TW202009327A - Copper foil with minimized bagginess, wrinkle or tear, electrode including the same, secondary battery including the same and method for manufacturing the same - Google Patents
Copper foil with minimized bagginess, wrinkle or tear, electrode including the same, secondary battery including the same and method for manufacturing the same Download PDFInfo
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- TW202009327A TW202009327A TW107128045A TW107128045A TW202009327A TW 202009327 A TW202009327 A TW 202009327A TW 107128045 A TW107128045 A TW 107128045A TW 107128045 A TW107128045 A TW 107128045A TW 202009327 A TW202009327 A TW 202009327A
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 293
- 239000011889 copper foil Substances 0.000 title claims abstract description 226
- 238000004519 manufacturing process Methods 0.000 title claims description 44
- 238000000034 method Methods 0.000 title claims description 37
- 230000037303 wrinkles Effects 0.000 title description 29
- 229910052802 copper Inorganic materials 0.000 claims abstract description 62
- 239000010949 copper Substances 0.000 claims abstract description 62
- 238000005260 corrosion Methods 0.000 claims description 49
- 239000003792 electrolyte Substances 0.000 claims description 49
- 239000011149 active material Substances 0.000 claims description 26
- 239000011651 chromium Substances 0.000 claims description 18
- 239000002202 Polyethylene glycol Substances 0.000 claims description 16
- 229920001223 polyethylene glycol Polymers 0.000 claims description 16
- 239000000460 chlorine Substances 0.000 claims description 12
- 229920006254 polymer film Polymers 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 10
- -1 silane compound Chemical class 0.000 claims description 9
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 8
- 229910001431 copper ion Inorganic materials 0.000 claims description 8
- 239000008151 electrolyte solution Substances 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 229910000077 silane Inorganic materials 0.000 claims description 6
- LMPMFQXUJXPWSL-UHFFFAOYSA-N 3-(3-sulfopropyldisulfanyl)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCSSCCCS(O)(=O)=O LMPMFQXUJXPWSL-UHFFFAOYSA-N 0.000 claims description 5
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 5
- 150000002830 nitrogen compounds Chemical class 0.000 claims description 5
- BCXXPYJFJOKRQG-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound S=C1NCCS1.S=C1NCCS1 BCXXPYJFJOKRQG-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 77
- 230000008569 process Effects 0.000 description 29
- 238000002360 preparation method Methods 0.000 description 18
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 16
- 238000002441 X-ray diffraction Methods 0.000 description 14
- 239000013078 crystal Substances 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 11
- 229910052744 lithium Inorganic materials 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 10
- 239000004332 silver Substances 0.000 description 10
- 238000009713 electroplating Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000006183 anode active material Substances 0.000 description 5
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- 239000000047 product Substances 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 4
- 241001422033 Thestylus Species 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000006182 cathode active material Substances 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
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- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 4
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- 230000002421 anti-septic effect Effects 0.000 description 2
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- 238000010586 diagram Methods 0.000 description 2
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- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000005001 laminate film Substances 0.000 description 2
- 229910002102 lithium manganese oxide Inorganic materials 0.000 description 2
- VLXXBCXTUVRROQ-UHFFFAOYSA-N lithium;oxido-oxo-(oxomanganiooxy)manganese Chemical compound [Li+].[O-][Mn](=O)O[Mn]=O VLXXBCXTUVRROQ-UHFFFAOYSA-N 0.000 description 2
- 239000011255 nonaqueous electrolyte Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
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- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910009748 Li1.1Mn1.85Al0.05O4 Inorganic materials 0.000 description 1
- 229910014689 LiMnO Inorganic materials 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
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- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
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- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011356 non-aqueous organic solvent Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
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Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Cell Electrode Carriers And Collectors (AREA)
Abstract
Description
本發明關於一種最小化隆起、皺紋或撕裂的銅箔、包含其的電極、包含其的二次電池、及製造其的方法。The present invention relates to a copper foil that minimizes bumps, wrinkles, or tears, an electrode including the same, a secondary battery including the same, and a method of manufacturing the same.
電解銅箔用於製造各種產品,如二次電池的負極和可撓性印刷電路板(FPCBs)。Electrolytic copper foil is used to manufacture various products, such as the negative electrode of secondary batteries and flexible printed circuit boards (FPCBs).
其中,通過電鍍製造的銅箔被稱為「電解銅箔」。這種電解銅箔通常通過卷對卷(roll-to-roll,RTR)製程所製造,並用於通過RTR製程製造用於二次電池和可撓性印刷電路板(FPCB)的陽極。因為RTR製程能夠連續生產,故RTR製程適於大規模生產。然而,當在RTR製程中,當銅箔折疊、撕裂或遇到隆起(bagginess)或皺紋(wrinkle)時,應停止RTR設備的操作,直到這些問題得到解決後再操作該設備,這導致了生產效率的下降。Among them, copper foil manufactured by electroplating is called "electrolytic copper foil". Such electrolytic copper foil is usually manufactured by a roll-to-roll (RTR) process, and is used to manufacture anodes for secondary batteries and flexible printed circuit boards (FPCB) through an RTR process. Because the RTR process can be continuously produced, the RTR process is suitable for large-scale production. However, during the RTR process, when the copper foil is folded, torn, or encounters bagginess or wrinkles, the operation of the RTR device should be stopped until the problems are resolved before the device is operated, which leads to Production efficiency decline.
特別地,當在使用銅箔製造二次電池的過程中,銅箔發生隆起、皺紋或撕裂時會難以穩定地製造產品。因此,在製造二次電池的過程中銅箔發生的隆起、皺紋或撕裂會導致二次電池的製造產量降低和產品的製造成本增加。In particular, when the copper foil is used to manufacture a secondary battery, it is difficult to stably manufacture the product when the copper foil swells, wrinkles, or tears. Therefore, the bumps, wrinkles, or tears that occur in the copper foil during the manufacturing of the secondary battery can lead to a reduction in the manufacturing yield of the secondary battery and an increase in the manufacturing cost of the product.
已知除去銅箔中發生隆起、皺紋和撕裂缺陷的方法是將銅箔的重量偏差控制在較低的水平。然而,僅控制銅箔的重量偏差對於二次電池製造期間發生的隆起、皺紋和撕裂等問題方面是具有局限性的。特別地,近來,為了增加二次電池的容量,使用越來越多的超薄銅箔,例如使用厚度為8μm或更小的銅箔作為陽極集電器。在這種情況下,即使精確地控制了銅箔的重量偏差,但在製造二次電池的過程中還是會間歇地發生隆起、皺紋和撕裂等缺陷。因此,需要在製造二次電池的過程中防止或抑制銅箔的隆起、皺紋或撕裂。It is known to remove bumps, wrinkles and tearing defects in copper foil by controlling the weight deviation of copper foil to a low level. However, controlling only the weight deviation of the copper foil has limitations for problems such as swell, wrinkles, and tears that occur during secondary battery manufacturing. In particular, recently, in order to increase the capacity of secondary batteries, more and more ultra-thin copper foils are used, for example, copper foils with a thickness of 8 μm or less are used as anode current collectors. In this case, even if the weight deviation of the copper foil is accurately controlled, defects such as bumps, wrinkles, and tears may occur intermittently during the manufacturing of the secondary battery. Therefore, it is necessary to prevent or suppress the bulging, wrinkling, or tearing of the copper foil during the manufacturing of the secondary battery.
因此,鑑於上述問題,本發明的一個目的是提供一種銅箔、包含其之電極、包含其之二次電池、以及製造其的方法。Therefore, in view of the above problems, an object of the present invention is to provide a copper foil, an electrode including the same, a secondary battery including the same, and a method of manufacturing the same.
本發明的另一個目的是提供一種具有最小化的隆起、皺紋或撕裂的銅箔。特別地,本發明的另一個目的是提供一種銅箔,其能夠在厚度小的情況下,在製造二次電池的過程中防止出現隆起、皺紋或撕裂,因而有出色的卷對卷(RTR)加工性(processability)。Another object of the present invention is to provide a copper foil with minimal ridges, wrinkles or tears. In particular, another object of the present invention is to provide a copper foil that can prevent the occurrence of ridges, wrinkles, or tears in the process of manufacturing a secondary battery with a small thickness, thus having excellent roll-to-roll (RTR) ) Processability.
本發明的另一個目的是提供包括銅箔的用於二次電池的電極和包括用於二次電池的電極的二次電池。Another object of the present invention is to provide an electrode for a secondary battery including a copper foil and a secondary battery including an electrode for a secondary battery.
本發明的另一個目的是提供一種包括銅箔的可撓性銅箔層壓薄膜。Another object of the present invention is to provide a flexible copper foil laminated film including copper foil.
本發明的另一個目的是提供一種製造銅箔的方法,該方法能夠防止在製造過程中出現隆起、皺紋或撕裂。Another object of the present invention is to provide a method of manufacturing copper foil, which can prevent bulging, wrinkling, or tearing during the manufacturing process.
除了上面提到的本發明的方面之外,下面將描述本發明的其他特徵和優點,並且本領域技術人員從描述中將清楚地理解本發明的其他特徵和優點。In addition to the above-mentioned aspects of the present invention, other features and advantages of the present invention will be described below, and those skilled in the art will clearly understand other features and advantages of the present invention from the description.
