TW201939654A - Equipment front end module (EFEM) which is easy to make an inert gas flow vertically in a conveyance chamber and difficult for dust to fly off - Google Patents

Abstract

The present invention relates to an equipment front-end module (EFEM). The object of the invention is to make it easy to flow inert gas vertically in the conveying room, and to make it difficult to raise dust. The solution for the EFEM system includes: a frame body (2) constituting the inside of the transfer room, and a support plate (37) above the transfer room in the frame (2) to constitute the FFU, and A supply pipe (47) for supplying nitrogen to the FFU installation chamber (42), and three fans arranged to cover the communication port (37a) of the support plate (37). The supply pipe (47) has three supply ports (47a) which are dispersedly arranged in the FFU installation chamber (42).

Description

Equipment front-end module (EFEM)

The present invention relates to an EFEM (Equipment Front End Module) that supplies inert gas to a closed transfer room and can be replaced with an inert gas environment.

In Patent Document 1, a loading port including a FOUP (Front-Opening Unified Pod) on which a wafer (semiconductor substrate) is housed, and a port connected to the opening provided on the front wall by the loading port are locked and formed, The frame of the transfer room where wafers are transferred; and the EFEM that records wafers between the processing equipment that applies a specific process to the wafers and the FOUP.

In the past, the influence on oxygen, moisture, and the like in the transport chamber of a semiconductor circuit manufactured on a wafer has been small, but in recent years, these effects have become more pronounced as the semiconductor circuits have become more refined. Therefore, the EFEM described in Patent Document 1 is configured by filling a transfer chamber with inert gas nitrogen. Specifically, EFEM has a circulation flow path formed by a transfer chamber and a gas return path for circulating nitrogen inside the housing, and a gas supply means for supplying nitrogen to the upper space of the gas return path, and is disposed in The upper space of the gas return path is a plurality of fans for sending inert gas out of the transfer chamber, and a gas exhaust means for discharging nitrogen from the lower part of the gas return path. Nitrogen is appropriately supplied and discharged in accordance with changes in the oxygen concentration in the circulation flow path. As a result, the transport room can be maintained as a nitrogen atmosphere. [Prior Art Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2015-146349

[Questions to be Solved by the Invention]

However, in the EFEM described in the aforementioned Patent Document 1, the gas supply means is connected to the upper space of the gas return path, and inactive gas is supplied from the connection point, that is, the supply port at one place, and in the upper space, The pressure on the suction side of the fan causes unevenness in each fan, and unevenness in the supply amount from each fan to the transfer chamber. That is, when an inert gas is supplied from one side of a plurality of fans in the arrangement direction, a sufficient amount of inert gas is supplied to one fan, but an inactive gas is supplied to the other fan. The amount is smaller than one. That is, in the upper space, the pressure on the suction side of one fan becomes larger than that of the other fan, and the supply amount of inert gas from each fan to the transfer chamber is uneven. As a result, the flow of the inert gas in the transfer chamber is disturbed, and there is a problem that dust is liable to be raised.

Therefore, an object of the present invention is to provide an EFEM that can easily flow inert gas vertically into a transfer chamber, and can easily raise dust. [Means for solving problems]

The EFEM of the present invention is provided with a substrate which is connected to a loading port at an opening provided in a neighboring wall and is locked, and a housing for conveying a substrate is formed inside the housing, and a substrate disposed in the conveying chamber and carrying the substrate is transferred. A conveying device, and a spacer member provided in the casing to form an upper space above the conveying chamber, an inert gas supply means for supplying an inert gas to the upper space, and an inert gas supply means, and formed in the space A plurality of communication openings that connect the transfer chamber and the upper space, and are arranged so as to cover the communication openings, and transmit the inactive gas in the upper space to the plurality of transfer chambers through the communication openings. A blower, and a gas suction port provided in a lower portion of the transfer chamber to attract the inert gas in the transfer chamber, and a gas return path for returning the inert gas attracted from the gas suction port to the upper space, and A gas exhausting means for exhausting the gas in the transfer chamber. The inert gas supply means includes a plurality of supply ports for dispersing the inert gas in the upper space to supply the inert gas.

At this time, it becomes an inactive gas that can be supplied from the inactive gas supply means to the upper space, and is supplied from a plurality of supply ports. Therefore, the inert gas can be uniformly supplied to the upper space throughout the entirety, and the pressure unevenness on the suction side of the plurality of blowers in the upper space becomes small. Accordingly, unevenness in the supply amount of inert gas from each blower to the transfer chamber is unlikely to occur. As a result, it becomes easy to flow inert gas vertically in the transfer chamber, and it is difficult to raise dust.

In the present invention, the supply port is provided between any one of the partition wall of the frame and the partition member for separating the upper space and the external space, and is provided in a range where the distance to the supply port is the shortest. It is better to make up. As a result, the inert gas supplied from the supply port is in contact with either the partition member or the partition wall, while its influence is weakened, the inert gas flows along either the partition member or the partition wall. Therefore, the airflow flowing from the gas return path into the upper space of the blower is less likely to be disturbed, and the pressure unevenness on the suction side of the plurality of blowers in the upper space is less changed. Accordingly, uneven supply of inert gas from each blower to the transfer chamber is further suppressed.

In addition, in the present invention, the gas suction ports are provided in a plurality at a lower portion of the transfer chamber, and the gas return path includes a plurality of first flow paths extending upward from each of the gas suction ports, The second flow path connected to the plurality of first flow paths preferably has a delivery port for sending the gas in the second flow path to the upper space. As a result, the gas from the transfer chamber temporarily flows through the second flow path through the plurality of first flow paths, and then flows into the upper space. In this way, the person who temporarily flows the gas from the plurality of first flow paths to the second flow path becomes the one who can absorb the uneven flow of the gas between the plurality of first flow paths. Therefore, when the gas is directly sent to the upper space from each of the first flow paths, the amount of gas sent from the outlet is stable, and the uneven supply of inactive gas from each blower to the transfer chamber is more suppressed.

In addition, in the present invention, the second flow path extends along the arrangement direction of the plurality of first flow paths, and the sending-out ports are arranged in the arrangement direction, each of which is adjacent to the two first passages. Those between the flow paths are better. As a result, the amount of gas sent from the outlet to the upper space is more stable, and the uneven supply of inactive gas from each blower to the transfer chamber is further suppressed.

