TW201815865A - Epoxy resin composition, B stage sheet, cured epoxy resin composition, resin sheet, metal foil with resin, and metal substrate - Google Patents
Epoxy resin composition, B stage sheet, cured epoxy resin composition, resin sheet, metal foil with resin, and metal substrate Download PDFInfo
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- TW201815865A TW201815865A TW106118203A TW106118203A TW201815865A TW 201815865 A TW201815865 A TW 201815865A TW 106118203 A TW106118203 A TW 106118203A TW 106118203 A TW106118203 A TW 106118203A TW 201815865 A TW201815865 A TW 201815865A
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- Prior art keywords
- resin composition
- epoxy resin
- epoxy
- mass
- group
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 306
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 263
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 263
- 229920005989 resin Polymers 0.000 title claims description 144
- 239000011347 resin Substances 0.000 title claims description 144
- 229910052751 metal Inorganic materials 0.000 title claims description 52
- 239000002184 metal Substances 0.000 title claims description 52
- 239000011888 foil Substances 0.000 title claims description 38
- 239000000758 substrate Substances 0.000 title claims description 9
- 239000004593 Epoxy Substances 0.000 claims abstract description 233
- 150000001875 compounds Chemical class 0.000 claims abstract description 171
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 64
- 239000011256 inorganic filler Substances 0.000 claims abstract description 64
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 58
- 239000004990 Smectic liquid crystal Substances 0.000 claims abstract description 24
- 239000004973 liquid crystal related substance Substances 0.000 claims description 105
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 80
- -1 R 23 Chemical compound 0.000 claims description 39
- 239000004848 polyfunctional curative Substances 0.000 claims description 37
- 229920003986 novolac Polymers 0.000 claims description 36
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 29
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 29
- 125000000217 alkyl group Chemical group 0.000 claims description 27
- 125000003118 aryl group Chemical group 0.000 claims description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 21
- 239000000178 monomer Substances 0.000 claims description 19
- 229910052582 BN Inorganic materials 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 239000007787 solid Substances 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 14
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 12
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 6
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims 1
- 238000001723 curing Methods 0.000 description 78
- 239000002966 varnish Substances 0.000 description 34
- 238000002844 melting Methods 0.000 description 29
- 230000008018 melting Effects 0.000 description 29
- 239000002245 particle Substances 0.000 description 27
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 26
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 25
- 238000000034 method Methods 0.000 description 25
- 239000002904 solvent Substances 0.000 description 25
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 21
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 18
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 18
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 16
- 229960001755 resorcinol Drugs 0.000 description 15
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 12
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 12
- 239000000654 additive Substances 0.000 description 12
- 230000000996 additive effect Effects 0.000 description 12
- 239000011889 copper foil Substances 0.000 description 12
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 12
- 238000002360 preparation method Methods 0.000 description 12
- 239000011342 resin composition Substances 0.000 description 12
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 12
- 150000001412 amines Chemical class 0.000 description 10
- 239000004305 biphenyl Substances 0.000 description 10
- 235000010290 biphenyl Nutrition 0.000 description 10
- 239000007822 coupling agent Substances 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000002131 composite material Substances 0.000 description 8
- 229920001187 thermosetting polymer Polymers 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 125000005842 heteroatom Chemical group 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- 241000208340 Araliaceae Species 0.000 description 5
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 5
- 235000003140 Panax quinquefolius Nutrition 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000010292 electrical insulation Methods 0.000 description 5
- 235000008434 ginseng Nutrition 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- WXAIEIRYBSKHDP-UHFFFAOYSA-N 4-phenyl-n-(4-phenylphenyl)-n-[4-[4-(4-phenyl-n-(4-phenylphenyl)anilino)phenyl]phenyl]aniline Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC=CC=2)C=C1 WXAIEIRYBSKHDP-UHFFFAOYSA-N 0.000 description 4
- 229920002799 BoPET Polymers 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000000434 field desorption mass spectrometry Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 3
- 150000002927 oxygen compounds Chemical class 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 3
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- OZRVXYJWUUMVOW-UHFFFAOYSA-N 2-[[4-[4-(oxiran-2-ylmethoxy)phenyl]phenoxy]methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1C(C=C1)=CC=C1OCC1CO1 OZRVXYJWUUMVOW-UHFFFAOYSA-N 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- XEEHRQPQNJOFIQ-UHFFFAOYSA-N N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC XEEHRQPQNJOFIQ-UHFFFAOYSA-N 0.000 description 2
- PEXBBTCNDBSFHT-UHFFFAOYSA-N NCCNCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCNCCCC(C(OC)(OC)OC)CCCCCCCC PEXBBTCNDBSFHT-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- JERCPDZTVRGVSH-UHFFFAOYSA-N benzene-1,2-diol;benzene-1,3-diol Chemical compound OC1=CC=CC(O)=C1.OC1=CC=CC=C1O JERCPDZTVRGVSH-UHFFFAOYSA-N 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
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- 239000000470 constituent Substances 0.000 description 2
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- 125000004122 cyclic group Chemical group 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 230000028161 membrane depolarization Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
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- FPSFZQYZJUAIRT-UHFFFAOYSA-N 1,1,2-tributyl-2-methylhydrazine Chemical compound CCCCN(C)N(CCCC)CCCC FPSFZQYZJUAIRT-UHFFFAOYSA-N 0.000 description 1
- GDDPLWAEEWIQKZ-UHFFFAOYSA-N 1,1-diethoxydecane Chemical compound CCCCCCCCCC(OCC)OCC GDDPLWAEEWIQKZ-UHFFFAOYSA-N 0.000 description 1
- YBQZXXMEJHZYMB-UHFFFAOYSA-N 1,2-diphenylhydrazine Chemical compound C=1C=CC=CC=1NNC1=CC=CC=C1 YBQZXXMEJHZYMB-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
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- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- SXPGQGNWEWPWQZ-UHFFFAOYSA-N 4-(triethoxymethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)OCC)CCCCCCCC SXPGQGNWEWPWQZ-UHFFFAOYSA-N 0.000 description 1
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- MTDLVDBRMBSPBJ-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC MTDLVDBRMBSPBJ-UHFFFAOYSA-N 0.000 description 1
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- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 1
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- 238000004458 analytical method Methods 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical group C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- TUCIXUDAQRPDCG-UHFFFAOYSA-N benzene-1,2-diol Chemical compound OC1=CC=CC=C1O.OC1=CC=CC=C1O TUCIXUDAQRPDCG-UHFFFAOYSA-N 0.000 description 1
- PEKMXCRKYQVRCK-UHFFFAOYSA-N benzene-1,4-diol;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=C(O)C=C1 PEKMXCRKYQVRCK-UHFFFAOYSA-N 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical group C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- PXTVSBIYVHFUJY-UHFFFAOYSA-M potassium;ethyl acetate;hydroxide Chemical compound [OH-].[K+].CCOC(C)=O PXTVSBIYVHFUJY-UHFFFAOYSA-M 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/092—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本發明關於環氧樹脂組成物、B階段薄片、硬化環氧樹脂組成物、樹脂薄片、附有樹脂之金屬箔、及金屬基板。The present invention relates to an epoxy resin composition, a B-stage sheet, a cured epoxy resin composition, a resin sheet, a resin-attached metal foil, and a metal substrate.
近年來,由於伴隨電子和電氣機器的小型化而有發熱量增加的傾向,所以該如何在絕緣材料中使其熱量發散便成為重要的問題。作為可用於這些機器中的絕緣材料,從絕緣性、耐熱性等觀點來看,熱硬化性樹脂硬化物被廣泛地使用。但是,一般而言,因為熱硬化性樹脂硬化物的導熱率較低而會成為阻礙熱發散的重大的原因,所以期望一種具有高導熱性的熱硬化性樹脂硬化物。In recent years, there has been a tendency for heat generation to increase due to miniaturization of electronic and electrical equipment. Therefore, how to dissipate heat in an insulating material becomes an important problem. As an insulating material which can be used in these machines, a thermosetting resin cured product is widely used from the viewpoints of insulation properties, heat resistance and the like. However, in general, since the thermal curable resin cured product has a low thermal conductivity and is a major cause of hindering heat dissipation, a thermosetting resin cured product having high thermal conductivity is desired.
作為具有高導熱性的熱硬化性樹脂硬化物,已提案有一種環氧樹脂組成物的硬化物,其在分子結構中具有液晶原骨架(例如,參照專利文獻1)。又,作為具有高導熱性且軟化點(熔點)低的熱硬化性樹脂,已提案有下述改質環氧樹脂,其是使聯苯酚與混合環氧樹脂進行反應而得,該混合環氧樹脂是由4,4’-二羥基聯苯甲烷的環氧丙基化合物與聯苯酚的環氧丙基化合物所構成(例如,參照專利文獻2)。As a cured product of a thermosetting resin having high thermal conductivity, a cured product of an epoxy resin composition having a liquid crystal original skeleton in a molecular structure has been proposed (for example, see Patent Document 1). Further, as a thermosetting resin having high thermal conductivity and a low softening point (melting point), a modified epoxy resin obtained by reacting biphenol with a mixed epoxy resin, which is obtained by reacting, is proposed. The resin is composed of a glycidyl compound of 4,4'-dihydroxybiphenylmethane and a glycidyl compound of biphenol (for example, refer to Patent Document 2).
已知有下述情形:具有液晶原骨架之環氧化合物可表現液晶的溫度區域較窄,當在硬化溫度以下熔融混合來進行硬化時,因為僅有限於在某一特定的溫度範圍內硬化而成者才能表現液晶性,故難以容易地獲得表現液晶性的環氧樹脂硬化物。作為製造樹脂硬化物時的硬化溫度的範圍較大,而能夠容易地製造具有高導熱性的樹脂硬化物的樹脂組成物,已報導有一種樹脂組成物,其包含複數種環氧化合物,該環氧化合物在分子結構中具有特定的液晶原骨架(例如,參照專利文獻3和4)。 進一步,已提案有一種絕緣組成物,其是以液晶性聚合物與熱硬化性樹脂呈相分離的狀態存在(例如,參照專利文獻5)。並且已報導有下述情形:在絕緣組成物中,液晶性聚合物對高導熱性有所貢獻,而熱硬化性樹脂則對與銅等金屬的密合性有所貢獻。 [先前技術文獻] (專利文獻)It is known that an epoxy compound having a liquid crystal original skeleton can exhibit a narrow temperature region of a liquid crystal, and when it is melt-mixed and hardened below a hardening temperature, since it is only limited to hardening in a specific temperature range. In order to exhibit liquid crystallinity, it is difficult to easily obtain an epoxy resin cured product which exhibits liquid crystallinity. A resin composition capable of easily producing a resin cured product having high thermal conductivity as a range of a hardening temperature at the time of producing a cured resin, and a resin composition containing a plurality of epoxy compounds, which has been reported, has been reported. The oxygen compound has a specific liquid crystal original skeleton in the molecular structure (for example, refer to Patent Documents 3 and 4). Further, there has been proposed an insulating composition in which a liquid crystalline polymer and a thermosetting resin are separated from each other (for example, see Patent Document 5). Further, it has been reported that a liquid crystalline polymer contributes to high thermal conductivity in an insulating composition, and a thermosetting resin contributes to adhesion to a metal such as copper. [Previous Technical Literature] (Patent Literature)
專利文獻1:日本專利第4118691號公報 專利文獻2:日本特開2007-332196號公報 專利文獻3:日本特開2008-239679號公報 專利文獻4:日本特開2008-266594號公報 專利文獻5:日本特開2010-18679號公報Patent Document 1: Japanese Patent No. 4,118, 691, and Patent Document 2: Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. Japanese Special Open 2010-18679
[發明所欲解決的問題] 然而,一般而言,在分子結構中具有液晶原骨架之環氧樹脂,導熱性越高則熔點也會變高,而有時會使得成形條件等作業性變得嚴苛。尤其,若環氧樹脂為高熔點,因為進行環氧樹脂的熔融需要高溫,所以熱硬化溫度會變高。若為了使環氧樹脂熔融而提高溫度,則環氧樹脂與硬化劑的反應速度會變快。因此,高熔點的環氧樹脂在充分地熔融之前,就易於開始進行與硬化劑的反應。從而,專利文獻3和專利文獻4的樹脂組成物由於熱硬化溫度高,而會在液晶原骨架排列整齊之前就進行硬化,所以有時會無法充分地發揮環氧樹脂本身所具有的導熱性。 又,專利文獻2的熱硬化性樹脂,其合成並不容易,所以期望開發出一種新的環氧樹脂,其可兼具低熔點化與導熱性的提升。[Problems to be Solved by the Invention] However, in general, an epoxy resin having a liquid crystal original skeleton in a molecular structure has a higher melting point and a higher melting point, and may cause workability such as molding conditions to become Strict. In particular, if the epoxy resin has a high melting point, since the high temperature is required to melt the epoxy resin, the heat curing temperature becomes high. If the temperature is raised in order to melt the epoxy resin, the reaction speed of the epoxy resin and the hardener becomes faster. Therefore, the high melting point epoxy resin is liable to start the reaction with the hardener before it is sufficiently melted. Therefore, in the resin compositions of Patent Document 3 and Patent Document 4, since the heat curing temperature is high, the liquid crystal original skeleton is hardened before being aligned, and thus the thermal conductivity of the epoxy resin itself may not be sufficiently exhibited. Moreover, since the thermosetting resin of the patent document 2 is not easy to synthesize, it is desired to develop a new epoxy resin which can improve both a low melting point and thermal conductivity.
根據本發明,能夠提供下述技術:一種環氧樹脂組成物,其能夠兼具低熔點化和硬化後的導熱性的提升;以及,使用該環氧樹脂組成物而成的B階段薄片、硬化環氧樹脂組成物、樹脂薄片、附有樹脂之金屬箔、及金屬基板。 [解決問題的技術手段]According to the present invention, it is possible to provide a resin composition capable of achieving both a low melting point and an improvement in thermal conductivity after hardening; and a B-stage sheet and hardening using the epoxy resin composition An epoxy resin composition, a resin sheet, a metal foil with a resin, and a metal substrate. [Technical means to solve the problem]
以下的實施態樣包含用以解決上述問題的具體的手段。The following embodiments include specific means for solving the above problems.
〈1〉 一種環氧樹脂組成物,其含有2種以上的具有液晶原骨架之環氧化合物、硬化劑及無機填充材料; 其中,前述2種以上的具有液晶原骨架之環氧化合物彼此可相容,並能夠藉由與前述硬化劑進行反應而形成層列型結構。<1> An epoxy resin composition containing two or more epoxy compounds having a liquid crystal primary skeleton, a curing agent, and an inorganic filler; wherein the two or more epoxy compounds having a liquid crystal primary skeleton are mutually compatible And capable of forming a smectic structure by reacting with the aforementioned hardener.
〈2〉 如〈1〉所述之環氧樹脂組成物,其中,前述2種以上的具有液晶原骨架之環氧化合物,包含至少1種由下述通式(I)表示的化合物。<2> The epoxy resin composition according to the above-mentioned item, wherein the epoxy compound having two or more kinds of the liquid crystal primary skeletons contains at least one compound represented by the following formula (I).
通式(I)中,R1 ~R4 各自獨立地表示氫原子或碳數1~3的烷基。In the formula (I), R 1 to R 4 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
〈3〉 如〈1〉或〈2〉所述之環氧樹脂組成物,其中,前述硬化劑包含苯酚酚醛清漆樹脂。<3> The epoxy resin composition according to <1> or <2>, wherein the curing agent contains a phenol novolak resin.
〈4〉 如〈1〉~〈3〉中任一項所述之環氧樹脂組成物,其中,前述硬化劑包含一酚醛清漆樹脂,該酚醛清漆樹脂具有以選自由下述通式(II-1)和下述通式(II-2)所組成之群組中的至少1個通式表示的結構單元。The epoxy resin composition according to any one of <1> to <3> wherein the hardener comprises a novolak resin having a selected from the group consisting of the following formula (II- 1) A structural unit represented by at least one of the group consisting of the following formula (II-2).
通式(II-1)和通式(II-2)中,R21 和R24 各自獨立地表示烷基、芳基或芳烷基,R22 、R23 、R25 及R26 各自獨立地表示氫原子、烷基、芳基或芳烷基,m21和m22各自獨立地表示0~2的整數,n21和n22各自獨立地表示1~7的整數。In the general formula (II-1) and the general formula (II-2), R 21 and R 24 each independently represent an alkyl group, an aryl group or an aralkyl group, and R 22 , R 23 , R 25 and R 26 are each independently It represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, and m21 and m22 each independently represent an integer of 0 to 2, and n21 and n22 each independently represent an integer of 1 to 7.
〈5〉 如〈1〉~〈3〉中任一項所述之環氧樹脂組成物,其中,前述硬化劑包含一酚醛清漆樹脂,該酚醛清漆樹脂具有以選自由下述通式(III-1)~下述通式(III-4)所組成之群組中的至少1個通式表示的部分結構。The epoxy resin composition according to any one of <1> to <3> wherein the hardener comprises a novolak resin having a selected from the group consisting of the following formula (III- 1) A partial structure represented by at least one of the group consisting of the following general formula (III-4).
通式(III-1)~通式(III-4)中,m31~m34和n31~n34各自獨立地表示正整數,Ar31 ~Ar34 各自獨立地表示由下述通式(III-a)或下述通式(III-b)表示的任一種基團。In the general formulae (III-1) to (III-4), m31 to m34 and n31 to n34 each independently represent a positive integer, and Ar 31 to Ar 34 each independently represent the following general formula (III-a). Or any one group represented by the following formula (III-b).
通式(III-a)和通式(III-b)中,R31 和R34 各自獨立地表示氫原子或羥基。R32 和R33 各自獨立地表示氫原子或碳數1~8的烷基。In the formula (III-a) and the formula (III-b), R 31 and R 34 each independently represent a hydrogen atom or a hydroxyl group. R 32 and R 33 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
〈6〉 如〈1〉~〈5〉中任一項所述之環氧樹脂組成物,其中,前述硬化劑含有作為構成前述酚醛清漆樹脂的酚化合物也的單體,並且前述單體的含有率在前述硬化劑中是5質量%~80質量%。The epoxy resin composition as described in any one of the above-mentioned [1], wherein the said hardening agent contains the monomer of the phenol compound which comprises the said no The rate is 5 mass% to 80 mass% in the hardener.
〈7〉 如〈1〉~〈6〉中任一項所述之環氧樹脂組成物,其中,前述無機填充材料包含選自由氮化硼、氧化鋁、氧化鎂、二氧化矽及氮化鋁所組成之群組中的至少1種。The epoxy resin composition according to any one of <1> to <6> wherein the inorganic filler material is selected from the group consisting of boron nitride, aluminum oxide, magnesium oxide, cerium oxide, and aluminum nitride. At least one of the group consisting of.
〈8〉 如〈1〉~〈7〉中任一項所述之環氧樹脂組成物,其中,前述無機填充材料在固體成分中的含有率超過50體積%。The epoxy resin composition according to any one of <1> to <7> wherein the content of the inorganic filler in the solid content exceeds 50% by volume.
〈9〉 一種B階段薄片,其是〈1〉~〈8〉中任一項所述之環氧樹脂組成物的薄片狀的半硬化物。<9> A sheet-like semi-cured material of the epoxy resin composition according to any one of <1> to <8>, which is a B-stage sheet.
〈10〉 一種硬化環氧樹脂組成物,其是〈1〉~〈8〉中任一項所述之環氧樹脂組成物的硬化物。<10> A cured epoxy resin composition, which is a cured product of the epoxy resin composition according to any one of <1> to <8>.
〈11〉 一種樹脂薄片,其是〈1〉~〈8〉中任一項所述之環氧樹脂組成物的薄片狀成形體。<11> A sheet-like molded article of the epoxy resin composition according to any one of <1> to <8>.
〈12〉 一種附有樹脂之金屬箔,其具備:金屬箔;及,半硬化環氧樹脂組成物層,其源自〈1〉~〈8〉中任一項所述之環氧樹脂組成物,並被配置在前述金屬箔上。<12> A metal foil with a resin, comprising: a metal foil; and a semi-hardened epoxy resin composition layer, which is obtained from the epoxy resin composition according to any one of <1> to <8> And is disposed on the aforementioned metal foil.
