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TW201839430A - Diffractive optical element - Google Patents

Diffractive optical element Download PDF

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TW201839430A
TW201839430A TW107109121A TW107109121A TW201839430A TW 201839430 A TW201839430 A TW 201839430A TW 107109121 A TW107109121 A TW 107109121A TW 107109121 A TW107109121 A TW 107109121A TW 201839430 A TW201839430 A TW 201839430A
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optical element
shape
diffractive optical
refractive index
high refractive
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TW107109121A
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Chinese (zh)
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TWI772387B (en
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登山伸人
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日商大日本印刷股份有限公司
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Priority claimed from JP2018047875A external-priority patent/JP7196406B2/en
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

Provided is a diffractive optical element capable of further reducing zero-order diffraction light. This diffractive optical element 10 comprises a diffraction layer 15 including: a high refractive index part 11 in which a plurality of projections 11a are arranged side by side in a cross-sectional shape; and a low refractive index part 14 that has a lower refractive index than the high refractive index part 11 and that includes a recess 12 formed at least between the projections 11a. The projections 11a have a sawtooth shape or a shape that imitates a sawtooth shape by a multi-stage outline shape. An inclined plane that is inclined with respect to a sheet surface of the diffractive optical element 10, which has a sawtooth shape or a sawtooth shape imitated by a multi-stage outline shape, has a concave curved plane that is concave toward the projections 11a.

Description

繞射光學元件Diffractive optical element

本發明係關於一種繞射光學元件。This invention relates to a diffractive optical element.

近年來,對於用於避免網路普及帶來之安全風險之個人認證之需求、汽車之自動駕駛化之流程、或所謂之「物聯網」之普及等需要感測器系統之形勢擴大。感測器中存在各種種類,檢測之資訊亦多種多樣,但作為其中之1個方法,存在自光源對於對象物照射光,並自反射而來之光獲得資訊之方法。例如,其一例為圖案認證感測器或紅外線雷達等。 該等感測器之光源使用具有與用途對應之波長分佈或明亮度、廣度者。光之波長經常使用可見光~紅外線,尤其紅外線因具有不易受到外界光之影響且不可見,亦可觀察對象物之略微內部之特徵,故而被廣泛使用。又,作為光源之種類,經常使用LED(Light emitting diode,發光二極體)光源或雷射光源等。例如,於對遠處進行偵測時,適當使用光之廣度較少之雷射光源,於對相對近處進行偵測之情形時或對具有某一程度之廣度之區域進行照射時,適當使用LED光源。 然而,作為對象之照射區域之大小或形狀未必限定於與來自光源之光之廣度(分佈)一致,於該情形時,必須藉由擴散板或透鏡、遮蔽板等對光進行整形。最近,正在開發被稱為光整形擴散片(LSD,Light Shaping Diffuser)之可某種程度將光之形狀整形之擴散板。 又,作為對光進行整形之另一方法,可列舉繞射光學元件(Diffractive Optical Element:DOE)。其應用了光通過週期性排列有具有不同折射率之材料之場所時之繞射現象。DOE係基本上針對單一波長之光而設計,但理論上可將光整形成幾乎任意之形狀。又,於上述LSD中,照射區域內之光強度成為高斯分佈,相對於此,於DOE中,可控制照射區域內之光分佈之均一性。DOE之此種特性於抑制對無用區域之照射所帶來之高效率化或光源數之削減等所帶來之裝置小型化等之方面變得有利(例如,參照專利文獻1)。 又,DOE可應用於如雷射之平行光源或如LED之擴散光源之任一者,又,可應用於紫外線光至可見光、紅外線之寬廣範圍之波長。 於使用DOE使光均一地照射至特定區域之情形時,存在0次繞射光例如聚集於照射區域之中央附近而成為阻礙之情形。尤其於光源為雷射之情形時,該傾向增強。先前,若欲減少0次繞射光,則所需之1次繞射光亦會隨之減少。因此,要求一面抑制所需之1次繞射光減少,一面減少0次繞射光。 藉由使DOE之格子面鋸齒形狀(blaze)化,可使特定波長以特定之次數高效率集中繞射,且先前以來進行藉由階梯狀之多階形狀模仿該鋸齒形狀而構成(例如專利文獻1)。 然而,若僅設為鋸齒形狀(blaze)之形狀,則無用之0次繞射光仍然較多,期待進而減少0次繞射光。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開平09-230121號公報In recent years, the demand for sensor systems for the need for personal authentication to avoid the security risks of network popularization, the autopilot process of automobiles, or the so-called "Internet of Things" has expanded. There are various types of sensors, and there are various kinds of information for detection. However, as one of the methods, there is a method in which light is irradiated from the light source and the light is self-reflected. For example, an example thereof is a pattern authentication sensor or an infrared radar. The light source of the sensors uses a wavelength distribution or a brightness and a breadth corresponding to the use. The wavelength of light is often used from visible light to infrared light. In particular, infrared light is widely used because it is not easily affected by external light and is invisible, and can also observe the slight internal characteristics of the object. Further, as a type of light source, an LED (Light Emitting Diode) light source or a laser light source or the like is often used. For example, when detecting a distant location, it is appropriate to use a laser light source with a small breadth of light, and use it when detecting relatively close places or when irradiating an area having a certain extent. LED light source. However, the size or shape of the irradiation region as the object is not necessarily limited to the extent (distribution) of the light from the light source. In this case, it is necessary to shape the light by a diffusion plate, a lens, a shielding plate, or the like. Recently, a diffusion plate called a Light Shaping Diffuser (LSD) that can shape the shape of light to some extent is being developed. Further, as another method of shaping light, a diffractive optical element (DOE) can be cited. It applies a diffraction phenomenon when light passes through a place where materials having different refractive indices are periodically arranged. The DOE system is basically designed for a single wavelength of light, but in theory it can be photoformed into almost any shape. Further, in the LSD, the light intensity in the irradiation region is Gaussian, and in the DOE, the uniformity of the light distribution in the irradiation region can be controlled. Such a characteristic of the DOE is advantageous in that it is possible to reduce the size of the device due to the increase in efficiency of the irradiation of the unnecessary area or the reduction in the number of light sources (see, for example, Patent Document 1). Moreover, the DOE can be applied to any of a parallel light source such as a laser or a diffused light source such as an LED, and can be applied to a wide range of wavelengths from ultraviolet light to visible light and infrared light. When the DOE is used to uniformly illuminate light to a specific region, there are cases where the diffracted light 0 is concentrated, for example, in the vicinity of the center of the irradiation region. This tendency is enhanced especially when the light source is a laser. Previously, if you want to reduce the diffracted light by 0 times, the required diffracted light will also be reduced. Therefore, it is required to reduce the amount of diffracted light required for one time while reducing the number of diffracted lights by 0 times. By blazing the lattice surface of the DOE, a specific wavelength can be efficiently and efficiently circulated with a certain number of times, and it has been previously constructed by mimicking the sawtooth shape by a stepped multi-order shape (for example, patent document) 1). However, if only the shape of a blaze is used, there are still many unnecessary diffracted lights, and it is expected that the diffracted light will be reduced by 0 times. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. 09-230121

[發明所欲解決之問題] 本發明之課題在於提供一種可進而減少0次繞射光之繞射光學元件。 [解決問題之技術手段] 本發明藉由如下之解決方法解決上述課題。再者,為了容易理解,標註與本發明之實施形態對應之符號進行說明,但並不限定於此。 第1發明係一種繞射光學元件(10),其係對光進行整形者,且具備繞射層(15),該繞射層(15)具有:高折射率部(11),其並排配置有複數個凸部(11a);及低折射率部(14),其係折射率低於上述高折射率部(11),且至少包含形成於上述凸部(11a)之間之凹部(12);上述凸部(11a)具有藉由高度不同之複數個階部形成之多階形狀,上述高折射率部(11)於每單位面積中,最深之面之面積最大,最上位面之下一階之面之面積最小。 第2發明係如第1發明之繞射光學元件(10),其特徵在於:上述高折射率部(11)係最上位面之面積為上述高折射率部之最下位面之面積之0.6~0.9倍。 第3發明係如第1或第2發明之繞射光學元件(10),其特徵在於:上述高折射率部(11)於每單位面積中,自最深之面朝向最上位面之下一階之面,各階部之面積逐次減少。 第4發明係一種繞射光學元件(10),其係對光進行整形者,且具備繞射層(15),該繞射層(15)具有:高折射率部(11),其於剖面形狀中並排配置有複數個凸部(11a);及低折射率部(14),其係折射率低於上述高折射率部(11),且至少包含形成於上述凸部(11a)之間之凹部(12);上述凸部(11a)係鋸齒形狀或藉由多階之輪廓形狀模仿鋸齒形狀而成之形狀,相對於鋸齒形狀或藉由多階之輪廓形狀模仿之鋸齒形狀之該繞射光學元件(10)之薄片面傾斜之斜面具有朝向上述凸部(11a)凹陷之凹狀曲面。 第5發明係如第4發明之繞射光學元件(10),其特徵在於:上述凸部(11a)於其側面形狀之至少一側具有藉由高度不同之複數個階部模仿上述鋸齒形狀而成之多階形狀,並藉由上述階部之高度與寬度之至少一者根據部位不同而模仿上述凹狀曲面。 第6發明係如第4或第5發明之繞射光學元件,其特徵在於:上述凸部於其側面形狀之至少一側具有藉由高度不同之複數個階部模仿上述鋸齒形狀而成之多階形狀,且於每單位面積中,最深之面之面積最大,最上位面之下一階之面之面積最小。 第7發明係如第5或第6發明之繞射光學元件(10),其特徵在於:上述階部之每一階之高度固定,藉由上述階部之寬度根據部位不同而模仿上述凹狀曲面。 第8發明係如第7發明之繞射光學元件(10),其特徵在於:於將x軸設定成上述凸部(11a)並排之方向,將上述斜面升高之方向設為x軸之正方向,設定與該繞射光學元件(10)之薄片面正交之y軸,將上述凸部(11a)突出之方向設為y軸之正方向,將包含上述凸部(11a)之前端在內計數所得之階部之總階數設為L,將每一階之寬度之減少率設為f,將以上述凹部(12)之最低位置作為0計數時之對象之階部之階數設為l v,將上述階部之每一階之高度以h設為固定值,將階0之寬度比率設為C時,藉由多階形狀所模仿之上述凹狀曲面之剖面中之成為階0之凹頂點與各凸部之頂點之軌跡之曲線係, 於將x座標相對於間距之比率設為S,且 x'=0.5×f×l v2 +C×l v S=P/{tw+Σx'i} Σ設為i=0~L-1 時,階梯形狀之頂部x, y座標以 x=0.5×f×l v2 +C×l v y=l v×h 表示。 第9發明係如第1至第8發明中任一項之繞射光學元件(10),其特徵在於:上述高折射率部(11)形成繞射格子,該繞射格子具有自形成有凹凸形狀之面之法線方向觀察,上述凸部(11a)與上述凹部(12)之交界包含曲線與將複數個線段連接而成之摺線之至少一者之圖案。 第10發明係如第1至第8發明中任一項之繞射光學元件(10),其特徵在於:上述高折射率部(11)形成光柵單元陣列型(亦成為「Grating Cell Arry型」或「GCA型」)之繞射格子,該光柵單元陣列型之繞射格子係自形成有凹凸形狀之面之法線方向觀察,形成為將並排配置有同一凹凸形狀之單位單元平鋪複數個而成之格子狀圖案。 [發明之效果] 根據本發明,可抑制一次光之繞射效率之降低,並減少零次光。[Problem to be Solved by the Invention] An object of the present invention is to provide a diffractive optical element which can further reduce 0-order diffracted light. [Technical means for solving the problem] The present invention solves the above problems by the following solution. In addition, for the sake of easy understanding, the symbols corresponding to the embodiments of the present invention are described, but the present invention is not limited thereto. The first invention is a diffractive optical element (10) which is shaped to light and has a diffraction layer (15) having a high refractive index portion (11) arranged side by side. a plurality of convex portions (11a); and a low refractive index portion (14) having a refractive index lower than the high refractive index portion (11) and including at least a concave portion formed between the convex portions (11a) (12) The convex portion (11a) has a multi-step shape formed by a plurality of steps different in height, and the high refractive index portion (11) has the largest area per unit area and the deepest surface, and the uppermost surface The area of the first order is the smallest. According to a second aspect of the invention, in the diffractive optical element (10) of the first aspect of the invention, the area of the uppermost surface of the high refractive index portion (11) is 0.6 to the area of the lowermost surface of the high refractive index portion. 0.9 times. According to a third aspect of the present invention, in the diffractive optical element (10) according to the first or second aspect of the present invention, the high refractive index portion (11) is one step from a deepest surface to a lowermost surface per unit area. On the other hand, the area of each step is gradually reduced. The fourth invention is a diffractive optical element (10) which is shaped to light and has a diffraction layer (15) having a high refractive index portion (11) in a cross section a plurality of convex portions (11a) are arranged side by side in the shape; and a low refractive index portion (14) having a refractive index lower than the high refractive index portion (11) and including at least between the convex portions (11a) a concave portion (12); the convex portion (11a) has a zigzag shape or a shape obtained by mimicking a zigzag shape by a multi-step contour shape, and the winding shape is imitated with respect to a sawtooth shape or a contour shape that is mimicked by a multi-step contour shape The inclined surface of the sheet surface of the incident optical element (10) has a concave curved surface that is recessed toward the convex portion (11a). According to a fifth aspect of the present invention, in the diffractive optical element (10), the convex portion (11a) has a plurality of steps different in height from at least one side of the side surface shape to mimic the sawtooth shape. The multi-step shape is formed, and the concave curved surface is simulated according to at least one of the height and the width of the step portion. According to a sixth aspect of the present invention, in the diffractive optical element according to the fourth or fifth aspect of the present invention, the convex portion has a plurality of steps different in height from at least one side of the side shape to imitate the zigzag shape. The shape of the step, and in the unit area, the area of the deepest surface is the largest, and the area of the first step below the uppermost surface is the smallest. According to a seventh aspect of the present invention, in the diffractive optical element (10) of the fifth aspect or the sixth aspect, the height of each step of the step portion is fixed, and the concave shape is mimicked according to a portion of the width of the step portion. Surface. According to a seventh aspect of the present invention, in the diffractive optical element (10), the x-axis is set such that the direction in which the convex portion (11a) is arranged in parallel, and the direction in which the inclined surface is raised is set to the positive x-axis. The direction is set to the y-axis orthogonal to the sheet surface of the diffractive optical element (10), and the direction in which the convex portion (11a) protrudes is set to the positive direction of the y-axis, and the front end of the convex portion (11a) is included The total order of the step obtained by the inner count is set to L, and the reduction rate of the width of each step is set to f, and the lowest position of the concave portion (12) is set as the order of the step of the object when the count is 0. For lv, the height of each step of the above step is set to a fixed value by h, and when the width ratio of the step 0 is set to C, the profile of the concave curved surface imitated by the multi-order shape becomes the order 0. The curve of the concave apex and the trajectory of each convex portion is set to S, and the ratio of the x coordinate to the pitch is set to S, and x'=0.5×f×lv 2 +C×lv S=P/{tw+Σx'i} When Σ is set to i=0 to L-1, the top x and y coordinates of the step shape are represented by x=0.5×f×lv 2 +C×lvy=lv×h. The diffractive optical element (10) according to any one of the first to eighth aspects of the present invention, characterized in that the high refractive index portion (11) forms a diffraction grating having a self-forming unevenness When viewed in the normal direction of the surface of the shape, the boundary between the convex portion (11a) and the concave portion (12) includes a pattern of at least one of a curved line and a polygonal line connecting a plurality of line segments. The diffractive optical element (10) according to any one of the first to eighth aspects of the present invention, characterized in that the high refractive index portion (11) forms a grating element array type (also referred to as "Grating Cell Arry type" Or a diffraction grating of the "GCA type", the diffraction grating pattern of the grating element array is formed by tiling a unit cell in which the same uneven shape is arranged side by side in the normal direction of the surface on which the uneven shape is formed. Made of a grid pattern. [Effects of the Invention] According to the present invention, it is possible to suppress a decrease in the diffraction efficiency of primary light and to reduce zero-order light.

