TW201843137A - Imide oligomer, curing agent, adhesive and method for producing imide oligomer - Google Patents
Imide oligomer, curing agent, adhesive and method for producing imide oligomer Download PDFInfo
- Publication number
- TW201843137A TW201843137A TW107113205A TW107113205A TW201843137A TW 201843137 A TW201843137 A TW 201843137A TW 107113205 A TW107113205 A TW 107113205A TW 107113205 A TW107113205 A TW 107113205A TW 201843137 A TW201843137 A TW 201843137A
- Authority
- TW
- Taiwan
- Prior art keywords
- oligomer
- fluorene imine
- imine oligomer
- fluorene
- weight
- Prior art date
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- 239000000853 adhesive Substances 0.000 title claims abstract description 36
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 23
- 150000003949 imides Chemical class 0.000 title abstract description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 38
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 36
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 151
- -1 fluorene imine Chemical class 0.000 claims description 148
- 239000004848 polyfunctional curative Substances 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 17
- 125000004018 acid anhydride group Chemical group 0.000 claims description 15
- 230000007774 longterm Effects 0.000 abstract description 23
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 34
- 238000005227 gel permeation chromatography Methods 0.000 description 34
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 24
- 230000015572 biosynthetic process Effects 0.000 description 23
- 239000002244 precipitate Substances 0.000 description 23
- 238000003786 synthesis reaction Methods 0.000 description 23
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 22
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- 229920000647 polyepoxide Polymers 0.000 description 20
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 18
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 15
- 229940018563 3-aminophenol Drugs 0.000 description 15
- 238000005160 1H NMR spectroscopy Methods 0.000 description 14
- 150000008064 anhydrides Chemical class 0.000 description 14
- 238000005194 fractionation Methods 0.000 description 14
- 239000000047 product Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000002245 particle Substances 0.000 description 11
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- 229910003475 inorganic filler Inorganic materials 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 10
- KWOIWTRRPFHBSI-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC(C(C)(C)C=2C=CC(N)=CC=2)=CC=1C(C)(C)C1=CC=C(N)C=C1 KWOIWTRRPFHBSI-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 7
- 239000004642 Polyimide Substances 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 150000001409 amidines Chemical class 0.000 description 6
- 150000001413 amino acids Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000002835 absorbance Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
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- 125000004430 oxygen atom Chemical group O* 0.000 description 5
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- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 4
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- 239000002313 adhesive film Substances 0.000 description 4
- 239000003085 diluting agent Substances 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
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- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical group 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
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- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
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- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- UHIDYCYNRPVZCK-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(N)=CC=1C(C)(C)C1=CC=C(O)C(N)=C1 UHIDYCYNRPVZCK-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- YRHYRLWIIXHESF-UHFFFAOYSA-N 3-(3,4-dicarboxyphenoxy)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=CC(C(O)=O)=C1C(O)=O YRHYRLWIIXHESF-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 2
- LFNFPWYUXXLMGE-UHFFFAOYSA-N 4-[4-[1-[4-(4-aminophenoxy)phenyl]-9H-fluoren-2-yl]phenoxy]aniline Chemical compound NC1=CC=C(OC2=CC=C(C=C2)C2=C(C=3CC4=CC=CC=C4C=3C=C2)C2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1 LFNFPWYUXXLMGE-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
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- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 2
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- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 2
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- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
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- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
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- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
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- 239000007822 coupling agent Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- SFYLVTNFLRJWTA-UHFFFAOYSA-N fluoren-1-imine Chemical group C1=CC=C2C3=CC=CC(=N)C3=CC2=C1 SFYLVTNFLRJWTA-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001410 inorganic ion Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- JDEJGVSZUIJWBM-UHFFFAOYSA-N n,n,2-trimethylaniline Chemical compound CN(C)C1=CC=CC=C1C JDEJGVSZUIJWBM-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000002411 thermogravimetry Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/44—Iso-indoles; Hydrogenated iso-indoles
- C07D209/48—Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
- C08G59/4042—Imines; Imides
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/08—Macromolecular additives
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- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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Abstract
Description
本發明係關於一種可用於長期耐熱性優異之硬化物之醯亞胺寡聚物。又,本發明係關於一種由該醯亞胺寡聚物所構成之硬化劑、及使用該硬化劑而成之接著劑。進而,本發明係關於一種該醯亞胺寡聚物之製造方法。 The present invention relates to a sulfonimide oligomer which can be used for a hardened material having excellent long-term heat resistance. Moreover, this invention relates to the hardening | curing agent which consists of this fluorene imine oligomer, and the adhesive agent which uses this hardening | curing agent. Furthermore, this invention relates to the manufacturing method of this fluorene imine oligomer.
低收縮且接著性、絕緣性、及耐化學品性優異之環氧樹脂等硬化性樹脂用於多數工業製品。尤其是於電子機器用途中,多使用於關於短時間之耐熱性之回流焊試驗、或關於反覆之耐熱性之冷熱循環試驗中可獲得良好結果之硬化性樹脂組成物。 Hardening resins such as epoxy resins with low shrinkage and excellent adhesion, insulation, and chemical resistance are used in many industrial products. In particular, in the field of electronic equipment, a hardening resin composition that can obtain a good result in a reflow soldering test about short-term heat resistance or a cold-heat cycle test about repeated heat resistance is often used.
近年來,車載用電子控制單元(ECU)、或使用SiC、GaN之功率裝置等備受關注,但對於該等用途中所使用之硬化性樹脂組成物,並非要求短時間或反覆之耐熱性,而是要求連續且長期暴露於高溫時之耐熱性(長期耐熱性)。 In recent years, electronic control units (ECUs) for vehicles, or power devices using SiC and GaN have attracted much attention, but the curable resin composition used in these applications does not require short-term or repeated heat resistance. Rather, heat resistance (long-term heat resistance) is required for continuous and long-term exposure to high temperatures.
作為用於硬化性樹脂組成物之硬化劑,於專利文獻1中,揭示有兩末端具有酸酐結構之醯亞胺寡聚物硬化劑,但由於與環氧樹脂等硬化性樹脂之相容性不充分,故而存在所獲得之硬化性樹脂組成物成為長期耐熱性較差者之問題。 As a hardener for a curable resin composition, Patent Document 1 discloses a fluorene imine oligomer hardener having an acid anhydride structure at both ends. However, it is incompatible with curable resins such as epoxy resins. Sufficiently, there is a problem that the obtained curable resin composition becomes poor in long-term heat resistance.
另一方面,於專利文獻2、3中,揭示有為了提高與硬化性樹脂之相容性而將導入有柔軟之聚矽氧骨架或脂環式骨架之聚醯亞胺用作硬化劑之 硬化性樹脂組成物。然而,若導入聚矽氧骨架或脂環式骨架,則存在以下問題:所獲得之硬化物之玻璃轉移溫度易下降,而成為於ECU或功率裝置等之動作溫度之機械強度或長期耐熱性較差者。又,於專利文獻4中,揭示有藉由將兩末端具有酚性羥基等之特定之醯亞胺寡聚物用作硬化劑,而提高熱硬化性樹脂組成物之接著性或耐熱性等,但於使用此種醯亞胺寡聚物之情形時,亦存在長期耐熱性降低之情況。 On the other hand, in Patent Documents 2 and 3, it is disclosed that a polyimide introduced with a flexible polysiloxane skeleton or an alicyclic skeleton is used as a curing agent in order to improve the compatibility with the curable resin. Sexual resin composition. However, if a polysiloxane skeleton or an alicyclic skeleton is introduced, there is a problem that the glass transition temperature of the obtained hardened product is liable to decrease, and the mechanical strength or long-term heat resistance at the operating temperature of the ECU or power device is poor. By. In addition, Patent Document 4 discloses that by using a specific sulfonium oligomer having a phenolic hydroxyl group or the like at both ends as a curing agent, the adhesion or heat resistance of a thermosetting resin composition is improved. However, when such a fluorene imine oligomer is used, long-term heat resistance may be reduced.
專利文獻1:日本特開昭61-270852號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 61-270852
專利文獻2:日本特開2016-20437號公報 Patent Document 2: Japanese Patent Application Laid-Open No. 2016-20437
專利文獻3:日本特開2012-227534號公報 Patent Document 3: Japanese Patent Application Publication No. 2012-227534
專利文獻4:國際公開第2005/100433號 Patent Document 4: International Publication No. 2005/100433
本發明之目的在於提供一種可用於長期耐熱性優異之硬化物之醯亞胺寡聚物。又,本發明之目的在於提供一種由該醯亞胺寡聚物所構成之硬化劑、及使用該硬化劑而成之接著劑。進而,本發明之目的在於提供一種該醯亞胺寡聚物之製造方法。 An object of the present invention is to provide a fluorene imine oligomer which can be used for a hardened product excellent in long-term heat resistance. Another object of the present invention is to provide a hardener composed of the fluorene imine oligomer, and an adhesive agent using the hardener. Furthermore, the objective of this invention is to provide the manufacturing method of this fluorene imine oligomer.
本發明係一種醯亞胺寡聚物,其具有酚性羥基,且具有酯鍵之醯亞胺寡聚物之含有比例為7%以下。 The present invention relates to a fluorene imine oligomer, which has a phenolic hydroxyl group and an ester bond, and the content ratio of the fluorene imine oligomer is 7% or less.
以下,對本發明進行詳細說明。 Hereinafter, the present invention will be described in detail.
