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TW201842106A - Adhesive sheet - Google Patents

Adhesive sheet Download PDF

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Publication number
TW201842106A
TW201842106A TW107111492A TW107111492A TW201842106A TW 201842106 A TW201842106 A TW 201842106A TW 107111492 A TW107111492 A TW 107111492A TW 107111492 A TW107111492 A TW 107111492A TW 201842106 A TW201842106 A TW 201842106A
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TW
Taiwan
Prior art keywords
adhesive
adhesive layer
adhesive sheet
pressure
peeling
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Application number
TW107111492A
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Chinese (zh)
Inventor
上村和恵
Original Assignee
日商琳得科股份有限公司
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Publication of TW201842106A publication Critical patent/TW201842106A/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • H10P72/70

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesive Tapes (AREA)

Abstract

一種黏著片的剝離方法,是將至少具備黏著劑層2之黏著片1、與被黏貼在黏著劑層2的黏著面P之被黏著物W、W’剝離之黏著片1的剝離方法,其特徵在於:黏著劑層2在黏著面P具有凹部3,被黏著物W、W’是以藉由黏著劑層2的凹部3而產生獨立的空間C的方式被黏貼在黏著片1,藉由對至少黏貼有被黏著物W、W’之黏著片1進行使空間C中的氣體膨脹之減壓處理,來使黏著劑層2黏著力降低而將黏著片1與被黏著物W、W’剝離。使用此種方法時,能夠藉由新穎的作用機制而在所需要的時序使黏著力降低。A method for peeling off an adhesive sheet is a method of peeling off an adhesive sheet 1 having at least an adhesive layer 2 and an adhesive sheet 1 which is adhered to an adhesive surface W and W' adhered to an adhesive surface 2 of an adhesive layer 2, The adhesive layer 2 has a concave portion 3 on the adhesive surface P, and the adherends W and W' are adhered to the adhesive sheet 1 in such a manner that a separate space C is formed by the concave portion 3 of the adhesive layer 2. The pressure-sensitive adhesive sheet 1 to which at least the adherends W and W' are adhered is subjected to a pressure reduction treatment for expanding the gas in the space C, so that the adhesion of the adhesive layer 2 is lowered to bond the adhesive sheet 1 and the adherends W and W'. Stripped. When using this method, the adhesion can be reduced at the required timing by a novel mechanism of action.

Description

黏著片Adhesive film

本發明,是有關於一種能夠在所需要的時序使黏著力降低且被黏著物變成容易剝離之黏著片。The present invention relates to an adhesive sheet which is capable of lowering the adhesive force at a desired timing and which is easily peeled off by the adherend.

在半導體晶片、顯示裝置等的製造步驟,有使用黏著片用以將半導體晶圓等的電子構件、顯示裝置構成構件(電子構件‧光學構件)之加工對象暫時固定之情形。此種黏著片,使用施加能量等的方法而能夠在所需要的時序使黏著片的黏著力降低,藉此,加工對象(被黏著物)變成容易剝離。在前述的製造步驟,例如在將電子構件、光學構件等的被黏著物固定在黏著片之狀態下施行所需要的加工步驟。In the manufacturing steps of a semiconductor wafer, a display device, or the like, an adhesive sheet is used to temporarily fix an electronic component such as a semiconductor wafer or a display device constituent member (electronic member/optical member). Such an adhesive sheet can reduce the adhesive force of the adhesive sheet at a desired timing by applying energy or the like, whereby the object to be processed (adhered matter) becomes easily peeled off. In the above-described manufacturing steps, for example, a desired processing step is performed in a state where an adherend of an electronic member, an optical member, or the like is fixed to the adhesive sheet.

作為使此種黏著片的黏著力降低方法,有提案揭示下列方法:使用活性能量線硬化型黏著劑形成黏著劑層,藉由照射活性能量線使黏著劑層硬化且使黏著力降低之方法(例如參照專利文獻1);及使黏著劑層含有熱膨脹性粒子,藉由加熱使熱膨脹性粒子膨脹且使黏著劑層的黏著力降低之方法(例如參照專利文獻2)等。 先前技術文獻 專利文獻As a method for lowering the adhesive force of such an adhesive sheet, there has been proposed a method of forming an adhesive layer using an active energy ray-curable adhesive, and hardening the adhesive layer by irradiating an active energy ray to lower the adhesive force ( For example, Patent Document 1); and a method in which the adhesive layer contains heat-expandable particles, and the heat-expandable particles are expanded by heating to lower the adhesive strength of the adhesive layer (see, for example, Patent Document 2). Prior Technical Literature Patent Literature

[專利文獻1] 日本特開平8-188757號公報 [專利文獻2] 日本特開2000-248240號公報[Patent Document 1] Japanese Laid-Open Patent Publication No. Hei No. 8-188757 (Patent Document 2) Japanese Laid-Open Patent Publication No. 2000-248240

發明欲解決之課題Problem to be solved by the invention

本發明之目的,是提供一種藉由新穎的作用機制而能夠在所需要的時序使黏著力降低之黏著片與被黏著物的剝離方法。 用以解決課題之手段SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for peeling off an adhesive sheet and an adherend which can reduce adhesion at a desired timing by a novel mechanism of action. Means to solve the problem

本發明第1是提供一種黏著片的剝離方法,其將至少具備黏著劑層之黏著片、與被黏貼在前述黏著劑層的黏著面之被黏著物剝離之黏著片的剝離方法,其特徵在於:前述黏著劑層在前述黏著面具有凹部,前述被黏著物是以藉由前述黏著劑層的前述凹部而產生獨立的空間的方式被黏貼在前述黏著片,藉由對至少黏貼有前述被黏著物之前述黏著片進行使前述空間中的氣體膨脹之減壓處理,來使前述黏著劑層黏著力降低而將前述黏著片與前述被黏著物剝離(發明1)。According to a first aspect of the present invention, there is provided a method for peeling an adhesive sheet, wherein a method of peeling an adhesive sheet having at least an adhesive layer and an adhesive sheet which is adhered to an adhesive surface adhered to an adhesive surface of the adhesive layer is characterized in that The adhesive layer has a concave portion on the adhesive surface, and the adhesive is adhered to the adhesive sheet so as to form an independent space by the concave portion of the adhesive layer, and is adhered to at least the adhesive layer. The pressure-sensitive adhesive sheet of the object is subjected to a pressure reduction treatment for expanding the gas in the space to reduce the adhesion of the pressure-sensitive adhesive layer, thereby peeling off the pressure-sensitive adhesive sheet from the adherend (Invention 1).

又,在本發明之「片」設為亦包含「帶」的概念。Moreover, the "slice" of the present invention is also intended to include the concept of "tape".

使用本發明之黏著片與被黏著物的剝離方法時,藉由利用減壓處理而使前述空間內的氣體膨脹之新穎的作用機制,能夠在所需要的時序使黏著力降低且使黏著片與被黏著物的剝離成為容易。When the adhesive sheet and the method for peeling the adherend of the present invention are used, the novel action mechanism for expanding the gas in the space by the pressure reduction treatment can lower the adhesive force at the required timing and make the adhesive sheet and the adhesive sheet Peeling of the adherend becomes easy.

在上述發明(發明1),其中前述減壓處理是以比將前述黏著片貼附在前述被黏著物後之環境的環境壓力更低為佳(發明2)。In the above invention (Invention 1), the pressure reduction treatment is preferably performed at a lower environmental pressure than in an environment in which the adhesive sheet is attached to the adherend (Invention 2).

在上述發明(發明1、2),其中形成前述黏著劑層之黏著劑組成物,亦可為不具有活性能量線硬化性及熱硬化性之物(發明3),在此種發明(發明3),其中前述黏著劑組成物以含有(甲基)丙烯酸酯聚合物為佳(發明4)。In the above invention (Inventions 1 and 2), the adhesive composition for forming the pressure-sensitive adhesive layer may be one which does not have active energy ray hardenability and thermosetting property (Invention 3), and the invention (Invention 3) Wherein the aforementioned adhesive composition is preferably a (meth) acrylate polymer (Invention 4).

在上述發明(發明1、2),其中形成前述黏著劑層之黏著劑組成物亦可具有活性能量線硬化性或熱硬化性(發明5),在此種發明(發明5),其中前述活性能量線硬化性黏著劑組成物以含有在側鏈具有活性能量線硬化性基之(甲基)丙烯酸酯聚合物為佳(發明6)。In the above invention (Inventions 1 and 2), the adhesive composition forming the above-mentioned adhesive layer may have active energy ray hardening property or thermosetting property (Invention 5), wherein the aforementioned activity (Invention 5) The energy ray-curable adhesive composition preferably contains a (meth) acrylate polymer having an active energy ray-curable group in a side chain (Invention 6).

上述發明(發明5、6),其中對前述黏著劑層照射能量線而使前述黏著劑層硬化後,亦可進行前述減壓處理(發明7),或,進行前述減壓處理後,亦可對前述黏著劑層照射能量線使前述黏著劑層硬化(發明8)。In the above invention (Inventions 5 and 6), after the adhesive layer is irradiated with an energy ray to cure the adhesive layer, the pressure reduction treatment may be performed (Invention 7), or after the pressure reduction treatment, The above adhesive layer is irradiated with an energy ray to harden the aforementioned adhesive layer (Invention 8).

在上述發明(發明1~8),其中前述黏著片以被使用在前述被黏著物的暫時固定為佳(發明9),在此種發明(發明9),其中前述被黏著物亦可為電子構件或光學構件(發明10)。In the above invention (Inventions 1 to 8), it is preferable that the adhesive sheet is temporarily fixed to the above-mentioned adherend (Invention 9), and in the invention (Invention 9), the above-mentioned adherend may be an electron. Member or optical member (Invention 10).

本發明第2提供一種加工物的製造方法,是將工件進行加工而得到加工物的製造方法,其特徵在於具備下列步驟: 將工件、與至少具備黏著劑層且在前述黏著劑層的黏著面具有凹部之黏著片,以前述黏著面的前述凹部與前述工件產生獨立的空間之方式黏貼之黏貼步驟;將被黏貼在前述黏著片之前述工件進行加工成為加工物之加工步驟;及藉由進行將至少黏貼有前述加工物之前述黏著片放置在減壓環境使前述空間中的氣體膨脹之減壓處理,而使前述黏著劑層的黏著力降低且將前述加工物與前述黏著片剝離之剝離步驟(發明11)。 發明效果According to a second aspect of the present invention, there is provided a method of producing a workpiece, wherein the workpiece is processed to obtain a processed product, the method comprising the steps of: providing a workpiece and an adhesive surface having at least an adhesive layer on the adhesive layer; An adhesive sheet having a concave portion, a pasting step of adhering the concave portion of the adhesive surface to the workpiece to form a separate space; a processing step of processing the workpiece adhered to the adhesive sheet into a processed object; and performing The pressure-sensitive adhesive sheet having at least the above-mentioned processed material is placed in a reduced pressure environment to expand the gas in the space, and the adhesive force of the adhesive layer is lowered, and the processed product is peeled off from the adhesive sheet. Step (Invention 11). Effect of the invention

使用本發明之黏著片與被黏著物的剝離方法時,能夠藉由新穎的作用機制在所需要的時序使黏著力降低,且能夠使黏著片與被黏著物的剝離成為容易。When the adhesive sheet of the present invention and the method of peeling the adherend are used, the adhesive force can be lowered at a desired timing by a novel action mechanism, and peeling of the adhesive sheet and the adherend can be facilitated.

用以實施發明之形態Form for implementing the invention

以下,說明本發明的實施形態。 本實施形態之黏著片的剝離方法,是將至少具備黏著劑層之黏著片、與被黏貼在前述黏著劑層的黏著面之被黏著物剝離之方法。 此種黏著劑層在黏著面具有凹部,且被黏著物與黏著片是以藉由黏著劑層的凹部而產生獨立的空間的方式互相黏貼。在本實施形態,對至少黏貼有被黏著物之黏著片,進行使由凹部與被黏著物所產生的空間中的氣體膨脹之減壓處理,藉此而使黏著劑層的黏著力降低且使黏著片與被黏著物的剝離成為容易。Hereinafter, embodiments of the present invention will be described. The method of peeling the adhesive sheet of the present embodiment is a method of peeling off the adhesive sheet having at least the adhesive layer and the adherend adhered to the adhesive surface of the adhesive layer. The adhesive layer has a concave portion on the adhesive surface, and the adhesive and the adhesive sheet are adhered to each other in such a manner as to create a separate space by the concave portion of the adhesive layer. In the present embodiment, the adhesive sheet in which the adherend is adhered at least is subjected to a pressure reduction treatment for expanding the gas in the space generated by the concave portion and the adherend, whereby the adhesive force of the adhesive layer is lowered and the adhesive force is lowered. It is easy to peel off the adhesive sheet and the adherend.

[黏著片] 第1圖是本發明的一實施形態所使用的黏著片之剖面圖。本實施形態之黏著片1是具備黏著劑層2而構成,黏著劑層2在黏著面P,即與被黏著物接觸之面(在第1圖之上側的面)具有凹部3。又,本實施形態之黏著片1亦可在黏著劑層之與黏著面P為相反側的面(在第1圖之下側的面)進一步具備基材4。本實施形態之黏著片1,例如能夠使用於將電子構件、光學構件等暫時固定。以下,以被使用於將半導體晶圓暫時固定之情況作為中心而進行說明。[Adhesive sheet] Fig. 1 is a cross-sectional view showing an adhesive sheet used in an embodiment of the present invention. The adhesive sheet 1 of the present embodiment is configured to include the adhesive layer 2, and the adhesive layer 2 has a concave portion 3 on the adhesive surface P, that is, the surface (the surface on the upper side in the first drawing) that is in contact with the adherend. Further, the adhesive sheet 1 of the present embodiment may further include a substrate 4 on a surface (the surface on the lower side in the first drawing) of the adhesive layer opposite to the adhesive surface P. The adhesive sheet 1 of the present embodiment can be used, for example, to temporarily fix an electronic component, an optical member, or the like. Hereinafter, a description will be given focusing on a case where the semiconductor wafer is temporarily fixed.

(1)黏著劑層 黏著劑層可為由不具有活性能量線硬化性及熱硬化性(以下,在本說明書有稱為「非硬化性」之情形)的黏著劑組成物所形成之黏著劑層,亦可為由具有活性能量線硬化性或熱硬化性黏著劑組成物所形成之黏著劑層。又,黏著劑層由多層所構成時,亦可為將非硬化性黏著劑層與硬化性黏著劑層組合而成之物。(1) Adhesive layer The adhesive layer may be an adhesive formed of an adhesive composition which does not have active energy ray hardenability and thermosetting property (hereinafter, referred to as "non-hardening property" in the present specification). The layer may also be an adhesive layer formed of an active energy ray-curable or thermosetting adhesive composition. Further, when the pressure-sensitive adhesive layer is composed of a plurality of layers, it may be a combination of a non-curable pressure-sensitive adhesive layer and a curable pressure-sensitive adhesive layer.

(1-1)非硬化性黏著劑組成物 作為非硬化性黏著劑組成物,例如可舉出丙烯酸系黏著劑組成物、橡膠系黏著劑組成物、聚矽氧系黏著劑組成物、胺甲酸乙酯系黏著劑組成物、聚酯系黏著劑組成物、聚乙烯基醚系黏著劑組成物等,尤其是以丙烯酸系黏著劑組成物為佳。作為丙烯酸系黏著劑組成物,能夠使用先前習知之含有(甲基)丙烯酸酯聚合物之物。 又,在本說明書之「聚合物」,是設為亦包含「共聚物」的概念之物。(1-1) Non-curable adhesive composition As the non-curable adhesive composition, for example, an acrylic adhesive composition, a rubber-based adhesive composition, a polyoxygen-based adhesive composition, and a uric acid The ethyl ester-based pressure-sensitive adhesive composition, the polyester-based pressure-sensitive adhesive composition, the polyvinyl ether-based pressure-sensitive adhesive composition, and the like are particularly preferably an acrylic pressure-sensitive adhesive composition. As the acrylic pressure-sensitive adhesive composition, a conventionally known (meth) acrylate polymer-containing material can be used. Moreover, the "polymer" in the present specification is a concept that also includes the concept of "copolymer".

在丙烯酸系黏著劑組成物所含有的(甲基)丙烯酸酯聚合物(A),可為由1種類的(甲基)丙烯酸酯單體所形成的同元聚合物,亦可為為由複數種類的(甲基)丙烯酸酯單體所形成之共聚物,亦可為由1種類或複數種類的(甲基)丙烯酸酯單體與(甲基)丙烯酸酯單體以外的單體所形成之共聚物。又,(甲基)丙烯酸酯聚合物(A)可1種單獨使用,亦可組合2種以上而使用。(甲基)丙烯酸酯單體的化合物之具體的種類沒有特別限定,可舉出(甲基)丙烯酸、(甲基)丙烯酸酯、其衍生物(丙烯腈、伊康酸等)作為具體例。針對(甲基)丙烯酸酯,進一步揭示具體例時,可舉出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯等具有鏈狀骨架之(甲基)丙烯酸酯;(甲基)丙烯酸環己酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸醯亞胺酯、(甲基)丙烯醯基嗎啉等具有環狀骨架之(甲基)丙烯酸酯;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸4-羥基丁酯等具有羥基之(甲基)丙烯酸酯;環氧丙基(甲基)丙烯酸酯、(甲基)丙烯酸N-甲基胺基乙酯等具有羥基以外的反應性官能基之(甲基)丙烯酸酯。又,作為(甲基)丙烯酸酯單體以外的單體,可例示乙烯、降莰烯等的烯烴、乙酸乙烯酯、苯乙烯等。又,(甲基)丙烯酸酯單體為(甲基)丙烯酸烷酯時,其烷基的碳數以1~18的範圍為佳。又,在本說明書,所謂(甲基)丙烯酸,意味著丙烯酸及甲基丙烯酸之雙方。其它類似用語亦同樣。The (meth) acrylate polymer (A) contained in the acrylic pressure-sensitive adhesive composition may be a homopolymer formed of one type of (meth) acrylate monomer, or may be plural The copolymer formed of the (meth) acrylate monomer may be formed of a monomer other than the (meth) acrylate monomer and the (meth) acrylate monomer of one type or plural types. Copolymer. Further, the (meth) acrylate polymer (A) may be used alone or in combination of two or more. The specific type of the compound of the (meth) acrylate monomer is not particularly limited, and specific examples thereof include (meth)acrylic acid, (meth) acrylate, and derivatives thereof (acrylonitrile, itaconic acid, and the like). Further, when specific examples are disclosed for (meth) acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and butyl (meth)acrylate may be mentioned. (meth) acrylate having a chain skeleton such as 2-ethylhexyl methacrylate; cyclohexyl (meth) acrylate, benzyl (meth) acrylate, isodecyl (meth) acrylate, ( a (meth) acrylate having a cyclic skeleton such as dicyclopentanyl (meth) acrylate, yttrium imide (meth) acrylate or (meth) acryl hydrazino morpholine; 2-hydroxy ethane (meth) acrylate (meth) acrylate having a hydroxyl group such as ester, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate; epoxy propyl ( (Meth) acrylate having a reactive functional group other than a hydroxyl group such as methyl acrylate or N-methylaminoethyl (meth) acrylate. In addition, examples of the monomer other than the (meth) acrylate monomer include an olefin such as ethylene or norbornene, vinyl acetate, and styrene. Further, when the (meth) acrylate monomer is an alkyl (meth) acrylate, the alkyl group preferably has a carbon number of from 1 to 18. Further, in the present specification, the term "(meth)acrylic acid" means both of acrylic acid and methacrylic acid. The same is true for other similar terms.