〈13〉 一種金屬基板,其依序具備:金屬支撐體;硬化環氧樹脂組成物層,其源自〈1〉~〈8〉中任一項所述之環氧樹脂組成物,並被配置在前述金屬支撐體上;及,金屬箔,其被配置在前述硬化環氧樹脂組成物層上。 [發明的效果]<13> A metal substrate comprising: a metal support; and a cured epoxy resin composition layer, which is obtained from the epoxy resin composition according to any one of <1> to <8>, and is configured On the metal support; and a metal foil disposed on the hardened epoxy resin composition layer. [Effects of the Invention]
根據本發明,能夠提供下述技術:一種環氧樹脂組成物,其能夠兼具低熔點化和硬化後的導熱性的提升;以及,使用該環氧樹脂組成物而成的B階段薄片、硬化環氧樹脂組成物、樹脂薄片、附有樹脂之金屬箔、及金屬基板。According to the present invention, it is possible to provide a resin composition capable of achieving both a low melting point and an improvement in thermal conductivity after hardening; and a B-stage sheet and hardening using the epoxy resin composition An epoxy resin composition, a resin sheet, a metal foil with a resin, and a metal substrate.
以下,詳細地說明用以實施本發明的形態。但是,本發明並未限定於以下的實施形態。在以下的實施形態中,其構成要素(亦包含要素步驟),除了特別明示的情況,並非必要。有關數值及其範圍亦同樣地並非用以限制本發明。 本說明書中,「步驟」的用語,除了獨立於其他步驟的步驟,即便是與其他步驟無法明確區別,只要可達成該步驟所期望的目的,亦包含於該步驟中。 本說明書中,使用「~」所表示的數値範圍,是表示將「~」的前後所述之數值分別作為最小值及最大值來包含。 在本說明書中以階段性所述之數值範圍中,某一階段所述之數值範圍的上限值或下限值,亦可置換為其他階段所述之數值範圍的上限值或下限值。又,在本說明書中所述之數值範圍中,該數值範圍的上限值或下限值,亦可置換為實施例中所示的值。 本說明書中,可包含複數種相當於各成分的物質。當在組成物中存在複數種相當於各成分的物質時,各成分的含有率或含量,只要無特別說明,意指存在於組成物中的該複數種物質的合計之含有率或含量。 本說明書中,可包含複數種的相當於各成分的粒子。當在組成物中存在複數種相當於各成分的粒子時,各成分的粒徑,只要無特別說明,意指存在於組成物中的該複數種粒子的混合物的值。 本說明書中,「層」的用語,是當觀察存在有該層的區域時,除了形成在該區域整體的情況,亦包含了僅形成在該區域的一部分的情況。 本說明書中,「積層」的用語,是表示將層堆積並重疊,可以是兩層以上的層互相結合的狀態,亦可為兩層以上可互相分離的層的狀態。Hereinafter, the form for carrying out the invention will be described in detail. However, the present invention is not limited to the following embodiments. In the following embodiments, the constituent elements (including the elemental steps) are not necessarily included unless otherwise specified. The same values and ranges are also not intended to limit the invention. In the present specification, the term "step" is used in addition to the steps of other steps, and even if it is not clearly distinguishable from other steps, it is included in the step as long as the desired purpose of the step can be achieved. In the present specification, the numerical range indicated by "~" means that the numerical values described before and after "~" are included as the minimum value and the maximum value, respectively. In the numerical range stated in the specification, the upper or lower limit of the numerical range stated in a certain stage may be replaced with the upper or lower limit of the numerical range stated in other stages. . Further, in the numerical ranges described in the present specification, the upper limit or the lower limit of the numerical range may be replaced with the values shown in the examples. In the present specification, a plurality of substances corresponding to the respective components may be contained. When a plurality of substances corresponding to the respective components are present in the composition, the content rate or content of each component means the total content or content of the plurality of substances present in the composition unless otherwise specified. In the present specification, a plurality of particles corresponding to the respective components may be contained. When a plurality of particles corresponding to the respective components are present in the composition, the particle diameter of each component means the value of the mixture of the plurality of particles present in the composition unless otherwise specified. In the present specification, the term "layer" means that when a region in which the layer exists is observed, a case where only a part of the region is formed is included in addition to the entire region. In the present specification, the term "layered" means that layers are stacked and overlapped, and two or more layers may be bonded to each other, or two or more layers may be separated from each other.
結構單元數,針對單一的分子表示整數值,作為複數種分子之集合體則表示平均值也就是有理數。The number of structural units represents an integer value for a single molecule, and as a collection of a plurality of molecules, the average value is a rational number.
有時會將下述樹脂薄片稱為B階段薄片,該樹脂薄片是將環氧樹脂組成物層進行乾燥所獲得的樹脂薄片進一步進行加熱加壓處理而得,該環氧樹脂組成物層是由環氧樹脂組成物所形成。 再者,B階段薄片是參照日本工業規格JIS K6900:1994的定義而成。The following resin sheet is sometimes referred to as a B-stage sheet obtained by further subjecting a resin sheet obtained by drying an epoxy resin composition layer to heat and pressure treatment, and the epoxy resin composition layer is An epoxy resin composition is formed. Further, the B-stage sheet is defined in accordance with the definition of Japanese Industrial Standard JIS K6900:1994.
〈環氧樹脂組成物〉 本實施形態的環氧樹脂組成物,含有2種以上的具有液晶原骨架之環氧化合物、硬化劑及無機填充材料;其中,前述2種以上的具有液晶原骨架之環氧化合物彼此可相容,並能夠藉由與前述硬化劑進行反應而形成層列型結構。 本實施形態的環氧樹脂組成物,藉由如此的構成,而能夠兼具低熔點化與硬化後的導熱性的提升。其理由雖然仍不清楚,但是可推測如下。可認為藉由環氧樹脂組成物包含2種以上的具有液晶原骨架之環氧化合物,並且,前述2種以上的具有液晶原骨架之環氧化合物彼此可相容並形成層列型結構,而能夠使硬化前的環氧樹脂組成物的熔點降低,並能夠在硬化後發揮高的導熱性。環氧樹脂組成物除了上述成分,亦可以進一步包含其他成分。 以下,詳細地說明環氧樹脂組成物的各成分。<Epoxy resin composition> The epoxy resin composition of the present embodiment contains two or more kinds of epoxy compounds having a liquid crystal original skeleton, a curing agent, and an inorganic filler; wherein the two or more types have a liquid crystal original skeleton. The epoxy compounds are compatible with each other and can form a smectic structure by reacting with the aforementioned hardener. According to such a configuration, the epoxy resin composition of the present embodiment can improve both the low melting point and the thermal conductivity after curing. Although the reason is still unclear, it can be presumed as follows. It is considered that the epoxy resin composition contains two or more epoxy compounds having a liquid crystal original skeleton, and the two or more epoxy compounds having a liquid crystal primary skeleton are compatible with each other to form a smectic structure. The melting point of the epoxy resin composition before curing can be lowered, and high thermal conductivity can be exhibited after curing. The epoxy resin composition may further contain other components in addition to the above components. Hereinafter, each component of the epoxy resin composition will be described in detail.
[環氧化合物] 環氧樹脂組成物包含2種以上的具有液晶原骨架之環氧化合物,並且,具有液晶原骨架的環氧化合物彼此可相容。並可發現下述現象:具有彼此可相容的2種以上的液晶原骨架之環氧化合物之混合物(以下,亦稱為「環氧混合物」)的熔點,變得低於構成環氧混合物的具有液晶原骨架之環氧化合物中熔點最高的具有液晶原骨架之環氧化合物的熔點。所以能夠發揮環氧樹脂組成物的低熔點化。 又,將環氧樹脂組成物作成半硬化物或硬化物時的導熱率,變得能夠高於將單一種構成環氧混合物的具有液晶原骨架之環氧化合物作成半硬化物或硬化物時的導熱率。 當環氧混合物包含3種以上的具有液晶原骨架之環氧化合物時,只要環氧混合物作為整體可相容即可,亦可以是選自3種以上的具有液晶原骨架之環氧化合物中的任意2種的具有液晶原骨架之環氧化合物無法彼此相容,該環氧混合物是由構成環氧混合物的全部的具有液晶原骨架之環氧化合物所構成。 本說明書中,所謂的「2種以上的環氧化合物」,意指分子結構不同的2種以上的環氧化合物。但是,互為立體異構物(光學異構物、幾何異構物)關係的2種以上的環氧化合物並不屬於「2種以上的環氧化合物」,而被視為同一種類的環氧化合物。 本實施形態中的環氧化合物可以是環氧單體,亦可以是環氧樹脂,從高階結構的形成性(高導熱性)來看,較佳是環氧單體。環氧混合物,可以是環氧單體與環氧單體之組合,可以是環氧單體與環氧樹脂之組合、或環氧樹脂與環氧樹脂之組合,從高階結構的形成性(高導熱性)來看,較佳是環氧單體與環氧單體之組合。[Epoxy Compound] The epoxy resin composition contains two or more kinds of epoxy compounds having a liquid crystal original skeleton, and the epoxy compounds having a liquid crystal original skeleton are compatible with each other. It has been found that the melting point of a mixture of epoxy compounds having two or more liquid crystal primary skeletons compatible with each other (hereinafter, also referred to as "epoxy mixture") becomes lower than that of the epoxy compound. The melting point of the epoxy compound having the liquid crystal original skeleton having the highest melting point among the epoxy compounds having a liquid crystal original skeleton. Therefore, the low melting point of the epoxy resin composition can be exhibited. Further, when the epoxy resin composition is made into a semi-cured material or a cured product, the thermal conductivity can be higher than when a single epoxy compound having a liquid crystal original skeleton constituting the epoxy mixture is made into a semi-cured or cured product. Thermal conductivity. When the epoxy mixture contains three or more epoxy compounds having a liquid crystal original skeleton, the epoxy mixture may be compatible as a whole, or may be selected from three or more epoxy compounds having a liquid crystal original skeleton. Any two kinds of epoxy compounds having a liquid crystal original skeleton which are not compatible with each other, and which are composed of all epoxy compounds having a liquid crystal original skeleton constituting the epoxy mixture. In the present specification, the term "two or more types of epoxy compounds" means two or more types of epoxy compounds having different molecular structures. However, two or more kinds of epoxy compounds which are mutually stereoisomers (optical isomers, geometric isomers) do not belong to "two or more kinds of epoxy compounds", but are regarded as the same type of epoxy. Compound. The epoxy compound in the present embodiment may be an epoxy monomer or an epoxy resin, and is preferably an epoxy monomer from the viewpoint of high order structure formation property (high thermal conductivity). The epoxy mixture may be a combination of an epoxy monomer and an epoxy monomer, may be a combination of an epoxy monomer and an epoxy resin, or a combination of an epoxy resin and an epoxy resin, forming a high-order structure (high From the viewpoint of thermal conductivity, a combination of an epoxy monomer and an epoxy monomer is preferred.
本說明書中,所謂的「液晶原骨架」,表示具有表現液晶性的可能性的分子結構。具體而言,可列舉:聯苯骨架、苯甲酸苯酯骨架、偶氮苯(azobenzene)骨架、二苯乙烯骨架、及該等的衍生物等。包含具有液晶原骨架之環氧化合物之環氧樹脂組成物,在硬化時易於形成高階結構,且在製作成硬化物時,會有傾向能夠達到更高的導熱率。In the present specification, the term "liquid crystal original skeleton" means a molecular structure having a possibility of exhibiting liquid crystallinity. Specific examples thereof include a biphenyl skeleton, a phenyl benzoate skeleton, an azobenzene skeleton, a stilbene skeleton, and the like. An epoxy resin composition containing an epoxy compound having a liquid crystal original skeleton tends to form a high-order structure upon hardening, and tends to have a higher thermal conductivity when formed into a cured product.
此處,所謂高階結構,是其構成要素微小地排列的狀態,例如,相當於結晶相和液晶相。如此的高階結構是否存在,藉由以偏光顯微鏡觀察便能夠容易地進行判斷。亦即,在正交偏光(crossed-nicol)狀態的觀察中可看見由於消偏光(depolarization)所產生的干涉紋時,便能夠判斷為高階結構存在。 高階結構,通常在樹脂中是以島狀存在,並形成區域結構(domain structure)。並且,形成區域結構的島各自稱為高階結構體。構成高階結構體的構造單元彼此,一般而言是以共價鍵進行鍵結。Here, the high-order structure is a state in which the constituent elements are minutely arranged, and corresponds to, for example, a crystal phase and a liquid crystal phase. Whether such a high-order structure exists or not can be easily judged by observation with a polarizing microscope. That is, in the observation of the crossed-nicol state, it is possible to judge that a high-order structure exists due to the interference pattern generated by depolarization. Higher order structures, usually in the form of islands in the resin, form a domain structure. Also, the islands forming the regional structure are each referred to as a high-order structure. The structural units constituting the higher-order structure are generally bonded to each other by a covalent bond.
源自液晶原骨架的高規則性的高階結構,有向列型結構、層列型結構等。向列型結構是朝向與分子長軸相同的方向並且是僅具有定位序(orientational order)之液晶結構。相對於此,層列型結構除了定位序之外,還具有一維的位置之秩序,並且是具有特定週期的層結構之液晶結構。又,在層列型結構的同一週期的結構內部中,層結構的週期的方向是一樣的。亦即,相較於向列型結構,層列型結構的分子的秩序性較高。若秩序性高的高階結構形成在半硬化物或硬化物中,便能夠抑制導熱的媒介也就是熱子(phonon)的散射。因此,相較於向列型結構,層列型結構的導熱率會變高。 亦即,相較於向列型結構,層列型結構的分子秩序性較高,所以硬化物的導熱性在表現層列型結構時亦會變高。並可認為:環氧樹脂組成物因為能夠與硬化劑進行反應而形成層列型結構,故能夠發揮高的導熱率。A highly regular high-order structure derived from a liquid crystal original skeleton has a nematic structure, a smectic structure, or the like. The nematic structure is oriented in the same direction as the long axis of the molecule and is a liquid crystal structure having only an orientational order. In contrast to this, the smectic structure has a one-dimensional position order in addition to the positioning order, and is a liquid crystal structure having a layer structure of a specific period. Further, in the inside of the structure of the same period of the smectic structure, the direction of the period of the layer structure is the same. That is, the order of the molecules of the smectic structure is higher than that of the nematic structure. If a high order structure with high order is formed in the semi-hardened or hardened material, the scattering of the medium of heat conduction, that is, phonon, can be suppressed. Therefore, the thermal conductivity of the smectic structure becomes higher than that of the nematic structure. That is, the molecular order of the smectic structure is higher than that of the nematic structure, so that the thermal conductivity of the cured product also becomes higher in the case of expressing the smectic structure. It is considered that the epoxy resin composition can form a smectic structure because it can react with the curing agent, so that it can exhibit high thermal conductivity.
使用環氧樹脂組成物是否能夠形成層列型結構,能夠藉由下述方法來判斷。 使用CuKα 1射線,在管電壓40kV、管電流20mA、2θ為0.5°~30°的範圍內,使用X射線分析裝置(例如,RIGAKU股份有限公司製造)來實行X射線繞射測定。當在2θ為1°~10°的範圍內存在有繞射峰時,便可判斷週期結構包含層列型結構。再者,當具有源自液晶原結構的高規則性的高階結構時,在2θ為1°~30°的範圍內會出現繞射峰。Whether or not the epoxy resin composition can form a smectic structure can be judged by the following method. X-ray diffraction measurement is performed using an X-ray analyzer (for example, manufactured by RIGAKU Co., Ltd.) in a range of a tube voltage of 40 kV, a tube current of 20 mA, and 2θ of 0.5 to 30° using a CuK α 1 ray. When there is a diffraction peak in the range of 2° to 10° in 2θ, it can be judged that the periodic structure includes a smectic structure. Further, when there is a high-order structure derived from a high regularity of the liquid crystal original structure, a diffraction peak appears in the range of 2θ to 1° to 30°.
本說明書中,所謂的「可相容」,意指在使環氧混合物熔融並自然冷卻後,不會觀察到源自具有液晶原骨架之環氧化合物的相分離狀態;或,即便在環氧混合物中各種具有液晶原骨架之環氧化合物呈相分離,但是在作成環氧樹脂組成物之半硬化物或硬化物時,不會觀察到相分離狀態。In the present specification, the term "compatible" means that a phase separation state derived from an epoxy compound having a liquid crystal original skeleton is not observed after the epoxy mixture is melted and naturally cooled; or, even in an epoxy The epoxy compound having a liquid crystal original skeleton in the mixture is phase-separated, but when a semi-hardened or cured product of the epoxy resin composition is formed, no phase separation state is observed.
具有液晶原骨架之環氧化合物是否彼此可相容,能夠利用下述操作來判斷。例如,能夠藉由下述方式判斷:在高於環氧混合物相變為等方相(isotropic phase)的溫度中,加熱環氧混合物使其熔融,繼而,使經熔融的環氧混合物自然冷卻,然後觀察光學顯微鏡影像(放大倍率:100倍),來觀察環氧混合物中所包含的各種具有液晶原骨架之環氧化合物是否呈相分離。又,能夠藉由下述方式判斷:使用此環氧混合物作成環氧樹脂組成物,在形成半硬化物或硬化物時的溫度也就是硬化溫度中,觀察環氧樹脂組成物之半硬化物或硬化物的光學顯微鏡影像(放大倍率:100倍),來觀察環氧樹脂混合物中所包含的各種具有液晶原骨架之環氧化合物是否呈相分離。Whether the epoxy compounds having the liquid crystal original skeleton are compatible with each other can be judged by the following operation. For example, it can be judged by heating the epoxy mixture to melt at a temperature higher than the isotropic phase of the epoxy mixture, and then, the molten epoxy mixture is naturally cooled, Then, an optical microscope image (magnification: 100 times) was observed to observe whether or not various epoxy compounds having a liquid crystal original skeleton contained in the epoxy mixture were phase-separated. Further, it can be judged by using the epoxy mixture as the epoxy resin composition, and observing the semi-hardened substance of the epoxy resin composition at the temperature at which the semi-hardened or cured product is formed, that is, the curing temperature. An optical microscope image (magnification: 100 times) of the cured product was observed to observe whether or not the various epoxy compounds having a liquid crystal original skeleton contained in the epoxy resin mixture were phase separated.
硬化溫度,能夠依據環氧樹脂組成物來適當選擇。作為硬化溫度,較佳是100℃以上,更佳是100℃~250℃,進一步較佳是120℃~210℃。The hardening temperature can be appropriately selected depending on the epoxy resin composition. The curing temperature is preferably 100 ° C or higher, more preferably 100 ° C to 250 ° C, still more preferably 120 ° C to 210 ° C.
除了上述方法之外,具有液晶原骨架之環氧化合物是否彼此可相容,能夠藉由使用掃描式電子顯微鏡(SEM)觀察源自環氧混合物之半硬化物或硬化物來檢查。將源自環氧混合物之半硬化物或硬化物的剖面,例如利用金剛石截切器(diamond cutter)切割而成之後,使用砂紙和研磨液來進行研磨,並使用SEM,例如以2000倍的放大倍率來觀察其剖面的狀態。當半硬化物或硬化物是源自由相分離的組合的環氧化合物所構成之環氧混合物時,能夠明確地觀察到相分離的情況。In addition to the above methods, whether or not the epoxy compounds having a liquid crystal original skeleton are compatible with each other can be inspected by observing a semi-hardened or cured product derived from an epoxy mixture using a scanning electron microscope (SEM). After cutting a cross section of the semi-hardened or hardened material derived from the epoxy mixture, for example, using a diamond cutter, grinding is performed using a sandpaper and a polishing liquid, and using SEM, for example, at 2000 magnification Magnification to observe the state of its profile. When the semi-hardened or cured product is an epoxy mixture composed of a combination of epoxy compounds which are freely phase-separated, phase separation can be clearly observed.
