TW201908266A - Method for manufacturing packaging body having sealant layer attached thereto, and method for manufacturing airtight packaging - Google Patents
Method for manufacturing packaging body having sealant layer attached thereto, and method for manufacturing airtight packaging Download PDFInfo
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- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
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Abstract
本發明係一種附有密封材料層封裝基體之製造方法及氣密封裝之製造方法,其中,本發明之附有密封材料層封裝基體之製造方法係其特徵為具備:準備具有基部與設置於基部上之框體部的封裝基體的工程,和揉合密封材料與媒介物,製作樹脂量成為不足0.6質量%之密封材料糊劑的工程,和於封裝基體之框體部的頂部上,塗佈,乾燥密封材料糊劑,製作乾燥膜的工程,和經由照射雷射光於乾燥膜之時,使乾燥膜燒結而得到密封材料層的工程者。The present invention is a method for manufacturing a sealing substrate with a sealing material layer and a method for manufacturing a hermetically sealed package, wherein the method for manufacturing a sealing substrate with a sealing material layer of the present invention is characterized by having: preparing to have a base portion and providing the base portion The process of encapsulating the base of the upper frame part, and the process of kneading the sealing material and the medium to make a sealing material paste with a resin content of less than 0.6% by mass, and coating the top of the frame part of the encapsulating base , Drying the sealing material paste, the process of making a dry film, and the engineer who obtains the sealing material layer by sintering the dry film when irradiating laser light on the dry film.
Description
本發明係有關附有密封材料層封裝基體之製造方法及氣密封裝之製造方法The invention relates to a manufacturing method of a sealing substrate with a sealing material layer and a manufacturing method of an airtight package
氣密封裝係一般而言,具備:具有基部與設置於基部上之框體部的封裝基體,和具有光透過性的玻璃蓋,和收容於由此等所圍繞之內部空間的內部元件。The airtight package generally includes a package base having a base portion and a frame portion provided on the base portion, a glass cover having light permeability, and internal components housed in the internal space surrounded by the above.
安裝於氣密封裝之內部的MEMS(微小電性機械系統)元件等之內部元件係有經由自周圍環境浸入的水分而產生劣化之虞。至以往,為了將封裝基體與玻璃蓋作為一體化,而使用具有低溫硬化性的有機樹脂系接著劑。但有機樹脂系接著劑係無法完全遮蔽水分或氣體之故,而有經時性地使內部元件劣化之虞。Internal elements such as MEMS (Micro Electro Mechanical System) elements mounted inside the hermetic package may deteriorate due to moisture immersed from the surrounding environment. Conventionally, in order to integrate the encapsulation base and the glass cover, an organic resin-based adhesive having low-temperature curability has been used. However, the organic resin-based adhesive system cannot completely shield moisture or gas, and may deteriorate internal components over time.
另一方面,當將包含玻璃粉末的複合粉末使用於密封材料時,封閉部分則不易由周圍環境的水分而產生劣化,而成為容易確保氣密封裝的氣密信賴性。On the other hand, when a composite powder containing glass powder is used as a sealing material, the closed portion is less likely to be deteriorated by moisture in the surrounding environment, and it becomes easy to ensure the airtight reliability of the airtight package.
但,玻璃粉末係軟化溫度則較有機樹脂系接著劑為高之故,而有在接著時使內部元件熱劣化之虞。從如此之情事,近年,雷射密封則被注目。However, the softening temperature of the glass powder-based adhesive is higher than that of the organic resin-based adhesive, and there is a possibility of thermally deteriorating internal components during adhesion. From such a situation, in recent years, the laser seal has been noticed.
在雷射密封中,一般而言,照射具有近紅外線的波長之雷射光於密封材料層之後,密封材料層則產生軟化變形,玻璃蓋與封裝基體則被氣密一體化。並且,在雷射密封中,可僅將欲密封的部分局部性地進行加熱者,而未使內部元件熱劣化,可氣密一體化封裝基體與玻璃蓋。 [先前技術文獻] [專利文獻]In laser sealing, generally speaking, after irradiating laser light with a wavelength of near infrared rays on the sealing material layer, the sealing material layer is softened and deformed, and the glass cover and the package base are airtightly integrated. In addition, in laser sealing, only the portion to be sealed can be heated locally without thermally deteriorating internal components, and the base and the glass cover can be hermetically integrated. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開2014-224006 [專利文獻2]日本特開2014-177356[Patent Document 1] Japanese Patent Laid-Open 2014-224006 [Patent Document 2] Japanese Patent Laid-Open 2014-177356
[發明欲解決之課題][Problem to be solved by invention]
雷射密封封裝基體與玻璃蓋之情況,通常,形成密封材料層於玻璃蓋側,但對於封裝基體側係未形成有密封材料層。In the case of laser sealing the package base and the glass cover, generally, a sealing material layer is formed on the glass cover side, but no sealing material layer is formed on the package base side.
但,未形成密封材料層於封裝基體側,而形成密封材料層於玻璃蓋側時,在雷射密封時,在封裝基體與密封材料層之界面,不易形成反應層,而成為不易在封裝基體與密封材料層之界面確保封閉強度。However, when the sealing material layer is not formed on the package substrate side, and the sealing material layer is formed on the glass cover side, during laser sealing, it is difficult to form a reaction layer at the interface between the package substrate and the sealing material layer, which becomes difficult to form on the package substrate The interface with the sealing material layer ensures the sealing strength.
另外,經由電性爐燒成,而預先形成密封材料層於封裝基體的框體部之頂部時,收容於封裝基體之框體部內的內部元件則產生熱劣化。In addition, when the sealing material layer is previously formed on the top of the frame portion of the package base by firing in an electric furnace, the internal components contained in the frame portion of the package base deteriorate thermally.
本發明係有鑑於上述情事所作為之構成,其技術性的課題係提供:防止內部元件的熱劣化之同時,在封裝基體與密封材料層之界面,可有效地確保封閉強度的方法者。 [為了解決課題之手段]The present invention is configured in view of the above circumstances, and its technical problem is to provide a method of effectively ensuring the sealing strength at the interface between the encapsulation base and the sealing material layer while preventing thermal degradation of internal components. [Means to solve the problem]
本發明者係反覆種種之實驗的結果,發現根據使用樹脂比率低之密封材料糊劑時之同時,經由雷射光之照射而使乾燥膜燒結之時,可解決上述課題者。即,本發明之附有密封材料層封裝基體之製造方法係其特徵為具備:準備具有基部與設置於基部上之框體部的封裝基體的工程,和揉合密封材料與媒介物,製作樹脂量成為不足0.6質量%之密封材料糊劑的工程,和於封裝基體之框體部的頂部上,塗佈,乾燥密封材料糊劑,製作乾燥膜的工程,和經由照射雷射光於乾燥膜之時,使乾燥膜燒結而得到密封材料層的工程者。The present inventors have repeated the results of various experiments and found that the above problems can be solved when the dry film is sintered by laser light irradiation while using a sealing material paste with a low resin ratio. That is, the method for manufacturing a sealing substrate with a sealing material layer of the present invention is characterized by including: a process of preparing a packaging substrate having a base portion and a frame portion provided on the base portion, and kneading the sealing material and the medium to produce a resin The process of sealing material paste with an amount of less than 0.6% by mass, and the process of coating and drying the sealing material paste on the top of the frame portion of the encapsulation base, making a dry film, and drying the film by irradiating laser light At this time, an engineer who sinters the dried film to obtain a sealing material layer.
本發明之附有密封材料層封裝基體之製造方法係其特徵為在製作樹脂量成為不足0.6質量%之密封材料糊劑之後,塗佈,乾燥此密封材料糊劑而製作乾燥膜者。如根據如此,經由雷射光的照射而使乾燥膜燒結之情況,經由樹脂之分解熱的能量損失變少之故,成為可使用低輸出之雷射光者。作為結果,可抑制內部元件的熱劣化。更且,經由雷射光的照射而使乾燥膜燒結之情況,樹脂則成為不易殘存於密封材料層中。作為結果,在雷射密封時,在密封材料層中成為不易產生有樹脂之再分解,而可防止密封材料層之流動不良或發泡者。The method for manufacturing a sealing substrate with a sealing material layer according to the present invention is characterized in that after producing a sealing material paste whose resin amount becomes less than 0.6% by mass, it is coated and dried to produce a dry film. According to this, when the dried film is sintered by the irradiation of laser light, the energy loss due to the heat of decomposition of the resin becomes small, so that a low-output laser light can be used. As a result, thermal degradation of internal components can be suppressed. Furthermore, when the dried film is sintered by the irradiation of laser light, the resin becomes less likely to remain in the sealing material layer. As a result, during laser sealing, the resin material is less likely to be re-decomposed in the sealing material layer, and poor flow or foaming of the sealing material layer can be prevented.
