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TW201840910A - Pretreatment method for plating, plating method, article pretreated for plating, and plated article - Google Patents

Pretreatment method for plating, plating method, article pretreated for plating, and plated article Download PDF

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Publication number
TW201840910A
TW201840910A TW107104958A TW107104958A TW201840910A TW 201840910 A TW201840910 A TW 201840910A TW 107104958 A TW107104958 A TW 107104958A TW 107104958 A TW107104958 A TW 107104958A TW 201840910 A TW201840910 A TW 201840910A
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acid
plating
plated
plating film
coupling agent
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TW107104958A
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Chinese (zh)
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竹林仁
太田直人
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日商東洋炭素股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The purpose of the present invention is to improve adhesiveness between a member to be plated having a surface inert to plating and a plating film formed on the member to be plated. Provided is a method for chemically bonding a silane coupling agent to the surface of a member to be plated. The silane coupling agent is chemically bonded to at least one of the multiple functional groups of a polyfunctional compound capable of forming a chelate complex with metal ions that form a plating film.

Description

電鍍之前處理方法、電鍍方法、電鍍前處理物以及電鍍物Processing method before electroplating, electroplating method, pre-plating treatment, and electroplating

本發明係有關電鍍之前處理方法、電鍍方法、電鍍前處理物以及電鍍物。The present invention relates to a method of processing prior to electroplating, a method of electroplating, a pretreatment of electroplating, and an electroplating.

雖寄望相對於碳材料般之構件進行電鍍,但推斷因碳材料具有化學上為不活性之表面,故先前難形成均質且密合性優良之電鍍膜。為了克服該缺點,例如專利文獻1曾記載相對於黑鉛進行電鍍之方法為,使被電鍍構件之表面進行氧化及加熱的電鍍之前處理的方法。金屬等之被電鍍構件存在各式各樣污染,已知去除及使表面活化係使用如非專利文獻1所記載之電解脫脂,推斷其為上述氧化步驟之一種,但被電鍍構件為碳材料時無法確認效果,缺乏密合信賴性。 [先前技術文獻] [專利文獻]Although it is expected that electroplating is performed on a member similar to a carbon material, it is presumed that since the carbon material has a chemically inactive surface, it has been difficult to form a plating film which is homogeneous and excellent in adhesion. In order to overcome this disadvantage, for example, Patent Document 1 describes a method of performing electroplating on black lead to perform a treatment before electroplating in which the surface of the member to be plated is oxidized and heated. The plated member such as metal has various types of contamination, and it is known that the surface activation system is electrolytic degreasing as described in Non-Patent Document 1, and it is estimated that it is one of the above oxidation steps, but when the plated member is a carbon material. Unable to confirm the effect, lack of close trust. [Prior Technical Literature] [Patent Literature]

[專利文獻1]:特開2015-503032號公報 [非專利文獻][Patent Document 1]: JP-A-2015-503032 [Non-Patent Document]

[非專利文獻1]:榎本英彥,電鍍領域之洗淨技術,真空,43卷6號,667~671頁,200年[Non-Patent Document 1]: Sakamoto Yoshihiko, Cleaning Technology in Electroplating, Vacuum, Vol. 43, No. 6, 667~671, 200 years

[發明所欲解決之課題][Problems to be solved by the invention]

因此雖寄望於改善黑鉛等具有不活性之表面的被電鍍構件上所形成之電鍍膜相對於被電鍍構件的密合性,但先前之前處理後所形成之電鍍膜為密合力較小而缺乏信賴性之物。Therefore, although it is expected to improve the adhesion of the plating film formed on the plated member having an inactive surface such as black lead to the member to be plated, the plating film formed by the previous treatment has a small adhesion force. Lack of trust.

本發明之重要目的為,改善具有相對於電鍍為不活性之表面的被電鍍構件上所形成之電鍍膜相對於被電鍍構件的密合性。 [解決課題之方法]An important object of the present invention is to improve the adhesion of a plating film formed on a member to be plated with respect to a surface which is inactive to plating, with respect to a member to be plated. [Method of solving the problem]

本發明之電鍍的前處理方法為,使被電鍍構件之表面化學性鍵結矽烷偶合劑。使可與構成電鍍膜之金屬離子形成螯合錯合物的多官能化合物之複數官能基中至少1個化學性鍵結於矽烷偶合劑。因此藉由本發明之電鍍前處理方法所製成之電鍍前處理物為,被電鍍構件之表面配置可與構成電鍍膜之金屬形成螯合錯合物之官能基。故藉由使用本發明之電鍍前處理方法,既使被電鍍構件具有相對於電鍍為不活性之表面的構件,也可實現形成電鍍膜相對於被電鍍構件之密合性較高,具均質之電鍍膜。The pretreatment method of electroplating of the present invention is to chemically bond a decane coupling agent to the surface of the member to be plated. At least one of the plurality of functional groups of the polyfunctional compound capable of forming a chelate complex with the metal ion constituting the plating film is chemically bonded to the decane coupling agent. Therefore, the pre-plating treatment produced by the pre-plating treatment method of the present invention is such that the surface of the member to be plated is provided with a functional group capable of forming a chelate complex with the metal constituting the plating film. Therefore, by using the pre-plating treatment method of the present invention, even if the member to be plated has a member which is inactive with respect to the surface to be plated, the adhesion of the plated film to the member to be plated can be made higher, and it is homogeneous. Plating film.

本發明之電鍍前處理方法中,多官能化合物較佳為具有複數羧基。In the pre-plating treatment method of the present invention, the polyfunctional compound preferably has a plurality of carboxyl groups.

本發明之電鍍前處理方法中,多官能化合物較佳為,具有3個以上可與構成電鍍膜之金屬離子鍵結的官能基。In the pre-plating treatment method of the present invention, the polyfunctional compound preferably has three or more functional groups which are bondable to metal ions constituting the plating film.