本發明者等人發現:於具有酚性羥基之醯亞胺寡聚物中,具有酯鍵者於用作硬化劑之情形時使硬化物之長期耐熱性提高之效果不佳,從而對使用具有酚性羥基且不具有酯鍵之醯亞胺寡聚物進行了研究。然而,即便於使用具有酚性羥基且不具有酯鍵之醯亞胺寡聚物之情形時亦無法充分地提高硬化物之長期耐熱性。本發明者等人認為無法充分地提高硬化物之長期耐熱性之原因在於:於作為不具有酯鍵者使用之具有酚性羥基之醯亞胺寡聚物中,存在少量作為雜質之具有酯鍵之醯亞胺寡聚物。因此,本發明者等人進行潛心研究,結果發現藉由使用將為雜質之具有酯鍵之醯亞胺寡聚物之含有比例設為7%以下的具有酚性羥基之醯亞胺寡聚物,可獲得長期耐熱性優異之硬化物,從而完成了本發明。 The present inventors have found that among fluorene imine oligomers having a phenolic hydroxyl group, those having an ester bond, when used as a hardener, do not have the effect of improving the long-term heat resistance of the hardened material, and thus have a poor effect on use. Phenylimine oligomers with phenolic hydroxyl groups and no ester linkages were investigated. However, even when a fluorene imine oligomer having a phenolic hydroxyl group and no ester bond is used, the long-term heat resistance of the cured product cannot be sufficiently improved. The present inventors believe that the reason why the long-term heat resistance of the hardened material cannot be sufficiently improved is that a fluorene imine oligomer having a phenolic hydroxyl group used as a person having no ester bond has a small amount of an ester bond as an impurity醯 Imine oligomer. Therefore, the present inventors conducted intensive studies and found that by using a fluorene imine oligomer having a phenolic hydroxyl group with a content ratio of fluorene imino oligomer having an ester bond as an impurity to 7% or less A hardened body excellent in long-term heat resistance can be obtained, and the present invention has been completed.
本發明之醯亞胺寡聚物具有酚性羥基。 The fluorene imine oligomer of the present invention has a phenolic hydroxyl group.
本發明之醯亞胺寡聚物係具有酯鍵之醯亞胺寡聚物之含有比例為7%以下。藉由使上述具有酯鍵之醯亞胺寡聚物之含有比例為7%以下,本發明之醯亞胺寡聚物成為用作硬化劑時使所獲得之硬化物之長期耐熱性提高之效果優異者。上述具有酯鍵之醯亞胺寡聚物之含有比例較佳為5%以下,最佳為0%、即不含有上述具有酯鍵之醯亞胺寡聚物。 The fluorene imine oligomer of the present invention has a content of fluorene imine oligomer having an ester bond of 7% or less. When the content ratio of the fluorene imine oligomer having an ester bond as described above is 7% or less, the fluorene imine oligomer of the present invention has an effect of improving the long-term heat resistance of the obtained cured product when used as a curing agent. Outstanding. The content of the fluorene imine oligomer having an ester bond is preferably 5% or less, and most preferably 0%, that is, the fluorene imine oligomer having an ester bond is not included.
再者,上述具有酯鍵之醯亞胺寡聚物之含有比例可於使用凝膠滲透層析法(GPC)分取各波峰之後,藉由傅立葉轉換紅外光譜法(FT-IR)根據具有來自酯鍵之吸收之化合物之重量比率而求出。具體而言,首先,於游離液中使用四氫呋喃(THF),使用安裝有GPC管柱(例如日本分析工業公司製造之「JAIGEL-2H」等)之循環分取HPLC(日本分析工業公司製造)分取各波峰。其後,對藉由利用加熱等來去除游離液而獲得之化合物,使用傅立葉轉換紅外分光光度計(例如Agilent Technologies公司製造之「UMA600」等)利用全反射測定法(ATR法)進行測定。藉由根據所獲得之測定結果求出具有來自酯 鍵之波峰(1159cm-1)之化合物之重量相對於全部波峰化合物的重量比率而導出。 In addition, the content ratio of the above-mentioned fluorene imine oligomer having an ester bond can be obtained by using Gel Permeation Chromatography (GPC) to separate each peak, and then by Fourier transform infrared spectroscopy (FT-IR) The weight ratio of the absorbed compound of the ester bond was calculated | required. Specifically, first, tetrahydrofuran (THF) was used in the free solution, and a HPLC (manufactured by Japan Analytical Industry Co., Ltd.) was used for the separation of HPLC (manufactured by Japan Analytical Industry Co., Ltd.) using a GPC column (eg, "JAIGEL-2H" manufactured by Japan Analytical Industry Corporation). Take each wave crest. Thereafter, the compound obtained by removing the free liquid by heating or the like is measured by a total reflection measurement method (ATR method) using a Fourier transform infrared spectrophotometer (for example, "UMA600" manufactured by Agilent Technologies, etc.). Based on the obtained measurement results, the weight ratio of the compound having a peak (1159 cm -1 ) derived from an ester bond to the weight ratio of all the peak compounds was derived.
就所獲得之硬化物之長期耐熱性之觀點而言,本發明之醯亞胺寡聚物較佳為於主鏈之末端具有酚性羥基,更佳為於兩末端具有酚性羥基。 From the viewpoint of the long-term heat resistance of the obtained cured product, the fluorene imine oligomer of the present invention preferably has a phenolic hydroxyl group at the terminal of the main chain, and more preferably has a phenolic hydroxyl group at both terminals.
本發明之醯亞胺寡聚物之數量平均分子量之較佳下限為400,較佳上限為4200。藉由上述數量平均分子量為該範圍,而於將本發明之醯亞胺寡聚物用作硬化劑之情形時所獲得之硬化物成為長期耐熱性優異者。本發明之醯亞胺寡聚物之數量平均分子量之更佳下限為420,更佳上限為4000。 The preferred lower limit of the number average molecular weight of the fluorene imine oligomer of the present invention is 400, and the preferred upper limit is 4200. When the above number average molecular weight is within this range, the cured product obtained when the fluorene imine oligomer of the present invention is used as a curing agent is excellent in long-term heat resistance. A more preferable lower limit of the number average molecular weight of the fluorene imine oligomer of the present invention is 420, and a more preferable upper limit is 4,000.
再者,於本說明書中,上述「數量平均分子量」係利用凝膠滲透層析法(GPC),使用四氫呋喃作為溶劑進行測定,並藉由聚苯乙烯換算而求出之值。作為藉由GPC對基於聚苯乙烯換算之數量平均分子量進行測定時所使用之管柱,例如可列舉JAIGEL-2H-A(日本分析工業公司製造)等。 In addition, in this specification, the said "number average molecular weight" is the value calculated | required by gel permeation chromatography (GPC) using tetrahydrofuran as a solvent, and calculated | required by polystyrene conversion. Examples of the column used when measuring the number average molecular weight in terms of polystyrene by GPC include JAIGEL-2H-A (manufactured by Analytical Industries, Ltd.).
具體而言,本發明之醯亞胺寡聚物較佳為含有下述式(1-1)所表示之醯亞胺寡聚物及/或下述式(1-2)所表示之醯亞胺寡聚物作為主成分。 Specifically, the fluorene imine oligomer of the present invention preferably contains a fluorene imine oligomer represented by the following formula (1-1) and / or a fluorene imine represented by the following formula (1-2) An amine oligomer is used as a main component.
再者,於本說明書中,上述「主成分」意指含有比例為60莫耳%以上。 In addition, in this specification, the said "main component" means the content rate is 60 mol% or more.
式(1-1)及(1-2)中,R1及R2分別獨立地為氫原子、鹵素原子、或可被取代之一價烴基,X為鍵結鍵、氧原子、或可被取代之二價烴基,式(1-2)中,Y為鍵結鍵、氧原子、或可被取代之二價烴基。 In the formulae (1-1) and (1-2), R 1 and R 2 are each independently a hydrogen atom, a halogen atom, or a monovalent hydrocarbon group which may be substituted, and X is a bonding bond, an oxygen atom, or may be A substituted divalent hydrocarbon group. In the formula (1-2), Y is a bonding bond, an oxygen atom, or a divalent hydrocarbon group which may be substituted.
作為製造本發明之醯亞胺寡聚物之方法,可較佳使用如下方法:將作為原料使用之具有酚性羥基之單胺之量設為過量。 As a method for producing the fluorene imine oligomer of the present invention, a method can be preferably used in which the amount of the monoamine having a phenolic hydroxyl group used as a raw material is excessive.
醯亞胺寡聚物之製造方法亦為本發明之一,該醯亞胺寡聚物之製造方法包括使具有酸酐基之化合物與具有酚性羥基之單胺進行反應之步驟,且上述具有酚性羥基之單胺之使用量相對於上述具有酸酐基之化合物之酸酐基為1.5當量以上。根據本發明之醯亞胺寡聚物之製造方法,可容易地製造將作為副產物產生之具有酯鍵之醯亞胺寡聚物之含有比例設為7%以下的本發明之醯亞胺寡聚物。 The method for producing fluorene imine oligomer is also one of the present invention. The method for producing fluorene imine oligomer includes a step of reacting a compound having an acid anhydride group with a monoamine having a phenolic hydroxyl group, and the above-mentioned phenol having a phenol The use amount of the monoamine of the hydroxyl group is 1.5 equivalent or more with respect to the acid anhydride group of the compound having an acid anhydride group. According to the method for producing a fluorene imine oligomer of the present invention, it is possible to easily produce a fluorene imine oligomer of the present invention in which the content ratio of the fluorene imine oligomer having an ester bond generated as a by-product is 7% or less. Polymer.
將本發明之醯亞胺寡聚物之製造方法之具體例示於以下。 The specific example of the manufacturing method of the fluorene imine oligomer of this invention is shown below.
首先,預先使具有酚性羥基之單胺溶解於可使藉由反應所獲得之醯胺酸寡聚物溶解之溶劑(例如N,N-二甲基甲醯胺等)中,於所獲得之溶液中添加酸二酐,使其進行反應而獲得醯胺酸寡聚物溶液。繼而,進行數次如下操作:將所獲得之醯胺酸寡聚物溶液加入至鹽酸等中,回收析出物。將所獲得之析出物進行加熱而使醯亞胺化反應進行,藉此可獲得具有酚性羥基之醯亞胺寡聚物。於使用該方法之情形時,藉由將上述具有酚性羥基之單胺之使用量設為相對於上述酸二酐所具有之酸酐基為1.5當量以上,可將具有酯鍵之醯亞胺寡聚物之含有比例設為7%以下。 First, a monoamine having a phenolic hydroxyl group is previously dissolved in a solvent (for example, N, N-dimethylformamide, etc.) that can dissolve the ammonium oligomer obtained by the reaction. An acid dianhydride was added to the solution, and it was made to react, and the ammonium oligomer solution was obtained. Next, the following operations were performed several times: the obtained phosphoamino acid oligomer solution was added to hydrochloric acid or the like, and the precipitate was recovered. The obtained imide is heated to cause the amidine imidization reaction to proceed, whereby an amidine imide oligomer having a phenolic hydroxyl group can be obtained. In the case of using this method, by using the amount of the monoamine having a phenolic hydroxyl group as described above to be 1.5 equivalents or more with respect to the acid anhydride group of the acid dianhydride, the oligoimine having an ester bond can be made The content of the polymer is set to 7% or less.
