TW201843861A - Apparatus and method for manufacturing flexible component in which a step of peeling a layered structure from a support substrate by using a cutter is unnecessary - Google Patents
Apparatus and method for manufacturing flexible component in which a step of peeling a layered structure from a support substrate by using a cutter is unnecessary Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 165
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- 238000012545 processing Methods 0.000 claims abstract description 38
- 230000001681 protective effect Effects 0.000 claims description 32
- 239000000853 adhesive Substances 0.000 claims description 28
- 230000001070 adhesive effect Effects 0.000 claims description 28
- 239000003463 adsorbent Substances 0.000 claims description 13
- 239000002245 particle Substances 0.000 claims description 7
- 239000011148 porous material Substances 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 106
- 239000010410 layer Substances 0.000 description 18
- 238000011084 recovery Methods 0.000 description 17
- 238000001179 sorption measurement Methods 0.000 description 13
- 238000005520 cutting process Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000004064 recycling Methods 0.000 description 6
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000037303 wrinkles Effects 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
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Abstract
Description
本發明係關於一種用以製造如有機電致發光元件般之可撓性元件之裝置及方法。 The present invention relates to a device and method for manufacturing a flexible element such as an electroluminescent element.
作為能夠彎曲之可撓性顯示元件,有機電致發光(以下,稱為有機EL(electroluminescence))元件於智慧型手機等電子機器中不斷被廣泛使用。例如,如日本專利特開2011-48374號公報中所記載般,於通常之有機EL元件之製造方法中,於硬質之支撐基板之一個主面上,形成可撓性膜,於該可撓性膜上形成包含下部電極、有機EL部及上部電極之元件層。形成元件層之後,以覆蓋元件層之方式使用接著劑貼附保護薄膜。通常,使用玻璃基板作為支撐基板,使用聚醯亞胺膜作為可撓性膜。 As a flexible display element capable of being bent, an organic electroluminescence (hereinafter referred to as an organic EL (electroluminescence)) element is widely used in electronic devices such as smart phones. For example, as described in Japanese Patent Laid-Open No. 2011-48374, in a general method of manufacturing an organic EL element, a flexible film is formed on one main surface of a rigid support substrate, and the flexibility is An element layer including a lower electrode, an organic EL portion, and an upper electrode is formed on the film. After the element layer is formed, a protective film is attached using an adhesive so as to cover the element layer. Generally, a glass substrate is used as a support substrate, and a polyimide film is used as a flexible film.
於支撐基板上,形成包含可撓性膜、元件層及保護薄膜之層狀構造體之後,自處於層狀構造體之相反側之支撐基板之主面側對可撓性膜照射雷射光。該步驟被稱為雷射剝離(LLO,laser lift-off),藉由對可撓性膜照射雷射光,而支撐基板與可撓性膜之間之密接性降低,能夠將層狀構造體自支撐基板剝離。層狀構造體係以能夠對顯示元件進行多倒角之方式形成,於將層狀構造體自支撐基板剝離之後,進行自層狀構造體切取用作顯示元件之各個部分之步驟。 After the layered structure including the flexible film, the element layer, and the protective film is formed on the support substrate, the flexible film is irradiated with laser light from the main surface side of the support substrate on the opposite side of the layered structure. This step is called laser lift-off (LLO). By irradiating the flexible film with laser light, the adhesiveness between the support substrate and the flexible film is reduced, and the layered structure can be removed. The support substrate is peeled. The layered structure system is formed in such a manner that the display element can be chamfered. After the layered structure is peeled from the supporting substrate, a step of cutting the layered structure from each part of the display element is performed.
[專利文獻1]日本專利特開2011-48374號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2011-48374
於如上所述之有機EL元件之製造方法中,由於保護薄膜之緣部與支撐基板之主面利用接著劑接著,故而為了將層狀構造體自支撐基板剝離,需要於進行LLO之後使用刀具將保護薄膜之緣部自支撐基板剝離之步驟。因使用此種刀具,而有層狀構造體之可撓性膜產生龜裂,或產生微粒之情況。又,於如上所述之有機EL元件之製造方法中,存在如下情況:即便將保護薄膜自支撐基板剝離,亦會因於使刀具自支撐基板離開之後保護薄膜之緣部經由接著劑與支撐基板再附著,而導致無法將層狀構造體自支撐基板順利地剝離。 In the manufacturing method of the organic EL device as described above, the edge portion of the protective film and the main surface of the support substrate are adhered with an adhesive. Therefore, in order to peel the layered structure from the support substrate, it is necessary to use a cutter after A step of peeling the edge of the protective film from the supporting substrate. Due to the use of such a cutter, the flexible film of the layered structure may be cracked or fine particles may be generated. In addition, in the method for manufacturing an organic EL device as described above, even if the protective film is peeled from the supporting substrate, the edge of the protective film is removed from the supporting substrate after the cutter is separated from the supporting substrate via the adhesive and the supporting substrate. Re-adhesion makes it impossible to peel the layered structure from the support substrate smoothly.
進而,於如上所述之有機EL元件之製造方法中,於層狀構造體之剝離步驟後,為了保護層狀構造體,而於自支撐基板剝離之層狀構造體之可撓性膜貼附第2保護薄膜。因此,於有機EL元件之製造方法中,期望省略此種第2保護薄膜相關之步驟。 Furthermore, in the method for manufacturing an organic EL device as described above, after the step of peeling the layered structure, a flexible film of the layered structure that is peeled from the support substrate is attached to protect the layered structure, and is then attached. 2nd protective film. Therefore, in the method of manufacturing an organic EL device, it is desirable to omit steps related to such a second protective film.
另外,於習知之有機EL元件之製造方法中,有自支撐基板剝離之層狀構造體產生皺褶之情況。此種皺褶係導致最終製品之顯示元件之良率變差之原因。 In the conventional method for manufacturing an organic EL device, wrinkles may be generated in a layered structure that is peeled from a support substrate. Such wrinkles cause the yield of the display element of the final product to deteriorate.
本發明提供一種可解決上述問題之至少1個之可撓性元件之製造裝置及製造方法。 The invention provides a flexible device manufacturing method and a manufacturing method capable of solving at least one of the above problems.
本發明之第1可撓性元件製造裝置係對形成於支撐基板之層狀構造體進行處理而製造複數個可撓性元件者,上述層狀構造體包含:可撓性膜,其以與上述支撐基板之一個主面密接之方式形成;元件層,其形成於上述可撓性膜上,用以對上述複數個可撓性元件賦予作為電子元件之功能;及保護薄膜,其經由接著劑以覆蓋上述元件層之方式貼附;上述保護薄膜之緣部係經由上述接著劑而附著於上述支撐基板之一個主面,該可撓性元件製造裝置具備:第1處理站,其進行如下處理,即,使用雷射光將上述層狀構造體切斷,將上述層狀構造體分割為與上述複數個可撓性元件分別對應之複數個元件部分、及殘餘部分;第2處理站,其進行如下處理,即,於利用上述第1處理站將上述層狀構造體處理之後,藉由自上述支撐基板之另一個主面側對上述可撓性膜照射雷射光,而使上述可撓性膜與上述支撐基板之密接性降低,或者,除了上述可撓性膜之緣部以外使上述可撓性膜與上述支撐基板之密接性降低;及夾盤單元,其進行如下處理,即,於利用上述第2處理站將上述層狀構造體處理之後,藉由以於具有由多孔質粒子形成之吸附體之多孔質真空夾盤吸附有上述層狀構造體之狀態下使上述支撐基板與上述多孔質真空夾盤離開,而將上述殘餘部分與上述支撐基板一起自上述多孔質真空夾盤吸附之上述複數個元件部分分離。 The first flexible device manufacturing apparatus of the present invention is a device that processes a layered structure formed on a support substrate to manufacture a plurality of flexible elements. The layered structure includes a flexible film, which is the same as the above. One main surface of the supporting substrate is formed in close contact; an element layer is formed on the above-mentioned flexible film to give the plurality of flexible elements functions as electronic components; and a protective film is passed through an adhesive to The flexible device manufacturing device is provided with a first processing station that performs the following processing. The edge of the protective film is attached to one main surface of the support substrate through the adhesive. That is, the layered structure is cut using laser light, and the layered structure is divided into a plurality of element portions and a residual portion corresponding to the plurality of flexible elements, respectively. The second processing station performs the following steps: After the layered structure is processed by the first processing station, the flexible film is irradiated with laser light from the other main surface side of the support substrate. Light, thereby reducing the adhesiveness between the flexible film and the support substrate, or reducing the adhesiveness between the flexible film and the support substrate except the edge portion of the flexible film; and a chuck unit, This is a process in which the layered structure is processed by the second processing station, and then the layered structure is adsorbed by a porous vacuum chuck having an adsorbent formed of porous particles. In a state, the support substrate is separated from the porous vacuum chuck, and the remaining portion is separated from the plurality of element portions adsorbed by the porous vacuum chuck together with the support substrate.
本發明之第1可撓性元件製造裝置可進而具備第3處理站,該第3處理站進行如下處理,即,於使用上述夾盤單元將上述層狀構造體處理之後,將薄膜貼附於上述多孔質真空夾盤吸附之上述複數個元件部分之各者。 The first flexible device manufacturing apparatus of the present invention may further include a third processing station that processes the layered structure using the chuck unit and then attaches a film to the third processing station. Each of the plurality of element portions adsorbed by the porous vacuum chuck.
