TW201825534A - Imprint material - Google Patents

Abstract

[Subject] Provide a novel embossing material. [Solution] An imprint material containing the following components (A), (B), and (C), (A): a compound represented by the following formula (1) (In the formula, two R's each independently represent a hydrogen atom or a methyl group); (B): a straight-chain alkylene group having 6 to 10 carbon atoms and / or selected from the group consisting of a cyclopentane structure, a cyclohexane structure, An alicyclic structure in a group formed by a norbornane structure, an isofluorenyl structure, and an adamantane structure, and a compound having at least one polymerizable group; (C): a photopolymerization initiator.

Description

Embossed material

[0001] The present invention relates to an imprint material (film-forming composition for imprint) and a pattern-transferred film made from the material. More specifically, it relates to a pattern-transferred film made of this material that maintains high transparency even in a thick film state, and has a high refractive index and a high Abbe number. The "thick film" as used herein means a film having a thickness of 0.01 mm to 1.5 mm.

[0002] In 1995, Professor Chou et al., Currently at Princeton University, proposed a novel technique called nanoimprint lithography (Patent Document 1). Nanoimprint lithography is to contact a mold with an arbitrary pattern to a substrate on which a resin film is formed. While pressing the resin film, heat or light is used as an external stimulus to make the intended pattern hardened. The technology on this resin film, this nano-imprint lithography, has the advantage that compared to the conventional photolithography in semiconductor device manufacturing, nano-level processing can be performed more easily and cheaply. Therefore, because nanoimprint lithography is used instead of photolithography, in order to be expected to be applied to the manufacturing of semiconductor devices, optical devices, displays, storage media, biochips, etc., various reports on the use of nanolithography are reported. Light nanoimprint lithography hardening composition for nanolithography (Patent Document 2, Patent Document 3). [0003] Also, in the photo-nanoimprint lithography, a roll-to-roll method has been proposed as a method for mass-producing a pattern-transferred film with high efficiency. The roll-to-roll method proposed in the past in light nanoimprint lithography uses a flexible film as a substrate as a material for nanoimprint lithography (hereinafter, referred to as "imprint material" in this specification) The method of using a solvent-free type of a solvent-free type in which the pattern size is difficult to change is the mainstream. [Prior Art Literature] [Patent Literature] [0004] [Patent Literature 1] US Patent No. 5772905 [Patent Literature 2] Japanese Patent Laid-Open No. 2008-105414 [Patent Literature 3] Japanese Patent Laid-Open No. 2008-202022

[Problems to be Solved by the Invention] [0005] As described above, solvent-free materials have been used for the imprint materials proposed in the past, but there is no information about the high transparency in the visible light region after light imprinting with a thick film. Specific discussion or report on materials with high refractive index and high Abbe number. [0006] The present invention is based on the above-mentioned circumstances. The problem to be solved is to provide high pressure in the visible light region, high refractive index, and high Abbe number pressure after providing light imprinting with a thick film. Printed materials for the purpose. [Means for Solving the Problem] [0007] As a result of intensive studies by the present inventors to solve the above problems, the use of A compound having an alkane ring and a polymerizable group at both ends, a linear alkylene group having 6 to 10 carbon atoms, and / or a member selected from the group consisting of a cyclopentane structure, a cyclohexane structure, a norbornane structure, and an isofluorenyl structure The alicyclic structure in the group formed by the adamantane structure, the compound having at least one polymerizable group, and the material containing a photopolymerization initiator were used as embossing materials, and the following findings were obtained to complete the present invention. That is, the imprint material of the present invention has high transparency in the visible light region, high refractive index, and high Abbe number after being imprinted with thick film light. [0008] That is, as a first aspect, the present invention is an imprint material containing the following components (A), (B), and (C), (A): a compound represented by the following formula (1) (In the formula, two R's each independently represent a hydrogen atom or a methyl group); (B): a straight-chain alkylene group having 6 to 10 carbon atoms and / or selected from the group consisting of a cyclopentane structure, a cyclohexane structure, An alicyclic structure in a group formed by a norbornane structure, an isofluorenyl structure, and an adamantane structure, and a compound having at least one polymerizable group; (C): a photopolymerization initiator. The second aspect is the imprint material according to the first aspect, wherein the polymerizable group is an acrylfluorenyloxy group, a methacrylfluorenyloxy group, a vinyl group, or an allyl group. The third aspect is the imprint material according to the first aspect or the second aspect, wherein the number of the polymerizable groups is one or two. The fourth aspect is the imprint material according to any one of the first to third aspects, wherein the ratio of the component (A) to the total mass of the component (A) and the component (B) is 100% by mass. It is 10 to 90 mass%. The fifth aspect is the imprint material according to any one of the first aspect to the fourth aspect, which further contains a compound having at least one thiol group as the (D) component. The sixth aspect is the imprint material according to any one of the first to fifth aspects, and further contains an antioxidant as the (E) component. The seventh aspect is the imprint material according to any one of the first to sixth aspects, further including a surfactant as the (F) component. The eighth aspect is the imprint material according to any one of the first to seventh aspects, and further contains a solvent as the (G) component. The ninth aspect is a pattern-transferred film, which is produced using an imprint material according to any one of the first to eighth aspects. A tenth aspect is the film having a pattern transferred thereon according to the ninth aspect, wherein the aforementioned pattern is a lens shape. The eleventh aspect is the pattern-transferred film according to the ninth or tenth aspect, wherein the pattern-transferred film is a lens for a camera module. The twelfth aspect is the pattern-transferred film according to any one of the ninth to eleventh aspects, wherein the maximum film thickness of the pattern-transferred film is 1.5 mm. A thirteenth aspect is a method for producing a pattern-transferred film, which includes filling a space between a bonded substrate and a mold with an imprint material according to any one of the first to eighth aspects, or A step of dividing the space inside the mold; and a step of exposing and hardening the imprint material filled in the space. A fourteenth aspect is the method for producing a pattern-transferred film according to the thirteenth aspect, which includes a step of removing the obtained light-cured material and removing the film after the light-curing step; and A heating step is performed before, during, or after the film release step. [Effects of Invention] [0009] The imprint material of the present invention contains a compound represented by the aforementioned formula (1), and a linear alkylene group having 6 to 10 carbon atoms and / or is selected from cyclopentane Structure, cyclohexane structure, norbornane structure, isofluorenyl structure, and adamantane structure in the group of alicyclic structure and at least one polymerizable group of compounds, the hardened film made from the imprint material is even The thick film also has high transparency in the visible light region, has a high refractive index, and a high Abbe number. [0010] In addition, since the imprint material of the present invention is photocurable and a part of the pattern does not peel off when it is peeled from the mold, a film that accurately forms a desired pattern can be obtained. Therefore, a good pattern of light imprint can be formed. [0011] In addition, the imprint material of the present invention can be formed on any substrate, and the film has a high transparency in the visible light region, a high refractive index, and a high Abbe number even if it is a thick film. Therefore, the pattern-transferred film formed after embossing is suitable for solid imaging elements, lenses for camera modules, and lenses for sensors, etc., which require high transparency, high refractive index, and high Abbe number. Manufacturing of optical components. Here, examples of the lens include a concave lens, a convex lens, an aspheric lens, a spherical lens, a Fresnel lens, a linear Fresnel lens, and a lens having a fine uneven shape (anti-reflection structure) on a curved surface. In this specification, among the above-mentioned concave lens, convex lens, aspheric lens, spherical lens, Fresnel lens, linear Fresnel lens, and lens having a fine concave-convex shape (anti-reflection structure) on the curved surface, the shape of the curved surface of the lens is called a lens shape . [0012] Furthermore, the imprint material of the present invention can control the curing speed, dynamic viscosity, and film thickness by changing the type and content ratio of the compound of the component (B). Therefore, since the imprint material of the present invention can be designed according to the type of the device to be manufactured, the type of the exposure process and the firing process, and the process margin can be enlarged, it is suitable for the manufacture of optical components.