又,將本發明之醯亞胺寡聚物之製造方法之另一具體例示於以下。 Moreover, another specific example of the manufacturing method of the fluorene imine oligomer of this invention is shown below.
首先,預先使二胺溶解於可使藉由反應所獲得之醯胺酸寡聚物溶解之溶劑(例如N,N-二甲基甲醯胺等)中,於所獲得之溶液中添加酸二酐,使其進行反應,而獲得兩末端具有酸酐基之醯胺酸寡聚物(A)之溶液。於所獲得之醯胺酸寡聚物(A)之溶液中添加具有酚性羥基之單胺,使其進行反應,而獲得醯胺酸寡聚物(B)之溶液。繼而,進行數次如下操作:將所獲得之醯胺酸寡聚物(B)之溶液加入至鹽酸等中,回收析出物。將所獲得之析出物進行加熱而 使醯亞胺化反應進行,藉此可獲得具有酚性羥基之醯亞胺寡聚物。於使用該方法之情形時,藉由將上述具有酚性羥基之單胺之使用量設為相對於上述醯胺酸寡聚物(A)之酸酐基為1.5當量以上,可將具有酯鍵之醯亞胺寡聚物之含有比例設為7%以下。 First, a diamine is dissolved in a solvent (e.g., N, N-dimethylformamide, etc.) which can dissolve the ammonium oligomer obtained by the reaction, and an acid diamine is added to the obtained solution. Anhydride is allowed to react to obtain a solution of amidinic acid oligomer (A) having acid anhydride groups at both ends. A monoamine having a phenolic hydroxyl group is added to a solution of the obtained oligoamic acid oligomer (A) and reacted to obtain a solution of the oligoamino acid oligomer (B). Then, the following operation was performed several times: the solution of the obtained ammonium oligomer (B) was added to hydrochloric acid or the like, and the precipitate was recovered. By heating the obtained precipitate to cause the amidine imidization reaction to proceed, a amidine imide oligomer having a phenolic hydroxyl group can be obtained. In the case of using this method, the amount of the monoamine having a phenolic hydroxyl group is set to 1.5 equivalents or more with respect to the acid anhydride group of the amino acid oligomer (A). The content ratio of fluorene imine oligomer is set to 7% or less.
作為上述具有酚性羥基之單胺,可較佳使用下述式(2)所表示之化合物。 As the monoamine having a phenolic hydroxyl group, a compound represented by the following formula (2) can be preferably used.
作為上述具有酚性羥基之單胺,具體而言,例如可列舉:3-胺基苯酚、4-胺基苯酚、4-胺基-鄰甲酚、5-胺基-鄰甲酚、4-胺基-2,3-二甲苯酚、4-胺基-2,5-二甲苯酚、4-胺基-2,6-二甲苯酚、4-胺基-1-萘酚、5-胺基-2-萘酚、6-胺基-1-萘酚、4-胺基-2,6-二苯基苯酚等。其中,就可獲得獲取性及保存穩定性優異且具有較高之玻璃轉移溫度之硬化物的方面而言,較佳為3-胺基苯酚、4-胺基苯酚、4-胺基-鄰甲酚、5-胺基-鄰甲酚。 Specific examples of the monoamine having a phenolic hydroxyl group include 3-aminophenol, 4-aminophenol, 4-amino-o-cresol, 5-amino-o-cresol, 4- Amino-2,3-xylenol, 4-amino-2,5-xylenol, 4-amino-2,6-xylenol, 4-amino-1-naphthol, 5-amine 2-naphthol, 6-amino-1-naphthol, 4-amino-2,6-diphenylphenol, and the like. Among these, 3-aminophenol, 4-aminophenol, and 4-amino-o-methyl are preferred in terms of obtaining a hardened product having excellent acquisition and storage stability and a high glass transition temperature. Phenol, 5-amino-o-cresol.
式(2)中,Ar為可被取代之二價芳香基,R3及R4分別獨立地為氫原子或可被取代之一價烴基。 In formula (2), Ar is a divalent aromatic group which may be substituted, and R 3 and R 4 are each independently a hydrogen atom or a monovalent hydrocarbon group which may be substituted.
作為上述酸二酐,可較佳使用下述式(3)所表示之化合物。 As the acid dianhydride, a compound represented by the following formula (3) can be preferably used.
作為上述酸二酐,具體而言,例如可列舉:焦蜜石酸二酐、3,3'-氧雙鄰苯二甲酸二酐、3,4'-氧雙鄰苯二甲酸二酐、4,4'-氧雙鄰苯二甲酸二酐、4,4'-(4,4'-亞異丙基二苯氧基)雙鄰苯二甲酸酐、4,4'-雙(3,4-二羧基苯氧基)二苯醚、對伸苯基雙(偏苯三酸酐)、2,3,3',4'-聯苯四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、4,4'-羰基雙鄰苯二甲酸二酐等。其中,就溶解性、耐熱性、及獲取性優異之方面而言,較佳為4,4'-(4,4'-亞異丙基二苯氧基)雙鄰苯二甲酸酐、3,4'-氧雙鄰苯二甲酸二酐、4,4'-氧雙鄰苯二甲酸二酐、4,4'-羰基雙鄰苯二甲酸二酐。 Specific examples of the acid dianhydride include pyromelite dianhydride, 3,3'-oxybisphthalic dianhydride, 3,4'-oxybisphthalic dianhydride, and 4 , 4'-oxybisphthalic dianhydride, 4,4 '-(4,4'-isopropylidene diphenoxy) bisphthalic anhydride, 4,4'-bis (3,4 -Dicarboxyphenoxy) diphenyl ether, p-phenylene bis (trimellitic anhydride), 2,3,3 ', 4'-biphenyltetracarboxylic dianhydride, 3,3', 4,4'-biphenyl Tetracarboxylic dianhydride, 4,4'-carbonylbisphthalic dianhydride, etc. Among them, 4,4 '-(4,4'-isopropylidenediphenoxy) bisphthalic anhydride, 3, 4'-oxybisphthalic dianhydride, 4,4'-oxybisphthalic dianhydride, 4,4'-carbonylbisphthalic dianhydride.
式(3)中,A為下述式(4-1)或下述式(4-2)所表示之四價基。 In the formula (3), A is a tetravalent group represented by the following formula (4-1) or the following formula (4-2).
式(4-1)及式(4-2)中,*為鍵結位置,式(4-1)中,Z為鍵結鍵、氧原子、羰基、或可被取代之於鍵結位置可具有氧原子之二價烴基。式(4-1)及式(4-2)中之芳香環之氫原子可被取代。 In the formula (4-1) and the formula (4-2), * is a bonding position, and in the formula (4-1), Z is a bonding bond, an oxygen atom, a carbonyl group, or may be substituted at the bonding position. A divalent hydrocarbon group having an oxygen atom. The hydrogen atom of the aromatic ring in the formula (4-1) and the formula (4-2) may be substituted.
作為上述二胺,可較佳使用下述式(5)所表示之化合物。 As the diamine, a compound represented by the following formula (5) can be preferably used.
作為上述二胺,具體而言,例如可列舉:3,3'-二胺基二苯甲烷、3,4'-二胺基二苯甲烷、4,4'-二胺基二苯甲烷、3,3'-二胺基二苯醚、3,4'-二胺基二苯醚、4,4'-二胺基二苯醚、1,2-苯二胺、1,3-苯二胺、1,4-苯二胺、3,3'-二胺基二苯基碸、4,4'-二胺基二苯基碸、雙(4-(3-胺基苯氧基)苯基)碸、雙(4-(4-胺基苯氧基)苯基)碸、1,3-雙(3-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、雙(4-(4-胺基苯氧基)苯基)甲烷、2,2-雙(4-(4-胺基苯氧基)苯基)丙烷、1,3-雙(2-(4-胺基苯基)-2-丙基)苯、1,4-雙(2-(4-胺基苯基)-2-丙基)苯、3,3'-二胺基-4,4'-二羥基二苯甲烷、4,4'-二胺 基-3,3'-二羥基二苯甲烷、3,3'-二胺基-4,4'-二羥基二苯醚、2,2-雙(3-胺基-4-羥基苯基)丙烷、2,2-雙(3-羥基-4-胺基苯基)丙烷、雙胺基苯基茀、雙甲苯胺茀、4,4'-雙(4-胺基苯氧基)聯苯、4,4'-二胺基-3,3'-二羥基二苯醚、3,3'-二胺基-4,4'-二羥基聯苯、4,4'-二胺基-2,2'-二羥基聯苯、4,4'-二胺基-3,3'-二羥基聯苯、4,4'-雙(4-胺基苯甲醯胺)-3,3'-二羥基聯苯、4,4'-雙(3-胺基苯甲醯胺)-3,3'-二羥基聯苯等。其中,就溶解性、耐熱性、及獲取性優異之方面而言,較佳為3,4'-二胺基二苯醚、4,4'-二胺基二苯醚、1,2-苯二胺、1,3-苯二胺、1,4-苯二胺、雙(4-(3-胺基苯氧基)苯基)碸、雙(4-(4-胺基苯氧基)苯基)碸、1,3-雙(2-(4-胺基苯基)-2-丙基)苯、1,4-雙(2-(4-胺基苯基)-2-丙基)苯。 Specific examples of the diamine include 3,3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3 , 3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 1,2-phenylenediamine, 1,3-phenylenediamine , 1,4-phenylenediamine, 3,3'-diaminodiphenylphosphonium, 4,4'-diaminodiphenylphosphonium, bis (4- (3-aminophenoxy) phenyl ) Fluorene, bis (4- (4-aminophenoxy) phenyl) fluorene, 1,3-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) ) Benzene, 1,4-bis (4-aminophenoxy) benzene, bis (4- (4-aminophenoxy) phenyl) methane, 2,2-bis (4- (4-amino Phenoxy) phenyl) propane, 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene, 1,4-bis (2- (4-aminophenyl)- 2-propyl) benzene, 3,3'-diamino-4,4'-dihydroxydiphenylmethane, 4,4'-diamino-3,3'-dihydroxydiphenylmethane, 3,3 '-Diamino-4,4'-dihydroxydiphenyl ether, 2,2-bis (3-amino-4-hydroxyphenyl) propane, 2,2-bis (3-hydroxy-4-amino Phenyl) propane, bisaminophenylphosphonium, dimethyltoluidine, 4,4'-bis (4-aminophenoxy) biphenyl, 4,4'-diamino-3,3'-di Hydroxydiphenyl ether, 3,3'- Diamino-4,4'-dihydroxybiphenyl, 4,4'-diamino-2,2'-dihydroxybiphenyl, 4,4'-diamino-3,3'-dihydroxydi Benzene, 4,4'-bis (4-aminobenzamide) -3,3'-dihydroxybiphenyl, 4,4'-bis (3-aminobenzamide) -3,3 ' -Dihydroxybiphenyl and the like. Among these, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, and 1,2-benzene are preferred in terms of excellent solubility, heat resistance, and availability. Diamine, 1,3-phenylenediamine, 1,4-phenylenediamine, bis (4- (3-aminophenoxy) phenyl) fluorene, bis (4- (4-aminophenoxy) Phenyl) fluorene, 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene, 1,4-bis (2- (4-aminophenyl) -2-propyl )benzene.