形成本實施形態之黏著劑層之黏著劑組成物含有後述的交聯劑時,(甲基)丙烯酸酯聚合物(A)可直接含有黏著劑組成物,或,亦可至少其一部分與交聯劑進行交聯反應之後,以交聯物的方式被包含。此時,(甲基)丙烯酸酯聚合物(A)以具有與交聯劑反應之反應性官能基為佳。反應性官能基的種類沒有特別限定,基於交聯劑種類等而適當地決定即可。When the adhesive composition forming the pressure-sensitive adhesive layer of the present embodiment contains a crosslinking agent to be described later, the (meth) acrylate polymer (A) may directly contain an adhesive composition, or at least a part thereof may be crosslinked. After the crosslinking reaction is carried out, the agent is contained as a crosslinked product. At this time, the (meth) acrylate polymer (A) is preferably a reactive functional group having a reaction with a crosslinking agent. The type of the reactive functional group is not particularly limited, and may be appropriately determined depending on the type of the crosslinking agent or the like.

例如,交聯劑為聚異氰酸酯化合物時,作為(甲基)丙烯酸酯聚合物(A)所具有的反應性官能基,可例示羥基、羧基、胺基等,尤其是以與異氰酸酯基的反應性較高的羥基為佳。又,交聯劑為環氧系化合物時,作為(甲基)丙烯酸酯聚合物(A)所具有的反應性官能基,可例示羧基、胺基、醯胺基等,尤其是以與環氧基的反應性較高的羧基為佳。For example, when the crosslinking agent is a polyisocyanate compound, the reactive functional group of the (meth) acrylate polymer (A) may, for example, be a hydroxyl group, a carboxyl group, an amine group or the like, and particularly a reactivity with an isocyanate group. Higher hydroxyl groups are preferred. When the crosslinking agent is an epoxy compound, the reactive functional group of the (meth) acrylate polymer (A) may, for example, be a carboxyl group, an amine group or a guanamine group, and particularly an epoxy group. The carboxyl group having a higher reactivity is preferred.

將反應性官能基導入至(甲基)丙烯酸酯聚合物(A)之方法沒有特別限定,作為一個例子,可舉出使用具有反應性官能基之單體而形成(甲基)丙烯酸酯聚合物(A),使基於具有反應性官能基的單體的結構單元包含於聚合物的骨架之方法。例如,將羧基導入至(甲基)丙烯酸酯聚合物(A)時,使用(甲基)丙烯酸等具有羧基的單體,形成(甲基)丙烯酸酯聚合物(A)即可。The method of introducing the reactive functional group into the (meth) acrylate polymer (A) is not particularly limited, and as an example, a (meth) acrylate polymer is formed by using a monomer having a reactive functional group. (A) A method of including a structural unit of a monomer having a reactive functional group in a skeleton of a polymer. For example, when a carboxyl group is introduced into the (meth) acrylate polymer (A), a monomer having a carboxyl group such as (meth)acrylic acid may be used to form the (meth) acrylate polymer (A).

(甲基)丙烯酸酯聚合物(A)為具有反應性官能基時,從使交聯程度成為良好的範圍之觀點而言,源自具有反應性官能基之單體的構造部分的質量佔(甲基)丙烯酸酯聚合物(A)全體質量之比率,以1~20質量%左右為佳,以2~10質量%為較佳。When the (meth) acrylate polymer (A) has a reactive functional group, the mass of the structural portion derived from the monomer having a reactive functional group is from the viewpoint of a good degree of crosslinking. The ratio of the total mass of the methyl acrylate polymer (A) is preferably from 1 to 20% by mass, preferably from 2 to 10% by mass.

從塗布時的造膜性之觀點而言,(甲基)丙烯酸酯聚合物(A)的重量平均分子量(Mw)以1萬~200萬為佳,以10萬~150萬為較佳。又,在本說明書,(甲基)丙烯酸酯聚合物(A)以及後述之(甲基)丙烯酸酯聚合物(B1)及(B3)的重量平均分子量,是使用凝膠滲透層析法(GPC)法所測定的標準聚苯乙烯換算之值,測定方法的詳細揭示在後述的實施例。又,(甲基)丙烯酸酯聚合物(A)的玻璃轉移溫度Tg較佳為-70℃~30℃、更佳為-60℃~20℃的範圍。玻璃轉移溫度能夠依照Fox式而計算。The weight average molecular weight (Mw) of the (meth) acrylate polymer (A) is preferably from 10,000 to 2,000,000, and preferably from 100,000 to 1,500,000, from the viewpoint of film forming properties at the time of coating. Further, in the present specification, the weight average molecular weight of the (meth) acrylate polymer (A) and the (meth) acrylate polymers (B1) and (B3) described later is gel permeation chromatography (GPC). The value of the standard polystyrene conversion measured by the method, the details of the measurement method are disclosed in the examples described later. Further, the glass transition temperature Tg of the (meth) acrylate polymer (A) is preferably in the range of -70 ° C to 30 ° C, more preferably -60 ° C to 20 ° C. The glass transition temperature can be calculated according to the Fox equation.

(1-2)活性能量線硬化性黏著劑組成物 活性能量線硬化性黏著劑組成物,以含有活性能量線硬化性化合物(B2)、及在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)之中至少任一方為佳。在此,活性能量線硬化性黏著劑組成物可含有活性能量線硬化性化合物(B2)、及在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)之中任一方,以含有雙方為佳。在該等情況,活性能量線硬化性黏著劑組成物亦可進一步含有不具有活性能量線硬化性之(甲基)丙烯酸酯聚合物(B1)。(1-2) Active energy ray-curable adhesive composition Active energy ray-curable adhesive composition containing an active energy ray-curable compound (B2) and an active energy ray-curable group introduced into a side chain ( At least one of the methyl acrylate polymers (B3) is preferred. Here, the active energy ray-curable adhesive composition may contain an active energy ray-curable compound (B2) and a (meth) acrylate polymer (B3) having an active energy ray-curable group introduced into its side chain. It is better to have either side to contain either side. In such a case, the active energy ray-curable adhesive composition may further contain a (meth) acrylate polymer (B1) having no active energy ray curability.

(1-2-1)不具有活性能量線硬化性之(甲基)丙烯酸酯聚合物(B1) 形成本實施形態之黏著劑層之黏著劑組成物為含有不具有活性能量線硬化性的(甲基)丙烯酸酯聚合物(B1)時,該(甲基)丙烯酸酯聚合物(B1),可直接被含有在黏著劑組成物,亦可至少其一部分與後述的交聯劑進行交聯反應而以交聯物的方式被包含。作為(甲基)丙烯酸酯聚合物(B1),亦能夠使用與關於非硬化性黏著劑組成物之前述的(甲基)丙烯酸酯聚合物(A)之相同物。(1-2-1) (meth)acrylate polymer (B1) having no active energy ray-curable property The adhesive composition forming the adhesive layer of the present embodiment contains no active energy ray hardenability ( In the case of the methyl acrylate polymer (B1), the (meth) acrylate polymer (B1) may be directly contained in the adhesive composition, or at least a part thereof may be crosslinked with a crosslinking agent described later. It is included as a cross-linking substance. As the (meth) acrylate polymer (B1), the same as the above-mentioned (meth) acrylate polymer (A) for the non-curable adhesive composition can also be used.

(1-2-2)活性能量線硬化性化合物(B2) 活性能量線硬化性化合物(B2)具有活性能量線硬化性基,且受到紫外線、電子射線等活性能量線的照射時進行聚合之化合物。活性能量線硬化性化合物(B2)所具有的活性能量線硬化性基,例如含有活性能量線硬化性碳-碳雙鍵之基,具體而言,能夠例示(甲基)丙烯醯基、乙烯基等。(1-2-2) Active energy ray-curable compound (B2) The active energy ray-curable compound (B2) has an active energy ray-curable group and is polymerized when it is irradiated with an active energy ray such as ultraviolet rays or electron beams. . The active energy ray-curable group of the active energy ray-curable compound (B2), for example, a group containing an active energy ray-curable carbon-carbon double bond, and specifically, a (meth) acrylonitrile group or a vinyl group can be exemplified. Wait.

作為活性能量線硬化性化合物(B2)的例子,只要具有上述活性能量線硬化性基,就沒有特別限定,從泛用性的觀點而言,以低分子量化合物(單官能、多官能的單體及寡聚物)為佳。作為低分子量的活性能量線硬化性化合物(B2)之具體例,可舉出三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、二新戊四醇一羥基五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯或1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、二環戊二烯二甲氧基二(甲基)丙烯酸酯、(甲基)丙烯酸異莰酯等含環狀脂肪族骨架的(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、(甲基)丙烯酸寡酯、胺甲酸乙酯(甲基)丙烯酸酯寡聚物、環氧改性(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯等的丙烯酸酯系化合物,該等能夠單獨1種或組合2種以上而使用。The active energy ray-curable compound (B2) is not particularly limited as long as it has the above-mentioned active energy ray-curable group, and a low molecular weight compound (monofunctional or polyfunctional monomer) is used from the viewpoint of general versatility. And oligomers) are preferred. Specific examples of the low molecular weight active energy ray-curable compound (B2) include trimethylolpropane tri(meth)acrylate, tetramethylol methane tetra(meth)acrylate, and neopentyl alcohol. Tris(meth)acrylate, dipentaerythritol monohydroxypenta(meth)acrylate, dipentaerythritol hexa(meth)acrylate or 1,4-butanediol di(meth)acrylate a cyclic aliphatic skeleton such as 1,6-hexanediol di(meth)acrylate, dicyclopentadienyldimethoxydi(meth)acrylate or isodecyl (meth)acrylate ( Methyl) acrylate, polyethylene glycol di(meth) acrylate, (meth) acrylate oligo, urethane (meth) acrylate oligomer, epoxy modified (meth) acrylate An acrylate type compound, such as a polyether (meth) acrylate, can be used individually by 1 type or in combination of 2 or more types.

活性能量線硬化性化合物(B2)是通常分子量為100~30000,較佳為300~10000左右。The active energy ray-curable compound (B2) usually has a molecular weight of from 100 to 30,000, preferably from about 300 to 10,000.

活性能量線硬化性黏著劑組成物之活性能量線硬化性化合物(B2)的含量與其它成分之含量比,沒有特別限制,活性能量線硬化性黏著劑組成物含有活性能量線硬化性化合物(B2)及不具有活性能量線硬化性之(甲基)丙烯酸酯聚合物(B1)時,相對於上述(甲基)丙烯酸酯聚合物(B1)100質量份,活性能量線硬化性化合物(B2)能夠以較佳為10~400質量份、更佳為30~350質量份左右的比率使用。又,含有活性能量線硬化性化合物(B2)、及後述之在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)時,相對於該(甲基)丙烯酸酯聚合物(B3)100質量份,活性能量線硬化性化合物(B2)的含量以上述範圍為佳。進而,活性能量線硬化性黏著劑組成物含有活性能量線硬化性化合物(B2)、上述(甲基)丙烯酸酯聚合物(B1)及在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)時,相對於(甲基)丙烯酸酯聚合物(B1)及(甲基)丙烯酸酯聚合物(B3)的合計量100質量份,活性能量線硬化性化合物(B2)的含量是以在上述範圍為佳。The ratio of the content of the active energy ray-curable compound (B2) of the active energy ray-curable adhesive composition to the content of other components is not particularly limited, and the active energy ray-curable adhesive composition contains an active energy ray-curable compound (B2). And the active energy ray-curable compound (B2) with respect to 100 parts by mass of the (meth) acrylate polymer (B1), in the case of the (meth) acrylate polymer (B1) having no active energy ray curability (B1) It can be used in a ratio of preferably from 10 to 400 parts by mass, more preferably from 30 to 350 parts by mass. Further, when the active energy ray-curable compound (B2) and the (meth) acrylate polymer (B3) having an active energy ray-curable group introduced into the side chain are described later, the (meth) acrylate is added to the (meth) acrylate. The content of the active energy ray-curable compound (B2) in 100 parts by mass of the polymer (B3) is preferably in the above range. Further, the active energy ray-curable adhesive composition contains an active energy ray-curable compound (B2), the above (meth) acrylate polymer (B1), and an active energy ray-curable group (methyl group) introduced into the side chain. In the case of the acrylate polymer (B3), the active energy ray-curable compound (B2) is 100 parts by mass based on the total amount of the (meth) acrylate polymer (B1) and the (meth) acrylate polymer (B3). The content is preferably in the above range.

(1-2-3)在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3) 本實施形態之活性能量線硬化性黏著劑組成物是含有在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)時,此種(甲基)丙烯酸酯聚合物(B3)可直接被含有在黏著劑組成物,亦可至少其一部分與後述的交聯劑進行交聯反應而以交聯物的方式被包含。(1-2-3) (meth)acrylate polymer (B3) in which an active energy ray-curable group is introduced into a side chain. The active energy ray-curable adhesive composition of the present embodiment contains a side chain introduced therein. In the case of the active energy ray-curable group (meth) acrylate polymer (B3), the (meth) acrylate polymer (B3) may be directly contained in the adhesive composition, or at least a part thereof will be described later. The crosslinking agent undergoes a crosslinking reaction and is contained as a crosslinked product.

在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)的主骨架沒有特別限定,可例示與前述(甲基)丙烯酸酯聚合物(B1)之相同物。The main skeleton of the (meth) acrylate polymer (B3) having the active energy ray-curable group introduced into the side chain is not particularly limited, and the same as the above (meth) acrylate polymer (B1) can be exemplified.

被導入至(甲基)丙烯酸酯聚合物(B3)的側鏈之活性能量線硬化性基為例如含有活性能量線硬化性碳-碳雙鍵之基,具體而言,能夠例示(甲基)丙烯醯基等。活性能量線硬化性基亦可透過伸烷基、伸烷氧基、聚伸烷氧基等而鍵結在(甲基)丙烯酸酯聚合物(B3)。The active energy ray-curable group to be introduced into the side chain of the (meth) acrylate polymer (B3) is, for example, a group containing an active energy ray-curable carbon-carbon double bond, and specifically, (meth) can be exemplified. Acryl sulfhydryl and the like. The active energy ray-curable group may also be bonded to the (meth) acrylate polymer (B3) through an alkyl group, an alkoxy group, a polyalkylene group or the like.

在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3),是例如能夠使含有羥基、羧基、胺基、取代胺基、環氧基等官能基的(甲基)丙烯酸酯聚合物、和具有與該官能基進行反應之取代基及每1分子具有1~5個活性能量線硬化性碳-碳雙鍵之含硬化性基的化合物進行反應而得到。此種(甲基)丙烯酸酯聚合物,能夠藉由具有羥基、羧基、胺基、取代胺基、環氧基等官能基之(甲基)丙烯酸酯單體或其衍生物、與構成前述成分(B1)之單體進行共聚合而得到。又,作為上述含硬化性基的化合物,可舉出(甲基)丙烯醯氧基乙基異氰酸酯、間異丙烯基-α,α-二甲基苄基異氰酸酯、(甲基)丙烯醯基異氰酸酯、異氰酸烯丙酯、環氧丙基(甲基)丙烯酸酯、(甲基)丙烯酸等,該等能夠單獨1種或組合2種以上而使用。The (meth) acrylate polymer (B3) having an active energy ray-curable group introduced into the side chain, for example, can have a functional group such as a hydroxyl group, a carboxyl group, an amine group, a substituted amine group or an epoxy group. An acrylate polymer obtained by reacting a compound having a substituent which reacts with the functional group and a curable group having 1 to 5 active energy ray-curable carbon-carbon double bonds per molecule. Such a (meth) acrylate polymer can be composed of a (meth) acrylate monomer having a functional group such as a hydroxyl group, a carboxyl group, an amine group, a substituted amino group or an epoxy group, or a derivative thereof, and a constituent thereof The monomer of (B1) is obtained by copolymerization. Further, examples of the curable group-containing compound include (meth)acryloxyethyl isocyanate, m-isopropenyl-α,α-dimethylbenzyl isocyanate, and (meth)acryl decyl isocyanate. The allyl isocyanate, the epoxy propyl (meth) acrylate, the (meth) acrylic acid, etc. can be used individually by 1 type or in combination of 2 or more types.

又,形成本實施形態之黏著劑層之黏著劑組成物含有後述的交聯劑時,在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3),以具有與交聯劑反應之反應性官能基為佳。反應性官能基的種類沒有特別限定,能夠例示與前述的(甲基)丙烯酸酯聚合物(B1)(及有關非硬化性黏著劑組成物之前述的(甲基)丙烯酸酯聚合物(A))之相同物。In addition, when the adhesive composition of the adhesive layer of the present embodiment contains a crosslinking agent to be described later, the (meth)acrylate polymer (B3) having an active energy ray-curable group is introduced into the side chain to have The reactive functional group for the crosslinking agent reaction is preferred. The type of the reactive functional group is not particularly limited, and the (meth) acrylate polymer (B1) (and the aforementioned (meth) acrylate polymer (A) related to the non-curable adhesive composition can be exemplified. ) the same thing.

在側鏈導入有活性能量線硬化性基之(甲基)丙烯酸酯聚合物(B3)的重量平均分子量(Mw),以10萬~200萬為佳,以30萬~150萬為更佳。The weight average molecular weight (Mw) of the (meth) acrylate polymer (B3) having an active energy ray-curable group introduced into the side chain is preferably from 100,000 to 2,000,000, more preferably from 300,000 to 1,500,000.

又,(甲基)丙烯酸酯聚合物(B3)的玻璃轉移溫度(Tg),是以-70~30℃為佳,較佳為-60~20℃的範圍。又,在本說明書,(甲基)丙烯酸酯聚合物(B3)的玻璃轉移溫度(Tg),是指使其與含硬化性基的化合物反應之前的(甲基)丙烯酸酯聚合物之玻璃轉移溫度(Tg)。Further, the glass transition temperature (Tg) of the (meth) acrylate polymer (B3) is preferably -70 to 30 ° C, preferably -60 to 20 ° C. Further, in the present specification, the glass transition temperature (Tg) of the (meth) acrylate polymer (B3) means the glass transition temperature of the (meth) acrylate polymer before reacting with the curable group-containing compound. (Tg).