以下,參照圖式等對用以實施本發明之最佳實施形態進行說明。 (實施形態) 圖1A係表示自薄片面之法線方向觀察所得之繞射格子之凹凸形狀形成為凸部與凹部之交界包含曲線之規則或不規則圖案的繞射光學元件之例之俯視圖。 於本實施形態中,作為1例,可應用於如圖1A所示之具有乍一看呈不規則之凹凸形狀之圖案之繞射光學元件。於以下之說明中,將該圖1A所示之類型之繞射光學元件亦稱為不規則型。但,亦存在該不規則之圖案藉由繞射光學元件之目標出射圖案而成為規則圖案之情形,因此不規則型之稱呼係方便起見之稱呼,並不限定於不規則。又,於圖1A中,不規則型之圖案係包含曲線,但亦存在包含藉由繞射光學元件之目標出射圖案而成為直線或將包含曲線之線段連接而成之摺線之圖案之情形。因此,關於不規則型之繞射格子之圖案,自形成有高折射率部(下述)之凹凸形狀之面之法線方向觀察,凸部與凹部之交界包含曲線與將複數個線段連接而成之摺線之至少一者。 圖1B係表示自薄片面之法線方向觀察所得之繞射格子之凹凸形狀形成為將並排配置有相同凹凸形狀之單位單元平鋪複數個而成之格子狀圖案的繞射光學元件之例之俯視圖。 於本實施形態中,作為另一例,可應用於如圖1B所示般形成為將並排配置有相同凹凸形狀之單位單元平鋪複數個而成之格子狀圖案之繞射光學元件。於以下之說明中,將該圖1B所示之類型之繞射光學元件亦稱為光柵單元陣列(Grating Cell Array)型或GCA型。光柵單元陣列型之繞射光學元件係構成於每個單位單元中,藉由繞射格子而繞射之光之方向及角度不同,且藉由將大量單位單元平鋪而獲得所需之光學特性之繞射光學元件。即,於光柵單元陣列型之繞射光學元件中,高折射率部於自形成有凹凸形狀之面之法線方向觀察,被劃分成格子狀,於該區間內沿特定方向延伸之相同形狀之凸部於與上述特定之延伸方向正交之方向上並排配置,於各區間內,凸部之寬度及延伸方向不同。 圖2A係表示圖1A所示之不規則型之繞射光學元件之例中之部分週期構造之一例的立體圖。 圖2B係表示圖1B所示之GCA型之繞射光學元件之例中之部分週期構造之一例的立體圖。 圖3係於圖2A中之箭頭G-G'之位置將繞射光學元件切斷後之剖視圖。 於以下之說明中,由於需要解釋GCA型特有之剖面形狀,因此主要舉不規則型為例來進行說明。但,關於GCA型,若於圖1A中所示之箭頭G-G'之位置切斷,則亦成為相同之剖面形狀,如上所述,可同樣地應用本發明。 圖4係說明繞射光學元件之圖。 再者,包含圖1在內,以下所示之各圖係模式性地表示之圖,且為了容易理解,各部之大小、形狀適當誇張表示。 又,於以下之說明中,示出具體之數值、形狀、材料等進行說明,但該等可適當變更。 再者,關於本發明中所使用之形狀或幾何學條件、及特定出該等程度之用語、例如「平行」、「正交」、「相同」等用語或長度或角度之值等,並不拘於嚴格之意義,而為包含可期待相同功能之程度之範圍進行解釋。 又,於本發明中,所謂「對光進行整形」係指藉由控制光之行進方向而使投影於對象物或對象區域之光之形狀(照射區域)成為任意之形狀。例如,如圖4之例所示,準備光源部210,該光源部210係發出於直接投影於平面形狀之屏幕200時照射區域202成為圓形之光201(圖4(b))。將藉由使該光201透過本發明之繞射光學元件10,而使照射區域204成為正方形(圖4(a))或長方形、圓形(未作圖示)等目標形狀稱為「對光進行整形」。 再者,藉由將光源部210與於光源部210所發出之光通過之位置至少配置有1個之本實施形態之繞射光學元件10進行組合,可製成能夠以對光進行整形後之狀態照射之光照射裝置。 又,於本發明中,所謂透明係指至少使所利用之波長之光透過。例如,假設即便不會使可見光透過,但只要使紅外線透過,則於用於紅外線用途之情形時,亦作為透明來進行處理。 本實施形態之繞射光學元件10係對光進行整形之繞射光學元件(DOE)。繞射光學元件10例如係以如下方式進行設計:針對來自發出波長為500 nm之光之光源部210之光,使光擴散成十字形狀,具體而言,例如使光擴散成於±50度內以寬度為±3.3度擴散之2條光帶交叉而成之形狀。 本實施形態之繞射光學元件10於圖1A、圖1B所示之A、B、C、D之各個位置深度不同。即,繞射光學元件10係藉由4階段之高度不同之多階形狀構成。並且,繞射光學元件10通常具有具備不同週期構造之複數個區域(部分週期構造:例如圖1A、圖1B之E、F區域)。於圖2A、圖2B中,提取表示部分週期構造之一例。 如圖3所示,繞射光學元件10具備於剖面形狀中並排配置有複數個凸部11a之高折射率部11。於GCA型之繞射光學元件中,該高折射率部11維持相同剖面形狀並直接於剖面之進深方向延伸。另一方面,於不規則型之繞射光學元件中,若剖面位置改變,則剖面形狀變化,而成為多種多樣之剖面形狀之繞射格子大量排列之形態。再者,於不規則型中,用以對繞射格子之形狀進行特定之剖面、即用以對影響繞射光之繞射現象之繞射格子之具體形狀進行特定之剖面構造必須設為於與自薄片面之法線方向觀察時之凸部與凹部之交界所描繪之線(曲線或直線)正交之方向上切斷之剖面中之剖面構造。 高折射率部11例如亦可藉由蝕刻處理對石英(SiO2 、合成石英)進行加工而形成。又,高折射率部11亦可為採集對石英進行加工而成之物體之形狀而製作成形模,並利用該成形模使游離輻射硬化性樹脂組合物硬化而成者。使用游離輻射硬化性樹脂組合物製造此種週期構造之物體之方法已知有多種方法,繞射光學元件10之高折射率部11可利用該等公知之方法適當製作。 又,包含形成於凸部11a之間之凹部12及凸部11a之頂部附近之空間13之圖3之上方部分存在空氣,而成為折射率低於高折射率部11之低折射率部14。藉由該等高折射率部11及低折射率部14交替地並排配置之週期構造,構成具備對光進行整形之作用之繞射層15。 凸部11a具有於側面形狀之一側(於圖3中為左側)具備高度不同之4個階部之多階形狀。具體而言,凸部11a於一側面側具有最突出之階 3階部11a-3、較階 3階部11a-3低一階之階 2階部11a-2、較階2階部11a-2進而低一階之階1階部11a-1、及較階1階部11a-1進而低一階之階0階部11a-0。又,凸部11a之側面形狀之另一側(於圖3中為右側)成為自階3階部11a-3至階0階部11a-0於直線上相連之側壁部11b。 此處,本實施形態之凸部11a係藉由多階之輪廓形狀模仿鋸齒形狀而成之形狀,相對於藉由多階之輪廓形狀模仿之鋸齒形狀之繞射光學元件10之薄片面傾斜之斜面具有朝向凸部11a凹陷之凹狀曲面。此處,所謂「藉由多階之輪廓形狀模仿」,於本實施形態中表示以連結各階部之角部分之線假性地構成凹狀曲面,但並不限定於角部分,可為連結階部之面之中央之線,亦可為連結邊部分之線。又,「模仿」之語句表示假性地構成凹狀曲面。於本實施形態中,就宏觀來看,表示成為凹狀曲面,就微觀來看,表示構成為階梯狀。換一種表達亦可成為「近似」。於至此為止所說明之例中,對4 階之形態進行了說明,因此成為相對粗糙地模仿之形態,若設為下述16 階或進而其以上之階數,則可製成更準確地模仿之形狀。 圖5係對繞射光學元件10中之凸部11a之凹狀曲面進行說明之圖。 圖6A係將本實施形態之繞射光學元件10與先前形態進行比較表示之圖。圖6A(a)表示於圖6A(b)中之箭頭H-H之位置將先前之繞射光學元件切斷所得之剖面。圖6A(b)係自薄片面之法線方向觀察先前之繞射光學元件之俯視圖。圖6A(c)係自薄片面之法線方向觀察本實施形態之繞射光學元件10之俯視圖。圖6A(d)係將圖6A(b)與圖6A(c)重疊表示之圖。 於先前之繞射光學元件中,如圖5中兩點鏈線所示,各階部之每一階之深度(高度)固定,又,寬度亦變得固定。因此,於圖5所示之剖面中,將先前之繞射光學元件之各階部之角部分連結而成之斜面L0成為平面(於剖面中成為直線)。 相對於此,於本實施形態之繞射光學元件10中,將各階部之角部分連接而成之斜面L成為朝向凸部11a凹陷之凹狀曲面(於剖面中成為凹狀曲線)。為了模仿上述凹狀曲面,可改變各階部之深度(高度),亦可改變各階部之寬度,亦可將該等兩者組合。然而,若考慮到藉由蝕刻處理製造階部之製造方法,則最簡單地進行製造之方法係改變各階部之寬度之方法。 因此,本實施形態之繞射光學元件10為了模仿上述凹狀曲面,而使各階部之寬度隨著凹部之深度變淺而逐漸變窄。因此,如圖5及圖6所示,凸部11a之寬度整體變窄。 於不規則型之繞射光學元件10中,如圖1A所示,於設計上,凸部與凹部之交界所描繪之線成為曲線之部分較多。並且,亦如先前所說明,對繞射光學元件之光學特性造成影響之剖面構造係與該曲線正交之方向(法線方向)之剖面中之剖面構造。然而,於實際之繞射光學元件10中,製作成藉由微細之摺線形狀、尤其如圖6A所示之將正交之2方向之直線連接而成之摺線形狀使凸部與凹部之交界所描繪之線近似曲線之形狀之情形較多。其主要取決於製造上之情況。 於該情形時,若於例如如圖6A(a)所示般切斷之剖面中對圖5所示之剖面構造進行研究,則各階之寬度受到切斷位置之影響而較原本之應作為剖面構造進行研究之寬度變寬或變窄,從而無法進行正確之研究。 圖6B係將原本之設計圖案之曲線與圖6A之圖重疊表示之圖。圖6B(b)係將理想設計圖案之曲線重疊於圖6A(b)上之圖,圖6B(c)係將理想設計圖案之曲線與本實施形態之設計圖案之曲線重疊於圖6A(c)上之圖。再者,於圖6B(c)上,實線為理想設計圖案之曲線,虛線為本實施形態之設計圖案之曲線。 於圖6B中明確示出各階部之寬度隨著凹部之深度變淺而逐漸變窄之情況。如此,於在實際製作之繞射光學元件中對各階部之寬度進行研究之情形時,如圖6B般藉由連結頂點之曲線獲得設計上之曲線,並以與該曲線正交之方向之剖面形狀或寬度尺寸進行研究較為重要。 於至此為止之說明中,示出了4 階之多階形狀之例,但該階數亦可更多。 圖7係表示具有8 階之多階形狀之繞射光學元件10之圖。 若以如上方式使階數增多,則模仿凹狀曲面之精度變高。 此處,鋸齒形狀之斜面設為模仿凹狀曲面而成之形狀,並對該曲面之形狀進行說明。 圖8係說明凹狀曲面之剖面中之曲線與多階形狀之圖。 設置如圖8所示之x-y正交座標。即,將x軸設定為凸部11a並排之方向,將斜面升高之方向設為x軸之正方向,設定與繞射光學元件10之薄片面正交之y軸,將凸部11a突出之方向設定為y軸之正方向。 將包含凸部11a之前端在內計數所得之階部之總階數設為L。又,將每一階之寬度之減少率設為f。進而,將以凹部之最低位置為0計數時之對象之階部之階數設為l v,將各階部之每一階之高度設為h並設為固定值,將階 0之寬度比率定義為C。如此,藉由多階形狀模仿之凹狀曲面之剖面中之曲線(成為階 0之凹頂點與各凸部之頂點之軌跡之曲線)由以下之式所表示。 於將x座標相對於間距之比率設為S, x'=0.5×f×l v2 +C×l v S=P/{tw+Σx'i} Σ設為i=0~L-1 時,階梯形狀之頂部x, y座標以如下方式表示。 x=S×(0.5×f×l v2 +C×l v) y=l v×h 再者,於將多階形狀之階數設為n、將最上位階之寬度設為tw時,間距係將 0.5×f×(n-1)2+C×(n-1)+tw 標準化而成者。 又,所謂階 0之寬度比率C,表示作為凹部之最低位置之階 0之寬度相對於先前之各階部之寬度固定之情形時之每一階之寬度之比率。 此處,關於將各階部之每一階之高度設為h,若相對於理論值ht設為h=ht×1.05~h=ht×1.15,則可獲得良好之結果。再者,理論值ht=波長/{level數(折射率-1)}。 又,以間距之比率並以如下方式定義各階部(level)之寬度d0~d7。 di=C+i×f 其中,i為0~6之整數。 此處,f<0。 又,於最大繞射角為10°以上之繞射光學元件中, -20≤C/f≤-6, 較理想為於設為 -16≤C/f≤-10.5 -0.0275≤f≤-0.0125 時, 0.13≤C≤0.4 ,於C為該範圍之情形時,較理想為 -0.0225≤f≤-0.0125。 於相對於作為最深之面之0 level之寬度而將最上位之寬度之比率設為t時,較理想為 0.5≤t≤0.9, 0.6≤t≤0.8。 以下,例示具體例。 圖9係表示8階之剖面形狀之具體例之圖。於一併記載於圖9中之下方之表中一併記載x'、y之值。該x'表示對階梯構造之剖面進行觀察時之頂部之橫向位置,y表示縱向位置,係於圖9中作為曲線圖而表示之剖面形狀(階梯構造)之座標資料(頂點座標)。再者,於以下之圖中,與曲線圖一併記載之表中之值表示曲線圖中之座標資料。 於圖9之例中,成為波長850 nm,間距=3284 nm(繞射角15°),8 level,f=-0.02,C=0.25,t=0.8,h=850/8*1.1*(n-1),n=1.5。於該情形時,成為C/f=-12.5。 根據基於x'=0.5×f×l v2 +C×l v 之式,0 level至最上位level之寬度成為1.4542,各level之寬度成為根據x值導出之寬度×3284/1.4542。此時之零次光強度充分地小至0.15776%。 圖10係表示4階之剖面形狀之具體例之圖。於圖10中一併記載x、y之值。 於圖10之例中,成為波長850 nm,間距=3284 nm(繞射角15°),4 level,f=-0.02,C=0.2,t=0.8,h=850/4*1.1(n-1.0),n=1.5。於該情形時,成為C/f=-10。 根據基於x'=0.5×f×l v2 +C×l v 之式,0 level至最上位level之寬度成為0.662,各level之寬度成為根據x值導出之寬度×3284/0.662。此時之零次光充分地小至0.2803%。 繼而,實際製作上述實施形態與比較例,並示出對0次繞射光之強度進行實測所得之結果。 圖11係說明0次繞射光之強度測定方法之圖。 於測定0次繞射光之強度時,首先,如圖11(a)所示,於使光源LS發出之特定波長之光通過繞射光學元件10後,進而藉由光圈AP僅使0次繞射光通過之特定範圍之光到達至感測器S,藉由功率計M測量存在繞射光學元件10之情形時之強度。 繼而,如圖11(b)所示,僅將繞射光學元件10自圖11(a)之狀態中去除,測量不存在繞射光學元件10之情形時之強度。0次繞射光之強度可藉由(存在繞射光學元件10之情形時之強度)/(不存在繞射光學元件10之情形時之強度)而求出。 再者,用於測定之光源LS設為雷射光源與鹵素光源之2種,波長設為850 nm。 藉由上述方法針對本發明之繞射光學元件10,測定0次繞射光之強度。再者,作為本發明之繞射光學元件10,分別測定圖3、5所示之4 level者及圖7、8所示之8 level者。 本發明之繞射光學元件10之4 level品之每一階之高度h=470 nm。該值相當於h=ht×1.106。又,設為C=0.1825,f=-0.02。再者,間距如圖1及圖6所示般視部位而多種多樣,因此難以特定。 再者,於本發明之繞射光學元件10中,連接各階部之線於剖面中成為凹狀之曲線。 又,為了與本發明之繞射光學元件10進行比較,比較例亦準備4 level品與8 level品。 圖12係表示比較例之繞射光學元件之圖。 作為比較例,如圖12所示,連接各階部之線於剖面中為直線。並且,關於比較例,亦準備4 level與8 level之2種。每一階之高度h設為與本發明品相同。 圖13係表示針對本發明之繞射光學元件10與比較例測定0次繞射光之強度所得之結果圖。於圖13中,圓形標記及方形標記所表示之資料表示雷射光源之資料,曲線所表示之資料表示鹵素光源之資料。 如圖13所示,無論是雷射光源抑或是鹵素光源,與比較例相比,本發明之0次繞射光之強度均大幅下降。因此,於實際品中證明若相當於鋸齒形狀之斜面之部分構成為凹狀曲面,則可降低0次繞射光之強度。 繼而,為了更詳細地研究本發明之效果而進行了模擬。 繞射效率之解析模擬使用基於嚴格耦合波分析(RCWA(rigorous coupled-wave analysis)之運算。RCWA於數學上歸結於解開矩陣之固有值問題與一次方程式,因此不存在原理上之困難。又,於基於該RCWA之電磁場分析之模擬結果與現實中,若將現物中之形狀錯誤等排除,則基本上一致。 再者,本次模擬並未考慮到如圖2A所示之立體形狀,而是將如圖2B所示之一維且進深方向設為無限長度來進行運算。 模擬係藉由以下之條件而進行。 波長:850 nm 高折射率部之折射率n:1.5 低折射率部之折射率:1.0 間距:2 μm,4 μm之2種 階數:8 level 作為比較例,首先,將以每一階之高度為理論值之高度ht=212.5 nm者設為比較例1。又,將每一階之高度h=ht×1.106=235 nm者設為比較例2。該高度h=ht×1.106=235 nm與之前用於實測者相同。 又,作為本發明品之相當於斜面之部分成為凹狀曲面之實施例,準備2種。首先,將與先前之實測品同樣地依序寬幅地構成較深部分之寬度者設為實施例1。又,將不改變寬度並藉由使較深部分之高度依序降低而使相當於斜面之部分成為凹狀曲面之形態設為實施例2。 圖14係表示使每一階之高度變化之實施例2之形狀之圖。 如先前所說明,藉由如圖14般使每一階之高度變化,亦可模仿凹狀曲面。 圖15係將模擬之結果總結之圖。於模擬中,亦針對1次繞射光求出參考值。 根據模擬之結果亦獲得如下結果:只要為相當於斜面之部分成為凹狀曲面之形態,便可大幅減少0次繞射光。 再者,藉由多階形狀假性再現鋸齒形狀時之階數(level數)並不限定於上述4階、8階。 圖16係表示以16階模仿鋸齒形狀之例之圖。再者,若增加階數,則可接近更平滑之斜面,亦可製成可大致視作無階梯之程度者、即實質上視作曲面者。根據上述實測及模擬之結果,可謂即便於平滑之斜面之情形時,只要將斜面設為凹狀曲面,則亦可降低0次繞射光之強度。 繼而,表示用以對階 0之寬度變化率C、每一階之寬度之減少率f、最上位之寬度之比率t之影響進行說明之模擬結果。 (8-level) 將波長設為850 nm、繞射光學元件之折射率設為1.5對下述式所表示之8-level之構造進行模擬所得之結果示於圖17至圖19。每一階之高度之理論值成為ht=212.5 nm,並設為h=ht×1.1之223.125 nm。t為最上位面(level-7)相對於最下位(level-0)之寬度之比率。式與上述式相同,使用以下之式。 於將x座標相對於間距之比率設為S, x'=0.5×f×l v2 +C×l v S=P/{tw+Σx'i} Σ設為i=0~L-1 時,階梯形狀之頂部x, y座標以如下方式表示。 x=S×(0.5×f×l v2 +C×l v) y=l v×h 圖17係設為f=-0.02、t=0.8,並設為繞射格子之繞射角成為15°之3284 nm間距時之使C變化時之零次光強度之曲線圖。得知於0.21≤C≤0.40之情況下,零次光較低而成為0.5%以下。 圖18係設為C=0.25、t=0.8,並設為繞射格子之繞射角成為15°之3284 nm間距時之使f變化時之零次光強度之曲線圖。得知於-0.0225≤f≤-0.0125時,零次光較低而成為0.5%以下。 圖19係設為f=-0.02、C=0.25,並設為繞射格子之繞射角成為15°之3284 nm間距之時之使t變化時之零次光強度之曲線圖。得知於t為0.5~0.9之情況下,零次光較小而成為0.5%以下。 根據該等結果,可求出8-level中之C/f之適當之範圍。此處,將零次光強度成為1%以下之範圍設定為C/f之適當之範圍。 根據圖17之結果得知,於0.18<C之情況下,零次光成為1%以下。於該圖17之例中,f=-0.02,因此較理想為設為C/f<-9。 又,根據圖18之結果得知,於-0.0275<f<-0.005之情況下,零次光成為1%以下。於該圖18之例中,C=0.25,因此較理想為設為-50<C/f<-9。 作為於該等2個範圍中共用之範圍,8-level中之C/f之適當之範圍為-50<C/f<-9。 (4-level) 將波長設為850 nm、繞射光學元件之折射率設為1.5對下述式所表示之4-level之構造進行模擬所得之結果示於圖20至圖22。每一階之高度之理論值成為ht=425 nm,並設為h=ht×1.1之467.5 nm。t為最上位面(level-3)相對於最下位(level-0)之寬度之比率。式與上述式相同,並使用以下之式。 於將x座標相對於間距之比率設為S, x'=0.5×f×l v2 +C×l v S=P/{tw+Σx'i} Σ設為i=0~L-1 時,階梯形狀之頂部x, y座標以如下方式表示。 x=S×(0.5×f×l v2 +C×l v) y=l v×h 圖20係設為f=-0.02、t=0.8且設為繞射格子之繞射角成為15°之3284 nm間距時之使C變化時之零次光強度之曲線圖。得知於0.13≤C≤0.33之情況下,零次光較低而成為0.5%以下。 圖21係設為C=0.18、t=0.8且設為繞射格子之繞射角成為15°之3284 nm間距時之使f變化時之零次光強度之曲線圖。得知於-0.0275≤f≤-0.0125時,零次光較低而成為0.5%以下。 圖22係設為f=-0.02、C=0.18且設為繞射格子之繞射角成為15°之3284 nm間距時之使t變化時之零次光強度之曲線圖。得知於t為0.3~0.9之情況下,零次光較小而成為0.5%以下。 根據該等結果,可求出4-level中之C/f之適當之範圍。此處,將零次光強度成為1%以下之範圍設定為C/f之適當之範圍。 根據圖20之結果得知,於0.1<C之情況下,零次光成為1%以下。於該圖20之例中,f=-0.02,因此較理想為設為-5<C/f。 又,根據圖21之結果得知,於f<0之情況下,零次光成為1%以下。於該圖21之例中,C=0.18,因此無法根據f<0之條件求出C/f之範圍,於該條件下可為任何值。 作為於該等2個範圍中共用之範圍,4-level中之C/f之適當之範圍為-5<C/f。 如上所述,8-level中之C/f之適當之範圍為-50<C/f<-9,4-level中之C/f之適當之範圍為-5<C/f。因此,作為該等所共用之範圍,可將-5<C/f<-9設定為C/f之適當之範圍。 此處,若著眼於減少率f,則減少率f具有C/f之反比例之關係。因此,若以減少率f成為分子之方式改寫上述範圍,則較理想為-0.2<f/C<-0.1之範圍。減少率f係每一階之寬度之減少率,且係無因次之值,又,認為若C固定,則面積之變化率亦較理想為上述範圍。因此,各階部之面積減少之減少率較理想為-5%以上、-20%以下之範圍。 又,根據圖19認為於8-level中,t較理想為0.5~0.9,根據圖22認為於4-level中,t較理想為0.3~0.9。t為最上位面(level-3)相對於最下位(level-0)之寬度之比率。因此,可謂高折射率部之最上位面之面積較理想為高折射率部之最下位面之面積之0.5~0.9倍之面積。 繼而,將對具有連結本發明之頂點之軌跡為凹狀曲面之構成之繞射光學元件、具有作為理論構造之頂點呈直線狀並排之構成之繞射光學元件、及具有與本發明相反之連結頂點之軌跡為凸狀曲面之構成之繞射光學元件進行比較之模擬之結果示於圖23至圖25。於圖23至圖25之模擬中,設為f=-0.02、C=0.18、t=0.8、3248 nm間距(繞射角15°)。 圖23係表示具有連結本發明之頂點之軌跡為凹狀曲面之構成之繞射光學元件之剖面形狀與模擬結果的圖。再者,於圖23至圖25中,為了容易理解剖面形狀之差異而以一點鏈線一併記載直線。 如圖23所示,於本發明之構造中,零次光成為0.26%。 圖24係表示具有作為理論構造之頂點呈直線狀並排之構成之繞射光學元件之剖面形狀與模擬結果的圖。 如圖24所示,於作為理論構造之所有階部相同之情形時,零次光成為0.88%。 圖25係表示具有與本發明相反之連結頂點之軌跡為凸狀曲面之構成之繞射光學元件之剖面形狀與模擬結果的圖。 如圖25所示,於與本發明相反之相對於鋸子之刃型斜面成為凸型之構造中,零次光成為2.90%。 根據圖23至圖25之結果確認到,於如本發明般具有連結頂點之軌跡為凹狀曲面之構成之繞射光學元件中,可減少零次光。 繼而,對可將更容易理解之本發明之構造與先前構造進行比較之方法進行說明,代替藉由上述數式確認凹狀曲面之方法。於本發明之構成中,連結頂點而成之軌跡成為凹狀曲面,因此各階之上表面之面積因階部而不同。以下著眼於該方面進行說明。 圖26係為了將先前構造之繞射光學元件與本發明之繞射光學元件進行比較而並列表示之俯視圖。圖26(a)係表示藉由先前作為理想設計而已知之方法設計之繞射光學元件之4-level之各面,且表示1面至4面之資料。圖26(b)係基於本發明之構造,將圖26(a)之形狀改良而成者。各個面係將最下位面(階0階部11a-0:參照圖3)作為0面,最上位面(階3階部11a-3)作為3面示於圖中。 圖27A係表示圖26中所示之各面相對於圖26(a)之基於先前之理想設計之4-level繞射光學元件之面積之比率的圖。 圖27B係表示各面相對於基於先前之理想設計之8-level繞射光學元件之面積之比率的圖。 圖28A係表示圖26中所示之各面相對於圖26(b)之本發明之4-level繞射光學元件之面積之比率的圖。 圖28B係表示各面相對於本發明之8-level繞射光學元件之面積之比率的圖。 圖27A、27B及圖28A、28B針對繞射光學元件(DOE)之1邊為10 μm、50 μm、100 μm之正方形區域求出面積比率。正方形區域之大小越大,成為樣品之面越多,因此具有收斂成固定值之傾向。 觀察圖27A、27B得知,關於先前之理想設計中之各面之比率,4-level各個面大致為25%,8-level各個面為11~14%而為大致相等之比率。 另一方面,觀察圖28A、28B得知,於本發明之構造中,作為最下位面之level-0之面積最大,最上位面之下一階之面(level-2、level-6)面積最小。 圖29係基於圖26(a)、(b)之資料實際製造繞射光學元件並測定零次光所得之實測值之結果。再者,於圖29中一併記載4-level與8-level之實測值。 觀察圖29得知,4-level、8-level以本發明之構造而零次光均較先前之形態減小。 於上述圖28A之例中,若按照面積大小從大到小排列,則依序為level-0、level-1、level-3、level-2(以下稱為type1)。以下,進而列舉按照面積大小從大到小依序為level-0、level-3、level-1、level-2之例(以下稱為type2),進而以相同條件對成為該等之基本之理想設計之形態進行比較。再者,於該比較中,使level-0至level-3之高度之差、即凹凸之深度(以下,亦稱為DOE高度)變化並亦對DOE高度之影響進行研究。再者,DOE高度通常取決於繞射對象之光之波長。 圖30係表示3種繞射光學元件之面積比率之圖。 圖31係自薄片面之法線方向觀察理想設計之繞射光學元件之圖。 圖32係自薄片面之法線方向觀察type1之繞射光學元件之圖。 圖33係自薄片面之法線方向觀察type2之繞射光學元件之圖。 圖34係以數值表示3種繞射光學元件之模擬結果之圖。 圖35係以曲線圖表示3種繞射光學元件之模擬結果之圖。 再者,圖34、圖35之模擬係以波長850 nm並使用嚴格耦合波分析(RCWA(rigorous coupled-wave analysis))而進行。 觀察圖34及圖35得知,即便使DOE高度變化,作為本發明之type1之零次光強度亦小於理想設計之零次光強度。又,type2存在視DOE高度而零次光強度相對於理想設計較小之部分。 於上述說明中,主要基於模擬結果進行了說明,但於實際製作繞射光學元件之情形時,必須根據實物之複雜之凹凸形狀求出各階之面積比率。為了求出面積比率,要求出各階之面積,但所製作之繞射光學元件具備微小且複雜之凹凸形狀之情況較多,即便僅求出面積亦並不容易。因此,以下例示相對簡單地求出面積比率之方法之1例。再者,面積比率之求出方法亦可使用以下所示之方法以外之方法。 此處,對使用雷射顯微鏡(基恩士公司製造,VK-X250)測定DOE之各階之面積之方法進行說明。