式(5)中,B為下述式(6-1)或下述式(6-2)所表示之二價基,R5~R8分別獨立地為氫原子或一價烴基。 In the formula (5), B is a divalent group represented by the following formula (6-1) or the following formula (6-2), and R 5 to R 8 are each independently a hydrogen atom or a monovalent hydrocarbon group.
式(6-1)及式(6-2)中,*為鍵結位置,式(6-1)中,Y為鍵結鍵、氧原子、或可被取代之二價烴基。式(6-1)及式(6-2)中之伸苯基可一部分或全部之氫原子被羥基取代。 In formula (6-1) and formula (6-2), * is a bonding position, and in formula (6-1), Y is a bonding bond, an oxygen atom, or a divalent hydrocarbon group which may be substituted. The phenylene group in the formula (6-1) and the formula (6-2) may be substituted with a part or all of the hydrogen atoms by a hydroxyl group.
本發明之醯亞胺寡聚物之醯亞胺化率之較佳下限為70%。藉由上述醯亞胺化率為70%以上,而於用作硬化劑之情形時可獲得高溫中之機械強度及長期耐熱性更優異之硬化物。上述醯亞胺化率之更佳下限為75%,進而較 佳之下限為80%。又,本發明之醯亞胺寡聚物之醯亞胺化率並無特別較佳上限,但實際之上限為98%。 The lower limit of the fluorene imidization rate of the fluorene imine oligomer of the present invention is 70%. With the above imidation ratio of 70% or more, when used as a hardener, a hardened product having better mechanical strength at high temperatures and long-term heat resistance can be obtained. The lower limit of the above fluorene imidization rate is 75%, and the lower limit is more preferably 80%. In addition, the fluorene imidization rate of the fluorene imine oligomer of the present invention does not have a particularly preferable upper limit, but the practical upper limit is 98%.
再者,上述「醯亞胺化率」可藉由傅立葉轉換紅外光譜法(FT-IR)而求出。具體而言,可使用傅立葉轉換紅外分光光度計(例如Agilent Technologies公司製造之「UMA600」等),利用全反射測定法(ATR法)進行測定,利用下述式,根據來自醯胺酸之羰基之1660cm-1附近之峰吸光度面積而導出。再者,下述式中之「醯胺酸寡聚物之峰吸光度面積」係指在使具有酸酐基之化合物與具有酚性羥基之單胺進行反應之後,不進行醯亞胺化步驟而藉由蒸發來去除溶劑,藉此獲得之醯胺酸寡聚物之吸光度面積。 In addition, the said "fluorene imidization rate" can be calculated | required by Fourier transform infrared spectroscopy (FT-IR). Specifically, a Fourier transform infrared spectrophotometer (e.g., "UMA600" manufactured by Agilent Technologies, etc.) can be used for measurement by total reflection measurement (ATR method). Derived from the peak absorbance area around 1660 cm -1 . In addition, the "peak absorbance area of amidine oligomer" in the following formula means that after a compound having an acid anhydride group is reacted with a monoamine having a phenolic hydroxyl group, the amine imidization step is not performed. The solvent was removed by evaporation, thereby obtaining the absorbance area of the amino acid oligomer.
醯亞胺化率(%)=100×(1-(醯亞胺化後之峰吸光度面積)/(醯胺酸寡聚物之峰吸光度面積)) 醯 imidization rate (%) = 100 × (1- (peak absorbance area after fluorenimide) / (peak absorbance area of fluorene oligomer))
如上所述,本發明之醯亞胺寡聚物於用作硬化劑之情形時,可獲得長期耐熱性優異之硬化物。由本發明之醯亞胺寡聚物所構成之硬化劑亦為本發明之一。又,含有硬化性樹脂及本發明之硬化劑的接著劑亦為本發明之一。 As described above, when the fluorene imine oligomer of the present invention is used as a hardener, a hardened material having excellent long-term heat resistance can be obtained. The hardener composed of the fluorene imine oligomer of the present invention is also one of the present invention. An adhesive containing a curable resin and the hardener of the present invention is also one aspect of the present invention.
關於本發明之接著劑中的本發明之硬化劑之含量,相對於硬化性樹脂100重量份,較佳下限為50重量份,較佳上限為500重量份。藉由本發明之硬化劑之含量為該範圍,所獲得之接著劑之硬化物成為長期耐熱性更優異者。本發明之硬化劑之含量之更佳下限為70重量份,更佳上限為400重量份。 Regarding the content of the hardener of the present invention in the adhesive of the present invention, the preferred lower limit is 50 parts by weight, and the preferred upper limit is 500 parts by weight based on 100 parts by weight of the curable resin. When the content of the curing agent of the present invention is within this range, the cured product of the obtained adhesive becomes more excellent in long-term heat resistance. A more preferable lower limit of the content of the hardener of the present invention is 70 parts by weight, and a more preferable upper limit is 400 parts by weight.
為了使未硬化狀態下之加工性提高等,本發明之接著劑亦可於不妨礙本發明之目的之範圍內,除了本發明之硬化劑以外還含有其他硬化劑。 In order to improve workability in an unhardened state, etc., the adhesive of the present invention may contain other hardeners in addition to the hardener of the present invention within a range that does not hinder the object of the present invention.
作為上述其他硬化劑,例如可列舉:酚系硬化劑、硫醇系硬化劑、胺系硬化劑、酸酐系硬化劑、氰酸酯系硬化劑、活性酯系硬化劑等。其中,較佳為酚系硬化劑、酸酐系硬化劑、氰酸酯系硬化劑、活性酯系硬化劑。 Examples of the other hardener include a phenol-based hardener, a thiol-based hardener, an amine-based hardener, an acid anhydride-based hardener, a cyanate-based hardener, and an active ester-based hardener. Among them, a phenol-based hardener, an acid anhydride-based hardener, a cyanate-based hardener, and an active ester-based hardener are preferred.
於本發明之接著劑含有上述其他硬化劑之情形時,硬化劑整體中上述其他硬化劑之含有比例之較佳上限為70重量%,更佳上限為50重量%,進而較佳上限為30重量%。 In the case where the adhesive of the present invention contains the other hardening agent, a preferable upper limit of the content ratio of the other hardening agent in the entire hardener is 70% by weight, a more preferable upper limit is 50% by weight, and a more preferable upper limit is 30% by weight. %.
本發明之接著劑含有硬化性樹脂。 The adhesive of the present invention contains a curable resin.
就所獲得之接著劑之流動性及加工性之觀點而言,上述硬化性樹脂較佳為於25℃為液狀。 From the viewpoint of fluidity and processability of the obtained adhesive, the above-mentioned curable resin is preferably liquid at 25 ° C.
作為上述硬化性樹脂,可較佳使用環氧樹脂。 As the curable resin, epoxy resin can be preferably used.
作為上述環氧樹脂,例如可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚E型環氧樹脂、雙酚S型環氧樹脂、2,2'-二烯丙基雙酚A型環氧樹脂、氫化雙酚型環氧樹脂、環氧丙烷加成雙酚A型環氧樹脂、間苯二酚型環氧樹脂、聯苯型環氧樹脂、硫化物型環氧樹脂、二苯醚型環氧樹脂、二環戊二烯型環氧樹脂、萘型環氧樹脂、茀型環氧樹脂、伸萘基醚型環氧樹脂、酚系酚醛型環氧樹脂、鄰甲酚酚醛型環氧樹脂、二環戊二烯酚醛型環氧樹脂、聯苯酚醛型環氧樹脂、萘酚酚醛型環氧樹脂、縮水甘油胺型環氧樹脂、烷基多元醇型環氧樹脂、橡膠改質型環氧樹脂、縮水甘油酯化合物等。其中,就黏度較低而易於調整所獲得之接著劑於室溫之加工性的方面而言,較佳為雙酚A型環氧樹脂、雙酚F型環氧樹脂、間苯二酚型環氧樹脂。 Examples of the epoxy resin include bisphenol A-type epoxy resin, bisphenol F-type epoxy resin, bisphenol E-type epoxy resin, bisphenol S-type epoxy resin, and 2,2'-diallyl. Bisphenol A epoxy resin, hydrogenated bisphenol epoxy resin, propylene oxide addition bisphenol A epoxy resin, resorcinol epoxy resin, biphenyl epoxy resin, sulfide ring Oxygen resin, diphenyl ether epoxy resin, dicyclopentadiene epoxy resin, naphthalene epoxy resin, fluorene epoxy resin, naphthyl ether epoxy resin, phenolic phenolic epoxy resin, O-cresol novolac epoxy resin, dicyclopentadiene novolac epoxy resin, biphenol novolac epoxy resin, naphthol novolac epoxy resin, glycidylamine epoxy resin, alkyl polyol type ring Oxygen resin, rubber modified epoxy resin, glycidyl ester compound, etc. Among them, in terms of low viscosity and easy adjustment of the workability of the obtained adhesive at room temperature, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and resorcinol ring are preferred. Oxygen resin.