[(A) Component] The compound of the (A) component is a compound represented by the following formula (1). (In the formula, two R's each independently represent a hydrogen atom or a methyl group). [0014] As a specific example of the compound represented by the above formula (1), two examples can be exemplified. Alkyl Glycol Diacrylate, Di Alkyl glycol dimethacrylate. [0015] The compound represented by the above formula (1) can be obtained from a commercially available product. As a specific example thereof, NK ESTER A-DOG (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) can be exemplified. [0016] The compound of the component (A) may be used alone or in combination of two or more. [0017] The content ratio of the component (A) in the imprint material of the present invention is 10% by mass or more and 90% by mass or less based on 100% by mass of the total mass of the component (A) and the component (B) described later. It is more preferably 40% by mass or more and 60% by mass or less. When the proportion of the component (A) is less than 10% by mass or more than 90% by mass, the transparency of the film obtained by heating may be reduced after photoimprinting. [(B) Component] (B) The compound of component (B) means a straight-chain alkylene group having 6 to 10 carbon atoms and / or selected from the group consisting of a cyclopentane structure, a cyclohexane structure, and a norbornane structure. , An alicyclic structure in a group formed by an isopropyl group structure and an adamantane structure, and a compound having at least one polymerizable group. The aforementioned linear alkylene group having 6 to 10 carbon atoms represents (-CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ -), (-CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ -), (-CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ -), (-CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ -) Or (-CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ CH ₂ -). The alicyclic structure means a cyclic and non-aromatic hydrocarbon. Examples of the polymerizable group include acrylfluorenyloxy, methacrylfluorenyloxy, vinyl, and allyl. Here, acrylfluorenyloxy may be represented by acrylfluorenyloxy and methacrylfluorenyloxy may be represented by methacrylfluorenyloxy. The component (B) compound may have a linear alkylene group having 6 to 10 carbon atoms, a group and a structure other than the alicyclic structure and the polymerizable group, and may not have, but does not have the straight group. The alkylene group, the alicyclic structure, and a group and structure other than the polymerizable group are preferred. [0019] Among the compounds of the component (B), as specific examples of the compound having a linear alkylene group having 6 to 10 carbon atoms and at least one polymerizable group, n-hexyl (meth) acrylic acid can be exemplified. Ester, n-heptyl (meth) acrylate, n-octyl (meth) acrylate, n-nonyl (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9 nonanediol di (meth) acrylate, 1,10-decanediol di (meth) acrylate. In addition, a (meth) acrylate compound means the meaning of both an acrylate compound and a methacrylate compound, for example, (meth) acrylic acid means the meaning of both acrylic acid and methacrylic acid. [0020] Among the compounds of the component (B), a compound having a linear alkylene group having 6 to 10 carbon atoms and at least one polymerizable group can be obtained from a commercially available product. As a specific example, Acrylic acid can be exemplified. n-hexyl ester, Methacrylic acid n-hexyl ester (above manufactured by Tokyo Chemical Industry Co., Ltd.), n-Heptyl acrylate, n-Heptyl methacrylate, n-Octyl acrylate, n-Octyl methacrylate, n-Nonyl acrylate, n- Nonyl methacrylate, n-Decyl acrylate, n-Decyl methacrylate (above manufactured by ABCR GmbH & Co. KG), NK ESTER A-HD-N, same HD-N, same A-NOD-N, same NOD-N, same A-DOD, DOD-N (above are manufactured by Shin Nakamura Chemical Industry Co., Ltd.), NOAA, Viscoat (registered trademark) # 230, same # 260 (above are manufactured by Osaka Organic Chemical Industry Co., Ltd.), FANCRYL (registered Trademark) FA-129AS (The above are manufactured by Hitachi Chemical Industries, Ltd.). [0021] Among the compounds of the component (B), the compound having an alicyclic structure selected from the group consisting of a cyclopentane structure, a cyclohexane structure, a norbornane structure, an isofluorenyl structure, and an adamantane structure, and Specific examples of the compound having at least one polymerizable group include cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, and cyclohexanespiro-2- (1,3-dioxolane). 4-yl) methyl acrylate, isofluorenyl (meth) acrylate, 1-adamantyl (meth) acrylate, 1-propenyloxy-3-hydroxyadamantane, 3-hydroxy-1 -Methacrylfluorenyloxyadamantane, 2-methacrylfluorenyloxy-2-methyladamantane, 1,3-dipropenylacryloxyadamantane, 2-ethyl-2-methyl Acrylic fluorenyloxy adamantane, 2-isopropyl-2-methacryl fluorenyloxy adamantane, 3,4-epoxycyclohexyl methyl (meth) acrylate. [0022] Among the compounds of the component (B), the compound has an alicyclic structure selected from the group consisting of a cyclopentane structure, a cyclohexane structure, a norbornane structure, an isofluorenyl structure, and an adamantane structure, and at least One polymerizable group compound can be obtained from a commercial product. As specific examples thereof, cyclopentyl acrylate, cyclopentyl methacrylate (above, manufactured by ABCR GmbH & Co. KG), cyclohexyl acrylate, and cyclic Hexyl methacrylate, isofluorenyl acrylate, isofluorenyl methacrylate, 1-propenyloxy-3-hydroxyadamantane, 3-hydroxy-1-methacryloyloxyadamantane, 2-methacrylfluorenyloxy-2-methyladamantane, 2-ethyl-2-methacrylfluorenyloxy adamantane, 2-isopropyl-2-methacrylfluorenyloxy adamantane (The above is manufactured by Tokyo Chemical Industry Co., Ltd.), IBXA, Viscoat # 155, CHDOL-10, 1-ADA, 1-ADMA (The above is manufactured by Osaka Organic Chemical Industry Co., Ltd.), LIGHT ESTER CH, same as IB- X, LIGHT ACRYLATE (registered trademark) IB-XA (above are manufactured by Kyoeisha Chemical Co., Ltd.), DIAPURESTE (registered trademark) HADM , HADA, DHADM, ADPM, ADDA (the above are made by Mitsubishi Gas Chemical Co., Ltd.), NEW FRONTIER (registered trademark) HBPE-4 (made by Daiichi Industries Pharmaceutical Co., Ltd.), CYCLOMER (registered trademark) M100 (the above are shares Co., Ltd. DAICEL). [0023] Among the compounds of the component (B), the linear alkylene group having 6 to 10 carbon atoms is selected from the group consisting of a cyclopentane structure, a cyclohexane structure, a norbornane structure, and an isofluorenyl structure. A compound having an alicyclic structure and at least one polymerizable group in a group formed by the adamantane structure and the adamantane structure, as long as the compound has a straight-chain alkylene group having 6 to 10 carbon atoms and the alicyclic structure and the polymerizable group That's all. [0024] Among the compounds of the component (B), they have a linear alkylene group having 6 to 10 carbon atoms, and are selected from the group consisting of a cyclopentane structure, a cyclohexane structure, a norbornane structure, and an isofluorenyl structure. The alicyclic structure and the compound having at least one polymerizable group in the group formed by the adamantane structure and the adamantane structure can be obtained from commercially available products. As a specific example, UM-90 (1/3) DA (Ube Kosan Co., Ltd.) system). [(C) component] The photopolymerization initiator of (C) component is not particularly limited as long as it is a light source that is used during light curing. Examples include peroxytributyl isobutylate, 2,5-dimethyl-2,5-bis (benzylidenedioxy) hexane, 1,4-bis [α- (tertiary Butyldioxy) -iso-propoxy] benzene, bis (tertiary butyl) peroxide, 2,5-dimethyl-2,5-bis (tertiary butyldioxy) hexene hydrogen Peroxide, α- (iso-propylphenyl) -iso-propyl hydroperoxide, tertiary butyl hydroperoxide, 1,1-bis (tertiary butyldioxy) -3, 3,5-trimethylcyclohexane, butyl-4,4-bis (tertiary butyldioxy) valerate, cyclohexanone peroxide, 2,2 ', 5,5'-tetra (Tertiary-butylperoxycarbonyl) benzophenone, 3,3 ', 4,4'-tetrakis (tertiary-butylperoxycarbonyl) benzophenone, 3,3', 4,4'-tetrakis (tert-pentylperoxycarbonyl) benzophenone, 3,3 ', 4,4'-tetra (tert-hexylperoxycarbonyl) benzophenone, 3,3'-bis (tertiary butyl peroxy) Oxycarbonyl) -4,4'-dicarboxybenzophenone, tert-butylperoxybenzoate, di-tert-butyldiperoxyisophthalate and other organic peroxides; 9,10 -Anthraquinone, 1-chloroanthraquinone, 2-chloroanthraquinone, octamethylanthraquinone, 1,2-benzoanthraquinone and other quinones; benzoin methyl, benzoin ethyl ether, α-methyl Benzoin derivatives such as benzoin, α-phenylbenzoin; 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-one, 2 -Hydroxy-2-methyl-1-phenyl-propane-1-one, 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propane- 1-ketone, 2-hydroxy-1- [4- ｛4- (2-hydroxy-2-methyl-propionyl) benzylpyrene-phenyl] -2-methyl-propane-1-one, benzene Methyl glyoxylate, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinylpropane-1-one, 2-benzyl-2-dimethylamino- 1- (4-morpholinylphenyl) -1-butanone, 2-dimethylamino-2- (4-methyl-benzyl) -1- (4-morpholin-4-yl-phenyl ) -Butane-1-one and other alkyl phenone compounds; bis (2,4,6-trimethylbenzyl) -phenylphosphine oxide, 2,4,6-trimethylbenzene Fluorenylphosphine oxide compounds such as methylfluorenyl-diphenyl-phosphine oxide; 2- (O-benzidineoxime) -1- [4- (phenylthio) phenyl] -1,2- Oximes such as octanedione, 1- (O-acetamoxime) -1- [9-ethyl-6- (2-methylbenzylidene) -9H-carbazol-3-yl] ethanone Esters. [0026] The above-mentioned photopolymerization initiator can be obtained from a commercial product. As specific examples thereof, IRGACURE (registered trademark) 651, 184, 500, 2959, 127, 754, 907, 369, 369, Same with 379, with 379EG, with 819, with 819DW, with 1800, with 1870, with 784, with OxE01, with OxE02, with 250, with 1173, with MBF, with 4265, and with TPO (The above is made by BASF JAPAN Co., Ltd. ), KAYACURE (registered trademark) DETX, the same MBP, the same DMBI, the same EPA, the same OA (the above is made by Nippon Kayaku Co., Ltd.), the VICURE-10, the same as 55 (the above is made by STAUFFER Co.LTD), ESACURE ( (Registered trademark) KIP150, the same TZT, the same 1001, the same KTO46, the same KB1, the same KL200, the same KS300, the same EB3, three -PMS, three A, three B (the above is made by Japan SiberHegner Co., Ltd.), ADEKA OPTOMER N-1717, same as N-1414, and N-1606 (the above is made by ADEKA Co., Ltd.). [0027] The photopolymerization initiator may be used alone or in combination of two or more. [0028] The content ratio of the (C) component in the imprint material of the present invention is, based on the total mass of the (A) component and the (B) component, for example, 0.01 phr to 30 phr, preferably 0.05 phr to 20 phr, more Preferably it is from 0.1 phr to 8 phr. When the content ratio of the component (C) is less than 0.01 phr, sufficient hardenability cannot be obtained, and the patterning characteristics are deteriorated. The term "phr" in this specification refers to the mass of a photopolymerization initiator such as the component (C) with respect to 100 g of the total mass of the component (A) and the component (B). [(D) Component] Specific examples of the compound having at least one thiol group as the (D) component include methyl thioglycolate, methyl 3-mercaptopropionate, and 3-mercaptopropionate 2- Ethylhexyl ester, 3-Mercaptopropionate 3-methoxybutyl ester, 3-Mercaptopropionate n-octyl ester, 3-Mercaptopropionate stearyl ester, 1,4-bis (3-mercaptopropionyl (Oxy) butane, 1,4-bis (3-mercaptobutyryloxy) butane, trimethylolethane (3-mercaptopropionate), trimethylolethane (3-mercaptobutyl) Acid ester), trimethylolpropane (3-mercaptopropionate), trimethylolpropane (3-mercaptobutyrate), pentaerythritol (3-mercaptopropionate), pentaerythritol (3-mercaptopropionate) (Mercaptobutyrate), dipentaerythritol (3-mercaptopropionate), dipentaerythritol (3-mercaptobutyrate), and [2- (3-mercaptopropionyloxy) ethyl] heterotrimer Cyanate ester, tetraethylene glycol bis (3-mercaptopropionate), ginseng [2- (3-mercaptobutyryloxy) ethyl] isotricyanate, 1,3,5-ginseng (3- Mercaptobutylammonyloxyethyl) -1,3,5-tri -2,4,6- (1H, 3H, 5H) -trione and other mercaptocarboxylic acid esters; ethanethiol, 2-methylpropane-2-thiol, n-dodecanethiol, 2 , 3,3,4,4,5-hexamethylhexane-2-thiol (tert-dodecanethiol), ethane-1,2-dithiol, propane-1,3-disulfide Alkyl mercaptans such as alcohols, benzyl mercaptan; benzene mercaptan, 3-methylbenzene mercaptan, 4-methylbenzene mercaptan, naphthalene-2-thiol, pyridine-2-thiol, benzo Aromatic thiols such as imidazole-2-thiol and benzothiazole-2-thiol; mercapto alcohols such as 2-mercaptoethanol and 4-mercapto-1-butanol; 3- (trimethoxysilyl group) ) Silanes such as propane-1-thiol, 3- (triethoxysilyl) propane-1-thiol, etc. contain thiols; bis (2-mercaptoethyl) ether. [0030] The compound having at least one thiol group can be obtained from a commercial product. As specific examples thereof, THIOKALCOL (registered trademark) 20 (manufactured by Kao Corporation), Karenz MT (registered trademark) PE1, same as BD1 Same as NR1, TPMB, TEMB (the above are manufactured by Showa Denko Corporation). [0031] The component (D) in the imprint material of the present invention may be used alone or in combination of two or more. The content ratio is, for example, 0.01 phr to 30 phr, and more preferably 0.05 phr to 20 phr, based on the total mass of the component (A) and the component (B). [(E) component] As the antioxidant of the (E) component, phenol-based antioxidants, phosphoric acid-based antioxidants, sulfide-based antioxidants, and the like can be exemplified. Among them, phenol-based antioxidants are preferred. Examples of the phenol-based antioxidant include IRGANOX (registered trademark) 245, 1010, 1035, 1076, 1135 [The above are manufactured by BASF JAPAN Co., Ltd.], SUMILIZER (registered trademark) GA-80, and GP, Same as MDP-S, same as BBM-S, same as WX-R [the above is made by Sumitomo Chemical Co., Ltd.], ADEKA Stub (registered trademark) AO-20, same AO-30, same AO-40, same AO-50, Same as AO-60, same AO-80, same AO-330 [The above is made by ADEKA Co., Ltd.]