TW201803944A - Laminated film - Google Patents
Laminated film Download PDFInfo
- Publication number
- TW201803944A TW201803944A TW106105696A TW106105696A TW201803944A TW 201803944 A TW201803944 A TW 201803944A TW 106105696 A TW106105696 A TW 106105696A TW 106105696 A TW106105696 A TW 106105696A TW 201803944 A TW201803944 A TW 201803944A
- Authority
- TW
- Taiwan
- Prior art keywords
- hard shell
- component
- laminated film
- young
- group
- Prior art date
Links
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 45
- 125000000524 functional group Chemical group 0.000 claims abstract description 32
- 239000011256 inorganic filler Substances 0.000 claims abstract description 30
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 30
- 150000001875 compounds Chemical class 0.000 claims abstract description 29
- 229920006295 polythiol Polymers 0.000 claims abstract description 22
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 7
- 239000006185 dispersion Substances 0.000 claims description 6
- 238000005259 measurement Methods 0.000 abstract description 3
- 150000003377 silicon compounds Chemical class 0.000 abstract description 3
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- 230000001678 irradiating effect Effects 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
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- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- WDZGTNIUZZMDIA-UHFFFAOYSA-N 2-(hydroxymethyl)-2-methylpropane-1,3-diol 2-sulfanylacetic acid Chemical compound OC(=O)CS.OC(=O)CS.OC(=O)CS.OCC(C)(CO)CO WDZGTNIUZZMDIA-UHFFFAOYSA-N 0.000 description 1
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- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
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- 230000004927 fusion Effects 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052914 metal silicate Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- BZAROSBWJASVBU-UHFFFAOYSA-N tribromo(ethenyl)silane Chemical compound Br[Si](Br)(Br)C=C BZAROSBWJASVBU-UHFFFAOYSA-N 0.000 description 1
- JQEWVIPDSRPABG-UHFFFAOYSA-N trichloro(3-prop-1-enoxypropyl)silane Chemical compound C(=CC)OCCC[Si](Cl)(Cl)Cl JQEWVIPDSRPABG-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- HKFSBKQQYCMCKO-UHFFFAOYSA-N trichloro(prop-2-enyl)silane Chemical compound Cl[Si](Cl)(Cl)CC=C HKFSBKQQYCMCKO-UHFFFAOYSA-N 0.000 description 1
- TXJZGLZJCDSVRK-UHFFFAOYSA-N triethoxy(3-prop-1-enoxypropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCOC=CC TXJZGLZJCDSVRK-UHFFFAOYSA-N 0.000 description 1
- IWZLBIVZPIDURM-UHFFFAOYSA-N trimethoxy(3-prop-1-enoxypropyl)silane Chemical compound CO[Si](OC)(OC)CCCOC=CC IWZLBIVZPIDURM-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
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- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/51—Elastic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/536—Hardness
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Abstract
Description
本發明係有關於具有高硬度、耐擦傷性、耐曲性佳之硬殼層的積層膜。 The present invention relates to a laminated film of a hard shell layer having high hardness, abrasion resistance and excellent bending resistance.
近年來,各種顯示器等顯示裝置皆具備觸控螢幕,多作為資料輸入裝置使用。 In recent years, display devices such as various displays have touch screens, and are mostly used as data input devices.
在使用此觸控螢幕時,通常以筆或手指接觸觸控螢幕的表面。然而,希望觸控螢幕的表面即使在以筆或手指反覆接觸後,也不會損傷。 When using this touch screen, the surface of the touch screen is usually touched with a pen or finger. However, it is hoped that the surface of the touch screen will not be damaged even after repeated contact with a pen or finger.
因此,先前,在構成觸控螢幕的樹脂膜上設置硬殼層。 Therefore, previously, a hard shell layer was provided on a resin film constituting a touch screen.
例如,專利文獻1揭示,含有具有反應性官能基之有機矽化合物與聚硫醇化合物之用於透明塗層的樹脂組成物、或使用此樹脂組成物所形成之透明塗層。此外,此文獻記載使用此樹脂組成物所形成之透明塗層,其具有良好的可撓性、硬度、耐擦傷性及耐摩性。 For example, Patent Document 1 discloses a resin composition for a transparent coating containing an organic silicon compound and a polythiol compound having a reactive functional group, or a transparent coating formed using the resin composition. In addition, this document describes that the transparent coating layer formed using the resin composition has good flexibility, hardness, abrasion resistance, and abrasion resistance.
專利文獻1:國際專利第2010/103944號公報 Patent Document 1: International Patent Publication No. 2010/103944
由上述可知,專利文獻1記載其透明塗層具有良好可撓性、硬度、耐擦傷性及耐摩性等。 From the above, it is known that Patent Document 1 describes that the transparent coating has good flexibility, hardness, abrasion resistance, abrasion resistance, and the like.
然而,為了形成此透明塗層,樹脂組成物必須充分硬化,但依據硬化的條件,無法形成具有所欲目的特性的透明塗層。 However, in order to form this transparent coating layer, the resin composition must be sufficiently hardened, but depending on the conditions of hardening, a transparent coating layer having desired characteristics cannot be formed.
有鑑於此,本發明之目的係為提供具有高硬度、耐擦傷性、耐曲性良好之硬殼層的積層膜。 In view of this, an object of the present invention is to provide a laminated film of a hard shell layer having high hardness, good abrasion resistance, and good bending resistance.
本發明人為解決上述問題,廣泛研究硬殼劑。結果發現使用含有具反應性官能基及水解性基團之有機矽化合物、聚硫醇化合物、及具反應性官能基之無機充填物的硬殼劑,可有效地形成具有高硬度、且具良好耐擦傷性的硬殼層。此外,於硬殼層中添加無機充填物,會降低硬殼層的耐曲性,但藉由控制硬殼層中無機充填物的分散狀態,可抑制耐曲性的下降。 In order to solve the above problems, the present inventors have extensively studied hard shell agents. As a result, it was found that the use of a hard shell agent containing an organosilicon compound having a reactive functional group and a hydrolyzable group, a polythiol compound, and an inorganic filler having a reactive functional group can effectively form a high-hard, good Scratch-resistant hard shell. In addition, when an inorganic filler is added to the hard shell layer, the bending resistance of the hard shell layer is reduced. However, by controlling the dispersion state of the inorganic filler in the hard shell layer, a decrease in the bending resistance can be suppressed.
基於此發現完成本發明。 The present invention has been completed based on this finding.
因此,本發明提供下述(1)之積層膜。 Therefore, this invention provides the laminated film of following (1).
(1)一種積層膜,包含基材層與硬殼層的積層膜,此硬殼層使用含有下列成分(A)、成分(B)、及成分(C)的硬殼劑形成,使用原子力顯微鏡測定硬殼層表面的楊氏係數,楊氏係數1~5GPa的區域為連續結構,且楊氏係數6~10GPa的區域為獨立分散。 (1) A laminated film comprising a laminated film of a substrate layer and a hard shell layer. The hard shell layer is formed using a hard shell agent containing the following component (A), component (B), and component (C), and an atomic force microscope is used. The Young's coefficient on the surface of the hard shell layer was measured. The area with a Young's coefficient of 1 to 5 GPa was a continuous structure, and the area with a Young's coefficient of 6 to 10 GPa was independently dispersed.
成分(A):具有反應性官能基及水解性基團的有機矽化合物;成分(B):聚硫醇化合物;成分(C):具有反應性官能基的無機充填物。 Component (A): an organosilicon compound having a reactive functional group and a hydrolyzable group; component (B): a polythiol compound; component (C): an inorganic filler having a reactive functional group.
本發明係提供具有高硬度、耐擦傷性、耐曲性良 好之硬殼層的積層膜。 The present invention provides high hardness, scratch resistance, and good flex resistance. Good hard shell laminated film.
第1圖為實施例1所獲得之積層膜(1)的楊氏係數映射圖像。 FIG. 1 is a Young's coefficient map image of the laminated film (1) obtained in Example 1. FIG.
