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TW201911989A - Method for manufacturing metal bonded laminate - Google Patents

Method for manufacturing metal bonded laminate Download PDF

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Publication number
TW201911989A
TW201911989A TW107121000A TW107121000A TW201911989A TW 201911989 A TW201911989 A TW 201911989A TW 107121000 A TW107121000 A TW 107121000A TW 107121000 A TW107121000 A TW 107121000A TW 201911989 A TW201911989 A TW 201911989A
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Taiwan
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bonding
bonding composition
silver
organic component
silver particles
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TW107121000A
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Chinese (zh)
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渡辺智文
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日商阪東化學股份有限公司
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Publication of TW201911989A publication Critical patent/TW201911989A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/08Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/02Single bars, rods, wires, or strips
    • H10W72/071
    • H10W72/884
    • H10W90/734

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Powder Metallurgy (AREA)
  • Die Bonding (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)

Abstract

The present invention provides a method for producing a metal bonded laminate, which enables the achievement of high bonding strength, while ensuring good handling properties of a bonding composition. The present invention is a method for producing a metal bonded laminate where a first body to be bonded and a second body to be bonded are bonded to each other by means of a silver particle sintered layer; and this method comprises a step (1) wherein a bonding composition, which contains silver particles and an organic component, is applied to the first body to be bonded, a step (2) wherein the applied bonding composition is heated and dried, a step (3) wherein the second body to be bonded is pressed against the heated and dried bonding composition, and a step (4) wherein the bonding composition is sintered by means of heating, thereby forming the silver particle sintered layer. With respect to this method for producing a metal bonded laminate, the content of the organic component in the bonding composition that is heated and dried in the step (2) is 4% by mass or more.

Description

金屬接合積層體的製造方法Method for manufacturing metal bonded laminate

本發明是有關於一種金屬接合積層體的製造方法。The present invention relates to a method of producing a metal bonded laminate.

為了進行金屬零件彼此的機械性、電性及/或熱性接合,先前使用焊料、導電性接著劑、銀糊、各向異性導電性膜等接合材。該些接合材不僅用於金屬零件的接合,有時亦用於陶瓷零件、樹脂零件等的接合。作為接合材的用途,例如可列舉:將發光二極體(light emitting diode,LED)等發光元件接合於基板上的用途、將半導體晶片接合於基板上的用途、將該些基板進而接合於放熱構件上的用途等。In order to perform mechanical, electrical, and/or thermal bonding of the metal parts, a bonding material such as solder, a conductive adhesive, a silver paste, or an anisotropic conductive film is used. These joining materials are used not only for joining metal parts but also for joining ceramic parts, resin parts, and the like. Examples of the use of the bonding material include a use of bonding a light-emitting element such as a light emitting diode (LED) to a substrate, and bonding the semiconductor wafer to the substrate, and further bonding the substrates to the heat release. Use on components, etc.

專利文獻1中,關於接合材及使用其的接合方法,揭示有一種包含將銀微粒子與溶劑混合而成的銀糊的接合材,且溶劑為二醇,並混合有具有一個以上的甲基的三醇作為添加劑。 [現有技術文獻] [專利文獻]Patent Document 1 discloses a bonding material comprising a silver paste in which silver fine particles and a solvent are mixed, and a solvent is a diol, and a mixture of one or more methyl groups is mixed. Triol is used as an additive. [Prior Art Document] [Patent Literature]

[專利文獻1]日本專利特開2016-8332號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2016-8332

[發明所欲解決之課題][Problems to be solved by the invention]

本發明者為了使用銀粒子燒結層作為接合材而對含有銀粒子的接合用組成物進行研究開發。而且,發現藉由在接合用組成物中調配分散介質等有機成分而可確保接合用組成物的良好的塗佈性(印刷性)或適用期(pot life)(可使用時間),但於用以燒結銀粒子的煅燒時容易產生孔隙(void)或剝離,就無法獲得所需的接合強度的方面而言,存在改善的餘地。The present inventors conducted research and development on a bonding composition containing silver particles in order to use a silver particle sintered layer as a bonding material. In addition, it has been found that by using an organic component such as a dispersion medium in the composition for bonding, it is possible to ensure good coatability (printability) or pot life (useable time) of the composition for bonding, but it is used. There is room for improvement in terms of voids or peeling at the time of firing of the sintered silver particles, and the desired joint strength cannot be obtained.

本發明是鑒於所述現狀而成者,目的在於提供一種確保接合用組成物的良好的操作性並且獲得高的接合強度的金屬接合積層體的製造方法。 [解決課題之手段]The present invention has been made in view of the above circumstances, and an object of the invention is to provide a method for producing a metal bonded laminate which ensures good workability of a bonding composition and obtains high joint strength. [Means for solving the problem]

本發明者對確保接合用組成物的良好的操作性並且獲得高的接合強度的金屬接合積層體的製造方法進行多種研究並著眼於接合用組成物中所含的有機成分。而且,本發明者進行了努力研究,結果發現,於將第二被接合體按壓至塗佈於第一被接合體的接合用組成物之前,以有機成分的含量維持4質量%以上的方式進行加熱乾燥處理,藉此確保接合用組成物的塗佈性(印刷性)或適用期(可使用時間),並且抑制銀粒子燒結層中的空隙率(孔隙率),獲得高的接合強度,從而完成了本發明。The inventors of the present invention have conducted various studies on a method for producing a metal bonded laminate which ensures good workability of the composition for bonding and which has high joint strength, and has focused on the organic component contained in the composition for bonding. In addition, the inventors of the present invention conducted an intensive study and found that the content of the organic component is maintained at 4% by mass or more before the second component to be bonded is applied to the bonding composition applied to the first to-be-joined body. Heating and drying treatment, thereby ensuring coatability (printability) or pot life (useable time) of the composition for bonding, and suppressing void ratio (porosity) in the sintered layer of silver particles, thereby obtaining high joint strength, thereby obtaining high joint strength The present invention has been completed.

本發明的金屬接合積層體的製造方法為利用銀粒子燒結層將第一被接合體與第二被接合體接合而成的金屬接合積層體的製造方法,且其特徵在於包括:步驟(1),對所述第一被接合體塗佈含有銀粒子及有機成分的接合用組成物;步驟(2),對所塗佈的所述接合用組成物進行加熱乾燥;步驟(3),將所述第二被接合體按壓至經加熱乾燥的所述接合用組成物;以及步驟(4),對所述接合用組成物進行加熱並使其燒結而形成所述銀粒子燒結層,並且所述步驟(2)中經加熱乾燥的所述接合用組成物中的所述有機成分的含量為4質量%以上。The method for producing a metal bonded laminate according to the present invention is a method for producing a metal bonded laminate in which a first bonded body and a second bonded body are joined by a silver sintered layer, and is characterized by comprising the following steps: (1) Applying a bonding composition containing silver particles and an organic component to the first to-be-joined body; and heating and drying the applied bonding composition in step (2); and step (3) The second joined body is pressed against the heat-dried bonding composition; and in the step (4), the bonding composition is heated and sintered to form the silver particle sintered layer, and the The content of the organic component in the bonding composition which is dried by heating in the step (2) is 4% by mass or more.

所述銀粒子燒結層的空隙率較佳為20體積%以下。The void ratio of the sintered silver particle layer is preferably 20% by volume or less.

所述步驟(2)中,較佳為於25℃以上且100℃以下的溫度下進行加熱乾燥。In the step (2), it is preferred to carry out heat drying at a temperature of 25 ° C or more and 100 ° C or less.

所述步驟(3)中,較佳為以1 MPa以下的負荷按壓所述第二被接合體。In the step (3), it is preferable that the second joined body is pressed with a load of 1 MPa or less.

所述步驟(4)中,較佳為於無加壓下將所述第一被接合體與所述第二被接合體接合。 [發明的效果]In the step (4), it is preferred that the first joined body and the second joined body are joined without pressure. [Effects of the Invention]

根據本發明,可提供一種確保接合用組成物的良好的操作性並且獲得高的接合強度的金屬接合積層體的製造方法。According to the present invention, it is possible to provide a method for producing a metal bonded laminate which ensures good workability of the joining composition and which has high joint strength.

本實施形態的金屬接合積層體的製造方法為利用銀粒子燒結層將第一被接合體與第二被接合體接合而成的金屬接合積層體的製造方法,且其特徵在於包括:步驟(1),對所述第一被接合體塗佈含有銀粒子及有機成分的接合用組成物;步驟(2),對所塗佈的所述接合用組成物進行加熱乾燥;步驟(3),將所述第二被接合體按壓至經加熱乾燥的所述接合用組成物;以及步驟(4),對所述接合用組成物進行加熱並使其燒結而形成所述銀粒子燒結層,並且所述步驟(2)中經加熱乾燥的所述接合用組成物中的所述有機成分的含量為4質量%以上。The method for producing a metal bonded laminate according to the present embodiment is a method for producing a metal bonded laminate in which a first joined body and a second joined body are joined by a silver sintered layer, and is characterized by comprising the steps (1) a bonding composition containing silver particles and an organic component to the first object to be joined, a step (2) of heating and drying the applied composition, and a step (3); The second object to be joined is pressed to the bonding composition that is dried by heating; and in the step (4), the bonding composition is heated and sintered to form the sintered layer of silver particles, and The content of the organic component in the bonding composition which is dried by heating in the step (2) is 4% by mass or more.

本實施形態中所製造的金屬接合積層體是利用銀粒子燒結層將第一被接合體與第二被接合體接合而成。第一被接合體及第二被接合體的種類並無特別限定,較佳為具備不會因接合用組成物的加熱燒結時的溫度而損傷的程度的耐熱性的構件,可為剛性(rigid),亦可為柔性(flexible)。另外,就獲得高的接合強度的觀點而言,第一被接合體及第二被接合體的接合面較佳為包含Cu、Ag、Au等金屬。另外,第一被接合體及第二被接合體的形狀及厚度並無特別限定,可適宜選擇。The metal bonded laminate produced in the present embodiment is obtained by joining a first joined body and a second joined body by a sintered layer of silver particles. The type of the first to-be-joined body and the second to-be-joined body is not particularly limited, and it is preferably a member having heat resistance that is not damaged by the temperature at the time of heating and sintering of the bonding composition, and may be rigid. ) can also be flexible. Further, from the viewpoint of obtaining high joint strength, the joint surface of the first joined body and the second joined body preferably contains a metal such as Cu, Ag or Au. Further, the shape and thickness of the first joined body and the second joined body are not particularly limited, and can be appropriately selected.