本發明之電鍍前處理方法中,多官能化合物較佳為由伸乙基二胺四乙酸、伸乙基二胺-N,N’-二乙酸、伸乙基二胺-N,N’-二乙酸-N,N’-二丙酸水合物、羥基乙基伸乙基二胺三乙酸、二伸乙基三胺五乙酸、三伸乙基四胺六乙酸、二伸乙基三胺五乙酸、氰基三乙酸、羥基乙基亞胺基二乙酸、L-天冬胺酸-N-N-二乙酸、羥基亞胺基二琥珀酸、trans-1,2-二胺基環己烷-N,N,N’,N’-四乙酸-水合物、O,O’-雙(2-胺基乙基)乙二醇-N,N,N’N’-四乙酸所成群中所選出之至少一種。In the pre-plating treatment method of the present invention, the polyfunctional compound is preferably derived from ethyldiaminetetraacetic acid, ethyldiamine-N,N'-diacetic acid, and ethyldiamine-N,N'-diacetic acid. -N,N'-dipropionic acid hydrate, hydroxyethyl-extended ethylenediaminetriacetic acid, di-extension ethyltriaminepentaacetic acid, tri-ethylidenetetraamine hexaacetic acid, di-extension ethyltriaminepentaacetic acid, cyanide Triacetic acid, hydroxyethyliminodiacetic acid, L-aspartic acid-NN-diacetic acid, hydroxyiminodisuccinic acid, trans-1,2-diaminocyclohexane-N,N, At least one selected from the group consisting of N', N'-tetraacetic acid-hydrate, O, O'-bis(2-aminoethyl)ethylene glycol-N,N,N'N'-tetraacetic acid .

本發明之電鍍前處理方法中,矽烷偶合劑較佳為使用鏈中及末端中至少一方具有由伯胺基、環氧基及異氰酸酯基所成群中所選出之至少一個官能基的矽烷偶合劑。In the pre-plating treatment method of the present invention, the decane coupling agent is preferably a decane coupling agent having at least one functional group selected from the group consisting of a primary amino group, an epoxy group and an isocyanate group in at least one of a chain and a terminal. .

本發明之電鍍前處理方法中,被電鍍構件可使用能導入羥基之無機構件。In the pre-plating treatment method of the present invention, an inorganic member capable of introducing a hydroxyl group can be used as the member to be plated.

本發明之電鍍前處理方法中,被電鍍構件可使用碳材料、氮化鋁材料或氮化矽材料。又,本發明中「碳材料」係包含「黑鉛材料」。In the pre-plating treatment method of the present invention, a carbon material, an aluminum nitride material or a tantalum nitride material may be used for the member to be plated. Further, in the present invention, the "carbon material" includes "black lead material".

本發明之電鍍方法中,係以進行前處理步驟進行本發明之電鍍的前處理方法。進行前處理步驟後進行於被電鍍構件之表面實施電鍍,而形成電鍍膜之電鍍步驟。In the electroplating method of the present invention, the pretreatment method of the electroplating of the present invention is carried out by performing a pretreatment step. After the pre-treatment step, electroplating is performed on the surface of the member to be plated to form a plating step of the plating film.

本發明之電鍍方法中,前處理步驟較佳為進行使被電鍍構件之表面被氧化之步驟。In the plating method of the present invention, the pretreatment step is preferably a step of oxidizing the surface of the member to be plated.

本發明之電鍍前處理物為,備有被電鍍構件,與化學性鍵結於被電鍍構件之表面上的矽烷偶合劑,與複數官能基中至少1個鍵結矽烷偶合劑,可與構成電鍍膜之金屬離子形成螯合錯合物的多官能化合物。The pre-plating treatment of the present invention is provided with a member to be plated, a decane coupling agent chemically bonded to the surface of the member to be plated, and at least one conjugated decane coupling agent in the plural functional group, which can constitute electricity The coated metal ions form a polyfunctional compound that sequesters the complex.

本發明之電鍍物為,備有被電鍍構件,與化學性鍵結於被電鍍構件之表面上的矽烷偶合劑,與複數官能基中至少1個鍵結矽烷偶合劑,可與構成電鍍膜之金屬離子形成螯合錯合物之多官能化合物,與鍵結多官能化合物中未鍵結矽烷偶合劑之複數官能基的電鍍膜。 [發明之效果]The electroplating material of the present invention is provided with a member to be plated, a decane coupling agent chemically bonded to the surface of the member to be plated, and at least one conjugated decane coupling agent in the plural functional group, which can form a plating film. The metal ion forms a polyfunctional compound of a chelate complex, and a plating film of a plurality of functional groups in which the decane coupling agent is not bonded to the bonded polyfunctional compound. [Effects of the Invention]

藉由本發明可改善具有相對於電鍍為不活性之表面的被電鍍構件上所形成之電鍍膜相對於被電鍍構件的密合性。According to the present invention, the adhesion of the plating film formed on the member to be plated with respect to the surface in which the plating is inactive with respect to the member to be plated can be improved.

下面將說明實施本發明之較佳形態一例。但下述實施形態單為例示。本發明非限定於下述實施形態。An example of a preferred embodiment for carrying out the invention will now be described. However, the following embodiments are merely exemplified. The present invention is not limited to the following embodiments.

(電鍍法)   本實施形態中相對於被電鍍構件進行電鍍之方法為,備有使螯合劑鍵結於被電鍍構件之表面的前處理步驟,與藉由於鍵結螯合劑後之被電鍍構件的表面實施電鍍而形成電鍍膜之電鍍步驟。(Electroplating method) The method of electroplating the member to be plated in the present embodiment is provided with a pretreatment step of bonding a chelating agent to the surface of the member to be plated, and a member to be plated by the bonding of the chelating agent The surface is plated to form a plating step of the plating film.

<螯合劑>   螯合劑係由可與構成電鍍膜之金屬形成螯合錯合物的多官能化合物所形成。<Chelating Agent> The chelating agent is formed of a polyfunctional compound which can form a chelate complex with a metal constituting the plating film.

