TW201716869A - Photosensitive resin composition, color filters, method of producing the same and application thereof - Google Patents
Photosensitive resin composition, color filters, method of producing the same and application thereof Download PDFInfo
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- TW201716869A TW201716869A TW104136529A TW104136529A TW201716869A TW 201716869 A TW201716869 A TW 201716869A TW 104136529 A TW104136529 A TW 104136529A TW 104136529 A TW104136529 A TW 104136529A TW 201716869 A TW201716869 A TW 201716869A
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- Prior art keywords
- group
- carbon atoms
- alkyl group
- substituted
- phenyl
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- 239000011342 resin composition Substances 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 112
- 229920005989 resin Polymers 0.000 claims abstract description 80
- 239000011347 resin Substances 0.000 claims abstract description 80
- 239000000049 pigment Substances 0.000 claims abstract description 25
- 239000002904 solvent Substances 0.000 claims abstract description 22
- 239000012965 benzophenone Substances 0.000 claims abstract description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 703
- 125000000217 alkyl group Chemical group 0.000 claims description 498
- 229910052799 carbon Inorganic materials 0.000 claims description 338
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 332
- -1 benzophenone compound Chemical class 0.000 claims description 287
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 226
- 125000005843 halogen group Chemical group 0.000 claims description 160
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 121
- 229910052760 oxygen Inorganic materials 0.000 claims description 102
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 89
- 229910052717 sulfur Inorganic materials 0.000 claims description 85
- 229910005965 SO 2 Inorganic materials 0.000 claims description 70
- 125000001624 naphthyl group Chemical group 0.000 claims description 66
- 125000003545 alkoxy group Chemical group 0.000 claims description 62
- 125000003342 alkenyl group Chemical group 0.000 claims description 57
- 125000001072 heteroaryl group Chemical group 0.000 claims description 54
- 125000003700 epoxy group Chemical group 0.000 claims description 40
- 229910052757 nitrogen Inorganic materials 0.000 claims description 29
- 229920006395 saturated elastomer Polymers 0.000 claims description 29
- 239000004593 Epoxy Substances 0.000 claims description 27
- 125000003118 aryl group Chemical group 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 27
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 24
- 125000002252 acyl group Chemical group 0.000 claims description 23
- 239000004973 liquid crystal related substance Substances 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 22
- 125000001188 haloalkyl group Chemical group 0.000 claims description 20
- 125000001424 substituent group Chemical group 0.000 claims description 19
- 125000001544 thienyl group Chemical group 0.000 claims description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 17
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 claims description 17
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 15
- PXXJHWLDUBFPOL-UHFFFAOYSA-N benzamidine Chemical group NC(=N)C1=CC=CC=C1 PXXJHWLDUBFPOL-UHFFFAOYSA-N 0.000 claims description 14
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 14
- 125000003302 alkenyloxy group Chemical group 0.000 claims description 13
- 125000005842 heteroatom Chemical group 0.000 claims description 13
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 12
- 238000006116 polymerization reaction Methods 0.000 claims description 12
- 125000005226 heteroaryloxycarbonyl group Chemical group 0.000 claims description 11
- 125000000623 heterocyclic group Chemical group 0.000 claims description 11
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 10
- 125000004122 cyclic group Chemical group 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 239000011734 sodium Chemical group 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- 125000004414 alkyl thio group Chemical group 0.000 claims description 9
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 9
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 8
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 claims description 8
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims description 8
- 125000002947 alkylene group Chemical group 0.000 claims description 7
- 125000000304 alkynyl group Chemical group 0.000 claims description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 7
- 125000006678 phenoxycarbonyl group Chemical group 0.000 claims description 7
- 150000001336 alkenes Chemical group 0.000 claims description 6
- 150000001721 carbon Chemical class 0.000 claims description 6
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 6
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 6
- 125000005223 heteroarylcarbonyl group Chemical group 0.000 claims description 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 5
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 4
- 125000005055 alkyl alkoxy group Chemical group 0.000 claims description 4
- 125000005037 alkyl phenyl group Chemical group 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical group C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 3
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 claims description 3
- 229910052708 sodium Chemical group 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 2
- 150000001924 cycloalkanes Chemical class 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 1
- 125000005257 alkyl acyl group Chemical group 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 21
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 56
- 239000000178 monomer Substances 0.000 description 41
- 229910052736 halogen Inorganic materials 0.000 description 35
- 150000002367 halogens Chemical class 0.000 description 35
- 239000000975 dye Substances 0.000 description 29
- 238000006243 chemical reaction Methods 0.000 description 24
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 21
- 239000010408 film Substances 0.000 description 21
- 239000002253 acid Substances 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 15
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 15
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 13
- 150000001735 carboxylic acids Chemical class 0.000 description 13
- 238000003786 synthesis reaction Methods 0.000 description 13
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 12
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 11
- 239000002585 base Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 239000011521 glass Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 7
- 239000002202 Polyethylene glycol Substances 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 238000007334 copolymerization reaction Methods 0.000 description 7
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 229930185605 Bisphenol Natural products 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 6
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 6
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 6
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 6
- 125000004430 oxygen atom Chemical group O* 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 5
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 5
- 239000003377 acid catalyst Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- 238000006482 condensation reaction Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000012948 isocyanate Substances 0.000 description 5
- 229950000688 phenothiazine Drugs 0.000 description 5
- 239000002798 polar solvent Substances 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 4
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 4
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 4
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 4
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 4
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 4
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical class C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical class C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 4
- 239000007809 chemical reaction catalyst Substances 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 241000894007 species Species 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- OTTZHAVKAVGASB-UHFFFAOYSA-N 2-heptene Natural products CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 3
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 3
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 3
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- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- ZUCXUTRTSQLRCV-UHFFFAOYSA-K trisodium;1-amino-4-[3-[[4-chloro-6-(3-sulfonatoanilino)-1,3,5-triazin-2-yl]amino]-2,4,6-trimethyl-5-sulfonatoanilino]-9,10-dioxoanthracene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].CC1=C(S([O-])(=O)=O)C(C)=C(NC=2C=3C(=O)C4=CC=CC=C4C(=O)C=3C(N)=C(C=2)S([O-])(=O)=O)C(C)=C1NC(N=1)=NC(Cl)=NC=1NC1=CC=CC(S([O-])(=O)=O)=C1 ZUCXUTRTSQLRCV-UHFFFAOYSA-K 0.000 description 1
- UJMBCXLDXJUMFB-UHFFFAOYSA-K trisodium;5-oxo-1-(4-sulfonatophenyl)-4-[(4-sulfonatophenyl)diazenyl]-4h-pyrazole-3-carboxylate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 UJMBCXLDXJUMFB-UHFFFAOYSA-K 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本發明是有關於一種感光性樹脂組成物、彩色濾光片及其製造方法與應用,且特別是有關於一種可具有良好耐化性及對比度的感光性樹脂組成物、彩色濾光片及其製造方法與應用。 The present invention relates to a photosensitive resin composition, a color filter, a method and a method for producing the same, and, in particular, to a photosensitive resin composition, a color filter, and a photosensitive filter thereof which have good chemical resistance and contrast Manufacturing methods and applications.
目前,彩色濾光片已被廣泛地應用在彩色液晶顯示器、彩色傳真機、彩色攝影機等辦公器材之領域。隨著市場需求日漸擴大,彩色濾光片之製作技術亦趨向多樣化,目前已開發染色法、印刷法、電鍍法以及分散法等製造方法,其中以分散法為主流製程。 At present, color filters have been widely used in the fields of color liquid crystal displays, color facsimile machines, color cameras and the like. As the market demand is expanding, the production technology of color filters is also diversified. At present, dyeing methods, printing methods, electroplating methods, and dispersion methods have been developed, among which the dispersion method is the mainstream process.
分散法之製程係先將著色顏料分散於感光性樹脂中,再將該感光性樹脂塗佈於玻璃基板上,經過曝光、顯像等步驟,即可製得特定圖案。經重複三次操作,即可製得紅色(R),綠色(G)及藍色(B)之畫素著色層之圖案,之後視 需要可於畫素著色層之圖案上施加保護膜。 In the dispersion method, the coloring pigment is first dispersed in a photosensitive resin, and the photosensitive resin is applied onto a glass substrate, and a specific pattern can be obtained by exposure, development, and the like. After repeating the operation three times, the patterns of the red (R), green (G) and blue (B) pixel colored layers can be obtained, and then It is desirable to apply a protective film to the pattern of the pixel colored layer.
用於分散法製程中之感光性樹脂如日本特開平6-95211號公報及特開平8-183819號公報所揭示者,例如以(甲基)丙烯酸為單體成分所聚合而成之共聚物,其係作為感光性樹脂之鹼可溶性樹脂。 For example, as disclosed in Japanese Laid-Open Patent Publication No. Hei. It is used as an alkali-soluble resin of a photosensitive resin.
然而,彩色濾光片之製造過程中,需經歷多次熱處理步驟,如紅色(R),綠色(G)及藍色(B)等畫素著色層圖案形成後之後烤(post-bake)步驟及透明導電膜(ITO膜)之形成步驟等,該等步驟一般皆需於200℃以上之高溫下操作,但上述習知之感光性樹脂若於180℃下加熱1小時左右,易於其畫素著色層中產生顏料凝集粒子(一般顏料凝集粒子之粒徑介於1μm至10μm),且該畫素著色層之耐熱性亦不佳。 However, in the manufacturing process of the color filter, it is necessary to undergo multiple heat treatment steps, such as red (R), green (G) and blue (B), and the like, after the formation of the colored layer pattern, post-bake step And a step of forming a transparent conductive film (ITO film), etc., which are generally required to be operated at a high temperature of 200 ° C or higher, but the above-mentioned photosensitive resin is heated at 180 ° C for about 1 hour, which is easy to color the pixels. Pigment aggregate particles are generated in the layer (generally, the pigment agglomerated particles have a particle diameter of from 1 μm to 10 μm), and the heat resistance of the pixel colored layer is also poor.
為改善上述之問題,日本特開2001-075273中揭示了一種感光性樹脂組成物,其包含羧酸基之不飽和單體與含有環氧丙基之單體所聚合而得之聚合物,並利用上述聚合物作為感光性樹脂之鹼可溶性樹脂。然而,利用此習知技術之感光性樹脂組成物所製得之彩色濾光片,有耐化性與對比度不佳的問題。 In order to improve the above-mentioned problem, a photosensitive resin composition comprising a polymer obtained by polymerizing an unsaturated monomer of a carboxylic acid group and a monomer containing a glycidyl group is disclosed in Japanese Laid-Open Patent Publication No. 2001-075273, and The above polymer is used as an alkali-soluble resin of a photosensitive resin. However, the color filter obtained by using the photosensitive resin composition of the prior art has a problem of poor chemical resistance and contrast.
因此,如何同時克服耐化性與對比度不佳之問題以達到目前業界的要求,為本發明所屬技術領域中努力研究之目標。 Therefore, how to overcome the problems of poor chemical resistance and contrast at the same time to meet the requirements of the current industry is an object of diligent research in the technical field to which the present invention pertains.
因此,本發明之一目的是在提供一種感光性樹脂組成物,其可提供後續應用之良好的耐化性和對比度。 Accordingly, it is an object of the present invention to provide a photosensitive resin composition which provides good chemical resistance and contrast for subsequent applications.
本發明之另一目的是在提供一種彩色濾光片的製造方法,其係使用前述之感光性樹脂組成物,以於基板上形成畫素層。 Another object of the present invention is to provide a method for producing a color filter which uses the above-mentioned photosensitive resin composition to form a pixel layer on a substrate.
本發明之又一目的是在提供一種彩色濾光片,其係使用前述之彩色濾光片的製造方法所製得。 It is still another object of the present invention to provide a color filter which is produced by the above-described method of producing a color filter.
本發明之又一目的是在提供一種液晶顯示裝置,其包含前述之彩色濾光片。 It is still another object of the present invention to provide a liquid crystal display device comprising the aforementioned color filter.
根據本發明之上述目的,首先提出一種感光性樹脂組成物。在一實施例中,感光性樹脂組成物包含顏料(A)、染料(B)、鹼可溶性樹脂(C)、含乙烯性不飽和基之化合物(D)、光起始劑(E)、含不飽和基之二苯甲酮化合物(F)以及溶劑(G)。以下分別詳細說明之。 According to the above object of the present invention, a photosensitive resin composition is first proposed. In one embodiment, the photosensitive resin composition comprises a pigment (A), a dye (B), an alkali-soluble resin (C), a compound (D) containing an ethylenically unsaturated group, a photoinitiator (E), and Unsaturated benzophenone compound (F) and solvent (G). The details are explained below.
本發明之顏料(A)可為無機顏料、有機顏料或上述之組合。 The pigment (A) of the present invention may be an inorganic pigment, an organic pigment or a combination thereof.
上述之無機顏料可為金屬氧化物、金屬錯鹽等金屬化合物,其可選自於鐵、鈷、鋁、鎘、鉛、銅、鈦、鎂、鉻、亞鉛、銻等金屬的氧化物以及前述金屬的複合氧化物。 The inorganic pigment may be a metal compound such as a metal oxide or a metal salt, which may be selected from the group consisting of oxides of metals such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, lead, and antimony. a composite oxide of the foregoing metal.
上述之有機顏料係選自於C.1.顏料黃1、3、11、12、13、14、15、16、17、20、24、31、53、55、60、61、65、71、73、74、81、83、93、95、97、98、 99、100、101、104、106、108、109、110、113、114、116、117、119、120、126、127、128、129、138、139、150、151、152、153、154、155、156、166、167、168、175;C.I.顏料橙1、5、13、14、16、17、24、34、36、38、40、43、46、49、51、61、63、64、71、73;C.I.顏料紅1、2、3、4、5、6、7、8、9、10、11、12、14、15、16、17、18、19、21、22、23、30、31、32、37、38、40、41、42、48:1、48:2、48:3、48:4、49:1、49:2、50:1、52:1、53:1、57、57:1、57:2、58:2、58:4、60:1、63:1、63:2、64:1、81:1、83、88、90:1、97、101、102、104、105、106、108、112、113、114、122、123、144、146、149、150、151、155、166、168、170、171、172、174、175、176、177、178、179、180、185、187、188、190、193、194、202、206、207、208、209、215、216、220、224、226、242、243、245、254、255、264、265;C.I.顏料紫1、14、19、23、29、32、33、36、37、38、39、40、50;C.I.顏料藍1、2、15、15:1、15:2、15:3、15:4、15:5、15:6、16、21、22、60、61、64、66;C.I.顏料綠7、36、37、42、58;C.I.顏料棕23、25、28;以及C.I.顏料黑1、7。上述之有機顏料可單獨一種或混合複數種使用。 The above organic pigment is selected from C.1. Pigment Yellow 1, 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60, 61, 65, 71, 73, 74, 81, 83, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117, 119, 120, 126, 127, 128, 129, 138, 139, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175; CI Pigment Orange 1, 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46, 49, 51, 61, 63, 64 , 71, 73; CI pigment red 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48:1, 48:2, 48:3, 48:4, 49:1, 49:2, 50:1, 52:1, 53: 1, 57, 57:1, 57:2, 58:2, 58:4, 60:1, 63:1, 63:2, 64:1, 81:1, 83, 88, 90:1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 193, 194, 202, 206, 207, 208, 209, 215, 216, 220, 224, 226, 242, 243, 245, 254, 255, 264, 265; CI Pigment Violet 1, 14, 19, 23, 29, 32, 33, 36, 37, 38, 39, 40, 50; CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 16, 21, 22, 60 , 61, 64, 66; CI Pigment Green 7, 36, 37, 42, 58; CI Pigment Brown 23, 25, 28; and CI Pigment Black 1, 7. The above organic pigments may be used singly or in combination of plural kinds.
顏料(A)的一次粒子之平均粒子徑較佳為10nm至200nm,更佳為20nm至150nm,最佳為30nm至130nm。 The average particle diameter of the primary particles of the pigment (A) is preferably from 10 nm to 200 nm, more preferably from 20 nm to 150 nm, most preferably from 30 nm to 130 nm.
基於鹼可溶性樹脂(C)之總使用量為100重量份,顏料(A)的使用量為30重量份至300重量份,較佳為40重量份至250重量份,更佳為50重量份至200重量份。 The pigment (A) is used in an amount of 30 parts by weight to 300 parts by weight, preferably 40 parts by weight to 250 parts by weight, more preferably 50 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C). 200 parts by weight.
必要時,顏料(A)也能選擇性地使用分散劑,例如:陽離子系、陰離子系、非離子系、兩性、聚矽氧烷系、氟系等之界面活性劑。 If necessary, the pigment (A) can also be selectively used as a dispersant, for example, a surfactant such as a cationic system, an anionic system, a nonionic system, an amphoteric acid, a polyoxyalkylene system or a fluorine compound.
前述之界面活性劑可包含但不限於聚環氧乙烷十二烷基醚、聚環氧乙烷硬脂醯醚、聚環氧乙烷油醚等之聚環氧乙烷烷基醚類;聚環氧乙烷辛基苯醚、聚環氧乙烷壬基苯醚等之聚環氧乙烷烷基苯醚類界面活性劑;聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯等之聚乙二醇二酯類界面活性劑;山梨糖醇酐脂肪酸酯類界面活性劑;脂肪酸改質的聚酯類界面活性劑;三級胺改質的聚胺基甲酸酯類界面活性劑;信越化學工業製造,型號為KP之商品、Toray Dow Corning Silicon製造,型號為SF-8427之商品、共榮社油脂化學工業製造,型號為Polyflow之商品、得克姆公司(Tochem Products Co.,Ltd.)製造,型號為F-Top之商品、大日本印墨化學工業製造,型號為Megafac之產品、住友3M製造,型號為Fluorad之產品、旭硝子製造,型號為Asahi Guard及Surflon之商品。界面活性劑可單獨一種或混合複數種使用。 The aforementioned surfactant may include, but is not limited to, polyethylene oxide alkyl ethers such as polyethylene oxide lauryl ether, polyethylene oxide stearyl ether, polyethylene oxide oleyl ether; Polyethylene oxide alkyl phenyl ether surfactants such as polyethylene oxide octyl phenyl ether and polyethylene oxide nonyl phenyl ether; polyethylene glycol dilaurate and polyethylene glycol Polyethylene glycol diester surfactant such as fatty acid ester; sorbitan fatty acid ester surfactant; fatty acid modified polyester surfactant; tertiary amine modified polyurethane Surfactant; manufactured by Shin-Etsu Chemical Co., Ltd., model KP, manufactured by Toray Dow Corning Silicon, model SF-8427, manufactured by Kyoritsu Oil & Fat Chemical Industry, model Polyflow, Tochem Products Co.,Ltd.), model F-Top, manufactured by Dainippon Ink Chemical Industry, model Megafac, Sumitomo 3M, model Fluorad, Asahi Glass, model Asahi Guard and Surflon commodity. The surfactants may be used singly or in combination of plural kinds.
本發明之染料(B)包含具有如式(I)所示之染料(B-1):
於式(I)中,L1至L4各自獨立表示氫、-L6、碳數為6至10之芳香烴基、或經鹵素原子、-L6、-OH、-OL6、-SO3 -、-SO3H、-SO3M、-COOH、-COOL6、-SO3L6、-SO2NHL8或-SO2NL8L9取代之碳數為6至10之芳香烴基;L5表示-SO3 -、-SO3H、-SO3M、-COOH、-COOL6、-SO3L6、-SO2NHL8或-SO2NL8L9;u表示0至5之整數;當u表示2至5時,複數個L5為相同或不同;Xb表示鹵素原子;a表示0或1;L6表示碳數為1至10之烷基或經鹵素原子取代之碳數為1至10之烷基,其中碳數為1至10之烷基或經鹵素原子取代之碳數為1至10之烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NL7-;L7表示碳數為1至10之烷基或經鹵素原子取代之碳數為1至10之烷基;L8及L9各自獨立表示碳數為1至10之直鏈烷基、碳數為3至10之支鏈烷基、碳數為3至30之環烷基、或-Q;其中,碳數為1至10之直鏈烷基、碳數為3至10之支鏈烷基或碳數 為3至30之環烷基中之氫原子係未經取代或經一取代基所取代,該取代基係選自由羥基、鹵素原子、-Q、-CH=CH2及-CH=CH-L6所組成之群;碳數為1至10之直鏈烷基、碳數為3至10之支鏈烷基或碳數為3至30之環烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NL7-;或L8和L9結合形成碳數為2至10之雜環基,其中碳數為2至10之雜環基中之氫原子係未經取代或經L6、-OH、或-Q所取代;Q表示碳數為6至10之芳香烴基、碳數為5至10之雜芳香基、經鹵素原子、-L6、-OH、-OL6、-NO2、-CH=CH2或-CH=CH-L6取代之碳數為6至10之芳香烴基、或經鹵素原子、-L6、-OH、-OL6、-NO2、-CH=CH2及-CH=CH-L6取代之碳數為5至10之雜芳香基;及M表示鉀或鈉。 In the formula (I), L 1 to L 4 each independently represent hydrogen, -L 6 , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a halogen atom, -L 6 , -OH, -OL 6 , -SO 3 - , -SO 3 H, -SO 3 M, -COOH, -COOL 6 , -SO 3 L 6 , -SO 2 NHL 8 or -SO 2 NL 8 L 9 substituted aromatic hydrocarbon group having 6 to 10 carbon atoms; L 5 represents -SO 3 - , -SO 3 H, -SO 3 M, -COOH, -COOL 6 , -SO 3 L 6 , -SO 2 NHL 8 or -SO 2 NL 8 L 9 ; u represents 0 to 5 An integer; when u represents 2 to 5, a plurality of L 5 are the same or different; X b represents a halogen atom; a represents 0 or 1; and L 6 represents an alkyl group having 1 to 10 carbon atoms or substituted by a halogen atom; is an alkyl group having a carbon number of 1 to 10, wherein the carbon atoms of the substituted alkyl group of 1 to 10 carbon atoms or halogen atoms in the alkyl group of 1 to 10 -CH 2 - system without substitution or substituted by - O-, carbonyl or -NL 7 -; L 7 represents an alkyl group having 1 to 10 carbon atoms or an alkyl group having 1 to 10 carbon atoms substituted by a halogen atom; and L 8 and L 9 each independently represent a carbon number of 1 a linear alkyl group of 10, a branched alkyl group having 3 to 10 carbon atoms, a cycloalkyl group having 3 to 30 carbon atoms, or -Q; wherein a linear alkyl group having 1 to 10 carbon atoms or carbon Number is 3 to 10 Branched alkyl or a hydrogen atom based carbon atoms a cycloalkyl group of 3 to 30 in the unsubstituted or substituted with a substituent group, the substituent is selected from the group consisting of a hydroxyl group, a halogen atom, -Q, -CH = CH 2 And a group consisting of -CH=CH-L 6 ; a linear alkyl group having 1 to 10 carbon atoms; a branched alkyl group having 3 to 10 carbon atoms; or a cycloalkyl group having 3 to 30 carbon atoms - CH 2 - is unsubstituted or substituted with -O-, carbonyl or -NL 7 -; or L 8 and L 9 combine to form a heterocyclic group having a carbon number of 2 to 10, wherein the carbon number is 2 to 10 The hydrogen atom in the cyclic group is unsubstituted or substituted by L 6 , -OH, or -Q; Q represents an aromatic hydrocarbon group having 6 to 10 carbon atoms, a heteroaryl group having 5 to 10 carbon atoms, and a halogen atom. , -L 6 , -OH, -OL 6 , -NO 2 , -CH=CH 2 or -CH=CH-L 6 substituted with an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a halogen atom, -L 6 , -OH, -OL 6 , -NO 2 , -CH=CH 2 and -CH=CH-L 6 are substituted with a heteroaryl group having a carbon number of 5 to 10; and M represents potassium or sodium.
較佳地,L6包含但不限於甲基、乙基、丙基、異丙基、丁基、異丁基、戊基、異戊基、新戊基(neopentyl)、環戊基、己基、環己基、庚基、環庚烷、辛基、環辛基、2-乙基己基、壬基、癸基、三環[5.3.0.03,10]癸基[tricycle(5.3.0.03,10)decanyl]、甲氧基丙基、己氧基丙基、2-乙基己氧基丙基、甲氧基己基、或環氧基丙基。 Preferably, L 6 includes, but is not limited to, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neopentyl, cyclopentyl, hexyl, Cyclohexyl, heptyl, cycloheptane, octyl, cyclooctyl, 2-ethylhexyl, decyl, decyl, tricyclo [5.3.0.0 3,10 ] fluorenyl [tricycle (5.3.0.0 3,10) Decanyl], methoxypropyl, hexyloxypropyl, 2-ethylhexyloxypropyl, methoxyhexyl, or epoxypropyl.
較佳地,碳數為6至10之芳香烴基包含但不限於苯基或萘基等。 Preferably, the aromatic hydrocarbon group having a carbon number of 6 to 10 includes, but is not limited to, a phenyl group or a naphthyl group.
較佳地,-SO3L6包含但不限於甲基磺醯基(methanesulfonyl)、乙基磺醯基(ethanesulfonyl)、己基磺醯基(hexanesulfonyl)、或癸基磺醯基 (decanesulfonyl)。 Preferably, -SO 3 L 6 includes, but is not limited to, methanesulfonyl, ethanesulfonyl, hexanesulfonyl, or decanesulfonyl.
較佳地,-COOL6包含但不限於甲氧基羰基(methyloxycarbonyl)、乙氧基羰基(ethyloxycarbonyl)、丙氧基羰基、異丙氧基羰基、丁氧基羰基、異丁氧基羰基、戊氧基羰基、異戊氧基羰基、新戊氧基羰基、環戊氧基羰基、己氧基羰基、環己氧基羰基、庚氧基羰基、環庚氧基羰基、辛氧基羰基、環辛氧基羰基、2-乙基己氧基羰基、壬氧基羰基、癸氧基羰基、三環[5.3.0.03,10]癸基羰基、甲氧基丙氧基羰基、己氧基丙氧基羰基、2-乙基己氧基丙氧基羰基、或甲氧基己氧基羰基。 Preferably, -COOL 6 includes, but is not limited to, methyloxycarbonyl, ethyloxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, pentyl Oxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl, cyclopentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxycarbonyl, heptyloxycarbonyl, cycloheptyloxycarbonyl, octyloxycarbonyl, ring Octyloxycarbonyl, 2-ethylhexyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl, tricyclo[5.3.0.0 3,10 ]decylcarbonyl, methoxypropoxycarbonyl, hexyloxypropyl Oxycarbonyl, 2-ethylhexyloxypropoxycarbonyl, or methoxyhexyloxycarbonyl.
較佳地,-SO2NHL8包含但不限於胺磺醯基(sulfamoyl)、甲基胺磺醯基、乙基胺磺醯基、丙基胺磺醯基、異丙基胺磺醯基、丁基胺磺醯基、異丁基胺磺醯基、戊基胺磺醯基、異戊基胺磺醯基、新戊基胺磺醯基、環戊基胺磺醯基、己基胺磺醯基、環己基胺磺醯基、庚基胺磺醯基、環庚烷胺磺醯基、辛基胺磺醯基、環辛基胺磺醯基、2-乙基己基胺磺醯基、壬基胺磺醯基、癸基胺磺醯基、三環[5.3.0.03,10]癸基胺磺醯基、甲氧基丙基胺磺醯基、己氧基丙基胺磺醯基、2-乙基己氧基丙基胺磺醯基、甲氧基己基胺磺醯基、環氧基丙基胺磺醯基、1,5-二甲基己基胺磺醯基、丙氧基丙基胺磺醯基、異丙氧基丙基胺磺醯基、3-苯基-1-甲基丙基胺磺醯基、、、
較佳地,-SO2NL8L9包含但不限於、
較佳地,染料(B-1)包括具有如式(I-1)所示結構之染料:
於式(I-1)中:L11至L14各自獨立表示氫、-L6、碳數為6至10之芳香烴基、或經鹵素原子、-L6、-OH、-OL6、-SO3 -、-SO3H、-SO3Na、-COOH、-COOL6、-SO3L6、-SO2NHL8或-SO2NL8L9取代之碳數為6至10之芳香烴基;L15表示氫、-SO3 -、-SO3H、-SO2NHL8或-SO2NL8L9;L16表示-SO3 -、-SO3H、-SO2NHL8或-SO2NL8L9;X1b表示鹵素原子;a1表示0或1。 In the formula (I-1): L 11 to L 14 each independently represent hydrogen, -L 6 , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a halogen atom, -L 6 , -OH, -OL 6 , - SO 3 - , -SO 3 H, -SO 3 Na, -COOH, -COOL 6 , -SO 3 L 6 , -SO 2 NHL 8 or -SO 2 NL 8 L 9 substituted with a carbon number of 6 to 10 a hydrocarbon group; L 15 represents hydrogen, -SO 3 - , -SO 3 H, -SO 2 NHL 8 or -SO 2 NL 8 L 9 ; L 16 represents -SO 3 - , -SO 3 H, -SO 2 NHL 8 or -SO 2 NL 8 L 9 ; X 1b represents a halogen atom; a 1 represents 0 or 1.
較佳地,染料(B-1)包括具有如式(I-2)所示結構之染料:
於式(I-2)中:L21至L24各自獨立表示氫、-L26、碳數為6至10之芳香烴基、或經鹵素原子、-L26、-OH、-OL26、-SO3 -、-SO3H、-SO3Na、-COOH、-COOL26、-SO3L26、或-SO2NHL28取代之碳數為6至10之芳香烴基;L25表示-SO3 -、-SO3Na、-COOH、-COOL26、-SO3H、或-SO2NHL28;u1表示0至5之整數;當u1表示2至5時,複數個L25為相同或不同;X2b表示鹵素原子;a2表示0或1;L26表示碳數為1至10之烷基、或經鹵素原子或-OL27取代之碳數為1至10之烷基;L27表示碳數為1至10之烷基;及L28表示氫、-L26、-COOL26、碳數為6至10之芳香烴基、或經-L26或-OL26取代之碳數為6至10之芳香烴基。 In the formula (I-2): L 21 to L 24 each independently represent hydrogen, -L 26 , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a halogen atom, -L 26 , -OH, -OL 26 , - SO 3 - , -SO 3 H, -SO 3 Na, -COOH, -COOL 26 , -SO 3 L 26 , or -SO 2 NHL 28 substituted with an aromatic hydrocarbon group having 6 to 10 carbon atoms; L 25 represents -SO 3 - , -SO 3 Na, -COOH, -COOL 26 , -SO 3 H, or -SO 2 NHL 28 ; u 1 represents an integer from 0 to 5; when u 1 represents 2 to 5, a plurality of L 25 are The same or different; X 2b represents a halogen atom; a 2 represents 0 or 1; L 26 represents an alkyl group having 1 to 10 carbon atoms, or an alkyl group having 1 to 10 carbon atoms substituted by a halogen atom or -OL 27 ; L 27 represents an alkyl group having a carbon number of 1 to 10; and L 28 represents hydrogen, -L 26 , -COOL 26 , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a carbon number substituted by -L 26 or -OL 26 It is an aromatic hydrocarbon group of 6 to 10.
較佳地,染料(B-1)包括具有如式(I-3)結構之染料;
於式(I-3)中:L31及L32各自獨立表示苯基、或經鹵素原子、-L26、-OL26、-COOL26、-SO3L26、或-SO2NHL28取代之苯基;L33表示-SO3 -、或-SO2NHL28;L34表示氫、-SO3 -、或-SO2NHL28;X3b表示鹵素原子;a3表示0或1;L26表示碳數為1至10之烷基、或經鹵素原子或-OL27取代之碳數為1至10之烷基;L27表示碳數為1至10之烷基;及L28表示氫、-L26、-COOL26、碳數為6至10之芳香烴基、或經-L26或-OL26取代之碳數為6至10之芳香烴基。 In the formula (I-3): L 31 and L 32 each independently represent a phenyl group, or are substituted by a halogen atom, -L 26 , -OL 26 , -COOL 26 , -SO 3 L 26 , or -SO 2 NHL 28 Phenyl group; L 33 represents -SO 3 - or -SO 2 NHL 28 ; L 34 represents hydrogen, -SO 3 - , or -SO 2 NHL 28 ; X 3b represents a halogen atom; a 3 represents 0 or 1; 26 represents an alkyl group having 1 to 10 carbon atoms, or an alkyl group having 1 to 10 carbon atoms substituted by a halogen atom or -OL 27 ; L 27 represents an alkyl group having 1 to 10 carbon atoms; and L 28 represents hydrogen , -L 26 , -COOL 26 , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or an aromatic hydrocarbon group having 6 to 10 carbon atoms substituted by -L 26 or -OL 26 .
較佳地,染料(B-1)包括具有如式(I-4)結構之染料:
於式(I-4)中:L41及L42各自獨立表示苯基、或經-L26或-SO2NHL28取代之苯基;L43表示-SO3 -、或-SO2NHL28;X4b表示鹵素原子; a4表示0或1;L26表示碳數為1至10之烷基、或經鹵素原子或-OL27取代之碳數為1至10之烷基;L27表示碳數為1至10之烷基;及L28表示氫、-L26、-COOL26、碳數為6至10之芳香烴基、或經-L26或-OL26取代之碳數為6至10之芳香烴基。 In the formula (I-4): L 41 and L 42 each independently represent a phenyl group or a phenyl group substituted with -L 26 or -SO 2 NHL 28 ; L 43 represents -SO 3 - or -SO 2 NHL 28 ; X 4b represents a halogen atom; a 4 represents 0 or 1; L 26 represents an alkyl group having a carbon number of 1-10, halogen atom, or a substituted or -OL 27 carbon atoms of an alkyl group of 1 to 10; L 27 represents An alkyl group having 1 to 10 carbon atoms; and L 28 representing hydrogen, -L 26 , -COOL 26 , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a carbon number of 6 to 6 substituted by -L 26 or -OL 26 10 aromatic hydrocarbon groups.
