TW201904011A - Electronic package and method of manufacture thereof - Google Patents
Electronic package and method of manufacture thereof Download PDFInfo
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- TW201904011A TW201904011A TW106119628A TW106119628A TW201904011A TW 201904011 A TW201904011 A TW 201904011A TW 106119628 A TW106119628 A TW 106119628A TW 106119628 A TW106119628 A TW 106119628A TW 201904011 A TW201904011 A TW 201904011A
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- H10W74/114—
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- H10W90/754—
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Abstract
一種電子封裝件及其製法,係於第一線路結構上設置電子元件與複數不同高度之導電柱與支撐件,再將塊體設於支撐件上,之後形成包覆該電子元件、塊體、支撐件與導電柱之包覆層,使該電子元件外圍覆蓋有塊體與支撐件,以於該電子封裝件運作時,避免該電子元件遭受外界之電磁干擾。 An electronic package and a method for manufacturing the same, wherein an electronic component and a plurality of conductive pillars and supporting members of different heights are disposed on the first circuit structure, and then the block body is disposed on the support member, and then the electronic component, the block body is formed, The cover of the support member and the conductive post is such that the periphery of the electronic component is covered with the block and the support member to prevent the electronic component from being subjected to external electromagnetic interference when the electronic package is operated.
Description
本發明係有關一種封裝技術,尤指一種避免電磁干擾之半導體封裝件及其製法。 The invention relates to a packaging technology, in particular to a semiconductor package for avoiding electromagnetic interference and a method for manufacturing the same.
隨著電子產業的蓬勃發展,電子產品也逐漸邁向多功能、高性能的趨勢。為了滿足電子產品及設於其中之電子封裝件微型化(miniaturization)的需求,遂發展出晶片尺寸封裝件(Chip Scale Package,CSP)之技術,其特徵在於此種晶片尺寸封裝件僅具有與晶片尺寸相等或略大之尺寸。 With the rapid development of the electronics industry, electronic products are gradually moving towards multi-functional and high-performance trends. In order to meet the demand for electronic products and miniaturization of electronic packages disposed therein, a technology for developing a chip scale package (CSP) is characterized in that the wafer size package has only a wafer and a wafer. Dimensions of equal or slightly larger size.
第1A至1E圖係為習知晶片尺寸封裝件1之製法之剖面示意圖。 1A to 1E are schematic cross-sectional views showing a method of manufacturing a conventional wafer size package 1.
如第1A圖所示,形成一熱化離形膠層(thermal release tape)100於一承載件10上。 As shown in FIG. 1A, a thermal release tape 100 is formed on a carrier 10.
接著,置放複數半導體元件11於該熱化離形膠層100上,該些半導體元件11具有相對之作用面11a與非作用面11b,各該作用面11a上均具有複數電極墊110,且各該作用面11a黏著於該熱化離形膠層100上。 Next, a plurality of semiconductor elements 11 are disposed on the thermal release layer 100, and the semiconductor elements 11 have opposing surfaces 11a and 11b, each of which has a plurality of electrode pads 110, and Each of the active surfaces 11a is adhered to the heated release layer 100.
如第1B圖所示,形成一封裝膠體14於該熱化離形膠 層100上,以包覆該半導體元件11。 As shown in Fig. 1B, an encapsulant 14 is formed on the thermal release adhesive layer 100 to coat the semiconductor element 11.
如第1C圖所示,烘烤該封裝膠體14以硬化該熱化離形膠層100並移除該熱化離形膠層100與該承載件10,以外露出該半導體元件11之作用面11a。 As shown in FIG. 1C, the encapsulant 14 is baked to harden the thermal release layer 100 and the decarburized layer 100 and the carrier 10 are removed, and the active surface 11a of the semiconductor element 11 is exposed. .
如第1D圖所示,形成一線路結構16於該封裝膠體14與該半導體元件11之作用面11a上,令該線路結構16電性連接該電極墊110。接著,形成一絕緣保護層18於該線路結構16上,且該絕緣保護層18外露該線路結構16之部分表面,以供結合如銲球之導電元件17。 As shown in FIG. 1D, a wiring structure 16 is formed on the encapsulating body 14 and the active surface 11a of the semiconductor component 11, so that the wiring structure 16 is electrically connected to the electrode pad 110. Next, an insulating protective layer 18 is formed on the wiring structure 16, and the insulating protective layer 18 exposes a portion of the surface of the wiring structure 16 for bonding the conductive elements 17 such as solder balls.
如第1E圖所示,沿如第1D圖所示之切割路徑L進行切單製程,以獲取複數個晶片尺寸封裝件1。 As shown in FIG. 1E, a singulation process is performed along the dicing path L as shown in FIG. 1D to obtain a plurality of wafer-sized packages 1.
惟,習知晶片尺寸封裝件1中,其僅能將半導體元件11置放於單一層中,故終端產品之應用受到大幅的限制。據此,業界遂開發出立體式之晶圓級系統封裝(Wafer Level System in Package,簡稱WLSiP)結構,以符合現今終端產品應用之需求。 However, in the conventional wafer-sized package 1, it is only possible to place the semiconductor element 11 in a single layer, so that the application of the terminal product is greatly limited. Accordingly, the industry has developed a three-dimensional Wafer Level System in Package (WLSiP) structure to meet the needs of today's terminal product applications.