另外,本發明之附有密封材料層封裝基體之製造方法係經由照射雷射光於乾燥膜之時,而使乾燥膜燒結,可得到平均厚度成為1.0~10.0μm之密封材料層。In addition, the method for manufacturing a sealing substrate with a sealing material layer of the present invention sinters the dried film when irradiating laser light on the dried film to obtain a sealing material layer with an average thickness of 1.0 to 10.0 μm.
另外,本發明之附有密封材料層封裝基體之製造方法係密封材料層之波長808nm之單色光的吸收率則每厚度1μm為5~50%者為佳。In addition, the manufacturing method of the sealing substrate with a sealing material layer of the present invention is that the absorption rate of the monochromatic light with a wavelength of 808 nm of the sealing material layer is preferably 5-50% per 1 μm thickness.
另外,本發明之附有密封材料層封裝基體之製造方法係在形成乾燥膜於封裝基體的框體部之頂部上之前,具備收容內部元件於封裝基體的框體部內之工程者為佳。In addition, the manufacturing method of the sealing substrate with a sealing material layer of the present invention is preferably provided with an engineer that houses internal components in the frame portion of the packaging substrate before forming a dry film on top of the frame portion of the packaging substrate.
另外,本發明之附有密封材料層封裝基體之製造方法係封裝基體則為玻璃陶瓷、氮化鋁、氧化鋁之任一者,或者此等之複合材料者為佳。In addition, the manufacturing method of the sealing substrate with a sealing material layer of the present invention is that the sealing substrate is any one of glass ceramics, aluminum nitride, aluminum oxide, or these composite materials.
另外,本發明之氣密封裝之製造方法係具備:經由上述之附有密封材料層封裝基體之製造方法,而製作附有密封材料層封裝基體的工程,和準備玻璃蓋之工程,和藉由密封材料層而層積配置封裝基體與玻璃蓋之工程,和自玻璃蓋側照射雷射光,經由使密封材料層軟化變形之時,氣密一體化玻璃蓋與封裝基體而得到氣密封裝之工程者為佳。In addition, the manufacturing method of the gas-tight package of the present invention includes: a process of manufacturing a sealing substrate with a sealing material layer through the above-mentioned manufacturing method of sealing substrate with a sealing material layer, and a process of preparing a glass cover, and by The process of laminating the sealing material layer and arranging the package base and the glass cover, and irradiating laser light from the side of the glass cover to obtain a hermetically sealed package by integrating the glass cover and the package base airtightly when the sealing material layer is softened and deformed The better.
本發明之附有密封材料層封裝基體之製造方法係具備:準備具有基部與設置於基部上之框體部的封裝基體的工程。具有基部與設置於基部上之框體部的封裝基體係可收容內部元件於框體部內。封裝基體的框體部係於封裝基體的外周,形成為框緣狀者為佳。如作為如此,可擴大作為裝置而發揮機能之有效面積者。另外,成為容易收容內部元件於氣密封裝內的空間,且亦成為容易進行配線接合等。The manufacturing method of the sealing substrate with a sealing material layer of the present invention includes: preparing a packaging substrate having a base and a frame portion provided on the base. The package base system having a base portion and a frame portion provided on the base portion can accommodate internal components in the frame portion. The frame portion of the package base is attached to the outer periphery of the package base, and it is preferably formed in a frame shape. As such, it is possible to expand the effective area for functioning as a device. In addition, it becomes a space where the internal components can be easily accommodated in the airtight package, and also makes it easy to perform wire bonding and the like.
框體部之頂部的寬度係理想為100~3000 μm、200~1500μm、特別是300~900μm。框體部之頂部的寬度過窄時,成為不易於框體部的頂部上形成密封材料層。另一方面,當框體部之頂部的寬度過寬時,作為裝置而發揮機能之有效面積則變小。The width of the top of the frame portion is ideally 100 to 3000 μm, 200 to 1500 μm, especially 300 to 900 μm. When the width of the top of the frame body is too narrow, it becomes difficult to form a sealing material layer on the top of the frame body. On the other hand, when the width of the top of the frame portion is too wide, the effective area for functioning as a device becomes smaller.
封裝基體的框體部高度,也就是自封裝基體減去基部厚度之高度係理想為100~3000μm、特別是200~2500μm。如作為如此,適當地收容內部元件之同時,成為容易謀求氣密封裝之薄型化。The height of the frame portion of the package base, that is, the height minus the thickness of the base from the package base is ideally 100 to 3000 μm, especially 200 to 2500 μm. As such, it is easy to achieve thinness of the airtight package while properly storing the internal components.
封裝基體的基部厚度係0.1~4.5mm、特別是0.2~3.5mm為佳。經由此,可謀求氣密封裝的薄型化者。The thickness of the base of the package base is preferably 0.1 to 4.5 mm, especially 0.2 to 3.5 mm. Through this, a thinner hermetic package can be sought.
封裝基體係玻璃,玻璃陶瓷,氮化鋁,氧化鋁之任一,或者此等之複合材料(例如,一體化氮化鋁與玻璃陶瓷者)者為佳。玻璃陶瓷係容易形成密封材料層與反應層之故,可在封裝基體與密封材料層之界面確保堅固的封閉強度者。更可容易形成熱通孔之故,可適當地防止氣密封裝過度溫度上升之事態。氮化鋁與氧化鋁係散熱性良好之故,可適當地防止氣密封裝過度溫度上升之事態。Any one of encapsulation base system glass, glass ceramic, aluminum nitride, aluminum oxide, or these composite materials (for example, integrated aluminum nitride and glass ceramic) is preferred. The glass ceramic is easy to form the sealing material layer and the reaction layer, and can ensure a strong sealing strength at the interface of the encapsulation substrate and the sealing material layer. It is easier to form the heat through hole, which can properly prevent the excessive temperature rise of the airtight package. Aluminum nitride and aluminum oxide have good heat dissipation properties, which can properly prevent excessive temperature rise of the hermetic package.
玻璃陶瓷,氮化鋁,氧化鋁係分散有黑色顏料(在分散有黑色顏料之狀態而加以燒結而成)者為佳。如作為如此,封裝基體則可吸收透過密封材料層之雷射光者。其結果,在雷射密封時,加熱與封裝基體的密封材料層接觸之處之故,可在密封材料層與封裝基體的界面促進反應層之形成者。Glass ceramics, aluminum nitride, and alumina are preferably dispersed with black pigments (sintered with black pigments dispersed). As such, the package substrate can absorb the laser light transmitted through the sealing material layer. As a result, at the time of laser sealing, the place in contact with the sealing material layer of the package base is heated, so that the formation of the reaction layer can be promoted at the interface of the sealing material layer and the package base.
本發明之附有密封材料層封裝基體之製造方法係具有揉合密封材料與媒介物,製作樹脂量成為不足0.6質量%之密封材料糊劑的工程。密封材料係一般而言,含有玻璃粉末與耐火性填充粉末之複合材料粉末,而因應必要有添加著色顏料等之雷射吸收材之情況。並且,密封材料係在雷射密封時產生軟化變形,氣密一體化封裝基體與玻璃蓋之材料。媒介物係一般而言係指樹脂與溶媒之混合物,也就是樹脂溶解之黏性溶液,分散密封材料,為了均一地塗佈密封材料糊劑於封裝基體的框體部之頂部之材料。另外,於媒介物中,因應必要,亦有添加界面活性劑,增黏劑等之情況。The manufacturing method of the sealing substrate with a sealing material layer of the present invention is a process of kneading a sealing material and a medium to produce a sealing material paste whose resin amount becomes less than 0.6% by mass. The sealing material is generally a composite material powder containing a glass powder and a refractory filler powder, and a laser absorbing material such as color pigments may be added as necessary. In addition, the sealing material is a material that softens and deforms during laser sealing and hermetically encapsulates the base and the glass cover. The medium generally refers to a mixture of a resin and a solvent, that is, a viscous solution in which the resin is dissolved, to disperse the sealing material, and to uniformly apply the sealing material paste to the top of the frame portion of the encapsulation base. In addition, in the medium, if necessary, surfactants, tackifiers, etc. may be added.