Moreover, in this invention, it is preferable that the said sending-out port is arrange | positioned at the position which pinches | interposes the said blower among the crossing direction which intersects with the arrangement direction of the said plurality of blowers. As a result, the airflow flowing from the gas return path to the upper space of the blower becomes less prone to chaos, and the uneven supply of inactive gas from each blower to the transfer chamber is further suppressed.

In addition, the EFEM of the present invention is, in another aspect, provided with a lock connected to a loading port at an opening provided in a neighboring wall, a housing configured to transfer a substrate for transferring a substrate, and a housing provided in the housing. In order to form a partition member having an upper space above the transfer chamber, a plurality of communication ports are formed on the partition member to communicate the transfer chamber and the upper space, and are provided in the communication port to transfer gas in the upper space. A plurality of air blowers in the transfer chamber, and a plurality of gas suction ports provided in the lower portion of the transfer chamber to attract the gas in the transfer chamber, and the gas sucked from each of the gas suction ports are returned to the upper space. Gas return path. The gas return path includes a plurality of first flow paths extending from the plurality of gas suction ports, and a plurality of first flow paths connected to the plurality of first flow paths to flow into the gas from the first flow path. The gas is sent to the second flow path in the upper space.

At this time, the gas from the transfer chamber temporarily flows through the second flow path through the plurality of first flow paths, and then flows into the upper space. In this way, the person who temporarily flows the gas from the plurality of first flow paths to the second flow path becomes the person who can absorb the uneven flow of the gas between the plurality of first flow paths. Therefore, when the gas is directly sent to the upper space from each of the first flow paths, the amount of gas sent from the outlet is stable, which suppresses uneven supply of gas from each blower to the transfer chamber.

In the present invention, the second flow path system extends in a direction that intersects with the extending direction of the first flow path, and the gas system flowing in the gas return path flows from the first flow path in When the second flow path is used, the direction of the air flow is changed, and when the second flow path flows into the upper space, the direction of the air flow is also changed. As a result, in the second flow path, it is possible to serve as a flower that relaxes the gas in the direction in which the first flow path extends. Accordingly, compared with the case where the gas flows directly into the upper space without changing the direction of the air flow from the first flow path to the upper space, it can be used as a person who does not easily disturb the air flow in the upper space.

In addition, the present invention includes a base portion at a fixed position, and a transfer portion arranged above the base portion to transfer the substrate, and further includes a substrate transfer device arranged in the transfer chamber. The installation object is arranged below the transportation range of the substrate to be transported through the transportation unit. When the gas suction port is viewed from a vertical direction, it is also disposed at a position that does not overlap with any of the base portion and the installation object. can. [Inventive effect]

When passing through the EFEM of the present invention, the inert gas can be uniformly supplied to the upper space throughout the entirety, and the pressure unevenness on the suction side of the plurality of blowers in the upper space becomes small. Accordingly, unevenness in the supply amount of inert gas from each blower to the transfer chamber is unlikely to occur. As a result, it becomes easy to flow inert gas vertically in the transfer chamber, and it is difficult to raise dust.

Hereinafter, an EFEM 1 according to an embodiment of the present invention will be described below with reference to FIGS. 1 to 8. However, for convenience of explanation, the direction shown in FIG. 1 is taken as the front-back, left-right, and left-right directions. That is, in this embodiment, the direction in which the EFEM (Equipment Front End Module) 1 and the substrate processing apparatus 6 are arranged is taken as the front-back direction, the EFEM 1 side is taken as the front, and the substrate processing apparatus 6 is taken as the rear. In addition, a direction in which a plurality of loading ports 4 are orthogonal to the front-rear direction is arranged as the left-right direction. In addition, a direction orthogonal to both the front-rear direction and the left-right direction is taken as the vertical direction.

(Schematic configuration of EFEM and its surroundings) First, the schematic configuration of EFEM1 and its surroundings will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view showing a schematic configuration of the EFEM 1 and its surroundings in this embodiment. FIG. 2 is a diagram showing the electrical configuration of EFEM1. As shown in FIG. 1, the EFEM1 system includes a frame body 2, a transfer robot arm 3 (substrate transfer device), three loading ports 4, and a control device 5. Subsequent to EFEM1, a substrate processing apparatus 6 for arranging a wafer W (substrate) in a specific place is arranged. The EFEM1 transmits and receives wafers W between a FOUP (Front-Opening Unified Pod) 100 and a substrate processing apparatus 6 placed in a loading port 4 through a transfer robot arm 3 disposed in a housing 2. The FOUP 100 is a container that can accommodate a plurality of wafers W in an up-down direction, and a lid 101 that can be opened and closed is provided at a rear end portion (an end portion on the frame 2 side in the front-rear direction). The FOUP100 is transported, for example, via a known OHT (Zenith walking unmanned transport vehicle: not shown). FOUP100 is granted between OHT and loading port 4.

The housing 2 is configured to connect the three loading ports 4 and the substrate processing apparatus 6. The inside of the housing 2 is formed with a transfer chamber 41 that is slightly sealed from the outside space and is transferred so that the wafer W is not exposed to outside air. When the EFEM 1 is moved, the transfer chamber 41 is filled with nitrogen. However, in this embodiment, the transfer chamber 41 is filled with nitrogen, but if it is an inert gas, a structure other than nitrogen (for example, argon) may be maintained. The housing 2 is configured in a nitrogen cycle in an internal space including the transfer chamber 41 (the details will be described later). A door 2 a that can be opened and closed is attached to the rear end of the housing 2, and the transfer chamber 41 is connected to the substrate processing apparatus 6 with the door 2 a interposed therebetween.

The transfer robot arm 3 is arranged in the transfer chamber 41 and transfers the wafer W. The transfer robot arm 3 includes a base portion 90 (refer to FIG. 3) in a fixed position, and an arm mechanism 70 (transfer portion, see FIG. 3) disposed above the base portion 90 and holding the wafer W for transfer. And robot control unit 11 (see FIG. 2). The transfer robot arm 3 mainly performs an operation of taking out the wafer W in the FOUP 100 and delivering it to the substrate processing apparatus 6, or receiving a wafer W processed by the substrate processing apparatus 6 and returning to the FOUP 100.

