TW201831930A - Polarizing plate, manufacturing method of polarizing plate, and display device comprising a linear portion, and a plurality of linear regions for preventing light leakage - Google Patents

Abstract

The present invention provides a polarizer for preventing light leakage, a method for producing a polarizing plate, and a display device. A polarizing plate comprising: a linear portion extending in one direction; and a plurality of linear regions in which a plurality of linear portions are arranged in a direction substantially parallel to an extending direction of the linear portion, and a line The portion has a width of the shortest wavelength or less of visible light incident from the outside, and a protective film is provided between the plurality of linear regions, and the protective film shields visible light.

Description

Polarizing plate, polarizing plate manufacturing method and display device

The present invention relates to a polarizing plate, a method of producing a polarizing plate, and a display device.

In recent years, high definition of liquid crystal display devices, improvement in color reproducibility, and expansion of dynamic range are progressing. High definition causes a decrease in aperture ratio, so in order to maintain display brightness, it is necessary to increase the brightness of the light source. Color reproducibility can be achieved by wavelength conversion or wavelength selection, but there is energy loss in wavelength conversion or wavelength selection, so in order to maintain display brightness, it is necessary to increase the brightness of the light source. The dynamic range can be enlarged by increasing the display brightness, but in order to increase the display brightness, it is necessary to increase the brightness of the light source. In either case, the brightness of the light source is increased, thus resulting in an increase in power consumption. The polarizing plate or the polarizer disposed on the light source side of the liquid crystal display device extracts light vibrating in a specific direction from the light of the light source, and the light is incident into the liquid crystal cell, but the light in the specific direction is almost absorbed. Used for display of liquid crystal. As a method of utilizing the unusable light, a reflective polarizer or a reflective polarizer has been proposed. As an example of a reflective polarizer, a wire grid polarizer (sometimes referred to as a wire grid polarizer, a wire grid film, etc.). The wire grid polarizer is an optical element having a linear region (wire grid) in which a plurality of fine linear members (also referred to as linear portions and wires) are arranged to form a lattice or a mesh. Additionally, the wire grid polarizer can also have a plurality of said optical elements. The wire grid polarizer extracts light that vibrates in a specific direction from the light of the light source, and reflects light that is not in the specific direction to the light source side. The reflected light is circulated by being reflected by a reflection plate or the like on the light source side and repeatedly incident on the wire grid polarizer, so that the light utilization efficiency can be improved.

For example, Patent Document 1 relates to a polarizer, and discloses a method for improving mass productivity and fabrication accuracy of a wire grid polarizer, and discloses a method for producing a large-area sheet-shaped plate. Further, Patent Document 2 relates to a liquid crystal display panel, and discloses a method of forming a wire grid polarizer by a step-and-repeat method. [Prior Art Literature]

[Patent Document 1] [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei. No. 2016-103001 [Patent Document 2] US Patent Application Publication No. 2012/0140148

[Problems to be Solved by the Invention] In order to fabricate a polarizing plate or a polarizer using a wire grid polarizer, it is necessary to form a wire grid by the same process as a semiconductor such as an electron beam lithography or an immersion process, and There are problems in terms of large-scale. When the nanoimprint method is applied, it is difficult to increase the size of the substrate as the substrate. In order to increase the size, for example, a pattern in which a polarizer is formed using a small mold of about 20 mm × 20 mm, and a plurality of the patterns are arranged or connected, and the like is produced, but here, the gap during self-alignment or Light leakage in the gap of the connection becomes a problem. Further, when a plurality of arrays are arranged or connected, the light leakage can be improved by overlapping, but in the case of overlapping, the margin of the overlap margin and the step of the overlap portion become a problem.

In view of such a problem, an object of one embodiment of the present invention is to provide a polarizing plate for preventing light leakage, a method for producing a polarizing plate, and a display device. [Technical means to solve the problem]

A polarizing plate (wire grid polarizing plate) according to an embodiment of the present invention includes: a linear portion extending in one direction; and a plurality of lines in which a plurality of linear portions are arranged in a direction substantially parallel to an extending direction of the linear portion The linear region has a width of the shortest wavelength or less of visible light incident from the outside, and a protective film (third resin layer, fourth resin layer) is included between the plurality of linear regions, and the protective film shields visible light.

In the polarizing plate according to the embodiment of the present invention, the lower surface of the linear portion may contact the first resin layer, and the side surface of the linear portion may be in contact with the upper surface of the second resin layer, the side surface of the first resin layer and the second resin layer. The side is in contact with the protective film.

In the polarizing plate according to the embodiment of the present invention, the second resin layer may be disposed between the linear portions, and the lower surface of the linear portion contacts the first resin layer, and the side surface of the first resin layer is in contact with the side surface of the second resin layer. Protective film.

In the polarizing plate according to the embodiment of the present invention, the lower surface of the linear portion may be in contact with the first resin layer, and the side surface of the linear portion may be in contact with the protective film on the side surface of the first resin layer.

The protective film contained in the polarizing plate according to the embodiment of the present invention may cover the linear region.

The linear portion included in the polarizing plate according to the embodiment of the present invention may contain a conductive metal material.

The protective film contained in the polarizing plate according to the embodiment of the present invention may be a resin or a resin containing a liquid crystal.

The protective film contained in the polarizing plate according to the embodiment of the present invention may also contain a material having refractive index anisotropy.

A method for fabricating a polarizing plate according to an embodiment of the present invention includes a step of forming a resin layer on a first substrate, forming a linear portion extending in one direction on the resin layer, and substantially extending in a direction extending from the linear portion a step of arranging a plurality of linear portions of linear portions in a parallel direction; a step of separating the first substrate from the linear regions; a step of arranging the plurality of linear regions on the second substrate; and A step of forming a protective film for shielding visible light between the plurality of linear regions on the two substrates.

The step of forming the linear region included in the method for fabricating the polarizing plate according to the embodiment of the present invention may further include the steps of forming a metallic conductive film on the first resin layer and applying a photoresist on the metallic conductive film. The photoresist is exposed using light using a light having a shorter wavelength than the width of the linear portion.

The step of forming the linear region included in the method for fabricating the polarizing plate according to the embodiment of the present invention may further include the steps of forming a metallic conductive film on the first resin layer and applying a photoresist on the metallic conductive film. The patterned surface of the mold in which the pattern is formed is pressed against the photoresist, and the mold is irradiated with light having a wavelength shorter than the width of the linear portion to expose the photoresist.

The step of forming a protective film included in the method for producing a polarizing plate according to an embodiment of the present invention may be carried out by inkjet.

The step of forming a protective film included in the method for fabricating a polarizing plate according to the embodiment of the present invention may be formed on the upper surface of the linear region in addition to forming a protective film between the plurality of linear regions arranged on the second substrate. Protective film.

A display device according to an embodiment of the present invention includes a polarizing plate including a linear portion having a width of a shortest wavelength or less of incident visible light and extending in one direction, and a direction substantially parallel to an extending direction of the linear portion. a plurality of linear regions of the plurality of linear portions, and a protective film disposed between the plurality of linear regions and shielding visible light; a plurality of pixels extending in one direction and extending in one direction Arranging in a direction in which the directions intersect; and a light shielding film, a first substrate and a second substrate.

The protective film included in the display device according to the embodiment of the present invention may overlap the light shielding film in a direction perpendicular to the surface of the light shielding film, and the width of the protective film is narrower than the width of the light shielding film.

