TW201910815A - Optical film manufacturing apparatus and manufacturing method - Google Patents
Optical film manufacturing apparatus and manufacturing method Download PDFInfo
- Publication number
- TW201910815A TW201910815A TW107125348A TW107125348A TW201910815A TW 201910815 A TW201910815 A TW 201910815A TW 107125348 A TW107125348 A TW 107125348A TW 107125348 A TW107125348 A TW 107125348A TW 201910815 A TW201910815 A TW 201910815A
- Authority
- TW
- Taiwan
- Prior art keywords
- humidity
- opening
- optical film
- raw material
- manufacturing
- Prior art date
Links
- 239000012788 optical film Substances 0.000 title claims abstract description 99
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 81
- 239000010408 film Substances 0.000 claims abstract description 167
- 239000002994 raw material Substances 0.000 claims abstract description 99
- 238000009833 condensation Methods 0.000 claims abstract description 91
- 230000005494 condensation Effects 0.000 claims abstract description 91
- 238000000034 method Methods 0.000 claims abstract description 48
- 238000011282 treatment Methods 0.000 claims description 53
- 238000010438 heat treatment Methods 0.000 claims description 51
- 230000001681 protective effect Effects 0.000 claims description 14
- 230000001629 suppression Effects 0.000 claims description 10
- 230000002265 prevention Effects 0.000 claims description 3
- 230000003750 conditioning effect Effects 0.000 abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 40
- 239000000463 material Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 4
- -1 polypropylene Polymers 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000007791 dehumidification Methods 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241001274961 Rubus repens Species 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polarising Elements (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Liquid Crystal (AREA)
Abstract
Description
本發明係關於光學薄膜之製造裝置及製造方法。 The present invention relates to a device and method for manufacturing an optical film.
圖像顯示裝置(液晶顯示裝置、有機EL顯示裝置等)係可使用偏光板、相位差板等各種光學薄膜。光學薄膜通常係將長條的原料薄膜連續地捲出而一邊搬送一邊施予各種處理來製造。對原料薄膜實施之處理之一已知係對原料薄膜進行加濕處理等之調濕處理(例如專利文獻1)。 The image display device (a liquid crystal display device, an organic EL display device, etc.) can use various optical films such as a polarizing plate and a retardation plate. An optical film is generally manufactured by continuously rolling out a long raw film and carrying out various processes while conveying it. One of the treatments performed on the raw material film is known as a humidity-controlling treatment such as humidification treatment of the raw material film (for example, Patent Document 1).
[專利文獻1]日本特開2016-224423號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2016-224423
本發明之目的係提供一種用以實施調濕處理而製造光學薄膜之光學薄膜的製造裝置及製造方法,且係 可製造具有良好品質之光學薄膜的光學薄膜之製造裝置及製造方法。 An object of the present invention is to provide an optical film manufacturing apparatus and a manufacturing method for manufacturing an optical film by performing a humidity control process, and an optical film manufacturing apparatus and a manufacturing method capable of manufacturing an optical film having good quality.
本發明係提供一種以下所示之光學薄膜之製造裝置及製造方法。 The present invention provides a manufacturing apparatus and a manufacturing method of an optical film described below.
[1]一種光學薄膜之製造裝置,係一邊搬送原料薄膜,一邊進行用以調整前述原料薄膜之水分含有率的調濕處理者,且係具有:調濕爐,係具有1個以上用以搬入或搬出前述原料薄膜之具備開口的搬送用開口部,且係用以進行前述調濕處理;及,結露抑制裝置,係用以抑制前述搬送用開口部之外壁面結露;前述結露抑制裝置係設置於至少1個前述搬送用開口部。 [1] An optical film manufacturing device, which is a humidity conditioning processor that adjusts the moisture content of the raw material film while conveying the raw material film, and includes: a humidity conditioning furnace, which has more than one for carrying in Or carry out the opening for conveyance provided with an opening of the raw material film and perform the humidity control treatment; and a dew condensation suppressing device for suppressing dew condensation on the outer wall surface of the opening for conveyance; the dew condensation suppressing device is provided To at least one of the aforementioned transport openings.
[2]如[1]項所述之光學薄膜之製造裝置,其中,前述調濕爐係進行加濕前述原料薄膜之加濕處理的加濕爐。 [2] The apparatus for manufacturing an optical film according to the item [1], wherein the humidity control furnace is a humidification furnace that performs a humidification treatment on humidifying the raw material film.
[3]如[1]或[2]項所述之光學薄膜之製造裝置,其中,前述結露抑制裝置係下述之中的至少1者:抽吸裝置,係用以抽吸從前述搬送用開口部之前述開口流出的前述調濕爐內之調濕氣體;空氣供給裝置,係用以對前述搬送用開口部之前述開 口呈簾狀供給空氣;及,加溫裝置,係用以加溫前述搬送用開口部之前述外壁面。 [3] The device for manufacturing an optical film according to [1] or [2], wherein the condensation suppressing device is at least one of the following: a suction device for sucking from the transporting device Humidity-controlling gas in the humidity-controlling furnace flowing out of the openings of the openings; air supply means for supplying air to the openings of the openings for the conveyance in a curtain shape; and heating means for heating The outer wall surface of the transport opening.
[4]如[3]項所述之光學薄膜之製造裝置,其中,前述結露抑制裝置係前述抽吸裝置,前述抽吸裝置係前述調濕爐之外部,且係在通過前述搬送用開口部之前述開口的前述原料薄膜之薄膜面的至少上方側,沿著前述開口而設置。 [4] The device for producing an optical film according to item [3], wherein the dew condensation suppressing device is the suction device, the suction device is outside the humidity control furnace, and passes through the opening for conveyance. At least the upper side of the film surface of the raw material film in the opening is provided along the opening.
[5]如[3]或[4]項所述之光學薄膜之製造裝置,其中,前述結露抑制裝置為前述抽吸裝置,前述抽吸裝置為抽吸箱。 [5] The device for manufacturing an optical film according to item [3] or [4], wherein the dew condensation suppressing device is the aforementioned suction device, and the aforementioned suction device is a suction box.
[6]如[3]至[5]項中任一項所述之光學薄膜之製造裝置,其中,前述結露抑制裝置為前述抽吸裝置,前述抽吸裝置係更具有用以加熱經抽吸之前述調濕氣體的加熱部。 [6] The device for manufacturing an optical film according to any one of [3] to [5], wherein the dew condensation suppressing device is the suction device, and the suction device further has a function of heating the suction The heating part of the humidity control gas.
[7]如[3]項所述之光學薄膜之製造裝置,其中,前述結露抑制裝置為前述空氣供給裝置,前述空氣供給裝置供給之前述空氣的溫度係高於前述調濕氣體之露點溫度的溫度。 [7] The device for manufacturing an optical film according to item [3], wherein the dew condensation suppressing device is the air supply device, and the temperature of the air supplied by the air supply device is higher than the dew point temperature of the humidity-controlling gas. temperature.
[8]一種光學薄膜之製造方法,係一邊搬送原料薄膜,一邊進行用以調整前述原料薄膜之水分含有率的調濕處理,且前述調濕處理係在具有1個以上之搬送用開口部的調濕爐內進行,該搬送用開口部係具備用以搬入或搬出前述原料薄膜之開口,在前述搬送用開口部之至少1個中,進行抑制前述搬送用開口部之外壁面結露的結露抑制處理。 [8] A method for manufacturing an optical film, while carrying out a humidity control process for adjusting the moisture content of the raw material film while conveying the raw material film, and the humidity control process is performed on a material having one or more openings for conveyance. It is carried out in a humidity-controlling furnace, and the opening for conveyance is provided with an opening for carrying in or out the raw material film, and at least one of the opening for conveyance suppresses dew condensation on the wall surface outside the opening for conveyance deal with.
[9]如[8]項所述之光學薄膜之製造方法,其中,前述調濕處理為加濕處理。 [9] The method for producing an optical film according to the item [8], wherein the humidity control treatment is a humidification treatment.
[10]如[8]或[9]項所述之光學薄膜之製造方法,其中,前述結露抑制處理係下述之中的至少1者:抽吸處理,係抽吸從前述搬送用開口部之前述開口流出的前述調濕爐內之調濕氣體;空氣供給處理,係對前述搬送用開口部呈簾狀供給空氣;及,加溫處理,係加溫前述搬送用開口部之前述外壁面。 [10] The method for producing an optical film according to the item [8] or [9], wherein the dew condensation suppressing process is at least one of the following: a suction process, which sucks from the transport opening The humidity-conditioning gas in the humidity-controlling furnace flowing out of the opening; the air supply treatment is to supply air to the opening portion for transportation; and the heating treatment is to heat the outer wall surface of the opening portion for transportation. .
[11]如[10]項所述之光學薄膜之製造方法,其中,前述結露抑制處理係前述抽吸處理及前述加溫處理之中的至少一者,且前述原料薄膜之厚度為1μm以上200μm以下。 [11] The method for manufacturing an optical film according to the item [10], wherein the condensation prevention treatment is at least one of the suction treatment and the heating treatment, and the thickness of the raw material film is 1 μm or more and 200 μm or less. the following.