第2A至2E圖係為習知WLSiP型式電子封裝件2之製法的剖面示意圖。 2A to 2E are schematic cross-sectional views showing a manufacturing method of a conventional WLSiP type electronic package 2.
如第2A圖所示,於一具有離型層90及結合層91之承載板9上結合一第一線路結構20,該第一線路結構20具有相對之第一側20a與第二側20b並以其第二側20b結合至該結合層91上,且該第一線路結構20包括有第一絕緣層200與設於該第一絕緣層200上之第一線路重佈層(redistribution layer,簡稱RDL)201。 As shown in FIG. 2A, a first circuit structure 20 is bonded to a carrier board 9 having a release layer 90 and a bonding layer 91. The first circuit structure 20 has a first side 20a and a second side 20b. The second side 20b is bonded to the bonding layer 91, and the first circuit structure 20 includes a first insulating layer 200 and a first redistribution layer (redistribution layer) disposed on the first insulating layer 200. RDL) 201.
接著,於該第一側20a上形成複數電性連接該第一線路結構20之導電柱23,且設置第一電子元件21於該第一線路結構20之第一側20a上。該第一電子元件21具有相對之作用面21a與非作用面21b,該第一電子元件21係以其非作用面21b藉由一結合層214黏固於該第一線路結構20之第一側20a上,而該作用面21a具有複數電極墊210,其上形成有導電體212,另於該作用面21a上形成有一絕緣層211,以令該絕緣層211覆蓋該些電極墊210與該些導電體212。 Then, a plurality of conductive pillars 23 electrically connected to the first line structure 20 are formed on the first side 20a, and the first electronic component 21 is disposed on the first side 20a of the first line structure 20. The first electronic component 21 has an opposite active surface 21a and an inactive surface 21b. The first electronic component 21 is adhered to the first side of the first circuit structure 20 by a bonding layer 214. 20a, the active surface 21a has a plurality of electrode pads 210, and a conductive body 212 is formed thereon, and an insulating layer 211 is formed on the active surface 21a to cover the electrode pads 210 and the insulating layer 211. Conductor 212.
如第2B圖所示,形成一包覆層25於該第一線路結構20之第一側20a上,以包覆該第一電子元件21與該些導電柱23,且令該包覆層25之表面齊平該絕緣層211之表面、該導電柱23之端面與該導電體212之端面,使該絕緣層211之表面、該導電柱23之端面與該導電體212之端面外露出該包覆層25。 As shown in FIG. 2B, a cladding layer 25 is formed on the first side 20a of the first circuit structure 20 to cover the first electronic component 21 and the conductive pillars 23, and the cladding layer 25 is formed. The surface of the insulating layer 211 is flush with the surface of the insulating layer 211 and the end surface of the conductive body 212, so that the surface of the insulating layer 211, the end surface of the conductive pillar 23 and the end surface of the conductive body 212 are exposed. Cover 25.
如第2C圖所示,形成一第二線路結構26於該包覆層25上,且令該第二線路結構26電性連接該些導電柱23與該導電體212,其中,該第二線路結構26係包括複數第二絕緣層260,260’及設於該第二絕緣層260,260’上之複數第二線路重佈層(RDL)261,261’。 As shown in FIG. 2C, a second line structure 26 is formed on the cladding layer 25, and the second line structure 26 is electrically connected to the conductive pillars 23 and the conductor 212. The second line is electrically connected. The structure 26 includes a plurality of second insulating layers 260, 260' and a plurality of second line redistribution layers (RDL) 261, 261' disposed on the second insulating layer 260, 260'.
如第2D圖所示,移除該承載板9及其上之離型層90。接著,形成一絕緣保護層28於該結合層91上,再形成複數開孔於該絕緣保護層28與該結合層91中,以令該第一線路重佈層201之部分表面外露於該些開孔,俾供結合複 數如銲球之導電元件27於該第一線路結構20之第二側20b上,以接置第二電子元件22。 As shown in Fig. 2D, the carrier sheet 9 and the release layer 90 thereon are removed. Then, an insulating protective layer 28 is formed on the bonding layer 91, and a plurality of openings are formed in the insulating protective layer 28 and the bonding layer 91 to expose a part of the surface of the first circuit redistribution layer 201. An opening is provided for bonding a plurality of conductive elements 27 such as solder balls to the second side 20b of the first line structure 20 to receive the second electronic component 22.
如第2E圖所示,形成一封裝層24於該第一線路結構20之第二側20b上,以包覆該些第二電子元件22。接著,形成一凸塊底下金屬層(Under Bump Metallurgy,簡稱UBM)270於最外層之第二線路重佈層261’上,以形成複數如銲球之導電元件27’,俾供接置如封裝結構或晶片等電子裝置(圖略)。 As shown in FIG. 2E, an encapsulation layer 24 is formed on the second side 20b of the first line structure 20 to encapsulate the second electronic components 22. Next, an under bump metallurgy (UBM) 270 is formed on the outermost second line redistribution layer 261' to form a plurality of conductive elements 27' such as solder balls. Electronic devices such as structures or wafers (not shown).
