TW201932906A - Projection optical system, exposure apparatus, and method of manufacturing article capable of correcting magnification and astigmatism with high precision - Google Patents
Projection optical system, exposure apparatus, and method of manufacturing article capable of correcting magnification and astigmatism with high precision Download PDFInfo
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- 230000003287 optical effect Effects 0.000 title claims abstract description 217
- 201000009310 astigmatism Diseases 0.000 title claims description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 27
- 238000005286 illumination Methods 0.000 claims description 9
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- 230000008569 process Effects 0.000 description 11
- 230000006870 function Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000012937 correction Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
本發明涉及投影光學系統、曝光裝置以及物品之製造方法。The present invention relates to a projection optical system, an exposure device, and a method for manufacturing an article.
半導體裝置、平板顯示器(FPD)等裝置是經由光刻程序製造的。光刻程序包括將遮罩或者倍縮光罩(原版)的圖案投影到塗敷有抗蝕層(感光劑)的玻璃板、晶圓等基板並對上述基板進行曝光的曝光程序。在FPD的製造中，一般使用具有包括反射鏡的投影光學系統(所謂Offner光學系統)的曝光裝置。
在曝光裝置中，透過多個光刻程序在基板上重疊形成多個圖案。因此，對基板上的圖案高精度地重疊遮罩的圖案而對基板進行曝光變得重要。但是，有時由於經過多個光刻程序使得遮罩、基板發生伸縮而在基板上的圖案與遮罩的圖案之間產生倍率誤差。在該情況下，在基板上重疊形成多個圖案時，在多個圖案之間產生重疊誤差。
因此，在日本特許第5595001號公報中提出了能夠在抑制像散的發生的同時校正這樣的倍率誤差的投影光學系統。另外，在日本特許第4547714號公報中還提出了能夠在實質上抑制副作用的同時校正像散的投影光學系統。Devices such as semiconductor devices and flat panel displays (FPDs) are manufactured through a photolithography process. The photolithography process includes an exposure process of projecting a pattern of a mask or a reduction mask (original plate) onto a substrate such as a glass plate or a wafer coated with a resist (photosensitive agent) and exposing the substrate. In the production of FPD, an exposure device having a projection optical system (a so-called Offner optical system) including a mirror is generally used.
In an exposure apparatus, a plurality of patterns are formed on a substrate through a plurality of photolithography processes. Therefore, it becomes important to superimpose the pattern of the mask on the pattern on the substrate with high accuracy and expose the substrate. However, a magnification error may occur between the pattern on the substrate and the pattern of the mask due to expansion and contraction of the mask and the substrate through a plurality of photolithography processes. In this case, when a plurality of patterns are overlapped and formed on the substrate, an overlap error occurs between the plurality of patterns.
Therefore, Japanese Patent No. 5995001 proposes a projection optical system capable of correcting such a magnification error while suppressing the occurrence of astigmatism. In addition, Japanese Patent No. 4547714 also proposes a projection optical system capable of correcting astigmatism while substantially suppressing side effects.
然而，日本特許第5595001號公報公開的投影光學系統雖然能夠抑制校正倍率的方向(例如縱橫方向)上的像散的發生，但無法校正相對於校正倍率的方向傾斜的方向上的像散。另外，日本特許第4547714號公報公開的投影光學系統並非Offner光學系統而是2次成像系統，所以導致光學系統以及具有該光學系統的曝光裝置的大型化、裝置佔用面積(Footprint)的擴大等。在曝光裝置所使用的投影光學系統中，要求不使光學系統大型化，而能夠高精度地校正倍率、像散。
本發明提供對於校正倍率、像散有利的投影光學系統。
作為本發明的一個方案的投影光學系統，將來自物面的光按照第1平面鏡、第1凹面鏡、凸面鏡、第2凹面鏡、第2平面鏡的順序反射而成像於像面，前述投影光學系統具有：第1光學系統，配置於前述物面與前述第1平面鏡之間，校正與被定義為鉛直方向的第1方向正交的第2方向上的前述投影光學系統的倍率；以及第2光學系統，配置於前述第2平面鏡與前述像面之間，校正與前述第1方向及前述第2方向正交的第3方向上的前述投影光學系統的倍率，前述第1光學系統包括沿著前述第1方向排列的在前述第2方向以及前述第3方向上具有不同的折光率(power)的第1透鏡以及第2透鏡，前述第2光學系統包括沿著前述第1方向排列的在前述第2方向以及前述第3方向上具有不同的折光率的第3透鏡以及第4透鏡，前述投影光學系統還具有：第1旋轉部，使前述第1透鏡及前述第2透鏡的一方繞與前述第1方向平行的第1軸旋轉；以及第2旋轉部，使前述第3透鏡及前述第4透鏡的一方繞與前述第1方向平行的第2軸旋轉。
本發明的進一步的目的或者其他方案透過以下參照附圖說明的優選的實施方式將變得更加明確。
根據本發明，例如，能夠提供對於校正倍率、像散而有利的投影光學系統。However, although the projection optical system disclosed in Japanese Patent No. 5995001 can suppress the occurrence of astigmatism in a direction (for example, the vertical and horizontal directions) of correction magnification, it cannot correct the astigmatism in a direction inclined with respect to the direction of the correction magnification. In addition, the projection optical system disclosed in Japanese Patent No. 4547714 is not a Offner optical system, but a secondary imaging system, which leads to an increase in the size of the optical system and an exposure apparatus having the optical system, an expansion of a device footprint, and the like. The projection optical system used in the exposure apparatus is required to be able to correct magnification and astigmatism with high accuracy without making the optical system large.
The invention provides a projection optical system which is advantageous for correcting magnification and astigmatism.
As a projection optical system according to one aspect of the present invention, the light from the object surface is reflected on the image plane in order of the first plane mirror, the first concave mirror, the convex mirror, the second concave mirror, and the second plane mirror, and the projection optical system includes: A first optical system disposed between the object plane and the first plane mirror, correcting the magnification of the projection optical system in a second direction orthogonal to the first direction defined as a vertical direction; and a second optical system, The magnification of the projection optical system in a third direction orthogonal to the first direction and the second direction is arranged between the second plane mirror and the image plane, and the first optical system includes The first lens and the second lens having different refractive powers in the second direction and the third direction are arranged in a direction, and the second optical system includes the first lens and the second direction arranged along the first direction. And the third lens and the fourth lens having different refractive indices in the third direction, the projection optical system further includes a first rotation unit for the first lens and the second lens One about the first axis of rotation parallel to the first direction; and a second rotating portion, so that one of the third lens and the fourth lens about a second axis parallel to the first direction.
Further objects or other aspects of the present invention will become clearer through the preferred embodiments described below with reference to the accompanying drawings.
According to the present invention, for example, it is possible to provide a projection optical system that is advantageous for correcting magnification and astigmatism.