作為密封材料,可使用種種的材料。其中,從提高雷射密封強度的觀點,使用鉍系玻璃粉末與耐火性填充粉末的複合粉末者為佳。作為複合粉末,使用含有55~100體積%之鉍系玻璃粉末與0~45體積%之耐火性填充粉末的複合粉末為佳,而使用含有60~95體積%之鉍系玻璃粉末與5~40體積%之耐火性填充粉末的複合粉末為更佳,使用含有60~85體積%之鉍系玻璃粉末與15~40體積%之耐火性填充粉末的複合粉末為特別理想。如添加耐火性填充粉末,密封材料層之熱膨脹係數則成為容易整合於玻璃蓋與封裝基體的熱膨脹係數。其結果,成為容易防止在雷射密封後不當的應力殘留於封閉部分之事態。另一方面,耐火性填充粉末之含有量過多時,鉍系玻璃粉末之含有量則相對性變少之故,密封材料層的表面平滑性降低,而雷射密封精確度則成為容易降低。As the sealing material, various materials can be used. Among them, it is preferable to use a composite powder of bismuth-based glass powder and refractory filler powder from the viewpoint of improving the laser sealing strength. As the composite powder, a composite powder containing 55-100% by volume of bismuth-based glass powder and 0-45% by volume of refractory filler powder is preferred, and a composite powder containing 60-95% by volume of bismuth-based glass powder and 5-40 The composite powder of vol.% refractory filler powder is more preferable. It is particularly desirable to use a composite powder containing 60-85 vol.% bismuth glass powder and 15-40 vol.% refractory filler powder. If the refractory filler powder is added, the thermal expansion coefficient of the sealing material layer becomes the thermal expansion coefficient that is easily integrated into the glass cover and the package base. As a result, it becomes easy to prevent undue stress after laser sealing from remaining in the closed portion. On the other hand, when the content of the refractory filler powder is too large, the content of the bismuth-based glass powder becomes relatively small, the surface smoothness of the sealing material layer decreases, and the laser sealing accuracy tends to decrease.
密封材料的軟化點係理想為510℃以下、480℃以下、特別是450℃以下。密封材料的軟化點過高時,成為不亦提高密封材料層的表面平滑性。密封材料的軟化點之下限係未特別加以限定,但當考慮玻璃粉末之熱安定性時,密封材料的軟化點係350℃以上為佳。在此,「軟化點」係相當於以巨集型DTA裝置測定時之第四變曲點。The softening point of the sealing material is preferably 510°C or lower, 480°C or lower, and particularly 450°C or lower. If the softening point of the sealing material is too high, the surface smoothness of the sealing material layer may not be improved. The lower limit of the softening point of the sealing material is not particularly limited, but when considering the thermal stability of the glass powder, the softening point of the sealing material is preferably 350° C. or higher. Here, the "softening point" corresponds to the fourth point of inflection when measured with a macro DTA device.
鉍系玻璃係作為玻璃組成,以莫耳%,含有Bi2 O3 28~60%、B2 O3 15~37%、ZnO 0~30%、CuO+MnO (CuO與MnO之合成量) 1~40%者為佳。將各成分的含有範圍,如上述限定之理由,於以下加以說明。然而,在玻璃組成範圍的說明中,%顯示係指莫耳%。The bismuth-based glass system is composed of glass, with mole %, containing Bi 2 O 3 28~60%, B 2 O 3 15~37%, ZnO 0~30%, CuO+MnO (the combined amount of CuO and MnO) 1 ~40% is better. The content range of each component will be explained below as the reason for the above limitation. However, in the description of the glass composition range,% display means mole %.
Bi2 O3 係為了使軟化點降低之主要成分。Bi2 O3 之含有量係理想為28~60%、33~55%、特別是35~45%。Bi2 O3 之含有量過少時,軟化點變為過高,而軟化流動性則成為容易降低。另一方面,Bi2 O3 之含有量過多時,在雷射密封時,玻璃容易成為失透,而因此失透引起,軟化流動性則成為容易降低。Bi 2 O 3 is a main component for lowering the softening point. The content of Bi 2 O 3 is ideally 28 to 60%, 33 to 55%, especially 35 to 45%. When the content of Bi 2 O 3 is too small, the softening point becomes too high, and the softening fluidity tends to decrease. On the other hand, when the content of Bi 2 O 3 is too large, the glass is likely to be devitrified during laser sealing, and therefore, the softening fluidity is easily reduced due to devitrification.
B2 O3 係作為玻璃形成成分而為必須的成分。B2 O3 之含有量係理想為15~37%、19~33%、特別是22~30 %。B2 O3 之含有量過少時,不易形成玻璃網路之故,在雷射密封時,玻璃則成為容易失透。另一方面,B2 O3 之含有量過多時,玻璃之黏性則變高,而軟化流動性則成為容易降低。The B 2 O 3 system is an essential component as a glass-forming component. The content of B 2 O 3 is ideally 15 to 37%, 19 to 33%, especially 22 to 30%. When the content of B 2 O 3 is too small, it is not easy to form a glass network, and the glass becomes easily devitrified during laser sealing. On the other hand, when the content of B 2 O 3 is too large, the viscosity of the glass becomes higher, and the softening fluidity tends to decrease.
ZnO係提高耐失透性的成分。ZnO之含有量係理想為0~30%、3~25%、5~22%、特別是5~20%。ZnO之含有量過多時,玻璃組成之成分平衡則崩潰,反而耐失透性則成為容易降低。The ZnO-based component improves devitrification resistance. The content of ZnO is ideally 0~30%, 3~25%, 5~22%, especially 5~20%. When the content of ZnO is too large, the composition balance of the glass composition collapses, and devitrification resistance tends to decrease.
CuO與MnO係大幅度地提高雷射吸收能之成分。CuO與MnO之合成量係理想為1~40%、3~35%、10~30%、特別是15~30%。CuO與MnO之合成量過少時,雷射吸收能則成為容易降低。另一方面,CuO與MnO之合成量過多時,軟化點則成為過高,即使照射雷射光,玻璃則成為不易軟化流動。另外,玻璃則成為熱不安定,而在雷射密封時,玻璃則成為容易失透。然而,CuO之含有量係理想為1~30%、特別是10~25%。MnO含有量係理想為0~25%、1~25%、特別是3~15%。CuO and MnO are components that greatly increase the laser absorption energy. The synthesis amount of CuO and MnO is ideally 1-40%, 3-35%, 10-30%, especially 15-30%. When the combined amount of CuO and MnO is too small, the laser absorption energy tends to decrease. On the other hand, when the combined amount of CuO and MnO is too large, the softening point becomes too high, and even if laser light is irradiated, the glass becomes difficult to soften and flow. In addition, the glass becomes thermally unstable, and the glass becomes easily devitrified during laser sealing. However, the content of CuO is ideally 1-30%, especially 10-25%. The MnO content is desirably 0-25%, 1-25%, especially 3-15%.
除上述成分以外,例如,添加以下的成分亦可。In addition to the above components, for example, the following components may be added.
SiO2 係提高耐水性的成分。SiO2 之含有量係理想為0~5%、0~3%、0~2%、特別是0~1%。SiO2 之含有量過多時,軟化點則有不當上升之虞。另外,在雷射密封時,玻璃則成為容易失透。The SiO 2 system improves water resistance. The content of SiO 2 is ideally 0 to 5%, 0 to 3%, 0 to 2%, especially 0 to 1%. If the content of SiO 2 is too large, the softening point may increase inappropriately. In addition, during laser sealing, the glass becomes easily devitrified.
Al2 O3 係提高耐水性的成分。Al2 O3 之含有量係0~10%、0.1~5%、特別是0.5~3%為佳。Al2 O3 之含有量過多時,軟化點則有不當上升之虞。The Al 2 O 3 system improves water resistance. The content of Al 2 O 3 is preferably 0 to 10%, 0.1 to 5%, especially 0.5 to 3%. If the content of Al 2 O 3 is too large, the softening point may increase inappropriately.
Li2 O、Na2 O及K2 O係使耐失透性降低之成分。因而,Li2 O、Na2 O及K2 O之含有量係各不足0~5%、0~3%、特別是0~1%為佳。Li 2 O, Na 2 O and K 2 O are components that reduce the devitrification resistance. Therefore, the content of Li 2 O, Na 2 O, and K 2 O is preferably less than 0 to 5%, 0 to 3%, and particularly 0 to 1%.
MgO、CaO、SrO及BaO係提高耐失透性的成分,但使軟化點上升之成分。因而,MgO、CaO、SrO及BaO之含有量係各為0~20%、0~10%、特別是0~5%為佳。MgO, CaO, SrO, and BaO are components that increase devitrification resistance, but increase the softening point. Therefore, the content of MgO, CaO, SrO, and BaO are each 0 to 20%, 0 to 10%, especially 0 to 5%.
Fe2 O3 係提高耐失透性與雷射吸收能之成分。Fe2 O3 之含有量係理想為0~10%、0.1~5%、特別是0.4~2%。Fe2 O3 之含有量過多時,玻璃組成之成分平衡則崩潰,反而耐失透性則成為容易降低。Fe 2 O 3 is a component that improves devitrification resistance and laser absorption energy. The content of Fe 2 O 3 is desirably 0 to 10%, 0.1 to 5%, especially 0.4 to 2%. When the content of Fe 2 O 3 is too large, the composition balance of the glass composition collapses, and the devitrification resistance tends to decrease.