於本發明之具體例中,染料(B-1)包含但不限於如下式(1)至式(31)所示之化合物:
於式(1)中,Rc及Rd各自獨立表示氫、-SO3 -、-COOH或-SO2NHL81;L81表示2-乙基己基;Xb表示鹵素原子;a表示0或1。 In the formula (1), R c and R d each independently represent hydrogen, -SO 3 - , -COOH or -SO 2 NHL 81 ; L 81 represents 2-ethylhexyl; X b represents a halogen atom; a represents 0 or 1.
於式(2)中,Re表示氫、-SO3 -、-COOH或-SO2NHL81;L81表示2-乙基己基;Xb表示鹵素原子;a表示0或1。 In the formula (2), R e represents hydrogen, -SO 3 - , -COOH or -SO 2 NHL 81 ; L 81 represents 2-ethylhexyl; X b represents a halogen atom; and a represents 0 or 1.
於式(3)中,Re表示氫、-SO3 -、-COOH或-SO2NHL81;L81表示2-乙基己基;Xb表示鹵素原子;a表示0或1。 In the formula (3), R e represents hydrogen, -SO 3 - , -COOH or -SO 2 NHL 81 ; L 81 represents 2-ethylhexyl; X b represents a halogen atom; and a represents 0 or 1.
於式(4)中,Rf、Rg及Rh各自獨立表示-SO3 -、-SO3Na或-SO2NHL81;L81表示2-乙基己基。 In the formula (4), R f , R g and R h each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(5)中,Rf、Rg及Rh各自獨立表示-SO3 -、-SO3Na或-SO2NHL81;L81表示2-乙基己基。 In the formula (5), R f , R g and R h each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(6)中,Ri、Rj及Rk各自獨立表示氫、-SO3 -、-SO3H或-SO2NHL81;L81表示2-乙基己基。 In the formula (6), R i , R j and R k each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(7)中,Ri、Rj及Rk各自獨立表示氫、-SO3 -、-SO3H或-SO2NHL81;L81表示2-乙基己基。 In the formula (7), R i , R j and R k each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(8)中,Rl、Rm及Rn各自獨立表示-SO3 -、-SO3Na或-SO2NHL81;L81表示2-乙基己基。 In the formula (8), R l , R m and R n each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(9)中,Rl、Rm及Rn各自獨立表示-SO3 -、-SO3Na或-SO2NHL81;L81表示2-乙基己基。 In the formula (9), R l , R m and R n each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(10)中,Rp、Rq及Rr各自獨立表示氫、-SO3 -、-SO3H或-SO2NHL81;L81表示2-乙基己基。 In the formula (10), R p , R q and R r each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
於式(11)中,Rp、Rq及Rr各自獨立表示氫、-SO3 -、-SO3H或-SO2NHL81;L81表示2-乙基己基。 In the formula (11), R p , R q and R r each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHL 81 ; and L 81 represents 2-ethylhexyl.
本發明之染料(B-1)之較佳具體例為式(1)(Rc與Rd為-SO3 -,a為0)[C.I.酸性紅色染料52]、式(22)[C.I.酸性紅色染料289]、式(28)之染料、式(31)之染料、或上述之任意組合。 A preferred specific example of the dye (B-1) of the present invention is a formula (1) (R c and R d are -SO 3 - , a is 0) [CI acid red dye 52], formula (22) [CI acidity Red dye 289], a dye of formula (28), a dye of formula (31), or any combination of the above.
於本發明之具體例中,基於鹼可溶性樹脂(C)之使用量總和為100重量份,染料(B-1)之使用量為3重量份至50重量份;較佳為5重量份至45重量份;更佳為10重量份至40重量份。當使用染料(B-1)時,感光性樹脂組成物之對比度較佳。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the dye (B-1) is used in an amount of 3 parts by weight to 50 parts by weight; preferably 5 parts by weight to 45 parts by weight. Parts by weight; more preferably 10 parts by weight to 40 parts by weight. When the dye (B-1) is used, the contrast of the photosensitive resin composition is preferable.
於本發明之較佳具體例中,染料(B)可進一步包 含其它染料(B-2)。 In a preferred embodiment of the invention, the dye (B) can be further packaged Contains other dyes (B-2).
較佳地,該其它染料(B-2)包含但不限於偶氮系染料、蒽醌系染料、酞菁系染料、醌亞胺系染料、喹啉系染料或硝基系染料。偶氮系染料包含但不限於C.I.酸性黃11、酸性橙7、酸性紅37、酸性紅180、酸性藍29、直接紅28、直接紅83、直接黃12、直接橙26、直接綠28、直接綠59、活性黃2、活性紅17、活性紅120、活性黑5、分散橙5、分散紅58、分散藍165、鹼性藍41、鹼性紅18、媒介紅7、媒介黃5、媒介黑7等;蒽醌系染料包含但不限於C.I.巴德藍4(Batblue 4)、酸性藍40、酸性綠25、活性藍19、活性藍49、分散紅60、分散藍56、分散藍60等;酞菁系染料包含但不限於C.I.鹼性藍5等;醌亞胺系染料包含但不限於C.I.鹼性藍3、鹼性藍9等;喹啉系染料C.I.溶劑黃33、酸性黃3、分散黃64等;硝基系染料包含但不限於C.I.酸性黃1、酸性橙3、分散黃42等。上述其它染料一般可單獨或混合多種使用。 Preferably, the other dye (B-2) includes, but is not limited to, an azo dye, an anthraquinone dye, a phthalocyanine dye, a quinone imine dye, a quinoline dye, or a nitro dye. Azo dyes include, but are not limited to, CI Acid Yellow 11, Acid Orange 7, Acid Red 37, Acid Red 180, Acid Blue 29, Direct Red 28, Direct Red 83, Direct Yellow 12, Direct Orange 26, Direct Green 28, Direct Green 59, Reactive Yellow 2, Reactive Red 17, Reactive Red 120, Reactive Black 5, Disperse Orange 5, Disperse Red 58, Disperse Blue 165, Basic Blue 41, Alkaline Red 18, Medium Red 7, Medium Yellow 5, Medium Black 7; etc.; lanthanide dyes include but are not limited to CI Bad Blue 4, Acid Blue 40, Acid Green 25, Reactive Blue 19, Reactive Blue 49, Disperse Red 60, Disperse Blue 56, Disperse Blue 60, etc. The phthalocyanine dye includes, but is not limited to, CI basic blue 5; the quinone imine dye includes but is not limited to CI basic blue 3, basic blue 9, etc.; quinoline dye CI solvent yellow 33, acid yellow 3, Disperse yellow 64 or the like; nitro dyes include, but are not limited to, CI acid yellow 1, acid orange 3, disperse yellow 42, and the like. The above other dyes may generally be used singly or in combination of two or more.
於本發明之具體例中,基於鹼可溶性樹脂(C)之使用量總和為100重量份,其它染料(B-2)之使用量為0重量份至47重量份;較佳為0重量份至40重量份;更佳為0重量份至30重量份。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the other dye (B-2) is used in an amount of 0 parts by weight to 47 parts by weight; preferably 0 parts by weight to 40 parts by weight; more preferably 0 parts by weight to 30 parts by weight.
基於鹼可溶性樹脂(C)之使用量總和為100重量份,染料(B)之使用量為5重量份至50重量份;較佳為10重量份至45重量份;更佳為15重量份至40重量份。 The dye (B) is used in an amount of 5 parts by weight to 50 parts by weight, based on the total amount of the alkali-soluble resin (C), and preferably 10 parts by weight to 45 parts by weight; more preferably 15 parts by weight to 40 parts by weight.
本發明之鹼可溶性樹脂(C)可包含第一鹼可溶性樹脂(C-1),其是由一混合物進行聚合反應所製得,而該混合物含有一具有至少二個環氧基的環氧化合物(c-1-1),以及一具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c-1-2)。除此之外,上述混合物更可選擇性地包含羧酸酐化合物(c-1-3)及/或含環氧基的化合物(c-1-4)。 The alkali-soluble resin (C) of the present invention may comprise a first alkali-soluble resin (C-1) which is obtained by a polymerization reaction of a mixture containing an epoxy compound having at least two epoxy groups. (c-1-1), and a compound (c-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group. In addition to the above, the above mixture may more optionally contain a carboxylic anhydride compound (c-1-3) and/or an epoxy group-containing compound (c-1-4).
具有至少二個環氧基的環氧化合物(c-1-1)可具有如下式(II-1)或下式(II-2)所示之結構。在此處,「環氧化合物(c-1-1)可具有如下式(II-1)或下式(II-2)所示之結構」的敘述亦涵蓋了具有如下式(II-1)所示之結構的化合物及具有如下式(II-2)所示之結構的化合物同時存在而作為環氧化合物(c-1-1)的情形。具體而言,前述具有至少二個環氧基的環氧化合物(c-1-1)例如是具有如下式(II-1)所示之結構:
於式(II-1)中,R1c、R2c、R3c以及R4c分別為相同或不同,且表示氫原子、鹵素原子、碳數為1至5之烷基、碳數為1至5之烷氧基、碳數為6至12之芳香基或碳數為6至12之芳烷基。 In the formula (II-1), R 1c , R 2c , R 3c and R 4c are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. An alkoxy group, an aromatic group having 6 to 12 carbon atoms or an aralkyl group having 6 to 12 carbon atoms.
前述式(II-1)之具有至少二個環氧基的環氧化合物(c-1-1)可包括由雙酚芴型化合物(bisphenol fluorene)與鹵化環氧丙烷(epihalohydrin)反應而得之含環氧基之雙酚芴型化合物,但並不限於此。 The epoxy compound (c-1-1) having at least two epoxy groups of the above formula (II-1) may include a bisphenol bisphenol compound (bisphenol) Fluorene) An epoxy group-containing bisphenol quinone type compound obtained by reacting with epoxidized propylene oxide (epihalohydrin), but is not limited thereto.
作為上述雙酚芴型化合物的具體例,可列舉但不限於:9,9-雙(4-羥基苯基)芴[9,9-bis(4-hydroxy phenyl)fluorene]、9,9-雙(4-羥基-3-甲基苯基)芴[9,9-bis(4-hydroxy-3-methylphenyl)fluorene]、9,9-雙(4-羥基-3-氯苯基)芴[9,9-bis(4-hydroxy-3-chlorophenyl)fluorene]、9,9-雙(4-羥基-3-溴苯基)芴[9,9-bis(4-hydroxy-3-bromophenyl)fluorene]、9,9-雙(4-羥基-3-氟苯基)芴[9,9-bis(4-hydroxy-3-fluorophenyl)fluorene]、9,9-雙(4-羥基-3-甲氧基苯基)芴[9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene]、9,9-雙(4-羥基-3,5-二甲基苯基)芴[9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene]、9,9-雙(4-羥基-3,5-二氯苯基)芴[9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene]、9,9-雙(4-羥基-3,5-二溴苯基)芴[9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene]等化合物。 Specific examples of the bisphenol quinone type compound include, but are not limited to, 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-double (4-hydroxy-3-methylphenyl)fluorene [9,9-bis(4-hydroxy-3-methylphenyl)fluorene], 9,9-bis(4-hydroxy-3-chlorophenyl)indole [9 ,9-bis(4-hydroxy-3-chlorophenyl)fluorene],9,9-bis(4-hydroxy-3-bromophenyl)fluorene] 9,9-bis(4-hydroxy-3-fluorophenyl)fluorene, 9,9-bis(4-hydroxy-3-methoxy 9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene, 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene [9,9-bis (4-hydroxy-3,5-dimethylphenyl)fluorene],9,9-bis(4-hydroxy-3,5-dichlorophenyl)indole [9,9-bis(4-hydroxy-3,5-dichlorophenyl) a compound such as fluorene], 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene.
上述鹵化環氧丙烷(epihalohydrin)可包括但不限於3-氯-1,2-環氧丙烷(epichlorohydrin)或3-溴-1,2-環氧丙烷(epibromohydrin)等。 The above-mentioned epihalohydrin may include, but is not limited to, 3-chloro-1,2-epoxyhydrin or 3-bromo-1,2-propylene oxide (epibromohydrin).
上述由雙酚芴型化合物與鹵化環氧丙烷反應所得之含環氧基之雙酚芴型化合物包含但不限於:(1)新日鐵化學(Nippon Steel Chemical Co.,Ltd)所製造之商品:例如ESF-300等;(2)大阪瓦斯(Osaka Gas Co.,Ltd)所製造 之商品:例如PG-100、EG-210等;(3)短信科技(S.M.S Technology Co.,Ltd)所製造之商品:例如SMS-F9PhPG、SMS-F9CrG、SMS-F914PG等。 The epoxy group-containing bisphenol quinone type compound obtained by reacting the bisphenol quinoid compound with the halogenated propylene oxide includes, but is not limited to: (1) a product manufactured by Nippon Steel Chemical Co., Ltd. : for example, ESF-300, etc.; (2) manufactured by Osaka Gas Co., Ltd. Goods such as PG-100, EG-210, etc.; (3) Products manufactured by S.M.S. Technology Co., Ltd.: for example, SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, and the like.
其次,上述具有至少二個環氧基的環氧化合物(c-1-1)亦可具有如下式(II-2)所示之結構:
於式(II-2)中,R5c至R18c分別為相同或不同,且可各自獨立表示氫原子、鹵素原子、碳數為1至8之烷基或碳數為6至15之芳香基;及g表示0至10的整數。 In the formula (II-2), R 5c to R 18c are the same or different, and each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms. ; and g represents an integer from 0 to 10.
前述式(II-2)之具有至少二個環氧基的環氧化合物(c-1-1)例如是藉由在鹼金屬氫氧化物存在下,使具有下式(II-2-1)結構之化合物與鹵化環氧丙烷進行反應而得。 The epoxy compound (c-1-1) having at least two epoxy groups of the above formula (II-2) is, for example, obtained by the following formula (II-2-1) in the presence of an alkali metal hydroxide The compound of the structure is obtained by reacting with a halogenated propylene oxide.
在式(II-2-1)中,R5c至R18c以及g之定義係分別與式(II-2)中之R5c至R18c以及g之定義相同,在此不另贅述。 In formula (II-2-1), R 5c R 18c is defined to g, respectively, and the lines 5c and R 18c is defined to g of the same formula R (II-2) in the, and is not repeated herein.
再者,前述式(II-2)之具有至少二個環氧基的環氧化合物(c-1-1)例如是在酸觸媒存在下,使用具有下式(II-2-2)結構之化合物與酚(phenol)類進行縮合反應後,形 成具有式(II-2-1)結構之化合物。接著,藉由加入過量的鹵化環氧丙烷進行脫鹵化氫反應(dehydrohalogenation),而獲得如式(II-2)所示之具有至少二個環氧基的環氧化合物(c-1-1)。 Further, the epoxy compound (c-1-1) having at least two epoxy groups of the above formula (II-2) is, for example, in the presence of an acid catalyst, and has a structure of the following formula (II-2-2). After the condensation reaction of the compound with a phenol, the shape A compound having the structure of the formula (II-2-1). Next, dehydrohalogenation is carried out by adding an excess of halogenated propylene oxide to obtain an epoxy compound (c-1-1) having at least two epoxy groups as shown in the formula (II-2). .
在上式(II-2-2)中,R19c與R20c分別為相同或不同之氫原子、鹵素原子、碳數為1至8之烷基或碳數為6至15之芳香基;X1及X2分別為相同或不同之鹵素原子、碳數為1至6之烷基或碳數為1至6之烷氧基。較佳地,前述之鹵素原子可例如氯或溴,前述之烷基可例如甲基、乙基或第三丁基,前述之烷氧基可例如甲氧基或乙氧基。 In the above formula (II-2-2), R 19c and R 20c are the same or different hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; 1 and X 2 are each the same or different halogen atom, an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms. Preferably, the aforementioned halogen atom may be, for example, chlorine or bromine, and the aforementioned alkyl group may be, for example, a methyl group, an ethyl group or a third butyl group, and the aforementioned alkoxy group may be, for example, a methoxy group or an ethoxy group.
作為上述酚類的具體例,可列舉但不限於如:酚(phenol)、甲酚(cresol)、乙酚(ethylphenol)、n-丙酚(n-propylphenol)、異丁酚(isobutylphenol)、t-丁酚(t-butylphenol)、辛酚(octylphenol)、壬基苯酚(nonylphenol)、茬酚(xylenol)、甲基丁基苯酚(methylbutylphenol)、二第三丁基酚(di-t-butylphenol)、乙烯苯酚(vinylphenol)、丙烯苯酚(propenylphenol)、乙炔苯酚(ethinylphenol)、環戊苯酚(cyclopentylphenol)、環己基酚(cyclohexylphenol)或環己基甲酚(cyclohexylcresol)等。上述酚類一般可單獨或混合多種使用。 Specific examples of the above phenols include, but are not limited to, phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, t. -t-butylphenol, octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol , vinylphenol, propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexylcresol. The above phenols can be generally used singly or in combination of two or more.
基於上述具有式(II-2-2)結構之化合物的使用量為1莫耳,酚類的使用量為0.5莫耳至20莫耳,其中以2莫耳至15莫耳較佳。 The compound having the structure of the above formula (II-2-2) is used in an amount of 1 mole, and the phenol is used in an amount of 0.5 mole to 20 moles, preferably 2 moles to 15 moles.
作為上述酸觸媒的具體例,可列舉:鹽酸、硫酸、對甲苯磺酸(p-toluenesulfonic acid)、草酸(oxalic acid)、三氟化硼(boron trifluoride)、無水氯化鋁(anhydrous aluminium chloride)、氯化鋅(zinc chloride)等,其中以對甲苯磺酸、硫酸或鹽酸較佳。上述酸觸媒可單獨或混合多種使用。 Specific examples of the acid catalyst include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, oxalic acid, boron trifluoride, and anhydrous aluminum chloride. ), zinc chloride or the like, wherein p-toluenesulfonic acid, sulfuric acid or hydrochloric acid is preferred. The above acid catalysts may be used singly or in combination of two or more.
另外,上述酸觸媒之使用量雖無特別之限制,但基於上述具有式(II-2-2)結構之化合物的使用量為100重量百分比(wt%),酸觸媒的使用量較佳為0.1wt%至30wt%。 Further, the amount of the acid catalyst used is not particularly limited, but the amount of the acid catalyst used is preferably 100% by weight (wt%) based on the compound having the structure of the formula (II-2-2). It is from 0.1 wt% to 30 wt%.
上述縮合反應可在無溶劑或是在有機溶劑存在下進行。其次,上述有機溶劑的具體例可列舉:甲苯(toluene)、二甲苯(xylene)或甲基異丁基酮(methyl isobutyl ketone)等。上述有機溶劑可單獨或混合多種使用。 The above condensation reaction can be carried out in the absence of a solvent or in the presence of an organic solvent. Specific examples of the organic solvent include toluene, xylene, and methyl isobutyl ketone. The above organic solvents may be used singly or in combination of two or more.
基於具有式(II-2-2)結構之化合物及酚類的使用量總和為100wt%,上述有機溶劑的使用量為50wt%至300wt%,其中以100wt%至250wt%較佳。另外,上述縮合反應的操作溫度為40℃至180℃,且縮合反應的操作時間為1小時至8小時。 The total amount of the compound and the phenol used based on the structure of the formula (II-2-2) is 100% by weight, and the above organic solvent is used in an amount of 50% by weight to 300% by weight, preferably 100% by weight to 250% by weight. Further, the above condensation reaction has an operation temperature of 40 ° C to 180 ° C, and the operation time of the condensation reaction is 1 hour to 8 hours.
在完成上述縮合反應後,可進行中和處理或水 洗處理。上述中和處理是將反應後的溶液之pH值調整為pH 3至pH 7,其中以pH 5至pH 7較佳。上述水洗處理可使用中和劑來進行,此中和劑為鹼性物質,且其具體例可列舉:氫氧化鈉(sodium hydroxide)、氫氧化鉀(potassium hydroxide)等鹼金屬氫氧化物;氫氧化鈣(calcium hydroxide)、氫氧化鎂(magnesium hydroxide)等鹼土類金屬氫氧化物;二伸乙三胺(diethylene triamine)、三伸乙四胺(triethylene tetramine)、苯胺(aniline)、苯二胺(phenylene diamine)等有機胺;以及氨(ammonia)、磷酸二氫鈉(sodium dihydrogen phosphate)等。上述水洗處理可採用習知方法進行,例如,在反應後的溶液中,加入含中和劑的水溶液,反覆進行萃取即可。經中和處理或水洗處理後,經減壓加熱處理,將未反應的酚類及溶劑予以餾除,並進行濃縮,即可獲得具有式(II-2-1)結構之化合物。 After the above condensation reaction is completed, neutralization treatment or water can be performed. Wash treatment. The above neutralization treatment is to adjust the pH of the solution after the reaction to pH 3 to pH 7, preferably pH 5 to pH 7. The water washing treatment may be carried out using a neutralizing agent, and the neutralizing agent is an alkaline substance, and specific examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; and hydrogen; Alkaline earth metal hydroxides such as calcium hydroxide and magnesium hydroxide; diethylene triamine, triethylene tetramine, aniline, phenylenediamine Organic amines such as (phenylene diamine); and ammonia, sodium dihydrogen phosphate, and the like. The above washing treatment can be carried out by a conventional method. For example, an aqueous solution containing a neutralizing agent is added to the solution after the reaction, and extraction can be carried out repeatedly. After the neutralization treatment or the water washing treatment, the unreacted phenols and the solvent are distilled off by heating under reduced pressure, and concentrated to obtain a compound having the structure of the formula (II-2-1).
作為上述鹵化環氧丙烷的具體例,可例舉:3-氯-1,2-環氧丙烷(3-chloro-1,2-epoxypropane)、3-溴-1,2-環氧丙烷(3-bromo-1,2-epoxypropane)或上述任意組合。在進行上述脫鹵化氫反應之前,可預先添加或於反應過程中添加氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物。上述脫鹵化氫反應的操作溫度為20℃至120℃,其操作時間範圍為1小時至10小時。 Specific examples of the above halogenated propylene oxide include 3-chloro-1,2-epoxypropane and 3-bromo-1,2-epoxypropane (3). -bromo-1, 2-epoxypropane) or any combination of the above. An alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or added to the reaction before the dehydrohalogenation reaction. The above dehydrohalogenation reaction has an operating temperature of from 20 ° C to 120 ° C and an operation time ranging from 1 hour to 10 hours.
於本發明之具體例中,上述脫鹵化氫反應中所添加之鹼金屬氫氧化物亦可使用其水溶液。在此具體例中,將上述鹼金屬氫氧化物水溶液連續添加至脫鹵化氫反應系 統內的同時,可於減壓或常壓下,連續蒸餾出水及鹵化環氧丙烷,藉此分離並除去水,同時可將鹵化環氧丙烷連續地回流至反應系統內。 In a specific example of the present invention, an aqueous solution of the alkali metal hydroxide added to the dehydrohalogenation reaction may be used. In this specific example, the above aqueous alkali metal hydroxide solution is continuously added to the dehydrohalogenation reaction system. At the same time, water and halogenated propylene oxide can be continuously distilled under reduced pressure or normal pressure to separate and remove water, and the halogenated propylene oxide can be continuously refluxed into the reaction system.
上述脫鹵化氫反應進行前,亦可添加氯化四甲銨(tetramethyl ammonium chloride)、溴化四甲銨(tetramethyl ammonium bromide)、三甲基苄基氯化銨(trimethyl benzyl ammonium chloride)等的四級銨鹽作為觸媒,並在50℃至150℃下,反應1小時至5小時,再加入鹼金屬氫氧化物或其水溶液,於20℃至120℃的溫度下,使其反應1小時至10小時,以進行脫鹵化氫反應。 Before the dehydrohalogenation reaction is carried out, tetramethyl ammonium chloride, tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride or the like may be added. The ammonium salt is used as a catalyst, and reacted at 50 ° C to 150 ° C for 1 hour to 5 hours, and then an alkali metal hydroxide or an aqueous solution thereof is added thereto, and the reaction is carried out at a temperature of 20 ° C to 120 ° C for 1 hour. 10 hours for the dehydrohalogenation reaction.
基於上述具有式(II-2-1)結構之化合物中的羥基總當量為1當量,上述鹵化環氧丙烷的使用量可為1當量至20當量,其中以2當量至10當量較佳。基於上述具有式(C-II-1)結構之化合物中的羥基總當量為1當量,上述脫鹵化氫反應中添加的鹼金屬氫氧化物的使用量可為0.8當量至15當量,其中以0.9當量至11當量較佳。 The halogenated propylene oxide may be used in an amount of from 1 equivalent to 20 equivalents, preferably from 2 equivalents to 10 equivalents, based on 1 equivalent of the total hydroxyl group in the compound of the above formula (II-2-1). The alkali metal hydroxide added in the above dehydrohalogenation reaction may be used in an amount of from 0.8 equivalents to 15 equivalents, based on 0.9 equivalents based on the total hydroxyl group equivalent of the above compound having the structure of the formula (C-II-1). Equivalent to 11 equivalents is preferred.
此外,為了使上述脫鹵化氫反應順利進行,除了可添加甲醇、乙醇等醇類之外,亦可添加二甲碸(dimethyl sulfone)、二甲亞碸(dimethyl sulfoxide)等非質子性(aprotic)的極性溶媒等來進行反應。在使用醇類的情況下,基於上述鹵化環氧丙烷的總量為100wt%,醇類的使用量可為2wt%至20wt%,較佳為4wt%至15wt%。在使用非質子性的極性溶媒的例子中,基於鹵化環氧丙烷的總量為100wt%,非質子性的極性溶媒的使用量可為5wt% 至100wt%,其中,以10wt%至90wt%較佳。 Further, in order to smoothly carry out the above-described dehydrohalogenation reaction, an aprotic such as dimethyl sulfone or dimethyl sulfoxide may be added in addition to an alcohol such as methanol or ethanol. A polar solvent or the like is used to carry out the reaction. In the case of using an alcohol, the alcohol may be used in an amount of 2% by weight to 20% by weight, preferably 4% by weight to 15% by weight based on the total amount of the above-mentioned halogenated propylene oxide being 100% by weight. In the case of using an aprotic polar solvent, the total amount of the halogenated propylene oxide is 100% by weight, and the aprotic polar solvent can be used in an amount of 5% by weight. Up to 100% by weight, wherein 10% by weight to 90% by weight is preferred.
在完成脫鹵化氫反應後,可選擇性地進行水洗處理。之後,利用加熱減壓的方式除去鹵化環氧丙烷、醇類及非質子性的極性溶媒等。上述加熱減壓例如是於溫度為110℃至250℃,且壓力為1.3kPa(10mmHg)以下的環境下進行。 After completion of the dehydrohalogenation reaction, a water washing treatment can be selectively performed. Thereafter, the halogenated propylene oxide, the alcohol, and the aprotic polar solvent are removed by heating and decompression. The heating and depressing is performed, for example, in an environment having a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.
為了避免形成之環氧樹脂含有加水分解性鹵素,可將脫鹵化氫反應後的溶液加入甲苯、甲基異丁基酮(methyl isobutyl ketone)等溶劑,並加入氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物水溶液,再次進行脫鹵化氫反應。在脫鹵化氫反應中,基於上述具有式(II-2-1)結構之化合物中的羥基總當量為1當量,鹼金屬氫氧化物的使用量為0.01莫耳至0.3莫耳,其中,以0.05莫耳至0.2莫耳較佳。另外,上述脫鹵化氫反應的操作溫度範圍為50℃至120℃,且其操作時間範圍為0.5小時至2小時。 In order to prevent the formed epoxy resin from containing a hydrolyzable halogen, the solution after the dehydrohalogenation reaction may be added to a solvent such as toluene or methyl isobutyl ketone, and a base such as sodium hydroxide or potassium hydroxide may be added. The metal hydroxide aqueous solution is again subjected to a dehydrohalogenation reaction. In the dehydrohalogenation reaction, the total equivalent weight of the hydroxyl group in the compound having the structure of the above formula (II-2-1) is 1 equivalent, and the alkali metal hydroxide is used in an amount of 0.01 mol to 0.3 mol, wherein 0.05 moles to 0.2 moles are preferred. Further, the above dehydrohalogenation reaction has an operating temperature in the range of 50 ° C to 120 ° C and an operation time ranging from 0.5 hour to 2 hours.
在完成脫鹵化氫反應後,藉由過濾及水洗等步驟去除鹽類。此外,亦可利用加熱減壓的方式,將甲苯、甲基異丁基酮等溶劑予以餾除,而可獲得如式(II-2)所示之具有至少二個環氧基的環氧化合物(c-1-1)。上述式(II-2)之具有至少二個環氧基的環氧化合物(c-1-1)可包含但不限於如商品名為NC-3000、NC-3000H、NC-3000S及NC-3000P等日本化藥(Nippon Kayaku Co.Ltd.)所製造之商品。 After completion of the dehydrohalogenation reaction, the salts are removed by filtration, washing, and the like. Further, a solvent such as toluene or methyl isobutyl ketone may be distilled off by heating and decompression to obtain an epoxy compound having at least two epoxy groups as shown in the formula (II-2). (c-1-1). The epoxy compound (c-1-1) having at least two epoxy groups of the above formula (II-2) may include, but is not limited to, trade names NC-3000, NC-3000H, NC-3000S, and NC-3000P. A product manufactured by Nippon Kayaku Co. Ltd..
前述具有至少一個羧酸基及至少一個乙烯性不 飽和基的化合物(c-1-2)例如是選自於由以下(1)至(3)所組成之群組:(1)丙烯酸、甲基丙烯酸、2-甲基丙烯醯氧乙基丁二酸(2-methacryloyloxyethylbutanedioic acid)、2-甲基丙烯醯氧丁基丁二酸、2-甲基丙烯醯氧乙基己二酸、2-甲基丙烯醯氧丁基己二酸、2-甲基丙烯醯氧乙基六氫鄰苯二甲酸、2-甲基丙烯醯氧乙基馬來酸、2-甲基丙烯醯氧丙基馬來酸、2-甲基丙烯醯氧丁基馬來酸、2-甲基丙烯醯氧丙基丁二酸、2-甲基丙烯醯氧丙基己二酸、2-甲基丙烯醯氧丙基四氫鄰苯二甲酸、2-甲基丙烯醯氧丙基鄰苯二甲酸、2-甲基丙烯醯氧丁基鄰苯二甲酸、或2-甲基丙烯醯氧丁基氫鄰苯二甲酸;(2)由含羥基之(甲基)丙烯酸酯與二元羧酸化合物反應而得之化合物,其中二元羧酸化合物包含但不限於己二酸、丁二酸、馬來酸、鄰苯二甲酸;(3)由含羥基之(甲基)丙烯酸酯與羧酸酐化合物反應而得之半酯化合物,其中含羥基之(甲基)丙烯酸酯包含但不限於2-羥基乙基丙烯酸酯[(2-hydroxyethyl)acrylate]、2-羥基乙基甲基丙烯酸酯[(2-hydroxyethyl)methacrylate]、2-羥基丙基丙烯酸酯[(2-hydroxypropyl)acrylate]、2-羥基丙基甲基丙烯酸酯[(2-hydroxypropyl)methacrylate]、4-羥基丁基丙烯酸酯[(4-hydroxybutyl)acrylate]、4-羥基丁基甲基丙烯酸酯[(4-hydroxybutyl)methacrylate]、或季戊四醇三甲基丙烯酸酯等。另外,此處所述之羧酸酐化合物可與下述第一鹼可溶性樹脂(C-1)之混合物所含的羧酸酐化合物(c-1-3)相同,故於此不再贅述。 The foregoing has at least one carboxylic acid group and at least one ethylenicity The saturated group compound (c-1-2) is, for example, selected from the group consisting of (1) to (3): (1) acrylic acid, methacrylic acid, 2-methylpropenyloxyethyl butyl 2-methacryloyloxyethylbutanedioic acid, 2-methylpropenyloxybutyl succinic acid, 2-methylpropenyloxyethyl adipate, 2-methylpropenyloxybutyl adipate, 2- Methacryloxyethyl hexahydrophthalic acid, 2-methylpropenyloxyethyl maleic acid, 2-methylpropenyloxypropyl maleic acid, 2-methylpropenyloxybutylene Acid, 2-methylpropenyloxypropyl succinic acid, 2-methylpropenyloxypropyl adipate, 2-methylpropenyloxypropyltetrahydrophthalic acid, 2-methylpropene醯oxypropyl phthalic acid, 2-methyl propylene oxybutyl phthalic acid, or 2-methyl propylene oxy butyl hydrogen phthalate; (2) hydroxyl group-containing (methyl) a compound obtained by reacting an acrylate with a dicarboxylic acid compound, wherein the dicarboxylic acid compound includes, but is not limited to, adipic acid, succinic acid, maleic acid, phthalic acid; (3) a hydroxyl group-containing (A) Acrylate and carboxylic anhydride compound a half ester compound in which a hydroxyl group-containing (meth) acrylate includes, but is not limited to, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate ], 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate ], 4-hydroxybutyl methacrylate or pentaerythritol trimethacrylate. Further, the carboxylic anhydride compound described herein may be the same as the carboxylic anhydride compound (c-1-3) contained in the mixture of the first alkali-soluble resin (C-1) described below, and thus will not be described herein.
