TW201900284A - Nozzle unit, atmosphere exchanging device with nozzle unit, and atmosphere exchanging method capable of promptly providing suitable thrust to the nozzle for replacing atmosphere according to the receiving condition of received object in the container - Google Patents

Abstract

A nozzle unit and an atmosphere exchanging device are provided. The nozzle unit can promptly provide suitable thrust to the nozzle according to a received condition of a received object in a container. This invention comprises a nozzle body (23), which is formed with a flow path for flushing gas to pass; and an electromagnet (24); and also comprises a nozzle driving part (25), which makes the nozzle body (23) moving forward and backward relative to connection ports (21,22) for atmosphere replacement; a permanent magnet (30), which is capable of moving forward and backward through a magnetic field generated by the electromagnet (24); a power supply part (26), which provides electricity to the nozzle driving means (25); and a control part (37), which regulates a current value that is provided from the power supply part (26) and provided to the electromagnet (24).

Description

 Nozzle unit, environmental gas replacement device including nozzle unit, and environmental gas replacement method  

The present invention relates to an environmental gas replacement device that replaces an ambient gas inside a container with an environmental gas such as an inert gas in a container that can be sealed, and a nozzle unit and an environmental gas replacement device provided in the environmental gas replacement device. In the method, the closable container is used for transporting between thin-plate substrates such as semiconductor wafers, liquid crystal panels, and organic EL display panels.

In the past, a processing apparatus for performing various processes such as film formation and etching on a thin plate-shaped substrate such as a semiconductor wafer, and an EFEM (Equipment Front End Module) for reading a substrate, or reading In order to prevent dust particles floating in the air from adhering to the thin plate-like substrate, the lottery is selected as a micro-environment (referred to as a micro-environment). The mini-environment method is highly clean and has a high degree of cleanliness, and the micro-environment is used to maintain the ambient gas inside the device exposed to the substrate with high cleanliness.

However, in recent years, with the miniaturization of the design rule of the semiconductor circuit line width, production below 10 nm has become more and more realistic. As a result, there has been a problem that it is impossible to cope with the high cleanliness of the conventional micro-environment method. That is, after being processed by the processing apparatus, there is a possibility that a surface of the substrate conveyed inside the container reacts with oxygen or moisture in the air to form a film which is undesirably formed in various processing steps such as a natural oxide film. Further, in addition to oxygen or moisture in the air, the contaminant used in the treatment device may be transported into the container while being attached to the thin plate-like substrate, and the contaminant may even be contaminated into the sealed container. Other thin plate-like substrates may further adversely affect the subsequent processing steps and cause a deterioration in yield.

As a method for solving these problems, various methods have been conceived in which the air or contaminant entering the container is removed by an inert gas supplied from the outside, and the container accommodating space is filled with an inert gas to prevent Oxidation of the surface of the thin plate substrate that is contained.

An environmental gas replacement connection for replacing the internal environmental gas of the FOUP as one of the airtight containers for the FOUP (Front Opening Unified Pod), that is, the semiconductor wafer in the internal space. In other words, it has an injection port for injecting an inert gas into a space inside the FOUP, and a discharge port for discharging an atmosphere containing an oxidizing gas remaining inside the FOUP. Further, a device called a wafer loader that mounts a FOUP and has a mechanism for opening and closing a front door provided in the FOUP is formed to be mountable on a platform portion on which the FOUP is placed. The injection nozzle and the discharge nozzle for replacing the atmosphere of the inside of the FOUP through the injection port and the discharge port are provided.

In addition, when the FOUP to be transported is placed on the platform or the FOUP placed on the platform is transported to the next step, in order to prevent the injection nozzle or the discharge nozzle from colliding with the FOUP, the wafer is loaded on the wafer. The inlet is provided with a structure in which the injection nozzle and the discharge nozzle can be raised and lowered by the drive mechanism. This is to wait for the nozzles to move toward the lower portion of the platform and to prevent the FOUP from being transported when it is not necessary to replace the inside of the FOUP. When the ambient gas inside the FOUP is replaced with an inert gas or the like, the nozzles are driven by the drive mechanism. It protrudes from the bottom surface of the FOUP, and is placed in contact with the injection port and the discharge port disposed on the bottom surface of the FOUP, and is configured to perform environmental gas replacement treatment inside the FOUP.

Prior technical literature Patent literature

Patent Document 1 Japanese Patent Laid-Open Publication No. 2011-187539

Patent Document 2 Japanese Patent Publication No. 2015-088500

The nozzle lifting/lowering driving unit disclosed in Patent Document 1 is disposed at a lower portion of a platform on which a FOUP is placed, and is provided with a pneumatic cylinder as a driving source. The injection nozzle and the discharge nozzle are moved up and down by opening or closing the compressed air supplied to the pneumatic cylinder with a solenoid valve or the like.

With the above configuration, when the ambient gas replacement process is not performed, each nozzle can be retracted to the retracted position. However, in the configuration disclosed in this document 1, the nozzle can only be raised or lowered with a certain force. In order to replace the inside of the FOUP in a short time, it is necessary to supply a large flow of purge gas. At this time, in order to prevent the flushing gas from leaking outward from the injection nozzle and the FOUP bottom surface, it is necessary to press the injection nozzle to the bottom surface of the FOUP with a certain degree of strength. In addition, the weight of the entire FOUP is increased or decreased depending on the number of substrates accommodated in the inside. Therefore, the nozzle is pressed against the bottom surface of the FOUP in a lightweight state by the pressing force corresponding to the FOUP of the heaviest full load state. The FOUP placed on the platform may float. If the FOUP floats, the sensor that detects the placed state of the FOUP becomes an off state, and as a result, the entire device is stopped, which may cause a large step delay.

The gas supply and discharge mechanism disclosed in Patent Document 2 includes a gas flow nozzle that supplies an inert gas, and a case portion that is opened below the gas flow nozzle by the pressure of the supplied gas. The gas circulation nozzle is housed in the outer casing when the gas is not supplied. However, when the gas is supplied, the pressure of the gas filled in the first pressure adjustment chamber formed in the outer casing portion is pushed upward, and the supply of the FOUP bottom surface is provided.埠 Abut. Then, the gas filled in the outer casing portion is introduced into the inside of the FOUP through the opening formed in the gas circulation nozzle. Further, a second pressure adjustment chamber is formed above the first pressure adjustment chamber of the outer casing portion, and the internal pressure of the second pressure adjustment chamber is adjusted to a negative pressure or a positive pressure to raise or lower the gas flow nozzle. Movement gives potential energy.

With the above configuration, the force of the flushing nozzle can be changed by the flow rate of the supplied flushing gas. However, a new problem arises by replacing the gas inside the FOUP and directly moving the nozzle. That is, as the nozzle moves up and down in the outer casing portion, the nozzle slides along the inner wall of the outer casing portion, thereby generating minute dust. This dust intrudes into the internal space of the FOUP together with the flushing gas and adheres to the surface of the substrate housed in the inside of the FOUP. As a result, there is a possibility that a pattern such as a broken line is formed in a very small electronic circuit formed on the substrate, thereby causing a product. The yield is deteriorating.

The present invention has been made in view of the above problems, and a main object thereof is to provide a nozzle unit and an environmental gas replacement device including a nozzle unit that can correspond to a housing state of a substrate inside the container, with an optimum thrust The rinsing nozzle is pressed against the rinsing bowl formed in the container, and the clean rinsing gas can be supplied toward the internal space of the container.

In order to achieve the above object, a nozzle unit according to an embodiment of the present invention is configured to replace a container inside a container with a predetermined atmosphere by a connection port for environmental gas replacement provided in a sealable container, wherein the nozzle unit is characterized in that the nozzle unit is characterized in that The nozzle body includes a flow path through which the flushing gas passes, and the nozzle drive unit includes an electromagnet, and the nozzle body is moved forward and backward with respect to the environmental gas replacement port by a magnetic field generated by the electromagnet a permanent magnet that moves forward and backward by a magnetic field generated by the electromagnet; a power supply unit that supplies electric power to the nozzle driving means; and a control unit that adjusts a current value supplied from the power supply unit and supplies the electromagnet .

With the above configuration, the control unit can adjust the current value supplied from the power supply unit and supply it to the electromagnet. Further, since the driving source of the driving unit that moves the nozzle body forward and backward moves, the dust from the movable portion does not enter the flow path through which the flushing gas passes, and the clean flushing gas can be supplied to the inside of the container.

