TW201815586A - Laminated polypropylene film - Google Patents
Laminated polypropylene film Download PDFInfo
- Publication number
- TW201815586A TW201815586A TW106120182A TW106120182A TW201815586A TW 201815586 A TW201815586 A TW 201815586A TW 106120182 A TW106120182 A TW 106120182A TW 106120182 A TW106120182 A TW 106120182A TW 201815586 A TW201815586 A TW 201815586A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- polypropylene
- polypropylene film
- laminated
- temperature
- Prior art date
Links
- -1 polypropylene Polymers 0.000 title claims abstract description 202
- 239000004743 Polypropylene Substances 0.000 title claims abstract description 199
- 229920001155 polypropylene Polymers 0.000 title claims abstract description 199
- 239000010408 film Substances 0.000 claims abstract description 325
- 239000010409 thin film Substances 0.000 claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 40
- 239000011347 resin Substances 0.000 claims abstract description 40
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 24
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000001301 oxygen Substances 0.000 claims abstract description 23
- 150000002484 inorganic compounds Chemical class 0.000 claims abstract description 20
- 229910010272 inorganic material Inorganic materials 0.000 claims abstract description 20
- 230000035699 permeability Effects 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 19
- 229920000098 polyolefin Polymers 0.000 claims description 2
- 230000004888 barrier function Effects 0.000 abstract description 20
- 239000007789 gas Substances 0.000 abstract description 18
- 229920001328 Polyvinylidene chloride Polymers 0.000 abstract description 5
- 239000005033 polyvinylidene chloride Substances 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 54
- 239000000758 substrate Substances 0.000 description 51
- 238000000034 method Methods 0.000 description 37
- 238000004519 manufacturing process Methods 0.000 description 31
- 230000000704 physical effect Effects 0.000 description 29
- 238000005259 measurement Methods 0.000 description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 229910052814 silicon oxide Inorganic materials 0.000 description 19
- 238000010438 heat treatment Methods 0.000 description 14
- 238000000137 annealing Methods 0.000 description 13
- 229920005673 polypropylene based resin Polymers 0.000 description 12
- 239000013078 crystal Substances 0.000 description 11
- 238000005227 gel permeation chromatography Methods 0.000 description 11
- 229920001384 propylene homopolymer Polymers 0.000 description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 10
- 238000009826 distribution Methods 0.000 description 10
- 238000003475 lamination Methods 0.000 description 10
- 238000007740 vapor deposition Methods 0.000 description 10
- 229910004298 SiO 2 Inorganic materials 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 238000007789 sealing Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 238000000235 small-angle X-ray scattering Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000008602 contraction Effects 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 238000004806 packaging method and process Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 5
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- 238000011088 calibration curve Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- 238000009616 inductively coupled plasma Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 229920005672 polyolefin resin Polymers 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000004736 wide-angle X-ray diffraction Methods 0.000 description 4
- PBKONEOXTCPAFI-UHFFFAOYSA-N 1,2,4-trichlorobenzene Chemical compound ClC1=CC=C(Cl)C(Cl)=C1 PBKONEOXTCPAFI-UHFFFAOYSA-N 0.000 description 3
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
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- 238000011161 development Methods 0.000 description 3
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- 238000000113 differential scanning calorimetry Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 229920003355 Novatec® Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 238000000333 X-ray scattering Methods 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000009998 heat setting Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000012939 laminating adhesive Substances 0.000 description 2
- 229920000092 linear low density polyethylene Polymers 0.000 description 2
- RLAWWYSOJDYHDC-BZSNNMDCSA-N lisinopril Chemical compound C([C@H](N[C@@H](CCCCN)C(=O)N1[C@@H](CCC1)C(O)=O)C(O)=O)CC1=CC=CC=C1 RLAWWYSOJDYHDC-BZSNNMDCSA-N 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 229920005629 polypropylene homopolymer Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 239000004711 α-olefin Substances 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JMMZCWZIJXAGKW-UHFFFAOYSA-N 2-methylpent-2-ene Chemical compound CCC=C(C)C JMMZCWZIJXAGKW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 102000008186 Collagen Human genes 0.000 description 1
- 108010035532 Collagen Proteins 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 241000283283 Orcinus orca Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000011954 Ziegler–Natta catalyst Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 235000013361 beverage Nutrition 0.000 description 1
- 229920006378 biaxially oriented polypropylene Polymers 0.000 description 1
- 239000011127 biaxially oriented polypropylene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
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- 229920001436 collagen Polymers 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
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- 238000010411 cooking Methods 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 229920006242 ethylene acrylic acid copolymer Polymers 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 229920006244 ethylene-ethyl acrylate Polymers 0.000 description 1
- 229920005680 ethylene-methyl methacrylate copolymer Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000012793 heat-sealing layer Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000011866 long-term treatment Methods 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229920001179 medium density polyethylene Polymers 0.000 description 1
- 239000004701 medium-density polyethylene Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012968 metallocene catalyst Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920006280 packaging film Polymers 0.000 description 1
- 239000012785 packaging film Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229920005653 propylene-ethylene copolymer Polymers 0.000 description 1
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000002453 shampoo Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- AQRYNYUOKMNDDV-UHFFFAOYSA-M silver behenate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCCCCCC([O-])=O AQRYNYUOKMNDDV-UHFFFAOYSA-M 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 229920006302 stretch film Polymers 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000000606 toothpaste Substances 0.000 description 1
- 229940034610 toothpaste Drugs 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Abstract
Description
本發明係關於一種積層聚丙烯膜,該積層聚丙烯膜係具備使用聚丙烯系樹脂之膜及以無機化合物作為主成分之薄膜層。更詳細而言,本發明係關於一種氣體阻隔性優異並且於要求高溫時之尺寸穩定性與高剛性的各種領域中可合適地使用之積層聚丙烯膜。 The present invention relates to a laminated polypropylene film including a film using a polypropylene resin and a film layer containing an inorganic compound as a main component. More specifically, the present invention relates to a laminated polypropylene film which is excellent in gas barrier properties and can be suitably used in various fields requiring dimensional stability and high rigidity at high temperatures.
以往,聚丙烯之延伸膜由於柔軟性及防濕性優異,故而被廣泛地用於食品與各種商品之包裝用、電氣絕緣用、表面保護膜等廣範圍之用途中。 In the past, polypropylene stretch films have been widely used in a wide range of applications such as packaging for food and various products, electrical insulation, and surface protection films due to their excellent flexibility and moisture resistance.
然而對於食品用而言,因食品之保存而大多情況下對膜要求氧氣阻隔性,以往之對聚丙烯膜蒸鍍無機化合物而成之積層膜係氧氣阻隔性並不充分,而使用將溶解有聚偏二氯乙烯等具有氧氣阻隔性之樹脂的溶液塗佈、乾燥而成之膜。 However, for food applications, oxygen barrier properties are often required for films due to preservation of food. In the past, laminated films based on vapor deposition of inorganic compounds on polypropylene films had insufficient oxygen barrier properties. A film formed by coating and drying a solution of an oxygen-barrier resin such as polyvinylidene chloride.
然而,因存在將溶解有氧氣阻隔性樹脂之溶液塗佈、乾燥之步驟,故於降低生產成本之方面存在極限,而且必須將氧氣阻隔性樹脂層設定為5μm左右之厚度,而存在積層步驟耗費時間或原料成本增高之問題。 However, since there are steps of coating and drying the solution in which the oxygen-barrier resin is dissolved, there is a limit in terms of reducing production costs, and it is necessary to set the oxygen-barrier resin layer to a thickness of about 5 μm, and the layering step is expensive. Increased time or cost of raw materials.
再者,亦存在如下課題:積層後之膜之厚度大,故而難以進行印刷、密封或製袋加工。 Furthermore, there is also a problem that the thickness of the film after lamination is large, and it is difficult to perform printing, sealing, or bag-making processing.
因此,期望對聚丙烯膜蒸鍍無機化合物薄膜而成之積層膜係氧氣阻隔性優異,但對聚丙烯系膜直接蒸鍍無機化 合物而成之積層膜無法獲得氣體阻隔性(例如參照專利文獻1、專利文獻2)。 Therefore, a laminated film obtained by vapor-depositing an inorganic compound film on a polypropylene film is desired to have excellent oxygen barrier properties, but a laminated film obtained by directly vapor-depositing an inorganic compound on a polypropylene film cannot obtain gas barrier properties (for example, refer to Patent Document 1) , Patent Document 2).
[先前技術文獻] [Prior technical literature]
[專利文獻] [Patent Literature]
專利文獻1:日本特開平11-105190號公報。 Patent Document 1: Japanese Patent Application Laid-Open No. 11-105190.
專利文獻2:日本特開2000-355068號公報。 Patent Document 2: Japanese Patent Application Laid-Open No. 2000-355068.
本發明係以上述先前技術之課題為背景而成。亦即,本發明之目的在於提供一種積層聚丙烯膜,該積層聚丙烯膜係具有與塗佈有聚偏二氯乙烯之聚丙烯系膜同等的氣體阻隔性,並具備使用聚丙烯系樹脂之聚丙烯膜基材及以無機化合物作為主成分之薄膜層,低成本且加工性亦優異。 This invention is made | formed based on the subject of the said prior art. That is, an object of the present invention is to provide a laminated polypropylene film which has the same gas barrier properties as a polypropylene-based film coated with polyvinylidene chloride and is provided with a polypropylene-based resin. The polypropylene film substrate and the thin film layer containing an inorganic compound as a main component have low cost and excellent processability.
本發明人為了達成上述目的而進行了潛心研究,結果完成了本發明。亦即,本發明之積層聚丙烯膜係具備使用聚丙烯系樹脂之聚丙烯膜基材及以無機化合物作為主成分之薄膜層;積層聚丙烯膜中之於150℃之縱方向之熱收縮率為7%以下,氧透過度為150mL/m2/day/MPa以下。 The present inventors conducted diligent research in order to achieve the above object, and as a result, completed the present invention. That is, the laminated polypropylene film of the present invention includes a polypropylene film substrate using a polypropylene resin and a thin film layer containing an inorganic compound as a main component; and a thermal shrinkage rate of 150 ° C in the longitudinal direction in the laminated polypropylene film. It is 7% or less, and the oxygen permeability is 150 mL / m 2 / day / MPa or less.
以往之積層聚丙烯膜係縱方向之150℃時之收縮率為9%以上,推測聚丙烯膜基材因對聚丙烯膜基材蒸鍍無機化合物時之蒸鍍粒子所具有之熱能或來自收容無機化合物之坩堝的輻射熱而發生收縮,因該收縮之影響而導致無機化合物層自身發生氣體阻隔性降低之變化。 The conventional laminated polypropylene film has a shrinkage rate of 9% or more at 150 ° C in the longitudinal direction. It is estimated that the polypropylene film substrate has thermal energy from vapor deposition particles during evaporation of inorganic compounds to the polypropylene film substrate or comes from the storage. Shrinkage of the crucible of an inorganic compound causes shrinkage, and the influence of the shrinkage causes a change in the gas barrier property of the inorganic compound layer itself to decrease.
於該情形時,較佳為前述積層聚丙烯膜之霧度為6%以下。 In this case, the haze of the laminated polypropylene film is preferably 6% or less.
於該情形時,較佳為前述積層聚丙烯膜中之於150℃之橫方向之熱收縮率為7%以下。 In this case, it is preferable that the thermal shrinkage ratio in the transverse direction of 150 ° C. in the laminated polypropylene film is 7% or less.
於該情形時,較佳為含有前述積層聚丙烯膜及聚烯烴膜之積層體。 In this case, a laminated body containing the aforementioned laminated polypropylene film and polyolefin film is preferred.
根據本發明之積層聚丙烯膜,可具有與塗佈有聚偏二氯乙烯之聚丙烯系膜同等之氧氣阻隔性,甚至可實現薄膜化。 The laminated polypropylene film according to the present invention can have oxygen barrier properties equivalent to those of a polypropylene-based film coated with polyvinylidene chloride, and can even be made into a thin film.
再者,本發明之積層聚丙烯膜當然可維持常溫時之氧氣阻隔性,而且即便暴露於150℃左右之環境下亦可維持氧氣阻隔性及其他各種物性,故而亦可於需要以往之聚丙烯膜之情況下無法想像的氧氣阻隔性或高溫之環境下使用,可較佳地應用於廣泛之用途中。 Furthermore, the laminated polypropylene film of the present invention can of course maintain the oxygen barrier property at normal temperature, and can maintain the oxygen barrier property and other various physical properties even when exposed to an environment of about 150 ° C, so it can also be used where conventional polypropylene The film can be used in a wide range of applications because it cannot be imagined in the case of oxygen barrier properties or high temperature environments.
例如藉由將本發明之積層聚丙烯膜作為基材層,並於基材層之表層積層熱密封層,可應用於需要熱密封性之各種包裝形態,於對本發明之積層聚丙烯膜或使用該積層聚丙烯膜之積層膜進行熱密封之情形時,由於可將熱密封溫度設定得高,且熱密封強度提高,故而可增大製袋加工等中之生產線速度,生產性提高。亦可用作熱負荷大之擠出層壓之基材。 For example, by using the laminated polypropylene film of the present invention as a base material layer and laminating a heat sealing layer on the surface of the base material layer, it can be applied to various packaging forms that require heat sealability. When the laminated film of the laminated polypropylene film is heat-sealed, since the heat-sealing temperature can be set high and the heat-sealing strength is improved, the production line speed in bag-making processing can be increased, and productivity can be improved. It can also be used as a substrate for extrusion lamination with large heat load.
再者,即便於製袋後進行蒸煮(retort)等高溫處理時,亦可抑制袋之變形量。 In addition, even when a high-temperature treatment such as retort is performed after bag making, the amount of deformation of the bag can be suppressed.
圖1係用以對用於積層聚丙烯膜之基材的聚丙烯膜之廣角X射線折射圖案中的α型結晶之110面之折射強度之方位角依存性及半高寬進行說明的曲線圖。 FIG. 1 is a graph for explaining the azimuth dependence and the full width at half maximum of the refractive power of the 110-type crystal of the α-type crystal in the wide-angle X-ray refraction pattern of the polypropylene film used as the base material of the laminated polypropylene film. .
本發明係關於一種氣體阻隔性及高溫時之尺寸穩定性、機械特性優異之積層聚丙烯膜。 The present invention relates to a laminated polypropylene film with excellent gas barrier properties, dimensional stability at high temperatures, and mechanical properties.
本發明之積層聚丙烯膜係具備使用聚丙烯系樹脂之聚丙烯膜基材及以無機化合物作為主成分之薄膜層;積層聚丙烯膜中之於150℃之縱方向之熱收縮率為7%以下,氧透過度為150mL/m2/day/MPa以下。 The laminated polypropylene film of the present invention is provided with a polypropylene film substrate using a polypropylene resin and a thin film layer containing an inorganic compound as a main component; in the laminated polypropylene film, the thermal shrinkage rate in the longitudinal direction at 150 ° C is 7% Hereinafter, the oxygen permeability is 150 mL / m 2 / day / MPa or less.
[無機薄膜層] [Inorganic thin film layer]
本發明中所用之無機薄膜層係以無機化合物作為主成分,無機化合物較佳為無機氧化物。作為無機氧化物,較佳為氧化鋁及氧化矽之至少一者或該等之複合氧化物。 The inorganic thin film layer used in the present invention has an inorganic compound as a main component, and the inorganic compound is preferably an inorganic oxide. As the inorganic oxide, at least one of aluminum oxide and silicon oxide or a composite oxide of these is preferable.
所謂此處之「主成分」係指相對於構成薄膜層之成分100質量%,氧化鋁、氧化矽及氧化鋁與氧化矽之複合氧化物之合計量超過50質量%,較佳為70質量%以上,更佳為90質量%以上,最佳為100質量%(不含氧化鋁、氧化矽以外之成分作為構成薄膜層之成分)。 The "main component" herein means that the total amount of aluminum oxide, silicon oxide, and the composite oxide of aluminum oxide and silicon oxide exceeds 50% by mass, preferably 70% by mass, with respect to 100% by mass of the constituents constituting the thin film layer. Above, more preferably 90% by mass or more, and most preferably 100% by mass (components other than alumina and silicon oxide are not included as components constituting the thin film layer).
此處所提及之氧化鋁係由AlO、Al2O、Al2O3等各種鋁氧化物之至少一種以上所構成,各種鋁氧化物之含有率可藉由薄膜層之製作條件而調整。所謂氧化矽係由SiO、SiO2、Si3O2等各種矽氧化物之至少一種以上所構成,各種矽氧化物之含有率可藉由薄膜層之製作條件而調整。所謂氧化鋁與氧化矽之複合氧化物係由AlxSiy(x=1至2、y=1至3)所構成,各種矽氧化物之含有率可藉由薄膜層之製作條件而調整。對於氧化鋁、氧化矽及氧化鋁與氧化矽之 複合氧化物而言,亦可於成分中以不損及特性之範圍而含有微量(相對於總成分而言至多為3%)之其他成分。 The alumina mentioned here is composed of at least one or more of various aluminum oxides such as AlO, Al 2 O, and Al 2 O 3. The content ratio of various aluminum oxides can be adjusted according to the production conditions of the thin film layer. The so-called silicon oxide is composed of at least one or more kinds of various silicon oxides such as SiO, SiO 2 , and Si 3 O 2. The content ratio of various silicon oxides can be adjusted according to the production conditions of the thin film layer. The so-called composite oxide of aluminum oxide and silicon oxide is composed of AlxSiy (x = 1 to 2, y = 1 to 3), and the content ratio of various silicon oxides can be adjusted by the production conditions of the thin film layer. For aluminum oxide, silicon oxide, and composite oxides of aluminum oxide and silicon oxide, other components may be contained in the component in a range that does not impair the characteristics (up to 3% relative to the total component).