另外,第一被接合體及/或第二被接合體為了提高與銀粒子燒結層的密接性,亦可進行表面處理。作為所述表面處理,例如可列舉:電暈處理、電漿處理、紫外線(Ultra Violet,UV)處理、電子束處理等乾式處理、或於被接合體上設置底塗層或導電性糊接收層的方法等。Further, the first joined body and/or the second joined body may be subjected to surface treatment in order to improve adhesion to the sintered layer of silver particles. Examples of the surface treatment include dry treatment such as corona treatment, plasma treatment, ultraviolet (Ultra Violet (UV) treatment, and electron beam treatment, or providing an undercoat layer or a conductive paste receiving layer on the member to be joined. Method etc.

作為本實施形態中所製造的金屬接合積層體,例如可列舉電力用半導體元件(功率器件)。圖1是表示作為金屬接合積層體的一例的功率器件的構成的剖面示意圖。圖1所示的功率器件是利用接合材12將功率半導體晶片(第二被接合體)11的下表面與覆銅絕緣基板(第一被接合體)13的上表面接合。功率半導體晶片11的主體包含Si、SiC、GaN等,且對下表面實施有鍍Au。接合材12為藉由對含有銀粒子及有機成分的接合用組成物進行煅燒而獲得的銀粒子燒結層。覆銅絕緣基板13於包含氮化矽等的基材13a的兩面具有實施了鍍Ag的Cu層13b。有時亦不對Cu層13b實施鍍Ag。As the metal bonded laminate produced in the present embodiment, for example, a power semiconductor element (power device) can be cited. FIG. 1 is a schematic cross-sectional view showing a configuration of a power device as an example of a metal bonded laminate. In the power device shown in FIG. 1, the lower surface of the power semiconductor wafer (second bonded body) 11 is bonded to the upper surface of the copper-clad insulating substrate (first bonded body) 13 by the bonding material 12. The main body of the power semiconductor wafer 11 contains Si, SiC, GaN, or the like, and Au is plated on the lower surface. The bonding material 12 is a sintered silver particle layer obtained by firing a bonding composition containing silver particles and an organic component. The copper-clad insulating substrate 13 has a Cu layer 13b plated with Ag on both surfaces of a substrate 13a including tantalum nitride or the like. The Cu layer 13b is sometimes not plated with Ag.

於覆銅絕緣基板13的下方安裝有放熱材14及散熱片(heat sink)15以放出功率半導體晶片11中產生的熱。圖1中的箭頭表示熱的放出路徑。另外,於功率半導體晶片11的上部安裝有打線接合線16以對功率半導體晶片11供給電力。A heat releasing material 14 and a heat sink 15 are attached below the copper clad insulating substrate 13 to discharge heat generated in the power semiconductor wafer 11. The arrows in Figure 1 indicate the hot release path. Further, a wire bonding wire 16 is attached to the upper portion of the power semiconductor wafer 11 to supply electric power to the power semiconductor wafer 11.

包含所述銀粒子燒結層的接合材12可將功率半導體晶片11機械性、電性及熱性且牢固地接合於覆銅絕緣基板13上。於銀粒子為奈米尺寸的粒子的情況下,可藉由奈米粒子特有的熔點下降而以低溫使其燒結,且可實現接近於金屬箔的高的導電性或導熱性。另一方面,如先前般,於使用焊料作為接合材12的情況下,藉由將焊料熔解後使其凝固而進行接合。該情況下,接合材12的接合溫度為焊料的熔點,且接合材12的耐熱溫度(可使用的溫度)比焊料的熔點(接合溫度)低。因此,若欲提高接合材12的耐熱溫度,則接合溫度亦提高。功率器件的開發中,要求耐熱性或長期可靠性的提高,從而適宜使用較焊料而言高溫下的可靠性優異的銀粒子燒結層。此處,所謂長期可靠性,是指長期維持接合體的機械特性等,例如是指即便施加多個熱循環,接合體的機械特性等亦難以降低。The bonding material 12 including the sintered silver particle layer can bond the power semiconductor wafer 11 to the copper-clad insulating substrate 13 mechanically, electrically, and thermally. In the case where the silver particles are nanoparticles having a nanometer size, the melting point which is peculiar to the nanoparticles can be lowered and sintered at a low temperature, and high conductivity or thermal conductivity close to the metal foil can be achieved. On the other hand, as in the case of using the solder as the bonding material 12 as before, bonding is performed by melting the solder and solidifying it. In this case, the bonding temperature of the bonding material 12 is the melting point of the solder, and the heat resistant temperature (temperature that can be used) of the bonding material 12 is lower than the melting point (bonding temperature) of the solder. Therefore, if the heat resistant temperature of the bonding material 12 is to be increased, the bonding temperature is also increased. In the development of a power device, heat resistance or long-term reliability is required to be improved, and a silver particle sintered layer excellent in reliability at a high temperature compared to solder is preferably used. Here, the term "long-term reliability" means that the mechanical properties of the bonded body are maintained for a long period of time. For example, even if a plurality of thermal cycles are applied, it is difficult to reduce the mechanical properties of the bonded body.

所述銀粒子燒結層是將接合用組成物作為原料並經過所述步驟(1)~步驟(4)而形成。首先,自所述步驟(1)中使用的接合用組成物起進行說明。The silver particle sintered layer is formed by using the bonding composition as a raw material and passing through the steps (1) to (4). First, the bonding composition used in the above step (1) will be described.

<接合用組成物> 所述接合用組成物若含有銀粒子及有機成分,則並無特別限定,較佳為糊狀以容易進行塗佈。另外,除了銀粒子以外,亦可併用離子化序列比氫高價的金屬、即金、銅、鉑、鈀等的粒子以難以引起遷移(migration)。<Construction Composition> The composition for bonding is not particularly limited as long as it contains silver particles and an organic component, and is preferably in a paste form for easy application. Further, in addition to the silver particles, particles having a higher ionization sequence than hydrogen, that is, particles such as gold, copper, platinum, or palladium may be used in combination to prevent migration.

所述銀粒子的平均粒徑較佳為1 μm~20 μm。藉由使用平均粒徑為1 μm~20 μm的銀粒子,可減少燒結引起的體積收縮,且可獲得均質且緻密的接合材12。若使用平均粒徑小於1 μm的小粒子,則雖以低溫進行燒結,但若粒子彼此的燒結進展,則隨著平均粒徑的增加而體積收縮變大,存在被接合體無法追隨該體積收縮的擔憂。此種情況下,於接合材12中產生孔隙等缺陷,接合材12的接合強度及可靠性降低。另一方面,若使用平均粒徑大於20 μm的粒子,則低溫下的燒結幾乎並未進行,存在形成於粒子間的大的空隙於燒結後亦殘存的擔憂。The average particle diameter of the silver particles is preferably from 1 μm to 20 μm. By using silver particles having an average particle diameter of 1 μm to 20 μm, volume shrinkage due to sintering can be reduced, and a homogeneous and dense bonding material 12 can be obtained. When small particles having an average particle diameter of less than 1 μm are used, sintering is performed at a low temperature. However, as the sintering progresses between the particles, the volume shrinkage increases as the average particle diameter increases, and the joined body cannot follow the volume shrinkage. Worry. In this case, defects such as voids are generated in the bonding material 12, and the bonding strength and reliability of the bonding material 12 are lowered. On the other hand, when particles having an average particle diameter of more than 20 μm are used, sintering at a low temperature is hardly progressed, and there is a concern that large voids formed between the particles remain after sintering.

所述銀粒子的平均粒徑可利用動態光散射法(Dynamic Light Scattering)、小角度X射線散射法、廣角度X射線繞射法進行測定。本說明書中,所謂「平均粒徑」,是指分散中值徑。再者,作為測定平均粒徑的其他方法,可列舉:根據使用掃描式電子顯微鏡或穿透式電子顯微鏡拍攝的照片算出50個~100個左右的粒子的粒徑的算術平均值的方法。The average particle diameter of the silver particles can be measured by dynamic light scattering (Dynamic Light Scattering), small-angle X-ray scattering, and wide-angle X-ray diffraction. In the present specification, the "average particle diameter" means a dispersed median diameter. Further, as another method of measuring the average particle diameter, a method of calculating an arithmetic mean value of particle diameters of 50 to 100 particles based on a photograph taken using a scanning electron microscope or a transmission electron microscope is exemplified.

所述接合用組成物亦可含有粒徑比銀粒子小的金屬微粒子。金屬微粒子可與銀粒子分離而分散於接合用組成物中,亦可附著於銀粒子的表面的至少一部分。作為所述金屬,例如可列舉:金、銀、銅、鎳、鉍、錫、鐵及鉑族元素(釕、銠、鈀、鋨、銥及鉑)。其中,較佳為金、銀、銅及鉑,更佳為銀。該些金屬可單獨使用,亦可併用兩種以上而使用。The bonding composition may also contain metal fine particles having a particle diameter smaller than that of the silver particles. The metal fine particles may be dispersed in the bonding composition from the silver particles, or may be attached to at least a part of the surface of the silver particles. Examples of the metal include gold, silver, copper, nickel, ruthenium, tin, iron, and a platinum group element (ruthenium, rhodium, palladium, iridium, iridium, and platinum). Among them, gold, silver, copper and platinum are preferred, and silver is more preferred. These metals may be used singly or in combination of two or more.

所述金屬微粒子的平均粒徑只要為無損本發明的效果的範圍,則並無特別限制,金屬微粒子中,較佳為產生熔點下降的奈米尺寸,更佳為1 nm~100 nm。若金屬微粒子的平均粒徑為1 nm以上,則獲得可形成良好的接合材12的接合用組成物,且金屬微粒子的製造成本不會變高而實用。另外,若為100 nm以下,則金屬微粒子的分散性難以經時性變化而較佳。The average particle diameter of the metal fine particles is not particularly limited as long as it does not impair the effects of the present invention, and among the metal fine particles, a nanometer size at which the melting point is lowered is preferable, and more preferably 1 nm to 100 nm. When the average particle diameter of the metal fine particles is 1 nm or more, a bonding composition capable of forming a good bonding material 12 is obtained, and the production cost of the metal fine particles is not high and practical. On the other hand, when it is 100 nm or less, the dispersibility of the metal fine particles is less likely to change with time.