根據本發明,通過提供銅箔可以實現上述和其他目的,包含一銅層,具有29kgf/mm2 至65kgf/mm2 的一抗拉強度、18μm至148μm的一粗糙度輪廓元素(Rsm)的一平均寬度、以及0.52或更少的一織構係數偏差[TCB(220)]。According to the present invention, can be achieved by providing the above copper foil and other objects, comprising a copper layer having a tensile strength of 29kgf / mm 2 to 65kgf / mm 2, and a roughness of 18μm to 148μm the contour element (Rsm) of a The average width, and a texture coefficient deviation of 0.52 or less [TCB(220)].
銅箔可以更包含一防腐薄膜設置在該銅層上。The copper foil may further include a corrosion-resistant film disposed on the copper layer.
該防腐薄膜可以包含鉻(Cr)、矽烷化合物或氮化合物中的至少其中之一者。The anticorrosive film may contain at least one of chromium (Cr), a silane compound, or a nitrogen compound.
該銅箔可以具有0.6μm或更大的一最大高度粗糙度(Rmax)。The copper foil may have a maximum height roughness (Rmax) of 0.6 μm or more.
該銅箔可以具有5%或更少的一重量偏差。The copper foil may have a weight deviation of 5% or less.
該銅箔在25±15℃的室溫下可以具有2%或更高的一伸長率。The copper foil may have an elongation of 2% or higher at room temperature of 25±15°C.
該銅箔的一厚度可以為4μm至30μm。A thickness of the copper foil may be 4 μm to 30 μm.
根據本發明的另一方面,提供一種用於二次電池的電極,包含本發明之銅箔;以及設置在該銅箔上的一活性材料層。According to another aspect of the present invention, there is provided an electrode for a secondary battery, comprising the copper foil of the present invention; and an active material layer provided on the copper foil.
根據本發明的另一方面,提供一種二次電池,包含一陰極;面對該陰極的一陽極;一電解液,用以提供讓離子可在該陰極和該陽極之間移動的一環境;以及一隔離膜,用以電性絕緣該陰極和該陽極,其中該陽極包含本發明之銅箔;以及設置在該銅箔上的一活性材料層。According to another aspect of the present invention, there is provided a secondary battery including a cathode; an anode facing the cathode; an electrolyte to provide an environment in which ions can move between the cathode and the anode; and A separator for electrically insulating the cathode and the anode, wherein the anode includes the copper foil of the present invention; and an active material layer disposed on the copper foil.
根據本發明的另一方面,提供一種可撓的銅箔層壓薄膜,包含一聚合物膜;以及設置在該聚合物膜上的本發明之銅箔。According to another aspect of the present invention, there is provided a flexible copper foil laminate film comprising a polymer film; and the copper foil of the present invention disposed on the polymer film.
根據本發明的另一方面,提供一種銅箔的製造方法,該方法包含:在包含銅離子的一電解液中彼此間隔開的一電極板和一旋轉電極滾筒(rotating electrode drum)之間提供一電流密度為30A/dm2 至80A/dm2 的電流來形成一銅層;其中該電解液包含70g/L至100g/L的銅離子;80g/L至130g/L的硫酸;2mg/L至20mg/L的2-巰基噻唑(2-mercaptothiazoline);2mg/L至20mg/L的雙 - (3-磺丙基)二硫化物(bis-(3-sulfopropyl) disulfide,SPS);以及50mg/L或更少的聚乙二醇 (PEG)。According to another aspect of the present invention, there is provided a method of manufacturing copper foil, the method comprising: providing an electrode plate and a rotating electrode drum (rotating electrode drum) spaced apart from each other in an electrolyte containing copper ions The current density is 30A/dm 2 to 80A/dm 2 to form a copper layer; wherein the electrolyte contains 70g/L to 100g/L copper ions; 80g/L to 130g/L sulfuric acid; 2mg/L to 20 mg/L of 2-mercaptothiazoline (2-mercaptothiazoline); 2 mg/L to 20 mg/L of bis-(3-sulfopropyl) disulfide (SPS); and 50 mg/L L or less polyethylene glycol (PEG).
該電解液可以包含10mg/L至30 mg/L的氯(Cl)。The electrolyte may contain 10 mg/L to 30 mg/L of chlorine (Cl).
該電解液每單位時間(秒)的一流量偏差可以為5%或更小。The flow rate deviation of the electrolyte per unit time (second) may be 5% or less.
以上給出的本發明的一般描述僅用於說明或描述,並且不應被解釋為限制本發眀的範圍。The general description of the present invention given above is for illustration or description only, and should not be construed as limiting the scope of the present invention.
現在將詳細參考本發明的優選實施例,其示例在圖式中示出。Reference will now be made in detail to the preferred embodiments of the present invention, examples of which are shown in the drawings.
本領域技術人員將可以理解,在不脫離所附申請專利範圍中公開的本發明的範圍和精神的情況下,可以進行各種修改,添加和替換。因此,本發明包含申請專利範圍中限定的公開內容以及落入其等同物的範圍內的修改和變更。Those skilled in the art will understand that various modifications, additions and substitutions can be made without departing from the scope and spirit of the invention disclosed in the appended patent application. Therefore, the present invention includes the disclosure defined in the scope of the patent application and the modifications and changes falling within the scope of equivalents thereof.
用於描述本發明的實施例的圖式中公開的形狀、尺寸、比率、角度和數量僅僅是示例,因此本發明不限於所示出的細節。貫穿說明書,相同的圖式標記指代相同的元件。The shapes, sizes, ratios, angles, and numbers disclosed in the drawings for describing the embodiments of the present invention are merely examples, and thus the present invention is not limited to the details shown. Throughout the description, the same reference numerals refer to the same elements.
在使用本說明書中描述的「包含」、「具有」和「包括」的情況下,除非使用「僅」、否則也可以存在另一部分。除非另有說明,否則單數形式的術語可包括複數形式。在構造元件時,儘管沒有明確的描述,該元件被解釋為包括誤差範圍。In the case of using "include", "have" and "include" described in this specification, another part may exist unless "only" is used. Unless otherwise stated, singular terms may include plural forms. In constructing an element, although not explicitly described, the element is interpreted as including an error range.
在描述位置關係時,例如,當位置順序被描述為「上」、「上方」、「下方」和「下一個」時,可以包括其間沒有接觸的情況,除非使用「僅」或「直接」。When describing the positional relationship, for example, when the positional order is described as "upper", "upper", "lower", and "next", it may include the situation where there is no contact between them, unless "only" or "direct" is used.
在描述時間關係時,例如,當時間順序被描述為「之後」、「後續」、「下一個」和「之前」時,可以包括不連續的情況,除非使用「恰好」或「直接」。When describing temporal relationships, for example, when the chronological order is described as "after", "follow-up", "next", and "before", discontinuities may be included unless "exactly" or "direct" is used.
應當理解,儘管這裡可以使用術語「第一」、「第二」等來描述各種元件,但是這些元件不應受這些術語的限制。這些術語僅用於區分一個元件與另一個元件。例如,第一元件可以被稱為第二元件,並且類似地,第二元件可以被稱為第一元件,而不脫離本發明的範圍。It should be understood that although the terms "first", "second", etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, the first element may be referred to as the second element, and similarly, the second element may be referred to as the first element without departing from the scope of the present invention.
應當理解,術語「至少一個」包括與任何一個項目相關的所有組合。It should be understood that the term "at least one" includes all combinations related to any one item.
本發明的各種實施例的特徵彼此可以部分地或整體地耦合或者彼此可以部分地或整體地組合,並且可以彼此不同地互操作並且在技術上被驅動,如本領域技術人員可以充分理解的。本發明的實施例可以彼此獨立地執行,或者可以以相互依賴的關係一起執行。The features of various embodiments of the present invention may be partially or wholly coupled with each other or may be partially or wholly combined with each other, and may be mutually interoperable differently and technically driven, as those skilled in the art can fully understand. The embodiments of the present invention may be performed independently of each other, or may be performed together in a mutually dependent relationship.
圖1是示出根據本發明的實施例的銅箔100的示意性截面圖。FIG. 1 is a schematic cross-sectional view showing a
參考圖1,銅箔100包括銅層110。根據本發明的一個實施例,銅箔還可包括設置在銅層110上的防腐薄膜210。可以省略防腐薄膜210。Referring to FIG. 1, the
根據本發明的實施例,銅層110具有無光澤表面MS和與無光澤表面SS相對的光澤表面SS。According to an embodiment of the present invention, the
例如,銅層110可以通過電鍍形成在旋轉電極滾筒上(參見圖8)。此時,光澤表面SS是指在電鍍過程中與旋轉電極滾筒接觸的銅層110的表面,無光澤表面MS是指與光澤表面SS相對設置的表面。For example, the
光澤表面SS通常具有比無光澤表面MS低的表面粗糙度(surface roughness)Rz,但是本發明的實施例不限於此。光澤表面SS的表面粗糙度Rz可以等於或高於無光澤表面MS的表面粗糙度Rz。The glossy surface SS generally has a lower surface roughness Rz than the matte surface MS, but the embodiments of the present invention are not limited thereto. The surface roughness Rz of the glossy surface SS may be equal to or higher than the surface roughness Rz of the matte surface MS.