(1-3)熱硬化性黏著劑組成物 作為熱硬化型黏著劑組成物,可舉出含有環氧樹脂、酚樹脂等之物。(1-3) Thermosetting Adhesive Composition As the thermosetting adhesive composition, an epoxy resin, a phenol resin or the like can be mentioned.

(1-4)交聯劑 在本實施形態之形成黏著劑層之黏著劑組成物,亦可含有能夠與前述的黏著劑組成物所含有的聚合物反應之交聯劑。此時,在本實施形態之黏著劑層,能夠含有藉由在黏著劑組成物所含有的聚合物((甲基)丙烯酸酯聚合物(A)、(B1)、(B3)等)與交聯劑之交聯反應而得到之交聯物。(1-4) Crosslinking agent The adhesive composition for forming the pressure-sensitive adhesive layer of the present embodiment may contain a crosslinking agent capable of reacting with the polymer contained in the above-mentioned adhesive composition. In this case, the adhesive layer of the present embodiment can contain a polymer ((meth)acrylate polymer (A), (B1), (B3), etc.) contained in the adhesive composition. A cross-linking product obtained by crosslinking of the crosslinking agent.

交聯劑的種類例如可舉出聚異氰酸酯系化合物、環氧系化合物、金屬鉗合物系化合物、吖環丙烷系化合物等的聚亞胺化合物、三聚氰胺樹脂、尿素樹脂、二醛類、羥甲基聚合物、金屬烷氧化物(metal alkoxide)、金屬鹽等,而且能夠單獨1種或組合2種以上而使用。該等之中,基於容易控制交聯反應等之理由,以環氧系化合物或聚異氰酸酯化合物為佳。Examples of the type of the crosslinking agent include a polyisine compound such as a polyisocyanate compound, an epoxy compound, a metal chelating compound, and an anthranilyl compound, a melamine resin, a urea resin, a dialdehyde, and a hydroxyl group. A base polymer, a metal alkoxide, a metal salt, or the like can be used alone or in combination of two or more. Among these, an epoxy compound or a polyisocyanate compound is preferable because it is easy to control a crosslinking reaction or the like.

聚異氰酸酯化合物每1分子具有2個以上的異氰酸酯基之化合物。具體而言,可舉出甲苯二異氰酸酯、二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯等的芳香族聚異氰酸酯、六亞甲基二異氰酸酯等的脂肪族聚異氰酸酯、異佛爾酮二異氰酸酯、氫化二苯基甲烷二異氰酸酯等的脂環式聚異氰酸酯等、及該等的縮二脲體、三聚異氰酸酯體進一步與乙二醇、丙二醇、新戊二醇、三羥甲基丙烷、蓖麻油等含低分子活性氫化合物的反應物之加成物等。The polyisocyanate compound has a compound having two or more isocyanate groups per molecule. Specific examples thereof include aromatic polyisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate and benzodimethyl diisocyanate; aliphatic polyisocyanates such as hexamethylene diisocyanate; and isophorone diisocyanate. An alicyclic polyisocyanate such as hydrogenated diphenylmethane diisocyanate, and the like, and the biuret or trimer isocyanate are further blended with ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane, and hydrazine. An adduct of a reactant containing a low molecular weight active hydrogen compound such as sesame oil or the like.

作為環氧系化合物,例如可舉出1,3-雙(N,N’-二環氧丙基胺甲基)環己烷、N,N,N’,N’-四環氧丙基-間苯二甲二胺、乙二醇二環氧丙基醚、1,6-己二醇二環氧丙基醚、三羥甲基丙烷二環氧丙基醚、二環氧丙基苯胺、二環氧丙基胺等。Examples of the epoxy compound include 1,3-bis(N,N'-diepoxypropylaminomethyl)cyclohexane, N,N,N',N'-tetraepoxypropyl group- M-xylylenediamine, ethylene glycol diepoxypropyl ether, 1,6-hexanediol diepoxypropyl ether, trimethylolpropane diepoxypropyl ether, diepoxypropylaniline, Di-epoxypropylamine and the like.

形成黏著劑層之黏著劑組成物的交聯劑含量,相對於在黏著劑組成物所含有的聚合物(例如(甲基)丙烯酸酯聚合物(A)、(B1)及(B3))的合計量100質量份,以0.01~50質量份為佳,以0.02~10質量份、0.03~5質量份為較佳,以0.05~2質量份為更佳,以0.08~0.5質量份為特佳。The content of the crosslinking agent of the adhesive composition forming the adhesive layer is relative to the polymer contained in the adhesive composition (for example, (meth) acrylate polymers (A), (B1) and (B3)) 100 parts by mass, preferably 0.01 to 50 parts by mass, preferably 0.02 to 10 parts by mass, 0.03 to 5 parts by mass, more preferably 0.05 to 2 parts by mass, and particularly preferably 0.08 to 0.5 parts by mass. .

形成本實施形態之黏著劑層之黏著劑組成物含有交聯劑時,亦可按照其交聯劑的種類等而含有適當的交聯促進劑。When the adhesive composition forming the pressure-sensitive adhesive layer of the present embodiment contains a crosslinking agent, an appropriate crosslinking accelerator may be contained depending on the type of the crosslinking agent or the like.

(1-5)其它成分 在本實施形態之形成黏著劑層之黏著劑組成物,是除了上述成分以外,亦可含有光聚合起始劑、光敏化劑、交聯促進劑、染料、顏料等的著色材料、阻燃劑、填充材、熱傳導劑、黏著賦予劑、可塑劑、抗靜電劑等的各種添加劑。特別是黏著劑組成物是具有藉由紫外線等的活性能量線而硬化之活性能量線硬化性時,該黏著劑組成物是以含有光聚合起始劑為佳。(1-5) Other components The adhesive composition for forming the pressure-sensitive adhesive layer of the present embodiment may contain, in addition to the above components, a photopolymerization initiator, a photosensitizer, a crosslinking accelerator, a dye, a pigment, and the like. Various additives such as coloring materials, flame retardants, fillers, heat transfer agents, adhesion-imparting agents, plasticizers, antistatic agents, and the like. In particular, when the adhesive composition is active energy ray-curable which is cured by an active energy ray such as ultraviolet rays, the adhesive composition preferably contains a photopolymerization initiator.

作為光聚合起始劑,可舉出苯偶姻化合物、苯乙酮化合物、醯基氧化膦化合物、二茂鈦化合物、9-氧硫 (thioxanthone)、過氧化物化合物等的光起始劑、胺、苯醌等的光敏化劑等,具體而言,可例示1-羥基環己基苯基酮、苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻異丙醚、苄基二苯基硫醚、四甲基秋蘭姆一硫醚、偶氮雙異丁腈、聯苄(dibenzyl)、雙乙醯、β-氯蒽醌、2,4,6-三甲基苯甲醯基二苯基氧化膦等,該等可單獨1種或組合2種以上而使用。使用紫外線作為能量線時,藉由調配光聚合起始劑而能夠減少照射時間、及照射量。Examples of the photopolymerization initiator include a benzoin compound, an acetophenone compound, a mercaptophosphine oxide compound, a titanocene compound, and 9-oxosulfuric acid. (thioxanthone), a photoinitiator such as a peroxide compound, a photosensitizer such as an amine or benzoquinone, and the like, specifically, 1-hydroxycyclohexyl phenyl ketone, benzoin, benzoin methyl ether , benzoin ethyl ether, benzoin isopropyl ether, benzyl diphenyl sulfide, tetramethyl thiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, β- Chloropurine, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, and the like may be used alone or in combination of two or more. When ultraviolet rays are used as the energy ray, the irradiation time and the irradiation amount can be reduced by blending the photopolymerization initiator.

(2)凹部 黏著劑層2在黏著面P具有凹部3。如後述,在本實施形態之黏著片的剝離方法,被黏著物是以利用黏著劑層2的凹部3而產生空間之方式被黏貼在黏著片1(的黏著面P)。(2) Concave The adhesive layer 2 has a concave portion 3 on the adhesive surface P. As will be described later, in the method of peeling the adhesive sheet of the present embodiment, the adherend is adhered to the adhesive sheet P (adhesive surface P) so as to create a space by the concave portion 3 of the adhesive layer 2.

黏著劑層2以具有獨立的凹部3為佳。在此,所謂凹部3為獨立,是意味著凹部3的外緣全部被構成黏著面P之平面部(有稱為非凹部之情形)包圍,換言之,意味著凹部3未連通至黏著片1的端部。黏著劑層2具有獨立的凹部3時,容易使藉由被黏著物、及黏著劑層2的凹部3所產生的空間成為獨立的空間。The adhesive layer 2 preferably has independent recesses 3. Here, the recess 3 is independent, and means that all the outer edges of the recess 3 are surrounded by a flat portion (a case called a non-recessed portion) constituting the adhesive surface P, in other words, the recess 3 is not connected to the adhesive sheet 1. Ends. When the adhesive layer 2 has the independent recessed part 3, it is easy to make the space by the to-be-adhered body and the recessed part 3 of the adhesive agent layer 2 the independent space.

又,黏著劑層2以具有複數個凹部3為佳。藉由黏著劑層2具有複數個凹部3,容易使藉由被黏著物、及黏著劑層2的凹部3所產生的空間成為獨立的空間。而且,黏著劑層2是以具有複數個獨立的凹部3為特佳。又,黏著劑層2是具有複數個凹部時,未必全部的凹部3為獨立,亦可其一部分為連通至黏著片1的端部。Further, the adhesive layer 2 preferably has a plurality of recesses 3. Since the adhesive layer 2 has a plurality of concave portions 3, it is easy to make the space created by the adherend and the concave portion 3 of the adhesive layer 2 an independent space. Further, the adhesive layer 2 is particularly preferably provided with a plurality of independent recesses 3. Further, when the adhesive layer 2 has a plurality of concave portions, the concave portions 3 are not necessarily all independent, and a part thereof may be connected to the end portion of the adhesive sheet 1.

凹部3的形狀沒有特別限定,例如具有複數個凹部3時,各自的凹部3可為同樣的形狀,各自亦可為不同的形狀。例如凹部3如第2圖顯示,俯視黏著面P之凹部3的形狀時,可為圓狀(包含橢圓狀和長圓狀)(第2圖(a))、四角形狀等的凸多角形狀(同(b))、星形狀等的凹多角形狀(同(c))等、以及將該等組合配置成為預定圖案者(同(d)、(e)),而且,亦可為不定形的形狀(同(f))。The shape of the concave portion 3 is not particularly limited. For example, when the plurality of concave portions 3 are provided, the respective concave portions 3 may have the same shape, and each may have a different shape. For example, as shown in FIG. 2, the recessed portion 3 may have a convex polygonal shape (in the form of an ellipse and an oblong shape) (including FIG. 2(a)) and a quadrangular shape when viewed in a plan view of the concave portion 3 of the adhesive surface P. (b)), a concave polygonal shape such as a star shape (the same as (c)), and the like, and the combination of the combinations as a predetermined pattern (same (d), (e)), and may also be an indefinite shape. (same (f)).

在此,在第2圖(d),複數個矩形狀的凹部31與長邊方向平行地並列配置而形成一個重複單元U,而且以構成重複單元U之矩形狀凹部31的長邊方向成為交替之方式將複數個重複單元U交錯地重複配置。 又,在第2圖(e),由複數個矩形狀的凹部32、及2個直角三角形狀的凹部33形成一個重複單元U’,而且將此種重複單元U’交錯地配置。在重複單元U’,在直角三角形狀凹部33形成直角之1邊與矩形狀凹部32的長邊成為平行,而且以直角三角形狀凹部33的斜邊與矩形狀凹部32的短邊為相向之方式配置矩形狀凹部32及直角三角形狀凹部33。複數個矩形狀凹部32是隨著從直角三角形狀凹部33離開而長邊成為較長。 在第2圖(f),凹部34具有不定形的形狀,凹部34的大小(長度、寬度、深度等)不被特定之值限定。又,在一個凹部34之寬度和方向為連續或斷續地變化且亦可具有分枝狀的形狀。Here, in FIG. 2(d), a plurality of rectangular recesses 31 are arranged in parallel with each other in the longitudinal direction to form one repeating unit U, and the longitudinal direction of the rectangular recess 31 constituting the repeating unit U is alternated. In a manner, a plurality of repeating units U are alternately arranged in an alternate manner. Further, in Fig. 2(e), one repeating unit U' is formed by a plurality of rectangular recesses 32 and two right-angled triangular recesses 33, and such repeating units U' are alternately arranged. In the repeating unit U', one side of the right-angled triangular recess 33 is formed to be parallel to the long side of the rectangular recess 32, and the oblique side of the right-angled triangular recess 33 is opposed to the short side of the rectangular recess 32. A rectangular recess 32 and a right-angled triangular recess 33 are disposed. The plurality of rectangular recesses 32 are longer as the long sides are separated from the right-angled triangular recesses 33. In Fig. 2(f), the concave portion 34 has an indefinite shape, and the size (length, width, depth, and the like) of the concave portion 34 is not limited by a specific value. Further, the width and direction of one recess 34 are continuously or intermittently changed and may have a branched shape.

而且,如後述之實施例顯示,藉由將壓花圖案轉印至黏著劑層之壓花加工來形成凹部3時,作為壓花圖案,可舉設置複數個正三角形、直角三角形、正方形、長方形、菱形等的多角形;五角星、六角星等的星形多角形;圓;橢圓;扇形;心形等具有曲線的多角形等的形狀而成之定形的重複圖案。又,可舉出模仿亞麻布料等的布紋而成的形狀;梨皮斑紋、顆粒、水珠花紋等的點狀形狀等非定型的重複圖案。此種壓花圖案,只要能夠在與被黏著物之間形成產生獨立的空間之凹部3,就沒有特別限定,以能夠形成獨立的凹部3為佳、又,以不連通至端部為佳,以能夠形成複數個獨立的凹部3為特佳。Further, as will be described later in the examples, when the concave portion 3 is formed by transferring the embossed pattern to the embossing of the adhesive layer, as the embossed pattern, a plurality of equilateral triangles, right triangles, squares, and rectangles may be provided. a polygonal shape such as a rhombus; a star-shaped polygon such as a pentagonal star or a hexagonal star; a circle; an ellipse; a fan shape; a shape of a repeating pattern formed by a shape such as a polygonal shape having a curved shape. Further, a shape which is a pattern such as a linen cloth or a non-shaped repeating pattern such as a pit-shaped shape such as a pear skin pattern, a granule, or a waterdrop pattern may be mentioned. Such an embossing pattern is not particularly limited as long as it can form a recess 3 which creates an independent space with the adherend, and it is preferable to form the independent recess 3, and it is preferable not to connect to the end. It is particularly preferable to be able to form a plurality of independent recesses 3.

凹部3的剖面形狀如第3圖顯示,能夠設為半圓狀(第3圖(a))、四角形狀(同(b))、梯形狀(同(c))、三角形狀(同(d))等各式各樣的形狀。The cross-sectional shape of the concave portion 3 is shown in Fig. 3, and can be semicircular (Fig. 3(a)), square (b), trapezoidal (c), and triangular (d). ) and a variety of shapes.

在此,在本實施形態,從藉由進行減壓處理使凹部3與被黏著物所產生的空間中的氣體膨脹,而使黏著劑層2的黏著力有效地降低之觀點而言,凹部3以膨脹的氣體容易局部地集中之形狀為佳。具體而言,在黏著面P之凹部3的形狀以凸多角形狀、凹多角形狀、或不定形的形狀為佳。In the present embodiment, the concave portion 3 is formed by expanding the gas in the space between the concave portion 3 and the adherend by the pressure reduction treatment, thereby effectively reducing the adhesive force of the adhesive layer 2. It is preferable that the expanded gas is easily concentrated locally. Specifically, the shape of the concave portion 3 on the adhesive surface P is preferably a convex polygonal shape, a concave polygonal shape, or an amorphous shape.

凹部3的高度以2μm以上且黏著劑層2的厚度以下為佳,以5μm以上且黏著劑層2的厚度以下為特佳,以10μm以上且黏著劑層2的厚度以下為更佳,以20μm以上且黏著劑層2的厚度以下為特佳。凹部3的高度為2μm以上時,能夠在凹部3與被黏著物之間產生充分的空間且使此空間中的氣體有效地膨脹。The height of the concave portion 3 is preferably 2 μm or more and the thickness of the adhesive layer 2 or less, preferably 5 μm or more and the thickness of the adhesive layer 2 or less, more preferably 10 μm or more and more preferably the thickness of the adhesive layer 2 or less, and 20 μm or less. The above and the thickness of the adhesive layer 2 are particularly preferable. When the height of the concave portion 3 is 2 μm or more, a sufficient space can be generated between the concave portion 3 and the adherend, and the gas in the space can be effectively expanded.

相對於黏著面P的總面積,凹部面積的比率(以下亦稱為凹部面積率)之下限值,以3%以上為佳,以10%以上為特佳,以25%以上為更佳。又,凹部面積率的上限值,以90%以下為佳,以75%以下為特佳,以60%以下為更佳。凹部面積率為3%以上時,因為凹部3與被黏著物之間產生充分的空間,所以在進行減壓處理時,在此種空間藉由氣體膨脹而得到的壓力變大且能夠使黏著力有效地降低。另一方面,凹部面積率為90%以下時,因為能夠充分確保與被黏著物的接觸面積,所以能夠確保所需要的黏著力。The lower limit of the ratio of the area of the concave portion (hereinafter also referred to as the area ratio of the concave portion) with respect to the total area of the adhesive surface P is preferably 3% or more, more preferably 10% or more, and even more preferably 25% or more. Further, the upper limit of the area ratio of the concave portion is preferably 90% or less, more preferably 75% or less, and still more preferably 60% or less. When the recessed area ratio is 3% or more, since a sufficient space is formed between the recessed portion 3 and the adherend, the pressure obtained by the gas expansion in such a space is increased and the adhesive force can be obtained when the pressure reduction treatment is performed. Effectively reduced. On the other hand, when the area ratio of the concave portion is 90% or less, since the contact area with the adherend can be sufficiently ensured, the required adhesive force can be secured.

在此,凹部面積率是將俯視黏著面P時的凹部,使用數位顯微鏡且以拍攝倍率20~100倍取得黏著面P的影像,而且對該影像進行影像處理(二值化處理),且能夠藉由自動面積計量凹部面積的合計值來測定。具體而言,能夠將在黏著面P之任意地選擇的預定的區域D基於下記式而計算之值視為凹部面積率。詳細的測定方法是如在後述的實施例所揭示。Here, the area ratio of the concave portion is a concave portion when the adhesive surface P is viewed in plan, and an image of the adhesive surface P is obtained by using a digital microscope at an imaging magnification of 20 to 100 times, and image processing (binarization processing) is performed on the image. It is measured by the total value of the area of the automatic area measurement recess. Specifically, the value calculated based on the following formula in the predetermined region D arbitrarily selected on the adhesive surface P can be regarded as the recess area ratio. The detailed measurement method is as disclosed in the examples to be described later.

