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TW201905218A - A metal tip with a large surface area - Google Patents

A metal tip with a large surface area

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Publication number
TW201905218A
TW201905218A TW106121958A TW106121958A TW201905218A TW 201905218 A TW201905218 A TW 201905218A TW 106121958 A TW106121958 A TW 106121958A TW 106121958 A TW106121958 A TW 106121958A TW 201905218 A TW201905218 A TW 201905218A
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Taiwan
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tip
surface area
metal
oxide film
large surface
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TW106121958A
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Chinese (zh)
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陳建仲
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巨茨生技醫藥有限公司
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Priority to TW106121958A priority Critical patent/TW201905218A/en
Publication of TW201905218A publication Critical patent/TW201905218A/en

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Abstract

The objective of this patent is to achieve a new class of drug detected and released needle with large surface to absorbs and release the indicator or drug. The approach is to explore the tungsten and aluminum novel sub-micron or nano needle. This approach is expect to provide both tiny needle but large needle surface area to significantly boost the achievable the sensitively of drug detected and released. New electrochemical processes including electro-polished, electro-etched, and anodization are introduced to assistance a tiny needle and nanotube film under ambient conditions, thereby enabling low-cost and mass production of the needle.

Description

一種具有大表面積的金屬針尖  Metal tip with large surface area  

本專利是關於一種具有大表面積的金屬針尖,此大面積的針尖可以吸附大量的染料、檢測試劑、或藥物,可應用於精密的微量檢測上或微量且快速的藥物釋放上的應用。 This patent relates to a metal needle tip having a large surface area, which can adsorb a large amount of dyes, detection reagents, or drugs, and can be applied to precise micro-detection or micro- and rapid drug release applications.

習知之藥物釋放方法乃是使藥物在體內慢慢溶化、以及隨著血流運送藥物到患部的方法,為了使那些方法能實際運用,光是改良藥物還是不夠的,還必須開發擔藥物的高分子材料,或是無機材料等基質材料,藥物粒子直徑越小,對藥物的吸收性就會越佳,以這個觀點看來,藥物加上基質材料的大小,必須控制在數微米的大小。 The conventional drug release method is a method for slowly dissolving the drug in the body and transporting the drug to the affected part along with the blood flow. In order to make those methods practical, it is not enough to improve the drug, and it is necessary to develop a high drug. Molecular materials, or matrix materials such as inorganic materials, the smaller the diameter of the drug particles, the better the absorption of the drug. From this point of view, the size of the drug plus the matrix material must be controlled to a few micrometers.

經皮輸藥系統係一種得以克服上述兩種投藥方式缺點的新式投藥途徑,不僅可以避免口服藥物因腸胃系統的消化而使藥效流失的可能性,亦可減少皮下注射所造成之疼痛及感染的風險。然而,由於人體皮膚最外層為角質層,其係人體非常重要的保護屏障,且屬於疏水性並帶有負電荷,因此造成大分子藥物以及親水性藥物難以穿透,係為經皮輸藥系統開發上最大的障礙。 The transdermal drug delivery system is a new route of administration that overcomes the shortcomings of the above two modes of administration. It not only avoids the possibility of loss of oral efficacy due to digestion of the gastrointestinal system, but also reduces the pain and infection caused by subcutaneous injection. risks of. However, since the outermost layer of human skin is the stratum corneum, it is a very important protective barrier of the human body, and it is hydrophobic and has a negative charge, thus causing macromolecular drugs and hydrophilic drugs to be difficult to penetrate, which is a transdermal drug delivery system. The biggest obstacle to development.

習知之藥物釋放貼片結構包含:支持基材,其表面包含複數個突狀支持軸;生物可分解性載體,其係由生物可分解性高分子材料所形成且設置於支持軸上,包覆於生物可分解性載體中之藥物,生物可分解性載 體可於皮膚中膨潤後再降解而將包覆於生物可分解性載體中之藥物以1%/天~99%/天之速率釋放於皮膚中。 The conventional drug release patch structure comprises: a support substrate, the surface of which comprises a plurality of protruding support shafts; a biodegradable carrier formed of a biodegradable polymer material and disposed on the support shaft, coated The drug in the biodegradable carrier, the biodegradable carrier can be swelled in the skin and then degraded to release the drug coated in the biodegradable carrier at a rate of 1%/day to 99%/day. In the skin.