防腐薄膜210可以設置在銅層110的無光澤表面MS或光澤表面SS中的至少其中一者上。參考圖1,防腐薄膜210設置在無光澤表面MS上,但是本發明的實施例不限於此。也就是說,防腐薄膜210可以僅設置在光澤表面SS上,或者設置在無光澤表面MS和光澤表面SS兩者上。The
防腐薄膜210保護銅層110。防腐薄膜210可以防止銅層110在儲存時被氧化或變性。因此,當防腐薄膜210沒有設置在銅層110上時,銅層110的表面隨時間被氧化,因此裝置(例如,包括銅箔100的二次電池)的壽命可以是惡化。防腐薄膜210也稱為「保護層」。對於防腐薄膜210沒有特別限制,只要其能夠保護銅層110,任何膜或層都可以作為防腐薄膜210。The
根據本發明的實施例,防腐薄膜210可包括鉻(Cr)、矽烷化合物或氮化合物中的至少其中一者。According to an embodiment of the present invention, the
例如,防腐薄膜210可以由含鉻(Cr)的防腐蝕液體所製備,即含有鉻酸鹽化合物的防腐蝕液體。For example, the
根據本發明的實施例,銅箔100具有第一表面S1,該第一表面S1是基於銅層110的無光澤表面MS的方向的表面,且第二表面S2是光澤表面SS的方向的表面。在圖1中,銅箔100的第一表面S1是防腐薄膜210的表面,而第二表面S2是光澤表面SS。當防腐薄膜210沒有設置在銅層110上時,銅層110的無光澤表面對應於銅箔100的第一表面S1。According to an embodiment of the present invention, the
根據本發明的實施例,銅箔100的織構係數偏差(texture coefficient bias,TCB)為0.52或更小。According to an embodiment of the present invention, the texture coefficient bias (TCB) of the
更具體地,銅箔100的(220)平面的織構係數偏差[TCB(220)]為0.52或更小。根據本發明的一個實施例,銅箔100的(220)平面的織構係數偏差[TCB(220)]也稱為銅箔100的織構係數偏差[TCB(220)]。More specifically, the deviation of the texture coefficient of the (220) plane of the copper foil 100 [TCB(220)] is 0.52 or less. According to an embodiment of the present invention, the texture coefficient deviation [TCB (220)] of the (220) plane of the
(220)平面的織構係數偏差[TCB(220)]表示(220)平面[TC(220)]的織構係數的位置相關的偏差或趨勢。織構係數偏差[TCB(220)]涉及銅箔100的表面的晶體結構。(220)平面的織構係數偏差[TCB(220)]可以根據方程式1計算。具體地,在銅箔100的寬度方向上的左側、中央和右側的各個點處測量(220)平面的織構係數偏差[TCB(220)]三次(參見下面的方程式2)。其中,最高[TC(220)]值為TCmax
,最低[TC(220)]值為TCmin
。織構係數偏差[TCB(220)]由TCmax
和TCmin
之間的差值計算,即「TCmax
- TCmin
」的值。The (220) plane texture coefficient deviation [TCB(220)] represents the position-dependent deviation or trend of the (220) plane [TC(220)] texture coefficient. The texture coefficient deviation [TCB(220)] relates to the crystal structure of the surface of the
[方程式 1][Equation 1]
織構係數偏差 [TCB(220)] = TCmax - TCmin Texture coefficient deviation [TCB(220)] = TC max -TC min
同時,用於在銅箔100的寬度方向上收集樣品的標準可以與用於測量重量偏差的標準相同。Meanwhile, the standard for collecting the sample in the width direction of the
根據方程式1,從(220)平面的織構係數[TC(220)]獲得(220)平面的織構係數偏差[TCB(220)]。According to
在下文中,參考圖2,下面將描述根據本發明的實施例的用於測量和計算(220)平面的織構係數[TC(220)]的方法。Hereinafter, referring to FIG. 2, a method for measuring and calculating the texture coefficient [TC(220)] of the (220) plane according to an embodiment of the present invention will be described below.
圖2A顯示了銅箔的XRD圖的實例。更具體地,圖2A是銅箔100的XRD圖。Fig. 2A shows an example of the XRD pattern of the copper foil. More specifically, FIG. 2A is an XRD pattern of
為了測量(220)平面的織構係數[TC(220)],首先,通過在30°至95°的繞射角內進行X射線繞射(X-ray diffraction,XRD) [標靶:銅 K α1,2θ之間隔:0.01°,和2θ之掃瞄速率:3度/min]獲得具有對應n個晶面的峰的一XRD圖。例如,如圖2A所示,獲得對應於(111)、(200)、(220)和(311)平面的峰的XRD圖。參照圖2A,n為4。In order to measure the texture coefficient of the (220) plane [TC(220)], first, by performing X-ray diffraction (XRD) within a diffraction angle of 30° to 95° [target: copper K α1, 2θ interval: 0.01°, and 2θ scan rate: 3 degrees/min] obtain an XRD pattern with peaks corresponding to n crystal planes. For example, as shown in FIG. 2A, XRD patterns corresponding to peaks in the (111), (200), (220), and (311) planes are obtained. 2A, n is 4.
然後,從XRD圖獲得各晶面(hkl)的XRD繞射強度[I(hkl)]。另外,得到由粉末繞射標準聯合委員會(joint committee on powder diffraction standards,JCPDS)規定的標準銅粉末的n個晶面的XRD繞射強度[I0 (hkl)]。接下來,獲得n個晶面的I(hkl)/I0 (hkl)的算術平均值,然後藉由將(220)平面之I(220)/I0 (220)除以算術平均值來計算(220)平面的織構係數(texture coefficient)[TC(220)]。也就是說,將基於以下的方程式2來計算(220)平面的織構係數[TC(220)]:Then, the XRD diffraction intensity [I(hkl)] of each crystal plane (hkl) is obtained from the XRD pattern. In addition, the XRD diffraction intensity [I 0 (hkl)] of n crystal planes of the standard copper powder specified by the Joint Committee on Powder Diffraction Standards (JCPDS) was obtained. Next, obtain the arithmetic average of I(hkl)/I 0 (hkl) of n crystal planes, and then calculate by dividing the I(220)/I 0 (220) of the (220) plane by the arithmetic average (220) Texture coefficient of the plane [TC(220)]. That is, the texture coefficient [TC(220)] of the (220) plane will be calculated based on the following Equation 2:
[方程式 2] [Equation 2]
根據本發明的實施例,銅箔100的(220)平面可具有0.52或更小的織構係數偏差[TCB(220)]。更具體地,銅箔100可具有0.52或更小的織構係數[TC(220)]。According to an embodiment of the present invention, the (220) plane of the
當(220)平面的織構係數偏差(TCB)高於0.52時,由於局部晶體結構的差異引起的局部紋理的差異,因而在銅箔100經由卷對卷製程製造銅箔的過程中將張力施加到銅箔而容易產生變形,因此產生皺紋(wrinkle)。When the deviation of the texture coefficient (TCB) of the (220) plane is higher than 0.52, due to the difference in the local texture caused by the difference in the local crystal structure, tension is applied during the
根據本發明的一個實施例,(220)平面的織構係數[TC(220)]應該保持在小於0.52的相對較低的水平。According to an embodiment of the present invention, the texture coefficient [TC(220)] of the (220) plane should be kept at a relatively low level less than 0.52.
根據本發明的實施例,銅箔100的抗拉強度為29 kgf/mm2
至65kgf/mm2
。抗拉強度可以根據IPC-TM-650測試方法手冊的規定用萬能試驗機(universal testing machine,UTM)來測量。根據本發明的實施例,抗拉強度可以用Instron公司的萬能試驗機來測量。此時,用於測量抗拉強度的樣品的寬度為12.7mm,夾具之間的距離為50mm,測量速度為50mm/min。為了評估物理性質,重複測量樣品的抗拉強度三次,並將其平均值作為銅箔100的抗拉強度。According to an embodiment of the present invention, the tensile strength of the
當銅箔100的抗拉強度小於29 kgf/mm2
時,銅箔100不能承受如在製造過程中施加到銅箔上的張力之類的力,因此在卷對卷過程中可能會隆起。When the tensile strength of the
當銅箔100的抗拉強度高於65kgf/mm2
時,由於其優異的抗拉強度,銅箔100可以充分地承受在製造過程中施加到其上的張力等的力,但是,銅箔100由於其脆性增加而不能響應於在卷對卷製程期間局部施加到其上的力而不能被拉長,從而可能被撕裂。因此,銅箔100的可用性(availability)惡化。例如,可能會在製備銅箔的過程中或在使用銅箔製造二次電池用電極的過程中發生撕裂,導致難以穩定地獲得產品。When the tensile strength of the
例如,當在通過卷對卷製程製造銅箔的過程中發生這種撕裂時,應該停止卷對卷製程設備的操作並除去銅箔撕裂的部分後再操作該設備。在這種情況會使得處理時間和成本增加並且生產效率的惡化。For example, when such tearing occurs during the manufacturing of copper foil through a roll-to-roll process, the operation of the roll-to-roll process equipment should be stopped and the copper foil torn portion removed before operating the equipment. In this case, the processing time and cost increase and the production efficiency deteriorates.