又,可觀察到下述現象:由可相容的組合的具有液晶原骨架之環氧化合物所構成之環氧混合物的熔點,變得低於構成環氧混合物的具有液晶原骨架之環氧化合物之中的熔點最高的具有液晶原骨架之環氧化合物的熔點。此處所謂的熔點,對於具有液晶相之環氧化合物,意指環氧化合物由液晶相往等方相進行相變時的溫度。又,對於不具有液晶相之環氧化合物,則是意指物質進行由固體(結晶相)往液體(等方相)的狀態變化時的溫度。 所謂的液晶相,是一種位於結晶狀態(結晶相)與液體狀態(等方相)的中間的相,並意指一種狀態,其雖然分子的排列方向仍保有一定程度的秩序,但是已失去三維的位置的秩序。Further, it can be observed that the melting point of the epoxy mixture composed of the compatible combination of the epoxy compound having a liquid crystal original skeleton becomes lower than the epoxy compound having the liquid crystal original skeleton constituting the epoxy mixture. Among them, the melting point of the epoxy compound having the highest melting point of the liquid crystal original skeleton. The melting point referred to herein means an epoxy compound having a liquid crystal phase, and means a temperature at which an epoxy compound undergoes a phase transition from a liquid crystal phase to an equal phase. Further, the epoxy compound having no liquid crystal phase means a temperature at which the substance changes from a solid (crystalline phase) to a liquid (isomeric phase). The so-called liquid crystal phase is a phase in the middle of the crystalline state (crystalline phase) and the liquid state (isolateral phase), and means a state in which the molecular arrangement direction still retains a certain degree of order, but the three-dimensional has been lost. The order of the location.
液晶相的有無,能夠藉由使用偏光顯微鏡,觀察在由室溫(例如,25℃)使物質進行升溫的過程中的物質的狀態變化來判斷。在正交偏光(crossed-nicol)狀態的觀察中,結晶相和液晶相能夠看見由於消偏光所產生的干涉紋,並且在暗視野中可看見等方相。又,由結晶相往液晶相的相變,能夠藉由有無流動性來確認。也就是說,所謂的表現液晶相,是具有流動性、且具有可觀察到由於消偏光所產生的干涉紋的溫度區域。 亦即,在正交偏光狀態的觀察中,只要可確認到具有液晶原骨架之環氧化合物或環氧混合物具有流動性、且具有可觀察到由於消偏光所產生的干涉紋的溫度區域,便能夠判斷具有液晶原骨架之環氧化合物或環氧混合物具有液晶相。The presence or absence of the liquid crystal phase can be judged by changing the state of the substance during the temperature rise of the substance by room temperature (for example, 25 ° C) by using a polarizing microscope. In the observation of the crossed-nicol state, the crystal phase and the liquid crystal phase can see the interference fringes due to the depolarized light, and the equilateral phase can be seen in the dark field. Further, the phase transition from the crystal phase to the liquid crystal phase can be confirmed by the presence or absence of fluidity. That is to say, the so-called liquid crystal phase is a temperature region having fluidity and having interference fringes due to depolarized light. That is, in the observation of the orthogonal polarization state, as long as it is confirmed that the epoxy compound or the epoxy mixture having the liquid crystal original skeleton has fluidity and has a temperature region in which interference fringes due to depolarization light are observed, It can be judged that the epoxy compound or the epoxy mixture having the liquid crystal original skeleton has a liquid crystal phase.
環氧混合物表現液晶相的溫度區域的範圍,較佳是10℃以上,更佳是20℃以上,進一步較佳是40℃以上。若溫度區域是10℃以上,硬化物會有傾向能夠達到高的導熱率。進一步,若溫度區域的範圍越大,越容易獲得具有更高的導熱率的硬化物而較佳。The epoxy mixture exhibits a range of the temperature range of the liquid crystal phase, preferably 10 ° C or more, more preferably 20 ° C or more, still more preferably 40 ° C or more. If the temperature region is 10 ° C or more, the cured product tends to have a high thermal conductivity. Further, if the range of the temperature region is larger, it is more preferable to obtain a cured product having a higher thermal conductivity.
又,具有液晶原骨架之環氧化合物或環氧混合物的熔點,可作為發生伴隨相變的能量變化(吸熱反應)的溫度來測定,其使用示差掃描熱量測定裝置(DSC),在25℃~350℃的溫度範圍,以10℃/分鐘的升溫速度的條件,來實行示差掃描熱量測定。從作業性和反應性的觀點來看,具有液晶原骨架之環氧化合物或環氧混合物的熔點較佳是120℃以下。Further, the melting point of the epoxy compound or the epoxy mixture having the liquid crystal original skeleton can be measured as a temperature at which an energy change (endothermic reaction) accompanying the phase transition occurs, and a differential scanning calorimeter (DSC) is used at 25 ° C to ~ The differential scanning calorimetry was carried out under the conditions of a temperature rise rate of 10 ° C / min in a temperature range of 350 ° C. From the viewpoint of workability and reactivity, the melting point of the epoxy compound or epoxy mixture having a liquid crystal original skeleton is preferably 120 ° C or lower.
具有液晶原骨架之環氧化合物彼此可相容,亦即,具有成為下述狀態的傾向:在源自環氧混合物之半硬化物或硬化物中,具有液晶原骨架之環氧化合物並未呈現彼此相分離的狀態;及,即便在具有液晶原骨架之環氧化合物中加入硬化劑、無機填充材料等來構成環氧樹脂組成物時,在環氧樹脂組成物之半硬化物或硬化物中,具有液晶原骨架之環氧化合物並未呈現彼此相分離狀態。The epoxy compounds having a liquid crystal original skeleton are compatible with each other, that is, have a tendency to exhibit an epoxy compound having a liquid crystal original skeleton in a semi-cured or cured product derived from an epoxy mixture. a state in which they are separated from each other; and even when a curing agent, an inorganic filler, or the like is added to an epoxy compound having a liquid crystal original skeleton to constitute an epoxy resin composition, in a semi-hardened or hardened body of the epoxy resin composition The epoxy compound having a liquid crystal original skeleton does not exhibit a state of being separated from each other.
環氧樹脂組成物中所包含的2種以上的具有液晶原骨架之環氧化合物,只要是彼此可相容、並且藉由與後述的硬化劑進行反應便能夠形成層列型結構,則無特別限制,而能夠由通常所用的具有液晶原骨架之環氧化合物來適當選擇。 作為這樣具有液晶原骨架之環氧化合物,例如可列舉:具有液晶原骨架且在1分子內具有2個環氧丙基之環氧化合物。The epoxy compound having two or more kinds of liquid crystal primary skeletons contained in the epoxy resin composition is not compatible unless it is compatible with each other and can form a smectic structure by reacting with a curing agent to be described later. The limitation can be appropriately selected from the epoxy compound having a liquid crystal original skeleton which is usually used. Examples of the epoxy compound having a liquid crystal original skeleton include an epoxy compound having a liquid crystal original skeleton and having two epoxypropyl groups in one molecule.
作為具有液晶原骨架且在1分子內具有2個環氧丙基之環氧化合物,例如可列舉:聯苯型環氧化合物和3環型環氧化合物。Examples of the epoxy compound having a liquid crystal original skeleton and having two epoxypropyl groups in one molecule include a biphenyl type epoxy compound and a tricyclic epoxy compound.
作為聯苯型環氧化合物,可列舉下述環氧化合物等,其是使將4,4’-雙(2,3-環氧基丙氧基)聯苯或4,4’-雙(2,3-環氧基丙氧基)-3,3’,5,5’-四甲基聯苯設為主成分之環氧化合物、表氯醇,與4,4’-聯苯酚或4,4’-(3,3’,5,5’-四甲基)聯苯酚進行反應而得。The biphenyl type epoxy compound may, for example, be an epoxy compound or the like which is such that 4,4'-bis(2,3-epoxypropoxy)biphenyl or 4,4'-bis (2) is used. , 3-epoxypropoxy)-3,3',5,5'-tetramethylbiphenyl is a main component of an epoxy compound, epichlorohydrin, and 4,4'-biphenol or 4, 4'-(3,3',5,5'-tetramethyl)biphenol is obtained by a reaction.
作為3環型環氧化合物,可列舉:具有三苯骨架之環氧化合物、1-(3-甲基-4-環氧乙烷基甲氧基苯基)-4-(4-環氧乙烷基甲氧基苯基)-1-環己烷、1-(3-甲基-4-環氧乙烷基甲氧基苯基)-4-(4-環氧乙烷基甲氧基苯基)-苯、4-{4-(2,3-環氧基丙氧基)苯基}環己基=4-(2,3-環氧基丙氧基)苯甲酸酯等。Examples of the 3-ring type epoxy compound include an epoxy compound having a triphenyl skeleton, and 1-(3-methyl-4-oxiranylmethoxyphenyl)-4-(4-epoxy B). Alkylmethoxyphenyl)-1-cyclohexane, 1-(3-methyl-4-oxiranylmethoxyphenyl)-4-(4-oxiranylmethoxy) Phenyl)-benzene, 4-{4-(2,3-epoxypropoxy)phenyl}cyclohexyl=4-(2,3-epoxypropoxy)benzoate, and the like.
從達到更高的導熱率的觀點來看,作為具有液晶原骨架且在1分子內具有2個環氧丙基之環氧化合物,較佳是當單獨使用1種來作為環氧化合物進行硬化時,能夠形成高階結構,更佳是能夠形成層列型結構。作為如此的環氧化合物,能夠列舉由下述通式(I)表示的化合物(以下,亦稱為「特定環氧化合物」)。環氧樹脂組成物藉由包含特定環氧化合物,而能夠達到更高的導熱率。From the viewpoint of achieving a higher thermal conductivity, as an epoxy compound having a liquid crystal original skeleton and having two epoxypropyl groups in one molecule, it is preferred to use one of them as an epoxy compound for hardening. It is possible to form a high-order structure, and it is more preferable to form a smectic structure. The epoxy compound represented by the following formula (I) (hereinafter also referred to as "specific epoxy compound"). The epoxy resin composition can achieve higher thermal conductivity by including a specific epoxy compound.
通式(I)中,R1 ~R4 各自獨立地表示氫原子或碳數1~3的烷基。R1 ~R4 較佳是各自獨立地表示氫原子、或碳數1或2的烷基,更佳是氫原子或甲基,進一步較佳是氫原子。又,較佳是R1 ~R4 之中的2個~4個是氫原子,更佳是3個或4個是氫原子,進一步較佳是4個全部是氫原子。當R1 ~R4 中任一個是碳數1~3的烷基時,較佳是R1 和R4 中的至少其中一個是碳數1~3的烷基。In the formula (I), R 1 to R 4 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. R 1 to R 4 each preferably independently represent a hydrogen atom or an alkyl group having 1 or 2 carbon atoms, more preferably a hydrogen atom or a methyl group, and still more preferably a hydrogen atom. Further, it is preferred that two to four of R 1 to R 4 are a hydrogen atom, more preferably three or four are hydrogen atoms, and even more preferably all four are hydrogen atoms. When any of R 1 to R 4 is an alkyl group having 1 to 3 carbon atoms, it is preferred that at least one of R 1 and R 4 is an alkyl group having 1 to 3 carbon atoms.
再者,特定環氧化合物的較佳例,例如已記載於日本特開2011-74366號公報中。具體而言,作為特定環氧化合物,較佳是選自由4-{4-(2,3-環氧基丙氧基)苯基}環己基=4-(2,3-環氧基丙氧基)苯甲酸酯、及4-{4-(2,3-環氧基丙氧基)苯基}環己基=4-(2,3-環氧基丙氧基)-3-甲基苯甲酸酯所組成之群組中的至少1種化合物。Further, a preferred example of the specific epoxy compound is described, for example, in JP-A-2011-74366. Specifically, as the specific epoxy compound, it is preferably selected from 4-{4-(2,3-epoxypropoxy)phenyl}cyclohexyl=4-(2,3-epoxyoxypropoxy) Benzoate, and 4-{4-(2,3-epoxypropoxy)phenyl}cyclohexyl=4-(2,3-epoxypropoxy)-3-methyl At least one compound of the group consisting of benzoates.
從高導熱率的觀點來看,2種以上的具有液晶原骨架之環氧化合物,更佳是包含至少1種的特定環氧化合物,更佳是包含2種以上的特定環氧化合物,特佳是構成環氧混合物的具有液晶原骨架之環氧化合物皆為特定環氧化合物。From the viewpoint of high thermal conductivity, two or more epoxy compounds having a liquid crystal primary skeleton preferably contain at least one specific epoxy compound, and more preferably two or more specific epoxy compounds. The epoxy compound having a liquid crystal original skeleton constituting the epoxy mixture is a specific epoxy compound.
環氧樹脂組成物,從低熔點化和導熱率性的觀點來看,除了特定環氧化合物,亦可包含與特定環氧化合物不同且能夠與特定環氧化合物相容的具有液晶原骨架之環氧化合物(以下,亦稱為「具有液晶原骨架之其他環氧化合物」)。 作為具有液晶原骨架之其他環氧化合物,較佳是單獨使用1種當作為環氧化合物來進行硬化時,能夠形成向列型結構。作為這樣的環氧化合物,可列舉聯苯型環氧化合物等,從材料的容易購入性、成本及導熱率的觀點來看,較佳是聯苯型環氧化合物。The epoxy resin composition may contain, in addition to a specific epoxy compound, a ring having a liquid crystal original skeleton which is different from a specific epoxy compound and compatible with a specific epoxy compound from the viewpoint of low melting point and thermal conductivity. Oxygen compound (hereinafter also referred to as "other epoxy compound having a liquid crystal original skeleton"). As the other epoxy compound having a liquid crystal original skeleton, it is preferred to use one type alone to form a nematic structure when it is cured as an epoxy compound. Examples of such an epoxy compound include a biphenyl type epoxy compound, and a biphenyl type epoxy compound is preferred from the viewpoint of easiness in purchasing materials, cost, and thermal conductivity.
作為聯苯型環氧化合物,可列舉:4,4’-雙(2,3-環氧基丙氧基)聯苯等。 作為上述聯苯型環氧化合物,可列舉藉由下述製品名來販賣者:「YX4000」、「YL6121H」(以上,三菱化學股份有限公司製造)、「NC-3000」、「NC-3100」(以上,日本化藥股份有限公司製造)等。 在市售的聯苯型環氧化合物之中,從低熔點化和導熱率性的提升的觀點來看,更佳是「YL6121H」(三菱化學股份有限公司製造)。具有液晶原骨架之其他環氧化合物,可以單獨使用1種,亦可以併用2種以上。The biphenyl type epoxy compound may, for example, be 4,4'-bis(2,3-epoxypropoxy)biphenyl. The biphenyl type epoxy compound is exemplified by the following product names: "YX4000", "YL6121H" (above, manufactured by Mitsubishi Chemical Corporation), "NC-3000", "NC-3100". (above, manufactured by Nippon Kayaku Co., Ltd.). Among the commercially available biphenyl type epoxy compounds, from the viewpoint of the improvement of the low melting point and the thermal conductivity, "YL6121H" (manufactured by Mitsubishi Chemical Corporation) is more preferable. The other epoxy compound having a liquid crystal original skeleton may be used alone or in combination of two or more.
當環氧混合物包含特定環氧化合物、與具有液晶原骨架之其他環氧化合物時,作為特定環氧化合物與具有液晶原骨架之其他環氧化合物之混合比例,從謀求兼具低熔點化和導熱率性的提升的觀點來看,以環氧當量數比計,較佳是5:5~9.5:0.5(特定環氧化合物:具有液晶原骨架之其他環氧化合物)的範圍,更佳是6:4~9:1的範圍,進一步較佳是7:3~9:1的範圍。When the epoxy mixture contains a specific epoxy compound and another epoxy compound having a liquid crystal original skeleton, as a mixture ratio of a specific epoxy compound and another epoxy compound having a liquid crystal original skeleton, it is desired to have both a low melting point and a heat conduction. From the viewpoint of the improvement of the rate of the epoxy resin, it is preferably in the range of 5:5 to 9.5:0.5 (specific epoxy compound: other epoxy compound having a liquid crystal original skeleton), and more preferably 6 The range of 4 to 9:1 is more preferably in the range of 7:3 to 9:1.
環氧樹脂組成物,只要是環氧混合物與後述的硬化劑進行反應並能夠形成層列型結構,亦可以進一步包含不具有液晶原骨架之其他環氧化合物(以下,稱為「非液晶原環氧化合物」)。作為非液晶原環氧化合物,可列舉:雙酚型環氧化合物、三苯甲烷型環氧化合物等。從容易購入性和成本的觀點來看,較佳是雙酚型環氧化合物。The epoxy resin composition may further comprise an epoxy compound having no liquid crystal original skeleton as long as the epoxy mixture reacts with a curing agent described later to form a smectic structure (hereinafter referred to as "non-liquid crystal original ring". Oxygen compound"). Examples of the non-liquid crystal raw epoxy compound include a bisphenol epoxy compound and a triphenylmethane epoxy compound. From the viewpoint of ease of purchase and cost, a bisphenol type epoxy compound is preferred.
作為雙酚型環氧化合物,可列舉:雙酚A型環氧化合物、雙酚F型環氧化合物等。 作為上述雙酚型環氧化合物,可列舉藉由下述製品名來販賣者:「ZX1059」、「VSLV-80XY」(以上,新日鐵住友化學股份有限公司製造)、「828EL」(三菱化學股份有限公司製造)。 作為上述三苯甲烷型環氧化合物,只要是將具有三苯甲烷骨架之化合物設為原料之環氧化合物,則無特別限制,可列舉藉由下述製品名來販賣者:「1032H60」(三菱化學股份有限公司製造)、「EPPN-502H」(日本化藥股份有限公司製造)。Examples of the bisphenol type epoxy compound include a bisphenol A type epoxy compound and a bisphenol F type epoxy compound. The bisphenol-type epoxy compound is exemplified by the following product names: "ZX1059", "VSLV-80XY" (above, manufactured by Nippon Steel Sumitomo Chemical Co., Ltd.), "828EL" (Mitsubishi Chemical) Manufacturing company). The triphenylmethane-based epoxy compound is not particularly limited as long as it is a compound having a triphenylmethane skeleton as a raw material, and is exemplified by the following product name: "1032H60" (Mitsubishi) Manufactured by Chemical Co., Ltd., "EPPN-502H" (manufactured by Nippon Kayaku Co., Ltd.).
環氧混合物中的非液晶原環氧化合物的含有率,較佳是10質量%以下,更佳是5質量%以下,進一步較佳是3質量%以下,特佳是1質量%以下。The content of the non-liquid crystal raw epoxy compound in the epoxy mixture is preferably 10% by mass or less, more preferably 5% by mass or less, further preferably 3% by mass or less, and particularly preferably 1% by mass or less.
環氧混合物中的特定環氧化合物的含有率,只要環氧混合物與後述的硬化劑進行反應並能夠形成層列型結構,則無特別限制,而能夠適當選擇。從低熔點化的觀點來看,相對於環氧混合物的總質量,具有液晶原骨架之環氧化合物的含有率較佳是5質量%以上,更佳是10質量%~100質量%,進一步較佳是100質量%。The content of the specific epoxy compound in the epoxy mixture is not particularly limited as long as the epoxy mixture reacts with a curing agent to be described later and can form a smectic structure, and can be appropriately selected. From the viewpoint of the low melting point, the content of the epoxy compound having a liquid crystal original skeleton is preferably 5% by mass or more, more preferably 10% by mass to 100% by mass, based on the total mass of the epoxy mixture. Good is 100% by mass.
環氧樹脂組成物中具有液晶原骨架之環氧化合物的總含有率,並無特別限制。從熱硬化性和導熱率的觀點來看,相對於環氧樹脂組成物的總質量,具有液晶原骨架之環氧化合物的總含有率,較佳是3質量%~10質量%,更佳是5質量%~10質量%。The total content of the epoxy compound having a liquid crystal original skeleton in the epoxy resin composition is not particularly limited. From the viewpoint of thermosetting property and thermal conductivity, the total content of the epoxy compound having a liquid crystal original skeleton is preferably from 3% by mass to 10% by mass, more preferably, based on the total mass of the epoxy resin composition. 5 mass% to 10 mass%.