目前市售的微針貼片大多是以金屬或矽為材料所製成,使用者必須承擔微針斷裂與微針重覆使用可能引起的感染風險,其亦可能造成生醫廢棄物的危害,且市售貼片多需長時間與皮膚接觸,也可能造成皮膚搔癢及紅腫等過敏反應。另外,目前所開發出之微針貼片多屬於快速釋放藥物劑型,尚無可持續釋放藥物之長效劑型。 At present, most of the commercially available microneedle patches are made of metal or tantalum. The user must bear the risk of infection caused by microneedle breakage and repeated use of microneedles, which may also cause harm to biomedical waste. And commercial patches often need to be in contact with the skin for a long time, and may also cause allergic reactions such as itching and redness of the skin. In addition, the microneedle patches currently developed are mostly rapid release pharmaceutical dosage forms, and there are no long-acting dosage forms for sustainable release drugs.

為了改善以上缺點,本專利提出一種具有金屬為基材多孔性氧化膜為表面的次微米或奈米針尖,用以提供大表面積的藥物釋放功能。 In order to improve the above disadvantages, the present patent proposes a sub-micron or nano-needle tip having a metal-based porous oxide film as a surface for providing a large surface area drug release function.

本發明之一種具有大表面積的金屬針尖,其結構包括:一金屬線材,線材之一端經過電解拋光與電解蝕刻後所形成的針尖,針尖再經陽極處理後所得附著在該針尖表面上的多孔性氧化膜,針尖的尺寸介於微米與奈米等級之間,其中金屬線材包括鋁線、鎢線、錫線、鈦線、鋯線、鉬線,多孔性氧化膜包括鋁氧化膜、鎢氧化膜、錫氧化膜、鈦氧化膜、鋯氧化膜、鉬氧化膜,多孔性氧化膜具有奈米或次微米等級的微孔,針尖包含單根針尖或複數針尖,所述之複數針尖包含是陣列型針尖,該針尖具有吸附與釋放染料、藥物、檢測劑的功能。 The metal needle tip having a large surface area of the invention comprises: a metal wire, a needle tip formed by electrolytic polishing and electrolytic etching on one end of the wire, and the porous tip attached to the surface of the needle tip after the needle tip is subjected to anodization treatment. Oxide film, the size of the tip is between the micron and nanometer grades, wherein the metal wire comprises aluminum wire, tungsten wire, tin wire, titanium wire, zirconium wire, molybdenum wire, and the porous oxide film includes aluminum oxide film and tungsten oxide film. a tin oxide film, a titanium oxide film, a zirconium oxide film, a molybdenum oxide film, a porous oxide film having micropores of a nanometer or submicron order, the needle tip comprising a single needle tip or a plurality of needle tips, the plurality of needle tips comprising an array type The tip of the needle has the function of adsorbing and releasing dyes, drugs, and detecting agents.

電解拋光的目的乃是在於易使金屬及合金成極平滑之鏡面光澤,常用於工業上之鏡面拋光。純鋁、銅、銀等金屬因其材質極軟,或是鎢、鋯、鉬等金屬因其材質極硬,不易以一般之傳統機械拋光法將其表面刮痕去除,另外,化學拋光法乃利用溶液中之活性陰離子,如硫酸根離子、過濾酸根離子等附著於試片表面與之反應而進行試片的拋光,雖然化學拋光法可將基材表面之刮痕去除,但因經化學拋光法後基材表面易殘留溶液中之活性離子,因此,對於要求表面乾淨度極高的樣品並不適合,而電解拋光法則可達表面乾淨度極高的要求,因電解拋光法的反應乃是先 對樣品表面進行解離後,金屬離子再溶入電解液中,因此,反應完成後基材表面可保持極乾淨狀態。本專利所提之一種具有大表面積的金屬針尖,其基材可以是鋁線、鎢線、錫線、鈦線、鋯線、鉬線,為了使些硬質或軟質材料獲得一平整的表面,電解拋光是最佳的選擇。 The purpose of electrolytic polishing is to make the metal and alloy into a very smooth mirror gloss, which is often used for industrial mirror polishing. Metals such as pure aluminum, copper, and silver are extremely soft, or metals such as tungsten, zirconium, and molybdenum are extremely hard, and it is difficult to remove the surface scratches by conventional mechanical polishing. In addition, the chemical polishing method is The test piece is polished by reacting the active anion in the solution, such as sulfate ion, acid chloride ion, etc., on the surface of the test piece, although the chemical polishing method can remove the scratch on the surface of the substrate, but is chemically polished. After the method, the surface of the substrate tends to remain active ions in the solution. Therefore, it is not suitable for samples requiring extremely high surface cleanliness, and the electropolishing method can meet the requirements of extremely high surface cleanliness. After the surface of the sample is dissociated, the metal ions are dissolved into the electrolyte, so that the surface of the substrate can be kept extremely clean after the reaction is completed. The metal tip of the invention has a large surface area, and the substrate may be aluminum wire, tungsten wire, tin wire, titanium wire, zirconium wire or molybdenum wire. In order to obtain a flat surface for some hard or soft materials, electrolysis Polishing is the best choice.