. [0033] The component (E) in the imprint material of the present invention may be used alone or in combination of two or more. The content ratio is, for example, 0.01 phr to 20 phr, and more preferably 0.05 phr to 10 phr, based on the total mass of the (A) component and the (B) component. [(F) component] Examples of the surfactant of the (F) component include polyoxyethylene lauryl ether, polyoxyethylene octadecyl ether, polyoxyethylene cetyl ether, and polyoxyethylene oil. Polyoxyethylene alkyl ethers such as ethers, polyoxyethylene alkyl aryl ethers such as polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene and polyoxypropylene block copolymerization Species, sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, Sorbitan fatty acid esters such as sorbitan tristearate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbitan monosorbate Nonionic surfactants such as stearates, polyoxyethylene sorbitan trioleate, and polyoxyethylene sorbitan fatty acid esters, such as polyoxyethylene sorbitan tristearate. [0035] The above surfactants can be obtained from commercially available products. As specific examples thereof, EFTOP (registered trademark) EF301, same EF303, and EF352 (the above are made by Mitsubishi Materials Electronics Corporation), MEGAFACE (registered trademark) F-171, same as F-173, same as F-477, same as F-486, same as F-554, same as F-556, same as R-08, same as R-30, same as R-30N, R-40, R- 40-LM, same as RS-56, same as RS-75, same as RS-72-K, same as RS-76-E, same as RS-76-NS, same as RS-78, same as RS-90 Company), Fluorad FC430, same as FC431 (the above is made by 3M JAPAN Co., Ltd.), AsahiGuard (registered trademark) AG710, Surflon (registered trademark) S-382, same SC101, same SC102, same SC103, same SC104, same SC105 Fluorine surfactants like SC106 (above manufactured by Asahi Glass Co., Ltd.), etc .; and organosiloxane polymer KP341 (made by Shin-Etsu Chemical Industry Co., Ltd.), BYK-302, BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-370, BYK-375, BYK-378, BYK-UV 3500, BYK-UV 3570 (the above are manufactured by BYK Japan Co., Ltd.). [0036] The component (F) in the imprint material of the present invention may be used alone or in combination of two or more. The content ratio is preferably 0.01 phr to 40 phr, and more preferably 0.01 phr to 10 phr, based on the total mass of the components (A) and (B). [(G) component] The imprint material of the present invention may contain a solvent as the (G) component. This solvent has the function of adjusting the viscosity of the component (A) and the component (B). [0038] Examples of the solvent include toluene, p-xylene, o-xylene, styrene, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, ethylene glycol monomethyl ether, and propylene glycol monoethyl ether. Ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol methyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, two Ethylene glycol dimethyl ether, propylene glycol monobutyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, dipropylene glycol monomethyl ether, diethylene glycol monomethyl ether, dipropylene glycol mono Ethyl ether, diethylene glycol monoethyl ether, triethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol, 1-octanol, ethylene glycol, hexyl Glycol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, propylene glycol, benzyl alcohol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, γ-butyrolactone, acetone , Methyl ethyl ketone, methyl isopropyl ketone, diethyl ketone, methyl isobutyl ketone, methyl n-butyl ketone, cyclohexanone, 2-heptanone, ethyl acetate, isopropyl acetate Ester, n-propyl acetate, isobutyl acetate, n-butyl acetate, milk Ethyl acetate, ethyl pyruvate, methanol, ethanol, isopropanol, tert-butanol, allyl alcohol, n-propanol, 2-methyl-2-butanol, isobutanol, n-butanol, 2 -Methyl-1-butanol, 1-pentanol, 2-methyl-1-pentanol, 2-ethylhexanol, trimethylene glycol, 1-methoxy-2-butanol, isopropyl Ether, 1,4-di Alkane, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, di Methyl sulfene and N-cyclohexyl-2-pyrrolidine are not particularly limited as long as the viscosity of the components (A) and (B) can be adjusted. [0039] These solvents may be used alone or in combination of two or more. When a solvent is used, the full composition of the imprint material of the present invention is defined as the solid content of the solvent that removes the (G) component from the full content of the components (A) to (F) and other additives described below, 50% to 99% by mass, more preferably 70% to 99% by mass. [Other additives] As long as the imprint material of the present invention does not impair the effect of the present invention, it may contain a material selected from the group consisting of a polymer compound, an epoxy compound, a photoacid generator, a photosensitizer, an ultraviolet absorber, and a chain transfer. Additives in the group of agents, adhesion aids and release improvers. [0041] In order to adjust the refractive index or Abbe number without impairing transparency, the above-mentioned polymer compound may be added. As the polymer compound, it is preferable to have a repeating structural unit represented by the following formula (2). The content ratio is preferably 0.1% by mass to 90% by mass based on the total mass of the component (A), (B), and the polymer compound, and more preferably 5% by mass to 70% by mass. (Where, R ₁ Represents a hydrogen atom or a methyl group, and X represents an alicyclic structure selected from the group consisting of a cyclopentane structure, a cyclohexane structure, a norbornane structure, an isofluorenyl structure, an adamantane structure, and a tricyclodecane structure. Organic group). [0042] As the epoxy compound, for example, EPOLEAD (registered trademark) GT-401, the same PB3600, CELLOXIDE (registered trademark) 2021P, the same 2000, the same 3000, EHPE3150, the same EHPE3150CE (the above is made by DAICEL Co., Ltd.) , EPICLON (registered trademark) 840, same as 840-S, same as N-660, same as N-673-80M (the above is made by DIC Corporation). [0043] Examples of the photoacid generator include IRGACURE (registered trademark) PAG103, PAG108, PAG121, PAG203, and CGI725 (the above are manufactured by BASF JAPAN Co., Ltd.), WPAG-145, WPAG-170, WPAG-199, WPAG-281, WPAG-336, WPAG-367 (The above are manufactured by Wako Pure Chemical Industries, Ltd.), TFE three , TME-three MP-Three Dimethoxytri , TS-91, TS-01 (manufactured by Sanwa Chemical Co., Ltd.), CPI-100P, CPI-101A, CPI-200K, CPI-110P, 210S, CPI-110P, CPI-110B (The above are San-Apro shares Limited company). [0044] Examples of the photosensitizer include thioxanthine, thioxanthone, dibenzopiperan, ketone, thiopyrylium salt, basic styryl, and merocyanine. Prime, 3-substituted coumarin, 3,4-substituted coumarin, cyanine, acridine, thiazine, phenothiazine, anthracene, coronene , Benzoanthracene-based, Amidine-based, Ketocoumarin-based, Coumarin-based, Borate-based. The above photosensitizers can be obtained from commercially available products. As specific examples, ANTHRACURE (registered trademark) UVS-581, the same UVS-1331 (the above is made by Kawasaki Chemical Industry Co., Ltd.), KAYACURE (registered trademark) DETX-S ( (Made by Nippon Kayaku Co., Ltd.). This photosensitizer can be used individually by 1 type or in combination of 2 or more types. By using this photosensitizer, the absorption wavelength in the UV region can be adjusted. [0045] As the ultraviolet absorber, for example, TINUVIN (registered trademark) PS, same 99-2, same 109, same 328, same 384-2, same 400, same 405, same 460, same 477, same 479, Same 900, same 928, same 1130, same 111FDL, same 123, same 144, same 152, same 292, same 5100, same 400-DW, same 477-DW, same 99-DW, same 123-DW, same 5050, Same as 5060 and 5151 (The above are made by BASF JAPAN Co., Ltd.). This ultraviolet absorber can be used individually by 1 type or in combination of 2 or more types. By using the ultraviolet absorber, the hardening speed of the film's outermost surface during photocuring of the imprint material of the present invention can be controlled, and the release property may be improved. [0046] Examples