TW202116408A - Gas and liquid mixed regulating controlling system and regulating and controlling method do not need to use electricity for controlling and avoid consuming of power resource - Google Patents

Abstract

A gas and liquid mixed regulating controlling system comprises a liquid supply device for providing liquid, a liquid pressure regulation valve, a gas supply device for providing gas, a gas pressure regulation valve, a mixing tank body, an output pipe, and a non-electric controlled flow regulation device. The mixing tank body communicates with the liquid pressure regulation valve and the gas pressure regulation valve, wherein gas and liquid are mixed into the mixing tank body to form a mixed fluid. A first end of the output pipe communicates with the mixing tank body while a second end communicates with the machine so that the mixed fluid is outputted from the mixing tank body to the machine via the output pipe, and the mixed fluid in the first end has a third flow while the mixed fluid in the second end has a fourth flow. The non-electric controlled flow regulation device communicates with the output pipe, wherein the mixed fluid flowing through the non-electric controlled flow regulation device has a fifth flow. The first flow is greater than or equals to at least one of the fourth flow and the fifth flow. A gas and liquid mixed regulating controlling method is also disclosed herein.

Description

Gas-liquid mixing control system and control method

The invention relates to a gas-liquid mixing system; in particular, it refers to a gas-liquid mixing control system and control method.

In the high-tech field, it is necessary to use a gas-liquid mixed fluid with a stable concentration to manufacture high-tech product parts (for example, semiconductor chips, display devices, touch panels, etc.). This type of gas-liquid mixed fluid with stable concentration is usually supplied to the manufacturing machine of the above-mentioned high-tech product parts at a fixed pressure and a fixed flow rate.

Generally speaking, the gas-liquid mixed flow system uses an electronic control device (such as a mass flow controller; MFC, mass-flow controller) to adjust the pressure and flow of the liquid and gas input into the mixing tank, and then uses another electronic control device. Adjust the pressure and flow rate of the gas-liquid mixed fluid output to the manufacturing machine. Therefore, the traditional control method of the gas-liquid mixed fluid needs to be controlled by an electronic control device, which causes a heavy burden on the consumption of power resources and forms another type of Environmental issues.

Furthermore, because the above-mentioned traditional method for regulating and controlling gas-liquid mixed fluid needs to be regulated by an electronic control device, and the flow rate of the gas-liquid mixed fluid that can be supplied by the related electronic control device is quite limited (for example, 6~8LPM), so if When there are multiple manufacturing machines that need to supply a large amount of gas-liquid mixed fluid (such as 10-12LPM), multiple control units of gas-liquid mixed fluid must be connected in parallel to fully supply the flow of gas-liquid mixed fluid required by the manufacturing machine. Parallel control units for multiple gas-liquid mixed fluids require additional use space in the plant and consume a large amount of electricity, which increases the manufacturing cost of the above-mentioned high-tech product parts.

In addition, if the flow rate of the gas-liquid mixed fluid required by the manufacturing machine is low (for example, 2~4LPM), it will exceed the control range of the relevant electronic control device, so that the concentration ratio of the gas-liquid mixed fluid and other related parameters are unbalanced, and it is impossible to Meet the use requirements of the above-mentioned manufacturing machines.

In summary, the existing gas-liquid mixing control system and control method still need to be improved to improve the many problems existing in the traditional gas-liquid mixing control system and control method.

In view of this, the object of the present invention is to provide a gas-liquid mixing control system and control method, which performs the output flow control of the gas-liquid mixed fluid in a non-electrically controlled manner, and can supply a large flow range (for example, 2-16LPM), and then It is convenient to use a single gas-liquid mixing control system to meet the flow requirements of low-flow (2~4LPM) and high-flow (10-14LPM) gas-liquid mixed fluids. In addition, the gas-liquid mixing control system and control method provided by the present invention do not need to use electricity for control, so the consumption of power resources can be avoided, and it meets the environmental protection requirements of the new-type manufacturing industry.

In order to achieve the above objective, the present invention provides a gas-liquid mixing control system, including: a liquid supply device, a liquid pressure regulating valve, a gas supply device, a gas pressure regulating valve, a mixing tank, and an output pipeline And a non-electrically controlled flow regulating device, wherein the liquid supply device is used to provide a liquid of a first fixed pressure and a first flow rate; the liquid pressure regulating valve is connected to the liquid supply device for keeping the liquid in A first fixed pressure and a first flow rate; the gas supply device is used to provide a second fixed pressure and a second flow rate of a gas; the gas pressure regulating valve is connected to the gas supply device to maintain the gas At a second fixed pressure and a second flow rate, the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; the mixing tank is connected to the liquid pressure regulating valve and the gas pressure regulating valve, the The liquid pressure regulating valve is arranged between the liquid supply device and the mixing tank body, the gas pressure regulating valve is arranged between the gas supply device and the mixing tank body and is connected to the liquid supply device and the gas supply device, wherein the The liquid supply device of the liquid pressure regulating valve inputs the liquid into the mixing tank at the first fixed pressure and the first flow rate, and the gas supply device of the gas pressure regulating valve inputs the second fixed pressure and the second flow rate The gas enters the mixing tank, and the liquid and the gas are mixed in the mixing tank to form a mixed fluid; a first end of the output pipe and the output pipe is connected to the mixing tank, the mixing tank and The pressure of the mixed fluid in the output pipeline is the same, and a second end of the output pipeline is connected to at least one machine, so that the mixed fluid is output from the mixing tank through the output pipeline to the at least A machine, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a fourth flow rate; the non-electrically controlled flow rate adjusting device is connected to the output pipeline, wherein The mixed fluid passing through the non-electrically controlled flow rate adjusting device has a fifth flow rate; wherein, the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate.