多官能化合物較佳為具有複數羧基之物。The polyfunctional compound is preferably a compound having a plurality of carboxyl groups.

多官能化合物較佳為,具有3個以上可與構成電鍍膜之金屬鍵結的官能基之物,更佳為具有4個以上。但可與構成電鍍膜之金屬鍵結的官能基數太多時,會因立體障礙而無法適當配置金屬,故恐無法適當形成電鍍膜,因此可形成螯合錯合物之化合物較佳為,具有6個以下可與構成電鍍膜之金屬鍵結的官能基。The polyfunctional compound preferably has three or more functional groups capable of bonding to a metal constituting the plating film, and more preferably has four or more. However, when the number of functional groups bonded to the metal constituting the plating film is too large, the metal may not be properly disposed due to steric hindrance, and thus the plating film may not be formed properly. Therefore, a compound capable of forming a chelate complex is preferable. Six or less functional groups which may be bonded to a metal constituting the plating film.

所使用之較佳多官能化合物的具體例如,伸乙基二胺四乙酸、伸乙基二胺-N,N’-二乙酸、伸乙基二胺-N,N’-二乙酸-N,N’-二丙酸水合物、羥基乙基伸乙基二胺三乙酸、二伸乙基三胺五乙酸、三伸乙基四胺六乙酸、二伸乙基三胺五乙酸、氰基三乙酸、羥基乙基亞胺基二乙酸、L-天冬胺酸-N-N-二乙酸、羥基亞胺基二琥珀酸、trans-1,2-二胺基環己烷-N,N,N’N’-四乙酸-水合物、O,O’-雙(2-胺基乙基)乙二醇-N,N,N’N’-四乙酸等。該等化合物可僅使用一種,或使用複數種。Specific examples of preferred polyfunctional compounds used are, for example, ethyldiaminetetraacetic acid, ethyldiamine-N,N'-diacetic acid, and ethyldiamine-N,N'-diacetic acid-N. N'-dipropionic acid hydrate, hydroxyethyl-ethylidene diamine triacetic acid, di-ethyltriamine pentaacetic acid, tri-ethylidenetetraamine hexaacetic acid, di-ethyltriaminepentaacetic acid, cyanotriacetic acid , hydroxyethyliminodiacetic acid, L-aspartic acid-NN-diacetic acid, hydroxyiminodisuccinic acid, trans-1,2-diaminocyclohexane-N,N,N'N '-Tetraacetic acid-hydrate, O, O'-bis(2-aminoethyl)ethylene glycol-N, N, N'N'-tetraacetic acid, and the like. These compounds may be used alone or in plural.

<被電鍍構件>   本發明中被電鍍之構件的被電鍍構件無特別限定。被電鍍構件可使用能導入羥基之無機構件。本發明中被電鍍構件之具體例如,碳材料、氮化鋁材料、氮化矽材料等。<Electrically Plated Member> The member to be plated of the member to be plated in the present invention is not particularly limited. As the member to be plated, an inorganic member capable of introducing a hydroxyl group can be used. Specific examples of the member to be plated in the present invention include a carbon material, an aluminum nitride material, a tantalum nitride material, and the like.

被電鍍構件之形狀尺寸無特別限定。被電鍍構件例如可為薄片狀、粉末狀、球狀、直立體狀、立方體狀、柱狀等。The shape and size of the member to be plated are not particularly limited. The member to be plated may be, for example, a flake, a powder, a sphere, a straight solid, a cube, a column, or the like.

<矽烷偶合劑>   矽烷偶合劑可因應被電鍍構件及多官能化合物而適當選擇。被電鍍構件例如為黑鉛時所使用之矽烷偶合劑較佳如,環氧系矽烷偶合劑、胺基系矽烷偶合劑、異氰酸酯系矽烷偶合劑等。<Cerane coupling agent> The decane coupling agent can be appropriately selected depending on the member to be plated and the polyfunctional compound. The decane coupling agent used in the case where the plated member is, for example, black lead is preferably an epoxy decane coupling agent, an amine decane coupling agent, an isocyanate decane coupling agent or the like.

該等之中又以使用鏈中及末端中至少一方具有由伯胺基、環氧基及異氰酸酯基中所選出之至少1個官能基的矽烷偶合劑為佳,更佳為使用末端具有胺基之胺基系矽烷偶合劑。末端具有胺基之胺基系矽烷偶合劑的具體例如,N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷等。Among these, a decane coupling agent having at least one functional group selected from a primary amino group, an epoxy group and an isocyanate group in at least one of the chain and the terminal is preferably used, and more preferably an amine group at the terminal is used. The amine based decane coupling agent. Specific examples of the amino group-based decane coupling agent having an amino group at the terminal are, for example, N-2-(aminoethyl)-3-aminopropylmethyldimethoxydecane, N-2-(aminoethyl) 3-aminopropyltrimethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, and the like.

上述矽烷偶合劑可僅使用一種,或使用複數種。The above decane coupling agent may be used alone or in plural.

<縮合劑>   為了促進矽烷偶合劑與多官能化合物之反應,可使用縮合劑。所使用之較佳縮合劑的具體例如,二嗪系縮合劑、碳化二亞胺系縮合劑、咪唑系縮合劑、鏻系縮合劑、脲鎓系縮合劑、鹵脲鎓系縮合劑等。<Condensation agent> In order to promote the reaction of a decane coupling agent with a polyfunctional compound, a condensing agent can be used. Specific examples of the preferred condensing agent to be used include a diazine-based condensing agent, a carbodiimide-based condensing agent, an imidazole-based condensing agent, an oxime-based condensing agent, a urea-based condensing agent, and a halogenated urea-based condensing agent.