作為凹部3的形成方法,例如可舉出將壓花圖案轉印至黏著劑層之壓花加工。此時,在壓花圖案之凸部被轉印至黏著劑層且成為黏著面的凹部3。在此,相對於形成有壓花圖案之面(壓花面)的總面積,凸部面積的比率(以下亦稱為凸部面積率)之下限值,以30%以上為佳,以50%以上為特佳,以70%以上為更佳。又,凸部面積率的上限值以98%以下為佳,以95%以下為特佳,以90%以下為更佳。As a method of forming the concave portion 3, for example, an embossing process in which an embossed pattern is transferred to an adhesive layer can be mentioned. At this time, the convex portion of the embossed pattern is transferred to the adhesive layer and becomes the concave portion 3 of the adhesive surface. Here, the ratio of the ratio of the area of the convex portion (hereinafter also referred to as the area ratio of the convex portion) to the total area of the surface (embossed surface) on which the embossed pattern is formed is preferably 30% or more, and 50% or less. More than % is particularly good, and more preferably 70% or more. Further, the upper limit of the area ratio of the convex portion is preferably 98% or less, more preferably 95% or less, and even more preferably 90% or less.

在壓花面之凸部面積率,在對較軟質的黏著劑層施行壓花加工的情況等,未必與黏著面P的凹部面積率完全一致。但是,即便此種場合,在壓花面之凸部面積率為上述範圍時,在轉印有壓花圖案之黏著面P,容易使凹部面積率落入前述較佳範圍。The area ratio of the convex portion of the embossed surface is not necessarily the same as the area ratio of the concave portion of the adhesive surface P when embossing is performed on the soft adhesive layer. However, even in such a case, when the convex portion area ratio of the embossed surface is in the above range, the adhesive surface P on which the embossed pattern is transferred is likely to fall within the above preferred range.

在壓花面之凸部面積,能夠藉由將俯視壓花面的凸部使用數位顯微鏡、雷射顯微鏡、或電子顯微鏡等以拍攝倍率為20~1000倍取得壓花面的影像,而且對該影像進行影像處理(二值化處理)且藉由自動面積計量凸部面積的合計值而測定。具體而言,能夠在壓花面之任意地選擇的預定區域T,將基於下述式而算出之值視為凸部面積率。詳細的測定方法揭示在後述的實施例。In the convex portion area of the embossed surface, the image of the embossed surface can be obtained by using a digital microscope, a laser microscope, an electron microscope, or the like at a magnification of 20 to 1000 times in a convex portion of the embossed surface. The image is subjected to image processing (binarization processing) and measured by the total area of the automatic area measurement convex area. Specifically, a value calculated based on the following formula can be regarded as a convex portion area ratio in a predetermined region T that is arbitrarily selected in the embossed surface. The detailed measurement method is disclosed in the examples described later.

作為壓花加工以外之凹部3的形成方法,例如亦可為以形成凹部3的方式進行圖案印刷之方法;亦可藉由對黏著劑層照射雷射之雷射熱加工來形成凹部3。 而且,作為形成不定形形狀的凹部3之方法,亦能夠例示國際公開第2015/152347號所記載之方法。作為其具體的一個例子,可舉出各別形成由微粒子的含量較多且樹脂的含量較少之組成物所構成的塗膜、及由含有樹脂作為主成分之組成物所構成的塗膜且將該等2種塗膜同時使其乾燥之方法。使用此種方法時,認為在塗膜內部發生起因於微粒子之收縮應力差且使塗膜產生裂紋,藉由在如此的塗膜裂紋流入周邊的樹脂而能夠形成凹部3。As a method of forming the concave portion 3 other than the embossing, for example, a method of pattern printing to form the concave portion 3 may be employed, or the concave portion 3 may be formed by laser thermal processing of irradiating the adhesive layer with a laser. Further, as a method of forming the concave portion 3 having an irregular shape, the method described in International Publication No. 2015/152347 can also be exemplified. As a specific example, a coating film composed of a composition containing a large amount of fine particles and a small content of a resin, and a coating film composed of a composition containing a resin as a main component are separately formed. A method of simultaneously drying the two types of coating films. When such a method is used, it is considered that the shrinkage stress due to the fine particles is generated inside the coating film and the coating film is cracked, and the concave portion 3 can be formed by the resin film having such a coating film crack flowing into the periphery.

(3)黏著劑層的物性等 (3-1)厚度 在本實施形態之黏著劑層的厚度以5~100μm為佳,以10~50μm為特佳,以15~30μm為更佳。黏著劑層的厚度為5μm以上時,因為能夠更多地確保減壓時的空間,乃是較佳。黏著劑層的厚度為100μm以下時,因為能夠確保塗布時的膜厚精確度,乃是較佳。(3) Physical properties of the adhesive layer, etc. (3-1) Thickness The thickness of the adhesive layer in the present embodiment is preferably 5 to 100 μm, more preferably 10 to 50 μm, and even more preferably 15 to 30 μm. When the thickness of the pressure-sensitive adhesive layer is 5 μm or more, it is preferable because the space at the time of pressure reduction can be more ensured. When the thickness of the adhesive layer is 100 μm or less, it is preferable because the film thickness accuracy at the time of coating can be ensured.

(3-2)黏著力 黏著片的黏著力以0.5~50N/25mm為佳,以2~40N/25mm為較佳,以5~30N/25mm為特佳。藉由黏著片的黏著力為上述範圍內,能夠將被黏著物確實地固定,例如在被黏著物的加工步驟之被黏著物的暫時固定為非常有用的。(3-2) Adhesive force The adhesive force of the adhesive sheet is preferably 0.5 to 50 N/25 mm, preferably 2 to 40 N/25 mm, and particularly preferably 5 to 30 N/25 mm. When the adhesive force of the adhesive sheet is within the above range, the adherend can be surely fixed, for example, it is very useful to temporarily fix the adherend in the processing step of the adherend.

又,在此所稱的黏著力,是針對未進行後述的減壓處理的(黏著劑組成物為具有活性能量線硬化性或熱硬化性時,不進一步進行活性能量線的照射及加熱)黏著片,將矽鏡面晶圓作為被黏著物,將黏著片貼合至該鏡面且依據JIS Z0237:2009之180°剝離法所測定的黏著力(mN/25mm)。In addition, the adhesive force referred to here is a pressure-reducing treatment which is not described later (when the adhesive composition is active energy ray-curable or thermosetting, the active energy ray is not further irradiated and heated) For the sheet, the enamel mirror wafer was used as an adherend, and the adhesive sheet was attached to the mirror surface and the adhesion (mN/25 mm) measured according to the 180° peeling method of JIS Z0237:2009.

(3-3)黏著力減少率 黏著片的黏著力減少率以10%以上為佳,以20%以上為較佳,以30%以上為特佳。藉由黏著片的黏著力為上述範圍內,在本實施形態之黏著片與被黏著物的剝離變成更容易。(3-3) Adhesion reduction rate The adhesion reduction rate of the adhesive sheet is preferably 10% or more, more preferably 20% or more, and particularly preferably 30% or more. When the adhesive force of the adhesive sheet is within the above range, the peeling of the adhesive sheet and the adherend in the present embodiment becomes easier.

又,在此所稱的黏著力減少率,是在進行後述減壓處理之前(黏著劑組成物具有活性能量線硬化性或熱硬化性時,是進行活性能量線的照射或加熱之後)的黏著片、及進行減壓處理之後(黏著劑組成物具有活性能量線硬化性或熱硬化性時,是進行活性能量線的照射及加熱之後)的黏著片的各自,如前述地測定黏著力,而且基於所得到的值且依照以下的式而算出。 黏著力減少率(%)=(減壓前黏著力-減壓後黏著力)/(減壓前黏著力)×100In addition, the adhesion reduction rate referred to herein is the adhesion before the pressure reduction treatment described later (when the adhesive composition has active energy ray hardening property or thermosetting property, after the active energy ray is irradiated or heated). After the sheet and the pressure-sensitive adhesive sheet after the pressure-reducing treatment (when the adhesive composition has active energy ray-curing property or thermosetting property, after the active energy ray is irradiated and heated), the adhesive force is measured as described above, and Based on the obtained value, it was calculated according to the following formula. Adhesion reduction rate (%) = (adhesion before decompression - adhesion after decompression) / (adhesion before decompression) × 100

又,如後述,黏著劑組成物具有活性能量線硬化性或熱硬化性時的活性能量線之照射或加熱,可為減壓處理之前,亦可為減壓處理之後,任一種情況之黏著力減少率均設為依照上述式而算出。Further, as will be described later, the adhesive composition has irradiation or heating of the active energy ray at the time of active energy ray hardening or thermosetting, and may be an adhesive force in any case after the pressure reduction treatment or after the pressure reduction treatment. The reduction rate is calculated in accordance with the above formula.

(3-4)應力緩和率 在本實施形態,黏著劑層的應力緩和率之下限值,以40%以上為佳,以50%以上為特佳,以55%以上為更佳。黏著劑層的應力緩和率之上限值以90%以下為佳,以85%以下為特佳,以80%以下為更佳。藉由將應力緩和率設定為前述範圍,黏著劑層減壓時能夠平衡良好且安定地變形。(3-4) Stress relaxation ratio In the present embodiment, the lower limit of the stress relaxation rate of the adhesive layer is preferably 40% or more, more preferably 50% or more, and even more preferably 55% or more. The upper limit of the stress relaxation rate of the adhesive layer is preferably 90% or less, particularly preferably 85% or less, and more preferably 80% or less. By setting the stress relaxation ratio to the above range, the pressure-sensitive adhesive layer can be well balanced and stably deformed when the pressure is reduced.

又,在此所稱黏著劑層的應力緩和率,是指未進行後述減壓處理的(黏著劑組成物具有活性能量線硬化性或熱硬化性時,為進行活性能量線的照射或加熱之後)黏著劑層,在拉伸試驗使其伸長10%而保持300秒之後的應力緩和率。具體而言,拉伸試驗是將成形成為厚度50μm、寬度15mm、長度120mm(其中測定範圍為100mm)之黏著劑,在23℃、50%RH的環境下使其以200mm/分鐘的速度伸長10%而進行。In addition, the stress relaxation rate of the adhesive layer as used herein means that the pressure-reducing treatment described later is not performed (when the adhesive composition has active energy ray hardening property or thermosetting property, after the irradiation or heating of the active energy ray is performed) The adhesive layer was subjected to a tensile test to stretch it by 10% for 300 seconds. Specifically, the tensile test is an adhesive which is formed into a thickness of 50 μm, a width of 15 mm, and a length of 120 mm (in which the measurement range is 100 mm), and is elongated at a rate of 200 mm/min in an environment of 23° C. and 50% RH. % proceed.

(3-5)斷裂伸長度 在本實施形態,黏著劑層的斷裂伸長度的下限值以110%以上為佳,以120%以上為特佳,以130%以上為更佳。又,黏著劑層的斷裂伸長度的上限值以300%以下為佳,以200%以下為特佳,以150%以下為更佳。藉由將黏著劑層的斷裂伸長度設為前述範圍,在黏著劑層減壓時伸長度能夠平衡良好且安定地變形。(3-5) Elongation at break In the present embodiment, the lower limit of the elongation at break of the pressure-sensitive adhesive layer is preferably 110% or more, more preferably 120% or more, and still more preferably 130% or more. Further, the upper limit of the elongation at break of the pressure-sensitive adhesive layer is preferably 300% or less, more preferably 200% or less, and still more preferably 150% or less. By setting the elongation at break of the pressure-sensitive adhesive layer to the above range, the elongation can be well balanced and stably deformed when the pressure-sensitive adhesive layer is decompressed.

又,在此所稱黏著劑層的斷裂伸長度,是針對未進行後述減壓處理的(黏著劑組成物具有活性能量線硬化性或熱硬化性時,是進行活性能量線的照射或加熱之後)黏著劑層,設為不帶有基材等之單獨的黏著劑層而測定,具體而言是設為將成形為厚度50μm、寬度15mm、長度120mm(其中測定範圍為100mm)之黏著劑在23℃、50%RH的環境下以200mm/分鐘的速度使其伸長而進行。In addition, the elongation at break of the pressure-sensitive adhesive layer is not subjected to the pressure reduction treatment described later (when the adhesive composition has active energy ray hardening property or thermosetting property, after the active energy ray is irradiated or heated) The adhesive layer is measured by a separate adhesive layer without a substrate, and specifically, an adhesive having a thickness of 50 μm, a width of 15 mm, and a length of 120 mm (in which the measurement range is 100 mm) is formed. The film was extruded at a rate of 200 mm/min in an environment of 23 ° C and 50% RH.

(3-6)凝膠分率 在本實施形態,黏著劑層的凝膠分率之下限值以2%以上為佳,以4%以上為特佳,以6%以上為更佳。黏著劑層的凝膠分率之上限值以90%以下為佳,以40%以下為特佳,以15%以下為更佳。黏著劑層的凝膠分率之下限值為2%以上時,藉由交聯而產生黏著劑之間的反應,能夠確保作為黏著片的安定性。另一方面,黏著劑層的凝膠分率之上限值為90%以下時容易對黏著片上賦予黏性且能夠得到良好的暫時固定性。(3-6) Gel fraction In the present embodiment, the lower limit of the gel fraction of the adhesive layer is preferably 2% or more, more preferably 4% or more, and still more preferably 6% or more. The upper limit of the gel fraction of the adhesive layer is preferably 90% or less, more preferably 40% or less, and even more preferably 15% or less. When the lower limit of the gel fraction of the adhesive layer is 2% or more, the reaction between the adhesives is caused by crosslinking, and the stability as an adhesive sheet can be ensured. On the other hand, when the upper limit of the gel fraction of the adhesive layer is 90% or less, it is easy to impart adhesiveness to the adhesive sheet and to obtain good temporary fixation.

又,在此所稱黏著劑層的凝膠分率,是針對未進行後述的減壓處理的(黏著劑組成物具有活性能量線硬化性或熱硬化性時,不進一步進行活性能量線的照射及加熱)黏著劑層之貼附時(風乾期間經過後)之值。具體而言,是指將黏著劑塗布在剝離片且加熱乾燥之後,在23℃、50%RH的環境下保管7天之後的凝膠分率。又,因為黏著劑的凝膠分率是在風乾(seasoning)期間經過後之情況為安定的,所以不清楚是否經過風乾期間之情況,重新在23℃、50%RH的環境下保管7天之後進行測定即可。In addition, the gel fraction of the adhesive layer is not subjected to the reduced pressure treatment described later (when the adhesive composition has active energy ray curability or thermosetting property, the active energy ray is not further irradiated. And heating) the value of the adhesive layer when attached (after the air drying period). Specifically, it means the gel fraction after the adhesive is applied to the release sheet and dried by heating, and stored in an environment of 23° C. and 50% RH for 7 days. Further, since the gel fraction of the adhesive is stable after passing through the seasoning period, it is unclear whether or not it has been stored in the environment of 23 ° C and 50% RH for 7 days after the air drying period. It can be measured.

(4)基材 本實施形態之黏著片,除了黏著劑層以外,亦可具備基材。在此,基材是只要黏著片在被黏著物的加工步驟等的所需要的步驟能夠具有適當的功能,其構成材料就沒有特別限定,例如可舉出使用樹脂將紙基材、樹脂膜或片、紙基材貼合而成之基材等,能夠按照本實施形態的一態樣的黏著片的用途而適當地選擇。尤其是從對減壓效果為有利而言,是以由將樹脂系的材料設為主材之薄膜所構成為佳。作為該薄膜的具體例,可舉出乙烯-乙酸乙烯酯共聚物膜、乙烯-(甲基)丙烯酸共聚物膜、乙烯-(甲基)丙烯酸酯共聚物膜等的乙烯系共聚合膜;低密度聚乙烯(LDPE)膜、直鏈低密度聚乙烯(LLDPE)膜、高密度聚乙烯(HDPE)膜等的聚乙烯膜、聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、乙烯-降莰烯共聚物膜、降莰烯樹脂膜等的聚烯烴系薄膜;聚氯乙烯膜、氯乙烯共聚物膜等的聚氯乙烯系薄膜;聚對苯二甲酸乙二酯膜、聚對苯二甲酸丁二酯膜等的聚酯系薄膜;聚胺酯膜;聚醯亞胺膜;聚苯乙烯膜;聚碳酸酯膜;氟樹脂膜等。又,亦可使用該等的交聯膜、如離子聚合物膜的改性膜。上述基材可為由該等1種所構成之薄膜,亦可為進一步將該等組合2種類以上而成之積層膜。(4) Substrate The adhesive sheet of the present embodiment may be provided with a substrate in addition to the adhesive layer. Here, the base material is not particularly limited as long as the adhesive sheet can have an appropriate function in a step required for the processing step of the adherend, and the like. For example, a paper base material, a resin film, or a resin may be used. The base material to which the sheet and the paper base material are bonded can be appropriately selected in accordance with the use of the adhesive sheet of one embodiment of the present embodiment. In particular, it is preferable that the pressure-reducing effect is a film made of a resin-based material as a main material. Specific examples of the film include an ethylene-vinyl acetate copolymer film, an ethylene-(meth)acrylic copolymer film, and an ethylene-based (meth)acrylate copolymer film; Polyethylene film (LDPE) film, linear low-density polyethylene (LLDPE) film, high-density polyethylene (HDPE) film, polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethyl a polyolefin-based film such as a pentene film, an ethylene-norbornene copolymer film or a norbornene resin film; a polyvinyl chloride film such as a polyvinyl chloride film or a vinyl chloride copolymer film; and polyethylene terephthalate A polyester film such as a diester film or a polybutylene terephthalate film; a polyurethane film; a polyimide film; a polystyrene film; a polycarbonate film; a fluororesin film. Further, such a crosslinked film, a modified film such as an ionic polymer film may also be used. The substrate may be a film composed of one of these types, or a laminate film in which two or more types are combined.

構成基材之薄膜,以具備乙烯系共聚合膜及聚烯烴系薄膜的至少一種為佳。乙烯系共聚合膜藉由改變共聚合比等,而容易控制其機械特性在廣泛的範圍。因此,具備乙烯系共聚合膜之基材,容易滿足作為本實施形態之黏著片的基材所要求的機械特性。又,因為乙烯系共聚合膜對黏著劑層之密著性較高,所以使用作為黏著片時,不容易在基材與黏著劑層的界面產生剝離。The film constituting the substrate preferably contains at least one of a vinyl copolymer film and a polyolefin film. The ethylene-based copolymer film is easy to control its mechanical properties in a wide range by changing the copolymerization ratio and the like. Therefore, the base material provided with the ethylene-based copolymer film can easily satisfy the mechanical properties required as the base material of the pressure-sensitive adhesive sheet of the present embodiment. Further, since the ethylene-based copolymer film has high adhesion to the pressure-sensitive adhesive layer, when it is used as an adhesive sheet, peeling at the interface between the substrate and the pressure-sensitive adhesive layer is less likely to occur.