Another object of the present invention is to provide a gas-liquid mixing control method, which includes at least the following steps: Providing a liquid with a first fixed pressure and a first flow rate in a mixing tank; Providing a gas with a second fixed pressure and a second flow rate in the mixing tank, wherein the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; Mixing the liquid and the gas in the mixing tank to form a mixed fluid; and The mixed fluid is output from the mixing tank to at least one machine through an output pipeline, wherein the pressure of the mixed fluid in the mixing tank and the output pipeline is the same, and a first end of the output pipeline Is connected to the mixing tank body, and a second end thereof is connected to the at least one machine, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a first Four flows; the output pipeline is connected to a non-electrically controlled flow regulating device, and the mixed fluid passing through the non-electrically controlled flow regulating device has a fifth flow; Wherein, the first flow rate is greater than or equal to the third flow rate, and the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate.

The effect of the present invention is that the gas-liquid mixing control system and the control method use a non-electrically controlled flow control device to regulate the output flow of the gas-liquid mixed fluid, and can supply a large flow range (for example, 2~16LPM), thereby facilitating a single The gas-liquid mixing control system can meet the flow requirements of low-flow (2~4LPM) and high-flow (10-14LPM) gas-liquid mixed fluids. In addition, the gas-liquid mixing control system and control method provided by the present invention do not need to use electricity for control, so the consumption of power resources can be avoided, and it meets the environmental protection requirements of the new-type manufacturing industry.

In order to explain the present invention more clearly, a preferred embodiment is given in conjunction with the drawings in detail as follows. Please refer to Figure 1. Figure 1 is a schematic diagram of a gas-liquid mixing control system 1 according to a preferred embodiment of the present invention, and the gas-liquid mixing control system 1 provided by the present invention can be used to mix water and carbon dioxide to form carbon dioxide water Fluid, but not limited by this. The chemical liquid dilution system 1 includes a liquid supply device 10, a gas supply device 20, a mixing tank 30, an output pipe 40 and a non-electrically controlled flow adjustment device 50.

In the embodiment of the present invention, the liquid supply device 10 is used to provide a first fixed pressure and a first flow rate of liquid (for example, water); the gas supply device 20 is used to provide a second fixed pressure and a second flow rate of gas (For example, it can be carbon dioxide).

In FIG. 1, the mixing tank 30 is connected to the liquid supply device 10 and the gas supply device 20. Among them, the liquid supply device 10 is used to input liquid into the mixing tank 30 at a first fixed pressure and a first flow rate. A liquid pressure regulating valve 12 may be provided between the liquid supply device 10 and the mixing tank 30 to control the flow of the liquid. The supply pressure or the fixed pressure directly supplied by the liquid supply device 10, and the gas supply device 20 inputs gas into the mixing tank 30 at a second fixed pressure and a second flow rate, the gas supply device 20 and the mixing tank 30 A gas pressure regulating valve 22 can be arranged between to control the gas supply pressure or the fixed pressure demanded directly from the supply end, and a gas flow meter 24 is arranged between the gas supply device 20 and the mixing tank 30 to measure and The flow rate of the gas flowing into the mixing tank 30 is regulated, and the liquid and the gas are mixed in the mixing tank 30 to form a mixed fluid. In the embodiment of the present invention, the gas flow meter 24 may be, for example, a float flow meter, but it is not limited thereto. In the embodiment of the present invention, the mixing tank 30 is connected to the liquid pressure regulating valve 12 and the gas pressure regulating valve 22; the liquid pressure regulating valve 12 inputs liquid into the mixing tank 30 at a first fixed pressure and a first flow rate, and The gas pressure regulating valve 22 inputs gas into the mixing tank 30 at a second fixed pressure and a second flow rate.

