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TW201837072A - Optical film, method for producing same, polarizing plate and liquid crystal display device - Google Patents

Optical film, method for producing same, polarizing plate and liquid crystal display device Download PDF

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Publication number
TW201837072A
TW201837072A TW107110930A TW107110930A TW201837072A TW 201837072 A TW201837072 A TW 201837072A TW 107110930 A TW107110930 A TW 107110930A TW 107110930 A TW107110930 A TW 107110930A TW 201837072 A TW201837072 A TW 201837072A
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optical film
resin
block
film
unit
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TW107110930A
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TWI787246B (en
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辻野斗馬
周宏晃
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日商日本瑞翁股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/26Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer which influences the bonding during the lamination process, e.g. release layers or pressure equalising layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

Provided is a method for producing an optical film, which comprises: a step wherein a multilayer film, which comprises a core layer that is formed from a resin A and a surface layer that is formed from a resin B and is arranged on a surface of the core layer, is obtained by co-extruding the resin A and the resin B; and a step wherein the surface layer is separated from the multilayer film. Also provided is an optical film which contains a specific block copolymer. The optical film has an absolute value of the retardation in the in-plane direction of 5 nm or less, an absolute value of the retardation in the thickness direction of 10 nm or less, and a water vapor transmission rate of 20 g/(m2·day) or less.

Description

光學薄膜、其製造方法、偏光板及液晶顯示裝置Optical film, manufacturing method thereof, polarizing plate and liquid crystal display device

本發明係關於光學薄膜、其製造方法、偏光板及液晶顯示裝置。The present invention relates to an optical film, a manufacturing method thereof, a polarizing plate, and a liquid crystal display device.

設置於液晶顯示裝置的偏光板,通常具備偏光件與用以保護偏光件的保護膜。於偏光板保護膜中,多數情況下要求延遲小、水蒸氣穿透率低。由於此種觀點,提案了延遲小的偏光件保護膜(參照專利文獻1)。並且,偏光板被要求於顯示裝置的製造時及使用時的環境中顯現耐久性。舉例而言,在顯示裝置的製造時的二次加工時,以及在顯示裝置的使用時偏光件收縮時等,對於偏光板的保護膜有時要求高剝離強度。A polarizing plate provided in a liquid crystal display device usually includes a polarizer and a protective film for protecting the polarizer. In a polarizing plate protective film, a small retardation and a low water vapor transmission rate are required in most cases. From such a viewpoint, a polarizer protective film with a small retardation has been proposed (see Patent Document 1). In addition, the polarizing plate is required to exhibit durability in the environment at the time of manufacture and use of the display device. For example, the protective film of a polarizing plate sometimes requires a high peeling strength during secondary processing during the manufacturing of a display device, and when the polarizer shrinks during use of the display device.

『專利文獻』 《專利文獻1》日本專利公開第2011-013378號公報"Patent Literature" "Patent Literature 1" Japanese Patent Publication No. 2011-013378

專利文獻1所提案的偏光件保護膜係使用「包含:含有芳香族乙烯基化合物氫化物的嵌段與二烯化合物氫化物的嵌段的嵌段共聚物的樹脂」而獲得者。根據此種偏光件保護膜,可減小面內方向的延遲。然而,若使用此偏光件保護膜,則有偏光板的保護膜可能發生剝離強度不足的問題,其原因在於因偏光件保護膜所包含的聚合物分子配向而分子間的交纏降低所導致之表層附近的凝集破壞。The polarizer protective film proposed in Patent Document 1 is obtained by using “a resin containing a block copolymer containing a block of an aromatic vinyl compound hydride and a block of a diene compound hydride”. According to such a polarizer protective film, the retardation in the in-plane direction can be reduced. However, if the polarizer protective film is used, the peeling strength of the protective film of the polarizer may be insufficient. This is because the intermolecular entanglement is reduced due to the alignment of the polymer molecules contained in the polarizer protective film. Agglutination near the surface.

因此,本發明的目的在於提供:與偏光件的密合性高、延遲小且水蒸氣穿透率低的光學薄膜;可輕易獲得此種光學薄膜的光學薄膜的製造方法;以及具備該光學薄膜而具有前述性能的偏光板及液晶顯示裝置。Therefore, an object of the present invention is to provide an optical film with high adhesion to a polarizer, a small delay, and a low water vapor transmission rate; a method for manufacturing an optical film capable of easily obtaining such an optical film; and an optical film including the same A polarizing plate and a liquid crystal display device having the aforementioned performance.

針對上述以往的偏光件保護膜的問題進行研究後的結果,認為起因在於:於藉由熔融擠出法成形該保護膜的工序中,強配向層形成於該保護膜的表面上。As a result of studying the problems of the conventional polarizer protective film described above, it is thought that the reason is that in the step of forming the protective film by the melt extrusion method, a strong alignment layer was formed on the surface of the protective film.

於此,本發明人為解決上述課題而進行專心研究。其結果,本發明人發現藉由樹脂A與樹脂B的共擠出製作具備核心層與設置於該面上之表層的堆疊薄膜,透過自該堆疊薄膜剝離而去除表層,可獲得與對象物的密合性高、延遲小且水蒸氣穿透率低的光學薄膜,進而完成本發明。Here, the present inventors conducted intensive studies in order to solve the above problems. As a result, the inventors have found that a stacked film having a core layer and a surface layer provided on the surface is produced by coextrusion of resin A and resin B, and the surface layer can be removed by peeling from the stacked film to obtain a target layer. An optical film with high adhesiveness, small retardation, and low water vapor transmission rate has completed the present invention.

亦即,本發明係如下所述。That is, the present invention is as follows.

〔1〕一種光學薄膜,其包含嵌段共聚物,該嵌段共聚物含有: 具有含環烴基化合物單元的嵌段[Da];以及 具有鏈烴化合物單元或具有鏈烴化合物單元及含環烴基化合物單元的嵌段[Ea], 其中在表面與中央部的前述嵌段[Da]的體積與前述嵌段[Ea]的體積的組成比率的差係0~10%, 面內方向的延遲的絕對值係5nm以下, 厚度方向的延遲的絕對值係10nm以下, 且水蒸氣穿透率為20g/(m2.日)以下。[1] An optical film comprising a block copolymer comprising: a block [Da] having a cyclic hydrocarbon group-containing compound unit; and a chain hydrocarbon compound unit or a chain hydrocarbon compound unit and a cyclic hydrocarbon group The block [Ea] of the compound unit, wherein the difference between the composition ratio of the volume of the block [Da] on the surface and the central portion and the volume of the block [Ea] is 0 to 10%, and the retardation in the in-plane direction is The absolute value is 5 nm or less, the absolute value of the retardation in the thickness direction is 10 nm or less, and the water vapor transmission rate is 20 g / (m2.day) or less.

〔2〕如〔1〕所記載之光學薄膜,其由包含前述嵌段共聚物的樹脂受擠出製膜而成。[2] The optical film according to [1], which is formed by extruding a resin containing the block copolymer into a film.

〔3〕如〔1〕或〔2〕所記載之光學薄膜, 其中前述嵌段共聚物係每1分子包含2個以上的聚合物嵌段[Db]作為前述嵌段[Da]且每1分子包含1個以上的聚合物嵌段[Eb]作為前述嵌段[Ea]的共聚物, 聚合物嵌段[Db]具有含環烴基化合物氫化物單元, 聚合物嵌段[Eb]具有鏈烴化合物氫化物單元,或具有鏈烴化合物或其氫化物單元及含環烴化合物或其氫化物單元。[3] The optical film according to [1] or [2], wherein the block copolymer contains two or more polymer blocks per molecule [Db] as the block [Da] and each molecule A copolymer containing one or more polymer blocks [Eb] as the block [Ea], the polymer block [Db] has a cyclic hydrocarbon group-containing compound hydride unit, and the polymer block [Eb] has a chain hydrocarbon compound A hydride unit, or a chain hydrocarbon compound or a hydride unit thereof and a cyclic hydrocarbon compound or a hydride unit thereof.

〔4〕一種偏光板,其具備如〔1〕至〔3〕之任一項所記載之光學薄膜與偏光件。[4] A polarizing plate including the optical film and the polarizer according to any one of [1] to [3].

〔5〕一種液晶顯示裝置,其具備如〔4〕所記載之偏光板。[5] A liquid crystal display device including the polarizing plate according to [4].

〔6〕一種光學薄膜的製造方法,其包含: 藉由共擠出樹脂A與樹脂B,獲得具備由樹脂A而成之核心層及設置於前述核心層之面上的由樹脂B而成之表層的堆疊薄膜的工序;以及 自前述堆疊薄膜剝離前述表層的工序; 其中前述光學薄膜其面內方向的延遲的絕對值係5nm以下,其厚度方向的延遲的絕對值係10nm以下,且其水蒸氣穿透率係20g/(m2 .日)以下。[6] A method for manufacturing an optical film, comprising: co-extruding resin A and resin B to obtain a core layer made of resin A and a resin layer B provided on a surface of the core layer. A step of stacking a film on the surface layer; and a step of peeling the surface layer from the stacked film; wherein the absolute value of the retardation in the in-plane direction of the optical film is 5 nm or less, the absolute value of the retardation in the thickness direction is 10 nm or less, and the water The vapor transmission rate is below 20 g / (m 2 .day).

〔7〕如〔6〕所記載之光學薄膜的製造方法,其中前述光學薄膜的前述面內方向的延遲的絕對值係2nm以下,前述光學薄膜的前述厚度方向的延遲的絕對值係2nm以下。[7] The method for producing an optical film according to [6], wherein the absolute value of the retardation in the in-plane direction of the optical film is 2 nm or less, and the absolute value of the retardation in the thickness direction of the optical film is 2 nm or less.

〔8〕如〔6〕或〔7〕所記載之光學薄膜的製造方法,其中前述樹脂B包含含脂環結構聚合物。[8] The method for producing an optical film according to [6] or [7], wherein the resin B includes an alicyclic structure-containing polymer.

〔9〕如〔6〕至〔8〕之任一項所記載之光學薄膜的製造方法, 其中前述樹脂A包含氫化嵌段共聚物,該氫化嵌段共聚物每1分子含有2個以上的聚合物嵌段[D]且每1分子含有1個以上的聚合物嵌段[E], 聚合物嵌段[D]具有含環烴基化合物氫化物單元, 聚合物嵌段[E]具有鏈烴化合物氫化物單元,或具有鏈烴化合物單元及含環烴化合物氫化物單元。[9] The method for producing an optical film according to any one of [6] to [8], wherein the resin A includes a hydrogenated block copolymer, and the hydrogenated block copolymer contains two or more polymerizations per molecule. Polymer block [D] and one or more polymer blocks [E] per molecule, the polymer block [D] has a cyclic hydrocarbon group-containing compound hydride unit, and the polymer block [E] has a chain hydrocarbon compound A hydride unit or a chain hydrocarbon compound unit and a cyclic hydrocarbon compound-containing hydride unit.

〔10〕如〔6〕至〔8〕之任一項所記載之光學薄膜的製造方法, 其中前述樹脂A由嵌段共聚物而成,該嵌段共聚物包含: 具有含環烴基化合物單元的嵌段;以及 具有鏈烴化合物單元或具有鏈烴化合物單元及含環烴基化合物單元的嵌段, 於前述光學薄膜中,在其表面與中央部的組成比率的差係0~10%。[10] The method for producing an optical film according to any one of [6] to [8], wherein the resin A is made of a block copolymer, and the block copolymer includes: A block; and a block having a chain hydrocarbon compound unit or a chain hydrocarbon compound unit and a cyclic hydrocarbon group-containing compound unit, in the optical film, the difference between the composition ratios of the surface and the central portion is 0 to 10%.

本發明的光學薄膜得做成與對象物的密合性高、延遲小且水蒸氣穿透率低的光學薄膜。根據本發明的光學薄膜的製造方法,可輕易獲得與對象物的密合性高、延遲小且水蒸氣穿透率低的光學薄膜。根據本發明的偏光板,可提供具有如前述性能的偏光板。根據本發明的液晶顯示裝置,可提供具有如前述性能的液晶顯示裝置。The optical film of the present invention can be made into an optical film with high adhesion to an object, small retardation, and low water vapor transmission rate. According to the method for producing an optical film of the present invention, an optical film having high adhesion to a target, a small retardation, and a low water vapor transmission rate can be easily obtained. According to the polarizing plate of the present invention, a polarizing plate having the aforementioned performance can be provided. According to the liquid crystal display device of the present invention, a liquid crystal display device having the aforementioned performance can be provided.

以下揭示實施型態及示例物以詳細說明本發明。惟本發明並非為限定於以下所揭示之實施型態及示例物者,在不脫離本發明之申請專利範圍及其均等範圍之範圍中,得任意變更而實施。The embodiments and examples are disclosed below to explain the present invention in detail. However, the present invention is not limited to the implementation modes and examples disclosed below, and can be implemented with arbitrary changes without departing from the scope of the patent application of the present invention and its equivalent scope.

於以下之說明中,所謂環烴基係芳環、環烷、環烯等包含環狀結構的烴之基。並且,所謂鏈烴化合物係不包含此種環烴基的烴化合物。In the following description, a cycloalkyl group is a group containing a cyclic structure such as an aromatic ring, a cycloalkane, or a cycloalkene. In addition, a so-called chain hydrocarbon compound is a hydrocarbon compound which does not contain such a cyclic hydrocarbon group.

於以下之說明中,除非另有註明,否則光學薄膜的面內方向的延遲Re係由Re=(nx−ny)×d所表示之值。並且,除非另有註明,否則光學薄膜的厚度方向的延遲Rth係由Rth=[(nx+ny)/2-nz]×d所表示之值。於此,nx表示為垂直於光學薄膜之厚度方向的方向(面內方向)且給予最大折射率之方向的折射率。ny表示為光學薄膜之前述面內方向且正交於nx之方向的方向的折射率。nz表示光學薄膜的厚度方向的折射率。d表示光學薄膜的厚度。延遲之量測波長,除非另有註明,否則為590 nm。In the following description, unless otherwise noted, the retardation Re in the in-plane direction of the optical film is a value represented by Re = (nx−ny) × d. In addition, unless otherwise noted, the retardation Rth in the thickness direction of the optical film is a value represented by Rth = [(nx + ny) / 2-nz] × d. Here, nx is a refractive index in a direction (in-plane direction) perpendicular to the thickness direction of the optical film and in a direction giving the maximum refractive index. ny is the refractive index of the optical film in the aforementioned in-plane direction and a direction orthogonal to the direction of nx. nz represents the refractive index in the thickness direction of the optical film. d represents the thickness of the optical film. The retardation measurement wavelength is 590 nm unless otherwise noted.

於以下之說明中,除非另有註明,否則所謂「偏光板」,不僅包含剛性的部件,亦包含例如樹脂製之薄膜般具有可撓性的部件。In the following description, unless otherwise noted, the so-called "polarizing plate" includes not only rigid members but also members having flexibility such as a resin film.

於以下之說明中,所謂「長條狀」之薄膜,係指相對於幅寬具有5倍以上之長度的薄膜,以具有10倍或以上之長度為佳,具體而言係指具有收捲成輥狀以儲存或運輸程度之長度的薄膜。長條狀薄膜之長度的上限並未特別限定,得定為例如相對於幅寬之10萬倍以下。In the following description, the so-called "long-shaped" film refers to a film having a length of 5 times or more with respect to the width, and preferably a length of 10 times or more, and specifically means having a roll Film that is roll-shaped to the extent of storage or transport. The upper limit of the length of the elongated film is not particularly limited, and may be set to, for example, 100,000 times or less with respect to the width.