陽極處理一直以來被定義為成熟的傳統產業,其主要的應用如表面抗腐蝕、塗裝、附著性、裝飾、電絕緣、表面電鍍、耐磨性等表面改質應用,由於陽極氧化膜的多孔性結構,陽極薄膜後續需再經封孔處理步驟,使得陽極膜於應用時方能具有美觀與多色彩化的緻密膜。近年來由於奈米技術的發展,也使得在陽極氧化膜管胞或奈米管結構的管徑、管長、與管密度在技術上更能完整的掌控。簡便的陽極處理技術,提供成本低廉且快速量產的製程,可實際應用於要求單位表面積大的產品發展,如染料敏化太陽能電池、導熱片、與隔熱片元件之開發。陽極處理技術,隨著工業產品的需求,於早期針對重工業結構物表面的抗腐蝕、抗磨耗、抗撞擊、與耐高溫等表面改質的需求,近年來更應用於蒸鍍設備之真空腔體內部的鍍膜吸收層,或積體電路內之阻障層,隨著目前最熱門的散熱材、隔熱材、綠建材、與太陽能電池產業發展,具自動化生產特性的陽極處理技術,勢必將成為各產業的製程之一。 Anode treatment has long been defined as a mature traditional industry, its main applications such as surface corrosion resistance, coating, adhesion, decoration, electrical insulation, surface plating, wear resistance and other surface modification applications, due to the porous anodized film The structure of the anode film is subsequently subjected to a sealing treatment step, so that the anode film can have a beautiful and multi-colored dense film when applied. In recent years, due to the development of nanotechnology, the tube diameter, tube length, and tube density of the anodized film tube or nanotube structure are technically more complete. The simple anode treatment technology provides a low-cost and fast mass production process, which can be practically applied to product development requiring large surface area per unit area, such as dye-sensitized solar cells, thermal conductive sheets, and thermal insulation sheet components. The anodizing technology, in response to the demand of industrial products, has been applied to the vacuum chamber of the evaporation equipment in recent years for the surface corrosion resistance, abrasion resistance, impact resistance, and high temperature resistance of heavy industrial structures. The coating absorption layer of the part, or the barrier layer in the integrated circuit, with the development of the most popular heat dissipation materials, heat insulation materials, green building materials, and solar cell industry, the anodizing technology with automatic production characteristics is bound to become One of the processes of various industries.

