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TW201730116A - Water treatment system and water treatment method using osmosis membrane - Google Patents

Water treatment system and water treatment method using osmosis membrane Download PDF

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TW201730116A
TW201730116A TW106104184A TW106104184A TW201730116A TW 201730116 A TW201730116 A TW 201730116A TW 106104184 A TW106104184 A TW 106104184A TW 106104184 A TW106104184 A TW 106104184A TW 201730116 A TW201730116 A TW 201730116A
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reverse osmosis
osmosis membrane
stage
water
sterilizing agent
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TW106104184A
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Chinese (zh)
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TWI700252B (en
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鈴木雄大
中村勇規
吉川浩
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奧璐佳瑙股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D61/00Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02Reverse osmosis; Hyperfiltration ; Nanofiltration
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D61/00Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02Reverse osmosis; Hyperfiltration ; Nanofiltration
    • B01D61/025Reverse osmosis; Hyperfiltration
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D61/00Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02Reverse osmosis; Hyperfiltration ; Nanofiltration
    • B01D61/10Accessories; Auxiliary operations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D61/00Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/58Multistep processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D65/00Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/02Membrane cleaning or sterilisation ; Membrane regeneration
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/20Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/50Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/76Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)

Abstract

The invention provides a water treatment system and water treatment method that can reduce the additive amount of fungicide in a water treatment using at least two stages of reverse osmosis membranes. In a water treatment system 1 using at least a first stage, namely, first reverse osmosis membrane device 12 and a second stage, namely, second reverse osmosis membrane device 14 that treats the permeate of the first reverse osmosis membrane device 12, for conducting at least two stages of reverse osmosis membrane treatments, the concentrated water of the second reverse osmosis membrane device 14 is circulated to the supplied water of the first reverse osmosis membrane device 12 for being used, and fungicide that forms a blocking rate over 70% at the reverse osmosis membrane is added to the supplied water of the second reverse osmosis membrane device 14.

Description

利用逆滲透膜之水處理系統及水處理方法Water treatment system using reverse osmosis membrane and water treatment method

本發明關於利用逆滲透膜之水處理系統及水處理方法。The present invention relates to a water treatment system and a water treatment method using a reverse osmosis membrane.

在使用了逆滲透膜(RO膜)之水處理中,黏液的產生時常成為問題,目前係利用有機系殺菌劑的添加、或氯系殺菌劑及溴系殺菌劑的添加來因應(例如參照專利文獻1、專利文獻2)。為了提昇逆滲透膜之處理水質,要求該等殺菌劑被逆滲透膜阻隔之阻隔率高者。In the water treatment using a reverse osmosis membrane (RO membrane), the generation of mucus is often a problem, and it is currently treated with the addition of an organic bactericide or the addition of a chlorine-based bactericide and a bromine-based bactericide (for example, refer to a patent). Document 1, Patent Document 2). In order to improve the water quality of the reverse osmosis membrane, it is required that the bactericide is blocked by the reverse osmosis membrane.

又,有時會有如專利文獻3地使用2階段之逆滲透膜來實施水處理的情況。在專利文獻3之方法中,第1階段之逆滲透膜阻隔了殺菌劑之大部分,故因應第2階段之逆滲透膜之黏液,需要再次添加殺菌劑,並且於第1階段之逆滲透膜使用氯系殺菌劑,於第2階段之逆滲透膜使用鹼殺菌劑。但是,投藥點變成有2處,殺菌劑之添加量亦有增加的傾向,故裝置會複雜化且運轉成本亦上昇。 [先前技術文獻] [專利文獻]Further, there is a case where the water treatment is carried out using a two-stage reverse osmosis membrane as in Patent Document 3. In the method of Patent Document 3, the reverse osmosis membrane of the first stage blocks most of the sterilizing agent, so in order to respond to the mucus of the reverse osmosis membrane of the second stage, it is necessary to add a sterilizing agent again, and the reverse osmosis membrane in the first stage. A chlorine-based bactericide is used, and an alkali bactericide is used for the reverse osmosis membrane of the second stage. However, there are two points of administration, and the amount of the sterilizing agent added tends to increase, so that the apparatus is complicated and the running cost is also increased. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開2006-263510號公報 [專利文獻2]日本特開2015-062889號公報 [專利文獻3]日本專利第5050605號公報[Patent Document 1] JP-A-2005-062889 (Patent Document 3) Japanese Patent No. 5050605

[發明所欲解決之課題] 本發明之目的係提供一種水處理系統及一種水處理方法,其在使用2階段以上之逆滲透膜之水處理中可減少殺菌劑之添加量。 [解決課題之手段][Problems to be Solved by the Invention] An object of the present invention is to provide a water treatment system and a water treatment method which can reduce the amount of the sterilizing agent added in the water treatment using the reverse osmosis membrane of two or more stages. [Means for solving the problem]

本發明係一種水處理系統,使用2階段以上之逆滲透膜,其至少具備:第1階段之逆滲透膜裝置、處理前述第1階段之逆滲透膜裝置的逆滲透水之第2階段之逆滲透膜裝置、及使前述第2階段之逆滲透膜裝置之濃縮水循環於前述第1階段之逆滲透膜裝置之供給水中之循環構件;且在前述第2階段之逆滲透膜之供給水中,添加於逆滲透膜之阻隔率為70%以上之殺菌劑。The present invention relates to a water treatment system using a reverse osmosis membrane of two or more stages, comprising at least a reverse phase osmosis membrane device of the first stage and a second stage of reverse osmosis water of the reverse osmosis membrane apparatus of the first stage a permeable membrane device and a circulating member that circulates the concentrated water of the second-stage reverse osmosis membrane device in the feed water of the reverse osmosis membrane device of the first stage; and is added to the supply water of the reverse osmosis membrane of the second stage A bactericide having a barrier ratio of 70% or more to the reverse osmosis membrane.

在前述水處理系統中,前述於逆滲透膜之阻隔率為70%以上之殺菌劑,宜為次溴酸安定化組成物、氯胺磺酸、次氯酸、次溴酸、異噻唑酮(isothiazolone)化合物及鹵代氰乙醯胺化合物之中的至少1種。In the above water treatment system, the above-mentioned sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is preferably a hypobromous acid stabilizer composition, chloramine sulfonic acid, hypochlorous acid, hypobromous acid or thiazolone ( At least one of a compound of isothiazolone) and a halogenated cyanoacetamide compound.

在前述水處理系統中,在添加前述於逆滲透膜之阻隔率為70%以上之殺菌劑之後段,宜具備脫氣膜來實施前述第2階段之逆滲透膜的供給水之脫氣。In the water treatment system, it is preferable to provide a degassing membrane after the addition of the sterilizing agent having a barrier ratio of 70% or more to the reverse osmosis membrane to perform degassing of the supply water of the reverse osmosis membrane of the second stage.

在前述水處理系統中,前述於逆滲透膜之阻隔率為70%以上之殺菌劑宜為陰離子性之殺菌劑,且前述第2階段之逆滲透膜裝置宜具備陰離子帶電膜。In the water treatment system, the sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is preferably an anionic sterilizing agent, and the reverse osmosis membrane device of the second stage is preferably provided with an anion charged membrane.

在前述水處理系統中,前述第1階段之逆滲透膜裝置宜具備中性膜。In the water treatment system described above, the reverse osmosis membrane device of the first stage is preferably provided with a neutral membrane.

又,本發明係一種水處理方法,至少使用第1階段之逆滲透膜、及處理前述第1階段之逆滲透膜之逆滲透水之第2階段之逆滲透膜,來實施2階段以上之逆滲透膜處理,其將第2階段之逆滲透膜之濃縮水循環使用於第1階段之逆滲透膜之供給水,且在前述第2階段之逆滲透膜之供給水中,添加於逆滲透膜之阻隔率為70%以上之殺菌劑。Further, the present invention provides a water treatment method in which at least the reverse osmosis membrane of the first stage and the reverse osmosis membrane of the second stage of the reverse osmosis water of the reverse osmosis membrane of the first stage are used to carry out the reverse of two stages or more. a permeable membrane treatment which circulates the concentrated water of the reverse osmosis membrane of the second stage to the supply water of the reverse osmosis membrane of the first stage, and is added to the reverse osmosis membrane in the supply water of the reverse osmosis membrane of the second stage A bactericide with a rate of 70% or more.

在前述水處理方法中,前述於逆滲透膜之阻隔率為70%以上之殺菌劑,宜為次溴酸安定化組成物、氯胺磺酸、次氯酸、次溴酸、異噻唑酮化合物及鹵代氰乙醯胺化合物之中的至少1種。In the water treatment method, the sterilizing agent having a blocking ratio of 70% or more in the reverse osmosis membrane is preferably a hypobromous acid stabilizer composition, chloramine sulfonic acid, hypochlorous acid, hypobromous acid or oxathiazolone compound. And at least one of the halogenated cyanoacetamide compounds.

在前述水處理方法中,在添加前述於逆滲透膜之阻隔率為70%以上之殺菌劑之後段,宜使用脫氣膜來實施前述第2階段之逆滲透膜之供給水之脫氣。In the water treatment method, after the addition of the sterilizing agent having a barrier ratio of the reverse osmosis membrane of 70% or more, it is preferable to use a degassing membrane to perform degassing of the supply water of the reverse osmosis membrane of the second stage.