〔1.本發明的光學薄膜的製造方法〕[1. Manufacturing method of optical film of the present invention]

於本發明之某態樣中,光學薄膜的製造方法包含「藉由共擠出形成核心層的樹脂A與形成表層的樹脂B而獲得具備由樹脂A而成之核心層及設置於核心層之面上的由樹脂B而成之表層的堆疊薄膜的工序(堆疊薄膜製作工序)」與「自堆疊薄膜剝離表層的工序(剝離工序)」。In a certain aspect of the present invention, the method for manufacturing an optical film includes "the resin A forming the core layer and the resin B forming the surface layer are co-extruded to obtain a core layer made of resin A and a core layer provided on the core layer. Step of stacking film of surface layer made of resin B on the surface (stack film production step) "and" step of peeling surface layer from stack film (peeling step) ".

〔1.1.堆疊薄膜製作工序的概要〕[1.1. Overview of the manufacturing process of the stacked film]

於堆疊薄膜製作工序中,藉由將用以形成核心層的樹脂A與用以形成表層的樹脂B共擠出而獲得堆疊薄膜。共擠出得使用多層擠製機進行。In the manufacturing process of the stacked film, the resin A used to form the core layer and the resin B used to form the surface layer are co-extruded to obtain a stacked film. Coextrusion is performed using a multi-layer extruder.

於圖1所示之實施型態中,堆疊薄膜20於核心層10的2面上分別具備表層11,12。詳細而言,堆疊薄膜20具有表層11/核心層10/表層12的層結構。圖1所示之M係擠製成形機。堆疊薄膜亦可僅於核心層之一側的面上具備表層,此情況下的層結構係表層/核心層。就抑制薄膜翹曲的觀點而言,表層以位於核心層的兩面為佳。In the embodiment shown in FIG. 1, the stacked film 20 is provided with surface layers 11 and 12 on both sides of the core layer 10. Specifically, the stacked film 20 has a layer structure of a surface layer 11 / a core layer 10 / a surface layer 12. The M system shown in Fig. 1 is an extruder. The stacked film may have a surface layer only on one side of the core layer. In this case, the layer structure is a surface layer / core layer. From the viewpoint of suppressing film warpage, the surface layer is preferably located on both sides of the core layer.

〔1.1.1.樹脂A〕[1.1.1. Resin A]

作為形成核心層的樹脂A,得使用熱塑性樹脂。As the resin A forming the core layer, a thermoplastic resin may be used.

作為形成核心層的熱塑性樹脂(以下亦稱為「熱塑性樹脂A」)並未特別限定,得適當選擇並採用包含得給予作為光學薄膜之期望物性的各種聚合物的樹脂。作為熱塑性樹脂A所包含之聚合物的較佳例,可列舉:包含2個以上的「具有含環烴基化合物氫化物單元的聚合物嵌段[D]」與1個以上的「具有鏈烴化合物氫化物單元或具有鏈烴化合物單元及含環烴化合物氫化物單元的聚合物嵌段[E]」的氫化嵌段共聚物[G]。樹脂A藉由為包含氫化嵌段共聚物[G]者,可獲得相位差低的光學薄膜,因此,可將藉由本發明的製造方法而獲得的光學薄膜作為要求低相位差的部件而使用。此外,還可獲得耐光性高且不易黃變的光學薄膜。The thermoplastic resin forming the core layer (hereinafter also referred to as "thermoplastic resin A") is not particularly limited, and a resin containing various polymers that impart desired physical properties as an optical film may be appropriately selected and used. Preferable examples of the polymer included in the thermoplastic resin A include a polymer block [D] having two or more "having a cyclic hydrocarbon group-containing compound hydride unit" and one or more "having a hydrocarbon compound. A hydrogenated block copolymer [G] of a hydride unit or a polymer block [E] "having a chain hydrocarbon compound unit and a cyclic hydrocarbon compound-containing hydride unit. The resin A includes a hydrogenated block copolymer [G], and can obtain an optical film having a low retardation. Therefore, the optical film obtained by the production method of the present invention can be used as a component requiring a low retardation. In addition, an optical film having high light resistance and less yellowing can be obtained.

嵌段[D]及嵌段[E]所包含之含環烴基化合物氫化物單元係以芳香族乙烯基化合物氫化物單元為佳。芳香族乙烯基化合物氫化物單元係具有「將芳香族乙烯基化合物聚合而獲得的單元進一步氫化而形成之結構」的結構單元。惟芳香族乙烯基化合物氫化物單元不受其製造方法所限定。The cyclic hydrocarbon group-containing compound hydride unit included in the block [D] and the block [E] is preferably an aromatic vinyl compound hydride unit. The aromatic vinyl compound hydride unit has a structural unit of "a structure formed by further hydrogenating a unit obtained by polymerizing an aromatic vinyl compound." However, the aromatic vinyl compound hydride unit is not limited by the production method.

作為芳香族乙烯基化合物之例,可列舉:苯乙烯;α-甲基苯乙烯、2-甲基苯乙烯、3-甲基苯乙烯、4-甲基苯乙烯、2,4-二甲基苯乙烯、2,4-二異丙基苯乙烯、4-三級丁基苯乙烯、5-三級丁基-2-甲基苯乙烯等具有碳數1~6的烷基作為取代基的苯乙烯類;4-氯苯乙烯、二氯苯乙烯、4-單氟苯乙烯等具有鹵原子作為取代基的苯乙烯類;4-甲氧基苯乙烯等具有碳數1~6的烷氧基作為取代基的苯乙烯類;4-苯基苯乙烯等具有芳基作為取代基的苯乙烯類;1-乙烯基萘、2-乙烯基萘等乙烯基萘類;等。此等可單獨使用1種,亦可以任意比例組合2種以上使用。此等之中,就可降低吸濕性而言,以苯乙烯、具有碳數1~6的烷基作為取代基之苯乙烯類等不包含極性基的芳香族乙烯基化合物為佳,就工業取得之容易性而言,尤以苯乙烯為佳。Examples of the aromatic vinyl compound include styrene; α-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methylstyrene, and 2,4-dimethyl Styrene, 2,4-diisopropylstyrene, 4-tert-butylstyrene, 5-tert-butyl-2-methylstyrene, and the like having alkyl groups having 1 to 6 carbon atoms as substituents Styrene; styrenes with halogen atoms as substituents, such as 4-chlorostyrene, dichlorostyrene, and 4-monofluorostyrene; 4-methoxystyrene and other alkoxy groups with 1 to 6 carbon atoms Styrenes having a substituent as a substituent; styrenes having an aryl group as a substituent such as 4-phenylstyrene; vinylnaphthalenes such as 1-vinylnaphthalene and 2-vinylnaphthalene; and the like. These can be used alone or in combination of two or more at any ratio. Among these, in terms of reducing hygroscopicity, aromatic vinyl compounds which do not contain a polar group, such as styrene, styrenes having an alkyl group having 1 to 6 carbon atoms as substituents, are preferred. In terms of ease of acquisition, styrene is particularly preferred.

嵌段[E]所包含之鏈烴化合物氫化物單元,係以鏈狀共軛二烯化合物氫化物單元為佳。鏈狀共軛二烯化合物氫化物單元,係聚合鏈狀共軛二烯化合物而獲得之單元,或者係在其具有雙鍵的情況下具有將此雙鍵的一部分或全部氫化而獲得之單元的結構的結構單元。惟鏈狀共軛二烯化合物氫化物單元不受其製造方法所限定。The chain hydrocarbon compound hydride unit contained in the block [E] is preferably a chain conjugated diene compound hydride unit. A chain conjugated diene compound hydride unit is a unit obtained by polymerizing a chain conjugated diene compound, or a unit obtained by hydrogenating a part or all of this double bond when it has a double bond. The structural unit of the structure. However, the chain-like conjugated diene compound hydride unit is not limited by the method for producing the same.

作為鏈狀共軛二烯化合物之例,可列舉:1,3-丁二烯、異戊二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯等。此等可單獨使用1種,亦可以任意比例組合2種以上使用。其中,由於可降低吸濕性,以不含有極性基的鏈狀共軛二烯化合物為佳,尤以1,3-丁二烯及異戊二烯為佳。Examples of the chain conjugated diene compound include 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, and 1,3-pentadiene. Wait. These can be used alone or in combination of two or more at any ratio. Among them, since the hygroscopicity can be reduced, a chain conjugated diene compound not containing a polar group is preferable, and 1,3-butadiene and isoprene are particularly preferable.

氫化嵌段共聚物[G],以具有:每1分子擁有1個嵌段[E]與2個連結於其兩端的嵌段[D]的三嵌段分子結構為佳。亦即,氫化嵌段共聚物[G],以每1分子包含:1個嵌段[E];1個連結於嵌段[E]的一端且具有含環烴基化合物氫化物單元[I]的嵌段[D1];1個連結於嵌段[E]的另一端且具有含環烴基化合物氫化物單元[I]的嵌段[D2]的三嵌段共聚物為佳。The hydrogenated block copolymer [G] preferably has a triblock molecular structure having one block [E] per molecule and two blocks [D] connected to both ends thereof. That is, the hydrogenated block copolymer [G] includes, per molecule, one block [E]; one connected to one end of the block [E] and having a cyclic hydrocarbon compound-containing hydride unit [I]. Block [D1]; A triblock copolymer having a block [D2] having a cyclic hydrocarbon group-containing hydride unit [I] connected to the other end of the block [E] is preferred.

於上述作為三嵌段共聚物的氫化嵌段共聚物[G]中,就輕易獲得具有較佳特性的堆疊薄膜的觀點而言,嵌段[D1]及嵌段[D2]的合計與嵌段[E]的重量比(D1+D2)/E以收束在特定範圍為佳。具體而言,重量比(D1+D2)/E以70/30以上為佳,以75/25以上為較佳,且以90/10以下為佳,以87/13以下為較佳。In the above-mentioned hydrogenated block copolymer [G], which is a triblock copolymer, from the viewpoint of easily obtaining a stacked film having better characteristics, the total of the block [D1] and the block [D2] and the block The weight ratio of [E] (D1 + D2) / E is preferably in a specific range. Specifically, the weight ratio (D1 + D2) / E is preferably 70/30 or more, more preferably 75/25 or more, more preferably 90/10 or less, and most preferably 87/13 or less.

並且,於上述作為三嵌段共聚物的氫化嵌段共聚物[G]中,就輕易獲得具有上述特性的堆疊薄膜的觀點而言,嵌段[D1]與嵌段[D2]的重量比D1/D2以收束在特定範圍為佳。具體而言,重量比D1/D2以5以上為佳,以5.2以上為較佳,尤以5.5以上為佳,且以8以下為佳,以7.8以下為較佳,尤以7.5以下為佳。In addition, in the hydrogenated block copolymer [G], which is a triblock copolymer, from the viewpoint of easily obtaining a stacked film having the above characteristics, the weight ratio D1 of the block [D1] to the block [D2] / D2 is preferably in a specific range. Specifically, the weight ratio D1 / D2 is preferably 5 or more, more preferably 5.2 or more, more preferably 5.5 or more, and 8 or less, more preferably 7.8 or less, and even more preferably 7.5 or less.

氫化嵌段共聚物[G]的重量平均分子量Mw以50000以上為佳,以55000以上為較佳,尤以60000以上為佳,且以80000以下為佳,以75000以下為較佳,尤以70000以下為佳。藉由重量平均分子量Mw位於前述範圍,可輕易獲得具有上述特性的堆疊薄膜。尤其藉由將重量平均分子量減小,可有效減小延遲的顯現性。The weight average molecular weight Mw of the hydrogenated block copolymer [G] is preferably 50,000 or more, more preferably 55,000 or more, particularly preferably 60,000 or more, and more preferably 80,000 or less, more preferably 75,000 or less, and especially 70,000. The following is better. When the weight average molecular weight Mw is in the aforementioned range, a stacked film having the above characteristics can be easily obtained. In particular, by reducing the weight-average molecular weight, the appearance of retardation can be effectively reduced.

氫化嵌段共聚物[G]的分子量分布(重量平均分子量(Mw)/數量平均分子量(Mn))以2.0以下為佳,以1.7以下為較佳,尤以1.5以下為佳,且以1.0以上為佳。藉由重量平均分子量Mw位於前述範圍,可降低聚合物黏度而提高成形性。並且,可有效減小延遲的顯現性。The molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the hydrogenated block copolymer [G] is preferably 2.0 or less, more preferably 1.7 or less, particularly preferably 1.5 or less, and more than 1.0 Better. When the weight average molecular weight Mw is in the aforementioned range, the viscosity of the polymer can be reduced and the moldability can be improved. In addition, the visibility of the delay can be effectively reduced.

氫化嵌段共聚物[G]的重量平均分子量Mw及數量平均分子量Mn得透過以環己烷為溶劑的凝膠滲透層析法量測作為聚苯乙烯換算之值。前述嵌段共聚物氫化物[G],例如其主鏈及側鏈的碳-碳不飽和鍵以90%以上被氫化為佳,以97%以上被氫化為較佳,以99%以上被氫化為更佳。並且,前述嵌段共聚物氫化物[G],例如其芳環的碳-碳不飽和鍵以90%以上被氫化為佳,以97%以上被氫化為較佳,以99%以上被氫化為更佳。表示氫化的程度的氫化率愈高,愈可預期耐熱性、耐光性的提升。The weight-average molecular weight Mw and the number-average molecular weight Mn of the hydrogenated block copolymer [G] were measured by gel permeation chromatography using cyclohexane as a solvent, and the values were converted into polystyrene values. The aforementioned block copolymer hydride [G], for example, the carbon-carbon unsaturated bonds of its main chain and side chain are preferably hydrogenated at 90% or more, more preferably 97% or more, and 99% or more For the better. In addition, the block copolymer hydride [G], for example, preferably has a carbon-carbon unsaturated bond whose aromatic ring is hydrogenated at 90% or more, more preferably 97% or more, and 99% or more. Better. The higher the hydrogenation rate, which indicates the degree of hydrogenation, the more expected improvement in heat resistance and light resistance.

嵌段[D1]及嵌段[D2]以分別獨立僅由含環烴基化合物氫化物單元[I]而成為佳,但得包含含環烴基化合物氫化物單元[I]以外之任意單元。作為任意結構單元之例,可列舉:基於含環烴基化合物氫化物單元[I]以外的乙烯化合物的結構單元。嵌段[D]中的任意結構單元的含率以10重量%以下為佳,以5重量%以下為較佳,尤以1重量%以下為佳。The block [D1] and the block [D2] are preferably each independently composed only of the cyclic hydrocarbon group-containing compound hydride unit [I]. However, any unit other than the cyclic hydrocarbon group-containing compound hydride unit [I] can be obtained. Examples of the arbitrary structural unit include a structural unit based on an ethylene compound other than the cyclic hydrocarbon group-containing compound hydride unit [I]. The content of the arbitrary structural unit in the block [D] is preferably 10% by weight or less, more preferably 5% by weight or less, and particularly preferably 1% by weight or less.

嵌段[E]係僅由鏈狀氫化烴氫化物單元[II]而成之嵌段或具有鏈烴化合物單元[II]及含環烴化合物氫化物單元[I]的嵌段。嵌段[E]得包含單元[I]及單元[II]以外之任意單元。作為任意結構單元之例,可列舉:基於單元[I]及單元[II]以外之乙烯化合物的結構單元。嵌段[E]中的任意結構單元含率以10重量%以下為佳,以5重量%以下為較佳,尤以1重量%以下為佳。The block [E] is a block composed of only chain hydrogenated hydrocarbon hydride units [II] or a block having a chain hydrocarbon compound unit [II] and a cyclic hydrocarbon compound hydride unit [I]. The block [E] may include any unit other than the unit [I] and the unit [II]. Examples of the arbitrary structural unit include a structural unit based on an ethylene compound other than the unit [I] and the unit [II]. The content of the arbitrary structural unit in the block [E] is preferably 10% by weight or less, more preferably 5% by weight or less, and particularly preferably 1% by weight or less.

上述作為三嵌段共聚物的氫化嵌段共聚物[G],延遲的顯現性小。因此,自堆疊體剝離表層而獲得之光學薄膜,可輕易獲得期望的特性。The above-mentioned hydrogenated block copolymer [G], which is a triblock copolymer, has a small retardation display property. Therefore, the optical film obtained by peeling the surface layer from the stacked body can easily obtain desired characteristics.