of the chain transfer agent include diethyl disulfide, dipropyl disulfide, diisopropyl disulfide, dibutyl disulfide, and di-tertiary butyl disulfide. , Dipentyl disulfide, diisopentyl disulfide, dihexyl disulfide, dicyclohexyl disulfide, didecyl disulfide, bis (2,3,3,4,4,5- Hexamethylhexane-2-yl) disulfide (di-tert-dodecyl disulfide), bis (2,2-diethoxyethyl) disulfide, bis (2-hydroxyethyl) Alkyl) disulfides such as disulfide, dibenzyl disulfide; diphenyl disulfide, di-p-tolyl disulfide, bis (pyridin-2-yl) pyridyl disulfide Aromatic disulfides such as compounds, bis (benzimidazol-2-yl) disulfide, bis (benzothiazol-2-yl) disulfide, etc .; tetramethylthionam disulfide, tetraethyl Thiulan disulfides such as thiosulfame disulfide, tetrabutylsulfame disulfide, bis (pentamethylene) sulfame disulfide, etc .; α-methylstyrene dimer . This chain transfer agent can be used individually by 1 type or in combination of 2 or more types. [0047] Examples of the adhesion adjuvant include 3-methacryloxypropyltrimethoxysilane and 3-propenyloxypropyltrimethoxysilane. By using this adhesion adjuvant, the adhesiveness with a base material improves. The content of the adhesion adjuvant is preferably 5 to 50 phr, and more preferably 10 to 50 phr, based on the total mass of the components (A) and (B). [0048] Examples of the release improver include a fluorine-containing compound. Examples of the fluorine-containing compound include R-5410, R-1420, M-5410, M-1420, E-5444, E-7432, A-1430, and A-1630 (the above are manufactured by Daikin Industry Co., Ltd.) . [Preparation of the imprint material] Although the method for preparing the imprint material of the present invention is not particularly limited, (A) component, (B) component, (C) component, and (D) component of any component, The (E) component, (F) component, (G) component, and other additives as desired, as long as the imprint material is in a uniform state. The order of mixing the components (A) to (G) and other additives as desired is not particularly limited as long as there is no problem in obtaining a uniform imprint material. Examples of the method for preparing the imprint material include, for example, mixing the (A) component and the (B) component at a specific ratio, and further appropriately mixing the (C) component and any (D) component, ( E) component, (F) component, and (G) component, and a method for making a uniform imprint material. Furthermore, in a suitable stage of the preparation method, a method of adding and mixing other additives may be further exemplified. [Photo-imprinted and Pattern-Transfered Film] The imprint material of the present invention can be coated with a substrate and photocured to obtain a desired film. Examples of the coating method include publicly known or well-known methods such as a spin coating method, a dipping method, a flow coating method, an inkjet method, a spray method, a bar coating method, a gravure coating method, a slit coating method, Roller coating method, transfer printing method, bristle coating method, doctor blade coating method, air knife coating method. [0051] As a base material for coating the imprint material of the present invention, for example, glass (ITO substrate) made of silicon, indium tin oxide (ITO), and silicon nitride (SiN) can be exemplified. Film-formed glass (SiN substrate), indium-zinc oxide (IZO) film-formed glass, polyethylene terephthalate (PET), triethyl cellulose (TAC), acrylic , Plastic, glass, quartz, ceramics, etc. Also, a flexible substrate having flexibility, such as triethyl cellulose, polyethylene terephthalate, polymethyl methacrylate, cyclic olefin (co) polymer, polyethylene, can also be used. Alcohol, polycarbonate, polystyrene, polyimide, polyimide, polyolefin, polypropylene, polyethylene, polyethylene naphthalate, polyether, and copolymers combining these polymers Made of substrate. [0052] Although the light source for photo-hardening the imprint material of the present invention is not particularly limited, examples thereof include high-pressure mercury lamps, low-pressure mercury lamps, electrodeless lamps, metal halide lamps, KrF excimer lasers, and ArF excimer lasers. , F ₂ Excimer laser, electron beam (EB), extreme ultraviolet (EUV), ultraviolet LED (UV-LED). In general, the wavelength can be a G-line of 436 nm, an H-line of 405 nm, an I-line of 365 nm, or a GHI mixed line. Furthermore, the exposure amount is preferably 30 mJ / cm ² Up to 2000mJ / cm ² , More preferably 30mJ / cm ² Up to 1000mJ / cm ² . [0053] When the solvent of the component (G) is used, a firing step may be added to at least one of the coating film before light irradiation and the cured product after light irradiation for the purpose of evaporating the solvent. The firing machine is not particularly limited, and it is sufficient to use, for example, a heating plate, an oven, a furnace, and firing under a suitable atmosphere, that is, an inert gas such as the atmosphere or nitrogen, or in a vacuum. The firing temperature is not particularly limited for the purpose of evaporating the solvent, but it may be performed at, for example, 40 ° C to 200 ° C. [0054] Since the pattern-transferred film made using the imprint material of the present invention, for example, even a thick film having a thickness of 1 mm has high transparency in the visible light region, and further exhibits a high refractive index and Abbe number, it is suitable It is used as an optical article such as a lens for a camera module or a resin mold for imprint. [0055] The device for performing photoimprinting is not particularly limited as long as the target pattern can be obtained, but it can be used, for example, ST50 manufactured by Toshiba Machinery Co., Ltd., Sindre (registered trademark) manufactured by Obducat 60, Mingchang A commercially available device such as NM-0801HB manufactured by Mechanical Engineering Co., Ltd. is a method in which the substrate and the mold are pressure-bonded by rollers, and the cured product is stripped from the mold after light curing. [0056] In addition, examples of the mold material used for photoimprint used in the present invention include quartz, silicon, nickel, aluminum oxide, carbonylsilane, and glassy carbon, but as long as the target pattern can be obtained, There is no particular limitation. In addition, in order to improve the mold release property, a mold release treatment for forming a thin film such as a fluorine-based compound on the surface may be performed. Examples of the release agent used for the release treatment include OPTOOL (registered trademark) HD manufactured by Daikin Industries Co., Ltd. and DSX, and there is no particular limitation as long as the target pattern can be obtained. [0057] The pattern size of the light imprint in the present invention is not particularly limited, and for example, good patterns can be obtained at the nanometer level, the micrometer level, and the millimeter level. [Examples] Although the present invention will be described in more detail with reference to examples and comparative examples below, the present invention is not limited to these examples. [0059] The weight average molecular weights of the polymers shown in Synthesis Examples 1 and 2 described later are based on the measurement results by gel permeation chromatography (hereinafter, referred to as “GPC” in this specification). For the measurement, a GPC system manufactured by Shimadzu Corporation was used. The configuration and measurement conditions of