TW201911003A - Transparent electrode laminate, method of manufacturing the same, and touch sensor having the same - Google Patents

Abstract

In a method for producing a transparent electrode laminate, a first transparent oxide electrode layer having a predetermined thickness is formed on a base layer. A second transparent oxide electrode layer is formed on the first transparent oxide electrode layer. A transmittance and a chromaticity (b*) of the entire laminate are adjusted by adjusting a thickness of the second transparent oxide electrode layer. The thickness of the second transparent oxide electrode layer can be adjusted to produce the transparent electrode laminate and a touch sensor having desired color characteristics, optical characteristics, and improved electrical and mechanical characteristics.

Description

Transparent electrode laminate and manufacturing method thereof

The present invention relates to a transparent electrode laminate and a method for manufacturing the same. More specifically, the present invention relates to a transparent electrode laminate including a plurality of transparent conductive layers and a method for manufacturing the same.

In recent years, with the development of information technology, various forms of requirements have been added in the display field. As a result, various flat panel displays, such as a liquid crystal display, a plasma display, an EL display, and an organic light emitting diode display, which have characteristics such as thinness, weight reduction, and low power consumption, have been studied.

In addition, a touch panel or a touch sensor as an input device for inputting a user command is combined with a display device as an instruction content pasted on the display, displayed by a human hand or an object selection screen, and the display device is simultaneously implemented. Electronic devices such as display functions and information input functions are being developed.

In the case of the above-mentioned touch sensor, a sensing electrode containing a transparent conductive oxide for user's touch sensing can be arranged on a substrate. If the touch sensor is inserted into a display device, the image quality displayed by the display device may be reduced by the sensing electrode. For example, there is a case where the sensing electrode is visually recognized by a user, and the image is disturbed. In addition, the color sensing of an image may be changed by the sensing electrode.

Therefore, when designing the above-mentioned sensing electrode, it is necessary to maintain prescribed conductivity and sensitivity for touch sensing, and also consider optical characteristics for improving image quality.

Recently, for example, as shown in Korean Laid-Open Patent No. 2014-0092366, a touch screen panel incorporating a touch sensor on various image display devices is being developed, but a touch screen with improved optical characteristics as described above is being developed. The demand for sensors or touch panels continues.

(Prior art literature)

Patent literature

Patent Document 1: Korean Published Patent No. 2014-0092366

(Problems to be solved by the invention)

The present invention aims to provide a transparent electrode laminate having improved color feeling and optical characteristics.

Moreover, this invention aims at providing the manufacturing method of the transparent electrode laminated body which has the improved color feeling and optical characteristics.

Further, the present invention aims to provide a touch sensor including the transparent electrode laminate.

(Means for solving problems)

A method for manufacturing a transparent electrode laminate, comprising the steps of forming a first transparent oxide electrode layer of a predetermined thickness on a substrate layer, and forming a second transparent oxide electrode layer on the first transparent oxide electrode layer The stage of forming the second transparent oxide electrode layer includes adjusting the thickness of the second transparent oxide electrode layer to adjust the transmittance and chromaticity (b *) of the entire laminated body.

2. The method of manufacturing a transparent electrode laminate according to item 1, wherein the first transparent oxide electrode layer includes indium zinc oxide (IZO), and the second transparent oxide electrode layer includes indium tin oxide ( ITO).

3. The method for manufacturing a transparent electrode laminate according to the item 1, wherein the thickness of the second transparent oxide electrode layer is adjusted to a range of 120 to 150 nm, and the chromaticity (b *) of the entire laminate is adjusted to 5 or less.

4. The method for manufacturing a transparent electrode laminate according to the item 1, wherein the thickness of the second transparent oxide electrode layer is adjusted to a range of 120 to 140 nm, and the chromaticity (b *) of the entire laminate is adjusted to The range is 0.9 ~ 4.7.

5. The method for manufacturing a transparent electrode laminate according to the item 1, wherein the first transparent oxide electrode layer has a thickness within a range of 10 to 20 nm.

6. The method for manufacturing a transparent electrode laminate according to the item 1, wherein the transmittance of the entire laminate is adjusted to 87% or more.

7. The method for manufacturing a transparent electrode laminate according to the item 1, further comprising a step of forming a refractive index integration layer on the base material layer before forming the first transparent oxide electrode layer.