[12]如[10]或[11]項所述之光學薄膜之製造方法,其中,前述結露抑制處理為前述抽吸處理,在前述抽吸處理中,係於前述調濕爐之外部,在通過前述搬送用開口部之前述開口的前述原料薄膜之薄膜面的至少上方側,抽吸前述調濕氣體。 [12] The method for producing an optical film according to the item [10] or [11], wherein the condensation suppression process is the aforementioned suction process, and the aforementioned suction process is external to the humidity control furnace, and The humidity-controlling gas is sucked through at least the upper side of the film surface of the raw material film in the opening of the transport opening.
[13]如[10]至[12]項中任一項所述之光學薄膜之製造方法,其中,前述結露抑制處理為前述抽吸處理,再進行加熱經抽吸後之前述調濕氣體之加熱處理。 [13] The method for producing an optical film according to any one of [10] to [12], wherein the dew condensation suppressing treatment is the aforementioned suction treatment, and then the humidified gas after the suction is heated Heat treatment.
[14]如[10]項所述之光學薄膜之製造方法,其中,前述結露抑制處理為前述空氣供給處理,在前述空氣供給處理所供給之前述空氣的溫度,係高於前述調濕爐內之前述調濕氣體的露點溫度之溫度。 [14] The method for producing an optical film according to the item [10], wherein the dew condensation suppression process is the air supply process, and the temperature of the air supplied in the air supply process is higher than that in the humidity control furnace. The temperature of the dew point temperature of the humidity control gas.
[15]如[8]至[14]項中任一項所述之光學薄膜之製造方法,其中,前述光學薄膜係偏光薄膜、貼合於前述偏光薄膜之保護薄膜、及在前述偏光薄膜之一面或兩面貼合前述保護薄膜的偏光板之中的任一者。 [15] The method for producing an optical film according to any one of [8] to [14], wherein the optical film is a polarizing film, a protective film attached to the polarizing film, and a polarizing film. Any one of the polarizing plates to which the protective film is bonded on one or both sides.
若依據本發明,一邊搬送原料薄膜一邊進行調濕處理,即可製造具有良好品質之光學薄膜。 According to the present invention, an optical film having good quality can be manufactured by carrying out humidity control treatment while conveying a raw material film.
1‧‧‧光學薄膜之製造裝置 1‧‧‧ Optical film manufacturing device
3‧‧‧調濕爐 3‧‧‧ Humidity Controlling Furnace
5‧‧‧原料薄膜 5‧‧‧ raw film
7‧‧‧抽吸裝置(結露抑制裝置) 7‧‧‧Suction device (condensation suppression device)
30‧‧‧搬送用開口部 30‧‧‧portion opening
30a‧‧‧搬入部 30a‧‧‧Moving Department
30b‧‧‧搬出部 30b‧‧‧moved out
31‧‧‧開口 31‧‧‧ opening
31a‧‧‧搬入用開口 31a‧‧‧Mounting opening
31b‧‧‧搬出用開口 31b‧‧‧Opening opening
61‧‧‧上方輥 61‧‧‧Upper roller
62‧‧‧下方輥 62‧‧‧Lower roller
第1圖係示意性表示本發明之光學薄膜的製造裝置之調濕爐附近的一例之側面圖。 FIG. 1 is a side view schematically showing an example of the vicinity of a humidity control furnace of an optical film manufacturing apparatus of the present invention.
本發明之光學薄膜的製造裝置,係一邊搬送原料薄膜,一邊進行用以調整原料薄膜之水分含有率的調濕處理者,具有:調濕爐,係具有1個以上用以搬入或搬出原料薄膜之具備開口的搬送用開口部,且係用以進行調濕處理;及,結露抑制裝置,係用以抑制搬送用開口部之外壁面結露;結露抑制裝置係設置於至少1個搬送用開口部。 The optical film manufacturing device of the present invention is a humidity conditioning processor for adjusting the moisture content of the raw material film while conveying the raw material film, and includes a humidity control furnace having more than one material film for carrying in or out of the raw material film. It has a transport opening with an opening and is used for humidity control treatment; and a dew condensation suppressing device is used to suppress condensation on the wall surface outside the transport opening; the dew suppression device is provided at least one transport opening .
又,本發明之光學薄膜的製造方法,係一邊搬送原料薄膜,一邊進行用以調整原料薄膜之水分含有率的調濕處理者,且前述調濕處理係在具有1個以上之搬送用開口部的調濕爐內進行,該搬送用開口部係具備用以搬入或搬出原料薄膜之開口,在搬送用開口部之至少1個中,進行抑制搬送用開口部之外壁面結露的結露抑制處理。 In addition, the method for manufacturing an optical film of the present invention is a person who carries out a humidity-conditioning treatment to adjust the moisture content of the material film while conveying the material film, and the humidity-conditioning treatment includes one or more openings for conveyance. The opening for conveyance is provided with an opening for carrying in or out the raw material film, and at least one of the opening for conveyance performs a dew condensation suppressing process for suppressing dew on the wall surface outside the opening for conveyance.
用以調整原料薄膜之水分含有率的調濕處理,係指調整原料薄膜所含之水的含量之處理。又,原料薄膜係指至少進行調濕處理前的薄膜,光學薄膜係指對原料薄 膜至少進行調濕處理而製造之薄膜。光學薄膜可為對原料薄膜施予調濕處理以外之處理者。又,下文,有時將進行調濕處理之前的原料薄膜稱為調濕前之原料薄膜,進行調濕處理後之原料薄膜稱為調濕後之原料薄膜。 The humidity control treatment for adjusting the moisture content of the raw material film refers to the treatment for adjusting the water content of the raw material film. The raw material film refers to a film at least before the humidity control treatment, and the optical film refers to a film manufactured by subjecting the raw material film to at least a humidity control treatment. The optical film may be a processor other than a humidity control treatment applied to the raw film. In addition, hereinafter, the raw material film before the humidity conditioning process is sometimes referred to as a raw material film before the humidity conditioning process, and the raw material film after the humidity conditioning process is referred to as a raw material film after the humidity conditioning process.
以調濕爐進行之調濕處理因係調整原料薄膜之水分含有率,故調濕爐內充滿依照調濕處理條件之溫度及濕度的調濕氣體。調濕氣體係為了調整原料薄膜之水的含量,故可含有水蒸氣。調濕氣體所含之水蒸氣,當流出至調濕爐外時,若藉由冷卻等進行凝縮,則有時調濕爐之搬送用開口部的外壁面會結露。由於該結露所產生之結露水附著於通過搬送用開口部之開口的原料薄膜,有可能污染原料薄膜。 The humidity control treatment by the humidity control furnace is to adjust the moisture content of the raw material film, so the humidity control furnace is filled with humidity control gas according to the temperature and humidity of the humidity control processing conditions. In order to adjust the water content of the raw film, the humidity control gas system may contain water vapor. When the water vapor contained in the humidity-controlling gas flows out of the humidity-controlling furnace and is condensed by cooling or the like, the outer wall surface of the opening for transport of the humidity-controlling furnace may cause condensation. The dew condensation water generated by the dew condensation adheres to the raw material film passing through the opening of the transport opening, and the raw material film may be contaminated.
上述光學薄膜之製造裝置及光學薄膜之製造方法中,藉由在搬送用開口部之至少1個設有結露抑制裝置,從調濕爐內流出之調濕氣體所含的水蒸氣會凝縮,可抑制搬送用開口部之外壁面結露。藉此,抑制由於附著於搬送用開口部之外壁面的結露水,使附著於通過搬送用開口部之開口之原料薄膜所致之原料薄膜被污染。因此,附著於原料薄膜之結露水之後被乾燥,藉此,可抑制所得之光學薄膜產生乾燥痕跡等之外觀不良,又,可抑制對所得之光學薄膜造成翹曲之狀態、光學特性等諸特性之不良影響。 In the above-mentioned optical film manufacturing device and optical film manufacturing method, by providing a condensation suppression device in at least one of the transport openings, water vapor contained in the humidity-controlling gas flowing out of the humidity-controlling furnace can condense, Condensation on the wall surface outside the opening for transportation is suppressed. Thereby, contamination of the raw material film caused by the dew condensation water adhering to the outer wall surface of the conveyance opening part and the raw material film adhered to the opening through the conveyance opening part is suppressed. Therefore, the dew condensation water adhering to the raw material film is dried, thereby suppressing appearance defects such as drying marks of the obtained optical film, and suppressing the warped state and optical characteristics of the obtained optical film. Adverse effects.
以下,參照圖式而說明有關本發明之光學薄膜的製造裝置之較佳的實施形態。 Hereinafter, preferred embodiments of the apparatus for manufacturing an optical film according to the present invention will be described with reference to the drawings.