Moreover, the control unit provided in the nozzle unit according to the embodiment of the present invention is characterized in that the current value supplied to the electromagnet is adjusted in accordance with the storage state of the object to be stored in the container. Thereby, an appropriate value of current can be supplied to the electromagnet in accordance with the change in the weight of the container caused by the increase or decrease of the stored contents contained in the container. Further, the control unit is configured to start the supply of the ambient gas replacement start signal transmitted from the upstream control device, and the current from the power supply unit is started to be supplied to the electromagnet, thereby shortening the nozzle body and the container. Time to prevent wear or deformation of the nozzle unit.

Further, by forming the electromagnet as an air-core coil and disposing the permanent magnet in the hollow portion of the air-core coil, the magnetic field generated in the hollow region of the air-core coil can be used as a thrust to move the permanent magnet in a predetermined direction. Further, the permanent magnet can be disposed in the nozzle body disposed in the hollow region of the air-core coil. Thereby, the space can be effectively utilized compared to the individual configuration of the air-core coil and the nozzle body.

Further, since the electromagnet and the permanent magnet are provided with a restricting member that restricts the lateral movement of the permanent magnet, the malfunction caused by the contact of the permanent magnet with the electromagnet can be prevented, wherein the restricting member is a non-magnetic member having a small frictional resistance. Composition. Further, since the permanent magnet is provided with the yoke, the magnetic field radiated from the permanent magnet can be concentrated, so that a larger thrust can be obtained. Further, in order to prevent the magnetic field generated by the electromagnet from adversely affecting other electrical components, the electromagnet may be housed in a casing made of a magnetic material.

Further, by providing a nozzle unit according to an embodiment of the present invention on a platform on which the container is placed, and a sensor for detecting the placed state of the container on the stage, the nozzle unit can detect that the container is placed. After the timing, energization of the current to the electromagnet is started. Further, the control unit can grasp the state in which the container is placed by analyzing the respective detection signals of the plurality of sensors, so that an appropriate amount of current can be immediately supplied to the electromagnet.

According to the present invention, the rinsing nozzle can be pressed against the rinsing bowl formed in the container with the most appropriate thrust in accordance with the storage state of the substrate inside the container. Further, since the driving portion for generating the thrust can be completely separated from the piping for the flushing gas, the clean flushing gas can be supplied to the internal space of the container.

1‧‧‧Processing device

2‧‧‧ wafer loader

3‧‧‧EFEM

4‧‧‧Transfer robot

5‧‧‧Fan filter unit

6‧‧‧Transport room

7‧‧‧Processing room

8‧‧‧fan

9,39‧‧‧Filter

10‧‧‧floor

11‧‧‧埠 opening

12‧‧‧FIMS door

13‧‧‧FOUP (container)

13a‧‧‧FOUP ontology

13b‧‧‧ cover

14‧‧‧ platform

15‧‧‧Clock hook

16‧‧‧ positioning slot

17,17a, 17b, 17c‧‧‧Detector

18,19,18',18"‧‧‧ nozzle unit

18a‧‧‧Injection nozzle unit

18b‧‧‧Discharge nozzle unit

20‧‧‧Clock Department

21‧‧‧Injection 埠 (interface for environmental gas replacement)

21a‧‧‧Injection

21b, 22b‧‧‧ check valve

22‧‧‧Exhaustion 埠 (interface for environmental gas replacement)

22a‧‧‧Export

23,23',23",48‧‧‧ nozzle body

24,24',49,59,60‧‧‧electromagnet

25,25',25",50‧‧‧Nozzle Drive Department

26‧‧‧Power Supply Department

27,27', 51‧‧‧ flow path

28,28'‧‧‧Cylinder components

28a‧‧‧lower components

28b‧‧‧Upper components

29‧‧‧Abutment components

30, 30', 52, 58‧‧‧ permanent magnets

31,31',31",53‧‧‧shell

32,32',32"‧‧‧ bottom plate

33,61‧‧‧Upper board

34‧‧‧Connectors

35‧‧‧Supply source

36‧‧‧Gas supply piping

37‧‧‧Control Department

38‧‧‧Opening and closing valve

40‧‧‧ platform drive mechanism

40a‧‧‧Motor

40b‧‧‧feed screw

41‧‧‧Locating pin

41a, 41b, 41c‧‧‧Detector (detection signal)

42‧‧‧ Positioning Sensor

43‧‧‧Sensor Installation Department

44,44', 55‧‧‧Restricted components

45‧‧‧ spacers

46‧‧‧ iron core

47‧‧‧Shielded enclosure

54‧‧‧Connected components

56‧‧‧Cylindrical members

57‧‧‧ bracket

62,63‧‧‧ yoke

64‧‧‧ screws

65‧‧‧Moving child

1 is a perspective view showing a processing apparatus 1 to which the present invention is applied.

FIG. 2 is a view showing a cross section of the processing apparatus 1.

Fig. 3 is a schematic view showing the FOUP 13 which is a container which can be sealed.

Fig. 4 is a cross-sectional view showing the outline of a wafer loading machine 2 according to an embodiment of the present invention.

Fig. 5 is a plan view showing the stage 14 provided in the wafer loader 2 of the present invention.

Fig. 6 is a cross-sectional view showing a nozzle unit 18 according to an embodiment of the present invention.

Fig. 7 is a view showing a cross section taken along line A-A of the nozzle unit 18 shown in Fig. 6.

FIG. 8 is a view showing a mounting posture of the FOUP 13 placed on the stage 14.

Fig. 9 is a cross-sectional view showing a nozzle unit 19 according to an embodiment of the present invention.

Fig. 10 is a view showing a nozzle unit 18' according to an embodiment of the present invention.

Fig. 11 is a view showing a B-B section of the nozzle unit 18' shown in Fig. 10.

Fig. 12 is a view showing a nozzle unit 18" according to an embodiment of the present invention.

Fig. 13 is a schematic view showing the action of the nozzle unit 18" according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail. 1 is a perspective view showing the processing apparatus 1, and FIG. 2 is a cross-sectional view thereof. The processing apparatus 1 is installed in a factory called a clean room in which the ambient gas is cleanly managed. The processing device 1 mainly includes a wafer loader 2 and a transfer robot 4, and is an EFEM 3 that transfers a wafer W in a clean ambient gas, a processing chamber 7 that performs a predetermined process on the surface of the wafer W, and an EFEM. 3 is constituted by a transfer chamber 6 that transfers the wafer W to and from the processing chamber 7. The EFEM 3 is provided with a frame, a wall and a fan filter unit 5, which is fixed to the frame and is isolated from external ambient gas. The fan filter unit is used as a high clean air introduction means. After the air from the outside is purified as highly clean air, it is introduced into the internal space of the EFEM 3 as a downflow. The fan filter unit 5 is disposed on the ceiling of the EFEM 3, and is composed of a fan 8 that conveys air toward the inside of the EFEM 3, and a filter 9 that removes pollutants such as dust or organic substances present in the air to be transported. . In addition, the floor 10 of EFEM 3 uses air permeable components having a defined discharge efficiency.

With these configurations, the clean air supplied to the inside by the fan filter unit 5 constantly flows downward into the internal space of the EFEM 3 and is discharged from the floor 10 toward the outside of the apparatus to maintain the environment in the EFEM 3 in a high clean environment. . The transport robot 4 is a type of wafer W that transports a thin plate-shaped substrate between the container 13 called the FOUP and the processing chamber 7, and the movable arm portion of the robot 4 is protected by a magnetic fluid seal or the like. The dust seal structure has a lot of work to prevent the wafer W from being adversely affected by dusting. Thereby, the wafer W can be transported by the transfer robot 4 in a highly clean atmosphere in a state where dust does not adhere to the surface. Further, the internal air pressure in the transport region of the wafer W of the EFEM 3 is maintained at a pressure "positive pressure" higher than that outside the EFEM 3, and is typically maintained at a differential pressure of about 1.5 Pa. In this way, by preventing the intrusion of pollutants or dust from the outside, the cleanliness inside the EFEM 3 can maintain a fine dust of 0.5 μm and a high cleanliness of a level of 1 or higher. Further, the EFEM 3 includes a control device (not shown) that transmits information to and from the wafer loader 2 and the transfer robot 4 in accordance with a program stored in advance, to the wafer loader 2 and the transfer robot. 4 instructions for transmitting actions.