在前述水處理方法中,前述於逆滲透膜之阻隔率為70%以上之殺菌劑宜為陰離子性之殺菌劑,前述第2階段之逆滲透膜宜為陰離子帶電膜。In the water treatment method, the sterilizing agent having a barrier ratio of 70% or more to the reverse osmosis membrane is preferably an anionic sterilizing agent, and the reverse osmosis membrane of the second stage is preferably an anion charged membrane.

在前述水處理方法中,前述第1階段之逆滲透膜宜為中性膜。 [發明之效果]In the above water treatment method, the reverse osmosis membrane of the first stage is preferably a neutral membrane. [Effects of the Invention]

根據本發明能提供在使用2階段以上之逆滲透膜之水處理中,可減少殺菌劑之添加量之水處理系統及水處理方法。According to the present invention, it is possible to provide a water treatment system and a water treatment method which can reduce the amount of the sterilizing agent added in the water treatment using the reverse osmosis membrane of two or more stages.

針對本發明之實施形態進行以下說明。本實施形態係實施本發明之一例,本發明並非限於本實施形態。The embodiments of the present invention will be described below. This embodiment is an example of the present invention, and the present invention is not limited to the embodiment.

<水處理系統及水處理方法> 關於本發明之實施形態之水處理系統之一例之概略結構如圖1所示,針對其結構進行說明。水處理系統1具備第1階段之第1逆滲透膜裝置12、與第2階段之第2逆滲透膜裝置14。水處理系統1亦可在第1逆滲透膜裝置12之前段具備原水槽10。<Water Treatment System and Water Treatment Method> A schematic configuration of an example of a water treatment system according to an embodiment of the present invention will be described with reference to Fig. 1 . The water treatment system 1 includes a first reverse osmosis membrane device 12 of the first stage and a second reverse osmosis membrane device 14 of the second stage. The water treatment system 1 may be provided with the raw water tank 10 in the front stage of the first reverse osmosis membrane device 12.

在圖1之水處理系統1中,配管16連接於原水槽10之原水入口,原水槽10之出口與第1逆滲透膜裝置12之入口利用配管18連接。第1逆滲透膜裝置12之逆滲透水出口與第2逆滲透膜裝置14之入口利用配管20連接,配管24連接於第2逆滲透膜裝置14之逆滲透水出口。配管22連接於第1逆滲透膜裝置12之濃縮水出口,第2逆滲透膜裝置14之濃縮水出口與原水槽10之濃縮水入口利用作為循環構件之循環配管26連接。作為殺菌劑添加構件之添加殺菌劑之配管28連接於配管20。In the water treatment system 1 of Fig. 1, the pipe 16 is connected to the raw water inlet of the raw water tank 10, and the outlet of the raw water tank 10 is connected to the inlet of the first reverse osmosis membrane device 12 by a pipe 18. The reverse osmosis water outlet of the first reverse osmosis membrane device 12 is connected to the inlet of the second reverse osmosis membrane device 14 by a pipe 20, and the pipe 24 is connected to the reverse osmosis water outlet of the second reverse osmosis membrane device 14. The pipe 22 is connected to the concentrated water outlet of the first reverse osmosis membrane device 12, and the concentrated water outlet of the second reverse osmosis membrane device 14 and the concentrated water inlet of the raw water tank 10 are connected by a circulation pipe 26 as a circulation member. A pipe 28 to which a sterilizing agent is added as a sterilizing agent addition member is connected to the pipe 20.

針對關於本實施形態之水處理方法及水處理系統1之運作進行說明。The operation of the water treatment method and the water treatment system 1 of the present embodiment will be described.

為處理對象之原水通過配管16,因應需要而儲留於原水槽10後,通過配管18而輸送到第1階段之第1逆滲透膜裝置12。在第1逆滲透膜裝置12中實施第1階段之逆滲透膜處理(第1逆滲透膜處理步驟)。來自第1逆滲透膜裝置12之第1逆滲透水通過配管20而輸送到第2階段之第2逆滲透膜裝置14,第1濃縮水通過配管22而排出。The raw water to be treated is passed through the pipe 16 and stored in the raw water tank 10 as needed, and then transported to the first reverse osmosis membrane device 12 of the first stage through the pipe 18. The first reverse osmosis membrane treatment (first reverse osmosis membrane treatment step) is carried out in the first reverse osmosis membrane device 12. The first reverse osmosis water from the first reverse osmosis membrane device 12 is sent to the second reverse osmosis membrane device 14 of the second stage through the pipe 20, and the first concentrated water is discharged through the pipe 22.

在此,第2階段之第2逆滲透膜裝置14之前段,例如在配管20中,通過添加殺菌劑之配管28,在第2逆滲透膜裝置14之供給水中,添加於逆滲透膜之阻隔率為70%以上之殺菌劑(殺菌劑添加步驟)。第1階段之第1逆滲透膜裝置12之供給水中可添加殺菌劑亦可不添加殺菌劑,但宜不添加殺菌劑。第1階段之第1逆滲透膜裝置12之供給水中不添加殺菌劑,藉此可更減少殺菌劑之添加量。In the second stage of the second reverse osmosis membrane device 14 of the second stage, for example, in the pipe 20, the pipe 28 to which the sterilizing agent is added is added to the reverse osmosis membrane in the supply water of the second reverse osmosis membrane device 14. A bactericide having a rate of 70% or more (biocide addition step). In the supply water of the first reverse osmosis membrane device 12 of the first stage, a sterilizing agent may be added or a sterilizing agent may not be added, but a sterilizing agent is preferably not added. The sterilizing agent is not added to the supply water of the first reverse osmosis membrane device 12 of the first stage, whereby the amount of the sterilizing agent added can be further reduced.

在第2逆滲透膜裝置14中實施第2階段之逆滲透膜處理(第2逆滲透膜處理步驟)。來自第2逆滲透膜裝置14之第2逆滲透水通過配管24作為處理水而排出,第2濃縮水通過循環配管26而循環於第1階段之第1逆滲透膜裝置12之供給水,例如朝原水槽10循環(循環步驟)。在循環步驟中,第2濃縮水亦可循環於配管16、配管18等。The second reverse osmosis membrane treatment (second reverse osmosis membrane treatment step) is carried out in the second reverse osmosis membrane device 14. The second reverse osmosis water from the second reverse osmosis membrane device 14 is discharged as treated water through the pipe 24, and the second concentrated water is circulated through the circulation pipe 26 to the supply water of the first reverse osmosis membrane device 12 of the first stage, for example Cycle to the original water tank 10 (cycle step). In the circulation step, the second concentrated water may be circulated to the pipe 16, the pipe 18, and the like.

添加於第2逆滲透膜裝置14之供給水中之殺菌劑,其於逆滲透膜之阻隔率為70%以上,故殺菌劑之大部分會被第2階段之逆滲透膜阻隔而殘留於第2濃縮水中。在使第2階段之第2逆滲透膜裝置14之第2濃縮水循環於第1階段之第1逆滲透膜裝置12之前段之水流中,源自第2逆滲透膜裝置14之第2濃縮水之殺菌劑會混合於第1逆滲透膜裝置12之供給水(原水)中。藉此,在使用2階段以上之逆滲透膜之水處理中,可減少殺菌劑之添加量。The sterilizing agent added to the feed water in the second reverse osmosis membrane device 14 has a blocking ratio of 70% or more in the reverse osmosis membrane, so that most of the sterilizing agent is blocked by the second-stage reverse osmosis membrane and remains in the second Concentrated in water. The second concentrated water derived from the second reverse osmosis membrane device 14 is caused to circulate the second concentrated water of the second reverse osmosis membrane device 14 of the second stage in the water flow before the first reverse osmosis membrane device 12 of the first stage. The sterilizing agent is mixed in the supply water (raw water) of the first reverse osmosis membrane device 12. Thereby, in the water treatment using the reverse osmosis membrane of two or more stages, the addition amount of the bactericide can be reduced.

另外,在圖1之例中雖使用2階段之逆滲透膜,但並不限於此,藉由在使用2階段以上之逆滲透膜之水處理方法及水處理系統中,將第2階段之逆滲透膜之濃縮水循環使用於第1階段之逆滲透膜之供給水,並於第2階段之逆滲透膜之供給水中,添加於逆滲透膜之阻隔率為70%以上之殺菌劑,可減少殺菌劑之添加量。Further, although the two-stage reverse osmosis membrane is used in the example of Fig. 1, the present invention is not limited thereto, and the second stage is reversed by the water treatment method and the water treatment system using the reverse osmosis membrane of two or more stages. The concentrated water of the permeable membrane is circulated in the supply water of the reverse osmosis membrane of the first stage, and is added to the reverse osmosis membrane in the feed water of the second stage, and the sterilizing agent having a barrier ratio of 70% or more added to the reverse osmosis membrane can reduce sterilization. The amount of the agent added.

具代表性的有機系之殺菌劑即異噻唑酮化合物,其約20%會穿過逆滲透膜,即便使第2逆滲透膜裝置14之第2濃縮水循環於第1逆滲透膜裝置12之前段之水流,循環於第1逆滲透膜裝置12之前段的量仍會變少。因此,宜使用90%以上會被逆滲透膜阻隔之殺菌劑,為99%以上會被逆滲透膜阻隔之殺菌劑更為理想。A typical organic bactericide, that is, an oxathiazolone compound, is passed through a reverse osmosis membrane, and the second concentrated water of the second reverse osmosis membrane device 14 is circulated before the first reverse osmosis membrane device 12 The amount of water flowing in the previous stage of the first reverse osmosis membrane device 12 is still small. Therefore, it is preferable to use more than 90% of the bactericide which is blocked by the reverse osmosis membrane, and it is more preferable that 99% or more of the sterilizing agent which is blocked by the reverse osmosis membrane.