以下，參照圖式，說明本發明的優選的實施方式。此外，在各圖中，對同一構材附加同一參照編號，省略重複的說明。
＜第1實施方式＞
圖1是示出第1實施方式中的曝光裝置EX的結構的概略圖。曝光裝置EX是在作為半導體裝置、平板顯示器(FPD)的製造程序的光刻程序中使用的光刻裝置。曝光裝置EX例如是同步地掃描遮罩9(原版)和基板17而將形成於遮罩9的圖案轉印到基板17的掃描型的曝光裝置(掃描器)。
曝光裝置EX如圖1所示，具有照明光學系統IL、投影光學系統PO以及控制部CU。另外，曝光裝置EX具有：遮罩載台(未圖示)，其能夠以保持配置於投影光學系統PO的物面OP的遮罩9的方式移動；以及基板載台(未圖示)，其能夠以保持配置於投影光學系統PO的像面IP的基板17的方式移動。此外，在本實施方式中，將Z軸(的負方向)定義為鉛直方向，對與Z軸正交並且相互正交的方向定義X軸以及Y軸。在本實施方式中，Y方向是掃描方向，X方向是與掃描方向正交的方向。
控制部CU例如由包括CPU、記憶體等的計算機(資訊處理裝置)構成，依照記憶於記憶部(未圖示)的程式，總括地控制曝光裝置EX的各部分。控制部CU控制對基板17進行曝光的曝光處理以及與曝光處理關聯的各種處理。
照明光學系統IL例如包括第1聚焦透鏡3、蠅眼透鏡4、第2聚焦透鏡5、狹縫界定構材6、成像光學系統7以及平面鏡8，用來自光源LS的光對遮罩9進行照明。光源LS例如包括水銀燈1和橢圓鏡2。狹縫界定構材6界定遮罩9的照明範圍(即對遮罩9進行照明的狹縫光的剖面形狀)。成像光學系統7配置成使由狹縫界定構材6界定的狹縫成像於物面OP。平面鏡8在照明光學系統IL中使光路徑折彎。
投影光學系統PO將遮罩9的圖案投影到基板17並對基板17進行曝光。投影光學系統PO雖然也可以由等倍成像光學系統、放大成像光學系統以及縮小成像光學系統中的任意光學系統構成，但在本實施方式中，構成為等倍成像光學系統。另外，投影光學系統PO在物面側以及像面側主光線為平行的。換言之，投影光學系統PO在物面OP以及像面IP是遠心的。
投影光學系統PO在從物面OP至像面IP的光路徑中，包括從物面側起依次配置的第1平面鏡11、第1凹面鏡12、凸面鏡13、第2凹面鏡14以及第2平面鏡15。投影光學系統PO使來自物面OP的光按照第1平面鏡11、第1凹面鏡12、凸面鏡13、第2凹面鏡14、第2平面鏡15的順序反射而成像於像面IP。
在投影光學系統PO中，物面OP與第1平面鏡11之間的光路徑、和第2平面鏡15與像面IP之間的光路徑平行。另外，包括第1平面鏡11的反射面的平面、和包括第2平面鏡15的反射面的平面成90度角度。在本實施方式中，第1平面鏡11和第2平面鏡15分體地構成，但也可以第1平面鏡11和第2平面鏡15一體地構成。同樣地，在本實施方式中，第1凹面鏡12和第2凹面鏡14分體地構成，但也可以第1凹面鏡12和第2凹面鏡14一體地構成。
投影光學系統PO如圖1所示，包括配置於物面OP與第1平面鏡11之間的光路徑的第1透鏡群10。第1透鏡群10是校正沿著物面OP與第1平面鏡11之間的光路徑的方向上，即與被定義為鉛直方向的第1方向(Z方向)正交的第2方向(Y方向)上的投影光學系統OP的倍率的第1光學系統。第1透鏡群10作為沿著第1方向排列的在第2方向以及第3方向上具有不同的折光率(power)的第1透鏡以及第2透鏡而包括柱面透鏡10a以及柱面透鏡10b。如圖2A所示，柱面透鏡10a包括在Y方向上具有曲率的凸柱面，柱面透鏡10b包括在Y方向上具有曲率的凹柱面。柱面透鏡10a和柱面透鏡10b被配置成在Z方向上隔開間隔、並且能夠變更Z方向的間隔。另外，柱面透鏡10a和柱面透鏡10b是將使各個柱面平行地相向的狀態(相互具有的折光率的方向一致的狀態)作為基準狀態來配置的。
另外，投影光學系統PO如圖1所示，包括配置於第2平面鏡15與像面IP之間的光路徑的第2透鏡群16。第2透鏡群16是校正沿著第2平面鏡15與像面IP之間的光路徑的方向上，即與被定義為鉛直方向的第1方向(Z方向)以及第2方向(Y方向)正交的第3方向(X方向)上的投影光學系統OP的倍率的第2光學系統。第2透鏡群16作為沿著第1方向排列的在第2方向以及第3方向上具有不同的折光率的第3透鏡以及第4透鏡，包括柱面透鏡16a以及柱面透鏡16b。如圖2B所示，柱面透鏡16a包括在X方向上具有曲率的凸柱面，柱面透鏡16b包括在X方向上具有曲率的凹柱面。柱面透鏡16a和柱面透鏡16b被配置成在Z方向上隔開間隔、並且能夠變更Z方向的間隔。另外，柱面透鏡16a和柱面透鏡16b是將使各個柱面平行地相向的狀態(相互具有的折光率的方向一致的狀態)作為基準狀態來配置的。
投影光學系統PO包括實現為了透過第1透鏡群10校正投影光學系統PO的Y方向的倍率而變更柱面透鏡10a和柱面透鏡10b在Z方向上的間隔的功能的第1驅動機構40。第1驅動機構40為了變更柱面透鏡10a和柱面透鏡10b在Z方向上的間隔，使柱面透鏡10a以及10b的一方在Z方向上移動。
另外，投影光學系統PO包括實現為了透過第2透鏡群16校正投影光學系統PO的X方向的倍率而變更柱面透鏡16a與柱面透鏡16b在Z方向上的間隔的功能的第2驅動機構50。第2驅動機構50為了變更柱面透鏡16a與柱面透鏡16b在Z方向上的間隔，使柱面透鏡16a以及16b的一方在Z方向上移動。
在本實施方式中，透過第1透鏡群10校正投影光學系統PO的X方向的倍率，透過第2透鏡群16校正投影光學系統PO的Y方向的倍率，但不限定於此。具體而言，也可以透過第1透鏡群10校正投影光學系統PO的Y方向的倍率，透過第2透鏡群16校正投影光學系統PO的X方向的倍率。在該情況下，只要第1透鏡群10包括圖2B所示的柱面透鏡16a以及16b，第2透鏡群16包括圖2A所示的柱面透鏡10a以及10b即可。
本實施方式構成為能夠使柱面透鏡10a以及10b的一方以及柱面透鏡16a以及16b的一方旋轉，以使得能夠使用第1透鏡群10以及第2透鏡群16校正投影光學系統PO的像散。在本實施方式中，用第1驅動機構40實現使柱面透鏡10a以及10b的一方旋轉的功能，用第2驅動機構50實現使柱面透鏡16a以及16b的一方旋轉的功能。具體而言，第1驅動機構40(第1旋轉部)如圖2A所示，使柱面透鏡10a以及10b的一方繞與Z方向(物面OP與第1平面鏡11之間的光路徑)平行的第1軸旋轉。另外，第2驅動機構50(第2旋轉部)如圖2B所示，使柱面透鏡16a以及16b的一方繞與Z方向(第2平面鏡15與像面IP之間的光路徑)平行的第2軸旋轉。此外，在本實施方式中，用第1驅動機構40使柱面透鏡10a以及10b的一方旋轉，用第2驅動機構50使柱面透鏡16a以及16b的一方旋轉，但不限定於此。也可以與第1驅動機構40區別地設置使柱面透鏡10a以及10b的一方旋轉的第1旋轉部，與第2驅動機構50區別地設置使柱面透鏡16a以及16b的一方旋轉的第2旋轉部。
例如，在使柱面透鏡10a以及10b中的柱面透鏡10a繞與Z方向平行的第1軸旋轉時，在與X方向以及Y方向不同的第4方向(傾斜45度方向)上發生曲率成分。由此，如圖3A所示，發生第4方向的倍率成分、第4方向的像散以及與XY平面內的第4方向正交的第5方向(傾斜135度方向)的像散成分。另外，在使柱面透鏡16a以及16b中的柱面透鏡16a繞與Z方向平行的第2軸旋轉時，如圖3B所示，發生第4方向的倍率成分、第4方向的像散以及第5方向的像散成分。
投影光學系統PO在本實施方式中是以凸面鏡13為中心而對稱的光學系統。因此，透過將物面附近以及像面附近的處於對稱的關係的光學系統，即柱面透鏡驅動到對稱的位置，畸變成分被相互的柱面透鏡抵消。另外，在將旋轉的柱面透鏡的柱面的曲率的方向從X方向變更為Y方向時，透過使上述柱面透鏡旋轉而發生的倍率成分以及像散成分的正負發生反轉。進而，在將旋轉的柱面透鏡的柱面的形狀從凸變更為凹時，透過使上述柱面透鏡旋轉而發生的倍率成分以及像散成分的正負發生反轉。
因此，在本實施方式中，使包括在X方向上具有曲率的凸柱面的柱面透鏡10a繞第1軸順時針旋轉，使包括在Y方向上具有曲率的凸柱面的柱面透鏡16a繞第2軸順時針旋轉。由此，如圖3C所示，能夠一邊抑制倍率成分的發生，一邊使得發生傾斜45度方向的像散成分(從第2方向(Y方向)以及第3方向(X方向)旋轉了45度的方向的像散)。
因此，能夠用控制部CU控制第1驅動機構40以及第2驅動機構50(所驅動的柱面透鏡10a以及16a的旋轉)，以使得透過校正投影光學系統PO的倍率而產生的投影光學系統PO的像散抵消。例如，求出為了抵消透過將投影光學系統PO的倍率校正為目標值而產生的像散所需的柱面透鏡10a以及16a各自的旋轉量，根據上述旋轉量，控制第1驅動機構40以及第2驅動機構50。此時，使柱面透鏡10a和柱面透鏡16a同時旋轉即可。由此，能夠高精度地校正投影光學系統PO的倍率、像散。
另外，在本實施方式中，使包括在X方向上具有曲率的凸柱面的柱面透鏡10a、以及包括在Y方向上具有曲率的凸柱面的柱面透鏡16a旋轉，但不限定於此。如上所述，即使使包括在X方向上具有曲率的凹柱面的柱面透鏡10b、以及包括在Y方向上具有曲率的凹柱面的柱面透鏡16b旋轉，透過使旋轉方向成為逆時針從而得到同樣的效果。
進而，成為使柱面透鏡10a以及10b的一方旋轉的軸的第1軸、和成為使柱面透鏡16a以及16b的一方旋轉的軸的第2軸在同一直線上存在即可。由此，能夠進一步抑制透過使柱面透鏡10a以及10b的一方以及柱面透鏡16a以及16b的一方旋轉而發生的倍率成分。