本發明之接著劑亦可含有硬化促進劑。藉由含有上述硬化促進劑,可縮短硬化時間而提高生產性。 The adhesive of the present invention may contain a hardening accelerator. By containing the said hardening accelerator, the hardening time can be shortened and productivity can be improved.
作為上述硬化促進劑,例如可列舉:咪唑系硬化促進劑、三級胺系硬化促進劑、膦系硬化促進劑、光鹼產生劑、鋶鹽系硬化促進劑等。其中,較佳為咪唑系硬化促進劑。 Examples of the hardening accelerator include an imidazole-based hardening accelerator, a tertiary amine-based hardening accelerator, a phosphine-based hardening accelerator, a photobase generator, and a phosphonium salt-based hardening accelerator. Among these, an imidazole-based hardening accelerator is preferred.
上述硬化促進劑之含量,相對於上述硬化性樹脂100重量份,較佳下限為0.01重量份,較佳上限為10重量份。藉由上述硬化促進劑之含量為該 範圍,而於維持優異之接著性等之狀態下縮短硬化時間之效果更優異。上述硬化促進劑之含量之更佳下限為0.05重量份,更佳上限為5重量份。 Content of the said hardening accelerator is 0.01 weight part with a preferable minimum with respect to 100 weight part of said curable resin, and a preferable upper limit is 10 weight part. When the content of the hardening accelerator is within this range, the effect of shortening the hardening time while maintaining excellent adhesion and the like is more excellent. A more preferable lower limit of the content of the hardening accelerator is 0.05 parts by weight, and a more preferable upper limit is 5 parts by weight.
本發明之接著劑亦能以緩和應力、賦予韌性、賦予難燃性等為目的而含有有機填充劑。 The adhesive of the present invention may contain an organic filler for the purpose of stress relaxation, toughness, and flame retardancy.
作為上述有機填充劑,例如可列舉:聚矽氧橡膠粒子、丙烯酸橡膠粒子、胺酯(Urethane)橡膠粒子、聚醯胺粒子、聚醯胺醯亞胺粒子、聚醯亞胺粒子、苯代三聚氰胺(Benzoguanamine)粒子、及其等之核殼(Core-shell)粒子等。其中,較佳為聚醯胺粒子、聚醯胺醯亞胺粒子、聚醯亞胺粒子。 Examples of the organic filler include silicone rubber particles, acrylic rubber particles, urethane rubber particles, polyimide particles, polyimide particles, polyimide particles, and benzomelamine. (Benzoguanamine) particles, and their core-shell particles. Among these, polyimide particles, polyimide particles, and polyimide particles are preferred.
上述有機填充劑之含量,相對於上述硬化性樹脂100重量份,較佳下限為10重量份,較佳上限為500重量份。藉由上述有機填充劑之含量為該範圍,而於維持優異之接著性等之狀態下所獲得之硬化物成為韌性等更優異者。上述有機填充劑之含量之更佳下限為30重量份,更佳上限為400重量份。 The content of the organic filler is preferably 10 parts by weight and 100% by weight based on 100 parts by weight of the curable resin. When the content of the organic filler is within this range, the cured product obtained while maintaining excellent adhesiveness and the like becomes more excellent in toughness and the like. A more preferable lower limit of the content of the organic filler is 30 parts by weight, and a more preferable upper limit is 400 parts by weight.
本發明之接著劑亦能以使硬化後之線膨脹率降低來減少彎曲、或賦予難燃性、或使接著可靠性提高等為目的而含有無機填充劑。 The adhesive of the present invention can also contain an inorganic filler for the purpose of reducing the linear expansion coefficient after curing, reducing bending, imparting flame retardancy, and improving adhesion reliability.
作為上述無機填充劑,例如可列舉:矽酸膠等二氧化矽(silica)、氧化鋁、氮化鋁、氮化硼、氮化矽、氫氧化鋁、氫氧化鎂、玻璃粉、玻璃料、玻璃纖維、碳纖維、無機離子交換體等。 Examples of the inorganic filler include silicon dioxide (silica) such as silicic acid glue, alumina, aluminum nitride, boron nitride, silicon nitride, aluminum hydroxide, magnesium hydroxide, glass frit, glass frit, Glass fiber, carbon fiber, inorganic ion exchanger, etc.
上述無機填充劑之含量,相對於上述硬化性樹脂100重量份,較佳下限為10重量份,較佳上限為1000重量份。藉由上述無機填充劑之含量為該範圍,而於維持優異之加工性等之狀態下,提高接著可靠性等效果更優異。上述無機填充劑之含量之更佳下限為20重量份,更佳上限為900重量份。 The content of the inorganic filler is preferably 10 parts by weight and 100% by weight based on 100 parts by weight of the curable resin. When the content of the inorganic filler is within this range, effects such as improvement in adhesion reliability and the like are maintained while maintaining excellent processability and the like. A more preferable lower limit of the content of the inorganic filler is 20 parts by weight, and a more preferable upper limit is 900 parts by weight.
又,無機填充劑亦能以提高對於被接著體之短時間內之塗佈性及形狀保持性等為目的而用作流動調整劑。 Moreover, an inorganic filler can also be used as a flow control agent for the purpose of improving the coating property and shape retention property in a short time with respect to an adherend.
用作流動調整劑之無機填充劑例如可列舉:發煙二氧化矽 (fumed silica)或層狀矽酸鹽等。 Examples of the inorganic filler used as the flow modifier include fumed silica and layered silicate.
上述用作流動調整劑之無機填充劑之含量,相對於上述硬化性樹脂100重量份,較佳下限為0.1重量份,較佳上限為50重量份。藉由上述用作流動調整劑之無機填充劑之含量為該範圍,而使對於被接著體之短時間內之塗佈性及形狀保持性提高等效果更優異。上述用作流動調整劑之無機填充劑之含量之更佳下限為0.5重量份,更佳上限為30重量份。 Content of the said inorganic filler used as a flow modifier is 0.1 weight part with respect to 100 weight part of said curable resin, Preferably it is a minimum, and a preferable upper limit is 50 weight part. When the content of the inorganic filler used as the flow control agent is within this range, effects such as improvement in coating properties and shape retention properties in a short time with respect to the adherend are more excellent. A more preferable lower limit of the content of the above-mentioned inorganic filler used as the flow regulator is 0.5 part by weight, and a more preferable upper limit is 30 parts by weight.
本發明之接著劑亦可於不妨礙本發明之目的之範圍內含有高分子化合物。上述高分子化合物發揮作為造膜成分之作用。 The adhesive of the present invention may contain a polymer compound within a range that does not hinder the object of the present invention. The polymer compound functions as a film forming component.
上述高分子化合物亦可具有反應性官能基。 The polymer compound may have a reactive functional group.
作為上述反應性官能基,例如可列舉:胺基、胺酯基、醯亞胺基、羥基、羧基、環氧基等。 Examples of the reactive functional group include an amine group, an amine ester group, a fluorenimine group, a hydroxyl group, a carboxyl group, and an epoxy group.
又,上述高分子化合物於硬化物中可形成相分離結構,亦可不形成相分離結構。於上述高分子化合物於硬化物中不形成相分離結構之情形時,作為上述高分子化合物,就高溫中之機械強度、長期耐熱性、及耐濕性更優異之方面而言,較佳為具有環氧基作為上述反應性官能基之高分子化合物。 In addition, the polymer compound may form a phase separation structure in the hardened material, or may not form a phase separation structure. In the case where the polymer compound does not form a phase separation structure in the hardened material, it is preferable that the polymer compound has excellent mechanical strength at high temperatures, long-term heat resistance, and moisture resistance. An epoxy group is a polymer compound having the above-mentioned reactive functional group.
本發明之接著劑亦可於不妨礙本發明之目的之範圍內含有反應性稀釋劑。 The adhesive of the present invention may contain a reactive diluent within a range that does not hinder the object of the present invention.
作為上述反應性稀釋劑,就接著可靠性之觀點而言,較佳為於1分子中具有2個以上之反應性官能基之反應性稀釋劑。 The reactive diluent is preferably a reactive diluent having two or more reactive functional groups in one molecule from the viewpoint of reliability.
作為上述反應性稀釋劑所具有之反應性官能基,可列舉與上述高分子化合物所具有之反應性官能基相同者。 As a reactive functional group which the said reactive diluent has, the same thing as the reactive functional group which the said polymer compound has is mentioned.
本發明之接著劑亦可進而含有溶劑、偶合劑、分散劑、儲藏穩定劑、防滲出劑、助熔劑、液狀難燃劑等添加劑。 The adhesive of the present invention may further contain additives such as a solvent, a coupling agent, a dispersant, a storage stabilizer, an anti-exudation agent, a fluxing agent, and a liquid flame retardant.
作為製造本發明之接著劑之方法,例如可列舉使用勻相分散 機、萬能混合機、班布里混合機、捏合機等混合機,將硬化性樹脂、本發明之硬化劑、及視需要添加之其他硬化劑或硬化促進劑等進行混合之方法等。 Examples of the method for producing the adhesive of the present invention include using a homomixer, a universal mixer, a Banbury mixer, a kneader, and the like to add a hardening resin, the hardener of the present invention, and if necessary, A method of mixing other hardening agents or hardening accelerators.
又,藉由將本發明之接著劑塗佈於脫模膜上並使其乾燥,可獲得由本發明之接著劑所構成之接著膜。 Furthermore, by applying the adhesive of the present invention to a release film and drying it, an adhesive film composed of the adhesive of the present invention can be obtained.
本發明之接著劑可用於廣泛之用途,尤其是可較佳用於要求較高之耐熱性之電子材料用途。例如,可用作航空、車載用電子控制單元(ECU)用途、或使用SiC、GaN之功率裝置用途中之晶粒接著(Die Attach)劑等。又,例如亦可用於功率覆蓋(Power Overlay)封裝用接著劑、印刷配線板用接著劑、軟性印刷電路板之覆蓋層用接著劑、半導體接合用接著劑、結構材料用接著劑等。進而,除接著劑用途以外,作為硬化性組成物,亦可用於例如密封劑、覆銅積層板、半導體接合用接著劑、層間絕緣膜、預浸體等。 The adhesive of the present invention can be used in a wide range of applications, and in particular, it can be preferably used in electronic material applications requiring higher heat resistance. For example, it can be used as a die attach agent in aviation and automotive electronic control unit (ECU) applications, or in power device applications using SiC and GaN. Moreover, it can also be used, for example, for an adhesive for power overlay packaging, an adhesive for printed wiring boards, an adhesive for cover layers of flexible printed circuit boards, an adhesive for semiconductor bonding, and an adhesive for structural materials. Furthermore, in addition to the use of an adhesive, the curable composition can also be used in, for example, a sealant, a copper-clad laminate, an adhesive for semiconductor bonding, an interlayer insulating film, a prepreg, and the like.
