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TW201905508A - Manufacturing method for image display device, and image display device obtained according to said manufacturing method - Google Patents

Manufacturing method for image display device, and image display device obtained according to said manufacturing method

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Publication number
TW201905508A
TW201905508A TW107117363A TW107117363A TW201905508A TW 201905508 A TW201905508 A TW 201905508A TW 107117363 A TW107117363 A TW 107117363A TW 107117363 A TW107117363 A TW 107117363A TW 201905508 A TW201905508 A TW 201905508A
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Taiwan
Prior art keywords
substrate
polarizing plate
display device
film
polarizing
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TW107117363A
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Chinese (zh)
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TWI708968B (en
Inventor
後藤周作
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日商日東電工股份有限公司
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Publication of TWI708968B publication Critical patent/TWI708968B/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8793Arrangements for polarized light emission

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Polarising Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本發明提供一種在加濕環境下仍可維持優異光學特性且褪色經防止之附基板之偏光板的簡便製造方法。本發明之附基板之偏光板之製造方法包含以下步驟:準備偏光板與尺寸較偏光板更大之基板;以基板伸出偏光板外周之方式,積層基板與偏光板;形成覆蓋偏光板之周圍端面的密封部;及,保留自偏光板之周圍端起算預定長度的伸出部分後裁切基板及密封部,製成預定尺寸。The invention provides a simple manufacturing method of a polarizing plate with a substrate that can maintain excellent optical characteristics and prevent fading in a humidified environment. The manufacturing method of the substrate-attached polarizing plate of the present invention includes the following steps: preparing a polarizing plate and a substrate having a larger size than the polarizing plate; laminating the substrate and the polarizing plate in such a manner that the substrate protrudes from the outer periphery of the polarizing plate; and forming a cover around the polarizing plate The sealing portion on the end surface; and the substrate and the sealing portion are cut out to retain a projecting portion of a predetermined length from the peripheral end of the polarizing plate to a predetermined size.

Description

影像顯示裝置之製造方法及藉由該製造方法製得之影像顯示裝置Method for manufacturing image display device and image display device manufactured by the method

本發明涉及影像顯示裝置之製造方法及藉由該製造方法製得之影像顯示裝置。The present invention relates to a method for manufacturing an image display device and an image display device manufactured by the method.

發明背景 在影像顯示裝置(例如液晶顯示裝置、有機EL顯示裝置、量子點顯示裝置)中,由於其影像形成方式,多數情況下係於顯示單元之至少一側配置偏光板。然而,偏光板卻有可實質上決定偏光板之光學特性的偏光膜之光學特性在加濕環境下降低之耐久性的問題。更具體地說,在加濕環境下,偏光膜之端部的偏光性能會消失,結果影像顯示裝置會有發生所謂褪色之現象的情形。BACKGROUND OF THE INVENTION In an image display device (for example, a liquid crystal display device, an organic EL display device, or a quantum dot display device), due to its image formation method, a polarizing plate is usually arranged on at least one side of a display unit. However, the polarizing plate has a problem that the optical characteristics of the polarizing film, which can substantially determine the optical characteristics of the polarizing plate, have reduced durability under a humidified environment. More specifically, in a humidified environment, the polarization performance at the ends of the polarizing film will disappear, and as a result, the so-called fading phenomenon may occur in the image display device.

先前技術文獻 專利文獻 專利文獻1:日本專利特開2000-338329號公報Prior Art Literature Patent Literature Patent Literature 1: Japanese Patent Laid-Open No. 2000-338329

發明概要 發明欲解決之課題 本發明係為了解決上述課題所為,其主要目的在於提供一種在加濕環境下仍可維持優異光學特性且褪色經防止之影像顯示裝置及其簡便的製造方法。SUMMARY OF THE INVENTION Problems to be Solved by the Invention The present invention has been made to solve the above problems, and its main object is to provide an image display device capable of maintaining excellent optical characteristics and preventing discoloration in a humidified environment and a simple manufacturing method thereof.

用以解決課題之手段 本發明之影像顯示裝置之製造方法包含以下步驟:準備偏光板與尺寸較該偏光板更大之基板;以該基板伸出該偏光板外周之方式,積層該基板與該偏光板;形成覆蓋該偏光板之周圍端面的密封部;及,保留自該偏光板之周圍端起算預定長度的伸出部分後裁切該基板及該密封部,製成預定尺寸。 在一實施形態中,上述基板為玻璃板。在另一實施形態中,上述基板為樹脂薄膜。 在一實施形態中,上述製造方法係以上述基板伸出構成上述偏光板外周的全部四邊之方式,積層該基板與該偏光板。 在一實施形態中,上述基板係選自液晶顯示裝置、有機EL顯示裝置及量子點顯示裝置中之影像顯示裝置的顯示單元基板。 在一實施形態中,上述裁切係藉由照射雷射光進行。 在一實施形態中,上述密封部在上述裁切後之伸出部分的長度為10μm~500μm。 在一實施形態中,上述裁切後之密封部的透濕度為300g/m2 /24hr以下。 根據本發明之另一面向,可提供一種影像顯示裝置。該影像顯示裝置具有:偏光板;基板,其具有自該偏光板之周圍端起算預定長度之伸出部分;密封部,其形成於該伸出部分且覆蓋該偏光板之周圍端面。Means for solving the problem The manufacturing method of the image display device of the present invention includes the following steps: preparing a polarizing plate and a substrate larger in size than the polarizing plate; and laminating the substrate and the substrate in such a manner that the substrate protrudes from the outer periphery of the polarizing plate. A polarizing plate; forming a sealing portion covering a peripheral end surface of the polarizing plate; and cutting the substrate and the sealing portion to a predetermined size after retaining a protruding portion of a predetermined length from the peripheral end of the polarizing plate. In one embodiment, the substrate is a glass plate. In another embodiment, the substrate is a resin film. In one embodiment, the manufacturing method is such that the substrate and the polarizing plate are laminated in such a manner that the substrate protrudes from all four sides constituting the outer periphery of the polarizing plate. In one embodiment, the substrate is a display unit substrate of an image display device selected from a liquid crystal display device, an organic EL display device, and a quantum dot display device. In one embodiment, the cutting is performed by irradiating laser light. In one embodiment, the length of the protruding portion of the sealing portion after the cutting is 10 μm to 500 μm. In one embodiment, the moisture permeability of the sealed portion after the cutting is 300 g / m 2 / 24hr or less. According to another aspect of the present invention, an image display device can be provided. The image display device includes: a polarizing plate; a substrate having a projecting portion having a predetermined length from a peripheral end of the polarizing plate; and a sealing portion formed on the projecting portion and covering a peripheral end surface of the polarizing plate.

發明效果 根據本發明,在影像顯示裝置之製造方法中,在基板之伸出偏光板之部分形成密封部密封偏光板之周圍端面,並將密封部及所對應之基板的伸出部分保留自該偏光板之周圍端起算預定長度後予以裁切,藉此即可簡便地製造出在加濕環境下仍可維持優異光學特性且褪色經防止之影像顯示裝置。ADVANTAGE OF THE INVENTION According to this invention, in the manufacturing method of an image display device, the sealing part is formed in the part which protrudes from a polarizing plate of a board | substrate, seals the peripheral end surface of a polarizing plate, and the sealing part and the corresponding protruding part of a board | substrate are retained from the The surrounding end of the polarizing plate is cut out after a predetermined length, thereby making it possible to easily manufacture an image display device that can maintain excellent optical characteristics and prevent fading in a humidified environment.

用以實施發明之形態 以下說明本發明之實施形態,惟本發明不受該等實施形態限定。Embodiments for Implementing the Invention Embodiments of the present invention will be described below, but the present invention is not limited to these embodiments.

A.影像顯示裝置之製造方法 本發明之影像顯示裝置之製造方法包含以下步驟:準備偏光板與尺寸較該偏光板更大之基板;以該基板伸出該偏光板外周之方式,積層該基板與該偏光板;形成覆蓋該偏光板之周圍端面的密封部;及,保留自該偏光板之周圍端起算預定長度的伸出部分後裁切該基板及該密封部,製成預定尺寸。A. Manufacturing method of image display device The manufacturing method of image display device of the present invention includes the following steps: preparing a polarizing plate and a substrate larger in size than the polarizing plate; and laminating the substrate in such a manner that the substrate protrudes from the outer periphery of the polarizing plate. And the polarizing plate; forming a sealing portion covering the peripheral end face of the polarizing plate; and cutting the substrate and the sealing portion to a predetermined size after retaining a protruding portion of a predetermined length from the peripheral end of the polarizing plate.

本發明可應用於影像顯示裝置之基板與偏光板的任意積層構造。基板在代表上可為影像顯示裝置之顯示單元基板。影像顯示裝置之代表例可舉如液晶顯示裝置、有機EL顯示裝置、量子點顯示裝置。顯示單元基板可舉例如液晶單元之基板、有機EL單元之基板、量子點顯示單元之基板、液晶顯示裝置上將彩色濾光片從兩面密封之基板。本發明之製造方法在一實施形態中,係將基板與偏光板積層,並於該積層體形成密封部而製作出附基板之偏光板後,將該附基板之偏光板作為顯示單元基板使用,藉此即可獲得影像顯示裝置。本發明之製造方法在另一實施形態中,係製作出顯示單元,並將偏光板積層於該顯示單元之基板,接著形成密封部,藉此即可獲得影像顯示裝置。以下作為代表例,說明將附基板之偏光板作為顯示單元基板使用之實施形態。The invention can be applied to any laminated structure of a substrate and a polarizing plate of an image display device. The substrate is representatively a display unit substrate of an image display device. Representative examples of the image display device include a liquid crystal display device, an organic EL display device, and a quantum dot display device. Examples of the display unit substrate include a substrate of a liquid crystal cell, a substrate of an organic EL unit, a substrate of a quantum dot display unit, and a substrate in which a color filter is sealed on both sides of a liquid crystal display device. In one embodiment of the manufacturing method of the present invention, a substrate with a polarizing plate is laminated, and a sealing portion is formed in the laminated body to prepare a polarizing plate with a substrate, and then the polarizing plate with the substrate is used as a display unit substrate. Thereby, an image display device can be obtained. In another embodiment of the manufacturing method of the present invention, a display unit is manufactured, a polarizing plate is laminated on a substrate of the display unit, and then a sealing portion is formed, thereby obtaining an image display device. Hereinafter, as a representative example, an embodiment in which a polarizing plate with a substrate is used as a display unit substrate will be described.

A-1.偏光板及基板之準備 首先,如圖1(a)所示準備偏光板10及基板20。以下針對偏光板及基板進行具體說明。A-1. Preparation of polarizing plate and substrate First, a polarizing plate 10 and a substrate 20 are prepared as shown in FIG. 1 (a). The polarizing plate and the substrate will be specifically described below.