作為「主成分」以外之成分,可列舉氧化鈦、氧化鎂、氧化鋯、氧化鈰、氧化鋅等化合物及該等之混合物。 Examples of components other than the "main component" include compounds such as titanium oxide, magnesium oxide, zirconia, cerium oxide, and zinc oxide, and mixtures thereof.
作為無機薄膜層之厚度,並無特別限定,就氣體阻隔性及可撓性之方面而言,較佳為5nm至500nm,更佳為10nm至200nm,又更佳為15nm至50nm。若薄膜層之膜厚小於5nm,則有難以獲得令人滿意之氣體阻隔性之虞;另一方面,即便超過500nm,亦無法獲得與此相應之氣體阻隔性之提高功效,且於耐彎曲性或製造成本之方面反而變得不利。 The thickness of the inorganic thin film layer is not particularly limited. In terms of gas barrier properties and flexibility, it is preferably 5 nm to 500 nm, more preferably 10 nm to 200 nm, and still more preferably 15 nm to 50 nm. If the thickness of the thin film layer is less than 5 nm, it may be difficult to obtain satisfactory gas barrier properties; on the other hand, even if it exceeds 500 nm, the corresponding effect of improving the gas barrier properties cannot be obtained, and the resistance to bending Or it becomes disadvantageous in terms of manufacturing costs.
[積層聚丙烯膜] [Laminated polypropylene film]
本發明之積層聚丙烯膜尤其於積層膜物性之方面具有特徵。本發明之積層聚丙烯膜顯示出如下膜物性。再者,以下之各物性係藉由下文將於實施例中描述之方法測定、評價。 The laminated polypropylene film of the present invention has characteristics especially in terms of physical properties of the laminated film. The laminated polypropylene film of the present invention exhibits the following film properties. In addition, the following physical properties are measured and evaluated by the method described in Examples below.
(熱收縮率) (Heat shrinkage)
本發明之積層聚丙烯膜係以聚丙烯系樹脂作為主體而構成之延伸膜,並且150℃時之縱方向之熱收縮率必須為7%以下。此處所謂縱方向係膜之行進方向(有時亦稱為長度方向或長邊方向),所謂橫方向係與膜之行進方向垂直之方向(有時亦稱為橫方向或寬度方向)。以往之積層聚丙烯膜係縱方向之150℃熱收縮率為9%以上。 The laminated polypropylene film of the present invention is an stretched film mainly composed of a polypropylene resin, and the thermal shrinkage ratio in the longitudinal direction at 150 ° C must be 7% or less. Here, the so-called longitudinal direction of the film (sometimes also referred to as the length direction or the long-side direction), and the so-called transverse direction are perpendicular to the direction of the film (sometimes also referred to as the lateral direction or the width direction). The conventional laminated polypropylene film has a thermal shrinkage rate of 9% or more at 150 ° C in the longitudinal direction.
本發明之積層聚丙烯膜之縱方向之150℃熱收縮率之上限較佳為6%,更佳為5%,又更佳為4%。若縱方向之150℃熱收縮率之上限為上述範圍,則氣體阻隔性更良好。 The upper limit of the 150 ° C thermal shrinkage of the laminated polypropylene film of the present invention in the longitudinal direction is preferably 6%, more preferably 5%, and even more preferably 4%. If the upper limit of the thermal contraction rate at 150 ° C in the longitudinal direction is within the above range, the gas barrier properties will be better.
於對聚丙烯膜基材蒸鍍無機化合物時,雖然使用丙烯系聚合物之膜因用於蒸鍍材料之無機化合物分子所具有之熱能或來自收容無機化合物之坩堝的輻射熱而發生收縮,但推測若於形成無機薄膜層時此種聚丙烯膜基材之收縮之程度小,則氣體難以通過。作為原因,可認為若於無機薄膜層之形成中途發生聚丙烯膜基材之收縮,則因基材表面之隆起等而無機薄膜層被破壞,或難以形成緻密之無機薄膜層。 When an inorganic compound is vapor-deposited on a polypropylene film substrate, although a film using a propylene-based polymer shrinks due to thermal energy possessed by the inorganic compound molecules used for the vapor deposition material or radiant heat from a crucible containing the inorganic compound, it is estimated If the degree of shrinkage of the polypropylene film substrate is small when the inorganic thin film layer is formed, it is difficult for gas to pass through. As a reason, it is considered that if shrinkage of the polypropylene film base material occurs during the formation of the inorganic thin film layer, the inorganic thin film layer is destroyed due to the bulge of the surface of the base material, or it is difficult to form a dense inorganic thin film layer.
縱方向之150℃熱收縮率之下限較佳為0.2%,更佳為0.3%,又更佳為0.5%,尤佳為0.7%,最佳為1.0%。若縱方向之150℃熱收縮率之下限為上述範圍,則有時於成本方面等而言現實性之製造變容易,或厚度不均變小。 The lower limit of the 150 ° C thermal shrinkage in the longitudinal direction is preferably 0.2%, more preferably 0.3%, still more preferably 0.5%, even more preferably 0.7%, and most preferably 1.0%. If the lower limit of the 150 ° C. thermal contraction rate in the longitudinal direction is within the above range, realistic manufacturing may be facilitated in terms of cost and the like, or thickness unevenness may be reduced.
本發明之積層聚丙烯膜之橫方向之150℃熱收縮率之上限較佳為7%,更佳為6%,又更佳為5%,尤佳為4%。若橫方向之150℃熱收縮率之上限為上述範圍,則於進一步對積層聚丙烯膜或使用該積層聚丙烯膜之積層膜進行熱密封之情形時,由於藉由將熱密封溫度設定得高,接著強度(熱密封強度)提高,故可增大製袋加工等中之生產線速度,生產性提高。再者,即便於製袋後進行蒸煮等高溫處理時,亦可抑制袋之變形量。 The upper limit of the 150 ° C thermal shrinkage rate in the transverse direction of the laminated polypropylene film of the present invention is preferably 7%, more preferably 6%, still more preferably 5%, and even more preferably 4%. If the upper limit of the 150 ° C heat shrinkage rate in the horizontal direction is within the above range, when the laminated polypropylene film or the laminated film using the laminated polypropylene film is further heat-sealed, the heat-sealing temperature is set to be high. , And then the strength (heat seal strength) is increased, so the production line speed in bag making processing can be increased, and the productivity is improved. Furthermore, even when a high-temperature process such as cooking is performed after the bag is made, the amount of deformation of the bag can be suppressed.
橫方向之150℃熱收縮率之下限較佳為0.2%,更佳為0.3%,又更佳為0.5%,尤佳為0.7%,最佳為1.0%。若橫方向之150℃熱收縮率之下限為上述範圍,則有時於成本方面等而言現實性之製造變容易,或厚度不均變小。 The lower limit of the 150 ° C thermal contraction rate in the horizontal direction is preferably 0.2%, more preferably 0.3%, still more preferably 0.5%, particularly preferably 0.7%, and most preferably 1.0%. If the lower limit of the 150 ° C. thermal contraction rate in the horizontal direction is within the above range, realistic manufacturing may be facilitated in terms of cost and the like, or thickness unevenness may be reduced.
(氧透過度) (Oxygen Transmission)
於本發明中,於溫度23℃、相對濕度65%下之積層聚丙烯膜之氧透過度之上限必須為150mL/m2/day/ MPa以下。更佳為130mL/m2/day/MPa以下,又更佳為120mL/m2/day/MPa以下,進一步更佳為100mL/m2/day/MPa以下,尤佳為90mL/m2/day/MPa以下。若氧透過度之上限超過150mL/m2/day/MPa,則因氧而劣化之物質或食品之保存性變得不良。於溫度23℃、濕度65%下之積層聚丙烯膜之氧透過度之下限並無特別限定,較佳為0.1mL/m2/day/MPa以上。另外,就製造上之觀點而言,可認為0.1mL/m2/day/MPa係下限。 In the present invention, the upper limit of the oxygen permeability of the laminated polypropylene film at a temperature of 23 ° C. and a relative humidity of 65% must be 150 mL / m 2 / day / MPa or less. It is more preferably 130 mL / m 2 / day / MPa or less, still more preferably 120 mL / m 2 / day / MPa or less, still more preferably 100 mL / m 2 / day / MPa or less, and even more preferably 90 mL / m 2 / day. / MPa or less. When the upper limit of the oxygen permeability exceeds 150 mL / m 2 / day / MPa, the storage property of a substance or food deteriorated by oxygen becomes poor. The lower limit of the oxygen permeability of the laminated polypropylene film at a temperature of 23 ° C. and a humidity of 65% is not particularly limited, but is preferably 0.1 mL / m 2 / day / MPa or more. In addition, from the viewpoint of manufacturing, 0.1 mL / m 2 / day / MPa is considered to be the lower limit.
(霧度) (Haze)
本發明之積層聚丙烯膜之霧度之上限較佳為6%,更佳為5%,又更佳為4.5%,進而更佳為4%,尤佳為3.5%。若霧度之上限為上述範圍,則有時於要求透明之用途中容易使用。為了將霧度設為6%以下,無機薄膜層較佳為透明。 The upper limit of the haze of the laminated polypropylene film of the present invention is preferably 6%, more preferably 5%, still more preferably 4.5%, even more preferably 4%, and even more preferably 3.5%. When the upper limit of the haze is the above range, it may be easily used in applications requiring transparency. In order to set the haze to 6% or less, the inorganic thin film layer is preferably transparent.
關於本發明之積層聚丙烯膜之霧度之下限,以現實性之值而言較佳為0.1%,更佳為0.2%,又更佳為0.3%,尤佳為0.4%。 Regarding the lower limit of the haze of the laminated polypropylene film of the present invention, in terms of realistic values, it is preferably 0.1%, more preferably 0.2%, still more preferably 0.3%, and even more preferably 0.4%.
(聚丙烯膜基材) (Polypropylene film substrate)
用於本發明之積層聚丙烯膜中的聚丙烯膜基材尤其於膜物性之方面具有特徵。本發明之延伸聚丙烯膜顯示出如下膜物性。再者,以下之各物性例如係設定為藉由下文將於實施例中描述之方法進行測定、評價之值。 The polypropylene film base material used in the laminated polypropylene film of the present invention has characteristics especially in terms of film physical properties. The stretched polypropylene film of the present invention exhibits the following film properties. In addition, each physical property below is set to the value measured and evaluated by the method described later in an Example, for example.
(熱收縮率) (Heat shrinkage)
本發明中所用之聚丙烯膜基材係以聚丙烯系樹脂作為主體而構成之延伸膜,並且150℃時之縱方向之熱收縮率之上限較佳為10%,更佳為9%,又更佳為7%,尤佳為 5%。以往之聚丙烯膜係縱方向之150℃熱收縮率為11%以上。藉由將聚丙烯膜基材之熱收縮率設為10%以下,可將本發明之積層聚丙烯膜中之於150℃之縱方向之熱收縮率設為7%以下。 The polypropylene film substrate used in the present invention is an stretched film composed mainly of a polypropylene-based resin, and the upper limit of the thermal contraction rate in the longitudinal direction at 150 ° C is preferably 10%, more preferably 9%, and It is more preferably 7%, and even more preferably 5%. The conventional polypropylene film has a thermal shrinkage at a temperature of 150 ° C in the longitudinal direction of 11% or more. By setting the thermal shrinkage of the polypropylene film substrate to 10% or less, the thermal shrinkage of the laminated polypropylene film of the present invention in the longitudinal direction at 150 ° C can be set to 7% or less.
另外,本發明中所用之聚丙烯膜基材係以聚丙烯樹脂作為主體而構成之延伸膜,並且150℃時之橫方向之熱收縮率較佳為15%以下,更佳為9%,又更佳為7%,尤佳為7%以下。以往之聚丙烯膜係橫方向之150℃熱收縮率為16%以上。藉由將聚丙烯膜基材之熱收縮率設為10%以下,可將本發明之積層聚丙烯膜中之於150℃之橫方向之熱收縮率設為7%以下。 In addition, the polypropylene film base material used in the present invention is an stretched film composed mainly of a polypropylene resin, and the heat shrinkage rate in the transverse direction at 150 ° C is preferably 15% or less, more preferably 9%, and It is more preferably 7%, and even more preferably 7% or less. The conventional polypropylene film has a thermal shrinkage rate of 16% or higher at 150 ° C in the transverse direction. By setting the thermal shrinkage of the polypropylene film substrate to 10% or less, it is possible to set the thermal shrinkage of the laminated polypropylene film of the present invention at 150 ° C in the transverse direction to 7% or less.
此處所謂縱方向係膜之行進方向(有時亦稱為長度方向),所謂橫方向係與膜之行進方向垂直之方向(有時亦稱為寬度方向)。 Here, the longitudinal direction refers to the direction of travel of the film (sometimes referred to as the length direction), and the so-called lateral direction refers to the direction perpendicular to the direction of travel of the film (also sometimes referred to as the width direction).
本發明中所用之聚丙烯膜基材之縱方向及橫方向之150℃熱收縮率之下限較佳為0.2%,更佳為0.3%,又更佳為0.5%,尤佳為0.7%,最佳為1.0%。若150℃熱收縮率為上述範圍,則有時於成本方面等而言現實性之製造變容易,或厚度不均變小。 The lower limit of the 150 ° C thermal shrinkage of the longitudinal direction and the transverse direction of the polypropylene film substrate used in the present invention is preferably 0.2%, more preferably 0.3%, still more preferably 0.5%, particularly preferably 0.7%. It is preferably 1.0%. When the thermal shrinkage rate at 150 ° C is in the above range, realistic manufacturing may be facilitated in terms of cost and the like, or thickness unevenness may be reduced.
再者,150℃熱收縮率若不低於1.5%左右,則例如可藉由增加膜基材中之聚丙烯之低分子量成分,調整膜之延伸條件或熱固定條件而實現,但為了降低至1.5%以下,較佳為以離線(off-line)方式實施退火處理等。 In addition, if the thermal shrinkage rate at 150 ° C is not less than about 1.5%, it can be achieved by, for example, increasing the low molecular weight component of polypropylene in the film substrate and adjusting the film's stretching conditions or heat setting conditions. 1.5% or less, preferably an off-line annealing treatment or the like.
(霧度) (Haze)
關於本發明中所用之聚丙烯膜基材之霧度之下限,以現實性之值而言較佳為0.1%,更佳為0.2%,又更佳為0.3%,尤佳為0.4%。霧度之上限較佳為6%,更佳為5%, 又更佳為4.5%,尤佳為4%,最佳為3.5%。若霧度為上述範圍,則有時於要求透明之用途中容易使用。例如於延伸溫度、熱固定溫度過高之情形時、於CR(Chill Roll;冷卻輥)溫度高而延伸捲筒片材之冷卻速度慢之情形時以及於低分子量過多之情形時,霧度有變差之傾向,故而可藉由調節該等因素而控制於前述範圍內。 Regarding the lower limit of the haze of the polypropylene film substrate used in the present invention, in terms of realistic values, it is preferably 0.1%, more preferably 0.2%, still more preferably 0.3%, and even more preferably 0.4%. The upper limit of the haze is preferably 6%, more preferably 5%, still more preferably 4.5%, even more preferably 4%, and most preferably 3.5%. When the haze is within the above range, it may be easily used in applications requiring transparency. For example, when the stretching temperature and heat-fixing temperature are too high, when the CR (Chill Roll) temperature is high, and the cooling speed of the stretching roll sheet is slow, and when the low molecular weight is too high, the haze may be The tendency to worsen can be controlled within the aforementioned range by adjusting these factors.
(厚度) (Thickness)
本發明中所用之聚丙烯膜基材之厚度之下限為3μm,較佳為4μm,更佳為8μm。 The lower limit of the thickness of the polypropylene film substrate used in the present invention is 3 μm, preferably 4 μm, and more preferably 8 μm.
若膜之厚度之下限小於3μm,則積層聚丙烯膜容易捲曲,氣體阻隔性容易降低。 If the lower limit of the thickness of the film is less than 3 μm, the laminated polypropylene film is easily curled, and the gas barrier property is easily reduced.
就膜厚度之加工性之觀點而言,上限較佳為300μm,更佳為250μm,又更佳為200μm,進一步更佳為150μm,尤佳為100μm,最佳為50μm。 From the viewpoint of the processability of the film thickness, the upper limit is preferably 300 μm, more preferably 250 μm, still more preferably 200 μm, still more preferably 150 μm, even more preferably 100 μm, and most preferably 50 μm.