In the embodiment of the present invention, the liquid pressure regulating valve 12 includes a mechanical pressure and flow meter for measuring the pressure and flow value of the liquid output by the liquid supply device 10 and measuring the first flow rate F1 of the liquid input. In the embodiment of the present invention, the gas supply device 20 includes a mechanical pressure and flow meter for measuring the pressure and flow value of the gas output by the gas supply device 20. It is worth mentioning that the supply flow rate of liquid is L/min level, while the supply flow rate of gas is mL/min level. The difference between the two is more than a thousand times, and the gas will be dissolved in the liquid, and only the excess part of the gas will be The third flow rate F3 of the mixed fluid in the first end 40a of the mixing tank 30 and the output pipe 40 is almost the same as the first flow rate F1 when the liquid is input; in other words, the first flow rate F1 is greater than Or equal to 1000 times the second flow rate, so the third flow rate F3 of the mixed fluid formed by the mixture of liquid and gas is approximately equal to the first flow rate F1. In the embodiment of the present invention, the second fixed pressure of the gas is greater than the first fixed pressure of the liquid.

In FIG. 1, the first end 40a of the output pipe 40 is connected to the mixing tank body 30, and the second end 40b thereof is connected to at least one of the machines A, B, C, and D, so that the mixed fluid flows from the mixing tank body 30. It is output to machines A, B, C, D through the output pipe 40. In the embodiment of the present invention, the pressure of the mixed fluid in the mixing tank 30 and the output pipe 40 is the same. In the embodiment of the present invention, the mixed fluid in the first end 40a of the output pipe 40 has a third flow rate F3, and the mixed fluid in the second end 40b of the output pipe 40 has a fourth flow rate F4, and a fourth flow rate F4. It is controlled by the valve bodies of machines A, B, C, and D. When a fixed pressure is maintained in the mixing tank 30, the more the valves of machines A, B, C, and D are opened, the more The pressure is fixed, so that the flow through the nozzles of the same size will be the same. Therefore, the more valve bodies of machines A, B, C, and D are opened, the higher the value of the fourth flow rate F4 is. In the embodiment of the present invention, the fourth flow rate F4 of the second end 40b of the output pipe 40 is equal to a demand for the mixed fluid of at least one of the machines A, B, C, and D.

In FIG. 1, the non-electrically controlled flow rate adjustment device 50 is connected to the output pipe 40, and the mixed fluid passing through the non-electrically controlled flow rate adjustment device 50 has a fifth flow rate F5. In the embodiment of the present invention, the first flow rate F1 is greater than or equal to the third flow rate F3, and the first flow rate F1 is greater than or equal to at least one of the fourth flow rate F4 and the fifth flow rate F5; in practice, the first flow rate F1 is greater than or equal to at least one of the fourth flow rate F4 and the fifth flow rate F5; For example, the range of a flow rate F1 may be 0-16 LPM, the range of the third flow rate F3 may be 0-16 LPM, the range of the fourth flow rate F4 may be 0-16 LPM, and the range of the fifth flow rate F5 may be 0-16 LPM.

In the embodiment of the present invention, the first flow rate F1 is greater than the sum of the fourth flow rate F4 and the fifth flow rate F5, that is, when F1 = 16 LPM, F4 = 10 LPM, and F5 = 5.5 LPM.

In the embodiment of the present invention, the first flow rate F1 is equal to the sum of the fourth flow rate F4 and the fifth flow rate F5, that is, when F1 = 16 LPM, F4 = 6 LPM, and F5 = 10 LPM.

In the embodiment of the present invention, the first flow rate F1 is a fixed value (the default is 16 LPM, but it is not limited by this, and the value can be adjusted according to actual needs), and when the first flow rate F1 is greater than the fourth flow rate F4 , The difference between the first flow rate F1 and the fourth flow rate F4 is discharged by the non-electrically controlled flow regulating device 50. The non-electrically controlled flow regulating device 50 may be a mechanical valve body, and the mechanical valve body may be, for example, a back pressure valve The working principle of the back pressure valve 50 is that fluid enters from the inlet of the back pressure valve 50 and is blocked by the diaphragm, so the fluid generates upward pressure on the diaphragm. When the pressure is high enough, the spring is compressed, and the fluid pushes up the diaphragm to form a channel, so that the fluid can flow out from the outlet of the back pressure valve 50; if the fluid pressure is not enough, it will form a holding pressure, which will increase the inlet pressure until the pressure rises to the back pressure At the rated pressure of the valve, the fluid pushes up the diaphragm to form a passage and discharge the fluid. When the fluid flow changes, the pressure will change, and the opening of the diaphragm will be changed to automatically adjust the fifth flow rate F5.

When the pressure of the pipeline or equipment container is unstable, the back pressure valve can maintain the required pressure of the pipeline; in other words, in the gas-liquid mixing control system provided by the implementation of the present invention, the stable mixing tank pressure is the control gas Mixing concentration is a major key factor. In a general factory water supply system, the relationship between flow and pressure is shown in Figure 3. The pressure change between the flow rate is 0-15 LPM is large, and when the flow rate is greater than 15 LPM, the flow rate changes little to the pressure. However, traditional gas-liquid mixing devices do not only use flow rates above 15LPM in general use. Most of the back-end machines have high or low usage changes, and most of them are flow rates above 1LPM to 20LPM. When the flow rate keeps changing, the mixing tank and pipeline pressure cannot be kept stable, and the gas-liquid mixing concentration keeps changing, naturally it is impossible to provide a stable mixed fluid to supply the target.