所述有機成分並無特別限定,除了分散介質以外,可使用以調整銀粒子的分散性、或接合用組成物的黏性、密接性、乾燥性、表面張力、塗佈性(印刷性)為目的而使用的添加物等。The organic component is not particularly limited, and may be used in addition to a dispersion medium to adjust the dispersibility of the silver particles, or the adhesion, adhesion, drying property, surface tension, and coatability (printability) of the composition for bonding. Additives and the like used for the purpose.

作為所述分散介質,例如可列舉烴、醇、卡必醇(carbitol)類等有機溶媒。分散介質較佳為於塗佈接合用組成物的步驟的期間內難以揮發者,較佳為於室溫下難以揮發者。Examples of the dispersion medium include organic solvents such as hydrocarbons, alcohols, and carbitols. The dispersion medium is preferably difficult to volatilize during the step of applying the composition for bonding, and is preferably difficult to volatilize at room temperature.

作為所述烴,可列舉:脂肪族烴、環狀烴、脂環式烴等,可分別單獨使用,亦可併用兩種以上。Examples of the hydrocarbons include aliphatic hydrocarbons, cyclic hydrocarbons, and alicyclic hydrocarbons, and they may be used alone or in combination of two or more.

作為所述脂肪族烴,例如可列舉:十四烷、十八烷、七甲基壬烷、四甲基十五烷、己烷、庚烷、辛烷、壬烷、癸烷、十三烷、甲基戊烷、正鏈烷烴(normal paraffin)、異鏈烷烴等飽和或不飽和脂肪族烴。Examples of the aliphatic hydrocarbons include tetradecane, octadecane, heptamethylnonane, tetramethylpentadecane, hexane, heptane, octane, decane, decane, and tridecane. A saturated or unsaturated aliphatic hydrocarbon such as methylpentane, normal paraffin or isoparaffin.

作為所述環狀烴,例如可列舉甲苯、二甲苯等。Examples of the cyclic hydrocarbon include toluene, xylene, and the like.

作為所述脂環式烴,例如可列舉:檸檬烯(limonene)、雙戊烯、萜品烯、松油烯(亦稱為萜品烯)、薴烯(nesol)、松油精(cinene)、甜橙香精(orange flavor)、萜品油烯、異松油烯(亦稱為萜品油烯)、水芹烯(phellandrene)、薄荷二烯(menthadiene)、芸香烯(terebene)、二氫傘花烴(dihydrocymene)、γ-萜品烯(moslene)、異萜品烯、異松油烯(亦稱為異萜品烯)、海茴香烯(crithmene)、薴(kautschin)、白千層萜(cajeputene)、檸烯(bulimen)、蒎烯(pinene)、松節油(turpentine)、薄荷烷(menthane)、蒎烷(pinane)、萜烯(terpene)、環己烷等。Examples of the alicyclic hydrocarbons include limonene, dipentene, terpinene, terpinene (also known as terpinene), nesol, and cinene. Orange flavor, terpinolene, terpinolene (also known as terpinolene), phellandrene, menthadiene, terebene, dihydroanimate Dihydrocymene, γ-terpinene (moslene), isodecene, isonene (also known as isoterpene), crithmene, kautschin, leukocholium (cajeputene), bulimen, pinene, turpentine, menthane, pinane, terpene, cyclohexane, and the like.

所述醇為於分子結構中包含一個以上的OH基的化合物,可列舉脂肪族醇、環狀醇、脂環式醇,可分別單獨使用,亦可併用兩種以上。另外,OH基的一部分亦可於無損本發明的效果的範圍內由乙醯氧基等衍生。The alcohol is a compound containing one or more OH groups in a molecular structure, and examples thereof include an aliphatic alcohol, a cyclic alcohol, and an alicyclic alcohol, and they may be used alone or in combination of two or more. Further, a part of the OH group may be derived from an ethenyloxy group or the like within the range which does not impair the effects of the present invention.

作為所述脂肪族醇,例如可列舉:庚醇、辛醇(1-辛醇、2-辛醇、3-辛醇等)、癸醇(1-癸醇等)、月桂基醇、十四基醇、鯨蠟醇、2-乙基-1-己醇、十八基醇、十六碳烯醇(hexadecenol)、油烯基醇等飽和或不飽和C6-30脂肪族醇等。Examples of the aliphatic alcohol include heptanol, octanol (1-octanol, 2-octanol, 3-octanol, etc.), decyl alcohol (1-nonanol, etc.), lauryl alcohol, and fourteen. A saturated or unsaturated C6-30 aliphatic alcohol such as a base alcohol, cetyl alcohol, 2-ethyl-1-hexanol, octadecyl alcohol, hexadecenol or oleyl alcohol.

作為所述環狀醇,例如可列舉甲酚、丁香酚(eugenol)等。Examples of the cyclic alcohol include cresol, eugenol, and the like.

作為所述脂環式醇,例如可列舉:環己醇等環烷醇、萜品醇(包含α、β、γ異構體、或該些的任意的混合物)、二氫萜品醇等萜烯醇(單萜烯醇等)、二氫松油醇、桃金孃烯醇(myrtenol)、蘇伯樓醇(sobrerol)、薄荷醇、香旱芹醇(carveol)、紫蘇醇(perillyl alcohol)、松香芹醇(pinocarveol)、索布瑞醇(sobrerol)、馬鞭烯醇(verbenol)等。Examples of the alicyclic alcohol include a cycloalkanol such as cyclohexanol, terpineol (including an α, β, γ isomer, or a mixture of any of these), and dihydroterpineol. Enol (monoterpene alcohol, etc.), dihydroterenol, myrtenol, sobrerol, menthol, carveol, perillyl alcohol , pine carveol (pinocarveol), sobrerol (sobrerol), waffenol (verbenol) and the like.

作為所述卡必醇類,例如可列舉:丁基卡必醇、丁基卡必醇乙酸酯、己基卡必醇等。Examples of the carbitol include butyl carbitol, butyl carbitol acetate, and hexyl carbitol.

所述接合用組成物中含有分散介質時的初始含量只要根據黏度等所需的特性進行調整即可,接合用組成物中的分散介質的初始含量較佳為1質量%~30質量%。若分散介質的初始含量為1質量%~30質量%,則可獲得於作為接合用組成物而容易使用的範圍內調整黏度的效果。分散介質的更佳的初始含量為1質量%~20質量%,進而佳的初始含量為4質量%~15質量%。The initial content in the case where the dispersion composition contains a dispersion medium may be adjusted according to characteristics required for viscosity or the like, and the initial content of the dispersion medium in the bonding composition is preferably from 1% by mass to 30% by mass. When the initial content of the dispersion medium is from 1% by mass to 30% by mass, the effect of adjusting the viscosity in a range that is easy to use as a composition for bonding can be obtained. A more preferable initial content of the dispersion medium is from 1% by mass to 20% by mass, and further preferably, the initial content is from 4% by mass to 15% by mass.

作為提高所述銀粒子的分散性的添加物,例如可列舉:胺、羧酸、高分子分散劑、不飽和烴等。胺或羧酸因官能基以適度的強度吸附於銀粒子的表面並防止銀粒子的彼此接觸,因此有助於保管狀態下的銀粒子的穩定性。吸附於銀粒子的表面的添加物於加熱時自粒子的表面轉移及/或揮發,藉此認為促進銀粒子彼此的熔接及與基材的接合。使所述高分子分散劑適量附著於銀粒子的至少一部分,藉此不會喪失銀粒子的低溫燒結性,且可保持分散穩定性。Examples of the additive for improving the dispersibility of the silver particles include an amine, a carboxylic acid, a polymer dispersant, and an unsaturated hydrocarbon. The amine or the carboxylic acid is adsorbed to the surface of the silver particles with a moderate strength and prevents the silver particles from coming into contact with each other, thereby contributing to the stability of the silver particles in the storage state. The additive adsorbed on the surface of the silver particles is transferred and/or volatilized from the surface of the particles upon heating, whereby it is considered that the silver particles are promoted to be bonded to each other and to the substrate. The polymer dispersant is allowed to adhere to at least a part of the silver particles, whereby the low-temperature sinterability of the silver particles is not lost, and the dispersion stability can be maintained.

較佳為有機成分附著於所述銀粒子的表面的至少一部分(即,銀粒子的表面的至少一部分由包含有機成分的有機保護層被覆),且有機成分(有機保護層)包含胺。理想的是於金屬粒子的表面的至少一部分設置有機保護層,以穩定地保管示出熔點下降能力的奈米尺寸的銀粒子。此處,胺因官能基以適度的強度吸附於銀粒子的表面,因此可適宜用作有機保護層。It is preferred that the organic component adheres to at least a part of the surface of the silver particle (that is, at least a part of the surface of the silver particle is coated with an organic protective layer containing an organic component), and the organic component (organic protective layer) contains an amine. It is preferable to provide an organic protective layer on at least a part of the surface of the metal particles to stably store the nano-sized silver particles showing the melting point lowering ability. Here, since the amine is adsorbed on the surface of the silver particles with a moderate strength, it can be suitably used as an organic protective layer.

所述胺並無特別限定,例如可例示:油烯基胺、丁基胺、戊基胺、己基胺、己基胺等烷基胺(直鏈狀烷基胺,亦可具有側鏈),N-(3-甲氧基丙基)丙烷-1,3-二胺、2-甲氧基乙基胺、3-甲氧基丙基胺、3-乙氧基丙基胺等烷氧基胺,環戊基胺、環己基胺等環烷基胺,苯胺等烯丙基胺等一級胺;二丙基胺、二丁基胺、哌啶、六亞甲基亞胺等二級胺;三丙基胺、二甲基丙烷二胺、環己基二甲基胺、吡啶、喹啉等三級胺;辛基胺等般的碳數為2~20左右者,較佳為使用碳數為4~7的胺。作為碳數為4~7的胺的具體例,可例示:庚基胺、丁基胺、戊基胺、及己基胺。碳數為4~7的胺於相對較低的溫度下轉移及/或揮發,因此可充分有效利用銀粒子的低溫燒結性。另外,所述胺可為直鏈狀,亦可為分支鏈狀,亦可具有側鏈。The amine is not particularly limited, and examples thereof include an alkylamine such as an oleylamine, a butylamine, a pentylamine, a hexylamine or a hexylamine (a linear alkylamine which may have a side chain), and N. Alkoxyamines such as -(3-methoxypropyl)propane-1,3-diamine, 2-methoxyethylamine, 3-methoxypropylamine, 3-ethoxypropylamine a primary amine such as a cycloalkylamine such as cyclopentylamine or cyclohexylamine; an allylamine such as aniline; a secondary amine such as dipropylamine, dibutylamine, piperidine or hexamethyleneimine; a tertiary amine such as propylamine, dimethylpropanediamine, cyclohexyldimethylamine, pyridine or quinoline; a carbon number of 2 to 20 such as octylamine or the like, preferably a carbon number of 4 ~7 amine. Specific examples of the amine having 4 to 7 carbon atoms include heptylamine, butylamine, pentylamine, and hexylamine. Since the amine having 4 to 7 carbon atoms is transferred and/or volatilized at a relatively low temperature, the low-temperature sinterability of the silver particles can be sufficiently utilized. Further, the amine may be linear, may be branched, or may have a side chain.