[硬化劑] 環氧樹脂組成物含有硬化劑。硬化劑只要是能夠與具有液晶原骨架之環氧化合物進行硬化反應的化合物,則無特別限制,而能夠適當選擇通常所用的硬化劑來使用。作為硬化劑的具體例,可列舉:酸酐系硬化劑、胺系硬化劑、酚系硬化劑、硫醇系硬化劑等複加成型硬化劑;及,咪唑等觸媒型硬化劑等。這些硬化劑,可以單獨使用1種,亦可以組合2種以上。 其中,從耐熱性的觀點來看,作為硬化劑,較佳是使用選自由胺系硬化劑和酚系硬化劑所組成之群組中的至少1種,進一步,從保存穩定性的觀點來看,更佳是使用酚系硬化劑中的至少1種。[Hardener] The epoxy resin composition contains a hardener. The curing agent is not particularly limited as long as it can undergo a curing reaction with an epoxy compound having a liquid crystal original skeleton, and can be appropriately selected and used as a curing agent to be used. Specific examples of the curing agent include an acid-based curing agent, an amine-based curing agent, a phenol-based curing agent, and a thiol-based curing agent; and a catalyst-type curing agent such as imidazole. These hardeners may be used alone or in combination of two or more. In particular, it is preferable to use at least one selected from the group consisting of an amine-based curing agent and a phenol-based curing agent as a curing agent, and further, from the viewpoint of storage stability, from the viewpoint of heat resistance. More preferably, at least one of phenolic curing agents is used.
作為胺系硬化劑,能夠使用通常用來作為環氧化合物的硬化劑者,而無特別限制,並能夠使用市售的胺系硬化劑。其中,從硬化性的觀點來看,作為胺系硬化劑,較佳是具有2以上的官能基之多官能硬化劑,進一步從導熱性的觀點來看,更佳是具有剛性的骨架之多官能硬化劑。As the amine-based curing agent, those which are generally used as a curing agent for an epoxy compound can be used without particular limitation, and a commercially available amine-based curing agent can be used. In particular, from the viewpoint of curability, the amine-based curing agent is preferably a polyfunctional hardener having two or more functional groups, and more preferably a rigid skeleton having a rigid structure from the viewpoint of thermal conductivity. hardener.
作為2官能的胺系硬化劑,具體而言,可列舉:4,4’-二胺二苯甲烷、4,4’-二胺二苯醚、4,4’-二胺二苯碸、4,4’-二胺-3,3’-二甲氧聯苯、苯甲酸-4,4’-二胺苯酯、1,5-二胺萘、1,3-二胺萘、1,4-二胺萘、1,8-二胺萘等。 其中,從導熱率的觀點來看,較佳是選自由4,4’-二胺二苯甲烷和1,5-二胺萘所組成之群組中的至少1種,更佳是1,5-二胺萘。Specific examples of the bifunctional amine-based curing agent include 4,4'-diamine diphenylmethane, 4,4'-diamine diphenyl ether, and 4,4'-diamine diphenyl hydrazine. , 4'-diamine-3,3'-dimethoxybiphenyl, benzoic acid-4,4'-diamine phenyl ester, 1,5-diamine naphthalene, 1,3-diamine naphthalene, 1,4 - Diamine naphthalene, 1,8-diamine naphthalene, and the like. Among them, from the viewpoint of thermal conductivity, it is preferably at least one selected from the group consisting of 4,4'-diamine diphenylmethane and 1,5-diamine naphthalene, more preferably 1,5. - Diamine naphthalene.
作為酚系硬化劑,能夠使用通常用來作為環氧化合物的硬化劑者,而無特別限制,並能夠使用市售的酚系硬化劑。例如,能夠使用苯酚和將苯酚進行酚醛清漆化而成的酚樹脂。 作為酚系硬化劑,可列舉:苯酚、鄰甲酚、間甲酚、對甲酚等單官能的化合物;鄰苯二酚、間苯二酚、對苯二酚等2官能的化合物;1,2,3-三羥苯、1,2,4-三羥苯、1,3,5-三羥苯等3官能的化合物等。又,作為硬化劑,能夠使用下述苯酚酚醛清漆樹脂,其是將這些酚系硬化劑以甲烯鏈(methylene chain)等進行鍵結所酚醛清漆化而成。As the phenolic curing agent, those which are generally used as a curing agent for an epoxy compound can be used without particular limitation, and a commercially available phenolic curing agent can be used. For example, phenol and a phenol resin obtained by subjecting phenol to novolak can be used. Examples of the phenolic curing agent include monofunctional compounds such as phenol, o-cresol, m-cresol, and p-cresol; and bifunctional compounds such as catechol, resorcin, and hydroquinone; A trifunctional compound such as 2,3-trihydroxybenzene, 1,2,4-trihydroxybenzene or 1,3,5-trihydroxybenzene. Further, as the curing agent, a phenol novolak resin obtained by varnishing these phenol-based curing agents with a methylene chain or the like can be used.
作為苯酚酚醛清漆樹脂,具體例可列舉:將1種的酚化合物進行酚醛清漆化而成的樹脂,其是甲酚酚醛清漆樹脂、鄰苯二酚酚醛清漆樹脂、間苯二酚酚醛清漆樹脂、對苯二酚酚醛清漆樹脂等;及,將2種或2種以上的酚化合物進行酚醛清漆化而成的樹脂等,其是鄰苯二酚間苯二酚酚醛清漆樹脂、間苯二酚對苯二酚酚醛清漆樹脂等。Specific examples of the phenol novolak resin include a resin obtained by subjecting one type of phenol compound to novolak, and is a cresol novolak resin, a catechol novolak resin, and a resorcinol novolak resin. a hydroquinone phenol varnish resin or the like; and a resin obtained by subjecting two or more phenol compounds to novolak, which is a catechol resorcinol novolak resin or a resorcinol pair. Hydroquinone novolac resin and the like.
當使用苯酚酚醛清漆樹脂作為酚系硬化劑時,苯酚酚醛清漆樹脂,較佳是包含下述酚醛清漆樹脂,該酚醛清漆樹脂具有以選自由下述通式(II-1)和(II-2)所組成之群組中的至少1個通式表示的結構單元。When a phenol novolak resin is used as the phenolic curing agent, the phenol novolak resin preferably contains a novolak resin having a selected from the following general formulae (II-1) and (II-2). a structural unit represented by at least one of the group consisting of.
通式(II-1)和通式(II-2)中,R21 和R24 各自獨立地表示烷基、芳基或芳烷基,R22 、R23 、R25 及R26 各自獨立地表示氫原子、烷基、芳基或芳烷基,m21和m22各自獨立地表示0~2的整數,n21和n22各自獨立地表示1~7的整數。In the general formula (II-1) and the general formula (II-2), R 21 and R 24 each independently represent an alkyl group, an aryl group or an aralkyl group, and R 22 , R 23 , R 25 and R 26 are each independently It represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, and m21 and m22 each independently represent an integer of 0 to 2, and n21 and n22 each independently represent an integer of 1 to 7.
烷基可以是直鏈狀、支鏈狀及環狀中的任一種。 芳基可以是在芳香族環中包含雜原子的結構。此時,較佳是雜原子與碳數的合計數成為6~12的雜芳基。 芳烷基中的伸烷基可以是直鏈狀、支鏈狀及環狀中的任一種。芳烷基中的芳基可以是在芳香族環中包含雜原子的結構。此時,較佳是雜原子與碳數的合計數成為6~12的雜芳基。The alkyl group may be any of a linear chain, a branched chain, and a cyclic chain. The aryl group may be a structure containing a hetero atom in the aromatic ring. In this case, it is preferred that the total number of hetero atoms and carbon atoms is 6 to 12 heteroaryl groups. The alkylene group in the aralkyl group may be any of a linear chain, a branched chain, and a cyclic group. The aryl group in the aralkyl group may be a structure containing a hetero atom in the aromatic ring. In this case, it is preferred that the total number of hetero atoms and carbon atoms is 6 to 12 heteroaryl groups.
通式(II-1)和通式(II-2)中,R21 和R24 各自獨立地表示烷基、芳基或芳烷基。這些烷基、芳基和芳烷基,可以進一步具有取代基。作為取代基,能夠列舉烷基(但是不包含R21 和R24 是烷基的情況)、芳香族基、鹵素原子、羥基等。 m21和m22各自獨立地表示0~2的整數,當m21和m22是2時,2個的R21 和R24 可以相同亦可以不同。m21和m22較佳是各自獨立地為0或1,更佳是0。 n21和n22是苯酚酚醛清漆樹脂中所包含的由通式(II-1)和(II-2)表示的結構單元的數量,並各自獨立地表示1~7的整數。In the formula (II-1) and the formula (II-2), R 21 and R 24 each independently represent an alkyl group, an aryl group or an aralkyl group. These alkyl groups, aryl groups and aralkyl groups may further have a substituent. The substituent may, for example, be an alkyl group (but not including R 21 and R 24 is an alkyl group), an aromatic group, a halogen atom, a hydroxyl group or the like. M21 and m22 each independently represent an integer of 0 to 2. When m21 and m22 are 2, two R 21 and R 24 may be the same or different. M21 and m22 are preferably each independently 0 or 1, more preferably 0. N21 and n22 are the number of structural units represented by the general formulae (II-1) and (II-2) contained in the phenol novolak resin, and each independently represents an integer of 1 to 7.
通式(II-1)和通式(II-2)中,R22 、R23 、R25 及R26 各自獨立地表示氫原子、烷基、芳基或芳烷基。由R22 、R23 、R25 及R26 表示的烷基、芳基和芳烷基,可以進一步具有取代基。作為取代基,能夠列舉:烷基(但是不包含R22 、R23 、R25 及R26 是烷基的情況)、芳基、鹵素原子、羥基等。In the formula (II-1) and the formula (II-2), R 22 , R 23 , R 25 and R 26 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aralkyl group. The alkyl group, the aryl group and the aralkyl group represented by R 22 , R 23 , R 25 and R 26 may further have a substituent. The substituent may, for example, be an alkyl group (but not including R 22 , R 23 , R 25 and R 26 is an alkyl group), an aryl group, a halogen atom or a hydroxyl group.
在通式(II-1)和通式(II-2)中的R22 、R23 、R25 及R26 ,從保存穩定性與導熱性的觀點來看,較佳是各自獨立地為氫原子、烷基或芳基,更佳是氫原子、碳數1~4的烷基或碳數6~12的芳基,進一步較佳是氫原子。 進一步,從耐熱性的觀點來看,較佳是R22 和R23 中的至少其中一個是芳基,更佳是碳數6~12的芳基。又,較佳是R25 和R26 的至少其中一個同樣地是芳基,更佳是碳數6~12的芳基。 再者,上述芳基可以是在芳香族環中包含雜原子的結構。此時,較佳是雜原子與碳數的合計數成為6~12的雜芳基。R 22 , R 23 , R 25 and R 26 in the formula (II-1) and the formula (II-2) are preferably each independently hydrogen from the viewpoint of storage stability and thermal conductivity. The atom, the alkyl group or the aryl group is more preferably a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 12 carbon atoms, more preferably a hydrogen atom. Further, from the viewpoint of heat resistance, it is preferred that at least one of R 22 and R 23 is an aryl group, more preferably an aryl group having 6 to 12 carbon atoms. Further, it is preferred that at least one of R 25 and R 26 is likewise an aryl group, more preferably an aryl group having 6 to 12 carbon atoms. Further, the above aryl group may have a structure in which a hetero atom is contained in an aromatic ring. In this case, it is preferred that the total number of hetero atoms and carbon atoms is 6 to 12 heteroaryl groups.
酚系硬化劑,可以單獨包含1種具有由通式(II-1)或通式(II-2)表示的結構單元之化合物,亦可以包含2種以上。較佳是下述情況:包含至少1種由上述通式(II-1)表示的具有源自間苯二酚的結構單元之化合物。The phenolic curing agent may contain one type of compound having a structural unit represented by the formula (II-1) or the formula (II-2) alone or in combination of two or more. It is preferably a case comprising at least one compound having a structural unit derived from resorcin represented by the above formula (II-1).
具有由通式(II-1)表示的結構單元之化合物,可以進一步包含至少1種源自間苯二酚以外的酚化合物的部分結構。通式(II-1)中,作為源自間苯二酚以外的酚化合物的部分結構,例如可列舉源自下述酚化合物的部分結構,該酚化合物是:苯酚、甲酚、鄰苯二酚、對苯二酚、1,2,3-三羥苯、1,2,4-三羥苯及1,3,5-三羥苯。源自這些酚化合物的部分結構,可以包含單獨1種,亦可以組合2種以上來包含。 又,具有由上述通式(II-2)表示的結構單元之化合物,可以進一步包含至少1種源自鄰苯二酚以外的酚化合物的部分結構。通式(II-2)中,作為源自鄰苯二酚以外的酚化合物的部分結構,例如可列舉源自下述酚化合物的部分結構,該酚化合物是:苯酚、甲酚、間苯二酚、對苯二酚、1,2,3-三羥苯、1,2,4-三羥苯及1,3,5-三羥苯。源自這些酚化合物的部分結構,可以包含單獨1種,亦可以組合2種以上來包含。The compound having a structural unit represented by the general formula (II-1) may further contain at least one partial structure derived from a phenol compound other than resorcin. In the general formula (II-1), as a partial structure derived from a phenol compound other than resorcin, for example, a partial structure derived from a phenol compound of phenol, cresol or phthalic acid may be mentioned. Phenol, hydroquinone, 1,2,3-trihydroxybenzene, 1,2,4-trihydroxybenzene and 1,3,5-trihydroxybenzene. The partial structure derived from these phenol compounds may be contained alone or in combination of two or more. Further, the compound having a structural unit represented by the above formula (II-2) may further contain at least one partial structure derived from a phenol compound other than catechol. In the general formula (II-2), as a partial structure derived from a phenol compound other than catechol, for example, a partial structure derived from a phenol compound of phenol, cresol or m-phenylene is exemplified. Phenol, hydroquinone, 1,2,3-trihydroxybenzene, 1,2,4-trihydroxybenzene and 1,3,5-trihydroxybenzene. The partial structure derived from these phenol compounds may be contained alone or in combination of two or more.
此處,所謂的源自酚化合物的部分結構,意指由酚化合物的苯環部分去除1個或2個的氫原子所構成的一元或二元基團。再者,去除氫原子的位置並無特別限制。Here, the partial structure derived from a phenol compound means a monovalent or divalent group composed of one or two hydrogen atoms removed from the benzene ring portion of the phenol compound. Further, the position at which the hydrogen atom is removed is not particularly limited.
又,具有由通式(II-1)表示的結構單元之化合物中,源自間苯二酚的部分結構的含有率並無特別限制。從彈性模數的觀點來看,源自間苯二酚的部分結構相對於具有由通式(II-1)表示的結構單元之化合物的總質量之含有率,較佳是55質量%以上,從玻璃轉移溫度(Tg)與線膨脹係數的觀點來看,更佳是80質量%以上,從導熱性的觀點來看,進一步較佳是90質量%以上。Further, among the compounds having a structural unit represented by the general formula (II-1), the content of the partial structure derived from resorcin is not particularly limited. The content of the partial structure derived from resorcinol relative to the total mass of the compound having a structural unit represented by the general formula (II-1) is preferably 55 mass% or more, from the viewpoint of the elastic modulus. From the viewpoint of the glass transition temperature (Tg) and the linear expansion coefficient, it is more preferably 80% by mass or more, and further preferably 90% by mass or more from the viewpoint of thermal conductivity.
進一步,苯酚酚醛清漆樹脂,較佳是包含下述酚醛清漆樹脂,其具有以選自由下述通式(III-1)~通式(III-4)所組成之群組中的至少1個通式表示的部分結構。Further, the phenol novolak resin preferably contains a novolak resin having at least one pass selected from the group consisting of the following general formulae (III-1) to (III-4) Part of the structure represented by the formula.
通式(III-1)~通式(III-4)中,m31~m34和n31~n34各自獨立地表示正整數,並表示各自所含有的結構單元的數量。又,Ar31 ~Ar34 各自獨立地表示由下述通式(III-a)或下述通式(III-b)表示的基團中的任一個。In the general formulae (III-1) to (III-4), m31 to m34 and n31 to n34 each independently represent a positive integer and indicate the number of structural units contained in each. Further, Ar 31 to Ar 34 each independently represent any one of the groups represented by the following formula (III-a) or the following formula (III-b).
通式(III-a)和通式(III-b)中,R31 和R34 各自獨立地表示氫原子或羥基。R32 和R33 各自獨立地表示氫原子或碳數1~8的烷基。In the formula (III-a) and the formula (III-b), R 31 and R 34 each independently represent a hydrogen atom or a hydroxyl group. R 32 and R 33 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
具有由通式(III-1)~通式(III-4)中的至少1個通式表示的部分結構之硬化劑,是能夠藉由後述的製造方法來附加地產生者,該製造方法是將二元酚化合物進行酚醛清漆化。The curing agent having a partial structure represented by at least one of the general formulae (III-1) to (III-4) can be additionally produced by a production method described later, and the production method is The dihydric phenol compound is subjected to novolak.
由通式(III-1)~通式(III-4)表示的部分結構,可作為化合物的主鏈骨架來包含,或可作為支鏈的一部分來包含。進一步,構成由通式(III-1)~通式(III-4)中的任一個通式表示的部分結構的各自的結構單元,可以隨機地被包含,亦可以規則地被包含,亦可以嵌段狀地被包含。又,通式(III-1)~通式(III-4)中,如果羥基的取代位置是在芳香族環上,則無特別限制。The partial structure represented by the general formula (III-1) to the general formula (III-4) may be contained as a main chain skeleton of the compound or may be contained as a part of the branch. Further, each of the structural units constituting the partial structure represented by any one of the general formulae (III-1) to (III-4) may be contained at random or may be contained regularly. It is contained in a block shape. Further, in the general formulae (III-1) to (III-4), the substitution position of the hydroxyl group is not particularly limited as long as it is on the aromatic ring.
有關通式(III-1)~通式(III-4)的各自的詳情,存在複數個的Ar31 ~Ar34 可以皆為同樣的原子團,亦可以包含2種以上的原子團。再者,Ar31 ~Ar34 各自獨立地表示由通式(III-a)和通式(III-b)中的任一個通式表示的基團。In the details of each of the general formulae (III-1) to (III-4), a plurality of Ar 31 to Ar 34 may be the same atomic group, or two or more kinds of atomic groups may be contained. Further, Ar 31 to Ar 34 each independently represent a group represented by any one of the formula (III-a) and the formula (III-b).
通式(III-a)和通式(III-b)中的R31 和R34 各自獨立地為氫原子或羥基,但是從導熱性的觀點來看,較佳是羥基。又,R31 和R34 的取代位置並無特別限制。R 31 and R 34 in the formula (III-a) and the formula (III-b) are each independently a hydrogen atom or a hydroxyl group, but from the viewpoint of thermal conductivity, a hydroxyl group is preferred. Further, the substitution positions of R 31 and R 34 are not particularly limited.
通式(III-a)和通式(III-b)中的R32 和R33 各自獨立地表示氫原子或碳數1~8的烷基。作為R32 和R33 中的碳數1~8的烷基,例如可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、三級丁基、戊基、己基、庚基及辛基。又,通式 (III-a)和通式(III-b)中的R32 和R33 的取代位置並無特別限制。R 32 and R 33 in the formula (III-a) and the formula (III-b) each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Examples of the alkyl group having 1 to 8 carbon atoms in R 32 and R 33 include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, an isobutyl group, a tertiary butyl group, and a pentyl group. , hexyl, heptyl and octyl. Further, the substitution positions of R 32 and R 33 in the formula (III-a) and the formula (III-b) are not particularly limited.
通式(III-a)~通式(III-b)中的Ar31 ~Ar34 ,從達到更優異的導熱性的觀點來看,較佳是選自源自二羥苯的基團(在通式(III-a)中,R31 是羥基且R32 和R33 是氫原子之基團)、和源自二羥萘的基團(在通式(III-b)中,R34 是羥基之基團)中的至少1種。Ar 31 to Ar 34 in the general formulae (III-a) to (III-b) are preferably selected from the group derived from dihydroxybenzene from the viewpoint of achieving more excellent thermal conductivity. In the formula (III-a), R 31 is a hydroxyl group and R 32 and R 33 are a group of a hydrogen atom), and a group derived from dihydroxynaphthalene (in the formula (III-b), R 34 is At least one of the groups of a hydroxyl group).
此處,所謂「源自二羥苯的基團」,意指由二羥苯的芳香環部分去除2個氫原子所構成的二元基團,並且氫原子被去除的位置並無特別限制。又,有關「源自二羥萘的基團」亦是相同的意思。Here, the "dihydroxybenzene-derived group" means a binary group composed of two hydrogen atoms removed from the aromatic ring portion of the dihydroxybenzene, and the position at which the hydrogen atom is removed is not particularly limited. Further, the "group derived from dihydroxynaphthalene" has the same meaning.