第2圖為比較例1所獲得之積層膜(2)的楊氏係數映射圖像。 FIG. 2 is a Young's coefficient map image of the laminated film (2) obtained in Comparative Example 1. FIG.
第3圖為比較例2所獲得之積層膜(3)的楊氏係數映射圖像。 FIG. 3 is a Young's coefficient map image of the laminated film (3) obtained in Comparative Example 2. FIG.
第4圖為比較例3所獲得之積層膜(4)的楊氏係數映射圖像。 FIG. 4 is a Young's coefficient map image of the laminated film (4) obtained in Comparative Example 3. FIG.
第5圖為比較例4所獲得之積層膜(5)的楊氏係數映射圖像。 FIG. 5 is a Young's coefficient map image of the laminated film (5) obtained in Comparative Example 4. FIG.
本發明之積層膜為包含基材層與硬殼層的積層膜,此硬殼層使用含有下列成分(A)、成分(B)、及成分(C)的硬殼劑形成,使用原子力顯微鏡測定硬殼層表面的楊氏係數,楊氏係數1~5GPa的區域為連續結構,且楊氏係數6~10GPa的區域為獨立分散。 The laminated film of the present invention is a laminated film including a substrate layer and a hard shell layer. This hard shell layer is formed using a hard shell agent containing the following component (A), component (B), and component (C), and measured using an atomic force microscope. The Young's coefficient on the surface of the hard shell layer, the area with a Young's coefficient of 1 to 5 GPa is a continuous structure, and the area with a Young's coefficient of 6 to 10 GPa is independently dispersed.
成分(A):具有反應性官能基及水解性基團的有機矽化合物;成分(B):聚硫醇化合物;成分(C):具有反應性官能基的無機充填物。 Component (A): an organosilicon compound having a reactive functional group and a hydrolyzable group; component (B): a polythiol compound; component (C): an inorganic filler having a reactive functional group.
構成本發明積層膜的基材層被用以支持硬殼層。 The base material layer constituting the laminated film of the present invention is used to support a hard shell layer.
基材層的種類並無特別限制。例如,以合成樹脂膜作為基材層。 The type of the base material layer is not particularly limited. For example, a synthetic resin film is used as the base material layer.
合成樹脂膜可擇自於,例如聚乙烯、聚丙烯、聚氯乙烯、聚二氯亞乙烯、乙烯/醋酸乙烯酯共聚合體、乙烯/乙烯醇共聚物、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二醇酯、聚甲基丙烯酸甲酯、聚丙烯酸甲酯、聚乙基丙烯酸乙酯、聚苯乙烯、乙酸纖維素、玻璃紙、聚碳酸酯等的膜。 The synthetic resin film can be selected from, for example, polyethylene, polypropylene, polyvinyl chloride, polyvinylidene chloride, ethylene / vinyl acetate copolymers, ethylene / vinyl alcohol copolymers, polyethylene terephthalate, polymer Butyl terephthalate, polyethylene naphthalate, polymethyl methacrylate, polymethyl acrylate, polyethyl acrylate, polystyrene, cellulose acetate, cellophane, polycarbonate, etc. Of the film.
在本發明中,至少在上述基材層的一面設置底漆層。上述底漆層為對於設置在其上方硬殼層具良好密著性以及對於上述基材層具良好密著性的物質,其種類並無特別限制。底漆層可使用丙烯酸類底漆層、聚酯類底漆層、聚氨酯類底漆層、矽膠類底漆層、橡膠類底漆層等習知底漆層。 In the present invention, a primer layer is provided on at least one side of the substrate layer. The primer layer is a substance having good adhesion to the hard shell layer provided above it and good adhesion to the base material layer, and the kind thereof is not particularly limited. As the primer layer, conventional primer layers such as an acrylic primer layer, a polyester primer layer, a polyurethane primer layer, a silicone primer layer, and a rubber primer layer can be used.
基材層(合成樹脂膜)的厚度並無特別限制,可依據積層膜的用途決定。 The thickness of the substrate layer (synthetic resin film) is not particularly limited, and can be determined according to the use of the laminated film.
基材層的厚度通常為10~500μm,較佳為20~200μm。 The thickness of the substrate layer is usually 10 to 500 μm, and preferably 20 to 200 μm.
構成本發明積層膜的硬殼層為使用含有下列成分(A)、成分(B)、及成分(C)之硬殼劑(以下,稱為「硬殼劑(α)」)所形成。 The hard shell layer constituting the laminated film of the present invention is formed by using a hard shell agent (hereinafter, referred to as "hard shell agent (α)") containing the following component (A), component (B), and component (C).
硬殼劑(α)含有作為成分(A)之具有反應性官能基及水解性基團的有機矽化合物(以下稱為「有機矽化合物(A)」)。 The hard shell agent (α) contains, as a component (A), an organosilicon compound having a reactive functional group and a hydrolyzable group (hereinafter referred to as "organosilicon compound (A)").
有機矽化合物(A)中的反應性官能基為可與成分(B)之巰基反應形成化學鍵結的基團。 The reactive functional group in the organosilicon compound (A) is a group capable of reacting with a thiol group of the component (B) to form a chemical bond.
此反應性官能基可擇自乙烯基、烯丙基、苯乙烯基、(甲基)丙烯醯氧基等含有碳-碳不飽和鍵結的基團;環氧基;異氰酸酯;巰基等。在這之中,較佳為具有碳-碳不飽和鍵結的基團,更佳為乙烯基。 The reactive functional group may be selected from a group containing a carbon-carbon unsaturated bond such as a vinyl group, an allyl group, a styryl group, a (meth) acryl fluorenyl group, an epoxy group, an isocyanate, a mercapto group, and the like. Among these, a group having a carbon-carbon unsaturated bond is preferable, and a vinyl group is more preferable.
有機矽化合物(A)中的水解性基團為可藉由水解反應形成矽氧烷結合(Si-O-Si結合)的基團 The hydrolyzable group in the organosilicon compound (A) is a group capable of forming a siloxane bond (Si-O-Si bond) by a hydrolysis reaction.
水解性基團可擇自甲氧基、乙氧基、n-丙氧基等碳數1~10,較佳為1~5的烷氧基;苯氧基等碳數6~15,較佳為6~10的芳氧基;甲醯氧基、乙醯氧基、丙氧基等碳數1~10,較 佳為1~5的醯氧基;氯原子、溴原子等鹵素原子。在這之中,較佳為碳數1~10的烷氧基或碳數1~10的醯氧基,更佳為碳數1~10的醯氧基。 Hydrolyzable groups can be selected from alkoxy groups having 1 to 10 carbon atoms, such as methoxy, ethoxy, and n-propoxy groups, and preferably 1 to 5 alkoxy groups; It is an aryloxy group having 6 to 10 carbon atoms, such as methyloxy, ethoxy, and propoxy, having a carbon number of 1 to 10. Preferred is 1 to 5 fluorenyloxy groups; halogen atoms such as chlorine atom and bromine atom. Among these, an alkoxy group having 1 to 10 carbon atoms or a fluorenyl group having 1 to 10 carbon atoms is preferred, and a fluorenyl group having 1 to 10 carbon atoms is more preferred.
有機矽化合物(A)可擇自下列式(I)所示化合物。 The organosilicon compound (A) can be selected from the compounds represented by the following formula (I).
式(I)中,R1為具有反應性官能基的基團,R2為水解性基團,R3為不具有反應性官能基的非水解性基團。 In the formula (I), R 1 is a group having a reactive functional group, R 2 is a hydrolyzable group, and R 3 is a non-hydrolyzable group having no reactive functional group.
x為1、2或3,y為1、2或3,z為0、1或2,x、y、z合計為4。 x is 1, 2 or 3, y is 1, 2 or 3, z is 0, 1 or 2, and x, y, and z are 4 in total.
x、y或z為2以上時,複數個R1、R2或R3可為相同或不同。 When x, y or z is 2 or more, a plurality of R 1 , R 2 or R 3 may be the same or different.