A-1-1.偏光板 偏光板具有偏光膜及配置在偏光膜之至少單側的保護薄膜。在本發明之實施形態中,偏光膜係以含碘之聚乙烯醇系樹脂(以下稱作「PVA系樹脂」)薄膜所構成。當偏光膜含有碘時,設置密封部之效果會變得顯著。偏光膜之厚度代表上為8μm以下。當偏光膜含有碘,並且其厚度如上述般相當薄時,由於偏光膜中之碘密度會變高,且加濕會易使碘之穩定性下降,故設置密封部之效果會變得更為顯著。保護薄膜可配置在偏光膜的單側亦可配置在兩側。保護薄膜配置在偏光膜的單側時,可配置在顯示單元側,亦可配置在與顯示單元相反之側。實際使用上會設置黏著劑層作為偏光板之顯示單元側最外層,並將偏光板藉該黏著劑層貼合至顯示單元上。另,在本說明書中僅稱保護薄膜時,表示用以保護所述偏光膜之薄膜(偏光板之構成要素),與上述表面保護薄膜(作業時暫時保護偏光板之薄膜)有所不同。A-1-1. Polarizing plate A polarizing plate has a polarizing film and a protective film disposed on at least one side of the polarizing film. In the embodiment of the present invention, the polarizing film is made of a film of a polyvinyl alcohol-based resin (hereinafter referred to as "PVA-based resin") containing iodine. When the polarizing film contains iodine, the effect of providing a sealing portion becomes remarkable. The thickness of the polarizing film is typically 8 μm or less. When the polarizing film contains iodine and its thickness is quite thin as described above, the density of the iodine in the polarizing film will become higher, and the stability of iodine will be easily reduced by humidification, so the effect of providing the sealing portion will become more Significant. The protective film may be arranged on one side of the polarizing film or on both sides. When the protective film is disposed on one side of the polarizing film, it may be disposed on the display unit side or on the opposite side to the display unit. In practice, an adhesive layer is set as the outermost layer on the display unit side of the polarizing plate, and the polarizing plate is attached to the display unit by the adhesive layer. In addition, when only a protective film is referred to in this specification, it means that a film (a constituent element of a polarizing plate) for protecting the polarizing film is different from the surface protective film (a film that temporarily protects a polarizing plate during operation).

A-1-1-1.偏光膜 偏光膜如上述係由含碘之PVA系樹脂薄膜構成。偏光膜可由單層之樹脂薄膜形成,亦可由二層以上之積層體形成。A-1-1-1. Polarizing film The polarizing film is composed of an iodine-containing PVA resin film as described above. The polarizing film may be formed of a single-layer resin film or a laminated body of two or more layers.

由單層樹脂薄膜形成之偏光膜的具體例,可舉如利用碘或二色性染料等二色性物質對聚乙烯醇(PVA)系薄膜、部分縮甲醛化PVA系薄膜、乙烯・乙酸乙烯酯共聚物系部分皂化薄膜等親水性高分子薄膜施予染色處理及延伸處理者,以及PVA之脫水處理物或聚氯乙烯之脫鹽酸處理物等多烯系配向薄膜等。若從光學特性優異的觀點來看,宜使用以碘將PVA系薄膜染色並進行單軸延伸所得的偏光膜。上述利用碘之染色譬如可將PVA系薄膜浸漬於碘水溶液中來進行。上述單軸延伸之延伸倍率宜為3~7倍。延伸可在染色處理後進行,亦可在染色的同時進行。又,亦可延伸後再染色。可因應需求對PVA系薄膜施行膨潤處理、交聯處理、洗淨處理、乾燥處理等。譬如,在染色前將PVA系薄膜浸漬於水進行水洗,不僅可洗淨PVA系薄膜表面的污垢或抗黏結劑,還可使PVA系薄膜膨潤,從而防止染色不均等。Specific examples of the polarizing film formed of a single-layer resin film include a polyvinyl alcohol (PVA) film, a partially formalized PVA film, and ethylene / vinyl acetate using a dichroic substance such as iodine or a dichroic dye. Ester copolymers are partially dyed and extended by hydrophilic polymer films such as saponified films, and polyene-based alignment films such as PVA dehydrated products or polyvinyl chloride dehydrochlorinated products. From the viewpoint of excellent optical characteristics, it is preferable to use a polarizing film obtained by dyeing a PVA-based film with iodine and uniaxially stretching it. The above dyeing with iodine can be performed, for example, by immersing a PVA-based film in an iodine aqueous solution. The stretching ratio of the above uniaxial stretching is preferably 3 to 7 times. The elongation may be performed after the dyeing treatment or at the same time as the dyeing. It can also be dyed after stretching. Swelling treatment, cross-linking treatment, washing treatment, drying treatment, etc. can be applied to PVA-based films according to demand. For example, immersing a PVA-based film in water and washing it before dyeing can not only remove dirt or anti-adhesive agent on the surface of the PVA-based film, but also swell the PVA-based film, thereby preventing uneven dyeing.

使用積層體而獲得之偏光膜的具體例,可舉出樹脂基材與積層在該樹脂基材之PVA系樹脂層(PVA系樹脂薄膜)的積層體,或者是使用樹脂基材及塗佈形成於該樹脂基材之PVA系樹脂層的積層體而獲得之偏光膜。使用樹脂基材及塗佈形成於該樹脂基材之PVA系樹脂層的積層體而獲得之偏光膜,例如可以藉由以下來製作:將PVA系樹脂溶液塗佈於樹脂基材,並使其乾燥而於樹脂基材上形成PVA系樹脂層,以獲得樹脂基材與PVA系樹脂層的積層體;以及將該積層體延伸及染色而將PVA系樹脂層製成偏光膜。本實施形態中,延伸代表上包含使積層體浸漬於硼酸水溶液中而進行延伸。並且,視需要,延伸可更進一步包含在硼酸水溶液中進行延伸前在高溫(例如95℃以上)下將積層體進行空中延伸。可以直接使用所得樹脂基材/偏光膜之積層體(即,可將樹脂基材作為偏光膜之保護薄膜),亦可從樹脂基材/偏光件之積層體剝離樹脂基材並於該剝離面視目的積層任意且適當的保護薄膜後來使用。所述偏光膜之製造方法的詳細內容,例如記載於日本專利特開2012-73580號公報。本說明書中援用該公報之其整體的記載作為參考。Specific examples of the polarizing film obtained by using a laminate include a laminate of a resin substrate and a PVA-based resin layer (PVA-based resin film) laminated on the resin substrate, or a resin substrate and coating A polarizing film obtained by laminating a PVA-based resin layer on the resin substrate. A polarizing film obtained by using a resin substrate and a laminate of a PVA-based resin layer formed on the resin substrate can be produced, for example, by applying a PVA-based resin solution to the resin substrate and Forming a PVA-based resin layer on the resin substrate by drying to obtain a laminate of the resin substrate and the PVA-based resin layer; and extending and dyeing the laminate to form a PVA-based resin layer as a polarizing film. In the present embodiment, stretching means that the laminated body is immersed in an aqueous boric acid solution to perform stretching. In addition, if necessary, the stretching may further include performing air stretching at a high temperature (for example, 95 ° C. or higher) before performing the stretching in a boric acid aqueous solution. The obtained resin substrate / polarizing film laminate can be directly used (that is, the resin substrate can be used as a protective film for polarizing films), or the resin substrate can be peeled from the resin substrate / polarizing film laminate and applied to the peeling surface. Depending on the purpose, an optional and appropriate protective film is later used. Details of the method for producing the polarizing film are described in, for example, Japanese Patent Laid-Open No. 2012-73580. The entire description of the publication is referred to in this specification as a reference.

用以形成上述PVA系樹脂薄膜之PVA系樹脂可採用任意且適當之樹脂。可舉例如聚乙烯醇、乙烯-乙烯醇共聚物。聚乙烯醇可藉由將聚乙酸乙烯酯皂化而得。乙烯-乙烯醇共聚物可藉由將乙烯-乙酸乙烯酯共聚物皂化而得。PVA系樹脂之皂化度通常為85莫耳%~100莫耳%,宜為95.0莫耳%~99.9莫耳%,更宜為99.0莫耳%~99.5莫耳%。皂化度係依JIS K 6726-1994而求得。藉由使用所述皂化度的PVA系樹脂,可獲得耐久性優異的偏光膜。皂化度太高時,會有膠化之虞。The PVA-based resin used to form the PVA-based resin film may be any appropriate resin. Examples thereof include polyvinyl alcohol and ethylene-vinyl alcohol copolymer. Polyvinyl alcohol can be obtained by saponifying polyvinyl acetate. The ethylene-vinyl alcohol copolymer can be obtained by saponifying an ethylene-vinyl acetate copolymer. The saponification degree of PVA resin is usually 85 mol% to 100 mol%, preferably 95.0 mol% to 99.9 mol%, and more preferably 99.0 mol% to 99.5 mol%. The degree of saponification is determined in accordance with JIS K 6726-1994. By using the PVA-based resin having the saponification degree, a polarizing film having excellent durability can be obtained. When the saponification degree is too high, there is a risk of gelation.

PVA系樹脂的平均聚合度可按目的適當選擇。平均聚合度通常為1000~10000,宜為1200~5000,更宜為1500~4500。另,平均聚合度可按JIS K 6726-1994而求得。The average degree of polymerization of the PVA-based resin can be appropriately selected according to the purpose. The average degree of polymerization is usually 1000 to 10,000, preferably 1200 to 5000, and more preferably 1500 to 4500. The average degree of polymerization can be obtained in accordance with JIS K 6726-1994.

如上所述,偏光膜含有碘。偏光膜實質上係一碘經吸附配向之PVA系樹脂薄膜。PVA系樹脂薄膜中之碘濃度,舉例而言為5.0重量%~12.0重量%。又,PVA系樹脂薄膜中之硼酸濃度,舉例而言為12重量%~25重量%。As described above, the polarizing film contains iodine. The polarizing film is essentially a PVA-based resin film in which iodine is aligned by adsorption. The iodine concentration in the PVA-based resin film is, for example, 5.0% by weight to 12.0% by weight. The boric acid concentration in the PVA-based resin film is, for example, 12 to 25% by weight.

偏光膜之厚度如上述代表上為8μm以下,且宜為7μm以下,較宜為6μm以下。另一方面,PVA系樹脂薄膜之厚度宜為1.0μm以上,且較宜為2.0μm以上。As described above, the thickness of the polarizing film is 8 μm or less, preferably 7 μm or less, and more preferably 6 μm or less. On the other hand, the thickness of the PVA-based resin film is preferably 1.0 μm or more, and more preferably 2.0 μm or more.

上述偏光膜宜於380nm~780nm之任意波長下展現吸收二色性。偏光膜之單體透射率宜為40.0%~46.0%,更宜為41.0%~45.0%。偏光膜之偏光度以99.9%以上為宜,以99.95%以上為佳,以99.98%以上更佳。將偏光板應用於反射型液晶顯示裝置或有機EL顯示裝置時,偏光膜之偏光度以90%以上為宜,以93%以上為佳,以95%以上為更佳。如後述,藉由設置覆蓋含有偏光膜之影像顯示面板四周端面的密封部,可兼具所述的優異光學特性(單體透射率及偏光度之平衡佳)及優異的耐久性(即使在加濕環境下仍可維持所述的優異光學特性)。The polarizing film is suitable to exhibit absorption dichroism at any wavelength from 380nm to 780nm. The single transmittance of the polarizing film is preferably 40.0% to 46.0%, and more preferably 41.0% to 45.0%. The polarization degree of the polarizing film is preferably 99.9% or more, more preferably 99.95% or more, and more preferably 99.98% or more. When a polarizing plate is applied to a reflective liquid crystal display device or an organic EL display device, the polarization degree of the polarizing film is preferably 90% or more, more preferably 93% or more, and more preferably 95% or more. As will be described later, by providing a sealing portion covering the end surface around the periphery of the image display panel containing the polarizing film, it is possible to have both the excellent optical characteristics (the balance between the single transmittance and the polarization degree) and excellent durability (even in The excellent optical characteristics are maintained in a wet environment).