又,從環氧樹脂組成物的生產性和流動性的觀點來看,Ar31 ~Ar34 更佳是各自獨立地是源自二羥苯的基團,進一步較佳是選自由源自1,2-二羥苯(鄰苯二酚)的基團和源自1,3-二羥苯(間苯二酚)的基團所組成之群組中的至少1種。尤其,從特別提高導熱性的觀點來看,Ar31 ~Ar34 ,較佳是至少包含源自間苯二酚的基團。又,從特別提高導熱性的觀點來看,由n31~n34表示的結構單元,較佳是包含源自間苯二酚之基團。Further, from the viewpoints of productivity and fluidity of the epoxy resin composition, Ar 31 to Ar 34 are more preferably each independently derived from a dihydroxybenzene group, and further preferably selected from the group consisting of 1, At least one of the group consisting of a group of 2-dihydroxybenzene (catechol) and a group derived from 1,3-dihydroxybenzene (resorcinol). In particular, from the viewpoint of particularly improving thermal conductivity, Ar 31 to Ar 34 preferably contain at least a group derived from resorcin. Moreover, from the viewpoint of particularly improving thermal conductivity, the structural unit represented by n31 to n34 preferably contains a group derived from resorcin.
當具有以選自由通式(III-1)~通式(III-4)所組成之群組中的至少1個通式表示的部分結構之化合物,包含源自間苯二酚的結構單元時,包含源自間苯二酚的基團之結構單元的含有率,從彈性模數的觀點來看,在具有由通式(III-1)~通式(III-4)中的至少1個通式表示的結構之化合物的總質量中,較佳是55質量%以上,從Tg和線膨脹係數的觀點來看,更佳是80質量%以上,從導熱性的觀點來看,進一步較佳是90質量%以上。When a compound having a partial structure represented by at least one formula selected from the group consisting of the general formulae (III-1) to (III-4), including a structural unit derived from resorcin a content ratio of a structural unit containing a group derived from resorcin, and having at least one of the general formulae (III-1) to (III-4) from the viewpoint of elastic modulus The total mass of the compound of the structure represented by the formula is preferably 55% by mass or more, more preferably 80% by mass or more from the viewpoint of Tg and coefficient of linear expansion, and further preferably from the viewpoint of thermal conductivity. It is 90% by mass or more.
通式(III-1)~通式(III-4)中的mx和nx(x是31、32、33或34中的任一者,並且mx與nx的x值相同)的比值,從流動性的觀點來看,較佳是mx/nx=20/1~1/5,更佳是20/1~5/1,進一步較佳是20/1~10/1。又,mx和nx的合計值,從流動性的觀點來看,較佳是20以下,更佳是15以下,進一步較佳是10以下。再者,m和n的合計值的下限值並無特別限制。The ratio of mx and nx (x is any one of 31, 32, 33 or 34, and the x values of mx and nx are the same) in the general formulae (III-1) to (III-4), from the flow From the viewpoint of sex, it is preferably mx/nx = 20/1 to 1/5, more preferably 20/1 to 5/1, still more preferably 20/1 to 10/1. Further, the total value of mx and nx is preferably 20 or less, more preferably 15 or less, and still more preferably 10 or less from the viewpoint of fluidity. Further, the lower limit of the total value of m and n is not particularly limited.
mx和nx表示結構單元數,是表示所對應的結構單元以何種程度被加成在分子中。因此,針對單一的分子表示整數值。再者,(mx/nx)和(mx+nx)中的mx和nx,當是複數種分子的集合體時,表示平均值也就是有理數。Mx and nx represent the number of structural units, indicating how much the corresponding structural unit is added to the molecule. Therefore, integer values are represented for a single molecule. Furthermore, mx and nx in (mx/nx) and (mx+nx), when it is a collection of a plurality of molecules, means that the average value is also a rational number.
具有以選自由通式(III-1)~通式(III-4)所組成之群組中的至少1個通式表示的部分結構之苯酚酚醛清漆樹脂,尤其當Ar31 ~Ar34 是被取代或未被取代的二羥苯和被取代或未被取代的二羥萘中的至少任一種時,這樣的苯酚酚醛清漆樹脂相較於僅經酚醛清漆化而成的酚樹脂等,其合成較容易,並有傾向可獲得熔點低的硬化劑。因此,藉由包含這樣的酚樹脂來作為硬化劑,會有環氧樹脂組成物的製造和處理變得容易等優點。 再者,苯酚酚醛清漆樹脂是否具有由通式(III-1)~通式(III-4)中的任一個通式表示的部分結構,利用場脫附質譜儀(FD-MS),藉由其片段成分是否包含相當於通式(III-1)~通式(III-4)中的任一個通式表示的部分結構的成分,便能夠進行判斷。a phenol novolak resin having a partial structure represented by at least one formula selected from the group consisting of the general formulae (III-1) to (III-4), especially when Ar 31 to Ar 34 are When at least one of a substituted or unsubstituted dihydroxybenzene and a substituted or unsubstituted dihydroxynaphthalene is used, the phenol novolac resin is synthesized as compared with a phenolic resin which is only phenolic varnish. It is easier and has a tendency to obtain a hardener having a low melting point. Therefore, by including such a phenol resin as a curing agent, there is an advantage that the production and handling of the epoxy resin composition become easy. Further, whether the phenol novolak resin has a partial structure represented by any one of the general formulae (III-1) to (III-4), by field desorption mass spectrometry (FD-MS), Whether or not the fragment component contains a component corresponding to the partial structure represented by any one of the general formulae (III-1) to (III-4) can be judged.
具有以選自由通式(III-1)~通式(III-4)所組成之群組中的至少1個通式表示的部分結構之苯酚酚醛清漆樹脂的分子量,並無特別限制。從流動性的觀點來看,作為數量平均分子量(Mn),較佳是2000以下,更佳是1500以下,進一步較佳是350~1500。又,作為重量平均分子量(Mw),較佳是2000以下,更佳是1500以下,進一步較佳是400~1500。Mn及Mw,可藉由使用GPC(膠透層析術)之通常方法來測定。The molecular weight of the phenol novolak resin having a partial structure represented by at least one formula selected from the group consisting of the general formulae (III-1) to (III-4) is not particularly limited. From the viewpoint of fluidity, the number average molecular weight (Mn) is preferably 2,000 or less, more preferably 1,500 or less, still more preferably 350 to 1,500. Further, the weight average molecular weight (Mw) is preferably 2,000 or less, more preferably 1,500 or less, still more preferably 400 to 1,500. Mn and Mw can be determined by a usual method using GPC (gel permeation chromatography).
具有以選自由通式(III-1)~通式(III-4)所組成之群組中的至少1個通式表示的部分結構之苯酚酚醛清漆樹脂的羥基當量,並無特別限制。從對耐熱性有所貢獻的交聯密度的觀點來看,羥基當量以平均值計,較佳是50g/eq~150g/eq,更佳是50g/eq~120g/eq,進一步較佳是55g/eq~120g/eq。再者,本說明書中,羥基當量是指依據日本工業規格JIS K0070:1992所測定出的值。The hydroxyl equivalent of the phenol novolak resin having a partial structure represented by at least one formula selected from the group consisting of the general formulae (III-1) to (III-4) is not particularly limited. The hydroxyl equivalent is preferably from 50 g/eq to 150 g/eq, more preferably from 50 g/eq to 120 g/eq, further preferably 55 g, from the viewpoint of crosslinking density contributing to heat resistance. /eq~120g/eq. In the present specification, the hydroxyl equivalent means a value measured in accordance with Japanese Industrial Standard JIS K0070:1992.
苯酚酚醛清漆樹脂,可包含構成苯酚酚醛清漆樹脂的酚化合物也就是單體。作為構成苯酚酚醛清漆樹脂的酚化合物也就是單體的含有率(以下,亦稱為「單體含有率」),並無特別限制。從導熱性和成形性的觀點來看,苯酚酚醛清漆樹脂中的單體含有率,較佳是5質量%~80質量%,更佳是15質量%~60質量%,進一步較佳是20質量%~50質量%。The phenol novolak resin may contain a phenol compound constituting a phenol novolak resin, that is, a monomer. The phenolic compound constituting the phenol novolak resin, that is, the content ratio of the monomer (hereinafter also referred to as "monomer content") is not particularly limited. The monomer content in the phenol novolak resin is preferably from 5% by mass to 80% by mass, more preferably from 15% by mass to 60% by mass, even more preferably from 20% by mass, from the viewpoint of thermal conductivity and moldability. % to 50% by mass.
若單體含有率是80質量%以下,因為在硬化反應時對交聯沒有貢獻的單體成分會變少,並且進行交聯的高分子量體會變多,故可形成更高密度的高階結構,並有提升導熱率的傾向。又,藉由單體含有率是5質量%以上,因為在成形時易於流動,故會有傾向能夠更加提升與無機填充材料的密合性,並能夠達成更優異的導熱性及耐熱性。When the monomer content is 80% by mass or less, since the monomer component which does not contribute to the crosslinking at the time of the hardening reaction is small, and the high molecular weight body which is crosslinked is increased, a higher-order structure having a higher density can be formed. And there is a tendency to increase the thermal conductivity. In addition, since the monomer content is 5% by mass or more, since it tends to flow during molding, there is a tendency that the adhesion to the inorganic filler can be further improved, and further excellent thermal conductivity and heat resistance can be achieved.
環氧樹脂組成物中的硬化劑的含量並無特別限制。例如,當硬化劑是胺系硬化劑時,胺系硬化劑的活性氫的當量數(胺當量數)、與環氧化合物的環氧基的當量數(環氧當量數)之比值(胺當量數/環氧當量數),較佳是成為0.5~2.0,更佳是成為0.8~1.2。又,當硬化劑是酚系硬化劑時,酚系硬化劑的酚性羥基的當量數(酚性羥基當量數)、與環氧化合物的環氧基的當量數之比值(酚性羥基的當量數/環氧基的當量數),較佳是成為0.5~2.0,更佳是成為0.8~1.2。The content of the hardener in the epoxy resin composition is not particularly limited. For example, when the curing agent is an amine-based curing agent, the ratio of the number of equivalents of the active hydrogen of the amine-based curing agent (the number of amine equivalents) to the number of equivalents of the epoxy group of the epoxy compound (the number of epoxy equivalents) (amine equivalent) The number/epoxy equivalent number is preferably from 0.5 to 2.0, more preferably from 0.8 to 1.2. In addition, when the curing agent is a phenolic curing agent, the ratio of the number of equivalents of the phenolic hydroxyl group (the number of phenolic hydroxyl groups) of the phenolic curing agent to the number of equivalents of the epoxy group of the epoxy compound (the equivalent of the phenolic hydroxyl group) The number of equivalents of the number of epoxy groups is preferably from 0.5 to 2.0, more preferably from 0.8 to 1.2.
(硬化促進劑) 當在環氧樹脂組成物中使用酚系硬化劑時,可依據需要併用硬化促進劑。藉由併用硬化促進劑,能夠進一步充分地使環氧樹脂組成物硬化。硬化促進劑的種類和含量並無特別限制,從反應速度、反應溫度及保管性的觀點來看,能夠選擇適合的硬化促進劑。(Curing Agent) When a phenolic curing agent is used in the epoxy resin composition, a curing accelerator may be used in combination as needed. Further, the epoxy resin composition can be sufficiently cured by using a curing accelerator in combination. The type and content of the curing accelerator are not particularly limited, and a suitable curing accelerator can be selected from the viewpoints of the reaction rate, the reaction temperature, and the storage stability.
具體而言,可列舉:咪唑化合物、三級胺化合物、有機膦化合物、及有機膦化合物與有機硼化合物之錯合物等。其中,從耐熱性的觀點來看,較佳是選自由有機膦化合物、及有機膦化合物與有機硼化合物之錯合物所組成之群組中的至少1種。Specific examples thereof include an imidazole compound, a tertiary amine compound, an organic phosphine compound, and a complex of an organic phosphine compound and an organoboron compound. Among them, from the viewpoint of heat resistance, at least one selected from the group consisting of an organic phosphine compound and a complex of an organic phosphine compound and an organoboron compound is preferred.
作為有機膦化合物,具體而言,可列舉:三苯膦、二苯(對甲苯)膦、參(烷基苯)膦、參(烷氧基苯)膦、參(烷基烷氧基苯)膦、參(二烷基苯)膦、參(三烷基苯)膦、參(四烷基苯)膦、參(二烷氧基苯)膦、參(三烷氧基苯)膦、參(四烷氧基苯)膦、三烷膦、二烷基芳膦、烷基二芳膦等。Specific examples of the organic phosphine compound include triphenylphosphine, diphenyl (p-toluene) phosphine, stilbene (alkyl phenyl) phosphine, ginseng (alkoxyphenyl) phosphine, and ginsyl (alkyl alkoxybenzene). Phosphine, ginseng (dialkyl phenyl) phosphine, ginseng (trialkyl phenyl) phosphine, stilbene (tetraalkyl phenyl) phosphine, quinone (dialkoxyphenyl) phosphine, ginseng (trialkoxyphenyl) phosphine, ginseng (Tetraalkoxyphenyl)phosphine, trialkylphosphine, dialkylarylphosphine, alkyldiarylphosphine, and the like.
又,作為有機膦化合物與有機硼化合物之錯合物,具體而言,可列舉:四苯硼酸四苯基鏻、四對甲苯硼酸四苯鏻、四苯硼酸四丁鏻、正丁基三苯硼酸四苯鏻、四苯硼酸丁基三苯鏻、四苯硼酸甲基三丁鏻等。 這些硬化促進劑,可以單獨使用1種,亦可以組合2種以上來使用。Further, specific examples of the complex of the organic phosphine compound and the organoboron compound include tetraphenylphosphonium tetraphenylborate, tetraphenylphosphonium tetra-p-toluateborate, tetrabutylphosphonium tetraphenylborate, and n-butyltriphenylbenzene. Tetraphenyl hydride borate, butyl triphenyl sulfonium tetraphenylborate, methyl tributyl hydrazine tetraphenyl borate, and the like. These hardening accelerators may be used alone or in combination of two or more.
當組合2種以上的硬化促進劑來使用時,混合比例能夠依據半硬化環氧樹脂組成物所被要求的特性(例如需要成為何種程度的柔軟性)來決定,並無特別限制。When two or more kinds of curing accelerators are used in combination, the mixing ratio can be determined depending on the characteristics required for the semi-cured epoxy resin composition (for example, the degree of flexibility required), and is not particularly limited.
當環氧樹脂組成物包含硬化促進劑時,環氧樹脂組成物中的硬化促進劑的含有率並無特別限制。從成形性的觀點來看,硬化促進劑的含有率,較佳是環氧化合物與硬化劑的合計質量的0.5質量%~1.5質量%,更佳是0.5質量%~1質量%,進一步較佳是0.6質量%~1質量%。When the epoxy resin composition contains a hardening accelerator, the content of the hardening accelerator in the epoxy resin composition is not particularly limited. The content of the curing accelerator is preferably from 0.5% by mass to 1.5% by mass, more preferably from 0.5% by mass to 1% by mass, even more preferably from 0.5% by mass to 1% by mass based on the total mass of the epoxy compound and the curing agent. It is 0.6% by mass to 1% by mass.
(無機填充材料) 環氧樹脂組成物可包含至少1種無機填充材料。藉由包含無機填充材料,環氧樹脂組成物能夠達到高的導熱率。 無機填充材料可以是非導電性,亦可以是導電性。藉由使用非導電性的無機填充材料,會有傾向可減少絕緣性降低的風險。又,藉由使用導電性的無機填充材料,會有傾向更加提升導熱性。(Inorganic Filler) The epoxy resin composition may contain at least one inorganic filler. The epoxy resin composition can achieve high thermal conductivity by including an inorganic filler. The inorganic filler material may be non-conductive or electrically conductive. By using a non-conductive inorganic filler, there is a tendency to reduce the risk of insulation degradation. Moreover, by using a conductive inorganic filler, there is a tendency to further improve thermal conductivity.
作為非導電性的無機填充材料,具體而言,可列舉:氧化鋁(礬土)、氧化鎂、氮化鋁、氮化硼、氮化矽、二氧化矽(氧化矽)、氫氧化鋁、硫酸鋇等。又,作為導電性的無機填充材料,可列舉:金、銀、鎳、銅等。其中,從導熱率的觀點來看,作為無機填充材料,較佳是選自由氧化鋁(礬土)、氮化硼、氧化鎂、氮化鋁和二氧化矽(氧化矽)所組成之群組中的至少1種,更佳是選自由氮化硼和氧化鋁(礬土)所組成之群組中的至少1種。 這些無機填充材料,可以單獨使用1種,亦能夠組合2種以上來使用。Specific examples of the non-conductive inorganic filler include alumina (alumina), magnesium oxide, aluminum nitride, boron nitride, tantalum nitride, cerium oxide (cerium oxide), and aluminum hydroxide. Barium sulfate and the like. Moreover, as a conductive inorganic filler, gold, silver, nickel, copper, etc. are mentioned. Among them, from the viewpoint of thermal conductivity, as the inorganic filler, it is preferably selected from the group consisting of alumina (alumina), boron nitride, magnesium oxide, aluminum nitride, and cerium oxide (cerium oxide). At least one of them is more preferably at least one selected from the group consisting of boron nitride and alumina (alumina). These inorganic fillers may be used alone or in combination of two or more.
無機填充材料,較佳是混合2種以上的彼此體積平均粒徑不同者來使用。利用混合2種以上的彼此體積平均粒徑不同的無機填充材料,小粒徑的無機填充材料會被填裝(packing)在大粒徑的無機填充材料的空隙,藉此,比起僅使用單一粒徑的無機填充材料,因為無機填充材料可更密集地填充,故能夠發揮更高的導熱率。 具體而言,當使用氧化鋁來作為無機填充材料時,在無機填充材料中,藉由利用下述範圍的比例能夠最密集填充化,該範圍是:體積平均粒徑16μm~20μm的氧化鋁是60體積%~75體積%、體積平均粒徑2μm~4μm的氧化鋁是10體積%~20體積%、及體積平均粒徑0.3μm~0.5μm的氧化鋁是10體積%~20體積%。 進一步,當併用氮化硼和氧化鋁來作為無機填充材料時,在無機填充材料中,藉由利用下述範圍的比例能夠更高導熱化,該範圍是:體積平均粒徑20μm~100μm的氮化硼是60體積%~90體積%、體積平均粒徑2μm~4μm的氧化鋁是5體積%~20體積%、及體積平均粒徑0.3μm~0.5μm的氧化鋁是5體積%~20體積%。無機填充材料的體積平均粒徑,可使用雷射繞射散射粒度分布裝置以通常的條件來測定。The inorganic filler is preferably used by mixing two or more kinds of volume average particle diameters. By mixing two or more kinds of inorganic fillers having different volume average particle diameters from each other, the inorganic filler having a small particle diameter is packed in the voids of the inorganic filler having a large particle diameter, thereby using only a single The inorganic filler of the particle size can exhibit a higher thermal conductivity because the inorganic filler can be more densely packed. Specifically, when alumina is used as the inorganic filler, the inorganic filler can be most densely packed by using a ratio of a range of alumina having a volume average particle diameter of 16 μm to 20 μm. 60% by volume to 75% by volume, alumina having a volume average particle diameter of 2 μm to 4 μm is 10% by volume to 20% by volume, and alumina having a volume average particle diameter of 0.3 μm to 0.5 μm is 10% by volume to 20% by volume. Further, when boron nitride and aluminum oxide are used in combination as the inorganic filler, the inorganic filler can be made more thermally conductive by using a ratio of a volume having a volume average particle diameter of 20 μm to 100 μm. Boron is 60% by volume to 90% by volume, alumina having a volume average particle diameter of 2 μm to 4 μm is 5% by volume to 20% by volume, and alumina having a volume average particle diameter of 0.3 μm to 0.5 μm is 5% by volume to 20% by volume. %. The volume average particle diameter of the inorganic filler can be measured under normal conditions using a laser diffraction scattering particle size distribution device.
