TW201910359A - Low polarity resin, and preparation method therefor and use thereof - Google Patents
Low polarity resin, and preparation method therefor and use thereof Download PDFInfo
- Publication number
- TW201910359A TW201910359A TW106143787A TW106143787A TW201910359A TW 201910359 A TW201910359 A TW 201910359A TW 106143787 A TW106143787 A TW 106143787A TW 106143787 A TW106143787 A TW 106143787A TW 201910359 A TW201910359 A TW 201910359A
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- Taiwan
- Prior art keywords
- resin
- preparation
- combination
- reaction
- chloride
- Prior art date
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- 229920005989 resin Polymers 0.000 title claims abstract description 94
- 239000011347 resin Substances 0.000 title claims abstract description 94
- 238000002360 preparation method Methods 0.000 title claims abstract description 29
- 238000006243 chemical reaction Methods 0.000 claims abstract description 59
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 38
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 32
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims abstract description 24
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims abstract description 13
- 150000002989 phenols Chemical class 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 239000000805 composite resin Substances 0.000 claims abstract description 8
- 239000005011 phenolic resin Substances 0.000 claims description 44
- 229920001568 phenolic resin Polymers 0.000 claims description 34
- 239000002904 solvent Substances 0.000 claims description 31
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 24
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims description 18
- 239000003444 phase transfer catalyst Substances 0.000 claims description 18
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 17
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 12
- -1 allyl decyl alcohol Chemical compound 0.000 claims description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 10
- 229920003986 novolac Polymers 0.000 claims description 9
- 238000006462 rearrangement reaction Methods 0.000 claims description 9
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 8
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 claims description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 8
- SHFJWMWCIHQNCP-UHFFFAOYSA-M hydron;tetrabutylazanium;sulfate Chemical compound OS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC SHFJWMWCIHQNCP-UHFFFAOYSA-M 0.000 claims description 8
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical group [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 claims description 8
- 239000002168 alkylating agent Substances 0.000 claims description 7
- 229940100198 alkylating agent Drugs 0.000 claims description 7
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 6
- 230000035484 reaction time Effects 0.000 claims description 6
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 6
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 claims description 6
- 239000008096 xylene Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 5
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 claims description 4
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 claims description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- FJXNTAPCILAWLT-UHFFFAOYSA-M [Cl-].C(CCCCCCCCCCCCC)C[N+](C)(C)Br Chemical compound [Cl-].C(CCCCCCCCCCCCC)C[N+](C)(C)Br FJXNTAPCILAWLT-UHFFFAOYSA-M 0.000 claims description 4
- 238000005937 allylation reaction Methods 0.000 claims description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 4
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 claims description 4
- 239000003153 chemical reaction reagent Substances 0.000 claims description 4
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 claims description 4
- 238000004100 electronic packaging Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 claims description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 4
- 150000003242 quaternary ammonium salts Chemical group 0.000 claims description 4
- XYHUIOCRXXWEAX-UHFFFAOYSA-N cyclopenta-1,3-diene;phenol Chemical compound C1C=CC=C1.OC1=CC=CC=C1 XYHUIOCRXXWEAX-UHFFFAOYSA-N 0.000 claims description 3
- MWKFXSUHUHTGQN-UHFFFAOYSA-N n-decyl alcohol Natural products CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 claims description 3
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 claims description 2
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 claims description 2
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 claims description 2
- HFEHLDPGIKPNKL-UHFFFAOYSA-N allyl iodide Chemical compound ICC=C HFEHLDPGIKPNKL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 claims description 2
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 claims description 2
- 229940073608 benzyl chloride Drugs 0.000 claims description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 claims description 2
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 claims description 2
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229960003750 ethyl chloride Drugs 0.000 claims description 2
- 150000007529 inorganic bases Chemical class 0.000 claims description 2
- 229940102396 methyl bromide Drugs 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000005022 packaging material Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 9
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 claims 2
- ODJUOZPKKHIEOZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3,5-dimethylphenyl)propan-2-yl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C)(C)C=2C=C(C)C(O)=C(C)C=2)=C1 ODJUOZPKKHIEOZ-UHFFFAOYSA-N 0.000 claims 1
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 12
- 230000008707 rearrangement Effects 0.000 abstract description 8
- 239000011159 matrix material Substances 0.000 abstract description 5
- 230000009257 reactivity Effects 0.000 abstract description 5
- 239000011888 foil Substances 0.000 abstract description 4
- 230000008859 change Effects 0.000 abstract description 2
- 238000006266 etherification reaction Methods 0.000 abstract 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 229920003192 poly(bis maleimide) Polymers 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- DKIUYAAMKFJPGB-UHFFFAOYSA-N 1-prop-2-enylcyclopenta-1,3-diene Chemical compound C=CCC1=CC=CC1 DKIUYAAMKFJPGB-UHFFFAOYSA-N 0.000 description 3
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical group C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 3
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000012774 insulation material Substances 0.000 description 3
- 238000004377 microelectronic Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000013557 residual solvent Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- OWXJKYNZGFSVRC-NSCUHMNNSA-N (e)-1-chloroprop-1-ene Chemical compound C\C=C\Cl OWXJKYNZGFSVRC-NSCUHMNNSA-N 0.000 description 2
- SCZZNWQQCGSWSZ-UHFFFAOYSA-N 1-prop-2-enoxy-4-[2-(4-prop-2-enoxyphenyl)propan-2-yl]benzene Chemical compound C=1C=C(OCC=C)C=CC=1C(C)(C)C1=CC=C(OCC=C)C=C1 SCZZNWQQCGSWSZ-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000002174 Styrene-butadiene Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- NQMRYBIKMRVZLB-UHFFFAOYSA-N methylamine hydrochloride Chemical compound [Cl-].[NH3+]C NQMRYBIKMRVZLB-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000011115 styrene butadiene Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- NNQDMQVWOWCVEM-UHFFFAOYSA-N 1-bromoprop-1-ene Chemical compound CC=CBr NNQDMQVWOWCVEM-UHFFFAOYSA-N 0.000 description 1
- RZPAXISDLOEXPI-UHFFFAOYSA-N 1-propylcyclopenta-1,3-diene Chemical compound CCCC1=CC=CC1 RZPAXISDLOEXPI-UHFFFAOYSA-N 0.000 description 1
- XNCTZUPZTWUFNW-UHFFFAOYSA-N 2-methyl-3-propylphenol Chemical compound CCCC1=CC=CC(O)=C1C XNCTZUPZTWUFNW-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000005007 epoxy-phenolic resin Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/215—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
- C07C37/11—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
- C07C41/16—Preparation of ethers by reaction of esters of mineral or organic acids with hydroxy or O-metal groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
- C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
- C08G8/36—Chemically modified polycondensates by etherifying
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Abstract
Description
本發明屬於熱固性樹脂技術領域,關於一種低極性樹脂及其製備方法和應用。 The invention belongs to the technical field of thermosetting resins, and relates to a low polarity resin and a preparation method and application thereof.