Sb2 O3 係提高耐失透性的成分。Sb2 O3 之含有量係理想為0~5%、特別是0~2%。Sb2 O3 之含有量過多時,玻璃組成之成分平衡則崩潰,反而耐失透性則成為容易降低。Sb 2 O 3 is a component for improving devitrification resistance. The content of Sb 2 O 3 is ideally 0 to 5%, especially 0 to 2%. When the content of Sb 2 O 3 is too large, the composition balance of the glass composition collapses, and devitrification resistance tends to decrease.
玻璃粉末之平均粒徑D50 係理想為不足15μm,0.5~10μm、特別是1~5μm。玻璃粉末之平均粒徑D50 越小時,玻璃粉末的軟化點則降低。在此「平均粒徑D50 」係指經由雷射繞射法,以體積基準測定的值。The average particle size D 50 of the glass powder is ideally less than 15 μm, 0.5 to 10 μm, especially 1 to 5 μm. The smaller the average particle diameter D 50 of the glass powder, the lower the softening point of the glass powder. Here, the "average particle diameter D 50 "refers to a value measured on a volume basis by a laser diffraction method.
作為耐火性填充粉末,選自菫青石,鋯石,氧化錫,氧化鈮,磷酸鋯系陶瓷,矽酸鋅,β-鋰霞石,β-石英固溶體之一種或二種以上為佳,特別是β-鋰霞石或菫青石為佳。此等耐火性填充粉末係加上於熱膨脹係數為低之情況,機械性強度為高,並且與鉍系玻璃之適合性為良好。As the refractory filler powder, one or more types selected from chrysotile, zircon, tin oxide, niobium oxide, zirconium phosphate-based ceramics, zinc silicate, β-eucryptite, and β-quartz solid solution are preferred. In particular, β-eucryptite or crocidolite is preferred. These refractory filler powders are added to the case where the coefficient of thermal expansion is low, the mechanical strength is high, and the compatibility with bismuth-based glass is good.
耐火性填充粉末之平均粒徑D50 係理想為不足2μm,特別是0.1μm以上、不足1.5μm。耐火性填充粉末之平均粒徑D50 過大時,密封材料層的表面平滑性則容易降低之同時,密封材料層的平均厚度則成為容易變大,作為結果,雷射密封精確度則成為容易降低。The average particle size D 50 of the refractory filler powder is desirably less than 2 μm, particularly 0.1 μm or more and less than 1.5 μm. When the average particle size D 50 of the refractory filler powder is too large, the surface smoothness of the sealing material layer tends to decrease, and at the same time, the average thickness of the sealing material layer tends to increase. As a result, the laser sealing accuracy tends to decrease. .
耐火性填充粉末之99%粒徑D99 係理想為不足5μm,4μm以下、特別是0.3μm以上、且3μm以下。耐火性填充粉末之99%粒徑D99 過大時,密封材料層的表面平滑性則容易降低之同時,密封材料層的平均厚度則成為容易變大,作為結果,雷射密封精確度則成為容易降低。在此「99%粒徑D99 」係指經由雷射繞射法,以體積基準測定的值。The 99% particle size D 99 of the refractory filler powder is desirably less than 5 μm, 4 μm or less, particularly 0.3 μm or more and 3 μm or less. When the 99% particle size D 99 of the refractory filler powder is too large, the smoothness of the surface of the sealing material layer is likely to be reduced. At the same time, the average thickness of the sealing material layer becomes easy to increase, and as a result, the laser sealing accuracy becomes easy reduce. Here, "99% particle size D 99 "refers to a value measured on a volume basis by the laser diffraction method.
密封材料係為了提高光吸收特性,更含有雷射吸收材亦可,但雷射吸收材係具有助長鉍系玻璃的失透之作用。因而密封材料層中的雷射吸收材之含有量係理想為10體積%以下、5體積%以下、1體積%以下、0.5體積%以下、特別是實質上未含有者為佳。鉍系玻璃的耐失透性為良好之情況係為了提高雷射吸收能,導入1體積%以上、特別是3體積%以上雷射吸收材亦可。然而,作為雷射吸收材,可使用Cu系氧化物、Fe系氧化物、Cr系氧化物、Mn系氧化物及此等之尖晶石型複合氧化物等。In order to improve the light absorption characteristics, the sealing material may further contain a laser absorber, but the laser absorber has the effect of promoting devitrification of bismuth glass. Therefore, the content of the laser absorber in the sealing material layer is desirably 10% by volume or less, 5% by volume or less, 1% by volume or less, 0.5% by volume or less, and particularly those that are not substantially contained are preferred. When the devitrification resistance of the bismuth-based glass is good, in order to improve the laser absorption energy, a laser absorber of 1% by volume or more, particularly 3% by volume or more, may be introduced. However, as the laser absorber, Cu-based oxides, Fe-based oxides, Cr-based oxides, Mn-based oxides, spinel-type composite oxides, and the like can be used.
密封材料之熱膨脹係數係理想為 55×10-7 ~110×10-7 /℃、60×10-7 ~105×10-7 /℃、特別是65×10-7 ~100×10-7 /℃。如作為如此,密封材料之熱膨脹係數則整合為玻璃蓋或封裝基體之熱膨脹係數,而殘留於封閉部分的應力則變小。然而,「熱膨脹係數」係在30~300℃之溫度範圍中,以TMA(押棒式熱膨脹係數測定)裝置所測定的值。The thermal expansion coefficient of the sealing material is ideally 55×10 -7 ~110×10 -7 /℃, 60×10 -7 ~105×10 -7 /℃, especially 65×10 -7 ~100×10 -7 / ℃. As such, the thermal expansion coefficient of the sealing material is integrated into the thermal expansion coefficient of the glass cover or the package base, and the stress remaining in the closed portion becomes smaller. However, the "coefficient of thermal expansion" refers to the value measured with a TMA (Push Rod Thermal Expansion Coefficient) device in the temperature range of 30 to 300°C.
密封材料糊劑係通常,經由三支滾輪等,揉合密封材料與媒介物而加以製作。媒介物係如上述,通常包含樹脂與溶劑。樹脂係以調整糊劑的黏性目的而加以添加。但高分子之樹脂,例如,具有超過250之分子量的樹脂係在雷射光的照射時,產生有大的分解熱之故,乾燥膜的燒結則變為困難。The sealing material paste is usually produced by kneading the sealing material and the medium through three rollers or the like. The vehicle system, as described above, usually contains a resin and a solvent. The resin is added for the purpose of adjusting the viscosity of the paste. However, high-molecular resins, for example, resins with a molecular weight of more than 250, generate a large heat of decomposition when irradiated with laser light, and sintering of the dried film becomes difficult.
密封材料糊劑中之樹脂量係不足0.6質量%,而理想為0.5質量%以下、0.4質量%以下、0.3質量%以下、0.2質量%以下、特別是不足0.1質量%。當密封材料糊劑中之樹脂量過多時,經由雷射光的照射而使乾燥膜燒結之情況,經由樹脂之分解熱的能量損失變多之故,成為無法使用低輸出之雷射光者。作為結果,內部元件則成為容易產生熱劣化。更且,經由雷射光的照射而使乾燥膜燒結之情況,樹脂則成為容易殘存於密封材料層中。作為結果,在雷射密封時,在密封材料層中產生有樹脂的再分解,而成為容易於密封材料層產生有流動不佳或發泡。The amount of resin in the sealing material paste is less than 0.6% by mass, and ideally 0.5% by mass or less, 0.4% by mass or less, 0.3% by mass or less, 0.2% by mass or less, and particularly less than 0.1% by mass. When the amount of resin in the sealing material paste is too large, when the dry film is sintered by the irradiation of laser light, the energy loss due to the heat of decomposition of the resin increases, making it impossible to use low-output laser light. As a result, internal components become prone to thermal degradation. Furthermore, when the dried film is sintered by the irradiation of laser light, the resin tends to remain in the sealing material layer. As a result, at the time of laser sealing, re-decomposition of the resin occurs in the sealing material layer, and it becomes easy to cause poor flow or foaming in the sealing material layer.