R1為擇自於反應性官能基或具有反應性官能基的基團。其具體例可擇自於乙烯基、乙烯氧甲基等具有乙烯基的基團;烯丙基、烯丙基氧甲基等具有烯丙基的基團;苯乙烯基、苯乙烯基甲基等具有苯乙烯基的基團;(甲基)丙烯醯基、3-(甲基)丙烯醯氧基丙烷基等具有(甲基)丙烯醯基的基團;環氧基、環氧丙基、3-環氧丙基氧丙基等具有環氧基的基團;異氰酸酯基、3-異氰酸酯丙基等具有異氰酸酯基的基團;巰基、3-巰基丙基等具有巰基的基團。在這之中,較佳為具有碳-碳不飽和鍵結的基團,更佳為乙烯基。 R 1 is a group selected from a reactive functional group or a group having a reactive functional group. Specific examples thereof may be selected from groups having a vinyl group such as vinyl, vinyloxymethyl; groups having an allyl group such as allyl, allyloxymethyl; styryl, styrylmethyl Groups such as styryl; Groups with (meth) acrylfluorenyl such as (meth) acrylfluorenyl, 3- (meth) acrylfluorenyloxypropyl; epoxy, epoxypropyl Groups having an epoxy group, such as 1,3-glycidyloxypropyl; groups having an isocyanate group, such as isocyanate group and 3-isocyanatepropyl group; groups having a mercapto group, such as mercapto group and 3-mercaptopropyl group. Among these, a group having a carbon-carbon unsaturated bond is preferable, and a vinyl group is more preferable.
R1的碳數較佳為2~20,更佳為2~10。 The carbon number of R 1 is preferably 2 to 20, and more preferably 2 to 10.
R2可擇自於上述水解性基團。 R 2 may be selected from the above-mentioned hydrolyzable group.
R2的碳數較佳為0~15,更佳為0~10。 The carbon number of R 2 is preferably from 0 to 15, more preferably from 0 to 10.
R3可擇自於甲基、乙基、n-丙基、異丙基等碳數1~20,較佳為1~15的烷基;苯基;1-萘基等碳數6~20,較佳為6~15的芳基等。 R 3 may be selected from methyl, ethyl, n-propyl, isopropyl and other alkyl groups having 1 to 20 carbon atoms, preferably 1 to 15 alkyl groups; phenyl; 1 to naphthyl and 6 to 20 carbon atoms , Preferably an aryl group of 6 to 15 and the like.
有機矽化合物(A)可擇自於乙烯基三甲氧基矽氧、乙烯基三乙氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三氯氫矽、乙烯基三溴矽烷等含有乙烯基的矽烷化合物;烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、烯丙基三乙氧基矽烷、烯丙基三氯氫矽、烯丙基三溴矽烷等含烯丙基的矽烷化合物;γ-丙烯醯氧丙基三甲氧基矽烷、γ-丙烯醯氧丙基三乙氧基矽烷、γ-丙烯醯氧丙基三氯氫矽、γ-丙烯醯氧丙基三溴矽烷等含γ-丙烯醯氧丙基的矽烷化合物;γ-甲基丙烯醯氧三甲氧矽烷、γ-甲基丙烯醯氧丙基三乙氧基矽烷、γ-甲基丙烯醯氧丙基三氯氫矽、γ-甲基丙烯醯氧丙基三溴矽烷等含γ-甲基丙烯醯烷基的矽烷化合物;α-環氧丙基乙基三甲氧基矽烷、α-環氧丙基乙基三乙氧基硅烷、β-環氧丙基三甲氧基矽烷、β-環氧丙基三乙氧基矽烷、α-環氧丙基乙基三氯矽烷、α-環氧丙基乙基三溴矽烷、β-環氧丙基乙基三氯矽烷、β-環氧丙基乙基三溴矽烷等含環氧基的矽烷化合物等。 The organosilicon compound (A) can be selected from vinyltrimethoxysilyl, vinyltriethoxysilane, vinyltriethoxysilane, vinyltrichlorosilane, vinyltribromosilane, etc. Silane compounds; allyl trimethoxysilane, allyl triethoxysilane, allyl triethoxysilane, allyl trichlorosilane, allyl tribromosilane, etc. Silane compounds; γ-propenyloxypropyltrimethoxysilane, γ-propenyloxypropyltriethoxysilane, γ-propenyloxypropyltrichlorosilane, γ-propenyloxypropyltribromosilane Silane compounds containing γ-acrylic acid oxypropyl; γ-methacrylic acid oxytrimethoxysilane, γ-methacrylic acid oxypropyltriethoxysilane, γ-methacrylic acid oxypropyltrisiloxane Silyl compounds containing γ-methacrylic acid alkyl groups, such as chlorohydrogen silicon, γ-methacryloxypropyltribromosilane; α-epoxypropylethyltrimethoxysilane, α-epoxypropylethyl Triethoxysilane, β-epoxypropyltrimethoxysilane, β-epoxypropyltriethoxysilane, α-epoxypropylethyltrichlorosilane, α-cyclo Cyclopropylethyl tribromo Silane, β- trichloro-ethyl glycidyl Silane, β- epoxy silane-cyclopropylethyl tribromo other epoxy group-containing silane-compound.
在這之中,有機矽化合物(A)較佳為含乙烯基的矽烷化合物,更佳為乙烯基三乙醯氧基矽烷。 Among these, the organosilicon compound (A) is preferably a vinyl-containing silane compound, and more preferably vinyltriethoxysilane.
有機矽化合物(A)可單獨1種,或合併2種以上使用。 The organosilicon compound (A) may be used alone or in combination of two or more.
硬殼劑(α)含有作為成分(B)之聚硫醇化合物。 The hard shell agent (α) contains a polythiol compound as a component (B).
除了上述有機矽化合物,使用含有聚硫醇化合物之硬殼劑,可形成透明性佳,鉛筆硬度高,耐曲性佳的硬殼層。 In addition to the above-mentioned organosilicon compounds, the use of a hard shell agent containing a polythiol compound can form a hard shell layer with good transparency, high pencil hardness, and good resistance to bending.
聚硫醇化合物為在分子內具有2個以上的巰基化合物。 The polythiol compound is a compound having two or more mercapto groups in the molecule.
聚硫醇化合物可擇自於乙基雙(巰基乙酸)、乙基雙(3-巰基丙酸)等巰基數為2的化合物;三羥甲基乙烷三(巰基乙酸)、三羥甲基乙烷三((3-巰基丙酸)、三羥甲基丙烷三(巰基乙酸)、三羥甲基丙烷三(3-巰基丙酸)等巰基數為3的化合物;季戊四醇四(巰基乙酸)、季戊四醇四(3-巰基丙酸)、二季戊四醇六(巰基乙酸)、二季戊四醇六(3-巰基丙酸)等巰基數為4以上的化合物。 The polythiol compound can be selected from compounds having a mercapto group number 2 such as ethylbis (mercaptoacetic acid) and ethylbis (3-mercaptopropionic acid); trimethylolethane tri (mercaptoacetic acid), trimethylol Compounds with a thiol number of 3, such as ethanetri ((3-mercaptopropionic acid), trimethylolpropane tri (mercaptoacetic acid), and trimethylolpropane tri (3-mercaptopropionic acid); pentaerythritol tetra (mercaptoacetic acid) Compounds having a mercapto group number of 4 or more such as pentaerythritol tetrakis (3-mercaptopropionic acid), dipentaerythritol hexa (mercaptoacetic acid), and dipentaerythritol hexa (3-mercaptopropionic acid).
在這之中,聚硫醇化合物較佳為巰基數為3的化合物或巰基數為4以上的化合物,更佳為三羥甲基丙烷三(巰基丙酸)。 Among these, the polythiol compound is preferably a compound having 3 mercapto groups or a compound having 4 or more mercapto groups, and more preferably trimethylolpropane tris (mercaptopropionic acid).