In the embodiment of the present invention, when a back pressure valve (that is, the non-electrically controlled flow adjustment device 50) is added to the gas-liquid mixing control system 1, when the demand flow rate of the back-end machines A, B, C, and D becomes smaller, the mixing tank The internal pressure of the body 30 and the output pipe 40 rises, and when the pressure exceeds the preset rated pressure of the back pressure valve 50, the back pressure valve 50 starts to release the pressure, and the mixed fluid is discharged from the back pressure valve end 50, and the back pressure valve 50 The flow rate of the mixed fluid discharged from the end 50 can maintain the internal pressure of the mixing tank 30 and the output pipeline 40. When the demand for back-end machines A, B, C, D rises, and the pressure in the mixing tank 30 and the output pipeline 40 drops, and is lower than the preset rated pressure of the back pressure valve 50, the opening of the back pressure valve 50 Decrease, so that the flow rate of the mixed fluid discharged from the back pressure valve 50 is decreased, and the flow rate of the mixed fluid is gradually increased and provided to the back-end machines A, B, C, and D for use. Even when the demand of the back-end machines A, B, C, D rises, and the pressure in the mixing tank 30 and the output pipeline 40 drops below the preset rated pressure of the back pressure valve 50, the back pressure valve 50 It is closed so that the flow rate of the mixed fluid discharged from the back pressure valve 50 is 0, and all the flow rates of the mixed fluid are supplied to the back-end machines A, B, C, and D for use. Utilizing the gas-liquid mixing control system and method provided by the embodiments of the present invention can stabilize the internal pressure of the mixing tank 30 and the output pipeline 40 to ensure that the mixing ratio and concentration of gas and liquid are maintained and are stably supplied to the back-end machine A , B, C, D use flow rate.

In the embodiment of the present invention, the difference between the first flow rate F1 and the fourth flow rate F4 is greater than or equal to the fifth flow rate F5. For example, when only machine A needs to provide mixed fluid, the fourth flow rate F4 may only require 2 LPM, and when the input mixing tank liquid is 16 LPM, the third flow rate F3 output by the mixing tank 30 is 16 LPM , The extra 14 LPM is discharged by the non-electrically controlled flow adjustment device 50; and when the machine A, B, C, D need to provide mixed fluid, the fourth flow F4 needs to provide a total of 12 LPM, and enter the mixing tank When the body fluid is 16 LPM, the third flow rate F3 output by the mixing tank 30 is 16 LPM, and the extra 4 LPM is discharged by the non-electrically controlled flow rate adjusting device 50.

In FIG. 1, the gas flow meter 24 is used to measure and regulate the flow rate of the gas flowing into the mixing tank 30. Therefore, the gas flow meter 24 can be used to control the flow rate of the gas flowing into the mixing tank 30, so that the mixed fluid reaches a constant value. A preset range of conductivity; the output pipeline 40 includes a conductivity meter 44 arranged between the first end 40a and the second end 40b to detect the conductivity value of the mixed fluid. In addition, the output pipe 40 includes a mechanical pressure and flow measuring device 41 arranged between the first end 40a and the second end 40b to measure the pressure of the mixed fluid and the third flow rate F3; the output pipe 40 includes mechanical pressure The flow measuring device 42 is arranged between the first end 40a and the second end 40b for measuring the pressure of the mixed fluid and the fourth flow rate F4. In the embodiment of the present invention, the non-electrically controlled flow regulating device 50 includes a mechanical pressure and flow measuring device 52 which is arranged on the connecting pipe between the non-electrically controlled flow regulating device 50 and the output pipe 40 to measure the mixed fluid Pressure and fourth flow F4. In the embodiment of the present invention, the back pressure valve 50 has a preset threshold; when the machines A, B, C, and D are closed, the fourth flow rate F4 of the mixed fluid in the second end 40b of the output pipe 40 Is zero. At this time, because the pressure in the mixing tank 30 is fixed, the pressure of the mixed fluid in the output pipe 40 and the mixing tank 30 is greater than the preset threshold of the back pressure valve 50, and the fifth flow rate in the mixed fluid F5 is discharged through the back pressure valve 50. When at least one of the machines A, B, C, and D is turned on, the mixed fluid in the second end 40b of the output pipe 40 is the fourth flow rate F4, and the pressure of the mixed fluid in the mixing tank 30 is dispersed by The second end 40b of the output pipe 40 and the back pressure valve 50 bear the burden. At this time, if the mechanical pressure and flow measuring device 52 installed on the communication pipe between the back pressure valve 50 and the output pipe 40 measures the flow to the back pressure valve 50 When the pressure of the mixed fluid is greater than or equal to the preset threshold of the back pressure valve 50, the mixed flow system is discharged through the back pressure valve 50, and the fifth flow rate F5 is reduced; if it is set between the back pressure valve 50 and the output pipe 40 The mechanical pressure and flow measuring device 52 on the connecting pipe between the two determines that the pressure of the mixed fluid flowing to the back pressure valve 50 is less than the preset threshold of the back pressure valve 50, the fifth flow rate in the mixed fluid is zero, and the back pressure cannot be passed The pressure valve 50 is discharged.