根據本發明,可提供一種可用於長期耐熱性優異之硬化物之醯亞胺寡聚物。又,根據本發明,可提供一種由該醯亞胺寡聚物所構成之硬化劑、及使用該硬化劑而成之接著劑。進而,根據本發明,可提供一種該醯亞胺寡聚物之製造方法。 According to the present invention, it is possible to provide a fluorene imine oligomer that can be used for a hardened product having excellent long-term heat resistance. Moreover, according to this invention, the hardening | curing agent which consists of this fluorene imine oligomer, and the adhesive agent using this hardening | curing agent can be provided. Furthermore, according to this invention, the manufacturing method of this fluorene imine oligomer can be provided.
以下,揭示實施例而對本發明進一步詳細地進行說明,但本發明並不僅限定於該等實施例。 Hereinafter, the present invention will be described in more detail by explaining examples, but the present invention is not limited to these examples.
(合成例1(醯亞胺寡聚物A之製作)) (Synthesis example 1 (production of fluorene imine oligomer A))
使3-胺基苯酚(東京化成工業公司製造)32.74重量份(相對於進行反應之3,4'-氧雙鄰苯二甲酸二酐之酸酐基為1.5當量)溶解於N,N-二甲基甲醯胺200mL中。於所獲得之溶液中添加3,4'-氧雙鄰苯二甲酸二酐(東京化成工業公司製造)31.0重量份,於25℃攪拌2小時,使其進行反應而獲得醯胺酸寡聚物溶液。將所獲得之醯胺酸寡聚物溶液加入至1mol/L之鹽酸2L中,回收析出物。使所獲得之析出物溶解於N,N-二甲基甲醯胺100mL中,將所獲得之溶液加入至0.5mol/L之鹽酸2L中,回收析出物。使所獲得之析出物溶解於N,N-二甲基甲醯胺100mL中,將所獲得之溶液加入至0.1mol/L之鹽酸2L中,回收析出物。對於所獲得之析出物,以於180℃加熱2小時之後,於300℃加熱2小時之醯亞胺化條件使其反應,藉此獲得具有酚性羥基之醯亞胺寡聚物A(醯亞胺化率94%)。 32.74 parts by weight of 3-aminophenol (manufactured by Tokyo Chemical Industry Co., Ltd.) (1.5 equivalents to the anhydride group of the 3,4'-oxybisphthalic dianhydride undergoing the reaction) was dissolved in N, N-dimethyl Methylformamide in 200 mL. 31.0 parts by weight of 3,4'-oxybisphthalic dianhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to the obtained solution, and the mixture was stirred at 25 ° C for 2 hours to perform a reaction to obtain amidin oligomer. Solution. The obtained ammonium oligomer solution was added to 2 L of 1 mol / L hydrochloric acid, and a precipitate was recovered. The obtained precipitate was dissolved in 100 mL of N, N-dimethylformamide, and the obtained solution was added to 2 L of 0.5 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was dissolved in 100 mL of N, N-dimethylformamide, and the obtained solution was added to 2 L of 0.1 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was heated at 180 ° C. for 2 hours, and then heated at 300 ° C. for 2 hours to react with sulfonimide, thereby obtaining a sulfonium imine oligomer A having a phenolic hydroxyl group. Amination rate of 94%).
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物A以上述式(1-1)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物A其具有酯鍵之醯亞胺寡聚物之含有比例為5.5%。進而,醯亞胺寡聚物A之數量平均分子量為506。 Furthermore, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer A has the fluorene imine oligomer represented by the above formula (1-1) as a main component. Furthermore, it was confirmed by GPC fractionation and FT-IR analysis that the content ratio of the fluorene imine oligomer A having an ester bond to the fluorene imine oligomer A was 5.5%. The number average molecular weight of the fluoreneimine oligomer A was 506.
(合成例2(醯亞胺寡聚物B之製作)) (Synthesis example 2 (production of fluorene imine oligomer B))
將析出物之醯亞胺化條件變更為使用真空乾燥烘箱,於200℃、5mmHg加熱3小時,除此以外,與合成例1同樣地獲得具有酚性羥基之醯亞胺寡聚物B(醯亞胺化率46%)。 The sulfonium imidization condition of the precipitate was changed to a vacuum drying oven, and heated at 200 ° C and 5 mmHg for 3 hours. Except that the sulfonium imine oligomer B (醯Imidization rate 46%).
藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物B包含上述式(1-1)所表示之醯亞胺寡聚物。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物B其具有酯鍵之醯亞胺寡聚物之含有比例為5.5%。進而,醯亞胺寡聚物B之數量平均分子量為510。 By 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer B contains the fluorene imine oligomer represented by the above formula (1-1). In addition, GPC fractionation and FT-IR analysis confirmed that the content ratio of the fluorene imine oligomer B having an ester bond to the fluorene imine oligomer B was 5.5%. The number-average molecular weight of the fluoreneimine oligomer B was 510.
(合成例3(醯亞胺寡聚物C之製作)) (Synthesis example 3 (production of fluorene imine oligomer C))
將3-胺基苯酚之使用量變更為65.48重量份(相對於進行反應之3,4'-氧雙鄰 苯二甲酸二酐之酸酐基為3當量),除此以外,與合成例1同樣地獲得具有酚性羥基之醯亞胺寡聚物C(醯亞胺化率94%)。 The use amount of 3-aminophenol was changed to 65.48 parts by weight (3 equivalents to the acid anhydride group of the 3,4'-oxybisphthalic dianhydride undergoing the reaction), except that the same amount was used as in Synthesis Example 1. A fluorene imine oligomer C having a phenolic hydroxyl group was obtained (94% of fluorene imine).
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物C以上述式(1-1)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物C其具有酯鍵之醯亞胺寡聚物之含有比例為4.7%。進而,醯亞胺寡聚物C之數量平均分子量為506。 Furthermore, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer C contains the fluorene imine oligomer represented by the above formula (1-1) as a main component. In addition, by GPC fractionation and FT-IR analysis, it was confirmed that the content ratio of fluorene imine oligomer C having an ester bond to fluorene imine oligomer C was 4.7%. The number average molecular weight of the fluoreneimine oligomer C was 506.
(合成例4(醯亞胺寡聚物D之製作)) (Synthesis example 4 (production of fluorene imine oligomer D))
將3-胺基苯酚32.74重量份變更為5-胺基-鄰甲酚(東京化成工業公司製造)36.95重量份(相對於進行反應之3,4'-氧雙鄰苯二甲酸二酐之酸酐基為1.5當量),除此以外,與合成例1同樣地獲得具有酚性羥基之醯亞胺寡聚物D(醯亞胺化率94%)。 32.74 parts by weight of 3-aminophenol was changed to 36.95 parts by weight of 5-amino-o-cresol (manufactured by Tokyo Chemical Industry Co., Ltd.) (based on the anhydride of 3,4'-oxybisphthalic acid dianhydride undergoing the reaction) The base was 1.5 equivalents), and a fluorene imine oligomer D having a phenolic hydroxyl group (a fluorene imidization rate of 94%) was obtained in the same manner as in Synthesis Example 1.
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物D以上述式(1-1)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物D其具有酯鍵之醯亞胺寡聚物之含有比例為5.3%。進而,醯亞胺寡聚物D之數量平均分子量為531。 Furthermore, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer D contains the fluorene imine oligomer represented by the above formula (1-1) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content of the fluorene imine oligomer D having an ester bond was 5.3%. The number-average molecular weight of the fluoreneimine oligomer D was 531.
(合成例5(醯亞胺寡聚物E之製作)) (Synthesis example 5 (production of fluorene imine oligomer E))
添加4,4'-(4,4'-亞異丙基二苯氧基)雙鄰苯二甲酸酐(東京化成工業公司製造)52.0重量份以代替3,4'-氧雙鄰苯二甲酸二酐31.0重量份,除此以外,與合成例1同樣地獲得具有酚性羥基之醯亞胺寡聚物E(醯亞胺化率93%)。3-胺基苯酚之使用量係相對於進行反應之4,4'-(4,4'-亞異丙基二苯氧基)雙鄰苯二甲酸酐之酸酐基為1.5當量。 52.0 parts by weight of 4,4 '-(4,4'-isopropylidene diphenoxy) bisphthalic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) is added in place of 3,4'-oxybisphthalic acid A fluorene imine oligomer E having a phenolic hydroxyl group was obtained in the same manner as in Synthesis Example 1 except for 31.0 parts by weight of dianhydride (fluorine imidization rate: 93%). The amount of 3-aminophenol used is 1.5 equivalents based on the anhydride group of 4,4 '-(4,4'-isopropylidene diphenoxy) bisphthalic anhydride.
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物E以上述式(1-1)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物E其具有酯鍵之醯亞胺寡聚物之含有比例為5.4%。進 而,醯亞胺寡聚物E之數量平均分子量為712。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer E has the fluorene imine oligomer represented by the above formula (1-1) as a main component. In addition, it was confirmed by GPC fractionation and FT-IR analysis that the content ratio of the fluorene imine oligomer E having an ester bond was 5.4%. The number-average molecular weight of the fluoreneimine oligomer E was 712.