聚硫醇化合物可為單獨1種,或合併2種以上使用。 The polythiol compound may be used singly or in combination of two or more kinds.
聚硫醇化合物的含量並無特別限制。聚硫醇化合物的含量相對於成分(A),通常為50~120質量%,較佳為60~100質量%,更佳為60~90質量%。 The content of the polythiol compound is not particularly limited. The content of the polythiol compound is usually 50 to 120% by mass, preferably 60 to 100% by mass, and more preferably 60 to 90% by mass with respect to the component (A).
使用聚硫醇化合物含量過少的硬殼劑形成硬殼層,可能會發生積層膜捲曲。另外,使用聚硫醇化合物過量的硬殼劑,可能會難以形成高硬度的硬殼層。 When a hard shell layer is formed by using a hard shell agent with too little polythiol compound content, the laminated film may curl. In addition, it may be difficult to form a hard shell layer with high hardness by using a hard shell agent in which the polythiol compound is excessive.
硬殼劑(α)含有作為成分(C)之具有反應性官能基的無機充填物(經修飾處理,於表面導入反應性官能基的無機充填物,以下將成分(C)稱為「無機充填物(C)」)。 The hard shell agent (α) contains an inorganic filler having a reactive functional group as a component (C) (an inorganic filler having a reactive functional group introduced on the surface after modification treatment, and the component (C) is hereinafter referred to as "inorganic filler物 (C) ″).
除了上述有機矽化合物及聚硫醇化合物,使用含有無機充填物(C)之硬殼劑,可形成透明性佳,鉛筆硬度高,耐曲性佳的硬殼層。 In addition to the above-mentioned organosilicon compound and polythiol compound, the use of a hard-shell agent containing an inorganic filler (C) can form a hard-shell layer having excellent transparency, high pencil hardness, and excellent resistance to bending.
無機充填物(C)所具有的反應性官能基為可與成 分(B)之巰基形成化學鍵結的基團。此反應性官能基可擇自與有機矽化合物(A)相同的物質。其中,較佳具有碳-碳不飽和鍵結的基團,更佳為(甲基)丙烯醯氧基。 The reactive functional group of the inorganic filler (C) is The mercapto group (B) forms a chemically bonded group. This reactive functional group can be selected from the same substance as the organosilicon compound (A). Among them, a group having a carbon-carbon unsaturated bond is preferable, and a (meth) acrylic fluorenyloxy group is more preferable.
構成無機充填物(C)的無機成分(修飾處理前之無機充填物的構成成分)可擇自於金屬氧化物、金屬氫氧化物、金屬鹽等。 The inorganic component (the component of the inorganic filler before the modification treatment) constituting the inorganic filler (C) can be selected from metal oxides, metal hydroxides, and metal salts.
金屬氧化物可擇自於二氧化矽、二氧化鈦、礬土、單水鋁石、氧化鉻、氧化鎳、氧化銅、二氧化鈦、氧化鋯、氧化銦、氧化鋅等。 The metal oxide can be selected from silicon dioxide, titanium dioxide, alumina, gibbsite, chromium oxide, nickel oxide, copper oxide, titanium dioxide, zirconia, indium oxide, zinc oxide and the like.
金屬氫氧化物可擇自氫氧化鋁。 The metal hydroxide can be selected from aluminum hydroxide.
金屬鹽可擇自碳酸鈣、碳酸鎂等金屬碳酸鹽;硫酸鈣、硫酸鋇等金屬硫酸鹽;矽酸鋁、矽酸鈣、矽酸鎂等金屬矽酸鹽等。 The metal salt can be selected from metal carbonates such as calcium carbonate and magnesium carbonate; metal sulfates such as calcium sulfate and barium sulfate; metal silicates such as aluminum silicate, calcium silicate, and magnesium silicate.
在這之中,構成無機充填物(C)的無機成分較佳為金屬氧化物,更佳為二氧化矽。 Among these, the inorganic component constituting the inorganic filler (C) is preferably a metal oxide, and more preferably silicon dioxide.
構成無機充填物(C)的形狀雖然可為球狀、鏈狀、針狀、板狀、片狀、棒狀、纖維狀等任一種,但較佳為球狀。本發明中,所謂的球狀除了真正的球狀之外,也包含旋轉橢圓形、圓形、金平糖狀、蠶繭狀等與球體類似的多面體類球狀。 Although the shape constituting the inorganic filler (C) may be any of a spherical shape, a chain shape, a needle shape, a plate shape, a sheet shape, a rod shape, and a fibrous shape, it is preferably a spherical shape. In the present invention, the so-called spherical shape includes a polyhedral spherical shape similar to a sphere, such as a rotating ellipse, a circle, a gold candy shape, and a cocoon shape, in addition to a true spherical shape.
無機充填物(C)的大小並無特別限制。無機充填物(C)的平均粒徑通常為5~1000nm,較佳為10~500nm,更佳為20~100nm。 The size of the inorganic filler (C) is not particularly limited. The average particle diameter of the inorganic filler (C) is usually 5 to 1000 nm, preferably 10 to 500 nm, and more preferably 20 to 100 nm.
若無機充填物(C)的平均粒徑在上述範圍內,則可有效地形成具有良好透明性、且耐擦傷性佳的硬殼層。 When the average particle diameter of the inorganic filler (C) is within the above range, a hard shell layer having good transparency and excellent scratch resistance can be effectively formed.
無機充填物(C)的平均粒徑可利用BET法所獲得之比表面積計算。 The average particle diameter of the inorganic filler (C) can be calculated using the specific surface area obtained by the BET method.
本發明硬殼劑中無機充填物(C)可為單獨1種,或合併組合2種以上使用。 The inorganic filler (C) in the hard shell agent of the present invention may be used singly or in combination of two or more kinds.
無機充填物(C)的含量並無特別限制。無機充填物(C)的含量相對於成分(A)通常為30~130質量%,較佳為60~125質量%,更佳為90~125質量%。 The content of the inorganic filler (C) is not particularly limited. The content of the inorganic filler (C) with respect to the component (A) is usually 30 to 130% by mass, preferably 60 to 125% by mass, and more preferably 90 to 125% by mass.
使用無機充填物(C)的含量在相對於成分(A)為90~125質量%之硬殼劑,容易形成具硬度高的硬殼層。 A hard shell agent having an inorganic filler (C) content of 90 to 125% by mass relative to the component (A) is used to easily form a hard shell layer with high hardness.
使用無機充填物(C)的含量在相對於成分(A)為90~125質量%之硬殼劑,容易形成具良好耐擦傷性的硬殼層。 A hard-shelling agent having an inorganic filler (C) content of 90 to 125% by mass relative to the component (A) can easily form a hard-shelling layer having good scratch resistance.
硬殼劑(α)在不會防害本發明效果的範圍內,可含有成分(A)、成分(B)、及成分(C)以外的成分。其它成分可為溶劑或光聚合起始劑。 The hard shell agent (α) may contain components other than the component (A), the component (B), and the component (C) within a range that does not prevent the effects of the present invention. Other ingredients may be solvents or photopolymerization initiators.
含有溶劑的硬殼劑易於塗佈施工,使用含有溶劑之硬殼劑,可有效地形成薄硬殼層。 Solvent-containing hard shell agents are easy to apply and apply. Using hard shell agents containing solvents can effectively form a thin hard shell layer.
溶劑可擇自於己烷、庚烷、環己烷等脂肪族碳氫化合物類溶劑;甲苯、二甲苯等芳香族碳氫化合物類溶劑;二氯甲烷、二氯乙烷等鹵素碳氫化合物類溶劑;甲醇、乙醇、丙醇、丁醇、1-甲氧基-2-丙醇等醇類溶劑;丙酮、甲基乙基酮、2-戊酮、甲基異丁基酮、異佛爾酮等酮類溶劑等;乙酸乙酯、醋酸丁酯等酯類溶劑;乙基賽璐蘇等賽璐蘇類溶劑等。 The solvent can be selected from aliphatic hydrocarbon solvents such as hexane, heptane and cyclohexane; aromatic hydrocarbon solvents such as toluene and xylene; halogen hydrocarbons such as dichloromethane and dichloroethane Solvents; alcohol solvents such as methanol, ethanol, propanol, butanol, 1-methoxy-2-propanol; acetone, methyl ethyl ketone, 2-pentanone, methyl isobutyl ketone, isophor Ketone solvents such as ketones, etc .; Ester solvents such as ethyl acetate and butyl acetate; Celluloid solvents such as ethylcellulose.