A-1-1-2.保護薄膜 保護薄膜係以可作為偏光膜之保護薄膜使用的任意且適當的薄膜構成。作為該薄膜之主成分的材料之具體例,可舉出三乙醯纖維素(TAC)等之纖維素樹脂、聚脂系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降莰烯系、聚烯烴系、(甲基)丙烯酸系及乙酸酯系等之透明樹脂等。又,亦可舉出(甲基)丙烯酸系、胺甲酸酯系、(甲基)丙烯酸胺甲酸酯系、環氧系、聚矽氧系等熱硬化型樹脂或紫外線硬化型樹脂等。其他亦可舉出例如矽氧烷系聚合物等之玻璃質系聚合物。並且,亦可使用日本專利特開2001-343529號公報(WO01/37007)所記載之聚合物薄膜。作為該薄膜之材料,例如可以使用含有在側鏈具有取代或非取代之醯亞胺基的熱可塑性樹脂與在側鏈具有取代或非取代之苯基及腈基的熱可塑性樹脂之樹脂組成物,且例如可舉出具有由異丁烯與N-甲基馬來醯亞胺構成之交替共聚物及丙烯腈-苯乙烯共聚物之樹脂組成物。該聚合物薄膜例如可為上述樹脂組成物之擠製成形物。A-1-1-2. Protective film The protective film is composed of an arbitrary and appropriate film that can be used as a protective film for a polarizing film. Specific examples of the material of the main component of the film include cellulose resins such as triethylammonium cellulose (TAC), polyester-based, polyvinyl alcohol-based, polycarbonate-based, polyamide-based, and polyfluorene. Transparent resins such as imine, polyether fluorene, polyfluorene, polystyrene, polynorbornene, polyolefin, (meth) acrylic and acetate. In addition, thermosetting resins such as (meth) acrylic, urethane, urethane, (meth) acrylic, epoxy, and polysiloxane, and ultraviolet curable resins can also be mentioned. Other examples include glassy polymers such as siloxane polymers. In addition, a polymer film described in Japanese Patent Laid-Open No. 2001-343529 (WO01 / 37007) may be used. As the material of the film, for example, a resin composition containing a thermoplastic resin having a substituted or unsubstituted fluorene imine group in a side chain and a thermoplastic resin having a substituted or unsubstituted phenyl group and a nitrile group in a side chain can be used. In addition, for example, a resin composition having an alternating copolymer composed of isobutylene and N-methylmaleimide and an acrylonitrile-styrene copolymer can be cited. The polymer film may be, for example, an extruded shape of the resin composition.

在本發明之實施形態中,如上述亦可將製造偏光板時使用之樹脂基材直接當作保護薄膜使用。In the embodiment of the present invention, as described above, the resin substrate used in manufacturing the polarizing plate may be directly used as a protective film.

在配置在視辨側之偏光板中,保護薄膜被配置在偏光膜之視辨側時,亦可視需求對保護薄膜施行硬塗處理、抗反射處理、抗黏附處理、防眩處理等表面處理。In the polarizing plate disposed on the viewing side, when the protective film is disposed on the viewing side of the polarizing film, the protective film may also be subjected to surface treatments such as hard coating treatment, anti-reflection treatment, anti-adhesion treatment, and anti-glare treatment as required.

只要可獲得本發明之效果,保護薄膜之厚度即可採用任意且適當之厚度。保護薄膜之厚度譬如為10μm~40μm,且宜為10μm~30μm。此外,當有施行表面處理時,保護薄膜之厚度是包含表面處理層之厚度的厚度。As long as the effect of the present invention is obtained, the thickness of the protective film may be any arbitrary and appropriate thickness. The thickness of the protective film is, for example, 10 μm to 40 μm, and preferably 10 μm to 30 μm. In addition, when a surface treatment is performed, the thickness of the protective film is a thickness including the thickness of the surface treatment layer.

於偏光膜之顯示單元側配置保護薄膜(內側保護薄膜)時,在一實施形態中,該內側保護薄膜於光學上宜為各向同性。本說明書中「在光學上為各向同性」意指面內相位差Re(550)為0nm~10nm,且厚度方向之相位差Rth(550)為-10nm~+10nm。內側保護薄膜之Re(550)以0nm~8nm為宜,以0nm~6nm為佳,以0nm~3nm為更佳。內側保護薄膜之Rth(550)以-8nm~+8nm為宜,以-6nm~+6nm為佳,以-3nm~+3nm為更佳。另外,「Re(550)」係於23℃下以波長550nm之光測得之面內相位差。Re(550)可於令層(薄膜)之厚度為d(nm)時,藉由式:Re=(nx-ny)×d求得。又,「Rth(550)」係於23℃下以波長550nm之光測得之厚度方向的相位差。Rth(λ)可於令層(薄膜)厚度為d(nm)時,藉由式:Rth=(nx-nz)×d求得。When a protective film (inner protective film) is disposed on the display unit side of the polarizing film, in one embodiment, the inner protective film is preferably optically isotropic. In this specification, "optically isotropic" means that the in-plane retardation Re (550) is 0 nm to 10 nm, and the retardation Rth (550) in the thickness direction is -10 nm to +10 nm. The Re (550) of the inner protective film is preferably 0 nm to 8 nm, preferably 0 nm to 6 nm, and more preferably 0 nm to 3 nm. The Rth (550) of the inner protective film is preferably -8nm ~ + 8nm, more preferably -6nm ~ + 6nm, more preferably -3nm ~ + 3nm. In addition, "Re (550)" is an in-plane phase difference measured with light having a wavelength of 550 nm at 23 ° C. Re (550) can be obtained by using the formula: Re = (nx-ny) × d when the thickness of the layer (thin film) is d (nm). In addition, "Rth (550)" is a phase difference in the thickness direction measured at 23 ° C with light having a wavelength of 550 nm. Rth (λ) can be obtained by using the formula: Rth = (nx-nz) × d when the thickness of the layer (thin film) is d (nm).

在其他實施形態中,內側保護薄膜亦可具有可作為所謂的λ/4板發揮功用的Re(550)。所述實施形態譬如可應用在偏光板作為圓偏光板發揮功用,作為反射型液晶顯示裝置或有機EL顯示裝置之抗反射薄膜使用的情況。此時,Re(550)宜為120nm~160nm,且較宜為約140nm。這時候,內側保護薄膜可配置成其慢軸相對於偏光膜之吸收軸宜構成40°~50°且較宜構成約45°之角度。In another embodiment, the inner protective film may have Re (550) which can function as a so-called λ / 4 plate. This embodiment can be applied to, for example, a case where a polarizing plate functions as a circular polarizing plate and is used as an anti-reflection film of a reflective liquid crystal display device or an organic EL display device. At this time, Re (550) is preferably 120 nm to 160 nm, and more preferably about 140 nm. At this time, the inner protective film may be configured such that its slow axis is preferably formed at an angle of about 40 ° to 50 ° with respect to the absorption axis of the polarizing film, and more preferably at an angle of about 45 °.

A-1-2.基板 基板可採用任意且適當之構成。舉例而言,基板可為玻璃板,亦可為樹脂薄膜。基板之尺寸較偏光板更大。當基板與偏光板積層時,基板宜具有伸出偏光板外周預定長度之尺寸,更宜具有伸出構成偏光板外周之全部四邊預定長度之尺寸。A-1-2. Substrate The substrate can have any arbitrary structure. For example, the substrate may be a glass plate or a resin film. The size of the substrate is larger than that of the polarizing plate. When the substrate and the polarizing plate are laminated, the substrate preferably has a size that extends a predetermined length from the outer periphery of the polarizing plate, and more preferably has a size that extends from all four sides constituting the outer periphery of the polarizing plate.

玻璃板可採用任意且適當之玻璃板。構成玻璃板之玻璃依據組成物來分類,可舉例如鈉鈣玻璃、硼酸玻璃、鋁矽酸鹽玻璃、石英玻璃。又,根據鹼性成分來分類可舉如無鹼玻璃、低鹼玻璃。玻璃之鹼金屬成分(例如Na2 O、K2 O、Li2 O)的含量宜為15重量%以下,更宜為10重量%以下。Any suitable glass plate can be used as the glass plate. The glass constituting the glass plate is classified according to the composition, and examples thereof include soda lime glass, boric acid glass, aluminosilicate glass, and quartz glass. Examples of the classification based on the alkaline component include alkali-free glass and low-alkali glass. The content of the alkali metal component (for example, Na 2 O, K 2 O, Li 2 O) of the glass is preferably 15% by weight or less, and more preferably 10% by weight or less.

玻璃板在波長550nm下之光透射率宜為85%以上。玻璃板在波長550nm下之折射率宜為1.4~1.65。玻璃板之密度宜為2.3g/cm3 ~3.0g/cm3 ,更宜為2.3g/cm3 ~2.7g/cm3The light transmittance of the glass plate at a wavelength of 550 nm should be more than 85%. The refractive index of the glass plate at a wavelength of 550nm should be 1.4 ~ 1.65. The density of the glass plate is preferably 2.3 g / cm 3 to 3.0 g / cm 3 , and more preferably 2.3 g / cm 3 to 2.7 g / cm 3 .

玻璃板之厚度宜為0.1mm~1.0mm,較宜為0.2mm~0.6mm。The thickness of the glass plate should be 0.1mm ~ 1.0mm, more preferably 0.2mm ~ 0.6mm.

玻璃板可直接使用市售之玻璃板,亦可將市售之玻璃板研磨成所期望之厚度後使用。市售之玻璃板可舉例如康寧公司製「7059」、「1737」或「EAGLE2000」、AGC公司製「AN100」、NH Techno Glass公司製「NA-35」、Nippon Electric Glass公司製「OA-10」、SCHOTT公司製「D263」或「AF45」。As the glass plate, a commercially available glass plate can be used directly, or a commercially available glass plate can be ground to a desired thickness and used. Commercially available glass plates include, for example, "7059", "1737" or "EAGLE2000" manufactured by Corning Corporation, "AN100" manufactured by AGC, "NA-35" manufactured by NH Techno Glass, and "OA-10" manufactured by Nippon Electric Glass. "," D263 "or" AF45 "made by SCHOTT.

樹脂薄膜可採用任意且適當之樹脂薄膜。樹脂薄膜在代表上為透明樹脂薄膜。構成樹脂薄膜之材料可舉例如聚醯亞胺、聚醯胺醯亞胺。該等可單獨使用,也可組合使用。Any appropriate resin film can be used as the resin film. The resin film is typically a transparent resin film. Examples of the material constituting the resin film include polyimide and polyimide. These can be used alone or in combination.

樹脂薄膜之厚度宜為10μm~200μm,更宜為20μm~100μm。The thickness of the resin film is preferably 10 μm to 200 μm, and more preferably 20 μm to 100 μm.