本發明之第1可撓性元件製造裝置係對形成於支撐 基板之層狀構造體進行處理而製造複數個可撓性元件者,上述層狀構造體包含:可撓性膜,其以與上述支撐基板之一個主面密接之方式形成;元件層,其形成於上述可撓性膜上,用以對上述複數個可撓性元件賦予作為電子元件之功能;及保護薄膜,其經由接著劑以覆蓋上述元件層之方式貼附;上述保護薄膜之緣部係經由上述接著劑而附著於上述支撐基板之一個主面,該可撓性元件製造裝置具備:多孔質真空夾盤,其於將上述層狀構造體分割為與上述複數個可撓性元件分別對應之複數個元件部分、及殘餘部分之狀態下吸附上述層狀構造體;第1處理站,其進行如下處理,即,於上述多孔質真空夾盤吸附有上述層狀構造體之狀態下,藉由自上述支撐基板之另一個主面側對上述可撓性膜照射雷射光,而使上述可撓性膜與上述支撐基板之密接性降低,或者,除了上述可撓性膜之緣部以外使上述可撓性膜與上述支撐基板之密接性降低;及夾盤單元,其進行如下處理,即,於利用上述第1處理站將上述層狀構造體處理之後,藉由使上述支撐基板與上述多孔質真空夾盤離開,而將上述殘餘部分與上述支撐基板一起自上述多孔質真空夾盤吸附之上述複數個元件部分分離。 The first flexible device manufacturing apparatus of the present invention is a device that processes a layered structure formed on a support substrate to manufacture a plurality of flexible elements. The layered structure includes a flexible film, which is the same as the above. One main surface of the supporting substrate is formed in close contact; an element layer is formed on the above-mentioned flexible film to give the plurality of flexible elements functions as electronic components; and a protective film is passed through an adhesive to The flexible device manufacturing device includes a porous vacuum chuck for attaching the edge of the protective film to one main surface of the support substrate through the adhesive. The layered structure is divided into a plurality of element parts corresponding to the plurality of flexible elements and a residual part, and the layered structure is adsorbed. The first processing station performs the following processing, that is, the porous structure In a state where the above-mentioned layered structure is adsorbed by the mass vacuum chuck, the flexible film is irradiated with laser light from the other main surface side of the support substrate, so that The adhesion between the flexible film and the support substrate is reduced, or the adhesion between the flexible film and the support substrate is reduced except for the edge portion of the flexible film; and the chuck unit is processed as follows, That is, after the layered structure is processed by the first processing station, the support substrate is separated from the porous vacuum chuck, and the remaining portion is removed from the porous vacuum chuck together with the support substrate. The plurality of components adsorbed are separated.
本發明之第1可撓性元件製造裝置可進而具備第2處理站,該第2處理站進行如下處理,即,於使用上述夾盤單元將上述層狀構造體處理之後,將薄膜貼附於上述多孔質真空夾盤吸附之上述複數個元件部分之各者。 The first flexible device manufacturing apparatus of the present invention may further include a second processing station that performs a process of applying the film to the laminar structure using the chuck unit and then processing the layered structure. Each of the plurality of element portions adsorbed by the porous vacuum chuck.
本發明之第2可撓性元件製造裝置係對形成於支撐基板之層狀構造體進行處理而製造複數個可撓性元件者,其具備:1個或者複數個處理站,其等對上述層狀構造體進行處理;第1移 動輸送帶單元,其能夠載置具有由多孔質粒子形成之吸附體之多孔質真空夾盤,沿著第1移動路徑而移動自如地設置;及第2移動輸送帶單元,其能夠載置上述多孔質真空夾盤,沿著第2移動路徑而移動自如地設置;於上述第1移動輸送帶單元與上述第2移動輸送帶單元之間,以可進行上述多孔質真空夾盤之移動之方式構成,上述多孔質真空夾盤係於載置於上述第1移動輸送帶單元之狀態下,接收上述層狀構造體,上述多孔質真空夾盤係於保持有上述層狀構造體之狀態下自上述第1移動輸送帶單元移動至上述第2移動輸送帶單元,上述多孔質真空夾盤係於未保持上述層狀構造體之狀態下自上述第2移動輸送帶單元向上述第1移動輸送帶單元返回。 The second flexible device manufacturing apparatus of the present invention is a device that processes a layered structure formed on a support substrate to manufacture a plurality of flexible devices, and includes one or a plurality of processing stations, and The first structure is processed; the first mobile conveyor belt unit is capable of placing a porous vacuum chuck having an adsorbent formed of porous particles, and is arranged to move freely along the first movement path; and the second mobile conveyor A belt unit capable of mounting the porous vacuum chuck and moving along the second moving path; and provided between the first mobile conveyor belt unit and the second mobile conveyor belt unit so as to allow the porous The porous vacuum chuck is configured to move the porous vacuum chuck in a state where the porous vacuum chuck is placed on the first mobile conveyor belt unit to receive the layered structure, and the porous vacuum chuck is configured to hold the above. The porous structure is moved from the first moving conveyor unit to the second moving conveyor unit in the state of the layered structure, and the porous vacuum chuck is in a state where the layered structure is not held. Moving from said second conveyor to said mobile unit returns the first conveyor means.
本發明之可撓性元件製造方法係對形成於支撐基板之層狀構造體進行處理而製造複數個可撓性元件者,上述層狀構造體包含:可撓性膜,其以與上述支撐基板之一個主面密接之方式形成;元件層,其形成於上述可撓性膜上,用以對上述複數個可撓性元件賦予作為電子元件之功能;及保護薄膜,其經由接著劑以覆蓋上述元件層之方式貼附;上述保護薄膜之緣部係經由上述接著劑而附著於上述支撐基板之一個主面,該可撓性元件之製造方法包含:第1步驟,其係使用雷射光將上述層狀構造體切斷,將上述層狀構造體分割為與上述複數個可撓性元件分別對應之複數個元件部分、及殘餘部分;第2步驟,其係於上述第1步驟後,藉由自上述支撐基板之另一個主面側對上述可撓性膜照射雷射光,而使上述可撓性膜與上述支撐基板之密接性降低,或者,除了上述可撓性膜之緣部以外使上述可撓性膜與上述支撐基板之密接性降低;及第3步驟,其係於上述第2步驟後,藉由以於具有由多孔質粒子形成之吸 附體之多孔質真空夾盤吸附上述層狀構造體之狀態使上述支撐基板與上述多孔質真空夾盤離開,而將上述殘餘部分與上述支撐基板一起自上述多孔質真空夾盤吸附之上述複數個元件部分分離。 The method for manufacturing a flexible element according to the present invention is a method for manufacturing a plurality of flexible elements by processing a layered structure formed on a support substrate. The layered structure includes: a flexible film, which is similar to the support substrate. One of the main surfaces is formed in close contact; an element layer is formed on the flexible film to provide the plurality of flexible elements with a function as an electronic element; and a protective film covers the above via an adhesive. The element layer is attached; the edge of the protective film is attached to one of the main surfaces of the support substrate via the adhesive, and the method for manufacturing the flexible element includes a first step of using laser light to apply the The layered structure is cut, and the layered structure is divided into a plurality of element parts and residual parts corresponding to the plurality of flexible elements, respectively. The second step is after the above first step, by The flexible film is irradiated with laser light from the other main surface side of the support substrate, so that the adhesion between the flexible film and the support substrate is reduced, or in addition to the Except for the edge portion of the flexible film, the adhesiveness between the flexible film and the support substrate is reduced; and the third step is after the second step, and the porous layer has an adsorbent formed of porous particles. Of the laminar structure by the mass vacuum chuck to separate the support substrate from the porous vacuum chuck, and to separate the remaining portion and the support substrate from the plurality of component parts adsorbed by the porous vacuum chuck together with the support substrate. .
本發明之可撓性元件製造方法可進而包含第4步驟,該第4步驟係於上述第3步驟後,將薄膜貼附於上述多孔質真空夾盤吸附之上述複數個元件部分之各者。 The method for manufacturing a flexible device according to the present invention may further include a fourth step. After the third step, a thin film is attached to each of the plurality of device portions adsorbed by the porous vacuum chuck.
根據本發明之第1及第2可撓性元件製造裝置與本發明之可撓性元件製造方法,可無須進行使用刀具將保護薄膜之緣部自支撐基板剝離之步驟。 According to the first and second flexible device manufacturing devices of the present invention and the flexible device manufacturing method of the present invention, it is not necessary to perform a step of peeling the edge portion of the protective film from the support substrate using a cutter.
根據本發明之第1至第3可撓性元件製造裝置與本發明之可撓性元件製造方法,可排除將暫時性的保護薄膜貼附於層狀構造體之可撓性膜側之步驟,進而,不會產生因產生於自支撐基板剝離之層狀構造體之皺褶而導致最終製品之可撓性元件之良率變差之情況。 According to the first to third flexible device manufacturing devices of the present invention and the flexible device manufacturing method of the present invention, the step of attaching a temporary protective film to the flexible film side of the layered structure can be eliminated, Furthermore, there is no case where the yield of the flexible element of the final product is deteriorated due to wrinkles generated in the layered structure peeled from the support substrate.