該等之中又以使用三嗪系縮合劑更佳。三嗪系縮合劑之具體例如,DMT-MM(4-4,6-Dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium Chloride n-Hydrate等。It is more preferable to use a triazine-based condensing agent among these. Specific examples of the triazine-based condensing agent include DMT-MM (4-4,6-Dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium Chloride n-Hydrate and the like.

<電鍍處理>   本實施形態中相對於被電鍍構件進行電鍍時,首先係進行電鍍前處理。具體為,使被電鍍構件之表面化學性鍵結矽烷偶合劑。使可與構成電鍍膜之金屬離子形成螯合錯合物的多官能化合物之複數官能基中之至少1個化學性鍵結於矽烷偶合劑。較佳為被電鍍構件之表面鍵結具有3個以上可與構成電鍍膜之金屬鍵結的官能基般之多官能化合物,更佳為被電鍍構件之表面鍵結4個以上可與構成電鍍膜之金屬鍵結的官能基般之多官能化合物。<Electroplating Treatment> In the present embodiment, when plating is performed on the member to be plated, first, the pre-plating treatment is performed. Specifically, the surface of the member to be plated is chemically bonded to the decane coupling agent. At least one of the plurality of functional groups of the polyfunctional compound capable of forming a chelate complex with the metal ion constituting the plating film is chemically bonded to the decane coupling agent. Preferably, the surface of the member to be plated is bonded with three or more functional groups which are functional groups bonded to the metal constituting the plating film, and more preferably four or more surfaces are bonded to the surface of the member to be plated. A metal-bonded functional group-like polyfunctional compound.

被電鍍構件之表面難直接鍵結矽烷偶合劑時,較佳為於使用矽烷偶合劑處理被電鍍構件的表面之前,使被電鍍構件之表面進行氧化處理。藉此可將羥基配置於被電鍍構件之表面上,而易鍵結矽烷偶合劑。氧化處理之方法無特別限定。例如可使用硝酸、鹽酸、硫酸或該等二種以上之混酸進行濕式氧化處理,或進行氧等離子氧化處理。When it is difficult to directly bond the decane coupling agent to the surface of the member to be plated, it is preferred to subject the surface of the member to be plated to oxidation treatment before the surface of the member to be plated is treated with a decane coupling agent. Thereby, the hydroxyl group can be disposed on the surface of the member to be plated, and the decane coupling agent can be easily bonded. The method of the oxidation treatment is not particularly limited. For example, nitric acid, hydrochloric acid, sulfuric acid or a mixed acid of two or more kinds may be used for wet oxidation treatment or oxygen plasma oxidation treatment.

又,就促進矽烷偶合劑與多官能化合物之縮合反應的觀點,可使用上述縮合劑。Further, from the viewpoint of promoting the condensation reaction between the decane coupling agent and the polyfunctional compound, the above condensing agent can be used.

(電鍍處理前物)   藉由上述步驟可製造電鍍處理前物。電鍍處理前物為,備有被電鍍構件,與鍵結於被電鍍構件之矽烷偶合劑,與鍵結矽烷偶合劑,可與構成電鍍膜之金屬離子形成螯合錯合物的多官能化合物。被電鍍構件、矽烷偶合劑、構成電鍍膜之多官能化合物詳細內容如前述。(Pre-plating treatment) The plating treatment precursor can be produced by the above steps. The pre-plating treatment material is provided with a plated member, a decane coupling agent bonded to the member to be plated, and a bonded decane coupling agent, and a polyfunctional compound capable of forming a chelate complex with a metal ion constituting the plating film. The details of the electroplated member, the decane coupling agent, and the polyfunctional compound constituting the plating film are as described above.

最後藉由於鍵結多官能化合物之被電鍍構件的表面實施電鍍,而形成電鍍膜。即,於進行上述進行前處理方法之前處理步驟後,進行形成電鍍膜之電鍍步驟。電鍍時例如可藉由電解電鍍法進行,或藉由無電解電鍍法進行。Finally, a plating film is formed by performing electroplating on the surface of the member to be plated by bonding the polyfunctional compound. That is, after the processing step before the pre-treatment method described above is performed, a plating step of forming a plating film is performed. The plating can be carried out, for example, by electrolytic plating or by electroless plating.

電鍍膜之種類無特別限定。電鍍膜例如可為Cu電鍍膜、Ni電鍍膜、Fe電鍍膜、Cr電鍍膜、Ag電鍍膜、Au電鍍膜、Pd電鍍膜、Sn電鍍膜或含有由Cu、Ni、Fe、Cr、Ag、Au、Pd及Sn所成群中所選出之至少一種元素的合金所形成之電鍍膜等。又,可形成複數電鍍膜之層合體。The type of the plating film is not particularly limited. The plating film may be, for example, a Cu plating film, a Ni plating film, an Fe plating film, a Cr plating film, an Ag plating film, an Au plating film, a Pd plating film, a Sn plating film, or containing Cu, Ni, Fe, Cr, Ag, Au. a plating film formed of an alloy of at least one element selected from the group consisting of Pd and Sn, and the like. Further, a laminate of a plurality of plating films can be formed.

圖1係表示以黑鉛作為被電鍍構件用,以3-胺基丙基三甲氧基矽烷作為矽烷偶合劑用,以DMT-MM作為縮合劑用,以EDTA作為多官能化合物用時之電鍍處理步驟。Figure 1 shows the use of black lead as a member to be plated, 3-aminopropyltrimethoxydecane as a decane coupling agent, DMT-MM as a condensing agent, and EDTA as a polyfunctional compound. step.

(電鍍物)   圖2係表示所製造之電鍍物的模式剖面圖。如圖2所示般,電鍍物1為備有被電鍍構件10,與設置於被電鍍構件10之表面上的電鍍膜11。於被電鍍構件10之形成電鍍膜11的表面10a上,使構成電鍍膜11之金屬鍵結多官能化合物。藉由該多官能化合物可提升被電鍍構件10與電鍍膜11之密合性、均勻性及均質性。(Electroplating) Fig. 2 is a schematic cross-sectional view showing the electroplated article produced. As shown in FIG. 2, the plating material 1 is provided with a plated member 10 and a plating film 11 provided on the surface of the member to be plated 10. On the surface 10a of the plated member 10 on which the plating film 11 is formed, the metal constituting the plating film 11 is bonded to the polyfunctional compound. The adhesion, uniformity, and homogeneity of the plated member 10 and the plating film 11 can be improved by the polyfunctional compound.