A-2.偏光板與基板之積層 接著,如圖1(a)所示積層偏光板10與基板20。偏光板10與基板20在代表上可透過任意且適當之黏著劑層(未示於圖式中)來積層。積層係如圖1(a)所示,以基板伸出偏光板外周之方式來進行,宜以基板伸出構成偏光板外周之全部四邊之方式來進行。A-2. Lamination of polarizing plate and substrate Next, the polarizing plate 10 and the substrate 20 are laminated as shown in Fig. 1 (a). The polarizing plate 10 and the substrate 20 are representatively laminated through an arbitrary and appropriate adhesive layer (not shown in the drawings). As shown in FIG. 1 (a), the lamination is performed by the substrate protruding from the outer periphery of the polarizing plate, and preferably by the substrate protruding from all four sides constituting the outer periphery of the polarizing plate.

因應需要,亦可在偏光板10之與基板20相反之側的表面暫時附著有表面保護薄膜(未示於圖式中)。藉此,在後述的密封部之形成以及該密封部及基板之裁切時,偏光板可受到適當保護。表面保護薄膜在最後使用附基板之偏光板(實質上為影像顯示裝置)時會被剝離去除。表面保護薄膜之剝離去除可在密封部之形成以及密封部及基板之裁切後於任意且適當之時機進行。If necessary, a surface protection film (not shown in the drawings) may be temporarily attached to the surface of the polarizing plate 10 on the side opposite to the substrate 20. Thereby, the polarizing plate can be appropriately protected during the formation of the sealing portion described later and the cutting of the sealing portion and the substrate. The surface protection film is peeled off when the polarizing plate (substantially an image display device) with a substrate is finally used. The peeling and removal of the surface protection film can be performed at an arbitrary and appropriate timing after the formation of the sealing portion and the cutting of the sealing portion and the substrate.

A-3.密封部之形成 接著,如圖1(b)所示形成覆蓋偏光板10之周圍端面的密封部30。以密封部覆蓋偏光板之周圍端面,即可在加濕環境下仍維持偏光板(偏光膜)之光學特性,結果可提升影像顯示裝置之耐久性。因此,密封部宜具有障蔽功能。本說明書中「具有障蔽功能」意指可控制進入偏光膜之氧及/或水蒸氣之透過量,以實質上使偏光膜與其等隔絕。A-3. Formation of Sealing Portion Next, as shown in FIG. 1 (b), a sealing portion 30 is formed to cover the peripheral end surface of the polarizing plate 10. Covering the peripheral end surface of the polarizing plate with the sealing portion can maintain the optical characteristics of the polarizing plate (polarizing film) in a humidified environment, and as a result, the durability of the image display device can be improved. Therefore, the sealing portion should have a shielding function. In the present specification, “having a barrier function” means that the amount of oxygen and / or water vapor entering the polarizing film can be controlled to substantially isolate the polarizing film from the polarizing film and the like.

密封部在代表上係透過將黏著劑組成物配置成覆蓋偏光板之周圍端面來形成。在一實施形態中,可將黏著劑組成物配置(例如塗佈、配置片狀黏著劑)於基板之伸出部分來形成密封部。密封部係覆蓋偏光板之周圍端面且只要有密封該周圍端面即可,並無密著於該周圍端面之必要。又,密封部只要有覆蓋偏光板之周圍端面即可,因此亦可在覆蓋周圍端面的同時亦覆蓋周圍端面以外之部分。舉例而言,密封部亦可在覆蓋周圍端面的同時亦覆蓋偏光板之遠離基板之側的面(在圖式中為上表面)。此時,該面可整體被覆蓋,也可只預定部分被覆蓋。The sealing portion is formed by disposing the adhesive composition so as to cover the peripheral end surface of the polarizing plate. In one embodiment, the adhesive composition may be disposed (for example, coated or disposed with a sheet-shaped adhesive) on the protruding portion of the substrate to form a sealing portion. The sealing portion covers the peripheral end surface of the polarizing plate and only needs to seal the peripheral end surface, and there is no need to closely adhere to the peripheral end surface. In addition, the sealing portion only needs to cover the peripheral end surface of the polarizing plate. Therefore, it is possible to cover the peripheral end surface as well as the portion other than the peripheral end surface. For example, the sealing portion may cover the peripheral end surface as well as the surface (upper surface in the drawing) of the side of the polarizing plate facing away from the substrate. At this time, the surface may be covered as a whole or only a predetermined portion may be covered.

黏著劑組成物可舉例如以橡膠系聚合物作為基底聚合物之橡膠系黏著劑組成物。Examples of the adhesive composition include a rubber-based adhesive composition using a rubber-based polymer as a base polymer.

橡膠系聚合物可舉例如:1種共軛二烯化合物聚合而得之共軛二烯系聚合物、2種以上共軛二烯化合物聚合而得之共軛二烯系共聚物、共軛二烯化合物與芳香族乙烯基化合物共聚而得之共軛二烯系共聚物、以及其等之氫化物。Examples of the rubber-based polymer include a conjugated diene polymer obtained by polymerizing one conjugated diene compound, a conjugated diene polymer obtained by polymerizing two or more conjugated diene compounds, and a conjugated diene. A conjugated diene copolymer obtained by copolymerizing an olefin compound and an aromatic vinyl compound, and a hydride thereof.

共軛二烯化合物只要是具有可進行聚合之共軛二烯的單體即無特別限定。共軛二烯化合物之具體例可舉如:1,3-丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯、3-甲基-1,3-戊二烯、1,3-庚二烯、1,3-己二烯。該等之中,由工業上取得之容易度之觀點視之,又以1,3-丁二烯、異戊二烯為佳。共軛二烯化合物可單獨使用,也可組合使用。The conjugated diene compound is not particularly limited as long as it is a monomer having a conjugated diene that can be polymerized. Specific examples of the conjugated diene compound include: 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 3 -Methyl-1,3-pentadiene, 1,3-heptadiene, 1,3-hexadiene. Among them, 1,3-butadiene and isoprene are preferred from the standpoint of industrial availability. The conjugated diene compounds may be used alone or in combination.

芳香族乙烯基化合物只要是具有可與共軛二烯化合物共聚之芳香族乙烯基結構之單體即無特別限定。芳香族乙烯基化合物之具體例可舉如:苯乙烯、對甲基苯乙烯、α-甲基苯乙烯、乙烯基乙基苯、乙烯基二甲苯、乙烯基萘、二苯基乙烯等。該等之中,由工業上取得之容易度之觀點視之,又以苯乙烯為佳。芳香族乙烯基化合物可單獨使用,也可組合使用。The aromatic vinyl compound is not particularly limited as long as it is a monomer having an aromatic vinyl structure that can be copolymerized with a conjugated diene compound. Specific examples of the aromatic vinyl compound include styrene, p-methylstyrene, α-methylstyrene, vinylethylbenzene, vinylxylene, vinylnaphthalene, and diphenylethylene. Among these, from the viewpoint of industrial ease of access, styrene is preferred. The aromatic vinyl compounds may be used alone or in combination.

二烯系共聚物可以是無規共聚物,也可以是嵌段共聚物。又,也可使共軛二烯化合物、芳香族乙烯基化合物以外之化合物共聚來取得二烯系共聚物。The diene copolymer may be a random copolymer or a block copolymer. Further, a compound other than the conjugated diene compound and the aromatic vinyl compound may be copolymerized to obtain a diene-based copolymer.

共軛二烯化合物與芳香族乙烯基化合物共聚而得之共軛二烯系共聚物,其共軛二烯化合物與芳香族乙烯基化合物之莫耳比宜為共軛二烯化合物/芳香族乙烯基化合=10/90~90/10(莫耳%)。The molar ratio of the conjugated diene compound and the aromatic vinyl compound to a conjugated diene copolymer obtained by copolymerizing a conjugated diene compound and an aromatic vinyl compound is preferably a conjugated diene compound / aromatic ethylene Basic compound = 10/90 ~ 90/10 (mole%).

此種共軛二烯系(共)聚合物之具體例可舉如:丁二烯橡膠(BR)、異戊二烯橡膠(IR)、苯乙烯-丁二烯共聚物(SBR)、丁二烯-異戊二烯-苯乙烯無規共聚物、異戊二烯-苯乙烯無規共聚物、苯乙烯-異戊二烯嵌段共聚物(SIS)、丁二烯-苯乙烯共聚物、苯乙烯-乙烯-丁二烯嵌段共聚物(SEBS)、丙烯腈-丁二烯橡膠(NBR)。該等可單獨使用,也可組合使用。該等中又以異戊二烯-苯乙烯共聚物為佳。又,也可適用該等之氫化物。Specific examples of such conjugated diene-based (co) polymers include butadiene rubber (BR), isoprene rubber (IR), styrene-butadiene copolymer (SBR), butadiene Ene-isoprene-styrene random copolymer, isoprene-styrene random copolymer, styrene-isoprene block copolymer (SIS), butadiene-styrene copolymer, Styrene-ethylene-butadiene block copolymer (SEBS), acrylonitrile-butadiene rubber (NBR). These can be used alone or in combination. Among these, an isoprene-styrene copolymer is preferable. It is also possible to apply such hydrides.

橡膠系聚合物除了共軛二烯系(共)聚合物之外,亦可使用異丁烯(IB)、苯乙烯-異丁烯-苯乙烯嵌段共聚物(SIBS)、苯乙烯-乙烯丙烯共聚物-苯乙烯嵌段共聚物等。橡膠系聚合物可單獨使用,也可組合使用。In addition to conjugated diene-based (co) polymers, rubber-based polymers can also use isobutylene (IB), styrene-isobutylene-styrene block copolymer (SIBS), and styrene-ethylene-propylene copolymer-benzene. Ethylene block copolymers and the like. The rubber-based polymer may be used alone or in combination.

本發明中可使用之橡膠系聚合物,宜在橡膠系聚合物整體中含有50重量%以上之上述共軛二烯系(共)聚合物,且以含70重量%以上為佳,80重量%以上更佳,90重量%以上特佳。共軛二烯系(共)聚合物之含量上限並無特別限制,也可為100重量%(亦即僅由共軛二烯系(共)聚合物構成之橡膠系聚合物)。The rubber-based polymer usable in the present invention preferably contains 50% by weight or more of the above conjugated diene-based (co) polymer in the entire rubber-based polymer, and preferably contains 70% by weight or more, and 80% by weight. The above is more preferable, and more than 90% by weight is particularly preferable. The upper limit of the content of the conjugated diene-based (co) polymer is not particularly limited, and may be 100% by weight (that is, a rubber-based polymer composed of only a conjugated diene-based (co) polymer).

如上所述,黏著劑組成物係含有橡膠系聚合物作為基底聚合物。黏著劑組成物中橡膠系聚合物之含量以40重量%以上為宜、以50重量%以上為佳、以60重量%以上更佳。橡膠系聚合物之含量上限並無特別限定,舉例而言為90重量%以下。As described above, the adhesive composition system contains a rubber-based polymer as a base polymer. The content of the rubber-based polymer in the adhesive composition is preferably 40% by weight or more, more preferably 50% by weight or more, and more preferably 60% by weight or more. The upper limit of the content of the rubber-based polymer is not particularly limited, and is, for example, 90% by weight or less.