The pixel included in the display device according to the embodiment of the present invention may further include: a source signal line formed substantially in parallel with a direction extending in one direction, and a direction substantially parallel to a direction crossing the direction extending in one direction. The gate signal line is overlapped with the protective film in a direction perpendicular to the surface of the protective film, and the width of the source signal line is narrower than the width of the protective film.

The gate signal line included in the display device according to the embodiment of the present invention may overlap the protective film in the vertical direction on the surface of the protective film, and the width of the gate signal line is narrower than the width of the protective film.

The display device according to the embodiment of the present invention may have a plurality of light shielding films, and the plurality of light shielding films include a light shielding film that overlaps the linear region in a direction perpendicular to the surface of the light shielding film, and both the linear region and the protective film. Overlapping light-shielding film.

The display device according to an embodiment of the present invention may further include: a red color filter, a green color filter, and a blue color filter, and the plurality of light shielding films include: a red color filter and a green color filter. A light shielding film that is in contact with the light sheet, a light shielding film that is in contact with the green color filter and the blue color filter, and a light shielding film that is in contact with the blue color filter and the red color filter.

The polarizing plate included in the display device according to the embodiment of the present invention may be disposed on at least one of a lower surface of the first substrate and an upper surface of the second substrate.

Hereinafter, embodiments of the present invention will be described with reference to the drawings and the like. However, the invention can be embodied in many different forms without departing from the spirit and scope of the invention. That is, it is not limited to the description of the embodiment exemplified below. In addition, in order to clarify the description, the width, thickness, shape, and the like of each portion may be schematically shown in comparison with the actual form. However, the schematic drawings are an example and are not intended to limit the scope of the invention.

In the present specification and the drawings, the same elements as those described in the above-described drawings may be denoted by the same reference numerals (or symbols such as a, b, and the like after the numerals), and the description thereof will be appropriately omitted. In addition, the characters "first" and "second" attached to each element are convenient signs used to distinguish each element, and do not have more meaning unless otherwise specified.

In the present specification, the term "upper" includes not only a case where it is placed in a certain object or region by direct contact, but also a case where another object or region is interposed therebetween. The term "down" is the same. In addition, terms such as "upper" and "lower" mean the relative relationship between objects or regions, and does not refer to an absolute relationship. Specifically, the main surface side of the substrate is defined as "upper" and the opposite side of the main surface of the substrate is defined as "lower" based on the main surface of the substrate (the surface on which the element or the like is formed).

In the case where a certain film is processed to form a plurality of patterns, the plurality of patterns sometimes have different functions and/or functions. However, the plurality of patterns originate from a film formed as the same layer in the same step. That is, the plurality of patterns have the same layer configuration and contain the same material. Therefore, in the present specification, the plurality of patterns are defined as patterns existing in the same layer.

The polarizing plate of the present invention will be described. Further, the polarizing plate of the present invention is a wire grid (hereinafter, referred to as a WG (Wire Grid)) polarizing plate. In the WG polarizing plate, the polarizer layer has a linear region in which a plurality of linear portions are provided in a direction parallel to a direction extending in one direction. In the WG polarizing plate, a plurality of linear regions are arranged in a tile shape. A resin for shielding visible light or a material having refractive index anisotropy or the like is provided between the linear region and the linear region arranged in a tile shape. A WG polarizing plate capable of suppressing light leakage can be provided by providing a resin for shielding visible light or a material having refractive index anisotropy between the linear region and the linear region. In addition, since it is not necessary to overlap the linear region and the linear region, it is possible to provide a WG polarizing plate which can form a linear region regardless of the overlap margin and does not need to be intentionally overlapped. Here, the resin that shields visible light is a material that forms the third resin layer in the present specification. Further, the material having refractive index anisotropy is a material forming a layer containing a material having refractive index anisotropy or a material forming a fourth resin layer in the present specification. Further, both the third resin layer and the fourth resin layer are protective films.

(First Embodiment) In the present embodiment, a configuration of a polarizing plate according to an embodiment of the present invention will be described. In addition, the description of the overlapping structure may be omitted.

FIG. 1 is a schematic perspective view showing a configuration of a WG polarizing plate 200 of the first embodiment.

The WG polarizing plate 200 shown in FIG. 1 includes a glass substrate 20, a polarizer layer 60, and a linear region 126.

The linear region 126 includes a first resin layer 61 and a linear portion 62. Between the linear region 126 and the linear region 126, a third resin layer 64 or a layer 65 comprising a material having refractive index anisotropy is included. Further, the layer 65 containing a material having refractive index anisotropy is the fourth resin layer 65. Further, the third resin layer 64 and the fourth resin layer 65 are both protective films.

2(A) to 2(C) are schematic cross-sectional views between A1 and A2 of the WG polarizing plate 200 shown in Fig. 1.

2(A) includes a glass substrate 20 and a polarizer layer 60. The polarizer layer 60 includes a linear region 126 and a third resin layer 64. The linear region 126 includes a first resin layer 61, a linear portion 62, and a second resin layer 63. The side surface and the upper surface of the linear portion 62 are in contact with the second resin layer 63. The lower surface of the linear portion 62 is in contact with a portion of the upper surface of the first resin layer 61. A portion of the upper surface of the first resin layer 61 is in contact with the second resin layer 63. That is, the second resin layer 63 covers the linear portion 62 and the first resin layer 61. The side surface of the first resin layer 61 contacts the third resin layer 64. The side surface of the second resin layer 63 contacts the third resin layer 64. The lower surface of the first resin layer 61 contacts the upper surface of the glass substrate 20. The lower surface of the third resin layer 64 contacts the upper surface of the glass substrate 20. In FIG. 2(A), the side end portion of the linear region 126 is an example of the second resin layer 63, but the side end portion of the linear region 126 may be the linear portion 62. In this case, the linear portion 62 is in contact with the side surface of the third resin layer 64. Further, in the present specification, the first resin layer 61 is a cured product of a material forming the first resin layer 61, the second resin layer 63 is a cured product of a material forming the second resin layer 63, and the third resin layer 64 is formed. A cured product of the material of the third resin layer 64.

The first resin layer 61 preferably has high transparency in the visible light region, high heat resistance, and high adhesion to the glass substrate 20, the linear portion 62, the second resin layer 63, and the third resin layer 64, but is not limited thereto. . The material for forming the first resin layer 61 may, for example, be an ultraviolet curable resin such as an acrylic resin, an epoxy resin, an urethane resin or a polyamidene, or a thermosetting resin. Further, the first resin layer 61 may have a two-layer structure. For example, a binder having a higher adhesion property may be used on the side in contact with the glass substrate 20, and the resin layer that is in contact with the linear portion 62 may be the ultraviolet curable resin or the thermosetting resin.

The linear portions 62 are linear and are arranged in plurality in a direction extending in one direction. Further, the linear portion 62 has a width equal to or shorter than the shortest wavelength of the incident visible light. Further, the linear portion 62 is formed on the first resin layer 61 using a conductive metal material. 2(A) to 2(C) show an example in which the arrangement intervals of the linear portions 62 are periodic, but they may be non-periodic. For example, in the case where the two linear portions 62 having different widths are formed on the same plane, the function of polarizing light and the function of blocking light can be simultaneously provided.