8. The method for manufacturing a transparent electrode laminate according to the item 7, wherein the step of forming the refractive index integration layer includes sequentially forming a first refractive index integration layer and a second refractive index integration layer having mutually different refractive indices.

9. A transparent electrode laminate comprising: a substrate layer; a first transparent oxide electrode layer containing indium zinc oxide (IZO) laminated on the substrate layer; and a laminate on the first transparent oxide electrode layer. A second transparent oxide electrode layer containing indium tin oxide (ITO); the thickness of the second transparent oxide electrode layer is 120 to 150 nm, the overall transmittance of the laminate is 87% or more, and the chromaticity (b * ) Is 5 or less.

10. The transparent electrode laminate according to item 9, wherein the thickness of the second transparent oxide electrode layer is 120 to 140 nm, and the chromaticity (b *) of the entire laminate is 0.9 to 4.7.

11. The transparent electrode laminate according to item 9, wherein a thickness of the first transparent oxide electrode layer is 10 to 20 nm.

12. The transparent electrode laminate according to item 1, further comprising a refractive index integration layer formed between the substrate layer and the first transparent oxide electrode layer.

13. The transparent electrode laminate according to item 12, wherein the refractive index integration layer includes a first refractive index integration layer and a second refractive index integration layer, which are laminated in this order from the substrate layer, and the first refractive index integration layer. It has a refractive index greater than that of the second refractive index integration layer.

14. A touch sensor comprising the transparent electrode laminate according to any one of items 9-13.

(Effect of the invention)

An embodiment of the present invention is related to a transparent electrode laminate, which may include, for example, a first transparent oxide electrode layer including indium zinc oxide (IZO) and a second transparent oxide electrode including indium tin oxide (ITO). Floor. By adjusting the thickness of the second transparent oxide electrode layer, the chromaticity (b *) of the transparent electrode laminate can be adjusted. Thereby, the desired chromaticity of the transparent electrode laminate can be easily adjusted according to the structure of the image display device.

In addition, by adjusting the thickness of the second transparent oxide electrode layer so as to have a predetermined transmittance within the chromaticity range, optical characteristics including chromaticity and transmittance can be improved as a whole.

Further, by fixing or maintaining the thickness of the first transparent oxide electrode layer within a predetermined range, the mechanical stability of the transparent electrode laminate can be improved.

According to the transparent electrode laminate, a touch sensor with improved optical characteristics and mechanical reliability can be manufactured, and a bulls-eye chart image and chromaticity can be easily realized at a high resolution in an image display device.

Embodiments of the present invention provide a transparent electrode laminate having a predetermined chromaticity by including a first transparent oxide electrode layer and a second transparent oxide electrode layer, and adjusting the thickness of the second transparent oxide electrode layer, and a method for manufacturing the same. .

Hereinafter, embodiments of the present invention will be described in more detail with reference to the drawings. However, the accompanying drawings in this specification illustrate preferred embodiments of the present invention, and serve to explain the invention in detail and help to further understand the technical idea of the present invention. Therefore, the present invention should not be interpreted as It is limited to the matters described in the drawings.

FIG. 1 is a schematic cross-sectional view showing a transparent electrode laminate according to an exemplary embodiment.

As shown in FIG. 1, the transparent electrode laminate 100 may include a base material layer 105, and a first transparent oxide electrode layer 160 and a second transparent oxide electrode layer 170 formed on the base material layer 105.

The base material layer 105 is a film-type base material used as a base layer for the formation of the transparent oxide electrode layers 160 and 170, or is used in the meaning of an object body including the transparent oxide electrode layers 160 and 170 to be formed. In some embodiments, the base material layer 105 may also refer to a display panel in which a touch sensor is to be formed or laminated. In some embodiments, the base material layer 105 may include a window substrate of an image display device.

For example, as the base material layer 105, a substrate or a film material generally used in a touch sensor may be used without particular limitation, and for example, glass, a polymer, and / or an inorganic insulating material may be used. Examples of the polymer include cyclic olefin polymer (COP), polyethylene terephthalate (PET), polyacrylate (PAR), polyetherimine (PEI), and polynaphthalene. Ethylene glycol formate (PEN), polyphenylene sulfide (PPS), polyarylate (polyallylate), polyimide (PI), cellulose acetate propionate (CAP), polyether hydrazone (PES), triacetic acid Cellulose (TAC), polycarbonate (PC), cycloolefin copolymer (COC), polymethyl methacrylate (PMMA), etc. Examples of the inorganic insulating material include silicon oxide, silicon nitride, silicon oxynitride, and metal oxides.