In FIG. 1, the mixing tank body 30 includes a drain device 32 arranged at the top of the mixing tank body 30 to discharge the excess part of the gas out of the mixing tank body 30. In the embodiment of the present invention, the discharge device 32 can discharge a part (excess) of the liquid out of the mixing tank 30.

In FIG. 1, the mixing tank body 30 includes a gas dispersing device 34 arranged inside the mixing tank body 30 for dispersing gas in a liquid to form a mixed fluid.

In the embodiment of the present invention, the non-electrically controlled flow adjustment device 50 is a mechanical valve body, and the mechanical valve body does not use electricity, that is, it does not need to use electricity for control, so it can avoid the consumption of power resources and conform to new-style manufacturing. According to the environmental protection requirements of the industry, the non-electrically controlled flow adjustment device can be a back pressure valve.

In Figure 2, the first flow F1 is equivalent to the third flow F3, and the third flow F3 (△) is a fixed value (the default is 18 LPM, but it is not limited by this, and the value can be adjusted according to actual needs), and When the third flow rate F3 (△) is greater than the fourth flow rate F4 (★), the difference between the third flow rate F3 (△) and the fourth flow rate F4 (★) is discharged by the non-electrically controlled flow regulating device 50. In the embodiment of the present invention, the difference between the third flow rate F3 (△) and the fourth flow rate F4 (★) is equal to the fifth flow rate F5 (◇). For example, when only machine A needs to provide mixed fluid, the fourth flow rate F4 (★) may only require 3 LPM, while the third flow rate F3 (△) output by the mixing tank 30 remains at 18 LPM, which is more The 15 LPM is discharged by the non-electrically controlled flow adjustment device 50, that is, the fifth flow F5 (◇); and when the machines A, B, C, and D are continuously opened along the time axis and a mixed fluid needs to be provided, the fourth The flow rate F4 (★) needs to provide a total flow rate of 15 LPM, while the third flow rate F3 (△) output by the mixing tank 30 is maintained at 18 LPM, and the extra 3 LPM is discharged by the non-electrically controlled flow adjustment device 50, namely The fifth flow F5 (◇). In addition, if all the machines do not need to supply mixed fluid, the fourth flow rate F4 (★) is 0 LPM, and the third flow rate F3 (△) output by the mixing tank 30 remains at 18 LPM, and all 18 LPMs are equal to It is discharged by the non-electrically controlled flow rate adjusting device 50, that is, the fifth flow rate F5 (◇). Accordingly, the gas-liquid mixing control system provided by the embodiment of the present invention can supply a large flow range (for example, 0-18LPM), and it is convenient to use a single gas-liquid mixing control system to meet low flow (0~4LPM) and high flow ( 10~18LPM) flow demand of gas-liquid mixed fluid.

Please refer to Figure 3, which is a diagram showing the relationship between the flow rate and the pressure of the mixed fluid of the traditional gas-liquid mixing system. Because the mixed fluid is continuously produced in the mixing tank, the mixing tank will accumulate internal pressure. When the mixed fluid flows out of the mixing tank, the internal pressure of the mixing tank will decrease significantly, and it will increase as the flow rate of the mixed fluid increases. tend towards balance. It can be seen from Figure 3 that when the flow of the mixed fluid is less than 10 LPM, the pressure of the mixing tank 30 is between 55 psi and 35 psi; and when the flow of the mixed fluid is greater than or equal to 10 LPM, the pressure of the mixing tank is The value is between 35 psi and 25 psi. Therefore, generally speaking, under the condition of a large flow of mixed fluid, the traditional gas-liquid mixing system has a relatively stable pressure performance, and the concentration of the mixed fluid supplied will be relatively stable; however, the traditional gas-liquid mixing system has a low flow rate. Under the conditions, the pressure of the mixing tank changes drastically, so that the concentration of the mixed fluid is relatively unstable, which will adversely affect the yield of semiconductor products.