1‧‧‧層狀構造體 1‧‧‧ layered structure
2‧‧‧保持單元 2‧‧‧ holding unit
3‧‧‧半切站 3‧‧‧ Half Cut Station
4‧‧‧搬送單元 4‧‧‧ transport unit
5‧‧‧第1移動機構 5‧‧‧The first mobile mechanism
6‧‧‧LLO站 6‧‧‧LLO Station
7‧‧‧多孔質真空夾盤平台 7‧‧‧ Porous Vacuum Chuck Platform
8‧‧‧第1移動輸送帶單元 8‧‧‧The first mobile conveyor unit
9‧‧‧第2移動機構 9‧‧‧ 2nd mobile agency
10‧‧‧支撐基板 10‧‧‧ support substrate
11‧‧‧可撓性膜 11‧‧‧ flexible film
12‧‧‧元件層 12‧‧‧ component layer
13‧‧‧接著劑 13‧‧‧ Adhesive
14‧‧‧保護薄膜 14‧‧‧ protective film
15‧‧‧元件部分 15‧‧‧ Components
16‧‧‧殘餘部分 16‧‧‧ stub
17‧‧‧支援薄膜 17‧‧‧ support film
18‧‧‧可撓性元件 18‧‧‧ flexible element
21‧‧‧吸附夾盤 21‧‧‧ Suction Chuck
22‧‧‧支撐部 22‧‧‧ support
23‧‧‧升降引導部 23‧‧‧ Lifting guide
24‧‧‧第1導軌 24‧‧‧ 1st rail
31‧‧‧雷射切斷器 31‧‧‧laser cutter
32‧‧‧雷射頭 32‧‧‧laser head
41‧‧‧基座部 41‧‧‧ base
42‧‧‧支柱部 42‧‧‧ pillar
43‧‧‧貫通孔 43‧‧‧through hole
51‧‧‧滑塊部 51‧‧‧Slider section
52‧‧‧第2導軌 52‧‧‧ 2nd rail
61‧‧‧射束頭 61‧‧‧ Beam Head
71‧‧‧吸附體 71‧‧‧ adsorbent
81‧‧‧第1輸送帶 81‧‧‧The first conveyor belt
82‧‧‧第1可動構件 82‧‧‧The first movable member
91‧‧‧第3導軌 91‧‧‧3rd rail
92‧‧‧第1滑塊 92‧‧‧1st slider
100‧‧‧第1夾盤單元 100‧‧‧The first chuck unit
101‧‧‧第4導軌 101‧‧‧ 4th rail
102‧‧‧吸附墊 102‧‧‧Adsorption pad
103‧‧‧夾盤頭 103‧‧‧Chuck head
104‧‧‧第1臂部 104‧‧‧ 1st arm
110‧‧‧支撐基板回收站 110‧‧‧Support substrate recycling station
120‧‧‧第2移動輸送帶單元 120‧‧‧ 2nd mobile conveyor unit
121‧‧‧第2輸送帶 121‧‧‧ 2nd conveyor belt
122‧‧‧第2可動構件 122‧‧‧The second movable member
130‧‧‧第3移動機構 130‧‧‧ 3rd mobile agency
131‧‧‧第5導軌 131‧‧‧5th rail
132‧‧‧第2滑塊 132‧‧‧ 2nd slider
141‧‧‧第1中間輸送帶 141‧‧‧The first intermediate conveyor belt
142‧‧‧第2中間輸送帶 142‧‧‧Second intermediate conveyor belt
150‧‧‧支援薄膜貼附站 150‧‧‧Support film attachment station
151‧‧‧堆疊器 151‧‧‧Stacker
152‧‧‧剝離機構 152‧‧‧Stripping agencies
153‧‧‧貼附頭 153‧‧‧ attached head
154‧‧‧吸附頭 154‧‧‧Adsorption head
155‧‧‧吸附部 155‧‧‧Adsorption Department
156‧‧‧按壓輥 156‧‧‧Press roller
157‧‧‧帶 157‧‧‧ belt
158‧‧‧攝像裝置 158‧‧‧ Camera
160‧‧‧可撓性元件回收站 160‧‧‧ Flexible Recycling Station
161‧‧‧回收平台 161‧‧‧Recycling platform
170‧‧‧第2夾盤單元 170‧‧‧ 2nd chuck unit
171‧‧‧第6導軌 171‧‧‧6th rail
172‧‧‧吸附夾盤 172‧‧‧Adsorption Chuck
173‧‧‧第2臂部 173‧‧‧ 2nd arm
R‧‧‧旋轉軸 R‧‧‧rotation shaft
圖1係表示本發明之一實施形態之可撓性元件製造裝置之概要之說明圖。 FIG. 1 is an explanatory diagram showing an outline of a flexible device manufacturing apparatus according to an embodiment of the present invention.
圖2係使用於可撓性元件之製造之層狀構造體及支撐基板之剖面圖。 FIG. 2 is a cross-sectional view of a layered structure and a support substrate used for manufacturing a flexible element.
圖3係表示半切步驟中之可撓性元件製造裝置之情況之說明圖。 Fig. 3 is an explanatory view showing a state of a flexible device manufacturing apparatus in a half-cutting step.
圖4係說明利用可撓性元件製造裝置執行之半切步驟之動作之 說明圖。 Fig. 4 is an explanatory diagram illustrating the operation of the half-cut step performed by the flexible device manufacturing apparatus.
圖5係半切步驟後之層狀構造體之俯視圖。 5 is a plan view of the layered structure after the half-cutting step.
圖6係半切步驟後之層狀構造體及支撐基板之剖面圖。 6 is a cross-sectional view of the layered structure and the supporting substrate after the half-cutting step.
圖7係表示LLO步驟中之可撓性元件製造裝置之情況之說明圖。 FIG. 7 is an explanatory view showing a state of a flexible device manufacturing apparatus in an LLO step.
圖8係說明由可撓性元件製造裝置執行之LLO步驟之動作之說明圖。 FIG. 8 is an explanatory diagram illustrating an operation of an LLO step performed by a flexible device manufacturing apparatus.
圖9係表示LLO步驟中之層狀構造體及支撐基板之情況之剖面圖。 FIG. 9 is a cross-sectional view showing a state of a layered structure and a supporting substrate in the LLO step.
圖10係表示支撐基板回收步驟中之可撓性元件製造裝置之情況之說明圖。 FIG. 10 is an explanatory view showing a state of a flexible device manufacturing apparatus in a supporting substrate recovery step.
圖11(a)及圖11(b)係表示支撐基板回收步驟中之層狀構造體及支撐基板之情況之剖面圖。 11 (a) and 11 (b) are cross-sectional views showing the state of the layered structure and the support substrate in the support substrate recovery step.
圖12係說明由可撓性元件製造裝置執行之支撐基板回收步驟、支援薄膜貼附步驟、及可撓性元件取出步驟之動作之說明圖。 FIG. 12 is an explanatory diagram illustrating operations of a supporting substrate recovery step, a supporting film attaching step, and a flexible element taking out step performed by a flexible device manufacturing apparatus.
圖13係表示支援薄膜貼附步驟中之可撓性元件製造裝置之情況之說明圖。 FIG. 13 is an explanatory view showing a case of supporting a flexible device manufacturing apparatus in a film attaching step.
圖14係表示可撓性元件取出步驟中之可撓性元件製造裝置之情況之說明圖。 FIG. 14 is an explanatory view showing a state of a flexible element manufacturing apparatus in a flexible element taking-out step.
以下,使用圖對本發明進行說明。圖1係表示本發明之一實施形態之可撓性元件製造裝置之概要的說明圖,圖2係表示於該可撓性元件製造裝置中使用於可撓性元件之製造之層狀構造體1及支撐基板10之剖面圖。 Hereinafter, the present invention will be described with reference to the drawings. FIG. 1 is an explanatory diagram showing an outline of a flexible device manufacturing apparatus according to an embodiment of the present invention, and FIG. 2 is a layered structure 1 used for manufacturing the flexible device in the flexible device manufacturing apparatus. And a sectional view of the supporting substrate 10.
利用與圖1所示之可撓性元件製造裝置不同地設置之形成裝置(未圖示),如圖2所示,於支撐基板10之一個主面上形成層狀構造體1。層狀構造體1係以具有能夠對由可撓性元件製造裝置製造之可撓性元件進行多倒角之構造及大小之方式形成。層狀構造體1包含:矩形之可撓性膜11,其以與矩形且硬質之支撐基板10之一個主面密接之方式形成;元件層12,其形成於可撓性膜11上,且具有用以實現可撓性元件作為電子元件之功能之構造;及矩形之保護薄膜14,其經由接著劑13以覆蓋元件層12之方式貼附。保護薄膜14之四邊之緣部係經由接著劑13而附著於支撐基板10之主面(亦參照圖5)。 As shown in FIG. 2, a layered structure 1 is formed on a main surface of the support substrate 10 by using a forming device (not shown) provided separately from the flexible device manufacturing device shown in FIG. 1. The layered structure 1 is formed so as to have a structure and a size capable of multi-chamfering a flexible element manufactured by a flexible element manufacturing apparatus. The layered structure 1 includes a rectangular flexible film 11 that is formed in close contact with a main surface of a rectangular and rigid support substrate 10; an element layer 12 that is formed on the flexible film 11 and has A structure for realizing the function of a flexible element as an electronic element; and a rectangular protective film 14 that is adhered to cover the element layer 12 through an adhesive 13. The four edges of the protective film 14 are attached to the main surface of the support substrate 10 via the adhesive 13 (see also FIG. 5).
可撓性膜11係為了支撐元件層12而設置,保護薄膜14係為了保護元件層12免受外部影響而設置。可撓性膜11係以與層狀構造體1之主面密接之方式形成,由例如藉由照射雷射光而與支撐基板10之間之密接性降低之可撓性材料形成。又,支撐基板10由使雷射光透過之材料形成。 The flexible film 11 is provided to support the element layer 12, and the protective film 14 is provided to protect the element layer 12 from external influences. The flexible film 11 is formed so as to be in close contact with the main surface of the layered structure 1, and is formed of a flexible material whose adhesion to the support substrate 10 is reduced by irradiating laser light, for example. The support substrate 10 is formed of a material that transmits laser light.
利用本實施形態之可撓性元件製造裝置製造之可撓性元件例如為於各種電子機器中用作顯示元件之有機EL元件,層狀構造體1之元件層12包含下部電極、有機EL層及上部電極(均未圖示)。可撓性膜11係聚醯亞胺膜,保護薄膜14係透明之聚對苯二甲酸乙二酯(PET)薄膜。作為接著劑13,使用具有熱硬化性或者紫外線硬化性之丙烯酸系或環氧系之接著劑。接著劑13例如以形成為片狀之狀態而覆蓋元件層12之方式配置於支撐基板10上,然後,以覆蓋接著劑13之方式配置保護薄膜14,進行接著劑13之硬化。作為支撐基板10,例如,使用透明之玻璃基板。 The flexible element manufactured by the flexible element manufacturing apparatus of this embodiment is, for example, an organic EL element used as a display element in various electronic devices. The element layer 12 of the layered structure 1 includes a lower electrode, an organic EL layer, and Upper electrode (none shown). The flexible film 11 is a polyimide film, and the protective film 14 is a transparent polyethylene terephthalate (PET) film. As the adhesive 13, an acrylic or epoxy-based adhesive having thermosetting or ultraviolet curing properties is used. The adhesive 13 is placed on the support substrate 10 so as to cover the element layer 12 in a sheet-like state, and then the protective film 14 is disposed so as to cover the adhesive 13, and the adhesive 13 is hardened. As the support substrate 10, for example, a transparent glass substrate is used.