上述第一鹼可溶性樹脂(C-1)之混合物更可選擇性地包含羧酸酐化合物(c-1-3)及/或含環氧基的化合物(c-1-4)。上述羧酸酐化合物(c-1-3)可選自由以下(1)至(2)所組成之群組:(1)丁二酸酐(butanedioic anhydride)、順丁烯二酸酐(maleic anhydride)、衣康酸酐(Itaconic anhydride)、鄰苯二甲酸酐(phthalic anhydride)、四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride)、六氫鄰苯二甲酸酐(hexahydrophthalic anhydride)、甲基四氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、甲基橋亞甲基四氫鄰苯二甲酸酐(methyl endo-methylene tetrahydro phthalic anhydride)、氯茵酸酐(chlorendic anhydride)、戊二酸酐或偏三苯甲酸酐(1,3-dioxoisobenzofuran-5-carboxylic anhydride)等二元羧酸酐化合物;以及(2)二苯甲酮四甲酸二酐(benzophenone tetracarboxylic dianhydride,簡稱BTDA)、雙苯四甲酸二酐或雙苯醚四甲酸二酐等四元羧酸酐化合物。 The mixture of the above first alkali-soluble resin (C-1) may more optionally contain a carboxylic anhydride compound (c-1-3) and/or an epoxy group-containing compound (c-1-4). The above carboxylic anhydride compound (c-1-3) may be selected from the group consisting of (1) to (2): (1) butanedioic anhydride, maleic anhydride, and clothing. Itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride , methyl hexahydrophthalic anhydride, methyl endo-methylene tetrahydro phthalic anhydride, chlorendic anhydride, glutaric anhydride or trimellitic acid a dicarboxylic anhydride compound such as 1,3-dioxoisobenzofuran-5-carboxylic anhydride; and (2) benzophenone tetracarboxylic dianhydride (BTDA), diphenyltetracarboxylic dianhydride or diphenyl A tetracarboxylic anhydride compound such as ether tetracarboxylic dianhydride.
上述含環氧基的化合物(c-1-4)例如是選自甲基丙烯酸環氧丙酯、3,4-環氧基環己基甲基丙烯酸酯、含不飽和基的縮水甘油醚化合物、含環氧基的不飽和化合物或上述之任意組合所組成的群組。前述含不飽和基的縮水甘油醚化合物包含但不限於商品名Denacol EX-111、EX-121 Denacol、Denacol EX-141、Denacol EX-145、Denacol EX-146、Denacol EX-171、Denacol EX-192等的化合物(以上為長瀨化成工業株式會社之商品)。 The epoxy group-containing compound (c-1-4) is, for example, selected from the group consisting of glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, and an unsaturated group-containing glycidyl ether compound. An epoxy group-containing unsaturated compound or a group consisting of any combination of the above. The unsaturated group-containing glycidyl ether compound includes, but is not limited to, the trade names Denacol EX-111, EX-121 Denacol, Denacol EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171, and Denacol EX-192. Compound (the above is a product of Nagase Chemical Industry Co., Ltd.).
前述第一鹼可溶性樹脂(C-1)可由式(II-1)之具有至少二個環氧基的環氧化合物(c-1-1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c-1-2)進行聚合反應,形成含羥基的反應產物,接著,再添加羧酸酐化合物(c-1-3)進行反應所製得。基於上述含羥基的反應產物的羥基總當量為1當量,羧酸酐化合物(c-1-3)所含有的酸酐基的當量較佳為0.4當量至1當量,更佳為0.75當量至1當量。當使用多個羧酸酐化合物(c-1-3)時,可於反應中依序添加或同時添加。當使用二元羧酸酐化合物及四元羧酸酐化合物作為羧酸酐化合物(c-1-3)時,二元羧酸酐化合物及四元羧酸酐化合物的莫耳比例較佳為1/99至90/10,更佳為5/95至80/20。另外,上述反應的操作溫度範圍例如是在50℃至130℃的範圍。 The aforementioned first alkali-soluble resin (C-1) may be an epoxy compound (c-1-1) having at least two epoxy groups of the formula (II-1) and having at least one carboxylic acid group and at least one ethylenicity The saturated group compound (c-1-2) is subjected to a polymerization reaction to form a hydroxyl group-containing reaction product, followed by addition of a carboxylic anhydride compound (c-1-3) to carry out a reaction. The equivalent weight of the hydroxyl group-based reaction product is 1 equivalent, and the equivalent weight of the acid anhydride group contained in the carboxylic anhydride compound (c-1-3) is preferably 0.4 equivalent to 1 equivalent, more preferably 0.75 equivalent to 1 equivalent. When a plurality of carboxylic anhydride compounds (c-1-3) are used, they may be added sequentially or simultaneously in the reaction. When a dicarboxylic anhydride compound and a tetracarboxylic anhydride compound are used as the carboxylic anhydride compound (c-1-3), the molar ratio of the dicarboxylic anhydride compound and the tetracarboxylic anhydride compound is preferably from 1/99 to 90/ 10, more preferably 5/95 to 80/20. Further, the operating temperature range of the above reaction is, for example, in the range of 50 ° C to 130 ° C.
前述第一鹼可溶性樹脂(C-1)可由式(II-2)之具有至少二個環氧基的環氧化合物(c-1-1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c-1-2)進行反應,形成含羥基的反應產物,接著,再藉由添加羧酸酐化合物(c-1-3)及/或含環氧基的化合物(c-1-4)進行聚合反應所製得。基於式(II-2)之具有至少二個環氧基的環氧化合物(c-1-1)上的環氧基總當量為1當量,上述具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c-1-2)的酸價當量較佳為0.8當量至1.5當量,更佳為0.9當量至1.1當量。基於上述含羥基的反應產物的羥基總量為100莫耳百分比(莫耳%),羧酸酐化合物(c-1-3)的使用量較佳為10莫耳%至100 莫耳%,更佳為20莫耳%至100莫耳%,特佳為30莫耳%至100莫耳%。 The first alkali-soluble resin (C-1) may be an epoxy compound (c-1-1) having at least two epoxy groups of the formula (II-2) and having at least one carboxylic acid group and at least one ethylenicity The saturated group compound (c-1-2) is reacted to form a hydroxyl group-containing reaction product, followed by addition of a carboxylic anhydride compound (c-1-3) and/or an epoxy group-containing compound (c-1). -4) A polymerization reaction is carried out. The epoxy group compound (c-1-1) having at least two epoxy groups based on the formula (II-2) has a total equivalent weight of 1 equivalent, and the above has at least one carboxylic acid group and at least one ethylenicity. The acid value equivalent of the saturated group compound (c-1-2) is preferably from 0.8 equivalents to 1.5 equivalents, more preferably from 0.9 equivalents to 1.1 equivalents. The total amount of hydroxyl groups based on the above hydroxyl group-containing reaction product is 100 mol% (mol%), and the carboxylic anhydride compound (c-1-3) is preferably used in an amount of 10 mol% to 100%. Molar%, more preferably from 20 mol% to 100 mol%, particularly preferably from 30 mol% to 100 mol%.
在製備上述第一鹼可溶性樹脂(C-1)時,為了加速反應,通常會於反應溶液中添加鹼性化合物作為反應觸媒。上述反應觸媒可單獨或混合使用,且上述反應觸媒包含但不限於:三苯基膦(triphenyl phosphine)、三苯基銻(triphenyl stibine)、三乙胺(triethylamine)、三乙醇胺(triethanolamine)、氯化四甲基銨(tetramethyl ammonium chloride)、氯化苄基三乙基銨(benzyltriethyl ammonium chloride)等。基於上述具有至少二個環氧基的環氧化合物(c-1-1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c-1-2)的使用量總和為100重量份,反應觸媒的使用量較佳為0.01重量份至10重量份,更佳為0.3重量份至5重量份。 In the preparation of the above first alkali-soluble resin (C-1), in order to accelerate the reaction, a basic compound is usually added as a reaction catalyst to the reaction solution. The above reaction catalysts may be used singly or in combination, and the above reaction catalysts include, but are not limited to, triphenyl phosphine, triphenyl stibine, triethylamine, triethanolamine. , tetramethyl ammonium chloride, benzyltriethyl ammonium chloride, and the like. The total amount of the epoxy compound (c-1-1) having at least two epoxy groups and the compound (c-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100. The amount of the reaction catalyst used is preferably from 0.01 part by weight to 10 parts by weight, more preferably from 0.3 part by weight to 5 parts by weight.
此外,為了控制聚合度,通常還會於反應溶液中添加聚合抑制劑(polymerization inhibitor)。上述聚合抑制劑可包含但不限於:甲氧基酚(methoxyphenol)、甲基氫醌(methylhydroquinone)、氫醌(hydroquinone)、2,6-二第三丁基對甲酚(2,6-di-t-butyl-p-cresol)或吩噻嗪(phenothiazine)等。一般而言,上述聚合抑制劑可單獨或混合多種使用。基於上述具有至少二個環氧基的環氧化合物(c-1-1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c-1-2)的使用量總和為100重量份,聚合抑制劑的使用量較佳為0.01重量份至10重量份,更佳為0.1重量 份至5重量份。 Further, in order to control the degree of polymerization, a polymerization inhibitor is usually added to the reaction solution. The above polymerization inhibitor may include, but is not limited to, methoxyphenol, methylhydroquinone, hydroquinone, 2,6-di-t-butyl-p-cresol (2,6-di) -t-butyl-p-cresol) or phenothiazine. In general, the above polymerization inhibitors may be used singly or in combination of two or more. The total amount of the epoxy compound (c-1-1) having at least two epoxy groups and the compound (c-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100. The amount of the polymerization inhibitor to be used is preferably from 0.01 part by weight to 10 parts by weight, more preferably 0.1 part by weight. Parts to 5 parts by weight.
在製備該第一鹼可溶性樹脂(C-1)時,必要時可使用聚合反應溶劑。作為上述聚合反應溶劑的具體例,可列舉如:乙醇、丙醇、異丙醇、丁醇、異丁醇、2-丁醇、己醇或乙二醇等醇類化合物;甲乙酮或環己酮等酮類化合物;甲苯或二甲苯等芳香族烴類化合物;賽珞素(cellosolve)或丁基賽珞素(butyl cellosolve)等賽珞素類化合物;卡必妥(carbitol)或丁基卡必妥(butyl carbitol)等卡必妥類化合物;丙二醇單甲醚(propylene glycol monomethyl ether)等丙二醇烷基醚類化合物;二丙二醇單甲醚[di(propylene glycol)methyl ether]等多丙二醇烷基醚[poly(propylene glycol)alkyl ether]類化合物;醋酸乙酯、醋酸丁酯、乙二醇乙醚醋酸酯(ethylene glycol monoethyl ether acetate)或丙二醇甲醚醋酸酯(propylene glycol methyl ether acetate)等醋酸酯類化合物;乳酸乙酯(ethyl lactate)或乳酸丁酯(butyl lactate)等乳酸烷酯(alkyl lactate)類化合物;或二烷基二醇醚類;或3-乙氧基丙酸乙酯。上述聚合反應溶劑一般可單獨或混合多種使用。另外,上述第一鹼可溶性樹脂(C-1)的酸價較佳為50mgKOH/g至200mgKOH/g,更佳為60mgKOH/g至150mgKOH/g。 In the preparation of the first alkali-soluble resin (C-1), a polymerization solvent can be used as necessary. Specific examples of the polymerization reaction solvent include alcohol compounds such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol or ethylene glycol; methyl ethyl ketone or cyclohexanone; Ketone compounds; aromatic hydrocarbon compounds such as toluene or xylene; celecin compounds such as cellosolve or butyl cellosolve; carbitol or butyl carbene a carbaryl compound such as butyl carbitol; a propylene glycol alkyl ether compound such as propylene glycol monomethyl ether; and a polypropylene glycol alkyl ether such as di(propylene glycol) methyl ether [poly(propylene glycol) alkyl ether] compound; acetate such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate or propylene glycol methyl ether acetate a compound; an alkyl lactate compound such as ethyl lactate or butyl lactate; or a dialkyl glycol ether; or ethyl 3-ethoxypropionate. The above polymerization solvent can be generally used singly or in combination of two or more. Further, the acid value of the above first alkali-soluble resin (C-1) is preferably from 50 mgKOH/g to 200 mgKOH/g, more preferably from 60 mgKOH/g to 150 mgKOH/g.
另外,上述第一鹼可溶性樹脂(C-1)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯換算的數目平均分子量一般為500至10,000,較 佳為800至8,000,更佳為1,000至6,000。 Further, the first alkali-soluble resin (C-1) has a polystyrene-equivalent number average molecular weight of 500 to 10,000 as measured by a gel permeation chromatography (GPC). Good is 800 to 8,000, more preferably 1,000 to 6,000.
於本發明之具體例中,基於鹼可溶性樹脂(C)之使用量總和為100重量份,第一鹼可溶性樹脂(C-1)之使用量範圍為10重量份至100重量份;較佳為15重量份至90重量份;更佳為20重量份至80重量份。當使用第一鹼可溶性樹脂(C-1)時,感光性樹脂組成物的耐化性表現更佳。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the first alkali-soluble resin (C-1) is used in an amount ranging from 10 parts by weight to 100 parts by weight; preferably 15 parts by weight to 90 parts by weight; more preferably 20 parts by weight to 80 parts by weight. When the first alkali-soluble resin (C-1) is used, the chemical resistance of the photosensitive resin composition is more excellent.
本發明之鹼可溶樹脂(C)可更包含第二鹼可溶性樹脂(C-2),其係由具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)以及其他可共聚合之乙烯性不飽和單體(c-2-2)共聚合後,與具有環氧基之乙烯性不飽和單體(c-2-3)反應而得。 The alkali-soluble resin (C) of the present invention may further comprise a second alkali-soluble resin (C-2) which is an ethylenically unsaturated monomer having one or more carboxylic acids or carboxylic anhydrides (c-2-1) And another copolymerizable ethylenically unsaturated monomer (c-2-2), which is obtained by copolymerization with an ethylenically unsaturated monomer (c-2-3) having an epoxy group.
在一實施例中,此第二鹼可溶性樹脂(C-2)係先將具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)與其他可共聚合之乙烯性不飽和單體(c-2-2)進行雙鍵共聚合反應,以形成一聚合物,其中此聚合物之側鏈具有羧酸基。然後,此聚合物之側鏈中的羧酸基與具有環氧基之乙烯性不飽和單體(c-2-3)進行加成反應,而製得第二鹼可溶性樹脂(C-2)。 In one embodiment, the second alkali-soluble resin (C-2) is first copolymerizable with an ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides. The ethylenically unsaturated monomer (c-2-2) undergoes double bond copolymerization to form a polymer in which the side chain of the polymer has a carboxylic acid group. Then, the carboxylic acid group in the side chain of the polymer is subjected to an addition reaction with the ethylenically unsaturated monomer (c-2-3) having an epoxy group to prepare a second alkali-soluble resin (C-2). .
在另一實施例中,此第二鹼可溶性樹脂(C-2)係先將其他可共聚合之乙烯性不飽和單體(c-2-2)與具有環氧基之乙烯性不飽和單體(c-2-3)進行雙鍵共聚合反應,以形成一聚合物,其中此聚合物之側鏈具有環氧基。然後,此 聚合物之側鏈中的環氧基與具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)進行加成反應,而製得該第二鹼可溶性樹脂(C-2)。 In another embodiment, the second alkali-soluble resin (C-2) is a copolymerizable ethylenically unsaturated monomer (c-2-2) and an ethylenically unsaturated monomer having an epoxy group. The body (c-2-3) undergoes a double bond copolymerization reaction to form a polymer in which the side chain of the polymer has an epoxy group. Then this The epoxy group in the side chain of the polymer is subjected to an addition reaction with an ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides to prepare the second alkali-soluble resin ( C-2).
在又一實施例中,第二鹼可溶性樹脂(C-2)係先將其他可共聚合之乙烯性不飽和單體(c-2-2)與具有環氧基之乙烯性不飽和單體(c-2-3)進行雙鍵共聚合反應,以形成一聚合物,其中此聚合物之側鏈具有環氧基。然後,此聚合物之側鏈中的環氧基與具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)進行加成反應後,進一步與酸酐類化合物進行半酯化反應而製得該第二鹼可溶性樹脂(C-2)。 In still another embodiment, the second alkali-soluble resin (C-2) is a copolymerizable ethylenically unsaturated monomer (c-2-2) and an ethylenically unsaturated monomer having an epoxy group. (c-2-3) A double bond copolymerization reaction is carried out to form a polymer in which a side chain of the polymer has an epoxy group. Then, the epoxy group in the side chain of the polymer is subjected to an addition reaction with the ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides, and further subjected to an acid anhydride compound. The second alkali-soluble resin (C-2) is obtained by a half esterification reaction.
前述之具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1),其中,該具有一個或一個以上羧酸之乙烯性不飽和單體可包含但不限於不飽和單羧酸化合物、不飽和多羧酸化合物、具有不飽和基及一個羧酸基之多環化合物,或具有不飽和基及多個羧酸基之多環化合物。 The aforementioned ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides, wherein the ethylenically unsaturated monomer having one or more carboxylic acids may include, but is not limited to, no A saturated monocarboxylic acid compound, an unsaturated polycarboxylic acid compound, a polycyclic compound having an unsaturated group and a carboxylic acid group, or a polycyclic compound having an unsaturated group and a plurality of carboxylic acid groups.
前述不飽和單羧酸化合物可包含但不限於(甲基)丙烯酸、丁烯酸、α-氯丙烯酸、乙基丙烯酸、肉桂酸、2-(甲基)丙烯醯乙氧基丁二酸酯(2-(meth)acryloyloxy ethyl succinate monoester)、2-(甲基)丙烯醯乙氧基六氫化苯二甲酸酯、2-(甲基)丙烯醯乙氧基苯二甲酸酯或omega-羧酸基聚己內酯多元醇單丙烯酸酯等。該omega-羧酸基聚己內酯多元醇單丙烯酸酯可為東亞合成製造,型號為ARONIX M-5300之商品。 The aforementioned unsaturated monocarboxylic acid compound may include, but is not limited to, (meth)acrylic acid, crotonic acid, α -chloroacrylic acid, ethacrylic acid, cinnamic acid, 2-(methyl)acrylic acid ethoxylated succinate ( 2-(meth)acryloyloxy ethyl succinate monoester), 2-(methyl)acryl oxime ethoxy hexahydrophthalate, 2-(meth) propylene ethoxy ethoxylate or omega-carboxylate Acid-based polycaprolactone polyol monoacrylate or the like. The omega-carboxylic acid polycaprolactone polyol monoacrylate can be manufactured by East Asia Synthetic, model ARONIX M-5300.
前述不飽和多羧酸化合物可包含但不限於馬來酸、富馬酸、甲基富馬酸、衣康酸或檸康酸等。 The aforementioned unsaturated polycarboxylic acid compound may include, but is not limited to, maleic acid, fumaric acid, methyl fumaric acid, itaconic acid or citraconic acid, and the like.
前述具有不飽和基及一個羧酸基之多環化合物可包含但不限於5-羧酸基雙環[2.2.1]庚-2-烯、5-羧酸基-5-甲基雙環[2.2.1]庚-2-烯、5-羧酸基-5-乙基雙環[2.2.1]庚-2-烯、5-羧酸基-6-甲基雙環[2.2.1]庚-2-烯或5-羧酸基-6-乙基雙環[2.2.1]庚-2-烯等。 The above polycyclic compound having an unsaturated group and a carboxylic acid group may include, but is not limited to, 5-carboxylic acid bicyclo [2.2.1] hept-2-ene, 5-carboxylic acid-5-methyl bicyclo [2.2. 1]hept-2-ene, 5-carboxylic acid-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxylic acid-6-methylbicyclo[2.2.1]hept-2- Alkene or 5-carboxylic acid-6-ethylbicyclo[2.2.1]hept-2-ene and the like.
前述具有不飽和基及多個羧酸基的多環化合物可例如5,6-二羧酸基二環[2.2.1]庚-2-烯等。 The above polycyclic compound having an unsaturated group and a plurality of carboxylic acid groups may be, for example, 5,6-dicarboxylic acidbicyclo[2.2.1]hept-2-ene or the like.
較佳地,前述具有一個或一個以上羧酸之乙烯性不飽和單體是選自於丙烯酸、甲基丙烯酸、2-甲基丙烯醯乙氧基丁二酸酯、2-甲基丙烯醯基乙氧基六氫化苯二甲酸酯,或上述化合物之任意組合。 Preferably, the aforementioned ethylenically unsaturated monomer having one or more carboxylic acids is selected from the group consisting of acrylic acid, methacrylic acid, 2-methylpropenyl ethoxy succinate, and 2-methyl acrylonitrile. Ethoxy hexahydrophthalate, or any combination of the above.
前述具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1),其中,前述具有一個或一個以上羧酸酐之乙烯性不飽和單體可包含但不限於不飽和羧酸酐化合物或具有不飽和基與羧酸酐的多環化合物。 The aforementioned ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides, wherein the aforementioned ethylenically unsaturated monomer having one or more carboxylic anhydrides may include, but is not limited to, unsaturated A carboxylic anhydride compound or a polycyclic compound having an unsaturated group and a carboxylic anhydride.
前述不飽和羧酸酐化合物可包含但不限於馬來酸酐、富馬酸酐、甲基富馬酸酐、衣康酸酐或檸康酸酐等。前述具有不飽和基及羧酸酐的多環化合物可包含但不限於5,6-二羧酸酐二環[2.2.1]庚-2-烯等。 The aforementioned unsaturated carboxylic anhydride compound may include, but is not limited to, maleic anhydride, fumaric anhydride, methyl fumaric anhydride, itaconic anhydride or citraconic anhydride, and the like. The above polycyclic compound having an unsaturated group and a carboxylic anhydride may include, but is not limited to, 5,6-dicarboxylic anhydride bicyclo[2.2.1]hept-2-ene and the like.
較佳地,前述具有一個或一個以上羧酸酐之乙烯性不飽和單體為馬來酸酐。 Preferably, the aforementioned ethylenically unsaturated monomer having one or more carboxylic anhydrides is maleic anhydride.
上述之具有一個或一個以上羧酸或羧酸酐之乙 烯性不飽和單體(c-2-1)可單獨一種或混合複數種使用。 B of the above having one or more carboxylic acids or carboxylic anhydrides The ethylenically unsaturated monomer (c-2-1) may be used singly or in combination of plural kinds.
於本發明之具體例中,基於第二鹼可溶性樹脂(C-2)之具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)及其他可共聚合之乙烯性不飽和單體(c-2-2)共聚合用單體之使用量總和為100重量份,具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)之使用量範圍為10重量份至90重量份;較佳為15重量份至85重量份;更佳為20重量份至80重量份。 In a specific example of the present invention, the ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides based on the second alkali-soluble resin (C-2) and other copolymerizable monomers The ethylenically unsaturated monomer (c-2-2) copolymerization monomer is used in an amount of 100 parts by weight, and the ethylenically unsaturated monomer having one or more carboxylic acids or carboxylic anhydrides (c-2-1) The amount used is in the range of 10 parts by weight to 90 parts by weight; preferably 15 parts by weight to 85 parts by weight; more preferably 20 parts by weight to 80 parts by weight.
前述其他可共聚合之乙烯性不飽和單體(c-2-2)可包含但不限於(甲基)丙烯酸烷基酯、(甲基)丙烯酸脂環族酯、(甲基)丙烯酸芳基酯、不飽和二羧酸酯、(甲基)丙烯酸羥烷酯、具有(甲基)丙烯酸酯基的聚醚、苯乙烯化合物或上述化合物以外的不飽和化合物。 The aforementioned other copolymerizable ethylenically unsaturated monomer (c-2-2) may include, but is not limited to, alkyl (meth)acrylate, alicyclic (meth)acrylate, aryl (meth)acrylate An ester, an unsaturated dicarboxylic acid ester, a hydroxyalkyl (meth) acrylate, a polyether having a (meth) acrylate group, a styrene compound or an unsaturated compound other than the above compounds.
上述之(甲基)丙烯酸烷基酯可包含但不限於(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁基酯或(甲基)丙烯酸第三丁基酯等。 The above alkyl (meth)acrylate may include, but is not limited to, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, ( N-butyl acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate or t-butyl (meth)acrylate.
上述之(甲基)丙烯酸脂環族酯可包含但不限於(甲基)丙烯酸環己酯、(甲基)丙烯酸-2-甲基環己酯、(甲基)丙烯酸雙環戊酯{或稱三環[5.2.1.02,6]癸-8-基(甲基)丙烯酸酯}、(甲基)丙烯酸二環戊氧基乙酯、(甲基)丙烯酸異冰片酯或(甲基)丙烯酸四氫呋喃酯等。 The above (meth) acrylate cycloaliphatic ester may include, but is not limited to, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, dicyclopentyl (meth) acrylate {or Tricyclo [5.2.1.0 2,6 ]癸-8-yl (meth) acrylate}, dicyclopentyloxy (meth) acrylate, isobornyl (meth) acrylate or (meth) acrylate Tetrahydrofuran ester and the like.
上述(甲基)丙烯酸芳基酯可包含但不限於(甲 基)丙烯酸苯基酯或甲基丙烯酸苯甲酯等。 The above aryl (meth) acrylate may include, but is not limited to, (A) Base) phenyl acrylate or benzyl methacrylate, and the like.
前述不飽和二羧酸酯可包含但不限於馬來酸二乙酯、富馬酸二乙酯或衣康酸二乙酯等。 The aforementioned unsaturated dicarboxylic acid ester may include, but is not limited to, diethyl maleate, diethyl fumarate or diethyl itaconate.
前述(甲基)丙烯酸羥烷酯可包含但不限於(甲基)丙烯酸-2-羥基乙酯或(甲基)丙烯酸-2-羥基丙酯等。 The aforementioned hydroxyalkyl (meth)acrylate may include, but is not limited to, 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate.
前述具有(甲基)丙烯酸酯基的聚醚可包含但不限於聚乙二醇單(甲基)丙烯酸酯或聚丙二醇單(甲基)丙烯酸酯等。 The aforementioned polyether having a (meth) acrylate group may include, but not limited to, polyethylene glycol mono(meth)acrylate or polypropylene glycol mono(meth)acrylate.
前述苯乙烯系化合物可包含但不限於苯乙烯、α-甲基苯乙烯、間-甲基苯乙烯,對-甲基苯乙烯或對-甲氧基苯乙烯等。 The styrene-based compound may include, but is not limited to, styrene, α -methylstyrene, m-methylstyrene, p-methylstyrene or p-methoxystyrene.
上述化合物以外之不飽和化合物可包含但不限於丙烯腈、甲基丙烯腈、氯乙烯、偏二氯乙烯、丙烯醯胺、甲基丙烯醯胺、乙烯乙酯、1,3-丁二烯、異戊二烯、2,3-二甲基1,3-丁二烯、N-丁二醯亞胺基-3-馬來醯亞胺苯甲酸酯、N-丁二醯亞胺基-4-馬來醯亞胺丁酸酯、N-丁二醯亞胺基-6-馬來醯亞胺己酸酯、N-丁二醯亞胺基-3-馬來醯亞胺丙酸酯、N-(9-吖啶基)馬來醯亞胺、N-辛基馬來醯亞胺(N-octylmaleimide)、N-環己基馬來醯亞胺(N-cyclohexylmaleimide)或N-苯基馬來醯亞胺(N-phenylmaleimide)等。 The unsaturated compound other than the above compounds may include, but not limited to, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl ethyl ester, 1,3-butadiene, Isoprene, 2,3-dimethyl1,3-butadiene, N-butylenediamine-3-maleimide benzoate, N-butanediimide- 4-maleimide butyrate, N-butanediamine-6-maleimide caproate, N-butylenediamine-3-maleimide propionate , N-(9-acridinyl)maleimide, N-octylmaleimide, N-cyclohexylmaleimide or N-phenyl N-phenylmaleimide and the like.
前述其他可共聚合之乙烯性不飽和單體(c-2-2)可單獨一種或混合複數種使用。 The other copolymerizable ethylenically unsaturated monomer (c-2-2) may be used singly or in combination of plural kinds.
較佳地,前述其他可共聚合之乙烯性不飽和單 體(c-2-2)是選自於(甲基)丙烯酸甲酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸第三丁基酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸雙環戊酯、甲基丙烯酸異冰片酯、(甲基)丙烯酸二環戊氧基乙酯、苯乙烯、對-甲氧基苯乙烯或上述化合物之任意組合。 Preferably, the aforementioned other copolymerizable ethylenic unsaturated single The compound (c-2-2) is selected from the group consisting of methyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, and tert-butyl (meth)acrylate. Benzyl (meth)acrylate, dicyclopentanyl (meth)acrylate, isobornyl methacrylate, dicyclopentyloxyethyl (meth)acrylate, styrene, p-methoxystyrene or the above Any combination of compounds.
於本發明之具體例中,基於第二鹼可溶性樹脂(C-2)之具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)及其他可共聚合之乙烯性不飽和單體(c-2-2)共聚合用單體之使用量總和為100重量份,其他可共聚合之乙烯性不飽和單體(c-2-2)之使用量範圍為10重量份至90重量份;較佳為15重量份至85重量份;更佳為20重量份至80重量份。 In a specific example of the present invention, the ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides based on the second alkali-soluble resin (C-2) and other copolymerizable monomers The total amount of the monomers for copolymerization of the ethylenically unsaturated monomer (c-2-2) is 100 parts by weight, and the range of other copolymerizable ethylenically unsaturated monomers (c-2-2) is 10 parts by weight to 90 parts by weight; preferably 15 parts by weight to 85 parts by weight; more preferably 20 parts by weight to 80 parts by weight.
具有環氧基之乙烯性不飽和單體(c-2-3)可包含但不限於具有環氧基的(甲基)丙烯酸酯化合物、具有環氧基的α-烷基丙烯酸酯化合物或環氧丙醚化合物等。 The ethylenically unsaturated monomer (c-2-3) having an epoxy group may include, but is not limited to, a (meth) acrylate compound having an epoxy group, an α -alkyl acrylate compound having an epoxy group or a ring. Oxypropyl ether compounds and the like.
前述具有環氧基的(甲基)丙烯酸酯化合物可包含但不限於(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸2-甲基環氧丙酯、(甲基)丙烯酸3,4-環氧丁酯、(甲基)丙烯酸6,7-環氧庚酯、(甲基)丙烯酸3,4-環氧環己酯或(甲基)丙烯酸3,4-環氧環己基甲酯等。 The above epoxy group-containing (meth) acrylate compound may include, but is not limited to, glycidyl (meth) acrylate, 2-methyl propyl propyl (meth) acrylate, (meth) acrylate 3, 4 -butyl butyl acrylate, 6,7-epoxyheptyl (meth) acrylate, 3,4-epoxycyclohexyl (meth) acrylate or 3,4-epoxycyclohexyl (meth) acrylate Wait.
具有環氧基的α-烷基丙烯酸酯化合物可包含但不限於α-乙基丙烯酸環氧丙酯、α-正丙基丙烯酸環氧丙酯、α-正丁基丙烯酸環氧丙酯或α-乙基丙烯酸-6,7-環氧庚酯等。 The α -alkyl acrylate compound having an epoxy group may include, but is not limited to, α -ethyl acrylate propyl acrylate, α -n-propyl propylene acrylate, α -n-butyl propylene acrylate or α Ethyl acrylate-6,7-epoxyheptyl ester and the like.
環氧丙醚化合物可包含但不限於鄰-乙烯基苯甲基環氧丙醚(o-vinylbenzylglycidylether)、間-乙烯基苯甲基環氧丙醚(m-vinylbenzylglycidylether)或對-乙烯基苯甲基環氧丙醚(p-vinylbenzylglycidylether)等。 The glycidyl ether compound may include, but is not limited to, o-vinylbenzylglycidylether, m-vinylbenzylglycidylether or p-vinylbenzoic acid. P-vinylbenzylglycidylether and the like.
具有環氧基之乙烯性不飽和單體(c-2-3)可單獨一種或混合複數種使用。 The ethylenically unsaturated monomer (c-2-3) having an epoxy group may be used singly or in combination of plural kinds.
較佳地,前述具有環氧基之乙烯性不飽和單體(c-2-3)是選自於甲基丙烯酸環氧丙酯、甲基丙烯酸2-甲基環氧丙酯、甲基丙烯酸3,4-環氧環己基甲酯、甲基丙烯酸6,7-環氧庚酯、鄰-乙烯基苯甲基環氧丙醚、間-乙烯基苯甲基環氧丙醚、對-乙烯基苯甲基環氧丙醚或上述化合物之任意組合。 Preferably, the epoxy group-containing ethylenically unsaturated monomer (c-2-3) is selected from the group consisting of glycidyl methacrylate, 2-methylglycidyl methacrylate, and methacrylic acid. 3,4-epoxycyclohexylmethyl ester, 6,7-epoxyheptyl methacrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-ethylene Benzomethyl epoxidized ether or any combination of the above.