Next, please refer to FIG. 4, which is a diagram of the relationship between the amount of equipment (machine) and the total flow or pressure of the mixed fluid according to a preferred embodiment of the present invention, in which a comparison is made for a system with or without a back pressure valve. In Figure 4, the horizontal axis is the amount of mixed fluid used by the equipment (machine), the left vertical axis is the pressure value of the mixing tank, and the right vertical axis is the total flow of the mixed fluid. The traditional gas-liquid mixing without back pressure valve The pressure value of the mixing tank in the system is represented by "○", and the flow value of the mixed fluid is represented by "△"; the pressure value of the mixing tank 30 in the gas-liquid mixing control system with a back pressure valve provided by the embodiment of the present invention It is indicated by "●", and the flow rate of the mixed fluid is indicated by "▲". It can be seen from Figure 4 that the pressure value of the mixing tank in the traditional gas-liquid mixing system without a back pressure valve will decrease as the equipment (machine) uses the mixed fluid to increase, and the total flow value of the mixed fluid will increase with The use of equipment (machines) for the mixed fluid increases; unlike the traditional gas-liquid mixing system without a back pressure valve, in the embodiment of the present invention, because the mixed fluid is continuously produced in the mixing tank 30, The mixing tank 30 will accumulate internal pressure. When the internal pressure accumulated in the mixing tank 30 exceeds the opening pressure value of the non-electrically controlled flow regulating device 50 (back pressure valve), the non-electrically controlled flow regulating device 50 (back pressure valve) will open The mixed fluid flows out of the mixing tank. At this time, the internal pressure of the mixing tank 30 can be maintained within a preset pressure range, and when the flow of the mixed fluid increases, the internal pressure of the mixing tank 30 is still maintained at Within the preset pressure value range. In other words, the mixing tank body 30 in the gas-liquid mixing control system with a back pressure valve provided by the embodiment of the present invention maintains a fixed pressure value, which will not change with the increase in the amount of mixed fluid used by the equipment (machine), and The total flow value of the mixed fluid is regulated by a back pressure valve, which can maintain a fixed total flow value and will not change with the increase in the amount of equipment (machine) used for the mixed fluid.

It can be seen from this that the gas-liquid mixing control system provided by the embodiment of the present invention uses the back pressure valve to improve the traditional gas-liquid mixing system under low flow conditions. The pressure of the mixing tank changes drastically, so that the concentration of the mixed fluid is relatively high. Instability, which will adversely affect the yield of semiconductor products. Compared with the traditional gas-liquid mixing system, the gas-liquid mixing control system provided by the embodiment of the present invention can maintain a fixed pressure value of the mixing tank 30 regardless of whether the equipment (machine) uses a high or low amount of mixed fluid. And a fixed total flow value of the mixed fluid to maintain the high stability of the mixed fluid concentration, thereby significantly improving the yield of semiconductor products. In the embodiment of the present invention, under low flow conditions (for example, the amount of equipment (machine) is less than 20LPM), the gas-liquid mixing control system provided by the embodiment of the present invention can maintain a fixed pressure value of the mixing tank 30 And a fixed total flow value of the mixed fluid to maintain the high stability of the mixed fluid concentration, thereby significantly improving the yield of semiconductor products, as shown in Figure 4.

Please refer to Figure 1 and Figure 5 together, the gas-liquid mixing control method at least includes the following steps: Step S02, providing a liquid with a first fixed pressure and a first flow rate F1 in the mixing tank 30; Step S04, providing a second fixed pressure and a second flow rate of gas in the mixing tank 30, the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; Step S06, mixing liquid and gas in the mixing tank 30 to form a mixed fluid; Step S08, through the output pipe 40, output the mixed fluid from the mixing tank 30 to at least one machine A, B, C, D, where the pressure of the mixed fluid in the mixing tank 30 and the output pipe 40 is the same, and the output The first end 40a of the pipeline 40 is connected to the mixing tank 30, and the second end 40b is connected to the machines A, B, C, and D; in the embodiment of the present invention, the first end 40a of the output pipeline 40 is The mixed fluid has a third flow rate F3, and the mixed fluid in the second end 40b of the output pipe 40 has a fourth flow rate F4; the output pipe 40 is connected to the non-electrically controlled flow adjustment device 50, and has undergone non-electrically controlled flow adjustment The mixed fluid of the device 50 has a fifth flow rate F5; the third flow rate F3 is greater than or equal to the fourth flow rate F4 and the fifth flow rate F5.

In the embodiment of the present invention, the first flow rate F1 is greater than or equal to 1000 times the second flow rate, and the third flow rate F3 is approximately equal to the first flow rate F1. In the embodiment of the present invention, the first flow rate F1 is greater than the sum of the fourth flow rate F4 and the fifth flow rate F5. In the embodiment of the present invention, the first flow rate F1 is equal to the sum of the fourth flow rate F4 and the fifth flow rate F5.

In the embodiment of the present invention, the first flow rate F1 equals to the third flow rate F3 is a fixed value, and when the third flow rate F3 is greater than the fourth flow rate F4, the difference between the third flow rate F3 and the fourth flow rate F4 is determined by the non-electrical The flow control device 50 is discharged. In the embodiment of the present invention, the difference between the third flow rate F3 and the fourth flow rate F4 is equal to the fifth flow rate F5.

In the embodiment of the present invention, the mixing tank body 30 includes a gas dispersing device 34 disposed inside the mixing tank body 30 for dispersing the gas in the liquid to form a mixed fluid. The non-electrically controlled flow adjustment device 50 is a mechanical valve body. The mechanical valve body may be a back pressure valve, for example, and the back pressure valve is a valve body with a purely physical structure. It does not need to use electricity, that is, it does not need to use electricity for control. It can avoid the consumption of power resources and meet the environmental protection requirements of the new-type manufacturing industry.