黏著劑組成物除了橡膠系聚合物之外,也可更含有任意且適當之添加劑。添加劑之具體例可舉如:交聯劑(例如聚異氰酸酯、環氧化合物、烷基醚化三聚氰胺化合物等)、增黏劑(例如松香衍生物樹脂、多萜樹脂、石油樹脂、脂溶性酚樹脂、乙烯基甲苯樹脂等)、可塑劑、填充劑(例如層狀矽酸鹽、黏土材料等)、抗氧化劑。添加於黏著劑組成物中之添加劑種類、組合、添加量等,可按目的作適當設定。黏著劑組成物中之添加劑含量(總量)以60重量%以下為宜、以50重量%以下為佳、以40重量%以下為更佳。The adhesive composition may contain an arbitrary and appropriate additive in addition to the rubber-based polymer. Specific examples of the additive include a cross-linking agent (for example, polyisocyanate, epoxy compound, alkyl etherified melamine compound, etc.), and a tackifier (for example, rosin derivative resin, polyterpene resin, petroleum resin, and fat-soluble phenol resin). , Vinyl toluene resin, etc.), plasticizers, fillers (such as layered silicate, clay materials, etc.), antioxidants. The type, combination, and amount of additives to be added to the adhesive composition can be appropriately set according to the purpose. The additive content (total amount) in the adhesive composition is preferably 60% by weight or less, more preferably 50% by weight or less, and even more preferably 40% by weight or less.

以所述方式形成之密封部30的厚度宜為30μm~1000μm,較宜為50μm~500μm。在本說明書中「密封部的厚度」之意義只要無明確記載,即指自偏光板之周圍端面向外側延伸之方向的厚度(亦即,密封部的厚度係對應於基板的伸出部分之長度)。The thickness of the sealing portion 30 formed in the above manner is preferably 30 μm to 1000 μm, and more preferably 50 μm to 500 μm. In this specification, the meaning of "thickness of the sealing portion" means the thickness in a direction extending outward from the peripheral end of the polarizing plate as long as there is no explicit description (that is, the thickness of the sealing portion corresponds to the length of the protruding portion of the substrate). ).

A-4.密封部及基板之裁切 接著,如圖1(c)所示,保留自偏光板之周圍端起算預定長度的伸出部分後裁切密封部30及基板20。結果,如圖1(d)所示,形成具有預定厚度之密封部40。密封部40在裁切後之厚度宜為10μm~500μm,且較宜為20μm~300μm。A-4. Cutting of the sealing portion and the substrate Next, as shown in FIG. 1 (c), the sealing portion 30 and the substrate 20 are cut after retaining a protruding portion of a predetermined length from the peripheral end of the polarizing plate. As a result, as shown in FIG. 1 (d), a sealing portion 40 having a predetermined thickness is formed. The thickness of the sealing portion 40 after cutting is preferably 10 μm to 500 μm, and more preferably 20 μm to 300 μm.

裁切可以機械式進行,亦可藉由照射雷射光進行。Cutting can be performed mechanically or by laser light.

機械式裁切可列舉研磨加工、端銑刀加工。Examples of the mechanical cutting include grinding and end milling.

雷射光宜含有波長至少1500nm以下之光。雷射光較宜含有波長100pm~1000nm之光,更宜含有波長400nm~900nm之光,尤宜含有波長420nm~680nm之光。在一實施形態中,雷射光在上述之範圍內具有峰值波長(peak wavelength)。藉由含有所述波長之雷射光,可遍及密封部的上下厚度方向進行良好裁切。Laser light should preferably contain light with a wavelength of at least 1500 nm. Laser light preferably contains light with a wavelength of 100pm ~ 1000nm, more preferably contains light with a wavelength of 400nm ~ 900nm, and more preferably contains light with a wavelength of 420nm ~ 680nm. In one embodiment, the laser light has a peak wavelength within the above range. With the laser light having the above-mentioned wavelength, good cutting can be performed throughout the vertical thickness direction of the sealing portion.

雷射可舉如YAG雷射、YLF雷射、YVO4雷射、鈦藍寶石雷射等固體雷射、包含氬離子雷射、氪離子雷射之氣體雷射、光纖雷射、半導體雷射、染料雷射。且宜使用固體雷射。Lasers include solid lasers such as YAG lasers, YLF lasers, YVO4 lasers, titanium sapphire lasers, gas lasers including argon ion lasers, krypton ion lasers, fiber lasers, semiconductor lasers, dyes Laser. And solid lasers should be used.

上述雷射宜使用短脈衝雷射(照射具有1奈秒以下脈寬之光的雷射,譬如皮秒雷射或飛秒雷射等)。為了抑制對密封部的熱損,又以500皮秒以下(譬如10皮秒~50皮秒)之脈寬尤佳。藉由抑制熱損,可獲得平整、均勻且平滑的裁切面。The above-mentioned laser is preferably a short-pulse laser (a laser irradiating light having a pulse width of less than 1 nanosecond, such as a picosecond laser or a femtosecond laser). In order to suppress heat loss to the sealing portion, a pulse width of 500 picoseconds or less (for example, 10 picoseconds to 50 picoseconds) is particularly preferable. By suppressing heat loss, a flat, uniform and smooth cutting surface can be obtained.

雷射光之照射條件可設定為任意且適當的條件。譬如,使用固體雷射(YVO4雷射)時,脈衝能宜為10μJ~150μJ,且較宜為25μJ~71μJ。掃描速度宜為10mm/秒~10000mm/秒,較宜為100mm/秒~1000mm/秒。反覆頻率譬如為100Hz~12480Hz。掃描間隔宜為10μm~50μm。雷射光照射位置的波束形狀可因應目的適當設定。該波束形狀譬如可為圓形亦可為線狀。將波束形狀設為預定形狀之機構可採用任意且適當的機構。譬如,可隔著具有預定開口部的遮罩行雷射照射,亦可使用繞射光學元件等行波束形成(beam forming)。譬如,波束形狀為圓形時,焦點徑長(打點徑長)宜為50μm~60μm。此外,脈衝雷射之輸入能宜為20000μJ/mm2 ~100000μJ/mm2 ,較宜為25000μJ/mm2 ~75000μJ/mm2 。另,輸入能E(μJ/mm2 )可由下述式求得。 E=(e×M)/(V×p)   e:脈衝能(J)   M:反覆頻率(Hz)   V:掃描速度(mm/秒)   p:掃描間隔(mm)The irradiation conditions of the laser light can be set to arbitrary and appropriate conditions. For example, when using solid laser (YVO4 laser), the pulse energy should be 10μJ ~ 150μJ, and more preferably 25μJ ~ 71μJ. The scanning speed should be 10mm / second ~ 10000mm / second, more preferably 100mm / second ~ 1000mm / second. The repeated frequency is, for example, 100 Hz to 12480 Hz. The scanning interval should be 10μm ~ 50μm. The beam shape of the laser light irradiation position can be appropriately set according to the purpose. The beam shape may be circular or linear, for example. Any mechanism may be adopted as the mechanism for setting the beam shape to a predetermined shape. For example, laser irradiation may be performed through a mask having a predetermined opening, or beam forming such as a diffractive optical element may be used. For example, when the beam shape is circular, the focal length (dot diameter) is preferably 50 μm to 60 μm. In addition, the input energy of the pulse laser should preferably be 20,000 μJ / mm 2 to 100,000 μJ / mm 2 , and more preferably 25000 μJ / mm 2 to 75000 μJ / mm 2 . The input energy E (μJ / mm 2 ) can be obtained from the following formula. E = (e × M) / (V × p) e: Pulse energy (J) M: Repeat frequency (Hz) V: Scan speed (mm / s) p: Scan interval (mm)

雷射光之照射形態(掃描樣式)可因應目的適當設定。雷射光譬如可以直線狀掃描、可以S字形掃描、可以漩渦狀掃描,亦可以將該等組合。The irradiation pattern (scanning pattern) of the laser light can be appropriately set according to the purpose. Laser light can be scanned linearly, S-shaped, vortex, or a combination of these.

以上述方式形成之密封部40具有障壁性,代表上對水分及氣體(譬如氧)具有障壁性。密封部40於40℃、90%RH條件下之水蒸氣透過率(透濕度),以300g/m2 /24hr以下為宜,以100g/m2 /24hr以下為佳,以50g/m2 /24hr以下更佳,以25g/m2 /24hr以下特佳。透濕度之下限舉例而言為0.01g/m2 /24hr,以未達檢測極限為宜。只要密封部40之透濕度於如上所述之範圍內,即可良好地保護影像顯示面板免於與空氣中之水分及氧接觸。另,透濕度可準照JIS Z0208進行測定。The sealing portion 40 formed as described above has a barrier property, which means that it has a barrier property against moisture and gas (for example, oxygen). The water vapor transmission rate (moisture permeability) of the sealing part 40 under the conditions of 40 ° C and 90% RH is preferably 300 g / m 2 / 24hr or less, preferably 100 g / m 2 / 24hr or less, and 50 g / m 2 / It is more preferably less than 24hr, particularly preferably less than 25g / m 2 / 24hr. The lower limit of water vapor transmission rate is, for example, 0.01 g / m 2 / 24hr, and it is preferable that the detection limit is not reached. As long as the moisture permeability of the sealing portion 40 is within the range described above, the image display panel can be well protected from contact with moisture and oxygen in the air. The moisture permeability can be measured in accordance with JIS Z0208.

經由以上程序,如圖1(d)所示,可製作出具有預定尺寸之附基板之偏光板100。Through the above procedure, as shown in FIG. 1 (d), a polarizing plate 100 with a substrate having a predetermined size can be manufactured.

A-5.影像顯示裝置之製作 在本實施形態中,將經上述程序所獲得之附基板之偏光板作為顯示單元基板使用,即可獲得影像顯示裝置。若要製作液晶顯示裝置,則作為一例可採用如以下程序:(1)準備一對附基板之偏光板;(2)於其中一附基板之偏光板的基板表面設置切換元件(例如TFT),並於另一附基板之偏光板的基板表面設置彩色濾光片;(3)分別於各基板表面形成配向膜並對該配向膜施行配向處理;(4)使各基板呈相對向(將偏光板配置於外側)並隔著間隔物貼合附基板之偏光板;及(5)將液晶填入基板之間。經由以上程序可製得影像顯示裝置。A-5. Production of image display device In this embodiment, an image display device can be obtained by using a polarizing plate with a substrate obtained through the above procedure as a display unit substrate. To make a liquid crystal display device, the following procedures can be used as an example: (1) preparing a pair of polarizing plates with substrates; (2) setting a switching element (such as a TFT) on the substrate surface of one of the polarizing plates with substrates, A color filter is provided on the substrate surface of another polarizing plate with a substrate; (3) forming an alignment film on each substrate surface and performing alignment processing on the alignment film; (4) making each substrate face to face (The plate is disposed on the outside) and a polarizing plate attached to the substrate is bonded via a spacer; and (5) a liquid crystal is filled between the substrates. An image display device can be manufactured through the above procedures.