於本發明之具體例中,基於第二鹼可溶性樹脂(C-2)之具有一個或一個以上羧酸或羧酸酐之乙烯性不飽和單體(c-2-1)及其他可共聚合之乙烯性不飽和單體(c-2-2)共聚合用單體之使用量總和為100重量份,該具有環氧基之乙烯性不飽和單體(c-2-3)之使用量範圍為1重量份至35重量份;較佳為3重量份至30重量份;更佳為5重量份至25重量份。 In a specific example of the present invention, the ethylenically unsaturated monomer (c-2-1) having one or more carboxylic acids or carboxylic anhydrides based on the second alkali-soluble resin (C-2) and other copolymerizable monomers The total amount of the monomers for copolymerization of the ethylenically unsaturated monomer (c-2-2) is 100 parts by weight, and the amount of the ethylenically unsaturated monomer (c-2-3) having an epoxy group is used. It is from 1 part by weight to 35 parts by weight; preferably from 3 parts by weight to 30 parts by weight; more preferably from 5 parts by weight to 25 parts by weight.
另外,上述第二鹼可溶性樹脂(C-2)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯換算的數目平均分子量一般為1000至35,000,較佳為3,000至30,000,更佳為5,000至25,000。 Further, the second alkali-soluble resin (C-2) has a polystyrene-equivalent number average molecular weight of from 1,000 to 35,000, preferably from 3,000 to 30,000, as measured by Gel Permeation Chromatography (GPC). More preferably 5,000 to 25,000.
於本發明之具體例中,基於鹼可溶性樹脂(C) 之使用量總和為100重量份,第二鹼可溶性樹脂(C-2)之使用量為0重量份至90重量份;較佳為10重量份至85重量份;更佳為20重量份至80重量份。 In the specific example of the present invention, based on an alkali soluble resin (C) The total amount of use is 100 parts by weight, and the second alkali-soluble resin (C-2) is used in an amount of 0 parts by weight to 90 parts by weight; preferably 10 parts by weight to 85 parts by weight; more preferably 20 parts by weight to 80 parts by weight. Parts by weight.
本發明之具有乙烯性不飽和基之化合物(D)可包含具有至少一個乙烯性不飽和基之不飽和化合物及具有至少二個乙烯性不飽和基之不飽和化合物。 The compound (D) having an ethylenically unsaturated group of the present invention may comprise an unsaturated compound having at least one ethylenically unsaturated group and an unsaturated compound having at least two ethylenically unsaturated groups.
上述具有至少一個乙烯性不飽和基之不飽和化合物的具體例可包含但不限於丙烯醯胺、丙烯醯嗎啉、甲基丙烯醯嗎啉、丙烯酸-7-胺基-3,7-二甲基辛酯、甲基丙烯酸-7-胺基-3,7-二甲基辛酯、異丁氧基甲基丙烯醯胺、異丁氧基甲基甲基丙烯醯胺、丙烯酸異冰片基氧乙酯、甲基丙烯酸異冰片基氧乙酯、丙烯酸異冰片酯、甲基丙烯酸異冰片酯、丙烯酸-2-乙基己酯、甲基丙烯酸-2-乙基己酯、乙基二甘醇丙烯酸酯、乙基二甘醇甲基丙烯酸酯、第三辛基丙烯醯胺、第三辛基甲基丙烯醯胺、二丙酮丙烯醯胺、二丙酮甲基丙烯醯胺、丙烯酸二甲胺基酯、甲基丙烯酸二甲胺基酯、丙烯酸十二烷基酯、甲基丙烯酸十二烷基酯、丙烯酸二環戊烯氧乙酯、甲基丙烯酸二環戊烯氧乙酯、丙烯酸二環戊烯酯、甲基丙烯酸二環戊烯酯、氮,氮-二甲基丙烯醯胺、氮,氮-二甲基甲基丙烯醯胺、丙烯酸四氯苯酯、甲基丙烯酸四氯苯酯、丙烯酸-2-四氯苯氧基乙酯、甲基丙烯酸-2-四氯苯氧基乙酯、丙烯酸四氫糠酯、甲基丙烯酸四氫糠酯、丙烯酸四溴苯酯、 甲基丙烯酸四溴苯酯、丙烯酸-2-四溴苯氧基乙酯、甲基丙烯酸-2-四溴苯氧基乙酯、丙烯酸-2-三氯苯氧基乙酯、甲基丙烯酸-2-三氯苯氧基乙酯、丙烯酸三溴苯酯、甲基丙烯酸三溴苯酯、丙烯酸-2-三溴苯氧基乙酯、甲基丙烯酸-2-三溴苯氧基乙酯、丙烯酸-2-羥乙酯、甲基丙烯酸-2-羥乙酯、丙烯酸-2-羥丙酯、甲基丙烯酸-2-羥丙酯、乙烯基己內醯胺、氮-乙烯基皮酪烷酮、丙烯酸苯氧基乙酯、甲基丙烯酸苯氧基乙酯、丙烯酸五氯苯酯、甲基丙烯酸五氯苯酯、丙烯酸五溴苯酯、甲基丙烯酸五溴苯酯、聚單丙烯酸乙二醇酯、聚單甲基丙烯酸乙二醇酯、聚單丙烯酸丙二醇酯、聚單甲基丙烯酸丙二醇酯、丙烯酸冰片酯,或甲基丙烯酸冰片酯等。其中,該具有至少一個乙烯性不飽和基之不飽和化合物可單獨一種使用或混合複數種使用。 Specific examples of the above unsaturated compound having at least one ethylenically unsaturated group may include, but are not limited to, acrylamide, propylene morpholine, methacryl hydrazine, acrylic-7-amino-3,7-dimethyl Kesin ester, -7-amino-3,7-dimethyloctyl methacrylate, isobutoxymethyl acrylamide, isobutoxymethyl methacrylamide, isobornyl acrylate Ethyl ester, isobornyl oxyethyl methacrylate, isobornyl acrylate, isobornyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, ethyl diglycol Acrylate, ethyl diglycol methacrylate, third octyl acrylamide, third octyl methacrylamide, diacetone acrylamide, diacetone methacrylamide, dimethylamino acrylate Ester, dimethylamino methacrylate, dodecyl acrylate, dodecyl methacrylate, dicyclopentene oxyethyl acrylate, dicyclopentene oxyethyl methacrylate, bicyclic acrylate Pentene ester, dicyclopentenyl methacrylate, nitrogen, nitrogen-dimethyl acrylamide, nitrogen, nitrogen-dimethyl methacrylate , tetrachlorophenyl acrylate, tetrachlorophenyl methacrylate, 2-tetrachlorophenoxyethyl acrylate, 2-tetrachlorophenoxyethyl methacrylate, tetrahydrofurfuryl acrylate, methacrylic acid Tetrahydrofurfuryl ester, tetrabromophenyl acrylate, Tetrabromophenyl methacrylate, 2-tetrabromophenoxyethyl acrylate, 2-tetrabromophenoxyethyl methacrylate, 2-trichlorophenoxyethyl acrylate, methacrylic acid- 2-trichlorophenoxyethyl ester, tribromophenyl acrylate, tribromophenyl methacrylate, 2-tribromophenoxyethyl acrylate, 2-tribromophenoxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, vinyl caprolactam, nitrogen-vinyl tyrosine Ketone, phenoxyethyl acrylate, phenoxyethyl methacrylate, pentachlorophenyl acrylate, pentachlorophenyl methacrylate, pentabromophenyl acrylate, pentabromophenyl methacrylate, poly(monoethyl acrylate) Glycol ester, polyethylene monomethacrylate, poly propylene glycol monoacrylate, poly propylene glycol monomethacrylate, borneol acrylate, or borneol methacrylate. Among them, the unsaturated compound having at least one ethylenically unsaturated group may be used singly or in combination of plural kinds.
上述具有至少二個乙烯性不飽和基之不飽和化合物的具體例可包含但不限於乙二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、二丙烯酸二環戊烯酯、二甲基丙烯酸二環戊烯酯、三甘醇二丙烯酸酯、四甘醇二丙烯酸酯、四甘醇二甲基丙烯酸酯、三(2-羥乙基)異氰酸酯二丙烯酸酯、三(2-羥乙基)異氰酸酯二甲基丙烯酸酯、三(2-羥乙基)異氰酸酯三丙烯酸酯、三(2-羥乙基)異氰酸酯三甲基丙烯酸酯、己內酯改質之三(2-羥乙基)異氰酸酯三丙烯酸酯、己內酯改質之三(2-羥乙基)異氰酸酯三甲基丙烯酸酯、三丙烯酸三羥甲基丙酯、三甲基丙烯酸三羥甲基丙酯、環氧乙烷(以下簡稱EO)改質之三丙烯酸三羥甲基丙酯、EO改質之三甲基丙烯酸三 羥甲基丙酯、環氧丙烷(以下簡稱PO)改質之三丙烯酸三羥甲基丙酯、PO改質之三甲基丙烯酸三羥甲基丙酯、三甘醇二丙烯酸酯、三甘醇二甲基丙烯酸酯、新戊二醇二丙烯酸酯、新戊二醇二甲基丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、1,6-己二醇二丙烯酸酯、1,6-己二醇二甲基丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四丙烯酸酯、季戊四醇四甲基丙烯酸酯、聚酯二丙烯酸酯、聚酯二甲基丙烯酸酯、聚乙二醇二丙烯酸酯、聚乙二醇二甲基丙烯酸酯、二季戊四醇六丙烯酸酯(dipentaerythritol hexaacrylate;DPHA)、二季戊四醇六甲基丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇五甲基丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四醇四甲基丙烯酸酯、己內酯改質之二季戊四醇六丙烯酸酯、己內酯改質之二季戊四醇六甲基丙烯酸酯、己內酯改質之二季戊四醇五丙烯酸酯、己內酯改質之二季戊四醇五甲基丙烯酸酯、四丙烯酸二三羥甲基丙酯、四甲基丙烯酸二三羥甲基丙酯、EO改質之雙酚A二丙烯酸酯、EO改質之雙酚A二甲基丙烯酸酯、PO改質之雙酚A二丙烯酸酯、PO改質之雙酚A二甲基丙烯酸酯、EO改質之氫化雙酚A二丙烯酸酯、EO改質之氫化雙酚A二甲基丙烯酸酯、PO改質之氫化雙酚A二丙烯酸酯、PO改質之氫化雙酚A二甲基丙烯酸酯、PO改質之甘油三丙酸酯、EO改質之雙酚F二丙烯酸酯、EO改質之雙酚F二甲基丙烯酸酯、酚醛聚縮水甘油醚丙烯酸酯、酚醛聚縮水甘油醚甲基丙烯酸酯、日本東亞合成株式會社製造且型號為 TO-1382之商品,或者由日本化藥股份有限公司製造且其型號為KAYARAD DPCA-20、KAYARAD DPCA-30、KAYARAD DPCA-60或KAYARAD DPCA-120之商品等。其中,具有至少二個乙烯性不飽和基之不飽和化合物可單獨一種使用或混合複數種使用。 Specific examples of the above unsaturated compound having at least two ethylenically unsaturated groups may include, but are not limited to, ethylene glycol diacrylate, ethylene glycol dimethacrylate, dicyclopentenyl diacrylate, and dimethacrylic acid. Dicyclopentenyl ester, triethylene glycol diacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, tris(2-hydroxyethyl)isocyanate diacrylate, tris(2-hydroxyethyl) Isocyanate dimethacrylate, tris(2-hydroxyethyl)isocyanate triacrylate, tris(2-hydroxyethyl)isocyanate trimethacrylate, caprolactone modified tris(2-hydroxyethyl)isocyanate Triacrylate (caprolactone modified) tris(2-hydroxyethyl)isocyanate trimethacrylate, trimethylolpropyl triacrylate, trimethylolpropyl trimethacrylate, ethylene oxide ( Hereinafter referred to as EO) modified trimethylol propyl triacrylate, EO modified trimethyl acrylate three Hydroxymethyl propyl ester, propylene oxide (hereinafter referred to as PO) modified trimethylol propyl triacrylate, PO modified trimethylol propyl trimethacrylate, triethylene glycol diacrylate, triglyceride Alcohol dimethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, 1,4-butanediol diacrylate, 1,4-butanediol dimethacrylate, 1 ,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, polyester II Acrylate, polyester dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, dipentaerythritol hexaacrylate (DPHA), dipentaerythritol hexamethacrylate, two Pentaerythritol pentaacrylate, dipentaerythritol pentamethyl acrylate, dipentaerythritol tetraacrylate, dipentaerythritol tetramethacrylate, caprolactone modified dipentaerythritol hexaacrylate, caprolactone modified dipentaerythritol hexamethyl Acrylate, caprolactone modified dipentaerythritol pentaacrylate, caprolactone modified dipentaerythritol pentamethacrylate, ditrimethylolpropyl tetraacrylate, ditrimethylolpropyl tetramethacrylate EO modified bisphenol A diacrylate, EO modified bisphenol A dimethacrylate, PO modified bisphenol A diacrylate, PO modified bisphenol A dimethacrylate, EO Modified hydrogenated bisphenol A diacrylate, EO modified hydrogenated bisphenol A dimethacrylate, PO modified hydrogenated bisphenol A diacrylate, PO modified hydrogenated bisphenol A dimethacrylate , PO modified triglyceride, EO modified bisphenol F diacrylate, EO modified bisphenol F dimethacrylate, phenolic polyglycidyl ether acrylate, phenolic polyglycidyl ether methyl Acrylate, manufactured by Japan East Asia Synthetic Co., Ltd. and model number A product of TO-1382, or a product manufactured by Nippon Kayaku Co., Ltd. and model number KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-60 or KAYARAD DPCA-120. Among them, the unsaturated compound having at least two ethylenically unsaturated groups may be used singly or in combination of plural kinds.
較佳地,具有乙烯性不飽和基之化合物(D)是 選自於三丙烯酸三羥甲基丙酯、EO改質之三丙烯酸三羥甲基丙酯、PO改質之三丙烯酸三羥甲基丙酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇四丙烯酸酯、己內酯改質之二季戊四醇六丙烯酸酯、四丙烯酸二三羥甲基丙酯、PO改質之甘油三丙酸酯,KAYARAD DPCA-20、KAYARAD DPCA-30、KAYARAD DPCA-60或KAYARAD DPCA-120或上述化合物之任意組合。 Preferably, the compound (D) having an ethylenically unsaturated group is Selected from trimethylolpropyl acrylate, EO modified trimethylol propyl triacrylate, PO modified trimethylol propyl triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol Hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, ditrimethylolpropyl methacrylate, PO modified tripropionate, KAYARAD DPCA -20, KAYARAD DPCA-30, KAYARAD DPCA-60 or KAYARAD DPCA-120 or any combination of the above compounds.
上述具有乙烯性不飽和基之化合物(D)可單獨一種使用或混合複數種使用。 The above compound (D) having an ethylenically unsaturated group may be used singly or in combination of plural kinds.
基於鹼可溶性樹脂(C)之總使用量為100重量份,具有乙烯性不飽和基之化合物(D)的使用量為20重量份至200重量份,較佳為30重量份至180重量份,且更佳為50重量份至150重量份。 The compound (D) having an ethylenically unsaturated group is used in an amount of 20 parts by weight to 200 parts by weight, preferably 30 parts by weight to 180 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C). More preferably, it is 50 parts by weight to 150 parts by weight.
本發明之光起始劑(E)可包含光起始劑(E-1)。 The photoinitiator (E) of the present invention may comprise a photoinitiator (E-1).
光起始劑(E-1)具有如下式(III)所示之結構:
於式(III)中,E1、E2、E3、E4、E5、E6、E7及E8分別獨立代表氫原子、碳數為1至20之烷基、、COE16、OE17、鹵素、NO2或;或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立代表經取代之碳數為2至10之烯基;或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立地共同代表-(CH2)p-W-(CH2)q-;或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立地代表,其中至少一E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8為
具有如式(III)所示之結構的光起始劑(E-1)的特徵在於其咔唑部分上包含至少一成環(annelated)不飽和環。換言之,至少一對E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8係。 The photoinitiator (E-1) having a structure as shown in the formula (III) is characterized in that it contains at least one annelated unsaturated ring on its carbazole moiety. In other words, at least one pair of E 1 and E 2 , E 2 and E 3 , E 3 and E 4 , E 5 and E 6 , E 6 and E 7 or E 7 and E 8 are .
前述所稱之碳數為1至20之烷基係直鏈或支鏈且係例如碳數為1至18、碳數為1至4、碳數為1至12、碳數 為1至8、碳數為1至8或碳數為1至4之烷基,或碳數為4至12或碳數為4至8之烷基。具體例子如甲基、乙基、丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。碳數為1至6之烷基具有與上述碳數為1至20之烷基相同的定義,且具有最高相應的碳原子數。 The above-mentioned alkyl group having a carbon number of 1 to 20 is linear or branched and has, for example, a carbon number of 1 to 18, a carbon number of 1 to 4, a carbon number of 1 to 12, and a carbon number. It is an alkyl group having 1 to 8, a carbon number of 1 to 8, or a carbon number of 1 to 4, or an alkyl group having 4 to 12 carbon atoms or 4 to 8 carbon atoms. Specific examples are methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Pentyl, 2-ethylhexyl, octyl, decyl, decyl, dodecyl, tetradecyl, fifteen, hexadecyl, octadecyl and decyl. The alkyl group having 1 to 6 carbon atoms has the same definition as the above-mentioned alkyl group having 1 to 20 carbon atoms, and has the highest corresponding number of carbon atoms.
含有至少一碳-碳多鍵之未經取代或經取代之碳數為1至20之烷基即為後述之烯基。 An unsubstituted or substituted alkyl group having 1 to 20 carbon atoms containing at least one carbon-carbon multiple bond is an alkenyl group described later.
碳數為1至4之鹵代烷基係如後述所定義經鹵素取代且如前述所定義之碳數為1至4之烷基。烷基基團可例如為單-或多鹵化,直至所有氫原子替換為鹵素,且可例如為CjHwXy,其中w+y=2j+1且X為鹵素,較佳為氟原子。具體例子如氯甲基、三氯甲基、三氟甲基或2-溴丙基,尤其為三氟甲基或三氯甲基。 The haloalkyl group having 1 to 4 carbon atoms is an alkyl group having a carbon number of 1 to 4 which is substituted by halogen as defined below and has a carbon number as defined above. The alkyl group can be, for example, mono- or polyhalogenated until all hydrogen atoms are replaced by a halogen, and can be, for example, C j H w X y , wherein w+y=2j+1 and X is a halogen, preferably a fluorine atom. . Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl.
碳數為2至4之羥基烷基意指經一或兩個氧原子取代之碳數為2至4之烷基。烷基可為直鏈或支鏈。具體例子如2-羥基乙基、1-羥基乙基、1-羥基丙基、2-羥基丙基、3-羥基丙基、1-羥基丁基、4-羥基丁基、2-羥基丁基、3-羥基丁基、2,3-二羥基丙基或2,4-二羥基丁基。 The hydroxyalkyl group having 2 to 4 carbon atoms means an alkyl group having 2 to 4 carbon atoms which is substituted by one or two oxygen atoms. The alkyl group can be straight or branched. Specific examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl , 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl.
碳數為2至10之烷氧基烷基係經一-O-間雜之碳數為2至10之烷基。碳數為2至10之烷基具有與前述碳數為1至20之烷基的相同定義,且具有最高相應碳原子數。具體例子如甲氧基甲基、甲氧基乙基、甲氧基丙基、乙氧基甲 基、乙氧基乙基、乙氧基丙基、丙氧基甲基、丙氧基乙基、丙氧基丙基。 The alkoxyalkyl group having 2 to 10 carbon atoms is an alkyl group having 2 to 10 carbon atoms which is mono-O-interst. The alkyl group having a carbon number of 2 to 10 has the same definition as the aforementioned alkyl group having 1 to 20 carbon atoms, and has the highest corresponding number of carbon atoms. Specific examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxylated Base, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, propoxypropyl.
間雜有一或多個O、S、NE26或CO之碳數為2至20之烷基係例如經O、S、NE26或CO間雜1至9次、1至5次、1至3次、1次或2次。若存在一個以上的間雜基團,則其為相同種類或不同。兩個氧原子由至少一個亞甲基,較佳為至少兩個亞甲基(即伸乙基)隔開。該等烷基係直鏈或支鏈。舉例而言,將存在以下結構單元:-CH2-CH2-O-CH2CH3、-[CH2CH2O]y-CH3(其中y=1至9)、-(CH2-CH2O)7-CH2CH3、-CH2-CH(CH3)-O-CH2-CH2CH3、-CH2-CH(CH3)-O-CH2-CH3、-CH2-CH2-S-CH2CH3、-CH2-CH(CH3)-NE26-CH2-CH3、-CH2-CH2-COO-CH2CH3或-CH2-CH(CH3)-OCO-CH2-CH2CH3。 An alkyl group having from 2 to 20 carbon atoms of one or more of O, S, NE 26 or CO, for example, 1 to 9 times, 1 to 5 times, 1 to 3 times by O, S, NE 26 or CO, 1 or 2 times. If more than one meso group is present, it is the same species or different. The two oxygen atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups). These alkyl groups are linear or branched. For example, the following structural units will be present: -CH 2 -CH 2 -O-CH 2 CH 3 , -[CH 2 CH 2 O] y -CH 3 (where y = 1 to 9), -(CH 2 - CH 2 O) 7 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 3 ,- CH 2 -CH 2 -S-CH 2 CH 3 , -CH 2 -CH(CH 3 )-NE 26 -CH 2 -CH 3 , -CH 2 -CH 2 -COO-CH 2 CH 3 or -CH 2 - CH(CH 3 )-OCO-CH 2 -CH 2 CH 3 .
於本發明中,碳數為3至10之環烷基、碳數為3至10之環烷基及碳數為3至8之環烷基可理解為至少包含一個環之烷基。具體例子如環丙基、環丁基、環戊基、環己基、環辛基、戊基環戊基及環己基。於本發明中,碳數為3至10之環烷基亦涵蓋二環的例子,也就是橋聯環,具體例子可例如、、,及其他相應的環。其他具體例可例如為、、 (例如)或等結構,以及橋聯或稠合環系統,舉例而言,此處之定義亦包含或等結構,其中R10代表伸烷基,R11代表烷基。 In the present invention, a cycloalkyl group having 3 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms are understood to be an alkyl group having at least one ring. Specific examples are cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. In the present invention, a cycloalkyl group having a carbon number of 3 to 10 also encompasses an example of a bicyclic ring, that is, a bridged ring, and specific examples can be, for example, , , , and other corresponding rings. Other specific examples can be, for example, , , (E.g )or Equal structure, as well as bridging or fused ring systems, for example, the definition here also includes or And other structures wherein R 10 represents an alkylene group and R 11 represents an alkyl group.
經O、S、NE26或CO間雜之碳數為3至20的環烷基具有與前述相同之定義,其中烷基至少一個-CH2-基團係替換為O、S、NE26或CO。具體例子如、、(例如)、、、、、或等結構。 A cycloalkyl group having a carbon number of 3 to 20 via O, S, NE 26 or CO has the same definition as defined above, wherein at least one -CH 2 - group of the alkyl group is replaced by O, S, NE 26 or CO. . Specific examples are as , , (E.g ), , , , , or And other structures.
碳數為1至8之烷基與碳數為3至10之環烷基鍵結所形成之基團係指經至少一個具有最多8個碳原子之烷基取代的如前述所定義之碳數為3至10之環烷基。具體例子為或等。 A group formed by bonding an alkyl group having 1 to 8 carbon atoms to a cycloalkyl group having 3 to 10 carbon atoms means a carbon number as defined above substituted with at least one alkyl group having up to 8 carbon atoms It is a cycloalkyl group of 3 to 10. The specific example is or Wait.
間雜有一或多個O之碳數為1至8的烷基與碳數為3至10之環烷基鍵結所形成之基團係指經至少一個具有 最多8個碳原子之烷基取代的如前述所定義之間雜有一或多個O之碳數為3至10之環烷基。具體例子如或等。 A group formed by a heterocyclic group having one or more carbon atoms of 1 to 8 and a cycloalkyl group having a carbon number of 3 to 10 is substituted by at least one alkyl group having at most 8 carbon atoms. One or more cycloalkyl groups having from 3 to 10 carbon atoms are intermixed as defined above. Specific examples are as or Wait.
碳數為1至12的烷氧基係經一個氧原子取代之碳數為1至12的烷基。碳數為1至12的烷基具有如前述碳數為1至20的烷基的相同定義,且具有最高相應的碳原子數。碳數為1至4的烷氧基係直鏈或支鏈,例如甲氧基、乙氧基、丙氧基、異丙氧基、正丁氧基、第二丁氧基、異丁氧基或第三丁氧基。碳數為1至8的烷氧基和碳數為1至4之烷氧基係與前述定義相同,且具有最高相應的碳原子數。 The alkoxy group having 1 to 12 carbon atoms is an alkyl group having 1 to 12 carbon atoms which is substituted by one oxygen atom. The alkyl group having a carbon number of 1 to 12 has the same definition of the alkyl group having a carbon number of 1 to 20 as described above, and has the highest corresponding number of carbon atoms. The alkoxy group having a carbon number of 1 to 4 is a straight chain or a branched chain, for example, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a n-butoxy group, a second butoxy group, an isobutoxy group. Or a third butoxy group. The alkoxy group having 1 to 8 carbon atoms and the alkoxy group having 1 to 4 carbon atoms are the same as defined above, and have the highest corresponding number of carbon atoms.
碳數為1至12之烷基硫基係經一個硫原子取代之碳數為1至12之烷基。碳數為1至12的烷基具有如前述碳數為1至20的烷基的相同定義,且具有最高相應的碳原子數。碳數為1至4的烷基硫基係直鏈或支鏈,例如甲基硫基、乙基硫基、丙基硫基、異丙基硫基、正丁基硫基、第二丁基硫基、異丁基硫基、第三丁基硫基。 The alkylthio group having 1 to 12 carbon atoms is an alkyl group having 1 to 12 carbon atoms which is substituted by one sulfur atom. The alkyl group having a carbon number of 1 to 12 has the same definition of the alkyl group having a carbon number of 1 to 20 as described above, and has the highest corresponding number of carbon atoms. An alkylthio group having a carbon number of 1 to 4 is a straight chain or a branched chain, such as a methylthio group, an ethylthio group, a propylthio group, an isopropylthio group, an n-butylthio group, a second butyl group. Sulfur, isobutylthio, tert-butylthio.
苯基-R5可例如為芐基、苯基乙基、α-甲基苄基或α,α-二甲基-苄基,尤其為苄基。 Phenyl-R 5 may, for example, be benzyl, phenylethyl, α -methylbenzyl or α , α -dimethyl-benzyl, especially benzyl.
苯基-R8可例如為苄氧基、苯基乙氧基、α-甲基苄氧基或α,α-二甲基苄氧基,尤其為苄氧基。 Phenyl-R 8 may, for example, be a benzyloxy group, a phenylethoxy group, an α -methylbenzyloxy group or an α , α -dimethylbenzyloxy group, especially a benzyloxy group.
碳數為2至12之烯基係單-或多不飽和且係例如為碳數為2至10之烯基、碳數為2至8之烯基、碳數為2至5 之烯基。具體例子如乙烯基、烯丙基、甲基烯丙基、1,1-二甲基烯丙基、1-丁烯基、3-丁烯基、2-丁烯基、1,3-戊二烯基、5-己烯基、7-辛烯基或十二烯基,尤其為烯丙基。碳數為2至5之烯基具有如前述碳數為2至12的烯基的相同定義,且具有最高相應的碳原子數。 The alkenyl group having 2 to 12 carbon atoms is mono- or polyunsaturated and is, for example, an alkenyl group having 2 to 10 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, and a carbon number of 2 to 5. Alkenyl. Specific examples are vinyl, allyl, methallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentyl Dienyl, 5-hexenyl, 7-octenyl or dodecenyl, especially allyl. The alkenyl group having 2 to 5 carbon atoms has the same definition of the alkenyl group having a carbon number of 2 to 12 as described above, and has the highest corresponding number of carbon atoms.
間雜有一或多個O、S、NE26或CO之碳數為2至12之烯基係例如經O、S、NE26或CO間雜1至9次、1至5次、1至3次、1次或2次。若存在一個以上的間雜基團,則其為相同種類或不同。兩個氧原子由至少一個亞甲基,較佳為至少兩個亞甲基(即伸乙基)隔開。烯基係直鏈或支鏈且如前述所定義。舉例而言,可形成以下結構單元:-CH=CH-O-CH2CH3、-CH=CH-O-CH=CH2等。 An alkenyl group having one or more O, S, NE 26 or CO having a carbon number of 2 to 12, for example, 1 to 9 times, 1 to 5 times, 1 to 3 times by O, S, NE 26 or CO, 1 or 2 times. If more than one meso group is present, it is the same species or different. The two oxygen atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups). The alkenyl group is straight or branched and is as defined above. For example, the following structural units can be formed: -CH=CH-O-CH 2 CH 3 , -CH=CH-O-CH=CH 2 and the like.
碳數為4至8的環烯基具有至少一雙鍵,且可例如為碳數為4至6之環烯基或碳數為6至8之環烯基。具體例子如環丁烯基、環戊烯基、環己烯基或環辛烯基,尤其為環戊烯基及環己烯基,較佳為環己烯基。 The cycloalkenyl group having 4 to 8 carbon atoms has at least one double bond, and may, for example, be a cycloalkenyl group having 4 to 6 carbon atoms or a cycloalkenyl group having 6 to 8 carbon atoms. Specific examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, preferably cyclohexenyl.
碳數為3至6之烯氧基係單或多不飽和,且具有如前述烯基之定義的其中一者,且附接氧基具有最高相應的碳原子數。具體例子如烯丙氧基、甲基烯丙氧基、丁烯氧基、戊烯氧基、1,3-戊二烯氧基、5-己烯氧基。 The alkenyloxy group having a carbon number of 3 to 6 is mono- or polyunsaturated, and has one of the definitions of the alkenyl group as described above, and the attached oxy group has the highest corresponding number of carbon atoms. Specific examples are allyloxy, methallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.
碳數為2至12之炔基為單或多不飽和直鏈或支鏈,且可例如為碳數為2至8之炔基、碳數為2至6之炔基或碳數為2至4之炔基。具體例子如乙炔基、丙炔基、丁炔基、 1-丁炔基、3-丁炔基、2-丁炔基、戊炔基己炔基、2-己炔基、5-己炔基、辛炔基等。 The alkynyl group having 2 to 12 carbon atoms is a mono- or polyunsaturated linear or branched chain, and may, for example, be an alkynyl group having 2 to 8 carbon atoms, an alkynyl group having 2 to 6 carbon atoms or a carbon number of 2 to 4 alkynyl group. Specific examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, octynyl and the like.
碳數為2至20之烷醯基係直鏈或支鏈,且可例如為碳數為2至18、碳數為2至14、碳數為2至12、碳數為2至8、碳數為2至6或碳數為2至4之烷醯基或碳數為4至12或碳數為4至8之烷醯基。具體例子如乙醯基、丙醯基、丁醯基、異丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、癸醯基、十二醯基、十四醯基、十五醯基、十六醯基、十八醯基、二十醯基,較佳為乙醯基。碳數為1至8之烷醯基具有如前述之碳數為2至20之烷醯基相同的定義,且具有最高相應碳原子數。 The alkane group having a carbon number of 2 to 20 is linear or branched, and may be, for example, a carbon number of 2 to 18, a carbon number of 2 to 14, a carbon number of 2 to 12, a carbon number of 2 to 8, and carbon. The number is 2 to 6 or an alkanoyl group having a carbon number of 2 to 4 or an alkano group having a carbon number of 4 to 12 or a carbon number of 4 to 8. Specific examples are, for example, ethyl, propyl, butyl, isobutyl, pentylene, hexyl, decyl, octyl, fluorenyl, fluorenyl, fluorenyl, tetradecyl, fifteen Sulfhydryl, hexadecanyl, octadecyl, and decyl, preferably acetyl. The alkylhydrazine group having a carbon number of 1 to 8 has the same definition as the alkynylene group having a carbon number of 2 to 20 as described above, and has the highest corresponding number of carbon atoms.
碳數為2至12之烷氧基羰基係直鏈或支鏈,且係例如甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基、異丁氧基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰基、庚氧基羰基、辛氧基羰基、壬氧基羰基、癸氧基羰基或十二氧基羰基,尤其為甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基或異丁氧基羰基,較佳為甲氧基羰基。 The alkoxycarbonyl group having 2 to 12 carbon atoms is linear or branched, and is, for example, a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group, an isobutoxycarbonyl group, 1, 1-Dimethylpropoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group or an isobutoxycarbonyl group is preferably a methoxycarbonyl group.
間雜有一或多個O之碳數為2至12之烷氧基羰基可為直鏈或支鏈。兩個氧原子由至少兩個亞甲基(即伸乙基)隔開。該經間雜之烷氧基羰基未經取代或經一或多個羥基取代。碳數為6至20之芳氧基羰基可例如為苯基氧基羰基(=苯基-O-(CO)O-)、萘氧基羰基、蒽氧基羰基等。碳數為 5至20之雜芳基羰基可為與-O-CO-鍵結之碳數為5至20之雜芳基。 The alkoxycarbonyl group having one or more carbon atoms of 2 to 12 may be linear or branched. The two oxygen atoms are separated by at least two methylene groups (ie, ethyl groups). The meta-alkyloxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The aryloxycarbonyl group having a carbon number of 6 to 20 may, for example, be a phenyloxycarbonyl group (=phenyl-O-(CO)O-), a naphthyloxycarbonyl group, a decyloxycarbonyl group or the like. Carbon number is The heteroarylcarbonyl group of 5 to 20 may be a heteroaryl group having a carbon number of 5 to 20 bonded to -O-CO-.