當活性元素例如鋁、鎢、錫、鈦、鋯、鉬等置於特定的電解液中且控制適當的陽極處理參數,所形成的氧化膜具有規則狀的胞狀(cell)或奈米管結構,奈米管末端與金屬基材材的介面則形成半球形的阻障層,其中奈米管與阻障層的成份均為金屬氧化物,奈米管的直徑、管密度、管壁厚度、與管長則依陽極處理參數而定。以鋁陽極處理為例,鋁陽極氧化膜又名anodic aluminum oxide(AAO)、anodic alumina nanoholds(AAN)、anodic alumina membrane(AAM)、或porous anodic alumina(PAA).鋁陽極處理主要藉由2Al+3+3H2O→Al2O3+6H+反應而成,因此,需控制pH值低於4以下,即酸性溶液之條件下,且外加電壓需高於-1.8V(SHE)以上,式中H+將藉 由H++H+→H2,而生成氫氣,此氫氣由Al2O3內部逸出Al2O3,進而造成多孔性之氧化鋁形成,因此,控制氫氣逸出之速率,則可控制形成於氧化鋁內部的孔洞,使之成為孔徑均一性之鋁陽極氧化膜。鋁於陽極處理時於表面生成三氧化二鋁(Al2O3)氧化層,該氧化層成長之初以六角形孔洞往上方成長,隨著時間的增加該六角形孔洞周圍原子的排列漸成非規則性(disorder)的排列,所以孔洞漸轉為圓形孔洞,另外孔徑尺寸的改變可由C=mV表示之,其中C:孔徑大小(nm)、V:陽極處理電壓(V)、m:常數(2~2.5)。 When an active element such as aluminum, tungsten, tin, titanium, zirconium, molybdenum or the like is placed in a specific electrolyte and the appropriate anode treatment parameters are controlled, the formed oxide film has a regular cell or nanotube structure. The interface between the end of the nanotube and the metal substrate forms a hemispherical barrier layer, wherein the components of the nanotube and the barrier layer are metal oxides, the diameter of the nanotube, the tube density, the wall thickness, The length of the tube depends on the anode processing parameters. Taking aluminum anode treatment as an example, the aluminum anodized film is also known as anodic aluminum oxide (AAO), anodic alumina nanoholds (AAN), anodic alumina membrane (AAM), or porous anodic alumina (PAA). The aluminum anode treatment is mainly performed by 2Al + 3 +3H 2 O→Al 2 O 3 +6H + reaction, therefore, it is necessary to control the pH below 4, that is, under the condition of acidic solution, and the applied voltage should be higher than -1.8V (SHE) or more. in the H + by H + + H + → H 2 , to generate hydrogen, this hydrogen from inside Al 2 O 3 Al 2 O 3 to escape, and cause of the porous alumina is formed, and therefore, the control of the hydrogen evolution At the rate, the pores formed inside the alumina can be controlled to become an aluminum anodized film having a uniform pore diameter. When the aluminum is anodized, an aluminum oxide (Al 2 O 3 ) oxide layer is formed on the surface, and the oxide layer grows upwards in a hexagonal hole at the beginning of growth, and the arrangement of atoms around the hexagonal hole gradually increases with time. The arrangement of the disorder, so the hole gradually turns into a circular hole, and the change in the size of the aperture can be expressed by C=mV, where C: aperture size (nm), V: anode processing voltage (V), m: Constant (2~2.5).

以下,茲使用第二圖~第四圖來詳細說明本發明相關之一種具有大表面積的金屬針尖之各實施例。此外,在圖面的說明中,同一要素或具有同一機能的要素係使用同一符號,並省略重複的說明。 Hereinafter, each of the embodiments of the metal needle tip having a large surface area according to the present invention will be described in detail using the second to fourth figures . In the description of the drawings, the same elements or elements having the same function are denoted by the same reference numerals, and the description thereof will not be repeated.

【實施例1】  [Example 1]  