(具備抽吸裝置之光學薄膜之製造裝置) (Manufacturing device for optical film with suction device)
第1圖係示意性表示光學薄膜之製造裝置1的調濕爐附近之側面圖。光學薄膜之製造裝置1係對藉由自捲繞有長條原料薄膜的捲繞體開捲等而連續地被搬送之原料薄膜5,施予用以調整水分含有率之調濕處理而製造光學薄膜之裝置。第1圖中之箭號表示原料薄膜5之搬送方向。 FIG. 1 is a side view schematically showing the vicinity of a humidity-controlling furnace of the optical film manufacturing apparatus 1. An optical film manufacturing device 1 is a device for manufacturing optical by applying a humidity control treatment to adjust a moisture content rate to a raw material film 5 that is continuously conveyed by unwinding a rolled body from which a long raw material film is wound. Thin film device. The arrow in FIG. 1 indicates the conveying direction of the raw material film 5.
光學薄膜之製造裝置1係如第1圖具有調濕爐3,對於原料薄膜5之調濕處理係在調濕爐3一邊搬送原料薄膜5一邊進行。第1圖所示之調濕爐3中,其內部區隔為2個,可以二階段進行調濕處理。在調濕爐3中,設有搬送用開口部30,該搬送用開口部30係具有用以將原料薄膜5搬入調濕爐3內或搬出調濕爐3外之開口31。所謂搬送用開口部30係指包含構成開口31及開口31之周圍的調濕爐3之外壁的區域,構成開口31之周圍的調濕爐3之外壁係通常係指開口31之外周起1m以內的範圍之外壁。又,光學薄膜之製造裝置1係具有抽吸裝置7作為結露抑制裝置,該結露抑制裝置係用以抑制調濕爐3之搬送用開口部30的外壁面結露。 The optical film manufacturing apparatus 1 includes the humidity control furnace 3 as shown in FIG. 1. The humidity control treatment of the raw film 5 is performed while the raw film 5 is being transferred in the humidity control furnace 3. In the humidity control furnace 3 shown in FIG. 1, there are two internal divisions, and the humidity control treatment can be performed in two stages. The humidity control furnace 3 is provided with a transfer opening 30 having an opening 31 for carrying the raw material film 5 into or out of the humidity control furnace 3. The opening 30 for conveyance refers to the area including the outer wall of the humidity control furnace 3 constituting the opening 31 and the periphery of the opening 31. The outer wall of the humidity control furnace 3 constituting the periphery of the opening 31 generally refers to within 1 m from the periphery of the opening 31 Outside the wall. The optical film manufacturing device 1 includes a suction device 7 as a dew condensation suppressing device for suppressing dew condensation on the outer wall surface of the opening 30 for transport of the humidity control furnace 3.
(調濕爐) (Humidity Control Furnace)
調濕爐3係一邊搬送原料薄膜5一邊對原料薄膜5施予調濕處理者,例如可藉由調濕爐3內之調濕環境而調整 原料薄膜5之水分含有率。藉由在調濕爐3之調濕處理而調整原料薄膜5之水分含有率,藉此,可將光學薄膜之翹曲的狀態、光學特性等調整成所希望之狀態。調濕爐3內之調濕環境只要依照原料薄膜之種類、調濕處理條件而適當設定即可,例如就調濕處理而言,進行加濕處理時,可調整成溫度30℃至80℃、濕度30RH%以上,就調濕處理而言,進行除濕處理時,可調整成溫度30至100℃、濕度未達30RH%。 The humidity control furnace 3 is a person who applies a humidity control treatment to the raw material film 5 while conveying the raw material film 5. For example, the moisture content of the raw material film 5 can be adjusted by the humidity control environment in the humidity control furnace 3. The moisture content of the raw material film 5 is adjusted by the humidity control treatment in the humidity control furnace 3, whereby the warped state and optical characteristics of the optical film can be adjusted to a desired state. The humidity-controlling environment in the humidity-controlling furnace 3 may be appropriately set according to the type of the raw material film and the humidity-controlling processing conditions. For example, in terms of humidity-controlling processing, when performing a humidification treatment, the temperature may be adjusted to 30 ° C to 80 ° C Humidity is 30RH% or more. Regarding the humidity control process, when the dehumidification process is performed, the temperature can be adjusted to 30 to 100 ° C and the humidity can be less than 30RH%.
在光學薄膜之製造裝置1所具備之調濕爐3可為1個,亦可為2個以上。又,調濕爐3內可為1個空間,依照在調濕爐3內進行之調濕處理的條件,例如第1圖所示,亦可為區隔成2個以上而施予2階段以上之調濕處理者。 The humidity control furnace 3 included in the optical film manufacturing apparatus 1 may be one, or may be two or more. In addition, the humidity control furnace 3 may have a single space, and according to the conditions of the humidity control treatment performed in the humidity control furnace 3, for example, as shown in FIG. 1, it may be divided into two or more and given two or more stages. The humidity conditioning processor.
調濕爐3可藉由充滿其內部空間之調濕氣體,調整成依照調濕處理條件之溫度及濕度的調濕環境,藉此,可將原料薄膜5之水分含有率調整成所希望之大小。調濕爐3係可具備未圖示之調濕器,該調濕器係用以將調濕爐3內設為預定之調濕環境者。調濕器可依照調濕處理條件而使用公知者,例如,藉由於調濕爐3內供給調濕氣體,可調整成依照調濕爐3內之調濕處理條件的調濕環境。 The humidity-controlling furnace 3 can be adjusted to a humidity-adjusting environment according to the temperature and humidity of the humidity-conditioning processing conditions by filling the humidity-controlling gas in its internal space, thereby adjusting the moisture content of the raw material film 5 to a desired size . The humidity control furnace 3 may be provided with a humidifier (not shown) for setting the inside of the humidity control furnace 3 to a predetermined humidity control environment. The humidity controller can be used in accordance with the humidity control processing conditions. For example, by supplying the humidity control gas in the humidity control furnace 3, it can be adjusted to a humidity control environment according to the humidity control processing conditions in the humidity control furnace 3.
調濕爐3可為進行用以提高原料薄膜5中之水分含有率的加濕處理之加濕爐,亦可為進行用以降低原料薄膜5中之水分含有率的除濕處理之除濕爐。因流出至調濕爐3外之調濕氣體而搬送用開口部30之外壁面結露的 現象係調濕爐3為加濕爐時容易產生,故本實施形態之光學薄膜之製造裝置1係調濕爐3為加濕爐,在該加濕爐中,進行加濕處理時特別適宜使用。 The humidity control furnace 3 may be a humidification furnace that performs a humidification process to increase the moisture content rate in the raw material film 5, or a dehumidification furnace that performs a dehumidification process that reduces the moisture content rate in the raw material film 5. The phenomenon that dew condensation occurs on the outer wall surface of the opening 30 for transportation due to the humidity-controlling gas flowing out of the humidity-controlling furnace 3 is easily generated when the humidity-controlling furnace 3 is a humidifying furnace. Therefore, the optical film manufacturing apparatus 1 of this embodiment is The wet furnace 3 is a humidifying furnace, and this humidifying furnace is particularly suitably used when performing a humidification treatment.
在調濕爐3設有具有開口31之搬送用開口部30,該開口31係用以將調濕前之原料薄膜5搬入調濕爐3內,或用以搬出調濕後之原料薄膜5。如第1圖所示,搬送用開口部30係可具有:具有搬入用開口31a之搬入部30a,該搬入用開口31a係用以將調濕前之原料薄膜5搬入至調濕爐3內的開口;及具有搬出用開口31b之搬出部30b,該搬出用開口31b係用以搬出調濕後之原料薄膜5的開口。又,第1圖係表示在調濕爐3分別各具有1個搬入部30a及搬出部30b之例,但搬入部亦可兼為搬出部,例如為了在調濕爐3內搬送複數之原料薄膜等,可為具有2個以上之搬入部、搬出部。 The humidity-controlling furnace 3 is provided with a transport opening 30 having an opening 31 for carrying the raw material film 5 before the humidity conditioning into the humidity-controlling furnace 3 or for carrying out the raw material film 5 after the humidity-conditioning. As shown in FIG. 1, the conveyance opening portion 30 may include a carry-in portion 30 a having a carry-in opening 31 a, and the carry-in opening 31 a may be used to carry the raw material film 5 before humidity conditioning into the humidity conditioning furnace 3. An opening; and a carrying-out portion 30b having a carrying-out opening 31b, the carrying-out opening 31b being an opening for carrying out the humidity-adjusted raw material film 5. The first figure shows an example in which each of the humidity control furnaces 3 has a carry-in portion 30a and a carry-out portion 30b, but the carry-in portion may also serve as a carry-out portion, for example, to transfer a plurality of raw material films in the humidity-controlling furnace 3. For example, it may have two or more carrying-in parts and carrying-out parts.