(耐衝擊性) (Impact resistance)
本發明中所用之聚丙烯膜基材之耐衝擊性(23℃)之下限較佳為0.6J,更佳為0.7J。若耐衝擊性為上述範圍,則具有作為膜而充分之強韌性,於操作時不會斷裂。就現實方面而言,耐衝擊性之上限較佳為2J,更佳為1.8J,又更佳為1.6J,尤佳為1.5J。例如於膜基材中之聚丙烯之低分子量成分多之情形時、於總體之分子量低之情形時、於膜基材中之聚丙烯之高分子量成分少之情形時以及於高分子量成分之分子量低之情形時,有耐衝擊性降低之傾向,故而耐衝擊性可藉由根據用途調整該等因素而控制於前述範圍內。 The lower limit of the impact resistance (23 ° C) of the polypropylene film substrate used in the present invention is preferably 0.6J, more preferably 0.7J. When the impact resistance is within the above range, it has sufficient toughness as a film and does not break during handling. In practical terms, the upper limit of impact resistance is preferably 2J, more preferably 1.8J, still more preferably 1.6J, and even more preferably 1.5J. For example, when there are many low molecular weight components of polypropylene in the film substrate, when the overall molecular weight is low, when there are few high molecular weight components of polypropylene in the film substrate, and when the molecular weight of the high molecular weight components is high. In a low case, the impact resistance tends to decrease, so the impact resistance can be controlled within the aforementioned range by adjusting these factors according to the application.
(楊氏率) (Young's rate)
於本發明中所用之聚丙烯膜基材為雙軸延伸膜之情形時,縱方向之楊氏率(23℃)之下限較佳為2GPa,更佳為2.1GPa,又更佳為2.2GPa,尤佳為2.3GPa,最佳為2.4GPa。縱方向之楊氏率之上限較佳為4GPa,更佳為3.7GPa,又更佳為3.5GPa,尤佳為3.4GPa,最佳為3.3GPa。若縱方向之楊氏率為上述範圍,則有時現實性之製造容易,另外縱-橫平衡變良好。 In the case where the polypropylene film substrate used in the present invention is a biaxially stretched film, the lower limit of the Young's rate (23 ° C) in the longitudinal direction is preferably 2 GPa, more preferably 2.1 GPa, and even more preferably 2.2 GPa. Particularly preferred is 2.3 GPa, and most preferred is 2.4 GPa. The upper limit of the Young's ratio in the longitudinal direction is preferably 4 GPa, more preferably 3.7 GPa, still more preferably 3.5 GPa, even more preferably 3.4 GPa, and most preferably 3.3 GPa. When the Young's ratio in the vertical direction is in the above range, practical production may be easy, and the vertical-horizontal balance may be improved.
於用於本發明之基材的聚丙烯膜為雙軸延伸膜之情形時,橫方向之楊氏率(23℃)之下限較佳為3.8GPa,更佳為4GPa,又更佳為4.1GPa,尤佳為4.2GPa。橫方向之楊氏率之上限較佳為8GPa,更佳為7.5GPa,又更佳為7GPa,尤佳為6.5GPa。若橫方向之楊氏率為上述範圍,則有時現實性之製造容易,另外縱方向與橫方向之楊氏率之平衡變良好。再者,縱方向、橫方向之楊氏率例如可藉由提高各方向之延伸倍率而提高,另外於沿縱方向延伸後進行橫方向延伸之情形時,可藉由將縱方向延伸倍率設定得低,將橫方向延伸倍率設定得高等,而增大橫方向之楊氏率。 When the polypropylene film used for the substrate of the present invention is a biaxially stretched film, the lower limit of the Young's rate (23 ° C) in the lateral direction is preferably 3.8 GPa, more preferably 4 GPa, and still more preferably 4.1 GPa. , Especially preferably 4.2GPa. The upper limit of the Young's rate in the horizontal direction is preferably 8 GPa, more preferably 7.5 GPa, still more preferably 7 GPa, and even more preferably 6.5 GPa. If the Young's ratio in the horizontal direction is in the above range, practical production may be easy, and the balance between the Young's ratio in the vertical direction and the horizontal direction may be good. In addition, the Young's ratio in the vertical and horizontal directions can be increased, for example, by increasing the stretching ratio in each direction. In the case of extending in the horizontal direction after extending in the vertical direction, the vertical stretching ratio can be set to If it is low, set the horizontal magnification to high, etc., and increase the Young's ratio in the horizontal direction.
(厚度均勻性) (Thickness uniformity)
本發明中所用之聚丙烯膜基材之厚度之均勻性之下限較佳為0%,更佳為0.1%,又更佳為0.5%,尤佳為1%。厚度之均勻性之上限較佳為20%,更佳為17%,又更佳為15%,尤佳為12%,最佳為10%。若厚度之均勻性為上述範圍,則於塗佈或印刷等後加工時不易產生不良,容易用於要求精密性之用途中。 The lower limit of the uniformity of the thickness of the polypropylene film substrate used in the present invention is preferably 0%, more preferably 0.1%, still more preferably 0.5%, and even more preferably 1%. The upper limit of the thickness uniformity is preferably 20%, more preferably 17%, still more preferably 15%, even more preferably 12%, and most preferably 10%. When the uniformity of the thickness is within the above range, defects are less likely to occur during post-processing such as coating or printing, and it is easy to use for applications requiring precision.
(膜密度) (Film density)
本發明中所用之聚丙烯膜基材之密度之下限較佳為 0.910g/cm3,更佳為0.911g/cm3,又更佳為0.912g/cm3,尤佳為0.913g/cm3。若膜密度為上述範圍,則有時結晶性高而熱收縮率變小。膜密度之上限較佳為0.930g/cm3,更佳為0.928g/cm3,又更佳為0.926g/cm3,尤佳為0.925g/cm3。若膜密度超過上述上限,則有時現實中製造變困難。膜密度可藉由提高延伸倍率或延伸溫度,提高熱固定溫度,再進一步進行離線退火而提高。 The lower limit of the present invention is used in the density of the polypropylene film substrate is preferably 0.910g / cm 3, more preferably 0.911g / cm 3, and more preferably 0.912g / cm 3, particularly preferably 0.913g / cm 3 . When the film density is in the above range, the crystallinity may be high and the heat shrinkage rate may be reduced. The upper limit of the film density is preferably 0.930g / cm 3, more preferably 0.928g / cm 3, and more preferably 0.926g / cm 3, particularly preferably 0.925g / cm 3. When the film density exceeds the above-mentioned upper limit, production may become difficult in reality. The film density can be increased by increasing the stretching ratio or temperature, increasing the heat-fixing temperature, and further performing off-line annealing.
(折射率) (Refractive index)
本發明中所用之聚丙烯膜基材之縱方向之折射率(Nx)之下限較佳為1.502,更佳為1.503,又更佳為1.504。Nx之上限較佳為1.520,更佳為1.517,又更佳為1.515。 The lower limit of the refractive index (Nx) in the longitudinal direction of the polypropylene film substrate used in the present invention is preferably 1.502, more preferably 1.503, and even more preferably 1.504. The upper limit of Nx is preferably 1.520, more preferably 1.517, and even more preferably 1.515.
本發明中所用之聚丙烯膜基材之橫方向之折射率(Ny)之下限較佳為1.523,更佳為1.525。Ny之上限較佳為1.535,更佳為1.532。 The lower limit of the refractive index (Ny) in the transverse direction of the polypropylene film substrate used in the present invention is preferably 1.523, more preferably 1.525. The upper limit of Ny is preferably 1.535, more preferably 1.532.
本發明中所用之聚丙烯膜基材之厚度方向之折射率(Nz)之下限較佳為1.480,更佳為1.489,又更佳為1.500。Nz之上限較佳為1.510,更佳為1.507,又更佳為1.505。 The lower limit of the refractive index (Nz) in the thickness direction of the polypropylene film substrate used in the present invention is preferably 1.480, more preferably 1.489, and even more preferably 1.500. The upper limit of Nz is preferably 1.510, more preferably 1.507, and even more preferably 1.505.
(面配向係數) (Face alignment coefficient)
用於本發明之基材的聚丙烯膜之面配向係數之下限較佳為0.0125,更佳為0.0126,又更佳為0.0127,尤佳為0.0128。關於面配向係數之上限,以現實性之值而言較佳為0.0155,更佳為0.0150,又更佳為0.0148,尤佳為0.0145。面配向係數可藉由調整延伸倍率而設定為範圍內。若面配向係數為該範圍,則有膜之厚度不均亦變良好之傾向。 The lower limit of the surface alignment coefficient of the polypropylene film used in the substrate of the present invention is preferably 0.0125, more preferably 0.0126, still more preferably 0.0127, and even more preferably 0.0128. Regarding the upper limit of the surface alignment coefficient, in terms of realistic values, it is preferably 0.0155, more preferably 0.0150, still more preferably 0.0148, and even more preferably 0.0145. The surface alignment coefficient can be set within a range by adjusting the extension magnification. When the surface alignment coefficient is within this range, the thickness unevenness of the film tends to be good.
(膜之配向) (Film orientation)
聚丙烯膜基材通常具有結晶配向,該結晶配向之方向或程度對膜物性造成大的影響。結晶配向之程度視所使用之聚丙烯之分子結構、或者膜製造中之製程或條件而變化。另外,延伸聚丙烯膜之配向方向可藉由以下方式確定:藉由廣角X射線折射法對膜面垂直地入射X射線,對源自結晶之散射波峰之方位角依存性進行測定。詳細而言,延伸聚丙烯膜典型而言具有單斜晶之α型結晶結構。而且對於該α型結晶而言,若藉由廣角X射線折射法對110面(面間隔:6.65埃)之散射強度之方位角依存性進行測定,則主要於單軸具有強配向。亦即,於相對於方位角而描繪源自α型結晶之110面的散射強度之情形時,於分子軸之配向之垂直方向觀察到最強波峰。於本發明中,藉由該最大波峰之半高寬來規定配向之程度。 Polypropylene film substrates usually have crystalline alignment, and the direction or degree of the crystalline alignment greatly affects the physical properties of the film. The degree of crystalline alignment varies depending on the molecular structure of the polypropylene used or the process or conditions in the manufacture of the film. In addition, the orientation direction of the stretched polypropylene film can be determined by the following method: X-rays are incident perpendicularly to the film surface by a wide-angle X-ray refraction method, and the azimuth dependency of the scattering peaks derived from crystals is measured. In detail, the stretched polypropylene film typically has a monoclinic α-type crystal structure. In addition, for the α-type crystal, if the azimuth dependence of the scattering intensity of the 110 plane (plane interval: 6.65 angstroms) is measured by a wide-angle X-ray refraction method, it has a strong alignment mainly in a uniaxial direction. That is, when the scattering intensity derived from the 110 plane of the α-type crystal is plotted with respect to the azimuth angle, the strongest wave peak is observed in the vertical direction of the alignment of the molecular axis. In the present invention, the degree of alignment is specified by the full width at half maximum of the maximum wave crest.
再者,關於源自聚丙烯之α型結晶之110面的散射之方位角依存性,將典型之圖案顯示於圖1中。另外,圖1中顯示出110面之方位角依存性之主波峰(最大波峰、方位角180°及360°)之半高寬。 In addition, a typical pattern is shown in FIG. 1 about the azimuth dependence of the scattering from the 110 plane of the α-type crystal of polypropylene. In addition, FIG. 1 shows the full width at half maximum of the main peaks (maximum peaks, azimuth angles of 180 ° and 360 °) of the azimuth dependence of the 110 plane.
對於用於本發明之基材的聚丙烯膜而言,較佳為相對於方位角而描繪藉由廣角X射線散射法所測定的110面之散射強度時的最大波峰之半高寬為30度以下。該半高寬之上限更佳為29度,又更佳為28度。若源自110面的散射強度之方位角依存性之半高寬大於前述範圍,則配向不充分,耐熱性或剛性不充分。源自110面的散射強度之方位角依存性之半高寬之下限較佳為5度,更佳為7度,又更佳為8度。若110面之半高寬小於前述範圍,則有時產生耐衝擊性之降低或配向混亂。 For the polypropylene film used in the base material of the present invention, it is preferable that the maximum width at half maximum of the peak width when the scattering intensity of 110 planes measured by the wide-angle X-ray scattering method with respect to the azimuth angle is 30 degrees the following. The upper limit of the FWHM is more preferably 29 degrees, and even more preferably 28 degrees. If the full width at half maximum of the azimuth dependence of the scattering intensity from the 110 plane is larger than the aforementioned range, the alignment is insufficient, and the heat resistance or rigidity is insufficient. The lower limit of the azimuth dependence of the scattering intensity from the 110 plane is preferably 5 degrees, more preferably 7 degrees, and even more preferably 8 degrees. If the full width at half maximum of the 110 plane is smaller than the aforementioned range, a reduction in impact resistance or a disordered alignment may occur.
(廣角X射線折射裝置) (Wide-angle X-ray refraction device)
上述所規定之半高寬較佳為使用平行度高之X射線而測定,可較佳地使用放射光。 The predetermined full width at half maximum is preferably measured using X-rays having high parallelism, and radiation light is preferably used.
作為用於廣角X射線折射測定之X射線產生源,可為實驗室中所用之球管式或旋轉式等的一般之裝置,但較佳為使用可照射平行度高且高亮度之放射光的高亮度光源。放射光中,X射線容易擴展且亮度亦高,故能以高精度且於短時間內進行測定,例如即便為厚度幾十微米之膜樣本亦可不將膜重疊而對一片膜進行測定,而且可進行精度高之測定,故而可進行詳細之結晶配向評價。相對於此,對於亮度低之X射線而言,於對厚度幾十微米之膜樣本進行測定之情形時存在以下傾向:若不將複數片重疊則測定需要長時間;若將複數片重疊,則因微小之偏移而導致相對於方位角描繪110面之散射強度時的波峰變寬,所得之半高寬之值變大。 As an X-ray generation source for wide-angle X-ray refraction measurement, a general device such as a tube type or a rotary type used in a laboratory may be used, but it is preferable to use a device capable of irradiating radiation with high parallelism and high brightness. High brightness light source. Among the emitted light, X-rays are easy to expand and have high brightness, so they can be measured with high accuracy and in a short time. For example, even for a film sample with a thickness of several tens of microns, a film can be measured without overlapping the films. Since high-precision measurement is performed, detailed crystal orientation evaluation can be performed. On the other hand, for low-brightness X-rays, when measuring film samples with a thickness of several tens of micrometers, there is the following tendency: if multiple pieces are not overlapped, the measurement takes a long time; if multiple pieces are overlapped, then The peak width when the scattering intensity of the 110 plane is plotted with respect to the azimuth angle due to a slight shift is widened, and the value of the FWHM obtained is increased.
作為可照射平行度高且高亮度之放射光的設備,例如可列舉SPring-8般之大型放射光設施等,例如較佳為使用FSBL(Frontier Softmaterial Beamline;先進材料開發產學財團)所擁有之Beamline BL03XU測定本發明之半高寬。 Examples of equipment that can irradiate radiation with high parallelism and high brightness include, for example, large-scale radiation facilities such as SPring-8. For example, the FSBL (Frontier Softmaterial Beamline; Advanced Materials Development Industry-Academic Consortium) Beamline BL03XU measures the full width at half maximum of the present invention.
(長週期結構、SAXS(Small-Angle X-ray Scattering;小角X射線散射)) (Long-period structure, SAXS (Small-Angle X-ray Scattering))
本發明中所用之聚丙烯膜基材較佳為長週期尺寸大。一般而言,結晶性高分子具有由結晶與非晶之重複所構成的規則性之積層結構(週期結構)。此處,將由結晶與非晶所構成的重複單元之大小稱為長週期尺寸。該長週期尺寸可根據如下散射波峰角度而求出,上述散射波峰角度係源自藉由小角X射線散射法所測定之主配向方向之長週期結構。 The polypropylene film substrate used in the present invention preferably has a long period and a large size. Generally, a crystalline polymer has a regular multilayer structure (periodic structure) composed of repetition of crystalline and amorphous. Here, the size of a repeating unit composed of a crystal and an amorphous is referred to as a long period size. This long-period size can be obtained from the scattering peak angle, which is derived from the long-period structure of the main alignment direction measured by the small-angle X-ray scattering method.
用於本發明之基材的聚丙烯膜之由小角X射線散射測定所得之長週期散射波峰較佳為於主配向方向明確觀察到波峰。此處所謂主配向方向係表示於二維X射線散射圖案中更強烈地觀察到由高分子結晶之長週期所引起之散射的方向。於單軸延伸之情形時,大多情況下主配向方向與延伸方向一致,於縱方向延伸-橫方向延伸之逐次雙軸延伸之情形時,雖亦取決於各延伸倍率,但大多情況下主配向方向與橫方向延伸方向一致。越明顯地觀察到由高分子結晶所引起之長週期波峰,表示形成秩序性越高之長週期結構。 It is preferable that the long-period scattering peaks obtained from the small-angle X-ray scattering measurement of the polypropylene film used in the substrate of the present invention are clearly observed in the main alignment direction. The so-called main alignment direction is a direction in which a scattering caused by a long period of a polymer crystal is more strongly observed in a two-dimensional X-ray scattering pattern. In the case of uniaxial extension, the main alignment direction is consistent with the extension direction in most cases. In the case of successive biaxial extension in the longitudinal extension-horizontal extension, although it depends on each extension magnification, in most cases the main orientation The direction is the same as the horizontal extension direction. The more obvious the observation of long-period peaks caused by polymer crystallization is, the longer-period structure with higher order is formed.