如上述所說明,本實施形態中電鍍前處理物之表面配有可與構成電鍍膜11之金屬形成螯合錯合物的多官能化合物。因此藉由使用本實施形態之電鍍前處理方法,既使被電鍍構件10為具為相對於電鍍膜為不活性之表面的構件時,也可實現形成電鍍膜11相對於被電鍍構件10具有高密合性,均勻且均質之電鍍膜11。As described above, in the present embodiment, the surface of the pre-plated material is provided with a polyfunctional compound capable of forming a chelate complex with the metal constituting the plating film 11. Therefore, by using the pre-plating treatment method of the present embodiment, even when the member to be plated 10 is a member having a surface which is inactive with respect to the plating film, the formation of the plating film 11 with respect to the member to be plated 10 can be made high-density. A uniform, uniform and homogeneous plating film 11.

就實現電鍍膜11相對於被電鍍構件10具有更高密合性之觀點,可形成螯合錯合物之多官能化合物較佳為,具有3個以上可與構成電鍍膜11之金屬鍵結的官能基,更佳為具有4個以上。From the viewpoint of achieving higher adhesion of the plating film 11 with respect to the member to be plated 10, a polyfunctional compound capable of forming a chelate complex is preferable, and has three or more functional groups capable of bonding with a metal constituting the plating film 11. More preferably, it has four or more.

藉由上述本實施形態之電鍍方法,例如被電鍍構件10之表面為平滑狀時,既使JIS B0601-2001所規定之算術平均粗糙度(Ra)較小,也可形成密合力較高之電鍍膜11。被電鍍構件10之算術平均粗糙度(Ra)例如可為5μm以下,3以下或1以下。According to the plating method of the present embodiment, for example, when the surface of the member to be plated 10 is smooth, even if the arithmetic mean roughness (Ra) specified in JIS B0601-2001 is small, it is possible to form a battery having a high adhesion force. Coating 11. The arithmetic mean roughness (Ra) of the member to be plated 10 can be, for example, 5 μm or less, 3 or less, or 1 or less.

下面將基於具體之實施例更詳細說明本發明,但本發明非限定下述實施例,於不變更其要旨之範圍內可適當變更實施。In the following, the present invention will be described in more detail based on the specific examples, but the present invention is not limited to the following examples, and modifications may be appropriately made without departing from the spirit and scope of the invention.

(實施例1)   室溫下將各向同性黑鉛材料(東洋炭素製IG-43:CIP-A)浸漬於0.5M之硝酸水溶液中,1小時後水洗再乾燥。其次浸漬於含有1質量%之3-胺基丙基三甲氧基矽烷(矽烷偶合劑:CP-A)的甲醇溶液中1小時,而導入胺基丙基。其後將導入胺基丙基之各向同性黑鉛材料浸漬於含有1mmol之伸乙基二胺四乙酸(EDTA:螯合劑),與縮合劑用1.1倍莫耳之三嗪系縮合劑(DMT-MM)的甲醇溶液中進行1小時反應,以稀鹽酸洗淨後乾燥,得表面導入EDTA之黑鉛材料。相對於該表面導入EDTA之黑鉛材料進行電解銅電鍍,得被覆厚8μm之銅電鍍膜的黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。依據JIS K5600-5-6-1999所記載之橫切試驗切入直角格子狀之圖型以評估所得電鍍膜之密合性,結果剝離數為0個/25塊。電鍍膜於切緣及交差點雖有剝離,但其狀態依JIS記載之分類法判斷為2。(Example 1) An isotropic black lead material (IG-43: CIP-A manufactured by Toyo Carbon Co., Ltd.) was immersed in a 0.5 M aqueous solution of nitric acid at room temperature, and after 1 hour, it was washed with water and dried. Next, it was immersed in a methanol solution containing 1% by mass of 3-aminopropyltrimethoxydecane (decane coupling agent: CP-A) for 1 hour to introduce an aminopropyl group. Thereafter, the isotropic black lead material into which the aminopropyl group is introduced is immersed in a 1 mM ethylenediaminetetraacetic acid (EDTA: chelating agent), and the condensing agent is 1.1 times the triazine condensing agent (DMT). The reaction was carried out for 1 hour in a methanol solution of -MM), washed with dilute hydrochloric acid, and dried to obtain a black lead material having a surface-introduced EDTA. The black lead material introduced into the surface of the EDTA was subjected to electrolytic copper plating to obtain a black lead material coated with a copper plating film having a thickness of 8 μm. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test described in JIS K5600-5-6-1999 was cut into a rectangular grid pattern to evaluate the adhesion of the obtained plating film, and as a result, the number of peeling was 0/25. Although the plating film was peeled off at the cutting edge and the intersection, the state was judged to be 2 according to the classification method described in JIS.

(實施例2)   除了將各向同性黑鉛材料變更為CIP-B(東洋炭素製ISEM-8)外,以與實施例1相同之方法得表面導入EDTA之黑鉛材料。相對於該表面導入EDTA之黑鉛材料進行電解銅電鍍,得被覆銅電鍍膜之黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。所得電鍍膜之橫切試驗結果為0/25,分類為2。 (Example 2) A black lead material having a surface-introduced EDTA was obtained in the same manner as in Example 1 except that the isotropic black lead material was changed to CIP-B (ISEM-8 manufactured by Toyo Carbon Co., Ltd.). The black lead material introduced into the EDTA on the surface was subjected to electrolytic copper plating to obtain a black lead material coated with a copper plating film. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test result of the obtained plating film was 0/25, and was classified into 2.