As is well known, the transmittance of the linear portion 62 is determined by the relationship between the interval between the linear portion 62 and the adjacent linear portion 62, the wavelength of incident light, the angle of incident light (incident angle), and the refractive index of the material as the substrate. Said. For example, by setting the width of the linear portion 62 to 180 nm and the arrangement interval of the linear portions 62 to 360 nm, light having a wavelength of more than 360 nm can be transmitted. That is, the WG polarizing plate 200 can transmit visible light. In the present specification, the interval between the linear portion 62 and the adjacent linear portion 62 means the distance from the center of the width of the linear portion 62 to the center of the width of the adjacent linear portion 62. Further, the width of the linear portion 62 is preferably 1/2 or less of the interval.

Further, the transmittance of the linear portion 62 is also related to the film thickness (also referred to as height). For example, the film thickness of the linear portion 62 may be such that the transmittance of light transmitted through the linear portion 62 is 1% or less. For example, the film thickness of the linear portion 62 is preferably 30 nm or more. Specifically, when the interval between the linear portion 62 and the adjacent linear portion 62 is 360 nm, the film thickness of the linear portion 62 may be 360 nm. Thereby, light of a region having a wavelength greater than 360 nm can be transmitted. That is, the WG polarizing plate 200 can transmit visible light. When the film thickness of the linear portion 62 is too thin, the transmitted light cannot be ignored, and light of a specific wavelength range cannot be taken out. On the other hand, if the film thickness of the linear portion 62 is too thick, there is a possibility that the light use efficiency is lowered. Therefore, similarly to the line width, the film thickness is preferably not less than 1/2 of the interval.

The conductive metal material forming the linear portion 62 preferably has a high reflectance to transmitted light and has high adhesion to the first resin layer 61 and the second resin layer 63. For example, the conductive metal material forming the linear portion 62 is preferably aluminum, silver, platinum, chromium, or the like, or an alloy thereof, but is not limited thereto.

The second resin layer 63 preferably has the same characteristics as the first resin layer 61. In other words, the characteristics of the second resin layer 63 are preferably high in transparency in the visible light region, high in heat resistance, and high in adhesion to the glass substrate 20, the linear portion 62, the first resin layer 61, and the third resin layer 64. Examples of the material for forming the second resin layer 63 include an ultraviolet curable resin such as an acrylic resin, an epoxy resin, an urethane resin, or a polyamidene resin, or a thermosetting resin. The second resin layer 63 is in contact with the upper surface of the linear portion 62, whereby the impact can be alleviated when the WG polarizing plate 200 falls. That is, the linear portion 62 can be protected and the strength of the WG polarizing plate 200 can be increased.

The term "visible light" means light having a wavelength of 380 nm to 780 nm, and the transmittance of visible light in the protective film of the present invention is preferably 5% or less. The third resin layer 64 preferably has a function of blocking visible light, and also has a function of separating the linear region 126 from the linear region 126, and the transmittance of the light upward or downward with respect to the surface of the third resin layer 64. 1% or less. In addition, the characteristics of the third resin layer 64 are preferably high in heat resistance, and the adhesion to the glass substrate 20, the linear portion 62, the first resin layer 61, and the second resin layer 63 is high. The material for forming the third resin layer 64 can be, for example, a composition obtained by mixing a particle of carbon such as carbon black, a coloring agent such as a pigment or a dye, a resin, a polymerizable monomer, a photopolymerization initiator, or the like. By coating such a coloring composition, the coating film is cured by light or heat to form a black resin layer. The material for forming the third resin layer 64 is preferably a resin layer formed as described above, but is not limited thereto. For the composition of the third resin layer 64, for example, the composition described in JP-A-2006-053569, WO2009/010521, and JP-A-2014-146029 can be used.

With the configuration described above, the adhesion between the linear region 126 and the third resin layer 64 and the linear region 126 can be made high, and the gap between the linear region 126 and the linear region 126 does not transmit visible light. That is, a WG polarizing plate which suppresses light leakage can be provided. In addition, it is not necessary to consider the overlap of the linear region 126 and the linear region 126, and it is not necessary to mind the coincidence step. That is, it is possible to provide a WG polarizing plate in which the degree of freedom in arrangement of the linear regions 126 is increased as compared with the related art.

2(B) shows a structure in which the upper surface of the linear portion 62 is not covered by the second resin layer 63 as compared with the structure of FIG. 2(A). The other structure is the same as that of FIG. 2(A), and thus the description thereof is omitted. 2(B), FIG. 2(B) shows an example in which the side end portion of the linear region 126 is the second resin layer 63, but the side end portion of the linear region 126 may be Linear portion 62. In this case, the linear portion 62 is in contact with the side surface of the third resin layer 64. The WG polarizing plate 200 of the configuration of Fig. 2(B) has no second resin layer 63 on the upper surface, whereby it is less susceptible to the refraction of light from the upper surface and emits a large amount of transmitted light. That is, the utilization efficiency of light can be improved. In addition, it is possible to provide a WG polarizing plate in which light leakage is suppressed and the degree of freedom in arrangement of the linear regions 126 is increased as compared with the related art.

2(C) shows that the linear portion 62 and the adjacent linear portion 62 are not filled with the second resin layer 63, and the linear portion 62 and the third resin are compared with the configuration of FIG. 2(B). The structure in which layer 64 is in contact. The other structure is the same as that of FIG. 2(B), and thus the description thereof is omitted. The WG polarizing plate 200 of the structure of FIG. 2(C) has no second resin layer 63 on the upper surface and the side surface of the linear portion 62, whereby the second resin layer can be less susceptible to the second resin layer 63 than in the case of the second resin layer 63. The refraction of light of 63 affects and transmits a large amount of transmitted light. That is, the utilization efficiency of light can be further improved. In addition, it is possible to provide a WG polarizing plate in which light leakage is suppressed and the degree of freedom in arrangement of the linear regions 126 is increased as compared with the related art.

3(A), 3(B) and 3(C) are schematic cross-sectional views between A1 and A2 of the WG polarizing plate 200 shown in Fig. 1. 3(A), 3(B), and 3(C) show the structure between the linear region 126 and the linear region 126, respectively, from FIG. 2(A), FIG. 2(B), and FIG. (C) An example in which the third resin layer 64 respectively indicated is changed to a layer (fourth resin layer) 65 containing a material having refractive index anisotropy. Other than that, the configurations shown in FIGS. 2(A), 2(B), and 2(C) are the same, and the description thereof is omitted.

The layer (fourth resin layer) 65 containing a material having refractive index anisotropy preferably has a function of blocking visible light, and also has a function of separating the linear region 126 from the linear region 126, and the transmittance of light is 1%. the following. Further, it is preferable that the heat resistance is high, and the adhesion to the glass substrate 20, the linear portion 62, the first resin layer 61, and the second resin layer 63 is high. For example, a lyotropic liquid crystal or a thermotropic liquid crystal or the like can be used. The lyotropic liquid crystal is a compound of water and a solvent, or a solution and a solvent. For example, it can be brought into a liquid crystal state by mixing a surfactant with water or a solution, and the liquid crystal is oriented by adjusting the concentration of the solvent or the direction of applying the mixed liquid. . The thermotropic liquid crystal exhibits, for example, a stable operation as an intermediate phase in a certain temperature range, and becomes a liquid crystal state by a change in temperature. For example, a lyotropic liquid crystal is applied between the linear region 126 and the linear region 126, and is oriented and solidified along the application direction, thereby shielding visible light. Further, in the present specification, the layer 65 containing a material having refractive index anisotropy may be referred to as a fourth resin layer 65.