然而,習知電子封裝件2於運作時,位於該第一與第二線路結構20,26之間的第一電子元件21對於外界電磁波非常敏感,不僅會使該第一電子元件21無法進行正常運作,且外界電磁波亦有可能損毀該第一電子元件21。 However, when the conventional electronic package 2 is in operation, the first electronic component 21 located between the first and second circuit structures 20, 26 is very sensitive to external electromagnetic waves, which not only makes the first electronic component 21 impossible to perform normally. It operates, and external electromagnetic waves may also damage the first electronic component 21.
因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the various problems of the above-mentioned prior art has become a problem that is currently being solved.
鑒於上述習知技術之缺失,本發明提供一種電子封裝件,係包括:第一線路結構,係具有相對之第一側與第二側;複數導電柱,係設於該第一側上並電性連接該第一線路結構;複數支撐件,係設於該第一線路結構之第一側上;電子元件,係結合並電性連接至該第一線路結構之第一側上;塊體,係設於該支撐件上以遮蓋該電子元件;包覆層,係形成於該第一線路結構之第一側上,以包覆該電子元件、塊體、支撐件與該導電柱;以及第二線路結構,係形成於該包覆層上且電性連接該導電柱。 In view of the above-mentioned deficiencies of the prior art, the present invention provides an electronic package comprising: a first line structure having opposite first and second sides; and a plurality of conductive posts disposed on the first side and electrically The first line structure is connected to the first line structure; the plurality of support members are disposed on the first side of the first line structure; the electronic component is coupled and electrically connected to the first side of the first line structure; The cover member is disposed on the support member to cover the electronic component; the cladding layer is formed on the first side of the first circuit structure to cover the electronic component, the block body, the support member and the conductive pillar; The two-line structure is formed on the cladding layer and electrically connected to the conductive pillar.
本發明亦提供一種電子封裝件之製法,係包括:提供一具有相對之第一側與第二側之第一線路結構,且於該第一側上形成有複數導電柱與複數支撐件,並接置有至少一電子元件;設置塊體於該支撐件上,以令該塊體遮蓋該電子元件;形成包覆層於該第一線路結構之第一側上,以令該包覆層包覆該電子元件、該塊體、該支撐件與該導電柱;以及形成第二線路結構於該包覆層上,且令該第二線路結構電性連接該導電柱。 The invention also provides a method for manufacturing an electronic package, comprising: providing a first line structure having opposite first and second sides, and forming a plurality of conductive columns and a plurality of support members on the first side, and Locating at least one electronic component; providing a block on the support member to cover the electronic component; forming a cladding layer on the first side of the first circuit structure to allow the cladding layer to be wrapped And covering the electronic component, the block, the support member and the conductive pillar; and forming a second circuit structure on the cladding layer, and electrically connecting the second circuit structure to the conductive pillar.
前述之製法中,設置該塊體之製程係包括:結合一導電蓋件於該導電柱與該支撐件上,其中,該導電蓋件包含設於該支撐件上之該塊體及藉由複數支架連接該塊體之框架,且該框架設於該導電柱上;以及於形成該包覆層後,移除該框架。進一步,可於形成該包覆層後,一併移除該支架。 In the above method, the process of providing the block includes: bonding a conductive cover member to the conductive post and the support member, wherein the conductive cover member comprises the block disposed on the support member and by the plurality A bracket is coupled to the frame of the block, and the frame is disposed on the conductive post; and after the cover layer is formed, the frame is removed. Further, the stent may be removed after the coating layer is formed.
前述之電子封裝件及其製法中,該電子元件係以覆晶方式設於該第一線路結構上。 In the above electronic package and method of manufacturing the same, the electronic component is provided on the first line structure in a flip chip manner.
前述之電子封裝件及其製法中,該支撐件相對該第一側之高度係小於該導電柱相對該第一側之高度。 In the above electronic package and method of manufacturing the same, the height of the support relative to the first side is less than the height of the conductive post relative to the first side.
前述之電子封裝件及其製法中,該支撐件係位於該電子元件與該導電柱之間。 In the foregoing electronic package and method of manufacturing the same, the support member is located between the electronic component and the conductive post.
前述之電子封裝件及其製法中,該支撐件係用以接地。 In the foregoing electronic package and method of manufacturing the same, the support is used for grounding.
前述之電子封裝件及其製法中,形成該支撐件與塊體之材質係為導電材。 In the above electronic package and the method of manufacturing the same, the material forming the support and the block is a conductive material.
前述之電子封裝件及其製法中,該塊體之頂面係外露出該包覆層。 In the above electronic package and the method of manufacturing the same, the top surface of the block exposes the cladding layer.
前述之電子封裝件及其製法中,該第二線路結構連接該塊體。 In the foregoing electronic package and method of manufacturing the same, the second line structure is connected to the block.
前述之電子封裝件及其製法中,復包括形成複數導電元件於該第一線路結構之第二側上。 In the foregoing electronic package and method of manufacturing the same, the method further includes forming a plurality of conductive elements on the second side of the first line structure.
前述之電子封裝件及其製法中,復包括形成複數導電元件於該第二線路結構上。 In the foregoing electronic package and method of manufacturing the same, the method further comprises forming a plurality of conductive elements on the second line structure.