無機填充材料的體積平均粒徑(D50 ),能夠使用雷射繞射散射法來測定。例如,萃取環氧樹脂組成物中的無機填充材料,使用雷射繞射散射粒度分布裝置(例如,貝克曼庫爾特公司製造,商品名LS230)進行測定。具體而言,使用有機溶劑、硝酸、王水等,由環氧樹脂組成物中萃取出無機填充材料成分,並利用超音波分散機等充分地分散,測定此分散液的重量累積粒度分布曲線。 體積平均粒徑(D50 ),意指在藉由上述測定所獲得的粒度分布曲線中由小粒徑側起算累積至50%的粒徑。The volume average particle diameter (D 50 ) of the inorganic filler can be measured by a laser diffraction scattering method. For example, the inorganic filler in the epoxy resin composition is extracted and measured using a laser diffraction scattering particle size distribution device (for example, Beckman Coulter, trade name LS230). Specifically, an inorganic filler component is extracted from the epoxy resin composition using an organic solvent, nitric acid, aqua regia, or the like, and sufficiently dispersed by an ultrasonic disperser or the like, and the weight cumulative particle size distribution curve of the dispersion is measured. The volume average particle diameter (D 50 ) means a particle diameter which is accumulated to 50% from the small particle diameter side in the particle size distribution curve obtained by the above measurement.
環氧樹脂組成物中的無機填充材料的含有率並無特別限制。其中,從導熱性的觀點來看,相對於環氧樹脂組成物的總固體成分的總體積100體積%,無機填充材料的含有率較佳是超過50體積%,更佳是超過70體積%且90體積%以下。 若無機填充材料的含有率超過50體積%,便能夠達成更高的導熱率。另一方面,若無機填充材料的含有率是90體積%以下,會有傾向可抑制環氧樹脂組成物的柔軟性的降低、和絕緣性的降低。The content of the inorganic filler in the epoxy resin composition is not particularly limited. Here, from the viewpoint of thermal conductivity, the content of the inorganic filler is preferably more than 50% by volume, more preferably more than 70% by volume, based on 100% by volume of the total volume of the total solid content of the epoxy resin composition. 90% by volume or less. If the content of the inorganic filler exceeds 50% by volume, a higher thermal conductivity can be achieved. On the other hand, when the content of the inorganic filler is 90% by volume or less, there is a tendency to suppress a decrease in flexibility of the epoxy resin composition and a decrease in insulation properties.
(矽烷耦合劑) 環氧樹脂組成物可包含至少1種矽烷耦合劑。矽烷耦合劑,被認為能夠藉由下述作用,來達到使絕緣可靠性提升的效果,該作用是:在無機填充材料的表面與包圍在其周圍的樹脂之間形成共價鍵的作用(相當於黏結劑)、導熱率的提升及妨礙水分的滲入等作用。(Cane Coupling Agent) The epoxy resin composition may contain at least one decane coupling agent. The decane coupling agent is considered to have an effect of improving the insulation reliability by the action of forming a covalent bond between the surface of the inorganic filler and the resin surrounding it (equivalent In the binder), the increase in thermal conductivity and the infiltration of moisture.
作為矽烷耦合劑的種類並無特別限定,亦可以使用市售的矽烷耦合劑。若考慮具有液晶原骨架之環氧化合物與硬化劑的相容性、和欲降低在樹脂層與無機填充材料之間的界面的導熱損失,在本實施形態中,適合使用在末端上具有環氧基、胺基、巰基、胺酯基及羥基之矽烷耦合劑。The type of the decane coupling agent is not particularly limited, and a commercially available decane coupling agent can also be used. Considering the compatibility of the epoxy compound having a liquid crystal original skeleton with a hardener and the heat loss at the interface between the resin layer and the inorganic filler, in the present embodiment, it is suitable to use an epoxy at the end. a decane coupling agent of a group, an amine group, a thiol group, an amine ester group, and a hydroxyl group.
作為矽烷耦合劑的具體例,可列舉:3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-(2-胺乙基)胺丙基三甲氧基矽烷、3-(2-胺乙基)胺丙基三甲氧基矽烷、3-胺丙基三甲氧基矽烷、3-苯基胺丙基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-胺酯基丙基三乙氧基矽烷等。又,亦可列舉商品名SC-6000KS2所代表的矽烷耦合劑寡聚物(Hitachi Chemical Techno Service股份有限公司製造)等。這些矽烷耦合劑可以單獨使用1種,亦可以組合2種以上。Specific examples of the decane coupling agent include 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, and 3-epoxypropoxypropylmethyl. Diethoxy decane, 3-glycidoxypropylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-aminopropyltri Ethoxy decane, 3-(2-aminoethyl)aminopropyltrimethoxydecane, 3-(2-aminoethyl)aminopropyltrimethoxydecane, 3-aminopropyltrimethoxydecane, 3 Phenylaminopropyltrimethoxydecane, 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyltriethoxydecane, 3-aminoesterpropyltriethoxydecane, and the like. Further, a decane coupling agent oligomer (manufactured by Hitachi Chemical Techno Service Co., Ltd.) represented by the trade name SC-6000KS2 may be mentioned. These decane coupling agents may be used alone or in combination of two or more.
(其他成分) 環氧樹脂組成物,依據需要,除了上述成分,亦可包含其他成分。作為其他成分,例如能夠例舉:溶劑、彈性體、分散劑及沉澱防止劑。 作為溶劑,只要不會妨礙環氧樹脂組成物的硬化反應者,並無特別限制,能夠適當選擇通常所用的有機溶劑來使用。(Other components) The epoxy resin composition may contain other components in addition to the above components as needed. As other components, a solvent, an elastomer, a dispersing agent, and a precipitation inhibitor can be mentioned, for example. The solvent is not particularly limited as long as it does not interfere with the curing reaction of the epoxy resin composition, and an organic solvent which is usually used can be appropriately selected and used.
[樹脂薄片] 本實施形態的樹脂薄片是環氧樹脂組成物的薄片狀成形體。樹脂薄片,能夠利用在支撐體上塗佈清漆狀的環氧樹脂組成物(以下,亦稱為「樹脂清漆」)來形成樹脂層(環氧樹脂組成物層)後,藉由乾燥從樹脂層去除至少一部分的有機溶劑來製造,該清漆狀的環氧樹脂組成物是在環氧樹脂組成物中添加甲基乙基酮、環己酮等有機溶劑所調製而成。作為支撐體,例如可列舉:PET(聚對苯二甲酸乙二酯)薄膜等脫模薄膜。[Resin Sheet] The resin sheet of the present embodiment is a sheet-like formed body of an epoxy resin composition. The resin sheet can be formed by applying a varnish-like epoxy resin composition (hereinafter also referred to as "resin varnish") to the support to form a resin layer (epoxy resin composition layer), and then drying the resin layer. It is produced by removing at least a part of an organic solvent, and the varnish-like epoxy resin composition is prepared by adding an organic solvent such as methyl ethyl ketone or cyclohexanone to the epoxy resin composition. Examples of the support include a release film such as a PET (polyethylene terephthalate) film.
樹脂清漆的塗佈,能夠藉由公知的方法來實施。具體而言,能夠藉由刮刀式塗佈 (comma coating)、模具塗佈(die coating)、模唇塗佈(lip coating)、凹板塗佈機(gravure coating)等方法來實行。作為形成特定厚度的環氧樹脂組成物層的方法,可列舉:使被塗佈物通過間隙(gap)之間的刮刀式塗佈法、將從噴嘴調節流量的樹脂清漆進行塗佈的模具塗佈法等。例如,當乾燥前的樹脂層(環氧樹脂組成物層)的厚度是50μm~500μm時,較佳是使用刮刀式塗佈法。The application of the resin varnish can be carried out by a known method. Specifically, it can be carried out by a method such as comma coating, die coating, lip coating, or gravure coating. As a method of forming the epoxy resin composition layer of a specific thickness, a coating method of applying a resin varnish that adjusts a flow rate from a nozzle by passing a coating object through a gap between the gaps is mentioned. Bufa and so on. For example, when the thickness of the resin layer (epoxy resin composition layer) before drying is 50 μm to 500 μm, a doctor blade coating method is preferably used.
乾燥方法,只要能夠去除至少一部分包含在樹脂清漆中的有機溶劑,並無特別限制,能夠由通常所使用的乾燥方法,並依據樹脂清漆所包含的有機溶劑來適當選擇。一般而言,可列舉在80℃~150℃左右進行熱處理的方法。The drying method is not particularly limited as long as it can remove at least a part of the organic solvent contained in the resin varnish, and can be appropriately selected depending on the drying method generally used and the organic solvent contained in the resin varnish. In general, a method of performing heat treatment at about 80 to 150 ° C is exemplified.
樹脂薄片的密度並無特別限制,例如能夠設為3g/cm2 ~3.4g/cm2 。若考慮到兼具樹脂薄片的柔軟性與導熱率,較佳是3g/cm2 ~3.3g/cm2 ,更佳是3.1 g/cm2 ~3.3g/cm2 。 樹脂薄片的密度,例如能夠利用無機填充材料的調配量來調整。The density of the resin sheet is not particularly limited, and can be, for example, 3 g/cm 2 to 3.4 g/cm 2 . In view of the flexibility and thermal conductivity of the resin sheet, it is preferably from 3 g/cm 2 to 3.3 g/cm 2 , more preferably from 3.1 g/cm 2 to 3.3 g/cm 2 . The density of the resin sheet can be adjusted, for example, by the amount of the inorganic filler.
樹脂薄片的厚度並無特別限制,能夠依據目的來適當選擇。例如,樹脂薄片的厚度,能夠設為50μm~350μm,從導熱率、電氣絕緣性及薄片可撓性的觀點來看,較佳是60μm~300μm。The thickness of the resin sheet is not particularly limited and can be appropriately selected depending on the purpose. For example, the thickness of the resin sheet can be 50 μm to 350 μm, and is preferably 60 μm to 300 μm from the viewpoint of thermal conductivity, electrical insulation, and sheet flexibility.
樹脂薄片(環氧樹脂組成物層),幾乎不會進行硬化反應。因此,雖然具有可撓性,但是缺乏作為薄片的柔軟性。從而,在去除PET薄膜等支撐體而成的狀態會缺乏自立性,有時會難以處理的情況。所以樹脂薄片較佳是將構成樹脂薄片的環氧樹脂組成物進行半硬化處理而成者。樹脂薄片在環氧樹脂組成物層至成為半硬化狀態(B階段狀態),較佳是進一步進行熱處理而成的B階段薄片。The resin sheet (epoxy resin composition layer) hardly undergoes a hardening reaction. Therefore, although it has flexibility, it lacks flexibility as a sheet. Therefore, the state in which the support such as the PET film is removed may lack self-standing property and may be difficult to handle. Therefore, it is preferable that the resin sheet is subjected to semi-hardening treatment of the epoxy resin composition constituting the resin sheet. The resin sheet is in a semi-hardened state (B-stage state) in the epoxy resin composition layer, and is preferably a B-stage sheet which is further subjected to heat treatment.
[B階段薄片] 本實施形態的B階段薄片,是環氧樹脂組成物的薄片狀的半硬化物。 B階段薄片,例如能夠藉由包含將樹脂薄片進行熱處理至B階段狀態這樣的步驟之製造方法來製造。利用熱處理來形成樹脂薄片,可使導熱率和電氣絕緣性優異,並使作為B階段薄片的可撓性和使用壽命優異。 本實施形態中所謂的B階段薄片,意指由下述環氧樹脂組成物所形成的樹脂薄片,該環氧樹脂組成物的黏度,在常溫(25℃)中是104 Pa‧s~105 Pa‧s並且在100℃是102 Pa‧s~103 Pa‧s。又,硬化後的環氧樹脂組成物層即便進行加熱亦不會進行熔融。再者,上述黏度,可藉由動態黏彈性測定(頻率1Hz、負重40g、升溫速度3℃/分鐘)來測定。[B-stage sheet] The B-stage sheet of the present embodiment is a sheet-like semi-cured material of an epoxy resin composition. The B-stage sheet can be produced, for example, by a production method including a step of heat-treating the resin sheet to a B-stage state. The heat treatment to form the resin sheet is excellent in thermal conductivity and electrical insulation, and is excellent in flexibility and service life as a B-stage sheet. The B-stage sheet in the present embodiment means a resin sheet formed of the following epoxy resin composition, and the viscosity of the epoxy resin composition is 10 4 Pa ‧ s to 10 at normal temperature (25 ° C) 5 Pa‧s and 10 2 Pa‧s to 10 3 Pa‧s at 100 °C. Further, the cured epoxy resin composition layer does not melt even when heated. Further, the viscosity can be measured by dynamic viscoelasticity measurement (frequency 1 Hz, load weight 40 g, temperature increase rate 3 ° C/min).
將樹脂薄片進行熱處理的條件,只要能夠將環氧樹脂組成物層進行半硬化至B階段狀態,並無特別限制,能夠依據環氧樹脂組成物的構成來適當選擇。熱處理,從用以減少塗佈樹脂清漆時所產生在樹脂層中的空隙(空孔)的目的來看,較佳是藉由選自熱真空加壓、熱輥層疊等的方法來實行。藉此,便能夠效率良好地製造表面平坦的B階段薄片。 具體而言,例如在以減壓下(例如,1kPa)、溫度80℃~130℃、1秒~30秒、1MPa~30MPa的壓合壓力的條件進行加熱和加壓處理,藉此便能夠使環氧樹脂組成物半硬化至B階段狀態。The conditions for heat-treating the resin sheet are not particularly limited as long as the epoxy resin composition layer can be semi-hardened to the B-stage state, and can be appropriately selected depending on the configuration of the epoxy resin composition. The heat treatment is preferably carried out by a method selected from the group consisting of thermal vacuum pressing, hot roll lamination, and the like for the purpose of reducing voids (pores) generated in the resin layer when the resin varnish is applied. Thereby, the B-stage sheet having a flat surface can be efficiently produced. Specifically, for example, heating and pressurization are carried out under the conditions of a pressure of 80 ° C to 130 ° C, 1 second to 30 seconds, and 1 MPa to 30 MPa under reduced pressure (for example, 1 kPa), whereby it is possible to The epoxy resin composition is semi-hardened to a B-stage state.
B階段薄片的厚度,能夠依據目的來適當選擇。例如能夠設為50μm~350μm,從導熱率、電氣絕緣性及可撓性的觀點來看,較佳是60μm~300μm。又,藉由一邊積層2層以上的樹脂薄片一邊進行熱加壓,亦能夠製造具有環氧樹脂組成物層之樹脂薄片。The thickness of the B-stage sheet can be appropriately selected depending on the purpose. For example, it can be 50 μm to 350 μm, and is preferably 60 μm to 300 μm from the viewpoint of thermal conductivity, electrical insulation, and flexibility. Moreover, a resin sheet having an epoxy resin composition layer can be produced by heat-pressing while laminating two or more resin sheets.
〈半硬化環氧樹脂組成物〉 本實施形態的半硬化環氧樹脂組成物,是環氧樹脂組成物之半硬化物。半硬化環氧樹脂組成物,是源自環氧樹脂組成物者,並可將環氧樹脂組成物進行半硬化處理來獲得。<Semi-hardened epoxy resin composition> The semi-hardened epoxy resin composition of the present embodiment is a semi-cured material of an epoxy resin composition. The semi-hardened epoxy resin composition is derived from an epoxy resin composition and can be obtained by subjecting the epoxy resin composition to a semi-hardening treatment.
本實施形態中所謂的半硬化環氧樹脂組成物,意指下述環氧樹脂組成物之半硬化物,該環氧樹脂組成物若加熱至80℃~120℃樹脂成分會熔融,並且黏度會降低至10Pa‧s~104 Pa‧s。又,後述的硬化環氧樹脂組成物即使藉由加熱,樹脂成分亦不會熔融。再者,上述黏度,可藉由動態黏彈性測定(頻率1Hz、負重40g、升溫速度3℃/分鐘)來測定。 半硬化處理,例如能夠藉由將環氧樹脂組成物在溫度50℃~180℃加熱1分鐘~30分鐘的方法來實行。The semi-cured epoxy resin composition in the present embodiment means a semi-cured material of the following epoxy resin composition. When the epoxy resin composition is heated to 80 ° C to 120 ° C, the resin component is melted, and the viscosity is increased. Reduced to 10Pa‧s to 10 4 Pa‧s. Further, even if the cured epoxy resin composition described later is heated, the resin component does not melt. Further, the viscosity can be measured by dynamic viscoelasticity measurement (frequency 1 Hz, load weight 40 g, temperature increase rate 3 ° C/min). The semi-hardening treatment can be carried out, for example, by heating the epoxy resin composition at a temperature of 50 to 180 ° C for 1 minute to 30 minutes.
[硬化環氧樹脂組成物] 本實施形態的硬化環氧樹脂組成物,是環氧樹脂組成物的硬化物。本實施形態的硬化環氧樹脂組成物,是源自環氧樹脂組成物者,並將環氧樹脂組成物進行硬化處理來獲得。本實施形態的硬化環氧樹脂組成物,導熱性優異,這能夠認為是因為包含在環氧樹脂組成物中的在分子內具有液晶原之環氧化合物形成層列型結構所導致。[Hardified Epoxy Resin Composition] The cured epoxy resin composition of the present embodiment is a cured product of an epoxy resin composition. The cured epoxy resin composition of the present embodiment is obtained by using an epoxy resin composition and curing the epoxy resin composition. The cured epoxy resin composition of the present embodiment is excellent in thermal conductivity, and it is considered that the epoxy compound having a liquid crystal element in the molecule contained in the epoxy resin composition is formed into a smectic structure.
硬化環氧樹脂組成物,能夠將未硬化狀態的環氧樹脂組成物或半硬化環氧樹脂組成物進行硬化處理來獲得。硬化處理的方法,能夠依據環氧樹脂組成物的構成和硬化環氧樹脂組成物的目的等來適當選擇,較佳是加熱和加壓處理。 例如,藉由將未硬化狀態或硬化狀態的環氧樹脂組成物在100~250℃中加熱1小時~10小時,更佳是在130~230℃加熱1小時~8小時,便可獲得硬化環氧樹脂組成物。The hardened epoxy resin composition can be obtained by subjecting an uncured epoxy resin composition or a semi-hardened epoxy resin composition to a hardening treatment. The method of the hardening treatment can be appropriately selected depending on the constitution of the epoxy resin composition, the purpose of curing the epoxy resin composition, and the like, and is preferably heated and pressurized. For example, the hardening ring can be obtained by heating the epoxy resin composition in an uncured state or a hardened state at 100 to 250 ° C for 1 hour to 10 hours, more preferably at 130 to 230 ° C for 1 hour to 8 hours. Oxygen resin composition.
[附有樹脂之金屬箔] 本實施形態的附有樹脂之金屬箔,具備:金屬箔;及,半硬化樹脂組成物層,其源自環氧樹脂組成物,並被配置在金屬箔上。藉由具有源自環氧樹脂組成物的半硬化樹脂組成物層,導熱率、電氣絕緣性優異。半硬化樹脂組成物層,能夠將環氧樹脂組成物熱處理至成為B階段狀態來獲得。[Metal foil with resin] The resin-attached metal foil of the present embodiment includes a metal foil and a semi-hardened resin composition layer derived from the epoxy resin composition and disposed on the metal foil. The semi-hardened resin composition layer derived from the epoxy resin composition is excellent in thermal conductivity and electrical insulation. The semi-hardened resin composition layer can be obtained by heat-treating the epoxy resin composition to a B-stage state.
作為金屬箔,並無特別限制,可列舉:金箔、銅箔、鋁箔等,一般而言可使用銅箔。 作為金屬箔的厚度,例如可列舉1μm~35μm,從可撓性的觀點來看,較佳是20μm以下。 又,作為金屬箔,能夠使用3層結構之複合箔或2層結構之複合箔;該3層結構之複合箔是在3層結構之複合箔的雙面上設置金屬層而成,該3層結構之複合箔是將鎳、鎳磷、鎳錫合金、鎳鐵合金、鉛、鉛錫合金等設為中間層,並在該中間層的雙面上設置銅箔而成;該2層結構之複合箔是將鋁與銅箔複合而成。針對上述在中間層的雙面上設置銅箔而成的3層結構之複合箔,較佳是將其中一銅層的厚度設為0.5μm~15μm,並將另一銅層的厚度設為10μm~300μm。The metal foil is not particularly limited, and examples thereof include a gold foil, a copper foil, and an aluminum foil. Generally, a copper foil can be used. The thickness of the metal foil is, for example, 1 μm to 35 μm, and preferably 20 μm or less from the viewpoint of flexibility. Further, as the metal foil, a composite foil having a three-layer structure or a composite foil having a two-layer structure can be used; the composite foil of the three-layer structure is formed by providing a metal layer on both sides of a composite foil having a three-layer structure, and the three layers The composite foil of the structure is made of nickel, nickel phosphorus, nickel-tin alloy, nickel-iron alloy, lead, lead-tin alloy or the like as an intermediate layer, and copper foil is provided on both sides of the intermediate layer; the composite of the two-layer structure The foil is a composite of aluminum and copper foil. For the composite foil having a three-layer structure in which copper foil is provided on both sides of the intermediate layer, it is preferable to set the thickness of one of the copper layers to 0.5 μm to 15 μm and the thickness of the other copper layer to 10 μm. ~300μm.