高性能熱固性樹脂以其優異的耐熱性、阻燃性、耐候性、電絕緣性,良好的力學性能及尺寸穩定性等特點,被廣泛應用於航空航太、軌道交通、電力絕緣、微電子封裝等領域複合材料之樹脂基體、耐高溫絕緣材料及膠黏劑等。常用的高性能熱固性樹脂有環氧樹脂、酚醛樹脂、雙馬來醯亞胺樹脂等,但上述樹脂存在著脆性導致材料抗衝擊能力不足,樹脂分子結構極性大導致介電常數及損耗偏高等弱點,從而限制其在某些領域的推廣應用,對熱固性樹脂改性研究一直是材料工作者關注的研究課題。 High performance thermosetting resins are widely used in aerospace, rail transit, power insulation, microelectronic packaging due to their excellent heat resistance, flame retardancy, weather resistance, electrical insulation, good mechanical properties and dimensional stability. Resin matrix, high temperature resistant insulation materials and adhesives for composite materials in other fields. Commonly used high-performance thermosetting resins include epoxy resin, phenolic resin, and bismaleimide resin. However, the above-mentioned resin has brittleness, which results in insufficient impact resistance of the material, and the resin has a high molecular structure polarity, resulting in weaknesses such as high dielectric constant and loss. In order to limit its promotion and application in certain fields, research on thermosetting resin modification has always been a research topic of concern to material workers.
近年來,以雙馬來醯亞胺樹脂為代表的耐高溫熱固性樹脂,越來越多用於航空航太雷達天線罩,軌道交通電路絕緣材料及微電子電路板等領域。隨著上述產業的迅速發展,電磁發射功率及頻率不斷增大,對材料的透波、絕緣性能要求日益提高,普通耐高溫熱固性樹脂因介電常數及損耗偏高,其透波絕緣性能已經無法滿足雷達、絕緣材料及微電子電路板之設計要求。因此,如何降低樹脂極性,進而降低介電常數及損 耗一直是研究人員關注之技術瓶頸問題。 In recent years, high-temperature thermosetting resins typified by bismaleimide resins have been increasingly used in aerospace aerospace radomes, rail transit circuit insulation materials and microelectronic circuit boards. With the rapid development of the above-mentioned industries, the electromagnetic transmission power and frequency are increasing, and the requirements for the wave transmission and insulation properties of materials are increasing. The dielectric constants and losses of ordinary high temperature resistant thermosetting resins are too high, and the transmission properties of the transmission are no longer possible. Meet the design requirements of radar, insulation materials and microelectronic circuit boards. Therefore, how to reduce the polarity of the resin and thus the dielectric constant and loss has always been a technical bottleneck concern of researchers.
合成新結構單體或樹脂是降低介電常數及損耗的可行方法。CN104311756A公開一種含矽雙馬來醯亞胺樹脂,含矽基團的引入可將介電常數降低至3.0以下。CN104479130A公開一種含氟結構的新型雙馬來醯亞胺單體,顯著降低雙馬來醯亞胺樹脂的介電常數及損耗。但是,上述新型結構雙馬來醯亞胺單體合成工藝複雜、成本高,難以批量製備及應用。此外,藉由其他樹脂共聚改性是改善熱固性樹脂絕緣性能的重要方法之一。CN101338032A公開採用氰酸酯改性雙馬來醯亞胺樹脂,製備預浸料,複合材料介電常數及損耗顯著降低。然而,該方法對於改善樹脂介電性能雖有一定功效,但程度有限,距離應用尚有一定之差距。 Synthesizing new structural monomers or resins is a viable method of reducing dielectric constant and loss. CN104311756A discloses a bismuth-containing bismaleimide resin which can reduce the dielectric constant to less than 3.0. CN104479130A discloses a novel bis-maleimide monomer having a fluorine-containing structure, which significantly reduces the dielectric constant and loss of a bismaleimide resin. However, the above-mentioned novel structure of the bismaleimide monomer has a complicated synthesis process and high cost, and is difficult to prepare and apply in batches. In addition, copolymerization modification by other resins is one of the important methods for improving the insulation properties of thermosetting resins. CN101338032A discloses the use of a cyanate-modified bismaleimide resin to prepare a prepreg, and the dielectric constant and loss of the composite material are significantly reduced. However, this method has certain effects on improving the dielectric properties of the resin, but the degree is limited, and there is still a certain gap in the distance application.
因此,在本領域中,期望得到一種低極性之樹脂材料以降低其固化物的介電常數及損耗,同時保持覆銅板其他方面之優良性能。 Therefore, in the art, it is desirable to obtain a low polarity resin material to lower the dielectric constant and loss of the cured product while maintaining the excellent properties of other aspects of the copper clad laminate.
針對先前技術的不足,本發明的目的在於提供一種低極性樹脂及其製備方法和應用。本發明的樹脂不含有極性基團(例如羥基)、分子極性低、反應活性高,降低其固化物的介電常數及損耗,此外能夠保證固化物具有良好的機械強度以及良好的耐高溫等性能。 In view of the deficiencies of the prior art, it is an object of the present invention to provide a low polarity resin and a preparation method and application thereof. The resin of the present invention does not contain a polar group (for example, a hydroxyl group), has low molecular polarity, high reactivity, lowers the dielectric constant and loss of the cured product, and further ensures good mechanical strength and good high temperature resistance of the cured product. .
為達到此發明目的,本發明採用以下技術手段:一方面,本發明提供一種低極性樹脂,前述低極性樹脂具有如下式I所示的結構:
其中,R為直鏈或支鏈烷基,、-O-、或;X及Y獨立地為氫、烯丙基、直鏈烷基、支鏈烷基中的任意一種或至少兩種的組合,A為直鏈或支鏈烷基或芳基烷基,n為1-20的整數。 Wherein R is a linear or branched alkyl group, , -O-, or X and Y are independently hydrogen, allyl, linear alkyl, branched alkyl, or a combination of at least two, A being a linear or branched alkyl or arylalkyl group, n being An integer from 1-20.