(合成例6(醯亞胺寡聚物F之製作)) (Synthesis example 6 (production of fluorene imine oligomer F))
使1,3-雙(2-(4-胺基苯基)-2-丙基)苯(MITSUI FINE CHEMICALS公司製造之「Bisaniline M」)34.45重量份溶解於N,N-二甲基甲醯胺200mL中。於所獲得之溶液中添加4,4'-(4,4'-亞異丙基二苯氧基)雙鄰苯二甲酸酐(東京化成工業公司製造)104.1重量份,於25℃攪拌2小時,使其反應而獲得兩末端具有酸酐基之醯胺酸寡聚物(A)之溶液。於所獲得之醯胺酸寡聚物(A)之溶液中添加3-胺基苯酚(東京化成工業公司製造)32.74重量份(相對於進行反應之醯胺酸寡聚物(A)之酸酐基為1.5當量),於25℃攪拌2小時,使其反應而獲得醯胺酸寡聚物(B)之溶液。將所獲得之醯胺酸寡聚物(B)之溶液加入至1mol/L之鹽酸2L中,回收析出物。使所獲得之析出物溶解於N,N-二甲基甲醯胺100mL中,將所獲得之溶液添加至0.5mol/L之鹽酸2L中,回收析出物。使所獲得之析出物溶解於N,N-二甲基甲醯胺100mL中,將所獲得之溶液添加至0.1mol/L之鹽酸2L中,回收析出物。對於所獲得之析出物,以於180℃加熱2小時之後,於300℃加熱2小時之醯亞胺化條件使其進行反應,藉此獲得具有酚性羥基之醯亞胺寡聚物F(醯亞胺化率92%)。 34.45 parts by weight of 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene ("Bisaniline M" manufactured by MITSUI FINE CHEMICALS) was dissolved in N, N-dimethylformamidine Amine in 200 mL. 104.1 parts by weight of 4,4 '-(4,4'-isopropylidene diphenoxy) bisphthalic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to the obtained solution, and the mixture was stirred at 25 ° C for 2 hours. And reacted to obtain a solution of amidinic acid oligomer (A) having acid anhydride groups at both ends. 32.74 parts by weight of 3-aminophenol (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to the solution of the obtained amino acid oligomer (A) (with respect to the acid anhydride group of the amino acid oligomer (A) to be reacted). (1.5 equivalents), stirred at 25 ° C for 2 hours, and reacted to obtain a solution of amidine oligomer (B). The obtained solution of the amidine oligomer (B) was added to 2 L of 1 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was dissolved in 100 mL of N, N-dimethylformamide, and the obtained solution was added to 2 L of 0.5 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was dissolved in 100 mL of N, N-dimethylformamide, and the obtained solution was added to 2 L of 0.1 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was heated at 180 ° C. for 2 hours, and then heated at 300 ° C. for 2 hours to perform a reaction, thereby obtaining a fluorene imine oligomer F (醯Imidization rate 92%).
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物F以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物F其具有酯鍵之醯亞胺寡聚物之含有比例為5.5%。進而,醯亞胺寡聚物F之數量平均分子量為1548。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer F contains the fluorene imine oligomer represented by the above formula (1-2) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content ratio of the fluorene imine oligomer having an ester bond to the fluorene imine oligomer F was 5.5%. The number-average molecular weight of the fluoreneimine oligomer F was 1,548.
(合成例7(醯亞胺寡聚物G之製作)) (Synthesis example 7 (production of fluorene imine oligomer G))
將1,3-雙(2-(4-胺基苯基)-2-丙基)苯之使用量變更為17.23重量份,且將3-胺基苯酚之使用量變更為49.11重量份,除此以外。與合成例6同樣地獲得具有酚性羥基之醯亞胺寡聚物G(醯亞胺化率93%)。3-胺基苯酚之使用量係相 對於進行反應之醯胺酸寡聚物(A)之酸酐基為1.5當量。 Change the use amount of 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene to 17.23 parts by weight and change the use amount of 3-aminophenol to 49.11 parts by weight, except Beyond that. In the same manner as in Synthesis Example 6, a fluorene imine oligomer G having a phenolic hydroxyl group (a fluorinated imidization rate of 93%) was obtained. The amount of the 3-aminophenol used was 1.5 equivalents based on the anhydride group of the sulfamic acid oligomer (A) to be reacted.
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物G以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物G其具有酯鍵之醯亞胺寡聚物之含有比例為5.4%。進而,醯亞胺寡聚物G之數量平均分子量為1126。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer G has the fluorene imine oligomer represented by the above formula (1-2) as a main component. Furthermore, it was confirmed by GPC fractionation and FT-IR analysis that the content ratio of fluorene imine oligomer G having an ester bond to fluorene imine oligomer G was 5.4%. Furthermore, the number average molecular weight of the fluoreneimine oligomer G was 1126.
(合成例8(醯亞胺寡聚物H之製作)) (Synthesis Example 8 (Production of fluorene imine oligomer H))
使1,3-雙(2-(4-胺基苯基)-2-丙基)苯(MITSUI FINE CHEMICALS公司製造之「Bisaniline M」)34.5重量份溶解於N-甲基吡咯啶酮(和光純藥工業公司製造之「NMP」)200mL中。於所獲得之溶液中添加4,4'-(4,4'-亞異丙基二苯氧基)雙鄰苯二甲酸酐(東京化成工業公司製造)104.1重量份,於25℃攪拌2小時,使其進行反應而獲得醯胺酸寡聚物溶液(A)。對於所獲得之醯胺酸寡聚物溶液(A),進而添加3-胺基苯酚(東京化成工業公司製造)32.74重量份(相對於進行反應之醯胺酸寡聚物(A)之酸酐基為1.5當量),於25℃攪拌2小時,使其進行反應而獲得醯胺酸寡聚物溶液(B)。將所獲得之醯胺酸寡聚物(B)之溶液添加至1mol/L之鹽酸2L中,回收析出物。使所獲得之析出物溶解於N,N-二甲基甲醯胺100mL中,將所獲得之溶液添加至0.5mol/L之鹽酸2L中,回收析出物。使所獲得之析出物溶解於N,N-二甲基甲醯胺100mL中,將所獲得之溶液加入至0.1mol/L之鹽酸2L中,回收析出物。對於所獲得之析出物,以於180℃加熱2小時之後,於300℃加熱2小時之醯亞胺化條件使其進行反應,藉此獲得具有酚性羥基之醯亞胺寡聚物H(醯亞胺化率92%)。 34.5 parts by weight of 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene ("Bisaniline M" manufactured by MITSUI FINE CHEMICALS) was dissolved in N-methylpyrrolidone (and "NMP" manufactured by Kwangjon Pharmaceutical Co., Ltd.) in 200 mL. 104.1 parts by weight of 4,4 '-(4,4'-isopropylidene diphenoxy) bisphthalic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to the obtained solution, and the mixture was stirred at 25 ° C for 2 hours. Then, it was made to react, and the ammonium oligomer solution (A) was obtained. To the obtained amino acid oligomer solution (A), 32.74 parts by weight of 3-aminophenol (manufactured by Tokyo Chemical Industry Co., Ltd.) was added (based on the anhydride group of the amino acid oligomer (A) to be reacted). (1.5 equivalents), stirred at 25 ° C for 2 hours, and reacted to obtain a phosphoric acid oligomer solution (B). A solution of the obtained ammonium oligomer (B) was added to 2 L of 1 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was dissolved in 100 mL of N, N-dimethylformamide, and the obtained solution was added to 2 L of 0.5 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was dissolved in 100 mL of N, N-dimethylformamide, and the obtained solution was added to 2 L of 0.1 mol / L hydrochloric acid, and the precipitate was recovered. The obtained precipitate was heated at 180 ° C. for 2 hours, and then heated at 300 ° C. for 2 hours to perform a reaction, thereby obtaining a fluorene imine oligomer H (醯Imidization rate 92%).
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物H以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物H其具有酯鍵之醯亞胺寡聚物之含有比例為5.5%。進而,醯亞胺寡聚物H之數量平均分子量為2720。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer H has the fluorene imine oligomer represented by the above formula (1-2) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content of the fluorene imine oligomer H having an ester bond was 5.5%. The number average molecular weight of the fluoreneimine oligomer H was 2720.
(合成例9(醯亞胺寡聚物I之製作)) (Synthesis example 9 (production of fluorene imine oligomer I))
將1,3-雙(2-(4-胺基苯基)-2-丙基)苯34.45重量份變更為2,2-雙(3-胺基-4-羥基苯基)丙烷25.83重量份,除此以外,與合成例6同樣地獲得具有酚性羥基之醯亞胺寡聚物I(醯亞胺化率93%)。 34.45 parts by weight of 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene was changed to 25.83 parts by weight of 2,2-bis (3-amino-4-hydroxyphenyl) propane Other than that, in the same manner as in Synthesis Example 6, a fluorene imine oligomer I having a phenolic hydroxyl group (a fluorinated imine rate of 93%) was obtained.
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物I以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物I其具有酯鍵之醯亞胺寡聚物之含有比例為5.4%。進而,醯亞胺寡聚物I之數量平均分子量為1490。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer I contains the fluorene imine oligomer represented by the above formula (1-2) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content of the fluorene imine oligomer I having an ester bond in the fluorene imine oligomer I was 5.4%. Furthermore, the number average molecular weight of the fluoreneimine oligomer I was 1,490.
(合成例10(醯亞胺寡聚物J之製作)) (Synthesis Example 10 (Production of fluorene imine oligomer J))
將3-胺基苯酚之使用量變更為21.83重量份(相對於進行反應之3,4'-氧雙鄰苯二甲酸二酐之酸酐基為1當量),除此以外,與合成例1同樣地獲得具有酚性羥基之醯亞胺寡聚物J(醯亞胺化率93%)。 The use amount of 3-aminophenol was changed to 21.83 parts by weight (1 equivalent to the acid anhydride group of the 3,4'-oxybisphthalic dianhydride undergoing the reaction), except that the same amount was used as in Synthesis Example 1. A fluorene imine oligomer J having a phenolic hydroxyl group was obtained (93% of fluorene imine).
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物J以上述式(1-1)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物J其具有酯鍵之醯亞胺寡聚物之含有比例為8.2%。進而,醯亞胺寡聚物J之數量平均分子量為543。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer J contains the fluorene imine oligomer represented by the above formula (1-1) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content of the fluorene imine oligomer J having an ester bond was 8.2%. The number average molecular weight of the fluoreneimine oligomer J was 543.