在本發明之附有密封材料層封裝基體之製造方法中,最為理想則使用實質上未含有樹脂之媒介物(樹脂量為不足0.1質量%之媒介物)者,但少量添加樹脂於媒介物之情況,作為樹脂,可使用丙烯酸酯(丙烯酸樹脂),乙基纖維素,聚乙二醇衍生物,硝化纖維素,聚甲基苯乙烯,聚乙烯碳酸酯,聚丙烯碳酸酯,異丁烯酸酯等。作為使用於媒介物的溶劑,可使用N、N’-二甲基甲醯胺(DMF)、α-松油醇,高級醇,γ-丁內酯(γ-BL)、四氫化萘,萜烯,二甘醇丁醚醋酸酯,乙酸乙酯,乙酸異戊酯,二乙二醇單乙醚,乙二醇乙醚醋酸酯,苯甲醇,甲苯,3-甲氧基-3-甲基丁醇,三乙二醇單甲醚,三乙二醇二甲醚,二丙二醇甲醚,二丙二醇丁醚,三丙二醇單甲醚,三丙二醇單丁醚,碳酸丙烯酯,二甲基亞碸(DMSO)、N-甲基-2-吡咯烷酮等。In the manufacturing method of the sealing substrate with a sealing material layer of the present invention, it is most desirable to use a vehicle that does not substantially contain a resin (a vehicle with a resin amount of less than 0.1% by mass), but a small amount of resin is added to the vehicle In this case, as the resin, acrylate (acrylic resin), ethyl cellulose, polyethylene glycol derivatives, nitrocellulose, polymethylstyrene, polyethylene carbonate, polypropylene carbonate, methacrylate, etc. can be used . As the solvent used for the vehicle, N, N'-dimethylformamide (DMF), α-terpineol, higher alcohol, γ-butyrolactone (γ-BL), tetralin, terpene can be used Ethylene, diethylene glycol butyl ether acetate, ethyl acetate, isoamyl acetate, diethylene glycol monoethyl ether, ethylene glycol ethyl ether acetate, benzyl alcohol, toluene, 3-methoxy-3-methylbutanol , Triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, dipropylene glycol methyl ether, dipropylene glycol butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, propylene carbonate, dimethyl sulfoxide (DMSO ), N-methyl-2-pyrrolidone, etc.
本發明之附有密封材料層封裝基體之製造方法係在形成乾燥膜於封裝基體的框體部之頂部上之前,具備收容內部元件於封裝基體的框體部內之工程者為佳。如作為如此,可提高氣密封裝之製造效率者。The manufacturing method of the sealing substrate with a sealing material layer of the present invention is preferably provided with an engineer that houses internal components in the frame portion of the packaging substrate before forming a dry film on top of the frame portion of the packaging substrate. As such, the manufacturing efficiency of the hermetic package can be improved.
本發明之附有密封材料層封裝基體之製造方法係具備:於封裝基體的框體部之頂部上,塗佈,乾燥密封材料糊劑,製作乾燥膜之工程。密封材料糊劑的塗佈係使用分配器或網版印刷機等之塗佈機者為佳。如作為如此,可提高塗佈膜或乾燥膜之尺寸精確度者。The manufacturing method of the sealing substrate with a sealing material layer of the present invention includes: applying and drying the sealing material paste on the top of the frame portion of the packaging substrate to make a drying film. The coating of the sealing material paste is preferably a coating machine such as a dispenser or a screen printing machine. As such, it is possible to improve the dimensional accuracy of the coated film or the dried film.
塗佈膜之乾燥係較密封材料糊劑中之溶媒所揮發之下限溫度為高,而較內部元件的耐熱溫度為低之溫度為佳。The drying of the coating film is higher than the lower limit temperature of the volatilization of the solvent in the sealing material paste, and lower than the heat resistance temperature of the internal components.
本發明之附有密封材料層封裝基體之製造方法係具備:照射雷射光於乾燥膜,使乾燥膜燒結而得到密封材料層之工程。作為照射於乾燥膜之雷射,可使用種種的雷射。特別是近紅外半導體雷射係在處理容易的點而為理想。The manufacturing method of the sealing substrate with a sealing material layer of the present invention includes the steps of: irradiating laser light to the dried film and sintering the dried film to obtain a sealing material layer. As the laser irradiated to the dry film, various lasers can be used. In particular, the near infrared semiconductor laser system is ideal for easy handling.
雷射的光束徑係為了均一化燒結狀態,而較乾燥膜之寬度為大者為佳。In order to homogenize the sintered state, the laser beam diameter is preferably larger than the width of the dry film.
在照射雷射光時之外部環境係無特別加以限定,亦可在大氣環境,而在氮環境等之非活性環境亦可。The external environment when irradiating with laser light is not particularly limited, and it may be in an atmospheric environment, or in an inactive environment such as a nitrogen environment.
在照射雷射光時,以100℃以上,且內部元件之耐熱溫度以下的溫度,預備加熱封裝基體者為佳。經由此,乾燥膜之內部與外表面的溫度差變小之故,密封材料層之表面狀態則容易成為均一,且圓滑。When irradiating laser light, it is better to prepare the package substrate for heating at a temperature above 100°C and below the heat resistance temperature of the internal components. As a result, the temperature difference between the inner and outer surfaces of the dried film becomes smaller, and the surface state of the sealing material layer is likely to be uniform and smooth.
對於乾燥膜之雷射的掃描係亦可以一定的速度進行,而在任意的範圍變更速度亦可。The laser scanning system for the dried film can also be performed at a certain speed, and the speed can be changed in an arbitrary range.
密封材料層係與框體部的接觸位置則呈自框體部的頂部之內側端緣離間地加以形成之同時,呈自框體部的頂部之外側端緣離間地形成者為佳,而形成於自框體部的頂部之內側端緣50μm以上、60μm以上、70~2000μm、特別是80~1000μm離間的位置者為更佳。當框體部的頂部之內側端緣與密封材料層之離間距離過短時,在雷射密封時,在局部加熱產生的熱則不易發散之故,在冷卻過程,玻璃蓋則成為容易破損。另一方面,當框體部的頂部之內側端緣與封裝材料層之離間距離過長時,氣密封裝的小型化則變為困難。另外,形成於自框體部的頂部之外側端緣50μm以上、60μm以上、70~2000 μm、特別是80~1000μm離間的位置者為佳。當框體部的頂部之外側端緣與密封材料層之離間距離過短時,在雷射密封時,在局部加熱產生的熱則不易發散之故,在冷卻過程,玻璃蓋則成為容易破損。另一方面,當框體部的頂部之外側端緣與密封材料層之離間距離過長時,氣密封裝的小型化則變為困難。The contact position of the sealing material layer and the frame body portion is formed to be separated from the inner end edge of the top of the frame body portion, and preferably formed from the outer end edge of the frame body portion and separated It is more preferable to be at a position separated by 50 μm or more, 60 μm or more, 70 to 2000 μm, especially 80 to 1000 μm from the inner edge of the top of the frame body. When the distance between the inner edge of the top of the frame and the sealing material layer is too short, during laser sealing, the heat generated by local heating is not easily dissipated. During the cooling process, the glass cover becomes easy to break. On the other hand, when the distance between the inner edge of the top of the frame and the encapsulating material layer is too long, it becomes difficult to reduce the size of the hermetic package. In addition, those formed at positions separated from the top edge of the frame body by 50 μm or more, 60 μm or more, 70 to 2000 μm, and particularly 80 to 1000 μm are preferable. When the distance between the outer edge of the top of the frame and the sealing material layer is too short, during laser sealing, the heat generated by local heating is not easily dissipated, and the glass cover becomes easily damaged during the cooling process. On the other hand, when the separation distance between the outer edge of the frame body and the end edge and the sealing material layer is too long, it becomes difficult to reduce the size of the hermetic package.
密封材料層之表面的表面粗度Ra係理想為不足0.5μm、0.2μm以下、特別是0.01~0.15μm。另外,密封材料層之表面粗度RMS係理想為不足1.0μm、0.5μm以下、特別是0.05~0.3μm。如作為如此,雷射密封精確度則提升。在此,「表面粗度Ra」與「表面粗度RMS」係例如,可經由觸針式或非接觸式之雷射膜厚計或表面粗度計而測定。然而,如以上作為規定密封材料層之表面粗度Ra、RMS的方法係可舉出:研磨處理密封材料層的表面之方法,縮小耐火性填充粉末的粒度之方法。The surface roughness Ra of the surface of the sealing material layer is desirably less than 0.5 μm, 0.2 μm or less, especially 0.01 to 0.15 μm. In addition, the surface roughness RMS of the sealing material layer is desirably less than 1.0 μm, 0.5 μm or less, particularly 0.05 to 0.3 μm. As such, the laser sealing accuracy is improved. Here, "surface roughness Ra" and "surface roughness RMS" are, for example, can be measured by a stylus type or non-contact type laser film thickness meter or surface roughness meter. However, as a method for specifying the surface roughness Ra and RMS of the sealing material layer as described above, there are a method of grinding the surface of the sealing material layer and a method of reducing the particle size of the refractory filler powder.