The WG polarizing plate 200 shown in FIG. 3(A) can make the adhesion between the linear region 126 and the fourth resin layer 65 and the linear region 126 high, and the gap between the linear region 126 and the linear region 126 does not transmit visible light. . That is, a WG polarizing plate which suppresses light leakage can be provided. In addition, it is not necessary to consider the overlap of the linear region 126 and the linear region 126, and it is not necessary to mind the coincidence step. That is, it is possible to provide a WG polarizing plate in which the degree of freedom in arrangement of the linear regions 126 is increased as compared with the related art.

The WG polarizing plate 200 shown in Fig. 3(B) has no second resin layer 63 on the upper surface, and thus is less susceptible to the refraction of light on the upper surface. That is, the utilization efficiency of light can be improved. In addition, a WG polarizing plate which suppresses light leakage can be provided.

The WG polarizing plate 200 shown in FIG. 3(C) has no second resin layer 63 on the upper surface and the side surface of the linear portion 62, whereby the second resin layer can be less susceptible to the second resin layer 63 than in the case of the second resin layer 63. 63 the refraction of light. That is, the utilization efficiency of light can be further improved. In addition, a WG polarizing plate which suppresses light leakage can be provided.

4(A), 4(B) and 4(C) are schematic cross-sectional views between A1 and A2 of the WG polarizing plate 200 shown in Fig. 1. 4(A), 4(B), and 4(C) show the fourth resin layer in the structures shown in FIG. 3(A), FIG. 3(B), and FIG. 3(C), respectively. 65 is formed not only between the linear region 126 and the linear region 126 but also on the upper surface of the linear region 126. Other than that, the configurations shown in FIGS. 3(A) to 3(C) are the same, and the description thereof is omitted. Further, in FIGS. 4(A), 4(B) and 4(C), in order to easily observe the fourth resin layer 65, the layer of the fourth resin layer 65 formed on the upper surface of the linear region 126 is formed. The thickness is shown to be thicker than it actually is. The fourth resin layer 65 is a material having a light-shielding property, and the fourth resin layer 65 is formed thin by the light transmitted through the upper surface of the linear region 126.

The WG polarizing plate 200 shown in FIGS. 4(A), 4(B) and 4(C) is linearized by the fourth resin layer 65 from the structure shown in FIGS. 3(A) to 3(C). The upper surface of the region 126 is also covered, whereby the strength of the polarizing plate can be increased in addition to the features described in the description of Figs. 3(A), 3(B), and 3(C).

The cross-sectional shape of the linear portion 62 of the polarizing plate according to the embodiment of the present invention is exemplified as a rectangular shape, but the shape is not limited to a rectangular shape. The cross-sectional shape of the linear portion 62 may be a square shape, or may be a trapezoidal shape or a triangular shape, and various shapes may be employed without departing from the gist of the present invention.

As described above, it is possible to provide a WG polarizing plate capable of suppressing light leakage by providing a material for shielding visible light between a linear region and a linear region. In addition, it is possible to provide a WG polarizing plate which does not require consideration of the overlap margin of the linear region and the linear region, and which does not require overlapping steps.

(Second Embodiment) In the present embodiment, a procedure for producing a polarizing plate according to an embodiment of the present invention will be described. Further, the production method is not limited to this method, and a method generally used in the technical field of the present invention can be employed. In addition, about the same structure as 1st Embodiment, description is abbreviate|omitted.

Fig. 5 is a flow chart showing a method of producing a WG polarizing plate according to an embodiment of the present invention.

The manufacturing method of the WG polarizing plate includes: a step 20 of starting the production (S20); a step 21 of forming a resin layer on the first substrate (S21); a step 22 of forming a linear region on the resin layer (S22); a step 23 of separating the substrate from the linear region (S23); a step 24 of arranging the plurality of linear regions on the second substrate (S24); forming a shielding visible light between the plurality of linear regions arranged on the second substrate Step 25 of the protective film (S25); and step 26 of finishing the production (S26).

6(A) to 6(F), in the method of producing a WG polarizing plate according to an embodiment of the present invention, the step of forming a resin layer on the first substrate to explain the step 20 (S20) of starting the production is shown. 21 (S21), a specific cross-sectional view of the step 22 (S22) of forming a linear region on the resin layer, and the step 23 (S23) of separating the first substrate from the linear region.

Fig. 6(A) includes a step 20 of starting the production (S20), and a step 21 of forming the first resin layer 61 on the first substrate (S21). Specifically, after the S20 which is started to be produced, the first resin layer 61 is formed on the glass substrate 121. The first resin layer 61 has a function of relaxing the unevenness of the glass substrate 121 and flattening the surface in contact with the linear portion 62 formed later. As a method of forming the first resin layer 61, for example, a screen printing method, a spin coating method, a dipping method, or the like can be used.

6(B) to 6(E) include a step 22 of forming a linear region on the resin layer (S22). A method of forming the linear portion 62 using lithography is illustrated. Specifically, the metallic conductive film 66 is formed on the first resin layer 61, and the photoresist 67 is applied. Further, the photoresist 67 is exposed using the mask 68 and using a lithography technique. The film formation of the metallic conductive film 66 can be performed, for example, by a chemically formed method using a chemical vapor deposition (CVD) device or by a vacuum evaporation method, a sputtering method, an ion plating method, or the like. The method of formation. Further, as a method of applying the photoresist 67, for example, a spin coating method, a dipping method, or the like can be used. The exposed photoresist 67 is developed, the photoresist 67 is etched as a mask, and the photoresist 67 is removed, whereby the linear portion 62 can be formed. Next, a second resin layer 63 is formed. In this way, the linear region 126 can be formed. Further, in the step 22 of forming the linear region on the resin layer, the formation of the linear portion 62 indicates a method using lithography, but any method generally used in the technical field of the present invention may be used. use. For example, the linear portion 62 may be formed using an electron beam drawing device. Further, in the case where a negative resist is used as the photoresist, the portion irradiated with light can be left by development. On the other hand, in the case where a positive resist is used as the photoresist, the portion where the light is not irradiated can be left by development. Further, Fig. 6(B) shows an example in which a negative resist is used.

FIG. 6(F) includes a step 23 of separating the glass substrate 121 from the linear region 126 (S23). The glass substrate 121 may be separated from the linear region 126 by mechanical peeling, or a film may be further attached to the upper surface of the second resin layer 63, and the entire surface of the glass substrate 121 may be irradiated with laser light to be peeled off. A method generally used in the technical field of the present invention can be employed.

7(A) to 7(F), in the method of producing a WG polarizing plate according to an embodiment of the present invention, the step of forming a resin layer on the first substrate to explain the step 20 of starting the production (S20) is shown. 21 (S21), step 22 (S22) of forming a linear region on the resin layer, and step 23 (S23) of separating the first substrate from the linear region, and FIGS. 6(A) to 6(F) Different specific profiles. The same description as in FIGS. 6(A) to 6(F) will be omitted.

7(B) to 7(E) include a step 22 of forming a linear region on the resin layer (S22). A method of forming the linear portion 62 using nanoimprinting is shown. The nanoimprint method is a well-known technique, and a detailed description is omitted. For example, the nanoimprint method has a method of forming a mold in which irregularities are formed on quartz glass or the like, and forming a pattern using the mold. For example, aluminum is formed on the first resin layer 61 as a metallic conductive film 66 by using a sputtering apparatus. Further, a photoresist 67 is applied onto the metallic conductive film 66, and the mold 69 is pressed against the photoresist to irradiate ultraviolet (UV) light. Next, the photoresist 67 is used as a mask, and the photoresist 67 is removed, whereby the linear portion 62 can be formed. Further, as another example of the nanoimprint method, a method in which a resist is applied onto the metallic conductive film 66 and the mold 69 is pressed against a resist to thermally cure the resist may be used. Specific examples of the nanoimprint method are disclosed in Japanese Patent Laid-Open No. Hei. No. 2016-103001, or U.S. Patent Application Publication No. 2012/0140148. Further, Fig. 7(F) can adopt the same manufacturing method as that described in Fig. 6(F).