該雷射顯微鏡係高度測定精度、重複精度3σ=12 nm,但只要為數十nm之精度便已充分。 圖36係表示自雷射顯微鏡獲取之黑白(灰度)圖像之例之圖。 自該雷射顯微鏡獲取之圖像如圖36所示獲得黑白圖像。又,亦獲得於該黑白圖像中以不同顏色將各階之高度著色而成之圖像(未圖示)。只要求出該經著色之每種顏色之面積即可,但通常,即便各階部之高度為同階,高度亦微妙不同地被測定,因此存在顏色不均(色度變化),不適合直接地求出面積比率。因此,首先進行使圖36之圖像黑白之2值化之圖像處理(圖37)。2值化例如可適當利用市售之圖像處理軟體,閾值之設定可一面觀察處理結果,一面選擇最能夠表現出顯微鏡圖像之特徵之值。 圖37係表示使自雷射顯微鏡獲取之黑白圖像2值化所得之結果之圖。 繼而,使用經2值化之圖像,一面參照另外獲得之以不同顏色對各階之高度進行著色後之圖像,一面於每一階中,利用例如中間色調之顏色(灰色)將白色區域塗色。該塗色處理例如亦可適當利用市售之圖像處理軟體。 圖38係表示將level-3塗色之例之圖。 圖39係表示將level-2塗色之例之圖。 圖40係表示將level-1塗色之例之圖。 圖41係表示將level-0塗色之例之圖。 使用針對各階塗色之圖像,對各自之經塗色之灰色之像素進行計數。關於對每種顏色之像素數進行計數之處理,例如亦可適當利用市售之圖像處理軟體。再者,於上述例中,顏色係由白、黑、灰之3種構成,故而對灰色之像素數進行計數。 例如,於圖示之例中,level-3之計數值為15167,level-2之計數值為24859,level-1之計數值為27541,level-0之計數值為29391。該數相當於面積,因此可求出面積比率。 於顯微鏡輸出之圖像中,存在各階之交界變粗之部分,推測較粗之部分成為斜面。於上述使用圖像處理之面積測定方法中,藉由進行顯微鏡輸出之圖像之2值化,斜面成為黑色而不包含於面積比率之運算中,因此,可將該斜面除外而使面積計算簡單化,該點係該測定方法之優勢。 如以上所說明,根據本實施形態,繞射光學元件10將鋸齒形狀之斜面設為凹狀曲面或設為模仿凹狀曲面之多階形狀,因此可大幅降低0次繞射光之強度。又,亦可抑制一次光之繞射效率降低。 (變化形態) 並不限定於以上說明之實施形態,可進行各種變化或變更,該等亦包含於本發明之範圍內。 (1)列舉為藉由多階形狀模仿凹狀曲面而僅使多階形狀之寬度或高度之其中一者變化之例進行了說明。並不限定於此,例如亦可使該等兩者緩慢變化。 (2)於實施形態中,繞射光學元件以僅由高折射率部構成之簡單之形態表示。並不限定於此,例如可設置用以形成高折射率部之透明基材,亦可藉由樹脂構成低折射率部14,亦可設置被覆繞射層之被覆層。 (3)於實施形態中,主要對構成為多階形狀之繞射光學元件進行了說明,但並不限定於此,例如,亦可為由多階形狀微細地形成直至達到極限為止而無法識別出多階之形狀或連續之斜面(曲面)形狀構成之繞射光學元件。 再者,實施形態及變化形態亦可適當組合使用,省略詳細之說明。又,本發明並不受以上所說明之各實施形態限定。Hereinafter, the best mode for carrying out the invention will be described with reference to the drawings and the like. (Embodiment) FIG. 1A is a plan view showing an example of a diffractive optical element in which a concave-convex shape of a diffraction grating obtained from a normal direction of a sheet surface is formed into a regular or irregular pattern including a curved line at a boundary between a convex portion and a concave portion. In the present embodiment, as an example, it can be applied to a diffractive optical element having a pattern of irregularities in an irregular shape as shown in Fig. 1A. In the following description, the diffractive optical element of the type shown in Fig. 1A is also referred to as an irregular type. However, there is also a case where the irregular pattern is a regular pattern by diffracting the target emission pattern of the optical element, and therefore the irregular type is referred to as a convenient name, and is not limited to the irregularity. Further, in FIG. 1A, the irregular pattern includes a curved line, but there is also a case where a pattern including a broken line which is formed by connecting a target emission pattern of the optical element to a straight line or connecting a line segment including a curved line is present. Therefore, the pattern of the irregular type diffraction grating is viewed from the normal direction of the surface on which the concave-convex shape of the high refractive index portion (described below) is formed, and the boundary between the convex portion and the concave portion includes a curve and connects a plurality of line segments. At least one of the broken lines. 1B is a view showing an example of a diffractive optical element in which a concave-convex shape of a diffraction grating obtained from a normal direction of a sheet surface is formed in a lattice pattern in which a plurality of unit cells of the same uneven shape are arranged side by side. Top view. In the present embodiment, as another example, it is applicable to a diffractive optical element in which a lattice pattern in which a plurality of unit cells having the same uneven shape are arranged side by side is formed as shown in FIG. 1B. In the following description, the diffractive optical element of the type shown in FIG. 1B is also referred to as a Grating Cell Array type or a GCA type. A grating element array type diffractive optical element is formed in each unit cell, and the direction and angle of the light diffracted by the diffraction grating are different, and the desired optical characteristics are obtained by tiling a large number of unit cells. Diffractive optical element. In the grating element array type diffractive optical element, the high refractive index portion is divided into a lattice shape as viewed from the normal direction of the surface on which the uneven shape is formed, and the same shape extending in a specific direction in the interval The convex portions are arranged side by side in a direction orthogonal to the specific extending direction, and the width and the extending direction of the convex portions are different in each of the sections. Fig. 2A is a perspective view showing an example of a partial periodic structure in an example of the irregular type diffractive optical element shown in Fig. 1A. Fig. 2B is a perspective view showing an example of a partial periodic structure in the example of the GCA type diffractive optical element shown in Fig. 1B. Figure 3 is a cross-sectional view showing the diffractive optical element cut off at the position of arrow G-G' in Figure 2A. In the following description, since it is necessary to explain the cross-sectional shape peculiar to the GCA type, the irregular type is mainly described as an example. However, the GCA type has the same cross-sectional shape as it is cut at the position of the arrow G-G' shown in Fig. 1A, and the present invention can be applied similarly as described above. Figure 4 is a diagram illustrating a diffractive optical element. In addition, each of the drawings shown below is schematically shown in FIG. 1, and the size and shape of each part are appropriately exaggerated for easy understanding. In the following description, specific numerical values, shapes, materials, and the like are described, but these may be appropriately changed. Furthermore, the shapes or geometric conditions used in the present invention, and the terms that specify such degrees, such as "parallel", "orthogonal", "identical", or the length or angle, are not limited. In the strict sense, the scope of the extent to which the same function can be expected is explained. Further, in the present invention, the term "shaping the light" means that the shape (irradiation region) of the light projected on the object or the target region has an arbitrary shape by controlling the traveling direction of the light. For example, as shown in the example of FIG. 4, the light source unit 210 is prepared, and the light source unit 210 is emitted as a circular light 201 when the light is projected onto the screen 200 of the planar shape (FIG. 4(b)). By passing the light 201 through the diffractive optical element 10 of the present invention, the target region of the irradiation region 204 such as a square (Fig. 4(a)) or a rectangle or a circle (not shown) is called "optical light". Perform plastic surgery." Further, by combining the light source unit 210 and the diffractive optical element 10 of the present embodiment in which at least one position of the light emitted from the light source unit 210 passes, it is possible to shape the light. A light irradiation device that is in a state of illumination. Further, in the present invention, the term "transparent" means that at least the light of the wavelength used is transmitted. For example, even if the visible light is not transmitted, if the infrared ray is transmitted, it is treated as transparent when it is used for infrared ray use. The diffractive optical element 10 of the present embodiment is a diffractive optical element (DOE) that shapes light. The diffractive optical element 10 is designed, for example, in such a manner that light is diffused into a cross shape for light from a light source unit 210 that emits light having a wavelength of 500 nm, specifically, for example, the light is diffused to within ±50 degrees. A shape in which two strips of light having a width of ±3.3 degrees are crossed. The diffractive optical element 10 of the present embodiment has different depths at positions A, B, C, and D shown in FIGS. 1A and 1B. That is, the diffractive optical element 10 is constituted by a multi-step shape having different heights of four stages. Further, the diffractive optical element 10 generally has a plurality of regions (partial periodic structures: for example, E and F regions in FIGS. 1A and 1B) having different periodic structures. In FIGS. 2A and 2B, an example of a partial cycle structure is extracted. As shown in FIG. 3, the diffractive optical element 10 is provided with a high refractive index portion 11 in which a plurality of convex portions 11a are arranged side by side in a cross-sectional shape. In the GCA type diffractive optical element, the high refractive index portion 11 maintains the same cross-sectional shape and extends directly in the depth direction of the cross section. On the other hand, in the irregular type of diffractive optical element, when the cross-sectional position is changed, the cross-sectional shape is changed, and the diffraction gratings having various cross-sectional shapes are arranged in a large number. Further, in the irregular type, a specific cross-sectional structure for performing a specific cross-section of the shape of the diffraction grating, that is, a diffraction grating for affecting the diffraction phenomenon of the diffracted light, must be set to The cross-sectional structure in the cross section cut in the direction orthogonal to the line (curve or line) drawn by the boundary between the convex portion and the concave portion when viewed from the normal direction of the sheet surface. The high refractive index portion 11 can also be treated by etching, for example, on quartz (SiO 2 , synthetic quartz) is formed by processing. Further, the high refractive index portion 11 may be formed by collecting a shape of an object processed by quartz to form a molding die, and the free radiation curable resin composition may be cured by the molding die. There are various methods for producing an object of such a periodic structure using an free radiation curable resin composition, and the high refractive index portion 11 of the diffractive optical element 10 can be suitably produced by such known methods. Further, air is present in the upper portion of FIG. 3 including the space 13 formed near the top of the concave portion 12 and the convex portion 11a between the convex portions 11a, and the low refractive index portion 14 having a lower refractive index than the high refractive index portion 11 is formed. The diffraction layer 15 having a function of shaping light is configured by a periodic structure in which the high refractive index portions 11 and the low refractive index portions 14 are alternately arranged in parallel. The convex portion 11a has a multi-step shape of four step portions having different heights on one side of the side surface shape (the left side in FIG. 3). Specifically, the convex portion 11a has the most prominent step 3 step portion 11a-3 on one side surface side, the lower order third step portion 11a-3, the lower order second order portion 11a-2, and the more order second step portion 11a- 2, further, the first-order portion 11a-1 of the first-order lower order and the first-order portion 11a-1 of the first-order portion, and the lower-order first-order portion 11a-0. Further, the other side (the right side in FIG. 3) of the side surface shape of the convex portion 11a is a side wall portion 11b which is connected in a straight line from the step 3 step portion 11a-3 to the step 0 step portion 11a-0. Here, the convex portion 11a of the present embodiment is shaped by imitating a zigzag shape by a multi-step contour shape, and is inclined with respect to a sheet surface of the diffractive optical element 10 which is imitated by a multi-step contour shape. The slope has a concave curved surface that is recessed toward the convex portion 11a. Here, the "simulation of the contour