The loading port 4 is configured to mount a FOUP100 (see FIG. 7). As shown in FIG. 1 and FIG. 5, the plurality of loading ports 4 are arranged in the left-right direction along the partition wall 33 on the front side of the housing 2. Each loading port 4 is closed in a space 51 (see FIG. 7) located at the rear end, and three openings 33 a 1 (see FIG. 4) formed in the partition wall 33 of the housing 2. As a result, the transport chamber 41 is configured as a slightly closed space in the housing 2. In addition, loading port 4 can replace the ambient gas in FOUP100 with nitrogen. The rear end of the loading port 4 is provided with a door 4a which is a part of an opening and closing mechanism 54 described later. The door 4a is opened and closed via a door driving mechanism 55 (a part of the opening and closing mechanism 54). The door 4 a is configured to unlock the cover 101 of the FOUP 100 and to hold the cover 101. When the door 4a is kept in the unlocked state of the cover 101, the door driving mechanism 55 opens the door 4a to open the cover 101. As a result, the wafer W in the FOUP 100 can be taken out through the transfer robot arm 3. In addition, it becomes possible to store the wafer W in the FOUP 100 via the transfer robot arm 3.

As shown in FIG. 2, the control device 5 is electrically connected to the robot arm control unit 11 of the transfer robot arm 3, the loading port control unit 12 of the loading port 4, and the control unit (not shown) of the substrate processing apparatus 6, and Communication with these control units is performed. In addition, the control device 5 is electrically connected to an oxygen concentration meter 85, a pressure gauge 86, a hygrometer 87, and the like installed in the casing 2, and receives the measurement results of these measuring devices to grasp the relevant casing 2 Information about the atmosphere inside. In addition, the control device 5 is electrically connected to a supply valve 112 and a discharge valve 113 (to be described later), and by adjusting the opening degree of these valves, it is appropriate to adjust the nitrogen ambient gas in the housing 2.

As shown in FIG. 1, the substrate processing apparatus 6 includes, for example, a load-locking vacuum chamber 6 a and a processing chamber 6 b. The load-locking vacuum chamber 6a is a chamber which is connected to the transfer chamber 41 via the door 2a of the housing 2 to temporarily wait for the wafer W. The processing chamber 6b is connected to the load interlocking vacuum chamber 6a via a door 6c. In the processing chamber 6b, a specific process is performed on the wafer W via a processing mechanism (not shown).

(Frame body and its internal structure) Next, the frame body 2 and its internal structure will be described using FIGS. 3 to 6. FIG. 3 is a front view when the frame 2 is viewed from the front. FIG. 4 is a cross-sectional view taken along the line IV-IV shown in FIG. 3. Fig. 5 is a sectional view taken along the line V-V shown in Fig. 3. FIG. 6 is a sectional view taken along the line VI-VI shown in FIG. 3. However, the illustration of the partition wall is omitted in FIGS. 3 and 6. In addition, in FIG. 5, illustrations of the transfer robot arm 3 and the like are omitted, and the loading port 4 is shown by a two-point chain link.

The frame 2 has a slightly rectangular parallelepiped shape as a whole. As shown in FIGS. 3 to 5, the frame body 2 has columns 21 to 26, a connecting pipe 27, and partition walls 31 to 36. Partition walls 31 to 36 are attached to the columns 21 to 26 extending in the up-and-down direction, and the internal space of the housing 2 (the transfer room 41 and the FFU installation room 42) is configured to be slightly closed to the external space.

More specifically, as shown in FIG. 4, in the front end portion of the frame body 2, the columns 21 to 24 are sequentially arranged while being isolated from each other from the left to the right. That is, four columns 21 to 24 are arranged in the left-right direction. The columns 21 to 24 are erected in a vertical direction as shown in FIG. 3. The pillars 21 and 24 are constituted by first portions 21b and 24b arranged on the lower side and second portions 21c and 24c arranged on the upper side. The first portions 21b and 24b are erected on the partition wall 31, and the upper ends thereof are connected to the connecting pipe 27. In addition, the columns 22 and 23 are also erected on the partition wall 31, and the upper ends thereof are connected to the connecting pipe 27. The lengths of the first portions 21b, 24b and the columns 22, 23 in the vertical direction are almost the same. The second portions 21c and 24c are connected to the connecting pipe 27 and are erected at positions overlapping the first portions 21b and 24b in the up-down direction. Two columns 25 and 26 are attached to the left and right sides of the rear end of the frame body 2 in the up-and-down direction. The connecting pipe 27 extends in the left-right direction (the arrangement direction of the four columns 21 to 24), and is connected to the four columns 21 to 24.

As shown in FIG. 3, a partition wall 31 is disposed at the bottom of the frame 2, and a partition wall 32 is disposed at the top of the sky. As shown in FIG. 4, a partition wall 33 is disposed at each of the front end portions, a partition wall 34 is disposed at the rear end portion, a partition wall 35 is disposed at the left end portion, and a partition wall 36 is disposed at the right end portion. The partition wall 33 is formed with the aforementioned three openings 33a1. These three openings 33a1 are arranged between the four pillars 21 to 24 in the left-right direction, and are closed by the base 51 of the loading port 4. The right end portion of the housing 2 is provided with a mounting portion 83 (see FIG. 3) in which a positioner 84 to be described later is disposed. The positioner 84 and the mounting portion 83 are also housed inside the housing 2 (see FIG. 4).

As shown in FIG. 5, a support plate 37 (spacer member) extending in the horizontal direction is arranged on the upper end portion of the housing 2 at the rear end side of the connecting tube 27. As a result, the interior of the housing 2 is divided into the aforementioned transfer chamber 41 and the FFU installation chamber 42 formed above the transfer chamber 41. That is, an FFU installation chamber 42 as an upper space is formed in the internal space of the housing 2 above the transfer chamber 41 via the support plate 37.

Three FFUs (fan filter units) 44 described later are arranged in the FFU installation room 42. In the central portion of the support plate 37 in the front-rear direction, three communication ports 37 a are formed so as to communicate with the FFU 44 in the up-and-down direction to communicate the transfer chamber 41 and the FFU installation chamber 42. These three communication ports 37a are arranged in the left-right direction as shown in FIG. In addition, the three communication ports 37a are arranged in the left-right direction between four columns 21 to 24. However, the partition walls 33 to 36 of the housing 2 are divided into a lower wall for the transfer chamber 41 and an upper wall for the FFU installation chamber 42 (for example, refer to the partition walls 33a, 33b at the ends before FIG. 5 and the partition at the rear ends). 34a, 34b). The airflow speed of each FFU44 system in a conveying range 200 described later takes a desired value, and the number of rotations is determined in advance. As the air velocity in the conveying range 200 is less than 1m / s, ideally 0.1m / s ~ 0.7m / s, and more preferably 0.2m / s ~ 0.6m / s, the rotation of each FFU is determined according to the target value. number.