8(G) to 8(J), in a method of fabricating a WG polarizing plate according to an embodiment of the present invention, a step 24 for explaining that a plurality of linear regions are arranged on a second substrate is shown (S24), A specific cross-sectional view of the step 25 of forming a protective film for shielding visible light between the plurality of linear regions arranged on the second substrate (S25) and the step 26 (S26) for finishing the production.

8(G), 8(H) and 8(I), or 8(G), 8(H), and 8(J) include: arranging a plurality of linear regions on the second substrate Step 24 (S24); a step 25 of forming a protective film for shielding visible light between the plurality of linear regions arranged on the second substrate (S25); and a step 26 of finishing the production (S26).

8(G) and 8(H) show a step 24 of arranging a plurality of linear regions 126 on the glass substrate 20 (S24). For example, a method of picking up the linear regions 126 and arranging them on the glass substrate 20 may be employed. The arrangement method is not limited to the method. Further, an adhesive may be applied to the first resin layer 61 of the linear region 126 during alignment.

8(I) and 8(J) show a step 25 of forming a protective film for shielding visible light between a plurality of linear regions arranged on the second substrate (S25), and a step 26 of ending the production ( S26). Fig. 8(I) shows a method of forming the fourth resin layer 65. For example, the fourth resin layer 65 is applied to the linear region 126 and the linear region 126 by using a liquid crystal dropping device, an inkjet printer, a screen printer, a slit coater, a nozzle dispenser, or the like. The upper surface of the linear region 126. The material forming the fourth resin layer 65 is, for example, a lyotropic liquid crystal or a thermotropic liquid crystal. As a method of orienting a lyotropic liquid crystal or a thermotropic liquid crystal, there is a method of using an alignment agent and a method of directly coating a specific lyotropic liquid crystal and orienting the liquid crystal. As a method of using an aligning agent, the alignment film can be rubbed by applying an alignment agent to a substrate, and then the liquid crystal is dropped on the alignment film to align the liquid crystal. Specific examples of the method of using the aligning agent include JP-A-2015-26050, JP-A-2017-16089, and the like. As a method of directly applying a lyotropic liquid crystal and aligning a liquid crystal, a water-soluble compound capable of self-organization can be used. Specific examples of the compound include a polymer backbone such as a conjugated polymer and a side chain having water solubility. A composition of a hydrophilic based polymer. Further, a dichroic dye compound may also be included. A composition containing such a compound is coated on a substrate and heated to remove moisture remaining in the film, whereby an anisotropic film having optical anisotropy can be formed. Specific examples of the method of directly applying the lyotropic liquid crystal and aligning the liquid crystal include WO2007/080419, WO2009/130675, WO2012/007923, and the like. Further, as in FIG. 4(A), FIG. 4(B), and FIG. 4(C), in FIG. 8(I), in order to easily observe the fourth resin layer 65, it is also formed in the linear region 126. The layer thickness of the fourth resin layer 65 of the upper surface is illustrated to be thicker than actual. The fourth resin layer 65 is a material having a light-shielding property, and the fourth resin layer 65 is formed thin by the light transmitted through the upper surface of the linear region 126. Further, similarly to FIGS. 3(A), 3(B), and 3(C), the fourth resin layer 65 may be formed not on the upper surface of the linear region 126. For example, as long as the printing plate provided with the slit between the linear region 126 and the linear region 126 is used, the fourth resin layer 65 is formed between the linear region 126 and the linear region 126 without forming the upper surface of the linear region 126. The fourth resin layer 65 may be used. FIG. 8(J) shows a method of forming the third resin layer 64 by inkjet between the linear region 126 and the linear region 126. Further, the method of forming the protective film between the linear regions is not limited to these methods. For example, it is also possible to produce a printing plate and form a protective film by screen printing.

With the production method as described above, it is possible to provide a WG polarizing plate which suppresses light leakage between the linear region and the linear region. In addition, it is possible to provide a WG polarizing plate which does not have a coincidence step of a linear region and a linear region.

(Third Embodiment) In the present embodiment, a liquid crystal display device having a wire grid polarizing plate according to an embodiment of the present invention will be described. In addition, the same configurations as those of the first embodiment and the second embodiment may be omitted.

FIG. 9 is a schematic plan view showing a configuration of a liquid crystal display device 300 according to an embodiment of the present invention.

The liquid crystal display device 300 includes a glass substrate 123, a display region 104, a gate side drive circuit 108, a gate side drive circuit 109, a source side drive circuit 112, a connector 114, and an integrated circuit 116.

A display region 104, a gate side drive circuit 108, a gate side drive circuit 109, and a source side drive circuit 112 are formed on the glass substrate 123. The connector 114 is connected to the glass substrate 123. Integrated circuit 116 is disposed on connector 114. The number of connectors 114 can also be changed in accordance with the size of the display area 104.

Display area 104 includes a plurality of pixels 106. The plurality of pixels 106 are arranged in one direction and in a direction crossing one direction. The number of arrays of the plurality of pixels 106 is arbitrary. For example, the direction along one direction may be the X direction, the direction along the direction intersecting the one direction may be the Y direction, the m pixels 106 may be arranged in the X direction, and the n pixels 106 may be arranged in the Y direction. m and n are each independently a natural number greater than one. The pixels 106 each have a display element and the display element comprises a liquid crystal element.

For example, display elements corresponding to the three primary colors of red (R), green (G), and blue (B) may be respectively allocated in three pixels. A full-color display device can be provided by supplying 256 levels of voltage to each pixel. In addition, the arrangement of the plurality of pixels 106 may be, for example, a stripe arrangement. Further, the arrangement of the plurality of pixels 106 is not limited to the arrangement, and an arrangement such as a delta arrangement or a pentile may be employed. In the liquid crystal display device 300 according to the embodiment of the present invention, an example in which the array of the plurality of pixels 106 is arranged in a strip shape will be described.

The connector 114 has a timing signal for operating the video signal and the control circuit, a power supply, and the like, and is supplied to the gate side drive circuit 108, the gate side drive circuit 109, the source side drive circuit 112, and the integrated circuit 116. The connector 114 can also use a flexible printed circuit (FPC). A video signal, a timing signal for operating the control circuit, and a power supply are supplied from a circuit or a device external to the liquid crystal display device 300 to the gate side drive circuit 108 and the gate side drive circuit 109 via the connector 114, and the source side drive Circuit 112 and integrated circuit 116.

The gate side drive circuit 108, the gate side drive circuit 109, the source side drive circuit 112, and the integrated circuit 116 have respective pixels 106 driven and displayed on the image signal, the timing signal of the operation of the control circuit, and the power supply. The role in the display area 104 is shown.

The gate side drive circuit 108, the gate side drive circuit 109, and the source side drive circuit 112 may not all be formed on the glass substrate 123. For example, an integrated circuit (IC) including a part of the function of the gate side driving circuit and the source side driving circuit may be disposed on the glass substrate 123 or the connector 114. Further, the integrated circuit 116 included in the liquid crystal display device 300 shown in FIG. 9 has a part of functions of the gate side drive circuit and the source side drive circuit.