作為氫化嵌段共聚物[G]的具體例及製造方法,可列舉例如:國際專利公開第WO2016/152871號所揭示的具體例及製造方法。Specific examples and production methods of the hydrogenated block copolymer [G] include, for example, specific examples and production methods disclosed in International Patent Publication No. WO2016 / 152871.

熱塑性樹脂A可僅由上述氫化嵌段共聚物[G]而成,但亦可包含氫化嵌段共聚物[G]以外之任意成分。The thermoplastic resin A may be composed only of the hydrogenated block copolymer [G] described above, but may include any component other than the hydrogenated block copolymer [G].

作為任意成分,可列舉例如:無機微粒子;抗氧化劑、熱穩定劑、紫外線吸收劑、近紅外線吸收劑等穩定劑;潤滑劑、塑化劑等樹脂改質劑;染料或顏料等著色劑;以及抗靜電劑。作為此等之任意成分,可單獨使用1種,亦可以任意比率組合2種以上使用。惟就使本發明的效果明顯發揮的觀點而言,任意成分的含有比例以少為佳。舉例而言,任意成分之合計的比例相對於氫化嵌段共聚物[G]100重量份,以10重量份以下為佳,以7重量份以下為較佳,以5重量份以下為更佳。Examples of the optional component include inorganic fine particles; stabilizers such as antioxidants, heat stabilizers, ultraviolet absorbers, and near-infrared absorbers; resin modifiers such as lubricants and plasticizers; colorants such as dyes and pigments; and Antistatic agent. These arbitrary components can be used individually by 1 type, and can also be used combining two or more types by arbitrary ratios. However, from the viewpoint of making the effects of the present invention apparent, it is preferable that the content ratio of any component is small. For example, the total ratio of any component is preferably 10 parts by weight or less, more preferably 7 parts by weight or less, and even more preferably 5 parts by weight or less with respect to 100 parts by weight of the hydrogenated block copolymer [G].

熱塑性樹脂A,其玻璃轉移溫度以110℃以上為佳,以120℃以上為較佳,且以180℃以下為佳,以170℃以下為較佳。玻璃轉移溫度位於此種範圍的熱塑性樹脂A,尺寸穩定性及成形加工性優異。The thermoplastic resin A preferably has a glass transition temperature of 110 ° C or higher, more preferably 120 ° C or higher, and more preferably 180 ° C or lower, and more preferably 170 ° C or lower. The thermoplastic resin A having a glass transition temperature in this range is excellent in dimensional stability and molding processability.

〔1.1.2.樹脂B〕[1.1.2. Resin B]

作為形成表層的樹脂B,使用得形成能自由樹脂A而成之核心層剝離的表層的樹脂。作為樹脂B得使用熱塑性樹脂。於以下之說明中,為了各自區別用以2個表層的樹脂B,有時表現為樹脂B1、樹脂B2。樹脂B1與樹脂B2可為相同者,亦可為相異者。As the resin B for forming the surface layer, a resin for forming a surface layer capable of peeling off the core layer formed by the free resin A is used. As the resin B, a thermoplastic resin must be used. In the following description, in order to distinguish the resin B used for the two surface layers, resin B1 and resin B2 may be expressed. The resin B1 and the resin B2 may be the same or different.

作為形成表層的熱塑性樹脂(以下亦稱為「熱塑性樹脂B」),只要為得形成能自核心層剝離的表層的樹脂的話,則並未特別限定,得適當選擇並採用包含各種聚合物的樹脂。The thermoplastic resin that forms the surface layer (hereinafter also referred to as "thermoplastic resin B") is not particularly limited as long as it is a resin that can form a surface layer that can be peeled from the core layer, and a resin containing various polymers can be appropriately selected and used. .

作為熱塑性樹脂B所包含之聚合物的較佳例,可列舉含脂環結構聚合物。含脂環結構聚合物係在重複單元中具有脂環結構的聚合物,且可使用在主鏈中含有脂環結構的聚合物及在側鏈中含有脂環結構的聚合物之任一者。含脂環結構聚合物雖包含結晶性的樹脂及非晶性樹脂,但就表面平滑性的觀點而言,以非晶性的樹脂為佳。Preferred examples of the polymer contained in the thermoplastic resin B include alicyclic structure-containing polymers. The alicyclic structure-containing polymer is a polymer having an alicyclic structure in a repeating unit, and any of a polymer containing an alicyclic structure in a main chain and a polymer containing an alicyclic structure in a side chain can be used. Although the alicyclic structure-containing polymer includes a crystalline resin and an amorphous resin, an amorphous resin is preferred from the viewpoint of surface smoothness.

作為脂環結構,可列舉例如:環烷結構、環烯結構等,但就熱穩定性等觀點而言,以環烷結構為佳。Examples of the alicyclic structure include a cycloalkane structure and a cycloalkene structure. From the viewpoint of thermal stability and the like, a cycloalkane structure is preferred.

構成1個脂環結構的重複單元的碳數並未特別限定,但通常為4個~30個,以5個~20個為佳,以6個~15個為較佳。The carbon number of the repeating unit constituting one alicyclic structure is not particularly limited, but it is usually 4 to 30, preferably 5 to 20, and more preferably 6 to 15.

含脂環結構聚合物中之具有脂環結構的重複單元的比例依使用目的而適當選擇,但通常為50重量%以上,以70重量%以上為佳,以90重量%以上為較佳。藉由將具有脂環結構的重複單元做成如此多,可提高表層的耐熱性。The proportion of the repeating unit having an alicyclic structure in the alicyclic structure-containing polymer is appropriately selected depending on the purpose of use, but it is usually 50% by weight or more, preferably 70% by weight or more, and more preferably 90% by weight or more. By having so many repeating units having an alicyclic structure, the heat resistance of the surface layer can be improved.

含脂環結構聚合物具體可列舉:(1)降烯系聚合物、(2)單環的環烯烴聚合物、(3)環狀共軛二烯聚合物、(4)乙烯脂環烴聚合物及此等的氫化物等。此等之中,就成形性的觀點而言,以降烯系聚合物及此等的氫化物為較佳。Specific examples of the alicyclic structure-containing polymer include: (1) a norbornene polymer, (2) a monocyclic cyclic olefin polymer, (3) a cyclic conjugated diene polymer, and (4) ethylene alicyclic hydrocarbon polymerization. And these hydrides. Among these, from the viewpoint of moldability, a norbornene-based polymer and these hydrides are preferable.

作為降烯系聚合物,可列舉例如:降烯系單體的開環聚合物、降烯系單體與能開環共聚合的其他單體所形成的開環共聚物及該等的氫化物;降烯系單體的加成聚合物、降烯系單體與能共聚合的其他單體所形成的加成共聚物等。此等之中,就成形性的觀點而言,尤以降烯系單體的開環聚合物氫化物為佳。Examples of the olefin-reducing polymer include ring-opening polymers of the olefin-reducing monomer, ring-opening copolymers of the olefin-reducing monomer and other monomers capable of ring-opening copolymerization, and hydrides thereof. ; Addition polymers of norylene monomers, addition copolymers of norylene monomers and other monomers that can be copolymerized. Among these, a ring-opening polymer hydride of a norbornene-based monomer is particularly preferred from the viewpoint of moldability.

上述含脂環結構聚合物選自例如日本專利公開第2002-321302號公報所揭示的聚合物。The alicyclic structure-containing polymer is selected from polymers disclosed in, for example, Japanese Patent Laid-Open No. 2002-321302.

並且,作為結晶性的含脂環結構聚合物之例,可列舉例如日本專利公開第2016-26909號公報所揭示的聚合物。Examples of the crystalline alicyclic structure-containing polymer include polymers disclosed in Japanese Patent Laid-Open No. 2016-26909.

含脂環結構聚合物的重量平均分子量,以透過使用環己烷(樹脂不溶解的情況下使用甲苯)作為溶劑的凝膠滲透層析法(以下省略為「GPC」。)量測的聚異戊二烯換算(溶劑為甲苯時,聚苯乙烯換算)的重量平均分子量(Mw)通常為10,000~100,000,以25,000~80,000為佳,以25,000~50,000為較佳。重量平均分子量在此種範圍時,表層的機械強度及成形加工性取得高度平衡。The weight average molecular weight of the alicyclic structure-containing polymer is measured by gel permeation chromatography (hereinafter abbreviated to "GPC") using cyclohexane (toluene is used when the resin is not dissolved) as a solvent. The weight average molecular weight (Mw) of pentadiene conversion (polystyrene conversion when the solvent is toluene) is usually 10,000 to 100,000, preferably 25,000 to 80,000, and most preferably 25,000 to 50,000. When the weight average molecular weight is in this range, the mechanical strength and formability of the surface layer are highly balanced.

含脂環結構聚合物的分子量分布(重量平均分子量(Mw)/數量平均分子量(Mn))通常為1~10,以1~4為佳,以1.2~3.5為較佳。The molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the alicyclic structure-containing polymer is usually 1 to 10, preferably 1 to 4, and more preferably 1.2 to 3.5.

熱塑性樹脂B,其玻璃轉移溫度以110℃以上為佳,以120℃以上為較佳,且以180℃以下為佳,以170℃以下為較佳。玻璃轉移溫度位於此種範圍的熱塑性樹脂B,成形加工性優異。The thermoplastic resin B preferably has a glass transition temperature of 110 ° C or higher, more preferably 120 ° C or higher, and more preferably 180 ° C or lower, and more preferably 170 ° C or lower. The thermoplastic resin B having a glass transition temperature in this range is excellent in molding processability.

熱塑性樹脂B可僅由含脂環結構聚合物而成,但只要不明顯損及本發明的效果,亦可包含任意成分。作為任意成分,可使用與熱塑性樹脂A的任意成分相同者。熱塑性樹脂B中的含脂環結構聚合物的比例,以70重量%以上為佳,以80重量%以上為較佳。The thermoplastic resin B may be composed only of an alicyclic structure-containing polymer, but may also contain an arbitrary component as long as the effect of the present invention is not significantly impaired. As an arbitrary component, the same as the arbitrary component of the thermoplastic resin A can be used. The proportion of the alicyclic structure-containing polymer in the thermoplastic resin B is preferably 70% by weight or more, and more preferably 80% by weight or more.

作為包含含脂環結構聚合物的樹脂,由於市售有各式各樣的商品,得適當選擇該等之中具有期望特性者作為熱塑性樹脂B使用。作為此種市售品之例,可列舉:商品名「ZEONOR」(日本瑞翁股份有限公司製)的製品系列。As a resin containing an alicyclic structure-containing polymer, various products are commercially available, and those having desired characteristics among them may be appropriately selected and used as the thermoplastic resin B. As an example of such a commercially available product, a product series with a brand name "ZEONOR" (manufactured by Japan's Rui On Co., Ltd.) can be cited.

〔1.2.堆疊薄膜製作工序〕[1.2. Manufacturing process for stacked films]

於堆疊薄膜製作工序中,分別製備樹脂A、樹脂B1及樹脂B2,藉由進行透過共擠出此等樹脂的熔融擠出成形而可製作堆疊薄膜。藉由進行此熔融擠出成形,可有效率製造具有期望各層厚度的堆疊薄膜。並且,透過熔融擠出成形,可獲得長條狀的堆疊薄膜。In the stacked film manufacturing process, a resin A, a resin B1, and a resin B2 are prepared, respectively, and a stacked film can be manufactured by performing melt extrusion molding of these resins by co-extrusion. By performing this melt extrusion molding, a stacked film having a desired thickness of each layer can be efficiently produced. In addition, a long stack film can be obtained by melt extrusion molding.

作為共擠出法中的樹脂的擠出方法,可列舉例如:共擠出T型模法、共擠出充氣法、共擠出堆疊法等。其中,以共擠出T型模法為佳。共擠出T型模法中包括供料頭方式及分歧管模頭方式,在可減少厚度的變異的要點上,尤以分歧管模頭方式為佳。Examples of the resin extrusion method in the coextrusion method include a coextrusion T-die method, a coextrusion inflation method, and a coextrusion stack method. Among them, the co-extrusion T-die method is preferable. The co-extrusion T-die method includes the feeding head method and the branch pipe die method. In terms of reducing the thickness variation, the branch pipe die method is particularly preferred.

進行透過共擠出而熔融擠出成形時的樹脂的溫度(以下有時適當稱為「擠出溫度」。)並未特別限定,得適當設定為得使各自的樹脂熔融的溫度且適合成形的溫度。具體而言,得將形成核心層的樹脂A的熱軟化溫度及形成表層的樹脂B的熱軟化溫度之中較高的溫度(Ts[H])設定為基準。更具體而言,以(Ts[H]+70)℃以上為佳,以(Ts[H]+80)℃以上為較佳,另一方面,以(Ts[H]+180)℃以下為佳,以(Ts[H]+150)℃以下為較佳。The temperature of the resin at the time of melt-extrusion molding by coextrusion (hereinafter may be appropriately referred to as "extrusion temperature") is not particularly limited, and may be appropriately set to a temperature at which the respective resins melt and are suitable for molding temperature. Specifically, a higher temperature (Ts [H]) between the thermal softening temperature of the resin A forming the core layer and the thermal softening temperature of the resin B forming the surface layer must be set as a reference. More specifically, it is preferably (Ts [H] +70) ° C or higher, and more preferably (Ts [H] +80) ° C or higher. On the other hand, it is preferably (Ts [H] +180) ° C or lower. (Ts [H] +150) ° C or lower is preferred.

樹脂A的熱軟化溫度,以110℃以上為佳,以120℃以上為較佳,且以180℃以下為佳,以170℃以下為較佳。樹脂B的熱軟化溫度以110℃以上為佳,以120℃以上為較佳,且以180℃以下為佳,以170℃以下為較佳。The thermal softening temperature of the resin A is preferably 110 ° C or higher, more preferably 120 ° C or higher, and more preferably 180 ° C or lower, and more preferably 170 ° C or lower. The thermal softening temperature of the resin B is preferably 110 ° C or higher, more preferably 120 ° C or higher, and more preferably 180 ° C or lower, and more preferably 170 ° C or lower.

各樹脂的熱軟化溫度Ts得藉由TMA(熱機械分析)量測而量測。舉例而言,得將量測對象層切成5mm×20mm的形狀做成試料,使用TMA/SS7100(SII NANO TECHNOLOGY股份有限公司製)在對於試料的長邊方向施加50mN的張力的狀態下使溫度變化,計測線膨脹變化3%時的溫度(℃)作為軟化溫度。The thermal softening temperature Ts of each resin was measured by TMA (thermo-mechanical analysis) measurement. For example, it is necessary to cut the measurement target layer into a shape of 5mm × 20mm to make a sample, and use TMA / SS7100 (manufactured by SII NANO TECHNOLOGY Co., Ltd.) to apply a temperature of 50mN to the length of the sample to make the temperature The change is measured by measuring the temperature (° C) at which the linear expansion changes by 3% as the softening temperature.

再者,模具的模唇的算術平均粗糙度Ra以0μm~1.0μm為佳,以0μm~0.7μm為較佳,尤以0μm~0.5μm為佳。於此,算術平均粗糙度Ra得使用表面粗糙度計而根據JIS B0601:1994量測。The arithmetic mean roughness Ra of the die lip is preferably 0 μm to 1.0 μm, more preferably 0 μm to 0.7 μm, and particularly preferably 0 μm to 0.5 μm. Here, the arithmetic average roughness Ra can be measured using a surface roughness meter in accordance with JIS B0601: 1994.

在共擠出法中,通常使自模唇擠出的薄膜狀的熔融樹脂密合於冷卻輥而冷卻,使其固化。此時,作為使熔融樹脂密合於冷卻輥的方法,可列舉例如:氣動刮刀方式、真空箱方式、靜電密合方式等。In the co-extrusion method, a film-like molten resin extruded from a die lip is usually brought into close contact with a cooling roll and cooled to be solidified. In this case, examples of the method for bringing the molten resin into close contact with the cooling roll include a pneumatic blade method, a vacuum box method, and an electrostatic adhesion method.