就剛添加殺菌劑之第2逆滲透膜裝置14而言,由於使殺菌劑成分大量循環較佳,故宜採用殺菌劑之阻隔率高的陰離子系之逆滲透膜(陰離子帶電膜)。另一方面,比殺菌劑添加點上游之第1逆滲透膜裝置12,由於殺菌劑之阻隔率較低的中性膜可將殺菌劑成分殘留到後段,故在後段之殺菌劑注入量會更減少。In the second reverse osmosis membrane device 14 to which the sterilizing agent has just been added, since the sterilizing agent component is preferably circulated in a large amount, it is preferable to use an anion-based reverse osmosis membrane (anionic charged membrane) having a high sterilizing agent. On the other hand, in the first reverse osmosis membrane device 12 upstream of the sterilizing agent addition point, since the sterilizing agent component remains in the latter stage due to the neutral membrane having a low steric agent rejection rate, the sterilizing agent injection amount in the latter stage is further increased. cut back.

如圖2所示,在第1階段之第1逆滲透膜裝置12與第2階段之第2逆滲透膜裝置14之間,更存在有生物污染顧慮之單元操作時(例如用來將二氧化碳等予以脫氣之脫氣膜30),藉由在第1階段之第1逆滲透膜裝置12與脫氣膜30等之間添加殺菌劑,可抑制該單元操作之生物污染。亦即,藉由將用來實施第2階段之第2逆滲透膜裝置14之供給水之脫氣之脫氣膜30等,配備在添加於逆滲透膜之阻隔率為70%以上之殺菌劑之後段,可抑制脫氣膜30等之生物污染。As shown in Fig. 2, between the first reverse osmosis membrane device 12 of the first stage and the second reverse osmosis membrane device 14 of the second stage, there is a unit operation of biological contamination (for example, for carbon dioxide, etc.) The degassing film 30) to be degassed can suppress the biological contamination of the operation of the unit by adding a sterilizing agent between the first reverse osmosis membrane device 12 and the degassing membrane 30 in the first stage. In other words, the degassing membrane 30 for degassing the supply water for performing the second reverse osmosis membrane device 14 of the second stage is provided with a biocide having a barrier ratio of 70% or more added to the reverse osmosis membrane. In the subsequent stage, biological contamination of the degassing film 30 or the like can be suppressed.

就第1逆滲透膜裝置12及第2逆滲透膜裝置14所使用的逆滲透膜而言,聚醯胺系高分子膜係作為主流而被使用,其有中性膜、陰離子帶電膜、及陽離子帶電膜。中性膜係指利用後述實施例所記載之動電位(zeta potential)之測量方法求得之在pH7.0的動電位為-15~5(mV)之範圍者,陰離子帶電膜係指在pH7.0的動電位未達-15(mV)者。亦可在第1逆滲透膜裝置12之逆滲透膜使用乙酸纖維素系高分子膜,在第2逆滲透膜裝置14之逆滲透膜使用聚醯胺系高分子膜。此時,也可在第1階段之第1逆滲透膜裝置12之供給水中添加次氯酸等之殺菌劑,在第2逆滲透膜裝置14之供給水中,添加於逆滲透膜之阻隔率為70%以上之殺菌劑。The reverse osmosis membrane used in the first reverse osmosis membrane device 12 and the second reverse osmosis membrane device 14 is used as a mainstream, and a neutral membrane, an anion charged membrane, and Cationic charged film. The neutral film means a range of -15 to 5 (mV) at a pH of 7.0, which is obtained by a zeta potential measurement method described in the examples below, and an anion charged film means at pH 7. The dynamic potential of .0 is less than -15 (mV). The reverse osmosis membrane of the first reverse osmosis membrane device 12 may be a cellulose acetate-based polymer membrane, and the reverse osmosis membrane of the second reverse osmosis membrane device 14 may be a polyamine-based polymer membrane. In this case, a sterilizing agent such as hypochlorous acid may be added to the supply water of the first reverse osmosis membrane device 12 of the first stage, and the barrier ratio of the reverse osmosis membrane may be added to the supply water of the second reverse osmosis membrane device 14 . More than 70% of fungicides.

作為市售之中性膜例如可列舉:OFR-625(奧璐佳瑙股份有限公司製)、BW30XFR(陶氏化學公司製)、LFC3(日東電工股份有限公司製)、TML20(東麗股份有限公司製)等。Examples of the commercially available intermediate film include: OFR-625 (manufactured by Aojia Jinan Co., Ltd.), BW30XFR (manufactured by The Dow Chemical Co., Ltd.), LFC3 (manufactured by Nitto Denko Corporation), and TML20 (Dongli Co., Ltd.) Company system) and so on.

作為市售之陰離子帶電膜例如可列舉:ES15、ES20、CPA3(以上為日東電工股份有限公司製)、RE-8040BLN(Woongjin公司製)等。Examples of the commercially available anion charged film include ES15, ES20, CPA3 (above, manufactured by Nitto Denko Corporation), RE-8040BLN (manufactured by Woongjin Co., Ltd.), and the like.

在關於本發明之實施形態之水處理方法及水處理系統中,若第1階段之第1逆滲透膜裝置12具備中性膜,第2階段之第2逆滲透膜裝置14具備陰離子帶電膜,且於逆滲透膜之阻隔率為70%以上之殺菌劑為陰離子性之殺菌劑的話,陰離子性之殺菌劑會更容易在第2階段之第2逆滲透膜裝置14(陰離子帶電膜)被阻隔,故容易在第1階段之第1逆滲透膜裝置12(中性膜)中循環。此外,陰離子性之殺菌劑容易穿過第1階段之第1逆滲透膜裝置12,而殺菌劑成分會殘留在第2階段之第2逆滲透膜裝置14之供給水中,因此更減少殺菌劑之注入量。In the water treatment method and the water treatment system according to the embodiment of the present invention, the first reverse osmosis membrane device 12 of the first stage includes a neutral membrane, and the second reverse osmosis membrane device 14 of the second stage has an anion charged membrane. When the sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is an anionic bactericide, the anionic sterilizing agent is more likely to be blocked in the second reverse osmosis membrane device 14 (anionic charged membrane) in the second stage. Therefore, it is easy to circulate in the first reverse osmosis membrane device 12 (neutral membrane) of the first stage. Further, the anionic fungicide easily passes through the first reverse osmosis membrane device 12 of the first stage, and the sterilizing agent component remains in the supply water of the second reverse osmosis membrane device 14 of the second stage, thereby further reducing the sterilizing agent. The amount injected.

處理對象水(原水)例如可舉含有甲醇、乙醇、異丙醇等之醇之含醇之水等之電子產業排水等。如此的含醇之水等之電子產業排水因產生黏液之風險高,故本實施形態相關之水處理方法及水處理系統可適合地使用在電子產業排水之脫鹽步驟等之中。The water to be treated (raw water) may, for example, be an electronic industrial drain such as an alcohol-containing water containing an alcohol such as methanol, ethanol or isopropyl alcohol. Since the electronic industry drainage such as alcohol-containing water has a high risk of generating mucus, the water treatment method and the water treatment system according to the present embodiment can be suitably used in the desalination step of the electronic industry drainage.

作為於逆滲透膜之阻隔率為70%以上之殺菌劑例如可列舉:次溴酸安定化組成物、氯胺磺酸、次氯酸、次溴酸等之陰離子性之殺菌劑;5-氯-2-甲基-4-異噻唑啉-3-酮、或2-甲基-4-異噻唑啉-3-酮等之異噻唑酮化合物;2,2-二溴-3-氮基丙醯胺等之鹵代氰乙醯胺化合物等之中性之殺菌劑等,宜為於逆滲透膜之阻隔率為80%以上之次溴酸安定化組成物、氯胺磺酸、異噻唑酮化合物、鹵代氰乙醯胺化合物,為於逆滲透膜之阻隔率為90%以上,尤其為99%以上之次溴酸安定化組成物、氯胺磺酸及鹵代氰乙醯胺化合物中之至少1個更佳。另外,在本說明書,於逆滲透膜之阻隔率係指如後述實施例使用陰離子帶電膜「ES15」(芳香族聚醯胺系陰離子帶電膜,日東電工股份有限公司製)作為逆滲透膜時之阻隔率。Examples of the bactericidal agent having a barrier ratio of 70% or more to the reverse osmosis membrane include an anionic bactericide such as a hypobromous acid stabilized composition, chloramine sulfonic acid, hypochlorous acid, or hypobromous acid; and 5-chloro a thiazolone compound such as 2-methyl-4-isothiazolin-3-one or 2-methyl-4-isothiazolin-3-one; 2,2-dibromo-3-nitropropyl A neutral bactericide such as a halogenated cyanoacetamide compound such as guanamine or the like, preferably a hypobromous acid stabilized composition having a blocking ratio of 80% or more in a reverse osmosis membrane, chloramine sulfonic acid, thiazolone The compound or the halogenated cyanoacetamide compound has a blocking ratio of 90% or more, particularly 99% or more, of the hypobromous acid stability composition, chloramine sulfonic acid and halogenated cyanoacetamide compound in the reverse osmosis membrane. At least one of them is better. In addition, in the present specification, the blocking ratio of the reverse osmosis membrane means that an anion charged film "ES15" (an aromatic polyamine-based anion charged film, manufactured by Nitto Denko Corporation) is used as a reverse osmosis membrane as described later in the examples. Barrier rate.