FIG. 10 is a schematic plan view showing a pixel included in a liquid crystal display device 300 having a wire grid polarizing plate according to an embodiment of the present invention. The pixel shown in FIG. 10 can be applied to apply a voltage in a direction perpendicular to the drawing, that is, in a direction perpendicular to the glass substrate 123 to control a vertical alignment (VA) mode or a twisted nematic (Twisted Nematic) of the liquid crystal cell. , TN) way. Further, the color filter layer, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, the second light-transmitting conductive layer 110, the glass substrate 123, and the polarizing plate 130 are not shown in FIG. The layer, the film, and the like will be described in a method of manufacturing the liquid crystal display device 300 to be described later.

The pixel 106 shown in FIG. 10 includes a thin film transistor 190, a capacitance element 196, a source signal line 191, a gate signal line 192, a capacitance potential line 193, and a first light-transmitting conductive layer 70. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, a source/drain electrode 36, a source/drain electrode 38, a first opening portion 39a, and a first opening portion 39b. The source/drain electrode 36 and the source/drain electrode 38 are electrically connected to the semiconductor layer 32 via the first opening 39a and the first opening 39b. The first light-transmitting conductive layer 70 is electrically connected to the source and drain electrodes 38 via the second opening 194 . The capacitor element 196 is formed by the source/drain electrode 38, a gate insulating film 33 to be described later, and a capacitance potential line 193. The source/drain electrode 36 is electrically connected to the source signal line 191. The gate electrode 34 is electrically connected to the gate signal line 192. By applying a voltage to each of the first light-transmitting conductive layer 70 and the second light-transmitting conductive layer 110 to be described later, an electric field is generated in a direction perpendicular to the glass substrate 123, and the liquid crystal element included in the liquid crystal layer 90 is controlled. Thereby, the liquid crystal display device 300 can display an image.

FIG. 11 is a schematic plan view showing another example of the pixel 106 included in the liquid crystal display device 300 having the wire grid polarizing plate according to the embodiment of the present invention. The pixel shown in FIG. 11 can be applied to apply a voltage in a direction parallel to the glass substrate 123 to control an In Plane Switching (IPS) mode of the liquid crystal element. Further, the color filter layer, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, the second light-transmitting conductive layer 110, the glass substrate 123, and the polarizing plate 130 are not shown in FIG. The layer, the film, and the like will be described in a method of manufacturing the liquid crystal display device 300 to be described later.

The pixel 106 shown in FIG. 11 includes a thin film transistor 190, a capacitor element 196, a source signal line 191, a gate signal line 192, a capacitance potential line 193, a first light-transmitting conductive layer 70, and a common potential line 197. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, a source/drain electrode 36, a source/drain electrode 38, a first opening portion 39a, and a first opening portion 39b. The source/drain electrode 36 and the source/drain electrode 38 are electrically connected to the semiconductor layer 32 via the first opening 39a and the first opening 39b. The first light-transmitting conductive layer 70 is electrically connected to the source and drain electrodes 38 via the second opening 194 . The capacitor element 196 is formed by the source/drain electrode 38, a gate insulating film 33 to be described later, and a capacitance potential line 193. The source/drain electrode 36 is electrically connected to the source signal line 191. The gate electrode 34 is electrically connected to the gate signal line 192. The common potential line 197 has a function of supplying a common potential to all of the pixels 106 included in the display area 104. The common potential line 197 may be shared by all of the pixels 106 included in the display area 104, or may be supplied in pixels in the X direction, or may be shared in pixels in the Y direction. By applying a voltage to each of the first light-transmitting conductive layer 70 and the common potential line 197, an electric field is generated in a direction parallel to the glass substrate 123, and the liquid crystal element included in the liquid crystal layer 90 is controlled, so that the liquid crystal display device 300 is controlled. The image can be displayed.

Fig. 12 is a schematic plan view showing a wire grid polarizing plate on a pixel 106 included in a liquid crystal display device 300 having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 12 is superimposed on the upper surface with respect to the paper sheets of Figs. 10 and 11 . 10 and 11 are separated from FIG. 12 for easy observation of the drawings. The width of the linear portion 62 and the interval between the linear portion 62 and the linear portion 62 are set to be recognizable in the drawings for easy understanding, but the size is not limited to the above. The width of the linear portion 62 may be smaller than the wavelength of the incident light.

In addition, FIG. 12 also shows the third resin layer 64 or the fourth resin layer 65 between the linear region 126 and the linear region 126. The third resin layer 64 or the fourth resin layer 65 is disposed so as to overlap the source signal line 191 and the gate signal line 192 in a direction perpendicular to the third resin layer 64 or the fourth resin layer 65. The third resin layer 64 or the fourth resin layer 65 is thicker than the source signal line 191 and the gate signal line 192. Light leakage can be suppressed by covering the source signal line and the gate signal line with a protective film.

By adopting the configuration as described above, the display device having the WG polarizing plate can prevent light leakage. Therefore, it is possible to provide a display device in which black and white light and dark differences, or black and color chromatic aberrations are clear and vivid images are displayed.

(Fourth embodiment) In the present embodiment, a method of manufacturing a liquid crystal display device according to an embodiment of the present invention will be described. In addition, the same configurations as those of the first to third embodiments may be omitted.

A method of manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 according to the embodiment of the present invention will be described with reference to FIGS. 13 or 14 and FIGS. 15(A) and 15(B) to 17.

In the method of manufacturing a liquid crystal display device according to an embodiment of the present invention, a lithography technique that is generally used in the manufacture of a liquid crystal display device will be described as an example. Furthermore, the manufacture of the liquid crystal display device according to the embodiment of the present invention is not limited to the lithography technique, and a method generally used in the technical field of the present invention may be used.

FIG. 13 is a schematic cross-sectional view showing a method of manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 when the pixel structure of FIG. 10 is applied. It is a schematic cross-sectional view in which three pixels included in a liquid crystal display device are enlarged. Further, the B1 and B2 cross sections of the pixel shown in Fig. 10 correspond to the right side of the drawing.

FIG. 14 is a schematic cross-sectional view showing a method of manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 when the pixel structure of FIG. 11 is applied. It is a schematic cross-sectional view in which three pixels included in a liquid crystal display device are enlarged. Further, the C1 and C2 cross sections of the pixel shown in Fig. 11 correspond to the right side of the drawing.

FIG. 13 and FIG. 14 show an example in which the third resin layer 64 overlaps with the light shielding film in a direction perpendicular to the surface of the light shielding film. 13 and FIG. 14 show an example in which the width of the light shielding film 40 is wider than the width of the third resin layer 64, but the width of the light shielding film 40 may be narrower than the width of the third resin layer 64. The liquid crystal display device 300 has the third resin layer 64 in addition to the light shielding film 40, whereby the bonding precision of the linear region 126 toward the substrate in the step 24 (S24) of arranging the linear regions 126 can be compensated. Therefore, a display device having a WG polarizing plate that prevents light leakage can be provided. Here, the light shielding film 40 is a black matrix which is generally used in a liquid crystal display device.

15(A) and 15(B) are flowcharts showing a method of manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 shown in Fig. 14.

First, as shown in FIG. 15(A), a thin film transistor (TFT) array 30 is formed on a glass substrate 123. The TFT array 30 includes a base film 31, a semiconductor layer 32, a gate insulating film 33, a gate electrode 34, an interlayer film 35, a source/drain electrode 36, a source/drain electrode 38, a first opening portion 39a and a first opening portion 39b, and a capacitor. The potential line 193 and the interlayer film 37. A thin film transistor 190 and a capacitor element 196 are formed on the TFT array 30.