在本發明所記載之低極性樹脂中,前述低極性是指不含有極性基團,尤其是不含有羥基基團,使得樹脂具有較低的極性,克服藉由熱固性樹脂極性大導致的高頻介電常數及損耗高之缺陷,同時可藉由該結構中之烯丙基結構實現交聯固化,保證固化後之力學強度,此外可以保證固化物具有優良的耐熱性能。 In the low-polarity resin described in the present invention, the aforementioned low polarity means that it does not contain a polar group, and particularly does not contain a hydroxyl group, so that the resin has a low polarity, and overcomes the high frequency of the thermosetting resin. The defects of high electrical constant and high loss can be achieved by cross-linking curing of the allyl structure in the structure to ensure the mechanical strength after curing, and further ensure that the cured product has excellent heat resistance.
理想地,前述R為C1-C6(例如C1、C2、C3、C4、C5或C6)的直鏈烷基或C3-C6(例如C3、C4、C5或C6)支鏈烷基,具體而言可以為-CH2-、或等。 Desirably, the aforementioned R is a linear alkyl group of C1-C6 (e.g., C1, C2, C3, C4, C5 or C6) or a C3-C6 (e.g., C3, C4, C5 or C6) branched alkyl group, specifically Can be -CH 2 -, or Wait.
理想地,R為-CH2-、、-O-、或,X及Y獨立地為氫、烯 丙基、直鏈烷基、支鏈烷基中的任意一種或至少兩種的組合,A為直鏈或支鏈烷基或芳基烷基。 Ideally, R is -CH 2 -, , -O-, or And X and Y are independently a hydrogen, an allyl group, a linear alkyl group, a branched alkyl group, or a combination of at least two, and A is a linear or branched alkyl group or an arylalkyl group.
在本發明中,n為1-20的整數,例如n可以為1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19或20。 In the present invention, n is an integer of 1-20, for example, n may be 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17 , 18, 19 or 20.
理想地,X及Y獨立地為C1-C21(例如C1、C2、C3、C4、C5、C6、C7、C8、C9、C10、C11、C12、C13、C14、C15、C16、C17、C18、C19、C20或C21)的直鏈烷基或C3-C21(例如C3、C4、C5、C6、C7、C8、C9、C10、C11、C12、C13、C14、C15、C16、C17、C18、C19、C20或C21)支鏈烷基。 Desirably, X and Y are independently C1-C21 (eg, C1, C2, C3, C4, C5, C6, C7, C8, C9, C10, C11, C12, C13, C14, C15, C16, C17, C18, a linear alkyl group of C19, C20 or C21) or C3-C21 (eg C3, C4, C5, C6, C7, C8, C9, C10, C11, C12, C13, C14, C15, C16, C17, C18, C19) , C20 or C21) branched alkyl.
理想地,A為C1-C21(例如C1、C2、C3、C4、C5、C6、C7、C8、C9、C10、C11、C12、C13、C14、C15、C16、C17、C18、C19、C20或C21)的直鏈烷基或C3-C21(例如C3、C4、C5、C6、C7、C8、C9、C10、C11、C12、C13、C14、C15、C16、C17、C18、C19、C20或C21)支鏈烷基,具體而言可以為甲基、乙基、丙基、丁基、戊基等等。 Desirably, A is C1-C21 (eg, C1, C2, C3, C4, C5, C6, C7, C8, C9, C10, C11, C12, C13, C14, C15, C16, C17, C18, C19, C20 or Linear alkyl or C3-C21 of C21) (eg C3, C4, C5, C6, C7, C8, C9, C10, C11, C12, C13, C14, C15, C16, C17, C18, C19, C20 or C21) A branched alkyl group may specifically be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group or the like.
理想地,前述芳基烷基為苄基,即 Desirably, the aforementioned arylalkyl group is a benzyl group, that is,
理想地,前述低極性樹脂為具有如下式A至式D所示結構的化合物中的任意一種或至少兩種之組合:
另一方面,本發明提供如前述之低極性樹脂的製備方法,前述方法包含以下步驟: In another aspect, the present invention provides a method of preparing a low polarity resin as described above, the method comprising the steps of:
(1)式II所示酚類化合物或酚類樹脂與烯丙基化試劑反應得到式III所示烯丙基醚化樹脂,示例反應式如下:
(2)在保護性氣體保護下,將式III所示烯丙基醚化樹脂加熱,發生分子內重排反應得到式IV所示烯丙基化酚類樹脂;
(3)式III所示烯丙基化酚類樹脂與烷基化試劑發生反應,得到式I所示低極性樹脂;
在本發明中,步驟(2)的重排步驟中,當R2為或時,包含其中的烯丙醚基會發生重排的情況,導致在式IV所示烯丙基化酚類樹脂的中間單元R3中含有因重排而產生烯丙基,進而在產物式I所示低極性樹脂的R單元中包含因重排而產生的烯丙基,本發明中為表述簡潔未將該烯丙基直接表示至R3及R的相應結構中,而僅僅由X來代表苯環上所有之取代基,然而在此明確此處X包含因重排而產生的烯丙基,如果在重排反應前R2為或,苯環上帶有其他取代基 X,在步驟(2)的重排反應後,則在R3的結構或 中X可以表示重排產生的烯丙基及反應前的其他取代基的組合。當然在步驟(2)的重排步驟中,亦包含R2為或時,R2單元中烯丙醚基不發生重排反應的情況,此時,反應後R3以及產物R中的X與反應前式III所示烯丙基醚化樹脂中R2中的X基團相同。 In the present invention, in the rearrangement step of step (2), when R 2 is or In the case where the allyl ether group is contained therein, rearrangement occurs, resulting in the inclusion of an allyl group due to rearrangement in the intermediate unit R 3 of the allylated phenolic resin represented by Formula IV, and further in the product formula I The R unit of the low-polarity resin shown contains allyl groups produced by rearrangement. In the present invention, the ally is not directly represented in the corresponding structures of R 3 and R, but is represented only by X. All substituents on the phenyl ring, however it is clear here that X contains allyl groups due to rearrangement, if R 2 is before the rearrangement reaction or , the other substituent X is present on the benzene ring, and after the rearrangement reaction of the step (2), the structure of the R 3 or The middle X may represent a combination of allyl groups produced by rearrangement and other substituents before the reaction. Of course, in the rearrangement step of step (2), R 2 is also included. or When, R 2 unit allyl ether group rearrangement reaction does not occur at this time, the reaction product of R 3 and R before the reaction of X in the allyl ether of formula III in the resin of R 2 X The groups are the same.