碳數為3至10之環烷基羰基可為與CO鍵結之碳數為3至10之環烷基,其中環烷基具有與前述相同之定義,且具有最高相應的碳原子數。間雜有一或多個O、S、NE26或CO之碳數為3至10之環烷基羰基係指經間雜的與CO鍵結之環烷基,其中經間雜的環烷基具有與前述相同之定義。 The cycloalkylcarbonyl group having a carbon number of 3 to 10 may be a cycloalkyl group having a carbon number of 3 to 10 bonded to the CO, wherein the cycloalkyl group has the same definition as described above and has the highest corresponding number of carbon atoms. A cycloalkylcarbonyl group having one or more carbon atoms of 3 to 10 in the group consisting of O, S, NE 26 or CO means a heterocyclic CO-bonded cycloalkyl group, wherein the heterocyclic cycloalkyl group has the same The definition.
碳數為3至10之環烷氧基羰基可為與-O-(CO)-鍵結之碳數為3至10之環烷基,其中環烷基具有與前述相同之定義,且具有最高相應的碳原子數。間雜有一或多個O、S、NE26或CO之碳數為3至10之環烷氧基羰基係指經間雜的與-O-(CO)-鍵結之環烷基,其中經間雜的環烷基具有與前述相同之定義。 The cycloalkoxycarbonyl group having a carbon number of 3 to 10 may be a cycloalkyl group having a carbon number of 3 to 10 bonded to -O-(CO)-, wherein the cycloalkyl group has the same definition as described above and has the highest The corresponding number of carbon atoms. A cycloalkoxycarbonyl group having one or more O, S, NE 26 or CO having a carbon number of 3 to 10 is a hetero- and -O-(CO)-bonded cycloalkyl group, wherein The cycloalkyl group has the same definition as described above.
碳數為1至20之烷基苯基係指經至少一個烷基取代之苯基,其中碳原子之總合最多為20。 The alkylphenyl group having 1 to 20 carbon atoms means a phenyl group substituted with at least one alkyl group, wherein the total of the carbon atoms is at most 20.
碳數為6至20之芳基可例如為苯基、萘基、蒽基、菲基、芘基、1,2-苯並菲基、并四苯基、聯伸三苯基等,尤其為苯基或萘基,較佳為苯基。萘基係1-萘基或2-萘基。 The aryl group having 6 to 20 carbon atoms may, for example, be phenyl, naphthyl, anthracenyl, phenanthryl, anthracenyl, 1,2-benzophenanthrenyl, tetraphenylene, a triphenylene group, etc., especially benzene. Or a naphthyl group, preferably a phenyl group. Naphthyl 1-naphthyl or 2-naphthyl.
在本發明之光起始劑(E-1)之內容中,碳數為3至20之雜芳基包含單環或多環系統,例如稠合環系統。具體例子可為噻吩基、苯并[b]噻吩基、萘并[2,3-b]噻吩基、噻蒽基、呋喃基、二苯并呋喃基、唏基、呫噸基、噻噸基、啡噁噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、 噠嗪基、中氮茚基、異吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、異喹啉基、喹啉基、酞嗪基、萘啶基、喹噁啉基、喹唑啉基、啉基、喋啶基、咔唑基、β-哢啉基、菲啶基、吖啶基、萘嵌間二氮苯基、菲咯啉基、吩噻基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基、吩噁基、7-菲基、蒽醌-2-基(=9,10-二側氧基-9,10-二氫蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫噸基、8-甲基-2-呫噸基、3-呫噸基、2-啡噁噻基、2,7-啡噁噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-異吲哚基、2-甲基-1-異吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-異喹啉基、6-異喹啉基、7-異喹啉基、3-甲氧基-6-異喹啉基、2-喹啉基、6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹噁啉基、6-喹噁啉基、2,3-二甲基-6-喹噁啉基、2,3-二甲氧基-6-喹噁啉基、2-喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-啉基、6-啉基、7-啉基、3-甲氧基-7-啉基、2-喋啶基、6-喋啶 基、7-喋啶基、6,7-二甲氧基-2-喋啶基、2-咔唑基、3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-哢啉-3-基、1-甲基-β-哢啉-3-基、1-甲基-β-哢啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌間二氮苯基、1-甲基-5-萘嵌間二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-異噁唑基、4-異噁唑基、5-異噁唑基、4-甲基-3-呋呫基、2-吩噁基、10-甲基-2-吩噁基等。 In the context of the photoinitiator (E-1) of the present invention, a heteroaryl group having a carbon number of 3 to 20 contains a monocyclic or polycyclic system such as a fused ring system. Specific examples may be thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, dibenzofuranyl, Sulfhydryl, xanthenyl, thioxanyl, phenothiphthyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, carbazinyl, isodecyl, fluorenyl , carbazolyl, fluorenyl, quinazolyl, isoquinolyl, quinolyl, pyridazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, Polinyl, acridinyl, oxazolyl, β -carboline, phenanthryl, acridinyl, naphthyldiazophenyl, phenanthroline, phenothiyl, isothiazolyl, phenothiazine , isoxazolyl, furazolyl, phenomethoxy, 7-phenanthryl, inden-2-yl (=9,10-di-oxy-9,10-dihydroindol-2-yl), 3 -benzo[b]thienyl, 5-benzo[b]thienyl, 2-benzo[b]thienyl, 4-dibenzofuranyl, 4,7-dibenzofuranyl, 4-methyl Base-7-dibenzofuranyl, 2-xanthene, 8-methyl-2-indenyl, 3-indolyl, 2-morphothinyl, 2,7-morphothinyl, 2 -pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4 -Imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4-pyrazolyl , 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1-isoindole , 1-methyl-2-indenyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indenyl, 1-methyl-3-oxazolyl, 2 ,7-dimethyl-8-fluorenyl, 2-methoxy-7-methyl-8-fluorene , 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl, 7-isoquinolyl, 3-methoxy-6-isoquinolinyl, 2-quinolinyl, 6- Quinolinyl, 7-quinolyl, 2-methoxy-3-quinolyl, 2-methoxy-6-quinolinyl, 6-pyridazinyl, 7-pyridazinyl, 1-methoxy -6-oxazinyl, 1,4-dimethoxy-6-pyridazinyl, 1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2, 3-Dimethyl-6-quinoxalinyl, 2,3-dimethoxy-6-quinoxalinyl, 2-quinazolinyl, 7-quinazolinyl, 2-dimethylamino -6-quinazolinyl, 3- Lolinyl, 6- Olinyl group, 7- Lolinyl, 3-methoxy-7- Lolinyl, 2-acridinyl, 6-acridinyl, 7-acridinyl, 6,7-dimethoxy-2-acridinyl, 2-oxazolyl, 3-oxazolyl, 9- Methyl-2-oxazolyl, 9-methyl-3-oxazolyl, β -carboline-3-yl, 1-methyl- β -carboline-3-yl, 1-methyl-β- Porphyrin-6-yl, 3-phenanthryl, 2-acridinyl, 3-acridinyl, 2-naphthyldiazophenyl, 1-methyl-5-naphthyldiazophenyl, 5-phenanthroline, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenothiazine , 3-phenothiazine, 10-methyl-3-phenothiazinyl, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazolyl, 4-methyl-3-furazan Base, 2-oxo group, 10-methyl-2-phenoxy group, and the like.
較佳地,碳數為3至20之雜芳基可為噻吩基、苯并[b]噻吩基、噻蒽基、噻噸基、1-甲基-2-吲哚基或1-甲基-3-吲哚基。更佳地,碳數為3至20之雜芳基可為噻吩基。 Preferably, the heteroaryl group having a carbon number of 3 to 20 may be a thienyl group, a benzo[b]thienyl group, a thioxanyl group, a thioxanthyl group, a 1-methyl-2-indenyl group or a 1-methyl group. -3-mercapto. More preferably, the heteroaryl group having a carbon number of 3 to 20 may be a thienyl group.
碳數為4至20之雜芳基羰基係經由CO基團連接至分子其餘部分之如前述所定義之碳數為3至20之雜芳基。 The heteroarylcarbonyl group having a carbon number of 4 to 20 is a heteroaryl group having a carbon number of 3 to 20 as defined above, which is bonded to the remainder of the molecule via a CO group.
經取代之芳基(苯基、萘基、碳數為6至20之芳基或碳數為5至20之雜芳基)係分別經1至7次、1至6次或1至4次,較佳地係經1次、2次或3次取代。所定義之芳基不能具有比芳基環上的自由位置為多之取代基。 The substituted aryl group (phenyl, naphthyl, aryl having 6 to 20 carbon atoms or heteroaryl having 5 to 20 carbon atoms) is 1 to 7 times, 1 to 6 times or 1 to 4 times, respectively. Preferably, it is substituted by 1, 2 or 3 times. The aryl group defined cannot have more substituents than the free position on the aryl ring.
苯基環上之取代基較佳在苯基環上之位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-組態。 The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-configuration .
經至少一次間雜之基團係經間雜例如1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4 次、1至3次或1次或2次(間雜原子數取決於擬間雜之碳原子數的多寡)。經至少一次取代之基團具有例如1至7個、1至5個、1至4個、1至3個或1個或2個相同或不同取代基。 The at least one heterozygous group is intermixed, for example, 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 Second, 1 to 3 or 1 or 2 times (the number of heteroatoms depends on the number of carbon atoms in the interstitial). The group substituted at least once has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3 or 1 or 2 identical or different substituents.
經如上述所定義之至少一取代基取代之基團係指具有至少一個相同或不同的取代基。鹵素係氟、氯、溴及碘,較佳為氟、氯及溴,更佳為氟及氯。 A group substituted with at least one substituent as defined above means having at least one substituent which is the same or different. Halogen is fluorine, chlorine, bromine and iodine, preferably fluorine, chlorine and bromine, more preferably fluorine and chlorine.
舉例來說,若E1及E2、E2及E3、E3及E4或E5及R6、E6及E7、E7及E8分別獨立地為,則形成例如下式(IIIa)至式(IIIi)所示之結構:
式(III)的化合物之特徵在於至少一個苯基環與咔唑部分稠合,以形成「萘基」環。亦即上述式(IIIa)至式(IIIi)之結構中之一者係根據式(III)所繪示。 The compound of formula (III) is characterized in that at least one phenyl ring is partially fused to the oxazole to form a "naphthyl" ring. That is, one of the structures of the above formula (IIIa) to formula (IIIi) is depicted according to formula (III).
若E1及E2、E2及E3、E3及E4或E5及R6、E6及E7、E7及E8分別獨立地為-(CH2)p-W-(CH2)q-,則形成例如或等結構。 If E 1 and E 2 , E 2 and E 3 , E 3 and E 4 or E 5 and R 6 , E 6 and E 7 , E 7 and E 8 are each independently -(CH 2 ) p -W-( CH 2 ) q -, for example, or And other structures.
若苯基或萘基環上之取代基OE17、SE18、SOE18、SO2E18或NE19E20經由基團E17、E18、E19及/或E20與萘基環之一個碳原子形成五員或六員環,則獲得包含3個或更多個環(包括萘基環)之結構。具體例子可例如為
若E17與具有或之基團的苯基或萘基環之一個碳原子形成單鍵,則形成例如或等結構。 If E 17 has or One of the carbon atoms of the phenyl or naphthyl ring of the group forms a single bond, for example, or And other structures.
若E16係經SE18取代之苯基,其中E18表示鍵結至具有COE16之咔唑部分的苯基或萘基環的單鍵,所形成之結構可例如為、
若E19及E20係與所鍵結之氮原子一起形成未經間雜或間雜有O、S或NE17之五員或六員飽和或不飽和環,則所形成之飽和或不飽和環可例如為氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉。較佳地,若E19及E20係與所鍵結之氮原子一起形成未經間雜或間雜有O、S或NE17之五員或六員飽和或不飽和環,則形成未經間雜或間雜有O或NE17、尤其O之五員或六員飽和環。 If E 19 and E 20 are formed together with the bonded nitrogen atom to form a five- or six-membered saturated or unsaturated ring without O or S, or N, S or NE 17 , the saturated or unsaturated ring may be formed. For example, aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, if E 19 and E 20 are formed together with the bonded nitrogen atom to form a five- or six-membered saturated or unsaturated ring without O or S, or N, S or NE 17 There are five or six member saturated rings of O or NE 17 , especially O.
若E21及E22係與所鍵結之氮原子一起形成未經間雜或間雜有O、S或NE26之五員或六員飽和或不飽和環, 且苯環選擇性地與該飽和或不飽和環稠合,則所形成之飽和或不飽和環可例如為氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉或相應成環(例如)。 If E 21 and E 22 are formed together with the bonded nitrogen atom, a five- or six-membered saturated or unsaturated ring of O, S or NE 26 is formed, and the benzene ring is selectively saturated with or When the unsaturated ring is fused, the saturated or unsaturated ring formed may be, for example, aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydro Pyridine or morpholine or corresponding ring formation (eg ).
若E19及E20係與所鍵結之氮原子一起形成雜芳香族環系統,則雜芳香族環系統係指包含一個以上的環(例如2個或3個環)以及來自相同種類或不同種類之一個或一個以上雜原子。適合的雜原子可例如為N、S、O或P、尤其N、S或O。具體例子如咔唑、吲哚、異吲哚、吲唑、嘌呤、異喹啉、喹啉、哢啉、吩噻嗪等。 If E 19 and E 20 form a heteroaromatic ring system together with the bonded nitrogen atom, the heteroaromatic ring system means more than one ring (for example 2 or 3 rings) and from the same species or different One or more heteroatoms of the species. Suitable heteroatoms can be, for example, N, S, O or P, especially N, S or O. Specific examples are carbazole, anthracene, isoindole, carbazole, anthracene, isoquinoline, quinoline, porphyrin, phenothiazine and the like.
所述之「及/或」或「或/及」在本發明上下文中係表示不僅可存在所定義之取代基中的一者,而且可存在總共若干所定義之取代基,即不同替代物(取代基)之混合物。 The phrase "and/or" or "or/and" in the context of the present invention means that not only one of the defined substituents may be present, but also a plurality of defined substituents, ie, different substitutes. a mixture of substituents).
所述之「至少」係定義一者或一者以上,例如一者或兩者或三者、較佳一者或兩者。 By "at least" it is meant to define one or more, such as one or both or three, preferably one or both.
在整個本說明書及下文之申請專利範圍中,除非上下文另有要求,否則詞語「包含(comprise)」或變體(例如,「comprises」或「comprising」)應理解為暗指包括所述整數或步驟或整數群組或步驟群組,但並不排除任一其他整數或步驟或整數群組或步驟群組。所述之「(甲基)丙烯酸酯」在本發明上下文中意欲指丙烯酸酯以及相應甲基丙烯酸酯。 Throughout this specification and the claims below, the words "comprise" or variant (eg, "comprises" or "comprising") are understood to include the integer or A step or integer group or group of steps, but does not exclude any other integer or step or integer group or group of steps. The term "(meth)acrylate" as used in the context of the present invention is intended to mean the acrylate and the corresponding methacrylate.
本發明上下文中用於本發明化合物之文字中所示較佳者意欲指所有申請專利範圍類別,亦即亦指針對組合物、用途、方法、彩色濾光片等之申請專利範圍。 The preferred embodiments shown in the text for the compounds of the present invention in the context of the present invention are intended to refer to all categories of patent applications, i.e., the scope of application for compositions, uses, methods, color filters, and the like.
式(III)所示之肟酯係藉由習知的方法製備,例如藉由在以下條件下使相應的肟與醯鹵,特別是氯化物或酸酐反應:在惰性溶劑(例如:第三丁基甲基醚、四氫呋喃(THF)或二甲基甲醯胺)中,在鹼(例如三乙胺或吡啶)存在時,或在鹼性溶劑(例如吡啶)中。在本發明之一實施例中,如式(IIIa)之化合物係以下列式(i)所示之方法製備,其中E7係肟酯基團()且Z1係單鍵。而如式(IIIb)至式(IIIh)所示之化合物係以相同方法製備,但選用適合的肟來進行。 The oxime esters of the formula (III) are prepared by a conventional method, for example, by reacting the corresponding hydrazine with a hydrazine halide, particularly a chloride or an acid anhydride, under the following conditions: in an inert solvent (for example, a third butyl group) In the ether, tetrahydrofuran (THF) or dimethylformamide, in the presence of a base such as triethylamine or pyridine, or in a basic solvent such as pyridine. In one embodiment of the invention, the compound of formula (IIIa) is prepared by the process of formula (i) wherein the E 7 is a decyl ester group ( And Z 1 is a single bond. While the compounds of the formula (IIIb) to the formula (IIIh) are prepared in the same manner, a suitable hydrazine is used.
於式(i)中,E1、E2、E5、E6、E8、E13、E14及E15係如前述所定義,X意指鹵素原子,尤其為氯原子。 In the formula (i), E 1 , E 2 , E 5 , E 6 , E 8 , E 13 , E 14 and E 15 are as defined above, and X means a halogen atom, especially a chlorine atom.
較佳地,E14為甲基。 Preferably, E 14 is a methyl group.
上述如式(i)所示之反應為於本技術領域具有通常知識者熟知,且通常在-15℃至+50℃之溫度下實施,較佳地係於0℃至25℃之溫度下實施。 The above reaction represented by the formula (i) is well known to those skilled in the art and is usually carried out at a temperature of from -15 ° C to +50 ° C, preferably at a temperature of from 0 ° C to 25 ° C. .
當Z1係CO時,相對應的肟係藉由用亞硝酸烷基酯(例如亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯)將亞甲基亞硝化來合成。然後,酯化係在與前述相同之條件下實施,詳細之製備方式係如式(ii)所示。 When Z 1 is CO, the corresponding lanthanide is obtained by using an alkyl nitrite (such as methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite). Methyl nitrosation to synthesize. Then, the esterification is carried out under the same conditions as described above, and the detailed preparation is as shown in the formula (ii).
因此,可藉由在鹼或鹼之混合物存在下使相應肟化合物與如之醯鹵或如之酸酐反應,以製得如上述所定義式(III)的化合物,其中X為鹵素原子,且特別是氯原子,而E14之定義悉如前述。 Therefore, the corresponding hydrazine compound can be obtained by, for example, in the presence of a mixture of a base or a base. Halogen or as The anhydride is reacted to produce a compound of formula (III) as defined above wherein X is a halogen atom, and particularly a chlorine atom, and E 14 is as defined above.
所需作為起始材料之肟可藉由標準化學教材(例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)或專著(例如S.R.Sandler & W.Karo,Organic functional group preparations,第3卷,Academic Press)中所述多種方法來獲得。 The desired material as a starting material can be obtained by standard chemistry textbooks (eg J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992) or monographs (eg S.R. Sandler & Various methods are described in W. Karo, Organic functional group preparations, Vol. 3, Academic Press.
最便利的一種方法係(例如)在極性溶劑(例如二甲基乙醯胺(DMA)、DMA水溶液、乙醇或乙醇水溶液)中使醛或酮與羥胺或其鹽反應。在此情形下,添加諸如乙酸鈉或吡啶等鹼來控制反應混合物之pH。眾所周知,反應速度具有pH依賴性,且可在開始時或在反應期間連續地添加鹼。亦可使用諸如吡啶等鹼性溶劑作為鹼及/或溶劑或共溶劑。反應溫度通常為室溫至混合物之回流溫度,一般為約20℃至120℃。 One of the most convenient methods is, for example, reacting an aldehyde or a ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH dependent and the base can be added continuously at the beginning or during the reaction. An alkaline solvent such as pyridine can also be used as the base and/or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is usually from about 20 ° C to 120 ° C.
相應酮中間體係(例如)藉由文獻(例如標準化學教材,例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)中所述方法來製備。另外,連續弗裏德-克拉夫茨反應(Friedel-Crafts reaction)可有效用於合成中間體。此等反應為彼等熟習此項技術者所熟知。 The corresponding ketone intermediate system, for example, is prepared by methods described in the literature (e.g., standard chemistry textbooks, e.g., J. March, Advanced Organic Chemistry, 4th Ed., Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used to synthesize intermediates. Such reactions are well known to those skilled in the art.
肟之另一便利合成係用亞硝酸或亞硝酸烷基酯將「活性」亞甲基亞硝化。鹼性條件(如(例如)Organic Syntheses coll.第VI卷(J.Wiley & Sons,New York,1988),第199頁及第840頁中所述)與酸性條件(如(例如)Organic Synthesis coll.第V卷,第32頁及第373頁,coll.第III卷,第191頁及第513頁,coll.第II卷,第202頁、第204頁及第363頁中所述)二者適於製備在本發明中用作起始材料之肟。一般自亞硝酸鈉產生亞硝酸。亞硝酸 烷基酯可為(例如)亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯。 Another convenient synthesis of hydrazine is the nitrosation of "active" methylene groups with nitrous acid or alkyl nitrite. Basic conditions (as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (eg, for example, Organic Synthesis coll Volume V, pages 32 and 373, coll. Volume III, pages 191 and 513, coll. Volume II, pages 202, 204 and 363) It is suitable for the preparation of hydrazine used as a starting material in the present invention. Nitrous acid is generally produced from sodium nitrite. Nitrous acid The alkyl ester can be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.
在另一實施例中,光起始劑(E-1)為游離式肟化合物,且具有如下式(IIIA)所示之結構:
於式(IIIA)中,E1、E2、E3、E4、E5、E6、E7及E8分別獨立代表氫原子、碳數為1至20之烷基、、COE16、OE17、鹵素原子、NO2或;或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立代表經取代之碳數為2至10之烯基,或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立地共同代表-(CH2)p-W-(CH2)q-;或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立地共同代表,其中至
少一E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8為;E9、E10、E11及E12分別獨立代表氫原子、碳數為1至20之烷基,碳數為1至20之烷基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自苯基、鹵素原子、CN、OH、SH、碳數為1至4之烷氧基、(CO)OH或(CO)O(R1),其中R1代表碳數為1至4之烷基;或E9、E10、E11及E12分別獨立地代表未經取代之苯基或經如下所示之至少一基團取代之苯基,該至少一基團係選自碳數為1至6之烷基、鹵素原子、CN、OE17、SE18或NE19E20;或E9、E10、E11及E12分別獨立地代表鹵素原子、CN、OE17、SE18、SOE18、SO2E18或NE19E20,其中取代基OE17、SE18或NE19E20係選擇性地經由基團E17、E18、E19及/或E20與式(IIIA)中之萘環的一個碳原子形成五員環或六員環;或E9、E10、E11及E12分別獨立地代表、COE16或NO2;W代表O、S、NE26或單鍵,p代表0至3之整數,q代表1至3之整數,Z1代表CO或單鍵;E13代表碳數為1至20之烷基,碳數為1至20之烷基係未經取代或經如下所示之至少一基團取代,其中上述之至
少一基團係選自鹵素原子、E17、COOE17、OE17、SE18、CONE19E20、NE19E20、PO(OCkH2k+1)2或;或E13代表碳數為2至20之烷基,碳數為2至20之烷基係間雜有一或多個O、S、SO、SO2、NE26或CO;或E13代表碳數為2至12之烯基,碳數為2至12之烯基係未經間雜或間雜有一或多個O、CO或NE26,其中經間雜且碳數為2至20之烷基及未經間雜或經間雜之碳數為2至12之烯基係未經取代或經至少一鹵素原子取代;或E13代表碳數為4至8之環烯基、碳數為2至12之炔基、或未經間雜或間雜有一或多個O、S、CO或NE26之碳數為3至10之環烷基;或E13代表苯基或萘基,且其各未經取代或經如下所示之至少一基團取代,其中該至少一基團係選自OE17、SE18、NE19E20、、COE16、CN、NO2、鹵素原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基,間雜有一或多個O、S、CO或NE26且碳數為2至20的烷基;或其各經未間雜或間雜有一或多個O、S、CO或NE26且碳數為3至10之環烷基所取代;k代表1至10之整數;E15代表碳數為6至20之芳香基或碳數為3至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自苯基、鹵素原子、碳數為1至4之鹵代烷
基、CN、NO2、OE17、SE18、NE19E20、PO(OCkH2k+1)2、與SO鍵結且碳數為1至10之烷基、與SO2鍵結且碳數為1至10之烷基、間雜有一或多個O、S或NE26且碳數為2至20之烷基;或其各經碳數為1至20之烷基取代,其中碳數為1至20之烷基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、COOE17、CONE19E20、苯基、碳數為3至8之環烷基、碳數為3至20之雜芳基、碳數為6至20之芳氧基羰基、碳數為3至20之雜芳氧基羰基、OE17、SE18或NE19E20;或E15代表氫原子、碳數為2至12之烯基、未經間雜或間雜有一或多個O、CO或NE26且碳數為3至8之環烷基;或E15代表碳數為1至20之烷基,碳數為1至20之烷基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、OE17、SE18、碳數為3至8之環烷基、碳數為3至20之雜芳基、碳數為6至20之芳氧基羰基、碳數為3至20之雜芳氧基羰基、NE19E20、COOE17、CONE19E20、PO(OCkH2k+1)2、、或苯基,其中碳數為1至20之烷基係經苯基取代,且苯基係經鹵素原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、OE17、SE18或NE19E20取代;或E15代表碳數為2至20之烷基,碳數為2至20之烷基係間雜有一或多個O、SO或SO2,經間雜且碳數為2至20
之烷基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、OE17、COOE17、CONE19E20、苯基或經OE17、SE18或NE19E20取代之苯基;或E15代表碳數為2至20之烷醯基或苯甲醯基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自碳數為1至6之烷基、鹵素原子、苯基、OE17、SE18或NE19E20;或E15代表未經取代或經至少一OE17取代之萘甲醯基或係碳數為3至14之雜芳基羰基;或E15代表碳數為2至12之烷氧基羰基,碳數為2至12之烷氧基羰基係未經間雜或間雜有一或多個O,其中經間雜或未經間雜且碳數為2至12之烷氧基羰基係未經取代或經至少一羥基取代;或E15代表苯氧基羰基,苯氧基羰基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自碳數為1至6之烷基、鹵素原子、碳數為1至4之鹵代烷基、苯基、OE17、SE18或NE19E20;或E15代表CN、CONE19E20、NO2、碳數為1至4之鹵代烷基、S(O)r-R2、與S(O)r鍵結之苯基,其中與S(O)r鍵結之苯基係未經取代或經碳數為1至12之烷基或SO2-R2取代,且R2代表碳數為1至6之烷基;或E15代表與SO2O鍵結之苯基、二苯基膦醯基或二(R3)-膦醯基,其中與SO2O鍵結之苯基係未經取代或經碳數為1至12之烷基取代,且R3代表碳數為1至4之烷氧基;
r表示1至2之整數;E' 15代表具有針對E15定義中其中之一者;Z2代表O、S、SO或SO2;Z3代表O、CO、S或單鍵;E16代表碳數為6至20之芳基或碳數為3至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自苯基、鹵素原子、碳數為1至4之鹵代烷基、CN、NO2、OE17、SE18、NE19E20、間雜有一或多個O、S或NE26且碳數為1至20之烷基,或者碳數為1至20之烷基,其中碳數為1至20之烷基係未經取代或經如下所示之至少一基團取代,其中至少一基團係選自鹵素原子、COOE17、CONE19E20、苯基、碳數為3至8之環烷基、碳數為3至20之雜芳基、碳數為6至20之芳氧基羰基、碳數為3至20之雜芳氧基羰基、OE17、SE18或NE19E20;或E16代表氫原子或碳數為1至20之烷基,其中碳數為1至20之烷基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、苯基、OH、SH、CN、碳數為3至6之烯氧基、OCH2CH2CN、OCH2CH2(CO)O(R1)、O(CO)-(R1)、O(CO)苯基或(CO)OH或(CO)O(R1);或E16代表碳數為2至12之烷基,碳數為2至12之烷基係間雜有一或多個O、S或NE26;或
E16代表(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(R4)、碳數為2至12之烯基或碳數為3至8之環烷基,其中該R4代表碳數為1至8之烷基;或E16代表經SE18取代之苯基,其中E18代表鍵結至COE16所附接之咔唑部份之苯基或萘基環的單鍵;n代表1至20之整數;E17代表氫原子、苯基-R5、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、OH、SH、CN、碳數為3至6之烯氧基、OCH2CH2CN、OCH2CH2(CO)O(R1)、O(CO)-(R1)、O(CO)-(R6)、與O(CO)鍵結之苯基、(CO)OH、(CO)O(R1)、碳數為3至20之環烷基、SO2-(R7)、O(R7)或間雜有一或多個O且碳數為3至20之環烷基,其中R5代表碳數為1至3之烷基、R6代表碳數為2至4之烯基,且R7代表碳數為1至4之鹵代烷基;或E17代表碳數為2至20之烷基,且碳數為2至20之烷基係間雜有一或多個O、S或NE26;或E17代表(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(R4)、碳數為1至8之烷醯基、碳數為2至12之烯基、碳數為3至6之烯醯基或碳數為3至20之環烷基,其係未經間雜或間雜有一或多個O、S、CO或NE26;或E17代表碳數為1至8之烷基與碳數為3至10之環烷基鍵結所形成之基團,且上述基團係未經間雜或經間雜有一或多個O;或
E17代表苯甲醯基,苯甲醯基係未取代或經如下所示之至少一基團取代,且該至少一基團係選自碳數為1至6之烷基、鹵素原子、OH或碳數為1至3之烷氧基;或E17代表苯基、萘基或碳數為3至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、OH、碳數為1至12之烷基、碳數為1至12之烷氧基、CN、NO2、苯基-R8、苯氧基、碳數為1至12之烷基硫基、苯基硫基、N(R9)2、二苯基-胺基或,其中R8代表碳數為1至3之烷氧基,且R9代表碳數為1至12之烷基;或E17與具有或之苯基或萘基環之其中一個碳原子形成單鍵;E18代表氫原子、碳數為2至12之烯基、碳數為3至20之環烷基或苯基-R5,其中碳數為2至12之烯基、碳數為3至20之環烷基及苯基-R5係未經間雜或間雜有一或多個O、S、CO、NE26或COOE17;或E18代表碳數為1至20之烷基,碳數為1至20之烷基係未取代或經如下所式之至少一基團取代,且至少一基團係選自OH、SH、CN、碳數為3至6之烯氧基、OCH2CH2CN、OCH2CH2(CO)O(R1)、O(CO)-(R6)、O(CO)-(R1)、O(CO)-苯基或(CO)OE17;或
E18代表碳數為2至20之烷基,碳數為2至20之烷基係間雜有一或多個O、S、CO、NE26或COOE17;或E18代表(CH2CH2O)nH、(CH2CH2O)n(CO)-(R4)、碳數為2至8之烷醯基或碳數為3至6之烯醯基;或E18代表苯甲醯基,苯甲醯基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自碳數為1至6之烷基、鹵素原子、OH、碳數為1至4之烷氧基或碳數為1至4之烷基硫基;或E18代表苯基、萘基或碳數為3至20之雜芳基,其各未取代或經如下所示之至少一基團取代,且至少一基團係選自鹵素原子、碳數為1至12之烷基、碳數為1至4之鹵代烷基、碳數為1至12之烷氧基、CN、NO2、苯基-R8、苯氧基、碳數為1至12之烷基硫基、苯基硫基、N(R9)2、二苯基胺基、(CO)O(R4)、CO-R4、(CO)N(R4)2或;E19及E20分別獨立地代表氫原子、碳數為1至20之烷基、碳數為2至4之羥基烷基、碳數為2至10之烷氧基烷基、碳數為2至5之烯基、碳數為3至20之環烷基、苯基-R5、碳數為1至8之烷醯基、碳數為1至8之烷醯基氧基、碳數為3至12之烯醯基、SO2-R7或苯甲醯基;或E19及E20代表苯基、萘基或碳數為3至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且該至少一基團係選自鹵素原子、碳數為1至4之鹵代烷基、碳數為1
至20之烷氧基、碳數為1至12之烷基、苯甲醯基或碳數為1至12之烷氧基;或E19及E20係與所鍵結之氮原子一起形成未經間雜或間雜有O、S或NE17之五員或六員飽和或不飽和環,且五員或六員飽和或不飽和環係未經取代或經如下所示之至少一基團取代,其中至少一基團係選自碳數為1至20之烷基、碳數為1至20之烷氧基、=O、OE17、SE18、NE21E22、(CO)E23、NO2、鹵素原子、碳數為1至4之鹵代烷基、CN、苯基、,或者未經間雜或經至少一O、S、CO或NE17間雜且碳數為3至20之環烷基;或E19及E20係與所附接之氮原子一起形成雜芳香族環系統,該雜芳香族環系統係未經取代或經如下所示之至少一基團取代,且該至少一基團係選自碳數為1至20之烷基、碳數為1至4之鹵代烷基、碳數為1至20之烷氧基、=O、OE17、SE18、NE21E22、(CO)E23、、鹵素原子、NO2、CN、苯基,或者未經間雜或間雜有一或多個O、S、CO或NE17且碳數為3至20的環烷基;E21及E22分別獨立地代表氫原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、碳數為3至10之環烷基或苯基;
E21及E22與其所鍵接之氮原子一起形成未經間雜或間雜有O、S或NE26之五員或六員飽和或不飽和環,其中該五員或六員飽和或不飽和環係未稠合或與苯環稠合;E23代表氫原子、OH、碳數為1至20之烷基、碳數為1至4之鹵代烷基、間雜有至少一O、CO或NE26且碳數為2至20的烷基、未經間雜或間雜有O、S、CO或NE26且碳數為3至20之環烷基;或E23代表苯基、萘基、苯基-R1、OE17、SE18或NE21E22;E24代表(CO)OE17、CONE19E20、(CO)E17或具有針對E19及E20定義中其中之一者;E25代表COOE17、CONE19E20、(CO)E17;或具有針對E17定義中其中之一者;E26代表氫原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、間雜有至少一O或CO且碳數為2至20之烷基;或E26代表苯基-R1、未經間雜或間雜有一或多個O或CO且碳數為3至8之環烷基;或E26代表(CO)E19;或E26代表苯基,E26係未經取代或經如下所示之至少一基團取代,且該至少一基團係選自碳數為1至20之烷基、鹵素原子、碳數為1至4之鹵代烷基、OE17、SE18、NE19E20或
針對式(IIIA)所示之化合物所定義的基團,較佳者係對應於如下述針對式(III)之化合物所定義者,只是所定義的肟酯基團(例如)皆替換為相應游離肟基團。 The group defined for the compound represented by the formula (IIIA) preferably corresponds to the one defined for the compound of the formula (III) below, except for the defined oxime ester group (for example). Are replaced by corresponding free sulfonium groups .