Next, a wafer loader 2 according to an embodiment of the present invention will be described with reference to Figs. 1 and 4 . Fig. 4 is a cross-sectional view showing the outline of a wafer loading machine 2 according to an embodiment of the present invention. The wafer loader 2 is provided with a platform 14 that mounts the FOUP 13 in a form of one of the airtight containers in a predetermined position, and a platform driving mechanism 40 that supports the platform 14 in the vertical direction and advances and retracts the platform 14 The opening portion 11 is configured to allow the transport robot 4 to carry out the loading and/or loading of the wafer W in the FOUP 13; the FIMS door 12 is capable of blocking the opening of the opening portion 11 and opening the opening The position of the portion 11 moves between and is integrated with the lid body 13b for sealing the inside of the FOUP 13, and an FIMS door lifting mechanism (not shown) that moves the FIMS door 12 up and down.

The door opening and closing operation of the FIMS door 12 is performed by providing an opening and closing means or by the platform driving mechanism 40, wherein the opening and closing means separates the FIMS door 12 integrated with the cover 13b with respect to the FOUP 13. In the reciprocating motion, the platform driving mechanism 40 reciprocates between the platform 14 on which the FOUP 13 is placed and the position separated from the FIMS door 12 integrated with the lid 13b. In the latter case, the platform drive mechanism 40 also functions as an opening and closing means. Furthermore, these institutions are FIMS (Front-opening Interface Mechanical Standard) systems specified by the SEMI specification (Semiconductor Equipment and Materials International Standards). correspond.

The stage drive mechanism 40 included in the wafer loading machine 2 of the present embodiment includes a motor 40a as a drive source and a feed screw 40b, and is configured to transmit the rotation of the motor 40a to the feed screw 40b so as to be fixed. The platform 14 of the feed screw 40b is moved to an arbitrary position. Further, instead of the motor 40a and the feed screw 40b, a cylinder using fluid pressure such as air pressure or oil pressure may be used.

The platform 14 properly positions the FOUP 13 at a predetermined location and supports the vertical load of the FOUP 13. On the upper surface of the platform 14, three cylindrical positioning pins 41 called movable pins are placed in a plan view in the form of an isosceles triangle. The positioning pin 41 has a substantially hemispherical shape at the top, and is engaged with the positioning groove 16 having a V-shaped cross section formed at a position corresponding to the positioning pin 41 at the bottom of the FOUP 13 by the top of the positioning pin 41. The FOUP 13 can be directed toward a predetermined position on the platform 14. Further, in the wafer loader 2 of the present embodiment, at least three detection sensors 17 are disposed so as to protrude from the surface of the stage 14 in the vicinity of each of the positioning pins 41, and the detection sensor 17 is provided. A normal position for detecting whether the FOUP 13 is placed on the platform 14. All of the detection sensors 17 are configured to adjust the position in the vertical direction so that the FOUP 13 is normally placed, for example, in the case where the FOUP 13 is placed obliquely, the detection sensors 17 Either one does not detect FOUP 13. The detection sensor 17 is electrically connected to the control unit 37 included in the wafer loader 2, and the control unit 37 is configured to recognize whether or not the FOUP 13 is normally placed based on a signal transmitted from each detection sensor 17. On the platform 14.

If the FOUP 13 is normally placed on the platform 14, the FOUP 13 is locked by the locking hook 15. The locking hook 15 is provided with a pneumatic cylinder (not shown) as a driving source, and the pneumatic cylinder is actuated by supplying compressed air to the pneumatic cylinder, and the locking hook 15 locks the FOUP 13 and the platform 14. Further, the release of the FOUP 13 is released by releasing the supplied compressed air. The supply and release of the compressed air to the pneumatic cylinder are switched by a solenoid valve (not shown) provided in the wafer loader 2. The solenoid valve is provided in the middle of the pipe connecting the supply source of the compressed air and the pneumatic cylinder, and is controlled by the signal transmitted from the control unit 37.

In addition to the above configuration, the wafer loader 2 is provided with a positioning sensor 42 that is used to mount the wafer W on each of the scaffolds formed inside the FOUP 13. Test. In FIG. 4, the positioning sensor 42 uses a transmissive type sensor having an optical axis parallel to the surface on which the wafer W is placed, and is mounted to be spaced apart around the circumference of the horizontal surface of the wafer W. The sensor mounting portion 43 is formed in a substantially U-shaped space. Further, both ends of the sensor mounting portion 43 are attached to a sensor driving mechanism (not shown). The drive source motor or the rotary actuator as the sensor drive mechanism is operated by these drive sources, and the sensor mounting portion 43 is rotated about the axis of the drive source so that it can be mounted on the upper portion. The position sensor 42 is moved in and out with respect to the inside of the FOUP body 13a.

The sensor drive mechanism is fixed to the bracket and can be moved up and down in conjunction with the operation of the FIMS door lift mechanism (not shown), thereby detecting the presence or absence of the wafer W of all the scaffolds in the container 13. Or placement status. Further, the output signal to each drive mechanism or the input signal of the sensor or the like is controlled by the control unit 37.

Next, the FOUP 13 which is a container for accommodating the wafer W will be described. Referring to Fig. 3(a), the FOUP 13 is a closable container composed of a FOUP main body 13a and a lid body 13b. The FOUP main body 13a is used for placing a slab formed at intervals in the vertical direction and accommodating the crystal. In the circle W, the cover 13b can be integrated with the FIMS door 12 by a latch mechanism, and the inside of the FOUP 13 can be hermetically sealed by being engaged with the FOUP body 13a.

Fig. 3(b) is a view showing the bottom of the FOUP 13. A positioning groove 16 is formed at the bottom of the FOUP 13 to engage with the positioning pin 41 and to define the relative position of the FOUP 13 relative to the platform 14. Further, an engaging portion 20 is formed, and the engaging portion 20 is fixed to the platform 14 by being locked to the locking hook 15. Further, the injection port 21 and the discharge port 22 for injecting the flushing gas supplied when the ambient gas is replaced into the inside of the FOUP 13 are disposed at a predetermined position at the bottom of the FOUP 13, and the discharge port is used for the discharge. The 22 system is for discharging the gas remaining in the FOUP 13 toward the outside of the FOUP 13.

The injection port 21 and the discharge port 22 are formed with an injection port 21a and a discharge port 22a that communicate with the internal environment of the FOUP 13 and the outside, and a check valve 21b that restricts the flow of the gas is provided in the injection port 21a and the discharge port 22a. , 22b. The check valve 21b provided in the injection port 21 allows the flushing gas injected at a pressure equal to or higher than a predetermined pressure to flow into the inside of the FOUP 13, but the flushing gas injected at a pressure equal to or lower than a predetermined pressure or the reverse flow is not allowed. The valve through which the gas flows. Further, the injection port 21 is provided with a filter 21c for collecting dust generated in the check valve 21b or dust contained in the supplied gas to prevent intrusion into the inside of the FOUP 13. The check valve 22b provided in the discharge port 22 allows the flushing gas or the atmosphere discharged at a pressure equal to or higher than a predetermined pressure to flow out of the outside of the FOUP 13, but does not allow gas discharged at a pressure equal to or lower than a predetermined pressure or reverse flow. The valve for gas circulation. By providing the check valves 21b, 22b, the flushing gas supplied to the inside of the FOUP 13 does not leak outside the FOUP 13, and the external normal air does not penetrate into the inside of the FOUP 13, thereby maintaining the inside of the FOUP 13. Low oxygen environment. Further, a filter 22c for preventing dust generated from the check valve 22b from infiltrating into the inside of the FOUP 13 may be provided in the discharge port 22.

Fig. 5 is a plan view of the stage 14 provided in the wafer loading machine 2 of the embodiment as seen from above. Positioning pins 41 (41a, 41b, 41c), detection sensors 17 (17a, 17b, 17c), and locking hooks 15 are disposed on the platform 14 at positions corresponding to the bottom surface of the FOUP 13. Further, in the stage 14 provided in the wafer loading machine 2 of the present embodiment, the nozzle unit 18 of the present invention is disposed, and the nozzle unit 18 is replaced by a predetermined gas via the injection crucible 21 and the discharge crucible 22. The internal ambient gas of FOUP 13.