再者,亦認為該些有機成分於與銀粒子化學結合或物理結合的情況下變化為陰離子或陽離子,本實施形態中,源自該些有機成分的離子或錯合物等亦包含於所述有機成分中。Further, it is considered that the organic components are changed to an anion or a cation when chemically or physically bonded to the silver particles. In the present embodiment, ions or complexes derived from the organic components are also included in the embodiment. Among the organic ingredients.

所述胺亦可為包含例如羥基、羧基、烷氧基、羰基、酯基、巰基等胺以外的官能基的化合物。另外,所述胺可分別單獨使用,亦可併用兩種以上。此外,常溫下的沸點較佳為300℃以下,更佳為250℃以下。The amine may also be a compound containing a functional group other than an amine such as a hydroxyl group, a carboxyl group, an alkoxy group, a carbonyl group, an ester group or a mercapto group. Further, the amines may be used alone or in combination of two or more. Further, the boiling point at normal temperature is preferably 300 ° C or lower, more preferably 250 ° C or lower.

作為所述羧酸,可廣泛使用具有至少一個羧基的化合物,例如可列舉:甲酸、草酸、乙酸、己酸、丙烯酸、辛酸、乙醯丙酸(levulinic acid)、油酸等。羧酸的一部分的羧基亦可形成金屬離子與鹽。再者,關於該金屬離子,亦可包含兩種以上的金屬離子。As the carboxylic acid, a compound having at least one carboxyl group can be widely used, and examples thereof include formic acid, oxalic acid, acetic acid, caproic acid, acrylic acid, octanoic acid, levulinic acid, oleic acid and the like. A carboxyl group of a part of the carboxylic acid may also form a metal ion and a salt. Further, the metal ions may contain two or more kinds of metal ions.

所述羧酸亦可為包含例如胺基、羥基、烷氧基、羰基、酯基、巰基等羧基以外的官能基的化合物。該情況下,羧基的數量較佳為羧基以外的官能基的數量以上。另外,所述羧酸可分別單獨使用,亦可併用兩種以上。此外,常溫下的沸點較佳為300℃以下,更佳為250℃以下。The carboxylic acid may be a compound containing a functional group other than a carboxyl group such as an amine group, a hydroxyl group, an alkoxy group, a carbonyl group, an ester group or a fluorenyl group. In this case, the number of carboxyl groups is preferably at least the number of functional groups other than the carboxyl group. Further, the carboxylic acids may be used alone or in combination of two or more. Further, the boiling point at normal temperature is preferably 300 ° C or lower, more preferably 250 ° C or lower.

另外,胺與羧酸形成醯胺基。該醯胺基亦適度吸附於銀粒子表面,因此有機成分中亦可包含醯胺基。Further, the amine forms a guanamine group with the carboxylic acid. The guanamine group is also moderately adsorbed on the surface of the silver particles, and therefore the amide group may be contained in the organic component.

作為併用胺與羧酸時的組成比(質量),可於1/99~99/1的範圍內任意選擇,較佳為20/80~98/2,更佳為30/70~97/3。The composition ratio (mass) when the amine and the carboxylic acid are used in combination may be arbitrarily selected in the range of from 1/99 to 99/1, preferably from 20/80 to 98/2, more preferably from 30/70 to 97/3. .

作為所述高分子分散劑,可使用市售的高分子分散劑。作為市售的高分子分散劑,例如可列舉:索努帕斯(SOLSPERSE)11200、索努帕斯13940、索努帕斯16000、索努帕斯17000、索努帕斯18000、索努帕斯20000、索努帕斯24000、索努帕斯26000、索努帕斯27000、索努帕斯28000(以上,日本路博潤(Lubrizol)公司製造);迪斯帕畢克(DISPERBYK)142、迪斯帕畢克160、迪斯帕畢克161、迪斯帕畢克162、迪斯帕畢克163、迪斯帕畢克166、迪斯帕畢克170、迪斯帕畢克180、迪斯帕畢克182、迪斯帕畢克184、迪斯帕畢克190、迪斯帕畢克2155(以上,日本畢克化學(BYK-Chemie Japan)公司製造);埃夫卡(EFKA)-46、EFKA-47、EFKA-48、EFKA-49(以上,埃夫卡(EFKA)化學公司製造);聚合物(polymer)100、聚合物120、聚合物150、聚合物400、聚合物401、聚合物402、聚合物403、聚合物450、聚合物451、聚合物452、聚合物453(以上,埃夫卡(EFKA)化學公司製造);阿吉斯帕(Ajisper)PB711、阿吉斯帕PA111、阿吉斯帕PB811、阿吉斯帕PW911(以上,味之素公司製造);弗洛倫(Flowlen)DOPA-15B、弗洛倫DOPA-22、弗洛倫DOPA-17、弗洛倫TG-730W、弗洛倫G-700、弗洛倫TG-720W(以上,共榮社化學工業公司製造)等。就低溫燒結性及分散穩定性的觀點而言,較佳為使用索努帕斯11200、索努帕斯13940、索努帕斯16000、索努帕斯17000、索努帕斯18000、索努帕斯28000、迪斯帕畢克142或迪斯帕畢克2155。As the polymer dispersant, a commercially available polymer dispersant can be used. As a commercially available polymer dispersant, for example, SOSOLPERS 11200, Sonupas 13940, Sonupas 16000, Sonupas 17000, Sonupas 18000, Sonupas 20000, Sonupas 24000, Sonupas 26000, Sonupas 27000, Sonupas 28000 (above, manufactured by Lubrizol, Japan); DISPERBYK 142, Di Spabike 160, Despabike 161, Despabike 162, Despabike 163, Despabike 166, Despabike 170, Despabike 180, Diss Pabike 182, Despabike 184, Disparbike 190, Despabike 2155 (above, BYK-Chemie Japan); Efka (EFKA)-46 EFKA-47, EFKA-48, EFKA-49 (above, manufactured by EFKA Chemical Co., Ltd.); polymer 100, polymer 120, polymer 150, polymer 400, polymer 401, polymerization 402, polymer 403, polymer 450, polymer 451, polymer 452, polymer 453 (above, manufactured by EFKA Chemical Co., Ltd.); Ajisper PB711, Ajispa PA111, Ajispa PB811, Ajispa PW911 (above, Ajinomoto); Floren DOPA-15B, Floren DOPA- 22. Floren DOPA-17, Floren TG-730W, Floren G-700, Floren TG-720W (above, manufactured by Kyoeisha Chemical Industry Co., Ltd.), and the like. From the viewpoints of low-temperature sinterability and dispersion stability, it is preferable to use Sonupas 11200, Sonupas 13940, Sonupas 16000, Sonupas 17000, Sonupas 18000, Sonupa 28000, Despabike 142 or Despabike 2155.

所述高分子分散劑的含量較佳為0.1質量%~15質量%。若高分子分散劑的含量為0.1質量%以上,則獲得的接合用組成物的分散穩定性良好,但於含量過多的情況下,接合性降低。就此種觀點而言,高分子分散劑的更佳的含量為0.03質量%~3質量%,進而佳的含量為0.05質量%~2質量%。The content of the polymer dispersant is preferably from 0.1% by mass to 15% by mass. When the content of the polymer dispersant is 0.1% by mass or more, the dispersion stability of the obtained bonding composition is good, but when the content is too large, the bondability is lowered. From such a viewpoint, a more preferable content of the polymer dispersant is 0.03% by mass to 3% by mass, and further preferably a content of 0.05% by mass to 2% by mass.

所述銀粒子例如可將金屬離子源與分散劑混合並利用還原法而獲得。該情況下,可藉由調整所添加的分散劑或還原劑的量等來控制有機成分量。The silver particles can be obtained, for example, by mixing a metal ion source with a dispersing agent and using a reduction method. In this case, the amount of the organic component can be controlled by adjusting the amount of the added dispersant or reducing agent or the like.

為了調整附著於所述銀粒子的有機成分量,可使用對於銀粒子的加熱處理、利用酸(硫酸、鹽酸、硝酸等)的清洗、利用丙酮或甲醇等脂溶性有機溶劑的清洗等。再者,藉由在清洗中施加超音波而可更有效率地除去有機成分。In order to adjust the amount of the organic component adhering to the silver particles, heat treatment with silver particles, washing with an acid (sulfuric acid, hydrochloric acid, nitric acid, or the like), washing with a fat-soluble organic solvent such as acetone or methanol, or the like can be used. Furthermore, the organic component can be removed more efficiently by applying ultrasonic waves during cleaning.

作為所述不飽和烴,例如可列舉:乙烯、乙炔、苯、丙酮、1-己烯、1-辛烯、4-乙烯基環己烯、環己酮、萜烯系醇、烯丙基醇、油烯基醇、2-棕櫚油酸、芹子酸(petroselinic acid)、油酸、反油酸、天師酸(tianshic acid)、蓖麻油酸(ricinoleic acid)、亞麻油酸(linoleic acid)、反亞麻油酸(linolelaidic acid)、次亞麻油酸(linolenic acid)、花生油酸(arachidonic acid)、丙烯酸、甲基丙烯酸、沒食子酸、水楊酸等。Examples of the unsaturated hydrocarbon include ethylene, acetylene, benzene, acetone, 1-hexene, 1-octene, 4-vinylcyclohexene, cyclohexanone, decene alcohol, and allyl alcohol. , oleyl alcohol, 2-palmitoleic acid, petroselinic acid, oleic acid, anti-oleic acid, tianshic acid, ricinoleic acid, linoleic acid , linolelaidic acid, linolenic acid, arachidonic acid, acrylic acid, methacrylic acid, gallic acid, salicylic acid, and the like.