由上可知,本發明之電子封裝件及其製法,主要藉由該塊體與支撐件之設計,使該電子元件外圍覆蓋有屏蔽結構,以於運作該電子封裝件時,該電子元件不會遭受外界之電磁干擾。 It can be seen from the above that the electronic package of the present invention and the manufacturing method thereof are mainly provided by the design of the block and the support member, so that the periphery of the electronic component is covered with a shielding structure, so that when the electronic package is operated, the electronic component does not Subject to electromagnetic interference from the outside world.
再者,本發明利用金屬框架作成屏蔽用之塊體,因而無需以電鍍或濺渡方式形成金屬屏蔽層,不僅能降低製程成本,且能維持電子產品之一致性。 Furthermore, the present invention utilizes a metal frame as a block for shielding, so that it is not necessary to form a metal shield layer by electroplating or splashing, which not only reduces the process cost, but also maintains the consistency of the electronic product.
1‧‧‧晶片尺寸封裝件 1‧‧‧ Wafer size package
10‧‧‧承載件 10‧‧‧ Carrier
100‧‧‧熱化離形膠層 100‧‧‧heating release layer
11‧‧‧半導體元件 11‧‧‧Semiconductor components
11a,21a,31a‧‧‧作用面 11a, 21a, 31a‧‧‧ action surface
11b,21b,31b‧‧‧非作用面 11b, 21b, 31b‧‧‧ non-active surface
110,210,310‧‧‧電極墊 110,210,310‧‧‧electrode pads
14‧‧‧封裝膠體 14‧‧‧Package colloid
16‧‧‧線路結構 16‧‧‧Line structure
17,27,27’,37,37’‧‧‧導電元件 17,27,27’,37,37’‧‧‧Conductive components
18,28,38‧‧‧絕緣保護層 18,28,38‧‧‧Insulating protective layer
2,3‧‧‧電子封裝件 2,3‧‧‧Electronic package
20,30‧‧‧第一線路結構 20,30‧‧‧First line structure
20a,30a‧‧‧第一側 20a, 30a‧‧‧ first side
20b,30b‧‧‧第二側 20b, 30b‧‧‧ second side
200,300‧‧‧第一絕緣層 200,300‧‧‧first insulation
201,301‧‧‧第一線路重佈層 201,301‧‧‧First line redistribution
21‧‧‧第一電子元件 21‧‧‧First electronic components
211,311‧‧‧絕緣層 211,311‧‧‧Insulation
212,312‧‧‧導電體 212,312‧‧‧Electrical conductor
214,91‧‧‧結合層 214,91‧‧‧bonding layer
22‧‧‧第二電子元件 22‧‧‧Second electronic components
23,33‧‧‧導電柱 23,33‧‧‧conductive pillar
24‧‧‧封裝層 24‧‧‧Encapsulation layer
25,35‧‧‧包覆層 25,35‧‧" cladding
26,36‧‧‧第二線路結構 26, 36‧‧‧Second line structure
260,260’,360,360’‧‧‧第二絕緣層 260,260',360,360'‧‧‧second insulation
261,261’,361,361’‧‧‧第二線路重佈層 261,261’,361,361’‧‧‧Second line redistribution
270,370‧‧‧凸塊底下金屬層 270,370‧‧‧Metal under the bump
31‧‧‧電子元件 31‧‧‧Electronic components
311‧‧‧銲錫凸塊 311‧‧‧ solder bumps
311a‧‧‧銅塊 311a‧‧‧brass
32‧‧‧導電蓋件 32‧‧‧Electrical cover
320‧‧‧塊體 320‧‧‧ Block
321‧‧‧框架 321‧‧‧Frame
321’‧‧‧支架 321’‧‧‧ bracket
34‧‧‧支撐件 34‧‧‧Support
4‧‧‧電子裝置 4‧‧‧Electronic devices
40‧‧‧晶片 40‧‧‧ wafer
9‧‧‧承載板 9‧‧‧Loading board
90‧‧‧離型層 90‧‧‧ release layer
L,S‧‧‧切割路徑 L, S‧‧‧ cutting path
H,h‧‧‧高度 H, h‧‧‧ height
第1A至1E圖係為習知晶片尺寸封裝件之製法之剖面示意圖;第2A至2E圖係為習知WLSiP型式電子封裝件之製法的剖面示意圖;第3A至3G圖係為本發明之電子封裝件之製法的剖面示意圖;第3C’圖係為對應第3C圖之局部上視平面圖;以及第3D’圖係為對應第3D圖之另一實施例之剖面示意 圖。 1A to 1E are schematic cross-sectional views showing a conventional method for fabricating a wafer-sized package; FIGS. 2A to 2E are schematic cross-sectional views showing a method of manufacturing a conventional WLSiP type electronic package; and FIGS. 3A to 3G are diagrams showing the electron of the present invention; A schematic cross-sectional view of a method of fabricating a package; a 3C' view is a partial top plan view corresponding to FIG. 3C; and a 3D' view is a cross-sectional view of another embodiment corresponding to the 3D view.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「第一」、「第二」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. The technical content disclosed in the invention can be covered. In the meantime, the terms "upper", "first", "second" and "one" are used in the description, and are not intended to limit the scope of the invention. Changes or adjustments in the relative relationship are considered to be within the scope of the present invention.
第3A至3G圖係為本發明之電子封裝件3之製法的剖面示意圖。 3A to 3G are schematic cross-sectional views showing the manufacturing method of the electronic package 3 of the present invention.