(實施例3)   室溫下將CIP-A浸漬於1.0M之硝酸水溶液中,1小時後水洗再乾燥。其次浸漬於含有1質量%之CP-A的甲醇溶液中1小時,而導入胺基丙基。其後將導入胺基丙基之各向同性黑鉛材料浸漬於含有1mmol之EDTA,與縮合劑用1.1倍莫耳之DMT-MM的甲醇溶液中反應1小時,以稀鹽酸洗淨後乾燥,得表面導入EDTA之黑鉛材料。相對於該表面導入EDTA之黑鉛材料進行電解銅電鍍,得被覆厚8μm之銅電鍍膜的黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。所得電鍍膜之橫切試驗結果為0/25,分類為1。(Example 3) CIP-A was immersed in a 1.0 M aqueous solution of nitric acid at room temperature, and after 1 hour, it was washed with water and dried. Next, it was immersed in a methanol solution containing 1% by mass of CP-A for 1 hour to introduce an aminopropyl group. Thereafter, the isotropic black lead material into which the aminopropyl group was introduced was immersed in a solution containing 1 mmol of EDTA, and the condensing agent was reacted with a 1.1-fold molar solution of DMT-MM in methanol for 1 hour, washed with dilute hydrochloric acid, and dried. A black lead material of EDTA was introduced on the surface. The black lead material introduced into the surface of the EDTA was subjected to electrolytic copper plating to obtain a black lead material coated with a copper plating film having a thickness of 8 μm. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test result of the obtained plating film was 0/25, which was classified into 1.

(實施例4)   室溫下將CIP-A浸漬於1.0M之硝酸水溶液中,1小時後水洗再乾燥。其次浸漬於含有1質量%之N-2(胺基乙基)3-胺基丙基甲基二甲氧基矽烷(矽烷偶合劑:CP-B)的甲醇溶液中1小時,而導入胺基丙基。其後將該導入胺基丙基之各向同性黑鉛材料浸漬於含有1mmol之trans-1,2-二胺基環己烷-N,N,N’,N’-四乙酸-水合物(CyDTA:螯合劑),與縮合劑用1.1倍莫耳之三嗪系縮合劑(DMT-MM)的甲醇溶液中反應1小時,以稀鹽酸洗淨後乾燥,得表面導入CyDTA之黑鉛材料。相對於該表面導入CyDTA之黑鉛材料進行電解銅電鍍,得被覆厚8μm之銅電鍍膜的黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。所得電鍍膜之橫切試驗結果為0/25,分類為0。(Example 4) CIP-A was immersed in a 1.0 M aqueous solution of nitric acid at room temperature, and after 1 hour, it was washed with water and dried. Next, it was immersed in a methanol solution containing 1% by mass of N-2 (aminoethyl) 3-aminopropylmethyldimethoxydecane (decane coupling agent: CP-B) for 1 hour, and an amine group was introduced. Propyl. Thereafter, the isotropic black lead material introduced into the aminopropyl group was immersed in 1 mmol of trans-1,2-diaminocyclohexane-N,N,N',N'-tetraacetic acid-hydrate ( CyDTA: a chelating agent), which was reacted with a condensing agent in a methanol solution of 1.1 times a mole of a triazine-based condensing agent (DMT-MM) for 1 hour, washed with dilute hydrochloric acid, and dried to obtain a black lead material having a surface-introduced CyDTA. Electrodeposited copper plating was carried out on the black lead material into which CyDTA was introduced, and a black lead material coated with a copper plating film having a thickness of 8 μm was obtained. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test result of the obtained plating film was 0/25, and it was classified into 0.

(實施例5)   除了使矽烷偶合劑為3-環氧丙氧基丙基三甲氧基矽烷(CP-C)外,與實施例3相同得被覆銅電鍍膜之黑鉛材料。所得電鍍膜之橫切試驗結果為0/25,分類為0。 (Example 5) A black lead material coated with a copper plating film was obtained in the same manner as in Example 3 except that the decane coupling agent was 3-glycidoxypropyltrimethoxydecane (CP-C). The cross-cut test result of the obtained plating film was 0/25, and it was classified into 0.

(實施例6)   除了電鍍法為無電解電鍍外,與實施例4相同得被覆銅電鍍膜之黑鉛材料。無電解電鍍為,水洗CIP-A後,浸漬於添加增感劑之SnCl2 與活化劑之PdCl2 的前處理液中,以硫酸銅作為銅離子源,以錯化劑為EDTA之甲醛進行還原,使基材表面被覆厚度為2μm之均勻膜厚的銅。所得電鍍膜之橫切試驗結果為0/25,分類為1。 (實施例7)   除了使螯合劑為二伸乙基三胺五乙酸(DTPA)外,與實施例4相同得被覆銅之黑鉛材料。所得電鍍膜之橫切試驗結果為0/25,分類為0。 (實施例8)   除了使螯合劑為O,O’-雙(2-胺基乙基)乙二醇-N,N,N’N’-四乙酸(EGTA)外,與實施例4相同得被覆銅之黑鉛材料。所得電鍍膜之橫切試驗結果為0/25,分類為1。 (實施例9)   除了使螯合劑為三伸乙基四胺六乙酸(TTHA)外,與實施例4相同得被覆銅之黑鉛材料。所得電鍍膜之橫切試驗結果為0/25,分類為0。 (Example 6) A black lead material coated with a copper plating film was obtained in the same manner as in Example 4 except that the plating method was electroless plating. Electroless plating, after washing CIP-A, immersed in the pretreatment liquid of PdCl 2 with sensitizer added SnCl 2 and activator, using copper sulfate as copper ion source, and reducing agent as EDTA formaldehyde. The surface of the substrate was coated with copper having a uniform film thickness of 2 μm. The cross-cut test result of the obtained plating film was 0/25, which was classified into 1. (Example 7) A copper-coated black lead material was obtained in the same manner as in Example 4 except that the chelating agent was di-ethyltriaminepentaacetic acid (DTPA). The cross-cut test result of the obtained plating film was 0/25, and it was classified into 0. (Example 8) The same procedure as in Example 4 except that the chelating agent was O,O'-bis(2-aminoethyl)ethylene glycol-N,N,N'N'-tetraacetic acid (EGTA). Copper black lead material. The cross-cut test result of the obtained plating film was 0/25, which was classified into 1. (Example 9) A copper-coated black lead material was obtained in the same manner as in Example 4 except that the chelating agent was trimethylethylamine hexaacetic acid (TTHA). The cross-cut test result of the obtained plating film was 0/25, and it was classified into 0.