每一肟酯基團可以兩種構型(Z)或(E)存在。可藉由習用方法來分離異構體,但亦可使用異構體混合物作為(例如)光起始物質。因此,本發明之光起始劑(E-1),如式(III)所示之化合物,包含構型異構體之混合物。 Each oxime ester group can exist in two configurations (Z) or (E). The isomers can be separated by conventional methods, but a mixture of isomers can also be used as, for example, a photoinitiator. Accordingly, the photoinitiator (E-1) of the present invention, such as the compound of the formula (III), comprises a mixture of configurational isomers.
在一較佳之實施例中,光起始劑(C)包含如式(III)所示之結構的光起始劑(E-1),其中E1、E2、E3、E4、E5、E6、E7及E8分別獨立代表氫原子、碳數為1至20之烷基、、COE16或NO2;或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立地共同代表,其中至少一E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8為
必須重視如上述所定義之式(III)的化合物,其中E1、E2、E3、E4、E5、E6、E7及E8分別獨立代表氫原子、、COE16或NO2;E3及E4一起為;E9、E10、E11及E12為氫原子;Z1為單鍵;E13係碳數為1至20之烷基;E14係碳數為1至20之烷基;E15係碳數為1至20之烷基或經以下之至少一基團取代之苯基,其中至少一基團可為OE17或碳數為1至20之烷基;E16係苯基,苯基係經以下之至少一基團取代,其中至少一基團可為OE17或碳數為1至20之烷基;E17係未經取代或經至少一鹵素原子取代之碳數為1或20烷基或係間雜有至少一氧原子之碳數為1至20的烷基。 Attention must be paid to compounds of formula (III) as defined above, wherein E 1 , E 2 , E 3 , E 4 , E 5 , E 6 , E 7 and E 8 each independently represent a hydrogen atom, , COE 16 or NO 2 ; E 3 and E 4 together ; E 9 , E 10 , E 11 and E 12 are a hydrogen atom; Z 1 is a single bond; E 13 is an alkyl group having 1 to 20 carbon atoms; and E 14 is an alkyl group having 1 to 20 carbon atoms; E 15 a phenyl group having 1 to 20 carbon atoms or substituted with at least one of the following groups, wherein at least one group may be OE 17 or an alkyl group having 1 to 20 carbon atoms; E 16 phenyl group, benzene The group is substituted by at least one group, wherein at least one group may be OE 17 or an alkyl group having 1 to 20 carbon atoms; and the E 17 group is unsubstituted or substituted with at least one halogen atom and has a carbon number of 1 or The alkyl group or the interstitial is a mixture of at least one oxygen atom having 1 to 20 carbon atoms.
但條件為如式(III)所示之結構式之化合物中存在至少一。 However, the condition is that at least one of the compounds of the structural formula shown by formula (III) .
在一更佳的實施例中,光起始劑(C)包含如式(III)所示之結構的光起始劑(E-1),其中E1、E2、E3、E4、E5、E6、E7及E8分別獨立代表氫原子;或E1及E2、E3及E4或E5及E6分別獨立地共同代表,且至少一E1及E2、E3及E4或E5及E6為
本發明之光起始劑(E-1)之具體例子係如上述所定義之式(IIIa)至(IIIg)之化合物,式(IIIa)、式(IIIb)、式(IIIc),尤其式(IIIa)或式(IIIc)、或式(IIIa)、式(IIIc)或式(IIId),尤其式(IIIa)之化合物令人關注。 Specific examples of the photoinitiator (E-1) of the present invention are compounds of the formulae (IIIa) to (IIIg) as defined above, formula (IIIa), formula (IIIb), formula (IIIc), especially formula ( IIIa) or formula (IIIc), or formula (IIIa), formula (IIIc) or formula (IIId), especially a compound of formula (IIIa) is of interest.
在一例子中,E1、E2、E3、E4、E5、E6、E7及E8分別獨立代表氫原子、或COE16,或E1及E2、E2及E3、E3及E4、E5及E6、E6及E7或E7及E8分別獨立地共同代表。 In one example, E 1 , E 2 , E 3 , E 4 , E 5 , E 6 , E 7 and E 8 each independently represent a hydrogen atom, Or COE 16 , or E 1 and E 2 , E 2 and E 3 , E 3 and E 4 , E 5 and E 6 , E 6 and E 7 or E 7 and E 8 are respectively independently represented .
在一例子中,E1及E2或E3及E4共同為,或E3及E4、E5及E6共同為;E3及E4尤其共同為。 In an example, E 1 and E 2 or E 3 and E 4 are , or E 3 and E 4 , E 5 and E 6 are ; E 3 and E 4 are especially common .
在一例子中,E1、E5、E6及E8代表氫原子。較佳地,E7代表氫原子、或COE16,或E7代表或COE16,然以E7代表為更佳。較佳地,E2代表、COE16或,或E2及E1共同為,然以E2代表COE16為更佳。Z1較佳為單鍵。 In one example, E 1 , E 5 , E 6 and E 8 represent a hydrogen atom. Preferably, E 7 represents a hydrogen atom, Or COE 16 or E 7 represents Or COE 16 , but with E 7 For better. Preferably, E 2 represents , COE 16 or , or E 2 and E 1 are However, it is better to use E 2 for COE 16 . Z 1 is preferably a single bond.
在一例子中,E9、E10、E11及E12分別獨立地代表氫原子、碳數為1至20之烷基、未經取代之苯基或經如下所示之至少一基團取代之苯基,且至少一基團係選自碳數為1至6之烷基、鹵素原子、OE17或SE18;或E9、E10、E11及E12分別獨立地代表鹵素原子、OE17、SE18、或NE19E20,其中取代基OE17、SE18或NE19E20係選擇性地經由基團E17、E18、E19及/或E20與式(III)中之萘環的一個碳原子形成五員環或六員環;或 E9、E10、E11及E12分別獨立地代表或COE16。 In one example, E 9 , E 10 , E 11 and E 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an unsubstituted phenyl group or substituted with at least one group as shown below. a phenyl group, and at least one group is selected from the group consisting of a C 1 to 6 alkyl group, a halogen atom, OE 17 or SE 18 ; or E 9 , E 10 , E 11 and E 12 each independently represent a halogen atom, OE 17 , SE 18 , or NE 19 E 20 , wherein the substituent OE 17 , SE 18 or NE 19 E 20 is selectively via the groups E 17 , E 18 , E 19 and/or E 20 and formula (III) One carbon atom of the naphthalene ring forms a five-membered ring or a six-membered ring; or E 9 , E 10 , E 11 and E 12 are independently represented Or COE 16 .
在一具體的例子中,E9、E10、E11及E12分別獨立地代表氫原子、碳數為1至20之烷基、未經取代之苯基或經如下所示之至少一基團取代之苯基,且至少一基團係選自碳數為1至6之烷基、鹵素原子、OE17或SE18;或E9、E10、E11及E12分別獨立地代表鹵素原子、OE17、SE18或NE19E20;或E9、E10、E11及E12分別獨立地代表或COE16。 In a specific example, E 9 , E 10 , E 11 and E 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an unsubstituted phenyl group or at least one group as shown below a group substituted with a phenyl group, and at least one group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a halogen atom, OE 17 or SE 18 ; or E 9 , E 10 , E 11 and E 12 each independently representing a halogen Atom, OE 17 , SE 18 or NE 19 E 20 ; or E 9 , E 10 , E 11 and E 12 are independently represented Or COE 16 .
在一例子中,E9、E10、E11及E12分別獨立地代表氫原子、碳數為1至20之烷基、未經取代之苯基或經一或多個碳數為1至6之烷基取代之苯基;或E9、E10、E11及E12分別獨立地代表或COE16。 In one example, E 9 , E 10 , E 11 and E 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an unsubstituted phenyl group or one or more carbon numbers of 1 to 6 alkyl substituted phenyl; or E 9 , E 10 , E 11 and E 12 are independently represented Or COE 16 .
在另一例子中,E9、E10、E11及E12分別獨立代表氫原子、碳數為1至20之烷基、未經取代之苯基或經如下所示之至少一基團取代之苯基,且至少一基團係選自碳數為1至6之烷基、鹵素原子、OE17或SE18;或E9、E10、E11及E12分別獨立代表鹵素原子、OE17、SE18或NE19E20,其中取代基OE17、SE18或NE19E20係選擇性地 經由基團E17、E18、E19及/或E20與式(III)中之萘環的一個碳原子形成五員環或六員環。 In another example, E 9 , E 10 , E 11 and E 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an unsubstituted phenyl group or substituted with at least one group as shown below. a phenyl group, and at least one group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a halogen atom, OE 17 or SE 18 ; or E 9 , E 10 , E 11 and E 12 each independently representing a halogen atom, OE 17. SE 18 or NE 19 E 20 wherein the substituent OE 17 , SE 18 or NE 19 E 20 is selectively via the groups E 17 , E 18 , E 19 and/or E 20 and in formula (III) One carbon atom of the naphthalene ring forms a five-membered ring or a six-membered ring.
此外,在一例子中,E9、E10、E11及E12分別獨立代表氫原子、碳數為1至20之烷基、未經取代之苯基或經如下所示之至少一基團取代之苯基,至少一基團係選自碳數為1至6之烷基、鹵素原子、OE17或SE18;或E9、E10、E11及E12分別獨立代表鹵素原子、OE17、SE18、NE19E20或COE16。 Further, in one example, E 9 , E 10 , E 11 and E 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an unsubstituted phenyl group or at least one group as shown below a substituted phenyl group, at least one group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a halogen atom, OE 17 or SE 18 ; or E 9 , E 10 , E 11 and E 12 each independently representing a halogen atom, OE 17 , SE 18 , NE 19 E 20 or COE 16 .
或者,在一例子中,E9、E10、E11及E12分別獨立代表氫原子、碳數為1至20之烷基、未經取代之苯基或經如下所示之至少一基團取代之苯基,至少一基團係選自碳數為1至6之烷基、鹵素原子、OE17或SE18;或E9、E10、E11及E12分別獨立代表鹵素原子、OE17、COE16或NE19E20。 Or, in one example, E 9 , E 10 , E 11 and E 12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an unsubstituted phenyl group or at least one group as shown below a substituted phenyl group, at least one group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a halogen atom, OE 17 or SE 18 ; or E 9 , E 10 , E 11 and E 12 each independently representing a halogen atom, OE 17 , COE 16 or NE 19 E 20 .
較佳地,E9、E11及E12係氫原子,且E10為氫原子、OE17或COE16。 Preferably, E 9 , E 11 and E 12 are hydrogen atoms, and E 10 is a hydrogen atom, OE 17 or COE 16 .
E13係例如代表碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,其中上述之至少一基團係選自鹵素原子、COOE17或CONE19E20;或E13代表碳數為2至20之烷基,碳數為2至20之烷基係間雜有一或多個O、S、SO、SO2、NE26或CO;E13代表碳數為2至12之烯基,碳數為2至12之烯基係未間雜或間雜有一或多個O、CO或NE26;或 E13代表碳數為3至10之環烷基,環烷基係未間雜或間雜有一或多個O、S、CO或NE26;或E13代表苯基或萘基,且其各為未經取代或經如下所示之至少一基團取代,其中至少一基團係選自OE17、SE18、NE19E20、、COE16、NO2、鹵素原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基,經至少一O間雜且碳數為2至20的烷基;或代表碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,其中上述之至少一基團係選自鹵素原子、E17、COOE17、OE17、SE18、CONE19E20或PO(OCkH2k+1)2;或代表碳數為2至20之烷基,其係間雜有一或多個O。 The E 13 group , for example, represents an alkyl group having 1 to 20 carbon atoms which is unsubstituted or substituted with at least one group as described below, wherein at least one of the above groups is selected from a halogen atom, COOE 17 or CONE 19 E 20 ; or E 13 represents an alkyl group having 2 to 20 carbon atoms; an alkyl group having 2 to 20 carbon atoms; one or more O, S, SO, SO 2 , NE 26 or CO; E 13 represents carbon An alkenyl group having 2 to 12 alkenyl groups, an alkenyl group having 2 to 12 carbon atoms which is uninter or hetero-organic, having one or more O, CO or NE 26 ; or E 13 representing a cycloalkyl group having a carbon number of 3 to 10, The alkyl group is unintermixed or heterozygous with one or more O, S, CO or NE 26 ; or E 13 represents a phenyl or naphthyl group, and each of them is unsubstituted or substituted with at least one group as shown below, wherein At least one group is selected from the group consisting of OE 17 , SE 18 , NE 19 E 20 , , COE 16 , NO 2 , a halogen atom, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, an alkyl group having at least one O and having a carbon number of 2 to 20; or a carbon number An alkyl group of 1 to 20 which is unsubstituted or substituted with at least one group as defined below, wherein at least one of the above groups is selected from the group consisting of a halogen atom, E 17 , COOE 17 , OE 17 , SE 18 , CONE 19 E 20 or PO(OC k H 2k+1 ) 2 ; or an alkyl group having a carbon number of 2 to 20, which has one or more O interphases.
此外,E13代表碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,其中上述之至少一基團係選自鹵素原子、E17、COOE17、OE17、SE18、CONE19E20或PO(OCkH2k+1)2;或代表碳數為2至20之烷基,碳數為2至20之烷基係間雜有一個O;或代表碳數為2至12之烯基、碳數為3至10之環烷基;或E13代表苯基或萘基,且其各為未經取代或經如下所示之至少一基團取代,其中至少一基團係選自OE17、SE18、NE19E20、、COE16、NO2、鹵素原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、間雜有一或多個O之碳數為2至20的烷基。 Further, E 13 represents an alkyl group having 1 to 20 carbon atoms which is unsubstituted or substituted with at least one group as shown below, wherein at least one of the above groups is selected from a halogen atom, E 17 , COOE 17 , OE 17 , SE 18 , CONE 19 E 20 or PO(OC k H 2k+1 ) 2 ; or an alkyl group having a carbon number of 2 to 20, and an alkyl group having a carbon number of 2 to 20 having an O; Or an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms; or E 13 representing a phenyl group or a naphthyl group, each of which is unsubstituted or at least one group as shown below Substituting at least one of the groups is selected from the group consisting of OE 17 , SE 18 , NE 19 E 20 , And COE 16 , NO 2 , a halogen atom, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 20 carbon atoms and having a carbon number of 2 to 20.
在另一實施例中,E13代表碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,其中上述之至少一基團係選自鹵素原子、E17、OE17、SE18、或PO(OCkH2k+1)2;或代表間雜有一或多個O且碳數為2至20之烷基;或代表碳數為2至12之烯基、碳數為3至10之環烷基、苯基或萘基。 In another embodiment, E 13 represents an alkyl group having 1 to 20 carbon atoms which is unsubstituted or substituted with at least one group as defined below, wherein at least one of the above groups is selected from a halogen atom, E 17 , OE 17 , SE 18 , or PO(OC k H 2k+1 ) 2 ; or an alkyl group having one or more O and having a carbon number of 2 to 20; or an alkene having 2 to 12 carbon atoms A cycloalkyl group having a carbon number of 3 to 10, a phenyl group or a naphthyl group.
或者,E13例如可代表碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,其中上述之至少一基團係選自鹵素原子、E17、OE17、SE18或PO(OCkH2k+1)2;或代表至少一O間雜且碳數為2至20之烷基;或代表苯基、碳數為2至12之烯基或碳數為3至10之環烷基。 Alternatively, E 13 may, for example, represent an alkyl group having 1 to 20 carbon atoms which is unsubstituted or substituted with at least one group as defined below, wherein at least one of the above groups is selected from a halogen atom, E 17 , OE 17 , SE 18 or PO(OC k H 2k+1 ) 2 ; or an alkyl group having at least one O and having a carbon number of 2 to 20; or an alkenyl group or a carbon having a phenyl group and a carbon number of 2 to 12 The number is from 3 to 10 cycloalkyl groups.
或者,E13可代表碳數為1至20之烷基、苯基、碳數為2至12之烯基或碳數為3至10之環烷基。或E13係碳數為1至20之烷基、碳數為2至12之烯基或碳數為3至10之環烷基。較佳地,E13可代表碳數為1至20之烷基,尤其是碳數為1至8之烷基,例如2-乙基己基。 Alternatively, E 13 may represent an alkyl group having 1 to 20 carbon atoms, a phenyl group, an alkenyl group having 2 to 12 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms. Or E 13 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 12 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms. Preferably, E 13 may represent an alkyl group having from 1 to 20 carbon atoms, especially an alkyl group having from 1 to 8 carbon atoms, such as 2-ethylhexyl.
E14可例如代表氫原子、碳數為3至8之環烷基、碳數為2至5之烯基、碳數為1至20之烷氧基或碳數為1至20之烷基,其係未經取代或經至少一鹵素原子或苯基取代;或E14代表苯基或萘基,其各係未經取代或經如下所示之至少一基團取代,且至少一基團係選自碳數為1至6之烷基、 碳數為1至4之鹵代烷基、鹵素原子、OE17、SE18及/或NE19E20;或E14代表碳數為3至5之雜芳基,例如噻吩基,或代表碳數為1至8之烷氧基、芐氧基或苯氧基。 E 14 may, for example, represent a hydrogen atom, a cycloalkyl group having 3 to 8 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 20 carbon atoms or an alkyl group having 1 to 20 carbon atoms. It is unsubstituted or substituted with at least one halogen atom or phenyl group; or E 14 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with at least one group as shown below, and at least one group It is selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, a halogen atom, OE 17 , SE 18 and/or NE 19 E 20 ; or E 14 representing a carbon number of 3 to 5 An aryl group such as a thienyl group, or an alkoxy group having a carbon number of 1 to 8, a benzyloxy group or a phenoxy group.
或者,E14可例如代表碳數為1至20之烷基,且碳數為1至20之烷基係經至少一鹵素原子或苯基取代;或E14代表碳數為3至5之雜芳基(例如噻吩基)或代表未經取代或經如下所示之至少一基團取代之苯基,且至少一基團係選自碳數為1至6之烷基、碳數為1至4之鹵代烷基、鹵素原子、OE17、SE18及/或NE19E20;或E14代表碳數為1至8之烷氧基、芐氧基或苯氧基。 Alternatively, E 14 may, for example, represent an alkyl group having 1 to 20 carbon atoms, and an alkyl group having 1 to 20 carbon atoms may be substituted with at least one halogen atom or a phenyl group; or E 14 represents a carbon number of 3 to 5 An aryl group (e.g., thienyl) or a phenyl group which is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from an alkyl group having 1 to 6 carbon atoms and having a carbon number of 1 to a haloalkyl group, a halogen atom, OE 17 , SE 18 and/or NE 19 E 20 ; or E 14 represents an alkoxy group having a carbon number of 1 to 8, a benzyloxy group or a phenoxy group.
在另一實施例中,E14代表碳數1至20之烷基,且碳數1至20之烷基係未經取代或經苯基取代;或E14係苯基,且苯基未經取代或經至少一碳數為1至6之烷基取代。 In another embodiment, E 14 represents an alkyl group having 1 to 20 carbon atoms, and the alkyl group having 1 to 20 carbon atoms is unsubstituted or substituted with a phenyl group; or E 14 is a phenyl group, and the phenyl group is not Substituted or substituted with at least one alkyl group having 1 to 6 carbon atoms.
較佳地,E14係碳數為1至20之烷基、碳數為3至5之雜芳基(例如噻吩基),或係苯基,尤其為碳數為1至20之烷基或噻吩基,更佳為碳數為1至8之烷基。 Preferably, E 14 is an alkyl group having 1 to 20 carbon atoms, a heteroaryl group having 3 to 5 carbon atoms (for example, thienyl group), or a phenyl group, especially an alkyl group having 1 to 20 carbon atoms or The thienyl group is more preferably an alkyl group having 1 to 8 carbon atoms.
E15可例如為碳數為6至20之芳基或碳數為5至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於苯基、鹵素原子、碳數為1至4 之鹵代烷基、CN、NO2、OE17、SE18、NE19E20、碳數為1至20之烷基;或E15係氫原子、碳數為3至8之環烷基,其中碳數為3至8之環烷基係未經間雜或間雜有一或多個O、CO或NE26;或E15係碳數為1至20之烷基,碳數為1至20之烷基未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、OE17、碳數為3至8之環烷基、碳數為5至20之雜芳基、碳數為8至20之苯氧基羰基、碳數為5至20之雜芳氧基-羰基、NE19E20、COOE17、CONE19E20、PO(OCkH2k+1)2、、苯基或經以下基團取代之苯基,上述基團係選自於鹵素原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、OE17或NE19E20;或E15係碳數為2至20之烷基,且碳數為2至20之烷基間雜有至少一O、S或SO2,或E15係碳數為2至20之烷醯基、苯甲醯基、碳數為2至12之烷氧基羰基、苯氧基羰基、CONE19E20、NO2或碳數為1至4之鹵代烷基。 E 15 may, for example, be an aryl group having 6 to 20 carbon atoms or a heteroaryl group having 5 to 20 carbon atoms, each of which is unsubstituted or substituted with at least one group as shown below, and at least one group is selected From a phenyl group, a halogen atom, a halogenated alkyl group having 1 to 4 carbon atoms, CN, NO 2 , OE 17 , SE 18 , NE 19 E 20 , an alkyl group having 1 to 20 carbon atoms; or an E 15 hydrogen atom a cycloalkyl group having 3 to 8 carbon atoms, wherein the cycloalkyl group having 3 to 8 carbon atoms is undoped or inter-hetero-doped with one or more O, CO or NE 26 ; or the E 15 carbon number is 1 to 20 The alkyl group, the alkyl group having 1 to 20 carbon atoms is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from a halogen atom, OE 17 and a carbon number of 3 to 8. a cycloalkyl group, a heteroaryl group having 5 to 20 carbon atoms, a phenoxycarbonyl group having 8 to 20 carbon atoms, a heteroaryloxy-carbonyl group having 5 to 20 carbon atoms, NE 19 E 20 , COOE 17 , CONE 19 E 20 , PO(OC k H 2k+1 ) 2 , a phenyl group or a phenyl group substituted by a group selected from the group consisting of a halogen atom, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, OE 17 or NE 19 E 20 Or E 15 is an alkyl group having 2 to 20 carbon atoms, and an alkyl group having 2 to 20 carbon atoms is interspersed with at least one O, S or SO 2 or an E 15 alkyl group having 2 to 20 carbon atoms. And a benzepidine group, an alkoxycarbonyl group having 2 to 12 carbon atoms, a phenoxycarbonyl group, CONE 19 E 20 , NO 2 or a halogenated alkyl group having 1 to 4 carbon atoms.
此外,E15可例如為氫原子、碳數為6至20之芳基,尤其為苯基或萘基,苯基或萘基係各未經取代或經碳數為1至12之烷基取代;或係碳數為3至5之雜芳基,例如噻吩基;或係碳數為3至8之環烷基、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係 選自於OE17、SE17、碳數為3至8之環烷基、NE19E20或COOE17;或E15係碳數為2至20之烷基,且碳數為2至20之烷基間雜有至少一O或SO2。 Further, E 15 may, for example, be a hydrogen atom, an aryl group having 6 to 20 carbon atoms, especially a phenyl group or a naphthyl group, each of which is unsubstituted or substituted with an alkyl group having 1 to 12 carbon atoms. Or a heteroaryl group having a carbon number of 3 to 5, such as a thienyl group; or a cycloalkyl group having a carbon number of 3 to 8, an alkyl group having 1 to 20 carbon atoms, which is unsubstituted or as follows At least one group is substituted, and at least one group is selected from OE 17 , SE 17 , a cycloalkyl group having a carbon number of 3 to 8, NE 19 E 20 or COOE 17 ; or an E 15 carbon number of 2 An alkyl group of 20, and an alkyl group having 2 to 20 carbon atoms is interspersed with at least one O or SO 2 .
在如式(III)所示之化合物中,E15可例如為氫原子、苯基、萘基,其各未經取代或經碳數為1至8之烷基取代;或E15係噻吩基、碳數為1至20之烷基,其未經取代或經如下所示之至少一基團取代,且至少一基團係選自於OE17、SE17、碳數為3至8之環烷基、NE19E20或COOE17;或E15係碳數為2至20之烷基,且碳數為2至20之烷基間雜有至少一O或SO2。 In the compound of the formula (III), E 15 may, for example, be a hydrogen atom, a phenyl group or a naphthyl group, each of which is unsubstituted or substituted with an alkyl group having 1 to 8 carbon atoms; or an E 15 -based thienyl group. An alkyl group having 1 to 20 carbon atoms which is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from the group consisting of OE 17 and SE 17 and having a carbon number of 3 to 8. An alkyl group, NE 19 E 20 or COOE 17 ; or E 15 is an alkyl group having 2 to 20 carbon atoms, and an alkyl group having 2 to 20 carbon atoms is interspersed with at least one O or SO 2 .
E15尤其為(例如)碳數為3至8之環烷基或碳數為1至20之烷基,較佳為碳數為1至20之烷基,更佳為碳數為1至12之烷基。 E 15 is especially, for example, a cycloalkyl group having 3 to 8 carbon atoms or an alkyl group having 1 to 20 carbon atoms, preferably an alkyl group having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms. Alkyl group.
E'14及E'15之較佳者分別具有如上文針對E14及E15所定義中的其中一者。 The preferred ones of E' 14 and E' 15 respectively have one of the definitions defined above for E 14 and E 15 .
Z2係(例如)O、S或SO,例如O或S,尤其為O。 Z 2 is, for example, O, S or SO, such as O or S, especially O.
E16可例如為碳數為6至20之芳基(尤其苯基或萘基、尤其苯基)或碳數為5至20之雜芳基(尤其噻吩基),其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於苯基、鹵素原子、碳數為1至4之鹵代烷基、CN、NO2、OE17、SE18、NE19E20或間雜至少一O之碳數為1至20之烷基;或其各經至少一碳數為1至20之烷基取代,碳數 為1至20之烷基未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、COOE17、CONE19E20、苯基、碳數為3至8之環烷基、碳數為5至20之雜芳基、碳數為6至20之芳氧基羰基、碳數為5至20之雜芳氧基羰基、OE17、SE18或NE19E20;或E16係氫原子、碳數為1至20之烷基,且碳數為1至20之烷基未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、苯基、OH、SH、碳數為3至6之烯氧基、OCH2CH2(CO)O(R1)、O(CO)-(R1)、O(CO)-苯基、(CO)OH或(CO)O(R1);或E16係碳數為2至12之烷基,且碳數為2至12之烷基間雜有至少一O;或E16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(R4)、碳數為2至12之烯基或碳數為3至8之環烷基,且n係1至20,例如1至12或1至8,尤其為1或2。 E 16 may, for example, be an aryl group having 6 to 20 carbon atoms (especially a phenyl or naphthyl group, especially a phenyl group) or a heteroaryl group having a carbon number of 5 to 20 (especially a thienyl group), each of which is unsubstituted or Substituting at least one group as shown below, and at least one group is selected from the group consisting of a phenyl group, a halogen atom, a halogenated alkyl group having a carbon number of 1 to 4, CN, NO 2 , OE 17 , SE 18 , NE 19 E 20 Or an alkyl group having at least one carbon number of 1 to 20; or each of which is substituted with at least one alkyl group having 1 to 20 carbon atoms, an alkyl group having 1 to 20 carbon atoms unsubstituted or as shown below Substituting at least one group, and at least one group is selected from the group consisting of a halogen atom, COOE 17 , CONE 19 E 20 , a phenyl group, a cycloalkyl group having a carbon number of 3 to 8, and a heteroaryl group having a carbon number of 5 to 20. a aryloxycarbonyl group having 6 to 20 carbon atoms, a heteroaryloxycarbonyl group having 5 to 20 carbon atoms, OE 17 , SE 18 or NE 19 E 20 ; or an E 16 -based hydrogen atom having a carbon number of 1 to An alkyl group of 20, wherein the alkyl group having 1 to 20 carbon atoms is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from the group consisting of a halogen atom, a phenyl group, an OH group, an SH group, and a carbon group. Number 3 to 6 alkenyloxy, OCH 2 CH 2 (CO)O(R 1 ), O (CO)-(R 1 ), O(CO)-phenyl, (CO)OH or (CO)O(R 1 ); or an E 16 alkyl group having 2 to 12 carbon atoms and having a carbon number of 2 Between the alkyl groups of 12, at least one O; or E 16 (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(R 4 ), carbon number 2 to 12 The alkenyl group or a cycloalkyl group having a carbon number of 3 to 8 and n is 1 to 20, for example 1 to 12 or 1 to 8, especially 1 or 2.
此外,E16可例如為苯基或萘基,尤其為苯基、噻吩基或咔唑,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於苯基、鹵素原子、碳數為1至4之鹵代烷基、OE17、SE18、NE19E20或碳數為1至20之烷基;或E16係碳數為1至20之烷基,碳數為1至20之烷基未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、苯基、OH、SH、碳數為3至6之烯氧基、 OCH2CH2(CO)O(R1)、O(CO)-(R1)、O(CO)-苯基、(CO)OH或(CO)O(R1);或E16係碳數為2至12之烷基,且碳數為2至12之烷基係間雜有至少一O;或E16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(R4)、碳數為2至12之烯基或碳數為3至8之環烷基,且n係1至20,例如1至12或1至8,尤其為1或2。 Furthermore, E 16 may, for example, be phenyl or naphthyl, especially phenyl, thienyl or oxazole, each unsubstituted or substituted by at least one group as shown below, and at least one group selected from a phenyl group, a halogen atom, a halogenated alkyl group having 1 to 4 carbon atoms, OE 17 , SE 18 , NE 19 E 20 or an alkyl group having 1 to 20 carbon atoms; or an E 16 alkyl group having 1 to 20 carbon atoms An alkyl group having 1 to 20 carbon atoms is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from a halogen atom, a phenyl group, an OH group, and an SH group having a carbon number of 3 to 6 Alkenyloxy, OCH 2 CH 2 (CO)O(R 1 ), O(CO)-(R 1 ), O(CO)-phenyl, (CO)OH or (CO)O(R 1 ); Or an E 16 alkyl group having 2 to 12 carbon atoms, and an alkyl group having 2 to 12 carbon atoms having at least one O; or an E 16 system (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(R 4 ), an alkenyl group having 2 to 12 carbon atoms or a cycloalkyl group having 3 to 8 carbon atoms, and n is 1 to 20, for example 1 to 12 or 1 to 8 Especially 1 or 2.
此外,E16可例如為苯基或萘基,尤其為苯基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於苯基、鹵素原子、碳數為1至4之鹵代烷基、OE17、SE18、NE19E20或碳數為1至20之烷基;或E16係碳數為3至5之雜芳基,尤其為噻吩基。 Furthermore, E 16 may, for example, be phenyl or naphthyl, especially phenyl, each unsubstituted or substituted by at least one group as shown below, and at least one group selected from phenyl, halogen atom, a haloalkyl group having 1 to 4 carbon atoms, OE 17 , SE 18 , NE 19 E 20 or an alkyl group having 1 to 20 carbon atoms; or an E 16 group heteroaryl group having 3 to 5 carbon atoms, especially a thienyl group .
E16尤其為(例如)苯基,苯基未經取代或經如下所示之至少一基團取代,且至少一基團係選自於OE17、SE18、NE19E20或碳數為1至20之烷基,或E16係噻吩基。 E 16 is especially, for example, a phenyl group which is unsubstituted or substituted with at least one group as shown below, and at least one group selected from OE 17 , SE 18 , NE 19 E 20 or a carbon number of An alkyl group of 1 to 20, or an E 16 system thienyl group.
較佳地,E16係(例如)苯基或萘基,其各未經取代或經至少一碳數為1至20之烷基取代。 Preferably, E 16 is, for example, phenyl or naphthyl, each unsubstituted or substituted with at least one alkyl group having from 1 to 20 carbon atoms.
E16尤其為苯基,且苯基經至少一碳數為1至20之烷基取代。 E 16 is especially a phenyl group, and the phenyl group is substituted with at least one alkyl group having 1 to 20 carbon atoms.