shape by a plurality of steps" means that the concave curved surface is pseudo-constructed by the line connecting the corner portions of the respective step portions. However, the present invention is not limited to the corner portion, and may be a connection step. The line between the center of the part can also be the line connecting the side parts. Further, the statement of "imitation" means that the concave curved surface is pseudoscopically formed. In the present embodiment, the macroscopic view shows a concave curved surface, and the microscopic view shows a stepped shape. Another expression can also be "approximate". In the example described so far, the fourth-order form has been described. Therefore, it is a form that is relatively roughly imitated, and if it is set to the following order of 16 or more, it can be more accurately imitated. The shape. Fig. 5 is a view for explaining a concave curved surface of the convex portion 11a in the diffractive optical element 10. Fig. 6A is a view showing the diffraction optical element 10 of the present embodiment in comparison with the prior art. Fig. 6A(a) shows a cross section obtained by cutting the previous diffractive optical element at the position of the arrow HH in Fig. 6A(b). Fig. 6A(b) is a plan view of the prior diffractive optical element viewed from the normal direction of the sheet surface. Fig. 6A(c) is a plan view of the diffractive optical element 10 of the present embodiment as seen from the normal direction of the sheet surface. Fig. 6A(d) is a view in which Fig. 6A(b) and Fig. 6A(c) are superimposed. In the prior diffractive optical element, as shown by the two-dot chain line in Fig. 5, the depth (height) of each step of each step is fixed, and the width is also fixed. Therefore, in the cross section shown in FIG. 5, the slope L0 in which the corner portions of the respective step portions of the previous diffractive optical element are connected is a plane (a straight line in the cross section). On the other hand, in the diffractive optical element 10 of the present embodiment, the inclined surface L in which the corner portions of the respective step portions are connected is a concave curved surface that is recessed toward the convex portion 11a (a concave curved line in the cross section). In order to simulate the concave curved surface, the depth (height) of each step portion may be changed, the width of each step portion may be changed, or the two may be combined. However, in consideration of a manufacturing method of manufacturing a step by etching, the method of manufacturing the most simple is a method of changing the width of each step. Therefore, in order to simulate the concave curved surface, the diffractive optical element 10 of the present embodiment gradually narrows the width of each step portion as the depth of the concave portion becomes shallower. Therefore, as shown in FIGS. 5 and 6, the width of the convex portion 11a is narrowed as a whole. In the irregular type of diffractive optical element 10, as shown in FIG. 1A, the line drawn by the boundary between the convex portion and the concave portion is designed to have a large portion of the curve. Further, as described above, the cross-sectional structure that affects the optical characteristics of the diffractive optical element is a cross-sectional structure in a cross section in a direction orthogonal to the curve (normal direction). However, in the actual diffractive optical element 10, a polygonal line shape in which a straight line shape is formed, in particular, a straight line in two directions orthogonal to each other as shown in FIG. 6A is formed, so that the boundary between the convex portion and the concave portion is made. The shape of the line drawn is similar to the shape of the curve. It depends mainly on the manufacturing situation. In this case, if the cross-sectional structure shown in FIG. 5 is studied in a cross section cut as shown, for example, in FIG. 6A(a), the width of each step is affected by the cutting position and is assumed to be a cross section as compared with the original one. The width of the study was widened or narrowed so that the correct study could not be performed. Fig. 6B is a view in which the curve of the original design pattern is superimposed on the graph of Fig. 6A. 6B(b) is a diagram in which the curve of the ideal design pattern is superimposed on FIG. 6A(b), and FIG. 6B(c) is a diagram in which the curve of the ideal design pattern and the curve of the design pattern of the embodiment are overlapped with FIG. 6A (c). ) on the map. Further, in Fig. 6B(c), the solid line is a curve of an ideal design pattern, and the broken line is a curve of the design pattern of the embodiment. The case where the width of each step portion is gradually narrowed as the depth of the concave portion becomes shallow is clearly shown in FIG. 6B. In this way, when the width of each step portion is studied in the actually fabricated diffractive optical element, as shown in FIG. 6B, the curve of the design is obtained by connecting the curve of the vertex, and the cross section in the direction orthogonal to the curve is obtained. It is important to study the shape or width dimension. In the description so far, an example of a multi-order shape of the fourth order is shown, but the order may be more. Fig. 7 is a view showing a diffractive optical element 10 having a multi-order shape of 8th order. If the order is increased as described above, the accuracy of imitating the concave curved surface becomes high. Here, the slope of the sawtooth shape is a shape in which a concave curved surface is formed, and the shape of the curved surface is described. Fig. 8 is a view showing a curve and a multi-order shape in a cross section of a concave curved surface. Set the xy orthogonal coordinates as shown in Figure 8. In other words, the x-axis is set to the direction in which the convex portions 11a are arranged side by side, the direction in which the inclined surface is raised is set to the positive direction of the x-axis, and the y-axis orthogonal to the sheet surface of the diffractive optical element 10 is set, and the convex portion 11a is protruded. The direction is set to the positive direction of the y-axis. The total order of the steps obtained by counting the front end including the convex portion 11a is set to L. Further, the reduction rate of the width of each step is set to f. Further, the order of the step portion of the object when the lowest position of the concave portion is 0 is lv, and the height of each step of each step is set to h and is set to a fixed value, and the width ratio of the step 0 is defined as C. Thus, the curve in the cross section of the concave curved surface imitated by the multi-order shape (the curve which becomes the trajectory of the concave apex of the step 0 and the apex of each convex portion) is represented by the following equation. Set the ratio of the x coordinate to the spacing to S, x'=0.5×f×lv 2 +C×lv S=P/{tw+Σx'i} When =0 is set to i=0 to L-1, the top x and y coordinates of the step shape are expressed as follows. x=S×(0.5×f×lv 2 +C×lv) y=lv×h Furthermore, when the order of the multi-order shape is set to n and the width of the uppermost step is set to tw, the pitch is 0.5×f×(n-1)2+C×( N-1)+tw is standardized. Further, the width ratio C of the step 0 indicates the ratio of the width of the step 0 which is the lowest position of the concave portion to the width of each step when the width of each of the previous step portions is fixed. Here, regarding the height of each step of each step is h, a good result can be obtained by setting h=ht×1.05 to h=ht×1.15 with respect to the theoretical value ht. Furthermore, the theoretical value ht = wavelength / {level number (refractive index - 1)}. Further, the widths d0 to d7 of the respective levels are defined in the ratio of the pitch as follows. Di=C+i×f where i is an integer from 0 to 6. Here, f<0. Further, in the diffractive optical element having a maximum diffraction angle of 10 or more, -20 ≤ C / f ≤ -6, preferably -16 ≤ C / f ≤ -10.5 - 0.0275 ≤ f ≤ -0.0125 When 0.13 ≤ C ≤ 0.4, when C is in this range, it is more preferably -0.0225 ≤ f ≤ -0.0125. When the ratio of the width of the uppermost position to the width of the 0 level which is the deepest surface is t, it is preferable that 0.5 ≤ t ≤ 0.9 and 0.6 ≤ t ≤ 0.8. Hereinafter, a specific example will be exemplified. Fig. 9 is a view showing a specific example of the cross-sectional shape of the eighth step. The values of x' and y are collectively shown in the table below in FIG. The x' indicates the lateral position of the top portion when the cross section of the step structure is observed, and y indicates the longitudinal position, which is the coordinate data (vertex coordinates) of the cross-sectional shape (step structure) shown as a graph in FIG. Furthermore, in the following figures, the values in the tables together with the graphs represent the coordinate data in the graph. In the example of Fig. 9, the wavelength is 850 nm, the pitch is 3284 nm (the diffraction angle is 15°), 8 level, f=-0.02, C=0.25, t=0.8, h=850/8*1.1*(n). -1), n = 1.5. In this case, it becomes C/f = -12.5. According to x'=0.5×f×lv 2 +C × lv, the width from 0 level to the highest level becomes 1.4542, and the width of each level becomes the width derived from the value of x × 3284 / 1.4542. At this time, the zero-order light intensity is sufficiently small to 0.15776%. Fig. 10 is a view showing a specific example of the cross-sectional shape of the fourth order. The values of x and y are collectively shown in FIG. In the example of Fig. 10, the wavelength is 850 nm, the pitch is 3284 nm (the diffraction angle is 15°), 4 level, f=-0.02, C=0.2, t=0.8, h=850/4*1.1 (n- 1.0), n=1.5. In this case, it becomes C/f=-10. According to x'=0.5×f×lv 2 In the formula of +C × lv, the width from 0 level to the highest level becomes 0.662, and the width of each level becomes the width × 3284/0.662 derived from the value of x. The zero-order light at this time is sufficiently small as 0.2803%. Then, the above-described embodiments and comparative examples were actually produced, and the results obtained by actually measuring the intensity of the 0-time diffracted light were shown. Fig. 11 is a view showing a method of measuring the intensity of 0-time diffracted light. When measuring the intensity of the 0-order diffracted light, first, as shown in FIG. 11(a), after the light of a specific wavelength emitted from the light source LS is passed through the diffractive optical element 10, only the 0-throwing light is made by the aperture AP. The light passing through the specific range reaches the sensor S, and the strength when the diffractive optical element 10 is present is measured by the power meter M. Then, as shown in Fig. 11 (b), only the diffractive optical element 10 is removed from the state of Fig. 11 (a), and the intensity at the time of the absence of the diffractive optical element 10 is measured. The intensity of the 0-time diffracted light can be obtained by (the intensity in the case where the optical element 10 is diffracted) / (the intensity in the case where the optical element 10 is not diffracted). Further, the light source LS used for the measurement is set to two types of a laser light source and a halogen light source, and the wavelength is set to 850 nm. The intensity of the 0-time diffracted light was measured for the diffractive optical element 10 of the present invention by the above method. Further, as the diffractive optical element 10 of the present invention, the four levels shown in Figs. 3 and 5 and the eight levels shown in Figs. The height of each of the four levels of the diffractive