(合成例11(醯亞胺寡聚物K之製作)) (Synthesis Example 11 (Production of fluorene imine oligomer K))
將析出物之醯亞胺化條件變更為使用真空乾燥烘箱,於200℃、5mmHg加熱3小時,除此以外,與合成例10同樣地獲得醯亞胺寡聚物K(醯亞胺化率44%)。 The amidine imidation conditions of the precipitate were changed to a vacuum drying oven, and heated at 200 ° C and 5 mmHg for 3 hours. Except that the amidine imide oligomer K (amidation ratio 44) %).
藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物K包含上述式(1-1)所表示之醯亞胺寡聚物。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物K其具有酯鍵之醯亞胺寡聚物之含有比例為8.2%。進而,醯亞胺寡聚物K之數量平均分子量為556。 By 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer K includes the fluorene imine oligomer represented by the above formula (1-1). In addition, by GPC fractionation and FT-IR analysis, it was confirmed that the content ratio of the fluorene imine oligomer K having an ester bond to the fluorene imine oligomer K was 8.2%. The number-average molecular weight of the fluoreneimine oligomer K was 556.
(合成例12(醯亞胺寡聚物L之製作)) (Synthesis Example 12 (Production of fluorene imine oligomer L))
將3-胺基苯酚之使用量變更為21.83重量份,除此以外,與合成例6同樣地獲得具有酚性羥基之醯亞胺寡聚物L(醯亞胺化率92%)。3-胺基苯酚之使用量係相對於進行反應之醯胺酸寡聚物(A)之酸酐基為1當量。 Except having changed the usage-amount of 3-aminophenol to 21.83 weight part, it carried out similarly to the synthesis example 6, and obtained the fluorene imide oligomer L which has a phenolic hydroxyl group (fluorene imidation rate 92%). The amount of 3-aminophenol used is 1 equivalent with respect to the anhydride group of the amido oligomer (A) to be reacted.
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物L以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物L其具有酯鍵之醯亞胺寡聚物之含有比例為8.0%。進而,醯亞胺寡聚物L之數量平均分子量為1710。 Furthermore, it was confirmed by 1 H-NMR, GPC, and FT-IR analysis that the fluorene imine oligomer L had the fluorene imine oligomer represented by the above formula (1-2) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content ratio of the fluorene imine oligomer L having an ester bond to the fluorene imine oligomer L was 8.0%. The number-average molecular weight of the fluoreneimine oligomer L was 17,10.
(合成例13(醯亞胺寡聚物M之製作)) (Synthesis example 13 (production of fluorene imine oligomer M))
將1,3-雙(2-(4-胺基苯基)-2-丙基)苯之使用量變更為17.23重量份,除此以外,與合成例6同樣地獲得具有酚性羥基之醯亞胺寡聚物M(醯亞胺化率92%)。3-胺基苯酚之使用量係相對於進行反應之醯胺酸寡聚物(A)之酸酐基為1當量。 Except having changed the use amount of 1,3-bis (2- (4-aminophenyl) -2-propyl) benzene to 17.23 weight part, it carried out similarly to the synthesis example 6, and obtained the fluorene which has a phenolic hydroxyl group Imine oligomer M (92% imidization). The amount of 3-aminophenol used is 1 equivalent with respect to the anhydride group of the amido oligomer (A) to be reacted.
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物M以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物M其具有酯鍵之醯亞胺寡聚物之含有比例為8.1%。進而,醯亞胺寡聚物M之數量平均分子量為1241。 Furthermore, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer M has the fluorene imine oligomer represented by the above formula (1-2) as a main component. In addition, by GPC fractionation and FT-IR analysis, it was confirmed that the content ratio of fluorene imine oligomer M having an ester bond to fluorene imine oligomer M was 8.1%. The number average molecular weight of the fluoreneimine oligomer M was 1241.
(合成例14(醯亞胺寡聚物N之製作)) (Synthesis example 14 (production of fluorene imine oligomer N))
將3-胺基苯酚之使用量變更為21.83重量份(相對於進行反應之醯胺酸寡聚物(A)之酸酐基為1當量),除此以外,與合成例9同樣地獲得具有酚性羥基之醯亞胺寡聚物N(醯亞胺化率94%)。 The used amount of 3-aminophenol was changed to 21.83 parts by weight (1 equivalent with respect to the acid anhydride group of the amido oligomer (A) to be reacted), except that the same as in Synthesis Example 9 was obtained. The fluorene imine oligomer N (94%).
再者,藉由1H-NMR、GPC、及FT-IR分析,確認到醯亞胺寡聚物N以上述式(1-2)所表示之醯亞胺寡聚物作為主成分。又,藉由GPC分取、FT-IR分析,確認到醯亞胺寡聚物N其具有酯鍵之醯亞胺寡聚物之含有比例為8.4%。進 而,醯亞胺寡聚物N之數量平均分子量為1571。 In addition, by 1 H-NMR, GPC, and FT-IR analysis, it was confirmed that the fluorene imine oligomer N contains the fluorene imine oligomer represented by the above formula (1-2) as a main component. In addition, GPC fractionation and FT-IR analysis confirmed that the content ratio of the fluorene imine oligomer N having an ester bond to the fluorene imine oligomer N was 8.4%. The number-average molecular weight of the fluoreneimine oligomer N was 1,571.
(實施例1~9、比較例1~5) (Examples 1 to 9, Comparative Examples 1 to 5)
按照表1、2所記載之摻合比,將各材料進行攪拌混合,而製作實施例1~9、比較例1~5之各接著劑。 Each material was stirred and mixed according to the blending ratios described in Tables 1 and 2 to prepare each of the adhesives of Examples 1 to 9 and Comparative Examples 1 to 5.
<評估> <Evaluation>
對實施例及比較例中所獲得之各接著劑進行以下之評估。將結果示於表1、2。 Each adhesive obtained in the examples and comparative examples was evaluated as follows. The results are shown in Tables 1 and 2.
(5%重量減少溫度) (5% weight reduction temperature)
藉由將實施例及比較例中所獲得之各接著劑塗佈於脫模膜上並使其乾燥,而獲得25μm厚之接著膜。 Each of the adhesives obtained in the examples and comparative examples was coated on a release film and dried to obtain a 25 μm-thick adhesive film.
對於藉由將所獲得之接著膜於190℃加熱1小時而使其硬化所得之接著膜,使用熱重量測定裝置(SII NanoTechnology公司製造之「EXTEAR TG/DTA6200」),於40℃~450℃之溫度範圍、10℃/min之升溫條件測定5%重量減少溫度。 The adhesive film obtained by curing the obtained adhesive film by heating it at 190 ° C for 1 hour uses a thermogravimetry device ("EXTEAR TG / DTA6200" manufactured by SII NanoTechnology) at a temperature of 40 ° C to 450 ° C. 5% weight reduction temperature was measured at a temperature range and a heating condition of 10 ° C / min.
(長期耐熱性(接著力)) (Long-term heat resistance (adhesion))
於實施例及比較例中所獲得之各接著劑之兩面積層50μm厚之Kapton(註冊商標),藉由在190℃加熱1小時而使其硬化、接著之後,切出1cm寬度之短條狀而獲得試片。對於所獲得之試片,於175℃進行熱處理1000小時。對於熱處理後之試片,使用拉伸試驗機(ORIENTEC公司製造之「UCT-500」),於剝離速度20mm/min之條件測定接著力。 Kapton (registered trademark) having a thickness of 50 μm in the two-area layer of each of the adhesives obtained in the examples and comparative examples was cured by heating at 190 ° C. for 1 hour. Then, a short strip having a width of 1 cm was cut out. Get test strips. The obtained test piece was heat-treated at 175 ° C for 1000 hours. For the test piece after the heat treatment, a tensile tester ("UCT-500" manufactured by ORIENTEC Corporation) was used, and the adhesion was measured at a peeling speed of 20 mm / min.
將接著力為3.4N/cm以上之情形設為「○」,將未達3.4N/cm且為2.4N/cm以上之情形設為「△」,將未達2.4N/cm之情形設為「×」而評估長期耐熱性。 A case where the adhesion force is 3.4 N / cm or more is set to "○", a case where it is less than 3.4 N / cm and is 2.4 N / cm or more is set to "△", and a case where the adhesion force is less than 2.4 N / cm is set to "×" to evaluate long-term heat resistance.
根據本發明,可提供一種可用於長期耐熱性優異之硬化物之醯亞胺寡聚物。又,根據本發明,可提供一種由該醯亞胺寡聚物所構成之硬化劑、及使用該硬化劑而成之接著劑。進而,根據本發明,可提供一種該醯亞胺寡聚物之製造方法。 According to the present invention, it is possible to provide a fluorene imine oligomer that can be used for a hardened product having excellent long-term heat resistance. Moreover, according to this invention, the hardening | curing agent which consists of this fluorene imine oligomer, and the adhesive agent using this hardening | curing agent can be provided. Furthermore, according to this invention, the manufacturing method of this fluorene imine oligomer can be provided.
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| JPWO2022138407A1 (en) * | 2020-12-23 | 2022-06-30 | ||
| JP2023118158A (en) * | 2022-02-15 | 2023-08-25 | 日鉄ケミカル&マテリアル株式会社 | Dihydroxy resin, epoxy resin, production method thereof, epoxy resin composition and cured product |
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| JP2883670B2 (en) * | 1990-03-23 | 1999-04-19 | 三井化学株式会社 | Novel bisphenol having imide ring and method for producing the same |
| JP4120780B2 (en) * | 2002-07-19 | 2008-07-16 | 信越化学工業株式会社 | Method for producing polyimide resin having phenolic hydroxyl group |
| WO2005100433A1 (en) | 2004-04-19 | 2005-10-27 | Kaneka Corporation | Thermosetting resin composition, laminated body using it, and circuit board |
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| JP5304105B2 (en) * | 2008-08-28 | 2013-10-02 | 三菱化学株式会社 | Bisimide phenol compound and method for producing the same |
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| JP5672073B2 (en) * | 2010-03-08 | 2015-02-18 | 三菱化学株式会社 | Curing agent for epoxy resin, curable resin composition, and cured product thereof |
| JP2016020437A (en) | 2014-07-14 | 2016-02-04 | 住友電気工業株式会社 | Adhesive composition for printed wiring board, bonding film for printed wiring board, coverlay for printed wiring board, copper-clad laminate, and printed wiring board |
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