另外，在本實施方式中，設想用致動器等驅動機構使柱面透鏡10a以及10b的一方、柱面透鏡16a以及16b的一方旋轉的情況而進行了說明，但不限定於此。例如，也可以以使透過校正投影光學系統PO的倍率而產生的投影光學系統PO的像散抵消的方式，按照使柱面透鏡10a以及10b的一方、柱面透鏡16a以及16b的一方從基準狀態旋轉的狀態配置。換言之，這樣的狀態的投影光學系統、具有該投影光學系統的曝光裝置也構成本發明的一個方案。此外，在該情況下，為了按照使柱面透鏡10a以及10b的一方、柱面透鏡16a以及16b的一方從基準狀態旋轉的狀態固定，使用螺釘、黏接劑等固定構材即可。
＜第2實施方式＞
參照圖4，說明第2實施方式中的曝光裝置。第2實施方式中的曝光裝置相比於第1實施方式中的曝光裝置EX，投影光學系統PO的結構不同。圖4是示出本實施方式中的投影光學系統PO的結構的概略圖。
在本實施方式中，投影光學系統PO在從物面OP至像面IP的光路徑中包括從物面側依次配置的第1平面鏡22、第1凹面鏡23、凸面鏡24、第2凹面鏡25以及第2平面鏡26。投影光學系統PO將來自物面OP的光按照第1平面鏡22、第1凹面鏡23、凸面鏡24、第2凹面鏡25、第2平面鏡26的順序反射而成像於像面IP。
在投影光學系統PO中，物面OP與第1平面鏡22之間的光路徑、和第2平面鏡26與像面IP之間的光路徑是平行的。另外，包括第1平面鏡22的反射面的平面、和包括第2平面鏡26的反射面的平面成90度的角度。在本實施方式中，第1平面鏡22和第2平面鏡26分體地構成，但第1平面鏡22和第2平面鏡26也可以一體地構成。同樣地，在本實施方式中，第1凹面鏡23和第2凹面鏡25分體地構成，但第1凹面鏡23和第2凹面鏡25也可以一體地構成。
投影光學系統PO如圖4所示包括配置於物面OP與第1平面鏡22之間的光路徑的第1透鏡群21。第1透鏡群21是校正沿著物面OP與第1平面鏡22之間的光路徑的方向上，即與被定義為鉛直方向的第1方向(Z方向)正交的第2方向(Y方向)上的投影光學系統OP的倍率的第1光學系統。第1透鏡群21作為沿著第1方向排列的在第2方向以及第3方向上具有不同的折光率的第1透鏡以及第2透鏡而包括柱面透鏡21a以及柱面透鏡21b。柱面透鏡21a包括在Y方向上具有曲率的凸柱面，柱面透鏡21b包括在Y方向上具有曲率的凹柱面。柱面透鏡21a和柱面透鏡21b被配置成在Z方向上隔開間隔、並且能夠變更Z方向的間隔。另外，柱面透鏡21a和柱面透鏡21b是將使各個柱面平行地相向的狀態(相互具有的折光率的方向一致的狀態)作為基準狀態來配置的。
另外，投影光學系統PO如圖4所示包括配置於第2平面鏡26與像面IP之間的光路徑的第2透鏡群28。第2透鏡群28是校正與被定義為鉛直方向的第1方向(Z方向)以及第2方向(Y方向)正交的第3方向(X方向)上的投影光學系統OP的倍率的第2光學系統。第2透鏡群28作為沿著第1方向排列的在第2方向以及第3方向上具有不同的折光率的第3透鏡以及第4透鏡包括柱面透鏡28a以及柱面透鏡28b。柱面透鏡28a包括在X方向上具有曲率的凸柱面，柱面透鏡28b包括在X方向上具有曲率的凹柱面。柱面透鏡28a和柱面透鏡28b被配置成在Z方向上隔開間隔、並且能夠變更Z方向的間隔。另外，柱面透鏡28a和柱面透鏡28b是將使各個柱面平行地相向的狀態(相互具有的折光率的方向一致的狀態)作為基準狀態來配置的。
進而，投影光學系統PO如圖4所示包括配置於第2平面鏡26與像面IP之間的光路徑、詳細而言第2平面鏡26與第2透鏡群28之間的光路徑的第3透鏡群27。此外，第3透鏡群27也可以配置於物面IP與第1平面鏡21之間的光路徑。第3透鏡群27是在第2方向(Y方向)以及第3方向(X方向)上以同一倍率(各向同性倍率)校正投影光學系統PO的倍率的第3光學系統。第3透鏡群27包括被配置成在Z方向上隔開間隔並且能夠變更Z方向的間隔的平凸透鏡27a以及平凹透鏡27b。另外，平凸透鏡27a和平凹透鏡27b以使各個球面平行地相向的狀態配置。
投影光學系統PO包括實現為了透過第1透鏡群21校正投影光學系統PO的Y方向的倍率而變更柱面透鏡21a和柱面透鏡21b在Z方向上的間隔的功能的第1驅動機構60。第1驅動機構60為了變更柱面透鏡21a和柱面透鏡21b在Z方向上的間隔，使柱面透鏡21a以及21b的一方在Z方向上移動。另外，第1驅動機構60在本實施方式中還具有使柱面透鏡21a以及21b的一方繞與Z方向(物面OP與第1平面鏡22之間的光路徑)平行的第1軸旋轉的功能。
另外，投影光學系統PO包括實現為了透過第2透鏡群28校正投影光學系統PO的X方向的倍率而變更柱面透鏡28a與柱面透鏡28b在Z方向上的間隔的功能的第2驅動機構70。第2驅動機構70為了變更柱面透鏡28a與柱面透鏡28b在Z方向上的間隔，使柱面透鏡28a以及28b的一方在Z方向上移動。另外，第2驅動機構70在本實施方式中還具有使柱面透鏡28a以及28b的一方繞與Z方向(第2平面鏡26與像面IP之間的光路徑)平行的第2軸旋轉的功能。
進而，投影光學系統PO包括實現為了透過第3透鏡群27校正投影光學系統PO的X方向以及Y方向的倍率而變更平凸透鏡27a與平凹透鏡27b在Z方向上的間隔的功能的第3驅動機構80。第3驅動機構80為了變更平凸透鏡27a與平凹透鏡27b在Z方向上的間隔，使平凸透鏡27a以及27b的一方在Z方向上移動。
圖5是示出在驅動構成第1透鏡群21、第2透鏡群28以及第3透鏡群27的各個透鏡群的各透鏡時發生的像散以及倍率成分的發生量的圖。如圖5所示，在第1透鏡群21中，在變更柱面透鏡21a與柱面透鏡21b在Z方向上的間隔時，在X方向和Y方向上發生像散量A，在Y方向上發生倍率成分量-D。另一方面，在使柱面透鏡21a以及21b的一方繞與Z方向平行的第1軸旋轉時，在傾斜45度方向和傾斜135度方向上發生像散量B，在傾斜45度方向上發生倍率成分量E，在傾斜135度方向上發生倍率成分量F。
另外，如圖5所示，在第2透鏡群28中，變更柱面透鏡28a與柱面透鏡28b在Z方向上的間隔時，在X方向和Y方向上發生像散量A，在X方向上發生倍率成分量-C。另一方面，在使柱面透鏡28a以及28b的一方繞與Z方向平行的第2軸旋轉時，在傾斜45度方向和傾斜135度方向上發生像散量B，在傾斜45度方向上發生倍率成分量-E，在傾斜135度方向上發生倍率成分量-F。
另外，如圖5所示，在第3透鏡群27中，變更平凸透鏡27a與平凹透鏡27b在Z方向上的間隔時，在X方向上發生倍率成分量-C，在Y方向上發生倍率成分量-D。
在此，說明使用第1透鏡群21、第2透鏡群28以及第3透鏡群27在X方向和Y方向上發生像散量2A的方法。首先，在第1透鏡群21中，以在X方向和Y方向上發生像散量A的方式，變更柱面透鏡21a與柱面透鏡21b在Z方向上的間隔。此時，作為在第1透鏡群21中發生的其他成分，在Y方向上發生倍率成分量-D。
接下來，在第2透鏡群28中，以在X方向和Y方向上發生像散量A的方式，變更柱面透鏡28a與柱面透鏡28b在Z方向上的間隔。此時，作為在第2透鏡群28中發生的其他成分，在X方向上發生倍率成分量-C。
接下來，在第3透鏡群27中，為了抵消在第1透鏡群21中發生的Y方向的倍率成分，以在Y方向上發生倍率成分量D的方式，變更平凸透鏡27a與平凹透鏡27b在Z方向上的間隔。此時，作為在第3透鏡群27中發生的其他成分，在X方向上發生倍率成分量C。因此，在第2透鏡群28中發生的X方向的倍率成分也能夠抵消。其結果，在X方向和Y方向上僅發生像散量2A。
接下來，說明使用第1透鏡群21以及第2透鏡群28在傾斜45度方向和傾斜135度方向上發生像散量2B的方法。首先，在第1透鏡群21中，以在傾斜45度方向和傾斜135度方向上發生像散量B的方式，使柱面透鏡21a以及21b的一方繞與Z方向平行的第1軸旋轉。此時，作為在第1透鏡群21中發生的其他成分，在傾斜45度方向上發生倍率成分量E，在傾斜135度方向上發生倍率成分量F。
接下來，在第2透鏡群28中，以在傾斜45度方向和傾斜135度方向上發生像散量B的方式，使柱面透鏡28a以及28b的一方繞與Z方向平行的第2軸旋轉。此時，作為在第2透鏡群28中發生的其他成分，在傾斜45度方向上發生倍率成分量-E，在傾斜135度方向上發生倍率成分量-F。因此，作為在第1透鏡群21以及第2透鏡群28的各個中發生的其他成分的傾斜45度方向的倍率成分以及傾斜135度的倍率成分被抵消，在傾斜45度方向和傾斜135度方向上僅發生像散量2B。
接下來，說明使用第1透鏡群21、第2透鏡群28以及第3透鏡群27在X方向上發生倍率成分量2C的方法。首先，在第2透鏡群28中，以在X方向上發生倍率成分量C的方式，變更柱面透鏡28a與柱面透鏡28b在Z方向上的間隔。此時，作為在第2透鏡群28中發生的其他成分，在X方向和Y方向上發生像散量-A。
接下來，在第3透鏡群27中，以在X方向上發生倍率成分量C的方式，變更平凸透鏡27a與平凹透鏡27b在Z方向上的間隔。此時，作為在第3透鏡群27中發生的其他成分，在Y方向上發生倍率成分量D。
接下來，在第1透鏡群21中，為了抵消在第3透鏡群27中發生的Y方向的倍率成分，以在Y方向上發生倍率成分量-D的方式，變更柱面透鏡21a與柱面透鏡21b在Z方向上的間隔。此時，作為在第1透鏡群21中發生的其他成分，在X方向和Y方向上發生像散量A。因此，殘存的X方向和Y方向的像散量-A也被抵消，僅發生X方向的倍率成分量2C。