用於本發明之基材的聚丙烯膜較佳為由長週期散射波峰所得之長週期尺寸為40nm以上。長週期尺寸之下限更佳為41nm,又更佳為43nm。若長週期尺寸小於前述範圍,則有熔解波峰溫度低,因此耐熱性降低之傾向。長週期尺寸之上限較佳為100nm,更佳為90nm,又更佳為80nm。若長週期尺寸大於前述範圍,則結晶化或熱處理需要長時間,故有現實性之製造變困難之傾向。 The polypropylene film used in the substrate of the present invention preferably has a long period size of 40 nm or more obtained from a long period scattering peak. The lower limit of the long period size is more preferably 41 nm, and even more preferably 43 nm. If the long-period dimension is smaller than the aforementioned range, the melting peak temperature is low, and thus the heat resistance tends to be lowered. The upper limit of the long period size is preferably 100 nm, more preferably 90 nm, and even more preferably 80 nm. If the long-period size is larger than the aforementioned range, it takes a long time for crystallization or heat treatment, so that realistic manufacturing tends to be difficult.
(小角X射線折射裝置) (Small angle X-ray refraction device)
作為用於小角X射線散射測定之X射線產生源,並無特別限制,可使用實驗室中所用之球管式或旋轉式等的一般之裝置,較佳為與上述用於廣角X射線折射測定之X射線產生源同樣地,使用可照射亮度高之放射光的高亮度光源。尤其於本發明中所用之聚丙烯膜基材具有大的長週期之情形時,源自長週期結構之X射線散射位於更小角側之區域中。因此,X射線束徑大、拍攝長度短的實驗室之X射線裝置之情況下難以進行測定,故而較佳為使用X射線不容易擴展,可將束徑控制於幾百微米以下,且亮度 亦高之放射光,以長的拍攝長度測定超小角區域。此時,拍攝長度較佳為7m以上。 As an X-ray generation source for small-angle X-ray scattering measurement, there is no particular limitation, and a general device such as a tube type or a rotary type used in a laboratory may be used. As the X-ray generation source, a high-brightness light source capable of radiating high-brightness radiated light is used. Especially in the case where the polypropylene film substrate used in the present invention has a large long period, the X-ray scattering originating from the long period structure is located in a region with a smaller angle side. Therefore, it is difficult to measure in the case of a laboratory X-ray device with a large X-ray beam diameter and short shooting length. Therefore, it is preferable to use X-rays that are not easy to expand, and the beam diameter can be controlled below several hundred microns, and the brightness is also For high-emission light, the ultra-small-angle area is measured with a long shooting length. At this time, the shooting length is preferably 7 m or more.
[聚丙烯系樹脂] [Polypropylene resin]
用於本發明之聚丙烯膜基材的聚丙烯系樹脂並無特別限制,例如可使用丙烯均聚物或與乙烯及/或碳數4以上之α-烯烴之共聚物以及該等之混合物。 The polypropylene-based resin used for the polypropylene film substrate of the present invention is not particularly limited. For example, a propylene homopolymer or a copolymer with ethylene and / or an α-olefin having 4 or more carbon atoms, and a mixture thereof can be used.
作為構成膜之聚丙烯系樹脂,較佳為實質上不含共單體之丙烯均聚物,即便於含有共單體之情形時,亦較佳為共單體量為0.5莫耳%以下。共單體量之上限較佳為0.3莫耳%,又更佳為0.1莫耳%。若為上述範圍,則有時結晶性提高,高溫時之熱收縮率變小。再者,亦可於不使結晶性明顯降低之範圍內微量含有共單體。 The polypropylene resin constituting the film is preferably a propylene homopolymer that does not substantially contain a comonomer, and even when a comonomer is contained, the comonomer amount is preferably 0.5 mol% or less. The upper limit of the comonomer amount is preferably 0.3 mole%, and even more preferably 0.1 mole%. If it is the said range, crystallinity may improve and the heat shrinkage rate at high temperatures may become small. Furthermore, a small amount of comonomer may be contained within a range that does not significantly reduce crystallinity.
構成膜之聚丙烯系樹脂較佳為僅由丙烯單體所得之丙烯均聚物,即便為丙烯均聚物,亦較佳為不含頭-頭鍵般之異質鍵。 The polypropylene-based resin constituting the film is preferably a propylene homopolymer obtained only from a propylene monomer, and even if it is a propylene homopolymer, it is also preferable that it does not contain a head-to-head bond heterogeneous bond.
(聚丙烯系樹脂之立體規則性) (Three-dimensional regularity of polypropylene resin)
作為構成膜之聚丙烯系樹脂之立體規則性之指標的由13C-NMR(Nuclear Magnetic Resonance;核磁共振)所測定之內消旋五元組分率之下限較佳為96%。內消旋五元組分率之下限較佳為96.5%,更佳為97%。若為上述範圍,則有時結晶性提高,高溫時之熱收縮率進一步降低。內消旋五元組分率之上限較佳為99.8%,更佳為99.6%,又更佳為99.5%。若為上述範圍,則有時現實性之製造變容易。 The lower limit of the meso pentad component ratio measured by 13 C-NMR (Nuclear Magnetic Resonance; nuclear magnetic resonance) as an index of the stereoregularity of the polypropylene resin constituting the film is preferably 96%. The lower limit of the meso pentad component ratio is preferably 96.5%, more preferably 97%. If it is the said range, crystallinity may improve and the thermal shrinkage rate at the time of high temperature may fall further. The upper limit of the meso pentad component ratio is preferably 99.8%, more preferably 99.6%, and still more preferably 99.5%. If it is the said range, realistic manufacture may become easy.
構成膜之聚丙烯系樹脂之內消旋平均鏈長之下限較佳為100,更佳為120,又更佳為130。若為上述範圍,則有時結晶性提高,高溫時之熱收縮率變小。就現實方面而 言,內消旋平均鏈長之上限較佳為5000。 The lower limit of the meso average chain length of the polypropylene resin constituting the film is preferably 100, more preferably 120, and even more preferably 130. If it is the said range, crystallinity may improve and the heat shrinkage rate at high temperatures may become small. For practical purposes, the upper limit of the meso average chain length is preferably 5,000.
就現實方面而言,構成膜之聚丙烯系樹脂之二甲苯可溶成分之下限較佳為0.1質量%。二甲苯可溶成分之上限較佳為7質量%,更佳為6質量%,又更佳為5質量%。若為上述範圍,則有時結晶性提高,高溫時之熱收縮率變小。 In practical terms, the lower limit of the xylene soluble content of the polypropylene resin constituting the film is preferably 0.1% by mass. The upper limit of the xylene-soluble component is preferably 7 mass%, more preferably 6 mass%, and still more preferably 5 mass%. If it is the said range, crystallinity may improve and the heat shrinkage rate at high temperatures may become small.
(聚丙烯系樹脂之熔體流動速率) (Mel flow rate of polypropylene resin)
聚丙烯系樹脂之MFR(Melt Flow Rate;熔體流動速率)(230℃、2.16kgf)之下限為0.5g/10分鐘。MFR之下限較佳為1.0g/10分鐘,更佳為1.3g/10分鐘,又更佳為1.5g/10分鐘,進一步更佳為2.0g/10分鐘,尤佳為4.0g/10分鐘,較佳為6.0g/10分鐘。若為上述範圍,則有時機械負荷小,擠出或延伸變容易。MFR之上限為20g/10分鐘,較佳為17g/10分鐘,更佳為16g/10分鐘,又更佳為15g/10分鐘。若為上述範圍,則有時延伸變容易,或厚度不均變小,或容易提高延伸溫度或熱固定溫度而熱收縮率進一步降低。 The lower limit of the MFR (Melt Flow Rate) (230 ° C, 2.16 kgf) of the polypropylene resin is 0.5 g / 10 minutes. The lower limit of MFR is preferably 1.0 g / 10 minutes, more preferably 1.3 g / 10 minutes, still more preferably 1.5 g / 10 minutes, even more preferably 2.0 g / 10 minutes, and even more preferably 4.0 g / 10 minutes. It is preferably 6.0 g / 10 minutes. If it is the said range, there may be a small mechanical load, and extrusion or extension may become easy. The upper limit of MFR is 20 g / 10 minutes, preferably 17 g / 10 minutes, more preferably 16 g / 10 minutes, and even more preferably 15 g / 10 minutes. If it is in the said range, extending | stretching may become easy, thickness unevenness may become small, or it may become easy to raise an extending | stretching temperature or a heat setting temperature, and a thermal shrinkage rate may fall further.
(聚丙烯系樹脂之分子量) (Molecular weight of polypropylene resin)
構成膜之聚丙烯系樹脂之藉由GPC(Gel Permeation Chromatography;凝膠滲透層析)所測定的數量平均分子量(Mn)之下限較佳為20000,更佳為22000,又更佳為24000,尤佳為26000,最佳為27000。若為上述範圍則有時產生以下優點:延伸變容易,厚度不均變小,容易提高延伸溫度或熱固定溫度而熱收縮率降低。Mn之上限較佳為200000,更佳為170000,又更佳為160000,尤佳為150000。若為上述範圍,則有時容易獲得作為聚丙烯系樹脂之低分 子量物之功效的聚丙烯膜基材之高溫時之低熱收縮率等本案之功效,或延伸變容易。 The lower limit of the number average molecular weight (Mn) measured by GPC (Gel Permeation Chromatography) of the polypropylene resin constituting the film is preferably 20,000, more preferably 22,000, and even more preferably 24,000, especially The best is 26000, and the best is 27000. If it is in the said range, there exists a merit that it becomes easy to extend | stretch, thickness unevenness becomes small, and it is easy to raise elongation temperature or heat-fixing temperature, and a heat shrinkage rate will fall. The upper limit of Mn is preferably 200,000, more preferably 170,000, still more preferably 160,000, and even more preferably 150,000. If it is the said range, the effect of this case, such as a low thermal shrinkage rate at high temperature, of a polypropylene film base material which is a low molecular weight substance of a polypropylene resin may become easy to obtain, or extension may become easy.
構成膜之聚丙烯系樹脂之藉由GPC所測定之質量平均分子量(Mw)之下限較佳為180000,更佳為200000,又更佳為230000,進一步更佳為240000,尤佳為250000,最佳為270000。若為上述範圍則有時產生以下優點:延伸變容易,厚度不均變小,容易提高延伸溫度或熱固定溫度而熱收縮率降低。Mw之上限較佳為500000,更佳為450000,又更佳為420000,尤佳為410000,最佳為400000。若為上述範圍則有時機械負荷小,擠出或延伸變容易。 The lower limit of the mass average molecular weight (Mw) measured by GPC of the polypropylene resin constituting the film is preferably 180,000, more preferably 200,000, still more preferably 230,000, even more preferably 240,000, and even more preferably 250,000. It is 270,000. If it is in the said range, there exists a merit that it becomes easy to extend | stretch, thickness unevenness becomes small, and it is easy to raise elongation temperature or heat-fixing temperature, and a heat shrinkage rate will fall. The upper limit of Mw is preferably 500,000, more preferably 450,000, still more preferably 420,000, particularly preferably 410,000, and most preferably 400,000. If it is the said range, a mechanical load may become small and extrusion or extension may become easy.
(聚丙烯系樹脂之分子量分佈) (Molecular weight distribution of polypropylene resin)
本發明中所用之聚丙烯系樹脂較佳為具有以下所示般之特徵。亦即,於對構成膜之聚丙烯系樹脂之凝膠滲透層析(GPC)累計曲線進行測定之情形時,分子量10萬以下之成分之量之下限較佳為35質量%,更佳為38質量%,又更佳為40質量%,尤佳為41質量%,最佳為42質量%。若為上述範圍,則有時容易獲得作為低分子量物之功效的高溫時之低熱收縮率等本案之功效,或延伸變容易。GPC累計曲線中之分子量10萬以下之成分之量之上限較佳為65質量%,更佳為60質量%,又更佳為58質量%,尤佳為56質量%,最佳為55質量%。若為上述範圍則有時延伸變容易,或厚度不均變小,或容易提高延伸溫度或熱固定溫度而熱收縮率降低。 The polypropylene-based resin used in the present invention preferably has the following characteristics. That is, when measuring the gel permeation chromatography (GPC) cumulative curve of the polypropylene resin constituting the film, the lower limit of the amount of the component having a molecular weight of 100,000 or less is preferably 35% by mass, and more preferably 38%. Mass%, more preferably 40% by mass, particularly preferably 41% by mass, and most preferably 42% by mass. If it is the said range, the effect of this case, such as a low thermal shrinkage rate at the time of high temperature which is the effect of a low molecular weight substance, may become easy to obtain, or it may become easy to extend. The upper limit of the amount of components with a molecular weight of 100,000 or less in the GPC cumulative curve is preferably 65% by mass, more preferably 60% by mass, still more preferably 58% by mass, particularly preferably 56% by mass, and most preferably 55% by mass . If it exists in the said range, extending | stretching may become easy, thickness unevenness may become small, or it may become easy to raise extending | stretching temperature or heat-fixing temperature, and thermal contraction rate may fall.
對於本發明中所用之聚丙烯系樹脂而言,作為分子量分佈之廣度之指標的質量平均分子量(Mw)/數量平均分子量(Mn)之下限較佳為4,更佳為4.5,又更佳為5,尤佳 為5.5,最佳為6。Mw/Mn之上限較佳為30,更佳為25,又更佳為22,尤佳為21,最佳為20。若Mw/Mn為上述範圍,則現實性之製造容易。 For the polypropylene resin used in the present invention, the lower limit of the mass average molecular weight (Mw) / number average molecular weight (Mn) as an index of the breadth of the molecular weight distribution is preferably 4, more preferably 4.5, and even more preferably 5, particularly preferably 5.5, and most preferably 6. The upper limit of Mw / Mn is preferably 30, more preferably 25, still more preferably 22, particularly preferably 21, and most preferably 20. When Mw / Mn is in the above range, practical production is easy.
再者,聚丙烯之分子量分佈可藉由以下方式調整:以多階段利用一系列設備將不同分子量之成分聚合;或以離線方式利用混練機將不同分子量之成分摻合;或摻合具有不同性能之觸媒進行聚合;或使用可實現所需分子量分佈之觸媒。 Moreover, the molecular weight distribution of polypropylene can be adjusted by: using a series of equipment to polymerize components of different molecular weights in multiple stages; or blending components of different molecular weights by using a kneader in an offline manner; or blending with different properties Polymerization of catalyst; or use of catalyst that can achieve the desired molecular weight distribution.
(聚丙烯系樹脂之製造方法) (Manufacturing method of polypropylene resin)
聚丙烯系樹脂可藉由使用齊格勒-納塔觸媒(Ziegler-Natta catalyst)或茂金屬觸媒等公知之觸媒使成為原料之丙烯聚合而獲得。其中,為了消除異質鍵,齊格勒-納塔觸媒中較佳為使用可進行立體規則性高之聚合的觸媒。 The polypropylene resin can be obtained by polymerizing propylene as a raw material using a known catalyst such as a Ziegler-Natta catalyst or a metallocene catalyst. Among them, in order to eliminate heterogeneous bonds, it is preferable to use a catalyst capable of polymerizing with high stereoregularity among Ziegler-Natta catalysts.
作為丙烯之聚合方法,只要採用公知之方法即可,例如可列舉:於己烷、庚烷、甲苯、二甲苯等非活性溶劑中進行聚合之方法;於液狀之單體中進行聚合之方法;於氣體之單體中添加觸媒,以氣相狀態進行聚合之方法;或將該等方法組合而進行聚合之方法等。 As the polymerization method of propylene, any known method may be adopted, and examples thereof include a method of polymerization in an inactive solvent such as hexane, heptane, toluene, xylene, and the like; and a method of polymerization in a liquid monomer. ; A method of adding a catalyst to a monomer of a gas to perform polymerization in a gas phase state; or a method of combining these methods to perform polymerization.
(添加劑) (Additive)
本發明中所用之聚丙烯膜基材中,視需要亦可添加添加劑或其他樹脂。作為添加劑,例如可列舉抗氧化劑、紫外線吸收劑、抗靜電劑、潤滑劑、成核劑、黏著劑、防霧劑、阻燃劑、抗黏連劑、無機或有機之填充劑等。作為其他樹脂,可列舉本發明中所用之聚丙烯系樹脂以外之聚丙烯系樹脂、作為丙烯與乙烯及/或碳數4以上之α-烯烴之共聚物的無規共聚物、或各種彈性體等。該些成分只要使用多段之反應器逐次聚合,或利用亨舍爾混合機與聚 丙烯系樹脂摻合,或利用聚丙烯將預先使用熔融混練機所製作之母顆粒以成為預定濃度之方式稀釋,或預先將所有量熔融混練而使用等即可。 To the polypropylene film substrate used in the present invention, additives or other resins may be added as needed. Examples of the additives include antioxidants, ultraviolet absorbers, antistatic agents, lubricants, nucleating agents, adhesives, antifog agents, flame retardants, antiblocking agents, and inorganic or organic fillers. Examples of other resins include polypropylene resins other than the polypropylene resin used in the present invention, random copolymers as copolymers of propylene and ethylene and / or α-olefins having 4 or more carbon atoms, or various elastomers. Wait. These components can be polymerized successively using a multi-stage reactor, or blended with a polypropylene resin using a Henschel mixer, or the mother particles prepared by using a melt kneader in advance can be diluted with polypropylene to a predetermined concentration. Alternatively, the entire amount may be melt-kneaded before use.