根據本發明的一個實施例,銅箔100具有18μm至148μm的粗糙度輪廓元素(roughness profile elements,Rsm)的平均寬度。According to an embodiment of the present invention, the
粗糙度輪廓元素(Rsm)的平均寬度可以通過粗糙度測試儀根據JIS B 0601-2001來測量。具體而言,根據本發明的實施例,粗糙度輪廓元素(Rsm)的平均寬度可以用可從Mitutoyo公司商購的SJ-310型量測儀來測量。此時,不包括切斷長度之外的測量長度設定為4mm,而在開始階段和後期階段將切斷長度設定為0.8mm。另外,觸針尖端的半徑設定為2μm。The average width of the roughness profile element (Rsm) can be measured by a roughness tester according to JIS B 0601-2001. Specifically, according to an embodiment of the present invention, the average width of the roughness profile element (Rsm) can be measured with a SJ-310 type measuring instrument commercially available from Mitutoyo Corporation. At this time, the measurement length excluding the cut length is set to 4 mm, and the cut length is set to 0.8 mm at the beginning stage and the later stage. In addition, the radius of the tip of the stylus is set to 2 μm.
圖2B是粗糙度輪廓元素的圖表。Figure 2B is a graph of roughness contour elements.
參見圖2B,粗糙度輪廓元素(Rsm)的平均寬度是從一個峰(谷)穿過平均線ML的點到相鄰峰(谷)的對應點的距離(XSi,其中i = 1、2、3、...m)的算術平均值。具體而言,粗糙度輪廓元素(Rsm)的平均寬度可通過以下方程式3計算:Referring to FIG. 2B, the average width of the roughness profile element (Rsm) is the distance from the point where a peak (valley) crosses the average line ML to the corresponding point of the adjacent peak (valley) (XSi, where i = 1, 2, 3. The arithmetic mean of...m). Specifically, the average width of the roughness profile element (Rsm) can be calculated by the following equation 3:
[方程式3] [Equation 3]
粗糙度輪廓元素(Rsm)的平均寬度適用於評估具有規則紋理的表面。The average width of the roughness profile element (Rsm) is suitable for evaluating surfaces with regular textures.
當粗糙度輪廓元素(Rsm)的平均寬度小於18μm時,在通過滾動製造銅箔100的過程中,張力集中在某個峰或谷上的可能性很高。因為在銅箔100的表面上存在太多的峰(谷),因此銅箔100可能容易被撕裂。When the average width of the roughness profile element (Rsm) is less than 18 μm, in the process of manufacturing the
另一方面,當粗糙度輪廓元素(Rsm)的平均寬度高於148μm時,在通過卷對卷製程製造銅箔100的過程中容易發生滑動,因為相鄰的峰它們之間的距離是大的,使得銅箔100容易起皺紋。On the other hand, when the average width of the roughness profile element (Rsm) is higher than 148 μm, slippage easily occurs in the process of manufacturing the
根據本發明的一個實施例,銅箔100具有0.6μm或更大的最大高度粗糙度(maximum height roughness,Rmax)。According to an embodiment of the present invention, the
最大高度粗糙度(Rmax)可以通過粗糙度測試儀根據JIS B 0601-2001來測量。具體而言,最大高度粗糙度(Rmax)可以用可從Mitutoyo公司商購的SJ-310型量測儀來測量。具體地,不包括截止長度之外的測量長度設置為4mm,而在開始階段和後期階段將截止長度設置為0.8mm。另外,觸針尖端的半徑設定為2μm,測量壓力為0.75mN。The maximum height roughness (Rmax) can be measured by a roughness tester according to JIS B 0601-2001. Specifically, the maximum height roughness (Rmax) can be measured with a SJ-310 type measuring instrument commercially available from Mitutoyo. Specifically, the measurement length excluding the cut-off length is set to 4 mm, and the cut-off length is set to 0.8 mm at the beginning and later stages. In addition, the radius of the tip of the stylus is set to 2 μm, and the measured pressure is 0.75 mN.
在其中最大高度粗糙度(Rmax)小於0.6μm的情況下,由於銅箔100的重量重疊,因而當銅箔100纏繞在線軸或捲繞器上時,銅箔100會局部地被拉長而產生隆起(bagginess)。In the case where the maximum height roughness (Rmax) is less than 0.6 μm, since the weight of the
根據本發明的一個實施例,銅箔100可具有3.5μm或更小的最大高度粗糙度(Rmax)。當銅箔100的最大高度粗糙度(Rmax)高於3.5μm時,在卷對卷(RTR)製程製造銅箔100的過程中,空氣會於銅箔100纏繞在線軸或捲繞器上時被困在銅箔之間而使銅箔產生隆起。According to an embodiment of the present invention, the
根據本發明的一個實施例,銅箔100具有5%或更小的重量偏差。更具體地,銅箔100可具有0至5%的重量偏差。在這種情況下,零重量偏差意味著沒有重量偏差。According to an embodiment of the present invention, the
根據本發明的實施例,重量偏差可以通過在銅箔100的寬度方向上的三個任意點處測量的重量值的平均值(平均重量)和重量值的標準偏差來獲得。具體地,在沿著銅箔100的寬度方向佈置的三個點處獲得5cm×5cm的樣品,即,在垂直於捲繞方向(橫向(transverse direction,TD))的方向上測量各個樣品的重量、計算每單位面積的重量、根據三個樣品的每單位面積的重量計算三個點的「平均重量」和「重量標準偏差」,並且按照以下方程式4計算重量偏差:According to the embodiment of the present invention, the weight deviation can be obtained by the average value (average weight) of the weight values measured at three arbitrary points in the width direction of the
[方程式 4] [Equation 4]
在銅箔100的重量偏差高於5%的情況下,由於施加在銅箔100上的重量的重疊,因而在卷對卷製程期間捲繞銅箔100時它可能會部分地被拉長而導致銅箔100的隆起。In the case where the weight deviation of the
根據本發明的一個實施例,銅箔100在25±15℃的室溫下具有2%或更高的伸長率(elongation)。伸長率可以根據IPC-TM-650測試方法手冊的規定用萬能試驗機(UTM)測量。根據本發明的實施例,伸長率可以用Instron公司的萬能試驗機測量。此時,用於測量伸長率的樣品的寬度為12.7mm,夾具之間的距離為50mm,測量速度為50mm/min。為了評估物理性質,重複測量樣品的伸長率三次,並將其平均值作為銅箔100的伸長率。According to an embodiment of the present invention, the
當銅箔100的伸長率小於2%時,銅箔100不會響應於在製造銅箔100的過程中施加的力而被拉長,所以會被撕裂(torn)。When the elongation of the
更具體地,銅箔100可具有2%至20%的伸長率。More specifically, the
根據本發明的實施例,銅箔100可具有4μm至30μm的厚度。當銅箔100的厚度小於4μm時,在使用銅箔100製造銅箔100或產品(例如,二次電池用電極或二次電池)的過程中,可加工性會劣化。當銅箔100的厚度高於30μm時,使用銅箔100的二次電池用電極的厚度增加,且由於其厚度而難以實現高容量二次電池。According to an embodiment of the present invention, the
根據本發明的一個實施例,隆起(bagginess)與皺紋(wrinkle)不同。According to one embodiment of the invention, bagginess is different from wrinkle.
圖9是示出銅箔的隆起的圖像。圖9中箭頭(↗)表示的部分表示發生隆起的區域。根據本發明的實施例,隆起是指銅箔100中局部地拉長並且不均勻分佈的狀態或部分。FIG. 9 is an image showing the bulge of copper foil. The portion indicated by the arrow (↗) in FIG. 9 indicates the area where the bulge occurs. According to an embodiment of the present invention, bulging refers to a state or part of the
圖10是示出銅箔的皺紋的圖像。圖10中箭頭(↗)表示的部分表示出現皺紋的區域。根據本發明的實施例,皺紋指的是銅箔100中部分地被折疊的狀態或部分。FIG. 10 is an image showing wrinkles of copper foil. The portion indicated by the arrow (↗) in FIG. 10 indicates the area where wrinkles appear. According to the embodiment of the present invention, the wrinkle refers to a state or part of the
然而,本發明的一個實施例不限於此,也可不區分隆起和皺紋,隆起和皺紋也可僅具有單一個含義而可互換使用。例如,銅箔100局部地被拉長且不平展的情況以及銅箔100局部地被折疊的情況都可以用「隆起」或「皺紋」來表示。However, an embodiment of the present invention is not limited to this, and ridges and wrinkles may not be distinguished, and ridges and wrinkles may have only a single meaning and may be used interchangeably. For example, the case where the
也就是說,「隆起」和「皺紋」可不單獨使用,而是可具有一個含義而可互換。That is to say, "swelling" and "wrinkle" can not be used separately, but can have a meaning and are interchangeable.