A-6.其他實施形態 至此已針對將附基板之偏光板作為顯示單元基板使用之實施形態進行了說明,但如上所述,本發明之製造方法可透過製作顯示單元並將偏光板積層於該顯示單元之基板上,接著形成密封部來獲得影像顯示裝置。在本實施形態中,作為一例可採用如以下程序: (a-1)準備一對基板;(a-2)於其中一基板表面設置切換元件(例如TFT),並於另一基板表面設置彩色濾光片;(a-3)分別於各基板表面形成配向膜並對該配向膜施行配向處理;(a-4)隔著間隔物貼合基板;及(a-5)將液晶填入基板間而製作出顯示單元; (b)以顯示單元伸出偏光板外周之方式(較佳係以顯示單元伸出構成偏光板外周之全部四邊之方式),將偏光板分別積層於各顯示單元之基板的外側; (c)形成覆蓋偏光板之周圍端面的密封部;及 (d)保留自偏光板之周圍端起算預定長度的伸出部分後裁切密封部及顯示單元周緣部。 經由以上程序可製得影像顯示裝置。另,步驟(b)~(d)之詳細內容係如同上述A-2項~A-4項所記載。又,顯示單元周緣部係已確保有裁切用之留白,以不受裁切帶來之不良影響。A-6. Other Embodiments So far, the embodiment in which a polarizing plate with a substrate is used as a display unit substrate has been described. However, as described above, the manufacturing method of the present invention can produce a display unit and laminate the polarizing plate on the display unit. A sealing portion is then formed on the substrate of the display unit to obtain an image display device. In this embodiment, as an example, the following procedures can be used: (a-1) preparing a pair of substrates; (a-2) providing a switching element (such as a TFT) on one substrate surface, and providing color on the other substrate surface Filters; (a-3) forming an alignment film on the surface of each substrate and performing alignment processing on the alignment film; (a-4) bonding the substrate through a spacer; and (a-5) filling the liquid crystal into the substrate (B) The display unit is protruded from the outer periphery of the polarizing plate (preferably the display unit is protruded from all four sides constituting the outer periphery of the polarizing plate), and the polarizing plates are laminated on the respective display units. The outer side of the substrate; (c) forming a sealing portion covering the peripheral end surface of the polarizing plate; and (d) cutting the sealing portion and the peripheral edge portion of the display unit after retaining a protruding portion of a predetermined length from the peripheral end of the polarizing plate. An image display device can be manufactured through the above procedures. The details of steps (b) to (d) are as described in the above items A-2 to A-4. In addition, the peripheral portion of the display unit has ensured that there is a blank space for cutting so as not to be adversely affected by cutting.

除上述說明之實施形態以外,本發明亦可應用於影像顯示裝置之基板與偏光板的任意積層構造,而此點對熟知此項技藝之人士而言不辯自明。只要閱讀本說明書,熟知此項技藝之人士即可將基板與偏光板之積層、密封部之形成以及密封部及基板之裁切應用於影像顯示裝置之基板與偏光板的任意積層構造。In addition to the embodiments described above, the present invention can also be applied to any laminated structure of a substrate and a polarizing plate of an image display device, and this point is self-evident to those skilled in the art. As long as this manual is read, those skilled in the art can apply the lamination of the substrate and the polarizing plate, the formation of the sealing portion and the cutting of the sealing portion and the substrate to any laminated structure of the substrate and the polarizing plate of the image display device.

B.影像顯示裝置 本發明之影像顯示裝置可透過上述A項所記載之製造方法來製得。因此,影像顯示裝置在代表上含有如圖1(d)所示之構造。具體而言,影像顯示裝置具有:偏光板;基板,其具有自該偏光板之周圍端起算預定長度之伸出部分;密封部,其形成於該伸出部分且覆蓋該偏光板之周圍端面。B. Image display device The image display device of the present invention can be manufactured by the manufacturing method described in the above item A. Therefore, the image display device typically includes a structure as shown in FIG. 1 (d). Specifically, the image display device includes: a polarizing plate; a substrate having a protruding portion having a predetermined length from a peripheral end of the polarizing plate; and a sealing portion formed on the protruding portion and covering a peripheral end surface of the polarizing plate.

影像顯示裝置保持在85℃及85%RH環境下120小時後之褪色量宜為100μm以下,較宜為50μm以下,更宜為30μm以下,尤宜為25μm以下。褪色量之下限以0為佳,在一實施形態中為5μm。褪色量係將影像顯示裝置代替品(實質上為附基板之偏光板)放置於85℃及85%RH之烘箱內120小時進行加濕之後,將其與標準偏光板配置成正交偏光之狀態後,以顯微鏡觀察端部之褪色狀態。具體而言,係測定從偏光板或從偏光膜端部算起之褪色的大小(褪色量:μm)。如圖2所示,係以延伸方向之從端部起算的褪色量a及與延伸方向為正交方向之從端部起算的褪色量b中,數值大者為褪色量。另,褪色區域的偏光特性明顯很低,無法實質上實踐作為偏光板的機能。因此,褪色量愈小愈佳。 實施例After the image display device is maintained at 85 ° C and 85% RH for 120 hours, the amount of discoloration should be 100 μm or less, more preferably 50 μm or less, more preferably 30 μm or less, and even more preferably 25 μm or less. The lower limit of the amount of fading is preferably 0, and is 5 μm in one embodiment. The amount of fading is after placing the image display device replacement (substantially a polarizing plate with a substrate) in an oven at 85 ° C and 85% RH for 120 hours for humidification, and then placing it in a state of orthogonal polarization with a standard polarizing plate. Then, the discoloration state of the end part was observed with a microscope. Specifically, the amount of fading (amount of fading: μm) measured from the polarizing plate or from the end of the polarizing film was measured. As shown in FIG. 2, the larger the value of the discoloration amount a from the end portion in the extension direction and the discoloration amount b from the end portion which is orthogonal to the extension direction, the larger the value. In addition, the polarization characteristics of the faded area are significantly low, and the function as a polarizing plate cannot be practically implemented. Therefore, the smaller the amount of fading, the better. Examples

以下,以實施例來具體說明本發明,惟本發明不受該等實施例限定。又,各特性之測定方法如以下所述。Hereinafter, the present invention will be specifically described with examples, but the present invention is not limited by these examples. The measurement method of each characteristic is as follows.

(1)厚度 使用數位測微器(Anritsu公司製KC-351C)進行測定。 (2)透濕度 使用實施例及比較例中所調製之黏著劑組成物,形成具有剝離襯墊/黏著劑層(具有實施例或比較例之厚度)/剝離襯墊之構成的黏著片。接著,剝除黏著片之其中一剝離襯材使黏著面露出後,透過該黏著面,將黏著片貼合於三乙醯纖維素薄膜(TAC薄膜,厚度:25μm,Konica Minolta(股)製)上,並裁切成10cmΦ之圓狀。最後,將另一剝離襯材剝除,即獲得測定用樣本。並對所獲得之測定用樣本以透濕度試驗方法(透濕杯法(cup method),依循JIS Z 0208)測定透濕度(水蒸氣透過率)。另外,測定條件如下所述。又,測定時使用了恆溫恆濕槽。 測定溫度:40℃ 相對濕度:92% 測定時間:24小時 (3)褪色量 將實施例及比較例中製得之附基板之偏光板作為影像顯示裝置代替品放置於85℃及85%RH之烘箱內120小時進行加濕之後,將其與標準偏光板配置成正交偏光之狀態後,以顯微鏡觀察了偏光膜端部之褪色狀態。具體而言,係測定了從偏光膜端部起算之褪色的大小(褪色量:μm)。顯微鏡係使用Olympus公司製之MX61L,並從以10倍之倍率下所拍攝之影像測定了褪色量。如圖2所示,係以延伸方向之從端部起算的褪色量a及與延伸方向為正交方向之從端部起算的褪色量b中,數值大者為褪色量。(1) Thickness was measured using a digital micrometer (KC-351C manufactured by Anritsu Corporation). (2) Moisture permeability Using the adhesive composition prepared in Examples and Comparative Examples, an adhesive sheet having a release liner / adhesive layer (having the thickness of the example or comparative example) / release liner was formed. Next, after peeling off one of the release liners of the adhesive sheet to expose the adhesive surface, the adhesive sheet was adhered to the triethyl cellulose film (TAC film, thickness: 25 μm, made by Konica Minolta) through the adhesive surface. And cut into a circular shape of 10 cmΦ. Finally, the other release liner is peeled off to obtain a measurement sample. The obtained sample for measurement was measured for water vapor transmission rate (water vapor transmission rate) by a water vapor transmission test method (cup method, in accordance with JIS Z 0208). The measurement conditions are as follows. A constant temperature and humidity tank was used for the measurement. Measurement temperature: 40 ° C Relative humidity: 92% Measurement time: 24 hours (3) Amount of discoloration The polarizing plate with a substrate prepared in the examples and comparative examples was placed at 85 ° C and 85% RH as a substitute for an image display device. After humidifying in the oven for 120 hours, the polarized film and the standard polarizing plate were placed in a state of orthogonal polarization, and then the discolored state of the end of the polarizing film was observed with a microscope. Specifically, the amount of discoloration (amount of discoloration: μm) from the end of the polarizing film was measured. The microscope used MX61L manufactured by Olympus, and the amount of fading was measured from an image taken at a magnification of 10 times. As shown in FIG. 2, the larger the value of the discoloration amount a from the end portion in the extension direction and the discoloration amount b from the end portion which is orthogonal to the extension direction, the larger the value.