optical element 10 of the present invention is h = 470 nm. This value is equivalent to h = ht x 1.106. Further, it is assumed that C = 0.1825 and f = -0.02. Further, since the pitch is various as shown in FIG. 1 and FIG. 6, it is difficult to specify. Further, in the diffractive optical element 10 of the present invention, the line connecting the respective step portions has a concave curve in the cross section. Further, in order to compare with the diffractive optical element 10 of the present invention, the comparative example also prepares a 4-level product and an 8-level product. Fig. 12 is a view showing a diffraction optical element of a comparative example. As a comparative example, as shown in FIG. 12, the line connecting the respective step portions is a straight line in the cross section. Further, regarding the comparative example, two types of 4 levels and 8 levels are also prepared. The height h of each step is set to be the same as that of the present invention. Fig. 13 is a graph showing the results of measuring the intensity of 0-time diffracted light for the diffractive optical element 10 of the present invention and a comparative example. In Fig. 13, the data indicated by the circular mark and the square mark indicates the data of the laser light source, and the data indicated by the curve indicates the data of the halogen light source. As shown in Fig. 13, whether it is a laser light source or a halogen light source, the intensity of the 0-time diffracted light of the present invention is greatly reduced as compared with the comparative example. Therefore, it has been confirmed in the actual product that if the portion corresponding to the inclined surface of the sawtooth shape is formed as a concave curved surface, the intensity of the diffracted light of 0 times can be reduced. Then, a simulation was performed in order to study the effects of the present invention in more detail. The analytical simulation of diffraction efficiency uses rigorous coupled-wave analysis (RCWA). RCWA is mathematically attributed to solving the eigenvalue problem of the matrix and the first-order equation, so there is no principle difficulty. In the simulation results and actual reality based on the electromagnetic field analysis of the RCWA, if the shape errors or the like in the present object are excluded, they are basically identical. Furthermore, the simulation does not take into consideration the three-dimensional shape as shown in FIG. 2A. The calculation is performed by setting one dimension as shown in Fig. 2B to the infinite length. The simulation is performed under the following conditions: Wavelength: 850 nm Refractive index of the high refractive index portion n: 1.5 Low refractive index portion Refractive index: 1.0 Pitch: 2 μm, 2 μm of two orders: 8 level As a comparative example, first, the height ht=212.5 nm whose height is the theoretical value of each step is set as Comparative Example 1. The height h = ht × 1.106 = 235 nm of each step is set as Comparative Example 2. The height h = ht × 1.106 = 235 nm is the same as that used previously for the measurement. Also, the equivalent of the bevel of the present invention Part of the concave surface For example, two types of preparations are prepared. First, the width of the deeper portion is formed in the same manner as the previous actual measurement, and the width is set to be the same as in the first embodiment. Further, the width is not changed and the height of the deep portion is adjusted. The form in which the portion corresponding to the inclined surface is a concave curved surface is reduced to the second embodiment. Fig. 14 is a view showing the shape of the second embodiment in which the height of each step is changed. 14 The height of each step is changed, and the concave surface can also be simulated. Figure 15 is a summary of the results of the simulation. In the simulation, the reference value is also obtained for the first diffracted light. As a result, as long as the portion corresponding to the slope becomes a concave curved surface, the diffracted light can be greatly reduced by 0. Further, the order (level number) when the sawtooth shape is pseudo-reproduced by the multi-order shape is not limited to Fig. 16 is a diagram showing an example of simulating a sawtooth shape in a 16th order. Further, if the order is increased, a smoother slope can be obtained, and the degree can be regarded as substantially no step. Person, that is, essentially regarded as a curved surface. According to the above As a result of measurement and simulation, it can be said that even in the case of a smooth slope, if the slope is a concave curved surface, the intensity of the diffracted light of 0 times can be reduced. Then, the width change rate C for the order 0 is expressed. The simulation results are explained by the influence of the ratio of the decrease rate f of the width of each step and the width of the uppermost layer. (8-level) The wavelength is set to 850 nm, and the refractive index of the diffractive optical element is set to 1.5. The results of the simulation of the 8-level structure represented by the equation are shown in Fig. 17 to Fig. 19. The theoretical value of the height of each step becomes ht = 212.5 nm, and is set to 223.125 nm of h = ht × 1.1. The ratio of the uppermost level (level-7) to the width of the lowest level (level-0). The formula is the same as the above formula, and the following formula is used. Set the ratio of the x coordinate to the spacing to S, x'=0.5×f×lv 2 +C×lv S=P/{tw+Σx'i} When =0 is set to i=0 to L-1, the top x and y coordinates of the step shape are expressed as follows. x=S×(0.5×f×lv 2 +C×lv) y=lv×h Fig. 17 is set to f=-0.02, t=0.8, and is set to zero-order light when C is changed when the diffraction angle of the diffraction grating becomes 15° at 3284 nm. A graph of the intensity. It is found that in the case of 0.21 ≤ C ≤ 0.40, the zero-order light is low and becomes 0.5% or less. Fig. 18 is a graph showing the zero-order light intensity when f is changed when the diffraction angle of the diffraction grating is 15° at a distance of 3284 nm. It is found that when -0.0225 ≤ f ≤ -0.0125, the zero-order light is low and becomes 0.5% or less. Fig. 19 is a graph showing the zero-order light intensity when t is changed when the diffraction angle of the diffraction grating becomes a 3284 nm pitch at a diffraction angle of 15°. It is found that when t is from 0.5 to 0.9, the zero-order light is small and becomes 0.5% or less. Based on these results, an appropriate range of C/f in the 8-level can be obtained. Here, the range in which the zero-order light intensity is 1% or less is set to an appropriate range of C/f. From the result of Fig. 17, it is found that in the case of 0.18 < C, the zero-order light becomes 1% or less. In the example of Fig. 17, f = -0.02, so it is preferable to set C/f &lt; -9. Further, as is clear from the results of Fig. 18, in the case of -0.0275 < f < - 0.005, the zero-order light becomes 1% or less. In the example of Fig. 18, C = 0.25, so it is preferable to set -50 < C / f < -9. As a range shared by the two ranges, an appropriate range of C/f in 8-level is -50 < C/f < -9. (4-level) The results obtained by simulating the structure of the 4-level represented by the following equation when the wavelength is 850 nm and the refractive index of the diffractive optical element is 1.5 are shown in Figs. 20 to 22 . The theoretical value of the height of each step becomes ht = 425 nm and is set to 467.5 nm of h = ht x 1.1. t is the ratio of the width of the uppermost level (level-3) to the lowest level (level-0). The formula is the same as the above formula, and the following formula is used. Set the ratio of the x coordinate to the spacing to S, x'=0.5×f×lv 2 +C×lv S=P/{tw+Σx'i} When =0 is set to i=0 to L-1, the top x and y coordinates of the step shape are expressed as follows. x=S×(0.5×f×lv 2 +C × lv) y = lv × h Fig. 20 is a f--0.02, t = 0.8, and is set to the zero-order light intensity when C is changed when the diffraction angle of the diffraction grating becomes 15° at a distance of 3284 nm. The graph. It is found that in the case of 0.13 ≤ C ≤ 0.33, the zero-order light is low and becomes 0.5% or less. Fig. 21 is a graph showing the zero-order light intensity when f is changed when C = 0.18 and t = 0.8 are set and the diffraction angle of the diffraction grating is 15° at a distance of 3284 nm. It is found that when -0.0275 ≤ f ≤ -0.0125, the zero-order light is low and becomes 0.5% or less. Fig. 22 is a graph showing the zero-order light intensity when t is changed when the diffraction angle of the diffraction grating is 15° at a distance of 3284 nm, which is set to f = -0.02 and C = 0.18. It is found that when t is 0.3 to 0.9, the zero-order light is small and becomes 0.5% or less. Based on these results, an appropriate range of C/f in 4-level can be obtained. Here, the range in which the zero-order light intensity is 1% or less is set to an appropriate range of C/f. As is clear from the results of FIG. 20, in the case of 0.1 < C, the zero-order light becomes 1% or less. In the example of Fig. 20, f = -0.02, so it is preferable to set it to -5 < C/f. Moreover, as is clear from the result of FIG. 21, when f<0, the zero-order light becomes 1% or less. In the example of Fig. 21, C = 0.18, and therefore the range of C/f cannot be obtained based on the condition of f < 0, and any value can be obtained under the condition. As a range shared by the two ranges, an appropriate range of C/f in 4-level is -5 < C/f. As described above, the appropriate range of C/f in 8-level is -50 < C/f < -9, and the appropriate range of C/f in 4-level is -5 < C/f. Therefore, as a range shared by the above, -5 < C/f < -9 can be set to an appropriate range of C/f. Here, if attention is paid to the reduction rate f, the reduction rate f has an inverse proportional relationship of C/f. Therefore, if the above range is rewritten so that the reduction rate f becomes a molecule, it is preferably in the range of -0.2 < f / C < -0.1. The reduction rate f is the reduction rate of the width of each step, and is a value without dimension. Further, it is considered that if C is fixed, the rate of change of the area is preferably within the above range. Therefore, the reduction rate of the area reduction of each step portion is preferably in the range of -5% or more and -20% or less. Further, it is considered that, in the 8-level, it is preferable that t is 0.5 to 0.9 in the 8-level, and it is considered that t is preferably 0.3 to 0.9 in the 4-level according to Fig. 22 . t is the ratio of the width of the uppermost level (level-3) to the lowest level (level-0). Therefore, it can be said that the area of the uppermost surface of the high refractive index portion is preferably 0.5 to 0.9 times the area of the lowermost surface of the high refractive index portion. Next, a diffractive optical element having a configuration in which a trajectory connecting the apex of the present invention is a concave curved surface, a diffractive optical element having a configuration in which a apex of a theoretical structure is linearly arranged, and a connection opposite to the present invention The results of the simulation of the comparison of the diffractive optical elements in which the trajectory of the apex is a convex curved surface are shown in Figs. 23 to 25 . In the simulations of FIGS. 23 to 25, it is assumed that f=-0.02, C=0.18, t=0.8, and 3248 nm pitch (diffraction angle of 15°). Fig. 23 is a view showing a cross-sectional shape and a simulation result of a diffractive optical element having a configuration in which a trajectory connecting the apex of the present invention is a concave curved surface. In