所述不飽和烴中,適宜使用具有羥基的不飽和烴。羥基容易配位於銀粒子的表面,從而可抑制該銀粒子的凝聚。作為具有羥基的不飽和烴,例如可列舉:萜烯系醇、烯丙基醇、油烯基醇、天師酸、蓖麻油酸、沒食子酸、水楊酸等。較佳為具有羥基的不飽和脂肪酸,例如可列舉:天師酸、蓖麻油酸、沒食子酸、水楊酸等。Among the unsaturated hydrocarbons, unsaturated hydrocarbons having a hydroxyl group are suitably used. The hydroxyl group is easily disposed on the surface of the silver particles, so that aggregation of the silver particles can be suppressed. Examples of the unsaturated hydrocarbon having a hydroxyl group include a terpene alcohol, an allyl alcohol, an oleyl alcohol, a ginsolic acid, ricinoleic acid, gallic acid, and salicylic acid. The unsaturated fatty acid having a hydroxyl group is preferably, for example, tianshi acid, ricinoleic acid, gallic acid, salicylic acid or the like.

另外,於無損本發明的效果的範圍內,所述有機成分中亦可包含發揮作為黏合劑的作用的寡聚物成分、樹脂成分、有機溶劑(可使固體成分的一部分溶解或分散)、界面活性劑、增稠劑、表面張力調整劑等。Further, in the range in which the effects of the present invention are not impaired, the organic component may include an oligomer component, a resin component, an organic solvent (a part of the solid component may be dissolved or dispersed), and an interface which functions as a binder. Active agent, thickener, surface tension modifier, and the like.

作為所述樹脂成分,例如可列舉:聚酯系樹脂、嵌段異氰酸酯等聚胺基甲酸酯系樹脂、聚丙烯酸酯系樹脂、聚丙烯醯胺系樹脂、聚醚系樹脂、三聚氰胺系樹脂、萜烯系樹脂等,該些可分別單獨使用,亦可併用兩種以上。Examples of the resin component include a polyester resin, a polyurethane resin such as a blocked isocyanate, a polyacrylate resin, a polypropylene phthalamide resin, a polyether resin, and a melamine resin. These may be used alone or in combination of two or more.

作為所述有機溶劑,將作為所述分散介質而列舉者除外,例如可列舉:甲基醇、乙基醇、正丙基醇、2-丙基醇、1,3-丙二醇、1,2-丙二醇、1,4-丁二醇、1,2,6-己烷三醇、1-乙氧基-2-丙醇、2-丁氧基乙醇、乙二醇、二乙二醇、三乙二醇,重量平均分子量為200以上且1,000以下的範圍內的聚乙二醇、丙二醇、二丙二醇、三丙二醇,重量平均分子量為300以上且1,000以下的範圍內的聚丙二醇、N,N-二甲基甲醯胺、二甲基亞碸、N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、甘油、丙酮等,該些可分別單獨使用,亦可併用兩種以上。The organic solvent is excluded as the dispersion medium, and examples thereof include methyl alcohol, ethyl alcohol, n-propyl alcohol, 2-propyl alcohol, 1,3-propanediol, and 1,2- Propylene glycol, 1,4-butanediol, 1,2,6-hexanetriol, 1-ethoxy-2-propanol, 2-butoxyethanol, ethylene glycol, diethylene glycol, triethyl Polyethylene glycol, propylene glycol, dipropylene glycol, and tripropylene glycol having a weight average molecular weight of 200 or more and 1,000 or less, and a polypropylene glycol having a weight average molecular weight of 300 or more and 1,000 or less, N, N-di Methylformamide, dimethylhydrazine, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, glycerin, acetone, etc., which may be used alone or in combination More than one species.

作為所述增稠劑,例如可列舉:黏土、膨潤土(bentonite)、鋰膨潤石(hectorite)等黏土礦物,聚酯系乳液樹脂、丙烯酸系乳液樹脂、聚胺基甲酸酯系乳液樹脂、嵌段異氰酸酯等乳液,甲基纖維素、羧基甲基纖維素、羥基乙基纖維素、羥基丙基纖維素、羥基丙基甲基纖維素等纖維素衍生物,三仙膠(xanthan gum)、瓜爾膠(guar gum)等多糖類,該些可分別單獨使用,亦可併用兩種以上。Examples of the thickener include clay minerals such as clay, bentonite, and hectorite, polyester emulsion resins, acrylic emulsion resins, and polyurethane emulsion resins. Emulsions such as segment isocyanate, cellulose derivatives such as methyl cellulose, carboxymethyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, hydroxypropyl methyl cellulose, xanthan gum, melon A polysaccharide such as guar gum may be used alone or in combination of two or more.

所述界面活性劑並無特別限定,可使用陰離子性界面活性劑、陽離子性界面活性劑、非離子性界面活性劑的任一種,例如可列舉烷基苯磺酸鹽、四級銨鹽等。因以少量的添加量便獲得效果,因此較佳為氟系界面活性劑。The surfactant is not particularly limited, and any of an anionic surfactant, a cationic surfactant, and a nonionic surfactant may be used, and examples thereof include an alkylbenzenesulfonate and a quaternary ammonium salt. A fluorine-based surfactant is preferred because an effect is obtained with a small amount of addition.

本實施形態的金屬接合積層體的製造方法中所使用的接合用組成物中的有機成分的初始含量較佳為5質量%~50質量%。若初始含量為5質量%以上,則存在接合用組成物的儲存穩定性良好的傾向,若為50質量%以下,則存在接合用組成物的導電性良好的傾向。有機成分的更佳的初始含量為5質量%~30質量%,進而佳的初始含量為5質量%~15質量%。The initial content of the organic component in the bonding composition used in the method for producing a metal bonded laminate of the present embodiment is preferably from 5% by mass to 50% by mass. When the initial content is 5% by mass or more, the storage stability of the bonding composition tends to be good, and when it is 50% by mass or less, the conductivity of the bonding composition tends to be good. A more preferable initial content of the organic component is 5% by mass to 30% by mass, and further preferably a preliminary content of 5% by mass to 15% by mass.

再者,作為將有機成分的初始含量調整為規定範圍的方法,簡便的是進行加熱而調整。另外,亦可藉由調整製作銀粒子時所添加的有機成分的量而進行,亦可改變銀粒子製備後的清洗條件或次數。加熱可利用烘箱或蒸發器等進行,亦可於減壓下進行。於在常壓下進行的情況下,既可於大氣中進行,亦可於惰性環境中進行。進而,亦可於後添加所述胺、羧酸等以對有機成分的初始含量進行微調整。Further, as a method of adjusting the initial content of the organic component to a predetermined range, it is simple to perform heating and adjustment. Further, it is also possible to adjust the amount of the organic component added when the silver particles are produced, and to change the cleaning conditions or the number of times after the preparation of the silver particles. The heating can be carried out using an oven or an evaporator or the like, or under reduced pressure. In the case of carrying out under normal pressure, it can be carried out in the atmosphere or in an inert environment. Further, the amine, carboxylic acid or the like may be added afterwards to finely adjust the initial content of the organic component.

再者,關於接合用組成物中所含的有機成分與其量,例如可藉由使用理學(rigaku)公司製造的TG-DTA/GC-MS的測定進行確認。關於該測定的條件,只要適宜進行調整即可,例如,只要進行將10 mg的試樣於大氣中保持為室溫~550℃(升溫速度10℃/分鐘)時的TG-DTA/GC-MS測定即可。In addition, the organic component and the amount contained in the composition for bonding can be confirmed, for example, by measurement using TG-DTA/GC-MS manufactured by Rigaku Corporation. The conditions for the measurement may be appropriately adjusted, for example, TG-DTA/GC-MS when 10 mg of the sample is kept at room temperature to 550 ° C (temperature up rate 10 ° C / min) in the atmosphere. It can be measured.

<步驟(1)> 所述步驟(1)中,對第一被接合體塗佈接合用組成物。此處,所謂「塗佈」,為既包含將接合用組成物塗佈為面狀的情況亦包含塗佈(描繪)為線狀的情況的概念。包含經塗佈、且藉由加熱而煅燒前的狀態的接合用組成物的塗膜的形狀可設為所需的形狀。因此,利用加熱而燒結後的本實施形態的接合材(銀粒子燒結層)12可為面狀及線狀的任一種,且於第一被接合體上可連續亦可不連續。<Step (1)> In the step (1), a bonding composition is applied to the first to-be-joined body. Here, the term "coating" includes the case where the bonding composition is applied in a planar shape, and the coating (drawing) is linear. The shape of the coating film containing the bonding composition which is applied and baked before being heated can be set to a desired shape. Therefore, the bonding material (silver particle sintered layer) 12 of the present embodiment which has been sintered by heating may be either planar or linear, and may be discontinuous or discontinuous in the first bonded body.

作為塗佈所述接合用組成物的方法,例如可自網版印刷(金屬遮罩(metal mask)印刷)、分配器法、針轉印(pin transfer)法、浸漬、噴霧方式、棒塗法、旋塗法、噴墨法、利用刷子的塗佈方式、流延法、柔版法、凹版法、平板法、轉印法、親水疏水圖案法、注射器法等中適宜選擇。As a method of applying the bonding composition, for example, screen printing (metal mask printing), dispenser method, pin transfer method, dipping, spraying method, and bar coating method can be used. The spin coating method, the inkjet method, the coating method using a brush, a casting method, a flexographic method, a gravure method, a flat plate method, a transfer method, a hydrophilic hydrophobic pattern method, a syringe method, and the like are suitably selected.

所述接合用組成物的黏度例如較佳為0.01 Pa·S~5000 Pa·S的範圍,更佳為0.1 Pa·S~1000 Pa·S的範圍,進而佳為1 Pa·S~100 Pa·S的範圍。藉由設為該黏度範圍,可應用廣泛的方法作為塗佈接合用組成物的方法。黏度的調整可藉由銀粒子的粒徑的調整、有機成分的含量的調整、各成分的調配比的調整、增稠劑的添加等進行。接合用組成物的黏度例如可利用錐板(cone plate)型黏度計(例如安東帕(Anton Paar)公司製造的流變儀(Rheometer)MCR301)進行測定。The viscosity of the bonding composition is, for example, preferably in the range of 0.01 Pa·S to 5000 Pa·S, more preferably in the range of 0.1 Pa·S to 1000 Pa·S, and further preferably 1 Pa·S to 100 Pa· The scope of S. By setting this viscosity range, a wide range of methods can be applied as a method of coating a composition for bonding. The viscosity can be adjusted by adjusting the particle diameter of the silver particles, adjusting the content of the organic component, adjusting the blending ratio of each component, and adding a thickener. The viscosity of the bonding composition can be measured, for example, by a cone plate type viscometer (for example, a rheometer MCR301 manufactured by Anton Paar Co., Ltd.).