密封材料層之平均厚度係理想為10.0μm以下,特別是1.0μm以上、且不足6.0μm。密封材料層之平均厚度越小,密封材料層與玻璃蓋的熱膨脹係數為非整合時,可降低在雷射密封後殘留於封閉部分的應力。另外,亦可提高雷射密封精確度。然而,作為如上述規定密封材料層之平均厚度的方法,係可舉出薄薄地塗佈密封材料糊劑之方法,研磨處理密封材料層之表面的方法。The average thickness of the sealing material layer is desirably 10.0 μm or less, particularly 1.0 μm or more and less than 6.0 μm. When the average thickness of the sealing material layer is smaller, the thermal expansion coefficient of the sealing material layer and the glass cover is not integrated, which can reduce the stress remaining in the closed portion after laser sealing. In addition, the laser sealing accuracy can also be improved. However, as a method of specifying the average thickness of the sealing material layer as described above, a method of thinly applying a sealing material paste and a method of polishing the surface of the sealing material layer can be mentioned.
密封材料層之波長808nm的單色光之吸收率(厚度方向)係理想為20~90%、特別是30~60%。另外,密封材料層之波長808nm的單色光之吸收率係每厚度1μm為5~50%、特別是7~30%者為佳。當波長808nm的單色光之吸收率過低時,密封材料層則成為不易軟化變形,而有必要過度地提高雷射輸出。作為結果,內部元件產生有熱劣化之虞。另外,當波長808nm的單色光之吸收率過高時,未能傳達充分的熱於封裝基體與密封材料層之界面之故,兩者間的反應則未進行,而有密封材料層之燒結成為不充分之虞。在此,「在波長808nm的單色光之光吸收率」係指:以分光光度計而測定反射率與透過率,再將此合計值,自100%減去的值。The absorption rate (thickness direction) of monochromatic light with a wavelength of 808 nm of the sealing material layer is ideally 20 to 90%, especially 30 to 60%. In addition, the absorption rate of the monochromatic light with a wavelength of 808 nm of the sealing material layer is preferably 5 to 50%, especially 7 to 30% per 1 μm of thickness. When the absorption rate of monochromatic light with a wavelength of 808 nm is too low, the sealing material layer becomes difficult to soften and deform, and it is necessary to excessively increase the laser output. As a result, internal components may be thermally degraded. In addition, when the absorption rate of monochromatic light with a wavelength of 808 nm is too high, sufficient heat cannot be transferred to the interface between the package substrate and the sealing material layer, the reaction between the two does not proceed, and there is sintering of the sealing material layer Become inadequate. Here, "light absorption rate of monochromatic light at a wavelength of 808 nm" refers to a value in which the reflectance and transmittance are measured with a spectrophotometer, and the total value is subtracted from 100%.
本發明之氣密封裝之製造方法係具備:經由上述之附有密封材料層封裝基體之製造方法,而製作附有密封材料層封裝基體的工程,和準備玻璃蓋之工程,和藉由密封材料層而層積配置封裝基體與玻璃蓋之工程,和自玻璃蓋側照射雷射光,經由使密封材料層軟化變形之時,氣密一體化玻璃蓋與封裝基體而得到氣密封裝之工程者為佳。The manufacturing method of the gas-tight package of the present invention includes: a process of manufacturing a encapsulating substrate with a sealing material layer through the above-mentioned manufacturing method of a encapsulating substrate with a sealing material layer, a process of preparing a glass lid, and The process of arranging the package base and the glass cover layer by layer, and irradiating the laser light from the side of the glass cover, by softening and deforming the sealing material layer, the airtight integration of the glass cover and the package base to obtain a hermetically sealed package is good.
作為玻璃蓋,可使用種種的玻璃。例如,可使用無鹼玻璃,硼矽酸玻璃,鈉鈣玻璃。As the glass cover, various glasses can be used. For example, alkali-free glass, borosilicate glass, soda lime glass can be used.
玻璃蓋之板厚係0.01~2.0mm、0.1~1mm、特別是0.2~0.7mm者為佳。經由此,可謀求氣密封裝的薄型化者。The thickness of the glass cover is preferably 0.01~2.0mm, 0.1~1mm, especially 0.2~0.7mm. Through this, a thinner hermetic package can be sought.
於玻璃蓋之內部元件側的表面形成機能膜亦可,而亦可於玻璃蓋之外側的表面形成機能膜。特別是作為機能膜,反射防止膜為佳。經由此,可降低在玻璃蓋表面所反射的光者。A functional film may be formed on the surface of the inner element side of the glass cover, or a functional film may be formed on the surface of the outer side of the glass cover. Especially as a functional film, an anti-reflection film is preferred. Through this, it is possible to reduce the light reflected on the surface of the glass cover.
本發明之氣密封裝之製造方法係具有藉由密封材料層而層積配置封裝基體與玻璃蓋之工程。此情況,將玻璃蓋配置於封裝基體的下方亦可,但從雷射密封效率的觀點,將玻璃蓋配置於封裝基體的上方者為佳。The manufacturing method of the hermetic package of the present invention has a process of laminating the packaging base and the glass cover by the sealing material layer. In this case, the glass cover may be disposed below the package base, but from the viewpoint of laser sealing efficiency, it is preferable to arrange the glass cover above the package base.
於玻璃蓋的表面上,形成密封材料層者為佳,此情況,形成於封裝基體的密封材料層與形成於玻璃蓋之密封材料層的中心線彼此則呈重疊地,層積配置封裝基體與玻璃蓋者為佳。另外,形成於玻璃蓋之密封材料層之封閉圖案係與形成於封裝基體的框體部之頂部的密封材料層的封閉圖案略同一者為佳。如作為如此,可同時提高雷射密封精確度與雷射密封強度者。A sealing material layer is preferably formed on the surface of the glass cover. In this case, the center lines of the sealing material layer formed on the package base and the sealing material layer formed on the glass cover overlap each other, and the package base and Glass cover is better. In addition, it is preferable that the sealing pattern formed on the sealing material layer of the glass cover is slightly the same as the sealing pattern formed on the top of the frame body portion of the package base. As such, those who can improve both the laser seal accuracy and the laser seal strength.
本發明之氣密封裝之製造方法係具備:自玻璃蓋側照射雷射光,經由使密封材料層軟化變形之時,氣密一體化玻璃蓋與封裝基體而得到氣密封裝之工程。The manufacturing method of the airtight package of the present invention includes the steps of: irradiating laser light from the side of the glass cover, and softening and deforming the sealing material layer, and integrating the glass cover and the package base to obtain the airtight package.
進行雷射密封的環境係無特別加以限定,亦可在大氣環境,而在氮環境等之非活性環境亦可。The environment for laser sealing is not particularly limited, and it may be in an atmospheric environment, or in an inactive environment such as a nitrogen environment.
在進行雷射密封時,在(100℃以上,且內部元件的耐熱溫度以下)之溫度,預備加熱玻璃蓋時,可抑制經由熱衝擊之玻璃蓋的破裂者。另外,在雷射密封之後,自玻璃蓋側照射退火雷射時,可抑制經由熱衝擊之玻璃蓋的破裂者。When performing laser sealing, when the glass cover is prepared to be heated at a temperature (above 100°C and below the heat resistance temperature of the internal components), cracking of the glass cover by thermal shock can be suppressed. In addition, after the laser sealing, when the annealing laser is irradiated from the glass cover side, cracking of the glass cover by thermal shock can be suppressed.
在進行雷射密封時,在(100℃以上,且內部元件的耐熱溫度以下)之溫度,預備加熱封裝基體時,可在雷射密封時阻礙對於封裝基體側的熱傳導之故,而可效率佳地進行雷射密封者。When performing laser sealing, at a temperature (above 100°C and below the heat resistance temperature of internal components), when preparing to heat the package base, it can hinder the heat conduction to the package base side during laser sealing, and can be efficient Laser sealer.
在按壓玻璃蓋之狀態而進行雷射密封者為佳。經由此,可在雷射密封時促進密封材料層之軟化變形者。Laser sealing is preferred when the glass cover is pressed. Through this, it is possible to promote the softening and deformation of the sealing material layer during laser sealing.