如第3A圖所示,於一承載板9上形成具有相對之第一側30a與第二側30b之第一線路結構30,並該第一側30a上形成有複數導電柱33與複數支撐件34,且以該第二側30b結合至該承載板9上。 As shown in FIG. 3A, a first line structure 30 having a first side 30a and a second side 30b opposite to each other is formed on a carrier board 9, and a plurality of conductive pillars 33 and a plurality of support members are formed on the first side 30a. 34, and the second side 30b is coupled to the carrier plate 9.
於本實施例中,該承載板9係為如玻璃之半導體材質之圓形板體,其上以例如塗佈方式依序形成有一離型層90 與一結合層91,以供該第一線路結構30設於該結合層91上。 In this embodiment, the carrier board 9 is a circular plate body made of a semiconductor material such as glass, and a release layer 90 and a bonding layer 91 are sequentially formed on the substrate for coating, for example, for the first line. Structure 30 is provided on the bonding layer 91.
再者,該第一線路結構30係包括至少一第一絕緣層300與設於該第一絕緣層300上之一第一線路重佈層(redistribution layer,簡稱RDL)301。具體地,形成該第一線路重佈層301之材質係例如銅,且形成該第一絕緣層300之材質係為介電材,例如聚對二唑苯(Polybenzoxazole,簡稱PBO)、聚醯亞胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)。 Furthermore, the first circuit structure 30 includes at least one first insulating layer 300 and a first redistribution layer (RDL) 301 disposed on the first insulating layer 300. Specifically, the material forming the first circuit redistribution layer 301 is, for example, copper, and the material forming the first insulating layer 300 is a dielectric material, such as polybenzoxazole (PBO), polyphthalate. Polyimide (PI), Prepreg (PP).
又,該導電柱33係設於該第一線路重佈層301上以電性連接該第一線路重佈層301,且形成該導電柱33之材質係為如銅之金屬材或銲錫材。 Moreover, the conductive pillar 33 is disposed on the first circuit redistribution layer 301 to electrically connect the first circuit redistribution layer 301, and the material of the conductive pillar 33 is made of a metal material such as copper or a solder material.
另外,該支撐件34係設於該第一線路重佈層301上以作為接地用,且形成該支撐件34之材質係為如銅之金屬材或銲錫材,並使該些導電柱33圍繞於該些支撐件34外圍,其中,該支撐件34相對該第一側30a之高度h係小於該導電柱33相對該第一側30a之高度H。 In addition, the support member 34 is disposed on the first circuit redistribution layer 301 for grounding, and the material forming the support member 34 is a metal material such as copper or a solder material, and the conductive pillars 33 are surrounded. On the periphery of the support members 34, the height h of the support member 34 relative to the first side 30a is smaller than the height H of the conductive post 33 relative to the first side 30a.
具體地,於本實施例中該支撐件34係為柱狀(亦可為片狀),其可與該導電柱33一同製作,例如,Double image製程。詳言之,該導電柱33與該支撐件34可分開製作,例如,可不移除製作該導電柱33之光阻而直接形成製作該支撐件34之光阻,以形成高低柱,再移除該兩層光阻;或者,先形成低柱(該支撐件34)並移除其所用之光阻,再形成高柱(該導電柱33)並移除其所用之光阻;或者移除 製作該導電柱33之光阻再設置另一光阻而形成該支撐件34。因此,有關該導電柱33與該支撐件34之製作方式繁多,並不限前述。 Specifically, in the embodiment, the support member 34 is columnar (also in the form of a sheet), which can be fabricated together with the conductive post 33, for example, a Double image process. In detail, the conductive post 33 can be separately formed from the support member 34. For example, the photoresist of the support member 34 can be directly formed without removing the photoresist formed by the conductive post 33 to form a high and low column, and then removed. The two layers of photoresist; or, first form a low pillar (the support member 34) and remove the photoresist used thereby, form a high pillar (the conductive pillar 33) and remove the photoresist used; or remove the fabrication The photoresist of the conductive pillar 33 is further provided with another photoresist to form the support member 34. Therefore, the conductive post 33 and the support member 34 are manufactured in a wide variety of ways, and are not limited to the foregoing.
如第3B圖所示,結合至少一電子元件31至該第一線路結構30之第一側30a上,且該電子元件31電性連接至該第一線路結構30,並使該些支撐件34圍繞於該電子元件31外圍,以令該支撐件34位於該電子元件31與該導電柱33之間。 As shown in FIG. 3B, at least one electronic component 31 is coupled to the first side 30a of the first circuit structure 30, and the electronic component 31 is electrically connected to the first circuit structure 30, and the support members 34 are Surrounding the periphery of the electronic component 31, the support member 34 is positioned between the electronic component 31 and the conductive pillar 33.
於本實施例中,該電子元件31係為半導體元件係為主動元件、被動元件或其二者組合,且該主動元件係例如半導體晶片,而該被動元件係例如電阻、電容及電感。例如,該電子元件31係為半導體晶片,其具有相對之作用面31a與非作用面31b,該作用面31a具有複數電極墊310,且該電子元件31以覆晶方式(如藉由複數具有銅塊311a之銲錫凸塊311)電性連接該第一線路重佈層301與該電極墊310。 In the present embodiment, the electronic component 31 is a semiconductor component that is an active component, a passive component, or a combination thereof, and the active component is, for example, a semiconductor wafer, and the passive component is, for example, a resistor, a capacitor, and an inductor. For example, the electronic component 31 is a semiconductor wafer having an opposite active surface 31a and a non-active surface 31b. The active surface 31a has a plurality of electrode pads 310, and the electronic component 31 is in a flip chip manner (eg, by a plurality of copper) The solder bump 311) of the block 311a is electrically connected to the first circuit redistribution layer 301 and the electrode pad 310.