鹵代氰乙醯胺化合物例如為下述通式表示之化合物。 【化1】上述式中,X1 、X2 各別獨立地表示F、Cl、Br、I等之鹵素原子或氫原子,R1 表示氫原子或碳數1~3之烷基。The halocylidene compound is, for example, a compound represented by the following formula. 【化1】 In the above formula, X 1 and X 2 each independently represent a halogen atom or a hydrogen atom such as F, Cl, Br or I, and R 1 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.

<次溴酸安定化組成物> 次溴酸安定化組成物係含有「溴系氧化劑」、及「胺磺酸化合物」者,此外也可含有鹼。<Hybromobromic acid stabilized composition> The hypobromous acid stabilized composition contains a "bromine oxidizing agent" and an "amine sulfonic acid compound", and may also contain a base.

又,次溴酸安定化組成物係含有「溴系氧化劑與胺磺酸化合物之反應產物」者,此外也可含有鹼。Further, the hypobromous acid stabilized composition contains "a reaction product of a bromine-based oxidizing agent and an aminesulfonic acid compound", and may contain a base.

「胺磺酸化合物」之當量相對於「溴系氧化劑」之當量之比宜為1以上,為1以上2以下之範圍更佳。「胺磺酸化合物」之當量相對於「溴系氧化劑」之當量之比未達1的話,會有使逆滲透膜劣化之可能性,超過2的話,會有製造成本增加的情況。The ratio of the equivalent of the "amine sulfonic acid compound" to the equivalent of the "bromine oxidizing agent" is preferably 1 or more, and more preferably 1 or more and 2 or less. When the ratio of the equivalent of the "amine sulfonic acid compound" to the equivalent of the "bromine oxidizing agent" is less than 1, the reverse osmosis membrane may be deteriorated. If it exceeds 2, the production cost may increase.

作為溴系氧化劑可列舉:溴(液體溴)、氯化溴、溴酸、溴酸鹽、次溴酸等。另外,使溴化合物,與次氯酸鹽等之氯系氧化劑反應而得之「溴化合物與氯系氧化劑之反應物」亦包含於「溴系氧化劑」。Examples of the bromine-based oxidizing agent include bromine (liquid bromine), bromine chloride, bromic acid, bromate, and hypobromous acid. Further, the "bromine compound and a chlorine-based oxidizing agent" obtained by reacting a bromine compound with a chlorine-based oxidizing agent such as hypochlorite is also included in the "bromine-based oxidizing agent".

該等之中,使用了溴之「溴與胺磺酸化合物(溴與胺磺酸化合物之混合物)」或「溴與胺磺酸化合物之反應產物」之製劑比起「次氯酸與溴化合物與胺磺酸」之製劑及「氯化溴與胺磺酸」之製劑等,由於前者氯化物離子少,不會進一步使逆滲透膜劣化,造成配管等之金屬材料之腐蝕的可能性低,故較佳。Among these, the preparation of "bromine and aminesulfonic acid compound (mixture of bromine and aminesulfonic acid compound)" or "reaction product of bromine and aminesulfonic acid compound" is compared with "hypochlorous acid and bromine compound". In the preparation of the "amine sulfonic acid" and the preparation of "bromine chloride and amine sulfonic acid", since the former has less chloride ions, the reverse osmosis membrane is not further deteriorated, and the possibility of corrosion of metal materials such as pipes is low. Therefore, it is better.

作為溴化合物可列舉:溴化鈉、溴化鉀、溴化鋰、溴化銨及氫溴酸等。該等之中,考慮製劑成本等之觀點,宜為溴化鈉。Examples of the bromine compound include sodium bromide, potassium bromide, lithium bromide, ammonium bromide, and hydrobromic acid. Among these, from the viewpoint of the cost of the preparation and the like, sodium bromide is preferred.

作為氯系氧化劑例如可列舉:氯氣、二氧化氯、次氯酸或其鹽、亞氯酸或其鹽、氯酸或其鹽、過氯酸或其鹽、氯化異三聚氰酸或其鹽等。該等之中,鹽的形式例如可列舉:次氯酸鈉、次氯酸鉀等之次氯酸鹼金屬鹽;次氯酸鈣、次氯酸鋇等之次氯酸鹼土金屬鹽;亞氯酸鈉、亞氯酸鉀等之亞氯酸鹼金屬鹽;亞氯酸鋇等之亞氯酸鹼土金屬鹽;亞氯酸鎳等之其他亞氯酸金屬鹽;氯酸銨、氯酸鈉、氯酸鉀等之氯酸鹼金屬鹽;氯酸鈣、氯酸鋇等之氯酸鹼土金屬鹽等。該等氯系氧化劑可單獨使用1種,亦可將2種以上組合使用。就氯系氧化劑而言,考慮操作性等之觀點,宜使用次氯酸鈉。Examples of the chlorine-based oxidizing agent include chlorine gas, chlorine dioxide, hypochlorous acid or a salt thereof, chlorous acid or a salt thereof, chloric acid or a salt thereof, perchloric acid or a salt thereof, and isocyanuric acid chloride or Salt and so on. Among these, examples of the salt form include alkali metal hypochlorites such as sodium hypochlorite and potassium hypochlorite; and alkali metal hypochlorites such as calcium hypochlorite and barium hypochlorite; sodium chlorite and sub An alkali metal chlorite such as potassium chlorate; an alkaline earth metal salt of chlorite such as bismuth chlorite; other metal chlorite such as nickel chlorite; chloric acid such as ammonium chlorate, sodium chlorate or potassium chlorate An alkali metal salt; an alkaline earth metal salt of chloric acid such as calcium chlorate or barium chlorate. These chlorine-based oxidizing agents may be used alone or in combination of two or more. As for the chlorine-based oxidizing agent, sodium hypochlorite is preferably used in view of operability and the like.

胺磺酸化合物係以下通式(1)表示之化合物。 R2 NSO3 H   (1) 式中,R係獨立地為氫原子或碳數1~8之烷基。The aminesulfonic acid compound is a compound represented by the following formula (1). R 2 NSO 3 H (1) wherein R is independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.

作為胺磺酸化合物例如除了可例舉2個R基之兩者均為氫原子之胺磺酸(磺醯胺酸)之外,亦可列舉:N-甲基胺磺酸、N-乙基胺磺酸、N-丙基胺磺酸、N-異丙基胺磺酸、N-丁基胺磺酸等之2個R基其中一者為氫原子,另一者為碳數1~8之烷基之胺磺酸化合物;N,N-二甲基胺磺酸、N,N-二乙基胺磺酸、N,N-二丙基胺磺酸、N,N-二丁基胺磺酸、N-甲基-N-乙基胺磺酸、N-甲基-N-丙基胺磺酸等之2個R基之兩者為碳數1~8之烷基之胺磺酸化合物;N-苯基胺磺酸等之2個R基之其中一者為氫原子,另一者為碳數6~10之芳基之胺磺酸化合物、或該等之鹽等。作為胺磺酸鹽例如可列舉:鈉鹽、鉀鹽等之鹼金屬鹽;鈣鹽、鍶鹽、鋇鹽等之鹼土金屬鹽;錳鹽、銅鹽、鋅鹽、鐵鹽、鈷鹽、鎳鹽等之其他金屬鹽;銨鹽及胍鹽等。胺磺酸化合物及該等之鹽可單獨使用1種,亦可將2種以上組合使用。就胺磺酸化合物而言,考慮環境負荷等之觀點,宜使用胺磺酸(磺醯胺酸)。Examples of the amine sulfonic acid compound include, for example, an aminesulfonic acid (sulfonamide) in which both of the two R groups are hydrogen atoms, and N-methylaminesulfonic acid and N-ethyl are also exemplified. One of the two R groups of aminesulfonic acid, N-propylaminesulfonic acid, N-isopropylaminesulfonic acid, N-butylaminesulfonic acid, etc. is a hydrogen atom, and the other is a carbon number of 1-8. Alkyl amine sulfonic acid compound; N,N-dimethylamine sulfonic acid, N,N-diethylamine sulfonic acid, N,N-dipropylamine sulfonic acid, N,N-dibutylamine Two of the R groups such as sulfonic acid, N-methyl-N-ethylamine sulfonic acid, and N-methyl-N-propylamine sulfonic acid are amine sulfonic acids having an alkyl group of 1 to 8 carbon atoms. The compound; one of the two R groups of N-phenylamine sulfonic acid or the like is a hydrogen atom, and the other is an aminesulfonic acid compound having an aryl group having 6 to 10 carbon atoms, or the like. Examples of the amine sulfonate include an alkali metal salt such as a sodium salt or a potassium salt; an alkaline earth metal salt such as a calcium salt, a barium salt or a barium salt; a manganese salt, a copper salt, a zinc salt, an iron salt, a cobalt salt, and a nickel. Other metal salts such as salt; ammonium salts and barium salts. The amine sulfonic acid compound and the salt may be used singly or in combination of two or more kinds. As the amine sulfonic acid compound, an aminesulfonic acid (sulfonic acid) is preferably used from the viewpoint of environmental load and the like.