In the wafer loader 2 of the present embodiment, a pair of nozzle units 18 are disposed on the side separated from the FIMS door 12 at the rear of the platform 14, and on the side opposite to the platform 14 and the FIMS door 12, respectively. The nozzle unit 18 is composed of an injection nozzle unit 18a for injecting a predetermined gas into the inside of the FOUP 13 via the injection nozzle 21, and a discharge nozzle unit 18a for use in the discharge nozzle unit 18b. The gas remaining inside the FOUP 13 is discharged through the discharge port 22 . In addition, each of the nozzle units 18 is disposed on the lower surface of the substrate on which the stage 14 is formed, and is disposed at a position corresponding to each of the environmental gas replacement ports 21 and 22, and the respective environmental gas replacement ports 21 and 22 are disposed and fixed. The bottom surface of the FOUP 13 at the regular position on the platform 14. In addition, the arrangement of the injection nozzle unit 18a and the discharge nozzle unit 18b can be appropriately changed in accordance with the arrangement of the injection cassette 21 and the discharge cassette 22 of the FOUP 13 to be used, and for example, it is used in four places. It is also possible that three of the nozzle units 18 are used as the injection nozzle unit 18a, and the remaining one portion is used as the discharge nozzle unit 18b. Also, only two of the four locations may be used. Here, the injection crucible 21 and the discharge crucible 22 are collectively referred to as an environmental gas replacement connection crucible.

Next, a nozzle unit 18 according to an embodiment of the present invention will be described. Fig. 6 is a schematic cross-sectional view showing the nozzle unit 18 of the embodiment, and Fig. 7 is a cross-sectional view taken along line A-A of Fig. 6. As shown in Fig. 6, the nozzle unit 18 of the present embodiment is provided with a nozzle body 23 in which a flow path through which a flushing gas flows, and an electromagnet 24 are provided, which are advanced and retracted with respect to the environmental gas replacement ports 21, 22. The nozzle drive unit 25 that drives the nozzle body 23 in the direction and the control unit 37 that regulates the current supplied from the power supply unit 26 of the processing device 1 to the electromagnet 24 are configured.

The nozzle body 23 included in the nozzle unit 18 of the present embodiment is composed of a tubular member 28, an annular member, that is, a contact member 29, and a permanent magnet 30, and the tubular member 28 is formed with a flow path through which a gas can flow. In addition, the abutting member 29 is disposed at the front end of the tubular member 28 and is in contact with the environmental gas replacement ports 21, 22, and the permanent magnet 30 is disposed outside the cylindrical member 28. On the edge. The tubular member 28 is composed of a lower member 28a and an upper member 28b. The lower member 28a is configured to have a stepped cross-sectional shape in which the outer diameter of the upper side region is smaller than the outer diameter of the lower side region, and the upper member 28b is in a state where the permanent magnet 30 is fitted into the cylindrical portion of the small outer diameter. Engage. Further, a joint 34 is attached to the bottom of the lower member 28a, and the joint 34 is connected to one end of the gas supply pipe 36 connected to the supply source 35 of the flushing gas. Further, in the middle of the gas supply pipe 36, an adjustment valve (not shown), an opening/closing valve 38 for adjusting the flow rate of the flushing gas, and a filter 39 for controlling the flow rate of the flushing valve 38 are provided. The supply and shutdown of the flushing gas are commanded, and the filter 39 is used to remove minute dust contained in the flushing gas. Further, in order to remove dust generated by the operation of the regulating valve or the opening and closing valve 38, it is preferable that the filter 39 is disposed in the respective elements of the path of the gas supply pipe 36, which is closest to the nozzle body 23. The location. In addition, the material of the gas supply pipe 36 is made of a metal such as stainless steel or a fluororesin, and the gas supply pipe 36 included in the wafer loading machine 2 of the present embodiment is made of fluororesin. Piping.

The permanent magnet 30 is configured to have a cylindrical shape having an outer diameter dimension equal to the outer diameter of the tubular member 28, and is fitted and disposed on the lower member 28a. In the nozzle body 23 of the present embodiment, a neodymium magnet having a strong magnetic force is used as the permanent magnet 30, and the magnetization direction is magnetized so as to be in the upward and downward directions. Further, it is preferable that the tubular member 28 is formed of a soft magnetic material, and the tubular member 28 of the present embodiment is formed of iron. The abutting member 29 is a member that abuts against the environmental gas replacement ports 21, 22, and is an annular member in which a flow port of the flushing gas is formed in the center portion. In the contact member 29 of the present embodiment, PFA (polytetrafluoroethylene) having excellent mechanical strength, low frictional resistance, and little dust generation is used, but may be appropriately changed to another member. Further, in order to improve the airtightness of the ports 21, 22 for environmental gas replacement, a sealing member such as an O-ring or a gasket may be provided on the abutting surface of the abutting member 29.

The nozzle driving unit 25 of the present embodiment is composed of an electromagnet 24, a casing 31 accommodating the electromagnet 24, a bottom plate 32 disposed on the lower surface of the casing 31, and an upper plate 33 disposed on the upper surface of the casing 31. The iron 24 is connected to the power supply unit 26 and generates a magnetic field as a thrust for moving the permanent magnet 30 up and down. The electromagnet 24 used in the present embodiment is an air-core coil, and the hollow portion in the center has a size in which the nozzle body 23 can be accommodated. Further, the electromagnet 24 is disposed so as to be wound around the bobbin so as to completely cover the movable range in which the permanent magnet 30 moves in the up-down direction.

The electromagnet 24 and the nozzle body 23 disposed in the hollow region of the electromagnet 24 are housed in the cylindrical casing 31. The casing 31 is formed of a magnetic material and has a function as a yoke for effectively concentrating the magnetism generated by the electromagnet 24. Further, a bottom plate 32 is attached to the lower portion of the casing 31, and an upper plate 33 is attached to the upper portion. A circular hole is formed in a central portion of the bottom plate 32, and the hole is inserted through the joint 34 and the pipe 36. A circular hole is formed in a central portion of the upper plate 33, and the nozzle body 23 moves forward and backward with respect to the environmental gas replacement ports 21, 22 through the hole. Further, the diameter of the hole of the bottom plate 32 is formed to be smaller than the diameter of the nozzle body 23, and has a function as a stopper for restricting the movement range of the nozzle body 23. Further, it is preferable that the bottom plate 32 and the upper plate 33 are formed of a member having magnetic properties, whereby the magnetic force generated by the electromagnet 24 can be prevented from being effectively concentrated.

A cylindrical restricting member 44 is disposed between the nozzle body 23 and the hollow electromagnet 24 disposed so as to surround the periphery of the nozzle body 23. The restricting member 44 restricts the positional deviation of the nozzle body 23 in the forward and backward movement in the horizontal direction, and prevents the side surface of the nozzle body 23 from coming into contact with the inner wall surface of the electromagnet 24. Since the restricting member 44 is a member that comes into contact with the nozzle body 23 that moves forward and backward, it is preferably formed with a low friction body. Further, the restricting member 44 of the nozzle driving unit 25 of the present embodiment is made of PFA (polytetrafluoroethylene). Further, referring to Fig. 7, the nozzle body 23, the electromagnet 24, and the regulating member 44 of the present embodiment each have a substantially cylindrical shape, and are disposed coaxially with the common central axis C as a center.

The switching of the flow direction of the direct current supplied from the power supply unit 26 to the nozzle drive unit 25 and the adjustment of the supply current are performed by the control unit 37. The control unit 37 is mounted on the wafer loader 2 of the present embodiment, and receives signals transmitted from various sensors or upstream control devices disposed in the wafer loader 2, and directs signals to the respective power sources or upstream. The control device transmits. The control unit 37 includes a memory device that memorizes the operation program or the teaching material that is taught in advance, and an arithmetic device that processes the received signal or data on the operation program. Thereby, the operation of each drive unit can be controlled according to the received signal and following a pre-programmed program.

According to the above configuration, the direct current adjusted by the control unit 37 is energized to the electromagnet 24, and a magnetic field parallel to the central axis C is generated in the hollow portion of the electromagnet 24. This magnetic field constitutes a thrust force for moving the permanent magnet 30 provided in the nozzle body 23 forward and backward in a direction parallel to the center axis C in the vertical direction of the drawing. Further, by making the flow of the energized direct current reverse, the magnetic field of the electromagnet 24 can be directed in the opposite direction, so that the nozzle body 23 can be moved in the reverse direction. Further, the control unit 37 adjusts the value of the direct current supplied from the power supply unit 26 to adjust the thrust applied to the nozzle body 23.