接下來，說明使用第1透鏡群21、第2透鏡群28以及第3透鏡群27在Y方向上發生倍率成分量2D的方法。首先，在第1透鏡群21中，以在Y方向上發生倍率成分量D的方式，變更柱面透鏡21a與柱面透鏡21b在Z方向上的間隔。此時，作為在第1透鏡群21中發生的其他成分，在X方向和Y方向上發生像散量-A。
接下來，在第3透鏡群27中，以在X方向上發生倍率成分量D的方式，變更平凸透鏡27a與平凹透鏡27b在Z方向上的間隔。此時，作為在第3透鏡群27中發生的其他成分，在X方向上發生倍率成分量C。
接下來，在第2透鏡群28中，為了抵消在第3透鏡群27中發生的X方向的倍率成分，以在X方向上發生倍率成分量-C的方式，變更柱面透鏡28a與柱面透鏡28b在Z方向上的間隔。此時，作為在第2透鏡群28中發生的其他成分，在X方向和Y方向上發生像散量A。因此，殘存的X方向和Y方向的像散量-A也被抵消，僅發生Y方向的倍率成分量2D。
透過組合上述4個方法，能夠同時並且獨立地校正X方向和Y方向的像散成分、傾斜45度方向和傾斜135度方向的像散成分、X方向的倍率成分以及Y方向的倍率成分這4個成分(像差)。換言之，使用第1透鏡群21、第2透鏡群28以及第3透鏡群27，能夠使投影光學系統PO的倍率成為目標值、且使投影光學系統PO的像散成為目標值。具體而言，以使投影光學系統PO的倍率成為目標值、且使投影光學系統PO的像散成為目標值的方式，在控制部CU中控制第1透鏡群21、第2透鏡群28以及第3透鏡群27的各透鏡的驅動，即以下的(1)至(5)。
(1)柱面透鏡21a與柱面透鏡21b在Z方向上的間隔
(2)柱面透鏡28a與柱面透鏡28b在Z方向上的間隔
(3)平凸透鏡27a與平凹透鏡27b在Z方向上的間隔
(4)柱面透鏡21a以及21b的一方的旋轉角
(5)柱面透鏡28a以及28b的一方的旋轉角
以下，參照圖6，說明投影光學系統PO的像散的校正(調整)。如上所述，透過控制部CU總括地控制曝光裝置EX的各部分，進行投影光學系統PO的像散的校正。
在S602中，使用設置於曝光裝置EX的測量部(未圖示)，測量經由投影光學系統PO的多個圖案(X方向和Y方向、傾斜45度方向和傾斜135度方向)的焦點位置。
在S604中，根據S602中的測量結果，求出投影光學系統PO的像散。具體而言，根據在第1程序中測量出的X方向和Y方向的圖案的焦點位置差，求出X方向和Y方向的像散量，根據傾斜45度方向和傾斜135度方向的圖案的焦點位置差，求出傾斜45度方向和傾斜135度方向的像散量。
在S606中，判定在S604中求出的像散是否超過預先設定的容許值。當在S604中求出的像散未超過預先設定的容許值的情況下，結束投影光學系統PO的像散的校正。另一方面，當在S604中求出的像散超過預先設定的容許值的情況下，轉移到S608。
在S608中，根據在S604中求出的像散，求出第1透鏡群21、第2透鏡群27以及第3透鏡群28的各透鏡的驅動量以及旋轉量。具體而言，根據X方向和Y方向的像散量，求出柱面透鏡21a以及21b的一方的Z方向的驅動量、柱面透鏡28a以及28b的一方的Z方向的驅動量、以及平凸透鏡27a以及平凹透鏡27b的一方的Z方向的驅動量。另外，根據傾斜45度方向和傾斜135度方向的像散量，求出柱面透鏡21a以及21b的一方的旋轉量、以及柱面透鏡28a以及28b的一方的旋轉量。
在S610中，根據在S608中求出的驅動量以及旋轉量，進行第1透鏡群21、第2透鏡群27以及第3透鏡群38的各透鏡的驅動以及旋轉。然後，轉移到S602，再次測量經由投影光學系統PO的多個圖案的焦點位置，根據其測量結果，求出投影光學系統PO的像散(S604)，判定上述像散是否超過容許值(S606)。
這樣，根據第1實施方式以及第2實施方式，不會使投影光學系統PO大型化(是所謂Offner光學系統)而能夠高精度地校正倍率、像散。
本發明的實施方式中的物品之製造方法例如適合於製造設備(半導體元件、磁記憶媒體、液晶顯示元件等)等物品。上述製造方法包括：使用曝光裝置EX對塗敷有感光劑的基板進行曝光的程序；以及使曝光的基板顯影的程序。另外，上述製造方法能夠包括其他公知的程序(氧化、成膜、蒸鍍、摻雜、平坦化、蝕刻、抗蝕層剝離、切割、接合、封裝等)。本實施方式中的物品之製造方法相比於以往在物品的性能、質量、生產率以及生產成本的至少1個中更有利。
以上，說明了本發明的優選的實施方式，但本發明當然不限定於這些實施方式，能夠在其要旨的範圍內進行各種變形以及變更。例如，在本實施方式中，以第1透鏡群以及第2透鏡群包括柱面透鏡的情況為例子進行了說明，但第1透鏡群以及第2透鏡群也可以代替柱面透鏡而包括複曲面透鏡。Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. In the drawings, the same reference numerals are assigned to the same members, and redundant descriptions are omitted.
<First Embodiment>
FIG. 1 is a schematic diagram showing a configuration of an exposure apparatus EX in the first embodiment. The exposure apparatus EX is a lithography apparatus used in a lithography process which is a manufacturing process of a semiconductor device and a flat panel display (FPD). The exposure device EX is, for example, a scanning type exposure device (scanner) that scans the mask 9 (original plate) and the substrate 17 in synchronization and transfers the pattern formed on the mask 9 to the substrate 17.
As shown in FIG. 1, the exposure device EX includes an illumination optical system IL, a projection optical system PO, and a control unit CU. In addition, the exposure apparatus EX includes a mask stage (not shown) that can be moved to hold the mask 9 disposed on the object surface OP of the projection optical system PO, and a substrate stage (not shown) that It can move so that the board | substrate 17 arrange | positioned on the image plane IP of the projection optical system PO may be hold | maintained. In the present embodiment, the Z-axis (negative direction) is defined as a vertical direction, and the X-axis and Y-axis are defined for directions orthogonal to the Z-axis and mutually orthogonal to each other. In this embodiment, the Y direction is a scanning direction, and the X direction is a direction orthogonal to the scanning direction.
The control unit CU is composed of, for example, a computer (information processing device) including a CPU, a memory, and the like, and collectively controls each part of the exposure device EX in accordance with a program stored in a memory (not shown). The control unit CU controls an exposure process for exposing the substrate 17 and various processes related to the exposure process.