作為鹼可列舉:氫氧化鈉、氫氧化鉀等之氫氧化鹼等。考慮低溫時之產品安定性等之觀點,也可併用氫氧化鈉與氫氧化鉀。又,鹼也可不使用固體而使用水溶液形式。Examples of the base include a hydroxide base such as sodium hydroxide or potassium hydroxide. From the viewpoint of product stability at a low temperature, etc., it is also possible to use sodium hydroxide and potassium hydroxide in combination. Further, the base may be used in the form of an aqueous solution without using a solid.

就次溴酸安定化組成物而言,因不使聚醯胺系之逆滲透膜等進一步劣化而有效鹵素滲漏到RO逆滲透水之滲漏量更少,故宜為:含有溴與胺磺酸化合物者(含有溴與胺磺酸化合物之混合物者),例如溴與胺磺酸化合物與鹼與水之混合物;或含有溴與胺磺酸化合物之反應產物者,例如溴與胺磺酸化合物之反應產物與鹼與水之混合物。In the case of the hypobromous acid stabilized composition, since the polyamine-based reverse osmosis membrane or the like is further deteriorated and the effective leakage of the halogen into the RO reverse osmosis water is less, it is preferable to contain bromine and an amine. a sulfonic acid compound (containing a mixture of bromine and amine sulfonic acid compounds), such as a mixture of a bromine and amine sulfonic acid compound with a base and water; or a reaction product containing a bromine and an amine sulfonic acid compound, such as bromine and amine sulfonic acid. A reaction product of the compound and a mixture of a base and water.

次溴酸安定化組成物雖然具有殺菌效果,但不像次氯酸等會造成膜劣化,次溴酸安定化組成物幾乎不會造成膜劣化。在一般的使用濃度可實質上無視對膜劣化之影響。因此,作為殺菌劑最適合。Although the hypobromous acid stabilized composition has a bactericidal effect, unlike the hypochlorous acid or the like, the film is deteriorated, and the hypobromous acid stabilized composition hardly causes the film to deteriorate. The effect on film degradation can be substantially ignored in general use concentrations. Therefore, it is most suitable as a bactericide.

次溴酸安定化組成物與次氯酸等不同,次溴酸安定化組成物幾乎不會穿過逆滲透膜等,故幾乎不會對處理水水質造成影響。又,與次氯酸等同樣地可在現場測量濃度,故能更正確進行濃度管理。Unlike the hypobromous acid stabilized composition and hypochlorous acid, the hypobromous acid stabilized composition hardly passes through the reverse osmosis membrane and the like, so that the treated water quality is hardly affected. Further, the concentration can be measured on site in the same manner as hypochlorous acid or the like, so that concentration management can be performed more accurately.

次溴酸安定化組成物之pH例如為超過13.0,為超過13.2更佳。組成物之pH為13.0以下的話,會有組成物中之有效鹵素變得不安定之情況。The pH of the hypobromous acid stabilized composition is, for example, more than 13.0, more preferably more than 13.2. When the pH of the composition is 13.0 or less, the effective halogen in the composition may become unstable.

次溴酸安定化組成物中之溴酸濃度宜未達5mg/kg。次溴酸安定化組成物中之溴酸濃度為5mg/kg以上的話,會有RO逆滲透水等之溴酸離子之濃度變高的情況。The concentration of bromic acid in the stabilized composition of hypobromous acid is preferably less than 5 mg/kg. When the concentration of the bromic acid in the stabilized composition of the bromic acid is 5 mg/kg or more, the concentration of the bromate ion such as RO reverse osmosis water may increase.

<次溴酸安定化組成物之製造方法> 次溴酸安定化組成物可藉由將溴系氧化劑與胺磺酸化合物混合而得,此外也可混合鹼。<Method for Producing Hypobromide Stabilizing Composition> The hypobromous acid stabilized composition can be obtained by mixing a bromine-based oxidizing agent with an aminesulfonic acid compound, or a base can be mixed.

作為含有溴及胺磺酸化合物之次溴酸安定化組成物、或含有溴與胺磺酸化合物之反應產物之次溴酸安定化組成物之製造方法,宜含有以下步驟:將溴在鈍性氣體環境下添加到含有水、鹼及胺磺酸化合物之混合液並使其反應;或將溴在鈍性氣體環境下添加到含有水、鹼及胺磺酸化合物之混合液中。藉由在鈍性氣體環境下添加並使其反應、或在鈍性氣體環境下添加,組成物中之溴酸離子濃度會變低且RO逆滲透水等中之溴酸離子濃度會變低。The method for producing a hypobromous acid stabilized composition containing a brominated or aminesulfonic acid compound or a reaction product containing a reaction product of bromine and an aminesulfonic acid compound preferably comprises the following steps: blunting the bromine It is added to a mixture containing water, a base and an aminesulfonic acid compound in a gaseous environment and reacted; or bromine is added to a mixed liquid containing water, a base and an aminesulfonic acid compound in a passive gas atmosphere. By adding and reacting in a passive gas atmosphere or adding it in a passive gas atmosphere, the concentration of bromate ions in the composition becomes low and the concentration of bromate ions in the reverse osmosis water or the like becomes low.

作為使用的鈍性氣體並無限制,考量製造等方面,宜為氮氣及氬氣中之至少1種,尤其考量製造成本等方面,宜為氮氣。The passive gas to be used is not limited, and it is preferably at least one of nitrogen gas and argon gas in consideration of production and the like, and in particular, nitrogen gas is preferable in terms of production cost and the like.

添加溴時反應器內之氧濃度宜為6%以下,為4%以下更佳,為2%以下再更佳,為1%以下特佳。溴反應時反應器內之氧濃度超過6%的話,會有反應系統內之溴酸的生成量增加之情況。When the bromine is added, the oxygen concentration in the reactor is preferably 6% or less, more preferably 4% or less, still more preferably 2% or less, and particularly preferably 1% or less. When the oxygen concentration in the reactor at the time of bromine reaction exceeds 6%, the amount of bromic acid generated in the reaction system may increase.

溴的添加率相對於組成物整體之量,宜為25重量%以下,為1重量%以上20重量%以下更佳。溴的添加率相對於組成物整體之量若超過25重量%的話,會有反應系統內之溴酸的生成量增加之情況。若未達1重量%的話,會有改質效果不良的情況。The addition ratio of bromine is preferably 25% by weight or less based on the total amount of the composition, and more preferably 1% by weight or more and 20% by weight or less. When the addition ratio of bromine exceeds 25% by weight based on the total amount of the composition, the amount of bromic acid generated in the reaction system may increase. If it is less than 1% by weight, the modification effect may be poor.

添加溴時的反應溫度宜控制在0℃以上25℃以下之範圍內,考量製造成本等方面,控制在0℃以上15℃以下之範圍內更佳。添加溴時之反應溫度若超過25℃的話,會有反應系統內之溴酸的生成量增加之情況,或未達0℃的話,會有結凍的情況。 [實施例]The reaction temperature at the time of adding bromine is preferably controlled within a range of from 0 ° C to 25 ° C, and it is more preferable to control the production cost in the range of from 0 ° C to 15 ° C. When the reaction temperature at the time of adding bromine exceeds 25 ° C, the amount of bromic acid generated in the reaction system may increase, or if it does not reach 0 ° C, it may be frozen. [Examples]

以下,舉實施例及比較例更具體地詳細說明本發明,但本發明並非受限於以下實施例。Hereinafter, the present invention will be described in more detail by way of examples and comparative examples, but the invention is not limited by the following examples.

<實施例1及比較例1、2> 實施例1係使用圖1之水處理系統、比較例1係使用圖3之習知的水處理系統來實施試驗。圖3之習知的水處理系統5中,用來將殺菌劑添加到第1階段之第1逆滲透膜裝置12之供給水中之添加殺菌劑之配管32係連接於配管18。針對如圖1地從添加殺菌劑之配管28以1點(投藥點2)實施殺菌劑之添加(投藥)的情況、與如圖3地從添加殺菌劑之配管32及添加殺菌劑之配管28以2點(各別之投藥點1及投藥點2)實施殺菌劑之添加(投藥)的情況,如表1所示地變換殺菌劑之種類同時比較已添加的殺菌劑(藥劑)之量。殺菌劑係設定成在逆滲透膜之前方成為3mg/L以上。作為第1階段及第2階段之逆滲透膜,使用陰離子帶電膜即日東電工公司製之逆滲透膜「ES15」。供給水量Q定為純水200L/h,第1階段逆滲透膜之回收率定為50%,第2階段逆滲透膜之回收率定為90%。<Example 1 and Comparative Examples 1 and 2> Example 1 was carried out by using the water treatment system of Fig. 1 and Comparative Example 1 using the conventional water treatment system of Fig. 3. In the conventional water treatment system 5 of FIG. 3, the pipe 32 to which the sterilizing agent is added to the supply water of the first reverse osmosis membrane device 12 of the first stage is connected to the pipe 18. In the case where the sterilizing agent is added (administered) at one point (dosing point 2) from the pipe 28 to which the sterilizing agent is added as shown in Fig. 1, and the pipe 32 from which the sterilizing agent is added and the pipe 28 to which the sterilizing agent is added, as shown in Fig. 3 When the addition (dosing) of the sterilizing agent was carried out at two points (each of the dispensing points 1 and 2), the types of the sterilizing agent were changed as shown in Table 1, and the amount of the sterilizing agent (agent) added was compared. The bactericide is set to be 3 mg/L or more in front of the reverse osmosis membrane. As the reverse osmosis membrane of the first stage and the second stage, a reverse osmosis membrane "ES15" manufactured by Nitto Denko Corporation is used as an anion charged film. The amount of supplied water Q was set to 200 L/h of pure water, the recovery rate of the reverse osmosis membrane of the first stage was set to 50%, and the recovery rate of the reverse osmosis membrane of the second stage was set to 90%.