在本實施形態所使用的基材,亦可在以上述樹脂系材料作為主材之薄膜內,含有顏料、染料、阻燃劑、可塑劑、抗靜電劑、滑劑、填料等的各種添加劑。作為顏料,例如可舉出二氧化鈦、碳黑等。又,作為填料,可例示如三聚氰胺樹脂的有機系材料、霧狀氧化矽(fumed silica)的無機系材料及如鎳粒子的金屬系材料。如此的添加劑之含量沒有特別限定,但是必須留在可發揮基材所需要的功能且不喪失平滑性和柔軟性之範圍。In the base material used in the present embodiment, various additives such as a pigment, a dye, a flame retardant, a plasticizer, an antistatic agent, a lubricant, and a filler may be contained in the film containing the resin material as a main material. Examples of the pigment include titanium dioxide, carbon black, and the like. Further, examples of the filler include an organic material such as a melamine resin, an inorganic material of fumed silica, and a metal material such as nickel particles. The content of such an additive is not particularly limited, but it must be left in a range in which the function required for the substrate can be exhibited without losing smoothness and flexibility.

使用紫外線作為用以使黏著劑層硬化而照射之能量線且從基材側照射時,基材以對紫外線具有透射性為佳。又,使用電子射線作為能量線時,基材以具有電子射線的透射性為佳。但是被黏著物具有能量線透射性且將能量線從被黏著物側照射時,基材不須具有能量線透射性。When ultraviolet rays are used as the energy ray for curing the adhesive layer and irradiated from the substrate side, the substrate is preferably transmissive to ultraviolet rays. Further, when an electron ray is used as the energy ray, the substrate preferably has electron beam transmittance. However, when the adherend has energy ray transmission and the energy ray is irradiated from the side of the adherend, the substrate does not have to have energy ray transmission.

又,基材的黏著劑層側之面(以下亦稱為「基材被黏著面」),以存在具有1種或2種以上之選自由羧基、以及其離子及鹽所組成群組之成分為佳。藉由在基材中之上述成分與黏著劑層成分(可例示構成黏著劑層之成分及交聯劑等用以形成黏著劑層時所使用的成分)產生化學交互作用,能夠減低在該等之間產生剝離之可能性。用以使基材被黏著面存在此種成分之具體的手法是沒有特別限定。例如將基材本身設為乙烯-(甲基)丙烯酸共聚物膜、離子聚合物樹脂膜等,構成基材之材料的樹脂可設為具有選自羧基、以及其離子及鹽所組成群組之1種或2種以上之物。作為使基材被黏著面存在上述成分之其它手法,例如基材為聚烯烴系薄膜且亦可在基材被黏著面側施行電暈處理、或設置有底漆層。又,亦可在基材之與基材被黏著面為相反側之面設置有各種塗膜。Further, the surface of the adhesive layer side of the substrate (hereinafter also referred to as "the substrate-attached surface") has one or more components selected from the group consisting of a carboxyl group and an ion and a salt thereof. It is better. By chemically interacting with the above-mentioned components in the substrate and the adhesive layer component (the components used to form the adhesive layer such as the components constituting the adhesive layer and the crosslinking agent), it is possible to reduce the chemical interaction. There is a possibility of peeling between them. The specific method for causing such a component to be present on the adhesive surface of the substrate is not particularly limited. For example, the base material itself may be an ethylene-(meth)acrylic copolymer film or an ionomer resin film, and the resin constituting the material of the substrate may be selected from the group consisting of a carboxyl group and a group of ions and salts thereof. One or more types. As another method of allowing the above-mentioned components to be present on the adhesive surface of the substrate, for example, the base material is a polyolefin-based film, and the base material may be subjected to corona treatment on the side of the adhesive surface or a primer layer may be provided. Further, various coating films may be provided on the surface of the substrate opposite to the surface on which the substrate is adhered.

基材的厚度,只要黏著片在所需要的步驟能夠具有適當的功能就不被限定,從操作性及經濟性的觀點而言,以5~1000μm為佳,較佳為10~500μm,更佳為12~250μm,又更佳為15~150μm。The thickness of the substrate is not limited as long as the adhesive sheet can have an appropriate function in a desired step, and preferably 5 to 1000 μm, preferably 10 to 500 μm, more preferably from the viewpoint of workability and economy. It is 12 to 250 μm, and more preferably 15 to 150 μm.

(5)剝離片 本實施形態之黏著片,是在將黏著劑層貼附在被黏著物為止之期間,為了保護黏著劑層之目的,亦可將剝離片層積在黏著劑層的黏著面。剝離片的構成為任意的,可例示使用剝離劑等將塑膠膜進行剝離處理而成之物。作為塑膠膜的具體例,能夠舉出聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等的聚酯膜、及聚丙烯、聚乙烯等的聚烯烴膜。作為剝離劑,能夠使用聚矽氧系、氟系、長鏈烷基系等,該等之中,以廉價且能夠得到穩定的性能之聚矽氧系為佳。針對剝離片的厚度是沒有特別限制,通常20~250μm左右。又,此種剝離片亦可為形成有用以形成凹部的壓花圖案之剝離片,又,亦可為剝離面為平面且在形成凹部之後用以保護黏著劑層而層積之剝離片。(5) Release sheet The adhesive sheet of the present embodiment may be formed by laminating the release sheet on the adhesive surface of the adhesive layer for the purpose of protecting the adhesive layer while the adhesive layer is attached to the adhesive. . The configuration of the release sheet is arbitrary, and a product obtained by peeling off a plastic film using a release agent or the like can be exemplified. Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polycondensation of polypropylene, polyethylene, and the like. Olefin film. As the release agent, a polyfluorene-based, a fluorine-based or a long-chain alkyl group can be used, and among these, a polyoxyl system which is inexpensive and can provide stable performance is preferable. The thickness of the release sheet is not particularly limited, and is usually about 20 to 250 μm. Moreover, such a release sheet may be a release sheet which forms an embossed pattern for forming a concave portion, or a release sheet which is a flat surface and which is formed by laminating the adhesive layer after the concave portion is formed.

(6)黏著片的製造方法 黏著片的製造方法,是形成由前述黏著劑組成物所形成之黏著劑層,而且只要能夠在黏著劑層的黏著面形成凹部之方法,詳細的方法沒有特別限定。舉出一個例子時,首先,準備形成有對應凹部的壓花圖案之薄片,藉由將此種薄片表面進行剝離處理而得到形成有壓花圖案之剝離片。其次,調製含有前述黏著劑組成物、及依照所需要進一步含有的溶劑或分散介質之塗布用組成物,在如前述進行而得到具有壓花圖案之剝離片的剝離處理面上,使用模塗布器、簾流塗布器、噴霧塗布器、狹縫塗布器、刮刀塗布器等塗布該塗布用組成物而形成塗膜,藉由將該塗膜乾燥而能夠形成由黏著劑層及剝離片所構成之積層體。其次,可將基材貼附在該積層體之與黏著劑層之剝離片側的面為相反側的面,而得到黏著片與剝離片之積層體。在該積層體之剝離片亦可作為製程材料而剝離,亦可至該黏著片貼附在電子構件、光學構件等的被黏著物為止之期間,保護黏著劑層。(6) Method for Producing Adhesive Sheet The method for producing an adhesive sheet is to form an adhesive layer formed of the above-described adhesive composition, and a method of forming a concave portion on an adhesive surface of the adhesive layer is not particularly limited. . As an example, first, a sheet having an embossed pattern corresponding to a concave portion is prepared, and a release sheet having an embossed pattern is obtained by subjecting the surface of the sheet to a peeling treatment. Then, a coating composition containing the above-described adhesive composition and a solvent or a dispersion medium further contained as required is prepared, and a die coater is used on the release-treated surface of the release sheet having an embossed pattern as described above. The coating composition is applied to the coating composition by a curtain coater, a spray applicator, a slit coater, a knife coater, etc., and the coating film is dried to form an adhesive layer and a release sheet. Laminated body. Next, the substrate can be attached to the surface of the laminate which is opposite to the surface on the side of the release sheet of the adhesive layer, thereby obtaining a laminate of the adhesive sheet and the release sheet. The release sheet of the laminate may be peeled off as a process material, and the adhesive layer may be protected until the adhesive sheet is attached to an adherend such as an electronic component or an optical member.

此時,塗布用組成物只要能夠進行塗布,就沒有特別限定其性狀,有將用以形成黏著劑層的成分以溶質的方式含有之情況,亦有以分散質的方式含有之情況。又,塗布用組成物含有交聯劑時,藉由改變上述乾燥條件(溫度、時間等),或藉由另外設置加熱處理,使塗膜內的(甲基)丙烯酸酯聚合物(A)、(B1)或(B3)與交聯劑進行交聯反應且在黏著劑層內以所需要的存在密度形成交聯結構即可。為了使該交聯反應充分地進行,使用上述的方法等使黏著劑層層積在基材之後,通常進行將所得到的黏著片例如在23℃、相對濕度50%的環境下靜置數天之熟化。 又,在本說明書所謂黏著劑的「交聯」,是指將黏著片黏貼在被黏著物之前進行之反應,所謂黏貼在被黏著物之前,例如可舉出形成前述黏著劑層之階段。因此黏著劑的「交聯」,能夠與後述所謂「硬化」明確地區別。In this case, the coating composition is not particularly limited in its properties as long as it can be applied, and the component for forming the pressure-sensitive adhesive layer may be contained as a solute, or may be contained as a dispersoid. Further, when the coating composition contains a crosslinking agent, the (meth) acrylate polymer (A) in the coating film is changed by changing the drying conditions (temperature, time, etc.) or by separately providing heat treatment. (B1) or (B3) may be subjected to a crosslinking reaction with a crosslinking agent and a crosslinked structure may be formed in the adhesive layer at a desired density of existence. In order to sufficiently carry out the crosslinking reaction, after the adhesive layer is laminated on the substrate by the above-described method or the like, the obtained adhesive sheet is usually allowed to stand for several days in an environment of, for example, 23 ° C and a relative humidity of 50%. Ripening. In addition, the term "crosslinking" of the adhesive in the present specification refers to a reaction in which the adhesive sheet is adhered to the adherend before the adherend, and the adhesive layer is formed, for example, before the adhesive is adhered. Therefore, the "crosslinking" of the adhesive can be clearly distinguished from the "hardening" which will be described later.

作為黏著片之另外的製造方法,亦可藉由使用雷射照射之雷射熱加工代替壓花加工來進行。具體而言,是如前述得到以黏著劑層與基材的積層體之黏著片之後,從黏著劑層的黏著面側照射雷射來形成凹部。作為使用在雷射熱加工之雷射的種類,可舉出碳酸氣體(CO2 )雷射、TEA-CO2 雷射、YAG雷射、UV-YAG雷射、YVO4 雷射、YLF雷射等,其中,尤其是從生產效率、成本等方面而言,以碳酸氣體雷射為佳。As a separate manufacturing method of the adhesive sheet, laser processing using laser irradiation instead of embossing can be performed. Specifically, after the adhesive sheet of the laminate of the adhesive layer and the substrate is obtained as described above, the laser is irradiated from the adhesive surface side of the adhesive layer to form a concave portion. Examples of the types of lasers used in laser thermal processing include carbon dioxide gas (CO 2 ) lasers, TEA-CO 2 lasers, YAG lasers, UV-YAG lasers, YVO 4 lasers, and YLF lasers. Etc. Among them, in particular, in terms of production efficiency, cost, etc., a carbon dioxide gas laser is preferred.

又,藉由雷射熱加工而形成貫穿孔,有對一處連續地照射雷射光至形成一個貫穿孔為止之脈衝加工(脈衝模式)、及對複數處依次照射雷射光而均等地形成複數個貫穿孔之循環加工(循環模式),就熱效率就而言以前者為較優異,就能夠減低對被加工物之熱影響而言,以後者為較優異,上述雷射熱加工可採用任一模式而進行。Further, a through hole is formed by laser thermal processing, and a plurality of laser beams are continuously irradiated to form a through hole (pulse mode), and a plurality of laser beams are sequentially irradiated to a plurality of portions to uniformly form a plurality of laser beams. The cyclic processing of the through hole (circulation mode) is superior in terms of thermal efficiency, and the thermal influence on the workpiece can be reduced. The latter is superior, and the above laser thermal processing can adopt either mode. And proceed.

[黏著片的剝離方法、加工物的製造方法] 使用以上敘述的黏著片,將黏著片與被黏貼在黏著劑層的黏著面之被黏著物剝離之方法,是邊參照第4圖邊如以下進行說明。[Method for peeling adhesive sheet and method for producing processed product] The method for peeling the adhesive sheet from the adhered surface adhered to the adhesive surface of the adhesive layer by using the above-mentioned adhesive sheet is as follows with reference to Fig. 4 Be explained.

(1)黏貼步驟 首先,在施行本實施形態的剝離方法時,如第4圖(a)顯示,將作為被黏著物的工件W預先黏貼在黏著片1所具備的黏著劑層2之黏著面P。如前述,在黏著劑層2的黏著面P形成有凹部3,將工件W以在此種凹部3與工件W之間產生獨立的空間C之方式黏貼在黏著片1。在此,所謂空間C為獨立,意味著空間C與黏著面P黏貼有被黏著物之部分的端部E不連通。藉由空間C為獨立,在後述的剝離步驟,能夠藉由減壓處理而使空間C膨脹。(1) Adhesive step First, when the peeling method of the present embodiment is carried out, as shown in Fig. 4(a), the workpiece W as an adherend is previously adhered to the adhesive surface of the adhesive layer 2 provided in the adhesive sheet 1. P. As described above, the concave portion 3 is formed on the adhesive surface P of the adhesive layer 2, and the workpiece W is adhered to the adhesive sheet 1 so as to create a separate space C between the concave portion 3 and the workpiece W. Here, the space C is independent, and means that the space C and the adhesive surface P are not in contact with the end portion E of the portion to be adhered. By the space C being independent, the space C can be expanded by the pressure reduction process in the peeling process mentioned later.

作為成為本實施形態之剝離方法的對象之工件W,例如可舉出半導體晶圓、半導體組件、多層基板、陶瓷生片積層體、整批密封模組等的電子構件;液晶顯示器構件、有機EL顯示器構件、光學濾波器、偏光板、相位差板等的光學構件等。Examples of the workpiece W to be subjected to the peeling method of the present embodiment include electronic components such as a semiconductor wafer, a semiconductor component, a multilayer substrate, a ceramic green sheet laminate, and a bulk seal module; and a liquid crystal display member and an organic EL; Optical members such as a display member, an optical filter, a polarizing plate, and a phase difference plate.

工件W與黏著片1的黏貼,可在大氣壓下進行,亦可藉由後述壓力控制裝置10而在經控制環境壓力的處理室內進行。在此,進行黏貼步驟之大氣壓或處理室內的環境壓力,是相當於在隨後的步驟之空間C中的氣體壓力,適當地調整此種環境壓力以進行黏貼步驟,則容易控制在減壓處理之氣體的膨脹量。The adhesion of the workpiece W to the adhesive sheet 1 can be performed under atmospheric pressure, or can be performed in a processing chamber under controlled environmental pressure by a pressure control device 10 to be described later. Here, the atmospheric pressure in the pasting step or the environmental pressure in the processing chamber is equivalent to the gas pressure in the space C in the subsequent step, and the environmental pressure is appropriately adjusted to perform the sticking step, and it is easy to control the pressure reducing treatment. The amount of expansion of the gas.

(2)加工步驟 藉由黏貼步驟而被黏貼在黏著片1之工件W,是能夠在被黏貼在黏著片1的狀態下,施行各種加工步驟(第4圖(b))。作為加工步驟的例子,工件W為半導體晶圓時,可舉出背面研磨步驟、電路形成步驟、切割步驟、晶粒挑檢(Die Sorting)步驟等;工件W為顯示裝置構成構件時,可舉出層積步驟、移送步驟等。藉由該等各種步驟,工件W是被加工成為加工物W’。在此,因為黏著片1是在工件W的加工步驟之後,如後述地從工件W被剝離,所以能夠使用於將步驟之間工件W暫時固定。(2) Processing step The workpiece W adhered to the adhesive sheet 1 by the bonding step can be subjected to various processing steps while being adhered to the adhesive sheet 1 (Fig. 4(b)). As an example of the processing step, when the workpiece W is a semiconductor wafer, a back surface polishing step, a circuit forming step, a dicing step, a die sorting step, and the like may be mentioned; and when the workpiece W is a display device constituting member, The stacking step, the transfer step, and the like. By these various steps, the workpiece W is processed into a workpiece W'. Here, since the adhesive sheet 1 is peeled off from the workpiece W after the processing step of the workpiece W as will be described later, it can be used to temporarily fix the workpiece W between the steps.

(3)剝離步驟 其次,將黏貼有加工物W’的狀態下之黏著片1,載置在壓力控制裝置10的處理室(第4圖(c))。在此,為了在後述的減壓處理使空間C有效地膨脹,將黏貼有加工物W’之狀態的黏著片1,以加工物W’成為黏著片1的下側之方式,載置在處理室內為佳。但是,加工物W’的重量為充分地較小等(特別是加工物W’比黏著片1更輕時),且能夠在減壓處理使空間C膨脹時,亦能夠以加工物W’成為黏黏著片1的上側之方式被載置在處理室。(3) Peeling step Next, the adhesive sheet 1 in a state in which the workpiece W' is adhered is placed in the processing chamber of the pressure control device 10 (Fig. 4(c)). Here, in order to effectively expand the space C in the pressure reduction treatment to be described later, the adhesive sheet 1 in a state in which the workpiece W' is adhered is placed on the processing so that the workpiece W' is placed on the lower side of the adhesive sheet 1. The interior is better. However, the weight of the workpiece W' is sufficiently small (especially when the workpiece W' is lighter than the adhesive sheet 1), and when the space C is expanded by the pressure reduction treatment, the workpiece W' can also be formed. The upper side of the sheet 1 is adhered to the processing chamber.

接著,使處理室內壓力降低(減壓處理,第4圖(d))。結果,因為相較於處理室內的壓力,空間C中的氣體壓力成為相對地較高之狀態,所以藉由此種空間C中的氣體產生體積膨脹,在黏著劑層2內,能夠對黏著劑層2賦予使空間C膨脹之壓力。Next, the pressure in the processing chamber is lowered (pressure reducing treatment, Fig. 4 (d)). As a result, since the gas pressure in the space C becomes a relatively high state compared to the pressure in the processing chamber, the volume expansion in the gas in the space C makes it possible to adhere the adhesive in the adhesive layer 2. Layer 2 imparts a pressure that causes space C to expand.