〔1.2.1.堆疊薄膜中的各層的尺寸〕[1.2.1. Size of each layer in the stacked film]

於藉由堆疊薄膜製作工序而獲得之堆疊薄膜中,核心層的厚度以20μm以上為佳,以25μm以上為較佳,且以80μm以下為佳,以70μm以下為較佳。2個表層的厚度分別以5μm以上為佳,以10μm以上為較佳,且以30μm以下為佳,以25μm以下為較佳。In the stacked film obtained through the stacked film manufacturing process, the thickness of the core layer is preferably 20 μm or more, more preferably 25 μm or more, and preferably 80 μm or less, and more preferably 70 μm or less. The thickness of the two surface layers is preferably 5 μm or more, more preferably 10 μm or more, and more preferably 30 μm or less, and more preferably 25 μm or less.

各層的厚度得藉由顯微鏡觀察而量測。具體而言,得藉由使用切片機切片堆疊薄膜並觀察截面而量測各層的厚度。截面的觀察得藉由例如偏光顯微鏡(例如奧林巴斯公司製之「BX51」)而進行。The thickness of each layer must be measured by microscope observation. Specifically, it is necessary to measure the thickness of each layer by slicing a stacked film using a microtome and observing a cross section. Observation of the cross section is performed by, for example, a polarizing microscope (for example, "BX51" manufactured by Olympus Corporation).

〔1.3.剝離工序〕[1.3. Stripping process]

本發明的光學薄膜的製造方法中的剝離工序,係自堆疊薄膜剝離表層的工序。透過經此種剝離工序,可獲得光學薄膜。2個表層在以下所說明的實施型態中係同時剝離,但亦可單層逐一剝離。The peeling process in the manufacturing method of the optical film of this invention is a process of peeling a surface layer from a stacked film. Through such a peeling process, an optical film can be obtained. In the embodiment described below, the two surface layers are peeled simultaneously, but a single layer may be peeled one by one.

圖2係概略繪示本發明的光學薄膜的製造方法中的剝離工序的一例的剖面圖。自擠製成形機M運送的堆疊薄膜(圖1中所說明之堆疊薄膜20)運送至圖示下方,之後供給至剝離工序。FIG. 2 is a cross-sectional view schematically showing an example of a peeling step in the method for producing an optical film of the present invention. The stacked film (stacked film 20 illustrated in FIG. 1) transported by the self-extrusion molding machine M is transported to the lower part of the figure, and then supplied to the peeling process.

剝離工序中的剝離的處理得藉由將表層11、12沿與被運送的堆疊薄膜20的面內方向相異的方向牽引而進行。在圖2之例中,藉由將2個表層11、12分別沿相對於光學薄膜100之2個面100A、100B的角度夾成為θ1、θ2的方向(箭頭Y及箭頭Z所示的方向)牽引,自堆疊薄膜20剝離表層11、12。θ1及θ2可為相同,亦可為相異。前述θ1及θ2的範圍以45°以上為佳,以55°以上為較佳,另一方面以135°以下為佳,以125°以下為較佳。The peeling process in the peeling process is performed by pulling the surface layers 11 and 12 in a direction different from the in-plane direction of the stacked film 20 being conveyed. In the example of FIG. 2, the two surface layers 11 and 12 are clamped in directions θ1 and θ2 along the angles with respect to the two surfaces 100A and 100B of the optical film 100 (directions indicated by arrows Y and Z) The surface layers 11 and 12 are peeled from the stacked film 20 by pulling. θ1 and θ2 may be the same or different. The range of θ1 and θ2 is preferably 45 ° or more, more preferably 55 ° or more, and more preferably 135 ° or less, and more preferably 125 ° or less.

剝離工序的溫度並未特別限定,但就運送性的觀點而言,以5℃以上為佳,以15℃以上為較佳,就剝離性的觀點而言,以60℃以下為佳,以50℃以下為較佳。剝離溫度得藉由透過適當的加熱裝置加熱堆疊薄膜的剝離區域P等而調整。The temperature of the peeling step is not particularly limited, but from the viewpoint of transportability, it is preferably 5 ° C or higher, more preferably 15 ° C or higher, and from the viewpoint of peelability, 60 ° C or lower is preferred, and 50 ° C is preferred. Below ℃ is preferred. The peeling temperature is adjusted by heating a peeling region P or the like of the stacked film by an appropriate heating device.

〔1.4.其他工序(延伸處理工序)〕[1.4. Other processes (extension treatment process)]

本發明的光學薄膜的製造方法亦可包含延伸處理工序。延伸處理工序可在堆疊薄膜製作工序中進行,可在經堆疊薄膜製作工序後且在剝離工序前進行,可在剝離工序中進行,亦可在剝離工序後進行。The method for producing an optical film of the present invention may include a stretching treatment step. The stretching treatment step may be performed in the stacked film production step, may be performed after the stacked film production step and before the peeling step, may be performed in the peeling step, or may be performed after the peeling step.

在進行延伸處理工序時,可進行厚度方向的延伸,可進行面內方向的延伸,亦可進行除了厚度方向的延伸再加上面內方向的延伸。於本發明的光學薄膜的製造方法中,進行除了厚度方向延伸再加上面內方向的延伸時的延伸倍率,得配合要求賦予光學薄膜的期望光學性能而適當調整。具體的延伸倍率係以1.0倍以上為佳,以1.05倍以上為較佳,且另一方面以1.5倍以下為佳,以1.4倍以下為較佳。面內方向的延伸倍率在此範圍的情況下,可輕易獲得期望的光學性能。When performing the stretching treatment step, stretching in the thickness direction, stretching in the in-plane direction, or stretching in the upper inward direction in addition to the thickness direction may be performed. In the manufacturing method of the optical film of the present invention, the stretching ratio when extending in addition to the thickness direction and the upper and inner directions is performed, and it is necessary to appropriately adjust according to the desired optical performance required to give the optical film. The specific stretching ratio is preferably 1.0 times or more, more preferably 1.05 times or more, and on the other hand, 1.5 times or less is preferable, and 1.4 times or less is more preferable. When the extension magnification in the in-plane direction is within this range, desired optical performance can be easily obtained.

在延伸處理工序中進行的延伸,得設為單軸延伸、雙軸延伸或其他的延伸。延伸方向得設定為任意方向。舉例而言,在延伸前薄膜為長條狀的薄膜的情況下,延伸方向可為薄膜的長邊方向、幅寬方向,以及此外的傾斜方向之任一者。在進行雙軸延伸時的2個延伸方向所成之角度通常得定為互相正交的角度,但不受限於此而得定為任意角度。雙軸延伸可為逐次雙軸延伸,亦可為同時雙軸延伸。The stretching performed in the stretching processing step may be uniaxial stretching, biaxial stretching, or other stretching. The extension direction must be set to any direction. For example, in the case where the film before stretching is an elongated film, the stretching direction may be any of the long side direction, the width direction, and other oblique directions of the film. When biaxial stretching is performed, the angle formed by the two extending directions is usually determined as an angle orthogonal to each other, but it is not limited to this and may be set to an arbitrary angle. The biaxial extension may be a sequential biaxial extension or a simultaneous biaxial extension.

〔1.5.藉由本發明的製造方法而獲得的光學薄膜的尺寸及特性〕[1.5. Dimensions and characteristics of the optical film obtained by the production method of the present invention]

藉由本發明的光學薄膜的製造方法而獲得的光學薄膜,其面內方向的延遲Re的絕對值係5nm以下,其厚度方向的延遲Rth的絕對值係10nm以下,且其水蒸氣穿透率為20g/(m2 .日)以下。The optical film obtained by the method for producing an optical film of the present invention has an absolute value of retardation Re in the in-plane direction of 5 nm or less, an absolute value of retardation Rth in the thickness direction of 10 nm or less, and a water vapor transmission rate 20g / (m 2 · day) or less.

藉由本發明的製造方法而獲得之光學薄膜的面內方向的延遲Re的絕對值,以3nm以下為佳,以2nm以下為較佳,理想上為0nm。The absolute value of retardation Re in the in-plane direction of the optical film obtained by the manufacturing method of the present invention is preferably 3 nm or less, more preferably 2 nm or less, and ideally 0 nm.

藉由本發明的製造方法而獲得之光學薄膜的厚度方向的延遲Rth的絕對值,以3nm以下為佳,以2nm以下為較佳,理想上為0nm。The absolute value of the retardation Rth in the thickness direction of the optical film obtained by the manufacturing method of the present invention is preferably 3 nm or less, more preferably 2 nm or less, and ideally 0 nm.

藉由本發明的製造方法而獲得之光學薄膜的水蒸氣穿透率,以18g/(m2 .日)以下為佳,以15g/(m2 .日)以下為較佳。另一方面下限在理想上為0g/(m2 .日),但得設為例如1g/(m2 .日)以上。The water vapor transmission rate of the optical film obtained by the manufacturing method of the present invention is preferably 18 g / (m 2 .day) or less, and more preferably 15 g / (m 2 .day) or less. On the other hand, the lower limit is ideally 0 g / (m 2 .day), but may be set to, for example, 1 g / (m 2 .day) or more.

藉由本發明的製造方法而獲得之光學薄膜的厚度,以20μm以上為佳,以25μm以上為較佳,且以70μm以下為佳,以80μm以下為較佳。The thickness of the optical film obtained by the manufacturing method of the present invention is preferably at least 20 μm, more preferably at least 25 μm, more preferably at most 70 μm, and most preferably at most 80 μm.

藉由本發明的製造方法而獲得之光學薄膜的面內方向的延遲及厚度方向的延遲,得使用AXOMETRICS公司製之「AxoScan」作為量測裝置以量測波長590nm量測。在使用前述量測裝置的情況下,光學薄膜的面內方向及厚度方向的延遲使用該光學薄膜的平均折射率算出。於此,所謂平均折射率,意指為光學薄膜的面內方向且互相垂直的2方向的折射率以及該光學薄膜的厚度方向的折射率的平均值。The retardation in the in-plane direction and the retardation in the thickness direction of the optical film obtained by the manufacturing method of the present invention can be measured at a measurement wavelength of 590 nm using "AxoScan" manufactured by AXOMETRICS Corporation as a measuring device. When the measurement device is used, the retardation in the in-plane direction and the thickness direction of the optical film is calculated using the average refractive index of the optical film. Here, the average refractive index means an average value of the refractive index in the in-plane direction of the optical film and two directions perpendicular to each other and the refractive index in the thickness direction of the optical film.

藉由本發明的製造方法而獲得之光學薄膜的水蒸氣穿透率,得使用水蒸氣穿透度量測裝置(MOCON公司製之「PERMATRAN-W」)遵循JIS K 7129 B法,以例如溫度40℃、濕度90%RH的條件量測。The water vapor transmission rate of the optical film obtained by the manufacturing method of the present invention can be determined by using a water vapor transmission measuring device ("PERMATRAN-W" manufactured by MOCON Corporation) in accordance with the JIS K 7129 B method at a temperature of 40, for example. Measured at ℃ and 90% RH.

藉由本發明的製造方法而獲得之光學薄膜的厚度,得與各層的厚度同樣透過顯微鏡觀察而量測。具體而言,得藉由使用切片機切片光學薄膜,且以例如偏光顯微鏡(例如奧林巴斯公司製之「BX51」)觀察截面而進行。The thickness of the optical film obtained by the manufacturing method of the present invention can be measured through a microscope observation as well as the thickness of each layer. Specifically, it can be performed by slicing an optical film using a microtome and observing a cross section with, for example, a polarizing microscope (for example, "BX51" manufactured by Olympus Corporation).

藉由本發明的光學薄膜的製造方法而獲得之光學薄膜,在藉由自具備由樹脂A而成之核心層及由樹脂B而成之表層的堆疊薄膜剝離表層而獲得之光學薄膜中,藉由將面內方向的延遲Re的絕對值及厚度方向的延遲Rth的絕對值分別設為2nm以下,且將水蒸氣穿透率設為20g/(m2 .日)以下,可獲得與對象物的密合性高、延遲小且水蒸氣穿透率低的光學薄膜。其結果,根據本發明可得到得有利於使用作為偏光件保護膜的光學薄膜。In the optical film obtained by the method for producing an optical film of the present invention, in an optical film obtained by peeling a surface layer from a stacked film having a core layer made of resin A and a surface layer made of resin B, the optical film is obtained by The absolute value of the retardation Re in the in-plane direction and the absolute value of the retardation Rth in the thickness direction are set to 2 nm or less, and the water vapor transmission rate is set to 20 g / (m 2 .day) or less. Optical film with high adhesion, small retardation, and low water vapor transmission rate. As a result, according to the present invention, it is possible to obtain an optical film that is advantageous for use as a protective film for a polarizer.

藉由本發明的光學薄膜的製造方法而獲得之光學薄膜,通常為透明層且使可見光穿透。具體的光線穿透率得依光學薄膜的用途適當選擇。舉例而言,在波長420nm~780nm的光線穿透率以85%以上為佳,以88%以上為較佳。藉由做成具有如此高光線穿透率的結構,在將光學薄膜裝設至液晶顯示裝置等顯示裝置的情況下,尤可抑制長期使用時的輝度下降。The optical film obtained by the method for producing an optical film of the present invention is usually a transparent layer and transmits visible light. The specific light transmittance is appropriately selected according to the application of the optical film. For example, the light transmittance at a wavelength of 420nm to 780nm is preferably 85% or more, and more preferably 88% or more. With such a structure having such a high light transmittance, when the optical film is mounted on a display device such as a liquid crystal display device, it is possible to suppress a drop in luminance during long-term use in particular.

〔2.本發明的光學薄膜〕[2. Optical film of the present invention]

於本發明之另外的某態樣中,光學薄膜包含嵌段共聚物,所述嵌段共聚物含有:具有含環烴基化合物單元的嵌段[Da]與具有鏈烴化合物單元或具有鏈烴化合物單元及含環烴基化合物單元的嵌段[Ea]。含環烴基化合物單元及鏈烴化合物單元可具有不飽和鍵,亦可不具有不飽和鍵,更不受其製造方法所限定。因此,舉例而言,可為氫化具有不飽和鍵的單元而成之單元,亦可為具有不被氫化之不飽和鍵的單元。藉由光學薄膜為包含此嵌段共聚物者,可獲得相位差低的光學薄膜,因此,可將本發明的光學薄膜作為要求低相位差的部件使用。此外,還可獲得耐光性高且不易黃變的光學薄膜。In another aspect of the present invention, the optical film includes a block copolymer including: a block [Da] having a cyclic hydrocarbon group-containing compound unit and a chain hydrocarbon compound unit or a chain hydrocarbon compound Block [Ea] of the unit and the cyclic hydrocarbon-containing compound unit. The cyclic hydrocarbon group-containing compound unit and the chain hydrocarbon compound unit may or may not have an unsaturated bond, and they are not limited by the manufacturing method thereof. Therefore, for example, it may be a unit obtained by hydrogenating a unit having an unsaturated bond, or it may be a unit having an unsaturated bond that is not hydrogenated. When the optical film contains such a block copolymer, an optical film having a low retardation can be obtained. Therefore, the optical film of the present invention can be used as a component requiring a low retardation. In addition, an optical film having high light resistance and less yellowing can be obtained.

作為該嵌段共聚物的較佳例,可列舉:「每1分子包含2個以上的具有含環烴基化合物氫化物單元的聚合物嵌段[Db]作為嵌段[Da],且每1分子包含1個以上的『具有鏈烴化合物氫化物單元,或具有鏈烴化合物或其氫化物單元及含環烴化合物或具有其氫化物單元』的聚合物嵌段[Eb]作為嵌段[Ea]」的共聚物。As a preferable example of the block copolymer, "a polymer block [Db] containing two or more cyclic hydrocarbon group-containing compound hydride units per molecule is used as the block [Da], and A polymer block [Eb] containing at least one "having a alkane compound hydride unit, or having a alkane compound or its hydride unit, and a cyclic hydrocarbon compound or having its hydride unit" as a block [Ea] ”Copolymer.