The interlayer film 37 has a function of alleviating irregularities in the case of forming a film, a wiring, a transistor, or the like which is lower than the interlayer film 37. Therefore, the film or pattern formed after the interlayer film 37 can be formed on a flat surface. The material forming the interlayer film 37 is preferably a material having high transparency in the visible light region, a material having high heat resistance, and the source/drain electrode 36, the source/drain electrode 38, the first light-transmitting conductive layer 70, and the common potential line. 197 has high adhesion. The material of the interlayer film 37 may be the same material as that shown in the first resin layer 61 or the second resin layer 63. For example, a photosensitive resin composition containing an acrylic resin, a polyimide resin, or the like can be used.

The method of forming the TFT array 30, the structure of the thin film transistor 190 and the capacitor element 196, and the materials of the respective films, layers, and respective portions can be known. That is, methods, configurations, and materials that are generally used in the technical field of the present invention can be employed.

Then, as shown in FIG. 15(B), a second opening portion 194 for electrically connecting the first light-transmitting conductive layer 70 and the source/drain electrodes 38 is formed. The second opening portion 194 opens the interlayer film 37. The first light-transmitting conductive layer 70 is disposed in contact with the upper surface and the side wall of the interlayer film 37. In the step of forming the first light-transmitting conductive layer 70, the common potential line 197 is formed in the same layer as the first light-transmitting conductive layer 70. The first light-transmitting conductive layer 70 has a function of connecting to the source/drain electrode 38 of the pixel, applying a voltage corresponding to the image signal, and driving the liquid crystal element of the liquid crystal layer 90 by the electric field with the common potential line 197. As the material for forming the first light-transmitting conductive layer 70, for example, a material that transmits light such as Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO) can be used. A first alignment film 80 is formed on the first light-transmitting conductive layer 70. The material forming the first alignment film 80 is, for example, a resin such as a polyimide. Further, a layer in which a light shielding film is formed may be present between the first light-transmitting conductive layer 70 and the common potential line 197 and the first alignment film 80, or a layer in which an inorganic compound is formed may be present. The light-shielding film has a function of blocking visible light, and the inorganic compound prevents entry of moisture or impurities. Here, the substrate to the first alignment film 80 is formed on the glass substrate 123 as a TFT side substrate.

Next, a method of manufacturing a substrate on the side facing the TFT side substrate via the liquid crystal layer 90 will be described. Here, the substrate on the side facing the TFT side substrate is referred to as a opposite side substrate.

As shown in FIG. 16, the opposite side substrate is composed of a glass substrate 120, a light shielding film 40, a color filter layer, and a second alignment film 100, wherein the color filter layer includes a red color filter layer 50, and a green color. The filter layer 51 and the blue color filter layer 52. For example, a metallic conductive film can be formed into a film and the light shielding film 40 can be formed by lithography. Further, a color filter layer is formed. The order of formation of the respective color filter layers may be appropriately selected. For example, a red color filter layer 50 may be formed, a green color filter layer 51 may be formed, and a blue color filter layer 52 may be formed. Each color filter layer is placed in contact with the light shielding film 40. It is also possible to form the respective color filter layers by using photoresist and using lithography techniques after coating the materials forming the respective color filter layers. Furthermore, the formation method is not limited to the method. Further, the second alignment film 100 is formed on the entire surface. The material forming the second alignment film 100 is, for example, a resin such as a polyimide. The second alignment film 100 has a function of protecting the color filter layer. For example, the opposite-side substrate thus formed is bonded to the TFT-side substrate by using a sealing material or the like with the liquid crystal layer 90 interposed therebetween. Further, the liquid crystal display device 300 can be manufactured by bonding the WG polarizing plate 200 having the glass substrate 122 to the glass substrate 120.

Further, as shown in FIG. 17, two WG polarizing plates 200 each having a glass substrate 122 may be prepared and bonded to the glass substrate 120 and the glass substrate 123, respectively.

Further, in the method of manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 shown in FIG. 14 when the pixel structure of FIG. 11 is applied, in the step of forming the first light-transmitting conductive layer 70, a common potential is not formed. Line 197. Further, a second light-transmitting conductive layer 110 is formed between the color filter layer and the glass substrate 120. The second light-transmitting conductive layer 110 has a function of vertically applying a voltage to the liquid crystal element included in the liquid crystal layer 90 disposed between the second light-transmitting conductive layer 110 and the first light-transmitting conductive layer 70 to control the liquid crystal. element. As the material for forming the second light-transmitting conductive layer 110, for example, a material that transmits light such as ITO or IZO can be used. The second alignment film 100 has a function of making the second light-transmitting conductive layer 110 and the first light-transmitting conductive layer 70 formed on the side opposite to the liquid crystal layer 90 non-conductive, that is, insulating.

By using the manufacturing method as described above, it is possible to provide a display device having a WG polarizing plate that prevents light leakage.

(Fifth Embodiment) In the present embodiment, an example of the fourth resin layer 65 used in the liquid crystal display device according to the embodiment of the present invention will be described. As described above, the fourth resin layer 65 is a protective film and is a layer containing a material having refractive index anisotropy. In addition, the same configurations as those of the first to fourth embodiments may be omitted.

As a specific example of the lyotropic liquid crystal, a water-soluble compound which has liquid crystallinity and can be self-organized can be used. Specific examples of the compound include a polymer backbone such as a conjugated polymer and a side chain having water solubility. A composition of a hydrophilic group of polymers. Further, a guest-host type dichroic dye compound may also be contained. The guest-host dichroic dye compound is a polycyclic compound having a large absorbance in the long-axis direction of the molecule and a small absorption in the direction of the minor axis orthogonal thereto, so that two or more different types can be exhibited in one molecule. Refractive index. By including such a compound, a film having optical anisotropy can be produced. Specific examples of such lyotropic liquid crystals include WO2007/080419, WO2009/130675, WO2012/007923, WO2014/174381, WO2015/162495, and the like. Specific examples of the guest-host type dichroic dye compound include WO2011/024892 and the like.

By using the material as described above, a display device having a WG polarizing plate for preventing light leakage can be provided.

The embodiments of the present invention can be combined as appropriate within a range that does not contradict each other. In addition, based on the respective embodiments, those skilled in the art can add, delete, or design change the structural elements, or add or omit the steps, or change the conditions, as long as the gist of the present invention is provided. It is included in the scope of the invention.

In addition, even if it is an effect which differs from the effect of the aspect of the said embodiment of this invention, it is explained by the description of this specification, or can be easily predicted by those skilled in the art The effect of the invention.