此種壓力,是對至少空間C,賦予適合使其在沿著縱向(黏著劑層2的黏著面P之法線方向)之方向膨脹之壓力。在此,藉由黏著劑層2具有複數個凹部3,形成有複數個空間C時,一個空間C被賦予的橫向(在黏著劑層2之黏著面P的平面方向)的壓力是與鄰接該空間C之空間C被賦予的橫向壓力相抵銷之情況,因為縱向壓力未被相抵銷而殘留,使得欲使空間C往縱向膨脹之力量變成更顯著,乃是較佳。Such a pressure imparts a pressure suitable for expanding at least the space C in a direction along the longitudinal direction (the normal direction of the adhesive surface P of the adhesive layer 2). Here, when the adhesive layer 2 has a plurality of recesses 3, when a plurality of spaces C are formed, the pressure in the lateral direction (the plane direction of the adhesive surface P of the adhesive layer 2) to which one space C is imparted is adjacent to The space C of the space C is offset by the lateral pressure given, since the longitudinal pressure is not left by the offset, so that the force for expanding the space C to the longitudinal direction becomes more remarkable, which is preferable.

上述減壓處理以相較於貼附環境的環境壓力低為佳,處理室內的環境壓力比貼附環境的環境壓力是低10kPa以上的差異為較佳,該環境壓力的差異是以30kPa以上為更佳,以50kPa以上為又更佳,以80kPa以上為又更佳,以90kPa以上為特佳。藉由以比貼附環境的環境壓力更低的方式進行上述減壓處理,能夠使空間C中的氣體更有效地膨脹。又,處理室內的壓力之下限值沒有特別限定,從技術上的觀點而言,通常為10-7 Pa以上,以10-5 Pa以上為佳,較佳為10-1 Pa以上,又更佳為10Pa以上,又更佳為100Pa以上,特佳為1000Pa以上。The pressure reduction treatment is preferably lower than the environmental pressure of the attached environment, and the environmental pressure in the treatment chamber is preferably lower than the environmental pressure of the attached environment by 10 kPa or more, and the difference in the environmental pressure is 30 kPa or more. More preferably, it is more preferably 50 kPa or more, more preferably 80 kPa or more, and more preferably 90 kPa or more. By performing the above-described pressure reduction treatment in a manner lower than the environmental pressure of the attached environment, the gas in the space C can be more effectively expanded. Further, the lower limit of the pressure in the treatment chamber is not particularly limited, and is usually 10 -7 Pa or more, preferably 10 -5 Pa or more, more preferably 10 -1 Pa or more, and more preferably from a technical point of view. Preferably, it is 10 Pa or more, and more preferably 100 Pa or more, and particularly preferably 1000 Pa or more.

此種減壓處理的結果,如第4圖(d)顯示,藉由空間C的膨脹而將基材往黏著劑的縱向上推之力量,大於與被黏著物的黏著力時,從該處起黏著劑層2從加工物W’的一部分或全部剝離(第4圖(e))。藉由黏著劑層2具有複數個凹部3,因為形成複數個空間C,所以膨脹處增加,結果成為剝離的契機之處增加之緣故,乃是較佳。又,黏著劑層2可為硬質亦可為軟質。黏著劑層2為較硬質時,如第4圖(d)顯示,在空間C及黏著劑層2的變形幾乎無法觀察到之狀態下,黏著劑層2與加工物W’的界面之剝離是從空間C側起逐漸進行。認為這是因為氣體膨脹所產生的壓力,在由黏著劑層2與加工物W’所構成之空間C的內壁之中,容易集中在較脆弱的部分亦即黏著劑層2與加工物W’的界面之緣故。另一方面,黏著劑層2為較軟質時,空間C及黏著劑層2在縱向變形之後,如第4圖(e)顯示,黏著劑層2與加工物W’產生剝離。如此進行而黏著劑層2對加工物W’的黏著力降低。藉此,能夠使黏著片1與加工物W’容易地剝離。在此,黏著片1與加工物W’亦能夠在第4圖(e)的狀態下使其直接剝離,例如以加工物W’成為黏著片1的上側之方式載置在處理室內而減壓時,藉由在減壓後的處理室內,使加工物W’與黏著片180°反轉,亦能夠藉由加工物W’的本身重量而使黏著片1與加工物W’剝離。As a result of such a reduced pressure treatment, as shown in Fig. 4(d), the force of pushing the substrate toward the longitudinal direction of the adhesive by the expansion of the space C is greater than the adhesion to the adherend, from where The adhesive layer 2 is peeled off from a part or all of the workpiece W' (Fig. 4(e)). Since the adhesive layer 2 has a plurality of concave portions 3, since a plurality of spaces C are formed, the expansion portion is increased, and as a result, the chance of peeling is increased, which is preferable. Further, the adhesive layer 2 may be either rigid or soft. When the adhesive layer 2 is relatively hard, as shown in Fig. 4(d), in the state where the deformation of the space C and the adhesive layer 2 is hardly observed, the peeling of the interface between the adhesive layer 2 and the workpiece W' is Gradually proceed from the space C side. It is considered that this is because the pressure generated by the expansion of the gas is easily concentrated in the weaker portion, that is, the adhesive layer 2 and the workpiece W, in the inner wall of the space C composed of the adhesive layer 2 and the workpiece W'. 'The reason for the interface. On the other hand, when the adhesive layer 2 is relatively soft, after the space C and the adhesive layer 2 are longitudinally deformed, as shown in Fig. 4(e), the adhesive layer 2 and the workpiece W' are peeled off. In this manner, the adhesion of the adhesive layer 2 to the workpiece W' is lowered. Thereby, the adhesive sheet 1 and the workpiece W' can be easily peeled off. Here, the adhesive sheet 1 and the workpiece W' can be directly peeled off in the state of FIG. 4(e), for example, the workpiece W' is placed on the upper side of the adhesive sheet 1 and placed in the processing chamber to be decompressed. At the time of reversing the workpiece W' and the adhesive sheet by 180° in the treatment chamber after the pressure reduction, the adhesive sheet 1 and the workpiece W' can be peeled off by the weight of the workpiece W'.

又,形成黏著劑層2之黏著劑組成物具有活性能量線硬化性或熱硬化性時,前述的加工步驟之後,是以在減壓處理之前或後,藉由活性能量線照射或加熱來使黏著劑層2硬化為佳。在此,在減壓處理之前使黏著劑層2硬化時,因為黏著劑層2在減壓處理階段變成較硬質,所以如前述,空間C及黏著劑層2幾乎不產生變形,在黏著劑層2與加工物W’的界面之剝離從空間C側起開始進行且能夠使黏著劑層2與加工物W’之黏著力降低。另一方面,在減壓處理之後使黏著劑層2硬化時,因為黏著劑層2在減壓處理的階段為較軟質,所以藉由使空間C及黏著劑層2變形(第4圖(d))之後,使黏著劑層2硬化時,能夠使黏著力更降低,黏著劑層2與加工物W’變成容易剝離。 又,在本說明書,所謂黏著劑的「硬化」,是指使被黏著物(工件W、加工物W’)黏貼在黏著片1之後所進行的反應。因此,能夠與例如前述所謂黏著劑的「交聯」有明確地區別。Further, when the adhesive composition forming the adhesive layer 2 has active energy ray hardening property or thermosetting property, the above-described processing step is performed by irradiation or heating with active energy rays before or after the pressure reduction treatment. It is preferred that the adhesive layer 2 is hardened. Here, when the adhesive layer 2 is hardened before the pressure reduction treatment, since the adhesive layer 2 becomes relatively hard at the time of the pressure reduction treatment, as described above, the space C and the adhesive layer 2 hardly deform, in the adhesive layer. The peeling of the interface with the workpiece W' is started from the space C side, and the adhesion between the adhesive layer 2 and the workpiece W' can be lowered. On the other hand, when the adhesive layer 2 is hardened after the pressure reduction treatment, since the adhesive layer 2 is soft at the stage of the reduced pressure treatment, the space C and the adhesive layer 2 are deformed (Fig. 4 (d) After the adhesive layer 2 is cured, the adhesive force can be further lowered, and the adhesive layer 2 and the workpiece W' can be easily peeled off. In the present specification, the term "hardening" of the adhesive refers to a reaction performed after the adherend (the workpiece W and the workpiece W') is adhered to the adhesive sheet 1. Therefore, it is possible to clearly distinguish from "crosslinking" of the above-mentioned so-called adhesive.

黏著劑組成物具有活性能量線硬化性時,作為用以使黏著劑組成物硬化之活性能量線,可舉出電離放射線,亦即紫外線、X射線、電子射線等。該等中,尤其是以較容易導入照射設備之紫外線為佳。When the adhesive composition has active energy ray curability, the active energy ray for curing the adhesive composition includes ionizing radiation, that is, ultraviolet rays, X-rays, and electron beams. Among these, it is particularly preferable to use ultraviolet rays which are relatively easy to introduce into the irradiation apparatus.

使用紫外線作為電離放射線時,從操作容易性而言,以使用含有波長200~380nm左右的紫外線之近紫外線即可。光量是按照活性能量線硬化性黏著劑組成物所具有之活性能量線硬化性基的種類和黏著劑層2的厚度而適當地選擇即可,通常為50~1500mJ/cm2 左右,以200~1000mJ/cm2 為佳,以300~800mJ/cm2 為較佳。又,紫外線照度通常50~1500mW/cm2 左右,以200~1000mW/cm2 為佳,以300~800mW/cm2 為較佳。作為紫外線源,沒有特別限制,例如能夠使用無電極燈、高壓水銀燈、鹵化金屬燈、UV-LED等。When ultraviolet rays are used as the ionizing radiation, it is sufficient to use near-ultraviolet rays containing ultraviolet rays having a wavelength of about 200 to 380 nm in terms of ease of handling. The amount of light may be appropriately selected according to the type of active energy ray-curable group of the active energy ray-curable adhesive composition and the thickness of the adhesive layer 2, and is usually about 50 to 1500 mJ/cm 2 and 200 Å. It is preferably 1000 mJ/cm 2 and preferably 300 to 800 mJ/cm 2 . Further, the intensity of ultraviolet generally 50 ~ 1500mW / cm 2, and at 200 ~ 1000mW / cm 2 preferably, to 300 ~ 800mW / cm 2 is preferred. The ultraviolet light source is not particularly limited, and for example, an electrodeless lamp, a high pressure mercury lamp, a halogenated metal lamp, a UV-LED, or the like can be used.

使用電子射線作為電離放射線時,針對其加速電壓,是按照活性能量線硬化性黏著劑組成物所具有的活性能量線硬化性基種類和黏著劑層2的厚度而適當選定即可,通常加速電壓以10~1000kV左右為佳。又,照射線量設定在活性能量線硬化性黏著劑組成物適當地硬化之範圍即可,通常在10~1000krad的範圍選定。作為電子射線源,沒有特別限制,例如能夠使用科克羅夫特-瓦耳頓(Cockroft-Walton)型、范德格拉夫(Vande Graaff)型、共振變壓器型、絕緣芯變壓器型、或直線型、高頻高壓電子加速器(dynamitron)、高頻型等的各種電子射線加速器。When an electron beam is used as the ionizing radiation, the acceleration voltage is appropriately selected according to the active energy ray-curable group type of the active energy ray-curable adhesive composition and the thickness of the adhesive layer 2, and the acceleration voltage is usually used. It is preferably about 10~1000kV. Further, the irradiation amount is set to a range in which the active energy ray-curable adhesive composition is appropriately cured, and is usually selected in the range of 10 to 1000 krad. The electron beam source is not particularly limited, and for example, a Cockroft-Walton type, a Vande Graaff type, a resonant transformer type, an insulated core transformer type, or a linear type can be used. Various electron ray accelerators such as high-frequency high-voltage electron accelerators (dynamitrons) and high-frequency type.

從使黏著劑組成物有效地硬化的觀點而言,該等活性能量線以從黏著片1之與黏著面P(黏貼有加工物W’之面)為相反的面側照射為佳。From the viewpoint of effectively curing the adhesive composition, it is preferable that the active energy rays are irradiated from the side opposite to the adhesive surface P (the surface to which the workpiece W' is adhered).

另一方面,黏著劑組成物具有熱硬化性時,作為用以使黏著劑組成物硬化之加熱手段,例如能夠採用加熱板、熱風乾燥機、近紅外線燈等適當的手段。加熱條件是黏著劑層2的熱硬化所需要的加熱溫度,能夠依照所需要的剝離性、工件W和加工物W’等的耐熱性、加熱手段等而適當地設定。作為通常的加熱條件,例如使用加熱板時,可例示溫度80~250℃、加熱時間5秒~60秒鐘等。On the other hand, when the adhesive composition has thermosetting properties, as a heating means for curing the adhesive composition, for example, a suitable means such as a hot plate, a hot air dryer, or a near-infrared lamp can be used. The heating condition is a heating temperature required for thermal curing of the adhesive layer 2, and can be appropriately set in accordance with the required peeling property, heat resistance of the workpiece W and the workpiece W', heating means, and the like. As a general heating condition, for example, when a hot plate is used, a temperature of 80 to 250 ° C, a heating time of 5 seconds to 60 seconds, and the like can be exemplified.

依照以上敘述之本實施形態之黏著片的剝離方法,黏著片1的黏著劑層2在黏著面P具有之凹部3、與被黏著物(工件W、加工物W’)之間形成空間C,藉由使此種空間C中的氣體膨脹之減壓處理,使黏著片1對被黏著物的黏著力降低。使用此種方法時,藉由利用減壓處理使氣體膨脹之新穎的作用機制,能夠在所需要的時序使黏著力降低,藉此能夠使黏著片與被黏著物容易地剝離。According to the peeling method of the adhesive sheet of the embodiment described above, the adhesive layer 2 of the adhesive sheet 1 forms a space C between the concave portion 3 of the adhesive surface P and the adherend (the workpiece W and the workpiece W'). By the pressure reduction treatment of expanding the gas in the space C, the adhesion of the adhesive sheet 1 to the adherend is lowered. When such a method is used, the adhesive action can be reduced at a desired timing by a novel action mechanism for expanding the gas by the pressure reduction treatment, whereby the adhesive sheet and the adherend can be easily peeled off.

在此,只有利用活性能量線硬化性或熱硬化性而使黏著劑層2的黏著力降低時,為了使硬化反應(亦即化學反應)充分地進行,材料選擇被限定。但是,依照本實施形態,因為藉由利用減壓處理所產生的氣體膨脹而能夠使黏著力降低,可完全不利用活性能量線硬化性或熱硬化性、或部分利用即可,因此能夠使構成黏著劑層2之材料的自由度成為較大。又,利用熱硬化性而使黏著劑層2的黏著力降低時,在工件W的加工步驟之中包含加熱步驟時,有黏著劑層2的黏著力降低致使加工步驟中無法充分地進行工件W的暫時固定之虞,但是在本實施形態,因為完全不利用熱硬化性、或僅部分利用即可,所以即便在工件W的加工步驟之中包含加熱步驟時,亦能夠充分地將工件W暫時固定。Here, when the adhesive strength of the adhesive layer 2 is lowered by the active energy ray hardening property or the thermosetting property, the material selection is limited in order to sufficiently perform the curing reaction (that is, the chemical reaction). However, according to the present embodiment, the adhesive force can be reduced by the expansion of the gas generated by the pressure reduction treatment, and the active energy ray hardenability or the thermosetting property or the partial use can be eliminated at all. The degree of freedom of the material of the adhesive layer 2 becomes large. Moreover, when the adhesive force of the adhesive layer 2 is lowered by thermosetting property, when the heating step is included in the processing step of the workpiece W, the adhesive force of the adhesive layer 2 is lowered, so that the workpiece W cannot be sufficiently performed in the processing step. Although it is temporarily fixed, in the present embodiment, since the thermosetting property is not used at all or only partially used, even when the heating step is included in the processing step of the workpiece W, the workpiece W can be sufficiently temporarily fixed.

以上已說明的實施形態,是為了容易理解本發明而記載,不是為了限定本發明而記載。因而,在上述實施形態已揭示的各要素,亦包含屬於本發明的技術範圍之全部的設計變更、均等物及均等方法之宗旨。The embodiments described above are described in order to facilitate the understanding of the present invention and are not intended to limit the present invention. Therefore, the respective elements disclosed in the above embodiments are intended to include all design changes, equivalents, and equal methods of the technical scope of the present invention.

例如,在上述黏著片1之基材4與黏著劑層2之間亦可介在其他層。For example, the substrate 4 of the adhesive sheet 1 and the adhesive layer 2 may be interposed between other layers.

又,在另外實施形態,黏著片亦可為不具備基材,而只有由黏著劑層所構成之兩面黏著片。例如,在其他一實施形態中,能夠是一種將具有第1黏著面及第2黏著面之兩面黏著片、與被黏貼在第1黏著面之第1被黏著物剝離之方法。在第2黏著面,例如亦可黏貼有第2被黏著物。此時,是與前述實施形態同樣地,在第1黏著面形成有凹部,且第1被黏著物是以由如此的凹部產生獨立的空間之方式被黏貼在黏著劑層。藉由對如此的第1被黏著物及黏著片(以及第2被黏著物)進行減壓處理,空間中的氣體膨脹且兩面黏著片對第1被黏著物之黏著力降低,而能夠使第1被黏著物與黏著片剝離。 [實施例]Further, in another embodiment, the adhesive sheet may be a double-sided adhesive sheet which is not provided with a substrate but has only an adhesive layer. For example, in another embodiment, a method of peeling off the first adherends having the first adhesive surface and the second adhesive surface and peeling off the first adherend adhered to the first adhesive surface can be used. On the second adhesive surface, for example, a second adherend may be adhered. At this time, similarly to the above-described embodiment, the first adhesive surface is formed with a concave portion, and the first adherend is adhered to the adhesive layer so that an independent space is formed by such a concave portion. By decompressing the first adherend and the adhesive sheet (and the second adherend), the gas in the space expands, and the adhesion of the double-sided adhesive sheet to the first adherend is lowered, thereby enabling the first 1 The adhesive is peeled off from the adhesive sheet. [Examples]

以下,藉由實施例等而進一步具體地說明本發明,但是本發明範圍不被該等實施例等限定。Hereinafter, the present invention will be specifically described by way of examples, but the scope of the invention is not limited by the examples and the like.

[實施例1] (a)剝離片的製造 聚對苯二甲酸乙二酯膜(TORAY股份公司製、製品名「Lumirror」、厚度75μm),以成為第5圖(a)的花紋之方式施行壓花加工而得到壓花膜(1)。對壓花膜(1)的壓花加工面,使用繞線棒將與剝離片(LINTEC股份公司製、製品名「SP-PET381130」)的剝離劑相同組成的剝離劑作為剝離劑,以乾燥後的厚度成為0.1μm之方式塗布且使其在130℃乾燥30秒鐘,來製造在表面具有壓花圖案之剝離片(1)。[Example 1] (a) Production of a release sheet A polyethylene terephthalate film (manufactured by TORAY Co., Ltd., product name "Lumirror", thickness: 75 μm) was used as the pattern of Fig. 5 (a). An embossed film (1) is obtained by embossing. In the embossed surface of the embossed film (1), a release agent having the same composition as the release agent of the release sheet (manufactured by LINTEC Co., Ltd., product name "SP-PET381130") is used as a release agent, and after drying, The thickness was 0.1 μm, and it was dried at 130 ° C for 30 seconds to produce a release sheet (1) having an embossed pattern on the surface.