Next, the internal structure of the housing 2 will be described. Specifically, a configuration for circulating nitrogen in the housing 2 and its peripheral configuration, and equipment and the like arranged in the transfer chamber 41 will be described.

The structure for circulating nitrogen in the housing 2 and the surrounding structure will be described with reference to FIGS. 3 to 6. As shown in FIG. 5, a circulation path 40 for circulating nitrogen is formed in the interior of the housing 2. The circulation path 40 is configured via a transfer chamber 41, an FFU installation chamber 42, and a return path 43 (gas return path). In the circulation path 40, clean nitrogen is sent from the FFU installation chamber 42 through the communication ports 37a, and reaches the lower end of the transfer chamber 41, then rises through the return path 43, and returns to the FFU installation chamber. 42 (see arrow in FIG. 5). The details are described below.

As shown in FIGS. 5 and 6, the FFU installation chamber 42 is provided with three FFU 44 disposed on the support plate 37 and three chemical filters 45 disposed on the FFU 44. As shown in FIG. 5, each FFU 44 is provided with a fan 44 a (air blower) and a filter 44 b, and is disposed on the support plate 37 as a covering communication port 37 a. As indicated by the arrow in FIG. 6, the FFU 44 sucks nitrogen from the FFU installation chamber 42 through the fan 44 a and sends the nitrogen from below the FFU 44 while removing the nitrogen-containing dust (not shown) through the filter 44 b. ). The chemical filter 45 is configured, for example, to remove an active gas or the like introduced into the circulation path 40 from the substrate processing apparatus 6. The nitrogen system purified by the FFU 44 and the chemical filter 45 is sent from the FFU installation chamber 42 through the communication port 37 a formed in the support plate 37 to the transfer chamber 41. The nitrogen system sent out from the transfer chamber 41 forms a laminar flow and flows downward.

The return path 43 is formed by the columns 21 to 24 (the column 23 in FIG. 5) and the connecting pipe 27 arranged at the front end of the housing 2. The insides of the first portions 21b, 24b of the columns 21, 24, the columns 22, 23, and the connecting pipe 27 are hollow, and spaces 21a to 24a, 27a each forming a space through which nitrogen can flow are formed (see FIG. 4). The first portions 21b, 24b of the pillars 21, 24 are shown in FIG. 4, and the width in the left-right direction is larger than that of the pillars 22, 23. That is, the planar dimensions of the spaces 21a, 24a (the first flow paths) (that is, the opening areas of the first portions 21b, 24b) are larger than those of the spaces 22a, 23a (the opening areas of the columns 22, 23). In addition, the spaces 21a to 24a (first flow paths) are formed by extending in the up-down direction, and all extend from the lower ends of the columns 21 to 24 to the position of the connecting pipe 27.

The connecting pipe 27 is arranged at the front end of the frame body 2. The space 27a (second flow path) of the connection pipe 27 extends in the left-right direction. In addition, as shown in FIG. 5 and FIG. 6, the lower surface of the connection pipe 27 is formed with communication ports 27 b to 27 e for communicating the spaces 21 a to 24 a and the space 27 a with each other. In addition, as shown in FIG. 6, the upper surface of the connecting pipe 27 is formed with three delivery ports 27f to 27h that open toward the FFU installation chamber 42 (that is, upward). These three delivery ports 27f to 27h are arranged in the left-right direction between the four pillars 21 to 24, and have long rectangular flat shapes with respect to each other in the left-right direction. In addition, the three delivery ports 27f to 27h are arranged at the front end portion of the housing 2. In this way, the connecting pipe 27 is configured such that once the nitrogen flowing in from the four spaces 21a to 24a merges, the connecting pipe 27 can be sent to the FFU installation chamber 42 from the three sending ports 27f to 27h. When nitrogen flows from space 21a to 24a to space 27a, the direction of the airflow is changed from above to left and right, and from space 27a, it flows into the FFU installation chamber 42 through the outlets 27f to 27h. Then change from the left and right direction to the top. The return path 43 is constituted through such spaces 21a to 24a and 27a. The three delivery ports 27f to 27h are arranged at positions overlapping the FFU44 in the front-back direction. That is, each of the sending-out ports 27f to 27h and FFU44 connected to the front-rear direction is corresponding. In addition, the three delivery ports 27f to 27h are formed in the left-right direction with a long rule, and have a relatively large opening area. Therefore, the flow of the gas sent from each of the outlets 27f to 27h to the FFU installation chamber 42 becomes gentle, and the pressure unevenness on the suction side (upper side) of the three FFU 44 becomes smaller. However, as shown in FIG. 5, the gas system sent from the delivery outlets 27f to 27h to the FFU installation chamber 42 flows upward between the partition wall 33 and the FFU 44.

The return path 43 will be described more specifically with reference to FIG. 5. However, the column 23 is shown in FIG. 5, but the same is applied to the first portions 21 b and 24 b and the columns 22 of the other columns 21 and 24. An introduction duct 28 is installed at the lower end portion of the column 23 so that nitrogen in the transfer chamber 41 can easily flow into the return path 43 (space 23a). The introduction duct 28 is similarly attached to the other columns 21, 22, and 24. However, since the columns 21 and 24 are formed wider in the left-right direction than the columns 23, the width of the columns 21 and 24 is also formed in the introduction duct 28 attached thereto, but otherwise they have the same configuration. An opening 28 a is formed in the introduction duct 28, and nitrogen reaching the lower end portion of the transfer chamber 41 is allowed to flow into the return path 43. That is, the opening 28 a is a gas suction port that sucks nitrogen in the transfer chamber 41 to the return path 43. The opening 28a is configured to face downward. Therefore, it is possible to smoothly inhale the gas reaching from the upper side to the partition wall 31 without disturbing the flow of the gas from the upper side. Furthermore, it becomes a person who can inhale the gas inhaled through the opening 28a, and does not change the direction of a gas flow with respect to the upper side.

The upper portion of the introduction duct 28 is formed with an enlarged portion 28 b that diffuses to the rear as it goes downward. A fan 46 is disposed in the introduction duct 28 below the enlarged portion 28b. The fan 46 is driven by a motor (not shown), and the nitrogen reaching the lower end of the transfer chamber 41 is sucked into the return path 43 (system space 23a in FIG. 5) and sent upward, and returns the nitrogen to the FFU setting. Room 42. The nitrogen system returned to the FFU installation chamber 42 is sucked from the upper surface of the chemical filter 45 to the FFU 44 side, cleaned through the FFU 44 or the chemical filter 45, and sent out to the transfer chamber 41 through the communication port 37a again. From the above, nitrogen can be circulated in the circulation path 40.