(比較例1)   室溫下將CIP-A浸漬於1.0M之硝酸水溶液中,1小時後水洗再乾燥。其次浸漬於含有1質量%之CP-A的甲醇溶液中1小時,而導入胺基丙基。相對於表面導入CP-A之黑鉛材料進行電解銅電鍍,得被覆厚8μm之銅電鍍膜的黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。所得電鍍膜之橫切試驗結果為1/25,分類為3。(Comparative Example 1) CIP-A was immersed in a 1.0 M aqueous solution of nitric acid at room temperature, and after 1 hour, it was washed with water and dried. Next, it was immersed in a methanol solution containing 1% by mass of CP-A for 1 hour to introduce an aminopropyl group. Electrolytic copper plating was carried out on the black lead material into which CP-A was introduced on the surface, and a black lead material coated with a copper plating film having a thickness of 8 μm was obtained. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test result of the obtained plating film was 1/25, which was classified into 3.

(比較例2)   室溫下將CIP-A浸漬於1.0M之硝酸水溶液中,1小時後水洗再乾燥。其次浸漬於含有1質量%之CP-B的甲醇溶液中1小時,而導入胺基丙基。相對於表面導入CP-B之黑鉛材料進行電解銅電鍍,得被覆銅電鍍膜之黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。所得電鍍膜之橫切試驗結果為2/25,分類為3。(Comparative Example 2) CIP-A was immersed in a 1.0 M aqueous solution of nitric acid at room temperature, and after 1 hour, it was washed with water and dried. Next, it was immersed in a methanol solution containing 1% by mass of CP-B for 1 hour to introduce an aminopropyl group. Electrolytic copper plating is performed on the black lead material introduced into the surface of CP-B to obtain a black lead material coated with a copper plating film. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test result of the obtained plating film was 2/25, which was classified into 3.

(比較例3)   除了將CP-A改為CP-C外,與實施例5相同相對於表面導入CP-C之黑鉛材料進行電解銅電鍍,得被覆銅電鍍膜之黑鉛材料。電鍍膜無斑點,電鍍膜具有均質之膜質。所得電鍍膜之橫切試驗結果為2/25,分類為3。 (比較例4)   室溫下將CIP-A浸漬於0.5M之硝酸水溶液中,1小時後水洗、乾燥再進行電解銅電鍍,得被覆厚8μm之銅電鍍膜的黑鉛材料。所得之電鍍膜觀察到部分剝落,電鍍膜不具有均質之膜質。電鍍膜之橫切試驗結果為11/25,分類為3。 (比較例5)   相對於CIP-A不進行表面處理下,而對各向同性黑鉛材料進行厚8μm之電解銅電鍍。所得之電鍍膜觀察到部分剝落,電鍍膜不具有均質之膜質。電鍍膜之橫切試驗結果為7/25,分類為4。 (比較例6)   相對於CIP-A不進行表面處理下,與實施例5相同進行無電解銅電鍍。電鍍膜之橫切試驗結果為10/25,分類為5。(Comparative Example 3) Electrolytic copper plating was carried out on the black lead material on which CP-C was introduced on the surface, except that CP-A was changed to CP-C, to obtain a black lead material coated with a copper plating film. The plating film has no spots, and the plating film has a homogeneous film quality. The cross-cut test result of the obtained plating film was 2/25, which was classified into 3. (Comparative Example 4) CIP-A was immersed in a 0.5 M aqueous solution of nitric acid at room temperature, and after 1 hour, it was washed with water, dried, and subjected to electrolytic copper plating to obtain a black lead material coated with a copper plating film having a thickness of 8 μm. Part of the peeling was observed in the obtained plating film, and the plating film did not have a homogeneous film quality. The cross-cut test result of the plating film was 11/25, which was classified into 3. (Comparative Example 5) Electrolytic copper plating having a thickness of 8 μm was performed on the isotropic black lead material without performing surface treatment with respect to CIP-A. Part of the peeling was observed in the obtained plating film, and the plating film did not have a homogeneous film quality. The cross-cut test result of the plating film was 7/25, which was classified as 4. (Comparative Example 6) Electroless copper plating was carried out in the same manner as in Example 5 except that the surface treatment was not carried out with respect to CIP-A. The cross-cut test result of the plating film was 10/25, which was classified as 5.

(比較例7)   相對於CIP-B不進行表面處理下,與比較例2相同進行無電解銅電鍍。電鍍膜之橫切試驗結果為12/25,分類為5。(Comparative Example 7) Electroless copper plating was carried out in the same manner as in Comparative Example 2, except that CIP-B was not subjected to surface treatment. The cross-cut test result of the plating film was 12/25, which was classified as 5.

1‧‧‧電鍍物1‧‧‧Electroplating

10‧‧‧被電鍍構件10‧‧‧Elected parts

10a‧‧‧被電鍍構件之表面10a‧‧‧ Surface of the plated component

11‧‧‧電鍍膜11‧‧‧ plating film

圖1為,表示電鍍處理步驟一例之圖。   圖2為,本發明一實施形態之電鍍物的模式剖面圖。Fig. 1 is a view showing an example of a plating process step. Fig. 2 is a schematic cross-sectional view showing an electroplated article according to an embodiment of the present invention.