溶劑可為單獨1種,或合併組合2種以上使用。 The solvent may be used singly or in combination of two or more kinds.
硬殼劑(α)含有溶劑時,溶劑的含量較佳為本發明硬殼劑固態部分的30~95質量%以上,更佳為35~90質量%,最佳為40~85質量%。 When the hard shell agent (α) contains a solvent, the content of the solvent is preferably 30 to 95% by mass or more, more preferably 35 to 90% by mass, and most preferably 40 to 85% by mass, based on the solid portion of the hard shell agent of the present invention.
使用含有光聚合起始劑的硬殼劑,在塗佈硬殼劑後,可有效地硬化所獲得的塗層。 By using a hard-shell agent containing a photopolymerization initiator, the obtained coating can be effectively hardened after the hard-shell agent is applied.
光聚合起始劑可擇自,例如安息香、香息香甲醚、安息香乙醚、安息香異丙醚、安息香n-丁醚、安息香異丁醚、苯乙酮、二甲基氨苯乙酮、2,2-二甲氧基-2-苯基乙醯苯、2,2-二甲氧基-2-苯基乙醯苯、2-羥基-2-甲基-1-苯丙烷-1-酮、1-羥基環己基苯基甲酮、2-甲基-1-[4-(甲硫)苯基]-2-嗎啉-丙烷-1-酮、4-(2-羥乙基)苯基-2(羥基-2丙基)酮、二苯酮、p-苯基二苯甲酮、4,4-二乙基氨基苯甲酮、二氯二苯甲酮、2-甲基蒽醌、2-乙基蒽醌、2-叔丁基蒽醌、2-胺蒽醌、2-甲基噻吨酮、2-乙基噻吨酮、2-氯噻吨酮、2,4-二甲基噻吨酮、2,4-二乙基噻吨酮、苯偶醯二甲基縮酮、苯乙酮二甲基縮酮、p-二甲基氨基安息香酸酯等。 The photopolymerization initiator can be selected from, for example, benzoin, benzoin methyl ether, benzoin ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, acetophenone, dimethylaminoacetophenone, 2 2,2-dimethoxy-2-phenylacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one , 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholine-propane-1-one, 4- (2-hydroxyethyl) benzene -2 (hydroxy-2propyl) ketone, benzophenone, p-phenylbenzophenone, 4,4-diethylaminobenzophenone, dichlorobenzophenone, 2-methylanthraquinone , 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-aminoanthraquinone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2,4-bis Methylthioxanthone, 2,4-diethylthioxanthone, benzophenone dimethyl ketal, acetophenone dimethyl ketal, p-dimethylaminobenzoate and the like.
光聚合起始劑可為單獨1種,或合併2種以上使用。 The photopolymerization initiator may be used singly or in combination of two or more kinds.
硬殼劑(α)在含有光聚合起始劑時,光聚合起始劑的含量相對於硬殼劑固態部分總量,通常為0.01~10質量%,較佳為0.5~10質量%。 When the hard shell agent (α) contains a photopolymerization initiator, the content of the photopolymerization initiator relative to the total amount of the solid portion of the hard shell agent is usually 0.01 to 10% by mass, and preferably 0.5 to 10% by mass.
構成本發明積層體膜之硬殼體層的厚度通常為0.1~50μm,較佳為0.5~20μm。 The thickness of the hard shell layer constituting the laminated body film of the present invention is usually 0.1 to 50 μm, and preferably 0.5 to 20 μm.
構成本發明積層體膜的硬殼層,使用原子力顯微鏡測定表面楊氏係數,楊氏係數1~5GPa的區域為連續結構,且楊氏係數6~10GPa的區域為獨立分散。 The hard shell layer constituting the laminated body film of the present invention is measured with a Young's coefficient on the surface using an atomic force microscope. The area of the Young's coefficient of 1 to 5 GPa is a continuous structure, and the area of the Young's coefficient of 6 to 10 GPa is independent.
「構成楊氏係數1~5GPa的區域為連續結構」為楊氏係數1~5GPa區域形成連續一大片的部份(亦即形成海島構造中與海相同的部分)。 "The area constituting the Young's coefficient of 1 to 5 GPa is a continuous structure." The area of the Young's coefficient of 1 to 5 GPa forms a continuous large part (that is, the same part as the sea in the island structure).
「楊氏係數6~10GPa的區域為獨立分散」為楊氏係數6~10GPa的區域分散於整體中(亦即形成海島構造中與島構造相同的部分)。 "The area with a Young's coefficient of 6 to 10 GPa is independently dispersed." The area with a Young's coefficient of 6 to 10 GPa is dispersed throughout (that is, the same part of the island structure as the island structure is formed).
構成楊氏係數1~5GPa區域為連續構造的硬殼層,可有效地緩和彎曲時的應力,且具有良好的耐曲性。此外,另一方面,楊氏係數6~10GPa的區域為獨立分散時,此硬殼層對於與鉛筆等毫米級物質的接觸具有充份的硬度。 The hard shell layer constituting the Young's coefficient region of 1 to 5 GPa is a continuous structure, which can effectively reduce the stress during bending and has good bending resistance. In addition, on the other hand, when the area with a Young's coefficient of 6 to 10 GPa is independently dispersed, this hard shell layer has sufficient hardness for contact with a millimeter-level substance such as a pencil.
硬殼層表面的楊氏係數可依實施例所述的方法進行測定。 The Young's coefficient on the surface of the hard shell layer can be measured according to the method described in the examples.
楊氏係數6~10GPa的區域分別為一個一個,較佳為奈米等級。例如,在此區域內描繪正方形或長方形時,其邊長較佳為10~100nm,較佳為40~60nm。 The areas with Young's coefficients of 6 to 10 GPa are one by one, preferably nanometer grade. For example, when a square or rectangle is drawn in this area, the side length is preferably 10 to 100 nm, and more preferably 40 to 60 nm.
由以下說明,可利用調節硬殼劑(α)中成分(A)、成分(B)及成分(C)的量以有效地形成具有這些構造的硬殼層。 As described below, the amount of the component (A), the component (B), and the component (C) in the hard shell agent (α) can be used to effectively form a hard shell layer having these structures.
首先,構成硬殼劑(α)之成分(A)或成分(C)所含有的反應性官能基為可與成分(B)的巰基反應,以及與這些反應性官能基同類反應。 First, the reactive functional group contained in the component (A) or the component (C) constituting the hard shell agent (α) is capable of reacting with the mercapto group of the component (B) and reacting with these reactive functional groups in the same manner.
假使,主要是進行成分(C)之反應基同類的反應,一部份的成分(C)會凝集,無法形成具有目的構造的硬殼層。 If the reaction of the reaction group of the component (C) is mainly carried out, a part of the component (C) will agglomerate, and a hard shell layer having a desired structure cannot be formed.
然而,使用可使成分(B)之巰基與成分(A)或成分(C)之反應性官能基充分反應之成分(B)的量,可提高成分(C)的分散性。 However, the amount of the component (B) capable of sufficiently reacting the thiol group of the component (B) with the reactive functional group of the component (A) or the component (C) can improve the dispersibility of the component (C).