[逆滲透膜之動電位之測量] 逆滲透膜之動電位使用大塚電子股份有限公司製,動電位-粒徑測量系統ELSZseries求得。逆滲透膜之動電位係利用測量而得的電滲透圖,由下述森・岡本之算式及Smoluchowski之算式計算而得。[Measurement of the dynamic potential of the reverse osmosis membrane] The potential of the reverse osmosis membrane was determined by the ELSZseries, a dynamic potential-particle size measurement system manufactured by Otsuka Electronics Co., Ltd. The electrokinetic map of the reverse osmosis membrane is calculated from the following equations of Mori Okamoto and Smoluchowski.

(森・岡本之算式) Uobs (z)=AU0 (z/b)2 +ΔU0 (z/b)+(1-A)U0 +Up 在此, z:距試驗槽(cell)中心位置之距離 Uobs (z):在試驗槽中之z位置的表觀移動度 A:1/[(2/3)-(0.420166/K)] K=a/b:2a與2b係試驗槽剖面之橫與縱之長度,a>b Up :粒子真實移動度 U0 :在試驗槽之頂面、底面的平均移動度 ΔU0 :在試驗槽之頂面、底面的移動度差 (Smoluchowski之算式) ζ=4πηU/ε 在此, U:電氣移動度 ε:溶劑之介電常數 η:溶劑之黏度(Mori Okamoto's formula) U obs (z)=AU 0 (z/b) 2 +ΔU 0 (z/b)+(1-A)U 0 +U p here, z: from the center of the test cell Position distance U obs (z): apparent mobility at the z position in the test cell A: 1/[(2/3)-(0.420166/K)] K=a/b: 2a and 2b test slots The transverse and longitudinal lengths of the profile, a>b U p : the true mobility of the particles U 0 : the average mobility ΔU 0 on the top and bottom of the test slot: the difference in mobility between the top and bottom of the test slot (Smoluchowski算=4πηU/ε Here, U: electrical mobility ε: dielectric constant of solvent η: viscosity of solvent

使用10mM NaCl水溶液(pH約5.4)作為測量液。針對各樣本準備2組成對之該水溶液與樣本,將其中一者的pH調整為酸性(pH2、3、4、5、6、7),將另一者的pH調整為鹼性(pH8、9),測量在各pH中的動電位。溶劑之物性值使用在25℃的純水之值(折射率:1.3328,黏度:0.8878,介電常數:78.3)。A 10 mM aqueous NaCl solution (pH about 5.4) was used as a measuring solution. Prepare 2 pairs of the aqueous solution and sample for each sample, adjust the pH of one of them to be acidic (pH 2, 3, 4, 5, 6, 7), and adjust the pH of the other to alkaline (pH 8, 9) ), measuring the potential at each pH. The physical property value of the solvent was the value of pure water at 25 ° C (refractive index: 1.3328, viscosity: 0.8878, dielectric constant: 78.3).

[殺菌劑於逆滲透膜之阻隔率的評價] 針對如表1所示之摻合組成之各殺菌劑,使用平板膜試驗裝置,以下述條件實施殺菌劑於逆滲透膜之阻隔率之評價。[Evaluation of Barrier Rate of Fungicide in Reverse Osmosis Membrane] With respect to each of the sterilizing agents having the blending compositions shown in Table 1, the flat membrane test apparatus was used to evaluate the barrier ratio of the sterilizing agent to the reverse osmosis membrane under the following conditions.

(試驗條件) 試驗裝置:平板膜試驗裝置(參照圖4) 平板膜槽:Membrane master C70-F流動式平板膜試驗槽 平板膜種類:陰離子帶電膜「ES15」(芳香族聚醯胺系陰離子帶電膜,低壓RO膜,日東電工股份有限公司製) 平板膜徑:直徑75mm 試驗水:超純水 試驗水pH:7.0(添加下述各殺菌劑後,以鹽酸、氫氧化鈉調整) 試驗水量:50L 試驗水溫:25℃±1℃ 供給壓力:0.75MPa 試驗水量:5L/min 評價殺菌劑:參照表1 殺菌劑濃度:3mg/L(Test conditions) Test apparatus: flat membrane test apparatus (refer to Fig. 4) Flat membrane tank: Membrane master C70-F flow type flat membrane test tank Flat membrane type: anion charged membrane "ES15" (aromatic polyamine-based anion charged Membrane, low pressure RO membrane, manufactured by Nitto Denko Co., Ltd.) Flat membrane diameter: 75 mm in diameter Test water: Ultrapure water test water pH: 7.0 (adjusted with hydrochloric acid and sodium hydroxide after adding each of the following fungicides) Test water volume: 50L test water temperature: 25°C±1°C Supply pressure: 0.75MPa Test water volume: 5L/min Evaluation fungicide: Refer to Table 1 Biocide concentration: 3mg/L

(試驗方法) 將各殺菌劑添加於試驗水並實施pH調整後循環30分鐘,於其後將各逆滲透水充分吹氣後,取樣原水、逆滲透水並實施殺菌劑濃度之測量,算出阻隔率。殺菌劑係直接添加於水槽中使其成為3mg/L。(Test method) Each sterilizing agent was added to the test water, pH adjustment was performed, and the mixture was circulated for 30 minutes. Thereafter, each reverse osmosis water was sufficiently blown, and then raw water and reverse osmosis water were sampled, and the concentration of the sterilizing agent was measured to calculate the barrier. rate. The bactericide was added directly to the water tank to make it 3 mg/L.

各別之殺菌劑於逆滲透膜之阻隔率係利用下式求得。 於逆滲透膜之阻隔率(%)=(供給水之殺菌劑濃度-逆滲透水之殺菌劑濃度)/(供給水之殺菌劑濃度)×100The barrier ratio of each bactericide to the reverse osmosis membrane was determined by the following formula. The barrier ratio (%) of the reverse osmosis membrane = (concentration of the sterilizing agent supplied to the water - the concentration of the sterilizing agent of the reverse osmosis water) / (the concentration of the sterilizing agent supplied to the water) × 100

[次溴酸安定化組成物之調製] 在氮氣環境下混合液體溴:16.9重量%(wt%)、胺磺酸:10.7重量%、氫氧化鈉:12.9重量%、氫氧化鉀:3.94重量%、剩餘部分為水,製得次溴酸安定化組成物。次溴酸安定化組成物之pH為14,有效鹵素濃度(按有效氯換算之濃度)為7.5重量%。次溴酸安定化組成物之詳細的調製方法如下所述。[Preparation of hypobromous acid stability composition] Liquid bromine was mixed under a nitrogen atmosphere: 16.9 wt% (wt%), aminesulfonic acid: 10.7 wt%, sodium hydroxide: 12.9 wt%, potassium hydroxide: 3.94 wt% The remaining part is water, and a hypobromous acid stability composition is obtained. The pH of the hypobromous acid stabilized composition was 14, and the effective halogen concentration (concentration in terms of available chlorine) was 7.5% by weight. The detailed preparation method of the hypobromous acid stability composition is as follows.

以使反應容器內之氧濃度維持在1%之方式,邊將氮氣之流量以質量流量控制器(mass flow controller)進行控制,邊以連續輸注方式將1436g之水、361g之氫氧化鈉添加於密封之2L之4口燒瓶中並混合,然後添加300g之胺磺酸並混合後,在以使反應液之溫度成為0~15℃的方式維持冷卻的情況下,添加473g之液體溴,再添加48%氫氧化鉀溶液230g,按相對於組成物整體的量之重量比計算,胺磺酸為10.7%、溴為16.9%,胺磺酸相對於溴的當量之當量比為1.04,獲得目的之次溴酸安定化組成物。生成的溶液之pH以玻璃電極法測量,於此時點為14。生成的溶液之含溴率係利用將溴以碘化鉀轉換成碘後,使用硫代硫酸鈉進行氧化還原滴定之方法測量,於此時點為16.9%,為理論含有率(16.9%)的100.0%。又,溴反應時的反應容器內之氧濃度使用JICO股份有限公司製之「Oxygen monitor JKO-02 LJDII」進行測量。另外,溴酸濃度未達5mg/kg。In order to maintain the oxygen concentration in the reaction vessel at 1%, the flow rate of nitrogen gas was controlled by a mass flow controller, and 1436 g of water and 361 g of sodium hydroxide were added by continuous infusion. The sealed 2 L four-necked flask was mixed, and after adding 300 g of the amine sulfonic acid and mixing, and maintaining the temperature of the reaction liquid at 0 to 15 ° C, 473 g of liquid bromine was added, and then added. 230 g of 48% potassium hydroxide solution, based on the weight ratio of the total amount of the composition, the aminesulfonic acid was 10.7%, the bromine was 16.9%, and the equivalent ratio of the aminesulfonic acid to the equivalent of bromine was 1.04, and the purpose was obtained. Hypobromide stabilizes the composition. The pH of the resulting solution was measured by the glass electrode method and was 14 at this point. The bromine content of the resulting solution was measured by a method in which bromine was converted into iodine by potassium iodide and then subjected to redox titration using sodium thiosulfate. At this point, it was 16.9%, which was 100.0% of the theoretical content (16.9%). In addition, the oxygen concentration in the reaction vessel at the time of the bromine reaction was measured using "Oxygen monitor JKO-02 LJDII" manufactured by JICO Co., Ltd. In addition, the concentration of bromic acid did not reach 5 mg/kg.