附有樹脂之金屬箔,例如能夠利用藉由在金屬箔上塗佈環氧樹脂組成物(較佳為樹脂清漆)並進行乾燥,而形成樹脂層(樹脂薄片),並將樹脂層(樹脂薄片)進行熱處理來作成B階段狀態來製造。樹脂層的形成方法如同前述。A metal foil to which a resin is attached can be formed, for example, by coating an epoxy resin composition (preferably, a resin varnish) on a metal foil to form a resin layer (resin sheet), and a resin layer (resin sheet) The heat treatment is performed to produce a B-stage state. The method of forming the resin layer is as described above.
附有樹脂之金屬箔的製造條件並無特別限制,較佳是在乾燥後的樹脂箔片中,用於樹脂清漆中的有機溶劑揮發了80質量%以上。作為乾燥溫度,並無特別限制,較佳是80℃~180℃左右。作為乾燥時間,能夠配合樹脂清漆的凝膠化時間來適當選擇。樹脂清漆的塗佈量,較佳是以乾燥後的樹脂層的厚度成為50μm~350μm的方式來塗佈,更佳是成為60μm~300μm。 乾燥後的樹脂薄片,藉由進一步進行熱處理而成為B階段狀態。將樹脂組成物進行熱處理的條件與B階段的熱處理條件相同。The production conditions of the resin-attached metal foil are not particularly limited, and it is preferred that the organic solvent used in the resin varnish is volatilized by 80% by mass or more in the resin foil after drying. The drying temperature is not particularly limited, but is preferably about 80 to 180 °C. The drying time can be appropriately selected in accordance with the gelation time of the resin varnish. The coating amount of the resin varnish is preferably applied so that the thickness of the resin layer after drying is 50 μm to 350 μm, and more preferably 60 μm to 300 μm. The dried resin sheet is in a B-stage state by further heat treatment. The conditions for heat-treating the resin composition are the same as those for the B-stage heat treatment.
[金屬基板] 本實施形態的金屬基板,依序具備:金屬支撐體;硬化環氧樹脂組成物層,其源自環氧樹脂組成物,並被配置在金屬支撐體上;及,金屬箔,其被配置在硬化環氧樹脂組成物層上。被配置在金屬支撐體與金屬箔之間的包含環氧樹脂組成物之環氧樹脂組成物層,是以成為硬化狀態的方式進行熱處理而成者,並且黏著性、導熱率及電氣絕緣性優異。[Metal substrate] The metal substrate of the present embodiment includes, in order, a metal support, a cured epoxy resin composition layer derived from an epoxy resin composition, and disposed on a metal support; and a metal foil, It is disposed on the hardened epoxy composition layer. The epoxy resin composition layer containing the epoxy resin composition disposed between the metal support and the metal foil is heat-treated in a hardened state, and is excellent in adhesion, thermal conductivity, and electrical insulation. .
金屬支撐體,依據目的,能夠適當選擇其材料和厚度等。具體而言,能夠使用鋁、鐵等金屬,並將厚度設為0.5mm~5mm。The metal support can be appropriately selected depending on the purpose, its material, thickness, and the like. Specifically, a metal such as aluminum or iron can be used, and the thickness is set to 0.5 mm to 5 mm.
被配置在硬化樹脂組成物層上的金屬箔,與附有樹脂之金屬箔中的金屬箔具有相同的定義,較佳的態樣亦相同。The metal foil disposed on the hardened resin composition layer has the same definition as the metal foil in the resin-attached metal foil, and the preferred embodiment is also the same.
本實施形態的金屬基板,例如能夠利用下述的方式來製造。在鋁等金屬支撐體上,與上述同樣地藉由塗佈環氧樹脂組成物並進行乾燥,來形成樹脂層,進一步在樹脂層上配置金屬箔,並將其進行加熱和加壓處理,便能夠使樹脂層硬化來製造。又,以樹脂層與金屬支撐體對向的方式,將附有樹脂之金屬箔對齊貼合在金屬支撐體上,並將其加熱和加壓處理,便能夠藉由使樹脂層硬化來製造。 [實施例]The metal substrate of the present embodiment can be produced, for example, by the following means. On the metal support such as aluminum, the epoxy resin composition is applied and dried in the same manner as described above to form a resin layer, and further, a metal foil is placed on the resin layer, and heated and pressurized. It can be manufactured by hardening a resin layer. Further, the resin-coated metal foil is bonded to the metal support so as to face the metal support, and is heated and pressurized to be cured by curing the resin layer. [Examples]
以下,藉由實施例更具體地說明本發明,但是本發明並未限定於這些實施例。Hereinafter, the present invention will be specifically described by way of examples, but the invention is not limited to the examples.
以下,表示用於環氧樹脂組成物的製作的材料與其簡稱。 (具有液晶原骨架之環氧化合物A(樹脂A)) ‧4-{4-(2,3-環氧基丙氧基)苯基}環己基=4-(2,3-環氧基丙氧基)苯甲酸酯[環氧基當量:212g/eq;藉由日本特開2011-74366號公報所述之方法來製造]Hereinafter, a material used for the production of the epoxy resin composition and an abbreviation thereof will be described. (Epoxy compound A (resin A) having a liquid crystal original skeleton) ‧4-{4-(2,3-epoxypropoxy)phenyl}cyclohexyl=4-(2,3-epoxypropane Oxy) benzoate [epoxy equivalent: 212 g/eq; manufactured by the method described in JP-A-2011-74366]
(具有液晶原骨架之環氧化合物B(樹脂B)) ‧4-{4-(2,3-環氧基丙氧基)苯基}環己基=4-(2,3-環氧基丙氧基)-3-甲基苯甲酸酯[環氧基當量:219g/eq;藉由日本特開2011-74366號公報所述之方法來製造](Epoxy compound B (resin B) having a liquid crystal original skeleton) ‧4-{4-(2,3-epoxypropoxy)phenyl}cyclohexyl=4-(2,3-epoxypropane Oxy)-3-methylbenzoate [epoxy equivalent: 219 g/eq; manufactured by the method described in JP-A-2011-74366]
(具有液晶原骨架之其他環氧化合物) ‧YL6121H[聯苯型環氧化合物;三菱化學股份有限公司製造;環氧當量:172g/eq](Other epoxy compounds having a liquid crystal original skeleton) ‧YL6121H [biphenyl type epoxy compound; manufactured by Mitsubishi Chemical Corporation; epoxy equivalent: 172g/eq]
(不具有液晶原骨架之環氧化合物) ‧828EL[液狀雙酚A型環氧化合物;三菱化學股份有限公司製造;環氧當量:186g/eq](Epoxy compound having no liquid crystal original skeleton) ‧828EL [Liquid bisphenol A type epoxy compound; manufactured by Mitsubishi Chemical Corporation; epoxy equivalent: 186g/eq]
(無機填充材料) ‧AA-3[氧化鋁粒子;住友化學股份有限公司製造;D50 :3μm] ‧AA-04[氧化鋁粒子;住友化學股份有限公司製造;D50 :0.40μm] ‧HP-40[氮化硼粒子;水島合金鐵股份有限公司製造;D50 :40μm](Inorganic filler material) ‧AA-3 [alumina particles; manufactured by Sumitomo Chemical Co., Ltd.; D 50 : 3 μm] ‧ AA-04 [alumina particles; manufactured by Sumitomo Chemical Co., Ltd.; D 50 : 0.40 μm] ‧ HP -40 [boron nitride particles; manufactured by Mizushima Alloy Iron Co., Ltd.; D 50 : 40 μm]
(硬化劑) ‧CRN[鄰苯二酚間苯二酚酚醛清漆(以質量基準計的調配比:鄰苯二酚/間苯二酚=5/95)樹脂;含有50質量%的環己酮](hardener) ‧CRN[catechol resorcinol novolac (mixing ratio based on mass: catechol / resorcin = 5/95) resin; containing 50% by mass of cyclohexanone ]
〈CRN的合成方法〉 在具備攪拌機、冷卻器及溫度計之3L的分離式燒瓶中,加入627g的間苯二酚、33g的鄰苯二酚、316.2g的37質量%甲醛水溶液、15g的草酸、300g的水,一邊以油浴加溫,一邊升溫至100℃。在104℃左右進行回流,並在回流溫度持續反應4小時。之後,一邊餾除水,一邊將燒瓶內的溫度升溫至170℃。保持在170℃持續反應8小時。反應後,在減壓下實行濃縮20分鐘,去除系統內的水等,來獲得目標物也就是苯酚酚醛清漆樹脂CRN。 又,藉由FD-MS(場脫附質譜儀)來確認所獲得的CRN的結構時,能夠確認到存在由通式(III-1)~通式(III-4)表示的全部的部分結構。<Synthesis method of CRN> 627 g of resorcin, 33 g of catechol, 316.2 g of a 37% by mass aqueous formaldehyde solution, and 15 g of oxalic acid were placed in a separate flask equipped with a stirrer, a cooler and a thermometer. 300 g of water was heated to 100 ° C while heating in an oil bath. The reflux was carried out at about 104 ° C, and the reaction was continued at the reflux temperature for 4 hours. Thereafter, the temperature in the flask was raised to 170 ° C while distilling off the water. The reaction was continued at 170 ° C for 8 hours. After the reaction, concentration was carried out under reduced pressure for 20 minutes to remove water or the like in the system to obtain a target substance, that is, a phenol novolak resin CRN. In addition, when the structure of the obtained CRN was confirmed by FD-MS (Field Desorption Mass Spectrometer), it was confirmed that all the partial structures represented by the general formulae (III-1) to (III-4) were present. .
再者,認為在上述反應條件中,最初會生成具有由通式(III-1)表示的部分結構之化合物,然後藉由進一步脫水反應,則會生成具有由通式(III-2)~通式(III-4)中的至少1個通式表示的部分結構之化合物。Further, it is considered that, in the above reaction conditions, a compound having a partial structure represented by the general formula (III-1) is initially formed, and then, by further dehydration reaction, a compound having a general formula (III-2) is produced. A compound having a partial structure represented by at least one formula represented by the formula (III-4).
有關所獲得的CRN,以接下來的方式來實行Mn(數量平均分子量)、Mw(重量平均分子量)的測定。 Mn和Mw的測定,使用高速液體層析儀(日立製作所股份有限公司製造;商品名:L6000)和數據解析裝置(島津製作所股份有限公司製造;商品名:C-R4A) 來實行。分析用GPC管柱使用TOSOH股份有限公司製造的管柱 G2000HXL及G3000HXL(以上為商品名)。樣品濃度是0.2質量%,移動相(moving phase)使用四氫呋喃,以流速1.0mL/分鐘來實行測定。使用聚苯乙烯標準樣品來作成校準曲線,然後使用此校準曲線以聚苯乙烯換算值來計算Mn和Mw。With respect to the obtained CRN, measurement of Mn (number average molecular weight) and Mw (weight average molecular weight) was carried out in the following manner. The measurement of Mn and Mw was carried out using a high-speed liquid chromatography (manufactured by Hitachi, Ltd.; trade name: L6000) and a data analysis device (manufactured by Shimadzu Corporation; trade name: C-R4A). For the GPC column for analysis, the column G2000HXL and G3000HXL (trade name) manufactured by TOSOH Co., Ltd. were used. The sample concentration was 0.2% by mass, and the moving phase was measured using tetrahydrofuran at a flow rate of 1.0 mL/min. A polystyrene standard sample was used to prepare a calibration curve, and then this calibration curve was used to calculate Mn and Mw in terms of polystyrene.
有關所獲得的CRN,以接下來的方式來實行羥基當量的測定。 羥基當量,是藉由氯化乙醯-氫氧化鉀滴定法來測定。再者,因為溶液的顏色是暗色,所以滴定終點的判斷不是藉由指示劑的呈色法,而是藉由電位滴定法來實行。具體而言,是下述方法:在吡啶溶液中將測定樹脂的羥基進行氯化乙醯化之後,以水分解過剩的試劑,然後將所生成的醋酸以氫氧化鉀/甲醇溶液進行滴定。Regarding the obtained CRN, the measurement of the hydroxyl equivalent was carried out in the following manner. The hydroxyl equivalent is determined by titration with ethyl acetate-potassium hydroxide. Further, since the color of the solution is dark, the judgment of the end point of the titration is not performed by the coloring method of the indicator, but by potentiometric titration. Specifically, it is a method in which the hydroxyl group of the measurement resin is subjected to chlorination in a pyridine solution, and then the excess reagent is decomposed with water, and then the produced acetic acid is titrated with a potassium hydroxide/methanol solution.
所獲得的CRN,是一種酚醛清漆樹脂,其包含硬化劑(羥基當量62g/eq,數量平均分子量422,重量平均分子量564);該硬化劑是下述化合物的混合物,該化合物具有由通式(III-1)~通式(III-4)中的至少1個通式表示的部分結構,其中,Ar是下述基:通式(III-a)中的R31 是羥基、且R32 和R33 是氫原子也就是源自1,2-二羥苯(鄰苯二酚)的基團和源自1,3-二羥苯(間苯二酚)的基團,並且該硬化劑含有35質量%作為低分子稀釋劑的單體成分(間苯二酚)。The obtained CRN is a novolac resin comprising a hardener (hydroxy equivalent: 62 g/eq, number average molecular weight 422, weight average molecular weight 564); the hardener is a mixture of the following compounds having a general formula ( a partial structure represented by at least one of the formulae (III-1) to (III-4), wherein Ar is a group: R 31 in the formula (III-a) is a hydroxyl group, and R 32 and R 33 is a hydrogen atom, that is, a group derived from 1,2-dihydroxybenzene (catechol) and a group derived from 1,3-dihydroxybenzene (resorcinol), and the hardener contains 35 mass% as a monomer component of a low molecular diluent (resorcinol).
(硬化促進劑) ‧ TPP:三苯膦[和光純藥工業股份有限公司製造;商品名](hardening accelerator) ‧ TPP: triphenylphosphine [manufactured by Wako Pure Chemical Industries Co., Ltd.; trade name]
(添加劑) ‧KBM-573:3-苯基胺丙基三甲氧基矽烷[矽烷耦合劑;信越化學工業股份有限公司製造;商品名](Additive) ‧KBM-573: 3-Phenylaminopropyltrimethoxydecane [decane coupling agent; manufactured by Shin-Etsu Chemical Co., Ltd.; trade name]
(溶劑) ‧CHN:環己酮(solvent) ‧CHN: cyclohexanone
(支撐體) ‧PET薄膜[帝人杜邦薄膜股份有限公司製造;商品名:A53;厚度50μm] ‧銅箔[古河電氣工業股份有限公司製造;厚度105μm;GTS等級](Support) ‧ PET film [manufactured by Teijin DuPont Film Co., Ltd.; trade name: A53; thickness 50 μm] ‧ copper foil [manufactured by Furukawa Electric Co., Ltd.; thickness 105 μm; GTS grade]
(實施例1) 〈環氧樹脂組成物的製作〉 以環氧當量成為9:1的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與YL6121H,來獲得環氧混合物1。藉由後述的方法確認相容性時,環氧混合物1,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Example 1) <Preparation of epoxy resin composition> The epoxy resin 1 was obtained by mixing the resin A and YL6121H which are epoxy compounds having a liquid crystal original skeleton so that the epoxy equivalent was 9:1. When the compatibility was confirmed by the method described later, the epoxy mixture 1 had compatibility at a curing temperature of the epoxy resin composition of 140 ° C.
混合下述成分,而獲得環氧樹脂清漆1作為包含溶劑之環氧樹脂組成物:8.94質量%的環氧混合物1;作為硬化劑的5.13質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.76質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 1 as an epoxy resin composition containing a solvent: 8.94% by mass of the epoxy mixture 1; 5.13% by mass of CRN as a curing agent; and 0.09% by mass as a curing accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.76% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和YL6121H)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of YL6121H) and the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
〈B階段的環氧樹脂組成物的製作〉 以乾燥後的厚度成為200μm的方式,使用塗抹器(applicator)將上述環氧樹脂清漆1塗佈在PET薄膜上後,使其在常溫(20℃~30℃)下乾燥5分鐘,並且進一步在130℃下乾燥5分鐘。之後,在真空加壓器中實行熱加壓(加壓溫度:150℃;真空度:1kPa;壓合壓力:15MPa;加壓時間:1分鐘),來獲得B階段的環氧樹脂組成物。<Preparation of B-stage epoxy resin composition> The epoxy resin varnish 1 was applied onto a PET film by an applicator so as to have a thickness of 200 μm after drying, and then allowed to stand at room temperature (20 ° C). Dry at ~30 ° C for 5 minutes and further dry at 130 ° C for 5 minutes. Thereafter, hot pressurization (pressurization temperature: 150 ° C; vacuum degree: 1 kPa; press pressure: 15 MPa; pressurization time: 1 minute) was carried out in a vacuum presser to obtain a B-stage epoxy resin composition.
〈附有銅箔之硬化環氧樹脂組成物的製作〉 將利用上述方法所獲得之B階段的環氧樹脂組成物的PET薄膜剝除後,使用兩片銅箔,以銅箔的磨砂面分別與半硬化樹脂組成物對向的方式夾持半硬化環氧樹脂組成物,在真空加壓器中進行真空熱壓接(加壓溫度:180℃;真空度:1kPa;壓合壓力:15MPa;加壓時間:6分鐘)。之後,在大氣壓力條件下,以150℃加熱2小時、並在210℃加熱4小時,來獲得附有銅箔之硬化環氧樹脂組成物1。<Preparation of hardened epoxy resin composition with copper foil> After peeling off the PET film of the B-stage epoxy resin composition obtained by the above method, two copper foils were used, and the frosted surfaces of the copper foil were respectively The semi-hardened epoxy resin composition is sandwiched in a manner opposite to the semi-hardened resin composition, and vacuum thermocompression bonding is performed in a vacuum pressurizer (pressurization temperature: 180 ° C; vacuum degree: 1 kPa; press pressure: 15 MPa; Pressurization time: 6 minutes). Thereafter, the mixture was heated at 150 ° C for 2 hours under atmospheric pressure and heated at 210 ° C for 4 hours to obtain a cured epoxy resin composition 1 with copper foil.
〈評價〉 利用以下的方式,對由上述所獲得的環氧混合物1和硬化環氧樹脂組成物1實行評價。將評價結果表示於表1。<Evaluation> The epoxy mixture 1 and the cured epoxy resin composition 1 obtained as described above were evaluated in the following manner. The evaluation results are shown in Table 1.
(導熱率的測定) 將上述所獲得的附有銅箔之硬化環氧樹脂組成物1的銅箔進行蝕刻來去除,而獲得薄片狀的硬化環氧樹脂組成物(樹脂薄片硬化物)。將所獲得的樹脂薄片切割成長度10mm、寬度10mm來獲得樣品。將樣品在石墨噴霧(graphite spray)中進行黑化處理後,使用氙閃光法(NETZSCH公司製造;商品名:LFA447 nanoflash)來評價熱擴散率。由此值、與由阿基米德法所測得的密度、與藉由DSC(示差掃描熱量測定裝置;珀金埃爾默公司製造;商品名:DSC Pyris1)所測得的比熱的乘積,來求得樹脂薄片硬化物在厚度方向的導熱率。將結果表示於表1。(Measurement of Thermal Conductivity) The copper foil of the copper foil-cured epoxy resin composition 1 obtained above was etched and removed to obtain a sheet-like cured epoxy resin composition (resin cured product). The obtained resin sheet was cut into a length of 10 mm and a width of 10 mm to obtain a sample. After the sample was blackened in a graphite spray, the thermal diffusivity was evaluated using a 氙 flash method (manufactured by NETZSCH Co., Ltd.; trade name: LFA447 nanoflash). The value, the density measured by the Archimedes method, and the product of the specific heat measured by DSC (differential scanning calorimeter; manufactured by PerkinElmer; trade name: DSC Pyris1), The thermal conductivity of the cured resin sheet in the thickness direction was determined. The results are shown in Table 1.