如第3C圖所示,結合一導電蓋件32於該導電柱33與該支撐件34上,使該導電蓋件32遮蓋該電子元件30。 As shown in FIG. 3C, a conductive cover member 32 is coupled to the conductive post 33 and the support member 34 such that the conductive cover member 32 covers the electronic component 30.
於本實施例中,該導電蓋件32係為金屬體,其包含框架321與塊體320,該框架321藉由複數支架321’連接該塊體320,如第3C’圖所示,且該框架321連接該導電柱33上,而該塊體320連接該支撐件34上以遮蓋該電子元件30。 In this embodiment, the conductive cover member 32 is a metal body, and includes a frame 321 and a block 320. The frame 321 is connected to the block 320 by a plurality of brackets 321', as shown in FIG. 3C', and The frame 321 is connected to the conductive post 33, and the block 320 is connected to the support member 34 to cover the electronic component 30.
如第3D圖所示,形成一包覆層35於該第一線路結構 30之第一側30a上,以令該包覆層35包覆該電子元件31、該導電蓋件32、該些導電柱33與該些支撐件34,再藉由整平製程,令該導電柱33之端面與該塊體320外露出該包覆層35。 As shown in FIG. 3D, a cladding layer 35 is formed on the first side 30a of the first circuit structure 30, so that the cladding layer 35 covers the electronic component 31, the conductive cover member 32, and the conductive layers. The pillars 33 and the support members 34 are further subjected to a leveling process to expose the end faces of the conductive pillars 33 and the bulk body 320 to the cladding layer 35.
於本實施例中,該包覆層35係為絕緣材,如環氧樹脂(epoxy)之封裝膠體,其可用壓合(lamination)或模壓(molding)之方式形成於該第一線路結構30之第一側30a上。 In this embodiment, the cladding layer 35 is an insulating material, such as an epoxy encapsulant, which may be formed on the first circuit structure 30 by lamination or molding. On the first side 30a.
再者,該整平製程係藉由研磨方式,移除該導電柱33之部分材質、該導電蓋件32之框架321(含支架321’)與該包覆層35之部分材質,令該導電柱33之端面與該塊體320之頂面齊平該包覆層35之表面。 Furthermore, the leveling process removes a portion of the material of the conductive post 33, the frame 321 of the conductive cover member 32 (including the bracket 321'), and a portion of the material of the cladding layer 35 by grinding, so that the conductive material is electrically conductive. The end face of the post 33 is flush with the top surface of the block 320 to the surface of the cover layer 35.
又,該塊體320亦可不外露於該包覆層35之表面。如第3D’圖所示,該框架321可藉由彎折該支架321’以下壓該塊體320,使該框架321與該塊體320形成高度差(stand off high),故當形成該包覆層35於該第一線路結構30之第一側30a上後,該框架321會凸設於該包覆層35外,再藉由整平製程,移除該框架321,使該支架321’與該塊體320埋設於該包覆層35中。 Moreover, the block 320 may not be exposed on the surface of the cladding layer 35. As shown in FIG. 3D', the frame 321 can be pressed against the block 320 by bending the bracket 321' to make the frame 321 and the block 320 stand out high, so when the package is formed After the cladding layer 35 is on the first side 30a of the first circuit structure 30, the frame 321 is protruded from the cladding layer 35, and the frame 321 is removed by the leveling process to make the bracket 321' The block 320 is embedded in the cladding layer 35.
如第3E圖所示,形成一第二線路結構36於該包覆層35上,且令該第二線路結構36電性連接該些導電柱33與該塊體320。 As shown in FIG. 3E, a second wiring structure 36 is formed on the cladding layer 35, and the second wiring structure 36 is electrically connected to the conductive pillars 33 and the bulk 320.
於本實施例中,該第二線路結構36係包括複數第二絕緣層360、及設於該第二絕緣層360上之複數第二線路重 佈層361,且最外層之第二絕緣層360’可作為防銲層,以令最外層之第二線路重佈層361’外露於該防銲層。或者,該第二線路結構36亦可僅包括單一第二絕緣層360及單一第二線路重佈層361。 In this embodiment, the second circuit structure 36 includes a plurality of second insulating layers 360, a plurality of second circuit redistribution layers 361 disposed on the second insulating layer 360, and a second insulating layer 360 of the outermost layer. 'Can be used as a solder resist layer to expose the outermost second line redistribution layer 361' to the solder resist layer. Alternatively, the second line structure 36 may also include only a single second insulating layer 360 and a single second line redistribution layer 361.
再者,形成該第二線路重佈層361,361’之材質係為銅,且形成該第二絕緣層360,360’之材質係為如聚對二唑苯(PBO)、聚醯亞胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)之介電材。 Furthermore, the material of the second circuit redistribution layer 361, 361' is made of copper, and the material of the second insulating layer 360, 360' is formed, for example, poly-p-oxazobenzene (PBO), polyimine (Polyimide, abbreviation PI), prepreg (PP) dielectric material.