Further, the nozzle unit 18 of the present embodiment may be provided with an energizing member that imparts potential energy to the direction in which the nozzle body 23 advances with respect to the FOUP 13. Thereby, the direct current which energizes the electromagnet 24 when the nozzle body 23 advances toward the FOUP 13 can be reduced. Further, it is preferable that the energizing member is a spring member of a coil spring or a leaf spring.

Next, the operation of the nozzle unit 18 of the present invention and the wafer loader 2 including the nozzle unit 18 will be described in detail. The FOUP 13 is placed on the platform 14 of the wafer loader 2 by an OHT (Overhead Hist Transfer) placed in the factory or manually. At this time, referring to FIG. 6(a), in order to prevent the upper surface from coming into contact with the FOUP 13, the nozzle body 23 of the nozzle unit 18 is positioned below the HDP (Horizontal Datum Plane) of the FOUP 13 which is defined by the SEMI standard, and Standby at a standby position that is not in contact with the environmental gas replacement ports 21, 22 disposed on the bottom surface of the FOUP 13. When the FOUP 13 is placed on the platform 14, the FOUP 13 is positioned to be placed at a predetermined position on the platform 14 by the action of the positioning pin 41 and the positioning groove 16 of the FOUP 13. At this time, the control unit 37 detects that the FOUP 13 is normally placed on a predetermined position on the stage 14 based on the detection signal transmitted from the detection sensor 17.

Next, the control unit 37 that receives the completion signal of the FOUP 13 from the control device that controls the operation of the OHT, activates the drive source of the lock hook 15, and fixes the FOUP 13 to the stage 14. The locking hook 15 is provided with a sensor (not shown) for detecting the operation of the driving source. When the locking hook 15 is normally operated, the control unit 37 transmits a signal indicating that the locking operation is completed. Furthermore, when the operator manually places the FOUP 13 on the platform 14, the operator presses the start switch provided in the wafer loader 2. The signal of the start switch is equivalent to the signal from the control device, and the control unit 37 that has received the signal starts the locking operation of the hook 15. Further, as long as the FOUP 13 is in a state of being normally placed on the stage 14, the control portion 37 can transmit a flushing start signal to the nozzle unit 18 at a predetermined timing. Preferably, the timing at which the control unit 37 transmits the flushing start signal is performed in accordance with a pre-memorized control program or by the control unit 37 receiving the flushing start signal transmitted from the upstream control device.

Next, the control unit 37 operates the drive mechanisms of the wafer loader 2 to separate the FOUP main body 13a from the cover 13b, and grasps the wafer W accommodated in the FOUP main body 13a by the positioning sensor 42. Set the positioning action of the state. By performing this positioning operation, the control unit 37 receives the detection signal of the positioning sensor 42. By comparing the received positioning detection signal with the data stored in the memory device, the control unit 37 can acquire the placement information of the wafer W on each scaffold of the FOUP body 13a. Then, the control unit 37 adjusts the current value for energizing the electromagnet 24 based on the placement information of the wafer W.

After the opening operation of the FOUP 13 by the wafer loader 2 is completed, the wafer W accommodated in the FOUP 13 is transferred to the processing apparatus 1 and after the predetermined processing is completed, the processing apparatus 1 is directed to the FOUP 13 Transfer. At this time, the wafer W does not have to be returned to the original FOUP 13, and may be transferred to the FOUP 13 different from the contained FOUP 13 according to the subsequent processing steps or the completion degree of the surface treatment performed on the wafer W. FOUP 13. In this case, since the control unit 37 included in each wafer loading machine 2 receives the transfer information of the wafer W from the control device of the EFEM 3, it is possible to grasp that the self-processing device 1 is transported to the FOUP 13 The number of wafers W and the placement information in the FOUP 13 such as which scaffolding the transfer robot 4 places on the scaffold. The control unit 37 adjusts the current value for energizing the electromagnet of the nozzle unit 18 at any time based on the instantaneous placement information.

In the series of steps described above, the control unit 37 causes the nozzle unit 18 to follow the pre-programmed program and to operate the nozzle unit 18 at a predetermined timing to perform the flushing operation or to receive the flushing start signal from the upstream control device. Start the flushing action. Further, the timing at which the nozzle unit 18 of the present invention starts the flushing operation is not particularly limited. The flushing action can also be initiated before the FOUP 13 is secured to the platform 14 by the latching hooks 15 as needed. In this case, the control unit 37 can also grasp the total weight of the FOUP 13, so that the nozzle body 23 can be pushed up with an optimum thrust. Further, it is preferable that the nozzle body 23 stands by at the standby position until the flushing starts. This is because when the nozzle body 23 is brought into contact with the bottom surface of the FOUP 13 at the time when the FOUP 13 is placed, the abutment member 29 of the nozzle unit 18 is caused by the microvibration generated by the operation of the subsequent drive mechanisms. Friction with the bottom surface of the FOUP 13 creates a slight gap so that sufficient airtightness cannot be maintained.

Next, the rinsing procedure of the nozzle unit 18 according to an embodiment of the present invention will be described. The control unit 37 that has received the flush start signal from the control device first activates the electronic circuit provided by itself, and energizes the nozzle drive unit 25 with a predetermined DC current. Thereby, a magnetic field that moves the nozzle unit 18 toward the environmental gas replacement ports 21, 22 of the FOUP 13 is generated in the hollow portion of the electromagnet 24. Thereby, the contact member 29 of the nozzle body 23 abuts against the environmental gas replacement ports 21, 22.

When the nozzle body 23 abuts against the environmental gas replacement ports 21 and 22, the control unit 37 activates the opening and closing valve 38, and supplies the flushing gas stored in the supply source 35 to the inside of the FOUP 13 via the injection nozzle unit 18a. Further, as the flushing gas, an inert gas such as nitrogen or argon or CDA (Clean Dry Air) which is dehumidified clean air is preferably used. Further, the supply amount of the flushing gas can be adjusted by a flow regulating valve (not shown) provided on the pipe 36. Preferably, the supply amount of the flushing gas is set so as not to leak the flow rate of the flushing gas between the contact faces of the abutting members 29 and the respective environmental gas replacement ports 21, 22.

In order to increase the flow rate of the flushing gas as much as possible, it is necessary to grasp the thrust of pressing the nozzle body 23 against the environmental gas replacement ports 21, 22. Further, in order to apply an appropriate thrust to the nozzle body 23, it is necessary to grasp the number of wafers W accommodated inside the FOUP 13 in advance. This is because if a strong thrust is applied to the nozzle body 23 without grasping the weight of the FOUP 13, the FOUP 13 may be tilted due to the upward movement of the nozzle body 23, and the failure may cause the entire apparatus to be temporarily stopped. The control unit 37 constituting the nozzle unit 18 of the present invention can timely grasp the number of wafers W accommodated inside the FOUP 13 based on signals from the upstream control device and the positioning sensor. Further, the control unit 37 can adjust the intensity of the magnetic field which is the thrust of the nozzle unit 18 by adjusting the current value supplied to the electromagnet 24. Thereby, the control unit 37 can apply an appropriate thrust according to the weight of the FOUP 13 to the nozzle body 23. Further, the flow rate adjusting valve (not shown) that adjusts the flow rate of the flushing gas according to the signal from the control unit 37 is configured, and the nozzle driving unit 25 can drive the change in the thrust of the nozzle body 23 to be appropriate. The amount of gas is supplied to the inside of the FOUP 13.

The end sequence of the flushing operation is started by the upstream control device transmitting the flushing stop signal to the control unit 37. The control unit 37 that has received the flushing stop signal operates the opening and closing valve 38 to stop the supply of the flushing gas from the supply source 35. Next, the control unit 37 activates the electric circuit provided in itself, and turns off the current supplied to the electromagnet 24. Then, a current that flows in the opposite direction to the current supplied so far is supplied to the electromagnet 24. Thereby, a magnetic field in a direction in which the nozzle body 23 is separated from the FOUP 13 is generated in the hollow portion of the electromagnet 24, and the nozzle body 23 is moved back to the standby position by the magnetic field. Since the nozzle body 23 temporarily retracted to the standby position remains in the state of being in the standby position, the control unit 37 stops the supply of the current to the electromagnet 24. With the above description, the flushing end operation is completed.