將使用於有機EL元件之多倒角之此種層狀構造體1形成於支撐基板10之方法及形成裝置為公知,故而於本說明書中省略與其等相關之進一步之說明。再者,本發明並不限定於有機EL元件之製造,可應用於能夠以具有如圖2所示之構成之層狀構造體1為基礎而製造之任意可撓性元件之製造。 A method and an apparatus for forming such a multi-chamfered layered structure 1 for use in an organic EL element on a support substrate 10 are well known, and further descriptions related to them are omitted in this specification. Furthermore, the present invention is not limited to the manufacture of organic EL elements, and can be applied to the manufacture of any flexible element that can be manufactured based on the layered structure 1 having the structure shown in FIG. 2.
可撓性元件製造裝置具備保持單元2,該保持單元2係自省略了圖示之形成裝置接收形成有層狀構造體1之支撐基板10並加以保持。保持單元2具備形成為U字狀之吸附夾盤21、支撐部22及升降引導部23。吸附夾盤21之基端側繞水平之旋轉軸R(參照圖8)旋轉自如地安裝於支撐部22,支撐部22於鉛垂方向升降自如地安裝於升降引導部23。 The flexible device manufacturing apparatus includes a holding unit 2 that receives and holds a support substrate 10 on which a layered structure 1 is formed from a forming apparatus (not shown). The holding unit 2 includes a suction chuck 21 formed in a U shape, a support portion 22, and a lifting guide portion 23. The base end side of the suction chuck 21 is rotatably mounted on the support portion 22 about a horizontal rotation axis R (see FIG. 8), and the support portion 22 is rotatably mounted on the lifting guide portion 23 in the vertical direction.
形成有層狀構造體1之支撐基板10如圖2所示使層狀構造體1朝上而保持或吸附於吸附夾盤21。保持單元2使用滾珠螺桿機構或齒條與小齒輪機構等驅動手段(未圖示),沿著水平設置之第1導軌24行走自如地設置。如圖1所示,保持單元2若於第1導軌24之一端側接收支撐基板10,則向朝向第1導軌24之另一端側之方向行走(於圖1中,保持單元2移動之方向由箭頭表示,於其他圖中亦圖示有箭頭,但該等箭頭係說明本實施形態中之可撓性元件製造裝置之構成要素之移動,並非表示該可撓性元件製造裝置之構成要素本身)。 As shown in FIG. 2, the support substrate 10 on which the layered structure 1 is formed is held or adsorbed on the suction chuck 21 with the layered structure 1 facing upward. The holding unit 2 uses a driving means (not shown) such as a ball screw mechanism or a rack and pinion mechanism, and is freely provided along the first guide rail 24 provided horizontally. As shown in FIG. 1, if the holding unit 2 receives the support substrate 10 on one end side of the first guide rail 24, it walks in a direction toward the other end side of the first guide rail 24 (in FIG. 1, the direction in which the holding unit 2 moves is The arrows indicate that arrows are also shown in other figures, but these arrows indicate the movement of the constituent elements of the flexible element manufacturing apparatus in this embodiment, and do not indicate the constituent elements of the flexible element manufacturing apparatus itself) .
可撓性元件製造裝置具備半切站3、用以於保持單元2與半切站3之間搬送支撐基板10之搬送單元4、及用以使搬送單元4移動之第1移動機構5。半切站3具備雷射切斷器31,進行將支撐基板10之層狀構造體1分割為用作可撓性元件之各個元件部 分15、及殘餘部分16之半切步驟。 The flexible device manufacturing apparatus includes a half-cut station 3, a transfer unit 4 for transferring the support substrate 10 between the holding unit 2 and the half-cut station 3, and a first moving mechanism 5 for moving the transfer unit 4. The half-cutting station 3 is provided with a laser cutter 31, and performs a half-cutting step of dividing the layered structure 1 of the support substrate 10 into each element portion 15 serving as a flexible element and the remaining portion 16.
圖3係表示半切步驟中之可撓性元件製造裝置之情況之說明圖(於圖3中,雷射切斷器31之圖示省略)。圖4係說明由可撓性元件製造裝置執行之半切步驟之動作之說明圖。搬送單元4具備基座部41及設置於基座部41之下之支柱部42。於本實施形態中,支柱部42具備呈格子狀豎立設置於其基部(自上方觀察)之9根支柱,於基座部41沿著鉛垂方向開設有與各支柱對應之貫通孔43。 FIG. 3 is an explanatory diagram showing the condition of the flexible device manufacturing apparatus in the half-cutting step (the illustration of the laser cutter 31 is omitted in FIG. 3). FIG. 4 is an explanatory diagram illustrating the operation of the half-cut step performed by the flexible device manufacturing apparatus. The transport unit 4 includes a base portion 41 and a pillar portion 42 provided below the base portion 41. In this embodiment, the pillar portion 42 includes nine pillars erected on the base (viewed from above) in a lattice shape, and through holes 43 corresponding to the pillars are provided in the base portion 41 along the vertical direction.
第1移動機構5係由具有滑動自如地引導滑塊部51之第2導軌52之單軸機器人機構而構成。基座部41相對於滑塊部51固定。又,支柱部42相對於滑塊部51升降自如地構成。 The first moving mechanism 5 is constituted by a single-axis robot mechanism having a second guide rail 52 that slidably guides the slider portion 51. The base portion 41 is fixed to the slider portion 51. In addition, the pillar portion 42 is configured to be freely movable up and down with respect to the slider portion 51.
接收有支撐基板10之保持單元2若於配置於第1導軌24側之狀態之搬送單元4上停止,則支柱部42上升。若支柱部42上升,則支柱部42之各支柱通過基座部41之貫通孔43而自基座部41之上表面突出。支柱部42之各支柱與保持單元2之吸附夾盤21係以相互不干涉之方式配置,故而若支柱部42上升,則保持於吸附夾盤21之支撐基板10自下方被按壓,而自吸附夾盤21卸除。 When the holding unit 2 receiving the support substrate 10 is stopped on the conveying unit 4 in a state of being disposed on the side of the first guide rail 24, the pillar portion 42 rises. When the pillar portion 42 rises, each pillar of the pillar portion 42 protrudes from the upper surface of the base portion 41 through the through hole 43 of the base portion 41. Each pillar of the pillar portion 42 and the suction chuck 21 of the holding unit 2 are arranged so as not to interfere with each other. Therefore, when the pillar portion 42 rises, the support substrate 10 held on the suction chuck 21 is pressed from below and self-sucks. The chuck 21 is removed.
若支撐基板10自吸附夾盤21卸除,則搬送單元4朝向半切站3開始行走,並且藉由支柱部42下降,而將支撐基板10配置於基座部41。基座部41之上表面為水平面,且支撐基板10係使層狀構造體1朝上而載置於基座部41之上表面。 When the support substrate 10 is detached from the suction chuck 21, the conveyance unit 4 starts walking toward the half-cut station 3 and descends by the pillar portion 42 to arrange the support substrate 10 on the base portion 41. The upper surface of the base portion 41 is a horizontal plane, and the support substrate 10 is placed on the upper surface of the base portion 41 with the layered structure 1 facing upward.
雷射切斷器31具備能夠於水平面內移動之雷射頭32,若搬送單元4到達至半切站3,則自雷射頭32放射之雷射光照 射至支撐基板10之層狀構造體1,將層狀構造體1於厚度方向切斷。該雷射光之輸出係以不將支撐基板10切斷之方式進行調整。 The laser cutter 31 includes a laser head 32 capable of moving in a horizontal plane. When the transport unit 4 reaches the half-cut station 3, the laser light emitted from the laser head 32 irradiates the layered structure 1 on the support substrate 10, The layered structure 1 is cut in the thickness direction. The output of the laser light is adjusted so that the support substrate 10 is not cut.
圖5係半切步驟後之層狀構造體1之俯視圖,圖6係以圖5所示之A-A線破斷之半切步驟後之層狀構造體1及支撐基板10之剖面圖。藉由控制雷射頭32之位置與雷射光之開啟/關閉,而將複數個元件部分15相對於層狀構造體1之殘餘部分16切斷或者分割。元件部分15係於層狀構造體1中,以具有使用於可撓性元件之構造之方式形成之部分。於本實施形態中,於層狀構造體1內,矩形之元件部分15配置為5列5行,但於本發明中,層狀構造體1中所包含之元件部分15之數量與配置並不限定於實施形態之數量與配置。再者,於圖5中由斜線表示之區域,保護薄膜14藉由接著劑13而與支撐基板10接著。 FIG. 5 is a plan view of the layered structure 1 after the half-cutting step, and FIG. 6 is a cross-sectional view of the layered structure 1 and the support substrate 10 after the half-cutting step broken by the A-A line shown in FIG. 5. By controlling the position of the laser head 32 and the on / off of the laser light, the plurality of element portions 15 are cut off or divided from the remaining portion 16 of the layered structure 1. The element portion 15 is a portion formed in the layered structure 1 so as to have a structure used for a flexible element. In this embodiment, rectangular element parts 15 are arranged in five columns and five rows in the layered structure 1, but in the present invention, the number and arrangement of the element parts 15 included in the layered structure 1 are not the same. It is limited to the number and arrangement of the embodiments. Further, in a region indicated by diagonal lines in FIG. 5, the protective film 14 is adhered to the support substrate 10 by the adhesive 13.
若層狀構造體1中之所有元件部分15自殘餘部分16切斷,則搬送單元4朝向保持單元2開始行走,並且藉由支柱部42上升,而支撐基板10自基座部41之上表面離開。支撐基板10配置於較吸附夾盤21高之位置,若支撐基板10到達至吸附夾盤21上,則搬送單元4停止。而且,藉由支柱部42下降,而支撐基板10載置於吸附夾盤21,吸附夾盤21保持或吸附支撐基板10。 When all the element portions 15 in the layered structure 1 are cut off from the remaining portion 16, the conveying unit 4 starts to walk toward the holding unit 2 and rises by the pillar portion 42, and the support substrate 10 is lifted from the upper surface of the base portion 41. go away. The support substrate 10 is disposed at a position higher than the suction chuck 21. When the support substrate 10 reaches the suction chuck 21, the transport unit 4 stops. Then, the support portion 10 is lowered, and the support substrate 10 is placed on the suction chuck 21, and the suction chuck 21 holds or suction-holds the support substrate 10.