<步驟(2)> 所述步驟(2)中,對所塗佈的接合用組成物(塗膜)進行加熱乾燥。塗佈於第一被接合體的接合用組成物為了確保塗佈性(印刷性)及適用期(可使用時間)而有機成分的量多,若直接按壓第二被接合體並進行加熱燒結,則生成的銀粒子燒結層中大量產生空隙(孔隙)。因此,於將第二被接合體按壓至接合用組成物之前,步驟(2)中對接合用組成物進行加熱乾燥,預先減少接合用組成物中的有機成分的含量。此時,若過度減少接合用組成物中的有機成分的含量,則第二被接合體與接合用組成物並未充分密接,因此產生孔隙或剝離。因此,步驟(2)中的加熱乾燥(預乾燥)是以經加熱乾燥的接合用組成物中的有機成分的含量為4質量%以上的方式進行。另外,就抑制所生成的銀粒子燒結層中產生孔隙的觀點而言,經加熱乾燥的接合用組成物中的有機成分的含量較佳為設為6質量%以下。<Step (2)> In the step (2), the applied bonding composition (coating film) is dried by heating. The bonding composition applied to the first to-be-joined body has a large amount of organic components in order to ensure applicability (printability) and pot life (useable time), and when the second to-be-joined body is directly pressed and heated and sintered, Then, a large amount of voids (pores) are generated in the sintered layer of the generated silver particles. Therefore, before the second object to be joined is pressed to the bonding composition, the bonding composition is heated and dried in the step (2), and the content of the organic component in the bonding composition is reduced in advance. At this time, when the content of the organic component in the bonding composition is excessively reduced, the second to-be-joined body and the bonding composition are not sufficiently adhered to each other, so that voids or peeling occur. Therefore, the heat drying (pre-drying) in the step (2) is carried out so that the content of the organic component in the bonding composition which is dried by heating is 4% by mass or more. In addition, the content of the organic component in the heat-drying bonding composition is preferably 6% by mass or less from the viewpoint of suppressing generation of voids in the sintered silver particle sintered layer.

所述步驟(2)中的加熱溫度(預乾燥溫度)較佳為25℃以上且100℃以下。若小於25℃,則無法使接合用組成物中的分散介質效率良好地揮發。若超過100℃,雖可使分散介質充分揮發,但附著於銀粒子的分散劑的一部分亦揮發,存在開始燒結的擔憂,該情況下,於按壓第二被接合體時無法使其密接,難以進行無加壓下的接合。預乾燥溫度的更佳的下限為50℃,進而佳的下限為60℃。再者,預乾燥後的接合用組成物中的有機成分實質上並不含有具有預乾燥的最高溫度以下的沸點的有機成分。所述步驟(2)中的加熱時間並無特別限定,較佳為進行至接合用組成物中的有機成分的含量不會發生變化為止。進行所述步驟(2)中的加熱乾燥的方法並無特別限定,例如可使用先前公知的烘箱等。The heating temperature (pre-drying temperature) in the step (2) is preferably 25 ° C or more and 100 ° C or less. If it is less than 25 ° C, the dispersion medium in the bonding composition cannot be volatilized efficiently. When it exceeds 100 ° C, the dispersion medium can be sufficiently volatilized, but a part of the dispersing agent adhering to the silver particles is volatilized, and there is a fear that sintering starts. In this case, it is difficult to adhere the second joined body when it is pressed. Bonding without pressure is performed. A more preferred lower limit of the pre-drying temperature is 50 ° C, and a preferred lower limit is 60 ° C. Further, the organic component in the pre-dried bonding composition does not substantially contain an organic component having a boiling point equal to or lower than the highest temperature pre-dried. The heating time in the step (2) is not particularly limited, and it is preferred that the content of the organic component in the composition for bonding does not change. The method of performing the heat drying in the step (2) is not particularly limited, and for example, a previously known oven or the like can be used.

<步驟(3)> 所述步驟(3)中,將第二被接合體按壓至經加熱乾燥的接合用組成物。第二被接合體較佳為以1 MPa以下的負荷被按壓。若按壓負荷超過1 MPa,則有功率半導體晶片11等的第二被接合體中產生損壞(damage)(表面的劃傷或裂痕)之虞。按壓負荷較佳為0.05 MPa以上。若按壓負荷小於0.05 MPa,則密接不足而存在產生剝離的擔憂。進行所述步驟(3)中的第二被接合體的按壓的方法並無特別限定,可應用先前公知的各種方法,較佳為均勻地對經加熱乾燥的接合用組成物(乾燥塗膜)進行加壓的方法。<Step (3)> In the step (3), the second joined body is pressed to the heat-dried joining composition. The second joined body is preferably pressed with a load of 1 MPa or less. When the pressing load exceeds 1 MPa, damage (scratch or crack of the surface) may occur in the second joined body of the power semiconductor wafer 11 or the like. The pressing load is preferably 0.05 MPa or more. When the pressing load is less than 0.05 MPa, the adhesion is insufficient and there is a concern that peeling may occur. The method of pressing the second joined body in the step (3) is not particularly limited, and various conventionally known methods can be applied, and it is preferable to uniformly heat the dried bonding composition (dry coating film). The method of applying pressure.

順便一提,於在步驟(3)後進行預乾燥的情況下,無法使分散介質效率良好地揮發,且與於步驟(3)之前進行預乾燥的情況相比,不僅花費長時間而且於由第一被接合體與第二被接合體夾持的狀態下,分散介質僅自塗膜側方揮發,因此僅塗膜端部開始接合且於塗膜內部容易殘留有機成分而產生孔隙。By the way, in the case of pre-drying after the step (3), the dispersion medium cannot be volatilized efficiently, and it takes not only a long time but also a case of pre-drying before the step (3). In a state in which the first to-be-joined body and the second to-be-joined body are sandwiched, the dispersion medium volatilizes only from the side of the coating film. Therefore, only the end portions of the coating film are joined, and the organic component is likely to remain in the coating film to cause voids.

<步驟(4)> 所述步驟(4)中,對接合用組成物進行加熱並使其燒結而形成銀粒子燒結層。步驟(2)的預加熱中,有機成分中主要是分散介質揮發而附著於銀粒子的分散劑等殘存於接合用組成物內,藉由步驟(4)中的加熱,而接合用組成物中的有機成分的大部分或全部揮發。本實施形態中,於接合用組成物包含黏合劑成分的情況下,就接合材的強度提高及被接合構件間的接合強度提高等觀點而言,黏合劑成分亦被燒結,視情況,可為了應用於各種印刷法而將調整接合用組成物的黏度作為黏合劑成分的主要目的,並且控制煅燒條件而將黏合劑成分全部去除。關於銀粒子燒結層,就獲得高的接合強度與高的可靠性的方面而言,有機成分的殘存量以少為佳,較佳為實質上並不含有有機成分,亦可於無損本發明的效果的範圍內殘存有機成分的一部分。銀粒子燒結層中的有機成分的含量較佳為小於1質量%。<Step (4)> In the step (4), the bonding composition is heated and sintered to form a sintered silver particle layer. In the pre-heating of the step (2), a dispersant or the like which mainly disperses the dispersion medium and adheres to the silver particles in the organic component remains in the bonding composition, and is heated by the step (4) to form a bonding composition. Most or all of the organic components are volatilized. In the present embodiment, when the bonding composition contains the binder component, the binder component is sintered in view of the improvement of the strength of the bonding material and the bonding strength between the bonding members. It is applied to various printing methods to adjust the viscosity of the bonding composition as a main component of the binder component, and the calcination conditions are controlled to remove all of the binder components. Regarding the silver particle sintered layer, in terms of obtaining high joint strength and high reliability, the residual amount of the organic component is preferably small, preferably not substantially containing the organic component, and the present invention may be omitted. A part of the organic component remains in the range of the effect. The content of the organic component in the sintered layer of silver particles is preferably less than 1% by mass.

另外,藉由步驟(4)中的加熱,不僅於接合用組成物內銀粒子彼此結合,而且於第一被接合體及第二被接合體與銀粒子燒結層的界面附近,金屬於鄰接的層間互相擴散。藉此,於第一被接合體與銀粒子燒結層之間、及第二被接合體與銀粒子燒結層之間形成牢固的結合。Further, by the heating in the step (4), not only the silver particles in the bonding composition are bonded to each other, but also the metal is adjacent to the interface between the first joined body and the second joined body and the sintered layer of the silver particles. The layers spread out. Thereby, a strong bond is formed between the first joined body and the sintered silver particle layer, and between the second joined body and the sintered silver particle layer.

所述步驟(4)可一邊對第一被接合體與第二被接合體進行加壓一邊進行接合,亦可於無加壓下將第一被接合體與第二被接合體接合。無加壓下的接合不會同時進行加壓與加熱,因此生產性優異。於在無加壓下進行接合的情況下,因對接合用組成物進行加熱並使其燒結時的有機成分的揮發,而容易於銀粒子燒結層內產生空隙,本實施形態中,藉由步驟(2)的預乾燥而接合用組成物中的有機成分的含量經調整,因此即便於無加壓下進行接合亦抑制空隙的產生,獲得具有高的接合強度的銀粒子燒結層(接合材)。因此,關於本實施形態的方法,步驟(4)中適宜的是於無加壓下將第一被接合體與第二被接合體接合的情況。In the step (4), the first joined body and the second joined body may be joined while being pressed, or the first joined body and the second joined body may be joined without pressure. The bonding without pressurization does not simultaneously pressurize and heat, and therefore is excellent in productivity. When the bonding is performed under no pressure, volatilization of the organic component when the bonding composition is heated and sintered is likely to cause voids in the silver particle sintering layer. In the present embodiment, the step is performed by the step. (2) The pre-drying and the content of the organic component in the composition for bonding are adjusted, so that the occurrence of voids is suppressed even when the bonding is performed without pressure, and a sintered layer of silver particles (joining material) having high bonding strength is obtained. . Therefore, in the method of the present embodiment, the step (4) is preferably a case where the first joined body and the second joined body are joined without pressure.