理想地,步驟(1)所記載之酚類化合物或酚類樹脂為酚、二元酚、多元酚或其之衍生樹脂,理想為苯酚、鄰甲酚、雙酚A、雙酚F、四甲基雙酚A、酚醛樹脂、鄰甲酚酚醛樹脂或環戊二烯酚醛樹脂中的任意一種或至少兩種之組合。 Desirably, the phenolic compound or the phenolic resin described in the step (1) is a phenol, a dihydric phenol, a polyhydric phenol or a derivative thereof, and is preferably phenol, o-cresol, bisphenol A, bisphenol F, and quaternary Any one or a combination of at least two of a bisphenol A, a phenol resin, an o-cresol novolac resin or a cyclopentadiene phenol resin.
理想地,前述烯丙基化試劑為烯丙基矽醇、烯丙基氯、烯丙基溴、烯丙基碘或烯丙基胺中的任意一種或至少兩種之組合。 Desirably, the aforementioned allylating agent is any one or a combination of at least two of allyl decyl alcohol, allyl chloride, allyl bromide, allyl iodide or allylamine.
理想地,前述酚類化合物或酚類樹脂與烯丙基化試劑之莫耳比為1:(0.3~1.2),例如1:0.3、1:0.4、1:0.5、1:0.6、1:0.7、1:0.8、1:0.9、1:1、1:1.1或1:1.2。 Desirably, the molar ratio of the aforementioned phenolic compound or phenolic resin to the allylating agent is 1: (0.3 to 1.2), for example 1:0.3, 1:0.4, 1:0.5, 1:0.6, 1:0.7 , 1:0.8, 1:0.9, 1:1, 1:1.1 or 1:1.2.
理想地,步驟(1)所記載之反應在鹼性物質存在下進行,前述鹼性物質理想為氫氧化鈉、氫氧化鉀、碳酸鈉或碳酸鉀中的任意一種或至少兩種之組合。 Desirably, the reaction described in the step (1) is carried out in the presence of a basic substance, and the basic substance is preferably any one or a combination of at least two of sodium hydroxide, potassium hydroxide, sodium carbonate or potassium carbonate.
理想地,前述鹼性物質與步驟(1)所記載之酚類化合物或酚類樹脂中所含酚羥基之莫耳比為(0.3~1.4):1,例如0.3:1、0.4:1、0.5:1、 0.6:1、0.7:1、0.8:1、0.9:1、1:1、1.1:1、1.2:1、1.3:1或1.4:1。 Desirably, the molar ratio of the above-mentioned basic substance to the phenolic hydroxyl group contained in the phenolic compound or the phenolic resin described in the step (1) is (0.3 to 1.4): 1, for example, 0.3:1, 0.4:1, 0.5 : 1, 0.6:1, 0.7:1, 0.8:1, 0.9:1, 1:1, 1.1:1, 1.2:1, 1.3:1 or 1.4:1.
理想地,步驟(1)所記載之反應在相轉移催化劑存在下進行。 Desirably, the reaction described in the step (1) is carried out in the presence of a phase transfer catalyst.
理想地,前述相轉移催化劑為季銨鹽類相轉移催化劑,理想為四丁基氯化銨、四丁基溴化銨、苄基三乙基氯化銨、四丁基硫酸氫銨、三辛基甲基氯化銨、十二烷基三甲基氯化銨或十四烷基溴三甲基氯化銨中的任意一種或至少兩種之組合。 Desirably, the aforementioned phase transfer catalyst is a quaternary ammonium salt phase transfer catalyst, preferably tetrabutylammonium chloride, tetrabutylammonium bromide, benzyltriethylammonium chloride, tetrabutylammonium hydrogen sulfate, trioctane. Any one or a combination of at least two of methylammonium chloride, dodecyltrimethylammonium chloride or tetradecylbromotrimethylammonium chloride.
理想地,前述相轉移催化劑的加入量為步驟(1)所記載之酚類化合物或酚類樹脂質量的0.1~5%,例如0.1%、0.3%、0.5%、0.8%、1%、1.3%、1.5%、1.8%、2%、2.3%、2.5%、2.8%、3%、3.3%、3.5%、3.8%、4%、4.3%、4.5%、4.8%或5%。 Desirably, the amount of the phase transfer catalyst added is 0.1 to 5% by mass of the phenolic compound or the phenolic resin described in the step (1), for example, 0.1%, 0.3%, 0.5%, 0.8%, 1%, 1.3%. 1.5%, 1.8%, 2%, 2.3%, 2.5%, 2.8%, 3%, 3.3%, 3.5%, 3.8%, 4%, 4.3%, 4.5%, 4.8% or 5%.
理想地,步驟(1)所記載之反應的溶劑為醇類溶劑、芳香烴溶劑或酮類溶劑中的任意一種或至少兩種之組合,理想為乙醇、丙醇、丁醇、甲苯或二甲苯中的任意一種或至少兩種之組合。 Desirably, the solvent of the reaction described in the step (1) is any one or a combination of at least two of an alcohol solvent, an aromatic hydrocarbon solvent or a ketone solvent, and is preferably ethanol, propanol, butanol, toluene or xylene. Any one or a combination of at least two.
理想地,前述溶劑的加入量為步驟(1)所記載之酚類化合物或酚類樹脂質量的2~5倍,例如2倍、2.3倍、2.5倍、2.8倍、3倍、3.3倍、3.5倍、3.8倍、4倍、4.3倍、4.5倍、4.8倍或5倍。 Desirably, the solvent is added in an amount of 2 to 5 times the mass of the phenol compound or the phenol resin described in the step (1), for example, 2 times, 2.3 times, 2.5 times, 2.8 times, 3 times, 3.3 times, 3.5 times. Times, 3.8, 4, 4.3, 4.5, 4.8 or 5 times.
理想地,步驟(1)所記載之反應的溫度為60~90℃,例如60℃、63℃、65℃、68℃、70℃、75℃、78℃、80℃、85℃、88℃或90℃。 Desirably, the temperature of the reaction described in the step (1) is 60 to 90 ° C, for example, 60 ° C, 63 ° C, 65 ° C, 68 ° C, 70 ° C, 75 ° C, 78 ° C, 80 ° C, 85 ° C, 88 ° C or 90 ° C.
理想地,步驟(1)所記載之反應的時間為4~6小時,例如4小時、4.3小時、4.5小時、4.8小時、5小時、5.2小時、5.5小時、 5.8小時或6小時。 Desirably, the reaction time described in the step (1) is 4 to 6 hours, for example, 4 hours, 4.3 hours, 4.5 hours, 4.8 hours, 5 hours, 5.2 hours, 5.5 hours, 5.8 hours, or 6 hours.
理想地,步驟(2)所記載之保護性氣體為氮氣或氬氣。 Desirably, the protective gas described in the step (2) is nitrogen or argon.