this GPC system are as follows. GPC system configuration system controller: CBM-20A, column oven: CTO-20, automatic sampler: SIL-10AF, detector: SPD-20A and RID-10A, exhaust unit: DGU-20A3 GPC column: Shodex (Registered trademark) KF-804L and KF-803L column temperature: 40 ℃ Solvent: tetrahydrofuran Flow rate: 1mL / min Standard sample: Polystyrene 6 with different weight average molecular weight (197000, 55100, 12800, 3950, 1260, 580) [0060] <Synthesis Example 1> Tricyclic [5.2.1.0 ^2,6 ] Decanedimethanol 9.18g, 2-hydroxyethyl acrylate 2.72g, 2,6-di-t-butyl-p-cresol 0.013g, dibutyltin dilaurate 0.019g and ethyl acetate 37.4 g Put into a three-necked flask and heat to 80 ° C. Over a period of 3 hours, 13.00 g of isophorone diisocyanate was added dropwise thereto, and allowed to react at 80 ° C. for 12 hours. After the reaction solution was cooled to room temperature, it was put into hexane, and the precipitated solid was recovered, and dried under the conditions of 40 ° C and 1 mmHg to obtain compound G1. The obtained G1 corresponds to the component (B), and the weight average molecular weight measured by GPC was 3610. [0061] <Synthesis Example 2> 34.58 g of propylene glycol monomethyl ether acetate (hereinafter, referred to as "PGMEA" in the present specification) was placed in a three-necked flask, degassed and replaced with nitrogen, and then heated to 90 ° C. It took 3 hours to dropwise inject 1-ADMA (manufactured by Osaka Organic Chemical Industry Co., Ltd.) (hereinafter, referred to as "ADMA" in the present specification) 20.00 g, 0.75 g of azobisisobutyronitrile, and 48.41 g of PGMEA uniformly. The solution was allowed to react at 90 ° C for 24 hours. After the reaction solution was cooled to room temperature, the reaction solution was put into methanol, and the precipitated solid was recovered and dried under vacuum at 80 ° C to obtain compound G2. The obtained G2 corresponds to the polymer compound in the other additives described above, and the weight average molecular weight measured by GPC was 11,322. [Modulation of embossed material] <Example 1> Hybrid NK ESTER A-DOG (hereinafter, abbreviated as "A-DOG" in this specification) (made by Shin Nakamura Chemical Industry Co., Ltd.) 1g and UM-90 ( 1/3) DA (made by Ube Industrial Co., Ltd.) 9g, IRGACURE (registered trademark) 184 (made by BASF JAPAN Co., Ltd.) (hereinafter, referred to as "IRGACURE 184" in this specification) 0.2g ( Compared to A-DOG and UM-90 (1/3) DA, the total mass is 2phr), and the embossing material PNI-a1 is prepared. Example 2 2 g of A-DOG and 8 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a2 is modulated. [Example 3] 3 g of A-DOG and 7 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a3 is modulated. [Example 4] 4 g of A-DOG and 6 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a4 is modulated. Example 5 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a5 is modulated. [Example 6] 6 g of A-DOG and 4 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a6 is modulated. Example 7 7 g of A-DOG and 3 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a7 is modulated. Example 8 8 g of A-DOG and 2 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a8 is modulated. [Example 9] 9 g of A-DOG and 1 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), and the embossing material PNI-a9 is prepared. [Example 10] 1 g of A-DOG and 9 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2phr), THIOKALCOL (registered trademark) 20 (made by Kao Corporation) (hereinafter, referred to as "THIOKALCOL 20" in this manual) 0.05g (compared to A-DOG, UM-90 (1/3) DA The total mass is 0.5 phr), and the embossing material PNI-a10 is prepared. [Example 11] 2 g of A-DOG and 8 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2phr), THIOKALCOL 20 0.05g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5phr), and the embossing material PNI-a11 is prepared. [Example 12] 3 g of A-DOG and 7 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2phr), THIOKALCOL 20 0.05g (compared to A-DOG, UM-90 (1/3) DA total mass is 0.5phr), and the embossing material PNI-a12 is prepared. Example 13 4 g of A-DOG and 6 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), THIOKALCOL 20 0.05 g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5 phr), and the embossing material PNI-a13 is prepared. [Example 14] 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), THIOKALCOL 20 0.05 g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5 phr), and the embossing material PNI-a14 is prepared. Example 15 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2phr), Karenz MT (registered trademark) PE1 (manufactured by Showa Denko Corporation) (hereinafter, referred to as "Karenz MT PE1" in this manual) 0.05g (vs. A-DOG, UM-90 (1 / 3) The total mass of DA is 0.5phr), and the embossing material PNI-a15 is prepared. [Example 16] 6 g of A-DOG and 4 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), THIOKALCOL 20 0.05 g (compared to A-DOG, UM-90 (1/3) DA total mass is 0.5 phr), and the embossing material PNI-a16 is prepared. [Example 17] 7 g of A-DOG and 3 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), THIOKALCOL 20 0.05 g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5 phr), and the embossing material PNI-a17 is prepared. [Example 18] 8 g of A-DOG and 2 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), THIOKALCOL 20 0.05 g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5 phr), and the embossing material PNI-a18 is prepared. [Example 19] 9 g of A-DOG and 1 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2 phr), THIOKALCOL 20 0.05 g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5 phr), and the embossing material PNI-a19 is prepared. [Example 20] 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. Total mass is 2phr), THIOKALCOL 20 0.05g (compared to A-DOG, UM-90 (1/3) DA total mass is 0.5phr), ADEKA Stub (registered trademark) AO-60 (made by ADEKA Co., Ltd.) ) 0.01g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.1phr), and embossing material PNI-a20 was prepared. [Example 21] 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. Total mass is 2phr), THIOKALCOL 20 0.05g (compared to A-DOG, UM-90 (1/3) DA total mass is 0.5phr), ADEKA Stub (registered trademark) AO-80 (made by ADEKA Co., Ltd. ) 0.01g (compared to A-DOG, UM-90 (1/3) DA total mass is 0.1phr), and the imprint material PNI-a21 was prepared. [Example 22] 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. Total mass is 2phr), THIOKALCOL 20 0.05g (compared to A-DOG, UM-90 (1/3) DA total mass is 0.5phr), BYK-UV 3570 (by BYK Japan Co., Ltd.) 0.01g ( Compared with A-DOG and UM-90 (1/3) DA, the total mass is 0.1phr), and the embossing material PNI-a22 is prepared. [Example 23] 5 g of A-DOG and 5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, UM-90 (1/3) DA was added to the mixture. The total mass is 2phr), THIOKALCOL 20 0.05g (compared with A-DOG, UM-90 (1/3) DA total mass is 0.5phr), PGMEA 1.139g, and the embossing material PNI-a23 is prepared. [Reference Example 24] 5 g of A-DOG and NK ESTER A-DCP (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) (hereinafter, referred to as "A-DCP" in the present specification) 5 g were mixed, and IRGACURE was added to the mixture. 