可撓性元件製造裝置具備進行雷射剝離步驟之LLO站6。LLO站6與半切站3鄰接設置,且具有能夠將雷射光呈帶狀或者線狀地朝下方照射之射束頭61。如圖1及圖3所示,於第1導軌24之另一端側,能夠載置多孔質真空夾盤平台7之第1移動輸送帶單元8於與第1導軌24正交之方向行走自如地設置。驅動第1移動輸送帶單元8之第2移動機構9由具有滑動自如地引導第 1移動輸送帶單元8之第3導軌91(參照圖8)之單軸機器人機構而構成。第3導軌91規定第1移動輸送帶單元8之移動路徑,且通過第1導軌24之下側,以與第1導軌24正交之方式延伸。 The flexible device manufacturing apparatus includes an LLO station 6 that performs a laser peeling step. The LLO station 6 is disposed adjacent to the half-cut station 3, and has a beam head 61 capable of radiating laser light downward in a band shape or a line shape. As shown in FIGS. 1 and 3, on the other end side of the first guide rail 24, the first mobile conveyor unit 8 capable of placing the porous vacuum chuck platform 7 can walk freely in a direction orthogonal to the first guide rail 24. Settings. The second moving mechanism 9 that drives the first moving conveyor unit 8 is constituted by a single-axis robot mechanism having a third guide rail 91 (see Fig. 8) for slidingly guiding the first moving conveyor unit 8. The third guide rail 91 defines a movement path of the first moving conveyor belt unit 8, and extends through the lower side of the first guide rail 24 so as to be orthogonal to the first guide rail 24.
於多孔質真空夾盤平台7之上表面,設置有藉由使多孔質陶瓷粒子燒結而形成且藉此具有多個氣孔之矩形之吸附體71。藉由經由與吸附體71連通之真空引導路(未圖示)進行真空抽吸,而可遍及吸附體71之上表面整體進行工件之吸附。 On the upper surface of the porous vacuum chuck platform 7, a rectangular adsorbent body 71 having a plurality of pores formed by sintering porous ceramic particles is provided. By performing vacuum suction through a vacuum guide path (not shown) communicating with the adsorbent body 71, the workpiece can be adsorbed over the entire upper surface of the adsorbent body 71.
第1移動輸送帶單元8具有:第1輸送帶81,其具有支撐多孔質真空夾盤平台7之下側之2行輥排;及第1可動構件82,其設置有第1輸送帶81。第1可動構件82與沿著第3導軌91滑動之第2移動機構9之第1滑塊92(參照圖8)連結。第1輸送帶81能夠以於與第1移動輸送帶單元8之移動方向正交之方向上搬送多孔質真空夾盤平台7之方式動作。如圖1及圖3所示,第1移動輸送帶單元8係以於作為其初始位置之第1位置載置有多孔質真空夾盤平台7之狀態,配置於第1導軌24與LLO站6之間。 The first moving conveyor belt unit 8 includes a first conveyor belt 81 having two rows of roller rows supporting a lower side of the porous vacuum chuck platform 7 and a first movable member 82 provided with the first conveyor belt 81. The first movable member 82 is connected to the first slider 92 (see FIG. 8) of the second moving mechanism 9 that slides along the third guide rail 91. The first conveyor belt 81 can operate so as to convey the porous vacuum chuck platform 7 in a direction orthogonal to the moving direction of the first moving conveyor unit 8. As shown in FIGS. 1 and 3, the first mobile conveyor unit 8 is a state where the porous vacuum chuck platform 7 is placed at the first position as its initial position, and is arranged on the first guide rail 24 and the LLO station 6. between.
圖7係表示利用LLO站6執行LLO步驟之狀態下之可撓性元件製造裝置之情況之說明圖(射束頭61未圖示),圖8係說明由可撓性元件製造裝置執行之LLO步驟之動作之說明圖(於圖8之左側,亦圖示有下述多孔質真空夾盤平台7之返回步驟)。於半切步驟結束之後,保持有支撐基板10之保持單元2以於處於圖1所示之第1位置之多孔質真空夾盤平台7上配置有支撐基板10之狀態停止。然後,保持單元2之支撐部22沿著升降引導部23上升。 FIG. 7 is an explanatory diagram showing a flexible device manufacturing apparatus in a state where an LLO step is performed using the LLO station 6 (beam head 61 is not shown), and FIG. 8 is an illustration of LLO performed by the flexible device manufacturing apparatus An illustration of the operation of the steps (on the left side of FIG. 8, the return steps of the porous vacuum chuck platform 7 described below are also illustrated). After the half-cutting step is completed, the holding unit 2 holding the supporting substrate 10 is stopped in a state where the supporting substrate 10 is arranged on the porous vacuum chuck platform 7 at the first position shown in FIG. 1. Then, the support portion 22 of the holding unit 2 rises along the elevating guide portion 23.
如圖8之中央所示,於保持單元2之支撐部22上升至既定之高度為止之後,藉由使吸附夾盤21繞其旋轉軸R旋轉180 度,而支撐基板10配置成層狀構造體1成為下側。然後,藉由使保持單元2之支撐部22下降,而支撐基板10使層狀構造體1為下側而配置於載置在第1移動輸送帶單元8之多孔質真空夾盤平台7之吸附體71之上表面。 As shown in the center of FIG. 8, after the support portion 22 of the holding unit 2 is raised to a predetermined height, the support substrate 10 is arranged in a layered structure by rotating the suction chuck 21 about its rotation axis R 180 degrees. 1 becomes the lower side. Then, the support portion 22 of the holding unit 2 is lowered, and the support substrate 10 is placed on the porous vacuum chuck platform 7 placed on the first moving conveyor unit 8 with the layered structure 1 as the lower side. The upper surface of the body 71.
若支撐基板10配置於多孔質真空夾盤平台7之吸附體71之上表面,則解除吸附夾盤21對支撐基板10之保持,並且藉由驅動省略了圖示之真空泵,而真空抽吸多孔質真空夾盤平台7,多孔質真空夾盤平台7之吸附體71吸附形成於支撐基板10之層狀構造體1。 If the support substrate 10 is disposed on the upper surface of the adsorption body 71 of the porous vacuum chuck platform 7, the holding of the support chuck 21 by the adsorption chuck 21 is released, and the vacuum pump is omitted by driving a vacuum pump (not shown), and the porous substrate The mass vacuum chuck platform 7 and the adsorption body 71 of the porous vacuum chuck platform 7 are adsorbed on the layered structure 1 formed on the support substrate 10.
若吸附體71吸附層狀構造體1,則藉由第2移動機構9動作,而第1移動輸送帶單元8朝向LLO站6移動。於多孔質真空夾盤平台7與真空泵連通之真空引導路設置有止回閥(未圖示),藉由該止回閥運作,而維持多孔質真空夾盤平台7之吸附體71與層狀構造體1之吸附狀態。另一方面,保持單元2向圖1所示之初始位置移動,支撐部22返回至原來之高度,吸附夾盤21藉由繞旋轉軸R反轉180度而返回至原來之位置。 When the adsorbent body 71 adsorbs the layered structure 1, the second moving mechanism 9 operates, and the first moving conveyor unit 8 moves toward the LLO station 6. A check valve (not shown) is provided in the vacuum guide path where the porous vacuum chuck platform 7 communicates with the vacuum pump, and the check body 71 and the layered structure of the porous vacuum chuck platform 7 are maintained by the check valve. Adsorption state of the structure 1. On the other hand, the holding unit 2 moves to the initial position shown in FIG. 1, the support portion 22 returns to the original height, and the suction chuck 21 returns to the original position by reversing 180 degrees about the rotation axis R.
圖9係表示LLO步驟中之層狀構造體1及支撐基板10之情況之與圖6對應之剖面圖。第1移動輸送帶單元8到達至LLO站6後停止。於第1移動輸送帶單元8及支撐基板10之上方,配置有射束頭61。於本實施形態中,射束頭61構成為一面將沿著矩形之層狀構造體1及支撐基板10之短邊方向之帶狀或者線狀之雷射光朝下方照射,一面能夠於長邊方向上移動。所照射之雷射光透過支撐基板10照射至可撓性膜11。藉由一面照射雷射光一面使射束頭61自支撐基板10之一端側向另一端側移動,而層狀構造體 1之可撓性膜11與支撐基板10之間之密接性降低。 FIG. 9 is a cross-sectional view corresponding to FIG. 6, showing a state of the layered structure 1 and the support substrate 10 in the LLO step. The first moving conveyor unit 8 stops at the LLO station 6 after reaching it. A beam head 61 is disposed above the first moving conveyor unit 8 and the support substrate 10. In the present embodiment, the beam head 61 is configured to irradiate a strip-shaped or linear laser light along the short-side direction of the rectangular layered structure 1 and the support substrate 10 downward, and the long-side direction can be irradiated. Move up. The irradiated laser light is irradiated to the flexible film 11 through the support substrate 10. The beam head 61 is moved from one end side to the other end side of the support substrate 10 while irradiating laser light, and the adhesion between the flexible film 11 of the layered structure 1 and the support substrate 10 is reduced.
於本實施形態中,根據圖9可理解,藉由對層狀構造體1之可撓性膜11之面整體照射射束頭61之雷射光,而可撓性膜11之面整體與支撐基板10之間之密接性降低。再者,亦可藉由以除層狀構造體1之殘餘部分16之外緣部以外之方式照射雷射光,而於構成該外緣部之可撓性膜11之區域與支撐基板10之間維持密接性。於本發明中,於LLO步驟中,無須於支撐基板10上配置限制雷射光之照射範圍之遮罩。 In this embodiment, it can be understood from FIG. 9 that the entire surface of the flexible film 11 of the layered structure 1 is irradiated with the laser light of the beam head 61, and the entire surface of the flexible film 11 and the support substrate are irradiated. The adhesion between 10 is reduced. Furthermore, the laser light may be irradiated in a manner other than the outer edge portion of the remaining portion 16 of the layered structure 1 between the region of the flexible film 11 constituting the outer edge portion and the support substrate 10. Maintain tightness. In the present invention, in the LLO step, there is no need to arrange a mask on the supporting substrate 10 to limit the irradiation range of the laser light.