In addition, as shown in FIG. 3, a supply pipe 47 is provided at the upper rear end of the FFU installation chamber 42 (that is, the rear end of the housing 2) to supply nitrogen in the FFU installation chamber 42 (circulation path 40). The supply pipe 47 is connected to an external pipe 48 connected to a nitrogen supply source 111. A supply valve 112 capable of changing the supply amount of nitrogen per unit time is provided in the middle of the external piping 48. The inactive gas supply means is configured by the supply pipe 47, the external pipe 48, the supply valve 112, and the supply source 111 through these. However, in the case where the inert gas supply line is installed in a factory or the like, the supply line and the supply pipe 47 may be connected. Therefore, the inert gas supply means may be configured only from the supply pipe 47.

As shown in FIGS. 3 and 6, the supply pipe 47 extends in the left-right direction, and three supply ports 47 a are formed. The three supply ports 47 a are arranged to be separated from each other along the left-right direction, and nitrogen is supplied from the supply pipe 47 into the FFU installation chamber 42. These three supply ports 47a are formed at the lower end of the supply pipe 47 as shown in Figs. 5 and 6, and are in a range 37b (that is, to the support plate) facing the up and down direction of the supply pipe 47 of the support plate 37. The distance of the supply port 47a of 37 is the closest range), and it is configured to supply nitrogen. The three supply ports 47a are arranged in the same positional relationship with the center of the FFU 44 in the left-right direction. As a result, the three supply ports 47a are arranged in the front-rear direction at a position where the fan 44a is sandwiched between the delivery ports 27f to 27h.

When nitrogen is supplied from the three supply ports 47a of the supply pipe 47 to the FFU installation chamber 42, the three supply ports 47a are dispersedly arranged in the FFU installation chamber 42, and the nitrogen is evenly supplied to the entire FFU installation chamber 42. . For example, in a case where nitrogen is directly supplied into the FFU installation chamber 42 from one supply port of the external piping 48 connected to the right end of the housing 2, the pressure in the right portion of the FFU installation chamber 42 increases. That is, the pressure on the suction side of the FFU44 disposed on the far right side is greater than that of the other two FFU44. As described above, when a large unevenness occurs in the pressure on the suction side of the FFU 44, unevenness in the supply amount of nitrogen from the three FFUs 44 to the transfer chamber 41 is likely to occur. However, in this embodiment, because the nitrogen is supplied from three supply ports 47a which are arranged in the left-right direction and are isolated from each other, the pressure unevenness on the suction side of the three FFUs 44 becomes smaller. Accordingly, the supply amount of nitrogen from the three FFUs 44 to the transfer chamber 41 is stable, and the nitrogen sent to the transfer chamber 41 forms a laminar flow and flows downward.

As shown in FIG. 5, an exhaust pipe 49 for exhausting the gas in the circulation path 40 is connected to the lower end of the loading port 4. However, the loading port 4 is described later, and the storage chamber 60 in which the door driving mechanism 55 is stored is communicated through a slit 51b formed in the base 51 (see FIG. 7). The discharge pipe 49 is connected to the storage chamber 60. The exhaust pipe 49 is, for example, connected to an exhaust port (not shown), and an exhaust valve 113 is provided in the middle of the exhaust pipe to change the discharge amount per unit time of the gas in the circulation path 40. The exhaust pipe 49 and the exhaust valve 113 are configured as a gas exhausting means.

The supply valve 112 and the discharge valve 113 are electrically connected to the control device 5 (see FIG. 2). This makes it possible to appropriately supply and discharge nitrogen into the circulation path 40. For example, when the EFEM1 is started (for example, when the EFEM1 is started after maintenance is started, etc.), the oxygen concentration in the circulation path 40 is increased. From the supply source 111, nitrogen is supplied to the circulation path through the external pipe 48 and the supply pipe 47. 40. By exhausting the gas (gas: containing nitrogen, oxygen, etc.) in the circulation path 40 and the storage chamber 60 through the exhaust pipe 49, the oxygen concentration can be reduced. That is, the inside of the circulation path 40 and the storage chamber 60 can be replaced with a nitrogen atmosphere. However, when the EFEM1 is moved, the oxygen concentration in the circulation path 40 rises, and more nitrogen is temporarily supplied to the circulation path 40. Those who discharge oxygen simultaneously with nitrogen through the discharge pipe 49 can reduce the oxygen concentration. For example, in EFEM1 in the form of a nitrogen cycle, the leakage of nitrogen from the circulation path 40 to the outside is suppressed, and in order to reliably suppress the invasion of the atmosphere from the outside to the circulation path 40, the pressure in the circulation path 40 must be reduced. The external pressure is maintained slightly higher. Specifically, it is in a range of 1 Pa (G) to 3000 Pa (G), and is preferably 3 Pa (G) to 500 Pa (G), and more preferably 5 Pa (G) to 100 Pa (G). Therefore, when the pressure in the circulation path 40 deviates from a specific range, the control device 5 adjusts the nitrogen discharge flow rate by changing the opening degree of the discharge valve 113, and the pressure is adjusted to a specific target pressure. In this way, the supply flow rate of nitrogen is adjusted according to the oxygen concentration, and the discharge flow rate of nitrogen is adjusted according to the pressure to suppress the oxygen concentration and pressure. In this embodiment, the pressure is adjusted to a differential pressure of 10 Pa (G).

Next, the equipment etc. arrange | positioned in the conveyance room 41 are demonstrated using FIG.3 and FIG.4. As shown in FIGS. 3 and 4, the above-mentioned transfer robot arm 3, a control unit storage box 81, a measurement equipment storage box 82, and a positioner 84 are arranged in the transfer room 41. The control unit storage box 81 is, for example, provided on the left side of the base portion 90 (see FIG. 3) of the transfer robot arm 3, and is provided in a transfer range 200 that is larger than the transfer range of the wafer W through the arm mechanism 70 (see FIG. 3). Below. The control unit storage box 81 stores the robot arm control unit 11 or the loading port control unit 12 described above. The measuring device storage box 82 is, for example, disposed on the right side of the base portion 90 and disposed below the transfer range 200 of the arm mechanism 70. The measuring device storage box 82 is a measuring device that can store the above-mentioned oxygen concentration meter 85, pressure gauge 86, hygrometer 87, and the like (see FIG. 2). The control unit storage box 81 and the measuring equipment storage box 82 correspond to the installation objects of the present invention. The above-mentioned introduction duct 28 (refer to FIG. 4) is disposed in front of the base portion 90, the control portion storage box 81, and the measurement equipment storage box 82. That is, the opening 28a is disposed at a position where none of the base portion 90, the control portion storage box 81, and the measurement equipment storage box 82 overlaps when viewed from the up-down direction (vertical direction) (see FIG. 4, FIG. 5).