Claims (11)

一種電鍍前處理方法,其為含有   使矽烷偶合劑化學性鍵結於被電鍍構件之表面的步驟,與使可與構成電鍍膜之金屬離子形成螯合錯合物之多官能化合物的複數官能基中至少1個化學性鍵結於矽烷偶合劑之步驟。A pre-plating treatment method comprising a step of chemically bonding a decane coupling agent to a surface of a member to be plated, and a complex functional group for a polyfunctional compound capable of forming a chelate complex with a metal ion constituting the plating film At least one of the steps of chemically bonding to the decane coupling agent. 如請求項1之電鍍前處理方法,其中前述多官能化合物為,具有複數羧基。The pre-plating treatment method of claim 1, wherein the polyfunctional compound has a plurality of carboxyl groups. 如請求項1或2之電鍍前處理方法,其中前述多官能化合物,具有3個以上可與構成電鍍膜之金屬離子鍵結的官能基。The pre-plating treatment method according to claim 1 or 2, wherein the polyfunctional compound has three or more functional groups bondable to metal ions constituting the plating film. 如請求項1~3中任一項之電鍍前處理方法,其中前述多官能化合物為,由伸乙基二胺四乙酸、伸乙基二胺-N,N’-二乙酸、伸乙基二胺-N,N’-二乙酸-N,N’-二丙酸水合物、羥基乙基伸乙基二胺三乙酸、二伸乙基三胺五乙酸、三伸乙基四胺六乙酸、二伸乙基三胺五乙酸、氰基三乙酸、羥基乙基亞胺基二乙酸、L-天冬胺酸-N-N-二乙酸、羥基亞胺基二琥珀酸、trans-1,2-二胺基環己烷-N,N,N’N’-四乙酸-水合物、O,O’-雙(2-胺基乙基)乙二醇-N,N,N’N’-四乙酸所成群中所選出之至少一種。The pre-plating treatment method according to any one of claims 1 to 3, wherein the polyfunctional compound is an ethylenediaminetetraacetic acid, an ethyldiamine-N,N'-diacetic acid, or an ethylenediamine -N,N'-diacetic acid-N,N'-dipropionic acid hydrate, hydroxyethyl-extended ethyldiaminetriacetic acid, di-extension ethyltriaminepentaacetic acid, tri-extension ethyltetraamine hexaacetic acid, di-extension Ethyltriaminepentaacetic acid, cyanotriacetic acid, hydroxyethyliminodiacetic acid, L-aspartic acid-NN-diacetic acid, hydroxyiminodisuccinic acid, trans-1,2-diamine Cyclohexane-N,N,N'N'-tetraacetic acid-hydrate, O,O'-bis(2-aminoethyl)ethylene glycol-N,N,N'N'-tetraacetic acid At least one of the selected groups. 如請求項1~4中任一項之電鍍前處理方法,其中前述矽烷偶合劑係使用鏈中及末端之至少一方具有由伯胺基、環氧基及異氰酸酯基所成群中所選出之至少1個官能基的矽烷偶合劑。The pre-plating treatment method according to any one of claims 1 to 4, wherein the decane coupling agent has at least one of a chain and a terminal having at least one selected from the group consisting of a primary amino group, an epoxy group and an isocyanate group. A functional decane coupling agent. 如請求項1~5中任一項之電鍍前處理方法,其中前述被電鍍構件係使用能導入羥基之無機構件。The pre-plating treatment method according to any one of claims 1 to 5, wherein the electroplated member is an inorganic member capable of introducing a hydroxyl group. 如請求項6之電鍍前處理方法,其中前述被電鍍構件係使用碳材料、氮化鋁材料或氮化矽材料。The pre-plating treatment method of claim 6, wherein the electroplated member is a carbon material, an aluminum nitride material or a tantalum nitride material. 一種電鍍方法,其為備有   進行如請求項1~7中任一項之電鍍前處理方法的前處理步驟,與   藉由於進行前述前處理步驟後之前述被電鍍構件的表面實施電鍍而形成電鍍膜之電鍍步驟。An electroplating method which is provided with a pre-processing step of performing the pre-plating treatment method according to any one of claims 1 to 7, and electroforming the surface of the electroplated member after performing the foregoing pre-treatment step Electroplating step of coating. 如請求項8之電鍍方法,其中前述前處理步驟中係進行氧化前述被電鍍構件之表面的步驟。The electroplating method of claim 8, wherein the pre-treatment step is a step of oxidizing the surface of the electroplated member. 一種電鍍前處理物,其為備有   被電鍍構件,與   被電鍍構件之表面化學性鍵結的矽烷偶合劑,與   複數官能基中至少1個鍵結前述矽烷偶合劑,可與構成電鍍膜之金屬離子形成螯合錯合物之多官能化合物。A pre-plating treatment material, which is a decane coupling agent which is provided with a member to be plated and chemically bonded to a surface of a member to be plated, and at least one of a plurality of functional groups is bonded to the decane coupling agent to form a plating film. The metal ion forms a polyfunctional compound that chelate the complex. 一種電鍍物,其為備有   被電鍍構件,與   於被電鍍構件之表面化學性鍵結的矽烷偶合劑,與   複數官能基中至少1個鍵結前述矽烷偶合劑,可與構成電鍍膜之金屬離子形成螯合錯合物的多官能化合物,與   與前述多官能化合物未鍵結前述矽烷偶合劑之複數官能基鍵結的電鍍膜。An electroplating material, which is provided with a member to be plated, and a decane coupling agent chemically bonded to a surface of a member to be plated, and at least one of a plurality of functional groups is bonded to the decane coupling agent, and the metal constituting the plating film The ion forms a polyfunctional compound of a chelate complex, and a plating film which is bonded to a plurality of functional groups of the aforementioned decane coupling agent to which the polyfunctional compound is not bonded.
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