[實施例1] 準備了厚度100μm、Tg75℃之具有7莫耳%異酞酸單元的非晶質聚對苯二甲酸乙二酯(IPA共聚PET)薄膜作為樹脂基材。並對該薄膜表面施行了電暈處理(55W/m2 /min)。 準備以1:9之比例含有乙醯乙醯基改質PVA(日本合成化學工業公司製,商品名:GOHSEFIMER(註冊商標)Z200)與PVA(平均聚合度:4200,皂化度:99.2莫耳%)之PVA系樹脂,並相對於100重量份之該PVA系樹脂,添加13重量份之碘化鉀,而調製出了PVA系樹脂水溶液(PVA系樹脂濃度:5.5重量%)。對樹脂基材的電暈處理面以乾燥後的膜厚成為13μm的方式塗佈該水溶液,並在60℃的氣體環境下利用熱風乾燥乾燥10分鐘,而在樹脂基材上形成厚度9μm之PVA系樹脂層。經由以上程序製做出積層體。 將所製得之積層體於空氣中在120℃下延伸2.4倍(空中輔助延伸)。 接著,將積層體浸漬於液溫40℃的硼酸水溶液中30秒,使PVA系樹脂層不溶解。本步驟的硼酸水溶液是令硼酸含量相對於100重量份的水為4重量份。 接著,以使所獲得之偏光膜的單體透射率成為42~45%左右,將積層體浸漬於液溫30℃之含碘及碘化鉀的染色液中任意時間並染色。染色液是以水為溶劑,並令碘濃度在0.1~0.4重量%的範圍內,令碘化鉀濃度在0.7~2.8重量%的範圍內,且令碘與碘化鉀之濃度比為1:7。 接下來,將積層體浸漬於40℃的硼酸水溶液中60秒,對吸附有碘之PVA樹脂層施行交聯處理。本步驟的硼酸水溶液是令硼酸含量相對於100重量份的水為5重量份,且令碘化鉀含量相對於100重量份的水為3重量份。 並且,於硼酸水溶液中以70℃之延伸溫度將積層體沿與先前之空中輔助延伸相同之方向延伸2.3倍(最後延伸倍率5.50倍)。本步驟的硼酸水溶液是令硼酸含量相對於100重量份的水為3.5重量份,且令碘化鉀含量相對於100重量份的水為5重量份。 接著,以相對於水100重量份令碘化鉀含量為4重量份之水溶液洗淨積層體,並以60℃之溫風使其乾燥,而於樹脂基材上製得厚度5μm之偏光膜。[Example 1] As a resin substrate, an amorphous polyethylene terephthalate (IPA copolymerized PET) film having a thickness of 100 μm and a Tg of 75 ° C. and an isophthalic acid unit was prepared. Corona treatment (55 W / m 2 / min) was performed on the surface of the film. It is prepared to contain acetamidine modified PVA (manufactured by Japan Synthetic Chemical Industry Co., Ltd., trade name: GOHSEFIMER (registered trademark) Z200) and PVA (average degree of polymerization: 4200, saponification degree: 99.2 mole%) in a ratio of 1: 9 ), And 13 parts by weight of potassium iodide was added to 100 parts by weight of the PVA-based resin to prepare a PVA-based resin aqueous solution (PVA-based resin concentration: 5.5% by weight). The corona-treated surface of the resin substrate was coated with the aqueous solution so that the film thickness after drying became 13 μm, and dried with hot air in a gas environment of 60 ° C. for 10 minutes to form a 9 μm-thick PVA on the resin substrate Department of resin layer. The laminated body is made through the above procedure. The obtained laminated body was stretched 2.4 times at 120 ° C in the air (air-assisted extension). Next, the laminated body was immersed in a boric acid aqueous solution having a liquid temperature of 40 ° C. for 30 seconds to make the PVA-based resin layer insoluble. The boric acid aqueous solution in this step is 4 parts by weight with respect to 100 parts by weight of boric acid. Next, the laminated body is immersed in a dye solution containing iodine and potassium iodide at a liquid temperature of 30 ° C. for arbitrary time and dyed so that the monomer transmittance of the obtained polarizing film becomes about 42 to 45%. The dyeing solution uses water as a solvent, and the iodine concentration is within a range of 0.1 to 0.4% by weight, the potassium iodide concentration is within a range of 0.7 to 2.8% by weight, and the concentration ratio of iodine to potassium iodide is 1: 7. Next, the laminated body was immersed in a 40 ° C. boric acid aqueous solution for 60 seconds, and the PVA resin layer to which iodine was adsorbed was subjected to a crosslinking treatment. The boric acid aqueous solution in this step has a boric acid content of 5 parts by weight relative to 100 parts by weight of water, and a potassium iodide content of 3 parts by weight relative to 100 parts by weight of water. And, in a boric acid aqueous solution, the laminated body was extended at a stretching temperature of 70 ° C. in the same direction as the previous air-assisted stretching by 2.3 times (the final stretching ratio was 5.50 times). The boric acid aqueous solution in this step has a boric acid content of 3.5 parts by weight relative to 100 parts by weight of water, and a potassium iodide content of 5 parts by weight relative to 100 parts by weight of water. Next, the laminated body was washed with an aqueous solution having a potassium iodide content of 4 parts by weight relative to 100 parts by weight of water, and dried at a temperature of 60 ° C. to obtain a polarizing film having a thickness of 5 μm on a resin substrate.

透過UV硬化型接著劑將環烯烴系薄膜(日本Zeon公司製,ZF-12,23μm)貼合於所獲得之偏光膜表面(與樹脂基材相反之側的面)。具體而言,係分別於偏光膜及環烯烴系薄膜上將UV硬化型接著劑塗佈成總厚度為1.0μm,並使用輥軋機貼合。其後,從環烯烴系薄膜側照射紫外線使硬化型接著劑硬化。接著剝離樹脂基材,並於該剝離面藉硬化型接著劑貼合環烯烴系薄膜之λ/4板(日本ZEON公司製、ZD-12、厚度23μm、Re(550)=140nm),而製得具有環烯烴系薄膜ZD-12(保護薄膜)/偏光膜/環烯烴系薄膜ZF-12(保護薄膜)之構成的偏光板。此外,ZD-12薄膜係以其慢軸相對於偏光膜之吸收軸構成45°角的方式予以貼合。該偏光板舉例而言可作為反射型液晶顯示裝置或有機EL顯示裝置之視辨側偏光板(抗反射薄膜)來使用。A cycloolefin-based film (ZF-12, manufactured by Zeon Corporation, 23 μm) was bonded to the surface of the obtained polarizing film (surface on the side opposite to the resin substrate) through a UV-curable adhesive. Specifically, a UV-curable adhesive was applied to a polarizing film and a cycloolefin-based film to a total thickness of 1.0 μm, and was bonded using a roll mill. Thereafter, ultraviolet rays are irradiated from the cycloolefin-based film side to harden the hardening-type adhesive. Next, the resin substrate was peeled, and a λ / 4 plate (manufactured by ZEON, ZD-12, thickness 23 μm, Re (550) = 140 nm) of a cycloolefin-based film was bonded to the peeling surface by a hardening type adhesive. A polarizing plate having a structure of a cycloolefin-based film ZD-12 (protective film) / polarizing film / cycloolefin-based film ZF-12 (protective film) was obtained. In addition, the ZD-12 film is bonded so that its slow axis forms a 45 ° angle with respect to the absorption axis of the polarizing film. This polarizing plate can be used, for example, as a viewing-side polarizing plate (anti-reflection film) of a reflective liquid crystal display device or an organic EL display device.

將上述所製得之偏光板裁切成90mm×40mm之尺寸並使偏光膜之吸收軸方向成為長邊方向。另一方面,將市售之玻璃板(Matsunami Glass公司製,厚度0.4mm)裁切成110mm×60mm之尺寸,以作為基板。將裁切出之偏光板與裁切出之基板透過丙烯酸系黏著劑來積層。此處之偏光板與基板係將偏光板之ZD-12薄膜(λ/4板)配置於基板側而積層。又,偏光板與基板係以基板伸出構成偏光板外周之全部四邊之方式積層。基板之四個伸出部分之長度各為10mm。The polarizing plate prepared as described above was cut into a size of 90 mm × 40 mm so that the direction of the absorption axis of the polarizing film became the long side direction. On the other hand, a commercially available glass plate (manufactured by Matsunami Glass, thickness 0.4 mm) was cut into a size of 110 mm × 60 mm as a substrate. The cut out polarizing plate and the cut out substrate were laminated through an acrylic adhesive. The polarizing plate and the substrate here are laminated with a ZD-12 film (λ / 4 plate) of the polarizing plate disposed on the substrate side. The polarizing plate and the substrate are laminated so that all four sides of the outer periphery of the polarizing plate are formed by the substrate protruding. Each of the four protruding portions of the substrate has a length of 10 mm.

於上述伸出部分配置黏著劑,而密封了偏光板的周圍端面。如此便形成了覆蓋液晶面板四周端面的密封部。另外,構成密封部之黏著劑,係相對於100重量份之苯乙烯-乙烯丙烯共聚物-苯乙烯之嵌段共聚物(Kuraray公司製,商品名「SEPTON 2063」,苯乙烯含量:13重量%),摻混10重量份之聚丁烯(JX日礦日石能源公司製,「商品名「日石Polybutene HV-300」」、40重量份之萜酚增黏劑(YASUHARA CHEMICAL公司製,商品名「YS Polyster TH130」)、以及芳香族增黏劑(Eastman Chemical公司製,商品名「Piccolastic A5」)製作而得。An adhesive is arranged on the protruding portion to seal the peripheral end surface of the polarizing plate. In this way, a sealing portion is formed to cover the peripheral end surfaces of the liquid crystal panel. In addition, the adhesive constituting the sealing portion is based on 100 parts by weight of a styrene-ethylene propylene copolymer-styrene block copolymer (manufactured by Kuraray, trade name "SEPTON 2063", styrene content: 13% by weight). ), 10 parts by weight of polybutene (produced by JX Nippon Nissei Energy Co., Ltd., "trade name" Nishiishi Polybutene HV-300 "), 40 parts by weight of terpene phenol tackifier (manufactured by YASUHARA CHEMICAL Corporation, product Named "YS Polyster TH130") and an aromatic tackifier (manufactured by Eastman Chemical, trade name "Piccolastic A5").

接著,以雷射光照射該黏著劑及基板,並保留從偏光板之周圍端起算100μm後裁切該黏著劑,而形成了最後之密封部。所製得密封部之透濕度為12g/m2 /24hr。雷射光之照射係採用GCC公司製「LaserPro Spirit」進行。Next, the adhesive and the substrate were irradiated with laser light, and the adhesive was cut out after retaining 100 μm from the peripheral end of the polarizing plate to form a final sealing portion. The moisture permeability of the obtained sealed portion was 12 g / m 2 / 24hr. Laser light was irradiated using "LaserPro Spirit" manufactured by GCC.

經由以上程序,製作出了附基板之偏光板。將所製得之附基板之偏光板供於進行上述(3)所記載之褪色評估。結果列於表1。此外,於圖3顯示褪色狀態。Through the above procedures, a polarizing plate with a substrate was fabricated. The obtained polarizing plate with a substrate was subjected to the fading evaluation described in (3) above. The results are shown in Table 1. In addition, a faded state is shown in FIG. 3.

[實施例2] 於以與實施例1同樣方式製得之樹脂基材/偏光膜之積層體的偏光膜表面,以與實施例1同樣方式貼合環烯烴系薄膜(日本ZEON公司製、ZF-12、13μm)。接著,剝離樹脂基材,並於該剝離面藉黏著劑(12μm)貼合反射型偏光件(3M公司製、APF-V3),而製得具有環烯烴系薄膜ZF-12(保護薄膜)/偏光膜/反射型偏光件之構成的偏光板。另,反射型偏光件係以其透射軸與偏光膜之透射軸構成0°角之方式而貼合。該偏光板舉例而言可作為背面側偏光板使用。[Example 2] A cycloolefin-based film (manufactured by Japan Zeon Corporation, ZF) was laminated on the surface of a polarizing film of a resin substrate / polarizing film laminate obtained in the same manner as in Example 1 in the same manner as in Example 1. -12, 13 μm). Next, the resin substrate was peeled off, and a reflective polarizer (manufactured by 3M, APF-V3) was bonded to the peeling surface with an adhesive (12 μm) to obtain a cycloolefin-based film ZF-12 (protective film) / A polarizing plate composed of a polarizing film and a reflective polarizer. The reflective polarizer is bonded so that its transmission axis and the transmission axis of the polarizing film form an angle of 0 °. This polarizing plate can be used as a back side polarizing plate, for example.