(層列型結構形成的確認) 將上述所獲得的附有銅箔之硬化環氧樹脂組成物1的銅箔進行蝕刻來去除,而獲得薄片狀的硬化環氧樹脂組成物(樹脂薄片硬化物)。將所獲得的樹脂薄片切割成長度10mm、寬度10mm來獲得樣品。使用CuKα 1射線,以管電壓設為40kV、管電流20mA且繞射角2θ為0.5°~30°的範圍內實行X射線繞射測定 (使用RIGAKU股份有限公司製造的X射線繞射裝置),藉由在2θ為1°~10°的範圍內有無繞射峰,來確認是否形成層列型結構。(Confirmation of Formation of Layered Structure) The copper foil with the copper foil-cured epoxy resin composition 1 obtained above was etched and removed to obtain a sheet-like hardened epoxy resin composition (resin cured product) ). The obtained resin sheet was cut into a length of 10 mm and a width of 10 mm to obtain a sample. X-ray diffraction measurement (using an X-ray diffraction device manufactured by RIGAKU Co., Ltd.) using a CuK α 1 ray in a range of a tube voltage of 40 kV, a tube current of 20 mA, and a diffraction angle of 2θ of 0.5 to 30° Whether or not a smectic structure is formed is determined by the presence or absence of a diffraction peak in a range of 1 to 10 degrees from 2θ.
(液晶相的確認) 一邊將由上述所獲得的環氧混合物1加熱,一邊使用偏光顯微鏡(奧林巴斯股份有限公司製造;商品型號:BS51)在正交偏光狀態中觀察(放大倍率:100倍)加熱中的環氧混合物1的狀態變化。 在120℃中可觀察到由結晶相往液晶相的相變,其成為表現了由於消偏光所產生的干涉紋且又具有流動性的狀態。又,進一步繼續加熱時,則在170℃中可觀察到在暗視野中變化的由液晶相往等方相的相變。 由上述所獲得的環氧混合物1在120℃~170℃表現了液晶相。(Confirmation of the liquid crystal phase) While the epoxy mixture 1 obtained above was heated, it was observed in a crossed polarized state using a polarizing microscope (manufactured by Olympus Co., Ltd.; product model: BS51) (magnification: 100 times) The state of the epoxy mixture 1 during heating changes. A phase transition from the crystal phase to the liquid crystal phase was observed at 120 ° C, which became a state in which the interference fringes due to the depolarized light were exhibited and the fluidity was obtained. Further, when the heating was further continued, a phase transition from the liquid crystal phase to the equilateral phase which was changed in the dark field was observed at 170 °C. The epoxy mixture 1 obtained as described above exhibits a liquid crystal phase at 120 ° C to 170 ° C.
(熔點測定) 使用示差掃描熱量測定裝置DSC7(珀金埃爾默公司製造)測定由上述所獲得的環氧混合物1。在測定溫度範圍25℃~350℃,以升溫溫度10℃/分鐘、流量20±5mL/分鐘的氮氣氣氛下的條件,實行已密閉在鋁製平鍋(pan)的3mg~5mg的樣品的示差掃描熱量測定,並將伴隨相變的產生能量變化的溫度(吸熱反應峰的溫度)當作熔點(相變溫度)。(Measurement of Melting Point) The epoxy mixture 1 obtained above was measured using a differential scanning calorimeter DSC7 (manufactured by Perkin Elmer). Performing a differential scanning of a sample of 3 mg to 5 mg sealed in an aluminum pan at a temperature range of 25 ° C to 350 ° C in a nitrogen atmosphere at a temperature rise of 10 ° C / min and a flow rate of 20 ± 5 mL / min. The calorific value is measured, and the temperature at which the energy change is accompanied by the phase change (the temperature of the endothermic reaction peak) is taken as the melting point (phase transition temperature).
(相容性) 將上述獲得的環氧混合物1,加熱至等方相相變溫度以上來使其熔融。之後,一邊自然冷卻,一邊利用顯微鏡(奧林巴斯股份有限公司製造;商品型號:BS51)觀察(放大倍率:100倍)環氧樹脂組成物的硬化溫度也就是在140℃中的硬化物的狀態。並未觀察到環氧單體混合物的相分離。 亦即,確認了環氧混合物1在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Compatibility) The epoxy mixture 1 obtained above was heated to an isothermal phase transformation temperature or higher to be melted. After that, it was observed by a microscope (manufactured by Olympus Co., Ltd.; product model: BS51) while being naturally cooled, and the curing temperature of the epoxy resin composition was also the cured product at 140 ° C. status. No phase separation of the epoxy monomer mixture was observed. That is, it was confirmed that the epoxy mixture 1 has compatibility at a curing temperature of the epoxy resin composition, that is, 140 °C.
(實施例2) 〈環氧樹脂組成物的製作〉 以環氧當量成為8:2的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與YL6121H,來獲得環氧混合物2。藉由已述的方法確認相容性時,環氧混合物2,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Example 2) <Preparation of epoxy resin composition> The epoxy resin mixture 2 was obtained by mixing the resin A and YL6121H which are epoxy compounds having a liquid crystal original skeleton so that the epoxy equivalent was 8:2. When the compatibility was confirmed by the method described above, the epoxy mixture 2 had compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆2作為包含溶劑之環氧樹脂組成物:8.90質量%的環氧混合物2;作為硬化劑的5.21質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.72質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 2 as an epoxy resin composition containing a solvent: 8.90% by mass of the epoxy mixture 2; 5.21% by mass of CRN as a curing agent; and 0.09% by mass as a curing accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.72% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和YL6121H)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of YL6121H) and the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆2以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物2和硬化環氧樹脂組成物2,並與上述同樣地進行評價。將其結果表示於表1。The B-stage epoxy resin composition 2 and the cured epoxy resin composition 2 were produced in the same manner as in Example 1 except that the epoxy resin varnish 2 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 1.
(實施例3) 〈環氧樹脂組成物的製作〉 以環氧當量成為9:1的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與樹脂B,來獲得環氧混合物3。藉由已述的方法確認相容性時,環氧混合物3,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Example 3) <Preparation of epoxy resin composition> The epoxy resin mixture 3 was obtained by mixing the resin A and the resin B which are epoxy compounds having a liquid crystal original skeleton so that the epoxy equivalent was 9:1. When the compatibility was confirmed by the method described above, the epoxy mixture 3 had compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆3作為包含溶劑之環氧樹脂組成物:8.98質量%的環氧混合物3;作為硬化劑的5.05質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.80質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 3 as a solvent-containing epoxy resin composition: 8.98 mass% of an epoxy mixture 3; 5.05 mass% of CRN as a hardener; and 0.09 mass% as a hardening accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.80% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和樹脂B)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of the resin B) and the curing agent (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆3以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物3和硬化環氧樹脂組成物3,並與上述同樣地進行評價。將其結果表示於表1。The B-stage epoxy resin composition 3 and the cured epoxy resin composition 3 were produced in the same manner as in Example 1 except that the epoxy resin varnish 3 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 1.
(實施例4) 〈環氧樹脂組成物的製作〉 以環氧當量成為7:3的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與樹脂B,來獲得環氧混合物4。藉由已述的方法確認相容性時,環氧混合物4,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Example 4) <Preparation of epoxy resin composition> The epoxy resin mixture 4 was obtained by mixing the resin A and the resin B which are epoxy compounds having a liquid crystal original skeleton so that the epoxy equivalent was 7:3. When the compatibility is confirmed by the method described above, the epoxy mixture 4 has compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆4作為包含溶劑之環氧樹脂組成物:8.98質量%的環氧混合物4;作為硬化劑的5.05質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.80質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 4 as a solvent-containing epoxy resin composition: 8.98 mass% of an epoxy mixture 4; 5.05 mass% of CRN as a hardener; and 0.09 mass% as a hardening accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.80% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和樹脂B)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of the resin B) and the curing agent (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆4以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物4和硬化環氧樹脂組成物4,並與上述同樣地進行評價。將其結果表示於表1。The B-stage epoxy resin composition 4 and the cured epoxy resin composition 4 were produced in the same manner as in Example 1 except that the epoxy resin varnish 4 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 1.
(比較例1) 以環氧當量成為7:3的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與YL6121H,來獲得環氧混合物5。藉由已述的方法確認相容性時,環氧混合物5,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Comparative Example 1) Resin A and YL6121H, which are epoxy compounds having a liquid crystal original skeleton, were mixed so that the epoxy equivalent was 7:3 to obtain an epoxy mixture 5. When the compatibility is confirmed by the method described above, the epoxy mixture 5 has compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆5作為包含溶劑之環氧樹脂組成物:8.85質量%的環氧混合物5;作為硬化劑的5.30質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.68質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 5 as a solvent-containing epoxy resin composition: 8.85 mass% of an epoxy mixture 5; 5.30 mass% of CRN as a hardener; and 0.09 mass% as a hardening accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.68% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和YL6121H)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of YL6121H) and the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆5以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物5和硬化環氧樹脂組成物5,並與上述同樣地進行評價。將其結果表示於表2。再者,表2中的「-」,意指並未添加該成分和並未算出其混合比例。The B-stage epoxy resin composition 5 and the cured epoxy resin composition 5 were produced in the same manner as in Example 1 except that the epoxy resin varnish 5 obtained as described above was used, and evaluated in the same manner as above. The results are shown in Table 2. Further, "-" in Table 2 means that the component is not added and the mixing ratio thereof is not calculated.
(比較例2) 〈環氧樹脂組成物的製作〉 以環氧當量成為6:4的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與YL6121H,來獲得環氧混合物6。藉由已述的方法確認相容性時,環氧混合物6,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Comparative Example 2) <Preparation of epoxy resin composition> Resin A and YL6121H which are epoxy compounds having a liquid crystal original skeleton were mixed so that the epoxy equivalent was 6:4 to obtain an epoxy mixture 6. When the compatibility was confirmed by the method described above, the epoxy mixture 6 had compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆6作為包含溶劑之環氧樹脂組成物:8.81質量%的環氧混合物6;作為硬化劑的5.39質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.63質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 6 as a solvent-containing epoxy resin composition: 8.81% by mass of an epoxy mixture 6; 5.39 mass% of CRN as a curing agent; and 0.09 mass% as a hardening accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.63% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和YL6121H)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of YL6121H) and the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆6以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物6和硬化環氧樹脂組成物6,並與上述同樣地進行評價。將其結果表示於表2。The B-stage epoxy resin composition 6 and the cured epoxy resin composition 6 were produced in the same manner as in Example 1 except that the epoxy resin varnish 6 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 2.
(比較例3) 〈環氧樹脂組成物的製作〉 以環氧當量成為5:5的方式,混合作為具有液晶原骨架之環氧化合物的樹脂A與YL6121H,來獲得環氧混合物7。藉由已述的方法確認相容性時,環氧混合物7,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Comparative Example 3) <Preparation of Epoxy Resin Composition> Resin A and YL6121H, which are epoxy compounds having a liquid crystal original skeleton, were mixed so that the epoxy equivalent was 5:5 to obtain an epoxy mixture 7. When the compatibility is confirmed by the method described above, the epoxy mixture 7 has compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆7作為包含溶劑之環氧樹脂組成物:8.76質量%的環氧混合物7;作為硬化劑的5.49質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.58質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 7 as a solvent-containing epoxy resin composition: 8.76 mass% of an epoxy mixture 7; 5.49 mass% of CRN as a hardener; and 0.09 mass% as a hardening accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.58% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和YL6121H)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of YL6121H) and the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆7以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物7和硬化環氧樹脂組成物7,並與上述同樣地進行評價。將其結果表示於表2。The B-stage epoxy resin composition 7 and the cured epoxy resin composition 7 were produced in the same manner as in Example 1 except that the epoxy resin varnish 7 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 2.
(比較例4) 〈環氧樹脂組成物的製作〉 以環氧當量成為9:1的方式,混合作為具有液晶原骨架的樹脂A與作為不具有液晶原骨架之環氧化合物的828EL,來獲得環氧混合物8。藉由已述的方法確認相容性時,環氧混合物8,在環氧樹脂組成物的硬化溫度也就是140℃中具有相容性。(Comparative Example 4) <Preparation of epoxy resin composition> A resin A having a liquid crystal original skeleton and 828EL as an epoxy compound having no liquid crystal primary skeleton were mixed so that the epoxy equivalent was 9:1. Epoxy mixture 8. When the compatibility is confirmed by the method described above, the epoxy mixture 8 has compatibility at a curing temperature of the epoxy resin composition of 140 °C.
混合下述成分,而獲得環氧樹脂清漆8作為包含溶劑之環氧樹脂組成物:8.96質量%的環氧混合物8;作為硬化劑的5.10質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.77質量%的CHN。The following components were mixed to obtain an epoxy resin varnish 8 as a solvent-containing epoxy resin composition: 8.96 mass% of an epoxy mixture 8; 5.10 mass% of CRN as a hardener; and 0.09 mass% as a hardening accelerator TPP; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, 9.81% by mass of AA-04; 0.06 mass% of KBM-573 as an additive; and 22.77% by mass as a solvent CHN.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A和828EL)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A and The density of the mixture of 828EL) and the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆8以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物8和硬化環氧樹脂組成物8,並與上述同樣地進行評價。將其結果表示於表2。The B-stage epoxy resin composition 8 and the cured epoxy resin composition 8 were produced in the same manner as in Example 1 except that the epoxy resin varnish 8 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 2.
(比較例5) 〈環氧樹脂組成物的製作〉 混合下述成分,而獲得環氧樹脂清漆9作為包含溶劑之環氧樹脂組成物:作為具有液晶原之環氧化合物的8.99質量%的樹脂A;作為硬化劑的5.04質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.80質量%的CHN。(Comparative Example 5) <Preparation of epoxy resin composition> The following components were mixed to obtain an epoxy resin varnish 9 as a solvent-containing epoxy resin composition: 8.99% by mass of a resin having a liquid crystal original epoxy compound A; 5.04% by mass of CRN as a curing agent; 0.09% by mass of TPP as a hardening accelerator; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, and 9.81% by mass of AA- 04; 0.06 mass% of KBM-573 as an additive; and 22.80 mass% of CHN as a solvent.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A) was used. The density of the mixture with the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆9以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物9和硬化環氧樹脂組成物9,並與上述同樣地進行評價。將其結果表示於表2。The B-stage epoxy resin composition 9 and the cured epoxy resin composition 9 were produced in the same manner as in Example 1 except that the epoxy resin varnish 9 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 2.
(比較例6) 〈環氧樹脂組成物的製作〉 混合下述成分,而獲得環氧樹脂清漆10作為包含溶劑之環氧樹脂組成物:作為具有液晶原之環氧化合物的8.97質量%的樹脂B;作為硬化劑的5.08質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.78質量%的CHN。(Comparative Example 6) <Preparation of epoxy resin composition> The following components were mixed to obtain an epoxy resin varnish 10 as a solvent-containing epoxy resin composition: 8.97 mass% of a resin as an epoxy compound having a liquid crystal source B; 5.08 mass% of CRN as a hardening agent; 0.09 mass% of TPP as a hardening accelerator; 43.40 mass% of HP-40 as an inorganic filler, 9.81 mass% of AA-3, and 9.81 mass% of AA- 04; 0.06 mass% of KBM-573 as an additive; and 22.78 mass% of CHN as a solvent.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(樹脂A)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (resin A) was used. The density of the mixture with the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆10以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物10和硬化環氧樹脂組成物10,並與上述同樣地進行評價。將其結果表示於表2。The B-stage epoxy resin composition 10 and the cured epoxy resin composition 10 were produced in the same manner as in Example 1 except that the epoxy resin varnish 10 obtained above was used, and evaluated in the same manner as above. The results are shown in Table 2.
(比較例7) 〈環氧樹脂組成物的製作〉 混合下述成分,而獲得環氧樹脂清漆11作為包含溶劑之環氧樹脂組成物:作為具有液晶原之其他環氧化合物的8.50質量%的YL6121H;作為硬化劑的6.02質量%的CRN;作為硬化促進劑的0.09質量%的TPP;作為無機填充材料的43.40質量%的HP-40、9.81質量%的AA-3、9.81質量%的AA-04;作為添加劑的0.06質量%的KBM-573;及,作為溶劑的22.31質量%的CHN。(Comparative Example 7) <Preparation of epoxy resin composition> The following components were mixed to obtain an epoxy resin varnish 11 as an epoxy resin composition containing a solvent: 8.50% by mass as another epoxy compound having a liquid crystal source YL6121H; 6.02% by mass of CRN as a hardening agent; 0.09% by mass of TPP as a hardening accelerator; 43.40% by mass of HP-40 as an inorganic filler, 9.81% by mass of AA-3, and 9.81% by mass of AA- 04; 0.06 mass% of KBM-573 as an additive; and 22.31 mass% of CHN as a solvent.
將氮化硼(HP-40)的密度設為2.20g/cm3 ,將氧化鋁(AA-3和AA-04)的密度設為3.98g/cm3 ,並將環氧化合物(YL6121H)與硬化劑(CRN)之混合物的密度設為1.20g/cm3 ,算出無機填充材料相對於環氧樹脂組成物的總固體成分的總體積的比例為72體積%。The density of boron nitride (HP-40) was set to 2.20 g/cm 3 , the density of alumina (AA-3 and AA-04) was set to 3.98 g/cm 3 , and the epoxy compound (YL6121H) was The density of the mixture of the hardener (CRN) was set to 1.20 g/cm 3 , and the ratio of the inorganic filler to the total volume of the total solid content of the epoxy resin composition was calculated to be 72% by volume.
除了使用由上述所獲得的環氧樹脂清漆11以外,與實施例1同樣地操作,來製作B階段的環氧樹脂組成物11和硬化環氧樹脂組成物11,並與上述同樣地進行評價。將其結果表示於表2。The B-stage epoxy resin composition 11 and the cured epoxy resin composition 11 were produced in the same manner as in Example 1 except that the epoxy resin varnish 11 obtained as described above was used, and evaluated in the same manner as above. The results are shown in Table 2.
[表1]
[表2]
如表1和表2所示,導熱率是僅使用樹脂A的比較例5最高。在併用樹脂A與YL6121H、併用樹脂A與樹脂B、併用樹脂A與828EL來作為環氧化合物時,彼此可相容。又,相較於單獨使用樹脂A的情況,在併用樹脂A和YL6121H、或併用樹脂A和樹脂B時熔點低了10℃以上。 相較於未形成有層列型結構的環氧樹脂組成物,彼此相容且形成有層列型結構的環氧樹脂組成物的導熱率變得較高。藉此,可知藉由有無層列型結構會造成導熱率大幅度的差異。 藉由上述的技術內容,能夠獲得一種環氧樹脂組成物,其是低熔點且高導熱率。As shown in Tables 1 and 2, the thermal conductivity was the highest in Comparative Example 5 using only the resin A. When the resin A and YL6121H are used in combination, and the resin A and the resin B are used together, and the resins A and 828EL are used in combination as the epoxy compound, they are compatible with each other. Further, in the case where the resin A is used alone, the melting point is lowered by 10 ° C or more when the resin A and YL 6121H are used in combination or when the resin A and the resin B are used in combination. The thermal conductivity of the epoxy resin composition which is compatible with each other and formed with the smectic structure becomes higher than that of the epoxy resin composition in which the smectic structure is not formed. From this, it can be seen that a large difference in thermal conductivity is caused by the presence or absence of a smectic structure. According to the above technical content, it is possible to obtain an epoxy resin composition which has a low melting point and a high thermal conductivity.
藉由參照來將日本專利申請案第2016-111371號的揭示內容之整體併入本說明書中。本說明書中所述之全部的文獻、專利申請案及技術規格,藉由參照來將個別的文獻、專利申請案及技術規格的併入,是與具體且分別記載的情況相同程度地來參照而併入本說明書中。The entire disclosure of Japanese Patent Application No. 2016-111371 is incorporated herein by reference. All of the documents, patent applications, and technical specifications described in the specification are incorporated by reference to the individual documents, patent applications, and technical specifications. Into this specification.
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