步驟(4)中的加熱溫度若可形成銀粒子燒結層,則並無特別限定,較佳為200℃~300℃。若加熱溫度為200℃~300℃,則防止第一被接合體及第二被接合體中的損壞,並且可藉由蒸發或分解而將有機成分等去除,且獲得高的接合強度。另外,於進行加熱時,可使溫度階段性地提高或降低,較佳為自室溫升溫。步驟(4)中的加熱時間並無特別限定,只要根據加熱溫度且以充分獲得接合強度的方式進行調整即可。進行步驟(4)中的加熱的方法並無特別限定,例如可使用先前公知的烘箱等。The heating temperature in the step (4) is not particularly limited as long as it can form a sintered layer of silver particles, and is preferably 200 to 300 °C. When the heating temperature is 200 ° C to 300 ° C, damage in the first joined body and the second joined body is prevented, and the organic component or the like can be removed by evaporation or decomposition, and high joint strength can be obtained. Further, when heating is performed, the temperature may be gradually increased or decreased, and it is preferred to raise the temperature from room temperature. The heating time in the step (4) is not particularly limited as long as it is adjusted in accordance with the heating temperature and sufficiently obtaining the joint strength. The method of performing the heating in the step (4) is not particularly limited, and for example, a previously known oven or the like can be used.

關於所述銀粒子燒結層,就獲得機械性、電性及熱性牢固的接合狀態的觀點而言,較佳為緻密的燒結體,具體而言,銀粒子燒結層的空隙率較佳為20體積%以下。根據本實施形態的金屬接合積層體的製造方法,即便於無加壓下進行接合,亦可容易形成空隙率為5體積%~20體積%的銀粒子燒結層。The sintered silver particle layer is preferably a dense sintered body from the viewpoint of obtaining a mechanically, electrically and thermally bonded state. Specifically, the sintered ratio of the silver particle sintered layer is preferably 20% by volume. %the following. According to the method for producing a metal bonded laminate of the present embodiment, even if the bonding is performed without pressure, a sintered silver particle layer having a void ratio of 5 vol% to 20 vol% can be easily formed.

所述銀粒子燒結層的厚度例如為10 μm~200 μm,較佳為20 μm~100 μm。The thickness of the sintered silver particle layer is, for example, 10 μm to 200 μm, preferably 20 μm to 100 μm.

根據本實施形態,如先前所述,藉由步驟(2)的預乾燥而接合用組成物中的有機成分的含量經調整,因此可提高煅燒前的接合用組成物對第一被接合體及第二被接合體的密接性,獲得空隙率低、且具有高的接合強度的銀粒子燒結層(接合材)。再者,銀粒子燒結層的厚度可藉由塗膜的厚度而容易地控制。 [實施例]According to the present embodiment, as described above, since the content of the organic component in the bonding composition is adjusted by the pre-drying in the step (2), the bonding composition before firing can be improved on the first bonded body and The adhesion of the second to-be-joined body is a sintered silver particle layer (joining material) having a low void ratio and high joint strength. Further, the thickness of the sintered layer of the silver particles can be easily controlled by the thickness of the coating film. [Examples]

以下,揭示實施例而對本發明進行更詳細說明,但本發明並不僅限定於該些實施例。Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited to the examples.

<實施例1> 對3-甲氧基丙基胺2.0 g一邊利用磁攪拌器(magnetic stirrer)充分進行攪拌,一邊添加草酸銀3.0 g而使其增稠。將獲得的黏性物質放入恆溫槽並使其反應,之後添加10 g乙醯丙酸進而使其反應而獲得懸浮液。其次,為了對懸浮液的分散介質進行置換而添加甲醇並進行攪拌,之後利用離心分離使表面由乙醯丙酸被覆的銀粒子沈澱並分離,並捨棄上清液。將該操作再重覆一次。對該表面由乙醯丙酸被覆的銀粒子1 g與微米銀粒子(福田金屬箔粉工業公司製造,Ag-HWQ1.5)1 g添加作為分散介質的十三醇0.05 g、丁基卡必醇乙酸酯0.06 g、蓖麻油酸0.005 g並進行攪拌混合,獲得含有銀粒子及有機成分的接合用組成物A。<Example 1> 2.0 g of 3-methoxypropylamine was sufficiently stirred by a magnetic stirrer, and 3.0 g of silver oxalate was added to make it thick. The obtained viscous substance was placed in a thermostatic chamber and allowed to react, and then 10 g of acetaminophen was added and further reacted to obtain a suspension. Next, in order to replace the dispersion medium of the suspension, methanol was added and stirred, and then silver particles coated with acetamidine on the surface were precipitated and separated by centrifugation, and the supernatant was discarded. Repeat this operation again. Add 1 g of silver particles coated with acetopropionic acid to the surface and 1 g of micron silver particles (Ag-HWQ 1.5, manufactured by Fukuda Metal Foil Co., Ltd.) as a dispersion medium, 0.05 g of tridecyl alcohol, butyl carbene 0.06 g of an alcohol acetate and 0.005 g of ricinoleic acid were stirred and mixed to obtain a bonding composition A containing silver particles and an organic component.

使用金屬遮罩將獲得的接合用組成物A於鍍銀的銅板(20 mm見方)上塗佈11 mm見方,作為預乾燥而放入至設定為70℃的烘箱中並乾燥3分鐘。於經乾燥的接合用組成物A上積層實施了鍍金的Si晶片(底面積10 mm×10 mm),並以0.2 MPa進行按壓。The obtained bonding composition A was coated on a silver-plated copper plate (20 mm square) with a metal mask to a thickness of 11 mm square, pre-dried, placed in an oven set at 70 ° C, and dried for 3 minutes. A gold-plated Si wafer (bottom area: 10 mm × 10 mm) was laminated on the dried bonding composition A, and pressed at 0.2 MPa.

而且,將獲得的積層體放入至回流爐(新派庫斯(shinapex)公司製造),於大氣中自室溫以3.8℃/分鐘的升溫速度升溫至最高溫度250℃後,保持60分鐘而進行煅燒處理,從而形成銀粒子燒結層。於煅燒處理時,並不進行加壓而於無加壓下進行。藉由形成銀粒子燒結層,完成利用銀粒子燒結層將鍍銀的銅板(第一被接合體)與實施了鍍金的Si晶片(第二被接合體)接合而成的金屬接合積層體。Furthermore, the obtained laminated body was placed in a reflow furnace (manufactured by Shinapex Co., Ltd.), and heated in the air at room temperature at a temperature increase rate of 3.8 ° C /min to a maximum temperature of 250 ° C, and then calcined for 60 minutes. Processing to form a sintered layer of silver particles. At the time of the calcination treatment, it was carried out without pressurization without pressure. By forming a sintered layer of silver particles, a metal bonded laminate in which a silver-plated copper plate (first bonded body) and a gold-plated Si wafer (second bonded body) are joined by a silver particle sintered layer is completed.

<實施例2> 於氮氣環境下實施煅燒處理,並且代替鍍銀的銅板而使用利用稀硫酸進行了超音波清洗的無垢銅板,除此以外,與實施例1同樣地製作金屬接合積層體。<Example 2> A metal bonded laminate was produced in the same manner as in Example 1 except that the calcination treatment was carried out in a nitrogen atmosphere, and a silver-free copper plate was used instead of the silver-plated copper plate.

<實施例3> 代替十三醇0.05 g及丁基卡必醇乙酸酯0.06 g而添加己基卡必醇0.2 g而獲得接合用組成物B,並且將預乾燥時間變為15分鐘,除此以外,與實施例1同樣地製作金屬接合積層體。<Example 3> In place of 0.05 g of tridecyl alcohol and 0.06 g of butyl carbitol acetate, 0.2 g of hexyl carbitol was added to obtain a bonding composition B, and the pre-drying time was changed to 15 minutes. A metal bonded laminate was produced in the same manner as in Example 1.

<實施例4> 於氮氣環境下實施煅燒處理,並且代替鍍銀的銅板而使用利用稀硫酸進行了超音波清洗的無垢銅板,除此以外,與實施例3同樣地製作金屬接合積層體。<Example 4> A metal bonded laminate was produced in the same manner as in Example 3 except that the calcination treatment was carried out in a nitrogen atmosphere, and a silver-free copper plate was used instead of the silver-plated copper plate.

<實施例5> 將煅燒處理中的最高溫度設為280℃,除此以外,與實施例3同樣地製作金屬接合積層體。<Example 5> A metal bonded laminate was produced in the same manner as in Example 3 except that the maximum temperature in the calcination treatment was 280 °C.

<實施例6> 將預乾燥中的溫度與時間設為100℃、5分鐘,除此以外,與實施例3同樣地製作金屬接合積層體。<Example 6> A metal bonded laminate was produced in the same manner as in Example 3 except that the temperature and the time in the pre-drying were changed to 100 ° C for 5 minutes.

<實施例7> 代替3-甲氧基丙基胺而添加3-乙氧基丙基胺1.5 g與二甘醇胺0.4 g而獲得接合用組成物C,除此以外,與實施例3同樣地製作金屬接合積層體。<Example 7> The same procedure as in Example 3 except that 1.5 g of 3-ethoxypropylamine and 0.4 g of diglycolamine were added in place of 3-methoxypropylamine to obtain a composition C for bonding. A metal bonded laminate is produced.

<實施例8> 於氮氣環境下實施煅燒處理,並且代替鍍銀的銅板而使用利用稀硫酸進行了超音波清洗的無垢銅板,除此以外,與實施例7同樣地製作金屬接合積層體。<Example 8> A metal bonded laminate was produced in the same manner as in Example 7 except that the calcination treatment was carried out in a nitrogen atmosphere, and a silver-free copper plate was used instead of the silver-plated copper plate.