In addition, the direction of the current supplied to the electromagnet 24 provided in the nozzle unit 18 of the present invention, the direction of the magnetic pole of the permanent magnet 30 included in the nozzle body 23, and the winding direction of the electromagnet 24 can be appropriately adjusted. Further, the number of windings of the wire wound around the bobbin is determined based on the estimated thrust of the electromagnet 24 that presses the nozzle body 23 against each of the turns 21, 22. Further, the magnitude of the thrust of pressing the nozzle body 23 to each of the weirs 21, 22 is appropriately set depending on the weight of the FOUP 13 itself or the number of wafers W accommodated in the inside of the FOUP 13.

Next, a method in which the control unit 37 cannot acquire the conveyance information of the wafer W from the upstream control device or the positioning information from the positioning sensor 42 and supply an appropriate current to the nozzle drive unit 25 will be described with reference to FIG. This method is a method that is not effective on the wafer loader 2 that is connected to the EFEM 3, but is, for example, an environmental gas replacement device that is provided separately from the cover 13b of the FOUP 13. Fig. 8(a) is a schematic view showing a state in which the FOUP 13 is normally placed on the stage 14. The detection sensors 17a, 17b, 17c disposed on the stage 14 are pressed by the bottom surface of the FOUP 13, and the control unit 37 detects the detection of the on-signal. Here, the control unit 37 supplies a predetermined current to the nozzle driving unit 25 to cause the nozzle body 23 to move upward. At this time, when the current value supplied to the nozzle driving unit 25 is weaker than the force of the top FOUP 13, the detecting sensor 17c is maintained in a state of being pressed by the bottom surface of the FOUP 13, and the detecting sensor is detected. The 17c continues to transmit the conduction signal to the control unit 37.

Therefore, the control unit 37 supplies a larger current source to the nozzle driving unit 25. Here, referring to Fig. 8(b), when the FOUP 13 is pushed up by the nozzle body 23, the FOUP 13 is inclined toward the side where the lid body 13b is disposed with the front end portions of the positioning pins 41a, 41b as fulcrums. At this time, the bottom of the FOUP 13 is in a state of being separated from the detection sensor 17c disposed in the vicinity of the positioning pin 41c of the FOUP 13 at the rear. The control unit 37 receives the ON signal of the detection sensors 41a, 41b and receives the OFF signal of the detection sensor 41c, and recognizes that the FOUP 13 has floated. Here, the control unit 37 determines the current value supplied immediately before the FOUP 13 is floated to be an appropriate current value that can be supplied to the nozzle driving unit 25. Then, referring to FIG. 8(c), the appropriate current is supplied to the nozzle driving unit 25 again, and the nozzle body 23 is brought into contact with the environmental gas replacement ports 21 and 22, and then the flushing gas is supplied to the inside of the FOUP 13. . The above-described operation is made possible by preliminarily storing the current value supplied to the electromagnet 24 based on the detection state of the detection signals 41a and 41b in the control unit 37.

In the nozzle unit 18 according to the first embodiment of the present invention, the nozzle body 23 is disposed in an inner region formed in a central portion of the electromagnet 24, and the electromagnet 24 is caused to flow in a forward or reverse current. The internal space of the electromagnet 24 generates a predetermined magnetic field, and the nozzle body 23 moves forward and backward together with the permanent magnet 30 of the nozzle body 23 by the thrust of the magnetic field. Next, an embodiment in which the electromagnet 49 is provided below the nozzle body 48 and the repulsive force and the adsorption force generated between the permanent magnet 52 and the electromagnet 49 are used will be described. In the second embodiment of the present invention, the permanent magnet 52 is fixed to the lower portion of the nozzle body 48, and the electromagnet 49 is disposed below the permanent magnet 52. The electromagnet 49 is a core electromagnet in which the core 46 is disposed at the center, and is configured to supply a forward or reverse current to the electromagnet 49, and to switch the magnetic pole of the core 46 to move the nozzle body 48 forward and backward. In the present embodiment, by providing the configuration in which the electromagnet 49 is not disposed on the outer surface of the nozzle body 48 but below, the lateral dimension of the nozzle unit 19 can be reduced, and the limited use of the platform 14 can be utilized effectively. area.

Fig. 9 is a cross-sectional view showing the nozzle unit 19 of the embodiment, and the same members as those of the first embodiment are denoted by the same reference numerals. The nozzle body 48 provided in the nozzle unit 19 is formed into a columnar member, and a flow path 51 through which a flushing gas flows is formed in a central portion. The flow path 51 is formed to be laid downward toward the lower side in the vicinity of the center of the nozzle body 48. However, the flow path 51 does not penetrate the nozzle body 48 in the vertical direction, but is formed to be displaced toward the side wall in the middle. A joint 34 is attached to the base end of the flow path 51, and the joint 34 is connected to one end of the gas supply pipe 36 connected to the supply source 35 of the flushing gas. The configuration of the supply source 35 from the joint 34 to the flushing gas is the same as that of the first embodiment, and thus the description thereof will be omitted.

The nozzle body 48 has a disk-shaped permanent magnet 52 fixed to the bottom surface thereof, and is detachably disposed in a substantially cylindrical casing 53 fixed to the stage 14. Preferably, the casing 53 is made of a non-magnetic material and has a small frictional resistance. Below the nozzle body 48, an electromagnet 49 wound around the core 46 via a bobbin is fixed to the casing 53. Further, the periphery of the electromagnet 49 and the core 46 is surrounded by the shield case 47. The shield case 47 is a box-shaped member made of an iron-nickel alloy, and is provided in order to prevent the magnetic field noise generated by the electromagnet 49 from adversely affecting the electronic component. Further, the shield case 47 may be made of a metal such as iron having a high magnetic permeability, in addition to an alloy made of iron or nickel. Further, similarly to the first embodiment, the electromagnet 49 is connected to the power supply unit 26 via the control unit 37.

According to the above configuration, the magnetic pole of the surface of the core 46 facing the permanent magnet 52 and the magnetic pole of the surface of the permanent magnet 52 opposed to the core 46 are of the same polarity, and a predetermined direct current is supplied to the electromagnet 49. The magnetic field between the core 46 and the permanent magnet 52 is made to repel. This repulsive force is a thrust force that moves the permanent magnet 52 provided in the nozzle body 48 in the upward direction of the drawing. Further, the flow direction of the direct current supplied from the power supply unit 26 to the electromagnet 49 is reversed, and the electromagnet 49 and the core 46 are magnetically attracted to each other, so that the magnetic attraction force causes the nozzle body 48 to face downward. The thrust of the move. Further, similarly to the first embodiment, the energizing member can be provided in the nozzle body 48 of the nozzle unit 19 of the present embodiment, and the energizing member imparts potential energy in a direction in which the FOUP 13 advances. Further, similarly to the first embodiment, the operation of switching the direct current flow supplied from the power supply unit 26 to the nozzle drive unit 50 or adjusting the supplied direct current value is performed by the control unit 37.

Next, in the first embodiment and the second embodiment, the permanent magnets 30 and 52 are provided in the nozzle bodies 23 and 48. However, the nozzle bodies 23 and 48 and the permanent magnet 30 may be disposed separately on the stage 14. 52.

Fig. 10 is a cross-sectional view of the nozzle unit 18' according to the third embodiment of the present invention as seen from the side, and Fig. 11 is a cross-sectional view taken along line B-B of Fig. 10. In the nozzle unit 18' of the present embodiment, the nozzle body 23' and the nozzle driving portion 25' are arranged and fixed in a horizontal direction at a predetermined position of the stage 14, and the movable portion of the nozzle driving portion 25' and the nozzle body 23' are The connecting member 54 is coupled. By the connecting member 54, the nozzle body 23' is configured to be movable forward and backward in conjunction with the forward and backward movement of the nozzle driving unit 25'. The nozzle body 23' is the same as the first embodiment, and is composed of a cylindrical member 28' which is a cylindrical member and a contact member 29 which is an annular member. The cylindrical member 28' is formed in the center portion. The flow path 27' and the abutting member 29 are disposed at the front end of the tubular member 28', and are in contact with the environmental gas replacement ports 21, 22 disposed on the FOUP 13. Further, a restriction member 55 that restricts the movement of the nozzle body 23' in the horizontal direction is disposed on the peripheral portion of the nozzle body 23', and the restriction member 55 is fixed to the stage 14. The restricting member 55 is a cylindrical member formed of a fluororesin having a small frictional resistance, and the inner diameter of the restricting member 55 has a size slightly larger than the outer diameter of the cylindrical tubular member 28', and the nozzle body 23' is The inner space of the restricting member 55 can be inserted up and down freely.