在調濕爐3可設置支撐被搬送之原料薄膜5的複數導引輥。配置在調濕爐3內之複數導引輥,例如第1圖所示,具有配置在調濕爐3內之上方側的上方輥61、及在調濕爐內之下方側被配置在相鄰之上方輥61之間的下方輥62。藉此,在調濕爐3內之各區隔中,藉由上方輥61及下方輥62交互支撐原料薄膜5,可將原料薄膜5呈Z字型搬送,增長調濕爐3內之原料薄膜5的搬送經路而提高調濕處理效率,可謀求調濕爐3之小型化。 The humidity control furnace 3 may be provided with a plurality of guide rollers supporting the raw material film 5 to be conveyed. The plurality of guide rollers disposed in the humidity control furnace 3 include, for example, an upper roller 61 disposed on the upper side in the humidity control furnace 3 and the adjacent rollers disposed in the lower side in the humidity control furnace 3 as shown in FIG. 1. Lower roller 62 between upper roller 61. In this way, in each segment in the humidity control furnace 3, the raw material film 5 is alternately supported by the upper roller 61 and the lower roller 62, so that the raw material film 5 can be transported in a zigzag manner, and the raw material film in the humidity control furnace 3 can be increased. The conveying path of 5 can improve the humidity control efficiency, and the miniaturization of the humidity control furnace 3 can be achieved.
(抽吸裝置) (Suction device)
抽吸裝置7係從形成調濕爐3內之調濕環境的調濕氣體之中,抽吸從搬送用開口部30之開口31流出的調濕氣體而回收者。調濕氣體係含有凝縮性成分之水蒸氣,故流出至調濕爐3外而冷卻等時,水蒸氣會凝縮而容易產生結露。藉由抽吸裝置7抽吸流出至調濕爐3外之調濕氣體,可降低被釋出至調濕爐3外之大氣中的水蒸氣,而可抑制搬送用開口部30之外壁面結露。 The suction device 7 is a person who sucks the humidity-conditioning gas flowing out of the opening 31 of the conveyance opening portion 30 from the humidity-conditioning gas forming the humidity-conditioning environment in the humidity-conditioning furnace 3 and recovers it. The humidity-controlling gas system contains water vapor of a condensable component, so when it flows out of the humidity-controlling furnace 3 and cools, the water vapor will condense and easily cause condensation. The suction device 7 sucks the humidity-controlling gas flowing out of the humidity-controlling furnace 3 to reduce water vapor released to the atmosphere outside the humidity-controlling furnace 3 and suppress condensation on the wall surface outside the opening 30 for transport .
抽吸裝置7可設置於調濕爐3所設之搬送用開口部30中的至少1個,如第1圖所示,亦可設置於調濕爐3之全部搬送用開口部30。抽吸裝置7例如為抽吸箱。抽吸箱係例如其整體為長方體等之箱型形狀,其一面具有用以抽吸調濕氣體之多數貫通孔,在另一面具有用以排出被抽吸至抽吸箱內之調濕氣體的排氣孔。 The suction device 7 may be provided in at least one of the transport openings 30 provided in the humidity control furnace 3, and as shown in FIG. 1, the suction device 7 may be provided in all the transport openings 30 in the humidity control furnace 3. The suction device 7 is, for example, a suction box. The suction box is, for example, a box shape whose overall shape is a rectangular parallelepiped, etc., one side of which has a plurality of through holes for sucking the humidity-controlling gas, and the other side having a hole for exhausting the humidity-conditioning gas sucked into the suction box. Vent.
由於抽吸裝置7是為了抑制搬送用開口部30之外壁面結露,以設置於調濕爐3之外部為較佳。又,為了降低被釋出至調濕爐3外部之大氣中的調濕氣體,抽吸裝置7較佳係在原料薄膜5之薄膜面的上方側及下方側之至少一側,沿著搬送用開口部30之開口31而設置,且較佳係該開口31具有與原料薄膜之寬方向的寬度相同寬度或較其更寬廣之大小。如第1圖所示,抽吸裝置7係可設於薄膜面之上方側及下方側兩側,但搬送用開口部30之外壁面結露時,因該結露所產生之結露水會藉由本身重量而掉落,有時附著於通過搬送用開口部30之開口31的原料薄膜5,故抽吸裝置7較佳係配置於通過調濕爐3之搬送 用開口部30的開口31之原料薄膜5的薄膜面之至少上方側。 Since the suction device 7 is for suppressing dew condensation on the outer wall surface of the conveyance opening 30, it is preferable to install the suction device 7 outside the humidity control furnace 3. In addition, in order to reduce the humidity-controlling gas released into the atmosphere outside the humidity-controlling furnace 3, the suction device 7 is preferably located on at least one of the upper side and the lower side of the film surface of the raw material film 5 along the conveyance The opening 31 of the opening portion 30 is provided, and it is preferable that the opening 31 has the same width as or wider than the width in the width direction of the raw material film. As shown in FIG. 1, the suction device 7 can be installed on both the upper side and the lower side of the film surface. However, when dew condensation occurs on the outer wall surface of the transport opening 30, the dew condensation water generated by the dew condensation will pass through itself. It may drop due to weight and may be attached to the raw material film 5 passing through the opening 31 of the conveyance opening 30. Therefore, the suction device 7 is preferably a raw material film disposed at the opening 31 passing through the conveying opening 30 of the humidity control furnace 3. At least the upper side of the film surface of 5.
抽吸裝置7係為了抑制被抽吸至抽吸裝置7內之調濕氣體中的水蒸氣凝縮而抽吸裝置7令結露,故可具有加熱調濕氣體之加熱部。藉此,被抽吸至抽吸裝置7內之調濕氣體被冷卻,調濕氣體中之水蒸氣會凝縮,可抑制在抽吸裝置7產生結露水,並可抑制該結露水污染原料薄膜5。加熱部可使用公知之加熱裝置,可舉例如加熱器、電阻發熱體、感應加熱裝置、微波照射裝置等。加熱部係以成為高於調濕爐3內之調濕氣體的露點溫度之溫度,加熱抽吸裝置7為佳。 The suction device 7 is provided with a heating unit for heating the humidity-controlling gas because the suction device 7 causes condensation to prevent condensation of water vapor in the humidity-controlling gas sucked into the suction device 7. Thereby, the humidity-controlling gas sucked into the suction device 7 is cooled, and the water vapor in the humidity-controlling gas will condense, which can suppress the generation of dew condensation in the suction device 7 and the contamination water from contaminating the raw material film 5 . As the heating section, a known heating device can be used, and examples thereof include a heater, a resistance heating element, an induction heating device, and a microwave irradiation device. The heating unit is preferably a temperature higher than the dew-point temperature of the humidity-controlling gas in the humidity-controlling furnace 3, and the heating-suction device 7 is preferred.
(原料薄膜及光學薄膜) (Raw film and optical film)
在光學薄膜之製造裝置1所製造之光學薄膜係對原料薄膜至少進行調濕處理而得者。光學薄膜可舉例如偏光薄膜、貼合於偏光薄膜之保護薄膜、偏光薄膜之一面或兩面貼合有保護薄膜之偏光板、相位差薄膜、增亮薄膜、反射薄膜、防眩薄膜、抗反射薄膜、半透過反射薄膜、光擴散薄膜等使用於圖像顯示裝置等之具有光學機能的薄膜。原料薄膜係為了製造該等光學薄膜所使用之原料薄膜,且為至少施予調濕處理之前者。 The optical film manufactured by the optical film manufacturing apparatus 1 is obtained by subjecting a raw film to at least a humidity control treatment. The optical film may be, for example, a polarizing film, a protective film attached to a polarizing film, a polarizing plate with a protective film attached to one or both sides of a polarizing film, a retardation film, a brightening film, a reflective film, an anti-glare film, an anti-reflective film , Semi-transmissive reflective film, light diffusing film, and other films with optical functions used in image display devices. The raw material film is a raw material film used for producing such optical films, and it is at least one that has been subjected to a humidity control treatment.
偏光薄膜以直線偏光片為較佳,可使用在經單軸延伸之聚乙烯醇系樹脂層使碘或二色性染料等之二色性色素吸附配向而成者。如此之偏光薄膜例如可經由對聚 乙烯醇系樹脂薄膜,施予單軸延伸、以二色性色素染色、硼酸處理、水洗處理等而製造。光學薄膜為偏光薄膜時,調濕處理係例如經進行上述水洗處理後之加熱乾燥後為了調整用以製造偏光薄膜之原料薄膜的水分含有率而進行。 The polarizing film is preferably a linear polarizer, and can be formed by adsorbing and aligning a dichroic dye such as iodine or a dichroic dye on a uniaxially stretched polyvinyl alcohol-based resin layer. Such a polarizing film can be produced, for example, by applying uniaxial stretching to a polyvinyl alcohol-based resin film, dyeing with a dichroic dye, boric acid treatment, and water washing treatment. When the optical film is a polarizing film, the humidity-controlling treatment is performed, for example, after adjusting the water content of the raw material film used to manufacture the polarizing film by heating and drying after performing the water washing treatment.