The first transparent oxide electrode layer 160 may be formed on the substrate layer 105 by an evaporation process such as a sputtering process.

According to an exemplary embodiment, the first transparent oxide electrode layer 160 can be formed so as to include indium zinc oxide (IZO). For example, the first transparent oxide electrode layer 160 can be formed by a sputtering process using a target whose weight ratio of indium oxide (In ₂ O ₃ ) and zinc oxide (ZnO) is adjusted.

In one embodiment, the weight ratio of zinc oxide in the first transparent oxide electrode layer 160 may be about 5-15% by weight.

The thickness of the first transparent oxide electrode layer 160 can be adjusted within a range of about 10 to 20 nm.

The first transparent oxide electrode layer 160 is formed by using IZO, which has relatively improved mechanical stability and surface characteristics compared to indium tin oxide (ITO). On the other hand, by adjusting the thickness within the above range, it is possible to suppress or reduce Influence of transmittance and chromaticity adjusted by the second transparent oxide electrode layer 170.

According to the exemplary embodiment, as described above, the first transparent oxide electrode layer 160 can be relatively formed by a low-temperature process using IZO, and therefore, damage to the base material layer 105 can be prevented. For example, the first transparent oxide electrode layer 160 can be formed by a low-temperature evaporation process in a range of about 20 to 130 ° C.

A second transparent oxide electrode layer 170 can be formed on the first transparent oxide electrode layer 160. The second transparent oxide electrode layer 170 can be formed so as to include a substance having a relatively higher transmittance and conductivity than the first transparent oxide electrode layer 160.

In an exemplary embodiment, the second transparent oxide electrode layer 170 can be formed by an evaporation process such as a sputtering process in a manner including ITO.

For example, the second transparent oxide electrode layer 170 can be formed by a sputtering process using a target whose weight ratio of indium oxide (In2O3) and tin oxide (SnO2) is adjusted. In one embodiment, a weight ratio of tin oxide in the second transparent oxide electrode layer 170 may be about 5 to 15% by weight.

According to the exemplary embodiment, by adjusting the thickness of the second transparent oxide electrode layer 170, the chromaticity and transmittance of the transparent electrode laminate 100 can be adjusted.

In some embodiments, the thickness of the second transparent oxide electrode layer 170 can be adjusted within a range of about 120 to 150 nm. In some embodiments, the chromaticity (b * in the L * a * b * color system) of the transparent electrode laminate 100 can be adjusted to about 5 or less within the thickness range of the second transparent oxide electrode layer 170.

In one embodiment, the thickness of the second transparent oxide electrode layer 170 can be adjusted in a range of about 120 to 140 nm, and the chromaticity of the transparent electrode laminate 100 can be adjusted in a range of about 0.9 to 4.7.

For example, when the transparent electrode laminate 100 is used as a sensing electrode of a touch sensor, the above-mentioned touch sensor can be inserted as an intermediate film structure of an image display device. Depending on the resolution and image quality of the image display device, the position within the image display device in which the touch sensor is inserted, the required chromaticity of the touch sensor may be different.

According to the exemplary embodiment, in the transparent electrode laminate 100, for example, the chromaticity of the entire transparent electrode laminate 100 can be easily adjusted by adjusting the thickness of the second transparent oxide electrode layer 170 containing ITO. In addition, by adjusting the chromaticity to a range of about 5 or less, preferably about 0.9 to 4.7 within the above-mentioned thickness range, it is possible to prevent the image in the image display device from being deformed or disturbed due to color deviation.

In addition, by adjusting the thickness of the second transparent oxide electrode layer 170 to the above range, the transmittance of the entire transparent electrode laminate 100 can be adjusted to about 87% or more. When the transmittance of the transparent electrode laminate 100 is less than about 87%, the electrodes may be visually recognized by the user of the touch sensor, and the image quality of the image display device may be deteriorated.

The second transparent oxide electrode layer 170 can be formed so as to include a substance (for example, ITO) having improved conductivity and transmittance as compared with the first transparent oxide electrode layer 160, and can also have a thickness greater than that of the first transparent oxide electrode. The layer 160 is formed in a greater thickness.