The illumination optical system IL includes, for example, a first focusing lens 3, a fly-eye lens 4, a second focusing lens 5, a slit defining member 6, an imaging optical system 7, and a flat mirror 8. The mask 9 is illuminated with light from the light source LS. . The light source LS includes, for example, a mercury lamp 1 and an elliptical mirror 2. The slit-defining member 6 defines the illumination range of the mask 9 (that is, the cross-sectional shape of the slit light that illuminates the mask 9). The imaging optical system 7 is configured to image a slit defined by the slit defining member 6 on the object plane OP. The plane mirror 8 bends a light path in the illumination optical system IL.
The projection optical system PO projects the pattern of the mask 9 onto the substrate 17 and exposes the substrate 17. Although the projection optical system PO may be configured by any optical system among the equal-magnification imaging optical system, the magnification-imaging optical system, and the reduction-magnification optical system, in this embodiment, it is configured as a multi-magnification optical system. In addition, the main optical rays of the projection optical system PO on the object plane side and the image plane side are parallel. In other words, the projection optical system PO is telecentric on the object plane OP and the image plane IP.
The projection optical system PO includes a first plane mirror 11, a first concave mirror 12, a convex mirror 13, a second concave mirror 14, and a second plane mirror 15 in the light path from the object plane OP to the image plane IP in this order. The projection optical system PO reflects light from the object plane OP in the order of the first plane mirror 11, the first concave mirror 12, the convex mirror 13, the second concave mirror 14, and the second plane mirror 15, and forms an image on the image plane IP.
In the projection optical system PO, a light path between the object plane OP and the first plane mirror 11 and a light path between the second plane mirror 15 and the image plane IP are parallel. The plane including the reflecting surface of the first plane mirror 11 and the plane including the reflecting surface of the second plane mirror 15 are at an angle of 90 degrees. In the present embodiment, the first plane mirror 11 and the second plane mirror 15 are separately formed, but the first plane mirror 11 and the second plane mirror 15 may be integrally formed. Similarly, in the present embodiment, the first concave mirror 12 and the second concave mirror 14 are separately formed, but the first concave mirror 12 and the second concave mirror 14 may be integrally formed.
As shown in FIG. 1, the projection optical system PO includes a first lens group 10 arranged in the light path between the object plane OP and the first plane mirror 11. The first lens group 10 is a second direction (Y direction) which is aligned in a direction along the light path between the object plane OP and the first plane mirror 11, that is, orthogonal to the first direction (Z direction) defined as the vertical direction. The first optical system of the magnification of the projection optical system OP on). The first lens group 10 includes a cylindrical lens 10 a and a cylindrical lens 10 b as the first lens and the second lens which are arranged along the first direction and have different refractive powers in the second direction and the third direction. As shown in FIG. 2A, the cylindrical lens 10a includes a convex cylindrical surface having a curvature in the Y direction, and the cylindrical lens 10b includes a concave cylindrical surface having a curvature in the Y direction. The cylindrical lens 10 a and the cylindrical lens 10 b are arranged at intervals in the Z direction, and the intervals in the Z direction can be changed. In addition, the cylindrical lens 10 a and the cylindrical lens 10 b are arranged with a state in which the respective cylindrical surfaces face each other in parallel (a state in which the directions of the refractive indices mutually have the same) as a reference state.
In addition, as shown in FIG. 1, the projection optical system PO includes a second lens group 16 arranged in a light path between the second plane mirror 15 and the image plane IP. The second lens group 16 corrects the direction along the optical path between the second plane mirror 15 and the image plane IP, that is, positively with the first direction (Z direction) and the second direction (Y direction) defined as the vertical direction. The second optical system of the magnification of the projection optical system OP in the intersecting third direction (X direction). The second lens group 16 includes a cylindrical lens 16 a and a cylindrical lens 16 b as the third lens and the fourth lens arranged along the first direction and having different refractive indices in the second direction and the third direction. As shown in FIG. 2B, the cylindrical lens 16 a includes a convex cylindrical surface having a curvature in the X direction, and the cylindrical lens 16 b includes a concave cylindrical surface having a curvature in the X direction. The cylindrical lens 16 a and the cylindrical lens 16 b are arranged at intervals in the Z direction, and the intervals in the Z direction can be changed. In addition, the cylindrical lens 16 a and the cylindrical lens 16 b are arranged with a state in which the respective cylindrical surfaces face each other in parallel (a state in which the directions of the refractive indices mutually have the same) as a reference state.
The projection optical system PO includes a first driving mechanism 40 that realizes a function of changing the interval between the cylindrical lens 10 a and the cylindrical lens 10 b in the Z direction in order to correct the magnification in the Y direction of the projection optical system PO through the first lens group 10. The first driving mechanism 40 moves one of the cylindrical lenses 10 a and 10 b in the Z direction in order to change the distance between the cylindrical lens 10 a and the cylindrical lens 10 b in the Z direction.
The projection optical system PO includes a second driving mechanism 50 that realizes a function of changing the interval between the cylindrical lens 16 a and the cylindrical lens 16 b in the Z direction in order to correct the magnification in the X direction of the projection optical system PO through the second lens group 16. . The second driving mechanism 50 moves one of the cylindrical lenses 16 a and 16 b in the Z direction in order to change the distance between the cylindrical lens 16 a and the cylindrical lens 16 b in the Z direction.
In the present embodiment, the magnification in the X direction of the projection optical system PO is corrected by the first lens group 10 and the magnification in the Y direction of the projection optical system PO is corrected by the second lens group 16, but it is not limited to this. Specifically, the magnification in the Y direction of the projection optical system PO may be corrected by the first lens group 10, and the magnification in the X direction of the projection optical system PO may be corrected by the second lens group 16. In this case, the first lens group 10 may include the cylindrical lenses 16 a and 16 b shown in FIG. 2B, and the second lens group 16 may include the cylindrical lenses 10 a and 10 b shown in FIG. 2A.
This embodiment is configured such that one of the cylindrical lenses 10 a and 10 b and one of the cylindrical lenses 16 a and 16 b can be rotated so that the astigmatism of the projection optical system PO can be corrected using the first lens group 10 and the second lens group 16. In this embodiment, the function of rotating one of the cylindrical lenses 10 a and 10 b is realized by the first driving mechanism 40, and the function of rotating one of the cylindrical lenses 16 a and 16 b is realized by the second driving mechanism 50. Specifically, as shown in FIG. 2A, the first driving mechanism 40 (the first rotating portion) makes one of the cylindrical lenses 10 a and 10 b parallel to the Z direction (the optical path between the object plane OP and the first plane mirror 11). The 1st axis rotates. In addition, as shown in FIG. 2B, the second driving mechanism 50 (second rotating portion) turns one of the cylindrical lenses 16a and 16b around the first parallel to the Z direction (the optical path between the second plane mirror 15 and the image plane IP). 2 axis rotation. In the present embodiment, one of the cylindrical lenses 10 a and 10 b is rotated by the first driving mechanism 40, and one of the cylindrical lenses 16 a and 16 b is rotated by the second driving mechanism 50, but the invention is not limited to this. A first rotation portion that rotates one of the cylindrical lenses 10 a and 10 b may be provided separately from the first driving mechanism 40, and a second rotation that rotates one of the cylindrical lenses 16 a and 16 b may be provided separately from the second driving mechanism 50. unit.
For example, when the cylindrical lens 10 a of the cylindrical lenses 10 a and 10 b is rotated about a first axis parallel to the Z direction, a curvature component occurs in a fourth direction (a 45-degree tilt direction) different from the X direction and the Y direction. . As a result, as shown in FIG. 3A, a magnification component in the fourth direction, astigmatism in the fourth direction, and astigmatism components in the fifth direction (a 135-degree tilt direction) orthogonal to the fourth direction in the XY plane are generated. In addition, when the cylindrical lens 16 a of the cylindrical lenses 16 a and 16 b is rotated about a second axis parallel to the Z direction, as shown in FIG. 3B, the magnification component in the fourth direction, the astigmatism in the fourth direction, and the first Astigmatism component in 5 directions.
The projection optical system PO in this embodiment is an optical system that is symmetrical around the convex mirror 13. Therefore, by driving an optical system in a symmetrical relationship near the object plane and the image plane, that is, the cylindrical lens is driven to a symmetrical position, the distortion components are cancelled by the mutual cylindrical lenses. In addition, when the direction of the curvature of the cylindrical surface of the rotating cylindrical lens is changed from the X direction to the Y direction, the sign of the magnification component and the astigmatism component generated by rotating the cylindrical lens is reversed. Furthermore, when the shape of the cylindrical surface of the rotating cylindrical lens is changed from convex to concave, the positive and negative components of the magnification component and the astigmatism component generated by rotating the cylindrical lens are reversed.
Therefore, in this embodiment, the cylindrical lens 10a including a convex cylindrical surface having a curvature in the X direction is rotated clockwise around the first axis, and the cylindrical lens 16a including a convex cylindrical surface having a curvature in the Y direction is rotated. Turn clockwise around the second axis. As a result, as shown in FIG. 3C, while suppressing the occurrence of the magnification component, it is possible to cause the astigmatism component (45 degrees rotated from the second direction (Y direction) and the third direction (X direction)) to be tilted by 45 degrees while generating the tilt Direction of astigmatism).