圖3是示出根據本發明另一實施例的銅箔200的示意性截面圖。在下文中,將省略上述之構成組件的描述以避免重複。FIG. 3 is a schematic cross-sectional view showing a
參照圖3,根據本發明另一實施例的銅箔200包括銅層110,以及兩個防腐薄膜(防腐薄膜210和防腐薄膜220),防腐薄膜210和防腐薄膜220各設置在銅層110的無光澤表面MS和光澤表面SS上。與圖1中所示的銅箔100相比,圖3中所示的銅箔200還包括設置在銅層110的光澤表面SS上的防腐薄膜220。Referring to FIG. 3, a
為了便於描述,在防腐薄膜210和防腐薄膜220中,設置在銅層110的無光澤表面MS上的防腐薄膜210被稱為「第一保護層」,而設置在光澤表面SS上的防腐薄膜220稱為「第二保護層」。For ease of description, in the
另外,圖3中所示的銅箔200的第一表面S1與設置在無光澤表面MS上的防腐薄膜210的表面相同,並且第二表面S2與設置在光澤表面SS上的防腐薄膜220的表面相同。In addition, the first surface S1 of the
根據本發明的另一個實施例,防腐薄膜210和防腐薄膜220各可包括鉻(Cr)、矽烷化合物或氮化合物中的至少其中之一者。According to another embodiment of the present invention, the
圖3中所示的銅箔200的(220)平面具有0.52或更小的織構係數偏差[TCB(220)]。The (220) plane of the
另外,圖3中所示的銅箔200具有29 kgf/mm2
至65kgf/mm2
的抗拉強度和18μm至148μm的粗糙度輪廓元素(Rsm)的平均寬度。另外,銅箔200的最大高度粗糙度(Rmax)為0.6μm以上,重量偏差為5%以下,在25±15℃的室溫下的伸長率為2%以上且厚度為4μm至30μm。Further, as shown in FIG. 3 the
圖4是示出根據本發明另一實施例的用於二次電池的電極300的示意性截面圖。4 is a schematic cross-sectional view showing an
圖4中所示的用於二次電池的電極300可以例如應用於圖6中所示的二次電池500。The
參照圖4,根據本發明另一實施例的用於二次電池的電極300包括銅箔100和設置在銅箔100上的活性材料層310。在這種情況下,使用銅箔100作為集電器。Referring to FIG. 4, an
更具體地,根據本發明另一實施例的用於二次電池的電極300包括具有第一表面S1和第二表面S2的銅箔100,活性材料層310設置在銅箔100的第一表面S1或第二表面S2的至少其中之一者上。此外,銅箔100包括銅層110和設置在銅層110上的防腐薄膜210。More specifically, the
圖4顯示圖1中所示的銅箔100作為集電器。然而,本發明的一實施例不限於此,圖3中所示的銅箔200可以作為用於二次電池的電極300的集電器。FIG. 4 shows the
另外,圖4中示出了活性材料層310僅設置在銅箔100的第一表面S1和第二表面S2中的第一表面S1上的配置,但是本發明的其他實施例不限於此。活性材料層310可以設置在銅箔100的第一表面S1和第二表面S2上,或者僅設置在銅箔100的第二表面S2上。In addition, FIG. 4 shows a configuration in which the
圖4中所示的活性材料層310包括電極活性材料,特別是陽極活性材料。也就是說,圖4中所示的用於二次電池的電極300可以作為陽極。The
活性材料層310可包括碳、金屬、金屬氧化物或金屬和碳的複合物中的至少其中之一者。金屬可包括鍺、錫、鋰、鋅、鎂、鎘、鈰、鎳、或鐵中的至少其中之一者。另外,為了增加二次電池的充電/放電容量,活性材料層310可以包括矽(Si)。The
當使用根據本發明的實施例的銅箔100時,在製造用於二次電池的電極300的過程中防止了銅箔100的撕裂、皺紋或隆起。因此,可以提高用於二次電池的電極300的製造效率,並且可以提高包括用於二次電池的電極300的二次電池的充電/放電效率和容量維持。When the
圖5是示出根據本發明另一實施例的用於二次電池的電極400的示意性截面圖。FIG. 5 is a schematic cross-sectional view showing an
根據本發明另一實施例的用於二次電池的電極400包括銅箔200、以及設置在銅箔200上的活性材料層310和活性材料層320。The
參考圖5,銅箔200包括銅層110、以及設置在銅層110的相對表面MS和SS上的防腐薄膜210和防腐薄膜220。另外,圖5所示的用於二次電池的電極300包括設置在銅箔200的兩個表面上的活性材料層310和活性材料層320。這裡,設置在銅箔200的第一表面S1上的活性材料層310被稱為「第一活性材料層」,而設置在銅箔200的第二表面S2上的活性材料層320被稱為「第二活性材料層」。Referring to FIG. 5, the
活性材料層310和活性材料層320兩者可以以相同的方式並使用相同的材料,或以不同的方式並使用不同的材料來生產。Both the
圖6是示出根據本發明另一實施例的二次電池500的示意性截面圖。圖6中所示的二次電池500例如是鋰二次電池。6 is a schematic cross-sectional view showing a
參考圖6,二次電池500包括陰極370、面向陰極370的陽極340、設置在陰極370和陽極340之間以提供使離子能夠移動的環境的電解液350、以及使陰極370與陽極340電絕緣(隔離)的隔離膜360。這裡,穿過陰極370和陽極340的離子是鋰離子。隔離膜360將陰極370與陽極340分開,以防止在一個電極處產生的電流經由二次電池500移動到另一個電極後被不必要地消耗。參考圖6,隔離膜360設置在電解液350中。6, the
陰極370包括陰極集電器371和陰極活性材料層372。陰極集電器371例如是鋁箔。The
陽極340包括陽極集電器341和活性材料層342。陽極340的活性材料層342包括陽極活性材料。The
圖1和圖3中所示的銅箔100和銅箔200可以作為陽極集電器341。此外,圖4和圖5中分別示出的用於二次電池的電極300和電極400可以作為圖6中所示的二次電池500的陽極340。The
圖7是示出根據本發明另一實施例的可撓性銅箔層壓薄膜600的示意性截面圖。7 is a schematic cross-sectional view showing a flexible copper foil laminated
根據本發明另一實施例的可撓性銅箔層壓薄膜600包括聚合物膜410和設置在聚合物膜410上的銅箔100。圖7中示出了包括圖1中所示的銅箔100的可撓性銅箔層壓薄膜600,但是本發明的其他實施例不限於此。例如,圖3中所示的銅箔200或其他銅箔可用於可撓性銅箔層壓薄膜600。The flexible copper foil laminated
聚合物膜410是可撓性且不導電的。對於聚合物膜410的種類沒有特別限制。聚合物膜410例如包括聚醯亞胺。可撓性銅箔層壓薄膜600可以通過輥壓機層壓聚醯亞胺膜和銅箔100來製造。或者,可撓性銅箔層壓薄膜600可以通過用聚醯亞胺前體溶液塗覆銅箔100然後熱處理所得的銅箔100來製備。The
銅箔100包括具有無光澤表面MS和光澤表面SS的銅層110,以及設置在銅層110的無光澤表面MS和光澤表面SS中的至少其中一者上的防腐薄膜210。在這種情況下,可以省略防腐薄膜210。The
參考圖7,聚合物膜410設置在防腐薄膜210上,但是本發明的另一實施例不限於此。聚合物膜410可以設置在銅層110的光澤表面SS上。Referring to FIG. 7, the
在下文中,將參考圖8詳細描述根據本發明另一實施例的用於製造銅箔200的方法。Hereinafter, a method for manufacturing the
圖8是示出用於製造圖3中所示的銅箔200的方法的示意圖。FIG. 8 is a schematic diagram showing a method for manufacturing the
首先,在包含銅離子的電解液11中彼此間隔開的一電極板13和旋轉電極滾筒12(rotatary electrode drum)之間提供電流密度為30 ASD (A/dm2
)至80 ASD (A/dm2
)的電流來形成銅層110。First, a current density of 30 ASD (A/dm 2 ) to 80 ASD (A/dm) is provided between an
具體地,參考圖8,當將30 ASD至80ASD電流密度的電流施加到設置在包含電解液11的電解槽10中的電極板13和旋轉電極滾筒12時,通過在旋轉電極滾筒12上電沉積(electrodeposition)的銅來形成銅層110。此時,電極板13和旋轉電極滾筒12之間的間隙可以調節到8mm至13mm的範圍。Specifically, referring to FIG. 8, when a current with a current density of 30 ASD to 80 ASD is applied to the
隨著施加到電極板13和旋轉電極滾筒12的電流密度增加,電鍍變得均勻且銅層110的無光澤表面MS的表面粗糙度因此減小。隨著電流密度降低,電鍍變得不均勻,因此銅層110的無光澤表面MS的表面粗糙度增加。As the current density applied to the
電解液11含有70g/L至100g/L的銅離子和80g/L至130g/L的硫酸。電解液11的溫度保持在50℃至70℃。在具有上述濃度的電解液11中,銅可以容易地沉積在旋轉電極滾筒12上。The
此外,電解液11包括作為有機物質的2mg/L至20mg/L的2-巰基噻唑啉(2-mercaptothiazoline),2mg/L至20mg/L的雙 - (3-磺丙基)二硫化物(bis-(3-sulfopropyl) disulfide,SPS)和50mg/L或更少的聚乙二醇(PEG)。In addition, the
2-巰基噻唑啉被稱為「MTZ」並且可以由下結構式1表示。2-Mercaptothiazoline is called "MTZ" and can be represented by the following
[結構式1] [Structure 1]
2-巰基噻唑啉(MTZ)的作用是在製備銅層110的過程中使晶粒細化。當電解液11中2-巰基噻唑啉(MTZ)的濃度小於2mg/L時,2-巰基噻唑啉(MTZ)形成的細晶粒不足,且銅箔200的抗拉強度小於29 kgf/mm2
。另一方面,當2-巰基噻唑啉(MTZ)的濃度高於20mg/L時,2-巰基噻唑啉(MTZ)形成的細晶粒過量,銅箔200的抗拉強度高於65 kgf/mm2
。The function of 2-mercaptothiazoline (MTZ) is to refine the crystal grains during the preparation of the