Therefore, the second transparent oxide electrode layer 170 can finely adjust the chromaticity while ensuring the conductivity and transmittance of the touch sensor. In addition, the first transparent oxide electrode layer 160 can be provided, for example, as a barrier against external impurities penetrating from the base material 105 side to the second transparent oxide 170, and can improve the sensitivity of the sensing electrode included in the touch sensor. Mechanical stability.

The second transparent oxide electrode layer 170 can be formed by a high-temperature process compared to the first transparent oxide electrode layer 160. For example, the second transparent oxide electrode layer 170 can be formed by a vapor deposition process at a temperature of about 30 to 230 ° C.

In some embodiments, the first transparent oxide electrode layer 160 and the second transparent oxide electrode layer 170 are in contact with each other. In this case, the sensing electrodes of the touch sensor can have a two-layer structure. Among the sensing electrodes, as described above, the first transparent oxide electrode layer 160 may be provided by a barrier electrode or a supporting electrode, and the second transparent oxide electrode layer 170 may be adjusted by conductivity, transmittance, and chromaticity. Electrode provided.

FIG. 2 is a schematic cross-sectional view showing a transparent electrode laminate according to an exemplary embodiment.

As shown in FIG. 2, a refractive index integration layer 140 can be formed between the first transparent oxide electrode layer 160 and the base material layer 105. The refractive index integration layer 140, for example, has a refractive index between the refractive index of the base material layer 105 and the refractive index of the transparent oxide electrode layers 160 and 170, and can buffer the first transparent oxide electrode layer 160 and the base material layer 105. Refractive index changes.

In some embodiments, as shown in FIG. 2, the refractive index integration layer 140 can be sequentially stacked from the top of the base material layer 105, and includes a first refractive index integration layer 120 and a first refractive index integration layer having mutually different refractive indexes. Two refractive index integration layer 130. In one embodiment, the refractive index of the first refractive index integration layer 120 may be higher than the refractive index of the second refractive index integration layer 130.

For example, the refractive index integration layer 140 may include an organic insulating material such as an acrylic resin, a siloxane resin, or an inorganic insulating material such as silicon oxide or silicon nitride. In one embodiment, the refractive index integration layer 140 may further include titanium oxide (TiO ₂ ), zirconia (ZrO ₂ ), tin oxide (SnO ₂ ), aluminum oxide (Al ₂ O ₃ ), and tantalum oxide (Ta ₂ O ₅ ) waiting for inorganic particles. For example, the inorganic particles are contained in the first refractive index integration layer 120, and the refractive index can be relatively increased.

In the transparent electrode laminate 100a, the thickness of the refractive index integration layer 140 can be set so as not to affect the chromaticity and transmittance adjusted by the second transparent oxide electrode layer 170.

For example, the thickness of the first refractive index integration layer 120 may be about 10-80 nm. The thickness of the second refractive index integration layer 130 may be about 100-200 nm.

FIG. 3 is a schematic cross-sectional view showing a transparent electrode laminate according to an exemplary embodiment.

As shown in FIG. 3, the transparent electrode laminate 100 b may include a hard coat layer formed on at least one surface of the base material layer 105. In some embodiments, the hard coat layer may include a first hard coat layer 110 a formed on a bottom surface of the base material layer 105 and a second hard coat layer 110 b formed on an upper surface of the base material layer 105.

The hard coat layers 110a and 110b are formed using, for example, a hard coat composition containing a photocurable compound, a photoinitiator, and a solvent, so that the flexibility, abrasion resistance, and surface hardness of the base material layer 105 can be further improved. .

The photocurable compound may include, for example, a siloxane-based compound, an acrylate-based compound, a compound having a (meth) acrylfluorenyl group, or a vinyl group. These compounds may be used alone or in combination of two or more.

In some embodiments, the base material layer 105 may be provided in a window of an image display device, and the above-mentioned bottom surface of the base material layer 105 or the first hard coat layer 110 a may be disposed on the visual side of the user.

FIG. 4 is a schematic cross-sectional view showing a touch sensor according to an exemplary embodiment.

As shown in FIG. 4, the touch sensor can include a sensing electrode 150 formed on the base material layer 105. As described above, the sensing electrode 150 can include a stacked structure of the first transparent oxide electrode layer 160 and the second transparent oxide electrode layer 170.

In some embodiments, the touch sensor can be driven in a mutual capacitance (Mutual-Capacitance) manner. In this case, in order to detect the touch position of the user, the sensing electrode 150 may include a first sensing electrode and a second sensing electrode that are arranged in a cross direction in mutually different directions (eg, the X direction and the Y direction).