(b)黏著劑的調製 將丙烯酸正丁酯52質量份、甲基丙烯酸甲酯20質量份及丙烯酸2-羥基乙酯28質量份共聚合而成之(甲基)丙烯酸酯共聚物(相對於(甲基)丙烯酸酯共聚物的羥基100當量,添加90當量的甲基丙烯醯氧乙基異氰酸酯(Methacryloyloxyethyl isocyanate;MOI)而反應,重量平均分子量為58萬,固體成分濃度為35質量%)100質量份(固體成分質量份)、能量線硬化型胺甲酸乙酯丙烯酸酯系寡聚物(日本合成化學工業股份公司製,製品名「紫光UV-6100B」,質量平均分子量6700,玻璃轉移溫度0℃)100質量份(固體成分)、異氰酸酯系交聯劑(TOSOH股份公司製、製品名「CORONATE L」,固體成分濃度75質量%)0.4質量份(固體成分質量份)、及作為光聚合起始劑之1-羥基-環己基-苯基-酮(BASF公司製,製品名「IRGACURE 184」)3.0質量份混合而調製能量線硬化型黏著劑。(b) Preparation of an adhesive A (meth) acrylate copolymer obtained by copolymerizing 52 parts by mass of n-butyl acrylate, 20 parts by mass of methyl methacrylate and 28 parts by mass of 2-hydroxyethyl acrylate (relative to The (meth) acrylate copolymer has a hydroxyl group of 100 equivalents, and is reacted by adding 90 equivalents of methacryloyloxyethyl isocyanate (MOI), and has a weight average molecular weight of 580,000 and a solid content concentration of 35 mass%) 100. Parts by mass (solid content by mass), energy ray-hardening urethane acrylate oligomer (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., product name "Purple UV-6100B", mass average molecular weight 6700, glass transition temperature 0 °C) 100 parts by mass (solid content), isocyanate-based crosslinking agent (manufactured by TOSOH Co., Ltd., product name "CORONATE L", solid content concentration: 75 mass%) 0.4 parts by mass (solid content parts by mass), and as photopolymerization The energy ray-curable adhesive was prepared by mixing 3.0 parts by mass of a 1-hydroxy-cyclohexyl-phenyl-ketone (manufactured by BASF Corporation, product name "IRGACURE 184").

在此,聚苯乙烯換算重量平均分子量是使用凝膠滲透層析儀裝置(TOSOH股份公司製、製品名「HLC-8020」),在下述條件下所測定(GPC測定)的標準聚苯乙烯換算值。Here, the polystyrene-equivalent weight average molecular weight is a standard polystyrene conversion measured by a gel permeation chromatography apparatus (product name "HLC-8020" manufactured by TOSOH Co., Ltd.) under the following conditions (GPC measurement). value.

<GPC測定條件> ‧管柱:將「TSK guard column HXL-L」、「TSK gel G2500HXL」、「TSK gel G2000HXL」、「TSK gel G1000HXL」(任一者均為TOSOH股份公司製)依次連結而成之物 ‧管柱溫度:40℃ ‧展開溶劑:四氫呋喃 ‧流速:1.0mL/min ‧檢測器:差示折射計 ‧標準試料:聚苯乙烯<GPC measurement conditions> ‧ Pipe column: "TSK guard column HXL-L", "TSK gel G2500HXL", "TSK gel G2000HXL", and "TSK gel G1000HXL" (all of which are manufactured by TOSOH Co., Ltd.) are sequentially connected. Into the material column temperature: 40 ° C ‧ development solvent: tetrahydrofuran ‧ flow rate: 1.0mL / min ‧ detector: differential refractometer ‧ standard sample: polystyrene

(c)黏著片的製造 在上述(a)所製造的剝離片之剝離處理面,將上述(b)所調製的能量線硬化型黏著劑,以乾燥後的厚度為從壓花的頂點起算25μm的方式使用刮刀塗布器塗布,且在110℃使其乾燥2分鐘而形成黏著劑層。將作為基材的聚對苯二甲酸乙二酯膜(三菱樹脂股份公司製、製品名「Diafoil」、厚度50μm)貼合在所得到的黏著劑層,隨後,在23℃、相對濕度50的條件下風乾7天而將其作為黏著片。(c) Production of Adhesive Sheet The thickness of the energy ray-curable adhesive prepared in the above (b) is 50 μm from the apex of the embossing on the peeling-treated surface of the release sheet produced in the above (a). The coating was applied using a knife coater and dried at 110 ° C for 2 minutes to form an adhesive layer. A polyethylene terephthalate film (manufactured by Mitsubishi Plastics Co., Ltd., product name "Diafoil", thickness: 50 μm) as a substrate was bonded to the obtained adhesive layer, followed by a relative humidity of 50 at 23 ° C. It was air-dried for 7 days under conditions and used as an adhesive sheet.

[實施例2] 對聚對苯二甲酸乙二酯膜(TORAY股份公司製,製品名「Lumirror」,厚度75μm),以成為第6圖(a)的花紋之方式施行壓花加工而得到壓花膜(2)。將與剝離片(LINTEC股份公司製、製品名「SP-PET381130」)的剝離劑相同組成的剝離劑作為剝離劑,以乾燥後的厚度成為0.1μm的方式使用繞線棒塗布在壓花膜(2)的壓花加工面,在130℃使其乾燥30秒鐘來製造在表面具有壓花圖案之剝離片(2)。 除了使用所得到的剝離片(2)以外,與實施例1同樣地進行而製造黏著片。[Example 2] A polyethylene terephthalate film (product name "Lumirror", manufactured by TORAY Co., Ltd., thickness: 75 μm) was subjected to embossing to obtain a pattern as shown in Fig. 6 (a). Floral membrane (2). A release agent having the same composition as that of the release agent of the release sheet (manufactured by LINTEC Co., Ltd., product name "SP-PET381130") was used as a release agent, and the embossed film was applied by a wire bar so that the thickness after drying became 0.1 μm. The embossed surface of 2) was dried at 130 ° C for 30 seconds to produce a release sheet (2) having an embossed pattern on the surface. An adhesive sheet was produced in the same manner as in Example 1 except that the obtained release sheet (2) was used.

[實施例3] 對聚對苯二甲酸乙二酯膜(TORAY股份公司製、製品名「Lumirror」、厚度75μm),以成為第7圖(a)的花紋之方式施行壓花加工而得到壓花膜(3)。將與剝離片(LINTEC股份公司製、製品名「SP-PET381130」)的剝離劑相同組成的剝離劑作為剝離劑,以乾燥後的厚度成為0.1μm的方式使用繞線棒塗布在壓花膜(3)的壓花加工面,在130℃使其乾燥30秒鐘來製造在表面具有壓花圖案之剝離片(3)。 除了使用所得到的剝離片(3)以外,與實施例1同樣地進行而製造黏著片。[Example 3] A polyethylene terephthalate film (manufactured by TORAY Co., Ltd., product name "Lumirror", thickness: 75 μm) was subjected to embossing to obtain a pattern as shown in Fig. 7 (a). Floral membrane (3). A release agent having the same composition as that of the release agent of the release sheet (manufactured by LINTEC Co., Ltd., product name "SP-PET381130") was used as a release agent, and the embossed film was applied by a wire bar so that the thickness after drying became 0.1 μm. The embossed surface of 3) was dried at 130 ° C for 30 seconds to produce a release sheet (3) having an embossed pattern on the surface. An adhesive sheet was produced in the same manner as in Example 1 except that the obtained release sheet (3) was used.

<壓花面的凸部面積率之測定> 將各實施例所使用的剝離片之壓花面(具有壓花圖案之剝離處理面),使用數位顯微鏡(倍率20~50倍)從上面於垂直方向拍攝任意地選擇的範圍來取得影像。 又,更具體地,在該拍攝時是從垂直方向藉由目視對準相當於接著面之側(非凸部)的焦點而拍攝。 而且,在所取得的影像,將被預定長方形包圍之區域T任意地選擇1區域且將其設為「區域T的影像」。在此,在區域T的選擇,考慮壓花圖案的認識容易性及規則性而各自選擇剝離片(1)為縱4mm×橫5mm,剝離片(2)為縱8mm×橫10mm,剝離片(3)為縱2mm×橫2.5mm。 又,數位顯微鏡的拍攝條件如以下。<Measurement of the area ratio of the convex portion of the embossed surface> The embossed surface (the peeled surface having the embossed pattern) of the release sheet used in each of the examples was vertically oriented from the top using a digital microscope (magnification: 20 to 50 times). The direction is taken to an arbitrarily selected range to obtain an image. Further, more specifically, at the time of the photographing, the photographing is performed by visually aligning the focus corresponding to the side (non-convex portion) of the succeeding surface from the vertical direction. Further, in the acquired image, one region is arbitrarily selected in a region T surrounded by a predetermined rectangle, and this is referred to as "image of region T". Here, in the selection of the region T, the peeling sheet (1) is selected to be 4 mm in length × 5 mm in width, and the peeling sheet (2) is 8 mm in length × 10 mm in width, and the peeling sheet is selected in consideration of ease of recognition and regularity of the embossed pattern. 3) is 2 mm in length × 2.5 mm in width. Moreover, the shooting conditions of the digital microscope are as follows.

(測定機器) 股份公司KEYENCE製、製品名「數位顯微鏡VHX-5000」、高解像度可變焦距透鏡VHX-ZST100倍 (測定條件) 拍攝方式:HDR拍攝 邊緣強調:OFF(measurement machine) KEYENCE system, product name "digital microscope VHX-5000", high resolution variable focus lens VHX-ZST100 times (measurement conditions) Recording mode: HDR shooting Edge emphasis: OFF

其次,基於所取得的「區域T的影像」,使用與上述相同的數位顯微鏡而進行自動面積計量,得到在區域T所存在的各凸部之面積。 在自動面積計量,首先藉由使用數位顯微鏡之影像處理,來進行在區域T內所存在的凸部之邊界的劃定及進行二值化而取得二值化影像。又,在數位顯微鏡的影像處理無法劃定凸部的邊界之情況,邊對照上述「區域T的影像」邊藉由人工輸入而劃定凸部的邊界來取得二值化影像。其次,進行計量所得到的二值化影像數值(面積)且測定全部凸部的合計面積。 隨後,基於下述式而算出凸部面積率。將測定結果顯示在表1。 凸部面積率=[在區域T之凸部面積/區域T的總面積]×100 又,將針對實施例1~3的剝離片之壓花面而得到的二值化影像各自顯示在第5圖(b)、第6圖(b)、及第7圖(b)。Next, based on the acquired "image of the region T", the automatic area measurement is performed using the same digital microscope as described above, and the area of each convex portion existing in the region T is obtained. In the automatic area measurement, first, by using image processing by a digital microscope, the boundary of the convex portion existing in the region T is demarcated and binarized to obtain a binarized image. Further, in the case where the image processing of the digital microscope cannot determine the boundary of the convex portion, the binarized image is obtained by dividing the boundary of the convex portion by manual input while referring to the "image of the region T". Next, the binarized image value (area) obtained by the measurement was measured, and the total area of all the convex portions was measured. Subsequently, the convex portion area ratio was calculated based on the following formula. The measurement results are shown in Table 1. The area ratio of the convex portion = [the area of the convex portion in the region T / the total area of the region T] × 100, and the binarized images obtained for the embossed surfaces of the peeling sheets of Examples 1 to 3 are each displayed in the fifth Figure (b), Figure 6 (b), and Figure 7 (b).

<黏著面的凹部面積率之測定> 將在各實施例所得到的黏著片的黏著面貼合在玻璃板(Corning股份公司製、製品名「EAGLE XG」),將接著面隔著玻璃板且使用數位顯微鏡(倍率20~50倍),從上面於垂直方向拍攝黏著面上任意地選擇的範圍而取得影像。將所得到的影像顯示在第8圖(a)、第9圖(a)、及第10圖(a)。 又,更具體地,在該拍攝時是從垂直方向藉由目視從判斷為非凹部之部位的上方起依照順序移動焦點且將開始具有焦點的部分設為非凹部而拍攝。 而且,在所取得的連結影像,將被縱6mm×橫8mm的長方形包圍之區域D任意地選擇1區域且將其設為「區域D的影像」。 又,數位顯微鏡的拍攝條件如以下。<Measurement of the area ratio of the concave portion of the adhesive surface> The adhesive surface of the adhesive sheet obtained in each of the examples was bonded to a glass plate (manufactured by Corning Co., Ltd., product name "EAGLE XG"), and the glass substrate was placed on the surface. Using a digital microscope (20 to 50 times magnification), an image is obtained by photographing an arbitrarily selected range from the upper side in the vertical direction. The obtained images are shown in Fig. 8(a), Fig. 9(a), and Fig. 10(a). Further, in the case of the photographing, the focus is moved from the upper side of the portion determined to be the non-recessed portion by the visual direction from the vertical direction, and the portion having the focus is started as the non-recessed portion. In the obtained connected image, one region is arbitrarily selected from the region D surrounded by a rectangle of 6 mm in length and 8 mm in width, and this is referred to as "image of region D". Moreover, the shooting conditions of the digital microscope are as follows.

(測定機器) 股份公司KEYENCE製、製品名「數位顯微鏡VHX-5000」、高解像度可變焦距透鏡VHX-ZST100倍 (測定條件) ‧垂直照明式照明:ON ‧載物台透射照明:OFF ‧照明變換:同軸垂直照明式 ‧邊緣強調:OFF(measurement machine) KEYENCE system, product name "digital microscope VHX-5000", high resolution variable focal length lens VHX-ZST100 times (measurement conditions) ‧ vertical illumination type illumination: ON ‧ stage transmission illumination: OFF ‧ illumination Transformation: coaxial vertical illumination ‧ edge emphasis: OFF

其次,基於所取得的「區域D的影像」,使用與上述相同的數位顯微鏡而進行自動面積計量,來得到在區域D所存在的各凹部之面積。 在自動面積計量,是首先藉由使用數位顯微鏡之影像處理,來進行在區域D所存在的凹部之邊界的劃定及進行二值化而取得二值化影像。又,在數位顯微鏡的影像處理無法劃定凹部的邊界之情況,是邊對照上述「區域D的影像」邊藉由人工輸入而劃定凹部的邊界來取得二值化影像。其次,進行計量所得到的二值化影像數值(面積)且測定全部凹部的合計面積。 隨後,基於下述式而算出凹部面積率。將測定結果顯示在表1。 凹部面積率=[在區域D之凹部面積/區域D的總面積]×100 又,將針對實施例1~3的黏著片之黏著面而得到的二值化影像各自顯示在第8圖(b)、第9圖(b)、及第10圖(b)。Next, based on the acquired "image of the region D", the automatic area measurement is performed using the same digital microscope as described above, and the area of each concave portion existing in the region D is obtained. In the automatic area measurement, first, by using image processing by a digital microscope, the boundary of the concave portion existing in the region D is demarcated and binarized to obtain a binarized image. Further, in the case where the image processing of the digital microscope cannot define the boundary of the concave portion, the binarized image is obtained by dividing the boundary of the concave portion by manual input while referring to the "image of the region D". Next, the binarized image value (area) obtained by the measurement was measured, and the total area of all the concave portions was measured. Subsequently, the recess area ratio was calculated based on the following formula. The measurement results are shown in Table 1. The area ratio of the concave portion = [the area of the concave portion in the region D / the total area of the region D] × 100. The binarized images obtained for the adhesive faces of the adhesive sheets of Examples 1 to 3 are each shown in Fig. 8 (b). ), Figure 9 (b), and Figure 10 (b).

<黏著力(UV照射前)的測定> 將各實施例所得到的黏著片切斷成為縱25mm×橫300mm的大小之後,在23℃、50%RH(相對濕度)的環境下,貼附在玻璃板(日本板硝子股份公司製、鈉鈣玻璃、縱150mm×橫70mm×厚度2mm)且在相同環境下靜置24小時。靜置後,依據JIS Z0237:2000且使用180°剝離法在拉伸速度300mm/分鐘測定各黏著片的黏著力。將測定結果顯示在表1。<Adhesion force (before UV irradiation)> The adhesive sheet obtained in each Example was cut into a size of 25 mm in length × 300 mm in width, and then attached to the environment at 23° C. and 50% RH (relative humidity). A glass plate (manufactured by Nippon Sheet Glass Co., Ltd., soda lime glass, 150 mm in length × 70 mm in width × 2 mm in thickness) was allowed to stand in the same environment for 24 hours. After standing, the adhesion of each of the adhesive sheets was measured in accordance with JIS Z0237:2000 and using a 180° peeling method at a stretching speed of 300 mm/min. The measurement results are shown in Table 1.

<黏著力(UV照射後)的測定> 將各實施例所得到的黏著片切斷成為縱25mm×橫300mm的大小之後,在23℃、50%RH(相對濕度)的環境下,貼附在玻璃板(日本板硝子股份公司製、鈉鈣玻璃、縱150mm×橫70mm×厚度2mm)且在相同環境下靜置24小時。隨後,在石英玻璃製的處理室中靜置,使用照射紫外線照射裝置(Hearaus公司製、製品名「Light Hammer 10MARK II」、無電極燈),從石英玻璃上2cm的照射距離照射紫外線之後,將黏著片及玻璃板從處理室取出,依據JIS Z0237:2000且使用180°剝離法在拉伸速度300mm/分鐘測定各黏著片的黏著力。將測定結果顯示在表1。 紫外線照射條件是設為在波長200~380nm的範圍、照度700mW/cm2 、光量700mJ/cm2 ,該照度及光量是使用照度‧光量計(EIT公司製、製品名「UV Power Puck II」)而測定照度及光量。<Adhesion (after UV irradiation)> The adhesive sheet obtained in each example was cut into a size of 25 mm in length × 300 mm in width, and then attached to the environment at 23° C. and 50% RH (relative humidity). A glass plate (manufactured by Nippon Sheet Glass Co., Ltd., soda lime glass, 150 mm in length × 70 mm in width × 2 mm in thickness) was allowed to stand in the same environment for 24 hours. Then, it was allowed to stand in a processing chamber made of quartz glass, and irradiated with ultraviolet rays by a irradiation ultraviolet ray irradiation device (product name "Light Hammer 10MARK II", an electrodeless lamp, manufactured by Hearaus Co., Ltd.), and then irradiated with ultraviolet rays from a distance of 2 cm on the quartz glass. The adhesive sheet and the glass plate were taken out from the processing chamber, and the adhesion of each of the adhesive sheets was measured in accordance with JIS Z0237:2000 using a 180° peeling method at a stretching speed of 300 mm/min. The measurement results are shown in Table 1. The ultraviolet irradiation conditions are in the range of 200 to 380 nm, the illuminance is 700 mW/cm 2 , and the amount of light is 700 mJ/cm 2 . The illuminance and the amount of light are measured by using an illuminance meter (product name "UV Power Puck II" manufactured by EIT Co., Ltd.). The illuminance and the amount of light are measured.