保護薄膜可為不具有光學機能之單純的保護薄膜,亦可為如相位差薄膜、增亮薄膜之一併具有光學機能的保護薄膜。保護薄膜之材質無特別限定,可使用具有透光性之熱塑性樹脂。如此之熱塑性樹脂可舉例如聚丙烯系樹脂等鏈狀聚烯烴系樹脂;降莰烯系樹脂等環狀聚烯烴系樹脂;三乙醯基纖維素、二乙醯基纖維素等乙酸纖維素系樹脂;聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯等聚酯系樹脂;聚碳酸酯系樹脂;(甲基)丙烯酸系樹脂等、在該領域中公知之熱塑性樹脂。又,本說明書中「(甲基)丙烯酸」意指選自丙烯酸及甲基丙烯酸之至少一者。光學薄膜為保護薄膜時,調濕處理係例如在與偏光薄膜貼合之前進行,用於調整製造保護薄膜用之原料薄膜的水分含有率。 The protective film may be a simple protective film having no optical function, or a protective film having optical functions such as one of a retardation film and a brightness enhancement film. The material of the protective film is not particularly limited, and a translucent thermoplastic resin can be used. Examples of such thermoplastic resins include chain polyolefin resins such as polypropylene resins, cyclic polyolefin resins such as norbornene resins, and cellulose acetate based resins such as triethyl cellulose and diethyl cellulose. Resins; polyester resins such as polyethylene terephthalate, polyethylene naphthalate, and polybutylene terephthalate; polycarbonate resins; (meth) acrylic resins, etc. Thermoplastic resins well known in the art. The "(meth) acrylic acid" in this specification means at least one selected from acrylic acid and methacrylic acid. When the optical film is a protective film, the humidity control treatment is performed, for example, before bonding to the polarizing film, and is used to adjust the moisture content of the raw material film used for manufacturing the protective film.
光學薄膜為偏光板時,調濕處理係例如用以調整將偏光薄膜與保護薄膜貼合之積層體的水分量而進行。 When the optical film is a polarizing plate, the humidity control treatment is performed, for example, to adjust the moisture content of the laminated body in which the polarizing film and the protective film are bonded.
原料薄膜之厚度無特別限定,通常若為1μm以上即可,以2μm以上為較佳,以5μm以上為更佳,又,通常若為200μm以下即可,以100μm以下為較佳,以50μm以下為更佳,以20μm以下為再更佳。具備抽吸裝置7之 光學薄膜之製造裝置1,在原料薄膜之厚度小至1μm以上20μm以下時,原料薄膜朝調濕爐搬入時或從調濕爐搬出時不易引起原料薄膜之沾黏、皺褶、折入等搬送不良,故特別在薄的原料薄膜進行調濕處理時可適宜使用。 The thickness of the raw material film is not particularly limited. Generally, it is 1 μm or more, preferably 2 μm or more, and more preferably 5 μm or more. Usually, it is 200 μm or less, preferably 100 μm or less, and 50 μm or less. More preferably, it is more preferably 20 μm or less. When the thickness of the raw material film is as small as 1 μm or more and 20 μm or less, the raw material film having the suction device 7 is less likely to cause sticking and wrinkling of the raw material film when the raw material film is moved in or out of the humidity control furnace. Poor transportation such as folds and folds makes it suitable for use when a thin raw film is subjected to humidity control.
又,對原料薄膜至少施予調濕處理而得之光學薄膜的厚度無特別限定,但通常為1μm以上200μm以下,光學薄膜為偏光薄膜時,其厚度為5μm以上30μm以下,光學薄膜為保護薄膜時,其厚度為10μm以上80μm以下,光學薄膜為偏光板時,其厚度為30μm以上200μm以下。 The thickness of the optical film obtained by subjecting the raw material film to at least humidity control is not particularly limited, but it is usually 1 μm or more and 200 μm or less. When the optical film is a polarizing film, the thickness is 5 μm or more and 30 μm or less. The optical film is a protective film. When the thickness is 10 μm or more and 80 μm or less, and when the optical film is a polarizing plate, the thickness is 30 μm or more and 200 μm or less.
(使用抽吸裝置之光學薄膜之製造方法) (Manufacturing method of optical film using suction device)
第1圖所示之光學薄膜之製造裝置1,係從調濕爐3之搬入部30a,將調濕前之原料薄膜5連續地搬入調濕爐3內,將在調濕爐3內經施予調濕處理之調濕後的原料薄膜從調濕爐3之搬出部30b搬出。此時,調濕爐3內係充滿依照調濕處理條件之調濕氣體,且在調濕爐3之搬送用開口部30的搬入部30a、搬出部30b設有調濕前後之原料薄膜5通過用的搬入用開口31a及搬出用開口31b。因此,有時從該搬入用開口31a及搬出用開口31b流出調濕爐3內之調濕氣體。朝調濕爐3外流出之調濕氣體中的水蒸氣有時依調濕爐3外之溫度、濕度、壓力等條件而凝縮,搬送用開口部30之外壁面會結露。 The optical film manufacturing apparatus 1 shown in FIG. 1 is to continuously carry the raw material film 5 before humidity conditioning into the humidity conditioning furnace 3 from the carrying-in portion 30 a of the humidity conditioning furnace 3, and the material is applied in the humidity conditioning furnace 3. The humidity-conditioned raw material film after the humidity-conditioning treatment is carried out from the carrying-out portion 30 b of the humidity-conditioning furnace 3. At this time, the humidity-controlling furnace 3 is filled with humidity-controlling gas in accordance with the humidity-conditioning processing conditions, and the raw material film 5 before and after the humidity-conditioning is passed through the carrying-in portion 30a and the carrying-out portion 30b of the opening 30 for the humidity-controlling furnace 3 The opening 31a for carrying in and the opening 31b for carrying out. Therefore, the humidity-controlling gas in the humidity-controlling furnace 3 may flow out from the opening 31a for carrying in and the opening 31b for carrying out. Water vapor in the humidity-controlling gas flowing out of the humidity-controlling furnace 3 may condense depending on conditions such as temperature, humidity, and pressure outside the humidity-controlling furnace 3, and dew condensation may occur on the outer wall surface of the opening 30 for transportation.
在光學薄膜之製造裝置1中,設於調濕爐3之搬送用開口部30的抽吸裝置7係藉由抽吸流出至調濕爐 3外之調濕氣體並回收,而進行抑制搬送用開口部30之外壁面會結露的結露抑制處理。藉此,可抑制附著於搬送用開口部30之外壁面的結露水掉落至通過搬送用開口部30之開口31的原料薄膜5上等而污染原料薄膜5。又,抽吸裝置7具有加熱部時,藉由加熱部,可進行對經抽吸裝置7抽吸之調濕氣體加熱的加熱處理。藉此,可抑制被抽吸裝置7抽吸之調濕氣體中的水蒸氣凝縮,故結露水附著在抽吸裝置7,可抑制該結露水污染原料薄膜5,並可獲得良好品質之光學薄膜。 In the optical film manufacturing apparatus 1, the suction device 7 provided in the transport opening 30 of the humidity control furnace 3 sucks and recovers the humidity-controlling gas flowing out of the humidity control furnace 3, and suppresses transportation Condensation suppression processing that causes condensation on the outer wall surface of the opening 30. Thereby, it is possible to prevent the dew condensation water adhering to the outer wall surface of the conveyance opening portion 30 from falling onto the material film 5 passing through the opening 31 of the conveyance opening portion 30 or the like to contaminate the material film 5. When the suction device 7 has a heating section, the heating section can perform a heating process for heating the humidity-controlled gas suctioned by the suction device 7. Thereby, condensation of water vapor in the humidity-controlled gas sucked by the suction device 7 can be suppressed, so that dew condensation adheres to the suction device 7, the contamination water can be prevented from contaminating the raw material film 5, and a good-quality optical film can be obtained .
抽吸裝置7係在調濕爐3之外部,於原料薄膜5之薄膜面的至少上方側,沿著搬送用開口部30之開口31而設置,藉此,可有效率地抽吸成為結露原因之含有水蒸氣的調濕氣體。特別,如上述,從調濕器供給調濕氣體至調濕爐3內時,調濕爐3內之壓力(內壓)高於調濕爐3外之壓力(外壓),故調濕爐3內之調濕氣體係通過搬送用開口部30之開口31而更容易朝調濕爐3外流出。因此,藉由於調濕爐3之外部設有抽吸裝置,可有效率地抽吸流出至調濕爐3外之調濕氣體。又,藉由在原料薄膜5之薄膜面的上方側設置抽吸裝置7,可有效率地抑制搬送用開口部30之外壁面之中,位於薄膜面上方側之外壁面結露。 The suction device 7 is provided outside the humidity control furnace 3 at least on the upper side of the film surface of the raw material film 5 along the opening 31 of the conveyance opening portion 30, thereby efficiently sucking as a cause of dew condensation. Humidifying gas containing water vapor. In particular, as described above, when the humidifying gas is supplied from the humidifier into the humidity control furnace 3, the pressure (internal pressure) in the humidity control furnace 3 is higher than the pressure (external pressure) outside the humidity control furnace 3, so the humidity control furnace The humidity-controlling gas system in 3 passes through the opening 31 of the opening 30 for conveyance to more easily flow out of the humidity-controlling furnace 3. Therefore, since a suction device is provided outside the humidity control furnace 3, the humidity control gas flowing out of the humidity control furnace 3 can be efficiently sucked. In addition, by providing the suction device 7 on the upper side of the film surface of the raw material film 5, it is possible to effectively suppress dew condensation on the outer wall surface located on the upper side of the film surface from the outer wall surface of the transport opening 30.