(延伸聚丙烯膜之製造方法) (Manufacturing method of stretched polypropylene film)
作為用於本發明之基材的聚丙烯膜,可為縱方向(長邊方向)或橫方向(寬度方向)之單軸延伸膜,較佳為雙軸延伸膜。於雙軸延伸之情形時,可為逐次雙軸延伸亦可為同時雙軸延伸。 The polypropylene film used as the substrate of the present invention may be a uniaxially stretched film in a longitudinal direction (long side direction) or a transverse direction (width direction), and preferably a biaxially stretched film. In the case of biaxial extension, it may be sequential biaxial extension or simultaneous biaxial extension.
以下對作為最佳例之縱方向延伸-橫方向延伸之逐次雙軸延伸膜之製造方法進行說明。 Hereinafter, as a best example, a method for manufacturing a sequential biaxially stretched film that is stretched in the longitudinal direction to the transverse direction will be described.
首先,利用單軸或雙軸之擠出機使聚丙烯系樹脂加熱熔融,擠出至冷卻輥上而獲得未延伸片材。作為熔融擠出條件,以樹脂溫度成為200℃至280℃之方式自T型模頭中以片材狀擠出,利用10℃至100℃之溫度之冷卻輥進行冷卻固化。繼而,利用120℃至165℃之延伸輥將膜沿長度(縱)方向延伸至3倍至8倍、較佳為3倍至7倍,繼而沿橫方向以155℃至175℃、較佳為158℃至170℃之溫度進行4倍至20倍、較佳為6倍至12倍之延伸。繼而,一邊以165℃至175℃、較佳為166℃至173℃之氛圍溫度進行1%至15%之鬆弛一邊實施熱處理。對於如此而獲得之聚丙烯膜,視需要至少於單面實施電暈放電處理後,以捲取機捲取,藉此可獲得捲樣本。 First, a polypropylene resin is heated and melted by a uniaxial or biaxial extruder, and extruded onto a cooling roll to obtain an unstretched sheet. As the conditions for melt extrusion, the resin was extruded from a T-die in the form of a sheet so that the resin temperature became 200 ° C to 280 ° C, and was cooled and solidified using a cooling roll at a temperature of 10 ° C to 100 ° C. Then, the film is stretched in the length (longitudinal) direction by 3 to 8 times, preferably 3 to 7 times, using a stretching roller at 120 ° C to 165 ° C, and then 155 ° C to 175 ° C, preferably The temperature of 158 ° C to 170 ° C is extended from 4 to 20 times, preferably from 6 to 12 times. Next, heat treatment is performed while relaxing at a temperature of 1% to 15% at an ambient temperature of 165 ° C to 175 ° C, preferably 166 ° C to 173 ° C. The polypropylene film thus obtained can be rolled up by a winder after being subjected to a corona discharge treatment at least on one side as required, thereby obtaining a roll sample.
縱方向之延伸倍率之下限較佳為3倍,更佳為3.5倍。若縱方向之延伸倍率小於上述值,則有時膜厚變得不均。縱方向之延伸倍率之上限較佳為8倍,更佳為7倍。若縱方向之延伸倍率超過上述值,則有時隨後進行之橫方 向延伸變困難。 The lower limit of the stretch magnification in the longitudinal direction is preferably 3 times, and more preferably 3.5 times. When the stretching ratio in the longitudinal direction is smaller than the above value, the film thickness may become uneven. The upper limit of the stretching ratio in the longitudinal direction is preferably 8 times, more preferably 7 times. If the stretching ratio in the longitudinal direction exceeds the above-mentioned value, the subsequent lateral stretching may become difficult in some cases.
縱方向之延伸溫度之下限較佳為120℃,更佳為125℃,又更佳為130℃。若縱方向之延伸溫度小於上述值,則有時機械負荷變大,或厚度不均變大,或引起膜之表面粗糙。縱方向之延伸溫度之上限較佳為165℃,更佳為160℃,又更佳為155℃,尤佳為150℃。延伸溫度高之情況下對於降低熱收縮率而言較佳,但有時附著於輥而無法延伸,或引起表面粗糙。 The lower limit of the elongation temperature in the longitudinal direction is preferably 120 ° C, more preferably 125 ° C, and still more preferably 130 ° C. If the stretching temperature in the longitudinal direction is less than the above-mentioned value, the mechanical load may increase, the thickness unevenness may increase, or the surface of the film may be roughened. The upper limit of the elongation temperature in the longitudinal direction is preferably 165 ° C, more preferably 160 ° C, still more preferably 155 ° C, and even more preferably 150 ° C. When the elongation temperature is high, it is preferable to reduce the heat shrinkage rate. However, it may adhere to the roll and fail to extend, or cause rough surface.
橫方向之延伸倍率之下限較佳為4倍,更佳為5倍,又更佳為6倍。若橫方向之延伸倍率小於上述值,則有時厚度變得不均。橫方向延伸倍率之上限較佳為20倍,更佳為17倍,又更佳為15倍,尤佳為12倍。若橫方向之延伸倍率超過上述值,則有時熱收縮率變高,或於延伸時斷裂。 The lower limit of the transverse magnification is preferably 4 times, more preferably 5 times, and even more preferably 6 times. If the stretching ratio in the horizontal direction is smaller than the above value, the thickness may become uneven. The upper limit of the lateral magnification is preferably 20 times, more preferably 17 times, still more preferably 15 times, and even more preferably 12 times. If the stretching ratio in the horizontal direction exceeds the above value, the thermal shrinkage ratio may increase or the film may break during stretching.
關於橫方向延伸中之預熱溫度,為了將膜溫度迅速提高至延伸溫度附近,較佳為設定為較延伸溫度高5℃至15℃。 Regarding the preheating temperature in the transverse direction stretching, in order to rapidly increase the film temperature to around the stretching temperature, it is preferably set to be 5 ° C to 15 ° C higher than the stretching temperature.
橫方向延伸較佳為以較以往之延伸聚丙烯膜高3℃至5℃之溫度而進行。TD(Transverse Direction;橫方向)之延伸溫度之下限較佳為155℃,更佳為157℃,又更佳為158℃。若橫方向之延伸溫度小於上述值,則有時未充分軟化而斷裂,或熱收縮率變高。橫方向延伸溫度之上限較佳為175℃,更佳為170℃,又更佳為168℃。為了降低熱收縮率,橫方向延伸溫度以高為佳,但若超過上述值,則有時不僅低分子量成分熔解、再結晶化而配向降低,而且表面粗糙或膜白化。 The stretching in the lateral direction is preferably performed at a temperature of 3 ° C to 5 ° C higher than that of a conventional stretched polypropylene film. The lower limit of the extension temperature of TD (Transverse Direction) is preferably 155 ° C, more preferably 157 ° C, and even more preferably 158 ° C. If the elongation temperature in the lateral direction is less than the above-mentioned value, it may not be sufficiently softened and fractured, or the thermal shrinkage rate may be increased. The upper limit of the lateral extension temperature is preferably 175 ° C, more preferably 170 ° C, and even more preferably 168 ° C. In order to reduce the thermal shrinkage rate, the elongation temperature in the lateral direction is preferably high. However, if the value exceeds the above value, not only the low-molecular-weight component may be melted and recrystallized to reduce the orientation, but also the surface may be roughened or the film may be whitened.
延伸後之膜通常係進行熱固定。本發明中,能以較以往之延伸聚丙烯膜高3℃至10℃之溫度進行熱固定。熱固定溫度之下限較佳為165℃,更佳為166℃。若熱固定溫度小於上述值,則有時熱收縮率變高。另外,有時為了降低熱收縮率而需要長時間之處理,生產性差。熱固定溫度之上限較佳為175℃,更佳為173℃。若熱固定溫度超過上述值,則有時低分子量成分熔解、再結晶化而表面粗糙或膜白化。 The stretched film is usually heat fixed. In the present invention, heat fixing can be performed at a temperature of 3 ° C to 10 ° C higher than that of the conventional stretched polypropylene film. The lower limit of the heat-fixing temperature is preferably 165 ° C, and more preferably 166 ° C. When the heat-fixing temperature is lower than the above-mentioned value, the thermal shrinkage rate may increase. In addition, in order to reduce the heat shrinkage rate, a long-term treatment is required, and productivity is poor. The upper limit of the heat-fixing temperature is preferably 175 ° C, and more preferably 173 ° C. When the heat-fixing temperature exceeds the above-mentioned value, the low-molecular-weight component may be melted and recrystallized to cause rough surface or whitening of the film.
較佳為於熱固定時進行鬆弛(弛豫)。鬆弛之下限較佳為1%,更佳為2%,又更佳為3%。若為小於上述值之鬆弛,則有時熱收縮率變高。鬆弛之上限較佳為10%,更佳為8%。若為超過上述值之鬆弛,則有時厚度不均變大。 It is preferable to perform relaxation (relaxation) during heat fixing. The lower relaxation limit is preferably 1%, more preferably 2%, and even more preferably 3%. If the slack is less than the above value, the thermal shrinkage rate may increase. The upper limit of the slack is preferably 10%, more preferably 8%. If the slack exceeds the above value, thickness unevenness may increase.
再者,為了降低熱收縮率,亦可將藉由上述步驟所製造之膜暫且捲取成捲狀後,以離線方式進行退火。離線退火溫度之下限較佳為160℃,更佳為162℃,又更佳為163℃。若離線退火溫度小於上述值,則有時無法獲得退火之功效。離線退火溫度之上限較佳為175℃,更佳為174℃,又更佳為173℃。若離線退火溫度超過上述值,則有時透明性降低,或厚度不均變大。 In addition, in order to reduce the thermal shrinkage, the film manufactured by the above steps may be temporarily rolled into a roll shape, and then annealed in an offline manner. The lower limit of the off-line annealing temperature is preferably 160 ° C, more preferably 162 ° C, and even more preferably 163 ° C. If the off-line annealing temperature is lower than the above value, the effect of annealing may sometimes not be obtained. The upper limit of the offline annealing temperature is preferably 175 ° C, more preferably 174 ° C, and even more preferably 173 ° C. When the off-line annealing temperature exceeds the above-mentioned value, transparency may decrease or thickness unevenness may increase.
離線退火時間之下限較佳為0.1分鐘,更佳為0.5分鐘,又更佳為1分鐘。若離線退火時間小於上述值,則有時無法獲得退火之功效。離線退火時間之上限較佳為30分鐘,更佳為25分鐘,又更佳為20分鐘。若離線退火時間超過上述值,則有時生產性降低。 The lower limit of the offline annealing time is preferably 0.1 minutes, more preferably 0.5 minutes, and even more preferably 1 minute. If the off-line annealing time is shorter than the above value, sometimes the effect of annealing cannot be obtained. The upper limit of the offline annealing time is preferably 30 minutes, more preferably 25 minutes, and even more preferably 20 minutes. If the off-line annealing time exceeds the above value, productivity may be reduced.
再者,150℃熱收縮率若不低於1.5%左右,則例如可藉由增加低分子量成分,調整延伸條件或熱固定條件而實 現,但為了降低至1.5%以下,較佳為以離線方式實施退火處理等。 In addition, if the thermal shrinkage rate at 150 ° C is not less than about 1.5%, it can be achieved by, for example, adding a low molecular weight component and adjusting the elongation conditions or heat-fixing conditions. However, in order to reduce the temperature to 1.5% or less, an offline method is preferred. An annealing process is performed.
例如於延伸溫度、熱固定溫度過高之情形時、於冷卻輥(CR)溫度高而延伸捲筒片材之冷卻速度慢之情形時以及於低分子量過多之情形時,霧度有變差之傾向,故可藉由調節該等因素而控制於前述範圍內。 For example, when the elongation temperature and heat fixing temperature are too high, when the cooling roll (CR) temperature is high and the cooling speed of the stretched roll sheet is slow, and when the low molecular weight is too high, the haze may be deteriorated. Tendency, it can be controlled within the aforementioned range by adjusting these factors.
如此而獲得之延伸聚丙烯膜通常係以寬度2000mm至12000mm、長度1000m至50000m左右而製膜,並捲取成捲狀。再者,根據各用途而切割,以寬度300mm至2000mm、長度500m至5000m左右之小捲(slit roll)之形式而提供。 The stretched polypropylene film thus obtained is generally formed into a film with a width of 2000 mm to 12000 mm and a length of about 1000 m to 50,000 m, and is wound into a roll shape. In addition, it is cut according to each use, and it is provided in the form of a slit roll with a width of 300 mm to 2000 mm and a length of about 500 m to 5000 m.
(無機薄膜層之製作方法) (Manufacturing method of inorganic thin film layer)
於製作無機薄膜層時,可適宜使用真空蒸鍍法、濺鍍法、離子鍍法等PVD(Physical Vapor Deposition;物理氣相沈積)法(物理蒸鍍法)或CVD(Chemical Vapor Deposition;化學氣相沈積)法(化學蒸鍍法)等公知之製法,較佳為物理蒸鍍法,更佳為真空蒸鍍法。例如於真空蒸鍍法中,可使用Al2O3與SiO2之混合物或Al與SiO2之混合物等作為蒸鍍源材料;作為加熱方式,可使用電阻加熱、高頻感應加熱、電子束加熱等。另外,亦可使用反應性蒸鍍,該反應性蒸鍍導入氧、氮、水蒸氣等作為反應性氣體,或使用臭氧添加、離子輔助等方法。另外,只要不損及本發明之目的,則亦可藉由對膜基材施加偏壓等,或者提高或降低膜基材之溫度等,而變更製作條件。濺鍍法或CVD法等以外之製作法亦相同。 When producing an inorganic thin film layer, a PVD (Physical Vapor Deposition) method such as a vacuum vapor deposition method, a sputtering method, or an ion plating method (a physical vapor deposition method) or a CVD (Chemical Vapor Deposition; chemical gas) can be suitably used. A well-known production method such as a phase deposition) method (chemical vapor deposition method) is preferably a physical vapor deposition method, and more preferably a vacuum vapor deposition method. For example, in the vacuum evaporation method, a mixture of Al 2 O 3 and SiO 2 or a mixture of Al and SiO 2 can be used as a vapor deposition source material. As a heating method, resistance heating, high-frequency induction heating, and electron beam heating can be used. Wait. In addition, reactive vapor deposition may be used, in which oxygen, nitrogen, water vapor, or the like is introduced as a reactive gas, or methods such as ozone addition and ion assist are used. In addition, as long as the object of the present invention is not impaired, the production conditions may be changed by applying a bias voltage or the like to the film base material, or raising or lowering the temperature of the film base material or the like. The manufacturing methods other than the sputtering method and the CVD method are also the same.
此時,亦可於聚丙烯膜基材與無機薄膜層之間設置被覆層,或於無機薄膜層之上設置被覆層。 At this time, a coating layer may be provided between the polypropylene film substrate and the inorganic thin film layer, or a coating layer may be provided on the inorganic thin film layer.
[用途] [Use]
本發明之積層聚丙烯膜具有如上所述之以往不存在之優異特性。 The laminated polypropylene film of the present invention has excellent characteristics which have not existed in the past as described above.
於用作包裝膜之情形時,因氣體阻隔性優異,故而可用作塗佈有聚偏二氯乙烯之聚丙烯膜之代替品,不僅如此,因剛性更高故而可實現薄型化,可進一步實現成本降低、輕量化。 When it is used as a packaging film, it can be used as a substitute for a polypropylene film coated with polyvinylidene chloride because of its excellent gas barrier properties. Not only that, it can be made thinner due to higher rigidity. Achieve cost reduction and weight reduction.
另外,本發明之積層聚丙烯膜由於耐熱性高,故而於塗佈或印刷時可進行高溫之處理,可實現生產之效率化或使用以往難以利用之塗佈劑或墨料、層壓接著劑等。 In addition, since the laminated polypropylene film of the present invention has high heat resistance, it can be subjected to high-temperature processing during coating or printing, which can realize production efficiency or use coating agents, inks, and laminating adhesives that have been difficult to use in the past. Wait.
再者,本發明之積層聚丙烯膜不限定於包裝用,亦可用作電容器或馬達等之絕緣膜、太陽電池之背板之基質膜。 Furthermore, the laminated polypropylene film of the present invention is not limited to packaging, and can also be used as an insulating film for capacitors or motors, or as a substrate film for a back sheet of a solar cell.