20, 120, 121, 122, 123‧‧‧ glass substrates

30‧‧‧TFT array

31‧‧‧ basement membrane

32‧‧‧Semiconductor layer

33‧‧‧gate insulating film

34‧‧‧ gate electrode

35, 37‧‧ ‧ interlayer film

36, 38‧‧‧ source and drain electrodes

39a, 39b‧‧‧ first opening

40‧‧‧Shade film

50‧‧‧Red color filter layer

51‧‧‧Green color filter layer

52‧‧‧Blue color filter layer

60‧‧‧ polarizer layer

61‧‧‧First resin layer

62‧‧‧Linear

63‧‧‧Second resin layer

64‧‧‧ Third resin layer (protective film)

65‧‧‧layer containing a material having refractive index anisotropy (fourth resin layer, protective film)

66‧‧‧Metal conductive film

67‧‧‧ photoresist

68‧‧‧ Cover

69‧‧‧Mold

70‧‧‧First transparent conductive layer

110‧‧‧Second transparent conductive layer

80‧‧‧First alignment film

90‧‧‧Liquid layer

100‧‧‧Second alignment film

104‧‧‧Display area

106‧‧‧ pixels

108, 109‧‧‧ gate side drive circuit

112‧‧‧Source side drive circuit

114‧‧‧Connector

116‧‧‧Integrated Circuit

126‧‧‧Linear area

130‧‧‧Polarizer

190‧‧‧film transistor

191‧‧‧ source signal line

192‧‧‧gate signal line

193‧‧‧Capacitor potential line

194‧‧‧ second opening

196‧‧‧Capacitive components

197‧‧‧Common potential line

200‧‧‧Wire grid polarizer (WG polarizer)

300‧‧‧Liquid crystal display device

S20～S26‧‧‧Steps

A1, A2, B1, B2, C1, C2‧‧‧ hatching

UV‧‧‧UV

Fig. 1 is a schematic perspective view showing the structure of a wire grid polarizing plate according to an embodiment of the present invention. 2(A) to 2(C) are schematic cross-sectional views showing the configuration of a wire grid polarizing plate according to an embodiment of the present invention. 3(A) to 3(C) are schematic cross-sectional views showing the configuration of a wire grid polarizing plate according to an embodiment of the present invention. 4(A) to 4(C) are schematic cross-sectional views showing the structure of a wire grid polarizing plate according to an embodiment of the present invention. Fig. 5 is a flow chart showing a method of fabricating a wire grid polarizing plate according to an embodiment of the present invention. 6(A) to 6(F) are flowcharts showing a method of fabricating a wire grid polarizing plate according to an embodiment of the present invention. 7(A) to 7(F) are flowcharts showing a method of fabricating a wire grid polarizing plate according to an embodiment of the present invention. 8(G) to 8(J) are flowcharts showing a method of fabricating a wire grid polarizing plate according to an embodiment of the present invention. 9 is a schematic plan view showing the configuration of a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 10 is a schematic plan view showing a pixel included in a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 11 is a schematic plan view showing a pixel included in a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 12 is a schematic plan view showing a wire grid polarizing plate on a pixel included in a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 13 is a schematic cross-sectional view showing three pixels included in a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 14 is a schematic cross-sectional view showing three pixels included in a display device having a wire grid polarizing plate according to an embodiment of the present invention. 15(A) and 15(B) are flowcharts showing a method of manufacturing a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 16 is a flow chart showing a method of manufacturing a display device having a wire grid polarizing plate according to an embodiment of the present invention. Fig. 17 is a flow chart showing a method of manufacturing a display device having a wire grid polarizing plate according to an embodiment of the present invention.

Claims (21)

A polarizing plate comprising: a linear portion extending in one direction; and a plurality of linear regions in which a plurality of the linear portions are arranged in a direction parallel to an extending direction of the linear portion, Further, the linear portion has a width of a shortest wavelength or less of visible light incident from the outside, and a protective film is disposed between the plurality of linear regions, and the protective film shields visible light. The polarizing plate according to claim 1, wherein the lower surface of the linear portion contacts the first resin layer, and the side surface of the linear portion contacts the upper surface of the second resin layer, the first resin The side surface of the layer is in contact with the side surface of the second resin layer to the protective film. The polarizing plate according to claim 1, wherein a second resin layer is disposed between the linear portions, and a lower surface of the linear portion contacts the first resin layer, the first resin layer The side surface is in contact with the side surface of the second resin layer to the protective film. The polarizing plate according to claim 1, wherein a lower surface of the linear portion contacts the first resin layer, and a side surface of the linear portion contacts the side surface of the first resin layer . The polarizing plate according to claim 1, wherein the protective film covers the linear region. The polarizing plate according to claim 1, wherein the linear portion comprises a conductive metal material. The polarizing plate according to claim 1, wherein the protective film is a resin. The polarizing plate according to claim 7, wherein the protective film is a resin containing a liquid crystal. The polarizing plate according to claim 1, wherein the protective film comprises a material having refractive index anisotropy. A method of fabricating a polarizing plate, comprising: forming a resin layer on a first substrate; forming a linear portion extending in one direction on the resin layer, and extending in the linear portion a step of arranging a plurality of linear regions of the linear portions in a direction parallel to the direction; a step of separating the first substrate from the linear regions; arranging a plurality of the linear regions on the second substrate And the step of forming a protective film for shielding visible light between the plurality of the linear regions arranged on the second substrate. The method for producing a polarizing plate according to claim 10, wherein the step of forming the linear region comprises the steps of: forming a metallic conductive film on the resin layer, and the metallic conductive film The photoresist is coated thereon, and the photoresist is exposed to light using a light having a wavelength shorter than the width of the linear portion. The method for producing a polarizing plate according to claim 10, wherein the step of forming the linear region comprises the steps of: forming a metallic conductive film on the resin layer, and the metallic conductive film Applying a photoresist, pressing the patterned surface of the patterned mold to the photoresist, and irradiating the mold with light having a shorter wavelength than the width of the linear portion, thereby resisting the photoresist The agent is exposed. The method for producing a polarizing plate according to claim 10, wherein the step of forming the protective film is performed by inkjet. The method for producing a polarizing plate according to claim 10, wherein the step of forming the protective film includes forming a protective film between a plurality of the linear regions arranged on the second substrate, A protective film is also formed on the upper surface of the linear region. A display device comprising: a polarizing plate comprising: a linear portion having a width below a shortest wavelength of incident visible light and extending in one direction, and being parallel to an extending direction of the linear portion a plurality of linear regions in which a plurality of the linear portions are arranged in a direction, and a protective film disposed between the plurality of linear regions and shielding visible light; a plurality of pixels extending in the one direction The direction and the direction intersecting the direction extending in the one direction; and the light shielding film, the first substrate and the second substrate. The display device according to claim 15, wherein the protective film overlaps the light shielding film in a direction perpendicular to a surface of the light shielding film, and a width of the protective film is greater than the light shielding The width of the film is narrow. The display device according to claim 15, wherein the pixel comprises: a source signal line formed in parallel with the direction extending in one direction, and a direction extending in a direction extending in the one direction a gate signal line formed in parallel with the direction, and the source signal line is overlapped with the protective film in a direction perpendicular to a surface of the protective film, and a width of the source signal line is greater than the protection The width of the film is narrow. The display device according to claim 17, wherein the gate signal line overlaps the protective film in a direction perpendicular to a surface of the protective film, and a width of the gate signal line It is narrower than the width of the protective film. The display device according to claim 15, comprising a plurality of the light shielding films, and the plurality of light shielding films include: the linear regions in a direction perpendicular to a surface of the light shielding film An overlapping light shielding film and a light shielding film in which the linear region and the protective film overlap. The display device according to any one of claims 16 to 19, further comprising: a red color filter, a green color filter, and a blue color filter, and the plurality of The light shielding film includes: a light shielding film that is in contact with the red color filter and the green color filter, a light shielding film that is in contact with the green color filter and the blue color filter, and a light shielding film in contact with the blue color filter and the red color filter. The display device according to claim 15, wherein the polarizing plate is disposed on at least one of a lower surface of the first substrate and an upper surface of the second substrate.