抽吸裝置7中之抽吸壓力通常可設為2.0kPa以上5.0kPa以下,抽吸氣體之流速可設為5m/s以上30m/s以下。 The suction pressure in the suction device 7 can be generally set to be 2.0 kPa or more and 5.0 kPa or less, and the flow velocity of the suction gas can be set to 5 m / s or more and 30 m / s or less.
(具備空氣供給裝置之光學薄膜之製造裝置) (Manufacturing device for optical film with air supply device)
本實施形態之光學薄膜之製造裝置,就結露抑制裝置而言,在取代第1實施形態之光學薄膜的製造裝置1之抽吸裝置7,而具備空氣供給裝置之點係與第1實施形態相異。以下,與第1實施形態說明者為相同之構件則省略其說明。 The device for manufacturing an optical film according to this embodiment is similar to the first embodiment in that the condensation suppressing device replaces the suction device 7 of the optical film manufacturing device 1 according to the first embodiment and includes an air supply device. different. Hereinafter, the same components as those described in the first embodiment will be omitted.
本實施形態之光學薄膜之製造裝置1係具備空氣供給裝置作為用以抑制搬送用開口部30之外壁面結露的結露抑制裝置。空氣供給裝置係對搬送用開口部30之開口31呈簾狀供給空氣者,藉此,可抑制從調濕爐3內流出調濕氣體,而抑制在搬送用開口部30之外壁面結露。 The optical film manufacturing apparatus 1 of this embodiment is provided with an air supply device as a dew condensation suppressing device for suppressing dew condensation on the wall surface outside the opening 30 for conveyance. The air supply device supplies air in a curtain shape to the opening 31 of the conveyance opening portion 30, thereby suppressing the outflow of the humidity-controlling gas from the humidity control furnace 3 and suppressing condensation on the wall surface outside the conveyance opening portion 30.
(空氣供給裝置) (Air supply device)
空氣供給裝置係藉由對搬送用開口部30之開口31呈簾狀供給空氣,而抑制從搬送用開口部30之開口31流出調濕爐3內之調濕氣體。空氣供給裝置因抑制含有水蒸氣之調濕氣體流出至調濕爐3外,因而釋出至調濕爐外之水蒸氣的量會減少,可抑制在搬送用開口部30之開口31周邊的外壁面結露。空氣供給裝置係可設置在調濕爐3所設之搬送用開口部30之中的至少1個,亦可設置於調濕爐3之全部搬送用開口部30。又,光學薄膜之製造裝置可為具有空氣供給裝置、及在上述第1實施形態說明之抽吸裝置 者。 The air supply device supplies air in a curtain shape to the opening 31 of the conveyance opening 30, thereby suppressing the humidity-conditioning gas from flowing out of the humidity control furnace 3 from the opening 31 of the conveyance opening 30. Since the air supply device suppresses the flow of the humidity-controlling gas containing water vapor out of the humidity control furnace 3, the amount of water vapor released to the outside of the humidity control furnace is reduced, and it is possible to suppress the outside of the periphery of the opening 31 of the transport opening 30 Condensation on the wall. The air supply device may be installed in at least one of the transport openings 30 provided in the humidity control furnace 3, or may be installed in all the transport openings 30 in the humidity control furnace 3. The manufacturing apparatus of the optical film may include an air supply device and a suction device described in the first embodiment.
空氣供給裝置係只要可於搬送用開口部30之開口31以形成簾狀之空氣(簾流)之方式供給空氣者即可,無特別限定。空氣供給裝置係例如可為從開口31之上部側朝向下部側而供給空氣形成簾流之下吹方式,亦可以從開口31之左右兩側互相對向之方式供給空氣而形成簾流之横吹方式。簾流較佳係開口31形成為與原料薄膜之寬方向之寬度為相同寬度或較其更寬廣之大小。又,為避免對調濕爐3內之原料薄膜5的搬送造成不良影響,簾流較佳係在調濕爐3外形成於搬送用開口部30之開口31。 The air supply device is not particularly limited as long as it can supply air to the opening 31 of the conveyance opening portion 30 so as to form curtain-shaped air (curtain flow). For example, the air supply device can supply air from the upper side of the opening 31 to the lower side to form a curtain blow down method, or it can supply air from the left and right sides of the opening 31 to face each other to form a curtain blow horizontal blow method. . The curtain flow is preferably formed such that the opening 31 has the same width as or wider than the width of the raw material film. In addition, in order to avoid adversely affecting the transport of the raw material film 5 in the humidity control furnace 3, the curtain flow is preferably formed in the opening 31 formed in the transportation opening portion 30 outside the humidity control furnace 3.
空氣供給裝置供給之空氣的溫度較佳係高於調濕爐3內之調濕氣體中的凝縮性成分之水蒸氣會結露之溫度(調濕氣體之露點溫度)的溫度,通常為1℃至50℃。藉由使空氣之溫度高於調濕氣體之露點溫度,藉由空氣供給裝置供給之空氣而抑制調濕氣體中之水蒸氣凝縮,可抑制在搬送用開口部之外壁面附著結露水。供給之空氣的溫度通常係只要較調濕氣體之露點溫度高3℃以上即可,供給之空氣的濕度只要為40%RH以下即可。 The temperature of the air supplied by the air supply device is preferably higher than the temperature at which the water vapor of the condensable component in the humidity-controlling gas in the humidity-controlling furnace 3 will dew (the temperature of the humidity-controlling gas), usually 1 ° C to 50 ° C. By making the temperature of the air higher than the dew point temperature of the humidity-controlling gas, and suppressing the condensation of water vapor in the humidity-controlling gas by the air supplied from the air supply device, it is possible to prevent the condensation of dew on the wall surface outside the opening for transportation. The temperature of the supplied air usually needs to be 3 ° C or more higher than the dew point temperature of the humidity-controlling gas, and the humidity of the supplied air only needs to be 40% RH or less.
空氣供給裝置供給之空氣的吹出速度,只要對原料薄膜之搬送不會造成不良影響之範圍即可任意地選定,亦依存於搬送用開口部30之開口31的大小、或原料薄膜5之厚度等,但通常為2m/sec以上,以4m/sec以上為較佳,通常為20m/sec以下,以15m/sec以下為較佳。 The blowing speed of the air supplied by the air supply device can be arbitrarily selected as long as it does not adversely affect the conveyance of the raw material film, and also depends on the size of the opening 31 of the conveyance opening 30 or the thickness of the raw material film 5 However, it is usually 2 m / sec or more, preferably 4 m / sec or more, usually 20 m / sec or less, and 15 m / sec or less.
(使用空氣供給裝置之光學薄膜之製造方法) (Manufacturing method of optical film using air supply device)
本實施形態之光學薄膜之製造裝置中,亦與第1圖所示之光學薄膜之製造裝置1同樣,從調濕爐3之搬入部30a,將調濕前之原料薄膜5連續地搬入至調濕爐3內,將在調濕爐3內經施予調濕處理之調濕後的原料薄膜從調濕爐3之搬出部30b搬出。此時,空氣供給裝置對調濕爐3之搬送用開口部30的開口31呈簾狀供給空氣,藉此,進行抑制搬送用開口部30之外壁面結露的結露抑制處理。 In the manufacturing apparatus of the optical film of this embodiment, similarly to the manufacturing apparatus 1 of the optical film shown in FIG. 1, the raw material film 5 before the humidity conditioning is continuously transferred from the humidity carrying furnace 3 into the carrying section 30 a to the humidity conditioning device. In the humidity furnace 3, the raw material film subjected to the humidity conditioning treatment in the humidity conditioning furnace 3 is carried out from the carrying-out portion 30b of the humidity conditioning furnace 3. At this time, the air supply device supplies air to the opening 31 of the transport opening 30 of the humidity control furnace 3 in a curtain shape, thereby performing a dew condensation suppressing process for suppressing condensation on the wall surface outside the transport opening 30.