(層壓積層體之製作方法) (Manufacturing method of laminated laminate)
可使用在本發明之積層聚丙烯膜上設置具有熱密封性之聚烯烴系樹脂層而成的積層體,製造飲食品、醫藥品、洗劑、香波、油、牙膏、接著劑、黏著劑等化學品或化妝品、其他各種物品之填充包裝適性、保存適性等優異之包裝容器。 A laminated body obtained by providing a polyolefin resin layer having heat-sealability on the laminated polypropylene film of the present invention can be used to produce food and beverage, medicine, lotion, shampoo, oil, toothpaste, adhesive, adhesive, etc Packing containers with excellent filling suitability and storage suitability for chemicals, cosmetics, and various other items.
作為具有熱密封性之聚烯烴系樹脂層,可使用可藉由熱而熔融並相互熔接之樹脂之膜或片材,具體而言,例如可使用:低密度聚乙烯、中密度聚乙烯、高密度聚乙烯、直鏈狀(線狀)低密度聚乙烯、聚丙烯、乙烯-乙酸乙烯酯共聚物、離子聚合物樹脂、乙烯-丙烯酸共聚物、乙烯-丙烯酸乙酯共聚物、乙烯-甲基丙烯酸共聚物、乙烯-甲基丙烯酸甲酯共聚物、乙烯-丙烯共聚物、甲基戊烯聚合物、聚丁烯聚合物,聚乙烯或聚丙烯等聚烯烴系樹脂經丙 烯酸、甲基丙烯酸、馬來酸、馬來酸酐、富馬酸、衣康等不飽和羧酸改性而成之酸改性聚烯烴樹脂,聚乙酸乙烯酯系樹脂、聚(甲基)丙烯酸系樹脂、聚氯乙烯系樹脂、其他各種樹脂之膜或片材。具代表性的是由直鏈狀(線狀)低密度聚乙烯或聚丙烯所構成之膜或片材。 As the polyolefin-based resin layer having heat-sealing properties, a film or sheet of a resin that can be melted and welded to each other by heat can be used. Specifically, for example, low-density polyethylene, medium-density polyethylene, and high-density Density polyethylene, linear (linear) low density polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ionic polymer resin, ethylene-acrylic acid copolymer, ethylene-ethyl acrylate copolymer, ethylene-methyl Acrylic copolymers, ethylene-methyl methacrylate copolymers, ethylene-propylene copolymers, methylpentene polymers, polybutene polymers, polyolefin resins such as polyethylene or polypropylene are treated with acrylic acid, methacrylic acid, Acid-modified polyolefin resin modified with unsaturated carboxylic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic, polyvinyl acetate resin, poly (meth) acrylic resin, polyvinyl chloride Film or sheet of resin. A typical film or sheet is a linear (linear) low-density polyethylene or polypropylene.
層壓積層體中之於溫度23℃、相對濕度65%下之氧透過度之上限較佳為50mL/m2/day/MPa,更佳為30mL/m2/day/MPa,又更佳為20mL/m2/day/MPa,尤佳為15mL/m2/day/MPa。若氧透過度之上限為50mL/m2/day/MPa,則因氧而劣化之物質或食品之保存性優異。於溫度23℃、濕度65%下之積層聚丙烯膜之氧透過度之下限並無特別限定,較佳為0.1mL/m2/day/MPa。另外,就製造上之觀點而言,可認為0.1mL/m2/day/MPa係下限。 The upper limit of the oxygen permeability in the laminated laminate at a temperature of 23 ° C. and a relative humidity of 65% is preferably 50 mL / m 2 / day / MPa, more preferably 30 mL / m 2 / day / MPa, and even more preferably 20 mL / m 2 / day / MPa, particularly preferably 15 mL / m 2 / day / MPa. When the upper limit of the oxygen permeability is 50 mL / m 2 / day / MPa, a substance or food degraded by oxygen is excellent in storage stability. The lower limit of the oxygen permeability of the laminated polypropylene film at a temperature of 23 ° C. and a humidity of 65% is not particularly limited, but is preferably 0.1 mL / m 2 / day / MPa. In addition, from the viewpoint of manufacturing, 0.1 mL / m 2 / day / MPa is considered to be the lower limit.
層壓積層體之縱方向之層壓強度之下限較佳為1.1N/15mm,更佳為1.2N/15mm,又更佳為1.1N/15mm。若縱方向之層壓強度之下限為1.1N/15mm,則包裝容器之強度優異。縱方向之層壓強度之上限並無特別限定,較佳為3.0N/15mm。另外,就製造上之觀點而言,可認為3.0N/15mm係上限。 The lower limit of the lamination strength in the longitudinal direction of the laminated laminate is preferably 1.1 N / 15 mm, more preferably 1.2 N / 15 mm, and still more preferably 1.1 N / 15 mm. When the lower limit of the lamination strength in the longitudinal direction is 1.1 N / 15 mm, the strength of the packaging container is excellent. The upper limit of the lamination strength in the longitudinal direction is not particularly limited, but is preferably 3.0 N / 15 mm. In terms of manufacturing, 3.0 N / 15 mm is considered to be the upper limit.
[實施例] [Example]
以下,根據實施例對本發明加以詳細說明,但本發明不限定於該實施例。實施例中之物性之測定方法如下。 Hereinafter, the present invention will be described in detail based on examples, but the present invention is not limited to the examples. The measurement method of the physical property in an Example is as follows.
(1)(立體規則性) (1) (stereoregularity)
內消旋五元組分率([mmmm]%)及內消旋平均鏈長之測定係使用13C-NMR如下述般進行。 The measurement of the meso pentad fraction ([mmmm]%) and the meso average chain length were performed using 13 C-NMR as follows.
內消旋五元組分率係依照「Zambelli等人之《巨分子(Macromolecules)》,第6卷,925頁(1973)」所記載之方法而算出。 The meso pentad fraction was calculated according to the method described in "Macromolecules" by Zambelli et al., Vol. 6, p. 925 (1973).
內消旋平均鏈長係依據「J.C.Randall之《聚合物序列分佈(Polymer Sequence Distribution)》第2章(1977年)(Academic Press,New York)」所記載之方法而算出。 The meso average chain length was calculated according to the method described in "Polymer Sequence Distribution", Chapter 2 (1977) (Academic Press, New York) by J.C. Randall.
13C-NMR測定係使用BRUKER公司製造之「AVANCE500」,於135℃將試樣200mg溶解於鄰二氯苯與氘代苯之8:2(體積比)之混合液中,於110℃進行。 The 13 C-NMR measurement was performed using "AVANCE500" manufactured by BRUKER, and 200 mg of a sample was dissolved in a mixed solution of o: dichlorobenzene and deuterated benzene at a ratio of 8: 2 (volume ratio) at 135 ° C and performed at 110 ° C.
(2)二甲苯可溶成分(單位:質量%) (2) Xylene soluble content (unit: mass%)
將聚丙烯試樣1g溶解於沸騰二甲苯200ml中並放置冷卻後,利用20℃之恆溫水槽再結晶1小時,將溶解於濾液中之質量相對於原試樣量之比例作為二甲苯可溶成分(質量%)。 1 g of polypropylene sample was dissolved in 200 ml of boiling xylene and left to cool, and then recrystallized in a constant temperature water tank at 20 ° C for 1 hour. The ratio of the mass dissolved in the filtrate to the original sample amount was taken as the xylene soluble component. (quality%).
(3)熔體流動速率(MFR,單位:g/10分鐘) (3) Melt flow rate (MFR, unit: g / 10 minutes)
MFR係依據JIS(Japanese Industrial Standards;日本工業標準)K7210-1:2014以溫度230℃、荷重2.16kgf進行測定。 MFR is measured according to JIS (Japanese Industrial Standards) K7210-1: 2014 at a temperature of 230 ° C and a load of 2.16 kgf.
(4)分子量及分子量分佈 (4) Molecular weight and molecular weight distribution
分子量及分子量分佈係使用凝膠滲透層析(GPC)藉由單分散聚苯乙烯基準而求出。GPC測定中之使用管柱、溶媒等測定條件如下。 The molecular weight and molecular weight distribution were determined based on monodisperse polystyrene standards using gel permeation chromatography (GPC). The measurement conditions such as column and solvent used in GPC measurement are as follows.
溶媒:1,2,4-三氯苯。 Vehicle: 1,2,4-trichlorobenzene.
管柱:TSKgel GMHHR-H(20)HT×3。 Column: TSKgel GMHHR-H (20) HT × 3.
流量:1.0ml/min。 Flow: 1.0ml / min.
檢測器:RI(Refractive Index;折射率)檢測器。 Detector: RI (Refractive Index) detector.
測定溫度:140℃。 Measurement temperature: 140 ° C.
數量平均分子量(Mn)、質量平均分子量(Mw)、Z+1平均分子量(Mz+1)分別係根據經由分子量校準曲線所得之GPC曲線的各溶出位置之分子量(Mi)之分子數(Ni)由下式所定義。 The number average molecular weight (Mn), the mass average molecular weight (Mw), and the Z + 1 average molecular weight (Mz + 1) are the number of molecules (Ni) of the molecular weight (Mi) at each dissolution position of the GPC curve obtained from the molecular weight calibration curve, respectively. It is defined by the following formula.
數量平均分子量:Mn=Σ(Ni.Mi)/Σ Ni。 Number average molecular weight: Mn = Σ (Ni.Mi) / Σ Ni.
質量平均分子量:Mw=Σ(Ni.Mi2)/Σ(Ni.Mi)。 Mass average molecular weight: Mw = Σ (Ni.Mi 2 ) / Σ (Ni.Mi).
Z+1平均分子量:Mz+1=Σ(Ni.Mi4)/Σ(Ni.Mi3)。 Z + 1 average molecular weight: Mz + 1 = Σ (Ni.Mi 4 ) / Σ (Ni.Mi 3 ).
分子量分佈:Mw/Mn。 Molecular weight distribution: Mw / Mn.
另外,將GPC曲線的波峰位置的分子量作為Mp。 The molecular weight at the peak position of the GPC curve is defined as Mp.
於基線不明確時,於最接近標準物質之溶出波峰的高分子量側之溶出波峰的高分子量側至下擺最低位置為止的範圍內設定基線。 When the baseline is not clear, the baseline is set within the range from the high molecular weight side of the dissolution peak closest to the high molecular weight side of the dissolution peak of the standard substance to the lowest position of the hem.
(5)廣角X射線折射 (5) Wide-angle X-ray refraction
於本發明之實施例中,於大型放射光設施SPring-8中,於先進材料開發產學財團(FSBL)所擁有的Beam Line BL03XU的第二艙(hatch)中,以X射線源方向與膜面所成的角成為垂直的方式設置測定膜,進行WAXS(Wide-Angle X-ray Scattering;廣角X射線散射)測定。將測定條件示於以下。 In the embodiment of the present invention, in the large radiation light facility SPring-8, in the second hatch of the Beam Line BL03XU owned by the Advanced Materials Development Industry-University Consortium (FSBL), the X-ray source direction and the film are used. The measurement film was set so that the angle formed by the surface became perpendicular, and WAXS (Wide-Angle X-ray Scattering) measurement was performed. The measurement conditions are shown below.
X射線波長係設為0.1nm,檢測器係使用成影像板(imaging plate)(RIGAKU RAXIS VII)或帶有影像增強器(Image Intensifier)之CCD(Charge-Coupled Device;電荷耦合元件)相機(Hamamatsu Photonics V7739P+ORCA R2),根據設置於試樣前後之離子腔(ion chamber)之值而算出透過率。對所得之二維像進行考慮到暗電流(暗雜訊)及透過率之空氣散射修正。於測定拍攝長度時使用氧化鈰(CeO2), 使用Fit2D(European Synchrotron Radiation Facility製造之軟體[http://www.esrf.eu/computing/scientific/FIT2D/])算出(110)面之方位角分佈。 The X-ray wavelength is set to 0.1 nm, and the detector is an imaging plate (RIGAKU RAXIS VII) or a CCD (Charge-Coupled Device; Charge Coupled Device) camera (Hamamatsu) with an image intensifier. Photonics V7739P + ORCA R2) calculates transmittance based on the values of ion chambers placed before and after the sample. The obtained two-dimensional image was corrected for air scattering in consideration of dark current (dark noise) and transmittance. When measuring the shooting length, cerium oxide (CeO 2 ) was used, and Fit2D (software made by European Synchrotron Radiation Facility [http://www.esrf.eu/computing/scientific/FIT2D/]) was used to calculate the azimuth of the (110) plane. distributed.
(6)由小角X射線散射法所得之長週期尺寸 (6) Long period size obtained by small angle X-ray scattering method
於大型放射光設施SPring-8中,於先進材料開發產學財團(FSBL)所擁有之Beam Line BL03XU之第二艙中,以膜之縱方向為上下、橫方向為左右,以X射線源方向與膜面所成之角成為垂直之方式設置測定膜,進行小角X射線(SAXS)測定。將測定條件示於以下。 In the large-scale radiation facility SPring-8, in the second compartment of the Beam Line BL03XU owned by the Advanced Materials Development Industry-University Consortium (FSBL), the longitudinal direction of the film is up and down, the lateral direction is left and right, and the X-ray source direction The measurement film is installed so that the angle formed by the film surface becomes perpendicular to the small angle X-ray (SAXS) measurement. The measurement conditions are shown below.
X射線波長係設為0.2nm,拍攝長度為約7.7m,使用成影像板(RIGAKU R-AXIS VII)作為檢測器而獲得散射向量q之0.01至0.5(nm-1)之範圍之散射像。此處,於將θ設為散射角2 θ之一半、π設為圓周率、λ設為X射線之波長時,散射向量q係藉由式q=4 π sin θ/λ而算出。與WAXS測定同樣地對所得之散射像進行考慮到暗電流(暗雜訊)及透過率之空氣散射修正,為了測定準確之拍攝長度而使用另經山崳酸銀校正之膠原。使用前述Fit2d軟體算出試樣之寬度方向之分佈,橫軸取散射向量q(nm-1),縱軸取強度I(q)之常用對數而繪圖。此處,分佈之算出範圍係自寬度方向起設為±5度。 The X-ray wavelength was set to 0.2 nm, the imaging length was about 7.7 m, and a scattered image in the range of 0.01 to 0.5 (nm-1) of the scattering vector q was obtained using an imaging plate (RIGAKU R-AXIS VII) as a detector. Here, when θ is set to half of the scattering angle 2 θ, π is set to the circumference ratio, and λ is set to the wavelength of X-ray, the scattering vector q is calculated by the formula q = 4 π sin θ / λ. In the same manner as the WAXS measurement, the scattering image obtained is corrected for air scattering in consideration of dark current (dark noise) and transmittance. In order to determine an accurate shooting length, collagen that has been corrected by silver behenate is used. The aforementioned Fit2d software was used to calculate the distribution in the width direction of the sample. The horizontal axis was taken as the scattering vector q (nm-1) and the vertical axis was taken as the common logarithm of the intensity I (q) for plotting. Here, the calculation range of the distribution is set to ± 5 degrees from the width direction.
(7)DSC(Differential Scanning Calorimetry;示差掃描熱量分析) (7) DSC (Differential Scanning Calorimetry)
使用示差掃描熱量計(島津製作所公司製造之「DSC-60」)進行熱測定。自試樣膜切出約5mg並封入至測定用之鋁鍋中。以20℃/分鐘之速度自室溫升溫至230℃,測定試樣之熔解吸熱波峰溫度、熔解吸熱波峰面積(總熔解熱)。此處,基線係以自吸熱波峰之開始至波峰結束為 止,於熔解前後之溫度下曲線順暢地相連之方式設定。另外,熔解吸熱波峰面積中,將150℃以下之部分之面積作為150℃熔解熱。 The thermal measurement was performed using a differential scanning calorimeter ("DSC-60" manufactured by Shimadzu Corporation). About 5 mg was cut out from the sample film and sealed in an aluminum pan for measurement. The temperature was raised from room temperature to 230 ° C at a rate of 20 ° C / minute, and the melting endothermic peak temperature and the melting endothermic peak area (total melting heat) of the sample were measured. Here, the baseline is set from the beginning of the endothermic wave to the end of the wave, and the curve is connected smoothly at the temperature before and after melting. In addition, among the areas of the melting endothermic peaks, the area of a portion of 150 ° C. or lower is regarded as the melting heat of 150 ° C.
(8)熱收縮率(單位:%) (8) Thermal shrinkage (unit:%)
依據JISZ 1712:2009藉由以下方法進行測定。將膜基材及積層膜以寬度20mm、長度200mm之大小沿縱方向、橫方向分別切割各5處,懸吊於150℃之熱風烘箱中並加熱15分鐘。對加熱後之約50mm間隔之標線處之長度進行測定,將收縮之長度相對於原本之長度之比例(百分率)作為熱收縮率。 The measurement was performed in accordance with JISZ 1712: 2009 by the following method. The film substrate and the laminated film were cut into 5 places each in the longitudinal direction and the transverse direction with a width of 20 mm and a length of 200 mm, and were suspended in a hot air oven at 150 ° C. and heated for 15 minutes. The length of the marked line at about 50 mm intervals after heating was measured, and the ratio (percentage) of the contracted length to the original length was taken as the thermal shrinkage.