如第3F圖所示,移除該承載板9及其上之離型層90。接著,形成一如防銲層之絕緣保護層38於該第一線路結構30之第二側30b上之結合層91上。 As shown in FIG. 3F, the carrier sheet 9 and the release layer 90 thereon are removed. Next, an insulating protective layer 38 such as a solder resist layer is formed on the bonding layer 91 on the second side 30b of the first wiring structure 30.
如第3G圖所示,沿如第3F圖所示之切割路徑S進行切單製程,以完成本發明之電子封裝件3。 As shown in Fig. 3G, a singulation process is performed along the dicing path S as shown in Fig. 3F to complete the electronic package 3 of the present invention.
於本實施例中,可形成一凸塊底下金屬層(UBM)370於最外層之第二線路重佈層361’上,以結合複數如銲球之導電元件37於最外層之第二線路重佈層361’上,俾供接置其它電子結構(如另一封裝件、或如習知第二電子元件22之晶片)。 In this embodiment, a bump under metal layer (UBM) 370 may be formed on the outermost second line redistribution layer 361' to combine a plurality of conductive elements such as solder balls on the outermost layer of the second line. On the layer 361', the cymbal is used to connect other electronic structures (such as another package, or a wafer such as the conventional second electronic component 22).
另外,可形成複數開孔於該絕緣保護層38與該結合層91上,以令該第一線路重佈層301外露於該些開孔,俾供形成複數如銲球之導電元件37’於該第一線路結構30之第二側30b上,以接置如含晶片40之封裝結構或其它電子結構(如另一封裝件或晶片)之電子裝置4。 In addition, a plurality of openings may be formed on the insulating protective layer 38 and the bonding layer 91 to expose the first circuit redistribution layer 301 to the openings, for forming a plurality of conductive elements 37' of solder balls. The second side 30b of the first line structure 30 is connected to an electronic device 4 such as a package structure containing a wafer 40 or other electronic structure such as another package or wafer.
因此,本發明之電子封裝件3之製法係藉由該導電蓋 件32之塊體320作為屏蔽結構,以阻隔外界電磁波對於該第一與第二線路結構30,36之間的電子元件31的干擾,使本發明之電子元件31得以正常運作,且能避免外界電磁波損毀該電子元件31。 Therefore, the electronic package 3 of the present invention is formed by using the block 320 of the conductive cover member 32 as a shielding structure to block external electromagnetic waves from the electronic component 31 between the first and second line structures 30, 36. The interference allows the electronic component 31 of the present invention to operate normally, and the external electromagnetic wave can be prevented from damaging the electronic component 31.
再者,本發明之製法以簡易之金屬框架321上之金屬塊體320作為屏蔽結構,因而無需以電鍍或濺渡方式形成金屬屏蔽層,故可降低製程成本。 Furthermore, the manufacturing method of the present invention uses the metal block 320 on the simple metal frame 321 as a shielding structure, so that it is not necessary to form a metal shielding layer by electroplating or splashing, so that the process cost can be reduced.
又,本發明之製法使該電子封裝件3之外觀大致不變,因而得以維持電子產品之一致性。 Moreover, the method of the present invention makes the appearance of the electronic package 3 substantially unchanged, thereby maintaining the consistency of the electronic product.
本發明亦提供一種電子封裝件3,其包括:一第一線路結構30、複數導電柱33、一電子元件31、一塊體320、複數支撐件34、一包覆層35以及一第二線路結構36。 The invention also provides an electronic package 3 comprising: a first line structure 30, a plurality of conductive columns 33, an electronic component 31, a block 320, a plurality of supports 34, a cladding layer 35 and a second circuit structure 36.
所述之第一線路結構30係具有相對之第一側30a與第二側30b。 The first line structure 30 has opposite first side 30a and second side 30b.
所述之導電柱33係設於該第一側30a上並電性連接該第一線路結構30。 The conductive pillars 33 are disposed on the first side 30a and electrically connected to the first line structure 30.
所述之支撐件34係設於該第一線路結構30之第一側30a上。 The support member 34 is disposed on the first side 30a of the first line structure 30.
所述之第一電子元件31係結合並電性連接至該第一線路結構30。 The first electronic component 31 is coupled and electrically connected to the first line structure 30.
所述之塊體320係設於該支撐件34上並遮蓋該第一電子元件31。 The block 320 is disposed on the support member 34 and covers the first electronic component 31.
所述之包覆層35係形成於該第一線路結構30之第一側30a上,以包覆該電子元件31、塊體320、支撐件34與 該些導電柱33,且令該導電柱33之端面外露於該包覆層35。 The cladding layer 35 is formed on the first side 30a of the first circuit structure 30 to cover the electronic component 31, the block 320, the support member 34 and the conductive pillars 33, and the conductive pillars are The end face of 33 is exposed to the cladding layer 35.
所述之第二線路結構36係形成於該包覆層35上且電性連接該導電柱33。 The second line structure 36 is formed on the cladding layer 35 and electrically connected to the conductive pillars 33.
於一實施例中,該電子元件31係以覆晶方式設於該第一線路結構30之第一側30a上。 In one embodiment, the electronic component 31 is provided on the first side 30a of the first line structure 30 in a flip chip manner.