E17可例如為氫原子、苯基-R5、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、OH、OCH2CH2(CO)O(R1)、O(CO)-(R1)、O(CO)-(R6)、 O(CO)-苯基、(CO)OH、(CO)O(R1)、碳數為3至20之環烷基或間雜有至少一O之碳數為3至20之環烷基;或E17係碳數為2至20之烷基,且碳數為2至20之烷基間雜有至少一O;或E17係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(R4)、碳數為1至8之烷醯基、碳數為2至12之烯基、碳數為3至6之烯醯基或碳數為3至20之環烷基,其係未經間雜或間雜有至少一O;或E17係苯甲醯基,且苯甲醯基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於碳數為1至6之烷基、鹵素原子、OH或碳數為1至3之烷氧基取代;或E17係苯基、萘基或碳數為5至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、OH、碳數為1至12之烷基、碳數為1至12之烷氧基、CN、NO2、苯基-R8、苯氧基、碳數為1至12之烷基硫基、苯基硫基、N(R9)2、二苯基-胺基或。 E 17 may, for example, be a hydrogen atom, a phenyl-R 5 group, an alkyl group having 1 to 20 carbon atoms, which is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from Halogen atom, OH, OCH 2 CH 2 (CO)O(R 1 ), O(CO)-(R 1 ), O(CO)-(R 6 ), O(CO)-phenyl, (CO)OH , (CO)O(R 1 ), a cycloalkyl group having 3 to 20 carbon atoms or a cycloalkyl group having a carbon number of 3 to 20 intermixed with at least one O; or an E 17 alkyl group having 2 to 20 carbon atoms And the alkyl group having a carbon number of 2 to 20 is interspersed with at least one O; or E 17 (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(R 4 ) An alkanoyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, an olefinic group having 3 to 6 carbon atoms or a cycloalkyl group having 3 to 20 carbon atoms, which is unintercalated or Between at least one O; or E 17 benzyl fluorenyl, and the benzyl group is unsubstituted or substituted by at least one group as shown below, and at least one group is selected from a carbon number of 1 to An alkyl group, a halogen atom, an OH group or an alkoxy group having a carbon number of 1 to 3; or an E 17 group phenyl group, a naphthyl group or a heteroaryl group having a carbon number of 5 to 20, each of which is unsubstituted or Substituting at least one group as shown below, and Less in a group selected from a halogen atom, OH, an alkyl group having a carbon number of 1-12, an alkoxy group having a carbon number of 1 to 12, CN, NO 2, phenyl -R 8, a phenoxy group, C An alkylthio group of 1 to 12, a phenylthio group, a N(R 9 ) 2 , a diphenyl-amino group or .
在另一實施例中,E17係(例如)氫原子、苯基-R5、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、O(CO)-(R1)、O(CO)-(R6)或間雜有至少一O之碳數為2至20之烷基;或 E17係碳數為1至8之烷醯基、碳數為2至12之烯基、碳數為3至6之烯醯基、間雜有至少一O之碳數為2至20之烷基、未經間雜或間雜有至少一O之碳數為3至20之環烷基;或E17係苯甲醯基,苯甲醯基係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於碳數為1至6之烷基、鹵素原子、OH或碳數為1至3之烷氧基;或E17係苯基或萘基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、碳數為1至12之烷基或碳數為1至12之烷氧基。 In another embodiment, E 17 is, for example, a hydrogen atom, a phenyl-R 5 , an alkyl group having from 1 to 20 carbon atoms, which is unsubstituted or substituted with at least one group as shown below, and At least one group is selected from a halogen atom, O(CO)-(R 1 ), O(CO)-(R 6 ) or an alkyl group having at least one O and having a carbon number of 2 to 20; or E 17 And an alkylene group having 1 to 8 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, an olefinic group having 3 to 6 carbon atoms, an alkyl group having 2 to 20 carbon atoms and at least one O, and not a heterocyclic or intervening heterocyclic alkyl group having at least one carbon number of 3 to 20; or an E 17 benzhydryl group, which is unsubstituted or substituted with at least one group as shown below, and At least one group is selected from an alkyl group having 1 to 6 carbon atoms, a halogen atom, OH or an alkoxy group having 1 to 3 carbon atoms; or an E 17 phenyl group or a naphthyl group, each of which is unsubstituted or Substituted by at least one group as shown below, and at least one group is selected from a halogen atom, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
E17亦為(例如)氫原子、苯基-R5、碳數為1至8之烷醯基、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、碳數為3至20之環烷基、O(CO)-(R1)、O(CO)-(R6)或間雜有至少一O之碳數為2至20之烷基,或E17係碳數為2至20之烷基,其間雜有至少一O。 E 17 is also, for example, a hydrogen atom, a phenyl-R 5 group, an alkanoyl group having 1 to 8 carbon atoms, an alkyl group having 1 to 20 carbon atoms, which is unsubstituted or at least one as shown below. a group substituted, and at least one group is selected from a halogen atom, a cycloalkyl group having 3 to 20 carbon atoms, O(CO)-(R 1 ), O(CO)-(R 6 ) or at least O is an alkyl group of a carbon number of 2 to 20, E 17, or based carbon atoms of the alkyl group of 2 to 20, between at least one heteroatom O.
E17尤其為氫原子、碳數為1至8之烷醯基、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於O(CO)-(R1)、O(CO)-(R6)或間雜有至少一O之碳數為2至20之烷基,或E17係碳數為2至20之烷基,其間雜有至少一O。 E 17 is especially a hydrogen atom, an alkanoyl group having 1 to 8 carbon atoms, an alkyl group having 1 to 20 carbon atoms, which is unsubstituted or substituted with at least one group as shown below, and at least one group Is selected from O(CO)-(R 1 ), O(CO)-(R 6 ) or an alkyl group having at least one O carbon number of 2 to 20, or an E 17 carbon number of 2 to 20 An alkyl group having at least one O intermixed therebetween.
E18係(例如)碳數為3至20之環烷基,其未經間雜或間雜有至少一O;或 E18係碳數為1至20之烷基,其未經取代或經如下所示之至少一基團取代,且至少一基團係選自於OH、O(CO)-(R6)、O(CO)-(R1)或(CO)OE17;或E18係碳數為2至20之烷基,其間雜有至少一O、S、CO、NE26或COOE17;或E18係碳數為2至8之烷醯基或碳數為3至6之烯醯基、苯甲醯基;或E18係苯基、萘基或碳數為3至20之雜芳基,其各未經取代或經如下所示之至少一基團取代,且至少一基團係選自於鹵素原子、碳數為1至12之烷基、碳數為1至4之鹵代烷基、碳數為1至12之烷氧基或NO2。 E 18 is, for example, a cycloalkyl group having 3 to 20 carbon atoms which is undoped or inter-heteromeric with at least one O; or an E 18 alkyl group having 1 to 20 carbon atoms which is unsubstituted or as follows At least one group is substituted, and at least one group is selected from OH, O(CO)-(R 6 ), O(CO)-(R 1 ) or (CO)OE 17 ; or E 18 -based carbon a number of 2 to 20 alkyl groups interspersed with at least one O, S, CO, NE 26 or COOE 17 ; or an E 18 alkylene group having 2 to 8 carbon atoms or an olefin having 3 to 6 carbon atoms a phenyl fluorenyl group; or an E 18 phenyl group, a naphthyl group or a heteroaryl group having a carbon number of 3 to 20, each of which is unsubstituted or substituted with at least one group as shown below, and at least one group It is selected from a halogen atom, an alkyl group having 1 to 12 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or NO 2 .
在另一實施例中,E18係(例如)碳數為3至20之環烷基、碳數為1至20之烷基,其係未經取代或經如下所示之至少一基團取代,且至少一基團係選自於OH、O(CO)-(R6)、O(CO)-(R1)或(CO)OE17;或E18係苯基或萘基,其各未經取代或經至少一鹵素原子或碳數為1至12之烷基,尤其鹵素原子取代。 In another embodiment, E 18 is, for example, a cycloalkyl group having from 3 to 20 carbon atoms, an alkyl group having from 1 to 20 carbon atoms, which is unsubstituted or substituted with at least one group as shown below And at least one group is selected from the group consisting of OH, O(CO)-(R 6 ), O(CO)-(R 1 ) or (CO)OE 17 ; or E 18 phenyl or naphthyl, each of which Unsubstituted or substituted with at least one halogen atom or an alkyl group having 1 to 12 carbon atoms, especially a halogen atom.
E18係(例如)碳數為1至20之烷基、碳數為2至12之烯基、碳數為3至20之環烷基、苯基-R5、碳數為2至8之烷醯基、苯甲醯基、苯基或萘基。 E 18 is, for example, an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, a phenyl group - R 5 and a carbon number of 2 to 8 Alkyl, benzylidene, phenyl or naphthyl.
舉例而言,E18係碳數為1至20之烷基,其經如下所示之至少一基團取代,且至少一基團係選自於OH、O(CO)-(R6)、O(CO)-(R1)或(CO)OE17,或E18係苯基,其經至少一鹵素原子取代。 For example, E 18 is an alkyl group having 1 to 20 carbon atoms which is substituted with at least one group as shown below, and at least one group is selected from OH, O(CO)-(R 6 ), O(CO)-(R 1 ) or (CO)OE 17 , or an E 18 -based phenyl group substituted with at least one halogen atom.
較佳地,E18係碳數為1至8之烷基,其如上文所定義經取代。 Preferably, E 18 is an alkyl group having 1 to 8 carbon atoms which is substituted as defined above.
舉例而言,E19及E20分別獨立地為氫原子、碳數為1至20之烷基、碳數為2至4之羥基烷基、碳數為3至20之環烷基、苯基-R5、苯基或萘基、碳數為1至8之烷醯基、碳數為1至8之烷醯基氧基、碳數為3至12之烯醯基或苯甲醯基;或E19及E20係與所鍵結之氮原子一起形成未經間雜或間雜有O、S或NE17之五員或六員飽和或不飽和環;或E19及E20係與所鍵結之氮原子一起形成雜芳香族環系統,雜芳香族環系統未經取代或經如下所示之至少一基團取代,且至少一基團係選自於碳數為1至20之烷基、碳數為1至4之鹵代烷基、或。 For example, E 19 and E 20 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, and a phenyl group. a -R 5 , phenyl or naphthyl group, an alkanoyl group having 1 to 8 carbon atoms, an alkyl fluorenyloxy group having 1 to 8 carbon atoms, an olefinic group having a carbon number of 3 to 12 or a benzamidine group; Or the E 19 and E 20 systems together with the bonded nitrogen atom form a five- or six-membered saturated or unsaturated ring without interstitial or interstitial O, S or NE 17 ; or E 19 and E 20 and the bond The nitrogen atoms of the knot together form a heteroaromatic ring system, the heteroaromatic ring system is unsubstituted or substituted with at least one group as shown below, and at least one group is selected from an alkyl group having 1 to 20 carbon atoms. a halogenated alkyl group having 1 to 4 carbon atoms, or .
此外,舉例而言,E19及E20分別獨立地為氫原子、碳數為1至20之烷基、碳數為2至4之羥基烷基、碳數為3至20之環烷基、苯基-R5、碳數為1至8之烷醯基、碳數為1至8之烷醯基氧基、碳數為3至12之烯醯基或苯甲醯基;或E19及E20係與所鍵結之氮原子一起形成未經間雜或間雜有O或NE17之五員或六員飽和環;或E19及E20係與所鍵結之氮原子一起形成咔唑環。 Further, for example, E 19 and E 20 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, Phenyl-R 5 , an alkanoyl group having a carbon number of 1 to 8, an alkanoyloxy group having 1 to 8 carbon atoms, an olefinic group having a carbon number of 3 to 12 or a benzhydryl group; or E 19 and The E 20 system together with the bonded nitrogen atom forms a five- or six-membered saturated ring without inter- or inter-organic O or NE 17 ; or the E 19 and E 20 systems together with the bonded nitrogen atom form an indazole ring .
舉例而言,E19及E20分別獨立地為氫原子、碳數為1至20之烷基、碳數為2至4之羥基烷基、碳數為3至20 之環烷基、苯基-R5、碳數為1至8之烷醯基、碳數為1至8之烷醯基氧基、碳數為3至12之烯醯基或苯甲醯基;或E19及E20係與所鍵結之氮原子一起形成未經間雜或間雜有O或NE17之五員或六員飽和環。 For example, E 19 and E 20 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, and a phenyl group. -R 5 , an alkanoyl group having 1 to 8 carbon atoms, an alkenyloxy group having 1 to 8 carbon atoms, an olefinic group having a carbon number of 3 to 12 or a benzamidine group; or E 19 and E 20 Together with the nitrogen atom to which it is bonded, it forms a five- or six-membered saturated ring that is either inter- or hetero-organized with O or NE 17 .
較佳地,E19及E20分別獨立地為碳數為1至8之烷醯基、碳數為1至8之烷醯基氧基;或E19及E20係與所鍵結之氮原子形成嗎啉環。 Preferably, E 19 and E 20 are each independently an alkanoyl group having 1 to 8 carbon atoms, an alkyl fluorenyl group having 1 to 8 carbon atoms, or an E 19 and E 20 system bonded to a nitrogen atom; The atom forms a morpholine ring.
舉例而言,E21及E22分別獨立地為氫原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、碳數為3至10之環烷基或苯基;或E21及E22係與所鍵結之氮原子形成嗎啉環。E21及E22尤其分別獨立地為氫原子或碳數為1至20之烷基。 For example, E 21 and E 22 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms or a phenyl group; Or the E 21 and E 22 systems form a morpholine ring with the bonded nitrogen atom. In particular, E 21 and E 22 are each independently a hydrogen atom or an alkyl group having 1 to 20 carbon atoms.
E23係(例如)氫原子、OH、苯基或碳數為1至20之烷基。E23尤其為氫原子、OH或碳數為1至4之烷基。 E 23 is, for example, a hydrogen atom, an OH group, a phenyl group or an alkyl group having 1 to 20 carbon atoms. E 23 is especially a hydrogen atom, OH or an alkyl group having 1 to 4 carbon atoms.
E24之較佳者係如針對E19及E20所定義之其中一者。E25之較佳者係如針對E17所定義之其中一者。 The preferred of E 24 is as defined for E 19 and E 20 . The preferred of E 25 is one of those defined for E 17 .
E26係(例如)氫原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基、碳數為2至20之烷基,其間雜有至少一O或CO;或E26係苯基-R1、碳數為3至8之環烷基,且碳數為3至8之環烷基係未經間雜或間雜一或多個O或CO;或E26係(CO)E19或苯基,且苯基係未經取代或經以下至少一基團取代,至少一基團可為碳數為1至20之烷基、鹵素原子、碳數為1至4之鹵代烷基、OE17、SE18、NE19E20。 E 26 is, for example, a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, an alkyl group having 2 to 20 carbon atoms, and at least one O or CO intermixed therebetween; or E 26 series phenyl-R 1 , cycloalkyl having 3 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms without inter- or hetero- or one or more O or CO; or E 26 (CO) E 19 or a phenyl group, and the phenyl group is unsubstituted or substituted by at least one of the following groups, and at least one group may be an alkyl group having 1 to 20 carbon atoms, a halogen atom, and an alkyl halide having 1 to 4 carbon atoms. Base, OE 17 , SE 18 , NE 19 E 20 .
或E26表示(例如)氫原子、碳數為1至20之烷基、碳數為1至4之鹵代烷基;係苯基-R1、碳數為3至8之環烷基、(CO)E19或苯基,且苯基係未經取代或經至少一碳數為1至20之烷基取代。此外,E26係(例如)氫或碳數為1至20之烷基、尤其為碳數為1至4之烷基。 Or E 26 represents, for example, a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, a phenyl group-R 1 , a cycloalkyl group having 3 to 8 carbon atoms, (CO) E 19 or a phenyl group, and the phenyl group is unsubstituted or substituted with at least one alkyl group having 1 to 20 carbon atoms. Further, E 26 is, for example, hydrogen or an alkyl group having 1 to 20 carbon atoms, particularly an alkyl group having 1 to 4 carbon atoms.
前述具有如式(III)所示之結構的光起始劑(E-1)之具體例可包含具有如下式(III-1)至式(III-86)所示之結構的光起始劑。 Specific examples of the photoinitiator (E-1) having the structure represented by the formula (III) may include a photoinitiator having a structure represented by the following formula (III-1) to formula (III-86). .
基於鹼可溶性樹脂(C)之使用量為100重量份,光起始劑(E-1)之使用量為0.1重量份至15重量份,較佳為1重量份至12重量份,且更佳為3重量份至10重量份。若感光性樹脂組成物含有光起始劑(E-1),則其可具有較佳的耐化性。 The photoinitiator (E-1) is used in an amount of from 0.1 part by weight to 15 parts by weight, preferably from 1 part by weight to 12 parts by weight, based on 100 parts by weight of the alkali-soluble resin (C), and more preferably It is from 3 parts by weight to 10 parts by weight. If the photosensitive resin composition contains the photoinitiator (E-1), it can have better chemical resistance.
其它自由基型光起始劑(E-2)Other free radical photoinitiators (E-2)
本發明之光起始劑(E)可進一步包含其它自由基型光起始劑(E-2)。 The photoinitiator (E) of the present invention may further comprise other radical type photoinitiator (E-2).
其它自由基型光起始劑(E-2)可選自於苯乙酮系化合物(acetophenone)、二咪唑系化合物(biimidazole)、醯肟系化合物(acyl oxime)或此等之一組合。 The other radical type photoinitiator (E-2) may be selected from the group consisting of an acetophenone compound, a biimidazole compound, an acyl oxime compound, or a combination thereof.
上述的苯乙酮系化合物是選自於對二甲胺苯乙酮(p-dimethylamino-acetophenone)、α,α’-二甲氧基氧化偶氮苯乙酮(α,α’-dimethoxyazoxy-acetophenone)、2,2’-二甲基-2-苯基苯乙酮(2,2’-dimethyl-2-phenyl-acetophenone)、對甲氧基苯乙酮(p-methoxy-acetophenone)、2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮〔2-methyl-1-(4-methylthio phenyl)-2-morpholino-1-propanone〕、2-苄基-2-氮,氮-二甲胺-1-(4-嗎啉代苯基)-1-丁酮〔2-benzyl-2-N,N-di-methylamino-1-(4-morpholinophenyl)-1-butanone〕。 The above acetophenone-based compound is selected from the group consisting of p-dimethylamino-acetophenone, α ,α'-dimethoxyoxo acetophenone (α,α'-dimethoxyazoxy-acetophenone). , 2,2'-dimethyl-2-phenyl-acetophenone, p-methoxy-acetophenone, 2- Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2- Benzyl-2-nitrogen, nitrogen-dimethylamine-1-(4-morpholinophenyl)-1-butanone [2-benzyl-2-N,N-di-methylamino-1-(4-morpholinophenyl) )-1-butanone].
上述的二咪唑系化合物是選自於2,2’-雙(鄰-氯苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-chlorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-氟苯基)-4,4,5,5’-四苯基二咪唑〔2,2’-bis(o-fluorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-甲基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-methyl phenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-甲氧基苯基)-4,4’,5,5’-四苯 基二咪唑〔2,2’-bis(o-methoxyphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-乙基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-ethylphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(對甲氧基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(p-methoxyphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(2,2’,4,4’-四甲氧基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(2,2’,4,4’-tetramethoxyphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(2-氯苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(2-chlorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(2,4-dichlorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕。 The above diimidazole compound is selected from 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole [2,2'-bis (o-chlorophenyl) )-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-fluorophenyl)-4,4,5,5'-tetraphenyldiimidazole [2,2' -bis(o-fluorophenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyl 2,2'-bis(o-methyl phenyl)-4,4',5,5'-tetraphenyl-biimidazole, 2,2'-bis(o-methoxyphenyl)-4, 4',5,5'-tetraphenyl 2,2'-bis(o-methoxyphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-ethylphenyl)-4,4' , 2,2'-bis(o-ethylphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(p-methoxyl) Phenyl)-4,4',5,5'-tetraphenyl-biimidazole [2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2 '-Bis(2,2',4,4'-tetramethoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole [2,2'-bis(2,2', 4,4'-tetramethoxyphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(2,4-dichlorophenyl)-4,4 ',5,5'-2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole].
上述的醯肟系化合物是選自於乙烷酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟)〔Ethanone,1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,1-(O-acetyl oxime),例如Ciba Specialty Chemicals製之品名為CGI-242者,其結構如下式(E-2-1)所示〕、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮2-(O-苯醯基肟)〔1-[4-(benzoyl)phenyl]-heptane-1,2-dione 2-(O-benzoyloxime),例如Ciba Specialty Chemicals製造之商品名為CGI-124之商品,其結構如下式(E-2-2)所示〕、乙烷酮,1-[9-乙基-6-(2-氯-4-苯甲基-硫
代-苯甲醯基)-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟)〔Ethanone,1-[9-ethyl-6-(2-cholro-4-benzyl-thio-benzoyl)-9H-carbazole-3-yl]-,1-(O-acetyl oxime),例如旭電化公司製,其結構如下式(E-2-3)所示〕:
較佳地,該其它自由基型光起始劑(E-2)為2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮、2-苄基-2-氮,氮-二甲胺-1-(4-嗎啉代苯基)-1-丁酮、2,2’-雙(鄰-氯苯基)-4,4’,5,5’-四苯基二咪唑、乙烷酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟)或此等之一組合。 Preferably, the other radical photoinitiator (E-2) is 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl Base-2-nitrogen, nitrogen-dimethylamine-1-(4-morpholinophenyl)-1-butanone, 2,2'-bis(o-chlorophenyl)-4,4',5, 5'-tetraphenyldiimidazole, ethyl ketone, 1-[9-ethyl-6-(2-methylbenzylidenyl)-9hydro-oxazol-3-substituted group]-, 1-( Oxygen-acetamidine) or a combination of these.
本發明之其它自由基型光起始劑(E-2)可進一步添加下列之化合物:噻噸酮(thioxanthone)、2,4-二乙基 噻噸酮(2,4-diethyl-thioxanthanone)、噻噸酮-4-碸(thioxanthone-4-sulfone)、二苯甲酮(benzophenone)、4,4’-雙(二甲胺)二苯甲酮〔4,4’-bis(dimethylamino)benzophenone〕、4,4’-雙(二乙胺)二苯甲酮〔4,4’-bis(diethylamino)benzophenone〕等之二苯甲酮(benzophenone)類化合物;苯偶醯(benzil)、乙醯基(acetyl)等之α-二酮(α-diketone)類化合物;二苯乙醇酮(benzoin)等之酮醇(acyloin)類化合物;二苯乙醇酮甲醚(benzoin methylether)、二苯乙醇酮乙醚(benzoin ethylether)、二苯乙醇酮異丙醚(benzoin isopropyl ether)等之酮醇醚(acyloin ether)類化合物;2,4,6-三甲基苯醯二苯基膦氧化物(2,4,6-trimethyl-benzoyl-diphenyl-phosphineoxide)、雙-(2,6-二甲氧基苯醯)-2,4,4-三甲基苯基膦氧化物〔bis-(2,6-dimethoxy-benzoyl)-2,4,4-trimethyl-benzyl-phosphineoxide〕等之醯膦氧化物(acylphosphineoxide)類化合物;蒽醌(anthraquinone)、1,4-萘醌(1,4-naphthoquinone)等之醌(quinone)類化合物;苯醯甲基氯(phenacyl chloride)、三溴甲基苯碸(tribromomethyl-phenylsulfone)、三(三氯甲基)-s-三嗪〔tris(trichloromethyl)-s-triazine〕等之鹵化物;以及二-第三丁基過氧化物(di-tertbutylperoxide)等之過氧化物。其中,以二苯甲酮(benzophenone)類化合物較佳,尤以4,4’-雙(二乙胺)二苯甲酮為最佳。 The other radical type photoinitiator (E-2) of the present invention may further contain the following compounds: thioxanthone, 2,4-diethyl-thioxanthanone, Thioxanthone-4-sulfone, benzophenone, 4,4'-bis(dimethylamino)benzophenone a benzophenone compound such as 4,4'-diethylaminobenzophenone; benzil or acetamidine (Acetyl), etc. α - dione (α -diketone) compound; benzoin-based compound (Benzoin) etc. ketol (acyloin); Benzoin methyl ether (benzoin methylether), benzoin ethyl ether (benzoin ethylether), benzoin isopropyl ether and other acyloin ether compounds; 2,4,6-trimethylphenylhydrazine diphenylphosphine oxide (2,4 ,6-trimethyl-benzoyl-diphenyl-phosphineoxide), bis-(2,6-dimethoxybenzoquinone)-2,4,4-trimethylphenylphosphine oxide [bis-(2,6-dimethoxy) -benzoyl)-2,4,4-trimethyl-benzyl-phosphineoxide] Acylphosphineoxide-like compound; quinone compound such as anthraquinone or 1,4-naphthoquinone; phenacyl chloride, tribromomethylbenzene a halide such as tribromomethyl-phenylsulfone, tris(trichloromethyl)-s-triazine, or di-tertbutylperoxide Peroxide. Among them, a benzophenone-based compound is preferred, and 4,4'-bis(diethylamine)benzophenone is particularly preferred.
上述其它自由基型光起始劑(E-2)可單獨一種 或混合複數種使用。 The above other radical type photoinitiator (E-2) may be a single type Or use a mixture of multiple types.
於本發明之具體例中,基於鹼可溶性樹脂(C)之使用量總和為100重量份,該其它自由基型光起始劑(E-2)之使用量範圍為9.9重量份至85重量份;較佳為14重量份至78重量份;更佳為17重量份至70重量份。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the other radical type photoinitiator (E-2) is used in an amount ranging from 9.9 parts by weight to 85 parts by weight. It is preferably from 14 parts by weight to 78 parts by weight; more preferably from 17 parts by weight to 70 parts by weight.
基於鹼可溶性樹脂(C)之使用量總和為100重量份,光起始劑(E)之使用量為10重量份至100重量份;較佳為15重量份至90重量份;更佳為20重量份至80重量份。 The photoinitiator (E) is used in an amount of 10 parts by weight to 100 parts by weight, based on the total amount of the alkali-soluble resin (C), and preferably 15 parts by weight to 90 parts by weight; more preferably 20 parts by weight. Parts by weight to 80 parts by weight.
含不飽和基之二苯甲酮化合物(F)Unsaturated benzophenone compound (F)
本發明之感光性樹脂組成物中可包括含不飽和基之二苯甲酮化合物(F),其中上述不飽和基具有如式(IV-1)所示之結構:
於式(IV-1)中,b代表0或1之整數。 In the formula (IV-1), b represents an integer of 0 or 1.
在一實施例中,本發明之含不飽和基之二苯甲酮化合物(F)可具有如下式(IV)所示之結構:
於式(IV)中,R1f可代表氫原子或上述式(IV-1)所示之不飽和基,且R2f可代表式(IV-1)所示之不飽和基、芐基或碳數為1至8之烷基,其中R1f與R2f之至少一者為式(IV-1)所示之不飽和基。 In the formula (IV), R 1f may represent a hydrogen atom or an unsaturated group represented by the above formula (IV-1), and R 2f may represent an unsaturated group, a benzyl group or a carbon represented by the formula (IV-1). The number is an alkyl group of 1 to 8, wherein at least one of R 1f and R 2f is an unsaturated group represented by the formula (IV-1).
含不飽和基之二苯甲酮化合物(F)之具體例子 可例如為2-羥基-4-烯丙氧基二苯甲酮(2-hydroxy-4-allyoxy benzophenone)、2-羥基-4-乙烯氧基二苯甲酮(2-hydroxy-4-vinyloxy benzophenone)、2-羥基-3-烯丙基-4-乙氧基二苯甲酮、2-羥基-3-烯丙基-4-丙氧基二苯甲酮、2-羥基-3-烯丙基-4-己氧基二苯甲酮、2-羥基-3-烯丙基-4-辛氧基二苯甲酮(2-hydroxy-3-allyl-4-octyloxy benzophenone)、2-羥基-3-烯丙基-4-芐氧基二苯甲酮(2-hydroxy-3-allyl-4-benzyloxy benzophenone)或上述之組合。 Specific examples of the benzophenone compound (F) containing an unsaturated group For example, 2-hydroxy-4-allyoxybenzophenone, 2-hydroxy-4-vinyloxybenzophenone (2-hydroxy-4-vinyloxy benzophenone) ), 2-hydroxy-3-allyl-4-ethoxybenzophenone, 2-hydroxy-3-allyl-4-propoxybenzophenone, 2-hydroxy-3-allyl 2-hydroxy-3-allyl-4-octyloxybenzophenone, 2-hydroxy-3-allyl-4-octyloxybenzophenone, 2-hydroxy- 2-hydroxy-3-allyl-4-benzyloxybenzophenone or a combination thereof.
基於鹼可溶性樹脂(C)之使用量總和為100重量份,含不飽和基之二苯甲酮化合物(F)之使用量為0.1重量份至30重量份;較佳為0.6重量份至27重量份;更佳為1重量份至24重量份。 The unsaturated benzophenone-containing compound (F) is used in an amount of from 0.1 part by weight to 30 parts by weight, based on the total amount of the alkali-soluble resin (C), and is preferably from 0.6 part by weight to 27 parts by weight. More preferably, it is 1 part by weight to 24 parts by weight.
若未使用含不飽和基之二苯甲酮化合物(F),則感光性樹脂組成物會有耐化性不佳的問題。 If the benzophenone compound (F) containing an unsaturated group is not used, there is a problem that the photosensitive resin composition has poor chemical resistance.
溶劑(G)Solvent (G)
本發明該感光性樹脂組成物的製備,通常是先將該顏料(A)以外的各成份溶解於溶劑(G)中,調製成液狀組成物,再加入顏料(A)均勻混合。溶劑(G)需選擇可溶解染料(B)、鹼可溶性樹脂(C)、含乙烯性不飽和基之化合物(D)、光起始劑(E)以及含不飽和基之二苯甲酮化合物(F), 且需不與該等成份相互反應並具有適當揮發性者。 In the preparation of the photosensitive resin composition of the present invention, usually, each component other than the pigment (A) is dissolved in a solvent (G) to prepare a liquid composition, and then the pigment (A) is uniformly mixed. The solvent (G) is selected from a soluble dye (B), an alkali-soluble resin (C), an ethylenically unsaturated group-containing compound (D), a photoinitiator (E), and an unsaturated group-containing benzophenone compound. (F), And need not interact with these components and have appropriate volatility.
基於鹼可溶性樹脂(C)之使用量總和為100重量份,溶劑(G)之使用量範圍為500重量份至5000重量份;較佳為800重量份至4500重量份;更佳為1000重量份至4000重量份。 The solvent (G) is used in an amount ranging from 500 parts by weight to 5000 parts by weight, based on the total amount of the alkali-soluble resin (C), and is preferably from 800 parts by weight to 4,500 parts by weight; more preferably 1,000 parts by weight. Up to 4000 parts by weight.
此外,溶劑(G)可與製備鹼可溶性樹脂(C)所使用的溶劑相同,在此不再贅述。較佳地,溶劑(G)是擇自於丙二醇甲醚醋酸酯、環己酮或3-乙氧基丙酸乙酯。 Further, the solvent (G) may be the same as the solvent used to prepare the alkali-soluble resin (C), and will not be described herein. Preferably, the solvent (G) is selected from the group consisting of propylene glycol methyl ether acetate, cyclohexanone or ethyl 3-ethoxypropionate.
添加劑(H)Additive (H)
於本發明之較佳具體例中,該感光性樹脂組成物還包括添加劑(H),例如:填充劑、鹼可溶性樹脂(C)以外的高分子化合物、密著促進劑、抗氧化劑、紫外線吸收劑、防凝集劑等。 In a preferred embodiment of the present invention, the photosensitive resin composition further includes an additive (H) such as a filler, a polymer compound other than the alkali-soluble resin (C), an adhesion promoter, an antioxidant, and ultraviolet absorption. Agent, anti-aggregation agent, etc.
添加劑(H)可單獨或混合使用,且該添加劑(H)包含但不限於玻璃、鋁等填充劑;聚乙烯醇、聚乙二醇單烷基醚、聚氟丙烯酸烷酯等鹼可溶性樹脂(C)以外的高分子化合物;乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧乙氧基)矽烷、氮-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、氮-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-環氧丙醇丙基三甲氧基矽烷、3-環氧丙醇丙基甲基二甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯氧基丙基三甲氧基矽烷、 3-硫醇基丙基三甲氧基矽烷等密著促進劑;2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚等抗氧化劑;2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯基疊氮、烷氧基苯酮等紫外線吸收劑;及聚丙烯酸鈉等防凝集劑。 The additive (H) may be used singly or in combination, and the additive (H) includes, but is not limited to, a filler such as glass or aluminum; an alkali-soluble resin such as polyvinyl alcohol, polyethylene glycol monoalkyl ether or polyfluoroalkyl acrylate ( Polymer compound other than C); vinyl trimethoxy decane, vinyl triethoxy decane, vinyl tris(2-methoxyethoxy) decane, nitrogen-(2-aminoethyl)-3- Aminopropylmethyldimethoxydecane, nitrogen-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-epoxy Propyl propyl trimethoxy decane, 3-glycidyl propyl methyl dimethoxy decane, 2-(3,4-epoxycyclohexyl)ethyl trimethoxy decane, 3-chloropropyl group Dimethoxyoxane, 3-chloropropyltrimethoxydecane, 3-methylpropoxypropyltrimethoxydecane, a adhesion promoter such as 3-thiolpropyltrimethoxydecane; 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-t-butylphenol And other antioxidants; UV absorbers such as 2-(3-t-butyl-5-methyl-2-hydroxyphenyl)-5-chlorophenyl azide and alkoxyphenone; and sodium polyacrylate Agglutinating agent.