addition, in FIGS. 23 to 25, in order to easily understand the difference in the cross-sectional shape, a straight line is collectively described by a single chain line. As shown in Fig. 23, in the configuration of the present invention, the zero-order light becomes 0.26%. Fig. 24 is a view showing a cross-sectional shape and a simulation result of a diffractive optical element having a configuration in which the apexes of the theoretical structure are linearly arranged side by side. As shown in Fig. 24, when all the steps of the theoretical structure are the same, the zero-order light becomes 0.88%. Fig. 25 is a view showing a cross-sectional shape and a simulation result of a diffractive optical element having a configuration in which a trajectory connecting vertices opposite to the present invention has a convex curved surface. As shown in Fig. 25, in the configuration in which the blade-shaped inclined surface of the saw is convex in the opposite direction to the present invention, the zero-order light becomes 2.90%. From the results of Figs. 23 to 25, it was confirmed that in the diffractive optical element having the configuration in which the trajectory connecting the vertices is a concave curved surface as in the present invention, the zero-order light can be reduced. Next, a method of comparing the structure of the present invention which is easier to understand with the previous structure will be described instead of the method of confirming the concave curved surface by the above equation. In the configuration of the present invention, since the trajectory connecting the vertices is a concave curved surface, the area of the upper surface of each step differs depending on the step. The following is an explanation of this aspect. Figure 26 is a plan view showing a parallel arrangement of a diffractive optical element of the prior art and a diffractive optical element of the present invention. Fig. 26(a) shows the four-level faces of the diffractive optical element designed by a method known as the ideal design, and shows one side to four sides. Fig. 26(b) is a view showing the structure of Fig. 26(a) based on the structure of the present invention. In each of the faces, the lowermost surface (the order 0 step portion 11a-0: see FIG. 3) is referred to as the zero plane, and the uppermost plane (the third step portion 11a-3) is shown as the three faces in the drawing. Figure 27A is a graph showing the ratio of the faces of Figure 26 to the area of the 4-level diffractive optical element based on the previously ideal design of Figure 26(a). Figure 27B is a graph showing the ratio of the faces to the area of the 8-level diffractive optical element based on the previous ideal design. Figure 28A is a graph showing the ratio of the faces of Figure 26 to the area of the 4-level diffractive optical element of the present invention of Figure 26(b). Figure 28B is a graph showing the ratio of the faces of the faces to the area of the 8-level diffractive optical element of the present invention. 27A and 27B and Figs. 28A and 28B determine the area ratio for a square region of 10 μm, 50 μm, and 100 μm on one side of the diffractive optical element (DOE). The larger the size of the square region, the more the surface becomes the sample, and therefore tends to converge to a fixed value. 27A and 27B, the ratio of each face in the previous ideal design is approximately 25% for each of the 4-level faces, and 11 to 14% for the 8-level faces, which are approximately equal ratios. On the other hand, as shown in Figs. 28A and 28B, in the structure of the present invention, the area of level-0 which is the lowermost plane is the largest, and the area of the first level (level-2, level-6) below the uppermost plane. The smallest. Fig. 29 is a result of actual measurement of the diffractive optical element and measurement of zero-order light based on the data of Figs. 26(a) and (b). Further, the measured values of 4-level and 8-level are collectively shown in FIG. Looking at Fig. 29, it is found that 4-level and 8-level are reduced in the zero-order light compared with the previous form in the configuration of the present invention. In the example of the above-described FIG. 28A, if the size is arranged from large to small, the order is level-0, level-1, level-3, and level-2 (hereinafter referred to as type1). In the following, an example in which the size of the area is in the order of level-0, level-3, level-1, and level-2 (hereinafter referred to as type2) is described, and the basic conditions are the same under the same conditions. The form of the design is compared. Further, in this comparison, the difference between the heights of level-0 to level-3, that is, the depth of the unevenness (hereinafter, also referred to as DOE height) was changed and the influence on the DOE height was also examined. Furthermore, the DOE height typically depends on the wavelength of the light that is being diffracted. Figure 30 is a graph showing the area ratio of three types of diffractive optical elements. Figure 31 is a view showing a diffractive optical element of an ideal design viewed from the normal direction of the sheet surface. Fig. 32 is a view showing the diffractive optical element of type 1 as seen from the normal direction of the sheet surface. Fig. 33 is a view showing the diffractive optical element of type 2 as seen from the normal direction of the sheet surface. Figure 34 is a graph showing numerical simulation results of three types of diffractive optical elements. Fig. 35 is a graph showing the simulation results of three kinds of diffractive optical elements in a graph. Further, the simulations of Figs. 34 and 35 were carried out at a wavelength of 850 nm using rigorous coupled-wave analysis (RCWA). 34 and 35, even if the DOE height is changed, the zero-order light intensity of the type 1 of the present invention is smaller than the zero-order light intensity of the ideal design. Also, type 2 has a portion where the DOE height is small and the zero-order light intensity is smaller than the ideal design. In the above description, the simulation results are mainly described. However, in the case of actually fabricating a diffractive optical element, it is necessary to determine the area ratio of each step based on the complex uneven shape of the object. In order to obtain the area ratio, the area of each step is required. However, the produced diffractive optical element has many small and complicated irregularities, and it is not easy to obtain an area. Therefore, an example of a method of relatively easily obtaining an area ratio is exemplified below. Further, the method of determining the area ratio may be a method other than the method shown below. Here, a method of measuring the area of each step of the DOE using a laser microscope (VK-X250, manufactured by Keyence Corporation) will be described. The laser microscope has high measurement accuracy and repeatability of 3σ=12 nm, but it is sufficient as long as it is tens of nm. Fig. 36 is a view showing an example of a black-and-white (grayscale) image obtained from a laser microscope. The image obtained from the laser microscope obtained a black and white image as shown in FIG. Further, an image (not shown) obtained by coloring the heights of the respective steps in different colors in the black and white image is also obtained. As long as the area of each of the colored colors is obtained, generally, even if the heights of the respective steps are the same, the height is measured subtly differently, so that color unevenness (chromaticity change) is present, and it is not suitable for direct seeking. Area ratio. Therefore, first, image processing for making the image of Fig. 36 black and white (Fig. 37) is performed. For the binarization, for example, a commercially available image processing software can be used as appropriate, and the threshold value can be set so that the value that best expresses the characteristics of the microscope image can be selected while observing the processing result. Fig. 37 is a view showing the result of binarizing a black-and-white image obtained from a laser microscope. Then, using the binarized image, referring to the separately obtained image obtained by coloring the heights of the respective steps in different colors, the white area is coated in each step with, for example, a halftone color (gray). color. For the coloring process, for example, a commercially available image processing software can be used as appropriate. Fig. 38 is a view showing an example of coloring level-3. Fig. 39 is a view showing an example of coloring level-2. Fig. 40 is a view showing an example of coloring level-1. Fig. 41 is a view showing an example of coloring level-0. The pixels of the respective painted grays are counted using images for each coloring. Regarding the process of counting the number of pixels of each color, for example, a commercially available image processing software can be suitably used. Further, in the above example, the color is composed of three kinds of white, black, and gray, so the number of pixels of gray is counted. For example, in the illustrated example, the level-3 count value is 15167, the level-2 count value is 24859, the level-1 count value is 27541, and the level-0 count value is 29391. This number corresponds to the area, so the area ratio can be obtained. In the image output from the microscope, there is a portion where the boundaries of the respective stages become thick, and it is presumed that the thicker portion becomes a slope. In the above-described area measurement method using image processing, by performing binarization of the image output from the microscope, the slope is black and is not included in the calculation of the area ratio. Therefore, the slope can be excluded and the area calculation can be simplified. This point is the advantage of this assay. As described above, according to the present embodiment, the diffractive optical element 10 has a chamfered shape as a concave curved surface or a multi-step shape that mimics a concave curved surface, so that the intensity of the zero-order diffracted light can be greatly reduced. Further, it is also possible to suppress a decrease in the diffraction efficiency of the primary light. (Modifications) The present invention is not limited to the embodiments described above, and various changes and modifications may be made without departing from the scope of the invention. (1) An example in which only one of the width or the height of the multi-order shape is changed by emulating a concave curved surface by a multi-step shape has been described. The present invention is not limited thereto, and for example, the two may be slowly changed. (2) In the embodiment, the diffractive optical element is represented by a simple form composed only of the high refractive index portion. The present invention is not limited thereto. For example, a transparent substrate for forming a high refractive index portion may be provided, and the low refractive index portion 14 may be formed of a resin, or a coating layer covering the diffraction layer may be provided. (3) In the embodiment, the diffractive optical element having a multi-order shape is mainly described. However, the present invention is not limited thereto. For example, the multi-step shape may be formed finely until the limit is reached, and the optical element may not be recognized. A diffractive optical element formed by a multi-step shape or a continuous bevel (curved surface) shape. Further, the embodiment and the modifications may be combined as appropriate, and detailed descriptions thereof will be omitted. Further, the present invention is not limited to the embodiments described above.