藉由空氣供給裝置供給之簾狀空氣,降低從調濕爐3內流出至調濕爐3外之調濕氣體的量,並降低從調濕爐3內流出至調濕爐3外之水蒸氣的量。藉此,搬送用開口部30之外壁面會結露,因該結露產生之結露水掉落至通過搬送用開口部30之開口31的原料薄膜5上等,而可抑制污染原料薄膜5,可獲得良好品質之光學薄膜。又,藉由使從空氣供給裝置所供給之空氣的溫度高於調濕氣體之露點,可抑制調濕氣體中之水蒸氣凝縮,可更抑制結露水附著在搬送用開口部30之外壁面。 The curtain-shaped air supplied by the air supply device reduces the amount of humidity-conditioning gas flowing out of the humidity-controlling furnace 3 to the outside of the humidity-controlling furnace 3, and reduces the water vapor flowing out of the humidity-controlling furnace 3 to the outside of the humidity-controlling furnace 3. The amount. As a result, dew condensation occurs on the outer wall surface of the opening 30 for transportation, and the dew condensation water generated by the dew drops falls on the raw material film 5 passing through the opening 31 of the opening 30 for transportation, and contamination of the raw material film 5 can be suppressed. Good quality optical film. In addition, by making the temperature of the air supplied from the air supply device higher than the dew point of the humidity-controlling gas, it is possible to suppress condensation of water vapor in the humidity-controlling gas, and it is possible to further suppress the condensation of dew condensation water on the outer wall surface of the transport opening 30.
如上述,從調濕器供給調濕氣體至調濕爐3內時,調濕爐3內之壓力(內壓)變成高於調濕爐3外之壓力(外壓),故調濕爐3內之調濕氣體變成容易通過搬送用開口部30之開口31而朝調濕爐3外流出。 As described above, when the humidifying gas is supplied from the humidifier into the humidifying furnace 3, the pressure (internal pressure) inside the humidifying furnace 3 becomes higher than the pressure (external pressure) outside the humidifying furnace 3, so the humidifying furnace 3 The humidity-controlling gas in the inside easily flows out of the humidity-controlling furnace 3 through the opening 31 of the conveyance opening 30.
因此,藉由在調濕爐3之外部設有空氣供給裝置而對搬送用開口部30之開口31供給簾狀的空氣,可抑制容易成為結露原因之調濕氣體被釋放至調濕爐3外,故可抑制 搬送用開口部30結露。 Therefore, by providing an air supply device outside the humidity control furnace 3 and supplying curtain-shaped air to the opening 31 of the transport opening 30, it is possible to suppress the release of the humidity control gas that is likely to cause dew condensation to the outside of the humidity control furnace 3. Therefore, it is possible to suppress condensation on the opening 30 for transportation.
(具備加溫裝置之光學薄膜之製造裝置) (Manufacturing device for optical film with heating device)
本實施形態之光學薄膜之製造裝置,就結露抑制裝置而言,在取代第1實施形態之光學薄膜的製造裝置1之抽吸裝置7,而具備加溫裝置之點係與第1實施形態相異。以下,有關與第1實施形態說明者為相同的構件則省略其說明。 The device for manufacturing an optical film according to this embodiment is similar to that of the first embodiment in that the condensation suppressing device replaces the suction device 7 of the optical film manufacturing device 1 of the first embodiment, and includes a heating device. different. Hereinafter, the same components as those described in the first embodiment will be omitted.
本實施形態之光學薄膜之製造裝置係具備加溫裝置,作為用以抑制在搬送用開口部之外壁面結露的結露抑制裝置。加溫裝置係加溫搬送用開口部30之外壁面者,藉此,調濕氣體從調濕爐3內流出時,從調濕爐3內流出之調濕氣體在調濕爐3外被冷卻等,藉此,可抑制調濕氣體中之水蒸氣在搬送用開口部30之外壁面形成結露水而附著。 The manufacturing apparatus of the optical film of this embodiment is provided with a heating device as a dew condensation suppressing device for suppressing dew condensation on the wall surface outside the opening for transportation. The heating device is a person who warms the outer wall surface of the opening 30 for conveyance, whereby the humidity-controlling gas flowing out of the humidity-controlling furnace 3 is cooled outside the humidity-controlling furnace 3 when the humidity-controlling gas flows out of the humidity-controlling furnace 3. By doing so, it is possible to prevent the water vapor in the humidity-controlling gas from forming dew condensation and adhering on the wall surface outside the transport opening 30.
(加溫裝置) (Heating device)
加溫裝置係藉由加溫搬送用開口部30之外壁面,可抑制從調濕爐3內流出之調濕氣體中的水蒸氣結露於搬送用開口部30之外壁面者。藉由加溫裝置加溫搬送用開口部30之外壁面,可抑制流出至調濕爐3外之調濕氣體中的水蒸氣由於該外壁面而冷卻,並可抑制結露於搬送用開口部30之外壁面。加溫裝置係可設置於調濕爐3所設之搬送用 開口部30之中的至少1個,亦可設置於調濕爐3之全部搬送用開口部30。又,光學薄膜之製造裝置可為具有:加溫裝置、以及在上述第1實施形態說明之抽吸裝置、在上述第2實施形態說明之空氣供給裝置、或此等兩者之中的任一者之裝置。 The heating device heats the outer wall surface of the opening 30 for transportation, and can prevent water vapor in the humidity-controlling gas flowing out of the humidity control furnace 3 from condensing on the outer wall surface of the opening 30 for transportation. By heating the outer wall surface of the opening 30 for transportation by the heating device, it is possible to suppress the water vapor flowing out of the humidity-controlling gas outside the humidity control furnace 3 from being cooled by the outer wall surface, and to suppress condensation on the opening 30 for transportation Outside wall surface. The heating device may be installed in at least one of the transport openings 30 provided in the humidity control furnace 3, or may be installed in all the transport openings 30 in the humidity control furnace 3. The optical film manufacturing device may include any one of a heating device, the suction device described in the first embodiment, the air supply device described in the second embodiment, or both. Person's device.
加溫裝置係只要為可直接或間接性加溫搬送用開口部30之外壁面者即可,無特別限定,而可使用公知之加熱裝置。加溫裝置可舉例如加熱器、電阻發熱體、感應加熱裝置、微波照射裝置等。 The heating device is not particularly limited as long as it can directly or indirectly warm the wall surface other than the opening 30 for conveyance, and a known heating device can be used. Examples of the heating device include a heater, a resistance heating element, an induction heating device, and a microwave irradiation device.
加溫裝置較佳係使搬送用開口部30之外壁面加溫至高於調濕爐3內之調濕氣體的凝縮性成分之水蒸氣會結露的溫度(調濕氣體之露點溫度)之溫度。使搬送用開口部30之外壁面藉加溫裝置而加溫至高於調濕氣體之露點溫度的溫度,藉此,可抑制調濕氣體所含之水蒸氣在外壁面被冷卻,並抑制水蒸氣形成結露水而附著於外壁面。外壁面之溫度通常只要較調濕氣體之露點溫度高3℃以上即可。 The heating device preferably heats the outer wall surface of the transport opening 30 to a temperature higher than the temperature at which the water vapor of the condensable component of the humidity-controlling gas in the humidity-controlling furnace 3 will condense (dew point temperature of the humidity-controlling gas). The outer wall surface of the transport opening 30 is heated to a temperature higher than the dew point temperature of the humidity-controlling gas by a heating device, thereby suppressing cooling of water vapor contained in the humidity-controlling gas on the outer wall surface and suppressing water vapor formation. Dew condensation adheres to the outer wall surface. The temperature of the outer wall surface generally needs only to be higher than the dew point temperature of the humidity-controlling gas by more than 3 ° C.
具備加溫裝置之光學薄膜之製造裝置,係原料薄膜之厚度小至1μm以上20μm以下時,在原料薄膜朝調濕爐搬入時或從調濕爐搬出時,不易引起原料薄膜之沾黏、皺褶、折入等搬送不良,故特別對薄的原料薄膜進行調濕處理時可適宜使用。 A manufacturing device for an optical film with a heating device. When the thickness of the raw material film is as small as 1 μm or more and 20 μm or less, the raw material film is unlikely to cause sticking and wrinkling when the raw material film is moved into or out of the humidity control furnace. Poor transportation such as pleating, folding, etc., can be used suitably when the humidity control of thin raw film is performed.
(使用加溫裝置之光學薄膜之製造方法) (Manufacturing method of optical film using heating device)
本實施形態之光學薄膜之製造裝置中,亦與第1圖所示之光學薄膜之製造裝置1同樣,從調濕爐3之搬入部30a將調濕前之原料薄膜5連續地搬入調濕爐3內,將在調濕爐3內經施予調濕處理之調濕後的原料薄膜5從調濕爐3之搬出部30b搬出。此時,藉由加溫裝置加溫調濕爐3之搬送用開口部30的外壁面,進行抑制於搬送用開口部30之外壁面結露的結露抑制處理。 In the manufacturing apparatus of the optical film of this embodiment, similarly to the manufacturing apparatus 1 of the optical film shown in FIG. 1, the raw material film 5 before the humidity conditioning is continuously carried into the humidity conditioning furnace from the carrying-in portion 30a of the humidity conditioning furnace 3. In 3, the humidity-controlled raw material film 5 subjected to the humidity control treatment in the humidity control furnace 3 is carried out from the carrying-out portion 30b of the humidity control furnace 3. At this time, the outer wall surface of the transport opening 30 of the humidity control furnace 3 is heated by a heating device to perform a dew condensation suppressing process for suppressing dew condensation on the outer wall surface of the transport opening 30.