此外,這些反應性官能基與巰基的反應為加成反應,即使發生此反應,也不易造成硬殼層的收縮。此外,若發生超過必要的同類反應性官能基反應時,會造成局部硬化收 縮,光學特性下降,產生捲曲。 In addition, the reaction between these reactive functional groups and the mercapto group is an addition reaction, and even if this reaction occurs, it is not easy to cause the hard shell layer to shrink. In addition, if more than the necessary reactive functional groups of the same type occur, local hardening can occur. Shrinks, degrades optical characteristics, and produces curl.
對此,為進行上述反應性官能基同類的反應時,通常必須照射紫外線或電子束等活性能量束、加熱,反應性官能基與巰基的反應速度比與同類反應性官能基的反應快。然而,若有需要,可分析研究照射紫外線或電子束等活性能量束、加熱的階段,以有效地形成具有所欲特性之硬殼層。 On the other hand, in order to perform the same kind of reaction of the reactive functional group, it is usually necessary to irradiate an active energy beam such as ultraviolet rays or an electron beam and heat, and the reaction rate of the reactive functional group and the mercapto group is faster than that of the reactive functional group of the same type. However, if necessary, the active energy beam such as ultraviolet rays or electron beams can be analyzed and studied in order to effectively form a hard shell layer with desired characteristics.
因此,對應成分(A)或成分(C)所含有反應性官能基的量,使用適量的成分(B),使反應性官能基與巰基進行充分的反應,形成具有上述構造,且光學特性、耐曲性良好,不易發生捲曲的硬殼層。 Therefore, according to the amount of the reactive functional group contained in the component (A) or the component (C), using an appropriate amount of the component (B), the reactive functional group and the mercapto group are sufficiently reacted to form the above-mentioned structure, and the optical characteristics, Hard shell with good resistance to curling and less prone to curling.
本發明積層膜,例如在形成基材層的合成樹脂上,直接或透過其它層來塗佈硬殼劑(α),硬化所獲得的塗層以製造積層膜。 The laminated film of the present invention, for example, coats the hard shell agent (α) directly or through other layers on the synthetic resin forming the substrate layer, and hardens the obtained coating to produce a laminated film.
將硬殼劑塗佈在合成樹酯上的方法並無特別限制,可使用習知方法。例如滾輪塗佈、簾流塗佈、麥勒棒塗佈、反轉式塗佈、凹版塗佈、反向式凹版塗佈、氣動刮刀塗佈、接觸式塗佈、刮刀式塗佈、平滑式塗佈、滾輪刮刀塗佈等。 The method for applying the hard shell agent to the synthetic resin is not particularly limited, and a conventional method can be used. For example, roll coating, curtain flow coating, Mylar bar coating, reverse coating, gravure coating, reverse gravure coating, pneumatic blade coating, contact coating, blade coating, smoothing Coating, roller blade coating, etc.
將塗層硬化的方法並無特別限制。例如,可對塗層照射紫外線、電子束等活性能量束使塗層硬化。 The method for hardening the coating is not particularly limited. For example, the coating may be hardened by irradiating the coating with an active energy beam such as ultraviolet rays or electron beams.
紫外線照射可藉由高壓水銀燈、融合H燈、氙氣燈等進行。紫外線的照射量較佳為照度50~1000mW/cm2,照射量為50~1000mJ/cm2。此外,可利用電子束加速器來進行電子束的照射。電子束的照射量較佳為10~1000krad。 The ultraviolet irradiation can be performed by a high-pressure mercury lamp, a fusion H lamp, a xenon lamp, or the like. The irradiation amount of ultraviolet rays is preferably 50 to 1000 mW / cm 2 and the irradiation amount is 50 to 1000 mJ / cm 2 . In addition, the electron beam can be irradiated with an electron beam accelerator. The irradiation amount of the electron beam is preferably 10 to 1000 krad.
在形成硬殼層時,可在塗層硬化前或塗層硬化後 進行所需的乾燥處理。 When forming the hard shell layer, it can be before or after the coating is hardened. Perform the required drying treatment.
乾燥處理的條件並無特別限制。乾燥溫度可為,例如40~150℃,較佳為60~140℃,乾燥時間可為,例如,30秒至1小時,較佳為1~30分鐘。 The conditions for the drying treatment are not particularly limited. The drying temperature may be, for example, 40 to 150 ° C, preferably 60 to 140 ° C, and the drying time may be, for example, 30 seconds to 1 hour, preferably 1 to 30 minutes.
硬殼層可使用本發明硬殼劑形成,具有高硬度、且耐擦傷性佳。 The hard shell layer can be formed using the hard shell agent of the present invention, has high hardness, and is excellent in abrasion resistance.
構成本發明積層膜的硬殼層可依照實施例的方法以鉛筆法進行硬度評估,通常顯示F以上的硬度,較佳為H以上。 The hard shell layer constituting the laminated film of the present invention can be evaluated for hardness by a pencil method according to the method of the examples, and usually shows a hardness of F or more, preferably H or more.
構成本發明積層膜的硬殼層在依照實施例的方法進行耐擦傷性評估時,通常不會觀察到損傷。 When the hard-shell layer constituting the laminated film of the present invention is evaluated for abrasion resistance according to the method of the examples, damage is generally not observed.
本發明積層膜較佳具有良好透明性。本發明積層膜在測定全光線穿透率時,較佳為89%以上,更佳為90%以上。上限值無特別限制,通常為95%以下 The laminated film of the present invention preferably has good transparency. When measuring the total light transmittance of the laminated film of the present invention, it is preferably 89% or more, and more preferably 90% or more. There is no special upper limit, usually 95% or less
本發明積層膜較佳具有良好的耐曲性。本發明積層膜依據JIS K5600-5-1準則,進行芯軸彎曲試驗,較佳為4mmΦ以下,更佳為2mmΦ以下。 The laminated film of the present invention preferably has good bending resistance. According to the JIS K5600-5-1 standard, the laminated film of the present invention is subjected to a mandrel bending test, preferably 4 mmΦ or less, and more preferably 2 mmΦ or less.
本發明積層膜較佳曲度小。本發明積層膜依照實施例的方法來評估彎曲性,通常為75mm以下,較佳為50mm。下限值並無特別限制,通常為3.5mm以上。 The laminated film of the present invention preferably has a small curvature. The laminated film of the present invention is used to evaluate the bendability according to the method of the embodiment, which is usually 75 mm or less, preferably 50 mm. The lower limit value is not particularly limited, and is usually 3.5 mm or more.
本發明積層膜具有高硬度,且耐擦傷性及耐曲性佳的硬殼層,適合作為觸控面板的製造材料。 The laminated film of the present invention has a hard shell layer with high hardness and excellent scratch resistance and flex resistance, and is suitable as a manufacturing material of a touch panel.
以下,列舉實施例以詳細說明本發明。然而,以下實施例不可用於限定本發明, 各實施例中的部分及%若無特別說明,以質量為基準。 Hereinafter, examples are given to explain the present invention in detail. However, the following examples cannot be used to limit the present invention. Unless otherwise specified, parts and% in each example are based on quality.
實施例及比較例中所使用的化合物如下所示。 The compounds used in the examples and comparative examples are shown below.
有機矽化合物(乙烯基三乙醯氧基矽烷)溶液(A1)(堺化學社製,商品名:SHC-001B,濃度90%) Organic silicon compound (vinyl triethoxysilane) solution (A1) (manufactured by Sakai Chemical Co., Ltd., trade name: SHC-001B, concentration 90%)
聚硫醇化合物(三羥甲基丙烷三(3-巰基丙酸))溶液(B1)(堺化學社製,商品名:SHC-001A,濃度60%) Polythiol compound (trimethylolpropane tris (3-mercaptopropionic acid)) solution (B1) (manufactured by Sakai Chemical Co., Ltd., trade name: SHC-001A, concentration 60%)
無機充填物(具有丙烯醯氧基的二氧化矽奈米粒子)分散液(C1)(日產化學工業社製,商品名:AC-4130Y,濃度30%,平均粒徑40~50nm) Dispersion liquid (C1) of inorganic filler (silica dioxide particles having acryloxy group) (manufactured by Nissan Chemical Industry Co., Ltd., trade name: AC-4130Y, concentration 30%, average particle size 40-50 nm)
[實施例1] [Example 1]
混合110份的有機矽化合物溶液(A1)、150份的聚硫醇化合物(B1)、398份的無機充填物分散液(C1),以甲基乙基酮稀釋所獲得的混合液,製備固態濃度45%的硬殼劑(1)。 110 parts of an organosilicon compound solution (A1), 150 parts of a polythiol compound (B1), and 398 parts of an inorganic filler dispersion (C1) were mixed, and the obtained mixed solution was diluted with methyl ethyl ketone to prepare a solid 45% hard shell agent (1).