作為構成本發明的光學薄膜的材料的具體例,可列舉:上述的樹脂A。並且,作為其所包含之嵌段共聚物之例,可列舉與上述的氫化嵌段共聚物[G]之例相同之例。再者,作為構成嵌段共聚物的嵌段[Da]及[Ea]之例以及作為其具體例的嵌段[Db]及[Eb]之例,可列舉與上述的嵌段[D]及[E]之例相同之例。作為構成嵌段[Da]及嵌段[Ea]的單元之例,可列舉:與構成嵌段[D]及[E]的單元之例相同之例;以及芳香族乙烯基化合物單元及鏈狀共軛二烯化合物單元。芳香族乙烯基化合物單元係具有聚合芳香族乙烯基化合物而獲得之結構的結構單元,且鏈狀共軛二烯化合物單元係具有聚合鏈狀共軛二烯化合物而獲得之結構的結構單元。惟此等不受其製造方法所限定。作為此處所謂芳香族乙烯基化合物之例及鏈狀共軛二烯化合物之例,可列舉:與以上所舉出者相同者。Specific examples of the material constituting the optical film of the present invention include the resin A described above. In addition, as examples of the block copolymer included therein, the same examples as those of the above-mentioned hydrogenated block copolymer [G] can be cited. In addition, as examples of the blocks [Da] and [Ea] constituting the block copolymer and examples of the blocks [Db] and [Eb] as specific examples thereof, the above-mentioned blocks [D] and The example of [E] is the same. Examples of the unit constituting the block [Da] and the block [Ea] include the same examples as those of the unit constituting the blocks [D] and [E]; and an aromatic vinyl compound unit and a chain shape. Conjugated diene compound unit. The aromatic vinyl compound unit is a structural unit having a structure obtained by polymerizing an aromatic vinyl compound, and the chain conjugated diene compound unit is a structural unit having a structure obtained by polymerizing a chain conjugated diene compound. However, these are not limited by the manufacturing method. Examples of the so-called aromatic vinyl compound and examples of the chain-shaped conjugated diene compound include the same as those exemplified above.

作為係嵌段共聚物之例且氫化嵌段共聚物[G]以外者之例,可列舉:WO2016/152871所記載之作為氫化物的前驅物的芳香族乙烯基化合物/共軛二烯化合物嵌段共聚物。Examples of the block copolymer and examples other than the hydrogenated block copolymer [G] include an aromatic vinyl compound / conjugated diene compound as a precursor of a hydride described in WO2016 / 152871. Paragraph copolymer.

於構成本發明的光學薄膜的嵌段共聚物中,在表面與中央部的嵌段[Da]的體積與嵌段[Ea]的體積的組成比率之差為0~10%。組成比率之差以8%以下為佳,以5%以下為較佳。In the block copolymer constituting the optical film of the present invention, the difference in the composition ratio between the volume of the block [Da] and the volume of the block [Ea] on the surface and the center is 0 to 10%. The difference in the composition ratio is preferably 8% or less, and more preferably 5% or less.

此處所謂「中央部」係薄膜的厚度方向的中央部。惟在藉由以上所說明之本發明的光學薄膜的製造方法製造薄膜的情況下,沿厚度方向5μm左右的深度的位置,通常具有與厚度方向的中央部同等的組成比率。因此,在光學薄膜的厚度超過10μm的情況下,得將觀察沿厚度方向5μm左右的深度的組成而獲得的值代換為在中央部的組成比率的值。Here, the "central portion" refers to the central portion in the thickness direction of the film. However, when a film is manufactured by the method for manufacturing an optical film of the present invention described above, a position at a depth of about 5 μm in the thickness direction generally has a composition ratio equivalent to that of the central portion in the thickness direction. Therefore, when the thickness of the optical film exceeds 10 μm, the value obtained by observing the composition at a depth of about 5 μm in the thickness direction may be substituted by the value of the composition ratio at the center.

嵌段[Da]的體積與嵌段[Ea]的體積的組成比率得藉由觀察光學薄膜的剖面而求取。亦即,由於通常剖面的面積比正比於體積比,故藉由量測表面及剖面的面積比,得求取體積比。具體而言,於光學薄膜的表面及剖面中,得藉由求取源自各嵌段的相的面積且求取此面積的比,求取嵌段[Da]與嵌段[Ea]的組成比率。The composition ratio of the volume of the block [Da] to the volume of the block [Ea] can be determined by observing the cross section of the optical film. That is, since the area ratio of the cross section is generally proportional to the volume ratio, the volume ratio can be obtained by measuring the area ratio of the surface and the cross section. Specifically, on the surface and cross section of the optical film, the composition of the block [Da] and the block [Ea] can be obtained by determining the area of the phase derived from each block and the ratio of this area. ratio.

各相的面積的量測得透過原子間力顯微鏡(例如Bruker公司製的原子間力顯微鏡Dimension Fast Scan Icon)進行。得透過原子間力顯微鏡獲得光學薄膜的凝集力像,而量測該像中的源自各嵌段的相的面積比。並且,得根據關於所觀察之相的凝集力的資訊,使所觀察之相分配至嵌段[Da]的相及嵌段[Ea]的相。The measurement of the area of each phase is performed by an interatomic force microscope (for example, the Dimension Fast Scan Icon made by Bruker). A cohesive force image of the optical film was obtained through an atomic force microscope, and the area ratio of the phases derived from each block in the image was measured. Then, based on the information about the cohesion of the observed phase, the observed phase can be assigned to the phase of the block [Da] and the phase of the block [Ea].

將2種的相的面積的合計設為100%,藉由求取其中的分配至嵌段[Da]的相的面積的百分率,得計算表面及中央物之各自的嵌段[Da]比率。在表面與中央部的嵌段[D]的體積與嵌段[E]的體積的組成比率的差,得藉由下述式算出。 組成比率的差=|(中央部的嵌段[D]比率)-(表面的嵌段[D]比率)|The total area of the two types of phases was set to 100%, and the percentage of the area of the phase allocated to the block [Da] was calculated to calculate the respective block [Da] ratios of the surface and the center. The difference in the composition ratio between the volume of the block [D] and the volume of the block [E] on the surface and the center can be calculated by the following formula. Difference in composition ratio = | (block [D] ratio in the center)-(block [D] ratio on the surface) |

(中央部的嵌段[D]比率)-(表面的嵌段[D]比率)的值,可為正亦可為負。The value of (block [D] ratio in the center)-(block [D] ratio on the surface) may be positive or negative.

本發明的光學薄膜得藉由包含嵌段共聚物的樹脂的擠出製膜而製造。藉由進行擠出製膜,能夠有效率的製造。惟若透過本發明人所發現的內容,在進行擠出製膜的情況下,在表面與中央部的嵌段[D]的體積與嵌段[E]的體積的組成比率的差會變大。於此,藉由採用在上述〔1.本發明的光學薄膜的製造方法〕中所說明的製造方法,可輕易獲得此組成比率的差為小的薄膜。The optical film of the present invention can be produced by extrusion film-forming of a resin containing a block copolymer. By performing extrusion film formation, efficient production can be achieved. However, according to the findings of the present inventors, when extrusion filming is performed, the difference in the composition ratio between the volume of the block [D] and the volume of the block [E] on the surface and the central portion becomes large. . Here, by using the production method described in the above [1. Production method of an optical film of the present invention], a film having a small difference in composition ratio can be easily obtained.

本發明的光學薄膜的尺寸及特性係與在〔1.5.藉由本發明的製造方法而獲得之光學薄膜的尺寸及特性〕中所說明者相同。The size and characteristics of the optical film of the present invention are the same as those described in [1.5. Size and characteristics of the optical film obtained by the manufacturing method of the present invention].

〔3.偏光板及其製造方法〕[3. Polarizing plate and manufacturing method thereof]

藉由在上述〔1.本發明的光學薄膜的製造方法〕所說明的製造方法而獲得之光學薄膜及在上述〔2.本發明的光學薄膜〕所說明之本發明的光學薄膜(於以下將此等簡稱為「本發明的光學薄膜」),於液晶顯示裝置等顯示裝置中得適合使用作為保護其他層的保護膜。其中,本發明的光學薄膜係適合作為偏光件保護膜,且尤其合適使用作為顯示裝置的內側偏光件保護膜。The optical film obtained by the production method described in the above [1. Production method of an optical film of the present invention] and the optical film of the present invention described in the above [2. Optical film of the present invention] These are simply referred to as "the optical film of the present invention"), and can be suitably used as a protective film for protecting other layers in a display device such as a liquid crystal display device. Among them, the optical film of the present invention is suitable as a polarizer protective film, and is particularly suitable for use as an inner polarizer protective film of a display device.

本發明的偏光板具備:上述本發明的光學薄膜與偏光件。於本發明中,光學薄膜得發揮作為偏光件保護膜的功能。本發明的偏光板亦可於光學薄膜與偏光件之間更具備用以接合此等的接合劑層。A polarizing plate of the present invention includes the optical film and a polarizer of the present invention. In the present invention, the optical film has a function as a protective film for a polarizer. The polarizing plate of the present invention may further include a bonding agent layer for bonding these between the optical film and the polarizer.

本發明的偏光板除了光學薄膜及偏光件以外,還得具備任意層。作為任意層,可列舉:提高表面硬度的硬塗層、優化薄膜光滑性的墊層、抗反射層等。The polarizing plate of the present invention may include any layer in addition to the optical film and the polarizer. Examples of the arbitrary layer include a hard coat layer for improving surface hardness, a cushion layer for optimizing film smoothness, and an anti-reflection layer.

偏光件並未特別限定,得使用任意偏光件。作為偏光件之例,可列舉:使碘、二色性染料等材料吸附於聚乙烯醇薄膜後再進行延伸加工者。作為構成接合劑層的接合劑,可列舉:將各種聚合物做成基礎聚合物者。作為此種基礎聚合物之例,可列舉例如:丙烯酸聚合物、矽氧聚合物、聚酯、聚胺甲酸酯、聚醚及合成橡膠。The polarizer is not particularly limited, and any polarizer may be used. As an example of a polarizer, the thing which carried out the extending | stretching process after adsorbing materials, such as an iodine and a dichroic dye, to a polyvinyl alcohol film is mentioned. Examples of the adhesive constituting the adhesive layer include those in which various polymers are used as a base polymer. Examples of such a base polymer include acrylic polymers, silicone polymers, polyesters, polyurethanes, polyethers, and synthetic rubbers.

偏光板所具備之偏光件與保護膜的數量係任意的,但於本發明中,通常得具備1層的偏光件與設置於其兩面的2層的保護膜。此種2層的保護膜之中,可兩者皆為本發明的光學薄膜,亦可僅其中任一者為本發明的光學薄膜。尤其於具備光源及液晶晶胞,且在此液晶晶胞的光源側及顯示面側的兩者皆具有偏光板的液晶顯示裝置中,尤以「具備本發明的光學薄膜作為相較於顯示面側的偏光件更靠近光源側的位置中所使用的保護膜」為佳。藉由具有此結構,可輕易構成耐久性優異、顏色不均小且具有良好顯示品質的液晶顯示裝置。The number of polarizers and protective films included in a polarizing plate is arbitrary, but in the present invention, a polarizer having one layer and a two-layer protective film provided on both sides thereof are usually obtained. Among such two-layer protective films, both of them may be the optical film of the present invention, or only one of them may be the optical film of the present invention. Especially in a liquid crystal display device having a light source and a liquid crystal cell, and both the light source side and the display surface side of the liquid crystal cell have a polarizing plate, it is particularly "equipped with the optical film of the present invention as compared with the display surface. The protective film used in the position where the polarizer on the side is closer to the light source side is preferable. With this structure, a liquid crystal display device having excellent durability, small color unevenness, and good display quality can be easily constructed.

本發明的偏光板得藉由任意製造方法製造。舉例而言,透過貼合藉由上述製造方法而獲得之光學薄膜與偏光件,得製造本發明的偏光板。此貼合得做成使此等層直接接觸的貼合、或中介接合劑層的貼合。The polarizing plate of the present invention must be manufactured by any manufacturing method. For example, the polarizing plate of the present invention can be manufactured by bonding the optical film and the polarizer obtained by the above-mentioned manufacturing method. This bonding can be a bonding in which these layers are in direct contact, or a bonding in an intervening adhesive layer.

〔4.液晶顯示裝置及其製造方法〕[4. Liquid crystal display device and manufacturing method thereof]

本發明的液晶顯示裝置具備上述本發明的偏光板。A liquid crystal display device of the present invention includes the polarizing plate of the present invention.

作為適合設置本發明的偏光板的液晶顯示裝置,可列舉具備例如:平面切換模式(IPS)、垂直配向模式(VA)、多區域垂直配向模式(MVA)、連續焰火狀配向模式(CPA)、混合配向向列模式(HAN)、扭轉向列模式(TN)、超扭轉向列模式(STN)、光學補償彎曲模式(OCB)等驅動方式的液晶晶胞的液晶顯示裝置。此等之中,由於透過本發明的光學薄膜所致耐久性優異且顏色不均抑制的效果明顯,故尤以具備IPS模式的液晶晶胞的液晶顯示裝置為佳。Examples of the liquid crystal display device suitable for installing the polarizing plate of the present invention include a plane switching mode (IPS), a vertical alignment mode (VA), a multi-region vertical alignment mode (MVA), a continuous firework-like alignment mode (CPA), A liquid crystal display device that mixes liquid crystal cells such as alignment nematic mode (HAN), twisted nematic mode (TN), super twisted nematic mode (STN), and optically compensated bending mode (OCB). Among these, since the optical film of the present invention has excellent durability and the effect of suppressing color unevenness, the liquid crystal display device having a liquid crystal cell having an IPS mode is particularly preferable.

本發明的液晶顯示裝置得藉由任意製造方法製造。舉例而言,藉由將透過上述製造方法而獲得之偏光板與液晶晶胞等構成液晶顯示裝置的其他部件組合,得製造本發明的液晶顯示裝置。舉例而言,得藉由將液晶晶胞與偏光板直接貼合或者中介接合劑層貼合且將此設置於顯示裝置內,製造液晶顯示裝置。並且,得藉由簡單重疊液晶晶胞與偏光板且設置於顯示裝置內,製造液晶顯示裝置。The liquid crystal display device of the present invention must be manufactured by any manufacturing method. For example, a liquid crystal display device of the present invention can be manufactured by combining a polarizing plate obtained through the above-mentioned manufacturing method and other components constituting a liquid crystal display device such as a liquid crystal cell. For example, a liquid crystal display device can be manufactured by directly bonding a liquid crystal cell and a polarizing plate or bonding an intermediary adhesive layer and setting this in a display device. In addition, a liquid crystal display device must be manufactured by simply superposing a liquid crystal cell and a polarizing plate and placing the liquid crystal cell in a display device.

『實施例』『Examples』

以下揭示實施例以具體說明本發明。惟本發明並非為限定於以下所揭示之實施例者,在不脫離本發明之申請專利範圍及其均等範圍之範圍中,得任意變更而實施。The following examples are disclosed to illustrate the present invention in detail. However, the present invention is not limited to the embodiments disclosed below, and can be implemented with arbitrary changes without departing from the scope of the patent application of the present invention and its equivalent scope.

於以下之說明中,除非另有註明,否則表示量的「%」及「份」係重量基準。並且,以下所說明的操作,除非另有註明,否則於常溫及常壓的條件下進行。In the following description, unless otherwise noted, the "%" and "parts" indicating amounts are based on weight. In addition, the operations described below are performed under normal temperature and pressure conditions unless otherwise noted.