以下依與實施例1相同程序製作出了附基板之偏光板。另,偏光板與基板係將偏光板之ZF-12薄膜(保護薄膜)配置於基板側而積層。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。A polarizing plate with a substrate was fabricated in the same manner as in Example 1 below. The polarizing plate and the substrate are laminated with a ZF-12 film (protective film) of the polarizing plate disposed on the substrate side. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[實施例3] 於以與實施例1同樣方式製得之樹脂基材/偏光膜之積層體的偏光膜表面,以與實施例1同樣方式貼合環烯烴系薄膜(日本ZEON公司製、ZF-12、13μm)。接著,剝離樹脂基材,而獲得具有環烯烴系薄膜ZF-12(保護薄膜)/偏光膜之構成的偏光板。以下依與實施例1相同程序製作出了附基板之偏光板。另,偏光板與基板係將偏光膜配置於基板側而積層。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。[Example 3] A cycloolefin-based film (manufactured by Japan Zeon Corporation, ZF) was bonded to the surface of a polarizing film of a resin substrate / polarizing film laminate obtained in the same manner as in Example 1 in the same manner as in Example 1. -12, 13 μm). Next, the resin substrate was peeled off to obtain a polarizing plate having a configuration of a cycloolefin-based film ZF-12 (protective film) / polarizing film. A polarizing plate with a substrate was fabricated in the same manner as in Example 1 below. The polarizing plate and the substrate are laminated with a polarizing film disposed on the substrate side. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[實施例4] 形成透濕度為24g/m2 /24hr之密封部(厚度50μm),除此之外依與實施例1相同方式製作出了附基板之偏光板。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。[Example 4] The moisture permeability of the sealing portion is formed (thickness 50μm) 24g / m 2 / 24hr, the addition of a polarizing plate attached to the substrate by making the same manner as in Example 1. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[實施例5] 形成透濕度為24g/m2 /24hr之密封部(厚度50μm),除此之外依與實施例2相同方式製作出了附基板之偏光板。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。[Example 5] The moisture permeability of the sealing portion is formed (thickness 50μm) 24g / m 2 / 24hr, the production according to the same manner except that in Example 2 of a polarizing plate attached to the substrate. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[實施例6] 形成透濕度為24g/m2 /24hr之密封部(厚度50μm),除此之外依與實施例3相同方式製作出了附基板之偏光板。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。[Example 6] The moisture permeability of the sealing portion is formed (thickness 50μm) 24g / m 2 / 24hr, the addition of a polarizing plate attached to the substrate by making the same manner as in Example 3. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[比較例1] 除了不形成密封部外,依與實施例1相同方式製作出了附基板之偏光板。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。另外,將褪色之狀態顯示於圖4。[Comparative Example 1] A polarizing plate with a substrate was produced in the same manner as in Example 1 except that the sealing portion was not formed. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1. The state of discoloration is shown in FIG. 4.

[比較例2] 除了使用了一般之丙烯酸系黏著劑外,依與實施例1相同方式形成了密封部(透濕度:大於1000g/m2 /24hr,厚度:25μm),而製作出了附基板之偏光板。將所製得之附基板之偏光板供於進行與實施例1相同之評估。結果列於表1。[Comparative Example 2] A sealing portion was formed in the same manner as in Example 1 except that a general acrylic adhesive was used (permeability: greater than 1000 g / m 2 / 24hr, thickness: 25 μm), and a substrate was fabricated. Of polarizing plate. The obtained polarizing plate with a substrate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[表1] [Table 1]

由表1可明顯得知,藉由於偏光板之外周端面上形成具有預定透濕度之密封部,可獲得在加濕環境下仍可維持優良光學特性之附基板之偏光板(最後為影像顯示裝置)。It is obvious from Table 1 that by forming a sealing portion with a predetermined moisture permeability on the outer peripheral end face of the polarizing plate, a polarizing plate with a substrate (the last is an image display device) that can maintain excellent optical characteristics in a humidified environment ).

產業上之可利用性 利用本發明之製造方法製得之影像顯示裝置適合應用在電視機、顯示器、行動電話、行動資訊終端、數位相機、視訊攝影機、可攜式遊戲機、汽車導航系統、影印機、列印機、傳真機、鐘錶、微波爐等。Industrial Applicability The image display device produced by the manufacturing method of the present invention is suitable for use in televisions, displays, mobile phones, mobile information terminals, digital cameras, video cameras, portable game consoles, car navigation systems, and photocopying. Machines, printers, fax machines, clocks, microwave ovens, etc.

10‧‧‧偏光板10‧‧‧ polarizing plate

20‧‧‧基板20‧‧‧ substrate

30‧‧‧密封部30‧‧‧Sealing Department

40‧‧‧密封部(最後)40‧‧‧Sealing section (final)

100‧‧‧附基板之偏光板100‧‧‧ polarizing plate with substrate

圖式簡單說明 圖1係用以說明本發明中一實施形態之影像顯示裝置之製造方法的概略圖。 圖2係用以說明算出褪色量之示意圖 圖3係展示作為實施例1之影像顯示裝置代替品的附基板之偏光板在加濕試驗後之褪色量的影像。 圖4係展示作為比較例1之影像顯示裝置代替品的附基板之偏光板在加濕試驗後之褪色量的影像。Brief Description of Drawings Fig. 1 is a schematic diagram for explaining a method for manufacturing an image display device according to an embodiment of the present invention. Fig. 2 is a schematic diagram for explaining calculation of the amount of discoloration. Fig. 3 is an image showing the amount of discoloration of a polarizing plate with a substrate as a substitute for the image display device of Example 1 after a humidification test. FIG. 4 is an image showing the amount of discoloration of a polarizing plate with a substrate as a substitute for the image display device of Comparative Example 1 after a humidification test.

Claims (9)

一種影像顯示裝置之製造方法,包含以下步驟: 準備偏光板與尺寸較該偏光板更大之基板; 以該基板伸出該偏光板外周之方式,積層該基板與該偏光板; 形成覆蓋該偏光板之周圍端面的密封部;及 保留自該偏光板之周圍端起算預定長度的伸出部分後裁切該基板及該密封部,製成預定尺寸。An image display device manufacturing method includes the following steps: preparing a polarizing plate and a substrate larger in size than the polarizing plate; laminating the substrate and the polarizing plate in such a manner that the substrate protrudes from the outer periphery of the polarizing plate; and forming a polarizing plate to cover the polarizing light A sealing portion on a peripheral end surface of the plate; and cutting the substrate and the sealing portion to a predetermined size after retaining a protruding portion of a predetermined length from the peripheral end of the polarizing plate. 如請求項1之製造方法,其中前述基板為玻璃板。The method according to claim 1, wherein the substrate is a glass plate. 如請求項1之製造方法,其中前述基板為樹脂薄膜。The method according to claim 1, wherein the substrate is a resin film. 如請求項1至3中任一項之製造方法,其以前述基板伸出構成前述偏光板外周之全部四邊之方式,積層該基板與該偏光板。According to the manufacturing method of any one of claims 1 to 3, the substrate and the polarizing plate are laminated in such a manner that the substrate protrudes to form all four sides of the outer periphery of the polarizing plate. 如請求項1至4中任一項之製造方法,其中前述基板為選自液晶顯示裝置、有機EL顯示裝置及量子點顯示裝置中之影像顯示裝置的顯示單元基板。The manufacturing method according to any one of claims 1 to 4, wherein the substrate is a display unit substrate of an image display device selected from a liquid crystal display device, an organic EL display device, and a quantum dot display device. 如請求項1至5中任一項之製造方法,其中前述裁切係透過照射雷射光進行。The manufacturing method according to any one of claims 1 to 5, wherein the aforementioned cutting is performed by irradiating laser light. 如請求項1至6中任一項之製造方法,其中前述密封部在前述裁切後的伸出部分之長度為10μm~500μm。The manufacturing method according to any one of claims 1 to 6, wherein the length of the protruding portion of the sealing portion after the cutting is 10 μm to 500 μm. 如請求項1至7中任一項之製造方法,其中前述裁切後之密封部的透濕度為300g/m2 /24hr以下。The manufacturing method according to any one of claims 1 to 7, wherein the moisture permeability of the sealed portion after the cutting is 300 g / m 2 / 24hr or less. 一種影像顯示裝置,具有:偏光板;基板,其具有自該偏光板之周圍端起算預定長度之伸出部分;密封部,其形成於該伸出部分且覆蓋該偏光板之周圍端面。An image display device includes: a polarizing plate; a substrate having a protruding portion having a predetermined length from a peripheral end of the polarizing plate; and a sealing portion formed on the protruding portion and covering a peripheral end surface of the polarizing plate.
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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12117634B2 (en) * 2019-04-16 2024-10-15 Sharp Kabushiki Kaisha Flexible display device, method for manufacturing flexible display device, and foldable display device
CN110208892B (en) * 2019-05-29 2021-06-15 苏州清越光电科技股份有限公司 Polaroid and preparation method thereof and display panel
KR20220093644A (en) * 2020-12-28 2022-07-05 동우 화인켐 주식회사 Window Laminated Member and Manufacturing Method thereof
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Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138715A (en) * 1979-04-18 1980-10-29 Hitachi Ltd Liquid crystal display element
JPS58133128U (en) * 1983-01-13 1983-09-08 セイコーエプソン株式会社 liquid crystal display
JPH10206633A (en) * 1997-01-22 1998-08-07 Casio Comput Co Ltd Polarizing plate and method of manufacturing the same
JP4279944B2 (en) 1999-06-01 2009-06-17 株式会社サンリッツ Manufacturing method of polarizing plate
JP4218941B2 (en) * 2003-02-25 2009-02-04 日東電工株式会社 Optical member, manufacturing method thereof, adhesive optical member, and image display device
CN101051137A (en) * 2006-04-07 2007-10-10 奇美电子股份有限公司 Manufacturing method of liquid crystal display
JP4918701B2 (en) * 2006-12-18 2012-04-18 株式会社トプコン Moisture-proof coating method for polarizing plate and polarizing plate produced by the method
JP4494446B2 (en) * 2007-09-12 2010-06-30 株式会社 日立ディスプレイズ Display device
JP2009139738A (en) * 2007-12-07 2009-06-25 Sharp Corp Liquid crystal display panel manufacturing method and liquid crystal display panel
US9334406B2 (en) * 2009-02-25 2016-05-10 Lg Chem, Ltd. Composition for primer coating, optical film comprising the same, and polarizing plate comprising the same
JP2010243863A (en) * 2009-04-08 2010-10-28 Sony Corp Polarizing plate and optical device
JP2011022202A (en) * 2009-07-13 2011-02-03 Sumitomo Chemical Co Ltd Polarizing plate and image display device using the same
JP2013228439A (en) * 2012-04-24 2013-11-07 Japan Display Inc Liquid crystal display device and manufacturing method thereof
JP6166587B2 (en) * 2013-05-20 2017-07-19 三星ダイヤモンド工業株式会社 Cutting method of resin plate attached to glass substrate
KR20150069705A (en) * 2013-12-16 2015-06-24 동우 화인켐 주식회사 Liquid Crystal Panel and Process for Preparing the Same
JP6803131B2 (en) * 2014-02-18 2020-12-23 日東電工株式会社 Laminate and image display device
KR20170078716A (en) * 2014-11-04 2017-07-07 스미또모 가가꾸 가부시키가이샤 Method for manufacturing optical film provided with protective film
JP6689103B2 (en) * 2015-03-12 2020-04-28 日東電工株式会社 Polarizing film and its manufacturing method, optical film and image display device
CN107710311A (en) * 2015-07-03 2018-02-16 堺显示器制品株式会社 The method for cutting of display member and the manufacture method of liquid crystal display device
JP6638239B2 (en) * 2015-07-30 2020-01-29 住友化学株式会社 Optical laminate and liquid crystal display device

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