | |
| CN110379696B (en) | X-ray tube | |
| JP4279994B2 (en) | X-ray tube device | |
| JP2005228696A (en) | Fixed anode x-ray tube | |
| US7764018B2 (en) | Gas discharge tube | |
| JP2008226783A (en) | X-ray generator and X-ray apparatus | |
| US12176175B2 (en) | Electron beam generation source, electron beam emission device, and x-ray emission device | |
| JP7538613B2 (en) | Electron beam source, electron beam irradiation device, and X-ray irradiation device | |
| AU2004214163A1 (en) | Gas discharge tube | |
| JP2024115937A (en) | X-ray tube |