一種具有大表面積的鋁針尖Aluminum tip with large surface area

此範例先將表面經過酸洗與鹼洗後之純鋁線材進行電解拋光使該純鋁線材具有光滑的表面,包含三步驟:電解拋光、電解蝕刻、陽極處理。(1)電解拋光:電解拋光的條件為:5~20%過氯酸(HClO4)+5~20%單丁醚乙二脂(CH3(CH2)3OCH2CH2OH)+85~95%乙醇(C2H6O),電解液溫度為2~40℃,電解電壓為5~50伏特,電解拋光時間為1~5分鐘,較佳的電解拋光操作條件為15%過氯酸(HClO4)+15%單丁醚乙二脂(CH3(CH2)3OCH2CH2OH)+70%乙醇(C2H6O),電解液溫度為25℃,電解電壓為40伏特,電解拋光時間為1.5分鐘。經電解拋光後的鋁線材再經電解蝕刻過程用以製得鋁針尖,(2)電解蝕刻:電解蝕刻的條件為:5~20vol.%硝酸(HNO3),電解液溫度為2~40℃,電解電壓為5~50伏特,電解拋光時間為0.5~5分鐘,較佳的電解蝕刻操作條件為6vol.%硝酸(HNO3),電解液溫度為25℃,電解電壓為30伏特,電解拋光時間為1分鐘,所獲得的針尖照片如 第二圖所示。(3)陽極處理:陽極處理的電解液主要以硫酸、磷酸、或草酸為主。利用1~10vol.%(體積百分比)硫酸水溶液為電解液、外加5~25伏特直流電壓、陽極處理時間0.1~1小時、電解液溫度為0~15℃、可使金屬鋁線表面反應產生孔洞介於10~30nm孔洞結構之三氧化二鋁薄膜。利用1~5wt.%(重量百分比)草酸水溶液為電解液、外加20~60伏特直流電壓、陽極處理時間0.1~1小時、電解液溫度為0~25℃、可使金屬鋁線表面反應產生孔洞介於30~100nm孔洞結構之三氧化二鋁薄膜,利用1~3vol.%(體積百分比)磷酸水溶液為電解液、外加100~200伏特直流電壓、陽極處理時間0.1~1小時、電解液溫度為-8~15℃、可使鋁線表面反應產生孔洞介於100~500nm孔洞結構之三氧化二鋁薄膜,顯微照片如第三圖所示。經過電解拋光、電解蝕刻、陽極處理後金屬鋁針尖表面具有大表面積的多孔性氧化鋁膜披覆,將此針尖插入有色染料中可觀察到顏色飽和的染料吸附於針尖上。針尖吸附染料後的的實際照片如第四圖所示。 In this example, the pure aluminum wire whose surface has been acid-washed and alkali-washed is electropolished to make the pure aluminum wire have a smooth surface, and includes three steps: electrolytic polishing, electrolytic etching, and anodizing. (1) Electropolishing : The conditions of electrolytic polishing are: 5~20% perchloric acid (HClO 4 ) + 5~20% monobutyl ether ethylene diester (CH 3 (CH 2 ) 3 OCH 2 CH 2 OH) +85 ~95% ethanol (C 2 H 6 O), electrolyte temperature is 2~40 °C, electrolysis voltage is 5~50 volts, electropolishing time is 1~5 minutes, better electropolishing operation condition is 15% perchlorination Acid (HClO 4 ) + 15% monobutyl ether ethylene diester (CH 3 (CH 2 ) 3 OCH 2 CH 2 OH) + 70% ethanol (C 2 H 6 O), electrolyte temperature is 25 ° C, electrolysis voltage is 40 volts, electropolishing time is 1.5 minutes. The electropolished aluminum wire is then subjected to an electrolytic etching process to obtain an aluminum needle tip. (2) Electrolytic etching : The conditions of electrolytic etching are: 5-20 vol.% nitric acid (HNO 3 ), and the electrolyte temperature is 2-40 ° C. The electrolysis voltage is 5~50 volts, the electropolishing time is 0.5~5 minutes, the preferred electrolytic etching operation condition is 6vol.% nitric acid (HNO 3 ), the electrolyte temperature is 25 ° C, the electrolysis voltage is 30 volts, electropolishing time of 1 minute, as shown in the obtained photograph as a second tip of FIG. (3) Anode treatment : The electrolyte treated by the anode is mainly sulfuric acid, phosphoric acid, or oxalic acid. Using 1~10 vol.% (volume percent) sulfuric acid aqueous solution as electrolyte, plus 5~25 volts DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature 0~15 °C, can make the surface of metal aluminum wire react to produce holes A thin film of aluminum oxide having a pore structure of 10 to 30 nm. Using 1~5wt.% (% by weight) aqueous solution of oxalic acid as electrolyte, adding 20~60V DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature 0~25°C, can make the surface of metal aluminum wire react to produce holes The aluminum oxide film of 30~100nm pore structure uses 1~3vol.% (volume%) phosphoric acid aqueous solution as electrolyte, plus 100~200 volts DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature is -8~15 °C, the surface of the aluminum wire can be reacted to produce a film of aluminum oxide having a pore structure of 100-500 nm. The photomicrograph is shown in the third figure . After electropolishing, electrolytic etching, and anodizing, a porous aluminum oxide film having a large surface area on the surface of the metal aluminum tip is coated, and the needle tip is inserted into the colored dye to observe that the color-saturated dye is adsorbed on the needle tip. The actual photograph after the needle tip adsorbs the dye is shown in the fourth figure .

【實施例2】  [Example 2]  