The positioner 84 is configured to detect how much the wafer W held by the arm mechanism 70 (see FIG. 3) of the transfer robot arm 3 is shifted from the target holding position. For example, in the inside of the FOUP 100 (refer to FIG. 1) transported via the above-mentioned OHT (not shown), the wafer W may move delicately. Therefore, the transfer robot arm 3 temporarily loads the wafer W before processing taken out from the FOUP 100 and places it on the positioner 84. The positioner 84 measures the position where the wafer W is shifted from the target holding position via the transfer robot arm 3 and sends the measurement result to the robot arm control unit 11. The robot arm control section 11 corrects the holding position of the arm mechanism 70 based on the above measurement results, controls the arm mechanism 70 to keep the wafer W at the target holding position, and transfers the wafer W to the load-locking vacuum chamber 6 a of the substrate processing apparatus 6. As a result, the processing of the wafer W through the substrate processing apparatus 6 can be performed normally.

(Configuration of Loading Port) Next, the configuration of the loading port will be described below with reference to FIGS. 7 and 8. Fig. 7 is a side sectional view of the loading port showing a state in which the door is closed. FIG. 8 is a side sectional view of the loading port showing a state where the door is opened. However, FIGS. 7 and 8 are depicted in the state of the external cover 4b (refer to FIG. 5) below the mounting table 53 in the removal position.

As shown in FIG. 7, the loading port 4 has a plate-shaped base 51 standing up and down, and a horizontal base 52 formed by protruding from a central portion of the base 51 in the up-down direction toward the front. A mounting table 53 for mounting the FOUP 100 is provided above the horizontal base 52. The mounting table 53 is a state in which the FOUP 100 is mounted, and is capable of being moved in the front-rear direction via a mounting table driving section (not shown).

The base 51 constitutes a part of the partition wall 33 which isolates the transfer chamber 41 from the external space. The base 51 is viewed from the front, and has a substantially rectangular planar shape with a length in the up-down direction. In addition, the base 51 is formed at a position facing the front-back direction with the placed FOUP 100, and a window portion 51a is formed. In addition, the base 51 is formed in the up and down direction, and the horizontal base portion 52 is a lower position, and a slit 51 b extending in the up and down direction of the support frame 56 that can be described later is formed. The slit 51b supporting frame 56 is formed in a state where it can move up and down while penetrating the base 51, and the width of the opening in the left-right direction is reduced. Therefore, it is difficult for the dust in the storage room 60 to enter the transfer room 41 from the slit 51b.

The loading port 4 is an opening / closing mechanism 54 having a cover 101 capable of opening and closing the FOUP 100. The opening / closing mechanism 54 includes a door 4a capable of closing the window portion 51a, and a door driving mechanism 55 for driving the door 4a. The door 4a is configured to lock the window portion 51a. The door 4a is configured to unlock the cover 101 of the FOUP 100 and to hold the cover 101. The door driving mechanism 55 includes a support frame 56 for supporting the door 4a, and a movable member 58 that can move the support frame 56 in the front-rear direction by the slider support means 57. For 51, the slide rail 59 supported in the up-down direction can be moved.

The support frame 56 is a structure that supports the lower portion of the rear portion of the door 4a, and after extending downward, it is a slightly curved plate-like member that protrudes toward the front of the base 51 through the slit 51b provided in the base 51. In addition, in order to support the slider support means 57 of the support frame 56, the movable member 58 and the slide rail 59 are disposed in front of the base 51. That is, the driving place for moving the door 4a is outside the housing 2 and is accommodated in the accommodation chamber 60 provided below the horizontal base 52. The storage room 60 is formed by being surrounded by a horizontal base 52 and a slightly box-shaped cover 61 and a base 51 that extend downward from the horizontal base 52 and is in a slightly sealed state.

The above-mentioned discharge pipe 49 is connected to the bottom wall 61a of the lid body 61. That is, the storage chamber 60 and the discharge pipe 49 are connected. In this embodiment, the storage chamber 60 and the discharge pipe 49 are connected to any of the three loading ports 4. As a result, it becomes possible to discharge the gas in the circulation path 40 from the discharge pipe 49 through the storage chamber 60. When the gas is discharged from the discharge pipe 49, the dust existing in the storage chamber 60 may be discharged simultaneously with the gas. In addition, a fan 62 facing the exhaust pipe 49 is provided on the bottom wall 61 a in the storage chamber 60. In this way, those who install the fan 62 in the storage chamber 60 can easily discharge the gas from the storage chamber 60 to the discharge pipe 49 while suppressing the rise of dust. Suppose that a fan is provided to send the gas in the transfer chamber 41 toward the storage chamber 60, and it is easy to disturb the air flow in the transfer chamber 41 and to easily raise the dust in the transfer chamber 41. However, in this embodiment, Because the fan 62 is arranged in the storage room 60, it is possible to suppress the situation where the dust in the transfer room 41 is raised.

Next, the operation of opening and closing the cover 101 and the door 4a of the FOUP 100 will be described below. First, as shown in FIG. 7, in a state of being isolated from the base 51, the mounting table 53 is moved backward, and the FOUP 100 placed on the mounting table 53 is brought into contact with the cover 101 and the door 4 a. At this time, the door 4 a of the opening / closing mechanism 54 unlocks the cover 101 of the FOUP 100 and holds the cover 101.

Next, as shown in FIG. 8, the support frame 56 is moved backward. As a result, the door 4a and the cover 101 are moved to the rear. As a result, while the cover 101 of the FOUP 100 is opened, the door 4a is opened, and the transfer chamber 41 of the frame 2 and the FOUP 100 are communicated.

Next, as shown in FIG. 8, the support frame 56 is moved downward. As a result, the door 4a and the cover 101 move downward. As a result, the FOUP100 is widely opened as a loading and unloading entrance. Between FOUP100 and EFEM1, a wafer W can be moved. However, in the case of closing the cover 101 and the door 4a, the operation opposite to the above may be performed. A series of operations of the loading port 4 are controlled by the loading port control unit 12.