The nozzle driving unit 25' of the present embodiment is composed of an electromagnet 24', a casing 31' accommodating the electromagnet 24', and a bottom plate 32 disposed on the lower surface of the casing 31'. The electromagnet 24' is a The air-core coil has an inner diameter dimension that can accommodate the cylindrical permanent magnet 30' in the hollow region. The electromagnet 24' is wound around the bobbin at a position opposed to the permanent magnet 30'. The casing 31' is a cylindrical member that can accommodate the horizontally disposed electromagnets 24', and is formed of a magnetic member, and has a function of effectively concentrating the yoke by the magnetic force generated by the electromagnet 24'. A bottom plate 32' is mounted below the housing 31'. A circular hole is formed in a central portion of the bottom plate 32', and a cylindrical member 56 fixed to the cylindrical permanent magnet 30' is inserted into the hole.

Further, a cylindrical restricting member 44' is disposed between the cylindrical permanent magnet 30' and the hollow electromagnet 24' which is laminated so as to surround the periphery thereof. Similarly to the first embodiment, the restricting member 44' restricts the horizontal movement of the reciprocating permanent magnet 30' and prevents the side surface of the permanent magnet 30' from coming into contact with the inner wall of the electromagnet 24'. Since the restricting member 44' is a member that comes into contact with the nozzle body 23 that moves forward and backward, it is preferably formed in a low friction body. One end of the cylindrical member 56 is fixed to a space inside the permanent magnet 30'. The columnar member 56 is disposed so as to penetrate through a circular hole formed in the bottom plate 32', and one end of the coupling member 54 is fixed to the other end portion thereof. According to the above configuration, the predetermined direct current supplied from the power supply unit is supplied to the electromagnet 24' as the thrust force for moving the permanent magnet 30' in the upward and downward directions of the drawing. The movement of the permanent magnet 30' in the vertical direction is transmitted to the nozzle body 23' via the columnar member 56 and the coupling member 54, and the nozzle body 23' is connected to the atmosphere gas replacement port 21, 22 disposed at the bottom of the FOUP 13. While moving forward and backward, the FOUP 13 is placed on the platform 14. Further, the connecting member 54 of the present embodiment is fixed to the tubular member 28' and the cylindrical member 56 by screws.

The nozzle unit 18' of this embodiment separates the nozzle driving unit 25' and the nozzle body 23. Thereby, the size of the nozzle unit 18' in the height direction can be suppressed, and since it is not necessary to provide the permanent magnet 30' in the nozzle body 23, the configuration of the nozzle body 23 can be simplified to improve the maintenance property. .

Next, a fourth embodiment in which two forces of the adsorption force generated by the different magnetic poles of the nozzle driving portion and the repulsive force generated by the same magnetic pole are simultaneously used will be described. 12 is a cross-sectional view of the nozzle unit 18 according to the fourth embodiment of the present invention. The nozzle unit 18 of the present embodiment is arranged in parallel with each other at a predetermined position of the stage 14 in the same manner as in the third embodiment. The nozzle body 23" and the nozzle driving portion 25", and the movable portion of the nozzle driving portion 25" and the nozzle body 23" are coupled by the connecting member 54.

Further, the nozzle driving unit 25' of the third embodiment is configured to fix the upper portion of the casing 31' to the platform 14. However, in the fourth embodiment, the lower portion of the casing 31" is fixed to the lower portion. The bracket 57 is attached to the platform 14. Further, which of the upper or lower portions of the casings 31', 31" is fixed to the platform 14 can be appropriately changed according to the arrangement of the components inside the platform 14.

The nozzle body 23" of the present embodiment is the same as the third embodiment, and is composed of a cylindrical member, that is, a cylindrical member 28', and an annular member, that is, a contact member 29, which is attached to the tubular member 28'. A flow path 27' is formed in the center portion, and the contact member 29 is disposed at the front end of the tubular member 28' and is in contact with the environmental gas replacement ports 21, 22 disposed on the FOUP 13. Further, the nozzle body 23 is provided. The peripheral portion of the 'limit portion 55 that restricts the movement of the nozzle body 23' in the horizontal direction is fixed to the stage 14. The restricting member 55 is a cylindrical member formed of a fluororesin having a small frictional resistance, and the restricting member 55 The inner diameter is slightly larger than the outer diameter of the cylindrical tubular member 28', and the nozzle body 23' is slidably inserted into the inner space of the restricting member 55 at the point of the platform 14, also The configuration is the same as that of the third embodiment.

The nozzle driving unit 25 of the present embodiment is composed of two electromagnets 59 and 60, a casing 31' accommodating the two electromagnets 59 and 60, and a bottom plate 32" disposed on the lower surface of the casing 31'. The upper plate 61 on the upper surface of the casing 31' is configured such that the two electromagnets 59 and 60 are hollow coils and have an inner diameter which can accommodate the cylindrical permanent magnet 58 in the hollow region. The electromagnets 59, 60 of the present embodiment are wound around the winding shaft at a position opposed to the moving range of the permanent magnets 58. Further, the electromagnets 59, 60 are arranged at a predetermined interval in the vertical direction, and a resin spacer 45 is disposed between the two electromagnets 59, 60. Further, the casing 31' is similar to the third embodiment, and can accommodate a cylindrical member of the electromagnets 59, 60 arranged in a horizontal position, and is formed of a magnetic member to be electromagnetically The magnetic force generated by the irons 59, 60 effectively concentrates the function of the yoke.

A bottom plate 32" is attached to the lower portion of the casing 31', and an upper plate 61 is attached to the upper portion. The bottom plate 32" is a plate-like member, and the lower surface of the casing 31' is closed by the bottom plate 32. A circular hole is formed in a central portion of the plate 61, and a cylindrical member 56' fixed to the cylindrical permanent magnet 58 is inserted into the hole.

The permanent magnets 58 of the present embodiment are formed in a columnar shape, and are disposed in a hollow region of the hollow electromagnets 59, 60 which are disposed with a gap in the vertical direction. Further, the permanent magnet 58 is magnetized so that the direction of the magnetic field becomes the upper and lower directions in the drawing. Further, yokes 62, 63 are provided on the upper surface and the lower surface of the permanent magnet 58, and these yokes 62, 63 are used to concentrate the adsorption force of the magnetic poles of the permanent magnet 58. The yokes 62 and 63 of the present embodiment are disc-shaped members made of soft iron and have the same outer diameter as the permanent magnets 58. Further, the permanent magnet 58 and the yokes 62, 63 are disposed coaxially with the central axis C as a center. Further, a coaxial hole is formed in a central portion of the permanent magnet 58 and the yokes 62, 63, and the permanent magnet 58 and the yokes 62, 63 are fixed to the cylindrical member 56' by a screw 64 provided through the hole. . Thereby, the permanent magnet 58, the yokes 62, 63, and the columnar member 56' are integrally moved as the mover 65 by the magnetic field generated by the electromagnets 59, 60.

Between the movable element 65 and the hollow electromagnets 59, 60, as in the other embodiments, a cylindrical restricting member 44' formed by a low friction body is disposed, and the restricting member 44' restricts the level of the moving member 65. The movement of the direction prevents contact with the inner walls of the electromagnets 59, 60. With this configuration, the movable member 65 can be moved in the vertical direction by the magnetic force generated by the electromagnets 59, 60 in the space restricted by the regulating member 44'. Further, the nozzle body 23" coupled by the connecting member 54 can be moved up and down by the movement of the moving member 65 up and down.

Next, the movement of the permanent magnet 58 by the action of the electromagnets 59 and 60 provided in the present embodiment will be described. Fig. 13 is a schematic view showing the positional relationship between the electromagnets 59, 60 and the mover 65 of the nozzle drive unit 25 of the present embodiment. The nozzle drive unit 25 of the present embodiment moves the mover 65 in a predetermined direction. The control for generating a magnetic field by each of the electromagnets 59, 60 is performed. Fig. 13(a) is a view showing a state in which the mover 65 is lowered to the lowest standby position. In this figure, the mover 65 is connected. The nozzle body 23" also moves to the standby position that is most separated from the FOUP 13. In addition, the permanent magnet 58 of the movable element 65 of the present embodiment is magnetized so that the upper side thereof becomes the S pole and the lower side becomes the N pole, and the yoke 62 disposed on the upper side of the permanent magnet 58 becomes the S pole. The yoke 63 disposed on the lower side of the permanent magnet 58 becomes an N pole.