既得做成以上說明中的嵌段[D]的具體例亦得做成以上說明中的嵌段[Da]的具體例之具體例,於以下的說明中簡稱為「嵌段[D]」。並且,既得做成以上說明中的嵌段[E]的具體例亦得做成以上說明中的嵌段[Ea]的具體例之具體例,於以下的說明中簡稱為「嵌段[E]」。Specific examples of the block [D] in the above description and specific examples of the block [Da] in the above description may be made, and are simply referred to as "block [D]" in the following description. In addition, both the specific example of the block [E] in the above description and the specific example of the block [Ea] in the above description may be made, and it is simply referred to as "block [E]" in the following description. ".

〔評價方法〕[Evaluation method]

〔重量平均分子量及數量平均分子量的量測方法〕[Measurement method of weight average molecular weight and number average molecular weight]

聚合物的重量平均分子量及數量平均分子量,使用凝膠滲透層析法(GPC)系統(東曹公司製之「HLC-8320」)作為聚苯乙烯換算值而量測。量測時,使用H型管柱(東曹公司製)作為管柱,且使用環己烷作為溶劑。並且,量測時的溫度為40℃。The weight average molecular weight and number average molecular weight of the polymer were measured using a gel permeation chromatography (GPC) system ("HLC-8320" manufactured by Tosoh Corporation) as a polystyrene conversion value. For measurement, an H-shaped column (manufactured by Tosoh Corporation) was used as the column, and cyclohexane was used as the solvent. The temperature during measurement was 40 ° C.

〔氫化嵌段共聚物[G]的氫化率的量測方法〕[Measurement method of hydrogenation rate of hydrogenated block copolymer [G]]

聚合物的氫化率,以鄰二氯苯-d4 作為溶劑、以145℃透過1 H-NMR量測而算出。The hydrogenation rate of the polymer was calculated by 1 H-NMR measurement at 145 ° C using o-dichlorobenzene-d 4 as a solvent.

〔樹脂A的玻璃轉移溫度〕[Glass Transition Temperature of Resin A]

沖壓成形樹脂A(包含氫化嵌段共聚物的樹脂[G1]等),製作長度50mm、寬度10mm、厚度1mm的試驗片。使用此試驗片,根據JIS-K7244-4法並使用黏彈性量測裝置(製品名「ARES」,TA Instruments Japan公司製),以-100℃~+150℃的範圍且以昇溫速度5℃/分鐘量測動態黏彈性特性。藉由損耗正切tanδ的峰頂溫度(觀測到多個峰值時為高溫側的峰值溫度),算出玻璃轉移溫度Tg2Resin A (resin [G1] containing a hydrogenated block copolymer, etc.) was press-molded to produce a test piece having a length of 50 mm, a width of 10 mm, and a thickness of 1 mm. Using this test piece, a viscoelasticity measuring device (product name "ARES", manufactured by TA Instruments Japan) was used in accordance with JIS-K7244-4 method at a temperature range of -100 ° C to + 150 ° C and a temperature increase rate of 5 ° C / min. Measure dynamic viscoelastic properties. The glass transition temperature Tg 2 was calculated from the peak top temperature of the loss tangent tanδ (the peak temperature on the high temperature side when multiple peaks were observed).

〔樹脂B的熱軟化溫度〕[Heat softening temperature of resin B]

根據JIS K 7121,使用示差掃描熱量分析計(Nanotechnology公司製、製品名「DSC6220S11」),將樹脂B加熱至較玻璃轉移溫度高30℃以上的溫度後,以冷卻速度-10℃/分鐘冷卻至室溫,之後以昇溫速度10℃/分鐘升溫,藉此量測熱軟化溫度。According to JIS K 7121, using a differential scanning calorimeter (manufactured by Nanotechnology, product name "DSC6220S11"), resin B is heated to a temperature higher than 30 ° C above the glass transition temperature, and then cooled to -10 ° C / min to At room temperature, the temperature was then increased at a rate of 10 ° C / minute, and the thermal softening temperature was measured.

〔各層厚度及光學薄膜的厚度的量測方法〕[Measurement method of thickness of each layer and thickness of optical film]

各層的厚度及光學薄膜的厚度由以下方式進行量測。The thickness of each layer and the thickness of the optical film were measured in the following manner.

使用切片機(大和光機公司製之「RV-240」)將量測對象的薄膜切片。以偏光顯微鏡(奧林巴斯公司製之「BX51」)觀察切片後的薄膜的截面,量測其厚度。The film to be measured was sliced using a microtome ("RV-240" manufactured by Yamato Koki Co., Ltd.). The cross section of the sliced film was observed with a polarizing microscope ("BX51" manufactured by Olympus), and the thickness was measured.

〔熱軟化溫度Ts的量測方法〕[Measurement method of thermal softening temperature Ts]

將量測對象的薄膜切成5mm×20mm的形狀做成試料。使用TMA/SS7100(SII NANO TECHNOLOGY股份有限公司製)作為量測裝置。於TMA(熱機械分析)量測中,在對於試料的長邊方向施加50mN的張力的狀態下使溫度變化。將線膨脹變化3%時的溫度(℃)設為軟化溫度。The film to be measured was cut into a shape of 5 mm × 20 mm to prepare a sample. As the measuring device, TMA / SS7100 (SII NANO TECHNOLOGY Co., Ltd.) was used. In TMA (thermo-mechanical analysis) measurement, the temperature was changed while a tension of 50 mN was applied to the longitudinal direction of the sample. The temperature (° C) at which the linear expansion changed by 3% was set as the softening temperature.

〔面內方向的延遲及厚度方向的延遲的量測方法〕[Measurement method of retardation in the plane direction and retardation in the thickness direction]

藉由使用相位差量測裝置(Axometric公司製,製品名「Axoscan」)以波長590nm量測各例(實施例及比較例)的薄膜,求取各例的薄膜的面內方向的延遲Re的絕對值及厚度方向的延遲Rth的絕對值。The retardation measurement device (manufactured by Axometric Corporation, product name "Axoscan") was used to measure the films of each example (Example and Comparative Example) at a wavelength of 590 nm, and the retardation Re Absolute value and absolute value of retardation Rth in thickness direction.

〔剝離強度的量測方法〕[Measurement Method of Peel Strength]

準備由包含降烯系聚合物的樹脂而成之試驗用薄膜(玻璃轉移溫度160℃,厚度100μm,日本瑞翁公司製,未實施延伸處理者)作為代替偏光板的薄膜。對於在各例所獲得之薄膜及前述試驗用薄膜的單面實施電暈處理。使接合劑附著於各例薄膜之經實施電暈處理之面及試驗用薄膜之經電暈處理之面,而使附著有接合劑的面彼此貼合。此時,使用UV接合劑(CRB系列(TOYOCHEM公司製)作為接合劑。藉此獲得具備各例的薄膜100及試驗用薄膜60的樣品薄膜S(參照圖3)。A thin film for testing (a glass transition temperature of 160 ° C., a thickness of 100 μm, manufactured by Japan's Ruiwon Co., Ltd. without extension treatment) was prepared as a film instead of a polarizing plate, and was made of a resin containing a norbornene-based polymer. Corona treatment was performed on one side of the film obtained in each example and the aforementioned test film. The adhesive was adhered to the corona-treated surface of each film and the corona-treated surface of the test film, and the surfaces to which the adhesive was adhered were adhered to each other. At this time, a UV adhesive (CRB series (manufactured by TOYOCHEM)) was used as the adhesive. Thereby, a sample film S including a film 100 of each example and a test film 60 (see FIG. 3) was obtained.

之後,如圖3所示,將前述樣品薄膜S剪裁成15mm的寬度,使各例的薄膜100側以黏合劑70貼合於載玻片80的表面,而獲得評價樣品。此時,使用雙面黏合膠帶(日東電工公司製,商品編號「CS9621」)作為黏合劑70。圖3中50為接合劑。Thereafter, as shown in FIG. 3, the sample film S was cut to a width of 15 mm, and the film 100 side of each example was adhered to the surface of the slide glass 80 with an adhesive 70 to obtain an evaluation sample. At this time, a double-sided adhesive tape (manufactured by Nitto Denko Corporation, product number "CS9621") was used as the adhesive 70. In FIG. 3, 50 is a bonding agent.

將試驗用薄膜60夾於測力計的前端,且沿載玻片80的表面的法線方向(圖3之箭頭X所示的方向)拉伸,實施90度剝離試驗。此時,由於在試驗用薄膜60剝離時所量測的力量,係為了使各例(實施例及比較例)的薄膜100與試驗用薄膜60剝離所需的力量,故量測此力量的大小作為剝離強度。在剝離所需的力量非常大而在試驗用薄膜剝離前材料就損壞的情況下,則記載為「由於材料損壞無法量測」。The test film 60 was sandwiched between the front ends of the dynamometers, and stretched in the normal direction of the surface of the slide glass 80 (direction indicated by arrow X in FIG. 3), and a 90-degree peel test was performed. At this time, since the force measured when the test film 60 is peeled off is the force required to peel the film 100 and the test film 60 of each example (examples and comparative examples), the magnitude of this force is measured. As peeling strength. When the force required for peeling is very large and the material is damaged before the test film is peeled off, it is described as "impossible due to material damage".

(針對剝離強度的量測方法的補充)(Supplement to the measurement method of peel strength)

在前述剝離強度的量測方法中,使用特定的試驗用薄膜代替偏光板。為了驗證如此進行使用試驗用薄膜代替偏光板的剝離強度的量測的合理性,發明人針對在實施例1所獲得之薄膜進行了以下的實驗。In the aforementioned measurement method of peel strength, a specific test film is used instead of the polarizing plate. In order to verify the rationality of the measurement of the peeling strength using the test film instead of the polarizing plate in this manner, the inventors performed the following experiments on the film obtained in Example 1.

代替試驗用薄膜,遵循日本專利公開第2005-70140號公報的實施例1,於偏光薄膜的一側的表面貼合相位差薄膜堆疊體,於偏光薄膜的另一側的表面貼合三乙醯纖維素薄膜,實施90度剝離試驗。亦即,首先準備日本專利公開第2005-70140號公報的實施例1所記載的偏光薄膜及接合劑。於所準備之偏光薄膜的一側的表面,中介前述接合劑,貼合相位差薄膜堆疊體之經實施電暈處理之面。並且,對於偏光薄膜之另一側的表面,中介前述接合劑,貼合三乙醯纖維素薄膜。之後,以80℃使其乾燥7分鐘而使接合劑固化,以獲得樣品薄膜。針對所獲得之樣品薄膜進行90度剝離試驗。Instead of the test film, following Example 1 of Japanese Patent Laid-Open No. 2005-70140, a retardation film stack was attached to one surface of the polarizing film, and triethylpyridine was attached to the other surface of the polarizing film. The cellulose film was subjected to a 90-degree peel test. That is, first, a polarizing film and a bonding agent described in Example 1 of Japanese Patent Laid-Open No. 2005-70140 are prepared. The corona-treated surface of the retardation film stack was bonded to the surface of one side of the prepared polarizing film through the aforementioned bonding agent. In addition, a triacetam cellulose film was bonded to the surface of the other side of the polarizing film through the aforementioned bonding agent. Then, it dried at 80 degreeC for 7 minutes, and hardened the adhesive agent, and obtained the sample film. A 90-degree peel test was performed on the obtained sample film.

前述實驗的結果,獲得與在使用試驗用薄膜代替偏光板的情況下同樣的結果。因此,使用試驗用薄膜代替偏光板的下述實施例及比較例的結果係合理的。The results of the foregoing experiments were the same as those obtained when a polarizing plate was used instead of a test film. Therefore, the results of the following examples and comparative examples using a test film in place of the polarizing plate are reasonable.

(水蒸氣穿透率的量測)(Measurement of water vapor transmission rate)

光學薄膜的水蒸氣穿透率,使用水蒸氣穿透度量測裝置(MOCON公司製之「PERMATRAN-W」)遵循JIS K 7129 B法,在溫度40℃、濕度90%RH的條件下量測。The water vapor transmission rate of the optical film is measured using a water vapor transmission measurement device ("PERMATRAN-W" manufactured by MOCON Corporation) in accordance with JIS K 7129 B method at a temperature of 40 ° C and a humidity of 90% RH. .

(全光線穿透率的量測)(Measurement of total light transmittance)

光學薄膜的全光線穿透率,使用霧度計NDH-2000(日本電色工業公司製)依據JIS K 7136量測。The total light transmittance of the optical film was measured using a haze meter NDH-2000 (manufactured by Nippon Denshoku Industries Co., Ltd.) in accordance with JIS K 7136.

(嵌段組成比的量測)(Measurement of block composition ratio)

光學薄膜中的嵌段組成比的量測係透過「使用Bruker公司製的原子間力顯微鏡Dimension Fast Scan Icon獲得光學薄膜的凝集力像,而量測該像中的源自各嵌段的相的面積比」而進行。The measurement of the composition ratio of the blocks in the optical film is obtained by "using an atomic force microscope Dimension Fast Scan Icon manufactured by Bruker Co., Ltd. to obtain an agglutination force image of the optical film, and measuring the phase derived from each block in the image. Area ratio ".

作為用以拍攝凝集力像的懸臂樑,使用AC240TS(奧林巴斯公司製,彈簧常數:1.5N/m,TIP曲率半徑15nm)。用以拍攝的量測模式定為ScanAsyst mode,且掃描率定為2Hz的條件,以500nm×500nm的面積量測凝集力像。As a cantilever beam for capturing an agglutination force image, AC240TS (manufactured by Olympus Corporation, spring constant: 1.5 N / m, TIP radius of curvature 15 nm) was used. The measurement mode used for shooting was set to ScanAsyst mode, and the scan rate was set to 2 Hz. The agglutination force image was measured with an area of 500 nm × 500 nm.

凝集力像的量測係於薄膜表面及中央部進行。薄膜中央部的量測,在已進行薄膜剖面的前提上,於剖面中的距薄膜表面的深度5μm的位置進行。The measurement of the agglutination force image was performed on the film surface and the center. The measurement of the central portion of the film was performed at a position having a depth of 5 μm from the surface of the film in the section on the premise that the film section had been performed.

分析凝集力像的量測結果的影像,描繪直方圖。於直方圖中,將於各個量測點所量測之凝集力取做為橫軸,將經量測該凝集力的量測點的個數取做為縱軸。將被認為起因於2種嵌段的2種相的面積比率以高斯函數擬合而算出。An image of the measurement result of the agglutination force image is analyzed and a histogram is drawn. In the histogram, the agglutination force measured at each measurement point is taken as the horizontal axis, and the number of measurement points through which the agglutination force is measured is taken as the vertical axis. The area ratios of the two types of phases considered to be caused by the two types of blocks were calculated by fitting a Gaussian function.

一般而言,已知凝集力取決於Tg,且自低Tg的試料表面拉離懸臂樑時,凝集力會變高。因此,得以凝集力高的相為嵌段[E]且凝集力低的相為嵌段[D]而決定分配。In general, it is known that the agglutination force depends on Tg, and the agglutination force becomes higher when the sample is pulled away from the cantilever beam from the surface of the low Tg. Therefore, the phase with a high cohesive force is a block [E], and the phase with a low cohesive force is a block [D], and distribution is determined.

面積比率,係將2種相的面積的合計設為100%,計算其中之分配至嵌段[D]的相的面積的百分率作為嵌段[D]比率。The area ratio refers to the total area of the two phases as 100%, and the percentage of the area of the phase allocated to the block [D] is calculated as the block [D] ratio.