藉由加溫裝置加溫搬送用開口部30之外壁面,可抑制流出至調濕爐3外之調濕氣體所含的水蒸氣在外壁面被冷卻。藉此,可抑制調濕氣體中所含之水蒸氣成為結露水而附著於搬送用開口部30之外壁面,可獲得良好品質之光學薄膜。又,藉由加溫裝置,將搬送用開口部30之外壁面加溫至高於調濕氣體之露點溫度的溫度,可抑制流出至調濕爐3外之調濕氣體的水蒸氣被冷卻而凝縮,可更抑制搬送用開口部30之外壁面結露。 By heating the outer wall surface of the opening 30 for conveyance by the heating device, it is possible to prevent the water vapor contained in the humidity-controlling gas flowing out of the humidity control furnace 3 from being cooled on the outer wall surface. Thereby, it is possible to suppress that the water vapor contained in the humidity-controlling gas becomes dew condensation and adheres to the outer wall surface of the opening 30 for transportation, and a good-quality optical film can be obtained. In addition, by heating the outer wall surface of the opening 30 for transportation to a temperature higher than the dew point temperature of the humidity-controlling gas by the heating device, it is possible to prevent the water vapor flowing out of the humidity-controlling gas outside the humidity-controlling furnace 3 from being cooled and condensing. It is possible to further suppress dew condensation on the outer wall surface of the transport opening 30.
如上述,從調濕器將調濕氣體供給至調濕爐3內時,調濕爐3內之壓力(內壓)高於調濕爐3外之壓力(外壓),故調濕爐3內之調濕氣體容易通過搬送用開口部30之開口31而朝調濕爐3外流出。 As described above, when the humidifying gas is supplied from the humidifier into the humidifying furnace 3, the pressure (internal pressure) in the humidifying furnace 3 is higher than the pressure (external pressure) outside the humidifying furnace 3, so the humidifying furnace 3 The humidity-controlling gas in the inside easily flows out of the humidity-controlling furnace 3 through the opening 31 of the transfer opening 30.
因此,藉由加溫裝置加溫搬送用開口部30之外壁面,容易成為結露原因之調濕氣體即使流出至調濕爐3外,亦可抑制被搬送用開口部30之外壁面冷卻,故可抑制搬送用開口部30結露。 Therefore, the heating device heats the outer wall surface of the opening 30 for transportation, and the humidity-controlling gas that is likely to cause dew condensation can flow out of the humidity control furnace 3, and can also prevent the cooling of the outer wall surface of the opening 30 for transportation. It is possible to suppress dew condensation on the transport opening 30.
Claims (15)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-147951 | 2017-07-31 | ||
| JP2017147951A JP7073058B2 (en) | 2017-07-31 | 2017-07-31 | Optical film manufacturing equipment and manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201910815A true TW201910815A (en) | 2019-03-16 |
| TWI751360B TWI751360B (en) | 2022-01-01 |
Family
ID=65264182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107125348A TWI751360B (en) | 2017-07-31 | 2018-07-23 | Apparatus and method for manufacturing optical film |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7073058B2 (en) |
| KR (1) | KR102552477B1 (en) |
| CN (1) | CN109324363B (en) |
| TW (1) | TWI751360B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102905684B1 (en) * | 2020-08-26 | 2025-12-29 | 동우 화인켐 주식회사 | Method of Preparing Polarizing Plate |
| JP2024061258A (en) | 2022-10-21 | 2024-05-07 | 日東電工株式会社 | Method for manufacturing optical film |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006251588A (en) * | 2005-03-14 | 2006-09-21 | Katsuhiko Nose | Method and apparatus for manufacturing polarizing film |
| JP2007199509A (en) * | 2006-01-27 | 2007-08-09 | Toshiyuki Nose | Method and apparatus for manufacturing polarizing film |
| JP5399162B2 (en) | 2008-09-30 | 2014-01-29 | 富士フイルム株式会社 | Method for producing retardation film and production equipment therefor |
| JP2010134440A (en) * | 2008-10-27 | 2010-06-17 | Fujifilm Corp | Method and installation for manufacturing retardation film |
| JP2010158788A (en) | 2009-01-06 | 2010-07-22 | Fujifilm Corp | Apparatus for adjusting property and state of polymer film |
| US8852496B2 (en) * | 2010-03-31 | 2014-10-07 | Fujifilm Corporation | Decurling method and apparatus, and film production method |
| DE102010052044A1 (en) | 2010-11-23 | 2012-05-24 | Vits Technology Gmbh | Method and installation for impregnating and drying a continuous paper web |
| JP2012240370A (en) | 2011-05-23 | 2012-12-10 | Sumitomo Metal Mining Co Ltd | Apparatus for continuously heating long film |
| CN102419057A (en) * | 2011-12-28 | 2012-04-18 | 林勇 | Top-blowing anti-condensation refrigerator |
| US20150042004A1 (en) * | 2012-03-14 | 2015-02-12 | Mitsubishi Rayon Co., Ltd. | Device for producing hollow porous film and method for producing hollow porous film |
| JP6033722B2 (en) | 2013-03-27 | 2016-11-30 | 住友化学株式会社 | Manufacturing method of polarizing plate |
| CN105579500B (en) | 2013-09-27 | 2018-12-07 | 东丽株式会社 | The manufacturing method of heat-resistant resin film and its manufacturing method, heating furnace and image display device |
| JP6264130B2 (en) * | 2014-03-24 | 2018-01-24 | 富士ゼロックス株式会社 | Image forming apparatus |
| JP2015206880A (en) | 2014-04-18 | 2015-11-19 | 旭硝子株式会社 | Optical element, and manufacturing method of optical element |
| JP5951870B1 (en) | 2015-05-26 | 2016-07-13 | 住友化学株式会社 | Manufacturing method of polarizing plate |
| JP6549424B2 (en) | 2015-06-19 | 2019-07-24 | 住友化学株式会社 | Method of producing stretched film |
| JP6690898B2 (en) | 2015-06-19 | 2020-04-28 | 住友化学株式会社 | Film humidifying system and method of manufacturing humidifying film |
| JP2017045529A (en) | 2015-08-24 | 2017-03-02 | 富士フイルム株式会社 | Method of manufacturing conductive film and method of manufacturing touch panel |
-
2017
- 2017-07-31 JP JP2017147951A patent/JP7073058B2/en active Active
-
2018
- 2018-07-23 TW TW107125348A patent/TWI751360B/en active
- 2018-07-27 KR KR1020180087883A patent/KR102552477B1/en active Active
- 2018-07-27 CN CN201810842091.1A patent/CN109324363B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20190013606A (en) | 2019-02-11 |
| KR102552477B1 (en) | 2023-07-05 |
| JP2019028285A (en) | 2019-02-21 |
| TWI751360B (en) | 2022-01-01 |
| CN109324363B (en) | 2022-08-30 |
| JP7073058B2 (en) | 2022-05-23 |
| CN109324363A (en) | 2019-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4542577B2 (en) | Normal pressure drying apparatus, substrate processing apparatus, and substrate processing method | |
| JP4341978B2 (en) | Substrate processing equipment | |
| JP4384685B2 (en) | Normal pressure drying apparatus, substrate processing apparatus, and substrate processing method | |
| JP4384686B2 (en) | Normal pressure drying apparatus, substrate processing apparatus, and substrate processing method | |
| US20180329304A1 (en) | Substrate baking apparatus and baking operation mehod thereof | |
| CN101055433B (en) | Heating treatment device | |
| TWI751360B (en) | Apparatus and method for manufacturing optical film | |
| TWI740052B (en) | Light irradiation device | |
| CN101738069A (en) | Vacuum drying soft baking equipment and vacuum drying soft baking process | |
| JP4721289B2 (en) | Substrate processing equipment | |
| KR20110052451A (en) | Substrate processing apparatus | |
| TW200837514A (en) | Substrate processing method and resist surface processing apparatus | |
| JP2012016942A (en) | Apparatus for manufacturing ceramic green sheet | |
| JP6660246B2 (en) | Drying device and coating system | |
| JP2016165811A (en) | Solution film formation method and equipment | |
| JP7003431B2 (en) | Light irradiation device | |
| JP4022315B2 (en) | Substrate processing equipment | |
| KR20090003953A (en) | Coating device of photosensitive material equipped with heating chamber and cooling chamber | |
| JP4780922B2 (en) | Heat treatment furnace and coating sheet manufacturing method | |
| KR20090117398A (en) | Chemical application device | |
| TW201915419A (en) | Solidifying equipment | |
| JP4703966B2 (en) | Method of carrying base material into heat treatment furnace and heat treatment furnace | |
| JP2000150362A (en) | Processing method and apparatus | |
| JP2010225853A (en) | Pattern formation method on flexible substrate | |
| JP2014157274A (en) | Ultraviolet irradiation apparatus and manufacturing method of display panel |