一種具有大表面積的鎢針尖A tungsten tip with a large surface area

此範例先將表面經過酸洗與鹼洗後之純鎢線材進行電解拋光使該純鎢線材具有光滑的表面,包含三步驟:電解拋光、電解蝕刻、陽極處理。(1)電解拋光:電解拋光的條件為:5~25wt.%氫氧化鈉(NaOH)+10~40wt.%酒石酸鉀鈉(NaKC4H4O6),電解液溫度為2~40℃,電解電壓為5~50伏特,電解拋光時間為1~5分鐘,較佳的電解拋光操作條件為8wt.%氫氧化鈉(NaOH)+15wt.%酒石酸鉀鈉(NaKC4H4O6),電解液溫度為10℃,電解電壓為20伏特,電解拋光時間為3分鐘。經電解拋光後的鎢線材再經電解蝕刻過程用以製得鋁針尖,(2)電解蝕刻:電解蝕刻的條件為:5~25wt.%氫氧化鈉(NaOH),電解液溫度為2~40℃,電解電壓為5~30伏特,電解拋光時間為0.5~5分鐘,較佳的電解蝕刻操作條件為10wt.%氫氧化鈉(NaOH),電解液溫度為5℃,電解電壓為10伏特,電解拋光時間為1分鐘。(3)陽極處理: 陽極處理的電解液主要以或草酸為主。利用1~5wt.%(重量百分比)草酸水溶液為電解液、外加20~60伏特直流電壓、陽極處理時間0.1~1小時、電解液溫度為0~25℃、可使金屬鎢線表面反應產生孔洞介於30~100nm孔洞結構之氧化鎢薄膜。經過電解拋光、電解蝕刻、陽極處理後金鎢針尖表面具有大表面積的多孔性氧化鎢膜披覆,將此針尖插入有色染料中可觀察到顏色飽和的染料吸附於針尖上。 In this example, the pure tungsten wire whose surface has been acid-washed and alkali-washed is subjected to electrolytic polishing to make the pure tungsten wire have a smooth surface, and comprises three steps: electrolytic polishing, electrolytic etching, and anodizing. (1) Electropolishing : The conditions of electrolytic polishing are: 5~25wt.% sodium hydroxide (NaOH) +10~40wt.% sodium potassium tartrate (NaKC 4 H 4 O 6 ), the electrolyte temperature is 2~40°C, The electrolysis voltage is 5~50 volts, the electropolishing time is 1~5 minutes, and the preferred electropolishing operation condition is 8wt.% sodium hydroxide (NaOH) + 15wt.% sodium potassium tartrate (NaKC 4 H 4 O 6 ), The electrolyte temperature was 10 ° C, the electrolysis voltage was 20 volts, and the electropolishing time was 3 minutes. The electropolished tungsten wire is then subjected to an electrolytic etching process to obtain an aluminum tip, and (2) electrolytic etching : electrolytic etching conditions are: 5 to 25 wt.% sodium hydroxide (NaOH), and the electrolyte temperature is 2 to 40. °C, the electrolysis voltage is 5~30 volts, the electropolishing time is 0.5~5 minutes, the preferred electrolytic etching operation condition is 10wt.% sodium hydroxide (NaOH), the electrolyte temperature is 5 °C, and the electrolysis voltage is 10 volts. The electropolishing time was 1 minute. (3) Anode treatment : The electrolyte treated with anodizing is mainly oxalic acid. Using 1~5wt.% (% by weight) aqueous solution of oxalic acid as electrolyte, plus 20~60V DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature 0~25°C, can make the surface of metal tungsten wire react to produce holes A tungsten oxide film having a pore structure of 30 to 100 nm. After electropolishing, electrolytic etching, and anodizing, a porous tungsten oxide film having a large surface area on the surface of the gold-tungsten needle tip is coated, and the needle tip is inserted into the colored dye to observe that the color-saturated dye is adsorbed on the needle tip.

【實施例3】  [Example 3]  