理想地,步驟(2)所記載之加熱為加熱至180~220℃,例如180℃、185℃、190℃、195℃、200℃、205℃、210℃、215℃或220℃。 Desirably, the heating described in step (2) is heated to 180 to 220 ° C, such as 180 ° C, 185 ° C, 190 ° C, 195 ° C, 200 ° C, 205 ° C, 210 ° C, 215 ° C or 220 ° C.
理想地,步驟(2)所記載之反應的時間為4~6小時,例如4小時、4.3小時、4.5小時、4.8小時、5小時、5.2小時、5.5小時、5.8小時或6小時。 Desirably, the reaction time described in the step (2) is 4 to 6 hours, for example, 4 hours, 4.3 hours, 4.5 hours, 4.8 hours, 5 hours, 5.2 hours, 5.5 hours, 5.8 hours, or 6 hours.
理想地,步驟(3)所記載之烷基化試劑為鹵代烷烴,理想為氯甲烷、氯乙烷、氯丙烷、氯丁烷、溴甲烷、溴乙烷、溴丙烷、溴丁烷、苄基溴或苄基氯中的任意一種或至少兩種之組合。 Desirably, the alkylating agent described in the step (3) is a halogenated alkane, preferably methyl chloride, ethyl chloride, chloropropane, chlorobutane, methyl bromide, ethyl bromide, bromopropane, bromobutane, benzyl bromide. Or any one or a combination of at least two of benzyl chloride.
理想地,步驟(3)所記載之式III所示烯丙基化酚類樹脂中酚羥基與烷基化試劑中烷基的莫耳比為1:(1~1.2),例如1:1、1:1.05、1:1.1、1:1.15或1:1.2。使得反應得到的樹脂分子結構中酚羥基均被烷基醚化,從而使樹脂中無極性羥基基團。 Desirably, the molar ratio of the phenolic hydroxyl group in the allylated phenolic resin of the formula III described in the step (3) to the alkyl group in the alkylating agent is 1: (1 to 1.2), for example 1:1, 1:1.05, 1:1.1, 1:1.15 or 1:1.2. The phenolic hydroxyl groups in the molecular structure of the resin obtained by the reaction are all etherified with an alkyl group, so that the resin has no polar hydroxyl group.
理想地,步驟(3)所記載之反應在鹼性物質存在下進行。 Desirably, the reaction described in the step (3) is carried out in the presence of a basic substance.
理想地,前述鹼性物質為無機鹼,理想為氫氧化鈉、氫氧化鉀、碳酸鈉或碳酸鉀中的任意一種或至少兩種之組合。 Desirably, the aforementioned basic substance is an inorganic base, preferably any one or a combination of at least two of sodium hydroxide, potassium hydroxide, sodium carbonate or potassium carbonate.
理想地,前述鹼性物質與式III所示烯丙基化酚類樹脂中酚羥基的莫耳比為(1~1.4):1,例如1:1、1.05:1、1.1:1、1.15:1、1.2:1、1.25:1、1.3:1、1.35:1或1.4:1。 Desirably, the molar ratio of the aforementioned basic substance to the phenolic hydroxyl group in the allylated phenolic resin represented by Formula III is (1 to 1.4): 1, for example, 1:1, 1.05:1, 1.1:1, 1.15: 1, 1.2:1, 1.25:1, 1.3:1, 1.35:1 or 1.4:1.
理想地,步驟(3)所記載之反應在相轉移催化劑存在下進 行。 Desirably, the reaction described in the step (3) is carried out in the presence of a phase transfer catalyst.
理想地,前述相轉移催化劑為季銨鹽類相轉移催化劑,理想為四丁基氯化銨、四丁基溴化銨、苄基三乙基氯化銨、四丁基硫酸氫銨、三辛基甲基氯化銨、十二烷基三甲基氯化銨或十四烷基溴三甲基氯化銨中的任意一種或至少兩種之組合。 Desirably, the aforementioned phase transfer catalyst is a quaternary ammonium salt phase transfer catalyst, preferably tetrabutylammonium chloride, tetrabutylammonium bromide, benzyltriethylammonium chloride, tetrabutylammonium hydrogen sulfate, trioctane. Any one or a combination of at least two of methylammonium chloride, dodecyltrimethylammonium chloride or tetradecylbromotrimethylammonium chloride.
理想地,前述相轉移催化劑的加入量為步驟(3)所記載之烯丙基化酚類樹脂質量的0.1~5%,例如0.1%、0.3%、0.5%、0.8%、1%、1.3%、1.5%、1.8%、2%、2.3%、2.5%、2.8%、3%、3.3%、3.5%、3.8%、4%、4.3%、4.5%、4.8%或5%。 Desirably, the amount of the phase transfer catalyst added is 0.1 to 5% by mass of the allylated phenolic resin described in the step (3), for example, 0.1%, 0.3%, 0.5%, 0.8%, 1%, 1.3%. 1.5%, 1.8%, 2%, 2.3%, 2.5%, 2.8%, 3%, 3.3%, 3.5%, 3.8%, 4%, 4.3%, 4.5%, 4.8% or 5%.
理想地,步驟(3)所記載之反應的溶劑為醇類溶劑、芳香烴溶劑或酮類溶劑中的任意一種或至少兩種之組合,理想為乙醇、丙醇、丁醇、甲苯或二甲苯中的任意一種或至少兩種之組合。 Desirably, the solvent of the reaction described in the step (3) is any one or a combination of at least two of an alcohol solvent, an aromatic hydrocarbon solvent or a ketone solvent, and is preferably ethanol, propanol, butanol, toluene or xylene. Any one or a combination of at least two.
理想地,前述溶劑之加入量為步驟(3)所記載之烯丙基化酚類樹脂質量的2~5倍,例如2倍、2.3倍、2.5倍、2.8倍、3倍、3.3倍、3.5倍、3.8倍、4倍、4.3倍、4.5倍、4.8倍或5倍。 Desirably, the solvent is added in an amount of 2 to 5 times the mass of the allylated phenolic resin described in the step (3), for example, 2 times, 2.3 times, 2.5 times, 2.8 times, 3 times, 3.3 times, 3.5. Times, 3.8, 4, 4.3, 4.5, 4.8 or 5 times.
理想地,步驟(3)所記載之反應的溫度為60~90℃,例如60℃、63℃、65℃、68℃、70℃、75℃、78℃、80℃、85℃、88℃或90℃。 Desirably, the temperature of the reaction described in the step (3) is 60 to 90 ° C, for example, 60 ° C, 63 ° C, 65 ° C, 68 ° C, 70 ° C, 75 ° C, 78 ° C, 80 ° C, 85 ° C, 88 ° C or 90 ° C.