當在電解液11中作為增光劑的雙-3-磺丙基二硫化物(SPS)的濃度過高時(即大於20mg/L時),銅層110的表面會過度均勻,每單位寬度的峰(谷)的數量減少,且銅箔200的粗糙度輪廓元素(Rsm)的平均寬度高於148μm。另一方面,當雙 - (3-磺丙基)二硫化物(SPS)的濃度小於2mg/L時,由於使鍍銅過程中表面均勻的光澤濃度過低,銅層110的表面不均勻地形成。因此,銅箔的每單位寬度的峰(谷)的數量增加,且粗糙度輪廓元素(Rsm)的平均寬度小於18μm。When the concentration of bis-3-sulfopropyl disulfide (SPS) in the
聚乙二醇(PEG)用於在鍍銅期間使銅層110的表面平整。因此,隨著電解液11中聚乙二醇(PEG)的濃度增加,銅層110的均勻度增加。當電解液11中的聚乙二醇(PEG)的濃度高於50mg/L時,銅箔200的表面均勻度增加並且銅箔200的最大高度粗糙度(Rmax)小於0.6μm。Polyethylene glycol (PEG) is used to flatten the surface of the
電解液11包含50mg/L或更少的銀(Ag)。這裡,銀(Ag)包括在電解液11中離解的離子(Ag+
)和非離解形式(Ag),且包括以鹽的形式存在的銀(Ag)。通常,電解液11中的銀(Ag)對應於雜質。當電解液11中銀(Ag)的濃度超過50mg/L時,銅在旋轉電極滾筒12上不均勻地電沉積。因此,將電解液11中的銀(Ag)的濃度控制在50mg/L或更低。The
為了將電解液11中的銀(Ag)濃度控制在50mg/L以下,通過向電解液11中加入氯(Cl)可以以誘導銀(Ag)以氯化銀(AgCl)的形式沉澱來除去銀(Ag)。例如,電解液11包含10mg/L至30mg/L的氯(Cl)。這裡,氯(Cl)包括氯離子(Cl-)和分子中存在的氯原子。具體地,氯(Cl)可以以氯化銀的形式沉澱銀(Ag)離子。可以通過過濾除去氯化銀。In order to control the concentration of silver (Ag) in the
為了減少電解液11中的雜質含量,對作為銅離子原料的銅線進行熱處理,將經熱處理的銅線用酸清洗,並將經酸洗的銅線加入硫酸中作為電解液。In order to reduce the content of impurities in the
電解液11可具有35m3
/hr至50m3
/hr的流速。也就是說,為了在電鍍過程中除去電解液11中存在的固體雜質,電解液11可以以35m3
/hr至50m3
/hr的流速循環。在電解液11循環期間,可以過濾電解液11。這種過濾能夠除去氯化銀(AgCl),使得電解液11可以保持乾淨。The
根據本發明的一實施例,每單位時間(秒)電解液11的流速變化,這在下文中稱為「流速偏差(flow rate deviation)」,可控制在5%以下。當流速偏差超過5%時,由於不均勻的鍍層,可能形成不均勻的銅層110,且銅箔100的(220)平面[TCB(220)]的織構係數偏差超過0.52。According to an embodiment of the present invention, the flow rate of the
同時,當用臭氧處理電解液11、或者通過電鍍形成銅層110時,可以通過向電解液11添加過氧化物和空氣來維持或改善電解液11的清晰度(clearness)。Meanwhile, when the
然後,在清潔槽20中清潔銅層110。Then, the
為了去除銅層110表面上的雜質,在清潔槽20中用水清洗銅層110。或者,為了除去銅層110表面上的雜質,先進行酸清洗後進行水清洗以除去用於酸清洗的酸性溶液。清潔過程可以省略。In order to remove impurities on the surface of the
然後,在銅層110上形成防腐薄膜210和防腐薄膜220。Then, a corrosion-
參見圖8,將銅層110浸入包含在防腐槽30中的防腐液31中,以在銅層110上形成防腐薄膜210和防腐薄膜220。這裡,防腐液31包括鉻,且鉻為以防腐液31中的離子的形式存在的鉻(Cr)。防腐液31可包含0.5g/L至5g/L的鉻。由此形成的防腐薄膜210和防腐薄膜220被稱為「保護層」。Referring to FIG. 8, the
同時,防腐薄膜210和防腐薄膜220可以包括用矽烷處理矽烷化合物和通過氮氣處理氮化合物。Meanwhile, the
通過形成這些防腐薄膜210和防腐薄膜220來生產銅箔200。The
然後,在清潔槽40中清潔銅箔200。可以省略這種清潔製程。Then, the
然後,進行乾燥過程,接著將銅箔200纏繞在捲繞機(winder,WR)上。Then, a drying process is performed, and then the
在下文中,將參考製備實施例和比較例更詳細地描述本發明。製備實施例僅用於更好地理解本發明,不應解釋為限制本發明的範圍。Hereinafter, the present invention will be described in more detail with reference to Preparation Examples and Comparative Examples. The preparation examples are only for better understanding of the present invention and should not be construed as limiting the scope of the present invention.
製備實施例 1-6和比較例 1-6Preparation Example 1-6 and Comparative Example 1-6
使用製箔機(foil making machine)生產銅箔,該製箔機包括電解槽10、設置在電解槽10中的旋轉電極滾筒12、以及與旋轉電極滾筒12間隔開的電極板13。電解液11為硫酸銅溶液,電解液11的銅離子濃度為75g/L,硫酸濃度為100g/L,氯離子(Cl-)濃度為17mg/L,電解液11的溫度保持在55℃。The copper foil is produced using a foil making machine including an
電解液11包括表1中所示濃度的2-巰基噻唑啉(MTZ)、雙-3-磺丙基二硫化物(SPS)和聚乙二醇(PEG)。另外,電解液11以42m3
/hr的流速循環,流速偏差如上表1所示。The
首先,在旋轉電極滾筒12和電極板13之間施加60ASD的電流密度以形成銅層110。First, a current density of 60 ASD is applied between the
然後,將銅層110浸入包含在防腐槽30中的防腐液31中,以在銅層110的表面上形成包含鉻的防腐薄膜210和防腐薄膜220。此時,防腐液31的溫度保持在30℃,防腐液31含有2.2g/L的鉻(Cr)。結果,製備了製備實施例1-6和比較例1-6的銅箔。Then, the
表 1Table 1
測量如此產生的製備實施例1-6和比較例1-7的銅箔的(i)(220)平面的織構係數偏差[TCB(220)]、(ii)抗拉強度、(iii)銅箔的粗糙度輪廓元素(Rsm)的平均寬度和最大高度粗糙度(Rmax)。結果顯示在表2中。The thus produced copper foils of Preparation Examples 1-6 and Comparative Examples 1-7 were measured for (i) (220) plane texture coefficient deviation [TCB (220)], (ii) tensile strength, (iii) copper Roughness profile element (Rsm) average width and maximum height roughness (Rmax) of the foil. The results are shown in Table 2.
(i) (220)平面的織構係數偏差[TCB(220)]的測量(i) (220) Measurement of deviation of plane texture coefficient [TCB(220)]
首先,測量製備實施例1-6和比較例1-6中製備的銅箔的(220)平面的織構係數偏差[TCB(220)]。First, the texture coefficient deviation [TCB (220)] of the (220) plane of the copper foils prepared in Preparation Examples 1-6 and Comparative Examples 1-6 was measured.
具體地,製備了製備實施例1-6和比較例1-6的銅箔,通過在30°至95°的繞射角(2θ)內進行X射線繞射(X-ray diffraction) [標靶:銅 K α1,2θ之間隔:0.01°,和2θ之掃瞄速率:3度/min]獲得具有對應n個晶面的峰的一XRD圖,並從XRD圖獲得各晶面(hkl)的XRD繞射強度[I(hkl)]。另外,得到由粉末繞射標準聯合委員會(JCPDS)規定的標準銅粉的n個晶面的繞射強度[I0 (hkl)]。在這種情況下,晶面是(111)、(200),(220)和(311)平面,且n是4。Specifically, the copper foils of Preparation Examples 1-6 and Comparative Examples 1-6 were prepared, by performing X-ray diffraction (X-ray diffraction) within a diffraction angle (2θ) of 30° to 95° [target : Interval of copper K α1, 2θ: 0.01°, and scan rate of 2θ: 3 degrees/min] Obtain an XRD pattern with peaks corresponding to n crystal planes, and obtain each crystal plane (hkl) from the XRD pattern XRD diffraction intensity [I(hkl)]. In addition, the diffraction intensity [I 0 (hkl)] of n crystal planes of the standard copper powder specified by the Joint Committee on Powder Diffraction Standards (JCPDS) was obtained. In this case, the crystal planes are (111), (200), (220), and (311) planes, and n is 4.