一種具有大表面積的陣列式鋁針尖Array type aluminum tip with large surface area

此範例先將表面經過酸洗與鹼洗後之陣列式鋁柱進行電解拋光使該陣列式鋁柱具有光滑的表面,包含三步驟:電解拋光、電解蝕刻、陽極處理。(1)電解拋光:電解拋光的條件為:5~20%過氯酸(HClO4)+5~20%單丁醚乙二脂(CH3(CH2)3OCH2CH2OH)+85~95%乙醇(C2H6O),電解液溫度為2~40℃,電解電壓為5~50伏特,電解拋光時間為1~5分鐘,較佳的電解拋光操作條件為15%過氯酸(HClO4)+15%單丁醚乙二脂(CH3(CH2)3OCH2CH2OH)+70%乙醇(C2H6O),電解液溫度為25℃,電解電壓為40伏特,電解拋光時間為1.5分鐘。經電解拋光後的陣列式鋁柱再經電解蝕刻過程用以製得陣列式鋁針尖,(2)電解蝕刻:電解蝕刻的條件為:5~20vol.%硝酸(HNO3),電解液溫度為2~40℃,電解電壓為5~50伏特,電解拋光時間為0.5~5分鐘,較佳的電解蝕刻操作條件為6vol.%硝酸(HNO3),電解液溫度為25℃,電解電壓為30伏特,電解拋光時間為1分鐘。(3)陽極處理:陽極處理的電解液主要以硫酸、磷酸、或草酸為主。利用1~10vol.%(體積百分比)硫酸水溶液為電解液、外加5~25伏特直流電壓、陽極處理時間0.1~1小時、電解液溫度為0~15℃、可使陣列式鋁針尖表面反應產生孔洞介於10~30nm孔洞結構之三氧化二鋁薄膜。利用1~5wt.%(重量百分比)草酸水溶液為電解液、外加20~60伏特直流電壓、陽極處理時間0.1~1小時、電解液 溫度為0~25℃、可使金屬鋁線表面反應產生孔洞介於30~100nm孔洞結構之三氧化二鋁薄膜,利用1~3vol.%(體積百分比)磷酸水溶液為電解液、外加100~200伏特直流電壓、陽極處理時間0.1~1小時、電解液溫度為-8~15℃、可使鋁線表面反應產生孔洞介於100~500nm孔洞結構之三氧化二鋁薄膜。經過電解拋光、電解蝕刻、陽極處理後陣列式鋁針尖表面具有大表面積的多孔性氧化鋁膜披覆,如第五圖所示,將此針尖插入有色染料中可觀察到顏色飽和的染料吸附於針尖上。 In this example, the surface of the arrayed aluminum column is subjected to electrolytic polishing of the surface-washed aluminum column to provide a smooth surface comprising three steps: electrolytic polishing, electrolytic etching, and anodizing. (1) Electropolishing : The conditions of electrolytic polishing are: 5~20% perchloric acid (HClO 4 ) + 5~20% monobutyl ether ethylene diester (CH 3 (CH 2 ) 3 OCH 2 CH 2 OH) +85 ~95% ethanol (C 2 H 6 O), electrolyte temperature is 2~40 °C, electrolysis voltage is 5~50 volts, electropolishing time is 1~5 minutes, better electropolishing operation condition is 15% perchlorination Acid (HClO 4 ) + 15% monobutyl ether ethylene diester (CH 3 (CH 2 ) 3 OCH 2 CH 2 OH) + 70% ethanol (C 2 H 6 O), electrolyte temperature is 25 ° C, electrolysis voltage is 40 volts, electropolishing time is 1.5 minutes. The electrolytically polished array of aluminum pillars is then subjected to an electrolytic etching process to obtain an array of aluminum needle tips. (2) Electrolytic etching : electrolytic etching conditions are: 5-20 vol.% nitric acid (HNO 3 ), and the electrolyte temperature is 2~40°C, the electrolysis voltage is 5~50 volts, the electropolishing time is 0.5~5 minutes, the preferred electrolytic etching operation condition is 6vol.% nitric acid (HNO 3 ), the electrolyte temperature is 25 ° C, and the electrolysis voltage is 30 Volt, electropolishing time is 1 minute. (3) Anode treatment : The electrolyte treated by the anode is mainly sulfuric acid, phosphoric acid, or oxalic acid. Using 1~10 vol.% (volume percent) sulfuric acid aqueous solution as electrolyte, adding 5~25 volts DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature 0~15 °C, the surface of the array aluminum needle tip can be reacted The aluminum oxide film having a pore structure of 10 to 30 nm is formed. Using 1~5wt.% (% by weight) aqueous solution of oxalic acid as electrolyte, adding 20~60V DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature 0~25°C, can make the surface of metal aluminum wire react to produce holes The aluminum oxide film of 30~100nm pore structure uses 1~3vol.% (volume%) phosphoric acid aqueous solution as electrolyte, plus 100~200 volts DC voltage, anode treatment time 0.1~1 hour, electrolyte temperature is -8~15 °C, the surface of the aluminum wire can be reacted to produce a film of aluminum oxide having a hole structure of 100-500 nm. After electrolytic polishing, electrolytic etching, and anodic treatment, the surface of the aluminum tip of the array has a large surface area of porous alumina film, as shown in the fifth figure, the color of the dye is observed by inserting the tip into the colored dye. On the tip of the needle.