理想地,步驟(3)所記載之反應的時間為4~6小時,例如4小時、4.3小時、4.5小時、4.8小時、5小時、5.2小時、5.5小時、5.8小時或6小時。 Desirably, the reaction time described in the step (3) is 4 to 6 hours, for example, 4 hours, 4.3 hours, 4.5 hours, 4.8 hours, 5 hours, 5.2 hours, 5.5 hours, 5.8 hours, or 6 hours.
藉由本發明的方法製備得到的樹脂中不含有極性的羥基, 此外分子結構穩定,具有分子極性低、反應活性高的特點,在其應用的加工過程中亦不會產生極性羥基,避免產生的二次羥基對於其產物的性能的影響。 The resin prepared by the method of the invention does not contain polar hydroxyl groups, and has stable molecular structure, low molecular polarity and high reactivity, and does not generate polar hydroxyl groups during the application process, and avoids the generation of The effect of the secondary hydroxyl group on the properties of its product.
另一方面,本發明提供如前述之低極性樹脂在樹脂複合材料製備中的應用。 In another aspect, the invention provides the use of a low polarity resin as described above in the preparation of a resin composite.
本發明的低極性樹脂可用於樹脂複合材料中基體樹脂的組成份之一,能夠與雙馬來醯亞胺等其他熱固性樹脂共交聯固化,顯著降低樹脂介電常數及介電損耗。 The low-polarity resin of the present invention can be used for one of the constituent components of the matrix resin in the resin composite material, and can be co-crosslinked and cured with other thermosetting resins such as bismaleimide, and the dielectric constant and dielectric loss of the resin are remarkably lowered.
在本發明中,前述樹脂複合材料可以為航空航太透波複合材料、電力絕緣材料、電子封裝用樹脂複合材料以及覆銅板用樹脂複合材料等。 In the present invention, the resin composite material may be an aerospace wave-transparent composite material, a power insulating material, a resin composite material for electronic packaging, or a resin composite material for a copper-clad laminate.
另一方面,本發明提供如前述之低極性樹脂在電子封裝材料製備中的應用。 In another aspect, the invention provides the use of a low polarity resin as described above in the preparation of electronic packaging materials.
本發明的低極性樹脂因具有分子極性低、反應活性高的特點,進一步可以應用於電子封裝膠黏劑、灌封樹脂等材料的製備。 The low-polarity resin of the invention has the characteristics of low molecular polarity and high reactivity, and can be further applied to preparation of materials such as electronic packaging adhesives and potting resins.
另一方面,本發明提供如前述之低極性樹脂在覆金屬箔層壓板製備中的應用。 In another aspect, the invention provides the use of a low polarity resin as described above in the preparation of a metal foil laminate.
本發明所記載之低極性樹脂可用於樹脂複合材料中基體樹脂的組成份之一,能夠與雙馬來醯亞胺等其他熱固性樹脂共交聯固化,顯著降低樹脂介電常數及介電損耗,將其用於覆金屬箔層壓板製備中有利於降低覆金屬箔層壓板的介電常數及介電損耗,使得覆金屬箔層壓板具有良好的綜合性能。 The low-polarity resin described in the present invention can be used for one of the constituent components of the matrix resin in the resin composite material, and can be co-crosslinked and cured with other thermosetting resins such as bismaleimide, and the dielectric constant and dielectric loss of the resin are remarkably lowered. The use thereof in the preparation of the metal foil-clad laminate is advantageous for reducing the dielectric constant and dielectric loss of the metal foil-clad laminate, so that the metal foil-clad laminate has good comprehensive performance.
與先前技術相比,本發明具有如下功效:本發明的樹脂中不含有極性的羥基,此外分子結構穩定,具有分子極性低、反應活性高的特點,在其應用的加工過程中亦不會產生極性羥基,避免產生的二次羥基對於其產物的性能的影響,因此該樹脂在提高介電性能同時,依舊帶有可交聯反應基團,使得固化後耐高溫性能無顯著變化,可用於樹脂複合材料中基體樹脂的組成份之一,能夠與雙馬來醯亞胺等其他熱固性樹脂共交聯固化,顯著降低樹脂介電常數及介電損耗,將其用於覆金屬箔層壓板製備中有利於降低覆金屬箔層壓板的介電常數及介電損耗,並具有較高的耐高溫性能,使得覆金屬箔層壓板具有良好的綜合性能。 Compared with the prior art, the present invention has the following effects: the resin of the present invention does not contain a polar hydroxyl group, and has a stable molecular structure, a low molecular polarity and a high reactivity, and is not produced during the application process. The polar hydroxyl group avoids the influence of the generated secondary hydroxyl group on the properties of the product. Therefore, the resin has a crosslinkable reactive group while improving the dielectric properties, so that the high temperature resistance after curing has no significant change, and can be used for the resin. One of the components of the matrix resin in the composite material can be co-crosslinked and cured with other thermosetting resins such as bismaleimide, which significantly reduces the dielectric constant and dielectric loss of the resin, and is used in the preparation of the metal foil-clad laminate. It is beneficial to reduce the dielectric constant and dielectric loss of the metal foil-clad laminate, and has high high temperature resistance, so that the metal foil-clad laminate has good comprehensive performance.
【圖1】為實施例1製備得到的低極性樹脂之紅外光譜圖。 Fig. 1 is an infrared spectrum chart of the low polarity resin prepared in Example 1.
下面藉由具體實施方式來進一步說明本發明之技術手段。該領域中具有通常知識者應該明瞭,下述實施例僅僅是幫助理解本發明,不應視為對本發明的具體限制。 The technical means of the present invention will be further described below by way of specific embodiments. It is to be understood by those of ordinary skill in the art that the following examples are merely to be construed as an understanding of the invention.
實施例1 Example 1
在本實施例中,藉由以下方法製備低極性樹脂,包含以下步驟: In this embodiment, a low polarity resin is prepared by the following method, comprising the steps of:
(1)三口反應瓶中加入188g丙酮,將228g雙酚A加入反應瓶中,攪拌溶解後,加入106g碳酸鈉。再緩慢滴加153g氯丙烯溶液,接著反應 4小時後停止反應。過濾除鹽,去除大部分溶劑,洗滌,再除去殘留的溶劑及水,即得到雙酚A二烯丙基醚。 (1) 188 g of acetone was added to a three-necked reaction flask, and 228 g of bisphenol A was added to the reaction flask, and after stirring and dissolved, 106 g of sodium carbonate was added. Further, 153 g of a chloropropene solution was slowly added dropwise, followed by a reaction for 4 hours to stop the reaction. The salt is removed by filtration, most of the solvent is removed, and the residual solvent and water are removed to obtain bisphenol A diallyl ether.