The control unit 37 is configured such that the current supplied from the power supply unit 26 is energized to the lower electromagnet 59 so that the upper side becomes the S pole and the lower side becomes the S pole. The current supplied from the power supply unit 26 is energized to the electromagnet 60 disposed above. When the current is applied to each of the electromagnets 59, 60, the magnet of the S pole is provided on the upper side of the electromagnet 59, so that the magnetic properties of the N pole of the lower side of the permanent magnet 58 and the yoke 63 become attracted to each other. Further, the magnetic field of the S pole is provided on the lower side of the electromagnet 60, so that the magnetic properties of the S pole of the upper side of the permanent magnet 58 and the yoke 62 become mutually exclusive. Thereby, the two forces of the attraction force generated by the lower electromagnet 59 and the repulsive force generated by the upper electromagnet 60 become the thrust, and the mover 65 moves downward as indicated by the arrow. Further, the moving member 65 that moves downward is stopped by the head of the screw 64 abutting against the bottom plate 32".

Next, the rising operation of the mover 65 will be described. Fig. 13 (b) shows a state in which the mover 65 is raised to the flush position. At this time, referring to FIG. 12(b), the nozzle body 23 connected to the movable member 65 is raised to a position in contact with the environmental gas replacement ports 21, 22 disposed in the FOUP 13, and the control unit 37 is or more. The current supplied from the power supply unit 26 is energized to the lower electromagnet 59 while the upper side is the N pole and the lower side is the S pole. The upper side is the S pole and the lower side is the N pole. The supplied current energizes the electromagnet 60 disposed above. When the current is applied to each of the electromagnets 59, 60, the magnetic field of the N pole is provided on the lower side of the electromagnet 60, so that the upper side of the permanent magnet 58 and the yoke The magnetism of the S pole having 62 becomes attractive to each other.

Further, the upper side of the electromagnet 59 also has magnetic properties of the N pole, and the magnetic properties of the N pole of the lower side of the permanent magnet 58 and the yoke 63 become mutually repulsive. Thereby, the two forces of the repulsive force generated by the lower electromagnet 59 and the attractive force generated by the upper electromagnet 60 become the thrust, and the mover 65 moves upward as indicated by the arrow. Further, the nozzle body 23" connected to the moving member 65 via the connecting member 54 is moved upward by the movement of the moving member 65. The moving member 65 and the nozzle body 23" which move downward are provided by the nozzle body" The abutting member 29 is stopped by the environmental gas replacement ports 21, 22 disposed on the bottom surface of the FOUP 13, and the control unit 37 activates the opening and closing valve 38 to supply the flushing gas from the supply source 35 to the inside of the FOUP 13. At this time, the control unit 37 continuously supplies current to the electromagnets 59 and 60, and the nozzle body 23 is in a state in which potential energy is applied to the environmental gas replacement ports 21 and 22. Further, even if the moving member 65 and the nozzle body 23 are moved upward in a state in which the FOUP 13 is not placed, the magnetic force of the S pole generated above the electromagnet 60 and the magnetic force of the S pole are above the permanent magnet 58. The repulsion does not cause the permanent magnet 58 to protrude above the position where the electromagnet 60 is disposed.

Incidentally, the FOUP 13 made of resin is retained in the interior due to dust or impurities used in the treatment step, and is periodically reused after washing with warm water. By repeatedly performing this warm water washing, the FOUP 13 is slowly deformed, and the position of the platform 14 with respect to the environmental gas replacement ports 21, 22 is also likely to be gradually inclined. When the ambient gas displacement ports 21, 22 are inclined, a gap is formed between the ambient gas replacement ports 21 and the abutting member 29, thereby causing a malfunction that the flushing gas may leak from the gap. Therefore, in each of the embodiments of the present invention, an energizing member may be provided, and the energizing member may apply a potential energy to a direction in which the nozzle bodies 23, 23', 23" advance with respect to the FOUP 13. By providing an energizing member, Even when the ambient gas replacement ports 21, 22 disposed in the FOUP 13 are slightly inclined with respect to the abutting member 29, the abutting member 29 and the ambient gas replacement ports 21, 22 can be airtightly abutted. Preferably, the energizing member is a spring member such as a coil spring or a leaf spring. If the energizing member is provided, it can be applied to any of the above embodiments.

Although the embodiment in which the nozzle unit of the present invention is mounted on the wafer loader 2 has been described above, the present invention is not limited to being mounted on the wafer loader 2. For example, it may be mounted on each FOUP mounting table that maintains an automatic stocker that is stored in a state in which the wafer W is stored in the FOUP 13, and may be attached to an opening/closing mechanism that does not have the FOUP 13. And a device called a flushing mechanism dedicated to the replacement of the ambient gas inside the FOUP 13. In the present embodiment, the FOUP 13 has been described as an object. However, the container is not limited to the FOUP 13 and includes the environmental gas replacement ports 21 and 22 on the bottom surface. For example, the container may be applied to the side or the top of the container. A container for crucibles that are replaced with ambient gases. The present invention can be applied to any container as long as it is used for replacing the internal environment gas of the storable storage container in which the object is stored.

Claims (13)

 A nozzle unit for replacing a container inside a container with a predetermined atmosphere by a connection port for environmental gas replacement provided in a sealable container, the nozzle unit comprising: a nozzle body formed to be flushed a flow path through which the gas passes; the nozzle drive unit includes an electromagnet, and the nozzle body moves forward and backward with respect to the environmental gas replacement port by a magnetic field generated by the electromagnet; and the permanent magnet is configured by the electromagnetic The magnetic field generated by the iron moves forward and backward; the power supply unit supplies electric power to the nozzle driving means; and the control unit adjusts a current value supplied from the power supply unit and supplies the electric current to the electromagnet.    The nozzle unit according to claim 1, wherein the control unit adjusts a current value supplied to the electromagnet according to a storage state of the stored object accommodated in the container.    The nozzle unit according to claim 1, wherein the ambient gas replacement port is disposed on a bottom surface of the container, and the nozzle driving unit moves the nozzle upward by a thrust corresponding to a current value supplied to the electromagnet, and It is pressed against the above-mentioned interface for environmental gas replacement.    The nozzle unit of claim 1, wherein the control unit starts supplying a current from the power supply unit to the electromagnet by receiving an ambient gas replacement start signal transmitted from an upstream control device.    The nozzle unit of claim 1, wherein the electromagnet-type air-core coil is disposed in a hollow region of the air-core coil.    The nozzle unit of claim 1, wherein the permanent magnet is disposed in the nozzle body.    A nozzle unit according to claim 1, wherein a restricting member is formed between the electromagnet and the permanent magnet, and the restricting member is formed of a non-magnetic member having a small frictional resistance to restrict lateral movement of the permanent magnet.    The nozzle unit of claim 1, wherein the permanent magnet is provided with a yoke.    The nozzle unit according to any one of claims 1 to 7, wherein the electromagnet is housed in a casing made of a magnetic material.    An environmental gas replacement device, comprising: the nozzle unit according to any one of claims 1 to 9; a platform on which the container is placed; and a sensor disposed on the platform to detect the placement of the container status.    The environmental gas replacement device according to claim 10, wherein the control unit adjusts a current value supplied to the electromagnet based on a detection signal of the sensor.    An environmental gas replacement method is an environmental gas replacement method in which the inside of the container is replaced with a predetermined ambient gas via a connection port for environmental gas replacement in a sealable container, and the method includes the following steps: a nozzle driving unit The nozzle body in which the flow path through which the flushing gas passes is formed is brought into contact with the container, the nozzle driving unit includes an electromagnet, and the nozzle body is moved forward and backward with respect to the environmental gas replacement port; and the container is supplied to the inside of the container The flushing gas is supplied to the permanent magnet by a magnetic field generated by the electromagnet provided in the nozzle driving unit.    The method of replacing the environmental gas according to claim 12, wherein the nozzle driving unit includes a control unit that adjusts a current value supplied from the power supply unit based on a storage state of the stored object accommodated in the container, and supplies the same The above electromagnet.