雷射光之照射完成後,第1移動輸送帶單元8返回至圖1所示之第1位置。如圖1等所示,可撓性元件製造裝置具備第1夾盤單元100,該第1夾盤單元100相對於第1導軌24平行地設置,且能夠沿著水平配置之第4導軌101移動。於本實施形態中,第1導軌24與第4導軌101對齊配置。第4導軌101之一端側配置於第1導軌24側之另一端側,於第4導軌101之另一端側設置有支撐基板回收站110。於圖1所示之狀態下,第1夾盤單元100於支撐基板回收站110待機。 After the laser light irradiation is completed, the first mobile conveyor unit 8 returns to the first position shown in FIG. 1. As shown in FIG. 1 and the like, the flexible element manufacturing apparatus includes a first chuck unit 100 which is provided in parallel to the first guide rail 24 and is movable along a fourth guide rail 101 which is arranged horizontally. . In this embodiment, the first guide rail 24 and the fourth guide rail 101 are aligned. One end side of the fourth guide rail 101 is disposed on the other end side of the first guide rail 24 side, and a support substrate recovery station 110 is provided on the other end side of the fourth guide rail 101. In the state shown in FIG. 1, the first chuck unit 100 stands by at the supporting substrate recovery station 110.
如圖1等所示,於第4導軌101之一端側,能夠載置多孔質真空夾盤平台7之第2移動輸送帶單元120於與第4導軌101正交之方向行走自如地設置。驅動第2移動輸送帶單元120之第3移動機構130係由具有滑動自如地引導第2移動輸送帶單元120之第5導軌131(參照圖12)之單軸機器人機構而構成。第5導軌131規定第2移動輸送帶單元120之移動路徑,於第4導軌101之下側,以與第4導軌101正交之方式延伸。 As shown in FIG. 1 and the like, a second movable conveyor unit 120 capable of placing the porous vacuum chuck platform 7 on one end side of the fourth guide rail 101 is provided so as to walk freely in a direction orthogonal to the fourth guide rail 101. The third moving mechanism 130 that drives the second moving conveyor unit 120 is a single-axis robot mechanism having a fifth guide 131 (see FIG. 12) for slidingly guiding the second moving conveyor unit 120. The fifth guide rail 131 defines a movement path of the second moving conveyor unit 120, and extends below the fourth guide rail 101 so as to be orthogonal to the fourth guide rail 101.
第2移動輸送帶單元120與第1移動輸送帶單元8同 樣地構成,且具有:第2輸送帶121,其具有支撐多孔質真空夾盤平台7之下側之2行輥排;及第2可動構件122,其設置有第2輸送帶121。第2可動構件122與沿著第5導軌131滑動之第3移動機構130之第2滑塊132(參照圖12)連結。第2輸送帶121係以於與第2移動輸送帶單元120之移動方向正交之方向搬送多孔質真空夾盤平台7之方式動作。 The second mobile conveyor belt unit 120 is configured in the same manner as the first mobile conveyor belt unit 8 and includes a second conveyor belt 121 having two rows of roller rows supporting the lower side of the porous vacuum chuck platform 7; and a second The movable member 122 is provided with a second conveyor belt 121. The second movable member 122 is connected to a second slider 132 (see FIG. 12) of the third moving mechanism 130 that slides along the fifth guide rail 131. The second conveyor belt 121 operates to convey the porous vacuum chuck platform 7 in a direction orthogonal to the moving direction of the second moving conveyor unit 120.
於圖1中,第1移動輸送帶單元8與第2移動輸送帶單元120均配置於作為初始位置或者待機位置之第1位置。可撓性元件製造裝置具備於該狀態下,將第1移動輸送帶單元8之第1輸送帶81與第2移動輸送帶單元120之第2輸送帶121連結之第1中間輸送帶141。第1中間輸送帶141具備支撐多孔質真空夾盤平台7之2行輥排。 In FIG. 1, both the first mobile conveyor belt unit 8 and the second mobile conveyor belt unit 120 are arranged at a first position as an initial position or a standby position. The flexible element manufacturing apparatus includes a first intermediate conveyor belt 141 that connects the first conveyor belt 81 of the first mobile conveyor belt unit 8 and the second conveyor belt 121 of the second mobile conveyor belt unit 120 in this state. The first intermediate conveyor belt 141 includes two rows of roller rows supporting the porous vacuum chuck platform 7.
於LLO步驟完成之後,第1移動輸送帶單元8返回至圖1所示之第1位置。然後,藉由第1輸送帶81、第1中間輸送帶141及第2輸送帶121動作,而吸附有層狀構造體1之狀態之多孔質真空夾盤平台7自第1移動輸送帶單元8被向配置於圖1所示之第1位置之第2移動輸送帶單元120傳送。於多孔質真空夾盤平台7移動至第2移動輸送帶單元120之後,空的第1移動輸送帶單元8沿著第3導軌91,向自LLO站6離開之方向移動,超過第1導軌24,於第3導軌91之端部附近之第2位置停止(參照圖10等)。 After the LLO step is completed, the first moving conveyor unit 8 returns to the first position shown in FIG. 1. Then, the porous vacuum chuck platform 7 in a state where the layered structure 1 is adsorbed is moved by the first conveyor belt 81, the first intermediate conveyor belt 141, and the second conveyor belt 121, and the first moving conveyor belt unit 8 is moved. It is conveyed to the 2nd mobile conveyor unit 120 arrange | positioned at the 1st position shown in FIG. After the porous vacuum chuck platform 7 moves to the second moving conveyor unit 120, the empty first moving conveyor unit 8 moves along the third guide rail 91 in a direction away from the LLO station 6 and exceeds the first guide rail 24. , Stop at the second position near the end of the third guide rail 91 (see FIG. 10 and the like).
將多孔質真空夾盤平台7向第2移動輸送帶單元120傳送後,進行回收支撐基板10之支撐基板回收步驟。圖10係表示支撐基板回收步驟中之可撓性元件製造裝置之情況之說明圖。圖11(a)及圖11(b)係表示支撐基板回收步驟中之層狀構造體1及支撐 基板10之情況之剖面圖。圖12係說明由可撓性元件製造裝置執行之支撐基板回收步驟(以及,下述支援薄膜貼附步驟及可撓性元件取出步驟)之說明圖。 After the porous vacuum chuck platform 7 is transferred to the second moving conveyor unit 120, a support substrate recovery step of recovering the support substrate 10 is performed. FIG. 10 is an explanatory view showing a state of a flexible device manufacturing apparatus in a supporting substrate recovery step. Figs. 11 (a) and 11 (b) are sectional views showing the state of the layered structure 1 and the support substrate 10 in the support substrate recovery step. FIG. 12 is an explanatory diagram illustrating a support substrate recovery step (and a support film attaching step and a flexible element take-out step described below) performed by a flexible device manufacturing apparatus.
於支撐基板回收步驟中,首先,於支撐基板回收站110待機之第1夾盤單元100朝向第2移動輸送帶單元120移動。於本實施形態中,第1夾盤單元100具備具有合計4個吸附墊102之夾盤頭103、及第1臂部104。夾盤頭103升降自如地設置於第1臂部104之一端側,第1臂部104之另一端側滑動自如地安裝於第4導軌101。 In the support substrate recovery step, first, the first chuck unit 100 which is waiting at the support substrate recovery station 110 moves toward the second moving conveyor unit 120. In this embodiment, the first chuck unit 100 includes a chuck head 103 having a total of four suction pads 102 and a first arm portion 104. The chuck head 103 is provided on one end side of the first arm portion 104 so as to be able to move up and down, and the other end side of the first arm portion 104 is slidably mounted on the fourth guide rail 101.
若夾盤頭103配置於(經由層狀構造體1)吸附於配置在第2移動輸送帶單元120之多孔質真空夾盤平台7之支撐基板10之上,則第1夾盤單元100停止。然後,夾盤頭103下降,若如圖11(a)所示吸附墊102與支撐基板10接觸,則吸附墊102吸附支撐基板10。 When the chuck head 103 is disposed (via the layered structure 1) on the support substrate 10 of the porous vacuum chuck platform 7 disposed on the second moving conveyor unit 120, the first chuck unit 100 is stopped. Then, the chuck head 103 is lowered, and if the suction pad 102 is in contact with the support substrate 10 as shown in FIG. 11 (a), the suction pad 102 suctions the support substrate 10.
於藉由LLO步驟而層狀構造體1與支撐基板10之密接性受損,層狀構造體1之保護薄膜14之四邊之緣部經由接著劑13而附著於支撐基板10之狀態下,層狀構造體1之保護薄膜14吸附於多孔質真空夾盤平台7之吸附體71之上表面。進而,藉由LLO步驟,而將層狀構造體1中之各個元件部分15相對於層狀構造體1之殘餘部分16切斷。故而,於使吸附墊102吸附支撐基板10之後,藉由使夾盤頭103相對於多孔質真空夾盤平台7充分地上升,而如圖11(b)所示,層狀構造體1中之各元件部分15以吸附狀態殘留於多孔質真空夾盤平台7,另一方面,層狀構造體1之殘餘部分16以附著於支撐基板10之狀態被向上拉伸。層狀構造體1之 殘餘部分16與支撐基板10一起自多孔質真空夾盤平台7離開。如此,自大型之層狀構造體1,取出分別成為可撓性元件之複數個元件部分15。 In a state where the adhesion between the layered structure 1 and the support substrate 10 is impaired by the LLO step, and the four edges of the protective film 14 of the layered structure 1 are attached to the support substrate 10 through the adhesive 13, the layer The protective film 14 of the structure 1 is adsorbed on the upper surface of the adsorbent 71 of the porous vacuum chuck platform 7. Furthermore, each element portion 15 in the layered structure 1 is cut off from the remaining portion 16 of the layered structure 1 by the LLO step. Therefore, after the adsorption pad 102 is adsorbed on the support substrate 10, the chuck head 103 is sufficiently raised relative to the porous vacuum chuck platform 7. As shown in FIG. 11 (b), Each element portion 15 remains on the porous vacuum chuck platform 7 in an adsorbed state. On the other hand, the remaining portion 16 of the layered structure 1 is stretched upward while being attached to the support substrate 10. The remaining portion 16 of the layered structure 1 is separated from the porous vacuum chuck table 7 together with the support substrate 10. In this manner, a plurality of element portions 15 each serving as a flexible element are taken out from the large-scale layered structure 1.