10‧‧‧繞射光學元件 10‧‧‧Diffractive optical components

11‧‧‧高折射率部 11‧‧‧High refractive index

11a‧‧‧凸部 11a‧‧‧ convex

11a-0‧‧‧level 0階 11a-0‧‧‧level 0

11a-1‧‧‧level 1階 11a-1‧‧‧level 1st order

11a-2‧‧‧level 2階 11a-2‧‧‧level 2nd order

11a-3‧‧‧level 3階 11a-3‧‧‧level 3

11b‧‧‧側壁部 11b‧‧‧ Sidewall

12‧‧‧凹部 12‧‧‧ recess

13‧‧‧空間 13‧‧‧ Space

14‧‧‧低折射率部 14‧‧‧ Low refractive index

15‧‧‧繞射層 15‧‧‧Diffraction layer

200‧‧‧屏幕 200‧‧‧ screen

201‧‧‧光 201‧‧‧Light

202‧‧‧照射區域 202‧‧‧ illuminated area

204‧‧‧照射區域 204‧‧‧ illuminated area

210‧‧‧光源部 210‧‧‧Light source department

A‧‧‧位置 A‧‧‧ position

AP‧‧‧光圈 AP‧‧‧ aperture

B‧‧‧位置 B‧‧‧ position

C‧‧‧位置 C‧‧‧ position

D‧‧‧位置 D‧‧‧ position

d0‧‧‧寬度 Width of d0‧‧‧

d1‧‧‧寬度 Width of d1‧‧‧

d2‧‧‧寬度 D2‧‧‧Width

d3‧‧‧寬度 D3‧‧‧Width

d4‧‧‧寬度 D4‧‧‧Width

d5‧‧‧寬度 D5‧‧‧Width

d6‧‧‧寬度 D6‧‧‧Width

d7‧‧‧寬度 D7‧‧‧Width

E‧‧‧區域 E‧‧‧ area

F‧‧‧區域 F‧‧‧Area

h‧‧‧每一階之高度 H‧‧‧ Height of each step

L‧‧‧總階數 L‧‧‧ total order

L0‧‧‧斜面 L0‧‧‧ Bevel

level-0‧‧‧階-0 Level-0‧‧‧step-0

level-1‧‧‧階-1 Level-1‧‧‧step-1

level-2‧‧‧階-2 Level-2‧‧‧step-2

level-3‧‧‧階-3 Level-3‧‧‧3

level-4‧‧‧階-4 Level-4‧‧‧step-4

level-5‧‧‧階-5 Level-5‧‧‧step-5

level-6‧‧‧階-6 Level-6‧‧‧step-6

level-7‧‧‧階-7 Level-7‧‧‧step-7

LS‧‧‧光源 LS‧‧‧ light source

M‧‧‧功率計 M‧‧‧Power Meter

S‧‧‧感測器 S‧‧‧ sensor

圖1A係表示自薄片面之法線方向觀察所得之繞射格子之凹凸形狀形成為凸部與凹部之交界包含曲線之規則或不規則圖案的繞射光學元件之例之俯視圖。 圖1B係表示自薄片面之法線方向觀察所得之繞射格子之凹凸形狀形成為將並排配置有相同凹凸形狀之單位單元平鋪複數個而成之格子狀圖案的繞射光學元件之例之俯視圖。 圖2A係表示圖1A所示之不規則型之繞射光學元件之例中的部分週期構造之一例之立體圖。 圖2B係表示圖1B所示之GCA型之繞射光學元件之例中的部分週期構造之一例之立體圖。 圖3係於圖2A中之箭頭G-G'之位置將繞射光學元件切斷後之剖視圖。 圖4(a)、(b)係說明繞射光學元件之圖。 圖5係對繞射光學元件10中之凸部11a之凹狀曲面進行說明之圖。 圖6A(a)-(d)係將本實施形態之繞射光學元件10與先前形態比較表示之圖。 圖6B(b)、(c)係將原本之設計圖案之曲線與圖6A之圖重疊表示之圖。 圖7係表示具有8階之多階形狀之繞射光學元件10之圖。 圖8係說明凹狀曲面之剖面中之曲線與多階形狀之圖。 圖9係表示8階之剖面形狀之具體例之圖。於圖9中一併記載x、y之值。 圖10係表示4階之剖面形狀之具體例之圖。於圖10中一併記載x、y之值。 圖11(a)、(b)係說明0次繞射光之強度測定方法之圖。 圖12係表示比較例之繞射光學元件之圖。 圖13係表示針對本發明之繞射光學元件10與比較例測定0次繞射光之強度所得之結果之圖。 圖14係表示使每一階之高度變化之實施例2之形狀之圖。 圖15係將模擬之結果總結之圖。 圖16係表示以16階模仿鋸齒形狀之例之圖。 圖17係設為f=-0.02、t=0.8,並設為繞射格子之繞射角成為15°之3284 nm間距時之使C變化時之零次光強度之曲線圖。 圖18係設為C=0.25、t=0.8,並設為繞射格子之繞射角成為15°且設為3284 nm間距時之使f變化時之零次光強度之曲線圖。 圖19係設為f=-0.02、C=0.25,並設為繞射格子之繞射角成為15°且設為3284 nm間距時之使t變化時之零次光強度之曲線圖。 圖20係設為f=-0.02、t=0.8,並設為繞射格子之繞射角成為15°且設為3284 nm間距時之使C變化時之零次光強度之曲線圖。 圖21係設為C=0.18、t=0.8,並設為繞射格子之繞射角成為15°且設為3284 nm間距時之使f變化時之零次光強度之曲線圖。 圖22係設為f=-0.02、C=0.18,並設為繞射格子之繞射角成為15°且設為3284 nm間距時之使t變化時之零次光強度之曲線圖。 圖23係表示具有連結本發明之頂點之軌跡為凹狀曲面之構成之繞射光學元件之剖面形狀與模擬結果之圖。 圖24係表示具有作為理論構造之頂點呈直線狀並排之構成之繞射光學元件之剖面形狀與模擬結果之圖。 圖25係表示具有與本發明相反之連結頂點之軌跡為凸狀曲面之構成之繞射光學元件之剖面形狀與模擬結果之圖。 圖26(a)、(b)係為了進行比較而將先前構造之繞射光學元件與本發明之繞射光學元件並排表示之俯視圖。 圖27A係表示圖26中所示之各面相對於圖26(a)之基於先前之理想設計之4-level(4-階)繞射光學元件之面積之比率之圖。 圖27B係表示各面相對於基於先前之理想設計之8-level(8-階)繞射光學元件之面積之比率之圖。 圖28A係表示圖26中所示之各面相對於圖26(b)之本發明之4-level繞射光學元件之面積之比率之圖。 圖28B係表示各面相對於本發明之8-level繞射光學元件之面積之比率之圖。 圖29係基於圖26(a)、(b)之資料實際製造繞射光學元件並對零次光進行測定所得之實測值之結果。 圖30係表示3種繞射光學元件之面積比率之圖。 圖31係自薄片面之法線方向觀察理想設計之繞射光學元件之圖。 圖32係自薄片面之法線方向觀察type(類型)1之繞射光學元件之圖。 圖33係自薄片面之法線方向觀察type2之繞射光學元件之圖。 圖34係以數值表示3種繞射光學元件之模擬結果之圖。 圖35係以曲線圖表示3種繞射光學元件之模擬結果之圖。 圖36係表示自雷射顯微鏡獲取之黑白(灰度)圖像之例之圖。 圖37係表示使自雷射顯微鏡獲取之黑白圖像2值化所得之結果之圖。 圖38係表示將level-3塗色之例之圖。 圖39係表示將level-2塗色之例之圖。 圖40係表示將level-1塗色之例之圖。 圖41係表示將level-0塗色之例之圖。1A is a plan view showing an example of a diffractive optical element in which a concave-convex shape of a diffraction grating obtained from a normal direction of a sheet surface is formed into a regular or irregular pattern in which a boundary between a convex portion and a concave portion includes a curved line. 1B is a view showing an example of a diffractive optical element in which a concave-convex shape of a diffraction grating obtained from a normal direction of a sheet surface is formed in a lattice pattern in which a plurality of unit cells of the same uneven shape are arranged side by side. Top view. Fig. 2A is a perspective view showing an example of a partial periodic structure in an example of the irregular type diffractive optical element shown in Fig. 1A. Fig. 2B is a perspective view showing an example of a partial periodic structure in the example of the GCA type diffractive optical element shown in Fig. 1B. Figure 3 is a cross-sectional view showing the diffractive optical element cut off at the position of arrow G-G' in Figure 2A. 4(a) and 4(b) are views for explaining a diffractive optical element. Fig. 5 is a view for explaining a concave curved surface of the convex portion 11a in the diffractive optical element 10. Fig. 6A(a)-(d) are views showing the diffractive optical element 10 of the present embodiment in comparison with the prior art. 6B(b) and (c) are diagrams in which the curve of the original design pattern is superimposed on the graph of FIG. 6A. Fig. 7 is a view showing a diffractive optical element 10 having a multi-order shape of 8th order. Fig. 8 is a view showing a curve and a multi-order shape in a cross section of a concave curved surface. Fig. 9 is a view showing a specific example of the cross-sectional shape of the eighth step. The values of x and y are collectively shown in FIG. Fig. 10 is a view showing a specific example of the cross-sectional shape of the fourth order. The values of x and y are collectively shown in FIG. Fig. 11 (a) and (b) are views showing a method of measuring the intensity of zero-order diffracted light. Fig. 12 is a view showing a diffraction optical element of a comparative example. Fig. 13 is a graph showing the results of measuring the intensity of 0-time diffracted light for the diffractive optical element 10 of the present invention and a comparative example. Fig. 14 is a view showing the shape of the embodiment 2 in which the height of each step is changed. Figure 15 is a summary of the results of the simulation. Fig. 16 is a view showing an example of simulating a sawtooth shape in a 16th order. Fig. 17 is a graph showing the zero-order light intensity when C is changed when the diffraction angle of the diffraction grating is 15° at a distance of 3284 nm. Fig. 18 is a graph showing the zero-order light intensity when f is changed when the diffraction angle of the diffraction grating is 15° and the diffraction angle of the diffraction grating is 15°. Fig. 19 is a graph showing the zero-order light intensity when t is changed when the diffraction angle of the diffraction grating is 15° and the diffraction angle of the diffraction grating is 15°. Fig. 20 is a graph showing the zero-order light intensity when C is changed when the diffraction angle of the diffraction grating is 15° and the diffraction angle of the diffraction grating is 15°. Fig. 21 is a graph showing the zero-order light intensity when f is changed when the diffraction angle of the diffraction grating is 15° and the diffraction angle of the diffraction grating is 15°. Fig. 22 is a graph showing the zero-order light intensity when t is changed when the diffraction angle of the diffraction grating is 15° and the diffraction angle of the diffraction grating is 15°. Fig. 23 is a view showing a cross-sectional shape and a simulation result of a diffractive optical element having a configuration in which a trajectory connecting the apex of the present invention is a concave curved surface. Fig. 24 is a view showing a cross-sectional shape and a simulation result of a diffractive optical element having a configuration in which the apexes of the theoretical structure are linearly arranged side by side. Fig. 25 is a view showing a cross-sectional shape and a simulation result of a diffractive optical element having a configuration in which a trajectory connecting the vertices opposite to the present invention is a convex curved surface. 26(a) and 26(b) are plan views showing the diffractive optical element of the prior art and the diffractive optical element of the present invention in parallel for comparison. Figure 27A is a graph showing the ratio of the faces of Figure 26 to the area of the 4-level (4-step) diffractive optical element based on the prior art design of Figure 26(a). Figure 27B is a graph showing the ratio of the faces to the area of an 8-level (8-order) diffractive optical element based on the previous ideal design. Figure 28A is a graph showing the ratio of the faces of Figure 26 to the area of the 4-level diffractive optical element of the present invention of Figure 26(b). Figure 28B is a graph showing the ratio of the faces to the area of the 8-level diffractive optical element of the present invention. Fig. 29 shows the results of actually measuring the diffractive optical element and measuring the zero-order light based on the data of Figs. 26(a) and (b). Figure 30 is a graph showing the area ratio of three types of diffractive optical elements. Figure 31 is a view showing a diffractive optical element of an ideal design viewed from the normal direction of the sheet surface. Fig. 32 is a view showing a diffractive optical element of type 1 viewed from the normal direction of the sheet surface. Fig. 33 is a view showing the diffractive optical element of type 2 as seen from the normal direction of the sheet surface. Figure 34 is a graph showing numerical simulation results of three types of diffractive optical elements. Fig. 35 is a graph showing the simulation results of three kinds of diffractive optical elements in a graph. Fig. 36 is a view showing an example of a black-and-white (grayscale) image obtained from a laser microscope. Fig. 37 is a view showing the result of binarizing a black-and-white image obtained from a laser microscope. Fig. 38 is a view showing an example of coloring level-3. Fig. 39 is a view showing an example of coloring level-2. Fig. 40 is a view showing an example of coloring level-1. Fig. 41 is a view showing an example of coloring level-0.