184 0.2g (total mass of A-DOG, A-DCP is 2phr), THIOKALCOL 20 0.05g (total mass of A-DOG, A-DCP is 0.5phr), embossing material PNI-a24 is prepared. [Example 25] 5 g of A-DOG and 5 g of ADMA were mixed, and IRGACURE 184 0.2 g (2 phr with respect to A-DOG and ADMA) was added to the mixture, and THIOKALCOL 20 0.05 g (with respect to A- The total mass of DOG and ADMA is 0.5phr), and the embossing material PNI-a25 is modulated. [Example 26] 5 g of A-DOG and 5 g of IBXA (manufactured by Osaka Organic Chemical Industry Co., Ltd.) were mixed, and IRGACURE 184 0.2 g was added to the mixture (2 phr with respect to the total mass of A-DOG and IBXA) , THIOKALCOL 20 0.05g (relative to the total mass of A-DOG and IBXA is 0.5phr), and the embossing material PNI-a26 is prepared. [Example 27] 5 g of A-DOG 5 g and NEW FRONTIER (registered trademark) HBPE-4 (manufactured by Daiichi Kogyo Co., Ltd.) (hereinafter, referred to as "HBPE-4" in this specification) 5 g Add IRGACURE 184 0.2g (2phr relative to the total mass of A-DOG and HBPE-4), 0.05g THIOKALCOL 20 (0.5phr relative to the total mass of A-DOG and HBPE-4) in the mixture to prepare the imprint material PNI-a27. [Example 28] 5 g of A-DOG and 5 g of Viscoat # 230 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) (hereinafter, referred to as "V # 230" in this specification) were mixed, and IRGACURE 184 0.2 was added to the mixture. g (total mass of A-DOG, V # 230 is 2phr), THIOKALCOL 20 0.05g (total mass of A-DOG, V # 230 is 0.5phr), and the embossing material PNI-a28 is prepared. [Example 29] 5 g of A-DOG and Viscoat # 260 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) (hereinafter, referred to as "V # 260" in the present specification) 5 g were mixed, and IRGACURE 184 0.2 was added to the mixture. g (total mass of A-DOG, V # 260 is 2phr), THIOKALCOL 20 0.05g (total mass of A-DOG, V # 260 is 0.5phr), and the embossing material PNI-a29 is prepared. [Example 30] 5 g of A-DOG, 2.5 g of ADMA, and 2.5 g of UM-90 (1/3) DA were mixed, and IRGACURE 184 0.2 g (vs. A-DOG, ADMA, UM- 90 (1/3) DA total mass is 2phr), THIOKALCOL 20 0.05g (compared to A-DOG, ADMA, UM-90 (1/3) DA total mass is 0.5phr), modulation embossing material PNI- a30. [Example 31] 5 g of A-DOG, 2.5 g of ADMA, and 2.5 g of HBPE-4 were added, and IRGACURE 184 0.2 g was added to the mixture (relative to the total mass of A-DOG, ADMA, and HBPE-4 of 2 phr) ), THIOKALCOL 20 0.05g (0.5 phr relative to the total mass of A-DOG, ADMA, and HBPE-4), and the embossing material PNI-a31 is prepared. [Example 32] 5 g of A-DOG, 2.5 g of ADMA, and 2.5 g of G1 obtained in Synthesis Example 1 were added to this mixture, and IRGACURE 184 0.2 g (relative to the total mass of A-DOG, ADMA, and G1 was 2phr), THIOKALCOL 20 0.05g (0.5 phr relative to the total mass of A-DOG, ADMA, and G1), and the embossing material PNI-a32 was prepared. [Example 33] 5 g of A-DOG, 2.5 g of ADMA, and 2.5 g of G2 obtained in Synthesis Example 2 were added, and IRGACURE 184 0.2 g was added to the mixture (relative to the total mass of A-DOG, ADMA, and G2 as 2phr), THIOKALCOL 20 0.05g (0.5 phr relative to the total mass of A-DOG, ADMA, and G2), and the embossing material PNI-a33 was prepared. [Example 34] 7 g of A-DOG and 3 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g was added to the mixture (relative to the total mass of A-DOG and HBPE-4 was 0.1 phr) to prepare an imprint material. PNI-a34. [Example 35] 6 g of A-DOG and 4 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g was added to the mixture (relative to the total mass of A-DOG and HBPE-4 was 0.1 phr) to prepare an imprint material PNI-a35. [Example 36] 5 g of A-DOG and 5 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g was added to the mixture (relative to the total mass of A-DOG and HBPE-4 was 0.1 phr) to prepare an imprint material PNI-a36. [Example 37] 4 g of A-DOG and 6 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g was added to the mixture (relative to the total mass of A-DOG and HBPE-4 was 0.1 phr) to prepare an imprint material PNI-a37. [Example 99] 3 g of A-DOG and 7 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g was added to the mixture (relative to the total mass of A-DOG and HBPE-4 was 0.1 phr) to prepare an imprint material PNI-a38. [Example 100] 5 g of A-DOG and 5 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g (0.1 phr relative to the total mass of A-DOG and HBPE-4) was added to the mixture, and THIOKALCOL 20 0.05 g (Compared to the total mass of A-DOG and HBPE-4 is 0.5 phr), the imprint material PNI-a39 is prepared. <Example 40> 5 g of A-DOG and 5 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g (0.1 phr relative to the total mass of A-DOG and HBPE-4) was added to the mixture, and Karenz MT PE1 0.05 g (Compared to the total mass of A-DOG and HBPE-4 is 0.5phr), and the embossing material PNI-a40 is prepared. [Example 41] 5 g of A-DOG and 5 g of HBPE-4 were mixed, and IRGACURE 184 0.01 g (0.1 phr relative to the total mass of A-DOG and HBPE-4) was added to the mixture, and Karenz MT (registered Trademark) NR1 (manufactured by Showa Denko Co., Ltd.) 0.05 g (0.5 phr relative to the total mass of A-DOG and HBPE-4), and the embossing material PNI-a41 is prepared. [Comparative Example 1] 10 g of A-DOG and 0.2 g of IRGACURE 184 (2 phr relative to the mass of A-DOG) were added to prepare an imprint material PNI-b1. The embossing material of this comparative example contains (A) component and (C) component, but does not contain (B) component. [Comparative Example 2] UM-90 (1/3) DA 10g and IRGACURE 184 0.2g (mass of 2 phr with respect to UM-90 (1/3) DA) were added to prepare an embossing material PNI-b2. The embossing material of this comparative example contains (B) component and (C) component, but does not contain (A) component. [Comparative Example 3] 10 g of ADMA and 0.2 g of IRGACURE 184 (2 phr relative to the mass of ADMA) were added to prepare an imprint material PNI-b3. The embossing material of this comparative example contains (B) component and (C) component, but does not contain (A) component. [Comparative Example 4] 10 g of V # 230 and 0.2 g of IRGACURE 184 (2 phr mass with respect to V # 230) were added to prepare an imprint material PNI-b4. The embossing material of this comparative example contains (B) component and (C) component, but does not contain (A) component. [Comparative Example 5] 5 g of A-DOG and 5 g of KAYARAD (registered trademark) NPGDA (manufactured by Nippon Kayaku Co., Ltd.) (hereinafter, referred to as "NPGDA" in this specification) were mixed, and IRGACURE 184 0.2 was added to the mixture. g (2phr relative to the total mass of A-DOG and NPGDA), to modulate the imprint material PNI-b5. Since the NPGDA used in this comparative example does not conform to the (B) component, the imprint material of this comparative example includes the (A) component and the (C) component, but does not include the (B) component. [Comparative Example 6] 5 g of A-DOG and 5 g of NPGDA were mixed, and IRGACURE 184 0.2 g (2 phr with respect to the total mass of A-DOG and NPGDA), and THIOKALCOL 20 0.05 g (with respect to A- The total mass of DOG and NPGDA is 2phr), and the embossing material PNI-b6 is modulated. Since the NPGDA used in this comparative example does not conform to the (B) component, the imprint material of this comparative example contains the (A) component, the (C) component, and the (D) component, but does not include the (B) component. [Comparative Example 7] 5 g of A-DOG and NK ESTER APG-400 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.) (hereinafter referred to as "APG-400") 5 g were mixed, and IRGACURE 184 was added to the mixture. 