【表1】 【Table 1】

[實施例1-1及比較例1-1] 在實施例1-1及比較例1-1係添加次溴酸安定化組成物(陰離子性)作為殺菌劑。此時測量次溴酸安定化組成物於逆滲透膜之阻隔率(RO阻隔率),於此時點係為99.1%。[Example 1-1 and Comparative Example 1-1] In Example 1-1 and Comparative Example 1-1, a hypobromous acid stabilized composition (anionic) was added as a bactericidal agent. At this time, the blocking ratio (RO blocking ratio) of the hypobromous acid stabilizer composition to the reverse osmosis membrane was measured, and the point system was 99.1% at this time.

在比較例1-1中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=21.5g/d。然後,在實施例1-1中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為14.5g/d,殺菌劑濃度C2為6.1mg/L(>3mg/L)。比起比較例1-1,實施例1-1之殺菌劑之添加量減少了7.0g/d。結果如表2所示。In Comparative Example 1-1, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2, so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added is X1 + X2 = 21.5 g / d. Then, in Example 1-1, the sterilizing agent was added from the dosing point 2 so that the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 14.5. g/d, bactericide concentration C2 was 6.1 mg / L (> 3 mg / L). The amount of the bactericide added in Example 1-1 was reduced by 7.0 g/d as compared with Comparative Example 1-1. The results are shown in Table 2.

[實施例1-2及比較例1-2] 實施例1-2及比較例1-2係添加異噻唑酮(中性)作為殺菌劑。使用製劑中含有異噻唑酮化合物之殺菌劑即KATHON(註冊商標)WT(陶氏化學公司製)。此時,測量異噻唑酮於逆滲透膜之阻隔率,於此時點係為81.8%。[Example 1-2 and Comparative Example 1-2] In Example 1-2 and Comparative Example 1-2, oxathiazolone (neutral) was added as a bactericide. KATHON (registered trademark) WT (manufactured by The Dow Chemical Co., Ltd.) which is a bactericide containing an thiazolone compound in the preparation is used. At this time, the barrier ratio of the thiazolone to the reverse osmosis membrane was measured, and the point system was 81.8% at this time.

在比較例1-2中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=20.3g/d。然後,在實施例1-2中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為16.1mg/L,殺菌劑濃度C2為7.3mg/L(>3mg/L)。比起比較例1-2,實施例1-2之殺菌劑之添加量減少了4.2g/d。結果如表2所示。In Comparative Example 1-2, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2, so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added is X1 + X2 = 20.3 g / d. Then, in Example 1-2, the sterilizing agent was added from the dosing point 2 so that the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 16.1. Mg/L, bactericide concentration C2 is 7.3 mg / L (> 3 mg / L). The amount of the bactericide added in Example 1-2 was reduced by 4.2 g/d as compared with Comparative Example 1-2. The results are shown in Table 2.

[實施例1-3及比較例1-3] 實施例1-3及比較例1-3係添加次氯酸(陰離子性)作為殺菌劑。此時,測量次氯酸於逆滲透膜之阻隔率,於此時點係為71.0%。[Example 1-3 and Comparative Example 1-3] Examples 1-3 and Comparative Example 1-3 were added with hypochlorous acid (anionic) as a bactericide. At this time, the blocking ratio of hypochlorous acid to the reverse osmosis membrane was measured, and at this point, the system was 71.0%.

在比較例1-3中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=19.5g/d。然後,在實施例1-3中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為17.8g/d,殺菌劑濃度C2為8.3mg/L(>3mg/L)。比起比較例1-3,實施例1-3之殺菌劑之添加量減少了1.7g/d。結果如表2所示。In Comparative Example 1-3, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2, so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added was X1 + X2 = 19.5 g / d. Then, in Example 1-3, the sterilizing agent was added from the dosing point 2 so that the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 17.8. g/d, bactericide concentration C2 is 8.3 mg / L (> 3 mg / L). The amount of the bactericide added in Examples 1-3 was reduced by 1.7 g/d as compared with Comparative Example 1-3. The results are shown in Table 2.

[實施例1-4及比較例1-4] 實施例1-4及比較例1-4係使用鹵代氰乙醯胺化合物作為殺菌劑。此時測量鹵代氰乙醯胺化合物於逆滲透膜之阻隔率,於此時點係為97.0%。[Examples 1-4 and Comparative Examples 1-4] Examples 1-4 and Comparative Examples 1-4 used a halogenated cyanoacetamide compound as a bactericide. At this time, the blocking ratio of the halocylidene compound to the reverse osmosis membrane was measured, and at this point, the system was 97.0%.

在比較例1-4中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=21.4g/d。然後,在實施例1-4中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為14.6g/d,殺菌劑濃度C2為6.2mg/L(>3mg/L)。比起比較例1-4,實施例1-4之殺菌劑添加量減少了6.8g/d。結果如表2所示。In Comparative Example 1-4, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2 so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added was X1 + X2 = 21.4 g / d. Then, in Example 1-4, the sterilizing agent was added from the dosing point 2, and the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 14.6. g/d, bactericide concentration C2 is 6.2 mg / L (> 3 mg / L). The amount of the bactericide added in Examples 1-4 was reduced by 6.8 g/d as compared with Comparative Examples 1-4. The results are shown in Table 2.

[比較例2-1及比較例2-2] 比較例2-1及比較例2-2係添加氯胺(陰離子性)作為殺菌劑。此時測量氯胺於逆滲透膜之阻隔率,於此時點係為10.2%。[Comparative Example 2-1 and Comparative Example 2-2] Comparative Example 2-1 and Comparative Example 2-2 were added with chloramine (anionic) as a bactericidal agent. At this time, the blocking ratio of chloramine to the reverse osmosis membrane was measured, and the point system was 10.2% at this time.

在比較例2-2中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=15.1g/d。然後,在比較例2-1中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為91.5g/d,殺菌劑濃度C2為40.8mg/L(>3mg/L)。比起比較例2-2,比較例2-1之殺菌劑之添加量增加了76.4g/d。結果如表2所示。In Comparative Example 2-2, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2, so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added was X1 + X2 = 15.1 g / d. Then, in Comparative Example 2-1, the sterilizing agent was added from the dosing point 2, and the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 91.5. g/d, the bactericide concentration C2 was 40.8 mg/L (>3 mg/L). The amount of the bactericide added in Comparative Example 2-1 was increased by 76.4 g/d as compared with Comparative Example 2-2. The results are shown in Table 2.

【表2】 【Table 2】

<實施例2及比較例3> 實施例2係使用圖1之水處理系統,比較例3係使用圖3之習知的水處理系統,並使用氯胺磺酸(陰離子性)作為殺菌劑實施試驗。<Example 2 and Comparative Example 3> Example 2 uses the water treatment system of Fig. 1, and Comparative Example 3 uses the conventional water treatment system of Fig. 3, and uses chloramine sulfonic acid (anionic) as a bactericide. test.

[實施例2-1及比較例3-1] 在實施例2-1及比較例3-1中,使用陰離子帶電膜即日東電工公司製之逆滲透膜「ES20」作為第1階段及第2階段之逆滲透膜。此時測量氯胺磺酸於逆滲透膜之阻隔率,於此時點係為99.6%。[Example 2-1 and Comparative Example 3-1] In Example 2-1 and Comparative Example 3-1, the reverse osmosis membrane "ES20" manufactured by Nitto Denko Corporation was used as the first stage and the second stage. Reverse osmosis membrane at the stage. At this time, the blocking ratio of chloramine sulfonic acid to the reverse osmosis membrane was measured, and the point system was 99.6% at this time.

在比較例3-1中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=21.6g/d。然後,在實施例2-1中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為14.4g/d,殺菌劑濃度C2為6.0mg/L(>3mg/L)。比起比較例3-1,實施例2-1之殺菌劑之添加量減少了7.2g/d。結果如表3所示。In Comparative Example 3-1, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2, so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added was X1 + X2 = 21.6 g / d. Then, in Example 2-1, the sterilizing agent was added from the dosing point 2 so that the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 14.4. g/d, bactericide concentration C2 is 6.0 mg / L (> 3 mg / L). The amount of the bactericide added in Example 2-1 was reduced by 7.2 g/d as compared with Comparative Example 3-1. The results are shown in Table 3.

[實施例2-2及比較例3-2] 在實施例2-2及比較例3-2中,使用陰離子帶電膜即日東電工公司製之逆滲透膜「ES20」作為第1階段之逆滲透膜,並使用中性膜即日東電工公司製「LFC3」作為第2階段之逆滲透膜。此時測量氯胺磺酸於逆滲透膜之阻隔率,於此時點係為97.9%。[Example 2-2 and Comparative Example 3-2] In Example 2-2 and Comparative Example 3-2, the reverse osmosis membrane "ES20" manufactured by Nitto Denko Corporation was used as the reverse osmosis of the first stage. As the membrane, a neutral membrane, "LFC3" manufactured by Nitto Denko Corporation, was used as the second-stage reverse osmosis membrane. At this time, the barrier ratio of chloramine sulfonic acid to the reverse osmosis membrane was measured, and the point system was 97.9% at this time.