<黏著力(UV照射以及減壓後)的測定> 將各實施例所得到的黏著片切斷成為縱25mm×橫300mm的大小之後,在23℃、50%RH(相對濕度)的環境下,貼附在玻璃板(日本板硝子股份公司製、鈉鈣玻璃、縱向150mm×橫向70mm×厚度2mm)且在相同環境下靜置24小時。靜置後,在石英玻璃製的處理室中且使用照射紫外線照射裝置(Hearaus公司製、製品名「Light Hammer 10MARK II」、無電極燈)從石英玻璃上在2cm的照射距離照射紫外線照射後,採用使用軟管與處理室連接而成之減壓器,減壓至處理室內的環境壓力成為2kPa為止且保持10秒鐘後,將減壓狀態釋放且將黏著片及玻璃板從處理室取出,依據JIS Z0237:2000且使用180°剝離法在拉伸速度300mm/分鐘測定各黏著片的黏著力。將測定結果顯示在表1。 紫外線照射條件是設為與<黏著力(UV照射後)的測定>同樣的條件。<Measurement of adhesion (after UV irradiation and after decompression)> The adhesive sheets obtained in the respective examples were cut into a size of 25 mm in length × 300 mm in width, and then in an environment of 23° C. and 50% RH (relative humidity). It was attached to a glass plate (manufactured by Nippon Sheet Glass Co., Ltd., soda lime glass, 150 mm in length × 70 mm in width × 2 mm in thickness) and allowed to stand in the same environment for 24 hours. After standing, it was irradiated with ultraviolet light from a quartz glass in a processing chamber made of quartz glass and irradiated with ultraviolet light at a distance of 2 cm from a quartz glass using an ultraviolet irradiation apparatus (manufactured by Hearaus Co., Ltd., product name "Light Hammer 10MARK II", an electrodeless lamp). The pressure reducer connected to the processing chamber by using a hose is depressurized until the ambient pressure in the processing chamber becomes 2 kPa and is maintained for 10 seconds, and then the pressure-reduced state is released and the adhesive sheet and the glass plate are taken out from the processing chamber. The adhesion of each of the adhesive sheets was measured in accordance with JIS Z0237:2000 at a tensile speed of 300 mm/min using a 180° peeling method. The measurement results are shown in Table 1. The ultraviolet irradiation conditions were set to the same conditions as those of <adhesion force (after UV irradiation)>.

<黏著力減少率> 依照下述式算出黏著力減少率。將結果顯示在表1。 黏著力減少率(%)=(UV照射後黏著力-減壓後黏著力)/(UV照射後黏著力)×100<Adhesion reduction rate> The adhesion reduction rate was calculated according to the following formula. The results are shown in Table 1. Adhesion reduction rate (%) = (adhesion after UV irradiation - adhesion after decompression) / (adhesion after UV irradiation) × 100

<應力緩和率> 在各實施例,除了將壓花膜變更成為重剝離片(LINTEC股份公司製、製品名「SP-PET382050」、厚度38μm、塗布有聚矽氧系剝離劑之聚對苯二甲酸乙二酯膜),而且將基材變更成為輕剝離片(LINTEC股份公司製、製品名「SP-PET381031」、厚度38μm、塗布有聚矽氧系剝離劑之聚對苯二甲酸乙二酯膜),且以乾燥後的黏著劑層厚度成為50μm的方式塗布以外,依照如實施例記載的程序,製造被2片剝離片挾持之無基材的兩面黏著片。 將無基材的兩面黏著片在23℃、50%RH的環境下放置2星期,使用照射紫外線照射裝置(Hearaus公司製、製品名「Light Hammer 10MARK II」、無電極燈)而照射紫外線。 紫外線照射條件,是設為在波長200~380nm的範圍、照度700mW/cm2 、光量700mJ/cm2 ,該照度及光量是使用照度‧光量計(EIT公司製、製品名「UV Power Puck II」)而測定照度及光量。<stress relaxation rate> In each of the examples, the embossed film was changed to a heavy release sheet (manufactured by LINTEC Co., Ltd., product name "SP-PET382050", thickness 38 μm, and poly(p-phenylene) coated with a polyoxynitride-based release agent. The ethylene glycol formate film was changed to a light release sheet (manufactured by LINTEC Co., Ltd., product name "SP-PET381031", 38 μm thick, polyethylene terephthalate coated with a polyoxynitride-based release agent). A film-free double-sided adhesive sheet held by two release sheets was produced in accordance with the procedure described in the examples, except that the thickness of the adhesive layer after drying was 50 μm. The non-substrate double-sided adhesive sheet was allowed to stand in an environment of 23° C. and 50% RH for 2 weeks, and irradiated with ultraviolet rays using an ultraviolet irradiation apparatus (manufactured by Hearaus Co., Ltd., product name “Light Hammer 10MARK II”, an electrodeless lamp). The ultraviolet irradiation conditions are in the range of 200 to 380 nm, the illuminance is 700 mW/cm 2 , and the amount of light is 700 mJ/cm 2 . The illuminance and the amount of light are measured using an illuminance meter (product name "UV Power Puck II" manufactured by EIT Corporation. ) and measure the illuminance and amount of light.

隨後,從層積有複數層上述黏著劑層之黏著片切取15mm寬度×120mm長度的試樣,而且將被層積在積層體的最表層之剝離片剝下且以試樣測定範圍成為15mm寬度×100mm長度之方式將試樣安裝在萬能拉伸試驗機(股份公司島津製作所製、AUTOGRAPH AG-10kNIS)。而且,在23℃、50%RH(相對濕度)的環境下,以拉伸速度200mm/分鐘使試樣伸長來測定10%伸長時的應力A(Pa)及從伸長停止起算300秒後的應力B(Pa)。測定只有在MD方向亦即與黏著劑的塗布方向平行之方向測定。從所測定的應力A及應力B且使用以下的式算出應力緩和率(%)。將測定結果顯示在表1。 應力緩和率(%)={(A-B)/A}×100(%)Subsequently, a sample having a length of 15 mm width × 120 mm was cut out from an adhesive sheet in which a plurality of layers of the above-mentioned adhesive layer were laminated, and the peeling sheet laminated on the outermost layer of the laminated body was peeled off and the measurement range was 15 mm in width. The sample was attached to a universal tensile tester (manufactured by Shimadzu Corporation, AUTOGRAPH AG-10kNIS). Further, the sample was elongated at a tensile speed of 200 mm/min in an environment of 23 ° C and 50% RH (relative humidity) to measure the stress A (Pa) at 10% elongation and the stress after 300 seconds from the stop of elongation. B (Pa). The measurement was measured only in the MD direction, that is, in the direction parallel to the application direction of the adhesive. From the measured stress A and stress B, the stress relaxation rate (%) was calculated using the following formula. The measurement results are shown in Table 1. Stress relaxation rate (%) = {(A-B) / A} × 100 (%)

<斷裂伸長度> 將與應力緩和率的測定所使用的試樣相同形態、大小的試樣,與前述應力緩和率的測定同樣地以試樣測定範圍成為15mm寬度×100mm長度的方式安裝在萬能拉伸試驗機(股份公司島津製作所製、AUTOGRAPH AG-10k NIS)。然後,在23℃、50%RH(相對濕度)的環境下,以拉伸速度200mm/分鐘使試樣伸長且測定斷裂時的試樣長度C(mm)。測定只有在MD方向亦即與黏著劑的塗布方向平行之方向測定。從斷裂時的試樣長度C(mm),使用以下的式算出斷裂伸長度(%)。將測定結果顯示在表1。 斷裂伸長度(%)={C/測定前的試樣長度}×100(%)<Elongation at break> The sample of the same shape and size as the sample used for the measurement of the stress relaxation rate is attached to the omnipotent so that the sample measurement range becomes 15 mm width × 100 mm in length, similarly to the measurement of the stress relaxation rate. Tensile testing machine (manufactured by Shimadzu Corporation, AUTOGRAPH AG-10k NIS). Then, the sample was stretched at a tensile speed of 200 mm/min in an environment of 23 ° C and 50% RH (relative humidity), and the sample length C (mm) at the time of the fracture was measured. The measurement was measured only in the MD direction, that is, in the direction parallel to the application direction of the adhesive. The elongation at break (%) was calculated from the sample length C (mm) at the time of the fracture using the following formula. The measurement results are shown in Table 1. Elongation at break (%) = {C / length of sample before measurement} × 100 (%)

<凝膠分率> 將實施例所得到的黏著片裁斷成為80mm×80mm的大小,將已除去剝離片之黏著劑層以聚酯製網狀物(網眼數:200網眼/英吋)包住且使用精密天秤稱量只有黏著劑之質量。將此時的質量設為M1。 其次,使上述黏著劑的試樣於室溫(23℃)浸漬在乙酸乙酯溶劑24小時。隨後,將黏著劑取出且在溫度23℃、50%RH的環境下使其風乾24小時,進而在80℃的烘箱中使其乾燥12小時。使用精密天秤稱量只有乾燥後的黏著劑之質量。將此時的質量設為M2。凝膠分率(%)以(M2/M1)×100表示。將測定結果顯示在表1。<Gel fraction> The adhesive sheet obtained in the example was cut into a size of 80 mm × 80 mm, and the adhesive layer from which the release sheet was removed was made of a polyester mesh (mesh number: 200 mesh/inch) Wrapped and used precision balances to weigh only the quality of the adhesive. Set the quality at this time to M1. Next, the sample of the above adhesive was immersed in an ethyl acetate solvent at room temperature (23 ° C) for 24 hours. Subsequently, the adhesive was taken out and air-dried for 24 hours in an environment of a temperature of 23 ° C and 50% RH, and further dried in an oven at 80 ° C for 12 hours. Use a precision balance to weigh only the quality of the adhesive after drying. Set the quality at this time to M2. The gel fraction (%) is represented by (M2/M1) × 100. The measurement results are shown in Table 1.

[表1] [Table 1]

如表1顯示,能夠確認實施例1~3的任一者均是藉由進行減壓處理而黏著力降低且黏著片與被黏著物之剝離變成容易。As shown in Table 1, it was confirmed that any of Examples 1 to 3 was subjected to pressure reduction treatment, and the adhesion was lowered, and the adhesion between the pressure-sensitive adhesive sheet and the adherend was facilitated.

1‧‧‧黏著片1‧‧‧Adhesive film

2‧‧‧黏著劑層2‧‧‧Adhesive layer

3‧‧‧凹部3‧‧‧ recess

4‧‧‧基材4‧‧‧Substrate

P‧‧‧黏著面P‧‧‧ adhesive surface

C‧‧‧空間C‧‧‧ Space

W‧‧‧工件W‧‧‧Workpiece

W’‧‧‧加工物W’‧‧‧Processing

E‧‧‧端部E‧‧‧End

10‧‧‧壓力控制裝置10‧‧‧ Pressure control device

第1圖是在本發明的一實施形態所使用的黏著片之剖面圖。 第2圖是示意性地顯示凹部形狀的例子之黏著劑層的黏著面之平面圖。 第3圖是示意性地顯示凹部形狀的例子之黏著劑層的剖面示意圖。 第4圖是示意性地顯示本發明的一實施形態之黏著片的剝離方法之剖面圖。 第5圖是將實施例1所製造的壓花薄膜(1)的壓花加工面使用數位顯微鏡拍攝而成之影像(a)、及將其進行二值化處理而得到的影像(b)。 第6圖是將實施例2所製造的壓花薄膜(2)的壓花加工面使用數位顯微鏡拍攝而成之影像(a)、及將其進行二值化處理而得到的影像(b)。 第7圖是將實施例3所製造的壓花薄膜(3)的壓花加工面使用數位顯微鏡拍攝而成之影像(a)、及將其進行二值化處理而得到的影像(b)。 第8圖是將實施例1所製造的黏著片的黏著面貼附在玻璃板且隔著玻璃使用數位顯微鏡拍攝而成之影像(a)及進行二值化處理而得到的影像(b)。 第9圖是將實施例2所製造的黏著片的黏著面貼附在玻璃板且隔著玻璃使用數位顯微鏡拍攝而成之影像(a)及進行二值化處理而得到的影像(b)。 第10圖是將實施例3所製造的黏著片的黏著面貼附在玻璃板且隔著玻璃使用數位顯微鏡拍攝而成之影像(a)及進行二值化處理而得到的影像(b)。Fig. 1 is a cross-sectional view showing an adhesive sheet used in an embodiment of the present invention. Fig. 2 is a plan view schematically showing an adhesive surface of an adhesive layer of an example of a shape of a concave portion. Fig. 3 is a schematic cross-sectional view showing an adhesive layer which is an example of a shape of a concave portion. Fig. 4 is a cross-sectional view schematically showing a method of peeling off an adhesive sheet according to an embodiment of the present invention. Fig. 5 is an image (a) obtained by using an embossed surface of the embossed film (1) produced in Example 1 using a digital microscope, and an image (b) obtained by binarizing the image. Fig. 6 is an image (a) obtained by photographing an embossed surface of the embossed film (2) produced in Example 2 using a digital microscope, and an image (b) obtained by binarizing the embossed surface. Fig. 7 is an image (a) obtained by using an embossed surface of the embossed film (3) produced in Example 3 using a digital microscope, and an image (b) obtained by binarizing the embossed surface. Fig. 8 is an image (a) obtained by attaching an adhesive surface of an adhesive sheet produced in Example 1 to a glass plate and using a digital microscope through a glass, and an image (b) obtained by binarization. Fig. 9 is an image (a) obtained by attaching an adhesive surface of an adhesive sheet manufactured in Example 2 to a glass plate and using a digital microscope through a glass, and an image (b) obtained by binarization. Fig. 10 is an image (a) obtained by attaching an adhesive surface of an adhesive sheet produced in Example 3 to a glass plate and using a digital microscope through a glass, and an image (b) obtained by binarization.

Claims (11)

一種黏著片的剝離方法,其係將至少具備黏著劑層之黏著片、與被黏貼在前述黏著劑層的黏著面之被黏著物剝離之黏著片的剝離方法,其特徵在於: 前述黏著劑層係在前述黏著面具有凹部, 前述被黏著物係以藉由前述黏著劑層的前述凹部而產生獨立的空間的方式被黏貼在前述黏著片, 藉由對至少黏貼有前述被黏著物之前述黏著片進行使前述空間中的氣體膨脹之減壓處理,來使前述黏著劑層的黏著力降低而將前述黏著片與前述被黏著物剝離。A method for peeling an adhesive sheet, which is a method for peeling an adhesive sheet having at least an adhesive layer and an adhesive sheet peeled off from an adhesive surface adhered to an adhesive surface of the adhesive layer, characterized in that: the adhesive layer The adhesive surface has a concave portion, and the adherend is adhered to the adhesive sheet so as to form an independent space by the concave portion of the adhesive layer, and the adhesive is adhered to at least the adhesive. The sheet is subjected to a pressure reduction treatment for expanding the gas in the space to lower the adhesion of the pressure-sensitive adhesive layer, thereby peeling off the pressure-sensitive adhesive sheet from the adherend. 如申請專利範圍第1項所述之黏著片的剝離方法,其中前述減壓處理比將前述黏著片貼附在前述被黏著物之環境的環境壓力更低。The method of peeling an adhesive sheet according to claim 1, wherein the pressure reduction treatment is lower than an environmental pressure of attaching the adhesive sheet to an environment of the adherend. 如申請專利範圍第1項所述之黏著片的剝離方法,其中形成前述黏著劑層之黏著劑組成物係不具有活性能量線硬化性及熱硬化性。The method of peeling an adhesive sheet according to claim 1, wherein the adhesive composition forming the pressure-sensitive adhesive layer has no active energy ray hardening property and thermosetting property. 如申請專利範圍第3項所述之黏著片的剝離方法,其中前述黏著劑組成物係含有(甲基)丙烯酸酯聚合物。The method of peeling an adhesive sheet according to claim 3, wherein the adhesive composition contains a (meth) acrylate polymer. 如申請專利範圍第1項所述之黏著片的剝離方法,其中形成前述黏著劑層之黏著劑組成物係具有活性能量線硬化性或熱硬化性。The method of peeling an adhesive sheet according to claim 1, wherein the adhesive composition forming the adhesive layer has active energy ray hardening property or thermosetting property. 如申請專利範圍第5項所述之黏著片的剝離方法,其中前述活性能量線硬化性黏著劑組成物係含有在側鏈具有活性能量線硬化性基之(甲基)丙烯酸酯聚合物。The method for peeling an adhesive sheet according to claim 5, wherein the active energy ray-curable adhesive composition contains a (meth) acrylate polymer having an active energy ray-curable group in a side chain. 如申請專利範圍第5項所述之黏著片的剝離方法,其中對前述黏著劑層照射能量線而使前述黏著劑層硬化後,進行前述減壓處理。The method for peeling an adhesive sheet according to claim 5, wherein the pressure-sensitive adhesive layer is irradiated with an energy ray to cure the pressure-sensitive adhesive layer, and then the pressure-reducing treatment is performed. 如申請專利範圍第5項所述之黏著片的剝離方法,其中進行前述減壓處理後,對前述黏著劑層照射能量線使前述黏著劑層硬化。The method for peeling an adhesive sheet according to claim 5, wherein after the pressure reduction treatment, the adhesive layer is irradiated with an energy ray to cure the adhesive layer. 如申請專利範圍第1項所述之黏著片的剝離方法,其中前述黏著片係被使用在前述被黏著物的暫時固定。The method of peeling an adhesive sheet according to claim 1, wherein the adhesive sheet is used for temporary fixation of the adherend. 如申請專利範圍第9項所述之黏著片的剝離方法,其中前述被黏著物為電子構件或光學構件。The method of peeling an adhesive sheet according to claim 9, wherein the adherend is an electronic member or an optical member. 一種加工物的製造方法,係將工件進行加工而得到加工物的製造方法,其特徵在於具備下列步驟: 將工件、與至少具備黏著劑層且在前述黏著劑層的黏著面具有凹部之黏著片,以前述黏著面的前述凹部與前述工件產生獨立的空間之方式黏貼之黏貼步驟; 將被黏貼在前述黏著片之前述工件進行加工成為加工物之加工步驟;及 藉由進行將至少黏貼有前述加工物之前述黏著片放置在減壓環境使前述空間中的氣體膨脹之減壓處理,而使前述黏著劑層的黏著力降低且將前述加工物與前述黏著片剝離之剝離步驟。A method for producing a processed article, which is a method for producing a processed article, which comprises the steps of: forming a workpiece, and an adhesive sheet having a concave portion on an adhesive surface of at least the adhesive layer and having the adhesive layer; a step of adhering the concave portion of the adhesive surface to the workpiece to form a separate space; a step of processing the workpiece adhered to the adhesive sheet into a processed object; and adhering at least the foregoing The pressure-sensitive adhesive sheet of the processed material is placed in a pressure-reducing environment in which the gas in the space is expanded in a reduced pressure environment, and the adhesive force of the pressure-sensitive adhesive layer is lowered, and the workpiece is peeled off from the pressure-sensitive adhesive sheet.
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