0.2g (2phr relative to the total mass of A-DOG and APG-400), the embossing material PNI-b7 is prepared. Since the APG-400 used in this comparative example does not conform to the (B) component, the imprint material of this comparative example contains the (A) component and the (C) component, but does not include the (B) component. [Comparative Example 8] 5 g of A-DOG and 5 g of APG-400 were mixed, and IRGACURE 184 0.2 g (2 phr with respect to the total mass of A-DOG and APG-400) was added to the mixture, and THIOKALCOL 20 0.05 g ( Relative to the total mass of A-DOG and APG-400 is 2phr), and the embossing material PNI-b8 is prepared. Since the APG-400 used in this comparative example does not conform to the (B) component, the imprint material of this comparative example contains the (A) component, the (C) component, and the (D) component, but does not include the (B) component. [0115] [Removal treatment of mold] A silicon mold having a line and space pattern of 20 μm (hereinafter referred to as L / S) was immersed in an OPTOOL (registered trademark) DSX (manufactured by Daikin Industry Co., Ltd.) Novec (registered trademark) HFE-7100 (hydrofluoroether, manufactured by 3M JAPAN Co., Ltd.) (hereinafter, referred to as "Novec HFE-7100" in this specification) diluted to a solution of 0.1% by mass, with a use temperature of 90 ° C and humidity A high-temperature and high-humidity device at 90 RH% is treated for 1 hour. After being cleaned with Novec HFE-7100, it is dried with air. [Light Imprint] Each of the imprint materials obtained in Examples 1 to 23, Examples 25 to 41, Reference Example 24, and Comparative Examples 1 to 8 was filled with the aforementioned material. The film-treated mold was covered with quartz glass, and was subjected to photo-imprinting with a nano-imprinting apparatus NM-0801HB (manufactured by Ming Chang Institution Co., Ltd.). Light embossing, at 23 ° C, a) pressurizing to 500N in 10 seconds, b) 6000mJ / cm using high pressure mercury lamp ² Exposure, c) it took 10 seconds to remove the pressure, d) separating the mold from the substrate in order to remove the film, and heating the L / S pattern on the resulting quartz glass to a heating plate at 170 ° C. for 5 minutes. Then, using an industrial microscope ECLIPSE L150 (manufactured by Nikon Co., Ltd.), the presence or absence of peeling or cracking of the L / S pattern was observed. The obtained results are shown in Tables 1 and 2. [Production of hardened material and evaluation of optical characteristics] Each of the imprint materials obtained in Examples 1 to 23, Examples 25 to 41, Reference Example 24, and Comparative Examples 1 to 8 was compared with A 1-mm-thick separator made of silicone rubber was sandwiched by two glass substrates which were surface-treated with Novec (registered trademark) 1720 (manufactured by 3M JAPAN Co., Ltd.). The sandwiched polymerizable composition was 20 mW / cm using a batch-type UV irradiation device (high-pressure mercury lamp 2 kW x 1 lamp) (manufactured by EYE GRAPHICS). ² UV exposure was performed for 300 seconds. After peeling the obtained hardened | cured material from a glass substrate, it heated on the heating plate at 170 degreeC for 5 minutes, and produced the compact of 40 mm in diameter and 1 mm in thickness. Using a spectrophotometer UV2600 (manufactured by Shimadzu Corporation), the transmittance of 410 nm of the formed body was measured with the reference value set to air. The refractive index n at a wavelength of 589.3 nm (D-line) was measured using an automatic inflection meter (multi-wavelength) Abbemat-WR / MW (manufactured by Anton Paar). _D Abbe number ν _D . The obtained results are shown in Table 1, Table 2 and Table 3. [0114] [0115] [0116] [0117] From the results shown in Table 1, Table 2 and Table 3, the following results were obtained: it was confirmed that the formed bodies produced using the embossing materials prepared in Examples 1 to 23 and 25 to 41 were formed. All of them have a high transparency of more than 90% even at a thickness of 410nm at a thickness of 1mm, a high refractive index with a wavelength of 589.3nm (D line) of 1.49 or more, and a high Abbe number of 56 or more. On the other hand, the molded bodies produced using the imprint materials prepared in Comparative Examples 1 to 8 have the following results: the transmittances at 410 nm are all lower than 90%, and the transparency is low. Moreover, the refractive indexes of Comparative Examples 2 to 8 were all lower than 1.49, or the Abbe number was less than 56, and it was confirmed that the high refractive index and the high Abbe number were not exhibited at the same time. As described above, the shape produced using the imprint material of the present invention has a high transparency in the visible light region, and has a high refractive index and a high Abbe number at the same time.

Claims (14)

An imprint material containing the following components (A), (B), and (C), (A): a compound represented by the following formula (1) (In the formula, two R's each independently represent a hydrogen atom or a methyl group); (B): a linear alkylene group having 6 to 10 carbon atoms and / or selected from the group consisting of a cyclopentane structure, a cyclohexane structure, An alicyclic structure in a group formed by a norbornane structure, an isofluorenyl structure, and an adamantane structure, and a compound having at least one polymerizable group; (C): a photopolymerization initiator. The imprint material according to claim 1, wherein the aforementioned polymerizable group is acrylfluorenyloxy, methacrylfluorenyloxy, vinyl or allyl. For example, the embossed material of claim 1 or claim 2, wherein the number of the aforementioned polymerizable groups is one or two. If the embossed material of any one of claim 1 to claim 3, wherein the ratio of the (A) component is 10% by mass to 100% by mass of the total mass of the (A) component and the (B) component 90% by mass. The imprinted material according to any one of claim 1 to claim 4, further comprising a compound having at least one thiol group as the (D) component. The imprinted material according to any one of claim 1 to claim 5, further comprising an antioxidant as the (E) component. The imprint material according to any one of claim 1 to claim 6, further comprising a surfactant as the (F) component. The imprint material according to any one of claim 1 to claim 7, further comprising a solvent as the (G) component. A pattern-transferred film is produced using an imprint material according to any one of claim 1 to claim 8. For example, if the pattern of the item 9 is transferred with a patterned film, the aforementioned pattern is a lens shape. For example, the pattern-transferred film of claim 9 or claim 10, wherein the pattern-transferred film is a lens for a camera module. For example, the pattern-transferred film according to any one of claim 9 to claim 11, wherein the maximum film thickness of the pattern-transferred film is 1.5 mm. A method for producing a pattern-transferred film, comprising: filling an embossing material according to any one of claim 1 to claim 8 into a space between a bonded substrate and a mold, or a separable mold A step of the internal space; and a step of photo-hardening the imprint material filled in the space. For example, the method for making a pattern-transferred film according to claim 13 includes: a step of removing the obtained light-cured material and removing the film after the aforementioned light-curing step; and The heating step is performed before, during or after.