For example, in the case of the first sensing electrode, the unit patterns are connected to each other through a connecting portion and are extended into a sensing line shape, and a plurality of the sensing lines may be arranged. The second sensing electrode can include unit patterns that are physically isolated from each other. For example, it may further include a bridge electrode in which the aforementioned first sensing electrode is placed in the middle and the second sensing electrodes adjacent to each other are electrically connected. In this case, an insulating pattern is formed at the intersection of the connection portion and the bridge electrode, and the first and second sensing electrodes can be insulated from each other.

In one embodiment, the connection portion and the bridge electrode may further include a stacked structure of the first transparent oxide electrode layer 160 and the second transparent oxide electrode layer 170.

In some embodiments, the touch sensor can include a touch sensor driven by a self-capacitance method. In this case, the sensing electrode 150 can include unit patterns that are physically isolated from each other. Each of the aforementioned unit patterns may be electrically connected to the driving circuit through a trace or a wiring.

The insulating layer 180 can cover the sensing electrode 150 on the base material layer 105. The insulating layer 180 can be formed of, for example, an inorganic insulating material such as silicon oxide, or a transparent organic material such as an acrylic resin.

As described with reference to FIG. 2, the refractive index integration layer 140 can be formed on the base material layer 105. In a region between the adjacent sensing electrodes 150, for example, in a region where the sensing electrodes 150 are not formed, the refractive index integration layer 140 is exposed, and the refractive index difference between the electrode region and the non-electrode region can suppress or reduce the electrode Recognize.

An embodiment of the present invention provides a touch sensor or a touch screen panel including the transparent electrode laminate. In addition, an embodiment of the present invention provides an image display device such as an OLED device or an LCD device including the above-mentioned touch sensor.

In the above-mentioned image display device, for example, on a display panel such as an OLED panel or an LCD panel, a touch sensor as shown in FIG. 4 can be laminated. The display panel may include a graphic element circuit including a thin film transistor (TFT) arranged on a display substrate, and a graphic element portion or a light emitting portion electrically connected to the graphic element circuit.

A polarizing plate can also be laminated between the display panel and the touch sensor, or on the touch sensor. A window can be arranged on the touch sensor and provided as a protective member. In some embodiments, the transparent electrode laminate or the base material layer 105 of the touch sensor may be provided as the window.

Hereinafter, the characteristics of the optical laminate of the present invention will be described in detail using specific examples. These examples are only used to illustrate the present invention and do not limit the scope of the appended patent claims. For these embodiments, it is obvious to a person skilled in the art that various changes and modifications can be made within the scope of the present invention and the technical idea, and these changes and modifications naturally fall within the scope of the appended claims.

Experimental example

A COP material substrate layer (manufactured by Zeon Corporation, having a thickness of 40.5 μm) having an acrylic hard coat layer of 1.38 μm formed on the upper and lower sides was prepared. A first refractive index integration layer (with a thickness of 50 nm) and a second refractive index integration layer (with a thickness of 170 nm) were sequentially formed on the substrate layer. The first refractive index integrated layer and the second refractive index integrated layer each contain an acrylic resin, and the first refractive index integrated layer is formed using a resin in which inorganic particles are additionally dispersed.

On the second refractive index integration layer, IZO was evaporated by a sputtering process to form a first transparent oxide electrode layer having a thickness of 10 nm. Subsequently, ITO is deposited on the first transparent oxide electrode layer through a sputtering process to form a second transparent oxide electrode layer, thereby manufacturing a transparent electrode laminate.

The transmittance and chromaticity (a *, b *) of the entire transparent electrode laminate were measured while changing the thickness of the second transparent oxide electrode layer. CM-3600A (manufactured by Minolta) was used to measure transmittance and chromaticity.

The measurement results are shown in Table 1 below. FIG. 5 is a graph showing changes in transmittance and b * value due to changes in the thickness of the second transparent oxide electrode layer. 【Table 1】

As can be seen from Tables 1 and 5, the value of chromaticity (b *) increases as the thickness of the second transparent oxide electrode layer increases. By adjusting the thickness between about 120 and 150 nm, it can maintain 87%. Above the transmittance, and adjust the value of chromaticity (b *) to 5 or less. In addition, by adjusting the thickness of the second transparent oxide electrode layer to between approximately 120 and 140 nm, the value of chromaticity (b *) can be maintained within a range of 0.9 to 4.7.