在表面與中央部之嵌段[D]與嵌段[E]的組成比率的差係藉由下述式算出。 組成比率的差=|(中央部的嵌段[D]比率)-(表面的嵌段[D]比率)|The difference between the composition ratios of the block [D] and the block [E] on the surface and the center is calculated by the following formula. Difference in composition ratio = | (block [D] ratio in the center)-(block [D] ratio on the surface) |

〔製造例1〕[Manufacturing example 1]

(P1-1)嵌段共聚物[F1]的製造(P1-1) Production of block copolymer [F1]

將脫水環己烷270份、脫水苯乙烯75份及二丁醚7.0份添加至具備攪拌裝置且內部充分被氮氣取代的反應器。一邊以60℃攪拌整體,一邊加入正丁基鋰(15%環己烷溶液)5.6份使聚合開始。接續以60℃攪拌整體60分鐘。反應溫度維持60℃至反應停止。在此時間點(聚合第1階段)藉由氣相層析法(以下有時記載為「GC」。)及GPC分析反應液的結果,聚合轉化率為99.4%。270 parts of dehydrated cyclohexane, 75 parts of dehydrated styrene, and 7.0 parts of dibutyl ether were added to a reactor equipped with a stirring device and the inside was sufficiently replaced with nitrogen. While stirring the whole at 60 ° C, 5.6 parts of n-butyllithium (15% cyclohexane solution) was added to start polymerization. Subsequently, the whole was stirred at 60 ° C for 60 minutes. The reaction temperature was maintained at 60 ° C until the reaction stopped. At this time point (the first stage of polymerization), the reaction liquid was analyzed by gas chromatography (hereinafter sometimes referred to as "GC") and GPC, and the polymerization conversion rate was 99.4%.

隨後,將脫水異戊二烯15份經40分鐘連續添加至反應液,添加結束後直接繼續攪拌30分鐘。在此時間點(聚合第2階段)藉由GC及GPC分析反應液的結果,聚合轉化率為99.8%。Subsequently, 15 parts of dehydrated isoprene was continuously added to the reaction liquid over 40 minutes, and after the addition was completed, stirring was continued for 30 minutes. As a result of analyzing the reaction liquid by GC and GPC at this time point (the second stage of polymerization), the polymerization conversion rate was 99.8%.

之後,更將脫水苯乙烯10份經30分鐘連續添加至反應液,添加結束後直接繼續攪拌30分鐘。在此時間點(聚合第3階段)藉由GC及GPC分析反應液的結果,聚合轉化率幾乎為100%。Thereafter, 10 parts of dehydrated styrene was continuously added to the reaction solution over 30 minutes, and stirring was continued for 30 minutes directly after the addition was completed. As a result of analyzing the reaction liquid by GC and GPC at this time point (the third stage of polymerization), the polymerization conversion rate was almost 100%.

於此,藉由加入異丙醇1.0份使反應停止,獲得包含[D1]-[E]-[D2]型的嵌段共聚物[F1]的聚合物溶液。於所獲得之嵌段共聚物[F1]中,Mw[F1]=82,400,Mw/Mn為1.32。Here, 1.0 part of isopropyl alcohol was added to stop the reaction, and a polymer solution containing [D1]-[E]-[D2] -type block copolymer [F1] was obtained. In the obtained block copolymer [F1], Mw [F1] = 82,400, and Mw / Mn was 1.32.

(P1-2)氫化嵌段共聚物[G1]的製造(P1-2) Production of hydrogenated block copolymer [G1]

將在(P1-1)所獲得之聚合物溶液移送至具備攪拌裝置的耐壓反應器,添加矽藻土承載型鎳觸媒(製品名「E22U」,鎳承載量60%,日揮觸媒化成公司製)4.0份及脫水環己烷30份作為氫化觸媒而混合。將反應器內部以氫氣取代,再一邊攪拌溶液一邊供給氫,以溫度190℃、壓力4.5MPa進行6小時氫化反應。The polymer solution obtained in (P1-1) was transferred to a pressure-resistant reactor equipped with a stirring device, and a diatomite-supported nickel catalyst (product name "E22U" was added, and the nickel bearing capacity was 60%. 4.0 parts of the company) and 30 parts of dehydrated cyclohexane were mixed as a hydrogenation catalyst. The inside of the reactor was replaced with hydrogen, and hydrogen was supplied while stirring the solution, and a hydrogenation reaction was performed at a temperature of 190 ° C and a pressure of 4.5 MPa for 6 hours.

藉由氫化反應而獲得之反應溶液中包含氫化嵌段共聚物[G1]。氫化嵌段共聚物的Mw[G1]為71,800,分子量分布Mw/Mn為1.30,氫化率幾乎為100%。The reaction solution obtained by the hydrogenation reaction contains a hydrogenated block copolymer [G1]. The Mw [G1] of the hydrogenated block copolymer was 71,800, the molecular weight distribution Mw / Mn was 1.30, and the hydrogenation rate was almost 100%.

氫化反應結束後,過濾反應溶液而去除氫化觸媒後,添加溶解有作為酚系抗氧化劑的肆{3-[3,5-二(三級丁基)-4-羥基苯基]丙酸}新戊四酯(製品名「AO60」,ADEKA公司製)0.3份的二甲苯溶液2.0份使其溶解,做成溶液。After the completion of the hydrogenation reaction, the reaction solution was filtered to remove the hydrogenation catalyst, and then 3- [3,5-di (tributyl) -4-hydroxyphenyl] propanoic acid, which was a phenolic antioxidant, was added. Neopentyl tetraester (product name "AO60", manufactured by ADEKA) 0.3 parts of xylene solution and 2.0 parts were dissolved to make a solution.

接下來,使用圓筒型濃縮乾燥器(製品名「Kontro」,日立製作所公司製)以溫度260℃、壓力0.001MPa以下處理上述溶液,自溶液去除環己烷、二甲苯及其他揮發成分,獲得熔融樹脂。將此自模具擠出成股狀並冷卻,藉由造粒機成形成顆粒。藉此,製造包含氫化嵌段共聚物[G1]的樹脂[G1]的顆粒95份。Next, the above-mentioned solution was treated at a temperature of 260 ° C and a pressure of 0.001 MPa or less using a cylindrical-type concentration dryer (product name "Kontro", manufactured by Hitachi, Ltd.), and cyclohexane, xylene, and other volatile components were removed from the solution to obtain Molten resin. This was extruded from a die into strands and cooled, and formed into granules by a granulator. Thereby, 95 parts of pellets of the resin [G1] containing the hydrogenated block copolymer [G1] were produced.

所獲得之樹脂[G1]中的氫化嵌段共聚物[G1],Mw[G1]=68,500,Mw/Mn=1.30,Tg2 =140℃,Ts=139℃,(D1+D2)/E=85/15,D1/D2=7.5。Hydrogenated block copolymer [G1] in the obtained resin [G1], Mw [G1] = 68,500, Mw / Mn = 1.30, Tg 2 = 140 ° C, Ts = 139 ° C, (D1 + D2) / E = 85 / 15, D1 / D2 = 7.5.

〔製造例2〕[Manufacture example 2]

(P2-1)嵌段共聚物[F2]的製造(P2-1) Production of block copolymer [F2]

將脫水環己烷270份、脫水苯乙烯70份及二丁醚7.0份添加至具備攪拌裝置且內部充分被氮氣取代的反應器。一邊以60℃攪拌整體,一邊加入正丁基鋰(15%環己烷溶液)5.6份使聚合開始。接續以60℃攪拌整體60分鐘。反應溫度維持60℃至反應停止。在此時間點(聚合第1階段)藉由GC及GPC分析反應液的結果,聚合轉化率為99.4%。270 parts of dehydrated cyclohexane, 70 parts of dehydrated styrene, and 7.0 parts of dibutyl ether were added to a reactor equipped with a stirring device and the inside was sufficiently replaced with nitrogen. While stirring the whole at 60 ° C, 5.6 parts of n-butyllithium (15% cyclohexane solution) was added to start polymerization. Subsequently, the whole was stirred at 60 ° C for 60 minutes. The reaction temperature was maintained at 60 ° C until the reaction stopped. As a result of analyzing the reaction liquid by GC and GPC at this time point (the first stage of polymerization), the polymerization conversion rate was 99.4%.

隨後,將脫水異戊二烯20份經40分鐘連續添加至反應液,添加結束後直接繼續攪拌30分鐘。在此時間點(聚合第2階段)藉由GC及GPC分析反應液的結果,聚合轉化率為99.8%。Subsequently, 20 parts of dehydrated isoprene was continuously added to the reaction solution over 40 minutes, and after the addition was completed, stirring was continued for 30 minutes. As a result of analyzing the reaction liquid by GC and GPC at this time point (the second stage of polymerization), the polymerization conversion rate was 99.8%.

之後,更將脫水苯乙烯10份經30分鐘連續添加至反應液,添加結束後直接繼續攪拌30分鐘。在此時間點(聚合第3階段)藉由GC及GPC分析反應液的結果,聚合轉化率幾乎為100%。Thereafter, 10 parts of dehydrated styrene was continuously added to the reaction solution over 30 minutes, and stirring was continued for 30 minutes directly after the addition was completed. As a result of analyzing the reaction liquid by GC and GPC at this time point (the third stage of polymerization), the polymerization conversion rate was almost 100%.

於此,藉由加入異丙醇1.0份使反應停止,獲得包含[D1]-[E]-[D2]型的嵌段共聚物[F2]的聚合物溶液。於所獲得之嵌段共聚物[F2]中,Mw[F2]=83,400,Mw/Mn為1.32。Here, 1.0 part of isopropyl alcohol was added to stop the reaction, and a polymer solution containing [D1]-[E]-[D2] -type block copolymer [F2] was obtained. In the obtained block copolymer [F2], Mw [F2] = 83,400, and Mw / Mn was 1.32.

(P2-2)氫化嵌段共聚物[G2]的製造(P2-2) Production of hydrogenated block copolymer [G2]

將在(P2-1)所獲得之聚合物溶液移送至具備攪拌裝置的耐壓反應器,添加矽藻土承載型鎳觸媒(製品名「E22U」,鎳承載量60%,日揮觸媒化成公司製)4.0份及脫水環己烷30份作為氫化觸媒而混合。將反應器內部以氫氣取代,再一邊攪拌溶液一邊供給氫,以溫度190℃、壓力4.5MPa進行6小時氫化反應。The polymer solution obtained in (P2-1) was transferred to a pressure-resistant reactor equipped with a stirring device, and diatomite-supported nickel catalyst (product name "E22U" was added, and the nickel bearing capacity was 60%. 4.0 parts of the company) and 30 parts of dehydrated cyclohexane were mixed as a hydrogenation catalyst. The inside of the reactor was replaced with hydrogen, and hydrogen was supplied while stirring the solution, and a hydrogenation reaction was performed at a temperature of 190 ° C and a pressure of 4.5 MPa for 6 hours.

藉由氫化反應而獲得之反應溶液中包含氫化嵌段共聚物[G2]。氫化嵌段共聚物的Mw[G2]為72,800,分子量分布Mw/Mn為1.30,氫化率幾乎為100%。The reaction solution obtained by the hydrogenation reaction contains a hydrogenated block copolymer [G2]. The Mw [G2] of the hydrogenated block copolymer was 72,800, the molecular weight distribution Mw / Mn was 1.30, and the hydrogenation rate was almost 100%.

氫化反應結束後,過濾反應溶液而去除氫化觸媒後,添加溶解有作為酚系抗氧化劑的肆{3-[3,5-二(三級丁基)-4-羥基苯基}丙酸}新戊四酯(製品名「AO60」,ADEKA公司製)0.3份的二甲苯溶液2.0份使其溶解,做成溶液。After the completion of the hydrogenation reaction, the reaction solution was filtered to remove the hydrogenation catalyst, and then 3- [3,5-di (tertiarybutyl) -4-hydroxyphenyl} propionate} was added as a phenolic antioxidant. Neopentyl tetraester (product name "AO60", manufactured by ADEKA) 0.3 parts of xylene solution and 2.0 parts were dissolved to make a solution.

接下來,使用圓筒型濃縮乾燥器(製品名「Kontro」,日立製作所公司製)以溫度260℃、壓力0.001MPa以下處理上述溶液,自溶液去除環己烷、二甲苯及其他揮發成分,獲得熔融樹脂。將此自模具擠出成股狀並冷卻,藉由造粒機成形成顆粒。藉此,製造包含氫化嵌段共聚物[G2]的樹脂[G2]的顆粒95份。Next, the above-mentioned solution was treated at a temperature of 260 ° C and a pressure of 0.001 MPa or less using a cylindrical-type concentration dryer (product name "Kontro", manufactured by Hitachi, Ltd.), and cyclohexane, xylene and other volatile components were removed from the solution to obtain Molten resin. This was extruded from a die into strands and cooled, and formed into granules by a granulator. Thereby, 95 parts of pellets of the resin [G2] containing the hydrogenated block copolymer [G2] were produced.

所獲得之樹脂[G2]中的氫化嵌段共聚物[G2],Mw[G2]=69,500,Mw/Mn=1.30,Tg2 =140℃,Ts=138℃,(D1+D2)/E=80/20,D1/D2=7.0。Hydrogenated block copolymer [G2] in the obtained resin [G2], Mw [G2] = 69,500, Mw / Mn = 1.30, Tg 2 = 140 ° C, Ts = 138 ° C, (D1 + D2) / E = 80 / 20, D1 / D2 = 7.0.

〔實施例1〕[Example 1]

(1-1.光學薄膜的製造)(1-1. Manufacturing of optical film)

準備具備篩孔尺寸3μm的葉圓盤形狀的聚合物過濾器的雙螺紋型單軸擠製機(螺桿的直徑D=50mm,螺桿的長度L與螺桿的直徑D的比L/D=28)。於此單軸擠製機導入在製造例1獲得之顆粒狀的樹脂[G1]作為熱塑性樹脂A並使其熔融,透過供料頭供給至單層模具。對於單軸擠製機之樹脂A的導入係透過裝載於單軸擠製機的進料斗而進行。並且,前述單層模具的模唇的表面粗糙度(算術平均粗糙度Ra)為0.1μm。再者,樹脂A的擠製機出口溫度為260℃。A twin-screw single-shaft extruder equipped with a polymer filter with a leaf disc shape with a mesh size of 3 μm was prepared (the ratio of the diameter L of the screw D to 50 mm and the diameter L of the screw L / D = 28) . The pelletized resin [G1] obtained in Production Example 1 was introduced into this uniaxial extruder as the thermoplastic resin A, melted, and fed to a single-layer mold through a feed head. The introduction of the resin A to the uniaxial extruder was performed through a hopper mounted on the uniaxial extruder. The surface roughness (arithmetic average roughness Ra) of the lip of the single-layer mold was 0.1 μm. The extruder exit temperature of the resin A was 260 ° C.

另一方面,準備1台具備篩孔尺寸3μm的葉圓盤形狀的聚合物過濾器的單軸擠製機(螺桿的直徑D=50mm,螺桿的長度L與螺桿的直徑D的比L/D=30)。於此單軸擠製機導入包含非晶性的含脂環結構聚合物的樹脂B作為熱塑性樹脂B(做成樹脂「B-1」,日本瑞翁公司製,熱軟化溫度160℃)並使其溶解,透過供料頭供給至前述單層模具。樹脂B的擠製機出口溫度為260℃。On the other hand, a single-shaft extruder equipped with a polymer filter with a leaf disc shape with a mesh size of 3 μm (screw diameter D = 50 mm, and the ratio L / D of the length L of the screw to the diameter D of the screw) was prepared. = 30). In this uniaxial extruder, a resin B containing an amorphous alicyclic structure-containing polymer was introduced as a thermoplastic resin B (made of resin "B-1", manufactured by Japan's Ruiwon Corporation, with a heat softening temperature of 160 ° C) and This is dissolved and supplied to the aforementioned single-layer mold through a feed head. The extruder exit temperature of resin B was 260 ° C.