As described above, when the EFEM 1 of this embodiment is adopted, the three supply ports 47a are dispersedly arranged in the FFU installation chamber 42, so that nitrogen can be evenly supplied to the entire FFU installation chamber 42. Therefore, the pressure unevenness on the suction side of the fans 44a (air blowers) of the three FFUs 44 in the FFU installation chamber 42 is reduced. Accordingly, the amount of nitrogen supplied from each fan 44a to the transfer chamber 41 is stabilized. In the transfer chamber 41, nitrogen tends to flow vertically (nitrogen forms a laminar flow), making it difficult to raise dust.

In addition, the exhaust pipe 49 is connected to the storage chambers 60 of each loading port 4, and the gas outside the circulation path 40 is exhausted by a plurality of discharge pipes 49 and a plurality of storage chambers 60. Therefore, as compared with the case where only one discharge pipe 49 is provided, the gas flowing downward in the transfer chamber 41 can be evenly discharged. As a result, the influence on the laminar flow formed by nitrogen in the transfer chamber 41 becomes smaller. In addition, the laminar flow formed by nitrogen in the transfer chamber 41 may be formed at least in the transfer range 200 of the wafer W and above.

In addition, the transfer room 41 is provided below the transfer range 200 with a control unit storage box 81 and a measuring device storage box 82 (an installation). When the opening 28 a is viewed from the vertical direction, the transfer room 41 is installed in a position not connected to the base portion 90. And any overlapping position of the installation is possible.

However, the inventor of the present application conducted three experiments on the visualization of laminar flow, above the transfer robot arm 3, above the control unit storage box 81, and above the measurement machine storage box 82 (refer to points 201 and 202 in FIG. 3). 203), the airflow velocity was measured to confirm the formation state of laminar flow. In this embodiment, the air velocity in the conveying range is 0.3 m / s, and the number of rotations of each FFU is determined in advance. As a result, it was confirmed that there was no cause of backflow of the gas in the transfer range 200 through the gas collision with the transfer robot arm 3 and the like. In addition, even when the amount of nitrogen supplied from the supply source 111 (see FIG. 3) or the number of rotations of the fan 46 (see FIG. 5) was changed, it was confirmed that the difference in the flow rate of the gas between the three places was less than 30. %By. That is, even if the installation object is set in the conveyance range 200, at least in the conveyance range 200 and above, it is confirmed that a stable laminar flow is formed.

In addition, the supply port 47a is configured to supply nitrogen so that the distance to the supply port 47a of the support plate 37 is the closest range 37b. As a result, the nitrogen supplied from the supply port 47a first contacts the range 37b of the support plate 37, and its state becomes weak while flowing along the support plate 37. Therefore, the air flow flowing from the outlets 27f to 27h in the FFU installation chamber 42 of the FFU 44 is not easily disturbed, and the pressure unevenness on the suction side of the FFU 44 in the FFU installation chamber 42 is reduced. Accordingly, variations in the amount of nitrogen supplied from the fan 44a of each FFU 44 to the transfer chamber 41 are suppressed.

As a modification, the supply port 47a may be configured to supply nitrogen toward the partition wall 32 or the partition wall 34 at the rear end portion of the casing 2 toward the ceiling. Here, too, as described above, the potential of the nitrogen supplied from the supply port 47 a becomes weak and flows, and the unevenness in the amount of nitrogen supplied from the fan 44 a of each FFU 44 to the transfer chamber 41 is further suppressed.

The return path 43 is composed of a space 27a (second flow path) connected to the four spaces 21a to 24a (the first flow path), and a connection pipe 27 having the space 27a formed with a delivery port 27f to 27h. The gas in the transfer chamber 41 flows through the four spaces 21a to 24a, temporarily flows behind the space 27a, and then flows to the FFU installation chamber 42. As shown in more detail in FIG. 6, the air from space 21a passes through space 27a and faces the outlet 27f, and the air from space 22a passes through space 27a and faces the left and right outlets 27f and 27g. The air from space 23a Then, the space 27a is directed toward the left and right outlets 27g, 27h, and the air from the space 24a flows through the space 27a toward the outlet 27h. For this reason, those who temporarily flow the gas from the four spaces 21a to 24a to the space 27a are those who can absorb the uneven flow of the gas between the four spaces 21a to 24a. In this embodiment, the opening areas of the spaces 21a and 24a are larger than those of the spaces 22a and 23a, and the spaces 21a and 24a have a larger gas flow. However, the gases from the spaces 21a to 24a merge in the space 27a. The outlets 27f to 27h are sent to the FFU installation room 42. Therefore, compared with when the gas is directly sent from the spaces 21a to 24a to the FFU installation chamber 42, the amount of gas sent from the outlets 27f to 27h is stable, and the uneven pressure on the suction side of each fan 44a is also suppressed, and the pressure The amount of nitrogen supplied from the fan 44a to the transfer chamber 41 is uneven.

Each of the outlets 27f to 27h is arranged in the left and right directions between the two adjacent spaces 21a to 24a. Even if there is uneven flow of gas from the two adjacent spaces 21a to 24a, the outlets are from the outlet. 27f ~ 27h gas delivery is more stable. Therefore, unevenness in the amount of nitrogen supplied from the fan 44 a to the transfer chamber 41 is further reduced.

In addition, each of the sending-out ports 27f to 27h is located in the front-rear direction and is disposed at a position where the fan 44a is sandwiched between the sending-out port and the supplying port 47a. As a result, the airflow flowing from the return path 43 to the FFU installation chamber 42 of the fan 44a is not easily disturbed, and the uneven supply of nitrogen from each fan 44a to the transfer chamber 41 is suppressed.

As mentioned above, although the best embodiment of this invention was demonstrated, this invention is not limited to the said embodiment, As long as it is described in the range of the patent application, various changes are possible. In the foregoing embodiment, the three supply ports 47a formed in the supply pipe 47 are dispersedly arranged in the FFU installation chamber 42, but the supply ports 47a, 2 or 4 or more in the supply pipe 47 are installed in the FFU installation chamber 42 It is also possible to disperse them. Alternatively, instead of the supply pipe 47, a porous pipe (for example, porous stone) may be arranged in the FFU installation chamber 42. Here, a plurality of supply ports of the porous tube may be dispersedly arranged in the FFU installation chamber 42, and the same effect as that of the above embodiment can be obtained.