基於鹼可溶性樹脂(C)之使用量總和為100重量份,添加劑(H)之使用量範圍為0.1重量份至10重量份;較佳為0.3重量份至7重量份;更佳為0.5重量份至4重量份。 The additive (H) is used in an amount ranging from 0.1 part by weight to 10 parts by weight, based on the total amount of the alkali-soluble resin (C), and preferably from 0.3 part by weight to 7 parts by weight; more preferably 0.5 part by weight. Up to 4 parts by weight.
製備彩色濾光片Preparing color filters
本發明亦提供一種彩色濾光片之製造方法,其係使用前述之彩色濾光片用感光性樹脂組成物,以於基板上形成一畫素層。 The present invention also provides a method of producing a color filter using the above-described photosensitive resin composition for a color filter to form a pixel layer on a substrate.
本發明又提供一種彩色濾光片,其係由前述之方法所製得。 The present invention further provides a color filter which is produced by the aforementioned method.
本發明之彩色濾光片之製造方法,主要係藉由迴轉塗佈、流延塗佈、噴墨塗佈(ink-jet)或輥式塗佈等塗佈方式,將混合成溶液狀態之前述彩色濾光片用感光性組成物塗佈在基板上。塗佈後,先以減壓乾燥之方式,去除大部分之溶劑,再以預烤(pre-bake)方式將溶劑去除而形成一預烤塗膜。其中,減壓乾燥及預烤之條件,依各成份之種類,配合比率而異,通常,減壓乾燥乃是在0至200mmHg之壓力下進行1秒鐘至60秒鐘,而預烤乃是在70至110℃溫度下進行1分鐘至15分鐘。預烤後,該預烤塗膜於所指定之光罩(mask)下曝光,於23±2℃溫度下浸漬於顯影液15秒至5分 鐘進行顯影,除去不要之部分而形成圖案。曝光使用之光線,以g線、h線、i線等之紫外線為佳,而紫外線裝置可為(超)高壓水銀燈或金屬鹵素燈。 The method for producing a color filter of the present invention is mainly a method of mixing into a solution state by a coating method such as rotary coating, cast coating, ink-jet coating or roll coating. The color filter is coated on the substrate with a photosensitive composition. After coating, most of the solvent is removed by drying under reduced pressure, and the solvent is removed by pre-bake to form a pre-baked coating film. The conditions for drying under reduced pressure and pre-baking vary depending on the type of each component and the blending ratio. Usually, the drying under reduced pressure is carried out at a pressure of 0 to 200 mmHg for 1 second to 60 seconds, and the pre-baking is It is carried out at a temperature of 70 to 110 ° C for 1 minute to 15 minutes. After pre-baking, the pre-baked film is exposed to a designated mask and immersed in a developer at a temperature of 23 ± 2 ° C for 15 seconds to 5 minutes. The clock is developed to remove the unnecessary portions to form a pattern. The light used for exposure is preferably ultraviolet rays such as g-line, h-line, and i-line, and the ultraviolet device may be a (super) high-pressure mercury lamp or a metal halide lamp.
前述基板之具體例如:用於液晶顯示裝置之無鹼玻璃、鈉鈣玻璃、硬質玻璃(派勒斯玻璃)、石英玻璃、鈉玻璃以及於此等玻璃上所附著的透明導電膜;或用於固體攝影裝置等之光電變換裝置基板(如:矽基板)等等。此等基板一般係先形成隔離各畫素著色層之黑色矩陣(black matrix)。 Specific examples of the substrate include: alkali-free glass, soda-lime glass, hard glass (Pyrus glass), quartz glass, soda glass, and a transparent conductive film attached to the glass for use in a liquid crystal display device; or A photoelectric conversion device substrate (such as a germanium substrate) of a solid-state imaging device or the like. These substrates generally form a black matrix that separates the colored layers of each pixel.
再者,顯影液之具體例如:氫氧化鈉,氫氧化鉀,碳酸鈉,碳酸氫鈉,碳酸鉀,碳酸氫鉀,矽酸鈉,甲基矽酸鈉,氨水,乙胺,二乙胺,二甲基乙醇胺,氫氧化四甲銨,氫氧化四乙銨,膽鹼,吡咯,呱啶,1,8-二氮雜二環-(5,4,0)-7-十一烯等鹼性化合物所構成之鹼性水溶液,其濃度一般為0.001至10重量%,較佳為0.005至5重量%,更佳為0.01至1重量%。 Further, specific examples of the developer include: sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium citrate, sodium methyl citrate, ammonia, ethylamine, diethylamine, Dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, acridine, 1,8-diazabicyclo-(5,4,0)-7-undecene The alkaline aqueous solution of the compound is generally present in a concentration of from 0.001 to 10% by weight, preferably from 0.005 to 5% by weight, more preferably from 0.01 to 1% by weight.
使用前述鹼性水溶液所構成之顯影液時,一般係於顯影後再以水洗淨,其次以壓縮空氣或壓縮氮氣將圖案風乾。 When the developer composed of the alkaline aqueous solution is used, it is usually washed with water after development, and then air-dried with compressed air or compressed nitrogen.
風乾後之具有光硬化塗膜層的基板,利用熱板或烘箱等加熱裝置,在溫度100至280℃下加熱1至15分鐘,將塗膜中的揮發性成分去除,並且使塗膜中未反應的乙烯性不飽和雙鍵進行熱硬化反應。使用各色(主要包括紅、綠、藍三色)之感光性樹脂組成物在預定的畫素上以同樣的 步驟重複操作三次,即可得到紅、綠、藍三色之畫素著色層。 After drying, the substrate having the photo-curing coating layer is heated by a heating means such as a hot plate or an oven at a temperature of 100 to 280 ° C for 1 to 15 minutes to remove volatile components in the coating film, and the coating film is not The reacted ethylenically unsaturated double bond undergoes a thermosetting reaction. A photosensitive resin composition using various colors (mainly including red, green, and blue colors) is the same on a predetermined pixel Steps are repeated three times to obtain a red, green, and blue color pixel coloring layer.
其次,在畫素著色層上,以220℃至250℃溫度於真空下形成ITO(氧化銦錫)蒸鍍膜,必要時,對ITO蒸鍍膜施行蝕刻暨佈線之後,再塗佈液晶配向膜用聚醯亞胺,進而燒成之,即可作為液晶顯示器用之彩色濾光片。 Next, on the pixel colored layer, an ITO (indium tin oxide) deposited film is formed under vacuum at a temperature of 220 ° C to 250 ° C, and if necessary, after etching and wiring the ITO deposited film, the liquid crystal alignment film is coated. The quinone imine, which is then fired, can be used as a color filter for liquid crystal displays.
再者,前述使用的液晶配向膜,係用於限制液晶分子之配向,此處並未特別限定,舉凡無機物或有機物任一者均可。至於形成液晶配向膜之技術為本發明所屬技術領域中任何具有通常知識者所熟知,且非為本發明的重點,故不另贅述。 Further, the liquid crystal alignment film used as described above is used to restrict the alignment of liquid crystal molecules, and is not particularly limited herein, and any of an inorganic substance or an organic substance may be used. The technique for forming a liquid crystal alignment film is well known to those of ordinary skill in the art to which the present invention pertains, and is not the focus of the present invention, and therefore will not be further described.
製備液晶顯示元件Preparation of liquid crystal display elements
本發明又一目的在於提供一種液晶顯示元件,該液晶顯示元件包含前述彩色濾光片。 It is still another object of the present invention to provide a liquid crystal display element comprising the aforementioned color filter.
本發明之液晶顯示元件,主要係藉由上述彩色濾光片形成方法所形成之彩色濾光片基板,以及設置有薄膜電晶體(TFT,Thin Film Transistor)之驅動基板所構成,其中,在2片基板間介入間隙(晶胞間隔;cell gap)作對向配置,2片基板的周圍部位用封止劑貼合,在基板表面以及封止劑所區分出的間隙內充填注入液晶,封住注入孔而構成液晶晶胞(cell)。然後,在液晶晶胞的外表面,亦即構成液晶晶胞的各個基板的其他側面上,貼合偏光板而製得液晶顯示元件。 The liquid crystal display device of the present invention is mainly composed of a color filter substrate formed by the above-described color filter forming method and a driving substrate provided with a thin film transistor (TFT), wherein The inter-substrate gap (cell gap) is arranged in the opposite direction, and the peripheral portions of the two substrates are bonded together with a sealing agent, and the liquid crystal is filled in the gap between the surface of the substrate and the sealing agent to seal the injection. The holes constitute a liquid crystal cell. Then, a polarizing plate is bonded to the outer surface of the liquid crystal cell, that is, the other side surface of each of the substrates constituting the liquid crystal cell, to obtain a liquid crystal display element.
至於前述使用的液晶,亦即液晶化合物或液晶 組成物,此處並未特別限定,惟可使用任何一種液晶化合物及液晶組成物。 As for the liquid crystal used above, that is, a liquid crystal compound or liquid crystal The composition is not particularly limited herein, and any liquid crystal compound and liquid crystal composition can be used.
應用本發明之感光性樹脂組成物、彩色濾光片及其製造方法暨其應用,可使所製得之彩色濾光片以及包含彩色濾光片之液晶顯示裝置具有良好的耐化性及對比度。 By using the photosensitive resin composition of the present invention, a color filter, a method for producing the same, and an application thereof, the obtained color filter and the liquid crystal display device including the color filter can have good chemical resistance and contrast .
1‧‧‧感光性樹脂層 1‧‧‧Photosensitive resin layer
2、3‧‧‧偏光板 2, 3‧‧‧ polarizing plate
4‧‧‧光源 4‧‧‧Light source
5‧‧‧輝度計 5‧‧‧luminometer
為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之詳細說明如下:[圖1]為感光性樹脂層對比測定狀態(一)之示意圖;以及[圖2]為感光性樹脂層對比測定狀態(二)之示意圖。 The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Fig. 2 is a schematic view showing a comparative measurement state (2) of a photosensitive resin layer.
茲以下列實例予以詳細說明本發明,唯並不意謂本發明僅侷限於此等實例所揭示之內容。 The invention is illustrated by the following examples, which are not intended to be limited to the scope of the invention.
將100重量份的芴環氧化合物(型號ESF-300,新日鐵化學製;環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚及130重量份的丙二醇甲醚醋酸酯連續添加至500mL的四口燒瓶中,且入料速度控制在25重量份/分鐘,將溫度維持在100℃至110℃的範圍內,反應15小 時後,即可獲得固體成分濃度為50wt%之淡黃色透明混合液。 100 parts by weight of an antimony epoxy compound (Model ESF-300, manufactured by Nippon Steel Chemical Co., Ltd.; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 part by weight 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500-mL four-necked flask, and the feed rate was controlled at 25 parts by weight/min, and the temperature was maintained at 100 ° C. 15 to 15 °C After that time, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained.
接著,將100重量份的上述混合液溶於25重量份的乙二醇乙醚醋酸酯中,同時添加6重量份的四氫鄰苯二甲酸酐及13重量份的二苯甲酮四甲酸二酐,並加熱至110°C至115℃,反應2小時後,即可獲得酸價為98.0mgKOH/g,且數目平均分子量為1,623之第一鹼可溶性樹脂(C-1-1)。 Next, 100 parts by weight of the above mixture was dissolved in 25 parts by weight of ethylene glycol ethyl ether acetate, while 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone tetracarboxylic dianhydride were added. And heating to 110 ° C to 115 ° C, after reacting for 2 hours, a first alkali-soluble resin (C-1-1) having an acid value of 98.0 mgKOH/g and a number average molecular weight of 1,623 was obtained.
將100重量份的芴環氧化合物(型號ESF-300,新日鐵化學製;環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚及130重量份的丙二醇甲醚醋酸酯連續添加至500mL的四口燒瓶中,且入料速度控制在25重量份/分鐘,將溫度維持在100℃至110℃的範圍內,反應15小時後,即可獲得固體成分濃度為50wt%之淡黃色透明混合液。 100 parts by weight of an antimony epoxy compound (Model ESF-300, manufactured by Nippon Steel Chemical Co., Ltd.; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 part by weight 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500-mL four-necked flask, and the feed rate was controlled at 25 parts by weight/min, and the temperature was maintained at 100 ° C. After reacting for 15 hours in the range of 110 ° C, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained.
接著,將100重量份的上述混合液溶於25重量份的乙二醇乙醚醋酸酯中,同時添加13重量份的二苯甲酮四甲酸二酐,在90℃至95℃下反應2小時,接著,添加6重量份的四氫鄰苯二甲酸酐,並於90℃至95℃下反應4小時,即可獲得酸價為99.0mgKOH/g,且數目平均分子量為2,162之第一鹼可溶性樹脂(C-1-2)。 Next, 100 parts by weight of the above mixture was dissolved in 25 parts by weight of ethylene glycol ethyl ether acetate, while 13 parts by weight of benzophenone tetracarboxylic dianhydride was added, and the reaction was carried out at 90 ° C to 95 ° C for 2 hours. Next, 6 parts by weight of tetrahydrophthalic anhydride is added and reacted at 90 ° C to 95 ° C for 4 hours to obtain a first alkali-soluble resin having an acid value of 99.0 mgKOH/g and a number average molecular weight of 2,162. (C-1-2).
將400重量份的環氧化合物(型號NC-3000,日本化藥(株)製;環氧當量288)、102重量份的丙烯酸、0.3重量份的甲氧基酚(methoxyphenol)、5重量份的三苯基膦及264重量份的丙二醇甲醚醋酸酯置於反應瓶中,將溫度維持在95℃,反應9小時後,即可獲得酸價為2.2mgKOH/g之中間產物。接著,加入151重量份的四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride),在95℃下反應4小時,即可獲得酸價為102mgKOH/g,且數目平均分子量為2,589之第一鹼可溶性樹脂(C-1-3)。 400 parts by weight of an epoxy compound (Model NC-3000, manufactured by Nippon Kayaku Co., Ltd.; epoxy equivalent 288), 102 parts by weight of acrylic acid, 0.3 parts by weight of methoxyphenol, and 5 parts by weight Triphenylphosphine and 264 parts by weight of propylene glycol methyl ether acetate were placed in a reaction flask, and the temperature was maintained at 95 ° C. After 9 hours of reaction, an intermediate product having an acid value of 2.2 mg KOH / g was obtained. Next, 151 parts by weight of tetrahydrophthalic anhydride was added and reacted at 95 ° C for 4 hours to obtain a first alkali-soluble resin having an acid value of 102 mgKOH/g and a number average molecular weight of 2,589 ( C-1-3).
將200重量份的環氧化合物(型號NC-3000,日本化藥(株)製;環氧當量288)、60重量份的丙烯酸、0.15重量份的甲氧基酚(methoxyphenol)、2.5重量份的三苯基膦及200重量份的丙二醇甲醚醋酸酯置於反應瓶中,將溫度維持在95℃,反應9小時後,即可獲得酸價為2.5mgKOH/g之中間產物。接著,加入85重量份的四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride),在95℃下反應4小時,即可獲得酸價為105mgKOH/g,且數目平均分子量為3,410之第一鹼可溶性樹脂(C-1-4)。 200 parts by weight of an epoxy compound (Model NC-3000, manufactured by Nippon Kayaku Co., Ltd.; epoxy equivalent 288), 60 parts by weight of acrylic acid, 0.15 parts by weight of methoxyphenol, and 2.5 parts by weight Triphenylphosphine and 200 parts by weight of propylene glycol methyl ether acetate were placed in a reaction flask, and the temperature was maintained at 95 ° C. After 9 hours of reaction, an intermediate product having an acid value of 2.5 mg KOH / g was obtained. Next, 85 parts by weight of tetrahydrophthalic anhydride was added and reacted at 95 ° C for 4 hours to obtain a first alkali-soluble resin having an acid value of 105 mgKOH/g and a number average molecular weight of 3,410 ( C-1-4).
在一四頸錐瓶上設置攪拌器、溫度計、冷凝管及氮氣入口,並導入氮氣。然後,加入100重量份之丙二醇甲醚醋酸酯(簡稱為PGMEA),並將溫度升溫至100℃。接 著,將25重量份之2-甲基丙烯醯乙氧基丁二酸酯(簡稱為HOMS)、70重量份之甲基丙烯酸2-羥基乙酯(簡稱為HEMA)、15重量份之甲基丙烯酸3,4-環氧環己基甲酯(ECMMA)、10重量份之鄰-乙烯基苯甲基環氧丙醚(簡稱為VBGE),以及4.5重量份之2,2’-偶氮雙-2-甲基丁腈(簡稱為AMBN)溶於100重量份之丙二醇甲醚醋酸酯中,並將此混合溶液於2小時內逐滴滴入上述四頸錐瓶中。於100℃反應6.5小時後,將5重量份之丙烯酸(簡稱為AA)加至充滿氮氣之四頸錐瓶中,並將溫度上升至110℃。反應6小時後,即可製得合成例C-2-1之第二鹼可溶性樹脂。 A stirrer, thermometer, condenser, and nitrogen inlet were placed on a four-necked flask and nitrogen was introduced. Then, 100 parts by weight of propylene glycol methyl ether acetate (abbreviated as PGMEA) was added, and the temperature was raised to 100 °C. Connect 25 parts by weight of 2-methylpropenyl ethoxy succinate (abbreviated as HOMS), 70 parts by weight of 2-hydroxyethyl methacrylate (abbreviated as HEMA), 15 parts by weight of methyl 3,4-epoxycyclohexylmethyl acrylate (ECMMA), 10 parts by weight of o-vinylbenzyl glycidyl ether (abbreviated as VBGE), and 4.5 parts by weight of 2,2'-azobis- 2-methylbutyronitrile (abbreviated as AMBN) was dissolved in 100 parts by weight of propylene glycol methyl ether acetate, and the mixed solution was dropwise added to the above four-necked flask in 2 hours. After reacting at 100 ° C for 6.5 hours, 5 parts by weight of acrylic acid (abbreviated as AA) was added to a four-necked flask filled with nitrogen, and the temperature was raised to 110 °C. After reacting for 6 hours, a second alkali-soluble resin of Synthesis Example C-2-1 was obtained.
合成例C-2-2至C-2-6是以與合成例C-2-1相同的步驟來製備第二鹼可溶性樹脂(C-2),不同的地方在於:改變成份的種類及使用量,且詳載於表1。 Synthesis Examples C-2-2 to C-2-6 The second alkali-soluble resin (C-2) was prepared in the same manner as in Synthesis Example C-2-1, except that the type and use of the components were changed. The amount is detailed in Table 1.
將前述合成例所得之100重量份的第二鹼可溶性樹脂(C-2-1)、50重量份的C.I.顏料紅254(以下簡稱A-1)、15重量份的C.I.酸性紅37(以下簡稱B-2-1)、30重量份的二季戊四醇六丙烯酸酯(以下簡稱D-2)、50重量份的1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮2-(O-苯醯基肟)(以下簡稱E-2-1)、5重量份的2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑(以下簡稱E-2-2)、3重量份之2-羥基-3-烯丙基-4-芐基二苯甲酮(F-1),加入1500重量份 的3-乙氧基丙酸乙酯(以下簡稱G-1)後,以搖動式攪拌器,加以溶解混合,即可調製而得感光性樹脂組成物,該感光性樹脂組成物以下述之各測定評價方式進行評價,所得結果如表2所示。 100 parts by weight of the second alkali-soluble resin (C-2-1) obtained in the above Synthesis Example, 50 parts by weight of CI Pigment Red 254 (hereinafter abbreviated as A-1), and 15 parts by weight of CI Acid Red 37 (hereinafter referred to as B-2-1), 30 parts by weight of dipentaerythritol hexaacrylate (hereinafter referred to as D-2), 50 parts by weight of 1-[4-(phenylthio)phenyl]-octane-1,2- Diketone 2-(O-phenylhydrazinyl) (hereinafter referred to as E-2-1), 5 parts by weight of 2,2'-bis(2,4-dichlorophenyl)-4,4',5, 5'-tetraphenyldiimidazole (hereinafter referred to as E-2-2), 3 parts by weight of 2-hydroxy-3-allyl-4-benzylbenzophenone (F-1), added to 1500 parts by weight The ethyl 3-ethoxypropionate (hereinafter abbreviated as G-1) is dissolved and mixed by a shaker to obtain a photosensitive resin composition, and the photosensitive resin composition is as follows. The evaluation evaluation method was carried out, and the results obtained are shown in Table 2.
實施例2至12與比較例1至7之感光性樹脂組成物係使用與實施例1相同之方法製備。不同的是,改變實施例2至12與比較例1至7所使用之組成物種類或其使用量,詳細條件及評價結果悉如表2所示,此處不另贅述。 The photosensitive resin compositions of Examples 2 to 12 and Comparative Examples 1 to 7 were prepared in the same manner as in Example 1. The difference was that the types of the compositions used in Examples 2 to 12 and Comparative Examples 1 to 7 or the amounts thereof used were changed. The detailed conditions and evaluation results are shown in Table 2, and are not described herein.
將上述之感光性樹脂組成物旋轉塗布於鈉玻璃基板的表面上,其中上述鈉玻璃基板具有防止鈉析出的二氧化矽膜。接著,在90℃的加熱板上進行預烤處理達2分鐘,以形成膜厚為2.5μm的塗膜。 The photosensitive resin composition described above is spin-coated on the surface of a soda glass substrate having a cerium oxide film for preventing sodium deposition. Next, prebaking treatment was performed on a hot plate at 90 ° C for 2 minutes to form a coating film having a film thickness of 2.5 μm.
然後,將預烤後的基板冷卻至室溫,將光罩置於基板與高壓水銀燈間,分別以波長為365nm、405nm以及436nm且曝光量為400J/m2的輻射線曝光上述基板。之後,使用23℃、濃度為0.04重量百分比之氫氧化鉀水溶液,對曝光後的基板進行噴淋顯影,其中噴嘴之直徑為1mm且顯影壓為1kgf/cm2。 Then, the pre-baked substrate was cooled to room temperature, and a photomask was placed between the substrate and the high-pressure mercury lamp, and the substrate was exposed to radiation having wavelengths of 365 nm, 405 nm, and 436 nm and an exposure amount of 400 J/m 2 , respectively. Thereafter, the exposed substrate was subjected to shower development using a potassium hydroxide aqueous solution having a concentration of 0.04% by weight at 23 ° C, wherein the nozzle had a diameter of 1 mm and a developing pressure of 1 kgf/cm 2 .
再來,以超純水清洗、風乾後,於230℃下進行30分鐘的後烤處理,以於基板上形成圖案點。接著,將上述 圖案化之基板浸泡於80℃之丙二醇甲醚醋酸酯(PGMEA)達40分鐘。 Thereafter, after washing with ultrapure water and air drying, post-baking treatment was carried out at 230 ° C for 30 minutes to form pattern dots on the substrate. Next, the above The patterned substrate was immersed in propylene glycol methyl ether acetate (PGMEA) at 80 ° C for 40 minutes.
浸泡前之基板具有色彩飽和度座標值為(x,y)及飽和度Y,測量浸泡前後之基板的色彩差異△E*ab,以作為評價標準。評價方式如下所示: The substrate before immersion has a color saturation coordinate value of (x, y) and saturation Y, and the color difference ΔE*ab of the substrate before and after immersion was measured as an evaluation standard. The evaluation method is as follows:
◎:△E*ab≦1 ◎: △E*ab≦1
○:1<△E*ab≦2 ○: 1<ΔE*ab≦2
△:2<△E*ab≦3 △: 2<ΔE*ab≦3
×:3<△E*ab ×: 3<△E*ab
將感光性樹脂組成物以旋轉塗佈的方式,塗佈在100mm×100mm之玻璃基板上,先進行減壓乾燥,壓力100mmHg、時間30秒鐘,然後再進行預烤,溫度80℃、時間2分鐘,可形成一膜厚2.5μm之預烤塗膜。再以紫外光(曝光機Canon PLA-501F)100mJ/cm2的光量照射該預烤塗膜後,該預烤塗膜再浸漬於23℃之顯影液1分鐘,以純水洗淨。 The photosensitive resin composition was applied by spin coating to a glass substrate of 100 mm × 100 mm, and dried under reduced pressure at a pressure of 100 mmHg for 30 seconds, and then pre-baked at a temperature of 80 ° C and time 2 In a minute, a pre-baked film having a film thickness of 2.5 μm can be formed. Further, the prebaked coating film was irradiated with ultraviolet light (exposure machine Canon PLA-501F) at a light amount of 100 mJ/cm 2 , and then the prebaked coating film was further immersed in a developing solution at 23 ° C for 1 minute, and washed with pure water.
其次,再以235℃後烤30分鐘,即可在玻璃基板上形成一膜厚2.0μm之感光性樹脂層。 Next, after baking at 235 ° C for 30 minutes, a photosensitive resin layer having a film thickness of 2.0 μm was formed on the glass substrate.
將所得之感光性樹脂層,進行如圖1及圖2所示之測量方法,並以測得之輝度計算對比;其中,將所得的感光性樹脂層1置於兩枚偏光板2、3之間,從光源4所照射出來的光依序透過偏光板2、感光性樹脂層1、偏光板3, 而最後透過偏光板3的輝度(cd/cm2)則以輝度計5(日本Topcon公司製,型號BM-5A)進行測量。 The obtained photosensitive resin layer was subjected to a measurement method as shown in FIGS. 1 and 2, and the contrast was calculated by the measured luminance; wherein the obtained photosensitive resin layer 1 was placed on the two polarizing plates 2, 3. The light emitted from the light source 4 sequentially passes through the polarizing plate 2, the photosensitive resin layer 1, and the polarizing plate 3, and finally the luminance (cd/cm 2 ) transmitted through the polarizing plate 3 is measured by a luminance meter 5 (Topcon Corporation, Japan) System, model BM-5A) for measurement.
如圖1所示,當偏光板3的偏光方向與偏光板2的偏光方向互相平行(測定狀態(一))時,所測得之輝度為A(cd/cm2);另外,如圖2所示,當偏光板3的偏光方向與偏光板2的偏光方向互相垂直(測定狀態(二))時,所測得之輝度為B(cd/cm2);則對比度可藉由輝度A與輝度B的比值(輝度A/輝度B)而得,其評價標準如下所示。 As shown in FIG. 1, when the polarizing direction of the polarizing plate 3 and the polarizing direction of the polarizing plate 2 are parallel to each other (measurement state (1)), the measured luminance is A (cd/cm 2 ); It is shown that when the polarizing direction of the polarizing plate 3 and the polarizing direction of the polarizing plate 2 are perpendicular to each other (measurement state (2)), the measured luminance is B (cd/cm 2 ); the contrast can be obtained by the luminance A and the luminance B The ratio (luminance A/luminance B) is obtained, and the evaluation criteria are as follows.
◎:(輝度A/輝度B)≧3500 ◎: (luminance A / luminance B) ≧ 3500
○:3300≦(輝度A/輝度B)<3500 ○: 3300 ≦ (luminance A / luminance B) < 3500
△:3000≦(輝度A/輝度B)<3300 △: 3000 ≦ (luminance A / luminance B) < 3300
×:(輝度A/輝度B)<3000 ×: (luminance A/luminance B) <3000
根據下表2之評價結果可知,當本發明之感光性樹脂組成物包括染料(B-1)時,其對比度表現較佳。當感光性樹脂組成物包括第一鹼可溶性樹脂(C-1)及/或光起始劑(E-1)時,其耐化性較佳。此外,當感光性樹脂組成物不包含不飽和基之二苯甲酮化合物(F)時,則耐化性不佳。 According to the evaluation results of the following Table 2, when the photosensitive resin composition of the present invention includes the dye (B-1), the contrast performance is better. When the photosensitive resin composition includes the first alkali-soluble resin (C-1) and/or the photoinitiator (E-1), the chemical resistance is preferred. Further, when the photosensitive resin composition does not contain the unsaturated benzophenone compound (F), the chemical resistance is poor.
因此,利用本發明之感光性樹脂組成物、彩色濾光片及其製造方法與應用,可有效改善習知感光性樹脂組成物所製得的彩色濾光片之耐化性和對比度不佳的缺點。 Therefore, the photosensitive resin composition of the present invention, the color filter, the method for producing the same, and the method for producing the same can effectively improve the chemical resistance and contrast of the color filter produced by the conventional photosensitive resin composition. Disadvantages.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,在本發明所屬技術領域中任何具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動 與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 The present invention has been disclosed in the above embodiments, and is not intended to limit the present invention. Any one of ordinary skill in the art to which the present invention pertains can make various changes without departing from the spirit and scope of the invention. And the scope of the present invention is defined by the scope of the appended claims.
MAA 甲基丙烯酸 MAA methacrylic acid
HOMS 2-甲基丙烯醯乙氧基丁二酸酯 HOMS 2-methacryl oxime ethoxy succinate
AA 丙烯酸 AA Acrylic
N-PMI N-苯基馬來醯亞胺 N-PMI N-phenyl maleimide
HEMA 甲基丙烯酸2-羥基乙酯 HEMA 2-hydroxyethyl methacrylate
BzMA 甲基丙烯酸苯甲酯 BzMA benzyl methacrylate
ECMMA 甲基丙烯酸3,4-環氧環己基甲酯 ECMMA 3,4-epoxycyclohexylmethyl methacrylate
MGMA 甲基丙烯酸2-甲基環氧丙酯 MGMA 2-methylglycidyl methacrylate
VBGE 鄰-乙烯基苯甲基環氧丙醚 VBGE o-vinyl benzyl methyl epoxide
AMBN 2,2’-偶氮雙-2-甲基丁腈 AMBN 2,2'-azobis-2-methylbutyronitrile
ADVN 2,2-偶氮-二-(2,4-二甲基戊氰) ADVN 2,2-azo-bis-(2,4-dimethylpentanyl)
PGMEA 丙二醇甲醚醋酸酯 PGMEA propylene glycol methyl ether acetate
EEP 3-乙氧基丙酸乙酯 EEP 3-ethoxypropionate ethyl ester
A-1 C.I.顏料紅254 A-1 C.I. Pigment Red 254
A-2 C.I.顏料綠36 A-2 C.I. Pigment Green 36
A-3 C.I.顏料藍15:6 A-3 C.I. Pigment Blue 15:6
A-4 C.I.顏料藍66 A-4 C.I. Pigment Blue 66
A-5 C.I.顏料紅177 A-5 C.I. Pigment Red 177
B-1-1 式(1)所示之化合物(Rc與Rd為-SO3 -,a為0) B-1-1 A compound of the formula (1) (R c and R d are -SO 3 - and a is 0)
B-1-2 式(22)所示之化合物 B-1-2 a compound of the formula (22)
B-1-3 式(28)所示之化合物 B-1-3 Compound represented by formula (28)
B-2-1 C.I.酸性红37 B-2-1 C.I. Acid Red 37
B-2-2 C.I.分散紅60 B-2-2 C.I. Disperse red 60
B-2-3 C.I.分散藍60 B-2-3 C.I. Disperse Blue 60
D-1 EO改質之三丙烯酸三羥甲基丙酯 D-1 EO modified trishydroxypropyl propyl triacrylate
D-2 二季戊四醇六丙烯酸酯 D-2 dipentaerythritol hexaacrylate
D-3 己內酯改質之二季戊四醇六丙烯酸酯 D-3 caprolactone modified dipentaerythritol hexaacrylate
E-1-1 如式(III-1)所示之化合物 E-1-1 as shown in formula (III-1)
E-1-2 如式(III-8)所示之化合物 E-1-2 as shown in formula (III-8)
E-1-3 如式(III-27)所示之化合物 E-1-3 as shown in formula (III-27)
E-2-1 1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮2-(O-苯醯基肟) E-2-1 1-[4-(phenylthio)phenyl]-octane-1,2-dione 2-(O-phenylhydrazinium)
E-2-2 2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑 E-2-2 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole
E-2-3 4,4’-雙(二乙胺)二苯甲酮 E-2-3 4,4'-bis(diethylamine)benzophenone
E-2-4 2-苄基-2-氮,氮-二甲胺-1-(4-嗎啉代苯基)-1-丁酮 E-2-4 2-benzyl-2-nitrogen, nitrogen-dimethylamine-1-(4-morpholinophenyl)-1-butanone
F-1 2-羥基-3-烯丙基-4-芐基二苯甲酮 F-1 2-hydroxy-3-allyl-4-benzylbenzophenone
F-2 2-羥基-4-乙烯氧基二苯甲酮 F-2 2-hydroxy-4-vinyloxybenzophenone
F-3 2-羥基-4-烯丙氧基二苯甲酮 F-3 2-hydroxy-4-allyloxybenzophenone
G-1 3-乙氧基丙酸乙酯 G-1 3-ethoxypropionate ethyl ester
G-2 丙二醇甲醚醋酸酯 G-2 propylene glycol methyl ether acetate
G-3 環己酮 G-3 cyclohexanone
H-1 3-硫醇基丙基三甲氧基矽烷 H-1 3-thiolpropyltrimethoxydecane
H-2 2,2-硫代雙(4-甲基-6-第三丁基苯酚) H-2 2,2-thiobis(4-methyl-6-tert-butylphenol)
H-3 2-羥基-4-甲氧基二苯甲酮 H-3 2-hydroxy-4-methoxybenzophenone
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