Through the design of the embodiment of the present invention, the gas-liquid mixing control system and control method provided by the embodiments of the present invention use a non-electrically controlled flow control device to regulate the output flow of the gas-liquid mixed fluid, and can supply a large flow range (for example, 2~16LPM), so that a single gas-liquid mixing control system can meet the flow requirements of low-flow (2~4LPM) and high-flow (10~14LPM) gas-liquid mixed fluids. In addition, the gas-liquid mixing control system and control method provided by the present invention do not need to use electricity for control, so the consumption of power resources can be avoided, and it meets the environmental protection requirements of the new-type manufacturing industry.

The above are only the preferred and feasible embodiments of the present invention. Any equivalent changes made by applying the specification of the present invention and the scope of the patent application should be included in the patent scope of the present invention.

1: Gas-liquid mixing control system 10: Liquid supply device 12: Liquid pressure regulator 20: Gas supply device 22: Gas pressure regulator 24: Gas flow meter 30: Mixing tank 32: Drainage device 34: Gas dispersion device 40: output pipeline 40a: first end 40b: second end 41, 42: Mechanical pressure and flow measuring device 44: Conductivity meter 50: Non-electrically controlled flow adjustment device (back pressure valve) 52: Mechanical pressure and flow measuring device A, B, C, D: machine F1: First flow F3: third flow F4: Fourth flow F5: Fifth flow S02, S04, S06, S08: steps

Figure 1 is a schematic diagram of a gas-liquid mixing control system according to a preferred embodiment of the present invention; Fig. 2 is a diagram showing the relationship between liquid inflow and mixed fluid outflow time and flow rate of a preferred embodiment of the present invention; Figure 3 is a diagram showing the relationship between the flow and pressure of the mixed fluid of a traditional gas-liquid mixing system; 4 is a diagram of the relationship between the amount of equipment (machine) and the total flow or pressure of the mixed fluid according to a preferred embodiment of the present invention, in which a comparison is made with respect to a system with or without a back pressure valve; Fig. 5 is a flowchart of a gas-liquid mixing control method according to a preferred embodiment of the present invention.

1: Gas-liquid mixing control system

10: Liquid supply device

12: Liquid pressure regulator

20: Gas supply device

22: Gas pressure regulator

24: Gas flow meter

30: Mixing tank

32: Drainage device

34: Gas dispersion device

40: output pipeline

40a: first end

40b: second end

41, 42: Mechanical pressure and flow measuring device

44: Conductivity meter

50: Non-electrically controlled flow adjustment device (back pressure valve)

52: Mechanical pressure and flow measuring device

A, B, C, D: machine

Claims (20)