<比較例1> 將3-甲氧基丙基胺8.0 g與十二基胺0.40 g混合並利用磁攪拌器充分進行攪拌而製備胺混合液。對胺混合液一邊進行攪拌,一邊添加草酸銀6.0 g與銀粒子(三井金屬礦業公司製造,還原粉,D50(中值徑)=1.5 μm)10 g,使其增黏。將獲得的黏性物質放入恆溫槽並使其反應,獲得懸浮液。為了對懸浮液的分散介質進行置換而添加甲醇並進行攪拌,之後利用離心分離使表面由銀微粒子被覆的銀粒子沈澱並分離,並捨棄上清液。將該操作再重覆一次。對該表面由銀微粒子被覆的銀粒子15 g添加作為分散介質的十三醇0.4 g、丁基卡必醇乙酸酯0.4 g、蓖麻油酸0.01 g並進行攪拌混合,獲得接合用組成物D。除了獲得接合用組成物D以外,與實施例1同樣地製作金屬接合積層體。<Comparative Example 1> An amine mixed liquid was prepared by mixing 8.0 g of 3-methoxypropylamine with 0.40 g of dodecylamine and sufficiently stirring with a magnetic stirrer. While stirring the amine mixed solution, 6.0 g of silver oxalate and 10 g of silver particles (manufactured by Mitsui Mining and Mining Co., Ltd., reduced powder, D50 (median diameter) = 1.5 μm) were added to make the adhesive. The obtained viscous substance was placed in a thermostatic chamber and allowed to react to obtain a suspension. In order to replace the dispersion medium of the suspension, methanol was added and stirred, and then silver particles coated with silver fine particles on the surface were precipitated and separated by centrifugation, and the supernatant was discarded. Repeat this operation again. To the 15 g of silver particles coated with silver fine particles on the surface, 0.4 g of tridecyl alcohol as a dispersion medium, 0.4 g of butyl carbitol acetate, and 0.01 g of ricinoleic acid were added and stirred to obtain a composition for bonding D. . A metal bonded laminate was produced in the same manner as in Example 1 except that the bonding composition D was obtained.

<比較例2> 除了並未進行預乾燥以外,與實施例1同樣地製作金屬接合積層體。<Comparative Example 2> A metal bonded laminate was produced in the same manner as in Example 1 except that pre-drying was not performed.

<比較例3> 除了並未進行預乾燥以外,與實施例3同樣地製作金屬接合積層體。<Comparative Example 3> A metal bonded laminate was produced in the same manner as in Example 3 except that pre-drying was not performed.

<比較例4> 將預乾燥中的溫度與時間設為100℃、10分鐘,除此以外,與實施例3同樣地製作金屬接合積層體。<Comparative Example 4> A metal bonded laminate was produced in the same manner as in Example 3 except that the temperature and the time in the pre-drying were changed to 100 ° C for 10 minutes.

[評價試驗] 使用實施例及比較例中製作的接合用組成物進行下述評價試驗。將其結果示於表1中。[Evaluation Test] The following evaluation tests were carried out using the bonding compositions produced in the examples and the comparative examples. The results are shown in Table 1.

(1)銀粒子的平均粒徑的測定 利用如下方法獲得銀粒子的平均粒徑:根據使用日立高新技術(Hitachi High-Technologies)公司製造的掃描式電子顯微鏡(型號:S4800)以200000倍拍攝的照片,算出50個~100個左右的粒子的粒徑的算術平均值。(1) Measurement of Average Particle Diameter of Silver Particles The average particle diameter of silver particles was obtained by the following method: 200,000 times according to a scanning electron microscope (model: S4800) manufactured by Hitachi High-Technologies Co., Ltd. In the photograph, the arithmetic mean of the particle diameters of 50 to 100 particles is calculated.

(2)預乾燥後的有機成分的含量的測定 於預乾燥前後對接合用組成物的質量進行測定,以獲得的質量為基礎並使用下述式算出預乾燥後的有機成分的含量。 有機成分的揮發量(g)=所塗佈的接合用組成物的質量(g)-預乾燥後的接合用組成物的質量(g) 預乾燥後的有機成分的含量(質量%)={有機成分的添加量(g)-有機成分的揮發量(g)/所塗佈的接合用組成物的質量(g)}×100(2) Measurement of Content of Organic Component after Pre-drying The mass of the composition for bonding was measured before and after pre-drying, and the content of the organic component after pre-drying was calculated based on the obtained mass and using the following formula. The amount of volatilization of the organic component (g) = mass (g) of the composition for bonding to be applied - mass of the component for pre-drying (g) content of organic component after pre-drying (% by mass) = { Amount of addition of organic component (g) - amount of volatilization of organic component (g) / mass of coated composition (g)} × 100

(3)接合強度的測定 於常溫下使用接合試驗機(bond tester)(力世科(rhesca)公司製造)進行接合強度試驗。(3) Measurement of joint strength A joint strength test was carried out at room temperature using a bond tester (manufactured by Rhesca Co., Ltd.).

(4)空隙率(孔隙率)的測定 藉由研磨使金屬接合積層體的剖面露出並利用掃描式電子顯微鏡進行剖面觀察。根據獲得的電子顯微鏡照片,並將銀粒子燒結層內的空隙的面積除以銀粒子燒結層的整體面積而算出空隙率。將空隙率為20%以下設為○,將為21%~30%設為△,將為31%以上設為×。另外,與空隙率的值無關,將存在大的空隙或所接合的界面剝離的情況設為×。(4) Measurement of void ratio (porosity) The cross section of the metal bonded laminate was exposed by polishing and observed by a scanning electron microscope. The void ratio was calculated from the obtained electron micrograph and the area of the void in the sintered layer of the silver particles was divided by the entire area of the sintered layer of the silver particles. The void ratio is 20% or less, ○, 21% to 30% is Δ, and 31% or more is ×. Further, regardless of the value of the void ratio, the case where a large void or a joint interface is peeled off is set to ×.

[表1] [Table 1]

如根據表1得知般,實施例1~實施例8中,於對塗佈於鍍銀的銅板(第一被接合體)上的接合用組成物按壓實施了鍍金的Si晶片(第二被接合體)之前,以接合用組成物中的有機成分的含量為4質量%以上的程度進行了預乾燥,因此關於所製作的金屬接合積層體,銀粒子燒結層的空隙率低,獲得高的接合強度。As described in Table 1, in Examples 1 to 8, the gold-plated Si wafer was pressed against the bonding composition applied to the silver-plated copper plate (first bonded body) (the second was Before the bonded body), the content of the organic component in the composition for bonding is pre-dried to a level of 4% by mass or more. Therefore, the sintered metal silver layered product has a low void ratio and a high porosity. Bonding strength.

另一方面,比較例1中,接合用組成物D中的有機成分的含量少,且預乾燥後的接合用組成物中的有機成分的含量為3.2質量%,因此即便按壓實施了鍍金的Si晶片,亦不會充分密接。因此,銀粒子燒結層的空隙率變低,無法獲得高的接合強度。另外,比較例2及比較例3中,並未進行預乾燥,因此於銀粒子燒結層內大量產生空隙(孔隙)而接合強度低。另外,比較例4中,預乾燥溫度高,且預乾燥後的接合用組成物中的有機成分的含量為3.5質量%,因此即便按壓實施了鍍金的Si晶片,亦不會充分密接。因此,銀粒子燒結層的空隙率變低,無法獲得高的接合強度。On the other hand, in Comparative Example 1, the content of the organic component in the bonding composition D was small, and the content of the organic component in the bonding composition after pre-drying was 3.2% by mass, so that even the gold-plated Si was pressed. The wafer will not be fully bonded. Therefore, the void ratio of the sintered layer of silver particles becomes low, and high joint strength cannot be obtained. Further, in Comparative Example 2 and Comparative Example 3, since pre-drying was not performed, voids (pores) were generated in a large amount in the sintered layer of the silver particles, and the joint strength was low. Further, in Comparative Example 4, since the pre-drying temperature was high and the content of the organic component in the pre-dried bonding composition was 3.5% by mass, even if the gold-plated Si wafer was pressed, it would not be sufficiently adhered. Therefore, the void ratio of the sintered layer of silver particles becomes low, and high joint strength cannot be obtained.

11‧‧‧功率半導體晶片11‧‧‧Power semiconductor wafer

12‧‧‧接合材12‧‧‧Material

13‧‧‧覆銅絕緣基板13‧‧‧Copper-clad insulating substrate

13a‧‧‧基材13a‧‧‧Substrate

13b‧‧‧Cu層13b‧‧‧Cu layer

14‧‧‧放熱材14‧‧‧heating materials

15‧‧‧散熱片15‧‧‧ Heat sink

16‧‧‧打線接合線16‧‧‧Wire bonding wire

圖1是表示作為金屬接合積層體的一例的功率器件(power device)的構成的剖面示意圖。FIG. 1 is a schematic cross-sectional view showing a configuration of a power device as an example of a metal bonded laminate.

Claims (5)

一種金屬接合積層體的製造方法,其為利用銀粒子燒結層將第一被接合體與第二被接合體接合而成的所述金屬接合積層體的製造方法,且其特徵在於包括: 步驟(1),對所述第一被接合體塗佈含有銀粒子及有機成分的接合用組成物; 步驟(2),對所塗佈的所述接合用組成物進行加熱乾燥; 步驟(3),將所述第二被接合體按壓至經加熱乾燥的所述接合用組成物;以及 步驟(4),對所述接合用組成物進行加熱並使其燒結而形成所述銀粒子燒結層,並且 所述步驟(2)中經加熱乾燥的所述接合用組成物中的所述有機成分的含量為4質量%以上。A method for producing a metal bonded laminated body, which is a method for producing the metal joined laminated body obtained by joining a first joined body and a second joined body by a silver particle sintered layer, and characterized in that: 1) applying a bonding composition containing silver particles and an organic component to the first object to be joined; and heating and drying the applied bonding composition in step (2); and (3), Pressing the second object to be bonded to the bonding composition that is dried by heating; and step (4), heating and sintering the bonding composition to form the sintered layer of silver particles, and The content of the organic component in the bonding composition which is dried by heating in the step (2) is 4% by mass or more. 如申請專利範圍第1項所述的金屬接合積層體的製造方法,其中所述銀粒子燒結層的空隙率為20體積%以下。The method for producing a metal bonded laminate according to claim 1, wherein the sintered silver oxide layer has a void ratio of 20% by volume or less. 如申請專利範圍第1項或第2項所述的金屬接合積層體的製造方法,其中所述步驟(2)中於25℃以上且100℃以下的溫度下進行加熱乾燥。The method for producing a metal bonded laminate according to the first or second aspect of the invention, wherein the step (2) is carried out by heating and drying at a temperature of 25 ° C or more and 100 ° C or less. 如申請專利範圍第1項或第2項所述的金屬接合積層體的製造方法,其中所述步驟(3)中以1 MPa以下的負荷按壓所述第二被接合體。The method for producing a metal bonded laminate according to the above aspect, wherein in the step (3), the second joined body is pressed with a load of 1 MPa or less. 如申請專利範圍第1項或第2項所述的金屬接合積層體的製造方法,其中所述步驟(4)中於無加壓下將所述第一被接合體與所述第二被接合體接合。The method for producing a metal bonded laminate according to the above aspect, wherein in the step (4), the first joined body and the second joined are joined without pressure. Body bonding.
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