以下,參照圖面同時加以說明本發明。圖1係為了說明本發明之一實施形態的剖面概念圖。氣密封裝1係具備封裝基體10與玻璃蓋11。封裝基體10係具有基部12,更且於基部12之外周端緣上具有框體部13。另外,對於封裝基體10之框體部13內係收容內部元件14。並且,對於此框體部13之頂部15係形成有密封材料層16,而其頂部15之表面係預先加以研磨處理,而其表面粗度Ra則成為0.15μm以下。並且,密封材料層16之寬度係若干成為較框體部13之寬部為小。更且,密封材料層16係在塗佈,乾燥密封材料糊劑,製作乾燥膜之後,於其乾燥膜,照射雷射光而使其燒結之構成。其密封材料糊劑係樹脂量則不足0.6質量%,而經由以三支滾輪等而揉合密封材料與媒介物而加以製作。其密封材料係含有在玻璃組成中包含過渡金屬氧化物之鉍系玻璃與耐火性填充粉末。然而,對於封裝基體10內係形成有電性連接內部元件14與外部之電性配線(未加以圖示)。Hereinafter, the present invention will be described simultaneously with reference to the drawings. FIG. 1 is a cross-sectional conceptual diagram for explaining one embodiment of the present invention. The hermetic package 1 includes a package base 10 and a glass cover 11. The package base 10 has a base 12 and a frame 13 on the outer peripheral edge of the base 12. In addition, the internal element 14 is housed in the frame portion 13 of the package base 10. In addition, a sealing material layer 16 is formed on the top portion 15 of the frame portion 13, and the surface of the top portion 15 is previously polished, and the surface roughness Ra is 0.15 μm or less. In addition, the width of the sealing material layer 16 is slightly smaller than the width of the frame portion 13. Furthermore, the sealing material layer 16 is formed by applying and drying the sealing material paste to form a dried film, and then irradiating the dried film with laser light to sinter it. The amount of the sealing material paste-based resin is less than 0.6% by mass, and is produced by kneading the sealing material and the medium with three rollers or the like. The sealing material contains bismuth glass containing transition metal oxide in the glass composition and refractory filler powder. However, electrical wiring (not shown) electrically connecting the internal element 14 and the outside is formed in the package base 10.
對於玻璃蓋11之表面係形成有框緣狀之密封材料層17。密封材料層17係使密封材料燒結之構成,與密封材料層16略同樣之材料構成,而其密封材料係含有在玻璃組成中包含過渡金屬氧化物之鉍系玻璃與耐火性填充粉末。並且,密封材料層17之寬度係與密封材料層16之寬度略同樣。更且,密封材料層17之厚度係若干成為較密封材料層16之厚度為小。A frame-shaped sealing material layer 17 is formed on the surface of the glass cover 11. The sealing material layer 17 is formed by sintering the sealing material, and is composed of the same material as the sealing material layer 16, and the sealing material contains bismuth glass containing transition metal oxide in the glass composition and refractory filler powder. In addition, the width of the sealing material layer 17 is slightly the same as the width of the sealing material layer 16. Moreover, the thickness of the sealing material layer 17 is smaller than the thickness of the sealing material layer 16.
另外玻璃蓋11則成為上方,且密封材料層16與密封材料層17之寬度方向的中心線彼此則呈接觸地,層積配置封裝基體10與玻璃蓋11。之後,自雷射照射裝置18出射的雷射光L則自玻璃蓋11側,沿著密封材料層16與密封材料層17而加以照射。經由此,密封材料層16與密封材料層17則軟化流動之後,氣密一體化封裝基體10與玻璃蓋11,加以形成氣密封裝1的氣密構造。 [實施例]In addition, the glass cover 11 is upward, and the center lines in the width direction of the sealing material layer 16 and the sealing material layer 17 are in contact with each other, and the package base 10 and the glass cover 11 are stacked. Then, the laser light L emitted from the laser irradiation device 18 is irradiated along the sealing material layer 16 and the sealing material layer 17 from the glass cover 11 side. As a result, after the sealing material layer 16 and the sealing material layer 17 are softened and flowed, the airtight structure of the airtight package 1 is formed by hermetically sealing the base body 10 and the glass cover 11 together. [Example]
以下,依據實施例而加以說明本發明。然而,以下的實施例係單純的例示。本發明係對於以下之實施例未有任何限定。The present invention will be described below based on examples. However, the following examples are purely illustrative. The present invention is not limited to the following embodiments.
表1係顯示本發明之實施例(試料No.1~4),比較例(試料No.5~8)。Table 1 shows examples of the present invention (Sample Nos. 1 to 4) and comparative examples (Sample Nos. 5 to 8).
首先,呈成為所期望的玻璃組成地,準備調合各種氧化物,碳酸鹽等之原料的玻璃批,再將此放入白金坩堝,以1200℃進行2小時熔融。接著,將各所得到之熔融玻璃,經由水冷滾輪而成形為薄片狀。最後,以球磨機粉碎薄片狀的鉍系玻璃,進行空氣分級而得到鉍系玻璃粉末。然而,有關試料No.1、2、5、6之玻璃粉末係作為玻璃組成,以莫耳%,含有Bi2 O3 39%、B2 O3 23.7%、ZnO 14.1%、Al2 O3 2.7%、CuO 20%、Fe2 O3 0.6%,另外,對於有關試料No.2、3、7、8之玻璃粉末係作為玻璃組成,以莫耳%,含有Bi2 O3 45%、B2 O3 27.7%、ZnO 19.1%、Al2 O3 3.7%、CuO 4.0%、Fe2 O3 0.6%。First, prepare a glass batch in which various raw materials such as oxides and carbonates are mixed at a desired glass composition, and then put this into a platinum crucible and melt at 1200°C for 2 hours. Next, each obtained molten glass is formed into a sheet shape through a water-cooled roller. Finally, the flake-shaped bismuth-based glass was pulverized with a ball mill and subjected to air classification to obtain bismuth-based glass powder. However, the glass powders of the sample Nos. 1, 2 , 5, and 6 are composed of glass, with mole %, containing Bi 2 O 3 39%, B 2 O 3 23.7%, ZnO 14.1%, Al 2 O 3 2.7 %, CuO 20%, Fe 2 O 3 0.6%, in addition, the glass powder of the relevant sample Nos. 2, 3 , 7, and 8 is used as the glass composition, with Mo %, containing Bi 2 O 3 45%, B 2 O 3 27.7%, ZnO 19.1%, Al 2 O 3 3.7%, CuO 4.0%, Fe 2 O 3 0.6%.
接著,將所得到之鉍系玻璃粉末,以70.0體積%、將耐火性填充粉末,以30.0體体積%的比例進行混合,製作密封材料(複合粉末)。在此,將鉍系玻璃粉末的平均粒徑D50 作為1.0μm、將99%粒徑D99 作為2.5μm,將耐火性填充粉末的平均粒徑D50 作為1.0μm、將99%粒徑D99 作為2.5μm。然而,耐火性填充粉末係β-鋰霞石。Next, the obtained bismuth-based glass powder was mixed at 70.0% by volume and the refractory-filled powder at a ratio of 30.0% by volume to produce a sealing material (composite powder). Here, the average particle size D 50 of the bismuth-based glass powder is 1.0 μm, the 99% particle size D 99 is 2.5 μm, the average particle size D 50 of the refractory filler powder is 1.0 μm, and the 99% particle size D 99 is 2.5 μm. However, the refractory filler powder is β-eucryptite.
對於所得到之密封材料,測定熱膨脹係數時,其熱膨脹係數係71×10-7 /℃。然而,熱膨脹係數係以押棒式TMA裝置而測定者,其測定溫度範圍係30~300℃。When the thermal expansion coefficient of the obtained sealing material was measured, the thermal expansion coefficient was 71 × 10 -7 /°C. However, if the thermal expansion coefficient is measured by a push-bar TMA device, the measurement temperature range is 30 to 300°C.
接著,如以下作為,沿著氧化鋁製之封裝基體(30mm×30mm、框體部高度3mm、框體部寬度2mm)之框體部的頂部之中心線,具有表中的厚度,且形成寬度0.5mm之密封材料層。Next, as follows, along the center line of the top of the frame portion of the package base made of alumina (30 mm×30 mm, frame portion height 3 mm, frame portion width 2 mm), have the thickness in the table and form the width 0.5mm layer of sealing material.
當詳述時,首先黏度則呈成為約100Pa・s(25℃、Shear rate:4)地,揉合上述的密封材料與媒介物之後,更加地以三支滾輪而粉末則揉合至均一地分散,作為糊劑化,得到密封材料糊劑。When detailed, the viscosity is firstly about 100 Pa・s (25℃, Shear rate: 4). After kneading the above-mentioned sealing material and the vehicle, the three rollers are used to further knead the powder to uniformity. Disperse and paste into a paste to obtain a sealing material paste.