在比較例3-2中,從投藥點1以殺菌劑濃度C1添加殺菌劑,從投藥點2以殺菌劑濃度C2添加殺菌劑,使殺菌劑濃度C1、C2均成為3mg/L,於此時點,殺菌劑添加量為X1+X2=21.4g/d。然後,在實施例2-2中,從投藥點2添加殺菌劑,使第1逆滲透膜裝置12之供給水中的殺菌劑濃度C1成為3mg/L,於此時點,殺菌劑添加量X2為14.5g/d,殺菌劑濃度C2為6.1mg/L(>3mg/L)。比起比較例3-2,實施例2-2之殺菌劑之添加量減少了6.9g/d,與比較例3-1及實施例2-1相比,減少幅度小。結果如表3所示。In Comparative Example 3-2, a sterilizing agent was added from the dosing point 1 at a sterilizing agent concentration C1, and a sterilizing agent was added from the dosing point 2 at a sterilizing agent concentration C2, so that the sterilizing agent concentrations C1 and C2 were both 3 mg/L. The amount of the bactericide added was X1 + X2 = 21.4 g / d. Then, in Example 2-2, the sterilizing agent was added from the dosing point 2, and the sterilizing agent concentration C1 in the supply water of the first reverse osmosis membrane device 12 was 3 mg/L. At this point, the sterilizing agent addition amount X2 was 14.5. g/d, bactericide concentration C2 was 6.1 mg / L (> 3 mg / L). The amount of the bactericide added in Example 2-2 was reduced by 6.9 g/d as compared with Comparative Example 3-2, and the decrease was smaller than that of Comparative Example 3-1 and Example 2-1. The results are shown in Table 3.

【表3】 【table 3】

根據以上試驗,比起比較例,實施例之殺菌劑之減少量大。According to the above test, the amount of reduction of the sterilizing agent of the examples was large as compared with the comparative example.

如此地利用實施例之水處理系統及水處理方法,在使用2階段以上之逆滲透膜之水處理中,可減少殺菌劑之添加量。By using the water treatment system and the water treatment method of the embodiment as described above, the amount of the sterilizing agent can be reduced in the water treatment using the reverse osmosis membrane of two or more stages.

1、3、5‧‧‧水處理系統
10‧‧‧原水槽
12‧‧‧第1逆滲透膜裝置
14‧‧‧第2逆滲透膜裝置
16、18、20、22、24‧‧‧配管
26‧‧‧循環配管
28、32‧‧‧添加殺菌劑之配管
30‧‧‧脫氣膜
1, 3, 5 ‧ ‧ water treatment system
10‧‧‧ original sink
12‧‧‧1st reverse osmosis membrane device
14‧‧‧Second reverse osmosis membrane device
16, 18, 20, 22, 24‧‧‧ piping
26‧‧‧Recycling piping
28, 32‧‧‧ Adding fungicide piping
30‧‧‧Degassing membrane

[圖1]係顯示關於本發明之實施形態之水處理系統之一例之概略結構圖。 [圖2]係顯示關於本發明之實施形態之水處理系統之另一例之概略結構圖。 [圖3]係顯示習知之水處理系統之概略結構圖。 [圖4]係實施例中評價於逆滲透膜之阻隔率所使用的平板膜試驗裝置之概略結構圖。Fig. 1 is a schematic block diagram showing an example of a water treatment system according to an embodiment of the present invention. Fig. 2 is a schematic block diagram showing another example of a water treatment system according to an embodiment of the present invention. Fig. 3 is a schematic block diagram showing a conventional water treatment system. Fig. 4 is a schematic structural view showing a flat membrane test apparatus used for evaluating the barrier ratio of a reverse osmosis membrane in the examples.

no

Claims (10)

一種水處理系統,係使用2階段以上之逆滲透膜, 其特徵為至少具備: 第1階段之逆滲透膜裝置; 第2階段之逆滲透膜裝置,處理該第1階段之逆滲透膜裝置的逆滲透水;及 循環構件,使該第2階段之逆滲透膜裝置之濃縮水循環於該第1階段之逆滲透膜裝置之供給水中; 且在該第2階段之逆滲透膜的供給水中,添加於逆滲透膜之阻隔率為70%以上之殺菌劑。A water treatment system using a reverse osmosis membrane of two or more stages, characterized in that it comprises at least: a reverse osmosis membrane device of the first stage; a reverse osmosis membrane device of the second stage, and a reverse osmosis membrane device of the first stage a reverse osmosis water; and a circulation member, wherein the concentrated water of the reverse osmosis membrane device of the second stage is circulated in the feed water of the reverse osmosis membrane device of the first stage; and is added to the supply water of the reverse osmosis membrane of the second stage A bactericide having a barrier ratio of 70% or more to the reverse osmosis membrane. 如申請專利範圍第1項之水處理系統,其中, 該於逆滲透膜之阻隔率為70%以上之殺菌劑係次溴酸安定化組成物、氯胺磺酸、次氯酸、次溴酸、異噻唑酮(isothiazolone)化合物及鹵代氰乙醯胺化合物之中的至少1種。The water treatment system of claim 1, wherein the sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is a hypobromous acid stabilized composition, chloramine sulfonic acid, hypochlorous acid, hypobromous acid. At least one of an thiathiazolone compound and a halogenated cyanoacetamide compound. 如申請專利範圍第1或2項之水處理系統,其中, 在添加該於逆滲透膜之阻隔率為70%以上之殺菌劑之後段,具備: 脫氣膜,實施該第2階段之逆滲透膜的供給水之脫氣。The water treatment system according to claim 1 or 2, wherein after the addition of the sterilizing agent having a barrier ratio of 70% or more to the reverse osmosis membrane, a degassing membrane is provided, and the reverse osmosis of the second stage is performed. Degassing of the feed water of the membrane. 如申請專利範圍第1或2項之水處理系統,其中, 該於逆滲透膜之阻隔率為70%以上之殺菌劑係陰離子性之殺菌劑,該第2階段之逆滲透膜裝置具備陰離子帶電膜。The water treatment system according to claim 1 or 2, wherein the sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is an anionic bactericide, and the second-stage reverse osmosis membrane device is provided with an anion charging. membrane. 如申請專利範圍第4項之水處理系統,其中, 該第1階段之逆滲透膜裝置具備中性膜。The water treatment system of claim 4, wherein the first stage reverse osmosis membrane device comprises a neutral membrane. 一種水處理方法,至少使用第1階段之逆滲透膜、及處理該第1階段之逆滲透膜之逆滲透水之第2階段之逆滲透膜來實施2階段以上之逆滲透膜處理, 其特徵為: 將第2階段之逆滲透膜之濃縮水循環使用於第1階段之逆滲透膜之供給水中,且在該第2階段之逆滲透膜的供給水中,添加在逆滲透膜之阻隔率為70%以上之殺菌劑。A water treatment method for performing a reverse osmosis membrane treatment of two or more stages by using at least a reverse osmosis membrane of a first stage and a reverse osmosis membrane of a second stage of reverse osmosis water of the reverse osmosis membrane of the first stage; Therefore, the concentrated water of the reverse osmosis membrane of the second stage is recycled to the feed water of the reverse osmosis membrane of the first stage, and the barrier ratio of the reverse osmosis membrane is 70 in the supply water of the reverse osmosis membrane of the second stage. More than % of fungicides. 如申請專利範圍第6項之水處理方法,其中, 該於逆滲透膜之阻隔率為70%以上之殺菌劑係次溴酸安定化組成物、氯胺磺酸、次氯酸、次溴酸、異噻唑酮化合物及鹵代氰乙醯胺化合物之中的至少1種。The water treatment method according to claim 6, wherein the sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is a hypobromous acid stability composition, chloramine sulfonic acid, hypochlorous acid, hypobromous acid. At least one of the thiazolone compound and the halogenated cyanoacetamide compound. 如申請專利範圍第6或7項之水處理方法,其中, 在添加該於逆滲透膜之阻隔率為70%以上之殺菌劑之後段,使用脫氣膜實施該第2階段之逆滲透膜之供給水之脫氣。The water treatment method according to claim 6 or 7, wherein the second stage reverse osmosis membrane is carried out using a degassing membrane after adding the sterilizing agent having a barrier ratio of 70% or more to the reverse osmosis membrane. Supply water degassing. 如申請專利範圍第6或7項之水處理方法,其中, 該於逆滲透膜之阻隔率為70%以上之殺菌劑係陰離子性之殺菌劑,該第2階段之逆滲透膜係陰離子帶電膜。The water treatment method according to claim 6 or 7, wherein the sterilizing agent having a barrier ratio of 70% or more in the reverse osmosis membrane is an anionic bactericide, and the second-stage reverse osmosis membrane is an anion charged membrane. . 如申請專利範圍第9項之水處理方法,其中, 該第1階段之逆滲透膜係中性膜。The water treatment method according to claim 9, wherein the reverse osmosis membrane of the first stage is a neutral membrane.
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