(9)楊氏率(單位:GPa) (9) Young's rate (unit: GPa)
依據JIS K 7127:1999於23℃測定膜基材及積層膜之縱方向及橫方向之楊氏率。將膜基材及積層膜以寬度15mm、長度200mm之大小沿縱方向、橫方向分別切割各5處,對以200mm/min.之拉伸速度進行拉伸試驗時之拉伸強度進行測定。 The Young's ratios in the longitudinal and transverse directions of the film substrate and the laminated film were measured at 23 ° C in accordance with JIS K 7127: 1999. The film base material and the laminated film were respectively cut into 5 places in the longitudinal direction and the transverse direction with a width of 15 mm and a length of 200 mm, and the tensile strength when the tensile test was performed at a tensile speed of 200 mm / min. Was measured.
(10)耐衝擊性(單位:J) (10) Impact resistance (Unit: J)
使用東洋精機公司製造之「膜衝擊測試機(Film Impact Tester)(衝擊頭:12.7mm)」於23℃進行測定。將膜基材以寬度(橫方向):105mm、長度(縱方向):297mm之大小切割各5處,測定衝擊強度。 The measurement was performed at 23 ° C using a "Film Impact Tester (impact head: 12.7 mm)" manufactured by Toyo Seiki. The film substrate was cut into 5 places each having a width (horizontal direction): 105 mm and a length (longitudinal direction): 297 mm, and the impact strength was measured.
(11)厚度均勻性(厚度不均)(單位:%) (11) Uniform thickness (uneven thickness) (unit:%)
自捲取膜捲切出長度為1m之正方形之樣本,沿縱方向及橫方向分別十等分而準備100片測定用樣本。利用接觸式之膜厚度計對測定用樣本之大致中央部測定厚度。求 出所得之100點之資料之平均值A,另外求出最小值與最大值之差(絕對值)B,將使用(B/A)×100之式進行計算所得之值作為膜之厚度不均。 A sample of a square having a length of 1 m was cut out from the film roll, and was divided into ten equal parts in the longitudinal direction and the horizontal direction to prepare 100 samples for measurement. The thickness was measured with a contact-type film thickness meter at approximately the center of the measurement sample. Calculate the average value A of the 100 points obtained, and find the difference (absolute value) B between the minimum and maximum values. Use the value calculated by the formula (B / A) × 100 as the thickness of the film. Both.
(12)霧度(單位:%) (12) Haze (unit:%)
依據JIS K7136:1999對膜基材進行測定。 The film substrate was measured in accordance with JIS K7136: 1999.
(13)膜密度(單位:g/cm3) (13) Film density (unit: g / cm 3 )
膜基材之密度係依據JIS K7112:1999藉由密度梯度管法進行測定。 The density of the film substrate is measured by a density gradient tube method in accordance with JIS K7112: 1999.
(14)折射率(Nx、Ny、Nz) (14) refractive index (Nx, Ny, Nz)
使用阿貝折射計(愛宕(Atago)公司製造),於23℃、濕度65%之條件下,測定用液為苄醇,測定波長為589nm(鈉D射線)而對膜基材進行測定。將沿縱方向、橫方向之折射率分別設為Nx、Ny,將厚度方向之折射率設為Nz。 The film substrate was measured using an Abbe refractometer (manufactured by Atago) under conditions of 23 ° C. and 65% humidity with benzyl alcohol and a measurement wavelength of 589 nm (sodium D-ray). The refractive indices in the vertical and horizontal directions are respectively Nx and Ny, and the refractive index in the thickness direction is Nz.
(15)面配向係數P (15) Plane orientation coefficient P
使用上述(14)中測定之Nx、Ny、Nz,由式:P=[(Nx+Ny)/2]-Nz而算出。 Using Nx, Ny, and Nz measured in the above (14), it is calculated from the formula: P = [(Nx + Ny) / 2] -Nz.
(無機薄膜層之組成、膜厚) (Composition and film thickness of inorganic thin film layer)
關於無機化合物之組成膜厚,使用螢光X射線分析裝置(理學(Rigaku)公司製造ZSX100e),藉由預先製作之校準曲線來測定膜厚組成。再者,作為激發X射線管之條件,設為50kV、70mA。 Regarding the composition film thickness of the inorganic compound, a fluorescent X-ray analyzer (ZSX100e manufactured by Rigaku) was used to measure the film thickness composition using a calibration curve prepared in advance. The conditions for exciting the X-ray tube were 50 kV and 70 mA.
校準曲線係按以下順序求出。 The calibration curve is obtained in the following order.
製作數種具有包含氧化鋁與氧化矽之無機化合物薄膜之膜,利用ICP(Inductively Coupled Plasma;感應耦合電漿)發光法求出氧化鋁及氧化矽各自之附著量。繼而, 利用螢光X射線分析裝置(理學(Rigaku)公司製造之ZSX100e,激發X射線管之條件:50kv、70mA)對已求出附著量之各膜進行分析,藉此求出各樣本之氧化鋁及氧化矽之螢光X射線強度。然後,求出螢光X射線強度與藉由ICP所求出之附著量之關係,製作校準曲線。 Several kinds of films having an inorganic compound thin film containing aluminum oxide and silicon oxide were produced, and the respective adhesion amounts of aluminum oxide and silicon oxide were determined by an ICP (Inductively Coupled Plasma) light emission method. Next, the fluorescent X-ray analyzer (ZSX100e manufactured by Rigaku, conditions for exciting X-ray tubes: 50kv, 70mA) was used to analyze each film for which the adhesion amount had been obtained, thereby obtaining the oxidation of each sample. X-ray fluorescence intensity of aluminum and silicon oxide. Then, the relationship between the fluorescence X-ray intensity and the amount of adhesion obtained by ICP was determined, and a calibration curve was prepared.
因藉由ICP所求出之附著量基本上為質量,故為了將該質量調整為膜厚組成,如以下般進行變換。 Since the adhesion amount obtained by ICP is basically mass, in order to adjust the mass to a film thickness composition, the conversion is performed as follows.
關於膜厚,將無機氧化薄膜之密度視為塊體密度之80%,且即便為將氧化鋁與氧化矽混合之狀態,亦分別保持體積而算出。 Regarding the film thickness, the density of the inorganic oxidized thin film was regarded as 80% of the bulk density, and the volume was calculated while maintaining the volume even when the alumina and silica were mixed.
若將每單位面積之氧化鋁之附著量設為Ma(g/cm2),將每單位面積之氧化矽之附著量設為Ms(g/cm2),則氧化鋁於膜中之含有率wa(質量%)、氧化矽於膜中之含量ws(質量%)係分別由下述式(1)、式(2)而求出。 If the adhesion amount of alumina per unit area is set to Ma (g / cm 2 ), and the adhesion amount of silicon oxide per unit area is set to Ms (g / cm 2 ), the content rate of alumina in the film The wa (mass%) and the content of silicon oxide in the film ws (mass%) are obtained from the following formulas (1) and (2), respectively.
wa=100×[Ma/(Ma+Ms)]‧‧‧式(1) wa = 100 × [Ma / (Ma + Ms)] ‧‧‧Formula (1)
ws=100-wa‧‧‧式(2) ws = 100-wa‧‧‧Formula (2)
亦即,若將每單位面積之氧化鋁之附著量設為Ma(g/cm2),將該氧化鋁之塊體密度設為ρ a(3.97g/cm3),且將每單位面積之氧化矽之附著量設為Ms(g/cm2),將該氧化矽之塊體密度設為ρ s(2.65g/cm3),則膜厚t(nm)係由下述式(3)而求出。 That is, if the adhesion amount of alumina per unit area is set to Ma (g / cm 2 ), the bulk density of the alumina is set to ρ a (3.97 g / cm 3 ), and The adhesion amount of silicon oxide is set to Ms (g / cm 2 ), and the bulk density of the silicon oxide is set to ρ s (2.65 g / cm 3 ). The film thickness t (nm) is given by the following formula (3) Find it out.
t=((Ma/(ρ a×0.8)+Ms/(ρ s×0.8))×107‧‧‧式(3) t = ((Ma / (ρ a × 0.8) + Ms / (ρ s × 0.8)) × 10 7 ‧‧‧Eq. (3)
利用螢光X射線所測定之膜厚之值與使用TEM(Transmission Electron Microscope;穿透式電子顯微鏡)實際測量之膜厚接近。 The film thickness measured by fluorescent X-rays is close to the film thickness actually measured using TEM (Transmission Electron Microscope).
(17)氧透過率(mL/m2/day/MPa) (17) Oxygen transmission rate (mL / m 2 / day / MPa)
使用氧透過度測定裝置(MOCON公司製造之OX-TRAN2/21),於溫度23℃、相對濕度65%之條件下進行 聚丙烯膜基材、積層聚丙烯膜及上述層壓積層體之測定。以使與無機薄膜層為相反側之面成為調濕側之方式設定。 Using an oxygen transmission measuring device (OX-TRAN2 / 21 manufactured by MOCON), the polypropylene film substrate, the laminated polypropylene film, and the above-mentioned laminated laminate were measured at a temperature of 23 ° C and a relative humidity of 65%. It is set so that the surface on the opposite side to the inorganic thin film layer becomes the humidity control side.
(18)水蒸氣透過率(g/m2.day) (18) Water vapor transmission rate (g / m 2 .day)
關於水蒸氣透過量,使用水蒸氣透過度測定裝置(MOCON公司製造之PERMATRAN-W3/33),於溫度37.8℃、相對濕度90%之條件下進行聚丙烯膜基材、積層聚丙烯膜及按下述順序製作之層壓積層體之測定。以使與無機薄膜層為相反側之面成為高濕度側之方式設定。 As for the water vapor transmission rate, a water vapor transmission rate measuring device (PERMATRAN-W3 / 33 manufactured by MOCON Corporation) was used to perform a polypropylene film substrate, a laminated polypropylene film, and a film at a temperature of 37.8 ° C and a relative humidity of 90%. Measurement of the laminated laminate produced in the following procedure. It is set so that the surface opposite to the inorganic thin film layer becomes the high humidity side.
(16)層壓強度 (16) Lamination strength
層壓強度係藉由如下順序而測定。 The lamination strength was measured by the following procedure.
<1>與密封膜之層壓積層體之製作 <1> Fabrication of laminated laminate with sealing film
使用連續式之乾式層壓機以如下方式進行操作。 A continuous dry laminator was used to operate as follows.
於實施例、比較例中所得之積層聚丙烯膜之電暈面以乾燥時塗佈量成為3.0g/m2之方式凹版塗佈接著劑後,導入至乾燥區中,於80℃乾燥5秒鐘。繼而,於設於下游側之輥間與密封膜貼合(輥壓力0.2MP、輥溫度:60℃)。將所得之層壓積層體以捲取狀態進行40℃、3天之老化處理。 The corona surface of the laminated polypropylene film obtained in Examples and Comparative Examples was gravure-coated with an adhesive so that the coating amount became 3.0 g / m 2 when dried, and then introduced into a drying zone and dried at 80 ° C. for 5 seconds. bell. Then, the sealing film was bonded between the rollers provided on the downstream side (roller pressure: 0.2MP, roller temperature: 60 ° C). The obtained laminated laminate was subjected to an aging treatment at 40 ° C. for 3 days in a rolled state.
再者,接著劑係使用將主劑(東洋莫頓(Toyo Morton)公司製造之TM329)17.9質量%、硬化劑(東洋莫頓(Toyo Morton)公司製造之CAT8B)17.9質量%及乙酸乙酯64.2質量%混合所得之醚系接著劑,密封膜係使用東洋紡公司製造之無延伸聚丙烯膜(Pyren(註冊商標)CT P1128,厚度30μm)。 The adhesive used was a base agent (TM329 manufactured by Toyo Morton) 17.9% by mass, a hardener (CAT8B manufactured by Toyo Morton) 17.9% by mass, and ethyl acetate 64.2. The ether-based adhesive obtained by mixing by mass%, and the sealing film was a non-stretch polypropylene film (Pyren (registered trademark) CT P1128, thickness 30 μm) manufactured by Toyobo Co., Ltd.
<2>層壓強度之測定 <2> Measurement of lamination strength
將上述所得之層壓積層體沿雙軸配向聚丙烯膜之縱方向以具有長邊之短條狀(長度200mm、寬度15mm)切 出,使用拉伸試驗機(滕喜龍(Tensilon),Orientic公司製造),於23℃之環境下以200mm/分鐘之拉伸速度進行T字剝離,測定此時之剝離強度(N/15mm)。測定係進行3次,將3次測定之平均值作為層壓強度。 The obtained laminated laminated body was cut out in the shape of a short strip (length 200 mm, width 15 mm) with long sides along the longitudinal direction of the biaxially oriented polypropylene film, and a tensile tester (Tensilon, Orientic Corporation) was used. (Manufactured), T-shaped peeling was performed at a stretching speed of 200 mm / min in an environment at 23 ° C, and the peel strength (N / 15 mm) at this time was measured. The measurement was performed three times, and the average of the three measurements was taken as the lamination strength.
(實施例1) (Example 1)
作為聚丙烯系樹脂,使用Mw/Mn=7.7、Mz+1/Mn=140、MFR=5.0g/10分鐘、內消旋五元組分率[mmmm]=97.3%之丙烯均聚物(日本聚丙烯(Japan Polypropylene)(股)製造之「Novatec(註冊商標)PP SA4L」:共聚合單體量為0莫耳%;以下簡稱為「PP-1」)。 As the polypropylene-based resin, a propylene homopolymer (Japan) with Mw / Mn = 7.7, Mz + 1 / Mn = 140, MFR = 5.0 g / 10 minutes, and meso pentad component ratio [mmmm] = 97.3% (Japan "Novatec (registered trademark) PP SA4L" manufactured by Japan Polypropylene (stock): the amount of comonomer is 0 mole%; hereinafter referred to as "PP-1").
使用60mm單軸擠出機於250℃將該聚丙烯系樹脂自T型模頭中以片材狀擠出,利用30℃之冷卻輥進行冷卻固化後,於135℃沿長度方向(縱方向)而縱方向延伸至4.5倍,繼而以夾頭夾持兩端,導入至熱風烘箱中,於170℃預熱後,於160℃沿橫方向(寬度方向)而橫方向延伸至8.2倍,繼而一邊實施6.7%之鬆弛一邊於168℃進行熱處理。然後,對膜之單面進行電暈處理,以捲取機捲取,製成用作本發明之基材之延伸聚丙烯膜。 This polypropylene resin was extruded from a T-die as a sheet at a temperature of 250 ° C using a 60mm uniaxial extruder, and was cooled and solidified by a cooling roller at 30 ° C. Then, it was longitudinally (vertically) at 135 ° C. The longitudinal direction is extended to 4.5 times, then the two ends are clamped by a chuck and introduced into a hot air oven. After preheating at 170 ° C, the horizontal direction (width direction) is extended to 8.2 times at 160 ° C, and then one side Heat treatment was performed at 168 ° C while performing a relaxation of 6.7%. Then, corona treatment is performed on one side of the film, and it is taken up by a winder to prepare an extended polypropylene film used as a substrate of the present invention.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之特性,於表2中示出製膜條件。所得之膜之物性如表3所示,熱收縮率低,楊氏率高。另外,將該膜之由示差掃描熱量測定(DSC)所得之曲線圖示於圖2。 The thickness of the obtained film was 20 μm. Table 1 shows the characteristics of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 3. The thermal shrinkage was low and the Young's rate was high. A graph obtained by differential scanning calorimetry (DSC) of the film is shown in FIG. 2.
作為蒸鍍源,使用3mm至5mm左右之大小的粒子狀之Al2O3(純度99.5%)及SiO2(純度99.9%),利用電子束蒸鍍法於上述延伸聚丙烯膜上同時蒸鍍Al2O3與SiO2而形成Al2O3-SiO2系薄膜層。關於蒸鍍材料,以碳板將直徑40mm之圓形坩堝一隔為二,不混合而分別投入粒狀之Al2O3、粒狀之SiO2。使用一台電子槍作為加熱源,分時照射電子 束而將Al2O3與SiO2分別加熱,於聚丙烯膜表面加熱氣化,將Al2O3與SiO2混合並進行蒸鍍。此時之電子槍之發射電流為205mA,加速電壓為6kV,對投入至坩堝中之氧化鋁投入相當於160mA×6kV之電力,且對氧化矽投入相當於45mA×6kV之電力。蒸鍍時之真空壓係設為1.1×10-4Pa,將支持膜之輥之溫度設為23℃。藉由變更製膜速度而使用晶體振盪器式膜厚計以薄膜層之厚度成為20nm之方式蒸鍍,獲得積層聚丙烯膜。將所得之膜物性示於表3。 As a vapor deposition source, particulate Al 2 O 3 (purity: 99.5%) and SiO 2 (purity: 99.9%) having a size of about 3 mm to 5 mm were simultaneously deposited on the stretched polypropylene film by an electron beam evaporation method. Al 2 O 3 and SiO 2 form an Al 2 O 3 -SiO 2 based thin film layer. Regarding the vapor deposition material, a circular crucible with a diameter of 40 mm was separated into two by a carbon plate, and granular Al 2 O 3 and granular SiO 2 were separately charged without mixing. An electron gun was used as a heating source, and Al 2 O 3 and SiO 2 were separately heated by irradiating the electron beams in a time-division manner, heated and vaporized on the surface of a polypropylene film, and Al 2 O 3 and SiO 2 were mixed and evaporated. At this time, the emission current of the electron gun was 205 mA, and the acceleration voltage was 6 kV. Electric power equivalent to 160 mA × 6 kV was input to the alumina injected into the crucible, and electric power equivalent to 45 mA × 6 kV was applied to the silicon oxide. The vacuum pressure at the time of vapor deposition was set to 1.1 × 10 -4 Pa, and the temperature of the roll supporting the film was set to 23 ° C. By changing the film-forming speed, a crystal oscillator-type film thickness meter was used to evaporate so that the thickness of the film layer became 20 nm, thereby obtaining a laminated polypropylene film. The obtained film physical properties are shown in Table 3.