接下來,獲得n個晶面的"I(hkl)/I0 (hkl)"的算術平均值,然後藉由將(220)平面之I(220)/I0 (220)除以算術平均值,以獲得(220)平面的織構係數(texture coefficient) [TC(220)]。也就是說,將基於以下的方程式2來計算(220)平面的織構係數[TC(220)]:Next, obtain the arithmetic mean value of "I(hkl)/I 0 (hkl)" of n crystal planes, and then divide the (220) plane I(220)/I 0 (220) by the arithmetic mean value To obtain the texture coefficient of the (220) plane [TC(220)]. That is, the texture coefficient [TC(220)] of the (220) plane will be calculated based on the following Equation 2:
[方程式2] [Equation 2]
使用(220)平面[TC(220)]的織構係數,根據下面的方程式1測量(220)平面的織構係數偏差[TCB(220)]。Using the texture coefficient of the (220) plane [TC(220)], the deviation of the texture coefficient of the (220) plane [TCB(220)] is measured according to
具體地,在銅箔100的寬度方向上的左側、中央和右側的各個點處測量(220)平面的織構係數偏差[TCB(220)]三次(參見下面的方程式1)。其中,最高[TC(220)]值為TCmax
,最低[TC(220)]值為TCmin
。織構係數偏差[TCB(220)]由TCmax
和TCmin
之間的差值計算,即「TCmax
- TCmin
」的值。Specifically, the texture coefficient deviation [TCB(220)] of the (220) plane is measured three times at various points on the left, center, and right in the width direction of the copper foil 100 (see
[方程式1] 織構係數偏差 [TCB(220)] = TCmax - TCmin [Equation 1] deviation of texture coefficient [TCB(220)] = TC max -TC min
(ii)抗拉強度的測量(ii) Measurement of tensile strength
根據IPC-TM-650試驗方法手冊的說明書,使用萬能試驗機測量製備實施例1-6和比較例1-6中製備的銅箔的抗拉強度。抗拉強度的測量樣品的寬度為12.7mm,夾具之間的距離為50mm,測量速度為50mm/min。重複測量樣品的抗拉強度三次,並將其平均值作為測量結果進行評估。According to the specification of the IPC-TM-650 test method manual, the tensile strength of the copper foils prepared in Preparation Examples 1-6 and Comparative Examples 1-6 was measured using a universal testing machine. The width of the tensile strength measurement sample is 12.7 mm, the distance between the fixtures is 50 mm, and the measurement speed is 50 mm/min. The tensile strength of the sample was repeatedly measured three times, and the average value was evaluated as the measurement result.
(iii)粗糙度輪廓元素(Rsm)的平均寬度的測量(iii) Measurement of average width of roughness profile element (Rsm)
根據JIS B 0601-2001,使用粗糙度測試儀測量粗糙度輪廓元素(Rsm)的平均寬度。具體而言,可以使用可從Mitutoyo公司商購的SJ-310型量測儀來測量粗糙度輪廓元素的平均寬度。此時,不包括截止長度的測量長度設定為4mm,而在開始階段和後期階段將截止長度設定為0.8mm。另外,觸針尖端的半徑設定為2μm。According to JIS B 0601-2001, the average width of the roughness profile element (Rsm) is measured using a roughness tester. Specifically, the average width of the roughness profile element can be measured using a SJ-310 type measuring instrument commercially available from Mitutoyo Corporation. At this time, the measurement length excluding the cut-off length is set to 4 mm, and the cut-off length is set to 0.8 mm at the beginning and later stages. In addition, the radius of the tip of the stylus is set to 2 μm.
假設從一個峰(谷)穿過平均線ML的點到相鄰峰(谷)的對應點的距離為「XSi」,粗糙度輪廓元素(Rsm)的平均寬度可以通過以下方程式3獲得。Assuming that the distance from the point where a peak (valley) crosses the average line ML to the corresponding point of an adjacent peak (valley) is "XSi", the average width of the roughness profile element (Rsm) can be obtained by Equation 3 below.
[方程式3] [Equation 3]
(iv) 最大高度粗糙度(Rmax)的測量(iv) Measurement of maximum height roughness (Rmax)
根據JIS B 0601-2001,通過粗糙度測試儀測量最大高度粗糙度(Rmax)。具體而言,最大高度粗糙度(Rmax)使用可從Mitutoyo公司商購的SJ-310型量測儀來測量。此時,不包括截止長度的測量長度設定為4mm,而在開始和後期階段將截止長度設定為0.8mm。另外,觸針尖端的半徑設定為2μm,測量壓力為0.75mN。在如上所述的設定之後,基於用Mitutoyo粗糙度測試儀測量的值,獲得最大高度粗糙度(Rmax)的測量值。According to JIS B 0601-2001, the maximum height roughness (Rmax) is measured by a roughness tester. Specifically, the maximum height roughness (Rmax) is measured using an SJ-310 type measuring instrument commercially available from Mitutoyo Corporation. At this time, the measurement length excluding the cut-off length is set to 4 mm, and the cut-off length is set to 0.8 mm at the beginning and later stages. In addition, the radius of the tip of the stylus is set to 2 μm, and the measured pressure is 0.75 mN. After the setting as described above, based on the value measured with the Mitutoyo roughness tester, the measured value of the maximum height roughness (Rmax) is obtained.
(v) 觀察發生的隆起、皺紋或撕裂(v) Observe the occurrence of bumps, wrinkles or tears
1) 製備陽極1) Preparation of anode
將100重量份作為市售陽極活性材料的碳與2重量份苯乙烯丁二烯橡膠(SBR)和2重量份羧甲基纖維素(CMC)混合,使用蒸餾水作為溶劑以製備陽極活性物質用漿料。在製備實施例1-6和比較例1-6中,使用刮刀將陽極活性材料漿料塗覆銅箔至40μm的厚度以製作寬度為10公分的銅箔,在120℃下乾燥,並在1ton/cm2 的壓力下壓制以產生二次電池的陽極。100 parts by weight of carbon as a commercially available anode active material was mixed with 2 parts by weight of styrene butadiene rubber (SBR) and 2 parts by weight of carboxymethyl cellulose (CMC), and distilled water was used as a solvent to prepare an anode active material slurry material. In Preparation Examples 1-6 and Comparative Examples 1-6, the anode active material slurry was coated with copper foil to a thickness of 40 μm using a doctor blade to make a copper foil with a width of 10 cm, dried at 120° C., and dried at 1 ton. /cm 2 pressure to produce secondary battery anode.
2) 製備電解液2) Preparation of electrolyte
將作為溶質的LiPF6 以1M的濃度溶解在由1:2的比例混合的碳酸亞乙酯(EC)和碳酸甲乙酯(EMC)組成的非水有機溶劑中,以製備鹼性電解液。將99.5重量百分比的鹼性電解液與0.5重量百分比的琥珀酸酐(succinic anhydride)混合以製備非水電解液。LiPF 6 as a solute was dissolved at a concentration of 1 M in a non-aqueous organic solvent composed of ethylene carbonate (EC) and ethyl methyl carbonate (EMC) mixed in a ratio of 1:2 to prepare an alkaline electrolyte. A 99.5 weight percent alkaline electrolyte was mixed with 0.5 weight percent succinic anhydride to prepare a non-aqueous electrolyte.
3) 製備陰極3) Preparation of cathode
將氧化鋰錳(Li1.1 Mn1.85 Al0.05 O4 )與具有正交晶體結構的鋰錳氧化物(o-LiMnO2 )以重量比為90:10的比例混合,以製備陰極活性材料。將陰極活性材料、炭黑和作為黏合劑的聚(偏二氟乙烯)(poly(vinylidene fluoride),PVDF)以85:10:5的重量比混合,並將所得混合物與作為有機溶劑的NMP混合以製備漿料。用如此製備的漿料塗覆厚度為20μm的鋁箔的兩個表面並乾燥以產生陰極。Lithium manganese oxide (Li 1.1 Mn 1.85 Al 0.05 O 4 ) and lithium manganese oxide (o-LiMnO 2 ) having an orthogonal crystal structure were mixed in a weight ratio of 90:10 to prepare a cathode active material. The cathode active material, carbon black and poly(vinylidene fluoride) (PVDF) as a binder were mixed in a weight ratio of 85:10:5, and the resulting mixture was mixed with NMP as an organic solvent To prepare a slurry. Both surfaces of an aluminum foil with a thickness of 20 μm were coated with the slurry thus prepared and dried to produce a cathode.
4) 製備用於測試的鋰二次電池4) Preparation of lithium secondary batteries for testing
將陰極和陽極設置在鋁罐中,使得陰極和陽極與鋁罐絕緣,並且設置非水電解液和隔離膜以製造硬幣型鋰二次電池。作為隔離膜,使用聚丙烯(Celgard 2325;厚度25μm,平均孔徑φ28nm,孔隙率40%)。The cathode and anode are provided in an aluminum can so that the cathode and anode are insulated from the aluminum can, and a non-aqueous electrolyte and a separator are provided to manufacture a coin-type lithium secondary battery. As a separator, polypropylene (Celgard 2325; thickness 25 μm, average pore diameter φ28 nm, porosity 40%) was used.
5) 觀察發生的隆起、皺紋或撕裂。5) Observe the occurrence of bumps, wrinkles or tears.
在製造鋰二次電池的一系列過程中,觀察到銅箔的撕裂、皺紋或隆起是否發生。特別是,在製備銅箔和陽極的過程中,用肉眼觀察是否發生銅箔的撕裂、皺紋或隆起。沒有發生隆起、皺紋或撕裂的情況被稱為「好」。評估和觀察結果如下表2所示:In a series of processes for manufacturing lithium secondary batteries, it was observed whether tearing, wrinkling, or bulging of copper foil occurred. In particular, during the preparation of the copper foil and the anode, it is visually observed whether the copper foil is torn, wrinkled, or raised. A condition where no bumps, wrinkles or tears occur is called "good". The evaluation and observation results are shown in Table 2 below:
表 2Table 2
在比較例1-6製造銅箔和製備鋰二次電池的過程中,發生了銅箔的隆起、皺紋或撕裂。另一方面,在製備實施例1-6製造銅箔和製備鋰二次電池的過程中,沒有發生銅箔的隆起、皺紋或撕裂。In the process of manufacturing copper foil and preparing the lithium secondary battery of Comparative Examples 1-6, bulging, wrinkling, or tearing of the copper foil occurred. On the other hand, during the production of the copper foil and the lithium secondary battery in Preparation Examples 1-6, no bulging, wrinkling, or tearing of the copper foil occurred.