在一面具有底漆層的聚對苯二甲酸乙二酯膜(東洋紡績社製,商品名:PET50A4100,厚度50μm)上,使用#10麥勒棒,於底漆層上塗佈硬化後膜厚為5μm的硬殼劑(1),照射紫外線(照射量500mJ/cm2),將塗層硬化。接著將硬化塗層以120℃乾燥20分鐘,形成硬殼層,獲得積層膜(1)。 A polyethylene terephthalate film (manufactured by Toyobo Co., Ltd., trade name: PET50A4100, thickness 50 μm) with a primer layer on one side was coated with a # 10 Meyer bar to harden the film thickness on the primer layer. The hard shell agent (1) was 5 μm, and the coating was hardened by irradiating ultraviolet rays (irradiation amount 500 mJ / cm 2 ). Then, the hard-coat layer was dried at 120 ° C. for 20 minutes to form a hard shell layer to obtain a laminated film (1).
[比較例1] [Comparative Example 1]
混合110份的有機矽化合物溶液(A1)與100份的聚硫醇化合物溶液(B1),以甲基乙基酮稀釋所獲得的混合液,製備濃度50%的硬殼劑(2)。 110 parts of an organosilicon compound solution (A1) and 100 parts of a polythiol compound solution (B1) were mixed, and the obtained mixed solution was diluted with methyl ethyl ketone to prepare a hard shell agent (2) having a concentration of 50%.
除了使用硬殼劑(2)取代實施例1中的硬殼劑(1)之外,使用與實施例1相同的方式,獲得積層膜(2)。 A laminated film (2) was obtained in the same manner as in Example 1, except that the hard shell agent (2) was used instead of the hard shell agent (1) in Example 1.
[比較例2] [Comparative Example 2]
混合110份的有機矽化合物溶液(A1)、100份的聚硫醇化合物溶液(B1)、278份的無機充填物分散液(C1),以甲基乙基酮稀釋所獲得的混合液,製備濃度50%的硬殼劑(3)。 110 parts of an organosilicon compound solution (A1), 100 parts of a polythiol compound solution (B1), and 278 parts of an inorganic filler dispersion (C1) were mixed, and the obtained mixed solution was diluted with methyl ethyl ketone to prepare 50% hard shell agent (3).
除了使用硬殼劑(3)取代實施例1中的硬殼劑(1)之外,使用與實施例1相同的方式,獲得積層膜(3)。 A laminated film (3) was obtained in the same manner as in Example 1, except that the hard shell agent (3) was used instead of the hard shell agent (1) in Example 1.
[比較例3] [Comparative Example 3]
混合110份的有機矽化合物溶液(A1)、100份的聚硫醇化合物溶液(B1)、333份的無機充填物分散液(C1),以甲基乙基酮稀釋所獲得的混合液,製備濃度50%的硬殼劑(4)。 110 parts of an organosilicon compound solution (A1), 100 parts of a polythiol compound solution (B1), and 333 parts of an inorganic filler dispersion (C1) were mixed, and the obtained mixed solution was diluted with methyl ethyl ketone to prepare 50% hard shell agent (4).
除了使用硬殼劑(4)取代實施例1中的硬殼劑(1)之外,使用與實施例1相同的方式,獲得積層膜(4)。 A laminated film (4) was obtained in the same manner as in Example 1, except that the hard shell agent (4) was used instead of the hard shell agent (1) in Example 1.
[比較例4] [Comparative Example 4]
以丙二醇甲醚稀釋有機修飾矽微粒子與多官能基丙烯酸酯的混合物(JSR社製,商品名:OPSTAR-Z7530,濃度73%,含光聚合起始劑,無機充填物含量為60%),以製備濃度40%的硬殼劑(5)。 A mixture of organically modified silicon microparticles and a polyfunctional acrylate (made by JSR Corporation, trade name: OPSTAR-Z7530, 73% in concentration, containing a photopolymerization initiator, and an inorganic filler content of 60%) was diluted with propylene glycol methyl ether. A hard shell agent (5) was prepared at a concentration of 40%.
在一面具有底漆層的聚對苯二甲酸乙二酯膜(東洋紡績社製,商品名:PET50A4100,厚度50μm)上,使用#10麥勒棒,於底漆層上塗佈硬化後膜厚為5μm的硬殼劑(5),以100℃乾燥1分鐘。接著,以紫外線(照射量500mJ/cm2)照射此塗層,使塗層硬化,形成硬殼層,獲得積層膜(5)。 A polyethylene terephthalate film (manufactured by Toyobo Co., Ltd., trade name: PET50A4100, thickness 50 μm) with a primer layer on one side was coated with a # 10 Meyer bar to harden the film thickness on the primer layer. The hard shell agent (5) was 5 μm, and was dried at 100 ° C. for 1 minute. Next, this coating was irradiated with ultraviolet rays (irradiation amount 500 mJ / cm 2 ), the coating was hardened to form a hard shell layer, and a laminated film (5) was obtained.
實施例1及比較例1~4所獲得的積層膜(1)~(5)進行下列評估。結果如表1所示。 The laminated films (1) to (5) obtained in Example 1 and Comparative Examples 1 to 4 were evaluated as follows. The results are shown in Table 1.
[厚度評估] [Thickness evaluation]
使用厚度計(Nikon製,商品名:MH-15),依據JIS K7130(1999)準則,測定硬殼層的膜厚。 The thickness of the hard shell layer was measured using a thickness meter (manufactured by Nikon, trade name: MH-15) in accordance with JIS K7130 (1999).
[全光線穿透率] [Full light transmittance]
使用濁度計(日本電色社製,商品名:N-DH-2000),依據JIS K7361-1(1997)準則,測定積層膜的全光線穿透率。 The total light transmittance of the laminated film was measured using a turbidimeter (manufactured by Nippon Denshoku Corporation, trade name: N-DH-2000) in accordance with JIS K7361-1 (1997).
[鉛筆硬度] [Pencil hardness]
使用鉛筆硬度測試儀(安田精機製作所社製,商品名:No.553-M),依據JIS K5600-5-4(1999)準則,以荷重750g,移動速度0.5mm/秒,進行鉛筆硬度試驗。 A pencil hardness tester (manufactured by Yasuda Seiki Co., Ltd., trade name: No. 553-M) was used to perform a pencil hardness test at a load of 750 g and a moving speed of 0.5 mm / sec in accordance with JIS K5600-5-4 (1999).
[耐擦傷性評估] [Scratch resistance evaluation]
使用#0000鋼刷,以250g/cm2的荷重,在長50mm的範圍中反覆摩擦積層膜的硬殼層10次,之後以目視確認有無損傷,並以下列基準來評估耐擦傷性。 A # 0000 steel brush was used to repeatedly rub the hard shell layer of the laminated film 10 times in a range of 50 mm with a load of 250 g / cm 2 , and then the presence or absence of damage was visually checked, and the abrasion resistance was evaluated according to the following criteria.
○:沒有擦傷 ○: No abrasions
×:有擦傷 ×: Scratched
[耐曲性評估] [Evaluation of resistance to bending]
依據JIS K5600-5-1(1999)準則,進行芯軸彎曲試驗,評估積層膜的耐曲性。 According to JIS K5600-5-1 (1999), a mandrel bending test was performed to evaluate the bending resistance of the laminated film.