A gas-liquid mixing control system includes: A liquid supply device for supplying a liquid; A liquid pressure regulating valve connected to the liquid supply device for maintaining the liquid at a first fixed pressure and a first flow rate; A gas supply device for supplying a gas; A gas pressure regulating valve connected to the gas supply device for maintaining the gas at a second fixed pressure and a second flow rate, wherein the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; A mixing tank is connected to the liquid pressure regulating valve and the gas pressure regulating valve, the liquid pressure regulating valve is arranged between the liquid supply device and the mixing tank, and the gas pressure regulating valve is arranged on the gas supply device and Between the mixing tanks, the liquid pressure regulating valve inputs the liquid into the mixing tank at the first fixed pressure and the first flow rate, and the gas pressure regulating valve operates at the second fixed pressure and the first flow rate. Input the gas into the mixing tank with two flows, and the liquid and the gas are mixed in the mixing tank to form a mixed fluid; An output pipeline, a first end of the output pipeline is connected to the mixing tank body, the pressure of the mixed fluid in the mixing tank body and the output pipeline is the same, and a second end of the output pipeline is connected In at least one machine, so that the mixed fluid is output from the mixing tank to the at least one machine through the output pipe, and the mixed fluid in the first end has a third flow rate, and the second end The mixed fluid in has a fourth flow rate; and A non-electrically controlled flow rate adjustment device connected to the output pipeline, wherein the mixed fluid passing through the non-electrically controlled flow rate adjustment device has a fifth flow rate; Wherein, the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate. The gas-liquid mixing control system according to claim 1, wherein the third flow rate is a fixed value, and when the third flow rate is greater than the fourth flow rate, the difference between the third flow rate and the fourth flow rate is Discharged by the non-electrically controlled flow adjustment device. The gas-liquid mixing control system according to claim 2, wherein the difference between the third flow rate and the fourth flow rate is equal to the fifth flow rate. The gas-liquid mixing control system according to claim 1, wherein a gas flow meter is provided between the gas supply device and the mixing tank, and the gas flow meter is connected to the gas supply device and the mixing tank for measuring The second flow rate of the gas is measured and adjusted so that the mixed fluid reaches a preset conductivity range. The gas-liquid mixing control system according to claim 4, wherein the output pipeline includes a conductivity meter arranged between the first end and the second end to detect the conductivity value of the mixed fluid. The gas-liquid mixing control system according to claim 1, wherein the mixing tank includes a discharge device arranged at the top of the mixing tank to discharge the excess part of the gas from the mixing tank. The gas-liquid mixing control system according to claim 1, wherein the first flow rate is greater than or equal to 1000 times the second flow rate, and the third flow rate is approximately equal to the first flow rate. The gas-liquid mixing control system according to claim 1, wherein the mixing tank includes a gas dispersing device arranged inside the mixing tank for dispersing the gas in the liquid to form the mixed fluid. The gas-liquid mixing control system according to claim 1, wherein the fourth flow rate at the second end is equal to a demand of the at least one machine for the mixed fluid. The gas-liquid mixing control system according to claim 9, wherein the non-electrically controlled flow control device is a mechanical valve body, and the mechanical valve body does not use electricity. The gas-liquid mixing control system according to claim 10, wherein the mechanical valve body includes a back pressure valve, the back pressure valve having a preset threshold; when the at least one machine is closed, the second end The fourth flow rate of the mixed fluid is zero, and the pressure of the mixed fluid in the output pipeline and the mixing tank is greater than the preset threshold of the back pressure valve, so that the fifth flow rate in the mixed fluid It is discharged through the back pressure valve; when the at least one machine is opened, the mixed fluid in the second end is the fourth flow rate, and the pressure of the mixed fluid in the mixing tank is dispersed by the output pipe The second end of the circuit and the back pressure valve are burdened. If the pressure of the mixed fluid flowing to the back pressure valve is greater than or equal to the preset threshold of the back pressure valve, the mixed flow system is discharged through the back pressure valve , And the fifth flow rate decreases; if the pressure of the mixed fluid flowing to the back pressure valve is less than the preset threshold of the back pressure valve, the fifth flow rate in the mixed fluid is zero, and the back pressure cannot be determined The valve is leaking. A gas-liquid mixing control method includes: Providing a liquid with a first fixed pressure and a first flow rate in a mixing tank; Providing a gas with a second fixed pressure and a second flow rate in the mixing tank, wherein the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; Mixing the liquid and the gas in the mixing tank to form a mixed fluid; and The mixed fluid is output from the mixing tank to at least one machine through an output pipeline, wherein the pressure of the mixed fluid in the mixing tank and the output pipeline is the same, and a first end of the output pipeline Is connected to the mixing tank body, and a second end thereof is connected to the at least one machine, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a first Four flows; the output pipeline is connected to a non-electrically controlled flow regulating device, and the mixed fluid passing through the non-electrically controlled flow regulating device has a fifth flow; Wherein, the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate. The gas-liquid mixing control method according to claim 12, wherein the third flow rate is a fixed value, and when the third flow rate is greater than the fourth flow rate, the difference between the third flow rate and the fourth flow rate is Discharged by the non-electrically controlled flow adjustment device. The gas-liquid mixing control method according to claim 13, wherein the difference between the third flow rate and the fourth flow rate is equal to the fifth flow rate. The gas-liquid mixing control method according to claim 12, wherein the mixing tank body includes a gas dispersing device disposed inside the mixing tank body for dispersing the gas in the liquid to form the mixed fluid. The gas-liquid mixing control method according to claim 12, wherein the first flow rate is greater than or equal to 1000 times the second flow rate, and the third flow rate is approximately equal to the first flow rate. The gas-liquid mixing control method according to claim 12, wherein a gas flow meter is provided between the gas supply device and the mixing tank, and the gas flow meter is connected to the gas supply device and the mixing tank for measuring The second flow rate of the gas is measured and adjusted so that the mixed fluid reaches a preset conductivity range. The gas-liquid mixing control method according to claim 12, wherein the fourth flow rate at the second end is equal to a demand of the at least one machine for the mixed fluid. The gas-liquid mixing control method according to claim 18, wherein the non-electrically controlled flow adjustment device is a mechanical valve body, and the mechanical valve body does not use electricity. The gas-liquid mixing control method of claim 19, wherein the mechanical valve body includes a back pressure valve, the back pressure valve having a preset threshold; when the at least one machine is closed, the second end The fourth flow rate of the mixed fluid is zero, and the pressure of the mixed fluid in the output pipeline and the mixing tank is greater than the preset threshold of the back pressure valve, so that the fifth flow rate in the mixed fluid Is discharged through the back pressure valve; when the at least one machine is opened, the mixed fluid in the second end is the fourth flow rate, and the output pipeline and the mixed fluid in the mixing tank body The pressure drops. If the pressure of the mixed fluid in the output pipeline and the mixing tank is greater than or equal to the preset threshold of the back pressure valve, the fifth flow rate in the mixed fluid is discharged through the back pressure valve And the fifth flow rate decreases; if the pressure of the mixed fluid in the output pipeline and the mixing tank is less than the preset threshold of the back pressure valve, the fifth flow rate in the mixed fluid is zero, And it cannot be discharged by the back pressure valve.

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