使樹脂A及樹脂B以260℃的熔融狀態自擠製成形機的單層模具吐出。藉此連續形成依序具備:由樹脂B而成之表層、由樹脂A而成之核心層及由樹脂B而成之表層的3層的薄膜狀的樹脂(共擠出成形工序)。將所吐出之薄膜狀的樹脂澆淋至冷卻輥。於澆淋時,進行將薄膜狀的樹脂的寬度方向端部固定於冷卻輥的邊緣釘扎,空氣隙量設定為50mm。藉此,冷卻薄膜狀的樹脂,獲得3層結構的堆疊薄膜。所獲得之堆疊薄膜係由2種樹脂而成之3層堆疊薄膜,所述由2種樹脂而成之3層堆疊薄膜依序具備:由樹脂B而成之表層、由樹脂A而成之核心層及由樹脂B而成之表層。The resin A and the resin B were discharged from a single-layer mold of an extrusion molding machine in a molten state at 260 ° C. Thereby, a three-layer film-shaped resin having a surface layer made of resin B, a core layer made of resin A, and a surface layer made of resin B in this order is continuously formed (coextrusion molding step). The discharged film-like resin is poured onto a cooling roller. During the pouring, the widthwise end of the film-like resin was fixed to the edge of the cooling roller, and the air gap was set to 50 mm. Thereby, the film-like resin was cooled, and a three-layer structured stacked film was obtained. The obtained stacked film is a three-layer stacked film made of two kinds of resins, and the three-layer stacked film made of two kinds of resins is provided with a surface layer made of resin B and a core made of resin A in this order. Layer and surface layer made of resin B.

(1-2.光學薄膜的製造及評價)(1-2. Manufacturing and Evaluation of Optical Films)

進行自在(1-1)獲得之3層結構的堆疊薄膜剝離表層的剝離工序。剝離工序藉由牽引堆疊薄膜的兩側的表層,且自核心層連續剝離表層而進行。牽引2層表層的方向係相對於核心層之面的角度為60°的方向,剝離速度為5m/min。其結果,獲得表層受到剝離的厚度為40μm的單層的薄膜1。The peeling step of peeling the surface layer from the three-layered stacked film obtained in (1-1) was performed. The peeling process is performed by pulling the surface layers on both sides of the stacked film and continuously peeling the surface layers from the core layer. The direction of pulling the two surface layers was a direction with an angle of 60 ° with respect to the surface of the core layer, and the peeling speed was 5 m / min. As a result, a single-layer film 1 having a thickness of 40 μm where the surface layer was peeled off was obtained.

針對所獲得之薄膜1進行評價,將結果揭示於表1。於剝離強度的評價中,由於在試驗用薄膜剝離前發生材料損壞,故剝離強度為無法量測。此意謂剝離強度為高。The obtained thin film 1 was evaluated, and the results are shown in Table 1. In the evaluation of the peel strength, since material damage occurred before the test film was peeled, the peel strength was not measurable. This means that the peel strength is high.

〔實施例2〕[Example 2]

除了使用在製造例2獲得之顆粒狀的樹脂[G2]代替在製造例1獲得之顆粒狀的樹脂[G1]以外,其餘比照實施例1製作堆疊薄膜後再剝離表層,獲得厚度為40μm的單層的薄膜2。針對所獲得之薄膜2進行與實施例1相同的評價,結果如表1所示。於剝離強度的評價中,由於在試驗用薄膜剝離前發生材料損壞,故剝離強度為無法量測。此意謂剝離強度為高。Except that the granular resin [G2] obtained in Manufacturing Example 2 was used instead of the granular resin [G1] obtained in Manufacturing Example 1, the rest was peeled off from the surface layer after preparing a stacked film according to Example 1 to obtain a single unit having a thickness of 40 μm.层 的 膜 2。 Thin film 2. The obtained film 2 was evaluated in the same manner as in Example 1. The results are shown in Table 1. In the evaluation of the peel strength, since material damage occurred before the test film was peeled, the peel strength was not measurable. This means that the peel strength is high.

〔比較例1〕[Comparative Example 1]

準備具備篩孔尺寸3μm的葉圓盤形狀的聚合物過濾器的雙螺紋型單軸擠製機(螺桿的直徑D=50mm,螺桿的長度L與螺桿的直徑D的比L/D=28)。於此單軸擠製機導入在製造例1獲得之顆粒狀的樹脂[G1]並使其熔融,供給至單層模具。對於單軸擠製機之樹脂[G1]的導入係透過裝載於單軸擠製機的進料斗而進行。並且,前述單層模具的模唇的表面粗糙度(算術平均粗糙度Ra)為0.1μm。再者,樹脂[G1]的擠製機出口溫度為260℃。A twin-screw single-shaft extruder equipped with a polymer filter with a leaf disc shape with a mesh size of 3 μm was prepared (the ratio of the screw diameter L = 50 mm and the length L of the screw to the diameter D of the screw L / D = 28) . The pelletized resin [G1] obtained in Production Example 1 was introduced into this uniaxial extruder, melted, and supplied to a single-layer mold. The resin [G1] for the uniaxial extruder is introduced through the hopper loaded on the uniaxial extruder. The surface roughness (arithmetic average roughness Ra) of the lip of the single-layer mold was 0.1 μm. The extruder exit temperature of the resin [G1] was 260 ° C.

使樹脂[G1]以260℃的熔融狀態自單層模具吐出。藉此連續形成僅由「由樹脂[G1]而成之層」而成之薄膜狀的樹脂。將所吐出之薄膜狀的樹脂澆淋至冷卻輥。於澆淋時,進行將薄膜狀的樹脂的寬度方向端部固定於冷卻輥的邊緣釘扎,空氣隙量設定為50mm。藉此,冷卻薄膜狀的樹脂,獲得由樹脂[G1]而成之單層結構的厚度為40μm的薄膜C1。針對所獲得之樹脂薄膜C1進行與實施例1的薄膜相同的評價,結果如表1所示。The resin [G1] was discharged from the single-layer mold in a molten state at 260 ° C. As a result, a thin-film resin consisting only of the "layer made of resin [G1]" is continuously formed. The discharged film-like resin is poured onto a cooling roller. During the pouring, the widthwise end of the film-like resin was fixed to the edge of the cooling roller, and the air gap was set to 50 mm. Thereby, the film-shaped resin was cooled, and a film C1 having a single-layer structure made of the resin [G1] and having a thickness of 40 μm was obtained. The obtained resin film C1 was evaluated in the same manner as the film of Example 1. The results are shown in Table 1.

〔比較例2〕[Comparative Example 2]

除了使用在製造例2獲得之顆粒狀的樹脂[G2]代替在製造例1獲得之顆粒狀的樹脂[G1]以外,其餘藉由與比較例1相同的操作,製造由樹脂[G2]而成之單層結構的厚度為40μm的薄膜C2。針對此薄膜C2進行與實施例1的薄膜相同的評價,結果如表1所示。Except that the granular resin [G2] obtained in Manufacturing Example 2 was used instead of the granular resin [G1] obtained in Manufacturing Example 1, the resin [G2] was manufactured by the same operation as in Comparative Example 1. The film C2 has a single-layer structure with a thickness of 40 μm. This film C2 was evaluated in the same manner as the film of Example 1. The results are shown in Table 1.

〔比較例3〕[Comparative Example 3]

將光學薄膜E(FUJI FILM股份有限公司製之「FUJITAC」,厚度40μm)與實施例1的薄膜進行相同的評價,結果如表1所示。剝離強度的量測係使用經實施皂化處理的薄膜。The optical film E ("FUJITAC" manufactured by FUJI FILM Co., Ltd., thickness: 40 μm) was evaluated in the same manner as the film of Example 1. The results are shown in Table 1. The measurement of the peeling strength uses a saponified film.

整理實施例及比較例的結果並揭示於表1。The results of Examples and Comparative Examples are summarized and shown in Table 1.

『表1』 "Table 1"

表中的簡稱的意義係如下述。 G1:在製造例1製造的氫化嵌段共聚物[G1]。 G2:在製造例2製造的氫化嵌段共聚物[G2]。 B-1:包含含脂環結構聚合物的樹脂,熱軟化溫度160℃,日本瑞翁公司製之「ZEONOR」的製品系列中之一者。 E:光學薄膜,FUJI FILM股份有限公司製之「FUJITAC」 |Re|:面內方向的延遲的絕對值 |Rth|:厚度方向的延遲的絕對值The meanings of the abbreviations in the table are as follows. G1: The hydrogenated block copolymer [G1] produced in Production Example 1. G2: The hydrogenated block copolymer [G2] produced in Production Example 2. B-1: Resin containing alicyclic structure polymer, heat softening temperature of 160 ° C, one of the products of "ZEONOR" made by Japan's Rui Weng Company. E: Optical film, "FUJITAC" manufactured by FUJI FILM Co., Ltd. | Re |: Absolute value of retardation in plane direction | Rth |: Absolute value of retardation in thickness direction

由實施例及比較例的結果可知,藉由本發明的光學薄膜的製造方法而獲得之薄膜,可做成與對象物的密合性高、延遲小且水蒸氣穿透率低的光學薄膜。From the results of the examples and comparative examples, it can be seen that the film obtained by the method for producing an optical film of the present invention can be made into an optical film with high adhesion to an object, small retardation, and low water vapor transmission rate.

10‧‧‧核心層10‧‧‧ Core Layer

11、12‧‧‧表層11, 12‧‧‧ surface

20‧‧‧堆疊薄膜20‧‧‧ stacked film

50‧‧‧UV接合劑50‧‧‧UV bonding agent

60‧‧‧試驗用薄膜60‧‧‧Test film

70‧‧‧黏合劑70‧‧‧Adhesive

80‧‧‧載玻片80‧‧‧Slides

100‧‧‧光學薄膜100‧‧‧ Optical Film

100A、100B‧‧‧光學薄膜之面100A, 100B‧‧‧face of optical film

M‧‧‧擠製成形機M‧‧‧ Extrusion Forming Machine

P‧‧‧剝離區域P‧‧‧ Stripped area

S‧‧‧樣品薄膜S‧‧‧Sample film

圖1係概略繪示本發明的製造方法中的堆疊薄膜製作工序的一例的剖面圖。 圖2係概略繪示本發明的製造方法中的剝離工序的一例的剖面圖。 圖3係概略繪示實施例中的評價試驗所使用的樣品的剖面圖。FIG. 1 is a cross-sectional view schematically showing an example of a manufacturing process of a stacked film in the manufacturing method of the present invention. 2 is a cross-sectional view schematically showing an example of a peeling step in the manufacturing method of the present invention. FIG. 3 is a schematic cross-sectional view of a sample used in an evaluation test in an example.

Claims (10)

一種光學薄膜,其包含嵌段共聚物,該嵌段共聚物包含: 具有含環烴基化合物單元的嵌段[Da];以及 具有鏈烴化合物單元或具有鏈烴化合物單元及含環烴基化合物單元的嵌段[Ea], 其中在表面與中央部的前述嵌段[Da]的體積與前述嵌段[Ea]的體積的組成比率的差為0~10%, 其面內方向的延遲的絕對值係5nm以下, 其厚度方向的延遲的絕對值係10nm以下, 且其水蒸氣穿透率為20g/(m2 .日)以下。An optical film comprising a block copolymer comprising: a block [Da] having a cyclic hydrocarbon group-containing compound unit; and a block having a chain hydrocarbon compound unit or a chain hydrocarbon compound unit and a cyclic hydrocarbon group-containing compound unit Block [Ea], wherein the difference between the composition ratio of the volume of the block [Da] on the surface and the central portion and the volume of the block [Ea] is 0 to 10%, and the absolute value of the retardation in the in-plane direction is The thickness is 5 nm or less, the absolute value of the retardation in the thickness direction is 10 nm or less, and the water vapor transmission rate thereof is 20 g / (m 2 .day) or less. 如請求項1所述之光學薄膜,其由包含前述嵌段共聚物的樹脂受擠出製膜而成。The optical film according to claim 1, which is formed by extruding a resin containing the aforementioned block copolymer into a film. 如請求項1或2所述之光學薄膜,其中前述嵌段共聚物係每1分子包含2個以上的聚合物嵌段[Db]作為前述嵌段[Da]且每1分子包含1個以上的聚合物嵌段[Eb]作為前述嵌段[Ea]的共聚物,該聚合物嵌段[Db]具有含環烴基化合物氫化物單元,該聚合物嵌段[Eb]具有鏈烴化合物氫化物單元,或具有鏈烴化合物或其氫化物單元及含環烴化合物或其氫化物單元。The optical film according to claim 1 or 2, wherein the aforementioned block copolymer contains at least two polymer blocks [Db] per molecule as the aforementioned block [Da] and contains more than one per molecule A polymer block [Eb] is a copolymer of the foregoing block [Ea], the polymer block [Db] has a cyclic hydrocarbon group-containing compound hydride unit, and the polymer block [Eb] has a chain hydrocarbon compound hydride unit Or has a hydrocarbon compound or a hydride unit thereof and a cyclic hydrocarbon compound or a hydride unit thereof. 一種偏光板,其具備如請求項1至3之任一項所述之光學薄膜與偏光件。A polarizing plate comprising the optical film and the polarizer according to any one of claims 1 to 3. 一種液晶顯示裝置,其具備如請求項4所述之偏光板。A liquid crystal display device includes the polarizing plate according to claim 4. 一種光學薄膜的製造方法,其包含:藉由共擠出樹脂A與樹脂B,獲得具備由樹脂A而成之核心層及設置於前述核心層之面上的由樹脂B而成之表層的堆疊薄膜的工序;以及自前述堆疊薄膜剝離前述表層的工序,其中前述光學薄膜其面內方向的延遲的絕對值係5nm以下,其厚度方向的延遲的絕對值係10nm以下,且其水蒸氣穿透率係20g/(m2 .日)以下。An optical film manufacturing method comprising: by co-extruding resin A and resin B, obtaining a stack including a core layer made of resin A and a surface layer made of resin B provided on the surface of the core layer A film step; and a step of peeling the surface layer from the stacked film, wherein the absolute value of the retardation in the in-plane direction of the optical film is 5 nm or less, the absolute value of the retardation in the thickness direction is 10 nm or less, and water vapor transmission The rate is below 20g / (m 2 · day). 如請求項6所述之光學薄膜的製造方法,其中前述光學薄膜的前述面內方向的延遲的絕對值係2nm以下,前述光學薄膜的前述厚度方向的延遲的絕對值係2nm以下。The method for manufacturing an optical film according to claim 6, wherein the absolute value of the retardation in the in-plane direction of the optical film is 2 nm or less, and the absolute value of the retardation in the thickness direction of the optical film is 2 nm or less. 如請求項6或7所述之光學薄膜的製造方法,其中前述樹脂B包含含脂環結構聚合物。The method for producing an optical film according to claim 6 or 7, wherein the resin B contains an alicyclic structure-containing polymer. 如請求項6或7所述之光學薄膜的製造方法,其中前述樹脂A包含氫化嵌段共聚物,該氫化嵌段共聚物每1分子含有2個以上的聚合物嵌段[D]且每1分子含有1個以上的聚合物嵌段[E],該聚合物嵌段[D]具有含環烴基化合物氫化物單元,該聚合物嵌段[E]具有鏈烴化合物氫化物單元,或具有鏈烴化合物單元及含環烴化合物氫化物單元。The method for manufacturing an optical film according to claim 6 or 7, wherein the resin A includes a hydrogenated block copolymer, and the hydrogenated block copolymer contains 2 or more polymer blocks [D] per molecule and 1 The molecule contains more than one polymer block [E], the polymer block [D] has a cyclic hydrocarbon compound-containing hydride unit, and the polymer block [E] has a hydrocarbon compound hydride unit, or has a chain Hydrocarbon compound units and cyclic hydrocarbon compound hydride units. 如請求項6或7所述之光學薄膜的製造方法,其中前述樹脂A由嵌段共聚物而成,該嵌段共聚物包含:具有含環烴基化合物單元的嵌段;以及具有鏈烴化合物單元或具有鏈烴化合物單元及含環烴基化合物單元的嵌段,於前述光學薄膜中,在其表面與中央部的組成比率的差係0~10%。The method for manufacturing an optical film according to claim 6 or 7, wherein the resin A is made of a block copolymer including: a block having a cyclic hydrocarbon group-containing compound unit; and a chain hydrocarbon compound unit In the optical film, the difference between the composition ratio between the surface and the central portion of the block having a chain hydrocarbon compound unit and a cyclic hydrocarbon group-containing compound unit is 0 to 10%.
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