若於可撓性膜11與支撐基板10之間存在異物,則於LLO步驟之後,會產生可撓性膜11與支撐基板10之間之密接性局部地得到維持之情況。受該影響之元件部分15隨著夾盤頭103之上升,與支撐基板10一起自多孔質真空夾盤平台7離開或裂開。然而,於本發明中,受異物影響之元件部分15受限定。於上述習知之有機EL元件之製造方法中,由於此種異物之影響,而產生無法適當地進行形成於支撐基板10之層狀構造體1整體之剝離之更嚴峻之情況。 If there is a foreign matter between the flexible film 11 and the support substrate 10, after the LLO step, the adhesion between the flexible film 11 and the support substrate 10 may be partially maintained. As the chuck head 103 ascends, the affected element portion 15 is separated from the porous vacuum chuck platform 7 or cracked together with the support substrate 10. However, in the present invention, the element portion 15 affected by the foreign matter is limited. In the conventional method for manufacturing an organic EL device, the influence of such foreign matter has caused a severe situation in which the entire layered structure 1 formed on the support substrate 10 cannot be properly peeled off.
若附著有層狀構造體1之殘餘部分16之支撐基板10自多孔質真空夾盤平台7離開,則於夾盤頭103吸附有支撐基板10之狀態下,第1夾盤單元100沿著第4導軌101朝向支撐基板回收站110移動。若到達至支撐基板回收站110,則第1夾盤單元100下降,藉由解除夾盤頭103與支撐基板10之吸附狀態,而支撐基板10配置於支撐基板回收站110之堆疊器(未圖示)。然後,夾盤頭103上升,第1夾盤單元100返回至待機狀態。所回收之支撐基板10可藉由將附著之層狀構造體1之殘餘部分16去除而再利用。 When the support substrate 10 with the remaining portion 16 of the layered structure 1 is separated from the porous vacuum chuck table 7, the first chuck unit 100 is moved along the first chuck unit 103 in a state where the chuck head 103 has adsorbed the support substrate 10. The four guide rails 101 move toward the supporting substrate recovery station 110. After reaching the supporting substrate recycling station 110, the first chuck unit 100 is lowered, and the suction substrate 10 is released from the chuck head 103 and the supporting substrate 10, and the supporting substrate 10 is arranged in the stacker of the supporting substrate recycling station 110 (not shown).示). Then, the chuck head 103 is raised, and the first chuck unit 100 returns to the standby state. The recovered support substrate 10 can be reused by removing the remaining portion 16 of the attached layered structure 1.
如圖1等所示,可撓性元件製造裝置具備處於LLO站6之側方之支援薄膜貼附站150。如圖12所示,第3移動機構130之第5導軌131之一端到達至支援薄膜貼附站150。於將支撐基板10與層狀構造體1之殘餘部分16一起自多孔質真空夾盤平台7上去除之後,第2移動輸送帶單元120藉由使第3移動機構130 動作,而沿著第5導軌131移動,被送至支援薄膜貼附站150(參照圖12之右側部分)。到達至支援薄膜貼附站150後,藉由使省略了圖示之真空泵動作,而強化多孔質真空夾盤平台7之吸附體71與元件部分15之吸附狀態。 As shown in FIG. 1 and the like, the flexible device manufacturing apparatus includes a support film attaching station 150 on the side of the LLO station 6. As shown in FIG. 12, one end of the fifth guide rail 131 of the third moving mechanism 130 reaches the support film attachment station 150. After the support substrate 10 is removed from the porous vacuum chuck table 7 together with the remaining portion 16 of the layered structure 1, the second moving conveyor unit 120 moves the third moving mechanism 130 along the fifth moving conveyor 130. The guide rail 131 moves and is sent to the support film attachment station 150 (refer to the right part of FIG. 12). After reaching the support film attachment station 150, the suction state of the suction body 71 and the element portion 15 of the porous vacuum chuck platform 7 is strengthened by operating a vacuum pump (not shown).
於支援薄膜貼附站150中,進行將支援薄膜17貼附於多孔質真空夾盤平台7之吸附體71所吸附之各元件部分15之可撓性膜11之支援薄膜貼附步驟。支援薄膜17係完成品之可撓性元件中所包含之銅箔片材或石墨片材,且係與關聯習知技術而說明之第2保護薄膜完全不同者。於本實施形態中,於支援薄膜貼附站150設置有3個堆疊器151,各堆疊器151保管堆積狀態之複數個支援薄膜17。支援薄膜17之一個主面成為黏著層,以於該黏著層附著有剝離紙(未圖示)之狀態保管支援薄膜17。 In the supporting film attaching station 150, the supporting film attaching step of attaching the supporting film 17 to the flexible film 11 of each element portion 15 adsorbed by the adsorbent 71 of the porous vacuum chuck platform 7 is performed. The support film 17 is a copper foil sheet or a graphite sheet included in the flexible element of the finished product, and is completely different from the second protective film described in connection with the conventional technology. In this embodiment, three stackers 151 are provided in the support film attaching station 150, and each stacker 151 stores a plurality of support films 17 in a stacked state. One main surface of the support film 17 serves as an adhesive layer, and the support film 17 is stored in a state where a release paper (not shown) is attached to the adhesive layer.
如圖12等所示,支援薄膜貼附站150具備:剝離機構152,其將支援薄膜17之剝離紙剝離;可動式之貼附頭153,其自剝離機構152接收被剝離了剝離紙之支援薄膜17,並將其貼附於各元件部分15之可撓性膜11;及吸附頭154,其自堆疊器151向剝離機構152傳送。貼附頭153具備吸附部155及按壓輥156。 As shown in FIG. 12 and the like, the support film attaching station 150 includes a peeling mechanism 152 that peels off the release paper of the support film 17 and a movable attachment head 153 that receives support from the peeling mechanism 152 after the release paper is peeled off. The thin film 17 is attached to the flexible film 11 of each element portion 15; and the suction head 154 is transferred from the stacker 151 to the peeling mechanism 152. The application head 153 includes a suction section 155 and a pressing roller 156.
自剝離機構152中之堆疊器151側之端部,具有黏著面之帶157能夠於其長度方向上行走地被卷出,由吸附頭154搬運之支援薄膜17以剝離紙與帶157之黏著面接著之方式配置於剝離機構152。又,貼附頭153之吸附部155吸附支援薄膜17之上表面,隨著帶157之行走而與支援薄膜17一起移動。於剝離機構152中之多孔質真空夾盤平台7之側之端部,帶157向下彎曲,藉此,朝向多孔質真空夾盤平台7移動中之貼附頭153之吸附部155所吸附 之支援薄膜17之剝離紙自支援薄膜17剝離。 At the end of the stacker 151 side in the self-peeling mechanism 152, the tape 157 having an adhesive surface can be rolled out while walking in its longitudinal direction. The supporting film 17 carried by the suction head 154 is connected to the adhesive surface of the tape 157 by a release paper. This arrangement is arranged in the peeling mechanism 152. In addition, the suction portion 155 of the attachment head 153 sucks the upper surface of the support film 17 and moves with the support film 17 as the belt 157 moves. At the end on the side of the porous vacuum chuck platform 7 in the peeling mechanism 152, the band 157 is bent downward, thereby attracting the absorbing portion 155 of the attachment head 153 while moving toward the porous vacuum chuck platform 7. The release paper of the support film 17 is peeled from the support film 17.
於剝離紙自支援薄膜17剝離,支援薄膜17之黏著面向下露出之狀態下,貼附頭153向進行該支援薄膜17之貼附之元件部分15之上移動。支援薄膜貼附站150具備對配置於多孔質真空夾盤平台7上之元件部分15進行攝像之攝像裝置158,基於自攝像裝置158獲得之圖像,進行吸附頭154相對於成為對象之元件部分15之位置之控制。貼附頭153係以按壓輥156為下側而能夠傾動地構成,於該狀態下使支援薄膜17之一端側與元件部分15之一端側接觸,使貼附頭153向元件部分15之另一端側移動,藉此,支援薄膜17一面由按壓輥156壓抵,一面逐漸貼附於元件部分15之可撓性膜11上。藉由於元件部分15貼附支援薄膜17而完成可撓性元件18。 In a state where the release paper is peeled from the support film 17 and the adhesive surface of the support film 17 is exposed downward, the application head 153 moves above the element portion 15 to which the support film 17 is attached. The support film attachment station 150 is provided with an imaging device 158 that images the component portion 15 disposed on the porous vacuum chuck platform 7. Based on an image obtained from the image pickup device 158, the suction head 154 is directed to the target component portion. 15 position control. The application head 153 is configured to be tiltable with the pressing roller 156 as the lower side. In this state, one end side of the support film 17 is brought into contact with one end side of the element portion 15, and the application head 153 is directed to the other end of the element portion 15. By moving sideways, the support film 17 is gradually pressed against the flexible film 11 of the element portion 15 while being pressed against by the pressing roller 156. The flexible element 18 is completed by attaching the support film 17 to the element portion 15.
對吸附於多孔質真空夾盤平台7之所有元件部分15貼附支援薄膜17,該等元件部分15成為可撓性元件18之後,藉由使第3移動機構130驅動,而第2移動輸送帶單元120向自支援薄膜貼附站150離開之方向移動。第2移動輸送帶單元120於載置有多孔質真空夾盤平台7之狀態下,超過第4導軌101,向處於第5導軌131之另一端側之第2位置移動。於第2移動輸送帶單元120處於第2位置之狀態下,執行取出可撓性元件18之可撓性元件步驟。 A support film 17 is attached to all the component parts 15 adsorbed on the porous vacuum chuck platform 7. After these component parts 15 become flexible elements 18, the third moving mechanism 130 is driven and the second moving conveyor belt is driven. The unit 120 moves in a direction away from the support film attaching station 150. In the state where the porous vacuum chuck platform 7 is placed on the second moving conveyor belt unit 120, the second moving conveyor unit 120 moves beyond the fourth guide rail 101 and moves to the second position on the other end side of the fifth guide rail 131. With the second moving conveyor unit 120 in the second position, the step of taking out the flexible element of the flexible element 18 is performed.