Claims (10)

一種繞射光學元件,其係對光進行整形者,且具備繞射層,該繞射層具有: 高折射率部,其並排配置有複數個凸部;及 低折射率部,其係折射率低於上述高折射率部,且至少包含形成於上述凸部之間之凹部; 上述凸部具有藉由高度不同之複數個階部形成之多階形狀, 上述高折射率部於每單位面積中,最深之面之面積最大,最上位面之下一階之面之面積最小。A diffractive optical element that is shaped to light and has a diffraction layer having: a high refractive index portion in which a plurality of convex portions are arranged side by side; and a low refractive index portion having a refractive index a portion lower than the high refractive index portion and including at least a concave portion formed between the convex portions; the convex portion having a multi-step shape formed by a plurality of step portions having different heights, wherein the high refractive index portion is per unit area The area of the deepest surface is the largest, and the area of the first step below the uppermost plane is the smallest. 如請求項1之繞射光學元件,其中 上述高折射率部之最上位面之面積為上述高折射率部之最下位面之面積之0.6~0.9倍。The diffractive optical element according to claim 1, wherein an area of the uppermost surface of the high refractive index portion is 0.6 to 0.9 times an area of a lowermost surface of the high refractive index portion. 如請求項1或2之繞射光學元件,其中 上述高折射率部於每單位面積中,自最深之面朝向最上位面之下一階之面,各階部之面積逐次減少。The diffractive optical element according to claim 1 or 2, wherein the high refractive index portion is successively reduced from the deepest surface to the lowermost surface of the uppermost plane per unit area, and the area of each step portion is successively decreased. 一種繞射光學元件,其係對光進行整形者,且具有繞射層,該繞射層具備: 高折射率部,其於剖面形狀中並排配置有複數個凸部;及 低折射率部,其係折射率低於上述高折射率部,且至少包含形成於上述凸部之間之凹部; 上述凸部為鋸齒形狀或藉由多階之輪廓形狀模仿鋸齒形狀而成之形狀, 相對於鋸齒形狀或藉由多階之輪廓形狀模仿而成之鋸齒形狀之該繞射光學元件之薄片面傾斜之斜面具有朝向上述凸部凹陷之凹狀曲面。A diffractive optical element which is shaped to light and has a diffraction layer, the diffraction layer comprising: a high refractive index portion in which a plurality of convex portions are arranged side by side in a cross-sectional shape; and a low refractive index portion The refractive index is lower than the high refractive index portion, and includes at least a concave portion formed between the convex portions; the convex portion has a zigzag shape or a shape obtained by mimicking a zigzag shape by a multi-step contour shape, relative to the sawtooth The inclined surface of the sheet surface of the diffractive optical element having a shape or a zigzag shape mimicked by a multi-step contour shape has a concave curved surface that is recessed toward the convex portion. 如請求項4之繞射光學元件,其中 上述凸部於其側面形狀之至少一側具有藉由高度不同之複數個階部模仿上述鋸齒形狀而成之多階形狀, 藉由上述階部之高度與寬度之至少一者根據部位不同而模仿上述凹狀曲面。The diffractive optical element of claim 4, wherein the convex portion has a multi-step shape formed by mimicking the zigzag shape by a plurality of steps different in height from at least one side of the side shape thereof, by the height of the step portion At least one of the widths and the width mimics the concave curved surface depending on the location. 如請求項4或5之繞射光學元件,其中 上述凸部於其側面形狀之至少一側具有藉由高度不同之複數個階部模仿上述鋸齒形狀而成之多階形狀, 於每單位面積中,最深之面之面積最大,最上位面之下一階之面之面積最小。The diffractive optical element of claim 4 or 5, wherein the convex portion has a multi-step shape formed by mimicking the zigzag shape by a plurality of steps different in height from at least one side of the side shape, in each unit area The area of the deepest surface is the largest, and the area of the first step below the uppermost plane is the smallest. 如請求項5或6之繞射光學元件,其中 上述階部之每一階之高度固定, 藉由上述階部之寬度根據部位不同而模仿上述凹狀曲面。The diffractive optical element of claim 5 or 6, wherein the height of each of the steps is fixed, and the concave curved surface is mimicked according to the width of the step. 如請求項7之繞射光學元件,其中 於將x軸設定成上述凸部並排之方向,將上述斜面升高之方向設為x軸之正方向, 設定與該繞射光學元件之薄片面正交之y軸,將上述凸部突出之方向設為y軸之正方向, 將包含上述凸部之前端在內計數所得之階部之總階數設為L, 將每一階之寬度之減少率設為f, 將以上述凹部之最低位置為0進行計數時之對象之階部之階數設為l v, 將上述階部之每一階之高度以h設為固定值, 將階0之寬度比率設為C時, 藉由多階形狀模仿之上述凹狀曲面之剖面中之成為階0之凹頂點與各凸部之頂點之軌跡之曲線係 於將x座標相對於間距之比率設為S,且 x'=0.5×f×l v2 +C×l v S=P/{tw+Σx'i} Σ設為i=0~L-1 時,階梯形狀之頂部x, y座標由 x=0.5×f×l v2 +C×l v y=l v×h 表示。The diffractive optical element according to claim 7, wherein the x-axis is set to a direction in which the convex portions are arranged side by side, and a direction in which the inclined surface is raised is set to a positive direction of the x-axis, and a sheet surface of the diffractive optical element is set. In the y-axis, the direction in which the convex portion protrudes is the positive direction of the y-axis, and the total order of the step portion including the front end of the convex portion is set to L, and the width of each step is reduced. The rate is set to f, and the order of the step of the object when the lowest position of the concave portion is 0 is set to lv, and the height of each step of the step is set to a fixed value by h, and the order is 0. When the width ratio is set to C, the curve of the vertices of the concave vertices of the order 0 and the vertices of the convex portions in the cross section of the concave curved surface imitated by the multi-order shape is set to set the ratio of the x coordinate to the pitch S, and x'=0.5×f×lv 2 +C×lv S=P/{tw+Σx'i} When =0 is set to i=0~L-1, the top of the step shape x, the y coordinate is x=0.5×f ×lv 2 +C×lvy=lv×h. 如請求項1至8中任一項之繞射光學元件,其中 上述高折射率部形成繞射格子,該繞射格子具有自形成有凹凸形狀之面之法線方向觀察,上述凸部與上述凹部之交界包含曲線與將複數個線段連接而成之摺線之至少一者之圖案。The diffractive optical element according to any one of claims 1 to 8, wherein the high refractive index portion forms a diffraction grating having a normal direction from a surface on which the uneven shape is formed, the convex portion and the above The intersection of the recesses includes a pattern of at least one of a curve and a fold line connecting a plurality of line segments. 如請求項1至8中任一項之繞射光學元件,其中 上述高折射率部形成光柵單元陣列型之繞射格子,該光柵單元陣列型之繞射格子係自形成有凹凸形狀之面之法線方向觀察,形成為將並排配置有同一凹凸形狀之單位單元平鋪複數個而成之格子狀圖案。The diffractive optical element according to any one of claims 1 to 8, wherein the high refractive index portion forms a diffraction grating pattern of a grating element array type, and the diffraction grating pattern of the grating unit array type is formed from a surface having a concave-convex shape When viewed in the normal direction, it is formed into a lattice pattern in which a plurality of unit cells in which the same uneven shape is arranged side by side is laid.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI801986B (en) * 2020-09-03 2023-05-11 丹麥商尼爾技術有限責任公司 Diffractive optical elements and master tools for producing the diffractive optical elements

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109669278B (en) * 2018-11-21 2021-01-29 京东方科技集团股份有限公司 Lens and spectacles
KR20230084239A (en) * 2020-10-14 2023-06-12 닐 테크놀로지 에이피에스 Diffractive optical element and manufacturing method of the diffractive optical element

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3045532A (en) * 1958-05-19 1962-07-24 Coleman Instr Inc Diffraction grating having a plurality of blaze angles
US5995285A (en) * 1996-07-09 1999-11-30 Canon Kabushiki Kaisha Multilevel optical diffraction device with antireflection film and exposure apparatus
JP4341332B2 (en) * 2002-07-31 2009-10-07 旭硝子株式会社 Optical head device
WO2006043516A1 (en) * 2004-10-19 2006-04-27 Asahi Glass Company, Limited Liquid crystal diffractive lens element and optical head device
JP2006188416A (en) * 2004-12-07 2006-07-20 Pentax Corp Manufacturing method of mold for glass optical element
JPWO2008126562A1 (en) * 2007-03-28 2010-07-22 コニカミノルタオプト株式会社 Objective optical element unit for optical pickup device and optical pickup device
JP4502079B2 (en) * 2008-05-27 2010-07-14 コニカミノルタオプト株式会社 Objective lens and optical pickup device
US8111602B2 (en) * 2008-06-20 2012-02-07 Konica Minolta Opto, Inc. Objective lens, optical pickup device, and optical disk drive
JP2010096999A (en) * 2008-10-17 2010-04-30 Nikon Corp Diffraction optical element, diffraction optical member, and optical system
JP2010102008A (en) * 2008-10-22 2010-05-06 Fujinon Corp Photomask and method for making sawtooth pattern
KR101772153B1 (en) * 2010-03-17 2017-08-29 삼성디스플레이 주식회사 Display device using diffractive lens
WO2012018017A1 (en) * 2010-08-06 2012-02-09 旭硝子株式会社 Diffractive optical element and measurement device
JP2014006950A (en) * 2012-06-25 2014-01-16 Asahi Glass Co Ltd Diffraction element and optical head device
WO2015030127A1 (en) * 2013-09-02 2015-03-05 旭硝子株式会社 Diffraction optical element, projection device, and measurement device
CN105403936B (en) * 2015-12-09 2017-04-19 南京邮电大学 Column vector light beam focusing negative refractive index optical grating plane-concave lens
EP3401711B1 (en) * 2016-01-08 2023-04-05 Dai Nippon Printing Co., Ltd. Diffractive optical element and light irradiation apparatus
JP7238252B2 (en) * 2016-08-26 2023-03-14 大日本印刷株式会社 Diffractive optical element, light irradiation device
KR20190067243A (en) * 2016-10-26 2019-06-14 매직 립, 인코포레이티드 Outcoupling lattice for augmented reality systems

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI801986B (en) * 2020-09-03 2023-05-11 丹麥商尼爾技術有限責任公司 Diffractive optical elements and master tools for producing the diffractive optical elements

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