Therefore, the control unit CU can control the first driving mechanism 40 and the second driving mechanism 50 (the rotation of the driven cylindrical lenses 10a and 16a) so that the projection optical system PO generated by correcting the magnification of the projection optical system PO can be adjusted. Astigmatism cancels. For example, the respective rotation amounts of the cylindrical lenses 10a and 16a required to cancel the astigmatism generated by correcting the magnification of the projection optical system PO to a target value are obtained, and the first driving mechanism 40 and the first rotation mechanism are controlled based on the rotation amounts. 2Drive mechanism 50. At this time, the cylindrical lens 10a and the cylindrical lens 16a may be rotated simultaneously. This makes it possible to correct the magnification and astigmatism of the projection optical system PO with high accuracy.
In the present embodiment, the cylindrical lens 10 a including a convex cylindrical surface having a curvature in the X direction and the cylindrical lens 16 a including a convex cylindrical surface having a curvature in the Y direction are rotated, but it is not limited to this. . As described above, even if the cylindrical lens 10b including a concave cylindrical surface having a curvature in the X direction and the cylindrical lens 16b including a concave cylindrical surface having a curvature in the Y direction are rotated, the rotation direction is made counterclockwise by rotating Get the same effect.
Furthermore, the first axis that is an axis that rotates one of the cylindrical lenses 10a and 10b and the second axis that is an axis that rotates one of the cylindrical lenses 16a and 16b may exist on the same straight line. Accordingly, it is possible to further suppress a magnification component generated by rotating one of the cylindrical lenses 10 a and 10 b and one of the cylindrical lenses 16 a and 16 b.
In addition, in the present embodiment, a case where one of the cylindrical lenses 10 a and 10 b and one of the cylindrical lenses 16 a and 16 b are rotated by a driving mechanism such as an actuator has been described, but is not limited thereto. For example, the astigmatism of the projection optical system PO generated by correcting the magnification of the projection optical system PO may be canceled, so that one of the cylindrical lenses 10 a and 10 b and one of the cylindrical lenses 16 a and 16 b are removed from the reference state. Rotated status configuration. In other words, the projection optical system in such a state and the exposure apparatus having the projection optical system also constitute one aspect of the present invention. In this case, in order to fix the cylindrical lenses 10 a and 10 b and the cylindrical lenses 16 a and 16 b from the reference state, fixing members such as screws and adhesives may be used.
<Second Embodiment>
The exposure apparatus in the second embodiment will be described with reference to FIG. 4. The exposure apparatus in the second embodiment has a different configuration of the projection optical system PO than the exposure apparatus EX in the first embodiment. FIG. 4 is a schematic diagram showing a configuration of a projection optical system PO in the present embodiment.
In the present embodiment, the projection optical system PO includes a first plane mirror 22, a first concave mirror 23, a convex mirror 24, a second concave mirror 25, and a first light mirror arranged in this order from the object plane side in the light path from the object plane OP to the image plane IP. 2 平面 镜 26. The projection optical system PO reflects light from the object plane OP in the order of the first plane mirror 22, the first concave mirror 23, the convex mirror 24, the second concave mirror 25, and the second plane mirror 26, and forms an image on the image plane IP.
In the projection optical system PO, a light path between the object plane OP and the first plane mirror 22 and a light path between the second plane mirror 26 and the image plane IP are parallel. The plane including the reflecting surface of the first plane mirror 22 and the plane including the reflecting surface of the second plane mirror 26 are at an angle of 90 degrees. In the present embodiment, the first plane mirror 22 and the second plane mirror 26 are separately formed, but the first plane mirror 22 and the second plane mirror 26 may be integrally formed. Similarly, in the present embodiment, the first concave mirror 23 and the second concave mirror 25 are separately formed, but the first concave mirror 23 and the second concave mirror 25 may be integrally formed.
As shown in FIG. 4, the projection optical system PO includes a first lens group 21 arranged in the light path between the object plane OP and the first plane mirror 22. The first lens group 21 is a second direction (Y direction) which is aligned in a direction along the light path between the object plane OP and the first plane mirror 22, that is, orthogonal to the first direction (Z direction) defined as the vertical direction. The first optical system of the magnification of the projection optical system OP on). The first lens group 21 includes a cylindrical lens 21 a and a cylindrical lens 21 b as the first lens and the second lens arranged in the first direction and having different refractive indices in the second direction and the third direction. The cylindrical lens 21 a includes a convex cylindrical surface having a curvature in the Y direction, and the cylindrical lens 21 b includes a concave cylindrical surface having a curvature in the Y direction. The cylindrical lens 21 a and the cylindrical lens 21 b are arranged at intervals in the Z direction, and the intervals in the Z direction can be changed. In addition, the cylindrical lens 21 a and the cylindrical lens 21 b are arranged with a state in which the respective cylindrical surfaces face each other in parallel (a state in which the directions of the refractive indices mutually have the same) as a reference state.
In addition, as shown in FIG. 4, the projection optical system PO includes a second lens group 28 arranged in a light path between the second plane mirror 26 and the image plane IP. The second lens group 28 corrects the magnification of the projection optical system OP in a third direction (X direction) orthogonal to the first direction (Z direction) and the second direction (Y direction) defined as the vertical direction. Optical system. The second lens group 28 includes a cylindrical lens 28 a and a cylindrical lens 28 b as the third lens and the fourth lens which are arranged along the first direction and have different refractive indices in the second direction and the third direction. The cylindrical lens 28 a includes a convex cylindrical surface having a curvature in the X direction, and the cylindrical lens 28 b includes a concave cylindrical surface having a curvature in the X direction. The cylindrical lens 28 a and the cylindrical lens 28 b are arranged at intervals in the Z direction, and the intervals in the Z direction can be changed. In addition, the cylindrical lens 28 a and the cylindrical lens 28 b are arranged with a state in which the respective cylindrical surfaces face each other in parallel (a state in which the directions of the refractive indices mutually have the same) as a reference state.
Furthermore, as shown in FIG. 4, the projection optical system PO includes a third lens that is disposed between the second plane mirror 26 and the image plane IP, and specifically a light path between the second plane mirror 26 and the second lens group 28. Group 27. The third lens group 27 may be arranged in the light path between the object plane IP and the first plane mirror 21. The third lens group 27 is a third optical system that corrects the magnification of the projection optical system PO at the same magnification (isotropic magnification) in the second direction (Y direction) and the third direction (X direction). The third lens group 27 includes a plano-convex lens 27 a and a plano-concave lens 27 b arranged at intervals in the Z direction and capable of changing the interval in the Z direction. The plano-convex lens 27a and the plano-concave lens 27b are arranged in a state where the spherical surfaces face each other in parallel.
The projection optical system PO includes a first driving mechanism 60 that realizes a function of changing the interval between the cylindrical lens 21 a and the cylindrical lens 21 b in the Z direction in order to correct the magnification in the Y direction of the projection optical system PO through the first lens group 21. The first driving mechanism 60 moves one of the cylindrical lenses 21 a and 21 b in the Z direction in order to change the distance between the cylindrical lens 21 a and the cylindrical lens 21 b in the Z direction. The first driving mechanism 60 also has a function of rotating one of the cylindrical lenses 21 a and 21 b around a first axis parallel to the Z direction (the optical path between the object plane OP and the first plane mirror 22) in this embodiment. .
The projection optical system PO includes a second driving mechanism 70 that realizes a function of changing the interval between the cylindrical lens 28 a and the cylindrical lens 28 b in the Z direction in order to correct the magnification in the X direction of the projection optical system PO through the second lens group 28. . The second drive mechanism 70 moves one of the cylindrical lenses 28 a and 28 b in the Z direction in order to change the distance between the cylindrical lens 28 a and the cylindrical lens 28 b in the Z direction. The second driving mechanism 70 also has a function of rotating one of the cylindrical lenses 28 a and 28 b around a second axis parallel to the Z direction (the light path between the second plane mirror 26 and the image plane IP) in this embodiment. .
Furthermore, the projection optical system PO includes a third driving mechanism that realizes a function of changing the interval between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction in order to correct the magnifications in the X and Y directions of the projection optical system PO through the third lens group 27. 80. The third drive mechanism 80 moves one of the plano-convex lenses 27 a and 27 b in the Z direction in order to change the distance between the plano-convex lens 27 a and the plano-concave lens 27 b in the Z direction.
FIG. 5 is a diagram showing astigmatism and the amount of occurrence of magnification components that occur when each lens of each lens group constituting the first lens group 21, the second lens group 28, and the third lens group 27 is driven. As shown in FIG. 5, in the first lens group 21, when the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction is changed, an astigmatism amount A occurs in the X direction and the Y direction, and the Y direction is generated. Amount of magnification component -D. On the other hand, when one of the cylindrical lenses 21 a and 21 b is rotated about the first axis parallel to the Z direction, an astigmatism amount B occurs in a 45-degree tilt direction and a 135-degree tilt direction, and occurs in a 45-degree tilt direction. The magnification component amount E generates a magnification component amount F in a direction inclined at 135 degrees.