根據圖1及圖12等可理解,於第5導軌131之另一端側設置有可撓性元件回收站160。又,可撓性元件製造裝置具備能夠沿著第5導軌131或與第2移動輸送帶單元120之移動方向平行地設置之第6導軌171移動之第2夾盤單元170。於本實施形態 中,第2夾盤單元170具備吸附夾盤172及第2臂部173。吸附夾盤172升降自如地設置於第2臂部173之一端側,第2臂部173之另一端側滑動自如地安裝於第6導軌171。 As can be understood from FIGS. 1 and 12, a flexible element recovery station 160 is provided on the other end side of the fifth rail 131. In addition, the flexible element manufacturing apparatus includes a second chuck unit 170 that can move along the fifth guide rail 131 or a sixth guide rail 171 provided in parallel with the moving direction of the second moving conveyor unit 120. In the present embodiment, the second chuck unit 170 includes a suction chuck 172 and a second arm portion 173. The suction chuck 172 is provided on one end side of the second arm portion 173 so as to be able to move up and down, and the other end side of the second arm portion 173 is slidably mounted on the sixth rail 171.
圖14係表示可撓性元件取出步驟中之可撓性元件製造裝置之情況之說明圖。根據圖1、圖14及圖12等可理解,若第2移動輸送帶單元120向處於第5導軌131之另一端側之第2位置移動,則於可撓性元件回收站160待機之第2夾盤單元170朝向第2移動輸送帶單元120移動。若第2夾盤單元170之吸附夾盤172到達至多孔質真空夾盤平台7上,則第2夾盤單元170停止。 FIG. 14 is an explanatory view showing a state of a flexible element manufacturing apparatus in a flexible element taking-out step. As can be understood from FIG. 1, FIG. 14, and FIG. 12, if the second moving conveyor unit 120 moves to a second position on the other end side of the fifth guide rail 131, the second moving conveyor unit 120 stands by at the second place where the flexible component recycling station 160 stands by. The chuck unit 170 moves toward the second moving conveyor unit 120. When the suction chuck 172 of the second chuck unit 170 reaches the porous vacuum chuck platform 7, the second chuck unit 170 stops.
若第2夾盤單元170停止,則第2夾盤單元170之吸附夾盤172下降,其吸附面與吸附於多孔質真空夾盤平台7之所有可撓性元件18接觸。然後,解除多孔質真空夾盤平台7與可撓性元件18之吸附狀態,與吸附夾盤172連通之真空泵(未圖示)驅動,吸附夾盤172吸附所有可撓性元件18。吸附有可撓性元件18之吸附夾盤172上升至既定之位置為止之後,第2夾盤單元170向可撓性元件回收站160移動。 When the second chuck unit 170 is stopped, the suction chuck 172 of the second chuck unit 170 is lowered, and its suction surface comes into contact with all the flexible elements 18 that are adsorbed on the porous vacuum chuck platform 7. Then, the adsorption state of the porous vacuum chuck platform 7 and the flexible element 18 is released, and a vacuum pump (not shown) communicating with the adsorption chuck 172 is driven, and the adsorption chuck 172 adsorbs all the flexible elements 18. After the suction chuck 172 on which the flexible element 18 is suctioned has been raised to a predetermined position, the second chuck unit 170 moves to the flexible element recovery station 160.
若第2夾盤單元170到達至可撓性元件回收站160,則吸附夾盤172下降直至可撓性元件18接近回收平台161之上表面為止。然後,解除吸附夾盤172與可撓性元件18之吸附狀態,可撓性元件18載置於回收平台161上(參照圖12之左側部分)。而且,吸附夾盤172上升,第2夾盤單元170返回至待機狀態。 When the second chuck unit 170 reaches the flexible element recovery station 160, the suction chuck 172 is lowered until the flexible element 18 approaches the upper surface of the recovery platform 161. Then, the adsorption state between the suction chuck 172 and the flexible element 18 is released, and the flexible element 18 is placed on the recovery platform 161 (refer to the left part of FIG. 12). Then, the suction chuck 172 rises, and the second chuck unit 170 returns to the standby state.
如圖14等所示,可撓性元件製造裝置具備將處於第2位置之狀態之第1移動輸送帶單元8之第1輸送帶81、與處於第2位置之狀態之第2移動輸送帶單元120之第2輸送帶121連結的 第2中間輸送帶142。第2中間輸送帶142具備支撐多孔質真空夾盤平台7之2行輥排。於可撓性元件取出步驟完成之後,藉由使第1輸送帶81、第2中間輸送帶142及第2輸送帶121驅動,而未吸附工件之空狀態之多孔質真空夾盤平台7自第2移動輸送帶單元120向第1移動輸送帶單元8移動。 As shown in FIG. 14 and the like, the flexible element manufacturing apparatus includes a first moving belt unit 81 that puts the first moving belt unit 8 in a second position, and a second moving belt unit that puts the second position. The second intermediate conveyor belt 142 is connected to the second conveyor belt 121 of 120. The second intermediate conveyor belt 142 includes two rows of roller rows supporting the porous vacuum chuck platform 7. After the step of taking out the flexible component is completed, the porous vacuum chuck platform 7 without driving the workpiece in the empty state is driven by driving the first conveyor belt 81, the second intermediate conveyor belt 142, and the second conveyor belt 121. The 2 moving conveyor unit 120 moves to the first moving conveyor unit 8.
根據圖14及圖8可理解,若自第2移動輸送帶單元120接收多孔質真空夾盤平台7,則第1移動輸送帶單元8藉由使第2移動機構9驅動而自第2位置向第1位置返回。藉此,可撓性元件製造裝置轉移至圖1所示之初始狀態,對利用省略了圖示之形成裝置形成有層狀構造體1之新的支撐基板10執行如上所述之一系列之步驟。 As can be understood from FIGS. 14 and 8, when the porous vacuum chuck platform 7 is received from the second mobile conveyor belt unit 120, the first mobile conveyor belt unit 8 is driven from the second position to the second position by driving the second moving mechanism 9. Return to position 1. Thereby, the flexible device manufacturing apparatus is shifted to the initial state shown in FIG. 1, and a series of steps as described above is performed on the new support substrate 10 in which the layered structure 1 is formed by the forming apparatus (not shown). .
上述說明係用以對本發明進行說明者,並不應解釋為限定申請專利範圍所記載之發明、或縮減範圍。又,當然本發明之各部構成並不限定於上述實施例,能夠於申請專利範圍所記載之技術性範圍內進行各種變形。 The above description is for explaining the present invention, and should not be construed as limiting the scope of the invention described in the scope of patent application, or reducing the scope. It is needless to say that the configuration of each part of the present invention is not limited to the above-mentioned embodiments, and various modifications can be made within the technical scope described in the scope of the patent application.
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| JP2017-084729 | 2017-04-21 | ||
| JP2017084729A JP6888812B2 (en) | 2017-04-21 | 2017-04-21 | Flexible device manufacturing equipment and manufacturing method |
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| TWI744517B TWI744517B (en) | 2021-11-01 |
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| US12377497B2 (en) * | 2018-12-21 | 2025-08-05 | Tokyo Electron Limited | Substrate processing apparatus and substrate processing method |
| CN112026331B (en) * | 2019-06-03 | 2022-05-13 | 万向一二三股份公司 | Foam release paper stripping mechanism and stripping method thereof |
| CN114334779A (en) * | 2021-12-28 | 2022-04-12 | 深圳市华星光电半导体显示技术有限公司 | Laser lift-off apparatus and laser lift-off method |
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| JP2004306191A (en) * | 2003-04-07 | 2004-11-04 | Seiko Epson Corp | Table device, film forming device, optical element, semiconductor element, and electronic equipment |
| KR101149433B1 (en) | 2009-08-28 | 2012-05-22 | 삼성모바일디스플레이주식회사 | Flexible display and method for manufacturing the same |
| KR101097344B1 (en) * | 2010-03-09 | 2011-12-23 | 삼성모바일디스플레이주식회사 | Method of manufacturing flexible display apparatus |
| JP2011233426A (en) * | 2010-04-28 | 2011-11-17 | Tazmo Co Ltd | Firing apparatus for organic film and organic element having organic film fired by the apparatus |
| JP2012069557A (en) * | 2010-09-21 | 2012-04-05 | Covalent Materials Corp | Porous chuck and method of manufacturing same |
| JP2013191746A (en) * | 2012-03-14 | 2013-09-26 | Toshiba Corp | Method for manufacturing semiconductor device, and semiconductor manufacturing apparatus |
| JP2013251191A (en) * | 2012-06-01 | 2013-12-12 | Dainippon Printing Co Ltd | Organic electroluminescent element |
| JP2014048619A (en) * | 2012-09-04 | 2014-03-17 | Panasonic Corp | Manufacturing method of flexible device |
| KR102025704B1 (en) * | 2012-09-14 | 2019-09-27 | 삼성디스플레이 주식회사 | Apparatus for inspecting film |
| KR20140062368A (en) * | 2012-11-14 | 2014-05-23 | 엘지디스플레이 주식회사 | Method of fabricating the flexible display device |
| KR102158971B1 (en) * | 2013-03-11 | 2020-09-24 | 삼성디스플레이 주식회사 | Substrate peeling device, method of peeling substrate and method of manufacturing flexible display device |
| KR102113174B1 (en) * | 2013-04-30 | 2020-05-21 | 삼성디스플레이 주식회사 | A flexible display device manufacturing method |
| KR102135933B1 (en) * | 2013-12-31 | 2020-07-21 | 엘지디스플레이 주식회사 | Method of fabricating flexible organic light emitting diode display device |
| US9437839B2 (en) * | 2014-06-19 | 2016-09-06 | Panasonic Intellectual Property Management Co., Ltd. | Method for manufacturing electronic device and electronic device manufactured thereby |
| JP5954549B2 (en) * | 2014-08-01 | 2016-07-20 | 日東電工株式会社 | Method for handling display cell of flexible thin film structure |
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| JP6888812B2 (en) | 2021-06-16 |
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