[彎曲性評估] [Bendability evaluation]
切取積層膜獲得一邊10cm的正方形,作為試驗片。將此試驗片靜置於水平台上,測定此時四角的捲曲(mm),計算出其合計值。 The laminated film was cut to obtain a square of 10 cm on one side as a test piece. This test piece was left standing on a water platform, and the curl (mm) of the four corners at this time was measured, and the total value was calculated.
[楊氏係數評估] [Young's coefficient evaluation]
使用原子力顯微鏡(AFM)測量力曲線,利用以下方法計算出硬殼層表面局部的楊氏係數。 The force curve was measured using an atomic force microscope (AFM), and the Young's coefficient on the surface of the hard shell surface was calculated by the following method.
AFM為Bruker AXS社製的Multimode 8 AFM,懸臂為Olympus公司製的OMCL-AC160TS-C2[彈簧常數(標稱值42N/m,熱搖法測定值為32.7N/m),探針前端半徑為15nm]。 AFM is Multimode 8 AFM manufactured by Bruker AXS, and the cantilever is OMCL-AC160TS-C2 [manufactured by Olympus] (spring constant (nominal value: 42N / m, measured by thermal rocking method: 32.7N / m)). 15nm].
首先,藉由測量力曲線,將懸臂壓入硬殼層,之後將懸臂從硬殼層分離,可獲得表示懸臂曲量及壓電掃描器變位量之間的關係圖(F-δ曲線)。 First, by measuring the force curve, the cantilever is pressed into the hard shell layer, and then the cantilever is separated from the hard shell layer to obtain a relationship diagram (F-δ curve) showing the cantilever curvature and the displacement of the piezoelectric scanner. .
對於F-δ曲線中的壓入過程,利用Derjaguim,Muller,Toporov,使用DMT理論進行曲線擬合,求得樣本中局部的楊氏係數E。 For the indentation process in the F-δ curve, Derjaguim, Muller, Toporov and DMT theory were used to perform curve fitting to obtain the local Young's coefficient E in the sample.
在此次測定中,測定各樣本1μm×1μm面內128點×128點(16384點)的力曲線,以及計算出楊氏係數E。 In this measurement, a force curve of 128 points × 128 points (16384 points) in the 1 μm × 1 μm plane of each sample was measured, and a Young's coefficient E was calculated.
測定結果如第1~5圖所示。 The measurement results are shown in Figures 1 to 5.
由第1~5圖及表1可知, 實施例1所獲得的積層膜(1)的硬殼層如第1圖所示,楊氏係數1~5GPa區域為連續構造,且楊氏係數6~10GPa區域為獨立分散。積層膜(1)具有良好透明性,高硬度,且耐擦傷性及耐曲性佳。 As can be seen from Figures 1 to 5 and Table 1, As shown in FIG. 1, the hard shell layer of the laminated film (1) obtained in Example 1 has a continuous structure with a Young's coefficient of 1 to 5 GPa, and a region of Young's coefficient of 6 to 10 GPa is independently dispersed. The laminated film (1) has good transparency, high hardness, and excellent scratch resistance and flex resistance.
比較佳例1所獲得的積層膜(2)的硬殼層如第2圖所示,楊氏係數1~5GPa的區域為擴大至橫跨整體。積層膜(2)雖然具良好耐曲性,但硬度低,耐擦傷性差。 As shown in FIG. 2, the hard shell layer of the laminated film (2) obtained in Comparative Example 1 has a region with a Young's coefficient of 1 to 5 GPa that extends across the entirety. Although the laminated film (2) has good bending resistance, it has low hardness and poor abrasion resistance.
比較例2、3所獲得的積層膜(3)、(4)的硬殼層如第3、4圖所示,楊氏係數6~10GPa的區域不獨立,楊氏係數6~10GPa的區域形成連續構造。具此構造之硬殼層的積層膜(3)、(4),不論是含有相同或較少的無機充填物含量,耐曲性皆不良。 The hard shell layers of the laminated films (3) and (4) obtained in Comparative Examples 2 and 3 are shown in Figs. 3 and 4. The regions with a Young's coefficient of 6 to 10 GPa are not independent. Continuous construction. The laminated films (3) and (4) of the hard shell layer having this structure have poor bending resistance regardless of whether they contain the same or less inorganic filler content.
比較例4所獲得的積層膜(5)的硬殼層如第5圖所示,整體的楊氏係數高。積層膜(5)雖然具有高硬度,且良好的耐擦傷性,但耐曲性差。 As shown in FIG. 5, the hard shell layer of the laminated film (5) obtained in Comparative Example 4 has a high Young's coefficient as a whole. Although the laminated film (5) has high hardness and good abrasion resistance, it has poor bending resistance.
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| KR (1) | KR102618670B1 (en) |
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| TWI873103B (en) * | 2018-11-07 | 2025-02-21 | 日商阪田油墨股份有限公司 | Film-forming composition, glass substrate coated with the film-forming composition, and touch panel using the glass substrate |
| TWI874312B (en) * | 2018-04-13 | 2025-03-01 | 日商東麗股份有限公司 | Laminated polyester film and method for producing the same |
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| JP2023550918A (en) * | 2020-11-26 | 2023-12-06 | スリーエム イノベイティブ プロパティズ カンパニー | Laminate and surface coating composition comprising a surface layer with scratch resistance and matte properties |
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| JP3837811B2 (en) * | 1996-07-16 | 2006-10-25 | 旭硝子株式会社 | UV-curable coating composition |
| JP2001174604A (en) * | 1999-12-21 | 2001-06-29 | Fuji Photo Film Co Ltd | Antireflection transparent electrically conductive laminated film |
| JP4860129B2 (en) * | 2004-09-01 | 2012-01-25 | 日揮触媒化成株式会社 | Coating liquid for forming transparent film and substrate with transparent film |
| JP5504605B2 (en) * | 2007-10-30 | 2014-05-28 | 大日本印刷株式会社 | Curable resin composition for hard coat layer and hard coat film |
| JPWO2010103944A1 (en) * | 2009-03-13 | 2012-09-13 | 堺化学工業株式会社 | Resin composition for forming transparent coating layer and laminate |
| KR101974478B1 (en) * | 2012-01-09 | 2019-08-26 | 삼성디스플레이 주식회사 | Transparent laminate, window panel for display device and display device including the window panel |
| US20160053130A1 (en) * | 2013-03-29 | 2016-02-25 | Lintec Corporation | Laminate, method for producing same, member for electronic device, and electronic device |
| JP6245597B2 (en) * | 2013-05-13 | 2017-12-13 | 地方独立行政法人大阪産業技術研究所 | Surface protective coating composition and substrate on which surface protective layer is formed |
| JP6348745B2 (en) * | 2014-03-26 | 2018-06-27 | リンテック株式会社 | Hard coat film, transparent conductive film, and capacitive touch panel |
| JP2015203770A (en) * | 2014-04-14 | 2015-11-16 | リンテック株式会社 | Hard coat film, coating liquid for forming hard coat layer, and method of manufacturing the hard coat film |
| CN105295082B (en) * | 2014-07-25 | 2018-10-02 | 大日本印刷株式会社 | multi-layer substrate and image display device |
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| TWI874312B (en) * | 2018-04-13 | 2025-03-01 | 日商東麗股份有限公司 | Laminated polyester film and method for producing the same |
| TWI873103B (en) * | 2018-11-07 | 2025-02-21 | 日商阪田油墨股份有限公司 | Film-forming composition, glass substrate coated with the film-forming composition, and touch panel using the glass substrate |
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| KR102618670B1 (en) | 2023-12-27 |
| CN108778732A (en) | 2018-11-09 |
| JP6937739B2 (en) | 2021-09-22 |
| WO2017150421A1 (en) | 2017-09-08 |
| CN108778732B (en) | 2021-08-06 |
| JPWO2017150421A1 (en) | 2019-02-07 |
| KR20180120189A (en) | 2018-11-05 |
| TWI730055B (en) | 2021-06-11 |
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