10‧‧‧金屬基材 10‧‧‧Metal substrate

11‧‧‧多孔性氧化層 11‧‧‧Porous oxide layer

12‧‧‧鋁金屬基材 12‧‧‧Aluminum metal substrate

13‧‧‧多孔性氧化鋁層 13‧‧‧Porous alumina layer

第一圖 一種具有大表面積的金屬針尖之結構圖,(a)示意圖,(b)顯微結構圖。 First figure A structural diagram of a metal tip with a large surface area, (a) schematic, (b) microstructure.

第二圖 鋁線經電解拋光與電解蝕刻後產生鋁針尖外觀。 The second figure shows the appearance of the aluminum tip after electrolytic polishing and electrolytic etching.

第三圖 鋁針經陽極處理後於針尖表面生成一多孔性的氧化鋁膜。 The third figure is anodized to form a porous aluminum oxide film on the surface of the needle tip.

第四圖 鋁針表面可吸附有色染料。 Figure 4 The surface of the aluminum needle can absorb colored dyes.

Claims (10)

一種具有大表面積的金屬針尖,其結構包括:一金屬線材,線材之一端經過電解拋光與電解蝕刻後所形成的針尖,針尖再經陽極處理後所得附著在該針尖表面上的多孔性氧化膜。  A metal needle tip having a large surface area, the structure comprising: a metal wire, a tip of the wire formed by electropolishing and electrolytic etching, and the needle tip is subjected to anodization to obtain a porous oxide film attached to the surface of the needle tip.   一種具有大表面積的金屬針尖,其針尖結構為金屬基材,且其外表覆蓋有一層氧化層。  A metal needle tip having a large surface area, the tip structure of which is a metal substrate, and the outer surface thereof is covered with an oxide layer.   如請求項1之一種具有大表面積的金屬針尖,其中金屬線材包括鋁線、鎢線、錫線、鈦線、鋯線、鉬線。  A metal tip having a large surface area as claimed in claim 1, wherein the metal wire comprises an aluminum wire, a tungsten wire, a tin wire, a titanium wire, a zirconium wire, and a molybdenum wire.   如請求項1之一種具有大表面積的金屬針尖,其中多孔性氧化膜包括鋁氧化膜、鎢氧化膜、錫氧化膜、鈦氧化膜、鋯氧化膜、鉬氧化膜。  A metal tip having a large surface area as claimed in claim 1, wherein the porous oxide film comprises an aluminum oxide film, a tungsten oxide film, a tin oxide film, a titanium oxide film, a zirconium oxide film, and a molybdenum oxide film.   如請求項1之一種具有大表面積的金屬針尖,其中多孔性氧化膜的孔徑尺寸可藉由陽極處理電壓值來控制。  A metal tip having a large surface area as claimed in claim 1, wherein the pore size of the porous oxide film can be controlled by an anode treatment voltage value.   如請求項1之一種具有大表面積的金屬針尖,其中多孔性氧化膜具有奈米或次微米等級的微孔。  A metal tip having a large surface area as claimed in claim 1, wherein the porous oxide film has micropores of a nanometer or submicron order.   如請求項1之一種具有大表面積的金屬針尖,其中針尖包含單根針尖或複數針尖。  A metal tip having a large surface area as claimed in claim 1, wherein the needle tip comprises a single needle tip or a plurality of needle tips.   如請求項5之一種具有大表面積的金屬針尖,其中所述之複數針尖包含是陣列型針尖。  A metal tip having a large surface area as claimed in claim 5, wherein the plurality of needle tips comprise an array type needle tip.   如請求項1之一種具有大表面積的金屬針尖,該針尖具有吸附與釋放染料、藥物、檢測劑的功能。  A metal tip having a large surface area as claimed in claim 1, the needle tip having a function of adsorbing and releasing a dye, a drug, and a detecting agent.   如請求項1之一種具有大表面積的金屬針尖,其中針尖的尺寸介於微米與奈米等級之間。  A metal tip having a large surface area as claimed in claim 1, wherein the size of the tip is between the micron and nanometer grades.  
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110484962A (en) * 2019-08-14 2019-11-22 东南大学 Automation array nanometer pinpoint electrochemistry prepares platform and preparation method
TWI853381B (en) * 2022-02-10 2024-08-21 日商松下知識產權經營股份有限公司 Tungsten wire and metal mesh

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110484962A (en) * 2019-08-14 2019-11-22 东南大学 Automation array nanometer pinpoint electrochemistry prepares platform and preparation method
TWI853381B (en) * 2022-02-10 2024-08-21 日商松下知識產權經營股份有限公司 Tungsten wire and metal mesh

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