As shown in FIG. 5, in the second lens group 28, when the distance between the cylindrical lens 28 a and the cylindrical lens 28 b in the Z direction is changed, an astigmatism amount A occurs in the X direction and the Y direction, and the X direction The amount of magnification component -C occurs. On the other hand, when one of the cylindrical lenses 28 a and 28 b is rotated about a second axis parallel to the Z direction, an astigmatism amount B occurs in a 45-degree tilt direction and a 135-degree tilt direction, and occurs in a 45-degree tilt direction. The magnification component amount-E occurs in a 135-degree oblique direction.
As shown in FIG. 5, in the third lens group 27, when the distance between the plano-convex lens 27 a and the plano-concave lens 27 b in the Z direction is changed, the amount of magnification component -C occurs in the X direction, and the magnification component occurs in the Y direction.量 -D。 The amount -D.
Here, a method of using the first lens group 21, the second lens group 28, and the third lens group 27 to generate an astigmatism amount 2A in the X direction and the Y direction will be described. First, in the first lens group 21, the distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction is changed so that the astigmatism amount A occurs in the X and Y directions. At this time, as other components generated in the first lens group 21, a magnification component amount -D occurs in the Y direction.
Next, in the second lens group 28, the distance in the Z direction between the cylindrical lens 28a and the cylindrical lens 28b is changed so that the astigmatism amount A occurs in the X and Y directions. At this time, as another component generated in the second lens group 28, a magnification component amount -C is generated in the X direction.
Next, in the third lens group 27, the plano-convex lens 27a and the plano-concave lens 27b are changed so that the magnification component D in the Y direction occurs in order to cancel the magnification component in the Y direction generated in the first lens group 21. The interval in the Z direction. At this time, as the other components generated in the third lens group 27, a magnification component amount C is generated in the X direction. Therefore, the X-direction magnification component generated in the second lens group 28 can also be canceled. As a result, only the astigmatism amount 2A occurs in the X and Y directions.
Next, a method of generating the astigmatic amount 2B in the 45-degree tilt direction and the 135-degree tilt direction using the first lens group 21 and the second lens group 28 will be described. First, in the first lens group 21, one of the cylindrical lenses 21 a and 21 b is rotated about a first axis parallel to the Z direction so that the astigmatism amount B occurs in the 45-degree tilt direction and the 135-degree tilt direction. At this time, as the other components generated in the first lens group 21, a magnification component amount E occurs in a 45-degree oblique direction, and a magnification component amount F occurs in a 135-degree oblique direction.
Next, in the second lens group 28, one of the cylindrical lenses 28a and 28b is rotated around a second axis parallel to the Z direction so that the astigmatism amount B occurs in the 45-degree tilt direction and the 135-degree tilt direction. . At this time, as the other components generated in the second lens group 28, a magnification component amount -E occurs in a 45-degree oblique direction, and a magnification component amount -F occurs in a 135-degree oblique direction. Therefore, the magnification component of the 45-degree tilt direction and the magnification component of 135-degree tilt as other components that occur in each of the first lens group 21 and the second lens group 28 are canceled, and the 45-degree tilt direction and the 135-degree tilt direction are canceled. Only astigmatism amount 2B occurs.
Next, a method of generating a magnification component amount 2C in the X direction using the first lens group 21, the second lens group 28, and the third lens group 27 will be described. First, in the second lens group 28, the interval in the Z direction between the cylindrical lens 28a and the cylindrical lens 28b is changed so that the magnification component amount C occurs in the X direction. At this time, as other components occurring in the second lens group 28, astigmatism amount -A occurs in the X direction and the Y direction.
Next, in the third lens group 27, the interval in the Z direction between the plano-convex lens 27a and the plano-concave lens 27b is changed so that the magnification component amount C occurs in the X direction. At this time, as the other components generated in the third lens group 27, the magnification component amount D is generated in the Y direction.
Next, in the first lens group 21, the cylindrical lens 21a and the cylindrical surface are changed so that the magnification component amount -D occurs in the Y direction in order to cancel the magnification component in the Y direction generated in the third lens group 27. The interval of the lenses 21b in the Z direction. At this time, as other components occurring in the first lens group 21, the astigmatism amount A occurs in the X direction and the Y direction. Therefore, the residual astigmatism amount -A in the X direction and the Y direction is also canceled, and only the magnification component amount 2C in the X direction occurs.
Next, a method of generating a magnification component amount 2D in the Y direction using the first lens group 21, the second lens group 28, and the third lens group 27 will be described. First, in the first lens group 21, the interval in the Z direction between the cylindrical lens 21 a and the cylindrical lens 21 b is changed so that the magnification component amount D occurs in the Y direction. At this time, as other components occurring in the first lens group 21, an astigmatism amount -A occurs in the X direction and the Y direction.
Next, in the third lens group 27, the interval in the Z direction between the plano-convex lens 27a and the plano-concave lens 27b is changed so that the magnification component amount D occurs in the X direction. At this time, as the other components generated in the third lens group 27, a magnification component amount C is generated in the X direction.
Next, in the second lens group 28, the cylindrical lens 28a and the cylindrical surface are changed so that the magnification component amount -C occurs in the X direction in order to cancel the magnification component in the X direction generated in the third lens group 27. The interval of the lenses 28b in the Z direction. At this time, as other components occurring in the second lens group 28, an astigmatism amount A occurs in the X direction and the Y direction. Therefore, the residual astigmatism amount -A in the X direction and the Y direction is also cancelled, and only the magnification component amount 2D in the Y direction occurs.
By combining the above four methods, it is possible to simultaneously and independently correct astigmatism components in the X and Y directions, astigmatism components in the 45-degree and 135-degree directions, the magnification components in the X direction, and the magnification components in the Y direction Components (aberrations). In other words, using the first lens group 21, the second lens group 28, and the third lens group 27 can make the magnification of the projection optical system PO a target value and the astigmatism of the projection optical system PO a target value. Specifically, the control unit CU controls the first lens group 21, the second lens group 28, and the first lens group so that the magnification of the projection optical system PO becomes a target value and the astigmatism of the projection optical system PO becomes a target value. The driving of each lens of the three lens group 27 is (1) to (5) below.
(1) The distance between the cylindrical lens 21a and the cylindrical lens 21b in the Z direction
(2) The distance between the cylindrical lens 28a and the cylindrical lens 28b in the Z direction
(3) Space between the plano-convex lens 27a and the plano-concave lens 27b in the Z direction
(4) Rotation angle of one of the cylindrical lenses 21a and 21b
(5) Below the rotation angle of one of the cylindrical lenses 28a and 28b, the astigmatism correction (adjustment) of the projection optical system PO will be described with reference to FIG. 6. As described above, the astigmatism of the projection optical system PO is corrected by collectively controlling each part of the exposure device EX through the control unit CU.
In S602, a measurement unit (not shown) provided in the exposure device EX is used to measure the focal positions of a plurality of patterns (X and Y directions, 45-degree tilt direction, and 135-degree tilt direction) via the projection optical system PO.
In S604, the astigmatism of the projection optical system PO is obtained based on the measurement result in S602. Specifically, the amount of astigmatism in the X and Y directions is obtained from the focal position difference between the patterns in the X and Y directions measured in the first program. The focal position is poor, and the astigmatism amounts in the 45-degree tilt direction and the 135-degree tilt direction are obtained.
In S606, it is determined whether or not the astigmatism obtained in S604 exceeds a preset allowable value. When the astigmatism obtained in S604 does not exceed a preset allowable value, the astigmatism correction of the projection optical system PO is terminated. On the other hand, if the astigmatism obtained in S604 exceeds a preset allowable value, the process proceeds to S608.
In S608, the amount of driving and the amount of rotation of each lens of the first lens group 21, the second lens group 27, and the third lens group 28 are obtained from the astigmatism obtained in S604. Specifically, the amount of driving in the Z direction of one of the cylindrical lenses 21a and 21b, the amount of driving in the Z direction of one of the cylindrical lenses 28a and 28b, and a plano-convex lens are obtained from the astigmatism amounts in the X and Y directions. 27a and the plano-concave lens 27b are driven in the Z direction. In addition, the amount of rotation of one of the cylindrical lenses 21 a and 21 b and the amount of rotation of one of the cylindrical lenses 28 a and 28 b are obtained from the astigmatism amounts of the 45-degree oblique direction and the 135-degree oblique direction.
In S610, the lenses of the first lens group 21, the second lens group 27, and the third lens group 38 are driven and rotated based on the driving amount and rotation amount obtained in S608. Then, the process proceeds to S602, and the focal positions of the multiple patterns passing through the projection optical system PO are measured again. Based on the measurement results, the astigmatism of the projection optical system PO is obtained (S604), and it is determined whether the astigmatism exceeds an allowable value (S606) .