In addition, a plurality of supply ports 47a may be arranged in each FFU installation chamber 42. That is, it may be arranged on the front end side of the housing 2. The opening 28 a as the gas suction port may be disposed above the lower portion of the transfer chamber 41. In addition, the return path 43 is constituted only by the spaces 21a to 24a as the first flow path, and the gas may be directly sent from the spaces 21a to 24a to the FFU installation chamber 42. In this case, the space for the first flow path may be 1 to 3 or 5 or more. The return path 43 may have a space 27a as the second flow path, and the space as the first flow path may be 2, 3, or 5 or more.

In addition, each of the outlets 27f to 27h may not be arranged between the two adjacent spaces 21a to 24a in the left-right direction. The fan 44a (FFU44) may be provided by 2 or 4 or more. In this case, the communication port 37a may be formed in the support plate 37 in correspondence with the fan 44a.

In addition, instead of the outlets 27f to 27h, for example, a perforated metal plate (not shown) in which a large number of holes are formed may be provided on the entire upper surface of the connection pipe 27, etc., and the flow of the gas may be changed.

In addition, the spaces 21a to 24a and 27a formed in the columns 21 to 24 and the connecting pipe 27 are configured as the return path 43, but they are not limited to this. That is, the return path 43 may be formed via another member.

1‧‧‧EFEM

2‧‧‧ frame

3‧‧‧ transfer robot arm (substrate transfer device)

4‧‧‧ loading port

21a ~ 24a‧‧‧space (first flow path)

27a‧‧‧space (second flow path)

27f ~ 27h‧‧‧Export

28a‧‧‧opening (gas suction port)

33‧‧‧ next door

33a1‧‧‧ opening

37‧‧‧ support board

37a‧‧‧Connect

37b‧‧‧range

41‧‧‧Transportation Room

42‧‧‧FFU installation room (upper space)

43‧‧‧Return route (gas return route)

44a‧‧‧fan (air blower)

47‧‧‧ supply pipe (inactive gas supply means)

47a‧‧‧ supply port

49‧‧‧Exhaust pipe (gas exhaust means)

W‧‧‧ Wafer (substrate)

FIG. 1 is a plan view showing a schematic configuration of an EFEM and its surroundings according to a first embodiment of the present invention. FIG. 2 is a diagram showing the electrical configuration of the EFEM shown in FIG. 1. FIG. 3 is a front view when the frame shown in FIG. 1 is viewed from the front. FIG. 4 is a cross-sectional view taken along line IV-IV shown in FIG. 3. FIG. 5 is a cross-sectional view taken along the line V-V shown in FIG. 3. FIG. 6 is a sectional view taken along the line VI-VI shown in FIG. 3. FIG. 7 is a side sectional view of the loading port showing a state where the door is closed. FIG. 8 is a side sectional view of the loading port showing a state where the door is opened.

Claims (8)

An EFEM is characterized in that the EFEM is connected with a loading port at an opening provided in a neighboring wall, is locked, and a transfer chamber for transferring a substrate is formed inside the frame, and is arranged in the transfer chamber to carry the substrate. The substrate transfer device includes a spacer member provided in the housing to form an upper space above the transfer chamber, and an inert gas supply means for inert gas to supply an inert gas to the upper space. The partition member is provided with a plurality of communication ports for communicating the transfer chamber with the upper space, and is arranged so as to cover the communication ports, and through the communication ports, a plurality of blowers for transmitting the inactive gas in the upper space to the transfer chamber are provided. A gas suction port provided in the lower part of the transfer chamber to attract the inert gas in the transfer chamber, and a gas return path for returning the inert gas attracted from the gas suction port to the upper space, and The discharge of the gas in the gas transport chamber discharge means; means for supplying the inert gas system having: an upper portion in the space to be dispersed, a plurality of supply ports for supplying the inert gas. For example, in the EFEM described in item 1 of the scope of the patent application, the supply port is closest to the supply port in any one of the partition wall and the partition member of the frame for separating the upper space and the external space. It is a range in which an inert gas is supplied. For example, the EFEM described in item 1 or 2 of the scope of the patent application, wherein the gas suction port is provided plurally in the lower part of the transfer chamber, and the gas return path includes: from each of the plurality of gas suction ports facing upward The plurality of first flow paths extending and the second flow path connected to the plurality of first flow paths have a sender for sending the gas in the second flow path out of the upper space. For example, in the EFEM described in the third item of the patent application scope, the second flow path extends along the arrangement direction of the plurality of first flow paths, and the delivery ports are arranged in the arrangement direction, and are arranged adjacent to each other. 2 of the aforementioned first flow path. For example, the EFEM described in item 3 or 4 of the scope of patent application, wherein the sending-out port is arranged in a direction intersecting the arrangement direction of the plurality of blowers, and is arranged between the supplying port and the holding port. Positioner of blower. An EFEM is characterized in that the EFEM is connected with a loading port at an opening provided in a neighboring wall, and is locked. A transfer chamber for transferring a substrate is formed inside the frame, and the frame is installed in the frame. A plurality of partition members above the transfer chamber, a plurality of communication ports formed in the partition member to communicate the transfer chamber with the upper space, and a plurality of communication ports provided in the communication port to transfer gas from the upper space to the transfer chamber. A blower, and a plurality of gas suction openings arranged in the lower part of the aforementioned transfer chamber to attract the gas in the transfer chamber; and a gas return path for returning the gas attracted from each of the aforementioned gas suction openings to the upper space; The return path includes a plurality of first flow paths extending from each of the plurality of gas suction ports, and a plurality of first flow paths connected to the plurality of first flow paths to flow into the gas from the first flow path while sending out the gas. To the second flow path in the upper space. For example, the EFEM described in item 6 of the scope of the patent application, wherein the second flow path system extends in a direction that intersects with the extension direction of the first flow path, and the gas system flowing through the gas return path When the first flow path passes through the second flow path, the direction of the air flow is changed, and when the second flow path flows into the upper space, the direction of the air flow is also changed. For example, the EFEM described in the 6th or 7th in the scope of patent application, which includes: a base portion at a fixed position, and a transfer portion arranged above the base portion to transfer the substrate, and further arranged in the transfer chamber. The substrate conveying device; The conveying room is provided with a set lower than the conveying range for conveying the substrate through the conveying section. When the gas suction port is viewed from the vertical direction, it is arranged in a position not connected to the abutment section and Any one of the aforementioned overlapping positions.