(2)將步驟1製備的134g雙酚A二烯丙基醚放入反應瓶中,加熱進行重排反應,降溫出料,得到棕色黏稠液體即二烯丙基雙酚A。 (2) 134 g of bisphenol A diallyl ether prepared in the step 1 was placed in a reaction flask, heated to carry out a rearrangement reaction, and the temperature was discharged to obtain a brown viscous liquid, that is, diallyl bisphenol A.
(3)反應瓶中加入402g正丁醇,將步驟2製備的154g二烯丙基雙酚A放入反應瓶中,攪拌溶解後,加入138g碳酸鉀。緩慢滴加157g氯丙烷溶液,接著升溫反應6小時後停止反應。過濾,去除大部分溶劑,洗滌,再除去殘留的溶劑及水,即得到3,3’-二烯丙基-4,4’-二丙基苯氧基丙烷,即前述低極性樹脂,其結構如下所示:
該實施例製備得到的3,3’-二烯丙基-4,4’-二丙基苯氧基丙烷的紅外光譜圖如圖1所示,可以看出,3300-3500cm-1處的羥基結構已經消失,不含有極性的羥基基團,使分子極性顯著降低。 The infrared spectrum of 3,3'-diallyl-4,4'-dipropylphenoxypropane prepared in this example is shown in Fig. 1. It can be seen that the hydroxyl group at 3300-3500 cm -1 The structure has disappeared and does not contain polar hydroxyl groups, resulting in a significant decrease in molecular polarity.
實施例2 Example 2
在本實施例中,藉由以下方法製備低極性樹脂,包含以下步驟: In this embodiment, a low polarity resin is prepared by the following method, comprising the steps of:
(1)三口反應瓶中加入300g正丁醇,將114g線型酚醛樹脂加入反應瓶中,攪拌溶解後,加入56g氫氧化鉀。緩慢滴加153g溴丙烯溶液,接著升溫反應4小時後停止反應。過濾,洗滌,再除去殘留的溶劑及水,即得到烯丙基醚化酚醛樹脂。 (1) 300 g of n-butanol was added to a three-neck reaction flask, and 114 g of a novolak type phenol resin was added to the reaction flask, and after stirring and dissolved, 56 g of potassium hydroxide was added. 153 g of a bromopropene solution was slowly added dropwise, followed by a temperature increase reaction for 4 hours, and then the reaction was stopped. Filtration, washing, and removal of residual solvent and water give an allyl etherified phenolic resin.
(2)將步驟1製備的141g烯丙基醚化酚醛樹脂放入反應瓶中,加熱進行重排反應,降溫出料,得到棕色黏稠液體即烯丙基酚醛樹脂。 (2) 141 g of the allyl etherified phenolic resin prepared in the step 1 was placed in a reaction flask, heated to carry out a rearrangement reaction, and the temperature was discharged to obtain a brown viscous liquid, that is, an allyl phenolic resin.
(3)反應瓶中加入402g正丁醇,將步驟2製備的141g烯丙基酚醛樹脂放入反應瓶中,攪拌溶解後,加入104g碳酸鈉。緩慢滴加171g氯丁烷溶液,接著升溫反應6小時後停止反應。過濾,洗滌,再除去溶劑及水,即得到丁基醚化烯丙基酚醛樹脂,即前述低極性樹脂,其Mn為1080,其結構如下所示:
實施例3 Example 3
在本實施例中,藉由以下方法製備低極性樹脂,包含以下步驟: In this embodiment, a low polarity resin is prepared by the following method, comprising the steps of:
(1)三口反應瓶中加入250g甲苯,將118g鄰甲酚酚醛樹脂加入反應瓶中,攪拌溶解後,加入100g氫氧化鈉水溶液(濃度40%),再加入1g四丁基溴化銨。再緩慢滴加153g氯丙烯溶液,接著升溫反應4小時後停止反應,洗滌,再除去溶劑,即得到烯丙基醚化鄰甲酚酚醛樹脂。 (1) To a three-necked reaction flask, 250 g of toluene was added, and 118 g of o-cresol novolac resin was added to the reaction flask, and after stirring and dissolved, 100 g of an aqueous sodium hydroxide solution (concentration: 40%) was added, and 1 g of tetrabutylammonium bromide was further added. Further, 153 g of a chloropropene solution was slowly added dropwise, followed by a temperature increase reaction for 4 hours, the reaction was stopped, and the solvent was removed to obtain an allyl etherified o-cresol novolac resin.
(2)將步驟1製備的159g烯丙基醚化鄰甲酚酚醛樹脂放入反應瓶中,加熱進行重排反應,降溫出料,得到深棕色半固體為烯丙基鄰甲酚酚醛樹脂。 (2) 159 g of the allyl etherified o-cresol novolac resin prepared in the step 1 was placed in a reaction flask, and the rearrangement reaction was carried out by heating, and the temperature was discharged to obtain a dark brown semisolid as an allyl o-cresol novolac resin.
(3)反應瓶中加入300g甲苯,將步驟2製備的159g烯丙基鄰甲酚酚醛樹脂放入反應瓶中,攪拌溶解後,加入100g氫氧化鈉水溶液(40%)。待溫度恆定後,緩慢滴加157g氯丙烷,接著升溫反應6小時後停止反應,洗滌,再除去溶劑及水,即得到丙基醚化烯丙基鄰甲酚酚醛樹脂,其Mn為1230,即前述低極性樹脂,其結構如下所示:
實施例4 Example 4
在本實施例中,藉由以下方法製備低極性樹脂,包含以下步驟: In this embodiment, a low polarity resin is prepared by the following method, comprising the steps of:
(1)三口反應瓶中加入300g二甲苯,將130g環戊二烯酚醛樹脂加入反應瓶中,攪拌溶解後,加入100g氫氧化鈉水溶液(濃度40%),再加入1g四丁基溴化銨。緩慢滴加153g烯丙基矽醇溶液,接著升溫反應4小時後停止反應,洗滌,再除去溶劑,即得到烯丙基醚化環戊二烯酚醛樹脂。 (1) Add 300 g of xylene to a three-neck reaction flask, add 130 g of cyclopentadiene phenolic resin to the reaction flask, stir and dissolve, add 100 g of sodium hydroxide aqueous solution (concentration: 40%), and add 1 g of tetrabutylammonium bromide. . 153 g of the allyl decyl alcohol solution was slowly added dropwise, followed by a temperature increase reaction for 4 hours, the reaction was stopped, and the solvent was removed to obtain an allyl etherified cyclopentadiene phenol resin.