100, 100a, 100b ‧‧‧ transparent electrode laminate

105‧‧‧ substrate layer

110a‧‧‧First hard coating 110a

110b‧‧‧Second hard coating 110b

120‧‧‧ first refractive index integration layer

130‧‧‧Second refractive index integration layer

140‧‧‧ refractive index integration layer

150‧‧‧sensing electrode

160‧‧‧The first transparent oxide electrode layer

170‧‧‧Second transparent oxide electrode layer

180‧‧‧ Insulation

FIG. 1 is a schematic cross-sectional view showing a transparent electrode laminate according to an exemplary embodiment. FIG. 2 is a schematic cross-sectional view showing a transparent electrode laminate according to an exemplary embodiment. FIG. 3 is a schematic cross-sectional view showing a transparent electrode laminate according to an exemplary embodiment. FIG. 4 is a schematic cross-sectional view showing a touch sensor according to an exemplary embodiment. FIG. 5 is a graph showing changes in the b * value due to changes in the thickness of the second transparent oxide electrode layer.

Claims (14)

A method for manufacturing a transparent electrode laminate includes a step of forming a first transparent oxide electrode layer with a predetermined thickness on a substrate layer, and forming a second transparent oxide electrode layer on the first transparent oxide electrode layer. The stage of forming the second transparent oxide electrode layer includes adjusting the thickness of the second transparent oxide electrode layer to adjust the transmittance and chromaticity (b *) of the entire laminated body. The method for manufacturing a transparent electrode laminate as described in item 1 of the patent application scope, wherein the first transparent oxide electrode layer includes indium zinc oxide (IZO), and the second transparent oxide electrode layer includes Indium tin oxide (ITO). The method for manufacturing a transparent electrode laminate as described in item 1 of the scope of patent application, wherein the thickness of the second transparent oxide electrode layer is adjusted to a range of 120 to 150 nm, and the chromaticity of the entire laminate ( b *) Adjust below 5. The method for manufacturing a transparent electrode laminate as described in item 1 of the scope of patent application, wherein the thickness of the second transparent oxide electrode layer is adjusted to a range of 120 to 140 nm, and the chromaticity of the entire laminate b *) Adjust to the range of 0.9 ~ 4.7. The method for manufacturing a transparent electrode laminate as described in item 1 of the scope of the patent application, wherein the first transparent oxide electrode layer has a thickness within a range of 10 to 20 nm. The method for manufacturing a transparent electrode laminate as described in item 1 of the scope of patent application, wherein the transmittance of the entire laminate is adjusted to 87% or more. The method for manufacturing a transparent electrode laminate according to item 1 of the patent application scope, further comprising a step of forming a refractive index integration layer on the substrate layer before forming the first transparent oxide electrode layer. The method for manufacturing a transparent electrode laminate as described in item 7 of the scope of the patent application, wherein the step of forming the refractive index integration layer includes sequentially forming a first refractive index integration layer and a second refractive index integration layer with mutually different refractive indices. . A transparent electrode laminate includes a substrate layer, a first transparent oxide electrode layer including indium zinc oxide (IZO), and a first transparent oxide electrode layer laminated on the substrate layer. Laminated second transparent oxide electrode layer containing indium tin oxide (ITO); the thickness of the second transparent oxide electrode layer is 120 to 150 nm, the overall transmittance of the laminate is 87% or more, and the chromaticity ( b *) is 5 or less. The transparent electrode laminate as described in item 9 of the scope of patent application, wherein the thickness of the second transparent oxide electrode layer is 120 to 140 nm, and the overall chromaticity (b *) of the laminate is 0.9 to 4.7 . The transparent electrode laminate as described in item 9 of the scope of patent application, wherein the thickness of the first transparent oxide electrode layer is 10-20 nm. The transparent electrode laminate as described in item 1 of the scope of patent application, further comprising a refractive index integration layer formed between the substrate layer and the first transparent oxide electrode layer. The transparent electrode laminate as described in item 12 of the patent application scope, wherein the refractive index integration layer includes a first refractive index integration layer and a second refractive index integration layer that are sequentially stacked from the substrate layer, so that The first refractive index integration layer has a refractive index greater than that of the second refractive index integration layer. A touch sensor includes the transparent electrode laminate as described in any one of items 9 to 13 of the scope of patent application.