As described above, according to the first embodiment and the second embodiment, it is possible to correct magnification and astigmatism with high accuracy without increasing the size of the projection optical system PO (a so-called Offner optical system).
The method for manufacturing an article in the embodiment of the present invention is suitable for, for example, manufacturing equipment (semiconductor element, magnetic memory medium, liquid crystal display element, etc.). The above-mentioned manufacturing method includes a procedure of exposing the photosensitive-coated substrate using the exposure device EX, and a procedure of developing the exposed substrate. In addition, the above-mentioned manufacturing method can include other known procedures (oxidation, film formation, vapor deposition, doping, planarization, etching, resist peeling, dicing, bonding, packaging, etc.). The method of manufacturing an article in this embodiment is more advantageous than conventional ones in at least one of performance, quality, productivity, and production cost of the article.
As mentioned above, although preferred embodiment of this invention was described, of course, this invention is not limited to these embodiment, Various deformation | transformation and change are possible within the range of the summary. For example, in this embodiment, the case where the first lens group and the second lens group include a cylindrical lens has been described as an example, but the first lens group and the second lens group may include a toric surface instead of the cylindrical lens. lens.
1‧‧‧水銀燈1‧‧‧ Mercury lamp
2‧‧‧橢圓鏡 2‧‧‧ oval mirror
3‧‧‧第1聚焦透鏡 3‧‧‧ 1st focusing lens
4‧‧‧蠅眼透鏡 4‧‧‧ fly eye lens
5‧‧‧第2聚焦透鏡 5‧‧‧ 2nd focusing lens
6‧‧‧狹縫界定構材 6‧‧‧ Slit delimiting structure
7‧‧‧成像光學系統 7‧‧‧ imaging optical system
8‧‧‧平面鏡 8‧‧‧ flat mirror
9‧‧‧遮罩 9‧‧‧Mask
10‧‧‧第1透鏡群 10‧‧‧The first lens group
10a‧‧‧柱面透鏡 10a‧‧‧ cylindrical lens
10b‧‧‧柱面透鏡 10b‧‧‧ cylindrical lens
11‧‧‧第1平面鏡 11‧‧‧The first plane mirror
12‧‧‧第1凹面鏡 12‧‧‧ 1st concave mirror
13‧‧‧凸面鏡 13‧‧‧ convex mirror
14‧‧‧第2凹面鏡 14‧‧‧ 2nd concave mirror
15‧‧‧第2平面鏡 15‧‧‧ 2nd plane mirror
16‧‧‧第2透鏡群 16‧‧‧ 2nd lens group
16a‧‧‧柱面透鏡 16a‧‧‧ cylindrical lens
16b‧‧‧柱面透鏡 16b‧‧‧ cylindrical lens
17‧‧‧基板 17‧‧‧ substrate
21‧‧‧第1透鏡群 21‧‧‧The first lens group
21a‧‧‧柱面透鏡 21a‧‧‧ cylindrical lens
21b‧‧‧柱面透鏡 21b‧‧‧ cylindrical lens
22‧‧‧第1平面鏡 22‧‧‧The first plane mirror
23‧‧‧第1凹面鏡 23‧‧‧1st concave mirror
24‧‧‧凸面鏡 24‧‧‧ convex mirror
25‧‧‧第2凹面鏡 25‧‧‧ 2nd concave mirror
26‧‧‧第2平面鏡 26‧‧‧ 2nd plane mirror
27‧‧‧第3透鏡群 27‧‧‧3rd lens group
27a‧‧‧平凸透鏡 27a‧‧‧ Plano-Convex Lenses
27b‧‧‧平凹透鏡 27b‧‧‧Plano-Concave Lenses
28‧‧‧第2透鏡群 28‧‧‧ 2nd lens group
28a‧‧‧柱面透鏡 28a‧‧‧ cylindrical lens
28b‧‧‧柱面透鏡 28b‧‧‧ cylindrical lens
40‧‧‧第1驅動機構 40‧‧‧1st drive mechanism
50‧‧‧第2驅動機構 50‧‧‧ 2nd drive mechanism
60‧‧‧第1驅動機構 60‧‧‧The first drive mechanism
70‧‧‧第2驅動機構 70‧‧‧ 2nd drive mechanism
80‧‧‧第3驅動機構 80‧‧‧3rd drive mechanism
CU‧‧‧控制部 CU‧‧‧Control Department
EX‧‧‧曝光裝置 EX‧‧‧Exposure device
IL‧‧‧照明光學系統 IL‧‧‧ Illumination Optical System
IP‧‧‧像面 IP‧‧‧Image surface
LS‧‧‧光源 LS‧‧‧Light source
OP‧‧‧物面 OP‧‧‧ Surface
PO‧‧‧投影光學系統 PO‧‧‧ Projection Optical System
圖1是示出本發明的第1實施方式中的曝光裝置的結構的概略圖。FIG. 1 is a schematic diagram showing a configuration of an exposure apparatus according to a first embodiment of the present invention.
圖2A以及圖2B是示出圖1所示的曝光裝置的第1透鏡群以及第2透鏡群各自的結構的一個例子的圖。 2A and 2B are diagrams illustrating an example of the configuration of each of the first lens group and the second lens group of the exposure apparatus shown in FIG. 1.
圖3A至圖3C是用於說明圖1所示的曝光裝置的投影光學系統的像散的校正的圖。 3A to 3C are diagrams for explaining astigmatism correction of the projection optical system of the exposure apparatus shown in FIG.
圖4是示出本發明的第2實施方式中的投影光學系統的結構的概略圖。 FIG. 4 is a schematic diagram showing a configuration of a projection optical system in a second embodiment of the present invention.
圖5是示出在驅動圖2A以及圖2B所示的投影光學系統的第1透鏡群、第2透鏡群以及第3透鏡群的各個時發生的像散以及倍率成分的發生量的圖。 FIG. 5 is a diagram showing the amount of occurrence of astigmatism and magnification components when each of the first lens group, the second lens group, and the third lens group of the projection optical system shown in FIG. 2A and FIG.
圖6是用於說明圖2A以及圖2B所示的投影光學系統的像散的校正的流程圖。 FIG. 6 is a flowchart for explaining astigmatism correction of the projection optical system shown in FIGS. 2A and 2B.
Claims (15)
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| JP2018-012947 | 2018-01-29 | ||
| JP2018012947A JP7005364B2 (en) | 2018-01-29 | 2018-01-29 | Projection optical system, exposure equipment, manufacturing method and adjustment method of articles |
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| TW201932906A true TW201932906A (en) | 2019-08-16 |
| TWI710792B TWI710792B (en) | 2020-11-21 |
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| JP (1) | JP7005364B2 (en) |
| KR (1) | KR102372650B1 (en) |
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| CN112859543B (en) * | 2021-02-02 | 2021-12-14 | 北京理工大学 | A design method of a catadioptric deep ultraviolet lithography objective lens system |
| JP2023004358A (en) * | 2021-06-25 | 2023-01-17 | キヤノン株式会社 | Projection optical system, exposure device, and article production method |
| JP7614962B2 (en) * | 2021-07-08 | 2025-01-16 | キヤノン株式会社 | PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE |
| WO2023081041A1 (en) | 2021-11-02 | 2023-05-11 | Corning Incorporated | Magnification adjustable projection system using movable lens plates |
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| US6411426B1 (en) * | 2000-04-25 | 2002-06-25 | Asml, Us, Inc. | Apparatus, system, and method for active compensation of aberrations in an optical system |
| JP3381257B2 (en) | 2001-05-31 | 2003-02-24 | 株式会社ニコン | Projection exposure method |
| JP5118407B2 (en) | 2007-07-31 | 2013-01-16 | キヤノン株式会社 | Optical system, exposure apparatus, and device manufacturing method |
| JP2011039172A (en) * | 2009-08-07 | 2011-02-24 | Canon Inc | Exposure apparatus and device manufacturing method |
| JP5595001B2 (en) * | 2009-10-06 | 2014-09-24 | キヤノン株式会社 | Projection optical system, exposure apparatus, and device manufacturing method |
| JP5595015B2 (en) * | 2009-11-16 | 2014-09-24 | キヤノン株式会社 | Projection optical system, exposure apparatus, and device manufacturing method |
| US20120293861A1 (en) | 2011-05-18 | 2012-11-22 | Elbit Systems Of America, Llc | System and Method for Correcting Astigmatism Caused by an Aircraft Canopy |
| JP5782336B2 (en) * | 2011-08-24 | 2015-09-24 | キヤノン株式会社 | Projection optical system, exposure apparatus, and device manufacturing method |
| JP6410406B2 (en) | 2012-11-16 | 2018-10-24 | キヤノン株式会社 | Projection optical system, exposure apparatus, and article manufacturing method |
| JP6748482B2 (en) * | 2016-05-25 | 2020-09-02 | キヤノン株式会社 | Exposure apparatus and method for manufacturing article |
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| JP7005364B2 (en) | 2022-01-21 |
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| KR102372650B1 (en) | 2022-03-10 |
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