(2)將步驟1製備的141g烯丙基醚化環戊二烯酚醛樹脂放入反應瓶中,加熱進行重排反應,降溫出料,得到深棕色半固體為烯丙基環戊二烯酚醛樹脂。 (2) 141 g of the allyl etherified cyclopentadiene phenolic resin prepared in the step 1 was placed in a reaction flask, heated to carry out a rearrangement reaction, and the temperature was discharged to obtain a dark brown semi-solid as allyl cyclopentadiene phenol Resin.
(3)反應瓶中加入300g二甲苯,將步驟2製備的141g烯丙基環戊二烯酚醛樹脂放入反應瓶中,攪拌溶解後,加入100g氫氧化鈉 水溶液(40%)。待溫度恆定後,緩慢滴加172g氯丁烷,接著升溫反應6小時後停止反應,洗滌,再除去溶劑及水,即得到丁基醚化烯丙基環戊二烯酚醛樹脂,其Mn為1450,即前述低極性樹脂,其結構如下所示:
實施例5 Example 5
將80重量份的液體丁苯樹脂Ricon100,20重量份的實施例1製備之含磷酯化二烯丙基雙酚A,85重量份的二氧化矽(525),6.5重量份的引發劑DCP混合,用溶劑甲苯調至合適的黏度,攪拌混合均勻,使填料均一地分散在樹脂中,製得膠液。用1080玻璃纖維布浸漬以上膠液,接著烘乾去掉溶劑後製得半固化片。將八張已製成的半固化片相疊合,在其兩側壓覆1oz(盎司)厚度的銅箔,在壓機中進行2小時固化,固化壓力為50Kg/cm2,固化溫度為190℃,得到覆銅板。 80 parts by weight of liquid styrene-butadiene resin Ricon 100, 20 parts by weight of phosphorus-containing esterified diallyl bisphenol A prepared in Example 1, 85 parts by weight of cerium oxide (525), and 6.5 parts by weight of initiator DCP Mixing, adjusting to a suitable viscosity with a solvent of toluene, stirring and mixing uniformly, and uniformly dispersing the filler in the resin to obtain a glue. The above glue was impregnated with a 1080 glass cloth, and then the solvent was removed by drying to obtain a prepreg. Eight pre-cured sheets were laminated, and a copper foil of 1 oz (ounce) thickness was pressed on both sides thereof, and solidified in a press for 2 hours at a curing pressure of 50 kg/cm 2 and a curing temperature of 190 ° C. A copper clad laminate is obtained.
實施例6 Example 6
與實施例5的區別僅在於將實施例1製備得到的3,3’-二烯丙基-4,4’-二丙基苯氧基丙烷替換為實施例2製備得到的3,3’-二烯丙基-4,4’-二丙基苯氧基丙烷。 The only difference from the embodiment 5 is that the 3,3'-diallyl-4,4'-dipropylphenoxypropane prepared in Example 1 is replaced by the 3,3'- prepared in the second embodiment. Diallyl-4,4'-dipropylphenoxypropane.
實施例7 Example 7
與實施例5的區別僅在於將實施例1製備得到的3,3’-二烯丙基-4,4’- 二丙基苯氧基丙烷替換為實施例3製備得到的丙基醚化烯丙基鄰甲酚酚醛樹脂。 The only difference from Example 5 is that the 3,3'-diallyl-4,4'-dipropylphenoxypropane prepared in Example 1 was replaced with the propyl etherified alkene prepared in Example 3. Propyl o-cresol novolac resin.
實施例8 Example 8
與實施例5的區別僅在於將實施例1製備得到的3,3’-二烯丙基-4,4’-二丙基苯氧基丙烷替換為實施例4製備得到的丁基醚化烯丙基環戊二烯酚醛樹脂。 The only difference from Example 5 is that the 3,3'-diallyl-4,4'-dipropylphenoxypropane prepared in Example 1 was replaced with the butyl etherified alkene prepared in Example 4. Propylcyclopentadiene phenolic resin.
比較例1 Comparative example 1
將80重量份的液體丁苯樹脂Ricon100,85重量份的二氧化矽(525),5.8重量份的引發劑DCP混合,用溶劑甲苯調至合適的黏度,攪拌混合均勻,使填料均一地分散在樹脂中,製得膠液。用1080玻璃纖維布浸漬以上膠液,接著烘乾去掉溶劑後製得半固化片。將八張已製成的半固化片相疊合,在其兩側壓覆1oz(盎司)厚度的銅箔,在壓機中進行2小時固化,固化壓力為50Kg/cm2,固化溫度為190℃,得到覆銅板。 80 parts by weight of liquid styrene-butadiene resin Ricon 100, 85 parts by weight of cerium oxide (525), 5.8 parts by weight of initiator DCP were mixed, adjusted to a suitable viscosity with a solvent of toluene, stirred and uniformly mixed, and the filler was uniformly dispersed. In the resin, a glue is obtained. The above glue was impregnated with a 1080 glass cloth, and then the solvent was removed by drying to obtain a prepreg. Eight pre-cured sheets were laminated, and a copper foil of 1 oz (ounce) thickness was pressed on both sides thereof, and solidified in a press for 2 hours at a curing pressure of 50 kg/cm 2 and a curing temperature of 190 ° C. A copper clad laminate is obtained.
實施例6-10以及比較例1所應用到的原料來源如表1所示,製備得到的覆銅板的物性數據如表2所示。 The raw material sources used in Examples 6-10 and Comparative Example 1 are shown in Table 1, and the physical property data of the prepared copper clad laminates are shown in Table 2.
由表2可知,本發明製備得到的低極性本徵阻燃性樹脂可以使得覆銅板具有較低的介電常數及介電損耗,具有較佳的耐高溫性能以及阻燃性能。 It can be seen from Table 2 that the low polarity intrinsic flame retardant resin prepared by the invention can make the copper clad laminate have lower dielectric constant and dielectric loss, and has better high temperature resistance and flame retardant performance.
申請人聲明,本發明藉由上述實施例來說明本發明的低極性樹脂及其製備方法和應用,但本發明並不侷限於上述實施例,即不意味著本發明必須依賴上述實施例才能實施。該領域中具有通常知識者應該明瞭,對本發明的任何改進,對本發明所選用原料的均等置換及輔助成分之添加、具體方式的選擇等,均落在本發明的保護範圍及公開範圍之內。 The Applicant declares that the present invention describes the low-polarity resin of the present invention and its preparation method and application by the above embodiments, but the present invention is not limited to the above embodiments, that is, it does not mean that the present invention must be implemented by relying on the above embodiments. . It is to be understood by those skilled in the art that any modifications of the invention, the substitution of the materials of the invention, and the addition of the auxiliary components, the selection of the specific means, etc., are within the scope of the invention and the scope of the disclosure.
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