(實施例2) (Example 2)
作為聚丙烯系樹脂,使用Mw/Mn=8.9、Mz+1/Mn=110、MFR=3.0g/10分鐘、[mmmm]=97.1%之丙烯均聚物(三星綜合(Samsung Total)(股)製造之「HU300」:共聚合單體量為0莫耳%;以下簡稱為「PP-2」),將橫方向延伸中之預熱溫度設為171℃,將橫方向延伸溫度設為161℃,將橫方向延伸後之熱處理溫度設為170℃,除此以外,與實施例1同樣地獲得作為本發明之基材之延伸聚丙烯膜。 As the polypropylene resin, a propylene homopolymer (Samsung Total (shares)) of Mw / Mn = 8.9, Mz + 1 / Mn = 110, MFR = 3.0g / 10 minutes, and [mmmm] = 97.1% was used. Manufactured "HU300": The amount of comonomer is 0 mole%; hereinafter referred to as "PP-2"), the preheating temperature during lateral stretching is 171 ° C, and the lateral stretching temperature is 161 ° C Except that the heat treatment temperature after stretching in the transverse direction was set to 170 ° C., a stretched polypropylene film was obtained as a substrate of the present invention in the same manner as in Example 1.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之結構,於表2中示出製膜條件。所得之膜之物性如表3所示。 The thickness of the obtained film was 20 μm. Table 1 shows the structure of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 3.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表3。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 3.
(實施例3) (Example 3)
相對於實施例1中所用之丙烯均聚物(PP-1)90質量份,添加分子量10000之低分子量丙烯(三井化學(股)製造之Hi-wax「NP105」:共聚合單體量為0莫耳%)10質量份而設定為合計100質量份,利用30mm雙軸擠出機進行 熔融混練,獲得Mw/Mn=11、Mz+1/Mn=146、MFR=7.0g/10分鐘、[mmmm]=96.5%之丙烯聚合物之混合物(以下簡稱為「PP-3」)之顆粒。除了使用該顆粒作為聚丙烯系樹脂以外,與實施例1同樣地獲得用於本發明之基材之延伸聚丙烯膜。 With respect to 90 parts by mass of the propylene homopolymer (PP-1) used in Example 1, a low molecular weight propylene having a molecular weight of 10,000 (Hi-wax "NP105" manufactured by Mitsui Chemicals Co., Ltd. was added: the amount of comonomer was 0 Mol%) 10 parts by mass and set to a total of 100 parts by mass, melt-kneaded with a 30 mm biaxial extruder to obtain Mw / Mn = 111, Mz + 1 / Mn = 146, MFR = 7.0g / 10 minutes, [ mmmm] = 96.5% of a mixture of propylene polymers (hereinafter referred to as "PP-3"). A stretched polypropylene film used in the substrate of the present invention was obtained in the same manner as in Example 1 except that the particles were used as a polypropylene-based resin.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之結構,於表2中示出製膜條件。所得之膜之物性如表3所示。 The thickness of the obtained film was 20 μm. Table 1 shows the structure of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 3.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表3。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 3.
(實施例4) (Example 4)
除了沿長度方向延伸至5.5倍,沿橫方向延伸至12倍以外,與實施例3同樣地獲得用於本發明之基材之延伸聚丙烯膜。 A stretched polypropylene film used for the substrate of the present invention was obtained in the same manner as in Example 3, except that the length was extended to 5.5 times in the longitudinal direction and 12 times in the transverse direction.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之特性,於表2中示出製膜條件。所得之膜之物性如表3所示。 The thickness of the obtained film was 20 μm. Table 1 shows the characteristics of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 3.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表3。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 3.
(實施例5) (Example 5)
對於實施例1中製作之延伸聚丙烯膜,於拉幅機內以夾頭夾持膜寬度方向兩端,於170℃實施5分鐘之熱處理,獲得本發明之延伸聚丙烯膜。 For the stretched polypropylene film produced in Example 1, the two ends in the width direction of the film were clamped in a tenter in a tenter, and heat treatment was performed at 170 ° C. for 5 minutes to obtain the stretched polypropylene film of the present invention.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之特性,於表2中示出製膜條件。所得之膜之物性如表3所示。 The thickness of the obtained film was 20 μm. Table 1 shows the characteristics of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 3.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄 膜層。將所得之膜物性示於表3。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 3.
(實施例6) (Example 6)
作為聚丙烯系樹脂,使用Mw/Mn=4.0、Mz+1/Mn=23、MFR=6.0g/10分鐘、[mmmm]=98.7%之丙烯均聚物(共聚合單體量為0莫耳%;以下簡稱為「PP-4」),除此以外,與實施例1同樣地獲得用於本發明之基材之延伸聚丙烯膜。 As the polypropylene-based resin, a propylene homopolymer having a Mw / Mn = 4.0, Mz + 1 / Mn = 23, MFR = 6.0g / 10 minutes, and [mmmm] = 98.7% (the comonomer amount was 0 mol %; Hereinafter simply referred to as "PP-4"), except that a stretched polypropylene film used for the substrate of the present invention was obtained in the same manner as in Example 1.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之結構,於表2中示出製膜條件。所得之膜之物性如表3所示。 The thickness of the obtained film was 20 μm. Table 1 shows the structure of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 3.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表3。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 3.
(實施例7) (Example 7)
使用於A層之兩側積層有B層之積層膜(B層/A層/B層),A層中使用表1中所示之聚丙烯均聚物PP-4,B層中使用在表1所示之聚丙烯均聚物PP-8調配有0.15質量%之作為抗黏連劑之二氧化矽而成者。藉由積層B層,可提高層壓強度。A層係使用60mm擠出機,B層係使用65mm擠出機,於250℃自T型模頭中以片材狀擠出,利用30℃之冷卻輥進行冷卻固化後,於135℃沿縱方向延伸至4.5倍。繼而,於拉幅機內以夾頭夾持膜寬度方向兩端,於170℃預熱後,於160℃沿寬度方向延伸至8.2倍,一邊實施6.7%之鬆弛一面於168℃進行熱固定。獲得將各為一層之A層與B層積層而成之雙軸延伸積層聚丙烯膜。對積層聚丙烯膜之B層側實施電暈處理,以捲取機捲取。所得之膜之厚度為20μm。於表1中示出聚丙烯系樹脂原料之結構,於表2中示出製膜條件。 Laminated film with B layer (B layer / A layer / B layer) laminated on both sides of layer A. The polypropylene homopolymer PP-4 shown in Table 1 is used in layer A. The layer B is used in the table. The polypropylene homopolymer PP-8 shown in 1 is prepared by blending 0.15% by mass of silicon dioxide as an anti-blocking agent. By laminating the B layer, the lamination strength can be improved. Layer A uses a 60mm extruder and Layer B uses a 65mm extruder. It is extruded from a T-die in sheet form at 250 ° C, cooled and solidified by a cooling roll at 30 ° C, and stretched at 135 ° C along the longitudinal direction. The direction extends to 4.5 times. Then, the two ends in the width direction of the film were clamped by a chuck in the tenter, and after preheating at 170 ° C, it was extended to 8.2 times in the width direction at 160 ° C, and was heat-fixed at 168 ° C while being relaxed by 6.7%. A biaxially stretched laminated polypropylene film obtained by laminating each of the A layer and the B layer was obtained. Corona treatment is performed on the B layer side of the laminated polypropylene film, and it is wound by a coiler. The thickness of the obtained film was 20 μm. Table 1 shows the structure of the polypropylene-based resin raw material, and Table 2 shows the film forming conditions.
所得之膜之物性如表3所示。 The physical properties of the obtained film are shown in Table 3.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表3。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 3.
(比較例1) (Comparative example 1)
作為聚丙烯系樹脂,使用Mw/Mn=4、Mz+1/Mn=21、MFR=2.5g/10分鐘、[mmmm]=97.0%之丙烯-乙烯共聚物(住友化學(股)製造之「住友Nobrene(註冊商標)FS2011DG3」:共聚合單體量為0.6莫耳%;以下簡稱為「PP-5」),將縱方向延伸溫度設為125℃,將橫方向延伸中之預熱溫度設為168℃,將橫方向延伸溫度設為155℃,將橫方向延伸後之熱處理溫度設為163℃,除此以外,與實施例1同樣地獲得延伸聚丙烯膜。 As the polypropylene-based resin, a propylene-ethylene copolymer (manufactured by Sumitomo Chemical Co., Ltd., Mw / Mn = 4, Mz + 1 / Mn = 21, MFR = 2.5g / 10 minutes, and [mmmm] = 97.0% was used. Sumitomo Nobrene (registered trademark) FS2011DG3 ": The amount of comonomer is 0.6 mole%; hereinafter referred to as" PP-5 "), the extension temperature in the longitudinal direction is set to 125 ° C, and the preheating temperature in the transverse direction is set. A stretched polypropylene film was obtained in the same manner as in Example 1 except that the stretching temperature in the transverse direction was set to 155 ° C, and the heat treatment temperature after the transverse stretching was set to 163 ° C.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之特性,於表2中示出製膜條件。所得之膜之物性如表4所示。 The thickness of the obtained film was 20 μm. Table 1 shows the characteristics of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 4.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表4。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 4.
(比較例2) (Comparative example 2)
將橫方向延伸中之預熱溫度設為171℃,將橫方向延伸溫度設為160℃,將橫方向延伸後之熱處理溫度設為165℃,除此以外,與比較例1同樣地獲得延伸聚丙烯膜。 Except that the preheating temperature during horizontal stretching was 171 ° C., the horizontal stretching temperature was 160 ° C., and the heat treatment temperature after horizontal stretching was 165 ° C., an extension polymerization was obtained in the same manner as in Comparative Example 1. Acrylic film.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之特性,於表2中示出製膜條件。所得之膜之物性如表4所示。 The thickness of the obtained film was 20 μm. Table 1 shows the characteristics of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 4.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表4。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 4.
(比較例3) (Comparative example 3)
作為聚丙烯系樹脂,使用Mw/Mn=4.3、Mz+1/Mn=28、MFR=0.5g/10分鐘、[mmmm]=97.0%之丙烯均聚物(共聚合單體量為0莫耳%;以下簡稱為「PP-6」),除此以外,與比較例2同樣地獲得延伸聚丙烯膜。 As the polypropylene-based resin, a propylene homopolymer of Mw / Mn = 4.3, Mz + 1 / Mn = 28, MFR = 0.5g / 10 minutes, and [mmmm] = 97.0% (the amount of comonomers was 0 mol %; Hereinafter abbreviated as "PP-6"), except that a stretched polypropylene film was obtained in the same manner as in Comparative Example 2.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表4。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 4.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之結構,於表2中示出製膜條件。所得之膜之物性如表4所示。 The thickness of the obtained film was 20 μm. Table 1 shows the structure of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 4.
(比較例4) (Comparative Example 4)
作為聚丙烯系樹脂,使用Mw/Mn=2.8、Mz+1/Mn=9.2、MFR=30g/10分鐘、[mmmm]=97.9%之聚丙烯系聚合物(日本聚丙烯(Japan Polypropylene)(股)製造之「Novatec(註冊商標)PP SA03」:共聚合單體量為0莫耳%;以下簡稱為「PP-7」),除此以外,與實施例1同樣地嘗試獲得延伸聚丙烯膜,但因橫方向延伸而膜斷裂,無法雙軸延伸。斷裂之原因在於:於行進方向之延伸時進行縱方向之配向,於沿垂直方向之延伸時破裂。 As the polypropylene-based resin, a polypropylene-based polymer (Japan Polypropylene) (Mw / Mn = 2.8, Mz + 1 / Mn = 9.2, MFR = 30g / 10 minutes, and [mmmm] = 97.9%) was used. ) Manufactured by "Novatec (registered trademark) PP SA03": the amount of comonomer is 0 mole%; hereinafter referred to as "PP-7"), except that an attempt was made to obtain an extended polypropylene film in the same manner as in Example 1. However, the film is broken due to the lateral extension and cannot be biaxially extended. The reason for the fracture is that the alignment in the longitudinal direction is performed when the traveling direction is extended, and the fracture is broken when the extension is in the vertical direction.
(比較例5) (Comparative example 5)
將縱方向延伸溫度設為125℃,將橫方向延伸中之預熱溫度設為168℃,將橫方向延伸溫度設為155℃,將橫方向延伸後之熱處理溫度設為163℃,除此以外,與實施例1同樣地獲得延伸聚丙烯膜。 In addition, the longitudinal stretching temperature was set to 125 ° C, the preheating temperature during the transverse stretching was set to 168 ° C, the transverse stretching temperature was set to 155 ° C, and the heat treatment temperature after the transverse stretching was set to 163 ° C. A stretched polypropylene film was obtained in the same manner as in Example 1.
所得之膜之厚度為20μm。於表1中示出構成膜之聚丙烯之特性,於表2中示出製膜條件。所得之膜之物性如表4所示。 The thickness of the obtained film was 20 μm. Table 1 shows the characteristics of the polypropylene constituting the film, and Table 2 shows the film forming conditions. The physical properties of the obtained film are shown in Table 4.
與實施例1同樣地,對上述延伸聚丙烯膜蒸鍍無機薄膜層。將所得之膜物性示於表4。 In the same manner as in Example 1, an inorganic thin film layer was deposited on the stretched polypropylene film. The obtained film physical properties are shown in Table 4.
本發明之積層聚丙烯膜可廣泛地用於包裝用途、工業用途等,尤其因氣體阻隔性優異故可薄型化,可實現成本降低、輕量化。另外,本發明之積層聚丙烯膜因耐熱性高,故於塗佈或印刷時可進行高溫之處理,可實現生產之效率化或使用以往難以利用之塗佈劑或墨料、層壓接著劑等。再者,本發明之聚丙烯膜亦示於電容器或馬達等之絕緣膜、太陽電池之背部片材、ITO(Indium Tin Oxide;氧化銦錫)等透明導電膜之基質膜。 The laminated polypropylene film of the present invention can be widely used in packaging applications, industrial applications, and the like. In particular, the laminated polypropylene film can be thinned due to excellent gas barrier properties, and can reduce costs and weight. In addition, since the laminated polypropylene film of the present invention has high heat resistance, it can be subjected to high-temperature processing during coating or printing, which can realize production efficiency or use coating agents, inks, and laminating adhesives that have been difficult to use in the past. Wait. In addition, the polypropylene film of the present invention is also shown in a substrate film of an insulating film such as a capacitor or a motor, a back sheet of a solar cell, and a transparent conductive film such as ITO (Indium Tin Oxide).
Claims (4)
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| TWI888600B (en) * | 2020-07-21 | 2025-07-01 | 日商東洋紡股份有限公司 | Laminated films and packaging materials |
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2022
- 2022-03-09 JP JP2022036338A patent/JP7239036B2/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI833867B (en) * | 2018-12-28 | 2024-03-01 | 日商東洋紡股份有限公司 | Biaxially oriented polypropylene film |
| TWI835964B (en) * | 2018-12-28 | 2024-03-21 | 日商東洋紡股份有限公司 | Biaxially oriented polypropylene film |
| TWI862382B (en) * | 2018-12-28 | 2024-11-11 | 日商東洋紡股份有限公司 | Biaxially oriented polypropylene film |
| TWI865153B (en) * | 2018-12-28 | 2024-12-01 | 日商東洋紡股份有限公司 | Biaxially oriented polypropylene film |
| TWI888600B (en) * | 2020-07-21 | 2025-07-01 | 日商東洋紡股份有限公司 | Laminated films and packaging materials |
Also Published As
| Publication number | Publication date |
|---|---|
| PH12018502649B1 (en) | 2024-04-17 |
| CN109311273A (en) | 2019-02-05 |
| PH12018502649A1 (en) | 2019-10-14 |
| JPWO2017221781A1 (en) | 2019-04-11 |
| KR102494385B1 (en) | 2023-02-02 |
| KR20230019224A (en) | 2023-02-07 |
| JP2022088433A (en) | 2022-06-14 |
| TWI821159B (en) | 2023-11-11 |
| CN118388827A (en) | 2024-07-26 |
| WO2017221781A1 (en) | 2017-12-28 |
| KR20190020763A (en) | 2019-03-04 |
| JP7451081B2 (en) | 2024-03-18 |
| MY187096A (en) | 2021-08-31 |
| JP7239036B2 (en) | 2023-03-14 |
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