具體地,在使用銅箔製造鋰二次電池的後續製程中,發生銅箔的隆起、皺紋或撕裂。Specifically, in the subsequent process of manufacturing a lithium secondary battery using copper foil, bulging, wrinkling, or tearing of the copper foil occurs.
比較例1,其中流速偏差高於5%且(220)平面的織構係數偏差[TCB(220)]高於0.52(發生皺紋)。Comparative Example 1, in which the flow velocity deviation is higher than 5% and the (220) plane texture coefficient deviation [TCB (220)] is higher than 0.52 (wrinkles occur).
比較例2,其中2-巰基噻唑啉的濃度小於1mg/L且抗拉強度小於29kgf/mm2 (發生皺紋)。Comparative Example 2, in which the concentration of 2-mercaptothiazoline is less than 1 mg/L and the tensile strength is less than 29 kgf/mm 2 (wrinkles occur).
比較例3,其中電解液中巰基噻唑啉(MTZ)的含量高於20mg/L且抗拉強度高於65kgf/mm2 (發生撕裂)。Comparative Example 3, in which the content of mercaptothiazoline (MTZ) in the electrolyte is higher than 20 mg/L and the tensile strength is higher than 65 kgf/mm 2 (tearing occurs).
比較例4,其中電解液中雙-3-磺丙基二硫化物(SPS)的含量小於2mg/L且粗糙度輪廓元素(Rsm)的平均寬度小於18μm(發生撕裂)。Comparative Example 4, in which the content of bis-3-sulfopropyl disulfide (SPS) in the electrolyte is less than 2 mg/L and the average width of the roughness profile element (Rsm) is less than 18 μm (tearing occurs).
比較例5,其中電解液中雙-3-磺丙基二硫化物(SPS)的含量高於21mg/L且粗糙度輪廓元素(Rsm)的平均寬度小於148μm(發生皺紋)。Comparative Example 5, in which the content of bis-3-sulfopropyl disulfide (SPS) in the electrolyte is higher than 21 mg/L and the average width of the roughness profile element (Rsm) is less than 148 μm (wrinkles occur).
比較例6,其中電解液中聚乙二醇(PEG)的含量小於50mg/L且最大高度粗糙度(Rmax)小於0.6μm(發生隆起)。Comparative Example 6, in which the content of polyethylene glycol (PEG) in the electrolyte is less than 50 mg/L and the maximum height roughness (Rmax) is less than 0.6 μm (bulge occurs).
根據比較例1至6的銅箔不適用於鋰二次電池的陽極集電器。The copper foils according to Comparative Examples 1 to 6 are not suitable for the anode current collector of lithium secondary batteries.
另一方面,在根據本發明實施例的條件下製備的製備實施例1至6,在製造銅箔的過程中或者在使用銅箔製造鋰二次電池的過程中,可以避免銅箔的隆起、撕裂和皺紋。因此,根據本發明內容的實施例的銅箔具有優異的捲對卷(RTR)加工性,並且適用於鋰二次電池的陽極集電器。On the other hand, in the preparation examples 1 to 6 prepared under the conditions according to the examples of the present invention, in the process of manufacturing the copper foil or in the process of manufacturing the lithium secondary battery using the copper foil, the bulging of the copper foil, Torn and wrinkled. Therefore, the copper foil according to the embodiment of the present invention has excellent roll-to-roll (RTR) workability and is suitable for an anode current collector of a lithium secondary battery.
根據本發明的實施例的銅箔對隆起、皺紋或撕裂具有高度抗性。因此,根據本發明的實施例,在製造銅箔的過程中或在使用銅箔製造二次電池的過程中,防止出現隆起、皺紋或撕裂。根據本發明的實施例的銅箔具有優異的卷對卷(RTR)加工性。The copper foil according to the embodiment of the present invention is highly resistant to bumps, wrinkles, or tears. Therefore, according to the embodiments of the present invention, during the manufacturing of the copper foil or during the manufacturing of the secondary battery using the copper foil, the occurrence of ridges, wrinkles, or tears is prevented. The copper foil according to the embodiment of the present invention has excellent roll-to-roll (RTR) workability.
另外,根據本發明的另一個實施例,防止銅箔發生隆起、皺紋或撕裂,或者可以製造用於二次電池的電極。In addition, according to another embodiment of the present invention, the copper foil is prevented from being raised, wrinkled, or torn, or an electrode for a secondary battery can be manufactured.
對於本領域技術人員顯而易見的是,上述本發明不限於上述實施例和圖式。並且,在不脫離本發明的精神和範圍的情況下,可以在本發明中進行各種替換、修改和變化。因此,本發明的範圍由所附申請專利範圍限定,並且旨在從申請專利範圍的含義、範圍和等同概念得出的所有變化和修改都落入本發明的範圍內。It is obvious to those skilled in the art that the above-mentioned present invention is not limited to the above-mentioned embodiments and drawings. Moreover, various substitutions, modifications, and changes can be made in the present invention without departing from the spirit and scope of the present invention. Therefore, the scope of the present invention is defined by the scope of the attached patent application, and it is intended that all changes and modifications derived from the meaning, scope, and equivalent concepts of the scope of the patent application fall within the scope of the present invention.
10‧‧‧電解槽11‧‧‧電解液12‧‧‧旋轉電極滾筒13‧‧‧電極板20‧‧‧清潔槽30‧‧‧防腐槽31‧‧‧防腐液40‧‧‧清潔槽100‧‧‧銅箔110‧‧‧銅層200‧‧‧銅箔210‧‧‧防腐薄膜220‧‧‧防腐薄膜300‧‧‧電極310‧‧‧活性材料層320‧‧‧活性材料層340‧‧‧陽極341‧‧‧陽極集電器342‧‧‧活性材料層350‧‧‧電解液360‧‧‧隔離膜370‧‧‧陰極371‧‧‧陰極集電器372‧‧‧陰極活性材料層400‧‧‧電極410‧‧‧聚合物膜500‧‧‧二次電池600‧‧‧可撓性銅箔層壓薄膜10‧‧‧
圖1是示出根據本發明的實施例的銅箔的示意性截面圖。 圖2A顯示了銅箔的XRD圖的實施例。 圖2B是示出粗糙度輪廓元素的圖表。 圖3是示出根據本發明另一實施例的銅箔的示意性截面圖。 圖4是示出根據本發明另一實施例的用於二次電池的電極的示意性截面圖。 圖5是示出根據本發明另一實施例的用於二次電池的電極的示意性截面圖。 圖6是示出根據本發明另一實施例的二次電池的示意性截面圖。 圖7是示出根據本發明另一實施例的可撓性銅箔層壓膜的截面圖。 圖8是說明圖3所示的銅箔的製造方法的示意圖。 圖9是顯示銅箔中出現隆起的圖像。 圖10是顯示銅箔中皺紋的圖像。FIG. 1 is a schematic cross-sectional view showing a copper foil according to an embodiment of the present invention. FIG. 2A shows an example of the XRD pattern of copper foil. FIG. 2B is a graph showing roughness contour elements. 3 is a schematic cross-sectional view showing a copper foil according to another embodiment of the present invention. 4 is a schematic cross-sectional view showing an electrode for a secondary battery according to another embodiment of the present invention. 5 is a schematic cross-sectional view showing an electrode for a secondary battery according to another embodiment of the present invention. 6 is a schematic cross-sectional view showing a secondary battery according to another embodiment of the present invention. 7 is a cross-sectional view showing a flexible copper foil laminate film according to another embodiment of the present invention. 8 is a schematic diagram illustrating the method of manufacturing the copper foil shown in FIG. 3. Fig. 9 is an image showing that bumps appear in the copper foil. FIG. 10 is an image showing wrinkles in copper foil.
100‧‧‧銅箔 100‧‧‧Copper foil
110‧‧‧銅層 110‧‧‧copper layer
210‧‧‧防腐薄膜 210‧‧‧Anti-corrosion film
Claims (13)
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| TW107128045A TWI679311B (en) | 2018-08-10 | 2018-08-10 | Copper foil with minimized bagginess, wrinkle or tear, electrode including the same, secondary battery including the same and method for manufacturing the same |
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| US12132227B2 (en) | 2021-01-19 | 2024-10-29 | Lg Energy Solution, Ltd. | Battery, and battery pack and vehicle comprising the same |
| KR102437061B1 (en) | 2021-01-19 | 2022-08-26 | 주식회사 엘지에너지솔루션 | Cylindrical secondary battery cell, and battery pack and vehicle including the same |
| US12199247B2 (en) | 2021-02-19 | 2025-01-14 | Lg Energy Solution, Ltd. | Battery and current collector applied thereto, and battery pack and vehicle including the same |
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| KR102725501B1 (en) * | 2017-01-13 | 2024-11-01 | 에스케이넥실리스 주식회사 | Electrolytic Copper Foil Substantially Free Of Wrinkle Problem, Electrode Comprising The Same, Secondary Battery Comprising The Same, and Method for Manufacturing The Same |
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