在試料No.1、3中,作為媒介物而使用萜烯系溶液。在試料No.2、4中,作為媒介物而使用使乙基纖維素樹脂溶解於萜烯系溶液之構成。在試料No.5~8中,作為媒介物而使用使乙基纖維素樹脂溶解於三丙二醇單甲醚之構成。然而,試料No.5與試料No.6及試料No.7與試料No.8係各鉍系玻璃與媒介物的調配比則不同。In Sample Nos. 1 and 3, a terpene-based solution was used as a vehicle. In Sample Nos. 2 and 4, a composition in which ethyl cellulose resin was dissolved in a terpene-based solution was used as a vehicle. In Sample Nos. 5 to 8, a composition in which ethyl cellulose resin was dissolved in tripropylene glycol monomethyl ether was used as a vehicle. However, the compounding ratios of the bismuth-based glass and the medium of the sample No. 5 and the sample No. 6 and the sample No. 7 and the sample No. 8 are different.
接著,封裝基體的框體部之頂部的中心線與密封材料層之寬度方向之中心線則呈一致地,經由網版印刷機而印刷上述密封材料糊劑之後,經由在大氣環境下,以100℃進行10分鐘乾燥之時,形成乾燥膜於封裝基體的框體部之頂部上。Then, the center line of the top of the frame portion of the encapsulation base and the center line of the width direction of the sealing material layer are consistent, after printing the above-mentioned sealing material paste through a screen printing machine, through the atmospheric environment, by 100 When drying at 10°C for 10 minutes, a dry film is formed on the top of the frame portion of the package base.
更且,乾燥膜則呈成為上方地,以治具固定封裝基體,以照射速度8mm/秒而照射波長808nm之半導體雷射,經由使乾燥膜軟化變形而使其燒結之時,形成密封材料層於封裝基體的框體部之頂部上。以顯微鏡觀察密封材料層之表面狀態時,將表面平滑性高之構成作為「○」、表面平滑性低之構成作為「△」、未作為燒結本身之構成作為「×」而評估。Furthermore, when the dried film is placed upward, the package substrate is fixed with a jig, a semiconductor laser with a wavelength of 808 nm is irradiated at an irradiation speed of 8 mm/sec, and when the dried film is softened and deformed and sintered, a sealing material layer is formed On top of the frame portion of the package base. When observing the surface state of the sealing material layer with a microscope, the structure with high surface smoothness was evaluated as “○”, the structure with low surface smoothness was evaluated as “△”, and the structure without sintering itself was evaluated as “×”.
另外,於厚度0.3mm、29.8mm×29.8mm之硼矽酸玻璃(NEG製BDA)之一方的表面,以與形成於封裝基體的密封材料層同一圖案而塗佈密封材料糊劑,在大氣環境中,以100℃進行10分鐘乾燥之後,經由電性爐,以520℃進行10分鐘燒成,製作附有密封材料層玻璃蓋。In addition, the sealing material paste is applied to the surface of one side of borosilicate glass (BDA made by NEG) with a thickness of 0.3 mm and 29.8 mm × 29.8 mm in the same pattern as the sealing material layer formed on the encapsulation base, in an atmospheric environment In this process, after drying at 100°C for 10 minutes, it was fired at 520°C for 10 minutes through an electric furnace to produce a glass cover with a sealing material layer.
最後,形成於封裝基體的密封材料層與形成於玻璃蓋之密封材料層則呈接觸地,層積配置封裝基體與玻璃蓋。之後,使用按壓治具而按壓玻璃蓋之同時,自該玻璃蓋側朝向密封材料層,以照射速度15mm/秒而照射波長808nm之半導體雷射,經由使密封材料層軟化變形之時,氣密一體化封裝基體與玻璃蓋,而得到氣密封裝。然而,自雷射密封後之密封材料層之上方而視之平均寬度係呈成為在雷射密封前,自密封材料層之上方而視之平均寬度的110%地,調整雷射照射徑與雷射輸出。Finally, the sealing material layer formed on the packaging base and the sealing material layer formed on the glass cover are in contact with each other, and the packaging base and the glass cover are laminated and arranged. After that, while pressing the glass cover with a pressing jig, a semiconductor laser with a wavelength of 808 nm is irradiated from the glass cover side toward the sealing material layer at an irradiation speed of 15 mm/sec, and when the sealing material layer is softened and deformed, it is airtight The substrate and the glass cover are encapsulated in an integrated manner to obtain a hermetically sealed package. However, the average width seen from above the sealing material layer after laser sealing is set to be 110% of the average width seen from above the sealing material layer before laser sealing. Shoot output.
對於所得到之氣密封裝,評估氣密信賴性。當詳述時,對於所得到之氣密封裝而言,進行高溫高濕高壓試驗(溫度85℃,相對濕度85%、1000小時)之後,觀察密封材料層的附近時,將對於玻璃蓋完全未確認到斷裂,破損等之構成作為「○」、而對於玻璃蓋確認到斷裂,破損等之構成作為「×」而評估氣密信賴性。然而,對於試料No.6~8係密封材料層之燒結為不充分之故,省略本評估。For the airtight package obtained, evaluate the airtight reliability. When describing in detail, after the high-temperature, high-humidity and high-pressure test (temperature 85° C., relative humidity 85%, 1000 hours) is performed on the resulting airtight package, when the vicinity of the sealing material layer is observed, the glass cover is completely unconfirmed When the structure of breakage, breakage, etc. is "○", the structure of breakage, breakage, etc. of the glass cover is confirmed as "X", and the airtightness reliability is evaluated. However, since the sintering of the sample No. 6 to 8 series sealing material layers is insufficient, this evaluation is omitted.
從表1了解到,試料No.1~4係密封材料糊劑中之樹脂量為適當之故,密封材料層之燒結狀態則為良好。其結果,經由雷射密封之氣密信賴性亦為良好。另一方面,試料No.5~8係密封材料糊劑中的樹脂量為多之故,密封材料層之燒結狀態則為不佳,而亦確認到有多數的泡之殘存。 [產業上之利用可能性]It is understood from Table 1 that the amount of resin in the sample Nos. 1 to 4 series sealing material paste is appropriate, and the sintered state of the sealing material layer is good. As a result, the airtight reliability through laser sealing is also good. On the other hand, the sample No. 5 to 8 series had a large amount of resin in the sealing material paste, and the sintered state of the sealing material layer was poor, and it was confirmed that many bubbles remained. [Possibility of industrial use]
在本發明之製造方法所製作之氣密封裝係對於安裝有MEMS(微小電性機械系統)元件等之內部元件的氣密封裝為最佳,但除此之外,對於壓電振動元件,或收容使量子點分散於樹脂中之波長變換元件等之氣密封裝等亦可適當地適用。The hermetic package produced by the manufacturing method of the present invention is optimal for hermetic packages mounted with internal components such as MEMS (Micro Electro Mechanical System) components, but in addition, for piezoelectric vibration elements, or A hermetically sealed package containing a wavelength conversion element and the like in which quantum dots are dispersed in resin can also be suitably applied.
1‧‧‧氣密封裝1‧‧‧ Hermetically sealed
10‧‧‧封裝基體10‧‧‧Package substrate
11‧‧‧玻璃蓋11‧‧‧Glass cover
12‧‧‧基部12‧‧‧Base
13‧‧‧框體部13‧‧‧frame
14‧‧‧內部元件14‧‧‧Internal components
15‧‧‧框體部的頂部15‧‧‧Top of the frame
16、17‧‧‧密封材料層16, 17‧‧‧ Sealing material layer
18‧‧‧雷射照射裝置18‧‧‧Laser irradiation device
L‧‧‧雷射光L‧‧‧Laser
圖1係為了說明本發明之一實施形態的概略剖面圖。FIG. 1 is a schematic cross-sectional view for explaining one embodiment of the present invention.
Claims (6)
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| JP2017-137680 | 2017-07-14 |
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| TW201908266A true TW201908266A (en) | 2019-03-01 |
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| JP4556624B2 (en) * | 2004-11-12 | 2010-10-06 | 日本電気硝子株式会社 | Sealing powder and sealing paste |
| JP5370011B2 (en) * | 2009-08-31 | 2013-12-18 | 旭硝子株式会社 | Method for producing glass member with sealing material layer and method for producing electronic device |
| JP2012041196A (en) * | 2010-08-12 | 2012-03-01 | Asahi Glass Co Ltd | Glass member with sealing material layer, electronic device using the same, and method for producing the electronic device |
| WO2012117978A1 (en) * | 2011-02-28 | 2012-09-07 | 旭硝子株式会社 | Airtight member and method for producing same |
| JP5733279B2 (en) * | 2012-07-30 | 2015-06-10 | 日立化成株式会社 | Electronic component and manufacturing method thereof, and sealing material paste used therefor |
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| JP6237989B2 (en) * | 2013-07-24 | 2017-11-29 | 日本電気硝子株式会社 | Method for manufacturing electric element package and electric element package |
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