於一實施例中,該支撐件34相對該第一側30a之高度h係小於該導電柱33相對該第一側30a之高度H。 In one embodiment, the height h of the support member 34 relative to the first side 30a is smaller than the height H of the conductive post 33 relative to the first side 30a.
於一實施例中,該支撐件34係位於該電子元件31與該導電柱33之間。 In an embodiment, the support member 34 is located between the electronic component 31 and the conductive pillar 33.
於一實施例中,該支撐件34係為導電材。 In an embodiment, the support member 34 is a conductive material.
於一實施例中,該塊體320係為導電材。 In one embodiment, the block 320 is a conductive material.
於一實施例中,該塊體320外露於該包覆層35。 In an embodiment, the block 320 is exposed to the cladding layer 35.
於一實施例中,該第二線路結構36連接該塊體320。 In an embodiment, the second line structure 36 is connected to the block 320.
於一實施例中,該電子封裝件3復包括複數導電元件37’,係形成於該第一線路結構30之第二側30b上。 In one embodiment, the electronic package 3 includes a plurality of conductive elements 37' formed on the second side 30b of the first line structure 30.
於一實施例中,該電子封裝件3復包括複數導電元件37,係形成於該第二線路結構36上。 In one embodiment, the electronic package 3 includes a plurality of conductive elements 37 formed on the second line structure 36.
綜上所述,本發明之電子封裝件及其製法,係藉由該塊體與支撐件作為該電子元件之屏蔽結構,避免該電子元件遭受外界之電磁干擾,使該電子封裝件的電性功能得以正常運作。 In summary, the electronic package of the present invention and the method for manufacturing the same are used as the shielding structure of the electronic component by the block and the support member, thereby preventing the electronic component from being subjected to external electromagnetic interference and making the electrical property of the electronic package. The function is working properly.
再者,本發明利用簡易之金屬框架上之塊體作為屏蔽結構,因而無需以電鍍或濺渡方式形成金屬屏蔽層,不僅 能降低製程成本,且能維持電子產品之一致性。 Furthermore, the present invention utilizes a block on a simple metal frame as a shield structure, so that it is not necessary to form a metal shield layer by electroplating or sputtering, which not only reduces process cost but also maintains the consistency of electronic products.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.
Claims (22)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106119628A TWI712147B (en) | 2017-06-13 | 2017-06-13 | Electronic package and method of manufacture thereof |
| CN201710507311.0A CN109087896B (en) | 2017-06-13 | 2017-06-28 | Electronic package and method of making the same |
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| TW106119628A TWI712147B (en) | 2017-06-13 | 2017-06-13 | Electronic package and method of manufacture thereof |
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| TW201904011A true TW201904011A (en) | 2019-01-16 |
| TWI712147B TWI712147B (en) | 2020-12-01 |
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| TW106119628A TWI712147B (en) | 2017-06-13 | 2017-06-13 | Electronic package and method of manufacture thereof |
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| TW (1) | TWI712147B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI712149B (en) * | 2019-08-13 | 2020-12-01 | 矽品精密工業股份有限公司 | Electronic package and method for fabricating the same |
| TWI796180B (en) * | 2022-03-24 | 2023-03-11 | 矽品精密工業股份有限公司 | Electronic packaging and manufacturing method thereof |
| TWI823618B (en) * | 2022-10-14 | 2023-11-21 | 矽品精密工業股份有限公司 | Electronic package |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US9324672B2 (en) * | 2009-08-21 | 2016-04-26 | Stats Chippac, Ltd. | Semiconductor device and method of forming dual-active sided semiconductor die in fan-out wafer level chip scale package |
| US8299595B2 (en) * | 2010-03-18 | 2012-10-30 | Stats Chippac Ltd. | Integrated circuit package system with package stacking and method of manufacture thereof |
| US9129954B2 (en) * | 2013-03-07 | 2015-09-08 | Advanced Semiconductor Engineering, Inc. | Semiconductor package including antenna layer and manufacturing method thereof |
| SG2013083258A (en) * | 2013-11-06 | 2015-06-29 | Thales Solutions Asia Pte Ltd | A guard structure for signal isolation |
| TWI562318B (en) * | 2015-09-11 | 2016-12-11 | Siliconware Precision Industries Co Ltd | Electronic package and fabrication method thereof |
| CN205039151U (en) * | 2015-09-24 | 2016-02-17 | 中芯长电半导体(江阴)有限公司 | Stacked chip package structure |
| TW201717343A (en) * | 2015-11-04 | 2017-05-16 | 華亞科技股份有限公司 | Packaging package component and manufacturing method thereof |
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2017
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI712149B (en) * | 2019-08-13 | 2020-12-01 | 矽品精密工業股份有限公司 | Electronic package and method for fabricating the same |
| TWI796180B (en) * | 2022-03-24 | 2023-03-11 | 矽品精密工業股份有限公司 | Electronic packaging and manufacturing method thereof |
| TWI823618B (en) * | 2022-10-14 | 2023-11-21 | 矽品精密工業股份有限公司 | Electronic package |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109087896A (en) | 2018-12-25 |
| TWI712147B (en) | 2020-12-01 |
| CN109087896B (en) | 2020-11-27 |
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